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Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
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1

Amorphous silicon/polycrystalline thin film solar cells  

DOE Patents (OSTI)

An improved photovoltaic solar cell is described including a p-type amorphous silicon layer, intrinsic amorphous silicon, and an n-type polycrystalline semiconductor such as cadmium sulfide, cadmium zinc sulfide, zinc selenide, gallium phosphide, and gallium nitride. The polycrystalline semiconductor has an energy bandgap greater than that of the amorphous silicon. The solar cell can be provided as a single-junction device or a multijunction device.

Ullal, H.S.

1991-03-13T23:59:59.000Z

2

Status of Amorphous and Crystalline Thin Film Silicon Solar Cell Activities  

DOE Green Energy (OSTI)

This paper reviews the recent activities and accomplishments of the national Amorphous Silicon Team and a (crystalline) thin-film-Si subteam that was implemented in 2002 to research solar cell devices based on thin crystalline Si based layers. This paper reports the evolution of team organization, the technical highlights from the recent team meetings, and an outlook on commercialization potential.

von Roedern, B.

2003-05-01T23:59:59.000Z

3

Electron energy-loss spectroscopy of boron-doped layers in amorphous thin film silicon solar cells  

E-Print Network (OSTI)

Electron energy-loss spectroscopy of boron-doped layers in amorphous thin film silicon solar cells. de Bariloche, Argentina 3 ECN Solar Energy, High Tech Campus, Building 5, 5656 AE Eindhoven energy-loss spectroscopy (EELS) is used to study p-doped layers in n-i-p amorphous thin film Si solar

Dunin-Borkowski, Rafal E.

4

Amorphous-silicon thin-film heterojunction solar cells  

DOE Green Energy (OSTI)

The investigation of amorphous silicon materials at MTSEC has had two major thrusts: (1) to improve the amorphous material, i.e., obtain a low state density in the gap, improve the carrier collection depth and diminish non-radiative recombinations; and (2) to attempt to understand and improve on the limitations of the junction devices while evaluating the amorphous silicon materials. In the first of these efforts, the investigation has continued to examine the modifications to the a-Si(H) network by alloying silicon with other group IVA elements, either in binary or ternary compositions, and/or by replacing the hydrogenation for defect compensation with a combination of hydrogenation and alkylation or hydrogenation and halogenation. The doped junction layers are being examined in an attempt to determine the limiting characteristics of the junctions in solar cell devices of these amorphous materials. Amorphous alloys of Si-Ge, Si-C, Si-Sn were prepared as well as ternary compositions of Si-Ge-C and Si-Sn-C. In addition, Na vapor was added to the gas feed to deposit a-Si(Na, H) films, and to prepare Si-Sn, fluoride was added along with the tin by vapor additions of SnF/sub 4/ to the gas feed. The optical properties of these materials were measured, and structural and compositional information was obtained from the IR vibrational spectra using the scanning electron microscope and from analyses using scanning Auger microscopy. Electrical measurements have included the dark conductivity and the photo conductivity under room fluorescent light and at AM1 conditions. With alloys that displayed promising photoconductive properties n-i-p devices were prepared to assess the solar cell properties. Details are presented. (WHK)

Cretella, M. C.; Gregory, J. A.; Sandstrom, D. B.; Paul, W.

1981-01-01T23:59:59.000Z

5

Fluorination of amorphous thin-film materials with xenon fluoride  

DOE Patents (OSTI)

A method is disclosed for producing fluorine-containing amorphous semiconductor material, preferably comprising amorphous silicon. The method includes depositing amorphous thin-film material onto a substrate while introducing xenon fluoride during the film deposition process.

Weil, Raoul B. (Haifa, IL)

1988-01-01T23:59:59.000Z

6

Method of producing amorphous thin films  

DOE Patents (OSTI)

This invention dicloses a method for sintering particulate material (such as silica) with a laser beam to produce amorphous optical thin films on substrates.

Brusasco, R.M.

1991-12-31T23:59:59.000Z

7

Amorphous Silicon(a-Si: H) Thin Film Based Omnidirectional Control Solar Powered Vehicle  

Science Conference Proceedings (OSTI)

Through the paper, our goal is to drive a car with the help of thin film based solar cell. Mechanical and Electrical parts are assembled thereby. The main objective of this project is to collect maximum solar energy from the solar spectrum and use that ... Keywords: Thin film Photovoltaic, Single p-i-n Junction, Steering Mechanism, H-Bridge, Gear motor

Abdullah Moinuddin; Md. Jahidul Hoque; Jony C. Sarker; Akhter Zia

2012-03-01T23:59:59.000Z

8

Study of plasma enhanced chemical vapor deposition of boron-doped hydrogenated amorphous silicon thin films and the application to p-channel thin film transistor  

E-Print Network (OSTI)

The material and process characteristics of boron doped hydrogenated amorphous silicon (a-Si:H) thin film deposited by plasma enhanced chemical vapor deposition technique (PECVD) have been studied. The goal is to apply the high quality films deposited at low substrate temperature for devices such as thin film transistors (TFTs). The effect of the deposition parameters such as doping gas concentration, substrate temperature, hydrogen dilution, helium dilution, power density, and pressure at 50 kHz rf frequency on the films' characteristics were analyzed. The films' electrical property was characterized by its dark resistivity. The chemical composition and bonding characteristics were discussed. p-channel TFTs were fabricated with these optimized films. Three different levels of dopant concentrations in the channel were used to detect the dopant effect on the TFT properties. Doping resulted in the increase of film deposition rate. The low film deposition rate at the high temperature deposition corresponds to a dense structured film. The increase of gas phase H? concentration could increase H? etching of the weak bonds in the film, which is consistent with the decrease of the deposition rate. Film's dark conductivity is determined by the atomic B concentration in the film, the substrate temperature, the ion bombardment effect, the surface morphology, and the gas phase and film hydrogen concentration. At high power density and high pressure plasma condition, film with a high deposition rate shows a high conductivity. However, excessive ion bombardment effect, e.g. in powdery plasma region, limits the further increase of the conductivity. Film deposited with He dilution demonstrates a higher conductivity compared to the H? dilution counterpart. This might be attributed to a more effective ion bombardment effect of the former. Powder generation in the plasma significantly affects the conductivity of He diluted film compared to the H? diluted ones, which might be due to the less H? etching effect at the He dilution deposition. The output and transfer characteristics show the normal p-channel TFTs behavior. TFT characteristics, such as mobility, threshold voltage, and on-off current ratio were affected by the doping gas concentration in the channel layer and the deposition process.

Nominanda, Helinda

2004-01-01T23:59:59.000Z

9

Amorphous and nanocrystalline Mg2Si thin-film electrodes  

NLE Websites -- All DOE Office Websites (Extended Search)

Contact Us Department Contacts Media Contacts Amorphous and nanocrystalline Mg2Si thin-film electrodes Title Amorphous and nanocrystalline Mg2Si thin-film electrodes...

10

Amorphous silicon pixel radiation detectors and associated thin film transistor electronics readout  

SciTech Connect

We describe the characteristics of thin (1 {mu}m) and thick (> 30 {mu}m) hydrogenated amorphous silicon p-i-n diodes which are optimized for detecting and recording the spatial distribution of charged particles, x-ray, {gamma} rays and thermal neutrons. For x-ray, {gamma} ray, and charged particle detection we can use thin p-i-n photosensitive diode arrays coupled to evaporated layers of suitable scintillators. For thermal neutron detection we use thin (2{approximately}5 {mu}m) gadolinium converters on 30 {mu}m thick a-Si:H diodes. For direct detection of minimum ionizing particles and others with high resistance to radiation damage, we use the thick p-i-n diode arrays. Diode and amorphous silicon readouts as well as polysilicon pixel amplifiers are described.

Perez-Mendez, V.; Cho, G.; Drewery, J.; Jing, T.; Kaplan, S.N.; Mireshghi, A.; Wildermuth, D. (Lawrence Berkeley Lab., CA (United States)); Goodman, C. (Air Techniques Corp., Hicksville, New York (United States)); Fujieda, I. (NEC Corp., Tokyo (Japan))

1992-07-01T23:59:59.000Z

11

Research on high-efficiency, single-junction, monolithic, thin-film amorphous silicon solar cells: Annual subcontract report, May 1985 - Jul 1986  

DOE Green Energy (OSTI)

A study was undertaken of the optoelectronic properties of amorphous silicon-hydrogen thin films deposited from disilane at high deposition rates. The information derived from this study was used to fabricate amorphous silicon solar cells with efficiencies exceeding 7%. The intrinsic layer of these solar cells was deposited at 15 angstroms/second. Material properties investigated included dark conductivity, photoconductivity, minority carrier diffusion length, and density of states. The solar cells properties characterized were absolute quantum yield and simulated global AM 1.5 efficiencies. Investigations were undertaken utilizing optical and infrared spectroscopy to optimize the microstructures of the intrinsic amorphous silicon. That work was sponsored by the New York State Energy Research and Development Authority. The information was used to optimize the intrinsic layer of amorphous silicon solar cells, resulting in AM 1.5 efficiencies exceeding 7%.

Wiesmann, H.; Dolan, J.; Fricano, G.; Danginis, V.

1987-02-01T23:59:59.000Z

12

Characterization of Amorphous Silicon Thin Films and PV Devices: Final Technical Report, January 1998 - October 2001  

DOE Green Energy (OSTI)

This report describes the most significant results of the three phases: (1) development of a second harmonic detection technique for electron spin resonance (ESR) and optically excited ESR (LESR) in a-Si:H and related alloys, (2) discovery of universal kinetics for the decay of optically excited electrons and holes in a-Si:H and related alloys at low temperatures, (3) first detection of optically excited band-tail electrons and holes in hydrogenated amorphous germanium (a-Ge:H), (4) first ESR study of the kinetics for the production of silicon dangling bonds in a-Si:H at low temperatures, and (5) determination from 1H NMR that there exists an order of magnitude more molecular hydrogen (H2) in a-Si:H than previously measured.

Taylor, P. C.

2002-03-01T23:59:59.000Z

13

Impact of solid-phase crystallization of amorphous silicon on the chemical structure of the buried Si/ZnO thin film solar cell interface  

DOE Green Energy (OSTI)

The chemical interface structure between phosphorus-doped hydrogenated amorphous silicon and aluminum-doped zinc oxide thin films is investigated with soft x-ray emission spectroscopy (XES) before and after solid-phase crystallization (SPC) at 600C. In addition to the expected SPC-induced phase transition from amorphous to polycrystalline silicon, our XES data indicates a pronounced chemical interaction at the buried Si/ZnO interface. In particular, we find an SPC-enhanced formation of Si-O bonds and the accumulation of Zn in close proximity to the interface. For an assumed closed and homogeneous SiO2 interlayer, an effective thickness of (5+2)nm after SPC could be estimated.

Bar, M.; Wimmer, M.; Wilks, R. G.; Roczen, M.; Gerlach, D.; Ruske, F.; Lips, K.; Rech, B.; Weinhardt, L.; Blum, M.; Pookpanratana, S.; Krause, S.; Zhang, Y.; Heske, C.; Yang, W.; Denlinger, J. D.

2010-04-30T23:59:59.000Z

14

Innovative Characterization of Amorphous and Thin-Film Silicon for Improved Module Performance: 1 February 2005 - 31 July 2008  

DOE Green Energy (OSTI)

Electron spin resonance and nuclear magnetic resonance was done on amorphous silicon samples (modules with a-Si:H and a-SixGe1-x:H intrinsic layer) to study defects that contribute to Staebler-Wronski effect.

Taylor, P. C.; Williams, G. A.

2009-09-01T23:59:59.000Z

15

AMORPHOUS THIN FILMS CONSISTING OF TERNARY MgZnCa ...  

Science Conference Proceedings (OSTI)

Jul 20, 2012 ... AMORPHOUS THIN FILMS CONSISTING OF TERNARY MgZnCa-ALLOYS by K. Schlüter, C. Zamponi, U. Schürmann, N. Hort, L. Kienle, K.U. ...

16

Thin-film amorphous silicon alloy research partnership, Phase I. Annual technical progress report, February 2, 1995--February 1, 1996  

DOE Green Energy (OSTI)

The principal objective of this R&D program is to expand, enhance and accelerate knowledge and capabilities for the development of high-performance, two-terminal multifunction amorphous silicon (a-Si) alloy modules. The near-term goal of the program is to achieve 12% stable module efficiency by 1998 using the multifunction approach. This report describes research on back reflectors of Ag/TiO{sub 2}/ZnO.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1996-04-01T23:59:59.000Z

17

Amorphous hafnium-indium-zinc oxide semiconductor thin film transistors  

Science Conference Proceedings (OSTI)

We reported on the performance and electrical properties of co-sputtering-processed amorphous hafnium-indium-zinc oxide (?-HfIZO) thin film transistors (TFTs). Co-sputtering-processed ?-HfIZO thin films have shown an amorphous phase in nature. ...

Sheng-Po Chang; San-Syong Shih

2012-01-01T23:59:59.000Z

18

Method of producing amorphous thin films  

DOE Patents (OSTI)

Disclosed is a method of producing thin films by sintering which comprises: a. coating a substrate with a thin film of an inorganic glass forming parulate material possessing the capability of being sintered, and b. irridiating said thin film of said particulate material with a laser beam of sufficient power to cause sintering of said material below the temperature of liquidus thereof. Also disclosed is the article produced by the method claimed.

Brusasco, Raymond M. (Livermore, CA)

1992-01-01T23:59:59.000Z

19

Studies of pure and nitrogen-incorporated hydrogenated amorphous carbon thin films and their possible application for amorphous silicon solar cells  

Science Conference Proceedings (OSTI)

Hydrogenated amorphous carbon (a-C:H) and nitrogen-incorporated a-C:H (a-C:N:H) thin films were deposited using radio frequency-plasma-enhanced chemical vapor deposition technique and studied for their electrical, optical, and nano-mechanical properties. Introduction of nitrogen and increase of self bias enhanced the conductivity of a-C:H and a-C:N:H films, whereas current-voltage measurement reveals heterojunction formation due to their rectifying behavior. The bandgap of these films was changed over wide range from 1.9 eV to 3.45 eV by varying self bias and the nitrogen incorporation. Further, activation energy was correlated with the electronic structure of a-C:H and a-C:N:H films, and conductivity was discussed as a function of bandgap. Moreover, a-C:N:H films exhibited high hardness and elastic modulus, with maximum values as 42 GPa and 430 GPa, respectively, at -100 V. Observed fascinating electrical, optical, and nano-mechanical properties made it a material of great utility in the development of optoelectronic devices, such as solar cells. In addition, we also performed simulation study for an a-Si:H solar cell, considering a-C:H and C:N:H as window layers, and compared their performance with the a-Si:H solar cell having a-SiC:H as window layer. We also proposed several structures for the development of a near full-spectrum solar cell. Moreover, due to high hardness, a-C:N:H films can be used as a protective and encapsulate layer on solar cells, especially in n-i-p configuration on metal substrate. Nevertheless, a-C:H and a-C:N:H as a window layer can avoid the use of additional hard and protective coating and, hence, minimize the cost of the product.

Dwivedi, Neeraj [Physics of Energy Harvesting Division, National Physical Laboratory (CSIR), K.S. Krishnan Road, New Delhi 110012 (India); Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016 (India); Kumar, Sushil [Physics of Energy Harvesting Division, National Physical Laboratory (CSIR), K.S. Krishnan Road, New Delhi 110012 (India); Malik, Hitendra K. [Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016 (India)

2012-01-01T23:59:59.000Z

20

NANO-INDENTATION OF COPPER THIN FILMS ON SILICON SUBSTRATES  

E-Print Network (OSTI)

NANO-INDENTATION OF COPPER THIN FILMS ON SILICON SUBSTRATES S. Suresh1 , T.-G. Nieh2 and B.W. Choi2: Mechanical properties; Nano-indentation; Thin films; Copper; Dislocations Introduction Indentation methods films on substrates (e.g., [2,3]) using instrumented indentation. Nano-indentation studies of thin films

Suresh, Subra

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


21

Near single-crystalline, high-carrier-mobility silicon thin film on a polycrystalline/amorphous substrate  

DOE Patents (OSTI)

A template article including a base substrate including: (i) a base material selected from the group consisting of polycrystalline substrates and amorphous substrates, and (ii) at least one layer of a differing material upon the surface of the base material; and, a buffer material layer upon the base substrate, the buffer material layer characterized by: (a) low chemical reactivity with the base substrate, (b) stability at temperatures up to at least about 800.degree. C. under low vacuum conditions, and (c) a lattice crystal structure adapted for subsequent deposition of a semiconductor material; is provided, together with a semiconductor article including a base substrate including: (i) a base material selected from the group consisting of polycrystalline substrates and amorphous substrates, and (ii) at least one layer of a differing material upon the surface of the base material; and, a buffer material layer upon the base substrate, the buffer material layer characterized by: (a) low chemical reactivity with the base substrate, (b) stability at temperatures up to at least about 800.degree. C. under low vacuum conditions, and (c) a lattice crystal structure adapted for subsequent deposition of a semiconductor material, and, a top-layer of semiconductor material upon the buffer material layer.

Findikoglu, Alp T. (Los Alamos, NM); Jia, Quanxi (Los Alamos, NM); Arendt, Paul N. (Los Alamos, NM); Matias, Vladimir (Santa Fe, NM); Choi, Woong (Los Alamos, NM)

2009-10-27T23:59:59.000Z

22

Efficient light trapping structure in thin film silicon solar cells  

E-Print Network (OSTI)

Thin film silicon solar cells are believed to be promising candidates for continuing cost reduction in photovoltaic panels because silicon usage could be greatly reduced. Since silicon is an indirect bandgap semiconductor, ...

Sheng, Xing

23

Characterization of amorphous silicon thin films and PV devices: Phase 1 annual technical report: January 1998--January 1999  

DOE Green Energy (OSTI)

Major accomplishments of the previous year include: (1) an evaluation of the potential for n-type doping of a-SiS{sub x}:H and a-SiSe{sub x}:H alloys, (2) an investigation of the optically induced metastabilities in a-SiS{sub x}:H and a-SiSe{sub x}:H alloys with regard to their potential use in photovoltaic applications, and (3) a more detailed understanding of the kinetics of light-induced electron spin resonance (ESR) due to carriers trapped in localized band-tail states in a-Si:H. Also of importance are preliminary measurements of the defects and metastabilities in hot-wire samples of a-Si:H and in samples of a-Si:H made under strong hydrogen dilution. The preliminary measurements on hydrogen dilution suggest that the production of neutral silicon dangling bonds is not suppressed from the standard material even though there appears to be an improvement in the stability of cells made using the hydrogen-dilution process. The new three-chamber, load-locked plasma-enhanced chemical vapor deposition system is functioning and producing intrinsic and doped films of a-Si:H. Plans for the next year include the production of high quality devices using this new deposition system.

Taylor, P.C.

1999-10-27T23:59:59.000Z

24

Silicon Oxynitride Thin Film Barriers for PV Packaging (Poster)  

DOE Green Energy (OSTI)

Dielectric, adhesion-promoting, moisture barriers comprised of silicon oxynitride thin film materials (SiOxNy with various material stoichiometric compositions x,y) were applied to: 1) bare and pre-coated soda-lime silicate glass (coated with transparent conductive oxide SnO2:F and/or aluminum), and polymer substrates (polyethylene terephthalate, PET, or polyethylene napthalate, PEN); plus 2) pre- deposited photovoltaic (PV) cells and mini-modules consisting of amorphous silicon (a-Si) and copper indium gallium diselenide (CIGS) thin-film PV technologies. We used plasma enhanced chemical vapor deposition (PECVD) process with dilute silane, nitrogen, and nitrous oxide/oxygen gas mixtures in a low-power (< or = 10 milliW per cm2) RF discharge at ~ 0.2 Torr pressure, and low substrate temperatures < or = 100(degrees)C, over deposition areas ~ 1000 cm2. Barrier properties of the resulting PV cells and coated-glass packaging structures were studied with subsequent stressing in damp-heat exposure at 85(degrees)C/85% RH. Preliminary results on PV cells and coated glass indicate the palpable benefits of the barriers in mitigating moisture intrusion and degradation of the underlying structures using SiOxNy coatings with thicknesses in the range of 100-200 nm.

del Cueto, J. A.; Glick, S. H.; Terwilliger, K. M.; Jorgensen, G. J.; Pankow, J. W.; Keyes, B. M.; Gedvilas, L. M.; Pern, F. J.

2006-10-03T23:59:59.000Z

25

Research on amorphous-silicon-based thin-film photovoltaic devices: Semiannual subcontract report, 1 July 1987--31 December 1987  

DOE Green Energy (OSTI)

The objective of this work is to develop 13% (aperture area) efficient, 850-cm/sup 2/ four-terminal hybrid tandem submodules. The module design consists of a copper-indium-diselenide (CIS)-based bottom circuit and a semitransparent, thin-film silicon-hydrogen (TFS)-based top circuit. High-performance, semitransparent TFS devices and submodules were fabricated in which ZnO was used in the front and rear transparent conductors. High-performance CIS devices and submodules were also fabricated; however, the location and nature of the junction are not yet understood. Representative four-terminal hybrid tandem devices and submodules were fabricated from TFS and CIS component circuits. Optical coupling between the circuits was lower than expected, because of reflection losses at key interfaces. Efficiencies obtained for these devices and modules include 14.17% for a four-terminal, 4-cm/sup 2/ tandem cell and 12.3% for a four-terminal, tandem module. 7 refs., 90 figs.

Bottenberg, W.; Mitchell, K.; Wieting, R.

1988-05-01T23:59:59.000Z

26

Hard and elastic amorphous carbon nitride thin films studied by 13 C nuclear magnetic  

E-Print Network (OSTI)

Hard and elastic amorphous carbon nitride thin films studied by 13 C nuclear magnetic resonance bonding of hard and elastic amorphous carbon nitride (a-CNx) thin films was examined using solid-state 13 on Si 001 substrates at 300 °C. Nanoindentation tests reveal a recovery of 80%, a hardness of 5 GPa

Reilly, Anne

27

Amorphous carbon thin films for optoelectric device application  

Science Conference Proceedings (OSTI)

Thin films of amorphous carbon (a-C and a-C:H) have been deposited using different carbon precursor materials such as camphor--a natural source, graphite and CH{sub 4}/H{sub 2} mixture by different deposition methods, such as ion beam sputtering, pyrolysis, pulsed laser deposition and r.f. plasma CVD. The films are subjected to various standard characterization techniques in order to tailor the required structural and opto-electrical properties for device applications. The effects of deposition parameters and annealing temperatures on the properties of carbon thin films have been investigated. Both p- and n- type of carbon films have been obtained either through controlling the deposition parameters of a particular method or by doping. Solar cells of various configurations, such as n-C/p-Si, p-C/n-Si and n-C/p-C/p-Si, have been fabricated and their photoresponse characteristics are studied. An efficiency of 1.52% has been obtained, so far, for the cell of configuration n-C/p-C/p-Si. Effects of substrate temperature on the photovoltaic properties are also outlined in brief.

Soga, T.; Jimbo, T.; Krishna, K.M.; Umeno, M.

2000-01-30T23:59:59.000Z

28

NREL: Energy Analysis - Crystalline Silicon and Thin Film Photovoltaic  

NLE Websites -- All DOE Office Websites (Extended Search)

Crystalline Silicon and Thin Film Photovoltaic Results - Life Cycle Crystalline Silicon and Thin Film Photovoltaic Results - Life Cycle Assessment Harmonization Life Cycle Greenhouse Gas Emissions from Solar Photovoltaics (Fact Sheet) Cover of the Life Cycle Greenhouse Gas Emissions from Solar Photovoltaics factsheet Download the Fact Sheet Over the last 30 years, hundreds of life cycle assessments (LCAs) have been conducted and published for a variety of residential and utility-scale solar photovoltaic (PV) systems with wide-ranging results. The inconsistencies in these results can be attributed to the technologies evaluated-such as differing system designs, real-world versus conceptual systems, or technology improvements over time-and life cycle assessment methods and assumptions. To better understand greenhouse gas (GHG) emissions from commercial

29

Formation of thin-film resistors on silicon substrates  

DOE Patents (OSTI)

The formation of thin-film resistors by the ion implantation of a metallic conductive layer in the surface of a layer of phosphosilicate glass or borophosphosilicate glass which is deposited on a silicon substrate. The metallic conductive layer materials comprise one of the group consisting of tantalum, ruthenium, rhodium, platinum and chromium silicide. The resistor is formed and annealed prior to deposition of metal, e.g. aluminum, on the substrate.

Schnable, George L. (Montgomery County, PA); Wu, Chung P. (Hamilton Township, Mercer County, NJ)

1988-11-01T23:59:59.000Z

30

Research on high-efficiency, single-junction, monolithic, thin-film amorphous silicon solar cells: Phase II annual subcontract report, 1 January 1985--31 January 1986  

DOE Green Energy (OSTI)

This report presents results of the second phase of research on high-efficiency, single-junction, monolithic, thin-film a-Si solar cells. Five glow-discharge deposition systems, including a new in-line, multichamber system, were used to grow both doped and undoped a-Si:H. A large number of silane and disilane gas cylinders were analyzed with a gas chromatography/mass spectroscopy system. Strong correlations were found between the breakdown voltage, the deposition rate, the diffusion length, and the conversion efficiency for varying cathode-anode separations in a DC glow-discharge deposition mode. Tin oxide films were grown by chemical vapor deposition with either tetramethyl tin (TMT) or tin tetrachloride (TTC). The best were grown with TMT, but TTC films had a more controlled texture for light trapping and provided a better contact to the p-layer. The best results were obtained with 7059 glass substrates. Efficiencies as high as 10.86% were obtained in p-i-n cells with superlattice p-layers and as high as 10.74% in cells with both superlattice p- and n-layers. Measurements showed that the boron-doping level in the p-layer can strongly affect transport in the i-layer, which can be minimized by reactive flushing before i-layer deposition. Stability of a-Si:H cells is improved by light doping. 51 refs., 64 figs., 21 tabs.

Carlson, D.E.; Ayra, R.R.; Bennett, M.S.; Catalano, A.; D'Aiello, R.V.; Dickson, C.R.; McVeigh, J.; Newton, J.; O'Dowd, J.; Oswald, R.S.; Rajan, K.

1988-09-01T23:59:59.000Z

31

Amorphous semiconducting and conducting transparent metal oxide thin films and production thereof  

DOE Patents (OSTI)

Metal oxide thin films and production thereof are disclosed. An exemplary method of producing a metal oxide thin film may comprise introducing at least two metallic elements and oxygen into a process chamber to form a metal oxide. The method may also comprise depositing the metal oxide on a substrate in the process chamber. The method may also comprise simultaneously controlling a ratio of the at least two metallic elements and a stoichiometry of the oxygen during deposition. Exemplary amorphous metal oxide thin films produced according to the methods herein may exhibit highly transparent properties, highly conductive properties, and/or other opto-electronic properties.

Perkins, John (Boulder, CO); Van Hest, Marinus Franciscus Antonius Maria (Lakewood, CO); Ginley, David (Evergreen, CO); Taylor, Matthew (Golden, CO); Neuman, George A. (Holland, MI); Luten, Henry A. (Holland, MI); Forgette, Jeffrey A. (Hudsonville, MI); Anderson, John S. (Holland, MI)

2010-07-13T23:59:59.000Z

32

Thin-film amorphous silicon alloy research partnership. Phase 2, Annual technical progress report, 2 February 1996--1 February 1997  

DOE Green Energy (OSTI)

This is Phase II of a 3-phase, 3-year program. It is intended to expand, enhance, and accelerate knowledge and capabilities for developing high-performance, two-terminal multijunction amorphous Si alloy modules. We discuss investigations on back reflectors to improve cell performance and investigate uniformity in performance over a 1-sq.-ft. area. We present results on component cell performance, both in the initial and in the light-degraded states, deposited over a 1-sq.-ft. area. The uniformity in deposited is investigated by studying the performance of subcells deposited over the entire area. We also present results on the performance of triple- junction cells and modules. The modules use grid-lines and encapsulants compatible with our production technology. We discuss the novel laser-processing technique that has bee developed at United Solar to improve energy-conversion efficiency and reduce manufacturing costs. We discuss in detail the optimization of the processing steps, and the performance of a laser-processed, triple- junction device of 12.6 cm{sup 2} area is presented. We also present experimental results on investigations of module reliability.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1997-06-01T23:59:59.000Z

33

Electrical and optical properties of sputtered amorphous vanadium oxide thin films  

Science Conference Proceedings (OSTI)

Amorphous vanadium oxide (VO{sub x}) is a component found in composite nanocrystalline VO{sub x} thin films. These types of composite films are used as thermistors in pulsed biased uncooled infrared imaging devices when containing face centered cubic vanadium monoxide phase crystallites, and substantial fractions of amorphous material in the composite are necessary to optimize device electrical properties. Similarly, optoelectronic devices exploiting the metal-to-semiconductor transition contain the room-temperature monoclinic or high-temperature (>68 deg. C) rutile vanadium dioxide phase. Thin films of VO{sub x} exhibiting the metal-to-semiconductor transition are typically polycrystalline or nanocrystalline, implying that significant amounts of disordered, amorphous material is present at grain boundaries or surrounding the crystallites and can impact the overall optical or electronic properties of the film. The performance of thin film material for either application depends on both the nature of the crystalline and amorphous components, and in this work we seek to isolate and study amorphous VO{sub x}. VO{sub x} thin films were deposited by pulsed dc reactive magnetron sputtering to produce amorphous materials with oxygen contents {>=}2, which were characterized electrically by temperature dependent current-voltage measurements and optically characterized by spectroscopic ellipsometry. Film resistivity, thermal activation energy, and complex dielectric function spectra from 0.75 to 6.0 eV were used to identify the impact of microstructural variations including composition and density.

Podraza, N. J. [Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States); Gauntt, B. D. [Materials Characterization Department, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Motyka, M. A.; Horn, M. W. [Department of Engineering Science and Mechanics, Pennsylvania State University, University Park, Pennsylvania 16802 (United States); Dickey, E. C. [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)

2012-04-01T23:59:59.000Z

34

Amorphous silicon-carbon thin films  

DOE Green Energy (OSTI)

This study has shown that it is possible to produce nearly stoichiometric films of a-SiC:H with high hydrogen content by rf sputtering in an atmosphere of argon, propane, and hydrogen. The a-SiC films adhere to a variety of substrates and exhibit better thermal stability than a-Si:H films. The index of refraction is 2.8. The optical gap energy of these films is between 2.0 and 2.2 eV. A series of isochronal annealing steps show that optical gap energies decrease, optical absorption edge widths increase, and that the minimum optical density in the low absorption region increases with annealing above 450/sup 0/C. Infrared measurements show large absorptions at 2100, 1000, 750, and 650 cm/sup -1/ corresponding to SiH stretch, CH wagging, SiC stretch, and SiH wagging vibrational modes. The CH/sub n/ stretch mode near 2900 cm/sup -1/ is very small. Isochronal annealing causes a nearly continuous decrease in the integrated intensity of the SiH stretch mode at 2100 cm/sup -1/. The 2100 absorption peak shape may indicate the presence of SiH/sub 2/ in the film. Comparison of the 2100 and 750 absorption peaks show that the Si-C bonds are more heat resistant than the Si-H bonds. Annealing experiments reveal that the decrease in optical gap energy with increasing annealing temperature is probably not due to change in the Si-H bonds. Rather, the decrease is most likely due to changes or breaks in the C-H bonds and possibly the Si-C bonds. NMR results show that the films have high hydrogen concentrations. Also, NMR results and the integrated intensity for the SiH stretch mode give correct order of magnitude determination of the number and concentration of Si-H bonds in the a-SiC:H films.

Ward, J.F.

1983-09-01T23:59:59.000Z

35

Silicon-integrated thin-film structure for electro-optic applications  

DOE Patents (OSTI)

A crystalline thin-film structure suited for use in any of an number of electro-optic applications, such as a phase modulator or a component of an interferometer, includes a semiconductor substrate of silicon and a ferroelectric, optically-clear thin film of the perovskite BaTiO.sub.3 overlying the surface of the silicon substrate. The BaTiO.sub.3 thin film is characterized in that substantially all of the dipole moments associated with the ferroelectric film are arranged substantially parallel to the surface of the substrate to enhance the electro-optic qualities of the film.

McKee, Rodney A. (Kingston, TN); Walker, Frederick Joseph (Oak Ridge, TN)

2000-01-01T23:59:59.000Z

36

Ambipolar charge transport in microcrystalline silicon thin-film transistors  

Science Conference Proceedings (OSTI)

Hydrogenated microcrystalline silicon ({mu}c-Si:H) is a promising candidate for thin-film transistors (TFTs) in large-area electronics due to high electron and hole charge carrier mobilities. We report on ambipolar TFTs based on {mu}c-Si:H prepared by plasma-enhanced chemical vapor deposition at temperatures compatible with flexible substrates. Electrons and holes are directly injected into the {mu}c-Si:H channel via chromium drain and source contacts. The TFTs exhibit electron and hole charge carrier mobilities of 30-50 cm{sup 2}/V s and 10-15 cm{sup 2}/V s, respectively. In this work, the electrical characteristics of the ambipolar {mu}c-Si:H TFTs are described by a simple analytical model that takes the ambipolar charge transport into account. The analytical expressions are used to model the transfer curves, the potential and the net surface charge along the channel of the TFTs. The electrical model provides insights into the electronic transport of ambipolar {mu}c-Si:H TFTs.

Knipp, Dietmar; Marinkovic, M. [Electronic Devices and Nanophotonics Laboratory, Jacobs University Bremen, 28759 Bremen (Germany); Chan, Kah-Yoong [IEF5-Photovoltaics, Research Center Juelich, 52425 Juelich (Germany); Faculty of Engineering, Multimedia University, Cyberjaya, 63100 Selangor (Malaysia); Gordijn, Aad [IEF5-Photovoltaics, Research Center Juelich, 52425 Juelich (Germany); Stiebig, Helmut [IEF5-Photovoltaics, Research Center Juelich, 52425 Juelich (Germany); Malibu Solar GmbH and Co. KG, 33609 Bielefeld (Germany)

2011-01-15T23:59:59.000Z

37

Hydrogenated amorphous silicon films prepared by glow discharge of disilane  

DOE Green Energy (OSTI)

This report describes the results of an investigation of the properties of hydrogenated amorphous silicon films and the efficiency of amorphous silicon solar cells deposited from disilane at rates of 1.5 nanometers/second or greater. The study was divided into two parts, investigation of basic materials properties of hydrogenated amorphous silicon thin films and the fabrication of glass-P-I-N-metal solar cells. The thin film materials properties investigated included the dark conductivity, photoconductivity, dihydride/monohydride concentration ratio, activation energy, and mobility-lifetime product. Hydrogenated amorphous silicon solar cells were fabricated with an intrinsic layer which was deposited at 1.5 nanometers/second. The absolute and reverse bias quantum yields were measured and solar cell efficiencies of 5% were achieved. Attempts to increase the efficiency by reverse bias annealing are also reported. 7 refs., 27 figs.

Wiesmann, H.J. (UHT Corp., Dobbs Ferry, NY (USA))

1990-01-01T23:59:59.000Z

38

Interactions between radical growth precursors on plasma-deposited silicon thin-film surfaces  

SciTech Connect

We present a detailed analysis of the interactions between growth precursors, SiH{sub 3} radicals, on surfaces of silicon thin films. The analysis is based on a synergistic combination of density functional theory calculations on the hydrogen-terminated Si(001)-(2x1) surface and molecular-dynamics (MD) simulations of film growth on surfaces of MD-generated hydrogenated amorphous silicon (a-Si:H) thin films. In particular, the authors find that two interacting growth precursors may either form disilane (Si{sub 2}H{sub 6}) and desorb from the surface, or disproportionate, resulting in the formation of a surface dihydride (adsorbed SiH{sub 2} species) and gas-phase silane (SiH{sub 4}). The reaction barrier for disilane formation is found to be strongly dependent on the local chemical environment on the silicon surface and reduces (or vanishes) if one/both of the interacting precursors is/are in a ''fast diffusing state,'' i.e., attached to fivefold coordinated surface Si atoms. Finally, activation energy barriers in excess of 1 eV are obtained for two chemisorbed (i.e., bonded to a fourfold coordinated surface Si atom) SiH{sub 3} radicals. Activation energy barriers for disproportionation follow the same tendency, though, in most cases, higher barriers are obtained compared to disilane formation reactions starting from the same initial configuration. MD simulations confirm that disilane formation and disproportionation reactions also occur on a-Si:H growth surfaces, preferentially in configurations where at least one of the SiH{sub 3} radicals is in a ''diffusive state.'' Our results are in agreement with experimental observations and results of plasma process simulators showing that the primary source for disilane in low-power plasmas may be the substrate surface.

Bakos, Tamas; Valipa, Mayur S.; Maroudas, Dimitrios [Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-3110 (United States)

2007-03-21T23:59:59.000Z

39

Physical Properties of HWCVD Microcrystalline Silicon Thin Films: Preprint  

DOE Green Energy (OSTI)

This conference paper describes Microcrystalline silicon films were grown with different thicknesses and different hydrogen dilution ratios on glass and Si substrates. Some films were deposited with a seed layer, whereas others were deposited directly on the substrate. We used atomic force microscopy, scanning electron microscopy, and X-ray diffraction to study the morphology and crystalline structure of the samples. We did not find a significant influence of the different substrates on the morphology or crystalline structure. The presence of the seed layer enhanced the crystallization process, decreasing the amount of amorphous layer present in the films. The microstructure of most films was formed by grains, with a subgrain structure. Films grown with low values of dilution ratio had (220) texture and elongated grains, whereas films deposited with high values of dilution ratio were randomly oriented and had an irregular shape.

Moutinho, H. R.; Romero, M. J.; Jiang, C. S.; Xu, Y.; Nelson, B. P.; Jones, K. M.; Mahan, A. H.; Al-Jassim, M. M.

2002-05-01T23:59:59.000Z

40

Combinatorial Approach to Thin-Film Silicon Materials and Devices: Preprint  

DOE Green Energy (OSTI)

We apply combinatorial approaches to thin-film Si materials and device research. Our hot-wire chemical vapor deposition chamber is fitted with substrate xyz translation, a motorized shutter, and interchangable shadow masks to implement various combinatorial methods. For example, we have explored, in detail, the transition region through which thin Si changes from amorphous to microcrystalline silicon. This transition is very sensitive to deposition parameters such as hydrogen-to-silane dilution of the source gas, chamber pressure, and substrate temperature. A material library, on just a few substrates, led to a three-dimensional map of the transition as it occurs in our deposition system. This map guides our scientific studies and enables us to use several distinct transition materials in our solar-cell optimization research. We also grew thickness-graded wedge samples spanning the amorphous-to-microcrystalline Si transition. These single stripes map the temporal change of the thin silicon phase onto a single spatial dimension. Therefore, the structural, optical, and electrical properties can easily be studied through the phase transition. We have examined the nature of the phase change on the wedges with Raman spectroscopy, atomic force microscopy, extended x-ray absorption fine structure (EXAFS), x-ray absorption near-edge spectroscopy (XANES), ultraviolet reflectivity, and other techniques. Combinatorial techniques also accelerate our device research. In solar cells, for example, the combinatorial approach has significantly accelerated the optimization process of p-, i-, n-, and buffer layers through wide exploration of the complex space of growth parameters and layer thicknesses. Again, only a few deposition runs are needed. It has also been useful to correlate the materials properties of single layers in a device to their performance in the device. We achieve this by depositing layers that extend beyond the device dimensions to permit independent characterization of the layers. Not only has the combinatorial approach greatly increased the rate of materials and device experimentation in our laboratory, it has also been a powerful tool leading to a better understanding of structure-property relationships in thin film Si.

Wang, Q.; Moutinho, H.; To, B.; Perkins, J.; Ginley, D.; Branz, H. M.; Tessler, L. R.; Han, D.

2003-04-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


41

Overview and Challenges of Thin Film Solar Electric Technologies  

DOE Green Energy (OSTI)

In this paper, we report on the significant progress made worldwide by thin-film solar cells, namely, amorphous silicon (a-Si), cadmium telluride (CdTe), and copper indium gallium diselenide (CIGS). Thin-film photovoltaic (PV) technology status is also discussed in detail. In addition, R&D and technology challenges in all three areas are elucidated. The worldwide estimated projection for thin-film PV technology production capacity announcements are estimated at more than 5000 MW by 2010.

Ullal, H. S.

2008-12-01T23:59:59.000Z

42

Selective Formation of Size-Controlled Silicon Nanocrystals by Photosynthesis in SiO Nanoparticle Thin Film  

Science Conference Proceedings (OSTI)

The SiOx thin film with a thickness of about 1 mum was formed on a GaAs substrate by bar-coating with the organic solution of the SiOx nanoparticles (~40 nm). The as-formed SiOx thin film consists of the SiOx ... Keywords: ${hbox{SiO}}_{x}$ , Nanocrystal, Raman, photosynthesis, self- limiting, silicon

Changyong Chen; S. Kimura; S. Nozaki; H. Ono; K. Uchida

2006-11-01T23:59:59.000Z

43

In situ measurements of stress evolution in silicon thin films during  

NLE Websites -- All DOE Office Websites (Extended Search)

In situ measurements of stress evolution in silicon thin films during In situ measurements of stress evolution in silicon thin films during electrochemical lithiation and delithiation Title In situ measurements of stress evolution in silicon thin films during electrochemical lithiation and delithiation Publication Type Journal Article Year of Publication 2010 Authors Sethuraman, Vijay A., Michael J. Chon, Maxwell Shimshak, Venkat Srinivasan, and Pradeep R. Guduru Journal Journal of Power Sources Volume 195 Start Page 5062 Issue 15 Pagination 5062-5066 Date Published 08/2010 Keywords In situ stress measurement, Lithium-ion battery, Mechanical dissipation, Multi-beam optical sensor (MOS), Open-circuit relaxation, Silicon anode Abstract We report in situ measurements of stress evolution in a silicon thin-film electrode during electrochemical lithiation and delithiation by using the multi-beam optical sensor (MOS) technique. Upon lithiation, due to substrate constraint, the silicon electrode initially undergoes elastic deformation, resulting in rapid rise of compressive stress. The electrode begins to deform plastically at a compressive stress of ca. -1.75 GPa; subsequent lithiation results in continued plastic strain, dissipating mechanical energy. Upon delithiation, the electrode first undergoes elastic straining in the opposite direction, leading to a tensile stress of ca. 1 GPa; subsequently, it deforms plastically during the rest of delithiation. The plastic flow stress evolves continuously with lithium concentration. Thus, mechanical energy is dissipated in plastic deformation during both lithiation and delithiation, and it can be calculated from the stress measurements; we show that it is comparable to the polarization loss. Upon current interruption, both the film stress and the electrode potential relax with similar time constants, suggesting that stress contributes significantly to the chemical potential of lithiated silicon.

44

Process For Direct Integration Of A Thin-Film Silicon P-N Junction Diode With A Magnetic Tunnel Junction  

DOE Patents (OSTI)

A process for direct integration of a thin-film silicon p-n junction diode with a magnetic tunnel junction for use in advanced magnetic random access memory (MRAM) cells for high performance, non-volatile memory arrays. The process is based on pulsed laser processing for the fabrication of vertical polycrystalline silicon electronic device structures, in particular p-n junction diodes, on films of metals deposited onto low temperature-substrates such as ceramics, dielectrics, glass, or polymers. The process preserves underlayers and structures onto which the devices are typically deposited, such as silicon integrated circuits. The process involves the low temperature deposition of at least one layer of silicon, either in an amorphous or a polycrystalline phase on a metal layer. Dopants may be introduced in the silicon film during or after deposition. The film is then irradiated with short pulse laser energy that is efficiently absorbed in the silicon, which results in the crystallization of the film and simultaneously in the activation of the dopants via ultrafast melting and solidification. The silicon film can be patterned either before or after crystallization.

Toet, Daniel (Mountain View, CA); Sigmon, Thomas W. (Albuquerque, NM)

2005-08-23T23:59:59.000Z

45

Process for direct integration of a thin-film silicon p-n junction diode with a magnetic tunnel junction  

DOE Patents (OSTI)

A process for direct integration of a thin-film silicon p-n junction diode with a magnetic tunnel junction for use in advanced magnetic random access memory (MRAM) cells for high performance, non-volatile memory arrays. The process is based on pulsed laser processing for the fabrication of vertical polycrystalline silicon electronic device structures, in particular p-n junction diodes, on films of metals deposited onto low temperature-substrates such as ceramics, dielectrics, glass, or polymers. The process preserves underlayers and structures onto which the devices are typically deposited, such as silicon integrated circuits. The process involves the low temperature deposition of at least one layer of silicon, either in an amorphous or a polycrystalline phase on a metal layer. Dopants may be introduced in the silicon film during or after deposition. The film is then irradiated with short pulse laser energy that is efficiently absorbed in the silicon, which results in the crystallization of the film and simultaneously in the activation of the dopants via ultrafast melting and solidification. The silicon film can be patterned either before or after crystallization.

Toet, Daniel (Mountain View, CA); Sigmon, Thomas W. (Albuquerque, NM)

2003-01-01T23:59:59.000Z

46

The future of amorphous silicon photovoltaic technology  

DOE Green Energy (OSTI)

Amorphous silicon modules are commercially available. They are the first truly commercial thin-film photovoltaic (PV) devices. Well-defined production processes over very large areas (>1 m{sup 2}) have been implemented. There are few environmental issues during manufacturing, deployment in the field, or with the eventual disposal of the modules. Manufacturing safety issues are well characterized and controllable. The highest measured initial efficiency to date is 13.7% for a small triple-stacked cell and the highest stabilized module efficiency is 10%. There is a consensus among researchers, that in order to achieve a 15% stabilized efficiency, a triple-junction amorphous silicon structure is required. Fundamental improvements in alloys are needed for higher efficiencies. This is being pursued through the DOE/NREL Thin-Film Partnership Program. Cost reductions through improved manufacturing processes are being pursued under the National Renewable Energy Laboratory/US Department of Energy (NREL/DOE)-sponsored research in manufacturing technology (PVMaT). Much of the work in designing a-Si devices is a result of trying to compensate for the Staebler-Wronski effect. Some new deposition techniques hold promise because they have produced materials with lower stabilized defect densities. However, none has yet produced a high efficiency device and shown it to be more stable than those from standard glow discharge deposited material.

Crandall, R.; Luft, W.

1995-06-01T23:59:59.000Z

47

Low-cost, deterministic quasi-periodic photonic structures for light trapping in thin film silicon solar cells  

E-Print Network (OSTI)

Light trapping has been an important issue for thin film silicon solar cells because of the low absorption coefficient in the near infrared range. In this paper, we present a photonic structure which combines anodic aluminum ...

Sheng, Xing

48

Method of fabrication of display pixels driven by silicon thin film transistors  

DOE Patents (OSTI)

Display pixels driven by silicon thin film transistors are fabricated on plastic substrates for use in active matrix displays, such as flat panel displays. The process for forming the pixels involves a prior method for forming individual silicon thin film transistors on low-temperature plastic substrates. Low-temperature substrates are generally considered as being incapable of withstanding sustained processing temperatures greater than about 200.degree. C. The pixel formation process results in a complete pixel and active matrix pixel array. A pixel (or picture element) in an active matrix display consists of a silicon thin film transistor (TFT) and a large electrode, which may control a liquid crystal light valve, an emissive material (such as a light emitting diode or LED), or some other light emitting or attenuating material. The pixels can be connected in arrays wherein rows of pixels contain common gate electrodes and columns of pixels contain common drain electrodes. The source electrode of each pixel TFT is connected to its pixel electrode, and is electrically isolated from every other circuit element in the pixel array.

Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA)

1999-01-01T23:59:59.000Z

49

Amorphous silicon radiation detectors  

DOE Patents (OSTI)

Hydrogenated amorphous silicon radiation detector devices having enhanced signal are disclosed. Specifically provided are transversely oriented electrode layers and layered detector configurations of amorphous silicon, the structure of which allow high electric fields upon application of a bias thereby beneficially resulting in a reduction in noise from contact injection and an increase in signal including avalanche multiplication and gain of the signal produced by incoming high energy radiation. These enhanced radiation sensitive devices can be used as measuring and detection means for visible light, low energy photons and high energy ionizing particles such as electrons, x-rays, alpha particles, beta particles and gamma radiation. Particular utility of the device is disclosed for precision powder crystallography and biological identification.

Street, Robert A. (Palo Alto, CA); Perez-Mendez, Victor (Berkeley, CA); Kaplan, Selig N. (El Cerrito, CA)

1992-01-01T23:59:59.000Z

50

Amorphous silicon radiation detectors  

DOE Patents (OSTI)

Hydrogenated amorphous silicon radiation detector devices having enhanced signal are disclosed. Specifically provided are transversely oriented electrode layers and layered detector configurations of amorphous silicon, the structure of which allow high electric fields upon application of a bias thereby beneficially resulting in a reduction in noise from contact injection and an increase in signal including avalanche multiplication and gain of the signal produced by incoming high energy radiation. These enhanced radiation sensitive devices can be used as measuring and detection means for visible light, low energy photons and high energy ionizing particles such as electrons, x-rays, alpha particles, beta particles and gamma radiation. Particular utility of the device is disclosed for precision powder crystallography and biological identification. 13 figs.

Street, R.A.; Perez-Mendez, V.; Kaplan, S.N.

1992-11-17T23:59:59.000Z

51

Recent technological advances in thin film solar cells  

DOE Green Energy (OSTI)

High-efficiency, low-cost thin film solar cells are an exciting photovoltaic technology option for generating cost-effective electricity in 1995 and beyond. This paper reviews the substantial advances made by several thin film solar cell technologies, namely, amorphous silicon, copper indium diselenide, cadmium telluride, and polycrystalline silicon. Recent examples of utility demonstration projects of these emerging materials are also discussed. 8 refs., 4 figs.

Ullal, H.S.; Zwelbel, K.; Surek, T.

1990-03-01T23:59:59.000Z

52

NREL: Photovoltaics Research - Thin Film Photovoltaic Partnership Project  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin Film Photovoltaic Partnership Project Thin Film Photovoltaic Partnership Project NREL's Thin Film Photovoltaic (PV) Partnership Project led R&D on emerging thin-film solar technologies in the United States from 1994 to 2009. The project made many advances in thin-film PV technologies that allowed the United States to attain world leadership in this area of solar technology. Three national R&D teams focused on thin-film semiconductor materials: amorphous silicon (a-Si), cadmium telluride (CdTe), and copper indium gallium diselenide (CIGS) and its alloys. The Module Reliability Team and Environmental Health and Safety Team were crosscutting. The teams comprised researchers from the solar industry, academia, and NREL who focused their efforts on improving materials, devices, and manufacturing processes-all

53

Thin film polycrystalline silicon solar cells. Second technical progress report, July 16, 1980-October 15, 1980  

DOE Green Energy (OSTI)

The objectives of this contract are to fabricate large area thin film silicon solar cells with AM1 efficiency of 10% or greater with good reproducibility and good yield and to assess the feasibility of implementing this process for manufacturing solar cells at a cost of $300/kWe. Efforts have been directed to the purification of metallurgical silicon, the preparation and characterization of substrates and epitaxial silicon layers, and the fabrication and characterization of solar cells. The partial purification of metallurgical silicon by extraction with aqua regia has been further investigated in detail, and the resulting silicon was analyzed by the atomic absorption technique. The unidirectional solidification of aqua regia-extracted metallurgical silicon on graphite was used for the preparation of substrates, and the impurity distribution in the substrate was determined and compared with the impurity content in metallurgical silicon. The effects of heat treatment on the impurity distribution in the substrate and in the epitaxial layer have also been investigated. Large area (30 to 60 cm/sup 2/) solar cells have been prepared from aqua regia-extracted metallurgical silicon substrates by depositing a p-n junction structure using the thermal reduction of trichlorosilane containing appropriate dopants. The AM1 efficiencies are about 9% for cells of 30 to 35 cm/sup 2/ area. Larger area, 60 cm/sup 2/, thin film solar cells have been fabricated for the first time, and their AM1 efficiencies are slightly higher than 8%. The spectral response, minority carrier diffusion length, and I/sub sc/-V/sub oc/ relation in a number of solr cells have been measured.

None

1980-10-01T23:59:59.000Z

54

High-Cycle Fatigue of Single-Crystal Silicon Thin Films  

E-Print Network (OSTI)

When subjected to alternating stresses, most materials degrade, e.g., suffer premature failure, due to a phenomenon known as fatigue. It is generally accepted that in brittle materials, such as ceramics, fatigue can only take place in toughened solids, i.e., premature fatigue failure would not be expected in materials such as single crystal silicon. The results of this study, however, appear to be at odds with the current understanding of brittle material fatigue. Twelve thin-film ( 20 m thick) single crystal silicon specimens were tested to failure in a controlled air environment (30 0.1 C, 50 2% relative humidity). Damage accumulation and failure of the notched cantilever beams were monitored electrically during the "fatigue life" test. Specimen lives ranged from about 10 s to 48 days, or 1 10 6 to 1 10 11 cycles before failure over stress amplitudes ranging from approximately 4 to 10 GPa. A variety of mechanisms are discussed in light of the fatigue life data and fracture surface evaluation. [642] Index Terms---Fatigue failure, MEMS devices, single-crystal silicon, thin films.

Christopher L. Muhlstein; Stuart B. Brown; Robert O. Ritchie

2001-01-01T23:59:59.000Z

55

Development of Thin Film Silicon Solar Cell Using Inkjet Printed Silicon and Other Inkjet Processes: Cooperative Research and Development Final Report, CRADA Number CRD-07-260  

Science Conference Proceedings (OSTI)

The cost of silicon photovoltaics (Si-PV) can be greatly lowered by developing thin-film crystalline Si solar cells on glass or an equally lower cost substrate. Typically, Si film is deposited by thermal evaporation, plasma enhanced chemical vapor deposition, and sputtering. NREL and Silexos have worked under a CRADA to develop technology to make very low cost solar cells using liquid organic precursors. Typically, cyclopentasilane (CPS) is deposited on a glass substrate and then converted into an a-Si film by UV polymerization followed by low-temperature optical process that crystallizes the amorphous layer. This technique promises to be a very low cost approach for making a Si film.

Sopori, B.

2012-04-01T23:59:59.000Z

56

Compensated amorphous silicon solar cell  

DOE Patents (OSTI)

An amorphous silicon solar cell incorporates a region of intrinsic hydrogenated amorphous silicon fabricated by a glow discharge wherein said intrinsic region is compensated by P-type dopants in an amount sufficient to reduce the space charge density of said region under illumination to about zero.

Carlson, David E. (Yardley, PA)

1980-01-01T23:59:59.000Z

57

Compensated amorphous silicon solar cell  

SciTech Connect

An amorphous silicon solar cell including an electrically conductive substrate, a layer of glow discharge deposited hydrogenated amorphous silicon over said substrate and having regions of differing conductivity with at least one region of intrinsic hydrogenated amorphous silicon. The layer of hydrogenated amorphous silicon has opposed first and second major surfaces where the first major surface contacts the electrically conductive substrate and an electrode for electrically contacting the second major surface. The intrinsic hydrogenated amorphous silicon region is deposited in a glow discharge with an atmosphere which includes not less than about 0.02 atom percent mono-atomic boron. An improved N.I.P. solar cell is disclosed using a BF.sub.3 doped intrinsic layer.

Devaud, Genevieve (629 S. Humphrey Ave., Oak Park, IL 60304)

1983-01-01T23:59:59.000Z

58

HIGHLY STABLE AMORPHOUS SILICON THIN FILM TRANSISTORS AND INTEGRATION  

E-Print Network (OSTI)

ORGANIC LIGHT EMITTING DIODE DISPLAYS ON CLEAR PLASTIC Bahman Hekmatshoar A DISSERTATION PRESENTED insensitive to the TFT threshold voltage rise which is well-known in a-Si:H devices. Organic light-emitting diodes (OLEDs) are a future technology choice for flexible displays with several advantages over liquid

59

High efficiency thin film silicon solar cells with novel light trapping : principle, design and processing  

E-Print Network (OSTI)

One major efficiency limiting factor in thin film solar cells is weak absorption of long wavelength photons due to the limited optical path length imposed by the thin film thickness. This is especially severe in Si because ...

Zeng, Lirong, Ph. D. Massachusetts Institute of Technology

2008-01-01T23:59:59.000Z

60

The state of the art of thin-film photovoltaics  

DOE Green Energy (OSTI)

Thin-film photovoltaic technologies, based on materials such as amorphous or polycrystalline silicon, copper indium diselenide, cadmium telluride, and gallium arsenide, offer the potential for significantly reducing the cost of electricity generated by photovoltaics. The significant progress in the technologies, from the laboratory to the marketplace, is reviewed. The common concerns and questions raised about thin films are addressed. Based on the progress to date and the potential of these technologies, along with continuing investments by the private sector to commercialize the technologies, one can conclude that thin-film PV will provide a competitive alternative for large-scale power generation in the future.

Surek, T.

1993-10-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


61

High cycle fatigue of polycrystalline silicon thin films in laboratory air  

E-Print Network (OSTI)

When subjected to alternating stresses, most materials degrade, e.g., suffer premature failure, due to a phenomenon known as fatigue. It is generally accepted that in brittle materials, such as ceramics, cyclic fatigue can only take place where there is some degree of toughening, implying that premature fatigue failure would not be expected in polycrystalline silicon where such toughening is absent. However, the fatigue failure of polysilicon is reported in the present work, based on tests on thirteen thin-film (2 µm thick) specimens cycled to failure in laboratory air (~25ºC, 30-50 % relative humidity), where damage accumulation and failure of the notched cantilever beams were monitored electrically during the test. Specimen lives ranged from about 10 seconds to 34 days (5 x 10 5 to 1 x 10 11 cycles) with the stress amplitude at failure being reduced to ~50 % of the low-cycle strength for lives in excess of 10 9 cycles.

C. L. Muhlstein; S. B. Brown; R. O. Ritchie

2000-01-01T23:59:59.000Z

62

Origin of instability by positive bias stress in amorphous Si-In-Zn-O thin film transistor  

Science Conference Proceedings (OSTI)

The origin of instability under positive bias stress (PBS) in amorphous Si-In-Zn-O (SIZO) thin film transistor (TFT) with different Si concentration has been investigated by x-ray photoelectron spectroscopy (XPS) and density of states (DOSs) analysis. It is found that stability of SIZO-TFT with 3 wt. % Si under PBS became more deteriorated than that of 1 wt. % Si incorporated SIZO-TFT due to the increased oxygen related trap distributed in energy range from conduction band to {approx}0.3 eV below the conduction band. The origin of instability under PBS was discussed in terms of oxygen related trap derived from DOSs and XPS analysis.

Hyung Kim, Do [Department of Semiconductor Engineering, Cheongju University, Cheongju, Chungbuk 360-764 (Korea, Republic of); Department of Physics, University of Dongguk, Seoul 100-715 (Korea, Republic of); Youn Yoo, Dong [Future Convergence Research Division, Korea Institute of Science and Technology, Seoul 130-012 (Korea, Republic of); Kwang Jung, Hyun; Hwan Kim, Dae [School of Electrical Engineering, Kookmin University, Seoul 136-702 (Korea, Republic of); Yeol Lee, Sang [Department of Semiconductor Engineering, Cheongju University, Cheongju, Chungbuk 360-764 (Korea, Republic of)

2011-10-24T23:59:59.000Z

63

Analysis of defects at the interface between high-k thin films and (100) silicon  

Science Conference Proceedings (OSTI)

Paramagnetic defects in atomic layer deposition grown aluminium oxide thin films have been studied using electron paramagnetic resonance. Initial spectra indicate the presence of Si-db, P"b"0 and P"b"1 defects, previously observed in Si/SiO"2 structures. ... Keywords: Aluminium oxide, Defects, EPR, High-k, Interfaces, Thin films

B. J. Jones; R. C. Barklie

2005-06-01T23:59:59.000Z

64

Improved performance of amorphous silicon solar cells via scattering from surface plasmon polaritons in nearby metallic nanoparticles  

E-Print Network (OSTI)

s to remove the surface oxide. A 20 nm indium tin oxide ITO contact layer was then depos- ited by rf.S. National Renewable Energy Laboratory for providing a-Si:H thin films for this work. 1 A. Luque and S An engineered enhancement in short-circuit current density and energy conversion efficiency in amorphous silicon

Yu, Edward T.

65

Cermet layer for amorphous silicon solar cells  

DOE Patents (OSTI)

A transparent high work function metal cermet forms a Schottky barrier in a Schottky barrier amorphous silicon solar cell and adheres well to the P+ layer in a PIN amorphous silicon solar cell.

Hanak, Joseph J. (Lawrenceville, NJ)

1979-01-01T23:59:59.000Z

66

Amorphous thin films for solar-cell applications. Final report, September 11, 1978-September 10, 1979  

Science Conference Proceedings (OSTI)

In Section II, Theoretical Modeling, theories for the capture of electrons by deep centers in hydrogenated amorphous silicon (a-Si:H) and for field-dependent quantum efficiency in a-Si:H are presented. In Section III, Deposition and Doping Studies, the optimization of phosphorus-doped a-Si:H carried out in four different discharge systems is described. Some details of the dc proximity and rf magnetron discharge systems are also provided. Preliminary mass spectroscopy studies of the rf magnetron discharge in both SiH/sub 4/ and SiF/sub 4/ are presented. In Section IV, Experimental Methods for Characterizing a-Si:H, recent work involving photoluminescence of fluorine-doped a-Si:H, photoconductivity spectra, the photoelectromagnetic effect, the photo-Hall effect and tunneling into a-Si:H is presented. Also, studies of the growth mechanism of Pt adsorbed on both crystalline Si and a-Si:H are described. Measurements of the surface photovoltage have been used to estimate the distribution of surface states of phosphorus-doped and undoped a-Si:H. Section V, Formation of Solar-Cell Structures, contains information on stacked or multiple-junction a-Si:H solar cells. In Section VI, Theoretical and Experimental Evaluation of Solar-Cell Parameters, an upper limit of approx. = 400 A is established for the hole diffusion length in undoped a-Si:H. A detailed description of carrier generation, recombination and transport in a-Si:H solar cells is given. Finally, some characteristics of Pd-Schottky-barrier cells are described for different processing histories.

Carlson, D E; Balberg, I; Crandall, R S; Goldstein, B C; Hanak, J J; Pankove, J I; Staebler, D L; Weakliem, H A; Williams, R

1980-02-01T23:59:59.000Z

67

High performance thin film transistor with cosputtered amorphous Zn-In-Sn-O channel: Combinatorial approach  

SciTech Connect

Thin film transistors with a channel of Zn-In-Sn-O were fabricated via a combinatorial rf sputtering method. It was found that the role of the In atoms is to enhance the mobility and to shift the threshold voltage (V{sub th}) negatively. On the other hand, the Sn fraction is critical for improving the overall trap density including the density-of-states of the bulk channel layer and the interfacial trap density at the ZnInSnO interface. The optimized transistor was obtained at a compositional ratio of Zn:In:Sn=40:20:40, which exhibited an excellent subthreshold gate swing of 0.12 V/decade, V{sub th} of -0.4 V, and high I{sub on/off} ratio of >10{sup 9} as well as a high field-effect mobility of 24.6 cm{sup 2}/V s.

Ryu, Min Ki; Yang, Shinhyuk; Park, Sang-Hee Ko; Hwang, Chi-Sun [Transparent Electronics Team, ETRI, Daejeon 305-700 (Korea, Republic of); Jeong, Jae Kyeong [Department of Materials Science and Engineering, Inha University, 253 Yonghyun-Dong, Nam-Gu, Incheon 402-751 (Korea, Republic of)

2009-08-17T23:59:59.000Z

68

NREL: Photovoltaics Research - Polycrystalline Thin-Film Materials...  

NLE Websites -- All DOE Office Websites (Extended Search)

in the area of polycrystalline thin-film materials and devices. Printable Version Photovoltaics Research Home Silicon Polycrystalline Thin Films Multijunctions New Materials,...

69

Hydrogenated amorphous silicon photonics.  

E-Print Network (OSTI)

??Silicon Photonics is quickly proving to be a suitable interconnect technology for meeting the future goals of on-chip bandwidth and low power requirements. However, it… (more)

Narayanan, Karthik

2011-01-01T23:59:59.000Z

70

Tandem junction amorphous silicon solar cells  

DOE Patents (OSTI)

An amorphous silicon solar cell has an active body with two or a series of layers of hydrogenated amorphous silicon arranged in a tandem stacked configuration with one optical path and electrically interconnected by a tunnel junction. The layers of hydrogenated amorphous silicon arranged in tandem configuration can have the same bandgap or differing bandgaps.

Hanak, Joseph J. (Lawrenceville, NJ)

1981-01-01T23:59:59.000Z

71

Thin-film polycrystalline silicon solar cells. Quarterly report no. 3, October 16, 1980-January 15, 1981  

DOE Green Energy (OSTI)

The objectives of the project are: 1) to develop cell fabrication procedures to further define the maximum capabilities of the conducting oxide/silicon heterojunction solar cells; 2) to optimize the spray fabrication technique for making reproducible high efficiency cells; 3) to assess the stability and the projected lifetime of the cell structure; 4) to identify through appropriate measurements the effects of grain boundaries and intragrain defects on the electronic transport mechanisms in thin-film polycrystalline silicon; and 5) to determine the feasibility of a large-scale fabrication process. Progress is reported.

Ghosh, A. K.; Feng, T.; Eustace, D. J.; Maruska, H. P.

1981-01-01T23:59:59.000Z

72

Amorphous and nanocrystalline Mg{sub 2}Si thin film electrodes  

DOE Green Energy (OSTI)

Mg{sub 2}Si films, prepared by pulsed laser deposition (PLD), were amorphous, as prepared, and nanocrystalline following annealing. Their micro-structure and electrochemical characteristics were studied by high resolution transmission electron microscopy (HRTEM) and electrochemical cycling against lithium. HRTEM analysis revealed that some excess Si was present in the films. The more amorphous thinner film exhibited excellent cyclability. However, when the film becomes crystalline, the irreversible capacity loss was more significant during the initial cycling and after *50 cycles. Interpretations of the superior stability of the amorphous films are examined.

Song, Seung-Wan; Striebel, Kathryn A.; Song, Xiangyun; Cairns, Elton J.

2003-02-04T23:59:59.000Z

73

Structural Properties Studies of Zinc Oxide Thin Film Grown on Silicon Carbide by Means of X-ray Diffraction Technique  

Science Conference Proceedings (OSTI)

In this work, the structural properties of the zinc oxide (ZnO) thin film on silicon carbide (6H-SiC) grown by radio frequency sputtering technique are investigated thoroughly by means of X-ray diffraction (XRD) technique. Both conventional XRD phase analysis and rocking curve measurements are carried out in order to determine the crystalline structure and the crystalline quality of the ZnO sample. From the phase analysis, intense peaks correspond to ZnO(002), iC(006) and their multiple reflections, i.e. ZnO(004) and SiC(0012) are observed. This result suggests that the ZnO thin film is in wurzite structure. Through the simulation of XRD rocking curve of the ZnO(002) peak, the lattice mismatch of 5.49% is obtained.

Ching, C. G.; Ng, S. S.; Hassan, Z.; Hassan, H. Abu; Al-Hardan, N. H.; Abdullah, M. J. [Nano-optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, 11800, Penang (Malaysia)

2011-03-30T23:59:59.000Z

74

Chemical vapor deposition of hydrogenated amorphous silicon from disilane  

SciTech Connect

The authors describe hydrogenated amorphous silicon (a-Si:H) thin films deposited at growth rates of 1 to 30 A/s by chemical vapor deposition (CVD) from disilane source gas at 24 torr total pressure in a tubular reactor. The effects of substrate temperature and gas holding time (flow rate) on film growth rate and effluent gas composition were measured at temperatures ranging from 360{sup 0} to 485{sup 0}C and gas holding times from 3 to 62s. Effluent gases determined by gas chromatography included silane, disilane and other higher order silanes. A chemical reaction engineering model, based on a silylene (SiH/sub 2/) insertion gas phase reaction network and film growth from both SiH/sub 2/ and high molecular weight silicon species, Si/sub n/H/sub 2n/, was developed. The model predictions were in good agreement with experimentally determined growth rates and effluent gas compositions.

Bogaert, R.J.; Russell, T.W.F.; Klein, M.T. (Delaware Univ., Newark, DE (USA). Dept. of Chemical Engineering); Rocheleau, R.E.; Baron, B.N. (Delaware Univ., Newark, DE (USA). Inst. of Energy Conversion)

1989-10-01T23:59:59.000Z

75

Solar photovoltaic technology: The thin film option  

DOE Green Energy (OSTI)

Photovoltaics (PV) the direct conversion of sunlight to electricity was first discovered by scientists at the Bell Labs in 1954. In the late 1960's and 1970's most of the solar cell technology has been used for space applications to power satellites. The main work horse for the PV technology has been crystalline silicon (Si) solar cells. Over the past 15 years this has led to cost reduction from $35/kWh to about $0.30/kWh at the present time. Demonstrated reliability of 20 years or more has resulted in acceptance by several utilities. However, cost reductions in crystalline Si solar cells have been limited by the cost of wafering of ingots and the attendant loss of material. A number of Si sheet solar cells are also being investigated. In the past decade the emphasis of the research and development effort has been focused on thin film solar cells, which have the potential for generating power at much lower cost of $1-2/Wp. Thin film solar cells that are presently being investigated and are generating global attention are: amorphous silicon (a-Si:H), cadmium telluride (CdTe), and copper indium diselenide (CuInSe/sub 2,/ or CIS). In the past few years, considerable progress has been; made by all three of these thin film solar cells. This paper reviews the current status and future potential of these exiting thin film solar cell technologies.

Ullal, H.S.; Zweibel, K.; Sabisky, E.S.; Surek, T.

1988-01-01T23:59:59.000Z

76

Amorphous Indium-Zinc-Oxide Transparent Conductors for Thin Film PV: Preprint  

Science Conference Proceedings (OSTI)

Amorphous InZnO's (a-IZO) basic PV applicability has now been demonstrated in prototype CIGS, Si Heterojunction (SiHJ) and organic photovoltaics (OPV). However, to move beyond initial demonstration devices, improved TCO properties and processibility of the a-IZO films are needed. Here, RF-superimposed DC sputtering was used to improve the reliable deposition of a-IZO with conductivity > 3000 S/cm.

Perkins, J.; Gennett, T.; Galante, M.; Gillaspie, D.; Ginley, D.

2011-07-01T23:59:59.000Z

77

Amorphous Indium-Zinc-Oxide Transparent Conductors for Thin Film PV  

Science Conference Proceedings (OSTI)

Amorphous InZnO's (a-IZO) basic PV applicability has now been demonstrated in prototype CIGS, Si Heterojunction (SiHJ) and organic photovoltaics (OPV). However, to move beyond initial demonstration devices, improved TCO properties and processibility of the a-IZO films are needed. Here, RF-superimposed DC sputtering was used to improve the reliable deposition of a-IZO with conductivity {sigma} >; 3000 S/cm.

Perkins, J.; Gennett, T.; Galante, M.; Gillaspie, D.; Ginley, D.

2011-01-01T23:59:59.000Z

78

Development of Commercial Technology for Thin Film Silicon Solar Cells on Glass: Cooperative Research and Development Final Report, CRADA Number CRD-07-209  

DOE Green Energy (OSTI)

NREL has conducted basic research relating to high efficiency, low cost, thin film silicon solar cell design and the method of making solar cells. Two patents have been issued to NREL in the above field. In addition, specific process and metrology tools have been developed by NREL. Applied Optical Sciences Corp. (AOS) has expertise in the manufacture of solar cells and has developed its own unique concentrator technology. AOS wants to complement its solar cell expertise and its concentrator technology by manufacturing flat panel thin film silicon solar cell panels. AOS wants to take NREL's research to the next level, using it to develop commercially viable flat pane, thin film silicon solar cell panels. Such a development in equipment, process, and metrology will likely produce the lowest cost solar cell technology for both commercial and residential use. NREL's fundamental research capability and AOS's technology and industrial background are complementary to achieve this product development.

Sopori, B.

2013-03-01T23:59:59.000Z

79

Amorphous silicon solar cell allowing infrared transmission  

DOE Patents (OSTI)

An amorphous silicon solar cell with a layer of high index of refraction material or a series of layers having high and low indices of refraction material deposited upon a transparent substrate to reflect light of energies greater than the bandgap energy of the amorphous silicon back into the solar cell and transmit solar radiation having an energy less than the bandgap energy of the amorphous silicon.

Carlson, David E. (Yardley, PA)

1979-01-01T23:59:59.000Z

80

Ne{sup +} ion sputtering effect on amorphous Ga-In-Zn-O thin-film surface investigated by high-resolution XPS  

Science Conference Proceedings (OSTI)

The effect of Ne{sup +} ion sputtering on amorphous Ga-In-Zn-O (a-GIZO) thin films was investigated by using surface-sensitive, synchrotron-radiation-based, high-resolution X-ray photoelectron spectroscopy (XPS). a-GIZO thin films having different compositions (Ga{sub 2}O{sub 3}:In{sub 2}O{sub 3}:ZnO = 1:1:1, 2:2:1, 3:2:1, 4:2:1) were investigated. It was found out that the amounts of the In and Zn contents relative to that of Ga decreased noticeably after sufficient sputtering, and that there occurred a subgap state above the valence band maximum and metallic states at the In 3d and 4d core levels as well as at the Fermi edge.

Kang, Se-Jun; Lee, Mi Ji [Department of Physics, POSTECH, Pohang 790-784 (Korea, Republic of); Baik, Jae Yoon; Kim, Hyeong-Do; Thakur, Anup [Pohang Accelerator Laboratory, POSTECH, Pohang 790-784 (Korea, Republic of); Shin, Hyun-Joon [Department of Physics, POSTECH, Pohang 790-784 (Korea, Republic of); Pohang Accelerator Laboratory, POSTECH, Pohang 790-784 (Korea, Republic of); Chung, JaeGwan; Lee, Eunha; Lee, Jaecheol; Lee, JaeHak [A E Group, Samsung Advanced Institute of Technology, Yongin-si 440-712 (Korea, Republic of)

2011-12-23T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
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We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


81

The Effects of Damage on Hydrogen-Implant-Induced Thin-Film Separation from Bulk Silicon Carbide  

DOE Green Energy (OSTI)

Exfoliation of Sic by hydrogen implantation and subsequent annealing forms the basis for a thin-film separation process which, when combined with hydrophilic wafer bonding, can be exploited to produce silicon-carbide-on-insulator, SiCOI. Sic thin films produced by this process exhibit unacceptably high resistivity because defects generated by the implant neutralize electrical carriers. Separation occurs because of chemical interaction of hydrogen with dangling bonds within microvoids created by the implant, and physical stresses due to gas-pressure effects during post-implant anneal. Experimental results show that exfoliation of Sic is dependent upon the concentration of implanted hydrogen, but the damage generated by the implant approaches a point when exfoliation is, in fact, retarded. This is attributed to excessive damage at the projected range of the implant which inhibits physical processes of implant-induced cleaving. Damage is controlled independently of hydrogen dosage by elevating the temperature of the SiC during implant in order to promote dynamic annealing. The resulting decrease in damage is thought to promote growth of micro-cracks which form a continuous cleave. Channeled H{sup +} implantation enhances the cleaving process while simultaneously minimizing residual damage within the separated film. It is shown that high-temperature irradiation and channeling each reduces the hydrogen fluence required to affect separation of a thin film and results in a lower concentration of defects. This increases the potential for producing SiC01 which is sufficiently free of defects and, thus, more easily electrically activated.

Gregory, R.B.; Holland, O.W.; Thomas, D.K.; Wetteroth, T.A.; Wilson, S.R.

1999-04-05T23:59:59.000Z

82

Compensated amorphous-silicon solar cell  

DOE Patents (OSTI)

An amorphous silicon solar cell including an electrically conductive substrate, a layer of glow discharge deposited hydrogenated amorphous silicon having regions of differing conductivity with at least one region of intrinsic hydrogenated amorphous silicon. The layer of hydrogenated amorphous silicon has opposed first and second major surfaces where the first major surface contacts the elecrically conductive substrate and an electrode for electrically contacting the second major surface. The intrinsic hydrogenated amorphous silicon region is deposited in a glow discharge with an atmosphere which includes not less than about 0.02 atom percent mono-atomic boron. An improved N.I.P. solar cell is disclosed using a BF/sub 3/ doped intrinsic layer.

Devaud, G.

1982-06-21T23:59:59.000Z

83

Impact of the surface-near silicon substrate properties on the microstructure of sputter-deposited AlN thin films  

Science Conference Proceedings (OSTI)

In micro-/nanomachined devices and systems, aluminum nitride (AlN) thin films are widely used due to their piezoelectric properties. This work evaluates the potential of modifying the interface between the AlN thin film and the silicon (Si) wafer serving as bottom electrode for optimized crystallographic orientation and, hence, improved electrical and piezoelectric properties. The films were analyzed using temperature-dependant leakage current measurements, transmission electron microscopy, and x-ray diffraction. By preconditioning of the Si substrate surface applying sputter etching prior to film deposition, leakage current levels are substantially decreased and an increased (002) orientation of the AlN grains is observed.

Schneider, M.; Bittner, A.; Patocka, F.; Schmid, U. [Department for Microsystems Technology, Institute of Sensor and Actuator Systems, Vienna University of Technology, Floragasse 7, A-1040 Vienna (Austria); Stoeger-Pollach, M. [University Service Center for Transmission Electron Microscopy (USTEM), Vienna University of Technology, Wiedner Hauptstrasse 8-10/052, 1040 Vienna (Austria); Halwax, E. [Institute of Chemical Technologies and Analytics, Vienna University of Technology, Getreidemarkt 9, A-1060 Vienna (Austria)

2012-11-26T23:59:59.000Z

84

Photochemical vapor deposition of amorphous silicon photovoltaic devices. Semiannual subcontract report, 1 May 1985-31 October 1985  

DOE Green Energy (OSTI)

Intrinsic, p-type, and n-type hydrogenated amorphous silicon thin-films have been deposited by mercury-sensitized photochemical vapor deposition (photo-CVD) from disilane. The photochemical reactor design includes two chambers separated by a movable uv-transparent Teflon curtain to eliminate deposition on the reactor window. Glass/TCO/p-i-n/metal photovoltaic devices were fabricated by photo-CVD. The efficiency at 87.5 MW/cm/sup 2/(ELH) was 5.1%.

Baron, B.N.; Rocheleau, R.E.; Hegedus, S.S.

1986-06-01T23:59:59.000Z

85

Producer-Focused Life Cycle Assessment of Thin-Film Silicon Photovoltaic Systems  

E-Print Network (OSTI)

microcrystalline- silicon photovoltaic cell, B) range ofpayback of roof mounted photovoltaic cells. Boustead, I. andmicrocrystalline-silicon photovoltaic cell, B) range of

Zhang, Teresa Weirui

2011-01-01T23:59:59.000Z

86

Electronic processes in thin-film PV materials. Final report  

DOE Green Energy (OSTI)

The electronic and optical processes in an important class of thin-film PV materials, hydrogenated amorphous silicon (a-Si:H) and related alloys, have been investigated using several experimental techniques designed for thin-film geometries. The experimental techniques include various magnetic resonance and optical spectroscopies and combinations of these two spectroscopies. Two-step optical excitation processes through the manifold of silicon dangling bond states have been identifies as important at low excitation energies. Local hydrogen motion has been studied using nuclear magnetic resonance techniques and found to be much more rapid than long range diffusion as measured by secondary ion mass spectroscopy. A new metastable effect has been found in a-Si:H films alloyed with sulfur. Spin-one optically excited states have been unambiguously identified using optically detected electron spin resonance. Local hydrogen bonding in microcrystalline silicon films has been studied using NMR.

Taylor, P.C.; Chen, D.; Chen, S.L. [and others

1998-07-01T23:59:59.000Z

87

High-rate deposition of hydrogenated amorphous silicon films and devices  

DOE Green Energy (OSTI)

This report summarizes the status of high-rate deposition technologies associated with amorphous silicon thin films for photovoltaic applications. The report lists (1) deposition rates for a-Si:H films according to source and method and (2) efficiencies and other parameters of a-Si:H solar cells. Two main deposition source materials, silane and disilane, are discussed, as well as effects of boron doping. The effects of various deposition parameters on film characteristics and on deposition rate are presented, as well as the effects of annealing on high-deposition-rate films. Light-induced effects are also discussed. Finally, progress and problems in this field of study are summarized.

Luft, W.

1987-04-01T23:59:59.000Z

88

Crystallization and doping of amorphous silicon on low temperature plastic  

DOE Patents (OSTI)

A method or process of crystallizing and doping amorphous silicon (a-Si) on a low-temperature plastic substrate using a short pulsed high energy source in a selected environment, without heat propagation and build-up in the substrate is disclosed. The pulsed energy processing of the a-Si in a selected environment, such as BF3 and PF5, will form a doped micro-crystalline or poly-crystalline silicon (pc-Si) region or junction point with improved mobilities, lifetimes and drift and diffusion lengths and with reduced resistivity. The advantage of this method or process is that it provides for high energy materials processing on low cost, low temperature, transparent plastic substrates. Using pulsed laser processing a high (>900 C), localized processing temperature can be achieved in thin films, with little accompanying temperature rise in the substrate, since substrate temperatures do not exceed 180 C for more than a few microseconds. This method enables use of plastics incapable of withstanding sustained processing temperatures (higher than 180 C) but which are much lower cost, have high tolerance to ultraviolet light, have high strength and good transparency, compared to higher temperature plastics such as polyimide. 5 figs.

Kaschmitter, J.L.; Truher, J.B.; Weiner, K.H.; Sigmon, T.W.

1994-09-13T23:59:59.000Z

89

Crystallization and doping of amorphous silicon on low temperature plastic  

DOE Patents (OSTI)

A method or process of crystallizing and doping amorphous silicon (a-Si) on a low-temperature plastic substrate using a short pulsed high energy source in a selected environment, without heat propagation and build-up in the substrate. The pulsed energy processing of the a-Si in a selected environment, such as BF3 and PF5, will form a doped micro-crystalline or poly-crystalline silicon (pc-Si) region or junction point with improved mobilities, lifetimes and drift and diffusion lengths and with reduced resistivity. The advantage of this method or process is that it provides for high energy materials processing on low cost, low temperature, transparent plastic substrates. Using pulsed laser processing a high (>900.degree. C.), localized processing temperature can be achieved in thin films, with little accompanying temperature rise in the substrate, since substrate temperatures do not exceed 180.degree. C. for more than a few microseconds. This method enables use of plastics incapable of withstanding sustained processing temperatures (higher than 180.degree. C.) but which are much lower cost, have high tolerance to ultraviolet light, have high strength and good transparency, compared to higher temperature plastics such as polyimide.

Kaschmitter, James L. (Pleasanton, CA); Truher, Joel B. (Palo Alto, CA); Weiner, Kurt H. (Campbell, CA); Sigmon, Thomas W. (Beaverton, OR)

1994-01-01T23:59:59.000Z

90

Advances in thin-film solar cells for lightweight space photovoltaic power  

SciTech Connect

The present stature and current research directions of photovoltaic arrays as primary power systems for space are reviewed. There have recently been great advances in the technology of thin-film solar cells for terrestrial applications. In a thin-film solar cell the thickness of the active element is only a few microns; transfer of this technology to space arrays could result in ultralow-weight solar arrays with potentially large gains in specific power. Recent advances in thin-film solar cells are reviewed, including polycrystalline copper-indium selenide (CuInSe2) and related I-III-VI2 compounds, polycrystalline cadmium telluride and related II-VI compounds, and amorphous silicon:hydrogen and alloys. The best experimental efficiency on thin-film solar cells to date is 12 percent AMO for CuInSe2. This efficiency is likely to be increased in the next few years. The radiation tolerance of thin-film materials is far greater than that of single-crystal materials. CuInSe2 shows no degradation when exposed to 1 MeV electrons. Experimental evidence also suggests that most of all of the radiation damage on thin-films can be removed by a low temperature anneal. The possibility of thin-film multibandgap cascade solar cells is discussed, including the tradeoffs between monolithic and mechanically stacked cells. The best current efficiency for a cascade is 12.5 percent AMO for an amorphous silicon on CuInSe2 multibandgap combination. Higher efficiencies are expected in the future. For several missions, including solar-electric propulsion, a manned Mars mission, and lunar exploration and manufacturing, thin-film photovolatic arrays may be a mission-enabling technology.

Landis, G.A.; Bailey, S.G.; Flood, D.J.

1989-01-01T23:59:59.000Z

91

SunShot Initiative: Thin Film Photovoltaics Research  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin Film Photovoltaics Research Thin Film Photovoltaics Research to someone by E-mail Share SunShot Initiative: Thin Film Photovoltaics Research on Facebook Tweet about SunShot Initiative: Thin Film Photovoltaics Research on Twitter Bookmark SunShot Initiative: Thin Film Photovoltaics Research on Google Bookmark SunShot Initiative: Thin Film Photovoltaics Research on Delicious Rank SunShot Initiative: Thin Film Photovoltaics Research on Digg Find More places to share SunShot Initiative: Thin Film Photovoltaics Research on AddThis.com... Concentrating Solar Power Photovoltaics Research & Development Crystalline Silicon Thin Films Multijunctions Organic Photovoltaics Dye-Sensitized Solar Cells Competitive Awards Systems Integration Balance of Systems Thin Film Photovoltaics Research The U.S. Department of Energy (DOE) supports research and development of

92

Method for formation of thin film transistors on plastic substrates  

DOE Patents (OSTI)

A process for formation of thin film transistors (TFTs) on plastic substrates replaces standard thin film transistor fabrication techniques, and uses sufficiently lower processing temperatures so that inexpensive plastic substrates may be used in place of standard glass, quartz, and silicon wafer-based substrates. The process relies on techniques for depositing semiconductors, dielectrics, and metals at low temperatures; crystallizing and doping semiconductor layers in the TFT with a pulsed energy source; and creating top-gate self-aligned as well as back-gate TFT structures. The process enables the fabrication of amorphous and polycrystalline channel silicon TFTs at temperatures sufficiently low to prevent damage to plastic substrates. The process has use in large area low cost electronics, such as flat panel displays and portable electronics.

Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Sigmon, Thomas W. (Portola Valley, CA); Aceves, Randy C. (Livermore, CA)

1998-10-06T23:59:59.000Z

93

Low emissivity high-temperature tantalum thin film coatings for silicon devices  

E-Print Network (OSTI)

The authors study the use of thin ( ? 230?nm) tantalum (Ta) layers on silicon (Si) as a low emissivity (high reflectivity) coating for high-temperature Si devices. Such coatings are critical to reduce parasitic radiation ...

Rinnerbauer, Veronika

94

Experimental Investigation of Size Effects on the Thermal Conductivity of Silicon-Germanium Alloy Thin Films  

E-Print Network (OSTI)

We experimentally investigate the role of size effects and boundary scattering on the thermal conductivity of silicon-germanium alloys. The thermal conductivities of a series of epitaxially grown Si[subscript 1-x] Ge[subscript ...

Cheaito, Ramez

95

Thin film polycrystalline silicon solar cells. Quarterly report No. 1, October 1-December 31, 1979  

DOE Green Energy (OSTI)

The MoSi/sub 2/ separation layer growth rate has been studied as a function of time and temperature. The presence of small amounts of O/sub 2/ in the silicon deposition ambient were found to inhibit the growth rate of the MoSi/sub 2/ layer and also to affect the reliability of shear separation. Void formation in silicon at the Si-MoSi/sub 2/ interface, due predominantly to diffusion of silicon through the MoSi/sub 2/ layer was observed. This is believed to be responsible for shear separation occurring in the silicon film. Gas chromatograhic procedures were developed for characterizing the silicon deposition process. Coherent twin bundles in the grain-enhanced silicon films were not found to adversely influence solar cell efficiency. Several 1 cm x 2 cm solar cells were fabricated. Performance characteristics of these cells are discussed; the best device had a conversion efficiency of 10.7% (under simulated AM1 illumination) with V/sub OC/ = 0.545 V, J/sub SC/ = 28.65 mA/cm/sup 2/ and FF = 68.3%.

Sarma, K.R.; Rice, M.J.; Legge, R.

1979-01-01T23:59:59.000Z

96

Amorphous Silicon Based Neutron Detector  

SciTech Connect

Various large-scale neutron sources already build or to be constructed, are important for materials research and life science research. For all these neutron sources, neutron detectors are very important aspect. However, there is a lack of a high-performance and low-cost neutron beam monitor that provides time and temporal resolution. The objective of this SBIR Phase I research, collaboratively performed by Midwest Optoelectronics, LLC (MWOE), the University of Toledo (UT) and Oak Ridge National Laboratory (ORNL), is to demonstrate the feasibility for amorphous silicon based neutron beam monitors that are pixilated, reliable, durable, fully packaged, and fabricated with high yield using low-cost method. During the Phase I effort, work as been focused in the following areas: 1) Deposition of high quality, low-defect-density, low-stress a-Si films using very high frequency plasma enhanced chemical vapor deposition (VHF PECVD) at high deposition rate and with low device shunting; 2) Fabrication of Si/SiO2/metal/p/i/n/metal/n/i/p/metal/SiO2/ device for the detection of alpha particles which are daughter particles of neutrons through appropriate nuclear reactions; and 3) Testing of various devices fabricated for alpha and neutron detection; As the main results: · High quality, low-defect-density, low-stress a-Si films have been successfully deposited using VHF PECVD on various low-cost substrates; · Various single-junction and double junction detector devices have been fabricated; · The detector devices fabricated have been systematically tested and analyzed. · Some of the fabricated devices are found to successfully detect alpha particles. Further research is required to bring this Phase I work beyond the feasibility demonstration toward the final prototype devices. The success of this project will lead to a high-performance, low-cost, X-Y pixilated neutron beam monitor that could be used in all of the neutron facilities worldwide. In addition, the technologies developed here could be used to develop X-ray and neutron monitors that could be used in the future for security checks at the airports and other critical facilities. The project would lead to devices that could significantly enhance the performance of multi-billion dollar neutron source facilities in the US and bring our nation to the forefront of neutron beam sciences and technologies which have enormous impact to materials, life science and military research and applications.

Xu, Liwei

2004-12-12T23:59:59.000Z

97

Inverted amorphous silicon solar cell utilizing cermet layers  

DOE Patents (OSTI)

An amorphous silicon solar cell incorporating a transparent high work function metal cermet incident to solar radiation and a thick film cermet contacting the amorphous silicon opposite to said incident surface.

Hanak, Joseph J. (Lawrenceville, NJ)

1979-01-01T23:59:59.000Z

98

Exploring the parameter space of disc shaped silver nanoparticles for thin film silicon photovoltaics  

E-Print Network (OSTI)

We numerically simulate, using finite-difference time-domain, the optical properties of silver nano discs deposited on the front surface of silicon solar cells. We explore the effect of each of the parameters of such a system, in order to draw some general design rules for the subsequent fabrication of such structures.

Figeys, Bruno

2011-01-01T23:59:59.000Z

99

Thin, High Lifetime Silicon Wafers with No Sawing; Re-crystallization in a Thin Film Capsule  

SciTech Connect

The project fits within the area of renewable energy called photovoltaics (PV), or the generation of electricity directly from sunlight using semiconductor devices. PV has the greatest potential of any renewable energy technology. The vast majority of photovoltaic modules are made on crystalline silicon wafers and these wafers accounts for the largest fraction of the cost of a photovoltaic module. Thus, a method of making high quality, low cost wafers would be extremely beneficial to the PV industry The industry standard technology creates wafers by casting an ingot and then sawing wafers from the ingot. Sawing rendered half of the highly refined silicon feedstock as un-reclaimable dust. Being a brittle material, the sawing is actually a type of grinding operation which is costly both in terms of capital equipment and in terms of consumables costs. The consumables costs associated with the wire sawing technology are particularly burdensome and include the cost of the wire itself (continuously fed, one time use), the abrasive particles, and, waste disposal. The goal of this project was to make wafers directly from molten silicon with no sawing required. The fundamental concept was to create a very low cost (but low quality) wafer of the desired shape and size and then to improve the quality of the wafer by a specialized thermal treatment (called re-crystallization). Others have attempted to create silicon sheet by recrystallization with varying degrees of success. Key among the difficulties encountered by others were: a) difficulty in maintaining the physical shape of the sheet during the recrystallization process and b) difficulty in maintaining the cleanliness of the sheet during recrystallization. Our method solved both of these challenges by encapsulating the preform wafer in a protective capsule prior to recrystallization (see below). The recrystallization method developed in this work was extremely effective at maintaining the shape and the cleanliness of the wafer. In addition, it was found to be suitable for growing very large crystals. The equipment used was simple and inexpensive to operate. Reasonable solar cells were fabricated on re-crystallized material.

Emanuel Sachs Tonio Buonassisi

2013-01-16T23:59:59.000Z

100

Metal electrode for amorphous silicon solar cells  

DOE Patents (OSTI)

An amorphous silicon solar cell having an N-type region wherein the contact to the N-type region is composed of a material having a work function of about 3.7 electron volts or less. Suitable materials include strontium, barium and magnesium and rare earth metals such as gadolinium and yttrium.

Williams, Richard (Princeton, NJ)

1983-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


101

Fabricating amorphous silicon solar cells by varying the temperature _of the substrate during deposition of the amorphous silicon layer  

DOE Patents (OSTI)

An improved process for fabricating amorphous silicon solar cells in which the temperature of the substrate is varied during the deposition of the amorphous silicon layer is described. Solar cells manufactured in accordance with this process are shown to have increased efficiencies and fill factors when compared to solar cells manufactured with a constant substrate temperature during deposition of the amorphous silicon layer.

Carlson, David E. (Yardley, PA)

1982-01-01T23:59:59.000Z

102

Crystallization to polycrystalline silicon thin film and simultaneous inactivation of electrical defects by underwater laser annealing  

SciTech Connect

We propose a low-temperature laser annealing method of a underwater laser annealing (WLA) for polycrystalline silicon (poly-Si) films. We performed crystallization to poly-Si films by laser irradiation in flowing deionized-water where KrF excimer laser was used for annealing. We demonstrated that the maximum value of maximum grain size of WLA samples was 1.5 {mu}m, and that of the average grain size was 2.8 times larger than that of conventional laser annealing in air (LA) samples. Moreover, WLA forms poly-Si films which show lower conductivity and larger carrier life time attributed to fewer electrical defects as compared to LA poly-Si films.

Machida, Emi [Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama-cho, Ikoma, Nara 630-0192 (Japan); Research Fellowships of the Japan Society for the Promotion of Science, Japan Society for the Promotion of Science, 1-8 Chiyoda, Tokyo 102-8472 (Japan); Horita, Masahiro; Ishikawa, Yasuaki; Uraoka, Yukiharu [Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama-cho, Ikoma, Nara 630-0192 (Japan); Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Honcho, Kawaguchi, Saitama 332-0012 (Japan); Ikenoue, Hiroshi [Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka Nishi-ku, Fukuoka 819-0395 (Japan)

2012-12-17T23:59:59.000Z

103

Solar Control Thin Films Laboratory  

NLE Websites -- All DOE Office Websites (Extended Search)

Sputtering equipment Solar Control Thin Films Laboratory The Solar Control Thin Films lab develops novel thin film coatings, deposition technologies, and device systems for...

104

Polycrystalline Thin Film Used in Photovoltaics  

Energy.gov (U.S. Department of Energy (DOE))

Polycrystalline thin-film cells are made of many tiny crystalline grains of semiconductor materials. The materials used in these cells have properties that are different from those of silicon.

105

Thin film polycrystalline silicon solar cells. Quarterly report No. 1, January 1, 1979-March 31, 1979  

DOE Green Energy (OSTI)

A theory capable of predicting the performance of polycrystalline silicon solar cells is formulated. It relates grain size to mobility, lifetime, diffusion length, reverse saturation current, open circuit photovoltage and fill factor. Only the diffusion lengths measured by the surface photovoltage technique for grains less than or equal to 5 ..mu..m do not agree with our theory. The reason for this discrepancy is presently being investigated. We conclude that grains greater than or equal to 100 ..mu..m are necessary to achieve efficiencies greater than or equal to 10 percent at AM1 irradiance. The calculations were performed for the case of no grain boundary passivation. At present we are investigating the improvements to be expected from grain boundary passivation. We have determined that the parameters that best fit the available data are as follows: (1) Number of surface states at grain boundaries acting as recombination centers - 1.6 x 10/sup 13//cm/sup 2/. (2) Capture cross section - 2 x 10/sup -16/ cm/sup 2/. (3) Surface recombination velocity at grain boundary - 3.2 x 10/sup 4/ cm/sec. The following types of solar cells are considered in the model: SnO/sub 2//Si Heterostructure, MIS, and p/n junction. In all types of solar cells considered, grain boundary recombination plays a dominant role, especially for small grains. Though the calculations were originally expected to yield only order of magnitude results, they have proven to be accurate for most parameters within 10 percent.

Ghosh, A.K.; Feng, T.; Maruska, H.P.; Fishman, C.

1979-01-01T23:59:59.000Z

106

Transparent Conductors and Barrier Layers for Thin Film Solar Cells:  

DOE Green Energy (OSTI)

This report describes the research undertaken to increase the efficiency of thin-film solar cells based on amorphous silicon in the so-called''superstrate structure'' (glass front surface/transparent electrically conductive oxide (TCO)/pin amorphous silicon/metal back electrode). The TCO layer must meet many requirements: high optical transparency in the wavelength region from about 350 to 900 nm, low electrical sheet resistance, stability during handling and deposition of the subsequent layers and during use, a textured (rough) surface to enhance optical absorption of red and near-infrared light, and low-resistance electrical contact to the amorphous silicon p-layer. Fluorine-doped tin oxide has been the TCO used in most commercial superstrate amorphous silicon cells. Fluorine-doped zinc oxide (ZnO:F) was later shown to be even more transparent than fluorine-doped tin oxide, as well as being more resistant to the strongly reducing conditions encountered during the deposition of amorphous silicon. Solar cells based on ZnO:F showed the expected higher currents, but the fill factors were lower than standard cells grown on tin oxide, resulting in no consistent improvement in efficiency. This problem was recently mitigated by using a new proprietary p/buffer layer combination developed at BP Solar.

Gordon, R. G.; Broomhall-Dillard, R.; Liu, X.; Pang, D.; Barton, J.

2001-12-01T23:59:59.000Z

107

The deposition of nanocrystalline TiO2 thin film on silicon using Sol-Gel technique and its characterization  

Science Conference Proceedings (OSTI)

TiO"2 thin films were deposited using Sol-Gel spin coating technique using titanium isoperoxide as the Titania precursor. The films were characterized using X-ray diffraction, capacitance voltage measurement and Raman characterization technique. The ... Keywords: Sol-Gel, Spin coating, Titanium dioxide, X-ray diffraction

Mukesh Kumar; Mukesh Kumar; Dinesh Kumar

2010-03-01T23:59:59.000Z

108

Nanocrystallization of amorphous M-Si thin film composites (M=Cr, Mn) and their thermoelectric properties  

SciTech Connect

We report on electrical resistivity and thermoelectric power of Cr-Si and Mn-Si composite films at temperatures from 300 K to 1000 K. The films were deposited on unheated Si/SiO{sub 2} substrates by magnetron sputtering from composite targets. The as-deposited films have amorphous structure. We use annealing with in-situ transport properties measurements to transform the films into nanocrystalline state with continuous monitoring their state. Nanocrystallization is considered as a promising way to improve thermoelectric efficiency, primarily due to reduction of lattice thermal conductivity {kappa}. Among variety of methods for fabrication of NC materials, crystallization from amorphous state has features which are crucially important with respect to their electronic transport properties: since the crystallites and their interfaces are formed in this method via solid state reaction, the NC samples are dense and the interfaces are clean. This removes additional factors affecting properties of a nanocrystalline composite, such as contamination of nanocrystal interfaces by elements from environment or nanocrystal lattice distortion during nanocrystallization. Depending on the initial film composition, the films are transformed during annealing into single phase or multi-phase nanocrystalline composites with average grain size of 10 nm to 20 nm. We study the crystallization kinetics, stability of amorphous and nanocrystalline state and relation between electronic transport properties and structural state of the composites.

Burkov, A. T.; Novikov, S. V.; Schumann, J. [A.F. Ioffe Physical-Technical Institute, Sankt-Petersburg, 194021 (Russian Federation); Leibniz Institute for Solid State and Materials Research, Dresden (Germany)

2012-06-26T23:59:59.000Z

109

High resolution amorphous silicon radiation detectors  

DOE Patents (OSTI)

A radiation detector employing amorphous Si:H cells in an array with each detector cell having at least three contiguous layers (n type, intrinsic, p type), positioned between two electrodes to which a bias voltage is applied. An energy conversion layer atop the silicon cells intercepts incident radiation and converts radiation energy to light energy of a wavelength to which the silicon cells are responsive. A read-out device, positioned proximate to each detector element in an array allows each such element to be interrogated independently to determine whether radiation has been detected in that cell. The energy conversion material may be a layer of luminescent material having a columnar structure. In one embodiment a column of luminescent material detects the passage therethrough of radiation to be detected and directs a light beam signal to an adjacent a-Si:H film so that detection may be confined to one or more such cells in the array. One or both electrodes may have a comb structure, and the teeth of each electrode comb may be interdigitated for capacitance reduction. The amorphous Si:H film may be replaced by an amorphous Si:Ge:H film in which up to 40 percent of the amorphous material is Ge. Two dimensional arrays may be used in X-ray imaging, CT scanning, crystallography, high energy physics beam tracking, nuclear medicine cameras and autoradiography.

Street, Robert A. (Palo Alto, CA); Kaplan, Selig N. (El Cerrito, CA); Perez-Mendez, Victor (Berkeley, CA)

1992-01-01T23:59:59.000Z

110

High resolution amorphous silicon radiation detectors  

DOE Patents (OSTI)

A radiation detector employing amorphous Si:H cells in an array with each detector cell having at least three contiguous layers (n-type, intrinsic, p-type), positioned between two electrodes to which a bias voltage is applied. An energy conversion layer atop the silicon cells intercepts incident radiation and converts radiation energy to light energy of a wavelength to which the silicon cells are responsive. A read-out device, positioned proximate to each detector element in an array allows each such element to be interrogated independently to determine whether radiation has been detected in that cell. The energy conversion material may be a layer of luminescent material having a columnar structure. In one embodiment a column of luminescent material detects the passage therethrough of radiation to be detected and directs a light beam signal to an adjacent a-Si:H film so that detection may be confined to one or more such cells in the array. One or both electrodes may have a comb structure, and the teeth of each electrode comb may be interdigitated for capacitance reduction. The amorphous Si:H film may be replaced by an amorphous Si:Ge:H film in which up to 40 percent of the amorphous material is Ge. Two dimensional arrays may be used in X-ray imaging, CT scanning, crystallography, high energy physics beam tracking, nuclear medicine cameras and autoradiography. 18 figs.

Street, R.A.; Kaplan, S.N.; Perez-Mendez, V.

1992-05-26T23:59:59.000Z

111

Research on high-efficiency, single-junction, monolithic, thin-film amorphous silicon solar cells  

DOE Green Energy (OSTI)

This document describes the progress made in obtaining stable, a-Si-based submodules that have a large area and high efficiency. Conversion efficiencies of up to 11.95% were obtained in small-area, single-junction a-Si solar cells using textured TiO{sub 2}, superlattice p-layers, graded carbon concentrations near the p/i interface, and highly reflective ITO/silver back contacts. Single- junction a-SiC and a-SiGe p-i-n cells were also fabricated that had conversion efficiencies of 9%--11%, and some recently fabricated stacked-junction cells had conversion efficiencies of about 10%. In materials research boron-doped microcrystalline SiC films were recently developed containing up to 6 at. % carbon with conductivities of 3 {times} 10{sup {minus}3}/{Omega}-cm at room temperature and activation energies of 0.11 eV. Microcrystalline film growth was shown to be strongly influenced by the nature of the substrate, with nucleation occurring more readily on a-Si substrates than on TiO{sub 2}. Stability studies show that light-induced degradation is usually enhanced by the presence of carbon grading near the p/i interface. In general, adding either germanium (from GeH{sub 4}) or carbon (from CH{sub 4}) to the i-layer of a p-i-n cell leads to enhanced light-induced degradation. 13 refs., 80 figs., 17 tabs.

Catalano, A.W.; Carlson, D.E.; Ayra, R.R.; Bennett, M.S.; D'Aiello, R.V.; Dickson, C.R.; Fortmann, C.M.; Goldstein, B.; McVeigh, J.; Morris, J.; Newton, J.L.; Wiedeman, S. (Solarex Corp., Newtown, PA (USA). Thin Film Div.)

1989-10-01T23:59:59.000Z

112

Young's modulus, Poisson's ratio, and residual stress and strain in (111)-oriented scandium nitride thin films on silicon  

E-Print Network (OSTI)

cyclotron resonance MBE which typically generate N2 + species with high kinetic energies. The causes of compressive stress in this case may instead be related to a trend commonly observed in vapor-deposited thin films. Such films typically experience... with the strain information hich is found to be 270±25 GPa. Residual m growth temperature and film thickness#2; d by the differential thermal contraction ic compressive stresses generated during .1063/1.2217106#5; Accurate determination of residual stresses...

Moram, M A; Barber, Z H; Humphreys, C J; Joyce, T B; Chalker, P R

2006-07-21T23:59:59.000Z

113

Improved Amorphous Silicon Solar Cells - Energy Innovation Portal  

Alex Zettl, Jeffrey Grossman and Lucas Wagner of Lawrence Berkeley National Laboratory have invented hydrogenated amorphous silicon solar cells with 30% improved ...

114

NMR Studies of Molecular Hydrogen in Hydrogenated Amorphous Silicon  

DOE Green Energy (OSTI)

Using NMR, the concentrations of molecular hydrogen have been measured directly in hydrogenated amorphous silicon made by the hot wire chemical vapor deposition (HWCVD) technique.

Su, T.; Chen, S.; Taylor, P. C.; Crandall, R. S.; Mahan, A. H.

2000-01-01T23:59:59.000Z

115

Three dimensional amorphous silicon/microcrystalline silicon solar cells  

DOE Patents (OSTI)

Three dimensional deep contact amorphous silicon/microcrystalline silicon (a-Si/{micro}c-Si) solar cells are disclosed which use deep (high aspect ratio) p and n contacts to create high electric fields within the carrier collection volume material of the cell. The deep contacts are fabricated using repetitive pulsed laser doping so as to create the high aspect p and n contacts. By the provision of the deep contacts which penetrate the electric field deep into the material where the high strength of the field can collect many of the carriers, thereby resulting in a high efficiency solar cell. 4 figs.

Kaschmitter, J.L.

1996-07-23T23:59:59.000Z

116

Three dimensional amorphous silicon/microcrystalline silicon solar cells  

DOE Patents (OSTI)

Three dimensional deep contact amorphous silicon/microcrystalline silicon (a-Si/.mu.c-Si) solar cells which use deep (high aspect ratio) p and n contacts to create high electric fields within the carrier collection volume material of the cell. The deep contacts are fabricated using repetitive pulsed laser doping so as to create the high aspect p and n contacts. By the provision of the deep contacts which penetrate the electric field deep into the material where the high strength of the field can collect many of the carriers, thereby resulting in a high efficiency solar cell.

Kaschmitter, James L. (Pleasanton, CA)

1996-01-01T23:59:59.000Z

117

Hydrogenated amorphous silicon-germanium alloys  

SciTech Connect

This report describes the effects of the germanium fraction in hydrogenated amorphous silicon-germanium alloys on various parameters, especially those that are indicators of film quality, and the impact of deposition methods, feedgas mixtures, and other deposition parameters on a SiGe:H and a-SiGe:H:F film characteristics and quality. Literature data show the relationship between germanium content, hydrogen content, deposition method (various glow discharges and CVD), feedgas lmixture, and other parameters and properties, such as optical band gap, dark and photoconductivities, photosensitivity, activation energy, Urbach parameter, and spin density. Some of these are convenient quality indicators; another is the absence of microstructure. Examining RF glow discharge with both a diode and triode geometry, DC proximity glow discharge, microwave glow discharge, and photo-CVD, using gas mixtures such as hydrogen-diluted and undiluted mixtures of silane/germane, disilane/germane, silane/germaniumtetrafluoride, and others, it was observed that hydrogen dilution (or inert gas dilution) is essential in achieving high photosensitivity in silicon-germanium alloys (in contradistinction to amorphous hydrogenated silicon). Hydrogen dilution results in a higher photosensitivity than do undiluted gas mixtures. 81 refs., 42 figs., 7 tabs.

Luft, W.

1988-02-01T23:59:59.000Z

118

Amorphous and Microcrystalline Silicon Solar Cells: Preprint  

DOE Green Energy (OSTI)

We review the progress made by amorphous silicon solar cells, including the emerging technology of solar cells of microcrystalline silicon. The long-term trend in the efficiency of stabilized laboratory cells based on a-Si:H has been a rise of {approx}0.6 % per year. The recent trend in the a-Si,Ge:H cell efficiency alone, measured in the spectral window assigned to the bottom device in a triple-junction cell, has been an increase of {approx}0.16% per year. These improvements have brought within reach the target of 15% efficiency identified by EPRI and DOE for widespread application. Our review leads to an identification of areas of promising research, with emphasis on the fundamental science required to reach the 15% target, and then to move to the next-level efficiency goal.

Wagner, S. (Princeton University); Carlson, D. E. (Solarex); Branz, H. M. (National Renewable Energy Laboratory)

1999-04-01T23:59:59.000Z

119

CAT-CVD process and its application to preparation of Si-based thin films  

SciTech Connect

This is to review the present understanding on Cat-CVD (catalytic chemical vapor deposition) or hot wire CVD. Firstly, the deposition mechanism in Cat-CVD process is briefly mentioned along with key issues such as the effect of heat radiation and a method to avoid contamination from the catalyzer. Secondly, the properties of Cat-CVD Si-based thin films such as amorphous silicon (a-Si), polycrystalline silicon (poly-Si) and silicon nitride (SiN{sub x}) films are demonstrated, and finally, the feasibility of such films for industrial application is discussed.

Matsumura, Hideki; Masuda, Atsushi; Izumi, Akira

1999-07-01T23:59:59.000Z

120

Thin-film rechargeable lithium batteries  

SciTech Connect

Thin-film rechargeable lithium batteries using ceramic electrolyte and cathode materials have been fabricated by physical deposition techniques. The lithium phosphorous oxynitride electrolyte has exceptional electrochemical stability and a good lithium conductivity. The lithium insertion reaction of several different intercalation materials, amorphous V{sub 2}O{sub 5}, amorphous LiMn{sub 2}O{sub 4}, and crystalline LiMn{sub 2}O{sub 4} films, have been investigated using the completed cathode/electrolyte/lithium thin-film battery.

Dudney, N.J.; Bates, J.B.; Lubben, D. [Oak Ridge National Lab., TN (United States). Solid State Div.

1995-06-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


121

Thin-film Rechargeable Lithium Batteries  

DOE R&D Accomplishments (OSTI)

Thin film rechargeable lithium batteries using ceramic electrolyte and cathode materials have been fabricated by physical deposition techniques. The lithium phosphorous oxynitride electrolyte has exceptional electrochemical stability and a good lithium conductivity. The lithium insertion reaction of several different intercalation materials, amorphous V{sub 2}O{sub 5}, amorphous LiMn{sub 2}O{sub 4}, and crystalline LiMn{sub 2}O{sub 4} films, have been investigated using the completed cathode/electrolyte/lithium thin film battery.

Dudney, N. J.; Bates, J. B.; Lubben, D.

1995-06-00T23:59:59.000Z

122

Photovoltaic Polycrystalline Thin-Film Cell Basics | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Polycrystalline Thin-Film Cell Basics Polycrystalline Thin-Film Cell Basics Photovoltaic Polycrystalline Thin-Film Cell Basics August 20, 2013 - 2:36pm Addthis Polycrystalline thin-film cells are made of many tiny crystalline grains of semiconductor materials. The materials used in these cells have properties that are different from those of silicon. Thin-film cells have many advantages over their thick-film counterparts. For example, they use much less material. The cell's active area is usually only 1 to 10 micrometers thick, whereas thick films typically are 100 to 300 micrometers thick. Also, thin-film cells can usually be manufactured in a large-area process, which can be an automated, continuous production process. Finally, they can be deposited on flexible substrate materials. The term thin film comes from the method used to deposit the film, not from

123

Superlattice doped layers for amorphous silicon photovoltaic cells  

DOE Patents (OSTI)

Superlattice doped layers for amorphous silicon photovoltaic cells comprise a plurality of first and second lattices of amorphous silicon alternatingly formed on one another. Each of the first lattices has a first optical bandgap and each of the second lattices has a second optical bandgap different from the first optical bandgap. A method of fabricating the superlattice doped layers also is disclosed.

Arya, Rajeewa R. (Doylestown, PA)

1988-01-12T23:59:59.000Z

124

ThinFilms  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin Films Thin Films Manufacturing Technologies The Thin Film laboratory provides a variety of vapor deposition processes and facilities for cooperative research and development. Available capabilities include electron beam evaporation, sputter deposition, reactive deposi- tion processes, atomic layer deposition (ALD) and specialized techniques such as focused ion beam induced chemical vapor deposition. Equipment can be reconfigured for prototyping, or it can be dedicated to long-term research, development and manufacturing. Most sputter and evaporative deposition systems are capable of depositing multiple materials. Deposition capabilities and expertise * Deposition of a large variety of thin film mate- rials * Multiple sputter deposition systems - Capable of depositing four materials in a

125

Superhydrophobic Thin Film Coatings  

Exploiting its expertise with thin films and superhydrophobic materials, ORNL has developed a simple, inexpensive way to apply and reliably bond ...

126

CARS of Thin Films  

Science Conference Proceedings (OSTI)

... as a thin film diagnostic. Surface enhanced Raman scattering, SERS, has been used to probe the interfacial region of thin polymer films on metal ...

2012-10-02T23:59:59.000Z

127

Method of inducing differential etch rates in glow discharge produced amorphous silicon  

DOE Patents (OSTI)

A method of inducing differential etch rates in glow discharge produced amorphous silicon by heating a portion of the glow discharge produced amorphous silicon to a temperature of about 365.degree. C. higher than the deposition temperature prior to etching. The etch rate of the exposed amorphous silicon is less than the unheated amorphous silicon.

Staebler, David L. (Lawrenceville, NJ); Zanzucchi, Peter J. (Lawrenceville, NJ)

1980-01-01T23:59:59.000Z

128

Design, construction and testing of a high-vacuum anneal chamber for in-situ crystallisation of silicon thin-film solar cells.  

E-Print Network (OSTI)

??Thin-film solar cells on glass substrates are likely to have a bright future due to the potentially low costs and the short energy payback times.… (more)

Weber, Jürgen Wolfgang

2006-01-01T23:59:59.000Z

129

A survey of thin-film solar photovoltaic industry & technologies  

E-Print Network (OSTI)

A new type of solar cell technology using so-called thin-film solar photovoltaic material has the potential to make a great impact on our lives. Because it uses very little or no silicon at all, thin- film (TF) solar ...

Grama, Sorin

2007-01-01T23:59:59.000Z

130

Thin film hydrogen sensor  

DOE Patents (OSTI)

A thin film hydrogen sensor, includes: a substantially flat ceramic substrate with first and second planar sides and a first substrate end opposite a second substrate end; a thin film temperature responsive resistor on the first planar side of the substrate proximate to the first substrate end; a thin film hydrogen responsive metal resistor on the first planar side of the substrate proximate to the fist substrate end and proximate to the temperature responsive resistor; and a heater on the second planar side of the substrate proximate to the first end.

Cheng, Yang-Tse (Rochester Hills, MI); Poli, Andrea A. (Livonia, MI); Meltser, Mark Alexander (Pittsford, NY)

1999-01-01T23:59:59.000Z

131

Thin-film rechargeable lithium batteries  

SciTech Connect

Small thin-film rechargeable cells have been fabricated with a lithium phosphorus oxyniuide electrolyte, Li metal anode, and Li{sub 1-x}Mn{sub 2}O{sub 4} as the cathode film. The cathode films were fabricated by several different techniques resulting in both crystalline and amorphous films. These were compared by observing the cell discharge behavior. Estimates have been made for the scale-up of such a thin-film battery to meet the specifications for the electric vehicle application. The specific energy, energy density, and cycle life are expected to meet the USABC mid-term criteria. However, the areas of the thin-films needed to fabricate such a cell are very large. The required areas could be greatly reduced by operating the battery at temperatures near 100{degrees}C or by enhancing the lithium ion transport rate in the cathode material.

Dudney, N.J.; Bates, J.B.; Lubben, D.

1994-11-01T23:59:59.000Z

132

Thin film tritium dosimetry  

DOE Patents (OSTI)

The present invention provides a method for tritium dosimetry. A dosimeter comprising a thin film of a material having relatively sensitive RITAC-RITAP dosimetry properties is exposed to radiation from tritium, and after the dosimeter has been removed from the source of the radiation, the low energy electron dose deposited in the thin film is determined by radiation-induced, thermally-activated polarization dosimetry techniques.

Moran, Paul R. (Madison, WI)

1976-01-01T23:59:59.000Z

133

The specific heat of pure and hydrogenated amorphous silicon  

E-Print Network (OSTI)

thin film sample and a weak thermal link between the samplepreserving the weak thermal link through the membrane

Queen, Daniel Robert

2011-01-01T23:59:59.000Z

134

Structure of Silicon-Based Thin Film Solar Cell Materials: Annual Technical Progress Report, 1 April 2002--31 August 2003  

DOE Green Energy (OSTI)

The purpose of this research is to achieve a better understanding to improve materials used as the intrinsic layers of amorphous and microcrystalline silicon-based solar cells. Fundamental structural properties will be investigated on atomic and nano-scales. A powerful combination of techniques will be used: analytical high-resolution transmission electron microscopy (HRTEM), including special associated spectroscopic methods, small-angle scattering techniques (SAXS, ASAXS, SANS), and conventional wide-angle X-ray diffraction (XRD).

Williamson, D. L.

2004-01-01T23:59:59.000Z

135

Thin films of silicon on low-cost substrates. Quarterly report No. 5, January 1-March 31, 1978  

DOE Green Energy (OSTI)

Parametric studies of silicon deposition were conducted employing the horizontal Energy Beam system. Chemical equilibrium calculations pertaining to the Energy Beam deposition conditions were performed. These calculations indicated that the reaction efficiency for hydrogen reduction of silicon tetrachloride is over 95% for any chlorosilane concentration at the Energy Beam temperature of 4300/sup 0/K. Because lower temperatures exist near the substrate surfaces, the kinetics of establishing the low temperature equilibrium will determine obtainable material efficiencies. From deposition experiments, the material efficiency was found to be strongly dependent on input chlorosilane concentrations. The highest material efficiency and growth rate obtained concurrently to date were 70% and 10 ..mu..m/min using the horizontal Energy Beam system. The Thermal Expansion Shear Separation (TESS) process for producing self supporting silicon films was further investigated.

Sarma, K.R.; Gurtler, R.W.; Baghdadi, A.; Cota, M.

1978-01-01T23:59:59.000Z

136

High-Efficiency Amorphous Silicon Alloy Based Solar Cells and Modules; Final Technical Progress Report, 30 May 2002--31 May 2005  

DOE Green Energy (OSTI)

The principal objective of this R&D program is to expand, enhance, and accelerate knowledge and capabilities for development of high-efficiency hydrogenated amorphous silicon (a-Si:H) and amorphous silicon-germanium alloy (a-SiGe:H) related thin-film multijunction solar cells and modules with low manufacturing cost and high reliability. Our strategy has been to use the spectrum-splitting triple-junction structure, a-Si:H/a-SiGe:H/a-SiGe:H, to improve solar cell and module efficiency, stability, and throughput of production. The methodology used to achieve the objectives included: (1) explore the highest stable efficiency using the triple-junction structure deposited using RF glow discharge at a low rate, (2) fabricate the devices at a high deposition rate for high throughput and low cost, and (3) develop an optimized recipe using the R&D batch large-area reactor to help the design and optimization of the roll-to-roll production machines. For short-term goals, we have worked on the improvement of a-Si:H and a-SiGe:H alloy solar cells. a-Si:H and a-SiGe:H are the foundation of current a-Si:H based thin-film photovoltaic technology. Any improvement in cell efficiency, throughput, and cost reduction will immediately improve operation efficiency of our manufacturing plant, allowing us to further expand our production capacity.

Guha, S.; Yang, J.

2005-10-01T23:59:59.000Z

137

Thin Film Nanocomposites for Thermoelectric Applications  

Science Conference Proceedings (OSTI)

Presentation Title, Thin Film Nanocomposites for Thermoelectric Applications ... Abstract Scope, Thin film nanocomposites comprised of refractory metals and ...

138

NMR characterization of thin films  

SciTech Connect

A method, apparatus, and system for characterizing thin film materials. The method, apparatus, and system includes a container for receiving a starting material, applying a gravitational force, a magnetic force, and an electric force or combinations thereof to at least the starting material, forming a thin film material, sensing an NMR signal from the thin film material and analyzing the NMR signal to characterize the thin film of material.

Gerald, II, Rex E. (Brookfield, IL); Klingler, Robert J. (Glenview, IL); Rathke, Jerome W. (Homer Glen, IL); Diaz, Rocio (Chicago, IL); Vukovic, Lela (Westchester, IL)

2008-11-25T23:59:59.000Z

139

Hydrogenated amorphous silicon films produced by chemical vapor deposition: Final report  

SciTech Connect

Hydrogenated amorphous silicon (a-Si:H) is a technologically important semiconductor, well-suited for solar photovoltaic energy conversion and thin film device applications. While the glow discharge technique is widely used for the deposition of a-Si:H films, this work is focused on the use of the chemical vapor deposition (CVD) technique, i.e., the thermal decomposition of disilane and higher silanes, for the deposition of a-Si:H films. A simple technique for the preparation of disilane and higher silanes by using an electric discharge in monosilane under atmospheric pressure has been developed, and the discharge product can be used directly for the deposition process. The important parameters of the CVD process including the substrate temperature, the composition and flow rate of the reaction mixture, and the nature of the diluent gas for disilane, have also been investigated. The deposition rate of a-Si:H films in a helium atmosphere is considerably higher than that in a hydrogen atmosphere, and the CVD process in a helium atmosphere is well-suited for the deposition of thick a-Si:H films. The a-Si:H films deposited under various conditions have been characterized by the photoconductivity, dissolution rate, optical absorption, mechanical stress, gap state density, minority carrier diffusion length, and stability measurements. On the basis of these measurements, a-Si:H films deposited by the thermal decomposition of disilane in a helium atmosphere exhibit better structural and electronic properties than those deposited in a hydrogen atmosphere.

Not Available

1987-04-01T23:59:59.000Z

140

Transmissive metallic contact for amorphous silicon solar cells  

DOE Patents (OSTI)

A transmissive metallic contact for amorphous silicon semiconductors includes a thin layer of metal, such as aluminum or other low work function metal, coated on the amorphous silicon with an antireflective layer coated on the metal. A transparent substrate, such as glass, is positioned on the light reflective layer. The metallic layer is preferably thin enough to transmit at least 50% of light incident thereon, yet thick enough to conduct electricity. The antireflection layer is preferably a transparent material that has a refractive index in the range of 1.8 to 2.2 and is approximately 550A to 600A thick.

Madan, A.

1984-11-29T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


141

Thin film photovoltaic cell  

DOE Patents (OSTI)

A thin film photovoltaic cell having a transparent electrical contact and an opaque electrical contact with a pair of semiconductors therebetween includes utilizing one of the electrical contacts as a substrate and wherein the inner surface thereof is modified by microroughening while being macro-planar.

Meakin, John D. (Newark, DE); Bragagnolo, Julio (Newark, DE)

1982-01-01T23:59:59.000Z

142

Effects of interlayers on the scratch adhesion performance of ultra-thin films of copper and gold on silicon substrates  

SciTech Connect

Scratch testing has long been used to assess the adhesion of a film to its substrate. As film thicknesses have decreased, the need for greater precision and sensitivity in the scratch testing apparatus has increased. To this end, a nanoindenter was modified to make finely controlled, low-load scratches. Scratches at various loads and two orientations of a Berkovich scratching diamond were made in films of 100 nm of gold and 200 nm of copper, each on single crystal silicon. For each film type, samples with no interlayer, with an SiO{sub 2} interlayer, and with a TiW on SiO{sub 2} interlayer were tested. The scratch morphology was found to vary in a regular way with load, diamond orientation and interlayer material.

McAdams, S.D.; Tsui, T.Y.; Pharr, G.M. [Rice Univ., Houston, TX (United States); Oliver, W.C. [Nano Instruments, Inc., Knoxville, TN (United States)

1995-02-01T23:59:59.000Z

143

Thin-film optical initiator  

DOE Patents (OSTI)

A thin-film optical initiator having an inert, transparent substrate, a reactive thin film, which can be either an explosive or a pyrotechnic, and a reflective thin film. The resultant thin-film optical initiator system also comprises a fiber-optic cable connected to a low-energy laser source, an output charge, and an initiator housing. The reactive thin film, which may contain very thin embedded layers or be a co-deposit of a light-absorbing material such as carbon, absorbs the incident laser light, is volumetrically heated, and explodes against the output charge, imparting about 5 to 20 times more energy than in the incident laser pulse.

Erickson, Kenneth L. (Albuquerque, NM)

2001-01-01T23:59:59.000Z

144

Structure of Pentacene Monolayers on Amorphous Silicon Oxide...  

NLE Websites -- All DOE Office Websites (Extended Search)

and potential applications in low-cost electronics such as organic light emitting diode (OLED) displays, thin film transistors and related applications (e.g. TFT...

145

Radiation damage to amorphous carbon thin films irradiated by multiple 46.9 nm laser shots below the single-shot damage threshold  

SciTech Connect

High-surface-quality amorphous carbon (a-C) optical coatings with a thickness of 45 nm, deposited by magnetron sputtering on a silicon substrate, were irradiated by the focused beam of capillary-discharge Ne-like Ar extreme ultraviolet laser (CDL=capillary-discharge laser; XUV=extreme ultraviolet, i.e., wavelengths below 100 nm). The laser wavelength and pulse duration were 46.9 nm and 1.7 ns, respectively. The laser beam was focused onto the sample surface by a spherical Sc/Si multilayer mirror with a total reflectivity of about 30%. The laser pulse energy was varied from 0.4 to 40 muJ on the sample surface. The irradiation was carried out at five fluence levels between 0.1 and 10 J/cm{sup 2}, accumulating five different series of shots, i.e., 1, 5, 10, 20, and 40. The damage to the a-C thin layer was investigated by atomic force microscopy (AFM) and Nomarski differential interference contrast (DIC) optical microscopy. The dependence of the single-shot-damaged area on pulse energy makes it possible to determine a beam spot diameter in the focus. Its value was found to be equal to 23.3+-3.0 mum using AFM data, assuming the beam to have a Gaussian profile. Such a plot can also be used for a determination of single-shot damage threshold in a-C. A single-shot threshold value of 1.1 J/cm{sup 2} was found. Investigating the consequences of the multiple-shot exposure, it has been found that an accumulation of 10, 20, and 40 shots at a fluence of 0.5 J/cm{sup 2}, i.e., below the single-shot damage threshold, causes irreversible changes of thin a-C layers, which can be registered by both the AFM and the DIC microscopy. In the center of the damaged area, AFM shows a-C removal to a maximum depth of 0.3, 1.2, and 1.5 nm for 10-, 20- and 40-shot exposure, respectively. Raman microprobe analysis does not indicate any change in the structure of the remaining a-C material. The erosive behavior reported here contrasts with the material expansion observed earlier [L. Juha et al., Proc. SPIE 5917, 91 (2005)] on an a-C sample irradiated by a large number of femtosecond pulses of XUV high-order harmonics.

Juha, L.; Hajkova, V.; Vorlicek, V. [Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8 (Czech Republic); Chalupsky, J. [Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8 (Czech Republic); Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University in Prague, Brehova 7, 115 19 Prague 1 (Czech Republic); Ritucci, A.; Reale, A.; Zuppella, P. [Department of Physics, University of L'Aquila, gc Laboratorio Nazionale del Gran Sasso (Istituto Nazionale di Fisica Nucleare-INFN), 67010 Coppito, L'Aquila (Italy); Stoermer, M. [GKSS Research Center, Max-Planck-Strasse 1, D-21502 Geesthacht (Germany)

2009-05-01T23:59:59.000Z

146

Thin film superconductor magnetic bearings  

DOE Patents (OSTI)

A superconductor magnetic bearing includes a shaft (10) that is subject to a load (L) and rotatable around an axis of rotation, a magnet (12) mounted to the shaft, and a stator (14) in proximity to the shaft. The stator (14) has a superconductor thin film assembly (16) positioned to interact with the magnet (12) to produce a levitation force on the shaft (10) that supports the load (L). The thin film assembly (16) includes at least two superconductor thin films (18) and at least one substrate (20). Each thin film (18) is positioned on a substrate (20) and all the thin films are positioned such that an applied magnetic field from the magnet (12) passes through all the thin films. A similar bearing in which the thin film assembly (16) is mounted on the shaft (10) and the magnet (12) is part of the stator (14) also can be constructed.

Weinberger, Bernard R. (Avon, CT)

1995-12-26T23:59:59.000Z

147

Performance of amorphous silicon photovoltaic systems, 1985--1989  

DOE Green Energy (OSTI)

This report discusses the performance of commercial amorphous silicon modules used in photovoltaic power systems from 1985 through 1989. Topics discussed include initial degradation, reliability, durability, and effects of temperature and solar irradiance on peak power and energy production. 6 refs., 18 figs.

Not Available

1990-04-01T23:59:59.000Z

148

Deposition of device quality low H content, amorphous silicon films  

DOE Patents (OSTI)

A high quality, low hydrogen content, hydrogenated amorphous silicon (a-Si:H) film is deposited by passing a stream of silane gas (SiH{sub 4}) over a high temperature, 2,000 C, tungsten (W) filament in the proximity of a high temperature, 400 C, substrate within a low pressure, 8 mTorr, deposition chamber. The silane gas is decomposed into atomic hydrogen and silicon, which in turn collides preferably not more than 20--30 times before being deposited on the hot substrate. The hydrogenated amorphous silicon films thus produced have only about one atomic percent hydrogen, yet have device quality electrical, chemical, and structural properties, despite this lowered hydrogen content. 7 figs.

Mahan, A.H.; Carapella, J.C.; Gallagher, A.C.

1995-03-14T23:59:59.000Z

149

High Growth Rate Deposition of Hydrogenated Amorphous Silicon-Germanium Films and Devices Using ECR-PECVD  

DOE Green Energy (OSTI)

Hydrogenated amorphous silicon germanium films (a-SiGe:H) and devices have been extensively studied because of the tunable band gap for matching the solar spectrum and mature the fabrication techniques. a-SiGe:H thin film solar cells have great potential for commercial manufacture because of very low cost and adaptability to large-scale manufacturing. Although it has been demonstrated that a-SiGe:H thin films and devices with good quality can be produced successfully, some issues regarding growth chemistry have remained yet unexplored, such as the hydrogen and inert-gas dilution, bombardment effect, and chemical annealing, to name a few. The alloying of the SiGe introduces above an order-of-magnitude higher defect density, which degrades the performance of the a-SiGe:H thin film solar cells. This degradation becomes worse when high growth-rate deposition is required. Preferential attachment of hydrogen to silicon, clustering of Ge and Si, and columnar structure and buried dihydride radicals make the film intolerably bad. The work presented here uses the Electron-Cyclotron-Resonance Plasma-Enhanced Chemical Vapor Deposition (ECR-PECVD) technique to fabricate a-SiGe:H films and devices with high growth rates. Helium gas, together with a small amount of H{sub 2}, was used as the plasma species. Thickness, optical band gap, conductivity, Urbach energy, mobility-lifetime product, I-V curve, and quantum efficiency were characterized during the process of pursuing good materials. The microstructure of the a-(Si,Ge):H material was probed by Fourier-Transform Infrared spectroscopy. They found that the advantages of using helium as the main plasma species are: (1) high growth rate--the energetic helium ions break the reactive gas more efficiently than hydrogen ions; (2) homogeneous growth--heavy helium ions impinging on the surface promote the surface mobility of the reactive radicals, so that heteroepitaxy growth as clustering of Ge and Si, columnar structure are reduced; (3) surface hydrogen removal--heavier and more energetic helium ions break the Si-H much easier than hydrogen ions. The preferential attachment of Si-H to Ge-H is reduced. They also found that with the small amount of hydrogen put into the plasma, the superior properties of a-(Si,Ge):H made from pure hydrogen dilution plasma were still maintained. These hydrogen ions help to remove the subsurface weakly bonded hydrogen and buried hydrogen. They also help to passivate the Ge-dangling bond.

Yong Liu

2002-05-31T23:59:59.000Z

150

Thin Films and Interfaces Committee  

Science Conference Proceedings (OSTI)

The Thin Films and Interfaces Committee is part of the Electronic, Magnetic, and Photonic Materials Division;. Our Mission: Promotes knowledge of the science ...

151

Thin film photovoltaic device  

DOE Patents (OSTI)

A thin film photovoltaic solar cell which utilizes a zinc phosphide semiconductor is of the homojunction type comprising an n-type conductivity region forming an electrical junction with a p-type region, both regions consisting essentially of the same semiconductor material. The n-type region is formed by treating zinc phosphide with an extrinsic dopant such as magnesium. The semiconductor is formed on a multilayer substrate which acts as an opaque contact. Various transparent contacts may be used, including a thin metal film of the same chemical composition as the n-type dopant or conductive oxides or metal grids. 5 figs.

Catalano, A.W.; Bhushan, M.

1982-08-03T23:59:59.000Z

152

Thin film hydrogen sensor  

DOE Green Energy (OSTI)

A hydrogen sensor element comprises an essentially inert, electrically-insulating substrate having a thin-film metallization deposited thereon which forms at least two resistors on the substrate. The metallization comprises a layer of Pd or a Pd alloy for sensing hydrogen and an underlying intermediate metal layer for providing enhanced adhesion of the metallization to the substrate. An essentially inert, electrically insulating, hydrogen impermeable passivation layer covers at least one of the resistors, and at least one of the resistors is left uncovered. The difference in electrical resistances of the covered resistor and the uncovered resistor is related to hydrogen concentration in a gas to which the sensor element is exposed.

Lauf, Robert J. (Oak Ridge, TN); Hoffheins, Barbara S. (Knoxville, TN); Fleming, Pamela H. (Oak Ridge, TN)

1994-01-01T23:59:59.000Z

153

Thin film photovoltaic device  

DOE Patents (OSTI)

A thin film photovoltaic solar cell which utilizes a zinc phosphide semiconductor is of the homojunction type comprising an n-type conductivity region forming an electrical junction with a p-type region, both regions consisting essentially of the same semiconductor material. The n-type region is formed by treating zinc phosphide with an extrinsic dopant such as magnesium. The semiconductor is formed on a multilayer substrate which acts as an opaque contact. Various transparent contacts may be used, including a thin metal film of the same chemical composition as the n-type dopant or conductive oxides or metal grids.

Catalano, Anthony W. (Wilmington, DE); Bhushan, Manjul (Wilmington, DE)

1982-01-01T23:59:59.000Z

154

Thin-film amorphous silicon alloy research partnership. Final technical progress report, 2 February 1995--28 February 1998  

Science Conference Proceedings (OSTI)

This report describes the status and accomplishments of work performed by United Solar Systems Corp. under this subcontract. Investigations were carried out on Ag/ZnO, Ag/TiO{sub 2}/ZnO and Ag/MgF{sub 2}/ZnO back reflectors to assess their suitability for use in cell structures. Arrays of high-efficiency component cells were made over 1-ft{sup 2} areas. Single-junction top cells were made with an average stabilized power density of 5.4 mW/cm{sup 2} measured under global AM1.5 illumination. Single-junction middle cells were optimized to give average stabilized power density of 3.6 mW/cm{sup 2} under global AM1.5 illumination with a cut-on filter with {lambda} > 530 nm. Arrays of high-efficiency triple-junction cells of 0.25-cm{sup 2} active area were fabricated over 1-ft{sup 2} area with average stabilized efficiency of 12% as measured under AM1.5 illumination. A triple-junction module of a 416-cm{sup 2} aperture area was fabricated with an initial efficiency of 11.7% and stabilized efficiency of 10.24%. A 922-cm{sup 2} aperture-area module exhibited an initial efficiency of 11.5%. The novel laser-drilling approach was used successfully to fabricate modules of 1-ft{sup 2} area with shadow loss of approximately 1%. Using this laser-drilling approach, an initial total-area efficiency of 11.5% was achieved in a triple-cell structure of 12.6 cm{sup 2} area. An initial total-area efficiency of 10.6% was achieved in a module of 300-cm{sup 2} area. Reliability studies based on NREL`s Interim Qualification Testing were carried out to confirm the suitability of the module encapsulation materials and processes. 29 figs., 17 tabs.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1998-05-01T23:59:59.000Z

155

Innovative Characterization of Amorphous and Thin-Film Silicon for Improved Module Performance: 28 April 2005 - 15 September 2008  

DOE Green Energy (OSTI)

This report focuses on (1) characterizing nc-Si:H from United Solar; (2) studying Si,Ge:H alloys deposited by HWCVD; and (3) characterizing CIGS films and relating to cell performance parameters.

Cohen, J. D.

2009-12-01T23:59:59.000Z

156

Thin film photovoltaic device with multilayer substrate  

DOE Patents (OSTI)

A thin film photovoltaic device which utilizes at least one compound semiconductor layer chosen from Groups IIB and VA of the Periodic Table is formed on a multilayer substrate The substrate includes a lowermost support layer on which all of the other layers of the device are formed. Additionally, an uppermost carbide or silicon layer is adjacent to the semiconductor layer. Below the carbide or silicon layer is a metal layer of high conductivity and expansion coefficient equal to or slightly greater than that of the semiconductor layer.

Catalano, Anthony W. (Rushland, PA); Bhushan, Manjul (Wilmington, DE)

1984-01-01T23:59:59.000Z

157

Photovoltaic manufacturing technology monolithic amorphous silicon modules on continuous polymer substrates: Final technical report, July 5, 1995--December 31, 1999  

DOE Green Energy (OSTI)

Iowa Thin Film Technologies is completing a three-phase program that has increased throughput and decreased costs in nearly all aspects of its thin-film photovoltaic manufacturing process. The overall manufacturing costs have been reduced by 61 percent through implementation of the improvements developed under this program. Development of the ability to use a 1-mil substrate, rather than the standard 2-mil substrate, results in a 50 percent cost-saving for this material. Process development on a single-pass amorphous silicon deposition system has resulted in a 37 percent throughput improvement. A wide range of process and machine improvements have been implemented on the transparent conducting oxide deposition system. These include detailed parameter optimization of deposition temperatures, process gas flows, carrier gas flows, and web speeds. An overall process throughput improvement of 275 percent was achieved based on this work. The new alignment technique was developed for the laser scriber and printer systems, which improved registration accuracy from 100 microns to 10 microns. The new technique also reduced alignment time for these registration systems significantly. This resulted in a throughput increase of 75 percent on the scriber and 600 percent on the printer. Automated techniques were designed and implemented for the module assembly processes. These include automated busbar attachment, roll-based lamination, and automated die cutting of finished modules. These processes were previously done by hand labor. Throughput improvements ranged from 200 percent to 1200 percent, relative to hand labor rates. A wide range of potential encapsulation materials were evaluated for suitability in a roll lamination process and for cost-effectiveness. A combination material was found that has a cost that is only 10 percent of the standard EVA/Tefzel cost and is suitable for medium-lifetime applications. The 20-year lifetime applications still require the more expensive material.

Jeffrey, F.

2000-03-28T23:59:59.000Z

158

Thin film ion conducting coating  

DOE Patents (OSTI)

Durable thin film ion conducting coatings are formed on a transparent glass substrate by the controlled deposition of the mixed oxides of lithium:tantalum or lithium:niobium. The coatings provide durable ion transport sources for thin film solid state storage batteries and electrochromic energy conservation devices.

Goldner, Ronald B. (Lexington, MA); Haas, Terry (Sudbury, MA); Wong, Kwok-Keung (Watertown, MA); Seward, George (Arlington, MA)

1989-01-01T23:59:59.000Z

159

Thin films: Past, present, future  

DOE Green Energy (OSTI)

This report describes the characteristics of the thin film photovoltaic modules necessary for an acceptable rate of return for rural areas and underdeveloped countries. The topics of the paper include a development of goals of cost and performance for an acceptable PV system, a review of current technologies for meeting these goals, issues and opportunities in thin film technologies.

Zweibel, K.

1995-04-01T23:59:59.000Z

160

Vertically Aligned Nanocomposite Thin Films  

E-Print Network (OSTI)

Vertically aligned nanocomposite (VAN) thin films have recently stimulated significant research interest to achieve better material functionality or multifunctionalities. In VAN thin films, both phases grow epitaxially in parallel on given substrates and form a unique nano-checkerboard structure. Multiple strains, including the vertical strain which along the vertical interface and the substrate induced strain which along the film and substrate interface, exist in VAN thin films. The competition of these strains gives a promise to tune the material lattice structure and future more the nanocomposite film physical properties. Those two phases in the VAN thin films are selected based on their growth kinetics, thermodynamic stability and epitaxial growth ability on given substrates. In the present work, we investigated unique epitaxial two-phase VAN (BiFeO3)x:(Sm2O3)1-x and (La0.7Sr0.3MnO3)x:(Mn3O4)1-x thin film systems by pulsed laser deposition. These VAN thin films exhibit a highly ordered vertical columnar structure with good epitaxial quality. The strain of the two phases can be tuned by deposition parameters, e.g. deposition frequency and film composition. Their strain tunability is found to be related directly to the systematic variation of the column widths and domain structures. Their physical properties, such as dielectric loss and ferromagnetisms can be tuned systematically by this variation. The growth morphology, microstructure and material functionalities of VAN thin films can be varied by modifying the phase ratio, substrate orientation or deposition conditions. Systematic study has been done on growing (SrTiO3)0.5:(MgO)0.5 VAN thin films on SrTiO3 and MgO substrates, respectively. The variation of column width demonstrates the substrate induced strain plays another important role in the VAN thin film growth. The VAN thin films also hold promise in achieving porous thin films with ordered nanopores by thermal treatment. We selected (BiFeO3)0.5:(Sm2O3)0.5 VAN thin films as a template and get uniformly distributed bi-layered nanopores. Controllable porosity can be achieved by adjusting the microstructure of VAN (BiFeO3):(Sm2O3) thin films and the annealing parameters. In situ heating experiments within a transmission electron microscope column provide direct observations into the phases transformation, evaporation and structure reconstruction during the annealing. Systematic study in this dissertation demonstrate that the vertically aligned nanocomposite microstructure is a brand new architecture in thin films and an exciting approach that promises tunable material functionalities as well as novel nanostructures.

Bi, Zhenxing

2011-05-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


161

NIST Hydrogen Storage in Thin Films  

Science Conference Proceedings (OSTI)

Hydrogen Storage Optimization in Thin Film Combinatorial Alloys. ... Magnesium Thin Films," International Journal of Hydrogen Energy, doi:10.1016/j ...

2013-04-01T23:59:59.000Z

162

Thin Film and Nanostructure Processing Group Homepage  

Science Conference Proceedings (OSTI)

... The Thin Film and Nanostructure Processing Group is one of seven ... Deposition of thin films Electrodeposition of metals and alloys Evaporation of ...

2012-10-15T23:59:59.000Z

163

Metals Thin-Films Information at NIST  

Science Conference Proceedings (OSTI)

NIST Home > Metals Thin-Films Information at NIST. Metals Thin-Films Information at NIST. (the links below are a compilation ...

2010-05-24T23:59:59.000Z

164

Optical Characterization of Advanced Thin Films  

Science Conference Proceedings (OSTI)

... Recently, thin films of spun-cast poly(2,5-bis(3-alkylthiophen ... been demonstrated to exhibit exceptional hole mobilities in thin film transistors (TFTs ...

2012-10-02T23:59:59.000Z

165

Thin Film Solar Technologies | Open Energy Information  

Open Energy Info (EERE)

Login | Sign Up Search Page Edit with form History Facebook icon Twitter icon Thin Film Solar Technologies Jump to: navigation, search Name Thin Film Solar Technologies...

166

Interfaces in Nanostructured Functional Oxide Thin Films  

Science Conference Proceedings (OSTI)

The thin film systems include high temperature superconductors (HTS), thin film solid oxide fuel cells (SOFC), and other functional oxide systems. Detailed ...

167

High-Efficiency Polycrystalline CdTe Thin-Film Solar Cells with an Oxygenated Amorphous CdS (a-CdS:O) Window Layer: Preprint  

DOE Green Energy (OSTI)

In the conventional CdS/CdTe device structure, the poly-CdS window layer has a bandgap of {approx}2.4 eV, which causes absorption in the short-wavelength region. Higher short-circuit current densities (Jsc) can be achieved by reducing the CdS thickness, but this can adversely impact device open-circuit voltage (Voc) and fill factor (FF). Also, poly-CdS film has about 10% lattice mismatch related to the CdTe film, which limits the improvement of device Voc and FF. In this paper, we report a novel window material: oxygenated amorphous CdS film (a-CdS:O) prepared at room temperature by rf sputtering. The a-CdS:O film has a higher optical bandgap (2.5-3.1 eV) than the poly-CdS film and an amorphous structure. The preliminary device results have demonstrated that Jsc of the CdTe device can be greatly improved while maintaining higher Voc and FF. We have fabricated a CdTe cell demonstrating an NREL-confirmed Jsc of 25.85 mA/cm2 and a total-area efficiency of 15.4%.

Wu, X.; Dhere, R. G.; Yan, Y.; Romero, M. J.; Zhang, Y.; Zhou, J.; DeHart, C.; Duda, A.; Perkins, C.; To, B.

2002-05-01T23:59:59.000Z

168

Rechargeable thin-film lithium batteries  

SciTech Connect

Rechargeable thin-film batteries consisting of lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have recently been developed. The batteries, which are typically less than 6-{mu}m thick, can be fabricated to any specified size, large or small, onto a variety of substrates including ceramics, semiconductors, and plastics. The cells that have been investigated include Li-TiS{sub 2}, Li-V{sub 2}O{sub 5}, and Li-Li{sub x}Mn{sub 2}O{sub 4}, with open circuit voltages at full charge of about 2.5, 3.6, and 4.2, respectively. The development of these batteries would not have been possible without the discovery of a new thin-film lithium electrolyte, lithium phosphorus oxynitride, that is stable in contact with metallic lithium at these potentials. Deposited by rf magnetron sputtering of Li{sub 3}PO{sub 4} in N{sub 2}, this material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46} and a conductivity at 25{degrees}C of 2 {mu}S/cm. The maximum practical current density obtained from the thin-film cells is limited to about 100 {mu}A/cm{sup 2} due to a low diffusivity of Li{sup +} ions in the cathodes. In this work, the authors present a short review of their work on rechargeable thin-film lithium batteries.

Bates, J.B.; Gruzalski, G.R.; Dudney, N.J.; Luck, C.F.; Yu, Xiaohua

1993-08-01T23:59:59.000Z

169

Micro/nano devices fabricated from Cu-Hf thin films  

DOE Patents (OSTI)

An all-metal microdevice or nanodevice such as an atomic force microscope probe is manufactured from a copper-hafnium alloy thin film having an x-ray amorphous microstructure.

Luber, Erik J; Ophus, Colin; Mitlin, David; Olsen, Brian; Harrower, Christopher; Radmilovi, Velimir

2013-06-04T23:59:59.000Z

170

Photoluminescence in silicon implanted with silicon ions at amorphizing doses  

Science Conference Proceedings (OSTI)

Luminescent and structural properties of n-FZ-Si and n-Cz-Si implanted with Si ions at amorphizing doses and annealed at 1100 Degree-Sign C in a chlorine-containing atmosphere have been studied. An analysis of proton Rutherford backscattering spectra of implanted samples demonstrated that an amorphous layer is formed, and its position and thickness depend on the implantation dose. An X-ray diffraction analysis revealed that defects of the interstitial type are formed in the samples upon annealing. Photoluminescence spectra measured at 78 K and low excitation levels are dominated by the dislocation-related line D1, which is also observed at 300 K. The peak position of this line, its full width at half-maximum, and intensity depend on the conduction type of Si and implantation dose. As the luminescence excitation power is raised, a continuous band appears in the spectrum. A model is suggested that explains the fundamental aspects of the behavior of the photoluminescence spectra in relation to the experimental conditions.

Sobolev, N. A., E-mail: nick@sobolev.ioffe.rssi.ru; Kalyadin, A. E.; Kyutt, R. N.; Sakharov, V. I.; Serenkov, I. T.; Shek, E. I.; Afrosimov, V. V. [Russian Academy of Sciences, Ioffe Physical Technical Institute (Russian Federation); Tetel'baum, D. I. [Lobachevsky State University, Physicotechnical Research Institute (Russian Federation)

2011-09-15T23:59:59.000Z

171

CFN | Thin Films Group  

NLE Websites -- All DOE Office Websites (Extended Search)

Materials Synthesis and Characterization Facility Materials Synthesis and Characterization Facility Thin-Film Processing Facility Online Manager (FOM) website FOM manual ESR for lab 1L32 (High-Resolution SEM and x-ray microanalysis) CFN Operations Safety Awareness (COSA) form for 1L32 (ESR #1) Technical article on LABE detector (Analytical SEM) Request form for off-hours access (.doc, First time only, renewals done via email) Lab Tool capabilities Primary contact Training schedule Backup contact Booking calendar Booking rules SOP 1L32 Analytical SEM Camino Thurs 10-12 PM Stein FOM yes yes Hitachi S-4800 SEM Stein Tues 1-3 PM Black FOM no yes booking calendar: yes = need to reserve tool time in calendar before using tool booking rules: yes = specific rules exist for reserving tool time SOP = standard operating procedure (basic instructions)

172

Characterization for the Onset of Crystallization of Amorphous to Microcrystalline Silicon by Optical Spectroscopies  

DOE Green Energy (OSTI)

We study the amorphous to microcrystalline silicon films made at three laboratories by using Raman, photoluminescence- and optical-abosrption spectroscopies.

Yue, G.; Han, D.; Ganguly, G.; Wang, Q.; Yang, J.; Guha, S.

2000-01-01T23:59:59.000Z

173

Effects of Different Precursor's Concentration on the Properties of Zinc Oxide Thin Films  

Science Conference Proceedings (OSTI)

Zinc oxide (ZnO) thin films were successfully grown on silicon substrate with different molarities, by a sol-gel method. In the process, the molarities were varied from 0.2-1.0 M and it was found that increasing in molarities had affected the structure of ZnO thin films. The properties of the thin films were characterized and studied by ultraviolet-visible spectroscopy (UV-Vis) and photoluminescence spectrometer (PL). It was found that the molarities affect the optical properties of the resultant ZnO thin films.

Malek, M. F.; Zakaria, N.; Sahdan, M. Z.; Mamat, M. H. [Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam, Selangor (Malaysia); Khusaimi, Z. [NANO-SciTech Centre, Institute of Science, Universiti Teknologi MARA, 40450 Shah Alam, Selangor (Malaysia); Rusop, M. [Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam, Selangor (Malaysia); NANO-SciTech Centre, Institute of Science, Universiti Teknologi MARA, 40450 Shah Alam, Selangor (Malaysia)

2010-07-07T23:59:59.000Z

174

Low-band-gap, amorphous-silicon-based alloys by chemical vapor deposition: Annual subcontract report, 1 October 1985-31 January 1986  

DOE Green Energy (OSTI)

This research was conducted to determine the potential of photochemical vapor deposition (photo-CVD) for producing high-quality, low-band-gap amorphous silicon germanium alloys for use in high-efficiency, multijunction, thin-film photovoltaic solar cells. A photo-CVD reactor for mercury-sensitized photolysis of silane-germane and disilane-germane mixtures was developed. Alloy thin films of undoped a-Si/sub 1-x/Ge/sub x/:H were deposited using mercury vapor mixed with SiH/sub 4/ or Si/sub 2/H/sub 6/, GeH/sub 4/, and diluent gas of Ar, He, or H/sub 2/. Materials properties were characterized by measurements of Ge content, optical transmission and reflection, and dark and photo-conductivity. Opto-electronic properties of photo-CVD a-Si/sub 1-x/Ge/sub x/:H were found to be comparable to glow discharge and sputtered materials. Moreover, p-i-n solar cells with low-band-gap i-layers were able to be fabricated by photo-CVD.

Baron, B.N.; Jackson, S.C.

1986-12-01T23:59:59.000Z

175

Low-band-gap, amorphous-silicon-based alloys by photochemical vapor deposition: Final report, 1 October 1985--30 November 1986  

DOE Green Energy (OSTI)

Thin films of hydrogenated amorphous silicon-germanium alloys were deposited by mercury-sensitized photochemical vapor deposition using a novel photo-CVD reactor. Thin films of a-Si/sub 1-x/Ge/sub x/:H with 0 less than or equal to x less than or equal to 1 and 1.0 less than E/sub g/ less than 1.8 eV were deposited from mixtures of silane and disilane with germane and inert gas diluents at substrate temperatures from 160/degree/ to 200/degree/C. Alloy films were characterized by measurements of photo- and dark conductivity, electron mobility-lifetime product, sub-band-gap absorption, and density of states. Dilution with hydrogen increased the photoconductivity to 10/sup /minus/5/ Scm and mobility-lifetime product to 6 /times/ 10/sup /minus/8/ cm/sup 2/V for alloys having a band gap of 1.4 eV.

Baron, B.N.; Hegedus, S.S.; Jackson, S.C.

1988-02-01T23:59:59.000Z

176

Atomic-scale characterization of hydrogenated amorphous-silicon films and devices. Annual subcontract report, 15 April 1994--14 March 1998  

DOE Green Energy (OSTI)

The research is concerned with improving the electronic properties of hydrogenated amorphous silicon (a-Si:H) films and of photovoltaic (PV) cells that use these films. Two approaches toward this goal are being taken. One is to establish the character of silicon particle growth in the rf glow discharges that are used to make the films and PV cells, and to understand the particle incorporation into the films. The ultimate goal of this effort is to find mitigation techniques that minimize the particle incorporation. During this contract period the authors have developed a novel particle light-scattering technique that provides a detailed and sensitive diagnostic of small (8-60 nm diameter) particles suspended in the discharge. The authors have used this to measure the particle growth rates and densities, versus conditions in pure-silane discharges. The second program is directed toward measuring the electronic properties of thin-film PV cells, as a function of depth within the cell. The approach being taken is to use a scanning tunneling microscope (STM) to measure the depth-dependent electronic properties of cross-sectioned PV cells. During the present period, measurements on single and tandem amorphous silicon cells have been carried out. Using STM current-voltage spectroscopy, these measurements distinguish the boundaries between the highly-conducting and intrinsic layers, as well as the chemical potential versus depth in the cell.

Gallagher, A.; Barzen, S.; Childs, M.; Laracuente, A. [National Inst. of Standards and Technology, Boulder, CO (United States)

1998-06-01T23:59:59.000Z

177

Thin-film rechargeable lithium batteries  

SciTech Connect

Rechargeable thin-films batteries with lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have been fabricated and characterized. The cathodes include TiS{sub 2}, the {omega} phase of V{sub 2}O{sub 5}, and the cubic spinel Li{sub x}Mn{sub 2}O{sub 4} with open circuit voltages at full charge of about 2.5 V, 3.7 V, and 4.2 V, respectively. The development of these robust cells, which can be cycled thousands of times, was possible because of the stability of the amorphous lithium electrolyte, lithium phosphorus oxynitride. This material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46} and a conductivity at 25 C of 2 {mu}S/cm. Thin-film cells have been cycled at 100% depth of discharge using current densities of 2 to 100 {mu}A/cm{sup 2}. The polarization resistance of the cells is due to the slow insertion rate of Li{sup +} ions into the cathode. Chemical diffusion coefficients for Li{sup +} ions in the three types of cathodes have been estimated from the analysis of ac impedance measurements.

Bates, J.B.; Gruzalski, G.R.; Dudney, N.J.; Luck, C.F.; Yu, X.

1993-11-01T23:59:59.000Z

178

Rechargeable thin-film lithium batteries  

Science Conference Proceedings (OSTI)

Rechargeable thin-film batteries consisting of lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have been fabricated and characterized. These include Li-TiS{sub 2}, Li-V{sub 2}O{sub 5}, and Li-Li{sub x}Mn{sub 2}O{sub 4} cells with open circuit voltages at full charge of about 2.5 V, 3.7 V, and 4.2 V, respectively. The realization of these robust cells, which can be cycled thousands of times, was possible because of the stability of the amorphous lithium electrolyte, lithium phosphorus oxynitride. This material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46}and a conductivity at 25 C of 2 {mu}S/cm. The thin-film cells have been cycled at 100% depth of discharge using current densities of 5 to 100 {mu}A/cm{sup 2}. Over most of the charge-discharge range, the internal resistance appears to be dominated by the cathode, and the major source of the resistance is the diffusion of Li{sup +} ions from the electrolyte into the cathode. Chemical diffusion coefficients were determined from ac impedance measurements.

Bates, J.B.; Gruzalski, G.R.; Dudney, N.J.; Luck, C.F.; Yu, X.

1993-09-01T23:59:59.000Z

179

Thin-film Rechargeable Lithium Batteries  

DOE R&D Accomplishments (OSTI)

Rechargeable thin films batteries with lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have been fabricated and characterized. The cathodes include TiS{sub 2}, the {omega} phase of V{sub 2}O{sub 5}, and the cubic spinel Li{sub x}Mn{sub 2}O{sub 4} with open circuit voltages at full charge of about 2.5 V, 3.7 V, and 4.2 V, respectively. The development of these robust cells, which can be cycled thousands of times, was possible because of the stability of the amorphous lithium electrolyte, lithium phosphorus oxynitride. This material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46} and a conductivity at 25 C of 2 {mu}S/cm. Thin film cells have been cycled at 100% depth of discharge using current densities of 2 to 100 {mu}A/cm{sup 2}. The polarization resistance of the cells is due to the slow insertion rate of Li{sup +} ions into the cathode. Chemical diffusion coefficients for Li{sup +} ions in the three types of cathodes have been estimated from the analysis of ac impedance measurements.

Bates, J. B.; Gruzalski, G. R.; Dudney, N. J.; Luck, C. F.; Yu, X.

1993-11-00T23:59:59.000Z

180

Thin Film and nanostructure Processing Staff  

Science Conference Proceedings (OSTI)

Thin Film Nanostructure Staff Directory. John Bonevich, Group Leader. Shari Beauchamp, Office Assistant. STAFF & NRC POSTDOCS. ...

2013-06-11T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


181

Progress in amorphous silicon PV technology: An update  

DOE Green Energy (OSTI)

To reach the 15% stabilized efficiency goal for amorphous silicon (a-Si) modules by the year 2005, the National Renewable Energy Laboratory has established four research teams. The teams -- with members from industry, universities, and NREL -- have been in operation for 2.5 years now. Consensus has been reached that a triple-junction a-Si structure is needed to reach the efficiency goal. Performance parameter goals for the overall structure and the three component cells have been formulated. All four teams have generated their own development plans. Individual team progress relative to the plans is reported.

Luft, W.; Branz, H.M. [National Renewable Energy Lab., Golden, CO (United States); Dalal, V.L. [Iowa State Univ., Ames, IA (United States); Hegedus, S.S. [Delaware Univ., Newark, DE (United States). Inst. of Energy Conversion; Schiff, E.A. [Syracuse Univ., NY (United States)

1995-07-01T23:59:59.000Z

182

Recombination and metastability in amorphous silicon and silicon germanium alloys  

DOE Green Energy (OSTI)

This report describes the first year of a continuing research study to understand how recombination, trapping, and band-mobility modification affecting the electronic properties of amorphous semiconductors can be measured, characterized, and described by an appropriate spectrum of defect states, and how light-induced defects in a-Si:H and native defects in a-SiGe:H affect transport properties in these materials. The objective was to determine how the Staebler-Wronski defects affect the electronic processes in a-Si:H and a-SiGe:H films. To do this, electroluminescence (EL) and forward bias current in p-i-n devices (i-layer thickness > 2 {mu}m) were studied both experimentally and theoretically before and after light soaking. A simple picture was developed to compare forward bias current to the EL signal. The result was unexpected: the product of the final current times the rise time was not constant before and after light soaking as expected from the concept of gain band width, but instead changed radically. The rise time t{sub x} increased by more than one order of magnitude while the final current I{sub f} did not change significantly with light soaking. On the other hand the I{sub f}t{sub x} product did hold close to a constant when only the applied voltage changed.

Silver, M. (North Carolina Univ., Chapel Hill, NC (United States))

1992-07-01T23:59:59.000Z

183

Chemical vapor deposition of amorphous silicon films from disilane  

SciTech Connect

Amorphous silicon films for fabrication of solar cells have been deposited by thermal chemical vapor deposition (CVD) from disilane (Si/sub 2/H/sub 6/) using a tubular flow reactor. A mathematical description for the CVD reactor was developed and solved by a numerical procedure. The proposed chemical reaction network for the model is based on silylene (SiH/sub 2/) insertion in the gas phase and film growth from SiH/sub 2/ and silicon polymers (Si/sub n/N/sub 2n/, n approx. 10). Estimates of the rate constants have been obtained for trisilane decomposition, silicon polymer formation, and polymer dehydrogenation. The silane unimolecular decomposition rate constants were corrected for pressure effects. The model behavior is compared to the experimental results over the range of conditions: reactor temperature (360 to 485/sup 0/C), pressures (2 to 48 torr), and gas holding time (1 to 70 s). Within the above range of conditions, film growth rate varies from 0.01 to 30 A/s. Results indicate that silicon polymers are the main film precursors for gas holding times greater than 3 s. Film growth by silylene only becomes important at short holding times, large inert gas dilution, and positions near the beginning of the reactor hot zone.

Bogaert, R.J.

1986-01-01T23:59:59.000Z

184

Sputtered pin amorphous silicon semi-conductor device and method therefor  

DOE Patents (OSTI)

A high efficiency amorphous silicon PIN semi-conductor device is constructed by the sequential sputtering of N, I and P layers of amorphous silicon and at least one semi-transparent ohmic electrode. A method of construction produces a PIN device, exhibiting enhanced physical integrity and facilitates ease of construction in a singular vacuum system and vacuum pump down procedure.

Moustakas, Theodore D. (Berkeley Heights, NJ); Friedman, Robert A. (Milford, NJ)

1983-11-22T23:59:59.000Z

185

Real Time Optics of the Growth of Textured Silicon Films in Photovoltaics: Final Technical Report, 1 August 1999--12 August 2002  

DOE Green Energy (OSTI)

Novel optical instruments, including single and dual rotating-compensator multichannel ellipsometers, have been designed and developed to probe the evolution of the microstructure, spectroscopic optical properties, and other materials characteristics during the fabrication and processing of individual thin films and thin-film structures used in photovoltaic devices. These instruments provide a foundation for next-generation process design/control and metrology in existing and future photovoltaics technologies. In this project, the materials system studied in the greatest detail was thin-film silicon, fabricated at low temperatures by plasma-enhanced chemical vapor deposition. Real-time measurements of such thin films by multichannel ellipsometry have established deposition phase diagrams that provide guiding principles for multistep fabrication of high-performance amorphous (a-Si:H) and microcrystalline (mc-Si:H) solar cells. Such phase diagrams have also served to disprove conventional wisdom in the fabrication of thin-film solar cell structures, thus avoiding future unproductive research efforts.

Collins, R. W.; Wronski, C. R.

2003-10-01T23:59:59.000Z

186

Low Cost Thin Film Building-Integrated Photovoltaic Systems  

DOE Green Energy (OSTI)

The goal of the program is to develop 'LOW COST THIN FILM BUILDING-INTEGRATED PV SYSTEMS'. Major focus was on developing low cost solution for the commercial BIPV and rooftop PV market and meet DOE LCOE goal for the commercial market segment of 9-12 cents/kWh for 2010 and 6-8 cents/kWh for 2015. We achieved the 2010 goal and were on track to achieve the 2015 goal. The program consists of five major tasks: (1) modules; (2) inverters and BOS; (3) systems engineering and integration; (4) deployment; and (5) project management and TPP collaborative activities. We successfully crossed all stage gates and surpassed all milestones. We proudly achieved world record stable efficiencies in small area cells (12.56% for 1cm2) and large area encapsulated modules (11.3% for 800 cm2) using a triple-junction amorphous silicon/nanocrystalline silicon/nanocrystalline silicon structure, confirmed by the National Renewable Energy Laboratory. We collaborated with two inverter companies, Solectria and PV Powered, and significantly reduced inverter cost. We collaborated with three universities (Syracuse University, University of Oregon, and Colorado School of Mines) and National Renewable Energy Laboratory, and improved understanding on nanocrystalline material properties and light trapping techniques. We jointly published 50 technical papers in peer-reviewed journals and International Conference Proceedings. We installed two 75kW roof-top systems, one in Florida and another in New Jersey demonstrating innovative designs. The systems performed satisfactorily meeting/exceeding estimated kWh/kW performance. The 50/50 cost shared program was a great success and received excellent comments from DOE Manager and Technical Monitor in the Final Review.

Dr. Subhendu Guha; Dr. Jeff Yang

2012-05-25T23:59:59.000Z

187

NREL Core Program (NCPV), Session: Film Silicon (Presentation)  

DOE Green Energy (OSTI)

This project supports the Solar America Initiative by: R and D that contributes to goal of grid parity by 2015; research to fill the industry R and D pipeline for next-generation low-cost scalable products; development of industry collaborative research; and improvement of NREL tools and capabilities for film silicon research. The project addresses both parts of film silicon roadmap: (1) amorphous-silicon-based thin film PV--amorphous and nanocrystalline materials, present '2nd generation' technology, 4% of world PV sales in 2007; (2) advanced R and D toward film crystal silicon--definition, large-grained or single-crystal silicon < 100 {micro}m thick; 3-8 year horizon; and goal of reaching 15% cells at area costs approaching thin films.

Branz, H. M.

2008-04-01T23:59:59.000Z

188

Integrated photonic structures for light trapping in thin-film Si solar cells  

E-Print Network (OSTI)

We explore the mechanisms for an efficient light trapping structure for thin-film silicon solar cells. The design combines a distributed Bragg reflector (DBR) and periodic gratings. Using photonic band theories and numerical ...

Sheng, Xing

189

Preparation of thin films by ablation with ANACONDA ion beam generator  

Science Conference Proceedings (OSTI)

Thin films of silicon carbide are produced by using the technology of ion beam evaporation. Various analytical methods are used to analyze film thickness, film composition and crystallization for samples obtained with different target-substrate distances.

Yatsui, K.; Jiang, W. [Nagaoka Univ. of Technology (Japan). Lab. of Beam Technology; Davis, H.A.; Olson, J.C.; Waganaar, W.J.; Rej, D. [Los Alamos National Lab., NM (United States)

1996-12-31T23:59:59.000Z

190

Polycrystalline thin-film solar cells and modules  

DOE Green Energy (OSTI)

This paper describes the recent technological advances in polycrystalline thin-film solar cells and modules. Three thin film materials, namely, cadmium telluride (CdTe), copper indium diselenide (CuInSe{sub 2}, CIS) and silicon films (Si-films) have made substantial technical progress, both in device and module performance. Early stability results for modules tested outdoors by various groups worldwide are also encouraging. The major global players actively involved in the development of the these technologies are discussed. Technical issues related to these materials are elucidated. Three 20-kW polycrystalline thin-film demonstration photovoltaic (PV) systems are expected to be installed in Davis, CA in 1992 as part of the Photovoltaics for Utility-Scale Applications (PVUSA) project. This is a joint project between the US Department of Energy (DOE), Pacific Gas and Electric (PG&E), Electric Power Research Institute (EPRI), California Energy Commission (CEC), and a utility consortium.

Ullal, H.S.; Stone, J.L.; Zweibel, K.; Surek, T.; Mitchell, R.L.

1991-12-01T23:59:59.000Z

191

Polycrystalline thin-film solar cells and modules  

DOE Green Energy (OSTI)

This paper describes the recent technological advances in polycrystalline thin-film solar cells and modules. Three thin film materials, namely, cadmium telluride (CdTe), copper indium diselenide (CuInSe{sub 2}, CIS) and silicon films (Si-films) have made substantial technical progress, both in device and module performance. Early stability results for modules tested outdoors by various groups worldwide are also encouraging. The major global players actively involved in the development of the these technologies are discussed. Technical issues related to these materials are elucidated. Three 20-kW polycrystalline thin-film demonstration photovoltaic (PV) systems are expected to be installed in Davis, CA in 1992 as part of the Photovoltaics for Utility-Scale Applications (PVUSA) project. This is a joint project between the US Department of Energy (DOE), Pacific Gas and Electric (PG E), Electric Power Research Institute (EPRI), California Energy Commission (CEC), and a utility consortium.

Ullal, H.S.; Stone, J.L.; Zweibel, K.; Surek, T.; Mitchell, R.L.

1991-12-01T23:59:59.000Z

192

Uncooled thin film pyroelectric IR detector with aerogel thermal isolation  

Science Conference Proceedings (OSTI)

Uncooled pyroelectric IR imaging systems, such as night vision goggles, offer important strategic advantages in battlefield scenarios and reconnaissance surveys. Until now, the current technology for fabricating these devices has been limited by low throughput and high cost which ultimately limit the availability of these sensor devices. We have developed and fabricated an alternative design for pyroelectric IR imaging sensors that utilizes a multilayered thin film deposition scheme to create a monolithic thin film imaging element on an active silicon substrate for the first time. This approach combines a thin film pyroelectric imaging element with a thermally insulating SiO{sub 2} aerogel thin film to produce a new type of uncooled IR sensor that offers significantly higher thermal, spatial, and temporal resolutions at a substantially lower cost per unit. This report describes the deposition, characterization and optimization of the aerogel thermal isolation layer and an appropriate pyroelectric imaging element. It also describes the overall integration of these components along with the appropriate planarization, etch stop, adhesion, electrode, and blacking agent thin film layers into a monolithic structure. 19 refs., 8 figs., 6 tabs.

Ruffner, J.A.; Clem, P.G.; Tuttle, B.A. [and others

1998-01-01T23:59:59.000Z

193

Applications of Passive Thin Films  

DOE Green Energy (OSTI)

The physical properties of thin films affect the performance and durability of nearly every solar energy conversion device. Familiar examples of thin films for solar applications are optical materials and protective coatings. Optimized optical properties are key to cost-effective photothermal conversion where individual components must have high absorptance, reflectance, or transmittance. The protection of sensitive substrates from corrosion and/or erosion is essential to ensure adequate component and system lifetime. Such substrates range from photovoltaic materials operating near room temperature to turbine blade structural alloys in hostile environments at very high temperatures (>1,000 degrees C). Although much has been written on particular categories of thin-film materials for solar energy (for example, absorbers for receiver surfaces), to date no one has provided an overview of the spectrum of applications for passive thin films in solar energy. This work is such an overview and also reviews the material state of the art as described in the current literature. Active thin film devices such as photovoltaics and thermoeleetrics are not discussed.

Call, P. J.

1979-05-01T23:59:59.000Z

194

Research on stable, high-efficiency amorphous silicon multijunction modules  

DOE Green Energy (OSTI)

This report describes research on semiconductor and non-semiconductor materials to enhance the performance of multi-band-gap, multijunction panel with an area greater than 900 cm[sup 2] by 1992. Double-junction and triple-junction cells are mode on a Ag/ZnO back reflector deposited on stainless steel substrates. An a-SiGe alloy is used for the i-layer in the bottom and the middle cells; the top cell uses an amorphous silicon alloy. After the evaporation of an antireflection coating, silver grids and bus bars are put on the top surface and the panel is encapsulated in an ethylene vinyl acetate (EVA)/Tefzel structure to make a 1-ft[sup 2] monolithic module.

Guha, S. (United Solar Systems Corp., Troy, MI (United States))

1992-09-01T23:59:59.000Z

195

Monolithic amorphous silicon modules on continuous polymer substrate  

DOE Green Energy (OSTI)

This report examines manufacturing monolithic amorphous silicon modules on a continuous polymer substrate. Module production costs can be reduced by increasing module performance, expanding production, and improving and modifying production processes. Material costs can be reduced by developing processes that use a 1-mil polyimide substrate and multilayers of low-cost material for the front encapsulant. Research to speed up a-Si and ZnO deposition rates is needed to improve throughputs. To keep throughput rates compatible with depositions, multibeam fiber optic delivery systems for laser scribing can be used. However, mechanical scribing systems promise even higher throughputs. Tandem cells and production experience can increase device efficiency and stability. Two alternative manufacturing processes are described: (1) wet etching and sheet handling and (2) wet etching and roll-to-roll fabrication.

Grimmer, D.P. (Iowa Thin Film Technologies, Inc., Ames, IA (United States))

1992-03-01T23:59:59.000Z

196

Thin-film Lithium Batteries  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin-Film Battery with Lithium Anode Courtesy of Oak Ridge National Laboratory, Materials Science and Technology Division Thin-Film Lithium Batteries Resources with Additional Information The Department of Energy's 'Oak Ridge National Laboratory (ORNL) has developed high-performance thin-film lithium batteries for a variety of technological applications. These batteries have high energy densities, can be recharged thousands of times, and are only 10 microns thick. They can be made in essentially any size and shape. Recently, Teledyne licensed this technology from ORNL to make batteries for medical devices including electrocardiographs. In addition, new "textured" cathodes have been developed which have greatly increased the peak current capability of the batteries. This greatly expands the potential medical uses of the batteries, including transdermal applications for heart regulation.'

197

Deposition of device quality, low hydrogen content, amorphous silicon films by hot filament technique using ``safe`` silicon source gas  

DOE Patents (OSTI)

A method is described for producing hydrogenated amorphous silicon on a substrate by flowing a stream of safe (diluted to less than 1%) silane gas past a heated filament. 7 figs.

Mahan, A.H.; Molenbroek, E.C.; Nelson, B.P.

1998-07-07T23:59:59.000Z

198

Producing thin film photovoltaic modules with high integrity interconnects and dual layer contacts  

DOE Patents (OSTI)

High performance photovoltaic modules are produced with improved interconnects by a special process. Advantageously, the photovoltaic modules have a dual layer back (rear) contact and a front contact with at least one layer. The front contact and the inner layer of the back contact can comprise a transparent conductive oxide. The outer layer of the back contact can comprise a metal or metal oxide. The front contact can also have a dielectric layer. In one form, the dual layer back contact comprises a zinc oxide inner layer and an aluminum outer layer and the front contact comprises a tin oxide inner layer and a silicon dioxide dielectric outer layer. One or more amorphous silicon-containing thin film semiconductors can be deposited between the front and back contacts. The contacts can be positioned between a substrate and an optional superstrate. During production, the transparent conductive oxide layer of the front contact is scribed by a laser, then the amorphous silicon-containing semiconductors and inner layer of the dual layer back contact are simultaneously scribed and trenched (drilled) by the laser and the trench is subsequently filled with the same metal as the outer layer of the dual layer back contact to provide a superb mechanical and electrical interconnect between the front contact and the outer layer of the dual layer back contact. The outer layer of the dual layer back contact can then be scribed by the laser. For enhanced environmental protection, the photovoltaic modules can be encapsulated.

Jansen, Kai W. (Lawrenceville, NJ); Maley, Nagi (Exton, PA)

2000-01-01T23:59:59.000Z

199

Producing thin film photovoltaic modules with high integrity interconnects and dual layer contacts  

DOE Patents (OSTI)

High performance photovoltaic modules are produced with improved interconnects by a special process. Advantageously, the photovoltaic modules have a dual layer back (rear) contact and a front contact with at least one layer. The front contact and the inner layer of the back contact can comprise a transparent conductive oxide. The outer layer of the back contact can comprise a metal or metal oxide. The front contact can also have a dielectric layer. In one form, the dual layer back contact comprises a zinc oxide inner layer and an aluminum outer layer and the front contact comprises a tin oxide inner layer and a silicon dioxide dielectric outer layer. One or more amorphous silicon-containing thin film semiconductors can be deposited between the front and back contacts. The contacts can be positioned between a substrate and an optional superstrate. During production, the transparent conductive oxide layer of the front contact is scribed by a laser, then the amorphous silicon-containing semiconductors and inner layer of the dual layer back contact are simultaneously scribed and trenched (drilled) by the laser and the trench is subsequently filled with the same metal as the outer layer of the dual layer back contact to provide a superb mechanical and electrical interconnect between the front contact and the outer layer of the dual layer back contact. The outer layer of the dual layer back contact can then be scribed by the laser. For enhanced environmental protection, the photovoltaic modules can be encapsulated.

Jansen, Kai W. (Lawrenceville, NJ); Maley, Nagi (Exton, PA)

2001-01-01T23:59:59.000Z

200

Characterization of lithium phosphorous oxynitride thin films  

DOE Green Energy (OSTI)

Electrical and electrochemical properties of an amorphous thin-film lithium electrolyte, lithium phosphorous oxynitride (Lipon), have been studied with emphasis on the stability window vs Li metal and the behavior of the Li/Lipon interface. Ion conductivity of Lipon exhibits Arrhenius behavior at {minus}26 to +140 C, with a conductivity of 1.7 {times} 10{sup {minus}6}S/cm at 25 C and an activity energy of 0.50 {plus_minus} 0.01 eV. A stability window of 5.5 V was observed with respect to a Li{sup +}/Li reference, and no detectable reaction or degradation was evident at the Li/Lipon interface upon lithium cycling.

Yu, Xiaohua; Bates, J.B.; Jellison, G.E. Jr.

1996-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


201

Thin film-coated polymer webs  

DOE Patents (OSTI)

The present invention relates to thin film-coated polymer webs, and more particularly to thin film electronic devices supported upon a polymer web, wherein the polymer web is treated with a purifying amount of electron beam radiation.

Wenz, Robert P. (Cottage Grove, MN); Weber, Michael F. (Shoreview, MN); Arudi, Ravindra L. (Woodbury, MN)

1992-02-04T23:59:59.000Z

202

Thin Film Photovoltaics - Programmaster.org  

Science Conference Proceedings (OSTI)

Thin Film Structures for Energy Efficient Systems: Thin Film Photovoltaics ... Full- inorganic Heterojunction Ink-printed Solar Cells: Seigo Ito1; 1University of Hyogo ... electrochemical impedance spectroscopy (EIS) measurements were used for ...

203

Semiconductor-nanocrystal/conjugated polymer thin films  

DOE Patents (OSTI)

The invention described herein provides for thin films and methods of making comprising inorganic semiconductor-nanocrystals dispersed in semiconducting-polymers in high loading amounts. The invention also describes photovoltaic devices incorporating the thin films.

Alivisatos, A. Paul (Oakland, CA); Dittmer, Janke J. (Munich, DE); Huynh, Wendy U. (Munich, DE); Milliron, Delia (Berkeley, CA)

2010-08-17T23:59:59.000Z

204

Thin Film Deposition Method for Sensor Manufacturing  

Scientists at Los Alamos National Laboratory (LANL) have developed an innovative method for gas sensor manufacturing using a thin film deposition. The thin film requires very little material and can be applied in high throughput applications.

205

Hysteresis in Thin-Film Rechargeable Lithium Batteries  

SciTech Connect

Discharge - charge cycling of thin-film rechargeable lithium batteries with an amorphous or nanocrystalline LiXMn2.Y04 cathode reveals evidence for a true hysteresis in the lithium insertion reaction. This is compared with an apparent hysteresis attributed to a kinetically hindered phase transition near 3 V for batteries with either a crystalline or a nanocrystalline LiJ@Yo4 cathode.

Bates, J.B.; Dudney, N.J.; Evans, C.D.; Hart, F.X.

1999-04-25T23:59:59.000Z

206

Magnetoelectric Multiferroic Thin Films and Multilayers  

Science Conference Proceedings (OSTI)

Scope, The symposium will cover thin films, single crystals, normal/relaxor ferroelectrics, piezoelectric ceramics, magnetoelectric composites, multiferroic ...

207

Magnetic behaviour of europium epitaxial thin films  

Science Conference Proceedings (OSTI)

... Magnetic behaviour of europium epitaxial thin films. Philippe Mangin, University of Nancy and NCNR. We present the magnetic ...

208

MST: Organizations: Thin Film, Vacuum, and Packaging  

NLE Websites -- All DOE Office Websites (Extended Search)

Processes & Services Electronic Fabrication Manufacturing Process Science & Technology Thin Film, Vacuum, & Packaging Organic Materials Ceramic & Glass Meso Manufacturing &...

209

Thin Film CIGS and CdTe Photovoltaic Technologies: Commercialization, Critical Issues, and Applications; Preprint  

DOE Green Energy (OSTI)

We report here on the major commercialization aspects of thin-film photovoltaic (PV) technologies based on CIGS and CdTe (a-Si and thin-Si are also reported for completeness on the status of thin-film PV). Worldwide silicon (Si) based PV technologies continues to dominate at more than 94% of the market share, with the share of thin-film PV at less than 6%. However, the market share for thin-film PV in the United States continues to grow rapidly over the past several years and in CY 2006, they had a substantial contribution of about 44%, compared to less than 10% in CY 2003. In CY 2007, thin-film PV market share is expected to surpass that of Si technology in the United States. Worldwide estimated projections for CY 2010 are that thin-film PV production capacity will be more than 3700 MW. A 40-MW thin-film CdTe solar field is currently being installed in Saxony, Germany, and will be completed in early CY 2009. The total project cost is Euro 130 million, which equates to an installed PV system price of Euro 3.25/-watt averaged over the entire solar project. This is the lowest price for any installed PV system in the world today. Critical research, development, and technology issues for thin-film CIGS and CdTe are also elucidated in this paper.

Ullal, H. S.; von Roedern, B.

2007-09-01T23:59:59.000Z

210

Thin films by metal-organic precursor plasma spray  

Science Conference Proceedings (OSTI)

While most plasma spray routes to coatings utilize solids as the precursor feedstock, metal-organic precursor plasma spray (MOPPS) is an area that the authors have investigated recently as a novel route to thin film materials. Very thin films are possible via MOPPS and the technology offers the possibility of forming graded structures by metering the liquid feed. The current work employs metal-organic compounds that are liquids at standard temperature-pressure conditions. In addition, these complexes contain chemical functionality that allows straightforward thermolytic transformation to targeted phases of interest. Toward that end, aluminum 3,5-heptanedionate (Al(hd){sub 3}), triethylsilane (HSi(C{sub 2}H{sub 5}){sub 3} or HSiEt{sub 3}), and titanium tetrakisdiethylamide (Ti(N(C{sub 2}H{sub 5}){sub 2}){sub 4} or Ti(NEt{sub 2}){sub 4}) were employed as precursors to aluminum oxide, silicon carbide, and titanium nitride, respectively. In all instances, the liquids contain metal-heteroatom bonds envisioned to provide atomic concentrations of the appropriate reagents at the film growth surface, thus promoting phase formation (e.g., Si-C bond in triethylsilane, Ti-N bond in titanium amide, etc.). Films were deposited using a Sulzer Metco TriplexPro-200 plasma spray system under various experimental conditions using design of experiment principles. Film compositions were analyzed by glazing incidence x-ray diffraction and elemental determination by x-ray spectroscopy. MOPPS films from HSiEt{sub 3} showed the formation of SiC phase but Al(hd){sub 3}-derived films were amorphous. The Ti(NEt{sub 2}){sub 4} precursor gave MOPPS films that appear to consist of nanosized splats of TiOCN with spheres of TiO{sub 2} anatase. While all films in this study suffered from poor adhesion, it is anticipated that the use of heated substrates will aid in the formation of dense, adherent films.

Schulz, Douglas L.; Sailer, Robert A.; Payne, Scott; Leach, James; Molz, Ronald J. [North Dakota State University, Fargo, North Dakota 58108-6050 (United States); Sulzer Metco (United States) Inc., Westbury, New York 11590-2724 (United States)

2009-07-15T23:59:59.000Z

211

Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier  

DOE Patents (OSTI)

A Schottky barrier amorphous silicon solar cell incorporating a thin highly doped p-type region of hydrogenated amorphous silicon disposed between a Schottky barrier high work function metal and the intrinsic region of hydrogenated amorphous silicon wherein said high work function metal and said thin highly doped p-type region forms a surface barrier junction with the intrinsic amorphous silicon layer. The thickness and concentration of p-type dopants in said p-type region are selected so that said p-type region is fully ionized by the Schottky barrier high work function metal. The thin highly doped p-type region has been found to increase the open circuit voltage and current of the photovoltaic device.

Carlson, David E. (Yardley, PA); Wronski, Christopher R. (Princeton, NJ)

1979-01-01T23:59:59.000Z

212

Stable Hydrogenated Amorphous Silicon Germanium for Photovoltaic Applications. Experimental and Computational Studies.  

E-Print Network (OSTI)

??The research was aimed at the optimisation of low band gap amorphous silicon germanium (a-SiGe:H) materials with special emphasis on developing a highly absorbing material… (more)

Jiménez Zambrano, R.

2003-01-01T23:59:59.000Z

213

Amorphous silicon cell array powered solar tracking apparatus  

DOE Patents (OSTI)

An array of an even number of amorphous silicon solar cells are serially connected between first and second terminals of opposite polarity. The terminals are connected to one input terminal of a DC motor whose other input terminal is connected to the mid-cell of the serial array. Vane elements are adjacent the end cells to selectively shadow one or the other of the end cells when the array is oriented from a desired attitude relative to the sun. The shadowing of one cell of a group of cells on one side of the mid-cell reduces the power of that group substantially so that full power from the group of cells on the other side of the mid-cell drives the motor to reorient the array to the desired attitude. The cell groups each have a full power output at the power rating of the motor. When the array is at the desired attitude the power output of the two groups of cells balances due to their opposite polarity so that the motor remains unpowered.

Hanak, Joseph J. (Lawrenceville, NJ)

1985-01-01T23:59:59.000Z

214

Hydrogenated amorphous silicon produced by pyrolysis and photolysis of disilane  

SciTech Connect

A new class of hydrogenated amorphous silicon (a-Si:H) was prepared by the thermal CVD and photo-CVD of disilane. In the low pressure thermal CVD, the horizontal quartz tube heated by resistance heaters was used as a reactor. The growth rate of the thermal CVD a-Si:H films is plotted as a function of reciprocal substrate temperature. As a new alternative approach to prepare high quality CVD films at temperatures below 300/sup 0/C, the direct photochemical decomposition of disilane has been attempted utilizing a low pressure mercury lamp as a UV radiation source. In the case of undoped and phosphorus doped films, the growth rate is independent of the substrate temperature. In contrast to this, for boron doping, the growth rate has an activation energy of 0.64 eV as in the case of the thermal CVD although the growth rate of the photo-CVD is about three times as large as that of the thermal CVD. This implies that the photoCVD process in boron doping is dominated by the thermal reaction catalyzed with diborane. The dark conductivity and photoconductivity before and after light exposure (AM-1, 200 mW/cm/sup 2/) exhibit no change, indicating the absence of the light-soak degradation in photo-CVD films. The valency control in thermal CVD and photo-CVD is also successfully carried out.

Ashida, Y.; Hirose, M.; Isogaya, K.; Kitagawa, N.; Mishima, Y.; Osuka, Y.

1984-05-01T23:59:59.000Z

215

Research on stable, high-efficiency amorphous silicon multijunction modules  

DOE Green Energy (OSTI)

This report describes research to improve the understanding of amorphous silicon alloys and other relevant non-semiconductor materials for use in high-efficiency, large-area multijunction modules. The research produced an average subcell initial efficiency of 8.8% over a 1-ft{sup 2} area using same-band-gap, dual-junction cells deposited over a ZnO/AlSi back reflector. An initial efficiency of 9.6% was achieved using a ZnO/Ag back reflector over smaller substrates. A sputtering machine will be built to deposit a ZnO/Ag back reflector over a 1-ft{sup 2} area so that a higher efficiency can also be obtained on larger substrates. Calculations have been performed to optimize the grid pattern, bus bars, and cell interconnects on modules. With our present state of technology, we expect a difference of about 6% between the aperture-area and active-area efficiencies of modules. Preliminary experiments show a difference of about 8%. We can now predict the performance of single-junction cells after long-term light exposure at 50{degree}C by exposing cells to short-term intense light at different temperatures. We find that single-junction cells deposited on a ZnO/Ag back reflector show the highest stabilized efficiency when the thickness of the intrinsic layers is about 2000 {angstrom}. 8 refs.

Guha, S. (United Solar Systems Corp., Troy, MI (United States))

1991-12-01T23:59:59.000Z

216

Research on stable, high-efficiency amorphous silicon multijunction modules  

DOE Green Energy (OSTI)

This report describes the progress made during Phase 1 of research and development program to obtain high-efficiency amorphous silicon alloy multijunction modules. Using a large-area deposition system, double-and triple-junction cells were made on stainless steel substrates of over 1 ft{sup 2} area with Ag and ZnO predeposited back reflector. Modules of over 1 ft{sup 2} were produced with between 9.2% and 9.9 initial aperture-area efficiencies as measured under a USSC Spire solar simulator. Efficiencies as measured under the NREL Spire solar simulator were found to be typically 15% to 18% lower. The causes for this discrepancy are now being investigated. The modules show about 15% degradation after 600 hours of one-sun illumination at 50{degrees}C. To optimize devices for higher stabilized efficiency, a new method was developed by which the performance of single-junction cells after long-term, one-sun exposure at 50{degrees}C can be predicted by exposing cells to short-term intense light at different temperatures. This method is being used to optimize the component cells of the multijunction structure to obtain the highest light-degraded efficiency.

Banerjee, A.; Chen, E.; Clough, R.; Glatfelter, T.; Guha, S.; Hammond, G.; Hopson, M.; Jackett, N.; Lycette, M.; Noch, J.; Palmer, T.; Pawlikiewicz, A.; Rosenstein, I.; Ross, R.; Wolf, D.; Xu, X.; Yang, J.; Younan, K.

1992-04-01T23:59:59.000Z

217

Tritiated Amorphous Silicon: Insights into the Staebler-Wronski Mechanism  

DOE Green Energy (OSTI)

Hydrogen, though essential for device-quality amorphous silicon, likely contributes to the light-induced degradation process (Staebler-Wronski effect) that reduces the solar cell efficiency by about 4 absolute percent. We are testing the role of hydrogen by using its isotope tritium. When tritium bonded to Si spontaneously decays into inert helium-3, it should leave behind the Si dangling bond defect. We have studied degradation due to tritium and note its resemblance to the Staebler-Wronski effect. Surprisingly, 100x fewer defects are created than expected from the tritium decay rate, suggesting a mechanism that heals most of the defects, even at temperatures down to 4 K. We consider different mechanisms for the thermal and athermal healing processes (e.g. motion of hydrogen, effect of beta-electrons, decay of hydrogen-tritium molecules). Our findings shed new light on the degradation mechanism in a Si:H and help reveal the role of hydrogen and structural rearrangements near a newly created defect.

Stradins, P.; Branz, H. M.; Whitaker, J.; Viner, J.; Taylor, P. C.; Johnson, E.; Kherani, N.; Zukotynski, S.

2005-01-01T23:59:59.000Z

218

Atomic-scale characterization of hydrogenated amorphous-silicon films and devices. Annual subcontract report, 14 February 1995--14 April 1996  

DOE Green Energy (OSTI)

The research is concerned with improving the electronic properties of hydrogenated amorphous silicon (a-Si:H) films and of photovoltaic (PV) cells that use these films. Two approaches toward this goal are being taken. One is to establish the character of silicon particle growth in the rf glow discharges that are used to make the films and PV cells, and to understand the particle incorporation into the films. The ultimate goal of this effort is to find mitigation techniques that minimize the particle incorporation. During this contract period, the authors have developed a novel particle light-scattering technique that provides a very detailed and sensitive diagnostic of the particles suspended in the discharge. The second program is directed toward measuring the electronic properties of these thin-film PV cells, as a function of depth within the cell. The approach being taken is to use a scanning tunneling microscope (STM) to measure the depth-dependent electronic properties of cross-sectioned PV cells. During the present period, cell cleaving and cross section locating methods, both in a UHV environment, have been successfully developed.

Gallagher, A.; Barzen, S.; Childs, M.; Laracuente, A. [National Inst. of Standards and Technology, Boulder, CO (United States)

1997-02-01T23:59:59.000Z

219

Atmospheric Pressure Plasma CVD of Amorphous Hydrogenated Silicon Carbonitride (a-SiCN:H) Films Using Triethylsilane and Nitrogen  

SciTech Connect

Amorphous hydrogenated silicon carbonitride (a-SiCN:H) thin films are synthesized by atmospheric pressure plasma enhanced chemical vapor (AP-PECVD) deposition using the Surfx Atomflow{trademark} 250D APPJ source with triethylsilane (HSiEt{sub 3}, TES) and nitrogen as the precursor and the reactive gases, respectively. The effect of the substrate temperature (T{sub s}) on the growth characteristics and the properties of a-SiCN:H films was evaluated. The properties of the films were investigated via scanning electron microscopy (SEM), atomic force microscopy (AFM) for surface morphological analyses, Fourier transform infrared spectroscopy (FTIR), and X-ray photoelectron spectroscopy (XPS) for chemical and compositional analyses; spectroscopic ellipsometry for optical properties and thickness determination and nanoindentation to determine the mechanical properties of the a-SiCN:H films. Films deposited at low T{sub s} depict organic like features, while the films deposited at high T{sub s} depict ceramic like features. FTIR and XPS studies reveal that an increases in T{sub s} helps in the elimination of organic moieties and incorporation of nitrogen in the film. Films deposited at T{sub s} of 425 C have an index of refraction (n) of 1.84 and hardness (H) of 14.8 GPa. A decrease in the deposition rate between T{sub s} of 25 and 250 C and increase in deposition rate between T{sub s} of 250 and 425 C indicate that the growth of a-SiCN:H films at lower T{sub s} are surface reaction controlled, while at high temperatures film growth is mass-transport controlled. Based on the experimental results, a potential route for film growth is proposed.

Srinivasan Guruvenket; Steven Andrie; Mark Simon; Kyle W. Johnson; Robert A. Sailer

2011-10-04T23:59:59.000Z

220

Amorphous silicon Schottky barrier solar cells incorporating a thin insulating layer and a thin doped layer  

SciTech Connect

Amorphous silicon Schottky barrier solar cells which incorporate a thin insulating layer and a thin doped layer adjacent to the junction forming metal layer exhibit increased open circuit voltages compared to standard rectifying junction metal devices, i.e., Schottky barrier devices, and rectifying junction metal insulating silicon devices, i.e., MIS devices.

Carlson, David E. (Yardley, PA)

1980-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


221

A NOVEL LOW THERMAL BUDGET THIN-FILM POLYSILICON FABRICATION PROCESS FOR LARGE-AREA, HIGH-THROUGHPUT SOLAR CELL PRODUCTION  

SciTech Connect

A novel thin-film poly-Si fabrication process has been demonstrated. This low thermal budget process transforms the single- and multi-layer amorphous silicon thin films into a poly-Si structure in one simple step over a pulsed rapid thermal annealing process with the enhancement of an ultrathin Ni layer. The complete poly-Si solar cell was fabricated in a short period of time without deteriorating the underneath glass substrate. The unique vertical crystallization process including the mechanism is discussed. Influences of the dopant type and process parameters on crystal structure will be revealed. The poly-Si film structure has been proved using TEM, XRD, Raman, and XPS methods. The poly-Si solar cell structure and the performance have been examined. In principle, the new process is potentially applicable to produce large-area thin-film poly-Si solar cells at a high throughput and low cost. A critical issue in this process is to prevent the excessive dopant diffusion during crystallization. Process parameters and the cell structure have to be optimized to achieve the production goal.

Yue Kuo

2010-08-15T23:59:59.000Z

222

Method of preparing high-temperature-stable thin-film resistors  

DOE Patents (OSTI)

A chemical vapor deposition method for manufacturing tungsten-silicide thin-film resistors of predetermined bulk resistivity and temperature coefficient of resistance (TCR) is disclosed. Gaseous compounds of tungsten and silicon are decomposed on a hot substrate to deposit a thin-film of tungsten-silicide. The TCR of the film is determined by the crystallinity of the grain structure, which is controlled by the temperature of deposition and the tungsten to silicon ratio. The bulk resistivity is determined by the tungsten to silicon ratio. Manipulation of the fabrication parameters allows for sensitive control of the properties of the resistor.

Raymond, L.S.

1980-11-12T23:59:59.000Z

223

Method of preparing high-temperature-stable thin-film resistors  

DOE Patents (OSTI)

A chemical vapor deposition method for manufacturing tungsten-silicide thin-film resistors of predetermined bulk resistivity and temperature coefficient of resistance (TCR). Gaseous compounds of tungsten and silicon are decomposed on a hot substrate to deposit a thin-film of tungsten-silicide. The TCR of the film is determined by the crystallinity of the grain structure, which is controlled by the temperature of deposition and the tungsten to silicon ratio. The bulk resistivity is determined by the tungsten to silicon ratio. Manipulation of the fabrication parameters allows for sensitive control of the properties of the resistor.

Raymond, Leonard S. (Tucson, AZ)

1983-01-01T23:59:59.000Z

224

Polycrystalline thin-film technology: Recent progress in photovoltaics  

DOE Green Energy (OSTI)

Polycrystalline thin films have made significant technical progress in the past year. Three of these materials that have been studied extensively for photovoltaic (PV) power applications are copper indium diselenide (CuInSe{sub 2}), cadmium telluride (CdTe), and thin-film polycrystalline silicon (x-Si) deposited on ceramic substrates. The first of these materials, polycrystalline thin-film CuInSe{sub 2}, has made some rapid advances in terms of high efficiency and long-term reliability. For CuInSe{sub 2} power modules, a world record has been reported on a 0.4-m{sup 2} module with an aperture-area efficiency of 10.4% and a power output of 40.4 W. Additionally, outdoor reliability testing of CuInSe{sub 2} modules, under both loaded and open-circuit conditions, has resulted in only minor changes in module performance after more than 1000 days of continuous exposure to natural sunlight. CdTe module research has also resulted in several recent improvements. Module performance has been increased with device areas reaching nearly 900 cm{sup 2}. Deposition has been demonstrated by several different techniques, including electrodeposition, spraying, and screen printing. Outdoor reliability testing of CdTe modules was also carried out under both loaded and open-circuit conditions, with more than 600 days of continuous exposure to natural sunlight. These tests were also encouraging and indicated that the modules were stable within measurement error. The highest reported aperture-area module efficiency for CdTe modules is 10%; the semiconductor material was deposited by electrodeposition. A thin-film CdTe photovoltaic system with a power output of 54 W has been deployed in Saudi Arabia for water pumping. The Module Development Initiative has made significant progress in support of the Polycrystalline Thin-Film Program in the past year, and results are presented in this paper.

Mitchell, R.L.; Zweibel, K.; Ullal, H.S.

1991-12-01T23:59:59.000Z

225

Thin Film Structures for Energy Efficient Systems  

Science Conference Proceedings (OSTI)

Thin film based energy generation and storage devices - Small scale ... Dye- sensitized Solar Cells with Anodized Aluminum Alloy-based Counter-electrodes.

226

Infrared Analysis of Advanced Thin Film Materials  

Science Conference Proceedings (OSTI)

The goals of timely and cost effective integration of these new materials into ... most widely accepted method for production monitoring of transparent thin films.

227

Enhanced Thin Film Organic Photovoltaic Devices  

A novel structure design for thin film organic photovoltaic (OPV) devices provides a system for increasing the optical absorption in the active layer. ...

228

Characterization of Micro-, Nano-, and Thin Films  

Science Conference Proceedings (OSTI)

Feb 18, 2010... CdS:In Thin Films Prepared by the Spray-Pyrolysis Technique: Shadia Ikhmayies1; Riyad Ahmad-Bitar1; 1University of Jordan

229

Polycrystalline Thin Film Solar Cell Technologies: Preprint  

DOE Green Energy (OSTI)

Rapid progress is being made by CdTe and CIGS-based thin-film PV technologies in entering commercial markets.

Ullal, H. S.

2008-12-01T23:59:59.000Z

230

Mechanical Properties of Thin Film Metallic Glass  

Science Conference Proceedings (OSTI)

Because of these and other properties, thin film metallic-glasses (TFMGs) are a promising structural material for fabricating the next generation of micro- and ...

231

Textured Ultrafine Grained Al Thin Films  

Science Conference Proceedings (OSTI)

Symposium, Fatigue and Fracture of Thin Films and Nanomaterials. Presentation Title, In-Situ ACOM-TEM Nanomechanical Testing of Textured Ultrafine ...

232

Surface Sensitive Scattering from Thin Films  

Science Conference Proceedings (OSTI)

... Thin films of few tenths of angstroms are becoming the staple of the electronic ... a powerful tool for the basic understanding of the film microstructure. ...

233

Thin film buried anode battery  

DOE Patents (OSTI)

A reverse configuration, lithium thin film battery (300) having a buried lithium anode layer (305) and process for making the same. The present invention is formed from a precursor composite structure (200) made by depositing electrolyte layer (204) onto substrate (201), followed by sequential depositions of cathode layer (203) and current collector (202) on the electrolyte layer. The precursor is subjected to an activation step, wherein a buried lithium anode layer (305) is formed via electroplating a lithium anode layer at the interface of substrate (201) and electrolyte film (204). The electroplating is accomplished by applying a current between anode current collector (201) and cathode current collector (202).

Lee, Se-Hee (Lakewood, CO); Tracy, C. Edwin (Golden, CO); Liu, Ping (Denver, CO)

2009-12-15T23:59:59.000Z

234

Thin film solar energy collector  

DOE Patents (OSTI)

A multi-layer solar energy collector of improved stability comprising: (1) a substrate of quartz, silicate glass, stainless steel or aluminum-containing ferritic alloy; (2) a solar absorptive layer comprising silver, copper oxide, rhodium/rhodium oxide and 0-15% by weight of platinum; (3) an interlayer comprising silver or silver/platinum; and (4) an optional external anti-reflective coating, plus a method for preparing a thermally stable multi-layered solar collector, in which the absorptive layer is undercoated with a thin film of silver or silver/platinum to obtain an improved conductor-dielectric tandem.

Aykan, Kamran (Monmouth Beach, NJ); Farrauto, Robert J. (Westfield, NJ); Jefferson, Clinton F. (Millburn, NJ); Lanam, Richard D. (Westfield, NJ)

1983-11-22T23:59:59.000Z

235

Thin-Film Photovoltaic Industry  

Science Conference Proceedings (OSTI)

This report presents an overview of the thin-film (TF) photovoltaic (PV) industry as of the third quarter of 2012, a time in the midst of very rapid changes.  The TFPV industry has seen significantly greater investment in the past 5 to 10 years than in any previous time and up until recently it seemed that this investment was on track to make TFPV a much larger player in the overall PV market.  However, market dynamics have conspired to dim TFPV’s near-term prospects and ...

2012-11-30T23:59:59.000Z

236

Large area ceramic thin films on plastics: A versatile route via solution processing  

Science Conference Proceedings (OSTI)

A new general route for large area, submicron thick ceramic thin films (crystalline metal oxide thin films) on plastic substrates is presented, where the crystallization of films is guaranteed by a firing process. Gel films are deposited on silicon substrates with a release layer and fired to be ceramic films, followed by transferring onto plastic substrates using adhesives. The ceramic films thus fabricated on plastics exhibit a certain degree of flexibility, implying the possibility of the technique to be applied to high-throughput roll-to-roll processes. Using this technique, we successfully realized transparent anatase thin films that provide high optical reflectance and transparent indium tin oxide thin films that exhibit electrical conductivity on polycarbonate and acrylic resin substrates, respectively. Crystallographically oriented zinc oxide films and patterned zinc oxide films are also demonstrated to be realized on acrylic resin substrates.

Kozuka, H.; Yamano, A.; Uchiyama, H.; Takahashi, M. [Faculty of Chemistry, Materials and Bioengineering, Kansai University, 3-3-35 Yamate-cho, Suita, 564-8680 (Japan); Fukui, T.; Yoki, M.; Akase, T. [Graduate School of Science and Engineering, Kansai University, 3-3-35 Yamate-cho, Suita, 564-8680 (Japan)

2012-01-01T23:59:59.000Z

237

Thin-Film Reliability Trends Toward Improved Stability  

Science Conference Proceedings (OSTI)

Long-term, stable performance of photovoltaic (PV) modules will be increasingly important to their successful penetration of the power grid. This paper summarizes more than 150 thin-film and more than 1700 silicon PV degradation rates (R{sub d}) quoted in publications for locations worldwide. Partitioning the literature results by technology and date of installation statistical analysis shows an improvement in degradation rate especially for thin-film technologies in the last decade. A CIGS array deployed at NREL for more than 5 years that appears to be stable supports the literature trends. Indoor and outdoor data indicate undetectable change in performance (0.2 {+-} 0.2 %/yr). One module shows signs of slight degradation from what appears to be an initial manufacturing defect, however it has not affected the overall system performance.

Jordan, D. C.; Kurtz, S. R.

2011-01-01T23:59:59.000Z

238

Thin-Film Reliability Trends Toward Improved Stability: Preprint  

DOE Green Energy (OSTI)

Long-term, stable performance of photovoltaic (PV) modules will be increasingly important to their successful penetration of the power grid. This paper summarizes more than 150 thin-film and more than 1700 silicon PV degradation rates (Rd) quoted in publications for locations worldwide. Partitioning the literature results by technology and date of installation statistical analysis shows an improvement in degradation rate especially for thin-film technologies in the last decade. A CIGS array deployed at NREL for more than 5 years that appears to be stable supports the literature trends. Indoor and outdoor data indicate undetectable change in performance (0.2+/-0.2 %/yr). One module shows signs of slight degradation from what appears to be an initial manufacturing defect, however it has not affected the overall system performance.

Jordan, D. C.; Kurtz, S. R.

2011-07-01T23:59:59.000Z

239

Eddy Current Testing for Detecting Small Defects in Thin Films  

SciTech Connect

Presented here is a technique of using Eddy Current based Giant Magneto-Resistance sensor (GMR) to detect surface and sub-layered minute defects in thin films. For surface crack detection, a measurement was performed on a copper metallization of 5-10 microns thick. It was done by scanning the GMR sensor on the surface of the wafer that had two scratches of 0.2 mm, and 2.5 mm in length respectively. In another experiment, metal coatings were deposited over the layers containing five defects with known lengths such that the defects were invisible from the surface. The limit of detection (resolution), in terms of defect size, of the GMR high-resolution Eddy Current probe was studied using this sample. Applications of Eddy Current testing include detecting defects in thin film metallic layers, and quality control of metallization layers on silicon wafers for integrated circuits manufacturing.

Obeid, Simon; Tranjan, Farid M. [Electrical and Computer Engineering Department, UNCC (United States); Dogaru, Teodor [Albany Instruments, 426-O Barton Creek, Charlotte, NC 28262 (United States)

2007-03-21T23:59:59.000Z

240

Thin-film optical initiator - Energy Innovation Portal  

A thin-film optical initiator having an inert, transparent substrate, a reactive thin film, which can be either an explosive or a pyrotechnic, and a reflective thin film.

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


241

Available Technologies:Improved Amorphous Silicon Solar Cells  

Solar cells; Large solar panels; ADVANTAGES. Increased performance ; Less expensive than crystalline silicon solar cells; Enables thinner, lighter solar panels;

242

Thin films of mixed metal compounds  

DOE Patents (OSTI)

A compositionally uniform thin film of a mixed metal compound is formed by simultaneously evaporating a first metal compound and a second metal compound from independent sources. The mean free path between the vapor particles is reduced by a gas and the mixed vapors are deposited uniformly. The invention finds particular utility in forming thin film heterojunction solar cells.

Mickelsen, Reid A. (Bellevue, WA); Chen, Wen S. (Seattle, WA)

1985-01-01T23:59:59.000Z

243

Thin film solar cell including a spatially modulated intrinsic layer  

SciTech Connect

One or more thin film solar cells in which the intrinsic layer of substantially amorphous semiconductor alloy material thereof includes at least a first band gap portion and a narrower band gap portion. The band gap of the intrinsic layer is spatially graded through a portion of the bulk thickness, said graded portion including a region removed from the intrinsic layer-dopant layer interfaces. The band gap of the intrinsic layer is always less than the band gap of the doped layers. The gradation of the intrinsic layer is effected such that the open circuit voltage and/or the fill factor of the one or plural solar cell structure is enhanced.

Guha, Subhendu (Troy, MI); Yang, Chi-Chung (Troy, MI); Ovshinsky, Stanford R. (Bloomfield Hills, MI)

1989-03-28T23:59:59.000Z

244

Pulsed energy synthesis and doping of silicon carbide  

DOE Patents (OSTI)

A method for producing beta silicon carbide thin films by co-depositing thin films of amorphous silicon and carbon onto a substrate is disclosed, whereafter the films are irradiated by exposure to a pulsed energy source (e.g. excimer laser) to cause formation of the beta-SiC compound. Doped beta-SiC may be produced by introducing dopant gases during irradiation. Single layers up to a thickness of 0.5-1 micron have been produced, with thicker layers being produced by multiple processing steps. Since the electron transport properties of beta silicon carbide over a wide temperature range of 27--730 C is better than these properties of alpha silicon carbide, they have wide application, such as in high temperature semiconductors, including HETEROJUNCTION-junction bipolar transistors and power devices, as well as in high bandgap solar arrays, ultra-hard coatings, light emitting diodes, sensors, etc.

Truher, J.B.; Kaschmitter, J.L.; Thompson, J.B.; Sigmon, T.W.

1995-06-20T23:59:59.000Z

245

Pulsed energy synthesis and doping of silicon carbide  

DOE Patents (OSTI)

A method for producing beta silicon carbide thin films by co-depositing thin films of amorphous silicon and carbon onto a substrate, whereafter the films are irradiated by exposure to a pulsed energy source (e.g. excimer laser) to cause formation of the beta-SiC compound. Doped beta-SiC may be produced by introducing dopant gases during irradiation. Single layers up to a thickness of 0.5-1 micron have been produced, with thicker layers being produced by multiple processing steps. Since the electron transport properties of beta silicon carbide over a wide temperature range of 27.degree.-730.degree. C. is better than these properties of alpha silicon carbide, they have wide application, such as in high temperature semiconductors, including hetero-junction bipolar transistors and power devices, as well as in high bandgap solar arrays, ultra-hard coatings, light emitting diodes, sensors, etc.

Truher, Joel B. (San Rafael, CA); Kaschmitter, James L. (Pleasanton, CA); Thompson, Jesse B. (Brentwood, CA); Sigmon, Thomas W. (Beaverton, OR)

1995-01-01T23:59:59.000Z

246

Institute of Photo Electronic Thin Film Devices and Technology...  

Open Energy Info (EERE)

Place Tianjin Municipality, China Zip 300071 Sector Solar Product A thin-film solar cell research institute in China. References Institute of Photo-Electronic Thin Film Devices...

247

Daylighting control performance of a thin-film ceramic electrochromic...  

NLE Websites -- All DOE Office Websites (Extended Search)

Daylighting control performance of a thin-film ceramic electrochromic window: Field study results Title Daylighting control performance of a thin-film ceramic electrochromic...

248

Breakthroughs in Thin-Film Magnetic Devices Earn NIST ...  

Science Conference Proceedings (OSTI)

... thin films to control magnetism as a foundation for developing better sensors and memory devices. Computer hard drives that use magnetic thin-film ...

2012-12-13T23:59:59.000Z

249

Thin-Film/Low-K Dielectric Constant Measurement  

Science Conference Proceedings (OSTI)

... to pursue a very different approach to dielectric thin-film characterization at ... at NIST; DOW will simply deposit and pattern the thin films on pretested ...

2010-10-05T23:59:59.000Z

250

Geometric shape control of thin film ferroelectrics and resulting structures  

DOE Patents (OSTI)

A monolithic crystalline structure and a method of making involves a semiconductor substrate, such as silicon, and a ferroelectric film, such as BaTiO.sub.3, overlying the surface of the substrate wherein the atomic layers of the ferroelectric film directly overlie the surface of the substrate. By controlling the geometry of the ferroelectric thin film, either during build-up of the thin film or through appropriate treatment of the thin film adjacent the boundary thereof, the in-plane tensile strain within the ferroelectric film is relieved to the extent necessary to permit the ferroelectric film to be poled out-of-plane, thereby effecting in-plane switching of the polarization of the underlying substrate material. The method of the invention includes the steps involved in effecting a discontinuity of the mechanical restraint at the boundary of the ferroelectric film atop the semiconductor substrate by, for example, either removing material from a ferroelectric film which has already been built upon the substrate, building up a ferroelectric film upon the substrate in a mesa-shaped geometry or inducing the discontinuity at the boundary by ion beam deposition techniques.

McKee, Rodney A. (Kingston, TN); Walker, Frederick J. (Oak Ridge, TN)

2000-01-01T23:59:59.000Z

251

Oxynitride Thin Film Barriers for PV Packaging  

DOE Green Energy (OSTI)

Dielectric thin-film barrier and adhesion-promoting layers consisting of silicon oxynitride materials (SiOxNy, with various stoichiometry) were investigated. For process development, films were applied to glass (TCO, conductive SnO2:F; or soda-lime), polymer (PET, polyethylene terephthalate), aluminized soda-lime glass, or PV cell (a-Si, CIGS) substrates. Design strategy employed de-minimus hazard criteria to facilitate industrial adoption and reduce implementation costs for PV manufacturers or suppliers. A restricted process window was explored using dilute compressed gases (3% silane, 14% nitrous oxide, 23% oxygen) in nitrogen (or former mixtures, and 11.45% oxygen mix in helium and/or 99.999% helium dilution) with a worst-case flammable and non-corrosive hazard classification. Method employed low radio frequency (RF) power, less than or equal to 3 milliwatts per cm2, and low substrate temperatures, less than or equal to 100 deg C, over deposition areas less than or equal to 1000 cm2. Select material properties for barrier film thickness (profilometer), composition (XPS/FTIR), optical (refractive index, %T and %R), mechanical peel strength and WVTR barrier performance are presented.

Glick, S. H.; delCueto, J. A.; Terwilliger, K. M.; Jorgensen, G. J.; Pankow, J. W.; Keyes, B. M.; Gedvilas, L. M.; Pern, F. J.

2005-11-01T23:59:59.000Z

252

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering  

Science Conference Proceedings (OSTI)

Silicon dioxide thin films have been deposited successfully on high speed steel (HSS) cutting tool substrates by means of microwave electron cyclotron resonance (MW-ECR) plasma source enhanced RF reactive magnetron sputtering of a pure silica target ... Keywords: SiO2 thin films, Electrical insulation properties, RF magnetron sputtering, Atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS)

Qiyong Zeng; Xiaofeng Zheng; Zhonghua Yu; Yunxian Cui

2010-03-01T23:59:59.000Z

253

Hybrid method of making an amorphous silicon P-I-N semiconductor device  

DOE Patents (OSTI)

The invention is directed to a hydrogenated amorphous silicon PIN semiconductor device of hybrid glow discharge/reactive sputtering fabrication. The hybrid fabrication method is of advantage in providing an ability to control the optical band gap of the P and N layers, resulting in increased photogeneration of charge carriers and device output.

Moustakas, Theodore D. (Berkeley Heights, NJ); Morel, Don L. (Woodland Hills, CA); Abeles, Benjamin (Princeton, NJ)

1983-10-04T23:59:59.000Z

254

Observation of enhanced infrared photoresponse in forward?biased amorphous silicon p?i?n diodes  

Science Conference Proceedings (OSTI)

The photoconductive response of hydrogenated amorphous silicon (a?Si:H) p?i?n diodes has been investigated under conditions of low?temperature operation. We show that cooled p?i?n diodes exhibit an enhanced infrared response when operated under forward bias conditions. The induced IR response is of the order of 10?3A/W

J. Wind; G. Müller

1991-01-01T23:59:59.000Z

255

Amorphous silicon research. Annual subcontract report, October 1, 1994--September 30, 1995  

DOE Green Energy (OSTI)

The major effort in this program is to develop cost-effective processes which satisfy efficiency, yield, and material usage criteria for mass production of amorphous silicon-based multijunction modules. New and improved processes were developed for the component cells and a more robust rear contact was developed for better long term stability.

Arya, R.R.; Bennett, M.; Bradley, D. [and others

1996-02-01T23:59:59.000Z

256

High Efficiency and High Rate Deposited Amorphous Silicon-Based Solar Cells  

E-Print Network (OSTI)

of a triple cell showing 10.7% stable efficiency. Figure 4-1 Schematic diagram of the Hot Wire CVD deposition. Task 7: High-rate deposition of a-Si based solar cells We have conducted extensive research using a hot1 High Efficiency and High Rate Deposited Amorphous Silicon-Based Solar Cells PHASE I Annual

Deng, Xunming

257

SIMS Study of Elemental Diffusion During Solid Phase Crystallization of Amorphous Silicon  

DOE Green Energy (OSTI)

Crystallization of hydrogenated amorphous silicon (a-Si:H) films deposited on low-cost substrates shows potential for solar cell applications. Secondary ion mass spectrometry (SIMS) was used to study impurity incorporation, hydrogen evolution, and dopant diffusion during the crystallization process

Reedy, R. C.; Young, D.; Branz, H. M.; Wang, Q.

2005-11-01T23:59:59.000Z

258

Cathode limited charge transport and performance of thin-film rechargeable lithium batteries  

DOE Green Energy (OSTI)

Several types of thin-film rechargeable batteries based on lithium metal anodes and amorphous V{sub 2}O{sub 5} (aV{sub 2}O{sub 5}), LiMn{sub 2}O{sub 4}, and LiCoO{sub 2} cathodes have been investigated in this laboratory. In all cases, the current density of these cells is limited by lithium ion transport in the cathodes. This paper, discusses sources of this impedance in Li-aV{sub 2}O{sub 5} and Li-LiMn{sub 2}O{sub 4} thin-film cells and their effect on cell performance.

Bates, J.B.; Hart, F.X.; Lubben, D.; Kwak, B.S.; van Zomeren, A.

1994-11-01T23:59:59.000Z

259

Aging phenomena in polystyrene thin films  

E-Print Network (OSTI)

The aging behavior is investigated for thin films of atactic polystyrene through measurements of complex electric capacitance. During isothermal aging process the real part of the electric capacitance increases with aging time, while the imaginary part decreases with aging time. This result suggests that the aging time dependence of the real and imaginary parts are mainly associated with change in thickness and dielectric permittivity, respectively. In thin films, the thickness depends on thermal history of aging even above the glass transition. Memory and `rejuvenation' effects are also observed in the thin films.

Koji Fukao; Hiroki Koizumi

2008-01-05T23:59:59.000Z

260

Thin film polycrystalline silicon solar cells  

DOE Green Energy (OSTI)

During the present quarter efficiency of heterostructure solar cells has been increased from 13 to 13.7% for single crystal and from 10.3 to 11.2% for polysilicon. For polysilicon the improvements can be attributed to reductions in grid-area coverage and in reflection losses and for single crystal to a combination of reduction in grid-area coverage and increase in fill factor. The heterostructure cells in both cases were IT0/n-Si solar cells. Degradation in Sn0/sub 2//n-Si solar cells can be greatly reduced to negligible proportions by proper encapsulation. The cells used in stability tests have an average initial efficiency of 11% which reduces to a value of about 10.5% after 6 months of exposure to sunlight and ambient conditions. This small degradation occurs within the first month, and the efficiency remains constant subsequently. The reduction in efficiency is due to a decrease in the open-circuit voltage only, while the short-circuit current and fill factor remain constant. The effects of grain-size on the Hall measurements in polysilicon have been analyzed and interpreted, with some modifications, using a model proposed by Bube. This modified model predicts that the measured effective Hall voltage is composed of components originating from the bulk and space-charge region. For materials with large grains, the carrier concentration is independent of the inter-grain boundary barrier, whereas the mobility is dependent on it. However, for small rains, both the carrier density and mobility depend on the barrier. These predictions are consistant with experimental results of mm-size Wacker polysilicon and ..mu..m-size NTD polysilicon.

Ghosh, A. K.; Feng, T.; Eustace, D. J.; Maruska, H. P.

1980-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


261

Integrated thin film batteries on silicon  

E-Print Network (OSTI)

Monolithic integration has been implemented successfully in complementary metal oxide semiconductor (CMOS) technology and led to improved device performance, increased reliability, and overall cost reduction. The next ...

Ariel, Nava

2005-01-01T23:59:59.000Z

262

Thin Film Deposition and Processing  

Science Conference Proceedings (OSTI)

... Applications: Tube 1 (T1), open for future upgrade. Silicon Nitride Deposition (Tube 2): Low Stress recipe. Stoichiometric recipe. ...

2013-09-17T23:59:59.000Z

263

Innovative Thin Films LLC | Open Energy Information  

Open Energy Info (EERE)

Thin Films LLC Thin Films LLC Jump to: navigation, search Name Innovative Thin Films LLC Place Toledo, Ohio Zip 43607 Product Provider of altnernative energy thin film deposition technology. Coordinates 46.440613°, -122.847838° Loading map... {"minzoom":false,"mappingservice":"googlemaps3","type":"ROADMAP","zoom":14,"types":["ROADMAP","SATELLITE","HYBRID","TERRAIN"],"geoservice":"google","maxzoom":false,"width":"600px","height":"350px","centre":false,"title":"","label":"","icon":"","visitedicon":"","lines":[],"polygons":[],"circles":[],"rectangles":[],"copycoords":false,"static":false,"wmsoverlay":"","layers":[],"controls":["pan","zoom","type","scale","streetview"],"zoomstyle":"DEFAULT","typestyle":"DEFAULT","autoinfowindows":false,"kml":[],"gkml":[],"fusiontables":[],"resizable":false,"tilt":0,"kmlrezoom":false,"poi":true,"imageoverlays":[],"markercluster":false,"searchmarkers":"","locations":[{"text":"","title":"","link":null,"lat":46.440613,"lon":-122.847838,"alt":0,"address":"","icon":"","group":"","inlineLabel":"","visitedicon":""}]}

264

Solid State Thin Film Lithium Microbatteries  

E-Print Network (OSTI)

Solid state thin film lithium microbatteries fabricated by pulsed-laser deposition (PLD) are suggested. During deposition the following process parameters must be considered, which are laser energy and fluence, laser pulse ...

Shi, Z.

265

Superhydrophobic Thin Film Symposium | ornl.gov  

NLE Websites -- All DOE Office Websites (Extended Search)

Connect with ORNL | For Industry | Partnerships | Events and Conferences Superhydrophobic Thin Film Symposium Sep 05 2012 12:00 AM - 05:00 PM Hosted by Oak Ridge Laboratory's...

266

Polycrystalline Thin-Film Multijunction Solar Cells  

DOE Green Energy (OSTI)

We present a digest of our research on the thin-film material components that comprise the top and bottom cells of three different material systems and the tandem devices constructed from them.

Noufi, R.; Wu, X.; Abu-Shama, J.; Ramanathan, K; Dhere, R.; Zhou, J.; Coutts, T.; Contreras, M.; Gessert, T.; Ward, J. S.

2005-11-01T23:59:59.000Z

267

Thin films for geothermal sensing: Final report  

DOE Green Energy (OSTI)

The report discusses progress in three components of the geothermal measurement problem: (1) developing appropriate chemically sensitive thin films; (2) discovering suitably rugged and effective encapsulation schemes; and (3) conducting high temperature, in-situ electrochemical measurements. (ACR)

Not Available

1987-09-01T23:59:59.000Z

268

Ambient pressure process for preparing aerogel thin films reliquified sols useful in preparing aerogel thin films  

DOE Patents (OSTI)

A method for preparing aerogel thin films by an ambient-pressure, continuous process. The method of this invention obviates the use of an autoclave and is amenable to the formation of thin films by operations such as dip coating. The method is less energy intensive and less dangerous than conventional supercritical aerogel processing techniques.

Brinker, Charles Jeffrey (Albuquerque, NM); Prakash, Sai Sivasankaran (Minneapolis, MN)

1999-01-01T23:59:59.000Z

269

Research on stable, high-efficiency, large-area amorphous silicon based modules -- Task B  

DOE Green Energy (OSTI)

This report documents progress in developing a stable, high- efficiency, four-terminal hybrid tandem module. The module consists of a semi-transparent, thin-film silicon:hydrogen alloy (TFS) top circuit and a copper indium diselenide (CuInSe{sub 2}) bottom circuit. Film deposition and patterning processes were successfully extended to 0.4-m{sup 2} substrates. A 33.2-W (8.4% efficient) module with a 3970-cm{sup 2} aperture area and a white back reflector was demonstrated; without the back reflector, the module produced 30.2 W (7.6% efficient). Placing a laminated, 31.6-W, 8.1%-efficient CuInSe{sub 2} module underneath this TFS module, with an air gap between the two, produces 11.2 W (2.9% efficient) over a 3883-cm{sup 2} aperture area. Therefore, the four-terminal tandem power output is 41.4 W, translating to a 10.5% aperture-area efficiency. Subsequently, a 37.8-W (9.7% aperture-area efficiency) CuInSe{sub 2} module was demonstrated with a 3905-cm{sup 2} aperture area. Future performances of single-junction and tandem modules of this size were modeled, and predicted power outputs exceed 50 W (13% efficient) for CuInSe{sub 2} and 65 W (17% efficient) for TFS/CuInSe{sub 2} tandem modules.

Mitchell, K.W.; Willet, D.R. (Siemens Solar Industries, Camarillo, CA (USA))

1990-10-01T23:59:59.000Z

270

Efficient Crystalline Si Solar Cell with Amorphous/Crystalline Silicon Heterojunction as Back Contact: Preprint  

DOE Green Energy (OSTI)

We study an amorphous/crystalline silicon heterojunction (Si HJ) as a back contact in industrial standard p-type five-inch pseudo-square wafer to replace Al back surface field (BSF) contact. The best efficiency in this study is over 17% with open-circuit (Voc) of 0.623 V, which is very similar to the control cell with Al BSF. We found that Voc has not been improved with the heterojunction structure in the back. The typical minority carrier lifetime of these wafers is on the order of 10 us. We also found that the doping levels of p-layer affect the FF due to conductivity and band gap shifting, and an optimized layer is identified. We conclude that an amorphous/crystalline silicon heterojunction can be a very promising structure to replace Al BSF back contact.

Nemeth, B.; Wang, Q.; Shan, W.

2012-06-01T23:59:59.000Z

271

Solid-phase epitaxy of silicon amorphized by implantation of the alkali elements rubidium and cesium  

Science Conference Proceedings (OSTI)

The redistribution of implanted Rb and Cs profiles in amorphous silicon during solid-phase epitaxial recrystallization has been investigated by Rutherford backscattering spectroscopy and secondary ion mass spectroscopy. For the implantation dose used in these experiments, the alkali atoms segregate at the a-Si/c-Si interface during annealing resulting in concentration peaks near the interface. In this way, the alkali atoms are moved towards the surface. Rutherford backscattering spectroscopy in ion channeling configuration was performed to measure average recrystallization rates of the amorphous silicon layers. Preliminary studies on the influence of the alkali atoms on the solid-phase epitaxial regrowth rate reveal a strong retardation compared to the intrinsic recrystallization rate.

Maier, R.; Haeublein, V.; Ryssel, H.; Voellm, H.; Feili, D.; Seidel, H.; Frey, L. [Lehrstuhl fuer Elektronische Bauelemente (LEB), Universitaet Erlangen-Nuernberg, Cauerstrasse 6, 91058 Erlangen (Germany); Fraunhofer-Institut fuer Integrierte Systeme und Bauelementetechnologie (IISB), Schottkystrasse 10, 91058 Erlangen (Germany); Lehrstuhl fuer Elektronische Bauelemente (LEB), Universitaet Erlangen-Nuernberg, Cauerstrasse 6, 91058 Erlangen (Germany) and Fraunhofer-Institut fuer Integrierte Systeme und Bauelementetechnologie (IISB), Schottkystrasse 10, 9 (Germany); Lehrstuhl fuer Mikromechanik, Mikrofluidik/ Mikroaktorik (LMM), Universitaet des Saarlandes, Campus A5.1, 66123 Saarbruecken (Germany); Lehrstuhl fuer Elektronische Bauelemente (LEB), Universitaet Erlangen-Nuernberg, Cauerstrasse 6, 91058 Erlangen (Germany) and Fraunhofer-Institut fuer Integrierte Systeme und Bauelementetechnologie (IISB), Schottkystrasse 10,91 (Germany)

2012-11-06T23:59:59.000Z

272

Method of controllong the deposition of hydrogenated amorphous silicon and apparatus therefor  

DOE Patents (OSTI)

An improved method and apparatus for the controlled deposition of a layer of hydrogenated amorphous silicon on a substrate. Means is provided for the illumination of the coated surface of the substrate and measurement of the resulting photovoltage at the outermost layer of the coating. Means is further provided for admixing amounts of p type and n type dopants to the reactant gas in response to the measured photovoltage to achieve a desired level and type of doping of the deposited layer.

Hanak, Joseph J. (Lawrenceville, NJ)

1985-06-25T23:59:59.000Z

273

Diagnostics of a glow discharge used to produce hydrogenated amorphous silicon films. Final subcontract report  

DOE Green Energy (OSTI)

This report and recent publications cited summarize our measurements of the neutral radicals produced in pure silane discharges, our measurements of the interaction of silane with a growing amorphous silicon surface, qualitative models of discharge neutral radical chemistry, and quantitative models of dc discharge ion chemistry. All radicals of the monosilane and disilane groups have been measured and are reported as a function of discharge parameters, but not yet for the full range of parameters that must be investigated for detailed analysis. Observations of the reaction of SiH/sub 4/ with a hot amorphous silicon surface are given. These are closely related to the dominant discharge film deposition mechanism of SiH/sub 3/ reacting with a hydrogen covered amorphous silicon surface and a surface reaction model is suggested that explains some but not all of our data. The dc discharge model is used to obtain quantitative predictions of the ion species at the cathode surface of a dc discharge. This is compared to observations and used to explain the observations at our laboratory and other laboratories. We conclude that most but not all features of the ion chemistry in dc discharges of pure silane can be relatively well understood from this model.

Gallagher, A.

1984-11-01T23:59:59.000Z

274

Chemical vapor deposition of amorphous semiconductor films. Final subcontract report  

DOE Green Energy (OSTI)

Chemical vapor deposition (CVD) from higher order silanes has been studied for fabricating amorphous hydrogenated silicon thin-film solar cells. Intrinsic and doped a-Si:H films were deposited in a reduced-pressure, tubular-flow reactor, using disilane feed-gas. Conditions for depositing intrinsic films at growth rates up to 10 A/s were identified. Electrical and optical properties, including dark conductivity, photoconductivity, activation energy, optical absorption, band-gap and sub-band-gap absorption properties of CVD intrinsic material were characterized. Parameter space for depositing intrinsic and doped films, suitable for device analysis, was identified.

Rocheleau, R.E.

1984-12-01T23:59:59.000Z

275

Thin film absorber for a solar collector  

SciTech Connect

This invention pertains to energy absorbers for solar collectors, and more particularly to high performance thin film absorbers. The solar collectors comprising the absorber of this invention overcome several problems seen in current systems, such as excessive hardware, high cost and unreliability. In the preferred form, the apparatus features a substantially rigid planar frame with a thin film window bonded to one planar side of the frame. An absorber in accordance with the present invention is comprised of two thin film layers that are sealed perimetrically. In a preferred embodiment, thin film layers are formed from a metal/plastic laminate. The layers define a fluid-tight planar envelope of large surface area to volume through which a heat transfer fluid flows. The absorber is bonded to the other planar side of the frame. The thin film construction of the absorber assures substantially full envelope wetting and thus good efficiency. The window and absorber films stress the frame adding to the overall strength of the collector.

Wilhelm, William G. (Cutchogue, NY)

1985-01-01T23:59:59.000Z

276

Thin film transistors on plastic substrates with reflective coatings for radiation protection  

DOE Patents (OSTI)

Fabrication of silicon thin film transistors (TFT) on low-temperature plastic substrates using a reflective coating so that inexpensive plastic substrates may be used in place of standard glass, quartz, and silicon wafer-based substrates. The TFT can be used in large area low cost electronics, such as flat panel displays and portable electronics such as video cameras, personal digital assistants, and cell phones.

Wolfe, Jesse D. (Fairfield, CA); Theiss, Steven D. (Woodbury, MN); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Wickbold, Paul (Walnut Creek, CA)

2006-09-26T23:59:59.000Z

277

Novel silane and disilane precursors to amorphous semiconductors: Final subcontract report, May 1988  

DOE Green Energy (OSTI)

This Final Report describes the preparation and characterization of amorphous fluorohydrogenated silicon thin films. The novel approach in this study lies in the use of fluorinated silanes as film precursors. The advantages of this method are well defined initial ratios of hydrogen and fluorine to silicon and greatly reduced hazards in the handling of the gas. Fluorine derivatives of both silane and disilane were synthesized. Both glow discharge (or plasma-enhanced CVD) and thermal (CVD) methods were employed to prepare amorphous silicon on glass and silicon wafers. The electrical characterization of the material prepared from difluorosilane showed that the a-Si:H:F films obtained are of solar-grade semiconductor quality and can be doped to p- and n-type materials with diborane and phosphine. 29 refs., 24 figs., 10 tabs.

Pernisz, U.C.; Sharp, K.G.

1988-09-01T23:59:59.000Z

278

Superhydrophobic Thin Film Symposium | ornl.gov  

NLE Websites -- All DOE Office Websites (Extended Search)

Superhydrophobic Thin Film Symposium Superhydrophobic Thin Film Symposium Sep 05 2012 12:00 AM - 05:00 PM Hosted by Oak Ridge Laboratory's Partnerships Directorate and focusing on the recent LDRD Launch project work completed by Dr. Tolga Aytug and Dr. John T. Simpson (ORNL research PI's). Oak Ridge, TN Oak Ridge National Laboratory CONTACT : Email: Cassie Lopez Phone:(865) 576-9294 Add to Calendar SHARE Hosted by Oak Ridge Laboratory's Partnerships Directorate and focusing on the recent LDRD Launch project work completed by Dr. Tolga Aytug and Dr. John T. Simpson (ORNL research PI's). Purpose To share the ORNL Superhydrophonbic Thin Film technology to prospective commercial partners. Date and Time The conference will be held on the morning of Wednesday September 5th at Oak Ridge National Laboratory (ORNL) by Partnerships and Technology

279

Method for synthesizing thin film electrodes  

SciTech Connect

A method for making a thin-film electrode, either an anode or a cathode, by preparing a precursor solution using an alkoxide reactant, depositing multiple thin film layers with each layer approximately 500 1000 .ANG. in thickness, and heating the layers to above 600.degree. C. to achieve a material with electrochemical properties suitable for use in a thin film battery. The preparation of the anode precursor solution uses Sn(OCH.sub.2C(CH.sub.3).sub.3).sub.2 dissolved in a solvent in the presence of HO.sub.2CCH.sub.3 and the cathode precursor solution is formed by dissolving a mixture of (Li(OCH.sub.2C(CH.sub.3).sub.3)).sub.8 and Co(O.sub.2CCH.sub.3).H.sub.2O in at least one polar solvent.

Boyle, Timothy J. (Albuquerque, NM)

2007-03-13T23:59:59.000Z

280

Mesoscale morphologies in polymer thin films.  

Science Conference Proceedings (OSTI)

In the midst of an exciting era of polymer nanoscience, where the development of materials and understanding of properties at the nanoscale remain a major R&D endeavor, there are several exciting phenomena that have been reported at the mesoscale (approximately an order of magnitude larger than the nanoscale). In this review article, we focus on mesoscale morphologies in polymer thin films from the viewpoint of origination of structure formation, structure development and the interaction forces that govern these morphologies. Mesoscale morphologies, including dendrites, holes, spherulites, fractals and honeycomb structures have been observed in thin films of homopolymer, copolymer, blends and composites. Following a largely phenomenological level of description, we review the kinetic and thermodynamic aspects of mesostructure formation outlining some of the key mechanisms at play. We also discuss various strategies to direct, limit, or inhibit the appearance of mesostructures in polymer thin films as well as an outlook toward potential areas of growth in this field of research.

Ramanathan, M.; Darling, S. B. (Center for Nanoscale Materials)

2011-06-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


281

Optimization of transparent and reflecting electrodes for amorphous silicon solar cells. Final technical report  

DOE Green Energy (OSTI)

Transparent conducting fluorine doped zinc oxide was deposited as thin films on soda lime glass substrates by atmospheric pressure chemical vapor deposition (CVD) at substrate temperatures of 460 to 500 degrees C. The precursors diethylzinc, tetramethylethylenediamine and benzoyl fluoride were dissolved in xylene. This solution was nebulized ultrasonically and then flash vaporized by a carrier gas of nitrogen preheated to 150 degrees C. Ethanol was vaporized separately, and these vapors were then mixed to form a homogeneous vapor mixture. Good reproducibility was achieved using this new CVD method. Uniform thicknesses were obtained by moving the heated glass substrates through the deposition zone. The best electrically and optical properties were obtained when the precursor solution was aged for more than a week before use. The films were polycrystalline and highly oriented with the c-axis perpendicular to the substrate. More than 90% of the incorporated fluorine atoms were electrically active as n-type dopants. The electrical resistivity of the films was as low as 5 x 10/sup -4/ Omega cm. The mobility was about 45 cm ²/Vs. The electron concentration was up to 3 x 10 %sup20;/cm³. The optical absorption of the films was about 3-4% at a sheet resistance of 7 ohms/square. The diffuse transmittance was about 10% at a wavelength of 650 nm. Amorphous ilicon solar cells were deposited using the textured fluorine doped zinc oxide films as a front electrode. The short circuit current was increased over similar cells made with fluorine doped tin oxide, but the open circuit voltages and fill factors were reduced. The voltage was restored by overcoating the fluorine-doped zinc oxide with a thin layer of fluorine-doped tin oxide.

Gordon, R.G.; Kramer, K.; Liang, H.; Liu, X.; Pang, D.; Teff, D.

1998-09-01T23:59:59.000Z

282

Solution of thin film magnetization problems in type-II superconductivity  

Science Conference Proceedings (OSTI)

Keywords: critical current, numerical solution, superconductivity, thin film, variational inequality

Leonid Prigozhin

1998-07-01T23:59:59.000Z

283

Role of Amorphous Silicon and Tunneling in Heterojunction with Intrinsic Thin Layer (HIT) Solar Cells  

Science Conference Proceedings (OSTI)

This work analyzes heterojunction with intrinsic thin layer (HIT) solar cells using numerical simulations. The differences between the device physics of cells with p- and n-type crystalline silicon (c-Si) wafers are substantial. HIT solar cells with n-type wafers essentially form a n/p/n structure, where tunneling across the junction heterointerfaces is a critical transport mechanism required to attain performance exceeding 20%. For HIT cells with p-type wafers, only tunneling at the back-contact barrier may be important. For p-wafer cells, the hydrogenated amorphous silicon (a-Si:H) between the indium tin oxide (ITO) and crystalline silicon may act as a passivating buffer layer but, otherwise, does not significantly contribute to device performance. For n-wafer cells, the carrier concentration and band alignment of this a-Si:H layer are critical to device performance.

Kanevce, A.; Metzger, W. K.

2009-05-01T23:59:59.000Z

284

Post-growth surface smoothing of thin films of diindenoperylene  

Science Conference Proceedings (OSTI)

We applied in situ x-ray reflectivity and ultraviolet photoelectron spectroscopy to study the impact of annealing on low temperature (200 K) deposited organic thin films of diindenoperylene (DIP) on SiO{sub 2} and indium tin oxide (ITO). At 200 K, DIP is crystalline on SiO{sub 2} and amorphous on ITO. Upon heating to room temperature, the roughness of DIP is reduced on both substrates, from 1.5 nm to 0.75 nm (SiO{sub 2}) and from 0.90 nm to 0.45 nm (ITO). The smoothing is accompanied by crystallization of the surface molecules, whereas the bulk structure of the films does not strongly reorganize.

Hinderhofer, A. [Institute for Applied Physics, University of Tuebingen, Auf der Morgenstelle 10, Tuebingen 72076 (Germany); Graduate School of Advanced Integration Science, Chiba University,1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Hosokai, T. [Department of Materials and Science, Iwate University, Ueda 4-3-5, Morioka, Iwate 0208551 (Japan); Yonezawa, K.; Kato, K.; Kera, S.; Ueno, N. [Graduate School of Advanced Integration Science, Chiba University,1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Gerlach, A.; Broch, K.; Frank, C.; Schreiber, F. [Institute for Applied Physics, University of Tuebingen, Auf der Morgenstelle 10, Tuebingen 72076 (Germany); Novak, J. [Institute for Applied Physics, University of Tuebingen, Auf der Morgenstelle 10, Tuebingen 72076 (Germany); European Synchrotron Radiation Facility (ESRF), BP 220, Grenoble 38043 (France)

2012-07-16T23:59:59.000Z

285

SAW determination of surface area of thin films  

DOE Patents (OSTI)

N.sub.2 adsorption isotherms are measured from thin films on SAW devices. The isotherms may be used to determine the surface area and pore size distribution of thin films.

Frye, Gregory C. (Albuquerque, NM); Martin, Stephen J. (Albuquerque, NM); Ricco, Antonio J. (Albuquerque, NM)

1990-01-01T23:59:59.000Z

286

Nanostructured Inorganic Thin Film Enabled Fiber Optic Sensors for ...  

Science Conference Proceedings (OSTI)

... Thin Film Enabled Fiber Optic Sensors for Gas Sensing in Energy and Environmental Systems ... Co-Doped TiO2 Nanoparticles and Thin Films for Enhanced Solar Energy Utilization ... Synthesis of Magnetic Core-TS-1 Zeolite Shell Catalyst.

287

Using in Situ Thin Film Stress Measurements to Understand ...  

Science Conference Proceedings (OSTI)

Symposium, Nanostructured Materials for Lithium Ion Batteries and for Supercapacitors. Presentation Title, Using in Situ Thin Film Stress Measurements to ...

288

Synthesis and Characterization of Plasma Polymerized Thin Films ...  

Science Conference Proceedings (OSTI)

Presentation Title, Synthesis and Characterization of Plasma Polymerized Thin Films Deposited from Benzene and Hexamethyldisiloxane Using (PECVD) ...

289

Fracture and Delamination in Thin Film Si Electrodes  

Science Conference Proceedings (OSTI)

Symposium, Nanostructured Materials for Lithium Ion Batteries and for Supercapacitors. Presentation Title, Fracture and Delamination in Thin Film Si Electrodes.

290

Magnetic properties of TM/RE bilayer thin films  

Science Conference Proceedings (OSTI)

... Magnetic properties of TM/RE bilayer thin films. I. Zoto University of Alabama. The magnetic recording technology badly ...

291

Energy transfer and 1.54 {mu}m emission in amorphous silicon nitride films  

Science Conference Proceedings (OSTI)

Er-doped amorphous silicon nitride films with various Si concentrations (Er:SiN{sub x}) were fabricated by reactive magnetron cosputtering followed by thermal annealing. The effects of Si concentrations and annealing temperatures were investigated in relation to Er emission and excitation processes. Efficient excitation of Er ions was demonstrated within a broad energy spectrum and attributed to disorder-induced localized transitions in amorphous Er:SiN{sub x}. A systematic optimization of the 1.54 {mu}m emission was performed and a fundamental trade-off was discovered between Er excitation and emission efficiency due to excess Si incorporation. These results provide an alternative approach for the engineering of sensitized Si-based light sources and lasers.

Yerci, S.; Li, R. [Department of Electrical and Computer Engineering, Boston University, 8 Saint Mary's Street, Boston, Massachusetts 02215-2421 (United States); Kucheyev, S. O.; Buuren, T. van [Lawrence Livermore National Laboratory, Livermore, California 94551 (United States); Basu, S. N. [Division of Materials Science and Engineering, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts 02446 (United States); Department of Mechanical Engineering, Boston University, 110 Cummington Street, Boston, Massachusetts 02215 (United States); Dal Negro, L. [Department of Electrical and Computer Engineering, Boston University, 8 Saint Mary's Street, Boston, Massachusetts 02215-2421 (United States); Division of Materials Science and Engineering, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts 02446 (United States)

2009-07-20T23:59:59.000Z

292

Growth mechanisms and characterization of hydrogenated amorphous- silicon-alloy films  

Science Conference Proceedings (OSTI)

This report describes an apparatus, constructed and tested, that allows measurement of the surface morphology of as-grown hydrogenated amorphous silicon films with atomic resolution using a scanning tunneling microscope. Surface topologies of 100-[degree][Lambda]-thick intrinsic films, deposited on atomically flat, crystalline Si and GaAs, are reported. These films surfaces are relatively flat on the atomic scale, indicating fairly homogeneous, compact initial film growth. The effect of probe-tip size on the observed topology and the development of atomically sharp probes is discussed. 17 refs, 9 figs.

Gallagher, A.; Ostrom, R.: Stutzin, G.; Tanenbaum, D. (National Inst. of Standards and Technology, Gaithersburg, MD (United States))

1993-02-01T23:59:59.000Z

293

Hydrogen Flip Model for Light-Induced Changes of Amorphous Silicon  

DOE Green Energy (OSTI)

We propose a new metastable defect associated with hydrogen atoms in amorphous silicon. A higher energy metastable state is formed when H is flipped to the backside of the Si-H bond at monohydride sites. The defect is described by a double-well potential energy. The dipole moment of this {open_quotes}H-flip{close_quotes} defect is larger and increases the infrared absorption. This defect accounts for large structural changes observed on light soaking including larger infrared absorption and volume dilation. {copyright} {ital 1999} {ital The American Physical Society}

Biswas, R.; Li, Y. [Department of Physics and Astronomy, Microelectronics Research Center and Ames Laboratory--USDOE, Iowa State University, Ames, Iowa 50011 (United States)] [Department of Physics and Astronomy, Microelectronics Research Center and Ames Laboratory--USDOE, Iowa State University, Ames, Iowa 50011 (United States); Li, Y. [Department of Physics, University of Science and Technology of China, Hefei 230026, People`s Republic of (China)] [Department of Physics, University of Science and Technology of China, Hefei 230026, People`s Republic of (China)

1999-03-01T23:59:59.000Z

294

Available Technologies: Thinner Film Silicon Solar Cells  

Berkeley Lab scientists have designed a new approach to create highly efficient thin film silicon solar cells. This technology promises to lower solar cell material ...

295

Oriented niobate ferroelectric thin films for electrical and optical devices and method of making such films  

DOE Patents (OSTI)

Sr{sub x}Ba{sub 1{minus}x}Nb{sub 2}O{sub 6}, where x is greater than 0.25 and less than 0.75, and KNbO{sub 3} ferroelectric thin films metalorganic chemical vapor deposited on amorphous or crystalline substrate surfaces to provide a crystal axis of the film exhibiting a high dielectric susceptibility, electro-optic coefficient, and/or nonlinear optic coefficient oriented preferentially in a direction relative to a crystalline or amorphous substrate surface are disclosed. Such films can be used in electronic, electro-optic, and frequency doubling components. 8 figs.

Wessels, B.W.; Nystrom, M.J.

1998-05-19T23:59:59.000Z

296

Growth study of ion assisted evaporated molybdenum thin films  

Science Conference Proceedings (OSTI)

We reported optimization of ion-to-atom ratios and ion energy for growth of molybdenum thin film on oxidized silicon substrate using ion assisted electron beam evaporation system. The ion-to-atom ratio is varied by independently adjusting the ion current density and deposition rate. The structural characterization of the films is carried out by hard X-ray reflectivity. We observed improvement in film density from 85.5% to 98.2% and film roughness from {approx}2 nm to 0.84nm on {approx}26 nm thick Mo film by optimizing ion parameters. The observed results are discussed considering the effect of kinetic of adatoms during growth of film.

Yadav, P. K.; Nayak, M.; Lodha, G. S.; Rai, S. [X-ray Optics Section, Indus Synchrotrons Utilization Division, Raja Ramanna Centre For Advanced Technology, Indore-452013 (India)

2012-06-25T23:59:59.000Z

297

Techniques for measuring the composition of hydrogenated amorphous silicon-germanium alloys  

DOE Green Energy (OSTI)

The authors grow hydrogenated amorphous silicon-germanium alloys by the hot-wire chemical vapor deposition technique at deposition rates between 0.5 and 1.4 nanometers per second. They prepared a set of these alloys to determine the concentrations of the alloying elements as measured by various techniques. This set consists of samples throughout the range of germanium alloying from 0% (a-Si:H) to 100% (a-Ge:H). They find that by making the appropriate calibrations and corrections, their compositional measurements agreement between the various techniques. Nuclear reaction analysis, Fourier transform infrared spectroscopy, and secondary ion mass spectrometry (SIMS) all yield similar hydrogen contents, within {+-}20% for each sample. Electron probe micro-analysis (EPMA) and SIMS yield silicon and germanium contents within {+-}7% of each other with results being confirmed by Rutherford backscattering. EPMA oxygen measurements are affected by highly oxidized surface layers, thus these data show larger O concentrations than those measured by SIMS.

Nelson, B.P.; Xu, Y.; Webb, J.D.; Mason, A.; Reedy, R.C.; Gedvilas, L.M.; Lanford, W.A.

1999-10-25T23:59:59.000Z

298

Method for sputtering a PIN microcrystalline/amorphous silicon semiconductor device with the P and N-layers sputtered from boron and phosphorous heavily doped targets  

DOE Patents (OSTI)

A silicon PIN microcrystalline/amorphous silicon semiconductor device is constructed by the sputtering of N, and P layers of silicon from silicon doped targets and the I layer from an undoped target, and at least one semi-transparent ohmic electrode.

Moustakas, Theodore D. (Annandale, NJ); Maruska, H. Paul (Annandale, NJ)

1985-04-02T23:59:59.000Z

299

Performance and Modeling of Amorphous Silicon Photovoltaics for Building-Integrated Applications (Preprint prepared for Solar 99)  

Science Conference Proceedings (OSTI)

Amorphous silicon photovoltaic (PV) modules offer several advantages for building-integrated applications. The material can be deposited on glass or flexible substrates, which allows for products like roofing shingles and integrated PV/building glass. The material also has a uniform surface, which is ideal for many architectural applications. Amorphous silicon modules perform well in warm weather and have a small temperature coefficient for power. Depending on the building load, this may be beneficial when compared to crystalline systems. At the National Renewable Energy Laboratory, we are monitoring the performance of a triple-junction a-Si system. The system consists of 72 roofing shingles mounted directly to simulated roofing structures. This paper examines the performance of the building-integrated amorphous silicon PV system and applicability for covering residential loads. A simple model of system performance is also developed and is presented.

Kroposki, B.; Hansen, R.

1998-06-07T23:59:59.000Z

300

Nanocrystalline Silicon Quantum Dot Light Emitting Diodes Using Metal Oxide Charge Transport Layers.  

E-Print Network (OSTI)

??Silicon-based lighting show promise for display and solid state lighting use. Here we demonstrate a novel thin film light emitting diode device using nanocrystalline silicon… (more)

Zhu, Jiayuan

2013-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


301

Anisotropic dewetting in ultra-thin single-crystal silicon-on-insulator films  

E-Print Network (OSTI)

The single crystal silicon-on-insulator thin film materials system represents both an ideal model system for the study of anisotropic thin film dewetting as well as a technologically important system for the development ...

Danielson, David T. (David Thomas)

2008-01-01T23:59:59.000Z

302

Amorphous silicon research: Phase II. Annual technical progress report, August 1, 1995--July 31, 1996  

DOE Green Energy (OSTI)

This report describes the research performed during Phase II of a three-phase, three-year program under NREL Subcontract No. ZAN-4-13318-02. The research program is intended to expand, enhance and accelerate knowledge and capabilities for the development of high-performance, two-terminal multijunction hydrogenated amorphous silicon (a-Si:H) alloy modules. It is now well recognized that a multifunction, multibandgap approach has the potential of achieving the highest stable efficiency in a-Si:H alloy solar cells. In this approach, the bandgap of the materials of the component cell is varied in order to capture a wide spectrum of the solar photons. Significant progress has been made in the development of materials and cell design in the last few years, and a stable module efficiency of 10.2% has been demonstrated over one-square-foot area using a triple-junction approach in which the bottom two component cells use hydrogenated amorphous silicon-germanium (a-SiGe:H) alloy. In order to meet the Department of Energy goal of achievement of 12% stable module efficiency, it is necessary to make further improvements in each of the component cells. This has been the thrust of the current program.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1996-10-01T23:59:59.000Z

303

Amorphous silicon pixel layers with cesium iodide converters for medical radiography  

SciTech Connect

We describe the properties of evaporated layers of Cesium Iodide (Thallium activated) deposited on substrates that enable easy coupling to amorphous silicon pixel arrays. The CsI(Tl) layers range in thickness from 65 to 220{mu}m. We used the two-boat evaporator system to deposit CsI(Tl) layers. This system ensures the formation of the scintillator film with homogenous thallium concentration which is essential for optimizing the scintillation light emission efficiency. The Tl concentration was kept to 0.1--0.2 mole percent for the highest light output. Temperature annealing can affect the microstructure as well as light output of the CsI(Tl) film. 200--300C temperature annealing can increase the light output by a factor of two. The amorphous silicon pixel arrays are p-i-n diodes approximately l{mu}m thick with transparent electrodes to enable them to detect the scintillation light produced by X-rays incident on the CsI(Tl). Digital radiography requires a good spatial resolution. This is accomplished by making the detector pixel size less then 50{mu}m. The light emission from the CsI(Tl) is collimated by techniques involving the deposition process on pattered substrates. We have measured MTF of greater than 12 line pairs per mm at the 10% level.

Jing, T.; Cho, G. [Lawrence Berkeley Lab., CA (United States); Goodman, C.A. [Air Techniques, Inc., Hicksville, NY (United States)] [and others

1993-11-01T23:59:59.000Z

304

Amorphous silicon pixel layers with cesium iodide converters for medical radiography  

Science Conference Proceedings (OSTI)

The authors describe the properties of evaporated layers of Cesium Iodide (Thallium activated) deposited on substrates that enable easy coupling to amorphous silicon pixel arrays. The CsI (T1) layers range in thickness from 65 to 220[mu]m. The authors used the two-boat evaporator system to deposit CsI(T1) layers. This system ensures the formation of the scintillator film with homogeneous thallium concentration which is essential for optimizing the scintillation light emission efficiency. The Tl concentration was kept to 0.1--0.2 mole percent for the highest light output. Temperature annealing can affect the microstructure as well as light output of the CsI(T1) film. 200--300 C temperature annealing can increase the light output by a factor of two. The amorphous silicon pixel arrays are p-i-n diodes approximately 1[mu]m thick with transparent electrodes to enable them to detect the scintillation light produced by X-rays incident on the CsI(T1). Digital radiography requires a good spatial resolution. This is accomplished by making the detector pixel size less than 50 [mu]m. The light emission from the CsI(T1) is collimated by techniques involving the deposition process on patterned substrates. The authors have measured MTF of greater than 12 line pairs per mm at the 10% level.

Jing, T.; Drewery, J. (Lawrence Berkeley Lab., CA (United States)); Goodman, C.A. (Air Techniques, Inc., Hicksville, NY (United States))

1994-08-01T23:59:59.000Z

305

Comparative Study of Low-temperature PECVD of Amorphous Silicon using Mono-, Di-, Trisilane and Cyclohexasilane  

SciTech Connect

The hydrogenated amorphous silicon a-Si:H films were grown by plasma-enhanced chemical vapor deposition (PECVD) using liquid cyclohexasilane Si{sub 6}H{sub 12} (CHS). The growth rate of a-Si:H was studied as a function of substrate temperatures in the range of 30 C < T < 450 C using deposition conditions that were optimized for monosilane SiH{sub 4}. The same parameters were used for a-Si:H films grown using disilane (Si{sub 2}H{sub 6}) and trisilane (Si{sub 3}H{sub 8}) precursors. It was found that the a-Si:H film growth rate for CHS is lower with respect to those for mono-, di- and trisilane in an Ar plasma. Addition of {approx}10% of H{sub 2} dramatically increases the deposition rate for CHS-based films to {_}nm/min - a 700% increase. The as-deposited films were characterized by FTIR and Raman spectroscopy to probe the hydrogen content and local bonding environment. It was found that the films grown using Ar/H{sub 2} mixtures as carrier gas have a reduced hydrogen content relative to polysilane fragments indicating higher quality amorphous silicon.

Konstantin Pokhodnya; Joseph Sandstrom; Xuliang Dai; Philip Boudjouk; Douglas L. Schulz

2009-06-08T23:59:59.000Z

306

Polycrystalline thin films FY 1992 project report  

DOE Green Energy (OSTI)

This report summarizes the activities and results of the Polycrystalline Thin Film Project during FY 1992. The purpose of the DOE/NREL PV (photovoltaic) Program is to facilitate the development of PV that can be used on a large enough scale to produce a significant amount of energy in the US and worldwide. The PV technologies under the Polycrystalline Thin Film project are among the most exciting next-generation'' options for achieving this goal. Over the last 15 years, cell-level progress has been steady, with laboratory cell efficiencies reaching levels of 15 to 16%. This progress, combined with potentially inexpensive manufacturing methods, has attracted significant commercial interest from US and international companies. The NREL/DOE program is designed to support the efforts of US companies through cost-shared subcontracts (called government/industry partnerships'') that we manage and fund and through collaborative technology development work among industry, universities, and our laboratory.

Zweibel, K. (ed.)

1993-01-01T23:59:59.000Z

307

Polycrystalline thin films FY 1992 project report  

DOE Green Energy (OSTI)

This report summarizes the activities and results of the Polycrystalline Thin Film Project during FY 1992. The purpose of the DOE/NREL PV (photovoltaic) Program is to facilitate the development of PV that can be used on a large enough scale to produce a significant amount of energy in the US and worldwide. The PV technologies under the Polycrystalline Thin Film project are among the most exciting ``next-generation`` options for achieving this goal. Over the last 15 years, cell-level progress has been steady, with laboratory cell efficiencies reaching levels of 15 to 16%. This progress, combined with potentially inexpensive manufacturing methods, has attracted significant commercial interest from US and international companies. The NREL/DOE program is designed to support the efforts of US companies through cost-shared subcontracts (called ``government/industry partnerships``) that we manage and fund and through collaborative technology development work among industry, universities, and our laboratory.

Zweibel, K. [ed.

1993-01-01T23:59:59.000Z

308

Electrostatic thin film chemical and biological sensor  

DOE Patents (OSTI)

A chemical and biological agent sensor includes an electrostatic thin film supported by a substrate. The film includes an electrostatic charged surface to attract predetermined biological and chemical agents of interest. A charge collector associated with said electrostatic thin film collects charge associated with surface defects in the electrostatic film induced by the predetermined biological and chemical agents of interest. A preferred sensing system includes a charge based deep level transient spectroscopy system to read out charges from the film and match responses to data sets regarding the agents of interest. A method for sensing biological and chemical agents includes providing a thin sensing film having a predetermined electrostatic charge. The film is exposed to an environment suspected of containing the biological and chemical agents. Quantum surface effects on the film are measured. Biological and/or chemical agents can be detected, identified and quantified based on the measured quantum surface effects.

Prelas, Mark A. (Columbia, MO); Ghosh, Tushar K. (Columbia, MO); Tompson, Jr., Robert V. (Columbia, MO); Viswanath, Dabir (Columbia, MO); Loyalka, Sudarshan K. (Columbia, MO)

2010-01-19T23:59:59.000Z

309

Thin film photovoltaic panel and method  

DOE Patents (OSTI)

A thin film photovoltaic panel includes a backcap for protecting the active components of the photovoltaic cells from adverse environmental elements. A spacing between the backcap and a top electrode layer is preferably filled with a desiccant to further reduce water vapor contamination of the environment surrounding the photovoltaic cells. The contamination of the spacing between the backcap and the cells may be further reduced by passing a selected gas through the spacing subsequent to sealing the backcap to the base of the photovoltaic panels, and once purged this spacing may be filled with an inert gas. The techniques of the present invention are preferably applied to thin film photovoltaic panels each formed from a plurality of photovoltaic cells arranged on a vitreous substrate. The stability of photovoltaic conversion efficiency remains relatively high during the life of the photovoltaic panel, and the cost of manufacturing highly efficient panels with such improved stability is significantly reduced.

Ackerman, Bruce (El Paso, TX); Albright, Scot P. (El Paso, TX); Jordan, John F. (El Paso, TX)

1991-06-11T23:59:59.000Z

310

Packaging material for thin film lithium batteries  

SciTech Connect

A thin film battery including components which are capable of reacting upon exposure to air and water vapor incorporates a packaging system which provides a barrier against the penetration of air and water vapor. The packaging system includes a protective sheath overlying and coating the battery components and can be comprised of an overlayer including metal, ceramic, a ceramic-metal combination, a parylene-metal combination, a parylene-ceramic combination or a parylene-metal-ceramic combination.

Bates, John B. (116 Baltimore Dr., Oak Ridge, TN 37830); Dudney, Nancy J. (11634 S. Monticello Rd., Knoxville, TN 37922); Weatherspoon, Kim A. (223 Wadsworth Pl., Oak Ridge, TN 37830)

1996-01-01T23:59:59.000Z

311

Annealed CVD molybdenum thin film surface  

DOE Patents (OSTI)

Molybdenum thin films deposited by pyrolytic decomposition of Mo(CO).sub.6 attain, after anneal in a reducing atmosphere at temperatures greater than 700.degree. C., infrared reflectance values greater than reflectance of supersmooth bulk molybdenum. Black molybdenum films deposited under oxidizing conditions and annealed, when covered with an anti-reflecting coating, approach the ideal solar collector characteristic of visible light absorber and infrared energy reflector.

Carver, Gary E. (Tucson, AZ); Seraphin, Bernhard O. (Tucson, AZ)

1984-01-01T23:59:59.000Z

312

Superconducting thin films on potassium tantalate substrates  

DOE Patents (OSTI)

A superconductive system for the lossless transmission of electrical current comprising a thin film of superconducting material Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x epitaxially deposited upon a KTaO.sub.3 substrate. The KTaO.sub.3 is an improved substrate over those of the prior art since the it exhibits small lattice constant mismatch and does not chemically react with the superconducting film.

Feenstra, Roeland (Oak Ridge, TN); Boatner, Lynn A. (Oak Ridge, TN)

1992-01-01T23:59:59.000Z

313

Thin Film Solid Oxide Fuel Cells  

Science Conference Proceedings (OSTI)

A novel solid oxide fuel cell (SOFC) design that can be fabricated entirely using low-temperature, thin-film processing is described. Potential advantages of the cell are reduced materials costs and improved fuel-cell characteristics. The critical design feature is the use of thin (approximately equal to 50 nanometers), catalytically-active oxide layers on a < 10 micrometer thick yttria-stabilized zirconia (YSZ) supported electrolyte to minimize reaction overpotentials and ohmic losses. Doped ceria at th...

1995-03-29T23:59:59.000Z

314

Polycrystalline thin film materials and devices  

DOE Green Energy (OSTI)

Results of Phase II of a research program on polycrystalline thin film heterojunction solar cells are presented. Relations between processing, materials properties and device performance were studied. The analysis of these solar cells explains how minority carrier recombination at the interface and at grain boundaries can be reduced by doping of windows and absorber layers, such as in high efficiency CdTe and CuInSe{sub 2} based solar cells. The additional geometric dimension introduced by the polycrystallinity must be taken into consideration. The solar cells are limited by the diode current, caused by recombination in the space charge region. J-V characteristics of CuInSe{sub 2}/(CdZn)S cells were analyzed. Current-voltage and spectral response measurements were also made on high efficiency CdTe/CdS thin film solar cells prepared by vacuum evaporation. Cu-In bilayers were reacted with Se and H{sub 2}Se gas to form CuInSe{sub 2} films; the reaction pathways and the precursor were studied. Several approaches to fabrication of these thin film solar cells in a superstrate configuration were explored. A self-consistent picture of the effects of processing on the evolution of CdTe cells was developed.

Baron, B.N.; Birkmire, R.W.; Phillips, J.E.; Shafarman, W.N.; Hegedus, S.S.; McCandless, B.E. (Delaware Univ., Newark, DE (United States). Inst. of Energy Conversion)

1992-10-01T23:59:59.000Z

315

Method of enhancing the electronic properties of an undoped and/or N-type hydrogenated amorphous silicon film  

DOE Patents (OSTI)

The dark conductivity and photoconductivity of an N-type and/or undoped hydrogenated amorphous silicon layer fabricated by an AC or DC proximity glow discharge in silane can be increased through the incorporation of argon in an amount from 10 to about 90 percent by volume of the glow discharge atmosphere which contains a silicon-hydrogen containing compound in an amount of from about 90 to about 10 volume percent.

Carlson, David E. (Yardley, PA)

1980-01-01T23:59:59.000Z

316

[beta]-silicon carbide protective coating and method for fabricating same  

DOE Patents (OSTI)

A polycrystalline beta-silicon carbide film or coating and method for forming same on components, such as the top of solar cells, to act as an extremely hard protective surface, and as an anti-reflective coating are disclosed. This is achieved by DC magnetron co-sputtering of amorphous silicon and carbon to form a SiC thin film onto a surface, such as a solar cell. The thin film is then irradiated by a pulsed energy source, such as an excimer laser, to synthesize the poly- or [mu]c-SiC film on the surface and produce [beta]-SiC. While the method of this invention has primary application in solar cell manufacturing, it has application wherever there is a requirement for an extremely hard surface. 3 figs.

Carey, P.G.; Thompson, J.B.

1994-11-01T23:59:59.000Z

317

.beta.-silicon carbide protective coating and method for fabricating same  

SciTech Connect

A polycrystalline beta-silicon carbide film or coating and method for forming same on components, such as the top of solar cells, to act as an extremely hard protective surface, and as an anti-reflective coating. This is achieved by DC magnetron co-sputtering of amorphous silicon and carbon to form a SiC thin film onto a surface, such as a solar cell. The thin film is then irradiated by a pulsed energy source, such as an excimer laser, to synthesize the poly- or .mu.c-SiC film on the surface and produce .beta.--SiC. While the method of this invention has primary application in solar cell manufacturing, it has application wherever there is a requirement for an extremely hard surface.

Carey, Paul G. (Mountain View, CA); Thompson, Jesse B. (Brentwood, CA)

1994-01-01T23:59:59.000Z

318

Fabrication Of Multilayered Thin Films Via Spin-Assembly  

NLE Websites -- All DOE Office Websites (Extended Search)

Fabrication Of Multilayered Thin Films Via Spin-Assembly Fabrication Of Multilayered Thin Films Via Spin-Assembly Fabrication Of Multilayered Thin Films Via Spin-Assembly A process of forming multilayer thin film heterostructures. Available for thumbnail of Feynman Center (505) 665-9090 Email Fabrication Of Multilayered Thin Films Via Spin-Assembly A process of forming multilayer thin film heterostructures is disclosed and includes applying a solution including a first water-soluble polymer from the group of polyanionic species, polycationic species and uncharged polymer species onto a substrate to form a first coating layer on the substrate, drying the first coating layer on the substrate, applying a solution including a second water-soluble polymer from the group of polyanionic species, polycationic species and uncharged polymer species

319

Single-Crystalline Thin Film Used in Photovoltaics  

Energy.gov (U.S. Department of Energy (DOE))

Single-crystalline thin films are made from gallium arsenide (GaAs), a compound semiconductor that is a mixture of gallium and arsenic.

320

Evaluation of Thin-film Interfacial Properties Using Indentation Test  

Science Conference Proceedings (OSTI)

A thin film's reliable question is depend on interfacial characterization, so evaluating interfacial characterization is the most important things in this test. So far ...

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


321

Ferroelectric Thin Film Capacitors to Enable a Miniaturized Smart L ...  

Science Conference Proceedings (OSTI)

The effects ultra-violet (UV)-assisted processing and compositional grading of BST capacitor thin films will be presented and the material property trade-offs for  ...

322

Electron Beam Evaporator Systems for Thin Film Deposition  

Science Conference Proceedings (OSTI)

The Thin Film and Nanostructure Processing Group has two high-vacuum, electron beam evaporator systems for fabrication of single and multilayer ...

2012-10-23T23:59:59.000Z

323

Layer-by-Layer Assembled Thin Films for Battery Electrolytes  

Science Conference Proceedings (OSTI)

Presentation Title, Layer-by-Layer Assembled Thin Films for Battery Electrolytes ... Abstract Scope, Exponential layer-by-layer (eLBL) assembled battery ...

324

Tungsten-doped thin film materials - Energy Innovation Portal  

A dielectric thin film material for high frequency use, including use as a capacitor, and having a low dielectric loss factor is provided, the film comprising a ...

325

Thin-Film Ferroelectric Materials for Decoupling and Tunable ...  

Science Conference Proceedings (OSTI)

Symposium, ACerS Richard M. Fulrath Award Symposium. Presentation Title, Thin-Film Ferroelectric Materials for Decoupling and Tunable Capacitors. Author( s) ...

326

Development of Polyimide/SMA Thin-Film Actuator  

Science Conference Proceedings (OSTI)

Symposium, Symposium I: Biomaterials, Smart Materials and Structures. Presentation Title, Development of Polyimide/SMA Thin-Film Actuator. Author(s), Akira ...

327

Integrated Technology of Decoupling BST Thin Film Capacitors  

Science Conference Proceedings (OSTI)

Jun 16, 2007 ... The integration technology of decoupling capacitors, which contain multi-layered Cu wiring and Barium Strontium Titanate (BST) thin film ...

328

How Thin Film Processing Can Contribute to Understanding the ...  

Science Conference Proceedings (OSTI)

Presentation Title, How Thin Film Processing Can Contribute to Understanding the Materials Science of the MAX Phases. Author(s), Per Eklund, Ulf Jansson, ...

329

Fabrication of Solid Oxide Fuel Cells via Thin Film Techniques  

Science Conference Proceedings (OSTI)

We decided to use thin film techniques to solve this problem. Among various methods of lowering the operation temperature for SOFCs, adopting bi-layer ...

330

Lessons Learned in Sputtering TiNi Thin Film  

Science Conference Proceedings (OSTI)

Experimental results have been published in journals and conference proceedings, but as yet TiNi thin film is not commercially available. The author and ...

331

Chemistry Chemical Analysis Thin-Films Information at NIST  

Science Conference Proceedings (OSTI)

... Method Can Affect the Use of Block Copolymer Thin Films (10/18 ... NIST Scientists Address 'Wrinkles' in Transparent Film Development (10/02/2012). ...

2010-09-24T23:59:59.000Z

332

NIST Testing Method Quickly Tells Whether Thin Films Are ...  

Science Conference Proceedings (OSTI)

... and emerging technology areas that rely on thin-film advances for ... For films less than 1 micrometer thick, mechanical-property measurements made ...

2013-01-03T23:59:59.000Z

333

Interface Adhesion and Coating Integrity of the Thin Film Au ...  

Science Conference Proceedings (OSTI)

Current scientific emphasis is on process development and optimization of thin film Au-interconnect metallization for the Bi2Te3-based TE module used for the ...

334

Development of Thin-Film Materials Technology for Energy Applications...  

NLE Websites -- All DOE Office Websites (Extended Search)

Development of Thin-Film Materials Technology for Energy Applications: High Temperature Superconductors, etc. Speaker(s): Ronald Reade Date: January 15, 2002 - 12:00pm Location:...

335

Bi-based Piezoelectric Thin Films via Chemical Solution Deposition  

Science Conference Proceedings (OSTI)

BNT-BKT-BMgT thin films showed very promising piezoelectric response with ... Chemical Quantification of Oxide Interfaces Using Energy-dispersive X-ray ...

336

Thermoelectric effect in very thin film Pt/Au thermocouples  

E-Print Network (OSTI)

thin films, the electrical resistivity ratio ? F /? B is BStudies of the electrical resistivity of metallic films [23,calculate the electrical resistivity and the thermoelectric

Salvadori, M.C.; Vaz, A.R.; Teixeira, F.S.; Cattani, M.; Brown, I.G.

2006-01-01T23:59:59.000Z

337

Thin film techniques for solid oxide fuel cells  

Thin film techniques for solid oxide fuel cells V.E.J. van Dieten and J. Schoonman Laboratory ... ticles stay in the hot temperature region can be ...

338

Heteroepitaxial Si Thin Films Deposited on Flexible Copper ...  

Science Conference Proceedings (OSTI)

Presentation Title, Heteroepitaxial Si Thin Films Deposited on Flexible Copper Substrates for Solar Photovoltaics. Author(s), Daniela Florentina Bogorin, Lee ...

339

Amorphous silicon research. Phase III technical progress report, August 1, 1996--July 31, 1997  

DOE Green Energy (OSTI)

The principal objective of this R&D program is to expand, enhance and accelerate knowledge and capabilities for the development of high-performance, two-terminal multijunction hydrogenated amorphous silicon (a-Si) alloy cells and modules. The near-term goal of the program is to achieve 12% stable active-area efficiency using the multijunction approach. The long-term goal is to achieve 15% stable efficiency multijunction modules. The major effort of this program is to develop high efficiency component cells and incorporate them in the triple-junction structure to obtain the highest stable efficiency. New and improved deposition regimes were investigated to obtain better cell performance. Fundamental studies to obtain better understanding of material and cell performance were undertaken.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1997-11-01T23:59:59.000Z

340

High deposition rate preparation of amorphous silicon solar cells by rf glow discharge decomposition of disilane  

SciTech Connect

The optical and electrical properties of hydrogenated amorphous silicon films produced by rf glow discharge decomposition of disilane diluted in helium (Si/sub 2/H/sub 6//He = 1/9) have been studied while systematically varying the film deposition rate. The properties and composition of the films were monitored by measuring the optical band gap, IR vibrational spectrum, dark conductivity, and the photoconductivity as a function of the deposition rate. The photoluminescence of the high deposition rate films gave a peak at 1.33 eV. These films, whose properties are rather similar to those of the conventional a-Si:H films prepared from monosilane, have been used to fabricate nip-type a-Si:H solar cells. At a deposition rate of 11 A/sec, a conversion efficiency of 6.86% was obtained. This high efficiency shows that disilane is applicable for mass production fabrication of a-Si:H solar cells.

Kenne, J.; Ohashi, Y.; Matsushita, T.; Konagai, M.; Takahashi, K.

1984-01-15T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


341

Plasma-assisted CVD of fluorinated, hydrogenated amorphous silicon. Final report  

DOE Green Energy (OSTI)

During the past year, three novel large-area (100 cm/sup 2/) a-Si:H solar cells were developed with the following configurations: inverted NIP/SS cells with an improved red response; inverted a-Si:H/a-B:H heterojunction cells with high V/sub oc/; and NIP/metal cells with a CVD P-layer grown pyrolytically from silane and diborane. Initial experiments were performed using disilane as the deposition gas for the intrinsic layer in both NIP/SS and PIN/SS structures. Coatings of In/sub 2/O/sub 3/, using a technique developed by Dr. Ovadyahu, were applied to NIP/SS cells in order to evaluate its potential as a conductive coating in practical amorphous silicon solar cells.

Coleman, J.H.; Hammes, J.P.; Wiesmann, H.J.

1981-01-01T23:59:59.000Z

342

Amorphous silicon research Phase I. Annual subcontract report, August 1, 1994--July 31, 1995  

DOE Green Energy (OSTI)

The Principal objective of this R&D program is to expand, enhance and accelerate knowledge and capabilities for the development of high-performance, two-terminal multifunction hydrogenated amorphous silicon (a-Si:H) alloy modules. The near-term goal of the program is to achieve 12% stable efficiency by 1998 using the multifunction approach. The major effort of this program is to develop high efficiency component cells and incorporate them in the triple-junction structure to obtain the highest stable efficiency. The bulk of the effort was directed toward the middle and bottom cell structure. New and improved deposition regimes were investigated to obtain better cell performance. Fundamental studies to obtain better understanding of material and cell performance were undertaken.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1995-10-01T23:59:59.000Z

343

Research on stable, high-efficiency, large-area, amorphous-silicon-based submodules  

SciTech Connect

The primary objective of this subcontract is to develop the technology for same bandgap, amorphous silicon tandem junction photovoltaic modules having an area of at least 900 cm{sup 2} with the goal of achieving an aperture area efficiency of 9%. A further objective is to demonstrate modules that retain 95% of their under standard light soaking conditions. Our approach to the attainment of these objective is based on the following distinctive technologies: (a) in-house deposition of SiO{sub 2}/SnO{sub 2}:F onto soda lime glass by APCVD to provide a textured, transparent electrode, (b) single chamber r.f. flow discharge deposition of the a-Si:H layers onto vertical substrates contained with high package density in a box carrier'' to which the discharge is confined (c) sputter deposition of highly reflecting, ZnO-based back contacts, and (d) laser scribing of the a-Si:H and electrodes with real-time scribe tracking to minimize area loss. Continued development of single junction amorphous silicon was aggressively pursued as proving ground for various optical enhancement schemes, new p-layers, and i-layers quality. We have rigorously demonstrated that the introduction of a transitional i-layer does not impair stability and that the initial gain in performance is retained. We have demonstrated a small improvement in cell stability through a post-fabrication treatment consisting of multiple, intense light flashes followed by sufficient annealing. Finally, several experiments have indicated that long term stability can be improved by overcoating the SnO{sub 2} with ZnO. 25 refs., 17 figs.

Delahoy, A.E.; Tonon, T.; Macneil, J. (Chronar Corp., Princeton, NJ (USA))

1991-06-01T23:59:59.000Z

344

Research on stable, high-efficiency, large-area, amorphous-silicon-based submodules  

DOE Green Energy (OSTI)

The primary objective of this subcontract is to develop the technology for same bandgap, amorphous silicon tandem junction photovoltaic modules having an area of at least 900 cm{sup 2} with the goal of achieving an aperture area efficiency of 9%. A further objective is to demonstrate modules that retain 95% of their under standard light soaking conditions. Our approach to the attainment of these objective is based on the following distinctive technologies: (a) in-house deposition of SiO{sub 2}/SnO{sub 2}:F onto soda lime glass by APCVD to provide a textured, transparent electrode, (b) single chamber r.f. flow discharge deposition of the a-Si:H layers onto vertical substrates contained with high package density in a box carrier'' to which the discharge is confined (c) sputter deposition of highly reflecting, ZnO-based back contacts, and (d) laser scribing of the a-Si:H and electrodes with real-time scribe tracking to minimize area loss. Continued development of single junction amorphous silicon was aggressively pursued as proving ground for various optical enhancement schemes, new p-layers, and i-layers quality. We have rigorously demonstrated that the introduction of a transitional i-layer does not impair stability and that the initial gain in performance is retained. We have demonstrated a small improvement in cell stability through a post-fabrication treatment consisting of multiple, intense light flashes followed by sufficient annealing. Finally, several experiments have indicated that long term stability can be improved by overcoating the SnO{sub 2} with ZnO. 25 refs., 17 figs.

Delahoy, A.E.; Tonon, T.; Macneil, J. (Chronar Corp., Princeton, NJ (USA))

1991-06-01T23:59:59.000Z

345

Articles including thin film monolayers and multilayers  

DOE Patents (OSTI)

This invention pertains to thin film assemblies or devices useful as sensors, nonlinear optical materials, and trace material scavengers. It claims a base substrate having an oxide surface layer, and a multidentate ligand, capable of binding a metal ion, attached to the oxide surface layer of the base substrate. A metal species may be provided attached to the ligand, and a multifunctional organic ligand may be provided attached to the metal species. A second metal species may be provided attached to the multifunctional ligand.

Li, DeQuan; Swanson, B.I.

1992-12-31T23:59:59.000Z

346

Thinner Film Silicon Solar Cells - Energy Innovation Portal  

Technology Marketing Summary Berkeley Lab scientists have designed a new approach to create thin film silicon solar cells with a potential increase in ...

347

Growth of hydrogenated amorphous silicon (a-Si:H) on patterned substrates for increased mechanical stability  

DOE Green Energy (OSTI)

Residual stress in hydrogenated amorphous silicon (a-Si:H) film, which causes substrate bending and delamination, is studied. The internal stress can be reduced by controlling deposition parameters, but it is known to produce a trade-off between stress and electronic quality. Selective area deposition, in which the deposition area is reduced by making islands, reduced the stress when the lateral dimension of the islands becomes comparable to the film thickness. The overall stress is reduced by approximately 40% when the lateral dimension is decreased to 40 {mu}m, but the adhesion was not improved much. However, substrates having a 2-dimensional array of inversed pyramids of 200 {mu}m in lateral dimension produced overall stress 3 {approximately} 4 times lower than that on the normal substrates. Such substrates were prepared by anisotropic etching of silicon wafers. The inversed pyramid structure also has other advantages including minimized delamination and increased effective thickness. Computer simulation confirmed that the overall stress can be reduced by deposition on the pyramidal structure.

Hong, W.S.; Nieto, J.C.D.; Ruiz, O.; Perez-Mendez, V.

1994-12-01T23:59:59.000Z

348

Processing approach towards the formation of thin-film Cu(In,Ga)Se2  

DOE Patents (OSTI)

A two-stage method of producing thin-films of group IB-IIIA-VIA on a substrate for semiconductor device applications includes a first stage of depositing an amorphous group IB-IIIA-VIA precursor onto an unheated substrate, wherein the precursor contains all of the group IB and group IIIA constituents of the semiconductor thin-film to be produced in the stoichiometric amounts desired for the final product, and a second stage which involves subjecting the precursor to a short thermal treatment at 420.degree. C.-550.degree. C. in a vacuum or under an inert atmosphere to produce a single-phase, group IB-III-VIA film. Preferably the precursor also comprises the group VIA element in the stoichiometric amount desired for the final semiconductor thin-film. The group IB-IIIA-VIA semiconductor films may be, for example, Cu(In,Ga)(Se,S).sub.2 mixed-metal chalcogenides. The resultant supported group IB-IIIA-VIA semiconductor film is suitable for use in photovoltaic applications.

Beck, Markus E. (Falkensee, DE); Noufi, Rommel (Golden, CO)

2003-01-01T23:59:59.000Z

349

Apparatus for laser assisted thin film deposition  

DOE Patents (OSTI)

A pulsed laser deposition apparatus uses fiber optics to deliver visible output beams. One or more optical fibers are coupled to one or more laser sources, and delivers visible output beams to a single chamber, to multiple targets in the chamber or to multiple chambers. The laser can run uninterrupted if one of the deposition chambers ceases to operate because other chambers can continue their laser deposition processes. The laser source can be positioned at a remote location relative to the deposition chamber. The use of fiber optics permits multi-plexing. A pulsed visible laser beam is directed at a generally non-perpendicular angle upon the target in the chamber, generating a plume of ions and energetic neutral species. A portion of the plume is deposited on a substrate as a thin film. A pulsed visible output beam with a high pulse repetition frequency is used. The high pulse repetition frequency is greater than 500 Hz, and more preferably, greater than about 1000 Hz. Diamond-like-carbon (DLC) is one of the thin films produced using the apparatus.

Warner, Bruce E. (Pleasanton, CA); McLean, II, William (Oakland, CA)

1996-01-01T23:59:59.000Z

350

Spin hall effect in paramagnetic thin films  

E-Print Network (OSTI)

Spintronics, an abbreviation of spin based electronics and also known as magneto electronics, has attracted a lot of interest in recent years. It aims to explore the role of electrons’ spins in building next generation electric devices. Using electrons’ spins rather than electrons’ charges may allow faster, lower energy cost devices. Spin Hall Effect is an important subfield of spintronics. It studies spin current, spin transport, and spin accumulation in paramagnetic systems. It can further understanding of quantum physics, device physics, and may also provide insights for spin injection, spin detection and spin manipulation in the design of the next generation spintronics devices. In this experimental work, two sets of experiments were prepared to detect the Spin Hall Effect in metallic systems. The first set of experiments aims to extract Spin Hall Effect from Double Hall Effect in micrometer size metal thin film patterns. Our experiments proved that the Spin Hall Effect signal was much smaller than the theoretically calculated value due to higher electrical resistivity in evaporated thin films. The second set of experiments employs a multi-step process. It combines micro fabrication and electrochemical method to fabricate a perpendicular ferromagnet rod as a spin injector. Process description and various techniques to improve the measurement sensitivity are presented. Measurement results in aluminum, gold and copper are presented in Chapters III, IV and V. Some new experiments are suggested in Chapters V and VI.

Xu, Huachun

2008-12-01T23:59:59.000Z

351

Active superconducting devices formed of thin films  

DOE Patents (OSTI)

Active superconducting devices are formed of thin films of superconductor which include a main conduction channel which has an active weak link region. The weak link region is composed of an array of links of thin film superconductor spaced from one another by voids and selected in size and thickness such that magnetic flux can propagate across the weak link region when it is superconducting. Magnetic flux applied to the weak link region will propagate across the array of links causing localized loss of superconductivity in the links and changing the effective resistance across the links. The magnetic flux can be applied from a control line formed of a superconducting film deposited coplanar with the main conduction channel and weak link region on a substrate. The devices can be formed of any type to superconductor but are particularly well suited to the high temperature superconductors since the devices can be entirely formed from coplanar films with no overlying regions. The devices can be utilized for a variety of electrical components, including switching circuits, amplifiers, oscillators and modulators, and are well suited to microwave frequency applications.

Martens, Jon S. (Madison, WI); Beyer, James B. (Madison, WI); Nordman, James E. (Madison, WI); Hohenwarter, Gert K. G. (Madison, WI)

1991-05-28T23:59:59.000Z

352

Thin film cadmium telluride photovoltaic cells  

DOE Green Energy (OSTI)

This report describes research to develop to vacuum-based growth techniques for CdTe thin-film solar cells: (1) laser-driven physical vapor deposition (LDPVD) and (2) radio-frequency (rf) sputtering. The LDPVD process was successfully used to deposit thin films of CdS, CdTe, and CdCl{sub 2}, as well as related alloys and doped semiconductor materials. The laser-driven deposition process readily permits the use of several target materials in the same vacuum chamber and, thus, complete solar cell structures were fabricated on SnO{sub 2}-coated glass using LDPVD. The rf sputtering process for film growth became operational, and progress was made in implementing it. Time was also devoted to enhancing or implementing a variety of film characterization systems and device testing facilities. A new system for transient spectroscopy on the ablation plume provided important new information on the physical mechanisms of LDPVD. The measurements show that, e.g., Cd is predominantly in the neutral atomic state in the plume but with a fraction that is highly excited internally ({ge} 6 eV), and that the typical neutral Cd translational kinetic energies perpendicular to the target are 20 eV and greater. 19 refs.

Compaan, A.; Bohn, R. (Toledo Univ., OH (United States))

1992-04-01T23:59:59.000Z

353

Long-laser-pulse method of producing thin films  

DOE Patents (OSTI)

The invention described herein arose in the course of, or under, Contract No. DE-C03-76SF0098 between the United States Department of Energy and the University of California. This invention relates in general to techniques for producing thin films, and in particular to a method of using pulsed laser to deposit high temperature supercoducting thin films. 5 figs.

Balooch, M.; Olander, D.R.; Russo, R.E.

1990-02-20T23:59:59.000Z

354

Organic thin film transistors with double insulator layers  

Science Conference Proceedings (OSTI)

We have investigated a double-layer structured gate dielectric for the organic thin films transistor (OTFT) with the purpose of improving the performance of the SiO"2 gate insulator. A 50nm PMMA layer was coated on top of the SiO"2 gate insulator as ... Keywords: Mobility, On/off ratio, Organic thin film transistor, PMMA

X. Liu; Y. Bai; L. Chen; F. X. Wei; X. B. Zhang; X. Y. Jiang; Zh. L. Zhang

2007-08-01T23:59:59.000Z

355

Thermal Sensor Arrays for The Combinatorial Analysis of Thin Films  

E-Print Network (OSTI)

Thermal Sensor Arrays for The Combinatorial Analysis of Thin Films A dissertation presented Advisor Author Joost J. Vlassak Patrick J. McCluskey Thermal Sensor Arrays for The Combinatorial Analysis analysis of the thermophysical properties of thin films. The continuous growth of integrated circuits

356

A Hyper-Elastic Thin Film Nitinol Flow Diverter for Brain Aneurysms  

Science Conference Proceedings (OSTI)

The thin film Nitinol is sputter deposited with transformation temperatures at or near body temperature (37C). The thin film Nitinol is micromachined using a lift off ...

357

Ultrafast thin-film laser-induced breakdown spectroscopy of doped...  

NLE Websites -- All DOE Office Websites (Extended Search)

Ultrafast thin-film laser-induced breakdown spectroscopy of doped oxides Title Ultrafast thin-film laser-induced breakdown spectroscopy of doped oxides Publication Type Journal...

358

Deposition and Characterization of Highly Oriented Mg(3)(VO(4))(2) Thin Film Catalyst  

DOE Green Energy (OSTI)

Magnesium vanadates are potentially important catalytic materials for the conversion of alkanes to alkenes via oxidative dehydrogenation. However, little is known about the active sites at which the catalytic reactions take place. It may be possible to obtain a significant increase in the catalytic efficiency if the effects of certain material properties on the surface reactions could be quantified and optimized through the use of appropriate preparation techniques. Given that surface reactivity is often dependent upon surface structure and that the atomic level structure of the active sites in these catalysts is virtually unknown, we desire thin film samples consisting of a single magnesium vanadate phase and a well defined crystallographic orientation in order to reduce complexity and simplify the study of active sites. We report on the use of reactive RF sputter deposition to fabricate very highly oriented, stoichiometric Mg{sub 3}(VO{sub 4}){sub 2} thin films for use in these surface analysis studies. Deposition of samples onto amorphous substrates resulted in very poor crystallinity. However, deposition of Mg{sub 3}(VO{sub 4}){sub 2} onto well-oriented, lattice-matched thin film ''seed'' layers such as Ti(0001), Au(111), or Pt(111) resulted in very strong preferential (042) crystallographic orientation (pseudo-hexagonal oxygen planes parallel to the substrate). This strong preferential growth of the Mg{sub 3}VO{sub 4}{sub 2} suggests epitaxial (single-crystal) growth of this mixed metal oxide on the underlying metal seed layer. The effects of the seed layer material, deposition temperature, and post-deposition reactive treatments on thin film properties such as stoichiometry, crystallographic orientation, and chemical interactions will be discussed.

RODRIGUEZ,MARK A.; RUFFNER,JUDITH A.; SAULT,ALLEN G.; TISSOT JR.,RALPH G.

1999-10-22T23:59:59.000Z

359

Thin films of mixed metal compounds  

DOE Patents (OSTI)

Disclosed is a thin film heterojunction solar cell, said heterojunction comprising a p-type I-III-IV[sub 2] chalcopyrite substrate and an overlying layer of an n-type ternary mixed metal compound wherein said ternary mixed metal compound is applied to said substrate by introducing the vapor of a first metal compound to a vessel containing said substrate from a first vapor source while simultaneously introducing a vapor of a second metal compound from a second vapor source of said vessel, said first and second metals comprising the metal components of said mixed metal compound; independently controlling the vaporization rate of said first and second vapor sources; reducing the mean free path between vapor particles in said vessel, said gas being present in an amount sufficient to induce homogeneity of said vapor mixture; and depositing said mixed metal compound on said substrate in the form of a uniform composition polycrystalline mixed metal compound. 5 figs.

Mickelsen, R.A.; Chen, W.S.

1985-06-11T23:59:59.000Z

360

Thin-film forces in pseudoemulsion films  

SciTech Connect

Use of foam for enhanced oil recovery (EOR) has shown recent success in steam-flooding field applications. Foam can also provide an effective barrier against gas coning in thin oil zones. Both of these applications stem from the unique mobility-control properties a stable foam possesses when it exists in porous media. Unfortunately, oil has a major destabilizing effect on foam. Therefore, it is important for EOR applications to understand how oil destroys foam. Studies all indicate that stabilization of the pseudoemulsion film is critical to maintain foam stability in the presence of oil. Hence, to aid in design of surfactant formulations for foam insensitivity to oil the authors pursue direct measurement of the thin-film or disjoining forces that stabilize pseudoemulsion films. Experimental procedures and preliminary results are described.

Bergeron, V.; Radke, C.J. [California Univ., Berkeley, CA (United States). Dept. of Chemical Engineering]|[Lawrence Berkeley Lab., CA (United States)

1991-06-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


361

Thin Film Femtosecond Laser Damage Competition  

SciTech Connect

In order to determine the current status of thin film laser resistance within the private, academic, and government sectors, a damage competition was started at the 2008 Boulder Damage Symposium. This damage competition allows a direct comparison of the current state of the art of high laser resistance coatings since they are tested using the same damage test setup and the same protocol. In 2009 a high reflector coating was selected at a wavelength of 786 nm at normal incidence at a pulse length of 180 femtoseconds. A double blind test assured sample and submitter anonymity so only a summary of the results are presented here. In addition to the laser resistance results, details of deposition processes, coating materials and layer count, and spectral results will also be shared.

Stolz, C J; Ristau, D; Turowski, M; Blaschke, H

2009-11-14T23:59:59.000Z

362

Rechargeable thin-film electrochemical generator  

DOE Patents (OSTI)

An improved electrochemical generator is disclosed. The electrochemical generator includes a thin-film electrochemical cell which is maintained in a state of compression through use of an internal or an external pressure apparatus. A thermal conductor, which is connected to at least one of the positive or negative contacts of the cell, conducts current into and out of the cell and also conducts thermal energy between the cell and thermally conductive, electrically resistive material disposed on a vessel wall adjacent the conductor. The thermally conductive, electrically resistive material may include an anodized coating or a thin sheet of a plastic, mineral-based material or conductive polymer material. The thermal conductor is fabricated to include a resilient portion which expands and contracts to maintain mechanical contact between the cell and the thermally conductive material in the presence of relative movement between the cell and the wall structure. The electrochemical generator may be disposed in a hermetically sealed housing.

Rouillard, Roger (Beloeil, CA); Domroese, Michael K. (South St. Paul, MN); Hoffman, Joseph A. (Minneapolis, MN); Lindeman, David D. (Hudson, WI); Noel, Joseph-Robert-Gaetan (St-Hubert, CA); Radewald, Vern E. (Austin, TX); Ranger, Michel (Lachine, CA); Sudano, Anthony (Laval, CA); Trice, Jennifer L. (Eagan, MN); Turgeon, Thomas A. (Fridley, MN)

2000-09-15T23:59:59.000Z

363

Titanium nitride thin films for minimizing multipactoring  

DOE Patents (OSTI)

Applying a thin film coating to the surface of a workpiece, in particular, applying a coating of titanium nitride to a klystron window by means of a crossed-field diode sputtering array. The array is comprised of a cohesive group of numerous small hollow electrically conducting cylinders and is mounted so that the open ends of the cylinders on one side of the group are adjacent a titanium cathode plate. The workpiece is mounted so as to face the open ends of the other side of the group. A magnetic field is applied to the array so as to be coaxial with the cylinders and a potential is applied across the cylinders and the cathode plate, the cylinders as an anode being positive with respect to the cathode plate. The cylinders, the cathode plate and the workpiece are situated in an atmosphere of nitrogen which becomes ionized such as by field emission because of the electric field between the cylinders and cathode plate, thereby establishing an anode-cathode discharge that results in sputtering of the titanium plate. The sputtered titanium coats the workpiece and chemically combines with the nitrogen to form a titanium nitride coating on the workpiece. Gas pressure, gas mixtures, cathode material composition, voltages applied to the cathode and anode, the magnetic field, cathode, anode and workpiece spacing, and the aspect ratio (ratio of length to inner diameter) of the anode cylinders, all may be controlled to provide consistent optimum thin film coatings of various compositions and thicknesses. Another facet of the disclosure is the coating of microwave components per se with titanium nitride to reduce multipactoring under operating conditions of the components.

Welch, Kimo M. (Mountain View, CA)

1979-01-01T23:59:59.000Z

364

Growth of TiO{sub 2} Thin Film on Various Substrates using RF Magnetron Sputtering  

Science Conference Proceedings (OSTI)

The conductivity of Titanium Dioxide (TiO{sub 2}) thin film fabricated using Radio Frequency (RF) Magnetron Sputtering on Silicon (Si), Indium doped--Tin Oxide (ITO) and microscope glass (M) substrates is presented in this paper. The dependant of thin film thickness and type of substrate been discussed. TiO{sub 2} was deposited using Ti target in Ar+O{sub 2}(45:10) mixture at 250 W for 45, 60, 75, 90, 105 and 120 minute. Resultant thickness varies from 295 nm to 724 nm with deposition rate 6.4 nm/min. On the other hand, resistivity, Rs value for ITO substrate is between 5.72x10{sup -7} to 1.54x10{sup -6{Omega}}.m, Si substrate range is between 3.52x10{sup -6} to 1.76x10{sup -5{Omega}}.m and M substrate range is between 99 to 332 {Omega}.m. The value of resistivity increases with the thickness of the thin film.

Ali, Riyaz Ahmad Mohamed; Nayan, Nafarizal [Microelectronic and Nanotechnology-Shamsuddin Research Center (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), 86400 Batu Pahat, Johor D.T. (Malaysia)

2011-03-30T23:59:59.000Z

365

Origin of stress in radio frequency magnetron sputtered zinc oxide thin films  

SciTech Connect

Highly c-axis oriented ZnO thin films have been deposited on silicon substrates by planar rf magnetron sputtering under varying pressure (10-50 mTorr) and oxygen percentage (50-100%) in the reactive gas (Ar + O{sub 2}) mixture. The as-grown films were found to be stressed over a wide range from -1 x 10{sup 11} to -2 x 10{sup 8} dyne/cm{sup 2} that in turn depends strongly on the processing conditions, and the film becomes stress free at a unique combination of sputtering pressure and reactive gas composition. Raman spectroscopy and photoluminescence (PL) analyses identified the origin of stress as lattice distortion due to defects introduced in the ZnO thin film. FTIR study reveals that Zn-O bond becomes stronger with the increase in oxygen fraction in the reactive gas mixture. The lattice distortion or stress depends on the type of defects introduced during deposition. PL spectra show the formation of a shoulder in band emission with an increase in the processing pressure and are related to the presence of stress. The ratio of band emission to defect emission decreases with the increase in oxygen percentage from 50 to 100%. The studies show a correlation of stress with the structural, vibrational, and photoluminescence properties of the ZnO thin film. The systematic study of the stress will help in the fabrication of efficient devices based on ZnO film.

Menon, Rashmi; Gupta, Vinay; Sreenivas, K. [Electronic Material and Devices Laboratory, Department of Physics and Astrophysics, University of Delhi, Delhi 11007 (India); Tan, H. H.; Jagadish, C. [Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200 (Australia)

2011-03-15T23:59:59.000Z

366

Method for sputtering a PIN amorphous silicon semi-conductor device having partially crystallized P and N-layers  

DOE Patents (OSTI)

A high efficiency amorphous silicon PIN semiconductor device having partially crystallized (microcrystalline) P and N layers is constructed by the sequential sputtering of N, I and P layers and at least one semi-transparent ohmic electrode. The method of construction produces a PIN device, exhibiting enhanced electrical and optical properties, improved physical integrity, and facilitates the preparation in a singular vacuum system and vacuum pump down procedure.

Moustakas, Theodore D. (Annandale, NJ); Maruska, H. Paul (Annandale, NJ)

1985-07-09T23:59:59.000Z

367

Gas-phase free radical reactions in the glow-discharge deposition of hydrogenated amorphous silicon from silane and disilane  

SciTech Connect

An analysis of a measurement by Matsuda and co-workers of the lifetimes of the free radicals involved in the glow-discharge deposition of amorphous hydrogenated silicon from silane and disilane at 20-mTorr pressure is consistent with the hypothesis that SiH or SiH/sub 2/, but not SiH/sub 3/, is the dominant radical in the deposition from silane at that pressure.

Kampas, F.J.

1985-03-15T23:59:59.000Z

368

Novel silane and disilane precursors to amorphous semiconductors. Annual report, 1 April 1985-31 March 1986  

SciTech Connect

This report describes the preparation and characterization of amorphous fluorohydrogenated silicon thin films. The novel approach lies in the use of fluorinated silanes as film precursors. This method has the advantages of well-defined initial ratios of hydrogen and fluorine and a greatly reduced hazards in the handling of the gas. Fluorine derivatives of both silane and disilane were synthesized. A conventional method, glow discharge (or plasma-enhanced chemical vapor deposition), was employed to prepare amorphous silicon on glass and Si wafers. The electrical characterization of the material prepared from difluorosilane (the main precursor during the contract period covered in this report) showed that the a-Si:H:F films obtained are of solar-grade semiconductor quality and can be doped to p- and n-type material with diborane and phosphine.

Pernisz, U.; Sharp, K.

1986-08-01T23:59:59.000Z

369

Nanostructured Thin Film Electrolyte for Thin Film Solid Oxide Fuel Cells  

E-Print Network (OSTI)

Solid oxide fuel cells (SOFCs) are very attractive as energy generation devices because they are clean, reliable, and almost entirely pollution-free. SOFCs have flexible fuel selections compared with other fuel cell technologies. The main disadvantage of SOFCs is their high operating temperature (~1000ºC for conventional SOFCs) which leads to cell cracking and formation of non-conducting compounds at electrolyte/electrode interfaces. Therefore, intermediate temperature SOFCs (ITSOFCs) in the range of 500-700 ºC has attracted extensive research interests. To achieve high cell performance at reduced temperatures, it requires high-catalytic activity, high ionic conductivity, and comparable thermal expansion coefficient (TEC) of the cell components. To address the above issues, the research focuses on two main approaches (i.e., the interlayer approach and the electrolyte approach) in order to improve the overall cell performance. First, the design of a thin layer of a vertically-aligned nanocomposite (VAN) structure as an interlayer between the electrolyte and cathode is demonstrated. The development of the VAN structures consisted of the cathode material as a perovskite or ordered double perovskite structure, La0.5Sr0.5CoO3 (LSCO) or PrBaCo2O5 delta (PBCO), and the electrolyte material as a fluorite structure, Ce0.9Gd0.1O1.95 (CGO or GDC), were achieved for thin film solid oxide fuel cell (TFSOFCs). The VAN structure significantly improves the overall performance of the TFSOFC by increasing the interfacial area between the electrolyte and cathode and also acts as a transition layer that improves adhesion and relieves both thermal stress and lattice strain. Second, microstructural and electrical properties of Gd-doped CeO2 (GDC, Ce0.9Gd0.1O1.95) thin films electrolyte are studied for intermediate temperature solid oxide fuel cells (SOFCs). The GDC thin film electrolytes with different grain sizes and grain morphologies were prepared by varying the deposition parameters such as substrate temperature, oxygen partial pressure, target repetition rate, and laser ablation energy. The electrical property of the GDC thin film is strongly affected by the grain size. Third, bilayer electrolytes composed of a gadolinium-doped CeO2 (GDC) layer (~6 micrometer thickness) and an yttria-stabilized ZrO2 (YSZ) layer with various thicknesses (~330 nm, ~440 nm, and ~1 micrometer) are achieved by a pulsed laser deposition (PLD) technique for thin film solid oxide fuel cells (TFSOFCs). One effective approach is to incorporate YSZ thin film as a blocking layer in between the GDC and anode for preventing chemical reduction of GDC and electrical current leakage. This bilayer approach effectively improves the GDC's chemical/ mechanical stability and reduces the OCV loss under reducing conditions. The results suggest that the YSZ thin film serves as a blocking layer for preventing electrical current leakage in the GDC layer and also provides chemical, mechanical, and structural integrity in the cell, which leads to the overall enhanced performance.

Cho, Sungmee

2011-08-01T23:59:59.000Z

370

Field collapse due to band-tail charge in amorphous silicon solar cells  

SciTech Connect

It is common for the fill factor to decrease with increasing illumination intensity in hydrogenated amorphous silicon solar cells. This is especially critical for thicker solar cells, because the decrease is more severe than in thinner cells. Usually, the fill factor under uniformly absorbed red light changes much more than under strongly absorbed blue light. The cause of this is usually assumed to arise from space charge trapped in deep defect states. The authors model this behavior of solar cells using the Analysis of Microelectronic and Photonic Structures (AMPS) simulation program. The simulation shows that the decrease in fill factor is caused by photogenerated space charge trapped in the band-tail states rather than in defects. This charge screens the applied field, reducing the internal field. Owing to its lower drift mobility, the space charge due to holes exceeds that due to electrons and is the main cause of the field screening. The space charge in midgap states is small compared with that in the tails and can be ignored under normal solar-cell operating conditions. Experimentally, the authors measured the photocapacitance as a means to probe the collapsed field. They also explored the light intensity dependence of photocapacitance and explain the decrease of FF with the increasing light intensity.

Wang, Qi; Crandall, R.S. [National Renewable Energy Lab., Golden, CO (United States); Schiff, E.A. [Syracuse Univ., NY (United States)

1996-05-01T23:59:59.000Z

371

Studies on relative effects of charged and neutral defects in hydrogenated amorphous silicon  

DOE Green Energy (OSTI)

This report covers the third year of a continuing research study to understand the relative importance of charged and neutral defects in amorphous silicon. The objective of the study is to explore the electronic structure, including neutral and charged defects, an optoelectronic effects including the formation of Staebler-Wronski defects. The study concentrated on exploring electroluminescence experimentally and interpreting the results employing a simple guiding model. The simple guiding model assumes an exponential density of states and recombination rate constants (radiative and non-radiative) which are governed by hopping transitions. Measurements were also made as a function of photodegradation of the material. The results implicate that the radiative recombination processes are not distant pair tunneling but rather results from electrons hopping down due to the coulomb interactions. Preliminary experiments have been made on the effect of photodegradation on transient space charge limited currents in n/i/n structures. These experiments can directly yield information on the occupied defects centers induced by the photodegradation and are not a result of recombination processes. To date the results seems to be consistent with a picture which places the doubly occupied defects at quite a high energy ({approx equal} 0.4 e.v. below the conduction band).

Silver, M. (North Carolina Univ., Chapel Hill, NC (United States))

1992-02-01T23:59:59.000Z

372

Photochemical vapor deposition of undoped and n-type amorphous silicon films produced from disilane  

SciTech Connect

Hydrogenated amorphous silicon films have been deposited by mercury photosensitized decomposition (photochemical vapor deposition: photo-CVD) of disilane at a substrate temperature below 300 /sup 0/C. The structural and optical properties of undoped films are very similar to those of films deposited by rf glow discharge decomposition. The electronic property measurement shows that the conductivity strongly depends on the substrate temperature during deposition. The photoconductivity reaches 5.7 x 10/sup -3/ (..cap omega.. cm)/sup -1/ (AM1,100 mW/cm/sup 2/) at a substrate temperature of 200 /sup 0/C. The dark conductivity is 10/sup -6/--10/sup -8/ (..cap omega.. cm)/sup -1/ and the Fermi level is located near the middle of the gap. n-type doping has been also achieved by adding phosphine as an impurity to disilane. Furthermore, a p-i-n a-Si solar cell was fabricated using photo-CVD undoped and P-doped films. The initial cell showed a conversion efficiency of 4.39% under AM1 insolation.

Inoue, T.; Konagai, M.; Takahashi, K.

1983-10-15T23:59:59.000Z

373

High Efficiency Triple-Junction Amorphous Silicon Alloy Photovoltaic Technology, Final Technical Report, 6 March 1998 - 15 October 2001  

DOE Green Energy (OSTI)

This report describes the research program intended to expand, enhance, and accelerate knowledge and capabilities for developing high-performance, two-terminal multijunction amorphous silicon (a-Si) alloy cells, and modules with low manufacturing cost and high reliability. United Solar uses a spectrum-splitting, triple-junction cell structure. The top cell uses an amorphous silicon alloy of {approx}1.8-eV bandgap to absorb blue photons. The middle cell uses an amorphous silicon germanium alloy ({approx}20% germanium) of {approx}1.6-eV bandgap to capture green photons. The bottom cell has {approx}40% germanium to reduce the bandgap to {approx}1.4-eV to capture red photons. The cells are deposited on a stainless-steel substrate with a predeposited silver/zinc oxide back reflector to facilitate light-trapping. A thin layer of antireflection coating is applied to the top of the cell to reduce reflection loss. The major research activities conducted under this program were: (1) Fundamental studies to improve our understanding of materials and devices; the work included developing and analyzing a-Si alloy and a-SiGe alloy materials prepared near the threshold of amorphous-to-microcrystalline transition and studying solar cells fabricated using these materials. (2) Deposition of small-area cells using a radio-frequency technique to obtain higher deposition rates. (3) Deposition of small-area cells using a modified very high frequency technique to obtain higher deposition rates. (4) Large-area cell research to obtain the highest module efficiency. (5) Optimization of solar cells and modules fabricated using production parameters in a large-area reactor.

Guha, S.

2001-11-08T23:59:59.000Z

374

Functionalized multilayer thin films for protection against acutely toxic agents  

E-Print Network (OSTI)

The recently developed practice of spraying polyelectrolyte solutions onto a substrate in order to construct thin films via the Layer-by-Layer (LbL) technique has been further investigated and extended. In this process a ...

Krogman, Kevin Christopher

2009-01-01T23:59:59.000Z

375

Polycrystalline Thin-Film Research: Cadmium Telluride (Fact Sheet)  

Science Conference Proceedings (OSTI)

Capabilities fact sheet that includes scope, core competencies and capabilities, and contact/web information for Polycrystalline Thin-Film Research: Cadmium Telluride at the National Center for Photovoltaics.

Not Available

2011-06-01T23:59:59.000Z

376

Properties and sensor performance of zinc oxide thin films  

E-Print Network (OSTI)

Reactively sputtered ZnO thin film gas sensors were fabricated onto Si wafers. The atmosphere dependent electrical response of the ZnO micro arrays was examined. The effects of processing conditions on the properties and ...

Min, Yongki, 1965-

2003-01-01T23:59:59.000Z

377

Biological, Electronic, and Functional Thin Films and Coatings II  

Science Conference Proceedings (OSTI)

Mar 4, 2013 ... Recent Developments in Biological, Electronic, and Functional Thin Films ... Improved Mobility and Transmittance of Room Temperature ... excellent scintillator for numerous applications in lasers, optical lens and radiography.

378

Biological, Electronic, and Functional Thin Films and Coatings I  

Science Conference Proceedings (OSTI)

Mar 4, 2013... scan (PPS) and electrical impedance spectroscopy (EIS). ... Eclipse Active and Passive Solar Control Coatings: Hulya ... In this paper two novel thin film coating systems will be presented for energy conservation solar ...

379

2 Thin Films Prepared by Sequential Evaporation for Photovoltaic  

Science Conference Proceedings (OSTI)

The defects of Cu-Se di-vacancies are formed in Cu(In,Ga)Se2 thin films and influence to the solar cell performance. In this study, we have fabricated Cu(In ...

380

Shock Dynamics in Particle-Laden Thin Films  

E-Print Network (OSTI)

We present theory and experiments for thin film particle-laden flow on an incline. At higher particle concentration and inclination angle, a new phenomenon is observed in which a large particle-rich ridge forms at the ...

Dupuy, B.

2005-04-22T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


381

Direct printing of lead zirconate titanate thin films  

E-Print Network (OSTI)

Thus far, use of lead zirconate titanate (PZT) in MEMS has been limited due to the lack of process compatibility with existing MEMS manufacturing techniques. Direct printing of thin films eliminates the need for photolithographic ...

Bathurst, Stephen, 1980-

2008-01-01T23:59:59.000Z

382

Chemical vapor deposition of organosilicon and sacrificial polymer thin films  

E-Print Network (OSTI)

Chemical vapor deposition (CVD) produced films for a wide array of applications from a variety of organosilicon and organic precursors. The structure and properties of thin films were controlled by varying processing ...

Casserly, Thomas Bryan

2005-01-01T23:59:59.000Z

383

Method for making surfactant-templated thin films  

DOE Patents (OSTI)

An evaporation-induced self-assembly method to prepare a porous, surfactant-templated, thin film by mixing a silica sol, a solvent, a surfactant, and an interstitial compound, evaporating a portion of the solvent to form a liquid, crystalline thin film mesophase material, and then removal of the surfactant template. Coating onto a substrate produces a thin film with the interstitial compound either covalently bonded to the internal surfaces of the ordered or disordered mesostructure framework or physically entrapped within the ordered or disordered mesostructured framework. Particles can be formed by aerosol processing or spray drying rather than coating onto a substrate. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.

Brinker, C. Jeffrey (Albuquerque, NM); Lu, Yunfeng (New Orleans, LA); Fan, Hong You (Albuquerque, NM)

2010-08-31T23:59:59.000Z

384

Method for making surfactant-templated thin films  

DOE Patents (OSTI)

An evaporation-induced self-assembly method to prepare a porous, surfactant-templated, thin film by mixing a silica sol, a solvent, a surfactant, and an interstitial compound, evaporating a portion of the solvent to form a liquid, crystalline thin film mesophase material, and then removal of the surfactant template. Coating onto a substrate produces a thin film with the interstitial compound either covalently bonded to the internal surfaces of the ordered or disordered mesostructure framework or physically entrapped within the ordered or disordered mesostructured framework. Particles can be formed by aerosol processing or spray drying rather than coating onto a substrate. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.

Brinker, C. Jeffrey (Albuquerque, NM); Lu, Yunfeng (San Jose, CA); Fan, Hongyou (Albuquerque, NM)

2002-01-01T23:59:59.000Z

385

Synthesis and Patterning of Calcium and Barium Niobate Thin Films ...  

Science Conference Proceedings (OSTI)

Epitaxial CBN thin films were deposited on MgO and NSTO substrates at 800°C under 1mTorr of oxygen pressure using Pulsed Laser Deposition technique.

386

Initiated chemical vapor deposition of functional polyacrylic thin films  

E-Print Network (OSTI)

Initiated chemical vapor deposition (iCVD) was explored as a novel method for synthesis of functional polyacrylic thin films. The process introduces a peroxide initiator, which can be decomposed at low temperatures (<200?C) ...

Mao, Yu, 1975-

2005-01-01T23:59:59.000Z

387

Deriving Deformation Mechanisms in Nanocrystalline AuCu Thin Films  

Science Conference Proceedings (OSTI)

... in a SEM on nc gold and gold-copper thin films adherent to polymer substrate. .... Lithiation Mechanism of Individual SnO2 Nanowires in a Flooding Geometry.

388

Polycrystalline Thin-Film Research: Cadmium Telluride (Fact Sheet)  

DOE Green Energy (OSTI)

This National Center for Photovoltaics sheet describes the capabilities of its polycrystalline thin-film research in the area of cadmium telluride. The scope and core competencies and capabilities are discussed.

Not Available

2013-06-01T23:59:59.000Z

389

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of...

390

Boron arsenide thin film solar cell development. Final report  

DOE Green Energy (OSTI)

Pyrolytic decomposition of diborane and arsine has been used in attempts to grow polycrystalline BAs films. This method, however, produced only amorphous films for deposition temperatures below 920/sup 0/C and polycrystalline boron subarsenide (B/sub 12/As/sub 2/) flms for deposition temperatures above this value. The amorphous films have been determined to have a significant arsenic content but the actual stoichiometry was not obtained. The films were adherent on single crystal sapphire (0001), (111) silicon, (0001) SiC, and polycrystalline SiC but were found not to be adherent to substrates of fused quartz, tungsten, and molybdenum. It was also found that all films deposited above 650/sup 0/C were p-type while those deposited below 600/sup 0/C were usually n-type. Polycrystalline BAs and B/sub 12/As/sub 2/ was produced by reaction of the elements in a closed tube. The amorphous films showed an indirect or non-direct optical bandgap from 1.0 to 1.7 eV with the most probable values between 1.2 to 1.4 eV. The crystalline BAs powder shows a bandgap near 1.0 eV. Photoconductance time constants have been measured for films deposited on (0001) sapphire and (0001) SiC. Attempts at doping the amorphous films were generally unsuccessful. A polycrystalline powder sample was successfully doped with sulfur. Attempts were made to produce a Schottky barrier diode by evaporating Al dots onto an amorphous film on graphite without a post-evaporation anneal. An MIS structure was also attempted by baking an amorphous film in air at 280/sup 0/C before evaporation of aluminum. Although nonlinear characteristics were obtained, none of the devices showed any photovoltaic response. A p-type amorphous film was deposited on an n-type silicon substrate to form a p-n heterojunction. This device did exhibit a photovoltaic response but it is believed that the photogeneration was occurring primarily in the silicon substrate.

Boone, J.L.; Van Doren, T.P.

1980-09-01T23:59:59.000Z

391

Dry-transfer of chemical vapour deposited nanocarbon thin films  

E-Print Network (OSTI)

equipment and measurement I thank Dr Xiulia Xu, high resolution transmission electron microscopy - Dr Caterina Ducati, Mr Sai Shivareddy and Dr Jamie Warner (Oxford University) and assistance with supercapacitor manufacturing and measurement - Mr (soon... that these thin films behave, in a macroscopic sense, similar to traditional c-axis conductive graphite and deviate toward tunnel dominated conduction with increasing degrees of network disorder. Various MWCNT-based thin film field emitters were considered...

Cole, Matthew Thomas

2012-01-10T23:59:59.000Z

392

Temperature effect on low-k dielectric thin films studied by ERDA  

DOE Green Energy (OSTI)

Low-k dielectric materials are becoming increasingly interesting as alternative to SiO2 with device geometries shrinking beyond the 65 nm technology node. At elevated temperatures hydrogen migration becomes an important degradation mechanism for conductivity breakdown in semiconductor devices. The possibility of hydrogen release during the fabrication process is, therefore, of great interest in the understanding of device reliability. In this study, various low-k dielectric films were subjected to thermal annealing at temperatures that are generally used for device fabrication. Elastic recoil detection analysis (ERDA) was used to investigate compositional changes and hydrogen redistribution in thin films of plasma-enhanced tetraethylortho-silicate (PETEOS), phosphorus doped silicon glass (PSG), silicon nitride (SiN) and silicon oxynitride (SiON). Except for an initial hydrogen release from the surface region in films of PETEOS and PSG, the results indicate that the elemental composition of the films was stable for at least 2 hours at 450?C.

Jensen, Jens; Possnert, Göran; Zhang, Yanwen

2008-09-23T23:59:59.000Z

393

Optimization of transparent and reflecting electrodes for amorphous-silicon solar cells. Final subcontract report, 1 May 1991--30 April 1994  

DOE Green Energy (OSTI)

Fluorine-doped zinc oxide was shown to have the lowest absorption loss of any of the known transparent conductors. An apparatus was constructed to deposit textured, transparent, conductive, fluorine-doped zinc oxide layers with uniform thickness over a 10 cm by 10 cm area, using inexpensive, high-productivity atmospheric pressure chemical vapor deposition. Amorphous silicon solar cells grown on these textured films show very high peak quantum efficiencies (over 90%). However, a significant contact resistance develops at the interface between the amorphous silicon and the zinc oxide. Transparent, conductive gallium-doped zinc oxide films were grown by APCVD at a low enough temperature (260{degree}C) to be deposited on amorphous silicon as a final conductive back contact to solar cells. A quantum-mechanical theory of bonding was developed and applied to some metal oxides; it forms a basis for understanding TCO structures and the stability of their interfaces with silicon.

Gordon, R.G.; Hu, J.; Lacks, D.; Musher, J.; Thornton, J.; Liang, H. [Harvard Univ., Cambridge, MA (United States)

1994-07-01T23:59:59.000Z

394

Research on polycrystalline thin-film materials, cells, and modules  

DOE Green Energy (OSTI)

The US Department of Energy (DOE) supports research activities in polycrystalline thin films through the Polycrystalline Thin-Film Program at the Solar Energy Research Institute (SERI). This program includes research and development (R D) in both copper indium diselenide and cadmium telluride thin films for photovoltaic applications. The objective of this program is to support R D of photovoltaic cells and modules that meet the DOE long-term goals of high efficiency (15%--20%), low cost ($50/m{sup 2}), and reliability (30-year life time). Research carried out in this area is receiving increased recognition due to important advances in polycrystalline thin-film CuInSe{sub 2} and CdTe solar cells and modules. These have become the leading thin-film materials for photovoltaics in terms of efficiency and stability. DOE has recognized this potential through a competitive initiative for the development of CuInSe{sub 2} and CdTe modules. This paper focuses on the recent progress and future directions of the Polycrystalline Thin-Film Program and the status of the subcontracted research on these promising photovoltaic materials. 26 refs., 12 figs, 1 tab.

Mitchell, R.L.; Zweibel, K.; Ullal, H.S.

1990-11-01T23:59:59.000Z

395

Amorphous silicon research. Final technical progress report, 1 August 1994--28 February 1998  

DOE Green Energy (OSTI)

This report describes the status and accomplishments of work performed under this subcontract by United Solar Systems. United Solar researchers explored several new deposition regimes/conditions to investigate their effect on material/device performance. To facilitate optimum ion bombardment during growth, a large parameter space involving chamber pressure, rf power, and hydrogen dilution were investigated. United Solar carried out a series of experiments using discharge modulation at various pulsed-plasma intervals to study the effect of Si-particle incorporation on solar cell performance. Hydrogen dilution during deposition is found to improve both the initial and stable performance of a-Si and a-SiGe alloy cells. Researchers conducted a series of temperature-ramping experiments on samples prepared with high and low hydrogen dilutions to study the effect of hydrogen effusion on solar cell performance. Using an internal photoemission method, the electrical bandgap of a microcrystalline p layer used in high-efficiency solar cells was measured to be 1.6 eV. New measurement techniques were developed to evaluate the interface and bulk contributions of losses to solar cell performance. Researchers replaced hydrogen with deuterium and found deuterated amorphous silicon alloy solar cells exhibit reduced light-induced degradation. The incorporation of a microcrystalline n layer in a multijunction cell is seen to improve cell performance. United Solar achieved a world-record single-junction a-Si alloy stable cell efficiency of 9.2% with an active area of 0.25 cm{sup 2} grown with high hydrogen dilution. They also achieved a world-record triple-junction, stable, active-area cell efficiency of 13.0% with an active area of 0.25 cm{sup 2}.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1998-05-01T23:59:59.000Z

396

High performance hydrogenated amorphous silicon solar cells made at a high deposition rate by glow discharge of disilane  

SciTech Connect

The deposition rate, electronic and optical properties of hydrogenated amorphous silicon films prepared from rf glow discharge decomposition of disilane (Si/sub 2/H/sub 6/) diluted in helium have been measured. These films show excellent electrical and optical properties and, most importantly, a high deposition rate coupled with satisfactory solar cell application was realized for the first time. At a deposition rate of 11 A/s, 5.47% and 6.5% conversion efficiencies were obtained with a first trial of n-i-p type solar cells deposited on SnO/sub 2//ITO glass and metal substrates, respectively.

Ohashi, Y.; Kenne, J.; Konagai, M.; Takahashi, K.

1983-06-15T23:59:59.000Z

397

Atmospheric Pressure Chemical Vapor Deposition of High Silica SiO2-TiO2 Antireflective Thin Films for Glass Based Solar Panels  

SciTech Connect

The atmospheric pressure chemical vapor deposition (APCVD) of SiO2-TiO2 thin films employing [[(tBuO)3Si]2O-Ti(OiPr)2], which can be prepared from commercially available materials, results in antireflective thin films on float glass under industrially relevant manufacturing conditions. It was found that while the deposition temperature had an effect on the SiO2:TiO2 ratio, the thickness was dependent on the time of deposition. This study shows that it is possible to use APCVD employing a single source precursor containing titanium and silicon to produce thin films on float glass with high SiO2:TiO2 ratios.

Klobukowski, Erik R [ORNL; Tenhaeff, Wyatt E [ORNL; McCamy, James [PPG; Harris, Caroline [PPG; Narula, Chaitanya Kumar [ORNL

2013-01-01T23:59:59.000Z

398

Thin Film Packaging Solutions for High Efficiency OLED Lighting Products  

Science Conference Proceedings (OSTI)

The objective of the 'Thin Film Packaging Solutions for High Efficiency OLED Lighting Products' project is to demonstrate thin film packaging solutions based on SiC hermetic coatings that, when applied to glass and plastic substrates, support OLED lighting devices by providing longer life with greater efficiency at lower cost than is currently available. Phase I Objective: Demonstrate thin film encapsulated working phosphorescent OLED devices on optical glass with lifetime of 1,000 hour life, CRI greater than 75, and 15 lm/W. Phase II Objective: Demonstrate thin film encapsulated working phosphorescent OLED devices on plastic or glass composite with 25 lm/W, 5,000 hours life, and CRI greater than 80. Phase III Objective: Demonstrate 2 x 2 ft{sup 2} thin film encapsulated working phosphorescent OLED with 40 lm/W, 10,000 hour life, and CRI greater than 85. This report details the efforts of Phase III (Budget Period Three), a fourteen month collaborative effort that focused on optimization of high-efficiency phosphorescent OLED devices and thin-film encapsulation of said devices. The report further details the conclusions and recommendations of the project team that have foundation in all three budget periods for the program. During the conduct of the Thin Film Packaging Solutions for High Efficiency OLED Lighting Products program, including budget period three, the project team completed and delivered the following achievements: (1) a three-year marketing effort that characterized the near-term and longer-term OLED market, identified customer and consumer lighting needs, and suggested prototype product concepts and niche OLED applications lighting that will give rise to broader market acceptance as a source for wide area illumination and energy conservation; (2) a thin film encapsulation technology with a lifetime of nearly 15,000 hours, tested by calcium coupons, while stored at 16 C and 40% relative humidity ('RH'). This encapsulation technology was characterized as having less than 10% change in transmission during the 15,000 hour test period; (3) demonstrated thin film encapsulation of a phosphorescent OLED device with 1,500 hours of lifetime at 60 C and 80% RH; (4) demonstrated that a thin film laminate encapsulation, in addition to the direct thin film deposition process, of a polymer OLED device was another feasible packaging strategy for OLED lighting. The thin film laminate strategy was developed to mitigate defects, demonstrate roll-to-roll process capability for high volume throughput (reduce costs) and to support a potential commercial pathway that is less dependent upon integrated manufacturing since the laminate could be sold as a rolled good; (5) demonstrated that low cost 'blue' glass substrates could be coated with a siloxane barrier layer for planarization and ion-protection and used in the fabrication of a polymer OLED lighting device. This study further demonstrated that the substrate cost has potential for huge cost reductions from the white borosilicate glass substrate currently used by the OLED lighting industry; (6) delivered four-square feet of white phosphorescent OLED technology, including novel high efficiency devices with 82 CRI, greater than 50 lm/W efficiency, and more than 1,000 hours lifetime in a product concept model shelf; (7) presented and or published more than twenty internal studies (for private use), three external presentations (OLED workshop-for public use), and five technology-related external presentations (industry conferences-for public use); and (8) issued five patent applications, which are in various maturity stages at time of publication. Delivery of thin film encapsulated white phosphorescent OLED lighting technology remains a challenging technical achievement, and it seems that commercial availability of thin, bright, white OLED light that meets market requirements will continue to require research and development effort. However, there will be glass encapsulated white OLED lighting products commercialized in niche markets during the 2008 calendar year. This commercializ

None

2008-06-30T23:59:59.000Z

399

Understanding Thin Film Structure for the Rational Design of  

NLE Websites -- All DOE Office Websites (Extended Search)

Understanding Thin Film Structure for the Rational Design of Understanding Thin Film Structure for the Rational Design of High-performance Organic Semiconductors for Plastic Electronics Organic semiconductors are attracting considerable research interest due to their potential applications in low-cost electronics such as organic light emitting diode (OLED) displays, RF identification tags (RFID), smart cards and electronic paper. The development of p-conjugated materials, which are composed of alternating single and double chemical bonds, are the foundation of these applications. In the past decade research in this field has progressed to the extent that desirable charge transport in the organic semiconductor film in organic thin film transistors (OTFT) can be achieved through molecular design by selective placement of electron-rich, electron-withdrawing, and aromatic groups in different parts of the molecule. Although the electronic properties are easily tuned by molecular design, the molecular packing within the thin film and the film microstructure have a significant influence on the OTFT performance. Despite this importance, this interrelationship between molecular structure, thin film molecular packing and charge transport are only poorly understood.

400

Thin-film absorber for a solar collector  

DOE Green Energy (OSTI)

This invention pertains to energy absorbers for solar collectors, and more particularly to high performance thin film absorbers. The solar collectors comprising the absorber of this invention overcome several problems seen in current systems, such as excessive hardware, high cost and unreliability. In the preferred form, the apparatus features a substantially rigid planar frame with a thin film window bonded to one planar side of the frame. An absorber in accordance with the present invention is comprised of two thin film layers that are sealed perimetrically. In a preferred embodiment, thin film layers are formed from a metal/plastic laminate. The layers define a fluid-tight planar envelope of large surface area to volume through which a heat transfer fluid flows. The absorber is bonded to the other planar side of the frame. The thin film construction of the absorber assures substantially full envelope wetting and thus good efficiency. The window and absorber films stress the frame adding to the overall strength of the collector.

Wilhelm, W.G.

1982-02-09T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


401

THE USE OF AMORPHOUS SILICON IN FABRICATING A PHOTOVOLTAIC-THERMAL SYSTEM  

E-Print Network (OSTI)

& irradiation intensity 1 INTRODUCTION With the high increase in PV system production and solar energy use this information and solar irradiation data [4], electricity production during the entire lifetime of the PV system grade silicon Multicrystalline silicon ingot Multicrystalline silicon wafer Solar cell PV module PV

Kherani, Nazir P.

402

Development of Nb and Alternative Material Thin Films Tailored for SRF Applications  

Science Conference Proceedings (OSTI)

Over the years, Nb/Cu technology, despite its shortcomings due to the commonly used magnetron sputtering, has positioned itself as an alternative route for the future of superconducting structures used in accelerators. Recently, significant progress has been made in the development of energetic vacuum deposition techniques, showing promise for the production of thin films tailored for SRF applications. JLab is pursuing energetic condensation deposition via techniques such as Electron Cyclotron Resonance and High Power Impulse Magnetron Sputtering. As part of this project, the influence of the deposition energy on the material and RF properties of the Nb thin film is investigated with the characterization of their surface, structure, superconducting properties and RF response. It has been shown that the film RRR can be tuned from single digits to values greater than 400. This paper presents results on surface impedance measurements correlated with surface and material characterization for Nb films produced on various substrates, monocrystalline and polycrystalline as well as amorphous. A progress report on work on NbTiN and AlN based multilayer structures will also be presented.

Valente-Feliciano, A -M; Reece, C E; Spradlin, J K; Xiao, B; Zhao, X; Gu, Diefeng; Baumgart, Helmut; Beringer, Douglas; Lukaszew, Rosa

2011-09-01T23:59:59.000Z

403

Tandem photonic-crystal thin films surpassing Lambertian light-trapping limit over broad bandwidth and angular range  

E-Print Network (OSTI)

The maximum absorption of solar radiation over the broadest range of frequencies and incident angles using the thinnest material possible has important applications for renewable-energy generation. Complete random texturing of an optically-thick film's surface to increase the path length of scattered light rays, first proposed nearly thirty years ago, has thus far remained the most effective approach for photon absorption over the widest set of conditions. Recent thin-film nanostructured designs involving resonant wave effects of photons have explored the possibility of superior performance though as of yet no proposal satisfying the dual requirements of enhanced and robust absorption over a large fraction of the solar spectrum has been made. Here using recent advances in computational electrodynamics we describe a general strategy for the design of a silicon thin film applicable to photovoltaic cells based on a quasi-resonant approach to light trapping where two partially-disordered photonic-crystal slabs, s...

Oskooi, Ardavan; Noda, Susumu

2013-01-01T23:59:59.000Z

404

Characterization of Amorphous Silicon Advanced Materials and PV Devices: Final Technical Report, 15 December 2001--31 January 2005  

DOE Green Energy (OSTI)

The major objectives of this subcontract have been: (1) understand the microscopic properties of the defects that contribute to the Staebler-Wronski effect to eliminate this effect, (2) perform correlated studies on films and devices made by novel techniques, especially those with promise to improve stability or deposition rates, (3) understand the structural, electronic, and optical properties of films of hydrogenated amorphous silicon (a-Si:H) made on the boundary between the amorphous and microcrystalline phases, (4) search for more stable intrinsic layers of a-Si:H, (5) characterize the important defects, impurities, and metastabilities in the bulk and at surfaces and interfaces in a-Si:H films and devices and in important alloy systems, and (6) make state-of-the-art plasma-enhanced chemical vapor deposition (PECVD) devices out of new, advanced materials, when appropriate. All of these goals are highly relevant to improving photovoltaic devices based on a-Si:H and related alloys. With regard to the first objective, we have identified a paired hydrogen site that may be the defect that stabilizes the silicon dangling bonds formed in the Staebler-Wronski effect.

Taylor, P. C.

2005-11-01T23:59:59.000Z

405

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

406

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

407

Low Temperature Chemical Vapor Deposition Of Thin Film Magnets  

DOE Patents (OSTI)

A thin-film magnet formed from a gas-phase reaction of tetracyanoetheylene (TCNE) OR (TCNQ), 7,7,8,8-tetracyano-P-quinodimethane, and a vanadium-containing compound such as vanadium hexcarbonyl (V(CO).sub.6) and bis(benzene)vanalium (V(C.sub.6 H.sub.6).sub.2) and a process of forming a magnetic thin film upon at least one substrate by chemical vapor deposition (CVD) at a process temperature not exceeding approximately 90.degree. C. and in the absence of a solvent. The magnetic thin film is particularly suitable for being disposed upon rigid or flexible substrates at temperatures in the range of 40.degree. C. and 70.degree. C. The present invention exhibits air-stable characteristics and qualities and is particularly suitable for providing being disposed upon a wide variety of substrates.

Miller, Joel S. (Salt Lake City, UT); Pokhodnya, Kostyantyn I. (Salt Lake City, UT)

2003-12-09T23:59:59.000Z

408

Ultrafast laser ablation of gold thin film targets  

Science Conference Proceedings (OSTI)

Ultrafast laser ablation of a gold thin film is studied and compared with that of a bulk target, with particular emphasis given to the process of nanoparticles generation. The process is carried out in a condition where a single laser shot removes all the irradiated film spot. The experimental results evidence interesting differences and, in particular, a reduction of the nanoparticles size, and a narrowing of a factor two of their size distribution in the case of ablation of a thin film target, a feature which we relate to a more uniform heating of the target material. We thus show that ultrashort laser ablation of thin films provides a promising way of controlling plume features and nanoparticles size.

Amoruso, S.; Ausanio, G.; Bruzzese, R. [Dipartimento di Scienze Fisiche, Universita degli Studi di Napoli Federico II, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy); CNR-SPIN, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy); Nedyalkov, N. N.; Atanasov, P. A. [Institute of Electronics, Bulgarian Academy of Sciences, 72 Tsaridradsko shose Boulevard, Sofia 1784 (Bulgaria); Wang, X. [CNR-SPIN, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy)

2011-12-15T23:59:59.000Z

409

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

410

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

411

Thin-film rechargeable lithium batteries for implantable devices  

DOE Green Energy (OSTI)

Thin films of LiCoO{sub 2} have been synthesized in which the strongest x-ray reflection is either weak or missing, indicating a high degree of preferred orientation. Thin-film solid state batteries with these textured cathode films can deliver practical capacities at high current densities. For example, for one of the cells 70% of the maximum capacity between 4.2 V and 3 V ({approximately}0.2 mAh/cm{sup 2}) was delivered at a current of 2 mA/cm{sup 2}. When cycled at rates of 0.1 mA/cm{sup 2}, the capacity loss was 0.001 %/cycle or less. The reliability and performance of Li-LiCoO{sub 2} thin-film batteries make them attractive for application in implantable devices such as neural stimulators, pacemakers, and defibrillators.

Bates, J.b.; Dudney, N.J.

1997-05-01T23:59:59.000Z

412

Ruthenium-Platinum Thin Film Analysis Using Grazing Incidence X-ray Diffraction  

DOE Green Energy (OSTI)

Ruthenium (Ru, Z = 44) is a Platinum Group Metal that has a standard hexagonal close packed (HCP) crystalline structure. Platinum (Pt, Z = 78) has a face-centered cubic (FCC) crystalline structure. When these metals are co-sputtered onto a silicon substrate, creating a few nm-thin film, they form an alloy with a combination of HCP and FCC structure. Direct methanol fuel cells rely on an anode catalyst to draw hydrogen from liquid methanol. Highly efficient fuel cells based on polymer electrolyte catalysts, known as proton-exchange membrane fuel cells, have been developed, but require large amounts of a costly platinum catalyst. Thin-film nanostructure bimetallic alloys have been produced to reduce the amount of expensive Platinum needed for catalysis, and also to improve the electrochemical properties of the catalyst. Supported RuPt particles have been shown to have superior activity as anode catalysts for methanol electro-oxidation and demonstrate an improvement in resistance to poisoning in comparison to unalloyed Pt. The percentage of Ruthenium in a RuPt thin film and the process by which the alloy is produced will dictate the crystalline structure, and thus the electrochemical properties of the film. Pure Ruthenium, Pure Platinum, and eight intermediate samples at differing percent composition of Ruthenium were characterized by their X-ray diffraction patterns. The incident beam is from the Stanford Synchrotron Radiation Laboratory beam and operates at approximately a 1.4 Angstrom wavelength. The results show that 0% Ru through 46.17% Ru exhibit a majority FCC structure, 56.07% Ru and 60.61% Ru are mixed phase, and from 67.03% Ru through 100% Ru, the samples exhibit a HCP structure.

Jones, L.

2004-09-03T23:59:59.000Z

413

Strained germanium thin film membrane on silicon substrate for optoelectronics  

E-Print Network (OSTI)

-temperature direct bandgap electroluminesence from Ge- on-Si light-emitting diodes," Opt. Lett. 34(8), 1198 temperature 1.6 microm electroluminescence from Ge light emitting diode on Si substrate," Opt. Express 17

Miller, David A. B.

414

Fabrication of polycrystalline thin films by pulsed laser processing  

DOE Patents (OSTI)

A method for fabricating polycrystalline thin films on low-temperature (or high-temperature) substrates which uses processing temperatures that are low enough to avoid damage to the substrate, and then transiently heating select layers of the thin films with at least one pulse of a laser or other homogenized beam source. The pulse length is selected so that the layers of interest are transiently heated to a temperature which allows recrystallization and/or dopant activation while maintaining the substrate at a temperature which is sufficiently low to avoid damage to the substrate. This method is particularly applicable in the fabrication of solar cells.

Mitlitsky, Fred (Livermore, CA); Truher, Joel B. (San Rafael, CA); Kaschmitter, James L. (Pleasanton, CA); Colella, Nicholas J. (Livermore, CA)

1998-02-03T23:59:59.000Z

415

Fabrication of polycrystalline thin films by pulsed laser processing  

DOE Patents (OSTI)

A method is disclosed for fabricating polycrystalline thin films on low-temperature (or high-temperature) substrates which uses processing temperatures that are low enough to avoid damage to the substrate, and then transiently heating select layers of the thin films with at least one pulse of a laser or other homogenized beam source. The pulse length is selected so that the layers of interest are transiently heated to a temperature which allows recrystallization and/or dopant activation while maintaining the substrate at a temperature which is sufficiently low to avoid damage to the substrate. This method is particularly applicable in the fabrication of solar cells. 1 fig.

Mitlitsky, F.; Truher, J.B.; Kaschmitter, J.L.; Colella, N.J.

1998-02-03T23:59:59.000Z

416

Method of improving field emission characteristics of diamond thin films  

DOE Patents (OSTI)

A method of preparing diamond thin films with improved field emission properties. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display.

Krauss, Alan R. (Naperville, IL); Gruen, Dieter M. (Downer Grove, IL)

1999-01-01T23:59:59.000Z

417

Effects of humidity during photoprocessing on thin film metallization adhesion  

SciTech Connect

Humidity effects during photoprocessing on tantalum/chromium/gold thin film networks (TFNs) were investigated. Humidity conditions at various process steps were controlled by placing either desiccant or water in handling containers for the TFNs. The TFNs photoprocessed in humid conditions had a much higher occurrence of metallization failures compared to TFNs processed in dry conditions. Ceramic surface defects were shown to cause pores in the thin films, and these pores enhanced corrosion susceptibility for the films. This study resulted in a desiccated storage process for production of TFNs.

Norwood, D.P.

1980-03-01T23:59:59.000Z

418

Deposition of device quality, low hydrogen content, hydrogenated amorphous silicon at high deposition rates  

DOE Patents (OSTI)

A method of fabricating device quality, thin-film a-Si:H for use as semiconductor material in photovoltaic and other devices, comprising in any order; positioning a substrate in a vacuum chamber adjacent a plurality of heatable filaments with a spacing distance L between the substrate and the filaments; heating the filaments to a temperature that is high enough to obtain complete decomposition of silicohydride molecules that impinge said filaments into Si and H atomic species; providing a flow of silicohydride gas, or a mixture of silicohydride gas containing Si and H, in said vacuum chamber while maintaining a pressure P of said gas in said chamber, which, in combination with said spacing distance L, provides a P.times.L product in a range of 10-300 mT-cm to ensure that most of the Si atomic species react with silicohydride molecules in the gas before reaching the substrate, to thereby grow a a-Si:H film at a rate of at least 50 .ANG./sec.; and maintaining the substrate at a temperature that balances out-diffusion of H from the growing a-Si:H film with time needed for radical species containing Si and H to migrate to preferred bonding sites.

Mahan, Archie Harvin (Golden, CO); Molenbroek, Edith C. (Rotterdam, NL); Gallagher, Alan C. (Louisville, CO); Nelson, Brent P. (Golden, CO); Iwaniczko, Eugene (Lafayette, CO); Xu, Yueqin (Golden, CO)

2002-01-01T23:59:59.000Z

419

Preparation of thin film solar cells under very low pressure conditions. Final report, October 1, 1976--September 30, 1977  

DOE Green Energy (OSTI)

In this study the feasibility of fabricating backwall Schottky barrier polycrystalline solar cells under ultra-high vacuum conditions of 1 x 10/sup -10/ torr (N/sub 2/) was investigated. Thin films of electron beam vaporized silicon were deposited on cleaned metal substrates of tungsten, tantalum and hafnium. Mass spectra from the quadrapole residual gas analyzer were used to determine the partial pressure of peak heights of 13 residual gases during each processing step. During separate silicon depositions, the substrate temperature was varied between 400 and 750/sup 0/C and deposition rates between 20 and 750 A/min were used. Surface contamination and metal diffusion were monitored by in situ Auger electron spectrometry before and after cleaning, deposition and annealing. Auger depth profiling, x-ray analysis, and SEM in the topographic and channeling modes, were utilized to characterize the samples with respect to silicon-metal boundary layer, interdiffusion, silicide formation and grain size of silicon. The clean metal surface was found to enhance thin film silicide growth. Fine grain silicon films were obtained for all samples that were not completely converted to a metallic silicide. Tungsten, tantalum and hafnium were found to form silicides at temperatures as low as 600/sup 0/C.

Schmidt, F.A.; Shanks, H.R.; Bevolo, A.J.; Campisi, G.J.

1977-01-01T23:59:59.000Z

420

Cu2Sb thin films as anode for Na-ion batteries  

SciTech Connect

Cu2Sb thin films prepared by magnetron sputtering are evaluated as an anode material for Na-ion batteries. The starting material is composed of nanocrystallites with the desired tetragonal P4/nmm structure. The study of the reaction mechanism reveals the formation of an amorphous/nanocrystalline phase of composition close to Na3Sb as the final reaction product. The solid electrolyte interphase (SEI) material is mostly composed of carbonates (Na2CO3, NaCO3R). The Cu2Sb anode possesses moderate capacity retention with a reversible storage capacity (250 mAh/g) close to the theoretical value (323 mAh/g), an average reaction potential of around 0.55 V vs. Na/Na+, and a high rate performance (10 C-rate).

Baggetto, Loic [ORNL; Allcorn, Eric [University of Texas, Austin; Manthiram, Arumugam [University of Texas, Austin; Veith, Gabriel M [ORNL

2013-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


421

Initiated chemical vapor deposition of polymeric thin films : mechanism and applications  

E-Print Network (OSTI)

Initiated chemical vapor deposition (iCVD) is a novel technique for depositing polymeric thin films. It is able to deposit thin films of application-specific polymers in one step without using any solvents. Its uniqueness ...

Chan, Kelvin, Ph. D. Massachusetts Institute of Technology

2005-01-01T23:59:59.000Z

422

Characterization of LiNi?.?Mn?.?O? Thin Film Cathode Prepared by Pulsed Laser Deposition  

E-Print Network (OSTI)

LiNi?.?Mn?.?O? thin films have been grown by pulsed laser deposition (PLD) on stainless steel (SS) substrates. The crystallinity and structure of thin films were investigated by X-ray diffraction (XRD). Microstructure and ...

Xia, Hui

423

Orientation of MgO thin films on Si(001) prepared by pulsed laser deposition  

E-Print Network (OSTI)

Pulsed laser deposition method was employed to grow MgO thin films with preferred orientation on bare Si(100) and SiO?/Si(100) substrates. The orientation of MgO thin films was systematically investigated by varying ...

Zhu, Tie-Jun

424

The development of a thin-film rollforming process for pharmaceutical continuous manufacturing  

E-Print Network (OSTI)

In this thesis, a continuous rollforming process for the folding of thin-films was proposed and studied as a key step in the continuous manufacturing of pharmaceutical tablets. HPMC and PEG based polymeric thin-films were ...

Slaughter, Ryan (Ryan R.)

2013-01-01T23:59:59.000Z

425

Thin-film multichip module packages for high-end IBM servers  

Science Conference Proceedings (OSTI)

A new generation of multilevel thin-film packages has been developed for IBM high-end S/390® and AS/400® systems. Thin-film structures in these packages are nonplanar and can be fabricated by either pattern electroplating ...

E. D. Perfecto; A. P. Giri; R. R. Shields; H. P. Longworth; J. R. Pennacchia; M. P. Jeanneret

1998-09-01T23:59:59.000Z

426

New Approaches for Passivation of Crystalline and Amorphous Silicon: Cooperative Research and Development Final Report, CRADA Number CRD-09-351  

DOE Green Energy (OSTI)

New approaches of passivating crystalline, multicrystalline, and amorphous silicon will be explored. These will include the use of aqueous solution of KCN and a proprietary composition formulated by Mallinckrodt Baker, Inc. The surface passivation will be compared with that provided by an iodine-ethanol solution, and bulk passivation will be compared with that of H-passivation obtained by silicon nitride, in a fire-through process.

Sopori, B.

2012-09-01T23:59:59.000Z

427

Junction Evolution During Fabrication of CdS/CdTe Thin-film PV Solar Cells (Presentation)  

DOE Green Energy (OSTI)

Discussion of the formation of CdTe thin-film PV junctions and optimization of CdTe thin-film PV solar cells.

Gessert, T. A.

2010-09-01T23:59:59.000Z

428

Performance Test of Amorphous Silicon Modules in Different Climates - Year Four: Progress in Understanding Exposure History Stabilization Effects; Preprint  

DOE Green Energy (OSTI)

The four-year experiment involved three identical sets of thin-film a-Si modules from various manufacturers deployed outdoors simultaneously in three sites with distinct climates. Each PV module set spent a one-year period at each site before a final period at the original site where it was first deployed.

Ruther, R.; Montenegro, A. A.; del Cueto, J.; Rummel, S.; Anderberg, A.; von Roedern, B.; Tamizh-Mani, G.

2008-05-01T23:59:59.000Z

429

Development of FeNiMoB thin film materials for microfabricated magnetoelastic sensors  

Science Conference Proceedings (OSTI)

Metglas{sup TM} 2826MB foils of 25-30 {mu}m thickness with the composition of Fe{sub 40}Ni{sub 38}Mo{sub 4}B{sub 18} have been used for magnetoelastic sensors in various applications over many years. This work is directed at the investigation of {approx}3 {mu}m thick iron-nickel-molybdenum-boron (FeNiMoB) thin films that are intended for integrated microsystems. The films are deposited on Si substrate by co-sputtering of iron-nickel (FeNi), molybdenum (Mo), and boron (B) targets. The results show that dopants of Mo and B can significantly change the microstructure and magnetic properties of FeNi materials. When FeNi is doped with only Mo its crystal structure changes from polycrystalline to amorphous with the increase of dopant concentration; the transition point is found at about 10 at. % of Mo content. A significant change in anisotropic magnetic properties of FeNi is also observed as the Mo dopant level increases. The coercivity of FeNi films doped with Mo decreases to a value less than one third of the value without dopant. Doping the FeNi with B together with Mo considerably decreases the value of coercivity and the out-of-plane magnetic anisotropy properties, and it also greatly changes the microstructure of the material. In addition, doping B to FeNiMo remarkably reduces the remanence of the material. The film material that is fabricated using an optimized process is magnetically as soft as amorphous Metglas{sup TM} 2826MB with a coercivity of less than 40 Am{sup -1}. The findings of this study provide us a better understanding of the effects of the compositions and microstructure of FeNiMoB thin film materials on their magnetic properties.

Liang Cai; Gooneratne, Chinthaka; Cha, Dongkyu; Chen Long; Kosel, Jurgen [Computer Electrical and Mathematical Sciences and Engineering, King Abdullah University of Science and Technology, 4700 KAUST, Thuwal 23955 (Saudi Arabia); Gianchandani, Yogesh [Department of Electrical Engineering and Computer Science, 1301 Beal Ave., University of Michigan, Ann Arbor, Michigan 48109 (United States)

2012-12-01T23:59:59.000Z

430

Development of Y-doped ZnO Thin Films via Novel Ink Jet Printing ...  

Science Conference Proceedings (OSTI)

Synthesis and Characterization of Plasma Polymerized Thin Films Deposited from Benzene and Hexamethyldisiloxane Using (PECVD) Method · Synthesis and ...

431

Some a priori estimates for a singular evolution equation arising in thin-film dynamics  

Science Conference Proceedings (OSTI)

Keywords: finite extinction time, global Harnack inequality, ill-posed problem, porous-medium equation, thin-film dynamics

Stephen H. Davis; Emmanuele DiBenedetto; David J. Diller

1996-05-01T23:59:59.000Z

432

Lithium implantation at low temperature in silicon for sharp buried amorphous layer formation and defect engineering  

SciTech Connect

The crystalline-to-amorphous transformation induced by lithium ion implantation at low temperature has been investigated. The resulting damage structure and its thermal evolution have been studied by a combination of Rutherford backscattering spectroscopy channelling (RBS/C) and cross sectional transmission electron microscopy (XTEM). Lithium low-fluence implantation at liquid nitrogen temperature is shown to produce a three layers structure: an amorphous layer surrounded by two highly damaged layers. A thermal treatment at 400 Degree-Sign C leads to the formation of a sharp amorphous/crystalline interfacial transition and defect annihilation of the front heavily damaged layer. After 600 Degree-Sign C annealing, complete recrystallization takes place and no extended defects are left. Anomalous recrystallization rate is observed with different motion velocities of the a/c interfaces and is ascribed to lithium acting as a surfactant. Moreover, the sharp buried amorphous layer is shown to be an efficient sink for interstitials impeding interstitial supersaturation and {l_brace}311{r_brace} defect formation in case of subsequent neon implantation. This study shows that lithium implantation at liquid nitrogen temperature can be suitable to form a sharp buried amorphous layer with a well-defined crystalline front layer, thus having potential applications for defects engineering in the improvement of post-implantation layers quality and for shallow junction formation.

Oliviero, E. [CSNSM, CNRS-IN2P3-Universite Paris-Sud, Batiment 108, 91405 Orsay (France); David, M. L.; Beaufort, M. F.; Barbot, J. F. [Institut Pprime, CNRS-Universite de Poitiers-ENSMA, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962 Futuroscope-Chasseneuil Cedex (France); Fichtner, P. F. P. [Departamento de Metalurgia, Universidade Federal do Rio Grande do Sul, Av Bento Goncalves 9500, Caixa Postal 15051, 90035-190 Porto Alegre, RS (Brazil)

2013-02-28T23:59:59.000Z

433

Time-Resolved Magnetic Flux and AC-Current Distributions in Superconducting YBCO Thin Films and  

E-Print Network (OSTI)

Time-Resolved Magnetic Flux and AC-Current Distributions in Superconducting YBCO Thin Films magnetic field. We study the interaction behavior of YBCO thin films in an ac transport current and a dc the calibrated field profiles. The current density evolution in YBCO thin films is studied by TRMOI as a function

Lewis, Robert Michael

434

Design and fabrication of photonic crystal thin film photovoltaic cells Guillaume Gomarda,b  

E-Print Network (OSTI)

Design and fabrication of photonic crystal thin film photovoltaic cells Guillaume Gomarda,b , Ounsi of an absorbing planar photonic crystal within a thin film photovoltaic cell. The devices are based on a stack with large areas. Keywords: Photonic crystal, Photovoltaic solar cell, Thin film solar cell, Hydrogenated

Paris-Sud XI, Université de

435

Microwave plasma assisted supersonic gas jet deposition of thin film materials  

DOE Patents (OSTI)

An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures.

Schmitt, III, Jerome J. (New Haven, CT); Halpern, Bret L. (Bethany, CT)

1993-01-01T23:59:59.000Z

436

Identification, Characterization, and Implications of Shadow Degradation in Thin Film Solar Cells  

E-Print Network (OSTI)

that the SD is a generic reliability concern for all thin film PV technologies, however, in this paper we, USA Abstract-- We describe a comprehensive study of intrinsic reliability issue arising from partial reliability concern for thin film solar cell. Keywords ­ Thin film solar cells, voltage stress, performance

Alam, Muhammad A.

437

Thin Films and the Systems-Driven Approach  

DOE Green Energy (OSTI)

A systems-driven approach is used to discern tradeoffs between cost and efficiency improvements for various thin-film module technologies and designs. Prospects for reduced system cost via such strategies are enhanced as balance-of-systems costs decline, and some strategies are identified for greater research focus.

Zweibel, K.

2005-01-01T23:59:59.000Z

438

Method for double-sided processing of thin film transistors  

DOE Patents (OSTI)

This invention provides methods for fabricating thin film electronic devices with both front- and backside processing capabilities. Using these methods, high temperature processing steps may be carried out during both frontside and backside processing. The methods are well-suited for fabricating back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.

Yuan, Hao-Chih (Madison, WI); Wang, Guogong (Madison, WI); Eriksson, Mark A. (Madison, WI); Evans, Paul G. (Madison, WI); Lagally, Max G. (Madison, WI); Ma, Zhenqiang (Middleton, WI)

2008-04-08T23:59:59.000Z

439

Front and backside processed thin film electronic devices  

DOE Patents (OSTI)

This invention provides methods for fabricating thin film electronic devices with both front- and backside processing capabilities. Using these methods, high temperature processing steps may be carried out during both frontside and backside processing. The methods are well-suited for fabricating back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.

Yuan, Hao-Chih (Madison, WI); Wang, Guogong (Madison, WI); Eriksson, Mark A. (Madison, WI); Evans, Paul G. (Madison, WI); Lagally, Max G. (Madison, WI); Ma, Zhenqiang (Middleton, WI)

2010-10-12T23:59:59.000Z

440

Method of preparing thin film polymeric gel electrolytes  

DOE Patents (OSTI)

Novel hybrid thin film electrolyte, based on an organonitrile solvent system, which are compositionally stable, environmentally safe, can be produced efficiently in large quantity and which, because of their high conductivities .apprxeq.10.sup.-3 .OMEGA..sup.-1 cm.sup.-1 are useful as electrolytes for rechargeable lithium batteries.

Derzon, Dora K. (Albuquerque, NM); Arnold, Jr., Charles (Albuquerque, NM)

1997-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin-film amorphous silicon" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


441

ITO Thin Films by RF Sputtering for Ethanol Sensing  

Science Conference Proceedings (OSTI)

The sensor for detection of ethanol vapours using RF sputter deposited ITO thin film on glass and Si substrates is reported. The principle of operation is the change of resistance of ITO film on exposure to ethanol vapours. The films were annealed at ... Keywords: Indium Tin Oxide, RF sputtering, ethanol sensor

Sudhir Chandra; H. J. Pandya; A. L. Vyas

2010-07-01T23:59:59.000Z

442

Avalanches through windows: Multiscale visualization in magnetic thin films  

E-Print Network (OSTI)

Avalanches through windows: Multiscale visualization in magnetic thin films Alessandro Magni dynamics, but are strongly dependent on the size of the windows chosen. Here we investigate how to properly sub-window of the entire sample. Usually, windows of varying sizes are used, and the distributions

Sethna, James P.

443

Front and backside processed thin film electronic devices  

Science Conference Proceedings (OSTI)

This invention provides thin film devices that have been processed on their front- and backside. The devices include an active layer that is sufficiently thin to be mechanically flexible. Examples of the devices include back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.

Evans, Paul G. (Madison, WI); Lagally, Max G. (Madison, WI); Ma, Zhenqiang (Middleton, WI); Yuan, Hao-Chih (Lakewood, CO); Wang, Guogong (Madison, WI); Eriksson, Mark A. (Madison, WI)

2012-01-03T23:59:59.000Z

444

Perovskite phase thin films and method of making  

DOE Patents (OSTI)

The present invention comprises perovskite-phase thin films, of the general formula A.sub.x B.sub.y O.sub.3 on a substrate, wherein A is selected from beryllium, magnesium, calcium, strontium, and barium or a combination thereof; B is selected from niobium and tantalum or a combination thereof; and x and y are mole fractions between approximately 0.8 and 1.2. More particularly, A is strontium or barium or a combination thereof and B is niobium or tantalum or a combination thereof. Also provided is a method of making a perovskite-phase thin film, comprising combining at least one element-A-containing compound, wherein A is selected from beryllium, magnesium, calcium, strontium or barium, with at least one element-B-containing compound, wherein B niobium or tantalum, to form a solution; adding a solvent to said solution to form another solution; spin-coating the solution onto a substrate to form a thin film; and heating the film to form the perovskite-phase thin film.

Boyle, Timothy J. (Albuquerque, NM); Rodriguez, Mark A. (Albuquerque, NM)

2000-01-01T23:59:59.000Z

445

Electroplating of Cu(Ag) thin films for interconnect applications  

Science Conference Proceedings (OSTI)

Electromigration effects in interconnect metallizations cause a need for materials with superior resistance against electromigration failure but with adequate electrical properties. In principle, Cu(Ag) alloys are potential candidates to become an interconnect ... Keywords: Copper-silver alloy thin film, Electrochemical deposition, Interconnect material

S. Strehle; S. Menzel; J. W. Bartha; K. Wetzig

2010-02-01T23:59:59.000Z

446

Nanostructured thin films for solid oxide fuel cells  

E-Print Network (OSTI)

The goals of this work were to synthesize high performance perovskite based thin film solid oxide fuel cell (TF-SOFC) cathodes by pulsed laser deposition (PLD), to study the structural, electrical and electrochemical properties of these cathodes and to establish structure-property relations for these cathodes in order to further improve their properties and design new structures. Nanostructured cathode thin films with vertically-aligned nanopores (VANP) were processed using PLD. These VANP structures enhance the oxygen-gas phase diffusivity, thus improve the overall TF-SOFC performance. La0.5Sr0.5CoO3 (LSCO) and La0.4Sr0.6Co0.8Fe0.2O3 (LSCFO) were deposited on various substrates (YSZ, Si and pressed Ce0.9Gd0.1O1.95 (CGO) disks). Microstructures and properties of the nanostructured cathodes were characterized by transmission electron microscope (TEM), high resolution TEM (HRTEM), scanning electron microscope (SEM) and electrochemical impedance spectroscopy (EIS) measurements. A thin layer of vertically-aligned nanocomposite (VAN) structure was deposited in between the CGO electrolyte and the thin film LSCO cathode layer for TF-SOFCs. The VAN structure consists of the electrolyte and the cathode materials in the composition of (CGO) 0.5 (LSCO) 0.5. The self-assembled VAN nanostructures contain highly ordered alternating vertical columns formed through a one-step thin film deposition using a PLD technique. These VAN structures significantly increase the interface area between the electrolyte and the cathode as well as the area of active triple phase boundary (TPB), thus improving the overall TF-SOFC performance at low temperatures, as low as 400oC, demonstrated by EIS measurements. In addition, the binary VAN interlayer could act as the transition layer that improves the adhesion and relieves the thermal stress and lattice strain between the cathode and the electrolyte. The microstructural properties and growth mechanisms of CGO thin film prepared by PLD technique were investigated. Thin film CGO electrolytes with different grain sizes and crystal structures were prepared on single crystal YSZ substrates under different deposition conditions. The effect of the deposition conditions such as substrate temperature and laser ablation energy on the microstructural properties of these films are examined using XRD, TEM, SEM, and optical microscope. CGO thin film deposited above 500 ºC starts to show epitaxial growth on YSZ substrates. The present study suggests that substrate temperature significantly influences the microstructure of the films especially film grain size.

Yoon, Jongsik

2008-12-01T23:59:59.000Z

447

Synthesis, structural and electrochemical properties of electron beam evaporated V{sub 2}O{sub 5} thin films  

Science Conference Proceedings (OSTI)

Vanadium pentoxide is one of the most promising cathode materials because it offers high energy density, low cost, low toxicity over the other cathode materials. Its layered and open structure makes this material in thin film form well suited for electro-chemical insertion reactions with the Li ions. In the present investigation, V{sub 2}O{sub 5} thin films have been prepared by electron beam evaporation technique on gold coated silicon substrates maintained at a substrate temperature of 250 Degree-Sign C in an oxygen partial pressure of 2 Multiplication-Sign 10{sup -4} mbar. The XRD patterns exhibited three predominant diffraction peaks corresponding to (200) (001) and (400) planes of orthorhombic phase of V{sub 2}O{sub 5} with P{sub mnm} space group. The electrochemical characteristics of V{sub 2}O{sub 5} thin films with thickness of 600 nm were examined in non-aqueous region. The film exhibited step wise discharge with two plateaus. The as-deposited film delivered a discharge capacity of 70 {mu}Ah/(cm{sup 2}-{mu}m) at a current density of 30 {mu}A/cm{sup 2}. Annealing of these films at 450 Degree-Sign C exhibited a better discharge capacity of 90 {mu}Ah/(cm{sup 2}-{mu}m).

Hussain, O. M.; Rosaiah, P. [Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati-517 502 (India)

2012-06-25T23:59:59.000Z

448

Browse wiki | Open Energy Information  

Open Energy Info (EERE)

modules + , distributes in Europe through Reinecke + Pohl. + , Chachoengsao + , Thailand + Place Chachoengsao, Thailand + Product Manufacturer of thin-film amorphous silicon...

449

Technical evaluation of a dual-junction same-band-gap amorphous silicon photovoltaic system at NREL  

DOE Green Energy (OSTI)

On December 7, 1992, a 1.8-kW{sub ac} utility-interconnect photovoltaic (PV) system using amorphous silicon modules was brought on-line at the National Renewable Energy Laboratory`s photovoltaic test site. This system was deployed to conduct an in-situ technical evaluation of the PV array (in a high voltage configuration) and system performance and reliability in a utility-interconnect application. The system is unique due to the installation of construction-grade insulation on the back of each PV module. This use of insulation is an attempt to levelize the annual array power output by elevating the operating temperature of the modules. This paper presents array and system performance data. Emphasis is placed on quantifying the effects of individual losses as well as seasonal changes on PV array and system performance.

Strand, T.; Mrig, L.; Hansen, R.; Emery, K.

1994-12-01T23:59:59.000Z

450

Research on stable, high-efficiency amorphous silicon multijunction modules. Semiannual subcontract report, 1 January 1992--30 June 1992  

DOE Green Energy (OSTI)

This report describes research on semiconductor and non-semiconductor materials to enhance the performance of multi-band-gap, multijunction panel with an area greater than 900 cm{sup 2} by 1992. Double-junction and triple-junction cells are mode on a Ag/ZnO back reflector deposited on stainless steel substrates. An a-SiGe alloy is used for the i-layer in the bottom and the middle cells; the top cell uses an amorphous silicon alloy. After the evaporation of an antireflection coating, silver grids and bus bars are put on the top surface and the panel is encapsulated in an ethylene vinyl acetate (EVA)/Tefzel structure to make a 1-ft{sup 2} monolithic module.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1992-09-01T23:59:59.000Z

451

Optimization of transparent and reflecting electrodes for amorphous silicon solar cells. Annual subcontract report, April 1, 1994--March 31, 1995  

DOE Green Energy (OSTI)

Transparent and reflecting electrodes are important parts of the structure of amorphous silicon solar cells. We report improved methods for depositing zinc oxide, deposition of tin nitride as a potential reflection-enhancing diffusion barrier between the a-Si and back metal electrodes. Highly conductive and transparent fluorine-doped zinc oxide was successfully produced on small areas by atmospheric pressure CVD from a less hazardous zinc precursor, zinc acetylacetonate. The optical properties measured for tin nitride showed that the back-reflection would be decreased if tin nitride were used instead of zinc oxide as a barrier layer over silver on aluminum. Niobium-doped titanium dioxide was produced with high enough electrical conductivity so that normal voltages and fill factors were obtained for a-Si cells made on it.

Gordon, R.G. [Harvard Univ., Cambridge, MA (United States)

1995-10-01T23:59:59.000Z

452

Research on stable, high-efficiency amorphous silicon multijunction modules. Final subcontract report, 1 January 1991--31 August 1994  

DOE Green Energy (OSTI)

The principal objective of this program is to conduct research on semiconductor materials and non-semiconductor materials to enhance the performance of multibandgap, multijunction, large-area amorphous silicon-based alloy modules. The goal for this program is to demonstrate stabilized module efficiency of 12% for multijunction modules of area greater than 900 cm{sup 2}. Double-junction and triple-junction cells are made on Ag/ZnO back reflector deposited on stainless steel substrates. The top cell uses a-Si alloy; a-SiGe alloy is used for the i layer in the middle and the bottom cells. After evaporation of antireflection coating, silver grids and bus bars are put on the top surface, and the panel is encapsulated in an ethylene vinyl acetate (EVA)/Tefzel structure to make a one-square-foot monolithic module.

Guha, S. [United Solar Systems Corp., Troy, MI (United States)

1994-10-01T23:59:59.000Z

453

Plasma-assisted CVD of fluorinated, hydrogenated amorphous silicon. Final technical report, September 15, 1979-September 15, 1980  

DOE Green Energy (OSTI)

During the past year, approximately 300 large-area (400 cm/sup 2/) PIN hydrogenated amorphous silicon (a-Si:H) solar cells were fabricated and tested. a-Si:H PIN cells which were plasma deposited at 200/sup 0/ to 350/sup 0/ were found to have high internal currents (13mA/cm/sup 2/), whereas those which were deposited by CVD at 500/sup 0/ to 650/sup 0/C had low internal currents. When corrected for optical losses in the top electrode, the internal quantum efficiency vs wavelength for the PIN cells indicated a peak value above 80% at about 525nm, which decreased monotonically to zero at about 725 nm. When the published values of RCA and EXXON were corrected similarly for optical loss, nearly identical values of internal quantum efficiencies were found. Calculations based on a model proposed by Cody et al of EXXON indicated that the depletion width was less than 0.4 microns for all PIN cells, thereby limiting junction efficiency in the red portion of the solar spectrum since the 1/e photon range exceeds this value. A novel inverted NIP cell was tested and found to have its maximum quantum response shifted to 625 nm. Also, an amorphous boron (a-B) layer deposited on a-Si:H to form a PIN heterojunction improved blue response and Voc. A combination of the red-responsive cells and the a-B heterojunction cells could raise efficiency to 8%.

Coleman, J. H.; Hammes, J. P.; Wiesmann, H. J.

1980-01-01T23:59:59.000Z

454

Processing and Characterization of P-Type Doped Zinc Oxide Thin Films  

E-Print Network (OSTI)

Applications of zinc oxide (ZnO) for optoelectronic devices, including light emitting diodes, semiconductor lasers, and solar cells have not yet been realized due to the lack of high-quality p-type ZnO. In the research presented herein, pulsed laser deposition is employed to grow Ag-doped ZnO thin films, which are characterized in an attempt to understand the ability of Ag to act as a p-type dopant. By correlating the effects of the substrate temperature, oxygen pressure, and laser energy on the electrical and microstructural properties of Ag-doped ZnO films grown on c-cut sapphire substrates, p-type conductivity is achieved under elevated substrate temperatures. Characteristic stacking fault features have been continuously observed by transmission electron microscopy in all of the p-type films. Photoluminescence studies on n-type and p-type Ag-doped ZnO thin films demonstrate the role of stacking faults in determining the conductivity of the films. Exciton emission attributed to basal plane stacking faults suggests that the acceptor impurities are localized nearby the stacking faults in the n-type films. The photoluminescence investigation provides a correlation between microstructural characteristics and electrical properties of Ag- doped ZnO thin films; a link that enables further understanding of the doping nature of Ag impurities in ZnO. Under optimized deposition conditions, various substrates are investigated as potential candidates for ZnO thin film growth, including r -cut sapphire, quartz, and amorphous glass. Electrical results indicated that despite narrow conditions for obtaining p-type conductivity at a given substrate temperature, flexibility in substrate choice enables improved electrical properties. In parallel, N+-ion implantation at elevated temperatures is explored as an alternative approach to achieve p-type ZnO. The ion implantation fluence and temperature have been optimized to achieve p-type conductivity. Transmission electron microscopy reveals that characteristic stacking fault features are present throughout the p-type films, however in n-type N-doped films high-density defect clusters are observed. These results suggest that the temperature under which ion implantation is performed plays a critical role in determining the amount of dynamic defect re- combination that can take place, as well as defect cluster formation processes. Ion implantation at elevated temperatures is shown to be an effective method to introduce increased concentrations of p-type N dopants while reducing the amount of stable post-implantation disorder. Finally, the fabrication and properties of p-type Ag-doped ZnO/n-type ZnO and p-type N-doped ZnO/n-type ZnO thin film junctions were reported. For the N-doped sample, a rectifying behavior was observed in the I-V curve, consistent with N-doped ZnO being p-type and forming a p-n junction. The turn-on voltage of the device was ?2.3 V under forward bias. The Ag-doped samples did not result in rectifying behavior as a result of conversion of the p-type layer to n-type behavior under the n- type layer deposition conditions. The systematic studies in this dissertation provide possible routes to grow p-type Ag-doped ZnO films and in-situ thermal activation of N-implanted dopant ions, to overcome the growth temperature limits, and to push one step closer to the future integration of ZnO-based devices.

Myers, Michelle Anne

2013-05-01T23:59:59.000Z

455

Institute of Photo Electronic Thin Film Devices and Technology of Nankai  

Open Energy Info (EERE)

Electronic Thin Film Devices and Technology of Nankai Electronic Thin Film Devices and Technology of Nankai University Jump to: navigation, search Name Institute of Photo-Electronic Thin Film Devices and Technology of Nankai University Place Tianjin Municipality, China Zip 300071 Sector Solar Product A thin-film solar cell research institute in China. References Institute of Photo-Electronic Thin Film Devices and Technology of Nankai University[1] LinkedIn Connections CrunchBase Profile No CrunchBase profile. Create one now! This article is a stub. You can help OpenEI by expanding it. Institute of Photo-Electronic Thin Film Devices and Technology of Nankai University is a company located in Tianjin Municipality, China . References ↑ "Institute of Photo-Electronic Thin Film Devices and Technology of Nankai University"

456

Outdoor Performance of a Thin-Film Gallium-Arsenide Photovoltaic Module  

SciTech Connect

We deployed a 855 cm2 thin-film, single-junction gallium arsenide (GaAs) photovoltaic (PV) module outdoors. Due to its fundamentally different cell technology compared to silicon (Si), the module responds differently to outdoor conditions. On average during the test, the GaAs module produced more power when its temperature was higher. We show that its maximum-power temperature coefficient, while actually negative, is several times smaller in magnitude than that of a Si module used for comparison. The positive correlation of power with temperature in GaAs is due to temperature-correlated changes in the incident spectrum. We show that a simple correction based on precipitable water vapor (PWV) brings the photocurrent temperature coefficient into agreement with that measured by other methods and predicted by theory. The low operating temperature and small temperature coefficient of GaAs give it an energy production advantage in warm weather.

Silverman, T. J.; Deceglie, M. G.; Marion, B.; Cowley, S.; Kayes, B.; Kurtz, S.

2013-06-01T23:59:59.000Z

457

Co-sputtering yttrium into hafnium oxide thin films to produce ferroelectric properties  

Science Conference Proceedings (OSTI)

Thin film capacitors were fabricated by sputtering TiN-Y doped HfO{sub 2}-TiN stacks on silicon substrates. Yttrium was incorporated into the HfO{sub 2} layers by simultaneously sputtering from Y{sub 2}O{sub 3} and HfO{sub 2} sources. Electric polarization and relative permittivity measurements yield distinct ferroelectric properties as a result of low yttrium dopant concentrations in the range of 0.9-1.9 mol. %. Grazing incidence x-ray diffraction measurements show the formation of an orthorhombic phase in this range. Compared to atomic layer deposition films, the highest remanent polarization and the highest relative permittivity were obtained at significantly lower doping concentrations in these sputtered films.

Olsen, T. [NaMLab gGmbH, 01187 Dresden (Germany); Department of Electrical and Computer Engineering, University of Alberta, Edmonton T6G 2V4 (Canada); Schroeder, U.; Mueller, S.; Krause, A.; Martin, D.; Singh, A. [NaMLab gGmbH, 01187 Dresden (Germany); Mueller, J. [Fraunhofer CNT, 01099 Dresden (Germany); Geidel, M. [Institute of Semiconductors and Microsystems, Technische Universitaet Dresden, 01062 Dresden (Germany); Mikolajick, T. [NaMLab gGmbH, 01187 Dresden (Germany); Institute of Semiconductors and Microsystems, Technische Universitaet Dresden, 01062 Dresden (Germany)

2012-08-20T23:59:59.000Z

458

Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering  

SciTech Connect

The electrical and optical properties of Ta{sub x}Si{sub y}N{sub z} thin films deposited by