General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1103491
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Physical Review Letters
- Additional Journal Information:
- Journal Volume: 108; Journal Issue: 23; Journal ID: ISSN 0031-9007
- Publisher:
- American Physical Society
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Campanell, M. D., Khrabrov, A. V., and Kaganovich, I. D. General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission. United States: N. p., 2012.
Web. doi:10.1103/PhysRevLett.108.235001.
Campanell, M. D., Khrabrov, A. V., & Kaganovich, I. D. General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission. United States. https://doi.org/10.1103/PhysRevLett.108.235001
Campanell, M. D., Khrabrov, A. V., and Kaganovich, I. D. Mon .
"General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission". United States. https://doi.org/10.1103/PhysRevLett.108.235001.
@article{osti_1103491,
title = {General Cause of Sheath Instability Identified for Low Collisionality Plasmas in Devices with Secondary Electron Emission},
author = {Campanell, M. D. and Khrabrov, A. V. and Kaganovich, I. D.},
abstractNote = {},
doi = {10.1103/PhysRevLett.108.235001},
journal = {Physical Review Letters},
number = 23,
volume = 108,
place = {United States},
year = {Mon Jun 04 00:00:00 EDT 2012},
month = {Mon Jun 04 00:00:00 EDT 2012}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1103/PhysRevLett.108.235001
https://doi.org/10.1103/PhysRevLett.108.235001
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Cited by: 44 works
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