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Title: Ion polished Cr/Sc attosecond multilayer mirrors for high water window reflectivity

Recent advances in the development of attosecond soft X-ray sources ranging into the water window spectral range, between the 1s states of carbon and oxygen (284 eV–543 eV), are also driving the development of suited broadband multilayer optics for steering and shaping attosecond pulses. The relatively low intensity of current High Harmonic Generation (HHG) soft X-ray sources calls for an efficient use of photons, thus the development of low-loss multilayer optics is of uttermost importance. Here, we report about the realization of broadband Cr/Sc attosecond multilayer mirrors with nearly atomically smooth interfaces by an optimized ion beam deposition and assisted interface polishing process. This yields to our knowledge highest multilayer mirror reflectivity at 300 eV near normal incidence. The results are verified by transmission electron microscopy (TEM) and soft/hard X-ray reflectometry.
Authors:
 [1] ;  [1] ;  [1] ;  [1] ;  [2] ;  [3] ;  [4] ;  [5] ;  [5] ;  [2] ;  [1]
  1. Ludwig-Maximilians-Univ. Munchen, Garching (Germany); Max-Planck-Institut fur Quantenoptik, Garching (Germany)
  2. Ludwig-Maximilians-Univ. Munchen, Munchen (Germany); Max-Planck-Institut fur Eisenforschung GmbH, Dusseldorf (Germany)
  3. Ludwig-Maximilians-Univ. Munchen, Munchen (Germany)
  4. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  5. Ludwig-Maximilians-Univ. Munchen, Garching (Germany); Ludwig, Maximilians-Univ. Munchen, Munchen (Germany)
Publication Date:
OSTI Identifier:
1213052
Grant/Contract Number:
AC02-05CH11231
Type:
Accepted Manuscript
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 22; Journal Issue: 22; Journal ID: ISSN 1094-4087
Publisher:
Optical Society of America (OSA)
Research Org:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS multilayers; x-rays; soft x-rays; extreme ultraviolet (EUV); roughness; mirrors; deposition and fabrication; ultrafast optics