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Title: Studying Resist Stochastics with the Multivariate Poisson Propagation Model

Progress in the ultimate performance of extreme ultraviolet resist has arguably decelerated in recent years suggesting an approach to stochastic limits both in photon counts and material parameters. Here we report on the performance of a variety of leading extreme ultraviolet resist both with and without chemical amplification. The measured performance is compared to stochastic modeling results using the Multivariate Poisson Propagation Model. The results show that the best materials are indeed nearing modeled performance limits.
Authors:
 [1] ;  [1] ;  [1] ;  [2] ;  [2]
  1. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Center for X-ray Optics
  2. Univ. of California, Berkeley, CA (United States). EECS
Publication Date:
OSTI Identifier:
1234543
Report Number(s):
LBNL-186922
Journal ID: ISSN 0914-9244; JSTEEW; ir:186922
Grant/Contract Number:
AC02-05CH11231
Type:
Accepted Manuscript
Journal Name:
Journal of Photopolymer Science and Technology
Additional Journal Information:
Journal Volume: 27; Journal Issue: 6; Journal ID: ISSN 0914-9244
Publisher:
The Society of Photopolymer Science and Technology (SPST)
Research Org:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Materials Sciences Division
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE