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Title: Pressure-induced structures of Si-doped HfO2

Authors:
 [1] ;  [2] ;  [1] ;  [3] ;  [3] ;  [1]
  1. Department of Materials Science and Engineering, North Carolina State University Raleigh, North Carolina 27695, USA
  2. Department of Materials Science and Engineering, North Carolina State University Raleigh, North Carolina 27695, USA, School of Information Science and Technology, Northwest University, Xi'an 710127, China
  3. HPCAT, Geophysical Laboratory, Carnegie Institution of Washington, Argonne, Illinois 60439, USA
Publication Date:
OSTI Identifier:
1228275
Grant/Contract Number:
FG02-99ER45775; NA0001974; AC02-06CH11357
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 117; Journal Issue: 23; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English