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Title: Nucleation of fcc Ta when heating thin films

Thin tantalum films have been studied during in-situ heating in a transmission electron microscope. Diffraction patterns from the as-deposited films were typical of amorphous materials. Crystalline grains were observed to form when the specimen was annealed in-situ at 450°C. Particular attention was addressed to the formation and growth of grains with the face-centered cubic (fcc) crystal structure. As a result, these observations are discussed in relation to prior work on the formation of fcc Ta by deformation and during thin film deposition.
Authors:
 [1] ;  [2] ;  [3]
  1. Univ. of Connecticut, Storrs, CT (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  3. Univ. of Connecticut, Storrs, CT (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Publication Date:
OSTI Identifier:
1235331
Report Number(s):
SAND--2014-16009J
Journal ID: ISSN 1359-6462; PII: S1359646214004102
Grant/Contract Number:
AC04-94AL85000
Type:
Accepted Manuscript
Journal Name:
Scripta Materialia
Additional Journal Information:
Journal Volume: 96; Journal Issue: C; Journal ID: ISSN 1359-6462
Publisher:
Elsevier
Research Org:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
USDOE National Nuclear Security Administration (NNSA)
Country of Publication:
United States
Language:
English
Subject:
focused ion beam (FIB); high-resolution electron microscopy (HREM); transmission electron microscopy (TEM); crystal structure; tantalum