Ultraviolet photosensitivity of sulfur-doped micro- and nano-crystalline diamond
Abstract
The room-temperature photosensitivity of sulfur-doped micro- (MCD), submicro- (SMCD) and nano- (NCD) crystalline diamond films synthesized by hot-filament chemical vapor deposition was studied. The structure and composition of these diamond materials were characterized by Raman spectroscopy, scanning electron microscopy and X-ray diffraction. The UV sensitivity and response time were studied for the three types of diamond materials using a steady state broad UV excitation source and two pulsed UV laser radiations. It was found that they have high sensitivity in the UV region, as high as 109 sec-1mV-1 range, linear response in a broad spectral range below 320 nm, photocurrents around ~10-5 A, and short response time better than 100 ns, which is independent of fluency intensity. A phenomenological model was applied to help understand the role of defects and dopant concentration on the materials’ photosensitivity.
- Authors:
-
- Univ. of Puerto Rico, San Juan, PR (United States). Inst. for Functional Nanomaterials and Dept. of Physics
- Univ. of Puerto Rico, San Juan, PR (United States). Inst. for Functional Nanomaterials and Dept. of Chemistry
- Publication Date:
- Research Org.:
- Univ. of Puerto Rico, San Juan, PR (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Biological and Environmental Research (BER)
- OSTI Identifier:
- 1076497
- Grant/Contract Number:
- FG02-08ER46526
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 109; Journal Issue: 11; Journal ID: ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 77 NANOSCIENCE AND NANOTECHNOLOGY
Citation Formats
Mendoza, Frank, Makarov, Vladimir, Hidalgo, Arturo, Weiner, Brad, and Morell, Gerardo. Ultraviolet photosensitivity of sulfur-doped micro- and nano-crystalline diamond. United States: N. p., 2011.
Web. doi:10.1063/1.3590153.
Mendoza, Frank, Makarov, Vladimir, Hidalgo, Arturo, Weiner, Brad, & Morell, Gerardo. Ultraviolet photosensitivity of sulfur-doped micro- and nano-crystalline diamond. United States. https://doi.org/10.1063/1.3590153
Mendoza, Frank, Makarov, Vladimir, Hidalgo, Arturo, Weiner, Brad, and Morell, Gerardo. Mon .
"Ultraviolet photosensitivity of sulfur-doped micro- and nano-crystalline diamond". United States. https://doi.org/10.1063/1.3590153. https://www.osti.gov/servlets/purl/1076497.
@article{osti_1076497,
title = {Ultraviolet photosensitivity of sulfur-doped micro- and nano-crystalline diamond},
author = {Mendoza, Frank and Makarov, Vladimir and Hidalgo, Arturo and Weiner, Brad and Morell, Gerardo},
abstractNote = {The room-temperature photosensitivity of sulfur-doped micro- (MCD), submicro- (SMCD) and nano- (NCD) crystalline diamond films synthesized by hot-filament chemical vapor deposition was studied. The structure and composition of these diamond materials were characterized by Raman spectroscopy, scanning electron microscopy and X-ray diffraction. The UV sensitivity and response time were studied for the three types of diamond materials using a steady state broad UV excitation source and two pulsed UV laser radiations. It was found that they have high sensitivity in the UV region, as high as 109 sec-1mV-1 range, linear response in a broad spectral range below 320 nm, photocurrents around ~10-5 A, and short response time better than 100 ns, which is independent of fluency intensity. A phenomenological model was applied to help understand the role of defects and dopant concentration on the materials’ photosensitivity.},
doi = {10.1063/1.3590153},
journal = {Journal of Applied Physics},
number = 11,
volume = 109,
place = {United States},
year = {Mon Jun 06 00:00:00 EDT 2011},
month = {Mon Jun 06 00:00:00 EDT 2011}
}
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