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Title: General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission

Authors:
; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1103491
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 108; Journal Issue: 23; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society
Country of Publication:
United States
Language:
English

Citation Formats

Campanell, M. D., Khrabrov, A. V., and Kaganovich, I. D. General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission. United States: N. p., 2012. Web. doi:10.1103/PhysRevLett.108.235001.
Campanell, M. D., Khrabrov, A. V., & Kaganovich, I. D. General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission. United States. https://doi.org/10.1103/PhysRevLett.108.235001
Campanell, M. D., Khrabrov, A. V., and Kaganovich, I. D. Mon . "General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission". United States. https://doi.org/10.1103/PhysRevLett.108.235001.
@article{osti_1103491,
title = {General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission},
author = {Campanell, M. D. and Khrabrov, A. V. and Kaganovich, I. D.},
abstractNote = {},
doi = {10.1103/PhysRevLett.108.235001},
journal = {Physical Review Letters},
number = 23,
volume = 108,
place = {United States},
year = {Mon Jun 04 00:00:00 EDT 2012},
month = {Mon Jun 04 00:00:00 EDT 2012}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1103/PhysRevLett.108.235001

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Cited by: 44 works
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