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Title: Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

Authors:
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Publication Date:
OSTI Identifier:
1201001
Type:
Published Article
Journal Name:
ACS Applied Materials and Interfaces
Additional Journal Information:
Journal Volume: 7; Journal Issue: 30; Related Information: CHORUS Timestamp: 2016-09-01 13:39:49; Journal ID: ISSN 1944-8244
Publisher:
American Chemical Society
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
Language:
English