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This content will become publicly available on November 23, 2016

Title: Tunnel oxide passivated contacts formed by ion implantation for applications in silicon solar cells

Authors:
 [1] ;  [2] ;  [2] ;  [3] ;  [3] ;  [3] ;  [3] ;  [2] ;  [2]
  1. Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstrasse 2, 79110 Freiburg, Germany, National Renewable Energy Laboratory (NREL), 15013 Denver West Parkway, Golden, Colorado 80401, USA
  2. Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstrasse 2, 79110 Freiburg, Germany
  3. National Renewable Energy Laboratory (NREL), 15013 Denver West Parkway, Golden, Colorado 80401, USA
Publication Date:
OSTI Identifier:
1226875
Grant/Contract Number:
EE0006336
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 118; Journal Issue: 20; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English