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Title: External control of electron energy distributions in a dual tandem inductively coupled plasma

Authors:
 [1] ;  [1] ;  [1] ;  [1] ;  [1] ;  [2] ;  [2]
  1. Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004, USA
  2. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122, USA
Publication Date:
OSTI Identifier:
1229647
Grant/Contract Number:
SC0001939
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 118; Journal Issue: 8; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English