Influence of pH on the quantum-size-controlled photoelectrochemical etching of epitaxial InGaN quantum dots
Abstract
Illumination by a narrow-band laser has been shown to enable photoelectrochemical (PEC) etching of InGaN thin films into quantum dots with sizes controlled by the laser wavelength. Here, we investigate and elucidate the influence of solution pH on such quantum-size-controlled PEC etch process. We find that although a pH above 5 is often used for PEC etching of GaN-based materials, oxides (In2O3 and/or Ga2O3) form which interfere with quantum dot formation. Furthermore, at pH below 3, however, oxide-free QDs with self-terminated sizes can be successfully realized.
- Authors:
-
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Publication Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Energy Frontier Research Centers (EFRC) (United States). EFRC for Solid State Lighting Science (SSLS)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- OSTI Identifier:
- 1238656
- Report Number(s):
- SAND-2015-9888J
Journal ID: ISSN 1932-7447; 607996
- Grant/Contract Number:
- AC04-94AL85000
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Physical Chemistry. C
- Additional Journal Information:
- Journal Volume: 119; Journal Issue: 50; Journal ID: ISSN 1932-7447
- Publisher:
- American Chemical Society
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Citation Formats
Xiao, Xiaoyin, Lu, Ping, Fischer, Arthur J., Coltrin, Michael E., Wang, George T., Koleske, Daniel D., and Tsao, Jeffrey Y. Influence of pH on the quantum-size-controlled photoelectrochemical etching of epitaxial InGaN quantum dots. United States: N. p., 2015.
Web. doi:10.1021/acs.jpcc.5b09555.
Xiao, Xiaoyin, Lu, Ping, Fischer, Arthur J., Coltrin, Michael E., Wang, George T., Koleske, Daniel D., & Tsao, Jeffrey Y. Influence of pH on the quantum-size-controlled photoelectrochemical etching of epitaxial InGaN quantum dots. United States. https://doi.org/10.1021/acs.jpcc.5b09555
Xiao, Xiaoyin, Lu, Ping, Fischer, Arthur J., Coltrin, Michael E., Wang, George T., Koleske, Daniel D., and Tsao, Jeffrey Y. Wed .
"Influence of pH on the quantum-size-controlled photoelectrochemical etching of epitaxial InGaN quantum dots". United States. https://doi.org/10.1021/acs.jpcc.5b09555. https://www.osti.gov/servlets/purl/1238656.
@article{osti_1238656,
title = {Influence of pH on the quantum-size-controlled photoelectrochemical etching of epitaxial InGaN quantum dots},
author = {Xiao, Xiaoyin and Lu, Ping and Fischer, Arthur J. and Coltrin, Michael E. and Wang, George T. and Koleske, Daniel D. and Tsao, Jeffrey Y.},
abstractNote = {Illumination by a narrow-band laser has been shown to enable photoelectrochemical (PEC) etching of InGaN thin films into quantum dots with sizes controlled by the laser wavelength. Here, we investigate and elucidate the influence of solution pH on such quantum-size-controlled PEC etch process. We find that although a pH above 5 is often used for PEC etching of GaN-based materials, oxides (In2O3 and/or Ga2O3) form which interfere with quantum dot formation. Furthermore, at pH below 3, however, oxide-free QDs with self-terminated sizes can be successfully realized.},
doi = {10.1021/acs.jpcc.5b09555},
journal = {Journal of Physical Chemistry. C},
number = 50,
volume = 119,
place = {United States},
year = {Wed Nov 18 00:00:00 EST 2015},
month = {Wed Nov 18 00:00:00 EST 2015}
}
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Works referencing / citing this record:
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