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Title: Fundamental edge broadening effects during focused electron beam induced nanosynthesis

In this study, we explore lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. In addition, it is demonstrated that intermediate energies lead to even more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution.
Authors:
 [1] ;  [2] ;  [1] ;  [2] ;  [3]
  1. Graz Center for Electron Microscopy, Graz (Austria)
  2. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS); Univ. of Tennessee, Knoxville, TN (United States)
  3. Graz Center for Electron Microscopy, Graz (Austria) ; Graz Univ. of Technology (Austria)
Publication Date:
OSTI Identifier:
1265378
Grant/Contract Number:
AC05-00OR22725
Type:
Accepted Manuscript
Journal Name:
Beilstein Journal of Nanotechnology
Additional Journal Information:
Journal Volume: 6; Journal ID: ISSN 2190-4286
Publisher:
Beilstein Institute
Research Org:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org:
USDOE Office of Science (SC)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY focused electron beam induced deposition; nanofabrication; platinum; simulation