skip to main content

DOE PAGESDOE PAGES

This content will become publicly available on May 31, 2017

Title: Impedance of an intense plasma-cathode electron source for tokamak startup

In this study, an impedance model is formulated and tested for the ~1kV, ~1kA/cm2, arc-plasma cathode electron source used for local helicity injection tokamak startup. A double layer sheath is established between the high-density arc plasma (narc ≈ 1021 m-3) within the electron source, and the less dense external tokamak edge plasma (nedge ≈ 1018 m-3) into which current is injected at the applied injector voltage, Vinj. Experiments on the Pegasus spherical tokamak show the injected current, Iinj, increases with Vinj according to the standard double layer scaling Iinj ~ Vinj3/2 at low current and transitions to Iinj ~ Vinj1/2 at high currents. In this high current regime, sheath expansion and/or space charge neutralization impose limits on the beam density nb ~ Iinj/Vinj1/2. For low tokamak edge density nedge and high Iinj, the inferred beam density nb is consistent with the requirement nb ≤ nedge imposed by space-charge neutralization of the beam in the tokamak edge plasma. At sufficient edge density, nb ~ narc is observed, consistent with a limit to nb imposed by expansion of the double layer sheath. These results suggest that narc is a viable control actuator for the source impedance.
Authors:
 [1] ;  [1] ;  [1] ;  [1] ;  [1] ;  [1]
  1. Univ. of Wisconsin-Madison, Madison, WI (United States)
Publication Date:
OSTI Identifier:
1255444
Grant/Contract Number:
FG02-96ER54375
Type:
Accepted Manuscript
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 23; Journal Issue: 5; Journal ID: ISSN 1070-664X
Publisher:
American Institute of Physics (AIP)
Research Org:
Univ. of Wisconsin-Madison, Madison, WI (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY tokamaks; double layer; helicity injection; plasma cathode; electron source; plasma source; plasma sheaths; cathodes; charge injection