skip to main content

DOE PAGESDOE PAGES

Title: Spectroscopic analysis of Al and N diffusion in HfO2

Authors:
 [1] ;  [2] ;  [3] ;  [1] ;  [2] ;  [1]
  1. SEMATECH, 257 Fuller Rd, Albany, New York 12203, USA
  2. National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
  3. Seton Hall University, 400 South Orange Ave, South Orange, New Jersey 07079, USA
Publication Date:
OSTI Identifier:
1074854
Grant/Contract Number:
AC02-98CH10886
Type:
Published Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 112; Journal Issue: 6; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English