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Title: Measurement of optical scattered power from laser-induced shallow pits on silica

We describe a model for far-field scattered power and irradiance by a silica glass slab with a shallow-pitted exit surface and is experimentally validated. The comparison to the model is performed using a precisely micromachined ensemble of ~11 μm wide laser ablated shallow pits producing 1% of the incident beam scatter in a 10 mrad angle. This series of samples with damage initiations and laser-induced shallow pits resulting from 351 nm, 5 ns pulsed laser cleaning of metal microparticles at different fluences between 2 J/cm2 and 11 J/cm2 are characterized as well and found in good agreement with model predictions.
Authors:
 [1] ;  [1] ;  [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Publication Date:
OSTI Identifier:
1242003
Report Number(s):
LLNL-JRNL--673988
Journal ID: ISSN 0003-6935; APOPAI
Grant/Contract Number:
AC52-07NA27344
Type:
Accepted Manuscript
Journal Name:
Applied Optics
Additional Journal Information:
Journal Volume: 54; Journal Issue: 28; Journal ID: ISSN 0003-6935
Publisher:
Optical Society of America (OSA)
Research Org:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 71 CLASSICAL AND QUANTUMM MECHANICS, GENERAL PHYSICS