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Title: Ion energies in high power impulse magnetron sputtering with and without localized ionization zones

Authors:
 [1] ;  [2] ;  [3] ;  [4]
  1. School of Materials Science and Engineering, State Key Lab for Materials Processing and Die and Mold Technology, Huazhong University of Science and Technology, Wuhan 430074, China, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
  2. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA, Central Research Institute, Mitsubishi Materials Corporation, 1002-14 Mukohyama, Naka-shi, Ibaraki 311-0102, Japan
  3. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA, Department of Physics, University of California Berkeley, Berkeley, California 94720, USA
  4. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
Publication Date:
OSTI Identifier:
1226723
Grant/Contract Number:
AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 106; Journal Issue: 12; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English