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Title: Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition

Authors:
 [1] ;  [2] ;  [3] ;  [4] ;  [5] ;  [6] ;  [6] ;  [1] ;  [2]
  1. Department of Electrical and Computer Engineering, Iowa State University, Ames, Iowa 50011, USA and Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA
  2. IFIMUP and IN-Institute of Nanoscience and Nanotechnology, Departamento de Física e Astronomia, da Faculdade de Ciências, da Universidade do Porto, Rua do Campo Alegre, 687, 4169-007 Porto, Portugal
  3. Blackett Laboratory, Imperial College, London SW7 2AZ, United Kingdom
  4. Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA
  5. Ames Laboratory, US Department of Energy, Iowa State University, Ames, Iowa 50011, USA, Division of Materials Science and Engineering, Ames Laboratory, Ames, Iowa 50011, USA
  6. X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
Publication Date:
OSTI Identifier:
1226697
Grant/Contract Number:
AC02-07CH11358
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 106; Journal Issue: 3; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English