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This content will become publicly available on January 5, 2017

Title: Evolution of crystal structure during the initial stages of ZnO atomic layer deposition

In this study, a complementary suite of in situ synchrotron X-ray techniques is used to investigate both structural and chemical evolution during ZnO growth by atomic layer deposition. Focusing on the first 10 cycles of growth, we observe that the structure formed during the coalescence stage largely determines the overall microstructure of the film. Furthermore, by comparing ZnO growth on silicon with a native oxide with that on Al2O3(001), we find that even with lattice-mismatched substrates and low deposition temperatures, the crystalline texture of the films depend strongly on the nature of the interfacial bonds.
Authors:
 [1] ;  [1] ;  [2] ;  [1] ;  [1] ;  [1] ;  [1] ;  [1] ;  [3] ;  [3] ;  [4] ;  [1] ;  [1] ;  [1] ;  [5] ;  [5] ;  [5] ;  [3]
  1. Univ. of Grenoble Alpes, Grenoble (France)
  2. Aix-Marseille Univ., and CNRS/IN2P3, Marseille (France); European Synchrotron Radiation Facility, Grenoble (France)
  3. Aix-Marseille Univ., and CNRS/IN2P3, Marseille (France)
  4. Argonne National Lab. (ANL), Argonne, IL (United States)
  5. Synchrotron SOLEIL - Beamline SIRIUS, Gif sur Yvette (France)
Publication Date:
OSTI Identifier:
1248882
Grant/Contract Number:
AC02-06CH11357
Type:
Accepted Manuscript
Journal Name:
Chemistry of Materials
Additional Journal Information:
Journal Volume: 28; Journal Issue: 2; Journal ID: ISSN 0897-4756
Publisher:
American Chemical Society (ACS)
Research Org:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE