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Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


1

Thin Film Deposition Method for Sensor Manufacturing  

Scientists at Los Alamos National Laboratory (LANL) have developed an innovative method for gas sensor manufacturing using a thin film deposition. The thin film requires very little material and can be applied in high throughput applications.

2

Thin Film Deposition and Processing  

Science Conference Proceedings (OSTI)

... Applications: Tube 1 (T1), open for future upgrade. Silicon Nitride Deposition (Tube 2): Low Stress recipe. Stoichiometric recipe. ...

2013-09-17T23:59:59.000Z

3

Apparatus for laser assisted thin film deposition  

DOE Patents (OSTI)

A pulsed laser deposition apparatus uses fiber optics to deliver visible output beams. One or more optical fibers are coupled to one or more laser sources, and delivers visible output beams to a single chamber, to multiple targets in the chamber or to multiple chambers. The laser can run uninterrupted if one of the deposition chambers ceases to operate because other chambers can continue their laser deposition processes. The laser source can be positioned at a remote location relative to the deposition chamber. The use of fiber optics permits multi-plexing. A pulsed visible laser beam is directed at a generally non-perpendicular angle upon the target in the chamber, generating a plume of ions and energetic neutral species. A portion of the plume is deposited on a substrate as a thin film. A pulsed visible output beam with a high pulse repetition frequency is used. The high pulse repetition frequency is greater than 500 Hz, and more preferably, greater than about 1000 Hz. Diamond-like-carbon (DLC) is one of the thin films produced using the apparatus.

Warner, Bruce E. (Pleasanton, CA); McLean, II, William (Oakland, CA)

1996-01-01T23:59:59.000Z

4

Heteroepitaxial Si Thin Films Deposited on Flexible Copper ...  

Science Conference Proceedings (OSTI)

Presentation Title, Heteroepitaxial Si Thin Films Deposited on Flexible Copper Substrates for Solar Photovoltaics. Author(s), Daniela Florentina Bogorin, Lee ...

5

Chemical vapor deposition of organosilicon and sacrificial polymer thin films  

E-Print Network (OSTI)

Chemical vapor deposition (CVD) produced films for a wide array of applications from a variety of organosilicon and organic precursors. The structure and properties of thin films were controlled by varying processing ...

Casserly, Thomas Bryan

2005-01-01T23:59:59.000Z

6

Initiated chemical vapor deposition of functional polyacrylic thin films  

E-Print Network (OSTI)

Initiated chemical vapor deposition (iCVD) was explored as a novel method for synthesis of functional polyacrylic thin films. The process introduces a peroxide initiator, which can be decomposed at low temperatures (<200?C) ...

Mao, Yu, 1975-

2005-01-01T23:59:59.000Z

7

Ultrashort pulse laser deposition of thin films  

DOE Patents (OSTI)

Short pulse PLD is a viable technique of producing high quality films with properties very close to that of crystalline diamond. The plasma generated using femtosecond lasers is composed of single atom ions with no clusters producing films with high Sp.sup.3 /Sp.sup.2 ratios. Using a high average power femtosecond laser system, the present invention dramatically increases deposition rates to up to 25 .mu.m/hr (which exceeds many CVD processes) while growing particulate-free films. In the present invention, deposition rates is a function of laser wavelength, laser fluence, laser spot size, and target/substrate separation. The relevant laser parameters are shown to ensure particulate-free growth, and characterizations of the films grown are made using several diagnostic techniques including electron energy loss spectroscopy (EELS) and Raman spectroscopy.

Perry, Michael D. (Livermore, CA); Banks, Paul S. (Livermore, CA); Stuart, Brent C. (Fremont, CA)

2002-01-01T23:59:59.000Z

8

Initiated chemical vapor deposition of polymeric thin films : mechanism and applications  

E-Print Network (OSTI)

Initiated chemical vapor deposition (iCVD) is a novel technique for depositing polymeric thin films. It is able to deposit thin films of application-specific polymers in one step without using any solvents. Its uniqueness ...

Chan, Kelvin, Ph. D. Massachusetts Institute of Technology

2005-01-01T23:59:59.000Z

9

Sputter deposition for multi-component thin films  

DOE Patents (OSTI)

Ion beam sputter-induced deposition using a single ion beam and a multicomponent target is capable of reproducibly producing thin films of arbitrary composition, including those which are close to stoichiometry. Using a quartz crystal deposition monitor and a computer controlled, well-focused ion beam, this sputter-deposition approach is capable of producing metal oxide superconductors and semiconductors of the superlattice type such as GaAs-AlGaAs as well as layered metal/oxide/semiconductor/superconductor structures. By programming the dwell time for each target according to the known sputtering yield and desired layer thickness for each material, it is possible to deposit composite films from a well-controlled sub-monolayer up to thicknesses determined only by the available deposition time. In one embodiment, an ion beam is sequentially directed via a set of X-Y electrostatic deflection plates onto three or more different element or compound targets which are constituents of the desired film. In another embodiment, the ion beam is directed through an aperture in the deposition plate and is displaced under computer control to provide a high degree of control over the deposited layer. In yet another embodiment, a single fixed ion beam is directed onto a plurality of sputter targets in a sequential manner where the targets are each moved in alignment with the beam under computer control in forming a multilayer thin film. This controlled sputter-deposition approach may also be used with laser and electron beams.

Krauss, Alan R. (Plainfield, IL); Auciello, Orlando (Cary, NC)

1990-01-01T23:59:59.000Z

10

Pulsed laser deposition of ITO thin films and their characteristics  

SciTech Connect

The indium tin oxide (ITO) thin films are grown on quartz glass substrates by the pulsed laser deposition method. The structural, electrical, and optical properties of ITO films are studied as a function of the substrate temperature, the oxygen pressure in the vacuum chamber, and the Sn concentration in the target. The transmittance of grown ITO films in the visible spectral region exceeds 85%. The minimum value of resistivity 1.79 Multiplication-Sign 10{sup -4} {Omega} cm has been achieved in the ITO films with content of Sn 5 at %.

Zuev, D. A., E-mail: zuewda@yandex.ru; Lotin, A. A.; Novodvorsky, O. A.; Lebedev, F. V.; Khramova, O. D. [Russian Academy of Sciences, Institute on Laser and Information Technologies (Russian Federation); Petuhov, I. A.; Putilin, Ph. N.; Shatohin, A. N.; Rumyanzeva, M. N.; Gaskov, A. M. [Moscow State University, Faculty of Chemistry (Russian Federation)

2012-03-15T23:59:59.000Z

11

Experimental thin film deposition and surface analysis techniques  

DOE Green Energy (OSTI)

An attempt has been made to present some of the thin-film deposition and surface analysis techniques which may be useful in growing superionic conducting materials. Emphasis is made on the importance of being careful in selecting process parameters and materials in order to produce films with properties outlined in this article. Also, special care should be given to proper consideration of grain boundary effects.

Collins, W.E.; Rambabu, B.

1986-01-01T23:59:59.000Z

12

Substrates suitable for deposition of superconducting thin films  

DOE Patents (OSTI)

A superconducting system for the lossless transmission of electrical current comprising a thin film of superconducting material Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x epitaxially deposited upon a KTaO.sub.3 substrate. The KTaO.sub.3 is an improved substrate over those of the prior art since the it exhibits small lattice constant mismatch and does not chemically react with the superconducting film.

Feenstra, Roeland (Oak Ridge, TN); Boatner, Lynn A. (Oak Ridge, TN)

1993-01-01T23:59:59.000Z

13

Microwave plasma assisted supersonic gas jet deposition of thin film materials  

DOE Patents (OSTI)

An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures.

Schmitt, III, Jerome J. (New Haven, CT); Halpern, Bret L. (Bethany, CT)

1993-01-01T23:59:59.000Z

14

Low Temperature Chemical Vapor Deposition Of Thin Film Magnets  

DOE Patents (OSTI)

A thin-film magnet formed from a gas-phase reaction of tetracyanoetheylene (TCNE) OR (TCNQ), 7,7,8,8-tetracyano-P-quinodimethane, and a vanadium-containing compound such as vanadium hexcarbonyl (V(CO).sub.6) and bis(benzene)vanalium (V(C.sub.6 H.sub.6).sub.2) and a process of forming a magnetic thin film upon at least one substrate by chemical vapor deposition (CVD) at a process temperature not exceeding approximately 90.degree. C. and in the absence of a solvent. The magnetic thin film is particularly suitable for being disposed upon rigid or flexible substrates at temperatures in the range of 40.degree. C. and 70.degree. C. The present invention exhibits air-stable characteristics and qualities and is particularly suitable for providing being disposed upon a wide variety of substrates.

Miller, Joel S. (Salt Lake City, UT); Pokhodnya, Kostyantyn I. (Salt Lake City, UT)

2003-12-09T23:59:59.000Z

15

Characterization of LiNi?.?Mn?.?O? Thin Film Cathode Prepared by Pulsed Laser Deposition  

E-Print Network (OSTI)

LiNi?.?Mn?.?O? thin films have been grown by pulsed laser deposition (PLD) on stainless steel (SS) substrates. The crystallinity and structure of thin films were investigated by X-ray diffraction (XRD). Microstructure and ...

Xia, Hui

16

Orientation of MgO thin films on Si(001) prepared by pulsed laser deposition  

E-Print Network (OSTI)

Pulsed laser deposition method was employed to grow MgO thin films with preferred orientation on bare Si(100) and SiO?/Si(100) substrates. The orientation of MgO thin films was systematically investigated by varying ...

Zhu, Tie-Jun

17

Chemical vapor deposition thin films as biopassivation coatings and directly patternable dielectrics  

E-Print Network (OSTI)

Organosilicon thin films deposited by pulsed plasma-enhanced chemical vapor deposition (PPECVD) and hot-filament chemical vapor deposition (HFCVD) were investigated as potential biopassivation coatings for neural probes. ...

Pryce Lewis, Hilton G. (Hilton Gavin), 1973-

2001-01-01T23:59:59.000Z

18

Microwave plasma assisted supersonic gas jet deposition of thin film materials  

DOE Patents (OSTI)

An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures. 5 figures.

Schmitt, J.J. III; Halpern, B.L.

1993-10-26T23:59:59.000Z

19

Solar Control Thin Films Laboratory  

NLE Websites -- All DOE Office Websites (Extended Search)

Sputtering equipment Solar Control Thin Films Laboratory The Solar Control Thin Films lab develops novel thin film coatings, deposition technologies, and device systems for...

20

Electron Beam Evaporator Systems for Thin Film Deposition  

Science Conference Proceedings (OSTI)

The Thin Film and Nanostructure Processing Group has two high-vacuum, electron beam evaporator systems for fabrication of single and multilayer ...

2012-10-23T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


21

Bi-based Piezoelectric Thin Films via Chemical Solution Deposition  

Science Conference Proceedings (OSTI)

BNT-BKT-BMgT thin films showed very promising piezoelectric response with ... Chemical Quantification of Oxide Interfaces Using Energy-dispersive X-ray ...

22

Formation of thin-film high T/sub c/ superconductors by metalorganic deposition  

Science Conference Proceedings (OSTI)

Metalorganic deposition (MOD) is a nonvacuum method of thin-film deposition which allows easy alteration of chemical components and is compatible with thin-film processing. We report the preparation of thin-film superconductors by MOD. Rutherford backscattering spectrometry was used to determine film compositions and thicknesses. Films, approximately 500 nm thick, of YBa/sub 2/Cu/sub 4/O/sub z/ (z undetermined) were deposited on single-crystal SrTiO/sub 3/. A superconducting onset temperature of 90 K was measured with 37 K the zero resistance temperature. Scanning electron microscopy revealed grain sizes approximately 250 nm in diameter.

Hamdi, A.H.; Mantese, J.V.; Micheli, A.L.; Laugal, R.C.O.; Dungan, D.F.; Zhang, Z.H.; Padmanabhan, K.R.

1987-12-21T23:59:59.000Z

23

Facile synthesis of porous-structured nickel oxide thin film by pulsed laser deposition  

Science Conference Proceedings (OSTI)

Porous-structured nickel oxide (PsNiO) was obtained through the oxidization of a nickel thin film. The nickel thin film was deposited using the pulsed laser deposition (PLD) method on a nickel foil as a substrate. The results show uniform PsNiO after ...

Siamak Pilban Jahromi; Nay Ming Huang; Ahmad Kamalianfar; Hong Ngee Lim; Muhamad Rasat Muhamad; Ramin Yousefi

2012-01-01T23:59:59.000Z

24

Matrix-assisted pulsed laser thin film deposition by using Nd: YAG laser  

Science Conference Proceedings (OSTI)

Matrix-Assisted Pulsed Laser Evaporation (MAPLE) is a deposition technique, developed from Pulsed Laser Deposition (PLD) especially well suited for producing organic/polymeric thin films, which can take advantage from using Nd:YAG laser. Depending on ...

Francesco Bloisi; Mario Barra; Antonio Cassinese; Luciano Rosario Maria Vicari

2012-01-01T23:59:59.000Z

25

Optical Properties of Zn(O,S) Thin Films Deposited by RF Sputtering, Atomic Layer Deposition, and Chemical Bath Deposition: Preprint  

DOE Green Energy (OSTI)

Zn(O,S) thin films 27 - 100 nm thick were deposited on glass or Cu(InxGa1-x)Se2/Molybdenum/glass with RF sputtering, atomic layer deposition, and chemical bath deposition.

Li, J.; Glynn, S.; Christensen, S.; Mann, J.; To, B.; Ramanathan, K.; Noufi, R.; Furtak, T. E.; Levi, D.

2012-06-01T23:59:59.000Z

26

Dry-transfer of chemical vapour deposited nanocarbon thin films  

E-Print Network (OSTI)

equipment and measurement I thank Dr Xiulia Xu, high resolution transmission electron microscopy - Dr Caterina Ducati, Mr Sai Shivareddy and Dr Jamie Warner (Oxford University) and assistance with supercapacitor manufacturing and measurement - Mr (soon... that these thin films behave, in a macroscopic sense, similar to traditional c-axis conductive graphite and deviate toward tunnel dominated conduction with increasing degrees of network disorder. Various MWCNT-based thin film field emitters were considered...

Cole, Matthew Thomas

2012-01-10T23:59:59.000Z

27

ThinFilms  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin Films Thin Films Manufacturing Technologies The Thin Film laboratory provides a variety of vapor deposition processes and facilities for cooperative research and development. Available capabilities include electron beam evaporation, sputter deposition, reactive deposi- tion processes, atomic layer deposition (ALD) and specialized techniques such as focused ion beam induced chemical vapor deposition. Equipment can be reconfigured for prototyping, or it can be dedicated to long-term research, development and manufacturing. Most sputter and evaporative deposition systems are capable of depositing multiple materials. Deposition capabilities and expertise * Deposition of a large variety of thin film mate- rials * Multiple sputter deposition systems - Capable of depositing four materials in a

28

Hot-Wire Deposition of Hydrogenated Nanocrystalline SiGe Films for Thin-Film Si Based Solar Cells  

E-Print Network (OSTI)

Hot-Wire Deposition of Hydrogenated Nanocrystalline SiGe Films for Thin-Film Si Based Solar Cells bandgap absorber in an a-Si/a-SiGe/nc-SiGe(nc- Si) triple-junction solar cell due to its higher optical investigations of nc-SiGe:H thin films made by hot-wire chemical vapor deposition (HWCVD) with a coil

Deng, Xunming

29

Femtosecond transient absorption studies in cadmium selenide nanocrystal thin films prepared by chemical bath deposition method  

Science Conference Proceedings (OSTI)

Dynamics of photo-excited carrier relaxation processes in cadmium selenide nanocrystal thin films prepared by chemical bath deposition method have been studied by nondegenerate femtosecond transient pump-probe spectroscopy. The carriers were generated ...

M. C. Rath; J. A. Mondal; D. K. Palit; T. Mukherjee; H. N. Ghosh

2007-01-01T23:59:59.000Z

30

Triode electron bombardment evaporation source for ultrahigh vacuum thin film deposition  

Science Conference Proceedings (OSTI)

A new electron bombardment evaporation source for ultrahigh vacuum (UHV) thin film deposition is presented. It is based on an original electrodes configuration (modeled on that of a vacuum triode) featuring

R. Verucchi; S. Nannarone

2000-01-01T23:59:59.000Z

31

Process for thin film deposition of cadmium sulfide  

DOE Patents (OSTI)

The present invention teaches a process for depositing layers of cadmium sulfide. The process includes depositing a layer of cadmium oxide by spray pyrolysis of a cadmium salt in an aqueous or organic solvent. The oxide film is then converted into cadmium sulfide by thermal ion exchange of the O.sup.-2 for S.sup.-2 by annealing the oxide layer in gaseous sulfur at elevated temperatures.

Muruska, H. Paul (East Windsor, NJ); Sansregret, Joseph L. (Scotch Plains, NJ); Young, Archie R. (Montclair, NJ)

1982-01-01T23:59:59.000Z

32

Evaporation system and method for gas jet deposition of thin film materials  

DOE Patents (OSTI)

A method and apparatus for depositing thin films of materials such as metals, oxides and nitrides at low temperature relies on a supersonic free jet of inert carrier gas to transport vapor species generated from an evaporation source to the surface of a substrate. Film deposition vapors are generated from solid film precursor materials, including those in the form of wires or powders. The vapor from these sources is carried downstream in a low pressure supersonic jet of inert gas to the surface of a substrate where the vapors deposit to form a thin film. A reactant gas can be introduced into the gas jet to form a reaction product with the evaporated material. The substrate can be moved from the gas jet past a gas jet containing a reactant gas in which a discharge has been generated, the speed of movement being sufficient to form a thin film which is chemically composed of the evaporated material and reactant gases.

Schmitt, Jerome J. (New Haven, CT); Halpern, Bret L. (Bethany, CT)

1994-01-01T23:59:59.000Z

33

Bi-Sr-Ca-Cu-O thin films grown by flash evaporation and pulsed laser deposition  

E-Print Network (OSTI)

Bismuth-Strontium-Calcium-Copper-Oxide (BSCCO) compounds are an important family of compounds that have one of the highest transition temperatures among all high-temperature superconductors. The compound is known to exist in three distinct phases, commonly referred to as the 2201, 2212 and 2223 phases. Of these three phases, the 2212 and 2223 phases are the most important, as their transition temperature is higher than the boiling point of liquid nitrogen. It is desirable to produce the compound in thin film form, as the bulk samples are normally polycrystalline. This thesis compares thin films produced by two techniques for depositing BSCCO in order to understand the effect of various processing parameters on the final quality of the thin films. Thin films were grown by flash evaporation at Texas A&M University, and by pulsed laser deposition (PLD) at the University of Wollongong, Australia. The latter of these techniques is widely used for growing thin films of various compounds. Single-phase 2212 films were grown on a MgO substrate using the pulsed laser deposition technique from commercially available 2212 powder. The effect of annealing on the thin films was also studied.

Ganapathy Subramanian, Santhana

2003-12-01T23:59:59.000Z

34

Pulsed laser deposition of AlMgB14 thin films  

Science Conference Proceedings (OSTI)

Hard, wear-resistant coatings of thin film borides based on AlMgB{sub 14} have the potential to be applied industrially to improve the tool life of cutting tools and pump vanes and may account for several million dollars in savings as a result of reduced wear on these parts. Past work with this material has shown that it can have a hardness of up to 45GPa and be fabricated into thin films with a similar hardness using pulsed laser deposition. These films have already been shown to be promising for industrial applications. Cutting tools coated with AlMgB{sub 14} used to mill titanium alloys have been shown to substantially reduce the wear on the cutting tool and extend its cutting life. However, little research into the thin film fabrication process using pulsed laser deposition to make AlMgB{sub 14} has been conducted. In this work, research was conducted into methods to optimize the deposition parameters for the AlMgB{sub 14} films. Processing methods to eliminate large particles on the surface of the AlMgB{sub 14} films, produce films that were at least 1m thick, reduce the surface roughness of the films, and improve the adhesion of the thin films were investigated. Use of a femtosecond laser source rather than a nanosecond laser source was found to be effective in eliminating large particles considered detrimental to wear reduction properties from the films. Films produced with the femtosecond laser were also found to be deposited at a rate 100 times faster than those produced with the nanosecond laser. However, films produced with the femtosecond laser developed a relatively high RMS surface roughness around 55nm. Attempts to decrease the surface roughness were largely unsuccessful. Neither increasing the surface temperature of the substrate during deposition nor using a double pulse to ablate the material was found to be extremely successful to reduce the surface roughness. Finally, the adhesion of the thin films to M2 tool steel substrates, assessed using the Rockwell C indentation adhesion test, was found to be substantially improved by the deposition of a titanium interlayer, but unaffected by increasing the temperature of the substrates. The titanium was found to improve the adhesion strength of the films because it reacted with both the steel and the AlMgB{sub 14} compound to form new compounds. Ultimately, it was concluded that the films with the best properties were produced with a femtosecond pulsed laser and were deposited on top of a titanium interlayer to improve the thin film adhesion.

Russell, Alan; Bastawros, Ashraf; Tan, Xiaoli

2008-11-18T23:59:59.000Z

35

Thermal deposition and electron beam patterning techniques for biopolymer thin films: dna complex and proteins  

Science Conference Proceedings (OSTI)

The properties and effects of deposition and patterning of bio-organic materials have been studied in this work. Thermal deposition of DNA:CTMA, DNA:CTMA/PEDOT, DNA:Eu complexes, bacteriorhodipsin, and Bombix mori silk thin films from ...

Robert Andrew Jones / Andrew J. Steckl

2007-01-01T23:59:59.000Z

36

Sputter deposition and characterization of lithium cobalt oxide thin films and their applications in thin-film rechargeable lithium batteries  

DOE Green Energy (OSTI)

Li Co oxide thin films were deposited by rf magnetron sputtering of a LiCoO{sub 2} target in a 3:1 Ar/O{sub 2} mixture gas. From proton-induced gamma-ray emission analysis and Rutherford backscattering spectrometry, the average composition of these films was determined to be Li{sub 1.15}CoO{sub 2.16}. X-ray powder diffraction patterns of films annealed in air at 500-700 C were consistent with regular rhombohedral structure of crystalline LiCoO{sub 2}. Discharge curves of thin film lithium cells with amoprohous LiCoO{sub 2} showed no obvious structural transition between 4.2 and 1.5 V. Shape of discharge curves of cells with polycrystalline cathodes were consistent with a two-phase voltage plateau at {similar_to}3.9 V with a relatively large capacity and two additional smaller plateaus at higher voltages. Cells with the 700 C annealed cathodes showed a capacity loss of {similar_to} after 1000 cycles between 4.2 and 3.0 V.

Wang, B.; Bates, J.B.; Luck, C.F.; Sales, B.C.; Zuhr, R.A. [Oak Ridge National Lab., TN (United States); Robertson, J.D. [Kentucky Univ., Lexington, KY (United States). Dept. of Chemistry

1996-01-01T23:59:59.000Z

37

Electron beam physical vapor deposition of thin ruby films for remote temperature sensing  

SciTech Connect

Thermographic phosphors (TGPs) possessing temperature-dependent photoluminescence properties have a wide range of uses in thermometry due to their remote access and large temperature sensitivity range. However, in most cases, phosphors are synthesized in powder form, which prevents their use in high resolution micro and nanoscale thermal microscopy. In the present study, we investigate the use of electron beam physical vapor deposition to fabricate thin films of chromium-doped aluminum oxide (Cr-Al{sub 2}O{sub 3}, ruby) thermographic phosphors. Although as-deposited films were amorphous and exhibited weak photoluminescence, the films regained the stoichiometry and {alpha}-Al{sub 2}O{sub 3} crystal structure of the combustion synthesized source powder after thermal annealing. As a consequence, the annealed films exhibit both strong photoluminescence and a temperature-dependent lifetime that decreases from 2.9 ms at 298 K to 2.1 ms at 370 K. Ruby films were also deposited on multiple substrates. To ensure a continuous film with smooth surface morphology and strong photoluminescence, we use a sapphire substrate, which is thermal expansion coefficient and lattice matched to the film. These thin ruby films can potentially be used as remote temperature sensors for probing the local temperatures of micro and nanoscale structures.

Li Wei; Coppens, Zachary J.; Greg Walker, D.; Valentine, Jason G. [Department of Mechanical Engineering, Vanderbilt University, Nashville, Tennessee 37212 (United States)

2013-04-28T23:59:59.000Z

38

Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering  

Science Conference Proceedings (OSTI)

Cuprous oxide (Cu{sub 2}O) is a promising earth-abundant semiconductor for photovoltaic applications. We report Hall mobilities of polycrystalline Cu{sub 2}O thin films deposited by reactive dc magnetron sputtering. High substrate growth temperature enhances film grain structure and Hall mobility. Temperature-dependent Hall mobilities measured on these films are comparable to monocrystalline Cu{sub 2}O at temperatures above 250 K, reaching 62 cm{sup 2}/V s at room temperature. At lower temperatures, the Hall mobility appears limited by carrier scattering from ionized centers. These observations indicate that sputtered Cu{sub 2}O films at high substrate growth temperature may be suitable for thin-film photovoltaic applications.

Lee, Yun Seog; Winkler, Mark T.; Siah, Sin Cheng; Brandt, Riley; Buonassisi, Tonio [Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)

2011-05-09T23:59:59.000Z

39

Photoelectrochemical properties of spray deposited n-CdSe thin films  

SciTech Connect

Polycrystalline cadmium selenide (CdSe) thin films have been prepared by spraying a mixture of an equimolar aqueous solutions of cadmium chloride and selenourea on preheated fluorine doped tin oxide (FTO) coated glass substrates at different substrate temperatures. The cell configuration n-CdSe/1 M (NaOH + Na{sub 2}S + S)/C is used for studying the capacitance-voltage (C-V) characteristics in dark, current-voltage (I-V) characteristics in dark and under illumination, photovoltaic power output and spectral response characteristics of the as deposited films. Photoelectrochemical study shows that as deposited CdSe thin films exhibits n-type of conductivity. The spectral response characteristics of the films at room temperature show a prominent sharp peak at 725 nm. The measured values of efficiency ({eta}) and fill factor (FF) are found to be 0.50% and 0.44 respectively for film deposited at 300 C. Electrochemical impedance spectroscopy studies show that the CdSe film deposited at 300 C shows better performance in PEC cell. (author)

Yadav, A.A.; Barote, M.A.; Masumdar, E.U. [Thin Film Physics Laboratory, Department of Physics, Electronics and Photonics, Rajarshi Shahu Mahavidyalaya, Latur 413512, Maharashtra (India)

2010-05-15T23:59:59.000Z

40

Separation of Hydrogen Using an Electroless Deposited Thin-Film Palladium-Ceramic Composite Membrane  

DOE Green Energy (OSTI)

The primary objective of this project was to prepare and characterize a hydrogen permselective palladium-ceramic composite membrane for high temperature gas separations and catalytic membrane reactors. Electroless plating method was used to deposit a thin palladium film on microporous ceramic substrate. The objective of this paper is to discuss the preparation and characterization of a thin-film palladium-ceramic composite membrane for selective separation of hydrogen at elevated temperatures and pressures. In this paper, we also present a model to describe the hydrogen transport through the palladium-ceramic composite membrane in a cocurrent flow configuration.

Ilias, S.; King, F.G.; Fan, Ting-Fang; Roy, S. [North Carolina Agricultural and Technical State Univ., Greensboro, NC (United States). Dept. of Chemical Engineering

1996-12-31T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


41

Study of plasma enhanced chemical vapor deposition of boron-doped hydrogenated amorphous silicon thin films and the application to p-channel thin film transistor  

E-Print Network (OSTI)

The material and process characteristics of boron doped hydrogenated amorphous silicon (a-Si:H) thin film deposited by plasma enhanced chemical vapor deposition technique (PECVD) have been studied. The goal is to apply the high quality films deposited at low substrate temperature for devices such as thin film transistors (TFTs). The effect of the deposition parameters such as doping gas concentration, substrate temperature, hydrogen dilution, helium dilution, power density, and pressure at 50 kHz rf frequency on the films' characteristics were analyzed. The films' electrical property was characterized by its dark resistivity. The chemical composition and bonding characteristics were discussed. p-channel TFTs were fabricated with these optimized films. Three different levels of dopant concentrations in the channel were used to detect the dopant effect on the TFT properties. Doping resulted in the increase of film deposition rate. The low film deposition rate at the high temperature deposition corresponds to a dense structured film. The increase of gas phase H? concentration could increase H? etching of the weak bonds in the film, which is consistent with the decrease of the deposition rate. Film's dark conductivity is determined by the atomic B concentration in the film, the substrate temperature, the ion bombardment effect, the surface morphology, and the gas phase and film hydrogen concentration. At high power density and high pressure plasma condition, film with a high deposition rate shows a high conductivity. However, excessive ion bombardment effect, e.g. in powdery plasma region, limits the further increase of the conductivity. Film deposited with He dilution demonstrates a higher conductivity compared to the H? dilution counterpart. This might be attributed to a more effective ion bombardment effect of the former. Powder generation in the plasma significantly affects the conductivity of He diluted film compared to the H? diluted ones, which might be due to the less H? etching effect at the He dilution deposition. The output and transfer characteristics show the normal p-channel TFTs behavior. TFT characteristics, such as mobility, threshold voltage, and on-off current ratio were affected by the doping gas concentration in the channel layer and the deposition process.

Nominanda, Helinda

2004-01-01T23:59:59.000Z

42

Electrochemical studies of the LiFePO thin films prepared with pulsed laser deposition  

Science Conference Proceedings (OSTI)

Thin films of LiFePO4 have been prepared on stainless steel substrates with pulsed laser deposition utilizing an Ar atmosphere. Films were characterized with XRD, SEM, Raman spectroscopy and electrochemistry in liquid electrolyte. Raman spectral analysis revealed the presence of carbon in the films, even though the targets contained less than a few percent residual carbon. The Raman spectra also suggest the presence of various iron oxide species on the surface of the film. The 75nm film showed reversible cycling of more than 90 mAh/g for 60 cycles and a coulombic efficiency close to 1. Variable sweep rate cyclic voltammetry showed a diffusion-controlled reaction with an effective diffusivity of about 10-12 cm2/s. The performance of the thicker film was poor with a coulombic efficiency much less than 1.

Song, Seung-Wan; Reade, Ronald P.; Striebel, Kathryn A.

2003-05-20T23:59:59.000Z

43

Characterization of Sputter Deposited Thin Film Scandate Cathodes for Miniaturized Thermionic Converter Applications  

DOE Green Energy (OSTI)

We have successfully developed a method for fabricating scandate-based thermionic emitters in thin film form. The primary goal of our effort is to develop thin film emitters that exhibit low work fimction, high intrinsic electron emissivity, minimum thermal activation properties and that can be readily incorporated into a microgap converter. Our approach has been to incorporate BaSrO into a SqOq matrix using rf sputtering to produce thin films. Diode testing has shown the resulting films to be electron emissive at temperatures as low as 900 K with current densities of 0.1 mA.cm-2 at 1100 K and saturation voltages. We calculate an approximate maximum work function of 1.8 eV and an apparent emission constant (Richardson's constant, A*) of 36 mA.cm-2.K-2. Film compositional and structural analysis shows that a significant surface and subsurface alkaline earth hydroxide phase can form and probably explains the limited utilization and stability of Ba and its surface complexes. The flexibility inherent in sputter deposition suggests alternate strategies for eliminating undesirable phases and optimizing thin film emitter properties.

King, D.B.; Ruffner, J.H.; Zavadil, K.R.

1998-12-14T23:59:59.000Z

44

Deposition and Characterization of Highly Oriented Mg(3)(VO(4))(2) Thin Film Catalyst  

DOE Green Energy (OSTI)

Magnesium vanadates are potentially important catalytic materials for the conversion of alkanes to alkenes via oxidative dehydrogenation. However, little is known about the active sites at which the catalytic reactions take place. It may be possible to obtain a significant increase in the catalytic efficiency if the effects of certain material properties on the surface reactions could be quantified and optimized through the use of appropriate preparation techniques. Given that surface reactivity is often dependent upon surface structure and that the atomic level structure of the active sites in these catalysts is virtually unknown, we desire thin film samples consisting of a single magnesium vanadate phase and a well defined crystallographic orientation in order to reduce complexity and simplify the study of active sites. We report on the use of reactive RF sputter deposition to fabricate very highly oriented, stoichiometric Mg{sub 3}(VO{sub 4}){sub 2} thin films for use in these surface analysis studies. Deposition of samples onto amorphous substrates resulted in very poor crystallinity. However, deposition of Mg{sub 3}(VO{sub 4}){sub 2} onto well-oriented, lattice-matched thin film ''seed'' layers such as Ti(0001), Au(111), or Pt(111) resulted in very strong preferential (042) crystallographic orientation (pseudo-hexagonal oxygen planes parallel to the substrate). This strong preferential growth of the Mg{sub 3}VO{sub 4}{sub 2} suggests epitaxial (single-crystal) growth of this mixed metal oxide on the underlying metal seed layer. The effects of the seed layer material, deposition temperature, and post-deposition reactive treatments on thin film properties such as stoichiometry, crystallographic orientation, and chemical interactions will be discussed.

RODRIGUEZ,MARK A.; RUFFNER,JUDITH A.; SAULT,ALLEN G.; TISSOT JR.,RALPH G.

1999-10-22T23:59:59.000Z

45

Indentation-induced mechanical deformation behaviors of AlN thin films deposited on c-plane sapphire  

Science Conference Proceedings (OSTI)

The mechanical properties and deformation behaviors of AlN thin films deposited on c-plane sapphire substrates by helicon sputtering method were determined using the Berkovich nanoindentation and cross-sectional transmission electron microscopy (XTEM). ...

Sheng-Rui Jian; Jenh-Yih Juang

2012-01-01T23:59:59.000Z

46

A comparative study of ultraviolet photoconductivity relaxation in zinc oxide (ZnO) thin films deposited by different techniques  

Science Conference Proceedings (OSTI)

Photoresponse characteristics of ZnO thin films deposited by three different techniques namely rf diode sputtering, rf magnetron sputtering, and electrophoretic deposition has been investigated in the metal-semiconductor-metal (MSM) configuration. A significant variation in the crystallinity, surface morphology, and photoresponse characteristics of ZnO thin film with change in growth kinetics suggest that the presence of defect centers and their density govern the photodetector relaxation properties. A relatively low density of traps compared to the true quantum yield is found very crucial for the realization of practical ZnO thin film based ultraviolet (UV) photodetector.

Yadav, Harish Kumar; Gupta, Vinay [Department of Physics and Astrophysics, University of Delhi, Delhi 110 007 (India)

2012-05-15T23:59:59.000Z

47

Atmospheric-Pressure Chemical Vapor Deposition of Iron Pyrite Thin Films  

Science Conference Proceedings (OSTI)

Iron pyrite (cubic FeS{sub 2}) is a promising candidate absorber material for earth-abundant thin-film solar cells. In this report, single-phase, large-grain, and uniform polycrystalline pyrite thin films are fabricated on glass and molybdenum-coated glass substrates by atmospheric-pressure chemical vapor deposition (AP-CVD) using the reaction of iron(III) acetylacetonate and tert-butyl disulfide in argon at 300 C, followed by sulfur annealing at 500--550 C to convert marcasite impurities to pyrite. The pyrite-marcasite phase composition depends strongly on the concentration of sodium in the growth substrate and the sulfur partial pressure during annealing. Phase and elemental composition of the films are characterized by X-ray diffraction, Raman spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering spectrometry, and X-ray photoelectron spectroscopy. The in-plane electrical properties are surprisingly insensitive to phase and elemental impurities, with all films showing p-type, thermally activated transport with a small activation energy ({approx}30 meV), a room- temperature resistivity of {approx}1 {Omega} cm, and low mobility. These ubiquitous electrical properties may result from robust surface effects. These CVD pyrite thin films are well suited to fundamental electrical studies and the fabrication of pyrite photovoltaic device stacks.

Berry, Nicholas; Cheng, Ming; Perkins, Craig L.; Limpinsel, Moritz; Hemminger, John C.; Law, Matt (NREL); (UCI)

2012-10-23T23:59:59.000Z

48

Thin Film and Nanostructure Processing Group Homepage  

Science Conference Proceedings (OSTI)

... The Thin Film and Nanostructure Processing Group is one of seven ... Deposition of thin films Electrodeposition of metals and alloys Evaporation of ...

2012-10-15T23:59:59.000Z

49

Hybrid deposition of thin film solid oxide fuel cells and electrolyzers  

DOE Patents (OSTI)

The use of vapor deposition techniques enables synthesis of the basic components of a solid oxide fuel cell (SOFC); namely, the electrolyte layer, the two electrodes, and the electrolyte-electrode interfaces. Such vapor deposition techniques provide solutions to each of the three critical steps of material synthesis to produce a thin film solid oxide fuel cell (TFSOFC). The electrolyte is formed by reactive deposition of essentially any ion conducting oxide, such as defect free, yttria stabilized zirconia (YSZ) by planar magnetron sputtering. The electrodes are formed from ceramic powders sputter coated with an appropriate metal and sintered to a porous compact. The electrolyte-electrode interface is formed by chemical vapor deposition of zirconia compounds onto the porous electrodes to provide a dense, smooth surface on which to continue the growth of the defect-free electrolyte, whereby a single fuel cell or multiple cells may be fabricated. 8 figs.

Jankowski, A.F.; Makowiecki, D.M.; Rambach, G.D.; Randich, E.

1998-05-19T23:59:59.000Z

50

Hybrid deposition of thin film solid oxide fuel cells and electrolyzers  

DOE Patents (OSTI)

The use of vapor deposition techniques enables synthesis of the basic components of a solid oxide fuel cell (SOFC); namely, the electrolyte layer, the two electrodes, and the electrolyte-electrode interfaces. Such vapor deposition techniques provide solutions to each of the three critical steps of material synthesis to produce a thin film solid oxide fuel cell (TFSOFC). The electrolyte is formed by reactive deposition of essentially any ion conducting oxide, such as defect free, yttria stabilized zirconia (YSZ) by planar magnetron sputtering. The electrodes are formed from ceramic powders sputter coated with an appropriate metal and sintered to a porous compact. The electrolyte-electrode interface is formed by chemical vapor deposition of zirconia compounds onto the porous electrodes to provide a dense, smooth surface on which to continue the growth of the defect-free electrolyte, whereby a single fuel cell or multiple cells may be fabricated.

Jankowski, Alan F. (Livermore, CA); Makowiecki, Daniel M. (Livermore, CA); Rambach, Glenn D. (Livermore, CA); Randich, Erik (Endinboro, PA)

1999-01-01T23:59:59.000Z

51

Hybrid deposition of thin film solid oxide fuel cells and electrolyzers  

DOE Patents (OSTI)

The use of vapor deposition techniques enables synthesis of the basic components of a solid oxide fuel cell (SOFC); namely, the electrolyte layer, the two electrodes, and the electrolyte-electrode interfaces. Such vapor deposition techniques provide solutions to each of the three critical steps of material synthesis to produce a thin film solid oxide fuel cell (TFSOFC). The electrolyte is formed by reactive deposition of essentially any ion conducting oxide, such as defect free, yttria stabilized zirconia (YSZ) by planar magnetron sputtering. The electrodes are formed from ceramic powders sputter coated with an appropriate metal and sintered to a porous compact. The electrolyte-electrode interface is formed by chemical vapor deposition of zirconia compounds onto the porous electrodes to provide a dense, smooth surface on which to continue the growth of the defect-free electrolyte, whereby a single fuel cell or multiple cells may be fabricated.

Jankowski, Alan F. (Livermore, CA); Makowiecki, Daniel M. (Livermore, CA); Rambach, Glenn D. (Livermore, CA); Randich, Erik (Endinboro, PA)

1998-01-01T23:59:59.000Z

52

Uncooled thin film infrared imaging device with aerogel thermal isolation: Deposition and planarization techniques  

Science Conference Proceedings (OSTI)

The authors have successfully integrated a thermally insulating silica aerogel thin film into a new uncooled monolithic thin film infrared (IR) imaging device. Compared to other technologies (bulk ceramic and microbridge), use of an aerogel layer provides superior thermal isolation of the pyroelectric imaging element from the relatively massive heat sinking integrated circuit. This results in significantly higher thermal and temporal resolutions. They have calculated noise equivalent temperature differences of 0.04--0.10 C from a variety of Pb{sub x}Zr{sub y}Ti{sub 1{minus}y}O{sub 3} (PZT) and Pb{sub x}La{sub 1{minus}x}Zr{sub y}Ti{sub 1{minus}y}O{sub 3} (PLZT) pyroelectric imaging elements in monolithic structures. In addition, use of aerogels results in an easier, less expensive fabrication process and a more robust device. Fabrication of these monolithic devices entails sol-gel deposition of the aerogel, sputter deposition of the electrodes, and solution chemistry deposition of the pyroelectric imaging elements. Uniform pyroelectric response is achieved across the device by use of appropriate planarization techniques. These deposition and planarization techniques are described. Characterization of the individual layers and monolithic structure using scanning electron microscopy, atomic force microscopy and Byer-Roundy techniques also is discussed.

Ruffner, J.A.; Clem, P.G.; Tuttle, B.A.; Brinker, C.J. [Sandia National Labs., Albuquerque, NM (United States); Sriram, C.S. [Univ. of New Mexico, Albuquerque, NM (United States). Dept. of Chemical and Nuclear Engineering; Bullington, J.A. [AMMPEC, Inc., Albuquerque, NM (United States)

1998-04-01T23:59:59.000Z

53

Epitaxial growth of metal fluoride thin films by pulsed-laser deposition  

SciTech Connect

We have studied growth of GdLiF4 thin films for optical waveguide applications. Epitaxial, c-axis oriented GdLiF4 films wer grown from undoped GdLiF4 targets in an on-axis Pulsed-laser deposition geometry on (100) CaF2. These films exhibit a high density of particulates on the surface which are ejected from the target in the ablation process. Growth from Nd-doped polycrystalline GdLiF4 ablation targets results in smooth films with lower particulate densities, as Nd doping increases the optical absorption of GdLiF4 at the ablation laser wavelength 193 nm and permits efficient pulsed-laser deposition. Optical emission spectra of the ablation pume reveals the presence of atomic F, Gd, and Li, indicating the dissociation of the metal-fluorine bonds in the ablation process. In addition, we find that the residual background oxygen pressure must be reduced to avoid formation of Gd4O3F6 as an impurity oxyfluoride phase in the films.

Norton, D.P.; Budal, J.D.; Chakoumakos, B.C.; Geohegan, D.B. [Oak Ridge National Lab., TN (United States); Puretzky, A. [AN SSSR, Troitsk (Russian Federation). Inst. Spektroskopii

1995-12-01T23:59:59.000Z

54

The deposition of nanocrystalline TiO2 thin film on silicon using Sol-Gel technique and its characterization  

Science Conference Proceedings (OSTI)

TiO"2 thin films were deposited using Sol-Gel spin coating technique using titanium isoperoxide as the Titania precursor. The films were characterized using X-ray diffraction, capacitance voltage measurement and Raman characterization technique. The ... Keywords: Sol-Gel, Spin coating, Titanium dioxide, X-ray diffraction

Mukesh Kumar; Mukesh Kumar; Dinesh Kumar

2010-03-01T23:59:59.000Z

55

Process for depositing thin film layers onto surfaces modified with organic functional groups and products formed thereby  

DOE Patents (OSTI)

A method is provided for producing a thin film product, comprising a first step in which an underlying substrate of a first material is provided. The underlying substrate includes a plurality of unmodified sites. The underlying substrate is then chemically modified wherein a plurality of organic functional groups are attached to a plurality of the unmodified sites. The arrangement and type of the functional group used can be selected for the purpose of controlling particular properties of the second material deposited. A thin film layer of at least one second material is then deposited onto the chemically modified underlying substrate. This can be accomplished by connecting the thin film to the underlying substrate by binding the thin film to the functional groups.

Tarasevich, Barbara J. (Richland, WA); Rieke, Peter C. (Pasco, WA)

1998-01-01T23:59:59.000Z

56

Maskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracy  

DOE Patents (OSTI)

The invention is a method for the production of axially symmetric, graded and ungraded thickness thin film and multilayer coatings that avoids the use of apertures or masks to tailor the deposition profile. A motional averaging scheme permits the deposition of uniform thickness coatings independent of the substrate radius. Coating uniformity results from an exact cancellation of substrate radius dependent terms, which occurs when the substrate moves at constant velocity. If the substrate is allowed to accelerate over the source, arbitrary coating profiles can be generated through appropriate selection and control of the substrate center of mass equation of motion. The radial symmetry of the coating profile is an artifact produced by orbiting the substrate about its center of mass; other distributions are obtained by selecting another rotation axis. Consequently there is a direct mapping between the coating thickness and substrate equation of motion which can be used to tailor the coating profile without the use of masks and apertures.

Vernon, Stephen P. (Pleasanton, CA); Ceglio, Natale M. (Livermore, CA)

2000-01-01T23:59:59.000Z

57

Low emissivity Ag/Ta/glass multilayer thin films deposited by sputtering  

SciTech Connect

Ta is deposited on a glass substrate as an interlayer for the two-dimensional growth of Ag thin films because Ta has good thermal stability and can induce a negative surface-energy change in Ag/glass. From the transmission electron microscopy results, we concluded that the Ag crystals in the bottom layer (seemingly on Ag/Ta) were flattened; this was rarely observed in the three-dimensional growth mode. Comparing Ag/Ta/glass with Ag/glass, we found that the Ta interlayer was effective in reducing both the resistance and the emissivity, accompanied by the relatively high transmittance in the visible region. In particular, Ag(9 nm)/Ta(1 nm)/glass film showed 0.08 of the emissivity, including {approx}61% of the transmittance in the visible region (wavelength: 550 nm).

Park, Sun Ho [Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City (Korea, Republic of); Lee, Kee Sun [Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City (Korea, Republic of); Green Home Energy Technology Center, Cheonan City (Korea, Republic of); Sivasankar Reddy, A. [Green Home Energy Technology Center, Cheonan City (Korea, Republic of)

2011-09-15T23:59:59.000Z

58

Thin film tritium dosimetry  

DOE Patents (OSTI)

The present invention provides a method for tritium dosimetry. A dosimeter comprising a thin film of a material having relatively sensitive RITAC-RITAP dosimetry properties is exposed to radiation from tritium, and after the dosimeter has been removed from the source of the radiation, the low energy electron dose deposited in the thin film is determined by radiation-induced, thermally-activated polarization dosimetry techniques.

Moran, Paul R. (Madison, WI)

1976-01-01T23:59:59.000Z

59

Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering  

SciTech Connect

The electrical and optical properties of Ta{sub x}Si{sub y}N{sub z} thin films deposited by reactive magnetron sputtering from individual Ta and Si targets were studied in order to investigate the effects of nitrogen and silicon contents on both properties and their correlation to the film microstructure. Three sets of fcc-Ta{sub x}Si{sub y}N{sub z} thin films were prepared: sub-stoichiometric Ta{sub x}Si{sub y}N{sub 0.44}, nearly stoichiometric Ta{sub x}Si{sub y}N{sub 0.5}, and over-stoichiometric Ta{sub x}Si{sub y}N{sub 0.56}. The optical properties were investigated by near-normal-incidence reflectivity and ellipsometric measurements in the optical energy range from 0.375 eV to 6.8 eV, while the d.c. electrical resistivity was measured in the van der Pauw configuration from 20 K to 300 K. The optical and electrical measurements were interpreted using the standard Drude-Lorentz model and the so-called grain boundary scattering model, respectively. The electronic properties were closely correlated with the compositional and structural modifications of the Ta{sub x}Si{sub y}N{sub z} films due to variations in the stoichiometry of the fcc-TaN{sub z} system and the addition of Si atoms. According to the nitrogen and silicon contents, fcc-Ta{sub x}Si{sub y}N{sub z} films can exhibit room temperature resistivity values ranging from 10{sup 2} {mu}{Omega} cm to about 6 Multiplication-Sign 10{sup 4} {mu}{Omega} cm. The interpretation of the experimental temperature-dependent resistivity data within the Grain Boundary Scattering model, combined with the results from optical investigations, showed that the mean electron transmission probability G and the free carriers concentration, N, are the main parameters that control the transport properties of these films. The results indicated that the correlation between electrical and optical measurements with the chemical composition and the nanostructure of the Ta{sub x}Si{sub y}N{sub z} thin films provides a pertinent and consistent description of the evolution of the Ta-Si-N system from a solid solution to a nanocomposite material due to the addition of Si atoms.

Oezer, D.; Sanjines, R. [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Condensed Matter Physics (ICMP), CH-1015 Lausanne (Switzerland); Ramirez, G.; Rodil, S. E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito Exterior s/n, CU, Mexico D.F. 04510 (Mexico)

2012-12-01T23:59:59.000Z

60

Synthesis and characterization of GaN thin films deposited on different substrates using a low-cost electrochemical deposition technique  

Science Conference Proceedings (OSTI)

Gallium nitride GaN thin films were deposited on three different substrates; Si (111), Si (100) and ITO coated glass using electrochemical deposition technique at 20 Degree-Sign C. A mixture of gallium nitrate, ammonium nitrate was used as electrolyte. The deposited films were investigated at room temperature by a series of material characterization techniques, namely; scanning electron microscopy (SEM), EDX and X-ray diffraction (XRD). SEM images and EDX results indicated that the growth of GaN films varies according to the substrates. XRD analyses showed the presence of hexagonal wurtzite and cubic zinc blende GaN phases with the crystallite size around 18-29 nm.

Al-Heuseen, K.; Hashim, M. R. [Al-Balqa Applied University, Ajloun University College (Jordan); School of Physics, Universiti Sains Malaysia, 11800-Penang (Malaysia)

2012-09-06T23:59:59.000Z

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61

Thin-film optical initiator  

DOE Patents (OSTI)

A thin-film optical initiator having an inert, transparent substrate, a reactive thin film, which can be either an explosive or a pyrotechnic, and a reflective thin film. The resultant thin-film optical initiator system also comprises a fiber-optic cable connected to a low-energy laser source, an output charge, and an initiator housing. The reactive thin film, which may contain very thin embedded layers or be a co-deposit of a light-absorbing material such as carbon, absorbs the incident laser light, is volumetrically heated, and explodes against the output charge, imparting about 5 to 20 times more energy than in the incident laser pulse.

Erickson, Kenneth L. (Albuquerque, NM)

2001-01-01T23:59:59.000Z

62

Optimization of DC reactive magnetron sputtering deposition process for efficient YSZ electrolyte thin film SOFC  

E-Print Network (OSTI)

thin film SOFC H. Hidalgo1 , A.-L. Thomann1 , T. Lecas1 , J. Vulliet2 , K. Wittmann-Teneze2 , D of 350 mW.cm-2 . Keywords: Anode-Supported SOFC, Thin films, magnetron sputtering, YSZ, electrolyte 1...) into electricity. Among the different technologies [1], solid oxide fuel cells (SOFC) exhibit a high tolerance

63

Apparatus and method for selective area deposition of thin films on electrically biased substrates  

DOE Patents (OSTI)

An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

Zuhr, Raymond A. (Oak Ridge, TN); Haynes, Tony E. (Knoxville, TN); Golanski, Andrzej (Le Cheylas, FR)

1999-01-01T23:59:59.000Z

64

Apparatus and method for selective area deposition of thin films on electrically biased substrates  

DOE Patents (OSTI)

An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

Zuhr, Raymond A. (Oak Ridge, TN); Haynes, Tony E. (Knoxville, TN); Golanski, Andrzej (Cheylas, FR)

1994-01-01T23:59:59.000Z

65

Chemical vapor deposition of conjugated polymeric thin films for photonic and electronic applications  

E-Print Network (OSTI)

(cont.) Conjugated polymers have delocalized electrons along the backbone, facilitating electrical conductivity. As thin films, they are integral to organic semiconductor devices emerging in the marketplace, such as flexible ...

Lock, John P

2005-01-01T23:59:59.000Z

66

Electrochemical studies of the LiFePO thin films prepared with pulsed laser deposition  

DOE Green Energy (OSTI)

Thin films of LiFePO4 have been prepared on stainless steel substrates with pulsed laser deposition utilizing an Ar atmosphere. Films were characterized with XRD, SEM, Raman spectroscopy and electrochemistry in liquid electrolyte. Raman spectral analysis revealed the presence of carbon in the films, even though the targets contained less than a few percent residual carbon. The Raman spectra also suggest the presence of various iron oxide species on the surface of the film. The 75nm film showed reversible cycling of more than 90 mAh/g for 60 cycles and a coulombic efficiency close to 1. Variable sweep rate cyclic voltammetry showed a diffusion-controlled reaction with an effective diffusivity of about 10-12 cm2/s. The performance of the thicker film was poor with a coulombic efficiency much less than 1.

Song, Seung-Wan; Reade, Ronald P.; Striebel, Kathryn A.

2003-05-20T23:59:59.000Z

67

CARS of Thin Films  

Science Conference Proceedings (OSTI)

... as a thin film diagnostic. Surface enhanced Raman scattering, SERS, has been used to probe the interfacial region of thin polymer films on metal ...

2012-10-02T23:59:59.000Z

68

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering  

Science Conference Proceedings (OSTI)

Silicon dioxide thin films have been deposited successfully on high speed steel (HSS) cutting tool substrates by means of microwave electron cyclotron resonance (MW-ECR) plasma source enhanced RF reactive magnetron sputtering of a pure silica target ... Keywords: SiO2 thin films, Electrical insulation properties, RF magnetron sputtering, Atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS)

Qiyong Zeng; Xiaofeng Zheng; Zhonghua Yu; Yunxian Cui

2010-03-01T23:59:59.000Z

69

Thin film ion conducting coating  

DOE Patents (OSTI)

Durable thin film ion conducting coatings are formed on a transparent glass substrate by the controlled deposition of the mixed oxides of lithium:tantalum or lithium:niobium. The coatings provide durable ion transport sources for thin film solid state storage batteries and electrochromic energy conservation devices.

Goldner, Ronald B. (Lexington, MA); Haas, Terry (Sudbury, MA); Wong, Kwok-Keung (Watertown, MA); Seward, George (Arlington, MA)

1989-01-01T23:59:59.000Z

70

Cu2Sb thin film electrodes prepared by pulsed laser deposition f or lithium batteries  

DOE Green Energy (OSTI)

Thin films of Cu2Sb, prepared on stainless steel and copper substrates with a pulsed laser deposition technique at room temperature, have been evaluated as electrodes in lithium cells. The electrodes operate by a lithium insertion/copper extrusion reaction mechanism, the reversibility of which is superior when copper substrates are used, particularly when electrochemical cycling is restricted to the voltage range 0.65-1.4 V vs. Li/Li+. The superior performance of Cu2Sb films on copper is attributed to the more active participation of the extruded copper in the functioning of the electrode. The continual and extensive extrusion of copper on cycling the cells leads to the isolation of Li3Sb particles and a consequent formation of Sb. Improved cycling stability of both types of electrodes was obtained when cells were cycled between 0.65 and 1.4 V. A low-capacity lithium-ion cell with Cu2Sb and LiNi0.8Co0.15Al0.05O2 electrodes, laminated from powders, shows excellent cycling stability over the voltage range 3.15 - 2.2 V, the potential difference corresponding to approximately 0.65-1.4 V for the Cu2Sb electrode vs. Li/Li+. Chemical self-discharge of lithiated Cu2Sb electrodes by reaction with the electrolyte was severe when cells were allowed to relax on open circuit after reaching a lower voltage limit of 0.1 V. The solid electrolyte interphase (SEI) layer formed on Cu2Sb electrodes after cells had been cycled between 1.4 and 0.65 V vs. Li/Li+ was characterized by Fourier-transform infrared spectroscopy; the SEI layer contributes to the large irreversible capacity loss on the initial cycle of these cells. The data contribute to a better understanding of the electrochemical behavior of intermetallic electrodes in rechargeable lithium batteries.

Song, Seung-Wan; Reade, Ronald P.; Cairns, Elton J.; Vaughey, Jack T.; Thackeray, Michael M.; Striebel, Kathryn A.

2003-08-01T23:59:59.000Z

71

Thin-Film/Low-K Dielectric Constant Measurement  

Science Conference Proceedings (OSTI)

... to pursue a very different approach to dielectric thin-film characterization at ... at NIST; DOW will simply deposit and pattern the thin films on pretested ...

2010-10-05T23:59:59.000Z

72

Vertically Aligned Nanocomposite Thin Films  

E-Print Network (OSTI)

Vertically aligned nanocomposite (VAN) thin films have recently stimulated significant research interest to achieve better material functionality or multifunctionalities. In VAN thin films, both phases grow epitaxially in parallel on given substrates and form a unique nano-checkerboard structure. Multiple strains, including the vertical strain which along the vertical interface and the substrate induced strain which along the film and substrate interface, exist in VAN thin films. The competition of these strains gives a promise to tune the material lattice structure and future more the nanocomposite film physical properties. Those two phases in the VAN thin films are selected based on their growth kinetics, thermodynamic stability and epitaxial growth ability on given substrates. In the present work, we investigated unique epitaxial two-phase VAN (BiFeO3)x:(Sm2O3)1-x and (La0.7Sr0.3MnO3)x:(Mn3O4)1-x thin film systems by pulsed laser deposition. These VAN thin films exhibit a highly ordered vertical columnar structure with good epitaxial quality. The strain of the two phases can be tuned by deposition parameters, e.g. deposition frequency and film composition. Their strain tunability is found to be related directly to the systematic variation of the column widths and domain structures. Their physical properties, such as dielectric loss and ferromagnetisms can be tuned systematically by this variation. The growth morphology, microstructure and material functionalities of VAN thin films can be varied by modifying the phase ratio, substrate orientation or deposition conditions. Systematic study has been done on growing (SrTiO3)0.5:(MgO)0.5 VAN thin films on SrTiO3 and MgO substrates, respectively. The variation of column width demonstrates the substrate induced strain plays another important role in the VAN thin film growth. The VAN thin films also hold promise in achieving porous thin films with ordered nanopores by thermal treatment. We selected (BiFeO3)0.5:(Sm2O3)0.5 VAN thin films as a template and get uniformly distributed bi-layered nanopores. Controllable porosity can be achieved by adjusting the microstructure of VAN (BiFeO3):(Sm2O3) thin films and the annealing parameters. In situ heating experiments within a transmission electron microscope column provide direct observations into the phases transformation, evaporation and structure reconstruction during the annealing. Systematic study in this dissertation demonstrate that the vertically aligned nanocomposite microstructure is a brand new architecture in thin films and an exciting approach that promises tunable material functionalities as well as novel nanostructures.

Bi, Zhenxing

2011-05-01T23:59:59.000Z

73

X-ray absorption spectroscopy studies of electrochemically deposited thin oxide films.  

DOE Green Energy (OSTI)

We have utilized ''in situ'' X-ray Absorption Fine Structure Spectroscopy to investigate the structure and composition of thin oxide films of nickel and iron that have been prepared by electrodeposition on a graphite substrate from aqueous solutions. The films are generally disordered. Structural information has been obtained from the analysis of the data. We also present initial findings on the local structure of heavy metal ions, e.g. Sr and Ce, incorporated into the electrodeposited nickel oxide films. Our results are of importance in a number of technological applications, among them, batteries, fuel cells, electrochromic and ferroelectric materials, corrosion protection, as well as environmental speciation and remediation.

Balasubramanian, M.

1998-06-02T23:59:59.000Z

74

Synthetic Metals 143 (2004) 283287 Construction of a photovoltaic device by deposition of thin films  

E-Print Network (OSTI)

. A photovoltaic cell is constructed by depositing polythiocyanogen on nanocrystalline films of n-TiO2 followed; Photovoltaic cell 1. Introduction Conducting polymers are extensively studied as potential materials technology become a great advantage. Many attempts have been made to construct photovoltaic cells

Matsik, Steven G.

75

Improved structural and electrical properties of thin ZnO:Al films by dc filtered cathodic arc deposition  

E-Print Network (OSTI)

on the properties of indium tin oxide thin films. J. Appl.optical properties in indium-tin-oxide thin film on glassthe replacement of indium tin oxide (ITO) for applications

Zhu, Yuankun

2013-01-01T23:59:59.000Z

76

Vapor deposition of thin-film Y-doped ZrO{sub 2} for electrochemical device applications  

DOE Green Energy (OSTI)

Solid oxide electrolytes based on yttria-stabilized zirconia (YSZ) are widely used in applications such as oxygen sensors, solid oxide fuel cells, oxygen pumps, electrocatalytic reactors, and electrochemically driven oxygen separation membranes. However, bulk YSZ is used in these applications. This requires high operating temperatures in order to minimize ohmic loss. One alternative of overcoming this problem is to use a thin film of the electrolyte. In the work, the authors have grown polycrystalline thin films of fully stabilized Y-ZrO{sub 2} on thick porous Al{sub 2}O{sub 3} substrates in multilayer La{sub 1{minus}x}Sr{sub x}MEO{sub 3}YSZ/La{sub 1{minus}x}Sr{sub x}MEO{sub 3} (ME = Mn, Co) configurations using a combination of single-target RF magnetron sputtering and electron beam physical vapor deposition techniques. The structure and morphology of these films have been studied using X-ray diffraction, and Scanning Electron Microscopy techniques. The ionic conductivity of the thin films has been measured using AC impedance analysis.

Chung, B.W.; Brosha, E.L.; Brown, D.R.; Garzon, F.H.

1994-12-01T23:59:59.000Z

77

Plasma enhanced chemical vapor deposition (PECVD) method of forming vanadium oxide films and vanadium oxide thin-films prepared thereby  

DOE Green Energy (OSTI)

A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.

Zhang, Ji-Guang (Golden, CO); Tracy, C. Edwin (Golden, CO); Benson, David K. (Golden, CO); Turner, John A. (Littleton, CO); Liu, Ping (Lakewood, CO)

2000-01-01T23:59:59.000Z

78

Thin Films at Interfaces  

Science Conference Proceedings (OSTI)

... internal structure of these films was probed ... provided important information on film composition and ... The PEO polymers form thin adsorbed layers ...

79

Sputter-deposited lubricant thin films for high-temperature applications  

SciTech Connect

The major objective of this research program is to investigate and produce lubricant multilayer coatings deposited by sputtering to provide friction coefficients as low as 0.3 in air at temperatures varying from room temperature to 800{degrees}C under tribological test conditions appropriate to specific lubrication applications. The friction properties (friction coefficients and wear rates) of sputter-deposited silver, calcium fluoride and Ag/CaF{sub x} multilayer structures determined under various tribological conditions are reported. The tribological properties of sputter-deposited CaF{sub x}/Cr{sub 3}C{sub 2} thin bilayer structures at 500{degrees}C and 700{degrees}C in air are compared to those of thick coatings of plasma-sprayed composite material (PS-212-type) similar to coatings developed by NASA. 11 refs., 15 figs., 1 tab.

Pauleau, Y.; Marechal, N.; Juliet, P.; Rouzaud, A. [CEA-Nuclear Research Center, Grenoble (France); Zimmermann, C. [Dassault Aviation, Saint Cloud (France); Gras, R. [Institut Superieur des Materiaux, Saint Quen (France)

1996-06-01T23:59:59.000Z

80

Impact of the surface-near silicon substrate properties on the microstructure of sputter-deposited AlN thin films  

Science Conference Proceedings (OSTI)

In micro-/nanomachined devices and systems, aluminum nitride (AlN) thin films are widely used due to their piezoelectric properties. This work evaluates the potential of modifying the interface between the AlN thin film and the silicon (Si) wafer serving as bottom electrode for optimized crystallographic orientation and, hence, improved electrical and piezoelectric properties. The films were analyzed using temperature-dependant leakage current measurements, transmission electron microscopy, and x-ray diffraction. By preconditioning of the Si substrate surface applying sputter etching prior to film deposition, leakage current levels are substantially decreased and an increased (002) orientation of the AlN grains is observed.

Schneider, M.; Bittner, A.; Patocka, F.; Schmid, U. [Department for Microsystems Technology, Institute of Sensor and Actuator Systems, Vienna University of Technology, Floragasse 7, A-1040 Vienna (Austria); Stoeger-Pollach, M. [University Service Center for Transmission Electron Microscopy (USTEM), Vienna University of Technology, Wiedner Hauptstrasse 8-10/052, 1040 Vienna (Austria); Halwax, E. [Institute of Chemical Technologies and Analytics, Vienna University of Technology, Getreidemarkt 9, A-1060 Vienna (Austria)

2012-11-26T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


81

Deposition of hetero-epitaxial In{sub 2}O{sub 3} thin films by molecular beam epitaxy  

SciTech Connect

Highly oriented thin film In{sub 2}O{sub 3} was heteroepitaxially grown on optically polished (100) plane of single crystalline yttria stabilized zirconia (YSZ) substrate using Molecular Beam Epitaxy (MBE). Full-width at half-maximum (FWHM) of X-ray rocking-curve showed 0.08{degree} for In{sub 2}O{sub 3} 200 nm thick layers indicating that excellent uniformity orientation compared with the heteroepitaxially-grown In{sub 2}O{sub 3} epitaxially deposited by the conventional methods such as electron-beam (e-beam) evaporation or sputtering method. The minimum yield ({chi}{sub min}) of the MBE grown in In{sub 2}O{sub 3} film of Rutherford Backscattering Spectrometry (RBS) was also extremely small value 3.1%, implying the very high crystallinity.

Taga, N.; Maekawa, M. [Asahi Glass Co., Ltd., Yokohama (Japan). Research Center; Shigesato, Y.; Yasui, I. [Univ. of Tokyo (Japan). Inst. of Industrial Science; Haynes, T.E. [Oak Ridge National Lab., TN (United States). Solid State Div.

1996-05-01T23:59:59.000Z

82

Enhanced stability against bias-stress of metal-oxide thin film transistors deposited at elevated temperatures  

SciTech Connect

Transparent zinc-tin-oxide (ZTO) thin film transistors (TFTs) have been prepared by DC magnetron sputtering. Compared to reference devices with a channel deposited at room temperature and subsequently annealing at 400 deg. C, a substantially enhanced stability against bias stress is evidenced for devices with in-situ substrate heating during deposition (400 deg. C). A reduced density of sub-gap defect states in TFT channels prepared with in-situ substrate heating is found. Concomitantly, a reduced sensitivity to the adsorption of ambient gases is evidenced for the in-situ heated devices. This finding is of particular importance for an application as driver electronics for organic light emitting diode displays.

Fakhri, M.; Goerrn, P.; Riedl, T. [Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-St. 21, 42119 Wuppertal (Germany); Weimann, T.; Hinze, P. [Physikalisch-Technische Bundesanstalt Braunschweig, Bundesallee 100, 38116 Braunschweig (Germany)

2011-09-19T23:59:59.000Z

83

Interactions between radical growth precursors on plasma-deposited silicon thin-film surfaces  

SciTech Connect

We present a detailed analysis of the interactions between growth precursors, SiH{sub 3} radicals, on surfaces of silicon thin films. The analysis is based on a synergistic combination of density functional theory calculations on the hydrogen-terminated Si(001)-(2x1) surface and molecular-dynamics (MD) simulations of film growth on surfaces of MD-generated hydrogenated amorphous silicon (a-Si:H) thin films. In particular, the authors find that two interacting growth precursors may either form disilane (Si{sub 2}H{sub 6}) and desorb from the surface, or disproportionate, resulting in the formation of a surface dihydride (adsorbed SiH{sub 2} species) and gas-phase silane (SiH{sub 4}). The reaction barrier for disilane formation is found to be strongly dependent on the local chemical environment on the silicon surface and reduces (or vanishes) if one/both of the interacting precursors is/are in a ''fast diffusing state,'' i.e., attached to fivefold coordinated surface Si atoms. Finally, activation energy barriers in excess of 1 eV are obtained for two chemisorbed (i.e., bonded to a fourfold coordinated surface Si atom) SiH{sub 3} radicals. Activation energy barriers for disproportionation follow the same tendency, though, in most cases, higher barriers are obtained compared to disilane formation reactions starting from the same initial configuration. MD simulations confirm that disilane formation and disproportionation reactions also occur on a-Si:H growth surfaces, preferentially in configurations where at least one of the SiH{sub 3} radicals is in a ''diffusive state.'' Our results are in agreement with experimental observations and results of plasma process simulators showing that the primary source for disilane in low-power plasmas may be the substrate surface.

Bakos, Tamas; Valipa, Mayur S.; Maroudas, Dimitrios [Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-3110 (United States)

2007-03-21T23:59:59.000Z

84

Synthesis and Characterization of Plasma Polymerized Thin Films ...  

Science Conference Proceedings (OSTI)

Presentation Title, Synthesis and Characterization of Plasma Polymerized Thin Films Deposited from Benzene and Hexamethyldisiloxane Using (PECVD) ...

85

Atmospheric Pressure Chemical Vapor Deposition of High Silica SiO2-TiO2 Antireflective Thin Films for Glass Based Solar Panels  

SciTech Connect

The atmospheric pressure chemical vapor deposition (APCVD) of SiO2-TiO2 thin films employing [[(tBuO)3Si]2O-Ti(OiPr)2], which can be prepared from commercially available materials, results in antireflective thin films on float glass under industrially relevant manufacturing conditions. It was found that while the deposition temperature had an effect on the SiO2:TiO2 ratio, the thickness was dependent on the time of deposition. This study shows that it is possible to use APCVD employing a single source precursor containing titanium and silicon to produce thin films on float glass with high SiO2:TiO2 ratios.

Klobukowski, Erik R [ORNL; Tenhaeff, Wyatt E [ORNL; McCamy, James [PPG; Harris, Caroline [PPG; Narula, Chaitanya Kumar [ORNL

2013-01-01T23:59:59.000Z

86

Thin film hydrogen sensor  

DOE Green Energy (OSTI)

A hydrogen sensor element comprises an essentially inert, electrically-insulating substrate having a thin-film metallization deposited thereon which forms at least two resistors on the substrate. The metallization comprises a layer of Pd or a Pd alloy for sensing hydrogen and an underlying intermediate metal layer for providing enhanced adhesion of the metallization to the substrate. An essentially inert, electrically insulating, hydrogen impermeable passivation layer covers at least one of the resistors, and at least one of the resistors is left uncovered. The difference in electrical resistances of the covered resistor and the uncovered resistor is related to hydrogen concentration in a gas to which the sensor element is exposed.

Lauf, Robert J. (Oak Ridge, TN); Hoffheins, Barbara S. (Knoxville, TN); Fleming, Pamela H. (Oak Ridge, TN)

1994-01-01T23:59:59.000Z

87

Solid State Thin Film Lithium Microbatteries  

E-Print Network (OSTI)

Solid state thin film lithium microbatteries fabricated by pulsed-laser deposition (PLD) are suggested. During deposition the following process parameters must be considered, which are laser energy and fluence, laser pulse ...

Shi, Z.

88

Thin film deposition by electric and magnetic crossed-field diode sputtering  

DOE Patents (OSTI)

Applying a thin film coating to the surface of a workpiece, in particular, applying a coating of titanium nitride to a klystron window by means of a crossed-field diode sputtering array. The array is comprised of a cohesive group of numerous small hollow electrically conducting cylinders and is mounted so that the open ends of the cylinders on one side of the group are adjacent a titanium cathode plate. The workpiece is mounted so as to face the open ends of the other side of the group. A magnetic field is applied to the array so as to be coaxial with the cylinders and a potential is applied across the cylinders and the cathode plate, the cylinders as an anode being positive with respect to the cathode plate. The cylinders, the cathode plate and the workpiece are situated in an atmosphere of nitrogen which becomes ionized such as by field emission because of the electric field between the cylinders and cathode plate, thereby establishing an anode-cathode discharge that results in sputtering of the titanium plate. The sputtered titanium coats the workpiece and chemically combines with the nitrogen to form a titanium nitride coating on the workpiece. Gas pressure, gas mixtures, cathode material composition, voltages applied to the cathode and anode, the magnetic field, cathode, anode and workpiece spacing, and the aspect ratio (ratio of length to inner diameter) of the anode cylinders, all may be controlled to provide consistent optimum thin film coatings of various compositions and thicknesses. Another facet of the disclosure is the coating of microwave components per se with titanium nitride to reduce multipactoring under operating conditions of the components.

Welch, Kimo M. (Mountain View, CA)

1977-01-01T23:59:59.000Z

89

Thin film deposition by electric and magnetic crossed-field diode sputtering  

DOE Patents (OSTI)

Applying a thin film coating to the surface of a workpiece, in particular, applying a coating of titanium nitride to a klystron window by means of a crossed-field diode sputtering array. The array is comprised of a cohesive group of numerous small hollow electrically conducting cylinders and is mounted so that the open ends of the cylinders on one side of the group are adjacent a titanium cathode plate. The workpiece is mounted so as to face the open ends of the other side of the group. A magnetic field is applied to the array so as to be coaxial with the cylinders and a potential is applied across the cylinders and the cathode plate, the cylinders as an anode being positive with respect to the cathode plate. The cylinders, the cathode plate and the workpiece are situated in an atmosphere of nitrogen which becomes ionized such as by field emission because of the electric field between the cylinders and cathode plate, thereby establishing an anode-cathode discharge that results in sputtering of the titanium plate. The sputtered titanium coats the workpiece and chemically combines with the nitrogen to form a titanium nitride coating on the workpiece. Gas pressure, gas mixtures, cathode material composition, voltages applied to the cathode and anode, the magnetic field, cathode, anode and workpiece spacing, and the aspect ratio (ratio of length to inner diameter) of the anode cylinders, all may be controlled to provide consistent optimum thin film coatings of various compositions and thicknesses. Another facet of the disclosure is the coating of microwave components per se with titanium nitride to reduce multipactoring under operating conditions of the components.

Welch, Kimo M. (Mountain View, CA)

1980-01-01T23:59:59.000Z

90

Rapid Deposition Technology Holds the Key for the World's Largest Manufacturer of Thin-Film Solar Modules (Fact Sheet)  

Science Conference Proceedings (OSTI)

First Solar, Inc. has been collaborating with NREL since 1991, advancing its thin-film cadmium telluride solar technology to grow from a startup company to become one of the world's largest manufacturers of solar modules, and the world's largest manufacturer of thin-film solar modules.

Not Available

2013-08-01T23:59:59.000Z

91

Low temperature rf sputtering deposition of (Ba, Sr) TiO{sub 3} thin film with crystallization enhancement by rf power supplied to the substrate  

SciTech Connect

The (Ba, Sr) TiO{sub 3} thin film deposited by radio frequency (rf) sputtering requires a high deposition temperature near 500 deg. C to realize a high relative dielectric constant over of 300. For example, the film deposited at 330 deg. C contains an amorphous phase and shows a low relative dielectric constant of less than 100. We found that rf power supplied not only to the (Ba, Sr) TiO{sub 3} sputtering target, but also to the substrate during the initial step of film deposition, enhanced the crystallization of the (Ba, Sr) TiO{sub 3} film drastically and realized a high dielectric constant of the film even at low deposition temperatures near 300 deg. C. The 50-nm-thick film with only a 10 nm initial layer deposited with the substrate rf biasing is crystallized completely and shows a high relative dielectric constant of 380 at the deposition temperature of 330 deg. C. The (Ba, Sr) TiO{sub 3} film deposited at higher temperatures (upwards of 400 deg. C) shows <110> preferred orientation, while the film deposited at 330 deg. C with the 10 nm initial layer shows a <111> preferred orientation on a <001>-oriented ruthenium electrode. The unit cell of (Ba, Sr) TiO{sub 3} (111) plane is similar to that of ruthenium (001) plane. We conclude that the rf power supplied to the substrate causes ion bombardments on the (Ba, Sr) TiO{sub 3} film surface, which assists the quasiepitaxial growth of (Ba, Sr) TiO{sub 3} film on the ruthenium electrode at low temperatures of less than 400 deg. C.

Yoshimaru, Masaki; Takehiro, Shinobu; Abe, Kazuhide; Onoda, Hiroshi [System LSI Research Division, Silicon Solution Company, Oki Electric Industry Co., Ltd., 550-1, Higashi-asakawa, Hachioji, Tokyo 193-8550 (Japan); Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Strategic Planning Office, Silicon Manufacturing Company, Oki Electric Industry Co., Ltd., 550-1, Higashi-asakawa, Hachioji, Tokyo 193-8550 (Japan)

2005-05-01T23:59:59.000Z

92

In-situ post-deposition thermal annealing of co-evaporated Cu(InGa)Se2 thin films deposited at low temperatures  

DOE Green Energy (OSTI)

equivalent to devices made from films grown at 550°C. Films originally deposited at 300°C yielded devices after post-deposition annealing with VOC close to that of devices made from films grown at 550°C, despite smaller grain size.

Wilson, James D.; McCandless, Brian E.; Birkmire, Robert W.; Shafarman, William N.

2009-06-09T23:59:59.000Z

93

Superhydrophobic Thin Film Coatings  

Exploiting its expertise with thin films and superhydrophobic materials, ORNL has developed a simple, inexpensive way to apply and reliably bond ...

94

ZnO Nanowires Grown on ZnO Thin Film Deposited by Atomic Layer ...  

Science Conference Proceedings (OSTI)

In this work the atomic layer deposition (ALD) technique was used to deposit the seeding ... 3D Multiwall Carbon Nanotubes (MWCNTs) for Li-Ion Battery Anode.

95

Thin film deposition by electric and magnetic crossed-field diode sputtering. [Patent application  

DOE Patents (OSTI)

Applying a coating of titanium nitride to a klystron window by means of a cross-field diode sputtering array is described. The array is comprised of a cohesive group of numerous small hollow electrically conducting cylinders and is mounted so that the open ends of the cylinders on one side of the group are adjacent to a titanium cathode plate. The workpiece is mounted so as to face the open ends of the other side of the group. A magnetic field is applied to the array so as to be coaxial with the cylinders and a potential is applied across the cylinders and the cathode plate, the cylinders as an anode being positive with respect to the cathode plate. The cylinders, the cathode plate, and the workpiece are situated in an atmosphere of nitrogen which becomes ionized such as by field emission because of the electric field between the cylinders and cathode plate, thereby establishing an anode-cathode discharge that results in sputtering of the titanium plate. The sputtered titanium coats the workpiece and chemically combines with the nitrogen to form a titanium nitride coating on the workpiece. Gas pressure, gas mixtures, cathode material composition, voltages applied to the cathode and anode, the magnetic field, cathode, anode and workpiece spacing, and the aspect ratio (ratio of length to inner diameter) of the anode cylinders, all may be controlled to provide consistent optimum thin film coatings of various compositions and thickness. Another facet of the disclosure is the coating of microwave components per se with titanium nitride to reduce multifactoring under operating conditions of the components.

Welch, K.M.

1975-04-04T23:59:59.000Z

96

Synthesis of reactive and stimuli-responsive polymer thin films by initiated chemical vapor deposition and their sensor applications  

E-Print Network (OSTI)

Stimuli-responsive polymer thin films provide the ability to control the interaction of a surface with its environment. Synthetic techniques with fine compositional control are required to engineer specific responses to ...

Tenhaeff, Wyatt E

2009-01-01T23:59:59.000Z

97

Thin films of mixed metal compounds  

DOE Patents (OSTI)

A compositionally uniform thin film of a mixed metal compound is formed by simultaneously evaporating a first metal compound and a second metal compound from independent sources. The mean free path between the vapor particles is reduced by a gas and the mixed vapors are deposited uniformly. The invention finds particular utility in forming thin film heterojunction solar cells.

Mickelsen, Reid A. (Bellevue, WA); Chen, Wen S. (Seattle, WA)

1985-01-01T23:59:59.000Z

98

Thin film buried anode battery  

DOE Patents (OSTI)

A reverse configuration, lithium thin film battery (300) having a buried lithium anode layer (305) and process for making the same. The present invention is formed from a precursor composite structure (200) made by depositing electrolyte layer (204) onto substrate (201), followed by sequential depositions of cathode layer (203) and current collector (202) on the electrolyte layer. The precursor is subjected to an activation step, wherein a buried lithium anode layer (305) is formed via electroplating a lithium anode layer at the interface of substrate (201) and electrolyte film (204). The electroplating is accomplished by applying a current between anode current collector (201) and cathode current collector (202).

Lee, Se-Hee (Lakewood, CO); Tracy, C. Edwin (Golden, CO); Liu, Ping (Denver, CO)

2009-12-15T23:59:59.000Z

99

A Hyper-Elastic Thin Film Nitinol Flow Diverter for Brain Aneurysms  

Science Conference Proceedings (OSTI)

The thin film Nitinol is sputter deposited with transformation temperatures at or near body temperature (37C). The thin film Nitinol is micromachined using a lift off ...

100

(Ti,Mg)N Thin Film Coatings Produced Via Physical Vapor Deposition  

Science Conference Proceedings (OSTI)

Magnesium (Mg) doped TiN was prepared via physical vapor deposition to ... Axial Compression of a Hollow Cylinder Filled with a Foam: A Porcupine Quill ...

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


101

Thin film hydrogen sensor  

DOE Patents (OSTI)

A thin film hydrogen sensor, includes: a substantially flat ceramic substrate with first and second planar sides and a first substrate end opposite a second substrate end; a thin film temperature responsive resistor on the first planar side of the substrate proximate to the first substrate end; a thin film hydrogen responsive metal resistor on the first planar side of the substrate proximate to the fist substrate end and proximate to the temperature responsive resistor; and a heater on the second planar side of the substrate proximate to the first end.

Cheng, Yang-Tse (Rochester Hills, MI); Poli, Andrea A. (Livonia, MI); Meltser, Mark Alexander (Pittsford, NY)

1999-01-01T23:59:59.000Z

102

Epitaxial Thin Film Silicon Solar Cells Fabricated by Hot Wire Chemical Vapor Deposition Below 750 ..deg..C: Preprint  

Science Conference Proceedings (OSTI)

We report on fabricating film c-Si solar cells on Si wafer templates by hot-wire chemical vapor deposition. These devices, grown at glass-compatible temperatures 500 mV and efficiencies > 5%.

Alberi, K.; Martin, I. T.; Shub, M.; Teplin, C. W.; Iwaniczko, E.; Xu, Y.; duda, A.; Stradin, P.; Johnston, S. W.; Romero, M. J.; Branz, H. M.; Young, D. L.

2009-06-01T23:59:59.000Z

103

Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy  

DOE Patents (OSTI)

A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source operated with time-varying flux distribution. In preferred embodiments, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. A user selects a source flux modulation recipe for achieving a predetermined desired thickness profile of the deposited film. The method relies on precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution.

Montcalm, Claude (Livermore, CA); Folta, James Allen (Livermore, CA); Tan, Swie-In (San Jose, CA); Reiss, Ira (New City, NY)

2002-07-30T23:59:59.000Z

104

Fluorination of amorphous thin-film materials with xenon fluoride  

DOE Patents (OSTI)

A method is disclosed for producing fluorine-containing amorphous semiconductor material, preferably comprising amorphous silicon. The method includes depositing amorphous thin-film material onto a substrate while introducing xenon fluoride during the film deposition process.

Weil, Raoul B. (Haifa, IL)

1988-01-01T23:59:59.000Z

105

Deposition of stress free c-axis oriented LiNbO{sub 3} thin film grown on (002) ZnO coated Si substrate  

Science Conference Proceedings (OSTI)

C-axis oriented lithium niobate thin films have been deposited on Si substrate using RF sputtering technique. A thin buffer layer of c-axis (002) oriented ZnO on Si substrate has been used as a nucleating layer to promote the growth of (006) oriented LiNbO{sub 3} film. The processing gas composition and pressure are found to be very critical in obtaining stress free LiNbO{sub 3} film having desired (006) orientation. The LiNbO{sub 3} films deposited under unique combination of sputtering pressure (10 mTorr) and argon percentage (80%) in reactive gas (Ar + O{sub 2}) composition become almost stress free having lattice parameter (1.3867 A) close to the bulk value. The observed variation in the structural properties and optical phonon modes observed by Raman spectroscopic studies of the oriented LiNbO{sub 3} thin film with stress has been correlated with growth kinetics.

Shandilya, Swati; Gupta, Vinay [Department of Physics and Astrophysics, University of Delhi, Delhi 110007 (India); Tomar, Monika [Miranda House, University of Delhi, Delhi 110007 (India)

2012-05-15T23:59:59.000Z

106

Wide-Gap Thin Film Si n-i-p Solar Cells Deposited by Hot-Wire CVD: Preprint  

DOE Green Energy (OSTI)

High-voltage wide bandgap thin-film Si n-i-p solar cells have been made using the hot-wire chemical vapor deposition (HWCVD) technique. The best open-circuit voltage (Voc) has exceeded 0.94 V in solar cells using HWCVD in the entire n-i-p structure. A Voc of 0.97V has been achieved using HWCVD in the n and i layers and plasma-enhanced (PE) CVD for the p layer. The high voltages are attributed to the wide-gap i layer and an improved p/i interface. The wide-gap i layer is obtained by using low substrate temperatures and sufficient hydrogen dilution during the growth of the i layer to arrive at the amorphous-to-microcrystalline phase transition region. The optical band gap (E04) of the i layer is found to be 1.90 eV. These high-voltage cells also exhibit good fill factors exceeding 0.7 with short-circuit-current densities of 8 to 10 mA/cm2 on bare stainless steel substrates. We have also carried out photoluminescence (PL) spectroscopy studies and found a correlation between Voc and the PL peak energy position.

Wang, Q.; Iwaniczko, E.; Yang, J.; Lord, K.; Guha, S.; Wang, K.; Han, D.

2002-05-01T23:59:59.000Z

107

LIQUID PHASE DEPOSITION OF ELECTROCHROMIC THIN FILMS T. J. Richardson and M. D. Rubin  

E-Print Network (OSTI)

of NiF2 was prepared by stirring excess NiF2· 4H2O in deionized water overnight, followed by filtration to remove suspended solids. The deposition solution was made up by mixing 10 mL of saturated NiF2 with 20 m

108

Ultrahigh vacuum glancing angle deposition system for thin films with controlled three-dimensional nanoscale structure  

E-Print Network (OSTI)

system, computer controlled process parameters, and in situ analysis capabilities. The deposition system structure and surface analysis capabilities. A. Load-lock chamber The load-lock chamber is used pockets in the water-cooled copper hearth. The electron bombardment heats the source material

Robbie, Kevin

109

Growth diagram of La0.7Sr0.3MnO3 thin films using pulsed laser deposition  

Science Conference Proceedings (OSTI)

An experimental study was conducted on controlling the growth mode of La0.7Sr0.3MnO3 thin films on SrTiO3 substrates using pulsed laser deposition by tuning growth temperature, pressure and laser fluence. Different thin film morphology, crystallinity and stoichiometry have been observed depending on growth parameters. To understand the microscopic origin, the adatom nucleation, step advance processes and their relationship to film growth were theoretically analyzed and a growth diagram was constructed. Three boundaries between highly and poorly crystallized growth, layer-by-layer and 3D growth, stoichiometric and non-stoichiometric growth were identified in the growth diagram. A good fit of our experimental observation with the growth diagram was found. This case study demonstrates that a more comprehensive understanding and the predicting of the growth mode in PLD is possible.

Guo, Hangwen [ORNL; Sun, Da-Li [ORNL; Wang, Wenbin [ORNL; Gai, Zheng [ORNL; Kravchenko, Ivan I [ORNL; Shao, Jian [Fudan University, China; Jiang, Lu [ORNL; Ward, Thomas Z [ORNL; Snijders, Paul C [ORNL; Yin, Lifeng [ORNL; Shen, Jian [Fudan University, China; Xu, Xiaoshan [ORNL

2013-01-01T23:59:59.000Z

110

Photovoltaic Polycrystalline Thin-Film Cell Basics | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Polycrystalline Thin-Film Cell Basics Polycrystalline Thin-Film Cell Basics Photovoltaic Polycrystalline Thin-Film Cell Basics August 20, 2013 - 2:36pm Addthis Polycrystalline thin-film cells are made of many tiny crystalline grains of semiconductor materials. The materials used in these cells have properties that are different from those of silicon. Thin-film cells have many advantages over their thick-film counterparts. For example, they use much less material. The cell's active area is usually only 1 to 10 micrometers thick, whereas thick films typically are 100 to 300 micrometers thick. Also, thin-film cells can usually be manufactured in a large-area process, which can be an automated, continuous production process. Finally, they can be deposited on flexible substrate materials. The term thin film comes from the method used to deposit the film, not from

111

Characteristics of Polymer Films Deposited via Microwave Plasma ...  

Science Conference Proceedings (OSTI)

Abstract Scope, Thin films were deposited on both Al and glass substrates at RT by MPECVD using benzene as precursor. Surface and physical properties of ...

112

ATOMIC LAYER DEPOSITION OF TITANIUM OXIDE THIN FILMS ONNANOPOROUS ALUMINA TEMPLATES FOR MEDICAL APPLICATIONS  

SciTech Connect

Nanostructured materials may play a significant role in controlled release of pharmacologic agents for treatment of cancer. Many nanoporous polymer materials are inadequate for use in drug delivery. Nanoporous alumina provides several advantages over other materials for use in controlled drug delivery and other medical applications. Atomic layer deposition was used to coat all the surfaces of the nanoporous alumina membrane in order to reduce the pore size in a controlled manner. Both the 20 nm and 100 nm titanium oxide-coated nanoporous alumina membranes did not exhibit statistically lower viability compared to the uncoated nanoporous alumina membrane control materials. In addition, 20 nm pore size titanium oxide-coated nanoporous alumina membranes exposed to ultraviolet light demonstrated activity against Escherichia coli and Staphylococcus aureus bacteria. Nanostructured materials prepared using atomic layer deposition may be useful for delivering a pharmacologic agent at a precise rate to a specific location in the body. These materials may serve as the basis for 'smart' drug delivery devices, orthopedic implants, or self-sterilizing medical devices.

Brigmon, R.

2009-05-05T23:59:59.000Z

113

Thin film photovoltaic device  

DOE Patents (OSTI)

A thin film photovoltaic solar cell which utilizes a zinc phosphide semiconductor is of the homojunction type comprising an n-type conductivity region forming an electrical junction with a p-type region, both regions consisting essentially of the same semiconductor material. The n-type region is formed by treating zinc phosphide with an extrinsic dopant such as magnesium. The semiconductor is formed on a multilayer substrate which acts as an opaque contact. Various transparent contacts may be used, including a thin metal film of the same chemical composition as the n-type dopant or conductive oxides or metal grids. 5 figs.

Catalano, A.W.; Bhushan, M.

1982-08-03T23:59:59.000Z

114

Thin film photovoltaic device  

DOE Patents (OSTI)

A thin film photovoltaic solar cell which utilizes a zinc phosphide semiconductor is of the homojunction type comprising an n-type conductivity region forming an electrical junction with a p-type region, both regions consisting essentially of the same semiconductor material. The n-type region is formed by treating zinc phosphide with an extrinsic dopant such as magnesium. The semiconductor is formed on a multilayer substrate which acts as an opaque contact. Various transparent contacts may be used, including a thin metal film of the same chemical composition as the n-type dopant or conductive oxides or metal grids.

Catalano, Anthony W. (Wilmington, DE); Bhushan, Manjul (Wilmington, DE)

1982-01-01T23:59:59.000Z

115

Epitaxial Thin Film Silicon Solar Cells Fabricated by Hot Wire Chemical Vapor Deposition Below 750 ..deg..C: Preprint  

SciTech Connect

We report on fabricating film c-Si solar cells on Si wafer templates by hot-wire chemical vapor deposition. These devices, grown at glass-compatible temperatures < 750..deg..C, demonstrate open-circuit voltages > 500 mV and efficiencies > 5%.

Alberi, K.; Martin, I. T.; Shub, M.; Teplin, C. W.; Iwaniczko, E.; Xu, Y.; duda, A.; Stradin, P.; Johnston, S. W.; Romero, M. J.; Branz, H. M.; Young, D. L.

2009-06-01T23:59:59.000Z

116

LaMnO3 thin films grown by using pulsed laser deposition and their simple recovery to a stoichiometric phase by annealing  

Science Conference Proceedings (OSTI)

We systematically investigated various physical properties of epitaxial LaMnO{sub 3} thin films fabricated on SrTiO{sub 3} substrate by using pulsed laser deposition. In particular, we observed drastic changes in their properties when the as-grown films were annealed in a reduced-oxygen atmosphere. Whereas the as-grown LaMnO{sub 3} film showed ferromagnetic and semiconducting properties with a small optical band gap, the LaMnO{sub 3} films annealed at temperature higher than 700 C showed antiferromagnetic and insulating properties with an enlarged band gap. The optical features also changed drastically, in that the optical transition peak shifted to a higher energy with additional fine structures. Such changes were made in a direction such that the LaMnO{sub 3} films were more stoichiometric, indicating that the stoichiometric phase could be recovered by simple annealing of the pulsed-laser-deposited films. Finally, possibilities of the polar catastrophe scenario at the interface between LaMnO{sub 3} and SrTiO{sub 3} are briefly discussed.

Choi, W. S. [Seoul National University; Jeong, D. W. [Seoul National University; Jang, S. Y. [Seoul National University; Marton, Zsolt [ORNL; Seo, Sung Seok A [ORNL; Lee, Ho Nyung [ORNL; Lee, Y. S. [Soongsil University, Korea

2011-01-01T23:59:59.000Z

117

Thin Film Nanocomposites for Thermoelectric Applications  

Science Conference Proceedings (OSTI)

Presentation Title, Thin Film Nanocomposites for Thermoelectric Applications ... Abstract Scope, Thin film nanocomposites comprised of refractory metals and ...

118

NMR characterization of thin films  

SciTech Connect

A method, apparatus, and system for characterizing thin film materials. The method, apparatus, and system includes a container for receiving a starting material, applying a gravitational force, a magnetic force, and an electric force or combinations thereof to at least the starting material, forming a thin film material, sensing an NMR signal from the thin film material and analyzing the NMR signal to characterize the thin film of material.

Gerald, II, Rex E. (Brookfield, IL); Klingler, Robert J. (Glenview, IL); Rathke, Jerome W. (Homer Glen, IL); Diaz, Rocio (Chicago, IL); Vukovic, Lela (Westchester, IL)

2008-11-25T23:59:59.000Z

119

Thin film photovoltaic cell  

DOE Patents (OSTI)

A thin film photovoltaic cell having a transparent electrical contact and an opaque electrical contact with a pair of semiconductors therebetween includes utilizing one of the electrical contacts as a substrate and wherein the inner surface thereof is modified by microroughening while being macro-planar.

Meakin, John D. (Newark, DE); Bragagnolo, Julio (Newark, DE)

1982-01-01T23:59:59.000Z

120

Phase identification and control of thin films deposited by co-evaporation of elemental Cu, Zn, Sn, and Se  

Science Conference Proceedings (OSTI)

Kesterite thin films [(i.e., Cu{sub 2}ZnSn(S,Se){sub 4} and related alloys] have been the subject of recent interest for use as an absorber layer for thin film photovoltaics due to their high absorption coefficient (>10{sup 4} cm{sup -1}), their similarity to successful chalcopyrites (like CuInxGa{sub 1-x}Se{sub 2}) in structure, and their earth-abundance. The process window for growing a single-phase kesterite film is narrow. In this work, we have documented, for our 9.15%-efficient kesterite co-evaporation process, (1) how appearance of certain undesirable phases are controlled via choice of processing conditions, (2) several techniques for identification of phases in these films with resolution adequate to discern changes that are important to device performance, and (3) reference measurements for those performing such phase identification. Data from x-ray diffraction, x-ray fluorescence, Raman scattering, scanning electron microscopy, energy dispersive spectroscopy, and current-voltage characterization are presented.

Vora, Nirav; Blackburn, Jeffrey; Repins, Ingrid; Beall, Carolyn; To, Bobby; Pankow, Joel; Teeter, Glenn; Young, Matthew; Noufi, Rommel [National Renewable Energy Laboratory, 1617 Cole Blvd., MS 3219, Golden, Colorado 80401 (United States)

2012-09-15T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
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121

Phase Identification and Control of Thin Films Deposited by Co-Evaporation of Elemental Cu, Zn, Sn, and Se  

Science Conference Proceedings (OSTI)

Kesterite thin films (i.e., Cu{sub 2}ZnSn(S,Se){sub 4} and related alloys) have been the subject of recent interest for use as an absorber layer for thin film photovoltaics due to their high absorption coefficient (> 10{sup 4} cm{sup -1}), their similarity to successful chalcopyrites (like CuInxGa{sub 1-x}Se{sub 2}) in structure, and their earth-abundance. The process window for growing a single-phase kesterite film is narrow. In this work, we have documented, for our 9.15%-efficient kesterite co-evaporation process, (1) how appearance of certain undesirable phases are controlled via choice of processing conditions, (2) several techniques for identification of phases in these films with resolution adequate to discern changes that are important to device performance, and (3) reference measurements for those performing such phase identification. Data from x-ray diffraction, x-ray fluorescence, Raman scattering, scanning electron microscopy, energy dispersive spectroscopy, and current-voltage characterization are presented.

Vora, N.; Blackburn, J.; Repins, I.; Beall, C.; To, B.; Pankow, J.; Teeter, G.; Young, M.; Noufi, R.

2012-09-01T23:59:59.000Z

122

Photoluminescence properties of SrAl{sub 2}O{sub 4}:Eu{sup 2+},Dy{sup 3+} thin phosphor films grown by pulsed laser deposition  

SciTech Connect

Thin films of SrAl{sub 2}O{sub 4}:Eu{sup 2+},Dy{sup 3+} phosphor were deposited on silicon [Si (100)] substrates using a 248 nm KrF pulsed laser. Deposition parameters, such as substrate temperature, pulse repetition rate, number of laser pulses, and base pressure, were varied during the film deposition process. Based on the x-ray diffraction data, all the films were amorphous but were emitting visible light when excited by a monochromatic xenon lamp. The chemical composition and the stoichiometry of the films determined by the Rutherford backscattering spectroscopy were consistent with the commercial SrAl{sub 2}O{sub 4}:Eu{sup 2+},Dy{sup 3+} powder used to prepare the films. Photoluminescence (PL) emission spectra of the films were characterized by major green emission with a maximum at {approx}520 nm and minor red emission with a maximum at 630 nm. The green and red photoluminescence at 520 and 630 nm are associated with the 4f{sup 6}5d{yields}4f{sup 7}({sup 8}S{sub 7/2}) and {sup 5}D{sub 0}-{sup 7}F{sub 2} transitions of Eu{sup 2+} and residual Eu{sup 3+} ions, respectively. Brighter films were shown to have relatively higher values of the root mean square surface roughness, which were determined from the atomic force microscopy data. The effects of processing parameters on the PL intensity are discussed.

Ntwaeaborwa, O. M.; Nsimama, P. D.; Pitale, Shreyas; Nagpure, I. M.; Kumar, Vinay; Coetsee, E.; Terblans, J. J.; Swart, H. C.; Sechogela, P. T. [Department of Physics, University of the Free State, Bloemfontein ZA 9300 (South Africa); Materials Research Department, Ithemba Labs, Somerset West ZA7130 (South Africa)

2010-07-15T23:59:59.000Z

123

Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using HfO2 ceramic target  

Science Conference Proceedings (OSTI)

Hafnium oxide (HfO?) thin films have been made by radio-frequency (rf) magnetron-sputtering onto Si(100) substrates under varying growth temperature (Ts). HfO? ceramic target has been employed for sputtering while varying the Ts from room temperature to 500?C during deposition. The effect of Ts on the growth and microstructure of deposited HfO? films has been studied using grazing incidence x-ray diffraction (GIXRD), X-ray photoelectron spectroscopy (XPS), and high-resolution scanning electron microscopy (HR-SEM) coupled with energy dispersive x-ray spectrometry (EDS). The results indicate that the effect of Ts is significant on the growth, surface and interface structure, morphology and chemical composition of the HfO? films. Structural characterization indicates that the HfO? films grown at Ts200 ?C are nanocrystalline. An amorphous-to-crystalline transition occurs at Ts=200 ?C. Nanocrystalline HfO? films crystallized in a monoclinic structure with a (-111) orientation. XPS measurements indicated the high surface-chemical quality and stoichiometric nature of the grown HfO? films. An interface layer (IL) formation occurs due to reaction at the HfO?-Si interface for HfO? films deposited at Ts>200 ?C. The thickness of IL increases with increasing Ts. XPS and EDS at the HfO?-Si cross-section indicate the IL is a (Hf, Si)-O compound. The electrical characterization using capacitance-voltage measurements indicate that the dielectric constant decreases from 25 to 16 with increasing Ts.

Aguirre, B.; Vemuri, R. S.; Zubia, David; Engelhard, Mark H.; Shutthanandan, V.; Kamala Bharathi, K.; Ramana, Chintalapalle V.

2011-01-01T23:59:59.000Z

124

Annealed CVD molybdenum thin film surface  

DOE Patents (OSTI)

Molybdenum thin films deposited by pyrolytic decomposition of Mo(CO).sub.6 attain, after anneal in a reducing atmosphere at temperatures greater than 700.degree. C., infrared reflectance values greater than reflectance of supersmooth bulk molybdenum. Black molybdenum films deposited under oxidizing conditions and annealed, when covered with an anti-reflecting coating, approach the ideal solar collector characteristic of visible light absorber and infrared energy reflector.

Carver, Gary E. (Tucson, AZ); Seraphin, Bernhard O. (Tucson, AZ)

1984-01-01T23:59:59.000Z

125

Thin film superconductor magnetic bearings  

DOE Patents (OSTI)

A superconductor magnetic bearing includes a shaft (10) that is subject to a load (L) and rotatable around an axis of rotation, a magnet (12) mounted to the shaft, and a stator (14) in proximity to the shaft. The stator (14) has a superconductor thin film assembly (16) positioned to interact with the magnet (12) to produce a levitation force on the shaft (10) that supports the load (L). The thin film assembly (16) includes at least two superconductor thin films (18) and at least one substrate (20). Each thin film (18) is positioned on a substrate (20) and all the thin films are positioned such that an applied magnetic field from the magnet (12) passes through all the thin films. A similar bearing in which the thin film assembly (16) is mounted on the shaft (10) and the magnet (12) is part of the stator (14) also can be constructed.

Weinberger, Bernard R. (Avon, CT)

1995-12-26T23:59:59.000Z

126

Development of Y-doped ZnO Thin Films via Novel Ink Jet Printing ...  

Science Conference Proceedings (OSTI)

Synthesis and Characterization of Plasma Polymerized Thin Films Deposited from Benzene and Hexamethyldisiloxane Using (PECVD) Method · Synthesis and ...

127

Synthesis and Patterning of Calcium and Barium Niobate Thin Films ...  

Science Conference Proceedings (OSTI)

Epitaxial CBN thin films were deposited on MgO and NSTO substrates at 800°C under 1mTorr of oxygen pressure using Pulsed Laser Deposition technique.

128

Innovative Thin Films LLC | Open Energy Information  

Open Energy Info (EERE)

Thin Films LLC Thin Films LLC Jump to: navigation, search Name Innovative Thin Films LLC Place Toledo, Ohio Zip 43607 Product Provider of altnernative energy thin film deposition technology. Coordinates 46.440613°, -122.847838° Loading map... {"minzoom":false,"mappingservice":"googlemaps3","type":"ROADMAP","zoom":14,"types":["ROADMAP","SATELLITE","HYBRID","TERRAIN"],"geoservice":"google","maxzoom":false,"width":"600px","height":"350px","centre":false,"title":"","label":"","icon":"","visitedicon":"","lines":[],"polygons":[],"circles":[],"rectangles":[],"copycoords":false,"static":false,"wmsoverlay":"","layers":[],"controls":["pan","zoom","type","scale","streetview"],"zoomstyle":"DEFAULT","typestyle":"DEFAULT","autoinfowindows":false,"kml":[],"gkml":[],"fusiontables":[],"resizable":false,"tilt":0,"kmlrezoom":false,"poi":true,"imageoverlays":[],"markercluster":false,"searchmarkers":"","locations":[{"text":"","title":"","link":null,"lat":46.440613,"lon":-122.847838,"alt":0,"address":"","icon":"","group":"","inlineLabel":"","visitedicon":""}]}

129

Thin-film Rechargeable Lithium Batteries  

DOE R&D Accomplishments (OSTI)

Thin film rechargeable lithium batteries using ceramic electrolyte and cathode materials have been fabricated by physical deposition techniques. The lithium phosphorous oxynitride electrolyte has exceptional electrochemical stability and a good lithium conductivity. The lithium insertion reaction of several different intercalation materials, amorphous V{sub 2}O{sub 5}, amorphous LiMn{sub 2}O{sub 4}, and crystalline LiMn{sub 2}O{sub 4} films, have been investigated using the completed cathode/electrolyte/lithium thin film battery.

Dudney, N. J.; Bates, J. B.; Lubben, D.

1995-06-00T23:59:59.000Z

130

Thin-film rechargeable lithium batteries  

SciTech Connect

Thin-film rechargeable lithium batteries using ceramic electrolyte and cathode materials have been fabricated by physical deposition techniques. The lithium phosphorous oxynitride electrolyte has exceptional electrochemical stability and a good lithium conductivity. The lithium insertion reaction of several different intercalation materials, amorphous V{sub 2}O{sub 5}, amorphous LiMn{sub 2}O{sub 4}, and crystalline LiMn{sub 2}O{sub 4} films, have been investigated using the completed cathode/electrolyte/lithium thin-film battery.

Dudney, N.J.; Bates, J.B.; Lubben, D. [Oak Ridge National Lab., TN (United States). Solid State Div.

1995-06-01T23:59:59.000Z

131

Relation between crystallinity and chemical nature of surface on wettability: A study on pulsed laser deposited TiO{sub 2} thin films  

SciTech Connect

Pure titania (TiO{sub 2}) polycrystalline thin films in rutile, anatase and mixed phase have been grown on amorphous glass substrates by pulsed laser deposition method at various oxygen gas pressure. Wettability investigations have been carried out on these films. Consistent with our previous report [J. Phys. D: Appl. Phys. 41, 155308 (2008)] it has been observed that for nearly same surface roughness large contact angle or superhydrophobicity is present when sample has a pure single phase and lower contact angle or hydrophobicity when mixed phases were present. Structural characterizations suggest that in addition to roughness, pure phase film surface associated with hydrophobic sites and mixed phase film surface show association of both hydrophobic and hydrophilic sites, which might be inducing specific wetting character. UV treatment induces superhydrophilicity in the films. It was observed that UV irradiation causes nonequilibrium state on the TiO{sub 2} surface, leading to changes in the electron density, which in turn produces decrement in the crystallinity and lattice expansion. Reversible changes in the wetting state on the pure phase surfaces were observed to be faster than those on the mixed phase surfaces. We tried to establish the possible relation between crystalline phases, chemical nature of surface on reversible wettability besides the main governing parameter viz. surface roughness.

Shirolkar, Mandar M. [DST Unit on Nanoscience, Indian Institute of Science Education and Research, Pune, 411021 (India); Department of Physics, University of Pune, 411007 (India); Phase, Deodatta; Sathe, Vasant; Choudhary, Ram Janay [UGC-DAE Consortium for Scientific Research Indore Centre, Indore, 452017 (India); Rodriguez-Carvajal, J. [Laboratoire Leon Brillouin (CEA-CNRS), CEA/Saclay, 91191 Gif-sur-Yvette Cedex (France); Kulkarni, Sulabha K. [DST Unit on Nanoscience, Indian Institute of Science Education and Research, Pune, 411021 India (India); Banasthali University, Banasthali, 304022 Rajasthan (India)

2011-06-15T23:59:59.000Z

132

Thin Films and Interfaces Committee  

Science Conference Proceedings (OSTI)

The Thin Films and Interfaces Committee is part of the Electronic, Magnetic, and Photonic Materials Division;. Our Mission: Promotes knowledge of the science ...

133

Superconducting thin films on potassium tantalate substrates  

DOE Patents (OSTI)

A superconductive system for the lossless transmission of electrical current comprising a thin film of superconducting material Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x epitaxially deposited upon a KTaO.sub.3 substrate. The KTaO.sub.3 is an improved substrate over those of the prior art since the it exhibits small lattice constant mismatch and does not chemically react with the superconducting film.

Feenstra, Roeland (Oak Ridge, TN); Boatner, Lynn A. (Oak Ridge, TN)

1992-01-01T23:59:59.000Z

134

Structures for dense, crack free thin films  

DOE Patents (OSTI)

The process described herein provides a simple and cost effective method for making crack free, high density thin ceramic film. The steps involve depositing a layer of a ceramic material on a porous or dense substrate. The deposited layer is compacted and then the resultant laminate is sintered to achieve a higher density than would have been possible without the pre-firing compaction step.

Jacobson, Craig P. (Lafayette, CA); Visco, Steven J. (Berkeley, CA); De Jonghe, Lutgard C. (Lafayette, CA)

2011-03-08T23:59:59.000Z

135

Thin films: Past, present, future  

DOE Green Energy (OSTI)

This report describes the characteristics of the thin film photovoltaic modules necessary for an acceptable rate of return for rural areas and underdeveloped countries. The topics of the paper include a development of goals of cost and performance for an acceptable PV system, a review of current technologies for meeting these goals, issues and opportunities in thin film technologies.

Zweibel, K.

1995-04-01T23:59:59.000Z

136

NIST Hydrogen Storage in Thin Films  

Science Conference Proceedings (OSTI)

Hydrogen Storage Optimization in Thin Film Combinatorial Alloys. ... Magnesium Thin Films," International Journal of Hydrogen Energy, doi:10.1016/j ...

2013-04-01T23:59:59.000Z

137

Metals Thin-Films Information at NIST  

Science Conference Proceedings (OSTI)

NIST Home > Metals Thin-Films Information at NIST. Metals Thin-Films Information at NIST. (the links below are a compilation ...

2010-05-24T23:59:59.000Z

138

Optical Characterization of Advanced Thin Films  

Science Conference Proceedings (OSTI)

... Recently, thin films of spun-cast poly(2,5-bis(3-alkylthiophen ... been demonstrated to exhibit exceptional hole mobilities in thin film transistors (TFTs ...

2012-10-02T23:59:59.000Z

139

Thin Film Solar Technologies | Open Energy Information  

Open Energy Info (EERE)

Login | Sign Up Search Page Edit with form History Facebook icon Twitter icon Thin Film Solar Technologies Jump to: navigation, search Name Thin Film Solar Technologies...

140

Interfaces in Nanostructured Functional Oxide Thin Films  

Science Conference Proceedings (OSTI)

The thin film systems include high temperature superconductors (HTS), thin film solid oxide fuel cells (SOFC), and other functional oxide systems. Detailed ...

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


141

Magnetron-sputter deposition of Fe{sub 3}S{sub 4} thin films and their conversion into pyrite (FeS{sub 2}) by thermal sulfurization for photovoltaic applications  

SciTech Connect

The authors report on the fabrication of FeS{sub 2} (pyrite) thin films by sulfurizing Fe{sub 3}S{sub 4} that were deposited by direct current magnetron sputtering at room temperature. Under the selected sputtering conditions, Fe{sub 3}S{sub 4} nanocrystal films are obtained and the nanocrystals tend to locally cluster and closely pack into ricelike nanoparticles with an increase in film thickness. Meanwhile, the film tends to crack when the film thickness is increased over {approx}1.3 {mu}m. The film cracking can be effectively suppressed by an introduction of a 3-nm Cu intermediate layer prior to Fe{sub 3}S{sub 4} deposition. However, an introduction of a 3-nm Al intermediate layer tends to enhance the film cracking. By post-growth thermal sulfurization of the Fe{sub 3}S{sub 4} thin films in a tube-furnace, FeS{sub 2} with high phase purity, as determined by using x ray diffraction, is obtained. Optical absorption spectroscopy was employed to characterize the resultant FeS{sub 2} thin films, which revealed two absorption edges at 0.9 and 1.2 eV, respectively. These two absorption edges are assigned to the direct bandgap (0.9 eV) and the indirect allowed transitions (1.2 eV) of FeS{sub 2}, respectively.

Liu Hongfei; Chi Dongzhi [Institute of Materials Research and Engineering (IMRE), A-STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602 (Singapore)

2012-07-15T23:59:59.000Z

142

Long-laser-pulse method of producing thin films  

DOE Patents (OSTI)

The invention described herein arose in the course of, or under, Contract No. DE-C03-76SF0098 between the United States Department of Energy and the University of California. This invention relates in general to techniques for producing thin films, and in particular to a method of using pulsed laser to deposit high temperature supercoducting thin films. 5 figs.

Balooch, M.; Olander, D.R.; Russo, R.E.

1990-02-20T23:59:59.000Z

143

CFN | Thin Films Group  

NLE Websites -- All DOE Office Websites (Extended Search)

Materials Synthesis and Characterization Facility Materials Synthesis and Characterization Facility Thin-Film Processing Facility Online Manager (FOM) website FOM manual ESR for lab 1L32 (High-Resolution SEM and x-ray microanalysis) CFN Operations Safety Awareness (COSA) form for 1L32 (ESR #1) Technical article on LABE detector (Analytical SEM) Request form for off-hours access (.doc, First time only, renewals done via email) Lab Tool capabilities Primary contact Training schedule Backup contact Booking calendar Booking rules SOP 1L32 Analytical SEM Camino Thurs 10-12 PM Stein FOM yes yes Hitachi S-4800 SEM Stein Tues 1-3 PM Black FOM no yes booking calendar: yes = need to reserve tool time in calendar before using tool booking rules: yes = specific rules exist for reserving tool time SOP = standard operating procedure (basic instructions)

144

Metal film deposition by laser breakdown chemical vapor deposition  

Science Conference Proceedings (OSTI)

Dielectric breakdown of gas mixtures can be used to deposit homogeneous thin films by chemical vapor deposition with appropriate control of flow and pressure conditions to suppress gas phase nucleation and particle formation. Using a pulsed CO/sub 2/ laser operating at 10.6 microns where there is no significant resonant absorption in any of the source gases, we have succeeded in depositing homogeneous films from several gas phase precursors by gas phase laser pyrolysis. Nickel and molybdenum from the respective carbonyls and tungsten from the hexafluoride have been examined to date. In each case the gas precursor is buffered to reduce the partial pressure of the reactants and to induce breakdown. The films are spectrally reflective and uniform over a large area. Films have been characterized by Auger electron spectroscopy, x-ray diffraction, pull tests, and resistivity measurements. The highest quality films have resulted from the nickel depositions. Detailed x-ray diffraction analysis of these films yields a very small domain size (approx. 50 A) consistent with rapid quenching from the gas phase reaction zone. This analysis also shows nickel carbide formation consistent with the temperature of the reaction zone and the Auger electron spectroscopy results which show some carbon and oxygen incorporation (8% and 1% respectively). Gas phase transport and condensation of the molybdenum carbonyl results in substantial carbon and oxygen contamination of the molybdenum films requiring heated substrates, a requirement not consistent with the goals of the program to maximize the quench rate of the deposition. Results from tungsten deposition experiments representing a reduction chemistry instead of the decomposition chemistry involved in the carbonyl experiments are also reported.

Jervis, T.R.

1985-01-01T23:59:59.000Z

145

Chemical surface deposition of ultra-thin semiconductors  

DOE Patents (OSTI)

A chemical surface deposition process for forming an ultra-thin semiconducting film of Group IIB-VIA compounds onto a substrate. This process eliminates particulates formed by homogeneous reactions in bath, dramatically increases the utilization of Group IIB species, and results in the formation of a dense, adherent film for thin film solar cells. The process involves applying a pre-mixed liquid coating composition containing Group IIB and Group VIA ionic species onto a preheated substrate. Heat from the substrate causes a heterogeneous reaction between the Group IIB and VIA ionic species of the liquid coating composition, thus forming a solid reaction product film on the substrate surface.

McCandless, Brian E. (243 W. Main St., Elkton, MD 21921); Shafarman, William N. (1905 N. Van Buren St., Wilmington, DE 19802)

2003-03-25T23:59:59.000Z

146

Method for synthesizing thin film electrodes  

SciTech Connect

A method for making a thin-film electrode, either an anode or a cathode, by preparing a precursor solution using an alkoxide reactant, depositing multiple thin film layers with each layer approximately 500 1000 .ANG. in thickness, and heating the layers to above 600.degree. C. to achieve a material with electrochemical properties suitable for use in a thin film battery. The preparation of the anode precursor solution uses Sn(OCH.sub.2C(CH.sub.3).sub.3).sub.2 dissolved in a solvent in the presence of HO.sub.2CCH.sub.3 and the cathode precursor solution is formed by dissolving a mixture of (Li(OCH.sub.2C(CH.sub.3).sub.3)).sub.8 and Co(O.sub.2CCH.sub.3).H.sub.2O in at least one polar solvent.

Boyle, Timothy J. (Albuquerque, NM)

2007-03-13T23:59:59.000Z

147

Variable temperature semiconductor film deposition  

DOE Patents (OSTI)

A method of depositing a semiconductor material on a substrate is disclosed. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

Li, X.; Sheldon, P.

1998-01-27T23:59:59.000Z

148

Chemical vapor deposition of amorphous semiconductor films. Final subcontract report  

DOE Green Energy (OSTI)

Chemical vapor deposition (CVD) from higher order silanes has been studied for fabricating amorphous hydrogenated silicon thin-film solar cells. Intrinsic and doped a-Si:H films were deposited in a reduced-pressure, tubular-flow reactor, using disilane feed-gas. Conditions for depositing intrinsic films at growth rates up to 10 A/s were identified. Electrical and optical properties, including dark conductivity, photoconductivity, activation energy, optical absorption, band-gap and sub-band-gap absorption properties of CVD intrinsic material were characterized. Parameter space for depositing intrinsic and doped films, suitable for device analysis, was identified.

Rocheleau, R.E.

1984-12-01T23:59:59.000Z

149

Thin Film and nanostructure Processing Staff  

Science Conference Proceedings (OSTI)

Thin Film Nanostructure Staff Directory. John Bonevich, Group Leader. Shari Beauchamp, Office Assistant. STAFF & NRC POSTDOCS. ...

2013-06-11T23:59:59.000Z

150

ITO Thin Films by RF Sputtering for Ethanol Sensing  

Science Conference Proceedings (OSTI)

The sensor for detection of ethanol vapours using RF sputter deposited ITO thin film on glass and Si substrates is reported. The principle of operation is the change of resistance of ITO film on exposure to ethanol vapours. The films were annealed at ... Keywords: Indium Tin Oxide, RF sputtering, ethanol sensor

Sudhir Chandra; H. J. Pandya; A. L. Vyas

2010-07-01T23:59:59.000Z

151

Anomalous Chemical Expansion Behavior of Pr[subscript 0.2]Ce[subscript 0.8]O[subscript 2-?] Thin Films Grown by Pulsed Laser Deposition  

E-Print Network (OSTI)

The chemomechanical and electrical properties of (Pr,Ce)O[subscript 2-?] thin films were studied between 30 and 875°C in air by in situ X-ray diffraction and complex impedance spectroscopy measurements. Reduction/oxidation ...

Kuru, Y.

152

Physical vapor deposition and patterning of calcium fluoride films  

Science Conference Proceedings (OSTI)

Physical vapor deposition of calcium fluoride (CaF{sub 2}) thin films was performed via electron beam evaporation, resistive/thermal evaporation, and nonreactive radio frequency sputtering. Patterning of the resultant ''usable'' thin films was then also attempted in several ways, including by shadow mask deposition, liftoff, and direct chemical etching. Resistive evaporation produced the most stable films, having polycrystalline morphology with a moderately strong preference to the 331 orientation. The cleanest patterning results were obtained via a polymer/metal liftoff. The results and implications of each of the various deposition and patterning techniques are discussed.

Pinol, L.; Rebello, K.; Caruso, K.; Francomacaro, A. S.; Coles, G. L. [Applied Physics Laboratory, Johns Hopkins University, Laurel, Maryland 20723 (United States)

2011-03-15T23:59:59.000Z

153

Method of improving field emission characteristics of diamond thin films  

DOE Patents (OSTI)

A method of preparing diamond thin films with improved field emission properties. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display.

Krauss, Alan R. (Naperville, IL); Gruen, Dieter M. (Downer Grove, IL)

1999-01-01T23:59:59.000Z

154

Self-catalyzed chemical vapor deposition method for the growth of device-quality metal thin films  

Science Conference Proceedings (OSTI)

Deposition of metals and alloys was demonstrated using thermal chemical vapor deposition starting from commercially available precursors in the absence of molecular hydrogen. The adopted chemical strategy relies solely on the selective reactivity of ... Keywords: CVD of metals, Chemical reduction, Direct liquid injection, Pulsed spray evaporation

N. Bahlawane; P. Antony Premkumar; K. Onwuka; G. Reiss; K. Kohse-Höinghaus

2007-11-01T23:59:59.000Z

155

Thin film cadmium telluride photovoltaic cells  

DOE Green Energy (OSTI)

This report describes research to develop to vacuum-based growth techniques for CdTe thin-film solar cells: (1) laser-driven physical vapor deposition (LDPVD) and (2) radio-frequency (rf) sputtering. The LDPVD process was successfully used to deposit thin films of CdS, CdTe, and CdCl{sub 2}, as well as related alloys and doped semiconductor materials. The laser-driven deposition process readily permits the use of several target materials in the same vacuum chamber and, thus, complete solar cell structures were fabricated on SnO{sub 2}-coated glass using LDPVD. The rf sputtering process for film growth became operational, and progress was made in implementing it. Time was also devoted to enhancing or implementing a variety of film characterization systems and device testing facilities. A new system for transient spectroscopy on the ablation plume provided important new information on the physical mechanisms of LDPVD. The measurements show that, e.g., Cd is predominantly in the neutral atomic state in the plume but with a fraction that is highly excited internally ({ge} 6 eV), and that the typical neutral Cd translational kinetic energies perpendicular to the target are 20 eV and greater. 19 refs.

Compaan, A.; Bohn, R. (Toledo Univ., OH (United States))

1992-04-01T23:59:59.000Z

156

Room-temperature MBE deposition, thermoelectric properties, and advanced structural characterization of binary Bi[subscript 2]Te[subscript 3] and Sb[subscript 2]Te[subscript 3] thin films  

Science Conference Proceedings (OSTI)

Sb{sub 2}Te{sub 3} and Bi{sub 2}Te{sub 3} thin films were grown at room temperature on SiO{sub 2} and BaF{sub 2} substrates using molecular beam epitaxy. A layer-by-layer growth was achieved such that metallic layers of the elements with 0.2 nm thickness were deposited. The layer structure in the as-deposited films was confirmed by X-ray diffraction and was seen more clearly in Sb{sub 2}Te{sub 3} thin films. Subsequent annealing was done at 250 C for 2 h and produced the Sb{sub 2}Te{sub 3} and Bi{sub 2}Te{sub 3} crystal structure as confirmed by high-energy X-ray diffraction. This preparation process is referred to as nano-alloying and it was demonstrated to yield single-phase thin films of these compounds. In the thin films a significant texture could be identified with the crystal c axis being almost parallel to the growth direction for Sb{sub 2}Te{sub 3} and tilted by about 30{sup o} for Bi{sub 2}Te{sub 3} thin films. In-plane transport properties were measured for the annealed films at room temperature. Both films yielded a charge carrier density of about 2.6 x 10{sup 19} cm{sup -3}. The Sb{sub 2}Te{sub 3} films were p-type, had a thermopower of +130 {micro}V K{sup -1}, and surprisingly high mobilities of 402 cm{sup 2} V{sup -1} s{sup -1}. The Bi{sub 2}Te{sub 3} films were n-type, showed a thermopower of -153 {micro}V K{sup -1}, and yielded significantly smaller mobilities of 80 cm2 V{sup -1} s{sup -1}. The chemical composition and microstructure of the films were investigated by transmission electron microscopy (TEM) on cross sections of the thin films. The grain sizes were about 500 nm for the Sb{sub 2}Te{sub 3} and 250 nm for the Bi{sub 2}Te{sub 3} films. In the Bi{sub 2}Te{sub 3} thin film, energy-filtered TEM allowed to image a Bi-rich grain boundary phase, several nanometers thick. This secondary phase explains the poor mobilities of the Bi{sub 2}Te{sub 3} thin film. With these results the high potential of the nano-alloying deposition technique for growing films with a more complex layer architecture is demonstrated.

Peranio, N.; Winkler, M.; Bessas, D.; Aabdin, Z.; König, J.; Böttner, H.; Hermann, R.P.; Eibl, O. (Julich); (Tubingen); (Fraunhofer)

2012-10-23T23:59:59.000Z

157

Applications of Passive Thin Films  

DOE Green Energy (OSTI)

The physical properties of thin films affect the performance and durability of nearly every solar energy conversion device. Familiar examples of thin films for solar applications are optical materials and protective coatings. Optimized optical properties are key to cost-effective photothermal conversion where individual components must have high absorptance, reflectance, or transmittance. The protection of sensitive substrates from corrosion and/or erosion is essential to ensure adequate component and system lifetime. Such substrates range from photovoltaic materials operating near room temperature to turbine blade structural alloys in hostile environments at very high temperatures (>1,000 degrees C). Although much has been written on particular categories of thin-film materials for solar energy (for example, absorbers for receiver surfaces), to date no one has provided an overview of the spectrum of applications for passive thin films in solar energy. This work is such an overview and also reviews the material state of the art as described in the current literature. Active thin film devices such as photovoltaics and thermoeleetrics are not discussed.

Call, P. J.

1979-05-01T23:59:59.000Z

158

Characterization of photoluminescent (Y{sub 1{minus}x}Eu{sub x}){sub 2}O{sub 3} thin-films prepared by metallorganic chemical vapor deposition  

SciTech Connect

Europium doped yttrium oxide, (Y{sub 1{minus}x}Eu{sub x}){sub 2}O{sub 3}, thin-films were deposited on silicon and sapphire substrates by metallorganic chemical vapor deposition (MOCVD). The films were grown in a MOCVD chamber reacting yttrium and europium tris(2,2,6,6-tetramethyl-3,5,-heptanedionates) precursors in an oxygen atmosphere at low pressures (5 Torr) and low substrate temperatures (500--700 C). The films deposited at 500 C were flat and composed of nanocrystalline regions of cubic Y{sub 2}O{sub 3}, grown in a textured [100] or [110] orientation to the substrate surface. Films deposited at 600 C developed from the flat, nanocrystalline morphology into a plate-like growth morphology oriented in the [111] with increasing deposition time. Monoclinic Y{sub 2}O{sub 3}:Eu{sup 3+} was observed in x-ray diffraction for deposition temperatures {ge}600 C on both (111) Si and (001) sapphire substrates. This was also confirmed by the photoluminescent emission spectra.

McKittrick, J.; Bacalski, C.F.; Hirata, G.A. [Univ. of California, San Diego, La Jolla, CA (United States); Hubbard, K.M.; Pattillo, S.G.; Salazar, K.V.; Trkula, M. [Los Alamos National Lab., NM (United States). Materials Science and Technology Div.

1998-12-01T23:59:59.000Z

159

Thin-film Lithium Batteries  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin-Film Battery with Lithium Anode Courtesy of Oak Ridge National Laboratory, Materials Science and Technology Division Thin-Film Lithium Batteries Resources with Additional Information The Department of Energy's 'Oak Ridge National Laboratory (ORNL) has developed high-performance thin-film lithium batteries for a variety of technological applications. These batteries have high energy densities, can be recharged thousands of times, and are only 10 microns thick. They can be made in essentially any size and shape. Recently, Teledyne licensed this technology from ORNL to make batteries for medical devices including electrocardiographs. In addition, new "textured" cathodes have been developed which have greatly increased the peak current capability of the batteries. This greatly expands the potential medical uses of the batteries, including transdermal applications for heart regulation.'

160

Surface Sensitive Scattering from Thin Films  

Science Conference Proceedings (OSTI)

... Thin films of few tenths of angstroms are becoming the staple of the electronic ... a powerful tool for the basic understanding of the film microstructure. ...

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
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to obtain the most current and comprehensive results.


161

Thin-film forces in pseudoemulsion films  

SciTech Connect

Use of foam for enhanced oil recovery (EOR) has shown recent success in steam-flooding field applications. Foam can also provide an effective barrier against gas coning in thin oil zones. Both of these applications stem from the unique mobility-control properties a stable foam possesses when it exists in porous media. Unfortunately, oil has a major destabilizing effect on foam. Therefore, it is important for EOR applications to understand how oil destroys foam. Studies all indicate that stabilization of the pseudoemulsion film is critical to maintain foam stability in the presence of oil. Hence, to aid in design of surfactant formulations for foam insensitivity to oil the authors pursue direct measurement of the thin-film or disjoining forces that stabilize pseudoemulsion films. Experimental procedures and preliminary results are described.

Bergeron, V.; Radke, C.J. [California Univ., Berkeley, CA (United States). Dept. of Chemical Engineering]|[Lawrence Berkeley Lab., CA (United States)

1991-06-01T23:59:59.000Z

162

Semiconductor-nanocrystal/conjugated polymer thin films  

DOE Patents (OSTI)

The invention described herein provides for thin films and methods of making comprising inorganic semiconductor-nanocrystals dispersed in semiconducting-polymers in high loading amounts. The invention also describes photovoltaic devices incorporating the thin films.

Alivisatos, A. Paul (Oakland, CA); Dittmer, Janke J. (Munich, DE); Huynh, Wendy U. (Munich, DE); Milliron, Delia (Berkeley, CA)

2010-08-17T23:59:59.000Z

163

Thin film-coated polymer webs  

DOE Patents (OSTI)

The present invention relates to thin film-coated polymer webs, and more particularly to thin film electronic devices supported upon a polymer web, wherein the polymer web is treated with a purifying amount of electron beam radiation.

Wenz, Robert P. (Cottage Grove, MN); Weber, Michael F. (Shoreview, MN); Arudi, Ravindra L. (Woodbury, MN)

1992-02-04T23:59:59.000Z

164

Thin Film Photovoltaics - Programmaster.org  

Science Conference Proceedings (OSTI)

Thin Film Structures for Energy Efficient Systems: Thin Film Photovoltaics ... Full- inorganic Heterojunction Ink-printed Solar Cells: Seigo Ito1; 1University of Hyogo ... electrochemical impedance spectroscopy (EIS) measurements were used for ...

165

Magnetoelectric Multiferroic Thin Films and Multilayers  

Science Conference Proceedings (OSTI)

Scope, The symposium will cover thin films, single crystals, normal/relaxor ferroelectrics, piezoelectric ceramics, magnetoelectric composites, multiferroic ...

166

Magnetic behaviour of europium epitaxial thin films  

Science Conference Proceedings (OSTI)

... Magnetic behaviour of europium epitaxial thin films. Philippe Mangin, University of Nancy and NCNR. We present the magnetic ...

167

MST: Organizations: Thin Film, Vacuum, and Packaging  

NLE Websites -- All DOE Office Websites (Extended Search)

Processes & Services Electronic Fabrication Manufacturing Process Science & Technology Thin Film, Vacuum, & Packaging Organic Materials Ceramic & Glass Meso Manufacturing &...

168

Quick, Efficient Film Deposition for Nanomaterials - Energy ...  

Electricity Transmission; Energy Analysis; ... • Films can be deposited uniformly in a one-step deposition of nanoparticles with optimized drop distri ...

169

H2 carrier gas dependence of Young's modulus and hardness of chemical vapor deposited polycrystalline 3C-SiC thin films  

Science Conference Proceedings (OSTI)

This paper presents the mechanical properties of poly (polycrystalline) 3C-SiC thin films according to 0%, 7%, and 10% carrier gas (H"2) concentrations using nano-indentation. When H"2 concentration was 10%, it has been proved that the mechanical properties, ... Keywords: AFM, Hardness, Nano-indentation, Poly 3C-SiC, Young's modulus

Gwiy-Sang Chung; Ki-Bong Han

2008-12-01T23:59:59.000Z

170

Electrochemical Behavior and Li Diffusion Study of LiCoO? Thin Film Electrodes Prepared by PLD  

E-Print Network (OSTI)

Preferred c-axis oriented LiCoO? thin films were prepared on the SiO?/Si (SOS) substrates by pulsed laser deposition (PLD). Thin film electrodes without carbon and binder are ideal samples to study the electrochemical ...

Xia, H.

171

Thin-Film Active Nano-PWAS for Structural Health Monitoring , Victor Giurgiutiu1  

E-Print Network (OSTI)

Thin-Film Active Nano-PWAS for Structural Health Monitoring Bin Lin1 , Victor Giurgiutiu1 , Amar S be fabricated directly to the structural substrate using thin-film nano technologies (e.g., pulsed-laser deposition, sputtering, chemical vapor deposition, etc.) Because these novel PWAS are made up of nano layers

Giurgiutiu, Victor

172

Nanostructured thin films for solid oxide fuel cells  

E-Print Network (OSTI)

The goals of this work were to synthesize high performance perovskite based thin film solid oxide fuel cell (TF-SOFC) cathodes by pulsed laser deposition (PLD), to study the structural, electrical and electrochemical properties of these cathodes and to establish structure-property relations for these cathodes in order to further improve their properties and design new structures. Nanostructured cathode thin films with vertically-aligned nanopores (VANP) were processed using PLD. These VANP structures enhance the oxygen-gas phase diffusivity, thus improve the overall TF-SOFC performance. La0.5Sr0.5CoO3 (LSCO) and La0.4Sr0.6Co0.8Fe0.2O3 (LSCFO) were deposited on various substrates (YSZ, Si and pressed Ce0.9Gd0.1O1.95 (CGO) disks). Microstructures and properties of the nanostructured cathodes were characterized by transmission electron microscope (TEM), high resolution TEM (HRTEM), scanning electron microscope (SEM) and electrochemical impedance spectroscopy (EIS) measurements. A thin layer of vertically-aligned nanocomposite (VAN) structure was deposited in between the CGO electrolyte and the thin film LSCO cathode layer for TF-SOFCs. The VAN structure consists of the electrolyte and the cathode materials in the composition of (CGO) 0.5 (LSCO) 0.5. The self-assembled VAN nanostructures contain highly ordered alternating vertical columns formed through a one-step thin film deposition using a PLD technique. These VAN structures significantly increase the interface area between the electrolyte and the cathode as well as the area of active triple phase boundary (TPB), thus improving the overall TF-SOFC performance at low temperatures, as low as 400oC, demonstrated by EIS measurements. In addition, the binary VAN interlayer could act as the transition layer that improves the adhesion and relieves the thermal stress and lattice strain between the cathode and the electrolyte. The microstructural properties and growth mechanisms of CGO thin film prepared by PLD technique were investigated. Thin film CGO electrolytes with different grain sizes and crystal structures were prepared on single crystal YSZ substrates under different deposition conditions. The effect of the deposition conditions such as substrate temperature and laser ablation energy on the microstructural properties of these films are examined using XRD, TEM, SEM, and optical microscope. CGO thin film deposited above 500 ºC starts to show epitaxial growth on YSZ substrates. The present study suggests that substrate temperature significantly influences the microstructure of the films especially film grain size.

Yoon, Jongsik

2008-12-01T23:59:59.000Z

173

Active superconducting devices formed of thin films  

DOE Patents (OSTI)

Active superconducting devices are formed of thin films of superconductor which include a main conduction channel which has an active weak link region. The weak link region is composed of an array of links of thin film superconductor spaced from one another by voids and selected in size and thickness such that magnetic flux can propagate across the weak link region when it is superconducting. Magnetic flux applied to the weak link region will propagate across the array of links causing localized loss of superconductivity in the links and changing the effective resistance across the links. The magnetic flux can be applied from a control line formed of a superconducting film deposited coplanar with the main conduction channel and weak link region on a substrate. The devices can be formed of any type to superconductor but are particularly well suited to the high temperature superconductors since the devices can be entirely formed from coplanar films with no overlying regions. The devices can be utilized for a variety of electrical components, including switching circuits, amplifiers, oscillators and modulators, and are well suited to microwave frequency applications.

Martens, Jon S. (Madison, WI); Beyer, James B. (Madison, WI); Nordman, James E. (Madison, WI); Hohenwarter, Gert K. G. (Madison, WI)

1991-05-28T23:59:59.000Z

174

Rechargeable thin-film lithium batteries  

SciTech Connect

Rechargeable thin-film batteries consisting of lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have recently been developed. The batteries, which are typically less than 6-{mu}m thick, can be fabricated to any specified size, large or small, onto a variety of substrates including ceramics, semiconductors, and plastics. The cells that have been investigated include Li-TiS{sub 2}, Li-V{sub 2}O{sub 5}, and Li-Li{sub x}Mn{sub 2}O{sub 4}, with open circuit voltages at full charge of about 2.5, 3.6, and 4.2, respectively. The development of these batteries would not have been possible without the discovery of a new thin-film lithium electrolyte, lithium phosphorus oxynitride, that is stable in contact with metallic lithium at these potentials. Deposited by rf magnetron sputtering of Li{sub 3}PO{sub 4} in N{sub 2}, this material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46} and a conductivity at 25{degrees}C of 2 {mu}S/cm. The maximum practical current density obtained from the thin-film cells is limited to about 100 {mu}A/cm{sup 2} due to a low diffusivity of Li{sup +} ions in the cathodes. In this work, the authors present a short review of their work on rechargeable thin-film lithium batteries.

Bates, J.B.; Gruzalski, G.R.; Dudney, N.J.; Luck, C.F.; Yu, Xiaohua

1993-08-01T23:59:59.000Z

175

Thin film photovoltaic device and process of manufacture  

DOE Patents (OSTI)

Provided is a thin film photovoltaic device and a method of manufacturing the device. The thin film photovoltaic device comprises a film layer having particles which are smaller than about 30 microns in size held in an electrically insulating matrix material to reduce the potential for electrical shorting through the film layer. The film layer may be provided by depositing preformed particles onto a surrogate substrate and binding the particles in a film-forming matrix material to form a flexible sheet with the film layer. The flexible sheet may be separated from the surrogate substrate and cut into flexible strips. A plurality of the flexible strips may be located adjacent to and supported by a common supporting substrate to form a photovoltaic module having a plurality of electrically interconnected photovoltaic cells. 13 figs.

Albright, S.P.; Chamberlin, R.

1997-10-07T23:59:59.000Z

176

Thin film photovoltaic device and process of manufacture  

DOE Patents (OSTI)

Provided is a thin film photovoltaic device and a method of manufacturing the device. The thin film photovoltaic device comprises a film layer having particles which are smaller than about 30 microns in size held in an electrically insulating matrix material to reduce the potential for electrical shorting through the film layer. The film layer may be provided by depositing preformed particles onto a surrogate substrate and binding the particles in a film-forming matrix material to form a flexible sheet with the film layer. The flexible sheet may be separated from the surrogate substrate and cut into flexible strips. A plurality of the flexible strips may be located adjacent to and supported by a common supporting substrate to form a photovoltaic module having a plurality of electrically interconnected photovoltaic cells.

Albright, Scot P. (Lakewood, CO); Chamberlin, Rhodes (El Paso, TX)

1997-10-07T23:59:59.000Z

177

Thin film photovoltaic device and process of manufacture  

DOE Patents (OSTI)

Provided is a thin film photovoltaic device and a method of manufacturing the device. The thin film photovoltaic device comprises a film layer having particles which are smaller than about 30 microns in size held in an electrically insulating matrix material to reduce the potential for electrical shorting through the film layer. The film layer may be provided by depositing preformed particles onto a surrogate substrate and binding the particles in a film-forming matrix material to form a flexible sheet with the film layer. The flexible sheet may be separated from the surrogate substrate and cut into flexible strips. A plurality of the flexible strips may be located adjacent to and supported by a common supporting substrate to form a photovoltaic module having a plurality of electrically interconnected photovoltaic cells. 13 figs.

Albright, S.P.; Chamberlin, R.

1999-02-09T23:59:59.000Z

178

Thin film photovoltaic device and process of manufacture  

DOE Patents (OSTI)

Provided is a thin film photovoltaic device and a method of manufacturing the device. The thin film photovoltaic device comprises a film layer having particles which are smaller than about 30 microns in size held in an electrically insulating matrix material to reduce the potential for electrical shorting through the film layer. The film layer may be provided by depositing preformed particles onto a surrogate substrate and binding the particles in a film-forming matrix material to form a flexible sheet with the film layer. The flexible sheet may be separated from the surrogate substrate and cut into flexible strips. A plurality of the flexible strips may be located adjacent to and supported by a common supporting substrate to form a photovoltaic module having a plurality of electrically interconnected photovoltaic cells.

Albright, Scot P. (Lakewood, CO); Chamberlin, Rhodes (El Paso, TX)

1999-02-09T23:59:59.000Z

179

Pulsed laser processing of high temperature superconducting thin films  

SciTech Connect

Systematic studies of the effects of pulsed laser deposition processing parameters on plume dynamics and resultant film properties have been performed. Plume angular distributions, cos{sup m}({theta}), were observed to be variable between 1 > m > 10 depending on laser energy density and spot size. Under optimized conditions, epitaxial, superconducting thin films could be grown in-situ on a variety of single-crystal substrates. High quality, 200 nm thick films were obtained at deposition rates approaching 15 nm/sec. Additionally, the patterning of YBa{sub 2}Cu{sub 3}O{sub 7-x} thin films has been achieved by a process which combines thermal oxygen diffusion and laser annealing. This process is performed under relatively mild conditions which allows the structural integrity of the films to be preserved. 9 refs., 6 figs.

Muenchausen, R.E.; Dye, R.C.; Estler, R.C.; Foltyn, S.; Garcia, A.R.; Hubbard, K.M.; Nogar, N.S.; Wu, X.D. (Los Alamos National Lab., NM (USA)); Carim, A.; Mukherjee, A.; Brueck, S.R.J. (New Mexico Univ., Albuquerque, NM (USA))

1990-01-01T23:59:59.000Z

180

Surface modeling of thin film growth: A study of silicon oxide deposition from tetraethoxysilane and silicon deposition from disilane on the Si(100) surface  

SciTech Connect

In this thesis, surface reactions brought about by the pyrolysis of adsorbed TEOS, the modeling of this reaction with ethanol, and the photolysis of adsorbed disilane have been investigated under ultrahigh vacuum conditions, using mainly temperature programmed desorption (TPD). TEOS molecularly desorbs at about 195K when adsorbed on clean Si(100) at low temperatures. When adsorbed at 300K, the primary surface species produced is a mixture of ethoxysiloxanes. Upon heating the surface in vacuum, the adsorbed ethoxysiloxanes decompose the evolve ethylene and hydrogen, with trace production of acetylene and acetaldehyde. In a parallel study, the adsorption and subsequent deposition of ethanol (C[sub 2]H[sub 5]OH, C[sub 2]D[sub 5]OD, and CH[sub 3]CD[sub 2]OH) on Si(100) has been shown to model the TEOS system. The molecular desorption temperature is ca. 150K. When adsorbed at 200K, ethanol dissociatively chemisorbs as an ethoxide and the monohydride species. The adlayer decomposes at higher temperature to evolve ethylene, hydrogen, acetaldehyde, and acetylene. The adsorption and decomposition of ethanol on Si(100)-2x1:H has also been studied in gathering additional information about the competition between distinct decomposition mechanisms, and the nature of the reaction site. In the Si[sub 2]H[sub 6]/Si(100) system, with no UV irradiation, disilane adsorption at 120K produces a chemisorbed SiH[sub x] (x = 1 - 3) layer and, for high exposures, a disilane multilayer. Upon heating the surface in vacuum, molecular desorption is observed at ca. 150K, while hydrogen and silane are evolved at much higher temperatures. For Si[sub 2]H[sub 6] exposure during photo-irradiation, the desorption yields of hydrogen and silane are enhanced. Model studies using the partially and fully deuterated Si(100)-2x1:D surface reveals that the photo-induced surface reaction is dominated by an insertion reaction by the photo-generated silylene species.

Cho, Hee-Chuen.

1993-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


181

Effects of laser energy fluence on the onset and growth of the Rayleigh-Taylor instabilities and its influence on the topography of the Fe thin film grown in pulsed laser deposition facility  

SciTech Connect

The effect of laser energy fluence on the onset and growth of Rayleigh-Taylor (RT) instabilities in laser induced Fe plasma is investigated using time-resolved fast gated imaging. The snow plow and shock wave models are fitted to the experimental results and used to estimate the ablation parameters and the density of gas atoms that interact with the ablated species. It is observed that RT instability develops during the interface deceleration stage and grows for a considerable time for higher laser energy fluence. The effects of RT instabilities formation on the surface topography of the Fe thin films grown in pulsed laser deposition system are investigated (i) using different laser energy fluences for the same wavelength of laser radiation and (ii) using different laser wavelengths keeping the energy fluence fixed. It is concluded that the deposition achieved under turbulent condition leads to less smooth deposition surfaces with bigger sized particle agglomerates or network.

Mahmood, S. [National Institute of Education, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616 (Singapore); Department of Physics, University of Karachi, Karachi 75270 (Pakistan); Rawat, R. S.; Wang, Y.; Lee, S.; Tan, T. L.; Springham, S. V.; Lee, P. [National Institute of Education, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616 (Singapore); Zakaullah, M. [Department of Physics, Quaid-i-Azam University, 45320 Islamabad (Pakistan)

2012-10-15T23:59:59.000Z

182

Method of producing amorphous thin films  

DOE Patents (OSTI)

Disclosed is a method of producing thin films by sintering which comprises: a. coating a substrate with a thin film of an inorganic glass forming parulate material possessing the capability of being sintered, and b. irridiating said thin film of said particulate material with a laser beam of sufficient power to cause sintering of said material below the temperature of liquidus thereof. Also disclosed is the article produced by the method claimed.

Brusasco, Raymond M. (Livermore, CA)

1992-01-01T23:59:59.000Z

183

High-rate deposition of hydrogenated amorphous silicon films and devices  

DOE Green Energy (OSTI)

This report summarizes the status of high-rate deposition technologies associated with amorphous silicon thin films for photovoltaic applications. The report lists (1) deposition rates for a-Si:H films according to source and method and (2) efficiencies and other parameters of a-Si:H solar cells. Two main deposition source materials, silane and disilane, are discussed, as well as effects of boron doping. The effects of various deposition parameters on film characteristics and on deposition rate are presented, as well as the effects of annealing on high-deposition-rate films. Light-induced effects are also discussed. Finally, progress and problems in this field of study are summarized.

Luft, W.

1987-04-01T23:59:59.000Z

184

Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films  

Science Conference Proceedings (OSTI)

Yttria (3 mol %)-stabilized zirconia (YSZ) thin films were deposited using radio frequency (rf) magnetron sputtering. The YSZ thin films were deposited over a range of temperatures (22-300 deg. C), pressures (5-25 mTorr), and gas compositions (Ar/O ratio). Initial studies characterized a select set of properties in relation to deposition parameters including: refractive index, structure, and film stress. X-ray diffraction (XRD) showed that the films are comprised of mainly monoclinic and tetragonal crystal phases. The film refractive index determined by prism coupling, depends strongly on deposition conditions and ranged from 1.959 to 2.223. Wafer bow measurements indicate that the sputtered YSZ films can have initial stress ranging from 86 MPa tensile to 192 MPa compressive, depending on the deposition parameters. Exposure to ambient conditions (25 deg. C, 75% relative humidity) led to large increase ({approx}100 MPa) in the compressive stress of the films. Environmental aging suggests the change in compressive stress was related to water vapor absorption. These effects were then evaluated for films formed under different deposition parameters with varying density (calculated packing density) and crystal structure (XRD)

Piascik, Jeffrey R.; Thompson, Jeffrey Y.; Bower, Christopher A.; Stoner, Brian R. [Curriculum of Applied and Material Science, University of North Carolina, Chapel Hill, North Carolina 27599 and RTI International, Center for Materials and Electronic Technologies, Research Triangle Park, North Carolina 27709 (United States); Curriculum of Applied and Material Science, and School of Dentistry, University of North Carolina, Chapel Hill, North Carolina 27599 (United States); RTI International, Center for Materials and Electronic Technologies, Research Triangle Park, North Carolina 27709 (United States); RTI International, Center for Materials and Electronic Technologies, Research Triangle Park, North Carolina, 27709 and Curriculum of Applied and Material Science, University of North Carolina, Chapel Hill, North Carolina 27599 (United States)

2005-09-15T23:59:59.000Z

185

Characterization of Micro-, Nano-, and Thin Films  

Science Conference Proceedings (OSTI)

Feb 18, 2010... CdS:In Thin Films Prepared by the Spray-Pyrolysis Technique: Shadia Ikhmayies1; Riyad Ahmad-Bitar1; 1University of Jordan

186

Enhanced Thin Film Organic Photovoltaic Devices  

A novel structure design for thin film organic photovoltaic (OPV) devices provides a system for increasing the optical absorption in the active layer. ...

187

Method of producing amorphous thin films  

DOE Patents (OSTI)

This invention dicloses a method for sintering particulate material (such as silica) with a laser beam to produce amorphous optical thin films on substrates.

Brusasco, R.M.

1991-12-31T23:59:59.000Z

188

Infrared Analysis of Advanced Thin Film Materials  

Science Conference Proceedings (OSTI)

The goals of timely and cost effective integration of these new materials into ... most widely accepted method for production monitoring of transparent thin films.

189

Polycrystalline Thin Film Solar Cell Technologies: Preprint  

DOE Green Energy (OSTI)

Rapid progress is being made by CdTe and CIGS-based thin-film PV technologies in entering commercial markets.

Ullal, H. S.

2008-12-01T23:59:59.000Z

190

Mechanical Properties of Thin Film Metallic Glass  

Science Conference Proceedings (OSTI)

Because of these and other properties, thin film metallic-glasses (TFMGs) are a promising structural material for fabricating the next generation of micro- and ...

191

Textured Ultrafine Grained Al Thin Films  

Science Conference Proceedings (OSTI)

Symposium, Fatigue and Fracture of Thin Films and Nanomaterials. Presentation Title, In-Situ ACOM-TEM Nanomechanical Testing of Textured Ultrafine ...

192

Thin Film Structures for Energy Efficient Systems  

Science Conference Proceedings (OSTI)

Thin film based energy generation and storage devices - Small scale ... Dye- sensitized Solar Cells with Anodized Aluminum Alloy-based Counter-electrodes.

193

Epitaxial growth of Dy2O3 thin films on epitaxial Dy-germanide films on Ge(001) substrates  

Science Conference Proceedings (OSTI)

Ultra-thin films of Dy are grown on Ge(001) substrates by molecular beam deposition near room temperature and immediately annealed for solid phase epitaxy at higher temperatures, leading to the formation of DyGe"x films. Thin films of Dy"2O"3 are grown ... Keywords: Dy2O3 film, Ge(001) substrate, High-? oxide, Molecular beam epitaxy (MBE), Structural characterization, Transmission electron microscopy (TEM)

Md. Nurul Kabir Bhuiyan; Mariela Menghini; Jin Won Seo; Jean-Pierre Locquet

2011-04-01T23:59:59.000Z

194

Thin-Film Photovoltaic Industry  

Science Conference Proceedings (OSTI)

This report presents an overview of the thin-film (TF) photovoltaic (PV) industry as of the third quarter of 2012, a time in the midst of very rapid changes.  The TFPV industry has seen significantly greater investment in the past 5 to 10 years than in any previous time and up until recently it seemed that this investment was on track to make TFPV a much larger player in the overall PV market.  However, market dynamics have conspired to dim TFPV’s near-term prospects and ...

2012-11-30T23:59:59.000Z

195

Thin film solar energy collector  

DOE Patents (OSTI)

A multi-layer solar energy collector of improved stability comprising: (1) a substrate of quartz, silicate glass, stainless steel or aluminum-containing ferritic alloy; (2) a solar absorptive layer comprising silver, copper oxide, rhodium/rhodium oxide and 0-15% by weight of platinum; (3) an interlayer comprising silver or silver/platinum; and (4) an optional external anti-reflective coating, plus a method for preparing a thermally stable multi-layered solar collector, in which the absorptive layer is undercoated with a thin film of silver or silver/platinum to obtain an improved conductor-dielectric tandem.

Aykan, Kamran (Monmouth Beach, NJ); Farrauto, Robert J. (Westfield, NJ); Jefferson, Clinton F. (Millburn, NJ); Lanam, Richard D. (Westfield, NJ)

1983-11-22T23:59:59.000Z

196

Thin Film Si Bottom Cells for Tandem Device Structures: Final Technical Report, 15 December 2003 - 15 October 2007  

DOE Green Energy (OSTI)

GIT and IEC developed thin-film Si bottom cell and showed that deposition of top cell in tandem device did not reduce bottom cell performance.

Yelundur, V.; Hegedus, S.; Rohatgi, A.; Birkmire, R.

2008-11-01T23:59:59.000Z

197

Electroplating of Cu(Ag) thin films for interconnect applications  

Science Conference Proceedings (OSTI)

Electromigration effects in interconnect metallizations cause a need for materials with superior resistance against electromigration failure but with adequate electrical properties. In principle, Cu(Ag) alloys are potential candidates to become an interconnect ... Keywords: Copper-silver alloy thin film, Electrochemical deposition, Interconnect material

S. Strehle; S. Menzel; J. W. Bartha; K. Wetzig

2010-02-01T23:59:59.000Z

198

Thin-film optical initiator - Energy Innovation Portal  

A thin-film optical initiator having an inert, transparent substrate, a reactive thin film, which can be either an explosive or a pyrotechnic, and a reflective thin film.

199

Geometric shape control of thin film ferroelectrics and resulting structures  

DOE Patents (OSTI)

A monolithic crystalline structure and a method of making involves a semiconductor substrate, such as silicon, and a ferroelectric film, such as BaTiO.sub.3, overlying the surface of the substrate wherein the atomic layers of the ferroelectric film directly overlie the surface of the substrate. By controlling the geometry of the ferroelectric thin film, either during build-up of the thin film or through appropriate treatment of the thin film adjacent the boundary thereof, the in-plane tensile strain within the ferroelectric film is relieved to the extent necessary to permit the ferroelectric film to be poled out-of-plane, thereby effecting in-plane switching of the polarization of the underlying substrate material. The method of the invention includes the steps involved in effecting a discontinuity of the mechanical restraint at the boundary of the ferroelectric film atop the semiconductor substrate by, for example, either removing material from a ferroelectric film which has already been built upon the substrate, building up a ferroelectric film upon the substrate in a mesa-shaped geometry or inducing the discontinuity at the boundary by ion beam deposition techniques.

McKee, Rodney A. (Kingston, TN); Walker, Frederick J. (Oak Ridge, TN)

2000-01-01T23:59:59.000Z

200

Uncooled thin film pyroelectric IR detector with aerogel thermal isolation  

Science Conference Proceedings (OSTI)

Uncooled pyroelectric IR imaging systems, such as night vision goggles, offer important strategic advantages in battlefield scenarios and reconnaissance surveys. Until now, the current technology for fabricating these devices has been limited by low throughput and high cost which ultimately limit the availability of these sensor devices. We have developed and fabricated an alternative design for pyroelectric IR imaging sensors that utilizes a multilayered thin film deposition scheme to create a monolithic thin film imaging element on an active silicon substrate for the first time. This approach combines a thin film pyroelectric imaging element with a thermally insulating SiO{sub 2} aerogel thin film to produce a new type of uncooled IR sensor that offers significantly higher thermal, spatial, and temporal resolutions at a substantially lower cost per unit. This report describes the deposition, characterization and optimization of the aerogel thermal isolation layer and an appropriate pyroelectric imaging element. It also describes the overall integration of these components along with the appropriate planarization, etch stop, adhesion, electrode, and blacking agent thin film layers into a monolithic structure. 19 refs., 8 figs., 6 tabs.

Ruffner, J.A.; Clem, P.G.; Tuttle, B.A. [and others

1998-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


201

Method for making dense crack free thin films  

DOE Patents (OSTI)

The process described herein provides a simple and cost effective method for making crack free, high density thin ceramic film. The steps involve depositing a layer of a ceramic material on a porous or dense substrate. The deposited layer is compacted and then the resultant laminate is sintered to achieve a higher density than would have been possible without the pre-firing compaction step.

Jacobson, Craig P. (Lafayette, CA); Visco, Steven J. (Berkeley, CA); De Jonghe, Lutgard C. (Lafayette, CA)

2007-01-16T23:59:59.000Z

202

Formation of thin-film resistors on silicon substrates  

DOE Patents (OSTI)

The formation of thin-film resistors by the ion implantation of a metallic conductive layer in the surface of a layer of phosphosilicate glass or borophosphosilicate glass which is deposited on a silicon substrate. The metallic conductive layer materials comprise one of the group consisting of tantalum, ruthenium, rhodium, platinum and chromium silicide. The resistor is formed and annealed prior to deposition of metal, e.g. aluminum, on the substrate.

Schnable, George L. (Montgomery County, PA); Wu, Chung P. (Hamilton Township, Mercer County, NJ)

1988-11-01T23:59:59.000Z

203

Electrostatic thin film chemical and biological sensor  

DOE Patents (OSTI)

A chemical and biological agent sensor includes an electrostatic thin film supported by a substrate. The film includes an electrostatic charged surface to attract predetermined biological and chemical agents of interest. A charge collector associated with said electrostatic thin film collects charge associated with surface defects in the electrostatic film induced by the predetermined biological and chemical agents of interest. A preferred sensing system includes a charge based deep level transient spectroscopy system to read out charges from the film and match responses to data sets regarding the agents of interest. A method for sensing biological and chemical agents includes providing a thin sensing film having a predetermined electrostatic charge. The film is exposed to an environment suspected of containing the biological and chemical agents. Quantum surface effects on the film are measured. Biological and/or chemical agents can be detected, identified and quantified based on the measured quantum surface effects.

Prelas, Mark A. (Columbia, MO); Ghosh, Tushar K. (Columbia, MO); Tompson, Jr., Robert V. (Columbia, MO); Viswanath, Dabir (Columbia, MO); Loyalka, Sudarshan K. (Columbia, MO)

2010-01-19T23:59:59.000Z

204

Institute of Photo Electronic Thin Film Devices and Technology...  

Open Energy Info (EERE)

Place Tianjin Municipality, China Zip 300071 Sector Solar Product A thin-film solar cell research institute in China. References Institute of Photo-Electronic Thin Film Devices...

205

NREL: Photovoltaics Research - Polycrystalline Thin-Film Materials...  

NLE Websites -- All DOE Office Websites (Extended Search)

in the area of polycrystalline thin-film materials and devices. Printable Version Photovoltaics Research Home Silicon Polycrystalline Thin Films Multijunctions New Materials,...

206

Daylighting control performance of a thin-film ceramic electrochromic...  

NLE Websites -- All DOE Office Websites (Extended Search)

Daylighting control performance of a thin-film ceramic electrochromic window: Field study results Title Daylighting control performance of a thin-film ceramic electrochromic...

207

Breakthroughs in Thin-Film Magnetic Devices Earn NIST ...  

Science Conference Proceedings (OSTI)

... thin films to control magnetism as a foundation for developing better sensors and memory devices. Computer hard drives that use magnetic thin-film ...

2012-12-13T23:59:59.000Z

208

Amorphous and nanocrystalline Mg2Si thin-film electrodes  

NLE Websites -- All DOE Office Websites (Extended Search)

Contact Us Department Contacts Media Contacts Amorphous and nanocrystalline Mg2Si thin-film electrodes Title Amorphous and nanocrystalline Mg2Si thin-film electrodes...

209

Large area ceramic thin films on plastics: A versatile route via solution processing  

Science Conference Proceedings (OSTI)

A new general route for large area, submicron thick ceramic thin films (crystalline metal oxide thin films) on plastic substrates is presented, where the crystallization of films is guaranteed by a firing process. Gel films are deposited on silicon substrates with a release layer and fired to be ceramic films, followed by transferring onto plastic substrates using adhesives. The ceramic films thus fabricated on plastics exhibit a certain degree of flexibility, implying the possibility of the technique to be applied to high-throughput roll-to-roll processes. Using this technique, we successfully realized transparent anatase thin films that provide high optical reflectance and transparent indium tin oxide thin films that exhibit electrical conductivity on polycarbonate and acrylic resin substrates, respectively. Crystallographically oriented zinc oxide films and patterned zinc oxide films are also demonstrated to be realized on acrylic resin substrates.

Kozuka, H.; Yamano, A.; Uchiyama, H.; Takahashi, M. [Faculty of Chemistry, Materials and Bioengineering, Kansai University, 3-3-35 Yamate-cho, Suita, 564-8680 (Japan); Fukui, T.; Yoki, M.; Akase, T. [Graduate School of Science and Engineering, Kansai University, 3-3-35 Yamate-cho, Suita, 564-8680 (Japan)

2012-01-01T23:59:59.000Z

210

Thin Film Femtosecond Laser Damage Competition  

SciTech Connect

In order to determine the current status of thin film laser resistance within the private, academic, and government sectors, a damage competition was started at the 2008 Boulder Damage Symposium. This damage competition allows a direct comparison of the current state of the art of high laser resistance coatings since they are tested using the same damage test setup and the same protocol. In 2009 a high reflector coating was selected at a wavelength of 786 nm at normal incidence at a pulse length of 180 femtoseconds. A double blind test assured sample and submitter anonymity so only a summary of the results are presented here. In addition to the laser resistance results, details of deposition processes, coating materials and layer count, and spectral results will also be shared.

Stolz, C J; Ristau, D; Turowski, M; Blaschke, H

2009-11-14T23:59:59.000Z

211

Thin films of mixed metal compounds  

DOE Patents (OSTI)

Disclosed is a thin film heterojunction solar cell, said heterojunction comprising a p-type I-III-IV[sub 2] chalcopyrite substrate and an overlying layer of an n-type ternary mixed metal compound wherein said ternary mixed metal compound is applied to said substrate by introducing the vapor of a first metal compound to a vessel containing said substrate from a first vapor source while simultaneously introducing a vapor of a second metal compound from a second vapor source of said vessel, said first and second metals comprising the metal components of said mixed metal compound; independently controlling the vaporization rate of said first and second vapor sources; reducing the mean free path between vapor particles in said vessel, said gas being present in an amount sufficient to induce homogeneity of said vapor mixture; and depositing said mixed metal compound on said substrate in the form of a uniform composition polycrystalline mixed metal compound. 5 figs.

Mickelsen, R.A.; Chen, W.S.

1985-06-11T23:59:59.000Z

212

Method of producing thin cellulose nitrate film  

DOE Patents (OSTI)

An improved method for forming a thin nitrocellulose film of reproducible thickness is described. The film is a cellulose nitrate film, 10 to 20 microns in thickness, cast from a solution of cellulose nitrate in tetrahydrofuran, said solution containing from 7 to 15 percent, by weight, of dioctyl phthalate, said cellulose nitrate having a nitrogen content of from 10 to 13 percent.

Lupica, S.B.

1975-12-23T23:59:59.000Z

213

Analysis of defects at the interface between high-k thin films and (100) silicon  

Science Conference Proceedings (OSTI)

Paramagnetic defects in atomic layer deposition grown aluminium oxide thin films have been studied using electron paramagnetic resonance. Initial spectra indicate the presence of Si-db, P"b"0 and P"b"1 defects, previously observed in Si/SiO"2 structures. ... Keywords: Aluminium oxide, Defects, EPR, High-k, Interfaces, Thin films

B. J. Jones; R. C. Barklie

2005-06-01T23:59:59.000Z

214

Phase transition on CdSe thin films by changing the volume concentration of Se  

Science Conference Proceedings (OSTI)

In this work CdSe thin films were grown by chemical bath deposition (CBD)6 onto glass substrate with approximately 2000 Å thickness. The samples have been prepared by changing the volume concentration of the solution in the range of 5-45 ... Keywords: CdSe, thin films, chemical bath, phase transitions, semiconductors

M. Rubín; J. I. Cortez; H. Juárez; E. Rosendo; T. Díaz; G. García Salgado; I. Villaverde; R. Lozada-Morales; O. Portillo-Moreno; O. Zelaya-Ngel

2007-07-01T23:59:59.000Z

215

Oxynitride Thin Film Barriers for PV Packaging  

DOE Green Energy (OSTI)

Dielectric thin-film barrier and adhesion-promoting layers consisting of silicon oxynitride materials (SiOxNy, with various stoichiometry) were investigated. For process development, films were applied to glass (TCO, conductive SnO2:F; or soda-lime), polymer (PET, polyethylene terephthalate), aluminized soda-lime glass, or PV cell (a-Si, CIGS) substrates. Design strategy employed de-minimus hazard criteria to facilitate industrial adoption and reduce implementation costs for PV manufacturers or suppliers. A restricted process window was explored using dilute compressed gases (3% silane, 14% nitrous oxide, 23% oxygen) in nitrogen (or former mixtures, and 11.45% oxygen mix in helium and/or 99.999% helium dilution) with a worst-case flammable and non-corrosive hazard classification. Method employed low radio frequency (RF) power, less than or equal to 3 milliwatts per cm2, and low substrate temperatures, less than or equal to 100 deg C, over deposition areas less than or equal to 1000 cm2. Select material properties for barrier film thickness (profilometer), composition (XPS/FTIR), optical (refractive index, %T and %R), mechanical peel strength and WVTR barrier performance are presented.

Glick, S. H.; delCueto, J. A.; Terwilliger, K. M.; Jorgensen, G. J.; Pankow, J. W.; Keyes, B. M.; Gedvilas, L. M.; Pern, F. J.

2005-11-01T23:59:59.000Z

216

Nanostructured Thin Film Electrolyte for Thin Film Solid Oxide Fuel Cells  

E-Print Network (OSTI)

Solid oxide fuel cells (SOFCs) are very attractive as energy generation devices because they are clean, reliable, and almost entirely pollution-free. SOFCs have flexible fuel selections compared with other fuel cell technologies. The main disadvantage of SOFCs is their high operating temperature (~1000ºC for conventional SOFCs) which leads to cell cracking and formation of non-conducting compounds at electrolyte/electrode interfaces. Therefore, intermediate temperature SOFCs (ITSOFCs) in the range of 500-700 ºC has attracted extensive research interests. To achieve high cell performance at reduced temperatures, it requires high-catalytic activity, high ionic conductivity, and comparable thermal expansion coefficient (TEC) of the cell components. To address the above issues, the research focuses on two main approaches (i.e., the interlayer approach and the electrolyte approach) in order to improve the overall cell performance. First, the design of a thin layer of a vertically-aligned nanocomposite (VAN) structure as an interlayer between the electrolyte and cathode is demonstrated. The development of the VAN structures consisted of the cathode material as a perovskite or ordered double perovskite structure, La0.5Sr0.5CoO3 (LSCO) or PrBaCo2O5 delta (PBCO), and the electrolyte material as a fluorite structure, Ce0.9Gd0.1O1.95 (CGO or GDC), were achieved for thin film solid oxide fuel cell (TFSOFCs). The VAN structure significantly improves the overall performance of the TFSOFC by increasing the interfacial area between the electrolyte and cathode and also acts as a transition layer that improves adhesion and relieves both thermal stress and lattice strain. Second, microstructural and electrical properties of Gd-doped CeO2 (GDC, Ce0.9Gd0.1O1.95) thin films electrolyte are studied for intermediate temperature solid oxide fuel cells (SOFCs). The GDC thin film electrolytes with different grain sizes and grain morphologies were prepared by varying the deposition parameters such as substrate temperature, oxygen partial pressure, target repetition rate, and laser ablation energy. The electrical property of the GDC thin film is strongly affected by the grain size. Third, bilayer electrolytes composed of a gadolinium-doped CeO2 (GDC) layer (~6 micrometer thickness) and an yttria-stabilized ZrO2 (YSZ) layer with various thicknesses (~330 nm, ~440 nm, and ~1 micrometer) are achieved by a pulsed laser deposition (PLD) technique for thin film solid oxide fuel cells (TFSOFCs). One effective approach is to incorporate YSZ thin film as a blocking layer in between the GDC and anode for preventing chemical reduction of GDC and electrical current leakage. This bilayer approach effectively improves the GDC's chemical/ mechanical stability and reduces the OCV loss under reducing conditions. The results suggest that the YSZ thin film serves as a blocking layer for preventing electrical current leakage in the GDC layer and also provides chemical, mechanical, and structural integrity in the cell, which leads to the overall enhanced performance.

Cho, Sungmee

2011-08-01T23:59:59.000Z

217

Preparation of a semiconductor thin film  

SciTech Connect

A process for the preparation of a semiconductor film. The process comprises depositing nanoparticles of a semiconductor material onto a substrate whose surface temperature during nanoparticle deposition thereon is sufficient to cause substantially simultaneous fusion of the nanoparticles to thereby coalesce with each other and effectuate film growth.

Pehnt, Martin (TuBingen, DE); Schulz, Douglas L. (Denver, CO); Curtis, Calvin J. (Lakewood, CO); Ginley, David S. (Evergreen, CO)

1998-01-01T23:59:59.000Z

218

Growth and Characterization of LiCoO? Thin Films for Microbatteries  

E-Print Network (OSTI)

LiCoO?thin films have been grown by pulsed laser deposition on stainless steel and SiO?/Si substrates. The film deposited at 600°C in an oxygen partial pressure of 100mTorr shows an excellent crystallinity, stoichiometry ...

Hui, Xia

219

Method for fabricating thin films of pyrolytic carbon  

DOE Patents (OSTI)

The present invention relates to a method for fabricating ultra-thin films of pyrolytic carbon. Pyrolytic carbon is vapor deposited onto a concave surface of a heated substrate to a total uniform thickness in the range of about 0.1 to 1.0 micrometer. The carbon film on the substrate is provided with a layer of adherent polymeric resin. The resulting composite film of pyrolytic carbon and polymeric resin is then easily separated from the substrate by shrinking the polymeric resin coating with thermally induced forces.

Brassell, Gilbert W. (Lenoir City, TN); Lewis, Jr., John (Oak Ridge, TN); Weber, Gary W. (Amherst, NY)

1982-01-01T23:59:59.000Z

220

Amorphous carbon thin films for optoelectric device application  

Science Conference Proceedings (OSTI)

Thin films of amorphous carbon (a-C and a-C:H) have been deposited using different carbon precursor materials such as camphor--a natural source, graphite and CH{sub 4}/H{sub 2} mixture by different deposition methods, such as ion beam sputtering, pyrolysis, pulsed laser deposition and r.f. plasma CVD. The films are subjected to various standard characterization techniques in order to tailor the required structural and opto-electrical properties for device applications. The effects of deposition parameters and annealing temperatures on the properties of carbon thin films have been investigated. Both p- and n- type of carbon films have been obtained either through controlling the deposition parameters of a particular method or by doping. Solar cells of various configurations, such as n-C/p-Si, p-C/n-Si and n-C/p-C/p-Si, have been fabricated and their photoresponse characteristics are studied. An efficiency of 1.52% has been obtained, so far, for the cell of configuration n-C/p-C/p-Si. Effects of substrate temperature on the photovoltaic properties are also outlined in brief.

Soga, T.; Jimbo, T.; Krishna, K.M.; Umeno, M.

2000-01-30T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


221

Thin-film rechargeable lithium batteries  

SciTech Connect

Small thin-film rechargeable cells have been fabricated with a lithium phosphorus oxyniuide electrolyte, Li metal anode, and Li{sub 1-x}Mn{sub 2}O{sub 4} as the cathode film. The cathode films were fabricated by several different techniques resulting in both crystalline and amorphous films. These were compared by observing the cell discharge behavior. Estimates have been made for the scale-up of such a thin-film battery to meet the specifications for the electric vehicle application. The specific energy, energy density, and cycle life are expected to meet the USABC mid-term criteria. However, the areas of the thin-films needed to fabricate such a cell are very large. The required areas could be greatly reduced by operating the battery at temperatures near 100{degrees}C or by enhancing the lithium ion transport rate in the cathode material.

Dudney, N.J.; Bates, J.B.; Lubben, D.

1994-11-01T23:59:59.000Z

222

Aging phenomena in polystyrene thin films  

E-Print Network (OSTI)

The aging behavior is investigated for thin films of atactic polystyrene through measurements of complex electric capacitance. During isothermal aging process the real part of the electric capacitance increases with aging time, while the imaginary part decreases with aging time. This result suggests that the aging time dependence of the real and imaginary parts are mainly associated with change in thickness and dielectric permittivity, respectively. In thin films, the thickness depends on thermal history of aging even above the glass transition. Memory and `rejuvenation' effects are also observed in the thin films.

Koji Fukao; Hiroki Koizumi

2008-01-05T23:59:59.000Z

223

Growth study of ion assisted evaporated molybdenum thin films  

Science Conference Proceedings (OSTI)

We reported optimization of ion-to-atom ratios and ion energy for growth of molybdenum thin film on oxidized silicon substrate using ion assisted electron beam evaporation system. The ion-to-atom ratio is varied by independently adjusting the ion current density and deposition rate. The structural characterization of the films is carried out by hard X-ray reflectivity. We observed improvement in film density from 85.5% to 98.2% and film roughness from {approx}2 nm to 0.84nm on {approx}26 nm thick Mo film by optimizing ion parameters. The observed results are discussed considering the effect of kinetic of adatoms during growth of film.

Yadav, P. K.; Nayak, M.; Lodha, G. S.; Rai, S. [X-ray Optics Section, Indus Synchrotrons Utilization Division, Raja Ramanna Centre For Advanced Technology, Indore-452013 (India)

2012-06-25T23:59:59.000Z

224

Structure and Effects of Extended Defects in Polycrystalline Si Thin Films  

DOE Green Energy (OSTI)

The structure and effects of extended defects in rapid deposited polycrystalline Si thin films were studied using a combination of high-resolution transmission electron microscopy and first-principles total energy calculations.

Yan, Y.; Al-Jassim, M. M.; Wang, T. H.; Ciszek, T. F.

2000-01-01T23:59:59.000Z

225

Polyelectrolyte multilayer thin films with antimicrobial, antifouling and drug releasing properties  

E-Print Network (OSTI)

This thesis work focuses on designing thin polyelectrolyte multilayer (PEM) films via layer-bylayer (LbL) deposition technique with the ability to kill pathogenic bacteria and inactivate human viruses, especially the ...

Wong, Sze Yinn (Sze Yinn Jessie)

2011-01-01T23:59:59.000Z

226

J. Plasma Fusion Res. SERIES, Vol. 8 (2009) EFFECTS OF GAS PRESSURE AND DISCHARGE POWER ON ELECTRICAL AND OPTICAL PROPERTIES OF ZNO:AL THIN FILM DEPOSITED ON POLYMER SUBSTRATE  

E-Print Network (OSTI)

In this paper aluminium-doped zinc oxide(ZnO:Al) conducting layer was deposited on polyethylene terephthalate(PET) substrate by r. f. magnetron sputtering method. The effects of gas pressure and r. f. sputtering power on the structural and electrical properties of ZnO:Al thin film were investigated experimentally. The results show that the resistivity of the film was strongly influenced by the gas pressure and r. f. sputtering power. The electrical properties were improved with increase in sputtering power and gas pressure up to 180W and 5mTorr. However excessive supply of sputtering power limits the growth of crystalline grains due to too high deposition rate and may cause a degradation of the preferred orientation, giving high electrical resistivity. The lowest resistivity and optical transmittance were ~1.1×10-3 ?-cm and ~85%, respectively and were obtained under the experimental conditions of 180W of sputtering power and 5mTorr of gas pressure.

Dong-joo Kwak; Byung-wook Park; Youl-moon Sung; Min-woo Park

2008-01-01T23:59:59.000Z

227

Polycrystalline thin-film technology: Recent progress in photovoltaics  

DOE Green Energy (OSTI)

Polycrystalline thin films have made significant technical progress in the past year. Three of these materials that have been studied extensively for photovoltaic (PV) power applications are copper indium diselenide (CuInSe{sub 2}), cadmium telluride (CdTe), and thin-film polycrystalline silicon (x-Si) deposited on ceramic substrates. The first of these materials, polycrystalline thin-film CuInSe{sub 2}, has made some rapid advances in terms of high efficiency and long-term reliability. For CuInSe{sub 2} power modules, a world record has been reported on a 0.4-m{sup 2} module with an aperture-area efficiency of 10.4% and a power output of 40.4 W. Additionally, outdoor reliability testing of CuInSe{sub 2} modules, under both loaded and open-circuit conditions, has resulted in only minor changes in module performance after more than 1000 days of continuous exposure to natural sunlight. CdTe module research has also resulted in several recent improvements. Module performance has been increased with device areas reaching nearly 900 cm{sup 2}. Deposition has been demonstrated by several different techniques, including electrodeposition, spraying, and screen printing. Outdoor reliability testing of CdTe modules was also carried out under both loaded and open-circuit conditions, with more than 600 days of continuous exposure to natural sunlight. These tests were also encouraging and indicated that the modules were stable within measurement error. The highest reported aperture-area module efficiency for CdTe modules is 10%; the semiconductor material was deposited by electrodeposition. A thin-film CdTe photovoltaic system with a power output of 54 W has been deployed in Saudi Arabia for water pumping. The Module Development Initiative has made significant progress in support of the Polycrystalline Thin-Film Program in the past year, and results are presented in this paper.

Mitchell, R.L.; Zweibel, K.; Ullal, H.S.

1991-12-01T23:59:59.000Z

228

SunShot Initiative: Thin Film Photovoltaics Research  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin Film Photovoltaics Research Thin Film Photovoltaics Research to someone by E-mail Share SunShot Initiative: Thin Film Photovoltaics Research on Facebook Tweet about SunShot Initiative: Thin Film Photovoltaics Research on Twitter Bookmark SunShot Initiative: Thin Film Photovoltaics Research on Google Bookmark SunShot Initiative: Thin Film Photovoltaics Research on Delicious Rank SunShot Initiative: Thin Film Photovoltaics Research on Digg Find More places to share SunShot Initiative: Thin Film Photovoltaics Research on AddThis.com... Concentrating Solar Power Photovoltaics Research & Development Crystalline Silicon Thin Films Multijunctions Organic Photovoltaics Dye-Sensitized Solar Cells Competitive Awards Systems Integration Balance of Systems Thin Film Photovoltaics Research The U.S. Department of Energy (DOE) supports research and development of

229

Thin film cadmium telluride, zinc telluride, and mercury zinc telluride solar cells  

DOE Green Energy (OSTI)

This report describes research to demonstrate (1) thin film cadmium telluride solar cells with a quantum efficiency of 75% or higher at 0. 44 {mu}m and a photovoltaic efficiency of 11.5% or greater, and (2) thin film zinc telluride and mercury zinc telluride solar cells with a transparency to sub-band-gap radiation of 65% and a photovoltaic conversion efficiency of 5% and 8%, respectively. Work was directed at (1) depositing transparent conducting semiconductor films by solution growth and metal-organic chemical vapor deposition (MOCVD) technique, (2) depositing CdTe films by close-spaced sublimation (CSS) and MOCVD techniques, (3) preparing and evaluating thin film CdTe solar cells, and (4) preparing and characterizing thin film ZnTe, CD{sub 1-x}Zn{sub 1-x}Te, and Hg{sub 1-x}Zn{sub x}Te solar cells. The deposition of CdS films from aqueous solutions was investigated in detail, and their crystallographic, optical, and electrical properties were characterized. CdTe films were deposited from DMCd and DIPTe at 400{degrees}C using TEGa and AsH{sub 3} as dopants. CdTe films deposited by CSS had significantly better microstructures than those deposited by MOCVD. Deep energy states in CdTe films deposited by CSS and MOCVD were investigated. Thin films of ZnTe, Cd{sub 1- x}Zn{sub x}Te, and Hg{sub 1-x}Zn{sub x}Te were deposited by MOCVD, and their crystallographic, optical, and electrical properties were characterized. 67 refs.

Chu, T.L. (University of South Florida, Tampa, FL (United States))

1992-04-01T23:59:59.000Z

230

Polycrystalline Thin Film Used in Photovoltaics  

Energy.gov (U.S. Department of Energy (DOE))

Polycrystalline thin-film cells are made of many tiny crystalline grains of semiconductor materials. The materials used in these cells have properties that are different from those of silicon.

231

Superhydrophobic Thin Film Symposium | ornl.gov  

NLE Websites -- All DOE Office Websites (Extended Search)

Connect with ORNL | For Industry | Partnerships | Events and Conferences Superhydrophobic Thin Film Symposium Sep 05 2012 12:00 AM - 05:00 PM Hosted by Oak Ridge Laboratory's...

232

Polycrystalline Thin-Film Multijunction Solar Cells  

DOE Green Energy (OSTI)

We present a digest of our research on the thin-film material components that comprise the top and bottom cells of three different material systems and the tandem devices constructed from them.

Noufi, R.; Wu, X.; Abu-Shama, J.; Ramanathan, K; Dhere, R.; Zhou, J.; Coutts, T.; Contreras, M.; Gessert, T.; Ward, J. S.

2005-11-01T23:59:59.000Z

233

Thin films for geothermal sensing: Final report  

DOE Green Energy (OSTI)

The report discusses progress in three components of the geothermal measurement problem: (1) developing appropriate chemically sensitive thin films; (2) discovering suitably rugged and effective encapsulation schemes; and (3) conducting high temperature, in-situ electrochemical measurements. (ACR)

Not Available

1987-09-01T23:59:59.000Z

234

Method for bonding thin film thermocouples to ceramics  

DOE Patents (OSTI)

A method is provided for adhering a thin film metal thermocouple to a ceramic substrate used in an environment up to 700 degrees Centigrade, such as at a cylinder of an internal combustion engine. The method includes the steps of: depositing a thin layer of a reactive metal on a clean ceramic substrate; and depositing thin layers of platinum and a platinum-10% rhodium alloy forming the respective legs of the thermocouple on the reactive metal layer. The reactive metal layer serves as a bond coat between the thin noble metal thermocouple layers and the ceramic substrate. The thin layers of noble metal are in the range of 1-4 micrometers thick. Preferably, the ceramic substrate is selected from the group consisting of alumina and partially stabilized zirconia. Preferably, the thin layer of reactive metal is in the range of 0.015-0.030 micrometers (15-30 nanometers) thick. The preferred reactive metal is chromium. Other reactive metals may be titanium or zirconium. The thin layer of reactive metal may be deposited by sputtering in ultra high purity argon in a vacuum of approximately 2 milliTorr (0.3 Pascals).

Kreider, Kenneth G. (Potomac, MD)

1993-01-01T23:59:59.000Z

235

Amorphous semiconducting and conducting transparent metal oxide thin films and production thereof  

DOE Patents (OSTI)

Metal oxide thin films and production thereof are disclosed. An exemplary method of producing a metal oxide thin film may comprise introducing at least two metallic elements and oxygen into a process chamber to form a metal oxide. The method may also comprise depositing the metal oxide on a substrate in the process chamber. The method may also comprise simultaneously controlling a ratio of the at least two metallic elements and a stoichiometry of the oxygen during deposition. Exemplary amorphous metal oxide thin films produced according to the methods herein may exhibit highly transparent properties, highly conductive properties, and/or other opto-electronic properties.

Perkins, John (Boulder, CO); Van Hest, Marinus Franciscus Antonius Maria (Lakewood, CO); Ginley, David (Evergreen, CO); Taylor, Matthew (Golden, CO); Neuman, George A. (Holland, MI); Luten, Henry A. (Holland, MI); Forgette, Jeffrey A. (Hudsonville, MI); Anderson, John S. (Holland, MI)

2010-07-13T23:59:59.000Z

236

Thin Film Packaging Solutions for High Efficiency OLED Lighting Products  

Science Conference Proceedings (OSTI)

The objective of the 'Thin Film Packaging Solutions for High Efficiency OLED Lighting Products' project is to demonstrate thin film packaging solutions based on SiC hermetic coatings that, when applied to glass and plastic substrates, support OLED lighting devices by providing longer life with greater efficiency at lower cost than is currently available. Phase I Objective: Demonstrate thin film encapsulated working phosphorescent OLED devices on optical glass with lifetime of 1,000 hour life, CRI greater than 75, and 15 lm/W. Phase II Objective: Demonstrate thin film encapsulated working phosphorescent OLED devices on plastic or glass composite with 25 lm/W, 5,000 hours life, and CRI greater than 80. Phase III Objective: Demonstrate 2 x 2 ft{sup 2} thin film encapsulated working phosphorescent OLED with 40 lm/W, 10,000 hour life, and CRI greater than 85. This report details the efforts of Phase III (Budget Period Three), a fourteen month collaborative effort that focused on optimization of high-efficiency phosphorescent OLED devices and thin-film encapsulation of said devices. The report further details the conclusions and recommendations of the project team that have foundation in all three budget periods for the program. During the conduct of the Thin Film Packaging Solutions for High Efficiency OLED Lighting Products program, including budget period three, the project team completed and delivered the following achievements: (1) a three-year marketing effort that characterized the near-term and longer-term OLED market, identified customer and consumer lighting needs, and suggested prototype product concepts and niche OLED applications lighting that will give rise to broader market acceptance as a source for wide area illumination and energy conservation; (2) a thin film encapsulation technology with a lifetime of nearly 15,000 hours, tested by calcium coupons, while stored at 16 C and 40% relative humidity ('RH'). This encapsulation technology was characterized as having less than 10% change in transmission during the 15,000 hour test period; (3) demonstrated thin film encapsulation of a phosphorescent OLED device with 1,500 hours of lifetime at 60 C and 80% RH; (4) demonstrated that a thin film laminate encapsulation, in addition to the direct thin film deposition process, of a polymer OLED device was another feasible packaging strategy for OLED lighting. The thin film laminate strategy was developed to mitigate defects, demonstrate roll-to-roll process capability for high volume throughput (reduce costs) and to support a potential commercial pathway that is less dependent upon integrated manufacturing since the laminate could be sold as a rolled good; (5) demonstrated that low cost 'blue' glass substrates could be coated with a siloxane barrier layer for planarization and ion-protection and used in the fabrication of a polymer OLED lighting device. This study further demonstrated that the substrate cost has potential for huge cost reductions from the white borosilicate glass substrate currently used by the OLED lighting industry; (6) delivered four-square feet of white phosphorescent OLED technology, including novel high efficiency devices with 82 CRI, greater than 50 lm/W efficiency, and more than 1,000 hours lifetime in a product concept model shelf; (7) presented and or published more than twenty internal studies (for private use), three external presentations (OLED workshop-for public use), and five technology-related external presentations (industry conferences-for public use); and (8) issued five patent applications, which are in various maturity stages at time of publication. Delivery of thin film encapsulated white phosphorescent OLED lighting technology remains a challenging technical achievement, and it seems that commercial availability of thin, bright, white OLED light that meets market requirements will continue to require research and development effort. However, there will be glass encapsulated white OLED lighting products commercialized in niche markets during the 2008 calendar year. This commercializ

None

2008-06-30T23:59:59.000Z

237

Development of a Thin Film Sensor for Detecting Initiation of Stress Corrosion Cracks in Stainless Steels  

Science Conference Proceedings (OSTI)

The study of initiation of intergranular stress corrosion cracking (IGSCC) has been hindered by lack of techniques to detect small cracks ranging in depth from sub-micron to several microns. The present investigation's main objective is to develop a thin film sample suitable for detecting and studying initiation of IGSCC in sensitized austenitic stainless steel. Two approaches are being investigated to produce thin films of stainless steel: pulse laser deposition (PLD) of ultrathin films (20-150 nm) usin...

2002-12-11T23:59:59.000Z

238

Radiation tolerance of ultra-thin Formvar films  

Science Conference Proceedings (OSTI)

Mechanical behavior of free-standing polymer films with submicron thicknesses exposed to a radiation environment is poorly understood. Here, we study 110-nm-thin free-standing polyvinyl formal (Formvar) films irradiated at room temperature with 1-5 keV electrons or 3 MeV alpha particles. We measure mechanical properties and the elemental composition by spherical indentation and high-energy ion scattering, respectively. Results show that, with increasing radiation dose, the effective failure strain and film thickness decrease monotonically, while the dose dependence of the Young's modulus is non-monotonic. The failure strain and modulus scale with the average energy deposited in the film, while the film thickness exhibits a more complex behavior.

Stadermann, M.; Kucheyev, S. O.; Lewicki, J.; Letts, S. A. [Lawrence Livermore National Laboratory, Livermore, California 94551 (United States)

2012-08-13T23:59:59.000Z

239

Method of preparing high-temperature-stable thin-film resistors  

DOE Patents (OSTI)

A chemical vapor deposition method for manufacturing tungsten-silicide thin-film resistors of predetermined bulk resistivity and temperature coefficient of resistance (TCR) is disclosed. Gaseous compounds of tungsten and silicon are decomposed on a hot substrate to deposit a thin-film of tungsten-silicide. The TCR of the film is determined by the crystallinity of the grain structure, which is controlled by the temperature of deposition and the tungsten to silicon ratio. The bulk resistivity is determined by the tungsten to silicon ratio. Manipulation of the fabrication parameters allows for sensitive control of the properties of the resistor.

Raymond, L.S.

1980-11-12T23:59:59.000Z

240

Method of preparing high-temperature-stable thin-film resistors  

DOE Patents (OSTI)

A chemical vapor deposition method for manufacturing tungsten-silicide thin-film resistors of predetermined bulk resistivity and temperature coefficient of resistance (TCR). Gaseous compounds of tungsten and silicon are decomposed on a hot substrate to deposit a thin-film of tungsten-silicide. The TCR of the film is determined by the crystallinity of the grain structure, which is controlled by the temperature of deposition and the tungsten to silicon ratio. The bulk resistivity is determined by the tungsten to silicon ratio. Manipulation of the fabrication parameters allows for sensitive control of the properties of the resistor.

Raymond, Leonard S. (Tucson, AZ)

1983-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


241

Growth and Characterization of Epitaxial Oxide Thin Films  

E-Print Network (OSTI)

of these morphological changes was found to be dependent on a number of factors including deposition rates, flux and energy of bombarding ions, and the average angle of incidence of Glow Discharge Glow Discharge -V (DC) Cathode (Target) Insulation Substrates Anode Vacuum... techniques such as reflected high energy electron diffraction (RHEED) and low energy electron diffraction (LEED) can give valuable information about the initial growth mechanisms and surface structure of the very thin films during growth in an in-situ manner...

Garg, Ashish

242

Thin film absorber for a solar collector  

SciTech Connect

This invention pertains to energy absorbers for solar collectors, and more particularly to high performance thin film absorbers. The solar collectors comprising the absorber of this invention overcome several problems seen in current systems, such as excessive hardware, high cost and unreliability. In the preferred form, the apparatus features a substantially rigid planar frame with a thin film window bonded to one planar side of the frame. An absorber in accordance with the present invention is comprised of two thin film layers that are sealed perimetrically. In a preferred embodiment, thin film layers are formed from a metal/plastic laminate. The layers define a fluid-tight planar envelope of large surface area to volume through which a heat transfer fluid flows. The absorber is bonded to the other planar side of the frame. The thin film construction of the absorber assures substantially full envelope wetting and thus good efficiency. The window and absorber films stress the frame adding to the overall strength of the collector.

Wilhelm, William G. (Cutchogue, NY)

1985-01-01T23:59:59.000Z

243

Ambient pressure process for preparing aerogel thin films reliquified sols useful in preparing aerogel thin films  

DOE Patents (OSTI)

A method for preparing aerogel thin films by an ambient-pressure, continuous process. The method of this invention obviates the use of an autoclave and is amenable to the formation of thin films by operations such as dip coating. The method is less energy intensive and less dangerous than conventional supercritical aerogel processing techniques.

Brinker, Charles Jeffrey (Albuquerque, NM); Prakash, Sai Sivasankaran (Minneapolis, MN)

1999-01-01T23:59:59.000Z

244

Method for making thin polypropylene film  

DOE Patents (OSTI)

An economical method is provided for making uniform thickness polypropylene film as thin as 100 Angstroms. A solution of polypropylene dissolved in xylene is formed by mixing granular polypropylene and xylene together in a flask at an elevated temperature. A substrate, such as a glass plate or microscope slide is immersed in the solution. When the glass plate is withdrawn from the solution at a uniform rate, a thin polypropylene film forms on a flat surface area of the glass plate as the result of xylene evaporation. The actual thickness of the polypropylene film is functional of the polypropylene in xylene solution concentration, and the particular withdrawal rate of the glass plate from the solution. After formation, the thin polypropylene film is floated from the glass plate onto the surface of water, from which it is picked up with a wire hoop.

Behymer, R.D.; Scholten, J.A.

1985-11-21T23:59:59.000Z

245

High-field magnets using high-critical-temperature superconducting thin films  

DOE Patents (OSTI)

High-field magnets fabricated from high-critical-temperature superconducting ceramic (HTSC) thin films which can generate fields greater than 4 Tesla. The high-field magnets are made of stackable disk-shaped substrates coated with HTSC thin films, and involves maximizing the critical current density, superconducting film thickness, number of superconducting layers per substrate, substrate diameter, and number of substrates while minimizing substrate thickness. The HTSC thin films are deposited on one or both sides of the substrates in a spiral configuration with variable line widths to increase the field.

Mitlitsky, Fred (Livermore, CA); Hoard, Ronald W. (Livermore, CA)

1994-01-01T23:59:59.000Z

246

High-field magnets using high-critical-temperature superconducting thin films  

DOE Patents (OSTI)

High-field magnets fabricated from high-critical-temperature superconducting ceramic (HTSC) thin films which can generate fields greater than 4 Tesla are disclosed. The high-field magnets are made of stackable disk-shaped substrates coated with HTSC thin films, and involves maximizing the critical current density, superconducting film thickness, number of superconducting layers per substrate, substrate diameter, and number of substrates while minimizing substrate thickness. The HTSC thin films are deposited on one or both sides of the substrates in a spiral configuration with variable line widths to increase the field. 4 figures.

Mitlitsky, F.; Hoard, R.W.

1994-05-10T23:59:59.000Z

247

Ultra-high current density thin-film Si diode  

DOE Patents (OSTI)

A combination of a thin-film .mu.c-Si and a-Si:H containing diode structure characterized by an ultra-high current density that exceeds 1000 A/cm.sup.2, comprising: a substrate; a bottom metal layer disposed on the substrate; an n-layer of .mu.c-Si deposited the bottom metal layer; an i-layer of .mu.c-Si deposited on the n-layer; a buffer layer of a-Si:H deposited on the i-layer, a p-layer of .mu.c-Si deposited on the buffer layer; and a top metal layer deposited on the p-layer.

Wang; Qi (Littleton, CO)

2008-04-22T23:59:59.000Z

248

Formation of film superconductors by metallo-organic deposition  

SciTech Connect

This patent describes a method for producing thin film superconductor materials. It comprises forming a solution from the neodecanoates of yttrium, barium, and copper metals; depositing a film of the solution onto a substrate. The substrate selected from the group consisting of strontium titanate, barium titanate, and sapphire; pyrolyzing the film in an oxygen-containing environment at a first temperature of about 500{degrees}C. for about 5 minutes, so as to decompose the neodecanoates of yttrium, barium, and copper into a film containing oxides of yttrium, barium, and copper, the pyrolyzing occurring substantially immediately after the depositing step; and heating the metal oxide film to a second temperature of about 850{degrees}C. for a duration of approximately no more than 2 minutes and allowing the metal oxide film to cool to room temperature, then heating the metal oxide film to a third temperature of about 920{degrees}C. for a duration of approximately no more than 1 minute.

Micheli, A.L.; Dungan, D.F.; Hamdi, A.H.; Mantese, J.V.; Laugal, R.C.O.

1990-10-09T23:59:59.000Z

249

Investigation of multi-layer thin films for energy storage.  

DOE Green Energy (OSTI)

We investigate here the feasibility of increasing the energy density of thin-film capacitors by construction of a multi-layer capacitor device through ablation and redeposition of the capacitor materials using a high-power pulsed ion beam. The deposition experiments were conducted on the RHEPP-1 facility at Sandia National Laboratories. The dielectric capacitor filler material was a composition of Lead-Lanthanum-Zirconium-Titanium oxide (PLZT). The energy storage can be increased by using material of intrinsically high dielectric constant, and constructing many thin layers of this material. For successful device construction, there are a number of challenging requirements including correct stoichiometric and crystallographic composition of the deposited PLZT. This report details some success in satisfying these requirements, even though the attempt at device manufacture was unsuccessful. The conclusion that 900 C temperatures are necessary to reconstitute the deposited PLZT has implications for future manufacturing capability.

Renk, Timothy Jerome; Monson, Todd

2009-01-01T23:59:59.000Z

250

NANO-INDENTATION OF COPPER THIN FILMS ON SILICON SUBSTRATES  

E-Print Network (OSTI)

NANO-INDENTATION OF COPPER THIN FILMS ON SILICON SUBSTRATES S. Suresh1 , T.-G. Nieh2 and B.W. Choi2: Mechanical properties; Nano-indentation; Thin films; Copper; Dislocations Introduction Indentation methods films on substrates (e.g., [2,3]) using instrumented indentation. Nano-indentation studies of thin films

Suresh, Subra

251

Supercritical fluid molecular spray thin films and fine powders  

DOE Patents (OSTI)

Solid films are deposited, or fine powders formed, by dissolving a solid material into a supercritical fluid solution at an elevated pressure and then rapidly expanding the solution through a short orifice into a region of relatively low pressure. This produces a molecular spray which is directed against a substrate to deposit a solid thin film thereon, or discharged into a collection chamber to collect a fine powder. The solvent is vaporized and pumped away. Solution pressure is varied to determine, together with flow rate, the rate of deposition and to control in part whether a film or powder is produced and the granularity of each. Solution temperature is varied in relation to formation of a two-phase system during expansion to control porosity of the film or powder. A wide variety of film textures and powder shapes are produced of both organic and inorganic compounds. Films are produced with regular textural feature dimensions of 1.0-2.0 .mu.m down to a range of 0.01 to 0.1 .mu.m. Powders are formed in very narrow size distributions, with average sizes in the range of 0.02 to 5 .mu.m.

Smith, Richard D. (Richland, WA)

1988-01-01T23:59:59.000Z

252

Oriented niobate ferroelectric thin films for electrical and optical devices and method of making such films  

DOE Patents (OSTI)

Sr{sub x}Ba{sub 1{minus}x}Nb{sub 2}O{sub 6}, where x is greater than 0.25 and less than 0.75, and KNbO{sub 3} ferroelectric thin films metalorganic chemical vapor deposited on amorphous or crystalline substrate surfaces to provide a crystal axis of the film exhibiting a high dielectric susceptibility, electro-optic coefficient, and/or nonlinear optic coefficient oriented preferentially in a direction relative to a crystalline or amorphous substrate surface are disclosed. Such films can be used in electronic, electro-optic, and frequency doubling components. 8 figs.

Wessels, B.W.; Nystrom, M.J.

1998-05-19T23:59:59.000Z

253

Superhydrophobic Thin Film Symposium | ornl.gov  

NLE Websites -- All DOE Office Websites (Extended Search)

Superhydrophobic Thin Film Symposium Superhydrophobic Thin Film Symposium Sep 05 2012 12:00 AM - 05:00 PM Hosted by Oak Ridge Laboratory's Partnerships Directorate and focusing on the recent LDRD Launch project work completed by Dr. Tolga Aytug and Dr. John T. Simpson (ORNL research PI's). Oak Ridge, TN Oak Ridge National Laboratory CONTACT : Email: Cassie Lopez Phone:(865) 576-9294 Add to Calendar SHARE Hosted by Oak Ridge Laboratory's Partnerships Directorate and focusing on the recent LDRD Launch project work completed by Dr. Tolga Aytug and Dr. John T. Simpson (ORNL research PI's). Purpose To share the ORNL Superhydrophonbic Thin Film technology to prospective commercial partners. Date and Time The conference will be held on the morning of Wednesday September 5th at Oak Ridge National Laboratory (ORNL) by Partnerships and Technology

254

Mesoscale morphologies in polymer thin films.  

Science Conference Proceedings (OSTI)

In the midst of an exciting era of polymer nanoscience, where the development of materials and understanding of properties at the nanoscale remain a major R&D endeavor, there are several exciting phenomena that have been reported at the mesoscale (approximately an order of magnitude larger than the nanoscale). In this review article, we focus on mesoscale morphologies in polymer thin films from the viewpoint of origination of structure formation, structure development and the interaction forces that govern these morphologies. Mesoscale morphologies, including dendrites, holes, spherulites, fractals and honeycomb structures have been observed in thin films of homopolymer, copolymer, blends and composites. Following a largely phenomenological level of description, we review the kinetic and thermodynamic aspects of mesostructure formation outlining some of the key mechanisms at play. We also discuss various strategies to direct, limit, or inhibit the appearance of mesostructures in polymer thin films as well as an outlook toward potential areas of growth in this field of research.

Ramanathan, M.; Darling, S. B. (Center for Nanoscale Materials)

2011-06-01T23:59:59.000Z

255

Processing and Gas Barrier Behavior of Multilayer Thin Nanocomposite Films  

E-Print Network (OSTI)

Thin films with the ability to impart oxygen and other types of gas barrier are crucial to commercial packaging applications. Commodity polymers, such as polyethylene (PE), polycarbonate (PC) and polyethylene terephthalate (PET), have insufficient barrier for goods requiring long shelf life. Current gas barrier technologies like plasma-enhanced vapor deposition (PECVD) often create high barrier metal oxide films, which are prone to cracking when flexed. Bulk composites composed of polymer and impermeable nanoparticles show improved barrier, but particle aggregation limits their practical utility for applications requiring high barrier and transparency. Layer-by-layer (LbL) assemblies allow polymers and nanoparticles to be mixed with high particle loadings, creating super gas barrier thin films on substrates normally exhibiting high gas permeability. Branched polyethylenimine (PEI) and poly (acrylic acid) (PAA) were deposited using LbL to create gas barrier films with varying pH combinations. Film thickness and mass fraction of each component was controlled by their combined charge. With lower charge density (PEI at pH 10 and PAA at pH 4), PEI/PAA assemblies exhibit the best oxygen barrier relative to other pH combinations. An 8 BL PEI/PAA film, with a thickness of 451 nm, has an oxygen permeability lower than 4.8 x 10^-21 cm^3 * cm/cm^2 * s * Pa, which is comparable to a 100 nm SiOx nanocoating. Crosslinking these films with glutaraldehyde (GA), 1-[3-(dimethylamino)propyl]-3-ethylcarbodiimide methiodide (EDC) or heating forms covalent bonds between PEI and/or PAA. Oxygen transmission rates (OTR) of 8 BL films crosslinked with 0.1M GA or 0.01M EDC show the best oxygen barrier at 100% RH. Graphene oxide (GO) sheets and PEI were deposited via LbL with varying GO concentration. The resulting thin films have an average bilayer thickness from 4.3 to 5.0 nm and a GO mass fraction from 88 to 91wt%. Transmission electron microscopy and atomic force microscopy images reveal a highly-oriented nanobrick wall structure. A 10 BL PEI/GO film that is 91 nm thick, made with a 0.2 wt% GO suspension, exhibits an oxygen permeability of 2.5 x 10^-20 cm^3 * cm/cm^2 * s * Pa. Finally, the influence of deposition time on thin film assembly was examined by depositing montmorillonite (MMT) or laponite (LAP) clays paired with PEI. Film growth and microstructure suggests that smaller aspect ratio LAP clay is more dip-time dependent than MMT and larger aspect ratio MMT has better oxygen barrier. A 30 BL PEI/MMT film made with 10 second dips in PEI has the same undetectable OTR as a film with 5 minute dips (with dips in MMT held at 5 minutes in both cases), indicating LbL gas barrier can be made more quickly than initially thought. These high barrier recipes, with simple and efficient processing conditions, are good candidates for a variety of packaging applications.

Yang, You-Hao

2012-08-01T23:59:59.000Z

256

Tungsten-doped thin film materials - Energy Innovation Portal  

A dielectric thin film material for high frequency use, including use as a capacitor, and having a low dielectric loss factor is provided, the film comprising a ...

257

Chemistry Chemical Analysis Thin-Films Information at NIST  

Science Conference Proceedings (OSTI)

... Method Can Affect the Use of Block Copolymer Thin Films (10/18 ... NIST Scientists Address 'Wrinkles' in Transparent Film Development (10/02/2012). ...

2010-09-24T23:59:59.000Z

258

NIST Testing Method Quickly Tells Whether Thin Films Are ...  

Science Conference Proceedings (OSTI)

... and emerging technology areas that rely on thin-film advances for ... For films less than 1 micrometer thick, mechanical-property measurements made ...

2013-01-03T23:59:59.000Z

259

Thermoelectric effect in very thin film Pt/Au thermocouples  

E-Print Network (OSTI)

thin films, the electrical resistivity ratio ? F /? B is BStudies of the electrical resistivity of metallic films [23,calculate the electrical resistivity and the thermoelectric

Salvadori, M.C.; Vaz, A.R.; Teixeira, F.S.; Cattani, M.; Brown, I.G.

2006-01-01T23:59:59.000Z

260

Thin Film Solid Oxide Fuel Cells  

Science Conference Proceedings (OSTI)

A novel solid oxide fuel cell (SOFC) design that can be fabricated entirely using low-temperature, thin-film processing is described. Potential advantages of the cell are reduced materials costs and improved fuel-cell characteristics. The critical design feature is the use of thin (approximately equal to 50 nanometers), catalytically-active oxide layers on a < 10 micrometer thick yttria-stabilized zirconia (YSZ) supported electrolyte to minimize reaction overpotentials and ohmic losses. Doped ceria at th...

1995-03-29T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


261

Solution of thin film magnetization problems in type-II superconductivity  

Science Conference Proceedings (OSTI)

Keywords: critical current, numerical solution, superconductivity, thin film, variational inequality

Leonid Prigozhin

1998-07-01T23:59:59.000Z

262

Using Thin Films to Screen Possible Scintillator Materials  

SciTech Connect

The discovery and optimization of new scintillators has traditionally been a rather slow process due to the difficulties of single crystal growth. This paper discusses the production of polycrystalline scintillator thin films (a few microns thick) which were tested in order to determine what characterizations could be made concerning a material’s ultimate potential as a scintillator prior to pursuing crystal growth. Thin films of CaF2(Eu), CeF3, and CeCl3, all known scintillators, were produced by vapor deposition. The hygroscopic CeCl3 was coated with multiple polymer-aluminum oxide bi-layers. Emission spectra peak wavelengths and decay times agreed with single crystal values. The films were too thin to measure gamma photopeaks, but using alpha energy deposition peaks, one could compare the relative photon yield/MeV between materials. The values obtained appear to give a relevant indication of a material’s light yield potential. The technique also appears useful for quickly determining the proper dopant amount for a given material.

Milbrath, Brian D.; Caggiano, Joseph A.; Engelhard, Mark H.; Joly, Alan G.; Matson, Dean W.; Nachimuthu, Ponnusamy; Olsen, Larry C.

2009-06-30T23:59:59.000Z

263

Apparatus and process for deposition of hard carbon films  

DOE Patents (OSTI)

A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.

Nyaiesh, Ali R. (Menlo Park, CA); Garwin, Edward L. (Los Altos, CA)

1989-01-01T23:59:59.000Z

264

Nanostructured Inorganic Thin Film Enabled Fiber Optic Sensors for ...  

Science Conference Proceedings (OSTI)

... Thin Film Enabled Fiber Optic Sensors for Gas Sensing in Energy and Environmental Systems ... Co-Doped TiO2 Nanoparticles and Thin Films for Enhanced Solar Energy Utilization ... Synthesis of Magnetic Core-TS-1 Zeolite Shell Catalyst.

265

SAW determination of surface area of thin films  

DOE Patents (OSTI)

N.sub.2 adsorption isotherms are measured from thin films on SAW devices. The isotherms may be used to determine the surface area and pore size distribution of thin films.

Frye, Gregory C. (Albuquerque, NM); Martin, Stephen J. (Albuquerque, NM); Ricco, Antonio J. (Albuquerque, NM)

1990-01-01T23:59:59.000Z

266

Mechanical properties of surface modified silica low-k thin films  

Science Conference Proceedings (OSTI)

The surface modification of sol-gel deposited low-k thin films has been carried out successfully by trimethylchlorosilane (TMCS) using wet chemical treatment method. Ellipsometer is used to determine the thickness of films. The changes in chemical structure ... Keywords: Contact angle, Hydrophobic, Nano-indentation, Sol-gel, Surface modification

Yogesh S. Mhaisagar, Bhavana N. Joshi, Ashok M. Mahajan

2014-02-01T23:59:59.000Z

267

Using in Situ Thin Film Stress Measurements to Understand ...  

Science Conference Proceedings (OSTI)

Symposium, Nanostructured Materials for Lithium Ion Batteries and for Supercapacitors. Presentation Title, Using in Situ Thin Film Stress Measurements to ...

268

Fracture and Delamination in Thin Film Si Electrodes  

Science Conference Proceedings (OSTI)

Symposium, Nanostructured Materials for Lithium Ion Batteries and for Supercapacitors. Presentation Title, Fracture and Delamination in Thin Film Si Electrodes.

269

Magnetic properties of TM/RE bilayer thin films  

Science Conference Proceedings (OSTI)

... Magnetic properties of TM/RE bilayer thin films. I. Zoto University of Alabama. The magnetic recording technology badly ...

270

Organic thin film prehistory: looking towards solution phase aggregation |  

NLE Websites -- All DOE Office Websites (Extended Search)

Organic thin film prehistory: looking towards solution phase aggregation Organic thin film prehistory: looking towards solution phase aggregation Wednesday, November 6, 2013 - 3:00pm SLAC, Redtail Hawk Conference Room 108A Christopher Tassone, SSRL Polymer bulk heterojunction (BHJ) solar cells have attracted significant attention in industry and academia because of their potential for achieving large-area, light-weight, and flexible photovoltaic devices through cost-effective solution deposition techniques. These devices consist of a blend of an absorbing polymer and an electron accepting fullerene, the molecular packing and phase segregation of which heavily influence power conversion efficiency by effecting important processes such as exciton splitting, charge transport, and recombination. Understanding and utilization of molecular interactions to predicatively control the

271

Method for formation of thin film transistors on plastic substrates  

DOE Patents (OSTI)

A process for formation of thin film transistors (TFTs) on plastic substrates replaces standard thin film transistor fabrication techniques, and uses sufficiently lower processing temperatures so that inexpensive plastic substrates may be used in place of standard glass, quartz, and silicon wafer-based substrates. The process relies on techniques for depositing semiconductors, dielectrics, and metals at low temperatures; crystallizing and doping semiconductor layers in the TFT with a pulsed energy source; and creating top-gate self-aligned as well as back-gate TFT structures. The process enables the fabrication of amorphous and polycrystalline channel silicon TFTs at temperatures sufficiently low to prevent damage to plastic substrates. The process has use in large area low cost electronics, such as flat panel displays and portable electronics.

Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Sigmon, Thomas W. (Portola Valley, CA); Aceves, Randy C. (Livermore, CA)

1998-10-06T23:59:59.000Z

272

Eddy Current Testing for Detecting Small Defects in Thin Films  

SciTech Connect

Presented here is a technique of using Eddy Current based Giant Magneto-Resistance sensor (GMR) to detect surface and sub-layered minute defects in thin films. For surface crack detection, a measurement was performed on a copper metallization of 5-10 microns thick. It was done by scanning the GMR sensor on the surface of the wafer that had two scratches of 0.2 mm, and 2.5 mm in length respectively. In another experiment, metal coatings were deposited over the layers containing five defects with known lengths such that the defects were invisible from the surface. The limit of detection (resolution), in terms of defect size, of the GMR high-resolution Eddy Current probe was studied using this sample. Applications of Eddy Current testing include detecting defects in thin film metallic layers, and quality control of metallization layers on silicon wafers for integrated circuits manufacturing.

Obeid, Simon; Tranjan, Farid M. [Electrical and Computer Engineering Department, UNCC (United States); Dogaru, Teodor [Albany Instruments, 426-O Barton Creek, Charlotte, NC 28262 (United States)

2007-03-21T23:59:59.000Z

273

Fully Integrated Applications of Thin Films on Low Temperature Cofired Ceramic (LTCC)  

SciTech Connect

Thin film multilayers have previously been introduced on multilayer low temperature cofired ceramic (LTCC), as well as initial thin film capacitors on LTCC. The ruggedness of a multipurpose Ti-Cu-Pt-Au stack for connectivity and RF conductivity has continued to benefit fabrication and reliability in state of-the-art modules, while the capacitors have followed the traditional Metal-Insulator-Metal (MIM) style. The full integration of thin film passives with thin film connectivity traces is presented. Certain passives, such as capacitors, require specifically tailored and separately patterned thin film (multi-)layers, including a dielectric. Different capacitance values are achieved by variation of both the insulator layer thickness and the active area of the capacitor. Other passives, such as filters, require only the conductor - a single thin film multilayer. This can be patterned from the same connectivity thin film material (Ti-Cu-Pt-Au), or a specially tailored thin film material (e.g. Ti-Cu-Au) can be deposited. Both versions are described, including process and integration details. Examples are discussed, ranging from patterning for maximum tolerances, to space and performance-optimized designs. Cross-sectional issues associated with integration are also highlighted in the discussion.

Ambrose Wolf; Ken Peterson; Matt O'Keefe; Wayne Huebner; Bill Kuhn

2012-04-19T23:59:59.000Z

274

Solar photovoltaic technology: The thin film option  

DOE Green Energy (OSTI)

Photovoltaics (PV) the direct conversion of sunlight to electricity was first discovered by scientists at the Bell Labs in 1954. In the late 1960's and 1970's most of the solar cell technology has been used for space applications to power satellites. The main work horse for the PV technology has been crystalline silicon (Si) solar cells. Over the past 15 years this has led to cost reduction from $35/kWh to about $0.30/kWh at the present time. Demonstrated reliability of 20 years or more has resulted in acceptance by several utilities. However, cost reductions in crystalline Si solar cells have been limited by the cost of wafering of ingots and the attendant loss of material. A number of Si sheet solar cells are also being investigated. In the past decade the emphasis of the research and development effort has been focused on thin film solar cells, which have the potential for generating power at much lower cost of $1-2/Wp. Thin film solar cells that are presently being investigated and are generating global attention are: amorphous silicon (a-Si:H), cadmium telluride (CdTe), and copper indium diselenide (CuInSe/sub 2,/ or CIS). In the past few years, considerable progress has been; made by all three of these thin film solar cells. This paper reviews the current status and future potential of these exiting thin film solar cell technologies.

Ullal, H.S.; Zweibel, K.; Sabisky, E.S.; Surek, T.

1988-01-01T23:59:59.000Z

275

Thin film heterojunction photovoltaic cells and methods of making the same  

DOE Patents (OSTI)

A method of fabricating a thin film heterojunction photovoltaic cell which comprises depositing a film of a near intrinsic or n-type semiconductor compound formed of at least one of the metal elements of Class II B of the Periodic Table of Elements and at least tellurium and then heating said film at a temperature between about 250.degree. C. and 500.degree. C. for a time sufficient to convert said film to a suitably low resistivity p-type semiconductor compound. Such film may be deposited initially on the surface of an n-type semiconductor substrate. Alternatively, there may be deposited on the converted film a layer of n-type semiconductor compound different from the film semiconductor compound. The resulting photovoltaic cell exhibits a substantially increased power output over similar cells not subjected to the method of the present invention.

Basol, Bulent M. (Los Angeles, CA); Tseng, Eric S. (Los Angeles, CA); Rod, Robert L. (Los Angeles, CA)

1983-06-14T23:59:59.000Z

276

Thin-Film Solar Cell Fabricated on a Flexible Metallic Substrate  

SciTech Connect

A thin-film solar cell (10) is provided. The thin-film solar cell (10) comprises a flexible metallic substrate (12) having a first surface and a second surface. A back metal contact layer (16) is deposited on the first surface of the flexible metallic substrate (12). A semiconductor absorber layer (14) is deposited on the back metal contact. A photoactive film deposited on the semiconductor absorber layer (14) forms a heterojunction structure and a grid contact (24) deposited on the heterjunction structure. The flexible metal substrate (12) can be constructed of either aluminium or stainless steel. Furthermore, a method of constructing a solar cell is provided. The method comprises providing an aluminum substrate (12), depositing a semiconductor absorber layer (14) on the aluminum substrate (12), and insulating the aluminum substrate (12) from the semiconductor absorber layer (14) to inhibit reaction between the aluminum substrate (12) and the semiconductor absorber layer (14).

Tuttle, J. R.; Noufi, R.; Hasoon, F. S.

2006-05-30T23:59:59.000Z

277

Photodarkening Effect in a-(GaSe){sub 90}Ag{sub 10} Thin Films  

Science Conference Proceedings (OSTI)

The present paper reports the laser induced changes on the optical properties of a-(GaSe){sub 90}Ag{sub 10} thin films prepared by thermal evaporation technique. Thin film samples, on glass substrate, were exposed to laser light of wavelength {lambda} = 532 nm for different exposure times, t{sub E}(t{sub E}=0{sub s}, 500 s, 1000 s and 3000 s). Optical parameters like absorption coefficient and optical energy gap of as- deposited thin film and their laser induced changes were studied at three different times of exposure. The value of absorption coefficient of these thin film increases on exposing the film to laser irradiation. The optical absorption edge shift to lower photon energy i.e. the Photodarkening (PD) effect occurs. The results have been explained on the basis of structural changes that are occurring after the laser irradiation.

Gupta, Shikha; Mustafa, F. I.; Saini, G. S. S.; Goyal, Navdeep; Tripathi, S. K. [Department of Physics, Panjab University, Chandigarh-160 014 (India)

2011-12-12T23:59:59.000Z

278

Hydrogenated amorphous silicon films produced by chemical vapor deposition: Final report  

SciTech Connect

Hydrogenated amorphous silicon (a-Si:H) is a technologically important semiconductor, well-suited for solar photovoltaic energy conversion and thin film device applications. While the glow discharge technique is widely used for the deposition of a-Si:H films, this work is focused on the use of the chemical vapor deposition (CVD) technique, i.e., the thermal decomposition of disilane and higher silanes, for the deposition of a-Si:H films. A simple technique for the preparation of disilane and higher silanes by using an electric discharge in monosilane under atmospheric pressure has been developed, and the discharge product can be used directly for the deposition process. The important parameters of the CVD process including the substrate temperature, the composition and flow rate of the reaction mixture, and the nature of the diluent gas for disilane, have also been investigated. The deposition rate of a-Si:H films in a helium atmosphere is considerably higher than that in a hydrogen atmosphere, and the CVD process in a helium atmosphere is well-suited for the deposition of thick a-Si:H films. The a-Si:H films deposited under various conditions have been characterized by the photoconductivity, dissolution rate, optical absorption, mechanical stress, gap state density, minority carrier diffusion length, and stability measurements. On the basis of these measurements, a-Si:H films deposited by the thermal decomposition of disilane in a helium atmosphere exhibit better structural and electronic properties than those deposited in a hydrogen atmosphere.

Not Available

1987-04-01T23:59:59.000Z

279

Symposium G: Thin Films and Surface Engineering  

Science Conference Proceedings (OSTI)

Aug 3, 2010 ... The incidence of infections caused by the use of bacterial colonized stainless steel has led ... Excellent antibacterial activities (>99%) against both Gram- negative ... that the films could be used as a active layer for switchable mirror. .... beam vapor deposition system (HCEBVD) under various Ar/N2 flow ratio.

280

Polycrystalline thin film materials and devices  

DOE Green Energy (OSTI)

Results of Phase II of a research program on polycrystalline thin film heterojunction solar cells are presented. Relations between processing, materials properties and device performance were studied. The analysis of these solar cells explains how minority carrier recombination at the interface and at grain boundaries can be reduced by doping of windows and absorber layers, such as in high efficiency CdTe and CuInSe{sub 2} based solar cells. The additional geometric dimension introduced by the polycrystallinity must be taken into consideration. The solar cells are limited by the diode current, caused by recombination in the space charge region. J-V characteristics of CuInSe{sub 2}/(CdZn)S cells were analyzed. Current-voltage and spectral response measurements were also made on high efficiency CdTe/CdS thin film solar cells prepared by vacuum evaporation. Cu-In bilayers were reacted with Se and H{sub 2}Se gas to form CuInSe{sub 2} films; the reaction pathways and the precursor were studied. Several approaches to fabrication of these thin film solar cells in a superstrate configuration were explored. A self-consistent picture of the effects of processing on the evolution of CdTe cells was developed.

Baron, B.N.; Birkmire, R.W.; Phillips, J.E.; Shafarman, W.N.; Hegedus, S.S.; McCandless, B.E. (Delaware Univ., Newark, DE (United States). Inst. of Energy Conversion)

1992-10-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


281

Supercritical fluid molecular spray film deposition and powder formation  

DOE Patents (OSTI)

Solid films are deposited, or fine powders formed, by dissolving a solid material into a supercritical fluid solution at an elevated pressure and then rapidly expanding the solution through a short orifice into a region of relatively low pressure. This produces a molecular spray which is directed against a substrate to deposit a solid thin film thereon, or discharged into a collection chamber to collect a fine powder. Upon expansion and supersonic interaction with background gases in the low pressure region, any clusters of solvent are broken up and the solvent is vaporized and pumped away. Solute concentration in the solution is varied primarily by varying solution pressure to determine, together with flow rate, the rate of deposition and to control in part whether a film or powder is produced and the granularity of each. Solvent clustering and solute nucleation are controlled by manipulating the rate of expansion of the solution and the pressure of the lower pressure region. Solution and low pressure region temperatures are also controlled.

Smith, Richard D. (Richland, WA)

1986-01-01T23:59:59.000Z

282

Silicon Oxynitride Thin Film Barriers for PV Packaging (Poster)  

DOE Green Energy (OSTI)

Dielectric, adhesion-promoting, moisture barriers comprised of silicon oxynitride thin film materials (SiOxNy with various material stoichiometric compositions x,y) were applied to: 1) bare and pre-coated soda-lime silicate glass (coated with transparent conductive oxide SnO2:F and/or aluminum), and polymer substrates (polyethylene terephthalate, PET, or polyethylene napthalate, PEN); plus 2) pre- deposited photovoltaic (PV) cells and mini-modules consisting of amorphous silicon (a-Si) and copper indium gallium diselenide (CIGS) thin-film PV technologies. We used plasma enhanced chemical vapor deposition (PECVD) process with dilute silane, nitrogen, and nitrous oxide/oxygen gas mixtures in a low-power (< or = 10 milliW per cm2) RF discharge at ~ 0.2 Torr pressure, and low substrate temperatures < or = 100(degrees)C, over deposition areas ~ 1000 cm2. Barrier properties of the resulting PV cells and coated-glass packaging structures were studied with subsequent stressing in damp-heat exposure at 85(degrees)C/85% RH. Preliminary results on PV cells and coated glass indicate the palpable benefits of the barriers in mitigating moisture intrusion and degradation of the underlying structures using SiOxNy coatings with thicknesses in the range of 100-200 nm.

del Cueto, J. A.; Glick, S. H.; Terwilliger, K. M.; Jorgensen, G. J.; Pankow, J. W.; Keyes, B. M.; Gedvilas, L. M.; Pern, F. J.

2006-10-03T23:59:59.000Z

283

Low temperature photochemical vapor deposition of alloy and mixed metal oxide films  

DOE Patents (OSTI)

Method and apparatus for formation of an alloy thin film, or a mixed metal oxide thin film, on a substrate at relatively low temperatures. Precursor vapor(s) containing the desired thin film constituents is positioned adjacent to the substrate and irradiated by light having wavelengths in a selected wavelength range, to dissociate the gas(es) and provide atoms or molecules containing only the desired constituents. These gases then deposit at relatively low temperatures as a thin film on the substrate. The precursor vapor(s) is formed by vaporization of one or more precursor materials, where the vaporization temperature(s) is selected to control the ratio of concentration of metals present in the precursor vapor(s) and/or the total precursor vapor pressure.

Liu, David K. (San Pablo, CA)

1992-01-01T23:59:59.000Z

284

Polycrystalline thin films FY 1992 project report  

DOE Green Energy (OSTI)

This report summarizes the activities and results of the Polycrystalline Thin Film Project during FY 1992. The purpose of the DOE/NREL PV (photovoltaic) Program is to facilitate the development of PV that can be used on a large enough scale to produce a significant amount of energy in the US and worldwide. The PV technologies under the Polycrystalline Thin Film project are among the most exciting next-generation'' options for achieving this goal. Over the last 15 years, cell-level progress has been steady, with laboratory cell efficiencies reaching levels of 15 to 16%. This progress, combined with potentially inexpensive manufacturing methods, has attracted significant commercial interest from US and international companies. The NREL/DOE program is designed to support the efforts of US companies through cost-shared subcontracts (called government/industry partnerships'') that we manage and fund and through collaborative technology development work among industry, universities, and our laboratory.

Zweibel, K. (ed.)

1993-01-01T23:59:59.000Z

285

Polycrystalline thin films FY 1992 project report  

DOE Green Energy (OSTI)

This report summarizes the activities and results of the Polycrystalline Thin Film Project during FY 1992. The purpose of the DOE/NREL PV (photovoltaic) Program is to facilitate the development of PV that can be used on a large enough scale to produce a significant amount of energy in the US and worldwide. The PV technologies under the Polycrystalline Thin Film project are among the most exciting ``next-generation`` options for achieving this goal. Over the last 15 years, cell-level progress has been steady, with laboratory cell efficiencies reaching levels of 15 to 16%. This progress, combined with potentially inexpensive manufacturing methods, has attracted significant commercial interest from US and international companies. The NREL/DOE program is designed to support the efforts of US companies through cost-shared subcontracts (called ``government/industry partnerships``) that we manage and fund and through collaborative technology development work among industry, universities, and our laboratory.

Zweibel, K. [ed.

1993-01-01T23:59:59.000Z

286

Thin film photovoltaic panel and method  

DOE Patents (OSTI)

A thin film photovoltaic panel includes a backcap for protecting the active components of the photovoltaic cells from adverse environmental elements. A spacing between the backcap and a top electrode layer is preferably filled with a desiccant to further reduce water vapor contamination of the environment surrounding the photovoltaic cells. The contamination of the spacing between the backcap and the cells may be further reduced by passing a selected gas through the spacing subsequent to sealing the backcap to the base of the photovoltaic panels, and once purged this spacing may be filled with an inert gas. The techniques of the present invention are preferably applied to thin film photovoltaic panels each formed from a plurality of photovoltaic cells arranged on a vitreous substrate. The stability of photovoltaic conversion efficiency remains relatively high during the life of the photovoltaic panel, and the cost of manufacturing highly efficient panels with such improved stability is significantly reduced.

Ackerman, Bruce (El Paso, TX); Albright, Scot P. (El Paso, TX); Jordan, John F. (El Paso, TX)

1991-06-11T23:59:59.000Z

287

Packaging material for thin film lithium batteries  

SciTech Connect

A thin film battery including components which are capable of reacting upon exposure to air and water vapor incorporates a packaging system which provides a barrier against the penetration of air and water vapor. The packaging system includes a protective sheath overlying and coating the battery components and can be comprised of an overlayer including metal, ceramic, a ceramic-metal combination, a parylene-metal combination, a parylene-ceramic combination or a parylene-metal-ceramic combination.

Bates, John B. (116 Baltimore Dr., Oak Ridge, TN 37830); Dudney, Nancy J. (11634 S. Monticello Rd., Knoxville, TN 37922); Weatherspoon, Kim A. (223 Wadsworth Pl., Oak Ridge, TN 37830)

1996-01-01T23:59:59.000Z

288

Laser-assisted sol-gel growth and characteristics of ZnO thin films  

SciTech Connect

ZnO thin films were grown on Si(100) substrates by a sol-gel method assisted by laser beam irradiation with a 325 nm He-Cd laser. In contrast to conventional sol-gel ZnO thin films, the surface morphology of the laser-assisted sol-gel thin films was much smoother, and the residual stress in the films was relaxed by laser irradiation. The luminescent properties of the films were also enhanced by laser irradiation, especially, by irradiation during the deposition and post-heat treatment stages. The incident laser beam is thought to play several roles, such as annihilating defects by accelerating crystallization during heat treatment, enhancing the surface migration of atoms and molecules, and relaxing the ZnO matrix structure during crystallization.

Kim, Min Su; Kim, Soaram [Department of Nano Systems Engineering, Center for Nano Manufacturing, Inje University, Gimhae 621-749 (Korea, Republic of); Leem, Jae-Young [Department of Nano Systems Engineering, Center for Nano Manufacturing, Inje University, Gimhae 621-749 (Korea, Republic of); Department of Nano Engineering, Inje University, Gimhae 621-749 (Korea, Republic of)

2012-06-18T23:59:59.000Z

289

Process for forming epitaxial perovskite thin film layers using halide precursors  

DOE Patents (OSTI)

A process for forming an epitaxial perovskite-phase thin film on a substrate. This thin film can act as a buffer layer between a Ni substrate and a YBa.sub.2 Cu.sub.3 O.sub.7-x superconductor layer. The process utilizes alkali or alkaline metal acetates dissolved in halogenated organic acid along with titanium isopropoxide to dip or spin-coat the substrate which is then heated to about 700.degree. C. in an inert gas atmosphere to form the epitaxial film on the substrate. The YBCO superconductor can then be deposited on the layer formed by this invention.

Clem, Paul G. (Albuquerque, NM); Rodriguez, Mark A. (Albuquerque, NM); Voigt, James A. (Corrales, NM); Ashley, Carol S. (Albuquerque, NM)

2001-01-01T23:59:59.000Z

290

Post-growth surface smoothing of thin films of diindenoperylene  

Science Conference Proceedings (OSTI)

We applied in situ x-ray reflectivity and ultraviolet photoelectron spectroscopy to study the impact of annealing on low temperature (200 K) deposited organic thin films of diindenoperylene (DIP) on SiO{sub 2} and indium tin oxide (ITO). At 200 K, DIP is crystalline on SiO{sub 2} and amorphous on ITO. Upon heating to room temperature, the roughness of DIP is reduced on both substrates, from 1.5 nm to 0.75 nm (SiO{sub 2}) and from 0.90 nm to 0.45 nm (ITO). The smoothing is accompanied by crystallization of the surface molecules, whereas the bulk structure of the films does not strongly reorganize.

Hinderhofer, A. [Institute for Applied Physics, University of Tuebingen, Auf der Morgenstelle 10, Tuebingen 72076 (Germany); Graduate School of Advanced Integration Science, Chiba University,1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Hosokai, T. [Department of Materials and Science, Iwate University, Ueda 4-3-5, Morioka, Iwate 0208551 (Japan); Yonezawa, K.; Kato, K.; Kera, S.; Ueno, N. [Graduate School of Advanced Integration Science, Chiba University,1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Gerlach, A.; Broch, K.; Frank, C.; Schreiber, F. [Institute for Applied Physics, University of Tuebingen, Auf der Morgenstelle 10, Tuebingen 72076 (Germany); Novak, J. [Institute for Applied Physics, University of Tuebingen, Auf der Morgenstelle 10, Tuebingen 72076 (Germany); European Synchrotron Radiation Facility (ESRF), BP 220, Grenoble 38043 (France)

2012-07-16T23:59:59.000Z

291

X-Ray Studies of GaN Film Grown on Si Using Electrochemical Deposition Techniques  

Science Conference Proceedings (OSTI)

This paper reports on the X-ray studies of GaN thin films deposited on Si (111) substrate at different current density using electrochemical deposition technique. The structural properties of GaN films were studied by X-ray diffraction (XRD). XRD analysis showed that hexagonal wurtzite and cubic zinc blende GaN phases were both deposited on Si (111). The lattice constants, the average size of h-GaN crystals and the in-plane (along a-axis) and out of plane (along c-axis) strains were calculated from XRD analysis.

Al-Heuseen, K.; Hashim, M. R. [Nano-Optoelectronics Research and Technology Laboratory School of Physics, Universiti Sains Malaysia (USM), 11800 Minden, Penang (Malaysia)

2011-03-30T23:59:59.000Z

292

Substrate heating measurements in pulsed ion beam film deposition  

Science Conference Proceedings (OSTI)

Diamond-like Carbon (DLC) films have been deposited at Los Alamos National Laboratory by pulsed ion beam ablation of graphite targets. The targets were illuminated by an intense beam of hydrogen, carbon, and oxygen ions at a fluence of 15-45 J/cm{sup 2}. Ion energies were on the order of 350 keV, with beam current rising to 35 kA over a 400 ns ion current pulse. Raman spectra of the deposited films indicate an increasing ratio of sp{sup 3} to sp{sup 2} bonding as the substrate is moved further away from the target and further off the target normal. Using a thin film platinum resistor at varying positions, we have measured the heating of the substrate surface due to the kinetic energy and heat of condensation of the ablated material. This information is used to determine if substrate heating is responsible for the lack of DLC in positions close to the target and near the target normal. Latest data and analysis will be presented.

Olson, J.C.; Davis, H.A.; Rej, D.J.; Waganaar, W.J. [Los Alamos National Lab., NM (United States); Tallant, D.R. [Cornell Univ., Ithaca, NY (United States). Materials Science and Engineering Dept.; Thompson, M.O. [Sandia National Labs., Albuquerque, NM (United States)

1995-05-01T23:59:59.000Z

293

Influence of process parameters on properties of reactively sputtered tungsten nitride thin films  

SciTech Connect

Tungsten nitride (WN{sub x}) thin films were produced by reactive dc magnetron sputtering of tungsten in an Ar-N{sub 2} gas mixture. The influence of the deposition power on the properties of tungsten nitride has been analyzed and compared with that induced by nitrogen content variation in the sputtering gas. A combined analysis of structural, electrical and optical properties on thin WN{sub x} films obtained at different deposition conditions has been performed. It was found that at an N{sub 2} content of 14% a single phase structure of W{sub 2}N films was formed with the highest crystalline content. This sputtering gas composition was subsequently used for fabricating films at different deposition powers. Optical analysis showed that increasing the deposition power created tungsten nitride films with a more metallic character, which is confirmed with resistivity measurements. At low sputtering powers the resulting films were crystalline whereas, with an increase of power, an amorphous phase was also present. The incorporation of an excess of nitrogen atoms resulted in an expansion of the W{sub 2}N lattice and this effect was more pronounced at low deposition powers. Infrared analysis revealed that in WN{sub x} films deposited at low power, chemisorbed N{sub 2} molecules did not behave as ligands whereas at high deposition power they clearly appeared as ligands around metallic tungsten. In this study, the influence of the most meaningful deposition parameters on the phase transformation reaction path was established and deposition conditions suitable for producing thermally stable and highly crystalline W{sub 2}N films were found.

Addonizio, Maria L.; Castaldo, Anna; Antonaia, Alessandro; Gambale, Emilia; Iemmo, Laura [ENEA, Portici Research Centre, Piazzale E. Fermi 1, I-80055, Portici (Italy)

2012-05-15T23:59:59.000Z

294

NREL: Photovoltaics Research - Thin Film Photovoltaic Partnership Project  

NLE Websites -- All DOE Office Websites (Extended Search)

Thin Film Photovoltaic Partnership Project Thin Film Photovoltaic Partnership Project NREL's Thin Film Photovoltaic (PV) Partnership Project led R&D on emerging thin-film solar technologies in the United States from 1994 to 2009. The project made many advances in thin-film PV technologies that allowed the United States to attain world leadership in this area of solar technology. Three national R&D teams focused on thin-film semiconductor materials: amorphous silicon (a-Si), cadmium telluride (CdTe), and copper indium gallium diselenide (CIGS) and its alloys. The Module Reliability Team and Environmental Health and Safety Team were crosscutting. The teams comprised researchers from the solar industry, academia, and NREL who focused their efforts on improving materials, devices, and manufacturing processes-all

295

Fabrication Of Multilayered Thin Films Via Spin-Assembly  

NLE Websites -- All DOE Office Websites (Extended Search)

Fabrication Of Multilayered Thin Films Via Spin-Assembly Fabrication Of Multilayered Thin Films Via Spin-Assembly Fabrication Of Multilayered Thin Films Via Spin-Assembly A process of forming multilayer thin film heterostructures. Available for thumbnail of Feynman Center (505) 665-9090 Email Fabrication Of Multilayered Thin Films Via Spin-Assembly A process of forming multilayer thin film heterostructures is disclosed and includes applying a solution including a first water-soluble polymer from the group of polyanionic species, polycationic species and uncharged polymer species onto a substrate to form a first coating layer on the substrate, drying the first coating layer on the substrate, applying a solution including a second water-soluble polymer from the group of polyanionic species, polycationic species and uncharged polymer species

296

Thin films by metal-organic precursor plasma spray  

Science Conference Proceedings (OSTI)

While most plasma spray routes to coatings utilize solids as the precursor feedstock, metal-organic precursor plasma spray (MOPPS) is an area that the authors have investigated recently as a novel route to thin film materials. Very thin films are possible via MOPPS and the technology offers the possibility of forming graded structures by metering the liquid feed. The current work employs metal-organic compounds that are liquids at standard temperature-pressure conditions. In addition, these complexes contain chemical functionality that allows straightforward thermolytic transformation to targeted phases of interest. Toward that end, aluminum 3,5-heptanedionate (Al(hd){sub 3}), triethylsilane (HSi(C{sub 2}H{sub 5}){sub 3} or HSiEt{sub 3}), and titanium tetrakisdiethylamide (Ti(N(C{sub 2}H{sub 5}){sub 2}){sub 4} or Ti(NEt{sub 2}){sub 4}) were employed as precursors to aluminum oxide, silicon carbide, and titanium nitride, respectively. In all instances, the liquids contain metal-heteroatom bonds envisioned to provide atomic concentrations of the appropriate reagents at the film growth surface, thus promoting phase formation (e.g., Si-C bond in triethylsilane, Ti-N bond in titanium amide, etc.). Films were deposited using a Sulzer Metco TriplexPro-200 plasma spray system under various experimental conditions using design of experiment principles. Film compositions were analyzed by glazing incidence x-ray diffraction and elemental determination by x-ray spectroscopy. MOPPS films from HSiEt{sub 3} showed the formation of SiC phase but Al(hd){sub 3}-derived films were amorphous. The Ti(NEt{sub 2}){sub 4} precursor gave MOPPS films that appear to consist of nanosized splats of TiOCN with spheres of TiO{sub 2} anatase. While all films in this study suffered from poor adhesion, it is anticipated that the use of heated substrates will aid in the formation of dense, adherent films.

Schulz, Douglas L.; Sailer, Robert A.; Payne, Scott; Leach, James; Molz, Ronald J. [North Dakota State University, Fargo, North Dakota 58108-6050 (United States); Sulzer Metco (United States) Inc., Westbury, New York 11590-2724 (United States)

2009-07-15T23:59:59.000Z

297

CAT-CVD process and its application to preparation of Si-based thin films  

SciTech Connect

This is to review the present understanding on Cat-CVD (catalytic chemical vapor deposition) or hot wire CVD. Firstly, the deposition mechanism in Cat-CVD process is briefly mentioned along with key issues such as the effect of heat radiation and a method to avoid contamination from the catalyzer. Secondly, the properties of Cat-CVD Si-based thin films such as amorphous silicon (a-Si), polycrystalline silicon (poly-Si) and silicon nitride (SiN{sub x}) films are demonstrated, and finally, the feasibility of such films for industrial application is discussed.

Matsumura, Hideki; Masuda, Atsushi; Izumi, Akira

1999-07-01T23:59:59.000Z

298

Overview and Challenges of Thin Film Solar Electric Technologies  

DOE Green Energy (OSTI)

In this paper, we report on the significant progress made worldwide by thin-film solar cells, namely, amorphous silicon (a-Si), cadmium telluride (CdTe), and copper indium gallium diselenide (CIGS). Thin-film photovoltaic (PV) technology status is also discussed in detail. In addition, R&D and technology challenges in all three areas are elucidated. The worldwide estimated projection for thin-film PV technology production capacity announcements are estimated at more than 5000 MW by 2010.

Ullal, H. S.

2008-12-01T23:59:59.000Z

299

Low Cost Fabrication of Thin-Film Ceramic Membranes for ...  

For Industry; For Researchers; Success Stories; About Us; ... Inexpensive Production of High Density Thin Ceramic Films on Rigid or Porous Substrates, ...

300

Evaluation of Thin-film Interfacial Properties Using Indentation Test  

Science Conference Proceedings (OSTI)

A thin film's reliable question is depend on interfacial characterization, so evaluating interfacial characterization is the most important things in this test. So far ...

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


301

Ferroelectric Thin Film Capacitors to Enable a Miniaturized Smart L ...  

Science Conference Proceedings (OSTI)

The effects ultra-violet (UV)-assisted processing and compositional grading of BST capacitor thin films will be presented and the material property trade-offs for  ...

302

Single-Crystalline Thin Film Used in Photovoltaics  

Energy.gov (U.S. Department of Energy (DOE))

Single-crystalline thin films are made from gallium arsenide (GaAs), a compound semiconductor that is a mixture of gallium and arsenic.

303

Thin film techniques for solid oxide fuel cells  

Thin film techniques for solid oxide fuel cells V.E.J. van Dieten and J. Schoonman Laboratory ... ticles stay in the hot temperature region can be ...

304

Layer-by-Layer Assembled Thin Films for Battery Electrolytes  

Science Conference Proceedings (OSTI)

Presentation Title, Layer-by-Layer Assembled Thin Films for Battery Electrolytes ... Abstract Scope, Exponential layer-by-layer (eLBL) assembled battery ...

305

Thin-Film Ferroelectric Materials for Decoupling and Tunable ...  

Science Conference Proceedings (OSTI)

Symposium, ACerS Richard M. Fulrath Award Symposium. Presentation Title, Thin-Film Ferroelectric Materials for Decoupling and Tunable Capacitors. Author( s) ...

306

Development of Polyimide/SMA Thin-Film Actuator  

Science Conference Proceedings (OSTI)

Symposium, Symposium I: Biomaterials, Smart Materials and Structures. Presentation Title, Development of Polyimide/SMA Thin-Film Actuator. Author(s), Akira ...

307

Integrated Technology of Decoupling BST Thin Film Capacitors  

Science Conference Proceedings (OSTI)

Jun 16, 2007 ... The integration technology of decoupling capacitors, which contain multi-layered Cu wiring and Barium Strontium Titanate (BST) thin film ...

308

How Thin Film Processing Can Contribute to Understanding the ...  

Science Conference Proceedings (OSTI)

Presentation Title, How Thin Film Processing Can Contribute to Understanding the Materials Science of the MAX Phases. Author(s), Per Eklund, Ulf Jansson, ...

309

Fabrication of Solid Oxide Fuel Cells via Thin Film Techniques  

Science Conference Proceedings (OSTI)

We decided to use thin film techniques to solve this problem. Among various methods of lowering the operation temperature for SOFCs, adopting bi-layer ...

310

Lessons Learned in Sputtering TiNi Thin Film  

Science Conference Proceedings (OSTI)

Experimental results have been published in journals and conference proceedings, but as yet TiNi thin film is not commercially available. The author and ...

311

AMORPHOUS THIN FILMS CONSISTING OF TERNARY MgZnCa ...  

Science Conference Proceedings (OSTI)

Jul 20, 2012 ... AMORPHOUS THIN FILMS CONSISTING OF TERNARY MgZnCa-ALLOYS by K. Schlüter, C. Zamponi, U. Schürmann, N. Hort, L. Kienle, K.U. ...

312

Interface Adhesion and Coating Integrity of the Thin Film Au ...  

Science Conference Proceedings (OSTI)

Current scientific emphasis is on process development and optimization of thin film Au-interconnect metallization for the Bi2Te3-based TE module used for the ...

313

Development of Thin-Film Materials Technology for Energy Applications...  

NLE Websites -- All DOE Office Websites (Extended Search)

Development of Thin-Film Materials Technology for Energy Applications: High Temperature Superconductors, etc. Speaker(s): Ronald Reade Date: January 15, 2002 - 12:00pm Location:...

314

Processing and modeling issues for thin-film solar cell devices. Final report  

DOE Green Energy (OSTI)

During the third phase of the subcontract, IEC researchers have continued to provide the thin film PV community with greater depth of understanding and insight into a wide variety of issues including: the deposition and characterization of CuIn{sub 1-x}Ga{sub x}Se{sub 2}, a-Si, CdTe, CdS, and TCO thin films; the relationships between film and device properties; and the processing and analysis of thin film PV devices. This has been achieved through the systematic investigation of all aspects of film and device production and through the analysis and quantification of the reaction chemistries involved in thin film deposition. This methodology has led to controlled fabrications of 15% efficient CuIn{sub 1-x}Ga{sub x}Se{sub 2} solar cells over a wide range of Ga compositions, improved process control of the fabrication of 10% efficient a-Si solar cells, and reliable and generally applicable procedures for both contacting and doping films. Additional accomplishments are listed below.

Birkmire, R.W.; Phillips, J.E. [Univ. of Delaware, Newark, DE (United States). Institute of Energy Conversion

1997-11-01T23:59:59.000Z

315

Rechargeable thin-film electrochemical generator  

DOE Patents (OSTI)

An improved electrochemical generator is disclosed. The electrochemical generator includes a thin-film electrochemical cell which is maintained in a state of compression through use of an internal or an external pressure apparatus. A thermal conductor, which is connected to at least one of the positive or negative contacts of the cell, conducts current into and out of the cell and also conducts thermal energy between the cell and thermally conductive, electrically resistive material disposed on a vessel wall adjacent the conductor. The thermally conductive, electrically resistive material may include an anodized coating or a thin sheet of a plastic, mineral-based material or conductive polymer material. The thermal conductor is fabricated to include a resilient portion which expands and contracts to maintain mechanical contact between the cell and the thermally conductive material in the presence of relative movement between the cell and the wall structure. The electrochemical generator may be disposed in a hermetically sealed housing.

Rouillard, Roger (Beloeil, CA); Domroese, Michael K. (South St. Paul, MN); Hoffman, Joseph A. (Minneapolis, MN); Lindeman, David D. (Hudson, WI); Noel, Joseph-Robert-Gaetan (St-Hubert, CA); Radewald, Vern E. (Austin, TX); Ranger, Michel (Lachine, CA); Sudano, Anthony (Laval, CA); Trice, Jennifer L. (Eagan, MN); Turgeon, Thomas A. (Fridley, MN)

2000-09-15T23:59:59.000Z

316

90-Degree Bragg Reflection from a Thin Crystalline Film  

SciTech Connect

Experimental observations of synchrotron radiation diffraction from a thin surface layer at a 90-degree Bragg reflection are reported and discussed. The synchrotron experiments were performed using a bending magnet source at the European Synchrotron Radiation Facility (ESRF) in France and undulator sources at the Advanced Photon Source (APS) in the U.S. and SPring-8 in Japan. Thin (0.5, 1.0 and 1.5 micron) InGaAs films deposited on a GaAs (100) substrate were studied near the 90- degree using the GaAs (800) reflection. A slight, less than 0.1%, difference in the lattice spacing between the layer and the substrate is sufficient to allow a direct and exclusive observation of the diffraction profile from a thin layer as if it was a 'free-standing' thin crystal. This research opens new possibilities for x-ray optical schemes and the development of novel analytical techniques for surface/interface x-ray diffraction studies.

Nikulin, A.Y.; Davis, J.R.; Usher, B.F.; Freund, A.K.; Ishikawa, T.

2001-09-11T23:59:59.000Z

317

Thin film photovoltaic device with multilayer substrate  

DOE Patents (OSTI)

A thin film photovoltaic device which utilizes at least one compound semiconductor layer chosen from Groups IIB and VA of the Periodic Table is formed on a multilayer substrate The substrate includes a lowermost support layer on which all of the other layers of the device are formed. Additionally, an uppermost carbide or silicon layer is adjacent to the semiconductor layer. Below the carbide or silicon layer is a metal layer of high conductivity and expansion coefficient equal to or slightly greater than that of the semiconductor layer.

Catalano, Anthony W. (Rushland, PA); Bhushan, Manjul (Wilmington, DE)

1984-01-01T23:59:59.000Z

318

Articles including thin film monolayers and multilayers  

DOE Patents (OSTI)

This invention pertains to thin film assemblies or devices useful as sensors, nonlinear optical materials, and trace material scavengers. It claims a base substrate having an oxide surface layer, and a multidentate ligand, capable of binding a metal ion, attached to the oxide surface layer of the base substrate. A metal species may be provided attached to the ligand, and a multifunctional organic ligand may be provided attached to the metal species. A second metal species may be provided attached to the multifunctional ligand.

Li, DeQuan; Swanson, B.I.

1992-12-31T23:59:59.000Z

319

Solvent-assisted growth of metal phthalocyanine thin films on Au(111)  

Science Conference Proceedings (OSTI)

Thin films of metal phthalocyanine (MPc) are grown on an Au(111) support with a newly developed aerosol molecular beam deposition source and characterized in situ via ultrahigh vacuum scanning tunneling microscopy. MPcs are delivered to Au(111) in a series of N{sub 2}-entrained microsized solvent droplets of variable surface residence time. Phthalocyanine film registration to the herringbone reconstruction of the Au(111) surface, indicative of thermodynamically favored structure, is observed at submonolayer coverages for aromatic solvents with long residence times. Aerosol-deposited monolayer film structures are noncrystalline with tilted MPc orientations and vacancy nanocavities. Upon annealing, MPc molecules adopt flat-lying orientations with respect to the substrate and vacancies are eliminated. Film morphologies indicate solvation-mediated film nucleation and growth, with less long-range ordering that in vapor-generated films.

Tskipuri, Levan; Shao Qian; Reutt-Robey, Janice [Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742-4454 (United States)

2012-05-15T23:59:59.000Z

320

Kinetic Monte Carlo simulations of nanocrystalline film deposition  

E-Print Network (OSTI)

A full diffusion kinetic Monte Carlo algorithm is used to model nanocrystalline film deposition, and study the mechanisms of grain nucleation and microstructure formation in such films. The major finding of this work is ...

Ruan, Shiyun

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


321

Optical Properties of MEH-PPV Thin Films Containing ZnO Nanoparticles  

Science Conference Proceedings (OSTI)

Thin films of poly [2-methoxy-5(2'-ethyl hexyloxy)-phenylene vinylene](MEH-PPV) containing different weight percent of ZnO nanoparticles were deposited by spin coating from THF solutions and their optical properties were investigated. Optical characterization of the nanocomposite thin films were performed by Ultraviolet-Visible Spectrophotometer (UV-Vis) and Photoluminescence Spectrometer while the thickness of the thin films was measured by using Surface Profiler. The UV-Vis absorption spectra of MEH-PPV: ZnO films showed a small red shift as compared with pure MEH-PPV. Similarly, a small red shift was found in PL emission spectra with increasing the content of ZnO nanoparticles.

Zayana, N. Y. [NANO-SciTech Center (NST), Institute of Science, Universiti Teknologi MARA, 40450 Shah Alam (Malaysia); Shariffudin, S. S. [NANO- ElecTronic Centre (NET), Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam (Malaysia); Jumali, N. S.; Shaameri, Z.; Hamzah, A. S. [Organic Synthesis Research Laboratory, Institute of Science, Universiti Teknologi MARA, 40450 Shah Alam (Malaysia); Rusop, M. [NANO-SciTech Center (NST), Institute of Science, Universiti Teknologi MARA, 40450 Shah Alam (Malaysia); NANO- ElecTronic Centre (NET), Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam (Malaysia)

2011-05-25T23:59:59.000Z

322

Chemically Deposited Zinc Selenide Thin Films  

Science Conference Proceedings (OSTI)

Phase Change Materials for Enhancing Heat Transfer in Thermal Energy Storage for Concentrating Solar Power (CSP) · Phase Field Simulation of ...

323

Tungsten oxide ( WO 3 ) thin films for application in advanced energy systems  

Science Conference Proceedings (OSTI)

Inherent processes in coal gasification plants produce hazardous hydrogen sulfide ( H 2 S ) which must be continuously and efficiently detected and removed before the fuel is used for power generation. An attempt has been made in this work to fabricate tungsten oxide ( WO 3 ) thin films by radio-frequency reactive magnetron-sputter deposition. The impetus being the use of WO 3 films for H 2 S sensors in coal gasification plants. The effect of growth temperature

S. K. Gullapalli; R. S. Vemuri; F. S. Manciu; J. L. Enriquez; C. V. Ramana

2010-01-01T23:59:59.000Z

324

Annealing effect on the giant magnetoresistance of La-Ca-Mn-O thin films  

SciTech Connect

Thin films of perovskite-like (La,Ca)MnO{sub {delta}} with (001) orientation were grown epitaxially on (100) MgO substrates by a simple facing-target sputtering technique. The as-deposited films already possess a significant low field giant magnetoresistance. Further post-annealing experiments on these samples indicate that the high electrical resistivity is not a prerequisite of the giant magnetoresistance effect.

Zeng, X.T.; Wong, H.K. [Chinese Univ. of Hong Kong, Chatin (Hong Kong). Physics Dept.

1995-11-01T23:59:59.000Z

325

Thin-film rechargeable lithium batteries  

SciTech Connect

Rechargeable thin-films batteries with lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have been fabricated and characterized. The cathodes include TiS{sub 2}, the {omega} phase of V{sub 2}O{sub 5}, and the cubic spinel Li{sub x}Mn{sub 2}O{sub 4} with open circuit voltages at full charge of about 2.5 V, 3.7 V, and 4.2 V, respectively. The development of these robust cells, which can be cycled thousands of times, was possible because of the stability of the amorphous lithium electrolyte, lithium phosphorus oxynitride. This material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46} and a conductivity at 25 C of 2 {mu}S/cm. Thin-film cells have been cycled at 100% depth of discharge using current densities of 2 to 100 {mu}A/cm{sup 2}. The polarization resistance of the cells is due to the slow insertion rate of Li{sup +} ions into the cathode. Chemical diffusion coefficients for Li{sup +} ions in the three types of cathodes have been estimated from the analysis of ac impedance measurements.

Bates, J.B.; Gruzalski, G.R.; Dudney, N.J.; Luck, C.F.; Yu, X.

1993-11-01T23:59:59.000Z

326

Rechargeable thin-film lithium batteries  

Science Conference Proceedings (OSTI)

Rechargeable thin-film batteries consisting of lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have been fabricated and characterized. These include Li-TiS{sub 2}, Li-V{sub 2}O{sub 5}, and Li-Li{sub x}Mn{sub 2}O{sub 4} cells with open circuit voltages at full charge of about 2.5 V, 3.7 V, and 4.2 V, respectively. The realization of these robust cells, which can be cycled thousands of times, was possible because of the stability of the amorphous lithium electrolyte, lithium phosphorus oxynitride. This material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46}and a conductivity at 25 C of 2 {mu}S/cm. The thin-film cells have been cycled at 100% depth of discharge using current densities of 5 to 100 {mu}A/cm{sup 2}. Over most of the charge-discharge range, the internal resistance appears to be dominated by the cathode, and the major source of the resistance is the diffusion of Li{sup +} ions from the electrolyte into the cathode. Chemical diffusion coefficients were determined from ac impedance measurements.

Bates, J.B.; Gruzalski, G.R.; Dudney, N.J.; Luck, C.F.; Yu, X.

1993-09-01T23:59:59.000Z

327

Spin hall effect in paramagnetic thin films  

E-Print Network (OSTI)

Spintronics, an abbreviation of spin based electronics and also known as magneto electronics, has attracted a lot of interest in recent years. It aims to explore the role of electrons’ spins in building next generation electric devices. Using electrons’ spins rather than electrons’ charges may allow faster, lower energy cost devices. Spin Hall Effect is an important subfield of spintronics. It studies spin current, spin transport, and spin accumulation in paramagnetic systems. It can further understanding of quantum physics, device physics, and may also provide insights for spin injection, spin detection and spin manipulation in the design of the next generation spintronics devices. In this experimental work, two sets of experiments were prepared to detect the Spin Hall Effect in metallic systems. The first set of experiments aims to extract Spin Hall Effect from Double Hall Effect in micrometer size metal thin film patterns. Our experiments proved that the Spin Hall Effect signal was much smaller than the theoretically calculated value due to higher electrical resistivity in evaporated thin films. The second set of experiments employs a multi-step process. It combines micro fabrication and electrochemical method to fabricate a perpendicular ferromagnet rod as a spin injector. Process description and various techniques to improve the measurement sensitivity are presented. Measurement results in aluminum, gold and copper are presented in Chapters III, IV and V. Some new experiments are suggested in Chapters V and VI.

Xu, Huachun

2008-12-01T23:59:59.000Z

328

Thin-film Rechargeable Lithium Batteries  

DOE R&D Accomplishments (OSTI)

Rechargeable thin films batteries with lithium metal anodes, an amorphous inorganic electrolyte, and cathodes of lithium intercalation compounds have been fabricated and characterized. The cathodes include TiS{sub 2}, the {omega} phase of V{sub 2}O{sub 5}, and the cubic spinel Li{sub x}Mn{sub 2}O{sub 4} with open circuit voltages at full charge of about 2.5 V, 3.7 V, and 4.2 V, respectively. The development of these robust cells, which can be cycled thousands of times, was possible because of the stability of the amorphous lithium electrolyte, lithium phosphorus oxynitride. This material has a typical composition of Li{sub 2.9}PO{sub 3.3}N{sub 0.46} and a conductivity at 25 C of 2 {mu}S/cm. Thin film cells have been cycled at 100% depth of discharge using current densities of 2 to 100 {mu}A/cm{sup 2}. The polarization resistance of the cells is due to the slow insertion rate of Li{sup +} ions into the cathode. Chemical diffusion coefficients for Li{sup +} ions in the three types of cathodes have been estimated from the analysis of ac impedance measurements.

Bates, J. B.; Gruzalski, G. R.; Dudney, N. J.; Luck, C. F.; Yu, X.

1993-11-00T23:59:59.000Z

329

Incorporation of sulfur, chlorine, and carbon into electroplated Cu thin films  

Science Conference Proceedings (OSTI)

The microstructure of electroplated Cu thin films and the contamination with incorporated additives were investigated in dependence on the galvanostatic deposition parameters and thermal treatment. Sulfur, chlorine, and carbon were analysed as impurities ... Keywords: 61.72.Ss, 66.30.Jt, 68.35.Dv, 68.43.Mn, 81.15.Pq, 82.45.Vp, 85.40.Ls, Additive incorporation, Additive surface adsorption, Copper, Electrochemical deposition, Impurities

M. Stangl; J. Acker; S. Oswald; M. Uhlemann; T. Gemming; S. Baunack; K. Wetzig

2007-01-01T23:59:59.000Z

330

A survey of thin-film solar photovoltaic industry & technologies  

E-Print Network (OSTI)

A new type of solar cell technology using so-called thin-film solar photovoltaic material has the potential to make a great impact on our lives. Because it uses very little or no silicon at all, thin- film (TF) solar ...

Grama, Sorin

2007-01-01T23:59:59.000Z

331

Thermal Sensor Arrays for The Combinatorial Analysis of Thin Films  

E-Print Network (OSTI)

Thermal Sensor Arrays for The Combinatorial Analysis of Thin Films A dissertation presented Advisor Author Joost J. Vlassak Patrick J. McCluskey Thermal Sensor Arrays for The Combinatorial Analysis analysis of the thermophysical properties of thin films. The continuous growth of integrated circuits

332

Amorphous hafnium-indium-zinc oxide semiconductor thin film transistors  

Science Conference Proceedings (OSTI)

We reported on the performance and electrical properties of co-sputtering-processed amorphous hafnium-indium-zinc oxide (?-HfIZO) thin film transistors (TFTs). Co-sputtering-processed ?-HfIZO thin films have shown an amorphous phase in nature. ...

Sheng-Po Chang; San-Syong Shih

2012-01-01T23:59:59.000Z

333

Organic thin film transistors with double insulator layers  

Science Conference Proceedings (OSTI)

We have investigated a double-layer structured gate dielectric for the organic thin films transistor (OTFT) with the purpose of improving the performance of the SiO"2 gate insulator. A 50nm PMMA layer was coated on top of the SiO"2 gate insulator as ... Keywords: Mobility, On/off ratio, Organic thin film transistor, PMMA

X. Liu; Y. Bai; L. Chen; F. X. Wei; X. B. Zhang; X. Y. Jiang; Zh. L. Zhang

2007-08-01T23:59:59.000Z

334

Ultrafast thin-film laser-induced breakdown spectroscopy of doped...  

NLE Websites -- All DOE Office Websites (Extended Search)

Ultrafast thin-film laser-induced breakdown spectroscopy of doped oxides Title Ultrafast thin-film laser-induced breakdown spectroscopy of doped oxides Publication Type Journal...

335

Novel ways of depositing ZnTe films by a solution growth technique  

DOE Green Energy (OSTI)

An electrochemical process has been successfully developed for the reproducible deposition of ZnTe and copper-doped ZnTe films suitable as transparent ohmic contacts for CdS/CdTe solar cells. The development of this method and optimization of key processing steps in the fabrication of CdS/CdTe/ZnTe:Cu devices has allowed IEC to achieve cell performance results of FF>70% and {eta} {approximately}10%. Preliminary efforts have indicated that the deposition methods investigated are potentially feasible for the formation of other II-VI compounds for use in polycrystalline thin film solar devices and should be the focus of future work.

Birkmire, R.W.; McCandless, B.E.; Yokimcus, T.A.; Mondal, A. (Delaware Univ., Newark, DE (United States). Inst. of Energy Conversion)

1992-10-01T23:59:59.000Z

336

Plasma deposited diamond-like carbon films for large neutralarrays  

SciTech Connect

To understand how large systems of neurons communicate, we need to develop methods for growing patterned networks of large numbers of neurons. We have found that diamond-like carbon thin films formed by energetic deposition from a filtered vacuum arc carbon plasma can serve as ''neuron friendly'' substrates for the growth of large neural arrays. Lithographic masks can be used to form patterns of diamond-like carbon, and regions of selective neuronal attachment can form patterned neural arrays. In the work described here, we used glass microscope slides as substrates on which diamond-like carbon was deposited. PC-12 rat neurons were then cultured on the treated substrates and cell growth monitored. Neuron growth showed excellent contrast, with prolific growth on the treated surfaces and very low growth on the untreated surfaces. Here we describe the vacuum arc plasma deposition technique employed, and summarize results demonstrating that the approach can be used to form large patterns of neurons.

Brown, I.G.; Blakely, E.A.; Bjornstad, K.A.; Galvin, J.E.; Monteiro, O.R.; Sangyuenyongpipat, S.

2004-07-15T23:59:59.000Z

337

Real time intelligent process control system for thin film solar cell manufacturing  

DOE Green Energy (OSTI)

All solar cell manufacturing processes today suffer from manufacturing inefficiencies that currently lead to lower product quality and lower conversion efficiency, increased product cost and greater material and energy consumption. This results in slower solar energy adoption and extends the time solar cells will reach grid parity with traditional energy sources. The thin film solar panel manufacturers struggle on a daily basis with the problem of thin film thickness non-uniformity and other parameters variances over the deposited substrates, which significantly degrade their manufacturing yield and quality. Optical monitoring of the thin films during the process of the film deposition is widely perceived as a necessary step towards resolving the non-uniformity and non-homogeneity problem. In order to enable the development of an optical control system for solar cell manufacturing, a new type of low cost optical sensor is needed, able to acquire local information about the panel under deposition and measure its local characteristics, including the light scattering in very close proximity to the surface of the film. This information cannot be obtained by monitoring from outside the deposition chamber (as traditional monitoring systems do) due to the significant signal attenuation and loss of its scattering component before the reflected beam reaches the detector. In addition, it would be too costly to install traditional external in-situ monitoring systems to perform any real-time monitoring over large solar panels, since it would require significant equipment refurbishing needed for installation of multiple separate ellipsometric systems, and development of customized software to control all of them simultaneously. The proposed optical monitoring system comprises AccuStrata’s fiber optics sensors installed inside the thin film deposition equipment, a hardware module of different components (beyond the scope of this project) and our software program with iterative predicting capability able to control material bandgap and surface roughness as films are deposited. Our miniature fiber optics monitoring sensors are installed inside the vacuum chamber compartments in very close proximity where the independent layers are deposited (an option patented by us in 2003). The optical monitoring system measures two of the most important parameters of the photovoltaic thin films during deposition on a moving solar panel - material bandgap and surface roughness. In this program each sensor array consists of two fiber optics sensors monitoring two independent areas of the panel under deposition. Based on the monitored parameters and their change in time and from position to position on the panel, the system is able to provide to the equipment operator immediate information about the thin films as they are deposited. This DoE Supply Chain program is considered the first step towards the development of intelligent optical control system capable of dynamically adjusting the manufacturing process “on-the-fly” in order to achieve better performance. The proposed system will improve the thin film solar cell manufacturing by improving the quality of the individual solar cells and will allow for the manufacturing of more consistent and uniform products resulting in higher solar conversion efficiency and manufacturing yield. It will have a significant impact on the multibillion-dollar thin film solar market. We estimate that the financial impact of these improvements if adopted by only 10% of the industry ($7.7 Billion) would result in about $1.5 Billion in savings by 2015 (at the assumed 20% improvement). This can b

George Atanasoff

2010-10-29T23:59:59.000Z

338

Real time intelligent process control system for thin film solar cell manufacturing  

SciTech Connect

This project addresses the problem of lower solar conversion efficiency and waste in the typical solar cell manufacturing process. The work from the proposed development will lead toward developing a system which should be able to increase solar panel conversion efficiency by an additional 12-15% resulting in lower cost panels, increased solar technology adoption, reduced carbon emissions and reduced dependency on foreign oil. All solar cell manufacturing processes today suffer from manufacturing inefficiencies that currently lead to lower product quality and lower conversion efficiency, increased product cost and greater material and energy consumption. This results in slower solar energy adoption and extends the time solar cells will reach grid parity with traditional energy sources. The thin film solar panel manufacturers struggle on a daily basis with the problem of thin film thickness non-uniformity and other parameters variances over the deposited substrates, which significantly degrade their manufacturing yield and quality. Optical monitoring of the thin films during the process of the film deposition is widely perceived as a necessary step towards resolving the non-uniformity and non-homogeneity problem. In order to enable the development of an optical control system for solar cell manufacturing, a new type of low cost optical sensor is needed, able to acquire local information about the panel under deposition and measure its local characteristics, including the light scattering in very close proximity to the surface of the film. This information cannot be obtained by monitoring from outside the deposition chamber (as traditional monitoring systems do) due to the significant signal attenuation and loss of its scattering component before the reflected beam reaches the detector. In addition, it would be too costly to install traditional external in-situ monitoring systems to perform any real-time monitoring over large solar panels, since it would require significant equipment refurbishing needed for installation of multiple separate ellipsometric systems, and development of customized software to control all of them simultaneously. The proposed optical monitoring system comprises AccuStrata’s fiber optics sensors installed inside the thin film deposition equipment, a hardware module of different components (beyond the scope of this project) and our software program with iterative predicting capability able to control material bandgap and surface roughness as films are deposited. Our miniature fiber optics monitoring sensors are installed inside the vacuum chamber compartments in very close proximity where the independent layers are deposited (an option patented by us in 2003). The optical monitoring system measures two of the most important parameters of the photovoltaic thin films during deposition on a moving solar panel - material bandgap and surface roughness. In this program each sensor array consists of two fiber optics sensors monitoring two independent areas of the panel under deposition. Based on the monitored parameters and their change in time and from position to position on the panel, the system is able to provide to the equipment operator immediate information about the thin films as they are deposited. This DoE Supply Chain program is considered the first step towards the development of intelligent optical control system capable of dynamically adjusting the manufacturing process “on-the-fly” in order to achieve better performance. The proposed system will improve the thin film solar cell manufacturing by improving the quality of the individual solar cells and will allow for the manufacturing of more consistent and uniform products resulting in higher solar conversion efficiency and manufacturing yield. It will have a significant impact on the multibillion-dollar thin film solar market. We estimate that the financial impact of these improvements if adopted by only 10% of the industry ($7.7 Billion) would result in about $1.5 Billion in savings by 2015 (at the assumed 20% improvement). This can b

George Atanasoff

2010-10-29T23:59:59.000Z

339

Fabrication and characterization of lithium manganese nickel oxide sputtered thin film cathodes for lithium-ion batteries  

SciTech Connect

Li-rich and stoichiometric Li1Mn1.5Ni0.5O4 (LMNO) cathode films have been prepared by magnetron sputtering. Sputtering from a Li stoichiometric target yields Li-rich films composed of spinel, layered and monoclinic phases. Films obtained from a Li deficient target are mostly made of a spinel phase and little layered material. The resulting cathode thin films have good capacity retention and very high rate capability. The reaction mechanism has been investigated by XRD and HRTEM and evidences the reversible formation of a spinel phase, as is also found for the powder samples. The film geometry enables to understand the effect of coatings (ZnO or LiPON). Coating high voltage cathodes reduces the coulombic losses but at the price of rate performance. Nonetheless, these coated sputtered electrode thin films offer a higher rate capability than other LMNO thin films obtained by other physical vapor deposition techniques.

Baggetto, Loic [ORNL; Unocic, Raymond R [ORNL; Dudney, Nancy J [ORNL; Veith, Gabriel M [ORNL

2012-01-01T23:59:59.000Z

340

Investigations of CuInSe sub 2 thin films and contacts  

DOE Green Energy (OSTI)

This report describes research into electrical contacts for copper indium diselenide (CuInSe{sub 2}) polycrystalline thin films used for solar cell applications. Molybdenum contacts have historically been the most promising for heterojunction solar cells. This program studied contact stability by investigating thermally induced bilayer reactions between molybdenum and copper, indium, and selenium. Because selenization is widely used to fabricate CuInSe{sub 2} thin films for photovoltaic cells, a second part of the program investigated how the morphologies, phases, and reactions of pre-selenization Cu-In structures are affected by the deposition process and heat treatments. 7 refs., 6 figs.

Nicolet, M.A. (California Inst. of Tech., Pasadena, CA (United States))

1991-10-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
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341

Process for obtaining multiple sheet resistances for thin film hybrid microcircuit resistors  

DOE Patents (OSTI)

A standard thin film circuit containing Ta.sub.2 N (100 ohms/square) resirs is fabricated by depositing on a dielectric substrate successive layers of Ta.sub.2 N, Ti and Pd, with a gold layer to provide conductors. The addition of a few simple photoprocessing steps to the standeard TFN manufacturing process enables the formation of Ta.sub.2 N+Ti (10 ohms/square) and Ta.sub.2 N+Ti+Pd (1 ohm/square) resistors in the same otherwise standard thin film circuit structure.

Norwood, David P. (Albuquerque, NM)

1989-01-01T23:59:59.000Z

342

Cu-Ga-Se Thin Films Prepared by a Combination of Electrodeposition and Evaporation Techniques  

Science Conference Proceedings (OSTI)

Cu-Ga-Se thin films were prepared using a combination of electrodeposition and evaporation techniques. A Cu-Se/Mo/glass precursor thin film was first prepared by galvanostatic electrodeposition. On top of this film three different thicknesses of Ga were deposited by evaporation. The Cu-Ga-Se thin films were formed by annealing the Ga/Cu-Se/Mo/glass thin film configuration in a tubular chamber with Se powder, at different temperatures. Thin films were characterized by X-ray diffraction (XRD), photocurrent spectroscopy (PS), inductively coupled plasma (ICP) analysis, and scanning electron microscopy (SEM). The detailed analysis from X-ray reveals that after annealing at 550 C the CuGaSe{sub 2} phase is formed when the thickness of Ga is 0.25 {mu}m, however at 0.5 {mu}m and 1.0 {mu}m Ga the formation of CuGa{sub 3}Se{sub 5} and CuGa{sub 5}Se{sub 8} phases is observed respectively. Band gap values were obtained using photocurrent spectroscopy.

Fernandez, A. M.; Turner, J. A.

2012-04-01T23:59:59.000Z

343

Flexible Ultra Moisture Barrier Film for Thin-Film Photovoltaic Applications  

Science Conference Proceedings (OSTI)

Flexible Thin-film photovoltaic (TFPV) is a low cost alternative to incumbent c-Si PV products as it requires less volume of costly semiconductor materials and it can potentially reduce installation cost. Among the TFPV options, copper indium gallium diselenide (CIGS) has the highest efficiency and is believed to be one of the most attractive candidates to achieve PV cost reduction. However, CIGS cells are very moisture sensitive and require module water vapor transmission rate (WVTR) of less than 1x10-4 gram of water per square meter per day (g-H2O/m2/day). Successful development and commercialization of flexible transparent ultra moisture barrier film is the key to enable flexible CIGS TFPV products, and thus enable ultimate PV cost reduction. At DuPont, we have demonstrated at lab scale that we can successfully make polymer-based flexible transparent ultra moisture barrier film by depositing alumina on polymer films using atomic layer deposition (ALD) technology. The layer by layer ALD approach results in uniform and amorphous structure which effectively reduces pinhole density of the inorganic coating on the polymer, and thus allow the fabrication of flexible barrier film with WVTR of 10-5 g-H2O/m2/day. Currently ALD is a time-consuming process suitable only for high-value, relatively small substrates. To successfully commercialize the ALD-on-plastic technology for the PV industry, there is the need to scale up this technology and improve throughput. The goal of this contract work was to build a prototype demonstrating that the ALD technology could be scaled-up for commercial use. Unfortunately, the prototype failed to produce an ultra-barrier film by the close of the project.

David M. Dean

2012-10-30T23:59:59.000Z

344

Methods of making copper selenium precursor compositions with a targeted copper selenide content and precursor compositions and thin films resulting therefrom  

DOE Patents (OSTI)

Precursor compositions containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semi-conductor applications. Methods of forming the precursor compositions using primary amine solvents and methods of forming the thin films wherein the selection of temperature and duration of heating controls the formation of a targeted species of copper selenide.

Curtis, Calvin J. (Lakewood, CO); Miedaner, Alexander (Boulder, CO); van Hest, Marinus Franciscus Antonius Maria (Lakewood, CO); Ginley, David S. (Evergreen, CO); Leisch, Jennifer (Denver, CO); Taylor, Matthew (West Simsbury, CT); Stanbery, Billy J. (Austin, TX)

2011-09-20T23:59:59.000Z

345

Electrical and optical properties of sputtered amorphous vanadium oxide thin films  

Science Conference Proceedings (OSTI)

Amorphous vanadium oxide (VO{sub x}) is a component found in composite nanocrystalline VO{sub x} thin films. These types of composite films are used as thermistors in pulsed biased uncooled infrared imaging devices when containing face centered cubic vanadium monoxide phase crystallites, and substantial fractions of amorphous material in the composite are necessary to optimize device electrical properties. Similarly, optoelectronic devices exploiting the metal-to-semiconductor transition contain the room-temperature monoclinic or high-temperature (>68 deg. C) rutile vanadium dioxide phase. Thin films of VO{sub x} exhibiting the metal-to-semiconductor transition are typically polycrystalline or nanocrystalline, implying that significant amounts of disordered, amorphous material is present at grain boundaries or surrounding the crystallites and can impact the overall optical or electronic properties of the film. The performance of thin film material for either application depends on both the nature of the crystalline and amorphous components, and in this work we seek to isolate and study amorphous VO{sub x}. VO{sub x} thin films were deposited by pulsed dc reactive magnetron sputtering to produce amorphous materials with oxygen contents {>=}2, which were characterized electrically by temperature dependent current-voltage measurements and optically characterized by spectroscopic ellipsometry. Film resistivity, thermal activation energy, and complex dielectric function spectra from 0.75 to 6.0 eV were used to identify the impact of microstructural variations including composition and density.

Podraza, N. J. [Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States); Gauntt, B. D. [Materials Characterization Department, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Motyka, M. A.; Horn, M. W. [Department of Engineering Science and Mechanics, Pennsylvania State University, University Park, Pennsylvania 16802 (United States); Dickey, E. C. [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)

2012-04-01T23:59:59.000Z

346

Characterization of lithium phosphorous oxynitride thin films  

DOE Green Energy (OSTI)

Electrical and electrochemical properties of an amorphous thin-film lithium electrolyte, lithium phosphorous oxynitride (Lipon), have been studied with emphasis on the stability window vs Li metal and the behavior of the Li/Lipon interface. Ion conductivity of Lipon exhibits Arrhenius behavior at {minus}26 to +140 C, with a conductivity of 1.7 {times} 10{sup {minus}6}S/cm at 25 C and an activity energy of 0.50 {plus_minus} 0.01 eV. A stability window of 5.5 V was observed with respect to a Li{sup +}/Li reference, and no detectable reaction or degradation was evident at the Li/Lipon interface upon lithium cycling.

Yu, Xiaohua; Bates, J.B.; Jellison, G.E. Jr.

1996-01-01T23:59:59.000Z

347

Titanium nitride thin films for minimizing multipactoring  

DOE Patents (OSTI)

Applying a thin film coating to the surface of a workpiece, in particular, applying a coating of titanium nitride to a klystron window by means of a crossed-field diode sputtering array. The array is comprised of a cohesive group of numerous small hollow electrically conducting cylinders and is mounted so that the open ends of the cylinders on one side of the group are adjacent a titanium cathode plate. The workpiece is mounted so as to face the open ends of the other side of the group. A magnetic field is applied to the array so as to be coaxial with the cylinders and a potential is applied across the cylinders and the cathode plate, the cylinders as an anode being positive with respect to the cathode plate. The cylinders, the cathode plate and the workpiece are situated in an atmosphere of nitrogen which becomes ionized such as by field emission because of the electric field between the cylinders and cathode plate, thereby establishing an anode-cathode discharge that results in sputtering of the titanium plate. The sputtered titanium coats the workpiece and chemically combines with the nitrogen to form a titanium nitride coating on the workpiece. Gas pressure, gas mixtures, cathode material composition, voltages applied to the cathode and anode, the magnetic field, cathode, anode and workpiece spacing, and the aspect ratio (ratio of length to inner diameter) of the anode cylinders, all may be controlled to provide consistent optimum thin film coatings of various compositions and thicknesses. Another facet of the disclosure is the coating of microwave components per se with titanium nitride to reduce multipactoring under operating conditions of the components.

Welch, Kimo M. (Mountain View, CA)

1979-01-01T23:59:59.000Z

348

Tilting of carbon encapsulated metallic nanocolumns in carbon-nickel nanocomposite films by ion beam assisted deposition  

Science Conference Proceedings (OSTI)

The influence of assisting low-energy ({approx}50-100 eV) ion irradiation effects on the morphology of C:Ni ({approx}15 at. %) nanocomposite films during ion beam assisted deposition (IBAD) is investigated. It is shown that IBAD promotes the columnar growth of carbon encapsulated metallic nanoparticles. The momentum transfer from assisting ions results in tilting of the columns in relation to the growing film surface. Complex secondary structures are obtained, in which a significant part of the columns grows under local epitaxy via the junction of sequentially deposited thin film fractions. The influence of such anisotropic film morphology on the optical properties is highlighted.

Krause, Matthias [Helmholtz-Zentrum Dresden-Rossendorf, PF-510119, 01314 Dresden (Germany); Technische Universitaet Dresden, D-01062 Dresden (Germany); Muecklich, Arndt; Zschornak, Matthias; Wintz, Sebastian; Gemming, Sibylle; Abrasonis, Gintautas [Helmholtz-Zentrum Dresden-Rossendorf, PF-510119, 01314 Dresden (Germany); Oates, Thomas W. H. [Leibniz-Institut fuer Analytische Wissenschaft, ISAS e.V., Albert-Einstein-Str. 9, 12489 Berlin (Germany); Luis Endrino, Jose [Surfaces and Coatings Department, Instituto de Ciencia de Materiales de Madrid, c/Sor Juana Ines de la Cruz 3, Cantoblanco, 28049 Madrid (Spain); Baehtz, Carsten; Shalimov, Artem [Helmholtz-Zentrum Dresden-Rossendorf, PF-510119, 01314 Dresden (Germany); Rossendorf Beamline, European Synchrotron Radiation Facility, F-38043 Grenoble (France)

2012-07-30T23:59:59.000Z

349

High-efficiency thin-film cadmium telluride photovoltaic cells. Annual technical report, January 20, 1996--January 19, 1997  

DOE Green Energy (OSTI)

The University of Toledo photovoltaics group has been instrumental in developing rf sputtering for CDs/CdTe thin-film solar cells. During the third phase of the present contract our work focussed on efforts to determine factors which limit the efficiency in our {open_quotes}all-sputtered{close_quotes} thin-film CdTe solar cells on soda-lime glass. We find that our all-sputtered cells, which are deposited at substantially lower temperature than those by sublimation or vapor deposition, require less aggressive CdCl{sub 2} treatments than do other deposition techniques and this is presumably related to CDs/CdTe interdiffusion. The CDs/CdTe interdiffusion process has been studied by several methods, including photoluminescence and capacitance-voltage measurements. Furthermore, we have deposited special thin bilayer films on quartz and borosilicate glass. Interdiffusion in these thin bilayers have been probed by Rutherford backscattering, with collaborators at Case Western Reserve University, and grazing incidence x-ray scattering (GIXS), with collaborators at the University at Buffalo and Brookhaven National Lab. Also, in order better to understand the properties of the ternary alloy material, we used laser physical vapor deposition to prepare a series of CdS{sub x}Te{sub 1-x} films on borosilicate glass. The composition of the alloy films was determined by wavelength dispersive x-ray spectroscopy at NREL. These films are currently being investigated by us and other groups at NREL and IEC.

Compaan, A.D.; Bohn, R.G.; Contreras-Puente, G. [Univ. of Toledo, OH (United States)

1997-08-01T23:59:59.000Z

350

Process for obtaining multiple sheet resistances for thin film hybrid microcircuit resistors  

DOE Patents (OSTI)

A standard thin film circuit containing Ta/sub 2/N (100 ohms/square) resistors is fabricated by depositing on a dielectric substrate successive layers of Ta/sub 2/N, Ti and Pd, with a gold layer to provide conductors. The addition of a few simple photoprocessing steps to the standard TFN (thin film network) manufacturing process enables the formation of Ta/sub 2/N + Ti (10 ohms/square) and Ta/sub 2/N + Ti + Pd (1 ohm/square) resistors in the same otherwise standard thin film circuit structure. All three types of resistors are temperature-stable and laser-trimmable for precise definition of resistance values.

Norwood, D.P.

1986-08-07T23:59:59.000Z

351

Thin Film Solar Cells with Light Trapping Transparent Conducting Oxide Layer  

E-Print Network (OSTI)

Thin film solar cells, if film thickness is thinner than the optical absorption length, typically give lower cell performance. For the thinner structure, electric current loss due to light penetration can offset the electric current gain obtained from higher built-in electric field. Light trapping schemes can increase the effective optical absorption length and thus enhance the electric current for thinner solar cells. Here a new light trapping scheme based on light trapping transparent conducting oxide layer (LT-TCO) is proposed to enhance the performance of thin film solar cells. Three different configurations of integrating the LT-TCO layer in solar cells are proposed and evaluated. This research aims to develop the LT-TCO layer with surface texture and good conductivity by pulsed laser deposition (PLD) technique at low temperature. The LT-TCO layer is fabricated by PLD deposition of Al-doped ZnO to achieve multilayer films by tuning of oxygen pressure. The light trapping effect is examined by optical transmittance measurement and the surface texture is characterized by transmission electron microscopy (TEM) technique. The conductivity of LT-TCO layer is measured by resistivity measurement. Thin film CdTe/CdS solar cells are fabricated by PLD technique to develop baseline solar cells for integration of LT-TCO layer. The as-deposited thin film solar cells show relatively low performance and are further processed with various post-deposition treatments to seek efficiency enhancement. The effects of different processes on cell performance are examined by electrical, optical, and microstructure studies. Air annealing of CdS layer and CdCl2 treatment of CdTe layer combined are found to yield the best cell performance. The fabrication issues that limit the cell performance are discussed and future optimizations in fabrication processes are suggested.

Lu, Tianlin

2011-05-01T23:59:59.000Z

352

Method for making surfactant-templated thin films  

DOE Patents (OSTI)

An evaporation-induced self-assembly method to prepare a porous, surfactant-templated, thin film by mixing a silica sol, a solvent, a surfactant, and an interstitial compound, evaporating a portion of the solvent to form a liquid, crystalline thin film mesophase material, and then removal of the surfactant template. Coating onto a substrate produces a thin film with the interstitial compound either covalently bonded to the internal surfaces of the ordered or disordered mesostructure framework or physically entrapped within the ordered or disordered mesostructured framework. Particles can be formed by aerosol processing or spray drying rather than coating onto a substrate. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.

Brinker, C. Jeffrey (Albuquerque, NM); Lu, Yunfeng (New Orleans, LA); Fan, Hong You (Albuquerque, NM)

2010-08-31T23:59:59.000Z

353

Method for making surfactant-templated thin films  

DOE Patents (OSTI)

An evaporation-induced self-assembly method to prepare a porous, surfactant-templated, thin film by mixing a silica sol, a solvent, a surfactant, and an interstitial compound, evaporating a portion of the solvent to form a liquid, crystalline thin film mesophase material, and then removal of the surfactant template. Coating onto a substrate produces a thin film with the interstitial compound either covalently bonded to the internal surfaces of the ordered or disordered mesostructure framework or physically entrapped within the ordered or disordered mesostructured framework. Particles can be formed by aerosol processing or spray drying rather than coating onto a substrate. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.

Brinker, C. Jeffrey (Albuquerque, NM); Lu, Yunfeng (San Jose, CA); Fan, Hongyou (Albuquerque, NM)

2002-01-01T23:59:59.000Z

354

Liquid-Phase Deposition of CIS Thin Layers: Final Report, February 2003--July 2005  

DOE Green Energy (OSTI)

The goal of this project was to fabricate single-phase CIS (a-Cu-In-Se, stoichiometric composition: CuInSe2) thin films for photovoltaic applications from a liquid phase - a Cu-In-Se melt of appropriate composition. This approach of liquid-phase deposition (LPD) is based on the new phase diagram we have established for Cu-In-Se, the first complete equilibrium phase diagram of this system. The liquidus projection exhibits four composition fields in which the primary solid phase, i.e., the first solid material that forms on cooling down from an entirely liquid state, is a-CuInSe2. Remarkably, none of the four composition fields is anywhere near the stoichiometric composition (CuInSe2) of a-CuInSe2. The results demonstrate that the proposed technique is indeed capable of producing films with a particularly large grain size and a correspondingly low density of grain boundaries. To obtain films sufficiently thin for solar cell applications and with a sufficiently smooth surface, it is advantageous to employ a sliding boat mechanism. Future work on liquid-phase deposition of CIS should focus on the interaction between the melt and the substrate surface, the resulting CIS interfaces, the surface morphology of the LPD-grown films, and, of course, the electronic properties of the material.

Ernst, F.; Pirouz, P.

2006-02-01T23:59:59.000Z

355

Origin of stress in radio frequency magnetron sputtered zinc oxide thin films  

SciTech Connect

Highly c-axis oriented ZnO thin films have been deposited on silicon substrates by planar rf magnetron sputtering under varying pressure (10-50 mTorr) and oxygen percentage (50-100%) in the reactive gas (Ar + O{sub 2}) mixture. The as-grown films were found to be stressed over a wide range from -1 x 10{sup 11} to -2 x 10{sup 8} dyne/cm{sup 2} that in turn depends strongly on the processing conditions, and the film becomes stress free at a unique combination of sputtering pressure and reactive gas composition. Raman spectroscopy and photoluminescence (PL) analyses identified the origin of stress as lattice distortion due to defects introduced in the ZnO thin film. FTIR study reveals that Zn-O bond becomes stronger with the increase in oxygen fraction in the reactive gas mixture. The lattice distortion or stress depends on the type of defects introduced during deposition. PL spectra show the formation of a shoulder in band emission with an increase in the processing pressure and are related to the presence of stress. The ratio of band emission to defect emission decreases with the increase in oxygen percentage from 50 to 100%. The studies show a correlation of stress with the structural, vibrational, and photoluminescence properties of the ZnO thin film. The systematic study of the stress will help in the fabrication of efficient devices based on ZnO film.

Menon, Rashmi; Gupta, Vinay; Sreenivas, K. [Electronic Material and Devices Laboratory, Department of Physics and Astrophysics, University of Delhi, Delhi 11007 (India); Tan, H. H.; Jagadish, C. [Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200 (Australia)

2011-03-15T23:59:59.000Z

356

The state of the art of thin-film photovoltaics  

DOE Green Energy (OSTI)

Thin-film photovoltaic technologies, based on materials such as amorphous or polycrystalline silicon, copper indium diselenide, cadmium telluride, and gallium arsenide, offer the potential for significantly reducing the cost of electricity generated by photovoltaics. The significant progress in the technologies, from the laboratory to the marketplace, is reviewed. The common concerns and questions raised about thin films are addressed. Based on the progress to date and the potential of these technologies, along with continuing investments by the private sector to commercialize the technologies, one can conclude that thin-film PV will provide a competitive alternative for large-scale power generation in the future.

Surek, T.

1993-10-01T23:59:59.000Z

357

Sol-gel preparation of ion-conducting ceramics for use in thin films  

DOE Green Energy (OSTI)

A metal alkoxide sol-gel solution suitable for depositing a thin film of La{sub 0.6}Sr{sub 0.4}CoO{sub 3} on a porous substrate has been developed; such films should be useful in fuel cell electrode and oxygen separation membrane manufacture. Crack-free films have been deposited on both dense and porous substrates by dip-coating and spin-coating techniques followed by a heat treatment in air. Fourier transform infrared spectroscopy was used to determine the chemical structure of metal alkoxide solution system. X-ray diffraction was used to determine crystalline phases formed at various temperatures, while scanning electron microscopy was used to determine physical characteristics of the films. Surface coatings have been successfully applied to porous substrates through the control of the substrate pore size, deposition parameters, and firing parameters. Conditions have been defined for which films can be deposited, and for which the physical and chemical characteristics of the film can be improved. A theoretical discussion of the chemical reactions taking place before and after hydrolysis in the mixed alkoxide solutions is presented, and the conditions necessary for successful synthesis are defined. Applicability of these films as ionic and electronic conductors is discussed.

Steinhauser, M.I.

1992-12-01T23:59:59.000Z

358

Role of indium in highly crystalline ZnO thin films  

Science Conference Proceedings (OSTI)

Zinc oxide and indium doped zinc oxide (ZnO:In) transparent conducting thin films were deposited on glass substrates by pulsed DC magnetron sputtering using separate Zn and In targets. The independent control of the In content in ZnO has helped us to explore the role of indium in influencing the oriented (002) growth, crystallinity, conductivity and mobility of the doped films. The lowest resistivity of ZnO:In thin film is 2.73 Multiplication-Sign 10{sup -3} ohm-cm. At the optimal condition of high (002) orientation, ZnO:In films with electrical resistivity of 7.63 Multiplication-Sign 10{sup -3} ohm.cm and mobility of 126.4 cm{sup 2}/V.s are achieved.

Singh, Anil; Chaudhary, Sujeet; Pandya, Dinesh K. [Thin Film Laboratory, Physics Department, Indian Institute of Technology Delhi, New Delhi 110016 (India)

2013-02-05T23:59:59.000Z

359

Correlation between surface chemistry, density and band gap in nanocrystalline WO3 thin films  

Science Conference Proceedings (OSTI)

Nanocrystalline WO3 thin films were produced by sputter-deposition by varying the ratio of argon to oxygen in the reactive gas mixture during deposition. The surface chemistry, physical characteristics, and optical properties of nanocrystalline WO3 films were evaluated using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray reflectivity (XRR), and spectrophotometric measurements. The effect of ultra-microstructure was significant on the optical properties of WO3 films. The XPS analyses indicate the formation of stoichiometric WO3 with tungsten existing in fully oxidized valence state (W6+). However, WO3 films grown at high oxygen concentration (>60%) in the sputtering gas mixture were over stoichiometric with excess oxygen. XRR simulations, which are based on isotropic WO3 film - SiO2 interface - Si substrate model, indicate that the density of WO3 films is sensitive to the oxygen content in the sputtering gas. The spectral transmission of the films increased with the increasing oxygen. The band gap of these films increases from 2.78 eV to 3.25 eV with increasing oxygen. A direct correlation between the film-density and band gap in nanocrystalline WO3 films is established based on the observed results.

Vemuri, Venkata Rama Ses; Engelhard, Mark H.; Ramana, C.V.

2012-03-01T23:59:59.000Z

360

Transparent conducting impurity-doped ZnO thin films prepared using oxide targets sintered by millimeter-wave heating  

Science Conference Proceedings (OSTI)

The preparation of transparent conducting impurity-doped ZnO thin films by both pulsed laser deposition (PLD) and magnetron sputtering deposition (MSD) using impurity-doped ZnO targets sintered with a newly developed energy saving millimeter-wave (28 GHz) heating technique is described. Al-doped ZnO (AZO) and V-co-doped AZO (AZO:V) targets were prepared by sintering with various impurity contents for 30 min at a temperature of approximately 1250 degree sign C in an air or Ar gas atmosphere using the millimeter-wave heating technique. The resulting resistivity and its thickness dependence obtainable in thin films prepared by PLD using millimeter-wave-sintered AZO targets were comparable to those obtained in thin films prepared by PLD using conventional furnace-sintered AZO targets; a low resistivity on the order of 3x10{sup -4} {Omega} cm was obtained in AZO thin films prepared with an Al content [Al/(Al+Zn) atomic ratio] of 3.2 at. % and a thickness of 100 nm. In addition, the resulting resistivity and its spatial distribution on the substrate surface obtainable in thin films prepared by rf-MSD using a millimeter-wave-sintered AZO target were almost the same as those obtained in thin films prepared by rf-MSD using a conventional powder AZO target. Thin films prepared by PLD using millimeter-wave-sintered AZO:V targets exhibited an improved resistivity stability in a high humidity environment. Thin films deposited with a thickness of approximately 100 nm using an AZO:V target codoped with an Al content of 4 at. % and a V content [V/(V+Zn) atomic ratio] of 0.2 at. % were sufficiently stable when long-term tested in air at 90% relative humidity and 60 degree sign C.

Minami, Tadatsugu; Okada, Kenji; Miyata, Toshihiro; Nomoto, Juni-chi; Hara, Youhei; Abe, Hiroshi [Optoelectronic Device System R and D Center, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa 921-8501 (Japan); Fuji Dempa Kogyo Co. Ltd., 26 Kasuminosato, Ami, Inashiki, Ibaragi 300-0315 (Japan)

2009-07-15T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


361

Properties of vacuum arc deposited amorphous hard carbon films  

Science Conference Proceedings (OSTI)

Amorphous hard carbon films formed by vacuum arc deposition are hydrogen-free, dense, and very hard. The properties of amorphous hard carbon films depend strongly on the energy of the incident ions. A technique which is called Plasma Immersion Ion Implantation can be applied to vacuum arc deposition of amorphous hard carbon films to influence the ion energy. The authors have studied the influence of the ion energy on the elastic modulus determined by an ultrasonic method, and have measured the optical gap for films with the highest sp{sup 3} content they have obtained so far with this deposition technique. The results show an elastic modulus close to that of diamond, and an optical gap of 2.1 eV which is much greater than for amorphous hard carbon films deposited by other techniques.

Anders, S.; Anders, A.; Raoux, S. [Lawrence Berkeley Lab., CA (United States)] [and others

1995-04-01T23:59:59.000Z

362

Young's modulus, Poisson's ratio, and residual stress and strain in (111)-oriented scandium nitride thin films on silicon  

E-Print Network (OSTI)

cyclotron resonance MBE which typically generate N2 + species with high kinetic energies. The causes of compressive stress in this case may instead be related to a trend commonly observed in vapor-deposited thin films. Such films typically experience... with the strain information hich is found to be 270±25 GPa. Residual m growth temperature and film thickness#2; d by the differential thermal contraction ic compressive stresses generated during .1063/1.2217106#5; Accurate determination of residual stresses...

Moram, M A; Barber, Z H; Humphreys, C J; Joyce, T B; Chalker, P R

2006-07-21T23:59:59.000Z

363

Microstructure and Magnetic Properties of PrMnO{sub 3} Bulk and Thin Film  

Science Conference Proceedings (OSTI)

Perovskite PrMnO{sub 3}(PMO) had been prepared in bulk by solid state reaction and thin films on corning glass, fused silica and MgO (100) glass substrate by pulsed laser deposition technique. SEM micrographs show that grains with size 2{approx}3 {mu}m is observed in bulk PMO while thin films PMO show strongly connected grain structure with particle size that not larger than 100 nm. X-ray diffraction analysis shows that all samples are in single phase with orthorhombic crystal structure. Bulk PMO sample had lattice strain of 0.134% which is the lowest value among others. However, larger lattice strain was observed in thin film samples due to lattice mismatch between film-substrate and caused the MnO{sub 6} to deform. All samples shown paramagnetic or antiferromagnetic behavior, enhancement in magnetization value occurred for all PMO grew as film. We believe that larger lattice strain favor the grain growth of PMO towards more order phase. In summary, formation of structure and microstructure of thin film PMO depends on type of substrate used and it affect the magnetic property.

Lim, K. P.; Halim, S. A.; Chen, S. K.; Ng, S. W.; Wong, J. K.; Gan, H. M. Albert [Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor (Malaysia); Woon, H. S. [College of Engineering, Universiti Tenaga Nasional, Jalan IKRAM-UNITEN, 43000 Kajang, Selangor (Malaysia)

2011-03-30T23:59:59.000Z

364

Strain Relaxation and Vacancy Creation in Thin Platinum Films  

Science Conference Proceedings (OSTI)

Synchrotron based combined in situ x-ray diffractometry and reflectometry is used to investigate the role of vacancies for the relaxation of residual stress in thin metallic Pt films. From the experimentally determined relative changes of the lattice parameter a and of the film thickness L the modification of vacancy concentration and residual strain was derived as a function of annealing time at 130 deg. C. The results indicate that relaxation of strain resulting from compressive stress is accompanied by the creation of vacancies at the free film surface. This proves experimentally the postulated dominant role of vacancies for stress relaxation in thin metal films close to room temperature.

Gruber, W.; Chakravarty, S.; Schmidt, H. [Technische Universitaet Clausthal, Institut fuer Metallurgie, Clausthal-Zellerfeld (Germany); Baehtz, C. [Helmholtz Zentrum Dresden Rossendorf, Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Leitenberger, W. [Universitaet Potsdam, Institut fuer Physik und Astronomie, Potsdam (Germany); Bruns, M. [Karlsruher Institut fuer Technologie, Institute for Applied Materials, Eggenstein-Leopoldshafen (Germany); Karlsruher Institut fuer Technologie, Karlsruher Micro Nano Facility, Eggenstein-Leopoldshafen (Germany); Kobler, A.; Kuebel, C. [Karlsruher Institut fuer Technologie, Institute of Nanotechnology, Eggenstein-Leopoldshafen (Germany); Karlsruher Institut fuer Technologie, Karlsruher Micro Nano Facility, Eggenstein-Leopoldshafen (Germany)

2011-12-23T23:59:59.000Z

365

Indium phosphide/cadmium sulfide thin-film solar cells. Semiannual report, July 1980-December 1980  

DOE Green Energy (OSTI)

InP thin films were deposited by planar reactive deposition on recyrstallized CdS (RXCdS) and semi-insulating (100) InP substrates and evaluated as potential layers for an all-thin-film solar cell. Films prepared on RXCdS at approximately 330/sup 0/C contained a mixture of grains having both large and submicron lateral dimensions. SIMS analysis showed the interdiffusion profiles to be well behaved and, within the resolution of the analysis, no significant difference in the profiles between structures prepared at 330/sup 0/C and 380/sup 0/C. Be-doped epitaxial films, deposited on semi-insulating InP at 330/sup 0/C, showed both n- and p-type behavior. Films prepared at higher and lower temperatures with a freshly Be-charged In source were p-type and n-type, respectively; the n-type behavior is associated with an excess of n-type native defects. SIMS analyses confirmed the presence of Be in all Be-doped films. Growth with deviation from stoichiometry was initiated at 330/sup 0/C to reduce the concentration of native defects. Growth of Be-doped films at higher substrate temperature with the same Be-doped source after several runs eventually resulted in n-type films. Analyses of the In source and films were initiated to determine the cause of the transient doping. As an alternative to Be doping, p-type Zn-doped InP films were prepared on InP semi-insulating substrates with room-temperature carrier concentration and mobilities of 6 x 10/sup 16/ cm/sup -3/, and 80 cm/sup 2//Vsec, respectively.

Zanio, K.

1981-03-01T23:59:59.000Z

366

Microstructural evolution of thin film vanadium oxide prepared by pulsed-direct current magnetron sputtering  

Science Conference Proceedings (OSTI)

Vanadium oxide (VO{sub x}) thin films have been deposited by pulsed-DC magnetron sputtering using a metallic vanadium target in a reactive argon and oxygen environment. While the process parameters (power, total pressure, oxygen-to-argon ratio) remained constant, the deposition time was varied to produce films between 75 {+-} 6 and 2901 {+-} 30 A thick, which were then optically and electrically characterized. The complex dielectric function spectra ({epsilon} = {epsilon}{sub 1} + i{epsilon}{sub 2}) of the films from 0.75 to 5.15 eV were extracted by ex situ, multiple-angle spectroscopic ellipsometry (SE) measurements for the series of varied thickness VO{sub x} samples. Significant changes in {epsilon} and resistivity occur as a function of thickness, indicating the correlations exist between the electrical and the optical properties over this spectral range. In addition, in situ measurements via real time SE (RTSE) were made on the film grown to the largest thickness to track optical property and structural variations during growth. RTSE was also used to characterize changes in the film occurring after growth was completed, namely during post sputtering in the presence of argon and oxygen while the sample is shielded, and atmospheric exposure. RTSE indicates that the exposure of the film to the argon and oxygen environment, regardless of the shutter isolating the target, causes up to 200 A of the top surface of the deposited film to become more electrically resistive as evidenced by variations in {epsilon}. Exposure of the VO{sub x} thin film to atmospheric conditions introduces a similar change in {epsilon}, but this change occurs throughout the bulk of the film. A combination of these observations with RTSE results indicates that thinner, less ordered VO{sub x} films are more susceptible to drastic changes due to atmospheric exposure and that microstructural variations in this material ultimately control its environmental stability.

Motyka, M. A.; Horn, M. W. [Department of Engineering Science and Mechanics, Pennsylvania State University, University Park, Pennsylvania 16802 (United States); Gauntt, B. D. [Sandia National Laboratories, P.O. Box 5800-1411, Albuquerque, New Mexico 87185-1411 (United States); Dickey, E. C. [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27606 (United States); Podraza, N. J. [Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States)

2012-11-01T23:59:59.000Z

367

Analysis of indium zinc oxide thin films by laser-induced breakdown spectroscopy  

Science Conference Proceedings (OSTI)

We have performed spectroscopic analysis of the plasma generated by Nd:YAG ({lambda} = 266 nm) laser irradiation of thin indium zinc oxide films with variable In content deposited by combinatorial pulsed laser deposition on glass substrates. The samples were irradiated in 5 x 10{sup 4} Pa argon using laser pulses of 5 ns duration and 10 mJ energy. The plasma emission spectra were recorded with an Echelle spectrometer coupled to a gated detector with different delays with respect to the laser pulse. The relative concentrations of indium and zinc were evaluated by comparing the measured spectra to the spectral radiance computed for a plasma in local thermal equilibrium. Plasma temperature and electron density were deduced from the relative intensities and Stark broadening of spectral lines of atomic zinc. Analyses at different locations on the deposited thin films revealed that the In/(In + Zn) concentration ratio significantly varies over the sample surface, from 0.4 at the borders to about 0.5 in the center of the film. The results demonstrate that laser-induced breakdown spectroscopy allows for precise and fast characterization of thin films with variable composition.

Popescu, A. C. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France); National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); Beldjilali, S. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France); LPPMCA, Universite des Sciences et de la Technologie d'Oran, BP 1505 El Mnaouer, Oran (Algeria); Socol, G.; Mihailescu, I. N. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); Craciun, V. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); MAIC, University of Florida, Gainesville, FL 32611 (United States); Hermann, J. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France)

2011-10-15T23:59:59.000Z

368

Thin film cadmium telluride, zinc telluride, and mercury zinc telluride solar cells. Final subcontract report, 1 July 1988--31 December 1991  

DOE Green Energy (OSTI)

This report describes research to demonstrate (1) thin film cadmium telluride solar cells with a quantum efficiency of 75% or higher at 0. 44 {mu}m and a photovoltaic efficiency of 11.5% or greater, and (2) thin film zinc telluride and mercury zinc telluride solar cells with a transparency to sub-band-gap radiation of 65% and a photovoltaic conversion efficiency of 5% and 8%, respectively. Work was directed at (1) depositing transparent conducting semiconductor films by solution growth and metal-organic chemical vapor deposition (MOCVD) technique, (2) depositing CdTe films by close-spaced sublimation (CSS) and MOCVD techniques, (3) preparing and evaluating thin film CdTe solar cells, and (4) preparing and characterizing thin film ZnTe, CD{sub 1-x}Zn{sub 1-x}Te, and Hg{sub 1-x}Zn{sub x}Te solar cells. The deposition of CdS films from aqueous solutions was investigated in detail, and their crystallographic, optical, and electrical properties were characterized. CdTe films were deposited from DMCd and DIPTe at 400{degrees}C using TEGa and AsH{sub 3} as dopants. CdTe films deposited by CSS had significantly better microstructures than those deposited by MOCVD. Deep energy states in CdTe films deposited by CSS and MOCVD were investigated. Thin films of ZnTe, Cd{sub 1- x}Zn{sub x}Te, and Hg{sub 1-x}Zn{sub x}Te were deposited by MOCVD, and their crystallographic, optical, and electrical properties were characterized. 67 refs.

Chu, T.L. [University of South Florida, Tampa, FL (United States)

1992-04-01T23:59:59.000Z

369

Functionalized multilayer thin films for protection against acutely toxic agents  

E-Print Network (OSTI)

The recently developed practice of spraying polyelectrolyte solutions onto a substrate in order to construct thin films via the Layer-by-Layer (LbL) technique has been further investigated and extended. In this process a ...

Krogman, Kevin Christopher

2009-01-01T23:59:59.000Z

370

Critical Confinement and Elastic Instability in Thin Solid Films  

E-Print Network (OSTI)

formation; Thin soft films INTRODUCTION Pattern formation by self-organization is a subject of much interest introduced a confinement parameter e ¼ hq [16] defined as the ratio of two different length scales: thic

Chaudhury, Manoj K.

371

Polycrystalline Thin-Film Research: Cadmium Telluride (Fact Sheet)  

Science Conference Proceedings (OSTI)

Capabilities fact sheet that includes scope, core competencies and capabilities, and contact/web information for Polycrystalline Thin-Film Research: Cadmium Telluride at the National Center for Photovoltaics.

Not Available

2011-06-01T23:59:59.000Z

372

Properties and sensor performance of zinc oxide thin films  

E-Print Network (OSTI)

Reactively sputtered ZnO thin film gas sensors were fabricated onto Si wafers. The atmosphere dependent electrical response of the ZnO micro arrays was examined. The effects of processing conditions on the properties and ...

Min, Yongki, 1965-

2003-01-01T23:59:59.000Z

373

Polycrystalline Thin-Film Research: Cadmium Telluride (Fact Sheet)  

DOE Green Energy (OSTI)

This National Center for Photovoltaics sheet describes the capabilities of its polycrystalline thin-film research in the area of cadmium telluride. The scope and core competencies and capabilities are discussed.

Not Available

2013-06-01T23:59:59.000Z

374

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of...

375

Efficient light trapping structure in thin film silicon solar cells  

E-Print Network (OSTI)

Thin film silicon solar cells are believed to be promising candidates for continuing cost reduction in photovoltaic panels because silicon usage could be greatly reduced. Since silicon is an indirect bandgap semiconductor, ...

Sheng, Xing

376

Biological, Electronic, and Functional Thin Films and Coatings II  

Science Conference Proceedings (OSTI)

Mar 4, 2013 ... Recent Developments in Biological, Electronic, and Functional Thin Films ... Improved Mobility and Transmittance of Room Temperature ... excellent scintillator for numerous applications in lasers, optical lens and radiography.

377

Biological, Electronic, and Functional Thin Films and Coatings I  

Science Conference Proceedings (OSTI)

Mar 4, 2013... scan (PPS) and electrical impedance spectroscopy (EIS). ... Eclipse Active and Passive Solar Control Coatings: Hulya ... In this paper two novel thin film coating systems will be presented for energy conservation solar ...

378

2 Thin Films Prepared by Sequential Evaporation for Photovoltaic  

Science Conference Proceedings (OSTI)

The defects of Cu-Se di-vacancies are formed in Cu(In,Ga)Se2 thin films and influence to the solar cell performance. In this study, we have fabricated Cu(In ...

379

Shock Dynamics in Particle-Laden Thin Films  

E-Print Network (OSTI)

We present theory and experiments for thin film particle-laden flow on an incline. At higher particle concentration and inclination angle, a new phenomenon is observed in which a large particle-rich ridge forms at the ...

Dupuy, B.

2005-04-22T23:59:59.000Z

380

Direct printing of lead zirconate titanate thin films  

E-Print Network (OSTI)

Thus far, use of lead zirconate titanate (PZT) in MEMS has been limited due to the lack of process compatibility with existing MEMS manufacturing techniques. Direct printing of thin films eliminates the need for photolithographic ...

Bathurst, Stephen, 1980-

2008-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


381

Deriving Deformation Mechanisms in Nanocrystalline AuCu Thin Films  

Science Conference Proceedings (OSTI)

... in a SEM on nc gold and gold-copper thin films adherent to polymer substrate. .... Lithiation Mechanism of Individual SnO2 Nanowires in a Flooding Geometry.

382

Simulated Space Environmental Testing on Thin Films  

Science Conference Proceedings (OSTI)

An exploratory program has been conducted, to irradiate some mature commercial and some experimental polymer films with radiation simulating certain Earth orbits, and to obtain data about the response of each test film''s reflective and tensile properties. ...

Russell Dennis A.; Fogdall Larry B.; Bohnhoff Gail

2000-04-01T23:59:59.000Z

383

Microwave plasma chemical vapor deposition of nano-composite...  

NLE Websites -- All DOE Office Websites (Extended Search)

plasma chemical vapor deposition of nano-composite CPt thin-films Title Microwave plasma chemical vapor deposition of nano-composite CPt thin-films Publication Type Journal...

384

Recent technological advances in thin film solar cells  

DOE Green Energy (OSTI)

High-efficiency, low-cost thin film solar cells are an exciting photovoltaic technology option for generating cost-effective electricity in 1995 and beyond. This paper reviews the substantial advances made by several thin film solar cell technologies, namely, amorphous silicon, copper indium diselenide, cadmium telluride, and polycrystalline silicon. Recent examples of utility demonstration projects of these emerging materials are also discussed. 8 refs., 4 figs.

Ullal, H.S.; Zwelbel, K.; Surek, T.

1990-03-01T23:59:59.000Z

385

Polycrystalline thin-film solar cells and modules  

DOE Green Energy (OSTI)

This paper describes the recent technological advances in polycrystalline thin-film solar cells and modules. Three thin film materials, namely, cadmium telluride (CdTe), copper indium diselenide (CuInSe{sub 2}, CIS) and silicon films (Si-films) have made substantial technical progress, both in device and module performance. Early stability results for modules tested outdoors by various groups worldwide are also encouraging. The major global players actively involved in the development of the these technologies are discussed. Technical issues related to these materials are elucidated. Three 20-kW polycrystalline thin-film demonstration photovoltaic (PV) systems are expected to be installed in Davis, CA in 1992 as part of the Photovoltaics for Utility-Scale Applications (PVUSA) project. This is a joint project between the US Department of Energy (DOE), Pacific Gas and Electric (PG&E), Electric Power Research Institute (EPRI), California Energy Commission (CEC), and a utility consortium.

Ullal, H.S.; Stone, J.L.; Zweibel, K.; Surek, T.; Mitchell, R.L.

1991-12-01T23:59:59.000Z

386

Polycrystalline thin-film solar cells and modules  

DOE Green Energy (OSTI)

This paper describes the recent technological advances in polycrystalline thin-film solar cells and modules. Three thin film materials, namely, cadmium telluride (CdTe), copper indium diselenide (CuInSe{sub 2}, CIS) and silicon films (Si-films) have made substantial technical progress, both in device and module performance. Early stability results for modules tested outdoors by various groups worldwide are also encouraging. The major global players actively involved in the development of the these technologies are discussed. Technical issues related to these materials are elucidated. Three 20-kW polycrystalline thin-film demonstration photovoltaic (PV) systems are expected to be installed in Davis, CA in 1992 as part of the Photovoltaics for Utility-Scale Applications (PVUSA) project. This is a joint project between the US Department of Energy (DOE), Pacific Gas and Electric (PG E), Electric Power Research Institute (EPRI), California Energy Commission (CEC), and a utility consortium.

Ullal, H.S.; Stone, J.L.; Zweibel, K.; Surek, T.; Mitchell, R.L.

1991-12-01T23:59:59.000Z

387

Boron arsenide thin film solar cell development. Quarterly report No. 1  

DOE Green Energy (OSTI)

A large portion of the effort expended in the first quarter was devoted to the design, assembly, and testing of the film growth apparatus. The reactor has been completed and tested by depositing boron from diborane gas onto heated quartz substrates. The objective of this effort was to achieve film growth, which has been accomplished. Within the last month, attempts to grow boron arsenide films have been made by introducing both diborane and arsine into the reactor. Thin films have been grown on quartz and sapphire (alumina) substrates. Variations in film thickness, composition, degree of crystallinity, and conductivity have been observed as a result of variation of the deposition parameters, such as type and flow rate of carrier gases, substrate temperature, and substrate materials. X-ray analysis of several samples indicates that films containing boron and arsenic have been grown. No crystalline films have been produced to date. Electrical and optical measurements indicate some correlation between at least one of the films grown and the results achieved by Chu, et al. on BAs. Thus far, the electrical conductivity, film topography, optical absorption, index of refraction, impurity type, and photo-conductivity have been investigated on one sample. This material appears to be B/sub x/As/sub y/ and could be BAs. Further investigations will be required to be conclusive.

Boone, J.L.; Van Doren, T.P.

1979-07-01T23:59:59.000Z

388

Transparent Conductors and Barrier Layers for Thin Film Solar Cells:  

DOE Green Energy (OSTI)

This report describes the research undertaken to increase the efficiency of thin-film solar cells based on amorphous silicon in the so-called''superstrate structure'' (glass front surface/transparent electrically conductive oxide (TCO)/pin amorphous silicon/metal back electrode). The TCO layer must meet many requirements: high optical transparency in the wavelength region from about 350 to 900 nm, low electrical sheet resistance, stability during handling and deposition of the subsequent layers and during use, a textured (rough) surface to enhance optical absorption of red and near-infrared light, and low-resistance electrical contact to the amorphous silicon p-layer. Fluorine-doped tin oxide has been the TCO used in most commercial superstrate amorphous silicon cells. Fluorine-doped zinc oxide (ZnO:F) was later shown to be even more transparent than fluorine-doped tin oxide, as well as being more resistant to the strongly reducing conditions encountered during the deposition of amorphous silicon. Solar cells based on ZnO:F showed the expected higher currents, but the fill factors were lower than standard cells grown on tin oxide, resulting in no consistent improvement in efficiency. This problem was recently mitigated by using a new proprietary p/buffer layer combination developed at BP Solar.

Gordon, R. G.; Broomhall-Dillard, R.; Liu, X.; Pang, D.; Barton, J.

2001-12-01T23:59:59.000Z

389

Physical Properties of HWCVD Microcrystalline Silicon Thin Films: Preprint  

DOE Green Energy (OSTI)

This conference paper describes Microcrystalline silicon films were grown with different thicknesses and different hydrogen dilution ratios on glass and Si substrates. Some films were deposited with a seed layer, whereas others were deposited directly on the substrate. We used atomic force microscopy, scanning electron microscopy, and X-ray diffraction to study the morphology and crystalline structure of the samples. We did not find a significant influence of the different substrates on the morphology or crystalline structure. The presence of the seed layer enhanced the crystallization process, decreasing the amount of amorphous layer present in the films. The microstructure of most films was formed by grains, with a subgrain structure. Films grown with low values of dilution ratio had (220) texture and elongated grains, whereas films deposited with high values of dilution ratio were randomly oriented and had an irregular shape.

Moutinho, H. R.; Romero, M. J.; Jiang, C. S.; Xu, Y.; Nelson, B. P.; Jones, K. M.; Mahan, A. H.; Al-Jassim, M. M.

2002-05-01T23:59:59.000Z

390

Research on polycrystalline thin-film materials, cells, and modules  

DOE Green Energy (OSTI)

The US Department of Energy (DOE) supports research activities in polycrystalline thin films through the Polycrystalline Thin-Film Program at the Solar Energy Research Institute (SERI). This program includes research and development (R D) in both copper indium diselenide and cadmium telluride thin films for photovoltaic applications. The objective of this program is to support R D of photovoltaic cells and modules that meet the DOE long-term goals of high efficiency (15%--20%), low cost ($50/m{sup 2}), and reliability (30-year life time). Research carried out in this area is receiving increased recognition due to important advances in polycrystalline thin-film CuInSe{sub 2} and CdTe solar cells and modules. These have become the leading thin-film materials for photovoltaics in terms of efficiency and stability. DOE has recognized this potential through a competitive initiative for the development of CuInSe{sub 2} and CdTe modules. This paper focuses on the recent progress and future directions of the Polycrystalline Thin-Film Program and the status of the subcontracted research on these promising photovoltaic materials. 26 refs., 12 figs, 1 tab.

Mitchell, R.L.; Zweibel, K.; Ullal, H.S.

1990-11-01T23:59:59.000Z

391

Ultrasonically Sprayed and Inkjet Printed Thin Film Electrodes for Organic Solar Cells  

Science Conference Proceedings (OSTI)

Thin film pi-conjugated poly(3,4ethylenedioxythiophene): poly(styrenesulphonate) (PEDOT:PSS) as a hole transport layer on indium tin oxide is a key element in some of the most efficient organic photovoltaic and light emitting devices to date. Films are typically deposited by spincoating, which is not readily scalable. In this paper we investigate the critical parameters for both inkjet and ultrasonic spray deposition of PEDOT:PSS thin films on commercial indium tin oxide as a potentially scalable approach to contact formation. Inkjet parameters investigated include drop spacing and substrate temperature. Ultrasonic spray coating parameters investigated include substrate temperature and solution flow rate. We also show that the ink viscosity has a Newtonian character, making it well suited for inkjet printing. Films were characterized via optical profilometry, sheet resistance and atomic force microscopy. Optimized inkjet printed and ultrasonic sprayed PEDOT:PSS films were then compared to spincast layers in a prototypical bulk heterojunction photovoltaic device employing a poly(3-hexylthiophene) and [6,6]-PCBM (6,6-phenylC61-butyric acid-methyl ester) blend as the absorber. Practically all three approaches produced devices of comparable efficiency. Efficiencies were 3.6%, 3.5% and 3.3% for spin, spray and inkjet depositions respectively.

Steirer, K. X.; Berry, J. J.; Reese, M. O.; van Hest, M. F. A. M.; Miedaner, A.; Liberatore, M. W.; Collins, R. T.; Ginley, D. S.

2009-01-01T23:59:59.000Z

392

Understanding Thin Film Structure for the Rational Design of  

NLE Websites -- All DOE Office Websites (Extended Search)

Understanding Thin Film Structure for the Rational Design of Understanding Thin Film Structure for the Rational Design of High-performance Organic Semiconductors for Plastic Electronics Organic semiconductors are attracting considerable research interest due to their potential applications in low-cost electronics such as organic light emitting diode (OLED) displays, RF identification tags (RFID), smart cards and electronic paper. The development of p-conjugated materials, which are composed of alternating single and double chemical bonds, are the foundation of these applications. In the past decade research in this field has progressed to the extent that desirable charge transport in the organic semiconductor film in organic thin film transistors (OTFT) can be achieved through molecular design by selective placement of electron-rich, electron-withdrawing, and aromatic groups in different parts of the molecule. Although the electronic properties are easily tuned by molecular design, the molecular packing within the thin film and the film microstructure have a significant influence on the OTFT performance. Despite this importance, this interrelationship between molecular structure, thin film molecular packing and charge transport are only poorly understood.

393

Thin aerogel films for optical, thermal, acoustic, and electronic applications  

Science Conference Proceedings (OSTI)

Aerogels are a special class of continuously porous solid materials which are characterized by nanometer size particles and pores. Typically, aerogels are made using sol-gel chemistry to form a solvent filled, high porosity gel that is dried by removing the solvent without collapsing the tenuous solid phase. As bulk materials, aerogels are known to have many exceptional, and even some unique physical properties. Aerogels provide the highest thermal insulation and lowest dielectric constant of any other material known. However, some important applications require the aerogels in the form of thin films or sheets. For example, electronic applications require micrometer thin aerogel films bonded to a substrate, and others require thicker films, either on a substrate or as free standing sheets. Special methods are required to make aerogel thin films or sheets. In this paper, the authors discuss the special conditions needed to fabricate thin aerogel films and they describe methods to make films and thin sheets. They also give some specific applications for which aerogel films are being developed.

Hrubesh, L.W.; Poco, J.F. [Lawrence Livermore National Lab., CA (United States). Chemistry and Material Sciences Dept.

1994-09-01T23:59:59.000Z

394

Front and backside processed thin film electronic devices  

Science Conference Proceedings (OSTI)

This invention provides thin film devices that have been processed on their front- and backside. The devices include an active layer that is sufficiently thin to be mechanically flexible. Examples of the devices include back-gate and double-gate field effect transistors, double-sided bipolar transistors and 3D integrated circuits.

Evans, Paul G. (Madison, WI); Lagally, Max G. (Madison, WI); Ma, Zhenqiang (Middleton, WI); Yuan, Hao-Chih (Lakewood, CO); Wang, Guogong (Madison, WI); Eriksson, Mark A. (Madison, WI)

2012-01-03T23:59:59.000Z

395

Recent progress in nanostructured multiferroic Bi{sub 2}FeCrO{sub 6} thin films  

Science Conference Proceedings (OSTI)

We report the latest progress on the growth and characterization of Bi{sub 2}FeCrO{sub 6} (BFCO), a recently discovered multiferroic system. BFCO thin films and nanostructures exhibit exceptional multiferroic properties at room temperature. The growth of pure BFCO thin films on STO substrates is possible only in a narrow window of deposition parameters (i.e., Oxygen pressure pO{sub 2}=1.2 Multiplication-Sign 10{sup -2} mbar and around a substrate temperature T{sub S}=680 Degree-Sign C). The epitaxial growth stabilizes the metastable single phase of this material and promotes the Fe/Cr cation ordering in both thin films and nanostructures. This cationic ordering which is responsible for good magnetic properties of BFCO is also at the origin of pronounced photovoltaic (PV) properties observed in the epitaxial films grown on STO substrates. The results indicate that the ferroelectric polarization plays a dominant role in the observed PV effect. - Graphical abstract: (Top) Crystal structure of BFCO thin films deposited on (1 1 1)-oriented SrTiO3:Nb substrates and direct evidence of the presence of cationic ordering Fe/Cr in the films. (Bottom) Control of the crystal orientation and the shape of the epitaxial nanostructures by the orientation of the niobium-doped STO substrates. Highlights: Black-Right-Pointing-Pointer Growth optimization of Bi{sub 2}FeCrO{sub 6} (BFCO) thin films and nanostructures by pulsed laser deposition. Black-Right-Pointing-Pointer Ordered BFCO single phase have been stabilized by epitaxial strain. Black-Right-Pointing-Pointer Arbitrary patterns of heteroepitaxial multiferroic BFCO nanostructures have been fabricated by PLD combined with nanostenciling. Black-Right-Pointing-Pointer Experimental characterizations revealed the excellent multiferroic character of BFCO thin films and nanostructures. Black-Right-Pointing-Pointer Unprecedentedly high power conversion efficiency for ferroelectrics was observed in 125 nm-thick highly ordered BFCO films.Graphical abstract legend.

Nechache, Riad, E-mail: Nechache@emt.inrs.ca [NAST Center and Department of Chemical Science and Technology, University of Rome Tor Vergata Via della Ricerca Sceintifica 1, 00133 Rome Italy (Italy); Centre Energie, Materiaux et Telecommunications, INRS, 1650, boulevard Lionel-Boulet, Varennes, Quebec J3x 1S2 (Canada); Rosei, Federico, E-mail: rosei@emt.inrs.ca [Centre Energie, Materiaux et Telecommunications, INRS, 1650, boulevard Lionel-Boulet, Varennes, Quebec J3x 1S2 (Canada)

2012-05-15T23:59:59.000Z

396

Gas dynamic aspects of silicon thin layers deposition using excitation of a free jet of the working gas mixture by an electron beam  

Science Conference Proceedings (OSTI)

A film of microcrystalline silicon ({mu}c-Si:H) deposited at low temperature is a promising material for thin-film silicon solar cells with high efficiency and high stability. To deposit silicon thin films with high deposition rate and high quality, a novel gas-jet deposition method has been developed. The paper is devoted to experimental and numerical study of the method from the gas dynamic point of view. A numerical model of the flow field of the working gas mixture in the device was developed that provides predictions of the film thickness distribution over the substrate surface and was found to describe the measured data satisfactory. The model may be used to optimize the operating parameters of the device.

Skovorodko, P. A.; Sharafutdinov, R. G.; Shchukin, V. G.; Konstantinov, V. O. [CJSC Institute of Plasma Chemical Technologies, 630090, Novosibirsk (Russian Federation) and Kutateladze Institute of Thermophysics, 630090, Novosibirsk (Russian Federation)

2012-11-27T23:59:59.000Z

397

Characterization of polysilicon thin films for MEMS applications  

Science Conference Proceedings (OSTI)

The microstructure of thin polycrystalline films formed by molecular beam epitaxy (MBE) has been studied by transmission electron microscopy (TEM). Beneficial compressive residual stress was introduced by cavitation impacts. Surface morphology was characterized ... Keywords: defects, gavitation, molecular beam epitaxy, polysilicon film, transmission electron microscopy

Dan O. Macodiyo; Hitoshi Soyama; Kazuo Hayashi

2006-07-01T23:59:59.000Z

398

Effect of annealing atmosphere on phase formation and electrical characteristics of bismuth ferrite thin films  

SciTech Connect

Bismuth ferrite thin films were deposited on Pt/Ti/SiO{sub 2}/Si substrates by a soft chemical method and spin-coating technique. The effect of annealing atmosphere (air, N{sub 2} and O{sub 2}) on the structure and electrical properties of the films are reported. X-ray diffraction analysis reveals that the film annealed in air atmosphere is a single-phase perovskite structure. The films annealed in air showed better crystallinity and the presence of a single BFO phase leading to lower leakage current density and superior ferroelectric hysteresis loops at room temperature. In this way, we reveal that BFO film crystallized in air atmosphere by the soft chemical method can be useful for practical applications, including nonvolatile digital memories, spintronics and data-storage media.

Simoes, A.Z., E-mail: alezipo@yahoo.com [Universidade Federal de Itajuba, UNIFEI - CAMPUS ITABIRA, Rua Sao Paulo, 377, Bairro Amazonas, CEP: 35900-373 Itabira, MG (Brazil); Riccardi, C.S.; Dos Santos, M.L. [Laboratorio Interdisciplinar em Ceramica, Departamento de Fisico-Quimica, Instituto de Quimica Universidade Estadual Paulista, Bairro: Quitandinha, CEP: 14800-900 Araraquara, SP (Brazil); Garcia, F. Gonzalez [Universidade Federal de Itajuba, UNIFEI - CAMPUS ITABIRA, Rua Sao Paulo, 377, Bairro Amazonas, CEP: 35900-373 Itabira, MG (Brazil); Longo, E.; Varela, J.A. [Laboratorio Interdisciplinar em Ceramica, Departamento de Fisico-Quimica, Instituto de Quimica Universidade Estadual Paulista, Bairro: Quitandinha, CEP: 14800-900 Araraquara, SP (Brazil)

2009-08-05T23:59:59.000Z

399

Evolution of temperature dependent properties of oriented YBaCo{sub 4}O{sub 7} thin films  

SciTech Connect

Bulk YBaCo{sub 4}O{sub 7} was synthesized using a ceramic route in air. Thin films of this compound were grown on (100) oriented LaAlO{sub 3} substrate using a Pulsed Laser Deposition technique. X-ray diffraction results of thin film indicate that the film has (110) orientation. Electrical resistivity measurements, in 300K to 100K temperature range showed that the film is insulating, similar to that of the bulk. Spectroscopic ellipsometric measurements on thin films in the energy range 1.5 to 5 eV and at temperatures from 300 K to 400 K showed that the direct band gap s 2.45 eV at ambient temperature while its value increases with increase in temperature. The increase in band gap with temperature is attributed to the Moss-Burstein effect.

Nithya, R.; Sundari, S. Tripura; Kumary, T. Geetha; Chandra, Sharat; Mani, Awadhesh; Dash, S.; Sastry, V. Sankara [Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam, 603 102, TN (India)

2012-06-05T23:59:59.000Z

400

Post-Deposition Induced Conductivity in Pulsed Laser Irradiated Metal Doped Zinc Oxide Films  

DOE Green Energy (OSTI)

The optical and electrical properties of doped solution-deposited and rf sputter-deposited thin metal oxide films were investigated following post deposition pulsed laser irradiation. Solution deposited films were annealed at 450 ºC. Following the heating regiment, the transparent metal oxide films were subjected to 355 nm pulsed Nd:YAG laser irradiation (4 nsec pulsewidth) at fluences between 5 and 150 mJ/cm2. Irradiation times at pulse frequencies of 30 Hz ranged from seconds to tens of minutes. Film densification, index change and a marked increase in conductivity were observed following irradiation in air and under vacuum of Al:ZnO (AZO), Ga:ZnO (GZO), and In:ZnO (IZO) films deposited on silica substrates. Despite the measured increase in conductivity, all films continued to show high transparency on the order of 90% at wavelengths from the band edge well into the near infrared region of the spectrum. Laser energies required for turning on the conductivity of these films varied depending upon the dopant. Irradiations in air yielded resistivity measurements on the order of 16 ?.cm. Resistivities of films irradiated under vacuum were on the order of 0.1 ?.cm. The increase in conductivity can be attributed to the formation of oxygen vacancies and subsequent promotion of free carriers into the conduction band. All irradiated films become insulating after around 24 hours. Oxygen atoms in air become reduced by electrons in the metal conduction band and diffuse into the vacancies in the lattice. The rate of this reduction process depends on the type of dopant. This work also sheds light on the damage threshold, correlating the optical properties with the presence of free carriers that have been introduced into the conduction band. All films were characterized by means of UV-VIS-NIR transmission spectroscopy, visible and UV Raman spectroscopy and Hall measurements. Analysis of interference fringes in measured transmission spectra allowed film density and refractive index to be evaluated while the Raman measurements showed an increase in LO mode intensity with respect to the TO mode intensity as the films became more conducting. Results of this study are not only important for the continued development of transparent conducting oxide films that find use in photovoltaic cells and solid state lighting modules, but also provide evidence for the role of free carriers in initiating the laser damage process in these wide bandgap metal oxide films.

Wang, Lisa J.; Exarhos, Gregory J.

2009-12-03T23:59:59.000Z

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401

Composite polymeric film and method for its use in installing a very thin polymeric film in a device  

DOE Patents (OSTI)

A composite polymeric film and a method for its use in forming and installing a very thin (<10 .mu.m) polymeric film are disclosed. The composite film consists of a thin film layer and a backing layer. The backing layer is soluble in a solvent in which the thin film layer is not soluble. In accordance with the method, the composite film is installed in a device in the same position in which it is sought to finally emplace the thin film. The backing layer is then selectively dissolved in the solvent to leave the insoluble thin film layer as an unbacked film. The method permits a very thin film to be successfully installed in devices where the fragility of the film would preclude handling and installation by conventional methods.

Duchane, David V. (Los Alamos, NM); Barthell, Barry L. (Tesuque, NM)

1984-01-01T23:59:59.000Z

402

Composite polymeric film and method for its use in installing a very-thin polymeric film in a device  

DOE Patents (OSTI)

A composite polymeric film and a method for its use in forming and installing a very thin (< 10 ..mu..m) polymeric film are disclosed. The composite film consists of a thin film layer and a backing layer. The backing layer is soluble in a solvent in which the thin film layer is not soluble. In accordance with the method, the composite film is installed in a device in the same position in which it is sought to finally emplace the thin film. The backing layer is then selectiely dissolved in the solvent to leave the insoluble thin film layer as an unbacked film. The method permits a very thin film to e successfully installed in devices where the fragility of the film would preclude handling and installation by conventional methods.

Duchane, D.V.; Barthell, B.L.

1982-04-26T23:59:59.000Z

403

Influence of nitrogen background pressure on structure of niobium nitride films grown by pulsed laser deposition  

SciTech Connect

Depositions of niobium nitride thin films on Nb using pulsed laser deposition (PLD) with different nitrogen background pressures (10.7 to 66.7 Pa) have been performed. The effect of nitrogen pressure on NbN formation in this process was examined. The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), and energy dispersive X-ray (EDX) analysis. Hexagonal {beta}-Nb{sub 2}N and cubic {delta}-NbN phases resulted when growth was performed in low nitrogen background pressures. With an increase in nitrogen pressure, NbN films grew in single hexagonal {beta}-Nb{sub 2}N phase. The formation of the hexagonal texture during the film growth was studied. The c/a ratio of the hexagonal {beta}-Nb{sub 2}N unit cell parameter increases with increasing nitrogen pressure. Furthermore, the N:Nb ratio has a strong influence on the lattice parameter of the {delta}-NbN, where the highest value was achieved for this ratio was 1.19. It was found that increasing nitrogen background pressure leads to change in the phase structure of the NbN film. With increasing nitrogen pressure, the film structure changes from hexagonal to a mixed phase and then back to a hexagonal phase.

Ashraf H. Farha, Ali O. Er, Yüksel Ufuktepe, Ganapati Myneni, Hani E. Elsayed-Ali

2011-12-01T23:59:59.000Z

404

Effects of humidity during photoprocessing on thin film metallization adhesion  

SciTech Connect

Humidity effects during photoprocessing on tantalum/chromium/gold thin film networks (TFNs) were investigated. Humidity conditions at various process steps were controlled by placing either desiccant or water in handling containers for the TFNs. The TFNs photoprocessed in humid conditions had a much higher occurrence of metallization failures compared to TFNs processed in dry conditions. Ceramic surface defects were shown to cause pores in the thin films, and these pores enhanced corrosion susceptibility for the films. This study resulted in a desiccated storage process for production of TFNs.

Norwood, D.P.

1980-03-01T23:59:59.000Z

405

Processing approach towards the formation of thin-film Cu(In,Ga)Se2  

DOE Patents (OSTI)

A two-stage method of producing thin-films of group IB-IIIA-VIA on a substrate for semiconductor device applications includes a first stage of depositing an amorphous group IB-IIIA-VIA precursor onto an unheated substrate, wherein the precursor contains all of the group IB and group IIIA constituents of the semiconductor thin-film to be produced in the stoichiometric amounts desired for the final product, and a second stage which involves subjecting the precursor to a short thermal treatment at 420.degree. C.-550.degree. C. in a vacuum or under an inert atmosphere to produce a single-phase, group IB-III-VIA film. Preferably the precursor also comprises the group VIA element in the stoichiometric amount desired for the final semiconductor thin-film. The group IB-IIIA-VIA semiconductor films may be, for example, Cu(In,Ga)(Se,S).sub.2 mixed-metal chalcogenides. The resultant supported group IB-IIIA-VIA semiconductor film is suitable for use in photovoltaic applications.

Beck, Markus E. (Falkensee, DE); Noufi, Rommel (Golden, CO)

2003-01-01T23:59:59.000Z

406

Thin-film electrolytes for reduced temperature solid oxide fuel cells  

DOE Green Energy (OSTI)

Solid oxide fuel cells produce electricity at very high efficiency and have very low to negligible emissions, making them an attractive option for power generation for electric utilities. However, conventional SOFC`s are operated at 1000{degrees}C or more in order to attain reasonable power density. The high operating temperature of SOFC`s leads to complex materials problems which have been difficult to solve in a cost-effective manner. Accordingly, there is much interest in reducing the operating temperature of SOFC`s while still maintaining the power densities achieved at high temperatures. There are several approaches to reduced temperature operation including alternative solid electrolytes having higher ionic conductivity than yttria stabilized zirconia, thin solid electrolyte membranes, and improved electrode materials. Given the proven reliability of zirconia-based electrolytes (YSZ) in long-term SOFC tests, the use of stabilized zirconia electrolytes in reduced temperature fuel cells is a logical choice. In order to avoid compromising power density at intermediate temperatures, the thickness of the YSZ electrolyte must be reduced from that in conventional cells (100 to 200 {mu}m) to approximately 4 to 10 {mu}m. There are a number of approaches for depositing thin ceramic films onto porous supports including chemical vapor deposition/electrochemical vapor deposition, sol-gel deposition, sputter deposition, etc. In this paper we describe an inexpensive approach involving the use of colloidal dispersions of polycrystalline electrolyte for depositing 4 to 10 {mu}m electrolyte films onto porous electrode supports in a single deposition step. This technique leads to highly dense, conductive, electrolyte films which exhibit near theoretical open circuit voltages in H{sub 2}/air fuel cells. These electrolyte films exhibit bulk ionic conductivity, and may see application in reduced temperature SOFC`s, gas separation membranes, and fast response sensors.

Visco, S.J.; Wang, L.S.; De Souza, S.; De Jonghe, L.C.

1994-11-01T23:59:59.000Z

407

Thin-film absorber for a solar collector  

DOE Green Energy (OSTI)

This invention pertains to energy absorbers for solar collectors, and more particularly to high performance thin film absorbers. The solar collectors comprising the absorber of this invention overcome several problems seen in current systems, such as excessive hardware, high cost and unreliability. In the preferred form, the apparatus features a substantially rigid planar frame with a thin film window bonded to one planar side of the frame. An absorber in accordance with the present invention is comprised of two thin film layers that are sealed perimetrically. In a preferred embodiment, thin film layers are formed from a metal/plastic laminate. The layers define a fluid-tight planar envelope of large surface area to volume through which a heat transfer fluid flows. The absorber is bonded to the other planar side of the frame. The thin film construction of the absorber assures substantially full envelope wetting and thus good efficiency. The window and absorber films stress the frame adding to the overall strength of the collector.

Wilhelm, W.G.

1982-02-09T23:59:59.000Z

408

Ultrafast laser ablation of gold thin film targets  

Science Conference Proceedings (OSTI)

Ultrafast laser ablation of a gold thin film is studied and compared with that of a bulk target, with particular emphasis given to the process of nanoparticles generation. The process is carried out in a condition where a single laser shot removes all the irradiated film spot. The experimental results evidence interesting differences and, in particular, a reduction of the nanoparticles size, and a narrowing of a factor two of their size distribution in the case of ablation of a thin film target, a feature which we relate to a more uniform heating of the target material. We thus show that ultrashort laser ablation of thin films provides a promising way of controlling plume features and nanoparticles size.

Amoruso, S.; Ausanio, G.; Bruzzese, R. [Dipartimento di Scienze Fisiche, Universita degli Studi di Napoli Federico II, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy); CNR-SPIN, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy); Nedyalkov, N. N.; Atanasov, P. A. [Institute of Electronics, Bulgarian Academy of Sciences, 72 Tsaridradsko shose Boulevard, Sofia 1784 (Bulgaria); Wang, X. [CNR-SPIN, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy)

2011-12-15T23:59:59.000Z

409

Thin-film rechargeable lithium batteries for implantable devices  

DOE Green Energy (OSTI)

Thin films of LiCoO{sub 2} have been synthesized in which the strongest x-ray reflection is either weak or missing, indicating a high degree of preferred orientation. Thin-film solid state batteries with these textured cathode films can deliver practical capacities at high current densities. For example, for one of the cells 70% of the maximum capacity between 4.2 V and 3 V ({approximately}0.2 mAh/cm{sup 2}) was delivered at a current of 2 mA/cm{sup 2}. When cycled at rates of 0.1 mA/cm{sup 2}, the capacity loss was 0.001 %/cycle or less. The reliability and performance of Li-LiCoO{sub 2} thin-film batteries make them attractive for application in implantable devices such as neural stimulators, pacemakers, and defibrillators.

Bates, J.b.; Dudney, N.J.

1997-05-01T23:59:59.000Z

410

Film deposition and surface modification using intense pulsed ion beams  

SciTech Connect

High-power pulsed ion beams have been used to ablate material for ultrahigh-rate film deposition and to treat the surfaces of alloys. Pulsed ion beams were provided by the high-power-density Gamble II facility at the Naval Research Laboratory [high voltage ({similar_to}900 keV), short pulse (60 ns)] and the lower-power-density Anaconda facility at Los Alamos National Laboratory [lower voltage ({similar_to}300 keV), longer pulse (400 ns)]. Peak film deposition rates after target ablation reached 1 mm/s. Films of pure Al, pure Ta, YBCO, and Ni--Zn ferrite were deposited on glass and single-crystal substrates, in some cases heated. The film deposition process was studied with framing photography, a bolometer, and other diagnostics to gain an understanding of the ablation, transport, and deposition steps. Stoichiometric deposition of multicomponent targets has been demonstrated. Film morphology remains poor, but has steadily improved, and our present understanding points the way to further improvement. Lower fluences ({similar_to}5 J/cm{sup 2}) were used to investigate rapid thermal processing of metal surfaces for the enhancement of corrosion resistance. The results in this area have been negative, but here again the knowledge gained through these experiments allows us to propose directions for improvement. {copyright} {ital 1995} {ital American} {ital Vacuum} {ital Society}

Meli, C.A.; Grabowski, K.S.; Hinshelwood, D.D.; Stephanakis, S.J. [Naval Research Laboratory, Washington, DC 20375 (United States)] [Naval Research Laboratory, Washington, DC 20375 (United States); Rej, D.J.; Waganaar, W.J. [Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)] [Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

1995-05-01T23:59:59.000Z

411

Development of Nb and Alternative Material Thin Films Tailored for SRF Applications  

Science Conference Proceedings (OSTI)

Over the years, Nb/Cu technology, despite its shortcomings due to the commonly used magnetron sputtering, has positioned itself as an alternative route for the future of superconducting structures used in accelerators. Recently, significant progress has been made in the development of energetic vacuum deposition techniques, showing promise for the production of thin films tailored for SRF applications. JLab is pursuing energetic condensation deposition via techniques such as Electron Cyclotron Resonance and High Power Impulse Magnetron Sputtering. As part of this project, the influence of the deposition energy on the material and RF properties of the Nb thin film is investigated with the characterization of their surface, structure, superconducting properties and RF response. It has been shown that the film RRR can be tuned from single digits to values greater than 400. This paper presents results on surface impedance measurements correlated with surface and material characterization for Nb films produced on various substrates, monocrystalline and polycrystalline as well as amorphous. A progress report on work on NbTiN and AlN based multilayer structures will also be presented.

Valente-Feliciano, A -M; Reece, C E; Spradlin, J K; Xiao, B; Zhao, X; Gu, Diefeng; Baumgart, Helmut; Beringer, Douglas; Lukaszew, Rosa

2011-09-01T23:59:59.000Z

412

Thin film cadmium telluride photovoltaic cells. Annual subcontract report, 23 July 1990--31 October 1991  

DOE Green Energy (OSTI)

This report describes research to develop to vacuum-based growth techniques for CdTe thin-film solar cells: (1) laser-driven physical vapor deposition (LDPVD) and (2) radio-frequency (rf) sputtering. The LDPVD process was successfully used to deposit thin films of CdS, CdTe, and CdCl{sub 2}, as well as related alloys and doped semiconductor materials. The laser-driven deposition process readily permits the use of several target materials in the same vacuum chamber and, thus, complete solar cell structures were fabricated on SnO{sub 2}-coated glass using LDPVD. The rf sputtering process for film growth became operational, and progress was made in implementing it. Time was also devoted to enhancing or implementing a variety of film characterization systems and device testing facilities. A new system for transient spectroscopy on the ablation plume provided important new information on the physical mechanisms of LDPVD. The measurements show that, e.g., Cd is predominantly in the neutral atomic state in the plume but with a fraction that is highly excited internally ({ge} 6 eV), and that the typical neutral Cd translational kinetic energies perpendicular to the target are 20 eV and greater. 19 refs.

Compaan, A.; Bohn, R. [Toledo Univ., OH (United States)

1992-04-01T23:59:59.000Z

413

Nanomechanical and nanotribological properties of Nb substituted TiN thin films  

Science Conference Proceedings (OSTI)

Nanomechanical and nanotribological properties of Ti{sub 1-x}Nb{sub x}N (0{<=}x{<=}1) thin films were investigated as a function x. The films were deposited onto polycrystalline nuclear grade 316LN stainless steel (SS) substrate by radio frequency magnetron sputtering in 100% N{sub 2} plasma. The hardness and Young's modulus increased while the friction coefficient and wear volume decreased with increasing Nb substitution. The highest hardness achieved was 31GPa for x=0.77. At the same Nb concentration, the friction coefficient was 0.15 and the elastic recovery was 60%.

Krishna, M. Ghanashyam; Vasu, K.; Padmanabhan, K. A. [School of Physics, Centre for Nanotechnology, University of Hyderabad, Hyderabad-500 046 (India); Centre for Nanotechnology, School of Engineering Sciences and Technology, University of Hyderabad, Hyderabad-500 046 (India)

2012-06-25T23:59:59.000Z

414

Heat treatment of cathodic arc deposited amorphous hard carbon films  

SciTech Connect

Amorphous hard carbon films of varying sp{sup 2}/sp{sup 3} fractions have been deposited on Si using filtered cathodic are deposition with pulsed biasing. The films were heat treated in air up to 550 C. Raman investigation and nanoindentation were performed to study the modification of the films caused by the heat treatment. It was found that films containing a high sp{sup 3} fraction sustain their hardness for temperatures at least up to 400 C, their structure for temperatures up to 500 C, and show a low thickness loss during heat treatment. Films containing at low sp{sup 3} fraction graphitize during the heat treatment, show changes in structure and hardness, and a considerable thickness loss.

Anders, S.; Ager, J.W. III; Brown, I.G. [and others

1997-02-01T23:59:59.000Z

415

Thin-film cadmium telluride photovoltaic cells. Final subcontract report, 1 November 1992--1 January 1994  

DOE Green Energy (OSTI)

This report describes work to develop and optimize radio-frequency (rf) sputtering for the deposition of thin films of cadmium telluride (CdTe) and related semiconductors for thin-film solar cells. Pulsed laser physical vapor deposition was also used for exploratory work on these materials, especially where alloying or doping are involved, and for the deposition of cadmium chloride layers. The sputtering work utilized a 2-in diameter planar magnetron sputter gun. The film growth rate by rf sputtering was studied as a function of substrate temperature, gas pressure, and rf power. Complete solar cells were fabricated on tin-oxide-coated soda-lime glass substrates. Currently, work is being done to improve the open-circuit voltage by varying the CdTe-based absorber layer, and to improve the short-circuit current by modifying the CdS window layer.

Compaan, A.D.; Bohn, R.G. [Toledo Univ., OH (United States)

1994-09-01T23:59:59.000Z

416

Thin film seeds for melt processing textured superconductors for practical applications  

DOE Patents (OSTI)

A method of fabricating bulk superconducting material such as RBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} where R is La or Y comprising depositing a thin epitaxially oriented film of Nd or Sm (123) on an oxide substrate is disclosed. The powder oxides of RBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} or oxides and/or carbonates of R and Ba and Cu present in mole ratios to form RBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}}, where R is Y or La are heated, in physical contact with the thin film of Nd or Sm (123) on the oxide substrate to a temperature sufficient to form a liquid phase in the oxide or carbonate mixture while maintaining the thin film solid to grow a large single domain 123 superconducting material. Then the material is cooled. The thin film is between 200 {angstrom} and 2000 {angstrom}. A construction prepared by the method is also disclosed.

Veal, B.W.; Paulikas, A.; Balachandran, U.; Zhong, W.

1999-02-09T23:59:59.000Z

417

Thin film seeds for melt processing textured superconductors for practical applications  

DOE Patents (OSTI)

A method of fabricating bulk superconducting material such as RBa.sub.2 Cu.sub.3 O.sub.7-.delta. where R is La or Y comprising depositing a thin epitaxially oriented film of Nd or Sm (123) on an oxide substrate. The powder oxides of RBa.sub.2 Cu.sub.3 O.sub.7-.delta. or oxides and/or carbonates of R and Ba and Cu present in mole ratios to form RBa.sub.2 Cu.sub.3 O.sub.7-.delta., where R is Y or La are heated, in physical contact with the thin film of Nd or Sm (123) on the oxide substrate to a temperature sufficient to form a liquid phase in the oxide or carbonate mixture while maintaining the thin film solid to grow a large single domain 123 superconducting material. Then the material is cooled. The thin film is between 200 .ANG. and 2000 .ANG.. A construction prepared by the method is also disclosed.

Veal, Boyd W. (Downers Grove, IL); Paulikas, Arvydas (Downers Grove, IL); Balachandran, Uthamalingam (Hinsdale, IL); Zhong, Wei (West Lafayette, IN)

1999-01-01T23:59:59.000Z

418

Photoluminescence Characterization of ZnO Thin Films Grown by RF- Sputtering  

Science Conference Proceedings (OSTI)

This article presents photoluminescence (PL) characterization of ZnO thin films deposited by radio-frequency magnetron sputtering method on sapphire and n-type Si (100) substrates. PL measurements were carried out at room temperature to investigate the energy band gaps and optical quality of the ZnO thin films. In order to draw a specific picture of surface morphology of ZnO thin films, atomic force microscope images were taken. All the results were compared to the results obtained from the bulk ZnO sample. The results revealed that the energy band gap of ZnO thin films grown on n-type Si (100) is higher than ZnO on sapphire. However, energy band gap of bulk ZnO is higher compared to both ZnO on n-type Si (100) and sapphire (Al{sub 2}O{sub 3}). This is probably due to the crystalline quality because good crystallinity increases the radiation recombination and hence increase the intensity of the NBE emission.

Bakhori, S. K. Mohd; Ng, S. S.; Ahmad, M. A.; Ahmad, H.; Hassan, Z.; Hassan, H. Abu; Abdullah, M. J. [Nano-optoelectronics Research and Technology Laboratory, School of Physics, Universiti Sains Malaysia, 11800, USM, Penang (Malaysia)

2011-03-30T23:59:59.000Z

419

Modeling and optimization of the growth rate for ZnO thin films using neural networks and genetic algorithms  

Science Conference Proceedings (OSTI)

The process modeling for the growth rate in pulsed laser deposition (PLD)-grown ZnO thin films was investigated using neural networks (NNets) based on the back-propagation (BP) algorithm and the process recipes was optimized via genetic algorithms (GAs). ... Keywords: Genetic algorithms, Neural networks, PLD, Process modeling, ZnO

Young-Don Ko; Pyung Moon; Chang Eun Kim; Moon-Ho Ham; Jae-Min Myoung; Ilgu Yun

2009-03-01T23:59:59.000Z

420

Influence of substrate properties and annealing temperature on the stress state of magnetron sputtered tungsten thin films  

SciTech Connect

The influence of substrate properties and annealing temperature on the stress state of tungsten thin films deposited by dc reactive magnetron sputtering was studied using 310 steel (AISI), Fecralloy registered and Invar registered substrates. Besides elemental tungsten, only residual amounts of contamination elements (O, C, Ar, etc.) were detected by electron probe microanalysis. Only the {alpha}-W crystalline structure, with a preferential <110> orientation, was detected in all the films by x-ray diffraction. The highest lattice parameters were measured for the films deposited on 310 steel substrates, while the smallest values were obtained for the films deposited on Invar registered substrates. These results are closely related to the thermal expansion coefficients of the substrates. All the as-deposited films were in a compressive stress state independent of the substrate type (-3 GPa for 310 steel and Fecralloy registered substrates and -2 GPa for Invar registered substrates). The residual compressive stresses of the films deposited on Fecralloy registered substrates strongly decrease with annealing temperatures up to {approx_equal}-8 GPa at 1175 K. This result shows that the measured compressive stresses are not real, and they are a direct consequence of plastic deformation of the substrate. On the contrary, the compressive stresses measured in the films deposited on Invar registered and 310 steel substrates are real as plastic deformation of the substrates is not observed.

Oliveira, J. C.; Cavaleiro, A. [Grupo de Materiais e Engenharia de Superficies, ICEMS, Departamento de Engenharia Mecanica, Universidade de Coimbra, Polo II, Pinhal de Marrocos, 3030 Coimbra (Portugal)

2006-11-15T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


421

Thin-film fiber optic hydrogen and temperature sensor system  

DOE Patents (OSTI)

The invention discloses a sensor probe device for monitoring of hydrogen gas concentrations and temperatures by the same sensor probe. The sensor probe is constructed using thin-film deposition methods for the placement of a multitude of layers of materials sensitive to hydrogen concentrations and temperature on the end of a light transparent lens located within the sensor probe. The end of the lens within the sensor probe contains a lens containing a layer of hydrogen permeable material which excludes other reactive gases, a layer of reflective metal material that forms a metal hydride upon absorbing hydrogen, and a layer of semi-conducting solid that is transparent above a temperature dependent minimum wavelength for temperature detection. The three layers of materials are located at the distal end of the lens located within the sensor probe. The lens focuses light generated by broad-band light generator and connected by fiber-optics to the sensor probe, onto a reflective metal material layer, which passes through the semi-conducting solid layer, onto two optical fibers located at the base of the sensor probe. The reflected light is transmitted over fiber optic cables to a spectrometer and system controller. The absence of electrical signals and electrical wires in the sensor probe provides for an elimination of the potential for spark sources when monitoring in hydrogen rich environments, and provides a sensor free from electrical interferences. 3 figs.

Nave, S.E.

1998-07-21T23:59:59.000Z

422

Ambipolar charge transport in microcrystalline silicon thin-film transistors  

Science Conference Proceedings (OSTI)

Hydrogenated microcrystalline silicon ({mu}c-Si:H) is a promising candidate for thin-film transistors (TFTs) in large-area electronics due to high electron and hole charge carrier mobilities. We report on ambipolar TFTs based on {mu}c-Si:H prepared by plasma-enhanced chemical vapor deposition at temperatures compatible with flexible substrates. Electrons and holes are directly injected into the {mu}c-Si:H channel via chromium drain and source contacts. The TFTs exhibit electron and hole charge carrier mobilities of 30-50 cm{sup 2}/V s and 10-15 cm{sup 2}/V s, respectively. In this work, the electrical characteristics of the ambipolar {mu}c-Si:H TFTs are described by a simple analytical model that takes the ambipolar charge transport into account. The analytical expressions are used to model the transfer curves, the potential and the net surface charge along the channel of the TFTs. The electrical model provides insights into the electronic transport of ambipolar {mu}c-Si:H TFTs.

Knipp, Dietmar; Marinkovic, M. [Electronic Devices and Nanophotonics Laboratory, Jacobs University Bremen, 28759 Bremen (Germany); Chan, Kah-Yoong [IEF5-Photovoltaics, Research Center Juelich, 52425 Juelich (Germany); Faculty of Engineering, Multimedia University, Cyberjaya, 63100 Selangor (Malaysia); Gordijn, Aad [IEF5-Photovoltaics, Research Center Juelich, 52425 Juelich (Germany); Stiebig, Helmut [IEF5-Photovoltaics, Research Center Juelich, 52425 Juelich (Germany); Malibu Solar GmbH and Co. KG, 33609 Bielefeld (Germany)

2011-01-15T23:59:59.000Z

423

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

424

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

425

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

426

Guided Self-Assembly of Gold Thin Films  

NLE Websites -- All DOE Office Websites (Extended Search)

Guided Self-Assembly of Gold Thin Films Print Guided Self-Assembly of Gold Thin Films Print Nanoparticles-man-made atoms with unique optical, electrical, and mechanical properties-have become key components in many fields of science. If nanoparticles could be coaxed into routinely assembling themselves into predictable complex structures and hierarchical patterns, devices could be mass-produced that are one thousand times smaller than today's microtechnologies. Berkeley Lab and UC Berkeley scientists have made progress toward this goal, successfully directing the self--assembly of nanoparticles into device-ready thin films, which have potential applications in fields ranging from computer memory storage to energy harvesting and storage, from catalysis to light management, and into the emerging new field of plasmonics.

427

SPUTTERED THIN FILM PHOTOVOLTAICS - Home - Energy ...  

for photovoltaic (PV) applications .These processes result in films with better unif ormity over ... ultimately resulting in a more efficient solar ce ...

428

High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition  

Science Conference Proceedings (OSTI)

Aluminum-doped zinc oxide, ZnO:Al or AZO, is a well-known n-type transparent conducting oxide with great potential in a number of applications currently dominated by indium tin oxide (ITO). In this study, the optical and electrical properties of AZO thin films deposited on glass and silicon by pulsed filtered cathodic arc deposition are systematically studied. In contrast to magnetron sputtering, this technique does not produce energetic negative ions, and therefore ion damage can be minimized. The quality of the AZO films strongly depends on the growth temperature while only marginal improvements are obtained with post-deposition annealing. The best films, grown at a temperature of about 200?C, have resistivities in the low to mid 10-4 Omega cm range with a transmittance better than 85percent in the visible part of the spectrum. It is remarkable that relatively good films of small thickness (60 nm) can be fabricated using this method.

Anders, Andre; Lim, Sunnie H.N.; Yu, Kin Man; Andersson, Joakim; Rosen, Johanna; McFarland, Mike; Brown, Jeff

2009-04-24T23:59:59.000Z

429

Improving the performance of the organic thin-film transistors with thin insulating lithium fluoride buffer layer  

Science Conference Proceedings (OSTI)

The pentacene-based organic thin-film transistors (OTFTs) with a thin insulating lithium fluoride (LiF) buffer layer between the pentacene and source/drain electrodes were fabricated. Compared with conventional OTFTs, the introduction of the buffer layer ... Keywords: OTFT, Organic thin-film transistor, Pentacene

Wei Hu; Yi Zhao; Jingying Hou; Chunsheng Ma; Shiyong Liu

2007-04-01T23:59:59.000Z

430

Electronic processes in thin-film PV materials. Final report  

DOE Green Energy (OSTI)

The electronic and optical processes in an important class of thin-film PV materials, hydrogenated amorphous silicon (a-Si:H) and related alloys, have been investigated using several experimental techniques designed for thin-film geometries. The experimental techniques include various magnetic resonance and optical spectroscopies and combinations of these two spectroscopies. Two-step optical excitation processes through the manifold of silicon dangling bond states have been identifies as important at low excitation energies. Local hydrogen motion has been studied using nuclear magnetic resonance techniques and found to be much more rapid than long range diffusion as measured by secondary ion mass spectroscopy. A new metastable effect has been found in a-Si:H films alloyed with sulfur. Spin-one optically excited states have been unambiguously identified using optically detected electron spin resonance. Local hydrogen bonding in microcrystalline silicon films has been studied using NMR.

Taylor, P.C.; Chen, D.; Chen, S.L. [and others

1998-07-01T23:59:59.000Z

431

Effects of acetylacetone additions on PZT thin film processing  

SciTech Connect

Sol-gel processing methods are frequently used for the fabrication of lead zirconate titanate (PZT) thin films for many electronic applications. Our standard approach for film fabrication utilizes lead acetate and acetic acid modified metal alkoxides of zirconium and titanium in the preparation of our precursor solutions. This report highlights some of our recent results on the effects of the addition of a second chelating ligand, acetylacetone, to this process. The authors discuss the changes in film drying behavior, densification and ceramic microstructure which accompany acetylacetone additions to the precursor solution and relate the observed variations in processing behavior to differences in chemical precursor structure induced by the acetylacetone ligand. Improvements in thin film microstructure, ferroelectric and optical properties are observed when acetylacetone is added to the precursor solution.

Schwartz, R.W.; Assink, R.A.; Dimos, D.; Sinclair, M.B.; Boyle, T.J.; Buchheit, C.D.

1995-02-01T23:59:59.000Z

432

Fabrication of polycrystalline thin films by pulsed laser processing  

DOE Patents (OSTI)

A method for fabricating polycrystalline thin films on low-temperature (or high-temperature) substrates which uses processing temperatures that are low enough to avoid damage to the substrate, and then transiently heating select layers of the thin films with at least one pulse of a laser or other homogenized beam source. The pulse length is selected so that the layers of interest are transiently heated to a temperature which allows recrystallization and/or dopant activation while maintaining the substrate at a temperature which is sufficiently low to avoid damage to the substrate. This method is particularly applicable in the fabrication of solar cells.

Mitlitsky, Fred (Livermore, CA); Truher, Joel B. (San Rafael, CA); Kaschmitter, James L. (Pleasanton, CA); Colella, Nicholas J. (Livermore, CA)

1998-02-03T23:59:59.000Z

433

Fabrication of polycrystalline thin films by pulsed laser processing  

DOE Patents (OSTI)

A method is disclosed for fabricating polycrystalline thin films on low-temperature (or high-temperature) substrates which uses processing temperatures that are low enough to avoid damage to the substrate, and then transiently heating select layers of the thin films with at least one pulse of a laser or other homogenized beam source. The pulse length is selected so that the layers of interest are transiently heated to a temperature which allows recrystallization and/or dopant activation while maintaining the substrate at a temperature which is sufficiently low to avoid damage to the substrate. This method is particularly applicable in the fabrication of solar cells. 1 fig.

Mitlitsky, F.; Truher, J.B.; Kaschmitter, J.L.; Colella, N.J.

1998-02-03T23:59:59.000Z

434

Perovskite phase thin films and method of making  

DOE Patents (OSTI)

The present invention comprises perovskite-phase thin films, of the general formula A.sub.x B.sub.y O.sub.3 on a substrate, wherein A is selected from beryllium, magnesium, calcium, strontium, and barium or a combination thereof; B is selected from niobium and tantalum or a combination thereof; and x and y are mole fractions between approximately 0.8 and 1.2. More particularly, A is strontium or barium or a combination thereof and B is niobium or tantalum or a combination thereof. Also provided is a method of making a perovskite-phase thin film, comprising combining at least one element-A-containing compound, wherein A is selected from beryllium, magnesium, calcium, strontium or barium, with at least one element-B-containing compound, wherein B niobium or tantalum, to form a solution; adding a solvent to said solution to form another solution; spin-coating the solution onto a substrate to form a thin film; and heating the film to form the perovskite-phase thin film.

Boyle, Timothy J. (Albuquerque, NM); Rodriguez, Mark A. (Albuquerque, NM)

2000-01-01T23:59:59.000Z

435

Novel wide band gap materials for highly efficient thin film tandem solar cells  

SciTech Connect

Tandem solar cells (TSCs), which use two or more materials to absorb sunlight, have achieved power conversion efficiencies of >25% versus 11-20% for commercialized single junction solar cell modules. The key to widespread commercialization of TSCs is to develop the wide-band, top solar cell that is both cheap to fabricate and has a high open-circuit voltage (i.e. >1V). Previous work in TSCs has generally focused on using expensive processing techniques with slow growth rates resulting in costs that are two orders of magnitude too expensive to be used in conventional solar cell modules. The objective of the PLANT PV proposal was to investigate the feasibility of using Ag(In,Ga)Se2 (AIGS) as the wide-bandgap absorber in the top cell of a thin film tandem solar cell (TSC). Despite being studied by very few in the solar community, AIGS solar cells have achieved one of the highest open-circuit voltages within the chalcogenide material family with a Voc of 949mV when grown with an expensive processing technique (i.e. Molecular Beam Epitaxy). PLANT PV�s goal in Phase I of the DOE SBIR was to 1) develop the chemistry to grow AIGS thin films via solution processing techniques to reduce costs and 2) fabricate new device architectures with high open-circuit voltage to produce full tandem solar cells in Phase II. PLANT PV attempted to translate solution processing chemistries that were successful in producing >12% efficient Cu(In,Ga)Se2 solar cells by replacing copper compounds with silver. The main thrust of the research was to determine if it was possible to make high quality AIGS thin films using solution processing and to fully characterize the materials properties. PLANT PV developed several different types of silver compounds in an attempt to fabricate high quality thin films from solution. We found that silver compounds that were similar to the copper based system did not result in high quality thin films. PLANT PV was able to deposit AIGS thin films using a mixture of solution and physical vapor deposition processing, but these films lacked the p-type doping levels that are required to make decent solar cells. Over the course of the project PLANT PV was able to fabricate efficient CIGS solar cells (8.7%) but could not achieve equivalent performance using AIGS. During the nine-month grant PLANT PV set up a variety of thin film characterization tools (e.g. drive-level capacitance profiling) at the Molecular Foundry, a Department of Energy User Facility, that are now available to both industrial and academic researchers via the grant process. PLANT PV was also able to develop the back end processing of thin film solar cells at Lawrence Berkeley National Labs to achieve 8.7% efficient CIGS solar cells. This processing development will be applied to other types of thin film PV cells at the Lawrence Berkeley National Labs. While PLANT PV was able to study AIGS film growth and optoelectronic properties we concluded that AIGS produced using these methods would have a limited efficiency and would not be commercially feasible. PLANT PV did not apply for the Phase II of this grant.

Brian E. Hardin, Stephen T. Connor, Craig H. Peters

2012-06-11T23:59:59.000Z

436

Growth of TiO{sub 2} Thin Film on Various Substrates using RF Magnetron Sputtering  

Science Conference Proceedings (OSTI)

The conductivity of Titanium Dioxide (TiO{sub 2}) thin film fabricated using Radio Frequency (RF) Magnetron Sputtering on Silicon (Si), Indium doped--Tin Oxide (ITO) and microscope glass (M) substrates is presented in this paper. The dependant of thin film thickness and type of substrate been discussed. TiO{sub 2} was deposited using Ti target in Ar+O{sub 2}(45:10) mixture at 250 W for 45, 60, 75, 90, 105 and 120 minute. Resultant thickness varies from 295 nm to 724 nm with deposition rate 6.4 nm/min. On the other hand, resistivity, Rs value for ITO substrate is between 5.72x10{sup -7} to 1.54x10{sup -6{Omega}}.m, Si substrate range is between 3.52x10{sup -6} to 1.76x10{sup -5{Omega}}.m and M substrate range is between 99 to 332 {Omega}.m. The value of resistivity increases with the thickness of the thin film.

Ali, Riyaz Ahmad Mohamed; Nayan, Nafarizal [Microelectronic and Nanotechnology-Shamsuddin Research Center (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia (UTHM), 86400 Batu Pahat, Johor D.T. (Malaysia)

2011-03-30T23:59:59.000Z

437

Surfactant-Assisted Growth of CdS Thin Films for Photovoltaic Applications  

SciTech Connect

A common non-ionic surfactant, Triton X-100, was used to modify the chemical bath deposition (CBD) of CdS "buffer" layers on Cu(In,Ga)Se2 (CIGS) thin films. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) data demonstrate that films produced with the surfactant have about the same levels of impurities as films grown without it. For thin, ~130 ..ANG.. CdS layers and relative to devices made without the surfactant, average absolute cell efficiencies were increased from 10.5% to 14.8%, or by a relative 41%. Visual inspection of the CdS depositions reveals one possible mechanism of the surfactant's effects: bubbles that form and adhere to the CIGS surface during the CBD reaction are almost completely eliminated with the addition of the TX-100. Thus, pinholes and thin areas in the CdS layers caused by poor wetting of the substrate surface are sharply reduced, leading to large increases in the open circuit voltage in devices produced with the surfactant.

Perkins, C. L.; Hasoon, F. S.

2005-11-01T23:59:59.000Z

438

Surfactant-Assisted Growth of CdS Thin Films for Photovoltaic Applications  

DOE Green Energy (OSTI)

A common non-ionic surfactant, Triton X-100, was used to modify the chemical bath deposition (CBD) of CdS "buffer" layers on Cu(In,Ga)Se2 (CIGS) thin films. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) data demonstrate that films produced with the surfactant have about the same levels of impurities as films grown without it. For thin, ~130 ..ANG.. CdS layers and relative to devices made without the surfactant, average absolute cell efficiencies were increased from 10.5% to 14.8%, or by a relative 41%. Visual inspection of the CdS depositions reveals one possible mechanism of the surfactant's effects: bubbles that form and adhere to the CIGS surface during the CBD reaction are almost completely eliminated with the addition of the TX-100. Thus, pinholes and thin areas in the CdS layers caused by poor wetting of the substrate surface are sharply reduced, leading to large increases in the open circuit voltage in devices produced with the surfactant.

Perkins, C. L.; Hasoon, F. S.

2005-11-01T23:59:59.000Z

439

Method for producing high quality thin layer films on substrates  

DOE Patents (OSTI)

A method for producing high quality, thin layer films of inorganic compounds upon the surface of a substrate is disclosed. The method involves condensing a mixture of preselected molecular precursors on the surface of a substrate and subsequently inducing the formation of reactive species using high energy photon or charged particle irradiation. The reactive species react with one another to produce a film of the desired compound upon the surface of the substrate. 4 figures.

Strongin, M.; Ruckman, M.; Strongin, D.

1994-04-26T23:59:59.000Z

440

Method for producing high quality thin layer films on substrates  

DOE Patents (OSTI)

A method for producing high quality, thin layer films of inorganic compounds upon the surface of a substrate is disclosed. The method involves condensing a mixture of preselected molecular precursors on the surface of a substrate and subsequently inducing the formation of reactive species using high energy photon or charged particle irradiation. The reactive species react with one another to produce a film of the desired compound upon the surface of the substrate.

Strongin, Myron (Center Moriches, NY); Ruckman, Mark (Middle Island, NY); Strongin, Daniel (Port Jefferson, NY)

1994-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "thin film deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.