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Title: Breakthroughs in photonics 2013: X-ray optics

Here, this review discusses the latest advances in extreme ultraviolet/X-ray optics development, which are motivated by the availability and demands of new X-ray sources and scientific and industrial applications. Among the breakthroughs highlighted are the following: i) fabrication, metrology, and mounting technologies for large-area optical substrates with improved figure, roughness, and focusing properties; ii) multilayer coatings with especially optimized layer properties, achieving improved reflectance, stability, and out-of-band suppression; and iii) nanodiffractive optics with improved efficiency and resolution.
Authors:
 [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Publication Date:
OSTI Identifier:
1266667
Report Number(s):
LLNL-JRNL--651182
Journal ID: ISSN 1943-0655
Grant/Contract Number:
AC52-07NA27344
Type:
Accepted Manuscript
Journal Name:
IEEE Photonics Journal (Online)
Additional Journal Information:
Journal Name: IEEE Photonics Journal (Online); Journal Volume: 6; Journal Issue: 2; Journal ID: ISSN 1943-0655
Publisher:
IEEE
Research Org:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 79 ASTRONOMY AND ASTROPHYSICS; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS x-ray optics; multilayer interference coatings; metrology; EUV; X-ray applications