National Library of Energy BETA

Sample records for lithography surface science

  1. Maskless lithography

    DOE Patents [OSTI]

    Sweatt, William C. (Albuquerque, NM); Stulen, Richard H. (Livermore, CA)

    1999-01-01

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

  2. Maskless lithography

    DOE Patents [OSTI]

    Sweatt, W.C.; Stulen, R.H.

    1999-02-09

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides. 12 figs.

  3. Ion beam lithography system

    DOE Patents [OSTI]

    Leung, Ka-Ngo

    2005-08-02

    A maskless plasma-formed ion beam lithography tool provides for patterning of sub-50 nm features on large area flat or curved substrate surfaces. The system is very compact and does not require an accelerator column and electrostatic beam scanning components. The patterns are formed by switching beamlets on or off from a two electrode blanking system with the substrate being scanned mechanically in one dimension. This arrangement can provide a maskless nano-beam lithography tool for economic and high throughput processing.

  4. Heterogeneous Catalysis and Surface Science - JCAP

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Heterogeneous Catalysis and Surface Science / Part I: Surface Science in JCAP Laboratories Heterogeneous Catalysis and Surface Science research in JCAP focuses on the basic understanding of the relationships among the structure, composition, and reactivity of electrocatalysts. Knowledge gained from surface science experimentation can be implemented toward the discovery of better heterogeneous catalysts for solar-fuel production from carbon dioxide and water. REFERENCE Soriaga, M. P. et al.

  5. VUV lithography

    DOE Patents [OSTI]

    George, E.V.; Oster, Y.; Mundinger, D.C.

    1990-12-25

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask. 6 figs.

  6. VUV lithography

    DOE Patents [OSTI]

    George, Edward V.; Oster, Yale; Mundinger, David C.

    1990-01-01

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1700-1300A using xenon, krypton or argon; shorter wavelengths of 850-650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask.

  7. Surface coatings. Science and technology

    SciTech Connect (OSTI)

    Paul, S.

    1985-01-01

    This book covers the coating field from the latest industry developments to current energy and pollution regulations. It explains the composition of coatings, how they are prepared and applied and the factors that control their ultimate performance. The author discusses the synthesis of polymeric binders, industrial resins, pigments, paints and paint properties, types of coatings, and new technologies. CONTENTS: Binders: Synthesis of Polymeric Binders; Industrial Resins; Pigments; Paints and Paint Properties: Pigment Dispersion; Surface Preparation and Paint Application; Paint Properties and Their Evaluation; Types of Coatings; New Technolgies.

  8. Method for maskless lithography

    DOE Patents [OSTI]

    Sweatt, William C.; Stulen, Richard H.

    2000-01-01

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

  9. Sandia National Labs: PCNSC: Departments: Surface and Interface Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Home About Us Departments Radiation, Nano Materials, & Interface Sciences > Radiation & Solid Interactions > Nanomaterials Sciences > Surface & Interface Sciences Semiconductor & Optical Sciences Energy Sciences Small Science Cluster Business Office News Partnering Research Carlos Gutierrez Carlos Gutierrez Manager Resources Department Folder 01114 Sharepoint Visit Our Labs Grest Group Nanorheology Research (514 KB PDF) Interfacial Force Microscopy Group (701 KB PDF)

  10. Advances in Lithography

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Advances in Lithography Advances in Lithography Print Tuesday, 16 December 2014 11:40 Work featured on Applied Optics cover from ALS Beamline 11.3.2. Field-dependent wavefront aberration distribution of an extreme ultraviolet single-lens zone-plate microscope, recovered by the gradient descent algorithm customized for partially coherent imaging and targeted for fast and accurate retrieval. For information, see Yamazoe et al., pp. B34-B43, part of the Applied Optics-JOSA A cohosted feature,

  11. Maskless, resistless ion beam lithography

    SciTech Connect (OSTI)

    Ji, Qing

    2003-03-10

    As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O{sub 2}{sup +}, BF{sub 2}{sup +}, P{sup +} etc., for surface modification and doping applications. With optimized source condition, around 85% of BF{sub 2}{sup +}, over 90% of O{sub 2}{sup +} and P{sup +} have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He{sup +} beam is as high as 440 A/cm{sup 2} {center_dot} Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O{sub 2}{sup +} ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O{sub 2}{sup +} ions with the dose of 10{sup 15} cm{sup -2}. The oxide can then serve as a hard mask for patterning of the Si film. The process flow and the experimental results for directly patterned poly-Si features

  12. Defect tolerant transmission lithography mask

    DOE Patents [OSTI]

    Vernon, Stephen P.

    2000-01-01

    A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

  13. Surface and interface modification science and technology.

    SciTech Connect (OSTI)

    Park, J.-H.

    1999-07-19

    Surface modification of solids is of scientific and technological interest due to its significant benefits in a wide variety of applications. Various coatings applications such as corrosion protection and electrical insulators and conductors are required for proper engineering design based on geometrical relationships between interfaces and on thermodynamic/kinetic considerations for the development of surface modifications. This paper will explore three basic examples: the proton conductor BaCeO{sub 3}, high-temperature protective coatings, and epitaxial relationships between interfaces.

  14. Programmable imprint lithography template

    DOE Patents [OSTI]

    Cardinale, Gregory F.; Talin, Albert A.

    2006-10-31

    A template for imprint lithography (IL) that reduces significantly template production costs by allowing the same template to be re-used for several technology generations. The template is composed of an array of spaced-apart moveable and individually addressable rods or plungers. Thus, the template can be configured to provide a desired pattern by programming the array of plungers such that certain of the plungers are in an "up" or actuated configuration. This arrangement of "up" and "down" plungers forms a pattern composed of protruding and recessed features which can then be impressed onto a polymer film coated substrate by applying a pressure to the template impressing the programmed configuration into the polymer film. The pattern impressed into the polymer film will be reproduced on the substrate by subsequent processing.

  15. Extreme ultraviolet lithography machine

    DOE Patents [OSTI]

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  16. Maskless, reticle-free, lithography

    DOE Patents [OSTI]

    Ceglio, Natale M. (Livermore, CA); Markle, David A. (Saratoga, CA)

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies.

  17. Maskless, reticle-free, lithography

    DOE Patents [OSTI]

    Ceglio, N.M.; Markle, D.A.

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies. 7 figs.

  18. Decal transfer lithography

    DOE Patents [OSTI]

    Nuzzo, Ralph G.; Childs, William R.; Motala, Michael J.; Lee, Keon Jae

    2010-02-16

    A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.

  19. Membrane projection lithography

    DOE Patents [OSTI]

    Burckel, David Bruce; Davids, Paul S; Resnick, Paul J; Draper, Bruce L

    2015-03-17

    The various technologies presented herein relate to a three dimensional manufacturing technique for application with semiconductor technologies. A membrane layer can be formed over a cavity. An opening can be formed in the membrane such that the membrane can act as a mask layer to the underlying wall surfaces and bottom surface of the cavity. A beam to facilitate an operation comprising any of implantation, etching or deposition can be directed through the opening onto the underlying surface, with the opening acting as a mask to control the area of the underlying surfaces on which any of implantation occurs, material is removed, and/or material is deposited. The membrane can be removed, a new membrane placed over the cavity and a new opening formed to facilitate another implantation, etching, or deposition operation. By changing the direction of the beam different wall/bottom surfaces can be utilized to form a plurality of structures.

  20. Solvent Immersion Imprint Lithography

    SciTech Connect (OSTI)

    Vasdekis, Andreas E.; Wilkins, Michael J.; Grate, Jay W.; Kelly, Ryan T.; Konopka, Allan; Xantheas, Sotiris S.; Chang, M. T.

    2014-06-21

    The mechanism of polymer disolution was explored for polymer microsystem prototyping, including microfluidics and optofluidics. Polymer films are immersed in a solvent, imprinted and finally brought into contact with a non-modified surface to permanently bond. The underlying polymer-solvent interactions were experimentally and theoretically investigated, and enabled rapid polymer microsystem prototyping. During imprinting, small molecule integration in the molded surfaces was feasible, a principle applied to oxygen sensing. Polystyrene (PS) was employed for microbiological studies at extreme environmental conditions. The thermophile anaerobe Clostridium Thermocellum was grown in PS pore-scale micromodels, revealing a double mean generation lifetime than under ideal culture conditions. Microsystem prototyping through directed polymer dissolution is simple and accessible, while simultaneous patterning, bonding, and surface/volume functionalization are possible in less than one minute.

  1. X-ray lithography source

    DOE Patents [OSTI]

    Piestrup, M.A.; Boyers, D.G.; Pincus, C.

    1991-12-31

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits is disclosed. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and eliminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an excellent moderate-priced X-ray source for lithography. 26 figures.

  2. X-ray lithography source

    DOE Patents [OSTI]

    Piestrup, Melvin A.; Boyers, David G.; Pincus, Cary

    1991-01-01

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

  3. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Investigating Extreme Ultraviolet Lithography Mask Defects Print Wednesday, 28 July 2010 00:00 Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using

  4. Interferometric Lithography Patterned Pyrolytic Carbon. (Conference...

    Office of Scientific and Technical Information (OSTI)

    Title: Interferometric Lithography Patterned Pyrolytic Carbon. Abstract not provided. Authors: Burckel, David Bruce ; Polsky, Ronen ; Washburn, Cody M. ; Wheeler, David Roger ; ...

  5. Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithography.

    SciTech Connect (OSTI)

    Ramanathan, M.; Darling, S. B.; Sumant, A. V.; Auciello, O.

    2010-07-01

    Nanopatterning of diamond surfaces is critical for the development of diamond-based microelectromechanical system/nanoelectromechanical system (MEMS/NEMS), such as resonators or switches. Micro-/nanopatterning of diamond materials is typically done using photolithography or electron beam lithography combined with reactive ion etching (RIE). In this work, we demonstrate a simple process, block copolymer (BCP) lithography, for nanopatterning of ultrananocrystalline diamond (UNCD) films to produce nanostructures suitable for the fabrication of NEMS based on UNCD. In BCP lithography, nanoscale self-assembled polymeric domains serve as an etch mask for pattern transfer. The authors used thin films of a cylinder-forming organic-inorganic BCP, poly(styrene-block-ferrocenyldimethylsilane), PS-b-PFS, as an etch mask on the surface of UNCD films. Orientational control of the etch masking cylindrical PFS blocks is achieved by manipulating the polymer film thickness in concert with the annealing treatment. We have observed that the surface roughness of UNCD layers plays an important role in transferring the pattern. Oxygen RIE was used to etch the exposed areas of the UNCD film underneath the BCP. Arrays of both UNCD posts and wirelike structures have been created using the same starting polymeric materials as the etch mask.

  6. Method for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  7. Method for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E. (727 Clara St., Livermore, Alameda County, CA 94550); Kubiak, G. D. (475 Maple St., Livermore, Alameda County, CA 94550)

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  8. X-ray lithography using holographic images

    DOE Patents [OSTI]

    Howells, Malcolm R.; Jacobsen, Chris

    1995-01-01

    A non-contact X-ray projection lithography method for producing a desired X-ray image on a selected surface of an X-ray-sensitive material, such as photoresist material on a wafer, the desired X-ray image having image minimum linewidths as small as 0.063 .mu.m, or even smaller. A hologram and its position are determined that will produce the desired image on the selected surface when the hologram is irradiated with X-rays from a suitably monochromatic X-ray source of a selected wavelength .lambda.. On-axis X-ray transmission through, or off-axis X-ray reflection from, a hologram may be used here, with very different requirements for monochromaticity, flux and brightness of the X-ray source. For reasonable penetration of photoresist materials by X-rays produced by the X-ray source, the wavelength X, is preferably chosen to be no more than 13.5 nm in one embodiment and more preferably is chosen in the range 1-5 nm in the other embodiment. A lower limit on linewidth is set by the linewidth of available microstructure writing devices, such as an electron beam.

  9. Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

    SciTech Connect (OSTI)

    Xu, Jia; Zhang, Ziang; Weng, Zhankun; Wang, Zuobin Wang, Dapeng

    2014-05-28

    This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.

  10. Low-cost method for producing extreme ultraviolet lithography optics

    DOE Patents [OSTI]

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  11. Self-cleaning optic for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  12. Micropatterning of metal substrate by adhesive force lithography

    SciTech Connect (OSTI)

    Seo, Soon-min; Park, Jeong-yong; Lee, Hong H.

    2005-03-28

    We introduce adhesive force lithography (AFL), a detachment-based method for patterning metal surface. In this method, all the polymer layer except for the desired pattern gets lifted up from the metal surface. The craze microstructure unique to thin polymer films on the order of 10{sup 2} nm is utilized for this AFL along with a difference in adhesive force at two interfaces. Poly(urethaneacrylate) mold, which has a high enough work of adhesion with polymer, makes AFL effective. This technique is purely additive, fast ({approx}10 s contact time), and applicable to large area patterning (10 cmx10 cm)

  13. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    blemishes. In lithography, the complex process used to create computer chips, a six-inch glass plate called a mask carries one layer of a circuit pattern-the image of which is...

  14. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  15. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  16. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  17. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  18. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  19. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  20. Extreme-UV lithography condenser

    DOE Patents [OSTI]

    Sweatt, William C.; Sweeney, Donald W.; Shafer, David; McGuire, James

    2001-01-01

    Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

  1. Holographic illuminator for synchrotron-based projection lithography systems

    DOE Patents [OSTI]

    Naulleau, Patrick P.

    2005-08-09

    The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (1) a synchrotron source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence, (2) a holographic diffuser having a surface that receives incident radiation from said source, (3) means for translating the surface of the holographic diffuser in two dimensions along a plane that is parallel to the surface of the holographic diffuser wherein the rate of the motion is fast relative to integration time of said image processing system; and (4) a condenser optic that re-images the surface of the holographic diffuser to the entrance plane of said image processing system.

  2. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    science Science Stockpile Stewardship National Security National Competitiveness Fusion and Ignition Energy for the Future How to Make a Star Discovery Science Photon Science HAPLS

  3. Building Surface Science Capacity to Serve the Automobile Industry in Southeastern Michigan, final report

    SciTech Connect (OSTI)

    Shen, Weidian

    2013-09-27

    This project, “Building Surface Science Capacity to Serve the Automobile Industry in Southeastern Michigan” was carried out in two phases: (1) the 2009 – 2012 renovation of space in the new EMU Science Complex, which included the Surface Science Laboratory (SSL), a very vigorous research lab at EMU that carries on a variety of research projects to serve the auto and other industries in Michigan; and (2) the 2013 purchase of several pieces of equipment to further enhance the research capability of the SSL. The funding granted by the DoE was proposed to “renovate the space in the Science Complex to include SSL and purchase equipment for tribological and electrochemical impedance measurements in the lab, thus SSL will serve the auto and other industries in Michigan better.” We believe we have fully accomplished the mission.

  4. SYSTEM CONSIDERATIONS FOR MASKLESS LITHOGRAPHY

    SciTech Connect (OSTI)

    Karnowski, Thomas Paul; Joy, David; Allard Jr, Lawrence Frederick; Clonts, Lloyd G

    2004-01-01

    Lithographic processes for printing device structures on integrated circuits (ICs) are the fundamental technology behind Moore's law. Next-generation techniques like maskless lithography or ML2 have the advantage that the long, tedious and expensive process of fabricating a unique mask for the manufactured chip is not necessary. However, there are some rather daunting problems with establishing ML2 as a viable commercial technology. The data rate necessary for ML2 to be competitive in manufacturing is not feasible with technology in the near future. There is also doubt that the competing technologies for the writing mechanisms and corresponding photoresist (or analogous medium) will be able to accurately produce the desired patterns necessary to produce multi-layer semiconductor devices. In this work, we model the maskless printing system from a signal processing point of view, utilizing image processing algorithms and concepts to study the effects of various real-world constraints and their implications for a ML2 system. The ML2 elements are discrete devices, and it is doubtful that their motion can be controlled to the level where a one-for-one element to exposed pixel relationship is allowable. Some level of sub-element resolution can be achieved with gray scale levels, but with the highly integrated manufacturing practices required to achieve massive parallelism, the most effective elements will be simple on-off switches that fire a fixed level of energy at the target medium. Consequently gray-scale level devices are likely not an option. Another problem with highly integrated manufacturing methods is device uniformity. Consequently, we analyze the redundant scanning array concept (RSA) conceived by Berglund et al. which can defeat many of these problems. We determine some basic equations governing its application and we focus on applying the technique to an array of low-energy electron emitters. Using the results of Monte Carlo simulations on electron beam

  5. Method for the protection of extreme ultraviolet lithography optics

    DOE Patents [OSTI]

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  6. Vitreous carbon mask substrate for X-ray lithography

    DOE Patents [OSTI]

    Aigeldinger, Georg; Skala, Dawn M.; Griffiths, Stewart K.; Talin, Albert Alec; Losey, Matthew W.; Yang, Chu-Yeu Peter

    2009-10-27

    The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.

  7. A surface science investigation of silicon carbide: Oxidation, crystal growth and surface structural analysis

    SciTech Connect (OSTI)

    Powers, J.M.

    1991-11-01

    For the semiconductor SiC to fulfill its potential as an electronic material, methods must be developed to produce insulating surface oxide layers in a reproducible fashion. Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and x-ray photoelectron spectroscopy (XPS) were used to investigate the oxidation of single crystal {alpha}-SiC over a wide temperature and O{sub 2} pressure range. The {alpha}-SiC surface becomes graphitic at high temperatures and low O{sub 2} pressures due to Si and SiO sublimation from the surface. Amorphous SiO{sub 2} surface layers from on {alpha}-SiC at elevated O{sub 2} pressures and temperatures. Both the graphitization and oxidation of {alpha}-SiC appears to be enhanced by surface roughness. Chemical vapor deposition (CVD) is currently the preferred method of producing single crystal SiC, although the method is slow and prone to contamination. We have attempted to produce SiC films at lower temperatures and higher deposition rates using plasma enhanced CVD with CH{sub 3}SiH{sub 3}. Scanning AES, XPS and scanning electron microscopy (SEM) were utilized to study the composition and morphology of the deposited Si{sub x}C{sub y}H{sub z} films as a function of substrate temperature, plasma power and ion flux bombardment of the film during deposition. High energy ion bombardment during deposition was found to increase film density and substrate adhesion while simultaneously reducing hydrogen and oxygen incorporation in the film. Under all deposition conditions the Si{sub x}C{sub y}H{sub z} films were found to be amorphous, with the ion bombarded films showing promise as hard protective coatings. Studies with LEED and AES have shown that {beta}-SiC (100) exhibits multiple surface reconstructions, depending on the surface composition. These surface reconstructions possess substantially different surface reactivities at elevated temperatures, which can complicate the fabrication of metal on SiC junctions.

  8. Sequential Infiltration Synthesis for Enhancing Advanced Lithography |

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Argonne National Laboratory Advanced Lithography Technology available for licensing: The invention is a plasma etch resist material modified by an inorganic protective component via sequential infiltration synthesis (SIS) and methods of preparing the modified resist material. The SIS process forms the protective component within the bulk resist material through a plurality of alternating exposures to gas phase precursors which infiltrate the resist material. Benefits: The plasma etch resist

  9. Nanoimprint-lithography Patterned Epitaxial Fe Nanowire Arrays...

    Office of Scientific and Technical Information (OSTI)

    epitaxial Fe nanowire arrays on MgO(001) substrates by nanoimprint lithography with a direct metallization of epitaxial materials through a metallic mask, which avoided the...

  10. "A Novel Objective for EUV Microscopy and EUV Lithography" Inventors...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    A Novel Objective for EUV Microscopy and EUV Lithography" Inventors ..--.. Manfred Bitter, Kenneth Hill, Philip Efthimion. This invention is a new x-ray scheme for stigmatic...

  11. Koel applies science of surface chemistry to fusion research at PPPL |

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Princeton Plasma Physics Lab Koel applies science of surface chemistry to fusion research at PPPL By Catherine Zandonella March 26, 2012 Tweet Widget Google Plus One Share on Facebook To study the interactions of lithium under conditions similar to what might be found in a fusion reactor, lithium on a sample of TZM molybdenum, which is an alloy of molybdenum, titanium, zirconium and carbon known for its high strength and temperature properties, is heated inside an ultrahigh vacuum chamber

  12. Plasma formed ion beam projection lithography system

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Lee, Yung-Hee Yvette; Ngo, Vinh; Zahir, Nastaran

    2002-01-01

    A plasma-formed ion-beam projection lithography (IPL) system eliminates the acceleration stage between the ion source and stencil mask of a conventional IPL system. Instead a much thicker mask is used as a beam forming or extraction electrode, positioned next to the plasma in the ion source. Thus the entire beam forming electrode or mask is illuminated uniformly with the source plasma. The extracted beam passes through an acceleration and reduction stage onto the resist coated wafer. Low energy ions, about 30 eV, pass through the mask, minimizing heating, scattering, and sputtering.

  13. Compact multi-bounce projection system for extreme ultraviolet projection lithography

    DOE Patents [OSTI]

    Hudyma, Russell M.

    2002-01-01

    An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

  14. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Science Cutting edge, multidisciplinary national-security science. News Releases Science Briefs Photos Picture of the Week Publications Social Media Videos Fact Sheets The thermal traits of a leaf, critical for photosynthesis, may be under strong evolutionary selection that occurs in response to environmental temperatures. Here a thermal leaf image details temperature variation, which greatly affects plant functions since temperature is closely linked to metabolic kinetics-the plant's

  15. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Science & Technology Images of Lab scientists and researchers at work. News Releases Science Briefs Photos Picture of the Week Publications Social Media Videos Fact Sheets PHOTOS BY TOPIC Careers Community Visitors Environment History Science The Lab Click thumbnails to enlarge. Photos arranged by most recent first, horizontal formats before vertical. See Flickr for more sizes and details. Astronomical simulation in the CAVE - 1 Astronomical simulation in the CAVE - 1 Scientist sees

  16. ATOMIC FORCE LITHOGRAPHY OF NANO MICROFLUIDIC CHANNELS FOR VERIFICATION AND MONITORING IN AQUEOUS SOLUTIONS

    SciTech Connect (OSTI)

    Torres, R.; Mendez-Torres, A.; Lam, P.

    2011-06-09

    The growing interest in the physics of fluidic flow in nanoscale channels, as well as the possibility for high sensitive detection of ions and single molecules is driving the development of nanofluidic channels. The enrichment of charged analytes due to electric field-controlled flow and surface charge/dipole interactions along the channel can lead to enhancement of sensitivity and limits-of-detection in sensor instruments. Nuclear material processing, waste remediation, and nuclear non-proliferation applications can greatly benefit from this capability. Atomic force microscopy (AFM) provides a low-cost alternative for the machining of disposable nanochannels. The small AFM tip diameter (< 10 nm) can provide for features at scales restricted in conventional optical and electron-beam lithography. This work presents preliminary results on the fabrication of nano/microfluidic channels on polymer films deposited on quartz substrates by AFM lithography.

  17. ATOMIC FORCE LITHOGRAPHY OF NANO/MICROFLUIDIC CHANNELS FOR VERIFICATION AND MONITORING OF AQUEOUS SOLUTIONS

    SciTech Connect (OSTI)

    Mendez-Torres, A.; Torres, R.; Lam, P.

    2011-07-15

    The growing interest in the physics of fluidic flow in nanoscale channels, as well as the possibility for high sensitive detection of ions and single molecules is driving the development of nanofluidic channels. The enrichment of charged analytes due to electric field-controlled flow and surface charge/dipole interactions along the channel can lead to enhancement of sensitivity and limits-of-detection in sensor instruments. Nuclear material processing, waste remediation, and nuclear non-proliferation applications can greatly benefit from this capability. Atomic force microscopy (AFM) provides a low-cost alternative for the machining of disposable nanochannels. The small AFM tip diameter (< 10 nm) can provide for features at scales restricted in conventional optical and electron-beam lithography. This work presents preliminary results on the fabrication of nano/microfluidic channels on polymer films deposited on quartz substrates by AFM lithography.

  18. Graphene nanoribbon superlattices fabricated via He ion lithography

    SciTech Connect (OSTI)

    Archanjo, Braulio S.; Fragneaud, Benjamin; Gustavo Canado, Luiz; Winston, Donald; Miao, Feng; Alberto Achete, Carlos; Medeiros-Ribeiro, Gilberto

    2014-05-12

    Single-step nano-lithography was performed on graphene sheets using a helium ion microscope. Parallel defect lines of ?1??m length and ?5?nm width were written to form nanoribbon gratings down to 20?nm pitch. Polarized Raman spectroscopy shows that crystallographic orientation of the nanoribbons was partially maintained at their lateral edges, indicating a high-fidelity lithography process. Furthermore, Raman analysis of large exposure areas with different ion doses reveals that He ions produce point defects with radii ? 2 smaller than do Ga ions, demonstrating that scanning-He{sup +}-beam lithography can texture graphene with less damage.

  19. Photoresist composition for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E. (Alameda County, CA); Kubiak, G. D. (Alameda County, CA)

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  20. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Office of Science Office of Science β β * * * Office of Science α γ Office of * * * * * Office of Science Office of Science * α * * Office of Science α * * μ * * α 287 115 10.59 32 ms 283 113 10.12 100 ms 279 111 10.38 0.17 s 271 107 9.35 1.2 s 267 105 SF 1.8 h 275 109 10.35 12 ms 289 115 10.31 520 ms 285 113 9.74/9.48 4.5 s 281 111 SF 1 s 287 115 10.59 32 ms 283 113 10.12 100 ms 279 111 10.38 0.17 s 07 5 s 275 109 10.35 12 ms 285 1 9.74/ 4.5 281 111 SF 1 s 288 115 10.48 171 ms 284 113

  1. science

    National Nuclear Security Administration (NNSA)

    through the Predictive Capability Framework (PCF). The PCF is a long-term integrated roadmap to guide the science, technology and engineering activities and Directed Stockpile...

  2. Properites of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)

    SciTech Connect (OSTI)

    Bajt, S; Edwards, N V; Madey, T E

    2007-06-25

    The contamination of optical surfaces by irradiation shortens optics lifetime and is one of the main concerns for optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools. This paper focuses on properties and surface chemistry of different materials, which as thin layers, could be used as capping layers to protect and extend EUVL optics lifetime. The most promising candidates include single element materials such as ruthenium and rhodium, and oxides such as TiO{sub 2} and ZrO{sub 2}.

  3. Chemistry and Materials Science progress report, first half FY 1992. Weapons-Supporting Research and Laboratory Directed Research and Development

    SciTech Connect (OSTI)

    Not Available

    1992-07-01

    This report contains sections on: Fundamentals of the physics and processing of metals; interfaces, adhesion, and bonding; energetic materials; plutonium research; synchrotron radiation-based materials science; atomistic approach to the interaction of surfaces with the environment: actinide studies; properties of carbon fibers; buried layer formation using ion implantation; active coherent control of chemical reaction dynamics; inorganic and organic aerogels; synthesis and characterization of melamine-formaldehyde aerogels; structural transformation and precursor phenomena in advanced materials; magnetic ultrathin films, surfaces, and overlayers; ductile-phase toughening of refractory-metal intermetallics; particle-solid interactions; electronic structure evolution of metal clusters; and nanoscale lithography induced chemically or physically by modified scanned probe microscopy.

  4. Cavity-enhanced single photon emission from site-controlled In(Ga)As quantum dots fabricated using nanoimprint lithography

    SciTech Connect (OSTI)

    Tommila, J.; Hakkarainen, T. V.; Schramm, A. Guina, M.; Belykh, V. V.; Sibeldin, N. N.; Heinonen, E.

    2014-05-26

    We report on the emission dynamics of single In(Ga)As quantum dots formed in etched GaAs pits and integrated into micropillar cavities. The site-controlled quantum dots were fabricated by molecular beam epitaxy on nanoimprint lithography patterned GaAs(001) surfaces. Triggered single photon emission confirmed by photon autocorrelation measurements is demonstrated. Time-resolved photoluminescence experiments clearly show an effect of the cavity on the spontaneous emission rate of the quantum dot.

  5. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... Tchikoulaeva, and C. Holfeld, "Actinic imaging of native and programmed defects on a full-field mask," Proc. SPIE 7636, 76361A (2010). ALS Science Highlight 213 ALSNews Vol. 311

  6. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... La Fontaine, A. Tchikoulaeva, and C. Holfeld, "Actinic imaging of native and programmed defects on a full-field mask," Proc. SPIE 7636, 76361A (2010). ALS Science Highlight 213

  7. Microphotonic parabolic light directors fabricated by two-photon lithography

    SciTech Connect (OSTI)

    Atwater, Jackson H; Spinelli, P.; Kosten, Emily D; Parsons, J.; Van Lare, C; Van de Groep, J; Garcia de Abajo, J.; Polman, Albert; Atwater, Harry A.

    2011-01-01

    We have fabricated microphotonic parabolic light directors using two-photon lithography, thin-film processing, and aperture formation by focused ion beam lithography. Optical transmission measurements through upright parabolic directors 22 ?m high and 10 ?m in diameter exhibit strong beam directivity with a beam divergence of 5.6, in reasonable agreement with ray-tracing and full-field electromagnetic simulations. The results indicate the suitability of microphotonic parabolic light directors for producing collimated beams for applications in advanced solar cell and light-emitting diode designs.

  8. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Wikipedia to forecast diseases November 13, 2014 Los Alamos research published in Public Library of Science LOS ALAMOS, N.M., Nov. 13, 2014-Scientists can now monitor and forecast diseases around the globe more effectively by analyzing views of Wikipedia articles, according to a team from Los Alamos National Laboratory. "A global disease-forecasting system will improve the way we respond to epidemics," scientist Sara Del Valle said. "In the same way we check the weather each

  9. Development characteristics of polymethyl methacrylate in alcohol/water mixtures. A lithography and Raman spectroscopy study

    SciTech Connect (OSTI)

    Ocola, Leonidas E.; Costales, Maya; Gosztola, David J.

    2015-12-10

    Poly methyl methacrylate (PMMA) is the most widely used resist in electron beam lithography. This paper reports on a lithography and Raman spectroscopy study of development characteristics of PMMA in methanol, ethanol and isopropanol mixtures with water as developers. We have found that ethanol/water mixtures at a 4:1 volume ratio are an excellent, high resolution, non-toxic, developer for exposed PMMA. We also have found that the proper methodology to use so that contrast data can be compared to techniques used in polymer science is not to rinse the developed resist but to immediately dry with nitrogen. Our results show how powerful simple lithographic techniques can be used to study ternary polymer solvent solutions when compared to other techniques used in the literature. Raman data shows that there both tightly bonded –OH groups and non-hydrogen bonded –OH groups play a role in the development of PMMA. Tightly hydrogen bonded –OH groups show pure Lorentzian Raman absorption only in the concentration ranges where ethanol/water and IPA/water mixtures are effective developers of PMMA. The impact of the understanding these interactions may open doors to a new developers of other electron beam resists that can reduce the toxicity of the waste stream.

  10. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Biological and Environmental Research U.S. Department of energy atmospheric radiation measurement program ARM ARM The Importance of Radiation and Clouds for Climate Change The Earth's surface temperature is determined by the balance between incoming solar radiation and thermal (or infrared) radiation emitted by the Earth back to space. Changes in atmospheric composition, including greenhouse gases, clouds, and aerosols, can alter this balance and produce signifcant climate change. Global climate

  11. Diffractive element in extreme-UV lithography condenser

    DOE Patents [OSTI]

    Sweatt, William C.; Ray-Chaudhurl, Avijit K.

    2000-01-01

    Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

  12. Diffractive element in extreme-UV lithography condenser

    DOE Patents [OSTI]

    Sweatt, William C.; Ray-Chaudhuri, Avijit

    2001-01-01

    Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

  13. Condenser for extreme-UV lithography with discharge source

    DOE Patents [OSTI]

    Sweatt, William C.; Kubiak, Glenn D.

    2001-01-01

    Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.

  14. Ultratech Develops an Improved Lithography Tool for LED Wafer Manufacturing

    Broader source: Energy.gov [DOE]

    Ultratech modified an existing lithography tool used for semiconductor manufacturing to better meet the cost and performance targets of the high-brightness LED manufacturing industry. The goal was to make the equipment compatible with the wide range of substrate diameters and thicknesses prevalent in the industry while reducing the capital cost and the overall cost of ownership (COO).

  15. Composite patterning devices for soft lithography

    DOE Patents [OSTI]

    Rogers, John A.; Menard, Etienne

    2007-03-27

    The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions. The present invention provides composite patterning devices comprising a plurality of polymer layers each having selected mechanical properties, such as Young's Modulus and flexural rigidity, selected physical dimensions, such as thickness, surface area and relief pattern dimensions, and selected thermal properties, such as coefficients of thermal expansion, to provide high resolution patterning on a variety of substrate surfaces and surface morphologies.

  16. Seventh BES (Basic Energy Sciences) catalysis and surface chemistry research conference

    SciTech Connect (OSTI)

    Not Available

    1990-03-01

    Research programs on catalysis and surface chemistry are presented. A total of fifty-seven topics are included. Areas of research include heterogeneous catalysis; catalysis in hydrogenation, desulfurization, gasification, and redox reactions; studies of surface properties and surface active sites; catalyst supports; chemical activation, deactivation; selectivity, chemical preparation; molecular structure studies; sorption and dissociation. Individual projects are processed separately for the data bases. (CBS)

  17. Resolution Improvement and Pattern Generator Development for theMaskless Micro-Ion-Beam Reduction Lithography System

    SciTech Connect (OSTI)

    Jiang, Ximan

    2006-05-18

    have been studied. The dependence of the throughput with the exposure field size and the speed of the mechanical stage has been investigated. In order to perform maskless lithography, different micro-fabricated pattern generators have been developed for the MMRL system. Ion beamlet switching has been successfully demonstrated on the MMRL system. A positive bias voltage around 10 volts is sufficient to switch off the ion current on the micro-fabricated pattern generators. Some unexpected problems, such as the high-energy secondary electron radiations, have been discovered during the experimental investigation. Thermal and structural analysis indicates that the aperture displacement error induced by thermal expansion can satisfy the 3{delta} CD requirement for lithography nodes down to 25 nm. The cross-talking effect near the surface and inside the apertures of the pattern generator has been simulated in a 3-D ray-tracing code. New pattern generator design has been proposed to reduce the cross-talking effect. In order to eliminate the surface charging effect caused by the secondary electrons, a new beam-switching scheme in which the switching electrodes are immersed in the plasma has been demonstrated on a mechanically fabricated pattern generator.

  18. Etched-multilayer phase shifting masks for EUV lithography

    DOE Patents [OSTI]

    Chapman, Henry N.; Taylor, John S.

    2005-04-05

    A method is disclosed for the implementation of phase shifting masks for EUV lithography. The method involves directly etching material away from the multilayer coating of the mask, to cause a refractive phase shift in the mask. By etching into the multilayer (for example, by reactive ion etching), rather than depositing extra material on the top of the multilayer, there will be minimal absorption loss associated with the phase shift.

  19. Maskless micro-ion-beam reduction lithography system

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Barletta, William A.; Patterson, David O.; Gough, Richard A.

    2005-05-03

    A maskless micro-ion-beam reduction lithography system is a system for projecting patterns onto a resist layer on a wafer with feature size down to below 100 nm. The MMRL system operates without a stencil mask. The patterns are generated by switching beamlets on and off from a two electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source and is followed by a beam reduction and acceleration column.

  20. Low Cost Lithography Tool for High Brightness LED Manufacturing

    SciTech Connect (OSTI)

    Andrew Hawryluk; Emily True

    2012-06-30

    The objective of this activity was to address the need for improved manufacturing tools for LEDs. Improvements include lower cost (both capital equipment cost reductions and cost-ofownership reductions), better automation and better yields. To meet the DOE objective of $1- 2/kilolumen, it will be necessary to develop these highly automated manufacturing tools. Lithography is used extensively in the fabrication of high-brightness LEDs, but the tools used to date are not scalable to high-volume manufacturing. This activity addressed the LED lithography process. During R&D and low volume manufacturing, most LED companies use contact-printers. However, several industries have shown that these printers are incompatible with high volume manufacturing and the LED industry needs to evolve to projection steppers. The need for projection lithography tools for LED manufacturing is identified in the Solid State Lighting Manufacturing Roadmap Draft, June 2009. The Roadmap states that Projection tools are needed by 2011. This work will modify a stepper, originally designed for semiconductor manufacturing, for use in LED manufacturing. This work addresses improvements to yield, material handling, automation and throughput for LED manufacturing while reducing the capital equipment cost.

  1. SGP Cloud and Land Surface Interaction Campaign (CLASIC): Science and Implementation Plan

    SciTech Connect (OSTI)

    MA Miller; R Avissar; LK Berg; SA Edgerton; ML Fischer; T Jackson; B.Kustas; PJ Lamb; GM McFarquhar; Q Min; B Schmid; MS Torn; DD Turner

    2007-06-30

    The Cloud and Land Surface Interaction Campaign is a field experiment designed to collect a comprehensive data set that can be used to quantify the interactions that occur between the atmosphere, biosphere, land surface, and subsurface. A particular focus will be on how these interactions modulate the abundance and characteristics of small and medium size cumuliform clouds that are generated by local convection. These interactions are not well understood and are responsible for large uncertainties in global climate models, which are used to forecast future climate states. The campaign will be conducted from June 8 to June 30, 2007, at the U.S. Department of Energys Atmospheric Radiation Measurement Climate Research Facility Southern Great Plains site. Data will be collected using eight aircraft equipped with a variety of specialized sensors, four specially instrumented surface sites, and two prototype surface radar systems. The architecture of Cloud and Land Surface Interaction Campaign includes a high-altitude surveillance aircraft and enhanced vertical thermodynamic and wind profile measurements that will characterize the synoptic scale structure of the clouds and the land surface within the Atmospheric Radiation Measurement Climate Research Facility Southern Great Plains site. Mesoscale and microscale structures will be sampled with a variety of aircraft, surface, and radar observations.

  2. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

    DOE Patents [OSTI]

    Chapman, Henry N.; Nugent, Keith A.

    2001-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  3. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

    DOE Patents [OSTI]

    Chapman, Henry N.; Nugent, Keith A.

    2002-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  4. Resolution Limits of Electron-beam Lithography Pushed Towards the Atomic

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Scale | MIT-Harvard Center for Excitonics Resolution Limits of Electron-beam Lithography Pushed Towards the Atomic Scale 10.22.2013

  5. X-ray lithography using holographic images

    DOE Patents [OSTI]

    Howells, M.S.; Jacobsen, C.

    1997-03-18

    Methods for forming X-ray images having 0.25 {micro}m minimum line widths on X-ray sensitive material are presented. A holographic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required. 15 figs.

  6. X-ray lithography using holographic images

    DOE Patents [OSTI]

    Howells, Malcolm S.; Jacobsen, Chris

    1997-01-01

    Methods for forming X-ray images having 0.25 .mu.m minimum line widths on X-ray sensitive material are presented. A holgraphic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required.

  7. Low-energy ion beamline scattering apparatus for surface science investigations

    SciTech Connect (OSTI)

    Gordon, M.J.; Giapis, K.P.

    2005-08-15

    We report on the design, construction, and performance of a high current (monolayers/s), mass-filtered ion beamline system for surface scattering studies using inert and reactive species at collision energies below 1500 eV. The system combines a high-density inductively coupled plasma ion source, high-voltage floating beam transport line with magnet mass-filter and neutral stripping, decelerator, and broad based detection capabilities (ions and neutrals in both mass and energy) for products leaving the target surface. The entire system was designed from the ground up to be a robust platform to study ion-surface interactions from a more global perspective, i.e., high fluxes (>100 {mu}A/cm{sup 2}) of a single ion species at low, tunable energy (50-1400{+-}5 eV full width half maximum) can be delivered to a grounded target under ultrahigh vacuum conditions. The high current at low energy problem is solved using an accel-decel transport scheme where ions are created at the desired collision energy in the plasma source, extracted and accelerated to high transport energy (20 keV to fight space charge repulsion), and then decelerated back down to their original creation potential right before impacting the grounded target. Scattered species and those originating from the surface are directly analyzed in energy and mass using a triply pumped, hybrid detector composed of an electron impact ionizer, hemispherical electrostatic sector, and rf/dc quadrupole in series. With such a system, the collision kinematics, charge exchange, and chemistry occurring on the target surface can be separated by fully analyzing the scattered product flux. Key design aspects of the plasma source, beamline, and detection system are emphasized here to highlight how to work around physical limitations associated with high beam flux at low energy, pumping requirements, beam focusing, and scattered product analysis. Operational details of the beamline are discussed from the perspective of available

  8. Fundamental Understanding of the Interaction of Acid Gases with CeO2 : From Surface Science to Practical Catalysis

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Tumuluri, Uma; Rother, Gernot; Wu, Zili

    2016-03-21

    Acid gases including CO2, SO2, and NOx are ubiquitous in large-scale energy applications including heterogeneous catalysis. The adverse environmental and health effects of these acid gases have resulted in high interest in the research and development of technologies to remove or convert these acid gases. The main challenge for the development of these technologies is to develop catalysts that are highly efficient, stable, and cost-effective, and many catalysts have been reported in this regard. CeO2 and CeO2-based catalysts have gained prominence in the removal and conversion of CO2, SO2, and NOx because of their structural robustness and redox and acid–basemore » properties. In this article, we provide a brief overview of the application of CeO2 and CeO2-based catalysts for the removal of CO2, SO2, and NOx gases with an emphasis on the fundamental understanding of the interactions of these acid gases with CeO2. The studies summarized in this review range from surface science using single crystals and thin films with precise crystallographic planes to practical catalysis applications of nanocrystalline and polycrystalline CeO2 materials with defects and dopants. After an introduction to the properties of CeO2 surfaces, their catalytic properties for conversions of different acid gases are reviewed and discussed. Lastly, we find that the surface atomic structure, oxygen vacancies, and surface acid–base properties of CeO2 play vital roles in the surface chemistry and structure evolution during the interactions of acid gases with CeO2 and CeO2-based catalysts.« less

  9. High numerical aperture projection system for extreme ultraviolet projection lithography

    DOE Patents [OSTI]

    Hudyma, Russell M.

    2000-01-01

    An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

  10. Investigation of anti-Relaxation coatings for alkali-metal vapor cells using surface science techniques

    SciTech Connect (OSTI)

    Seltzer, S. J.; Michalak, D. J.; Donaldson, M. H.; Balabas, M. V.; Barber, S. K.; Bernasek, S. L.; Bouchiat, M.-A.; Hexemer, A.; Hibberd, A. M.; Jackson Kimball, D. F.; Jaye, C.; Karaulanov, T.; Narducci, F. A.; Rangwala, S. A.; Robinson, H. G.; Shmakov, A. K.; Voronov, D. L.; Yashchuk, V. V.; Pines, A.; Budker, D.

    2010-10-11

    Many technologies based on cells containing alkali-metal atomic vapor benefit from the use of antirelaxation surface coatings in order to preserve atomic spin polarization. In particular, paraffin has been used for this purpose for several decades and has been demonstrated to allow an atom to experience up to 10?000 collisions with the walls of its container without depolarizing, but the details of its operation remain poorly understood. We apply modern surface and bulk techniques to the study of paraffin coatings in order to characterize the properties that enable the effective preservation of alkali spin polarization. These methods include Fourier transform infrared spectroscopy, differential scanning calorimetry, atomic force microscopy, near-edge x-ray absorption fine structure spectroscopy, and x-ray photoelectron spectroscopy. We also compare the light-induced atomic desorption yields of several different paraffin materials. Experimental results include the determination that crystallinity of the coating material is unnecessary, and the detection of C=C double bonds present within a particular class of effective paraffin coatings. Further study should lead to the development of more robust paraffin antirelaxation coatings, as well as the design and synthesis of new classes of coating materials.

  11. Soft x-ray reduction camera for submicron lithography

    DOE Patents [OSTI]

    Hawryluk, A.M.; Seppala, L.G.

    1991-03-26

    Soft x-ray projection lithography can be performed using x-ray optical components and spherical imaging lenses (mirrors), which form an x-ray reduction camera. The x-ray reduction is capable of projecting a 5x demagnified image of a mask onto a resist coated wafer using 4.5 nm radiation. The diffraction limited resolution of this design is about 135 nm with a depth of field of about 2.8 microns and a field of view of 0.2 cm[sup 2]. X-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free are used, with a laser produced plasma for the source. Higher resolution and/or larger areas are possible by varying the optic figures of the components and source characteristics. 9 figures.

  12. Soft x-ray reduction camera for submicron lithography

    DOE Patents [OSTI]

    Hawryluk, Andrew M.; Seppala, Lynn G.

    1991-01-01

    Soft x-ray projection lithography can be performed using x-ray optical components and spherical imaging lenses (mirrors), which form an x-ray reduction camera. The x-ray reduction is capable of projecting a 5x demagnified image of a mask onto a resist coated wafer using 4.5 nm radiation. The diffraction limited resolution of this design is about 135 nm with a depth of field of about 2.8 microns and a field of view of 0.2 cm.sup.2. X-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free are used, with a laser produced plasma for the source. Higher resolution and/or larger areas are possible by varying the optic figures of the components and source characteristics.

  13. Critical illumination condenser for x-ray lithography

    DOE Patents [OSTI]

    Cohen, S.J.; Seppala, L.G.

    1998-04-07

    A critical illumination condenser system is disclosed, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 {micro}m source and requires a magnification of 26. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth. 6 figs.

  14. Critical illumination condenser for x-ray lithography

    DOE Patents [OSTI]

    Cohen, Simon J.; Seppala, Lynn G.

    1998-01-01

    A critical illumination condenser system, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 .mu.m source and requires a magnification of 26.times.. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth.

  15. Development of ion sources for ion projection lithography

    SciTech Connect (OSTI)

    Lee, Y.; Gough, R.A.; Kunkel, W.B.; Leung, K.N.; Perkins, L.T.

    1996-05-01

    Multicusp ion sources are capable of generating ion beams with low axial energy spread as required by the Ion Projection Lithography (IPL). Longitudinal ion energy spread has been studied in two different types of plasma discharge: the filament discharge ion source characterized by its low axial energy spread, and the RF-driven ion source characterized by its long source lifetime. For He{sup +} ions, longitudinal ion energy spreads of 1-2 eV were measured for a filament discharge multicusp ion source which is within the IPL device requirements. Ion beams with larger axial energy spread were observed in the RF-driven source. A double-chamber ion source has been designed which combines the advantages of low axial energy spread of the filament discharge ion source with the long lifetime of the RF-driven source. The energy spread of the double chamber source is lower than that of the RF-driven source.

  16. Sandia National Labs: Physical, Chemical and Nano Sciences Center (PCNSC):

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Departments Sciences Semiconductor & Optical Sciences Energy Sciences Small Science Cluster Business Office News Partnering Research Departments Radiation, Nano Materials, & Interface Sciences Radiation and Solid Interactions Nanomaterials Sciences Surface and Interface Sciences Semiconductor & Optical Sciences Semiconductor Material and Device Sciences Advanced Materials Sciences Lasers, Optics, and Remote Sensing Energy Sciences CINT User Program CINT Science Small Science

  17. Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control

    SciTech Connect (OSTI)

    Lee, Won-Sup; Kim, Taeseob; Choi, Guk-Jong; Lim, Geon; Joe, Hang-Eun; Gang, Myeong-Gu; Min, Byung-Kwon; Park, No-Cheol; Moon, Hyungbae; Kim, Do-Hyung; Park, Young-Pil

    2015-02-02

    Plasmonic lithography has been used in nanofabrication because of its utility beyond the diffraction limit. The resolution of plasmonic lithography depends on the nano-gap between the nanoaperture and the photoresist surface—changing the gap distance can modulate the line-width of the pattern. In this letter, we demonstrate solid-immersion lens based active non-contact plasmonic lithography, applying a range of gap conditions to modulate the line-width of the pattern. Using a solid-immersion lens-based near-field control system, the nano-gap between the exit surface of the nanoaperture and the media can be actively modulated and maintained to within a few nanometers. The line-widths of the recorded patterns using 15- and 5-nm gaps were 47 and 19.5 nm, respectively, which matched closely the calculated full-width at half-maximum. From these results, we conclude that changing the nano-gap within a solid-immersion lens-based plasmonic head results in varying line-width patterns.

  18. Biological Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Energy Science Engineering Science Environmental Science Fusion Science Math & Computer Science Nuclear Science Share Your Research NERSC Citations Home Science at...

  19. M&A For Lithography Of Sparse Arrays Of Sub-Micrometer Features

    DOE Patents [OSTI]

    Brueck, Steven R.J.; Chen, Xiaolan; Zaidi, Saleem; Devine, Daniel J.

    1998-06-02

    Methods and apparatuses are disclosed for the exposure of sparse hole and/or mesa arrays with line:space ratios of 1:3 or greater and sub-micrometer hole and/or mesa diameters in a layer of photosensitive material atop a layered material. Methods disclosed include: double exposure interferometric lithography pairs in which only those areas near the overlapping maxima of each single-period exposure pair receive a clearing exposure dose; double interferometric lithography exposure pairs with additional processing steps to transfer the array from a first single-period interferometric lithography exposure pair into an intermediate mask layer and a second single-period interferometric lithography exposure to further select a subset of the first array of holes; a double exposure of a single period interferometric lithography exposure pair to define a dense array of sub-micrometer holes and an optical lithography exposure in which only those holes near maxima of both exposures receive a clearing exposure dose; combination of a single-period interferometric exposure pair, processing to transfer resulting dense array of sub-micrometer holes into an intermediate etch mask, and an optical lithography exposure to select a subset of initial array to form a sparse array; combination of an optical exposure, transfer of exposure pattern into an intermediate mask layer, and a single-period interferometric lithography exposure pair; three-beam interferometric exposure pairs to form sparse arrays of sub-micrometer holes; five- and four-beam interferometric exposures to form a sparse array of sub-micrometer holes in a single exposure. Apparatuses disclosed include arrangements for the three-beam, five-beam and four-beam interferometric exposures.

  20. Four-mirror extreme ultraviolet (EUV) lithography projection system

    DOE Patents [OSTI]

    Cohen, Simon J; Jeong, Hwan J; Shafer, David R

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  1. Fundamentals of embossing nanoimprint lithography in polymer substrates.

    SciTech Connect (OSTI)

    Simmons, Blake Alexander; King, William P.

    2011-02-01

    The convergence of micro-/nano-electromechanical systems (MEMS/NEMS) and biomedical industries is creating a need for innovation and discovery around materials, particularly in miniaturized systems that use polymers as the primary substrate. Polymers are ubiquitous in the microelectronics industry and are used as sensing materials, lithography tools, replication molds, microfluidics, nanofluidics, and biomedical devices. This diverse set of operational requirements dictates that the materials employed must possess different properties in order to reduce the cost of production, decrease the scale of devices to the appropriate degree, and generate engineered devices with new functional properties at cost-competitive levels of production. Nanoscale control of polymer deformation at a massive scale would enable breakthroughs in all of the aforementioned applications, but is currently beyond the current capabilities of mass manufacturing. This project was focused on developing a fundamental understanding of how polymers behave under different loads and environments at the nanoscale in terms of performance and fidelity in order to fill the most critical gaps in our current knowledgebase on this topic.

  2. Sweet Surface Area

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Sweet Surface Area Sweet Surface Area Create a delicious root beer float and learn sophisticated science concepts at the same time. Sweet Surface Area Science is all around us, so ...

  3. Photo-lithography of xanthate precursor poly(p-phenylenevinylene...

    Office of Scientific and Technical Information (OSTI)

    Our photolithographic process is simple and direct, and should be amenable to a range of ... Country of Publication: United States Language: English Subject: 36 MATERIALS SCIENCE; ...

  4. Lithography with MeV Energy Ions for Biomedical Applications: Accelerator Considerations

    SciTech Connect (OSTI)

    Sangyuenyongpipat, S.; Whitlow, H. J.; Nakagawa, S. T.; Yoshida, E.

    2009-03-10

    MeV ion beam lithographies are very powerful techniques for 3D direct writing in positive or negative photoresist materials. Nanometer-scale rough structures, or clear areas with straight vertical sidewalls as thin as a few 10's of nm in a resist of a few nm to 100 {mu}m thickness can be made. These capabilities are particularly useful for lithography in cellular- and sub-cellular level biomedical research and technology applications. It can be used for tailor making special structures such as optical waveguides, biosensors, DNA sorters, spotting plates, systems for DNA, protein and cell separation, special cell-growth substrates and microfluidic lab-on-a-chip devices. Furthermore MeV ion beam lithography can be used for rapid prototyping, and also making master stamps and moulds for mass production by hot embossing and nanoimprint lithography. The accelerator requirements for three different high energy ion beam lithography techniques are overviewed. We consider the special requirements placed on the accelerator and how this is achieved for a commercial proton beam writing tool.

  5. Soft X-ray Lithography Beamline at the Siam Photon Laboratory

    SciTech Connect (OSTI)

    Klysubun, P.; Chomnawang, N.; Songsiriritthigul, P.

    2007-01-19

    Construction of a soft x-ray lithography beamline utilizing synchrotron radiation generated by one of the bending magnets at the Siam Photon Laboratory is finished and the beamline is currently in a commissioning period. The beamline was modified from the existing monitoring beamline and is intended for soft x-ray lithographic processing and radiation biological research. The lithography exposure station with a compact one-dimensional scanning mechanism was constructed and assembled in-house. The front-end of the beamline has been modified to allow larger exposure area. The exposure station for studying radiation effects on biological samples will be set up in tandem with the lithography station, with a Mylar window for isolation. Several improvements to both the beamline and the exposure stations, such as improved scanning speed and the ability to adjust the exposure spectrum by means of low-Z filters, are planned and will be implemented in the near future.

  6. Molecular Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Molecular Science NETL's Molecular Science competency provides technology-enabling computational and experimental insight into the atomic-level processes occurring in condensed matter and gas phase systems or at the heterogeneous surface-gas interfaces used for energy applications. Research includes molecular optimization as well as both classical and high-throughput material design, specifically: Molecular Optimization Development and application of new computational approaches in the general

  7. Lithography process for patterning HgI2 photonic devices

    DOE Patents [OSTI]

    Mescher, Mark J.; James, Ralph B.; Hermon, Haim

    2004-11-23

    A photolithographic process forms patterns on HgI.sub.2 surfaces and defines metal sublimation masks and electrodes to substantially improve device performance by increasing the realizable design space. Techniques for smoothing HgI.sub.2 surfaces and for producing trenches in HgI.sub.2 are provided. A sublimation process is described which produces etched-trench devices with enhanced electron-transport-only behavior.

  8. Interfacial and Surface Science | Materials Science | NREL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    studies of energy-relevant materials, interfaces and device structures. Contact: Craig Perkins | Email | 303-384-6659 Atomic, Molecular, and Nanocrystal Deposition Apparatus Called...

  9. Extreme-UV lithography vacuum chamber zone seal

    DOE Patents [OSTI]

    Haney, Steven J.; Herron, Donald Joe; Klebanoff, Leonard E.; Replogle, William C.

    2003-04-15

    Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

  10. Extreme-UV lithography vacuum chamber zone seal

    DOE Patents [OSTI]

    Haney, Steven J.; Herron, Donald Joe; Klebanoff, Leonard E.; Replogle, William C.

    2001-01-01

    Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

  11. Extreme-UV lithography vacuum chamber zone seal

    DOE Patents [OSTI]

    Haney, Steven J.; Herron, Donald Joe; Klebanoff, Leonard E.; Replogle, William C.

    2003-04-08

    Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

  12. Lithography-free large-area metamaterials for stable thermophotovoltaic energy conversion

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Coppens, Zachary J.; Kravchenko, Ivan I.; Valentine, Jason G.

    2016-02-08

    A large-area metamaterial thermal emitter is fabricated using facile, lithography-free techniques. The device is composed of conductive oxides, refractory ceramics, and noble metals and shows stable, selective emission after exposure to 1173 K for 22 h in oxidizing and inert atmospheres. Lastly, the results indicate that the metamaterial can be used to achieve high-performance thermophotovoltaic devices for applications such as portable power generation.

  13. Science& Technology Review October 2003

    SciTech Connect (OSTI)

    McMahon, D H

    2003-10-01

    The October 2003 issue of Science & Technology Review consists of the following articles: (1) Award-Winning Technologies from Collaborative Efforts--Commentary by Hal Graboske; (2) BASIS Counters Airborne Bioterrorism--The Biological Aerosol Sentry and Information System is the first integrated biodefense system; (3) In the Chips for the Coming Decade--A new system is the first full-field lithography tool for use at extreme ultraviolet wavelengths; (4) Smoothing the Way to Print the Next Generation of Computer Chips--With ion-beam thin-film planarization, the reticles and projection optics made for extreme ultraviolet lithography are nearly defect-free; (5) Eyes Can See Clearly Now--The MEMS-based adaptive optics phoropter improves the process of measuring and correcting eyesight aberrations; (6) This Switch Takes the Heat--A thermally compensated Q-switch reduces the light leakage on high-average-power lasers; (7) Laser Process Forms Thick, Curved Metal Parts--A new process shapes parts to exact specifications, improving their resistance to fatigue and corrosion cracking; and (8) Characterizing Tiny Objects without Damaging Them--Livermore researchers are developing nondestructive techniques to probe the Lilliputian world of mesoscale objects.

  14. Low thermal distortion extreme-UV lithography reticle

    DOE Patents [OSTI]

    Gianoulakis, Steven E.; Ray-Chaudhuri, Avijit K.

    2001-01-01

    Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

  15. Low thermal distortion extreme-UV lithography reticle

    DOE Patents [OSTI]

    Gianoulakis, Steven E.; Ray-Chaudhuri, Avijit K.

    2002-01-01

    Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

  16. Low thermal distortion Extreme-UV lithography reticle and method

    DOE Patents [OSTI]

    Gianoulakis, Steven E.; Ray-Chaudhuri, Avijit K.

    2002-01-01

    Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

  17. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Institute for Research in Environmental Sciences CMDL (c) Twelfth Atmospheric Radiation Measurement (ARM) Science Team Meeting Data collected during the SHEBA (Surface Heat...

  18. Wafer chamber having a gas curtain for extreme-UV lithography

    DOE Patents [OSTI]

    Kanouff, Michael P.; Ray-Chaudhuri, Avijit K.

    2001-01-01

    An EUVL device includes a wafer chamber that is separated from the upstream optics by a barrier having an aperture that is permeable to the inert gas. Maintaining an inert gas curtain in the proximity of a wafer positioned in a chamber of an extreme ultraviolet lithography device can effectively prevent contaminants from reaching the optics in an extreme ultraviolet photolithography device even though solid window filters are not employed between the source of reflected radiation, e.g., the camera, and the wafer. The inert gas removes the contaminants by entrainment.

  19. Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

    SciTech Connect (OSTI)

    Medvedev, V. V. Kruijs, R. W. E. van de; Yakshin, A. E.; Novikova, N. N.; Krivtsun, V. M.; Louis, E.; Bijkerk, F.; MESA Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede ; Yakunin, A. M.

    2013-11-25

    We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

  20. Diffraction spectral filter for use in extreme-UV lithography condenser

    DOE Patents [OSTI]

    Sweatt, William C.; Tichenor, Daniel A.; Bernardez, Luis J.

    2002-01-01

    A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.

  1. Science and Science Fiction

    ScienceCinema (OSTI)

    Scherrer, Robert [Vanderbilt University, Nashville, Tennessee, United States

    2009-09-01

    I will explore the similarities and differences between the process of writing science fiction and the process of 'producing' science, specifically theoretical physics. What are the ground rules for introducing unproven new ideas in science fiction, and how do they differ from the corresponding rules in physics? How predictive is science fiction? (For that matter, how predictive is theoretical physics?) I will also contrast the way in which information is presented in science fiction, as opposed to its presentation in scientific papers, and I will examine the relative importance of ideas (as opposed to the importance of the way in which these ideas are presented). Finally, I will discuss whether a background as a research scientist provides any advantage in writing science fiction.

  2. Science Briefs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Briefs Science Briefs Read in detail about specific Los Alamos science achievements, and the honors our scientists are accruing. Science Briefs - 2016» Science Briefs - 2015» Science Briefs - 2014» Science Briefs - 2013» Science Briefs - 2012» Science Briefs - 2011» Elizabeth Kelly Kelly named Fellow of the American Statistical Association The American Statistical Association (ASA) has honored Elizabeth Kelly with the title of Fellow. - 8/2/16 Beverly Aikin, left, and Ellen Cerreta

  3. Maskless Lithography and in situ Visualization of Conductivity of Graphene using Helium Ion Microscopy

    SciTech Connect (OSTI)

    Iberi, Vighter O.; Vlassiouk, Ivan V.; Zhang, X. -G.; Matola, Brad R.; Linn, Allison R.; Joy, David Charles; Adam Justin Rondinone

    2015-07-07

    The remarkable mechanical and electronic properties of graphene make it an ideal candidate for next generation nanoelectronics. With the recent development of commercial-level single-crystal graphene layers, the potential for manufacturing household graphene-based devices has improved, but significant challenges still remain with regards to patterning the graphene into devices. In the case of graphene supported on a substrate, traditional nanofabrication techniques such as e-beam lithography (EBL) are often used in fabricating graphene nanoribbons but the multi-step processes they require can result in contamination of the graphene with resists and solvents. In this letter, we report the utility of scanning helium ion lithography for fabricating functional graphene nanoconductors that are supported directly on a silicon dioxide layer, and we measure the minimum feature size achievable due to limitations imposed by thermal fluctuations and ion scattering during the milling process. Further we demonstrate that ion beams, due to their positive charging nature, may be used to observe and test the conductivity of graphene-based nanoelectronic devices in situ.

  4. Objective for EUV microscopy, EUV lithography, and x-ray imaging

    DOE Patents [OSTI]

    Bitter, Manfred; Hill, Kenneth W.; Efthimion, Philip

    2016-05-03

    Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.

  5. Maskless Lithography and in situ Visualization of Conductivity of Graphene using Helium Ion Microscopy

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Iberi, Vighter O.; Vlassiouk, Ivan V.; Zhang, X. -G.; Matola, Brad R.; Linn, Allison R.; Joy, David Charles; Adam Justin Rondinone

    2015-07-07

    The remarkable mechanical and electronic properties of graphene make it an ideal candidate for next generation nanoelectronics. With the recent development of commercial-level single-crystal graphene layers, the potential for manufacturing household graphene-based devices has improved, but significant challenges still remain with regards to patterning the graphene into devices. In the case of graphene supported on a substrate, traditional nanofabrication techniques such as e-beam lithography (EBL) are often used in fabricating graphene nanoribbons but the multi-step processes they require can result in contamination of the graphene with resists and solvents. In this letter, we report the utility of scanning helium ionmore » lithography for fabricating functional graphene nanoconductors that are supported directly on a silicon dioxide layer, and we measure the minimum feature size achievable due to limitations imposed by thermal fluctuations and ion scattering during the milling process. Further we demonstrate that ion beams, due to their positive charging nature, may be used to observe and test the conductivity of graphene-based nanoelectronic devices in situ.« less

  6. Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

    SciTech Connect (OSTI)

    Kaganskiy, Arsenty; Gschrey, Manuel; Schlehahn, Alexander; Schmidt, Ronny; Schulze, Jan-Hindrik; Heindel, Tobias; Rodt, Sven Reitzenstein, Stephan; Strittmatter, André

    2015-07-15

    We report on an advanced in-situ electron-beam lithography technique based on high-resolution cathodoluminescence (CL) spectroscopy at low temperatures. The technique has been developed for the deterministic fabrication and quantitative evaluation of nanophotonic structures. It is of particular interest for the realization and optimization of non-classical light sources which require the pre-selection of single quantum dots (QDs) with very specific emission features. The two-step electron-beam lithography process comprises (a) the detailed optical study and selection of target QDs by means of CL-spectroscopy and (b) the precise retrieval of the locations and integration of target QDs into lithographically defined nanostructures. Our technology platform allows for a detailed pre-process determination of important optical and quantum optical properties of the QDs, such as the emission energies of excitonic complexes, the excitonic fine-structure splitting, the carrier dynamics, and the quantum nature of emission. In addition, it enables a direct and precise comparison of the optical properties of a single QD before and after integration which is very beneficial for the quantitative evaluation of cavity-enhanced quantum devices.

  7. Soft holographic interference lithography microlens for enhanced organic light emitting diode light extraction

    SciTech Connect (OSTI)

    Park, Joong-Mok; Gan, Zhengqing; Leung, Wai Y.; Liu, Rui; Ye, Zhuo; Constant, Kristen; Shinar, Joseph; Shinar, Ruth; Ho, Kai-Ming

    2011-06-06

    Very uniform 2 {micro}m-pitch square microlens arrays ({micro}LAs), embossed on the blank glass side of an indium-tin-oxide (ITO)-coated 1.1 mm-thick glass, are used to enhance light extraction from organic light-emitting diodes (OLEDs) by {approx}100%, significantly higher than enhancements reported previously. The array design and size relative to the OLED pixel size appear to be responsible for this enhancement. The arrays are fabricated by very economical soft lithography imprinting of a polydimethylsiloxane (PDMS) mold (itself obtained from a Ni master stamp that is generated from holographic interference lithography of a photoresist) on a UV-curable polyurethane drop placed on the glass. Green and blue OLEDs are then fabricated on the ITO to complete the device. When the {mu}LA is {approx}15 x 15 mm{sup 2}, i.e., much larger than the {approx}3 x 3 mm{sup 2} OLED pixel, the electroluminescence (EL) in the forward direction is enhanced by {approx}100%. Similarly, a 19 x 25 mm{sup 2} {mu}LA enhances the EL extracted from a 3 x 3 array of 2 x 2 mm{sup 2} OLED pixels by 96%. Simulations that include the effects of absorption in the organic and ITO layers are in accordance with the experimental results and indicate that a thinner 0.7 mm thick glass would yield a {approx}140% enhancement.

  8. Achieving clean epitaxial graphene surfaces suitable for device applications by improved lithographic process

    SciTech Connect (OSTI)

    Nath, A., E-mail: anath@gmu.edu; Rao, M. V. [George Mason University, 4400 University Dr., Fairfax, Virginia 22030 (United States); Koehler, A. D.; Jernigan, G. G.; Wheeler, V. D.; Hite, J. K.; Hernndez, S. C.; Robinson, Z. R.; Myers-Ward, R. L.; Eddy, C. R.; Gaskill, D. K. [U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, D.C. 20375 (United States); Garces, N. Y. [Sotera Defense Solutions, 2200 Defense Hwy. Suite 405, Crofton, Maryland 21114 (United States)

    2014-06-02

    It is well-known that the performance of graphene electronic devices is often limited by extrinsic scattering related to resist residue from transfer, lithography, and other processes. Here, we report a polymer-assisted fabrication procedure that produces a clean graphene surface following device fabrication by a standard lithography process. The effectiveness of this improved lithography process is demonstrated by examining the temperature dependence of epitaxial graphene-metal contact resistance using the transfer length method for Ti/Au (10?nm/50?nm) metallization. The Landauer-Buttiker model was used to explain carrier transport at the graphene-metal interface as a function of temperature. At room temperature, a contact resistance of 140 ?-?m was obtained after a thermal anneal at 523?K for 2?hr under vacuum, which is comparable to state-of-the-art values.

  9. Computational Materials Science | Materials Science | NREL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Computational Materials Science An image of interconnecting, sphere- and square-shaped particles that appears to be floating in space NREL's computational materials science capabilities span many research fields and interests. Electronic, Optical, and Transport Properties of Photovoltaic Materials Material properties and defect physics of Si, CdTe, III-V, CIGS, CZTS, and hybrid perovskite compounds Reconstruction of, and defect formation on, semiconductor surfaces Electronic and transport

  10. Window-assisted nanosphere lithography for vacuum micro-nano-electronics

    SciTech Connect (OSTI)

    Li, Nannan; Pang, Shucai; Yan, Fei; Chen, Lei; Jin, Dazhi; Xiang, Wei; Zhang, De; Zeng, Baoqing

    2015-04-15

    Development of vacuum micro-nano-electronics is quite important for combining the advantages of vacuum tubes and solid-state devices but limited by the prevailing fabricating techniques which are expensive, time consuming and low-throughput. In this work, window-assisted nanosphere lithography (NSL) technique was proposed and enabled the low-cost and high-efficiency fabrication of nanostructures for vacuum micro-nano-electronic devices, thus allowing potential applications in many areas. As a demonstration, we fabricated high-density field emitter arrays which can be used as cold cathodes in vacuum micro-nano-electronic devices by using the window-assisted NSL technique. The details of the fabricating process have been investigated. This work provided a new and feasible idea for fabricating nanostructure arrays for vacuum micro-nano-electronic devices, which would spawn the development of vacuum micro-nano-electronics.

  11. Study of nano imprinting using soft lithography on Krafty glue and PVDF polymer thin films

    SciTech Connect (OSTI)

    Sankar, M. S. Ravi, E-mail: rameshg.phy@pondiuni.edu; Gangineni, Ramesh Babu, E-mail: rameshg.phy@pondiuni.edu [Department of Physics, Pondicherry University, R. V. Nagar, Kalapet, Puducherry - 605014 (India)

    2014-04-24

    The present work reveals soft lithography strategy based on self assembly and replica molding for carrying out micro and nanofabrication. It provides a convenient, effective and very low cost method for the formation and manufacturing of micro and nano structures. Al-layer of compact disc (sony CD-R) used as a stamp with patterned relief structures to generate patterns and structures with pattern size of 100nm height, 1.7 ?m wide. In literature, PDMS (Polydimethylsiloxane) solution is widely used to get negative copy of the Al-layer. In this work, we have used inexpensive white glue (Polyvinylacetate + water), 15gm (?5) and PVDF (Polyvinylidene difluoride) spin coated films and successfully transferred the nano patterns of Al layer on to white glue and PVDF films.

  12. Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.

    2004-11-23

    A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.

  13. Method for the fabrication of three-dimensional microstructures by deep X-ray lithography

    DOE Patents [OSTI]

    Sweatt, William C.; Christenson, Todd R.

    2005-04-05

    A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.

  14. Detection Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Chemistry for Measurement and Detection Science Chemistry for Measurement and Detection Science Project Description Chemistry used in measurement and detection science plays a crucial role in the Laboratory's Science of Signatures scientific thrust. Measurement and detection science areas that require chemistry include nuclear and radiological, materials, biological, energy, climate, and space. Los Alamos scientists integrate chemical-science capabilities to ensure that the Laboratory can

  15. Science Highlights

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Highlights Science Highlights Print Science Highlights Featured scientific research based on publications resulting from work done at the ALS. Highlights are nominated by management and beamline scientists for their scientific significance. Current highlights (2004-present), highlight archives (1995-2004), and Summary Slides of ALS Science Highlights are also available. Science Briefs Short reports on recent research submitted by ALS beamline scientists and users. Science Cafés Informal

  16. Materials Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Materials Science Materials Science National security depends on science and technology. The United States relies on Los Alamos National Laboratory for the best of both. No place on Earth pursues a broader array of world-class scientific endeavors. Materials Physics and Applications» Materials Science and Technology» Institute for Materials Science» Materials Science Rob Dickerson uses a state-of-the-art transmission electron microscope at the Electron Microscopy Laboratory managed by Los

  17. Accelerating Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Accelerating Science with the NERSC Burst Buffer Early User Program Wahid Bhimji , ... Early User Program, focused on real science applications and workflows that can ...

  18. ARM - Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Atmospheric System Research (ASR) Earth System Modeling Regional & Global Climate Modeling Terrestrial Ecosystem Science Performance Metrics User Meetings Past ARM Science Team ...

  19. Nuclear Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Nuclear Science Nuclear Science Experimental and theoretical nuclear research carried out at NERSC is driven by the quest for improving our understanding of the building blocks of...

  20. Computer Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Cite Seer Department of Energy provided open access science research citations in chemistry, physics, materials, engineering, and computer science IEEE Xplore Full text...

  1. Accelerator Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Accelerator Science Accelerator Science ReframAccelerator.jpg Particle accelerators are among the largest, most complex, and most important scientific instruments in the world....

  2. Science Gateways

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    About Science Gateways A science gateway is a web-based interface to access HPC computers ... perform shared computations, and generally interact with NERSC resources over the web. ...

  3. Is sustainability science really a science?

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Is sustainability science really a science? Is sustainability science really a science? The team's work shows that although sustainability science has been growing explosively ...

  4. The effect of rhenium, sulfur and alumina on the conversion of hydrocarbons over platinum single crystals: Surface science and catalytic studies

    SciTech Connect (OSTI)

    Kim, C.

    1992-04-01

    Conversion reactions of hydrocarbons over Pt-Re model catalyst surfaces modified by sulfur and alumina have been studied. A plasma deposition source has been developed to deposit Pt, Re, and Al on metal substrates variable coverage in ultrahigh vacuum without excessive heating. Conversion of n-hexane was performed over the Re-covered Pt and Pt-covered Re surfaces. The presence of the second metal increased hydrogenolysis activity of both Pt-Re surfaces. Addition of sulfur on the model Catalyst surfaces suppressed hydrogenolysis activity and increased the cyclization rate of n-hexane to methylcyclopentane over Pt-Re surfaces. Sulfiding also increased the dehydrogenation rate of cyclohexane to benzene Over Pt-Re surfaces. It has been proposed that the PtRe bimetallic catalysts show unique properties when combined with sulfur, and electronic interactions exist between platinum, rhenium and sulfur. Decomposition of hydrocarbons on the sulfur-covered Pt-Re surfaces supported that argument. For the conversion of 1-butene over the planar Pt/AlO[sub x], the addition of Pt increased the selectivity of hydrogenation over isomerization.

  5. The effect of rhenium, sulfur and alumina on the conversion of hydrocarbons over platinum single crystals: Surface science and catalytic studies

    SciTech Connect (OSTI)

    Kim, C.

    1992-04-01

    Conversion reactions of hydrocarbons over Pt-Re model catalyst surfaces modified by sulfur and alumina have been studied. A plasma deposition source has been developed to deposit Pt, Re, and Al on metal substrates variable coverage in ultrahigh vacuum without excessive heating. Conversion of n-hexane was performed over the Re-covered Pt and Pt-covered Re surfaces. The presence of the second metal increased hydrogenolysis activity of both Pt-Re surfaces. Addition of sulfur on the model Catalyst surfaces suppressed hydrogenolysis activity and increased the cyclization rate of n-hexane to methylcyclopentane over Pt-Re surfaces. Sulfiding also increased the dehydrogenation rate of cyclohexane to benzene Over Pt-Re surfaces. It has been proposed that the PtRe bimetallic catalysts show unique properties when combined with sulfur, and electronic interactions exist between platinum, rhenium and sulfur. Decomposition of hydrocarbons on the sulfur-covered Pt-Re surfaces supported that argument. For the conversion of 1-butene over the planar Pt/AlO{sub x}, the addition of Pt increased the selectivity of hydrogenation over isomerization.

  6. Statistical Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    6 Statistical Sciences Applying statistical reasoning and rigor to multidisciplinary scientific investigations Contact Us Group Leader James Gattiker (Acting) Email Deputy Group Leader Geralyn Hemphill (Acting) Email Group Administrator LeeAnn Martinez (505) 667-3308 Email Statistical Sciences Statistical Sciences provides statistical reasoning and rigor to multidisciplinary scientific investigations and development, application, and communication of cutting-edge statistical sciences research.

  7. Explosives Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Explosives Science Explosives Science Current efforts in explosives science cover many areas critical to national security. One particular area is the need for countermeasures against explosive threats. v Comprehensive explosives process Los Alamos National Laboratory offers a comprehensive explosives process. This process leverages entire technical divisions dedicated to explosives science. Los Alamos scientists combine advanced expertise and capabilities with modern facilities. These assets

  8. Science Briefs - 2013

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Briefs - 2013 Read in detail about specific Los Alamos science achievements, and the honors our scientists are accruing. Image from National Oceanic and Atmospheric Administration's Environmental Visualization Laboratory depicts sea surface temperatures around Greenland from October 2010. Effect of ocean temperature on southwestern U.S. climate analyzed Researchers concluded that only part of the recent temperature rise in the Southwest could be attributed to greenhouse gases. -

  9. Science Highlights

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Highlights Print Science Highlights Featured scientific research based on publications resulting from work done at the ALS. Highlights are nominated by management and beamline scientists for their scientific significance. Current highlights (2004-present), highlight archives (1995-2004), and Summary Slides of ALS Science Highlights are also available. Science Briefs Short reports on recent research submitted by ALS beamline scientists and users. Science Cafés Informal lecture series

  10. Science Highlights

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Highlights Print Science Highlights Featured scientific research based on publications resulting from work done at the ALS. Highlights are nominated by management and beamline scientists for their scientific significance. Current highlights (2004-present), highlight archives (1995-2004), and Summary Slides of ALS Science Highlights are also available. Science Briefs Short reports on recent research submitted by ALS beamline scientists and users. Science Cafés Informal lecture series

  11. Explore Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Explore Explore Science Create your own science adventure by exploring our varied exhibits, and learn what inspired our scientists, engineers and technicians to discover new things. August 18, 2014 boys conducting experiment [Science is] a great game. It is inspiring and refreshing. The playing field is the universe itself. -I.I. Rabi Science is thinking in an organized way about things. You don't need a license or permission to practice science. Scientists are interested in just about anything

  12. Science Events

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Science Events Learn about our science by coming to Frontiers in Science lectures, catch Cafe Scientific events in your community, or come to sicence events at the Bradbury Science Museum. Sep 27 Tue 7:00 AM Systems Approaches in Immunology Inn and Spa at Loretto - Santa Fe, NM Advancements in immunology can be made through the development of theoretical and experimental techniques supplying models that bring together phenomena at different levels of complexity to study mechanisms that

  13. Science Highlights

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Highlights Print Science Highlights Featured scientific research based on publications resulting from work done at the ALS. Highlights are nominated by management and beamline scientists for their scientific significance. Current highlights (2004-present), highlight archives (1995-2004), and Summary Slides of ALS Science Highlights are also available. Science Briefs Short reports on recent research submitted by ALS beamline scientists and users. Science Cafés Informal lecture series

  14. Science Highlights

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Highlights Print Science Highlights Featured scientific research based on publications resulting from work done at the ALS. Highlights are nominated by management and beamline scientists for their scientific significance. Current highlights (2004-present), highlight archives (1995-2004), and Summary Slides of ALS Science Highlights are also available. Science Briefs Short reports on recent research submitted by ALS beamline scientists and users. Science Cafés Informal lecture series

  15. Chemical Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Chemical Science Chemical Science National security depends on science and technology. The United States relies on Los Alamos National Laboratory for the best of both. No place on Earth pursues a broader array of world-class scientific endeavors. Actinide Chemistry» Modeling and Simulation in the Chemical Sciences» Synthetic and Mechanistic Chemistry» Chemistry for Measurement and Detection Science» Chemical Researcher Jeff Pietryga shows two vials of different-size nanocrystals, each

  16. A simplified method for generating periodic nanostructures by interference lithography without the use of an anti-reflection coating

    SciTech Connect (OSTI)

    Kapon, Omree; Muallem, Merav; Palatnik, Alex; Aviv, Hagit; Tischler, Yaakov R.

    2015-11-16

    Interference lithography has proven to be a useful technique for generating periodic sub-diffraction limited nanostructures. Interference lithography can be implemented by exposing a photoresist polymer to laser light using a two-beam arrangement or more simply a one beam configuration based on a Lloyd's Mirror Interferometer. For typical photoresist layers, an anti-reflection coating must be deposited on the substrate to prevent adverse reflections from cancelling the holographic pattern of the interfering beams. For silicon substrates, such coatings are typically multilayered and complex in composition. By thinning the photoresist layer to a thickness well below the quarter wavelength of the exposing beam, we demonstrate that interference gratings can be generated without an anti-reflection coating on the substrate. We used ammonium dichromate doped polyvinyl alcohol as the positive photoresist because it provides excellent pinhole free layers down to thicknesses of 40 nm, and can be cross-linked by a low-cost single mode 457 nm laser, and can be etched in water. Gratings with a period of 320 nm and depth of 4 nm were realized, as well as a variety of morphologies depending on the photoresist thickness. This simplified interference lithography technique promises to be useful for generating periodic nanostructures with high fidelity and minimal substrate treatments.

  17. A Molecular- and Nano-Electronics Test (MONET) platform fabricated using extreme ultraviolet lithography.

    SciTech Connect (OSTI)

    Dentinger, Paul M.; Cardinale, Gregory F.; Hunter, Luke L.; Talin, Albert Alec

    2003-12-01

    We describe the fabrication and characterization of an electrode array test structure, designed for electrical probing of molecules and nanocrystals. We use Extreme Ultraviolet Lithography (EUVL) to define the electrical test platform features. As fabricated, the platform includes nominal electrode gaps of 0 nm, 40 nm, 60 nm, and 80 nm. Additional variation in electrode gap is achieved by controlling the exposure conditions, such as dose and focus. To enable EUVL based nanofabrication, we develop a novel bi-level photoresist process. The bi-level photoresist consists of a combination of a commercially available polydimethylglutarimide (PMGI) bottom layer and an experimental EUVL photoresist top (imaging) layer. We measure the sensitivity of PMGI to EUV exposure dose as a function of photoresist pre-bake temperature, and using this data, optimize a metal lift-off process. Reliable fabrication of 700 Angstrom thick Au structures with sub-1000 Angstrom critical dimensions is achieved, even without the use of a Au adhesion layer, such as Ti. Several test platforms are used to characterize electrical properties of organic molecules deposited as self assembled monolayers.

  18. Science Engagement

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Engagement Science Engagement Move your data Programs & Workshops Science Requirements Reviews Case Studies Contact Us Technical Assistance: 1 800-33-ESnet (Inside US) 1 800-333-7638 (Inside US) 1 510-486-7600 (Globally) 1 510-486-7607 (Globally) Report Network Problems: trouble@es.net Provide Web Site Feedback: info@es.net Science Engagement The ESnet Science Engagement team's mission is to ensure that science collaborations at every scale, in every domain, have the information and

  19. Photon Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photo Gallery The latest photos from NNSA headquarters and across the nuclear security enterprise. The latest photos from NNSA headquarters and across the nuclear security enterprise. Visit us on Flickr

    science Photon Science Along with its primary missions-global security, energy security, basic science, and national competitiveness-the NIF & Photon Science Directorate also pursues research and development projects to innovate and develop cutting-edge technologies in support of those

  20. Science Briefs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    feed-image Digg: ALSBerkeleyLab Facebook Page: 208064938929 Flickr: advancedlightsource/albums Twitter: AdvLightSource YouTube: AdvancedLightSource Home Science Highlights Science Briefs Science Briefs ALS Science Briefs are short (250 words maximum) descriptions of recently published ALS-related work. These "brief" highlights also include one image, a caption (50 words), and the publication citation. All ALS users and beamline scientists are invited to fill out the short submission

  1. Big Science

    ScienceCinema (OSTI)

    Dr. Thomas Zacharia

    2010-01-08

    Big science seeks big solutions for the most urgent problems of our times. Video courtesy Cray, Inc.

  2. Science Digests

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science Digests Science Digests Our Science Digests embrace complex issues around our science, technologies, and mission in a series of mini-articles that provide a context for our historical approach, current problem solving and our vision for the future. Spatial partitioning for the ocean simulation data set. Data triage enables extreme-scale computing Data selection and triage are important techniques for large-scale data, which can drastically reduce the amount of data written to disk or

  3. Huazhong Science Technology University Yongtai Science Technology...

    Open Energy Info (EERE)

    Huazhong Science Technology University Yongtai Science Technology Co Ltd Jump to: navigation, search Name: Huazhong Science & Technology University Yongtai Science & Technology Co...

  4. Climate & Earth Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Human-Induced Climate Change Reduces Chance of Flooding in Okavango Delta Energy Science Engineering Science Environmental Science Fusion Science Math & Computer Science Nuclear...

  5. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Radiation Measurement (ARM) Science Team Meeting A description of the four ARM sites (BillingsBRS, E13, Manus and Nauru) currently included in the Baseline Surface Radiation...

  6. Amplified spontaneous emission in active channel waveguides produced by electron-beam lithography in LiF crystals

    SciTech Connect (OSTI)

    Montereali, R. M.; Piccinini, M.; Burattini, E.

    2001-06-25

    In this letter we report the observation of amplified spontaneous emission of the red light from LiF:F{sub 2} centers in active channel waveguides realized by electron-beam lithography in lithium fluoride crystals. Low pumping power densities have been used in quasi-continuous-wave regime at room temperature; the appreciable values of the gain coefficients, 4.67 cm{minus}1 with an exciting power density of 0.31 W/cm2 at 458 nm, make this material a good candidate for the realization of active integrated optical devices. {copyright} 2001 American Institute of Physics.

  7. Science Briefs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Briefs Science Briefs Read in detail about specific Los Alamos science achievements, and the honors our scientists are accruing. News Releases Science Briefs Photos Picture of the Week Publications Social Media Videos Fact Sheets Elizabeth Kelly Kelly named Fellow of the American Statistical Association The American Statistical Association (ASA) has honored Elizabeth Kelly with the title of Fellow. - 8/2/16 Beverly Aikin, left, and Ellen Cerreta Aikin and Cerreta named as ASM Fellows ASM

  8. Computational Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... Advanced Materials Laboratory Center for Integrated Nanotechnologies Combustion Research Facility Computational Science Research Institute Joint BioEnergy Institute About EC News ...

  9. Energy Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Materials Scientists are advancing the fundamental science of materials within the context of global energy-related challenges. They are developing experimental and theoretical...

  10. Information Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Information Science and Technology (ASIS&T) American Society for Indexing (ASI) Digital Library Federation (DLF) National Archives and Records Administration (NARA) Special...

  11. Science Museum

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Nanotechnology and algae biofuels exhibits open July 26 at the Bradbury Science Museum ... how nanoparticles work, while "Algae to Biofuels: Squeezing Power from Pond Scum," gives ...

  12. Demonstration of electronic pattern switching and 10x pattern demagnification in a maskless micro-ion beam reduction lithography system

    SciTech Connect (OSTI)

    Ngo, V.V.; Akker, B.; Leung, K.N.; Noh, I.; Scott, K.L.; Wilde, S.

    2002-05-31

    A proof-of-principle ion projection lithography (IPL) system called Maskless Micro-ion beam Reduction Lithography (MMRL) has been developed and tested at the Lawrence Berkeley National Laboratory (LBNL) for future integrated circuits (ICs) manufacturing and thin film media patterning [1]. This MMRL system is aimed at completely eliminating the first stage of the conventional IPL system [2] that contains the complicated beam optics design in front of the stencil mask and the mask itself. It consists of a multicusp RF plasma generator, a multi-beamlet pattern generator, and an all-electrostatic ion optical column. Results from ion beam exposures on PMMA and Shipley UVII-HS resists using 75 keV H+ are presented in this paper. Proof-of-principle electronic pattern switching together with 10x reduction ion optics (using a pattern generator made of nine 50-{micro}m switchable apertures) has been performed and is reported in this paper. In addition, the fabrication of a micro-fabricated pattern generator [3] on an SOI membrane is also presented.

  13. Materials Sciences Division 1990 annual report

    SciTech Connect (OSTI)

    Not Available

    1990-12-31

    This report is the Materials Sciences Division`s annual report. It contains abstracts describing materials research at the National Center for Electron Microscopy, and for research groups in metallurgy, solid-state physics, materials chemistry, electrochemical energy storage, electronic materials, surface science and catalysis, ceramic science, high tc superconductivity, polymers, composites, and high performance metals.

  14. Materials Sciences Division 1990 annual report

    SciTech Connect (OSTI)

    Not Available

    1990-01-01

    This report is the Materials Sciences Division's annual report. It contains abstracts describing materials research at the National Center for Electron Microscopy, and for research groups in metallurgy, solid-state physics, materials chemistry, electrochemical energy storage, electronic materials, surface science and catalysis, ceramic science, high tc superconductivity, polymers, composites, and high performance metals.

  15. Thermal Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Thermal Sciences NETL's Thermal Sciences competency provides the scientific, engineering, and technology development community with innovative and efficient approaches to measure, harness, and convert thermal energy. Research includes sensors, advanced energy concepts, and thermodynamic optimization, specifically: Sensors and Diagnostics Advanced sensor and diagnostic technology to develop and evaluate advanced methods for non-intrusive measurement and measurement in extreme environments.

  16. Science DMZ Case Studies

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science DMZ Case Studies Science DMZ @ UF Science DMZ @ CU Science DMZ @ Penn & VTTI Science DMZ @ NOAA Science DMZ @ NERSC Science DMZ @ ALS Multi-facility Workflow Case Study News & Publications ESnet News Publications and Presentations Galleries ESnet Awards and Honors Blog ESnet Live Home » Science Engagement » Case Studies » Science DMZ Case Studies Science Engagement Move your data Programs & Workshops Science Requirements Reviews Case Studies OSCARS Case Studies Science

  17. Tuning the interaction between propagating and localized surface plasmons for surface enhanced Raman scattering in water for biomedical and environmental applications

    SciTech Connect (OSTI)

    Shioi, Masahiko; Jans, Hilde; Lodewijks, Kristof; Van Dorpe, Pol; Lagae, Liesbet; Kawamura, Tatsuro

    2014-06-16

    With a view to biomedical and environmental applications, we investigate the plasmonic properties of a rectangular gold nanodisk array in water to boost surface enhanced Raman scattering (SERS) effects. To control the resonance wavelengths of the surface plasmon polariton and the localized surface plasmon, their dependence on the array period and diameter in water is studied in detail using a finite difference time domain method. A good agreement is obtained between calculated resonant wavelengths and those of gold nanodisk arrays fabricated using electron beam lithography. For the optimized structure, a SERS enhancement factor of 7.8 × 10{sup 7} is achieved in water experimentally.

  18. NREL: Energy Sciences - Chemical and Materials Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    in the U.S. Department of Energy (DOE) National Photovoltaic Program and DOE Basic Energy Sciences Program. Materials Science. The Materials Science Group's research...

  19. Basic Energy Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Basic Energy Sciences Basic Energy Sciences Supporing research to understand, predict and ... The DOE Office of Science's Basic Energy Sciences program equips scientists with a ...

  20. National Security Science Archive

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science NSS Archive National Security Science Latest Issue:July 2015 past issues All Issues submit National Security Science Archive National Security Science magazine...

  1. Science Magazine

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    & ANALYSIS www.sciencemag.org SCIENCE VOL 339 8 FEBRUARY 2013 635 Steven Chu, the fi rst Nobel-winning scien- tist to lead the sprawling U.S. Department of Energy (DOE), has rarely...

  2. Science Museum

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Nanotechnology and algae biofuels exhibits open July 26 at the Bradbury Science Museum July 22, 2013 LOS ALAMOS, N.M., July 22, 2013-Los Alamos National Laboratory's Bradbury Science Museum is opening two new exhibits July 26 as part of the Laboratory's 70th Anniversary celebration. One is a nanotechnology exhibit featuring the Laboratory's Center for Integrated Nanotechnologies (CINT) and the other is an algae biofuel exhibit from the Laboratory and the New Mexico Consortium. An opening

  3. Science Facilities

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Facilities Science Facilities The focal point for basic and applied R&D programs with a primary focus on energy but also encompassing medical, biotechnology, high-energy physics, and advanced scientific computing programs. Center for Integrated Nanotechnologies» Dual Axis Radiographic Hydrodynamic Test Facility (DARHT)» Electron Microscopy Lab» Ion Beam Materials Lab» Isotope Production Facility» Los Alamos Neutron Science Center» Lujan Center» Matter-Radiation Interactions in

  4. Measurement Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    wins 2016 Joseph F. Keithley Award for Advances in Measurement Science October 15, 2015 Honors to Albert Migliori, developer of resonant ultrasound spectroscopy LOS ALAMOS, N.M., Oct. 15, 2015-Los Alamos National Laboratory physicist Albert Migliori, having led the development of a powerful tool for important measurements in condensed matter physics including superconductivity, is being given the Joseph F. Keithley Award For Advances in Measurement Science, the top instrumentation prize of the

  5. Nuclear Science

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    and Engineering Education Sourcebook 2013 American Nuclear Society US Department of Energy Nuclear Science & Engineering Education Sourcebook 2013 North American Edition American Nuclear Society Education, Training, and Workforce Division US Department of Energy Office of Nuclear Energy Editor and Founder John Gilligan Professor of Nuclear Engineering North Carolina State University Version 5.13 Welcome to the 2013 Edition of the Nuclear Science and Engineering Education (NS&EE)

  6. Isotope Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science and Production 35 years of experience in isotope production, processing, and applications. Llllll Committed to the safe and reliable production of radioisotopes, products, and services. Contact: Kevin John LANL Isotope Program Manager kjohn@lanl.gov 505-667-3602 Sponsored by the Department of Energy National Isotope Program http://www.nuclear.energy.gov/isotopes/nelsotopes2a.html Isotopes for Environmental Science Isotopes produced at Los Alamos National Laboratory are used as

  7. Chemical Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Chemical Science Chemical Science Plant fatty acids are used in a vast range of products, from polymers to plastics and soaps to industrial feed stocks -- making up an estimated $150 billion market annually. A new discovery of inserting double bonds in the fatty acids could show the way to the designer production of plant fatty acids, and, in turn, to new industrial applications and new products. <a href

  8. Energy Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Energy Science Energy Science Print Our current fossil-fuel-based system is causing potentially catastrophic changes to our planet. The quest for renewable, nonpolluting sources of energy requires us to understand, predict, and ultimately control matter and energy at the electronic, atomic, and molecular levels. Light-source facilities-the synchrotrons of today and the next-generation light sources of tomorrow-are the scientific tools of choice for exploring the electronic and atomic structure

  9. Fermilab | Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    feature photo feature photo feature photo feature photo feature photo Science Navbar Toggle About Quick Info Science History Leadership and Organization Leadership Organizational chart Committees and Councils Photo and Video Gallery Diversity Education Safety Sustainability and Environment Contact Related Links DOE FRA UChicago URA Newsroom Spotlight Press releases Fact sheets and brochures symmetry Interactions.org Photo and video archive Resources for ... Employees Researchers, postdocs and

  10. Science & Technology

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Innovation Science & Innovation Mars Rover Curiosity Mars Rover Curiosity Mars Rover Curiosity landed safely on the planet's surface with an array of equipment powered with technology developed at the National Labs. Read more Dark Energy Cam Dark Energy Cam Fermilab's 570-megapixels, five-ton Dark Energy camera is expanding our understanding of the universe. Read more Celebrating the Higgs boson Celebrating the Higgs boson Scientists recently found evidence of the elusive particle that fills

  11. What Makes Science, Science? Research, Shared Effort ... & A...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Makes Science, Science? Research, Shared Effort ... & A New Office of Science Website What Makes Science, Science? Research, Shared Effort ... & A New Office of Science Website ...

  12. Defect reduction in epitaxial GaSb grown on nanopatterned GaAs substrates using full wafer block copolymer lithography

    SciTech Connect (OSTI)

    Jha, Smita; Liu, C.-C.; Nealey, P. F.; Kuech, T. F.; Kuan, T. S.; Babcock, S. E.; Park, J. H.; Mawst, L. J.

    2009-08-10

    Defect reduction in the large lattice mismatched system of GaSb on GaAs, {approx}7%, was accomplished using full wafer block copolymer (BCP) lithography. A self-assembled BCP mask layer was used to generate a hexagonal pattern of {approx}20 nm holes on {approx}40 nm centers in a 20 nm SiO{sub 2} layer. GaSb growth initially takes place selectively within these holes leading to a dense array of small, strain-relaxed epitaxial GaSb islands. The GaSb grown on the patterned SiO{sub 2} layer exhibits a reduction in the x-ray linewidth attributed to a decrease in the threading dislocation density when compared to blanket pseudomorphic film growth.

  13. Ecological Screening Values for Surface Water, Sediment, and...

    Office of Scientific and Technical Information (OSTI)

    Ecological Screening Values for Surface Water, Sediment, and Soil Friday, G. P. 54 ENVIRONMENTAL SCIENCES; SOILS; SURFACE WATERS; SEDIMENTS; ECOLOGICAL CONCENTRATION; ENVIRONMENTAL...

  14. Surface-Plasmon Enhanced Transparent Electrodes in Organic Photovoltaics

    SciTech Connect (OSTI)

    Reilly III, T. H.; van de Lagemaat, J.; Tenent, R. C.; Morfa, A. J.; Rowlen, K. L.

    2008-01-01

    Random silver nanohole films were created through colloidal lithography techniques and metal vapor deposition. The transparent electrodes were characterized by uv-visible spectroscopy and incorporated into an organic solar cell. The test cells were evaluated for solar power-conversion efficiency and incident photon-to-current conversion efficiency. The incident photon-to-current conversion efficiency spectra displayed evidence that a nanohole film with 92 nm diameter holes induces surface-plasmon-enhanced photoconversion. The nanohole silver films demonstrate a promising route to removing the indium tin oxide transparent electrode that is ubiquitous in organic optoelectronics.

  15. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    A New Hyperspectral Imaging Interferometer for Measurements of Surface Albedo Minnett, P.J.(a) and Sellar, R.G.(b), Rosenstiel School of Marine and Atmospheric Sciences, University of Miami (a), Florida Space Institute (b) Twelfth Atmospheric Radiation Measurement (ARM) Science Team Meeting Uncertainties in the bidirectional reflection coefficient of the surface is a major component of the errors in the measurements of the surface radiation budget. A new instrument will be presented that

  16. Princeton Plasma Physics Lab - Surface science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    in the complex edge region, an important research area in fusion energy research. "We're learning more and more that to some extent the edge is the dog that wags the tail of the...

  17. Surface science | Princeton Plasma Physics Lab

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Synthetic muscle experiment will likely return to Earth in March A synthetic muscle experiment on board the International Space Station (ISS) that was developed with the help of ...

  18. Ultrahigh density ferroelectric storage and lithography by high order ferroic switching

    DOE Patents [OSTI]

    Kalinin, Sergei V.; Baddorf, Arthur P.; Lee, Ho Nyung; Shin, Junsoo; Gruverman, Alexei L.; Karapetian, Edgar; Kachanov, Mark

    2007-11-06

    A method for switching the direction of polarization in a relatively small domain in a thin-film ferroelectric material whose direction of polarization is oriented normal to the surface of the material involves a step of moving an electrically-chargeable tip into contact with the surface of the ferroelectric material so that the direction of polarization in a region adjacent the tip becomes oriented in a preselected direction relative to the surface of the ferroelectric material. The tip is then pressed against the surface of the ferroelectric material so that the direction of polarization of the ferroelectric material within the area of the ferroelectric material in contact with the tip is reversed under the combined effect of the compressive influence of the tip and electric bias.

  19. Science Museum

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    stockpile stewardship focus of 70th anniversary lecture December 12, 2013 Last in year-long series of public talks at Bradbury Science Museum LOS ALAMOS, N.M., Dec. 12, 2013-The role Los Alamos National Laboratory plays in stockpile stewardship is the focus of the final 70th Anniversary Lecture Dec. 18 at the Bradbury Science Museum. Jon Ventura, Los Alamos's executive staff advisor to the Principal Associate Director for Weapons Programs, will give the talk beginning at 5:30 p.m. "For 70

  20. Science Museum

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Early social history of Los Alamos focus of 70th anniversary lecture at Bradbury Science Museum May 2, 2013 NMSU history professor Jon Hunner speaks May 8 LOS ALAMOS, N.M., May 2, 2013-The early social history of Los Alamos during Los Alamos National Laboratory's Manhattan Project beginnings will be discussed at a talk by Jon Hunner at 5:30 p.m., May 8 at the Laboratory's Bradbury Science Museum. The talk is part of the Laboratory's 70th anniversary lecture series. Hunner heads the Department of

  1. Science Museum

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Maintaining nuclear stability in times of transition focus of talk at Bradbury Science Museum January 9, 2014 First in series of evening lectures open to public LOS ALAMOS, N.M., Jan. 9, 2014-Los Alamos National Laboratory Senior Fellow Houston "Terry" Hawkins talks about the role that the nation's nuclear weapons stockpile plays in maintaining the nation's defense - and that of our allies - in a talk at 5:30 p.m., Jan. 15 at the Bradbury Science Museum. The talk is the first in a

  2. Science Museum

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Emerging threats to global security focus of March 12 talk at Bradbury Science Museum March 6, 2014 Terry Wallace to address Lab's role in helping the government meet national security challenges LOS ALAMOS, N.M., March 6, 2014-Terry Wallace, principal associate director for Global Security at Los Alamos National Laboratory, will talk about potential emerging threats in a lecture at 5:30 p.m., March 12 at the Bradbury Science Museum. The talk is the third in a series of evening lectures planned

  3. Science Highlights

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Highlights Science Highlights Science highlights feature research conducted by staff and users at the ALS. If a Power Point summary slide or a PDF handout of the highlight is available, you will find it linked beneath the highlight listing and on the highlight's page. You may also print a version of a highlight by clicking the print icon associated with each highlight. New Catalyst Boosts Selective Formation of Olefins from Syngas Print Wednesday, 10 August 2016 00:00 Experiments at the ALS have

  4. Molecular Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Materials Fundamentals Development and application of new computational and experimental approaches in the general areas of chemical synthesis, surface imaging and chemical ...

  5. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Cloud Radiative Forcing of the Arctic Surface: The Influence of Cloud Properties, Surface Albedo, and Solar Zenith Angle Shupe, M.D. and Intrieri, J.M., NOAA - Environmental Technology Laboratory Thirteenth Atmospheric Radiation Measurement (ARM) Science Team Meeting An annual cycle of cloud and radiation measurements made as part of the Surface Heat Budget of the Arctic program are utilized to determine which properties of Arctic clouds control the surface radiation balance. Surface cloud

  6. Chemistry and Materials Science progress report, FY 1994. Revision 2

    SciTech Connect (OSTI)

    NONE

    1996-01-01

    Thrust areas of the weapons-supporting research include surface science, fundamentals of the physics and processing of metals, energetic materials, etc. The laboratory directed R and D include director`s initiatives, individual projects, and transactinium science studies.

  7. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell; Shafer, David R.

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receive a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

  8. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell

    2000-01-01

    An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.

  9. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 .mu.m.

  10. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell; Shafer, David

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

  11. ORISE: Forensic Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Forensic Science Forensic Science The Oak Ridge Institute for Science and Education (ORISE) provides direct forensic analytical support, consulting and training services to United...

  12. National Security Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science National Security Science Latest Issue:July 2015 past issues All Issues submit National Security Science Showcasing Los Alamos National Laboratory's work on nuclear...

  13. Nuclear Science & Technology

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Nuclear Science & Technology Nuclear Science & Technology1354608000000Nuclear Science & TechnologySome of these resources are LANL-only and will require Remote Access. No...

  14. Top Science of 2013

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Liquid-scanning technology boosts airport security science-innovationassetsimagesicon-science.jpg Top Science of 2013 Our strong interdisciplinary teaming and unique research...

  15. Top Science of 2013

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    RAPTOR telescope witnesses black hole birth science-innovationassetsimagesicon-science.jpg Top Science of 2013 Our strong interdisciplinary teaming and unique research...

  16. Fire Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science - Sandia Energy Energy Search Icon Sandia Home Locations Contact Us Employee Locator Energy & Climate Secure & Sustainable Energy Future Stationary Power Energy Conversion Efficiency Solar Energy Wind Energy Water Power Supercritical CO2 Geothermal Natural Gas Safety, Security & Resilience of the Energy Infrastructure Energy Storage Nuclear Power & Engineering Grid Modernization Battery Testing Nuclear Energy Defense Waste Management Programs Advanced Nuclear Energy

  17. Science Pillars

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Pillars Harnessing our scientific capabilities for national security solutions Los Alamos National Laboratory LA-UR-15-27068 Benefits of the Science Pillars The Laboratory's greatest strength is in our multidisciplinary capabilities. The Pillars draw on these capabilities- across traditional organizational and disciplinary boundaries-to help us accomplish our missions. The LDRD Strategic Investment Plan is built around the Pillars. The Laboratory's External Reviews are organized by Pillar.

  18. Discovery Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    universe Discovery Science Since the beginning of civilization, humans have marveled at the night sky and pondered the vast stretches of the universe. The invention of telescopes in the 17th century revealed the first details of the Moon and the planets in our solar system. Four hundred years later, space-based observatories such as NASA's Hubble and Kepler regularly capture amazing vistas of billions of galaxies millions of light years away. Despite these advances, astronomers have only been

  19. Information Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    3 Information Sciences Uncovering actionable knowledge and generating insight into exascale datasets from heterogeneous sources in real time Leadership Group Leader Amy Larson (Acting) Email Deputy Group Leader Gowri Srinivasan (Acting) Email Contact Us Administrator Yvonne McKelvey Email Conceptual illustration of futuristic data stream processing. Developing methods and tools for understanding complex interactions and extracting actionable information from massive data streams. Basic and

  20. Bradbury Science Museum - Science on Wheels

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    science, technology, engineering and mathematics and promote public understanding and ... science, technology, engineering and mathematics, and the work of Los Alamos National ...

  1. Science DMZ Implemented at NERSC

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    NERSC Science Engagement Move your data Programs & Workshops Science Requirements Reviews Case Studies OSCARS Case Studies Science DMZ Case Studies Science DMZ @ UF Science DMZ @ ...

  2. Efficient Coupling and Transport of a Surface Plasmon at 780 nm in a Gold Nanostructure

    SciTech Connect (OSTI)

    Gong, Yu; Joly, Alan G.; El-Khoury, Patrick Z.; Hess, Wayne P.

    2015-08-28

    We studied plasmonic nanostructures in single-crystal gold with scanning electron and femtosecond photoemission electron microscopies. We designed an integrated laser coupling and nanowire waveguide structure by focused ion beam lithography in single-crystal gold flakes. The photoemission results show that the laser field is efficiently coupled into a propagating surface plasmon by a simple hole structure and propagates efficiently in an adjacent nano-bar waveguide. A strong local field is created by the propagating surface plasmon at the nano-bar tip. A similar structure, with a decreased waveguide width and thickness, displayed significantly more intense photoemission indicating enhanced local electric field at the sharper tip.

  3. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Preferred Modes of Surface-Atmosphere Interaction in the Polar Regions Stramler, K.L.(a), Del Genio, A.D.(b), and Rossow, W.B.(b), Department of Earth and Environmental Sciences,...

  4. Life sciences and environmental sciences

    SciTech Connect (OSTI)

    Not Available

    1992-02-01

    The DOE laboratories play a unique role in bringing multidisciplinary talents -- in biology, physics, chemistry, computer sciences, and engineering -- to bear on major problems in the life and environmental sciences. Specifically, the laboratories utilize these talents to fulfill OHER`s mission of exploring and mitigating the health and environmental effects of energy use, and of developing health and medical applications of nuclear energy-related phenomena. At Lawrence Berkeley Laboratory (LBL) support of this mission is evident across the spectrum of OHER-sponsored research, especially in the broad areas of genomics, structural biology, basic cell and molecular biology, carcinogenesis, energy and environment, applications to biotechnology, and molecular, nuclear and radiation medicine. These research areas are briefly described.

  5. Life sciences and environmental sciences

    SciTech Connect (OSTI)

    Not Available

    1992-02-01

    The DOE laboratories play a unique role in bringing multidisciplinary talents -- in biology, physics, chemistry, computer sciences, and engineering -- to bear on major problems in the life and environmental sciences. Specifically, the laboratories utilize these talents to fulfill OHER's mission of exploring and mitigating the health and environmental effects of energy use, and of developing health and medical applications of nuclear energy-related phenomena. At Lawrence Berkeley Laboratory (LBL) support of this mission is evident across the spectrum of OHER-sponsored research, especially in the broad areas of genomics, structural biology, basic cell and molecular biology, carcinogenesis, energy and environment, applications to biotechnology, and molecular, nuclear and radiation medicine. These research areas are briefly described.

  6. ARM Best Estimate Data (ARMBE) Products for Climate Science for...

    Office of Scientific and Technical Information (OSTI)

    Language: English Subject: 54 Environmental Sciences ARM; ARMBE; CSSEF; precipitation rate; Horizontal wind; Air Temperature; Relative Humidity; Surface Air Pressure Dataset File ...

  7. Science and Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science and Innovation Science and Innovation Our strong interdisciplinary teaming and unique research facilities allow us to develop solutions to complex problems, and to support partners and collaborators, all with the goal of strengthening national security and making a safer world. Science & Engineering Capabilities» Science Programs» Science Facilities» Features» Science Pillars» Faces of Science The people behind our science Radical Supercomputing Extreme speeds, big data,

  8. Science Brief Submission Form

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    Science Brief Submission Form Science Brief Submission Form Print Tuesday, 01 May 2007 00:00 Loading... < Prev

  9. Impact of polymer film thickness and cavity size on polymer flow during embossing : towards process design rules for nanoimprint lithography.

    SciTech Connect (OSTI)

    Schunk, Peter Randall; King, William P. (Georgia Institute of Technology, Atlanta, GA); Sun, Amy Cha-Tien; Rowland, Harry D.

    2006-08-01

    This paper presents continuum simulations of polymer flow during nanoimprint lithography (NIL). The simulations capture the underlying physics of polymer flow from the nanometer to millimeter length scale and examine geometry and thermophysical process quantities affecting cavity filling. Variations in embossing tool geometry and polymer film thickness during viscous flow distinguish different flow driving mechanisms. Three parameters can predict polymer deformation mode: cavity width to polymer thickness ratio, polymer supply ratio, and Capillary number. The ratio of cavity width to initial polymer film thickness determines vertically or laterally dominant deformation. The ratio of indenter width to residual film thickness measures polymer supply beneath the indenter which determines Stokes or squeeze flow. The local geometry ratios can predict a fill time based on laminar flow between plates, Stokes flow, or squeeze flow. Characteristic NIL capillary number based on geometry-dependent fill time distinguishes between capillary or viscous driven flows. The three parameters predict filling modes observed in published studies of NIL deformation over nanometer to millimeter length scales. The work seeks to establish process design rules for NIL and to provide tools for the rational design of NIL master templates, resist polymers, and process parameters.

  10. Science Magazine

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    MAY 2013 VOL 340 SCIENCE www.sciencemag.org 914 EIGHT NUCLEAR ENGINEERS SIT IN HIGH- backed leather chairs, their laptop comput- ers perched on sleek wood consoles. The lights are so low that the corners of the room fade to black. Up front, a roomwide video screen shows a half-dozen other researchers from locations around the country. A cryptic conversation rattles on: "Rod, we have to be careful. Right now the Cobra to de Novo isn't even using DTK." Welcome to the Consortium for

  11. Science Summary

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    fe-s image » Links Scientific Highlight Peters Lab MSU News e! Science News Physorg.com » Share this Article Laboratree Ologeez SciLink LabSpaces The Structure of an Algal Hydrogenase Reveals the Assembly and Evolution of Complex Metalloenzymes summary written by Raven Hanna The potential for using biological enzymes to make hydrogen to use as a renewable energy source is a hot topic, but little is known about how these complex enzymes assemble and work. The [FeFe]-hydrogenase enzyme binds

  12. Science Summary

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    H1N1 Flu » Links Scientific Highlight Wilson Lab Scripps Press Release Scripps Philanthrophy Science Magazine Vanderbilt Reporter » Share this Article Laboratree Ologeez SciLink LabSpaces Structural Basis for Senior Immunity to the Current H1N1 Flu summary written by Raven Hanna An unusual property of the last year's H1N1 "swine flu" virus pandemic is that it disproportionately affected the young. People over the age of around 65 showed much less vulnerability than to more typical

  13. Science Cafe

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    Cafés Science Cafe April 27, 2015-Special ALS Colloquium Print Wednesday, 22 April 2015 13:19 Special Event on Monday, April 27 @ 12 noon, USB 15-253 X-Ray Microscopy: The First 120 Years Janos Kirz, ALS Abstract Röntgen's great discovery became an instant public sensation. Fascination with the "new kind of rays" that could reveal the structure of opaque objects swept the world in 1896. Fifty years later it was widely recognized that the short wavelength of the radiation should open

  14. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Annual Cycle of the Surface Energy Balance at SHEBA Fairall, C.W., Persson, P.O.G., Andreas, E.A., and Guest, P., National Oceanic and Atmospheric Administration-Environmental Technology Laboratory Ninth Atmospheric Radiation Measurement (ARM) Science Team Meeting The Surface Heat Budget of the Arctic Ocean (SHEBA) surface flux group made direct measurements of all components of the surface heat balance at the SHEBA ice camp. In this paper, we will show the smoothed balance and components from

  15. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Improved Surface Emissivities Derived from Multispectral Satellite Data Over the ARM SGP Smith, W.L., Jr., Minnis, P., and Young, D.F., NASA Langley Research Center Eleventh Atmospheric Radiation Measurement (ARM) Science Team Meeting Surface emissivity is an important parameter for many remote sensing applications but is difficult to determine because it requires an accurate specification of the surface skin temperature. Because of this, laboratory estimates of the emissivity of pure surfaces

  16. ARM - Publications: Science Team Meeting Documents

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    The Influence of Clouds on the Arctic Surface Intrieri, J.M.(a) and Shupe, M.D.(b), NOAA/Environmental Technology Laboratory (a), STC/NOAA/Environmental Technology Laboratory (b) Twelfth Atmospheric Radiation Measurement (ARM) Science Team Meeting SHEBA observations of Arctic cloud and surface fluxes were used to determine surface cloud radiative forcing over an annual cycle. Cloud amount and phase had the largest influence on the magnitude of surface forcing in both winter and summer while

  17. FWP executive summaries: Basic energy sciences materials sciences programs

    SciTech Connect (OSTI)

    Not Available

    1990-02-01

    The BES Materials Science program at Sandia Albuquerque has the central theme of Scientifically Tailored Materials. The major objective of this program is to combine Sandia's expertise and capabilities in the areas of solid state sciences, advanced atomic-level diagnostics and materials-processing science to produce new classes of tailorable materials for the US energy industry, the electronics industry and for defense needs. Current research in this program includes the physics and chemistry of ceramics, the use of energetic particles for the synthesis and study of materials, high-temperature and organic superconductors, tailored surfaces for materials applications, chemical vapor deposition sciences, strained-layer semiconductors, advanced growth techniques for improved semiconductor structures and boron-rich very high temperature semiconductors. A new start just getting underway deals with the atomic level science of interfacial adhesion. Our interdisciplinary program utilizes a broad array of sophisticated, state-of-the-art experimental capabilities provided by other programs. The major capabilities include several molecular-beam epitaxy and chemical-vapor-deposition facilities, electron- and ion-beam accelerators, laser-based diagnostics, advanced surface spectroscopies, unique combined high-pressure/low-temperature/high-magnetic-field facilities, and the soon to be added scanning tunneling and atomic force microscopies.

  18. Basic Energy Sciences Materials Sciences programs: FWP executive summaries

    SciTech Connect (OSTI)

    Vook, F.L.; Samara, G.A.

    1989-02-01

    The goals of our Basic Energy Sciences (BES) Materials Science Program at Sandia are: (1) Perform basic, forefront interdisciplinary research using the capabilities of several organizations. (2) Choose programs broadly complementary to Sandia's weapons laboratory mission, but separably identifiable. (3) Perform research in a setting which enhances technological impact because of Sandia's spectrum of basic research, applied research and development engineering. (4) Use large, capital-intensive research facilities not usually found at universities. The BES Materials Science program at Sandia Albuquerque has the central theme of Scientifically Tailored Materials. The major objective of this program is to combine Sandia's expertise and capabilities in the areas of solid state sciences, advanced atomic-level diagnostics, and materials-processing science to produce new classes of tailorable materials for the US energy industry, the electronics industry and for defense needs. Current research in this program includes ion-implantation-modified materials, physics and chemistry of ceramics, tailored surfaces for materials applications, strained-layer semiconductors, chemical vapor deposition, surface photo kinetics, organic and high-temperature superconductors, advanced growth techniques for improved semiconductor structures and boron-rich very high temperature semiconductors.

  19. Surface figure control for coated optics

    DOE Patents [OSTI]

    Ray-Chaudhuri, Avijit K.; Spence, Paul A.; Kanouff, Michael P.

    2001-01-01

    A pedestal optical substrate that simultaneously provides high substrate dynamic stiffness, provides low surface figure sensitivity to mechanical mounting hardware inputs, and constrains surface figure changes caused by optical coatings to be primarily spherical in nature. The pedestal optical substrate includes a disk-like optic or substrate section having a top surface that is coated, a disk-like base section that provides location at which the substrate can be mounted, and a connecting cylindrical section between the base and optics or substrate sections. The optic section has an optical section thickness.sup.2 /optical section diameter ratio of between about 5 to 10 mm, and a thickness variation between front and back surfaces of less than about 10%. The connecting cylindrical section may be attached via three spaced legs or members. However, the pedestal optical substrate can be manufactured from a solid piece of material to form a monolith, thus avoiding joints between the sections, or the disk-like base can be formed separately and connected to the connecting section. By way of example, the pedestal optical substrate may be utilized in the fabrication of optics for an extreme ultraviolet (EUV) lithography imaging system, or in any optical system requiring coated optics and substrates with reduced sensitivity to mechanical mounts.

  20. Lunar and Planetary Science Conference

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    science sleuth on the trail of a martian mystery March 19, 2013 EMBARGOED: Until 5 p.m. MDT, March 19, 2013Poster Session T617, Poster #246, 44 th Lunar and Planetary Science Conference Postdoctoral researcher sees promise in data from cutting room floor THE WOODLANDS, Texas, March 19, 2013 - When it comes to examining the surface of rocks on Mars with a high-powered laser, five is a magic number for Los Alamos National Laboratory postdoctoral researcher Nina Lanza. During a poster session today

  1. Science Summary

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    6, 2009 » Links Scientific Highlight Duckworth Research Sposito Research SSRL MEIS » Share this Article Laboratree Ologeez SciLink LabSpaces The Competition for Iron Impacts the Global Carbon Cycle Phytoplankton are microorganisms that live in the ocean surface waters and are important because they act as lungs for the planet, consuming carbon dioxide and producing oxygen. Phytoplankton account for an astounding 50% of the total biological uptake (or sequestration) of carbon dioxide annually.

  2. Printability and inspectability of programmed pit defects on teh masks in EUV lithography

    SciTech Connect (OSTI)

    Kang, I.-Y.; Seo, H.-S.; Ahn, B.-S.; Lee, D.-G.; Kim, D.; Huh, S.; Koh, C.-W.; Cha, B.; Kim, S.-S.; Cho, H.-K.; Mochi, I.; Goldberg, K. A.

    2010-03-12

    Printability and inspectability of phase defects in ELlVL mask originated from substrate pit were investigated. For this purpose, PDMs with programmed pits on substrate were fabricated using different ML sources from several suppliers. Simulations with 32-nm HP L/S show that substrate pits with below {approx}20 nm in depth would not be printed on the wafer if they could be smoothed by ML process down to {approx}1 nm in depth on ML surface. Through the investigation of inspectability for programmed pits, minimum pit sizes detected by KLA6xx, AIT, and M7360 depend on ML smoothing performance. Furthermore, printability results for pit defects also correlate with smoothed pit sizes. AIT results for pattemed mask with 32-nm HP L/S represents that minimum printable size of pits could be {approx}28.3 nm of SEVD. In addition, printability of pits became more printable as defocus moves to (-) directions. Consequently, printability of phase defects strongly depends on their locations with respect to those of absorber patterns. This indicates that defect compensation by pattern shift could be a key technique to realize zero printable phase defects in EUVL masks.

  3. Science DMZ for ALS

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ALS Science Engagement Move your data Programs & Workshops Science Requirements Reviews Case Studies OSCARS Case Studies Science DMZ Case Studies Science DMZ @ UF Science DMZ @ CU Science DMZ @ Penn & VTTI Science DMZ @ NOAA Science DMZ @ NERSC Science DMZ @ ALS Multi-facility Workflow Case Study Contact Us Technical Assistance: 1 800-33-ESnet (Inside US) 1 800-333-7638 (Inside US) 1 510-486-7600 (Globally) 1 510-486-7607 (Globally) Report Network Problems: trouble@es.net Provide Web

  4. Faces of Science

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    Science Faces of Science Meet the scientists behind the science at Los Alamos. Many of them felt a calling to science at an early age...now they work at a world-class research facility where childhood dreams may become reality. Faces of Science 70 Years of Innovations 50 Years of Space LANL Top Science 2014 Top Ten Innovations of 2013 Energy Sustainability Radical Supercomputing Science Digests FACES OF SCIENCE The people behind our science x x MATHEMATICS Polish scientist Stanislaw Ulam found

  5. BES Science Network Requirements

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Network Requirements Report of the Basic Energy Sciences Network Requirements Workshop Conducted June 4-5, 2007 BES Science Network Requirements Workshop Basic Energy Sciences Program Office, DOE Office of Science Energy Sciences Network Washington, DC - June 4 and 5, 2007 ESnet is funded by the US Dept. of Energy, Office of Science, Advanced Scientific Computing Research (ASCR) program. Dan Hitchcock is the ESnet Program Manager. ESnet is operated by Lawrence Berkeley National Laboratory, which

  6. Basic Energy Sciences Reports

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Basic Energy Sciences Reports Basic Energy Sciences Reports The list below of Basic Energy Sciences workshop reports addresses the status of some important research areas that can help identify research directions for a decades-to-century materials and energy strategy. Basic Energy Sciences (BES) Workshop Reports The Energy Challenges Report: New Science for a Secure and Sustainable Energy Future This Basic Energy Sciences Advisory Committee (BESAC) report summarizes a 2008 study by the

  7. Materials Science and Technology

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    MST Materials Science and Technology Providing world-leading, innovative, and agile materials science and technology solutions for national security missions. MST is metallurgy. The Materials Science and Technology Division provides scientific and technical leadership in materials science and technology for Los Alamos National Laboratory. READ MORE MST is engineered materials. The Materials Science and Technology Division provides scientific and technical leadership in materials science and

  8. Capabilities: Science Pillars

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    Pillars Capabilities: Science Pillars The Lab's four Science Pillars harness our scientific capabilities for national security solutions. What are the Los Alamos National Laboratory's Science Pillars? The Laboratory has established the Science Pillars under four main themes to bring together the Laboratory's diverse array of scientific capabilities and expertise: Information, Science, and Technology Pillar Materials for the Future Pillar Nuclear and Particle Futures Pillar Science of Signatures

  9. Bradbury Science Museum

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    Renewable energy is focus of New Science on Wheels programs offered by Bradbury Science Museum September 21, 2010 Los Alamos National Laboratory is taking science on the road to area schools LOS ALAMOS, New Mexico, September 23, 2010-Los Alamos National Laboratory's Bradbury Science Museum Science on Wheels educational program is offering new, renewable energy-related workshops during the 2010-11 school year. The classes are designed to generate interest in science and renewable energy by

  10. Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces

    DOE Patents [OSTI]

    Malinowski, Michael E.

    2005-01-25

    The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632.8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.