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Title: Scalable sub-micron patterning of organic materials toward high density soft electronics

The success of silicon based high density integrated circuits ignited explosive expansion of microelectronics. Although the inorganic semiconductors have shown superior carrier mobilities for conventional high speed switching devices, the emergence of unconventional applications, such as flexible electronics, highly sensitive photosensors, large area sensor array, and tailored optoelectronics, brought intensive research on next generation electronic materials. The rationally designed multifunctional soft electronic materials, organic and carbon-based semiconductors, are demonstrated with low-cost solution process, exceptional mechanical stability, and on-demand optoelectronic properties. Unfortunately, the industrial implementation of the soft electronic materials has been hindered due to lack of scalable fine-patterning methods. In this report, we demonstrated facile general route for high throughput sub-micron patterning of soft materials, using spatially selective deep-ultraviolet irradiation. For organic and carbon-based materials, the highly energetic photons (e.g. deep-ultraviolet rays) enable direct photo-conversion from conducting/semiconducting to insulating state through molecular dissociation and disordering with spatial resolution down to a sub-μm-scale. As a result, the successful demonstration of organic semiconductor circuitry promise our result proliferate industrial adoption of soft materials for next generation electronics.
Authors:
 [1] ;  [2] ;  [2] ;  [2] ;  [2] ;  [2] ;  [3] ;  [2] ;  [4] ;  [5] ;  [6] ;  [7] ;  [8] ;  [3] ;  [2]
  1. Chung-Ang Univ., Seoul (Korea); Hanbat National Univ., Daejeon (Korea)
  2. Chung-Ang Univ., Seoul (Korea)
  3. Sungkyunkwan Univ., Suwon (Korea)
  4. Stony Brook Univ., Stony Brook, NY (United States)
  5. Brookhaven National Lab. (BNL), Upton, NY (United States)
  6. Gyeonsang National Univ. and Research Institute of Nature Science (RINS), Jinju (Korea)
  7. Dongguk Univ., Seoul (Korea)
  8. Hangyang Univ., Seoul (Korea)
Publication Date:
OSTI Identifier:
1258788
Type:
Accepted Manuscript
Journal Name:
Scientific Reports
Additional Journal Information:
Journal Volume: 5; Journal ID: ISSN 2045-2322
Publisher:
Nature Publishing Group
Research Org:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE