Facile electron-beam lithography technique for irregular and fragile substrates
- Authors:
-
- Department of Physics, University of California at Berkeley, Berkeley, California 94720, USA, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA, Kavli Energy NanoSciences Institute at the University of California, Berkeley, California 94720, USA
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1224258
- Grant/Contract Number:
- AC02-05CH11231
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Name: Applied Physics Letters Journal Volume: 105 Journal Issue: 17; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Chang, Jiyoung, Zhou, Qin, and Zettl, Alex. Facile electron-beam lithography technique for irregular and fragile substrates. United States: N. p., 2014.
Web. doi:10.1063/1.4900505.
Chang, Jiyoung, Zhou, Qin, & Zettl, Alex. Facile electron-beam lithography technique for irregular and fragile substrates. United States. https://doi.org/10.1063/1.4900505
Chang, Jiyoung, Zhou, Qin, and Zettl, Alex. Wed .
"Facile electron-beam lithography technique for irregular and fragile substrates". United States. https://doi.org/10.1063/1.4900505.
@article{osti_1224258,
title = {Facile electron-beam lithography technique for irregular and fragile substrates},
author = {Chang, Jiyoung and Zhou, Qin and Zettl, Alex},
abstractNote = {},
doi = {10.1063/1.4900505},
journal = {Applied Physics Letters},
number = 17,
volume = 105,
place = {United States},
year = {Wed Oct 29 00:00:00 EDT 2014},
month = {Wed Oct 29 00:00:00 EDT 2014}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1063/1.4900505
https://doi.org/10.1063/1.4900505
Other availability
Cited by: 4 works
Citation information provided by
Web of Science
Web of Science
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Effect of flexural modes on squeeze film damping in MEMS cantilever resonators
journal, November 2007
- Pandey, Ashok Kumar; Pratap, Rudra
- Journal of Micromechanics and Microengineering, Vol. 17, Issue 12
Nanoscale Patterning of Protein Using Electron Beam Lithography of Organosilane Self-Assembled Monolayers
journal, August 2005
- Zhang, Guo-Jun; Tanii, Takashi; Zako, Tamotsu
- Small, Vol. 1, Issue 8-9
Application of dry film resist in the fabrication of microfluidic chips for droplet generation
journal, May 2009
- Leech, P. W.; Wu, N.; Zhu, Y.
- Journal of Micromechanics and Microengineering, Vol. 19, Issue 6
Focused ion beam induced deposition of platinum for repair processes
journal, January 1991
- Tao, Tao
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 9, Issue 1
Nanopatterning on Nonplanar and Fragile Substrates with Ice Resists
journal, January 2012
- Han, Anpan; Kuan, Aaron; Golovchenko, Jene
- Nano Letters, Vol. 12, Issue 2
Electrostatically excited and capacitively detected flexural plate waves on thin silicon nitride membranes with chemical sensor applications
journal, March 1994
- Giesler, T.; Meyer, J. -U.
- Sensors and Actuators B: Chemical, Vol. 18, Issue 1-3
Nano patterning on optical fiber and laser diode facet with dry resist
journal, January 2004
- Kelkar, P. S.; Beauvais, J.; Lavallée, E.
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, Issue 3
Lab-on-Fiber Technology: Toward Multifunctional Optical Nanoprobes
journal, March 2012
- Consales, Marco; Ricciardi, Armando; Crescitelli, Alessio
- ACS Nano, Vol. 6, Issue 4
Tunable Superlattice in Graphene To Control the Number of Dirac Points
journal, August 2013
- Dubey, Sudipta; Singh, Vibhor; Bhat, Ajay K.
- Nano Letters, Vol. 13, Issue 9
Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography
journal, August 2011
- Linden, J.; Thanner, Ch.; Schaaf, B.
- Microelectronic Engineering, Vol. 88, Issue 8
Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist
journal, March 2014
- Zhang, Jian; Con, Celal; Cui, Bo
- ACS Nano, Vol. 8, Issue 4
Solid-State Thermal Rectifier
journal, November 2006
- Chang, C. W.; Okawa, D.; Majumdar, A.
- Science, Vol. 314, Issue 5802
Hybrid Nanoimprint−Soft Lithography with Sub-15 nm Resolution
journal, June 2009
- Li, Zhiwei; Gu, Yanni; Wang, Lei
- Nano Letters, Vol. 9, Issue 6
Electromechanical Resonators from Graphene Sheets
journal, January 2007
- Bunch, J. S.; van der Zande, A. M.; Verbridge, S. S.
- Science, Vol. 315, Issue 5811