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Title: First principles-based multiparadigm, multiscale strategy for simulating complex materials processes with applications to amorphous SiC films

Authors:
 [1] ;  [2] ;  [3] ;  [3]
  1. Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089-1211, USA, Materials and Process Simulation Center, California Institute of Technology, Pasadena, California 91125, USA
  2. Materials and Process Simulation Center, California Institute of Technology, Pasadena, California 91125, USA
  3. Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089-1211, USA
Publication Date:
OSTI Identifier:
1228128
Type:
Publisher's Accepted Manuscript
Journal Name:
The Journal of Chemical Physics
Additional Journal Information:
Journal Volume: 142; Journal Issue: 17; Journal ID: ISSN 0021-9606
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English