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Title: Facile electron-beam lithography technique for irregular and fragile substrates

Authors:
 [1] ;  [1] ;  [1]
  1. Department of Physics, University of California at Berkeley, Berkeley, California 94720, USA, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA, Kavli Energy NanoSciences Institute at the University of California, Berkeley, California 94720, USA
Publication Date:
OSTI Identifier:
1224258
Grant/Contract Number:
AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 105; Journal Issue: 17; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English