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This content will become publicly available on October 21, 2017

Title: Examining the free radical bonding mechanism of benzoquinone– and hydroquinone–methanol passivation of silicon surfaces

Authors:
; ; ; ;
Publication Date:
OSTI Identifier:
1253635
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Surface Science
Additional Journal Information:
Journal Volume: 354; Journal Issue: PB; Related Information: CHORUS Timestamp: 2016-09-14 16:15:57; Journal ID: ISSN 0169-4332
Publisher:
Elsevier
Sponsoring Org:
USDOE
Country of Publication:
Netherlands
Language:
English