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1

Mexico FL GA SC AL MS LA TX AR TN TN  

NLE Websites -- All DOE Office Websites (Extended Search)

2005 Hurricanes on the Natural Gas Industry in the Gulf of Mexico Region Mexico FL GA SC AL MS LA TX AR TN TN Katrina - Cumulative wind > 39 mph Katrina - Cumulative wind > 73 mph...

2

AlGaN/GaN-based power semiconductor switches  

E-Print Network (OSTI)

AlGaN/GaN-based high-electron-mobility transistors (HEMTs) have great potential for their use as high efficiency and high speed power semiconductor switches, thanks to their high breakdown electric field, mobility and ...

Lu, Bin, Ph. D. Massachusetts Institute of Technology

2013-01-01T23:59:59.000Z

3

Effect of dislocations on electron mobility in AlGaN/GaN and AlGaN/AlN/GaN heterostructures  

Science Conference Proceedings (OSTI)

Al{sub x}Ga{sub 1-x}N/GaN (x = 0.06, 0.12, 0.24) and AlGaN/AlN/GaN heterostructures were grown on 6 H-SiC, GaN-on-sapphire, and free-standing GaN, resulting in heterostructures with threading dislocation densities of {approx}2 Multiplication-Sign 10{sup 10}, {approx}5 Multiplication-Sign 10{sup 8}, and {approx}5 Multiplication-Sign 10{sup 7} cm{sup -2}, respectively. All growths were performed under Ga-rich conditions by plasma-assisted molecular beam epitaxy. Dominant scattering mechanisms with variations in threading dislocation density and sheet concentration were indicated through temperature-dependent Hall measurements. The inclusion of an AlN interlayer was also considered. Dislocation scattering contributed to reduced mobility in these heterostructures, especially when sheet concentration was low or when an AlN interlayer was present.

Kaun, Stephen W.; Burke, Peter G.; Kyle, Erin C. H.; Speck, James S. [Materials Department, University of California, Santa Barbara, California 93106 (United States); Wong, Man Hoi; Mishra, Umesh K. [Electrical and Computer Engineering Department, University of California, Santa Barbara, California 93106 (United States)

2012-12-24T23:59:59.000Z

4

GA-AL-SC | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

GA-AL-SC GA-AL-SC GA-AL-SC October 1, 2012 ALA-1-N Wholesale Power Rate Schedule Area: PowerSouth Energy Cooperative System: Georgia-Alabama-South Carolina October 1, 2012 Duke-1-E Wholesale Power Rate Schedule Area: Duke On-System System: Georgia-Alabama-South Carolina October 1, 2012 Duke-2-E Wholesale Power Rate Schedule Area: Central System: Georgia-Alabama-South Carolina October 1, 2012 Duke-3-E Wholesale Power Rate Schedule Area: None System: Georgia-Alabama-South Carolina October 1, 2012 Duke-4-E Wholesale Power Rate Schedule Area: Duke Self-Schedulers System: Georgia-Alabama-South Carolina October 1, 2012 MISS-1-N Wholesale Power Rate Schedule Area: South Mississippi Electric Power Association System: Georgia-Alabama-South Carolina October 1, 2012 Pump-1-A Wholesale Power Rate Schedule

5

Ultraviolet electroabsorption modulator based on AlGaN/GaN multiple quantum wells  

E-Print Network (OSTI)

Ultraviolet electroabsorption modulator based on AlGaN/GaN multiple quantum wells I. Friel, C online 20 June 2005 An ultraviolet electroabsorption modulator based on AlGaN/GaN quantum wells is demonstrated. Enhanced excitonic absorption in the quantum wells at around 3.48 eV was achieved using

Moustakas, Theodore

6

Self-aligned AlGaN/GaN transistors for sub-mm wave applications  

E-Print Network (OSTI)

This thesis describes work done towards realizing self-aligned AlGaN/GaN high electron mobility transistors (HEMTs). Self-aligned transistors are important for improving the frequency of AlGaN/GaN HEMTs by reducing source ...

Saadat, Omair I

2010-01-01T23:59:59.000Z

7

Reactive codoping of GaAlInP compound semiconductors  

DOE Patents (OSTI)

A GaAlInP compound semiconductor and a method of producing a GaAlInP compound semiconductor are provided. The apparatus and method comprises a GaAs crystal substrate in a metal organic vapor deposition reactor. Al, Ga, In vapors are prepared by thermally decomposing organometallic compounds. P vapors are prepared by thermally decomposing phospine gas, group II vapors are prepared by thermally decomposing an organometallic group IIA or IIB compound. Group VIB vapors are prepared by thermally decomposing a gaseous compound of group VIB. The Al, Ga, In, P, group II, and group VIB vapors grow a GaAlInP crystal doped with group IIA or IIB and group VIB elements on the substrate wherein the group IIA or IIB and a group VIB vapors produced a codoped GaAlInP compound semiconductor with a group IIA or IIB element serving as a p-type dopant having low group II atomic diffusion.

Hanna, Mark Cooper (Boulder, CO); Reedy, Robert (Golden, CO)

2008-02-12T23:59:59.000Z

8

Characteristics study of 2DEG transport properties of AlGaN/GaN and AlGaAs/GaAs-based HEMT  

Science Conference Proceedings (OSTI)

Growth of wide bandgap material over narrow bandgap material, results into a two dimensional electron gas (2DEG) at the heterointerface due to the conduction band discontinuity. In this paper the 2DEG transport properties of AlGaN/GaN-based high electron mobility transistor (HEMT) is discussed and its effect on various characteristics such as 2DEG density, C-V characteristics and Sheet resistances for different mole fractions are presented. The obtained results are also compared with AlGaAs/GaAs-based HEMT for the same structural parameter as like AlGaN/GaN-based HEMT. The calculated results of electron sheet concentration as a function of the Al mole fraction are in excellent agreement with some experimental data available in the literature.

Lenka, T. R., E-mail: trlenka@gmail.com; Panda, A. K., E-mail: akpanda62@hotmail.com [National Institute of Science and Technology, Palur Hills (India)

2011-05-15T23:59:59.000Z

9

Effect of buffer structures on AlGaN/GaN high electron mobility transistor reliability  

Science Conference Proceedings (OSTI)

AlGaN/GaN high electron mobility transistors (HEMTs) with three different types of buffer layers, including a GaN/AlGaN composite layer, or 1 or 2 lm GaN thick layers, were fabricated and their reliability compared. The HEMTs with the thick GaN buffer layer showed the lowest critical voltage (Vcri) during off-state drain step-stress, but this was increased by around 50% and 100% for devices with the composite AlGaN/GaN buffer layers or thinner GaN buffers, respectively. The Voff - state for HEMTs with thin GaN and composite buffers were 100 V, however, this degraded to 50 60V for devices with thick GaN buffers due to the difference in peak electric field near the gate edge. A similar trend was observed in the isolation breakdown voltage measurements, with the highest Viso achieved based on thin GaN or composite buffer designs (600 700 V), while a much smaller Viso of 200V was measured on HEMTs with the thick GaN buffer layers. These results demonstrate the strong influence of buffer structure and defect density on AlGaN/GaN HEMT performance and reliability.

Liu, L. [University of Florida, Gainesville; Xi, Y. Y. [University of Florida, Gainesville; Ren, F. [University of Florida; Pearton, S. J. [University of Florida; Laboutin, O. [Kopin Corporation, Taunton, MA; Cao, Yu [Kopin Corporation, Taunton, MA; Johnson, Wayne J. [Kopin Corporation, Taunton, MA; Kravchenko, Ivan I [ORNL

2012-01-01T23:59:59.000Z

10

Radiation Hard AlGaN Detectors and Imager  

Science Conference Proceedings (OSTI)

Radiation hardness of AlGaN photodiodes was tested using a 65 MeV proton beam with a total proton fluence of 3x10{sup 12} protons/cm{sup 2}. AlGaN Deep UV Photodiode have extremely high radiation hardness. These new devices have mission critical applications in high energy density physics (HEDP) and space explorations. These new devices satisfy radiation hardness requirements by NIF. NSTec is developing next generation AlGaN optoelectronics and imagers.

None

2012-05-01T23:59:59.000Z

11

AlGaAsSb/GaSb Distributed Bragg Reflectors Grown by Organometallic Vapor Phase Epitaxy  

SciTech Connect

The first AlGaAsSb/GaSb quarter-wave distributed Bragg reflectors grown by metallic vapor phase epitaxy are reported. The peak reflectance is 96% for a 10-period structure.

C.A. Wang; C.J. Vineis; D.R. Calawa

2002-02-13T23:59:59.000Z

12

Molecular beam epitaxy growth of GaAsBi/GaAs/AlGaAs separate confinement heterostructures  

Science Conference Proceedings (OSTI)

GaAsBi/GaAs/AlGaAs separate confinement heterostructures are grown using an asymmetric temperature profile due to the low optimal growth temperature of GaAsBi; the bottom AlGaAs barrier is grown at 610 Degree-Sign C, while the GaAsBi quantum well and the top AlGaAs barrier are grown at 320 Degree-Sign C. Cross-sectional transmission electron microscopy and room temperature photoluminescence measurements indicate that this approach results in samples with excellent structural and optical properties. The high quality of the low temperature AlGaAs barrier is attributed to the presence of Bi on the surface as indicated by a (1 Multiplication-Sign 3) surface reconstruction persisting throughout the low temperature growth.

Fan Dongsheng; Yu Shuiqing [Department of Electrical Engineering, University of Arkansas, Fayetteville, Arkansas 72701 (United States); Institute for Nanoscience and Engineering, University of Arkansas, Fayetteville, Arkansas 72701 (United States); Zeng Zhaoquan; Hu Xian; Dorogan, Vitaliy G.; Li Chen; Benamara, Mourad; Hawkridge, Michael E.; Mazur, Yuriy I.; Salamo, Gregory J. [Institute for Nanoscience and Engineering, University of Arkansas, Fayetteville, Arkansas 72701 (United States); Johnson, Shane R. [School of Electrical, Computer and Energy Engineering, Arizona State University, Tempe, Arizona 85287-6206 (United States); Wang, Zhiming M. [State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054 (China)

2012-10-29T23:59:59.000Z

13

Pulsed optically detected NMR of single GaAs/AlGaAs quantum wells  

E-Print Network (OSTI)

Pulsed optically detected NMR of single GaAs/AlGaAs quantum wells Marcus Eickhoff* and Dieter Suter, nanometer-sized quantum wells possible with excellent sensitivity and selectivity while avoiding.60.-k; 78.55.Cr; 78.67.De Keywords: ODNMR; Pulsed excitation; Quantum well; GaAs 1. Introduction Nuclear

Suter, Dieter

14

Optical injection and coherent control of a ballistic charge current in GaAsAlGaAs quantum wells  

E-Print Network (OSTI)

Optical injection and coherent control of a ballistic charge current in GaAs�AlGaAs quantum wells of Hache´ et al.,2,3 but in this article we report injection into the plane of GaAs/AlGaAs quantum wells specific to quantum wells. Although we expect the underlying physics of injection and control of currents

Sipe,J. E.

15

, 2004, 46, . 1 GaAs/AlGaAs  

E-Print Network (OSTI)

, S. Rumyantsev, J.-Q. L¨u, M.S. Shur, C.A. Saylor, L.C. Brunel. Appl. Phys. Lett. 80, 18, 3433 (2002. L¨u, R. Gaska, M.S. Shur, F. Simin, X. Hu, M. Asif Khan, C.A. Saylor, L.C. Brunel. J. Appl. Phys. 91, , N. Dyakonova , E. Kaminska , A. Piotrowska , K. Golaszewska , M.S. Shur , 603950 , GES

Levelut, Claire

16

Free carrier accumulation at cubic AlGaN/GaN heterojunctions  

Science Conference Proceedings (OSTI)

Cubic Al{sub 0.3}Ga{sub 0.7}N/GaN heterostructures were grown by plasma-assisted molecular beam epitaxy on 3C-SiC (001) substrates. A profile of the electrostatic potential across the cubic-AlGaN/GaN heterojunction was obtained using electron holography in the transmission electron microscope. The experimental potential profile indicates that the unintentionally doped layers show n-type behavior and accumulation of free electrons at the interface with a density of 5.1 x 10{sup 11}/cm{sup 2}, about one order of magnitude less than in wurtzite AlGaN/GaN junctions. A combination of electron holography and cathodoluminescence measurements yields a conduction-to-valence band offset ratio of 5:1 for the cubic AlGaN/GaN interface, which also promotes the electron accumulation. Band diagram simulations show that the donor states in the AlGaN layer provide the positive charges that to a great extent balance the two-dimensional electron gas.

Wei, Q. Y.; Li, T.; Huang, J. Y.; Ponce, F. A. [Department of Physics, Arizona State University, Tempe, Arizona 85287-1504 (United States); Tschumak, E.; Zado, A.; As, D. J. [Department of Physics, Universitaet Paderborn, D-33098 Paderborn (Germany)

2012-04-02T23:59:59.000Z

17

Schottky-Drain Technology for AlGaN/GaN High-Electron Mobility Transistors  

E-Print Network (OSTI)

In this letter, we demonstrate 27% improvement in the buffer breakdown voltage of AlGaN/GaN high-electron mobility transistors (HEMTs) grown on Si substrate by using a new Schottky-drain contact technology. Schottky-drain ...

Lu, Bin

18

Phonon Knudsen flow in GaAs/AlAs superlattices  

DOE Green Energy (OSTI)

The measured in-plane thermal conductivity, {delta}{sub SL} of GaAs/AlAs superlattices with even moderate layer thicknesses are significantly smaller than the weighted average, {delta}{sub l} = 67 W/Km, of the bulk GaAs and AlAs conductivities. One expects a suppression of the thermal conductivity to that of an actual Al{sub 0.5}Ga{sub 0.5}As alloy when the thickness of the GaAs and AlAs layers approaches that of a single monolayer. However, the observed superlattice thermal conductivity remains suppressed even at layer thickness {approx_gt} 10 nm. The low thermal conductivities, and very high mobilities, make n-doped GaAs/AlAs superlattices attractive possibilities for thermoelectric devices. With Molecular-Beam-Epitaxial grown GaAs/AlAs superlattices one can expect the individual GaAs and AlAs layers to be extremely clean. Defect and/or alloy scattering is limited to be near the heterostructure interfaces. The authors estimate the room-temperature phonon mean-free-path to be 42 (22) nm for the longitudinal (transverse) mode and thus comparable to or smaller than the layer thicknesses. Thus they expect an important phonon scattering at the interfaces. They study this phonon scattering at the superlattice interfaces assuming a Knudsen flow characterized by diffusive scattering. The solid curve in the figure shows the Knudsen-flow theory estimated for the superlattice thermal conductivity which shows a significant reduction when the layer thickness is shorter than the estimated phonon mean free paths.

Hyldgaard, P.; Mahan, G.D. [Oak Ridge National Lab., TN (United States). Solid State Div.]|[Univ. of Tennessee, Knoxville, TN (United States). Dept. of Physics and Astronomy

1995-09-01T23:59:59.000Z

19

Two-dimensional electron gas in AlGaN/GaN heterostructures  

Science Conference Proceedings (OSTI)

The formation of a two-dimensional electron gas (2DEG) system by an AlGaN/GaN heterostructure has been further confirmed by measuring its electrical properties. The effect of persistent photoconductivity (PPC) has been observed and its unique features have been utilized to study the properties of 2DEG formed by the AlGaN/GaN heterointerface. Sharp electronic transitions from the first to the second subbands in the 2DEG channel have been observed by monitoring the 2DEG carrier mobility as a function of carrier concentration through the use of PPC. These results are expected to have significant implications on field-effect transistor and high electron mobility transistor applications based on the GaN system. {copyright} {ital 1997 American Vacuum Society.}

Li, J.Z.; Lin, J.Y.; Jiang, H.X. [Department of Physics, Kansas State University, Manhattan, Kansas 66506-2601 (United States)] [Department of Physics, Kansas State University, Manhattan, Kansas 66506-2601 (United States); Khan, M.A.; Chen, Q. [APA Optics, Inc., Blaine, Minnesota 55449 (United States)] [APA Optics, Inc., Blaine, Minnesota 55449 (United States)

1997-07-01T23:59:59.000Z

20

Charge Profiling of the p-AlGaN Electron Blocking Layer in AlGaInN Light Emitting Diode Structures  

E-Print Network (OSTI)

Charge Profiling of the p-AlGaN Electron Blocking Layer in AlGaInN Light Emitting Diode Structures, U.S.A. ABSTRACT Characterization of operational AlGaInN heterostructure light emitting diodes (LEDs the device lifetime in a non-destructive mode. INTRODUCTION Group ­ III nitride light emitting diodes (LEDs

Wetzel, Christian M.

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


21

NJ WY AK AL CA AR CO CT DE FL GA HI ID KS IL IN IA IA KY LA  

Gasoline and Diesel Fuel Update (EIA)

176, "Annual Report of Natural and Supplemental Gas Supply and Disposition." NJ WY AK AL CA AR CO CT DE FL GA HI ID KS IL IN IA IA KY LA ME MI MA MD MN MS MT MO NE ND OH NV NM NY...

22

Analysis of Schottky gate electron tunneling in polarization induced AlGaN/GaN high electron mobility transistors  

Science Conference Proceedings (OSTI)

( gate=nickel)/(barrier=GaN/Al (y) Ga (1?y) N)/(buffer=GaN)/(substrate=SiC ) polarizationinduced high electron mobility transistors (PI-HEMTs) show promise for ultrahigh power microwave amplification. The polarization fields in these Ga-face

Lester F. Eastman

1999-01-01T23:59:59.000Z

23

AlP/GaP distributed Bragg reflectors  

SciTech Connect

Distributed Bragg reflectors with high reflectivity bands centered at wavelengths from 530 to 690 nm (green to red) based on AlP/GaP quarter-wave stacks are prepared on (001)GaP using gas-source molecular-beam epitaxy. Additionally, the complex refractive index of AlP is measured using spectroscopic ellipsometry within the range of 330-850 nm in order to facilitate an accurate reflector design. Structures consisting of 15 quarter-wave stacks reach a peak reflectance between 95% and 98%, depending on the spectral position of the maximum.

Emberger, Valentin; Hatami, Fariba; Ted Masselink, W. [Department of Physics, Humboldt-Universitaet zu Berlin, Newtonstrasse 15, D-12489 Berlin (Germany); Peters, Sven [Sentech Instruments GmbH, Schwarzschildstr. 2, 12489 Berlin (Germany)

2013-07-15T23:59:59.000Z

24

AlGaAs/GaAs nano-hetero-epitaxy on a patterned GaAs substrate by MBE  

SciTech Connect

An AlGaAs/GaAs resonant tunneling diode (RTD) with submicron size was fabricated on {l_brace}111{r_brace} oblique facets of GaAs with selective MBE. The method is based on the fact that a certain facet structure is formed on a patterned substrate in selective MBE because the growth rate depends strongly on the facet structure. The fabrication of a double-barrier structure was attempted on a {l_brace}111{r_brace}B facet. The current-voltage characteristics of the sample showed negative differential resistance at 77K demonstrating that we have achieved an RTD on a submicron facet.

Nishiwaki, T.; Yamaguchi, M.; Sawaki, N. [Department of Electronics, Nagoya University, Chikusa-ku, Nagoya, 464-8603 (Japan)

2007-04-10T23:59:59.000Z

25

Advanced technologies for improving high frequency performance of AlGaN/GaN high electron mobility transistors  

E-Print Network (OSTI)

In this thesis, we have used a combination of physical analysis, numerical simulation and experimental work to identify and overcome some of the main challenges in AlGaN/GaN high electron mobility transistors (HEMTs) for ...

Chung, Jinwook W. (Jinwook Will)

2008-01-01T23:59:59.000Z

26

Evolution of structural defects associated with electrical degradation in AlGaN/GaN high electron mobility transistors  

E-Print Network (OSTI)

We have investigated the surface morphology of electrically stressed AlGaN/GaN high electron mobility transistors using atomic force microscopy and scanning electron microscopy after removing the gate metallization by ...

Makaram, Prashanth

27

Enhancement-mode AlGaN/GaN HEMTs with high linearity fabricated by hydrogen plasma treatment  

E-Print Network (OSTI)

Enhancement-mode (E-mode) AlGaN/GaN high electron mobility transistors (HEMTs) are highly desirable for power and digital electronic circuits. Several technologies have been demonstrated in the last few years to fabricate ...

Palacios, Tomas

28

AlGaAs diode pumped tunable chromium lasers  

DOE Patents (OSTI)

An all-solid-state laser system is disclosed wherein the laser is pumped in the longwave wing of the pump absorption band. By utilizing a laser material that will accept unusually high dopant concentrations without deleterious effects on the crystal lattice one is able to compensate for the decreased cross section in the wing of the absorption band, and the number of pump sources which can be used with such a material increases correspondingly. In a particular embodiment a chromium doped colquiriite-structure crystal such as Cr:LiSrAlF.sub.6 is the laser material. The invention avoids the problems associated with using AlGaInP diodes by doping the Cr:LiSrAlF.sub.6 heavily to enable efficient pumping in the longwave wing of the absorption band with more practical AlGaAs diodes.

Krupke, William F. (Pleasanton, CA); Payne, Stephen A. (Castro Valley, CA)

1992-01-01T23:59:59.000Z

29

Growth and Fabrication of GaN/AlGaN Heterojunction Bipolar Transistor  

SciTech Connect

A GaN/AlGaN heterojunction bipolar transistor structure with Mg doping in the base and Si Doping in the emitter and collector regions was grown by Metal Organic Chemical Vapor Deposition in c-axis Al(2)O(3). Secondary Ion Mass Spectrometry measurements showed no increase in the O concentration (2-3x10(18) cm(-3)) in the AlGaN emitter and fairly low levels of C (~4-5x10(17) cm (-3)) throughout the structure. Due to the non-ohmic behavior of the base contact at room temperature, the current gain of large area (~90 um diameter) devices was <3. Increasing the device operating temperature led to higher ionization fractions of the mg acceptors in the base, and current gains of ~10 were obtained at 300 degree C.

Abernathy, C.R.; Baca, A.G.; Cao, X.A.; Cho, H.; Dang, G.T.; Donovan, S.M.; Han, J.; Jung, K.B.; Pearton, S.J.; Ren, F.; Shul, R.J.; Willison, C.G.; Wilson, R.G.; Zhang, A.P.; Zhang, L

1999-03-16T23:59:59.000Z

30

MBE growth of high electron mobility 2DEGs in AlGaN/GaN heterostructures controlled by RHEED  

Science Conference Proceedings (OSTI)

We have grown 2DEG AlGaN/GaN heterostructures by molecular beam epitaxy (MBE) with electron mobilities up to 21500 cm{sup 2}V{sup -1}s{sup -1} at 2 K. In-situ RHEED was applied to optimize different aspects of Ga-rich growth. This paper gives a compact overview of the experimental key aspects that significantly affect the low temperature electron mobility in AlGaN/GaN heterostructures. Growth at the transition towards Ga droplet formation produced the best results. A quantitative analysis of the magnetoresistance confirmes scattering at dislocations as the dominant scattering process at low temperature.

Broxtermann, D.; Sivis, M.; Malindretos, J.; Rizzi, A. [IV. physikalisches Institut, Georg-August-Universitaet Goettingen (Germany)

2012-03-15T23:59:59.000Z

31

Evaluation of defects and degradation in GaAs-GaAlAs wafers using transmission cathodoluminescence  

Science Conference Proceedings (OSTI)

A large number of GaAs substrates GaAlAs double-heterostructure (DH) wafers, and high-radiance GaAlAs DH light-emitting diodes (LEDS) were evaluated using transmission cathodoluminescence (TCL). We show that only epitaxial wafers with a high defect density as revealed by TCL readily develop dark line defects (DLDs) with current injection, optical excitation, or electron beam excitation. Furthermore, in agreement with the previous work, the electron-beam-induced DLDs originate at dislocations and their growth requires minority-carrier injection. Based on these results, it is inferred that TCL can serve as a nondestructive screening technique for the selection of materials that produces a high yield of reliable LEDs.

Chin, A.K.; Keramidas, V.G.; Johnston, W.D. Jr.; Mahajan, S.; Roccasecca, D.D.

1980-02-01T23:59:59.000Z

32

Double pulse doped InGaAs/AlGaAs/GaAs pseudomorphic high-electron-mobility transistor heterostructures  

Science Conference Proceedings (OSTI)

Double pulse doped ({delta}-doped) InGaAs/AlGaAs/GaAs pseudomorphic high-electron-mobility transistor (HEMT) heterostructures were grown by molecular-beam epitaxy using a multiwafer technological system. The room-temperature electron mobility was determined by the Hall method as 6550 and 6000 cm{sup 2}/(V s) at sheet electron densities of 3.00 x 10{sup 12} and 3.36 x 10{sup 12} cm{sup -2}, respectively. HEMT heterostructures fabricated in a single process feature high uniformity of structural and electrical characteristics over the entire area of wafers 76.2 mm in diameter and high reproducibility of characteristics from process to process.

Egorov, A. Yu., E-mail: anton@beam.ioffe.ru; Gladyshev, A. G.; Nikitina, E. V.; Denisov, D. V.; Polyakov, N. K.; Pirogov, E. V.; Gorbazevich, A. A. [Russian Academy of Sciences, St. Petersburg Physics and Technology Center for Research and Education (Russian Federation)

2010-07-15T23:59:59.000Z

33

Mn-doped Ga(As,P) and (Al,Ga)As ferromagnetic semiconductors: Electronic structure calculations  

E-Print Network (OSTI)

A remarkable progress towards functional ferromagnetic semiconductor materials for spintronics has been achieved in p-type (Ga,Mn)As. Robust hole-mediated ferromagnetism has, however, been observed also in other III-V hosts such as antimonides, GaP, or (Al,Ga)As, which opens a wide area of possibilities for optimizing the host composition towards higher ferromagnetic Curie temperatures. Here we explore theoretically hole-mediated ferromagnetism and Mn incorporation in Ga(As,P) and (Al,Ga)As ternary hosts. While alloying (Ga,Mn)As with Al has only a small effect on the Curie temperature we predict a sizable enhancement of Curie temperatures in the smaller lattice constant Ga(As,P) hosts. Mn-doped Ga(As,P) is also favorable, as compared to (Al,Ga)As, with respect to the formation of carrier and moment compensating interstitial Mn impurities. In (Ga,Mn) (As,P) we find a marked decrease of the partial concentration of these detrimental impurities with increasing P content.

Masek, J.; Kudrnovsky, J.; Maca, F.; Sinova, Jairo; MacDonald, A. H.; Campion, R. P.; Gallagher, B. L.; Jungwirth, T.

2007-01-01T23:59:59.000Z

34

An inverted AlGaAs/GaAs patterned-Ge tunnel junction cascade concentrator solar cell  

DOE Green Energy (OSTI)

This report describes work to develop inverted-grown Al[sub 0.34]Ga[sub 0.66]As/GaAs cascades. Several significant developments are reported on as follows: (1) The AM1.5 1-sun total-area efficiency of the top Al[sub 0.34]Ga[sub 0.66]As cell for the cascade was improved from 11.3% to 13.2% (NREL measurement [total-area]). (2) The cycled'' organometallic vapor phase epitaxy growth (OMVPE) was studied in detail utilizing a combination of characterization techniques including Hall-data, photoluminescence, and secondary ion mass spectroscopy. (3) A technique called eutectic-metal-bonding (EMB) was developed by strain-free mounting of thin GaAs-AlGaAs films (based on lattice-matched growth on Ge substrates and selective plasma etching of Ge substrates) onto Si carrier substrates. Minority-carrier lifetime in an EMB GaAs double-heterostructure was measured as high as 103 nsec, the highest lifetime report for a freestanding GaAs thin film. (4) A thin-film, inverted-grown GaAs cell with a 1-sun AM1.5 active-area efficiency of 20.3% was obtained. This cell was eutectic-metal-bonded onto Si. (5) A thin-film inverted-grown, Al[sub 0.34]Ga[sub 0.66]As/GaAs cascade with AM1.5 efficiency of 19.9% and 21% at 1-sun and 7-suns, respectively, was obtained. This represents an important milestone in the development of an AlGaAs/GaAs cascade by OMVPE utilizing a tunnel interconnect and demonstrates a proof-of-concept for the inverted-growth approach.

Venkatasubramanian, R. (Research Triangle Inst., Research Triangle Park, NC (United States))

1993-01-01T23:59:59.000Z

35

Fine structure of AlN/AlGaN superlattice grown by pulsed atomic-layer epitaxy for dislocation filtering  

SciTech Connect

We report the detailed structure analysis of our AlN/AlGaN superlattice (SL) grown by pulsed atomic-layer epitaxy (PALE) for dislocation filtering. Due to the nature of PALE, the AlGaN well material itself in the SL was found to be composed actually of an Al{sub x}Ga{sub 1-x}N/Al{sub y}Ga{sub 1-y}N short-period superlattice (SPSL), with the periodicity of 15.5 A ({approx_equal}6 monolayer), determined consistently from high-resolution x-ray diffraction and high-resolution transmission electron microscopy measurements. The SPSL nature of the AlGaN layers is believed to benefit from the AlN/AlGaN SL's coherent growth, which is important in exerting compressive strain for the thick upper n-AlGaN film, which serves to eliminate cracks. Direct evidence is presented which indicates that this SL can dramatically reduce the screw-type threading dislocation density.

Sun, W.H.; Zhang, J.P.; Yang, J.W.; Maruska, H.P.; Khan, M. Asif; Liu, R.; Ponce, F.A. [Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208 (United States); Department of Physics and Astronomy, Arizona State University, Tempe, Arizona 85287 (United States)

2005-11-21T23:59:59.000Z

36

M4, Semipolar AlGaN Buffers for Deep Ultraviolet Diode Lasers  

Science Conference Proceedings (OSTI)

On-axis reciprocal space mapping of the graded AlGaN showed tilt at each interface associated ..... New Concepts and Materials for Solar Power Conversion

37

Structure and Composition Peculiarities of GaN/AlN Multiple ...  

Science Conference Proceedings (OSTI)

Thickness of AlN and GaN layers in MQWs (multiple quantum wells) were ... InAs Quantum Dots by Ballistic Electron Emission Microscopy and Spectroscopy.

38

High Breakdown ( > \\hbox {1500 V} ) AlGaN/GaN HEMTs by Substrate-Transfer Technology  

E-Print Network (OSTI)

In this letter, we present a new technology to increase the breakdown voltage of AlGaN/GaN high-electron-mobility transistors (HEMTs) grown on Si substrates. This new technology is based on the removal of the original Si ...

Lu, Bin

39

Role of nanoscale AlN and InN for the microwave characteristics of AlGaN/(Al,In)N/GaN-based HEMT  

Science Conference Proceedings (OSTI)

A new AlGaN/GaN-based high electron mobility transistor (HEMT) is proposed and its micro-wave characteristics are discussed by introducing a nanoscale AlN or InN layer to study the potential improvement in their high frequency performance. The 2DEG transport mechanism including various sub-band calculations for both (Al,In) N-based HEMTs are also discussed in the paper. Apart from direct current characteristics of the proposed HEMT, various microwave parameters such as transconductance, unit current gain (h{sub 21} = 1) cut-off frequency (f{sub t}), high power-gain frequency (f{sub max}). Masons available/stable gain and masons unilateral gain are also discussed for both devices to understand its suitable deployment in microwave frequency range.

Lenka, T. R., E-mail: trlenka@gmail.com; Panda, A. K., E-mail: akpanda62@hotmail.com [National Institute of Science and Technology (India)

2011-09-15T23:59:59.000Z

40

Plasma chemistries for dry etching GaN, AlN, InGaN and InAlN  

DOE Green Energy (OSTI)

Etch rates up to 7,000 {angstrom}/min. for GaN are obtained in Cl{sub 2}/H{sub 2}/Ar or BCl{sub 3}/Ar ECR discharges at 1--3mTorr and moderate dc biases. Typical rates with HI/H{sub 2} are about a factor of three lower under the same conditions, while CH{sub 4}/H{sub 2} produces maximum rates of only {approximately}2,000 {angstrom}/min. The role of additives such as SF{sub 6}, N{sub 2}, H{sub 2} or Ar to the basic chlorine, bromine, iodine or methane-hydrogen plasma chemistries are discussed. Their effect can be either chemical (in forming volatile products with N) or physical (in breaking bonds or enhancing desorption of the etch products). The nitrides differ from conventional III-V`s in that bond-breaking to allow formation of the etch products is a critical factor. Threshold ion energies for the onset of etching of GaN, InGaN and InAlN are {ge} 75 eV.

Pearton, S.J.; Vartuli, C.B.; Lee, J.W.; Donovan, S.M.; MacKenzie, J.D.; Abernathy, C.R. [Univ. of Florida, Gainesville, FL (United States); Shul, R.J. [Sandia National Labs., Albuquerque, NM (United States); McLane, G.F. [Army Research Lab., Fort Monmouth, NJ (United States); Ren, F. [AT and T Bell Labs., Murray Hill, NJ (United States)

1996-04-01T23:59:59.000Z

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


41

AlGaN/GaN high electron mobility transistors based on InGaN/GaN multi-quantum-well structures with photo-chemical vapor deposition of SiO2 dielectrics  

Science Conference Proceedings (OSTI)

AlGaN/GaN metal-oxide-semiconductor high electron mobility transistor (MOS-HEMT) based on InGaN/GaN multi-quantum-well (MQW) structure has been fabricated with SiO"2 dielectric deposited via photo-chemical vapor deposition (PHCVD) using a deuterium lamp ... Keywords: GaN, HEMT, MQW, Photo-chemical vapor deposition, SiO 2

Kai-Hsuan Lee; Ping-Chuan Chang; Shoou-Jinn Chang

2013-04-01T23:59:59.000Z

42

GaSb/GaP compliant interface for high electron mobility AlSb/InAs heterostructures on (001) GaP  

Science Conference Proceedings (OSTI)

We report on the epitaxial growth of an AlSb/InAs heterostructure on a (001) GaP substrate. We investigate the conditions for the most efficient relaxation of GaSb islands on GaP. In particular, we show that the GaP surface treatment and the growth temperature are crucial for the formation of a two-dimensional periodic array of 90 deg. misfit dislocations at the episubstrate interface. With this relaxation process, an AlSb/InAs heterostructure exhibiting a room temperature mobility of 25 500 cm{sup 2} V{sup -1} s{sup -1} on GaP is demonstrated. This result paves the way to the integration of Sb-based devices on Si substrates through the use of GaP/Si templates.

El Kazzi, S.; Desplanque, L.; Coinon, C.; Wallart, X. [Institut d'Electronique, de Microelectronique, et de Nanotechnologie, UMR-CNRS 8520, BP 60069, 59652 Villeneuve d'Ascq Cedex (France); Wang, Y.; Ruterana, P. [CIMAP UMR 6252 CNRS-ENSICAEN-CEA-UCBN, 6, Boulevard du Marechal Juin, 14050 Caen Cedex (France)

2010-11-08T23:59:59.000Z

43

CC2, Two-Dimensional Electron Gas in In X Al 1-X N/Aln/GaN ...  

Science Conference Proceedings (OSTI)

DD3, A New Approach to Make ZnO-Cu2O Heterojunctions for Solar Cells ... E2, AlGaAs/GaAs/GaN Wafer Fused HBTs with Ar Implanted Extrinsic Collectors.

44

K7, Self-Assembled GaN/AlN Nanowire Superlattices on Si toward ...  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

45

Temperature-Dependence of Exciton Radiative Recombination in (Al,Ga)N/GaN Quantum Wells Grown on a-Plane GaN Substrates  

E-Print Network (OSTI)

5221, 34095 Montpellier, France E-mail: pmc53@cam.ac.uk Received October 12, 2012; accepted November 22, 2012; published online May 20, 2013 This article presents the dynamics of excitons in a-plane (Al,Ga)N/GaN single quantum wells of various...

Corfdir, Pierre; Dussaigne, Amélie; Teisseyre, Henryk; Suski, Tadeusz; Grzegory, Izabella; Lefebvre, Pierre; Giraud, Etienne; Shahmohammadi, Mehran; Phillips, Richard; Ganière, Jean-Daniel; Grandjean, Nicolas; Deveaud, Benoît

46

Excitons in single and double GaAs/AlGaAs/ZnSe/Zn(Cd)MnSe heterovalent quantum wells  

Science Conference Proceedings (OSTI)

Exciton photoluminescence spectra, photoluminescence excitation spectra, and magnetophotoluminescence spectra of single (GaAs/AlGaAs/ZnMnSe) and double (GaAs/AlGaAs/ZnSe/ZnCdMnSe) heterovalent quantum wells formed by molecular beam epitaxy are studied. It is shown that the exciton absorption spectrum of such quantum wells mainly reproduces the resonant exciton spectrum expected for usual quantum wells with similar parameters, while the radiative exciton recombination have substantial distinctions, in particular the additional localization mechanism determined by defects generated by heterovalent interface exists. The nature of these localization centers is not currently clarified; their presence leads to broadening of photoluminescence lines and to an increase in the Stokes shift between the peaks of luminescence and absorption, as well as determining the variation in the magnetic g factor of bound exciton complexes.

Toropov, A. A., E-mail: toropov@beam.ioffe.ru; Kaibyshev, V. Kh.; Terent'ev, Ya. V.; Ivanov, S. V.; Kop'ev, P. S. [Russian Academy of Sciences, Ioffe Physical Technical Institute (Russian Federation)

2011-02-15T23:59:59.000Z

47

SnO2-gated AlGaN/GaN high electron mobility transistors based oxygen sensors  

Science Conference Proceedings (OSTI)

Hydrothermally grown SnO2 was integrated with AlGaN/GaN high electron mobility transistor (HEMT) sensor as the gate electrode for oxygen detection. The crystalline of the SnO2 was improved after annealing at 400 C. The grain growth kinetics of the SnO2 nanomaterials, together with the O2 gas sensing properties and sensing mechanism of the SnO2 gated HEMT sensors were investigated. Detection of 1% oxygen in nitrogen at 100 C was possible. A low operation temperature and low power consumption oxygen sensor can be achieved by combining the SnO2 films with the AlGaN/GaN HEMT structure

Hung, S.T. [Feng Chia University, Taichung, Taiwan; Chung, Chi-Jung [Feng Chia University, Taichung, Taiwan; Chen, Chin Ching [University of Florida, Gainesville; Lo, C. F. [University of Florida; Ren, F. [University of Florida; Pearton, S. J. [University of Florida; Kravchenko, Ivan I [ORNL

2012-01-01T23:59:59.000Z

48

Identification of the Parasitic Chemical Reactions during AlGaN OMVPE  

NLE Websites -- All DOE Office Websites (Extended Search)

Identification of the Parasitic Chemical Reactions during AlGaN OMVPE Identification of the Parasitic Chemical Reactions during AlGaN OMVPE by J. R. Creighton, M. E. Coltrin, and W. G. Breiland Motivation-GaN and AlGaN alloys are ex- tremely important materials with widespread applications for optoelectronics (e.g. solid state lighting) and high power electronics. Or- ganometallic vapor phase epitaxy (OMVPE) is the primary deposition methodology, but it suf- fers from several growth chemistry anomalies. Growth rate and alloy composition are often a sensitive function of temperature and other reac- tor variables. These factors make the AlGaN OMVPE process difficult to control and in- crease the cost of the material. Conventional wisdom has been that the non-ideal OMVPE behavior is due to parasitic "pre-reactions" be-

49

Fabrication of Two-Dimensional Photonic Crystals in AlGaInP/GaInP Membranes by Inductively Coupled Plasma Etching  

E-Print Network (OSTI)

The fabrication process of two-dimensional photonic crystals in an AlGaInP/GaInP multi-quantum-well membrane structure is developed. The process includes high resolution electron-beam lithography, pattern transfer into ...

Chen, A.

50

Thermal carrier emission and nonradiative recombinations in nonpolar (Al,Ga)N/GaN quantum wells grown on bulk GaN  

Science Conference Proceedings (OSTI)

We investigate, via time-resolved photoluminescence, the temperature-dependence of charge carrier recombination mechanisms in nonpolar (Al,Ga)N/GaN single quantum wells (QWs) grown via molecular beam epitaxy on the a-facet of bulk GaN crystals. We study the influence of both QW width and barrier Al content on the dynamics of excitons in the 10-320 K range. We first show that the effective lifetime of QW excitons {tau} increases with temperature, which is evidence that nonradiative mechanisms do not play any significant role in the low-temperature range. The temperature range for increasing {tau} depends on the QW width and Al content in the (Al,Ga)N barriers. For higher temperatures, we observe a reduction in the QW emission lifetime combined with an increase in the decay time for excitons in the barriers, until both exciton populations get fully thermalized. Based on analysis of the ratio between barrier and QW emission intensities, we demonstrate that the main mechanism limiting the radiative efficiency in our set of samples is related to nonradiative recombination in the (Al,Ga)N barriers of charge carriers that have been thermally emitted from the QWs.

Corfdir, P.; Dussaigne, A.; Giraud, E.; Ganiere, J.-D.; Grandjean, N.; Deveaud-Pledran, B. [Institute of Condensed Matter Physics, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland); Teisseyre, H. [Institute of Physics, Polish Academy of Sciences, 02-668 Warsaw (Poland); Institute of High Pressure Physics, Polish Academy of Sciences, 01-142 Warsaw (Poland); Suski, T.; Grzegory, I. [Institute of High Pressure Physics, Polish Academy of Sciences, 01-142 Warsaw (Poland); Lefebvre, P. [Laboratoire Charles Coulomb - UMR5221 - CNRS - Universite Montpellier 2, 34095 Montpellier (France)

2012-02-01T23:59:59.000Z

51

Strain relaxation in GaN/Al{sub x}Ga{sub 1-x}N superlattices grown by plasma-assisted molecular-beam epitaxy  

SciTech Connect

We have investigated the misfit relaxation process in GaN/Al{sub x}Ga{sub 1-x}N (x = 0.1, 0.3, 0.44) superlattices (SL) deposited by plasma-assisted molecular beam epitaxy. The SLs under consideration were designed to achieve intersubband absorption in the mid-infrared spectral range. We have considered the case of growth on GaN (tensile stress) and on AlGaN (compressive stress) buffer layers, both deposited on GaN-on-sapphire templates. Using GaN buffer layers, the SL remains almost pseudomorphic for x = 0.1, 0.3, with edge-type threading dislocation densities below 9 x 10{sup 8} cm{sup -2} to 2 x 10{sup 9} cm{sup -2}. Increasing the Al mole fraction to 0.44, we observe an enhancement of misfit relaxation resulting in dislocation densities above 10{sup 10} cm{sup -2}. In the case of growth on AlGaN, strain relaxation is systematically stronger, with the corresponding increase in the dislocation density. In addition to the average relaxation trend of the SL, in situ measurements indicate a periodic fluctuation of the in-plane lattice parameter, which is explained by the different elastic response of the GaN and AlGaN surfaces to the Ga excess at the growth front. The results are compared with GaN/AlN SLs designed for near-infrared intersubband absorption.

Kotsar, Y.; Bellet-Amalric, E.; Das, A.; Monroy, E. [CEA-Grenoble, INAC/SP2M/NPSC, 17 Rue des Martyrs, 38054 Grenoble cedex 9 (France); Doisneau, B. [SIMaP, Grenoble INP, Domaine Universitaire, BP 75, 38402 Saint Martin d'Heres (France); Sarigiannidou, E. [LMGP, Grenoble INP, 3 Parvis Louis Neel, BP 257, 38016 Grenoble cedex 1 (France)

2011-08-01T23:59:59.000Z

52

AlGaAsSb buffer/barrier on GaAs substrate for InAs channel devices with high electron mobility and practical reliability  

Science Conference Proceedings (OSTI)

Keywords: AlGaAsSb, Hall elements, InAs, Sb, buffer/barriers, deep quantum well, field effect transistors, reliability

S. Miya; S. Muramatsu; N. Kuze; K. Nagase; T. Iwabuchi; A. Ichii; M. Ozaki; I. Shibasaki

1996-03-01T23:59:59.000Z

53

High mobility two-dimensional electron gases in nitride heterostructures with high Al composition AlGaN alloy barriers  

Science Conference Proceedings (OSTI)

We report high-electron mobility nitride heterostructures with >70% Al composition AlGaN alloy barriers grown by molecular beam epitaxy. Direct growth of such AlGaN layers on GaN resulted in hexagonal trenches and a low mobility polarization-induced charge. By applying growth interruption at the heterojunction, the surface morphology improved dramatically and the room temperature two-dimensional electron gas (2DEG) mobility increased by an order of magnitude, exceeding 1300 cm{sup 2}/V s. The 2DEG density was tunable at 0.4-3.7x10{sup 13}/cm{sup 2} by varying the total barrier thickness (t). Surface barrier heights of the heterostructures were extracted and exhibited dependence on t.

Li Guowang; Cao Yu; Xing Huili Grace; Jena, Debdeep [Department of Electrical Engineering, University of Notre Dame, Indiana 46556 (United States)

2010-11-29T23:59:59.000Z

54

L1, Formation of Structural Defects in AlGaN/GaN High Electron ...  

Science Conference Proceedings (OSTI)

Transmission electron microscope (TEM) cross sectional image has shown that electrical degradation is closely related to structural damage in the GaN cap and  ...

55

Suppression of nuclear spin diffusion at a GaAs/AlGaAs interface measured with a single quantum dot nano-probe  

E-Print Network (OSTI)

Nuclear spin polarization dynamics are measured in optically pumped individual GaAs/AlGaAs interface quantum dots by detecting the time-dependence of the Overhauser shift in photoluminescence (PL) spectra. Long nuclear polarization decay times of ~ 1 minute have been found indicating inefficient nuclear spin diffusion from the GaAs dot into the surrounding AlGaAs matrix in externally applied magnetic field. A spin diffusion coefficient two orders lower than that previously found in bulk GaAs is deduced.

A. E. Nikolaenko; E. A. Chekhovich; M. N. Makhonin; I. W. Drouzas; A. B. Vankov; J. Skiba-Szymanska; M. S. Skolnick; P. Senellart; A. Lemaitre; A. I. Tartakovskii

2009-01-15T23:59:59.000Z

56

Metalorganic Vapor-Phase Epitaxial Growth and Characterization of Quaternary AlGaInN  

SciTech Connect

In this letter we report the growth (by MOVPE) and characterization of quaternary AlGaInN. A combination of PL, high-resolution XRD, and RBS characterizations enables us to explore and delineate the contours of equil-emission energy and lattice parameters as functions of the quaternary compositions. The observation of room temperature PL emission as short as 351nm (with 20% Al and 5% In) renders initial evidence that the quaternary could be used to provide confinement for GaInN (and possibly GaN). AlGaInN/GdnN MQW heterostructures have also been grown; both x-ray diffraction and PL measurement suggest the possibility of incorporating this quaternary into optoelectronic devices.

BANAS, MICHAEL ANTHONY; CRAWFORD, MARY H.; FIGIEL, JEFFREY J.; HAN, JUNG; LEE, STEPHEN R.; MYERS JR., SAMUEL M.; PETERSON, GARY D.

1999-09-27T23:59:59.000Z

57

Electroluminescence and Transmission Electron Microscopy Characterization of Reverse-Biased AlGaN/GaN Devices  

Science Conference Proceedings (OSTI)

Reverse-bias stress testing has been applied to a large set of more than 50 AlGaN/GaN high electron mobility transistors, which were fabricated using the same process but with different values of the AlN mole fraction and the AlGaN barrier-layer thickness, as well as different substrates (SiC and sapphire). Two sets of devices having different defect types and densities, related to the different growth conditions and the choice of nucleation layer, were also compared. When subjected to gate drain (or gate-to-drain and source short-circuited) reverse-bias testing, all devices presented the same time-dependent failure mode, consisting of a significant increase in the gate leakage current. This failure mechanism occurred abruptly during step-stress experiments when a certain negative gate voltage, or critical voltage, was exceeded or, during constant voltage tests, at a certain time, defined as time to breakdown. Electroluminescence (EL) microscopy was systematically used to identify localized damaged areas that induced an increase of gate reverse current. This current increase was correlated with the increase of EL intensity, and significant EL emission during tests occurred only when the critical voltage was exceeded. Focused-ion-beam milling produced cross-sectional samples suitable for electron microscopy observation at the sites of failure points previously identified by EL microscopy. In highdefectivity devices, V-defects were identified that were associated with initially high gate leakage current and corresponding to EL spots already present in untreated devices. Conversely, identification of defects induced by reverse-bias testing proved to be extremely difficult, and only nanometer-size cracks or defect chains, extending vertically from the gate edges through the AlGaN/GaN heterojunction, were found. No signs of metal/semiconductor interdiffusion or extended defective areas were visible.

Cullen, David A [ORNL; Smith, David J [Arizona State University; Passaseo, Adriana [Consiglio Nazionale delle Ricerche; Tasco, Vittorianna [Consiglio Nazionale delle Ricerche; Stocco, Antonio [Universita di Padova; Meneghini, Matteo [Universita di Padova; Meneghesso, Gaudenzio [Universita di Padova; Zanoni, Enrico [Universita di Padova

2013-01-01T23:59:59.000Z

58

Electron mobility and drift velocity in selectively doped InAlAs/InGaAs/InAlAs heterostructures  

Science Conference Proceedings (OSTI)

An increase in the electron mobility and drift velocity in high electric fields in quantum wells of selectively doped InAlAs/InGaAs/InAsAs heterostructures is obtained experimentally via controlling the composition of semiconductors forming the interface. The electron mobility at the interface in the In{sub 0.8}Ga{sub 0.2}As/In{sub 0.7}Al{sub 0.3}As metamorphic structure with a high molar fraction of In (0.7-0.8) is as high as 12.3 Multiplication-Sign 10{sup 3} cm{sup 2} V{sup -1} s{sup -1} at room temperature. An increase in the electron mobility by a factor of 1.1-1.4 is attained upon the introduction of thin (1-3 nm) InAs layers into a quantum well of selectively doped In{sub 0.53}Ga{sub 0.47}As/In{sub 0.52}Al{sub 0.48}As heterostructures. A maximal drift velocity attains 2.5 Multiplication-Sign 10{sup 7} cm/s in electric fields of 2-5 kV/cm. The threshold field F{sub th} for the intervalley {Gamma}-L electron transfer (the Gunn effect) in the InGaAs quantum well is higher than in the bulk material by a factor of 2.5-3. The effect of two- to threefold decrease in the threshold field F{sub th} in the InGaAs quantum well is established upon increasing the molar fraction of In in the InAlAs barrier, as well as upon the introduction of thin InAs inserts into the InGaAs quantum well.

Vasil'evskii, I. S., E-mail: pozela@pfi.lt; Galiev, G. B.; Klimov, E. A. [MEPHI National Nuclear Research University (Russian Federation); Pozela, K.; Pozela, J.; Juciene, V.; Suziedelis, A.; Zurauskiene, N.; Kersulis, S.; Stankevic, V. [Center for Physical Sciences and Technology, Semiconductor Physics Institute (Lithuania)

2011-09-15T23:59:59.000Z

59

Dependence on proton energy of degradation of AlGaN/GaN high electron mobility transistors  

Science Conference Proceedings (OSTI)

The effects of proton irradiation energy on dc, small signal, and large signal rf characteristics of AlGaN/GaN high electron mobility transistors (HEMTs) were investigated. AlGaN/GaN HEMTs were irradiated with protons at fixed fluence of 51015/cm2 and energies of 5, 10, and 15 MeV. Both dc and rf characteristics revealed more degradation at lower irradiation energy, with reductions of maximum transconductance of 11%, 22%, and 38%, and decreases in drain saturation current of 10%, 24%, and 46% for HEMTs exposed to 15, 10, and 5MeV protons, respectively. The increase in device degradation with decreasing proton energy is due to the increase in linear energy transfer and corresponding increase in nonionizing energy loss with decreasing proton energy in the active region of the HEMTs. After irradiation, both subthreshold drain leakage current and reverse gate current decreased more than 1 order of magnitude for all samples. The carrier removal rate was in the range 121 336 cm1 over the range of proton energies employed in this study

Liu, L. [University of Florida, Gainesville; Xi, Y. Y. [University of Florida, Gainesville; Wang, Y.l. [University of Florida; Ren, F. [University of Florida; Pearton, S. J. [University of Florida; Kim, H.-Y. [Korea University; Kim, J. [Korea University; Fitch, Robert C [Air Force Research Laboratory, Wright-Patterson AFB, OH; Walker, Dennis E [Air Force Research Laboratory, Wright-Patterson AFB, OH; Chabak, Kelson D [Air Force Research Laboratory, Wright-Patterson AFB, OH; Gillespie, James k [Air Force Research Laboratory, Wright-Patterson AFB, OH; Tetlak, Stephen E [Air Force Research Laboratory, Wright-Patterson AFB, OH; Via, Glen D [Air Force Research Laboratory, Wright-Patterson AFB, OH; Crespo, Antonio [Air Force Research Laboratory, Wright-Patterson AFB, OH; Kravchenko, Ivan I [ORNL

2013-01-01T23:59:59.000Z

60

GaAs/AlGaAs nanostructured composites for free-space and integrated optical devices  

E-Print Network (OSTI)

Fainman, "Influence of chlorine on etched sidewalls inFainman, “Influence of chlorine on etched sidewalls inthe RIBE of GaAs with chlorine (Cl 2 ), ion beam sputtering

Tsai, Chia-Ho

2006-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


61

Optical stability of shape-engineered InAs/InAlGaAs quantum dots  

SciTech Connect

The optical properties of shape-engineered InAs/InAlGaAs quantum dots (SEQDs) were investigated by temperature-dependent and excitation-power-dependent photoluminescence (PL) spectroscopy and compared with those of the conventionally grown InAs QDs (CQDs). The emission wavelength of the InAs/InAlGaAs SEQDs at 240 K was redshifted by 18 nm from that at 15 K, which was relatively smaller than that of the InAs CQDs (97 nm). The PL yield at 240 K was reduced to 1/86 and 1/65 of that measured at 15 K for the InAs CQDs and the InAs/InAlGaAs SEQDs, respectively. The emission wavelength for the InAs CQDs was blueshifted by 76 nm with increasing excitation power from 0.56 to 188 mW, compared to only by 7 nm for the InAs/InAlGaAs SEQDs. These results indicated that the InAs/InAlGaAs SEQDs were optically more stable than the InAs CQDs mainly due to the enhancement of the carrier confinement in the vertical direction and the improvement in the size uniformity.

Yang, Youngsin; Jo, Byounggu; Kim, Jaesu; Lee, Cheul-Ro; Kim, Jin Soo [Division of Advanced Materials Engineering, Research Center of Advanced Materials Development (RCAMD), Chonbuk National University, Jeonju, Chonbuk 561-756 (Korea, Republic of); Oh, Dae Kon [Electronics and Telecommunication Research Institute (ETRI), Daejeon 305-350 (Korea, Republic of); Kim, Jong Su [Advanced Photonics Research Institute, Gwangju Institute of Science and Technology, Gwangju 500-712 (Korea, Republic of); Leem, Jae-Young [School of Nano Engineering, Inje University, Gimhae 621-749 (Korea, Republic of)

2009-03-01T23:59:59.000Z

62

Realization of compressively strained GaN films grown on Si(110) substrates by inserting a thin AlN/GaN superlattice interlayer  

Science Conference Proceedings (OSTI)

We investigate the strain properties of GaN films grown by plasma-assisted molecular beam epitaxy on Si(110) substrates. It is found that the strain of the GaN film can be converted from a tensile to a compressive state simply by inserting a thin AlN/GaN superlattice structure (SLs) within the GaN film. The GaN layers seperated by the SLs can have different strain states, which indicates that the SLs plays a key role in the strain modulation during the growth and the cooling down processes. Using this simple technique, we grow a crack-free GaN film exceeding 2-{mu}m-thick. The realization of the compressively strained GaN film makes it possible to grow thick GaN films without crack generation on Si substrates for optic and electronic device applications.

Shen, X. Q.; Takahashi, T.; Kawashima, H.; Ide, T.; Shimizu, M. [Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Umezono 1-1-1, Central 2, Tsukuba-shi, Ibaraki 305-8568 (Japan)

2012-07-16T23:59:59.000Z

63

Al composition dependence of breakdown voltage in Al{sub x}Ga{sub 1-x}N Schottky rectifiers  

SciTech Connect

Planar geometry, lateral Schottky rectifiers were fabricated on high resistivity Al{sub x}Ga{sub 1-x}N (x=0-0.25) epitaxial layers grown on sapphire substrates. The reverse breakdown voltages of unpassivated devices increased with Al composition, varying from 2.3 kV for GaN to 4.3 kV for Al{sub 0.25}Ga{sub 0.75}N. The reverse current-voltage (I-V) characteristics showed classical Shockley-Read-Hall recombination as the dominant mechanism, with I{proportional_to}V{sup 0.5}. The reverse current density in all diodes was in the range 5-10x10{sup -6} A cm{sup -2} at 2 kV. The use of p{sup +} guard rings was effective in preventing premature edge breakdown and with optimum ring width increased V{sub B} from 2.3 to 3.1 kV in GaN diodes. (c) 2000 American Institute of Physics.

Zhang, A. P. [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States); Dang, G. [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States); Ren, F. [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States); Han, J. [Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)] [Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Polyakov, A. Y. [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation)] [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation); Smirnov, N. B. [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation)] [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation); Govorkov, A. V. [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation)] [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation); Redwing, J. M. [Epitronics, Phoenix, Arizona 85027 (United States)] [Epitronics, Phoenix, Arizona 85027 (United States); Cao, X. A. [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States); Pearton, S. J. [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)

2000-03-27T23:59:59.000Z

64

Optical modulation at around 1550 nm in a InGaAlAs optical waveguide containing a InGaAs/AlAs resonant tunnelling diode  

E-Print Network (OSTI)

We report electro-absorption modulation of light at around 1550 nm in a unipolar InGaAlAs optical waveguide containing a InGaAs/AlAs double-barrier resonant tunneling diode (DB-RTD). The RTD peak-to-valley transition increases the electric field across the waveguide, which shifts the core material absorption band-edge to longer wavelengths via the Franz-Keldysh effect, thus changing the light-guiding characteristics of the waveguide. Low-frequency characterisation of a device shows modulation up to 28 dB at 1565 nm. When dc biased close to the negative differential conductance (NDC) region, the RTD optical waveguide behaves as an electro-absorption modulator integrated with a wide bandwidth electrical amplifier, offering a potential advantage over conventional pn modulators.

Figueiredo, J M L; Stanley, C R; Ironside, C N; McMeekin, S G; Leite, A M P

1999-01-01T23:59:59.000Z

65

ATOMIC ENERGY CO&lbiISSION ms AlAMos. NEW MMICO  

Office of Legacy Management (LM)

ATOMIC ENERGY CO&lbiISSION ATOMIC ENERGY CO&lbiISSION ms AlAMos. NEW MMICO 87544 JUL 5 1973 H. C. Donnelly, Manager Albuquerque Operations UNNEEDED REAL PROPERTY - LOS AL-4MOS AREA OFFICE In our annual review of real property holdings at the Los Alamos Area Office we have identified four individual tracts within the community which are unneeded. An envi~konmental radioactivity survey has been conducted on each of the areas and no radiation or radiocontamination observations were encountered which are of radiological or environmental concern. Exhibit "A" contains detailed results of the survey of each of the four tracts. We recommend that approval be obtained to dispose of the property as excess through the-General Services Administration channel. The follow'

66

An inverted AlGaAs/GaAs patterned-Ge tunnel junction cascade concentrator solar cell. Final subcontract report, 1 January 1991--31 August 1992  

DOE Green Energy (OSTI)

This report describes work to develop inverted-grown Al{sub 0.34}Ga{sub 0.66}As/GaAs cascades. Several significant developments are reported on as follows: (1) The AM1.5 1-sun total-area efficiency of the top Al{sub 0.34}Ga{sub 0.66}As cell for the cascade was improved from 11.3% to 13.2% (NREL measurement [total-area]). (2) The ``cycled`` organometallic vapor phase epitaxy growth (OMVPE) was studied in detail utilizing a combination of characterization techniques including Hall-data, photoluminescence, and secondary ion mass spectroscopy. (3) A technique called eutectic-metal-bonding (EMB) was developed by strain-free mounting of thin GaAs-AlGaAs films (based on lattice-matched growth on Ge substrates and selective plasma etching of Ge substrates) onto Si carrier substrates. Minority-carrier lifetime in an EMB GaAs double-heterostructure was measured as high as 103 nsec, the highest lifetime report for a freestanding GaAs thin film. (4) A thin-film, inverted-grown GaAs cell with a 1-sun AM1.5 active-area efficiency of 20.3% was obtained. This cell was eutectic-metal-bonded onto Si. (5) A thin-film inverted-grown, Al{sub 0.34}Ga{sub 0.66}As/GaAs cascade with AM1.5 efficiency of 19.9% and 21% at 1-sun and 7-suns, respectively, was obtained. This represents an important milestone in the development of an AlGaAs/GaAs cascade by OMVPE utilizing a tunnel interconnect and demonstrates a proof-of-concept for the inverted-growth approach.

Venkatasubramanian, R. [Research Triangle Inst., Research Triangle Park, NC (United States)

1993-01-01T23:59:59.000Z

67

THz laser based on quasi-periodic AlGaAs superlattices  

SciTech Connect

The use of quasi-periodic AlGaAs superlattices as an active element of a quantum cascade laser of terahertz range is proposed and theoretically investigated. A multi-colour emission, having from three to six peaks of optical gain, is found in Fibonacci, Thue-Morse, and figurate superlattices in electric fields of intensity F = 11 - 13 kV cm{sup -1} in the frequency range f = 2 - 4 THz. The peaks depend linearly on the electric field, retain the height of 20 cm{sup -1}, and strongly depend on the thickness of the AlGaAs-layers. (lasers)

Malyshev, K V [N.E. Bauman Moscow State Technical University, Moscow (Russian Federation)

2013-06-30T23:59:59.000Z

68

Ultra-shallow quantum dots in an undoped GaAs/AlGaAs two-dimensional electron gas  

SciTech Connect

We report quantum dots fabricated on very shallow 2-dimensional electron gases, only 30 nm below the surface, in undoped GaAs/AlGaAs heterostructures grown by molecular beam epitaxy. Due to the absence of dopants, an improvement of more than one order of magnitude in mobility (at 2 Multiplication-Sign 10{sup 11} cm{sup -2}) with respect to doped heterostructures with similar depths is observed. These undoped wafers can easily be gated with surface metallic gates patterned by e-beam lithography, as demonstrated here from single-level transport through a quantum dot showing large charging energies (up to 1.75 meV) and excited state energies (up to 0.5 meV).

Mak, W. Y.; Sfigakis, F.; Beere, H. E.; Farrer, I.; Griffiths, J. P.; Jones, G. A. C.; Ritchie, D. A. [Cavendish Laboratory, University of Cambridge, Cambridge (United Kingdom)] [Cavendish Laboratory, University of Cambridge, Cambridge (United Kingdom); Das Gupta, K. [Cavendish Laboratory, University of Cambridge, Cambridge (United Kingdom) [Cavendish Laboratory, University of Cambridge, Cambridge (United Kingdom); Department of Physics, Indian Institute of Technology Bombay, Mumbai 400076 (India); Klochan, O.; Hamilton, A. R. [School of Physics, University of New South Wales, Sydney (Australia)] [School of Physics, University of New South Wales, Sydney (Australia)

2013-03-11T23:59:59.000Z

69

Impact of proton irradiation on dc performance of AlGaN/GaN high electron mobility transistors  

Science Conference Proceedings (OSTI)

The effects of proton irradiation dose on dc characteristics and the reliability of AlGaN/GaN high electron mobility transistors (HEMTs) were investigated. The HEMTs were irradiated with protons at a fixed energy of 5 MeV and doses ranging from 109 to 2 1014 cm-2. For the dc characteristics, there was only minimal degradation of saturation drain current (IDSS), transconductance (gm), electron mobility and sheet carrier concentration at doses below 2 1013 cm-2, while the reduction of these parameters were 15%, 9%, 41% and 16.6%, respectively, at a dose of 2 1014 cm-2. At this same dose condition, increases of 37% in drain breakdown voltage (VBR) and of 45% in critical voltage (Vcri) were observed. The improvement of device reliability was attributed to the modification of the depletion region due to the introduction of a higher density of defects after irradiation at a higher dose.

Liu, L. [University of Florida, Gainesville; Cuervo, C.V. [University of Florida, Gainesville; Xi, Y. Y. [University of Florida, Gainesville; Ren, F. [University of Florida; Pearton, S. J. [University of Florida; Kim, H.-Y. [Korea University; Kim, J. [Korea University; Kravchenko, Ivan I [ORNL

2013-01-01T23:59:59.000Z

70

Harmonic Responses in 2DEG AlGaAs/GaAs HEMT Devices Due to Plasma Wave Interaction  

Science Conference Proceedings (OSTI)

Plasma waves are oscillations of electron density in time and space, and in deep submicron field effect transistors, typical plasma frequencies, omega{sub p}, lie in the terahertz range and do not involve any quantum transitions. Hence, using plasma wave excitation for detection and/or generation of THz oscillations is a very promising approach. In this paper, the investigation of plasma wave interaction between the plasma waves propagating in a short-channel High-Electron-Mobility Transistor (HEMT) and the radiated electromagnetic waves was carried out. Experimentally, we have demonstrated the detection of the terahertz (THz) radiation by an AlGaAs/GaAs HEMT up to third harmonic at room temperature and their resonant responses show very good agreement with the calculated results.

Hashim, A. M.; Alias, Q. I. [Faculty of Electrical Engineering, Universiti Teknologi Malaysia, 81310 Skudai, Johor (Malaysia); Kasai, S.; Hasegawa, H. [Research Center for Integrated Quantum Electronics, Hokkaido University North 12 West 8, Sapporo 060-8628 (Japan)

2010-03-11T23:59:59.000Z

71

Temperature dependence and current transport mechanisms in Al{sub x}Ga{sub 1-x}N Schottky rectifiers  

SciTech Connect

GaN and Al{sub 0.25}Ga{sub 0.75}N lateral Schottky rectifiers were fabricated either with (GaN) or without (AlGaN) edge termination. The reverse breakdown voltage V{sub B} (3.1 kV for GaN; 4.3 kV for AlGaN) displayed a negative temperature coefficient of -6.0{+-}0.4 V K{sup -1} for both types of rectifiers. The reverse current originated from contact periphery leakage at moderate bias, while the forward turn-on voltage at a current density of 100 A cm-2 was {approx}5 V for GaN and {approx}7.5 V for AlGaN. The on-state resistances, R{sub ON}, were 50 m{omega} cm2 for GaN and 75 m{omega} cm2 for AlGaN, producing figures-of-merit (V{sub RB}){sup 2}/R{sub ON} of 192 and 246 MW cm-2, respectively. The activation energy of the reverse leakage was 0.13 eV at moderate bias. (c) 2000 American Institute of Physics.

Zhang, A. P. [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States); Dang, G. [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States); Ren, F. [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States); Han, J. [Sandia National Laboratories, Albuquerque, New Mexico 87195 (United States)] [Sandia National Laboratories, Albuquerque, New Mexico 87195 (United States); Polyakov, A. Y. [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation)] [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation); Smirnov, N. B. [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation)] [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation); Govorkov, A. V. [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation)] [Institute of Rare Metals, Moscow 109017, Russia (Russian Federation); Redwing, J. M. [Epitronics, Phoenix, Arizona 85027 (United States)] [Epitronics, Phoenix, Arizona 85027 (United States); Cho, H. [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States); Pearton, S. J. [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)] [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)

2000-06-19T23:59:59.000Z

72

Two-color picosecond experiments on anti-Stokes photoluminescence in GaAs/AlGaAs asymmetric double quantum wells  

E-Print Network (OSTI)

quantum wells S. C. Hohng and D. S. Kima) Department of Physics and Condensed Matter Research Institute in GaAs/AlGaAs asymmetric double quantum wells. Direct evidence for forbidden absorption is shown heterojunctions and asymmetric double quan- tum wells was found and its origin is still being hotly de- bated

Hohng, Sung Chul

73

Method of extracting thermally stable optical signals from a GaAlAs LED source  

SciTech Connect

A self-compensating scheme is described that eliminates the need for temperature control devices employed in many LED-based optical test and measurement instruments to ensure optical signal stability. Thermal behavior of GaAlAs LED sources is exploited to provide an optical wavelength band signal with 0.1%/C power level stability.

Murtaza, G.; Senior, J.M. [Manchester Metropolitan Univ. (United Kingdom). Faculty of Science and Engineering

1995-05-01T23:59:59.000Z

74

Relaxation and critical strain for maximum In incorporation in AlInGaN on GaN grown by metal organic vapour phase epitaxy  

Science Conference Proceedings (OSTI)

Quaternary AlInGaN layers were grown on conventional GaN buffer layers on sapphire by metal organic vapour phase epitaxy at different surface temperatures and different reactor pressures with constant precursor flow conditions. A wide range in compositions within 30-62% Al, 5-29% In, and 23-53% Ga was covered, which leads to different strain states from high tensile to high compressive. From high-resolution x-ray diffraction and Rutherford backscattering spectrometry, we determined the compositions, strain states, and crystal quality of the AlInGaN layers. Atomic force microscopy measurements were performed to characterize the surface morphology. A critical strain value for maximum In incorporation near the AlInGaN/GaN interface is presented. For compressively strained layers, In incorporation is limited at the interface as residual strain cannot exceed an empirical critical value of about 1.1%. Relaxation occurs at about 15 nm thickness accompanied by strong In pulling. Tensile strained layers can be grown pseudomorphically up to 70 nm at a strain state of 0.96%. A model for relaxation in compressively strained AlInGaN with virtual discrete sub-layers, which illustrates the gradually changing lattice constant during stress reduction is presented.

Reuters, Benjamin; Finken, M.; Wille, A.; Kalisch, H.; Vescan, A. [RWTH Aachen University, GaN Device Technology, Sommerfeldstrasse 24, 52074 Aachen (Germany); Juelich Aachen Research Alliance, JARA-FIT, Wilhelm-Johnen-Strasse, 52428 Juelich (Germany); Hollaender, B. [Juelich Aachen Research Alliance, JARA-FIT, Wilhelm-Johnen-Strasse, 52428 Juelich (Germany); Forschungszentrum Juelich GmbH, PGI9-IT, 52425 Juelich (Germany); Heuken, M. [RWTH Aachen University, GaN Device Technology, Sommerfeldstrasse 24, 52074 Aachen (Germany); AIXTRON SE, Kaiserstr. 98, 52134 Herzogenrath (Germany)

2012-11-01T23:59:59.000Z

75

L7, Reduced Self-Heating in AlGaN/GaN HEMTs Using ...  

Science Conference Proceedings (OSTI)

Conference Tools for 2010 Electronic Materials Conference ... Electr. Dev., vol. 48, no. 3, pp. 465, 2001. [2] H. I. Fujishiro et al., Phys. Stat. Sol. (c) 2, no.

76

Effect of Mg ionization efficiency on performance of Npn AlGaN/GaN heterojunction bipolar transistors  

SciTech Connect

A drift-diffusion transport model has been used to examine the performance capabilities of AlGaN/GaN Npn heterojunction bipolar transistors (HBTs). The Gummel plot from the first GaN-based HBT structure recently demonstrated is adjusted with simulation by using experimental mobility and lifetime reported in the literature. Numerical results have been explored to study the effect of the p-type Mg doping and its incomplete ionization in the base. The high base resistance induced by the deep acceptor level is found to be the cause of limiting current gain values. Increasing the operating temperature of the device activates more carriers in the base. An improvement of the simulated current gain by a factor of 2 to 4 between 25 and 300 C agrees well with the reported experimental results. A preliminary analysis of high frequency characteristics indicates substantial progress of predicted rf performances by operating the device at higher temperature due to a reduced extrinsic base resistivity.

MONIER,C.; PEARTON,S.J.; CHANG,PING-CHIH; BACA,ALBERT G.

2000-03-10T23:59:59.000Z

77

Pulsed atomic layer epitaxy of quaternary AlInGaN layers  

Science Conference Proceedings (OSTI)

In this letter, we report on a material deposition scheme for quaternary Al{sub x}In{sub y}Ga{sub 1-x--y}N layers using a pulsed atomic layer epitaxy (PALE) technique. The PALE approach allows accurate control of the quaternary layer composition and thickness by simply changing the number of aluminum, indium, and gallium pulses in a unit cell and the number of unit cell repeats. Using PALE, AlInGaN layers with Al mole fractions in excess of 40% and strong room-temperature photoluminescence peaks at 280 nm can easily be grown even at temperatures lower than 800{sup o}C. {copyright} 2001 American Institute of Physics.

Zhang, J.; Kuokstis, E.; Fareed, Q.; Wang, H.; Yang, J.; Simin, G.; Asif Khan, M.; Gaska, R.; Shur, M.

2001-08-13T23:59:59.000Z

78

Gate-Recessed InAlN/GaN HEMTs on SiC Substrate With Al[subscript 2]O[subscript 3] Passivation  

E-Print Network (OSTI)

We studied submicrometer (L[subscript G] = 0.15-0.25 à ¿m) gate-recessed InAlN/AlN/GaN high-electron mobility transistors (HEMTs) on SiC substrates with 25-nm Al[subscript 2]O[subscript 3] passivation. The combination of ...

Guo, Shiping

79

Electron and hole gas in modulation-doped GaAs/Al{sub 1-x}Ga{sub x}As radial heterojunctions  

Science Conference Proceedings (OSTI)

We perform self-consistent Schroedinger-Poisson calculations with exchange and correlation corrections to determine the electron and hole gas in a radial heterojunction formed in a GaAs/AlGaAs core-multi-shell nanowire, which is either n- or p-doped. We show that the electron and hole gases can be tuned to different localizations and symmetries inside the core as a function of the doping density/gate potential. Contrary to planar heterojunctions, conduction electrons do not form a uniform 2D electron gas (2DEG) localized at the GaAs/AlGaAs interface, but rather show a transition between an isotropic, cylindrical distribution deep in the GaAs core (low doping) and a set of six tunnel-coupled quasi-1D channels at the edges of the interface (high doping). Holes, on the other hand, are much more localized at the GaAs/AlGaAs interface. At low doping, they present an additional localization pattern with six separated 2DEGs strips. The field generated by a back-gate may easily deform the electron or hole gas, breaking the sixfold symmetry. Single 2DEGs at one interface or multiple quasi-1D channels are shown to form as a function of voltage intensity, polarity, and carrier type.

Bertoni, Andrea; Royo, Miquel; Mahawish, Farah; Goldoni, Guido [CNR-NANO S3, Istituto Nanoscienze, Via Campi 213/a, 41125 Modena (Italy); Department of Physics, University of Modena and Reggio Emilia and CNR-NANO S3, Istituto Nanoscienze, Via Campi 213/a, 41125 Modena (Italy)

2011-11-15T23:59:59.000Z

80

Mid-infrared InAs/AlGaSb superlattice quantum-cascade lasers  

SciTech Connect

We report on the demonstration of mid-infrared InAs/AlGaSb superlattice quantum-cascade lasers operating at 10 {mu}m. The laser structures are grown on n-InAs (100) substrate by solid-source molecular-beam epitaxy. An InAs/AlGaSb chirped superlattice structure providing a large oscillator strength and fast carrier depopulation is employed as the active part. The observed minimum threshold current density at 80 K is 0.7 kA/cm{sup 2}, and the maximum operation temperature in pulse mode is 270 K. The waveguide loss of an InAs plasmon waveguide is estimated, and the factors that determine the operation temperature are discussed.

Ohtani, K.; Fujita, K.; Ohno, H. [Laboratory for Nanoelectronics and Semiconductor Spintronics, Research Institute of Electrical Communication, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai (Japan)

2005-11-21T23:59:59.000Z

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
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81

Transmission electron microscopy characterization of electrically stressed AlGaN/GaN high electron mobility transistor devices  

Science Conference Proceedings (OSTI)

A set of AlGaN/GaN high electron mobility transistor devices has been investigated using step-stress testing, and representative samples of undegraded, source-side-degraded, and drain-side-degraded devices were examined using electron microscopy and microanalysis. An unstressed reference sample was also examined. All tested devices and their corresponding transmission electron microscopy samples originated from the same wafer and thus received nominally identical processing. Step-stressing was performed on each device and the corresponding current voltage characteristics were generated. Degradation in electrical performance, specifically greatly increased gate leakage current, was shown to be correlated with the presence of crystal defects near the gate edges. However, the drain-side-degraded device showed a surface pit on the source side, and another region of the same device showed no evidence of damage. Moreover, significant metal diffusion into the barrier layer from the gate contacts was also observed, as well as thin amorphous oxide layers below the gate metal contacts, even in the unstressed sample. Overall, these observations emphasize that gate-edge defects provide only a partial explanation for device failure.

Johnson, Michael [Arizona State University; Cullen, David A [ORNL; Liu, Lu [University of Florida; Kang, Tsung Sheng [University of Florida, Gainesville; Ren, F. [University of Florida; Chang, C. Y. [University of Florida; Pearton, S. J. [University of Florida; Jang, Soohwan [University of Florida, Gainesville; Johnson, Wayne J. [Kopin Corporation, Taunton, MA; Smith, David J [Arizona State University

2012-01-01T23:59:59.000Z

82

Power Conversion Efficiency of AlGaAs/GaAs Schottky Diode for Low-Power On-Chip Rectenna Device Application  

Science Conference Proceedings (OSTI)

A Schottky diode has been designed and fabricated on n-AlGaAs/GaAs high-electron-mobility-transistor (HEMT) structure. Current-voltage (I-V) measurements show good device rectification with a Schottky barrier height of 0.4349 eV for Ni/Au metallization. The differences of Schottky barrier height from theoretical value are due to the fabrication process and smaller contact area. The RF signals up to 1 GHz are well rectified by the fabricated Schottky diodes and stable DC output voltage is obtained. Power conversion efficiency up to 50% is obtained at 1 GHz with series connection between diode and load. The fabricated the n-AlGaAs/GaAs Schottky diode provide conduit for breakthrough designs for ultra-low power on-chip rectenna device technology to be integrated in nanosystems.

Mustafa, Farahiyah; Hashim, Abdul Manaf; Rahman, Shaharin Fadzli Abd [Material Innovations and Nanoelectronics Research Group, Faculty of Electrical Engineering, Universiti Teknologi Malaysia, 81310 Skudai (Malaysia); Ibnu Sina Institute for Fundamental Science Studies, Universiti Teknologi Malaysia, 81310 Skudai Johor Malaysia (Malaysia); Osman, Mohd Nizam [Telekom Research and Development, TM Innovation Centre, 63000 Cyberjaya (Malaysia)

2011-05-25T23:59:59.000Z

83

Aluminum nitride transitional layer for reducing dislocation density and cracking of AlGaN epitaxial films  

DOE Patents (OSTI)

A denticulated Group III nitride structure that is useful for growing Al.sub.xGa.sub.1-xN to greater thicknesses without cracking and with a greatly reduced threading dislocation (TD) density.

Allerman, Andrew A.; Crawford, Mary H.; Lee, Stephen R.

2013-01-08T23:59:59.000Z

84

Final report on LDRD project : outstanding challenges for AlGaInN MOCVD.  

Science Conference Proceedings (OSTI)

The AlGaInN material system is used for virtually all advanced solid state lighting and short wavelength optoelectronic devices. Although metal-organic chemical vapor deposition (MOCVD) has proven to be the workhorse deposition technique, several outstanding scientific and technical challenges remain, which hinder progress and keep RD&A costs high. The three most significant MOCVD challenges are: (1) Accurate temperature measurement; (2) Reliable and reproducible p-doping (Mg); and (3) Low dislocation density GaN material. To address challenge (1) we designed and tested (on reactor mockup) a multiwafer, dual wavelength, emissivity-correcting pyrometer (ECP) for AlGaInN MOCVD. This system simultaneously measures the reflectance (at 405 and 550 nm) and emissivity-corrected temperature for each individual wafer, with the platen signal entirely rejected. To address challenge (2) we measured the MgCp{sub 2} + NH{sub 3} adduct condensation phase diagram from 65-115 C, at typical MOCVD concentrations. Results indicate that it requires temperatures of 80-100 C in order to prevent MgCp{sub 2} + NH{sub 3} adduct condensation. Modification and testing of our research reactor will not be complete until FY2005. A new commercial Veeco reactor was installed in early FY2004, and after qualification growth experiments were conducted to improve the GaN quality using a delayed recovery technique, which addresses challenge (3). Using a delayed recovery technique, the dislocation densities determined from x-ray diffraction were reduced from 2 x 10{sup 9} cm{sup -2} to 4 x 10{sup 8} cm{sup -2}. We have also developed a model to simulate reflectance waveforms for GaN growth on sapphire.

Mitchell, Christine Charlotte; Follstaedt, David Martin; Russell, Michael J.; Cross, Karen Charlene; Wang, George T.; Creighton, James Randall; Allerman, Andrew Alan; Koleske, Daniel David; Lee, Stephen Roger; Coltrin, Michael Elliott

2005-03-01T23:59:59.000Z

85

Thermal stability of the deep ultraviolet emission from AlGaN/AlN Stranski-Krastanov quantum dots  

Science Conference Proceedings (OSTI)

We report on the structural and optical properties of AlGaN/AlN quantum dot (QD) superlattices synthesized by plasma-assisted molecular-beam epitaxy. Modifying the composition and geometry of the QDs, the peak emission wavelength can be shifted from 320 nm to 235 nm while keeping the internal quantum efficiency larger than 30%. The efficient carrier confinement is confirmed by the stability of the photoluminescence (PL) intensity and decay time, from low temperature up to 100 K. Above this threshold, the PL intensity decreases and the radiative lifetime increases due to carrier thermalization. We also identified the intraband electronic transition between the ground level of the conduction band and the first excited state confined along the growth axis (s-p{sub z}).

Himwas, C.; Songmuang, R.; Le Si Dang [CEA-CNRS Group 'Nanophysique et Semiconducteurs,' Institut Neel-CNRS, 25 rue des Martyrs, 38042 Grenoble Cedex 9 (France); Bleuse, J.; Monroy, E. [CEA-CNRS Group 'Nanophysique et Semiconducteurs,' INAC-SP2M, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Rapenne, L.; Sarigiannidou, E. [INP-Grenoble/Minatec, 3 parvis Louis Neel BP257, 38016 Grenoble (France)

2012-12-10T23:59:59.000Z

86

Time-resolved resonance and linewidth of an ultrafast switched GaAs/AlAs microcavity  

E-Print Network (OSTI)

We explore a planar GaAs/AlAs photonic microcavity using pump-probe spectroscopy. Free carriers are excited in the GaAs with short pump pulses. The time-resolved reflectivity is spectrally resolved short probe pulses. We show experimentally that the cavity resonance and its width depend on the dynamic refractive index of both the lambda-slab and the lambda/4 GaAs mirrors. We clearly observe a double exponential relaxation of both the the cavity resonance and its width, which is due to the different recombination timescales in the lambda-slab and the mirrors. In particular, the relaxation time due to the GaAs mirrors approaches the photon storage time of the cavity, a regime for which nonlinear effects have been predicted. The strongly non-single exponential behavior of the resonance and the width is in excellent agreement to a transfer-matrix model taking into account two recombination times. The change in width leads to a change in reflectivity modulation depth. The model predicts an optimal cavity Q for any...

Harding, Philip J; Hartsuiker, Alex; Nowicki-Bringuier, Yoanna-Reine; Gerard, Jean-Michel; Vos, Willem L

2009-01-01T23:59:59.000Z

87

Atomic-layer-deposited Al2O3 and HfO2 on GaN: A comparative study on interfaces and electrical characteristics  

Science Conference Proceedings (OSTI)

Al"2O"3, HfO"2, and composite HfO"2/Al"2O"3 films were deposited on n-type GaN using atomic layer deposition (ALD). The interfacial layer of GaON and HfON was observed between HfO"2 and GaN, whereas the absence of an interfacial layer at Al"2O"3/GaN ... Keywords: Al2O3, Atomic-layer-deposition (ALD), GaN, HfO2, High k dielectric, MOS

Y. C. Chang; M. L. Huang; Y. H. Chang; Y. J. Lee; H. C. Chiu; J. Kwo; M. Hong

2011-07-01T23:59:59.000Z

88

Scattering and electron mobility in combination-doped HFET-structures AlGaAs/InGaAs/AlGaAs with high electron density  

Science Conference Proceedings (OSTI)

Molecular-beam epitaxy is used for growing structures differing in doping technique and doping level and having a high two-dimensional-electron concentration n{sub s} in the quantum well. The effect of doping combining uniform and {delta} doping on the electron-transport properties of heterostructures is investigated. A new type of structure with a two-sided silicon {delta} doping of GaAs transition layers located on the quantum-well boundaries is proposed. The largest value of electron mobility {mu}{sub H} = 1520 cm{sup 2}/(V s) is obtained simultaneously with a high electron density n{sub s} = 1.37 Multiplication-Sign 10{sup 13} cm{sup -2} at 300 K with such a doping. It is associated with decreasing electron scattering by an ionized impurity, which is confirmed by the carried out calculations.

Khabibullin, R. A., E-mail: khabibullin_r@mail.ru; Vasil'evskii, I. S. [MEPHI National Research Nuclear University (Russian Federation); Galiev, G. B.; Klimov, E. A. [Russian Academy of Sciences, Institute of Ultrahigh-Frequency Semiconductor Electronics (Russian Federation); Ponomarev, D. S. [MEPHI National Research Nuclear University (Russian Federation); Lunin, R. A.; Kulbachinskii, V. A. [Moscow State University (Russian Federation)

2011-10-15T23:59:59.000Z

89

NJ WY AK AL CA AR CO CT DE FL GA HI ID KS IL IN IA IA KY LA  

Gasoline and Diesel Fuel Update (EIA)

0.00-1.99 0.00-1.99 2.00-2.99 3.00-3.99 4.00-4.99 5.00-5.99 6.00-6.99 7.00+ NJ WY AK AL CA AR CO CT DE FL GA HI ID KS IL IN IA IA KY LA ME MI MA MD MN MS MT MO NE ND OH NV NM NY NH NC OK OR PA RI SC SD TN TX UT VT WA WV WI AZ VA DC 0.00-1.99 2.00-2.99 3.00-3.99 4.00-4.99 5.00-5.99 6.00-6.99 7.00+ 18. Average Price of Natural Gas Delivered to U.S. Onsystem Industrial Consumers, 1996 (Dollars per Thousand Cubic Feet) Figure 19. Average Price of Natural Gas Delivered to U.S. Electric Utilities, 1996 (Dollars per Thousand Cubic Feet) Figure Sources: Federal Energy Regulatory Commission (FERC), Form FERC-423, "Monthly Report of Cost and Quality of Fuels for Electric Plants," and Energy Information Administration (EIA), Form EIA-176, "Annual Report of Natural and Supplemental Gas Supply and Disposition." Note: In 1996, consumption of natural gas for agricultural use

90

Polarization-balanced design of AlN/GaN heterostructures: Application to double-barrier structures  

E-Print Network (OSTI)

Inversion- and depletion- regions generally form at the interfaces between doped leads (cladding layers) and the active region in wurtzite c-plane AlN/GaN heterostructures. The band bending in the depletion region can seriously impede perpendicular electronic transport. To counter the formation of these regions, we consider polarization-balanced designs of AlN/GaN heterostructures based on matching the applied bias to the internal voltage drop arising from spontaneous and piezeolectric fields. To retain freedom of design we use alloyed Al$_{\\tilde{x}}$Ga$_{1-\\tilde{x}}$N leads. Use of pure GaN leads requires huge voltage drops which severely restricts design. The alloy concentration $\\tilde{x}$ tunes the internal voltage drop over the structure. For short active regions comprised of AlN and GaN layers, we derive a simple relation between the applied bias, average alloy composition of the active region, and the alloy concentration of the leads. We study polarization-balanced designs for AlN barriers structures...

Berland, Kristian; Hyldgaard, Per

2011-01-01T23:59:59.000Z

91

Theoretical And Experimental Studies Of The Effects Of Rapid Thermal Annealing In GaAs/AlGaAs Quantum Dots Grown By Droplet Epitaxy  

Science Conference Proceedings (OSTI)

We fabricated low-density GaAs/AlGaAs quantum dots for single photon source by droplet epitaxy. We investigated the emission energies of the dots and underlying superlattice by using photoluminescence and cathodoluminescence measurements. By forming a mesa etched structure, we distinguished the transitions from the superlattice and the dots. And we calculated the diffusion length in this system from the peak shift of the superlattice, and applied the diffusion to the dots to investigate the emission energy shift of the QDs.z

Moon, P. [Nano Convergence Devices Center, Korea Institute of Science and Technology, Seoul (Korea, Republic of); School of Materials Science, Japan Advanced Institute of Science and Technology, Ishikawa (Japan); Ha, S.-K.; Song, J. D.; Lim, J. Y.; Choi, W. J.; Han, I. K.; Lee, J. I. [Nano Convergence Devices Center, Korea Institute of Science and Technology, Seoul (Korea, Republic of); Bounouar, S.; Donatini, F.; Dang, L. S.; Poizat, J. P. [CEA/CNRS/UJF team 'Nanophysics and semiconductors', Institute Neel/CNRS-UJF, Grenoble (France); Kim, J. S. [Department of Physics, Yeungnam University, Gyeonsan (Korea, Republic of)

2011-12-23T23:59:59.000Z

92

Single photon emission from impurity centers in AlGaAs epilayers on Ge and Si substrates  

SciTech Connect

We show that the epitaxial growth of thin layers of AlGaAs on Ge and Si substrates allows to obtain single photon sources by exploiting the sparse and unintentional contamination with acceptors of the AlGaAs. Very bright and sharp single photoluminescence lines are observed in confocal microscopy. These lines behave very much as single excitons in quantum dots, but their implementation is by far much easier, since it does not require 3D nucleation. The photon antibunching is demonstrated by time resolved Hanbury Brown and Twiss measurements.

Minari, S.; Cavigli, L.; Sarti, F.; Abbarchi, M.; Accanto, N.; Munoz Matutano, G.; Vinattieri, A.; Gurioli, M. [Dipartimento di Fisica e Astronomia, LENS and CNISM, Universita di Firenze, Via Sansone 1, I-50019 Firenze (Italy); Bietti, S.; Sanguinetti, S. [Dipartimento di Scienza dei Materiali and L-NESS, Universita di Milano Bicocca, Via Cozzi 53, I-20125 Milano (Italy)

2012-10-22T23:59:59.000Z

93

II3, 2?m Thick Device Quality GaN on Si(111) Using AlGaN Graded ...  

Science Conference Proceedings (OSTI)

I4, Electrical Spin Injection in a Hybrid Organic/Inorganic Spin-Polarized Light Emitting Diode (Spin-LED) · I5, Properties of MnAs/GaMnAs/MnAs Magnetic ...

94

Effect of antimony nano-scale surface-structures on a GaSb/AlAsSb distributed Bragg reflector  

SciTech Connect

Effects of antimony crystallization on the surface of GaSb during low temperature molecular beam epitaxy growth are investigated. The geometry of these structures is studied via transmission electron and atomic force microscopies, which show the surface metal forms triangular-shaped, elongated nano-wires with a structured orientation composed entirely of crystalline antimony. By depositing antimony on a GaSb/AlAsSb distributed Bragg reflector, the field is localized within the antimony layer. Polarization dependent transmission measurements are carried out on these nano-structures deposited on a GaSb/AlAsSb distributed Bragg reflector. It is shown that the antimony-based structures at the surface favor transmission of light polarized perpendicular to the wires.

Husaini, S.; Shima, D.; Ahirwar, P.; Rotter, T. J.; Hains, C. P.; Dang, T.; Bedford, R. G.; Balakrishnan, G. [Air Force Research Laboratory, Sensors Directorate, Wright-Patterson AFB, Dayton, OH 45433 (United States)] [Air Force Research Laboratory, Sensors Directorate, Wright-Patterson AFB, Dayton, OH 45433 (United States)

2013-02-11T23:59:59.000Z

95

Sub-250 nm room-temperature optical gain from AlGaN/AlN multiple quantum wells with strong band-structure potential fluctuations  

Science Conference Proceedings (OSTI)

Deep-UV optical gain has been demonstrated in Al{sub 0.7}Ga{sub 0.3}N/AlN multiple quantum wells under femtosecond optical pumping. Samples were grown by molecular beam epitaxy under a growth mode that introduces band structure potential fluctuations and high-density nanocluster-like features within the AlGaN wells. A maximum net modal gain value of 118 {+-} 9 cm{sup -1} has been measured and the transparency threshold of 5 {+-} 1 {mu}J/cm{sup 2} was experimentally determined, corresponding to 1.4 x 10{sup 17} cm{sup -3} excited carriers. These findings pave the way for the demonstration of solid-state lasers with sub-250 nm emission at room temperature.

Francesco Pecora, Emanuele; Zhang Wei; Nikiforov, A.Yu.; Yin Jian; Paiella, Roberto; Dal Negro, Luca; Moustakas, T. D. [Department of Electrical and Computer Engineering and Photonics Center, Boston University, 8 Saint Mary's Street, Boston, Massachusetts 02215 (United States); Zhou Lin; Smith, David J. [Department of Physics, Arizona State University, Tempe, Arizona 85287 (United States)

2012-02-06T23:59:59.000Z

96

Effect of AlN buffer layer properties on the morphology and polarity of GaN nanowires grown by molecular beam epitaxy  

SciTech Connect

Low-temperature AlN buffer layers grown via plasma-assisted molecular beam epitaxy on Si (111) were found to significantly affect the subsequent growth morphology of GaN nanowires. The AlN buffer layers exhibited nanowire-like columnar protrusions, with their size, shape, and tilt determined by the AlN V/III flux ratio. GaN nanowires were frequently observed to adopt the structural characteristics of the underlying AlN columns, including the size and the degree of tilt. Piezoresponse force microscopy and polarity-sensitive etching indicate that the AlN films and the protruding columns have a mixed crystallographic polarity. Convergent beam electron diffraction indicates that GaN nanowires are Ga-polar, suggesting that Al-polar columns are nanowire nucleation sites for Ga-polar nanowires. GaN nanowires of low density could be grown on AlN buffers that were predominantly N-polar with isolated Al-polar columns, indicating a high growth rate for Ga-polar nanowires and suppressed growth of N-polar nanowires under typical growth conditions. AlN buffer layers grown under slightly N-rich conditions (V/III flux ratio = 1.0 to 1.3) were found to provide a favorable growth surface for low-density, coalescence-free nanowires.

Brubaker, Matt D. [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309 (United States); DARPA Center for Integrated Micro/Nano-Electromechanical Transducers (iMINT), University of Colorado, Boulder, Colorado 80309 (United States); Levin, Igor; Davydov, Albert V. [Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States); Rourke, Devin M.; Sanford, Norman A.; Bertness, Kris A. [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Bright, Victor M. [Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309 (United States); DARPA Center for Integrated Micro/Nano-Electromechanical Transducers (iMINT), University of Colorado, Boulder, Colorado 80309 (United States)

2011-09-01T23:59:59.000Z

97

Activation energy of degradation in GaAlAs double heterostructure laser diodes  

SciTech Connect

Aging test of GaAlAs double heterostructure (DH) laser diodes is performed in the temperature range of 50--180 /sup 0/C. In samples for the aging test, AuSn-alloy bonding solder is used and the facet coating with Al/sub 2/O/sub 3/ film is performed. Samples are operated in the light emitting diode (LED) mode with the application of the constant current of 4 kA/cm/sup 2/ and 6 kA/cm/sup 2/ at temperatures above 80 /sup 0/C and in the automatic power control (APC) lasing mode with the constant optical power of 5 mW/facet at 50 and 70 /sup 0/C. The activation energy is 0.5 eV obtained from the results of the LED mode operation at 4 kA/cm/sup 2/. The parameter to evaluate the degradation is the current at which the optical power at 25 /sup 0/C is 5 mW/facet. This parameter includes the deterioration of the external differencial efficiency. It is shown that the increasing rates of this parameter are almost the same at the same temperature between the LED mode operation at 4 kA/cm/sup 2/ and 6 kA/cm/sup 2/. The increasing rate is almost the same when samples are operated in the APC lasing mode. Twenty-three samples operated at 70 /sup 0/C maintain the optical power of 5 mW/facet set initially over 5000 h. The averaged increasing rate of that parameter in these samples is 7.1 x 10/sup -6//h. The activation energy of 0.5 eV is almost the same as that of GaAlAs DH LED's which is 0.56 eV. It is presumed that point defects which disperse homogeneously cause the degradation of laser diodes and this degradation mode seemed to be the same as LED owing to the improvements against the facet degradation and the contact degradation.

Imai, H.; Hori, K.; Takusagawa, M.; Wakita, K.

1981-05-01T23:59:59.000Z

98

SF{sub 6}/O{sub 2} plasma effects on silicon nitride passivation of AlGaN/GaN high electron mobility transistors  

SciTech Connect

The effects of various plasma and wet chemical surface pretreatments on the electrical characteristics of AlGaN/GaN high electron mobility transistors (HEMTs) passivated with plasma-deposited silicon nitride were investigated. The results of pulsed IV measurements show that samples exposed to various SF{sub 6}/O{sub 2} plasma treatments have markedly better rf dispersion characteristics compared to samples that were either untreated or treated in wet buffered oxide etch prior to encapsulation. The improvement in these characteristics correlates with the reduction of carbon on the semiconductor surface as measured with x-ray photoelectron spectroscopy. HEMT channel sheet resistance was also affected by varying silicon nitride deposition parameters.

Meyer, David J.; Flemish, Joseph R.; Redwing, Joan M. [Materials Science and Engineering Department, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)

2006-11-27T23:59:59.000Z

99

Improvement of near-infrared absorption linewidth in AlGaN/GaN superlattices by optimization of delta-doping location  

Science Conference Proceedings (OSTI)

We report a systematic study of the near-infrared intersubband absorption in AlGaN/GaN superlattices grown by plasma-assisted molecular-beam epitaxy as a function of Si-doping profile with and without {delta}-doping. The transition energies are in agreement with theoretical calculations including many-body effects. A dramatic reduction of the intersubband absorption linewidth is observed when the {delta}-doping is placed at the end of the quantum well. This reduction is attributed to the improvement of interface roughness. The linewidth dependence on interface roughness is well reproduced by a model that considers the distribution of well widths measured with transmission electron microscopy.

Edmunds, C.; Cervantes, M.; Malis, O. [Department of Physics, Purdue University, West Lafayette, Indiana 47907 (United States); Tang, L.; Shao, J.; Li, D. [Department of Physics, Purdue University, West Lafayette, Indiana 47907 (United States); Birck Nanotechnology Center, West Lafayette, Indiana 47907 (United States); Gardner, G. [Birck Nanotechnology Center, West Lafayette, Indiana 47907 (United States); School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States); Zakharov, D. N. [Birck Nanotechnology Center, West Lafayette, Indiana 47907 (United States); Manfra, M. J. [Department of Physics, Purdue University, West Lafayette, Indiana 47907 (United States); Birck Nanotechnology Center, West Lafayette, Indiana 47907 (United States); School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States); School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907 (United States)

2012-09-03T23:59:59.000Z

100

Improved Off-State Stress Critical Voltage on AlGaN/GaN High Electron Mobility Transistors Utilizing Pt/Ti/Au Based Gate Metallization  

Science Conference Proceedings (OSTI)

The critical voltage for degradation of AlGaN/GaN high electron mobility transistors (HEMTs) employed with the Pt/Ti/Au gate metallization instead of the commonly used Ni/Au was significantly increased during the off-state stress. The typical critical voltage for HEMTs with Ni/Au gate metallization was around -60V. By sharp contrast, no critical voltage was observed for the HEMTs with Pt/Ti/Au gate metallization, even up to -100V, which was the instrumental limitation in this experiment. Both Schottky forward and reverse gate characteristics of the Ni/Au degraded once the gate voltage passed the critical voltage of around -60V. There was no degradation exhibited for the HEMTs with Pt-gated HEMTs.

Lo, C. F. [University of Florida; Liu, L. [University of Florida, Gainesville; Kang, Tsung Sheng [University of Florida, Gainesville; Davies, Ryan [University of Florida; Gila, Brent P. [University of Florida, Gainesville; Pearton, S. J. [University of Florida; Kravchenko, Ivan I [ORNL; Laboutin, O. [Kopin Corporation, Taunton, MA; Cao, Yu [Kopin Corporation, Taunton, MA; Johnson, Wayne J. [Kopin Corporation, Taunton, MA; Ren, F. [University of Florida

2011-01-01T23:59:59.000Z

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101

Real-time x-ray response of biocompatible solution gate AlGaN/GaN high electron mobility transistor devices  

Science Conference Proceedings (OSTI)

We present the real-time x-ray irradiation response of charge and pH sensitive solution gate AlGaN/GaN high electron mobility transistors. The devices show stable and reproducible behavior under and following x-ray radiation, including a linear integrated response with dose into the muGy range. Titration measurements of devices in solution reveal that the linear pH response and sensitivity are not only retained under x-ray irradiation, but an irradiation response could also be measured. Since the devices are biocompatible, and can be simultaneously operated in aggressive fluids and under hard radiation, they are well-suited for both medical radiation dosimetry and biosensing applications.

Hofstetter, Markus; Funk, Maren; Paretzke, Herwig G.; Thalhammer, Stefan [Helmholtz Zentrum Muenchen, Ingolstaedter Landstrasse 1, 85764 Neuherberg (Germany); Howgate, John; Sharp, Ian D.; Stutzmann, Martin [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching (Germany)

2010-03-01T23:59:59.000Z

102

High photo-excited carrier multiplication by charged InAs dots in AlAs/GaAs/AlAs resonant tunneling diode  

E-Print Network (OSTI)

We present an approach for the highly sensitive photon detection based on the quantum dots (QDs) operating at temperature of 77K. The detection structure is based on an AlAs/GaAs/AlAs double barrier resonant tunneling diode combined with a layer of self-assembled InAs QDs (QD-RTD). A photon rate of 115 photons per second had induced 10nA photocurrent in this structure, corresponding to the photo-excited carrier multiplication factor of 10^7. This high multiplication factor is achieved by the quantum dot induced memory effect and the resonant tunneling tuning effect of QD-RTD structure.

Wang, Wangping; Xiong, Dayuan; Li, Ning; Lu, Wei

2007-01-01T23:59:59.000Z

103

High photo-excited carrier multiplication by charged InAs dots in AlAs/GaAs/AlAs resonant tunneling diode  

E-Print Network (OSTI)

We present an approach for the highly sensitive photon detection based on the quantum dots (QDs) operating at temperature of 77K. The detection structure is based on an AlAs/GaAs/AlAs double barrier resonant tunneling diode combined with a layer of self-assembled InAs QDs (QD-RTD). A photon rate of 115 photons per second had induced 10nA photocurrent in this structure, corresponding to the photo-excited carrier multiplication factor of 10^7. This high multiplication factor is achieved by the quantum dot induced memory effect and the resonant tunneling tuning effect of QD-RTD structure.

Wangping Wang; Ying Hou; Dayuan Xiong; Ning Li; Wei Lu

2007-10-15T23:59:59.000Z

104

Drift velocity of electrons in quantum wells of selectively doped In{sub 0.5}Ga{sub 0.5}As/Al{sub x}In{sub 1-x}As and In{sub 0.2}Ga{sub 0.8}As/Al{sub x}Ga{sub 1-x}As heterostructures in high electric fields  

Science Conference Proceedings (OSTI)

The field dependence of drift velocity of electrons in quantum wells of selectively doped In{sub 0.5}Ga{sub 0.5}As/Al{sub x}In{sub 1-x}As and In{sub 0.2}Ga{sub 0.8}As/Al{sub x}Ga{sub 1-x}As heterostructures is calculated by the Monte Carlo method. The influence of varying the molar fraction of Al in the composition of the Al{sub x}Ga{sub 1-x}As and Al{sub x}In{sub 1-x}As barriers of the quantum well on the mobility and drift velocity of electrons in high electric fields is studied. It is shown that the electron mobility rises as the fraction x of Al in the barrier composition is decreased. The maximum mobility in the In{sub 0.5}Ga{sub 0.5}As/In{sub 0.8}Al{sub 0.2}As quantum wells exceeds the mobility in a bulk material by a factor of 3. An increase in fraction x of Al in the barrier leads to an increase in the threshold field E{sub th} of intervalley transfer (the Gunn effect). The threshold field is E{sub th} = 16 kV/cm in the In{sub 0.5}Ga{sub 0.5}As/Al{sub 0.5}In{sub 0.5}As heterostructures and E{sub th} = 10 kV/cm in the In{sub 0.2}Ga{sub 0.8}As/Al{sub 0.3}Ga{sub 0.7}As heterostructures. In the heterostructures with the lowest electron mobility, E{sub th} = 2-3 kV/cm, which is lower than E{sub th} = 4 kV/cm in bulk InGaAs.

Pozela, J., E-mail: pozela@pfi.lt; Pozela, K.; Raguotis, R.; Juciene, V. [Center for Physical Sciences and Technology, Semiconductor Physics Institute (Lithuania)

2011-06-15T23:59:59.000Z

105

Cl{sub 2}-based dry etching of the AlGaInN system in inductively coupled plasmas  

DOE Green Energy (OSTI)

Cl{sub 2}-based Inductively Coupled Plasmas with low additional dc self- biases(-100V) produce convenient etch rates(500-1500 A /min) for GaN, AlN, InN, InAlN and InGaN. A systematic study of the effects of additive gas(Ar, N{sub 2}, H{sub 2}), discharge composition and ICP source power and chuck power on etch rate and surface morphology has been performed. The general trends are to go through a maximum in etch rate with percent Cl{sub 2} in the discharge for all three mixtures, and to have an increase(decrease) in etch rate with source power(pressure). Since the etching is strongly ion-assisted, anisotropic pattern transfer is readily achieved. Maximum etch selectivities of approximately 6 for InN over the other nitrides were obtained.

Cho, Hyun; Vartuli, C.B.; Abernathy, C.R.; Donovan, S.M.; Pearton, S.J. [Florida Univ., Gainesville, FL (United States). Dept. of Materials Science and Engineering; Shul, R.J.; Han, J. [Sandia National Labs., NM (United States)

1997-12-01T23:59:59.000Z

106

Growth and properties of InGaAs/FeAl/InAlAs/InP heterostructures for buried reflector/interconnect applications in InGaAs thermophotovoltaic devices  

DOE Green Energy (OSTI)

Thermophotovoltaic cells consisting of InGaAs active layers are of extreme promise for high efficiency, low bandgap TPV conversion. In the monolithic interconnected module configuration, the presence of the InGaAs lateral conduction layer (LCL) necessary for the series connection between TPV cells results in undesirable free carrier absorption, causing a tradeoff between series resistance and optical absorption losses in the infrared. A potential alternative is to replace the LCL with an epitaxial metal layer that would provide a low-resistance interconnect while not suffering from free carrier absorption. The internal metal layer would also serve as an efficient, panchromatic back surface reflector, providing the additional advantage of increased effective optical thickness of the InGaAs cell. In this paper, the authors present the first results on the growth and development of buried epitaxial metal layers for TPV applications. High quality, single crystal, epitaxial Fe{sub x}Al{sub 1{minus}x} layers were grown on InAlAs/InP substrates, having compositions in the range x = 0.40--0.80. Epitaxial metal layers up to 1,000 {angstrom} in thickness were achieved, with excellent uniformity over large areas and atomically smooth surfaces. X-ray diffraction studies indicate that all FeAl layers are strained with respect to the substrate, for the entire composition range studied and for all thicknesses. The FeAl layers exhibit excellent resistance characteristics, with resistivities from 60 {micro}ohm-cm to 100 {micro}ohm-cm, indicating that interface scattering has a negligible effect on lateral conductivity. Reflectance measurements show that the FeAl thickness must be at least 1,000 {angstrom} to achieve > 90% reflection in the infrared.

Ringel, S.A.; Sacks, R.N.; Qin, L. [Ohio State Univ., Columbus, OH (United States). Dept. of Electrical Engineering; Clevenger, M.B.; Murray, C.S. [Bettis Atomic Power Lab., West Mifflin, PA (United States)

1998-11-01T23:59:59.000Z

107

Strain control of AlGaN/GaN high electron mobility transistor structures on silicon (111) by plasma assisted molecular beam epitaxy  

Science Conference Proceedings (OSTI)

This paper reports on the use of plasma assisted molecular beam epitaxy of AlGaN/GaN-based high electron mobility transistor structures grown on 4 in. Si (111) substrates. In situ measurements of wafer curvature during growth proved to be a very powerful method to analyze the buffer layer's thickness dependent strain. The Ga/N ratio at the beginning of growth of the GaN buffer layer is the critical parameter to control the compressive strain of the entire grown structure. An engineered amount of compressive strain must be designed into the structure to perfectly compensate for the tensile strain caused by differences in the thermal expansion coefficient between the epi-layer and substrate during sample cool down from growth temperatures. A maximum film thickness of 4.2 {mu}m was achieved without the formation of any cracks and a negligible bow of the wafers below 10 {mu}m. Measurement of the as-grown wafers revealed depth profiles of the charge carrier concentration comparable to values achieved on SiC substrates and mobility values of the two dimensional electron gas in the range 1230 to 1350 cm{sup 2}/Vs at a charge carrier concentration of 6.5-7 10{sup 12}/cm{sup 2}. First results on processed wafers with 2 {mu}m thick buffer layer indicate very promising results with a resistance of the buffer, measured on 200 {mu}m long contacts with 15 {mu}m pitch, in the range of R > 10{sup 9}{Omega} at 100 V and breakdown voltages up to 550 V.

Aidam, Rolf; Diwo, Elke; Rollbuehler, Nicola; Kirste, Lutz; Benkhelifa, Fouad [Fraunhofer-Institute for Applied Solid State Physics, Tullastrasse 72, 79108 Freiburg (Germany)

2012-06-01T23:59:59.000Z

108

Evolution of AlN buffer layers on Silicon and the effect on the property of the expitaxial GaN film  

E-Print Network (OSTI)

The morphology evolution of high-temperature grown AlN nucleation layers on (111) silicon has been studied using atomic force microscopy (AFM). The structure and morphology of subsequently grown GaN film were characterized ...

Zang, Keyan

109

Spin injection into semiconductors : the role of Fe/Al[sub x]Ga[sub 1-x]As interface  

SciTech Connect

The influence of the growth and post-growth annealing temperatures of Fe/Al{sub x}Ga{sub 1-x}As-based spin light-emitting diodes (LEDs) on the spin injection efficiency is discussed. The extent of interfacial reactions during molecular beam epitaxial growth of Fe on GaAs was determined from in-situ x-ray photoelectron spectroscopy studies. The Fe/GaAs interface results in {<=} 3 monolayers of reaction for Fe grown at -15 C. Intermediate growth temperatures (95 C) lead to {approx}5 monolayers of interfacial reactions, and high growth temperatures of 175 C lead to a {approx}9 monolayer thick reacted layer. Polarized neutron reflectivity was used to determine the interfacial magnetic properties of epitaxial Fe{sub 0.5}Co{sub 0.5}/GaAs heterostructures grown under identical conditions. No interfacial magnetic dead layer is detected at the interface for Fe{sub 0.5}Co{sub 0.5} films grown at -15 C, an {approx}6 {angstrom} thick nonmagnetic layer formed at the interface for 95 C growth and an {approx}5 {angstrom} thick magnetic interfacial reacted layer formed for growth at 175 C. Spin injection from Fe contacts into spin LEDs decreases sharply when reactions result in a nonmagnetic interfacial layer. Significant spin injection signals are obtained from Fe contacts grown between -5 C and 175 C, although the higher Fe growth temperatures resulted in a change in the sign of the spin polarization. Post-growth annealing of the spin LEDs is found to increase spin injection efficiency for low Fe growth temperatures and to a sign reversal of the spin polarization for high growth temperature (175 C). An effective Schottky barrier height increase indicates that post growth annealing modifies the Fe/Al{sub x}Ga{sub 1-x}As interface.

Fitzsimmons, M. R. (Michael R.); Park, S. (Sungkyun)

2004-01-01T23:59:59.000Z

110

II2, GaN/AlN Heterostructures on Vertical {111} Fin Facets of Si (110)  

Science Conference Proceedings (OSTI)

I4, Electrical Spin Injection in a Hybrid Organic/Inorganic Spin-Polarized Light Emitting Diode (Spin-LED) · I5, Properties of MnAs/GaMnAs/MnAs Magnetic ...

111

Comparison of dc performance of Pt/Ti/Au- and Ni/Au-Gated AlGaN/GaN High Electron Mobility Transistors  

Science Conference Proceedings (OSTI)

We have demonstrated significant improvements of AlGaN/GaN High Electron Mobility Transistors (HEMTs) dc performance by employing Pt/Ti/Au instead of the conventional Ni/Au gate metallization. During off-state bias stressing, the typical critical voltage for HEMTs with Ni/Au gate metallization was ~ -45 to -65V. By sharp contrast, no critical voltage was observed for HEMTs with Pt/Ti/Au gate metallization, even up to -100V, which was the instrumental limitation in this experiment. After the off-state stressing, the drain current of Ni/Au gated-HEMTs decreased by~ 15%. For the Pt-gate HEMTs, no degradation of the drain current occurred and there were minimal changes in the Schottky gate characteristics for both forward and reverse bias conditions. The HEMTs with Pt/Ti/Au metallization showed an excellent drain on/off current ratio of 1.5 108. The on/off drain current ratio of Ni-gated HEMTs was dependent on the drain bias voltage and ranged from 1.2 107 at Vds=5V and 6 105

Liu, L. [University of Florida, Gainesville; Lo, C. F. [University of Florida; Kang, Tsung Sheng [University of Florida, Gainesville; Pearton, S. J. [University of Florida; Kravchenko, Ivan I [ORNL; Laboutin, O. [Kopin Corporation, Taunton, MA; Johnson, Wayne J. [Kopin Corporation, Taunton, MA; Ren, F. [University of Florida

2011-01-01T23:59:59.000Z

112

Investigation of mechanisms of multimode emission from double-heterostructure AlGaAs injection lasers with narrow stripe contacts  

SciTech Connect

An investigation was made of the spectral characteristics of planar stripe (contact width 6--8 ..mu..) lasers made of AlGaAs heterostructures. The steady-state emission spectrum could be of multimode type because of the high level of spontaneous emission in the lasing mode. The spectrum then became narrower on increase in the power and in the limit changed to the single-mode form. However, in the presence of self-modulation processes the multimode nature of the emission spectrum could be explained by a theory of transient effects and in this case the width of the spectrum increased on increase in the power.

Bessonov, Y.L.; Kurlenkov, S.S.; Morozov, V.N.; Sapozhnikov, S.M.; Thai, C.t.; Shidlovskii, V.R.

1985-02-01T23:59:59.000Z

113

C-V characteristics of epitaxial germanium metal-oxide-semiconductor capacitor on GaAs substrate with ALD Al2O3 dielectric  

Science Conference Proceedings (OSTI)

Epitaxial germanium metal-oxide-semiconductor capacitors (MOSCAP) were fabricated on GaAs substrate using atomic layer deposited Al"2O"3 gate dielectric with surface treatments including pure HF and HF plus rapid thermal oxidation (RTO). The electrical ... Keywords: ALD Al2O3, CMOS integration, Ge MOSCAP, Ge epitaxial film, RTO

Shih Hsuan Tang; Chien I. Kuo; Hai Dang Trinh; Mantu Hudait; Edward Yi Chang; Ching Yi Hsu; Yung Hsuan Su; Guang-Li Luo; Hong Quan Nguyen

2012-09-01T23:59:59.000Z

114

Lattice constant grading in the Al.sub.y Ga.sub.1-y As.sub.1-x Sb.sub.x alloy system  

DOE Patents (OSTI)

Liquid phase epitaxy is employed to grow a lattice matched layer of GaAsSb on GaAs substrates through the compositional intermediary of the III-V alloy system AlGaAsSb which acts as a grading layer. The Al constituent reaches a peak atomic concentration of about 6% within the first 2.5 .mu.m of the transition layer, then decreases smoothly to about 1% to obtain a lattice constant of 5.74 A. In the same interval the equilibrium concentration of Sb smoothly increases from 0 to about 9 atomic percent to form a surface on which a GaAsSb layer having the desired energy bandgap of 1.1 ev for one junction of an optimized dual junction photolvoltaic device. The liquid phase epitaxy is accomplished with a step cooling procedure whereby dislocation defects are more uniformly distributed over the surface of growing layer.

Moon, Ronald L. (Palo Alto, CA)

1980-01-01T23:59:59.000Z

115

Effects of proton irradiation on dc characteristics of InAlN/GaN high electron mobility transistors  

Science Conference Proceedings (OSTI)

The effects of proton irradiation on the dc characteristics of InAlN/GaN high electron mobility transistors were investigated. In this study we used 5 MeV protons with doses varying from 21011 to 21015 cm2. The transfer resistance and contact resistivity suffered more degradation as compared to the sheet resistance. With irradiation at the highest dose of 21015 cm2, both forward- and reverse-bias gate currents were increased after proton irradiation. A negative threshold-shift and reduction of the saturation drain current were also observed as a result of radiation-induced carrier scattering and carrier removal. Devices irradiated with doses of 21011 to 21015 cm2 exhibited minimal degradation of the saturation drain current and extrinsic trans- conductance. These results show that InAlN/GaN high electron mobility transistors are attractive for space-based applications when high-energy proton fluxes are present. VC 2011 American Vacuum Society. [DOI: 10.1116/1.3644480

Lo, C. F. [University of Florida; Liu, L. [University of Florida, Gainesville; Ren, F. [University of Florida; Kim, H.-Y. [Korea University; Kim, J. [Korea University; Pearton, S. J. [University of Florida; Laboutin, O. [Kopin Corporation, Taunton, MA; Cao, Yu [Kopin Corporation, Taunton, MA; Johnson, Wayne J. [Kopin Corporation, Taunton, MA; Kravchenko, Ivan I [ORNL

2011-01-01T23:59:59.000Z

116

Molecular beam epitaxy of InAlN lattice-matched to GaN with homogeneous composition using ammonia as nitrogen source  

Science Conference Proceedings (OSTI)

InAlN lattice-matched to GaN was grown by molecular beam epitaxy (MBE) using ammonia as the nitrogen source. The alloy composition, growth conditions, and strain coherence of the InAlN were verified by high resolution x-ray diffraction {omega}-2{theta} scans and reciprocal space maps. Scanning transmission electron microscopy and energy-dispersive x-ray spectroscopy of the InAlN revealed the absence of lateral composition modulation that was observed in the films grown by plasma-assisted MBE. InAlN/AlN/GaN high electron mobility transistors with smooth surfaces were fabricated with electron mobilities exceeding 1600 cm{sup 2}/Vs and sheet resistances below 244 {Omega}/sq.

Wong, Man Hoi; Wu Feng; Hurni, Christophe A.; Choi, Soojeong; Speck, James S.; Mishra, Umesh K. [Department of Electrical and Computer Engineering and Materials Department, University of California, Santa Barbara, California 93106 (United States)

2012-02-13T23:59:59.000Z

117

SOLID SOLUTION EFFECTS ON THE THERMAL PROPERTIES IN THE MgAl2O4-MgGa2O4  

Science Conference Proceedings (OSTI)

Solid solution eects on thermal conductivity within the MgO-Al2O3-Ga2O3 system were studied. Samples with systematically varied additions of MgGa2O4 to MgAl2O4 were prepared and the laser ash technique was used to determine thermal diusivity at temperatures between 200C and 1300C. Heat capacity as a function of temperature from room temperature to 800C was also determined using dierential scanning calorimetry. Solid solution in the MgAl2O4-MgGa2O4 system decreases the thermal conductivity up to 1000C. At 200C thermal conductivity decreased 24% with a 5 mol% addition of MgGa2O4 to the system. At 1000C the thermal conductivity decreased 13% with a 5 mol% addition. Steady state calculations showed a 12.5% decrease in heat ux with 5 mol% MgGa2O4 considered across a 12 inch thickness.

O'Hara, Kelley [University of Missouri, Rolla; Smith, Jeffrey D [ORNL; Sander, Todd P. [Missouri University of Science and Technology; Hemrick, James Gordon [ORNL

2013-01-01T23:59:59.000Z

118

Radio-frequency measurements of UNiX compounds (X= Al, Ga, Ge) in high magnetic fields  

SciTech Connect

We performed radio-frequency (RF) skin-depth measurements of antiferromagnetic UNiX compounds (X=Al, Ga, Ge) in magnetic fields up to 60 T and at temperatures between 1.4 to {approx}60 K. Magnetic fields are applied along different crystallographic directions and RF penetration-depth was measured using a tunnel-diode oscillator (TDO) circuit. The sample is coupled to the inductive element of a TDO resonant tank circuit, and the shift in the resonant frequency {Delta}f of the circuit is measured. The UNiX compounds exhibit field-induced magnetic transitions at low temperatures, and those transitions are accompanied by a drastic change in {Delta}f. The results of our skin-depth measurements were compared with previously published B-T phase diagrams for these three compounds.

Mielke, Charles H [Los Alamos National Laboratory; Mcdonald, David R [Los Alamos National Laboratory; Zapf, Vivien [Los Alamos National Laboratory; Altarawneh, Moaz M [Los Alamos National Laboratory; Lacerda, Alex H [Los Alamos National Laboratory; Adak, Sourav [Los Alamos National Laboratory; Karunakar, Kothapalli [Los Alamos National Laboratory; Nakotte, Heinrich [Los Alamos National Laboratory; Chang, S [NIST; Alsmadi, A M [HASHEMITE UNIV; Alyones, S [HASHEMIT UNIV

2009-01-01T23:59:59.000Z

119

The effects of proton irradiation on the reliability of InAlN/GaN high electron mobility transistors  

Science Conference Proceedings (OSTI)

We have investigated the effect of proton irradiation on reliability of InAlN/GaN high electron mobility transistors (HEMTs). Devices were subjected to 5-15 MeV proton irradiations with a fixed dose of 5 1015 cm-2, or to a different doses of 2 1011, 5 1013 or 2 1015 cm-2 of protons at a fixed energy of 5 MeV. During off-state electrical stressing, the typical critical voltage for un-irradiated devices was 45 to 55 V. By sharp contrast, no critical voltage was detected for proton irradiated HEMTs up to 100 V, which was instrument-limited. After electrical stressing, no degradation was observed for the drain or gate current-voltage characteristics of the proton-irradiated HEMTs. However, the drain current decreased ~12%, and the reverse bias gate leakage current increased more than two orders of magnitude for un-irradiated HEMTs as a result of electrical stressing.

Liu, L. [University of Florida, Gainesville; Lo, C. F. [University of Florida; Xi, Y. Y. [University of Florida, Gainesville; Wang, Y.l. [University of Florida; Kim, H.-Y. [Korea University; Kim, J. [Korea University; Pearton, S. J. [University of Florida; Laboutin, O. [Kopin Corporation, Taunton, MA; Cao, Yu [Kopin Corporation, Taunton, MA; Johnson, Wayne J. [Kopin Corporation, Taunton, MA; Kravchenko, Ivan I [ORNL; Ren, F. [University of Florida

2012-01-01T23:59:59.000Z

120

Capped ED-Mode AlN/GaN Inverters - Programmaster.org  

Science Conference Proceedings (OSTI)

The demonstrated inverter is operating at VDD = 5 V and consists of an enhancement- and depletion-mode HEMT with 1.5 nm thin subcritical AlN ...

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121

Atomic layer deposition of Al{sub 2}O{sub 3} on GaSb using in situ hydrogen plasma exposure  

SciTech Connect

In this report, we study the effectiveness of hydrogen plasma surface treatments for improving the electrical properties of GaSb/Al{sub 2}O{sub 3} interfaces. Prior to atomic layer deposition of an Al{sub 2}O{sub 3} dielectric, p-GaSb surfaces were exposed to hydrogen plasmas in situ, with varying plasma powers, exposure times, and substrate temperatures. Good electrical interfaces, as indicated by capacitance-voltage measurements, were obtained using higher plasma powers, longer exposure times, and increasing substrate temperatures up to 250 Degree-Sign C. X-ray photoelectron spectroscopy reveals that the most effective treatments result in decreased SbO{sub x}, decreased Sb, and increased GaO{sub x} content at the interface. This in situ hydrogen plasma surface preparation improves the semiconductor/insulator electrical interface without the use of wet chemical pretreatments and is a promising approach for enhancing the performance of Sb-based devices.

Ruppalt, Laura B.; Cleveland, Erin R.; Champlain, James G.; Prokes, Sharka M.; Brad Boos, J.; Park, Doewon; Bennett, Brian R. [Electronics Science and Technology Division, Naval Research Laboratory, Washington, DC 20375 (United States)

2012-12-03T23:59:59.000Z

122

Molecular beam epitaxial growth of metamorphic AlInSb/GaInSb high-electron-mobility-transistor structures on GaAs substrates for low power and high frequency applications  

Science Conference Proceedings (OSTI)

We report on molecular beam epitaxial growth of AlInSb/GaInSb metamorphic high-electron-mobility-transistor structures for low power, high frequency applications on 4 in. GaAs substrates. The structures consist of a Ga{sub 0.4}In{sub 0.6}Sb channel embedded in Al{sub 0.4}In{sub 0.6}Sb barrier layers which are grown on top of an insulating metamorphic buffer, which is based on the linear exchange of Ga versus In and a subsequent exchange of As versus Sb. Precise control of group V fluxes and substrate temperature in the Al{sub 0.4}In{sub 0.6}As{sub 1-x}Sb{sub x} buffer is essential to achieve high quality device structures. Good morphological properties were achieved demonstrated by the appearance of crosshatching and root mean square roughness values of 2.0 nm. Buffer isolation is found to be >100 k{Omega}/{open_square} for optimized growth conditions. Hall measurements at room temperature reveal electron densities of 2.8x10{sup 12} cm{sup -2} in the channel at mobility values of 21.000 cm{sup 2}/V s for single-sided Te volume doping and 5.4x10{sup 12} cm{sup -2} and 17.000 cm{sup 2}/V s for double-sided Te {delta}-doping, respectively.

Loesch, R.; Aidam, R.; Kirste, L.; Leuther, A. [Fraunhofer Institute for Applied Solid-State Physics (IAF), Tullastrasse 72, 79108 Freiburg (Germany)

2011-02-01T23:59:59.000Z

123

Many-body effects in wide parabolic AlGaAs quantum wells A. Tabata, M. R. Martins, and J. B. B. Oliveira  

E-Print Network (OSTI)

Many-body effects in wide parabolic AlGaAs quantum wells A. Tabata, M. R. Martins, and J. B. B gas in n-type wide parabolic quantum wells. A series of samples with different well widths at the Fermi level at low temperature only in the thinnest parabolic quantum wells. The suppression of the many

Gusev, Guennady

124

AlGaN UV LED and Photodiodes Radiation Hardness and Space Qualifications and Their Applications in Space Science and High Energy Density Physics  

Science Conference Proceedings (OSTI)

This presentation provides an overview of robust, radiation hard AlGaN optoelectronic devices and their applications in space exploration & high energy density physics. Particularly, deep UV LED and deep UV photodiodes are discussed with regard to their applications, radiation hardness and space qualification. AC charge management of UV LED satellite payload instruments, which were to be launched in late 2012, is covered.

Sun, K. X.

2011-05-31T23:59:59.000Z

125

Electrical properties and interfacial chemical environments of in situ atomic layer deposited Al2O3 on freshly molecular beam epitaxy grown GaAs  

Science Conference Proceedings (OSTI)

Interfacial chemical analyses and electrical characterization of in situ atomic layer deposited (ALD) Al"2O"3 on freshly molecular beam epitaxy (MBE) grown n- and p- GaAs (001) with a (4x6) surface reconstruction are performed. The capacitance-voltage ... Keywords: Atomic layer deposition, III-V compound semiconductor, Molecular beam epitaxy

Y. H. Chang; M. L. Huang; P. Chang; C. A. Lin; Y. J. Chu; B. R. Chen; C. L. Hsu; J. Kwo; T. W. Pi; M. Hong

2011-04-01T23:59:59.000Z

126

Correlation between Ga-O signature and midgap states at the Al{sub 2}O{sub 3}/In{sub 0.53}Ga{sub 0.47}As interface  

SciTech Connect

Al{sub 2}O{sub 3}/In{sub 0.53}Ga{sub 0.47}As gate stacks were fabricated using different concentrations of NH{sub 4}OH as a pre-deposition treatment. Increased NH{sub 4}OH concentrations significantly reduced the C-V weak inversion hump and the measured near midgap interface states density (D{sub it}). X-ray photoelectron spectroscopy (XPS) studies revealed that these changes in the electrical properties were accompanied by a reduction in the amount of the Ga-O bonding while As-As dimers as well as other XPS detected InGaAs surface species did not correlate with the observed D{sub it} trend. Possible explanations for these findings are suggested.

Krylov, Igor [Russell Berrie Nanotechnology Institute, Technion - Israel Institute of Technology, Haifa 32000 (Israel); Gavrilov, Arkady [Department of Electrical Engineering, Technion - Israel Institute of Technology, Haifa 32000 (Israel); Eizenberg, Moshe [Russell Berrie Nanotechnology Institute, Technion - Israel Institute of Technology, Haifa 32000 (Israel); Department of Materials Engineering, Technion - Israel Institute of Technology, Haifa 32000 (Israel); Ritter, Dan [Russell Berrie Nanotechnology Institute, Technion - Israel Institute of Technology, Haifa 32000 (Israel); Department of Electrical Engineering, Technion - Israel Institute of Technology, Haifa 32000 (Israel)

2012-08-06T23:59:59.000Z

127

Structural and optical studies of GaN pn-junction with AlN buffer layer grown on Si (111) by RF plasma enhanced MBE  

Science Conference Proceedings (OSTI)

GaN pn-junction grown on silicon substrates have been the focus in a number of recent reports and further effort is still necessary to improve its crystalline quality for practical applications. GaN has the high n-type background carrier concentration resulting from native defects commonly thought to be nitrogen vacancies. In this work, we present the growth of pn-junction of GaN on Si (111) substrate using RF plasma-enhanced molecular beam epitaxy (MBE). Both of the layers show uniformity with an average thickness of 0.709 {mu}m and 0.095 {mu}m for GaN and AlN layers, respectively. The XRD spectra indicate that no sign of cubic phase of GaN are found, so it is confirmed that the sample possessed hexagonal structure. It was found that all the allowed Raman optical phonon modes of GaN, i.e. the E2 (low), E1 (high) and A1 (LO) are clearly visible.

Yusoff, Mohd Zaki Mohd; Hassan, Zainuriah; Woei, Chin Che; Hassan, Haslan Abu; Abdullah, Mat Johar [Nano-Optoelectronics Research and Technology Laboratory School of Physics, Universiti Sains Malaysia, 11800 Penang, Malaysia and Department of Applied Sciences Universiti Teknologi MARA (UiTM) 13500 Permatang Pauh, Penang (Malaysia); Department of Applied Sciences Universiti Teknologi MARA (UiTM) 13500 Permatang Pauh, Penang (Malaysia)

2012-06-29T23:59:59.000Z

128

Reduction in interface state density of Al{sub 2}O{sub 3}/InGaAs metal-oxide-semiconductor interfaces by InGaAs surface nitridation  

Science Conference Proceedings (OSTI)

We report the decrease in interface trap density (D{sub it}) in Al{sub 2}O{sub 3}/InGaAs metal-oxide-semiconductor (MOS) capacitors by using electron cyclotron resonance plasma nitridation of the InGaAs surfaces. The impact of the nitridation process on the MOS interface properties is quantitatively examined. The plasma nitridation process is observed to form a nitrided layer at the InGaAs surface. The nitridation using microwave power (P{sub microwave}) of 250 W and nitridation time (t{sub nitridation}) of 420 s can form Al{sub 2}O{sub 3}/InGaAs MOS interfaces with a minimum D{sub it} value of 2.0 Multiplication-Sign 10{sup 11} cm{sup -2} eV{sup -1}. On the other hand, the nitridation process parameters such as P{sub microwave} and t{sub nitridation} are found to strongly alter D{sub it} (both decrease and increase are observed) and capacitance equivalent thickness (CET). It is found that the nitridation with higher P{sub microwave} and shorter t{sub nitridation} can reduce D{sub it} with less CET increase. Also, it is observed that as t{sub nitridation} increases, D{sub it} decreases first and increases later. It is revealed from XPS analyses that minimum D{sub it} can be determined by the balance between the saturation of nitridation and the progress of oxidation. As a result, it is found that the superior MOS interface formed by the nitridation is attributable to the existence of oxide-less InGaN/InGaAs interfaces.

Hoshii, Takuya; Lee, Sunghoon; Suzuki, Rena; Taoka, Noriyuki; Yokoyama, Masafumi; Takenaka, Mitsuru; Takagi, Shinichi [Department of Electrical Engineering and Information Systems, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Yamada, Hishashi; Hata, Masahiko [Sumitomo Chemical Co. Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294 (Japan); Yasuda, Tetsuji [National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568 (Japan)

2012-10-01T23:59:59.000Z

129

Synchrotron radiation based cross-sectional scanning photoelectron microscopy and spectroscopy of n-ZnO:Al/p-GaN:Mg heterojunction  

Science Conference Proceedings (OSTI)

Al-doped ZnO (AZO) deposited by radio frequency co-sputtering is formed on epitaxial Mg-doped GaN template at room temperature to achieve n-AZO/p-GaN heterojunction. Alignment of AZO and GaN bands is investigated using synchrotron radiation based cross-sectional scanning photoelectron microscopy and spectroscopy on the nonpolar side-facet of a vertically c-axis aligned heterostructure. It shows type-II band configuration with valence band offset of 1.63 {+-} 0.1 eV and conduction band offset of 1.61 {+-} 0.1 eV, respectively. Rectification behavior is clearly observed, with a ratio of forward-to-reverse current up to six orders of magnitude when the bias is applied across the p-n junction.

Lee, Kai-Hsuan; Chen, Chia-Hao [Nano Science Group, National Synchrotron Radiation Research Center, Hsin-Ann Rd. 101, 30076 Hsinchu, Taiwan (China)] [Nano Science Group, National Synchrotron Radiation Research Center, Hsin-Ann Rd. 101, 30076 Hsinchu, Taiwan (China); Chang, Ping-Chuan [Department of Electro-Optical Engineering, Kun Shan University, Dawan Rd. 949, 71003 Tainan, Taiwan (China)] [Department of Electro-Optical Engineering, Kun Shan University, Dawan Rd. 949, 71003 Tainan, Taiwan (China); Chen, Tse-Pu; Chang, Sheng-Po; Chang, Shoou-Jinn [Institute of Microelectronics and Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, University Rd. 1, 70101 Tainan, Taiwan (China)] [Institute of Microelectronics and Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University, University Rd. 1, 70101 Tainan, Taiwan (China); Shiu, Hung-Wei; Chang, Lo-Yueh [Nano Science Group, National Synchrotron Radiation Research Center, Hsin-Ann Rd. 101, 30076 Hsinchu, Taiwan (China) [Nano Science Group, National Synchrotron Radiation Research Center, Hsin-Ann Rd. 101, 30076 Hsinchu, Taiwan (China); Department of Physics, National Tsing Hua University, Kuang-Fu Rd. 101, 30013 Hsinchu, Taiwan (China)

2013-02-18T23:59:59.000Z

130

Proton irradiation energy dependence of dc and rf characteristics on InAlN/GaN high electron mobility transistors  

Science Conference Proceedings (OSTI)

The effects of proton irradiation energy on dc and rf characteristics of InAlN/GaN high electron mobility transistors (HEMTs) were investigated. A fixed proton dose of 51015 cm2 with 5, 10, and 15 MeV irradiation energies was used in this study. For the dc characteristics, degradation was observed for sheet resistance, transfer resistance, contact resistivity, saturation drain current, maximum transconductance, reverse-bias gate leakage current, and sub-threshold drain leakage current for all the irradiated HEMTs; however, the degree of the degradation was decreased as the irradiation energy increased. Similar trends were obtained for the rf performance of the devices, with 10% degradation of the unity gain cut-off frequency (fT) and maximum oscillation frequency ( fmax) for the HEMTs irradiated with 15 MeV protons but 30% for 5 MeV proton irradiation. The carrier removal rate was in the range 0.66 1.24 cm1 over the range of proton energies investigated

Lo, C. F. [University of Florida; Liu, L. [University of Florida, Gainesville; Ren, F. [University of Florida; Pearton, S. J. [University of Florida; Gila, Brent P. [University of Florida, Gainesville; Kim, H.-Y. [Korea University; Kim, J. [Korea University; Laboutin, O. [Kopin Corporation, Taunton, MA; Cao, Yu [Kopin Corporation, Taunton, MA; Johnson, Wayne J. [Kopin Corporation, Taunton, MA; Kravchenko, Ivan I [ORNL

2012-01-01T23:59:59.000Z

131

SiN{sub x}-induced intermixing in AlInGaAs/InP quantum well through interdiffusion of group III atoms  

Science Conference Proceedings (OSTI)

We analyze the composition profiles within intermixed and non-intermixed AlInGaAs-based multiple quantum wells structures by secondary ion mass spectrometry and observe that the band gap blue shift is mainly attributed to the interdiffusion of In and Ga atoms between the quantum wells and the barriers. Based on these results, several AlInGaAs-based single quantum well (SQW) structures with various compressive strain (CS) levels were grown and their photoluminescence spectra were investigated after the intermixing process involving the encapsulation of thin SiN{sub x} dielectric films on the surface followed by rapid thermal annealing. In addition to the annealing temperature, we report that the band gap shift can be also enhanced by increasing the CS level in the SQW. For instance, at an annealing temperature of 850 Degree-Sign C, the photoluminescence blue shift is found to reach more than 110 nm for the sample with 1.2%-CS SQW, but only 35 nm with 0.4%-CS SQW. We expect that this relatively larger atomic compositional gradient of In (and Ga) between the compressively strained quantum well and the barrier can facilitate the atomic interdiffusion and it thus leads to the larger band gap shift.

Lee, Ko-Hsin; Thomas, Kevin; Gocalinska, Agnieszka; Manganaro, Marina; Corbett, Brian [Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork (Ireland); Pelucchi, Emanuele; Peters, Frank H. [Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork (Ireland); Department of Physics, University College Cork, Cork (Ireland)

2012-11-01T23:59:59.000Z

132

Lateral Al{sub x}Ga{sub 1-x}N power rectifiers with 9.7 kV reverse breakdown voltage  

SciTech Connect

Al{sub x}Ga{sub 1-x}N (x=0--0.25) Schottky rectifiers were fabricated in a lateral geometry employing p{sup +}-implanted guard rings and rectifying contact overlap onto an SiO{sub 2} passivation layer. The reverse breakdown voltage (V{sub B}) increased with the spacing between Schottky and ohmic metal contacts, reaching 9700 V for Al{sub 0.25}Ga{sub 0.75}N and 6350 V for GaN, respectively, for 100 {mu}m gap spacing. Assuming lateral depletion, these values correspond to breakdown field strengths of {<=}9.67x10{sup 5}Vcm{sup -1}, which is roughly a factor of 20 lower than the theoretical maximum in bulk GaN. The figure of merit (V{sub B}){sup 2}/R{sub ON}, where R{sub ON} is the on-state resistance, was in the range 94--268 MWcm-2 for all the devices.

Zhang, A. P.; Johnson, J. W.; Ren, F.; Han, J.; Polyakov, A. Y.; Smirnov, N. B.; Govorkov, A. V.; Redwing, J. M.; Lee, K. P.; Pearton, S. J.

2001-02-05T23:59:59.000Z

133

Above room-temperature operation of InAs/AlGaSb superlattice quantum cascade lasers emitting at 12 {mu}m  

SciTech Connect

The authors report on above-room-temperature operation of InAs/AlGaSb quantum cascade lasers emitting at 12 {mu}m. The laser structures are grown on a n-InAs (100) substrate using solid-source molecular beam epitaxy. An InAs/AlGaSb superlattice is used as an active part and an InAs double plasmon waveguide is used for optical confinement. Results show that increased doping concentration in the injection part of the active region expands the current operation range of the devices, allowing laser operation at and above room temperature. The observed threshold current density is 4.0 kA/cm{sup 2} at 300 K; the maximum operation temperature is 340 K.

Ohtani, K.; Moriyasu, Y.; Ohnishi, H.; Ohno, H. [Laboratory for Nanoelectronics and Semiconductor Spintronics, Research Institute of Electrical Communication, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577 (Japan)

2007-06-25T23:59:59.000Z

134

Analysis of the causes of the decrease in the electroluminescence efficiency of AlGaInN light-emitting-diode heterostructures at high pumping density  

SciTech Connect

The study is devoted to theoretical explanation of a decrease in the electroluminescence efficiency as the pump current increases, which is characteristic of light-emitting-diode (LED) heterostructures based on AlInGaN. Numerical simulation shows that the increase in the external quantum efficiency at low current densities J {approx} 1 A/cm{sup 2} is caused by the competition between radiative and nonradiative recombination. The decrease in the quantum efficiency at current densities J > 1 A/cm{sup 2} is caused by a decrease in the efficiency of hole injection into the active region. It is shown that the depth of the acceptor energy level in the AlGaN emitter, as well as low electron and hole mobilities in the p-type region, plays an important role in this effect. A modified LED heterostructure is suggested in which the efficiency decrease with the pump current should not occur.

Rozhansky, I. V., E-mail: igor@quantum.ioffe.ru; Zakheim, D. A. [Russian Academy of Sciences, Ioffe Physicotechnical Institute (Russian Federation)

2006-07-15T23:59:59.000Z

135

Accelerated Publication: Ge metal-oxide-semiconductor devices with Al2O3/Ga2O3(Gd2O3) as gate dielectric  

Science Conference Proceedings (OSTI)

Ga"2O"3(Gd"2O"3) [GGO] 3.5nm-thick, with an in situ Al"2O"3 cap 1.5nm thick, has been directly deposited on Ge substrate without employing interfacial passivation layers. The equivalent oxide thickness (EOT) of the gate stack is 1.38-nm. The metal-oxide-semiconductor ... Keywords: EOT, Germanium, High-? dielectric, MOS

L. K. Chu; T. H. Chiang; T. D. Lin; Y. J. Lee; R. L. Chu; J. Kwo; M. Hong

2012-03-01T23:59:59.000Z

136

Well-defined excited states of self-assembled InAs/InAlGaAs quantum dots on InP (001)  

SciTech Connect

Self-assembled InAs/InAlGaAs quantum dots (QDs) in an InAlGaAs matrix on InP (001) substrates were grown by the alternate growth method (AGQD), where an InAs layer with a thickness of 1 monolayer (ML) and an InAlGaAs layer with a thickness of 1 ML were alternately deposited. Cross-sectional transmission electron microscopy images indicated that the aspect ratio (height/width) for the AGQDs was {approx}0.25, which was higher than {approx}0.10 of conventionally grown InAs QDs. The photoluminescence (PL) peak position for the ground states of the AGQDs was 1.485 {mu}m with a linewidth broadening of 42 meV at room temperature, while the PL linewidth for the conventionally grown QDs was 85 meV. And the peaks for the excited-state transitions were also clearly observed from the excitation-power dependent PL. This is the first observation on the well-defined excited-state transitions from the InP-based InAs QDs, even though there were several reports on the features of the excited states.

Kim, Jin Soo; Lee, Jin Hong; Hong, Sung Ui; Kwack, Ho-Sang; Choi, Byung Seok; Oh, Dae Kon [Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI), Daejeon (Korea, Republic of)

2005-08-01T23:59:59.000Z

137

GaN High Power Devices  

SciTech Connect

A brief review is given of recent progress in fabrication of high voltage GaN and AlGaN rectifiers, GaN/AlGaN heterojunction bipolar transistors, GaN heterostructure and metal-oxide semiconductor field effect transistors. Improvements in epitaxial layer quality and in fabrication techniques have led to significant advances in device performance.

PEARTON,S.J.; REN,F.; ZHANG,A.P.; DANG,G.; CAO,X.A.; LEE,K.P.; CHO,H.; GILA,B.P.; JOHNSON,J.W.; MONIER,C.; ABERNATHY,C.R.; HAN,JUNG; BACA,ALBERT G.; CHYI,J.-I.; LEE,C.-M.; NEE,T.-E.; CHUO,C.-C.; CHI,G.C.; CHU,S.N.G.

2000-07-17T23:59:59.000Z

138

Optical properties of a-plane (Al, Ga)N/GaN multiple quantum wells grown on strain engineered Zn{sub 1-x}Mg{sub x}O layers by molecular beam epitaxy  

Science Conference Proceedings (OSTI)

Nonpolar (1120) Al{sub 0.2}Ga{sub 0.8}N/GaN multiple quantum wells (MQWs) have been grown by molecular beam epitaxy on (1120) Zn{sub 0.74}Mg{sub 0.26}O templates on r-plane sapphire substrates. The quantum wells exhibit well-resolved photoluminescence peaks in the ultra-violet region, and no sign of quantum confined Stark effect is observed in the complete multiple quantum well series. The results agree well with flat band quantum well calculations. Furthermore, we show that the MQW structures are strongly polarized along the [0001] direction. The origin of the polarization is discussed in terms of the strain anisotropy dependence of the exciton optical oscillator strengths.

Xia, Y.; Vinter, B.; Chauveau, J.-M. [CRHEA-CNRS, Rue Bernard Gregory, 06560 Valbonne (France); University of Nice Sophia-Antipolis, 06103 Nice (France); Brault, J.; Nemoz, M.; Teisseire, M.; Leroux, M. [CRHEA-CNRS, Rue Bernard Gregory, 06560 Valbonne (France)

2011-12-26T23:59:59.000Z

139

Long-wavelength laser based on self-assembled InAs quantum dots in InAlGaAs on InP (001)  

SciTech Connect

Seven stacks of self-assembled InAs quantum dots (QDs) separated by 28 nm thick InAlGaAs barriers were grown on InP (001) substrate by a solid-source molecular-beam epitaxy and were investigated by cross-sectional transmission electron microscopy and photoluminescence spectroscopy. Gain guided broad-area lasers with a stripe width of 75 {mu}m were fabricated by using the seven-stacked InAs QD layers with the InAlGaAs-InAlAs material system on InP (001). The lasing operation from InAs QDs was observed up to 260 K and the characteristic temperature of the uncoated QD laser calculated from the temperature dependence of threshold current density was 377 K for temperatures up to 200 K, and 138 K above 200 K. The drastic decrease in the characteristic temperature above 200 K was mainly related to the thermal behavior of carriers in QDs, and possibly the thermal coupling of the QDs to the wetting layer and the waveguide region.

Kim, Jin Soo; Lee, Jin Hong; Hong, Sung Ui; Han, Won Seok; Kwack, Ho-Sang; Lee, Chul Wook; Oh, Dae Kon [Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI), Daejeon (Korea, Republic of)

2004-08-09T23:59:59.000Z

140

LBNL-4183E-rev1 N NA AT TU UR RA AL L G GA AS S V VA AR RI  

NLE Websites -- All DOE Office Websites (Extended Search)

4183E-rev1 4183E-rev1 N NA AT TU UR RA AL L G GA AS S V VA AR RI IA AB BI IL LI IT TY Y I IN N C CA AL LI IF FO OR RN NI IA A: : E EN NV VI IR RO ON NM ME EN NT TA AL L I IM MP PA AC CT TS S A AN ND D D DE EV VI IC CE E P PE ER RF FO OR RM MA AN NC CE E E EX XP PE ER RI IM ME EN NT TA AL L E EV VA AL LU UA AT TI IO ON N O OF F I IN NS ST TA AL LL LE ED D C CO OO OK KI IN NG G E EX XH HA AU US ST T F FA AN N P PE ER RF FO OR RM MA AN NC CE E Brett C. Singer, William W. Delp and Michael G. Apte Indoor Environment Department Atmospheric Sciences Department Environmental Energy Technologies Division July 2011 (Revised February 2012) Disclaimer 1 This document was prepared as an account of work sponsored by the United States Government. While this document is believed to contain correct information, neither the United States Government nor any agency thereof, nor The Regents of the University of California, nor any of

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


141

Passivation of In{sub 0.53}Ga{sub 0.47}As/ZrO{sub 2} interfaces by AlN atomic layer deposition process  

SciTech Connect

Reducing defects at III-V/high-k interfaces is essential for optimizing devices built on these materials. Here, the role of an interfacial AlN process at In{sub 0.53}Ga{sub 0.47}As/ZrO{sub 2} interfaces is investigated by hard x-ray photoelectron spectroscopy (HAXPES) and capacitance/voltage (C-V) measurements. C-V measurements show a significant reduction in the density of interface traps with the interfacial AlN process and a capping TiN layer. To elucidate the specific role of the AlN process, blanket films with various deposition processes are compared. The AlN process alone (without subsequent dielectric deposition) reduces InGaAs oxide levels below the HAXPES detection limit, even though the AlN is ultimately found to be oxidized into AlO{sub x} with only trace N incorporation, yet AlN passivation provides a lower D{sub it} (density of interface traps) when compared with an H{sub 2}O-based Al{sub 2}O{sub 3} deposition. The AlN process does not passivate against re-oxidation of the InGaAs during an O{sub 3} based ZrO{sub 2} deposition process, but it does provide passivation against As-As development during subsequent TiN deposition. The role of chemical defects in the C-V characteristics is also discussed.

Weiland, C.; Woick, J. C. [National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States); Rumaiz, A. K. [National Synchrotron Light Source, Brookhaven National Laboratory, Upton, New York 11973 (United States); Price, J.; Lysaght, P. [SEMATECH, 257 Fuller Road, Albany, New York 12203 (United States)

2013-07-21T23:59:59.000Z

142

Thickness Effect of Al-Doped ZnO Window Layer on Damp-Heat Stability of CuInGaSe2 Solar Cells  

DOE Green Energy (OSTI)

We investigated the damp heat (DH) stability of CuInGaSe{sub 2} (CIGS) solar cells as a function of thickness of the Al-doped ZnO (AZO) window layer from the 'standard' 0.12 {micro}m to a modest 0.50 {micro}m over an underlying 0.10-{micro}m intrinsic ZnO buffer layer. The CIGS cells were prepared with external electrical contact using fine Au wire to the tiny 'standard' Ni/Al (0.05 {micro}m/3 {micro}m) metal grid contact pads. Bare cell coupons and sample sets encapsulated in a specially designed, Al-frame test structure with an opening for moisture ingress control using a TPT backsheet were exposed to DH at 85 C and 85% relative humidity, and characterized by current-voltage (I-V), quantum efficiency (QE), and (electrochemical) impedance spectroscopy (ECIS). The results show that bare cells exhibited rapid degradation within 50-100 h, accompanied by film wrinkling and delamination and corrosion of Mo and AlNi grid, regardless of AZO thickness. In contrast, the encapsulated cells did not show film wrinkling, delamination, and Mo corrosion after 168 h DH exposure; but the trend of efficiency degradation rate showed a weak correlation to the AZO thickness.

Pern, F. J.; Mansfield, L.; DeHart, C.; Glick, S. H.; Yan, F.; Noufi, R.

2011-01-01T23:59:59.000Z

143

Thickness Effect of Al-Doped ZnO Window Layer on Damp Heat Stability of CuInGaSe2 Solar Cells: Preprint  

DOE Green Energy (OSTI)

We investigated the damp heat (DH) stability of CuInGaSe2 (CIGS) solar cells as a function of thickness of the Al-doped ZnO (AZO) window layer from the 'standard' 0.12 ?m to a modest 0.50 ?m over an underlying 0.10-?m intrinsic ZnO buffer layer. The CIGS cells were prepared with external electrical contact using fine Au wire to the tiny 'standard' Ni/Al (0.05 ?m/3 ?m) metal grid contact pads. Bare cell coupons and sample sets encapsulated in a specially designed, Al-frame test structure with an opening for moisture ingress control using a TPT backsheet were exposed to DH at 85oC and 85% relative humidity, and characterized by current-voltage (I-V), quantum efficiency (QE), and (electrochemical) impedance spectroscopy (ECIS). The results show that bare cells exhibited rapid degradation within 50-100 h, accompanied by film wrinkling and delamination and corrosion of Mo and AlNi grid, regardless of AZO thickness. In contrast, the encapsulated cells did not show film wrinkling, delamination, and Mo corrosion after 168 h DH exposure; but the trend of efficiency degradation rate showed a weak correlation to the AZO thickness.

Pern, F. J.; Mansfield, L.; DeHart, C.; Glick, S. H.; Yan, F.; Noufi, R.

2011-07-01T23:59:59.000Z

144

Impacts of anisotropic lattice relaxation on crystal mosaicity and luminescence spectra of m-plane Al{sub x}Ga{sub 1-x}N films grown on m-plane freestanding GaN substrates by NH{sub 3} source molecular beam epitaxy  

SciTech Connect

In-plane anisotropic lattice relaxation was correlated with the crystal mosaicity and luminescence spectra for m-plane Al{sub x}Ga{sub 1-x}N films grown on a freestanding GaN substrate by NH{sub 3}-source molecular beam epitaxy. The homoepitaxial GaN film exhibited A- and B-excitonic emissions at 8 K, which obeyed the polarization selection rules. For Al{sub x}Ga{sub 1-x}N overlayers, the m-plane tilt mosaic along c-axis was the same as the substrate as far as coherent growth was maintained (x{<=}0.25). However, it became more severe than along the a-axis for lattice-relaxed films (x{>=}0.52). The results are explained in terms of anisotropic lattice and thermal mismatches between the film and the substrate. Nonetheless, all the Al{sub x}Ga{sub 1-x}N films exhibited a near-band-edge emission peak and considerably weak deep emission at room temperature.

Hoshi, T.; Hazu, K.; Ohshita, K.; Kagaya, M.; Onuma, T.; Chichibu, S. F. [CANTech, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577 (Japan); Fujito, K. [Optoelectronics Laboratory, Mitsubishi Chemical Corporation, 1000 Higashi-Mamiana, Ushiku 300-1295 (Japan); Namita, H. [Mitsubishi Chemical Group Science and Technology Research Center, Inc., 8-3-1 Chuo, Ami, Inashiki 300-0332 (Japan)

2009-02-16T23:59:59.000Z

145

Self-cleaning and surface recovery with arsine pretreatment in ex situ atomic-layer-deposition of Al2O3 on GaAs  

E-Print Network (OSTI)

. heavily doped GaAs 001 substrates at 650 °C with TMG Ga CH3 3 and arsine AsH3 V/III=23 with disilane Si2H6

146

Y2, Threading Defect Elimination in GaN Nanostructures  

Science Conference Proceedings (OSTI)

DD3, A New Approach to Make ZnO-Cu2O Heterojunctions for Solar Cells ... E2, AlGaAs/GaAs/GaN Wafer Fused HBTs with Ar Implanted Extrinsic Collectors.

147

Effective passivation of In{sub 0.2}Ga{sub 0.8}As by HfO{sub 2} surpassing Al{sub 2}O{sub 3} via in-situ atomic layer deposition  

SciTech Connect

High {kappa} gate dielectrics of HfO{sub 2} and Al{sub 2}O{sub 3} were deposited on molecular beam epitaxy-grown In{sub 0.2}Ga{sub 0.8}As pristine surface using in-situ atomic-layer-deposition (ALD) without any surface treatment or passivation layer. The ALD-HfO{sub 2}/p-In{sub 0.2}Ga{sub 0.8}As interface showed notable reduction in the interfacial density of states (D{sub it}), deduced from quasi-static capacitance-voltage and conductance-voltage (G-V) at room temperature and 100 Degree-Sign C. More significantly, the midgap peak commonly observed in the D{sub it}(E) of ALD-oxides/In{sub 0.2}Ga{sub 0.8}As is now greatly diminished. The midgap D{sub it} value decreases from {>=}15 Multiplication-Sign 10{sup 12} eV{sup -1} cm{sup -2} for ALD-Al{sub 2}O{sub 3} to {approx}2-4 Multiplication-Sign 10{sup 12} eV{sup -1} cm{sup -2} for ALD-HfO{sub 2}. Further, thermal stability at 850 Degree-Sign C was achieved in the HfO{sub 2}/In{sub 0.2}Ga{sub 0.8}As, whereas C-V characteristics of Al{sub 2}O{sub 3}/p-In{sub 0.2}Ga{sub 0.8}As degraded after the high temperature annealing. From in-situ x-ray photoelectron spectra, the AsO{sub x}, which is not the oxidized state from the native oxide, but is an induced state from adsorption of trimethylaluminum and H{sub 2}O, was found at the ALD-Al{sub 2}O{sub 3}/In{sub 0.2}Ga{sub 0.8}As interface, while that was not detected at the ALD-HfO{sub 2}/In{sub 0.2}Ga{sub 0.8}As interface.

Chang, Y. H.; Chiang, T. H. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Lin, C. A.; Liu, Y. T.; Lin, H. Y.; Huang, M. L.; Kwo, J. [Department of Physics, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Lin, T. D.; Hong, M. [Graduate Institute of Applied Physics and Department of Physics, National Taiwan University, Taipei 10617, Taiwan (China); Pi, T. W. [National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan (China)

2012-10-22T23:59:59.000Z

148

Accelerated aging of GaAs concentrator solar cells  

DOE Green Energy (OSTI)

An accelerated aging study of AlGaAs/GaAs solar cells has been completed. The purpose of the study was to identify the possible degradation mechanisms of AlGaAs/GaAs solar cells in terrestrial applications. Thermal storage tests and accelerated AlGaAs corrosion studies were performed to provide an experimental basis for a statistical analysis of the estimated lifetime. Results of this study suggest that a properly designed and fabricated AlGaAs/GaAs solar cell can be mechanically rugged and environmentally stable with projected lifetimes exceeding 100 years.

Gregory, P.E.

1982-04-01T23:59:59.000Z

149

Comparison of the properties of AlGaInN light-emitting diode chips of vertical and flip-chip design using silicon as the a submount  

SciTech Connect

Vertical and flip-chip light-emitting diode (LED) chips are compared from the viewpoint of the behavior of current spreading in the active region and the distribution of local temperatures and thermal resistances of chips. AlGaInN LED chips of vertical design are fabricated using Si as a submount and LED flipchips were fabricated with the removal of a sapphire substrate. The latter are also mounted on a Si submount. The active regions of both chips are identical and are about 1 mm{sup 2} in size. It is shown that both the emittance of the crystal surface in the visible range and the distribution of local temperatures estimated from radiation in the infrared region are more uniform in crystals of vertical design. Heat removal from flip-chips is insufficient in regions of the n contact, which do not possess good thermal contact with the submount. As a result, the total thermal resistances between the p-n junction and the submount both for the vertical chips and for flip-chips are approximately 1 K/W. The total area of the flip-chips exceeds that of the vertical design chips by a factor of 1.4.

Markov, L. K., E-mail: l.markov@mail.ioffe.ru; Smirnova, I. P.; Pavlyuchenko, A. S. [Russian Academy of Sciences, Ioffe Physical-Technical Institute (Russian Federation); Kukushkin, M. V.; Vasil'eva, E. D. [ZAO Innovation 'Tetis' (Russian Federation); Chernyakov, A. E. [Russian Academy of Sciences, Science-and-Technology Microelectronics Center (Russian Federation); Usikov, A. S. [De Core Nanosemiconductors Ltd. (India)

2013-03-15T23:59:59.000Z

150

GaSb molecular beam epitaxial growth on p-InP(001) and passivation with in situ deposited Al{sub 2}O{sub 3} gate oxide  

SciTech Connect

The integration of high carrier mobility materials into future CMOS generations is presently being studied in order to increase drive current capability and to decrease power consumption in future generation CMOS devices. If III-V materials are the candidates of choice for n-type channel devices, antimonide-based semiconductors present high hole mobility and could be used for p-type channel devices. In this work we first demonstrate the heteroepitaxy of fully relaxed GaSb epilayers on InP(001) substrates. In a second part, the properties of the Al{sub 2}O{sub 3}/GaSb interface have been studied by in situ deposition of an Al{sub 2}O{sub 3} high-{kappa} gate dielectric. The interface is abrupt without any substantial interfacial layer, and is characterized by high conduction and valence band offsets. Finally, MOS capacitors show well-behaved C-V with relatively low D{sub it} along the bandgap, these results point out an efficient electrical passivation of the Al{sub 2}O{sub 3}/GaSb interface.

Merckling, C.; Brammertz, G.; Hoffmann, T. Y.; Caymax, M.; Dekoster, J. [Interuniversity Microelectronics Center (IMEC vzw), Kapeldreef 75, 3001, Leuven (Belgium); Sun, X. [Katholieke Universiteit Leuven, Celestijnelaan 200D, 3001, Leuven (Belgium); Department of Electrical Engineering, Yale University, New Haven, Connecticut 06520-8284 (United States); Alian, A.; Heyns, M. [Interuniversity Microelectronics Center (IMEC vzw), Kapeldreef 75, 3001, Leuven (Belgium); Katholieke Universiteit Leuven, Celestijnelaan 200D, 3001, Leuven (Belgium); Afanas'ev, V. V. [Katholieke Universiteit Leuven, Celestijnelaan 200D, 3001, Leuven (Belgium)

2011-04-01T23:59:59.000Z

151

Ga Air Compressor, Ga Air Compressor Products, Ga Air ...  

U.S. Energy Information Administration (EIA)

Ga Air Compressor, You Can Buy Various High Quality Ga Air Compressor Products from Global Ga Air Compressor Suppliers and Ga Air Compressor ...

152

Electron transport in an In{sub 0.52}Al{sub 0.48}As/In{sub 0.53}Ga{sub 0.47}As/In{sub 0.52}Al{sub 0.48}As quantum well with a {delta}-Si doped barrier in high electric fields  

Science Conference Proceedings (OSTI)

The electron conduction in a two-dimensional channel of an In{sub 0.52}Al{sub 0.48}As/In{sub 0.53}Ga{sub 0.47}As/In{sub 0.52}Al{sub 0.48}As quantum well (QW) with a {delta}-Si doped barrier has been investigated. It is shown that the introduction of thin InAs barriers into the QW reduces the electron scattering rate from the polar optical and interface phonons localized in the QW and increases the electron mobility. It is found experimentally that the saturation of the conduction current in the In{sub 0.53}Ga{sub 0.47}As channel in strong electric fields is determined by not only the sublinear field dependence of the electron drift velocity, but also by the decrease in the electron concentration n{sub s} with an increase in the voltage across the channel. The dependence of n{sub s} on the applied voltage is due to the ionized-donor layer located within the {delta}-Si doped In{sub 0.52}Al{sub 0.48}As barrier and oriented parallel to the In{sub 0.53}Ga{sub 0.47}As QW.

Vasil'evskii, I. S.; Galiev, G. B.; Matveev, Yu. A.; Klimov, E. A.; Pozela, J., E-mail: pozela@pfi.lt [Russian Academy of Sciences, Institute of Microwave Semiconductor Electronics (Russian Federation); Pozela, K.; Suziedelis, A.; Paskevic, C.; Juciene, V. [Semiconductor Physics Institute (Lithuania)

2010-07-15T23:59:59.000Z

153

P8, Fabrication of Subwavelength Pillar Arrays on GaAs by Confined ...  

Science Conference Proceedings (OSTI)

DD3, A New Approach to Make ZnO-Cu2O Heterojunctions for Solar Cells ... E2, AlGaAs/GaAs/GaN Wafer Fused HBTs with Ar Implanted Extrinsic Collectors.

154

Structure and magnetic properties of the Al{sub 1-x}Ga{sub x}FeO{sub 3} family of oxides: A combined experimental and theoretical study  

Science Conference Proceedings (OSTI)

Magnetic properties of the Al{sub 1-x}Ga{sub x}FeO{sub 3} family of oxides crystallizing in a non-centrosymmetric space group have been investigated in detail along with structural aspects by employing X-ray and neutron diffraction, Moessbauer spectroscopy and other techniques. The study has revealed the occurrence of several interesting features related to unit cell parameters, site disorder and ionic size. Using first-principles density functional theory based calculations, we have attempted to understand how magnetic ordering and related properties in these oxides depend sensitively on disorder at the cation site. The origin and tendency of cations to disorder and the associated properties are traced to the local structure and ionic sizes. -- Graphical abstract: We have studied both experimentally and theoretically the important role of disorder at the cation site on magnetic and related properties of the Al{sub 1-x}Ga{sub x}FeO{sub 3} family of oxides crystallizing in a non-centrosymmetric space group. Display Omitted Research highlights: {yields} Interesting observations on cation site disorder, cell parameters and ionic size. {yields} Cation site disorder explains magnetic ordering. {yields} Demonstrates the importance of the A-site cations.

Saha, Rana; Shireen, Ajmala [Chemistry and Physics of Materials Unit, New Chemistry Unit, Theoretical Science Unit and International Centre for Materials Science, Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore 560 064 (India); Bera, A.K. [Bhabha Atomic Research Centre, Trombay, Mumbai 400 085 (India); Shirodkar, Sharmila N.; Sundarayya, Y.; Kalarikkal, Nandakumar [Chemistry and Physics of Materials Unit, New Chemistry Unit, Theoretical Science Unit and International Centre for Materials Science, Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore 560 064 (India); Yusuf, S.M. [Bhabha Atomic Research Centre, Trombay, Mumbai 400 085 (India); Waghmare, Umesh V. [Chemistry and Physics of Materials Unit, New Chemistry Unit, Theoretical Science Unit and International Centre for Materials Science, Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore 560 064 (India); Sundaresan, A., E-mail: sundaresan@jncasr.ac.i [Chemistry and Physics of Materials Unit, New Chemistry Unit, Theoretical Science Unit and International Centre for Materials Science, Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore 560 064 (India); Rao, C.N.R, E-mail: cnrrao@jncasr.ac.i [Chemistry and Physics of Materials Unit, New Chemistry Unit, Theoretical Science Unit and International Centre for Materials Science, Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore 560 064 (India)

2011-03-15T23:59:59.000Z

155

Synthesis and structural characterization of the ternary Zintl phases AE{sub 3}Al{sub 2}Pn{sub 4} and AE{sub 3}Ga{sub 2}Pn{sub 4} (AE=Ca, Sr, Ba, Eu; Pn=P, As)  

Science Conference Proceedings (OSTI)

Ten new ternary phosphides and arsenides with empirical formulae AE{sub 3}Al{sub 2}Pn{sub 4} and AE{sub 3}Ga{sub 2}Pn{sub 4} (AE=Ca, Sr, Ba, Eu; Pn=P, As) have been synthesized using molten Ga, Al, and Pb fluxes. They have been structurally characterized by single-crystal and powder X-ray diffraction to form with two different structures-Ca{sub 3}Al{sub 2}P{sub 4}, Sr{sub 3}Al{sub 2}As{sub 4}, Eu{sub 3}Al{sub 2}P{sub 4}, Eu{sub 3}Al{sub 2}As{sub 4}, Ca{sub 3}Ga{sub 2}P{sub 4}, Sr{sub 3}Ga{sub 2}P{sub 4}, Sr{sub 3}Ga{sub 2}As{sub 4}, and Eu{sub 3}Ga{sub 2}As{sub 4} crystallize with the Ca{sub 3}Al{sub 2}As{sub 4} structure type (space group C2/c, Z=4); Ba{sub 3}Al{sub 2}P{sub 4} and Ba{sub 3}Al{sub 2}As{sub 4} adopt the Na{sub 3}Fe{sub 2}S{sub 4} structure type (space group Pnma, Z=4). The polyanions in both structures are made up of TrPn{sub 4} tetrahedra, which share common corners and edges to form {sup 2}{sub {infinity}}[TrPn{sub 2}]{sub 3-} layers in the phases with the Ca{sub 3}Al{sub 2}As{sub 4} structure, and {sup 1}{sub {infinity}}[TrPn{sub 2}]{sub 3-} chains in Ba{sub 3}Al{sub 2}P{sub 4} and Ba{sub 3}Al{sub 2}As{sub 4} with the Na{sub 3}Fe{sub 2}S{sub 4} structure type. The valence electron count for all of these compounds follows the Zintl-Klemm rules. Electronic band structure calculations confirm them to be semiconductors. - Graphical abstract: AE{sub 3}Al{sub 2}Pn{sub 4} and AE{sub 3}Ga{sub 2}Pn{sub 4} (AE=Ca, Sr, Ba, Eu; Pn=P, As) crystallize in two different structures-Ca{sub 3}Al{sub 2}P{sub 4}, Sr{sub 3}Al{sub 2}As{sub 4}, Eu{sub 3}Al{sub 2}P{sub 4}, Eu{sub 3}Al{sub 2}As{sub 4}, Ca{sub 3}Ga{sub 2}P{sub 4}, Sr{sub 3}Ga{sub 2}P{sub 4}, Sr{sub 3}Ga{sub 2}As{sub 4}, and Eu{sub 3}Ga{sub 2}As{sub 4}, are isotypic with the previously reported Ca{sub 3}Al{sub 2}As{sub 4} (space group C2/c (No. 15)), while Ba{sub 3}Al{sub 2}P{sub 4} and Ba{sub 3}Al{sub 2}As{sub 4} adopt a different structure known for Na{sub 3}Fe{sub 2}S{sub 4} (space group Pnma (No. 62). The polyanions in both structures are made up of TrPn{sub 4} tetrahedra, which by sharing common corners and edges, form {sup 2}{sub {infinity}}[TrPn{sub 2}]{sub 3-}layers in the former and {sup 1}{sub {infinity}}[TrPn{sub 2}]{sub 3-} chains in Ba{sub 3}Al{sub 2}P{sub 4} and Ba{sub 3}Al{sub 2}As{sub 4}. Highlights: Black-Right-Pointing-Pointer AE{sub 3}Ga{sub 2}Pn{sub 4} (AE=Ca, Sr, Ba, Eu; Pn=P, As) are new ternary pnictides. Black-Right-Pointing-Pointer Ba{sub 3}Al{sub 2}P{sub 4} and Ba{sub 3}Al{sub 2}As{sub 4} adopt the Na{sub 3}Fe{sub 2}S{sub 4} structure type. Black-Right-Pointing-Pointer The Sr- and Ca-compounds crystallize with the Ca{sub 3}Al{sub 2}As{sub 4} structure type. Black-Right-Pointing-Pointer The valence electron count for all title compounds follows the Zintl-Klemm rules.

He, Hua; Tyson, Chauntae; Saito, Maia [Department of Chemistry and Biochemistry, University of Delaware, Newark, DE 19716 (United States); Bobev, Svilen, E-mail: bobev@udel.edu [Department of Chemistry and Biochemistry, University of Delaware, Newark, DE 19716 (United States)

2012-04-15T23:59:59.000Z

156

Synchrotron Radiation Photoemission Spectroscopic Study of Band Offsets and Interface Self-cleaning by Atomic Layer Deposited HfO2 on In0.53Ga0.47As and In0.52Al0.48As  

SciTech Connect

The Synchrotron Radiation Photoemission Spectroscopic (SRPES) study was conducted to (a) investigate the surface chemistry of In{sub 0.53}Ga{sub 0.47}As and In{sub 0.52}Al{sub 0.48}As post chemical and thermal treatments, (b) construct band diagram and (c) investigate the interface property of HfO{sub 2}/In{sub 0.53}Ga{sub 0.47}As and HfO{sub 2}/In{sub 0.52}Al{sub 0.48}As. Dilute HCl and HF etch remove native oxides on In{sub 0.53}Ga{sub 0.47}As and In{sub 0.52}Al{sub 0.47}As, whereas in-situ vacuum annealing removes surface arsenic pile-up. After the atomic layer deposition of HfO{sub 2}, native oxides were considerably reduced compared to that in as-received epi-layers, strongly suggesting the self-clean mechanism. Valence and conduction band offsets are measured to be 3.37 {+-} 0.1eV, 1.80 {+-} 0.3eV for In{sub 0.53}Ga{sub 0.47}As and 3.00 {+-} 0.1eV, 1.47 {+-} 0.3eV for In{sub 0.52}Al{sub 0.47}As, respectively.

Kobayashi, Masaharu; /SLAC, SSRL; Chen, P.T.; Sun, Y.; Goel, N.; Majhi, P.; Garner, M; Tsai, W.; Pianetta, P.; Nishi, Y.; /SLAC, SSRL

2008-10-31T23:59:59.000Z

157

HH8, Characterization of Thin InAlP Native Oxide Gate Dielectric ...  

Science Conference Proceedings (OSTI)

DD3, A New Approach to Make ZnO-Cu2O Heterojunctions for Solar Cells ... E2, AlGaAs/GaAs/GaN Wafer Fused HBTs with Ar Implanted Extrinsic Collectors.

158

BB2, Novel Cs-Free GaN Photocathodes  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

159

Simulation and Design Analysis of (A1Ga)As/GaAs MODFET Integrated Circuits  

Science Conference Proceedings (OSTI)

A new (AlGa)As/GaAs MODFET integrated circuit simulator is described. Our simulator is a customized version of SPICE incorporating the extended charge control model for MODFET's and the velocity saturation model for ungated FET's used as the load devices. ...

Choong H. Hyun; M. S. Shur; N. C. Cirillo

2006-11-01T23:59:59.000Z

160

PhD Chemical Engineering MS Chemical Engineering  

E-Print Network (OSTI)

1 PhD Chemical Engineering MS Chemical Engineering Bylaws Gene and Linda Voiland School of ChemicalD Chemical Engineering, MS Chemical Engineering B. Discipline: Edgar, et al.1 provide a succinct description of chemical engineering: "chemical engineers seek to understand, manipulate, and control the molecular basis

Collins, Gary S.

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


161

Electric field engineering in GaN high electron mobility transistors  

E-Print Network (OSTI)

In the last few years, AlGaN/GaN high electron mobility transistors (HEMTs) have become the top choice for power amplification at frequencies up to 20 GHz. Great interest currently exists in industry and academia to increase ...

Zhao, Xu, S.M. Massachusetts Institute of Technology

2008-01-01T23:59:59.000Z

162

LA-11224-MS  

Office of Scientific and Technical Information (OSTI)

11224-MS 11224-MS UC-66a and UC-70 Issued: March 1988 LA--112 2 4-MS DE88 005902 FEHM: Finite Element Heat and Mass Transfer Code George Zyvoloski Zora Dash Sharad Kelkar DISCLAIMER This report was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government nor any agency thereof, nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsi- bility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Refer- ence herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise does not necessarily constitute or imply its endorsement, recom-

163

lntersubbancl transitions in high indium content InGaAs/AIGaAs quantum wells  

E-Print Network (OSTI)

lntersubbancl transitions in high indium content InGaAs/AIGaAs quantum wells H. C. Chui, S. M. Lord report the first observation of intersubband transitions in In,Ga, -#s(y=O.3,0.5)/ AlGaAs quantum wells. These quantum wells were grown on a GaAs substrate with a linearly graded InGaAs buffer to achieve strain

Fejer, Martin M.

164

Lattice-matched epitaxial GaInAsSb/GaSb thermophotovoltaic devices  

DOE Green Energy (OSTI)

The materials development of Ga{sub 1{minus}x}In{sub x}As{sub y}Sb{sub 1{minus}y} alloys for lattice-matched thermophotovoltaic (TPV) devices is reported. Epilayers with cutoff wavelength 2--2.4 {micro}m at room temperature and lattice-matched to GaSb substrates were grown by both low-pressure organometallic vapor phase epitaxy and molecular beam epitaxy. These layers exhibit high optical and structural quality. For demonstrating lattice-matched thermophotovoltaic devices, p- and n-type doping studies were performed. Several TPV device structures were investigated, with variations in the base/emitter thicknesses and the incorporation of a high bandgap GaSb or AlGaAsSb window layer. Significant improvement in the external quantum efficiency is observed for devices with an AlGaAsSb window layer compared to those without one.

Wang, C.A.; Choi, H.K.; Turner, G.W.; Spears, D.L.; Manfra, M.J. [Massachusetts Inst. of Tech., Lexington, MA (United States). Lincoln Lab.; Charache, G.W. [Lockheed Martin, Inc., Schenectady, NY (United States)

1997-05-01T23:59:59.000Z

165

Properties of double-layered Ga-doped Al-zinc-oxide/titanium-doped indium-tin-oxide thin films prepared by dc magnetron sputtering applied for Si-based thin film solar cells  

Science Conference Proceedings (OSTI)

In this article, Ga-doped Al-zinc-oxide (GAZO)/titanium-doped indium-tin-oxide (ITIO) bi-layer films were deposited onto glass substrates by direct current (dc) magnetron sputtering. The bottom ITIO film, with a thickness of 200 nm, was sputtered onto the glass substrate. The ITIO film was post-annealed at 350 deg. C for 10-120 min as a seed layer. The effect of post-annealing conditions on the morphologies, electrical, and optical properties of ITIO films was investigated. A GAZO layer with a thickness of 1200 nm was continuously sputtered onto the ITIO bottom layer. The results show that the properties of the GAZO/ITIO films were strongly dependent on the post-annealed conditions. The spectral haze (T{sub diffuse}/T{sub total}) of the GAZO/ITIO bi-layer films increases upon increasing the post-annealing time. The haze and resistivity of the GAZO/ITIO bi-layer films were improved with the post-annealed process. After optimizing the deposition and annealing parameters, the GAZO/ITIO bi-layer film has an average transmittance of 83.20% at the 400-800 nm wavelengths, a maximum haze of 16%, and the lowest resistivity of 1.04 x 10{sup -3}{Omega} cm. Finally, the GAZO/ITIO bi-layer films, as a front electrode for silicon-based thin film solar cells, obtained a maximum efficiency of 7.10%. These encouraging experimental results have potential applications in GAZO/ITIO bi-layer film deposition by in-line sputtering without the wet-etching process and enable the production of highly efficient, low-cost thin film solar cells.

Wang, Chao-Chun; Wuu, Dong-Sing; Lin, Yang-Shih; Lien, Shui-Yang; Huang, Yung-Chuan; Liu, Chueh-Yang; Chen, Chia-Fu; Nautiyal, Asheesh; Lee, Shuo-Jen [Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan (China); Department of Materials Science and Engineering, MingDao University, Changhua 52345, Taiwan (China); Department of Mechanical Engineering, Yuan Ze University, Taoyuan 320, Taiwan (China)

2011-11-15T23:59:59.000Z

166

LA-10256-MS  

Office of Legacy Management (LM)

10256-MS 10256-MS Los Alamos National Laboratory is operated by the University of California for the United States Department of Energy under contract W-7405-ENG-36. Radiological Survey and Evaluation of the Fallout Area fom the Trinity Test: Chupadera Mesa and White Sands Misile Range, New Mexco - ~ ~S1S' :ts rV T Los Alamos National Laboratory Ly© /.aU U UwHjm ©,Los Alamos, New Mexico 87545 An Affirmative Action/Equal Opportunity Employer Prepared by Kathy Derouin, Group HSE-8 DISCLAIMER This report was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government nor any agency thereof, nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness,

167

X=Bi, Sb, Al, Ga  

Science Conference Proceedings (OSTI)

... Nd-Fe-B Permanent Magnets · Unique Exchange Bias Induced by Antiferromagnetic Cr-oxide · ZnO-graphene Hybrid Quantum Dots Light Emitting Diode ...

168

InGaAs and Ge MOSFETs with high ? dielectrics  

Science Conference Proceedings (OSTI)

InGaAs and Ge MOSFETs with high @k's are now the leading candidates for technology beyond the 15nm node CMOS. The UHV-Al"2O"3/Ga"2O"3(Gd"2O"3) [GGO]/InGaAs has low electrical leakage current densities, C-V characteristics with low interfacial densities ... Keywords: Atomic layer deposition, Germanium, High ? dielectrics, III-V Compound semiconductor, MOSFETs, Molecular beam epitaxy

W. C. Lee; P. Chang; T. D. Lin; L. K. Chu; H. C. Chiu; J. Kwo; M. Hong

2011-04-01T23:59:59.000Z

169

China Ga Air Compressor, China Ga Air Compressor Products ...  

U.S. Energy Information Administration (EIA)

China Ga Air Compressor, China Ga Air Compressor Suppliers and Manufacturers Directory - Source a Large Selection of Ga Air Compressor Products at ...

170

M&S methodological challenges  

Science Conference Proceedings (OSTI)

M&S provides a formal way to generate or test existing knowledge. Like mathematics, M&S provides an apparatus for deduction while generating data that can be used for statistical inference. However, unlike mathematics, M&S's formal approach varies from ... Keywords: epistemology, methodology, philosophy

Jose J. Padilla, Andreas Tolk, Saikou Y. Diallo

2013-04-01T23:59:59.000Z

171

Seamless On-Wafer Integration of Si(100) MOSFETs and GaN HEMTs  

E-Print Network (OSTI)

The first on-wafer integration of Si(100) MOSFETs and AlGaN/GaN high electron mobility transistors (HEMTs) is demonstrated. To enable a fully Si-compatible process, we fabricated a novel Si(100)-GaN-Si(100) virtual substrate ...

Piner, Edwin L.

172

Is LA-12152-MS  

Office of Scientific and Technical Information (OSTI)

Is Is LA-12152-MS DE91 016813 A Weibull Brittle Material Failure Model for the ABAQUS Computer Program Joel Bennett L ('r^^r5' /A\ n^rnr?i/'7^(^ '-°s Alamos National Laboratory l y j ^ /AAUCSILI LI U i y j ^ LOS Alamos.New Mexico 87545 ^ _ . * i - DISCLAIMER This report was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government nor any agency Thereof, nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product,

173

MS, II-J  

Office of Legacy Management (LM)

I' ; ,' I' ; ,' Departm&th of Energy 1 MS, II-J Washington. DC 20585 ' . I I The Honorable John Gallagher ,)fl', /',' ' 103 E. Michigan Avenue .i., ,.' Battle Creek, Michigan 49016 _. Dear Mayor Gallagheri d,---, " '/ approachto openness i.n: with the: public. In (FUSRAP)i.is responsible agencies, determining ~author~ity, performing remedial action to cleanup sites to meet current radiological protection requirements.. A conservative set of technical evaluation guidelines is used in these investigations to assure protection of public health,,~safety and then environment. Where.DQE does not,have .authority for proceeding; the available site information is forwarded to the appropriate Federal or State Agency. DOE studied the historical records of the former Oliver Corp. site, and it

174

Ms. Sharon M. Fiorillo  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Sharon M. Fiorillo Sharon M. Fiorillo 6927 Wilson Street West Mifflin, PA 15122 Dear Ms. Fiorillo: Department of Energy Washington, DC 20585 MAR - 5 2008_ Re: OHA Case No. TBB-0070 This letter concerns the complaint of retaliation that you filed with the Department of Energy (DOE) under 10 C.F.R. Part 708. On August 20, 2007, the Office of Hearings and Appeals (OHA) received your petition for Secretarial review of the July 16, 2007, jurisdictional appeal decision issued by the OHA Acting Director. You filed a statement of arguments in support of your position on September 4, 2007. 'Onder the Part 708 regulations, the Secretary will reverse or revise an appeal decision by the OHA Director only in extraordinary circumstances. 10 C.F.R. § 708.19. The basis of this proceeding is your contention that you made a

175

In situ atomic layer deposition and synchrotron-radiation photoemission study of Al2O3 on pristine n-GaAs(0 0 1)-4×6 surface  

Science Conference Proceedings (OSTI)

This work presents the in situ reflection high-energy electron diffraction (RHEED), scanning tunneling microscopy (STM) and synchrotron-radiation photoemission studies for the morphological and interfacial chemical characterization of in situ atomic ... Keywords: Atomic layer deposition, GaAs, Molecular beam epitaxy, Synchrotron-radiation photoemission

Y. H. Chang; M. L. Huang; P. Chang; J. Y. Shen; B. R. Chen; C. L. Hsu; T. W. Pi; M. Hong; J. Kwo

2011-07-01T23:59:59.000Z

176

JJ3, Anisotropic Carrier Mobility in GaN Quantum Well  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

177

LATE NEWS: L7, Molecular Beam Epitaxy of N-Polar InGaN  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

178

Y5, Electrochemical Etching of GaN and Its Applications  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

179

Collapse for Higher Gate Voltages in N-Polar GaN  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

180

N7, Olefin Metathesis Reaction on GaN (0001) Surfaces  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

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While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
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Index
181

Dielectrics for GaN based MIS-diodes  

SciTech Connect

GaN MIS diodes were demonstrated utilizing AlN and Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) as insulators. A 345 {angstrom} of AlN was grown on the MOCVD grown n-GaN in a MOMBE system using trimethylamine alane as Al precursor and nitrogen generated from a wavemat ECR N2 plasma. For the Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) growth, a multi MBE chamber was used and a 195 {angstrom} oxide is E-beam evaporated from a single crystal source of Ga{sub 5}Gd{sub 3}O{sub 12}. The forward breakdown voltage of AlN and Ga{sub 2}O{sub 3}(Gd{sub 2}O{sub 3}) diodes are 5V and 6V, respectively, which are significantly improved from {approximately} 1.2 V of schottky contact. From the C-V measurements, both kinds of diodes showed good charge modulation from accumulation to depletion at different frequencies. The insulator GaN interface roughness and the thickness of the insulator were measured with x-ray reflectivity.

Ren, F.; Abernathy, C.R.; MacKenzie, J.D. [Univ. of Florida, Gainesville, FL (United States)] [and others

1998-02-01T23:59:59.000Z

182

Workshops: MS&T '04  

Science Conference Proceedings (OSTI)

Sep 26, 2004 ... Office of Legislative and Public Affairs National Science Foundation Ms. Hanson has worked in the media and public affairs business for more ...

183

METLIN: MS/MS metabolite data from the MAGGIE Project  

DOE Data Explorer (OSTI)

METLIN is a metabolite database for metabolomics containing over 50,000 structures, it also represents a data management system designed to assist in a broad array of metabolite research and metabolite identification by providing public access to its repository of current and comprehensive MS/MS metabolite data. An annotated list of known metabolites and their mass, chemical formula, and structure are available on the METLIN website. Each metabolite is conveniently linked to outside resources such as the the Kyoto Encyclopedia of Genes and Genomes (KEGG) for further reference and inquiry. MS/MS data is also available on many of the metabolites. The list is expanding continuously as more metabolite information is being deposited and discovered. [Copied from http://metlin.scripps.edu/]

Metlin is a component of the MAGGIE Project. MAGGIE is funded by the DOE Genomics: GTL and is an acronym for "Molecular Assemblies, Genes, and Genomics Integrated Efficiently."

184

Al-Cr -2007-1 February 1, 2007 Aluminum and Chromium Leaching ...  

Al-Cr -2007-1 February 1, 2007 Aluminum and Chromium Leaching Workshop Atlanta, GA January 23 – 24, 2007 Crowne Plaza – Airport Feedback Questionnaire

185

Micro-Photoluminescence Characterization of Low Density Droplet GaAs Quantum Dots for Single Photon Sources  

Science Conference Proceedings (OSTI)

The GaAs quantum dots in AlGaAs barriers were grown by droplet epitaxy, emitting around 700 nm in wavelength which is compatible with low cost Si based detectors. The excitation power dependent and time resolved micro-photoluminescence measurements identified optical characteristics of exciton and biexciton states which are attributed to good quantum confinements in GaAs QDs.

Ha, S.-K.; Song, J. D.; Lim, J. Y.; Choi, W. J.; Han, I. K.; Lee, J. I. [Nano Convergence Devices Center, KIST, Seoul 136-791 (Korea, Republic of); Bounouar, S.; Donatini, F.; Dang, L. S.; Poizat, J. P. [CEA/CNRS/UJF team 'Nanophysics and semiconductors', Institute Neel/CNRS-UJF, 38042 Grenoble (France); Kim, J. S. [Department of Physics, Yeungnam University, Gyeongsan 712-749 (Korea, Republic of)

2011-12-23T23:59:59.000Z

186

ALS Spectrum  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS Spectrum Print Begun in 2007, ALS Spectrum is a publication that encapsulates the same type of information contained in the ALS Activity Report but in a short, readable,...

187

ALS Spectrum  

NLE Websites -- All DOE Office Websites (Extended Search)

Spectrum Print Begun in 2007, ALS Spectrum is a publication that encapsulates the same type of information contained in the ALS Activity Report but in a short, readable,...

188

Ba-Ga (Barium - Gallium)  

Science Conference Proceedings (OSTI)

Ba-Ga crystallographic data...Ba-Ga crystallographic data Phase Composition, wt% Ga Pearson symbol Space group (Ba) 0 cI 2 Im m Ba 10 Ga 4.8 cF 176 Fd m Ba 8 Ga 7 30.8 cP 60 P 2 1 3 BaGa 2 50.4 hP 3 P 6/ mmm BaGa 4 67 tI 10 I 4/ mmm (Ga) 100 hP 2 P 6 3 / mmc...

189

Analysis of mechanisms of carrier emission in the p-i-n structures with In(Ga)As quantum dots  

SciTech Connect

With the help of the photocurrent spectroscopy, the mechanism of emission of charge carriers from energy levels of the (In,Ga)As/(Al,Ga)As quantum dots of different design are studied. Thermal activation is shown to be the main mechanism of carrier emission from the quantum dots for the isolated layer of quantum dots separated by wide (Al,Ga)As spacer layers. At a small width of the (Al,Ga)As spacer layer, when electron binding of separate layers of the quantum dots in the vertical direction takes place, the role of the tunneling mechanism of carrier emission between the vertically coupled quantum dots increases.

Shatalina, E. S., E-mail: Shatalina@mail.ioffe.ru; Blokhin, S. A.; Nadtochy, A. M.; Payusov, A. S.; Savelyev, A. V.; Maximov, M. V.; Zhukov, A. E. [St. Petersburg Academic University, Nanotechnology Research and Education Centre (Russian Federation); Ledentsov, N. N. [Russian Academy of Sciences, Ioffe Physical Technical Institute (Russian Federation); Kovsh, A. R.; Mikhrin, S. S.; Ustinov, V. M. [Innolume GmbH (Germany)

2010-10-15T23:59:59.000Z

190

Ultra High p-doping Material Research for GaN Based Light Emitters  

Science Conference Proceedings (OSTI)

The main goal of the Project is to investigate doping mechanisms in p-type GaN and AlGaN and controllably fabricate ultra high doped p-GaN materials and epitaxial structures. Highly doped p-type GaN-based materials with low electrical resistivity and abrupt doping profiles are of great importance for efficient light emitters for solid state lighting (SSL) applications. Cost-effective hydride vapor phase epitaxial (HVPE) technology was proposed to investigate and develop p-GaN materials for SSL. High p-type doping is required to improve (i) carrier injection efficiency in light emitting p-n junctions that will result in increasing of light emitting efficiency, (ii) current spreading in light emitting structures that will improve external quantum efficiency, and (iii) parameters of Ohmic contacts to reduce operating voltage and tolerate higher forward currents needed for the high output power operation of light emitters. Highly doped p-type GaN layers and AlGaN/GaN heterostructures with low electrical resistivity will lead to novel device and contact metallization designs for high-power high efficiency GaN-based light emitters. Overall, highly doped p-GaN is a key element to develop light emitting devices for the DOE SSL program. The project was focused on material research for highly doped p-type GaN materials and device structures for applications in high performance light emitters for general illumination P-GaN and p-AlGaN layers and multi-layer structures were grown by HVPE and investigated in terms of surface morphology and structure, doping concentrations and profiles, optical, electrical, and structural properties. Tasks of the project were successfully accomplished. Highly doped GaN materials with p-type conductivity were fabricated. As-grown GaN layers had concentration N{sub a}-N{sub d} as high as 3 x 10{sup 19} cm{sup -3}. Mechanisms of doping were investigated and results of material studies were reported at several International conferences providing better understanding of p-type GaN formation for Solid State Lighting community. Grown p-type GaN layers were used as substrates for blue and green InGaN-based LEDs made by HVPE technology at TDI. These results proved proposed technical approach and facilitate fabrication of highly conductive p-GaN materials by low-cost HVPE technology for solid state lighting applications. TDI has started the commercialization of p-GaN epitaxial materials.

Vladimir Dmitriev

2007-06-30T23:59:59.000Z

191

LA-5097-MS INFORMAL REPORT  

Office of Legacy Management (LM)

5097-MS 5097-MS INFORMAL REPORT lamos lamos scientific laboratory scientific laboratory of the University of California of the University of California LOS ALAMOS. NEW MEXICO 87544 LOS ALAMOS. NEW MEXICO 87544 Los AIamos Land Areas Environmental Radiation Survey 1972 . In the interest of prompt distribution, this LAMS re port was not edited by the Technical Information staff. Printed in the United States of America. Available from National Technical Information Service U. S. Department of Commerce 5285 Port Royal Road Springfield, Virginia 22151 Price: Printed Copy $3.00; Microfiche $0.95 * ii. : . IOS alamos LA-5097.MS Informal Report UC-41 ISSUED: November 1972 sctentific laboratory of the University of California LOS ALAMO% NEW MEXICO 81544 I L Los Alamos Land Areas

192

Category:Jackson, MS | Open Energy Information  

Open Energy Info (EERE)

MS MS Jump to: navigation, search Go Back to PV Economics By Location Media in category "Jackson, MS" The following 16 files are in this category, out of 16 total. SVFullServiceRestaurant Jackson MS Entergy Mississippi Inc.png SVFullServiceRestauran... 63 KB SVHospital Jackson MS Entergy Mississippi Inc.png SVHospital Jackson MS ... 74 KB SVLargeHotel Jackson MS Entergy Mississippi Inc.png SVLargeHotel Jackson M... 63 KB SVLargeOffice Jackson MS Entergy Mississippi Inc.png SVLargeOffice Jackson ... 72 KB SVMediumOffice Jackson MS Entergy Mississippi Inc.png SVMediumOffice Jackson... 72 KB SVMidriseApartment Jackson MS Entergy Mississippi Inc.png SVMidriseApartment Jac... 62 KB SVOutPatient Jackson MS Entergy Mississippi Inc.png SVOutPatient Jackson M... 74 KB

193

BOOSTER EXTRACTION, BOOSTER-TO-STORAGE RING TRANSPORT AND STORAGE RING INJECTION FOR THE ALS  

E-Print Network (OSTI)

Storage Ring Injection for the ALS M.S. Zisman March 1988Ring Injection for the ALS Michael S. Zisman Exploratoryon the design of the ALS injection system is presented. The

Zisman, M.S.

2010-01-01T23:59:59.000Z

194

The Effect of Periodic Silane Burst on the Properties of GaN on Si (111) Substrates  

E-Print Network (OSTI)

The periodic silane burst technique was employed during metalorganic chemical vapor deposition of epitaxial GaN on AlN buffer layers grown on Si (111). Periodic silicon delta doping during growth of both the AlN and GaN ...

Zang, Keyan

195

T4, Morphological Development of Homoepitaxial AlN Thin Films ...  

Science Conference Proceedings (OSTI)

L6, PECVD-SiN, Si or Si/Al2O3-Capped ED-Mode AlN/GaN Inverters · Hide details for [

196

Growth and development of GaInAsP for use in high-efficiency solar cells  

DOE Green Energy (OSTI)

This report describes work done during Phase II of the subcontract. Goals for Phase II include the following: (1) Optimize the GaInAsP cell on GaAs and demonstrate a 500-sun at air mass (AM) 1.5 efficiency of >23%. (2) Develop a window layer, including the evaluation of AlGaAs, GaInP, AlGaAsP, AlGaInP, and GaP. (3) Develop a front-surface contact, with a grid designed for 500-sun concentration, and a goal of a contact resistivity of [approximately]10[sup 5] ohm-cm[sup 2]. (4) Grow GaInAsP cells on Ge, with a goal of a 1-sun (AM 1.5) efficiency of >15%. Accomplishments reported herein include (1) the fabrication of p-on-n and n-on-p GaInAsP cells on GaAs, with the n-on-p cell demonstrating a 10-sun (AM 1.5) active-area efficiency of 23.4% as measured at NREL (2) the evaluation of Al[sub x]Ga([sub 1-x])As, GaInP[sub 2], and AlInP[sub 2] window layers; and (3) the fabrication of GaInAsP cells on Ge, with the demonstration of a p-on-n GaInAsP cell grown on Ge with a 1-sun (AM 1.5) active-area efficiency of 14.4%.

Sharps, P.R. (Research Triangle Inst., Research Triangle Park, NC (United States))

1993-04-01T23:59:59.000Z

197

Step-Wise Exothermic Reactions in Cold-Rolled Ni/Al, Ti/Al, and Ta ...  

Science Conference Proceedings (OSTI)

Aerosol Route Synthesis of Copper Oxide Nanoparticles Using Copper Nitrate Solution · AlGaAs-Based Optical ... Defect Energetics and Fission Product Transport in ZrC ... Enhancing Mineral Beneficiation by High Intensity Power Ultrasound.

198

Ms  

NLE Websites -- All DOE Office Websites (Extended Search)

Bogart provided legal support on issues regarding public contract acquisitions, appropriations law, environmental law, transportation, security and national defense. Since...

199

Materials physics and device development for improved efficiency of GaN HEMT high power amplifiers.  

SciTech Connect

GaN-based microwave power amplifiers have been identified as critical components in Sandia's next generation micro-Synthetic-Aperture-Radar (SAR) operating at X-band and Ku-band (10-18 GHz). To miniaturize SAR, GaN-based amplifiers are necessary to replace bulky traveling wave tubes. Specifically, for micro-SAR development, highly reliable GaN high electron mobility transistors (HEMTs), which have delivered a factor of 10 times improvement in power performance compared to GaAs, need to be developed. Despite the great promise of GaN HEMTs, problems associated with nitride materials growth currently limit gain, linearity, power-added-efficiency, reproducibility, and reliability. These material quality issues are primarily due to heteroepitaxial growth of GaN on lattice mismatched substrates. Because SiC provides the best lattice match and thermal conductivity, SiC is currently the substrate of choice for GaN-based microwave amplifiers. Obviously for GaN-based HEMTs to fully realize their tremendous promise, several challenges related to GaN heteroepitaxy on SiC must be solved. For this LDRD, we conducted a concerted effort to resolve materials issues through in-depth research on GaN/AlGaN growth on SiC. Repeatable growth processes were developed which enabled basic studies of these device layers as well as full fabrication of microwave amplifiers. Detailed studies of the GaN and AlGaN growth of SiC were conducted and techniques to measure the structural and electrical properties of the layers were developed. Problems that limit device performance were investigated, including electron traps, dislocations, the quality of semi-insulating GaN, the GaN/AlGaN interface roughness, and surface pinning of the AlGaN gate. Surface charge was reduced by developing silicon nitride passivation. Constant feedback between material properties, physical understanding, and device performance enabled rapid progress which eventually led to the successful fabrication of state of the art HEMT transistors and amplifiers.

Kurtz, Steven Ross; Follstaedt, David Martin; Wright, Alan Francis; Baca, Albert G.; Briggs, Ronald D.; Provencio, Paula Polyak; Missert, Nancy A.; Allerman, Andrew Alan; Marsh, Phil F.; Koleske, Daniel David; Lee, Stephen Roger; Shul, Randy John; Seager, Carleton Hoover; Tigges, Christopher P.

2005-12-01T23:59:59.000Z

200

Method for factor analysis of GC/MS data  

Science Conference Proceedings (OSTI)

The method of the present invention provides a fast, robust, and automated multivariate statistical analysis of gas chromatography/mass spectroscopy (GC/MS) data sets. The method can involve systematic elimination of undesired, saturated peak masses to yield data that follow a linear, additive model. The cleaned data can then be subjected to a combination of PCA and orthogonal factor rotation followed by refinement with MCR-ALS to yield highly interpretable results.

Van Benthem, Mark H; Kotula, Paul G; Keenan, Michael R

2012-09-11T23:59:59.000Z

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Index
Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
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Index
201

Ga-Zr (Gallium - Zirconium)  

Science Conference Proceedings (OSTI)

Ga-Zr crystallographic data...Ga 5 Zr 3 44.0 oC 32 Cmcm Ga 3 Zr 2 47 oF 40 Fdd 2 βGaZr 56.7 � � αGaZr 56.7 tI 16 I 4 1 / amd Ga 4 Zr 5 62.1 hP 18 P 6 3 / mcm Ga 2 Zr 3 66 tP 10 P 4/ mbm Ga 3 Zr 5 68.6 hP 16 P 6 3 / mcm GaZr 2 72.4 tI 12 I 4/ mcm (βZr) ~94 to 100 cI 2 Im m (αZr) 99.4 to 100 hP 2 P 6 3 / mmc...

202

ALS@20  

NLE Websites -- All DOE Office Websites (Extended Search)

feed-image feed-image Digg: ALSBerkeleyLab Facebook Page: 208064938929 Flickr: advancedlightsource Twitter: ALSBerkeleyLab YouTube: AdvancedLightSource Home About the ALS ALS@20 ALS@20 ALS@20 Kick-Off Celebration Print On Friday, January 11, the Advanced Light Source celebrated the beginning of its 20th anniversary year with a brunch attended by more than 150 current and past staff members. After introductory remarks describing the trials and tribulations encountered during the construction of the ALS from former Director Jay Marx, current ALS Scientific Director Steve Kevan and Director Roger Falcone talked about the progress of the facility over the years. Attendees were then able to view more than 500 historical photos of the ALS and its staff displayed around the room.

203

Electroluminescense from InGaN Quantum Dots, in a Monolithically ...  

Science Conference Proceedings (OSTI)

We present an electrically driven structure based on a monolithically GaN/AlInN cavity with a single quantum dot layer grown by MOVPE. The device was grown ...

204

Industry @ ALS  

NLE Websites -- All DOE Office Websites (Extended Search)

Industry @ ALS Industry @ ALS Industry @ ALS Concrete Industry Benefits from Ancient Romans and the ALS Print Thursday, 17 October 2013 14:24 New insights into the Romans' ingenious concrete harbor structures emerging from ALS beamline research could move the modern concrete industry toward its goal of a reduced carbon footprint. Summary Slide Read more... Moving Industry Forward: Finding the Environmental Opportunity in Biochar Print Thursday, 12 September 2013 08:41 Using ALS Beamlines 10.3.2 and 8.3.2, the Environmental Protection Agency (EPA) is currently investigating how biochar sorbs environmental toxins and which kinds of biochar are the most effective. The possibilities for widespread use have already launched entrepreneurial commercial ventures. Summary Slide

205

ALS Visitors  

NLE Websites -- All DOE Office Websites (Extended Search)

Energy. March 2010 ALS Project Manager Steve Rossi hosted a group of visitors from Kazakhstan on Friday, March 5. The visitors, including a representative from the Kazakhstan...

206

M&S education: practical approach  

Science Conference Proceedings (OSTI)

As M&S work force needs increase, debate continues about what Modeling and Simulation (M&S) education should look like or where it belongs. Many schools are currently taking steps to develop undergraduate programs in M&S. This paper proposes a practical ... Keywords: apprenticeship, courses, technician education, undergraduate education

Irin Hall

2009-03-01T23:59:59.000Z

207

Low-cost, high-efficiency solar cells utilizing GaAs-on-Si technology  

DOE Green Energy (OSTI)

This report describes work to develop technology to deposit GaAs on Si using a nucleation layer of atomic-layer-epitaxy-grown GaAs or AlAs on Si. This ensures two-dimensional nucleation and should lead to fewer defects in the final GaAs layer. As an alternative, we also developed technology for depositing GaAs on sawtooth-patterned Si. Preliminary studies showed that this material can have a very low defect density, [approximately] 1 [times] 10[sup 5] cm[sup [minus]5], as opposed to our conventionally grown GaAs on SL which has a typical defect density of over 1 [times]10[sup 7] cm[sup [minus]2]. Using these two now methods of GaAs-on-Si material growth, we made solar cells that are expected to show higher efficiencies than those of previous cells.

Vernon, S.M. (Spire Corp., Bedford, MA (United States))

1993-04-01T23:59:59.000Z

208

Polarity inversion of N-face GaN using an aluminum oxide interlayer  

Science Conference Proceedings (OSTI)

The polarity of GaN grown by plasma-assisted molecular beam epitaxy was inverted from N-face to Ga-face by inserting a composite AlN/aluminum oxide (AlO{sub x}) interlayer structure at the inversion interface. The change in polarity was verified in situ by reflection high energy electron diffraction via intensity transients and postgrowth surface reconstructions, and ex situ by convergent beam electron diffraction and etch studies in an aqueous potassium hydroxide solution. The inverted materials showed smooth surfaces and good electrical properties. AlGaN/GaN high electron mobility transistors fabricated on the inverted epilayers showed good dc and high frequency performance. A current-gain cutoff frequency (f{sub T}) of 21 GHz and maximum oscillation frequency (f{sub max}) of 61 GHz were measured in devices with a gate length of 0.7 {mu}m. These data compare favorably to those of Ga-face AlGaN/GaN devices with a similar structure grown on Si-face SiC substrates.

Wong, Man Hoi; Mishra, Umesh K. [Department of Electrical and Computer Engineering, University of California, Santa Barbara, California 93106-9560 (United States); Wu, Feng; Speck, James S. [Materials Department, University of California, Santa Barbara, California 93106-5050 (United States)

2010-12-15T23:59:59.000Z

209

ALS Visitors  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS Visitors ALS Visitors ALS Visitors Print Wednesday, 29 July 2009 00:00 ALS staff members host a variety of scientific, educational, government, and community-related tours each month. November 2013 poneman U.S. Deputy Secretary of Energy Daniel Poneman visited Berkeley Lab on Friday, Nov. 15, during a brief stay in the Bay Area. Glenn Mara of the University of California Office of the President and Aundra Richards of the DOE Berkeley Site Office joined Deputy Laboratory Director Horst Simon's welcome. They updated Poneman on the lab's future initiatives and current capital projects and heard briefings on cyber security, computing, and the Joint BioEnergy Institute. As second-in-command at DOE, Poneman is responsible for assisting the Secretary of Energy in the management and operations of the agency and acting on his behalf when necessary.During his tour of the ALS, Poneman (right) spoke with Ken Goldberg (Materials Sciences Division) at the CXRO beamline.

210

Growth and development of GaInAsP for use in high-efficiency solar cells. Annual subcontract report, 1 July 1991--30 June 1992  

DOE Green Energy (OSTI)

This report describes work done during Phase II of the subcontract. Goals for Phase II include the following: (1) Optimize the GaInAsP cell on GaAs and demonstrate a 500-sun at air mass (AM) 1.5 efficiency of >23%. (2) Develop a window layer, including the evaluation of AlGaAs, GaInP, AlGaAsP, AlGaInP, and GaP. (3) Develop a front-surface contact, with a grid designed for 500-sun concentration, and a goal of a contact resistivity of {approximately}10{sup 5} ohm-cm{sup 2}. (4) Grow GaInAsP cells on Ge, with a goal of a 1-sun (AM 1.5) efficiency of >15%. Accomplishments reported herein include (1) the fabrication of p-on-n and n-on-p GaInAsP cells on GaAs, with the n-on-p cell demonstrating a 10-sun (AM 1.5) active-area efficiency of 23.4% as measured at NREL (2) the evaluation of Al{sub x}Ga({sub 1-x})As, GaInP{sub 2}, and AlInP{sub 2} window layers; and (3) the fabrication of GaInAsP cells on Ge, with the demonstration of a p-on-n GaInAsP cell grown on Ge with a 1-sun (AM 1.5) active-area efficiency of 14.4%.

Sharps, P.R. [Research Triangle Inst., Research Triangle Park, NC (United States)

1993-04-01T23:59:59.000Z

211

Photoluminescence study of the 1.047 eV emission in GaN K. Pressela)  

E-Print Network (OSTI)

GaN/ AlGaN blue green light emitting diode, which has a much higher quantum efficiency than the SiC blue light emitting diode, became possible.2 Presently the wide bandgap semi- conductor GaN is intensively. Especially the 1.19 eV is very intense. Thus one can think of developing a light emitting diode in the near

Nabben, Reinhard

212

ALS Visitors  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS Visitors Print ALS Visitors Print ALS staff members host a variety of scientific, educational, government, and community-related tours each month. November 2013 poneman U.S. Deputy Secretary of Energy Daniel Poneman visited Berkeley Lab on Friday, Nov. 15, during a brief stay in the Bay Area. Glenn Mara of the University of California Office of the President and Aundra Richards of the DOE Berkeley Site Office joined Deputy Laboratory Director Horst Simon's welcome. They updated Poneman on the lab's future initiatives and current capital projects and heard briefings on cyber security, computing, and the Joint BioEnergy Institute. As second-in-command at DOE, Poneman is responsible for assisting the Secretary of Energy in the management and operations of the agency and acting on his behalf when necessary.During his tour of the ALS, Poneman (right) spoke with Ken Goldberg (Materials Sciences Division) at the CXRO beamline.

213

Al Weinrub  

NLE Websites -- All DOE Office Websites (Extended Search)

Al Weinrub Al Weinrub Author, "COMMUNITY POWER: Decentralized Renewable Energy in California" Member, Sierra Club California Clean Energy-Climate CommitteeMember, Steering Committee, Bay Area Clean Energy Alliance al.weinrub@comcast.net This speaker was a visiting speaker who delivered a talk or talks on the date(s) shown at the links below. This speaker is not otherwise associated with Lawrence Berkeley National Laboratory, unless specifically identified as a Berkeley Lab staff member. Al Weinrub is a member of the Sierra Club California Energy-Climate Committee and serves on the Steering Committee of the Bay Area's Local Clean Energy Alliance. He is the author of COMMUNITY POWER: Decentralized Renewable Energy in California (http://www.localcleanenergy.org/Community-Power-Publication)

214

Al Gallo  

Energy.gov (U.S. Department of Energy (DOE))

As the Director for the Office of Technology Evaluation, Al Gallo works closely with the Chief Technology Officer as well as many Program Offices to advance the introduction and adoption of...

215

Ultralow nonalloyed Ohmic contact resistance to self aligned N-polar GaN high electron mobility transistors by In(Ga)N regrowth  

Science Conference Proceedings (OSTI)

Ultralow Ohmic contact resistance and a self-aligned device structure are necessary to reduce the effect of parasitic elements and obtain higher f{sub t} and f{sub max} in high electron mobility transistors (HEMTs). N-polar (0001) GaN HEMTs, offer a natural advantage over Ga-polar HEMTs, in terms of contact resistance since the contact is not made through a high band gap material [Al(Ga)N]. In this work, we extend the advantage by making use of polarization induced three-dimensional electron-gas through regrowth of graded InGaN and thin InN cap in the contact regions by plasma (molecular beam epitaxy), to obtain an ultralow Ohmic contact resistance of 27 OMEGA mum to a GaN 2DEG.

Dasgupta, Sansaptak; Nidhi,; Brown, David F.; Wu, Feng; Keller, Stacia; Speck, James S.; Mishra, Umesh K. [Department of ECE, University of California, Santa Barbara, California 93106 (United States) and Department of Materials, University of California, Santa Barbara, California 93106 (United States)

2010-04-05T23:59:59.000Z

216

Electron mobility and effective mass in composite InGaAs quantum wells with InAs and GaAs nanoinserts  

Science Conference Proceedings (OSTI)

The paper is concerned with the theoretical and experimental studies of the band structure and electrical properties of InAlAs/InGaAs/InAlAs/InP heterostructures containing a composite InGaAs quantum well with InAs and GaAs nanoinserts. From the Shubnikov-de Haas effect, the effective cyclotron mass m{sub c}* is determined experimentally and calculated with consideration for the nonparabolicity of the electron energy spectrum. An approach to estimation of the effective mass is proposed and tested. The approach is based on weighted averaging of the m{sub c}* of the composite quantum well's constituent materials. A first proposed heterostructure containing two InAs inserts symmetrically arranged in the quantum well makes a 26% reduction in m{sub c}* compared to m{sub c}* in the lattice-matched In{sub 0.53}Ga{sub 0.47}As quantum well possible.

Ponomarev, D. S., E-mail: ponomarev_dmitr@mail.ru; Vasil'evskii, I. S. [National Nuclear Research University 'Moscow Engineering Physics Institute (MEPhI)' (Russian Federation); Galiev, G. B.; Klimov, E. A. [Russian Academy of Sciences, Institute of Ultrahigh-Frequency Semiconductor Electronics (Russian Federation); Khabibullin, R. A. [National Nuclear Research University 'Moscow Engineering Physics Institute (MEPhI)' (Russian Federation); Kulbachinskii, V. A.; Uzeeva, N. A. [Moscow State University (Russian Federation)

2012-04-15T23:59:59.000Z

217

Polarization-engineered GaN/InGaN/GaN tunnel diodes  

E-Print Network (OSTI)

We report on the design and demonstration of polarization-engineered GaN/InGaN/GaN tunnel junction diodes with high current density and low tunneling turn-on voltage. Wentzel-Kramers-Brillouin (WKB) calculations were used to model and design tunnel junctions with narrow bandgap InGaN-based barrier layers. N-polar p-GaN/In0.33Ga0.67N/n-GaN heterostructure tunnel diodes were grown using molecular beam epitaxy. Efficient zero bias tunneling turn-on with a high current density of 118 A/cm2 at a reverse bias of 1V, reaching a maximum current density up to 9.2 kA/cm2 were obtained. These results represent the highest current density reported in III-nitride tunnel junctions, and demonstrate the potential of III-nitride tunnel devices for a broad range of optoelectronic and electronic applications.

Sriram Krishnamoorthy; Digbijoy N. Nath; Fatih Akyol; Pil Sung Park; Michele Esposto; Siddharth Rajan

2010-08-24T23:59:59.000Z

218

InGaAsN Solar Cells with 1.0eV Bandgap, Lattice Matched to GaAs  

DOE Green Energy (OSTI)

The design, growth by metal-organic chemical vapor deposition, and processing of an In{sub 0.07}Ga{sub 0.93}As{sub 0.98}N{sub 0.02} solar Al, with 1.0 ev bandgap, lattice matched to GaAs is described. The hole diffusion length in annealed, n-type InGaAsN is 0.6-0.8 pm, and solar cell internal quantum efficiencies > 70% arc obwined. Optical studies indicate that defects or impurities, from InGAsN doping and nitrogen incorporation, limit solar cell performance.

Allerman, A.A.; Banas, J.J.; Gee, J.M.; Hammons, B.E.; Jones, E.D.; Kurtz, S.R.

1998-11-24T23:59:59.000Z

219

HDX-MS for Biopharmaceutical Analysis  

Science Conference Proceedings (OSTI)

... Improve HDX-MS technology for measurements of trans-membrane protein drug ... to find the epitope of Proliferating Cell Nuclear Antigen (PCNA ...

2013-09-17T23:59:59.000Z

220

Genizah MS T-S AS 145.39  

E-Print Network (OSTI)

*k T-S AS 145.39 *t Legal document *s 15.3 x 15.5 (7.7 one leaf); 4-15 lines (1v and 2r blank) *m Paper; 2 leaves (bifolium); slightly torn, holes, rubbed, stained *l Judaeo-Arabic; Hebrew; Arabic *c Testimony concerning an oath; mentions M?s? ibn... H?r?n al-Š?m? and Faraj Allah ibn Joseph ibn F??il. *e 4 lines on f. 2v written transversely in f. 1r....

Unknown

2011-02-25T23:59:59.000Z

Index
Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


Index
221

ALS Visitors  

NLE Websites -- All DOE Office Websites (Extended Search)

Quick Facts Quick Facts ALS Visitors Print ALS staff members host a variety of scientific, educational, government, and community-related tours each month. November 2013 poneman U.S. Deputy Secretary of Energy Daniel Poneman visited Berkeley Lab on Friday, Nov. 15, during a brief stay in the Bay Area. Glenn Mara of the University of California Office of the President and Aundra Richards of the DOE Berkeley Site Office joined Deputy Laboratory Director Horst Simon's welcome. They updated Poneman on the lab's future initiatives and current capital projects and heard briefings on cyber security, computing, and the Joint BioEnergy Institute. As second-in-command at DOE, Poneman is responsible for assisting the Secretary of Energy in the management and operations of the agency and acting on his behalf when necessary.During his tour of the ALS, Poneman (right) spoke with Ken Goldberg (Materials Sciences Division) at the CXRO beamline.

222

Category:Savannah, GA | Open Energy Information  

Open Energy Info (EERE)

Savannah, GA Savannah, GA Jump to: navigation, search Go Back to PV Economics By Location Media in category "Savannah, GA" The following 16 files are in this category, out of 16 total. SVFullServiceRestaurant Savannah GA Georgia Power Co.png SVFullServiceRestauran... 80 KB SVHospital Savannah GA Georgia Power Co.png SVHospital Savannah GA... 80 KB SVLargeHotel Savannah GA Georgia Power Co.png SVLargeHotel Savannah ... 75 KB SVLargeOffice Savannah GA Georgia Power Co.png SVLargeOffice Savannah... 82 KB SVMediumOffice Savannah GA Georgia Power Co.png SVMediumOffice Savanna... 85 KB SVMidriseApartment Savannah GA Georgia Power Co.png SVMidriseApartment Sav... 80 KB SVOutPatient Savannah GA Georgia Power Co.png SVOutPatient Savannah ... 84 KB SVPrimarySchool Savannah GA Georgia Power Co.png

223

Category:Atlanta, GA | Open Energy Information  

Open Energy Info (EERE)

GA GA Jump to: navigation, search Go Back to PV Economics By Location Media in category "Atlanta, GA" The following 16 files are in this category, out of 16 total. SVFullServiceRestaurant Atlanta GA Georgia Power Co.png SVFullServiceRestauran... 81 KB SVHospital Atlanta GA Georgia Power Co.png SVHospital Atlanta GA ... 81 KB SVLargeHotel Atlanta GA Georgia Power Co.png SVLargeHotel Atlanta G... 74 KB SVLargeOffice Atlanta GA Georgia Power Co.png SVLargeOffice Atlanta ... 82 KB SVMediumOffice Atlanta GA Georgia Power Co.png SVMediumOffice Atlanta... 84 KB SVMidriseApartment Atlanta GA Georgia Power Co.png SVMidriseApartment Atl... 82 KB SVOutPatient Atlanta GA Georgia Power Co.png SVOutPatient Atlanta G... 83 KB SVPrimarySchool Atlanta GA Georgia Power Co.png SVPrimarySchool Atlant...

224

GA SNC Solar | Open Energy Information  

Open Energy Info (EERE)

GA SNC Solar Jump to: navigation, search Name GA-SNC Solar Place Nevada Sector Solar Product Nevada-based PV project developer and joint venture of GA-Solar North America and...

225

Fabrication of the Mg/Al clad sheet and its mechanical properties  

Science Conference Proceedings (OSTI)

Aerosol Route Synthesis of Copper Oxide Nanoparticles Using Copper Nitrate Solution · AlGaAs-Based Optical ... Defect Energetics and Fission Product Transport in ZrC ... Enhancing Mineral Beneficiation by High Intensity Power Ultrasound.

226

Impact toughness Enhancement of an Electron Beam Welded Ti-6Al ...  

Science Conference Proceedings (OSTI)

Aerosol Route Synthesis of Copper Oxide Nanoparticles Using Copper Nitrate Solution · AlGaAs-Based Optical ... Defect Energetics and Fission Product Transport in ZrC ... Enhancing Mineral Beneficiation by High Intensity Power Ultrasound.

227

Pressurless sintering of Al2O3-SiC nano composites and effect of ...  

Science Conference Proceedings (OSTI)

Aerosol Route Synthesis of Copper Oxide Nanoparticles Using Copper Nitrate Solution · AlGaAs-Based Optical ... Defect Energetics and Fission Product Transport in ZrC ... Enhancing Mineral Beneficiation by High Intensity Power Ultrasound.

228

Impacts of impurities on the Properties of Secondary Al-Si-Cu alloys  

Science Conference Proceedings (OSTI)

Aerosol Route Synthesis of Copper Oxide Nanoparticles Using Copper Nitrate Solution · AlGaAs-Based Optical ... Defect Energetics and Fission Product Transport in ZrC ... Enhancing Mineral Beneficiation by High Intensity Power Ultrasound.

229

AL. I  

Office of Legacy Management (LM)

AL. I AL. I Department of Energy Washington, DC 20545 OCT 13 Vii87 Mr. John T. Shields A214 National Fertilizer Development Center Tennessee Valley Authority Muscle Shoals, Alabama 35660 Dear Mr. Shields: As you may know, the Department of Energy (DOE) is evaluating the radiological condition of sites that were utilized under the Manhattan Engineer District and the Atomic Energy Commission (AEC) during the early years of nuclear development to determine whether they need remedial action and whether the Department has authority to perform such action. AEC work at the TVA during the period 1951 through 1955 involved the development of a process to recover uranium from the production of phosphate fertilizer. A laboratory and pilot plant were operated at the site, but very little

230

GaAs/AlGaAs nanostructured composites for free-space and integrated optical devices  

E-Print Network (OSTI)

A. Vawter, and J. R. Wendt, ‘‘High-aspect-ratio nanophotonicJ. D. Joannopoulos, J. R. Wendt, G. A. Vawter, W. Zubrzycki,A. Vawter, and J. R. Wendt, ‘‘High-aspect-ratio nanophotonic

Tsai, Chia-Ho

2006-01-01T23:59:59.000Z

231

Persistent photoconductivity and defect levels in n-type AlGaN/GaN heterostructures  

E-Print Network (OSTI)

of California at San Diego, La Jolla, California 92093-0407 K. S. Boutros and J. M. Redwing Epitronics

Yu, Edward T.

232

Measurement of drift mobility in AlGaN/GaN heterostructure field-effect transistor  

E-Print Network (OSTI)

Center, Thousand Oaks, California 91358 K. S. Boutros and J. M. Redwing Epitronics/ATMI, Phoenix, Arizona

Yu, Edward T.

233

GaAs/AlGaAs nanostructured composites for free-space and integrated optical devices  

E-Print Network (OSTI)

Optics : Electromagnetic Theory of Propagation, InterferenceOptics : Electromagnetic Theory of Propagation, Interference

Tsai, Chia-Ho

2006-01-01T23:59:59.000Z

234

NIVEAUX PROFONDS DANS LES DIODES LECTROLUMINESCENTES GaAs-GaAlAs  

E-Print Network (OSTI)

JEPPSON, B., Jpn. J. Appl. Phys. 12 (1973) 1011. [15] LANG, D. V., CHO, A. Y., GOSSARD, A. C. et WIEGMANN

Paris-Sud XI, Université de

235

KK9, Nanostructure Decorated AlGaN/GaN HEMTs for Chemical ...  

Science Conference Proceedings (OSTI)

The high sensitivity of ZnO, towards the exposure to NH3, H2, O3, CO, NO2, and ethanol etc., makes it viable for gas sensing applications. Similarly, the same ...

236

JJ5, Electro-Thermo-Mechanical Simulation of AlGaN/GaN HFETs ...  

Science Conference Proceedings (OSTI)

Recently, gate insulation has shown to significantly reduce the leakage .... E6, Development of Surface Activation Based Nano-Bonding and Interconnect System ... Microstructure and Properties of Colloidal ITO Films and Cold- Sputtered ITO ...

237

Characteristics of AlGaAs/GaAs heterostructure RT-SCR model  

Science Conference Proceedings (OSTI)

Electrical properties of a resonant-tunneling-semiconductor-controlled rectifier (RT-SCR) model have been presented. The current, temperature, gain, doping concentration, and layer size versus voltage relationships have been numerically obtained. The ... Keywords: RT-SCR, Semiconductor devices, Thyristors

B. D. Barkana

2008-12-01T23:59:59.000Z

238

Life tests of Nichia AlGaN/InGaN/GaN blue-light-emitting diodes  

SciTech Connect

We report on results of life testing Nichia NLPB500 blue LEDs in a temperature controlled chamber, with computer automation of equipment operation and data collection. The tests began with 18 newer (Nichia batch 4B0001) and two older (Nichia batch S403024, acquired a year earlier) LEDs, operated at 20 mA continuous wave (CW) and 23{degree}C. Light from each LED was coupled to an optical fiber and fed directly to individual photodetectors. General trend for the 18 newer LEDs was for the output intensity to increase at a faster rate within the first 50 h and then at a slower rate of the remainder of the first test. The output intensity of the two older LEDs increase within the first 50 h then decreased during the remainder of the first 1000 h. All 20 of the LEDs in the first 1000-h test were subjected to a second 1650-h test at 23{degree}C and at currents 20-70 mA CW. Only one LED, an older device, suffered a soft failure during this second test. The remaining LEDs underwent a third test at 30{degree}C and a fourth test at 35{degree}C, all at various currents. We will perform failure analysis.

Helms, C.J.; Berg, N.H.; Barton, D.L.; Osinski, M

1996-03-01T23:59:59.000Z

239

The use of short-period InGaN/GaN superlattices in blue-region light-emitting diodes  

SciTech Connect

Optical and light-emitting diode structures with an active InGaN region containing short-period InGaN/GaN superlattices are studied. It is shown that short-period superlattices are thin two-dimensional layers with a relatively low In content that contain inclusions with a high In content 1-3 nm thick. Inclusions manifest themselves from the point of view of optical properties as a nonuniform array of quantum dots involved in a residual quantum well. The use of short-period superlattices in light-emitting diode structures allows one to decrease the concentration of nonradiative centers, as well as to increase the injection of carriers in the active region due to an increase in the effective height of the AlGaN barrier, which in general leads to an increase in the quantum efficiency of light-emitting diodes.

Sizov, V. S., E-mail: vsizov@mail.ioffe.ru; Tsatsulnikov, A. F.; Sakharov, A. V.; Lundin, W. V.; Zavarin, E. E.; Cherkashin, N. A. [Russian Academy of Sciences, Ioffe Physical Technical Institute (Russian Federation); Hytch, M. J. [National Center for Scientific Research (CNRS), Center for Material Elaboration and Structural Studies (CEMES) (France); Nikolaev, A. E. [Russian Academy of Sciences, Ioffe Physical Technical Institute (Russian Federation); Mintairov, A. M.; He Yan; Merz, J. L. [University of Notre Dame, EE Department (United States)

2010-07-15T23:59:59.000Z

240

Atomic structure and energy spectrum of Ga(As,P)/GaP heterostructures  

Science Conference Proceedings (OSTI)

The atomic structure and energy spectrum of Ga(As,P)/GaP heterostructures were studied. It was shown that the deposition of GaAs of the same nominal thickness leads to the formation of pseudomorphic GaAs/GaP quantum wells (QW), fully relaxed GaAs/GaP self-assembled quantum dots (SAQDs), or pseudomorphic GaAsP/GaP SAQDs depending on the growth temperature. We demonstrate that the atomic structure of Ga(As,P)/GaP heterostructures is ruled by the temperature dependence of adatom diffusion rate and GaAs-GaP intermixing. The band alignment of pseudomorphic GaAs/GaP QW and GaAsP/GaP SAQDs is shown to be of type II, in contrast to that of fully relaxed GaAs/GaP SAQDs, which have the band alignment of type I with the lowest electronic states at the indirect L valley of the GaAs conduction band.

Abramkin, D. S.; Putyato, M. A.; Budennyy, S. A.; Gutakovskii, A. K.; Semyagin, B. R.; Preobrazhenskii, V. V.; Shamirzaev, T. S. [A. V. Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Pr. Lavrentyeva 13, 630090 Novosibirsk (Russian Federation); Kolomys, O. F.; Strelchuk, V. V. [V. E. Lashkarev Institute of Semiconductor Physics NAS of Ukraine, Pr. Nauki 41, 03028 Kiev (Ukraine)

2012-10-15T23:59:59.000Z

Index
Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


Index
241

Tunnel-injection GaN quantum dot ultraviolet light-emitting diodes  

SciTech Connect

We demonstrate a GaN quantum dot ultraviolet light-emitting diode that uses tunnel injection of carriers through AlN barriers into the active region. The quantum dot heterostructure is grown by molecular beam epitaxy on AlN templates. The large lattice mismatch between GaN and AlN favors the formation of GaN quantum dots in the Stranski-Krastanov growth mode. Carrier injection by tunneling can mitigate losses incurred in hot-carrier injection in light emitting heterostructures. To achieve tunnel injection, relatively low composition AlGaN is used for n- and p-type layers to simultaneously take advantage of effective band alignment and efficient doping. The small height of the quantum dots results in short-wavelength emission and are simultaneously an effective tool to fight the reduction of oscillator strength from quantum-confined Stark effect due to polarization fields. The strong quantum confinement results in room-temperature electroluminescence peaks at 261 and 340 nm, well above the 365 nm bandgap of bulk GaN. The demonstration opens the doorway to exploit many varied features of quantum dot physics to realize high-efficiency short-wavelength light sources.

Verma, Jai; Kandaswamy, Prem Kumar; Protasenko, Vladimir; Verma, Amit; Grace Xing, Huili; Jena, Debdeep [Department of Electrical Engineering, University of Notre Dame, Indiana 46556 (United States)] [Department of Electrical Engineering, University of Notre Dame, Indiana 46556 (United States)

2013-01-28T23:59:59.000Z

242

Analysis of Carbamate Pesticides: Validation of Semi-Volatile Analysis by HPLC-MS/MS by EPA Method MS666  

Science Conference Proceedings (OSTI)

The Environmental Protection Agency's (EPA) Region 5 Chicago Regional Laboratory (CRL) developed a method for analysis of aldicarb, bromadiolone, carbofuran, oxamyl, and methomyl in water by high performance liquid chromatography tandem mass spectrometry (HPLC-MS/MS), titled Method EPA MS666. This draft standard operating procedure (SOP) was distributed to multiple EPA laboratories and to Lawrence Livermore National Laboratory, which was tasked to serve as a reference laboratory for EPA's Environmental Reference Laboratory Network (ERLN) and to develop and validate analytical procedures. The primary objective of this study was to validate and verify the analytical procedures described in MS666 for analysis of carbamate pesticides in aqueous samples. The gathered data from this validation study will be used to: (1) demonstrate analytical method performance; (2) generate quality control acceptance criteria; and (3) revise the SOP to provide a validated method that would be available for use during a homeland security event. The data contained in this report will be compiled, by EPA CRL, with data generated by other EPA Regional laboratories so that performance metrics of Method EPA MS666 can be determined.

Owens, J; Koester, C

2008-05-14T23:59:59.000Z

243

Analysis of Combustion Chamber Deposits by ESI-TOF-MS and MALDI-TOF-MS  

DOE Green Energy (OSTI)

Combustion chamber deposits (CCDs) in internal combustion engines have been studied by various techniques to understand the relationship of performance degradation with deposit quantity and structure. XPS, XAS, NMR, and elemental analysis have offered insight into the bulk structure of C, H, N, O and metal components [1]. MS has offered some information about compound structure, but results are limited due to the insolubility and complexity of the materials. Recent advances in MS have opened new possibilities for analysis of CCDs. Here we report initial findings on the carbon structure of these deposits determined by ESI-TOF-MS and MADLI-TOF-MS.

Reynolds, J G; Shields, S J; Roos, J W

2001-06-14T23:59:59.000Z

244

ALS Project Management Manual  

E-Print Network (OSTI)

management practices across all ALS projects. It describesthat the primary weakness in ALS project management effortsrich projects common at the ALS. It is sometimes difficult

Krupnick, Jim; Harkins, Joe

2000-01-01T23:59:59.000Z

245

General Atomics (GA) Fusion News: A New Spin on Understanding...  

NLE Websites -- All DOE Office Websites (Extended Search)

General Atomics (GA) Fusion News: A New Spin on Understanding Plasma Confinement American Fusion News Category: General Atomics (GA) Link: General Atomics (GA) Fusion News: A New...

246

Rodefeld Landfill Ga Biomass Facility | Open Energy Information  

Open Energy Info (EERE)

Rodefeld Landfill Ga Biomass Facility Jump to: navigation, search Name Rodefeld Landfill Ga Biomass Facility Facility Rodefeld Landfill Ga Sector Biomass Facility Type Landfill Gas...

247

RECIPIENT:Gwinnett Co, GA  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Gwinnett Co, GA Gwinnett Co, GA u.s DEPARUIENT OFENllRGY EERE PROJECT MANAGEMENT CENTER NllPA DETERl\JINATION PROJECr TITLE: Gwinnett Co, GA EEC8G Page I or2 STATE: GA Funding Opportunity Announcement Number Procu~ment Instrument Number N[PA Control Number CID Number DE-EEOOOOS05.005 0 Based on my review ortbe information concerning tbe proposed action, as NEPA Compliance Officer (authorized under DOE Order 4SI.IA), I bave made the following determination: ex, EA, EIS APPENDIX AND NUMBER: Description: 8 5.1 Actions to conserve energy, demonstrate potential energy conservation, and promote energy-efficiency that do not increase the indoor concentrations of potentially harmful substances. These actions may involve financial and technical assistance to individuals (such as builders, owners, consultants, designers), organizations (such as utilities), and state

248

Ms. Rebecca Peterson Energy Information Administration  

Gasoline and Diesel Fuel Update (EIA)

Ms. Rebecca Peterson Ms. Rebecca Peterson Energy Information Administration Submitted by email: ERS2014@eia.gov Dear Ms. Peterson: This is to comment on the Energy Information Administration's (EIA) solicitation of comments on the proposed three-year reauthorization of forms EIA-63B, EIA-411, EIA-826, EIA-860, EIA-860M, EIA-861, EIA-861S, and EIA-923, and the creation of form EIA-930. These comments are in response to the notice published in Vol. 78, No. 44 of the Federal Register on March 6, 2013. Omaha Public Power District (OPPD) is a customer-owned electric utility and political subdivision of the state of Nebraska. OPPD is currently a balancing authority and owns a transmission system and

249

GaN-Ready Aluminum Nitride Substrates for Cost-Effective, Very Low Dislocation Density III-Nitride LED's  

SciTech Connect

The objective of this project was to develop and then demonstrate the efficacy of a costeffective approach for a low defect density substrate on which AlInGaN LEDs can be fabricated. The efficacy of this “GaN-ready” substrate would then be tested by growing high efficiency, long lifetime InxGa1-xN blue LEDs. The approach used to meet the project objectives was to start with low dislocation density AlN single-crystal substrates and grow graded AlxGa1-xN layers on top. Pseudomorphic AlxGa1-xN epitaxial layers grown on bulk AlN substrates were used to fabricate light emitting diodes and demonstrate better device performance as a result of the low defect density in these layers when benched marked against state-of-the-art LEDs fabricated on sapphire substrates. The pseudomorphic LEDs showed excellent output powers compared to similar wavelength devices grown on sapphire substrates, with lifetimes exceeding 10,000 hours (which was the longest time that could reliably be estimated). In addition, high internal quantum efficiencies were demonstrated at high driving current densities even though the external quantum efficiencies were low due to poor photon extraction. Unfortunately, these pseudomorphic LEDs require high Al content so they emit in the ultraviolet. Sapphire based LEDs typically have threading dislocation densities (TDD) > 108 cm-2 while the pseudomorphic LEDs have TDD ? 105 cm-2. The resulting TDD, when grading the AlxGa1-xN layer all the way to pure GaN to produce a “GaN-ready” substrate, has varied between the mid 108 down to the 106 cm-2. These inconsistencies are not well understood. Finally, an approach to improve the LED structures on AlN substrates for light extraction efficiency was developed by thinning and roughening the substrate.

Sandra Schujman; Leo Schowalter

2010-10-15T23:59:59.000Z

250

Access to the ALS  

NLE Websites -- All DOE Office Websites (Extended Search)

Access to the ALS Access to the ALS Print User Access The ALS experiment floor (Building 6) is a Controlled Access Area for radiation protection. All ALS users are required to...

251

Access to the ALS  

NLE Websites -- All DOE Office Websites (Extended Search)

Access to the ALS Print User Access The ALS experiment floor (Building 6) is a Controlled Access Area for radiation protection. All ALS users are required to register with the ALS...

252

Strong et al ALS FTD consensus criteria  

E-Print Network (OSTI)

Strong et al ALS FTD consensus criteria 1 Version: 20070606 Frontotemporal syndromes in amyotrophic, UCSF, San Francisco, California, USA (5) Forbes Norris MDA/ALS Research Center, San Francisco Kingdom (8) Science Director & Vice President, The ALS Association, Palm Harbor, Florida, U.S.A. (9

Dickerson, Brad

253

Intense terahertz emission from molecular beam epitaxy-grown GaAs/GaSb(001)  

SciTech Connect

Intense terahertz (THz) electromagnetic wave emission was observed in undoped GaAs thin films deposited on (100) n-GaSb substrates via molecular beam epitaxy. GaAs/n-GaSb heterostructures were found to be viable THz sources having signal amplitude 75% that of bulk p-InAs. The GaAs films were grown by interruption method during the growth initiation and using various metamorphic buffer layers. Reciprocal space maps revealed that the GaAs epilayers are tensile relaxed. Defects at the i-GaAs/n-GaSb interface were confirmed by scanning electron microscope images. Band calculations were performed to infer the depletion region and electric field at the i-GaAs/n-GaSb and the air-GaAs interfaces. However, the resulting band calculations were found to be insufficient to explain the THz emission. The enhanced THz emission is currently attributed to a piezoelectric field induced by incoherent strain and defects.

Sadia, Cyril P.; Laganapan, Aleena Maria; Agatha Tumanguil, Mae; Estacio, Elmer; Somintac, Armando; Salvador, Arnel [National Institute of Physics, University of the Philippines Diliman, Quezon City 1101 (Philippines); Que, Christopher T. [Physics Department, De La Salle University, 2401 Taft Avenue, Manila 1004 (Philippines); Yamamoto, Kohji; Tani, Masahiko [Research Center for Development of Far-Infrared Region, University of Fukui, Fukui 910-8507 (Japan)

2012-12-15T23:59:59.000Z

254

Manahmen fr MS Windows Betriebssysteme Gerd Hofmann  

E-Print Network (OSTI)

Ma�nahmen für MS Windows Betriebssysteme Gerd Hofmann IT-Sicherheitsforum - Betriebssystemsicherheit 24. Juni 2004 #12;24.06.04 gerd.hofmann@rrze.uni-erlangen.de 2Windows Sicherheit Vorstellung Gerd-85-28920 RRZE: Raum RZ 2.013 #12;24.06.04 gerd.hofmann@rrze.uni-erlangen.de 3Windows Sicherheit Inhaltsliste

Fiebig, Peter

255

Low coverage spontaneous etching and hyperthermal desorption of aluminum chlorides from Cl2 Al,,111...  

E-Print Network (OSTI)

spectrometry has been used to monitor the desorption of aluminum chloride (AlxCly) etch products from the Al-probable velocity of 517 22 m/s at an Al 111 surface temperature of 100 K. This corresponds to 22 times the expected thermal desorption translational energy for AlCl3 . Cl2 sticking probability measurements and AlxCly etch

Kummel, Andrew C.

256

Development of polycrystal GaAs solar cells. Quarterly technical progress report No. 1, January 15-April 30, 1979  

DOE Green Energy (OSTI)

The objective of this program is to develop a thin film GaAs solar cell technology with the potential of yielding cells with 12 to 15% efficiency and to develop thin film growth techniques which are compatible with the low cost production goal of $500/kW-peak. Progress is reported on a study of junction formation in large grain polycrystal GaAs; characterization of the electronic properties of polycrystal GaAs grown by MBE on low cost foreign substrates; optimizing the structure of AlGaAs-GaAs heterojunction Schottky barrier solar cells; and a variety of grain boundary measurements, including Scanning Light Microscopy (SLM), Deep Level Transient Spectroscopy (DLTS), SIMS, and temperature dependent resistivity.

Miller, D.L.; Cohen, M.J.; Harris, J.S. Jr.; Ballantyne, J.; Hoyte, A.; Stefanakos, E.

1979-05-01T23:59:59.000Z

257

New GaInP/GaAs/GaInAs, Triple-Bandgap, Tandem Solar Cell for High-Efficiency Terrestrial Concentrator Systems  

DOE Green Energy (OSTI)

GaInP/GaAs/GaInAs three-junction cells are grown in an inverted configuration on GaAs, allowing high quality growth of the lattice matched GaInP and GaAs layers before a grade is used for the 1-eV GaInAs layer. Using this approach an efficiency of 37.9% was demonstrated.

Kurtz, S.; Wanlass, M.; Kramer, C.; Young, M.; Geisz, J.; Ward, S.; Duda, A.; Moriarty, T.; Carapella, J.; Ahrenkiel, P.; Emery. K.; Jones, K.; Romero, M.; Kibbler, A.; Olson, J.; Friedman, D.; McMahon, W.; Ptak, A.

2005-11-01T23:59:59.000Z

258

MASIC: a software program for fast quantitation and flexible visualization of chromatographic profiles from detected LC-MS(/MS) features  

SciTech Connect

Quantitative analysis of liquid chromatography (LC)- mass spectrometry (MS) and tandem mass spectrometry (MS/MS) data is essential to many proteomics studies. We have developed MASIC to accurately measure peptide abundances and LC elution times in low-resolution LC-MS/MS analyses. This software program uses an efficient processing algorithm to quickly generate mass specific selected ion chromatograms from a dataset and provides an interactive browser that allows users to examine individual chromatograms in a variety of fashions. The improved elution time estimates afforded by MASIC increase the utility of LC-MS/MS data in the accurate mass and time (AMT) tag approach to proteomics.

Monroe, Matthew E.; Shaw, Jason L.; Daly, Don S.; Adkins, Joshua N.; Smith, Richard D.

2008-06-01T23:59:59.000Z

259

Efficiency-improvement study for GaAs solar cells. Final report, March 31, 1980-September 30, 1981  

DOE Green Energy (OSTI)

High-yield fabrication of good quality AlGaAs/GaAs concentration solar cells has been a limiting factor in widespread utilization of these high conversion efficiency (22 to 24%) photovoltaic cells. Reported is a series of investigations to correlate solar cell yield with substrate quality, growth techniques, layer composition, and metallization processes. In addition, several diagnostic techniques are described to aid in device characterization.

Cape, J.A.; Oliver, J.R.; Zehr, S.W.

1982-04-01T23:59:59.000Z

260

Ultra-low resistance ohmic contacts to GaN with high Si doping concentrations grown by molecular beam epitaxy  

Science Conference Proceedings (OSTI)

Ti/Al/Ni/Au ohmic contacts were formed on heavily doped n{sup +} metal-polar GaN samples with various Si doping concentrations grown by molecular beam epitaxy. The contact resistivity (R{sub C}) and sheet resistance (R{sub sh}) as a function of corresponding GaN free carrier concentration (n) were measured. Very low R{sub C} values (electron mobility transistors.

Afroz Faria, Faiza; Guo Jia; Zhao Pei; Li Guowang; Kumar Kandaswamy, Prem; Wistey, Mark; Xing Huili; Jena, Debdeep [Department of Electrical Engineering, University of Notre Dame, Indiana 46556 (United States)

2012-07-16T23:59:59.000Z

Index
Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


Index
261

Analysis of Phosphonic Acids: Validation of Semi-Volatile Analysis by HPLC-MS/MS by EPA Method MS999  

DOE Green Energy (OSTI)

The Environmental Protection Agency's (EPA) Region 5 Chicago Regional Laboratory (CRL) developed a method titled Analysis of Diisopropyl Methylphosphonate, Ethyl Hydrogen Dimethylamidophosphate, Isopropyl Methylphosphonic Acid, Methylphosphonic Acid, and Pinacolyl Methylphosphonic Acid in Water by Multiple Reaction Monitoring Liquid Chromatography/Tandem Mass Spectrometry: EPA Version MS999. This draft standard operating procedure (SOP) was distributed to multiple EPA laboratories and to Lawrence Livermore National Laboratory, which was tasked to serve as a reference laboratory for EPA's Environmental Reference Laboratory Network (ERLN) and to develop and validate analytical procedures. The primary objective of this study was to validate and verify the analytical procedures described in EPA Method MS999 for analysis of the listed phosphonic acids and surrogates in aqueous samples. The gathered data from this validation study will be used to: (1) demonstrate analytical method performance; (2) generate quality control acceptance criteria; and (3) revise the SOP to provide a validated method that would be available for use during a homeland security event. The data contained in this report will be compiled, by EPA CRL, with data generated by other EPA Regional laboratories so that performance metrics of EPA Method MS999 can be determined.

Owens, J; Vu, A; Koester, C

2008-10-31T23:59:59.000Z

262

HH7, Degradation of Ohmic and Schottky Contacts on InGaAs ...  

Science Conference Proceedings (OSTI)

In order to study the device reliability and failure mechanisms, both high ... InAlAs /InGaAs MHEMTs, obtained from a vendor, were stressed for 36 hours at a drain voltage of 3V. ... Transmission line method (TLM) structures were also stressed under similar .... Epitaxial Graphene: Designing a New Electronic Material.

263

Low-cost, high-efficiency solar cells utilizing GaAs-on-Si technology. Annual subcontract report, 1 August 1991--31 July 1992  

DOE Green Energy (OSTI)

This report describes work to develop technology to deposit GaAs on Si using a nucleation layer of atomic-layer-epitaxy-grown GaAs or AlAs on Si. This ensures two-dimensional nucleation and should lead to fewer defects in the final GaAs layer. As an alternative, we also developed technology for depositing GaAs on sawtooth-patterned Si. Preliminary studies showed that this material can have a very low defect density, {approximately} 1 {times} 10{sup 5} cm{sup {minus}5}, as opposed to our conventionally grown GaAs on SL which has a typical defect density of over 1 {times}10{sup 7} cm{sup {minus}2}. Using these two now methods of GaAs-on-Si material growth, we made solar cells that are expected to show higher efficiencies than those of previous cells.

Vernon, S.M. [Spire Corp., Bedford, MA (United States)

1993-04-01T23:59:59.000Z

264

Direct evidence of the fermi-energy-dependent formation of Mn interstitials in modulation doped Ga1-yAlyAs/Ga1-xMnxAs/Ga1-yAlyAs heterostructures  

SciTech Connect

Using ion channeling techniques, we investigate the lattice locations of Mn in Ga{sub 1-x}Mn{sub x}As quantum wells between Be-doped Ga{sub 1-y}Al{sub y}As barriers. The earlier results showed that the Curie temperature T{sub C} depends on the growth sequence of the epitaxial layers. A lower T{sub C} was found in heterostructures in which the Ga{sub 1-x}Mn{sub x}As layer is grown after the modulation-doped barrier. Here we provide direct evidence that this reduction in T{sub C} is directly correlated with an increased formation of magnetically inactive Mn interstitials. The formation of interstitials is induced by a shift of the Fermi energy as a result of the transfer of holes from the barrier to the quantum well during the growth.

Yu, K.M.; Walukiewicz, W.; Wojtowicz, T.; Lim, W.L.; Liu, X.; Dobrowolska, M.; Furdyna, J.K.

2004-01-30T23:59:59.000Z

265

Energy Management Standards (EnMS)  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Management Standards (EnMS) Paul Scheihing U.S. DOE January, 2009 2 Why an Energy Management Standard? Most energy efficiency in industry is achieved through changes in how energy is managed in a facility, rather than through installation of new technologies; An energy management standard provides a method for integrating energy efficiency into existing industrial or commercial management systems for continuous improvement; All existing and planned energy management standards are compatible with ISO 9000/14000 1 ; Companies who have voluntarily adopted an energy management plan (a central feature of an EnMS - Standard) have achieved major energy intensity improvements 2 . 1 International Organization for Standardization (ISO) 2 Btu/lb of product ANSI Accredited U.S. TAG to ISO/PC 242

266

Ground-state electric quadrupole moment of 31Al  

E-Print Network (OSTI)

Ground-state electric quadrupole moment of 31Al (I =5/2+, T_1/2 = 644(25) ms) has been measured by means of the beta-NMR spectroscopy using a spin-polarized 31Al beam produced in the projectile fragmentation reaction. The obtained Q moment, |Q_exp(31Al)| = 112(32)emb, are in agreement with conventional shell model calculations within the sd valence space. Previous result on the magnetic moment also supports the validity of the sd model in this isotope, and thus it is concluded that 31Al is located outside of the island of inversion.

D. Nagae; H. Ueno; D. Kameda; M. Takemura; K. Asahi; K. Takase; A. Yoshimi; T. Sugimoto; K. Shimada; T. Nagatomo; M. Uchida; T. Arai; T. Inoue; S. Kagami; N. Hatakeyama; H. Kawamura; K. Narita; J. Murata

2008-10-16T23:59:59.000Z

267

"FERC423",2007,1,195,"Alabama Power Co",3,"Barry","AL","C","applicatio...  

U.S. Energy Information Administration (EIA) Indexed Site

7,1,195,"Alabama Power Co",3,"Barry","AL","C","applicationvnd.ms-excel","Coal","BIT",45,"IM","SU","County Unknown",999,"MINA PRIBBENOW",289050,22.732,0.5,5.2,217.3...

268

ALS Chemistry Lab  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS Chemistry Lab Print ALS Chemistry Labs The ALS Chemistry Labs are located in the User Support Building (15-130) and in Building 6 (6-2233)*. These spaces are dedicated for...

269

ALS superbend magnet system  

E-Print Network (OSTI)

ALS Superbend Magnet System J. Zbasnik † , S. T. Wang †† ,of a High-Field Magnet for the ALS,” Transactions AppliedRefrigeration options for the ALS Superbend dipole magnets”,

2000-01-01T23:59:59.000Z

270

Access to the ALS  

NLE Websites -- All DOE Office Websites (Extended Search)

Gate Access Access to the ALS Print User Access The ALS experiment floor (Building 6) is a Controlled Access Area for radiation protection. All ALS users are required to register...

271

ALS Longitudinal Kicker  

E-Print Network (OSTI)

be published in the Proceedings ALS Longitudinal Kickers F.IJ3Ir-33088 lE93 005961 ALS Longitudinul Kickers* F. VoelkerContract No. DE-AC03-76SFOOO98. ALS LONGITUDINAL KICKERS F.

Voelkner, F.

2011-01-01T23:59:59.000Z

272

ALS superbend magnet performance  

E-Print Network (OSTI)

ALS Superbend Magnet Performance S. Marks, J. Zbasnik, W.the Advanced Light Source (ALS), with the fourth magnet as ahe Advanced Light Source (ALS) at the Lawrence Berkeley

2001-01-01T23:59:59.000Z

273

GaAs ohmic contacts for high temperature devices  

DOE Green Energy (OSTI)

Instrumentation requirements for geothermal wells, jet engines, and nuclear reactors have exceeded the high temperature capability of silicon devices. As one part of a program to develop high temperature compound semiconductor devices, four basic ohmic contact systems for n-type GaAs have been evaluated for contact resistance as a function of temperature (24 to 350/sup 0/C) and time (at 300/sup 0/C): Ni/AuGe; Ag/Si and Ag/Ni/Si; Al/Ge and Al/AlGe; and Au/Nb/Si and Pt/Nb/Si. Optimization of processing parameters produced viable high temperature contacts with all but the Al/Ge systems. Aging at 300/sup 0/C changed the contact resistivity in only the Ag/Ni/Si contacts. Film adhesion was excellent for the Al/Ge, Ni/AuGe, and Ag/Si systems as measured with ultrasonic Al wire bond pull strengths. Lower adhesion was noticed with Nb/Si systems measured with gold wire bond pull strengths.

Coquat, J.A.; Palmer, D.W.

1980-01-01T23:59:59.000Z

274

2012 ALS User Meeting  

NLE Websites -- All DOE Office Websites (Extended Search)

2012 ALS User Meeting 2012 ALS User Meeting Print Tuesday, 14 June 2011 12:37 user meeting web banner Home Agenda Awards Exhibitors Lodging Posters Registration Transportation...

275

Al,N  

Science Conference Proceedings (OSTI)

Presentation Title, Significantly Bandgap-reduced and Enhanced PEC Response of Al and N Co-doped ZnO:(Al,N) Films for Solar Driven Hydrogen Production.

276

ALS Users' Association Charter  

NLE Websites -- All DOE Office Websites (Extended Search)

organized framework for the interaction between those who use the Advanced Light Source (ALS) at the Lawrence Berkeley Laboratory (LBL) for their research and the ALS management,...

277

ALS Beamlines Directory  

NLE Websites -- All DOE Office Websites (Extended Search)

Parameters, Contact Information, and Schedules Download a high-resolution version of the ALS Beamclock. See Beamclock to view the ALS energy-related beamlines beamclock. Beamline...

278

InGaAsN/GaAs heterojunction for multi-junction solar cells  

DOE Patents (OSTI)

An InGaAsN/GaAs semiconductor p-n heterojunction is disclosed for use in forming a 0.95-1.2 eV bandgap photodetector with application for use in high-efficiency multi-junction solar cells. The InGaAsN/GaAs p-n heterojunction is formed by epitaxially growing on a gallium arsenide (GaAs) or germanium (Ge) substrate an n-type indium gallium arsenide nitride (InGaAsN) layer having a semiconductor alloy composition In.sub.x Ga.sub.1-x As.sub.1-y N.sub.y with 0GaAs layer, with the InGaAsN and GaAs layers being lattice-matched to the substrate. The InGaAsN/GaAs p-n heterojunction can be epitaxially grown by either molecular beam epitaxy (MBE) or metalorganic chemical vapor deposition (MOCVD). The InGaAsN/GaAs p-n heterojunction provides a high open-circuit voltage of up to 0.62 volts and an internal quantum efficiency of >70%.

Kurtz, Steven R. (Albuquerque, NM); Allerman, Andrew A. (Albuquerque, NM); Klem, John F. (Albuquerque, NM); Jones, Eric D. (Edgewood, NM)

2001-01-01T23:59:59.000Z

279

Polarized Emission from Single GaN Quantum Dots Grown by Molecular Beam Epitaxy  

Science Conference Proceedings (OSTI)

Polarization resolved microphotoluminescence measurements of single MBE-grown GaN/Al(Ga)N quantum dots (QDs) have been performed. The exciton and biexciton peaks with full width at half maximum as narrow as dots, resulting in different built-in electric field. Moreover, a strongly linearly polarized emission is observed for the investigated dots with a degree of linear polarization of about 0.9, interpreted as the valence-band mixing induced by in-plane anisotropy due to strain and/or QD shape.

Amloy, S. [Department of Physics, Chemistry, and Biology (IFM), Linkoeping University, S-58183 Linkoeping (Sweden); Department of Physics, Faculty of Science, Thaksin University, 93110 Phattalung (Thailand); Yu, K. H.; Karlsson, K. F.; Holtz, P. O. [Department of Physics, Chemistry, and Biology (IFM), Linkoeping University, S-58183 Linkoeping (Sweden); Farivar, R.; Andersson, T. G. [Applied Semiconductor Physics, Department of Microtechnology and Nanoscience, Chalmers University of Technology, S-41296 Goeteborg (Sweden)

2011-12-23T23:59:59.000Z

280

Magnetism and transport properties of epitaxial Fe-Ga thin films on GaAs(001)  

SciTech Connect

Epitaxial Fe-Ga thin films in disordered bcc {alpha}-Fe crystal structure (A2) have been grown on GaAs(001) by molecular beam epitaxy. The saturated magnetization (M{sub S}) decreased from 1371 to 1105 kA/m with increasing Ga concentration from 10.5 to 24.3 % at room temperature. The lattice parameter increased with the increase in Ga content because of the larger atomic radius of Ga atom than that of Fe. The increase in carrier density with Ga content caused in lower resistivity.

Duong Anh Tuan; Shin, Yooleemi; Cho, Sunglae [Department of Physics, University of Ulsan, Ulsan 680-749 (Korea, Republic of); Dang Duc Dung [Department of Physics, University of Ulsan, Ulsan 680-749 (Korea, Republic of); Department of General Physics, School of Engineering Physics, Ha Noi University of Science and Technology, 1 Dai Co Viet road, Ha Noi (Viet Nam); Vo Thanh Son [Centers for Nanobioenineering and Spintronics, Chungnam National University, Daejon 350-746 (Korea, Republic of)

2012-04-01T23:59:59.000Z

Index
Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


Index
281

Analysis of Combustion Chamber Deposits by ESI-TOF-MS and MALDI-TOF-MS  

DOE Green Energy (OSTI)

Combustion chamber deposits (CCD) in internal combustion engines have been studied by various techniques to understand the relationship of performance degradation with deposit quantity and structure. XPS, XAS, NMR, and elemental analysis have offered insight into the bulk structure of C, H, N, O and metal components. MS has offered some information about compound structure, but results are limited due to the insolubility and complexity of the materials. Recently, we have reported on the metal structure by XPS and XAS of several deposits from a GM 3800 engine generated using a standard fuel and one that contains low levels of the gasoline anti-knock additive, MMT. Here we report the initial findings on the carbon structure of these deposits determined by ESI-TOF-MS and MADLI-TOF-MS.

Reynolds, J G; Shields, S J; Roos, J W

2001-06-14T23:59:59.000Z

282

Educating the workforce: M&S professional education  

Science Conference Proceedings (OSTI)

As Modeling & Simulation (M&S) becomes increasingly important, there is a significant and growing need to educate and train M&S practitioners and researchers. The Department of Defense (DoD) has a growing need for an educated M&S workforce. This need ...

Margaret L. Loper; Amy Henninger; John W. Diem; Mikel D. Petty; Andreas Tolk

2011-12-01T23:59:59.000Z

283

GaN-Ready Aluminum Nitride Substrates for Cost-Effective, Very Low Dislocation Density III-Nitride LED's  

SciTech Connect

The objective of this project was to develop and then demonstrate the efficacy of a costeffective approach for a low defect density substrate on which AlInGaN LEDs can be fabricated. The efficacy of this “GaN-ready” substrate would then be tested by growing high efficiency, long lifetime InxGa1-xN blue LEDs. The approach used to meet the project objectives was to start with low dislocation density AlN single-crystal substrates and grow graded AlxGa1-xN layers on top. Pseudomorphic AlxGa1-xN epitaxial layers grown on bulk AlN substrates were used to fabricate light emitting diodes and demonstrate better device performance as a result of the low defect density in these layers when benched marked against state-of-the-art LEDs fabricated on sapphire substrates. The pseudomorphic LEDs showed excellent output powers compared to similar wavelength devices grown on sapphire substrates, with lifetimes exceeding 10,000 hours (which was the longest time that could reliably be estimated). In addition, high internal quantum efficiencies were demonstrated at high driving current densities even though the external quantum efficiencies were low due to poor photon extraction. Unfortunately, these pseudomorphic LEDs require high Al content so they emit in the ultraviolet. Sapphire based LEDs typically have threading dislocation densities (TDD) > 108 cm-2 while the pseudomorphic LEDs have TDD ? 105 cm-2. The resulting TDD, when grading the AlxGa1-xN layer all the way to pure GaN to produce a “GaN-ready” substrate, has varied between the mid 108 down to the 106 cm-2. These inconsistencies are not well understood. Finally, an approach to improve the LED structures on AlN substrates for light extraction efficiency was developed by thinning and roughening the substrate.

Sandra Schujman; Leo Schowalter

2010-10-15T23:59:59.000Z

284

passivation of InGaN/GaN nanopillar light emitting diodes.  

E-Print Network (OSTI)

??Recently, InGaN/GaN based blue light emitting diodes (LEDs) have become widely available commercially, but their efficiency is reduced due to the quantum confined Stark effect… (more)

Choi, Won

2013-01-01T23:59:59.000Z

285

Detailed Analysis of Temperature Characteristics of InGaP/InGaAs ...  

Science Conference Proceedings (OSTI)

The current-voltage (I-V) characteristics of single-junction solar cells (InGaP, InGaAs, Ge solar cells) were measured at various temperatures. The structures of  ...

286

GA 30+-90 / GA 37-90 VSD: Oil-injected rotary screw ...  

U.S. Energy Information Administration (EIA)

GA 30+-90 / GA 37-90 VSD: Oil-injected rotary screw compressors, 30-90 kW / 40-125 hp,Kunshan CompAirs Machinery Plant Co.,Ltd is the leading air ...

287

GA 11+-30/GA 15-30 VSD: Oil-injected rotary screw compressors ...  

U.S. Energy Information Administration (EIA)

GA 11+-30/GA 15-30 VSD: Oil-injected rotary screw compressors, 11-30 kW / 15-40 hp,Kunshan CompAirs Machinery Plant Co.,Ltd is the leading air ...

288

GA 90+-160+ / GA 110-160 VSD: Oil-injected rotary screw ...  

U.S. Energy Information Administration (EIA)

GA 90+-160+ / GA 110-160 VSD: Oil-injected rotary screw compressors, 90-160 kW / 125-200 hp.,Kunshan CompAirs Machinery Plant Co.,Ltd is the leading ...

289

Room temperature green light emission from nonpolar cubic InGaN/GaN multi-quantum-wells  

E-Print Network (OSTI)

Room temperature green light emission from nonpolar cubic InGaN/GaN multi-quantum-wells Shunfeng Li Cubic InGaN/GaN multi-quantum-wells MQWs with high structural and optical quality are achieved by utilizing freestanding 3C-SiC 001 substrates and optimizing InGaN quantum well growth. Superlattice peaks up

As, Donat Josef

290

Peace and Conflict Studies (PACS) Essay Contest --$500 Scholarship to the Winner! Inspired by her own survival of the dropping of an atomic bomb on Hiroshima, BGSU alumnus Ms.  

E-Print Network (OSTI)

own survival of the dropping of an atomic bomb on Hiroshima, BGSU alumnus Ms. Hiroko Nakamoto has threat of nuclear weapons in our world in a lecture entitled: "Nuclear Alarmism from Hiroshima to Al

Moore, Paul A.

291

Epitaxial Growth of GaN-based LEDs on Simple Sacrificial Substrates  

SciTech Connect

The objective of this project is to produce alternative substrate technologies for GaN-based LEDs by developing an ALD interlayer of Al{sub 2}O{sub 3} on sacrificial substrates such as ZnO and Si. A sacrificial substrate is used for device growth that can easily be removed using a wet chemical etchant leaving only the thin GaN epi-layer. After substrate removal, the GaN LED chip can then be mounted in several different ways to a metal heat sink/reflector and light extraction techniques can then be applied to the chip and compared for performance. Success in this work will lead to high efficiency LED devices with a simple low cost fabrication method and high product yield as stated by DOE goals for its solid state lighting portfolio.

Ian Ferguson; Chris Summers

2009-12-31T23:59:59.000Z

292

Structural Characterization of Doped GaSb Single Crystals by X-ray Topography  

Science Conference Proceedings (OSTI)

We characterized GaSb single crystals containing different dopants (Al, Cd and Te), grown by the Czochralski method, by x-ray topography and high angular resolution x-ray diffraction. Lang topography revealed dislocations parallel and perpendicular to the crystal's surface. Double-crystal GaSb 333 x-ray topography shows dislocations and vertical stripes than can be associated with circular growth bands. We compared our high-angular resolution x-ray diffraction measurements (rocking curves) with the findings predicted by the dynamical theory of x-ray diffraction. These measurements show that our GaSb single crystals have a relative variation in the lattice parameter ({Delta}d/d) on the order of 10{sup -5}. This means that they can be used as electronic devices (detectors, for example) and as x-ray monochromators.

Honnicke, M.G.; Mazzaro, I.; Manica, J.; Benine, E.; M da Costa, E.; Dedavid, B. A.; Cusatis, C.; Huang, X. R.

2009-09-13T23:59:59.000Z

293

Coincident site lattice-matched InGaN on (111) spinel substrates  

Science Conference Proceedings (OSTI)

Coincident site lattice-matched wurtzite (0001) In{sub 0.31}Ga{sub 0.69}N, emitting in the important green wavelength region, is demonstrated by molecular beam epitaxy on a cubic (111) MgAl{sub 2}O{sub 4} spinel substrate. The coincident site lattice matching condition involves a 30 deg. rotation between the lattice of the InGaN epitaxial layer and the lattice of the spinel. This work describes an alternative approach towards realizing more compositionally homogenous InGaN films with low dislocation density emitting in the ''green gap'' of low efficiency currently observed for semiconductor light emitting diodes (LEDs). This approach could lead to higher efficiency green LEDs presently of great interest for solid-state lighting applications.

Norman, A. G.; Dippo, P. C.; Moutinho, H. R.; Simon, J.; Ptak, A. J. [National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

2012-04-09T23:59:59.000Z

294

Coincident Site Lattice Matched InGaN on (111) Spinel Substrates  

Science Conference Proceedings (OSTI)

Coincident site lattice-matched wurtzite (0001) In{sub 0.31}Ga{sub 0.69}N, emitting in the important green wavelength region, is demonstrated by molecular beam epitaxy on a cubic (111) MgAl{sub 2}O{sub 4} spinel substrate. The coincident site lattice matching condition involves a 30{sup o} rotation between the lattice of the InGaN epitaxial layer and the lattice of the spinel. This work describes an alternative approach towards realizing more compositionally homogenous InGaN films with low dislocation density emitting in the 'green gap' of low efficiency currently observed for semiconductor light emitting diodes (LEDs). This approach could lead to higher efficiency green LEDs presently of great interest for solid-state lighting applications.

Norman, A. G.; Dippo, P. C.; Moutinho, H. R.; Simon, J.; Ptak, A. J.

2012-04-09T23:59:59.000Z

295

Single-event dynamics of high-performance HBTs and GaAs MESFETs  

SciTech Connect

Picosecond charge-collection transients measured for GaAs/AlGaAs HBTs following 3.0 MeV [alpha]-particle and 620 nm picosecond laser excitation reveal charge-collection efficiencies up to twenty-eight times smaller than for GaAs MESFETs, with [approximately]90% of the charge collected within 75 ps of the ionizing event. The small charge-collection efficiency of the HBTs is a consequence of the ultrafast charge-collection dynamics in these devices. The authors show that picosecond laser excitation reproduces nicely the ion-induced transients, providing a valuable tool for the investigation of charge-collection and SEU phenomena in these devices.

McMorrow, D.; Melinger, J.S.; Campbell, A.B. (Naval Research Lab., Washington, DC (United States)); Weatherford, T.; Knudson, A.R.; Tran, L.H.

1993-12-01T23:59:59.000Z

296

Radiation-induced surface degradation of GaAs and high electron mobility transistor structures  

Science Conference Proceedings (OSTI)

Transistor heterostructures with high-carrier-mobility have been studied. It is shown that, as the {gamma}-irradiation dose {Phi} increases, their degradation occurs in the following sequence. (i) At {Phi} 0.2-eV decrease in the diffusion energy of intrinsic defects and, probably, atmospheric oxygen. (ii) At {Phi} > 10{sup 7} rad, highly structurally disordered regions larger than 1 {mu}m are formed near microscopic defects or dislocations. (iii) At {Phi} > 10{sup 8} rad, there occurs degradation of the internal AlGaAs/InGaAs/GaAs interfaces and the working channel. An effective method for studying the degradation processes in heterostructures is to employ a set of structural diagnostic methods to analyze processes of radiation-induced and aging degradation, in combination with theoretical simulation of the occurring processes.

Bobyl, A. V.; Konnikov, S. G.; Ustinov, V. M.; Baidakova, M. V.; Maleev, N. A.; Sakseev, D. A. [Russian Academy of Sciences, Ioffe Physical-Technical Institute (Russian Federation); Konakova, R. V., E-mail: konakova@isp.kiev.ua; Milenin, V. V.; Prokopenko, I. V. [National Academy of Sciences of Ukraine, Lashkaryov Institute of Semiconductor Physics (Ukraine)

2012-06-15T23:59:59.000Z

297

Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

June 6, 2012 June 6, 2012 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room62023 Washington, DC 20460 Dear Ms. Jones: On October 28, 2011, the United States Depatiment of Energy (DOE) notified Friedrich Air Conditioning Company (Friedrich) that DOE had completed testing of Friedrich room air conditioner models WS12Cl0 and WS13C30 under the ENERGY STAR Testing Pilot Program and confirmed that these models do not meet the ENERGY STAR energy efficiency requirement of9.4 EER. On November 3, 201 I, DOE notified Friedrich that its room air conditioner model USI2C30 does not meet the ENERGY STAR energy efficiency requirement of9.4 EER. In each notice, DOE gave Friedrich twenty days to provide conclusive manufacturing or design evidence or quality assurance information on why DOE testing showed that these models do not

298

Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

July 7, 2011 July 7, 2011 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue NW Room62023 Washington, DC 20460 Dear Ms. Jones: Electrolux Home Products, Inc. (Electro lux) room air conditioner model FRA256ST2 was selected for testing as part of the U.S. Department of Energy's (DOE) ENERGY STAR® Verification Testing Pilot Program. DOE's initial testing, performed on a unit of this model, indicated that it may not meet ENERGY STAR requirements. After testing three additional units of this model, and finding that each fell short of the minimum standard of9.4 EER, DOE asked Electrolux to provide conclusive manufacturing or design evidence or quality assurance information on why this product should be viewed as meeting the ENERGY STAR Program's energy efficiency

299

Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

December 21,2010 December 21,2010 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room 62023 Washington, DC 20460 Dear Ms. Jones: On November 24, 2010, the United States Department of Energy (DOE) notified Haier that DOE had tested the Haier room air conditioner model ESA3087 as part of the ENERGY STAR Testing Pilot Program, and that, according to Stage I testing, this model exceeded allowable ENERGY STAR energy-efficiency requirements by 18 percent. DOE gave Haier until December 3, 2010, to request additional testing or have this matter referred to the United States Environmental Protection Agency (EPA) for disqualification from the ENERGY STAR program. On December 2, Haier notified DOE that it was in the process of voluntarily removing model

300

Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

September 20, 2011 September 20, 2011 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room 62023 Washington, DC 20460 Dear Ms. Jones: On March 7, 2011, the United States Depmiment of Energy (DOE) notified Baier America Trading, L.L.C. (Baier) that DOE had completed testing of Baier refrigerator model PRTS21SAC* under the ENERGY STAR Verification Testing Pilot Program and confirmed that the model did not meet ENERGY STAR energy efficiency requirements. DOE gave Baier until March 28, 2011, to provide conclusive manufacturing or design evidence or quality assurance information to rebut DOE testing results, which showed that this product did not meet the ENERGY STAR Program's energy efficiency requirement. Baier responded to DOE in a letter dated March 22, 2011, contending that the results of

Index
Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


Index
301

Quantized states in homogenous polarized GaInN GaN quantum wells  

E-Print Network (OSTI)

Quantized states in homogenous polarized GaInN GaN quantum wells C. Wetzel1, S. Kamiyama1, H. Amano wells is calculated in a single particle model. The act- ing electric eld in the wells and the band gap-dimensional well layers our approach is based on induction from results obtained at the binary GaN barri- ers

Wetzel, Christian M.

302

PIEZOELECTRIC LEVEL SPLITTING IN GaInN/GaN QUANTUM WELLS  

E-Print Network (OSTI)

PIEZOELECTRIC LEVEL SPLITTING IN GaInN/GaN QUANTUM WELLS C. Wetzel, T. Takeuchi, H. Amano, and IInN/GaN multiple quantum well samples in a large set of variable composition a clear correspondence of transitions in photo- and electroreflection, as well as photoluminescence is found. The effective band offset across

Wetzel, Christian M.

303

Spontaneous emission in GaN/InGaN photonic crystal nanopillars  

E-Print Network (OSTI)

. Sigalas, "InGaN/GaN quantum-well heterostructure light-emitting diodes employing photonic crystal, "III-nitride blue and ultraviolet photonic crystal light emitting diodes," Appl. Phys. Lett. 84, 466, and H. Benisty, "Photonic-crystal GaN light-emitting diodes with tailored guided modes distribution

Recanati, Catherine

304

Princeton Plasma Physics Lab - General Atomics (GA)  

NLE Websites -- All DOE Office Websites (Extended Search)

general-atomics-ga General general-atomics-ga General Atomics en The Scorpion's Strategy: "Catch and Subdue" http://www.pppl.gov/node/1132

American Fusion News Category: 
ga">General Atomics (GA)
305

TMS P&GA Wired to Washington  

Science Conference Proceedings (OSTI)

P & GA COMMITTEE HOME ... the connection between MSE and such key U.S. initiatives as national security, energy independence, and economic growth.

306

Ohmic contacts to Si-implanted and un-implanted n-type GaN  

SciTech Connect

We report on ohmic contacts to Si-implanted and un-implanted n-type GaN on sapphire. A ring shaped contact design avoids the need to isolate the contact structures by additional implantation or etching. Metal layers of Al and Ti/Al were investigated. On un-implanted GaN, post metalization annealing was performed in an RTA for 30 seconds in N{sub 2} at 700, 800, and 900 C. A minimum specific contact resistance (r{sub c}) of 1.4{times}10{sup -5} {Omega}{minus}cm{sup 2} was measured for Ti/Al at an annealing temperature of 800 C. Although these values are reasonably low, variations of 95% in specific contact resistance were measured within a 500 {mu}m distance on the wafer. These results are most likely caused by the presence of compensating hydrogen. Specific contact resistance variation was reduced from 95 to 10% by annealing at 900 C prior to metalization. On Si-implanted GaN, un-annealed ohmic contacts were formed with Ti/Al metalization. The implant activation anneal of 1120 C generates nitrogen vacancies that leave the surface heavily n-type, which makes un-annealed ohmic contacts with low contact resistivity possible.

Brown, J; Ramer, J.; Zheng, L.F.; Hersee, S.D. [New Mexico Univ., Albuquerque, NM (United States). Center for High Technology Materials; Zolper, J. [Sandia National Labs., Albuquerque, NM (United States)

1996-02-01T23:59:59.000Z

307

ALS Chemistry Lab  

NLE Websites -- All DOE Office Websites (Extended Search)

Chemistry Lab Print ALS Chemistry Labs The ALS Chemistry Labs are located in the User Support Building (15-130) and in Building 6 (6-2233)*. These spaces are dedicated for...

308

ALS Staff Photo  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS Staff Photo Print On May 14, 2013, members of ALS staff posed for a group photo in front of the dome. A hi-res version can be downloaded here. The last staff photo was taken in...

309

ALS User Meeting  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS User Meeting Print Due to the current lapse of federal funding, Berkeley Lab Web sites, including ALS sites, are accessible, but may not be updated until Congress approves...

310

ALS User Meeting  

NLE Websites -- All DOE Office Websites (Extended Search)

User Meeting ALS User Meeting Print Tuesday, 14 June 2011 12:37 Due to the current lapse of federal funding, Berkeley Lab Web sites, including ALS sites, are accessible, but may...

311

ALS User Meeting Archives  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS User Meeting Archives ALS User Meeting Archives Print Monday, 06 June 2011 09:25 Past User Meeting Agendas, Workshops, and Awards Year Agenda Workshops David A. Shirley...

312

111111111111111111111111111111111111111111111111111111111111111111111111111111111111111111 us 20060200344Al  

E-Print Network (OSTI)

20060200344Al (19) United States (12) Patent Application Publication Kosek et al. (10) Pub. No.: US 2006) Inventors: Daniel A. Kosek, Missoula, MT (US); Robert Crawford Maher, Bozeman, MT (US) A method of reducing

Maher, Robert C.

313

GaInP/GaAs/GaInAs Monolithic Tandem Cells for High-Performance Solar Concentrators  

DOE Green Energy (OSTI)

We present a new approach for ultra-high-performance tandem solar cells that involves inverted epitaxial growth and ultra-thin device processing. The additional degree of freedom afforded by the inverted design allows the monolithic integration of high-, and medium-bandgap, lattice-matched (LM) subcell materials with lower-bandgap, lattice-mismatched (LMM) materials in a tandem structure through the use of transparent compositionally graded layers. The current work concerns an inverted, series-connected, triple-bandgap, GaInP (LM, 1.87 eV)/GaAs (LM, 1.42 eV)/GaInAs (LMM, {approx}1 eV) device structure grown on a GaAs substrate. Ultra-thin tandem devices are fabricated by mounting the epiwafers to pre-metallized Si wafer handles and selectively removing the parent GaAs substrate. The resulting handle-mounted, ultra-thin tandem cells have a number of important advantages, including improved performance and potential reclamation/reuse of the parent substrate for epitaxial growth. Additionally, realistic performance modeling calculations suggest that terrestrial concentrator efficiencies in the range of 40-45% are possible with this new tandem cell approach. A laboratory-scale (0.24 cm2), prototype GaInP/GaAs/GaInAs tandem cell with a terrestrial concentrator efficiency of 37.9% at a low concentration ratio (10.1 suns) is described, which surpasses the previous world efficiency record of 37.3%.

Wanlass, M. W.; Ahrenkiel, S. P.; Albin, D. S.; Carapella, J. J.; Duda, A.; Emery, K.; Geisz, J. F.; Jones, K.; Kurtz, S.; Moriarty, T.; Romero, M. J.

2005-08-01T23:59:59.000Z

314

Price of Elba Island, GA Liquefied Natural Gas Total Imports...  

Annual Energy Outlook 2012 (EIA)

Elba Island, GA Liquefied Natural Gas Total Imports (Dollars per Thousand Cubic Feet) Price of Elba Island, GA Liquefied Natural Gas Total Imports (Dollars per Thousand Cubic Feet)...

315

Equal Opportunity & Diversity Office WH15 MS117  

NLE Websites -- All DOE Office Websites (Extended Search)

Equal Opportunity & Diversity Office WH15 MS117 Questions & to Volunteer: Samantha Poeppelman x3933 Barb Hehner x 2986 Sandra Charles x 4574 Wednesday & Thursday, November 13 & 14,...

316

LA-9252-MS UC-70a  

Office of Legacy Management (LM)

/p/j ,()i --' /p/j ,()i --' z!- LA-9252-MS UC-70a Issued: May 1982 Environmental Analysis of the Bayo Canyon (TA-10) Site, Los Alamos, New Mexico Roger W. Ferenbaugh Thomas E. Buhl Alan K. Stoker Wayne FL Hansen kos A[am@ Los Alamos,New Mexico 87545 Los Alamos National Laboratory CONTENTS ABSTRACT 1 1.0 INTRODUCTION AND BACKGROUND 1.1 The FUSRAP Program 1.2 Preferred Alternative 2.0 THE BAY0 CANYON SITE 2.1 Summary History and Description of Site 2.1.1 Description of Site 2.1.2 History of Site 2.2 Need for Action 2.2.1 Radiological Risk 2.2.1.1 Method of Estimating Risk 2.2.1.2 Results of Dose Calculations 2.2.1.3 Health Risks from Residual Bayo Canyon Contamination 2.2.2 Criteria upon Which Cleanup Action is Based 2.3 Other Agencies Involved in Implementation of the

317

Toward Joint Hypothesis-Tests Seismic Event Screening Analysis: Ms|mb and Event Depth  

SciTech Connect

Well established theory can be used to combine single-phenomenology hypothesis tests into a multi-phenomenology event screening hypothesis test (Fisher's and Tippett's tests). Commonly used standard error in Ms:mb event screening hypothesis test is not fully consistent with physical basis. Improved standard error - Better agreement with physical basis, and correctly partitions error to include Model Error as a component of variance, correctly reduces station noise variance through network averaging. For 2009 DPRK test - Commonly used standard error 'rejects' H0 even with better scaling slope ({beta} = 1, Selby et al.), improved standard error 'fails to rejects' H0.

Anderson, Dale [Los Alamos National Laboratory; Selby, Neil [AWE Blacknest

2012-08-14T23:59:59.000Z

318

US SoAtl GA Site Consumption  

Gasoline and Diesel Fuel Update (EIA)

GA GA Site Consumption million Btu $0 $500 $1,000 $1,500 $2,000 $2,500 US SoAtl GA Expenditures dollars ALL ENERGY average per household (excl. transportation) 0 4,000 8,000 12,000 16,000 US SoAtl GA Site Consumption kilowatthours $0 $300 $600 $900 $1,200 $1,500 $1,800 US SoAtl GA Expenditures dollars ELECTRICITY ONLY average per household * Site energy consumption (89.5 million Btu) and energy expenditures per household ($2,067) in Georgia are similar to the U.S. household averages. * Per household electricity consumption in Georgia is among the highest in the country, but similar to other states in the South. * Forty-five percent of homes in Georgia were built since 1990, a characteristic typically associated with lower per household consumption. Georgia homes,

319

US SoAtl GA Site Consumption  

U.S. Energy Information Administration (EIA) Indexed Site

GA GA Site Consumption million Btu $0 $500 $1,000 $1,500 $2,000 $2,500 US SoAtl GA Expenditures dollars ALL ENERGY average per household (excl. transportation) 0 4,000 8,000 12,000 16,000 US SoAtl GA Site Consumption kilowatthours $0 $300 $600 $900 $1,200 $1,500 $1,800 US SoAtl GA Expenditures dollars ELECTRICITY ONLY average per household * Site energy consumption (89.5 million Btu) and energy expenditures per household ($2,067) in Georgia are similar to the U.S. household averages. * Per household electricity consumption in Georgia is among the highest in the country, but similar to other states in the South. * Forty-five percent of homes in Georgia were built since 1990, a characteristic typically associated with lower per household consumption. Georgia homes,

320

ALS User Meeting Archives  

NLE Websites -- All DOE Office Websites (Extended Search)

and Mike Scheinfein (Arizona State University) for development of the PEEM2 photoemission electron microscope. to the members of the ALS User Services Office (Ruth Pepe, Bernie...

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


321

ALS Postdoctoral Fellowship Highlights  

NLE Websites -- All DOE Office Websites (Extended Search)

Postdoctoral Fellowship Highlights Print Since its inception in 2005, the ALS Postdoctoral Fellowship program has supported young scientists in new and ongoing research projects at...

322

Howes et al. Reply  

E-Print Network (OSTI)

Howes et al. Reply to Comment on "Kinetic Simulations of Magnetized Turbulence in Astrophysical Plasmas" arXiv:0711.4355

Howes, G G; Dorland, W; Hammett, G W; Quataert, E; Schekochihin, A A; Tatsuno, T; 10.1103/PhysRevLett.101.149502

2008-01-01T23:59:59.000Z

323

ALS Users' Association Charter  

NLE Websites -- All DOE Office Websites (Extended Search)

Users' Executive Committee ALS Users' Association Charter Print The purpose of the Advanced Light Source Users' Association (ALSUA) is to provide an organized framework for the...

324

ALS Postdoctoral Fellowship Program  

NLE Websites -- All DOE Office Websites (Extended Search)

x-ray radiation for scientific and technological research. As the world's first third-generation synchrotron radiation source, the ALS offers outstanding performance in the...

325

Characterization of high-quality InGaN/GaN multiquantum wells with time-resolved photoluminescence  

E-Print Network (OSTI)

Characterization of high-quality InGaN/GaN multiquantum wells with time-resolved photoluminescence October 1997; accepted for publication 5 January 1998 Recombination in single quantum well and multiquantum well InGaN/GaN structures is studied using time-resolved photoluminescence and pulsed

Bowers, John

326

Journal of Crystal Growth 298 (2007) 272275 Dislocation analysis in homoepitaxial GaInN/GaN light emitting  

E-Print Network (OSTI)

of GaInN/GaN-based light emitting diodes (LED) on quasi-bulk GaN with an atomically flat polished were much improved. The optical output power of the light emitting diode increased by more than one. Cathodoluminescence; A1. Threading dislocation density; A2. Homoepitaxial growth; B1. GaInN; B3. Light emitting diode

Wetzel, Christian M.

327

Discrete Steps in the Capacitance-Voltage Characteristics of GaInN/GaN Light Emitting Diode Structures  

E-Print Network (OSTI)

Discrete Steps in the Capacitance-Voltage Characteristics of GaInN/GaN Light Emitting Diode and GaInN/GaN heterostructures typically used for high efficiency light emitting diodes is of high materials for green, blue, and UV light emitting diodes (LED) [1-2]. It is known that huge piezoelectric

Wetzel, Christian M.

328

GA Solar | Open Energy Information  

Open Energy Info (EERE)

Solar Solar Jump to: navigation, search Name GA-Solar Place Madrid, Spain Zip 28045 Sector Solar Product Madrid based solar project developer, owned by Spanish industrial group Corporacion Gestamp. Coordinates 40.4203°, -3.705774° Loading map... {"minzoom":false,"mappingservice":"googlemaps3","type":"ROADMAP","zoom":14,"types":["ROADMAP","SATELLITE","HYBRID","TERRAIN"],"geoservice":"google","maxzoom":false,"width":"600px","height":"350px","centre":false,"title":"","label":"","icon":"","visitedicon":"","lines":[],"polygons":[],"circles":[],"rectangles":[],"copycoords":false,"static":false,"wmsoverlay":"","layers":[],"controls":["pan","zoom","type","scale","streetview"],"zoomstyle":"DEFAULT","typestyle":"DEFAULT","autoinfowindows":false,"kml":[],"gkml":[],"fusiontables":[],"resizable":false,"tilt":0,"kmlrezoom":false,"poi":true,"imageoverlays":[],"markercluster":false,"searchmarkers":"","locations":[{"text":"","title":"","link":null,"lat":40.4203,"lon":-3.705774,"alt":0,"address":"","icon":"","group":"","inlineLabel":"","visitedicon":""}]}

329

J1, MBE Growth of Metamorphic InGaP on GaAs and GaP for Wide ...  

Science Conference Proceedings (OSTI)

I4, Electrical Spin Injection in a Hybrid Organic/Inorganic Spin-Polarized Light Emitting Diode (Spin-LED) · I5, Properties of MnAs/GaMnAs/MnAs Magnetic ...

330

Plasma Enhanced ALD of High-k Dielectrics on GaN and AlGaN  

Science Conference Proceedings (OSTI)

Recent efforts to improve performance of high power devices have focused on the ... Characterization of Degradation for MLCC under Thermal and Electrical ...

331

Scanning capacitance microscopy of AlGaN/GaN heterostructure field-effect transistor epitaxial layer structures  

E-Print Network (OSTI)

, University of California, San Diego, La Jolla, California, 92093-0407 J. M. Redwing and K. S. Boutros ATMI

Yu, Edward T.

332

SnO2 functionalized AlGaN/GaN high electron mobility transistor for hydrogen sensing applications  

E-Print Network (OSTI)

. Nanocrystalline indium oxide-doped tin oxide thin film as low temperature hydrogen sensor. Sensors and Actuators B Available online 1 May 2012 Keywords: Hydrogen sensor High electron mobility transistors (HEMT) Tin oxide rights reserved. 1. Introduction Hydrogen is a clean, renewable, and sustainable energy carrier

Florida, University of

333

An accurate polynomial-based analytical charge control model for AlGaN/GaN HEMT  

Science Conference Proceedings (OSTI)

A new nonlinear expression of Fermi-level variation with two-dimensional electron gas density in a high electron mobility has been proposed. It was found that our expression has a better fit with the numerical results. And, an analytical expression for n{sub s} in terms of the applied gate voltage is developed. Comparing with other previous approximations, the solutions of our expression has a better agreement with the exact numerical results over the entire range of interest. Besides, the solutions of our expression of n{sub s} versus V{sub G} are compared with the experimental data and shown to be in good agreement over a wide range of bias conditions.

Pu Jinrong; Sun Jiuxun, E-mail: sjx@uestc.edu.cn; Zhang Da [University of Electronic Science and Technology of China, Department of Applied Physics (China)

2011-09-15T23:59:59.000Z

334

Science DMZ for ALS  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS ALS About ESnet Overview ESnet Staff Governance Our Network Case Studies OSCARS Case Studies Science DMZ Case Studies Science DMZ CU Science DMZ Penn State & VTTI Science DMZ NOAA Science DMZ NERSC Science DMZ ALS Multi-facility Workflow LCLS ESnet Strategic Plan ESnet Organizational Chart ESnet History Science Requirements Careers Contact Us Technical Assistance: 1 800-33-ESnet (Inside the US) 1 800-333-7638 (Inside the US) 1 510-486-7600 (Globally) 1 510-486-7607 (Globally) Report Network Problems: trouble@es.net Provide Web Site Feedback: info@es.net Science DMZ for ALS Many beamline scientists at Berkeley Lab's Advanced Light Source (ALS) are or will be experiencing slower network speeds because of instrument upgrades. These new instruments, or more specifically detectors, are

335

GaN directional couplers for integrated quantum photonics  

SciTech Connect

Large cross-section GaN waveguides are proposed as a suitable architecture to achieve integrated quantum photonic circuits. Directional couplers with this geometry have been designed with aid of the beam propagation method and fabricated using inductively coupled plasma etching. Scanning electron microscopy inspection shows high quality facets for end coupling and a well defined gap between rib pairs in the coupling region. Optical characterization at 800 nm shows single-mode operation and coupling-length-dependent splitting ratios. Two photon interference of degenerate photon pairs has been observed in the directional coupler by measurement of the Hong-Ou-Mandel dip [C. K. Hong, et al., Phys. Rev. Lett. 59, 2044 (1987)] with 96% visibility.

Zhang Yanfeng; McKnight, Loyd; Watson, Ian M.; Gu, Erdan; Calvez, Stephane; Dawson, Martin D. [Institute of Photonics, SUPA, University of Strathclyde, Glasgow G4 0NW (United Kingdom); Engin, Erman; Cryan, Martin J.; Thompson, Mark G.; O'Brien, Jeremy L. [Centre for Quantum Photonics, H. H. Wills Physics Laboratory and Department of Electrical and Electronic Engineering, University of Bristol, Merchant Venturers Building, Woodland Road, Bristol BS8 1UB (United Kingdom)

2011-10-17T23:59:59.000Z

336

Growth of cubic GaN quantum dots  

SciTech Connect

Zinc-blende GaN quantum dots were grown on 3C-AlN(001) by two different methods in a molecular beam epitaxy system. The quantum dots in method A were fabricated by the Stranski-Krastanov growth process. The quantum dots in method B were fabricated by droplet epitaxy, a vapor-liquid-solid process. The density of the quantum dots was controllable in a range of 10{sup 8} cm{sup -2} to 10{sup 12} cm{sup -2}. Reflection high energy electron diffraction analysis confirmed the zinc-blende crystal structure of the QDs. Photoluminescence spectroscopy revealed the optical activity of the QDs, the emission energy was in agreement with the exciton ground state transition energy of theoretical calculations.

Schupp, T.; Lischka, K.; As, D. J. [Universitaet Paderborn, Department Physik, Warburger Str.100, 33095 Paderborn (Germany); Meisch, T.; Neuschl, B.; Feneberg, M.; Thonke, K. [Institut fuer Quantenmaterie, Universitaet Ulm, 89069 Ulm (Germany)

2010-11-01T23:59:59.000Z

337

Genizah MS T-S AS 148.202  

E-Print Network (OSTI)

Letter in the hand of Yefet b. Manasseh, mentioning Ab? ?Al? b. [...], discussing business matters....

Unknown

2011-02-24T23:59:59.000Z

338

Plasma Damage in p-GaN  

SciTech Connect

The effect of Inductively Coupled Plasma H{sub 2} or Ar discharges on the breakdown voltage of p-GaN diodes was measured over a range of ion energies and fluxes. The main effect of plasma exposure is a decrease in net acceptor concentration to depths of 400-550{angstrom}. At high ion fluxes or energies there can be type conversion of the initially p-GaN surface. Post etch annealing at 900 C restores the initial conductivity.

Cao, X.A.; Dang, G.T.; Hickman, R.A.; Pearton, S.J.; Ren, F.; Shul, R.J.; Van Hove, J.M.; Zhang, A.P.; Zhang, L.

1999-06-30T23:59:59.000Z

339

GaTe semiconductor for radiation detection  

SciTech Connect

GaTe semiconductor is used as a room-temperature radiation detector. GaTe has useful properties for radiation detectors: ideal bandgap, favorable mobilities, low melting point (no evaporation), non-hygroscopic nature, and availability of high-purity starting materials. The detector can be used, e.g., for detection of illicit nuclear weapons and radiological dispersed devices at ports of entry, in cities, and off shore and for determination of medical isotopes present in a patient.

Payne, Stephen A. (Castro Valley, CA); Burger, Arnold (Nashville, TN); Mandal, Krishna C. (Ashland, MA)

2009-06-23T23:59:59.000Z

340

Study of high quality indium nitride films grown on Si(100) substrate by RF-MOMBE with GZO and AlN buffer layers  

Science Conference Proceedings (OSTI)

Wurtzite structure InN films were prepared on Si(100) substrates using radio-frequency metal-organic molecular beam epitaxy (RF-MOMBE) system. Ga-doped ZnO (GZO) and Amorphous AlN (a-AlN) film were used as buffer layers for InN films growth. Structural, ...

Wei-Chun Chen, Shou-Yi Kuo

2012-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


341

FeAl and Mo-Si-B Intermetallic Coatings Prepared by Thermal Spraying  

SciTech Connect

FeAl and Mo-Si-B intermetallic coatings for elevated temperature environmental resistance were prepared using high-velocity oxy-fuel (HVOF) and air plasma spray (APS) techniques. For both coating types, the effect of coating parameters (spray particle velocity and temperature) on the microstructure and physical properties of the coatings was assessed. Fe-24Al (wt.%) coatings were prepared using HVOF thermal spraying at spray particle velocities varying from 540 m/s to 700 m/s. Mo-13.4Si-2.6B coatings were prepared using APS at particle velocities of 180 and 350 m/s. Residual stresses in the HVOF FeAl coatings were compressive, while stresses in the APS Mo-Si-B coatings were tensile. In both cases, residual stresses became more compressive with increasing spray particle velocity due to increased peening imparted by the spray particles. The hardness and elastic moduli of FeAl coatings also increased with increasing particle velocity, again due to an increased peening effect. For Mo-Si-B coatings, plasma spraying at 180 m/s resulted in significant oxidation of the spray particles and conversion of the T1 phase into amorphous silica and {alpha}-Mo. The T1 phase was retained after spraying at 350 m/s.

Totemeier, T.C.; Wright, R.N.; Swank, W.D.

2003-04-22T23:59:59.000Z

342

Interface contributions to peak broadening in CE-ESI-MS  

SciTech Connect

The applications of capillary electrophoresis (CE) are expanding, and a number of commercial CE instruments are now available. Combining CE with mass spectroscopy (MS), first done with an electrospray ionization (ESI) interface, yields additional advantages. Other interfaces have been proposed, but CE-ESI-MS offers better sensitivity, reduced background, applicability to higher molecular weight (MW) compounds and a better interface design. Our aim has been to exploit the advantages of automated CE coupled to MS for separation of biological materials. Details of our instrument design are provided. Samples used for these studies were a mixture of myoglobin proteins (MW {approximately}17 kilodaltons) and a tryptic digest of tuna cytochrome c. The results show the ESI-MS interface does not broaden bands, and ion dissociation in the mass spectrometer permits the unambiguous identification of fragments in cases where mass alone is insufficient. 2 refs., 2 figs. (MHB)

Udseth, H.R.; Barinaga, C.J.; Smith, R.D. (Pacific Northwest Lab., Richland, WA (USA)); Whitted, W.H. (Beckman Instruments, Inc., Palo Alto, CA (USA))

1991-06-01T23:59:59.000Z

343

Genizah MS T-S AS 152.98  

E-Print Network (OSTI)

Accounts and lists, probably from a notebook. On 1r list of Genesis Parashot, on 2v several names such as Sulaym?n, Sa??d and M?s?, with numerals....

Unknown

2011-02-24T23:59:59.000Z

344

To: Ms. Patrice Brewington From: The Environmental Project  

NLE Websites -- All DOE Office Websites (Extended Search)

To: Ms. Patrice Brewington From: The Environmental Project Re: Quarterly Report (July 1,2005 - September 30,2005) Federal FY 4Q DOE Expenditures: 924,746.60 Summary During FY '05...

345

ALS User Meeting Archives  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS User Meeting Archives ALS User Meeting Archives Past User Meeting Agendas, Workshops, and Awards Year Agenda Workshops David A. Shirley (Science) Klaus Halbach (Instrumentation) Tim Renner (Service) 2012 2012 User Meeting Agenda 2012 User Meeting Workshops 2012 ALS User Meeting Awards Carl Percival, Dudley Shallcross, Craig Taatjes and David Osborn (Sandia), for making the first direct measurements of the reactions of Criegee intermediates, and showing that their impact on tropospheric chemistry and climate may be substantially greater than previously assumed. 2012 ALS User Meeting Awards Jeff Dickert and Simon Morton of Berkeley Lab's Physical Biosciences Division for the invention and implementation of the Compact Variable Collimator (CVC), which has led to a dramatic increase in productivity of protein crystallography.

346

ALS Beamlines Directory  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS Beamlines Directory Print ALS Beamlines Directory Print Beamlines, Parameters, Contact Information, and Schedules Download a high-resolution version of the ALS Beamclock. See Beamclock to view the ALS energy-related beamlines beamclock. Beamline Parameters Beamline and endstation technical information is available through the links below. Unless otherwise noted, all beamlines are currently operational. Individual beamline schedules are posted when available. Please contact the responsible beamline scientist for additional schedule information. When calling from off-site, all beamline (BL) phone numbers that begin with a "2" are preceded by 495- (i.e., 495-2014); all others are preceded by 486-. Beamline Number Source Technique/ Group Name Energy Range Beamline Contact Schedule/BL Phone

347

ALS Beamlines Directory  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS Beamlines Directory Print ALS Beamlines Directory Print Beamlines, Parameters, Contact Information, and Schedules Download a high-resolution version of the ALS Beamclock. See Beamclock to view the ALS energy-related beamlines beamclock. Beamline Parameters Beamline and endstation technical information is available through the links below. Unless otherwise noted, all beamlines are currently operational. Individual beamline schedules are posted when available. Please contact the responsible beamline scientist for additional schedule information. When calling from off-site, all beamline (BL) phone numbers that begin with a "2" are preceded by 495- (i.e., 495-2014); all others are preceded by 486-. Beamline Number Source Technique/ Group Name Energy Range Beamline Contact Schedule/BL Phone

348

2012 ALS Open House  

NLE Websites -- All DOE Office Websites (Extended Search)

House 2012 ALS Open House Print More than 6000 people came up the hill to see what is happening at Berkeley Lab during Open House on Saturday, October 13, and more than 1500 of...

349

ALS User Meeting  

NLE Websites -- All DOE Office Websites (Extended Search)

Print Due to the current lapse of federal funding, Berkeley Lab Web sites, including ALS sites, are accessible, but may not be updated until Congress approves funds for Fiscal...

350

Nanocrystals cylindrical microcavities exploiting thin-walled InGaAs/GaAs microtubes  

Science Conference Proceedings (OSTI)

This paper relies on the design and fabrication of CdSe/ZnS core/shell colloidal nanocrystals (NCs) cylindrical microcavities for microphotonics applications. The fabrication technology relies on the release of the strain in strained heterostructures, ... Keywords: Colloidal nanocrystals, InGaAs/GaAs microtubes, Strained multilayer

C. Giordano; M. T. Todaro; A. Salhi; L. Martiradonna; I. Viola; A. Passabí; L. Carbone; G. Gigli; A. Passaseo; M. De Vittorio

2007-05-01T23:59:59.000Z

351

Development of a Bulk GaN Growth Technique for Low Defect Density, Large-Area Native Substrates  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

the Electrochemical Solution the Electrochemical Solution Growth (ESG) Technique for Native GaN Substrates DOE Energy Storage & Power Electronics Research Program 30 September 2008 PI: Karen Waldrip Advanced Power Sources R&D, Dept 2546 PM: Stan Atcitty, John Boyes Sandia National Laboratories, Albuquerque, NM, 87185 Sponsor: Gil Bindewald, DOE Power Electronics & Energy Storage Program Sandia is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United States Department of Energy's National Nuclear Security Administration under contract DE-AC04-94AL85000. Outline * Motivation * Existing GaN Growth Technique - Epitaxial Lateral Overgrowth - Methods for Growing Bulk GaN * Development of the Electrochemical Solution Growth Technique

352

Genizah MS T-S AS 146.446  

E-Print Network (OSTI)

Recto: legal document; 1425 of the Seleucid era (= 1114 CE); relating to dowry payments after a divorce; mentions Ezekiel and Ab? ?Umar David b. Yefet. Signed by Abraham b. Shemaya he-?aver descendant of Shemaya Ga?on and Isaac b. Samuel...

Unknown

2011-02-25T23:59:59.000Z

353

Lattice constant grading in the Al.sub.y Ca.sub.1-y As.sub.1-x Sb.sub.x alloy system  

DOE Patents (OSTI)

Liquid phase epitaxy is employed to grow a lattice matched layer of GaAsSb on GaAs substrates through the compositional intermediary of the III-V alloy system AlGaAsSb which acts as a grading layer. The Al constituent reaches a peak atomic concentration of about 6% within the first 2.5.mu.m of the transition layer, then decreases smoothly to about 1% to obtain a lattice constant of 5.74 A. In the same interval the equilibrium concentration of Sb smoothly increases from 0 to about 9 atomic percent to form a surface on which a GaAsSb layer having the desired energy bandgap of 1.1 ev for one junction of an optimized dual junction photovoltaic device. The liquid phase epitaxy is accomplished with a step cooling procedure whereby dislocation defects are more uniformly distributed over the surface of the growing layer.

Moon, Ronald L. (Palo Alto, CA)

1981-01-01T23:59:59.000Z

354

Synthesis and Mechanical Properties of AL/ ?-Al12Mg17 ...  

Science Conference Proceedings (OSTI)

Symposium, Advances in Mechanics of One-Dimensional Micro/Nano Materials. Presentation Title, Synthesis and Mechanical Properties of AL/ ?-Al12Mg17 ...

355

Temperature dependence of the dielectric response of AlSb  

SciTech Connect

Spectroscopic ellipometry was used to determine the optical response of an intrinsic AlSb film as a function of temperature. The 1.5 {mu}m thick film was grown on a (001) GaAs substrate by molecular beam epitaxy. Measurements were done at temperatures from 300 K to the growth temperature of 800 K over a spectral range of 0.7 to 5.0 eV. To avoid oxidation artifacts, measurements were done with the film in situ. The data were analyzed using a parametric semiconductor model for its temperature dependence.

Jung, Y. W.; Kim, T. J.; Kim, Y. D. [Nano-Optical Property Laboratory and Department of Physics, Kyung Hee University, Seoul (Korea, Republic of); Shin, S. H.; Kim, S. Y.; Song, J. D. [Center for Spintronics Research, Korea Institute of Science and Technology, Seoul (Korea, Republic of)

2011-12-23T23:59:59.000Z

356

Data Management at the ALS  

NLE Websites -- All DOE Office Websites (Extended Search)

Data Management at the ALS Print Users of the ALS are responsible for meeting their data management obligations to their home institutions and granting agencies. The ALS does not...

357

Genizah MS T-S AS 146.24  

E-Print Network (OSTI)

Agreement that the physician Ab? l-?asan Joseph b. Josi[a]h al-Tunis? will pay 14 dinars to Hil?l b. Sahl al-?ahrajt?, the silk merchant....

Unknown

2011-02-24T23:59:59.000Z

358

Al-Zr (Aluminum - Zirconium)  

Science Conference Proceedings (OSTI)

Al-Zr crystallographic data...6 3 / mcm ZrAl 22.8 oC 8 Cmcm Zr 2 Al 3 31 oF 40 Fdd 2 ZrAl 2 37.2 hP 12 P 6 3 / mmc ZrAl 3 47 tI 16 I 4/ mmm (Al) 99.86 to 100 cF 4 Fm m...

359

Genizah MS T-S AS 121.32  

E-Print Network (OSTI)

Court record int the hand of ?alfon b. Manasseh; mentions the names Shaykh Ab? ?Al?, Meshullam known as Musallam...

Unknown

2011-02-24T23:59:59.000Z

360

Multiwavelength optical observations of the chromospherically active binary system MS Ser  

E-Print Network (OSTI)

We present here a continuation of our ongoing project of multiwavelength optical observations aimed at studying the chromosphere of active binary systems using the information provided for several optical spectroscopic features that are formed at different heights in the chromosphere (Montes et al. 1997, 1998; Sanz-Forcada et al. 1998). In this contribution we focus our study on the preliminar analysis of the active binary system MS Ser. We have taken H$\\alpha$ and H$\\beta$ spectra in 1995 with the Coude Spectrograph at 2.2m telescope in Calar Alto, and high resolution SOFIN echelle spectra (covering H_alpha, H_beta, Na I D_{1} and D_{2}, He I D_{3}, Mg I b triplet, Ca II H & K, and Ca II infrared triplet lines) in 1998 with the 2.56m Nordic Optical Telescope (NOT) in La Palma. A strong emission in the Ca II H & K and Ca II IRT lines, coming from the primary component (recently classified as K2IV) is observed. One of the Ca II H & K spectra (at orbital phase near quadrature) reveals that the secondary (G8V) also exhibit a small emission. A near complete and variable filling-in of the H_alpha and H_beta is obtained after the application of the spectral subtraction technique. We detect also some seasonal variations between these two observing runs and in comparation with our previous Ca II H & K observations taken in 1993 (Montes et al. 1995).

J. Sanz-Forcada; D. Montes; M. J. Fernandez-Figueroa; E. De Castro; M. Cornide

1998-09-09T23:59:59.000Z

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


361

Genizah MS T-S AS 153.183  

E-Print Network (OSTI)

Letter; mentions Ibn Dimy???, Ibn al-Buny?m (?), Ab? l-Munajj?, Ibn S?lim al-?ayraf? al-?A???r, Ab? l-?asan b. Noah and the sums '3 and a half dinars' and '6 dirhams'....

Unknown

2011-02-25T23:59:59.000Z

362

Genizah MS T-S AS 148.5  

E-Print Network (OSTI)

*k T-S AS 148.5 *t Memorial list *s 23 x 7.5; 23 lines (recto); 19 lines (verso) *m Paper; 1 leaf; holes, slightly rubbed *l Hebrew; Judaeo-Arabic *c Memorial list of the families of Ibn ?ulayb Kohanim, T?j al-Ma??n?, Ibn al-Dayy?n and Ibn Naf?? al...

Unknown

2011-02-24T23:59:59.000Z

363

Genizah MS T-S AS 153.84  

E-Print Network (OSTI)

*k T-S AS 153.84 *t Accounts *s 12.9 x 9.7; 9 lines (recto); 5 lines (verso) *m Paper; 1 leaf; torn, holes, smudged, rubbed, faded *l Judaeo-Arabic *c Accounts. Contains a number of names and professions such as Joseph, Umm ?Al?, al-?azz?n, al...

Unknown

2011-02-24T23:59:59.000Z

364

Genizah MS T-S AS 149.12  

E-Print Network (OSTI)

Detailed business letter of Isaac Sim?a al-Nays?b?r? (probably Alexandria), apparently to ?Ull? ha-Levi b. Joseph in Fus??? (according to Gil ca. 1080 CE). Names mentioned include Ab? al-Ri?? b. Kal?m, Ab? Mu?ammad ?Abd al-Sal?m b. ?uwayd Nuqla, Ab?...

Unknown

2011-02-24T23:59:59.000Z

365

2012 ALS User Meeting Awards  

NLE Websites -- All DOE Office Websites (Extended Search)

ALS User Meeting Awards Print Recipients of the 2012 Users' Executive Committee awards and Student Poster Competition were announced Tuesday, October 9, at the ALS User Meeting....

366

2012 ALS User Meeting Awards  

NLE Websites -- All DOE Office Websites (Extended Search)

Awards 2012 ALS User Meeting Awards Print Recipients of the 2012 Users' Executive Committee awards and Student Poster Competition were announced Tuesday, October 9, at the ALS User...

367

2012 ALS User Meeting Awards  

NLE Websites -- All DOE Office Websites (Extended Search)

2 ALS User Meeting Awards Recipients of the 2012 Users' Executive Committee awards and Student Poster Competition were announced Tuesday, October 9, at the ALS User Meeting. David...

368

2012 ALS User Meeting Awards  

NLE Websites -- All DOE Office Websites (Extended Search)

2012 ALS User Meeting Awards Print Recipients of the 2012 Users' Executive Committee awards and Student Poster Competition were announced Tuesday, October 9, at the ALS User...

369

GaN Nanopore Arrays: Fabrication and Characterization  

E-Print Network (OSTI)

GaN nanopore arrays with pore diameters of approximately 75 nm were fabricated by inductively coupled plasma etching (ICP) using anodic aluminum oxide (AAO) films as etch masks. Nanoporous AAO films were formed on the GaN ...

Wang, Yadong

370

ALS in the News  

NLE Websites -- All DOE Office Websites (Extended Search)

feed-image feed-image Digg: ALSBerkeleyLab Facebook Page: 208064938929 Flickr: advancedlightsource Twitter: ALSBerkeleyLab YouTube: AdvancedLightSource Home About the ALS ALS in the News ALS in the News Roman Seawater Concrete Holds the Secret to Cutting Carbon Emissions Print Tuesday, 04 June 2013 00:00 An international team led by Paulo Monteiro of the Advanced Light Source and UC Berkeley has analyzed samples of Roman concrete from harbor installations that have survived 2,000 years of chemical attack and wave action, "one of the most durable construction materials on the planet," says UC Berkeley's Marie Jackson, a leading member of the team. Says Monteiro, "It's not that modern concrete isn't good, but manufacturing Portland cement accounts for seven percent of the carbon dioxide that industry puts into the air." The carbon footprint of Roman concrete, made from lime, volcanic ash, and seawater, is much smaller.

371

ALS Beamlines Directory  

NLE Websites -- All DOE Office Websites (Extended Search)

Beamlines Directory Beamlines Directory ALS Beamlines Directory Print Beamlines, Parameters, Contact Information, and Schedules Download a high-resolution version of the ALS Beamclock. See Beamclock to view the ALS energy-related beamlines beamclock. Beamline Parameters Beamline and endstation technical information is available through the links below. Unless otherwise noted, all beamlines are currently operational. Individual beamline schedules are posted when available. Please contact the responsible beamline scientist for additional schedule information. When calling from off-site, all beamline (BL) phone numbers that begin with a "2" are preceded by 495- (i.e., 495-2014); all others are preceded by 486-. Beamline Number Source Technique/ Group Name Energy Range Beamline Contact Schedule/BL Phone

372

www.elsevier.com/locate/fuel Trace elements in coal derived liquids: analysis by ICP-MS and  

E-Print Network (OSTI)

Concentrations of trace elements in coal derived liquids have been investigated by inductively coupled plasma-mass spectrometry (ICP-MS) and by Mössbauer spectroscopy. Liquefaction extracts prepared from the Argonne Premium Coals and a coal tar pitch have been examined. Microwave digestion in concentrated nitric acid has been shown as a suitable method for determining trace element concentrations in coal derived liquids by ICP-MS—for sample sizes as small as 3–20 mg. High concentrations of Fe were found for all extract samples (?265–1474 ppm). Ti, Cr, Mn, Co, Ga, Sb, Cs and Ba were measurable. Concentration distributions of trace elements found in the extracts bore little relation to the corresponding distributions in the original coals. The proportions of individual trace elements present in the original coals and found in the extracts, varied widely. Mössbauer spectroscopy of the extracts indicated that the high Fe-concentrations corresponded to the presence of organometallic-Fe compounds—and not to pyritic iron. There is evidence suggesting the presence of material derived from iron-storage proteins such as ferritin, but final proof is lacking. Our data suggest that other metallic ions detected in these coal derived liquids may be present in association with the organic material. Concentrations of paramagnetic metal species were found to be of the same order of magnitude as ESR spin-densities already found in coal liquids. Both types of paramagnetic species are suspected of causing loss of signal in

Mössbauer Spectroscopy; R. Richaud A; H. Lachas A; M. -j. Lazaro A; L. J. Clarke B; K. E. Jarvis B; A. A. Herod A; T. C. Gibb C; R. Kandiyoti A

1999-01-01T23:59:59.000Z

373

Magnetoelastic Coupling in NiMnGa Ferromagnetic Shape ...  

Science Conference Proceedings (OSTI)

... Magnetoelastic Coupling in NiMnGa Ferromagnetic Shape Memory Alloys. Peng Zhao (Dept. of Materials Science and ...

374

X-ray Photoelectron Spectroscopy ofGaP_{1-x}N_x Photocorroded as a Result of Hydrogen Productionthrough Water Electrolysis  

DOE Green Energy (OSTI)

Photoelectrochemical (PEC) cells produce hydrogen gas through the sunlight driven electrolysis of water. By extracting hydrogen and oxygen from water and storing solar energy in the H-H bond, they offer a promising renewable energy technology. Addition of dilute amounts of nitrogen to III-V semiconductors has been shown to dramatically increase the stability of these materials for hydrogen production. In an effort to learn more about the origin of semiconductor photocorrosion in PEC cells, three samples of p-type GaP with varying levels of nitrogen content (0%, 0.2%, 2%) were photocorroded and examined by X-ray Photoelectron Spectroscopy (XPS). GaPN samples were observed to be more efficient during the hydrogen production process than the pure GaP samples. Sample surfaces contained gallium oxides in the form of Ga{sub 2}O{sub 3} and Ga(OH){sub 3} and phosphorus oxide (P{sub 2}O{sub 5}), as well as surface oxides from exposure to air. A significant shift in intensity from bulk to surface peaks dramatic nitrogen segregation to the surface during photoelectrochemical hydrogen production. Further investigations, including using a scanning electron microscope to investigate sample topography and inductively coupled plasma mass spectroscopy (ICP-MS) analysis for solution analyses, are under way to determine the mechanism for these changes.

Mayer, Marie A.; /Illinois U., Urbana /SLAC

2006-09-27T23:59:59.000Z

375

GaN: Defect and Device Issues  

SciTech Connect

The role of extended and point defects, and key impurities such as C, O and H, on the electrical and optical properties of GaN is reviewed. Recent progress in the development of high reliability contacts, thermal processing, dry and wet etching techniques, implantation doping and isolation and gate insulator technology is detailed. Finally, the performance of GaN-based electronic and photonic devices such as field effect transistors, UV detectors, laser diodes and light-emitting diodes is covered, along with the influence of process-induced or grown-in defects and impurities on the device physics.

Pearton, S.J.; Ren, F.; Shul, R.J.; Zolper, J.C.

1998-11-09T23:59:59.000Z

376

GaAs photoconductive semiconductor switch  

DOE Patents (OSTI)

A high gain, optically triggered, photoconductive semiconductor switch (PCSS) implemented in GaAs as a reverse-biased pin structure with a passivation layer above the intrinsic GaAs substrate in the gap between the two electrodes of the device. The reverse-biased configuration in combination with the addition of the passivation layer greatly reduces surface current leakage that has been a problem for prior PCSS devices and enables employment of the much less expensive and more reliable DC charging systems instead of the pulsed charging systems that needed to be used with prior PCSS devices.

Loubriel, Guillermo M. (Sandia Park, NM); Baca, Albert G. (Albuquerque, NM); Zutavern, Fred J. (Albuquerque, NM)

1998-01-01T23:59:59.000Z

377

A New Combustion Synthesis Method for GaN:Eu3+ and Ga2O3 :Eu3+  

E-Print Network (OSTI)

A New Combustion Synthesis Method for GaN:Eu3+ and Ga2O3 :Eu3+ Luminescent Powders G. A. Hirata1 between the precursors. The preparation of Eu-doped Ga2O3 powders was achieved using a new combustion)3 and Ga(NO3)3 as the precursors and hydrazine as (non-carbonaceous) fuel. A spontaneous combustion

McKittrick, Joanna

378

Realization of low resistive p-ZnO thin film by Al-As codoping  

Science Conference Proceedings (OSTI)

Al-As codoping into ZnO has been proposed to realize low resistive and stable p-ZnO thin film by RF magnetron sputtering. Al-As codoping has been achieved by As back diffusion from GaAs substrate and sputtering Al doped ZnO target. Hall measurements showed that the hole concentration increases with the increase of Al concentration from 10{sup 15} to 10{sup 20} cm{sup -3}. Among the grown films, 1 at% Al doped ZnO: As showed low resistivity (3.5x10{sup -2}{Omega}cm) with high hole concentration. X-ray diffraction shows that all the films are crystallized in wurtzite structure with (002) preferential orientation. The diffusion of As atoms from the substrate and the presence of dopants in the film have been confirmed by Rutherford ford back scattering and energy dispersive spectroscopy analysis, respectively.

Balakrishnan, L.; Gowrishankar, S.; Gopalakrishnan, N. [Thin Film Laboratory, Department of Physics, National Institute of Technology, Tiruchirappalli 620015 (India)

2012-06-05T23:59:59.000Z

379

JJ2, Optical Polarization of Non-Polar GaInN/GaN LEDs  

Science Conference Proceedings (OSTI)

I4, Electrical Spin Injection in a Hybrid Organic/Inorganic Spin-Polarized Light Emitting Diode (Spin-LED) · I5, Properties of MnAs/GaMnAs/MnAs Magnetic ...

380

K1, Molecular Beam Epitaxy of Catalyst-Free InGaN/GaN Nanowires ...  

Science Conference Proceedings (OSTI)

I4, Electrical Spin Injection in a Hybrid Organic/Inorganic Spin-Polarized Light Emitting Diode (Spin-LED) · I5, Properties of MnAs/GaMnAs/MnAs Magnetic ...

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


381

Guided Neuronal Growth on Arrays of Biofunctionalized GaAs/InGaAs Semiconductor Microtubes  

E-Print Network (OSTI)

We demonstrate embedded growth of cortical mouse neurons in dense arrays of semiconductor microtubes. The microtubes, fabricated from a strained GaAs/InGaAs heterostructure, guide axon growth through them and enable electrical and optical probing of propagating action potentials. The coaxial nature of the microtubes -- similar to myelin -- is expected to enhance the signal transduction along the axon. We present a technique of suppressing arsenic toxicity and prove the success of this technique by overgrowing neuronal mouse cells.

Cornelius S. Bausch; Aune Koitmäe; Eric Stava; Amanda Price; Pedro J. Resto; Yu Huang; David Sonnenberg; Yuliya Stark; Christian Heyn; Justin C. Williams; Erik W. Dent; Robert H. Blick

2013-05-06T23:59:59.000Z

382

Recent progress in InGaAsSb/GaSb TPV devices  

DOE Green Energy (OSTI)

AstroPower is developing InGaAsSb thermophotovoltaic (TPV) devices. This photovoltaic cell is a two-layer epitaxial InGaAsSb structure formed by liquid-phase epitaxy on a GaSb substrate. The (direct) bandgap of the In{sub 1{minus}x}Ga{sub x}As{sub 1{minus}y}Sb{sub y} alloy is 0.50 to 0.55 eV, depending on its exact alloy composition (x,y); and is closely lattice-matched to the GaSb substrate. The use of the quaternary alloy, as opposed to a ternary alloy--such as, for example InGaAs/InP--permits low bandgap devices optimized for 1,000 to 1,500 C thermal sources with, at the same time, near-exact lattice matching to the GaSb substrate. Lattice matching is important since even a small degree of lattice mismatch degrades device performance and reliability and increases processing complexity. Internal quantum efficiencies as high as 95% have been measured at a wavelength of 2 microns. At 1 micron wavelengths, internal quantum efficiencies of 55% have been observed. The open-circuit voltage at currents of 0.3 A/cm{sup 2} is 0.220 volts and 0.280 V for current densities of 2 A/cm{sup 2}. Fill factors of 56% have been measured at 60 mA/cm{sup 2}. However, as current density increases there is some decrease in fill factor. The results to date show that the GaSb-based quaternary compounds provide a viable and high performance energy conversion solution for thermophotovoltaic systems operating with 1,000 to 1,500 C source temperatures.

Shellenbarger, Z.A.; Mauk, M.G.; DiNetta, L.C. [AstroPower, Inc., Newark, DE (United States); Charache, G.W. [Lockheed Martin Corp., Schenectady, NY (United States)

1996-05-01T23:59:59.000Z

383

GaNPAs Solar Cells Lattice-Matched To GaP: Preprint  

DOE Green Energy (OSTI)

This conference paper describes the III-V semiconductors grown on silicon substrates are very attractive for lower-cost, high-efficiency multijunction solar cells, but lattice-mismatched alloys that result in high dislocation densities have been unable to achieve satisfactory performance. GaNxP1-x-yAsy is a direct-gap III-V alloy that can be grown lattice-matched to Si when y= 4.7x - 0.1. We propose the use of lattice-matched GaNPAs on silicon for high-efficiency multijunction solar cells. We have grown GaNxP1-x-yAsy on GaP (with a similar lattice constant to silicon) by metal-organic chemical vapor phase epitaxy with direct band-gaps in the range of 1.5 to 2.0 eV. We demonstrate the performance of single-junction GaNxP1-x-yAsy solar cells grown on GaP substrates and discuss the prospects for the development of monolithic high-efficiency multijunction solar cells based on silicon substrates.

Geisz, J. F.; Friedman, D. J.; Kurtz, S.

2002-05-01T23:59:59.000Z

384

ALS User Meeting Archives  

NLE Websites -- All DOE Office Websites (Extended Search)

User Meeting Archives Print User Meeting Archives Print Past User Meeting Agendas, Workshops, and Awards Year Agenda Workshops David A. Shirley (Science) Klaus Halbach (Instrumentation) Tim Renner (Service) 2012 2012 User Meeting Agenda 2012 User Meeting Workshops 2012 ALS User Meeting Awards Carl Percival, Dudley Shallcross, Craig Taatjes and David Osborn (Sandia), for making the first direct measurements of the reactions of Criegee intermediates, and showing that their impact on tropospheric chemistry and climate may be substantially greater than previously assumed. 2012 ALS User Meeting Awards Jeff Dickert and Simon Morton of Berkeley Lab's Physical Biosciences Division for the invention and implementation of the Compact Variable Collimator (CVC), which has led to a dramatic increase in productivity of protein crystallography.

385

ALS Beamlines Directory  

NLE Websites -- All DOE Office Websites (Extended Search)

Beamlines Directory Print Beamlines Directory Print Beamlines, Parameters, Contact Information, and Schedules Download a high-resolution version of the ALS Beamclock. See Beamclock to view the ALS energy-related beamlines beamclock. Beamline Parameters Beamline and endstation technical information is available through the links below. Unless otherwise noted, all beamlines are currently operational. Individual beamline schedules are posted when available. Please contact the responsible beamline scientist for additional schedule information. When calling from off-site, all beamline (BL) phone numbers that begin with a "2" are preceded by 495- (i.e., 495-2014); all others are preceded by 486-. Beamline Number Source Technique/ Group Name Energy Range Beamline Contact Schedule/BL Phone

386

ALS Beamlines Directory  

NLE Websites -- All DOE Office Websites (Extended Search)

Beamlines Directory Print Beamlines Directory Print Beamlines, Parameters, Contact Information, and Schedules Download a high-resolution version of the ALS Beamclock. See Beamclock to view the ALS energy-related beamlines beamclock. Beamline Parameters Beamline and endstation technical information is available through the links below. Unless otherwise noted, all beamlines are currently operational. Individual beamline schedules are posted when available. Please contact the responsible beamline scientist for additional schedule information. When calling from off-site, all beamline (BL) phone numbers that begin with a "2" are preceded by 495- (i.e., 495-2014); all others are preceded by 486-. Beamline Number Source Technique/ Group Name Energy Range Beamline Contact Schedule/BL Phone

387

Emerging M&S application in risk management  

Science Conference Proceedings (OSTI)

There has been compelling signs of the great potential of building further synergy with academics, researchers, and industry practitioners from the areas of Modeling and Simulation (M&S) managing risk events. This paper provides an introduction to risk ... Keywords: engineering management, risk analysis, risk assessment, risk management, systems engineering

C. Ariel Pinto; Andreas Tolk; Michael McShane

2011-04-01T23:59:59.000Z

388

(WPI-iCeMS) Pure Nano Drugs*  

E-Print Network (OSTI)

(WPI-iCeMS) SN-38 50 nm * Pure Nano Drugs* SN-38 10 HepG2* JST (-STEP Permeation and Retention (EPR)* EPR 20100 nm SN-38 SN-38 * SN-38 * SN-38 20 SN-38 Pure Nano Drugs

Takada, Shoji

389

Office of Student Services Health Science Campus MS 1026  

E-Print Network (OSTI)

Office of Student Services Health Science Campus MS 1026 Collier Building 4405 3000 Arlington Avenue Toledo, OH 43614-2598 419-383-5810 BSN Consortium Planning Guide Bowling Green State University College of Health & Human Services Nursing Advisor - Health Center Rm. 102 Bowling Green, OH 43403 419

Moore, Paul A.

390

SPE-163690-MS Synthetic, Geomechanical Logs for Marcellus Shale  

E-Print Network (OSTI)

SPE-163690-MS Synthetic, Geomechanical Logs for Marcellus Shale M. O. Eshkalak, SPE, S. D of hydrocarbons from the reservoirs, notably shale, is attributed to realizing the key fundamentals of reservoir and mineralogy is crucial in order to identify the "right" pay-zone intervals for shale gas production. Also

Mohaghegh, Shahab

391

Genizah MS T-S AS 148.6  

E-Print Network (OSTI)

Ketubbah of a virgin with trousseau list, including kerchiefs (mand?l) and cushions (ma??dd). Mentions ?Al? he-?aver and Fus???....

Unknown

2011-02-24T23:59:59.000Z

392

Genizah MS T-S AS 150.1  

E-Print Network (OSTI)

priest (qiss?s), may be sold only to a Jew; mentioning Ab? l-Ma??n? b. al-Masj?n? and the priest Mak?rim....

Unknown

2011-02-24T23:59:59.000Z

393

Electronic properties and deep traps in electron-irradiated n-GaN  

Science Conference Proceedings (OSTI)

The study is concerned with the effect of electron irradiation (with the energies E = 7 and 10 MeV and doses D = 10{sup 16}-10{sup 18} cm{sup -2}) and subsequent heat treatments in the temperature range 100-1000 Degree-Sign C on the electrical properties and the spectrum of deep traps of undoped (concentration of electrons n = 1 Multiplication-Sign 10{sup 14}-1 Multiplication-Sign 10{sup 16} cm{sup -3}), moderately Si-doped (n = (1.2-2) Multiplication-Sign 10{sup 17} cm{sup -3}), and heavily Si-doped (n = (2-3.5) Multiplication-Sign 10{sup 18} cm{sup -3}) epitaxial n-GaN layers grown on Al{sub 2}O{sub 3} substrates by metal-organic chemical vapor deposition. It is found that, on electron irradiation, the resistivity of n-GaN increases, this is due to a shift of the Fermi level to the limiting position close to E{sub c} -0.91 eV. The spectrum of deep traps is studied for the initial and electron-irradiated n-GaN. It is shown that the initial properties of the irradiated material are restored in the temperature range 100-1000 Degree-Sign C, with the main stage of the annealing of radiation defects at about 400 Degree-Sign C.

Brudnyi, V. N., E-mail: brudnyi@mail.tsu.ru [Tomsk State University (Russian Federation); Verevkin, S. S. [Karpov Institute of Physical Chemistry (Russian Federation); Govorkov, A. V. [Joint Stock Company 'Federal State Research and Design Institute of Rare Metal Industry (Giredmet)' (Russian Federation); Ermakov, V. S.; Kolin, N. G.; Korulin, A. V. [Karpov Institute of Physical Chemistry (Russian Federation); Polyakov, A. Ya.; Smirnov, N. B. [Joint Stock Company 'Federal State Research and Design Institute of Rare Metal Industry (Giredmet)' (Russian Federation)

2012-04-15T23:59:59.000Z

394

Genizah MS T-S AS 148.125  

E-Print Network (OSTI)

Recto: document (note or receipt) that the elder Ibrahim al-Parnas gave the writer an exchange bill for the monthly wage on the account of the elder Ab? l-?asan al-?ar?r?. The writer received '18' and there remains a rest of the debt. Verso...

Unknown

2011-02-24T23:59:59.000Z

395

(AlIn)GaN Multi Quantum Wells for Blue Lasers by ...  

Science Conference Proceedings (OSTI)

... 13th International Conference on Defects--Recognition, Imaging and Physics in ... Capacitance Spectroscopy of Deep States in Quantum Dot Heterostructures.

396

B4, Admittance Spectroscopy of GaSb(100) and ALD / PEALD Al 2 O ...  

Science Conference Proceedings (OSTI)

PEALD was employed to reduce the thermal budget of dielectric deposition, ..... Bands and Hopping-Induced Mixed Valence for Ti and Sc in GdSc1-x TixO3 for x  ...

397

Session II: Intersubband Devices: AlInN and InGaN Materials ...  

Science Conference Proceedings (OSTI)

Jun 24, 2011 ... However, the numerous experimental attempts to study the vertical transport in the III-Nitride thin film resonant tunneling diodes (RTD) haven't ...

398

A novel approach for the improvement of open circuit voltage and fill factor of InGaAsSb/GaSb thermophotovoltaic cells  

DOE Green Energy (OSTI)

Heterojunction n-Al{sub 0.25}Ga{sub 0.75}As{sub 0.02}Sb{sub 098}/p-In{sub 0.16}Ga{sub 0.84}As{sub 0.04}Sb{sub 0.96} thermophotovoltaic (TPV) cells were grown by molecular-beam epitaxy on n-GaSb-substrates. In the spectral range from 1 {micro}m to 2.1 {micro}m these cells, as well as homojunction n-p-In{sub 0.16}Ga{sub 0.84}As{sub 0.04}Sb{sub 0.96} cells, have demonstrated internal quantum efficiencies exceeding 80%, despite about a 200 meV barrier in the conduction band at the heterointerface. Estimation shows that the thermal emission of the electrons photogenerated in p-region over this barrier can provide high efficiency for hetero-cells if the electron recombination time in p-In{sub 0.16}Ga{sub 0.84}As{sub 0.04}Sb{sub 0.96}is longer than 10 ns. Keeping the same internal efficiency as homojunction cells, hetero-cells provide a unique opportunity to decrease the dark forward current and thereby increase open circuit voltage (V{sub {proportional_to}}) and fill factor at a given illumination level. It is shown that the decrease of the forward current in hetero-cells is due to the lower recombination rate in n-type wider-bandgap space-charge region and to the suppression of the hole component of the forward current. The improvement in V{sub {proportional_to}} reaches 100% at illumination level equivalent to 1 mA/cm{sup 2} and it decreases to 5% at the highest illumination levels (2--3 A/cm{sup 2}), where the electron current component dominates in both the homo- and heterojunction cells. Values of V{sub {proportional_to}} as high as 310 meV have been obtained for a hetero-cell at illumination levels of 3 A/cm{sup 2}. Under this condition, the expected fill factor value is about 72% for a hetero-cell with improved series resistance. The heterojunction concept provides excellent prospects for further reduction of the dark forward current in TPV cells.

Garbuzov, D.Z.; Martinelli, R.U.; Khalfin, V.; Lee, H.; Morris, N.A.; Taylor, G.C.; Connolly, J.C. [Sarnoff Corp., Princeton, NJ (United States); Charache, G.W.; DePoy, D.M. [Lockheed-Martin, Inc., Schenectady, NY (United States)

1997-10-01T23:59:59.000Z

399

Dynamics of nuclear polarization in InGaAs quantum dots in a transverse magnetic field  

SciTech Connect

The time-resolved Hanle effect is examined for negatively charged InGaAs/GaAs quantum dots. Experimental data are analyzed by using an original approach to separate behavior of the longitudinal and transverse components of nuclear polarization. This made it possible to determine the rise and decay times of each component of nuclear polarization and their dependence on transverse magnetic field strength. The rise and decay times of the longitudinal component of nuclear polarization (parallel to the applied field) were found to be almost equal (approximately 5 ms). An analysis of the transverse component of nuclear polarization shows that the corresponding rise and decay times differ widely and strongly depend on magnetic field strength, increasing from a few to tens of milliseconds with an applied field between 20 and 100 mT. Current phenomenological models fail to explain the observed behavior of nuclear polarization. To find an explanation, an adequate theory of spin dynamics should be developed for the nuclear spin system of a quantum dot under conditions of strong quadrupole splitting.

Verbin, S. Yu., E-mail: syuv54@mail.ru; Gerlovin, I. Ya.; Ignatiev, I. V., E-mail: ivan_ignatiev@mail.ru; Kuznetsova, M. S.; Cherbunin, R. V. [St. Petersburg State University, Spin Optics Laboratory (Russian Federation); Flisinski, K.; Yakovlev, D. R.; Bayer, M. [Technische Universitaet Dortmund (Germany)

2012-04-15T23:59:59.000Z

400

2012 ALS User Meeting Awards  

NLE Websites -- All DOE Office Websites (Extended Search)

2 ALS User Meeting Awards 2012 ALS User Meeting Awards Print Wednesday, 10 October 2012 15:30 Recipients of the 2012 Users' Executive Committee awards and Student Poster...

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


401

Growth and photoluminescence of self-catalyzed GaP/GaNP core/shell nanowires on Si(111) by gas source molecular beam epitaxy  

Science Conference Proceedings (OSTI)

We report a study on self-catalyzed GaP/GaNP core/shell nanowires (NWs) grown on Si(111) by gas-source molecular beam epitaxy. Scanning electron microscopy images show that vertical and uniform GaP NWs and GaP/GaNP core/shell NWs are grown on Si(111). The density ranges from {approx}1 x 10{sup 7} to {approx}5 x 10{sup 8} cm{sup -2} across the substrate. Typical diameters are {approx}110 nm for GaP NWs and {approx}220 nm for GaP/GaNP NWs. Room temperature photoluminescence (PL) signal from the GaP/GaNP core/shell NWs confirms that N is incorporated in the shell and the average N content is {approx}0.9%. The PL low-energy tail is significantly reduced, compared to bulk GaNP.

Kuang, Y. J. [Department of Physics, University of California, San Diego, La Jolla, California 92093 (United States); Sukrittanon, S. [Graduate Program of Material Science and Engineering, University of California, San Diego, La Jolla, California 92093 (United States); Li, H. [Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093 (United States); Tu, C. W. [Graduate Program of Material Science and Engineering, University of California, San Diego, La Jolla, California 92093 (United States); Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093 (United States)

2012-01-30T23:59:59.000Z

402

Microsoft Word - MS-OM-1005 NEPA.docx  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

MS-OM-1005 MS-OM-1005 Title: FY 2012 Annual Site Subsidence Surveys Description: Subcontractor shall provide all labor, supervision, materials, equipment, transportation, and services necessary to perform a subsidence survey of the Bayou Choctaw, Big Hill, Bryan Mound and West Hackberry SPR sites. Regulatory Requirements: NEPA Implementing Procedures (10 CFR 1021) 10 CFR 1021.410 (Application of Categorical Exclusions) (a) The actions listed in Appendices A and B of Subpart D are classes of actions that DOE has determined do not individually or cumulatively have a significant effect on the human environment (categorical exclusions). (b) To find that a proposal is categorically excluded, DOE shall determine the following: (1) The proposed action fits within a class of actions that is listed in Appendix A or B of Subpart D;

403

Commander, Naval Base ATTN: Ms. Cheryl Barnett Building N-26  

Office of Legacy Management (LM)

.J>?j 1.2 1990 .J>?j 1.2 1990 Commander, Naval Base ATTN: Ms. Cheryl Barnett Building N-26 Code N 9 E Norfolk, Virginia 23511-6002 Dear Ms. Barnett: I enjoyed speaking with you on the phone. The Department of Energy (DOE) has established its Formerly Utilized Sites Remedial Action Program (FUSRAP) to identify sites formerly utilized by its predecessor agencies in the early days of the nation's atomic energy program and to determine the potential for these sites to contain radiological contamination, related to DOE's past activities, which may require remedial action. When necessary, radiological surveys of individual sites are performed to provide the data necessary to make this necessary determination. As we discussed, in July 1956, the Atomic Energy Commission (a DOE

404

Microsoft Word - MS-OM-1185NEPAHeatExchanger.docx  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

MS-OM-1185 MS-OM-1185 Title: Hydrogen Peroxide Treatment of SPR Heat Exchangers BOA Description: Subcontractor shall provide all labor, supervision, materials, supplies, equipment, tools, and transportation required to treat the water side of the SPR heat exchangers. Work includes providing turnkey chemical injection equipment, chemical (hydrogen peroxide), chemical containment vessels, and fittings/piping/tubing required to connect the chemical injection equipment to the site heat exchangers. Subcontractor shall remove and clean all equipment and properly dispose of any waste materials after the work is completed. Regulatory Requirements: NEPA Implementing Procedures (10 CFR 1021) 10 CFR 1021.410 (Application of Categorical Exclusions) (a) The actions listed in Appendices A and B of Subpart D are classes of actions that DOE has determined do

405

Ms. Kimberly Krizanovic U.S. Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

0, 2012 0, 2012 Ms. Kimberly Krizanovic U.S. Department of Energy Office of the Chief Financial Officer 4 th Floor, Suite 4A-236 1000 Independence Avenue Washington, DC 20585 Dear Ms. Krizanovic: The American Institute of Certified Public Accountants (AICPA) is the national, professional association of CPAs, with 369,000 CPA members worldwide in business and industry, public practice, government, education, student affiliates and international associates. It sets ethical standards for the profession and U.S. auditing standards for audits of private companies, nonprofit organizations, federal, state, and local governments. It also develops and grades the Uniform CPA Examination. On behalf of the AICPA and its Governmental Audit Quality Center, we appreciate the

406

CONCURRENC RTG. SYMBOL GC-34 Ms. Mary Beth Brado  

Office of Legacy Management (LM)

MAY 2 9 1980 MAY 2 9 1980 CONCURRENC RTG. SYMBOL GC-34 Ms. Mary Beth Brado "*N'W Town of Lewiston * i..,! 1375 Ridge Road ^r'8 Lewiston, New York 14092 RTG.SYuBOL Dear Ms. Brado: .- ,l13. INirIA Lss iQ. W'Mott This is in response to your letter of January 29, 1980, and subsequent ..... ,. telephone discussions with irr. Brazley of my office, concerning land use 5/ /8 restrictions on the 1,511 acres declared surplus in the Towns of Lewiston RGSYMOL. and Porter, New York. In regard to your question of land use restriction and its application to the surplus land in the Lewiston area, our Office of General Counsel deter- DATE'- mined that the Department of Energy does not have the authority to restrict any land use or development of the property in question. Such authority nrTG SYMOL

407

Ms. Katharine Kaplan ENERGY STAR Product Development USEPA Headquarters  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

7, 2010 7, 2010 Ms. Katharine Kaplan ENERGY STAR Product Development USEPA Headquarters 1200 Pennsylvania Avenue, NW (6202J) Washington , DC 20460 Dear Ms. Kaplan: On May 7, 2010, the United States Department of Energy (DOE) notified ASKO Appliances, Inc. that DOE had tested ASKO dishwasher model D5122XXLB as part of the ENERGY STAR Verification Testing Pilot Program , and that, according to DOE's testing, this model exceeded allowable ENERGY STAR efficiency requirements by 12 percent. DOE gave ASKO until May 17, 2010 to request additional testing or have this matter referred to the United States Environmental Protection Agency (EPA). ASKO has not requested testing of additional units by the DOE deadline. On May 12, ASKO sent an email to DOE disputing DOE's testing and providing their own test reports for the model

408

Negative ion photodetachment spectroscopy of the Al3O2 , Al3O3 , Al4Ox , Al5Ox (x = 35), Al6O5 , and Al7O5 clusters  

E-Print Network (OSTI)

Negative ion photodetachment spectroscopy of the Al3O2 , Al3O3 , Al4Ox , Al5Ox (x = 3­5), Al6O5 , and Al7O5 clusters Giovanni Meloni, Michael J. Ferguson and Daniel M. Neumark Department of Chemistry as an Advance Article on the web 9th September 2003 The Al3O2 , Al3O3 , Al4Ox , Al5Ox (x ¼ 3­5), Al6O5 , and Al7

Neumark, Daniel M.

409

Growth orientation dependent photoluminescence of GaAsN alloys  

SciTech Connect

We report photoluminescence (PL) studies of both as-grown and electron-irradiated GaAsN epilayers on (311)A/B and (100) GaAs substrates. A long room-temperature (RT) PL lifetime, as well as an enhanced N incorporation, is observed in (311)B GaAsN epilayers as compared with (311)A and (100) samples. There is no direct correlation between the RT PL lifetime and the emission intensity from Ga vacancy complex detected at low temperature. The lifetime damage coefficient is relatively low for (311)B GaAsN. The irradiation-induced nonradiative recombination defects are suggested to be N- and/or As-related according to a geometrical analysis based on the tetrahedral coordination of GaAsN crystal.

Han, Xiuxun; Tanaka, Tomohiro; Kojima, Nobuaki; Ohshita, Yoshio; Yamaguchi, Masafumi [Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 (Japan); Sato, Shinichiro [Japan Atomic Energy Agency, 1233 Watanuki, Takasaki, Gunma 370-1292 (Japan)

2012-01-16T23:59:59.000Z

410

Direct observation of surface ethyl to ethane interconversion upon C2H4 hydrogenation over Pt/Al2O3 catalyst by time-resolved FT-IR spectroscopy  

E-Print Network (OSTI)

In-Situ Spectroscopy of Catalysts; Weckhuysen, B.M. , Ed. ;Hydrogenation over Pt/Al 2 O 3 Catalyst by Time-Resolved FT-over alumina-supported Pt catalyst were recorded at 25 ms

Wasylenko, Walter; Frei, Heinz

2004-01-01T23:59:59.000Z

411

Effect of Temperature on GaGdO/GaN Metal Oxide Semiconductor Field Effect Transistors  

SciTech Connect

GaGdO was deposited on GaN for use as a gate dielectric in order to fabricate a depletion metal oxide semiconductor field effect transistor (MOSFET). This is the fmt demonstration of such a device in the III-Nitride system. Analysis of the effect of temperature on the device shows that gate leakage is significantly reduced at elevated temperature relative to a conventional metal semiconductor field effeet transistor (MESFET) fabricated on the same GaN layer. MOSFET device operation in fact improved upon heating to 400 C. Modeling of the effeet of temperature on contact resistance suggests that the improvement is due to a reduction in the parasitic resistances present in the device.

Abernathy, C.R.; Baca, A.; Chu, S.N.G.; Hong, M.; Lothian, J.R.; Marcus, M.A.; Pearton, S.J.; Ren, F.; Schurman, M.J.

1998-10-14T23:59:59.000Z

412

A InGaN/GaN quantum dot green ({lambda}=524 nm) laser  

SciTech Connect

The characteristics of self-organized InGaN/GaN quantum dot lasers are reported. The laser heterostructures were grown on c-plane GaN substrates by plasma-assisted molecular beam epitaxy and the laser facets were formed by focused ion beam etching with gallium. Emission above threshold is characterized by a peak at 524 nm (green) and linewidth of 0.7 nm. The lowest measured threshold current density is 1.2 kA/cm{sup 2} at 278 K. The slope and wall plug efficiencies are 0.74 W/A and {approx}1.1%, respectively, at 1.3 kA/cm{sup 2}. The value of T{sub 0}=233 K in the temperature range of 260-300 K.

Zhang Meng; Banerjee, Animesh; Lee, Chi-Sen; Hinckley, John M.; Bhattacharya, Pallab [Department of Electrical Engineering and Computer Science, Center for Nanoscale Photonics and Spintronics, University of Michigan, Ann Arbor, Michigan 48109-2122 (United States)

2011-05-30T23:59:59.000Z

413

GaInSb and GaInAsSb thermophotovoltaic device fabrication and characterization  

DOE Green Energy (OSTI)

Thermophotovoltaic (TPV) devices have been fabricated using epitaxial ternary and quaternary layers grown on GaSb substrates. The GaInSb layers were grown by organometallic vapor phase epitaxy (OMVPE) and the InGaAsSb lattice-matched layers were grown by liquid phase epitaxy (LPE). Device fabrication steps include unannealed p-type ohmic contacts, annealed Sn/Au n-type ohmic contacts, and a thick Ag top-surface contact using a lift-off process. Devices are characterized primarily by dark I-V, photo I-V, and quantum efficiency measurements, which are correlated to microscopic and macroscopic material properties. Particular emphasis has been on material enhancements to increase quantum efficiency and decrease dark saturation current density. TPV device performance is presently limited by the base diffusion length, typically 1 to 2 microns.

Hitchcock, C.; Gutmann, R.; Borrego, J.; Ehsani, H.; Bhat, I. [Rensselaer Polytechnic Inst., Troy, NY (United States); Freeman, M.; Charache, G. [Lockheed Martin, Inc., Schenectady, NY (United States)

1997-05-01T23:59:59.000Z

414

Transport properties of InGaAs/GaAs Heterostructures with {delta}-doped quantum wells  

Science Conference Proceedings (OSTI)

The lateral transport of electrons in single- and double-well pseudomorphic GaAs/n-InGaAs/GaAs heterostructures with quantum wells 50-100 meV deep and impurity {delta}-layers in the wells, with concentrations in the range 10{sup 11} electron mobility with an increase in the impurity concentration. The results obtained indicate that the impurity-band electron states play an important role in the conductivity of these structures. Involvement of the impurity band also allows to explain adequately the characteristics of the conductivity of double-well structures; in contrast to single-well structures, band bending caused by asymmetric doping is of great importance. The numerical calculations of conductivity within the model under consideration confirm these suggestions.

Baidus, N. V. [Nizhni Novgorod State University, Physical-Technical Research Institute (Russian Federation); Vainberg, V. V. [National Academy of Sciences of Ukraine, Institute of Physics (Ukraine); Zvonkov, B. N. [Nizhni Novgorod State University, Physical-Technical Research Institute (Russian Federation); Pylypchuk, A. S., E-mail: pylypchuk@iop.kiev.ua; Poroshin, V. N.; Sarbey, O. G. [National Academy of Sciences of Ukraine, Institute of Physics (Ukraine)

2012-05-15T23:59:59.000Z

415

2013 ALS User Meeting Highlights  

NLE Websites -- All DOE Office Websites (Extended Search)

2013 ALS User Meeting Highlights 2013 ALS User Meeting Highlights 2013 ALS User Meeting Highlights Print This year's ALS User Meeting launched with a welcome from Users' Executive Committee Chair Corie Ralston and LBNL Director Paul Alivisatos. ALS Director Roger Falcone followed with a "state of the ALS" presentation that began with a reminder of the ALS mission, which he noted remains true even in the midst of a government shutdown: "Supporting users in doing outstanding science in a safe environment." Falcone gave the 414 meeting attendees an update on the ALS beamlines, which included good news about increased user numbers thanks to the new RAPIDD access system, enhanced robotics, and remote capabilities. Falcone reflected that ALS metrics continue to represent our highly productive users-the number of journal articles and papers per user that come from ALS research have continued to grow in the past year. Looking forward, Falcone touched on how a proposed ALS upgrade to a diffraction-limited light source would increase scientific capabilities.

416

2013 ALS User Meeting Highlights  

NLE Websites -- All DOE Office Websites (Extended Search)

2013 ALS User Meeting Highlights 2013 ALS User Meeting Highlights 2013 ALS User Meeting Highlights Print Thursday, 24 October 2013 09:06 This year's ALS User Meeting launched with a welcome from Users' Executive Committee Chair Corie Ralston and LBNL Director Paul Alivisatos. ALS Director Roger Falcone followed with a "state of the ALS" presentation that began with a reminder of the ALS mission, which he noted remains true even in the midst of a government shutdown: "Supporting users in doing outstanding science in a safe environment." Falcone gave the 414 meeting attendees an update on the ALS beamlines, which included good news about increased user numbers thanks to the new RAPIDD access system, enhanced robotics, and remote capabilities. Falcone reflected that ALS metrics continue to represent our highly productive users-the number of journal articles and papers per user that come from ALS research have continued to grow in the past year. Looking forward, Falcone touched on how a proposed ALS upgrade to a diffraction-limited light source would increase scientific capabilities.

417

Band gap tuning and optical absorption in type-II InAs/GaSb mid infrared short period superlattices: 14 bands K Dot-Operator p study  

Science Conference Proceedings (OSTI)

The MBE growth of short-period InAs/GaSb type-II superlattice structures, varied around 20.5 A InAs/24 A GaSb were [J. Applied physics, 96, 2580 (2004)] carried out by Haugan et al. These SLs were designed to produce devices with an optimum mid-infrared photoresponse and a sharpest photoresponse cutoff. We have used a realistic and reliable 14-band k.p formalism description of the superlattice electronic band structure to calculate the absorption coefficient in such short-period InAs/GaSb type-II superlattices. The parameters for this formalism are known from fitting to independent experiments for the bulk materials. The band-gap energies are obtained without any fitting parameters, and are in good agreement with experimental data.

AbuEl-Rub, Khaled M. [Department of Applied Physical Sciences, Jordan University of Science and Technology Irbid, 21141 (Jordan)

2012-09-06T23:59:59.000Z

418

Automated Dispersive Solid Phase Extraction of Pesticide Residues in Botanicals using Triple Quadrupole LC/MS/MS  

E-Print Network (OSTI)

in 12.5 min; hold for 3 min MS conditions Drying gas temp: 225°C Sheath gas temp: 325°C Gas flow rate: 8 L/min Sheath gas flow: 10 L/min Nebulizer pressure: 40 psi EMV: 400 V Capillary voltage: 4000 V was then centrifuged at 5,000 x rpm for 3min ·Acetonitrile (1 ml) extract was transferred to a 2 ml auto-sampler vial

Heller, Barbara

419

MS&T'11 Poster Session: Processing and Product Manufacturing ...  

Science Conference Proceedings (OSTI)

Oct 18, 2011 ... With the increasing cost of natural gas, power-generating turbines are looking ..... take place (main phase is TiAl with layer depth 10-15 mcm).

420

Genizah MS T-S AS 147.4  

E-Print Network (OSTI)

Part of a letter of Isma??l b. Isaac al-Andalus? (ca. 1050 CE). Mentions Ab? Is??q Abraham b. Jacob and Ibn Ša?y?....

Unknown

2011-02-24T23:59:59.000Z

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


421

Genizah MS T-S AS 141.5C  

E-Print Network (OSTI)

*k T-S AS 141.5C *t Grammar *s 9.7 x 13.3 (1 leaf: 6.7); 5–8 lines *m Paper; 2 leaves (bifolium); holes, rubbed, faded, stained *l Judaeo-Arabic; Hebrew *c David ben Abraham al-F?s?, Kit?b J?mi? al-Alf?z (Skoss (ed.) (1936–1945): II, 478, 479... and unidentified) *e Belongs with T-S AS 5A–B, D...

Unknown

2011-02-24T23:59:59.000Z

422

Atomistic Modeling of Thermodynamic Properties of Pu-Ga Alloys ...  

Science Conference Proceedings (OSTI)

Atomistic Modeling of Thermodynamic Properties of Pu-Ga Alloys Based on the ... Resources for the Selection and Use of Interatomic Potentials in Atomistic ...

423

GA Hot Cell D&D Closeout Report  

Office of Legacy Management (LM)

contractors supported the dismantlement including asbestos removal and concrete cutting, electrical, and HVAC. Project support functions were provided by GA organizations...

424

Light emission from InGaAs:Bi/GaAs quantum wells at 1.3 {mu}m  

Science Conference Proceedings (OSTI)

Highly strained InGaAs:Bi quantum wells (QWs) were grown on (001)-oriented GaAs substrates by molecular beam epitaxy (MBE). Photoluminescence (PL) reveals strong improvements in the optical properties evidenced by 10 times enhancement in PL intensity and extended emission wavelength up to 1.29 {mu}m when Bi is introduced to InGaAs/GaAs QWs. The improved optical quality results from the Bi surfactant effect as well as the Bi incorporation. Post growth thermal annealing shows that Bi atoms in InGaAs/GaAs QWs do not show good thermal stability at 650 Degree-Sign C and tend to diffuse out of the QWs resulting in large wavelength blue-shifts.

Ye Hong; Song Yuxin; Wang Shumin [Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg SE-41296 (Sweden); Gu Yi [Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)

2012-12-15T23:59:59.000Z

425

Impact of the Ga/In ratio on the N incorporation into (In,Ga)(As,N) quantum dots  

Science Conference Proceedings (OSTI)

In this work, we demonstrate the dependence of the nitrogen incorporation on the Ga/In content into (In,Ga)(As,N) quantum dots (QDs) grown on GaAs (100) by radio-frequency plasma assisted molecular beam epitaxy (MBE). Morphological analysis by atomic force microscopy and cross-sectional transmission electron microscopy, together with an estimation of the transition thickness, monitored in situ during the growth, predict a maximum in the N incorporation for 30% Ga content. This result is confirmed by photoluminescence measurements of the as-grown and post-growth annealed samples. We attribute this behavior to a trade off between two mechanisms depending on the Ga/In content: one related to the stability of the Ga-N bond, and the other related to the surface strain and/or In segregation.

Gargallo-Caballero, R.; Guzman, A.; Ulloa, J. M.; Hierro, A. [Instituto de Sistemas Optoelectronicos y Microtecnologia (ISOM)-Departamento de Ingenieria Electronica, ETSI Telecomunicacion, Universidad Politecnica de Madrid, Ciudad Universitaria s/n, 28040 Madrid (Spain); Hopkinson, M. [Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield S1 3JD (United Kingdom); Luna, E.; Trampert, A. [Paul Drude Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany)

2012-04-15T23:59:59.000Z

426

Bulk growth of GaSb and Ga{sub 1{minus}x}In{sub x}Sb  

DOE Green Energy (OSTI)

GaSb and InGaSb have been demonstrated to be suitable choices for high efficiency thermophotovoltaic (TPV) cells. Synthesis and growth of bulk GaSb single crystals and GaInSb polycrystals have been carried out by the vertical Bridgman technique, with a baffle immersed in the melt and by complete encapsulation of the melt by low melting temperature alkali halides or oxides. The critical roles of the baffle and the encapsulation are discussed. Efforts in obtaining device grade GaSb with superior structural and electrical properties and compositionally homogeneous GaInSb are described, emphasizing the key steps in the growth cycle developed to obtain good crystalline quality.

Dutta, P.S.; Ostrogorsky, A.G.; Gutmann, R.J.

1997-05-01T23:59:59.000Z

427

II4, Compositionally-Graded Layers Composed of Tandem InGaAs ...  

Science Conference Proceedings (OSTI)

The specification of the 6° miscut is important because it provides step ..... of Metamorphic InGaP on GaAs and GaP for Wide-Bandgap Photovoltaic Junctions.

428

Highly Polarized Green Light Emitting Diode in m-Axis GaInN/GaN Shi You, Theeradetch Detchprohm, Mingwei Zhu  

E-Print Network (OSTI)

Highly Polarized Green Light Emitting Diode in m-Axis GaInN/GaN Shi You, Theeradetch Detchprohm in nonpolar light-emitting diodes (LEDs) covering the blue to green spectral range. In photo- luminescence, m's overall power efficiency. Linearly polarized light can be efficiently generated in GaInN/GaN-based light-emitting

Wetzel, Christian M.

429

Effect of gas feeding methods on optical properties of GaN grown by rapid thermal chemical vapor deposition reactor  

Science Conference Proceedings (OSTI)

Keywords: Ga vacancies, GaN growth, gas feeding method, optical property, rapid thermal chemical vapor deposition (RTCVD), yellow luminescence

Sun Jung Kim; Young Hun Seo; Kee Suk Nahm; Yun Bong Hahn; Hyun Wook Shim; Eun-Kyung Suh; Kee Young Lim; Hyung Jae Lee

1999-08-01T23:59:59.000Z

430

Das Leben als Krankheit: Kafkas Ein Landarzt  

E-Print Network (OSTI)

Das Leben als Krankheit. Franz Kafkas Ein Landarzt Muhammedsei. Die menschliche Existenz als eine unheilbare Krankheit:Vorstellung vom Menschen als Be- herrscher seines Lebens.

Al-Azzawi, Muhammed

2011-01-01T23:59:59.000Z

431

Joint SSRTNet/ALS-MES Workshop report  

E-Print Network (OSTI)

conclusion of his SRRTNet/ALS-MES Workshop presentation inJoint SSRTNet/ALS-MES Workshop This joint workshop broughtthe Advanced Light Source (ALS) Users’ Association Annual

Shuh, David; Van Hove, Michel

2001-01-01T23:59:59.000Z

432

ALS Beamline Design Requirements - Revision 1  

E-Print Network (OSTI)

materials are not allowed in the ALS experiment area withoutlocations provided by the ALS. c. Cleaning proceduresa successful walkthrough, the ALS Director or designee gives

Heimann, Phil

2010-01-01T23:59:59.000Z

433

Promising Magnesium Battery Research at ALS  

NLE Websites -- All DOE Office Websites (Extended Search)

AdvancedLightSource Home Science Highlights Industry @ ALS Promising Magnesium Battery Research at ALS Promising Magnesium Battery Research at ALS Print Wednesday, 23...

434

Lipid Analysis and Lipidomics: New Techniques & ApplicationChapter 4 LC/MS and Chiral Separation  

Science Conference Proceedings (OSTI)

Lipid Analysis and Lipidomics: New Techniques & Application Chapter 4 LC/MS and Chiral Separation Methods and Analyses eChapters Methods - Analyses Books AOCS Press Downloadable pdf of Chapter 4 LC/MS and Chiral S

435

Lipid Analysis and Lipidomics: New Techniques & ApplicationChapter 5 LC/MS and Lipid Oxidation  

Science Conference Proceedings (OSTI)

Lipid Analysis and Lipidomics: New Techniques & Application Chapter 5 LC/MS and Lipid Oxidation Methods and Analyses eChapters Methods - Analyses Books Downloadable pdf of Chapter 5 LC/MS and Lipid Oxidation from

436

Sensitive Femtogram Determination of Aflatoxins B1, B2, G1, and G2 in Food Matrices using Tandem LC-MS/MS  

E-Print Network (OSTI)

(%) 0 95 5 5 0 100 6 0 100 MS conditions Drying gas temp: 325°C Sheath gas temp: 350°C Gas flow rate: 10 L/min Sheath gas flow: 11 L/min Nebulizer pressure: 50 psi EMV: 400 V Capillary voltage: 4000 V sample was then centrifuged at 14,000 x g for 3min prior to LC-MS/MS analysis. ·Each food matrix

Heller, Barbara

437

Functional Imprinting Structures on GaN-Based Light-Emitting ...  

Science Conference Proceedings (OSTI)

Keywords: GaN, light-emitting diode (LED), imprinting technology, far-field pattern modulation, light extraction. 1. Introduction. GaN-based light-emitting diodes ...

438

Multiconfiguration Dirac-Fock calculations on multi-valence-electron systems: Benchmarks on Ga-like ions  

Science Conference Proceedings (OSTI)

High-accuracy calculations of term energies and wavelengths of resonance lines in Ga-like ions have been performed as benchmarks in the request for accurate treatments of relativity, electron correction, and QED effects in multi-valence-electron systems. The calculated energy levels are in excellent agreement with the experimental results and the experimentally compiled energy values of the National Institute for Standards and Technology wherever available. The calculated values including core-valence correction are found to be in good agreement with other theoretical and experimental values for low- to medium-Z ions. On the basis of our calculations, some theoretical wavelengths for Ga-like Rb vii to Mo xii are also given. For higher-Z ions, computed wavelengths are compared well with the experimental results [E. Traebert, J. Clementson, P. Beiersdorfer, J. A. Santana, and Y. Ishikawa, Phys. Rev. A 82, 062519 (2010), I. N Draganicet al., J. Phys. B 44, 025001 (2011)].

Hu Feng [Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900 Sichuan (China); Institute of Atomic and Molecular Physics, Sichuan University, Chengdu, 610065 Sichuan (China); Yang Jiamin; Wang Chuanke; Jing Longfei; Chen Shubo [Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900 Sichuan (China); Jiang Gang; Liu Hao; Hao Lianghuan [Institute of Atomic and Molecular Physics, Sichuan University, Chengdu, 610065 Sichuan (China)

2011-10-15T23:59:59.000Z

439

ENVIRONMENT AL REVI  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

ENVIRONMENT ENVIRONMENT AL REVI EW for CATEG ORI CAL EXCLUS ION DETE RMINATION Rocky Mo unta in Region, Weste rn A rea Power Administra tion Stru cture Replace ment Fla min g Go rge-Vern a l No.3 138-kV tra nsmiss ion lin e (Struct ure No. 25/6) Spr ing 201 2 A. Ilricf J)cscription of Proposal: Western Area Power Adm inistration (Western) proposes to replace Structure No. 25/6 on the Flaming Gorge-Vernal No.3 138-kV transmission line. The structure is located on Bureau of Land Management lands in Uintah County. Utah (Township 3S, Range 22E, Section 7; Donkey Flat 7.5' USGS quadrangle). Work consists of removal and in-kind replacement of the wood H-frame structure and anchors utilizing rubber tired vehicles. crane, bucket truck, pole trucks/trailers, auger rig. and pick-up trucks. All work will be conducted on Western's existing

440

Intro Inlets & Sizing TOFMS Other MS LDI AMS CIMS Conc. 2012 AAAR Conference  

E-Print Network (OSTI)

Intro Inlets & Sizing TOFMS Other MS LDI AMS CIMS Conc. 2012 AAAR Conference Minneapolis, MN://cires.colorado.edu/jimenez/ams.html 1 Intro Inlets & Sizing TOFMS Other MS LDI AMS CIMS Conc. Outline 1. Building Blocks ­ Inlets (see references) 2 #12;Intro Inlets & Sizing TOFMS Other MS LDI AMS CIMS Conc. Why Aerosol Mass

Colorado at Boulder, University of

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


441

Delta M(s) in the MSSM with large tan beta  

E-Print Network (OSTI)

The Bs-Bsbar mixing parameter Delta Ms is studied in the MSSM with large tan beta. The recent Tevatron measurement of Delta Ms is used to constrain the MSSM parameter space. From this analysis the often neglected contribution to Delta Ms from the operator Q^SLL is found to be significant.

Parry, J K

2006-01-01T23:59:59.000Z

442

Teaching OR/MS to MBAs at Warwick Business School: A Turnaround Story  

Science Conference Proceedings (OSTI)

OR/MS is under pressure in MBA programs in the United Kingdom as it is in the United States. To ensure its continuance, members of the operational research group at Warwick Business School redesigned the core OR/MS module. The first attempt at a redesign ... Keywords: Professional: or/ms education.

Stewart Robinson; Maureen Meadows; John Mingers; Frances A. O'Brien; Estelle A. Shale; Stephanie Stray

2003-03-01T23:59:59.000Z

443

ALS Scientific Advisory Committee Charter  

NLE Websites -- All DOE Office Websites (Extended Search)

This document was revised and approved December 18, 2008. I. FUNCTION AND REPORTING The ALS Scientific Advisory Committee (SAC) is advisory to the Berkeley Lab Director through...

444

2012 ALS User Meeting Highlights  

NLE Websites -- All DOE Office Websites (Extended Search)

and notable science highlights, which communicated ALS advances in structural biology, battery research, and fundamental science. Falcone acknowledged the work of Simon Morton and...

445

Bonding and gap states at GaAs-oxide interfaces  

Science Conference Proceedings (OSTI)

The nature of bonding and possible causes of Fermi level pinning at high mobility-high dielectric constant oxide GaAs:HfO"2 interfaces are discussed. It is argued that these are atoms with defective bonding, rather than states due to the bulk semiconductor ... Keywords: GaAs, bonding, interface

John Robertson; Liang Lin

2011-04-01T23:59:59.000Z

446

Microsoft PowerPoint - Burke_et_al_poster_UTSR  

NLE Websites -- All DOE Office Websites (Extended Search)

Updated Kinetic-Transport Model Updated Kinetic-Transport Model  Reproduces previous validation targets of Mueller et al. [17] and Li et al. [5], including flow reactor speciation, ignition delays, and flame speeds, with reasonable agreement (though slightly reduced fidelity). Examples are shown in figures above. (References associated with experimental data shown can be found in [5]). 0 2 4 6 0 100 200 300 400 500 Equivalence ratio Flame speed (cm s -1 ) Experiments Updated Model Li et al. 0 0.05 0.1 0.15 0.2 0.25 0.3 0 0.2 0.4 0.6 0.8 1 Time (ms) Mole fraction (%) H2 O2 H2O Updated Model Li et al.  Shows significant improvements against high-pressure, low-flame- temperature data of [1-2].  Predicts flame speed targets of Refs. [1-2] and from [5] (spanning a wide range of equivalence ratios, pressures, diluents, and flame temperatures)

447

Elastic properties of Pu metal and Pu-Ga alloys  

Science Conference Proceedings (OSTI)

We present elastic properties, theoretical and experimental, of Pu metal and Pu-Ga ({delta}) alloys together with ab initio equilibrium equation-of-state for these systems. For the theoretical treatment we employ density-functional theory in conjunction with spin-orbit coupling and orbital polarization for the metal and coherent-potential approximation for the alloys. Pu and Pu-Ga alloys are also investigated experimentally using resonant ultrasound spectroscopy. We show that orbital correlations become more important proceeding from {alpha} {yields} {beta} {yields} {gamma} plutonium, thus suggesting increasing f-electron correlation (localization). For the {delta}-Pu-Ga alloys we find a softening with larger Ga content, i.e., atomic volume, bulk modulus, and elastic constants, suggest a weakened chemical bonding with addition of Ga. Our measurements confirm qualitatively the theory but uncertainties remain when comparing the model with experiments.

Soderlind, P; Landa, A; Klepeis, J E; Suzuki, Y; Migliori, A

2010-01-05T23:59:59.000Z

448

Lasing characteristics of GaSb/GaAs self-assembled quantum dots embedded in an InGaAs quantum well  

E-Print Network (OSTI)

be applicable to light sources in fiber-optic communication systems.13 However, there have been no reports intriguing optoelectronic device possibilities on GaAs substrates including lasers, detectors, or solar cells

Jalali. Bahram

449

Near ultraviolet emission from nonpolar cubic AlxGa1-xN/GaN quantum wells  

E-Print Network (OSTI)

Near ultraviolet emission from nonpolar cubic AlxGa1-xN/GaN quantum wells J. Schörmann,a S and multiple quantum wells. The well widths ranged from 2.5 to 7.5 nm. Samples were grown by rf-plasma assisted wells clear reflection high energy electron diffraction oscillations were observed indicating a two

As, Donat Josef

450

Development of high power green light emitting diode dies in piezoelectric GaInN/GaN  

E-Print Network (OSTI)

Development of high power green light emitting diode dies in piezoelectric GaInN/GaN Christian in green light emitting diodes is one of the big challenges towards all-solid- state lighting. The prime,3], and commercialization [4,5] of high brightness light emitting diodes LEDs has led to a 1.82 Billion-$/year world market

Detchprohm, Theeradetch

451

Wavelength-resolved low-frequency noise of GaInN/GaN green light emitting diodes  

E-Print Network (OSTI)

Wavelength-resolved low-frequency noise of GaInN/GaN green light emitting diodes S. L. Rumyantseva well light emitting diodes. The light intensity noise was measured as a function of wavelength within the light emitting diode spectral emission line. The spectral noise density is found to increase

Wetzel, Christian M.

452

Hidrofobiškumo ?taka dažikli? sorbcijai vilnos pluošte ir dažini? fizikin?ms savyb?ms.  

E-Print Network (OSTI)

??Baigiamojo darbo tikslas – ištirti vilnos pluošto paviršiaus hidrofobiškumo ?tak? dažikli? sorbcijai vilnos pluošte ir dažini? fizikin?ms savyb?ms. Nauj? antrachinonini? dažikli? RB 5-37 M?lynojo ir… (more)

Gr?bli?nait?,; Egl?

2011-01-01T23:59:59.000Z

453

Genizah MS T-S AS 147.62  

E-Print Network (OSTI)

*k T-S AS 147.62 *t Letter *s 6 x 17.6; 5 lines + marginalia (recto); 6 lines + marginalia (verso) *m Paper; 1 leaf; torn, holes, rubbed, stained *l Judaeo-Arabic *c Business letter mentioning Qaly?b, 'the Sicilian Kohen' and Ibn al-Mašš???. *e...

Unknown

2011-02-24T23:59:59.000Z

454

Genizah MS T-S AS 153.117  

E-Print Network (OSTI)

*k T-S AS 153.117 * Accounts *s 6.4 x 17 (8.7 one leaf); 1-2 lines *m Paper; 2 leaves (bifolium); torn *l Judaeo-Arabic *c Pages from an account book (numbered 17-20), mentioning the names Bar ?edaqa ha-Levi, Mu?ammad al-?az?w?, Abraham Šalom...

Unknown

2011-02-24T23:59:59.000Z

455

Genizah MS T-S AS 151.216  

E-Print Network (OSTI)

*k T-S AS 151.216 *t Accounts; unidentified *s 16.9 x 12.5; 16 lines (recto); 9 lines (verso) *m Paper; 1 leaf; torn, holes, faded, stained *l Judaeo-Arabic; Hebrew (sporadic Tiberian vocalisation) *c Recto: accounts, mentioning Ibn al...

Unknown

2011-02-24T23:59:59.000Z

456

Genizah MS T-S AS 141.9  

E-Print Network (OSTI)

*k T-S AS 141.9 *t Grammar *s 7.2 x 7.3; 11 lines (recto); 10 lines (verso) *m Paper; 1 leaf; badly torn, holes, rubbed, faded, stained *l Judaeo-Arabic; Hebrew *c Ibn Jan??, Kit?b al-U??l ('The Book of Hebrew Roots') (Neubauer (ed.) (1875): 524:9–26)...

Unknown

2011-02-25T23:59:59.000Z

457

Genizah MS T-S AS 151.21  

E-Print Network (OSTI)

*k T-S AS 151.21 *t Letter *s 9.7 x 11.6; 7 lines (recto; verso is blank) *m Paper; 1 leaf; torn, holes, slightly rubbed *l Judaeo-Arabic; Hebrew *c Letter or note, mentioning the arrival of the addressee in al-Ma?r?sa Damascus. *e...

Unknown

2011-02-24T23:59:59.000Z

458

Genizah MS T-S AS 140.6D  

E-Print Network (OSTI)

*k T-S AS 140.6D *t Grammar *s 6.2 x 3.7; 4 lines (recto); 3 lines (verso) *m Paper; 1 leaf; badly torn, holes, rubbed, stained *l Judaeo-Arabic *c Ibn Jan??, Kit?b al-U??l ('The Book of Hebrew Roots') (Neubauer (ed.) (1875): 687:11–12; 22–24) *e...

Unknown

2011-02-24T23:59:59.000Z

459

Genizah MS T-S AS 140.7B  

E-Print Network (OSTI)

*k T-S AS 140.7B *t Grammar *s 22.8 x 11.8; 20 lines + marginalia *m Paper; 1 leaf; torn, many holes, rubbed, faded, stained *l Judaeo-Arabic; Hebrew *c Ibn Jan??, Kit?b al-U??l ('The Book of Hebrew Roots') (Neubauer (ed.) (1875): 407...

Unknown

2011-02-24T23:59:59.000Z

460

Catalytic Effect of Ti for Hydrogen Cycling in NaAlH4  

NLE Websites -- All DOE Office Websites (Extended Search)

Effect of Ti for Effect of Ti for Hydrogen Cycling in NaAlH 4 Mei-Yin Chou School of Physics Georgia Institute of Technology (DE-FG02-05ER46229) Acknowledgment: Yan Wang, Roland Stumpf Why is NaAlH 4 interesting? A viable candidate for hydrogen-storage material: High theoretical weight-percent hydrogen content of 5.55% and low cost But (before 1997) Dehydrogenation occurs at high temperature; rehydrogenation is difficult. Bogdanovic and Schwickardi, 1997 Hydrogen can be reversibly absorbed and desorbed from NaAlH 4 under moderate conditions by the addition of catalysts (compounds containing Ti, Zr, etc.) High Hydrogen Contents in Complex Hydrides Hydride wt% Hydride wt% Be(BH 4 ) 2 20.8 Mg(AlH 4 ) 2 9.3 LiBH 4 18.2 Ca(AlH 4 ) 2 7.9 Mg(BH 4 ) 2 14.9 KBH 4 7.5 Ca(BH 4 ) 2 11.6 NaAlH 4 7.5 NaBH4 10.7 Ga(AlH

Note: This page contains sample records for the topic "ms al ga" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


461

Structural and optical studies of nitrogen incorporation into GaSb-based GaInSb quantum wells  

Science Conference Proceedings (OSTI)

We investigate the incorporation of nitrogen into (Ga,In)Sb grown on GaSb and report room temperature photoluminescence from GaInSb(N) quantum wells. X-ray diffraction and channeling nuclear reaction analysis, together with Rutherford backscattering, were employed to identify the optimal molecular beam epitaxial growth conditions that minimized the incorporation of non-substitutional nitrogen into GaNSb. Consistent with this hypothesis, GaInSb(N) quantum wells grown under the conditions that minimized non-substitutional nitrogen exhibited room temperature photoluminescence, indicative of significantly improved radiative efficiency. Further development of this material system could enable type-I laser diodes emitting throughout the (3-5 {mu}m) wavelength range.

Nair, Hari P.; Crook, Adam M.; Bank, Seth R. [Microelectronics Research Center, Electrical and Computer Engineering, University of Texas at Austin, 10100 Burnet Rd, Austin, Texas 78712 (United States); Yu, Kin M. [Electronic Materials Program, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)

2012-01-09T23:59:59.000Z

462

GaSb/GaAs quantum dot formation and demolition studied with cross-sectional scanning tunneling microscopy  

Science Conference Proceedings (OSTI)

We present a cross-sectional scanning tunneling microscopy study of GaSb/GaAs quantum dots grown by molecular beam epitaxy. Various nanostructures are observed as a function of the growth parameters. During growth, relaxation of the high local strain fields of the nanostructures plays an important role in their formation. Pyramidal dots with a high Sb content are often accompanied by threading dislocations above them. GaSb ring formation is favored by the use of a thin GaAs first cap layer and a high growth temperature of the second cap layer. At these capping conditions, strain-driven Sb diffusion combined with As/Sb exchange and Sb segregation remove the center of a nanostructure, creating a ring. Clusters of GaSb without a well defined morphology also appear regularly, often with a highly inhomogeneous structure which is sometimes divided up in fragments.

Smakman, E. P.; Garleff, J. K.; Rambabu, P.; Koenraad, P. M. [Department of Applied Physics, Eindhoven University of Technology, Eindhoven 5612 AZ (Netherlands); Young, R. J.; Hayne, M. [Department of Physics, Lancaster University, Lancaster LA1 4YB (United Kingdom)

2012-04-02T23:59:59.000Z

463

VIA EMAIL Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

September 13, 2011 September 13, 2011 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room62023 Washington, DC 20460 Dear Ms. Jones: On July 18,2011, the United States Department of Energy (DOE) notified Whirlpool Corporation (Whirlpool) that DOE had completed testing of the Whirlpool (KitchenAid brand) refrigerator model KSRG25FVMS* under the ENERGY STAR Verification Testing Pilot Program and confirmed that the model did not meet the ENERGY STAR energy efficiency requirement for maximum permitted annual energy usage. DOE gave Whirlpool until Augnst 8, 2011, to provide conclusive manufacturing or design evidence or quality assurance information rebutting DOE testing, which showed that this product did not meet the ENERGY STAR Program's energy efficiency requirement.

464

VIA EMAIL Ms. Mariah Steele ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

August 29, 2012 August 29, 2012 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room 62023 Washington, DC 20460 Dear Ms. Steele: The U.S. Department of Energy ("DOE") selected a General Electric Company ("GE") refrigerator-freezer, basic model PFSFSNFZ****, for testing as part of DOE's ENERGY STAR® Verification Testing Program. On April6, 2012, DOE notified GE that the model did not meet the ENERGY STAR energy efficiency requirement for maximum permitted annual energy usage. DOE gave GE until April27, 2012, to respond. GE replied to DOE via email on April20, 2012. GE argued that DOE did not test in accordance with the relevant DOE test procedure. In addition, GE noted that it had confirmed the validity of the energy testing that formed the basis of GE's certification and product labeling.

465

VIA EMAIL Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

December 22, 2011 December 22, 2011 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room 62023 Washington, DC 20460 Dear Ms. Jones: On November 1, 2011, the United States Depmiment of Energy ("DOE") notified Grainger Global Sourcing ("Grainger") that DOE had completed testing of the Dayton-brand refrigerator- freezer model 5NTX1 under the ENERGY STAR® Verification Testing Pilot Program and explained that the model did not meet the ENERGY STAR energy efficiency requirement for maximum permitted annual energy usage. DOE gave Grainger until November 20, 2011, to provide conclusive manufacturing or design evidence or quality assurance information rebutting DOE's test results. Grainger responded to DOE via email, submitting various documents, on November 18, 2011.

466

VIA EMAIL Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

October 28, 2011 October 28, 2011 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue NW Room 62023 Washington, DC 20460 Dear Ms. Jones: The Summit Appliance Division chest freezer model CFllES, manufactured by Midea, was selected for testing as part of the U.S. Department of Energy's (DOE) ENERGY STAR® Verification Testing Pilot Program. DOE's initial testing, performed on a unit of this model, indicated that it may not meet ENERGY STAR requirements. DOE notified Summit of the initial test results, and Summit voluntarily withdrew its model from ENERGY STAR without additional testing. DOE also notified Midea, as Midea manufactures the same basic model for distribution under a variety of other brand names and model numbers, including Midea HS-390C. Midea requested that DOE

467

VIA EMAIL Ms. Mariah Steele ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

June 20, 2013 June 20, 2013 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room 62023 Washington, DC 20460 Dear Ms. Steele: The U.S. Department of Energy ("DOE") selected a Summit-brand refrigerator-freezer, model Fl 112BL, manufactured by SANYO E&E (now Panasonic Appliances Refrigeration Systems Corporation of America ("P APRSA")) and sold by Felix Storch, Inc. ("Storch"), for testing as part ofDOE's ENERGY STAR® Verification Testing Program. On March 18, 2013, DOE notified Storch that the model did not meet the ENERGY STAR specification for maximum permitted annual energy use. PAPRSA replied to DOE on April 1, 2013, making two claims. First, PAPRSA argued that DOE's test laboratory, an Intertek laboratory located in Plano, Texas ("Intertek"), did not test in

468

VIA EMAIL Ms. Mariah Steele ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Program Program · U.S. Envirorunental Protection Agency . 1200 Peru1sylvania Avenue, NW Room 62023 · Washington, DC 20460 Dear Ms. Steele: June 7, 2013 The .U.S. Department of Energy ("DOE") selected an Edgestal'-brand dehumidifier, model DEP400EW, for.testing as part ofDOE's ENERGY STAR®Verification Testing Program. On· . October 24, 2012, DOE notified the manufacturer of this modd, , that the model did not meet the minimum energy factor required. for a model of its capacity according to the applicab~e ENERGY STAR specific~tion. · - replied to DOE representatives and raised two- concerns with the DOE testing.' DOE has considered these. concems and found that they did not impact the. validity of DOE's test results.

469

PNM Resources 2401 Aztec NE, MS-Z100  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

PNM Resources PNM Resources 2401 Aztec NE, MS-Z100 Albuquerque, NM 87107 505-241-2025 Fax 505 241-2384 PNMResources.com October 29, 2013 Mr. Christopher Lawrence Office of Electricity Delivery and Energy Reliability (OE-20) U.S. Department of Energy 1000 Independence Avenue, SW Washington, DC 20585 Submitted electronically via email to: Christopher.Lawrence@hq.doe.gov Dear Mr. Lawrence: Subject: Department of Energy (DOE)- Improving Performance of Federal Permitting and Review of Infrastructure Projects, Request for Information, 78 Fed. Reg. 53436 (Aug. 29, 2013) PNM Resources (PNMR) is an energy holding company with 2012 consolidated operating revenues of $1.3 billion. Through its regulated utilities, PNM and TNMP, PNMR serves electricity to more than 739,000 homes and businesses in New

470

VIA EMAIL Ms. Leslie Jones ENERGY STAR Program  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

May 22,2012 May 22,2012 U.S. Environmental Protection Agency 1200 Pennsylvania Avenue, NW Room62023 Washington, DC 20460 Dear Ms. Jones: The U.S. Department of Energy ("DOE") selected an Avanti Products ("Avanti") refrigerator, basic model BCA4560W-2 ("model BCA4560W-2"), for testing as patt of the DOE's ENERGY STAR® Verification Testing Program. On April 6, 2012, DOE notified Avanti that the model did not meet the ENERGY STAR energy efficiency requirement for maximum permitted annual energy usage. DOE gave Avanti until April27, 2012, to respond. Avanti responded to DOE via email, submitting various documents, on April27, 2012. Avanti explained that it had randomly selected units of model BCA4560W -2 for testing at third-party

471

Ms. Julie Smith Office of Electricity Delivery and Energy Reliability  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

5, 2013 5, 2013 Ms. Julie Smith Office of Electricity Delivery and Energy Reliability Mail Code OE-20 U.S. Department of Energy 1000 Independence Avenue Washington, D.C. 20585 Juliea.smith@hq.doe.gov; Christopher.lawrence@hq.doe.gov Re: DOE RFI "Improving Performance of Federal Permitting and Review of Infrastructure Projects The American people support increased production and consumption of renewable energy according to credible public opinion polls. Too often the most appropriate sites for wind, solar, hydro, and other renewable generators are in rural areas that necessitate the construction of new high voltage transmission lines to deliver the energy to customer load centers. Siting such lines is a costly multi-year

472

Effect of Sb on the Properties of GaInP Top Cells (Presentation)  

DOE Green Energy (OSTI)

The summary of this report is that: (1) Sb can be used to increase V{sub oc} of a GaInP top cell; (2) the photovoltaic quality of GaInP is relatively unaffected by the presence of Sb; and (3) Sb-doped GaInP/GaAs tandem cells show promise for achieving efficiencies over 32%.

Olson, J. M.; McMahon, W. E.; Kurtz, S.

2006-05-01T23:59:59.000Z

473

STEPS: A Grid Search Methodology for Optimized Peptide Identification Filtering of MS/MS Database Search Results  

Science Conference Proceedings (OSTI)

For bottom-up proteomics there are a wide variety of database searching algorithms in use for matching peptide sequences to tandem MS spectra. Likewise, there are numerous strategies being employed to produce a confident list of peptide identifications from the different search algorithm outputs. Here we introduce a grid search approach for determining optimal database filtering criteria in shotgun proteomics data analyses that is easily adaptable to any search. Systematic Trial and Error Parameter Selection - referred to as STEPS - utilizes user-defined parameter ranges to test a wide array of parameter combinations to arrive at an optimal "parameter set" for data filtering, thus maximizing confident identifications. The benefits of this approach in terms of numbers of true positive identifications are demonstrated using datasets derived from immunoaffinity-depleted blood serum and a bacterial cell lysate, two common proteomics sample types.

Piehowski, Paul D.; Petyuk, Vladislav A.; Sandoval, John D.; Burnum, Kristin E.; Kiebel, Gary R.; Monroe, Matthew E.; Anderson, Gordon A.; Camp, David G.; Smith, Richard D.

2013-03-01T23:59:59.000Z

474

Soham Al Snih Al Snih, MD., PhD. Curriculum Vitae CURRICULUM VITAE  

E-Print Network (OSTI)

Soham Al Snih Al Snih, MD., PhD. Curriculum Vitae 1 CURRICULUM VITAE NAME: Soham Al Snih Al Snih, M at the Sealy Center on Aging, University of Texas Medical Branch, Galveston, TX. #12;Soham Al Snih Al Snih, MD arthritis. B. Grant Support Current Grant Support: 1R03 AG029959-01A2 (Al Snih ­PI) Period: 06

Wood, James B.

475

Atomic hydrogen cleaning of polarized GaAs photocathodes  

DOE Green Energy (OSTI)

Atomic hydrogen cleaning followed by heat cleaning at 450 C was used to prepare negative-electron-affinity GaAs photocathodes. When hydrogen ions were eliminated, quantum efficiencies of 15% were obtained for bulk GaAs cathodes, higher than the results obtained using conventional 600 C heat cleaning. The low-temperature cleaning technique was successfully applied to thin, strained GaAs cathodes used for producing highly polarized electrons. No depolarization was observed even when the optimum cleaning time of about 30 seconds was extended by a factor of 100.

Maruyama, Takashi

2003-04-03T23:59:59.000Z

476

AL PRO | Open Energy Information  

Open Energy Info (EERE)

AL PRO AL PRO Jump to: navigation, search Name AL-PRO Place Grossheide, Lower Saxony, Germany Zip 26532 Sector Wind energy Product AL-PRO is an inndependent expert office for wind forecasts, wind potential studies, turbulence inquiries, visualizations as well as sound and shade throw forecasts Coordinates 53.592743°, 7.34313° Loading map... {"minzoom":false,"mappingservice":"googlemaps3","type":"ROADMAP","zoom":14,"types":["ROADMAP","SATELLITE","HYBRID","TERRAIN"],"geoservice":"google","maxzoom":false,"width":"600px","height":"350px","centre":false,"title":"","label":"","icon":"","visitedicon":"","lines":[],"polygons":[],"circles":[],"rectangles":[],"copycoords":false,"static":false,"wmsoverlay":"","layers":[],"controls":["pan","zoom","type","scale","streetview"],"zoomstyle":"DEFAULT","typestyle":"DEFAULT","autoinfowindows":false,"kml":[],"gkml":[],"fusiontables":[],"resizable":false,"tilt":0,"kmlrezoom":false,"poi":true,"imageoverlays":[],"markercluster":false,"searchmarkers":"","locations":[{"text":"","title":"","link":null,"lat":53.592743,"lon":7.34313,"alt":0,"address":"","icon":"","group":"","inlineLabel":"","visitedicon":""}]}

477

Outdoor Testing of GaInP2/GaAs Tandem Cells with Top Cell Thickness Varied  

DOE Green Energy (OSTI)

In this study, we measure the performance of GaInP2/GaAs tandem cells under direct beam sunlight outdoors in order to quantify their sensitivity to both spectral variation and GaInP2 top-cell thickness. A set of cells with five different top-cell thicknesses was mounted on a two-axis tracker with the incident sunlight collimated to exclude all except the direct beam. Current-voltage (I-V) curves were taken throughout the course of several days, along with measurements of the direct solar spectrum. Our two major conclusions are: (1) GaInP2/GaAs tandem cells designed for either the ASTM G-173 direct (G-173D) spectrum or the "air mass 1.5 global" (AM1.5G) spectrum perform the best, and (2) cells can be characterized indoors and modeled using outdoor spectra with the same result. These results are equally valid for GaInP2/GaAs/Ge triple-junction cells.

McMahon, W. E.; Emergy, K. E.; Friedman, D. J.; Ottoson, L.; Young, M. S.; Ward, J. S.; Kramer, C. M.; Duda, A.; Kurtz, S.

2005-08-01T23:59:59.000Z

478

On-Sun Comparison of GaInP2/GaAs Tandem Cells with Top Cell Thickness Varied  

DOE Green Energy (OSTI)

This study compares the on-sun performance of a set of GaInP2/GaAs tandem cells with different GaInP2 top-cell thicknesses. Because high-efficiency III-V cells are best suited to concentrating photovoltaic (CPV) applications, the cells were mounted on a two-axis tracker with the incident sunlight collimated to exclude all except the direct beam. Current-voltage (I-V) curves were taken throughout the course of several days, along with measurements of the direct solar spectrum. Our two major conclusions are: (1) GaInP2/GaAs tandem cells designed for an ''air mass 1.5 global'' (AM 1.5G) or a ''low aerosol optical depth'' (Low AOD) spectrum perform the best, and (2) cells can be characterized indoors and modeled using outdoor spectra to predict the correct result. These results are equally valid for GaInP2/GaAs/Ge triple-junction cells.

McMahon, W. E.; Emery, K. E.; Friedman, D. J.; Ottoson, L.; Young, M. S.; Ward, J. S.; Kramer, C. M.; Duda, A.; Kurtz, S.

2005-02-01T23:59:59.000Z

479

Realization of high-quality HfO{sub 2} on In{sub 0.53}Ga{sub 0.47}As by in-situ atomic-layer-deposition  

Science Conference Proceedings (OSTI)

High {kappa} dielectric of HfAlO/HfO{sub 2} was an in-situ atomic-layer-deposited directly on molecular beam epitaxy grown In{sub 0.53}Ga{sub 0.47}As surface without using pre-treatments or interfacial passivation layers, where HfAlO (HfO{sub 2}:Al{sub 2}O{sub 3} {approx} 4:1) with high re-crystallization temperature was employed as the top oxide layer. The HfAlO ({approx}4.5 nm)/HfO{sub 2} (0.8 nm)/In{sub 0.53}Ga{sub 0.47}As metal oxide semiconductor capacitors have exhibited an oxide/In{sub 0.53}Ga{sub 0.47}As interface free of arsenic-related defective bonding, thermodynamic stability at 800 deg. C, and low leakage current densities of oxide thickness of less than 1 nm has been achieved by reducing the HfAlO thickness to {approx}2.7 nm with the same initial HfO{sub 2} thickness of {approx}0.8 nm.

Lin, T. D.; Hong, M. [Graduate Institute of Applied Physics and Department of Physics, National Taiwan University, Taipei 10617, Taiwan (China); Chang, Y. H. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Lin, C. A.; Huang, M. L.; Lee, W. C. [Department of Physics, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Kwo, J. [Department of Physics, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Center for Condensed Matter Sciences, National Taiwan University, Taipei 10617, Taiwan (China)

2012-04-23T23:59:59.000Z

480

Influence of the adatom diffusion on selective growth of GaN nanowire regular arrays  

Science Conference Proceedings (OSTI)

Molecular beam epitaxy (MBE) on patterned Si/AlN/Si(111) substrates was used to obtain regular arrays of uniform-size GaN nanowires (NWs). The silicon top layer has been patterned with e-beam lithography, resulting in uniform arrays of holes with different diameters (d{sub h}) and periods (P). While the NW length is almost insensitive to the array parameters, the diameter increases significantly with d{sub h} and P till it saturates at P values higher than 800 nm. A diffusion induced model was used to explain the experimental results with an effective diffusion length of the adatoms on the Si, estimated to be about 400 nm.

Gotschke, T.; Schumann, T.; Limbach, F.; Calarco, R. [Institute of Bio- and Nanosystems (IBN-1), Research Centre Juelich GmbH and JARA-Fundamentals of Future Information Technology (FIT), 52425 Juelich (Germany); Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany); Stoica, T. [Institute of Bio- and Nanosystems (IBN-1), Research Centre Juelich GmbH and JARA-Fundamentals of Future Information Technology (FIT), 52425 Juelich (Germany)

2011-03-07T23:59:59.000Z

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481

FUPWG Meeting Agenda - Atlanta, GA | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Atlanta, GA Atlanta, GA FUPWG Meeting Agenda - Atlanta, GA October 7, 2013 - 3:16pm Addthis Energy on My Mind / FUPWG / Atlanta, GA / May 3-4, 2006 Hosted by: AGL Resources Logo May 3-4, 2006 Hosted by AGL Resources Atlanta, Georgia Tuesday, May 2, 2006 5:00 - 6:30 Steering Committee meeting in the Danube Tigris Room 6:30 until... Networking dinner at the Marriott Wednesday, May 3, 2006 7:45 am Registration/Continental Breakfast 8:30 - 8:45 Welcome from Suzanne Sitherwood, SVP, Southern Operations, President, Atlanta Gas Light, Chattanooga Gas & Florida City Gas 8:45 - 9:00 FEMP Southeast Regional Office Welcome Traci Leath, FEMP 9:00 - 9:45 Washington Update David McAndrew, FEMP 9:45 - 10:15 Break - Networking 10:15 - 11:20 Navy Technical Program Update Paul Kistler, U.S. Navy

482

Elba Island, GA Liquefied Natural Gas Imports from Qatar (Million...  

U.S. Energy Information Administration (EIA) Indexed Site

Liquefied Natural Gas Imports from Qatar (Million Cubic Feet) Elba Island, GA Liquefied Natural Gas Imports from Qatar (Million Cubic Feet) Year Jan Feb Mar Apr May Jun Jul Aug Sep...

483

Lattice vibrations of pure and doped GaSe  

Science Conference Proceedings (OSTI)

The Bridgman method is used to grow especially undoped and doped single crystals of GaSe. Composition and impurity content of the grown crystals were determined using X-ray fluorescence (XRF) method. X-ray diffraction, Raman scattering, photoluminescence (PL), and IR transmission measurements were performed at room temperature. The long wavelength lattice vibrations of four modifications of GaSe were described in the framework of modified one-layer linear-chain model which also takes into consideration the interaction of the selenium (Se) atom with the second nearest neighbor gallium (Ga) atom in the same layer. The existence of an eight-layer modification of GaSe is suggested and the vibrational frequencies of this modification are explained in the framework of a lattice dynamical model considered in the present work. Frequencies and the type of vibrations (gap, local, or resonance) for the impurity atoms were calculated and compared with the experimental results.

Allakhverdiev, K. [Materials Institute, Marmara Research Center, TUBITAK, Gebze/Kocaeli 41470 (Turkey) and Institute of Physics, Azerbaijan National Academy of Sciences, Baku AZ1143 (Azerbaijan)]. E-mail: kerim.allahverdi@mam.gov.tr; Baykara, T. [Materials Institute, Marmara Research Center, TUBITAK, Gebze/Kocaeli 41470 (Turkey); Ellialtioglu, S. [Department of Physics, Middle East Technical University, Ankara 06531 (Turkey); Hashimzade, F. [Institute of Physics, Azerbaijan National Academy of Sciences, Baku AZ1143 (Azerbaijan); Huseinova, D. [Institute of Physics, Azerbaijan National Academy of Sciences, Baku AZ1143 (Azerbaijan); Kawamura, K. [Institute of Materials Science, University of Tsukuba 305-8573 (Japan); Kaya, A.A. [Materials Institute, Marmara Research Center, TUBITAK, Gebze/Kocaeli 41470 (Turkey); Kulibekov, A.M. [Department of Physics, Mugla University, Mugla 48000 (Turkey); Onari, S. [Institute of Materials Science, University of Tsukuba 305-8573 (Japan)

2006-04-13T23:59:59.000Z

484

HH5, Antiferromagnetic Interlayer Exchange Couplings in Ga  

Science Conference Proceedings (OSTI)

Author(s), Sun Jae Chung, Sanghoon Lee, Brian J. Kirby, Julie A. Borchers, ... LATE NEWS: KK3, Non-Catalytic Synthesis of GaN Nanostructures at Low ...

485

Preparation of GaAs photocathodes at low temperature  

SciTech Connect

The preparation of an atomically clean surface is a necessary step in the formation of negative electron affinity (NEA) GaAs. Traditional methods to this end include cleaving, heat cleaning and epitaxial growth. Cleaving has the advantage of yielding a fresh surface after each cleave, but is limited to small areas and is not suitable for specialized structures. Heat cleaning is both simple and highly successful, so it is used as a preparation method in virtually all laboratories employing a NEA source on a regular basis. Due to its high cost and complexity, epitaxial growth of GaAs with subsequent in vacuo transfer is not a practical solution for most end users of GaAs as a NEA electron source. While simple, the heating cleaning process has a number of disadvantages. Here, a variety of cleaning techniques related to preparation of an atomically clean GaAs surface without heating to 600 C are discussed and evaluated.

Mulhollan, G.; Clendenin, J.; Tang, H.

1996-10-01T23:59:59.000Z

486

Elba Island, GA Natural Gas Liquefied Natural Gas Imports from...  

Gasoline and Diesel Fuel Update (EIA)

Trinidad and Tobago (Million Cubic Feet) Elba Island, GA Natural Gas Liquefied Natural Gas Imports from Trinidad and Tobago (Million Cubic Feet) Year Jan Feb Mar Apr May Jun Jul...

487

Elba Island, GA Natural Gas Liquefied Natural Gas Imports from...  

Gasoline and Diesel Fuel Update (EIA)

Egypt (Million Cubic Feet) Elba Island, GA Natural Gas Liquefied Natural Gas Imports from Egypt (Million Cubic Feet) Year Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec 2011 5,780...

488

Elba Island, GA Liquefied Natural Gas Total Imports (Million...  

U.S. Energy Information Administration (EIA) Indexed Site

Liquefied Natural Gas Total Imports (Million Cubic Feet) Elba Island, GA Liquefied Natural Gas Total Imports (Million Cubic Feet) Decade Year-0 Year-1 Year-2 Year-3 Year-4 Year-5...

489