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Title: Facile electron-beam lithography technique for irregular and fragile substrates

Authors:
 [1];  [1];  [1]
  1. Department of Physics, University of California at Berkeley, Berkeley, California 94720, USA, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA, Kavli Energy NanoSciences Institute at the University of California, Berkeley, California 94720, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1224258
Grant/Contract Number:  
AC02-05CH11231
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Name: Applied Physics Letters Journal Volume: 105 Journal Issue: 17; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Chang, Jiyoung, Zhou, Qin, and Zettl, Alex. Facile electron-beam lithography technique for irregular and fragile substrates. United States: N. p., 2014. Web. doi:10.1063/1.4900505.
Chang, Jiyoung, Zhou, Qin, & Zettl, Alex. Facile electron-beam lithography technique for irregular and fragile substrates. United States. https://doi.org/10.1063/1.4900505
Chang, Jiyoung, Zhou, Qin, and Zettl, Alex. Wed . "Facile electron-beam lithography technique for irregular and fragile substrates". United States. https://doi.org/10.1063/1.4900505.
@article{osti_1224258,
title = {Facile electron-beam lithography technique for irregular and fragile substrates},
author = {Chang, Jiyoung and Zhou, Qin and Zettl, Alex},
abstractNote = {},
doi = {10.1063/1.4900505},
journal = {Applied Physics Letters},
number = 17,
volume = 105,
place = {United States},
year = {Wed Oct 29 00:00:00 EDT 2014},
month = {Wed Oct 29 00:00:00 EDT 2014}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1063/1.4900505

Citation Metrics:
Cited by: 4 works
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