Sample records for metalorganic chemical vapor

  1. X-ray diffraction analysis of InGaP/GaAs heterointerfaces grown by metalorganic chemical vapor deposition

    SciTech Connect (OSTI)

    Nittono, T.; Hyuga, F. [NTT System Electronics Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243-01 (Japan)] [NTT System Electronics Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243-01 (Japan)

    1997-03-01T23:59:59.000Z

    InGaP/GaAs heterointerfaces grown by metalorganic chemical vapor deposition have been characterized by a high-resolution x-ray diffraction analysis of multiple quantum well structures. The flow of AsH{sub 3} to InGaP surface produces an InGaAs-like interfacial layer at the GaAs-on-InGaP interface, indicating P atoms of the InGaP surface are easily replaced by As atoms. The flow of PH{sub 3} to GaAs surface, on the other hand, does not make any detectable interfacial layer, indicating that almost no As atoms of the GaAs surface are replaced by P atoms. It is also found that the flow of trimethylgallium (TMG) to the InGaP surface produces a GaP-like interfacial layer. This interfacial layer is probably formed by the reaction between TMG and excessive P atoms on the InGaP surface or residual PH{sub 3} in the growth chamber. {copyright} {ital 1997 American Institute of Physics.}

  2. Elemental diffusion during the droplet epitaxy growth of In(Ga)As/GaAs(001) quantum dots by metal-organic chemical vapor deposition

    SciTech Connect (OSTI)

    Chen, Z. B.; Chen, B.; Wang, Y. B.; Liao, X. Z., E-mail: xiaozhou.liao@sydney.edu.au [School of Aerospace, Mechanical and Mechatronic Engineering, The University of Sydney, Sydney, NSW 2006 (Australia); Lei, W. [School of Electrical, Electronic and Computer Engineering, The University of Western Australia, Perth, WA 6009 (Australia); Tan, H. H.; Jagadish, C. [Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200 (Australia); Zou, J. [Materials Engineering and Centre for Microscopy and Microanalysis, The University of Queensland, Brisbane, QLD 4072 (Australia); Ringer, S. P. [School of Aerospace, Mechanical and Mechatronic Engineering, The University of Sydney, Sydney, NSW 2006 (Australia); Australian Centre for Microscopy and Microanalysis, The University of Sydney, Sydney, NSW 2006 (Australia)

    2014-01-13T23:59:59.000Z

    Droplet epitaxy is an important method to produce epitaxial semiconductor quantum dots (QDs). Droplet epitaxy of III-V QDs comprises group III elemental droplet deposition and the droplet crystallization through the introduction of group V elements. Here, we report that, in the droplet epitaxy of InAs/GaAs(001) QDs using metal-organic chemical vapor deposition, significant elemental diffusion from the substrate to In droplets occurs, resulting in the formation of In(Ga)As crystals, before As flux is provided. The supply of As flux suppresses the further elemental diffusion from the substrate and promotes surface migration, leading to large island formation with a low island density.

  3. Influence of vicinal sapphire substrate on the properties of N-polar GaN films grown by metal-organic chemical vapor deposition

    SciTech Connect (OSTI)

    Lin, Zhiyu; Zhang, Jincheng, E-mail: jchzhang@xidian.edu.cn; Xu, Shengrui; Chen, Zhibin; Yang, Shuangyong; Tian, Kun; Hao, Yue [Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071 (China); Su, Xujun [Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123 (China); Shi, Xuefang [School of Advanced Materials and Nanotechnology, Xidian University, Xi'an, Shaanxi 710071 (China)

    2014-08-25T23:59:59.000Z

    The influence of vicinal sapphire substrates on the growth of N-polar GaN films by metal-organic chemical vapor deposition is investigated. Smooth GaN films without hexagonal surface feature are obtained on vicinal substrate. Transmission electron microscope results reveal that basal-plane stacking faults are formed in GaN on vicinal substrate, leading to a reduction in threading dislocation density. Furthermore, it has been found that there is a weaker yellow luminescence in GaN on vicinal substrate than that on (0001) substrate, which might be explained by the different trends of the carbon impurity incorporation.

  4. Red emission from Eu-doped GaN luminescent films grown by metalorganic chemical vapor deposition

    E-Print Network [OSTI]

    Steckl, Andrew J.

    chemical vapor deposition on GaN/Al2O3 substrates. Trimethylgallium TMGa , ammonia (NH3), and europium 2 europium doping was performed utilizing a europium beta-diketonate, eu- ropium 2,2,4,4-tetramethyl-3

  5. Inversion by metalorganic chemical vapor deposition from N- to Ga-polar gallium nitride and its application to multiple quantum well light-emitting diodes

    SciTech Connect (OSTI)

    Hosalli, A. M.; Van Den Broeck, D. M.; Bedair, S. M. [Department of Electrical and Computer Engineering, NCSU, Raleigh, North Carolina 27695 (United States)] [Department of Electrical and Computer Engineering, NCSU, Raleigh, North Carolina 27695 (United States); Bharrat, D.; El-Masry, N. A. [Department of Material Science and Engineering, NCSU, Raleigh, North Carolina 27695 (United States)] [Department of Material Science and Engineering, NCSU, Raleigh, North Carolina 27695 (United States)

    2013-12-02T23:59:59.000Z

    We demonstrate a metalorganic chemical vapor deposition growth approach for inverting N-polar to Ga-polar GaN by using a thin inversion layer grown with high Mg flux. The introduction of this inversion layer allowed us to grow p-GaN films on N-polar GaN thin film. We have studied the dependence of hole concentration, surface morphology, and degree of polarity inversion for the inverted Ga-polar surface on the thickness of the inversion layer. We then use this approach to grow a light emitting diode structure which has the MQW active region grown on the advantageous N-polar surface and the p-layer grown on the inverted Ga-polar surface.

  6. High mobility single-crystalline-like GaAs thin films on inexpensive flexible metal substrates by metal-organic chemical vapor deposition

    SciTech Connect (OSTI)

    Dutta, P., E-mail: pdutta2@central.uh.edu; Rathi, M.; Gao, Y.; Yao, Y.; Selvamanickam, V. [Department of Mechanical Engineering, University of Houston, Houston, Texas 77204 (United States); Zheng, N.; Ahrenkiel, P. [Department of Nanoscience and Nanoengineering, South Dakota School of Mines and Technology, Rapid City, South Dakota 57701 (United States); Martinez, J. [Materials Evaluation Laboratory, NASA Johnson Space Center, Houston, Texas 77085 (United States)

    2014-09-01T23:59:59.000Z

    We demonstrate heteroepitaxial growth of single-crystalline-like n and p-type doped GaAs thin films on inexpensive, flexible, and light-weight metal foils by metal-organic chemical vapor deposition. Single-crystalline-like Ge thin film on biaxially textured templates made by ion beam assisted deposition on metal foil served as the epitaxy enabling substrate for GaAs growth. The GaAs films exhibited strong (004) preferred orientation, sharp in-plane texture, low grain misorientation, strong photoluminescence, and a defect density of ?10{sup 7?}cm{sup ?2}. Furthermore, the GaAs films exhibited hole and electron mobilities as high as 66 and 300?cm{sup 2}/V-s, respectively. High mobility single-crystalline-like GaAs thin films on inexpensive metal substrates can pave the path for roll-to-roll manufacturing of flexible III-V solar cells for the mainstream photovoltaics market.

  7. Deposition of silicon carbide films using a high vacuum metalorganic chemical vapor deposition method with a single source precursor

    E-Print Network [OSTI]

    Boo, Jin-Hyo

    , high temperature, and high radiation environments. Conventional silicon carbide chemical vapor deposition CVD processes generally utilized multiple precursors such as silane and hydrocarbons, and required temperature alternatives to the conventional SiC CVD methods must be considered. To do this, a relatively

  8. Microstructure and interface control of GaN/MgAl{sub 2}O{sub 4} grown by metalorganic chemical vapor deposition: Substrate-orientation dependence

    SciTech Connect (OSTI)

    He, G.; Chikyow, T. [Advanced Electric Materials Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan); Chichibu, Shigefusa F. [CANTech, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577 (Japan)

    2011-07-15T23:59:59.000Z

    GaN films with single-crystal and polycrystalline structure were deposited on (111) and (100) MgAl{sub 2}O{sub 4} substrates by metalorganic chemical vapor deposition using a substrate modified by chemical etching and thermal passivation. The interface structure and chemical bonding state of the GaN/MgAl{sub 2}O{sub 4} interface was investigated using angle-resolved x-ray photoelectron spectroscopy and resulting valence band spectra. Our results indicate that the Al{sub 2}O{sub 3} buffered layer induced by thermal passivation of the (111) substrate remains unchanged during GaN deposition, which is primarily responsible for the epitaxial growth of GaN on (111) MgAl{sub 2}O{sub 4} substrate. However, for the as-processed (100) substrate, interfacial reactions take place between the formed MgO-terminated surface and GaN films and GaN with a polycrystalline structure on (100) substrate forms. From the interface engineering viewpoint, the appropriate interface modification will allow control of the interface reaction to obtain high-quality GaN films for future optoelectronic devices.

  9. As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN

    SciTech Connect (OSTI)

    Chen Shang; Ishikawa, Kenji; Hori, Masaru [Nagoya University, Chikusa, Nagoya 464-8603 (Japan); Honda, Unhi; Shibata, Tatsunari; Matsumura, Toshiya; Tokuda, Yutaka [Aichi Institute of Technology, Yakusa, Toyota 470-0392 (Japan); Ueda, Hiroyuki; Uesugi, Tsutomu; Kachi, Tetsu [Toyota Central R and D Laboratories, Inc., Yokomichi, Nagakute 480-1192 (Japan)

    2012-09-01T23:59:59.000Z

    Traps of energy levels E{sub c}-0.26 and E{sub c}-0.61 eV have been identified as as-grown traps in n-GaN grown by metal-organic chemical vapor deposition by using deep level transient spectroscopy of the Schottky contacts fabricated by resistive evaporation. The additional traps of E{sub c}-0.13 and E{sub c}-0.65 eV have been observed in samples whose contacts are deposited by electron-beam evaporation. An increase in concentration of the E{sub c}-0.13 and E{sub c}-0.65 eV traps when approaching the interface between the contact and the GaN film supports our argument that these traps are induced by electron-beam irradiation. Conversely, the depth profiles of as-grown traps show different profiles between several samples with increased or uniform distribution in the near surface below 50 nm. Similar profiles are observed in GaN grown on a sapphire substrate. We conclude that the growth process causes these large concentrations of as-grown traps in the near-surface region. It is speculated that the finishing step in the growth process should be an essential issue in the investigation of the surface state of GaN.

  10. Room-temperature cw operation of InGaP/InGaAlP visible light laser diodes on GaAs substrates grown by metalorganic chemical vapor deposition

    SciTech Connect (OSTI)

    Ishikawa, M.; Ohba, Y.; Sugawara, H.; Yamamoto, M.; Nakanisi, T.

    1986-01-20T23:59:59.000Z

    Room-temperature cw operation for InGaP/InGaAlP double heterostructure (DH) laser diodes on GaAs substrates was achieved for the first time. The DH wafers were grown by low-pressure metalorganic chemical vapor deposition using methyl metalorganics. A lasing wavelength of 679 nm and a threshold current of 109 mA at 24C were obtained for an inner stripe structure laser diode with a 250- m-long and 7- m stripe geometry. The laser operated at up to 51C. The characteristic temperature T0 was 87 K at around room temperature. The lowest threshold current density, 5.0 kA/cmS, was obtained with a 20- m stripe width laser diode under room-temperature pulsed operation.

  11. Issues associated with the metalorganic chemical vapor deposition of ScGaN and YGaN alloys.

    SciTech Connect (OSTI)

    Koleske, Daniel David; Knapp, James Arthur; Lee, Stephen Roger; Crawford, Mary Hagerott; Creighton, James Randall; Cross, Karen Charlene; Thaler, Gerald

    2009-07-01T23:59:59.000Z

    The most energy efficient solid state white light source will likely be a combination of individually efficient red, green, and blue LED. For any multi-color approach to be successful the efficiency of deep green LEDs must be significantly improved. While traditional approaches to improve InGaN materials have yielded incremental success, we proposed a novel approach using group IIIA and IIIB nitride semiconductors to produce efficient green and high wavelength LEDs. To obtain longer wavelength LEDs in the nitrides, we attempted to combine scandium (Sc) and yttrium (Y) with gallium (Ga) to produce ScGaN and YGaN for the quantum well (QW) active regions. Based on linear extrapolation of the proposed bandgaps of ScN (2.15 eV), YN (0.8 eV) and GaN (3.4 eV), we expected that LEDs could be fabricated from the UV (410 nm) to the IR (1600 nm), and therefore cover all visible wavelengths. The growth of these novel alloys potentially provided several advantages over the more traditional InGaN QW regions including: higher growth temperatures more compatible with GaN growth, closer lattice matching to GaN, and reduced phase separation than is commonly observed in InGaN growth. One drawback to using ScGaN and YGaN films as the active regions in LEDs is that little research has been conducted on their growth, specifically, are there metalorganic precursors that are suitable for growth, are the bandgaps direct or indirect, can the materials be grown directly on GaN with a minimal defect formation, as well as other issues related to growth. The major impediment to the growth of ScGaN and YGaN alloys was the low volatility of metalorganic precursors. Despite this impediment some progress was made in incorporation of Sc and Y into GaN which is detailed in this report. Primarily, we were able to incorporate up to 5 x 10{sup 18} cm{sup -3} Y atoms into a GaN film, which are far below the alloy concentrations needed to evaluate the YGaN optical properties. After a no-cost extension was granted on this program, an additional more 'liquid-like' Sc precursor was evaluated and the nitridation of Sc metals on GaN were investigated. Using the Sc precursor, dopant level quantities of Sc were incorporated into GaN, thereby concluding the growth of ScGaN and YGaN films. Our remaining time during the no-cost extension was focused on pulsed laser deposition of Sc metal films on GaN, followed by nitridation in the MOCVD reactor to form ScN. Finally, GaN films were deposited on the ScN thin films in order to study possible GaN dislocation reduction.

  12. Low trap states in in situ SiN{sub x}/AlN/GaN metal-insulator-semiconductor structures grown by metal-organic chemical vapor deposition

    SciTech Connect (OSTI)

    Lu, Xing; Ma, Jun; Jiang, Huaxing; Liu, Chao; Lau, Kei May, E-mail: eekmlau@ust.hk [Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon (Hong Kong)

    2014-09-08T23:59:59.000Z

    We report the use of SiN{sub x} grown in situ by metal-organic chemical vapor deposition as the gate dielectric for AlN/GaN metal-insulator-semiconductor (MIS) structures. Two kinds of trap states with different time constants were identified and characterized. In particular, the SiN{sub x}/AlN interface exhibits remarkably low trap state densities in the range of 10{sup 11}–10{sup 12?}cm{sup ?2}eV{sup ?1}. Transmission electron microscopy and X-ray photoelectron spectroscopy analyses revealed that the in situ SiN{sub x} layer can provide excellent passivation without causing chemical degradation to the AlN surface. These results imply the great potential of in situ SiN{sub x} as an effective gate dielectric for AlN/GaN MIS devices.

  13. In situ chemical sensing in AlGaN/GaN high electron mobility transistor metalorganic chemical vapor deposition process for real-time

    E-Print Network [OSTI]

    Rubloff, Gary W.

    , Linthicum, Maryland 21090 Rinku Parikh and Raymond A. Adomaitis Department of Chemical Engineering materials have distinguished themselves to be key materials for future semiconductor de- vices aimed at high

  14. Growth of single crystalline GaN thin films on Si,,111... substrates by high vacuum metalorganic chemical vapor deposition using a single

    E-Print Network [OSTI]

    Boo, Jin-Hyo

    Growth of single crystalline GaN thin films on Si,,111... substrates by high vacuum metalorganic; published 20 August 2004 Hexagonal GaN thin films were grown on Si 111 substrates using single molecular precursor of diethylazidogallium methylhydrazine adduct, (Et)2Ga N3)HzMe], with the objectives of reducing

  15. Double-sided reel-to-reel metal-organic chemical vapor deposition system of YBa{sub 2}Cu{sub 3}O{sub 7-?} thin films

    SciTech Connect (OSTI)

    Zhang, Fei; Xiong, Jie, E-mail: jiexiong@uestc.edu.cn; Liu, Xin; Zhao, Ruipeng; Zhao, Xiaohui; Tao, Bowan; Li, Yanrong [State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054 (China)

    2014-07-01T23:59:59.000Z

    Two-micrometer thick YBa{sub 2}Cu{sub 3}O{sub 7-?} (YBCO) films have been successfully deposited on both sides of LaAlO{sub 3} single crystalline substrates by using a home-made reel-to-reel metal-organic chemical vapor deposition (MOCVD) system, which has two opposite symmetrical shower heads and a special-designed heater. This technique can simultaneously fabricate double-sided films with high deposition rate up to 500?nm/min, and lead to doubling current carrying capability of YBCO, especially for coated conductors (CCs). X-ray diffraction analysis showed that YBCO films were well crystallized and highly epitaxial with the full width at half maximum values of 0.2°???0.3° for the rocking curves of (005) YBCO and 1.0° for ?-scans of (103) YBCO. Scanning electron microscope revealed dense, crack-free, slightly rough surface with Ba-Cu-O precipitates. The films showed critical current density (J{sub c}, 77?K, 0?T) of about 1 MA/cm{sup 2}, and overall critical current of 400?A/cm, ascribed to the double-sided structure. Our results also demonstrated that the temperature and composition in the deposition zone were uniform, which made MOCVD preparation of low cost and high performance double-sided YBCO CCs more promising for industrialization.

  16. Method of varying a characteristic of an optical vertical cavity structure formed by metalorganic vapor phase epitaxy

    DOE Patents [OSTI]

    Hou, Hong Q. (Albuquerque, NM); Coltrin, Michael E. (Albuquerque, NM); Choquette, Kent D. (Albuquerque, NM)

    2001-01-01T23:59:59.000Z

    A process for forming an array of vertical cavity optical resonant structures wherein the structures in the array have different detection or emission wavelengths. The process uses selective area growth (SAG) in conjunction with annular masks of differing dimensions to control the thickness and chemical composition of the materials in the optical cavities in conjunction with a metalorganic vapor phase epitaxy (MOVPE) process to build these arrays.

  17. InGaN/GaN multi-quantum well and LED growth on wafer-bonded sapphire-on-polycrystalline AlN substrates by metalorganic chemical vapor deposition.

    SciTech Connect (OSTI)

    Crawford, Mary Hagerott; Olson, S. M. (Aonex Technologies Inc., Pasadena, CA); Banas, M.; Park, Y. -B. (Aonex Technologies Inc., Pasadena, CA); Ladous, C. (Aonex Technologies Inc., Pasadena, CA); Russell, Michael J.; Thaler, Gerald; Zahler, J. M. (Aonex Technologies Inc., Pasadena, CA); Pinnington, T. (Aonex Technologies Inc., Pasadena, CA); Koleske, Daniel David; Atwater, Harry A. (Aonex Technologies Inc., Pasadena, CA)

    2008-06-01T23:59:59.000Z

    We report growth of InGaN/GaN multi-quantum well (MQW) and LED structures on a novel composite substrate designed to eliminate the coefficient of thermal expansion (CTE) mismatch problems which impact GaN growth on bulk sapphire. To form the composite substrate, a thin sapphire layer is wafer-bonded to a polycrystalline aluminum nitride (P-AlN) support substrate. The sapphire layer provides the epitaxial template for the growth; however, the thermo-mechanical properties of the composite substrate are determined by the P-AlN. Using these substrates, thermal stresses associated with temperature changes during growth should be reduced an order of magnitude compared to films grown on bulk sapphire, based on published CTE data. In order to test the suitability of the substrates for GaN LED growth, test structures were grown by metalorganic chemical vapor deposition (MOCVD) using standard process conditions for GaN growth on sapphire. Bulk sapphire substrates were included as control samples in all growth runs. In situ reflectance monitoring was used to compare the growth dynamics for the different substrates. The material quality of the films as judged by X-ray diffraction (XRD), photoluminescence and transmission electron microscopy (TEM) was similar for the composite substrate and the sapphire control samples. Electroluminescence was obtained from the LED structure grown on a P-AlN composite substrate, with a similar peak wavelength and peak width to the control samples. XRD and Raman spectroscopy results confirm that the residual strain in GaN films grown on the composite substrates is dramatically reduced compared to growth on bulk sapphire substrates.

  18. Metalorganic Chemical Vapor Deposition for Optoelectronic Devices

    E-Print Network [OSTI]

    Coleman, James J.

    ­1100 nm, visible InGaP and related compounds, and the column III nitrides for blue and ultraviolet la

  19. Overview of chemical vapor infiltration

    SciTech Connect (OSTI)

    Besmann, T.M.; Stinton, D.P.; Lowden, R.A.

    1993-06-01T23:59:59.000Z

    Chemical vapor infiltration (CVI) is developing into a commercially important method for the fabrication of continuous filament ceramic composites. Current efforts are focused on the development of an improved understanding of the various processes in CVI and its modeling. New approaches to CVI are being explored, including pressure pulse infiltration and microwave heating. Material development is also proceeding with emphasis on improving the oxidation resistance of the interfacial layer between the fiber and matrix. This paper briefly reviews these subjects, indicating the current state of the science and technology.

  20. Temperature dependent photoluminescence of lateral polarity junctions of metal organic chemical vapor deposition grown GaN

    E-Print Network [OSTI]

    Nabben, Reinhard

    implantation of Cu, Li and Ag into silicon doped GaN films grown by Metalorganic Chemical Vapor Deposition temperature (700-900°C) annealing. Low temperature (6K) photoluminescence (PL) for Cu-implanted GaN showed recovery of standard crystalline GaN features. Additional donor-acceptor pair features are observed below 3

  1. Chemical vapor deposition of functionalized isobenzofuran polymers

    E-Print Network [OSTI]

    Olsson, Ylva Kristina

    2007-01-01T23:59:59.000Z

    This thesis develops a platform for deposition of polymer thin films that can be further tailored by chemical surface modification. First, we explore chemical vapor deposition of functionalized isobenzofuran films using ...

  2. Hydrogen-Bond Acidic Polymers for Chemical Vapor Sensing. | EMSL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Acidic Polymers for Chemical Vapor Sensing. Hydrogen-Bond Acidic Polymers for Chemical Vapor Sensing. Abstract: A review with 171 references. Hydrogen-bond acidic polymers for...

  3. HANFORD CHEMICAL VAPORS WORKER CONCERNS & EXPOSURE EVALUATION

    SciTech Connect (OSTI)

    ANDERSON, T.J.

    2006-12-20T23:59:59.000Z

    Chemical vapor emissions from underground hazardous waste storage tanks on the Hanford site in eastern Washington State are a potential concern because workers enter the tank farms on a regular basis for waste retrievals, equipment maintenance, and surveillance. Tank farm contractors are in the process of retrieving all remaining waste from aging single-shell tanks, some of which date to World War II, and transferring it to newer double-shell tanks. During the waste retrieval process, tank farm workers are potentially exposed to fugitive chemical vapors that can escape from tank headspaces and other emission points. The tanks are known to hold more than 1,500 different species of chemicals, in addition to radionuclides. Exposure assessments have fully characterized the hazards from chemical vapors in half of the tank farms. Extensive sampling and analysis has been done to characterize the chemical properties of hazardous waste and to evaluate potential health hazards of vapors at the ground surface, where workers perform maintenance and waste transfer activities. Worker concerns. risk communication, and exposure assessment are discussed, including evaluation of the potential hazards of complex mixtures of chemical vapors. Concentrations of vapors above occupational exposure limits-(OEL) were detected only at exhaust stacks and passive breather filter outlets. Beyond five feet from the sources, vapors disperse rapidly. No vapors have been measured above 50% of their OELs more than five feet from the source. Vapor controls are focused on limited hazard zones around sources. Further evaluations of vapors include analysis of routes of exposure and thorough analysis of nuisance odors.

  4. Chemical vapor infiltration using microwave energy

    DOE Patents [OSTI]

    Devlin, David J. (Los Alamos, NM); Currier, Robert P. (Los Alamos, NM); Laia, Jr., Joseph R. (Los Alamos, NM); Barbero, Robert S. (Santa Cruz, NM)

    1993-01-01T23:59:59.000Z

    A method for producing reinforced ceramic composite articles by means of chemical vapor infiltration and deposition in which an inverted temperature gradient is utilized. Microwave energy is the source of heat for the process.

  5. Chemical vapor deposition of antimicrobial polymer coatings

    E-Print Network [OSTI]

    Martin, Tyler Philip, 1977-

    2007-01-01T23:59:59.000Z

    There is large and growing interest in making a wide variety of materials and surfaces antimicrobial. Initiated chemical vapor deposition (iCVD), a solventless low-temperature process, is used to form thin films of polymers ...

  6. Chemical vapor deposition of mullite coatings

    DOE Patents [OSTI]

    Sarin, Vinod (Lexington, MA); Mulpuri, Rao (Boston, MA)

    1998-01-01T23:59:59.000Z

    This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

  7. DuPont Chemical Vapor Technical Report

    SciTech Connect (OSTI)

    MOORE, T.L.

    2003-10-03T23:59:59.000Z

    DuPont Safety Resources was tasked with reviewing the current chemical vapor control practices and providing preventive recommendations on best commercial techniques to control worker exposures. The increased focus of the tank closure project to meet the 2024 Tri-Party Agreement (TPA) milestones has surfaced concerns among some CH2MHill employees and other interested parties. CH2MHill is committed to providing a safe working environment for employees and desires to safely manage the tank farm operations using appropriate control measures. To address worker concerns, CH2MHill has chartered a ''Chemical Vapors Project'' to integrate the activities of multiple CH2MHill project teams, and solicit the expertise of external resources, including an independent Industrial Hygiene expert panel, a communications consultant, and DuPont Safety Resources. Over a three-month time period, DuPont worked with CH2MHill ESH&Q, Industrial Hygiene, Engineering, and the independent expert panel to perform the assessment. The process included overview presentations, formal interviews, informal discussions, documentation review, and literature review. DuPont Safety Resources concluded that it is highly unlikely that workers in the tank farms are exposed to chemicals above established standards. Additionally, the conventional and radiological chemistry is understood, the inherent chemical hazards are known, and the risk associated with chemical vapor exposure is properly managed. The assessment highlighted management's commitment to addressing chemical vapor hazards and controlling the associated risks. Additionally, we found the Industrial Hygiene staff to be technically competent and well motivated. The tank characterization data resides in a comprehensive database containing the tank chemical compositions and relevant airborne concentrations.

  8. Chemical vapor deposition of epitaxial silicon

    DOE Patents [OSTI]

    Berkman, Samuel (Florham Park, NJ)

    1984-01-01T23:59:59.000Z

    A single chamber continuous chemical vapor deposition (CVD) reactor is described for depositing continuously on flat substrates, for example, epitaxial layers of semiconductor materials. The single chamber reactor is formed into three separate zones by baffles or tubes carrying chemical source material and a carrier gas in one gas stream and hydrogen gas in the other stream without interaction while the wafers are heated to deposition temperature. Diffusion of the two gas streams on heated wafers effects the epitaxial deposition in the intermediate zone and the wafers are cooled in the final zone by coolant gases. A CVD reactor for batch processing is also described embodying the deposition principles of the continuous reactor.

  9. Advanced Chemical Heat Pumps Using Liquid-Vapor Reactions 

    E-Print Network [OSTI]

    Kirol, L.

    1987-01-01T23:59:59.000Z

    Chemical heat pumps utilizing liquid-vapor reactions can be configured in forms analogous to electric drive vapor-compression heat pumps and heat activated absorption heat pumps. Basic thermodynamic considerations eliminate some heat pumps and place...

  10. assisted chemical vapor: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    nanodiamonds (NDs) with 70-80 nm size via bead assisted sonic disintegration (BASD) of a polycrystalline chemical vapor deposition (CVD) film. The NDs display high crystalline...

  11. Chemical vapor deposition of group IIIB metals

    DOE Patents [OSTI]

    Erbil, A.

    1989-11-21T23:59:59.000Z

    Coatings of Group IIIB metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula given in the patent where M is a Group IIIB metal, such as lanthanum or yttrium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula 1 is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as lanthanum telluride can be deposited from a lanthanum compound of formula 1 and a heat decomposable tellurium compound under nonoxidizing conditions.

  12. Advanced Chemical Heat Pumps Using Liquid-Vapor Reactions

    E-Print Network [OSTI]

    Kirol, L.

    ADVANCED CHEMICAL HEAT PUMPS USING LIQUID-VAPOR REACTIONS LANCE KIROL Senior Program Specialist Idaho National Engineering Laboratory Idaho Falls, Idaho . ABSTRACT Chemical heat pumps utilizing liquid-vapor reactions can be configured... in forms analogous to electric drive vapor-compression heat pumps and heat activated absorption heat pumps. Basic thermodynamic considerations eliminate some heat pumps and place restrictive working fluid requirements on others, but two thermodynam...

  13. Photoluminescence linewidths in metalorganic vapor phase epitaxially grown ordered and disordered InAlGaP alloys

    SciTech Connect (OSTI)

    Schneider, R.P. Jr.; Jones, E.D.; Lott, J.A.; Bryan, R.P. (Sandia National Laboratories, Albuquerque, New Mexico 87185-5800 (United States))

    1992-12-01T23:59:59.000Z

    The dependence of the photoluminescent properties of In{sub 0.48}(Al{sub {ital y}}Ga{sub 1{minus}{ital y}}){sub 0.52}P alloys (0{le}{ital y}{le}0.5) on growth temperature and substrate misorientation off GaAs(100) has been studied. Samples were grown using low-pressure metalorganic vapor phase epitaxy. By studying the dependence of ordering behavior in InGaP as a function of substrate misorientation and growth temperature simultaneously, a very large range in low-temperature photoluminescence emission energy---135 meV---has been obtained. The photoluminescence linewidth exhibits a strong, continuous dependence on the extent of atomic ordering (the emission energy) in the alloys. The results indicate that inhomogeneity in the microstructure of the material (i.e., between ordered'' domains and the disordered'' matrix) is the dominant photoluminescence broadening mechanism. This investigation has allowed a significant optimization of the optical properties of these materials, including the narrowest low-temperature photoluminescent linewidths reported for all of the In(Al{sub {ital y}}Ga{sub 1{minus}{ital y}})P alloys exhibiting direct band gaps (4.2 meV for InGaP).

  14. Photoinitiated chemical vapor depostion [sic] : mechanism and applications

    E-Print Network [OSTI]

    Baxamusa, Salmaan Husain

    2009-01-01T23:59:59.000Z

    Photoinitiated chemical vapor deposition (piCVD) is developed as a simple, solventless, and rapid method for the deposition of swellable hydrogels and functional hydrogel copolymers. Mechanistic experiments show that piCVD ...

  15. Chemical vapor deposition of organosilicon and sacrificial polymer thin films

    E-Print Network [OSTI]

    Casserly, Thomas Bryan

    2005-01-01T23:59:59.000Z

    Chemical vapor deposition (CVD) produced films for a wide array of applications from a variety of organosilicon and organic precursors. The structure and properties of thin films were controlled by varying processing ...

  16. Initiated chemical vapor deposition of functional polyacrylic thin films

    E-Print Network [OSTI]

    Mao, Yu, 1975-

    2005-01-01T23:59:59.000Z

    Initiated chemical vapor deposition (iCVD) was explored as a novel method for synthesis of functional polyacrylic thin films. The process introduces a peroxide initiator, which can be decomposed at low temperatures (<200?C) ...

  17. All graphene electromechanical switch fabricated by chemical vapor deposition

    E-Print Network [OSTI]

    Milaninia, Kaveh M.

    We demonstrate an electromechanical switch comprising two polycrystalline graphene films; each deposited using ambient pressure chemical vapor deposition. The top film is pulled into electrical contact with the bottom film ...

  18. assisted chemical solution: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Ray 2012-01-01 47 Study on plasma assisted metal-organic chemical vapor deposition of Zr,,C,N... and Ti,,C,N... thin films and in situ plasma diagnostics with optical Materials...

  19. X-ray determination of threading dislocation densities in GaN/Al{sub 2}O{sub 3}(0001) films grown by metalorganic vapor phase epitaxy

    SciTech Connect (OSTI)

    Kopp, Viktor S., E-mail: victor.kopp@pdi-berlin.de; Kaganer, Vladimir M. [Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5–7, 10117 Berlin (Germany); Baidakova, Marina V.; Lundin, Wsevolod V.; Nikolaev, Andrey E.; Verkhovtceva, Elena V.; Yagovkina, Maria A. [Ioffe Physical-Technical Institute of the Russian Academy of Sciences, Politekhnicheskaya 26, 194021 St.-Petersburg (Russian Federation); Cherkashin, Nikolay [CEMES-CNRS and Université de Toulouse, 29 rue J. Marvig, 31055 Toulouse (France)

    2014-02-21T23:59:59.000Z

    Densities of a- and a+c-type threading dislocations for a series of GaN films grown in different modes by metalorganic vapor phase epitaxy are determined from the x-ray diffraction profiles in skew geometry. The reciprocal space maps are also studied. Theory of x-ray scattering from crystals with dislocations is extended in order to take into account contribution from both threading and misfit dislocations. The broadening of the reciprocal space maps along the surface normal and the rotation of the intensity distribution ellipse is attributed to misfit dislocations at the interface. We find that the presence of a sharp AlN/GaN interface leads to an ordering of misfit dislocations and reduces strain inhomogeneity in GaN films.

  20. Substrate misorientation induced strong increase in the hole concentration in Mg doped GaN grown by metalorganic vapor phase epitaxy

    SciTech Connect (OSTI)

    Suski, T.; Litwin-Staszewska, E.; Piotrzkowski, R.; Krysko, M.; Nowak, G.; Franssen, G.; Dmowski, L. H.; Lucznik, B. [Institute of High Pressure Physics UNIPRESS, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw (Poland); Czernecki, R.; Grzanka, S. [TopGaN Ltd., Sokolowska 29/37 01-142 Warszawa (Poland); Leszczynski, M.; Perlin, P.; Grzegory, I. [Institute of High Pressure Physics UNIPRESS, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw (Poland); TopGaN Ltd., Sokolowska 29/37 01-142 Warsaw (Poland); Jakiela, R. [Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32, 02-668 Warsaw (Poland)

    2008-10-27T23:59:59.000Z

    We demonstrate that relatively small GaN substrate misorientation can strongly change hole carrier concentration in Mg doped GaN layers grown by metalorganic vapor phase epitaxy. In this work intentionally misoriented GaN substrates (up to 2 deg. with respect to ideal <0001> plane) were employed. An increase in the hole carrier concentration to the level above 10{sup 18} cm{sup -3} and a decrease in GaN:Mg resistivity below 1 {omega} cm were achieved. Using secondary ion mass spectroscopy we found that Mg incorporation does not change with varying misorientation angle. This finding suggests that the compensation rate, i.e., a decrease in unintentional donor density, is responsible for the observed increase in the hole concentration. Analysis of the temperature dependence of electrical transport confirms this interpretation.

  1. DIAMOND CHEMICAL VAPOR DEPOSITION Nucleation and Early Growth Stages

    E-Print Network [OSTI]

    Dandy, David

    a reality. Epi- taxial diamond has been grown on diamond and cubic-BN. Polycrystalline diamond films haveDIAMOND CHEMICAL VAPOR DEPOSITION Nucleation and Early Growth Stages by Huimin Liu David S. Dandy of high-quality diamond coatings on preshaped parts and synthesis of free-standing shapes of diamond

  2. Chemical vapor deposition thin films as biopassivation coatings and directly patternable dielectrics

    E-Print Network [OSTI]

    Pryce Lewis, Hilton G. (Hilton Gavin), 1973-

    2001-01-01T23:59:59.000Z

    Organosilicon thin films deposited by pulsed plasma-enhanced chemical vapor deposition (PPECVD) and hot-filament chemical vapor deposition (HFCVD) were investigated as potential biopassivation coatings for neural probes. ...

  3. Amine functionalization by initiated chemical vapor deposition (iCVD) for interfacial adhesion and film cohesion

    E-Print Network [OSTI]

    Xu, Jingjing, Ph. D. Massachusetts Institute of Technology

    2011-01-01T23:59:59.000Z

    Amine functional polymer thin films provide a versatile platform for subsequent functionalization because of their diverse reactivity. Initiated chemical vapor deposition (iCVD) is a polymer chemical vapor deposition ...

  4. Chemical Vapor Deposited Zinc Sulfide. SPIE Press Monograph

    SciTech Connect (OSTI)

    McCloy, John S.; Tustison, Randal W.

    2013-04-22T23:59:59.000Z

    Zinc sulfide has shown unequaled utility for infrared windows that require a combination of long-wavelength infrared transparency, mechanical durability, and elevated-temperature performance. This book reviews the physical properties of chemical vapor deposited ZnS and their relationship to the CVD process that produced them. An in-depth look at the material microstructure is included, along with a discussion of the material's optical properties. Finally, because the CVD process itself is central to the development of this material, a brief history is presented.

  5. Unusual thermopower of inhomogeneous graphene grown by chemical vapor deposition

    SciTech Connect (OSTI)

    Nam, Youngwoo, E-mail: youngwoo.nam@chalmers.se [Department of Physics and Astronomy, Seoul National University, Seoul 151-747 (Korea, Republic of); Department of Microtechnology and Nanoscience, Chalmers University of Technology, SE-412 96 Gothenburg (Sweden); Sun, Jie; Lindvall, Niclas; Yurgens, August [Department of Microtechnology and Nanoscience, Chalmers University of Technology, SE-412 96 Gothenburg (Sweden); Jae Yang, Seung; Rae Park, Chong [Department of Materials Science and Engineering, Seoul National University, Seoul 151-747 (Korea, Republic of); Woo Park, Yung [Department of Physics and Astronomy, Seoul National University, Seoul 151-747 (Korea, Republic of)

    2014-01-13T23:59:59.000Z

    We report on thermopower (TEP) and resistance measurements of inhomogeneous graphene grown by chemical vapor deposition (CVD). Unlike the conventional resistance of pristine graphene, the gate-dependent TEP shows a large electron-hole asymmetry. This can be accounted for by inhomogeneity of the CVD-graphene where individual graphene regions contribute with different TEPs. At the high magnetic field and low temperature, the TEP has large fluctuations near the Dirac point associated with the disorder in the CVD-graphene. TEP measurements reveal additional characteristics of CVD-graphene, which are difficult to obtain from the measurement of resistance alone.

  6. Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Gas Phase Complex Formation,

    E-Print Network [OSTI]

    Schlegel, H. Bernhard

    Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Gas Phase Complex Received June 6, 2000 The chemical vapor deposition (CVD) of titanium nitride can be carried out with TiCl4 Titanium nitride thin films have a variety of proper- ties, such as extreme hardness, high chemical

  7. Momentum and thermal boundary-layer thickness in a stagnation flow chemical vapor deposition reactor

    E-Print Network [OSTI]

    Dandy, David

    reactor David S. Dandy and Jungheum Yun Department of Chemical Engineering, Colorado State University stagnation flows characteristic of highly convective chemical vapor deposition pedestal reactors. Expressions of diamond via low- pressure chemical vapor deposition, direct current (dc) arcjet reactor systems3­8 have

  8. Chemical vapor deposition of organosilicon composite thin films for porous low-k dielectrics

    E-Print Network [OSTI]

    Ross, April Denise, 1977-

    2005-01-01T23:59:59.000Z

    Pulsed plasma enhanced chemical vapor deposition has produced organosilicon thin films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Both diethylsilane and ...

  9. Metalorganic Chemical Vapor Deposition Route to GaN Nanowires with Triangular

    E-Print Network [OSTI]

    Yang, Peidong

    -free environment at atmospheric pressure. TMG was kept cool in a -10 °C temperature bath. Nitrogen, used a total nitrogen flow rate of 250 sccm. These were supplied via a 4-mm i.d. quartz tube. Hydrogen and ammonia sources were supplied via a 22-mm i.d. outer quartz tube at a total flow rate of 155 sccm

  10. Epitaxial growth of aligned AlGalnN nanowires by metal-organic chemical vapor deposition

    DOE Patents [OSTI]

    Han, Jung (Woodbridge, CT); Su, Jie (New Haven, CT)

    2008-08-05T23:59:59.000Z

    Highly ordered and aligned epitaxy of III-Nitride nanowires is demonstrated in this work. <1010> M-axis is identified as a preferential nanowire growth direction through a detailed study of GaN/AlN trunk/branch nanostructures by transmission electron microscopy. Crystallographic selectivity can be used to achieve spatial and orientational control of nanowire growth. Vertically aligned (Al)GaN nanowires are prepared on M-plane AlN substrates. Horizontally ordered nanowires, extending from the M-plane sidewalls of GaN hexagonal mesas or islands demonstrate new opportunities for self-aligned nanowire devices, interconnects, and networks.

  11. Molecular-jet chemical vapor deposition of SiC

    SciTech Connect (OSTI)

    Lubben, D.; Jellison, G.E.; Modine, F.A.

    1995-09-01T23:59:59.000Z

    SiC films have been deposited by molecular-jet chemical vapor deposition (MJCVD) on Si(001) substrates. Methylsilane (MS) diluted in He was used as a precursor for deposition under conditions which produced a MS molecular beam with 0.365 eV translational energy. Films grown at temperatures between 1000 and 1150 C and above {approx}1200 C were single crystal as judged by electron channeling, while those grown at intermediate temperatures were polycrystalline. Films grown at lower temperatures generally had a smoother surface morphology for moderate thicknesses, although all films showed at least some degree of faceting. The best thick films, up to 4 {mu}m, were obtained for substrate temperatures of {approx}1210 C under flow conditions which produced a deposition rate of {approx}1200 {angstrom} per minute.

  12. Field emission properties of chemical vapor deposited individual graphene

    SciTech Connect (OSTI)

    Zamri Yusop, Mohd [Department of Frontier Materials, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, 466-8555 Nagoya (Japan); Department of Materials, Faculty of Mechanical Engineering, Universiti Teknologi Malaysia, 81310 UTM Skudai, Johor (Malaysia); Kalita, Golap, E-mail: kalita.golap@nitech.ac.jp [Department of Frontier Materials, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, 466-8555 Nagoya (Japan); Center for Fostering Young and Innovative Researchers, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, 466-8555 Nagoya (Japan); Yaakob, Yazid; Takahashi, Chisato; Tanemura, Masaki [Department of Frontier Materials, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, 466-8555 Nagoya (Japan)

    2014-03-03T23:59:59.000Z

    Here, we report field emission (FE) properties of a chemical vapor deposited individual graphene investigated by in-situ transmission electron microscopy. Free-standing bilayer graphene is mounted on a cathode microprobe and FE processes are investigated varying the vacuum gap of cathode and anode. The threshold field for 10?nA current were found to be 515, 610, and 870?V/?m for vacuum gap of 400, 300, and 200?nm, respectively. It is observed that the structural stability of a high quality bilayer graphene is considerably stable during emission process. By contacting the nanoprobe with graphene and applying a bias voltage, structural deformation and buckling are observed with significant rise in temperature owing to Joule heating effect. The finding can be significant for practical application of graphene related materials in emitter based devices as well as understanding the contact resistance influence and heating effect.

  13. Low Temperature Chemical Vapor Deposition Of Thin Film Magnets

    DOE Patents [OSTI]

    Miller, Joel S. (Salt Lake City, UT); Pokhodnya, Kostyantyn I. (Salt Lake City, UT)

    2003-12-09T23:59:59.000Z

    A thin-film magnet formed from a gas-phase reaction of tetracyanoetheylene (TCNE) OR (TCNQ), 7,7,8,8-tetracyano-P-quinodimethane, and a vanadium-containing compound such as vanadium hexcarbonyl (V(CO).sub.6) and bis(benzene)vanalium (V(C.sub.6 H.sub.6).sub.2) and a process of forming a magnetic thin film upon at least one substrate by chemical vapor deposition (CVD) at a process temperature not exceeding approximately 90.degree. C. and in the absence of a solvent. The magnetic thin film is particularly suitable for being disposed upon rigid or flexible substrates at temperatures in the range of 40.degree. C. and 70.degree. C. The present invention exhibits air-stable characteristics and qualities and is particularly suitable for providing being disposed upon a wide variety of substrates.

  14. Iron (III) Chloride doping of large-area chemical vapor deposition graphene

    E-Print Network [OSTI]

    Song, Yi, S.M. Massachusetts Institute of Technology

    2013-01-01T23:59:59.000Z

    Chemical doping is an effective method of reducing the sheet resistance of graphene. This thesis aims to develop an effective method of doping large area Chemical Vapor Deposition (CVD) graphene using Iron (III) Chloride ...

  15. Electronic Properties of Large-scale Graphene Films Chemical Vapor Synthesized on Nickel and on Copper

    E-Print Network [OSTI]

    Chen, Yong P.

    transport properties of graphene films grown on Ni and Cu. Sample Preparation The synthesis of graphene film1 Electronic Properties of Large-scale Graphene Films Chemical Vapor Synthesized on Nickel of large scale graphene films grown by chemical vapor synthesis on Ni and Cu, and then transferred to SiO2

  16. Computational Analysis and Optimization of a Chemical Vapor Deposition Reactor with

    E-Print Network [OSTI]

    modifications of reactor configurations and manual control of operating conditions becomes prohibitivelyComputational Analysis and Optimization of a Chemical Vapor Deposition Reactor with Large for the chemical vapor deposition (CVD) of silicon in a horizontal rotating disk reactor. A three

  17. Low temperature chemical vapor deposition of Co thin films from Co2(CO)8

    E-Print Network [OSTI]

    Wang, Gwo-Ching

    Low temperature chemical vapor deposition of Co thin films from Co2(CO)8 D.-X. Yea,*, S. Pimanpanga chemical vapor deposition with a metallorganic Co2(CO)8 precursor. After Ar sputtering of the surface, Co2(CO)8, has been extensively used in cobalt CVD and is attractive, since Co is in its elemental

  18. Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Imido Dimer Formation and

    E-Print Network [OSTI]

    Schlegel, H. Bernhard

    Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Imido Dimer Formation- ization of Ti(NR2)2NH in the chemical vapor deposition (CVD) of titanium nitride films. This study uses lead to the formation of higher oligomers. Introduction Titanium nitride thin films have a number

  19. Tunneling characteristics in chemical vapor deposited graphene hexagonal boron nitride graphene junctions

    E-Print Network [OSTI]

    Feenstra, Randall

    1 Tunneling characteristics in chemical vapor deposited graphene ­ hexagonal boron nitride ­ graphene junctions T. Roy1 , L. Liu2 , S. de la Barrera,3 B. Chakrabarti1,4 , Z. R. Hesabi1 , C. A. Joiner1 Abstract: Large area chemical vapor deposited graphene and hexagonal boron nitride was used to fabricate

  20. Porous GaN nanowires synthesized using thermal chemical vapor deposition

    E-Print Network [OSTI]

    Kim, Bongsoo

    Porous GaN nanowires synthesized using thermal chemical vapor deposition Seung Yong Bae a , Hee Won 2003 Abstract Porous structured GaN nanowires were synthesized with a large scale by chemical vapor to 1 mm. The porous GaN nanowires consist of the wurtzite single crystal grown with the [0 1 1

  1. Real-time growth rate metrology for a tungsten chemical vapor deposition process by acoustic sensing

    E-Print Network [OSTI]

    Rubloff, Gary W.

    to a production-scale tungsten chemical vapor deposition cluster tool for in situ process sensing. Process gasesReal-time growth rate metrology for a tungsten chemical vapor deposition process by acoustic to achieve run-to-run process control of the deposited tungsten film thickness. © 2001 American Vacuum

  2. Correlative analysis of the in situ changes of carrier decay and proton induced photoluminescence characteristics in chemical vapor deposition grown GaN

    SciTech Connect (OSTI)

    Gaubas, E., E-mail: eugenijus.gaubas@ff.vu.lt; Ceponis, T.; Jasiunas, A.; Meskauskaite, D.; Pavlov, J.; Tekorius, A.; Vaitkus, J. [Vilnius University, Institute of Applied Research, Vilnius LT-10222 (Lithuania); Kovalevskij, V.; Remeikis, V. [Centre for Physical Sciences and Technology, Vilnius LT-02300 (Lithuania)

    2014-02-10T23:59:59.000Z

    In order to evaluate carrier densities created by 1.6?MeV protons and to trace radiation damage of the 2.5??m thick GaN epi-layers grown by metalorganic chemical vapor deposition technique, a correlation between the photoconductivity transients and the steady-state photoluminescence spectra have been examined. Comparison of luminescence spectra induced by proton beam and by laser pulse enabled us to evaluate the efficiency of a single proton generation being of 1?×?10{sup 7}?cm{sup ?3} per 1.6?MeV proton and 40 carrier pairs per micrometer of layer depth. This result indicates that GaN layers can be an efficient material for detection of particle flows. It has been demonstrated that GaN material can also be a rather efficient scintillating material within several wavelength ranges.

  3. Development of chemical vapor composites, CVC materials. Final report

    SciTech Connect (OSTI)

    NONE

    1998-10-05T23:59:59.000Z

    Industry has a critical need for high-temperature operable ceramic composites that are strong, non-brittle, light weight, and corrosion resistant. Improvements in energy efficiency, reduced emissions and increased productivity can be achieved in many industrial processes with ceramic composites if the reaction temperature and pressure are increased. Ceramic composites offer the potential to meet these material requirements in a variety of industrial applications. However, their use is often restricted by high cost. The Chemical Vapor composite, CVC, process can reduce the high costs and multiple fabrication steps presently required for ceramic fabrication. CVC deposition has the potential to eliminate many difficult processing problems and greatly increase fabrication rates for composites. With CVC, the manufacturing process can control the composites` density, microstructure and composition during growth. The CVC process: can grow or deposit material 100 times faster than conventional techniques; does not require an expensive woven preform to infiltrate; can use high modulus fibers that cannot be woven into a preform; can deposit composites to tolerances of less than 0.025 mm on one surface without further machining.

  4. Growth of graphene underlayers by chemical vapor deposition

    SciTech Connect (OSTI)

    Fabiane, Mopeli; Khamlich, Saleh; Bello, Abdulhakeem; Dangbegnon, Julien; Momodu, Damilola; Manyala, Ncholu, E-mail: ncholu.manyala@up.ac.za [Department of Physics, Institute of Applied Materials, SARChI Chair in Carbon Technology and Materials, University of Pretoria, Pretoria 0028 (South Africa)] [Department of Physics, Institute of Applied Materials, SARChI Chair in Carbon Technology and Materials, University of Pretoria, Pretoria 0028 (South Africa); Charlie Johnson, A. T. [Department of Physics and Astronomy, University of Pennsylvania, Philadelphia, Pennsylvania 19104 (United States)] [Department of Physics and Astronomy, University of Pennsylvania, Philadelphia, Pennsylvania 19104 (United States)

    2013-11-15T23:59:59.000Z

    We present a simple and very convincing approach to visualizing that subsequent layers of graphene grow between the existing monolayer graphene and the copper catalyst in chemical vapor deposition (CVD). Graphene samples were grown by CVD and then transferred onto glass substrates by the bubbling method in two ways, either direct-transfer (DT) to yield poly (methyl methacrylate) (PMMA)/graphene/glass or (2) inverted transfer (IT) to yield graphene/PMMA/glass. Field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM) were used to reveal surface features for both the DT and IT samples. The results from FE-SEM and AFM topographic analyses of the surfaces revealed the underlayer growth of subsequent layers. The subsequent layers in the IT samples are visualized as 3D structures, where the smaller graphene layers lie above the larger layers stacked in a concentric manner. The results support the formation of the so-called “inverted wedding cake” stacking in multilayer graphene growth.

  5. Optical properties of chemical-vapor-deposited diamond films

    SciTech Connect (OSTI)

    Bi, X.X.; Eklund, P.C.; Zhang, J.G.; Rao, A.M. (Department of Physics and Astronomy, University of Kentucky, Lexington, KY (USA)); Perry, T.A.; Beetz, C.P. Jr. (Physics Department, General Motors Research Laboratory, Warren, MI (USA))

    1990-04-01T23:59:59.000Z

    Results of room-temperature optical studies on {similar to}10 micron thick, free-standing diamond films are reported. The films were grown on Si(100) substrates by hot filament-assisted chemical vapor deposition (CVD) from a methane/hydrogen mixture. The as-grown, free surface of the films exhibited a surface roughness of scale {sigma}{similar to}0.2 to 5 microns, depending on the methane/hydrogen mixture, which introduces significant optical scattering loss for frequencies greater than 0.5 eV. Specular reflection and transmission spectra in the range 0.01--10 eV were collected. Below the threshold for interband adsorption near {similar to}5 eV, the films studied behaved approximately as thin parallel plates of refractive index 2.4, with the rough free surface leading to increasingly larger loss of specular transmission/reflection with decreasing wavelength. Structure in the mid-infrared transmission spectra was observed and attributed to disorder-induced one-phonon absorption, intrinsic multi-phonon absorption, and infrared active --C--H{sub 2} stretching modes. The strength of the C--H band was observed to increase with increasing methane pressure in the growth chamber. At 5.3 eV, the onset of interband absorption was observed, in good agreement with the value of the indirect bandgap in type IIa (intrinsic) diamond.

  6. Aerosol chemical vapor deposition of metal oxide films

    DOE Patents [OSTI]

    Ott, Kevin C. (4745 Trinity Dr., Los Alamos, NM 87544); Kodas, Toivo T. (5200 Noreen Dr. NE., Albuquerque, NM 87111)

    1994-01-01T23:59:59.000Z

    A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said FIELD OF THE INVENTION The present invention relates to the field of film coating deposition techniques, and more particularly to the deposition of multicomponent metal oxide films by aerosol chemical vapor deposition. This invention is the result of a contract with the Department of Energy (Contract No. W-7405-ENG-36).

  7. Properties of chemical vapor infiltration diamond deposited in a diamond powder matrix

    SciTech Connect (OSTI)

    Panitz, J.K.G.; Tallant, D.R.; Hills, C.R.; Staley, D.J.

    1993-12-31T23:59:59.000Z

    Densifying non-mined diamond powder precursors with diamond produced by chemical vapor infiltration (CVI) is an attractive approach for forming thick diamond deposits that avoids many potential manufacturability problems associated with predominantly chemical vapor deposition (CVD) processes. The authors have developed two techniques: electrophoretic deposition and screen printing, to form nonmined diamond powder precursors on substrates. They then densify these precursors in a hot filament assisted reactor. Analysis indicated that a hot filament assisted chemical vapor infiltration process forms intergranular diamond deposits with properties that are to some degree different from predominantly hot-filament-assisted CVD material.

  8. OPTIMAL DESIGN OF A HIGH PRESSURE ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION REACTOR

    E-Print Network [OSTI]

    OPTIMAL DESIGN OF A HIGH PRESSURE ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION REACTOR K.J. BACHMANN vapor deposition (HPOMCVD) reactor for use in thin film crystal growth. The advantages of such a reactor decomposition pressures and increased control over local stoichiometry and defect formation. While we focus here

  9. Low Temperature Chemical Vapor Deposition of Zirconium Nitride in a Fluidized Bed 

    E-Print Network [OSTI]

    Arrieta, Marie

    2012-10-19T23:59:59.000Z

    The objective of this research was to design, assemble, and demonstrate the initial performance of a fluidized bed chemical vapor deposition (FB-CVD) system capable of producing thin, uniform zirconium nitride (ZrN) coatings (1 to 10 micrometers...

  10. Bilayer graphene growth by low pressure chemical vapor deposition on copper foil

    E-Print Network [OSTI]

    Fang, Wenjing, S.M. Massachusetts Institute of Technology

    2012-01-01T23:59:59.000Z

    Successfully integrating graphene in standard processes for applications in electronics relies on the synthesis of high-quality films. In this work we study Low Pressure Chemical Vapor Deposition (LPCVD) growth of bilayer ...

  11. Initiated chemical vapor deposition of polymeric thin films : mechanism and applications

    E-Print Network [OSTI]

    Chan, Kelvin, Ph. D. Massachusetts Institute of Technology

    2005-01-01T23:59:59.000Z

    Initiated chemical vapor deposition (iCVD) is a novel technique for depositing polymeric thin films. It is able to deposit thin films of application-specific polymers in one step without using any solvents. Its uniqueness ...

  12. Single- and few-layer graphene by ambient pressure chemical vapor deposition on nickel

    E-Print Network [OSTI]

    Reina Ceeco, Alfonso

    2010-01-01T23:59:59.000Z

    An ambient pressure chemical vapor deposition (APCVD) process is used to fabricate graphene based films consisting of one to several graphene layers across their area. Polycrystalline Ni thin films are used and the graphene ...

  13. Oxidative chemical vapor deposition of conductive polymers for use in novel photovoltaic device architectures

    E-Print Network [OSTI]

    Howden, Rachel M. (Rachel Mary)

    2013-01-01T23:59:59.000Z

    The conductive polymer poly(3,4-ethylenedioxythiophene), (PEDOT), deposited via oxidative chemical vapor deposition (oCVD) has been investigated for use in organic electronic devices. The oCVD process as well as the ...

  14. Metal film deposition by laser breakdown chemical vapor deposition

    SciTech Connect (OSTI)

    Jervis, T.R.

    1985-01-01T23:59:59.000Z

    Dielectric breakdown of gas mixtures can be used to deposit homogeneous thin films by chemical vapor deposition with appropriate control of flow and pressure conditions to suppress gas phase nucleation and particle formation. Using a pulsed CO/sub 2/ laser operating at 10.6 microns where there is no significant resonant absorption in any of the source gases, we have succeeded in depositing homogeneous films from several gas phase precursors by gas phase laser pyrolysis. Nickel and molybdenum from the respective carbonyls and tungsten from the hexafluoride have been examined to date. In each case the gas precursor is buffered to reduce the partial pressure of the reactants and to induce breakdown. The films are spectrally reflective and uniform over a large area. Films have been characterized by Auger electron spectroscopy, x-ray diffraction, pull tests, and resistivity measurements. The highest quality films have resulted from the nickel depositions. Detailed x-ray diffraction analysis of these films yields a very small domain size (approx. 50 A) consistent with rapid quenching from the gas phase reaction zone. This analysis also shows nickel carbide formation consistent with the temperature of the reaction zone and the Auger electron spectroscopy results which show some carbon and oxygen incorporation (8% and 1% respectively). Gas phase transport and condensation of the molybdenum carbonyl results in substantial carbon and oxygen contamination of the molybdenum films requiring heated substrates, a requirement not consistent with the goals of the program to maximize the quench rate of the deposition. Results from tungsten deposition experiments representing a reduction chemistry instead of the decomposition chemistry involved in the carbonyl experiments are also reported.

  15. Ge incorporation inside 4H-SiC during Homoepitaxial growth by chemical vapor

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    1 Ge incorporation inside 4H-SiC during Homoepitaxial growth by chemical vapor deposition. Kassem Ilmenau (Germany) Abstract. In this work, we report on the addition of GeH4 gas during homoepitaxial growth of 4H-SiC by chemical vapour deposition. Ge introduction does not affect dramatically the surface

  16. Multiplexed mass spectrometry for real-time sensing in a spatially programmable chemical vapor deposition reactor

    E-Print Network [OSTI]

    Rubloff, Gary W.

    deposition reactor Yuhong Cai, Laurent Henn-Lecordier, and Gary W. Rubloffa Department of Materials Science locations in a spatially programmable chemical vapor deposition SP-CVD reactor prototype, where such chemical sensing is essential to achieve the benefits of a new paradigm for reactor design. The spatially

  17. Solar-induced chemical vapor deposition of diamond-type carbon films

    DOE Patents [OSTI]

    Pitts, J.R.; Tracy, C.E.; King, D.E.; Stanley, J.T.

    1994-09-13T23:59:59.000Z

    An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.

  18. Methyl isocyanate liquid and vapor permeation through selected respirator diaphragms and chemical protective clothing

    SciTech Connect (OSTI)

    Berardinelli, S.P.; Moyer, E.S.

    1987-04-01T23:59:59.000Z

    Initially, a study was undertaken to evaluate selected chemical protective clothing suitable for use by emergency response personnel confronted with methyl isocyanate (MIC). Twenty-two chemical protective clothing materials were tested against liquid methyl isocyanate. Chemical permeation breakthrough times for these clothing materials demonstrate that only one of these garments can be considered as a candidate material against liquid MIC. In a subsequent study, three chemical protective clothing materials were evaluated against approximately 800 ppm MIC vapor. Chemical permeation breakthrough times demonstrate that these materials can be considered candidate materials. A final study tested self-contained breathing apparatus (SCBA) diaphragms. Four SCBA diaphragms were tested and all experienced rapid breakthrough when exposed to liquid MIC. Next, three SCBA diaphragms were exposed to approximately 800 ppm MIC vapor. The data demonstrate that the SCBA should be worn inside a total encapsulating suit.

  19. A Multiscale Simulator for Low Pressure Chemical Vapor Deposition

    E-Print Network [OSTI]

    Advanced Custom Technologies, Motorola, Inc., Mail Drop M350, 2200 W. Broadway Rd., Mesa, AZ 85202 Timothy that govern the species and energy transport with chemical reactions throughout the reactor chamber, and (2

  20. A Multiscale Simulator for Low Pressure Chemical Vapor Deposition

    E-Print Network [OSTI]

    Advanced Custom Technologies, Motorola, Inc., Mail Drop M350, 2200 W. Broadway Rd., Mesa, AZ 85202 Timothy the equations that govern the species and energy transport with chemical reactions throughout the reactor

  1. Evaluation of Chemical Warfare Agent Percutaneous Vapor Toxicity: Derivation of Toxicity Guidelines for Assessing Chemical Protective Ensembles.

    SciTech Connect (OSTI)

    Watson, A.P.

    2003-07-24T23:59:59.000Z

    Percutaneous vapor toxicity guidelines are provided for assessment and selection of chemical protective ensembles (CPEs) to be used by civilian and military first responders operating in a chemical warfare agent vapor environment. The agents evaluated include the G-series and VX nerve agents, the vesicant sulfur mustard (agent HD) and, to a lesser extent, the vesicant Lewisite (agent L). The focus of this evaluation is percutaneous vapor permeation of CPEs and the resulting skin absorption, as inhalation and ocular exposures are assumed to be largely eliminated through use of SCBA and full-face protective masks. Selection of appropriately protective CPE designs and materials incorporates a variety of test parameters to ensure operability, practicality, and adequacy. One aspect of adequacy assessment should be based on systems tests, which focus on effective protection of the most vulnerable body regions (e.g., the groin area), as identified in this analysis. The toxicity range of agent-specific cumulative exposures (Cts) derived in this analysis can be used as decision guidelines for CPE acceptance, in conjunction with weighting consideration towards more susceptible body regions. This toxicity range is bounded by the percutaneous vapor estimated minimal effect (EME{sub pv}) Ct (as the lower end) and the 1% population threshold effect (ECt{sub 01}) estimate. Assumptions of exposure duration used in CPE certification should consider that each agent-specific percutaneous vapor cumulative exposure Ct for a given endpoint is a constant for exposure durations between 30 min and 2 hours.

  2. Method and apparatus for detection of chemical vapors

    DOE Patents [OSTI]

    Mahurin, Shannon Mark (Knoxville, TN); Dai, Sheng (Knoxville, TN); Caja, Josip (Knoxville, TN)

    2007-05-15T23:59:59.000Z

    The present invention is a gas detector and method for using the gas detector for detecting and identifying volatile organic and/or volatile inorganic substances present in unknown vapors in an environment. The gas detector comprises a sensing means and a detecting means for detecting electrical capacitance variance of the sensing means and for further identifying the volatile organic and volatile inorganic substances. The sensing means comprises at least one sensing unit and a sensing material allocated therein the sensing unit. The sensing material is an ionic liquid which is exposed to the environment and is capable of dissolving a quantity of said volatile substance upon exposure thereto. The sensing means constitutes an electrochemical capacitor and the detecting means is in electrical communication with the sensing means.

  3. Diamond growth on WC-Co substrates by hot filament chemical vapor deposition: Effect of filamentsubstrate separation

    E-Print Network [OSTI]

    Bristol, University of

    Polycrystalline diamond films have been grown by hot filament (HF) chemical vapor deposition on WC-Co bar is an established technique for growing hard, wear- resistant polycrystalline diamond films on a range of substratesDiamond growth on WC-Co substrates by hot filament chemical vapor deposition: Effect of filament

  4. Semi-insulating crystalline silicon formed by oxygen doping during low-temperature chemical vapor deposition

    E-Print Network [OSTI]

    Semi-insulating crystalline silicon formed by oxygen doping during low-temperature chemical vapor) In this letter we demonstrate the use of oxygen as a dopant in silicon to create semi-insulating, crystalline of the films exhibit classical characteristics of space-charge-limited current associated with insulators

  5. Cobalt Ultrathin Film Catalyzed Ethanol Chemical Vapor Deposition of Single-Walled Carbon Nanotubes

    E-Print Network [OSTI]

    Hone, James

    Cobalt Ultrathin Film Catalyzed Ethanol Chemical Vapor Deposition of Single-Walled Carbon Nanotubes (SWNTs) using a cobalt ultrathin film (1 nm) as the catalyst and ethanol as carbon feedstock flow during the growth. The trace amount of self-contained water (0.2-5 wt %) in ethanol may act

  6. Development of a spatially controllable chemical vapor deposition reactor with combinatorial processing capabilities

    E-Print Network [OSTI]

    Rubloff, Gary W.

    Development of a spatially controllable chemical vapor deposition reactor with combinatorial these limitations, a novel CVD reactor system has been developed that can explicitly control the spatial profile flexibility, we introduced a new CVD reactor concept that enables control of film deposition characteristics

  7. Field emission properties of phosphorus doped microwave plasma chemical vapor deposition diamond films by ion implantation

    E-Print Network [OSTI]

    Lee, Jong Duk

    2002; published 5 February 2003 Phosphorus doped polycrystalline diamond films were grown using ion the electrical char- acteristics of diamond FEAs to lower the operating voltage. Polycrystalline diamond hasField emission properties of phosphorus doped microwave plasma chemical vapor deposition diamond

  8. Chemical Vapor Deposition-Derived Graphene with Electrical Performance of Exfoliated Graphene

    E-Print Network [OSTI]

    Hone, James

    Chemical Vapor Deposition-Derived Graphene with Electrical Performance of Exfoliated Graphene a scalable method to produce large-area graphene, CVD-grown graphene has heretofore exhibited inferior of CVD-grown graphene in which two important sources of disorder, namely grain boundaries and processing

  9. Synthesis of high-quality monolayer and bilayer graphene on copper using chemical vapor deposition

    E-Print Network [OSTI]

    exfoliation of graphite [1], sublimation of epitaxial SiC [4], and catalyst-assisted chemical vapor deposition (CVD) [5­9]. However, mechanical exfoliation of graphite can only supply small-size graphene (see Fig than that of graphene obtained via exfoli- ation of graphite as summarized in Fig. 1. While many

  10. Atmospheric pressure chemical vapor deposition of TiN from tetrakis(dimethylamido)titanium and ammonia

    E-Print Network [OSTI]

    of titanium in a nitrogen atmosphere forms TiN with only a slight dependence on substrate temperatureAtmospheric pressure chemical vapor deposition of TiN from tetrakis(dimethylamido)titanium, Massachusetts 02138 (Received 15 December 1994; accepted 28 October 1995) Near stoichiometric titanium nitride

  11. Low temperature junction growth using hot-wire chemical vapor deposition

    DOE Patents [OSTI]

    Wang, Qi; Page, Matthew; Iwaniczko, Eugene; Wang, Tihu; Yan, Yanfa

    2014-02-04T23:59:59.000Z

    A system and a process for forming a semi-conductor device, and solar cells (10) formed thereby. The process includes preparing a substrate (12) for deposition of a junction layer (14); forming the junction layer (14) on the substrate (12) using hot wire chemical vapor deposition; and, finishing the semi-conductor device.

  12. Z .Thin Solid Films 392 2001 231 235 Atmospheric pressure chemical vapor deposition of

    E-Print Network [OSTI]

    of electrochromic tungsten oxide films Roy G. Gordona,U , Sean Barryb , Jeffrey T. Bartona , Randy N.R. Broomhall oxide, WO , is a coloring layer commonly used in electrochromic windows and displays. Successful: Chemical vapor deposition; Tungsten; Oxides; Electrochromism 1. Introduction Tungsten oxide is a key

  13. Chemical vapor deposition of W-Si-N and W-B-N

    DOE Patents [OSTI]

    Fleming, James G. (Albuquerque, NM); Roherty-Osmun, Elizabeth Lynn (Albuquerque, NM); Smith, Paul M. (Albuquerque, NM); Custer, Jonathan S. (Albuquerque, NM); Jones, Ronald V. (Albuquerque, NM); Nicolet, Marc-A. (Pasadena, CA); Madar, Roland (Eybens, FR); Bernard, Claude (Brie et Angonnes, FR)

    1999-01-01T23:59:59.000Z

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF.sub.6, either silicon or boron, and nitrogen. The result is a W--Si--N or W--B--N thin film useful for diffusion barrier and micromachining applications.

  14. Chemical vapor deposition of W-Si-N and W-B-N

    DOE Patents [OSTI]

    Fleming, J.G.; Roherty-Osmun, E.L.; Smith, P.M.; Custer, J.S.; Jones, R.V.; Nicolet, M.; Madar, R.; Bernard, C.

    1999-06-29T23:59:59.000Z

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF[sub 6], either silicon or boron, and nitrogen. The result is a W-Si-N or W-B-N thin film useful for diffusion barrier and micromachining applications. 10 figs.

  15. Chem. Mater. 1995, 7, 2269-2272 2269 Water Vapor Adsorption on Chemically Treated

    E-Print Network [OSTI]

    Cal, Mark P.

    Chem. Mater. 1995, 7, 2269-2272 2269 Water Vapor Adsorption on Chemically Treated Activated Carbon treated cloths exhibit high adsorption capacities for water (0.5-0.67 m u g of fiber) and 100% desorption upon heating to 100 "C. The untreated and treated ACCBO samples exhibited no degradation upon heating

  16. Initiated chemical vapor deposition of fluoropolymer coatings for the surface modification of complex geometries

    E-Print Network [OSTI]

    Gupta, Malancha, 1980-

    2007-01-01T23:59:59.000Z

    Initiated chemical vapor deposition (iCVD) is a one-step, soventless process that can be used to produce polymeric thin films. The iCVD technique has been used to polymerize a wide variety of vinyl monomers such as glycidyl ...

  17. Molecular orbital studies of titanium nitride chemical vapor deposition: gas phase b-elimination

    E-Print Network [OSTI]

    Schlegel, H. Bernhard

    Molecular orbital studies of titanium nitride chemical vapor deposition: gas phase b) of titanium nitride can be carried out using TiNR24 and NH3 (R Me or Et). Imido compounds are thought. Ó 2001 Pub- lished by Elsevier Science B.V. 1. Introduction It is well known that titanium nitride

  18. Epitaxial graphene prepared by chemical vapor deposition on single crystal thin iridium films on sapphire

    E-Print Network [OSTI]

    Boyer, Edmond

    Epitaxial graphene prepared by chemical vapor deposition on single crystal thin iridium films Cedex 9, France (Dated: 15 March 2011) Uniform single layer graphene was grown on single-crystal Ir. These graphene layers have a single crystallographic orientation and a very low density of defects, as shown

  19. Simulation of chemical vapor infiltration and deposition based on 3D images: a local scale approach

    E-Print Network [OSTI]

    Boyer, Edmond

    infiltration of ceramic matrix composites is presented. This computational model requires a 3D representation/reaction problems; Random walks; 3D image-based modeling 1. Introduction Ceramic Matrix Composites and Carbon with a matrix. One of the most efficient ones is Chemical Vapor Infiltration (CVI), by which gaseous precursors

  20. Robust Numerical Simulation of Porosity Evolution in Chemical Vapor In ltration II: Two Dimensional

    E-Print Network [OSTI]

    Jin, Shi

    -solid reactions with solid deposition are exempli#12;ed by the fabrication of ceramic matrix composites through #3) process, during which a matrix of ceramic #12;bers is chemically vapor deposited within a porous preform practical approach to fabricate ceramic composites. Among these composites, #12;ber-reinforced composites

  1. Self-Limiting Chemical Vapor Deposition Growth of Monolayer Graphene from Ethanol

    E-Print Network [OSTI]

    Maruyama, Shigeo

    1 Self-Limiting Chemical Vapor Deposition Growth of Monolayer Graphene from Ethanol Pei Zhao, and systematically investigate the growth of graphene from ethanol and compare its self-limiting behavior over copper facets with different identities. Results show that the growth of graphene from ethanol in the LPCVD

  2. Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition

    E-Print Network [OSTI]

    Bristol, University of

    chemical vapor deposition of polycrystalline diamond. Several tracer species are monitored in order to gain used for diamond chemical vapor deposition Jie Ma,1 Michael N. R. Ashfold,1,a and Yuri A. Mankelevich2 spectroscopic methods used to diagnose microwave MW plasmas used for diamond chemical vapor deposition CVD . Zhu

  3. In situ X-ray investigation of changing barrier growth temperatures on InGaN single quantum wells in metal-organic vapor phase epitaxy

    SciTech Connect (OSTI)

    Ju, Guangxu, E-mail: g-ju@nuee.nagoya-u.ac.jp; Honda, Yoshio [Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603 (Japan); Tabuchi, Masao [Synchrotron Radiation Research Centre, Nagoya University, Nagoya, Aichi 464-8603 (Japan); Takeda, Yoshikazu [Synchrotron Radiation Center, Aichi Science and Technology Foundation, Seto, Aichi 489-0965 (Japan); Nagoya Industrial Science Research Institute, Nagoya, Aichi 464-0819 (Japan); Amano, Hiroshi [Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603 (Japan); Akasaki Research Center, Nagoya University, Aichi 464-8603 (Japan)

    2014-03-07T23:59:59.000Z

    The effects of GaN quantum barriers with changing growth temperatures on the interfacial characteristics of GaN/InGaN single quantum well (SQW) grown on GaN templates by metalorganic vapour phase epitaxy were in situ investigated by X-ray crystal truncation rod (CTR) scattering and X-ray reflectivity measurements at growth temperature using a laboratory level X-ray diffractometer. Comparing the curve-fitting results of X-ray CTR scattering spectra obtained at growth temperature with that at room temperature, the In{sub x}Ga{sub 1-x}N with indium composition less than 0.11 was stabile of the indium distribution at the interface during the whole growth processes. By using several monolayers thickness GaN capping layer to protect the InGaN well layer within temperature-ramping process, the interfacial structure of the GaN/InGaN SQW was drastically improved on the basis of the curve-fitting results of X-ray CTR scattering spectra, and the narrow full width at half-maximum and strong luminous intensity were observed in room temperature photoluminescence spectra.

  4. Blueshift of optical band gap in ZnO thin films grown by metal-organic chemical-vapor deposition

    E-Print Network [OSTI]

    . INTRODUCTION Zinc oxide ZnO is a wide direct band-gap 3.37 eV semiconductor with a broad range of applications. Dimethylzinc DMZn , N2 gas, and high-purity O2 were used as the zinc source, carrier gas, and oxidizing agent including light-emitting devices,1 varistors,2 solar cells,3 and gas sensors.4 Moreover, ZnO is a promising

  5. Epitaxial growth of BaTiO3 thin films at 600 C by metalorganic chemical vapor deposition

    E-Print Network [OSTI]

    Wang, Zhong L.

    with an a-axis perpendicular to the substrate plane. Nanoscale energy dispersive x-ray spectrometry processes include deposition over large areas, high throughput, and uniform coverage of nonplanar shapes by a plasma-enhanced MOCVD pro- cess. It is not known if the added energy from the plasma generates structural

  6. The Growth of InGaAsN for High Efficiency Solar Cells by Metalorganic Chemical Vapor Deposition

    SciTech Connect (OSTI)

    ALLERMAN,ANDREW A.; BANKS,JAMES C.; GEE,JAMES M.; JONES,ERIC D.; KURTZ,STEVEN R.

    1999-09-16T23:59:59.000Z

    InGaAsN alloys are a promising material for increasing the efficiency of multi-junction solar cells now used for satellite power systems. However, the growth of these dilute N containing alloys has been challenging with further improvements in material quality needed before the solar cell higher efficiencies are realized. Nitrogen/V ratios exceeding 0.981 resulted in lower N incorporation and poor surface morphologies. The growth rate was found to depend on not only the total group III transport for a fixed N/V ratio but also on the N/V ratio. Carbon tetrachloride and dimethylzinc were effective for p-type doping. Disilane was not an effective n-type dopant while SiCl4 did result in n-type material but only a narrow range of electron concentrations (2-5e17cm{sup -3}) were achieved.

  7. Defect dissolution in strain-compensated stacked InAs/GaAs quantum dots grown by metalorganic chemical vapor deposition

    E-Print Network [OSTI]

    New Mexico, University of

    reported MOCVD-grown stacked QD lasers near 1.3 m. Kim et al.9 has achieved lasing at =1.28 m by using InAs/InGaP QDs clad by InGaP layers. Our group has previously demonstrated10 a thin GaP a0=-3.8% tensile layer

  8. Proposed Occupational Exposure Limits for Non-Carcinogenic Hanford Waste Tank Vapor Chemicals

    SciTech Connect (OSTI)

    Poet, Torka S.; Timchalk, Chuck

    2006-03-24T23:59:59.000Z

    A large number of volatile chemicals have been identified in the headspaces of tanks used to store mixed chemical and radioactive waste at the U.S. Department of Energy (DOE) Hanford Site, and there is concern that vapor releases from the tanks may be hazardous to workers. Contractually established occupational exposure limits (OELs) established by the Occupational Safety and Health Administration (OSHA) and American Conference of Governmental Industrial Hygienists (ACGIH) do not exist for all chemicals of interest. To address the need for worker exposure guidelines for those chemicals that lack OSHA or ACGIH OELs, a procedure for assigning Acceptable Occupational Exposure Limits (AOELs) for Hanford Site tank farm workers has been developed and applied to a selected group of 57 headspace chemicals.

  9. Development of Single Crystal Chemical Vapor Deposition Diamonds for Detector Applications

    SciTech Connect (OSTI)

    Rainer Wallny

    2012-10-15T23:59:59.000Z

    Diamond was studied as a possible radiation hard technology for use in future high radiation environments. With the commissioning of the LHC expected in 2010, and the LHC upgrades expected in 2015, all LHC experiments are planning for detector upgrades which require radiation hard technologies. Chemical Vapor Deposition (CVD) diamond has now been used extensively in beam conditions monitors as the innermost detectors in the highest radiation areas of BaBar, Belle and CDF and is installed and operational in all LHC experiments. As a result, this material is now being discussed as an alternative sensor material for tracking very close to the interaction region of the super-LHC where the most extreme radiation conditions will exist. Our work addressed the further development of the new material, single-crystal Chemical Vapor Deposition diamond, towards reliable industrial production of large pieces and new geometries needed for detector applications.

  10. Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition

    DOE Patents [OSTI]

    Lackey, Jr., Walter J. (Oak Ridge, TN); Caputo, Anthony J. (Knoxville, TN)

    1986-01-01T23:59:59.000Z

    A chemical vapor deposition (CVD) process for preparing fiber-reinforced ceramic composites. A specially designed apparatus provides a steep thermal gradient across the thickness of a fibrous preform. A flow of gaseous ceramic matrix material is directed into the fibrous preform at the cold surface. The deposition of the matrix occurs progressively from the hot surface of the fibrous preform toward the cold surface. Such deposition prevents the surface of the fibrous preform from becoming plugged. As a result thereof, the flow of reactant matrix gases into the uninfiltrated (undeposited) portion of the fibrous preform occurs throughout the deposition process. The progressive and continuous deposition of ceramic matrix within the fibrous preform provides for a significant reduction in process time over known chemical vapor deposition processes.

  11. The development of chemically vapor deposited mullite coatings for the corrosion protection of SiC

    SciTech Connect (OSTI)

    Auger, M.; Hou, P.; Sengupta, A.; Basu, S.; Sarin, V. [Boston Univ., MA (United States)

    1998-05-01T23:59:59.000Z

    Crystalline mullite coatings have been chemically vapor deposited onto SiC substrates to enhance the corrosion and oxidation resistance of the substrate. Current research has been divided into three distinct areas: (1) Development of the deposition processing conditions for increased control over coating`s growth rate, microstructure, and morphology; (2) Analysis of the coating`s crystal structure and stability; (3) The corrosion resistance of the CVD mullite coating on SiC.

  12. Solar Energy Materials & Solar Cells 91 (2007) 924930 Plasma-enhanced chemical vapor deposition of zinc oxide at

    E-Print Network [OSTI]

    Hicks, Robert F.

    2007-01-01T23:59:59.000Z

    Solar Energy Materials & Solar Cells 91 (2007) 924­930 Plasma-enhanced chemical vapor deposition (CIGS) or plastic substrates [1,2,8]. In this paper, we report on the deposition of aluminum- doped zinc

  13. Low-temperature germanium ultra-high vacuum chemical vapor deposition for back-end photonic integration

    E-Print Network [OSTI]

    Kimerling, Lionel C.

    Polycrystalline germanium (poly-Ge) grown on amorphous Si (a-Si) by ultra-high vacuum chemical vapor deposition (UHVCVD) over oxide barriers at low temperatures (Tles450degC) exhibits a larger grain size and lower defect ...

  14. Continuous growth of single-wall carbon nanotubes using chemical vapor deposition

    DOE Patents [OSTI]

    Grigorian, Leonid (Raymond, OH); Hornyak, Louis (Evergreen, CO); Dillon, Anne C (Boulder, CO); Heben, Michael J (Denver, CO)

    2008-10-07T23:59:59.000Z

    The invention relates to a chemical vapor deposition process for the continuous growth of a carbon single-wall nanotube where a carbon-containing gas composition is contacted with a porous membrane and decomposed in the presence of a catalyst to grow single-wall carbon nanotube material. A pressure differential exists across the porous membrane such that the pressure on one side of the membrane is less than that on the other side of the membrane. The single-wall carbon nanotube growth may occur predominately on the low-pressure side of the membrane or, in a different embodiment of the invention, may occur predominately in between the catalyst and the membrane. The invention also relates to an apparatus used with the carbon vapor deposition process.

  15. Continuous growth of single-wall carbon nanotubes using chemical vapor deposition

    DOE Patents [OSTI]

    Grigorian, Leonid; Hornyak, Louis; Dillon, Anne C; Heben, Michael J

    2014-09-23T23:59:59.000Z

    The invention relates to a chemical vapor deposition process for the continuous growth of a carbon single-wall nanotube where a carbon-containing gas composition is contacted with a porous membrane and decomposed in the presence of a catalyst to grow single-wall carbon nanotube material. A pressure differential exists across the porous membrane such that the pressure on one side of the membrane is less than that on the other side of the membrane. The single-wall carbon nanotube growth may occur predominately on the low-pressure side of the membrane or, in a different embodiment of the invention, may occur predominately in between the catalyst and the membrane. The invention also relates to an apparatus used with the carbon vapor deposition process.

  16. Chemical vapor deposition techniques and related methods for manufacturing microminiature thermionic converters

    DOE Patents [OSTI]

    King, Donald B. (Albuquerque, NM); Sadwick, Laurence P. (Salt Lake City, UT); Wernsman, Bernard R. (Clairton, PA)

    2002-06-25T23:59:59.000Z

    Methods of manufacturing microminiature thermionic converters (MTCs) having high energy-conversion efficiencies and variable operating temperatures using MEMS manufacturing techniques including chemical vapor deposition. The MTCs made using the methods of the invention incorporate cathode to anode spacing of about 1 micron or less and use cathode and anode materials having work functions ranging from about 1 eV to about 3 eV. The MTCs also exhibit maximum efficiencies of just under 30%, and thousands of the devices can be fabricated at modest costs.

  17. Nextel{trademark}/SiC composites fabricated using forced chemical vapor infiltration

    SciTech Connect (OSTI)

    Weaver, B.L. [3M Co., St. Paul, MN (United States); Lowden, R.A.; McLaughlin, J.C.; Stinton, D.P.; Besmann, T.M.; Schwarz, O.J. [Oak Ridge National Lab., TN (United States)

    1993-06-01T23:59:59.000Z

    Oxide fiber-reinforced silicon carbide matrix composites were fabricated employing the forced-flow, thermal gradient chemical vapor infiltration (FCVI) process. Composites using Nextel{sup TM} fibers of varying composition were prepared to investigate the effectiveness of each Nextel{sup TM} fiber as a reinforcement for the given matrix. A carbon interface coating was used for the baseline materials, however, alternate interlayers with improved oxidation resistance were also explored Room-temperature flexure strengths of as-fabricated composites and specimens heated in air at 1273 K were measured and compared to results for other SiC-matrix composites.

  18. Tunneling characteristics in chemical vapor deposited graphene–hexagonal boron nitride–graphene junctions

    SciTech Connect (OSTI)

    Roy, T.; Hesabi, Z. R.; Joiner, C. A.; Vogel, E. M. [School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, Georgia 30332 (United States); Liu, L.; Gu, G. [Department of Electrical Engineering and Computer Science, University of Tennessee, 1520 Middle Drive, Knoxville, Tennessee 37996 (United States); Barrera, S. de la; Feenstra, R. M. [Department of Physics, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, Pennsylvania 15213 (United States); Chakrabarti, B. [School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, Georgia 30332 (United States); Department of Materials Science and Engineering, University of Texas at Dallas, 800 West Campbell Rd., Richardson, Texas 75080 (United States)

    2014-03-24T23:59:59.000Z

    Large area chemical vapor deposited graphene and hexagonal boron nitride was used to fabricate graphene–hexagonal boron nitride–graphene symmetric field effect transistors. Gate control of the tunneling characteristics is observed similar to previously reported results for exfoliated graphene–hexagonal boron nitride–graphene devices. Density-of-states features are observed in the tunneling characteristics of the devices, although without large resonant peaks that would arise from lateral momentum conservation. The lack of distinct resonant behavior is attributed to disorder in the devices, and a possible source of the disorder is discussed.

  19. Thermal conductivity of ultra-thin chemical vapor deposited hexagonal boron nitride films

    SciTech Connect (OSTI)

    Alam, M. T.; Haque, M. A., E-mail: mah37@psu.edu [Mechanical and Nuclear Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States); Bresnehan, M. S.; Robinson, J. A. [Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA and The Center for Two-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States)] [Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA and The Center for Two-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States)

    2014-01-06T23:59:59.000Z

    Thermal conductivity of freestanding 10?nm and 20?nm thick chemical vapor deposited hexagonal boron nitride films was measured using both steady state and transient techniques. The measured value for both thicknesses, about 100?±?10?W m{sup ?1} K{sup ?1}, is lower than the bulk basal plane value (390?W m{sup ?1} K{sup ?1}) due to the imperfections in the specimen microstructure. Impressively, this value is still 100 times higher than conventional dielectrics. Considering scalability and ease of integration, hexagonal boron nitride grown over large area is an excellent candidate for thermal management in two dimensional materials-based nanoelectronics.

  20. Improved process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition

    DOE Patents [OSTI]

    Lackey, W.J. Jr.; Caputo, A.J.

    1984-09-07T23:59:59.000Z

    A specially designed apparatus provides a steep thermal gradient across the thickness of fibrous preform. A flow of gaseous ceramic matrix material is directed into the fibrous preform at the cold surface. The deposition of the matrix occurs progressively from the hot surface of the fibrous preform toward the cold surface. Such deposition prevents the surface of the fibrous preform from becoming plugged. As a result thereof, the flow of reactant matrix gases into the uninfiltrated (undeposited) portion of the fibrous preform occurs throughout the deposition process. The progressive and continuous deposition of ceramic matrix within the fibrous preform provides for a significant reduction in process time over known chemical vapor deposition processes.

  1. III-nitride quantum cascade detector grown by metal organic chemical vapor deposition

    SciTech Connect (OSTI)

    Song, Yu, E-mail: yusong@princeton.edu; Huang, Tzu-Yung; Badami, Pranav; Gmachl, Claire [Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08540 (United States); Bhat, Rajaram; Zah, Chung-En [Corning Incorporated, Corning, New York 14831 (United States)

    2014-11-03T23:59:59.000Z

    Quantum cascade (QC) detectors in the GaN/Al{sub x}Ga{sub 1?x}N material system grown by metal organic chemical vapor deposition are designed, fabricated, and characterized. Only two material compositions, i.e., GaN as wells and Al{sub 0.5}Ga{sub 0.5}N as barriers are used in the active layers. The QC detectors operates around 4??m, with a peak responsivity of up to ?100??A/W and a detectivity of up to 10{sup 8} Jones at the background limited infrared performance temperature around 140?K.

  2. Chemical vapor deposited diamond-on-diamond powder composites (LDRD final report)

    SciTech Connect (OSTI)

    Panitz, J.K.; Hsu, W.L.; Tallant, D.R.; McMaster, M.; Fox, C.; Staley, D.

    1995-12-01T23:59:59.000Z

    Densifying non-mined diamond powder precursors with diamond produced by chemical vapor infiltration (CVI) is an attractive approach for forming thick diamond deposits that avoids many potential manufacturability problems associated with predominantly chemical vapor deposition (CVD) processes. The authors developed techniques for forming diamond powder precursors and densified these precursors in a hot filament-assisted reactor and a microwave plasma-assisted reactor. Densification conditions were varied following a fractional factorial statistical design. A number of conclusions can be drawn as a result of this study. High density diamond powder green bodies that contain a mixture of particle sizes solidify more readily than more porous diamond powder green bodies with narrow distributions of particle sizes. No composite was completely densified although all of the deposits were densified to some degree. The hot filament-assisted reactor deposited more material below the exterior surface, in the interior of the powder deposits; in contrast, the microwave-assisted reactor tended to deposit a CVD diamond skin over the top of the powder precursors which inhibited vapor phase diamond growth in the interior of the powder deposits. There were subtle variations in diamond quality as a function of the CVI process parameters. Diamond and glassy carbon tended to form at the exterior surface of the composites directly exposed to either the hot filament or the microwave plasma. However, in the interior, e.g. the powder/substrate interface, diamond plus diamond-like-carbon formed. All of the diamond composites produced were grey and relatively opaque because they contained flawed diamond, diamond-like-carbon and glassy carbon. A large amount of flawed and non-diamond material could be removed by post-CVI oxygen heat treatments. Heat treatments in oxygen changed the color of the composites to white.

  3. Development of Single Crystal Chemical Vapor Deposition Diamonds for Detector Applications

    SciTech Connect (OSTI)

    Kagan, Harris; Kass, Richard; Gan, K.K.

    2014-01-23T23:59:59.000Z

    With the LHC upgrades in 2013, and further LHC upgrades scheduled in 2018, most LHC experiments are planning for detector upgrades which require more radiation hard technologies than presently available. At present all LHC experiments now have some form of diamond detector. As a result Chemical Vapor Deposition (CVD) diamond has now been used extensively in beam conditions monitors as the innermost detectors in the highest radiation areas of all LHC experiments. Moreover CVD diamond is now being discussed as an alternative sensor material for tracking very close to the interaction region of the HL-LHC where the most extreme radiation conditions will exist. Our work addressed the further development of the new material, single-crystal Chemical Vapor Deposition diamond, towards reliable industrial production of large pieces and new geometries needed for detector applications. Our accomplishments include: • Developed a two U.S.companies to produce electronic grade diamond, • Worked with companies and acquired large area diamond pieces, • Performed radiation hardness tests using various proton energies: 70 MeV (Cyric, Japan), 800 MeV (Los Alamos), and 24 GeV (CERN).

  4. A study of heat transfer and particle motion relative to the modified chemical vapor deposition process

    SciTech Connect (OSTI)

    Choi, M.; Greif, R. (Univ. of California, Berkeley (United States)); Baum, H.R. (National Inst. of Standards and Technology, Gaithersburg, MD (United States))

    1989-11-01T23:59:59.000Z

    Heat transfer and particle motion relative to the modified chemical vapor deposition process have been studied for general values of the torch speed. Three-dimensional temperature fields have been obtained over the entire cross section of the tube and the effects of tube rotation and localized torch heating in the axial and circumferential directions have been studied. The particle trajectories have been calculated from a formulation that includes the contributions from forced flow, i.e., Poiseuille flow in the axial direction, rigid body rotation about the tube axis, and thermophoretic contributions in the axial, radial, and angular directions. The particle trajectories are helices and are shown to be strongly dependent on the tube rotation.

  5. Selective charge doping of chemical vapor deposition-grown graphene by interface modification

    SciTech Connect (OSTI)

    Wang, Shengnan, E-mail: wang.shengnan@lab.ntt.co.jp; Suzuki, Satoru; Furukawa, Kazuaki; Orofeo, Carlo M.; Takamura, Makoto; Hibino, Hiroki [NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198 (Japan)] [NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198 (Japan)

    2013-12-16T23:59:59.000Z

    The doping and scattering effect of substrate on the electronic properties of chemical vapor deposition (CVD)-grown graphene are revealed. Wet etching the underlying SiO{sub 2} of graphene and depositing self-assembled monolayers (SAMs) of organosilane between graphene and SiO{sub 2} are used to modify various substrates for CVD graphene transistors. Comparing with the bare SiO{sub 2} substrate, the carrier mobility of CVD graphene on modified substrate is enhanced by almost 5-fold; consistently the residual carrier concentration is reduced down to 10{sup 11}?cm{sup ?2}. Moreover, scalable and reliable p- and n-type graphene and graphene p-n junction are achieved on various silane SAMs with different functional groups.

  6. Carbon impurities on graphene synthesized by chemical vapor deposition on platinum

    SciTech Connect (OSTI)

    Ping, Jinglei; Fuhrer, Michael S., E-mail: michael.fuhrer@monash.edu [Center for Nanophysics and Advanced Materials, University of Maryland, College Park, Maryland 20742-4111, USA and School of Physics, Monash University, 3800 Victoria (Australia)

    2014-07-28T23:59:59.000Z

    We report nanocrystalline carbon impurities coexisting with graphene synthesized via chemical vapor deposition on platinum. For certain growth conditions, we observe micron-size island-like impurity layers which can be mistaken for second graphene layers in optical microscopy or scanning electron microscopy. The island orientation depends on the crystalline orientation of the Pt, as shown by electron backscatter diffraction, indicating growth of carbon at the platinum surface below graphene. Dark-field transmission electron microscopy indicates that in addition to uniform single-crystal graphene, our sample is decorated with nanocrystalline carbon impurities with a spatially inhomogeneous distribution. The impurity concentration can be reduced significantly by lowering the growth temperature. Raman spectra show a large D peak, however, electrical characterization shows high mobility (?8000?cm{sup 2}/Vs), indicating a limitation for Raman spectroscopy in characterizing the electronic quality of graphene.

  7. Growth of FePt encapsulated carbon nanotubes by thermal chemical vapor deposition

    SciTech Connect (OSTI)

    Fujiwara, Yuji, E-mail: fujiwara@phen.mie-u.ac.jp; Kaneko, Tetsuya; Hori, Kenta; Takase, Sho; Sato, Hideki; Maeda, Kohji; Kobayashi, Tadashi [Graduate School of Engineering, Mie University, Kurima-machiya-cho 1577, Tsu 514-8507 (Japan); Kato, Takeshi; Iwata, Satoshi [Department of Quantum Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8601 (Japan); Jimbo, Mutsuko [Department of Electrical and Electronic Engineering, Daido University, Takiharu-cho 10-3, Minami-ku, Nagoya 457-8530 (Japan)

    2014-03-15T23:59:59.000Z

    FePt encapsulated carbon nanotubes (CNTs) were grown by thermal chemical vapor deposition using an Fe/Pt bilayer catalyst. The CNTs were grown according to the base growth model. Selected area electron diffraction results revealed that the encapsulated particles were A1-FePt, L1{sub 0}-FePt, and Fe{sub 3}PtC. The crystal structures of particles found at the root parts of CNTs were not able to be identified, however. The layered structure of catalytic films seemed to be responsible for the difference in Pt content between particles found at tip and root parts of CNTs. Approximately 60% of CNTs grown at 800?°C had particles at their tip parts, compared to only 30% when the growth temperature was 700?°C, indicating that higher process temperatures promote particle encapsulation in CNTs.

  8. Carbon nanowalls grown by microwave plasma enhanced chemical vapor deposition during the carbonization of polyacrylonitrile fibers

    SciTech Connect (OSTI)

    Li Jiangling; Su Shi; Kundrat, Vojtech; Abbot, Andrew M.; Ye, Haitao [School of Engineering and Applied Science, Aston University, Birmingham B4 7ET (United Kingdom); Zhou Lei [Department of Metallurgy and Materials, University of Birmingham, Birmingham B15 2TT (United Kingdom); Mushtaq, Fajer [Department of Mechanical Engineering, ETH Zurich, Zurich 8092 (Switzerland); Ouyang Defang [School of Life and Health Science, Aston University, Birmingham B4 7ET (United Kingdom); James, David; Roberts, Darren [Thermo Fisher Scientific, Stafford House, Hemel Hempstead HP2 7GE (United Kingdom)

    2013-01-14T23:59:59.000Z

    We used microwave plasma enhanced chemical vapor deposition (MPECVD) to carbonize an electrospun polyacrylonitrile (PAN) precursor to form carbon fibers. Scanning electron microscopy, Raman spectroscopy, and Fourier transform infrared spectroscopy were used to characterize the fibers at different evolution stages. It was found that MPECVD-carbonized PAN fibers do not exhibit any significant change in the fiber diameter, whilst conventionally carbonized PAN fibers show a 33% reduction in the fiber diameter. An additional coating of carbon nanowalls (CNWs) was formed on the surface of the carbonized PAN fibers during the MPECVD process without the assistance of any metallic catalysts. The result presented here may have a potential to develop a novel, economical, and straightforward approach towards the mass production of carbon fibrous materials containing CNWs.

  9. Synthesis of multiferroic Er-Fe-O thin films by atomic layer and chemical vapor deposition

    SciTech Connect (OSTI)

    Mantovan, R., E-mail: roberto.mantovan@mdm.imm.cnr.it; Vangelista, S.; Wiemer, C.; Lamperti, A.; Tallarida, G. [Laboratorio MDM IMM-CNR, I-20864 Agrate Brianza (MB) (Italy); Chikoidze, E.; Dumont, Y. [GEMaC, Université de Versailles St. Quentin en Yvelines-CNRS, Versailles (France); Fanciulli, M. [Laboratorio MDM IMM-CNR, I-20864 Agrate Brianza (MB) (Italy); Dipartimento di Scienza dei Materiali, Università di Milano Bicocca, Milano (Italy)

    2014-05-07T23:59:59.000Z

    R-Fe-O (R?=?rare earth) compounds have recently attracted high interest as potential new multiferroic materials. Here, we report a method based on the solid-state reaction between Er{sub 2}O{sub 3} and Fe layers, respectively grown by atomic layer deposition and chemical vapor deposition, to synthesize Er-Fe-O thin films. The reaction is induced by thermal annealing and evolution of the formed phases is followed by in situ grazing incidence X-ray diffraction. Dominant ErFeO{sub 3} and ErFe{sub 2}O{sub 4} phases develop following subsequent thermal annealing processes at 850?°C in air and N{sub 2}. Structural, chemical, and morphological characterization of the layers are conducted through X-ray diffraction and reflectivity, time-of-flight secondary ion-mass spectrometry, and atomic force microscopy. Magnetic properties are evaluated by magnetic force microscopy, conversion electron Mössbauer spectroscopy, and vibrating sample magnetometer, being consistent with the presence of the phases identified by X-ray diffraction. Our results constitute a first step toward the use of cost-effective chemical methods for the synthesis of this class of multiferroic thin films.

  10. Thermoelectric properties of lattice-matched AlInN alloy grown by metal organic chemical vapor deposition

    E-Print Network [OSTI]

    Gilchrist, James F.

    Thermoelectric properties of lattice-matched AlInN alloy grown by metal organic chemical vapor Seebeck coefficient and resistance measurement system for thermoelectric materials in the thin disk geometry Rev. Sci. Instrum. 83, 025101 (2012) High-temperature thermoelectric properties of Cu1­xInTe2

  11. Massively parallel computation of 3D flow and reactions in chemical vapor deposition reactors

    SciTech Connect (OSTI)

    Salinger, A.G.; Shadid, J.N.; Hutchinson, S.A.; Hennigan, G.L.; Devine, K.D.; Moffat, H.K.

    1997-12-01T23:59:59.000Z

    Computer modeling of Chemical Vapor Deposition (CVD) reactors can greatly aid in the understanding, design, and optimization of these complex systems. Modeling is particularly attractive in these systems since the costs of experimentally evaluating many design alternatives can be prohibitively expensive, time consuming, and even dangerous, when working with toxic chemicals like Arsine (AsH{sub 3}): until now, predictive modeling has not been possible for most systems since the behavior is three-dimensional and governed by complex reaction mechanisms. In addition, CVD reactors often exhibit large thermal gradients, large changes in physical properties over regions of the domain, and significant thermal diffusion for gas mixtures with widely varying molecular weights. As a result, significant simplifications in the models have been made which erode the accuracy of the models` predictions. In this paper, the authors will demonstrate how the vast computational resources of massively parallel computers can be exploited to make possible the analysis of models that include coupled fluid flow and detailed chemistry in three-dimensional domains. For the most part, models have either simplified the reaction mechanisms and concentrated on the fluid flow, or have simplified the fluid flow and concentrated on rigorous reactions. An important CVD research thrust has been in detailed modeling of fluid flow and heat transfer in the reactor vessel, treating transport and reaction of chemical species either very simply or as a totally decoupled problem. Using the analogy between heat transfer and mass transfer, and the fact that deposition is often diffusion limited, much can be learned from these calculations; however, the effects of thermal diffusion, the change in physical properties with composition, and the incorporation of surface reaction mechanisms are not included in this model, nor can transitions to three-dimensional flows be detected.

  12. Synthesis and Hydrogen Sorption Properties of Carborane Based Metal-Organic Framework Materials

    E-Print Network [OSTI]

    Synthesis and Hydrogen Sorption Properties of Carborane Based Metal-Organic Framework Materials@northwestern.edu Tailorable inorganic coordination polymers,1-7 in particular, metal-organic frameworks (MOFs)2-7 comprise an important emerging class of materials. They are noteworthy for their structural and chemical diversity, high

  13. Reactor design for uniform chemical vapor deposition-grown films without substrate rotation

    SciTech Connect (OSTI)

    Wanlass, M.

    1987-03-17T23:59:59.000Z

    A reactor vessel is described for chemical vapor deposition of a uniform semiconductor film on a substrate, comprising: a generally cylindrical reaction chamber for receiving a substrate and a flow of reaction gas capable of depositing a film on the substrate under the conditions of the chamber, the chamber having upper and lower portion and being oriented about a vertical axis; a supporting means having a substrate support surface generally perpendicular to the vertical axis for carrying the substrate within the lower portion of the reaction chamber in a predetermined relative position with respect to the upper portion of the reaction chamber, the upper portion including a cylindrically shaped confinement chamber. The confinement chamber has a smaller diameter than the lower portion of the reaction chamber and is positioned above the substrate support surface; and a means for introducing a reaction gas into the confinement chamber in a nonaxial direction so as to direct the reaction gas into the lower portion of the reaction chamber with a non-axial flow having a rotational component with respect to the vertical axis. In this way the reaction gas defines an inward vortex flow pattern with respect to the substrate surface.

  14. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Santra, T. S.; Liu, C. H. [Institute of Nanoengineering and Microsystems (NEMS), National Tsing Hua University, Hsinchu, Taiwan 30043 (China); Bhattacharyya, T. K. [Department of Electronics and Electrical Communication Engineering, Indian Institute of Technology, Kharagpur 721302, West Bengal (India); Patel, P. [Department of Electrical and Computer Engineering, University of Illinois at Urbana Champaign, Urbana, Illinois 61801 (United States); Barik, T. K. [School of Applied Sciences, Haldia Institute of Technology, Haldia 721657, Purba Medinipur, West Bengal (India)

    2010-06-15T23:59:59.000Z

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of C-C, C-H, Si-C, and Si-H bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio I{sub D}/I{sub G}. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  15. Preparation of amorphous electrochromic tungsten oxide and molybdenum oxide by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Tracy, C.E.; Benson, D.K.

    1986-09-01T23:59:59.000Z

    Preliminary experiments have been performed to probe the feasibility of using plasma enhanced chemical vapor deposition (PE--CVD) to prepare electrochromic thin films of tungsten oxide and molybdenum oxide by plasma reaction of WF/sub 6/, W(CO)/sub 6/, and Mo(CO)/sub 6/ with oxygen. Thin films produced in a 300 W, electrodeless, radio-frequency (rf), capacitive discharge were found to be electrochromic when tested with either liquid or solid electrolytes. Optical spectroscopy was performed on two electrochromic coatings after Li/sup +/ ion insertion from a propylene carbonate liquid electrolyte. Broad absorption peaks at --900 nm for WO/sub 3/ and 600 nm for MoO/sub 3/ were observed. Optical results for PE--CVD MoO/sub 3/ films differ from those reported for evaporated MoO/sub 3/ films which have an absorption peak at --800 nm. The shorter wavelength absorption in the PE--CVD MoO/sub 3/ films offers the potential for fabricating electrochromic devices with higher contrast ratios and less color change. Optical emission spectroscopy, Auger, and x-ray diffraction analyses indicate these thin film deposits to be predominantly amorphous tungsten and molybdenum oxides.

  16. Cooperative Island Growth of Large Area Single-Crystal Graphene by Chemical Vapor Deposition on Cu

    SciTech Connect (OSTI)

    Regmi, Murari [Oak Ridge National Laboratory (ORNL); Rouleau, Christopher [Oak Ridge National Laboratory (ORNL); Puretzky, Alexander A [ORNL; Ivanov, Ilia N [ORNL; Geohegan, David B [ORNL; Chen, Jihua [ORNL; Eastman, Jeffrey [Argonne National Laboratory (ANL); Eres, Gyula [ORNL

    2014-01-01T23:59:59.000Z

    We describe a two-step approach for suppressing nucleation of graphene on Cu using chemical vapor deposition. In the first step, as received Cu foils are oxidized in air at temperatures up to 500 C to remove surface impurities and to induce the regrowth of Cu grains during subsequent annealing in H2 flow at 1040 C prior to graphene growth. In the second step, transient reactant cooling is performed by using a brief Ar pulse at the onset of growth to induce collisional deactivation of the carbon growth species. The combination of these two steps results in a three orders of magnitude reduction in the graphene nucleation density, enabling the growth of millimeter-size single crystal graphene grains. A kinetic model shows that suppressing nucleation promotes a cooperative island growth mode that favors the formation of large area single crystal graphene, and it is accompanied by a roughly 3 orders of magnitude increase in the reactive sticking probability of methane compared to that in random nucleation growth.

  17. Nitrogen doping of chemical vapor deposition grown graphene on 4H-SiC (0001)

    SciTech Connect (OSTI)

    Urban, J. M.; Binder, J.; Wysmo?ek, A. [Faculty of Physics, University of Warsaw, ul. Ho?a 69, 00-681 Warsaw (Poland); D?browski, P.; Strupi?ski, W. [Institute of Electronic Materials Technology, ul. Wólczy?ska 133, 01-919 Warsaw (Poland); Kopciuszy?ski, M.; Ja?ochowski, M. [Institute of Physics, Maria Curie-Sk?odowska University, pl. M. Curie-Sk?odowskiej 1, 20-031 Lublin (Poland); Klusek, Z. [Faculty of Physics and Applied Informatics, University of ?ód?, ul. Pomorska 149/153, 90-236 ?ód? (Poland); Baranowski, J. M. [Faculty of Physics, University of Warsaw, ul. Ho?a 69, 00-681 Warsaw (Poland); Institute of Electronic Materials Technology, ul. Wólczy?ska 133, 01-919 Warsaw (Poland)

    2014-06-21T23:59:59.000Z

    We present optical, electrical, and structural properties of nitrogen-doped graphene grown on the Si face of 4H-SiC (0001) by chemical vapor deposition method using propane as the carbon precursor and N{sub 2} as the nitrogen source. The incorporation of nitrogen in the carbon lattice was confirmed by X-ray photoelectron spectroscopy. Angle-resolved photoemission spectroscopy shows carrier behavior characteristic for massless Dirac fermions and confirms the presence of a graphene monolayer in the investigated nitrogen-doped samples. The structural and electronic properties of the material were investigated by Raman spectroscopy. A systematical analysis of the graphene Raman spectra, including D, G, and 2D bands, was performed. In the case of nitrogen-doped samples, an electron concentration on the order of 5–10 × 10{sup 12}?cm{sup ?2} was estimated based upon Raman and Hall effect measurements and no clear dependence of the carrier concentration on nitrogen concentration used during growth was observed. This high electron concentration can be interpreted as both due to the presence of nitrogen in graphitic-like positions of the graphene lattice as well as to the interaction with the substrate. A greater intensity of the Raman D band and increased inhomogeneity, as well as decreased electron mobility, observed for nitrogen-doped samples, indicate the formation of defects and a modification of the growth process induced by nitrogen doping.

  18. Effect of e-beam irradiation on graphene layer grown by chemical vapor deposition

    SciTech Connect (OSTI)

    Iqbal, M. Z.; Kumar Singh, Arun; Iqbal, M. W.; Seo, Sunae; Eom, Jonghwa [Department of Physics and Graphene Research Institute, Sejong University, Seoul 143-747 (Korea, Republic of)

    2012-04-15T23:59:59.000Z

    We have grown graphene by chemical vapor deposition (CVD) and transferred it onto Si/SiO{sub 2} substrates to make tens of micron scale devices for Raman spectroscopy study. The effect of electron beam (e-beam) irradiation of various doses (600 to 12 000 {mu}C/cm{sup 2}) on CVD grown graphene has been examined by using Raman spectroscopy. It is found that the radiation exposures result in the appearance of the strong disorder D band attributed the damage to the lattice. The evolution of peak frequencies, intensities, and widths of the main Raman bands of CVD graphene is analyzed as a function of defect created by e-beam irradiation. Especially, the D and G peak evolution with increasing radiation dose follows the amorphization trajectory, which suggests transformation of graphene to the nanocrystalline and then to amorphous form. We have also estimated the strain induced by e-beam irradiation in CVD graphene. These results obtained for CVD graphene are in line with previous findings reported for the mechanically exfoliated graphene [D. Teweldebrhan and A. A. Balandin, Appl. Phys. Lett. 94, 013101 (2009)]. The results have important implications for CVD graphene characterization and device fabrication, which rely on the electron microscopy.

  19. Low-temperature chemical vapor deposition of tungsten from tungsten hexacarbonyl

    SciTech Connect (OSTI)

    Vogt, G.J.

    1982-04-01T23:59:59.000Z

    Chemical vapor deposition (CVD) of tungsten from W(CO)/sub 6/ has been investigated below 670 K as an alternate process to WF/sub 6/ CVD for coating glass microspheres. The major advantages of W(CO)/sub 6/ CVD are the elimination of the HF damage to the glass microspheres and potentially a lower deposition temperature for coating DT-filled microspheres. W(CO)/sub 6/ CVD can be utilized, in principle, to coat the microspheres with 1 to 5 ..mu..m of tungsten or to flash coat the microspheres for further coating by WF/sub 6/ CVD. Test coatings were deposited in a fluidized-bed reactor with a hydrogen carrier gas. The coatings were found to contain nearly equal portions of carbon and oxygen, ranging from 16 to 25 at.% for each element. The high carbon and oxygen concentrations are believed to result principally from the physical entrapment of chemisorbed CO molecules at the surface of the growing deposit. The general quality and adhesion of the W(CO)/sub 6/-derived coatings are unsatisfactory at this time for ICF applications.

  20. On-line coating of glass with tin oxide by atmospheric pressure chemical vapor deposition.

    SciTech Connect (OSTI)

    Allendorf, Mark D.; Sopko, J.F. (PPF Industries, Pittsburgh, PA); Houf, William G.; Chae, Yong Kee; McDaniel, Anthony H.; Li, M. (PPF Industries, Pittsburgh, PA); McCamy, J.W. (PPF Industries, Pittsburgh, PA)

    2006-11-01T23:59:59.000Z

    Atmospheric pressure chemical vapor deposition (APCVD) of tin oxide is a very important manufacturing technique used in the production of low-emissivity glass. It is also the primary method used to provide wear-resistant coatings on glass containers. The complexity of these systems, which involve chemical reactions in both the gas phase and on the deposition surface, as well as complex fluid dynamics, makes process optimization and design of new coating reactors a very difficult task. In 2001 the U.S. Dept. of Energy Industrial Technologies Program Glass Industry of the Future Team funded a project to address the need for more accurate data concerning the tin oxide APCVD process. This report presents a case study of on-line APCVD using organometallic precursors, which are the primary reactants used in industrial coating processes. Research staff at Sandia National Laboratories in Livermore, CA, and the PPG Industries Glass Technology Center in Pittsburgh, PA collaborated to produce this work. In this report, we describe a detailed investigation of the factors controlling the growth of tin oxide films. The report begins with a discussion of the basic elements of the deposition chemistry, including gas-phase thermochemistry of tin species and mechanisms of chemical reactions involved in the decomposition of tin precursors. These results provide the basis for experimental investigations in which tin oxide growth rates were measured as a function of all major process variables. The experiments focused on growth from monobutyltintrichloride (MBTC) since this is one of the two primary precursors used industrially. There are almost no reliable growth-rate data available for this precursor. Robust models describing the growth rate as a function of these variables are derived from modeling of these data. Finally, the results are used to conduct computational fluid dynamic simulations of both pilot- and full-scale coating reactors. As a result, general conclusions are reached concerning the factors affecting the growth rate in on-line APCVD reactors. In addition, a substantial body of data was generated that can be used to model many different industrial tin oxide coating processes. These data include the most extensive compilation of thermochemistry for gas-phase tin-containing species as well as kinetic expressions describing tin oxide growth rates over a wide range of temperatures, pressures, and reactant concentrations.

  1. Study of plasma enhanced chemical vapor deposition of boron-doped hydrogenated amorphous silicon thin films and the application to p-channel thin film transistor

    E-Print Network [OSTI]

    Nominanda, Helinda

    2004-01-01T23:59:59.000Z

    The material and process characteristics of boron doped hydrogenated amorphous silicon (a-Si:H) thin film deposited by plasma enhanced chemical vapor deposition technique (PECVD) have been studied. The goal is to apply the high quality films...

  2. Aligned Carbon Nanotube Reinforced Silicon Carbide Composites by Chemical Vapor Infiltration

    SciTech Connect (OSTI)

    Gu, Zhan Jun [University of Georgia, Athens, GA; Yang, Ying Chao [University of South Carolina, Columbia; Li, Kai Yuan [University of Georgia, Athens, GA; Tao, Xin Yong [University of South Carolina, Columbia; Eres, Gyula [ORNL; Howe, Jane Y [ORNL; Zhang, Li Tong [Northwestern Polytechnical University, Xi'an, China; Li, Xiao Dong [University of South Carolina, Columbia; Pan, Zhengwei [ORNL

    2011-01-01T23:59:59.000Z

    Owing to their exceptional stiffness and strength1 4, carbon nanotubes (CNTs) have long been considered to be an ideal reinforcement for light-weight, high-strength, and high-temperature-resistant ceramic matrix composites (CMCs)5 10. However, the research and development in CNT-reinforced CMCs have been greatly hindered due to the challenges related to manufacturing including poor dispersion, damages during dispersion, surface modification, densification and sintering, weak tube/matrix interfaces, and agglomeration of tubes at the matrix grain boundaries5,11. Here we report the fabrication of high-quality aligned CNT/SiC composites by chemical vapor infiltration (CVI), a technique that is being widely used to fabricate commercial continuous-filament CMCs12 15. Using the CVI technique most of the challenges previously encountered in the fabrication of CNT composites were readily overcome. Nanotube pullouts, an important toughening mechanism for CMCs, were consistently observed on all fractured CNT/SiC samples. Indeed, three-point bending tests conducted on individual CNT/SiC nanowires (diameters: 50 200 nm) using an atomic force microscope show that the CNT-reinforced SiC nanowires are about an order of magnitude tougher than the bulk SiC. The tube/matrix interface is so intimate and the SiC matrix is so dense that a ~50-nm-thick SiC coating can effectively protect the inside nanotubes from being oxidized at 1600 C in air. The CVI method may be extended to produce nanotube composites from a variety of matrix

  3. Improving chemical vapor deposition graphene conductivity using molybdenum trioxide: An in-situ field effect transistor study

    SciTech Connect (OSTI)

    Han, Cheng [Department of Physics and Institute for Advanced Study, Nanchang University, 999 Xue Fu Da Dao, Nanchang (China) [Department of Physics and Institute for Advanced Study, Nanchang University, 999 Xue Fu Da Dao, Nanchang (China); Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore); Lin, Jiadan; Xiang, Du [Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore)] [Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore); Wang, Chaocheng; Wang, Li [Department of Physics and Institute for Advanced Study, Nanchang University, 999 Xue Fu Da Dao, Nanchang (China)] [Department of Physics and Institute for Advanced Study, Nanchang University, 999 Xue Fu Da Dao, Nanchang (China); Chen, Wei [Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore) [Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore); Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543 and Graphene Research Centre, National University of Singapore, 2 Science Drive 3, Singapore 117542 (Singapore)

    2013-12-23T23:59:59.000Z

    By using in situ field effect transistor characterization integrated with molecular beam epitaxy technique, we demonstrate the strong surface transfer p-type doping effect of single layer chemical vapor deposition (CVD) graphene, through the surface functionalization of molybdenum trioxide (MoO{sub 3}) layer. After doping, both the hole and electron mobility of CVD graphene are nearly retained, resulting in significant enhancement of graphene conductivity. With coating of 10 nm MoO{sub 3}, the conductivity of CVD graphene can be increased by about 7 times, showing promising application for graphene based electronics and transparent, conducting, and flexible electrodes.

  4. Method and apparatus for fabricating a thin-film solar cell utilizing a hot wire chemical vapor deposition technique

    DOE Patents [OSTI]

    Wang, Qi; Iwaniczko, Eugene

    2006-10-17T23:59:59.000Z

    A thin-film solar cell is provided. The thin-film solar cell comprises an a-SiGe:H (1.6 eV) n-i-p solar cell having a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer by hot wire chemical vapor deposition. A method for fabricating a thin film solar cell is also provided. The method comprises depositing a n-i-p layer at a deposition rate of at least ten (10) .ANG./second for the a-SiGe:H intrinsic layer.

  5. Robust Numerical Simulation of Porosity Evolution in Chemical Vapor Infiltration III: Three Space

    E-Print Network [OSTI]

    Jin, Shi

    is an important technol- ogy to fabricate ceramic matrix composites (CMC's). In this paper, a three) is an important and widely used tech- nology for fabricating fiber reinforced ceramic matrix composite (CMC temperature. A vapor precursor of the matrix ma- terial, such as the methyltrichlorosilane (MTS), diffuses

  6. Robust Numerical Simulation of Porosity Evolution in Chemical Vapor Infiltration I: Two Space

    E-Print Network [OSTI]

    Jin, Shi

    infiltration (CVI) process is an important approach to fabricating ceramic matrix composite(CMC's). Two. In CVI a vapor precursor of the matrix material, such as methyl­ trichlorosilane (MTS), diffuses through the inter­fiber void. As matrix growth progresses, avenues for gas transport become more tortuous and begin

  7. Electrochromic Devices Deposited on Low-Temperature Plastics by Plasma-Enhanced Chemical Vapor Deposition

    SciTech Connect (OSTI)

    Robbins, Joshua; Seman, Michael

    2005-09-20T23:59:59.000Z

    Electrochromic windows have been identified by the Basic energy Sciences Advisory committee as an important technology for the reduction of energy spent on heating and cooling in residential and commercial buildings. Electrochromic devices have the ability to reversibly alter their optical properties in response to a small electric field. By blocking ultraviolet and infrared radiation, while modulating the incoming visible radiation, electrochromics could reduce energy consumption by several Quads per year. This amounts to several percent of the total annual national energy expenditures. The purpose of this project was to demonstrate proof of concept for using plasma-enhanced chemical vapor deposition (PECVD) for depositing all five layers necessary for full electrochromic devices, as an alternative to sputtering techniques. The overall goal is to produce electrochromic devices on flexible polymer substrates using PECVD to significantly reduce the cost of the final product. We have successfully deposited all of the films necessary for a complete electrochromic devices using PECVD. The electrochromic layer, WO3, displayed excellent change in visible transmission with good switching times. The storage layer, V2O5, exhibited a high storage capacity and good clear state transmission. The electrolyte, Ta2O5, was shown to functional with good electrical resistivity to go along with the ability to transfer Li ions. There were issues with leakage over larger areas, which can be address with further process development. We developed a process to deposit ZnO:Ga with a sheet resistance of < 50 W/sq. with > 90% transmission. Although we were not able to deposit on polymers due to the temperatures required in combination with the inverted position of our substrates. Two types of full devices were produced. Devices with Ta2O5 were shown to be functional using small aluminum dots as the top contact. The polymer electrolyte devices were shown to have a clear state transmission of 69% and a darkened state transmission 11%. These un-optimized devices compared well with commercially available products, which have a stated clear transmission of 59% and dark transmission of 4%. The PECVD oxides have displayed advantages over films produced by sputtering. The first advantage is that deposition rates were significantly higher than typical sputtering rates. Rates of 100 nm/min were achieved for WO3, and rates of 50 nm/min produced quality V2O5 and Ta2O5 films. Faster rates will produce a significant reduction in cost due to higher throughput. Another advantage was that films were less dense than those produced by sputtering as reported in the literature. This leads to high diffusion coefficients and fast switching times. Also less dense films have been shown to produce larger contrast ratios in WO3 and larger storage capacity in V2O5. From the data collected in this category 1 project we have shown that PECVD is feasible and beneficial for the deposition of working layers for electrochromic devices. These results and the lessons learned can be applied toward deposition on polymers and equipment scale-up in future work.

  8. Graphene chemical vapor deposition at very low pressure: The impact of substrate surface self-diffusion in domain shape

    SciTech Connect (OSTI)

    Cunha, T. H. R.; Ek-Weis, J.; Lacerda, R. G.; Ferlauto, A. S., E-mail: ferlauto@fisica.ufmg.br [Department of Physics, Federal University of Minas Gerais, Belo Horizonte 31270-901 (Brazil)

    2014-08-18T23:59:59.000Z

    The initial stages of graphene chemical vapor deposition at very low pressures (<10{sup ?5?}Torr) were investigated. The growth of large graphene domains (?up to 100??m) at very high rates (up to 3??m{sup 2} s{sup ?1}) has been achieved in a cold-wall reactor using a liquid carbon precursor. For high temperature growth (>900?°C), graphene grain shape and symmetry were found to depend on the underlying symmetry of the Cu crystal, whereas for lower temperatures (<900?°C), mostly rounded grains are observed. The temperature dependence of graphene nucleation density was determined, displaying two thermally activated regimes, with activation energy values of 6?±?1?eV for temperatures ranging from 900?°C to 960?°C and 9?±?1?eV for temperatures above 960?°C. The comparison of such dependence with the temperature dependence of Cu surface self-diffusion suggests that graphene growth at high temperatures and low pressures is strongly influenced by copper surface rearrangement. We propose a model that incorporates Cu surface self-diffusion as an essential process to explain the orientation correlation between graphene and Cu crystals, and which can clarify the difference generally observed between graphene domain shapes in atmospheric-pressure and low-pressure chemical vapor deposition.

  9. Design of a compact ultrahigh vacuum-compatible setup for the analysis of chemical vapor deposition processes

    SciTech Connect (OSTI)

    Weiss, Theodor; Nowak, Martin; Zielasek, Volkmar, E-mail: zielasek@uni-bremen.de; Bäumer, Marcus [Institut für Angewandte und Physikalische Chemie, Universität Bremen, Leobener Straße UFT, D-28359 Bremen (Germany); Mundloch, Udo; Kohse-Höinghaus, Katharina [Physikalische Chemie I, Fakultät für Chemie, Universität Bielefeld, Universitätsstraße 25, D-33615 Bielefeld (Germany)

    2014-10-15T23:59:59.000Z

    Optimizing thin film deposition techniques requires contamination-free transfer from the reactor into an ultrahigh vacuum (UHV) chamber for surface science analysis. A very compact, multifunctional Chemical Vapor Deposition (CVD) reactor for direct attachment to any typical UHV system for thin film analysis was designed and built. Besides compactness, fast, easy, and at the same time ultimately clean sample transfer between reactor and UHV was a major goal. It was achieved by a combination of sample manipulation parts, sample heater, and a shutter mechanism designed to fit all into a NW38 Conflat six-ways cross. The present reactor design is versatile to be employed for all commonly employed variants of CVD, including Atomic Layer Deposition. A demonstration of the functionality of the system is provided. First results of the setup (attached to an Omicron Multiprobe x-ray photoelectron spectroscopy system) on the temperature dependence of Pulsed Spray Evaporation-CVD of Ni films from Ni acetylacetonate as the precursor demonstrate the reactor performance and illustrate the importance of clean sample transfer without breaking vacuum in order to obtain unambiguous results on the quality of CVD-grown thin Ni films. The widely applicable design holds promise for future systematic studies of the fundamental processes during chemical vapor deposition or atomic layer deposition.

  10. The influence of ammonia on rapid-ther al low-pressure metalorganic chemical vapor deposited TIN, films from tetrakis (dimethylamido) titanium

    E-Print Network [OSTI]

    Florida, University of

    , films from tetrakis (dimethylamido) titanium precursor onto InP A. Katz, A. Feingold, S. Nakahara, and SP, using a combined reactive chemistry of ammonia (NH,) gas and tetrakis (dimethylamido) titanium (DMATi to the preview RT-LPMOCVD TN, film deposited using only the DMATi precursor. I. INTRODUCTION Titanium nitride

  11. Effect of strain-compensation in stacked 1.3 m InAs/GaAs quantum dot active regions grown by metalorganic chemical vapor deposition

    E-Print Network [OSTI]

    Jalali. Bahram

    of compressive strain by inserting tensile layers has been demonstrated using InGaP and InGaAsP in multiple efficiency in In Ga As-based QDs. In this letter, we discuss the effects of InGaP SC layers on five high resolution transmission electron microscopy (TEM) images. The inter- face regions, GaAs/InGaP

  12. Quantum dot lasers based on a stacked and strain-compensated active region grown by metal-organic chemical vapor deposition

    E-Print Network [OSTI]

    Jalali. Bahram

    successful to date. Kim et al. has embedded the QDs in an InGaP barrier,4 which results in high To=210 K reported improved crystallinity using InGaP strain- compensation SC layers, however, the InGaP layers can lead to In segregation and hexagonal material at the InGaP/GaAs interface.11 The use of InGaP and In

  13. Calibrated vapor generator source

    DOE Patents [OSTI]

    Davies, J.P.; Larson, R.A.; Goodrich, L.D.; Hall, H.J.; Stoddard, B.D.; Davis, S.G.; Kaser, T.G.; Conrad, F.J.

    1995-09-26T23:59:59.000Z

    A portable vapor generator is disclosed that can provide a controlled source of chemical vapors, such as, narcotic or explosive vapors. This source can be used to test and calibrate various types of vapor detection systems by providing a known amount of vapors to the system. The vapor generator is calibrated using a reference ion mobility spectrometer. A method of providing this vapor is described, as follows: explosive or narcotic is deposited on quartz wool, placed in a chamber that can be heated or cooled (depending on the vapor pressure of the material) to control the concentration of vapors in the reservoir. A controlled flow of air is pulsed over the quartz wool releasing a preset quantity of vapors at the outlet. 10 figs.

  14. Calibrated vapor generator source

    DOE Patents [OSTI]

    Davies, John P. (Idaho Falls, ID); Larson, Ronald A. (Idaho Falls, ID); Goodrich, Lorenzo D. (Shelley, ID); Hall, Harold J. (Idaho Falls, ID); Stoddard, Billy D. (Idaho Falls, ID); Davis, Sean G. (Idaho Falls, ID); Kaser, Timothy G. (Idaho Falls, ID); Conrad, Frank J. (Albuquerque, NM)

    1995-01-01T23:59:59.000Z

    A portable vapor generator is disclosed that can provide a controlled source of chemical vapors, such as, narcotic or explosive vapors. This source can be used to test and calibrate various types of vapor detection systems by providing a known amount of vapors to the system. The vapor generator is calibrated using a reference ion mobility spectrometer. A method of providing this vapor is described, as follows: explosive or narcotic is deposited on quartz wool, placed in a chamber that can be heated or cooled (depending on the vapor pressure of the material) to control the concentration of vapors in the reservoir. A controlled flow of air is pulsed over the quartz wool releasing a preset quantity of vapors at the outlet.

  15. MOMENTUM AND THERMAL BOUNDARY-LAYER THICKNESS IN A STAGNATION FLOW CHEMICAL VAPOR DEPOSITION REACTOR

    E-Print Network [OSTI]

    Dandy, David

    REACTOR DAVID S. DANDY AND JUNGHEUM YUN Department of Chemical Engineering Colorado State University Fort deposition pedestal reactors. Expressions for the velocity and temperature profiles within the boundary

  16. ZnO light-emitting diode grown by plasma-assisted metal organic chemical vapor deposition

    SciTech Connect (OSTI)

    Xu, W.Z.; Ye, Z.Z.; Zeng, Y.J.; Zhu, L.P.; Zhao, B.H.; Jiang, L.; Lu, J.G.; He, H.P.; Zhang, S.B. [State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027 (China); National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

    2006-04-24T23:59:59.000Z

    We report a breakthrough in fabricating ZnO homojunction light-emitting diode by metal organic chemical vapor deposition. Using NO plasma, we are able to grow p-type ZnO thin films on n-type bulk ZnO substrates. The as-grown films on glass substrates show hole concentration of 10{sup 16}-10{sup 17} cm{sup -3} and mobility of 1-10 cm{sup 2} V{sup -1} s{sup -1}. Room-temperature photoluminescence spectra reveal nitrogen-related emissions. A typical ZnO homojunction shows rectifying behavior with a turn-on voltage of about 2.3 V. Electroluminescence at room temperature has been demonstrated with band-to-band emission at I=40 mA and defect-related emissions in the blue-yellow spectrum range.

  17. Controlling single and few-layer graphene crystals growth in a solid carbon source based chemical vapor deposition

    SciTech Connect (OSTI)

    Papon, Remi; Sharma, Subash; Shinde, Sachin M.; Vishwakarma, Riteshkumar; Tanemura, Masaki [Department of Frontier Materials, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan); Kalita, Golap, E-mail: kalita.golap@nitech.ac.jp [Department of Frontier Materials, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan); Center for Fostering Young and Innovative Researchers, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya, 466-8555 (Japan)

    2014-09-29T23:59:59.000Z

    Here, we reveal the growth process of single and few-layer graphene crystals in the solid carbon source based chemical vapor deposition (CVD) technique. Nucleation and growth of graphene crystals on a polycrystalline Cu foil are significantly affected by the injection of carbon atoms with pyrolysis rate of the carbon source. We observe micron length ribbons like growth front as well as saturated growth edges of graphene crystals depending on growth conditions. Controlling the pyrolysis rate of carbon source, monolayer and few-layer crystals and corresponding continuous films are obtained. In a controlled process, we observed growth of large monolayer graphene crystals, which interconnect and merge together to form a continuous film. On the other hand, adlayer growth is observed with an increased pyrolysis rate, resulting few-layer graphene crystal structure and merged continuous film. The understanding of monolayer and few-layer crystals growth in the developed CVD process can be significant to grow graphene with controlled layer numbers.

  18. Ultra-narrow ferromagnetic resonance in organic-based thin films grown via low temperature chemical vapor deposition

    SciTech Connect (OSTI)

    Yu, H.; Harberts, M.; Adur, R.; Hammel, P. Chris; Johnston-Halperin, E., E-mail: ejh@physics.osu.edu, E-mail: epstein@physics.osu.edu [Department of Physics, The Ohio State University, Columbus, Ohio 43210-1117 (United States); Lu, Y. [Department of Chemistry, The Ohio State University, Columbus, Ohio 43210-1173 (United States); Epstein, A. J., E-mail: ejh@physics.osu.edu, E-mail: epstein@physics.osu.edu [Department of Physics, The Ohio State University, Columbus, Ohio 43210-1117 (United States); Department of Chemistry, The Ohio State University, Columbus, Ohio 43210-1173 (United States)

    2014-07-07T23:59:59.000Z

    We present the growth of thin films of the organic-based ferrimagnetic semiconductor V[TCNE]{sub x} (x???2, TCNE: tetracyanoethylene) via chemical vapor deposition. Under optimized growth conditions, we observe a significant increase in magnetic homogeneity, as evidenced by a Curie temperature above 600?K and sharp magnetization switching. Further, ferromagnetic resonance studies reveal a single resonance with full width at half maximum linewidth of 1.4?G, comparable to the narrowest lines measured in inorganic magnetic materials and in contrast to previous studies that showed multiple resonance features. These characteristics are promising for the development of high frequency electronic devices that take advantage of the unique properties of this organic-based material, such as the potential for low cost synthesis combined with low temperature and conformal deposition on a wide variety of substrates.

  19. Plasma-enhanced chemical vapor deposition of graphene on copper substrates

    SciTech Connect (OSTI)

    Woehrl, Nicolas, E-mail: nicolas.woehrl@uni-due.de; Schulz, Stephan [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany)] [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany); Ochedowski, Oliver; Gottlieb, Steven [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany)] [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany); Shibasaki, Kosuke [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)] [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)

    2014-04-15T23:59:59.000Z

    A plasma enhanced vapor deposition process is used to synthesize graphene from a hydrogen/methane gas mixture on copper samples. The graphene samples were transferred onto SiO{sub 2} substrates and characterized by Raman spectroscopic mapping and atomic force microscope topographical mapping. Analysis of the Raman bands shows that the deposited graphene is clearly SLG and that the sheets are deposited on large areas of several mm{sup 2}. The defect density in the graphene sheets is calculated using Raman measurements and the influence of the process pressure on the defect density is measured. Furthermore the origin of these defects is discussed with respect to the process parameters and hence the plasma environment.

  20. Metal-Organic Heat Carrier Nanofluids

    SciTech Connect (OSTI)

    McGrail, B. Peter; Thallapally, Praveen K.; Blanchard, Jeremy; Nune, Satish K.; Jenks, Jeromy WJ; Dang, Liem X.

    2013-09-01T23:59:59.000Z

    Nanofluids, dispersions of metal or oxide nanoparticles in a base working fluid, are being intensively studied due to improvements they offer in thermal properties of the working fluid. However, these benefits have been erratically demonstrated and proven impacts on thermal conductivity are modest and well described from long-established effective medium theory. In this paper, we describe a new class of metal-organic heat carrier (MOHC) nanofluid that offers potential for a larger performance boost in thermal vapor-liquid compression cycles. MOHCs are nanophase porous coordination solids designed to reversibly uptake the working fluid molecules in which the MOHCs are suspended. Additional heat can be extracted in a heat exchanger or solar collector from the endothermic enthalpy of desorption, which is then released as the nanofluid transits through a power generating device such as a turboexpander. Calculations for an R123 MOHC nanofluid indicated potential for up to 15% increase in power output. Capillary tube experiments show that liquid-vapor transitions occur without nanoparticle deposition on the tube walls provided entrance Reynolds number exceeds approximately 100.

  1. Process sensing and metrology in gate oxide growth by rapid thermal chemical vapor deposition from SiH4 and N2O

    E-Print Network [OSTI]

    Rubloff, Gary W.

    Process sensing and metrology in gate oxide growth by rapid thermal chemical vapor deposition from for Advanced Electronic Materials Processing, North Carolina State University, Raleigh, North Carolina 27695-7920 Received 7 January 1999; accepted 21 May 1999 Active sampling mass spectrometry has been used for process

  2. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Abbasi-Firouzjah, M. [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of)] [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of); Shokri, B. [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of) [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of); Physics Department, Shahid Beheshti University G.C., Evin, Tehran (Iran, Islamic Republic of)

    2013-12-07T23:59:59.000Z

    Low dielectric constant (low-k) silica based films were deposited on p-type silicon and polycarbonate substrates by radio frequency (RF) plasma enhanced chemical vapor deposition method at low temperature. A mixture of tetraethoxysilane vapor, oxygen, and tetrafluoromethane (CF{sub 4}) was used for the deposition of the films in forms of two structures called as SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z}. Properties of the films were controlled by amount of porosity and fluorine content in the film matrix. The influence of RF power and CF{sub 4} flow on the elemental composition, deposition rate, surface roughness, leakage current, refractive index, and dielectric constant of the films were characterized. Moreover, optical emission spectroscopy was applied to monitor the plasma process at the different parameters. Electrical characteristics of SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z} films with metal-oxide-semiconductor structure were investigated using current-voltage analysis to measure the leakage current and breakdown field, as well as capacitance-voltage analysis to obtain the film's dielectric constant. The results revealed that SiO{sub x}C{sub y} films, which are deposited at lower RF power produce more leakage current, meanwhile the dielectric constant and refractive index of these films decreased mainly due to the more porosity in the film structure. By adding CF{sub 4} in the deposition process, fluorine, the most electronegative and the least polarized atom, doped into the silica film and led to decrease in the refractive index and the dielectric constant. In addition, no breakdown field was observed in the electrical characteristics of SiO{sub x}C{sub y}F{sub z} films and the leakage current of these films reduced by increment of the CF{sub 4} flow.

  3. Multiwalled Carbon Nanotube Forest Grown via Chemical Vapor Deposition from Iron Catalyst Nanoparticles, by XPS

    SciTech Connect (OSTI)

    Jensen, David S.; Kanyal, Supriya S.; Madaan, Nitesh; Vail, Michael A.; Dadson, Andrew; Engelhard, Mark H.; Linford, Matthew R.

    2013-09-25T23:59:59.000Z

    Carbon nanotubes (CNTs) have unique chemical and physical properties. Herein, we report an XPS analysis of a forest of multiwalled CNTs using monochromatic Al K? radiation. Survey scans show only one element: carbon. The carbon 1s peak is centered 284.5 eV. The C 1s envelope also shows the expected ? ? ?* shake-up peak at ca. 291 eV. The valence band and carbon KVV Auger signals are presented. When patterned, the CNT forests can be used as a template for subsequent deposition of metal oxides to make thin layer chromatography plates.1-3

  4. SciTech Connect: Metal-Organic Framework Templated Inorganic...

    Office of Scientific and Technical Information (OSTI)

    Metal-Organic Framework Templated Inorganic Sorbents for Rapid and Efficient Extraction of Heavy Metals Citation Details In-Document Search Title: Metal-Organic Framework Templated...

  5. Data for First Responder Use of Photoionization Detectors for Vapor Chemical Constituents

    SciTech Connect (OSTI)

    Keith A. Daum; Matthew G. Watrous; M. Dean Neptune; Daniel I. Michael; Kevin J. Hull; Joseph D. Evans

    2006-11-01T23:59:59.000Z

    First responders need appropriate measurement technologies for evaluating incident scenes. This report provides information about photoionization detectors (PIDs), obtained from manufacturers and independent laboratory tests, and the use of PIDs by first responders, obtained from incident commanders in the United States and Canada. PIDs are valued for their relatively low cost, light weight, rapid detection response, and ease of use. However, it is clear that further efforts are needed to provide suitable instruments and decision tools to incident commanders and first responders for assessing potential hazardous chemical releases. Information provided in this report indicates that PIDs should always be part of a decision-making context in which other qualitative and more definitive tests and instruments are used to confirm a finding. Possible amelioratory actions ranging from quick and relatively easy fixes to those requiring significant additional effort are outlined in the report.

  6. Step-edge-induced resistance anisotropy in quasi-free-standing bilayer chemical vapor deposition graphene on SiC

    SciTech Connect (OSTI)

    Ciuk, Tymoteusz [Institute of Electronic Materials Technology, Wolczynska 133, 01-919 Warsaw (Poland); Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw (Poland); Cakmakyapan, Semih; Ozbay, Ekmel [Department of Electrical and Electronics Engineering, Department of Physics, Nanotechnology Research Center, Bilkent University, 06800 Bilkent, Ankara (Turkey); Caban, Piotr; Grodecki, Kacper; Pasternak, Iwona; Strupinski, Wlodek, E-mail: wlodek.strupinski@itme.edu.pl [Institute of Electronic Materials Technology, Wolczynska 133, 01-919 Warsaw (Poland); Krajewska, Aleksandra [Institute of Electronic Materials Technology, Wolczynska 133, 01-919 Warsaw (Poland); Institute of Optoelectronics, Military University of Technology, Gen. S. Kaliskiego 2, 00-908 Warsaw (Poland); Szmidt, Jan [Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw (Poland)

    2014-09-28T23:59:59.000Z

    The transport properties of quasi-free-standing (QFS) bilayer graphene on SiC depend on a range of scattering mechanisms. Most of them are isotropic in nature. However, the SiC substrate morphology marked by a distinctive pattern of the terraces gives rise to an anisotropy in graphene's sheet resistance, which may be considered an additional scattering mechanism. At a technological level, the growth-preceding in situ etching of the SiC surface promotes step bunching which results in macro steps ~10 nm in height. In this report, we study the qualitative and quantitative effects of SiC steps edges on the resistance of epitaxial graphene grown by chemical vapor deposition. We experimentally determine the value of step edge resistivity in hydrogen-intercalated QFS-bilayer graphene to be ~190 ??m for step height hS = 10 nm and provide proof that it cannot originate from mechanical deformation of graphene but is likely to arise from lowered carrier concentration in the step area. Our results are confronted with the previously reported values of the step edge resistivity in monolayer graphene over SiC atomic steps. In our analysis, we focus on large-scale, statistical properties to foster the scalable technology of industrial graphene for electronics and sensor applications.

  7. Visible Light Photocatalysis with Nitrogen-Doped Titanium Dioxide Nanoparticles Prepared by Plasma Assisted Chemical Vapor Deposition

    SciTech Connect (OSTI)

    Buzby,S.; Barakat, M.; Lin, H.; Ni, C.; Rykov, S.; Chen, J.; Shah, S.

    2006-01-01T23:59:59.000Z

    Nitrogen-doped TiO{sub 2} nanoparticles were synthesized via plasma assisted metal organic chemical vapor deposition. Nitrogen dopant concentration was varied from 0 to 1.61 at. %. The effect of nitrogen ion doping on visible light photocatalysis has been investigated. Samples were analyzed by various analytical techniques such as x-ray diffraction, transmission electron microscopy, x-ray photoelectron spectroscopy, and near-edge x-ray absorption fine structure. Titanium tetraisopropoxide was used as the titanium precursor, while rf-plasma-decomposed ammonia was used as the source for nitrogen doping. The N-doped TiO{sub 2} nanoparticles were deposited on stainless steel mesh under a flow of Ar and O2 gases at 600 {sup o}C in a tube reactor. The photocatalytic activity of the prepared N-doped TiO{sub 2} samples was tested by the degradation of 2-chlorophenol (2-CP) in an aqueous solution using a visible lamp equipped with an UV filter. The efficiency of photocatalytic oxidation of 2-CP was measured using high performance liquid chromatography. Results obtained revealed the formation of N-doped TiO{sub 2} samples as TiO{sub 2-x}N{sub x}, and a corresponding increase in the visible light photocatalytic activity.

  8. On the possibility to grow zinc oxide-based transparent conducting oxide films by hot-wire chemical vapor deposition

    SciTech Connect (OSTI)

    Abrutis, Adulfas, E-mail: adulfas.abrutis@chf.vu.lt; Silimavicus, Laimis; Kubilius, Virgaudas; Murauskas, Tomas; Saltyte, Zita; Kuprenaite, Sabina; Plausinaitiene, Valentina [Faculty of Chemistry, Vilnius University, Naugarduko 24, LT-03225 Vilnius (Lithuania)

    2014-03-15T23:59:59.000Z

    Hot-wire chemical vapor deposition (HW-CVD) was applied to grow zinc oxide (ZnO)-based transparent conducting oxide (TCO) films. Indium (In)-doped ZnO films were deposited using a cold wall pulsed liquid injection CVD system with three nichrome wires installed at a distance of 2?cm from the substrate holder. The wires were heated by an AC current in the range of 0–10 A. Zn and In 2,2,6,6-tetramethyl-3,5-heptanedionates dissolved in 1,2-dimethoxyethane were used as precursors. The hot wires had a marked effect on the growth rates of ZnO, In-doped ZnO, and In{sub 2}O{sub 3} films; at a current of 6–10 A, growth rates were increased by a factor of ?10–20 compared with those of traditional CVD at the same substrate temperature (400?°C). In-doped ZnO films with thickness of ?150?nm deposited on sapphire-R grown at a wire current of 9?A exhibited a resistivity of ?2?×?10{sup ?3} ?cm and transparency of >90% in the visible spectral range. These initial results reveal the potential of HW-CVD for the growth of TCOs.

  9. Mass densification and defect restoration in chemical vapor deposition silicon dioxide film using Ar plasma excited by microwave

    SciTech Connect (OSTI)

    Kawase, Kazumasa, E-mail: Kawase.Kazumasa@ak.MitsubishiElectric.co.jp; Motoya, Tsukasa; Uehara, Yasushi [Advanced Technology R and D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-honmachi, Amagasaki, Hyogo 661-8661 (Japan); Teramoto, Akinobu; Suwa, Tomoyuki; Ohmi, Tadahiro [New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai, Miyagi 980-8579 (Japan)

    2014-09-01T23:59:59.000Z

    Silicon dioxide (SiO{sub 2}) films formed by chemical vapor deposition (CVD) have been treated with Ar plasma excited by microwave. The changes of the mass densities, carrier trap densities, and thicknesses of the CVD-SiO{sub 2} films with the Ar plasma treatments were investigated. The mass density depth profiles were estimated with X-Ray Reflectivity (XRR) analysis using synchrotron radiation. The densities of carrier trap centers due to defects of Si-O bond network were estimated with X-ray Photoelectron Spectroscopy (XPS) time-dependent measurement. The changes of the thicknesses due to the oxidation of Si substrates were estimated with the XRR and XPS. The mass densities of the CVD-SiO{sub 2} films are increased by the Ar plasma treatments. The carrier trap densities of the films are decreased by the treatments. The thicknesses of the films are not changed by the treatments. It has been clarified that the mass densification and defect restoration in the CVD-SiO{sub 2} films are caused by the Ar plasma treatments without the oxidation of the Si substrates.

  10. Microwave plasma enhanced chemical vapor deposition of nanocrystalline diamond films by bias-enhanced nucleation and bias-enhanced growth

    SciTech Connect (OSTI)

    Chu, Yueh-Chieh [Institute of Microelectronics, National Cheng Kung University No.1, University Road, Tainan 701, Taiwan (China); Tzeng, Yonhua, E-mail: tzengyo@mail.ncku.edu.tw [Institute of Microelectronics, National Cheng Kung University No.1, University Road, Tainan 701, Taiwan (China); Advanced Optoelectronics Technology Center, National Cheng Kung University No.1, University Road, Tainan 701, Taiwan (China); Auciello, Orlando [Department of Materials Science and Engineering and Bioengineering, University of Texas in Dallas, 800 W. Campbell Rd, Richardson, Texas 75080 (United States)

    2014-01-14T23:59:59.000Z

    Effects of biasing voltage-current relationship on microwave plasma enhanced chemical vapor deposition of ultrananocrystalline diamond (UNCD) films on (100) silicon in hydrogen diluted methane by bias-enhanced nucleation and bias-enhanced growth processes are reported. Three biasing methods are applied to study their effects on nucleation, growth, and microstructures of deposited UNCD films. Method A employs 320?mA constant biasing current and a negative biasing voltage decreasing from ?490?V to ?375?V for silicon substrates pre-heated to 800?°C. Method B employs 400?mA constant biasing current and a decreasing negative biasing voltage from ?375?V to ?390?V for silicon pre-heated to 900?°C. Method C employs ?350?V constant biasing voltage and an increasing biasing current up to 400?mA for silicon pre-heated to 800?°C. UNCD nanopillars, merged clusters, and dense films with smooth surface morphology are deposited by the biasing methods A, B, and C, respectively. Effects of ion energy and flux controlled by the biasing voltage and current, respectively, on nucleation, growth, microstructures, surface morphologies, and UNCD contents are confirmed by scanning electron microscopy, high-resolution transmission-electron-microscopy, and UV Raman scattering.

  11. Crystalline SiGe films grown on Si substrates using laser-assisted plasma-enhanced chemical vapor deposition at low temperature

    SciTech Connect (OSTI)

    Lee, C.-T.; Cheng, J.-H.; Lee, H.-Y. [Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan 701 (China) and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan 701 (China); Department of Electro-Optical Engineering, National Cheng Kung University, Tainan, Taiwan 701 (China)

    2007-08-27T23:59:59.000Z

    Compared with conventional plasma-enhanced chemical vapor deposition, laser-assisted plasma-enhanced chemical vapor deposition (LAPECVD) can be used to deposit crystalline SiGe films on Si substrates at low temperature. In the LAPECVD system, a CO{sub 2} laser with a wavelength of 10.6 {mu}m was utilized to assist the pyrolytical decomposition of SiH{sub 4} and GeH{sub 4} reactant gases. The resultant Si{sub 0.78}Ge{sub 0.22} films were obtained and verified through the use of the Auger electron spectroscopy measurement. As the diffraction pattern of a glancing incident angle X-ray diffraction measurement had indicated, several significant diffraction peaks corresponding to a diamond-cubic structure at (111) (220), and (311) were clearly observed. Crystalline SiGe films were also identified by the electron diffraction pattern of high-resolution transmission electron microscopy images.

  12. Magnetism in metal-organic capsules

    E-Print Network [OSTI]

    Atwood, Jerry L.

    2010-01-01T23:59:59.000Z

    Quantum Spin Chains in Magnetism: Molecules to Materials, J.Magnetism in metal-organic capsules Jerry L. Atwood,* a Euan

  13. Growth of Large-Area Aligned Molybdenum Nanowires by High Temperature Chemical Vapor Deposition: Synthesis, Growth Mechanism, and Device Application

    E-Print Network [OSTI]

    Wang, Zhong L.

    , thermogravimetry, and differential scanning calorimetry analysis, as well as structure analysis by electron on the decomposition of MoO2 vapors through condensation of its vapor at high substrate temperatures. The aligned nanowires with H2 gas.6d-f However, the reduction process degrades the crystal- linity of the nanowires

  14. Robofurnace: A semi-automated laboratory chemical vapor deposition system for high-throughput nanomaterial synthesis and process discovery

    SciTech Connect (OSTI)

    Oliver, C. Ryan; Westrick, William; Koehler, Jeremy; Brieland-Shoultz, Anna; Anagnostopoulos-Politis, Ilias; Cruz-Gonzalez, Tizoc [Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States)] [Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Hart, A. John, E-mail: ajhart@mit.edu [Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)

    2013-11-15T23:59:59.000Z

    Laboratory research and development on new materials, such as nanostructured thin films, often utilizes manual equipment such as tube furnaces due to its relatively low cost and ease of setup. However, these systems can be prone to inconsistent outcomes due to variations in standard operating procedures and limitations in performance such as heating and cooling rates restrict the parameter space that can be explored. Perhaps more importantly, maximization of research throughput and the successful and efficient translation of materials processing knowledge to production-scale systems, relies on the attainment of consistent outcomes. In response to this need, we present a semi-automated lab-scale chemical vapor deposition (CVD) furnace system, called “Robofurnace.” Robofurnace is an automated CVD system built around a standard tube furnace, which automates sample insertion and removal and uses motion of the furnace to achieve rapid heating and cooling. The system has a 10-sample magazine and motorized transfer arm, which isolates the samples from the lab atmosphere and enables highly repeatable placement of the sample within the tube. The system is designed to enable continuous operation of the CVD reactor, with asynchronous loading/unloading of samples. To demonstrate its performance, Robofurnace is used to develop a rapid CVD recipe for carbon nanotube (CNT) forest growth, achieving a 10-fold improvement in CNT forest mass density compared to a benchmark recipe using a manual tube furnace. In the long run, multiple systems like Robofurnace may be linked to share data among laboratories by methods such as Twitter. Our hope is Robofurnace and like automation will enable machine learning to optimize and discover relationships in complex material synthesis processes.

  15. Mat. Res. Soc. Symp. Proc. Vol. 612 2000 Materials Research Society VOLATILE LIQUID PRECURSORS FOR THE CHEMICAL VAPOR DEPOSITION

    E-Print Network [OSTI]

    . These tungsten oxide films can be used as part of electrochromic windows, mirrors or displays. Physical in microelectronics.5 CVD using both W(CO)6 vapor and oxygen gas, O2, has produced electrochromic films of tungsten

  16. Metal-organic scintillator crystals for X-ray, gamma ray, and neutron detection

    DOE Patents [OSTI]

    Boatner, Lynn A (Oak Ridge, TN); Kolopus, James A. (Clinton, TN); Neal, John S (Knoxville, TN); Ramey, Joanne Oxendine (Knoxville, TN); Wisniewski, Dariusz J (Torun, PL)

    2012-01-03T23:59:59.000Z

    New metal-organic materials are useful as scintillators and have the chemical formula LX.sub.3(CH.sub.3OH).sub.4 where L is Y, Sc, or a lanthanide element, and X is a halogen element. An example of the scintillator materials is CeCl.sub.3(CH.sub.3OH).sub.4.

  17. Carborane-Based Metal-Organic Framework with High Methane and Hydrogen Storage Capacities

    E-Print Network [OSTI]

    Carborane-Based Metal-Organic Framework with High Methane and Hydrogen Storage Capacities Robert D of Chemical & Biological Engineering, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 of Pennsylvania, Philadelphia, Pennsylvania 19104, United States *S Supporting Information ABSTRACT: A Cu-carborane-based

  18. Development of nanodiamond foils for H- stripping to Support the Spallation Neutron Source (SNS) using hot filament chemical vapor deposition

    SciTech Connect (OSTI)

    Vispute, R D [Blue Wave Semiconductors; Ermer, Henry K [Blue Wave Semiconductors; Sinsky, Phillip [Blue Wave Semiconductors; Seiser, Andrew [Blue Wave Semiconductors; Shaw, Robert W [ORNL; Wilson, Leslie L [ORNL

    2014-01-01T23:59:59.000Z

    Thin diamond foils are needed in many particle accelerator experiments regarding nuclear and atomic physics, as well as in some interdisciplinary research. Particularly, nanodiamond texture is attractive for this purpose as it possesses a unique combination of diamond properties such as high thermal conductivity, mechanical strength and high radiation hardness; therefore, it is a potential material for energetic ion beam stripper foils. At the ORNL Spallation Neutron Source (SNS), the installed set of foils must be able to survive a nominal five-month operation period, without the need for unscheduled costly shutdowns and repairs. Thus, a small foil about the size of a postage stamp is critical to the operation of SNS and similar sources in U.S. laboratories and around the world. We are investigating nanocrystalline, polycrystalline and their admixture films fabricated using a hot filament chemical vapor deposition (HFCVD) system for H- stripping to support the SNS at Oak Ridge National Laboratory. Here we discuss optimization of process variables such as substrate temperature, process gas ratio of H2/Ar/CH4, substrate to filament distance, filament temperature, carburization conditions, and filament geometry to achieve high purity diamond foils on patterned silicon substrates with manageable intrinsic and thermal stresses so that they can be released as free standing foils without curling. An in situ laser reflectance interferometry tool (LRI) is used for monitoring the growth characteristics of the diamond thin film materials. The optimization process has yielded free standing foils with no pinholes. The sp3/sp2 bonds are controlled to optimize electrical resistivity to reduce the possibility of surface charging of the foils. The integrated LRI and HFCVD process provides real time information on the growth of films and can quickly illustrate growth features and control film thickness. The results are discussed in the light of development of nanodiamond foils that will be able to withstand a few MW proton beam and hopefully will be able to be used after possible future upgrades to the SNS to greater than a 3MW beam.

  19. Synthesis of SiO{sub 2}/?-SiC/graphite hybrid composite by low temperature hot filament chemical vapor deposition

    SciTech Connect (OSTI)

    Zhang, Zhikun; Bi, Kaifeng; Liu, Yanhong; Qin, Fuwen; Liu, Hongzhu [School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)] [School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China); Bian, Jiming, E-mail: jmbian@dlut.edu.cn [School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China) [School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China); Key Laboratory of Inorganic Coating Materials, Chinese Academy of Sciences, Shanghai 200050 (China); Zhang, Dong [New Energy Source Research Center of Shenyang Institute of Engineering, Shengyang 110136 (China)] [New Energy Source Research Center of Shenyang Institute of Engineering, Shengyang 110136 (China); Miao, Lihua [School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China) [School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China); Department of Computer and Mathematical Basic Teaching, Shenyang Medical College, Shenyan 110034 (China)

    2013-11-18T23:59:59.000Z

    ?-SiC thin films were synthesized directly on graphite by hot filament chemical vapor deposition at low temperature. SiH{sub 4} diluted in hydrogen was employed as the silicon source, while graphite was functioned as both substrate and carbon source for the as-grown ?-SiC films. X-ray diffraction and Fourier transform infrared analysis indicate that SiO{sub 2}/?-SiC/graphite hybrid composite was formed after post annealing treatment, and its crystalline quality can be remarkably improved under optimized annealing conditions. The possible growth mechanism was proposed based on in situ etching of graphite by reactive hydrogen radicals at the atomic level.

  20. The aging of tungsten filaments and its effect on wire surface kinetics in hot-wire chemical vapor deposition

    E-Print Network [OSTI]

    Atwater, Harry

    desorption kinetics. In particular, the Si signal exhibits a high temperature activation energy consistent vapor deposition growth have been measured by quadrupole mass spectrometry. New wires produce Si with previous measurements; the activation energy for the SiH3 signal suggests its formation is catalyzed. Aged

  1. Postsynthetic modification of metal-organic frameworks

    E-Print Network [OSTI]

    Tanabe, Kristine Kimie

    2011-01-01T23:59:59.000Z

    S. M. "Tuning Hydrogen Sorption Properties of Metal-OrganicS. M. "Tuning Hydrogen Sorption Properties of Metal-OrganicA summary of hydrogen sorption properties of three distinct

  2. Magnetism in metal-organic capsules

    SciTech Connect (OSTI)

    Atwood, Jerry L.; Brechin, Euan K; Dalgarno, Scott J.; Inglis, Ross; Jones, Leigh F.; Mossine, Andrew; Paterson, Martin J.; Power, Nicholas P.; Teat, Simon J.

    2010-01-07T23:59:59.000Z

    Nickel and cobalt seamed metal-organic capsules have been isolated and studied using structural, magnetic and computational approaches. Antiferromagnetic exchange in the Ni capsule results from coordination environments enforced by the capsule framework.

  3. Dynamic interplay between spin-crossover and host-guest function in a nanoporous metal-organic framework material.

    SciTech Connect (OSTI)

    Southon, P. D.; Liu, L.; Fellows, E. A.; Price, D. J.; Halder, G. J.; Chapman, K. W.; Moubaraki, B.; Murray, K. S.; Letard, J.F.; Kepert, C. J.; Univ. Sydney; Monash Univ.; Universite Bordeaux

    2009-01-01T23:59:59.000Z

    The nanoporous metal-organic framework [Fe(pz)Ni(CN){sub 4}], 1 (where pz is pyrazine), exhibits hysteretic spin-crossover at ambient conditions and is robust to the adsorption and desorption of a wide range of small molecular guests, both gases (N{sub 2}, O{sub 2}, CO{sub 2}) and vapors (methanol, ethanol, acetone, acetonitrile, and toluene). Through the comprehensive analysis of structure, host-guest properties, and spin-crossover behaviors, it is found that this pillared Hofmann system uniquely displays both guest-exchange-induced changes to spin-crossover and spin-crossover-induced changes to host-guest properties, with direct dynamic interplay between these two phenomena. Guest desorption and adsorption cause pronounced changes to the spin-crossover behavior according to a systematic trend in which larger guests stabilize the high-spin state and therefore depress the spin-crossover temperature of the host lattice. When stabilizing the alternate spin state of the host at any given temperature, these processes directly stimulate the spin-crossover process, providing a chemisensing function. Exploitation of the bistability of the host allows the modification of adsorption properties at a fixed temperature through control of the host spin state, with each state shown to display differing chemical affinities to guest sorption. Guest desorption then adsorption, and vice versa, can be used to switch between spin states in the bistable temperature region, adding a guest-dependent memory effect to this system.

  4. Screening values for Non-Carcinogenic Hanford Waste Tank Vapor Chemicals that Lack Established Occupational Exposure Limits

    SciTech Connect (OSTI)

    Poet, Torka S.; Mast, Terryl J.; Huckaby, James L.

    2006-02-06T23:59:59.000Z

    Over 1,500 different volatile chemicals have been reported in the headspaces of tanks used to store high-level radioactive waste at the U.S. Department of Energy's Hanford Site. Concern about potential exposure of tank farm workers to these chemicals has prompted efforts to evaluate their toxicity, identify chemicals that pose the greatest risk, and incorporate that information into the tank farms industrial hygiene worker protection program. Established occupation exposure limits for individual chemicals and petroleum hydrocarbon mixtures have been used elsewhere to evaluate about 900 of the chemicals. In this report headspace concentration screening values were established for the remaining 600 chemicals using available industrial hygiene and toxicological data. Screening values were intended to be more than an order of magnitude below concentrations that may cause adverse health effects in workers, assuming a 40-hour/week occupational exposure. Screening values were compared to the maximum reported headspace concentrations.

  5. Metal-organic and zeolite imidazolate frameworks (MOFs and ZIFs) for highly selective separations

    SciTech Connect (OSTI)

    Omar M. Yaghi

    2012-09-17T23:59:59.000Z

    Metal-organic and zeolite imidazolate frameworks (MOFs and ZIFs) have been investigated for the realization as separation media with high selectivity. These structures are held together with strong bonds, making them architecturally, chemically, and thermally stable. Therefore, employing well designed building units, it is possible to discover promising materials for gas and vapor separation. This grant was focused on the study of MOFs and ZIFs with these specific objectives: (i) to develop a strategy for producing MOFs and ZIFs that combine high surface areas with active sites for their use in gas adsorption and separation of small organic compounds, (ii) to introduce active sites in the framework by a post-synthetic modification and metalation of MOFs and ZIFs, and (iii) to design and synthesize MOFs with extremely high surface areas and large pore volumes to accommodate large amounts of guest molecules. By the systematic study, this effort demonstrated how to introduce active functional groups in the frameworks, and this is also the origin of a new strategy, which is termed isoreticular functionalization and metalation. However, a large pore volume is still a prerequisite feature. One of the solutions to overcome this challenge is an isoreticular expansion of a MOF�������¢����������������s structure. With triangular organic linker and square building units, we demonstrated that MOF-399 has a unit cell volume 17 times larger than that of the first reported material isoreticular to it, and it has the highest porosity (94%) and lowest density (0.126 g cm-3) of any MOF reported to date. MOFs are not just low density materials; the guest-free form of MOF-210 demonstrates an ultrahigh porosity, whose BET surface area was estimated to be 6240 m2 g-1 by N2 adsorption measurements.

  6. To estimate vapor pressure easily

    SciTech Connect (OSTI)

    Yaws, C.L.; Yang, H.C. (Lamar Univ., Beaumont, TX (USA))

    1989-10-01T23:59:59.000Z

    Vapor pressures as functions of temperature for approximately 700 major organic chemical compounds are given. The tabulation also gives the temperature range for which the data are applicable. Minimum and maximum temperatures are denoted by TMIN and TMAX. The Antoine equation that correlates vapor pressure as a function of temperature is described. A representative comparison of calculated and actual data values for vapor pressure is shown for ethyl alcohol. The coefficient tabulation is based on both literature (experimental data) and estimated values.

  7. Current induced annealing and electrical characterization of single layer graphene grown by chemical vapor deposition for future interconnects in VLSI circuits

    SciTech Connect (OSTI)

    Prasad, Neetu, E-mail: neetu.prasad@south.du.ac.in, E-mail: neetu23686@gmail.com; Kumari, Anita; Bhatnagar, P. K.; Mathur, P. C. [Department of Electronic Science, University of Delhi South Campus, Benito Juarez Road, New Delhi 110021 (India); Bhatia, C. S. [Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576 (Singapore)

    2014-09-15T23:59:59.000Z

    Single layer graphene (SLG) grown by chemical vapor deposition (CVD) has been investigated for its prospective application as horizontal interconnects in very large scale integrated circuits. However, the major bottleneck for its successful application is its degraded electronic transport properties due to the resist residual trapped in the grain boundaries and on the surface of the polycrystalline CVD graphene during multi-step lithographic processes, leading to increase in its sheet resistance up to 5 M?/sq. To overcome this problem, current induced annealing has been employed, which helps to bring down the sheet resistance to 10?k?/sq (of the order of its initial value). Moreover, the maximum current density of ?1.2?×?10{sup 7?}A/cm{sup 2} has been obtained for SLG (1?×?2.5??m{sup 2}) on SiO{sub 2}/Si substrate, which is about an order higher than that of conventionally used copper interconnects.

  8. Atmospheric Pressure Chemical Vapor Deposition of High Silica SiO2-TiO2 Antireflective Thin Films for Glass Based Solar Panels

    SciTech Connect (OSTI)

    Klobukowski, Erik R [ORNL; Tenhaeff, Wyatt E [ORNL; McCamy, James [PPG; Harris, Caroline [PPG; Narula, Chaitanya Kumar [ORNL

    2013-01-01T23:59:59.000Z

    The atmospheric pressure chemical vapor deposition (APCVD) of SiO2-TiO2 thin films employing [[(tBuO)3Si]2O-Ti(OiPr)2], which can be prepared from commercially available materials, results in antireflective thin films on float glass under industrially relevant manufacturing conditions. It was found that while the deposition temperature had an effect on the SiO2:TiO2 ratio, the thickness was dependent on the time of deposition. This study shows that it is possible to use APCVD employing a single source precursor containing titanium and silicon to produce thin films on float glass with high SiO2:TiO2 ratios.

  9. Toward epitaxially grown two-dimensional crystal hetero-structures: Single and double MoS{sub 2}/graphene hetero-structures by chemical vapor depositions

    SciTech Connect (OSTI)

    Lin, Meng-Yu [Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan (China); Research Center for Applied Sciences, Academia Sinica, Nankang, Taipei, Taiwan (China); Chang, Chung-En [Department of Photonics, National Chiao-Tung University, Hsinchu, Taiwan (China); Wang, Cheng-Hung [Institute of Display, National Chiao-Tung University, Hsinchu, Taiwan (China); Su, Chen-Fung; Chen, Chi [Research Center for Applied Sciences, Academia Sinica, Nankang, Taipei, Taiwan (China); Lee, Si-Chen [Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan (China); Lin, Shih-Yen, E-mail: shihyen@gate.sinica.edu.tw [Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan (China); Research Center for Applied Sciences, Academia Sinica, Nankang, Taipei, Taiwan (China); Department of Photonics, National Chiao-Tung University, Hsinchu, Taiwan (China)

    2014-08-18T23:59:59.000Z

    Uniform large-size MoS{sub 2}/graphene hetero-structures fabricated directly on sapphire substrates are demonstrated with layer-number controllability by chemical vapor deposition (CVD). The cross-sectional high-resolution transmission electron microscopy (HRTEM) images provide the direct evidences of layer numbers of MoS{sub 2}/graphene hetero-structures. Photo-excited electron induced Fermi level shift of the graphene channel are observed on the single MoS{sub 2}/graphene hetero-structure transistors. Furthermore, double hetero-structures of graphene/MoS{sub 2}/graphene are achieved by CVD fabrication of graphene layers on top of the MoS{sub 2}, as confirmed by the cross-sectional HRTEM. These results have paved the possibility of epitaxially grown multi-hetero-structures for practical applications.

  10. Direct growth of few-layer graphene on 6H-SiC and 3C-SiC/Si via propane chemical vapor deposition

    SciTech Connect (OSTI)

    Michon, A.; Vezian, S.; Portail, M. [CNRS-CRHEA, Rue Bernard Gregory, 06560 Valbonne (France); Ouerghi, A. [CNRS-LPN, Route de Nozay, 91460 Marcoussis (France); Zielinski, M.; Chassagne, T. [NOVASiC, Savoie Technolac, Arche Bat 4, BP267, 73375 Le Bourget du Lac (France)

    2010-10-25T23:59:59.000Z

    We propose to grow graphene on SiC by a direct carbon feeding through propane flow in a chemical vapor deposition reactor. X-ray photoemission and low energy electron diffraction show that propane allows to grow few-layer graphene (FLG) on 6H-SiC(0001). Surprisingly, FLG grown on (0001) face presents a rotational disorder similar to that observed for FLG obtained by annealing on (000-1) face. Thanks to a reduced growth temperature with respect to the classical SiC annealing method, we have also grown FLG/3C-SiC/Si(111) in a single growth sequence. This opens the way for large-scale production of graphene-based devices on silicon substrate.

  11. Co-Pt core-shell nanostructured catalyst prepared by selective chemical vapor pulse deposition of Pt on Co as a cathode in polymer electrolyte fuel cells

    SciTech Connect (OSTI)

    Seo, Sang-Joon; Chung, Ho-Kyoon [SKKU Advanced Institute of Nanotechnology (SAINT) and Center for Human Interface Nanotechnology (HINT), Sungkyunkwan University, Suwon, Gyeonggi 440-746 (Korea, Republic of); Yoo, Ji-Beom [SKKU Advanced Institute of Nanotechnology (SAINT) and Center for Human Interface Nanotechnology (HINT), Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea and School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746 (Korea, Republic of); Chae, Heeyeop; Seo, Seung-Woo; Min Cho, Sung, E-mail: sungmcho@skku.edu [School of Chemical Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746 (Korea, Republic of)

    2014-01-15T23:59:59.000Z

    A new type of PtCo/C catalyst for use as a cathode in polymer electrolyte fuel cells was prepared by selective chemical vapor pulse deposition (CVPD) of Pt on the surface of Co. The activity of the prepared catalyst for oxygen reduction was higher than that of a catalyst prepared by sequential impregnation (IMP) with the two metallic components. This catalytic activity difference occurs because the former catalyst has smaller Pt crystallites that produce stronger Pt-Co interactions and have a larger Pt surface area. Consequently, the CVPD catalyst has a great number of Co particles that are in close contact with the added Pt. The Pt surface was also electronically modified by interactions with Co, which were stronger in the CVPD catalyst than in the IMP catalyst, as indicated by X-ray diffraction, X-ray photoemission spectroscopy, and cyclic voltammetry measurements of the catalysts.

  12. Microwave Plasma Chemical Vapor Deposition of Nano-Structured Sn/C Composite Thin-Film Anodes for Li-ion Batteries

    SciTech Connect (OSTI)

    Stevenson, Cynthia; Marcinek, M.; Hardwick, L.J.; Richardson, T.J.; Song, X.; Kostecki, R.

    2008-02-01T23:59:59.000Z

    In this paper we report results of a novel synthesis method of thin-film composite Sn/C anodes for lithium batteries. Thin layers of graphitic carbon decorated with uniformly distributed Sn nanoparticles were synthesized from a solid organic precursor Sn(IV) tert-butoxide by a one step microwave plasma chemical vapor deposition (MPCVD). The thin-film Sn/C electrodes were electrochemically tested in lithium half cells and produced a reversible capacity of 440 and 297 mAhg{sup -1} at C/25 and 5C discharge rates, respectively. A long term cycling of the Sn/C nanocomposite anodes showed 40% capacity loss after 500 cycles at 1C rate.

  13. Chemically sensitive polymer-mediated nanoporous alumina SAW sensors for the detection of vapor-phase analytes 

    E-Print Network [OSTI]

    Perez, Gregory Paul

    2005-08-29T23:59:59.000Z

    We have investigated the chemical sensitivity of nanoporous (NP) alumina-coated surface acoustic wave (SAW) devices that have been surface-modified with polymeric mediating films. The research in this dissertation covers the refinement of the NP...

  14. Chemically sensitive polymer-mediated nanoporous alumina SAW sensors for the detection of vapor-phase analytes

    E-Print Network [OSTI]

    Perez, Gregory Paul

    2005-08-29T23:59:59.000Z

    We have investigated the chemical sensitivity of nanoporous (NP) alumina-coated surface acoustic wave (SAW) devices that have been surface-modified with polymeric mediating films. The research in this dissertation covers the refinement of the NP...

  15. Structures and Energetics of Some Potential Intermediates in Titanium Nitride Chemical Vapor Deposition: TiClm(NH2)n, TiClm(NH2)nNH, and TiClm(NH2)nN. An ab Initio

    E-Print Network [OSTI]

    Schlegel, H. Bernhard

    Structures and Energetics of Some Potential Intermediates in Titanium Nitride Chemical Vapor with these basis sets augmented by multiple sets of polarization and diffuse functions using the B3LYP optimized geometries. Bond dissociation energies, heats of atomization, heats of formation, and entropies have been

  16. Chemical beam epitaxy for high efficiency photovoltaic devices

    SciTech Connect (OSTI)

    Bensaoula, A.; Freundlich, A.; Vilela, M. F.; Medelci, N.; Renaud, P.

    1994-09-01T23:59:59.000Z

    InP-based multijunction tandem solar cells show great promise for the conversion efficiency (eta) and high radiation resistance. InP and its related ternary and quanternary compound semiconductors such as InGaAs and InGaAsP offer desirable combinations for energy bandgap values which are very suitable for multijunction tandem solar cell applications. The monolithically integrated InP/In(0.53)Ga(0.47)As tandem solar cells are expected to reach efficiencies above 30 percent. Wanlass, et.al., have reported AMO efficiencies as high as 20.1% for two terminal cells fabricated using atmospheric-pressure metalorganic vapor phase epitaxy (APMOVPE). The main limitations in their technique are first related to the degradation of the intercell ohmic contact (IOC), in this case the In(0.53)Ga(0.47)As tunnel junction during the growth of the top InP subcell structure, and second to the current matching, often limited by the In(0.53)Ga(0.47)As bottom subcell. Chemical beam epitaxy (CBE) has been shown to allow the growth of high quality materials with reproducible complex compositional and doping profiles. The main advantage of CBE compared to metalorganic chemical vapor deposition (MOCVD), the most popular technique for InP-based photovoltaic device fabrication, is the ability to grow high purity epilayers at much lower temperatures (450 C - 530 C). In a recent report it was shown that cost-wise CBE is a breakthrough technology for photovoltaic (PV) solar energy progress in the energy conversion efficiency of InP-based solar cells fabricated using chemical beam epitaxy. This communication summarizes recent results on PV devices and demonstrates the strength of this new technology.

  17. Vaporization of zinc from scrap

    SciTech Connect (OSTI)

    Ozturk, B.; Fruehan, R.J. [Carnegie Mellon Univ., Pittsburgh, PA (United States)

    1996-12-31T23:59:59.000Z

    The rate of zinc vaporization from galvanized scrap was measured using a thermogravimetric apparatus along with chemical analysis. It is found that the rate of zinc vaporization is very fast in nitrogen and carbon monoxide atmospheres at temperatures higher than 950 C. At lower temperature rate decreases with decreasing temperature and is controlled by the gas phase mass transport. The simultaneous oxidation and vaporization of zinc occurs when the samples were heated in carbon dioxide and air. The current experimental results indicate that almost all of the zinc from scrap vaporizes during the heating process in a very short period of time after the temperature reaches above 850 C.

  18. Synthesis of carbon nanotubes on diamond-like carbon by the hot filament plasma-enhanced chemical vapor deposition method

    E-Print Network [OSTI]

    Hong, Byungyou

    , scanning probes, nanoscale electronic devices, hydrogen storage, chemical sensors, and composite., 1995). These properties make CNTs good candidates for many applications such as field emission devices on a nanostructured transition metal catalyst such as Co, Ni, or Fe. The growth mechanisms of CNTs are divided

  19. Guidance Document Fume hoods are used when handling toxic or hazardous chemicals. Harmful gases, vapors and fumes

    E-Print Network [OSTI]

    Guidance Document FumeHoods Fume hoods are used when handling toxic or hazardous chemicals. Harmful the maximum safe mark (provided by Facilities Management during annual test) Use secondary containment (a hood without permission from EHS. Call EHS or Facilities Management if a hood is not functioning

  20. Direct Growth Graphene on Cu Nanoparticles by Chemical Vapor Deposition as Surface-Enhanced Raman Scattering Substrate for Label-Free Detection of Adenosine

    E-Print Network [OSTI]

    Xu, Shicai; Jiang, Shouzhen; Wang, Jihua; Wei, Jie; Xu, Shida; Liu, Hanping

    2015-01-01T23:59:59.000Z

    We present a graphene/Cu nanoparticle hybrids (G/CuNPs) system as a surface-enhanced Raman scattering (SERS) substrate for adenosine detection. The Cu nanoparticles wrapped around a monolayer graphene shell were directly synthesized on flat quartz by chemical vapor deposition in a mixture of methane and hydrogen. The G/CuNPs showed an excellent SERS enhancement activity for adenosine. The minimum detected concentration of the adenosine in serum was demonstrated as low as 5 nM, and the calibration curve showed a good linear response from 5 to 500 nM. The capability of SERS detection of adenosine in real normal human urine samples based on G/CuNPs was also investigated and the characteristic peaks of adenosine were still recognizable. The reproducible and the ultrasensitive enhanced Raman signals could be due to the presence of an ultrathin graphene layer. The graphene shell was able to enrich and fix the adenosine molecules, which could also efficiently maintain chemical and optical stability of G/CuNPs. Based...

  1. VAPOR PRESSURES AND HEATS OF VAPORIZATION OF PRIMARY COAL TARS

    SciTech Connect (OSTI)

    Eric M. Suuberg; Vahur Oja

    1997-07-01T23:59:59.000Z

    This project had as its main focus the determination of vapor pressures of coal pyrolysis tars. It involved performing measurements of these vapor pressures and from them, developing vapor pressure correlations suitable for use in advanced pyrolysis models (those models which explicitly account for mass transport limitations). This report is divided into five main chapters. Each chapter is a relatively stand-alone section. Chapter A reviews the general nature of coal tars and gives a summary of existing vapor pressure correlations for coal tars and model compounds. Chapter B summarizes the main experimental approaches for coal tar preparation and characterization which have been used throughout the project. Chapter C is concerned with the selection of the model compounds for coal pyrolysis tars and reviews the data available to us on the vapor pressures of high boiling point aromatic compounds. This chapter also deals with the question of identifying factors that govern the vapor pressures of coal tar model materials and their mixtures. Chapter D covers the vapor pressures and heats of vaporization of primary cellulose tars. Chapter E discusses the results of the main focus of this study. In summary, this work provides improved understanding of the volatility of coal and cellulose pyrolysis tars. It has resulted in new experimentally verified vapor pressure correlations for use in pyrolysis models. Further research on this topic should aim at developing general vapor pressure correlations for all coal tars, based on their molecular weight together with certain specific chemical characteristics i.e. hydroxyl group content.

  2. Porous Materials -Metal-Organic Frameworks

    E-Print Network [OSTI]

    Tsymbal, Evgeny Y.

    ShellsSnow Coral SoilBoneLungs Lemons #12;Artificial Porous Materials Insulation Cake Concrete BreadPorous Materials -Metal-Organic Frameworks 2012 Nanocamp NCMN, UNL Dr. Jian Zhang & Jacob Johnson-organic Frameworks Porous polymer networks #12;Porous Materials in Nature Sandstones Sea Sponge Butterfly Wings Egg

  3. Photoluminescence of GaAs films grown by vacuum chemical epitaxy

    SciTech Connect (OSTI)

    Bernussi, A.A.; Barreto, C.L.; Carvalho, M.M.G.; Motisuke, P.

    1988-08-01T23:59:59.000Z

    GaAs layers grown by vacuum chemical epitaxy (VCE) are investigated by low-temperature photoluminescence. A qualitative relation between the growth parameters and the shallow-impurity-incorporation mechanism is established. It was observed that the predominant shallow acceptor is carbon, and its incorporation during the growth process decreases with the As:Ga ratio, increases with growth temperature until 750 /sup 0/C, and then it diminishes. In this work we compare the characteristics observed in the VCE system with those in conventional molecular-beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD). Our results show that this system contains some advantages from both the MBE and MOCVD systems. The photoluminescence spectra also show that at low As:Ga ratios the generation of As vacancies or its complexes is strongly enhanced.

  4. A three-dimensional analysis of the flow and heat transfer for the modified chemical vapor deposition process including buoyancy, variable properties, and tube rotation

    SciTech Connect (OSTI)

    Lin, Y.T.; Choi, M.; Greif, R. (Univ. of California, Berkeley (USA))

    1991-05-01T23:59:59.000Z

    A study has been made of the heat transfer, flow, and particle deposition relative to the modified chemical vapor deposition (MCVD) process. The effects of variable properties, buoyancy, and tube rotation have been included in the study. The resulting three-dimensional temperature and velocity fields have been obtained for a range of conditions. The effects of buoyancy result in asymmetric temperature and axial velocity profiles with respect to the tube axis. Variable properties cause significant variations in the axial velocity along the tube and in the secondary flow in the region near the torch. Particle trajectories are shown to be strongly dependent on the tube rotation and are helices for large rotational speeds. The component of secondary flow in the radial direction is compared to the thermophoretic velocity, which is the primary cause of particle deposition in the MCVD process. Over the central portion of the tube the radial component of the secondary flow is most important in determining the motion of the particles.

  5. Effects of thermal annealing on the structural, mechanical, and tribological properties of hard fluorinated carbon films deposited by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Maia da Costa, M.E.H.; Baumvol, I.J.R.; Radke, C.; Jacobsohn, L.G.; Zamora, R.R.M.; Freire, F.L. Jr. [Departamento de Fisica, Pontificia Universidade Catolica do Rio de Janeiro, Cx. Postal 3807, Rio de Janeiro, RJ, 22453-970 (Brazil); Instituto de Fisica, Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, 91540-000 (Brazil); Los Alamos National Laboratory, Materials Science and Technology Division, P. O. Box 1663, Los Alamos, New Mexico 87545 (United States); Departamento de Fisica, Pontificia Universidade Catolica do Rio de Janeiro, Cx. Postal 3807, Rio de Janeiro, RJ, 22453-970 (Brazil)

    2004-11-01T23:59:59.000Z

    Hard amorphous fluorinated carbon films (a-C:F) deposited by plasma enhanced chemical vapor deposition were annealed in vacuum for 30 min in the temperature range of 200-600 deg. C. The structural and compositional modifications were followed by several analytical techniques: Rutherford backscattering spectrometry (RBS), elastic recoil detection analysis (ERDA), x-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. Nanoidentation measurements and lateral force microscopy experiments were carried out in order to provide the film hardness and the friction coefficient, respectively. The internal stress and contact angle were also measured. RBS, ERDA, and XPS results indicate that both fluorine and hydrogen losses occur for annealing temperatures higher than 300 deg. C. Raman spectroscopy shows a progressive graphitization upon annealing, while the surface became slightly more hydrophobic as revealed by the increase of the contact angle. Following the surface wettability reduction, a decrease of the friction coefficient was observed. These results highlight the influence of the capillary condensation on the nanoscale friction. The film hardness and the internal stress are constant up to 300 deg. C and decrease for higher annealing temperatures, showing a direct correlation with the atomic density of the films. Since the thickness variation is negligible, the mass loss upon thermal treatment results in amorphous structures with a lower degree of cross-linking, explaining the deterioration of the mechanical properties of the a-C:F films.

  6. Wear Mechanism of Chemical Vapor Deposition (CVD) Carbide Insert in Orthogonal Cutting Ti-6Al-4V ELI at High Cutting Speed

    SciTech Connect (OSTI)

    Gusri, A. I.; Che Hassan, C. H.; Jaharah, A. G. [Mechanical and Material Engineering Department, Universiti Kebangsaan Malaysia, Bangi 43600 (Malaysia)

    2011-01-17T23:59:59.000Z

    The performance of Chemical Vapor Deposition (CVD) carbide insert with ISO designation of CCMT 12 04 04 LF, when turning titanium alloys was investigated. There were four layers of coating materials for this insert i.e.TiN-Al2O3-TiCN-TiN. The insert performance was evaluated based on the insert's edge resistant towards the machining parameters used at high cutting speed range of machining Ti-6Al-4V ELI. Detailed study on the wear mechanism at the cutting edge of CVD carbide tools was carried out at cutting speed of 55-95 m/min, feed rate of 0.15-0.35 mm/rev and depth of cut of 0.10-0.20 mm. Wear mechanisms such as abrasive and adhesive were observed on the flank face. Crater wear due to diffusion was also observed on the rake race. The abrasive wear occurred more at nose radius and the fracture on tool were found at the feed rate of 0.35 mm/rev and the depth of cut of 0.20 mm. The adhesion wear takes place after the removal of the coating or coating delaminating. Therefore, adhesion or welding of titanium alloy onto the flank and rake faces demonstrates a strong bond at the workpiece-tool interface.

  7. Effects of pressure, temperature, and hydrogen during graphene growth on SiC(0001) using propane-hydrogen chemical vapor deposition

    SciTech Connect (OSTI)

    Michon, A.; Vezian, S.; Roudon, E.; Lefebvre, D.; Portail, M. [CNRS-CRHEA, Rue Bernard Gregory, 06560 Valbonne (France)] [CNRS-CRHEA, Rue Bernard Gregory, 06560 Valbonne (France); Zielinski, M.; Chassagne, T. [NOVASiC, Savoie Technolac, Arche Bat 4, BP267, 73375 Le Bourget du Lac (France)] [NOVASiC, Savoie Technolac, Arche Bat 4, BP267, 73375 Le Bourget du Lac (France)

    2013-05-28T23:59:59.000Z

    Graphene growth from a propane flow in a hydrogen environment (propane-hydrogen chemical vapor deposition (CVD)) on SiC differentiates from other growth methods in that it offers the possibility to obtain various graphene structures on the Si-face depending on growth conditions. The different structures include the (6{radical}3 Multiplication-Sign 6{radical}3)-R30 Degree-Sign reconstruction of the graphene/SiC interface, which is commonly observed on the Si-face, but also the rotational disorder which is generally observed on the C-face. In this work, growth mechanisms leading to the formation of the different structures are studied and discussed. For that purpose, we have grown graphene on SiC(0001) (Si-face) using propane-hydrogen CVD at various pressure and temperature and studied these samples extensively by means of low energy electron diffraction and atomic force microscopy. Pressure and temperature conditions leading to the formation of the different structures are identified and plotted in a pressure-temperature diagram. This diagram, together with other characterizations (X-ray photoemission and scanning tunneling microscopy), is the basis of further discussions on the carbon supply mechanisms and on the kinetics effects. The entire work underlines the important role of hydrogen during growth and its effects on the final graphene structure.

  8. Strain effects and microstructural evolution in Ge-Si system materials prepared by ion implantation and by ultrahigh vacuum chemical vapor deposition

    SciTech Connect (OSTI)

    Tu Hailing; Xiao Qinghua; Ma Tongda [General Research Institute for Non-ferrous Metals, No. 2, Xinjiekouwai Street, Beijing 100088 (China)

    2007-11-15T23:59:59.000Z

    Appropriately utilizing some microstructures may be very helpful to acquire desirable Ge-Si system materials. In this work, the Ge-Si system materials have been prepared either by ion implantation or ultrahigh vacuum chemical vapor deposition (UHVCVD). The interesting microstructures including half-loop dislocations, SiGe nanoclusters, and dislocation dipoles have been found in these two kinds of Ge-Si system materials. It is demonstrated that the evident surface strain state and adequate surface layer quality have been realized by employing these microstructures. Compared with the dipole dislocations in the Ge-Si systems deposited by UHVCVD on the compliant silicon on insulator, the half-loop dislocations and the SiGe nanoclusters induced by Ge ion implantation and subsequent annealing can relax the SiGe layer more effectively and lead to relatively large strain in the surface silicon. It may provide some new approaches to the control of misfit strains for fabricating desirable Ge-Si system materials.

  9. High Throughput Combinatorial Screening of Biometic Metal-Organic...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    High Throughput Combinatorial Screening of Biometic Metal-Organic Materials for Military Hydrogen-Storage Materials (New Joint Miami UNREL DoDDLA Project) (presentation) High...

  10. Sandia National Laboratories: metal-organic framework materials

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    metal-organic framework materials Combining 'Tinkertoy' Materials with Solar Cells for Increased Photovoltaic Efficiency On December 4, 2014, in Energy, Materials Science, News,...

  11. Gas-phase transport of WF6 through annular nanopipes in TiN during chemical vapor deposition of W on TiN/Ti/SiO2 structures for integrated

    E-Print Network [OSTI]

    Allen, Leslie H.

    Gas-phase transport of WF6 through annular nanopipes in TiN during chemical vapor deposition of W through the 106-nm-thick TiN film. W piles up at the TiN/Ti interface, while F rapidly saturates the TiN-sectional and scanning transmission electron microscopy analyses demonstrate that WF6 penetrates into the TiN layer

  12. SPIN (Version 3. 83): A Fortran program for modeling one-dimensional rotating-disk/stagnation-flow chemical vapor deposition reactors

    SciTech Connect (OSTI)

    Coltrin, M.E. (Sandia National Labs., Albuquerque, NM (United States)); Kee, R.J.; Evans, G.H.; Meeks, E.; Rupley, F.M.; Grcar, J.F. (Sandia National Labs., Livermore, CA (United States))

    1991-08-01T23:59:59.000Z

    In rotating-disk reactor a heated substrate spins (at typical speeds of 1000 rpm or more) in an enclosure through which the reactants flow. The rotating disk geometry has the important property that in certain operating regimes{sup 1} the species and temperature gradients normal to the disk are equal everywhere on the disk. Thus, such a configuration has great potential for highly uniform chemical vapor deposition (CVD),{sup 2--5} and indeed commercial rotating-disk CVD reactors are now available. In certain operating regimes, the equations describing the complex three-dimensional spiral fluid motion can be solved by a separation-of-variables transformation{sup 5,6} that reduces the equations to a system of ordinary differential equations. Strictly speaking, the transformation is only valid for an unconfined infinite-radius disk and buoyancy-free flow. Furthermore, only some boundary conditions are consistent with the transformation (e.g., temperature, gas-phase composition, and approach velocity all specified to be independent of radius at some distances above the disk). Fortunately, however, the transformed equations will provide a very good practical approximation to the flow in a finite-radius reactor over a large fraction of the disk (up to {approximately}90% of the disk radius) when the reactor operating parameters are properly chosen, i.e, high rotation rates. In the limit of zero rotation rate, the rotating disk flow reduces to a stagnation-point flow, for which a similar separation-of-variables transformation is also available. Such flow configurations ( pedestal reactors'') also find use in CVD reactors. In this report we describe a model formulation and mathematical analysis of rotating-disk and stagnation-point CVD reactors. Then we apply the analysis to a compute code called SPIN and describe its implementation and use. 31 refs., 4 figs.

  13. The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process

    SciTech Connect (OSTI)

    Shoup, S.S.; White, M.K.; Krebs, S.L.; Darnell, N.; King, A.C.; Mattox, D.S.; Campbell, I.H.; Marken, K.R.; Hong, S.; Czabaj, B.; Paranthaman, M.; Christen, H.M.; Zhai, H.-Y. Specht, E.

    2008-06-24T23:59:59.000Z

    The innovative Combustion Chemical Vapor Deposition (CCVD) process is a non-vacuum technique that is being investigated to enable next generation products in several application areas including high-temperature superconductors (HTS). In combination with the Rolling Assisted Biaxially Textured Substrate (RABiTS) technology, the CCVD process has significant promise to provide low-cost, high-quality lengths of YBCO coated conductor. Over 100 meter lengths of both Ni and Ni-W (3 at. Wt.%) substrates with a surface roughness of 12-18 nm were produced. The CCVD technology has been used to deposit both buffer layer coatings as well as YBCO superconducting layers. Buffer layer architecture of strontium titanate (SrTiO{sub 3}) and ceria (CeO{sub 2}) have been deposited by CCVD on textured nickel substrates and optimized to appropriate thicknesses and microstructures to provide templates for growing PLD YBCO with a J{sub c} of 1.1 MA/cm{sup 2} at 77 K and self-field. The CCVD buffer layers have been scaled to meter plus lengths with good epitaxial uniformity along the length. A short sample cut from one of the lengths enabled high critical current density PLD YBCO. Films of CCVD YBCO superconductors have been grown on single crystal substrates with critical current densities over 1 MA/cm{sup 2}. In addition, superconducting YBCO films with an I{sub c} of 60 A/cm-width (J{sub c} = 1.5 MA/cm{sup 2}) were grown on ORNL RABiTS (CeO{sub 2}/YSZ/Y{sub 2}O{sub 3}/Ni/Ni-3W) using CCVD process.

  14. Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition

    SciTech Connect (OSTI)

    Matsuoka, M.; Isotani, S.; Mittani, J.C.R.; Chubaci, J.F.D.; Ogata, K.; Kuratani, N. [Institute of Physics, University of Sao Paulo, C. P. 66318, 05315-970, Sao Paolo, SP (Brazil); Nissin Electric Company, Ltd., 47, Umezu-Takase-cho, Ukyo-ku, Kyota 615-8686 (Japan)

    2005-01-01T23:59:59.000Z

    Thin titanium nitride films were prepared at room temperature by titanium metal vapor deposition on silicon substrates with simultaneous irradiation by a 2 keV nitrogen ion beam. Arrival rate ratios, ARR(N/Ti), defined as the ratio of the flux of incident atomic nitrogen particles in the ion beam relative to the flux of titanium atoms transported to the substrate, ranged from 0.17 to 2.5. The gas pressure in the vacuum chamber was maintained at 1.3x10{sup -3} or 6.7x10{sup -3} Pa during the deposition and irradiation process. Analyses of Ti 2p x-ray photoelectron spectroscopy spectra indicated the presence of metal Ti{sup 0}, nitride TiN, oxide TiO{sub 2}, oxynitride TiN{sub x}O{sub y}, and carbide TiC phases. The Ti{sup 0} phase was observed exclusively and predominantly in the films prepared at 1.3x10{sup -3} Pa and ARR(N/Ti)=0.17, 0.21, and 0.28, and the TiN phase is major in the others, as confirmed by the x-ray diffractometry analyses. The chemical composition ratio N/Ti in the films prepared at 1.3x10{sup -3} Pa increased linearly with increasing ARR(N/Ti) up to ARR(N/Ti)=0.42 and tended to be constant with further increase in ARR(N/Ti), while this ratio in the films prepared at 6.7x10{sup -3} Pa was almost constant independently of ARR(N/Ti), similar to the constant value observed at 1.3x10{sup -3} Pa and higher ARR(N/Ti). This dependence may be understood by comparison with the flux of evaporated titanium atoms, the flux of nitrogen in the beam, and the impingement rate of nitrogen gas in the vacuum chamber, evaluated through the kinetic theory of gases. On the other hand, titanium is known to be one of the chemically active materials which form stable compounds with gases by chemisorption, this fact leading to considerable incorporation of contaminant oxygen and carbon in the depositing titanium film.

  15. Vapor deposition of thin films

    DOE Patents [OSTI]

    Smith, David C. (Los Alamos, NM); Pattillo, Stevan G. (Los Alamos, NM); Laia, Jr., Joseph R. (Los Alamos, NM); Sattelberger, Alfred P. (Los Alamos, NM)

    1992-01-01T23:59:59.000Z

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  16. Portable vapor diffusion coefficient meter

    DOE Patents [OSTI]

    Ho, Clifford K. (Albuquerque, NM)

    2007-06-12T23:59:59.000Z

    An apparatus for measuring the effective vapor diffusion coefficient of a test vapor diffusing through a sample of porous media contained within a test chamber. A chemical sensor measures the time-varying concentration of vapor that has diffused a known distance through the porous media. A data processor contained within the apparatus compares the measured sensor data with analytical predictions of the response curve based on the transient diffusion equation using Fick's Law, iterating on the choice of an effective vapor diffusion coefficient until the difference between the predicted and measured curves is minimized. Optionally, a purge fluid can forced through the porous media, permitting the apparatus to also measure a gas-phase permeability. The apparatus can be made lightweight, self-powered, and portable for use in the field.

  17. Metal-Organic Heat Carrier Nanofluids. | EMSL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Calculations for an R123 MOHC nanofluid indicated potential for up to 15% increase in power output. Capillary tube experiments show that liquid-vapor transitions occur without...

  18. Sandia National Laboratories: solid-state lighting science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    that illustrated the differences ... Assessment of deep level defects in m-plane GaN grown by metalorganic chemical vapor deposition On February 22, 2012, in Energy...

  19. LNG fire and vapor control system technologies

    SciTech Connect (OSTI)

    Konzek, G.J.; Yasutake, K.M.; Franklin, A.L.

    1982-06-01T23:59:59.000Z

    This report provides a review of fire and vapor control practices used in the liquefied natural gas (LNG) industry. Specific objectives of this effort were to summarize the state-of-the-art of LNG fire and vapor control; define representative LNG facilities and their associated fire and vapor control systems; and develop an approach for a quantitative effectiveness evaluation of LNG fire and vapor control systems. In this report a brief summary of LNG physical properties is given. This is followed by a discussion of basic fire and vapor control design philosophy and detailed reviews of fire and vapor control practices. The operating characteristics and typical applications and application limitations of leak detectors, fire detectors, dikes, coatings, closed circuit television, communication systems, dry chemicals, water, high expansion foam, carbon dioxide and halogenated hydrocarbons are described. Summary descriptions of a representative LNG peakshaving facility and import terminal are included in this report together with typical fire and vapor control systems and their locations in these types of facilities. This state-of-the-art review identifies large differences in the application of fire and vapor control systems throughout the LNG industry.

  20. Process diagnostics and thickness metrology using in situ mass spectrometry for the chemical vapor deposition of W from H2 WF6

    E-Print Network [OSTI]

    Gougousi, Theodosia

    response time 4 s sensor system sampled gas directly from a commercial Ulvac ERA-1000 reactor in order wafers, at 67 Pa 0.5 Torr total pressure, and for wafer temperatures around 400 °C. A relatively fast An ideal real-time chemical sensor for monitoring pro- cesses involving multicomponent gas mixtures would

  1. A Catenated Strut in a Catenated Metal–Organic Framework

    SciTech Connect (OSTI)

    Li, Qiaowei [Fudan Univ., Shanghai (China); Sue, Chi-Hau [Univ. of California, Los Angeles, CA (United States); Basu, Subhadeep [Northwestern Univ., Evanston, IL (United States); Shveyd, Alexander K. [Northwestern Univ., Evanston, IL (United States); Zhang, Wenyu [Univ. of California, Los Angeles, CA (United States); Barin, Gokhan [Northwestern Univ., Evanston, IL (United States); Fang, Lei [Northwestern Univ., Evanston, IL (United States); Sarjeant, Amy A. [Northwestern Univ., Evanston, IL (United States); Stoddart, J. Fraser [Northwestern Univ., Evanston, IL (United States); Yaghi, Omar M [Univ. of California, Los Angeles, CA (United States)

    2010-01-01T23:59:59.000Z

    Mechanically interlocked molecules (MIMs), in the form of donor–acceptor [2]catenane-containing struts of exceptional length, have been incorporated into a three-dimensional catenated metal–organic framework (MOF) at precise locations and with uniform relative orientations. Catenation is expressed simultaneously within the struts and the framework.

  2. Hydrogen Storage in Metal-Organic Frameworks

    SciTech Connect (OSTI)

    Omar M. Yaghi

    2012-04-26T23:59:59.000Z

    Conventional storage of large amounts of hydrogen in its molecular form is difficult and expensive because it requires employing either extremely high pressure gas or very low temperature liquid. Because of the importance of hydrogen as a fuel, the DOE has set system targets for hydrogen storage of gravimetric (5.5 wt%) and volumetric (40 g L-1) densities to be achieved by 2015. Given that these are system goals, a practical material will need to have higher capacity when the weight of the tank and associated cooling or regeneration system is considered. The size and weight of these components will vary substantially depending on whether the material operates by a chemisorption or physisorption mechanism. In the latter case, metal-organic frameworks (MOFs) have recently been identified as promising adsorbents for hydrogen storage, although little data is available for their sorption behavior. This grant was focused on the study of MOFs with these specific objectives. (1) To examine the effects of functionalization, catenation, and variation of the metal oxide and organic linkers on the low-pressure hydrogen adsorption properties of MOFs. (2) To develop a strategy for producing MOFs with high surface area and porosity to reduce the dead space and increase the hydrogen storage capacity per unit volume. (3) To functionalize MOFs by post synthetic functionalization with metals to improve the adsorption enthalpy of hydrogen for the room temperature hydrogen storage. This effort demonstrated the importance of open metal sites to improve the adsorption enthalpy by the systematic study, and this is also the origin of the new strategy, which termed isoreticular functionalization and metalation. However, a large pore volume is still a prerequisite feature. Based on our principle to design highly porous MOFs, guest-free MOFs with ultrahigh porosity have been experimentally synthesized. MOF-210, whose BET surface area is 6240 m2 g-1 (the highest among porous solids), takes up 15 wt% of total H2 uptake at 80 bar and 77 K. More importantly, the total H2 uptake by MOF-210 was 2.7 wt% at 80 bar and 298 K, which is the highest number reported for physisorptive materials.

  3. Vapor-Phase Metalation by Atomic Layer Deposition in a Metal-Organic Framework

    E-Print Network [OSTI]

    encompass deposition onto micro- and nanopowders14 and coating of nanoparticle films15 as well as aerogel coating of porous materials that exhibit ultrahigh-aspect ratios.12,13 To date, some striking examples

  4. Effect of NH{sub 3} on the low pressure chemical vapor deposition of TiO{sub 2} film at low temperature using tetrakis(diethylamino)titanium and oxygen

    SciTech Connect (OSTI)

    Song Xuemei; Takoudis, Christos G. [Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607 (United States); Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607 and Department of Bioengineering, University of Illinois at Chicago, Chicago, Illinois 60607 (United States)

    2007-03-15T23:59:59.000Z

    The effect of NH{sub 3} on TiO{sub 2} film deposition using tetrakis(diethylamino)titanium (TDEAT) and O{sub 2} as source gases in a low pressure chemical vapor deposition reactor was studied at low temperatures ranging from 100 to 250 deg. C. TiO{sub 2} film is traditionally deposited at temperature above 300 deg. C using oxygen-based Ti precursors, such as titanium tetraisopropoxide. In this study, the authors demonstrate that a combination of both reactive precursors, i.e., TDEAT and NH{sub 3}, is an effective technique for TiO{sub 2} film deposition at lower temperatures, albeit with some nitrogen incorporation. It was found that films can be formed at temperatures as low as 100 deg. C when NH{sub 3} is used. At higher temperatures, the growth rate of TiO{sub 2} films deposited using NH{sub 3} is higher than that of films deposited without NH{sub 3} by up to one order of magnitude. X-ray photoelectron spectroscopy data show that NH{sub 3} enhances the formation of TiNO and TiN, and x-ray diffraction analysis shows that all as-deposited films have amorphous structure. Both x-ray photoelectron spectroscopy and secondary ion mass spectroscopy depth profiles show that nitrogen, carbon, and oxygen are uniformly distributed throughout the film. The mechanism of enhancement of growth rate using NH{sub 3} is also discussed.

  5. Vapor spill monitoring method

    DOE Patents [OSTI]

    Bianchini, Gregory M. (Livermore, CA); McRae, Thomas G. (Livermore, CA)

    1985-01-01T23:59:59.000Z

    Method for continuous sampling of liquified natural gas effluent from a spill pipe, vaporizing the cold liquified natural gas, and feeding the vaporized gas into an infrared detector to measure the gas composition. The apparatus utilizes a probe having an inner channel for receiving samples of liquified natural gas and a surrounding water jacket through which warm water is flowed to flash vaporize the liquified natural gas.

  6. Atomic-vapor-laser isotope separation

    SciTech Connect (OSTI)

    Davis, J.I.

    1982-10-01T23:59:59.000Z

    This paper gives a brief history of the scientific considerations leading to the development of laser isotope separation (LIS) processes. The close relationship of LIS to the broader field of laser-induced chemical processes is evaluated in terms of physical criteria to achieve an efficient production process. Atomic-vapor LIS processes under development at Livermore are reviwed. 8 figures.

  7. Enabling integration of vapor-deposited polymer thin films

    E-Print Network [OSTI]

    Petruczok, Christy D. (Christy Danielle)

    2014-01-01T23:59:59.000Z

    Initiated Chemical Vapor Deposition (iCVD) is a versatile, one-step process for synthesizing conformal and functional polymer thin films on a variety of substrates. This thesis emphasizes the development of tools to further ...

  8. Design, Synthesis, and Characterization of Porous Metal-Organic Materials

    E-Print Network [OSTI]

    Park, Jinhee

    2013-04-19T23:59:59.000Z

    Isophthalic Acid SBUs Secondary Building Units srMOP Stimuli-Responsive Metal-Organic Polyhedra viii STP Standard Temperature and Pressure TEA Triethylamine TGA Thermal Gravimetric Analysis UMC Unsaturated Metal Center UV Ultraviolet Vis Visible...).. ................. 74 IV-9 Nonlinear curve fitting of CH4 adsorption isotherms at 273 K and 295 K (a) and CH4 heat of adsorption for PCN-124 (b). ................................ 75 V-1 The trans to cis isomerization of the ligand induced by UV...

  9. Cadmium and Zinc Thiolate and Selenolate Metal-Organic Frameworks

    SciTech Connect (OSTI)

    Turner, D.; Stone, K; Stephens, P; Vaid, T

    2010-01-01T23:59:59.000Z

    Metal-organic frameworks based on metal-sulfur or metal-selenium bonds are relatively rare; herein we describe the synthesis and structural characterization of several examples, including, for example, [Cd(en){sub 3}][Cd(SC{sub 6}H{sub 4}S){sub 2}], which contains the anionic two-dimensional square-grid network [Cd(SC{sub 6}H{sub 4}S){sub 2}]{sub n}{sup 2n-}.

  10. Temperature dependent vapor pressures of chlorinated catechols, syringols, and syringaldehydes

    SciTech Connect (OSTI)

    Lei, Y.D.; Shiu, W.Y.; Boocock, D.G.B. [Univ. of Toronto, Ontario (Canada). Dept. of Chemical Engineering and Applied Chemistry] [Univ. of Toronto, Ontario (Canada). Dept. of Chemical Engineering and Applied Chemistry; Wania, F. [WECC Wania Environmental Chemists Corp., Toronto, Ontario (Canada)] [WECC Wania Environmental Chemists Corp., Toronto, Ontario (Canada)

    1999-03-01T23:59:59.000Z

    The vapor pressures of nine chlorinated catechols, syringols, and syringaldehydes were determined as a function of temperature with a gas chromatographic retention time technique. The vapor pressures at 298.15 K were in the range of 0.02--1 Pa, and the enthalpies of vaporization, between 68 and 82 kJ/mol. The validity of the technique was established by a calibration involving four chlorinated phenols with well-known vapor pressures. Using these data and previously reported solubility data, Henry`s law constants for these substances and some chlorinated guaiacols and veratrols were estimated. The vapor pressure of these substances tends to decrease with increasing polarity and an increasing number of chlorine atoms. Henry`s law constants decrease sharply with increasing polarity, suggesting that methylation can result in a significant increase in a chemical`s potential for volatilization from water.

  11. Chemical vapor deposition of aluminum oxide

    DOE Patents [OSTI]

    Gordon, Roy (Cambridge, MA); Kramer, Keith (Cleveland, OH); Liu, Xinye (Cambridge, MA)

    2000-01-01T23:59:59.000Z

    An aluminum oxide film is deposited on a heated substrate by CVD from one or more alkylaluminum alkoxide compounds having composition R.sub.n Al.sub.2 (OR').sub.6-n, wherein R and R' are alkyl groups and n is in the range of 1 to 5.

  12. Metal-Organic Frameworks for Highly Selective Separations

    SciTech Connect (OSTI)

    Omar M. Yaghi

    2009-09-28T23:59:59.000Z

    This grant was focused on the study of metal-organic frameworks with these specific objectives. (1) To examine the use of MOFs with well-defined open metal sites for binding of gases and small organics. (2) To develop a strategy for producing MOFs that combine large pore size with high surface area for their use in gas adsorption and separation of polycyclic organic compounds. (3) To functionalize MOFs for the storage of inert gases such as methane. A brief outline of our progress towards these objectives is presented here as it forms part of the basis for the ideas to be developed under the present proposal.

  13. Electron-Vibron Coupling at Metal-Organic Interfaces

    E-Print Network [OSTI]

    Rosenow, Phil; Tonner, Ralf

    2015-01-01T23:59:59.000Z

    We study the significance and characteristics of interfacial dynamical charge transfer at metal-organic interfaces for the model system of organic semiconductor NTCDA on Ag(111). We combine infrared absorption spectroscopy and dispersion-corrected density functional theory calculations to analyze dynamic dipole moments and electron-vibron coupling at the interface. We demonstrate that interfacial dynamical charge transfer is the dominant cause of infrared activity in these systems and that it correlates with results from partial charge and density of states analysis. Nuclear motion generates an additional dynamic dipole moment but represents a minor effect except for modes with significant out-of-plane amplitudes.

  14. Quantum cascade laser investigations of CH{sub 4} and C{sub 2}H{sub 2} interconversion in hydrocarbon/H{sub 2} gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond

    SciTech Connect (OSTI)

    Ma Jie; Cheesman, Andrew; Ashfold, Michael N. R. [School of Chemistry, University of Bristol, Bristol BS8 1TS (United Kingdom); Hay, Kenneth G.; Wright, Stephen; Langford, Nigel; Duxbury, Geoffrey [Department of Physics, University of Strathclyde, John Anderson Building, 107 Rottenrow, Glasgow G4 0NG (United Kingdom); Mankelevich, Yuri A. [Skobel'tsyn Institute of Nuclear Physics, Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation)

    2009-08-01T23:59:59.000Z

    CH{sub 4} and C{sub 2}H{sub 2} molecules (and their interconversion) in hydrocarbon/rare gas/H{sub 2} gas mixtures in a microwave reactor used for plasma enhanced diamond chemical vapor deposition (CVD) have been investigated by line-of-sight infrared absorption spectroscopy in the wavenumber range of 1276.5-1273.1 cm{sup -1} using a quantum cascade laser spectrometer. Parameters explored include process conditions [pressure, input power, source hydrocarbon, rare gas (Ar or Ne), input gas mixing ratio], height (z) above the substrate, and time (t) after addition of hydrocarbon to a pre-existing Ar/H{sub 2} plasma. The line integrated absorptions so obtained have been converted to species number densities by reference to the companion two-dimensional (r,z) modeling of the CVD reactor described in Mankelevich et al. [J. Appl. Phys. 104, 113304 (2008)]. The gas temperature distribution within the reactor ensures that the measured absorptions are dominated by CH{sub 4} and C{sub 2}H{sub 2} molecules in the cool periphery of the reactor. Nonetheless, the measurements prove to be of enormous value in testing, tensioning, and confirming the model predictions. Under standard process conditions, the study confirms that all hydrocarbon source gases investigated (methane, acetylene, ethane, propyne, propane, and butane) are converted into a mixture dominated by CH{sub 4} and C{sub 2}H{sub 2}. The interconversion between these two species is highly dependent on the local gas temperature and the H atom number density, and thus on position within the reactor. CH{sub 4}->C{sub 2}H{sub 2} conversion occurs most efficiently in an annular shell around the central plasma (characterized by 1400CH{sub 4} is favored in the more distant regions where T{sub gas}<1400 K. Analysis of the multistep interconversion mechanism reveals substantial net consumption of H atoms accompanying the CH{sub 4}->C{sub 2}H{sub 2} conversion, whereas the reverse C{sub 2}H{sub 2}->CH{sub 4} process only requires H atoms to drive the reactions; H atoms are not consumed by the overall conversion.

  15. Tetratopic phenyl compounds, related metal-organic framework materials and post-assembly elaboration

    DOE Patents [OSTI]

    Farha, Omar K; Hupp, Joseph T

    2013-06-25T23:59:59.000Z

    Disclosed are tetratopic carboxylic acid phenyl for use in metal-organic framework compounds. These compounds are useful in catalysis, gas storage, sensing, biological imaging, drug delivery and gas adsorption separation.

  16. Tetratopic phenyl compounds, related metal-organic framework materials and post-assembly elaboration

    DOE Patents [OSTI]

    Farha, Omar K.; Hupp, Joseph T.

    2012-09-11T23:59:59.000Z

    Disclosed are tetratopic carboxylic acid phenyl for use in metal-organic framework compounds. These compounds are useful in catalysis, gas storage, sensing, biological imaging, drug delivery and gas adsorption separation.

  17. Industrially challenging separations via adsorption in metal-organic frameworks : a computational exploration 

    E-Print Network [OSTI]

    Lennox, Matthew James

    2015-06-29T23:59:59.000Z

    In recent years, metal-organic frameworks (MOFs) have been identified as promising adsorbents in a number of industrially relevant, yet challenging, separations, including the removal of propane from propane/propylene ...

  18. Vapor generation methods for explosives detection research. ...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Vapor generation methods for explosives detection research. Vapor generation methods for explosives detection research. Abstract: The generation of calibrated vapor samples of...

  19. Electrolyte vapor condenser

    DOE Patents [OSTI]

    Sederquist, R.A.; Szydlowski, D.F.; Sawyer, R.D.

    1983-02-08T23:59:59.000Z

    A system is disclosed for removing electrolyte from a fuel cell gas stream. The gas stream containing electrolyte vapor is supercooled utilizing conventional heat exchangers and the thus supercooled gas stream is passed over high surface area passive condensers. The condensed electrolyte is then drained from the condenser and the remainder of the gas stream passed on. The system is particularly useful for electrolytes such as phosphoric acid and molten carbonate, but can be used for other electrolyte cells and simple vapor separation as well. 3 figs.

  20. Reaction Engineering with Metal-Organic Framework Catalysts

    E-Print Network [OSTI]

    Melkonian, Arek

    2013-01-01T23:59:59.000Z

    Propylene Oxide. Chemical and Engineering News 2004, 5.orthogonal collocation. Chemical Engineering Science 1971,Temperature Cycling. Chemical Engineering Science 1980, 35,

  1. Organic vapor jet printing system

    DOE Patents [OSTI]

    Forrest, Stephen R

    2012-10-23T23:59:59.000Z

    An organic vapor jet printing system includes a pump for increasing the pressure of an organic flux.

  2. Metal-organic frameworks for Xe/Kr separation

    DOE Patents [OSTI]

    Ryan, Patrick J.; Farha, Omar K.; Broadbelt, Linda J.; Snurr, Randall Q.; Bae, Youn-Sang

    2013-08-27T23:59:59.000Z

    Metal-organic framework (MOF) materials are provided and are selectively adsorbent to xenon (Xe) over another noble gas such as krypton (Kr) and/or argon (Ar) as a result of having framework voids (pores) sized to this end. MOF materials having pores that are capable of accommodating a Xe atom but have a small enough pore size to receive no more than one Xe atom are desired to preferentially adsorb Xe over Kr in a multi-component (Xe--Kr mixture) adsorption method. The MOF material has 20% or more, preferably 40% or more, of the total pore volume in a pore size range of 0.45-0.75 nm which can selectively adsorb Xe over Kr in a multi-component Xe--Kr mixture over a pressure range of 0.01 to 1.0 MPa.

  3. Metal-organic frameworks for Xe/Kr separation

    DOE Patents [OSTI]

    Ryan, Patrick J.; Farha, Omar K.; Broadbelt, Linda J.; Snurr, Randall Q.; Bae, Youn-Sang

    2014-07-22T23:59:59.000Z

    Metal-organic framework (MOF) materials are provided and are selectively adsorbent to xenon (Xe) over another noble gas such as krypton (Kr) and/or argon (Ar) as a result of having framework voids (pores) sized to this end. MOF materials having pores that are capable of accommodating a Xe atom but have a small enough pore size to receive no more than one Xe atom are desired to preferentially adsorb Xe over Kr in a multi-component (Xe--Kr mixture) adsorption method. The MOF material has 20% or more, preferably 40% or more, of the total pore volume in a pore size range of 0.45-0.75 nm which can selectively adsorb Xe over Kr in a multi-component Xe--Kr mixture over a pressure range of 0.01 to 1.0 MPa.

  4. Stratified vapor generator

    DOE Patents [OSTI]

    Bharathan, Desikan (Lakewood, CO); Hassani, Vahab (Golden, CO)

    2008-05-20T23:59:59.000Z

    A stratified vapor generator (110) comprises a first heating section (H.sub.1) and a second heating section (H.sub.2). The first and second heating sections (H.sub.1, H.sub.2) are arranged so that the inlet of the second heating section (H.sub.2) is operatively associated with the outlet of the first heating section (H.sub.1). A moisture separator (126) having a vapor outlet (164) and a liquid outlet (144) is operatively associated with the outlet (124) of the second heating section (H.sub.2). A cooling section (C.sub.1) is operatively associated with the liquid outlet (144) of the moisture separator (126) and includes an outlet that is operatively associated with the inlet of the second heating section (H.sub.2).

  5. Ferromagnetic Coupling of Mononuclear Fe Centers in a Self-Assembled Metal-Organic Network on Au(111)

    E-Print Network [OSTI]

    Kuch, Wolfgang

    Grenoble, France 3 Center for Supramolecular Interactions, Freie Universita¨t Berlin, Arnimallee 14, 14195.37.Ef, 75.30.Et, 78.70.Dm As the size of a magnetic material decreases, the stabil- ity-symmetry metal-organic structures and periodic networks [9­11]. In bulk metal-organic materials, the organic

  6. Adsorption and Diffusion of Hydrogen in a New Metal-Organic Framework Material: [Zn(bdc)(ted)0.5

    E-Print Network [OSTI]

    Li, Jing

    Adsorption and Diffusion of Hydrogen in a New Metal-Organic Framework Material: [Zn(bdc)(ted)0.5 pressure of 50 bar in a recently developed metal-organic framework material, [Zn(bdc)(ted)0.5] (bdc equilibrium molecular dynamics to compute self- and transport diffusivities of hydrogen in [Zn(bdc)(ted)0.5

  7. aqueous chemical growth: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Technische Universiteit Delft 36 Growth of Large-Area Aligned Molybdenum Nanowires by High Temperature Chemical Vapor Deposition: Synthesis, Growth Mechanism, and Device...

  8. Water Vapor Experiment Concludes

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level:Energy: Grid Integration Redefining What'sis Taking Over OurThe Iron SpinPrincetonUsing Maps1DOE AwardsDNitrateEnergyNews3 Water Vapor

  9. ARM Water Vapor IOP

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645U.S. DOE Office511041cloth DocumentationProducts (VAP) VAP Update Information on new,Scanning Radar323ARM Water Vapor IOP

  10. Vapor Transport in Dry Soils

    SciTech Connect (OSTI)

    Gee, Glendon W.; Ward, Anderson L.

    2001-11-16T23:59:59.000Z

    Water-vapor movement in soils is a complex process, controlled by both diffusion and advection and influenced by pressure and thermal gradients acting across tortuous flow paths. Wide-ranging interest in water-vapor transport includes both theoretical and practical aspects. Just how pressure and thermal gradients enhance water-vapor flow is still not completely understood and subject to ongoing research. Practical aspects include dryland farming (surface mulching), water harvesting (aerial wells), fertilizer placement, and migration of contaminants at waste-sites. The following article describes the processes and practical applications of water-vapor transport, with emphasis on unsaturated (dry) soil systems.

  11. Vapor spill pipe monitor

    DOE Patents [OSTI]

    Bianchini, G.M.; McRae, T.G.

    1983-06-23T23:59:59.000Z

    The invention is a method and apparatus for continually monitoring the composition of liquefied natural gas flowing from a spill pipe during a spill test by continually removing a sample of the LNG by means of a probe, gasifying the LNG in the probe, and sending the vaporized LNG to a remote ir gas detector for analysis. The probe comprises three spaced concentric tubes surrounded by a water jacket which communicates with a flow channel defined between the inner and middle, and middle and outer tubes. The inner tube is connected to a pump for providing suction, and the probe is positioned in the LNG flow below the spill pipe with the tip oriented partly downward so that LNG is continuously drawn into the inner tube through a small orifice. The probe is made of a high thermal conductivity metal. Hot water is flowed through the water jacket and through the flow channel between the three tubes to provide the necessary heat transfer to flash vaporize the LNG passing through the inner channel of the probe. The gasified LNG is transported through a connected hose or tubing extending from the probe to a remote ir sensor which measures the gas composition.

  12. Conduction properties of metal/organic monolayer/semiconductor heterostructures

    SciTech Connect (OSTI)

    Li, D.; Bishop, A.; Gim, Y.; Shi, X.B.; Fitzsimmons, M.R.; Jia, Q.X. [Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)] [Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

    1998-11-01T23:59:59.000Z

    We have fabricated and characterized rectifying devices made of metal/organic monolayer/semiconductor heterostructures. The devices consist of an organic barrier layer sandwiched between an aluminum (Al) metal contact and a {ital p}-type Si semiconductor. The barrier materials were chosen from three types of self-assembled monolayers (SAMs) with different electronic properties: (1) wide-band gap poly(diallydimethyl ammonium) chloride (PDDA), (2) narrow-band gap PDDA/NiPc (nickel phthalocyanine tetrasulfonate), and (3) donor type PDDA/PPP (poly {ital p}-quaterphenylene-disulfonic-dicarboxylic acid). From current{endash}voltage (I{endash}V) measurements at room temperature, we have found the turn-on voltage of the devices can be tuned by varying the structure, hence electronic properties, of the organic monolayers, and that there exists a power-law dependence of {ital I} on V, I{proportional_to}V{sup {alpha}}, with the exponent {alpha}=2.2 for PDDA, 2.7 for PDDA/NiPc, and 1.44 for PDDA/PPP as the barrier layer, respectively. Our results imply that the transport properties are controlled by both the electronic properties of the SAMs and those of the metal and semiconductor, as indicated by the power-law dependence of the I{endash}V characteristics. {copyright} {ital 1998 American Institute of Physics.}

  13. Formation of etch pits during carbon doping of gallium arsenide with carbon tetrachloride by metalorganic vapor-phase epitaxy

    E-Print Network [OSTI]

    Li, Lian

    Formation of etch pits during carbon doping of gallium arsenide with carbon tetrachloride to examine the effects of carbon tetrachloride concentration and temperature on the morphology of carbon with increasing carbon tetrachloride concentration. Step bunching and pinning was observed at a IV/III ratio

  14. High-temperature characteristics of Seebeck coefficients for AlInN alloys grown by metalorganic vapor phase epitaxy

    E-Print Network [OSTI]

    Gilchrist, James F.

    importance for efficient thermal management in high power devices. The availability of III- nitride the calculation of surface and interface energies J. Appl. Phys. 110, 113910 (2011) A strain relief mode of Physics. [doi:10.1063/1.3624761] I. INTRODUCTION High power density and high-temperature requirements

  15. Vapor Retarder Classification - Building America Top Innovation...

    Energy Savers [EERE]

    the Top Innovation. See an example of vapor retarder best practices in action. Find other case studies of Building America projects across the country that utilizes vapor retarder...

  16. Enthalpies of Vaporization and Vapor Pressures of Some Deuterated Hydrocarbons. Liquid-Vapor Pressure Isotope Effects

    E-Print Network [OSTI]

    Chickos, James S.

    Enthalpies of Vaporization and Vapor Pressures of Some Deuterated Hydrocarbons. Liquid hydrocarbons and their perdeuterated analogues have been determined by correlation-gas chromatography of cyclohexane-d12 and benzene-d6. Other hydrocarbons studied include the perdeuterated forms of hexane, toluene

  17. MOCVD growth of In GaP-based heterostructures for light emitting devices

    E-Print Network [OSTI]

    McGill, Lisa Megan, 1975-

    2004-01-01T23:59:59.000Z

    In this work, we examine fundamental materials processes in the growth of indium gallium phosphide (InGaP) via metalorganic chemical vapor deposition (MOCVD). In particular, we realize improvements in the epitaxial integration ...

  18. Sandia National Laboratories: Solid-State Lighting

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Assessment of deep level defects in m-plane GaN grown by metalorganic chemical vapor deposition On February 22, 2012, in Energy Efficiency, News, News & Events, Solid-State...

  19. Sandia National Laboratories: Sandia Participates in the ARPA...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    in the ARPA-E 2012 Energy Innovation Summit Assessment of deep level defects in m-plane GaN grown by metalorganic chemical vapor deposition Molecular Simulations Guide Nanowire...

  20. Anthraquinone with Tailored Structure for Nonaqueous Metal-Organic Redox Flow Battery

    SciTech Connect (OSTI)

    Wang, Wei; Xu, Wu; Cosimbescu, Lelia; Choi, Daiwon; Li, Liyu; Yang, Zhenguo

    2012-06-08T23:59:59.000Z

    A nonaqueous, hybrid metal-organic redox flow battery based on tailored anthraquinone structure is demonstrated to have an energy efficiency of {approx}82% and a specific discharge energy density similar to aqueous redox flow batteries, which is due to the significantly improved solubility of anthraquinone in supporting electrolytes.

  1. Methane Storage in Metal-Organic Frameworks: Current Records, Surprise Findings, and Challenges

    E-Print Network [OSTI]

    Methane Storage in Metal-Organic Frameworks: Current Records, Surprise Findings, and Challenges to concerns over national and regional energy security, ground-level air quality, and climate change. While challenge is mass- and volume-efficient, ambient-temperature storage and delivery. One potential solution

  2. Doctoral Defense "Carbon Dioxide Capture on Elastic Layered Metal-Organic

    E-Print Network [OSTI]

    Kamat, Vineet R.

    Doctoral Defense "Carbon Dioxide Capture on Elastic Layered Metal-Organic Framework Adsorbents requires drastic modifications to the current energy infrastructure. Thus, carbon capture and sequestration for use as carbon capture adsorbents. Ideal adsorbed solution theory (IAST) estimates of CO2 selectivity

  3. Short Communication Enhancement of CO2/CH4 selectivity in metal-organic frameworks containing

    E-Print Network [OSTI]

    lithium cations Youn-Sang Bae a,1 , Brad G. Hauser b,1 , Omar K. Farha b , Joseph T. Hupp b, , Randall Q November 2010 Keywords: Lithium doping Carbon dioxide (CO2) Metal-organic framework (MOF) Separation improvement by the Li cation exchange comes from enhanced solid­gas interactions. Ó 2010 Elsevier Inc. All

  4. Enhancement of CO2/N2 selectivity in a metal-organic framework by cavity modification

    E-Print Network [OSTI]

    are a strong motivation to reduce CO2 emissions from industrial processes. Burning of fossil fuel to generate electricity is a major source of CO2 in the atmosphere, but the capture and sequestration of CO2 from flue gasEnhancement of CO2/N2 selectivity in a metal-organic framework by cavity modification Youn-Sang Bae

  5. Comprehensive study of carbon dioxide adsorption in the metalorganic frameworks M2(dobdc)

    E-Print Network [OSTI]

    Comprehensive study of carbon dioxide adsorption in the metal­organic frameworks M2(dobdc) (M ¼ Mg and Craig M. Brown*bl Analysis of the CO2 adsorption properties of a well-known series of metal and single crystal X-ray di raction experiments are used to unveil the site-speci c binding properties of CO2

  6. Passive vapor extraction feasibility study

    SciTech Connect (OSTI)

    Rohay, V.J.

    1994-06-30T23:59:59.000Z

    Demonstration of a passive vapor extraction remediation system is planned for sites in the 200 West Area used in the past for the disposal of waste liquids containing carbon tetrachloride. The passive vapor extraction units will consist of a 4-in.-diameter pipe, a check valve, a canister filled with granular activated carbon, and a wind turbine. The check valve will prevent inflow of air that otherwise would dilute the soil gas and make its subsequent extraction less efficient. The granular activated carbon is used to adsorb the carbon tetrachloride from the air. The wind turbine enhances extraction rates on windy days. Passive vapor extraction units will be designed and operated to meet all applicable or relevant and appropriate requirements. Based on a cost analysis, passive vapor extraction was found to be a cost-effective method for remediation of soils containing lower concentrations of volatile contaminants. Passive vapor extraction used on wells that average 10-stdft{sup 3}/min air flow rates was found to be more cost effective than active vapor extraction for concentrations below 500 parts per million by volume (ppm) of carbon tetrachloride. For wells that average 5-stdft{sup 3}/min air flow rates, passive vapor extraction is more cost effective below 100 ppm.

  7. Pendant Functional Groups in Metal-Organic Frameworks - Effects on Crystal Structure, Stability, and Gas Sorption Properties 

    E-Print Network [OSTI]

    Makal, Trevor Arnold

    2013-03-14T23:59:59.000Z

    The primary goal of this research concerns the synthesis and characterization of metal-organic frameworks (MOFs) grafted with pendant alkyl substituents to enhance stability and gas sorption properties for use in clean-energy related technologies...

  8. Synthesis and Characterization of Films and Membranes of Metal-Organic Framework (MOF) for Gas Separation Applications

    E-Print Network [OSTI]

    Shah, Miral Naresh 1987-

    2012-12-12T23:59:59.000Z

    Metal-Organic Frameworks (MOFs) are nanoporous framework materials with tunable pore size and functionality, and hence attractive for gas separation membrane applications. Zeolitic Imidazolate Frameworks (ZIFs), a subclass of MOFs, are known...

  9. Turn-on fluorescence in tetraphenylethylene-based metal-organic frameworks: An alternative to aggregation-induced emission

    E-Print Network [OSTI]

    Shustova, Natalia B.

    Coordinative immobilization of functionalized tetraphenylethylene within rigid porous metal–organic frameworks (MOFs) turns on fluorescence in the typically non-emissive tetraphenylethylene core. The matrix coordination-induced ...

  10. Vapor deposition of hardened niobium

    DOE Patents [OSTI]

    Blocher, Jr., John M. (Columbus, OH); Veigel, Neil D. (Columbus, OH); Landrigan, Richard B. (Columbus, OH)

    1983-04-19T23:59:59.000Z

    A method of coating ceramic nuclear fuel particles containing a major amount of an actinide ceramic in which the particles are placed in a fluidized bed maintained at ca. 800.degree. to ca. 900.degree. C., and niobium pentachloride vapor and carbon tetrachloride vapor are led into the bed, whereby niobium metal is deposited on the particles and carbon is deposited interstitially within the niobium. Coating apparatus used in the method is also disclosed.

  11. Luminescent metal-organic frameworks (MOFs); a nanolaboratory...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Currently, his research includes projects focused on chemical sensing, radiation detection, hydrogen storage, gas separations, and charge transfer. He is President...

  12. pubs.acs.org/ICPublished on Web 10/08/2009r 2009 American Chemical Society Inorg. Chem. 2009, 48, 99719973 9971

    E-Print Network [OSTI]

    pubs.acs.org/ICPublished on Web 10/08/2009r 2009 American Chemical Society Inorg. Chem. 2009, 48 dioxide from methane with high selectivity. Over the past decade, microporous metal-organic frame- work employ simple carbon-based spacer ele- ments (struts) that primarily serve to distance the metal nodes

  13. Isothermal vapor-liquid equilibrium accompanied by esterification; ethanol-formic acid system

    SciTech Connect (OSTI)

    Rim, J.K.; Bae, S.Y.; Lee, H.T.

    1985-07-01T23:59:59.000Z

    The equilibrium total pressures after reaction between ethanol and formic acid were measured at 30, 40 and 50/sup 0/C, and the compositions of the vapor and liquid phases were determined gas chromatographically. Since the presence of the carboxylic acid in the mixture induces dimerization and trimerization of the acid in the vapor phase, the modified fugacity coefficients were calculated from ''chemical'' theory using the Lewis fugacity rule, from which are calculated the activity coefficients and the vapor-phase mole fractions using the nonrandom, two-liquid (NRTL) equation. The parameters in the NRTL equation were obtained from vapor-liquid equilibrium data for the binary system. The calculated results agree closely with the experimental vapor-phase mole-fraction data.

  14. Desorption efficiencies of toluene and n-butanol in an organic vapor monitor

    E-Print Network [OSTI]

    Heaney, Mary Ann

    1979-01-01T23:59:59.000Z

    ) ~ ~ ? Experimental Volume versus Theoretical Volume for n-Butanol (liquid phase). . . . . . . 13. Conceptual Adsorption of Vapor Molecules;. . . . 41 IXI'RODDCTI 019 In 1970, the Occupational Safety and Health Adminj- strstion adopted permissible human exposure...&jards has become one of the most important industrial hygiene f unct i one e The levei of exposure to many organic vapor;=, is det r- mined by co' lecting the chemical on some type o solid sor- bent. Of the various adsorbents available {silica gel...

  15. New Cerium-Based Metal-Organic Scintillators for Radiation Detection

    SciTech Connect (OSTI)

    Boatner, Lynn A [ORNL; Neal, John S [ORNL; Ramey, Joanne Oxendine [ORNL; Chakoumakos, Bryan C [ORNL; Custelcean, Radu [ORNL; Van Loef, Edgar [Radiation Monitoring Devices, Watertown, MA; Markosyan, G [Radiation Monitoring Devices, Watertown, MA

    2013-01-01T23:59:59.000Z

    We have previously shown that a new class of scintillating materials can be developed based on the synthesis and crystal growth of rare-earth metal-organic compounds. The first scintillator of this type consisted of single crystals of CeCl3(CH3OH)4 that were grown from a methanol solution. These crystals were shown to be applicable to both gamma-ray and fast neutron detection. Subsequently, metal-organic scintillators consisting of the compound LaBr3(CH3OH)4 activated with varying levels of Ce3+ and of CeBr3(CH3OH)4 were grown in single crystal form. We have now extended the development of this new class of scintillators to more complex organic components by reacting rare-earth halides such as CeCl3 or CeBr3 with different isomers of propanol and butanol including 1-propanol, isobutanol, n-butanol, and tert-butanol. The reaction of CeCl3 or CeBr3 with these organics results in the formation of new and relatively complex molecular crystals whose structures were determined using single-crystal X-ray diffraction. These new metal-organic scintillating materials were grown in single crystal form from solution, and their scintillation characteristics have been investigated using X-ray-excited luminescence plus energy spectra obtained with gamma-ray and alpha-particle sources. If the reactions between the inorganic and organic components are not carried out under very dry and highly controlled conditions, molecular structures can be formed that incorporate waters of hydration. The present observation of scintillation in these hydrated rare-earth metal-organic compounds is apparently an original finding, since we are not aware of any previous reports of scintillation being observed in a material that incorporates waters of hydration

  16. Image Storage in Hot Vapors

    E-Print Network [OSTI]

    L. Zhao; T. Wang; Y. Xiao; S. F. Yelin

    2007-10-22T23:59:59.000Z

    We theoretically investigate image propagation and storage in hot atomic vapor. A $4f$ system is adopted for imaging and an atomic vapor cell is placed over the transform plane. The Fraunhofer diffraction pattern of an object in the object plane can thus be transformed into atomic Raman coherence according to the idea of ``light storage''. We investigate how the stored diffraction pattern evolves under diffusion. Our result indicates, under appropriate conditions, that an image can be reconstructed with high fidelity. The main reason for this procedure to work is the fact that diffusion of opposite-phase components of the diffraction pattern interfere destructively.

  17. Vacuum vapor deposition gun assembly

    DOE Patents [OSTI]

    Zeren, Joseph D. (Boulder, CO)

    1985-01-01T23:59:59.000Z

    A vapor deposition gun assembly includes a hollow body having a cylindrical outer surface and an end plate for holding an adjustable heat sink, a hot hollow cathode gun, two magnets for steering the plasma from the gun into a crucible on the heat sink, and a shutter for selectively covering and uncovering the crucible.

  18. Hydrogen Cars and Water Vapor

    E-Print Network [OSTI]

    Colorado at Boulder, University of

    misidentified as "zero-emissions vehicles." Fuel cell vehicles emit water vapor. A global fleet could have, with discernible effects on people and ecosystems. The broad environmental effects of fuel cell vehicles. This cycle is currently under way with hydrogen fuel cells. As fuel cell cars are suggested as a solution

  19. Vapor phase modifiers for oxidative coupling

    DOE Patents [OSTI]

    Warren, Barbara K. (Charleston, WV)

    1991-01-01T23:59:59.000Z

    Volatilized metal compounds retard vapor phase alkane conversion reactions in oxidative coupling processes that convert lower alkanes to higher hydrocarbons.

  20. Large-scale screening of hypothetical metalorganic frameworks

    E-Print Network [OSTI]

    chemical library of building blocks (based on the structures of known MOFs) and rapidly screen them to find,953 hypothetical MOFs and for each one calculated the pore-size distribution, surface area and methane-storage capacity. We identified over 300 MOFs with a predicted methane-storage capacity better than that of any

  1. Vapor canister heater for evaporative emissions systems

    SciTech Connect (OSTI)

    Bishop, R.P.; Berg, P.G.

    1987-01-01T23:59:59.000Z

    Automotive evaporative emissions systems use a charcoal canister to store evaporative hydrocarobn emissions. These stored vapors are later purged and burned during engine operation. Under certain conditions the engine cannot completely purge the canister of the stored fuel vapors, which results in a decreased vapor storage capacity in the canister. A self-regulating PTC (Positive Temperature Coefficient) heater has been developed to warm the purge air as it enters the canister, in order to provide thermal energy for increased release of the vapors from charcoal sites. This paper describes the construction and operation of the vapor canister heater as it relates to improved evaporative emission system performance.

  2. Means and method for vapor generation

    DOE Patents [OSTI]

    Carlson, Larry W. (Oswego, IL)

    1984-01-01T23:59:59.000Z

    A liquid, in heat transfer contact with a surface heated to a temperature well above the vaporization temperature of the liquid, will undergo a multiphase (liquid-vapor) transformation from 0% vapor to 100% vapor. During this transition, the temperature driving force or heat flux and the coefficients of heat transfer across the fluid-solid interface, and the vapor percentage influence the type of heating of the fluid--starting as "feedwater" heating where no vapors are present, progressing to "nucleate" heating where vaporization begins and some vapors are present, and concluding with "film" heating where only vapors are present. Unstable heating between nucleate and film heating can occur, accompanied by possibly large and rapid temperature shifts in the structures. This invention provides for injecting into the region of potential unstable heating and proximate the heated surface superheated vapors in sufficient quantities operable to rapidly increase the vapor percentage of the multiphase mixture by perhaps 10-30% and thereby effectively shift the multiphase mixture beyond the unstable heating region and up to the stable film heating region.

  3. Chemistry and Applications of Metal-Organic Materials

    E-Print Network [OSTI]

    Zhao, Dan

    2012-02-14T23:59:59.000Z

    ) and applicable pressure (less than 100 atm). Note that these are the goals for the system including container and any necessary accessories, the hydrogen storage capacity of the material itself should be even higher. A safe and effective hydrogen storage.... In solid-state storage systems, a hydrogen atom/molecule either forms a strong chemical bond to a solid support (chemisorption) or interacts weakly with a sorbent (physisorption). In chemisorption, dihydrogen molecules split into hydrogen atoms upon...

  4. Effect of residual gases in high vacuum on the energy-level alignment at noble metal/organic interfaces

    SciTech Connect (OSTI)

    Helander, M. G.; Wang, Z. B.; Lu, Z. H.

    2011-10-31T23:59:59.000Z

    The energy-level alignment at metal/organic interfaces has traditionally been studied using ultraviolet photoelectron spectroscopy (UPS) in ultra-high vacuum (UHV). However, since most devices are fabricated in high vacuum (HV), these studies do not accurately reflect the interfaces in real devices. We demonstrate, using UPS measurements of samples prepared in HV and UHV and current-voltage measurements of devices prepared in HV, that the small amounts of residual gases that are adsorbed on the surface of clean Cu, Ag, and Au (i.e., the noble metals) in HV can significantly alter the energy-level alignment at metal/organic interfaces.

  5. Heats of vaporization of room temperature ionic liquids by tunable vacuum ultraviolet photoionization

    SciTech Connect (OSTI)

    Chambreau, Steven D.; Vaghjiani, Ghanshyam L.; To, Albert; Koh, Christine; Strasser, Daniel; Kostko, Oleg; Leone, Stephen R.

    2009-11-25T23:59:59.000Z

    The heats of vaporization of the room temperature ionic liquids (RTILs) N-butyl-N-methylpyrrolidinium bistrifluorosulfonylimide, N-butyl-N-methylpyrrolidinium dicyanamide, and 1-butyl-3-methylimidazolium dicyanamide are determined using a heated effusive vapor source in conjunction with single photon ionization by a tunable vacuum ultraviolet synchrotron source. The relative gas phase ionic liquid vapor densities in the effusive beam are monitored by clearly distinguished dissociative photoionization processes via a time-of-flight mass spectrometer at a tunable vacuum ultraviolet beamline 9.0.2.3 (Chemical Dynamics Beamline) at the Advanced Light Source synchrotron facility. Resulting in relatively few assumptions, through the analysis of both parent cations and fragment cations, the heat of vaporization of N-butyl-N-methylpyrrolidinium bistrifluorosulfonylimide is determined to be Delta Hvap(298.15 K) = 195+-19 kJ mol-1. The observed heats of vaporization of 1-butyl-3-methylimidazolium dicyanamide (Delta Hvap(298.15 K) = 174+-12 kJ mol-1) and N-butyl-N-methylpyrrolidinium dicyanamide (Delta Hvap(298.15 K) = 171+-12 kJ mol-1) are consistent with reported experimental values using electron impact ionization. The tunable vacuum ultraviolet source has enabled accurate measurement of photoion appearance energies. These appearance energies are in good agreement with MP2 calculations for dissociative photoionization of the ion pair. These experimental heats of vaporization, photoion appearance energies, and ab initio calculations corroborate vaporization of these RTILs as intact cation-anion ion pairs.

  6. Solution-gated graphene transistors for chemical and biological sensing applications

    E-Print Network [OSTI]

    Mailly, Benjamin

    2013-01-01T23:59:59.000Z

    Various fabrication processes were developed in order to make graphene-based chemical and biological sensors on different substrates. Single-layer graphene is grown by chemical vapor deposition and then transferred to ...

  7. Molecules and materials for the optical detection of explosives and toxic chemicals

    E-Print Network [OSTI]

    Thomas, Samuel William, III

    2006-01-01T23:59:59.000Z

    Optical chemosensing, especially using amplifying fluorescent polymers, can allow for the highly sensitive and selective vapor-phase detection of both explosives and highly toxic chemicals, including chemical warfare agents. ...

  8. Tuning metal–carboxylate coordination in crystalline metal–organic frameworks through surfactant media

    SciTech Connect (OSTI)

    Gao, Junkuo [School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798 (Singapore); Ye, Kaiqi [School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798 (Singapore); State Key Laboratory of Supramolecular Structure and Materials, Jilin University, Changchun 130012 (China); He, Mi [Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371 (Singapore); Xiong, Wei-Wei; Cao, Wenfang; Lee, Zhi Yi [School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798 (Singapore); Wang, Yue [State Key Laboratory of Supramolecular Structure and Materials, Jilin University, Changchun 130012 (China); Wu, Tom [Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371 (Singapore); Huo, Fengwei [School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798 (Singapore); Liu, Xiaogang [Department of Chemistry, National University of Singapore, Singapore 117543 (Singapore); Institute of Materials Research Engineering, Agency for Science, Technology and Research, Singapore 117602 (Singapore); Zhang, Qichun, E-mail: qczhang@ntu.edu.sg [School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798 (Singapore)

    2013-10-15T23:59:59.000Z

    Although it has been widely demonstrated that surfactants can efficiently control the size, shape and surface properties of micro/nanocrystals of metal–organic frameworks (MOFs) due to the strong interactions between surfactants and crystal facets of MOFs, the use of surfactants as reaction media to grow MOF single crystals is unprecedented. In addition, compared with ionic liquids, surfactants are much cheaper and can have multifunctional properties such as acidic, basic, neutral, cationic, anionic, or even block. These factors strongly motivate us to develop a new synthetic strategy: growing crystalline MOFs in surfactants. In this report, eight new two-dimensional (2D) or three-dimensional (3D) MOFs have been successfully synthesized in an industrially-abundant and environmentally-friendly surfactant: polyethylene glycol-200 (PEG-200). Eight different coordination modes of carboxylates, ranging from monodentate ?{sup 1} mode to tetra-donor coordination µ{sub 3}-?{sup 1}:?{sup 2}:?{sup 1} mode, have been founded in our research. The magnetic properties of Co-based MOFs were investigated and MOF NTU-Z6b showed a phase transition with a Curie temperature (T{sub c}) at 5 K. Our strategy of growing crystalline MOFs in surfactant could offer exciting opportunities for preparing novel MOFs with diverse structures and interesting properties. - Graphical abstract: Surfactants have been used as reaction media to grow MOF single crystals for the first time. Eight new two-dimensional or three-dimensional MOFs were successfully synthesized in surfactant polyethylene glycol-200 (PEG-200). Coordination modes of carboxylates up to eight were founded. Our strategy of growing crystalline MOFs in surfactant could offer exciting opportunities for preparing novel MOFs with diverse structures and interesting properties. Display Omitted - Highlights: • Surfactant-thermal synthesis of crystalline metal–organic frameworks. • Eight new 2-D or 3-D metal–organic frameworks. • Eight different metal–carboxylate coordination modes.

  9. Metal?organic frameworks for the storage and delivery of biologically active hydrogen sulfide

    SciTech Connect (OSTI)

    Allan, Phoebe K.; Wheatley, Paul S.; Aldous, David; Mohideen, M. Infas; Tang, Chiu; Hriljac, Joseph A.; Megson, Ian L.; Chapman, Karena W.; De Weireld, Guy; Vaesen, Sebastian; Morris, Russell E. (St Andrews)

    2012-04-02T23:59:59.000Z

    Hydrogen sulfide is an extremely toxic gas that is also of great interest for biological applications when delivered in the correct amount and at the desired rate. Here we show that the highly porous metal-organic frameworks with the CPO-27 structure can bind the hydrogen sulfide relatively strongly, allowing the storage of the gas for at least several months. Delivered gas is biologically active in preliminary vasodilation studies of porcine arteries, and the structure of the hydrogen sulfide molecules inside the framework has been elucidated using a combination of powder X-ray diffraction and pair distribution function analysis.

  10. Reversible CO Binding in Metal-Organic Frameworks | Center for Gas

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645 3,625 1,006 492 742EnergyOnItemResearch > TheNuclear Press ReleasesIn theTreatment in a Metal-Organic

  11. Vapor deposition of platinum alloyed nickel aluminide coatings Z. Yu , K.P. Dharmasena, D.D. Hass, H.N.G. Wadley

    E-Print Network [OSTI]

    Wadley, Haydn

    Vapor deposition of platinum alloyed nickel aluminide coatings Z. Yu , K.P. Dharmasena, D.D. Hass at high temperature. It requires the chemical vapor deposition of aluminum on a nickel rich superalloy substrate that has been pre-coated with several microns of electrodeposited platinum. Here, we show

  12. Micro Chemical Vapor Deposition for the Synthesis of Nanomaterials

    E-Print Network [OSTI]

    Zhou, Qin

    2011-01-01T23:59:59.000Z

    Journal of MicroElectroMechanical Systems, vol. 20, pp. 9-Chair MEMS (Microelectromechanical Systems) technologiesby MEMS (Microelectromechanical Systems) technologies many

  13. Aerosol chemical vapor deposition of metal oxide films

    DOE Patents [OSTI]

    Ott, K.C.; Kodas, T.T.

    1994-01-11T23:59:59.000Z

    A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said substrate.

  14. Graphene growth with giant domains using chemical vapor deposition

    E-Print Network [OSTI]

    Yong, Virginia; Hahn, H. Thomas

    2011-01-01T23:59:59.000Z

    N. Martensson, Controlling graphene corrugation on lattice-in patterned epitaxial graphene, Science, 2006, 312(5777), 92009, 4(6), 17 A. K. Geim, Graphene: Status and Prospects,

  15. Sandia National Laboratories: metal organic chemical vapor deposition

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Partnership, Research & Capabilities, Solid-State Lighting Solid state lighting (SSL), which uses light-emitting diodes (LEDs), has the potential to be 10 times more energy...

  16. Organic lateral heterojunction devices for vapor-phase chemical detection

    E-Print Network [OSTI]

    Ho, John C., 1980-

    2009-01-01T23:59:59.000Z

    As the U.S. is engaged in battle overseas, there is an urgent need for the development of sensors for early warning and protection of military forces against potential attacks. On the battlefields, improvised explosive ...

  17. Formation of amorphous metal alloys by chemical vapor deposition

    DOE Patents [OSTI]

    Mullendore, A.W.

    1988-03-18T23:59:59.000Z

    Amorphous alloys are deposited by a process of thermal dissociation of mixtures of organometallic compounds and metalloid hydrides,e.g., transition metal carbonyl, such as nickel carbonyl and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit. 1 fig.

  18. Formation of amorphous metal alloys by chemical vapor deposition

    DOE Patents [OSTI]

    Mullendore, Arthur W. (Sandia Park, NM)

    1990-01-01T23:59:59.000Z

    Amorphous alloys are deposited by a process of thermal dissociation of mixtures or organometallic compounds and metalloid hydrides, e.g., transition metal carbonyl such as nickel carbonyl, and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit.

  19. Direct chemical vapor deposition of graphene on dielectric surfaces

    DOE Patents [OSTI]

    Zhang, Yuegang; Ismach, Ariel

    2014-04-29T23:59:59.000Z

    A substrate is provided that has a metallic layer on a substrate surface of a substrate. A film made of a two dimensional (2-D) material, such as graphene, is deposited on a metallic surface of the metallic layer. The metallic layer is dewet and/or removed to provide the film on the substrate surface.

  20. Hot-Wire Chemical Vapor Deposition (HWCVD) technologies - Energy Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645U.S. DOEThe Bonneville PowerCherries 82981-1cnHigh School football Highdefault Sign InDataCenterCenterPortal

  1. Control of flow through a vapor generator

    DOE Patents [OSTI]

    Radcliff, Thomas D.

    2005-11-08T23:59:59.000Z

    In a Rankine cycle system wherein a vapor generator receives heat from exhaust gases, provision is made to avoid overheating of the refrigerant during ORC system shut down while at the same time preventing condensation of those gases within the vapor generator when its temperature drops below a threshold temperature by diverting the flow of hot gases to ambient and to thereby draw ambient air through the vapor generator in the process. In one embodiment, a bistable ejector is adjustable between one position, in which the hot gases flow through the vapor generator, to another position wherein the gases are diverted away from the vapor generator. Another embodiment provides for a fixed valve ejector with a bias towards discharging to ambient, but with a fan on the downstream side of said vapor generator for overcoming this bias.

  2. Raman Spectroscopy of the Reaction of Thin Films of Solid-State Benzene with Vapor-Deposited Ag, Mg, and Al

    SciTech Connect (OSTI)

    Schalnat, Matthew C. [Univ. of Arizona, Tucson, AZ (United States). Dept. of Chemistry and Biochemistry; Hawkridge, Adam M. [Univ. of Arizona, Tucson, AZ (United States). Dept. of Chemistry and Biochemistry; Pemberton, Jeanne E. [Univ. of Arizona, Tucson, AZ (United States). Dept. of Chemistry and Biochemistry

    2011-07-21T23:59:59.000Z

    Thin films of solid-state benzene at 30 K were reacted with small quantities of vapor-deposited Ag, Mg, and Al under ultrahigh vacuum, and products were monitored using surface Raman spectroscopy. Although Ag and Mg produce small amounts of metal–benzene adduct products, the resulting Raman spectra are dominated by surface enhancement of the normal benzene modes from metallic nanoparticles suggesting rapid Ag or Mg metallization of the film. In contrast, large quantities of Al adduct products are observed. Vibrational modes of the products in all three systems suggest adducts that are formed through a pathway initiated by an electron transfer reaction. The difference in reactivity between these metals is ascribed to differences in ionization potential of the metal atoms; ionization potential values for Ag and Mg are similar but larger than that for Al. These studies demonstrate the importance of atomic parameters, such as ionization potential, in solid-state metal–organic reaction chemistry.

  3. Metal-Organic Frameworks with Precisely Designed Interior for Carbon Dioxide Capture in the Presence of Water

    E-Print Network [OSTI]

    Yaghi, Omar M.

    Metal-Organic Frameworks with Precisely Designed Interior for Carbon Dioxide Capture preservation of the IRMOF structure. Carbon dioxide capture from combustion sources such as flue gas in power this carbon capture challenge. The preferred method for measuring the efficiency of a given material

  4. A three-dimensional porous metal-organic framework constructed from two-dimensional sheets via interdigitation exhibiting dynamic features.

    SciTech Connect (OSTI)

    Ma, S.; Sun, D.; Forster, P. M.; Yuan, D.; Zhuang, W.; Chen, Y. S.; Parise, J. B.; Zhou, H. C. (Chemical Sciences and Engineering Division); (Texas A& M Univ.); (Univ. of Chicago); (Stony Brook Univ.)

    2009-04-23T23:59:59.000Z

    A three-dimensional porous metal-organic framework (PCN-18) was constructed through interdigitating two-dimensional grid sheets composed of 4,4{prime}-(anthracene-9,10-diyl)dibenzoate and copper paddlewheel secondary building units, and its dynamic features were evidenced by gas sorption isotherms.

  5. Coupling apparatus for a metal vapor laser

    DOE Patents [OSTI]

    Ball, Don G. (Livermore, CA); Miller, John L. (Dublin, CA)

    1993-01-01T23:59:59.000Z

    Coupling apparatus for a large bore metal vapor laser is disclosed. The coupling apparatus provides for coupling high voltage pulses (approximately 40 KV) to a metal vapor laser with a high repetition rate (approximately 5 KHz). The coupling apparatus utilizes existing thyratron circuits and provides suitable power input to a large bore metal vapor laser while maintaining satisfactory operating lifetimes for the existing thyratron circuits.

  6. Coupling apparatus for a metal vapor laser

    DOE Patents [OSTI]

    Ball, D.G.; Miller, J.L.

    1993-02-23T23:59:59.000Z

    Coupling apparatus for a large bore metal vapor laser is disclosed. The coupling apparatus provides for coupling high voltage pulses (approximately 40 KV) to a metal vapor laser with a high repetition rate (approximately 5 KHz). The coupling apparatus utilizes existing thyratron circuits and provides suitable power input to a large bore metal vapor laser while maintaining satisfactory operating lifetimes for the existing thyratron circuits.

  7. Dosimeter for monitoring vapors and aerosols of organic compounds

    DOE Patents [OSTI]

    Vo-Dinh, Tuan (625 Gulfwood Rd., Knoxville, TN 37923)

    1987-01-01T23:59:59.000Z

    A dosimeter is provided for collecting and detecting vapors and aerosols of organic compounds. The dosimeter comprises a lightweight, passive device that can be conveniently worn by a person as a badge or placed at a stationary location. The dosimeter includes a sample collector comprising a porous web treated with a chemical for inducing molecular displacement and enhancing phosphorescence. Compounds are collected onto the web by molecular diffusion. The web also serves as the sample medium for detecting the compounds by a room temperature phosphorescence technique.

  8. Dosimeter for monitoring vapors and aerosols of organic compounds

    DOE Patents [OSTI]

    Vo-Dinh, T.

    1987-07-14T23:59:59.000Z

    A dosimeter is provided for collecting and detecting vapors and aerosols of organic compounds. The dosimeter comprises a lightweight, passive device that can be conveniently worn by a person as a badge or placed at a stationary location. The dosimeter includes a sample collector comprising a porous web treated with a chemical for inducing molecular displacement and enhancing phosphorescence. Compounds are collected onto the web by molecular diffusion. The web also serves as the sample medium for detecting the compounds by a room temperature phosphorescence technique. 7 figs.

  9. Wick for metal vapor laser

    DOE Patents [OSTI]

    Duncan, David B. (Livermore, CA)

    1992-01-01T23:59:59.000Z

    An improved wick for a metal vapor laser is made of a refractory metal cylinder, preferably molybdenum or tungsten for a copper laser, which provides the wicking surface. Alternately, the inside surface of the ceramic laser tube can be metalized to form the wicking surface. Capillary action is enhanced by using wire screen, porous foam metal, or grooved surfaces. Graphite or carbon, in the form of chunks, strips, fibers or particles, is placed on the inside surface of the wick to reduce water, reduce metal oxides and form metal carbides.

  10. The control of mercury vapor using biotrickling filters Ligy Philip a,b,1

    E-Print Network [OSTI]

    The control of mercury vapor using biotrickling filters Ligy Philip a,b,1 , Marc A. Deshusses b mechanisms existed. Sulfur oxidizing bacteria biotrickling filters were the most effective in controlling phase bioreactor; Mercury control; Combustion gases 1. Introduction Mercury (Hg) is a hazardous chemical

  11. The importance of snow scavenging of polychlorinated biphenyl and polycyclic aromatic hydrocarbon vapors

    SciTech Connect (OSTI)

    Wania, F. [WECC Wania Environmental Chemists Corp., Toronto, Ontario (Canada)] [WECC Wania Environmental Chemists Corp., Toronto, Ontario (Canada); Mackay, D. [Trent Univ., Peterborough, Ontario (Canada). Environmental and Resource Studies] [Trent Univ., Peterborough, Ontario (Canada). Environmental and Resource Studies; Hoff, J.T. [Univ. of Waterloo, Ontario (Canada). Dept. of Earth Science] [Univ. of Waterloo, Ontario (Canada). Dept. of Earth Science

    1999-01-01T23:59:59.000Z

    Recently, experimental data on the scavenging of polychlorinated biphenyls (PCBs) and polycyclic aromatic hydrocarbons (PAHs) from the atmosphere by snow were interpreted assuming that the distribution of chemical between particles and dissolved phase measured in the meltwater reflects the state of the chemical during the scavenging process. A consequence of this assumption is that vapor scavenging is found to be unimportant relative to particle scavenging. An alternative interpretation is presented that during melting repartitioning occurs from the dissolved phase to the particle-sorbed phase. Further, it is argued that a constant particle scavenging ratio may apply to all chemicals of the same class in the same precipitation event, and its value can be estimated from the scavenging characteristics of predominantly particle-sorbed, high molecular mass chemicals. This analysis suggests that for more volatile PCBs and PAHs vapor scavenging is an important, if not the dominating, snow scavenging process. Gas scavenging ratios obtained with this method are, as expected, negatively correlated with the vapor pressure of a substance, indicating that adsorption to the air-ice interface is the process responsible for vapor scavenging.

  12. Vapor phase modifiers for oxidative coupling

    DOE Patents [OSTI]

    Warren, B.K.

    1991-12-17T23:59:59.000Z

    Volatilized metal compounds are described which are capable of retarding vapor phase alkane conversion reactions in oxidative coupling processes that convert lower alkanes to higher hydrocarbons.

  13. Near real time vapor detection and enhancement using aerosol adsorption

    DOE Patents [OSTI]

    Novick, V.J.; Johnson, S.A.

    1999-08-03T23:59:59.000Z

    A vapor sample detection method is described where the vapor sample contains vapor and ambient air and surrounding natural background particles. The vapor sample detection method includes the steps of generating a supply of aerosol that have a particular effective median particle size, mixing the aerosol with the vapor sample forming aerosol and adsorbed vapor suspended in an air stream, impacting the suspended aerosol and adsorbed vapor upon a reflecting element, alternatively directing infrared light to the impacted aerosol and adsorbed vapor, detecting and analyzing the alternatively directed infrared light in essentially real time using a spectrometer and a microcomputer and identifying the vapor sample. 13 figs.

  14. Near real time vapor detection and enhancement using aerosol adsorption

    DOE Patents [OSTI]

    Novick, Vincent J. (Downers Grove, IL); Johnson, Stanley A. (Countryside, IL)

    1999-01-01T23:59:59.000Z

    A vapor sample detection method where the vapor sample contains vapor and ambient air and surrounding natural background particles. The vapor sample detection method includes the steps of generating a supply of aerosol that have a particular effective median particle size, mixing the aerosol with the vapor sample forming aerosol and adsorbed vapor suspended in an air stream, impacting the suspended aerosol and adsorbed vapor upon a reflecting element, alternatively directing infrared light to the impacted aerosol and adsorbed vapor, detecting and analyzing the alternatively directed infrared light in essentially real time using a spectrometer and a microcomputer and identifying the vapor sample.

  15. Program plan for the resolution of tank vapor issues

    SciTech Connect (OSTI)

    Osborne, J.W.; Huckaby, J.L.

    1994-05-01T23:59:59.000Z

    Since 1987, workers at the Hanford Site waste tank farms in Richland, Washington, have reported strong odors emanating from the large, underground high-level radioactive waste storage tanks. Some of these workers have complained of symptoms (e.g., headaches, nausea) related to the odors. In 1992, the U.S. Department of Energy, which manages the Hanford Site, and Westinghouse Hanford Company determined that the vapor emissions coming from the tanks had not been adequately characterized and represented a potential health risk to workers in the immediate vicinity of the tanks. At that time, workers in certain areas of the tank farms were required to use full-face, supplied-breathing-air masks to reduce their exposure to the fugitive emissions. While use of supplied breathing air reduced the health risks associated with the fugitive emissions, it introduced other health and safety risks (e.g., reduced field of vision, air-line tripping hazards, and heat stress). In 1992, an aggressive program was established to assure proper worker protection while reducing the use of supplied breathing air. This program focuses on characterization of vapors inside the tanks and industrial hygiene monitoring in the tank farms. If chemical filtration systems for mitigation of fugitive emissions are deemed necessary, the program will also oversee their design and installation. This document presents the plans for and approach to resolving the Hanford Site high-level waste tank vapor concerns. It is sponsored by the Department of Energy Office of Environmental Restoration and Waste Management.

  16. Tropospheric water vapor and climate sensitivity

    SciTech Connect (OSTI)

    Schneider, E.K.; Kirtman, B.P.; Lindzen, R.S. [Center for Ocean-Land-Atmosphere Studies, Calverton, MD (United States)] [Center for Ocean-Land-Atmosphere Studies, Calverton, MD (United States)

    1999-06-01T23:59:59.000Z

    Estimates are made of the effect of changes in tropospheric water vapor on the climate sensitivity to doubled carbon dioxide (CO{sub 2}) using a coarse resolution atmospheric general circulation model coupled to a slab mixed layer ocean. The sensitivity of the model to doubled CO{sub 2} is found as the difference between the equilibrium responses for control and doubled CO{sub 2} cases. Clouds are specified to isolate the water vapor feedback. Experiments in which the water vapor distribution is specified rather than internally calculated are used to find the contribution of water vapor in various layers and latitude belts to the sensitivity. The contribution of water vapor in layers of equal mass to the climate sensitivity varies by about a factor of 2 with height, with the largest contribution coming from layers between 450 and 750 mb, and the smallest from layers above 230 mb. The positive feedback on the global mean surface temperature response to doubled CO{sub 2} from water vapor above 750 mb is about 2.6 times as large as that from water vapor below 750 mb. The feedback on global mean surface temperature due to water vapor in the extratropical free troposphere is about 50% larger than the feedback due to the lower-latitude free troposphere water vapor. Several important sources of nonlinearity of the radiative heating rates were identified in the process of constructing the specified cloud and water vapor fields. These are (1) the interaction of clouds and solar radiation, which produces much more reflection of solar radiation for time mean clouds than for the instantaneous clouds; (2) the correlation of clouds and water vapor, which produces less downward longwave radiation at the ground for correlated clouds and water vapor than when these fields are independent; and (3) the interaction of water vapor with long wave radiation, which produces less downward longwave radiation at the ground of the average over instantaneous water vapor distributions than of the time mean water vapor distribution.

  17. Quantitative organic vapor-particle sampler

    DOE Patents [OSTI]

    Gundel, Lara (Berkeley, CA); Daisey, Joan M. (Walnut Creek, CA); Stevens, Robert K. (Cary, NC)

    1998-01-01T23:59:59.000Z

    A quantitative organic vapor-particle sampler for sampling semi-volatile organic gases and particulate components. A semi-volatile organic reversible gas sorbent macroreticular resin agglomerates of randomly packed microspheres with the continuous porous structure of particles ranging in size between 0.05-10 .mu.m for use in an integrated diffusion vapor-particle sampler.

  18. 6, 80698095, 2006 Water vapor in Asian

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    of Sciences, Beijing, China 2 National Center for Atmospheric Research, Boulder, CO, USA Received: 23 May 2006 vapor from European Center for Medium-Range Weather20 Forecasts (ECMWF) analyses. 1 Introduction Upper Tropospheric Water Vapor (UTWV) is a key greenhouse gas which exerts a major influence on the energy balance

  19. Stacked vapor fed amtec modules

    DOE Patents [OSTI]

    Sievers, Robert K. (North Huntingdon, PA)

    1989-01-01T23:59:59.000Z

    The present invention pertains to a stacked AMTEC module. The invention includes a tubular member which has an interior. The member is comprised of a ion conductor that substantially conducts ions relative to electrons, preferably a beta"-alumina solid electrolyte, positioned about the interior. A porous electrode for conducting electrons and allowing sodium ions to pass therethrough, and wherein electrons and sodium ions recombine to form sodium is positioned about the beta"-alumina solid electrolyte. The electrode is operated at a temperature and a pressure that allows the recombined sodium to vaporize. Additionally, an outer current collector grid for distributing electrons throughout the porous electrode is positioned about and contacts the porous electrode. Also included in the invention is transporting means for transporting liquid sodium to the beta"-alumina solid electrolyte of the tubular member. A transition piece is positioned about the interior of the member and contacts the transporting means. The transition piece divides the member into a first cell and a second cell such that each first and second cell has a beta"-alumina solid electrolyte, a first and second porous electrode and a grid. The transition piece conducts electrons from the interior of the tubular member. There is supply means for supplying sodium to the transporting means. Preferably the supply means is a shell which surrounds the tubular member and is operated at a temperature such that the vaporized sodium condenses thereon. Returning means for returning the condensed sodium from the shell to the transporting means provides a continuous supply of liquid sodium to the transporting means. Also, there are first conducting means for conducting electric current from the transition piece which extends through the shell, and second conducting means for conducting electric current to the grid of the first cell which extends through the shell.

  20. Quantitative Infrared Intensity Studies of Vapor-PhaseGlyoxal...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Infrared Intensity Studies of Vapor-Phase Glyoxal,Methylglyoxal, and 2,3-Butanedione (Diacetyl) with Quantitative Infrared Intensity Studies of Vapor-Phase Glyoxal,Methylglyoxal,...

  1. Absolute integrated intensities of vapor-phase hydrogen peroxide...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Absolute integrated intensities of vapor-phase hydrogen peroxide (H202) in the mid-infrared at atmospheric pressure. Absolute integrated intensities of vapor-phase hydrogen...

  2. Molecular-Flow Properties of RIB Type Vapor-Transport Systems Using a Fast-Valve

    SciTech Connect (OSTI)

    Alton, Gerald D [ORNL] [ORNL; Bilheux, Hassina Z [ORNL] [ORNL; Zhang, Y. [Oak Ridge National Laboratory (ORNL)] [Oak Ridge National Laboratory (ORNL); Liu, Yuan [ORNL] [ORNL

    2014-01-01T23:59:59.000Z

    The advent of the fast-valve device, described previously, permits measurement of molecular-flow times of chemically active or inactive gaseous species through radioactive ion beam (RIB) target ion source systems, independent of size, geometry and materials of construction. Thus, decay losses of short-half-life RIBs can be determined for a given target/vapor-transport system in advance of on-line operation, thereby ascertaining the feasibility of the system design for successful processing of a given isotope. In this article, molecular-flow-time theory and experimentally measured molecular-flow time data are given for serial- and parallel-coupled Ta metal RIB vapor-transport systems similar to those used at ISOL based RIB facilities. In addition, the effect of source type on the molecular-flow time properties of a given system is addressed, and a chemical passivation method for negating surface adsorption enthalpies for chemically active gaseous species on Ta surfaces is demonstrated.

  3. System and method for generating and/or screening potential metal-organic frameworks

    DOE Patents [OSTI]

    Wilmer, Christopher E; Leaf, Michael; Snurr, Randall Q; Farha, Omar K; Hupp, Joseph T

    2014-12-02T23:59:59.000Z

    A system and method for systematically generating potential metal-organic framework (MOFs) structures given an input library of building blocks is provided herein. One or more material properties of the potential MOFs are evaluated using computational simulations. A range of material properties (surface area, pore volume, pore size distribution, powder x-ray diffraction pattern, methane adsorption capability, and the like) can be estimated, and in doing so, illuminate unidentified structure-property relationships that may only have been recognized by taking a global view of MOF structures. In addition to identifying structure-property relationships, this systematic approach to identify the MOFs of interest is used to identify one or more MOFs that may be useful for high pressure methane storage.

  4. New metal-organic nanomaterials synthesized by laser irradiation of organic liquids

    SciTech Connect (OSTI)

    Kuzmin, Stanislav L.; Wesolowski, Michal J.; Duley, Walter W. [Department of Physics and Astronomy, University of Waterloo, 200 University Avenue West, Waterloo, ON N2L 3G1 (Canada)

    2014-03-31T23:59:59.000Z

    A new type of metal-organic composition consisting of clusters of nanoparticles has been synthesised by laser irradiation of metallocene/benzene solutions. The metallocene molecules in this reaction become the source of the metal. Exposure to high-energy femtosecond laser pulses dehydrogenate benzene molecules and initiate the high-temperature high-pressure conditions that results in the synthesis of new materials. Irradiation experiments have been carried out on ferrocene/benzene and on other solutions. With ferrocene the synthesis of a new compound has been confirmed by X-ray powder diffraction as the peaks detected do not correspond to any known substance in the Crystallography Open Database. Theoretical simulation of the periodic structure of this new carbide predicts that it has hexagonal symmetry and a unit cell with a = 3.2A and c =2.8A. The exact structure is still uncertain but may be determined from scanning tunneling microscope (STM) studies.

  5. APPLICATION OF STIR BAR SORPTIVE EXTRACTION TO ANALYSIS OF VOLATILE AND SEMIVOLATILE ORGANIC CHEMICALS OF POTENTIAL CONCERN IN SOLIDS AND AQUEOUS SAMPLES FROM THE HANFORD SITE

    SciTech Connect (OSTI)

    FRYE JM; KUNKEL JM

    2009-03-05T23:59:59.000Z

    Stir bar sorptive extraction was applied to aqueous and solid samples for the extraction and analysis of organic compounds from the Hanford chemicals of potential concern list, as identified in the vapor data quality objectives. The 222-S Laboratory analyzed these compounds from vapor samples on thermal desorption tubes as part of the Hanford Site industrial hygiene vapor sampling effort.

  6. Formation mechanism of the secondary building unit in a chromium terephthalate metal-organic framework

    SciTech Connect (OSTI)

    Cantu Cantu, David; McGrail, B. Peter; Glezakou, Vassiliki Alexandra

    2014-11-25T23:59:59.000Z

    Based on density functional theory calculations and simulation, a detailed mechanism is presented on the formation of the secondary building unit (SBU) of MIL-101, a chromium terephthalate metal-organic framework (MOF). SBU formation is key to MOF nucleation, the rate-limiting step in the formation process of many MOFs. A series of reactions that lead to the formation of the SBU of MIL-101 is proposed in this work. Initial rate-limiting reactions form the metal cluster with three chromium (III) atoms linked to a central bridging oxygen. Terephthalate linkers play a key role as chromium (III) atoms are joined to linker carboxylate groups prior to the placement of the central bridging oxygen. Multiple linker addition reactions, which follow in different paths due to structural isomers, are limited by the removal of water molecules in the first chromium coordination shell. The least energy path is identified were all linkers on one face of the metal center plane are added first. A simple kinetic model based on transition state theory shows the rate of secondary building unit formation similar to the rate metal-organic framework nucleation. The authors are thankful to Dr. R. Rousseau for a critical reading of the manuscript. This research would not have been possible without the support of the Office of Fossil Energy, U.S. Department of Energy. This research was performed using EMSL, a national scientific user facility sponsored by the Department of Energy's Office of Biological and Environmental Research and the PNNL Institutional Computing (PIC) program located at Pacific Northwest National Laboratory.

  7. Recovering hydrocarbons from hydrocarbon-containing vapors

    DOE Patents [OSTI]

    Mirza, Zia I. (La Verne, CA); Knell, Everett W. (Los Alamitos, CA); Winter, Bruce L. (Danville, CA)

    1980-09-30T23:59:59.000Z

    Values are recovered from a hydrocarbon-containing vapor by contacting the vapor with quench liquid consisting essentially of hydrocarbons to form a condensate and a vapor residue, the condensate and quench fluid forming a combined liquid stream. The combined liquid stream is mixed with a viscosity-lowering liquid to form a mixed liquid having a viscosity lower than the viscosity of the combined liquid stream to permit easy handling of the combined liquid stream. The quench liquid is a cooled portion of the mixed liquid. Viscosity-lowering liquid is separated from a portion of the mixed liquid and cycled to form additional mixed liquid.

  8. Glass durability evaluation using product consistency, single-pass flow-through, and vapor hydration tests

    SciTech Connect (OSTI)

    Feng, X.; Hrma, P.; Kim, D. [Pacific Northwest National Lab., Richland, WA (United States)] [and others

    1996-12-31T23:59:59.000Z

    The current approach to assessing chemical durability of waste glasses focuses on a suite of short-term laboratory tests such as dynamic single-pass flow-through (SPFT) tests, static product consistency tests (PCT), and vapor hydration tests. The behavior of the glasses in the three types of tests is quite different, but each test provides insight into the glass corrosion process. The PCT data showed that at constant alumina, silica, and sodium levels the glass durability order for different glass systems is: Boron-series > Boron-Calcium-series > Calcium-series, while the opposite order is observed in SPFT tests. The order for vapor hydration tests is similar to that observed in the PCT tests. The PCT results are consistent with the current understanding of glass structure and are consistent with vapor hydration tests. The SPFT results can be explained using arguments based on solution chemistry.

  9. Chemical heat pump

    DOE Patents [OSTI]

    Greiner, Leonard (2853-A Hickory Pl., Costa Mesa, CA 92626)

    1984-01-01T23:59:59.000Z

    A chemical heat pump system is disclosed for use in heating and cooling structures such as residences or commercial buildings. The system is particularly adapted to utilizing solar energy, but also increases the efficiency of other forms of thermal energy when solar energy is not available. When solar energy is not available for relatively short periods of time, the heat storage capacity of the chemical heat pump is utilized to heat the structure, as during nighttime hours. The design also permits home heating from solar energy when the sun is shining. The entire system may be conveniently rooftop located. In order to facilitate installation on existing structures, the absorber and vaporizer portions of the system may each be designed as flat, thin wall, thin pan vessels which materially increase the surface area available for heat transfer. In addition, this thin, flat configuration of the absorber and its thin walled (and therefore relatively flexible) construction permits substantial expansion and contraction of the absorber material during vaporization and absorption without generating voids which would interfere with heat transfer.

  10. Chemical heat pump

    DOE Patents [OSTI]

    Greiner, Leonard (2853-A Hickory Pl., Costa Mesa, CA 92626)

    1984-01-01T23:59:59.000Z

    A chemical heat pump system is disclosed for use in heating and cooling structures such as residences or commercial buildings. The system is particularly adapted to utilizing solar energy, but also increases the efficiency of other forms of thermal energy when solar energy is not available. When solar energy is not available for relatively short periods of time, the heat storage capacity of the chemical heat pump is utilized to heat the structure, as during nighttime hours. The design also permits home heating from solar energy when the sun is shining. The entire system may be conveniently rooftop located. In order to facilitate intallation on existing structures, the absorber and vaporizer portions of the system may each be designed as flat, thin wall, thin pan vessels which materially increase the surface area available for heat transfer. In addition, this thin, flat configuration of the absorber and its thin walled (and therefore relatively flexible) construction permits substantial expansion and contraction of the absorber material during vaporization and absorption without generating voids which would interfere with heat transfer.

  11. Chemical heat pump

    DOE Patents [OSTI]

    Greiner, Leonard (2853-A Hickory Pl., Costa Mesa, CA 92626)

    1984-01-01T23:59:59.000Z

    A chemical heat pump system is disclosed for use in heating and cooling structures such as residences or commercial buildings. The system is particularly adapted to utilizing solar energy, but also increases the efficiency of other forms of thermal energy when solar energy is not available. When solar energy is not available for relatively short periods of time, the heat storage capacity of the chemical heat pump is utilized to heat the structure, as during nighttime hours. The design also permits home heating from solar energy when the sun is shining. The entire system may be conveniently rooftop located. In order to faciliate installation on existing structures, the absorber and vaporizer portions of the system may each be designed as flat, thin wall, thin pan vessels which materially increase the surface area available for heat transfer. In addition, this thin, flat configuration of the absorber and its thin walled (and therefore relatively flexible) construction permits substantial expansion and contraction of the absorber material during vaporization and absorption without generating voids which would interfere with heat transfer.

  12. Chemical heat pump

    DOE Patents [OSTI]

    Greiner, Leonard (2853-A Hickory Pl., Costa Mesa, CA 92626)

    1981-01-01T23:59:59.000Z

    A chemical heat pump system is disclosed for use in heating and cooling structures such as residences or commercial buildings. The system is particularly adapted to utilizing solar energy, but also increases the efficiency of other forms of thermal energy when solar energy is not available. When solar energy is not available for relatively short periods of time, the heat storage capacity of the chemical heat pump is utilized to heat the structure, as during nighttime hours. The design also permits home heating from solar energy when the sun is shining. The entire system may be conveniently rooftop located. In order to facilitate installation on existing structures, the absorber and vaporizer portions of the system may each be designed as flat, thin wall, thin pan vessels which materially increase the surface area available for heat transfer. In addition, this thin, flat configuration of the absorber and its thin walled (and therefore relatively flexible) construction permits substantial expansion and contraction of the absorber material during vaporization and absorption without generating voids which would interfere with heat transfer.

  13. High H2 Storage of Hexagonal Metal-Organic Frameworks from First-Principles-Based Grand Canonical Monte Carlo Simulations

    E-Print Network [OSTI]

    Goddard III, William A.

    High H2 Storage of Hexagonal Metal-Organic Frameworks from First-Principles-Based Grand Canonical IRMOF-2-60, which we calculate to bind 9.7 wt % H2 storage at 77 K and 70 bar, the highest known value even at ambient temperatures. For example, IRMOF-2-96-Li leads to 6.0 wt % H2 storage at 273 K and 100

  14. Magnetic properties of a metal-organic antiferromagnet Mn,,hfipbb...py,,H2O...0.5

    E-Print Network [OSTI]

    Li, Jing

    Magnetic properties of a metal-organic antiferromagnet Mn,,hfipbb...py,,H2O...0.5 Tan Yuena and C Jersey 08854 Presented on 2 November 2005; published online 18 April 2006 Mn hfipbb py H2O 0.5 H2hfipbb=4 as on powder samples of Mn hfipbb py H2O 0.5. Antiferromagnetic ordering was observed below a transition

  15. Improving the mechanical stability of zirconium-based metal-organic frameworks by incorporation of acidic modulators

    E-Print Network [OSTI]

    Van de Voorde, Ben; Stassen, Ivo; Bueken, Bart; Vermoortele, Frederik; De Vos, Dirk; Ameloot, Rob; Tan, Jin-Chong; Bennett, Thomas D.

    2014-12-01T23:59:59.000Z

    capable of retaining their structure under harsh processing conditions. Introduction Metal-organic frameworks (MOFs) are microporous materials incorporating both organic and inorganic moieties connected in 20 a three-dimensional crystal lattice.1... trifluoroacetic acid to UiO-66 synthesis results in striking increases in physical stability under ball-milling, 75 despite generating more materials of almost identical porosity. In the case of the latter, TFA modulated framework, porosity is retained...

  16. Enhancing H[subscript 2] Uptake by 'Close-Packing' Alignment of Open Copper Sites in Metal-Organic Frameworks

    SciTech Connect (OSTI)

    Wang, Xi-Sen; Ma, Shengqian; Forster, Paul M.; Yuan, Daqiang; Eckert, Juergen; López, Joseph J.; Murphy, Brandon J.; Parise, John B.; Zhou, Hong-Cai (TAM); (SBU); (UCSB)

    2010-10-15T23:59:59.000Z

    Inspired by close-packing of spheres, to strengthen the framework-H{sub 2} interaction in MOFs (metal-organic frameworks), a strategy is devised to increase the number of nearest neighboring open metal sites ofe ach H{sub 2}-hosting cage, and to align the open metal sites toward the H{sub 2} molecules. Two MOF polymorphs were made, one exhibiting a record high hydrogen uptake of 3.0 wt% at 1 bar and 77 k.

  17. An advanced vapor-compression desalination system 

    E-Print Network [OSTI]

    Lara Ruiz, Jorge Horacio Juan

    2006-04-12T23:59:59.000Z

    Currently, the two dominant desalination methods are reverse osmosis (RO) and multi-stage flash (MSF). RO requires large capital investment and maintenance, whereas MSF is too energy intensive. An innovative vapor-compression desalination system...

  18. Modeling of LNG Pool Spreading and Vaporization

    E-Print Network [OSTI]

    Basha, Omar 1988-

    2012-11-20T23:59:59.000Z

    In this work, a source term model for estimating the rate of spreading and vaporization of LNG on land and sea is introduced. The model takes into account the composition changes of the boiling mixture, the varying thermodynamic properties due...

  19. Solid-Vapor Sorption Refrigeration Systems 

    E-Print Network [OSTI]

    Graebel, W.; Rockenfeller, U.; Kirol, L.

    1991-01-01T23:59:59.000Z

    SOLID-VAPOR SORPTION REFRIGERATION SYSTEMS DR. WILLIAM GRAEBEL DR. UWE ROCKENFELLER MR. LANCE KIROL Engineer President Chief Engineer Rocky Research Rocky Research Rocky Research Boulder city, NV Boulder city, NV Boulder City, NV Abstract.... Complex compounds have a number of advantages as working media, including: 43 SOLID-VAPOR SORPTION REFRIGERATION SYSTEMS DR. WILLIAM GRAEBEL Engineer Rocky Research Boulder city, NV DR. UWE ROCKENFELLER President Rocky Research Boulder city, NV MR...

  20. Harvard Department of Chemistry and Chemical Biology

    E-Print Network [OSTI]

    Heller, Eric

    Guide Glove Material Applications Butyl A synthetic rubber material that offers the highest permeation resistance to gas and water vapors. Esp. suited for use with esters and ketones. Neoprene A synthetic rubber and caustics. Moderate abrasion resistance. Nitrile A synthetic rubber material that offers chemical

  1. Proposal to Lead the Virtual Center on Carbon Materials, and support the Chemical Hydrides Center

    E-Print Network [OSTI]

    of nanoscale carbons, SWNTs, MWNTs by laser vaporization, chemical vapor deposition, hot wire CVD, and arc-discharge methods. Experience with dopant and/or catalyst incorporation NREL Capabilities in Carbon Materials laser by transition metal hydride complexes (funded by DOE BES) Lead DOE lab for new SiH4 production process ­ pilot

  2. Response of passive organic vapor dosimeters to a mixed gas exposure

    E-Print Network [OSTI]

    Anderson, Scott Merritt

    1982-01-01T23:59:59.000Z

    of Advisory Comm1ttee: Dr. Richard B. Konzen The effects of the sampling order of two chemicals adsorbed onto a DuPont Pro-Tek Organic Vapor Dosimeters were investigated. The dosimeters were exposed to varying known concentrations of methyl methacrylate... experiment, Mr. Marvin Harrington of Rohm and Haas of Texas, and Mr. Fred Gsweng of Dupont for providing essential materials for the completion of this research. A special thank you must be extended to the National Institute for Occupational Safety...

  3. Tribology Letters Vol. 10, No. 3, 2001 179 Activation of the SiC surface for vapor phase lubrication

    E-Print Network [OSTI]

    Gellman, Andrew J.

    above 500 C [2,3,11,12]. Since liquid lubricants cannot withstand such extreme conditions, a number deposition 1. Introduction The lubrication of ceramic surfaces working at extremely high temperatures has lubrication by Fe chemical vapor deposition from Fe(CO)5 Daxing Ren, Dougyong Sung and Andrew J. Gellman

  4. Vapor scavenging by atmospheric aerosol particles

    SciTech Connect (OSTI)

    Andrews, E.

    1996-05-01T23:59:59.000Z

    Particle growth due to vapor scavenging was studied using both experimental and computational techniques. Vapor scavenging by particles is an important physical process in the atmosphere because it can result in changes to particle properties (e.g., size, shape, composition, and activity) and, thus, influence atmospheric phenomena in which particles play a role, such as cloud formation and long range transport. The influence of organic vapor on the evolution of a particle mass size distribution was investigated using a modified version of MAEROS (a multicomponent aerosol dynamics code). The modeling study attempted to identify the sources of organic aerosol observed by Novakov and Penner (1993) in a field study in Puerto Rico. Experimentally, vapor scavenging and particle growth were investigated using two techniques. The influence of the presence of organic vapor on the particle`s hydroscopicity was investigated using an electrodynamic balance. The charge on a particle was investigated theoretically and experimentally. A prototype apparatus--the refractive index thermal diffusion chamber (RITDC)--was developed to study multiple particles in the same environment at the same time.

  5. Chemically assisted mechanical refrigeration process

    DOE Patents [OSTI]

    Vobach, A.R.

    1987-11-24T23:59:59.000Z

    There is provided a chemically assisted mechanical refrigeration process including the steps of: mechanically compressing a refrigerant stream which includes vaporized refrigerant; contacting the refrigerant with a solvent in a mixer at a pressure sufficient to promote substantial dissolving of the refrigerant in the solvent in the mixer to form a refrigerant-solvent solution while concurrently placing the solution in heat exchange relation with a working medium to transfer energy to the working medium, said refrigerant-solvent solution exhibiting a negative deviation from Raoult's Law; reducing the pressure over the refrigerant-solvent solution in an evaporator to allow the refrigerant to vaporize and substantially separate from the solvent while concurrently placing the evolving refrigerant-solvent solution in heat exchange relation with a working medium to remove energy from the working medium to thereby form a refrigerant stream and a solvent stream; and passing the solvent and refrigerant stream from the evaporator. 5 figs.

  6. Chemically assisted mechanical refrigeration process

    DOE Patents [OSTI]

    Vobach, Arnold R. (6006 Allentown Dr., Spring, TX 77389)

    1987-01-01T23:59:59.000Z

    There is provided a chemically assisted mechanical refrigeration process including the steps of: mechanically compressing a refrigerant stream which includes vaporized refrigerant; contacting the refrigerant with a solvent in a mixer (11) at a pressure sufficient to promote substantial dissolving of the refrigerant in the solvent in the mixer (11) to form a refrigerant-solvent solution while concurrently placing the solution in heat exchange relation with a working medium to transfer energy to the working medium, said refrigerant-solvent solution exhibiting a negative deviation from Raoult's Law; reducing the pressure over the refrigerant-solvent solution in an evaporator (10) to allow the refrigerant to vaporize and substantially separate from the solvent while concurrently placing the evolving refrigerant-solvent solution in heat exchange relation with a working medium to remove energy from the working medium to thereby form a refrigerant stream and a solvent stream; and passing the solvent and refrigerant stream from the evaporator.

  7. Chemically assisted mechanical refrigeration process

    DOE Patents [OSTI]

    Vobach, Arnold R. (6006 Allentown Dr., Spring, TX 77379)

    1987-01-01T23:59:59.000Z

    There is provided a chemically assisted mechanical refrigeration process including the steps of: mechanically compressing a refrigerant stream which includes vaporized refrigerant; contacting the refrigerant with a solvent in a mixer (11) at a pressure sufficient to promote substantial dissolving of the refrigerant in the solvent in the mixer (11) to form a refrigerant-solvent solution while concurrently placing the solution in heat exchange relation with a working medium to transfer energy to the working medium, said refrigerant-solvent solution exhibiting a negative deviation from Raoult's Law; reducing the pressure over the refrigerant-solvent solution in an evaporator (10) to allow the refrigerant to vaporize and substantially separate from the solvent while concurrently placing he evolving refrigerant-solvent solution in heat exchange relation with a working medium to remove energy from the working medium to thereby form a refrigerant stream and a solvent stream; and passing the solvent and refrigerant stream from the evaporator.

  8. Chemically assisted mechanical refrigeration process

    DOE Patents [OSTI]

    Vobach, A.R.

    1987-06-23T23:59:59.000Z

    There is provided a chemically assisted mechanical refrigeration process including the steps of: mechanically compressing a refrigerant stream which includes vaporized refrigerant; contacting the refrigerant with a solvent in a mixer at a pressure sufficient to promote substantial dissolving of the refrigerant in the solvent in the mixer to form a refrigerant-solvent solution while concurrently placing the solution in heat exchange relation with a working medium to transfer energy to the working medium, said refrigerant-solvent solution exhibiting a negative deviation from Raoult's Law; reducing the pressure over the refrigerant-solvent solution in an evaporator to allow the refrigerant to vaporize and substantially separate from the solvent while concurrently placing the evolving refrigerant-solvent solution in heat exchange relation with a working medium to remove energy from the working medium to thereby form a refrigerant stream and a solvent stream; and passing the solvent and refrigerant stream from the evaporator. 5 figs.

  9. Method and Apparatus for Concentrating Vapors for Analysis

    DOE Patents [OSTI]

    Grate, Jay W. (West Richland, WA); Baldwin, David L. (Kennewick, WA); Anheier, Jr., Norman C. (Richland, WA)

    2008-10-07T23:59:59.000Z

    An apparatus and method are disclosed for pre-concentrating gaseous vapors for analysis. The invention finds application in conjunction with, e.g., analytical instruments where low detection limits for gaseous vapors are desirable. Vapors sorbed and concentrated within the bed of the apparatus can be thermally desorbed achieving at least partial separation of vapor mixtures. The apparatus is suitable, e.g., for preconcentration and sample injection, and provides greater resolution of peaks for vapors within vapor mixtures, yielding detection levels that are 10-10,000 times better than for direct sampling and analysis systems. Features are particularly useful for continuous unattended monitoring applications.

  10. CHEMISTRY OF IMPACT-GENERATED SILICATE MELT-VAPOR DEBRIS DISKS

    SciTech Connect (OSTI)

    Visscher, Channon [Department of Space Studies, Southwest Research Institute, Boulder, CO 80302 (United States); Fegley, Bruce Jr. [Planetary Chemistry Laboratory, Department of Earth and Planetary Sciences and McDonnell Center for Space Sciences, Washington University in St. Louis, St. Louis, MO 63130 (United States)

    2013-04-10T23:59:59.000Z

    In the giant impact theory for lunar origin, the Moon forms from material ejected by the impact into an Earth-orbiting disk. Here we report the initial results from a silicate melt-vapor equilibrium chemistry model for such impact-generated planetary debris disks. In order to simulate the chemical behavior of a two-phase (melt+vapor) disk, we calculate the temperature-dependent pressure and chemical composition of vapor in equilibrium with molten silicate from 2000 to 4000 K. We consider the elements O, Na, K, Fe, Si, Mg, Ca, Al, Ti, and Zn for a range of bulk silicate compositions (Earth, Moon, Mars, eucrite parent body, angrites, and ureilites). In general, the disk atmosphere is dominated by Na, Zn, and O{sub 2} at lower temperatures (<3000 K) and SiO, O{sub 2}, and O at higher temperatures. The high-temperature chemistry is consistent for any silicate melt composition, and we thus expect abundant SiO, O{sub 2}, and O to be a common feature of hot, impact-generated debris disks. In addition, the saturated silicate vapor is highly oxidizing, with oxygen fugacity (f{sub O{sub 2}}) values (and hence H{sub 2}O/H{sub 2} and CO{sub 2}/CO ratios) several orders of magnitude higher than those in a solar-composition gas. High f{sub O{sub 2}} values in the disk atmosphere are found for any silicate composition because oxygen is the most abundant element in rock. We thus expect high oxygen fugacity to be a ubiquitous feature of any silicate melt-vapor disk produced via collisions between rocky planets.

  11. Modeling Ferro- and Antiferromagnetic Interactions in Metal-Organic Coordination Networks

    E-Print Network [OSTI]

    Faraggi, Marisa N; Stepanow, Sebastian; Tseng, Tzu-Chun; Abdurakhmanova, Nasiba; Kley, Christopher Seiji; Langner, Alexander; Sessi, Violetta; Kern, Klaus; Arnau, Andres

    2014-01-01T23:59:59.000Z

    Magnetization curves of two rectangular metal-organic coordination networks formed by the organic ligand TCNQ (7,7,8,8-tetracyanoquinodimethane) and two different (Mn and Ni) 3d transition metal atoms [M(3d)] show marked differences that are explained using first principles density functional theory and model calculations. We find that the existence of a weakly dispersive hybrid band with M(3d) and TCNQ character crossing the Fermi level is determinant for the appearance of ferromagnetic coupling between metal centers, as it is the case of the metallic system Ni-TCNQ but not of the insulating system Mn-TCNQ. The spin magnetic moment localized at the Ni atoms induces a significant spin polarization in the organic molecule; the corresponding spin density being delocalized along the whole system. The exchange interaction between localized spins at Ni centers and the itinerant spin density is ferromagnetic. Based on two different model Hamiltonians, we estimate the strength of exchange couplings between magnetic ...

  12. Design and Synthesis of Novel Porous Metal-Organic Frameworks (MOFs) Toward High Hydrogen Storage Capacity

    SciTech Connect (OSTI)

    Mohamed, Eddaoudi [USF; Zaworotko, Michael [USF; Space, Brian [USF; Eckert, Juergen [USF

    2013-05-08T23:59:59.000Z

    Statement of Objectives: 1. Synthesize viable porous MOFs for high H2 storage at ambient conditions to be assessed by measuring H2 uptake. 2. Develop a better understanding of the operative interactions of the sorbed H2 with the organic and inorganic constituents of the sorbent MOF by means of inelastic neutron scattering (INS, to characterize the H2-MOF interactions) and computational studies (to interpret the data and predict novel materials suitable for high H2 uptake at moderate temperatures and relatively low pressures). 3. Synergistically combine the outcomes of objectives 1 and 2 to construct a made-to-order inexpensive MOF that is suitable for super H2 storage and meets the DOE targets - 6% H2 per weight (2kWh/kg) by 2010 and 9% H2 per weight (3kWh/kg) by 2015. The ongoing research is a collaborative experimental and computational effort focused on assessing H2 storage and interactions with pre-selected metal-organic frameworks (MOFs) and zeolite-like MOFs (ZMOFs), with the eventual goal of synthesizing made-to-order high H2 storage materials to achieve the DOE targets for mobile applications. We proposed in this funded research to increase the amount of H2 uptake, as well as tune the interactions (i.e. isosteric heats of adsorption), by targeting readily tunable MOFs:

  13. Synthesis and Structural Characterization of Lithium-Based Metal?Organic Frameworks

    SciTech Connect (OSTI)

    Banerjee, Debasis; Borkowski, Lauren A.; Kim, Sun Jin; Parise, John B.; (IST-Korea); (SBU)

    2009-12-01T23:59:59.000Z

    Two lithium-based metal-organic frameworks, Li{sub 2}(C{sub 14}H{sub 8}O{sub 4}) [Li{sub 2}(4,4'-BPDC) [1]; ULMOF-2, UL = ultralight; BPDC = biphenyldicarboxylate]; space group P2{sub 1}/c, a = 12.758(2) {angstrom}, b = 5.142(4) {angstrom}, c = 8.00(2) {angstrom}, {beta} = 97.23{sup o}, V = 520.6(14) {angstrom}{sup 3} and Li{sub 2}(C{sub 14}H{sub 8}O{sub 6}S) [Li{sub 2}(4,4'-SDB) [2]; ULMOF-3, UL = ultralight; SDB = sulfonyldibenzoate], space group P2{sub 1}/n, a = 5.5480(11) {angstrom}, b = 23.450(5) {angstrom}, c = 10.320(2) {angstrom}, {beta} = 96.47(3){sup o}, V = 1334.1(5) {angstrom}3, were synthesized. Compounds 1 and 2 were synthesized by solvothermal methods and were characterized using single crystal X-ray diffraction. Structure 1 consists of layers of two-dimensional antifluorite related LiO motif connected by BPDC linkers, whereas structure 2 is constructed by a combination of tetrameric lithium polyhedral clusters connected by the sulfonyldibenzoate linker. The frameworks are stable up to 575 and 500 C, respectively, under N{sub 2} atmosphere.

  14. A FIRST ORDER PROJECTION-BASED TIME-SPLITTING SCHEME FOR COMPUTING CHEMICALLY REACTING FLOWS

    E-Print Network [OSTI]

    A FIRST ORDER PROJECTION-BASED TIME-SPLITTING SCHEME FOR COMPUTING CHEMICALLY REACTING FLOWS, surface catalytic reactors for methane to methanol conversion and chemical vapor deposition (CVD) process ANDREAS PROHL1 Abstract. The simulation of chemically reacting ows in speci#12;c situations is a basic

  15. A FIRST ORDER PROJECTIONBASED TIMESPLITTING SCHEME FOR COMPUTING CHEMICALLY REACTING FLOWS

    E-Print Network [OSTI]

    A FIRST ORDER PROJECTION­BASED TIME­SPLITTING SCHEME FOR COMPUTING CHEMICALLY REACTING FLOWS catalytic reactors for methane to methanol conversion and chemical vapor deposition (CVD) process modeling ANDREAS PROHL 1 Abstract. The simulation of chemically reacting flows in specific situations is a basic

  16. Diode pumped alkali vapor fiber laser

    DOE Patents [OSTI]

    Payne, Stephen A. (Castro Valley, CA); Beach, Raymond J. (Livermore, CA); Dawson, Jay W. (Livermore, CA); Krupke, William F. (Pleasanton, CA)

    2007-10-23T23:59:59.000Z

    A method and apparatus is provided for producing near-diffraction-limited laser light, or amplifying near-diffraction-limited light, in diode pumped alkali vapor photonic-band-gap fiber lasers or amplifiers. Laser light is both substantially generated and propagated in an alkali gas instead of a solid, allowing the nonlinear and damage limitations of conventional solid core fibers to be circumvented. Alkali vapor is introduced into the center hole of a photonic-band-gap fiber, which can then be pumped with light from a pump laser and operated as an oscillator with a seed beam, or can be configured as an amplifier.

  17. Diode pumped alkali vapor fiber laser

    DOE Patents [OSTI]

    Payne, Stephen A. (Castro Valley, CA); Beach, Raymond J. (Livermore, CA); Dawson, Jay W. (Livermore, CA); Krupke, William F. (Pleasanton, CA)

    2006-07-26T23:59:59.000Z

    A method and apparatus is provided for producing near-diffraction-limited laser light, or amplifying near-diffraction-limited light, in diode pumped alkali vapor photonic-band-gap fiber lasers or amplifiers. Laser light is both substantially generated and propagated in an alkali gas instead of a solid, allowing the nonlinear and damage limitations of conventional solid core fibers to be circumvented. Alkali vapor is introduced into the center hole of a photonic-band-gap fiber, which can then be pumped with light from a pump laser and operated as an oscillator with a seed beam, or can be configured as an amplifier.

  18. Adsorption of water vapor on reservoir rocks

    SciTech Connect (OSTI)

    Not Available

    1993-07-01T23:59:59.000Z

    Progress is reported on: adsorption of water vapor on reservoir rocks; theoretical investigation of adsorption; estimation of adsorption parameters from transient experiments; transient adsorption experiment -- salinity and noncondensible gas effects; the physics of injection of water into, transport and storage of fluids within, and production of vapor from geothermal reservoirs; injection optimization at the Geysers Geothermal Field; a model to test multiwell data interpretation for heterogeneous reservoirs; earth tide effects on downhole pressure measurements; and a finite-difference model for free surface gravity drainage well test analysis.

  19. Thermal electric vapor trap arrangement and method

    DOE Patents [OSTI]

    Alger, T.

    1988-03-15T23:59:59.000Z

    A technique for trapping vapor within a section of a tube is disclosed herein. This technique utilizes a conventional, readily providable thermal electric device having a hot side and a cold side and means for powering the device to accomplish this. The cold side of this device is positioned sufficiently close to a predetermined section of the tube and is made sufficiently cold so that any condensable vapor passing through the predetermined tube section is condensed and trapped, preferably within the predetermined tube section itself. 4 figs.

  20. Thermal electric vapor trap arrangement and method

    DOE Patents [OSTI]

    Alger, Terry (Tracy, CA)

    1988-01-01T23:59:59.000Z

    A technique for trapping vapor within a section of a tube is disclosed herein. This technique utilizes a conventional, readily providable thermal electric device having a hot side and a cold side and means for powering the device to accomplish this. The cold side of this device is positioned sufficiently close to a predetermined section of the tube and is made sufficiently cold so that any condensable vapor passing through the predetermined tube section is condensed and trapped, preferably within the predetermined tube section itself.

  1. Moisture Durability of Vapor Permeable Insulating Sheathing (Fact Sheet)

    SciTech Connect (OSTI)

    Not Available

    2013-10-01T23:59:59.000Z

    In this project, Building America team Building Science Corporation researched some of the ramifications of using exterior, vapor permeable insulation on retrofit walls with vapor permeable cavity insulation. Retrofit strategies are a key factor in reducing exterior building stock consumption.

  2. Vapor intrusion modeling : limitations, improvements, and value of information analyses

    E-Print Network [OSTI]

    Friscia, Jessica M. (Jessica Marie)

    2014-01-01T23:59:59.000Z

    Vapor intrusion is the migration of volatile organic compounds (VOCs) from a subsurface source into the indoor air of an overlying building. Vapor intrusion models, including the Johnson and Ettinger (J&E) model, can be ...

  3. OPTIMIZATION OF INJECTION INTO VAPOR-DOMINATED GEOTHERMAL

    E-Print Network [OSTI]

    Stanford University

    OPTIMIZATION OF INJECTION INTO VAPOR-DOMINATED GEOTHERMAL RESERVOIRS CONSIDERING ADSORPTION governing the behavior of vapor- dominated geothermal reservoirs. These mechanisms affect both was to determine the most effective injection strategy once these two effects are considered. Geothermal reservoir

  4. Chemical heat pump

    DOE Patents [OSTI]

    Greiner, Leonard (2750-C Segerstrom Ave., Santa Ana, CA 92704)

    1980-01-01T23:59:59.000Z

    A chemical heat pump system is disclosed for use in heating and cooling structures such as residences or commercial buildings. The system is particularly adapted to utilizing solar energy, but also increases the efficiency of other forms of thermal energy when solar energy is not available. When solar energy is not available for relatively short periods of time, the heat storage capacity of the chemical heat pump is utilized to heat the structure as during nighttime hours. The design also permits home heating from solar energy when the sun is shining. The entire system may be conveniently rooftop located. In order to facilitate installation on existing structures, the absorber and vaporizer portions of the system may each be designed as flat, thin wall, thin pan vessels which materially increase the surface area available for heat transfer. In addition, this thin, flat configuration of the absorber and its thin walled (and therefore relatively flexible) construction permits substantial expansion and contraction of the absorber material during vaporization and absorption without generating voids which would interfere with heat transfer. The heat pump part of the system heats or cools a house or other structure through a combination of evaporation and absorption or, conversely, condensation and desorption, in a pair of containers. A set of automatic controls change the system for operation during winter and summer months and for daytime and nighttime operation to satisfactorily heat and cool a house during an entire year. The absorber chamber is subjected to solar heating during regeneration cycles and is covered by one or more layers of glass or other transparent material. Daytime home air used for heating the home is passed at appropriate flow rates between the absorber container and the first transparent cover layer in heat transfer relationship in a manner that greatly reduce eddies and resultant heat loss from the absorbant surface to ambient atmosphere.

  5. Advancing Explosives Detection Capabilities: Vapor Detection

    ScienceCinema (OSTI)

    Atkinson, David

    2014-07-24T23:59:59.000Z

    A new, PNNL-developed method provides direct, real-time detection of trace amounts of explosives such as RDX, PETN and C-4. The method selectively ionizes a sample before passing the sample through a mass spectrometer to detect explosive vapors. The method could be used at airports to improve aviation security.

  6. Vaporization of synthetic fuels. Final report. [Thesis

    SciTech Connect (OSTI)

    Sirignano, W.A.; Yao, S.C.; Tong, A.Y.; Talley, D.

    1983-01-01T23:59:59.000Z

    The problem of transient droplet vaporization in a hot convective environment is examined. The main objective of the present study is to develop an algorithm for the droplet vaporization which is simple enough to be feasibly incorporated into a complete spray combustion analysis and yet will also account for the important physics such as liquid-phase internal circulation, unsteady droplet heating and axisymmetric gas-phase convection. A simplified liquid-phase model has been obtained based on the assumption of the existence of a Hill's spherical vortex inside the droplet together with some approximations made in the governing diffusion equation. The use of the simplified model in a spray situation has also been examined. It has been found that droplet heating and vaporization are essentially unsteady and droplet temperature is nonuniform for a significant portion of its lifetime. It has also been found that the droplet vaporization characteristic can be quite sensitive to the particular liquid-phase and gas-phase models. The results of the various models are compared with the existing experimental data. Due to large scattering in the experimental measurements, particularly the droplet diameter, no definite conclusion can be drawn based on the experimental data. Finally, certain research problems which are related to the present study are suggested for future studies.

  7. Program performs vapor-liquid equilibrium calculations

    SciTech Connect (OSTI)

    Rice, V.L.

    1982-06-28T23:59:59.000Z

    A program designed for the Hewlett-Packard HP-41CV or 41C calculators solves basic vapor-liquid equilibrium problems, including figuring the dewpoint, bubblepoint, and equilibrium flash. The algorithm uses W.C. Edmister's method for predicting ideal-solution K values.

  8. Ceramic-metallic coatings by electron beam physical vapor deposition (EB-PVD) process

    SciTech Connect (OSTI)

    Wolfe, D.E.; Singh, J. [Pennsylvania State Univ., State College, PA (United States)

    1995-12-31T23:59:59.000Z

    Electron Beam Physical Vapor Deposition (EB-PVD) process is considered to be a technology that has overcome some of the difficulties or problems associated with the chemical vapor deposition (CVD), physical vapor deposition (PVD) and metal spray processes. The EB-PVD process offers many desirable characteristics such as relatively high deposition rates (up to 100-150 {mu}m/minute with an evaporation rate {approx}10-15 Kg/hour,) dense coatings, precise compositional control, columnar and poly-crystalline microstructure, low contamination, and high thermal efficiency. Various metallic and ceramic coatings (oxides, carbides, nitrides) can be deposited at relatively low temperatures. Even elements with low vapor pressure such as molybdenum, tungsten, and carbon are readily evaporated by this process. In addition, EB-PVD is capable of producing multi-layered laminated metallic/ceramic coatings on large components by changing the EB-PVD processing conditions such as ingot composition, part manipulation, and electron beam energy. Attachment of an ion assisted beam source to the EB-PVD offers additional benefits such as dense coatings with improved adhesion. In addition, textured coatings can be obtained that are desirable in many applications such as cutting tools. This laboratory has started a new thrust in the coating area by the EB-PVD process. The microstructure of thermal barrier ceramic coatings (i.e., yttria stabilized zirconia) developed by the EB-PVD process will be presented.

  9. Help cut pollution with vapor/liquid and liquid/liquid separators

    SciTech Connect (OSTI)

    Woinsky, S.G.

    1994-10-01T23:59:59.000Z

    Vapor/liquid and liquid/liquid separators are common in chemical process industries plants. In addition to separating phases, these devices can aid in reducing pollution in the plant. Two-phase separators achieve pollution prevention via recycling of intermediates and final products. It is doubtful that most vapor/liquid and liquid/liquid separators are used specifically for pollution prevention projects. They may have another purpose yet provide pollution prevention as a bonus. The first step in achieving pollution prevention by design is for operating companies to be aware of vapor/liquid and liquid/liquid separators as potential pollution prevention devices. Then, likely applications need to be investigated. Since the quantities of material recovered are relatively small, higher value products are the most likely targets, especially for liquid/liquid separators. However, for vapor/liquid separators, the costs involved are usually relatively low since only the cost of a separator pad is normally involved, and more moderately valued products can be targets.

  10. Effects of capillarity and vapor adsorption in the depletion of vapor-dominated geothermal reservoirs

    SciTech Connect (OSTI)

    Pruess, Karsten; O'Sullivan, Michael

    1992-01-01T23:59:59.000Z

    Vapor-dominated geothermal reservoirs in natural (undisturbed) conditions contain water as both vapor and liquid phases. The most compelling evidence for the presence of distributed liquid water is the observation that vapor pressures in these systems are close to saturated vapor pressure for measured reservoir temperatures (White et al., 1971; Truesdell and White, 1973). Analysis of natural heat flow conditions provides additional, indirect evidence for the ubiquitous presence of liquid. From an analysis of the heat pipe process (vapor-liquid counterflow) Preuss (1985) inferred that effective vertical permeability to liquid phase in vapor-dominated reservoirs is approximately 10{sup 17} m{sup 2}, for a heat flux of 1 W/m{sup 2}. This value appears to be at the high end of matrix permeabilities of unfractured rocks at The Geysers, suggesting that at least the smaller fractures contribute to liquid permeability. For liquid to be mobile in fractures, the rock matrix must be essentially completely liquid-saturated, because otherwise liquid phase would be sucked from the fractures into the matrix by capillary force. Large water saturation in the matrix, well above the irreducible saturation of perhaps 30%, has been shown to be compatible with production of superheated steam (Pruess and Narasimhan, 1982). In response to fluid production the liquid phase will boil, with heat of vaporization supplied by the reservoir rocks. As reservoir temperatures decline reservoir pressures will decline also. For depletion of ''bulk'' liquid, the pressure would decline along the saturated vapor pressure curve, while for liquid held by capillary and adsorptive forces inside porous media, an additional decline will arise from ''vapor pressure lowering''. Capillary pressure and vapor adsorption effects, and associated vapor pressure lowering phenomena, have received considerable attention in the geothermal literature, and also in studies related to geologic disposal of heat generating nuclear wastes, and in the drying of porous materials. Geothermally oriented studies were presented by Chicoine et al. (1977), Hsieh and Ramey (1978, 1981), Herkelrath et al. (1983), and Nghiem and Ramey (1991). Nuclear waste-related work includes papers by Herkelrath and O'Neal (1985), Pollock (1986), Eaton and Bixler (1987), Pruess et al. (1990), Nitao (1990), and Doughty and E'ruess (1991). Applications to industrial drying of porous materials have been discussed by Hamiathy (1969) arid Whitaker (1977). This paper is primarily concerned with evaluating the impact of vapor pressure lowering (VPL) effects on the depletion behavior of vapor-dominated reservoirs. We have examined experimental data on vapor adsorption and capillary pressures in an effort to identify constitutive relationships that would be applicable to the tight matrix rocks of vapor-dominated systems. Numerical simulations have been performed to evaluate the impact of these effects on the depletion of vapor-dominated reservoirs.

  11. Modeling engine oil vaporization and transport of the oil vapor in the piston ring pack on internal combustion engines

    E-Print Network [OSTI]

    Cho, Yeunwoo, 1973-

    2004-01-01T23:59:59.000Z

    A model was developed to study engine oil vaporization and oil vapor transport in the piston ring pack of internal combustion engines. With the assumption that the multi-grade oil can be modeled as a compound of several ...

  12. Hydrogen storage and carbon dioxide capture in an iron-based sodalite-type metalorganic framework (Fe-BTT) discovered via high-throughput methods

    E-Print Network [OSTI]

    Hydrogen storage and carbon dioxide capture in an iron-based sodalite-type metal­organic framework/or volumetric capacities that approach the U.S. Department of Energy targets2 for mobile hydrogen storage storage capacity of 1.1 wt% and 8.4 g LÀ1 at 100 bar and 298 K. Powder neutron diffraction experiments

  13. Veeco Develops a Tool to Reduce Epitaxy Costs and Increase LED Brightness

    Broader source: Energy.gov [DOE]

    With the help of DOE funding, Veeco is working on reducing epitaxy costs and increasing LED efficiency by developing a physical vapor deposition (PVD) tool for depositing aluminum nitride buffer layers on LED substrates. PVD, also known as "sputtering," is an alternative to metal-organic chemical vapor deposition (MOCVD). PVD is a purely physical process that involves plasma sputter bombardment rather than a chemical reaction at the surface to be coated, as in MOCVD.

  14. Metal vapor laser including hot electrodes and integral wick

    DOE Patents [OSTI]

    Ault, Earl R. (Livermore, CA); Alger, Terry W. (Tracy, CA)

    1995-01-01T23:59:59.000Z

    A metal vapor laser, specifically one utilizing copper vapor, is disclosed herein. This laser utilizes a plasma tube assembly including a thermally insulated plasma tube containing a specific metal, e.g., copper, and a buffer gas therein. The laser also utilizes means including hot electrodes located at opposite ends of the plasma tube for electrically exciting the metal vapor and heating its interior to a sufficiently high temperature to cause the metal contained therein to vaporize and for subjecting the vapor to an electrical discharge excitation in order to lase. The laser also utilizes external wicking arrangements, that is, wicking arrangements located outside the plasma tube.

  15. Metal vapor laser including hot electrodes and integral wick

    DOE Patents [OSTI]

    Ault, E.R.; Alger, T.W.

    1995-03-07T23:59:59.000Z

    A metal vapor laser, specifically one utilizing copper vapor, is disclosed herein. This laser utilizes a plasma tube assembly including a thermally insulated plasma tube containing a specific metal, e.g., copper, and a buffer gas therein. The laser also utilizes means including hot electrodes located at opposite ends of the plasma tube for electrically exciting the metal vapor and heating its interior to a sufficiently high temperature to cause the metal contained therein to vaporize and for subjecting the vapor to an electrical discharge excitation in order to lase. The laser also utilizes external wicking arrangements, that is, wicking arrangements located outside the plasma tube. 5 figs.

  16. Industrial Heat Pumps Using Solid/Vapor Working Fluids

    E-Print Network [OSTI]

    Rockenfeller, U.

    with vapor re-compression recovery systems. The state-of-the-art heat pump equipment employing liquid/vapor working fluids fulfills the requirements only in some applications. The employment of solid/vapor complex compounds leads to 'nore cost effective... allows for firing temperatures much higher than possible with liquid/vapor systems. The high energy density per unit mass and the independence of the vapor pressure from the refrigerant concentration (p = f (T), p "# f( x)) over a wide range leads...

  17. Research on fundamental aspects of inorganic vapor and particle deposition in coal-fired systems

    SciTech Connect (OSTI)

    Rosner, D.E.

    1992-06-01T23:59:59.000Z

    Parallel research studies are underway on the following interrelated and fundamental subjects; Geometrical Approach to Determining the Sticking Probability of Particles Impacting on Convex Solid Surfaces; Correlations for High Schmidt Number Particle Deposition From Dilute Flowing Rational Engineering Suspensions; Average Capture Probability of Arriving Particles Which Are Distributed With ResPect to ImPact VelocitY and Incidence Angle (Relative to Deposit Substrate); Experimental and Theoretical Studies of Vapor Infiltration of Non-isothermal Granular Deposits; Effective Area/Volume of Populations of 'MicroPorous' Aerosol Particles (Compact and 'Fractal' Quasispherical Aggregates); Effects of Radiative Heat Transfer on the Coagulation Rates of Combustion-Generated Particles; Structure-Sensitivity of Total Mass Deposition Rates from Combustion Product Streams containing Coagulation-Aged Populations of Aggregated Primary Particles; and Na[sub 2]SO[sub 4] Chemical Vapor Deposition From Chlorine-containing Coal-Derived Gases.

  18. FIRST DETECTION OF WATER VAPOR IN A PRE-STELLAR CORE

    SciTech Connect (OSTI)

    Caselli, Paola; Douglas, Thomas [School of Physics and Astronomy, University of Leeds, Leeds LS2 9JT (United Kingdom); Keto, Eric [Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02138 (United States); Bergin, Edwin A. [Department of Astronomy, The University of Michigan, 500 Church Street, Ann Arbor, MI 48109-1042 (United States); Tafalla, Mario [Observatorio Astronomico Nacional (IGN), Calle Alfonso XII, 3, E-28014 Madrid (Spain); Aikawa, Yuri [Department of Earth and Planetary Sciences, Kobe University, Nada, 657-8501 Kobe (Japan); Pagani, Laurent [LERMA and UMR 8112 du CNRS, Observatoire de Paris, 61 Av. de l'Observatoire, F-75014 Paris (France); Yildiz, Umut A.; Kristensen, Lars E.; Van Dishoeck, Ewine F. [Leiden Observatory, Leiden University, P.O. Box 9513, 2300 RA Leiden (Netherlands); Van der Tak, Floris F. S. [SRON Netherlands Institute for Space Research, P.O. Box 800, 9700 AV, Groningen (Netherlands); Walmsley, C. Malcolm; Codella, Claudio [INAF-Osservatorio Astrofisico di Arcetri, Largo E. Fermi 5, I-50125 Firenze (Italy); Nisini, Brunella, E-mail: p.caselli@leeds.ac.uk [INAF-Osservatorio Astronomico di Roma, I-00040 Monte Porzio Catone (Italy)

    2012-11-10T23:59:59.000Z

    Water is a crucial molecule in molecular astrophysics as it controls much of the gas/grain chemistry, including the formation and evolution of more complex organic molecules in ices. Pre-stellar cores provide the original reservoir of material from which future planetary systems are built, but few observational constraints exist on the formation of water and its partitioning between gas and ice in the densest cores. Thanks to the high sensitivity of the Herschel Space Observatory, we report on the first detection of water vapor at high spectral resolution toward a dense cloud on the verge of star formation, the pre-stellar core L1544. The line shows an inverse P-Cygni profile, characteristic of gravitational contraction. To reproduce the observations, water vapor has to be present in the cold and dense central few thousand AU of L1544, where species heavier than helium are expected to freeze out onto dust grains, and the ortho:para H{sub 2} ratio has to be around 1:1 or larger. The observed amount of water vapor within the core (about 1.5 Multiplication-Sign 10{sup -6} M{sub Sun }) can be maintained by far-UV photons locally produced by the impact of galactic cosmic rays with H{sub 2} molecules. Such FUV photons irradiate the icy mantles, liberating water vapor in the core center. Our Herschel data, combined with radiative transfer and chemical/dynamical models, shed light on the interplay between gas and solids in dense interstellar clouds and provide the first measurement of the water vapor abundance profile across the parent cloud of a future solar-type star and its potential planetary system.

  19. Precision micro drilling with copper vapor lasers

    SciTech Connect (OSTI)

    Chang, J.J.; Martinez, M.W.; Warner, B.E.; Dragon, E.P.; Huete, G.; Solarski, M.E.

    1994-09-02T23:59:59.000Z

    The authors have developed a copper vapor laser based micro machining system using advanced beam quality control and precision wavefront tilting technologies. Micro drilling has been demonstrated through percussion drilling and trepanning using this system. With a 30 W copper vapor laser running at multi-kHz pulse repetition frequency, straight parallel holes with size varying from 500 microns to less than 25 microns and with aspect ratio up to 1:40 have been consistently drilled on a variety of metals with good quality. For precision trepanned holes, the hole-to-hole size variation is typically within 1% of its diameter. Hole entrance and exit are both well defined with dimension error less than a few microns. Materialography of sectioned holes shows little (sub-micron scale) recast layer and heat affected zone with surface roughness within 1--2 microns.

  20. Atomic vapor spectroscopy in integrated photonic structures

    E-Print Network [OSTI]

    Ritter, Ralf; Pernice, Wolfram; Kübler, Harald; Pfau, Tilman; Löw, Robert

    2015-01-01T23:59:59.000Z

    We investigate an integrated optical chip immersed in atomic vapor providing several waveguide geometries for spectroscopy applications. The narrow-band transmission through a silicon nitride waveguide and interferometer is altered when the guided light is coupled to a vapor of rubidium atoms via the evanescent tail of the waveguide mode. We use grating couplers to couple between the waveguide mode and the radiating wave, which allow for addressing arbitrary coupling positions on the chip surface. The evanescent atom-light interaction can be numerically simulated and shows excellent agreement with our experimental data. This work demonstrates a next step towards miniaturization and integration of alkali atom spectroscopy and provides a platform for further fundamental studies of complex waveguide structures.

  1. Apparatus and method for photochemical vapor deposition

    DOE Patents [OSTI]

    Jackson, Scott C. (Wilmington, DE); Rocheleau, Richard E. (Wilmington, DE)

    1987-03-31T23:59:59.000Z

    A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.

  2. Solid-Vapor Sorption Refrigeration Systems

    E-Print Network [OSTI]

    Graebel, W.; Rockenfeller, U.; Kirol, L.

    SOLID-VAPOR SORPTION REFRIGERATION SYSTEMS DR. WILLIAM GRAEBEL DR. UWE ROCKENFELLER MR. LANCE KIROL Engineer President Chief Engineer Rocky Research Rocky Research Rocky Research Boulder city, NV Boulder city, NV Boulder City, NV Abstract... Complex compound sorption reactions are ideally suited for use in refrigeration cycles as an economically viable alternative to CFC refrigerants. Complex compound refrigeration provides a number of energy-saving advantages over present refrigeration...

  3. Vapor-phase heat-transport system

    SciTech Connect (OSTI)

    Hedstrom, J.C.

    1983-01-01T23:59:59.000Z

    A vapor-phase heat-transport system is being tested in one of the passive test cells at Los Alamos. The system consists of one selective-surface collector and a condenser inside a water storage tank. The refrigerant, R-11, can be returned to the collector by gravity or with a pump. Results from several operating configurations are presented, together with a comparison with other passive systems. A new self-pumping concept is presented.

  4. Combined rankine and vapor compression cycles

    DOE Patents [OSTI]

    Radcliff, Thomas D.; Biederman, Bruce P.; Brasz, Joost J.

    2005-04-19T23:59:59.000Z

    An organic rankine cycle system is combined with a vapor compression cycle system with the turbine generator of the organic rankine cycle generating the power necessary to operate the motor of the refrigerant compressor. The vapor compression cycle is applied with its evaporator cooling the inlet air into a gas turbine, and the organic rankine cycle is applied to receive heat from a gas turbine exhaust to heat its boiler within one embodiment, a common condenser is used for the organic rankine cycle and the vapor compression cycle, with a common refrigerant, R-245a being circulated within both systems. In another embodiment, the turbine driven generator has a common shaft connected to the compressor to thereby eliminate the need for a separate motor to drive the compressor. In another embodiment, an organic rankine cycle system is applied to an internal combustion engine to cool the fluids thereof, and the turbo charged air is cooled first by the organic rankine cycle system and then by an air conditioner prior to passing into the intake of the engine.

  5. High volume fuel vapor release valve

    SciTech Connect (OSTI)

    Gimby, D.R.

    1991-09-03T23:59:59.000Z

    This patent describes a fuel vapor release valve for use in a vehicle fuel system. It comprises a valve housing 10 placed in a specific longitudinal orientation, the valve housing 10 defining an interior cavity 22 having an inlet 20 for admitting fuel vapor and an outlet 14 for discharging such fuel vapor; a valve member 24 positioned in the cavity 22 for movement between an outlet 14 opening position and an outlet 14 closing position, the valve member 24 including a cap member 34 having a seat surface 36 for mating with the outlet 14 and an orifice 42 extending through the cap member 34 providing a passageway from the outlet 14 to the cavity 22, the orifice 42 extending through the cap member 34 providing a passageway from the outlet 14 to the cavity 22, the orifice 42 having a lesser radius than the outlet 14; the valve member 24 further including a plug member 30 engaged with the cap member 34 for movement between an orifice 42 opening position and an orifice 42 closing position; and, a valve housing tilt responsive means for moving the valve member 24 to an outlet 14 and orifice 42 closing position in response to tilting of the valve 10 about its longitudinal axis whereby, upon the return of the valve 10 to its specified longitudinal orientation, the plug member 30 first moves to an orifice 42 opening position and the cap member 34 subsequently moves to an outlet 14 opening position.

  6. Chemical heat pump and chemical energy storage system

    DOE Patents [OSTI]

    Clark, Edward C. (Woodinville, WA); Huxtable, Douglas D. (Bothell, WA)

    1985-08-06T23:59:59.000Z

    A chemical heat pump and storage system employs sulfuric acid and water. In one form, the system includes a generator and condenser, an evaporator and absorber, aqueous acid solution storage and water storage. During a charging cycle, heat is provided to the generator from a heat source to concentrate the acid solution while heat is removed from the condenser to condense the water vapor produced in the generator. Water is then stored in the storage tank. Heat is thus stored in the form of chemical energy in the concentrated acid. The heat removed from the water vapor can be supplied to a heat load of proper temperature or can be rejected. During a discharge cycle, water in the evaporator is supplied with heat to generate water vapor, which is transmitted to the absorber where it is condensed and absorbed into the concentrated acid. Both heats of dilution and condensation of water are removed from the thus diluted acid. During the discharge cycle the system functions as a heat pump in which heat is added to the system at a low temperature and removed from the system at a high temperature. The diluted acid is stored in an acid storage tank or is routed directly to the generator for reconcentration. The generator, condenser, evaporator, and absorber all are operated under pressure conditions specified by the desired temperature levels for a given application. The storage tanks, however, can be maintained at or near ambient pressure conditions. In another form, the heat pump system is employed to provide usable heat from waste process heat by upgrading the temperature of the waste heat.

  7. Ductless fume hoods are designed to remove hazardous fumes and vapors from the work area by passing the exhaust air through a filter and/or adsorbent, such as an activated

    E-Print Network [OSTI]

    de Lijser, Peter

    I. Policy Ductless fume hoods are designed to remove hazardous fumes and vapors from the work area to Hazardous Chemicals in Laboratories); 5154.1 (Ventilation Requirements for Laboratory-Type Hood Operations require use of fume hoods to control exposure to hazardous or odorous chemicals. IV. Definitions Activated

  8. Calculation of the Dimer Equilibrium Constant of Heavy Water Saturated Vapor

    E-Print Network [OSTI]

    Bulavin, L A; Makhlaichuk, V N

    2015-01-01T23:59:59.000Z

    Water is the most common substance on Earth.The discovery of heavy water and its further study have shown that the change of hydrogen for deuterium leads to the significant differences in their properties.The triple point temperature of heavy water is higher,at the same time the critical temperature is lower.Experimental values of the second virial coefficient of the EOS for the vapor of normal and heavy water differ at all temperatures.This fact can influence the values of the dimerization constant for the heavy water vapor.The equilibrium properties of the dimerization process are described with the methods of chemical thermodynamics.The chemical potentials for monomers (m) and dimers (d)are the functions of their concentrations.The interactions of monomer-dimer and dimer-dimer types are taken into account within the solution of equation for chemical potentials.The obtained expression for the dimerization constant contains the contributions of these types.The averaged potentials are modeled by the Sutherlan...

  9. Adsorption and dissociation of hydrazoic acid on Al,,111... Dirk Porezag

    E-Print Network [OSTI]

    Liu, Amy Y.

    Adsorption and dissociation of hydrazoic acid on Al,,111... Dirk Porezag Center for Computational the adsorption of N3H on the Al 111 surface using ab initio density-functional theory and a self-ion implantation,3,4 N2H4 adsorption,5,6 N2 glow discharge,7,8 and metal-organic chemical vapor deposition MOCVD

  10. Journal of Electronic Materials, Vol. 19, No, 4, 1990 Carbon Tetrachloride Doped AIxGa_xAS

    E-Print Network [OSTI]

    Cunningham, Brian

    Journal of Electronic Materials, Vol. 19, No, 4, 1990 Carbon Tetrachloride Doped AIx been shown to be a suitable carbon doping source for obtaining p-type GaAs grown by metalorganic chemical vapor deposition (MOCVD) with carbon acceptor concentrations in excess of 1 x 1019cm-3

  11. MOVPE growth of semipolar III-nitride semiconductors on CVD graphene Priti Gupta n

    E-Print Network [OSTI]

    Deshmukh, Mandar M.

    MOVPE growth of semipolar III-nitride semiconductors on CVD graphene Priti Gupta n , A.A. Rahman pressure metalorganic vapor phase epitaxy B1. Graphene B1. Nitrides B2. Semiconducting III­V materials a b on graphene grown by chemical vapour deposition. GaN, AlGaN alloys, and InN layers are grown using an Al

  12. Hole-blocking titanium-oxide/silicon heterojunction and its application to photovoltaics

    E-Print Network [OSTI]

    Hole-blocking titanium-oxide/silicon heterojunction and its application to photovoltaics Sushobhan-bandgap semiconducting heterojunctions on silicon. Here, we present a wide-bandgap heterojunction--between titanium oxide and crystalline silicon--where the titanium oxide is deposited via a metal-organic chemical vapor deposition

  13. The Effect of Periodic Silane Burst on the Properties of GaN on Si (111) Substrates

    E-Print Network [OSTI]

    Zang, Keyan

    The periodic silane burst technique was employed during metalorganic chemical vapor deposition of epitaxial GaN on AlN buffer layers grown on Si (111). Periodic silicon delta doping during growth of both the AlN and GaN ...

  14. Introduction Within the context of a "bottom-up" ap-

    E-Print Network [OSTI]

    Yang, Peidong

    )substrate(Figure1a).4 A similar level of growth control can be achieved for GaN (Figure 1b) and Si 2 by adjusting the initial nano- cluster density on the substrates. In addi- tion, we have also the use of metalorganic chemical vapor deposition (MOCVD) and appropriate substrate selec- tion to control

  15. GLOBAL OPTIMIZATION FOR THE PHASE AND CHEMICAL EQUILIBRIUM PROBLEM

    E-Print Network [OSTI]

    Neumaier, Arnold

    GLOBAL OPTIMIZATION FOR THE PHASE AND CHEMICAL EQUILIBRIUM PROBLEM: APPLICATION TO THE NRTL is adequately modeled by the Non­Random Two Liquid (NRTL) activity coefficient expression and the vapor phase property of the Gibbs free energy expression involving the NRTL equation is provided. It is subsequently

  16. Calculation of the Dimer Equilibrium Constant of Heavy Water Saturated Vapor

    E-Print Network [OSTI]

    L. A. Bulavin; S. V. Khrapatiy; V. N. Makhlaichuk

    2015-03-13T23:59:59.000Z

    Water is the most common substance on Earth.The discovery of heavy water and its further study have shown that the change of hydrogen for deuterium leads to the significant differences in their properties.The triple point temperature of heavy water is higher,at the same time the critical temperature is lower.Experimental values of the second virial coefficient of the EOS for the vapor of normal and heavy water differ at all temperatures.This fact can influence the values of the dimerization constant for the heavy water vapor.The equilibrium properties of the dimerization process are described with the methods of chemical thermodynamics.The chemical potentials for monomers (m) and dimers (d)are the functions of their concentrations.The interactions of monomer-dimer and dimer-dimer types are taken into account within the solution of equation for chemical potentials.The obtained expression for the dimerization constant contains the contributions of these types.The averaged potentials are modeled by the Sutherland potential.Theoretical values of the dimerization constant for the heavy water vapor at different temperatures are compared to those for normal water.We see the exceeding of the values for the heavy water at all temperatures.This fact is in good agreement with all experimental data that is available.The excess is related to the differences in the character of the heat excitations of the dimers of normal and heavy water,their rotational constants and energy of their vibrational excitations.Significant role is also played by the monomer-dimer and dimer-dimer interactions.

  17. Rational Design, Synthesis, Purification, and Activation of Metal-Organic Framework

    E-Print Network [OSTI]

    these unusual properties in applica- tions such as hydrogen and methane storage, chemical separa- tions, and selective chemical catalysis. In principle, one of the most attractive features of MOFs is the simplicity separation of desired MOFs from crystalline and amorphous contaminants cogenerated during synthesis based

  18. Designing Higher Surface Area Metal-Organic Frameworks: Are Triple Bonds Better Than Phenyls?

    E-Print Network [OSTI]

    hydrogen is a compelling alternative to gasoline in many respects, high- density storage is a significant applications, including gas storage,4-8 gas and chemical separations,9-12 chemical catalysis,13,14 sensing,15-board H2 storage systems for the year 2017: 5.5 wt % in gravimetric capacity and 40 g/L of volumetric

  19. Method and apparatus for concentrating vapors for analysis

    DOE Patents [OSTI]

    Grate, Jay W. (West Richland, WA); Baldwin, David L. (Kennewick, WA); Anheier, Jr., Norman C. (Richland, WA)

    2012-06-05T23:59:59.000Z

    A pre-concentration device and a method are disclosed for concentrating gaseous vapors for analysis. Vapors sorbed and concentrated within the bed of the pre-concentration device are thermally desorbed, achieving at least partial separation of the vapor mixtures. The pre-concentration device is suitable, e.g., for pre-concentration and sample injection, and provides greater resolution of peaks for vapors within vapor mixtures, yielding detection levels that are 10-10,000 times better than direct sampling and analysis systems. Features are particularly useful for continuous unattended monitoring applications. The invention finds application in conjunction with, e.g., analytical instruments where low detection limits for gaseous vapors are desirable.

  20. G-Band Vapor Radiometer Profiler (GVRP) Handbook

    SciTech Connect (OSTI)

    Caddeau, MP

    2010-06-23T23:59:59.000Z

    The G-Band Vapor Radiometer Profiler (GVRP) provides time-series measurements of brightness temperatures from 15 channels between 170 and 183.310 GHz. Atmospheric emission in this spectral region is primarily due to water vapor, with some influence from liquid water. Channels between 170.0 and 176.0 GHz are particularly sensitive to the presence of liquid water. The sensitivity to water vapor of the 183.31-GHz line is approximately 30 times higher than at the frequencies of the two-channel microwave radiometer (MWR) for a precipitable water vapor (PWV) amount of less than 2.5 mm. Measurements from the GVRP instrument are therefore especially useful during low-humidity conditions (PWV < 5 mm). In addition to integrated water vapor and liquid water, the GVRP can provide low-resolution vertical profiles of water vapor in very dry conditions.

  1. FLAMMABILITY CHARACTERISTICS OF COMBUSTIBLE GASES AND VAPORS

    Office of Scientific and Technical Information (OSTI)

    1939, pp. International Acetylene Association. Acetylene Transmission for Chemical Synthesis. Internat. Acetylene ASSOC., New York (no date), 40 pp. Jackson, J. L., and R....

  2. Method for controlling corrosion in thermal vapor injection gases

    DOE Patents [OSTI]

    Sperry, John S. (Houston, TX); Krajicek, Richard W. (Houston, TX)

    1981-01-01T23:59:59.000Z

    An improvement in the method for producing high pressure thermal vapor streams from combustion gases for injection into subterranean oil producing formations to stimulate the production of viscous minerals is described. The improvement involves controlling corrosion in such thermal vapor gases by injecting water near the flame in the combustion zone and injecting ammonia into a vapor producing vessel to contact the combustion gases exiting the combustion chamber.

  3. Heat Recovery in Distillation by Mechanical Vapor Recompression

    E-Print Network [OSTI]

    Becker, F. E.; Zakak, A. I.

    tower energy requirements can be achieved by mechanical vapor recompression. Three design approaches for heating a distillation tower reboiler by mechanical vapor recompression are presented. The advantages of using a screw compressor are discussed... for lowering energy consumption in the distillation process through various heat recovery techniques. (3-8) One such technique utilizes mechanical vapor recompression. (9-12) The principle of this ap proach involves the use of a compressor to recycle...

  4. Recovery of benzene in an organic vapor monitor

    E-Print Network [OSTI]

    Krenek, Gregory Joel

    1980-01-01T23:59:59.000Z

    solid adsorbents available (silica gel, activated alumina, etc. ), activated charcoal is most frequently utilized. Activated charcoal has retentivity for sorbed vapors several times that of silica gel and it displays a selectivity for organic vapors... (diffusion rate) of the vapor molecules to the sur- face of the adsorbent. The adsorption process determine how effective the adsorbent collects and holds the contam- inant on the surface of the activated charcoal. Recovery of the contaminant from...

  5. Review of enhanced vapor diffusion in porous media

    SciTech Connect (OSTI)

    Webb, S.W.; Ho, C.K.

    1998-08-01T23:59:59.000Z

    Vapor diffusion in porous media in the presence of its own liquid has often been treated similar to gas diffusion. The gas diffusion rate in porous media is much lower than in free space due to the presence of the porous medium and any liquid present. However, enhanced vapor diffusion has also been postulated such that the diffusion rate may approach free-space values. Existing data and models for enhanced vapor diffusion, including those in TOUGH2, are reviewed in this paper.

  6. Rigidifying Fluorescent Linkers by Metal–Organic Framework Formation for Fluorescence Blue Shift and Quantum Yield Enhancement

    SciTech Connect (OSTI)

    Wei, Zhangwen; Gu, Zhi-Yuan; Arvapally, Ravi K.; Chen, Ying-Pin; Ivy, Joshua F.; Yakovenko, Andrey A.; Feng, Dawei; Omary, Mohammad A.; Zhou, Hong-Cai [UNT

    2014-06-11T23:59:59.000Z

    We demonstrate that rigidifying the structure of fluorescent linkers by structurally constraining them in metal–organic frameworks (MOFs) to control their conformation effectively tunes the fluorescence energy and enhances the quantum yield. Thus, a new tetraphenylethylene-based zirconium MOF exhibits a deep-blue fluorescent emission at 470 nm with a unity quantum yield (99.9 ± 0.5%) under Ar, representing ca. 3600 cm?¹ blue shift and doubled radiative decay efficiency vs the linker precursor. An anomalous increase in the fluorescence lifetime and relative intensity takes place upon heating the solid MOF from cryogenic to ambient temperatures. The origin of these unusual photoluminescence properties is attributed to twisted linker conformation, intramolecular hindrance, and framework rigidity.

  7. A description of the vapor phase in the lithium thionyl chloride battery

    E-Print Network [OSTI]

    Morales, Rodolfo

    1988-01-01T23:59:59.000Z

    A DESCRIPTION OF TIIE YAPOP, PHASE IN THF. LITHIUM THIONYI. CHLORIDE BATTERY A Thesis by RODOLFO MORALES, JR. Submitted to the Graduate College of Texas AEzM University in partial fulfrHment of the requirement for the degree oi' MASTER... OF SCIENCE August 1988 Major Subject: Chemical Engineering A DESCRIPTION OF THE VAPOR PHASE IN THE LITHIUM THIONYL CHLORIDE BATTERY A Thesis bv RODOLFO 'vIORALES, JR. Approved as to style and content by: Ralph E. White (Chairman of Committee) James...

  8. Solubility parameter and activity coefficient of HDEHP dimer in select organic diluents by vapor pressure osmometry

    SciTech Connect (OSTI)

    Gray, M.; Nilsson, M. [University of California Irvine, 916 Engineering Tower, UC Irvine, Irvine, CA 92697-2575 (United States); Zalupski, P. [Idaho National Laboratory, 2525 Fremont Avenue, Idaho Falls, ID 83415 (United States)

    2013-07-01T23:59:59.000Z

    A thorough understanding of the non-ideal behavior of the chemical components utilized in solvent extraction contributes to the success of any large-scale spent nuclear fuel treatment. To address this, our current work uses vapor pressure osmometry to characterize the non-ideal behavior of the solvent extraction agent di-(2-ethylhexyl) phosphoric acid (HDEHP), a common extractant in proposed separation schemes. Solubility parameters were fit to data on HDEHP at four temperatures using models based on Scatchard Hildebrand regular solution theory with Flory Huggins entropic corrections. The results are comparable but not identical to the activity coefficients from prior slope analysis in the literature. (authors)

  9. Vapor port and groundwater sampling well

    DOE Patents [OSTI]

    Hubbell, J.M.; Wylie, A.H.

    1996-01-09T23:59:59.000Z

    A method and apparatus have been developed for combining groundwater monitoring wells with unsaturated-zone vapor sampling ports. The apparatus allows concurrent monitoring of both the unsaturated and the saturated zone from the same well at contaminated areas. The innovative well design allows for concurrent sampling of groundwater and volatile organic compounds (VOCs) in the vadose (unsaturated) zone from a single well, saving considerable time and money. The sample tubes are banded to the outer well casing during installation of the well casing. 10 figs.

  10. Vapor port and groundwater sampling well

    DOE Patents [OSTI]

    Hubbell, Joel M. (Idaho Falls, ID); Wylie, Allan H. (Idaho Falls, ID)

    1996-01-01T23:59:59.000Z

    A method and apparatus has been developed for combining groundwater monitoring wells with unsaturated-zone vapor sampling ports. The apparatus allows concurrent monitoring of both the unsaturated and the saturated zone from the same well at contaminated areas. The innovative well design allows for concurrent sampling of groundwater and volatile organic compounds (VOCs) in the vadose (unsaturated) zone from a single well, saving considerable time and money. The sample tubes are banded to the outer well casing during installation of the well casing.

  11. Copper vapor laser acoustic thermometry system

    DOE Patents [OSTI]

    Galkowski, Joseph J. (Livermore, CA)

    1987-01-01T23:59:59.000Z

    A copper vapor laser (CVL) acoustic thermometry system is disclosed. The invention couples an acoustic pulse a predetermined distance into a laser tube by means of a transducer and an alumina rod such that an echo pulse is returned along the alumina rod to the point of entry. The time differential between the point of entry of the acoustic pulse into the laser tube and the exit of the echo pulse is related to the temperature at the predetermined distance within the laser tube. This information is processed and can provide an accurate indication of the average temperature within the laser tube.

  12. Vapor Retarder Classification - Building America Top Innovation |

    Broader source: Energy.gov (indexed) [DOE]

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645 3,625 1,006 492 742EnergyOn AprilA group current C3EDepartmentDepartment of Energy Photo of a vapor retarder

  13. Category:Mercury Vapor | Open Energy Information

    Open Energy Info (EERE)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page onYou are now leaving Energy.gov You are now leaving Energy.gov You are beingZealand JumpConceptual Model, click here. Category:Conceptual ModelLists forMercury Vapor page? For detailed

  14. Interaction of wide-band-gap single crystals with 248-nm excimer laser radiation. XI. The effect of water vapor and temperature on laser desorption

    E-Print Network [OSTI]

    Dickinson, J. Thomas

    . Significantly, introducing water vapor lowers the particle velocities and thus the effective surface temperature systems, simultaneous electronic excitation and exposure to aggressive chemicals can acceler- ate etching-induced neutral particle desorption and surface erosion on single- crystal sodium chloride in the presence of low

  15. acetone vapor sensing: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    XI, Universit de 7 ATMOSPHERIC WATER VAPOR PROFILES DERIVED FROM REMOTE-SENSING RADIOMETER MEASUREMENTS CiteSeer Summary: The feasibility and preliminary testing of a low...

  16. Rotary Vapor Compression Cycle Technology: A Pathway to Ultra...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Cycle Technology: A Pathway to Ultra-Efficient Air Conditioning, Heating and Refrigeration Rotary Vapor Compression Cycle Technology: A Pathway to Ultra-Efficient Air...

  17. alkali vapor species: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    of hexagonal patterns in a nonlinear optical system: Alkali metal vapor in a single-mirror arrangement Physics Websites Summary: Secondary bifurcations of hexagonal patterns in...

  18. alkali atom vapor: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    low power requirements, these "chip-scale" atomic Popovic, Zoya 3 Hybrid Optical Pumping of Optically Dense Alkali-Metal Vapor without Quenching Gas M. V. Romalis Physics...

  19. A new vapor pressure equation originating at the critical point

    E-Print Network [OSTI]

    Nuckols, James William

    1976-01-01T23:59:59.000Z

    - tence curve has been developed from critical scaling theory. The agreement between published vapor pressures and vapor pressures predicted by this equation is very good, especially in the critical region where many other vapor pressure equations fail... vapor pressure data f' or Ar, N2, 02H6, and H20, w1th the parameters ai to a being determined by an unweighted least squares curve 5 fit. The method of least squares has been described adequately elsewhere, e. g. Wylie (1966), and the theory w111...

  20. atmospheric water vapor: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    greenhouse gas, contributing to approximately two-thirds of the Earth's greenhouse effect Mitchell, 1989; IntergovernmentalA meta-analysis of water vapor...

  1. Hypothetical Thermodynamic Properties. Subcooled Vaporization Enthalpies and Vapor Pressures of Polyaromatic Hydrocarbons

    E-Print Network [OSTI]

    Chickos, James S.

    of Polyaromatic Hydrocarbons William Hanshaw, Marjorie Nutt, and James S. Chickos* Department of Chemistry and liquid vapor pressures from T ) 298.15 K to T ) 510 K of a series of polyaromatic hydrocarbons have been protocols are also made, and agreement generally is quite good. Introduction Polyaromatic hydrocarbons (PAHs

  2. M. Bahrami ENSC 461 (S 11) Vapor Power Cycles 1 Vapor Power Cycles

    E-Print Network [OSTI]

    Bahrami, Majid

    is not a suitable model for steam power cycle since: The turbine has to handle steam with low quality which will cause erosion and wear in turbine blades. It is impractical to design a compressor that handles two vapor expands isentropically in turbine and produces work. 4-1: Const P heat rejection High quality

  3. Synthesis, Structure Determination, and Hydrogen Sorption Studies of New Metal-Organic Frameworks Using Triazole and Naphthalenedicarboxylic Acid

    SciTech Connect (OSTI)

    Park,H.; Britten, J.; Mueller, U.; Lee, J.; Li, J.; Parise, J.

    2007-01-01T23:59:59.000Z

    Two new metal-organic framework compounds were synthesized under solvothermal conditions using Zn{sup 2+} ion, 1,2,4-triazole (TRZ), and 1,4- and 2,6-naphthalenedicarboxylic acids (NDC): Zn{sub 4}(TRZ){sub 4}(1,4-NDC){sub 2}-2DMF-2H{sub 2}O (1) and Zn{sub 4}(TRZ){sub 4}(2,6-NDC){sub 2}-2DMF-4H{sub 2}O (2). Their crystal structures were characterized by single-crystal X-ray diffraction. Structure 1 crystallizes in the P2{sub 1}/n space group with a = 13.609(2) {angstrom}, b = 27.181(5){angstrom}, c = 13.617(3) {angstrom}, {beta} = 92.46(1){sup o}, V = 5032.4(16) {angstrom}{sup 3}, and Z = 4. Structure 2 crystallizes in orthorhombic Pna2{sub 2} space group with a = 30.978(6) {angstrom}, b = 12.620(3) {angstrom}, c = 13.339(3) {angstrom}, V = 5215(2) {angstrom}{sup 3}, and Z = 4. Both structures are analogues of the previously reported Zn{sub 4}(TRZ){sub 4}(1,4-BDC){sub 2}-16H{sub 2}O where the layers of Zn-triazole moieties are pillared by aromatic dicarboxylates to create 3-D open frameworks. Nitrogen sorption studies revealed that these structures have Brunaer-Emmett-Teller (BET) surface areas of 362.1-584.1 m{sup 2}/g. Hydrogen sorption experiments showed they can store 0.84-1.09 wt % H{sub 2} at 77 K and 1 atm. Although they do not contain large pores or surface areas, they possess the hydrogen sorption capacities comparable to those of highly porous metal-organic frameworks.

  4. The control of confined vapor phase explosions

    SciTech Connect (OSTI)

    Scilly, N.F. [Laporte plc, Widnes (United Kingdom); Owen, O.J.R. [Fine Organics, Ltd., Middlesborough (United Kingdom); Wilberforce, J.K. [Solvay SA, Brussels (Belgium)

    1995-12-31T23:59:59.000Z

    The probability of, for example, a fire or explosion occurring during a process operation is related both to the fire-related properties of the materials used, such as flash point, flammable limits etc., i.e. the material or intrinsic factors, and the nature of the operation and the equipment used, i.e. the extrinsic factors. The risk, or frequency of occurrence, of other hazards such as reaction runaway, major toxic release etc. can be determined in a similar manner. For a vapor phase explosion (and a fire) the probability of the event is the product of the probability of generating a flammable atmosphere and the probability of ignition. Firstly, materials may be coded using properties that are relevant to the hazard in question. Secondly, different operations have different degrees of risk and these risks are assigned as Low, Medium, High etc. according to criteria outlined here. Combination of these two factors will then be a measure of the overall risk of the operation with the specified material and may be used to define operating standards. Currently, the hazard/risk of a vapor phase explosions is examined by this method but in due course dust explosions, fires, condensed phase explosions, reaction runaways, physical explosions, major toxic releases and incompatibility will be included.

  5. Vapor and gas sampling of Single-Shell Tank 241-A-101 using the Vapor Sampling System

    SciTech Connect (OSTI)

    Caprio, G.S.

    1995-11-01T23:59:59.000Z

    This document presents sampling data resulting from the June 8, 1995, sampling of SST 241-A-101 using the Vapor Sampling System.

  6. Chemical Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Chemical Science Compton double ionization of helium in the region of the cross-section maximum B. Krssig, R.W. Dunford, D.S. Gemmell, S. Hasegawa, E.P. Kanter, H....

  7. Isoreticular metal-organic frameworks, process for forming the same, and systematic design of pore size and functionality therein, with application for gas storage

    DOE Patents [OSTI]

    Yaghi, Omar M.; Eddaoudi, Mohamed; Li, Hailian; Kim, Jaheon; Rosi, Nathaniel

    2005-08-16T23:59:59.000Z

    An isoreticular metal-organic framework (IRMOF) and method for systematically forming the same. The method comprises the steps of dissolving at least one source of metal cations and at least one organic linking compound in a solvent to form a solution; and crystallizing the solution under predetermined conditions to form a predetermined IRMOF. At least one of functionality, dimension, pore size and free volume of the IRMOF is substantially determined by the organic linking compound.

  8. Development of Metal-Organic Framework Thin Films and Membranes for Low-Energy Gas Separation

    E-Print Network [OSTI]

    McCarthy, Michael

    2011-08-08T23:59:59.000Z

    , regular pore structure and thermal and chemical stability.7-9 Their rigid pores allow zeolite membranes to achieve gas separation with high selectivity due to the molecular sieving effect.7, 10 The high thermal and chemical stability of these materials..., that unlike molecular sieving observed in zeolite membranes, ZIF membranes have not been observed to exhibit sharp permeance cutoffs. This is understood as a result of the flexible nature of organic ligands in the ZIF structure.39 Figure 9. Top...

  9. Solid source MOCVD system

    DOE Patents [OSTI]

    Hubert, Brian N. (Yakima, WA); Wu, Xin Di (San Jose, CA)

    1998-01-01T23:59:59.000Z

    A system for MOCVD fabrication of superconducting and non-superconducting oxide films provides a delivery system for the feeding of metalorganic precursors for multi-component chemical vapor deposition. The delivery system can include multiple cartridges containing tightly packed precursor materials. The contents of each cartridge can be ground at a desired rate and fed together with precursor materials from other cartridges to a vaporization zone and then to a reaction zone within a deposition chamber for thin film deposition.

  10. 1-Dimensional Numerical Model of Thermal Conduction and Vapor Diffusion

    E-Print Network [OSTI]

    Schörghofer, Norbert

    developed by Samar Khatiwala, 2001 extended to variable thermal properties and irregular grid by Norbert Sch for c. Upper boundary condition: a) Radiation Q + k T z z=0 = T4 z=0 Q is the incoming solar flux of Water Vapor with Phase Transitions developed by Norbert Sch¨orghofer, 2003­2004 3 phases: vapor, free

  11. Fenton Oxidation of TCE Vapors in a Foam Reactor

    E-Print Network [OSTI]

    Fenton Oxidation of TCE Vapors in a Foam Reactor Eunsung Kan,a,b Seongyup Kim,a and Marc A.interscience.wiley.com). DOI 10.1002/ep.10205 Oxidation of dilute TCE vapors in a foam reactor using Fenton's reagent composition of Fenton's reagents, the foam reactor configuration provided a higher rate absorption and greater

  12. ADHESION FORCES BETWEEN MICA SURFACES IN UNDERSATURATED VAPORS OF HYDROCARBONS

    E-Print Network [OSTI]

    Matsuoka, Hiroshige

    ADHESION FORCES BETWEEN MICA SURFACES IN UNDERSATURATED VAPORS OF HYDROCARBONS H. MATSUOKA1 , T] or meniscus force [3], which have been neglected in the conventional and relatively large mechani- cal systems forces between mica surfaces in under- saturated vapors of several kind of hydrocarbon liquids are mea

  13. Analysis of electron-beam vaporization of refractory metals

    SciTech Connect (OSTI)

    Kheshgi, H.S.; Gresho, P.M.

    1986-09-01T23:59:59.000Z

    An electron beam is focussed onto a small area on the surface of a refractory metal to locally raise the temperature and vaporize metal. At high vaporization rates the hot area is on the surface of a churning liquid-metal pool contained in a solid-metal skull which sits in a cooled crucible. Inner workings of the process are revealed by analysis of momentum, energy, and mass transfer. At the surface high temperature causes high vaporization rate and high vapor thrust, depressing the vapor/liquid surface. In the liquid pool surface-tension gradients and thermal buoyancy drive a (typically) chaotic flow. In the solid skull thermal conductivity and contact resistance regulate the rate of heat transfer from pool to crucible. Analyses of these phenomena together reveal process performance sensitivities - e.g., to depression size or to magnitude of surface-tension gradients. 12 refs., 3 figs.

  14. Kinetics of wet sodium vapor complex plasma

    SciTech Connect (OSTI)

    Mishra, S. K., E-mail: nishfeb@rediffmail.com [Institute for Plasma Research (IPR), Gandhinagar 382428 (India); Sodha, M. S. [Centre of Energy Studies, Indian Institute of Technology Delhi (IITD), New Delhi 110016 (India)] [Centre of Energy Studies, Indian Institute of Technology Delhi (IITD), New Delhi 110016 (India)

    2014-04-15T23:59:59.000Z

    In this paper, we have investigated the kinetics of wet (partially condensed) Sodium vapor, which comprises of electrons, ions, neutral atoms, and Sodium droplets (i) in thermal equilibrium and (ii) when irradiated by light. The formulation includes the balance of charge over the droplets, number balance of the plasma constituents, and energy balance of the electrons. In order to evaluate the droplet charge, a phenomenon for de-charging of the droplets, viz., evaporation of positive Sodium ions from the surface has been considered in addition to electron emission and electron/ion accretion. The analysis has been utilized to evaluate the steady state parameters of such complex plasmas (i) in thermal equilibrium and (ii) when irradiated; the results have been graphically illustrated. As a significant outcome irradiated, Sodium droplets are seen to acquire large positive potential, with consequent enhancement in the electron density.

  15. Monitoring of vapor phase polycyclic aromatic hydrocarbons

    DOE Patents [OSTI]

    Vo-Dinh, Tuan; Hajaligol, Mohammad R.

    2004-06-01T23:59:59.000Z

    An apparatus for monitoring vapor phase polycyclic aromatic hydrocarbons in a high-temperature environment has an excitation source producing electromagnetic radiation, an optical path having an optical probe optically communicating the electromagnetic radiation received at a proximal end to a distal end, a spectrometer or polychromator, a detector, and a positioner coupled to the first optical path. The positioner can slidably move the distal end of the optical probe to maintain the distal end position with respect to an area of a material undergoing combustion. The emitted wavelength can be directed to a detector in a single optical probe 180.degree. backscattered configuration, in a dual optical probe 180.degree. backscattered configuration or in a dual optical probe 90.degree. side scattered configuration. The apparatus can be used to monitor an emitted wavelength of energy from a polycyclic aromatic hydrocarbon as it fluoresces in a high temperature environment.

  16. Hybrid Vapor Compression Adsorption System: Thermal Storage Using Hybrid Vapor Compression Adsorption System

    SciTech Connect (OSTI)

    None

    2012-01-04T23:59:59.000Z

    HEATS Project: UTRC is developing a new climate-control system for EVs that uses a hybrid vapor compression adsorption system with thermal energy storage. The targeted, closed system will use energy during the battery-charging step to recharge the thermal storage, and it will use minimal power to provide cooling or heating to the cabin during a drive cycle. The team will use a unique approach of absorbing a refrigerant on a metal salt, which will create a lightweight, high-energy-density refrigerant. This unique working pair can operate indefinitely as a traditional vapor compression heat pump using electrical energy, if desired. The project will deliver a hot-and-cold battery that provides comfort to the passengers using minimal power, substantially extending the driving range of EVs.

  17. Gas Separation Using Organic-Vapor-Resistent Membranes In Conjunctin With Organic-Vapor-Selective Membranes

    DOE Patents [OSTI]

    Baker, Richard W. (Palo Alto, CA); Pinnau, Ingo (Palo Alto, CA); He, Zhenjie (Fremont, CA); Da Costa, Andre R. (Menlo Park, CA); Daniels, Ramin (San Jose, CA); Amo, Karl D. (Mountain View, CA); Wijmans, Johannes G. (Menlo Park, CA)

    2003-06-03T23:59:59.000Z

    A process for treating a gas mixture containing at least an organic compound gas or vapor and a second gas, such as natural gas, refinery off-gas or air. The process uses two sequential membrane separation steps, one using membrane selective for the organic compound over the second gas, the other selective for the second gas over the organic vapor. The second-gas-selective membranes use a selective layer made from a polymer having repeating units of a fluorinated polymer, and demonstrate good resistance to plasticization by the organic components in the gas mixture under treatment, and good recovery after exposure to liquid aromatic hydrocarbons. The membrane steps can be combined in either order.

  18. Environmentally focused patterning and processing of polymer thin films by initiated chemical vapor deposition (iCVD) and oxidative chemical vapor deposition (oCVD)

    E-Print Network [OSTI]

    Trujillo, Nathan J. (Nathan Jeffrey)

    2010-01-01T23:59:59.000Z

    The new millennium has brought fourth many technological innovations made possible by the advancement of high speed integrated circuits. The materials and energy requirements for a microchip is orders of magnitude higher ...

  19. alkali-metal vapor density: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    system: Alkali metal vapor in a single-mirror arrangement Physics Websites Summary: Secondary bifurcations of hexagonal patterns in a nonlinear optical system: Alkali metal vapor...

  20. Conformal chemically resistant coatings for microflow devices

    DOE Patents [OSTI]

    Folta, James A.; Zdeblick, Mark

    2003-05-13T23:59:59.000Z

    A process for coating the inside surfaces of silicon microflow devices, such as electrophoresis microchannels, with a low-stress, conformal (uniform) silicon nitride film which has the ability to uniformly coat deeply-recessed cavities with, for example, aspect ratios of up to 40:1 or higher. The silicon nitride coating allows extended exposure to caustic solutions. The coating enables a microflow device fabricated in silicon to be resistant to all classes of chemicals: acids, bases, and solvents. The process involves low-pressure (vacuum) chemical vapor deposition. The ultra-low-stress silicon nitride deposition process allows 1-2 .mu.m thick films without cracks, and so enables extended chemical protection of a silicon microflow device against caustics for up to 1 year. Tests have demonstrated the resistance of the films to caustic solutions at both ambient and elevated temperatures to 65.degree. C.

  1. Chemical Occurrences

    Broader source: Energy.gov [DOE]

    Classification of Chemical Occurrence Reports into the following four classes: Occurrences characterized by serious energy release, injury or exposure requiring medical treatment, or severe environmental damage, Occurrences characterized by minor injury or exposure, or reportable environmental release, Occurrences that were near misses including notable safety violations and Minor occurrences.

  2. Metal-Organic Framework Thin Films Composed of Free-Standing Acicular Nanorods Exhibiting Reversible Electrochromism

    E-Print Network [OSTI]

    they can be used as smart windows, display devices, vehicle sunroofs, and antiglare mirrors for cars.2-14 Their high permanent porosity,15 nanostructured pores, and tunable pore compositions have led to their consideration for a remarkably broad range of applications, including gas storage,16 chemical separations,17

  3. Hydrogen storage in metalorganic frameworksw Leslie J. Murray, Mircea Dinca and Jeffrey R. Long*

    E-Print Network [OSTI]

    Battery and fuel-cell technologies are strong candidates to replace gasoline and diesel engines) or through stronger chemical associations Department of Chemistry, University of California, Berkeley, CA) obtained BA degrees in Chemistry and Biology from Swarthmore College in 2002. He received a Ph

  4. A Multifunctional 3D Ferroelectric and NLO-Active Porous Metal-Organic Zhengang Guo,

    E-Print Network [OSTI]

    Li, Jing

    , Fuzhou, Fujian, 350002, P.R. China, and Department of Chemistry and Chemical Biology, Rutgers Uni focuses on introducing additional functionalities into porous MOFs, for instance, porous MOF based magnets the use of a tetracarboxylic ligand H4X8 (H4X ) tetrakis[4-(carboxyphenyl)oxamethyl]methane acid) with Zn

  5. Controlling the vapor pressure of a mercury lamp

    DOE Patents [OSTI]

    Grossman, Mark W. (Belmont, MA); George, William A. (Rockport, MA)

    1988-01-01T23:59:59.000Z

    The invention described herein discloses a method and apparatus for controlling the Hg vapor pressure within a lamp. This is done by establishing and controlling two temperature zones within the lamp. One zone is colder than the other zone. The first zone is called the cold spot. By controlling the temperature of the cold spot, the Hg vapor pressure within the lamp is controlled. Likewise, by controlling the Hg vapor pressure of the lamp, the intensity and linewidth of the radiation emitted from the lamp is controlled.

  6. In-well vapor stripping drilling and characterization work plan

    SciTech Connect (OSTI)

    Koegler, K.J.

    1994-03-13T23:59:59.000Z

    This work plan provides the information necessary for drilling, sampling, and hydrologic testing of wells to be completed in support of a demonstration of the in-well vapor stripping system. The in-well vapor stripping system is a remediation technology designed to preferentially extract volatile organic compounds (VOCs) from contaminated groundwater by converting them to a vapor phase. Air-lift pumping is used to lift and aerate groundwater within the well. The volatiles escaping the aerated water are drawn off by a slight vacuum and treated at the surface while the water is allowed to infiltrate the vadose zone back to the watertable.

  7. Enhanced Attenuation Technologies: Passive Soil Vapor Extraction

    SciTech Connect (OSTI)

    Vangelas, K.; Looney, B.; Kamath, R.; Adamson, D.; Newell, C.

    2010-03-15T23:59:59.000Z

    Passive soil vapor extraction (PSVE) is an enhanced attenuation (EA) approach that removes volatile contaminants from soil. The extraction is driven by natural pressure gradients between the subsurface and atmosphere (Barometric Pumping), or by renewable sources of energy such as wind or solar power (Assisted PSVE). The technology is applicable for remediating sites with low levels of contamination and for transitioning sites from active source technologies such as active soil vapor extraction (ASVE) to natural attenuation. PSVE systems are simple to design and operate and are more cost effective than active systems in many scenarios. Thus, PSVE is often appropriate as an interim-remedial or polishing strategy. Over the past decade, PSVE has been demonstrated in the U.S. and in Europe. These demonstrations provide practical information to assist in selecting, designing and implementing the technology. These demonstrations indicate that the technology can be effective in achieving remedial objectives in a timely fashion. The keys to success include: (1) Application at sites where the residual source quantities, and associated fluxes to groundwater, are relatively low; (2) Selection of the appropriate passive energy source - barometric pumping in cases with a deep vadose zone and barrier (e.g., clay) layers that separate the subsurface from the atmosphere and renewable energy assisted PSVE in other settings and where higher flow rates are required. (3) Provision of sufficient access to the contaminated vadose zones through the spacing and number of extraction wells. This PSVE technology report provides a summary of the relevant technical background, real-world case study performance, key design and cost considerations, and a scenario-based cost evaluation. The key design and cost considerations are organized into a flowchart that dovetails with the Enhanced Attenuation: Chlorinated Organics Guidance of the Interstate Technology and Regulatory Council (ITRC). The PSVE flowchart provides a structured process to determine if the technology is, or is not, reasonable and defensible for a particular site. The central basis for that decision is the expected performance of PSVE under the site specific conditions. Will PSVE have sufficient mass removal rates to reduce the release, or flux, of contamination into the underlying groundwater so that the site can meet it overall remedial objectives? The summary technical information, case study experiences, and structured decision process provided in this 'user guide' should assist environmental decision-makers, regulators, and engineers in selecting and successfully implementing PSVE at appropriate sites.

  8. New Regenerative Cycle for Vapor Compression Refrigeration

    SciTech Connect (OSTI)

    Mark J. Bergander

    2005-08-29T23:59:59.000Z

    The main objective of this project is to confirm on a well-instrumented prototype the theoretically derived claims of higher efficiency and coefficient of performance for geothermal heat pumps based on a new regenerative thermodynamic cycle as comparing to existing technology. In order to demonstrate the improved performance of the prototype, it will be compared to published parameters of commercially available geothermal heat pumps manufactured by US and foreign companies. Other objectives are to optimize the design parameters and to determine the economic viability of the new technology. Background (as stated in the proposal): The proposed technology closely relates to EERE mission by improving energy efficiency, bringing clean, reliable and affordable heating and cooling to the residential and commercial buildings and reducing greenhouse gases emission. It can provide the same amount of heating and cooling with considerably less use of electrical energy and consequently has a potential of reducing our nations dependence on foreign oil. The theoretical basis for the proposed thermodynamic cycle was previously developed and was originally called a dynamic equilibrium method. This theory considers the dynamic equations of state of the working fluid and proposes the methods for modification of T-S trajectories of adiabatic transformation by changing dynamic properties of gas, such as flow rate, speed and acceleration. The substance of this proposal is a thermodynamic cycle characterized by the regenerative use of the potential energy of two-phase flow expansion, which in traditional systems is lost in expansion valves. The essential new features of the process are: (1) The application of two-step throttling of the working fluid and two-step compression of its vapor phase. (2) Use of a compressor as the initial step compression and a jet device as a second step, where throttling and compression are combined. (3) Controlled ratio of a working fluid at the first and second step of compression. In the proposed system, the compressor compresses the vapor only to 50-60% of the final pressure, while the additional compression is provided by a jet device using internal potential energy of the working fluid flow. Therefore, the amount of mechanical energy required by a compressor is significantly reduced, resulting in the increase of efficiency (either COP or EER). The novelty of the cycle is in the equipment and in the way the multi-staging is accomplished. The anticipated result will be a new refrigeration system that requires less energy to accomplish a cooling task. The application of this technology will be for more efficient designs of: (1) Industrial chillers, (2) Refrigeration plants, (3) Heat pumps, (4) Gas Liquefaction plants, (5) Cryogenic systems.

  9. Continuous ultra-thin MoS{sub 2} films grown by low-temperature physical vapor deposition

    SciTech Connect (OSTI)

    Muratore, C. [Department of Chemical and Materials Engineering, University of Dayton, Dayton, Ohio 45469 (United States); Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433 (United States); Hu, J. J.; Bultman, J. E.; Jespersen, M. L. [Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433 (United States); University of Dayton Research Institute, Dayton, Ohio 45469 (United States); Wang, B.; Haque, M. A. [Department of Mechanical and Nuclear Engineering, Pennsylvania State University, College Park, Pennsylvania 16802 (United States); Shamberger, P. J.; McConney, M. E.; Naguy, R. D.; Voevodin, A. A. [Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433 (United States)

    2014-06-30T23:59:59.000Z

    Uniform growth of pristine two dimensional (2D) materials over large areas at lower temperatures without sacrifice of their unique physical properties is a critical pre-requisite for seamless integration of next-generation van der Waals heterostructures into functional devices. This Letter describes a vapor phase growth technique for precisely controlled synthesis of continuous, uniform molecular layers of MoS{sub 2} on silicon dioxide and highly oriented pyrolitic graphite substrates of over several square centimeters at 350?°C. Synthesis of few-layer MoS{sub 2} in this ultra-high vacuum physical vapor deposition process yields materials with key optical and electronic properties identical to exfoliated layers. The films are composed of nano-scale domains with strong chemical binding between domain boundaries, allowing lift-off from the substrate and electronic transport measurements from contacts with separation on the order of centimeters.

  10. Isobaric vapor-liquid equilibria of the water + 2-propanol system at 30, 60, and 100 kPa

    SciTech Connect (OSTI)

    Marzal, P.; Monton, J.B.; Rodrigo, M.A. [Univ. de Valencia (Spain). Departamento de Ingenieria Quimica] [Univ. de Valencia (Spain). Departamento de Ingenieria Quimica

    1996-05-01T23:59:59.000Z

    Distillation is perhaps the separation process most widely used in the chemical processing industry. The correct design of distillation columns requires the availability of accurate and, if possible, thermodynamically consistent vapor-liquid equilibria (VLE) data. The present work is part of a project studying the effect of pressure on the behavior of the azeotropic point in mixtures in which at least one component is an alcohol. Isobaric vapor-liquid equilibria were obtained for the water + 2-propanol system at 30, 60, and 100 kPa. The activity coefficients were found to be thermodynamically consistent by the methods of Van Ness-Byer-Gibbs, Kojima, and Wisniak. The data were correlated with five liquid phase activity coefficient models (Margules, Van Laar, Wilson, NRTL, and UNIQUAC).

  11. Comparative study of polar and semipolar (112{sup ¯}2) InGaN layers grown by metalorganic vapour phase epitaxy

    SciTech Connect (OSTI)

    Dinh, Duc V., E-mail: vanduc.dinh@tyndall.ie, E-mail: peter.parbrook@tyndall.ie; Zubialevich, V. Z. [Tyndall National Institute, University College Cork, Lee Matltings, Dyke Parade, Cork (Ireland); Oehler, F.; Kappers, M. J.; Humphreys, C. J. [Department of Materials Science and Metallurgy University of Cambridge, Pembroke Street, Cambridge CB2 3QZ (United Kingdom); Alam, S. N.; Parbrook, P. J., E-mail: vanduc.dinh@tyndall.ie, E-mail: peter.parbrook@tyndall.ie [Tyndall National Institute, University College Cork, Lee Matltings, Dyke Parade, Cork (Ireland); School of Engineering, University College Cork, Cork (Ireland); Caliebe, M.; Scholtz, F. [Institute of Optoelectronics, Ulm University, Ulm 89069 (Germany)

    2014-10-21T23:59:59.000Z

    InGaN layers were grown simultaneously on (112{sup ¯}2) GaN and (0001) GaN templates by metalorganic vapour phase epitaxy. At higher growth temperature (?750?°C), the indium content (<15%) of the (112{sup ¯}2) and (0001) InGaN layers was similar. However, for temperatures less than 750?°C, the indium content of the (112{sup ¯}2) InGaN layers (15%–26%) were generally lower than those with (0001) orientation (15%–32%). The compositional deviation was attributed to the different strain relaxations between the (112{sup ¯}2) and (0001) InGaN layers. Room temperature photoluminescence measurements of the (112{sup ¯}2) InGaN layers showed an emission wavelength that shifts gradually from 380?nm to 580?nm with decreasing growth temperature (or increasing indium composition). The peak emission wavelength of the (112{sup ¯}2) InGaN layers with an indium content of more than 10% blue-shifted a constant value of ?(50–60) nm when using higher excitation power densities. This blue-shift was attributed to band filling effects in the layers.

  12. Low Level Heat Recovery Through Heat Pumps and Vapor Recompression 

    E-Print Network [OSTI]

    Gilbert, J.

    1980-01-01T23:59:59.000Z

    of each approach as a function of the source and sink temperatures and magnitude of heat flow. Generic heat pumps and vapor recompression designs are explained, costed, estimated in performance, and evaluated as a function of the economic parameters...

  13. Optical Precursors in Rubidium Vapor and Their Relation to Superradiance

    E-Print Network [OSTI]

    Yang, Wenlong

    2012-10-19T23:59:59.000Z

    Optical precursor is the sharp optical pulse front that does not show delay in absorptive media. In this thesis, optical precursor behavior in rubidium (Rb) vapor was investigated in the picoseconds regime. An amplified femtosecond laser was shaped...

  14. Applications of Mechanical Vapor Recompression to Evaporation and Crystallization

    E-Print Network [OSTI]

    Outland, J. S.

    there is no boiler plant available or when electrical power is priced competitively in comparison to steam. Vapor recompression is accomplished using centrifugal, axial-flow, or positive displacement compressors and these compressors can be powered by electricity...

  15. Melt and vapor characteristics in an electron beam evaporator

    SciTech Connect (OSTI)

    Blumenfeld, L.; Fleche, J.L.; Gonella, C. [DCC/DPE/SPEA Centre d`Etudes de Saclay, Gif-sur-Yvette (France)

    1994-12-31T23:59:59.000Z

    We compare the free surface temperatures T{sub s}, calculated by two methods, in cerium or copper evaporation experiments. The first method considers properties of the melt: by an empirical law we take into account turbulent thermal convection, instabilities and craterization of the free surface. The second method considers the vapor flow expansion and connects T{sub s} to the measured terminal parallel temperature and the terminal mean parallel velocity of the vapor jet, by Direct Simulation Monte Carlo calculations including an atom-atom inelastic collision algorithm. The agreement between the two approaches is better for cerium than for copper in the high craterization case. The analysis, from the point of view of the properties of the melt, of the terminal parameters of the vapor jet for the high beam powers shows that T{sub s} and the Knudsen number at the vapor source reach a threshold when the beam power increases.

  16. University of Oregon: GPS-based Precipitable Water Vapor (PWV)

    DOE Data Explorer [Office of Scientific and Technical Information (OSTI)]

    Vignola, F.; Andreas, A.

    A partnership with the University of Oregon and U.S. Department of Energy's National Renewable Energy Laboratory (NREL) to collect Precipitable Water Vapor (PWV) data to compliment existing resource assessment data collection by the university.

  17. Apparent Temperature Dependence on Localized Atmospheric Water Vapor

    E-Print Network [OSTI]

    Salvaggio, Carl

    Apparent Temperature Dependence on Localized Atmospheric Water Vapor Matthew Montanaroa, Carl temperature of the target if not properly accounted for. The temperature error is defined as the difference between the target leaving apparent temperature and observed apparent temperature. The effects

  18. Low Level Heat Recovery Through Heat Pumps and Vapor Recompression

    E-Print Network [OSTI]

    Gilbert, J.

    1980-01-01T23:59:59.000Z

    The intent of this paper is to examine the methods and economics of recovering low level heat through heat pumps and vapor recompression. Actual commercially available equipment is considered to determine the near-term and future economic viability...

  19. Systems and methods for generation of hydrogen peroxide vapor

    DOE Patents [OSTI]

    Love, Adam H; Eckels, Joel Del; Vu, Alexander K; Alcaraz, Armando; Reynolds, John G

    2014-12-02T23:59:59.000Z

    A system according to one embodiment includes a moisture trap for drying air; at least one of a first container and a second container; and a mechanism for at least one of: bubbling dried air from the moisture trap through a hydrogen peroxide solution in the first container for producing a hydrogen peroxide vapor, and passing dried air from the moisture trap into a headspace above a hydrogen peroxide solution in the second container for producing a hydrogen peroxide vapor. A method according one embodiment includes at least one of bubbling dried air through a hydrogen peroxide solution in a container for producing a first hydrogen peroxide vapor, and passing dried air from the moisture trap into a headspace above the hydrogen peroxide solution in a container for producing a second hydrogen peroxide vapor. Additional systems and methods are also presented.

  20. Type B Accident Investigation of the Acid Vapor Inhalation on...

    Broader source: Energy.gov (indexed) [DOE]

    2005, in TA-48, Building RC-1 Room 402 at the Los Alamos National Laboratory Type B Accident Investigation of the Acid Vapor Inhalation on June 7, 2005, in TA-48, Building RC-1...

  1. ARM: Microwave Radiometer data (MWR Profiles - QME), water vapor, temp, cloud liquid water, precip water retrievals

    DOE Data Explorer [Office of Scientific and Technical Information (OSTI)]

    Cadeddu, Maria

    Microwave Radiometer data (MWR Profiles - QME), water vapor, temp, cloud liquid water, precip water retrievals

  2. Carbon nanotube coatings as chemical absorbers

    DOE Patents [OSTI]

    Tillotson, Thomas M.; Andresen, Brian D.; Alcaraz, Armando

    2004-06-15T23:59:59.000Z

    Airborne or aqueous organic compound collection using carbon nanotubes. Exposure of carbon nanotube-coated disks to controlled atmospheres of chemical warefare (CW)-related compounds provide superior extraction and retention efficiencies compared to commercially available airborne organic compound collectors. For example, the carbon nanotube-coated collectors were four (4) times more efficient toward concentrating dimethylmethyl-phosphonate (DMMP), a CW surrogate, than Carboxen, the optimized carbonized polymer for CW-related vapor collections. In addition to DMMP, the carbon nanotube-coated material possesses high collection efficiencies for the CW-related compounds diisopropylaminoethanol (DIEA), and diisopropylmethylphosphonate (DIMP).

  3. Intermediate Vapor Expansion Distillation and Nested Enrichment Cascade Distillation

    E-Print Network [OSTI]

    Erickson, D. C.

    INTERMEDIATE VAPOR EXPANSION DISTILLATION AND NESTED ENRICHMENT CASCADE DISTILLATION D.. C. Erickson Energy Concepts Company Annapolis, Maryland ABSTRACT Although it is known that incorporating an intermediate reboiler or reflux... condenser in a distillation ~olumn will improve column efficiency by 15 to 100%, there has been little use of this technique to date." Intermediate vapor compression heat pumping was recently introduced as one practical means of achieving this benefit...

  4. Injection locked oscillator system for pulsed metal vapor lasers

    DOE Patents [OSTI]

    Warner, Bruce E. (Livermore, CA); Ault, Earl R. (Dublin, CA)

    1988-01-01T23:59:59.000Z

    An injection locked oscillator system for pulsed metal vapor lasers is disclosed. The invention includes the combination of a seeding oscillator with an injection locked oscillator (ILO) for improving the quality, particularly the intensity, of an output laser beam pulse. The present invention includes means for matching the first seeder laser pulses from the seeding oscillator to second laser pulses of a metal vapor laser to improve the quality, and particularly the intensity, of the output laser beam pulse.

  5. Vaporizer design criteria for ethanol fueled internal combustion engines

    E-Print Network [OSTI]

    Ariyaratne, Arachchi Rallage

    1985-01-01T23:59:59.000Z

    Properties of Alcohols, Water and Petroleum Fuels. 2 Results of regression analysis. 3 Effect of various parameters on vaporization length. 51 4 Predicted tube length for different fuel requirements (Ten stainless steel tubes, 4. 7 mm ID. ). 60 ix LIST... with quality with increasing heat flux as parameter. 18 5 Reynolds Number Factor, F. 6 Suppression Factor, S. 27 27 7 Flow chart of the algorithm for vaporization length. 8 The single tube heat exchanger. 33 36 9 Thermocouple arrangement along...

  6. Optimal determination of the vapor pressure critical exponent

    E-Print Network [OSTI]

    Walton, Clifford Wayne

    1977-01-01T23:59:59.000Z

    , 1969), while scaling theory predicts about 0. 1 (Vicentini-Missoni et al. , 1969; Widom and Rowlinson, 1970). The object of this study was to determine the optimum value of 0 by means of a least squares fit of various nonanalytic vapor pressure... onal : cj ence Foundation, Grant ENG76-00692, is acknowl- edged. vi TABLE OF CONTENTS Page SCOPE. CONCLUSIONS AND SIGNII'ICANCE INTRODUCTION Theory. Development of Vapor Pressure Equations PROCEDURE. Curve Fit Method (CFN). Numerical...

  7. Tank Vapor Characterization Project: Annual status report for FY 1996

    SciTech Connect (OSTI)

    Silvers, K.L.; Fruchter, J.S.; Huckaby, J.L.; Almeida, T.L.; Evans, J.C. Jr.; Pool, K.H.; Simonen, C.A.; Thornton, B.M.

    1997-01-01T23:59:59.000Z

    In Fiscal Year 1996, staff at the Vapor Analytical Laboratory at Pacific Northwest National Laboratory performed work in support of characterizing the vapor composition of the headspaces of radioactive waste tanks at the Hanford Site. Work performed included support for technical issues and sampling methodologies, upgrades for analytical equipment, analytical method development, preparation of unexposed samples, analyses of tank headspaces samples, preparation of data reports, and operation of the tank vapor database. Progress made in FY 1996 included completion and issuance of 50 analytical data reports. A sampling system comparison study was initiated and completed during the fiscal year. The comparison study involved the vapor sampling system (VSS), a truck-based system, and the in situ vapor sampling system (ISVS), a cart-based system. Samples collected during the study were characterized for inorganic, permanent gases, total non-methane organic compounds and organic speciation by SUMMA{trademark} and TST methods. The study showed comparable sampling results between the systems resulting in the program switching from the VSS to the less expensive ISVS methodology in late May 1996. A temporal study was initiated in January 1996 in order to understand the influences seasonal temperatures changes have on the vapors in the headspace of Hanford waste tanks. A holding time study was initiated in the fourth quarter of FY 1996. Samples were collected from tank S-102 and rushed to the laboratory for time zero analysis. Additional samples will be analyzed at 1, 2, 4, 8, 16, and 32 weeks.

  8. Chemical Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645 3,625 1,006 492 742EnergyOnItem NotEnergy,ARMForms AboutRESEARCH CAPABILITIES Thematerials | Center forChemical

  9. Creating a Discovery Platform for Confined-Space Chemistry and Materials: Metal-Organic Frameworks.

    SciTech Connect (OSTI)

    Allendorf, Mark D.; Greathouse, Jeffery A. [Sandia National Laboratories, Albuquerque, NM; Simmons, Blake

    2008-09-01T23:59:59.000Z

    Metal organic frameworks (MOF) are a recently discovered class of nanoporous, defect-free crystalline materials that enable rational design and exploration of porous materials at the molecular level. MOFs have tunable monolithic pore sizes and cavity environments due to their crystalline nature, yielding properties exceeding those of most other porous materials. These include: the lowest known density (91% free space); highest surface area; tunable photoluminescence; selective molecular adsorption; and methane sorption rivaling gas cylinders. These properties are achieved by coupling inorganic metal complexes such as ZnO4 with tunable organic ligands that serve as struts, allowing facile manipulation of pore size and surface area through reactant selection. MOFs thus provide a discovery platform for generating both new understanding of chemistry in confined spaces and novel sensors and devices based on their unique properties. At the outset of this project in FY06, virtually nothing was known about how to couple MOFs to substrates and the science of MOF properties and how to tune them was in its infancy. An integrated approach was needed to establish the required knowledge base for nanoscale design and develop methodologies integrate MOFs with other materials. This report summarizes the key accomplishments of this project, which include creation of a new class of radiation detection materials based on MOFs, luminescent MOFs for chemical detection, use of MOFs as templates to create nanoparticles of hydrogen storage materials, MOF coatings for stress-based chemical detection using microcantilevers, and %22flexible%22 force fields that account for structural changes in MOFs that occur upon molecular adsorption/desorption. Eight journal articles, twenty presentations at scientific conferences, and two patent applications resulted from the work. The project created a basis for continuing development of MOFs for many Sandia applications and succeeded in securing %242.75 M in funding from outside agencies to continue the research. 3

  10. A model of vapor-liquid equilibria for acid gas-alkanolamine-water systems

    SciTech Connect (OSTI)

    Austgen, D.M. Jr.

    1989-01-01T23:59:59.000Z

    A physico-chemical model was developed for representing liquid phase chemical equilibria and vapor-liquid (phase) equilibria of H{sub 2}SCO{sub 2}-alkanolamine-water systems. The equilibrium composition of the liquid phase is determined by minimization of the Gibbs free energy. Activity coefficients are represented with the Electrolyte-NRTL equation treating both long-range electrostatic interactions and short-range binary interactions between liquid phase species. Vapor phase fugacity coefficients are calculated using the Redlich-Kwong-Soave Equation of State. Adjustable parameters of the model, binary interaction parameters and carbamate stability constants, were fitted on published binary system alkanolamine-water and ternary system (H{sub 2}S-alkanolamine-water, CO{sub 2}-alkanolamine-water) VLE data. The Data Regression System of ASPEN PLUS, based upon the Maximum Likelihood Principle, was used to estimate adjustable parameters. Ternary system measurements used in parameter estimation ranged in temperature from 25 to 120{degree}C in alkanolamine concentration from 1 to 5 M, in acid gas loading from 0 to 1.5 moles per mole alkanolamine, and in acid gas partial pressure from 0.1 to 1,000 kPa. Maximum likelihood estimates of ternary system H{sub 2} or CO{sub 2} equilibrium partial pressures and liquid phase concentrations were found to be in good agreement with measurements for aqueous solutions of monoethanolamine (MEA), diethanolamine (DEA), diglycolamine (DGA), and methyldiethanolamine (MDEA) indicating that the model successfully represents ternary system data. The model was extended to represent CO{sub 2} solubility in aqueous mixtures of MDEA with MEA or DEA. The solubility was measured at 40 and 80{degree}C over a wide range of CO{sub 2} partial pressures. These measurements were used to estimate additional binary parameters of the mixed solvent systems.

  11. A model of vapor-liquid equilibria in acid gas: Aqueous alkanolamine systems using the electrolyte-NRTL equation

    SciTech Connect (OSTI)

    Austgen, D.M.; Rochelle, G.T. (Univ. of Texas at Austin, TX (US)); (Peng, X. (Sinopen Beijing Design Institute (US)); Chen, C.C. (Aspen Technology, Inc. TX (US)))

    1988-01-01T23:59:59.000Z

    In this paper a thermodynamically-consistent model is developed for representing vapor-liquid equilibria in the acid gas (H/sub 2/S, CO/sub 2/)-alkanolamine-water system. The model accounts for chemical equilibria in a rigorous manner. Activity coefficients are represented with the Electrolyte-NRTL equation, treating both long-range ion-ion interactions and short-range interactions between all true liquid phase species. Both water and alkanolamine are treated as solvents. Adjustable parameters of the Electrolyte-NRTL equation, representing short-range binary interactions, are fitted primarily on binary and ternary system VLE data. Calculated vapor pressures of H/sub 2/S or CO/sub 2/ over aqueous solutions of monoethanolamine or diethanolamine generally agree with published experimental data within 10 percent over the temperature range 25-120{sup 0}C. No more than two additional parameters are adjusted on quartenary system VLE data to provide a good representation of H/sub 2/S and CO/sub 2/ vapor pressures over the same alkanolamine solutions.

  12. One-pot synthesis of a metal–organic framework as an anode for Li-ion batteries with improved capacity and cycling stability

    SciTech Connect (OSTI)

    Gou, Lei, E-mail: Leigou@chd.edu.cn; Hao, Li-Min; Shi, Yong-Xin; Ma, Shou-Long; Fan, Xiao-Yong; Xu, Lei; Li, Dong-Lin, E-mail: dlli@chd.edu.cn; Wang, Kang

    2014-02-15T23:59:59.000Z

    Metal–organic framework is a kind of novel electrode materials for lithium ion batteries. Here, a 3D metal–organic framework Co{sub 2}(OH){sub 2}BDC (BDC=1,4-benzenedicarboxylate) was synthesized for the first time by the reaction of Co{sup 2+} with a bio-inspired renewable organic ligand 1,4-benzenedicarboxylic acid through a solvothermal method. As an anode material for lithium ion batteries, this material exhibited an excellent cyclic stability as well as a large reversible capacity of ca. 650 mA h g{sup ?1} at a current density of 50 mA g{sup ?1} after 100 cycles within the voltage range of 0.02–3.0 V, higher than that of other BDC based anode. - Graphical abstract: The PXRD pattern and the cycleability curves (inset) of Co{sub 2}(OH){sub 2}BDC. Display Omitted - Highlights: • Co{sub 2}(OH){sub 2}BDC was synthesized through a one pot solvothermal process. • The solvent had a great effect on the purity of this material. • This material was used as anode material for lithium ion batteries for the first time. • Co{sub 2}(OH){sub 2}BDC showed improved capacity and cycling stability.

  13. A two-fold interpenetrating 3D metal-organic framework material constructed from helical chains linked via 4,4'-H{sub 2}bpz fragments

    SciTech Connect (OSTI)

    Xie Yiming [State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian 35002 (China); College of Materials Science and Engineering, Huaqiao University, the Key Laboratory for Functional Materials of Fujian Higher Education, Quanzhou, Fujian 362021 (China); Zhao Zhenguo; Wu Xiaoyuan; Zhang Qisheng; Chen Lijuan; Wang Fei; Chen Shanci [State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian 35002 (China); Lu Canzhong [State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian 35002 (China)], E-mail: czlu@fjirsm.ac.cn

    2008-12-15T23:59:59.000Z

    A 3-connected dia-f-type metal-organic framework compound {l_brace}[Ag(L){sub 3/2}H{sub 2}PO{sub 4}]{r_brace}{sub n} (1) has been synthesized by self-assembly of 4,4'-H{sub 2}bpz (L=4,4'-H{sub 2}bpz=3,3',5,5'-tetramethyl-4,4'-bipyrazole) and Ag{sub 4}P{sub 2}O{sub 7} under hydrothermal conditions. It crystallizes in the tetragonal space group I4{sub 1}/acd with a=21.406(4) A, b=21.406(4) A, c=36.298(8) A, Z=32. X-ray single-crystal diffraction reveals that 1 has a three-dimensional framework with an unprecedented alternate left- and right-handed helices structure, featuring a non-uniform two-fold interpenetrated (4.14{sup 2}) net. Photoluminescent investigation reveals that the title compound displays interesting emissions in a wide region, which shows that the title compound may be a good potential candidate as a photoelectric material. - Graphical abstract: A 3-connected dia-f-type metal-organic framework compound [Ag(4,4'-bpz){sub 3/2}H{sub 2}PO{sub 4}] shows unprecedented alternating left- and right-handed helices structure, featuring a non-uniform two-fold interpenetrated (4.14{sup 2}) net.

  14. Reactor design for uniform chemical vapor deposition-grown films without substrate rotation

    SciTech Connect (OSTI)

    Wanlass, Mark (Golden, CO)

    1987-01-01T23:59:59.000Z

    A quartz reactor vessel for growth of uniform semiconductor films includes a vertical, cylindrical reaction chamber in which a substrate-supporting pedestal provides a horizontal substrate-supporting surface spaced on its perimeter from the chamber wall. A cylindrical confinement chamber of smaller diameter is disposed coaxially above the reaction chamber and receives reaction gas injected at a tangent to the inside chamber wall, forming a helical gas stream that descends into the reaction chamber. In the reaction chamber, the edge of the substrate-supporting pedestal is a separation point for the helical flow, diverting part of the flow over the horizontal surface of the substrate in an inwardly spiraling vortex.

  15. Oxidative chemical vapor deposition of semiconducting polymers and their use In organic photovoltaics

    E-Print Network [OSTI]

    Borrelli, David Christopher

    2014-01-01T23:59:59.000Z

    Organic photovoltaics (OPVs) have received significant interest for their potential low cost, high mechanical flexibility, and unique functionalities. OPVs employing semiconducting polymers in the photoactive layer have ...

  16. A Two-Dimensional Model of Chemical Vapor Infiltration With Radio Frequency Heating

    E-Print Network [OSTI]

    Economou, Demetre J.

    either in a conven- tional microwave oven or by using a radio frequency (RF) induction coil-consistently the power absorbed by the preform from a radio frequency induction coil. The model equations were solved

  17. Prevention of biofouling in seawater desalination via initiated chemical vapor deposition (iCVD)

    E-Print Network [OSTI]

    Yang, Rong, Ph. D. Massachusetts Institute of Technology

    2014-01-01T23:59:59.000Z

    Biofouling, the undesirable settlement and growth of organisms, occurs immediately when a clean surface is immersed in natural seawater. It is a universal problem and the bottleneck for seawater desalination, which reduces ...

  18. Thermal expansion of low-pressure chemical vapor deposition polysilicon films

    E-Print Network [OSTI]

    Ballarini, Roberto

    polysilicon films were deposited on the sub- strates by LPCVD in a hot-walled horizontal tube fur- nace with an inner diameter of 225 mm, using SiH4 at a flow rate of 100 sccm and a pressure of 300 mtorr J. Mater

  19. Thermodynamic analysis and growth of ZrO2 by chloride chemical vapor deposition

    E-Print Network [OSTI]

    Anderson, Timothy J.

    reaction [9­12], and simple chamber designs (e.g., vertical, cold-wall, axisymmetric chamber) to deposit flow injector can be used. A stagnation plane flow injector (for vertical, cold-wall CVD chambers homogeneous nucleation and/ or reactor wall deposition. For example, Holstein [17] de- monstrated that at high

  20. Analysis of buoyancy and tube rotation relative to the modified chemical vapor deposition process

    SciTech Connect (OSTI)

    Choi, M.; Lin, Y.T.; Greif, R. (Univ. of California, Berkeley (USA))

    1990-11-01T23:59:59.000Z

    The secondary flows resulting from buoyancy effects in respect to the MCVD process have been studied in a rotating horizontal tube using a perturbation analysis. The three-dimensional secondary flow fields have been determined at several axial locations in a tube whose temperature varies in both the axial and circumferential directions for different rotational speeds. For small rotational speeds, buoyancy and axial convection are dominant and the secondary flow patterns are different in the regions near and far from the torch. For moderate rotational speeds, the effects of buoyancy, axial and angular convection are all important in the region far from the torch where there is a spiraling secondary flow. For large rotational speeds, only buoyancy and angular convection effects are important and no spiraling secondary motions occurs far downstream. Compared with thermophoresis, the important role of buoyancy in determining particle trajectories in MCVD is presented. As the rotational speed increases, the importance of the secondary flow decreases and the thermophoretic contribution vecomes more important. It is noted that thermophoresis is considered to be the main cause of particle deposition in the MCVD process.

  1. Microbridge testing of plasma-enhanced chemical-vapor deposited silicon oxide films on silicon wafers

    E-Print Network [OSTI]

    that is typically encountered in applications involving microelectromechanical systems (MEMS.016212 PACS number(s): 05.45.-a, 85.85.+j, 62.25.-g, 47.52.+j I. INTRODUCTION Microelectromechanical systems

  2. Low Temperature Chemical Vapor Deposition of Zirconium Nitride in a Fluidized Bed

    E-Print Network [OSTI]

    Arrieta, Marie

    2012-10-19T23:59:59.000Z

    thick) on uranium-molybdenum (UMo) particulate fuel. Plate-type fuel with U-xMo (x = 3 to 10 wt.%) particle fuel dispersed in an aluminum matrix is under development at Idaho National Laboratory (INL) for the Reduced Enrichment for Research and Test...

  3. CO-CATALYTIC ABSORPTION LAYERS FOR CONTROLLED LASER-INDUCED CHEMICAL VAPOR DEPOSITION OF CARBON NANOTUBES

    E-Print Network [OSTI]

    Michaelis, F.B.; Weatherup, R.S.; Bayer, B.C.; Bock, M.C.D; Sugime, H.; Caneva, S.; Robertson, J.; Baumberg, J.J.; Hofmann, S.

    2014-02-24T23:59:59.000Z

    ,38 by atomic layer deposition (ALD) using a Cambridge Nanotech Savannah system and a 200°C process with tri[methyl]aluminium and water both carried in a N2(20 sccm) flow for 200 cycles 39,40. Ta layers are sputter deposited (100W, 35sccm Ar, 3.5×10-3 mbar... it is optically compensated). Thermal CVD. CNT growth is also carried out in a custom-built cold-wall CVD chamber with a resistive graphite heater element. Samples are heated to ~670°C and annealed for 5 min in a non-reducing (~10-3 mbar vacuum) or reducing...

  4. Improved sensor selectivity for chemical vapors using organic thin-film transistors

    E-Print Network [OSTI]

    Royer, James Edward

    2012-01-01T23:59:59.000Z

    analyte/semiconductor hydrogen bonding properties of vacuumtargeted analyte. These properties include hydrogen bonding,properties are determined by selective molecular chemisorption via hydrogen-

  5. Plasma Enhanced Chemical Vapor Deposition on Living Substrates: Development, Characterization, and Biological Applications

    E-Print Network [OSTI]

    Tsai, Tsung-Chan 1982-

    2012-12-05T23:59:59.000Z

    air and at low temperature was developed using a helium dielectric barrier discharge jet (DBD jet). It was demonstrated that various materials, such as polymeric, metallic, and composite films, can be readily synthesized through this technique. Second...

  6. Reactor design for uniform chemical vapor deposition-grown films without substrate rotation

    DOE Patents [OSTI]

    Wanlass, M.

    1985-02-19T23:59:59.000Z

    A quartz reactor vessel for growth of uniform semiconductor films includes a vertical, cylindrical reaction chamber in which a substrate-supporting pedestal provides a horizontal substrate-supporting surface spaced on its perimeter from the chamber wall. A cylindrical confinement chamber of smaller diameter is disposed coaxially above the reaction chamber and receives reaction gas injected at a tangent to the inside chamber wall, forming a helical gas stream that descends into the reaction chamber. In the reaction chamber, the edge of the substrate-supporting pedestal is a separation point for the helical flow, diverting part of the flow over the horizontal surface of the substrate in an inwardly spiraling vortex.

  7. Towards improved spinnability of chemical vapor deposition generated multi-walled carbon nanotubes

    E-Print Network [OSTI]

    McKee, Gregg Sturdivant Burke

    2008-01-01T23:59:59.000Z

    Solid State Chemistry 177 4394-4398 Lu K. L. , Lago R. M. ,of Solid State Chemistry 177 4394-4398 Coquay P. , De Grave

  8. Chemical vapor deposition and functionalization of fluorocarbon-organosilicon copolymer thin films

    E-Print Network [OSTI]

    Murthy, Shashi Krishna, 1977-

    2003-01-01T23:59:59.000Z

    Neural prostheses are micron-scale integrated circuit devices that are under development for the treatment of brain and spinal cord injuries. A key challenge in the fabrication of these silicon- based devices is the ...

  9. Perfluorooctane Sulfonyl Fluoride as an Initiator in Hot-Filament Chemical Vapor Deposition of Fluorocarbon

    E-Print Network [OSTI]

    Gleason, Karen K.

    of Fluorocarbon Thin Films Hilton G. Pryce Lewis, Jeffrey A. Caulfield, and Karen K. Gleason*, Department pathways available via HFCVD makes it possible to produce polymeric fluorocarbon films spectroscopically

  10. Improved sensor selectivity for chemical vapors using organic thin-film transistors

    E-Print Network [OSTI]

    Royer, James Edward

    2012-01-01T23:59:59.000Z

    OTFTs exposed to 5 min pulses of 143-1430 ppm toluene, 2.8-OTFTs exposed to 5 min pulses of 143-1430 ppm toluene, 2.8-OTFTs exposed to 5 min pulses of 143-1430 ppm toluene (TOL),

  11. Understanding the Nanotube Growth Mechanism: A Strategy to Control Nanotube Chirality during Chemical Vapor Deposition Synthesis

    E-Print Network [OSTI]

    Gomez Gualdron, Diego Armando 1983-

    2012-10-26T23:59:59.000Z

    For two decades, single-wall carbon nanotubes (SWCNTs) have captured the attention of the research community, and become one of the flagships of nanotechnology. Due to their remarkable electronic and optical properties, SWCNTs are prime candidates...

  12. An atomic-scale analysis of catalytically-assisted chemical vapor deposition of carbon nanotubes

    E-Print Network [OSTI]

    Grujicic, Mica

    Growth of carbon nanotubes during transition-metal particles catalytically-assisted thermal decomposition of the transition-metal particles and onto the surface of carbon nanotubes, carbon atom attachment to the growing. Carbon nanotubes are generally processed by laser ablation of carbon rods e.g. [7], a direct current arc

  13. A conformal nano-adhesive via initiated chemical vapor deposition for microfluidic devices

    E-Print Network [OSTI]

    Doyle, Patrick S.

    (ethylene terephthalate) (PET), polycarbonate (PC), and poly(tetrafluoro ethylene) (PTFE). Introduction Microfluidic consumption of reagents and analytes, low cost of manufacture, low consumption of power, high throughput

  14. Chemical Vapor Deposition Based Synthesis of Carbon Nanotubes and Nanofibers Using a Template Method

    E-Print Network [OSTI]

    of battery electrodes.5,10 These microtubular TiS2 electrodes show higher capacities, lower resistance,19 including electrochemistry.20 The use of metal catalysts such as Ni, Fe, Fe-Cu, and Pt has been, and lower susceptibility to slow electron- transfer kinetics than thin film TiS2 electrodes. In the present

  15. Polymers via chemical vapor deposition and their application to organic photovoltaics

    E-Print Network [OSTI]

    Barr, Miles Clark

    2012-01-01T23:59:59.000Z

    There is emerging interest in the ability to fabricate organic photovoltaics (OPVs) on flexible, lightweight substrates, which could lower the cost of installation and enable new form factors for deployment. However, ...

  16. Volatile organometallic complexes suitable for use in chemical vapor depositions on metal oxide films

    DOE Patents [OSTI]

    Giolando, Dean M.

    2003-09-30T23:59:59.000Z

    Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.

  17. Understanding the Nanotube Growth Mechanism: A Strategy to Control Nanotube Chirality during Chemical Vapor Deposition Synthesis 

    E-Print Network [OSTI]

    Gomez Gualdron, Diego Armando 1983-

    2012-10-26T23:59:59.000Z

    for the creation of novel and revolutionary electronic, medical, and energy technologies. However, a major stumbling block in the exploitation of nanotube-based technologies is the lack of control of nanotube structure (chirality) during synthesis, which...

  18. Desktop systems for manufacturing carbon nanotube films by chemical vapor deposition

    E-Print Network [OSTI]

    Kuhn, David S. (David Scott)

    2007-01-01T23:59:59.000Z

    Carbon nanotubes (CNTs) exhibit exceptional electrical, thermal, and mechanical properties that could potentially transform such diverse fields as composites, electronics, cooling, energy storage, and biological sensing. ...

  19. Gold catalyzed growth of silicon nanowires by plasma enhanced chemical vapor deposition

    E-Print Network [OSTI]

    Dunin-Borkowski, Rafal E.

    , Cambridge CB2 1EW, United Kingdom R. E. Dunin-Borkowski Department of Materials Science and Metallurgy to low-dimensional physics, and they can be used as nanotechnology building blocks to reach higher device-temperature synthesis from its phase diagram, because the Ga­Si system has a very low eutectic temperature.16 However

  20. Hot-filament chemical vapor deposition chamber and process with multiple gas inlets

    DOE Patents [OSTI]

    Deng, Xunming; Povolny, Henry S.

    2004-06-29T23:59:59.000Z

    A thin film deposition method uses a vacuum confinement cup that employs a dense hot filament and multiple gas inlets. At least one reactant gas is introduced into the confinement cup both near and spaced apart from the heated filament. An electrode inside the confinement cup is used to generate plasma for film deposition. The method is used to deposit advanced thin films (such as silicon based thin films) at a high quality and at a high deposition rate.