1.5 nm fabrication of test patterns for characterization of metrological systems

Babin, Sergey; Calafiore, Giuseppe; Peroz, Christophe; Conley, Raymond; Bouet, Nathalie; Cabrini, Stefano; Chan, Elaine; Lacey, Ian; McKinney, Wayne R.; Yashchuk, Valeriy V.; Vladar, Andras E.

doi:10.1116/1.4935253

Title: 1.5 nm fabrication of test patterns for characterization of metrological systems

Abstract

Any metrology tool is only as good as it is calibrated. The characterization of metrology systems requires test patterns at a scale about ten times smaller than the measured features. The fabrication of patterns with linewidths down to 1.5 nm is described. The test sample was designed in such a way that the distribution of linewidths appears to be random at any location. This pseudorandom test pattern is used to characterize dimensional metrology equipment over its entire dynamic range by extracting the modulation transfer function of the system. The test pattern contains alternating lines of silicon and tungsten silicide, each according to its designed width. As a result, the fabricated test samples were imaged using a transmission electron microscope, a scanning electron microscope, and an atomic force microscope. (C) 2015 American Vacuum Society.

Authors:

Babin, Sergey ^[1]; Calafiore, Giuseppe ^[1]; Peroz, Christophe ^[1]; Conley, Raymond ^[2]; Bouet, Nathalie ^[3]; Cabrini, Stefano ^[4]; Chan, Elaine ^[4]; Lacey, Ian ^[4]; McKinney, Wayne R. ^[4]; Yashchuk, Valeriy V. ^[4]; Vladar, Andras E. ^[5]

Abeam Technologies, Inc., Hayward, CA (United States)
Argonne National Lab. (ANL), Argonne, IL (United States); Brookhaven National Lab. (BNL), Upton, NY (United States)
Brookhaven National Lab. (BNL), Upton, NY (United States)
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
National Institute of Standards and Technology, Gaithersburg, MD (United States)

Publication Date:: Fri Nov 06 00:00:00 EST 2015

Research Org.:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Org.:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

OSTI Identifier:: 1247541

Grant/Contract Number:: AC02-06CH11357

Resource Type:: Accepted Manuscript

Journal Name:: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

Additional Journal Information:: Journal Volume: 33; Journal Issue: 6; Journal ID: ISSN 0734-211X

Publisher:: American Institute of Physics (AIP)

Country of Publication:: United States

Language:: English

Subject:: 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; materials fabrication; modulation transfer functions; linewidths; metrology; scanning electron microscopy

Citation Formats


                    Babin, Sergey, Calafiore, Giuseppe, Peroz, Christophe, Conley, Raymond, Bouet, Nathalie, Cabrini, Stefano, Chan, Elaine, Lacey, Ian, McKinney, Wayne R., Yashchuk, Valeriy V., and Vladar, Andras E. 1.5 nm fabrication of test patterns for characterization of metrological systems.  United States: N. p., 2015. 
Web.  doi:10.1116/1.4935253.

Copy to clipboard


                    Babin, Sergey, Calafiore, Giuseppe, Peroz, Christophe, Conley, Raymond, Bouet, Nathalie, Cabrini, Stefano, Chan, Elaine, Lacey, Ian, McKinney, Wayne R., Yashchuk, Valeriy V., & Vladar, Andras E. 1.5 nm fabrication of test patterns for characterization of metrological systems.  United States.  https://doi.org/10.1116/1.4935253

Copy to clipboard


                    Babin, Sergey, Calafiore, Giuseppe, Peroz, Christophe, Conley, Raymond, Bouet, Nathalie, Cabrini, Stefano, Chan, Elaine, Lacey, Ian, McKinney, Wayne R., Yashchuk, Valeriy V., and Vladar, Andras E. Fri .  
"1.5 nm fabrication of test patterns for characterization of metrological systems".  United States.  https://doi.org/10.1116/1.4935253.  https://www.osti.gov/servlets/purl/1247541.

Copy to clipboard


                    
@article{osti_1247541,

  title        = {1.5 nm fabrication of test patterns for characterization of metrological systems},

  author       = {Babin, Sergey and Calafiore, Giuseppe and Peroz, Christophe and Conley, Raymond and Bouet, Nathalie and Cabrini, Stefano and Chan, Elaine and Lacey, Ian and McKinney, Wayne R. and Yashchuk, Valeriy V. and Vladar, Andras E.},

  abstractNote = {Any metrology tool is only as good as it is calibrated. The characterization of metrology systems requires test patterns at a scale about ten times smaller than the measured features. The fabrication of patterns with linewidths down to 1.5 nm is described. The test sample was designed in such a way that the distribution of linewidths appears to be random at any location. This pseudorandom test pattern is used to characterize dimensional metrology equipment over its entire dynamic range by extracting the modulation transfer function of the system. The test pattern contains alternating lines of silicon and tungsten silicide, each according to its designed width. As a result, the fabricated test samples were imaged using a transmission electron microscope, a scanning electron microscope, and an atomic force microscope. (C) 2015 American Vacuum Society.},

  doi          = {10.1116/1.4935253},

  journal      = {Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena},

  number       = 6,

  volume       = 33,

  place        = {United States},

  year         = {Fri Nov 06 00:00:00 EST 2015},

  month        = {Fri Nov 06 00:00:00 EST 2015}

}

Copy to clipboard

Journal Article:

Free Publicly Available Full Text

Accepted Manuscript (DOE)

Publisher's Version of Record

https://doi.org/10.1116/1.4935253

Other availability

Search WorldCat to find libraries that may hold this journal

Citation Metrics:

Cited by: 3 works

Citation information provided by
Web of Science

Save / Share:

Export Metadata

Save to My Library

Works referencing / citing this record:

Modeling surface topography of state-of-the-art x-ray mirrors as a result of stochastic polishing process: recent developments
conference, September 2016

Yashchuk, Valeriy V.; Centers, Gary; Tyurin, Yuri N.
SPIE Optical Engineering + Applications, SPIE Proceedings
DOI: 10.1117/12.2238260

Similar Records in DOE PAGES and OSTI.GOV collections:

1.5 nm fabrication of test patterns for characterization of metrological systems

Journal Article Babin, Sergey ; Calafiore, Giuseppe ; Peroz, Christophe ; ... - Journal of Vacuum Science and Technology B

Any metrology tool is only as good as it is calibrated. The characterization of metrology systems requires test patterns at a scale about ten times smaller than the measured features. The fabrication of patterns with linewidths down to 1.5 nm is described. The test sample was designed in such a way that the distribution of linewidths appears to be random at any location. This pseudorandom test pattern is used to characterize dimensional metrology equipment over its entire dynamic range by extracting the modulation transfer function of the system. The test pattern contains alternating lines of silicon and tungsten silicide, eachmore »« less
https://doi.org/10.1116/1.4935253
Development of Pseudorandom Binary Arrays for Calibration of Surface Profile Metrology Tools

Journal Article Barber, S K ; Takacs, P ; Soldate, P ; ... - Journal of Vacuum Science and Technology B

Optical metrology tools, especially for short wavelengths (extreme ultraviolet and x-ray), must cover a wide range of spatial frequencies from the very low, which affects figure, to the important mid-spatial frequencies and the high spatial frequency range, which produces undesirable scattering. A major difficulty in using surface profilometers arises due to the unknown point-spread function (PSF) of the instruments [G. D. Boreman, Modulation Transfer Function in Optical and Electro-Optical Systems (SPIE, Bellingham, WA, 2001)] that is responsible for distortion of the measured surface profile. Generally, the distortion due to the PSF is difficult to account for because the PSF ismore »« less
https://doi.org/10.1116/1.3245997
Development of pseudo-random binary gratings and arrays for calibration of surface profile metrology tools

Conference Barber, Samuel K ; Soldate, Paul ; Anderson, Erik ; ...

Optical Metrology tools, especially for short wavelength (EUV and X-Ray), must cover a wide range of spatial frequencies from the very low, which affects figure, to the important mid-spatial frequencies and the high spatial frequency range, which produces undesirable flair. A major difficulty in using surface profilometers arises due to the unknown Modulation Transfer Function (MTF) of the instruments. Therefore, accurate calibration of profilometers, the understanding of their MTF limitations, and cross calibration between tools represents a considerable challenge for quantitative optical metrology. In previous work the instrumental MTF of a surface profiler was precisely measured using reference test surfacesmore »« less
Full Text Available
New developments in electrical linewidth and overlay metrology for ULSI fabrication processes

Conference Cresswell, M W ; Allen, R A ; Linholm, L W ; ...

Compared to other metrology approaches, electrical test structures for the measurement of dimensional characteristics such as linewidth and overlay directly relate to the electrical performance of the circuits being fabricated. The inherent disadvantage of electrical techniques is that they can be applied only to the extraction of the dimensions of features patterned in electrically-conducting materials. They can not be directly applied to patterned resist films or dielectric material layers. In the case of narrow on-wafer features patterned in resist, for example, linewidths are preferably extracted by electron-beam methods. These methods are sufficiently repeatable for monitoring fabrication-process variations. However, the traceabilitymore »« less
Full Text Available
Development of pseudo-random binary arrays for calibration of surface profile metrology tools

Journal Article Barber, Samuel K ; Soldate, Paul ; Anderson, Erik H ; ... - Journal of Vacuum Science and Technology B

Optical Metrology tools, especially for short wavelength (EUV and X-Ray), must cover a wide range of spatial frequencies from the very low, which affects figure, to the important mid-spatial frequencies and the high spatial frequency range, which produces undesirable scattering. A major difficulty in using surface profilometers arises due to the unknown Point-Spread Function (PSF) of the instruments [1] that is responsible for distortion of the measured surface profile. Generally, the distortion due to the PSF is difficult to account because the PSF is a complex function that comes to the measurement via the convolution operation, while the measured profilemore »« less
Full Text Available

Similar Records

Title: 1.5 nm fabrication of test patterns for characterization of metrological systems

Abstract

Citation Formats

Modeling surface topography of state-of-the-art x-ray mirrors as a result of stochastic polishing process: recent developments conference, September 2016

Modeling surface topography of state-of-the-art x-ray mirrors as a result of stochastic polishing process: recent developments
conference, September 2016