X-ray diffraction studies of trilayer oscillations in the preferred thickness of In films on Si(111)

Gray, A.; Liu, Y.; Hong, Hawoong; Chiang, T. -C.

doi:10.1103/PhysRevB.87.195415

Title: X-ray diffraction studies of trilayer oscillations in the preferred thickness of In films on Si(111)

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Authors:: Gray, A.; Liu, Y.; Hong, Hawoong; Chiang, T. -C.

Publication Date:: Thu May 09 00:00:00 EDT 2013

Sponsoring Org.:: USDOE

OSTI Identifier:: 1102232

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Physical Review B

Additional Journal Information:: Journal Name: Physical Review B Journal Volume: 87 Journal Issue: 19; Journal ID: ISSN 1098-0121

Publisher:: American Physical Society

Country of Publication:: United States

Language:: English

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                    Gray, A., Liu, Y., Hong, Hawoong, and Chiang, T. -C. X-ray diffraction studies of trilayer oscillations in the preferred thickness of In films on Si(111).  United States: N. p., 2013. 
Web.  doi:10.1103/PhysRevB.87.195415.

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                    Gray, A., Liu, Y., Hong, Hawoong, & Chiang, T. -C. X-ray diffraction studies of trilayer oscillations in the preferred thickness of In films on Si(111).  United States.  https://doi.org/10.1103/PhysRevB.87.195415

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                    Gray, A., Liu, Y., Hong, Hawoong, and Chiang, T. -C. Thu .  
"X-ray diffraction studies of trilayer oscillations in the preferred thickness of In films on Si(111)".  United States.  https://doi.org/10.1103/PhysRevB.87.195415.

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@article{osti_1102232,

  title        = {X-ray diffraction studies of trilayer oscillations in the preferred thickness of In films on Si(111)},

  author       = {Gray, A. and Liu, Y. and Hong, Hawoong and Chiang, T. -C.},

  abstractNote = {},

  doi          = {10.1103/PhysRevB.87.195415},

  journal      = {Physical Review B},

  number       = 19,

  volume       = 87,

  place        = {United States},

  year         = {Thu May 09 00:00:00 EDT 2013},

  month        = {Thu May 09 00:00:00 EDT 2013}

}

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