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Title: Atomic-Layer-Deposited Transparent Electrodes for Silicon Heterojunction Solar Cells

We examine damage-free transparent-electrode deposition to fabricate high-efficiency amorphous silicon/crystalline silicon heterojunction solar cells. Such solar cells usually feature sputtered transparent electrodes, the deposition of which may damage the layers underneath. Using atomic layer deposition, we insert thin protective films between the amorphous silicon layers and sputtered contacts and investigate their effect on device operation. We find that a 20-nm-thick protective layer suffices to preserve, unchanged, the amorphous silicon layers beneath. Insertion of such protective atomic-layer-deposited layers yields slightly higher internal voltages at low carrier injection levels. However, we identify the presence of a silicon oxide layer, formed during processing, between the amorphous silicon and the atomic-layer-deposited transparent electrode that acts as a barrier, impeding hole and electron collection.
Authors:
 [1] ;  [1] ;  [2] ;  [2] ;  [2] ;  [1] ;  [1] ;  [1]
  1. École Polytechnique Fédérale de Lausanne (Switzerland). Photovoltaics and Thin-Film Electron. Lab
  2. Eindhoven Univ. of Technology (Netherlands). Dept. of Applied Physics
Publication Date:
OSTI Identifier:
1167177
Grant/Contract Number:
EE0006335
Type:
Accepted Manuscript
Journal Name:
IEEE Journal of Photovoltaics
Additional Journal Information:
Journal Volume: 4; Journal Issue: 6; Journal ID: ISSN 2156-3381
Publisher:
IEEE
Research Org:
École Polytechnique Fédérale de Lausanne (Switzerland). Photovoltaics and Thin-Film Electron. Lab
Sponsoring Org:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY