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Title: New strain states and radical property tuning of metal oxides using a nanocomposite thin film approach

Authors:
 [1] ;  [1] ;  [1] ;  [2] ;  [3] ;  [4] ;  [5] ;  [1]
  1. Device Materials Group, Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, United Kingdom
  2. Department of Electrical and Computer Engineering, Texas A&M University, College Station, Texas 77843, USA
  3. Material Science and Engineering Program, Texas A&M University, College Station, Texas 77843, USA
  4. Department of Electrical and Computer Engineering, Texas A&M University, College Station, Texas 77843, USA, Material Science and Engineering Program, Texas A&M University, College Station, Texas 77843, USA
  5. Center for Integrated Nanotechnologies (CINT), Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA
Publication Date:
OSTI Identifier:
1179645
Type:
Published Article
Journal Name:
APL Materials
Additional Journal Information:
Journal Volume: 3; Journal Issue: 6; Journal ID: ISSN 2166-532X
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English