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Title: A stochastic model of solid state thin film deposition: Application to chalcopyrite growth

Authors:
 [1] ;  [1] ;  [1] ;  [2] ;  [2] ;  [3]
  1. Department of Chemical and Biomolecular Engineering, University of Delaware, Newark, DE 19716, USA, Institute of Energy Conversion, University of Delaware, Newark, DE 19716, USA
  2. Institute of Energy Conversion, University of Delaware, Newark, DE 19716, USA, Department of Materials Science and Engineering, University of Delaware, Newark, DE 19716, USA
  3. Department of Chemical and Biomolecular Engineering, University of Delaware, Newark, DE 19716, USA
Publication Date:
OSTI Identifier:
1249956
Grant/Contract Number:
EEC-1041895
Type:
Published Article
Journal Name:
AIP Advances
Additional Journal Information:
Journal Volume: 6; Journal Issue: 4; Related Information: CHORUS Timestamp: 2016-06-14 13:07:56; Journal ID: ISSN 2158-3226
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English