National Library of Energy BETA

Sample records for lithography surface science

  1. High resolution imaging and lithography using interference of light and surface plasmon waves

    E-Print Network [OSTI]

    Kim, Yang-Hyo

    2007-01-01

    The resolution of optical imaging and lithography is limited by the wave nature of light. Studies have been undertaken to overcome the diffraction limit for imaging and lithography. In our lab, the standing wave surface ...

  2. Multilayer resist methods for nanoimprint lithography on nonflat surfaces Xiaoyun Sun, Lei Zhuang,a)

    E-Print Network [OSTI]

    American Vacuum Society. S0734-211X 98 10106-3 I. INTRODUCTION Nanoimprint lithography NIL , a new approach of modifying the resist's chemical properties with radiation as in conventional lithography.1 NIL has issue for NIL to become a major li- thography tool is to imprint on nonflat surfaces. This article

  3. Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies

    E-Print Network [OSTI]

    Krchnavek, Robert R.

    Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam-dipole resonant filters by direct-write electron-beam and nanoimprint lithographies. Such structures have been-write electron electron- beam lithography DEBL . Since DEBL is based on expo- sure of the resist point by point

  4. Maskless lithography

    DOE Patents [OSTI]

    Sweatt, William C. (Albuquerque, NM); Stulen, Richard H. (Livermore, CA)

    1999-01-01

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

  5. Maskless lithography

    DOE Patents [OSTI]

    Sweatt, W.C.; Stulen, R.H.

    1999-02-09

    The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides. 12 figs.

  6. Chains of quantum dot molecules grown on Si surface pre-patterned by ion-assisted nanoimprint lithography

    SciTech Connect (OSTI)

    Smagina, Zh. V.; Stepina, N. P., E-mail: stepina@isp.nsc.ru; Zinovyev, V. A.; Kuchinskaya, P. A. [Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Lavrenteva 13, 630090 Novosibirsk (Russian Federation); Novikov, P. L.; Dvurechenskii, A. V. [Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Lavrenteva 13, 630090 Novosibirsk (Russian Federation); Novosibirsk State University, Pirogova, 2, 630090 Novosibirsk (Russian Federation)

    2014-10-13

    An original approach based on the combination of nanoimprint lithography and ion irradiation through mask has been developed for fabrication of large-area periodical pattern on Si(100). Using the selective etching of regions amorphized by ion irradiation ordered structures with grooves and ridges were obtained. The shape and depth of the relief were governed by ion energy and by the number of etching stages as well. Laterally ordered chains of Ge quantum dots were fabricated by molecular beam epitaxy of Ge on the pre-patterned Si substrates. For small amount of Ge deposited chains contain separate quantum dot molecules. The increase of deposition amount leads to overlapping of quantum dot molecules with formation of dense homogeneous chains of quantum dots. It was shown that the residual irradiation-induced bulk defects underneath the grooves suppress nucleation of Ge islands at the bottom of grooves. On pre-patterned substrates with whole defect regions, etched quantum dots grow at the bottom of grooves. The observed location of Ge quantum dots is interpreted in terms of local strain-mediated surface chemical potential which controls the sites of islands nucleation. The local chemical potential is affected by additional strain formed by the residual defects. It was shown by molecular dynamics calculations that these defects form the compressive strain at the bottom of grooves.

  7. VUV lithography

    DOE Patents [OSTI]

    George, Edward V. (Livermore, CA); Oster, Yale (Danville, CA); Mundinger, David C. (Stockton, CA)

    1990-01-01

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1700-1300A using xenon, krypton or argon; shorter wavelengths of 850-650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask.

  8. VUV lithography

    DOE Patents [OSTI]

    George, E.V.; Oster, Y.; Mundinger, D.C.

    1990-12-25

    Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask. 6 figs.

  9. Contact thermal lithography

    E-Print Network [OSTI]

    Schmidt, Aaron Jerome, 1979-

    2004-01-01

    Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used ...

  10. Automation of soft lithography

    E-Print Network [OSTI]

    Kim, Hyung-Jun

    2006-01-01

    This dissertation is a final documentation of the project whose goal is demonstrating manufacturability of soft lithography. Specifically, our target is creating micron scale patterns of resists on a 3 square inch, relatively ...

  11. Surface coatings. Science and technology

    SciTech Connect (OSTI)

    Paul, S.

    1985-01-01

    This book covers the coating field from the latest industry developments to current energy and pollution regulations. It explains the composition of coatings, how they are prepared and applied and the factors that control their ultimate performance. The author discusses the synthesis of polymeric binders, industrial resins, pigments, paints and paint properties, types of coatings, and new technologies. CONTENTS: Binders: Synthesis of Polymeric Binders; Industrial Resins; Pigments; Paints and Paint Properties: Pigment Dispersion; Surface Preparation and Paint Application; Paint Properties and Their Evaluation; Types of Coatings; New Technolgies.

  12. Maskless, resistless ion beam lithography

    SciTech Connect (OSTI)

    Ji, Qing

    2003-03-10

    As the dimensions of semiconductor devices are scaled down, in order to achieve higher levels of integration, optical lithography will no longer be sufficient for the needs of the semiconductor industry. Alternative next-generation lithography (NGL) approaches, such as extreme ultra-violet (EUV), X-ray, electron-beam, and ion projection lithography face some challenging issues with complicated mask technology and low throughput. Among the four major alternative NGL approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. As such, it can potentially make nano-fabrication much simpler. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for high-volume production. In order to achieve maskless, resistless patterning, the ion source must be able to produce a variety of ion species. The compact FIB system being developed uses a multicusp plasma ion source, which can generate ion beams of various elements, such as O{sub 2}{sup +}, BF{sub 2}{sup +}, P{sup +} etc., for surface modification and doping applications. With optimized source condition, around 85% of BF{sub 2}{sup +}, over 90% of O{sub 2}{sup +} and P{sup +} have been achieved. The brightness of the multicusp-plasma ion source is a key issue for its application to maskless ion beam lithography. It can be substantially improved by optimizing the source configuration and extractor geometry. Measured brightness of 2 keV He{sup +} beam is as high as 440 A/cm{sup 2} {center_dot} Sr, which represents a 30x improvement over prior work. Direct patterning of Si thin film using a focused O{sub 2}{sup +} ion beam has been investigated. A thin surface oxide film can be selectively formed using 3 keV O{sub 2}{sup +} ions with the dose of 10{sup 15} cm{sup -2}. The oxide can then serve as a hard mask for patterning of the Si film. The process flow and the experimental results for directly patterned poly-Si features are presented. The formation of shallow pn-junctions in bulk silicon wafers by scanning focused P{sup +} beam implantation at 5 keV is also presented. With implantation dose of around 10{sup 16} cm{sup -2}, the electron concentration is about 2.5 x 10{sup 18} cm{sup -3} and electron mobility is around 200 cm{sup 2}/V{center_dot}s. To demonstrate the suitability of scanning FIB lithography for the manufacture of integrated circuit devices, SOI MOSFET fabrication using the maskless, resistless ion beam lithography is demonstrated. An array of microcolumns can be built by stacking multi-aperture electrode and insulator layers. Because the multicusp plasma source can achieve uniform ion density over a large area, it can be used in conjunction with the array of microcolumns, for massively parallel FIB processing to achieve reasonable exposure throughput.

  13. Applied Surface Science 302 (2014) 231235 Contents lists available at ScienceDirect

    E-Print Network [OSTI]

    Peinke, Joachim

    2014-01-01

    of processing techniques such as stamping, stereo lithography, two-photon poly- merization, electrospinning

  14. Development of a microfluidic device for patterning multiple species by scanning probe lithography 

    E-Print Network [OSTI]

    Rivas Cardona, Juan Alberto

    2009-06-02

    Scanning Probe Lithography (SPL) is a versatile nanofabrication platform that leverages microfluidic “ink” delivery systems with Scanning Probe Microscopy (SPM) for generating surface-patterned chemical functionality on ...

  15. Electron Beam Lithography

    E-Print Network [OSTI]

    Sandini, Giulio

    Electron Beam Lithography Marco Salerno #12;Outline · general lithographic concepts · EBL www.cnf.cornell.edu/SPIEBook/SPIE1.HTM #12;Typical Electron Beam Column Zeiss GeminiTM column Types of Electron Beam Columns · no e- cross over no Boersch-effect (additional energy spread) · beam booster

  16. Programmable imprint lithography template

    DOE Patents [OSTI]

    Cardinale, Gregory F. (Oakland, CA); Talin, Albert A. (Livermore, CA)

    2006-10-31

    A template for imprint lithography (IL) that reduces significantly template production costs by allowing the same template to be re-used for several technology generations. The template is composed of an array of spaced-apart moveable and individually addressable rods or plungers. Thus, the template can be configured to provide a desired pattern by programming the array of plungers such that certain of the plungers are in an "up" or actuated configuration. This arrangement of "up" and "down" plungers forms a pattern composed of protruding and recessed features which can then be impressed onto a polymer film coated substrate by applying a pressure to the template impressing the programmed configuration into the polymer film. The pattern impressed into the polymer film will be reproduced on the substrate by subsequent processing.

  17. Neon Ion Beam Lithography (NIBL)

    E-Print Network [OSTI]

    Winston, Donald

    Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. ...

  18. Low-cost interference lithography

    E-Print Network [OSTI]

    Fucetola, Corey P.

    The authors report demonstration of a low-cost ( ? 1000 USD) interference lithography system based on a Lloyd’s mirror interferometer that is capable of ? 300?nm pitch patterning. The components include only a 405?nm GaN ...

  19. Tailoring Nanostructures Using Copolymer Nanoimprint Lithography

    E-Print Network [OSTI]

    Pascal Thebault; Stefan Niedermayer; Stefan Landis; Nicolas Chaix; Patrick Guenoun; Jean Daillant; Xingkun Man; David Andelman; Henri Orland

    2012-07-12

    Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work, we report on a novel technique to direct self-assembled structures of block copolymers by NanoImprint Lithography. Surface energy of a reusable mold and nanorheology are used to organize the copolymers in defect-free structures over tens of micrometers in size. Versatile and controlled in-plane orientations of about 25 nm half-period lamellar nanostructures are achieved and, in particular, include applications to circular tracks of magnetic reading heads.

  20. Tailoring Nanostructures Using Copolymer Nanoimprint Lithography

    E-Print Network [OSTI]

    Thebault, Pascal; Landis, Stefan; Chaix, Nicolas; Guenoun, Patrick; Daillant, Jean; Man, Xingkun; Andelman, David; Orland, Henri

    2012-01-01

    Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work, we report on a novel technique to direct self-assembled structures of block copolymers by NanoImprint Lithography. Surface energy of a reusable mold and nanorheology are used to organize the copolymers in defect-free structures over tens of micrometers in size. Versatile and controlled in-plane orientations of about 25 nm half-period lamellar nanostructures are achieved and, in particular, include applications to circular tracks of magnetic reading heads.

  1. Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters

    E-Print Network [OSTI]

    Krchnavek, Robert R.

    Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters Ryan W-DLC is used as a NIL imprinter coating to provide this durable antiwear, antistick layer. Previous works10,11 have shown that DLC is a durable coating with a low surface energy 40 mJ/m2 . The fluorinated self

  2. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    Table 1. Relation oC electrochemistry to ERDA's mission.research background: electrochemistry, metallurgy- ceramics,surface physics. electrochemistry, metallurgy, Table 4.

  3. Extreme ultraviolet lithography machine

    DOE Patents [OSTI]

    Tichenor, Daniel A. (Castro Valley, CA); Kubiak, Glenn D. (Livermore, CA); Haney, Steven J. (Tracy, CA); Sweeney, Donald W. (San Ramon, CA)

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  4. Development of an immersion maskless lithography system

    E-Print Network [OSTI]

    Chao, David, Ph. D. Massachusetts Institute of Technology

    2005-01-01

    As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use ...

  5. Surface science | Princeton Plasma Physics Lab

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservationBio-Inspired Solar Fuel Production 1: TotalofSupplySurface Soil Surface Soil

  6. Science Highlight December 2010 Electrochemical Surface Science: Hard X-rays Probe Fuel Cell Model Catalyst

    E-Print Network [OSTI]

    Wechsler, Risa H.

    Science Highlight ­ December 2010 Electrochemical Surface Science: Hard X-rays Probe Fuel Cell. Proton exchange membrane fuel cells (PEMFCs) are promising power sources since they can generate distribution network. Large-scale deployment of fuel cells, however, has been hampered by cost and performance

  7. Maskless, reticle-free, lithography

    DOE Patents [OSTI]

    Ceglio, Natale M. (Livermore, CA); Markle, David A. (Saratoga, CA)

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies.

  8. Maskless, reticle-free, lithography

    DOE Patents [OSTI]

    Ceglio, N.M.; Markle, D.A.

    1997-11-25

    A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies. 7 figs.

  9. Membrane projection lithography

    SciTech Connect (OSTI)

    Burckel, David Bruce; Davids, Paul S; Resnick, Paul J; Draper, Bruce L

    2015-03-17

    The various technologies presented herein relate to a three dimensional manufacturing technique for application with semiconductor technologies. A membrane layer can be formed over a cavity. An opening can be formed in the membrane such that the membrane can act as a mask layer to the underlying wall surfaces and bottom surface of the cavity. A beam to facilitate an operation comprising any of implantation, etching or deposition can be directed through the opening onto the underlying surface, with the opening acting as a mask to control the area of the underlying surfaces on which any of implantation occurs, material is removed, and/or material is deposited. The membrane can be removed, a new membrane placed over the cavity and a new opening formed to facilitate another implantation, etching, or deposition operation. By changing the direction of the beam different wall/bottom surfaces can be utilized to form a plurality of structures.

  10. Solvent Immersion Imprint Lithography

    SciTech Connect (OSTI)

    Vasdekis, Andreas E.; Wilkins, Michael J.; Grate, Jay W.; Kelly, Ryan T.; Konopka, Allan; Xantheas, Sotiris S.; Chang, M. T.

    2014-06-21

    The mechanism of polymer disolution was explored for polymer microsystem prototyping, including microfluidics and optofluidics. Polymer films are immersed in a solvent, imprinted and finally brought into contact with a non-modified surface to permanently bond. The underlying polymer-solvent interactions were experimentally and theoretically investigated, and enabled rapid polymer microsystem prototyping. During imprinting, small molecule integration in the molded surfaces was feasible, a principle applied to oxygen sensing. Polystyrene (PS) was employed for microbiological studies at extreme environmental conditions. The thermophile anaerobe Clostridium Thermocellum was grown in PS pore-scale micromodels, revealing a double mean generation lifetime than under ideal culture conditions. Microsystem prototyping through directed polymer dissolution is simple and accessible, while simultaneous patterning, bonding, and surface/volume functionalization are possible in less than one minute.

  11. X-ray lithography source

    DOE Patents [OSTI]

    Piestrup, Melvin A. (Woodside, CA); Boyers, David G. (Mountain View, CA); Pincus, Cary (Sunnyvale, CA)

    1991-01-01

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

  12. Scattering with angular limitation projection electron beam lithography for suboptical lithography

    E-Print Network [OSTI]

    Harriott, Lloyd R.

    Scattering with angular limitation projection electron beam lithography for suboptical lithography era early in the next century. The scattering with angular limitation projection electron-beam lithography SCALPEL approach combines the high resolution and wide process latitude inherent in electron beam

  13. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    EUV lithography relies on specialized lenses made of curved mirrors with reflective coatings called multilayers to print patterns with high resolution. One special flat mirror...

  14. Science Background for the Reprocessing and Goddard Satellite-based Surface Turbulent Fluxes

    E-Print Network [OSTI]

    1 Science Background for the Reprocessing and Goddard Satellite-based Surface Turbulent Fluxes, MD 20771 USA #12;2 Science Background for the Reprocessing and Goddard Satellite-based Surface

  15. Photo-lithography of xanthate precursor poly(p-phenylenevinylene...

    Office of Scientific and Technical Information (OSTI)

    Conference: Photo-lithography of xanthate precursor poly(p-phenylenevinylene) polymers. Citation Details In-Document Search Title: Photo-lithography of xanthate precursor...

  16. Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithography.

    SciTech Connect (OSTI)

    Ramanathan, M.; Darling, S. B.; Sumant, A. V.; Auciello, O.

    2010-07-01

    Nanopatterning of diamond surfaces is critical for the development of diamond-based microelectromechanical system/nanoelectromechanical system (MEMS/NEMS), such as resonators or switches. Micro-/nanopatterning of diamond materials is typically done using photolithography or electron beam lithography combined with reactive ion etching (RIE). In this work, we demonstrate a simple process, block copolymer (BCP) lithography, for nanopatterning of ultrananocrystalline diamond (UNCD) films to produce nanostructures suitable for the fabrication of NEMS based on UNCD. In BCP lithography, nanoscale self-assembled polymeric domains serve as an etch mask for pattern transfer. The authors used thin films of a cylinder-forming organic-inorganic BCP, poly(styrene-block-ferrocenyldimethylsilane), PS-b-PFS, as an etch mask on the surface of UNCD films. Orientational control of the etch masking cylindrical PFS blocks is achieved by manipulating the polymer film thickness in concert with the annealing treatment. We have observed that the surface roughness of UNCD layers plays an important role in transferring the pattern. Oxygen RIE was used to etch the exposed areas of the UNCD film underneath the BCP. Arrays of both UNCD posts and wirelike structures have been created using the same starting polymeric materials as the etch mask.

  17. Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

    SciTech Connect (OSTI)

    Xu, Jia; Zhang, Ziang; Weng, Zhankun; Wang, Zuobin Wang, Dapeng

    2014-05-28

    This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.

  18. Low-cost method for producing extreme ultraviolet lithography optics

    DOE Patents [OSTI]

    Folta, James A. (Livermore, CA); Montcalm, Claude (Fort Collins, CO); Taylor, John S. (Livermore, CA); Spiller, Eberhard A. (Mt. Kisco, NY)

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  19. Method for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E. (Livermore, CA); Kubiak, Glenn D. (Livermore, CA)

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  20. Method for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E. (727 Clara St., Livermore, Alameda County, CA 94550); Kubiak, G. D. (475 Maple St., Livermore, Alameda County, CA 94550)

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  1. Diffractive optics for maskless lithography and imaging

    E-Print Network [OSTI]

    Menon, Rajesh, 1976-

    2003-01-01

    Semiconductor industry has primarily been driven by the capability of lithography to pattern smaller and smaller features. However due to increasing mask costs and complexity, and increasing tool costs, the state-of-the-art ...

  2. Microchannel molding: A soft lithography-inspired approach to micrometer-scale patterning

    E-Print Network [OSTI]

    Aksay, Ilhan A.

    Microchannel molding: A soft lithography-inspired approach to micrometer-scale patterning large amounts of shrinkage during drying, topographical distortions develop. In place of patterning the elastomeric mold, the network of capillary channels was patterned directly into the substrate surface

  3. A novel lithography technique for formation of large areas of uniform nanostructures

    E-Print Network [OSTI]

    Shahriar, Selim

    such as plasmonics, sensors, storage devices, solar cells, nano-filtration and artificial kidneys require applications such as surface plasmonics[1] , data storage[2] , optoelectronic devices[3] , and nanoA novel lithography technique for formation of large areas of uniform nanostructures Wei Wu

  4. Extreme-UV lithography condenser

    DOE Patents [OSTI]

    Sweatt, William C. (Albuquerque, NM); Sweeney, Donald W. (San Ramon, CA); Shafer, David (Fairfield, CT); McGuire, James (Pasadena, CA)

    2001-01-01

    Condenser system for use with a ringfield camera in projection lithography where the condenser includes a series of segments of a parent aspheric mirror having one foci at a quasi-point source of radiation and the other foci at the radius of a ringfield have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ringfield camera about one of the beams and fall onto the ringfield radius as a coincident image as an arc of the ringfield. The condenser has a set of correcting mirrors with one of the correcting mirrors of each set, or a mirror that is common to said sets of mirrors, from which the radiation emanates, is a concave mirror that is positioned to shape a beam segment having a chord angle of about 25 to 85 degrees into a second beam segment having a chord angle of about 0 to 60 degrees.

  5. A direct-write thick-film lithography process for multi-parameter control of tooling in continuous roll-to-roll microcontact printing

    E-Print Network [OSTI]

    Nietner, Larissa F

    2014-01-01

    Roll-to-roll (R2R) microcontact printing ([mu]CP) aims to transform micron-precision soft lithography in a continuous, large-scale, high-throughput process for large-area surface patterning, flexible electronics and ...

  6. Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist

    E-Print Network [OSTI]

    Winston, Donald

    A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar to, but of potentially higher resolution than, scanning electron-beam lithography. This article ...

  7. Sub-10-nm lithography with light-ion beams

    E-Print Network [OSTI]

    Winston, Donald, Ph. D. Massachusetts Institute of Technology

    2012-01-01

    Scanning-electron-beam lithography (SEBL) is the workhorse of nanoscale lithography in part because of the high brightness of the Schottky source of electrons, but also benefiting from decades of incremental innovation and ...

  8. Surface Science Letters Initial oxidation stages of hydrogen-and styrene-terminated Si(100) surfaces: A

    E-Print Network [OSTI]

    Ciobanu, Cristian

    Surface Science Letters Initial oxidation stages of hydrogen- and styrene-terminated Si(100- and styrene-terminated Si(100)-2×1 films in O2 atmosphere at 500 K using molecular dynamics (MD) simulations of these reactions leads to increased amorphization of the surface as the oxidation proceeds. In the case of styrene

  9. Method for the protection of extreme ultraviolet lithography optics

    DOE Patents [OSTI]

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  10. Vitreous carbon mask substrate for X-ray lithography

    DOE Patents [OSTI]

    Aigeldinger, Georg (Livermore, CA); Skala, Dawn M. (Fremont, CA); Griffiths, Stewart K. (Livermore, CA); Talin, Albert Alec (Livermore, CA); Losey, Matthew W. (Livermore, CA); Yang, Chu-Yeu Peter (Dublin, CA)

    2009-10-27

    The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.

  11. Surface Science 232 (1990) 353-366 North-Holland

    E-Print Network [OSTI]

    Marks, Laurence D.

    1990-01-01

    damage in NiO contamination layer encapsulates the NiO surface, it remains stable for prolonged periods

  12. Surface Science 415 (1998) 2936 Structural studies of sulfur-passivated GaAs (100)

    E-Print Network [OSTI]

    Zhang, Yanchao

    1998-01-01

    . Keywords: Atomic force microscopy; Gallium arsenide; Low-energy electron diffraction; Roughness; SulfurSurface Science 415 (1998) 29­36 Structural studies of sulfur-passivated GaAs (100) surfaces Abstract We present the results of Auger electron spectroscopy (AES), low-energy electron diffraction (LEED

  13. Laser direct write system for fabricating seamless roll-to-roll lithography tools

    E-Print Network [OSTI]

    Petrzelka, Joseph E.

    Implementations of roll to roll contact lithography require new approaches towards manufacturing tooling, including stamps for roll to roll nanoimprint lithography (NIL) and soft lithography. Suitable roll based tools must ...

  14. Chemistry and material science at the cell surface

    E-Print Network [OSTI]

    Zhao, Weian

    Cell surfaces are fertile ground for chemists and material scientists to manipulate or augment cell functions and phenotypes. This not only helps to answer basic biology questions but also has diagnostic and therapeutic ...

  15. Multilevel interference lithography--fabricating sub-wavelength periodic nanostructures

    E-Print Network [OSTI]

    Chang, Chih-Hao, 1980-

    2008-01-01

    Periodic nanostructures have many exciting applications, including high-energy spectroscopy, patterned magnetic media, photonic crystals, and templates for self-assembly. Interference lithography (IL) is an attractive ...

  16. Building Surface Science Capacity to Serve the Automobile Industry in Southeastern Michigan, final report

    SciTech Connect (OSTI)

    Shen, Weidian

    2013-09-27

    This project, “Building Surface Science Capacity to Serve the Automobile Industry in Southeastern Michigan” was carried out in two phases: (1) the 2009 – 2012 renovation of space in the new EMU Science Complex, which included the Surface Science Laboratory (SSL), a very vigorous research lab at EMU that carries on a variety of research projects to serve the auto and other industries in Michigan; and (2) the 2013 purchase of several pieces of equipment to further enhance the research capability of the SSL. The funding granted by the DoE was proposed to “renovate the space in the Science Complex to include SSL and purchase equipment for tribological and electrochemical impedance measurements in the lab, thus SSL will serve the auto and other industries in Michigan better.” We believe we have fully accomplished the mission.

  17. Compact multi-bounce projection system for extreme ultraviolet projection lithography

    DOE Patents [OSTI]

    Hudyma, Russell M. (San Ramon, CA)

    2002-01-01

    An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

  18. Sandia National Labs: PCNSC: Departments: Surface and Interface Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantityBonneville Power AdministrationRobust, High-ThroughputUpcoming Release of(LVOC) WorkingTableTableSciencesHome About Us

  19. Interference Assisted Lithography for Patterning of 1D Gridded Design

    E-Print Network [OSTI]

    Kahng, Andrew B.

    , USA 78750 3 University of California at San Diego, La Jolla, CA, USA 92093 4 Tela Innovations, Inc Assisted Lithography (IAL) as a promising and cost-effective solution for extending lithography. IAL for pattern splitting, as well as to address concerns of significantly increased patterning cost. Nano

  20. ATOMIC FORCE LITHOGRAPHY OF NANO/MICROFLUIDIC CHANNELS FOR VERIFICATION AND MONITORING OF AQUEOUS SOLUTIONS

    SciTech Connect (OSTI)

    Mendez-Torres, A.; Torres, R.; Lam, P.

    2011-07-15

    The growing interest in the physics of fluidic flow in nanoscale channels, as well as the possibility for high sensitive detection of ions and single molecules is driving the development of nanofluidic channels. The enrichment of charged analytes due to electric field-controlled flow and surface charge/dipole interactions along the channel can lead to enhancement of sensitivity and limits-of-detection in sensor instruments. Nuclear material processing, waste remediation, and nuclear non-proliferation applications can greatly benefit from this capability. Atomic force microscopy (AFM) provides a low-cost alternative for the machining of disposable nanochannels. The small AFM tip diameter (< 10 nm) can provide for features at scales restricted in conventional optical and electron-beam lithography. This work presents preliminary results on the fabrication of nano/microfluidic channels on polymer films deposited on quartz substrates by AFM lithography.

  1. ATOMIC FORCE LITHOGRAPHY OF NANO MICROFLUIDIC CHANNELS FOR VERIFICATION AND MONITORING IN AQUEOUS SOLUTIONS

    SciTech Connect (OSTI)

    Torres, R.; Mendez-Torres, A.; Lam, P.

    2011-06-09

    The growing interest in the physics of fluidic flow in nanoscale channels, as well as the possibility for high sensitive detection of ions and single molecules is driving the development of nanofluidic channels. The enrichment of charged analytes due to electric field-controlled flow and surface charge/dipole interactions along the channel can lead to enhancement of sensitivity and limits-of-detection in sensor instruments. Nuclear material processing, waste remediation, and nuclear non-proliferation applications can greatly benefit from this capability. Atomic force microscopy (AFM) provides a low-cost alternative for the machining of disposable nanochannels. The small AFM tip diameter (< 10 nm) can provide for features at scales restricted in conventional optical and electron-beam lithography. This work presents preliminary results on the fabrication of nano/microfluidic channels on polymer films deposited on quartz substrates by AFM lithography.

  2. Surface Science 429 (1999) L509L514 www.elsevier.nl/locate/susc Surface Science Letters

    E-Print Network [OSTI]

    Hasegawa, Shuji

    1999-01-01

    of the Si(111)- 3� 3-Ag surface are studied by first-principles calculations based on the density functional. Keywords: Density functional calculations; Metal­semiconductor interfaces; Scanning tunneling microscopy]. Based upon calculations based on the density functional theory their X-ray diffraction ( XRD) data

  3. Multidimensional Simulation and Optimization of Hybrid Laser and Discharge Plasma Devices for EUV Lithography

    E-Print Network [OSTI]

    Harilal, S. S.

    advantages and disadvantages. In order to meet the requirements of the Intel Lithography Roadmap goals

  4. A surface science investigation of silicon carbide: Oxidation, crystal growth and surface structural analysis

    SciTech Connect (OSTI)

    Powers, J.M.

    1991-11-01

    For the semiconductor SiC to fulfill its potential as an electronic material, methods must be developed to produce insulating surface oxide layers in a reproducible fashion. Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and x-ray photoelectron spectroscopy (XPS) were used to investigate the oxidation of single crystal {alpha}-SiC over a wide temperature and O{sub 2} pressure range. The {alpha}-SiC surface becomes graphitic at high temperatures and low O{sub 2} pressures due to Si and SiO sublimation from the surface. Amorphous SiO{sub 2} surface layers from on {alpha}-SiC at elevated O{sub 2} pressures and temperatures. Both the graphitization and oxidation of {alpha}-SiC appears to be enhanced by surface roughness. Chemical vapor deposition (CVD) is currently the preferred method of producing single crystal SiC, although the method is slow and prone to contamination. We have attempted to produce SiC films at lower temperatures and higher deposition rates using plasma enhanced CVD with CH{sub 3}SiH{sub 3}. Scanning AES, XPS and scanning electron microscopy (SEM) were utilized to study the composition and morphology of the deposited Si{sub x}C{sub y}H{sub z} films as a function of substrate temperature, plasma power and ion flux bombardment of the film during deposition. High energy ion bombardment during deposition was found to increase film density and substrate adhesion while simultaneously reducing hydrogen and oxygen incorporation in the film. Under all deposition conditions the Si{sub x}C{sub y}H{sub z} films were found to be amorphous, with the ion bombarded films showing promise as hard protective coatings. Studies with LEED and AES have shown that {beta}-SiC (100) exhibits multiple surface reconstructions, depending on the surface composition. These surface reconstructions possess substantially different surface reactivities at elevated temperatures, which can complicate the fabrication of metal on SiC junctions.

  5. Z .Applied Surface Science 149 1999 97102 Unfolding positron lifetime spectra with neural networks

    E-Print Network [OSTI]

    Pázsit, Imre

    Z .Applied Surface Science 149 1999 97­102 Unfolding positron lifetime spectra with neural networks is based on the use of artificial neural networks ANNs . By using data from simulated positron spectra: Artificial neural networks ANNs ; Amplitudes; Simulation model 1. Introduction Determination of mean

  6. List of Participants -82nd ACS Colloid and Surface Science Symposium, Raleigh, NC NICHOLAS L. ABBOTT UNIVERSITY OF WISCONSIN USA

    E-Print Network [OSTI]

    Velev, Orlin D.

    List of Participants - 82nd ACS Colloid and Surface Science Symposium, Raleigh, NC NICHOLAS L Colloid and Surface Science Symposium, Raleigh, NC NICK J. CARROLL UNIVERSITY OF NEW MEXICO USA RICHARD L UNIVERSITY USA YONG-JAE CHOI NORTH CAROLINA STATE UNIVERSITY VICTOR CHOW SYNGENTA CROP PROTECTION DAVID A

  7. Graphene nanoribbon superlattices fabricated via He ion lithography

    SciTech Connect (OSTI)

    Archanjo, Braulio S.; Fragneaud, Benjamin; Gustavo Cançado, Luiz; Winston, Donald; Miao, Feng; Alberto Achete, Carlos; Medeiros-Ribeiro, Gilberto

    2014-05-12

    Single-step nano-lithography was performed on graphene sheets using a helium ion microscope. Parallel “defect” lines of ?1??m length and ?5?nm width were written to form nanoribbon gratings down to 20?nm pitch. Polarized Raman spectroscopy shows that crystallographic orientation of the nanoribbons was partially maintained at their lateral edges, indicating a high-fidelity lithography process. Furthermore, Raman analysis of large exposure areas with different ion doses reveals that He ions produce point defects with radii ? 2× smaller than do Ga ions, demonstrating that scanning-He{sup +}-beam lithography can texture graphene with less damage.

  8. Photoresist composition for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E. (Alameda County, CA); Kubiak, G. D. (Alameda County, CA)

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  9. Applied Surface Science 327 (2015) 413417 Contents lists available at ScienceDirect

    E-Print Network [OSTI]

    Marrucci, Lorenzo

    2015-01-01

    in-plane inhomogeneities of electrostatic, chemical or structural nature. The presence. 1. Introduction Monitoring the quality of evolving surfaces and interfaces is recognized today and they travel almost unaffected through most gas environments and through glass windows, thus allowing one

  10. Ambient pressure photoelectron spectroscopy: a new tool for surface science and nanotechnology

    SciTech Connect (OSTI)

    Salmeron, Miquel; Salmeron, Miquel; Schlogl, Robert

    2008-03-12

    Progress in science often follows or parallels the development of new techniques. The optical microscope helped convert medicine and biology from a speculative activity in old times to today's sophisticated scientific disciplines. The telescope changed the study and interpretation of heavens from mythology to science. X-ray diffraction enabled the flourishing of solid state physics and materials science. The technique object of this review, Ambient Pressure Photoelectron Spectroscopy or APPES for short, has also the potential of producing dramatic changes in the study of liquid and solid surfaces, particularly in areas such as atmospheric, environment and catalysis sciences. APPES adds an important missing element to the host of techniques that give fundamental information, i.e., spectroscopy and microscopy, about surfaces in the presence of gases and vapors, as encountered in industrial catalysis and atmospheric environments. APPES brings electron spectroscopy into the realm of techniques that can be used in practical environments. Decades of surface science in ultra high vacuum (UHV) has shown the power of electron spectroscopy in its various manifestations. Their unique property is the extremely short elastic mean free path of electrons as they travel through condensed matter, of the order of a few atomic distances in the energy range from a few eV to a few thousand eV. As a consequence of this the information obtained by analyzing electrons emitted or scattered from a surface refers to the top first few atomic layers, which is what surface science is all about. Low energy electron diffraction (LEED), Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), Ultraviolet photoelectron spectroscopy (UPS), and other such techniques have been used for decades and provided some of the most fundamental knowledge about surface crystallography, composition and electronic structure available today. Unfortunately the high interaction cross section of electrons with matter also prevents them from traveling long distances unscattered in gas environments. Above the millibar pressure range this distance is reduced to less that a millimeter, effectively preventing its use in the most relevant environments, usually between millibars and atmospheric pressures. There is therefore a large gap of several orders of magnitude where information about surfaces is scarce because these powerful electron spectroscopies cannot operate. One characteristic of surfaces in ambient pressure environments is that they are covered by dense layers of molecules, even when their binding energy is weak. Water for example is known to form layers several molecules thick at room temperature in humid environments. Metals readily form oxide films several layers thick in oxygen atmospheres. Dense layers of adsorbed molecules can also be produced in ultra high vacuum, often by the simple and expedient method of cooling the sample to cryogenic temperatures. A large amount of data has been obtained in the past in UHV by surface scientists using this method. While this has provided valuable information it begs the question of whether the structures formed in this manner represent equilibrium structures or metastable ones, kinetically trapped due to high activation energies that cannot be overcome at low temperature. From a thermodynamic point of view is interesting to consider the entropic contribution to the Gibbs free energy, which we can call 'the pressure factor', equal to kT.logP. This factor amounts to a sizeable 0.3 eV difference at room temperature between UHV (<10{sup -8} Pascal) and atmospheric pressures. Such change if free energy can definitely result in changes in surface structure and stability. Entire areas of the phase diagram are out of reach due to the pressure gap. Even when cooling is not necessary, many surface treatments and most chemical reactions necessitate the presence of gases at pressures ranging from millibar to bars. What is the structure and chemical nature of the species formed on the surface in equilibrium with suc

  11. Enhancing the science return of Mars missions via sample preparation, robotic surface exploration and in orbit fuel production

    E-Print Network [OSTI]

    Lamamy, Julien-Alexandre, 1978-

    2004-01-01

    The future of Mars exploration is challenging from multiple points of view. To enhance their science return, future surface probes will most likely be equipped with complex Sample Preparation And Transfer (SPAT) facilities. ...

  12. Chemistry and Materials Science progress report, first half FY 1992. Weapons-Supporting Research and Laboratory Directed Research and Development

    SciTech Connect (OSTI)

    Not Available

    1992-07-01

    This report contains sections on: Fundamentals of the physics and processing of metals; interfaces, adhesion, and bonding; energetic materials; plutonium research; synchrotron radiation-based materials science; atomistic approach to the interaction of surfaces with the environment: actinide studies; properties of carbon fibers; buried layer formation using ion implantation; active coherent control of chemical reaction dynamics; inorganic and organic aerogels; synthesis and characterization of melamine-formaldehyde aerogels; structural transformation and precursor phenomena in advanced materials; magnetic ultrathin films, surfaces, and overlayers; ductile-phase toughening of refractory-metal intermetallics; particle-solid interactions; electronic structure evolution of metal clusters; and nanoscale lithography induced chemically or physically by modified scanned probe microscopy.

  13. Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale

    E-Print Network [OSTI]

    Duan, Huigao

    Exploring the resolution limit of electron-beam lithography is of great interest both scientifically and technologically. However, when electron-beam lithography approaches its resolution limit, imaging and metrology of ...

  14. Design and prototype : a manufacturing system for the soft lithography technique

    E-Print Network [OSTI]

    Cao, Arthur Y. (Arthur Yao)

    2006-01-01

    Ever since 1998 when the term "soft lithography" was first created, soft lithography techniques have drawn close attention of the academia and the industry. Micro contact printing is by far the most widely used soft ...

  15. Geometry of nanopore devices fabricated by electron beam lithography: Simulations and experimental comparisons

    E-Print Network [OSTI]

    Nair, Sankar

    Geometry of nanopore devices fabricated by electron beam lithography: Simulations and experimental 2013 Keywords: Nanopore Simulation Electron beam lithography Penelope Nanotechnology Monte Carlo a b be fabricated by electron beam lithography (EBL) with high density (on the order of 10 devices per cm2

  16. Lithography and Design in Partnership: A New Roadmap Andrew B. Kahng

    E-Print Network [OSTI]

    Kahng, Andrew B.

    Lithography and Design in Partnership: A New Roadmap Andrew B. Kahng UCSD Departments of CSE roadmap' between lithography and design from several perspectives. First, we examine cultural gaps and other intrinsic barriers to a shared roadmap. Second, we discuss how lithography technol- ogy can change

  17. Microphotonic parabolic light directors fabricated by two-photon lithography

    SciTech Connect (OSTI)

    Atwater, Jackson H; Spinelli, P.; Kosten, Emily D; Parsons, J.; Van Lare, C; Van de Groep, J; Garcia de Abajo, J.; Polman, Albert; Atwater, Harry A.

    2011-01-01

    We have fabricated microphotonic parabolic light directors using two-photon lithography, thin-film processing, and aperture formation by focused ion beam lithography. Optical transmission measurements through upright parabolic directors 22 ?m high and 10 ?m in diameter exhibit strong beam directivity with a beam divergence of 5.6°, in reasonable agreement with ray-tracing and full-field electromagnetic simulations. The results indicate the suitability of microphotonic parabolic light directors for producing collimated beams for applications in advanced solar cell and light-emitting diode designs.

  18. Resolution Improvement and Pattern Generator Development for theMaskless Micro-Ion-Beam Reduction Lithography System

    SciTech Connect (OSTI)

    Jiang, Ximan

    2006-05-18

    The shrinking of IC devices has followed the Moore's Law for over three decades, which states that the density of transistors on integrated circuits will double about every two years. This great achievement is obtained via continuous advance in lithography technology. With the adoption of complicated resolution enhancement technologies, such as the phase shifting mask (PSM), the optical proximity correction (OPC), optical lithography with wavelength of 193 nm has enabled 45 nm printing by immersion method. However, this achievement comes together with the skyrocketing cost of masks, which makes the production of low volume application-specific IC (ASIC) impractical. In order to provide an economical lithography approach for low to medium volume advanced IC fabrication, a maskless ion beam lithography method, called Maskless Micro-ion-beam Reduction Lithography (MMRL), has been developed in the Lawrence Berkeley National Laboratory. The development of the prototype MMRL system has been described by Dr. Vinh Van Ngo in his Ph.D. thesis. But the resolution realized on the prototype MMRL system was far from the design expectation. In order to improve the resolution of the MMRL system, the ion optical system has been investigated. By integrating a field-free limiting aperture into the optical column, reducing the electromagnetic interference and cleaning the RF plasma, the resolution has been improved to around 50 nm. Computational analysis indicates that the MMRL system can be operated with an exposure field size of 0.25 mm and a beam half angle of 1.0 mrad on the wafer plane. Ion-ion interactions have been studied with a two-particle physics model. The results are in excellent agreement with those published by the other research groups. The charge-interaction analysis of MMRL shows that the ion-ion interactions must be reduced in order to obtain a throughput higher than 10 wafers per hour on 300-mm wafers. In addition, two different maskless lithography strategies have been studied. The dependence of the throughput with the exposure field size and the speed of the mechanical stage has been investigated. In order to perform maskless lithography, different micro-fabricated pattern generators have been developed for the MMRL system. Ion beamlet switching has been successfully demonstrated on the MMRL system. A positive bias voltage around 10 volts is sufficient to switch off the ion current on the micro-fabricated pattern generators. Some unexpected problems, such as the high-energy secondary electron radiations, have been discovered during the experimental investigation. Thermal and structural analysis indicates that the aperture displacement error induced by thermal expansion can satisfy the 3{delta} CD requirement for lithography nodes down to 25 nm. The cross-talking effect near the surface and inside the apertures of the pattern generator has been simulated in a 3-D ray-tracing code. New pattern generator design has been proposed to reduce the cross-talking effect. In order to eliminate the surface charging effect caused by the secondary electrons, a new beam-switching scheme in which the switching electrodes are immersed in the plasma has been demonstrated on a mechanically fabricated pattern generator.

  19. Ultratech Develops an Improved Lithography Tool for LED Wafer Manufacturing

    Broader source: Energy.gov [DOE]

    Ultratech modified an existing lithography tool used for semiconductor manufacturing to better meet the cost and performance targets of the high-brightness LED manufacturing industry. The goal was to make the equipment compatible with the wide range of substrate diameters and thicknesses prevalent in the industry while reducing the capital cost and the overall cost of ownership (COO).

  20. Digital microfluidics using soft lithography{ John Paul Urbanski,a

    E-Print Network [OSTI]

    Amarasinghe, Saman

    Digital microfluidics using soft lithography{ John Paul Urbanski,a William Thies,b Christopher published as an Advance Article on the web 29th November 2005 DOI: 10.1039/b510127a Although microfluidic software to drive the pumps, valves, and electrodes used to manipulate fluids in microfluidic devices

  1. Near ultraviolet-wavelength photonic-crystal biosensor with enhanced surface-to-bulk sensitivity ratio

    E-Print Network [OSTI]

    Cunningham, Brian

    in a Si/SiO2/poly methyl- methacrylate substrate by electron-beam lithography and etched into the discovery,1 environmental detection, medical diagnostics, and life science research.2 Traditional labeled

  2. IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 31, NO. 4, AUGUST 2003 691 Plasma Molding Over Surface Topography

    E-Print Network [OSTI]

    Economou, Demetre J.

    IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 31, NO. 4, AUGUST 2003 691 Plasma Molding Over Surface) simulation model was developed to study plasma "molding" over a trench. The radio frequency sheath potential (MC) simulation, plasma molding, two-dimensional (2-D) plasma sheath. I. INTRODUCTION ASHEATH forms

  3. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

    DOE Patents [OSTI]

    Chapman, Henry N. (Livermore, CA); Nugent, Keith A. (North Fitzroy, AU)

    2001-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  4. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

    DOE Patents [OSTI]

    Chapman, Henry N. (Livermore, CA); Nugent, Keith A. (North Fitzroy, AU)

    2002-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  5. Low Cost Lithography Tool for High Brightness LED Manufacturing

    SciTech Connect (OSTI)

    Andrew Hawryluk; Emily True

    2012-06-30

    The objective of this activity was to address the need for improved manufacturing tools for LEDs. Improvements include lower cost (both capital equipment cost reductions and cost-ofownership reductions), better automation and better yields. To meet the DOE objective of $1- 2/kilolumen, it will be necessary to develop these highly automated manufacturing tools. Lithography is used extensively in the fabrication of high-brightness LEDs, but the tools used to date are not scalable to high-volume manufacturing. This activity addressed the LED lithography process. During R&D and low volume manufacturing, most LED companies use contact-printers. However, several industries have shown that these printers are incompatible with high volume manufacturing and the LED industry needs to evolve to projection steppers. The need for projection lithography tools for LED manufacturing is identified in the Solid State Lighting Manufacturing Roadmap Draft, June 2009. The Roadmap states that Projection tools are needed by 2011. This work will modify a stepper, originally designed for semiconductor manufacturing, for use in LED manufacturing. This work addresses improvements to yield, material handling, automation and throughput for LED manufacturing while reducing the capital equipment cost.

  6. Nodal photolithography : lithography via far-field optical nodes in the resist

    E-Print Network [OSTI]

    Winston, Donald, S.M. Massachusetts Institute of Technology

    2008-01-01

    In this thesis, I investigate one approach - stimulated emission depletion - to surmounting the diffraction limitation of optical lithography. This approach uses farfield optical nodes to orchestrate reversible, saturable ...

  7. Understanding Automotive Exhaust Catalysts Using a Surface Science Approach: Model NOx Storage Materials

    SciTech Connect (OSTI)

    Szanyi, Janos; Yi, Cheol-Woo W.; Mudiyanselage, Kumudu K.; Kwak, Ja Hun

    2013-11-01

    The structure-reactivity relationships of model BaO-based NOx storage/reduction catalysts were investigated under well controlled experimental conditions using surface science analysis techniques. The reactivity of BaO toward NO2, CO2, and H2O was studied as a function of BaO layer thickness [0\\hBaO\\30 monolayer (ML)], sample temperature, reactant partial pressure, and the nature of the substrate the NOx storage material was deposited onto. Most of the efforts focused on understanding the mechanism of NO2 storage either on pure BaO, or on BaO exposed to CO2 or H2O prior to NO2 exposure. The interaction of NO2 with a pure BaO film results in the initial formation of nitrite/nitrate ion pairs by a cooperative adsorption mechanism predicted by prior theoretical calculations. The nitrites are then further oxidized to nitrates to produce a fully nitrated surface. The mechanism of NO2 uptake on thin BaO films (\\4 ML), BaO clusters (\\1 ML) and mixed BaO/Al2O3 layers are fundamentally different: in these systems initially nitrites are formed only, and then converted to nitrates at longer NO2 exposure times. These results clarify the contradicting mechanisms presented in prior studies in the literature. After the formation of a nitrate layer the further conversion of the underlying BaO is slow, and strongly depends on both the sample temperature and the NO2 partial pressure. At 300 K sample temperature amorphous Ba(NO3)2 forms that then can be converted to crystalline nitrates at elevated temperatures. The reaction between BaO and H2O is facile, a series of Ba(OH)2 phases form under the temperature and H2O partial pressure regimes studied. Both amorphous and crystalline Ba(OH)2 phases react with NO2, and initially form nitrites only that can be converted to nitrates. The NO2 adsorption capacities of BaO and Ba(OH)2 are identical, i.e., both of these phases can completely be converted to Ba(NO3)2. In contrast, the interaction of CO2 with pure BaO results in the formation of a BaCO3 layer that prevents to complete carbonation of the entire BaO film under the experimental conditions applied in these studies. However, these ‘‘carbonated’’ BaO layers readily react with NO2, and at elevated sample temperature even the carbonate layer is converted to nitrates. The importance of the metal oxide/metal interface in the chemistry on NOx storage-reduction catalysts was studied on BaO(\\1 ML)/Pt(111) reverse model catalysts. In comparison to the clean Pt(111), new oxygen adsorption phases were identified on the BaO/Pt(111) surface that can be associated with oxygen atoms strongly adsorbed on Pt atoms at the peripheries of BaO particles. A simple kinetic model developed helped explain the observed thermal desorption results. The role of the oxide/metal interface in the reduction of Ba(NO3)2 was also substantiated in experiments where Ba(NO3)2/O/Pt(111) samples were exposed to CO at elevated sample temperature. The catalytic decomposition of the nitrate phase occurred as soon as metal sites opened up by the removal of interfacial oxygen via CO oxidation from the O/Pt(111) surface. The temperature for catalytic nitrate reduction was found to be significantly lower than the onset temperature of thermal nitrate decomposition. We gratefully acknowledge the US Department of Energy (DOE), Office of Science, Division of Chemical Sciences, Geosciences, and Biosciences for the support of this work. The research described in this paper was performed at the Environmental Molecular Sciences Laboratory (EMSL), a national user facility sponsored by the DOE Office of Biological and Environmental Research and located at the Pacific Northwest National Laboratory (PNNL). PNNL is operated for the US DOE by Battelle under contract number DE-AC05-76RL01830.

  8. Procedia Computer Science 00 (2014) 117 Anisotropic Surface Meshing with Conformal Embedding

    E-Print Network [OSTI]

    Jin, Miao

    2014-01-01

    contributed equally to this work. 2Corresponding author. 1 #12;/ Procedia Computer Science 00 (2014) 1­17 2

  9. X-ray lithography using holographic images

    DOE Patents [OSTI]

    Howells, M.S.; Jacobsen, C.

    1997-03-18

    Methods for forming X-ray images having 0.25 {micro}m minimum line widths on X-ray sensitive material are presented. A holographic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required. 15 figs.

  10. Surface Science Letters Friction between a-Al2O3(0 0 0 1) surfaces and the effects of surface hydroxylation

    E-Print Network [OSTI]

    Zhang, Katherine Yanhang

    hydroxylation Dongshan Wei a , Yanhang Zhang a,b,* a Department of Mechanical Engineering, Boston University hydroxylation a b s t r a c t Molecular dynamics simulations were performed to study the friction between hydroxylated a- Al2O3(0 0 0 1) surfaces at the temperature of 300 K. Effects of the degree of surface

  11. Design of superconducting transmission line integrated surface-electrode ion-traps

    E-Print Network [OSTI]

    Meyer, David Thomas

    2011-01-01

    We fabricated superconducting surface electrode ion traps with integrated microwave coplanar waveguides using direct-write optical lithography and a niobium on sapphire process. We then tested these traps in a closed cycle ...

  12. Plastic masters--rigid templates for soft lithography Salil P. Desai,a

    E-Print Network [OSTI]

    Voldman, Joel

    Plastic masters--rigid templates for soft lithography Salil P. Desai,a Dennis M. Freemanab and Joel plastic master molds for soft lithography directly from (poly)dimethysiloxane devices. Plastics masters without the need for cleanroom facilities. We have successfully demonstrated the use of plastics

  13. A microfluidic microbial fuel cell fabricated by soft lithography Fang Qian a,b,

    E-Print Network [OSTI]

    A microfluidic microbial fuel cell fabricated by soft lithography Fang Qian a,b, , Zhen He c microfluidic microbial fuel cell (MFC) platform built by soft-lithography tech- niques. The MFC design includes a unique sub-5 lL polydimethylsiloxane soft chamber featuring carbon cloth electrodes and microfluidic

  14. An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm

    E-Print Network [OSTI]

    An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm Kenneth lithography design rules. The proposed microscope features an array of user-selectable Fresnel zoneplate-EUV, Fresnel zoneplate microscope, the AIT has been in the vanguard of high-resolution EUV mask imaging

  15. High numerical aperture projection system for extreme ultraviolet projection lithography

    DOE Patents [OSTI]

    Hudyma, Russell M. (San Ramon, CA)

    2000-01-01

    An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

  16. Quantum lithography with classical light: Generation of arbitrary patterns 

    E-Print Network [OSTI]

    Sun, Qingqing; Hemmer, Philip R.; Zubairy, M. Suhail

    2007-01-01

    stream_source_info PhysRevA.75.065803.pdf.txt stream_content_type text/plain stream_size 16287 Content-Encoding ISO-8859-1 stream_name PhysRevA.75.065803.pdf.txt Content-Type text/plain; charset=ISO-8859-1 Quantum... alternative meth- ods based on classical fields ?9?11?. In Ref. ?12?, a novel approach was proposed to implement quantum lithography using the classical light. This is accom- plished by correlating wave vector and frequency in a narrow band multiphoton...

  17. Seventh BES (Basic Energy Sciences) catalysis and surface chemistry research conference

    SciTech Connect (OSTI)

    Not Available

    1990-03-01

    Research programs on catalysis and surface chemistry are presented. A total of fifty-seven topics are included. Areas of research include heterogeneous catalysis; catalysis in hydrogenation, desulfurization, gasification, and redox reactions; studies of surface properties and surface active sites; catalyst supports; chemical activation, deactivation; selectivity, chemical preparation; molecular structure studies; sorption and dissociation. Individual projects are processed separately for the data bases. (CBS)

  18. Surface Science 464 (2000) L732L738 www.elsevier.nl/locate/susc

    E-Print Network [OSTI]

    Soares, Edmar Avellar

    2000-01-01

    determined the surface structure of a-Al 2 O 3 (0001) using dynamical low-energy electron diffraction (LEED electron diffraction (LEED); Low index single crystal surfaces; Surface relaxation and reconstruction Being the denoted as labeled in Fig. 1). Theoretical calcula- structure of a-Al 2 O 3 (0001), remains controversial

  19. Toward a unified science of the Earth's surface: Opportunities for synthesis among hydrology,

    E-Print Network [OSTI]

    Power, Mary Eleanor

    . This paper discusses challenges, opportunities, and a few example problems that can serve as pathways toward of terrestrial surface and groundwater in creating surface morphology. A quantitative style is deeply ingrained). These spatial patterns are not restricted to the terrestrial landscape but, with remarkable similarity of form

  20. SGP Cloud and Land Surface Interaction Campaign (CLASIC): Science and Implementation Plan

    SciTech Connect (OSTI)

    MA Miller; R Avissar; LK Berg; SA Edgerton; ML Fischer; T Jackson; B.Kustas; PJ Lamb; GM McFarquhar; Q Min; B Schmid; MS Torn; DD Turner

    2007-06-30

    The Cloud and Land Surface Interaction Campaign is a field experiment designed to collect a comprehensive data set that can be used to quantify the interactions that occur between the atmosphere, biosphere, land surface, and subsurface. A particular focus will be on how these interactions modulate the abundance and characteristics of small and medium size cumuliform clouds that are generated by local convection. These interactions are not well understood and are responsible for large uncertainties in global climate models, which are used to forecast future climate states. The campaign will be conducted from June 8 to June 30, 2007, at the U.S. Department of Energy’s Atmospheric Radiation Measurement Climate Research Facility Southern Great Plains site. Data will be collected using eight aircraft equipped with a variety of specialized sensors, four specially instrumented surface sites, and two prototype surface radar systems. The architecture of Cloud and Land Surface Interaction Campaign includes a high-altitude surveillance aircraft and enhanced vertical thermodynamic and wind profile measurements that will characterize the synoptic scale structure of the clouds and the land surface within the Atmospheric Radiation Measurement Climate Research Facility Southern Great Plains site. Mesoscale and microscale structures will be sampled with a variety of aircraft, surface, and radar observations.

  1. Development of ion sources for ion projection lithography

    SciTech Connect (OSTI)

    Lee, Y.; Gough, R.A.; Kunkel, W.B.; Leung, K.N.; Perkins, L.T.

    1996-05-01

    Multicusp ion sources are capable of generating ion beams with low axial energy spread as required by the Ion Projection Lithography (IPL). Longitudinal ion energy spread has been studied in two different types of plasma discharge: the filament discharge ion source characterized by its low axial energy spread, and the RF-driven ion source characterized by its long source lifetime. For He{sup +} ions, longitudinal ion energy spreads of 1-2 eV were measured for a filament discharge multicusp ion source which is within the IPL device requirements. Ion beams with larger axial energy spread were observed in the RF-driven source. A double-chamber ion source has been designed which combines the advantages of low axial energy spread of the filament discharge ion source with the long lifetime of the RF-driven source. The energy spread of the double chamber source is lower than that of the RF-driven source.

  2. Soft x-ray reduction camera for submicron lithography

    DOE Patents [OSTI]

    Hawryluk, Andrew M. (2708 Rembrandt Pl., Modesto, CA 95356); Seppala, Lynn G. (7911 Mines Rd., Livermore, CA 94550)

    1991-01-01

    Soft x-ray projection lithography can be performed using x-ray optical components and spherical imaging lenses (mirrors), which form an x-ray reduction camera. The x-ray reduction is capable of projecting a 5x demagnified image of a mask onto a resist coated wafer using 4.5 nm radiation. The diffraction limited resolution of this design is about 135 nm with a depth of field of about 2.8 microns and a field of view of 0.2 cm.sup.2. X-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free are used, with a laser produced plasma for the source. Higher resolution and/or larger areas are possible by varying the optic figures of the components and source characteristics.

  3. Critical illumination condenser for x-ray lithography

    DOE Patents [OSTI]

    Cohen, S.J.; Seppala, L.G.

    1998-04-07

    A critical illumination condenser system is disclosed, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 {micro}m source and requires a magnification of 26. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth. 6 figs.

  4. Critical illumination condenser for x-ray lithography

    DOE Patents [OSTI]

    Cohen, Simon J. (Pleasanton, CA); Seppala, Lynn G. (Livermore, CA)

    1998-01-01

    A critical illumination condenser system, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 .mu.m source and requires a magnification of 26.times.. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth.

  5. ECE 415 Materials Science of Nanotechnology Catalog Description: Introductory physical chemistry of solid surfaces, thermodynamics and

    E-Print Network [OSTI]

    ECE 415 ­ Materials Science of Nanotechnology Catalog Description: Introductory physical chemistry, applications of nanomaterials, nano-synthesis techniques, integration of nanotechnology, and emerging nanotechnology topics. Credits: 3 Terms Offered: Spring Prerequisites: By course: ECE 416 or ENGR 321 or ENGR 321

  6. Brookhaven National Lab Postdoc Opening for Surface Science Studies of 2D-Zeolites

    E-Print Network [OSTI]

    Alpay, S. Pamir

    and Chemistry Department of BNL. The work also involves the design and implementation of PM-IRAS in an ambient, Skills and Abilities: Requires a Ph.D. in chemistry, materials science, physics or a related discipline-high vacuum systems will be a plus. For more information or to submit an application, please go to: https://www.bnl.gov/hr/careers/jobs

  7. Surface Science Letters Self-assembled growth of ordered Ge nanoclusters on

    E-Print Network [OSTI]

    Gao, Hongjun

    , Institute of Physics and Center for Condensed Matter Physics, Chinese Academy of Sciences, P.O. Box 2724-doped mirror-polished Si(1 1 1) wafer with a resistivity of 1­2 X cm and a size of 12 Â 2 Â 0:5 mm3

  8. Colloids and Surfaces B: Biointerfaces 112 (2013) 466473 Contents lists available at ScienceDirect

    E-Print Network [OSTI]

    Page, John

    2013-01-01

    of Manitoba, Winnipeg, Manitoba, Canada R3T 2N2 b Department of Food Science, University of Manitoba, Winnipeg to those mixed under vacuum (where bubbles are absent). Given the large internal interfacial area in dough of this resource is essential for more efficient con- ventional use of the material in a variety of foods [2

  9. Investigation of anti-Relaxation coatings for alkali-metal vapor cells using surface science techniques

    E-Print Network [OSTI]

    Seltzer, S. J.

    2011-01-01

    of Anti-Relaxation Coatings for Alkali-Metal Vapor Cellsanti-relaxation surface coatings in order to preserve atomicto the study of para?n coatings, in order to characterize

  10. Diphosphine Dioxide Cages and Hydrogen Peroxide Adducts of Phosphine Oxides: Syntheses and Applications in Surface Science 

    E-Print Network [OSTI]

    Hilliard, Casie Renee

    2013-12-09

    Understanding the adsorption of phosphine oxides on silica surfaces has a threefold incentive. (a) Efficiently removing phosphine oxides from reaction mixtures is crucial after many synthetic procedures, for example the ...

  11. The development of a prototype Zone-Plate-Array Lithography (ZPAL) system

    E-Print Network [OSTI]

    Patel, Amil Ashok, 1979-

    2004-01-01

    The research presented in this paper aims to build a Zone-Plate-Array Lithography (ZPAL) prototype tool that will demonstrate the high-resolution, parallel patterning capabilities of the architecture. The experiment will ...

  12. Modeling the point-spread function in helium-ion lithography

    E-Print Network [OSTI]

    Winston, Donald

    We present here a hybrid approach to modeling helium-ion lithography that combines the power and ease-of-use of the Stopping and Range of Ions in Matter (SRIM) software with the results of recent work simulating secondary ...

  13. Resolution Limits of Electron-Beam Lithography toward the Atomic Scale

    E-Print Network [OSTI]

    Zhang, Lihua

    We investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope. We achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist. We also analyzed ...

  14. Development of a simple, compact, low-cost interference lithography system

    E-Print Network [OSTI]

    Korre, Hasan

    Interference lithography (IL) has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. ...

  15. Limiting factors in sub-10 nm scanning-electron-beam lithography

    E-Print Network [OSTI]

    Berggren, Karl K.

    Achieving the highest possible resolution using scanning-electron-beam lithography (SEBL) has become an increasingly urgent problem in recent years, as advances in various nanotechnology applications [ F. S. Bates and G. ...

  16. Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

    E-Print Network [OSTI]

    Berggren, Karl K.

    The authors, demonstrated that 4.5-nm-half-pitch structures could be achieved using electron-beam lithography, followed by salty development. They also hypothesized a development mechanism for hydrogen silsesquioxane, ...

  17. Large area high density quantized magnetic disks fabricated using nanoimprint lithography

    E-Print Network [OSTI]

    for fabricating large area quantized magnetic disks QMDs using nanoimprint lithography NIL , electroplating or a via array. The other is that for high resolution an antireflection coating ARC layer is needed, which

  18. Contact region fidelity, sensitivity, and control in roll-based soft lithography

    E-Print Network [OSTI]

    Petrzelka, Joseph E

    2012-01-01

    Soft lithography is a printing process that uses small features on an elastomeric stamp to transfer micron and sub-micron patterns to a substrate. Translating this lab scale process to a roll-based manufacturing platform ...

  19. Nanometer-precision electron-beam lithography with applications in integrated optics

    E-Print Network [OSTI]

    Hastings, Jeffrey Todd, 1975-

    2003-01-01

    Scanning electron-beam lithography (SEBL) provides sub-10-nm resolution and arbitrary-pattern generation; however, SEBL's pattern-placement accuracy remains inadequate for future integrated-circuits and integrated-optical ...

  20. Science

    E-Print Network [OSTI]

    Department of Mathematics, Statistics, and Computer Science, University of Illinois. at Chicago, Chicago, IL, 60607, USA. 2 Department of Mathematics, Purdue ...

  1. M&A For Lithography Of Sparse Arrays Of Sub-Micrometer Features

    DOE Patents [OSTI]

    Brueck, Steven R.J. (Albuquerque, NM); Chen, Xiaolan (Albuquerque, NM); Zaidi, Saleem (Albuquerque, NM); Devine, Daniel J. (Los Gatos, CA)

    1998-06-02

    Methods and apparatuses are disclosed for the exposure of sparse hole and/or mesa arrays with line:space ratios of 1:3 or greater and sub-micrometer hole and/or mesa diameters in a layer of photosensitive material atop a layered material. Methods disclosed include: double exposure interferometric lithography pairs in which only those areas near the overlapping maxima of each single-period exposure pair receive a clearing exposure dose; double interferometric lithography exposure pairs with additional processing steps to transfer the array from a first single-period interferometric lithography exposure pair into an intermediate mask layer and a second single-period interferometric lithography exposure to further select a subset of the first array of holes; a double exposure of a single period interferometric lithography exposure pair to define a dense array of sub-micrometer holes and an optical lithography exposure in which only those holes near maxima of both exposures receive a clearing exposure dose; combination of a single-period interferometric exposure pair, processing to transfer resulting dense array of sub-micrometer holes into an intermediate etch mask, and an optical lithography exposure to select a subset of initial array to form a sparse array; combination of an optical exposure, transfer of exposure pattern into an intermediate mask layer, and a single-period interferometric lithography exposure pair; three-beam interferometric exposure pairs to form sparse arrays of sub-micrometer holes; five- and four-beam interferometric exposures to form a sparse array of sub-micrometer holes in a single exposure. Apparatuses disclosed include arrangements for the three-beam, five-beam and four-beam interferometric exposures.

  2. Surface Science 442 (1999) L983L988 www.elsevier.nl/locate/susc

    E-Print Network [OSTI]

    Sibener, Steven

    1999-01-01

    , no detailedgreat interest in both the areas of corrosion and study in a controlled UHV system has beencatalysis) nickel surface is addressed.resistant to metallic oxidation and corrosion. Through the use of high-satellites and aircraft traveling in that region of ence was observed in the cold substrate.the atmosphere [13,14]. J

  3. Colloids and Surfaces B: Biointerfaces 133 (2015) 99107 Contents lists available at ScienceDirect

    E-Print Network [OSTI]

    Zheng, Yufeng

    2015-01-01

    online 6 June 2015 Keywords: Mg­Ca alloy Plasma ion implantation Corrosion property Mechanism respectively with a dose of 2 × 1017 ions cm-2 by metal vapor vacuum arc technique (MEVVA). The surface guidance for further application of plasma ion implantation to biodegradable Mg alloys. © 2015 Elsevier B

  4. Applied Surface Science 63 (1993) 163-166 North-Holland applied

    E-Print Network [OSTI]

    Woodall, Jerry M.

    1993-01-01

    conductive coating on a transparent substrate which is separated from the sample surface by a thin layer which utilizes a condenser-like system consisting of a wire mesh or thin, transparent, conductive monitoring. This method utilizes a condenser-like system, one electrode consisting of a transparent

  5. Low-energy ion beamline scattering apparatus for surface science investigations

    SciTech Connect (OSTI)

    Gordon, M.J.; Giapis, K.P.

    2005-08-15

    We report on the design, construction, and performance of a high current (monolayers/s), mass-filtered ion beamline system for surface scattering studies using inert and reactive species at collision energies below 1500 eV. The system combines a high-density inductively coupled plasma ion source, high-voltage floating beam transport line with magnet mass-filter and neutral stripping, decelerator, and broad based detection capabilities (ions and neutrals in both mass and energy) for products leaving the target surface. The entire system was designed from the ground up to be a robust platform to study ion-surface interactions from a more global perspective, i.e., high fluxes (>100 {mu}A/cm{sup 2}) of a single ion species at low, tunable energy (50-1400{+-}5 eV full width half maximum) can be delivered to a grounded target under ultrahigh vacuum conditions. The high current at low energy problem is solved using an accel-decel transport scheme where ions are created at the desired collision energy in the plasma source, extracted and accelerated to high transport energy (20 keV to fight space charge repulsion), and then decelerated back down to their original creation potential right before impacting the grounded target. Scattered species and those originating from the surface are directly analyzed in energy and mass using a triply pumped, hybrid detector composed of an electron impact ionizer, hemispherical electrostatic sector, and rf/dc quadrupole in series. With such a system, the collision kinematics, charge exchange, and chemistry occurring on the target surface can be separated by fully analyzing the scattered product flux. Key design aspects of the plasma source, beamline, and detection system are emphasized here to highlight how to work around physical limitations associated with high beam flux at low energy, pumping requirements, beam focusing, and scattered product analysis. Operational details of the beamline are discussed from the perspective of available beam current, mass resolution, projectile energy spread, and energy tunability. As well, performance of the overall system is demonstrated through three proof-of-concept examples: (1) elastic binary collisions at low energy (2) core-level charge exchange reactions involving {sup 20}Ne{sup +} with Mg/Al/Si/P targets, and (3) reactive scattering of CF{sub 2}{sup +}/CF{sub 3}{sup +} off Si. These studies clearly demonstrate why low, tunable incident energy, as well as mass and energy filtering of products leaving the target surface is advantageous and often essential for studies of inelastic energy losses, hard-collision charge exchange, and chemical reactions that occur during ion-surface scattering.

  6. Droplet Impingement Cooling Experiments on Nano-structured Surfaces 

    E-Print Network [OSTI]

    Lin, Yen-Po

    2011-10-21

    design of surface structure used in Sriraman and Banerjee's study [15] was adopted and fabricated using step and flash imprinting lithography (S- FIL) followed by several steps of thin film heater deposition. The purpose of this work is to obtain thin... Step and Flash Imprinting Lithography (S-FIL) is a nano fabrication technique developed by C.G. Willson and S. V. Sreenivasan's research group [16, 17] at the University of Texas at Austin. S-FIL defines and reproduces surface features based on a...

  7. Four-mirror extreme ultraviolet (EUV) lithography projection system

    DOE Patents [OSTI]

    Cohen, Simon J (Pleasonton, CA); Jeong, Hwan J (Los Altos, CA); Shafer, David R (Fairfield, CT)

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  8. Fundamentals of embossing nanoimprint lithography in polymer substrates.

    SciTech Connect (OSTI)

    Simmons, Blake Alexander; King, William P.

    2011-02-01

    The convergence of micro-/nano-electromechanical systems (MEMS/NEMS) and biomedical industries is creating a need for innovation and discovery around materials, particularly in miniaturized systems that use polymers as the primary substrate. Polymers are ubiquitous in the microelectronics industry and are used as sensing materials, lithography tools, replication molds, microfluidics, nanofluidics, and biomedical devices. This diverse set of operational requirements dictates that the materials employed must possess different properties in order to reduce the cost of production, decrease the scale of devices to the appropriate degree, and generate engineered devices with new functional properties at cost-competitive levels of production. Nanoscale control of polymer deformation at a massive scale would enable breakthroughs in all of the aforementioned applications, but is currently beyond the current capabilities of mass manufacturing. This project was focused on developing a fundamental understanding of how polymers behave under different loads and environments at the nanoscale in terms of performance and fidelity in order to fill the most critical gaps in our current knowledgebase on this topic.

  9. Investigation of anti-Relaxation coatings for alkali-metal vapor cells using surface science techniques

    SciTech Connect (OSTI)

    Seltzer, S. J.; Michalak, D. J.; Donaldson, M. H.; Balabas, M. V.; Barber, S. K.; Bernasek, S. L.; Bouchiat, M.-A.; Hexemer, A.; Hibberd, A. M.; Jackson Kimball, D. F.; Jaye, C.; Karaulanov, T.; Narducci, F. A.; Rangwala, S. A.; Robinson, H. G.; Shmakov, A. K.; Voronov, D. L.; Yashchuk, V. V.; Pines, A.; Budker, D.

    2010-10-11

    Many technologies based on cells containing alkali-metal atomic vapor benefit from the use of antirelaxation surface coatings in order to preserve atomic spin polarization. In particular, paraffin has been used for this purpose for several decades and has been demonstrated to allow an atom to experience up to 10?000 collisions with the walls of its container without depolarizing, but the details of its operation remain poorly understood. We apply modern surface and bulk techniques to the study of paraffin coatings in order to characterize the properties that enable the effective preservation of alkali spin polarization. These methods include Fourier transform infrared spectroscopy, differential scanning calorimetry, atomic force microscopy, near-edge x-ray absorption fine structure spectroscopy, and x-ray photoelectron spectroscopy. We also compare the light-induced atomic desorption yields of several different paraffin materials. Experimental results include the determination that crystallinity of the coating material is unnecessary, and the detection of C=C double bonds present within a particular class of effective paraffin coatings. Further study should lead to the development of more robust paraffin antirelaxation coatings, as well as the design and synthesis of new classes of coating materials.

  10. Lithography with MeV Energy Ions for Biomedical Applications: Accelerator Considerations

    SciTech Connect (OSTI)

    Sangyuenyongpipat, S.; Whitlow, H. J.; Nakagawa, S. T.; Yoshida, E.

    2009-03-10

    MeV ion beam lithographies are very powerful techniques for 3D direct writing in positive or negative photoresist materials. Nanometer-scale rough structures, or clear areas with straight vertical sidewalls as thin as a few 10's of nm in a resist of a few nm to 100 {mu}m thickness can be made. These capabilities are particularly useful for lithography in cellular- and sub-cellular level biomedical research and technology applications. It can be used for tailor making special structures such as optical waveguides, biosensors, DNA sorters, spotting plates, systems for DNA, protein and cell separation, special cell-growth substrates and microfluidic lab-on-a-chip devices. Furthermore MeV ion beam lithography can be used for rapid prototyping, and also making master stamps and moulds for mass production by hot embossing and nanoimprint lithography. The accelerator requirements for three different high energy ion beam lithography techniques are overviewed. We consider the special requirements placed on the accelerator and how this is achieved for a commercial proton beam writing tool.

  11. ATMOSPHERIC AND OCEANIC SCIENCE LETTERS, 2013, VOL. 6, NO. 1, 39-43 Effects of Clouds and Aerosols on Surface Radiation Budget Inferred from

    E-Print Network [OSTI]

    Dong, Xiquan

    of Atmospheric Physics, NUIST, Nanjing 210044, China 3 Global Change and Earth System Science (GCESS), Beijing Radiative Effects (AREs) are 12.7, ­37.6, and ­24.9 W m­2 , indicating that aerosols have LW warming impact have much stronger LW warming effect and SW cooling effect on the surface radiation budget than AREs

  12. An optical parametric oscillator as a high-flux source of two-mode light for quantum lithography

    E-Print Network [OSTI]

    Dowling, Jonathan P.

    An optical parametric oscillator as a high-flux source of two-mode light for quantum lithography of contents for this issue, or go to the journal homepage for more Home Search Collections Journals About of Physics An optical parametric oscillator as a high-flux source of two-mode light for quantum lithography

  13. Using neutral metastable argon atoms and contamination lithography to form nanostructures in silicon, silicon dioxide, and gold

    E-Print Network [OSTI]

    Thywissen, Joseph

    Using neutral metastable argon atoms and contamination lithography to form nanostructures vapors present as dilute contaminants in the vacuum chamber, were used to create 80-nm features in Si, Si with similar contaminants present in a vacuum system to produce 8-nm features.1­3 This type of lithography

  14. Received 1 May 2013 | Accepted 26 Jul 2013 | Published 3 Sep 2013 Atomic layer lithography of wafer-scale

    E-Print Network [OSTI]

    Park, Namkyoo

    and high throughput. Here we introduce a new patterning technology based on atomic layer deposition lithography, combines atomic layer deposition (ALD) with `plug-and-peel' metal patterning using adhesive tapeARTICLE Received 1 May 2013 | Accepted 26 Jul 2013 | Published 3 Sep 2013 Atomic layer lithography

  15. 2496 IEEE PHOTONICS TECHNOLOGY LETTERS, VOL. 16, NO. 11, NOVEMBER 2004 Soft Lithography Replica Molding of Critically

    E-Print Network [OSTI]

    Huang, Yanyi

    Molding of Critically Coupled Polymer Microring Resonators Joyce K. S. Poon, Student Member, IEEE, Yanyi lithography replica molding to fabricate unclad polystyrene (PS) and clad SU-8 microring resonator filters of the microring resonator filters show the practicality of soft-lithography replica molding for the fabrication

  16. Soft X-ray Lithography Beamline at the Siam Photon Laboratory

    SciTech Connect (OSTI)

    Klysubun, P.; Chomnawang, N.; Songsiriritthigul, P.

    2007-01-19

    Construction of a soft x-ray lithography beamline utilizing synchrotron radiation generated by one of the bending magnets at the Siam Photon Laboratory is finished and the beamline is currently in a commissioning period. The beamline was modified from the existing monitoring beamline and is intended for soft x-ray lithographic processing and radiation biological research. The lithography exposure station with a compact one-dimensional scanning mechanism was constructed and assembled in-house. The front-end of the beamline has been modified to allow larger exposure area. The exposure station for studying radiation effects on biological samples will be set up in tandem with the lithography station, with a Mylar window for isolation. Several improvements to both the beamline and the exposure stations, such as improved scanning speed and the ability to adjust the exposure spectrum by means of low-Z filters, are planned and will be implemented in the near future.

  17. Nanofabrication of Optical Elements for SXR and EUV Applications: Ion Beam Lithography as a New Approach

    SciTech Connect (OSTI)

    Lenz, J. [Institute for X-Optics, RheinAhrCampus Remagen, University of Applied Sciences Koblenz, Suedallee 2, 53424 Remagen (Germany); Research Group Electron Microscopy and Analytics, caesar Research Center, Ludwig-Erhard-Allee 2, 53175 Bonn (Germany); Krupp, N.; Irsen, S. [Research Group Electron Microscopy and Analytics, caesar Research Center, Ludwig-Erhard-Allee 2, 53175 Bonn (Germany); Wilhein, T. [Institute for X-Optics, RheinAhrCampus Remagen, University of Applied Sciences Koblenz, Suedallee 2, 53424 Remagen (Germany)

    2011-09-09

    Diffractive optical elements are important components for applications in soft x-ray and extreme ultraviolet radiation. At present, the standard fabrication method for such optics is based on electron beam lithography followed by nanostructuring. This requires a series of complex processes including exposure, reactive ion-etching, and electro-plating. We report on experiments showing the single-step fabrication of such elements using ion beam lithography. Both transmission and reflection gratings were fabricated and successfully implemented as spectrometers at laboratory soft x-ray sources. Additionally, first steps toward zone plate fabrication are described.

  18. Critical dimension and pattern size enhancement using pre-strained lithography

    SciTech Connect (OSTI)

    Hong, Jian-Wei [Department of Power Mechanical Engineering, National Tsing Hua University, 101, Section 2, Kuang Fu Road, Hsin Chu 30013, Taiwan (China); Yang, Chung-Yuan [Institute of NanoEngineering and MicroSystems, National Tsing Hua University, 101, Section 2, Kuang Fu Road, Hsin Chu 30013, Taiwan (China); Lo, Cheng-Yao, E-mail: chengyao@mx.nthu.edu.tw [Department of Power Mechanical Engineering, National Tsing Hua University, 101, Section 2, Kuang Fu Road, Hsin Chu 30013, Taiwan (China); Institute of NanoEngineering and MicroSystems, National Tsing Hua University, 101, Section 2, Kuang Fu Road, Hsin Chu 30013, Taiwan (China)

    2014-10-13

    This paper proposes a non-wavelength-shortening-related critical dimension and pattern size reduction solution for the integrated circuit industry that entails generating strain on the substrate prior to lithography. Pattern size reduction of up to 49% was achieved regardless of shape, location, and size on the xy plane, and complete theoretical calculations and process steps are described in this paper. This technique can be applied to enhance pattern resolution by employing materials and process parameters already in use and, thus, to enhance the capability of outdated lithography facilities, enabling them to particularly support the manufacturing of flexible electronic devices with polymer substrates.

  19. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity of NaturalDukeWakefieldSulfateSciTechtail.Theory ofDidDevelopment Top LDRDUniversitySchedules Print Current Science

  20. Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservation ofAlbuquerque| Stanford SynchrotronVideo-Contest Sign In AboutBiologicalScience

  1. Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist

    E-Print Network [OSTI]

    Manfrinato, Vitor R.

    We fabricated 9–30 nm half-pitch nested Ls and 13–15 nm half-pitch dot arrays, using 2 keV electron-beam lithography with hydrogen silsesquioxane (HSQ) as the resist. All structures with 15 nm half-pitch and above were ...

  2. Pattern transfer of electron beam modified self-assembled monolayers for high-resolution lithography

    E-Print Network [OSTI]

    Parikh, Atul N.

    Pattern transfer of electron beam modified self-assembled monolayers for high-resolution electron beam lithography. Focused electron beams from 1 to 50 keV and scanning tunneling microscopy at 10 of electron beam damage on the monolayers and the subsequent etching reactions has been explored through x

  3. Energy flow in light-coupling masks for lensless optical lithography

    E-Print Network [OSTI]

    Floreano, Dario

    Energy flow in light-coupling masks for lensless optical lithography Olivier J. F. Martin@zurich.ibm.com Abstract: We illustrate the propagation of light in a new type of coupling mask for lensless optical. Biebuck, B. Michel, O.J.F. Martin and N.B. Piller, "Light-coupling masks: an alternative, lensless

  4. IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 5, NO. 1, JANUARY 2006 3 Nanopatterning With Interferometric Lithography

    E-Print Network [OSTI]

    Rocca, Jorge J.

    IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 5, NO. 1, JANUARY 2006 3 Nanopatterning the potential of compact EUV lasers in nanotechnology applications. Index Terms--Nanotechnology, photolithography, X-ray lasers, X-ray lithography. THE increasing activity in nanotechnology and nanoscience fuels

  5. INTEGRATED SIMULATION OF DISCHARGE AND LASER PRODUCED PLASMAS IN EUV LITHOGRAPHY DEVICES

    E-Print Network [OSTI]

    Harilal, S. S.

    of the plasma energy that includes thermal energy of electron and ionization energy; ie - ion component to support the throughput requirements of High-Volume Manufacturing lithography exposure tools. One method not only of power sources but also plasma irradiation parameters, plasma energy deposition, target material

  6. Low-voltage spatial-phase-locked scanning-electron-beam lithography

    E-Print Network [OSTI]

    Cheong, Lin Lee

    2010-01-01

    Spatial-phase-locked electron-beam lithography (SPLEBL) is a method that tracks and corrects the position of an electron-beam in real-time by using a reference grid placed above the electron-beam resist. In this thesis, ...

  7. Silicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible molds

    E-Print Network [OSTI]

    Arnold, Craig B.

    ) The lithium ion battery, a preferred energy storage technology, is limited by its volumetric and gravimetric. INTRODUCTION The lithium ion battery has become the energy storage me- dium of choice for almost allSilicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible

  8. Optimization Criteria for SRAM Design -Lithography Contribution Daniel C. Cole,b

    E-Print Network [OSTI]

    Cole, Dan C.

    Optimization Criteria for SRAM Design - Lithography Contribution Daniel C. Cole,b Orest Bula, to predict and "optimize" the printed shapes through all critical levels in a dense SRAM design. Our key emphasis here is on "optimization criteria," namely, having achieved good predictability for printability

  9. Heidelberg DWL66 Direct Write Lithography System Biomolecular Nanotechnology Center, UC Berkeley

    E-Print Network [OSTI]

    Healy, Kevin Edward

    Heidelberg DWL66 Direct Write Lithography System Biomolecular Nanotechnology Center, UC Berkeley Standard Operating Procedure Prepared By: Frankie Myers (fbm@berkeley.edu) Updated: July 30, 2010, Peter Ledochowitz) may use this machine. Qualification must include one supervised run. SAFETY WARNING

  10. Sub-10 nm imprint lithography and applications Stephen Y. Chou,a)

    E-Print Network [OSTI]

    imprint. Moreover, imprint lithography was used to fabricate the silicon quantum dot, wire, and ring to the ultrasmall force in tapping mode, both the nano-CD and the scanning probe will not show noticeable wear after-cost nanopatterning technology, particularly a nanolithography which allows complete free- dom in designing the size

  11. Flexible CO2 laser system for fundamental research related to an extreme ultraviolet lithography source

    E-Print Network [OSTI]

    Najmabadi, Farrokh

    Flexible CO2 laser system for fundamental research related to an extreme ultraviolet lithography 2009; published online 10 December 2009 A CO2 laser system with flexible parameters was developed 1010 W/cm2 . Utilizing this CO2 MOPA laser system, high conversion efficiency from laser to in-band 2

  12. Room-temperature Si single-electron memory fabricated by nanoimprint lithography

    E-Print Network [OSTI]

    , Haixiong Ge, Christopher Keimel, and Stephen Y. Chou NanoStructure Laboratory, Department of Electrical using nanoimprint lithography NIL . The devices consist of a narrow channel metal­ oxide­semiconductor field-effect transistor and a sub-10-nm storage dot, which is located between the channel and the gate

  13. Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions

    E-Print Network [OSTI]

    Konkola, Paul Thomas, 1973-

    2003-01-01

    This thesis describes the design and analysis of a system for patterning large-area gratings with nanometer level phase distortions. The novel patterning method, termed scanning beam interference lithography (SBIL), uses ...

  14. Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist

    E-Print Network [OSTI]

    Berggren, Karl K.

    Developing high-resolution resists and processes for electron-beam lithography is of great importance for high-density magnetic storage, integrated circuits, and nanoelectronic and nanophotonic devices. Until now, hydrogen ...

  15. Graphene Edge Lithography Guibai Xie, Zhiwen Shi, Rong Yang, Donghua Liu, Wei Yang, Meng Cheng, Duoming Wang, Dongxia Shi,

    E-Print Network [OSTI]

    Zhang, Guangyu

    Graphene Edge Lithography Guibai Xie, Zhiwen Shi, Rong Yang, Donghua Liu, Wei Yang, Meng Cheng: Fabrication of graphene nanostructures is of importance for both investigating their intrinsic physical approach for graphene nanostructures. Compared with conventional lithographic fabrication techniques

  16. Integration of a 2D Periodic Nanopattern Into Thin Film Polycrystalline Silicon Solar Cells by Nanoimprint Lithography

    E-Print Network [OSTI]

    Abdo, Islam; Deckers, Jan; Depauw, Valérie; Tous, Loic; Van Gestel, Dries; Guindi, Rafik; Gordon, Ivan; Daif, Ounsi El

    2015-01-01

    The integration of two-dimensional (2D) periodic nanopattern defined by nanoimprint lithography and dry etching into aluminum induced crystallization (AIC) based polycrystalline silicon (Poly-Si) thin film solar cells is investigated experimentally. Compared to the unpatterned cell an increase of 6% in the light absorption has been achieved thanks to the nanopattern which, in turn, increased the short circuit current from 20.6 mA/cm2 to 23.8 mA/cm2. The efficiency, on the other hand, has limitedly increased from 6.4% to 6.7%. We show using the transfer length method (TLM) that the surface topography modification caused by the nanopattern has increased the sheet resistance of the antireflection coating (ARC) layer as well as the contact resistance between the ARC layer and the emitter front contacts. This, in turn, resulted in increased series resistance of the nanopatterned cell which has translated into a decreased fill factor, explaining the limited increase in efficiency.

  17. Nanofabrication of super-high-aspect-ratio structures in hydrogen silsesquioxane from direct-write e-beam lithography and hot development.

    SciTech Connect (OSTI)

    Ocola, L. E.; Tirumala, V. R.; Center for Nanoscale Materials; NIST

    2008-11-01

    Super-high-aspect-ratio structures (>10) in hydrogen silsesquioxane resist using direct write electron beam lithography at 100 kV and hot development and rinse are reported. Posts of 100 nm in width and 1.2 {micro}m tall have been successfully fabricated without the need of supercritical drying. Hot rinse solution with isopropyl alcohol has been used to reduce surface tension effects during drying. Dose absorption effects have been observed and modeled using known Monte Carlo models. These results indicate that for e-beam exposures of thick negative resists (>1 {micro}m), the bottom of the structures will have less cross-link density and therefore will be less stiff than the top. These results will have impact in the design of high-aspect-ratio structures that can be used in microelectromechanical system devices and high-aspect-ratio Fresnel zone plates.

  18. Extreme-UV lithography vacuum chamber zone seal

    DOE Patents [OSTI]

    Haney, Steven J. (Tracy, CA); Herron, Donald Joe (Manteca, CA); Klebanoff, Leonard E. (San Ramon, CA); Replogle, William C. (Livermore, CA)

    2001-01-01

    Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

  19. Extreme-UV lithography vacuum chamber zone seal

    DOE Patents [OSTI]

    Haney, Steven J. (Tracy, CA); Herron, Donald Joe (Manteca, CA); Klebanoff, Leonard E. (San Ramon, CA); Replogle, William C. (Livermore, CA)

    2003-04-15

    Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

  20. Extreme-UV lithography vacuum chamber zone seal

    DOE Patents [OSTI]

    Haney, Steven J. (Tracy, CA); Herron, Donald Joe (Manteca, CA); Klebanoff, Leonard E. (San Ramon, CA); Replogle, William C. (Livermore, CA)

    2003-04-08

    Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

  1. Nanoscale GaAs metalsemiconductormetal photodetectors fabricated using nanoimprint lithography

    E-Print Network [OSTI]

    ­V) characteristics of the contacts are very sensi- tive to the surface states and defects. In this letter, we report mold with interdigited fin- gers was first created on a silicon substrate. Next, a layer of polymethylmethancrylate PMMA was spun on a semi- insulating SI GaAs substrate. Before imprinting, both the mold

  2. Biochemical Lithography - Templating of supported lipid bilayers driven by

    Office of Scientific and Technical Information (OSTI)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity of NaturalDukeWakefieldSulfate Reducing Bacteria (Technical Report) | SciTechReport) |ScienceSciTechSciTech(JournalReport)

  3. Colloids and Surfaces A: Physicochem. Eng. Aspects 441 (2014) 262274 Contents lists available at ScienceDirect

    E-Print Network [OSTI]

    Kandlikar, Satish

    2014-01-01

    accurately. · Model was verified with experiments using two base and four sidewall materials. · Surface channel PEMFC Contact angle Surface energy a b s t r a c t Water droplet­sidewall interactions cells (PEMFCs), removal of water droplets emerging from the base of a horizontal gas diffusion layer

  4. SURFACE SCIENCE, WETTING, CONDENSATION, ENGINEERED Correspondence and requests for materials: konradr@asu.edu and varanasi@mit.edu

    E-Print Network [OSTI]

    body of work devoted to surface engineering for promoting dropwise condensation heat transfer of steam of these fluids, re-entrant omniphobic surfaces became flooded and reverted to filmwise condensation. We also mechanisms, methods, and materials for enhancing the condensation heat transfer rate of steam by promoting

  5. International Snow Science Workshop Grenoble Chamonix Mont-Blanc -2013 Spatial predictions of surface hoar and crust formation

    E-Print Network [OSTI]

    Jamieson, Bruce

    International Snow Science Workshop Grenoble ­ Chamonix Mont-Blanc - 2013 Spatial predictions grids). The latent heat flux and net shortwave radiation were modelled with the snow cover model INTRODUCTION Destructive snow slab avalanches often res- ult from failure in persistent layers such as sur

  6. Soil and Water Science Department University of Florida Background concentrations of trace metals in Florida surface soils

    E-Print Network [OSTI]

    Ma, Lena

    locations, will be analyzed using a SAS statistical program (SAS, 1987). GIS softwares Arc/Info and Arc View surface soils is critical for evaluating land application of non-hazardous waste materials. Concentrations

  7. Multiscale Studies of the Formation and Stability of Surface-based Nanostructures, DOE Computational Materials Science Network - Final Report

    SciTech Connect (OSTI)

    Einstein, Theodore L.

    2011-10-31

    Summary of work performed under DOE-CMSN/FG0205ER46227, Multiscale Studies of the Formation and Stability of Surface-based Nanostructures, listing publications, collaborations, and presentations.

  8. Low thermal distortion extreme-UV lithography reticle

    DOE Patents [OSTI]

    Gianoulakis, Steven E. (Albuquerque, NM); Ray-Chaudhuri, Avijit K. (Livermore, CA)

    2001-01-01

    Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

  9. Low thermal distortion extreme-UV lithography reticle

    DOE Patents [OSTI]

    Gianoulakis, Steven E. (Albuquerque, NM); Ray-Chaudhuri, Avijit K. (Livermore, CA)

    2002-01-01

    Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

  10. Low thermal distortion Extreme-UV lithography reticle and method

    DOE Patents [OSTI]

    Gianoulakis, Steven E. (Albuquerque, NM); Ray-Chaudhuri, Avijit K. (Livermore, CA)

    2002-01-01

    Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

  11. Experimental and Numerical Investigation of Pool Boiling Heat Transfer on Engineered Nano-Finned Surfaces 

    E-Print Network [OSTI]

    Yang, Hongjoo

    2014-08-10

    and Flash Imprint Lithography ......................................................... 45 2.3.5. Pattern Transfer ......................................................................................... 47 2.3.6. Silica and Nickel Nanofin, TFT... .................................................................................. 188 8.1. Experimental Results...................................................................................... 188 8.1.1. Nickel Flat Surface ................................................................................. 188 8.1.2. Nickel...

  12. Achieving clean epitaxial graphene surfaces suitable for device applications by improved lithographic process

    SciTech Connect (OSTI)

    Nath, A., E-mail: anath@gmu.edu; Rao, M. V. [George Mason University, 4400 University Dr., Fairfax, Virginia 22030 (United States); Koehler, A. D.; Jernigan, G. G.; Wheeler, V. D.; Hite, J. K.; Hernández, S. C.; Robinson, Z. R.; Myers-Ward, R. L.; Eddy, C. R.; Gaskill, D. K. [U.S. Naval Research Laboratory, 4555 Overlook Ave. SW, Washington, D.C. 20375 (United States); Garces, N. Y. [Sotera Defense Solutions, 2200 Defense Hwy. Suite 405, Crofton, Maryland 21114 (United States)

    2014-06-02

    It is well-known that the performance of graphene electronic devices is often limited by extrinsic scattering related to resist residue from transfer, lithography, and other processes. Here, we report a polymer-assisted fabrication procedure that produces a clean graphene surface following device fabrication by a standard lithography process. The effectiveness of this improved lithography process is demonstrated by examining the temperature dependence of epitaxial graphene-metal contact resistance using the transfer length method for Ti/Au (10?nm/50?nm) metallization. The Landauer-Buttiker model was used to explain carrier transport at the graphene-metal interface as a function of temperature. At room temperature, a contact resistance of 140 ?-?m was obtained after a thermal anneal at 523?K for 2?hr under vacuum, which is comparable to state-of-the-art values.

  13. Ice-assisted electron beam lithography of graphene This article has been downloaded from IOPscience. Please scroll down to see the full text article.

    E-Print Network [OSTI]

    Ice-assisted electron beam lithography of graphene This article has been downloaded from IOPscience-assisted electron beam lithography of graphene Jules A Gardener1 and J A Golovchenko1,2 1 Department of Physics demonstrate that a low energy focused electron beam can locally pattern graphene coated with a thin ice layer

  14. Fabrication of ZnO photonic crystals by nanosphere lithography using inductively coupled-plasma reactive ion etching with CH{sub 4}/H{sub 2}/Ar plasma on the ZnO/GaN heterojunction light emitting diodes

    SciTech Connect (OSTI)

    Chen, Shr-Jia; Chang, Chun-Ming; Kao, Jiann-Shiun; Chen, Fu-Rong; Tsai, Chuen-Horng [Engineering and System Science, National Tsing Hua University, Hsinchu, 30013 Taiwan (China); Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, 300 Taiwan (China); Engineering and System Science, National Tsing Hua University, Hsinchu, 30013 Taiwan (China)

    2010-07-15

    This article reports fabrication of n-ZnO photonic crystal/p-GaN light emitting diode (LED) by nanosphere lithography to further booster the light efficiency. In this article, the fabrication of ZnO photonic crystals is carried out by nanosphere lithography using inductively coupled plasma reactive ion etching with CH{sub 4}/H{sub 2}/Ar plasma on the n-ZnO/p-GaN heterojunction LEDs. The CH{sub 4}/H{sub 2}/Ar mixed gas gives high etching rate of n-ZnO film, which yields a better surface morphology and results less plasma-induced damages of the n-ZnO film. Optimal ZnO lattice parameters of 200 nm and air fill factor from 0.35 to 0.65 were obtained from fitting the spectrum of n-ZnO/p-GaN LED using a MATLAB code. In this article, we will show our recent result that a ZnO photonic crystal cylinder has been fabricated using polystyrene nanosphere mask with lattice parameter of 200 nm and radius of hole around 70 nm. Surface morphology of ZnO photonic crystal was examined by scanning electron microscope.

  15. 2048 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 30, NO. 5, OCTOBER 2002 Plasma Molding Over Surface Topography

    E-Print Network [OSTI]

    Economou, Demetre J.

    Topography: Simulation of Ion Flow, and Energy and Angular Distributions Over Steps in RF High model was developed to study plasma "molding" over surface topography. The radio frequency (RF) sheath topography. The intermediate case is shown as L H [case (ii)]. the ion flux, IED, and ion angular

  16. Facile electron-beam lithography technique for irregular and fragile substrates

    SciTech Connect (OSTI)

    Chang, Jiyoung; Zhou, Qin; Zettl, Alex, E-mail: azettl@berkeley.edu [Department of Physics, University of California at Berkeley, Berkeley, California 94720 (United States); Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Kavli Energy NanoSciences Institute at the University of California, Berkeley, California 94720 (United States)

    2014-10-27

    A facile technique is presented which enables high-resolution electron beam lithography on irregularly-shaped, non-planar or fragile substrates such as the edges of a silicon chip, thin and narrow suspended beams and bridges, or small cylindrical wires. The method involves a spin-free dry-transfer of pre-formed uniform-thickness polymethyl methacrylate, followed by conventional electron beam writing, metal deposition, and lift-off. High-resolution patterning is demonstrated for challenging target substrates. The technique should find broad application in micro- and nano-technology research arenas.

  17. Wafer chamber having a gas curtain for extreme-UV lithography

    DOE Patents [OSTI]

    Kanouff, Michael P. (Livermore, CA); Ray-Chaudhuri, Avijit K. (Livermore, CA)

    2001-01-01

    An EUVL device includes a wafer chamber that is separated from the upstream optics by a barrier having an aperture that is permeable to the inert gas. Maintaining an inert gas curtain in the proximity of a wafer positioned in a chamber of an extreme ultraviolet lithography device can effectively prevent contaminants from reaching the optics in an extreme ultraviolet photolithography device even though solid window filters are not employed between the source of reflected radiation, e.g., the camera, and the wafer. The inert gas removes the contaminants by entrainment.

  18. Soft holographic interference lithography microlens for enhanced organic light emitting diode light extraction

    SciTech Connect (OSTI)

    Park, Joong-Mok; Gan, Zhengqing; Leung, Wai Y.; Liu, Rui; Ye, Zhuo; Constant, Kristen; Shinar, Joseph; Shinar, Ruth; Ho, Kai-Ming

    2011-06-06

    Very uniform 2 {micro}m-pitch square microlens arrays ({micro}LAs), embossed on the blank glass side of an indium-tin-oxide (ITO)-coated 1.1 mm-thick glass, are used to enhance light extraction from organic light-emitting diodes (OLEDs) by {approx}100%, significantly higher than enhancements reported previously. The array design and size relative to the OLED pixel size appear to be responsible for this enhancement. The arrays are fabricated by very economical soft lithography imprinting of a polydimethylsiloxane (PDMS) mold (itself obtained from a Ni master stamp that is generated from holographic interference lithography of a photoresist) on a UV-curable polyurethane drop placed on the glass. Green and blue OLEDs are then fabricated on the ITO to complete the device. When the {mu}LA is {approx}15 x 15 mm{sup 2}, i.e., much larger than the {approx}3 x 3 mm{sup 2} OLED pixel, the electroluminescence (EL) in the forward direction is enhanced by {approx}100%. Similarly, a 19 x 25 mm{sup 2} {mu}LA enhances the EL extracted from a 3 x 3 array of 2 x 2 mm{sup 2} OLED pixels by 96%. Simulations that include the effects of absorption in the organic and ITO layers are in accordance with the experimental results and indicate that a thinner 0.7 mm thick glass would yield a {approx}140% enhancement.

  19. 3D microfabrication of single-wall carbon nanotube/polymer composites by two-photon polymerization lithography

    E-Print Network [OSTI]

    Natelson, Douglas

    3D microfabrication of single-wall carbon nanotube/polymer composites by two-photon polymerization online 16 March 2013 A B S T R A C T We present a method to develop single-wall carbon nanotube (SWCNT)/polymer-photon polymerization lithography, allows one to fabricate three-dimensional SWCNT/polymer composites with a minimum

  20. Polymer sphere lithography for solid oxide fuel cells: a route to functional, well-defined electrode structures

    E-Print Network [OSTI]

    Polymer sphere lithography for solid oxide fuel cells: a route to functional, well. Introduction Dramatic breakthroughs in the materials, particularly electrode materials, for solid oxide fuel cells (SOFCs) have been reported in recent years.1­3 Fundamental understanding of the electro- catalytic

  1. Feature filling modeling for step and flash imprint lithography Siddharth Chauhan, Frank Palmieri, Roger T. Bonnecaze,a

    E-Print Network [OSTI]

    : 10.1116/1.3147212 I. INTRODUCTION Step and flash imprint lithography SFIL is a low pres- sure molding technology of integrated circuits ICs , including high throughput and low defects, necessitate nearly perfect defect-free imprinting in SFIL. Complete filling of features during the imprint step is imperative

  2. 714 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 38, NO. 4, APRIL 2010 Interaction of a CO2 Laser Pulse With Tin-Based

    E-Print Network [OSTI]

    Najmabadi, Farrokh

    714 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 38, NO. 4, APRIL 2010 Interaction of a CO2 Laser--The interaction of a CO2 laser pulse with Sn-based plasma for a 13.5-nm extreme ultraviolet (EUV) lithography source was investigated. It was noted that a CO2 laser with wavelength of 10.6 m is more sensitive

  3. Science Park Science Park

    E-Print Network [OSTI]

    Koolen, Marijn

    Science Park Science Park Science Park Science Park Science Park Kruislaan Kruislaan Science Park SURFsara NLeSC Polder Anna Hoeve Telecity Matrix Innovation Center AUC AMOLF ARCNL UvA Faculty of Science Equinix Universum CWI UvA Oerknal Meet & Eat Maslow Spar ACE Venture Lab IXA ILCA NS Amsterdam Science

  4. Method for the fabrication of three-dimensional microstructures by deep X-ray lithography

    DOE Patents [OSTI]

    Sweatt, William C.; Christenson, Todd R.

    2005-04-05

    A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.

  5. Progress in the fabrication of high aspect ratio zone plates by soft x-ray lithography.

    SciTech Connect (OSTI)

    Divan, R.; Mancini, D. C.; Moldovan, N. A.; Lai, B.; Assoufid, L.; Leondard, Q.; Cerrina, F.

    2002-08-13

    Soft x-ray lithography technology has been applied to fabrication of phase shifting Fresnel Zone Plate (FZP's) for hard x-rays. Effects of the exposure conditions, developing system, and electroplating process parameters on line width and aspect ratio have been analyzed. The process has been optimized and an aspect ratio of 11 has been achieved for 110 nm outermost zone width. SEM and AFM have been used for preliminary metrology of the FZPs. The FZP optical performance was characterized at 8 keV photon energy at the 2-ID-D beam line at the Advanced Photon Source. Focusing efficiencies of 23% for FZPs apertures to 100 microns and 18% for 150-micron-diameter apertures have been obtained. The parameters of the fabricated FZP are in good agreement with the predicted values.

  6. Study of nano imprinting using soft lithography on Krafty glue and PVDF polymer thin films

    SciTech Connect (OSTI)

    Sankar, M. S. Ravi, E-mail: rameshg.phy@pondiuni.edu; Gangineni, Ramesh Babu, E-mail: rameshg.phy@pondiuni.edu [Department of Physics, Pondicherry University, R. V. Nagar, Kalapet, Puducherry - 605014 (India)

    2014-04-24

    The present work reveals soft lithography strategy based on self assembly and replica molding for carrying out micro and nanofabrication. It provides a convenient, effective and very low cost method for the formation and manufacturing of micro and nano structures. Al-layer of compact disc (sony CD-R) used as a stamp with patterned relief structures to generate patterns and structures with pattern size of 100nm height, 1.7 ?m wide. In literature, PDMS (Polydimethylsiloxane) solution is widely used to get negative copy of the Al-layer. In this work, we have used inexpensive white glue (Polyvinylacetate + water), 15gm (?5) and PVDF (Polyvinylidene difluoride) spin coated films and successfully transferred the nano patterns of Al layer on to white glue and PVDF films.

  7. Interfacial and Surface Science | Materials Science | NREL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantityBonneville Power Administration would likeUniverseIMPACT EVALUATION PLANIsProcess Relevant to Carbon

  8. Science Outreach Science Outreach

    E-Print Network [OSTI]

    Kavanagh, Karen L.

    Science Outreach Science Outreach AT SFU'S FACULTY OF SCIENCE OUR PASSION IS SCIENCE EDUCATION At SFU's Faculty of Science our passion is science education #12;coming sooncoming soon The Trottier 2015. The Trottier Observatory will be an anchor for a science plaza located in front of Strand Hall

  9. Tuning the interaction between propagating and localized surface plasmons for surface enhanced Raman scattering in water for biomedical and environmental applications

    SciTech Connect (OSTI)

    Shioi, Masahiko; Jans, Hilde; Lodewijks, Kristof; Van Dorpe, Pol; Lagae, Liesbet; Kawamura, Tatsuro

    2014-06-16

    With a view to biomedical and environmental applications, we investigate the plasmonic properties of a rectangular gold nanodisk array in water to boost surface enhanced Raman scattering (SERS) effects. To control the resonance wavelengths of the surface plasmon polariton and the localized surface plasmon, their dependence on the array period and diameter in water is studied in detail using a finite difference time domain method. A good agreement is obtained between calculated resonant wavelengths and those of gold nanodisk arrays fabricated using electron beam lithography. For the optimized structure, a SERS enhancement factor of 7.8?×?10{sup 7} is achieved in water experimentally.

  10. SCIENCE CHINA Technological Sciences

    E-Print Network [OSTI]

    Liu, Yijun

    turbines, jet engines, nuclear power plants and space crafts, have placed severe demands on highSCIENCE CHINA Technological Sciences © Science China Press and Springer-Verlag Berlin Heidelberg

  11. Fusion Engineering ScienceFusion Engineering Science Subgroup ASubgroup A Subgroup BSubgroup B

    E-Print Network [OSTI]

    California at Los Angeles, University of

    Fusion Engineering ScienceFusion Engineering Science Subgroup ASubgroup A Subgroup BSubgroup B chamber engineering science knowledge base moves to the forefront of issues. This knowledge base in structural materials - fundamental deformation and fracture mechanisms in materials - surface chemistry

  12. Findiing Science with Science Page 1 Finding Science with Science

    E-Print Network [OSTI]

    Stock, Kristin

    Findiing Science with Science Page 1 Finding Science with Science: Evaluating the Use Stojanovicd , Femke Reitsmae , Lukasz Korczynskif and Boyan Brodaricg a Centre for Geospatial Science of Earth and Ocean Sciences, Cardiff University, Cardiff, UK; e Department of Geography, University

  13. PROTECTIVE SURFACE COATINGS ON SEMICONDUCTOR NUCLEAR RADIATION DETECTORS

    E-Print Network [OSTI]

    Hansen, W.L.

    2010-01-01

    Science PROTECTIVE SURFACE COATINGS ON SEMICONDUCTOR NUCLEARF PROTECTIVE SURFACE COATINGS ON SEMICONDUCTOR NUCLEARchannel for one particular coating is unrelated to the

  14. Ecological Screening Values for Surface Water, Sediment, and...

    Office of Scientific and Technical Information (OSTI)

    Ecological Screening Values for Surface Water, Sediment, and Soil Friday, G. P. 54 ENVIRONMENTAL SCIENCES; SOILS; SURFACE WATERS; SEDIMENTS; ECOLOGICAL CONCENTRATION; ENVIRONMENTAL...

  15. The effect of rhenium, sulfur and alumina on the conversion of hydrocarbons over platinum single crystals: Surface science and catalytic studies

    SciTech Connect (OSTI)

    Kim, C.

    1992-04-01

    Conversion reactions of hydrocarbons over Pt-Re model catalyst surfaces modified by sulfur and alumina have been studied. A plasma deposition source has been developed to deposit Pt, Re, and Al on metal substrates variable coverage in ultrahigh vacuum without excessive heating. Conversion of n-hexane was performed over the Re-covered Pt and Pt-covered Re surfaces. The presence of the second metal increased hydrogenolysis activity of both Pt-Re surfaces. Addition of sulfur on the model Catalyst surfaces suppressed hydrogenolysis activity and increased the cyclization rate of n-hexane to methylcyclopentane over Pt-Re surfaces. Sulfiding also increased the dehydrogenation rate of cyclohexane to benzene Over Pt-Re surfaces. It has been proposed that the PtRe bimetallic catalysts show unique properties when combined with sulfur, and electronic interactions exist between platinum, rhenium and sulfur. Decomposition of hydrocarbons on the sulfur-covered Pt-Re surfaces supported that argument. For the conversion of 1-butene over the planar Pt/AlO[sub x], the addition of Pt increased the selectivity of hydrogenation over isomerization.

  16. The effect of rhenium, sulfur and alumina on the conversion of hydrocarbons over platinum single crystals: Surface science and catalytic studies

    SciTech Connect (OSTI)

    Kim, C.

    1992-04-01

    Conversion reactions of hydrocarbons over Pt-Re model catalyst surfaces modified by sulfur and alumina have been studied. A plasma deposition source has been developed to deposit Pt, Re, and Al on metal substrates variable coverage in ultrahigh vacuum without excessive heating. Conversion of n-hexane was performed over the Re-covered Pt and Pt-covered Re surfaces. The presence of the second metal increased hydrogenolysis activity of both Pt-Re surfaces. Addition of sulfur on the model Catalyst surfaces suppressed hydrogenolysis activity and increased the cyclization rate of n-hexane to methylcyclopentane over Pt-Re surfaces. Sulfiding also increased the dehydrogenation rate of cyclohexane to benzene Over Pt-Re surfaces. It has been proposed that the PtRe bimetallic catalysts show unique properties when combined with sulfur, and electronic interactions exist between platinum, rhenium and sulfur. Decomposition of hydrocarbons on the sulfur-covered Pt-Re surfaces supported that argument. For the conversion of 1-butene over the planar Pt/AlO{sub x}, the addition of Pt increased the selectivity of hydrogenation over isomerization.

  17. Resolution Improvement and Pattern Generator Development for the Maskless Micro-Ion-Beam Reduction Lithography System

    E-Print Network [OSTI]

    Jiang, Ximan

    2006-01-01

    ion is 10.0 eV. Assuming the surface charging generates aneV 84 mrad Switching pad and connection wire: 0 volt Insulator 1.0 volt surface chargingeV in this region. Consequently, ion trajectories are very sensitive to the surface charging

  18. Demonstration of electronic pattern switching and 10x pattern demagnification in a maskless micro-ion beam reduction lithography system

    SciTech Connect (OSTI)

    Ngo, V.V.; Akker, B.; Leung, K.N.; Noh, I.; Scott, K.L.; Wilde, S.

    2002-05-31

    A proof-of-principle ion projection lithography (IPL) system called Maskless Micro-ion beam Reduction Lithography (MMRL) has been developed and tested at the Lawrence Berkeley National Laboratory (LBNL) for future integrated circuits (ICs) manufacturing and thin film media patterning [1]. This MMRL system is aimed at completely eliminating the first stage of the conventional IPL system [2] that contains the complicated beam optics design in front of the stencil mask and the mask itself. It consists of a multicusp RF plasma generator, a multi-beamlet pattern generator, and an all-electrostatic ion optical column. Results from ion beam exposures on PMMA and Shipley UVII-HS resists using 75 keV H+ are presented in this paper. Proof-of-principle electronic pattern switching together with 10x reduction ion optics (using a pattern generator made of nine 50-{micro}m switchable apertures) has been performed and is reported in this paper. In addition, the fabrication of a micro-fabricated pattern generator [3] on an SOI membrane is also presented.

  19. Surface Modification by Atmospheric Pressure Plasma for Improved Bonding

    E-Print Network [OSTI]

    Williams, Thomas Scott

    2013-01-01

    polymer, composite and metal surfaces for adhesion. This thesis investigates the underlying materials science of this technology.

  20. Sub-50 nm scratch-proof DLC molds for reversal nanoimprint lithography L. Tao, C. T. Nelson, K. Trivedi, S. Ramachandran, M. Goeckner, L. Overzet, and Walter Hua)

    E-Print Network [OSTI]

    Hu, Wenchuang "Walter"

    Sub-50 nm scratch-proof DLC molds for reversal nanoimprint lithography L. Tao, C. T. Nelson, K of the industry is related to the mold life time that significantly affects cost of ownership and manufacturing reproducibility. Nowadays, most often used Si or glass molds that are very expensive can be damaged after certain

  1. A microfluidic microbial fuel cell fabricated by soft lithography Fang Qian a,b,

    E-Print Network [OSTI]

    Li, Yat

    ). In contrast, the use of carbon-based electrod, Santa Cruz, CA 95064, USA b Physical and Life Sciences Directorate, Lawrence Livermore National design includes a unique sub-5 lL polydimethylsiloxane soft chamber featuring carbon cloth electrodes

  2. Earth Sciences Environmental Earth Sciences,

    E-Print Network [OSTI]

    Brierley, Andrew

    86 Earth Sciences­ Environmental Earth Sciences, Geology Degree options MGeol (Single Honours Degrees) Earth Sciences BSc (Single Honours Degrees) Environmental Earth Sciences Geology BSc (Joint. * The Geology and Environmental Earth Sciences degrees are accredited by the Geological Society of London

  3. Earth Sciences Environmental Earth Sciences,

    E-Print Network [OSTI]

    Brierley, Andrew

    94 Earth Sciences­ Environmental Earth Sciences, Geology Degree options MGeol (Single Honours Degrees) Earth Sciences BSc (Single Honours Degrees) Environmental Earth Sciences Geology BSc (Joint placement. * The Geology and Environmental Earth Sciences degrees are accredited by the Geological Society

  4. SCIENCE CHINA Technological Sciences

    E-Print Network [OSTI]

    Ahmad, Sajjad

    SCIENCE CHINA Technological Sciences © Science China Press and Springer-Verlag Berlin Heidelberg HU HongChang, TIAN FuQiang* & HU HePing Department of Hydraulic Engineering, State Key Laboratory as a key soil physical parameter and has been widely used to predict soil hydraulic and other related

  5. Creating bio-inspired hierarchical 3D-2D photonic stacks via planar lithography on self-assembled inverse opals

    E-Print Network [OSTI]

    Ian B. Burgess; Joanna Aizenberg; Marko Loncar

    2012-11-29

    Structural hierarchy and complex 3D architecture are characteristics of biological photonic designs that are challenging to reproduce in synthetic materials. Top-down lithography allows for designer patterning of arbitrary shapes, but is largely restricted to planar 2D structures. Self-assembly techniques facilitate easy fabrication of 3D photonic crystals, but controllable defect-integration is difficult. In this paper we combine the advantages of top-down and bottom-up fabrication, developing two techniques to deposit 2D-lithographically-patterned planar layers on top of or in between inverse-opal 3D photonic crystals and creating hierarchical structures that resemble the architecture of the bright green wing scales of the butterfly, Parides sesostris. These fabrication procedures, combining advantages of both top-down and bottom-up fabrication, may prove useful in the development of omnidirectional coloration elements and 3D-2D photonic crystal devices.

  6. Creating bio-inspired hierarchical 3D-2D photonic stacks via planar lithography on self-assembled inverse opals

    E-Print Network [OSTI]

    Burgess, Ian B; Loncar, Marko

    2012-01-01

    Structural hierarchy and complex 3D architecture are characteristics of biological photonic designs that are challenging to reproduce in synthetic materials. Top-down lithography allows for designer patterning of arbitrary shapes, but is largely restricted to planar 2D structures. Self-assembly techniques facilitate easy fabrication of 3D photonic crystals, but controllable defect-integration is difficult. In this paper we combine the advantages of top-down and bottom-up fabrication, developing two techniques to deposit 2D-lithographically-patterned planar layers on top of or in between inverse-opal 3D photonic crystals and creating hierarchical structures that resemble the architecture of the bright green wing scales of the butterfly, Parides sesostris. These fabrication procedures, combining advantages of both top-down and bottom-up fabrication, may prove useful in the development of omnidirectional coloration elements and 3D-2D photonic crystal devices.

  7. Improving primary science great science

    E-Print Network [OSTI]

    Rambaut, Andrew

    Improving primary science Developing great science subject leadershipGreat ideas for primary science leaders from schools that value science. #12;2 | Primary science Where science has a good profile, investigative science with access to high-quality expertise, children are likely to enjoy learning the subject

  8. Surface figure control for coated optics

    DOE Patents [OSTI]

    Ray-Chaudhuri, Avijit K. (Livermore, CA); Spence, Paul A. (Pleasanton, CA); Kanouff, Michael P. (Livermore, CA)

    2001-01-01

    A pedestal optical substrate that simultaneously provides high substrate dynamic stiffness, provides low surface figure sensitivity to mechanical mounting hardware inputs, and constrains surface figure changes caused by optical coatings to be primarily spherical in nature. The pedestal optical substrate includes a disk-like optic or substrate section having a top surface that is coated, a disk-like base section that provides location at which the substrate can be mounted, and a connecting cylindrical section between the base and optics or substrate sections. The optic section has an optical section thickness.sup.2 /optical section diameter ratio of between about 5 to 10 mm, and a thickness variation between front and back surfaces of less than about 10%. The connecting cylindrical section may be attached via three spaced legs or members. However, the pedestal optical substrate can be manufactured from a solid piece of material to form a monolith, thus avoiding joints between the sections, or the disk-like base can be formed separately and connected to the connecting section. By way of example, the pedestal optical substrate may be utilized in the fabrication of optics for an extreme ultraviolet (EUV) lithography imaging system, or in any optical system requiring coated optics and substrates with reduced sensitivity to mechanical mounts.

  9. Science and Science Fiction

    ScienceCinema (OSTI)

    Scherrer, Robert [Vanderbilt University, Nashville, Tennessee, United States

    2009-09-01

    I will explore the similarities and differences between the process of writing science fiction and the process of 'producing' science, specifically theoretical physics. What are the ground rules for introducing unproven new ideas in science fiction, and how do they differ from the corresponding rules in physics? How predictive is science fiction? (For that matter, how predictive is theoretical physics?) I will also contrast the way in which information is presented in science fiction, as opposed to its presentation in scientific papers, and I will examine the relative importance of ideas (as opposed to the importance of the way in which these ideas are presented). Finally, I will discuss whether a background as a research scientist provides any advantage in writing science fiction.

  10. Science Mathematics Engineering

    E-Print Network [OSTI]

    Hamlet, Richard

    Science Mathematics Engineering . ­ p.1 #12;Science Mathematics Engineering Science, Computer `Science', . ­ p.1 #12;Science Mathematics Engineering Science, Computer `Science', Mathematics, . ­ p.1 #12;Science Mathematics Engineering Science, Computer `Science', Mathematics, and Software Development

  11. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell (218 Eastridge Dr., San Ramon, CA 94583-4905); Shafer, David (50 Drake La., Fairfield, CT 06430-2925)

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

  12. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell (315 Eastridge Dr., San Ramon, CA 94583-4905)

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 .mu.m.

  13. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell (218 Eastridge Dr., San Ramon, CA 84583-4905)

    2000-01-01

    An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.

  14. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell (218 Eastridge Dr., San Ramon, CA 94583-4905); Shafer, David R. (56 Drake La., Fairfield, CT 06430-2925)

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receive a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

  15. Surface Soil

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Surface Soil Surface Soil We compare local soil samples with samples collected from northern New Mexico locations that are beyond the range of potential influence from normal...

  16. Molecular-Scale Soft Imprint Lithography for Alignment Layers in Liquid Crystal

    E-Print Network [OSTI]

    Rogers, John A.

    , Beckman Institute, Frederick Seitz Materials Research Laboratory, UniVersity of Illinois at UrbanasChampaign, Urbana, Illinois 61801 Received March 8, 2007; Revised Manuscript Received April 19, 2007 ABSTRACT We involve the formation of surface relief structures that could serve as engineered sites for molecular

  17. Wine Science Wine Sciencee Science

    E-Print Network [OSTI]

    Wine Science Wine Sciencee Science Thomas Henick-Kling Professor of Enology Director of Viticulture & Enology Program #12;Wine Science Wine Science Growth of Washington Wine Industry #12;Wine Science Wine Science Wine Grapes utilized 2007 2008 2009 2010 WA 127,000 145,000 156,000 160,000 NY 24,000 26,000 30

  18. Faculty of Science General Science

    E-Print Network [OSTI]

    Faculty of Science General Science The General Science program gives you maximum flexibility to explore the sciences, plus the core requirements you need for on-going, specialized studies. www.uwindsor.ca/science Rigorous, Enriching Programs The BSc General Science program is a great way to explore your many interests

  19. 1 Biomedical Sciences BIOMEDICAL SCIENCES

    E-Print Network [OSTI]

    Vertes, Akos

    1 Biomedical Sciences BIOMEDICAL SCIENCES The interdisciplinary doctoral programs in the biomedical sciences are organized within the Institute for Biomedical Sciences. The first full year of study toward are admitted directly into the Institute for Biomedical Sciences through Columbian College of Arts and Sciences

  20. Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces

    DOE Patents [OSTI]

    Malinowski, Michael E.

    2005-01-25

    The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632.8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.

  1. Chemical Reactions at Surfaces

    SciTech Connect (OSTI)

    Michael Henderson and Nancy Ryan Gray

    2010-04-14

    Chemical reactions at surfaces underlie some of the most important processes of today, including catalysis, energy conversion, microelectronics, human health and the environment. Understanding surface chemical reactions at a fundamental level is at the core of the field of surface science. The Gordon Research Conference on Chemical Reactions at Surfaces is one of the premiere meetings in the field. The program this year will cover a broad range of topics, including heterogeneous catalysis and surface chemistry, surfaces in environmental chemistry and energy conversion, reactions at the liquid-solid and liquid-gas interface, electronic materials growth and surface modification, biological interfaces, and electrons and photons at surfaces. An exciting program is planned, with contributions from outstanding speakers and discussion leaders from the international scientific community. The conference provides a dynamic environment with ample time for discussion and interaction. Attendees are encouraged to present posters; the poster sessions are historically well attended and stimulate additional discussions. The conference provides an excellent opportunity for junior researchers (e.g. graduate students or postdocs) to present their work and interact with established leaders in the field.

  2. Computer Science Computer Science?

    E-Print Network [OSTI]

    Cafarella, Michael J.

    -M Programming, U-M Solar Car, Hybrid Racing, and the Mars Rover Team. Other groups that advance societal good. Michigan Hackers: Experimenting with technology gEECS: Girls in electrical engineering and computer science

  3. Is sustainability science really a science?

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Is sustainability science really a science? Is sustainability science really a science? The team's work shows that although sustainability science has been growing explosively...

  4. Materials Science & Engineering | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    More Science Home | Science & Discovery | More Science | Materials Science and Engineering SHARE Materials Science and Engineering ORNL's core capability in applied materials...

  5. Impact of polymer film thickness and cavity size on polymer flow during embossing : towards process design rules for nanoimprint lithography.

    SciTech Connect (OSTI)

    Schunk, Peter Randall; King, William P. (Georgia Institute of Technology, Atlanta, GA); Sun, Amy Cha-Tien; Rowland, Harry D.

    2006-08-01

    This paper presents continuum simulations of polymer flow during nanoimprint lithography (NIL). The simulations capture the underlying physics of polymer flow from the nanometer to millimeter length scale and examine geometry and thermophysical process quantities affecting cavity filling. Variations in embossing tool geometry and polymer film thickness during viscous flow distinguish different flow driving mechanisms. Three parameters can predict polymer deformation mode: cavity width to polymer thickness ratio, polymer supply ratio, and Capillary number. The ratio of cavity width to initial polymer film thickness determines vertically or laterally dominant deformation. The ratio of indenter width to residual film thickness measures polymer supply beneath the indenter which determines Stokes or squeeze flow. The local geometry ratios can predict a fill time based on laminar flow between plates, Stokes flow, or squeeze flow. Characteristic NIL capillary number based on geometry-dependent fill time distinguishes between capillary or viscous driven flows. The three parameters predict filling modes observed in published studies of NIL deformation over nanometer to millimeter length scales. The work seeks to establish process design rules for NIL and to provide tools for the rational design of NIL master templates, resist polymers, and process parameters.

  6. Self-Aligned Colloidal Lithography for Controllable and Tuneable Plasmonic Nanogaps

    E-Print Network [OSTI]

    Ding, Tao; Herrmann, Lars O.; de Nijs, Bart; Benz, Felix; Baumberg, Jeremy J.

    2014-12-15

    the Au NPs. Hence the Au NPs remain isolated from the Au fi lm and produce nanogaps in-between. The surface roughness of Au fi lms was char- acterized with atomic force microscopy (AFM, Figure S1a). The height profi le (Figure S1b) shows a very small... NPs and Au fi lm can be discerned using SEM (Figure 1 e-g) although it is diffi cult to clearly visualize the shape of the entire gap in such semi-embedded nanostructures. The thickness of the Au fi lms can be adjusted in order to tune the size...

  7. 3, 18091850, 2006 groundwater-surface

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    HESSD 3, 1809­1850, 2006 Measuring groundwater-surface water interactions: a review E. Kalbus et al System Sciences Measuring methods for groundwater, surface water and their interactions: a review E;HESSD 3, 1809­1850, 2006 Measuring groundwater-surface water interactions: a review E. Kalbus et al

  8. Probing hot-electron effects in wide area plasmonic surfaces using X-ray photoelectron spectroscopy

    SciTech Connect (OSTI)

    Ayas, Sencer; Cupallari, Andi; Dana, Aykutlu

    2014-12-01

    Plasmon enhanced hot carrier formation in metallic nanostructures increasingly attracts attention due to potential applications in photodetection, photocatalysis, and solar energy conversion. Here, hot-electron effects in nanoscale metal-insulator-metal (MIM) structures are investigated using a non-contact X-ray photoelectron spectroscopy based technique using continuous wave X-ray and laser excitations. The effects are observed through shifts of the binding energy of the top metal layer upon excitation with lasers of 445, 532, and 650?nm wavelength. The shifts are polarization dependent for plasmonic MIM grating structures fabricated by electron beam lithography. Wide area plasmonic MIM surfaces fabricated using a lithography free route by the dewetting of evaporated Ag on HfO{sub 2} exhibit polarization independent optical absorption and surface photovoltage. Using a simple model and making several assumptions about the magnitude of the photoemission current, the responsivity and external quantum efficiency of wide area plasmonic MIM surfaces are estimated as 500?nA/W and 11 × 10{sup ?6} for 445?nm illumination.

  9. Chapter 3 Migration on the C(110) Surface: Abinitio Computations

    E-Print Network [OSTI]

    Goddard III, William A.

    89 Chapter 3 Migration on the C(110) Surface: Ab­initio Computations 3.1 Introduction Mobile the competi­ tiveness of surface migration with gas­surface reactions. In diamond surface science, the thermal­vapor deposition studies, activation barriers to migration of surface CH 2 and CH 3 [6] had been calculated, yet

  10. 1 Political Science POLITICAL SCIENCE

    E-Print Network [OSTI]

    Vertes, Akos

    1 Political Science POLITICAL SCIENCE With Capitol Hill nearby and the White House just blocks away, GW is the ideal place to study political science. Students in the program benefit from rigorous study and behavioral sciences discipline in the Columbian College of Arts and Sciences, the program examines politics

  11. Computer Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Cite Seer Department of Energy provided open access science research citations in chemistry, physics, materials, engineering, and computer science IEEE Xplore Full text...

  12. Statistical Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    LeeAnn Martinez (505) 667-3308 Email Find Expertise header Search our employee skills database Statistical Sciences Statistical Sciences provides statistical reasoning and...

  13. Materials Sciences Division 1990 annual report

    SciTech Connect (OSTI)

    Not Available

    1990-12-31

    This report is the Materials Sciences Division`s annual report. It contains abstracts describing materials research at the National Center for Electron Microscopy, and for research groups in metallurgy, solid-state physics, materials chemistry, electrochemical energy storage, electronic materials, surface science and catalysis, ceramic science, high tc superconductivity, polymers, composites, and high performance metals.

  14. Materials Sciences Division 1990 annual report

    SciTech Connect (OSTI)

    Not Available

    1990-01-01

    This report is the Materials Sciences Division's annual report. It contains abstracts describing materials research at the National Center for Electron Microscopy, and for research groups in metallurgy, solid-state physics, materials chemistry, electrochemical energy storage, electronic materials, surface science and catalysis, ceramic science, high tc superconductivity, polymers, composites, and high performance metals.

  15. Quilting Together a Career in Science

    E-Print Network [OSTI]

    Richmond, Geraldine L.

    Quilting Together a Career in Science About the speaker: Professor Geri Richmond holds the Richard is recognized for her fundamental studies in contemporary surface science using state-of-the-art laser 160 publications to her credit. Richmond is also known widely for her innovative science teaching

  16. Nuclear Sciences | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Nuclear Sciences SHARE Nuclear Sciences In World War II's Manhattan Project, ORNL helped usher in the nuclear age. Today, laboratory scientists are leaders in using nuclear...

  17. Nuclear Sciences | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Sciences SHARE Nuclear Sciences In World War II's Manhattan Project, ORNL helped usher in the nuclear age. Today, laboratory scientists are leaders in using nuclear technologies...

  18. Nuclear Science | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science SHARE Nuclear Science In World War II's Manhattan Project, ORNL helped usher in the nuclear age. Today, laboratory scientists are leaders in using nuclear technologies and...

  19. Printability and inspectability of programmed pit defects on teh masks in EUV lithography

    SciTech Connect (OSTI)

    Kang, I.-Y.; Seo, H.-S.; Ahn, B.-S.; Lee, D.-G.; Kim, D.; Huh, S.; Koh, C.-W.; Cha, B.; Kim, S.-S.; Cho, H.-K.; Mochi, I.; Goldberg, K. A.

    2010-03-12

    Printability and inspectability of phase defects in ELlVL mask originated from substrate pit were investigated. For this purpose, PDMs with programmed pits on substrate were fabricated using different ML sources from several suppliers. Simulations with 32-nm HP L/S show that substrate pits with below {approx}20 nm in depth would not be printed on the wafer if they could be smoothed by ML process down to {approx}1 nm in depth on ML surface. Through the investigation of inspectability for programmed pits, minimum pit sizes detected by KLA6xx, AIT, and M7360 depend on ML smoothing performance. Furthermore, printability results for pit defects also correlate with smoothed pit sizes. AIT results for pattemed mask with 32-nm HP L/S represents that minimum printable size of pits could be {approx}28.3 nm of SEVD. In addition, printability of pits became more printable as defocus moves to (-) directions. Consequently, printability of phase defects strongly depends on their locations with respect to those of absorber patterns. This indicates that defect compensation by pattern shift could be a key technique to realize zero printable phase defects in EUVL masks.

  20. SCIENCE CHINA Technological Sciences

    E-Print Network [OSTI]

    Wang, Zhong L.

    University, Lanzhou 730000, China; 3 School of Material Science and Engineering, Georgia Institute on the piezoelectric semiconductor materials, such as ZnO, ZnS, CdS and GaN. With the usage of these piezoelectric.37 eV and large free-exciton binding energy of 60 meV at room temperature. Furthermore, splendid one

  1. Faculty of Science Computer Science

    E-Print Network [OSTI]

    Faculty of Science Computer Science Computer software engineering, network and system analysis.uwindsor.ca/computerscience The University of Windsor offers a variety of computer science programs to prepare students for a career in the technology industry or in research and academia. A computer science degree provides an in-depth understanding

  2. Earth Sciences Environmental Earth Sciences,

    E-Print Network [OSTI]

    Brierley, Andrew

    84 Earth Sciences­ Environmental Earth Sciences, Geology MGeol (Single Honours Degrees) Earth Sciences BSc (Single Honours Degrees) Environmental Earth Sciences Geology BSc (Joint Honours Degrees) and among the most research-intensive in Europe. Features * The Department of Earth and Environmental

  3. Faculty of Science Computer Science

    E-Print Network [OSTI]

    Faculty of Science Computer Science Software engineering, network and system analysis continue a variety of computer science programs to prepare students for a career in the technology industry or in research and academia. A computer science degree provides an in-depth understanding of the fundamentals

  4. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    current, fill factor and solar efficiency, while minimizingto electricity with solar efficiency (5-8%) rivaling theof H2O. Solar energy efficiency was estimated to be of the

  5. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    fuel cells* A. coal gasification -»H - molten carbonatemechanical Fossil Coal Conventional Gasification Oil shale

  6. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    Berkeley Laboratory Solar energy conversion: Photovoltaicsolar and energy conservation (through efficient energy conversionwith the direct conversion of solar energy to electricity,

  7. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    energy conversion Catalysis—Harold Beuther, Gulf Research and Development Corrosion Problems—Roger Staehle, Ohio State University Thermonuclear

  8. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    field of solar energy (solar photovoltaics in particular).Photovoltaics are concerned with the direct conversion of solarsolar radiation. General problem areas related to photovoltaics

  9. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    Technical Center Geothermal energy conversion and surfacenuclear fusion, geothermal and solar energy technologies andnuclear fission, geothermal and solar energy technologies

  10. REPORT OF THE SURFACE SCIENCE WORKSHOP

    E-Print Network [OSTI]

    Somorjai, G.A.

    2010-01-01

    generation H2-C0|molten carbonate|O2 (air) fuel cells C.batteries* fuel cells Ni-Zn cells Li(Al) molten carbonatefuel cells* A. coal gasification -»H - molten carbonate

  11. Author's personal copy Surface Science Letters

    E-Print Network [OSTI]

    De Micheli, Giovanni

    as hydroxyl groups for repelling non-speci c DNA. This letter proposes a new kind of ethylene-glycol silane Special ethylene-glycol silanes terminated with amine and methoxyl groups were designed by us

  12. Princeton Plasma Physics Lab - Surface science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantityBonneville Power Administration wouldMass mapSpeedingProgram GuidelinesThousandnstx-u The

  13. Science Education Programs | Neutron Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Scattering Tutorials Kids' Corner NScD Careers Supporting Organizations Neutron Science Home | Science & Discovery | Neutron Science | Science and Education SHARE Inspiring...

  14. Biology | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Atmospheric Sciences Materials Science and Engineering Mathematics Physics Environment Safety and Health More Science Home | Science & Discovery | More Science | Biology SHARE...

  15. NERSC Science Gateways

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Users Science Gateways Science Gateways About Science Gateways A science gateway is a web based interface to access HPC computers and storage systems. Gateways allow science...

  16. Goldschmidt Conference Abstracts 2005 Mineral Surface Reactivity

    E-Print Network [OSTI]

    Sparks, Donald L.

    Goldschmidt Conference Abstracts 2005 Mineral Surface Reactivity A492 "Hydration" of rhyolitic of Tennessee, Knoxville, Tennessee 37996, USA 2 Chemical Sciences Division, MS 6110, P.O. Box 2008, Bldg. 4500S, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6110, USA 3 Chemical Sciences Division, MS

  17. Chemistry and Materials Science progress report, FY 1994. Revision 2

    SciTech Connect (OSTI)

    NONE

    1996-01-01

    Thrust areas of the weapons-supporting research include surface science, fundamentals of the physics and processing of metals, energetic materials, etc. The laboratory directed R and D include director`s initiatives, individual projects, and transactinium science studies.

  18. Big Science

    ScienceCinema (OSTI)

    Dr. Thomas Zacharia

    2010-01-08

    Big science seeks big solutions for the most urgent problems of our times. Video courtesy Cray, Inc.

  19. John Pendry: His Contributions to the Development of LEED Surface Crystallography

    E-Print Network [OSTI]

    Rous, P.J.

    2008-01-01

    of Surface Structure by LEED (IBM Research Symposia Series)Surface Crystallography by LEED. M.A. Van Hove and S.Y.Surface Science 300(1-3), LEED Analysis of Acetylene and

  20. Chemical Effect of Dry and Wet Cleaning of the Ru Protective Layer of the Extreme ultraviolet (EUV) Lithography Reflector

    E-Print Network [OSTI]

    Belau, Leonid

    2010-01-01

    Park, Physical Chemistry Chemical Y.B. He, et al. , JournalChemical Effect of Dry and Wet Cleaning of the Ru ProtectiveBerkeley, California 94720 Chemical Sciences Division,

  1. Programmable surfaces

    E-Print Network [OSTI]

    Sun, Amy (Amy Teh-Yu)

    2012-01-01

    Robotic vehicles walk on legs, roll on wheels, are pulled by tracks, pushed by propellers, lifted by wings, and steered by rudders. All of these systems share the common character of momentum transport across their surfaces. ...

  2. Information Science, Computing, Applied Math

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Information Science, Computing, Applied Math science-innovationassetsimagesicon-science.jpg Information Science, Computing, Applied Math National security depends on science...

  3. STOKED ABOUT SCIENCE? Science Summer

    E-Print Network [OSTI]

    Machel, Hans

    ) · Sunscreen & Bug Spray · www.science.ualberta.ca/summercamps Proper footwear (no flip flops) #12;Half Day

  4. The Science of Science Dr. Katy Brner

    E-Print Network [OSTI]

    Menczer, Filippo

    1 The Science of Science Dr. Katy Börner Cyberinfrastructure for Network Science Center, Director Information Visualization Laboratory, Director School of Library and Information Science Indiana University February 20th, 2008 Computational Scientometrics: Studying Science by Scientific Means Börner, Katy, Chen

  5. 1 Geological Sciences GEOLOGICAL SCIENCES

    E-Print Network [OSTI]

    Vertes, Akos

    1 Geological Sciences GEOLOGICAL SCIENCES Geological sciences' faculty members are engaged in research on the geology and paleontology of the Appalachian and Rocky mountains, Asia and elsewhere. They collaborate with scientists from the U.S. Geological Survey and other international organizations. Research

  6. Polymers and Coatings:Materials Science & Technology, MST-7:...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    polymer sample Applied Polymer Research scintillator Characterization and Forensics aerogels Fundamental Polymer Research hipjoint Surface Science and Coatings white light Target...

  7. MATERIALS, FABRICATION, AND MANUFACTURING OF MICRO/NANOSTRUCTURED SURFACES FOR PHASE-CHANGE HEAT TRANSFER ENHANCEMENT

    SciTech Connect (OSTI)

    McCarthy, M; Gerasopoulos, K; Maroo, SC; Hart, AJ

    2014-07-23

    This article describes the most prominent materials, fabrication methods, and manufacturing schemes for micro- and nanostructured surfaces that can be employed to enhance phase-change heat transfer phenomena. The numerous processes include traditional microfabrication techniques such as thin-film deposition, lithography, and etching, as well as template-assisted and template-free nanofabrication techniques. The creation of complex, hierarchical, and heterogeneous surface structures using advanced techniques is also reviewed. Additionally, research needs in the field and future directions necessary to translate these approaches from the laboratory to high-performance applications are identified. Particular focus is placed on the extension of these techniques to the design of micro/nanostructures for increased performance, manufacturability, and reliability. The current research needs and goals are detailed, and potential pathways forward are suggested.

  8. Lithography Trouble-Shooter

    E-Print Network [OSTI]

    Yoo, S. J. Ben

    , or alternative coating techniques such as spray coating, roller coating, or dip coating are possible work, roller coating, or dip coating are reasonable alternatives for spin coating. Please contact us and Comet-Like Structures After Spin Coating? Possible reasons and work- arounds are listed in the section

  9. Advances in Lithography

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home Room News Publications Traditional Knowledge KiosksAboutHelp &AdvancedAdvancedExamples

  10. Self-Cleaning Synthetic Adhesive Surfaces Mimicking Tokay Geckos.

    SciTech Connect (OSTI)

    Branson, Eric D.; Singh, Seema [Sandia National Laboratories, Livermore, CA; Burckel, David Bruce; Fan, Hongyou; Houston, Jack E.; Brinker, C. Jeffrey; Johnson, Patrick

    2006-11-01

    A gecko's extraordinary ability to suspend itself from walls and ceilings of varied surface roughness has interested humans for hundreds of years. Many theories and possible explanations describing this phenomenon have been proposed including sticky secretions, microsuckers, and electrostatic forces; however, today it is widely accepted that van der Waals forces play the most important role in this type of dry adhesion. Inarguably, the vital feature that allows a gecko's suspension is the presence of billions 3 of tiny hairs on the pad of its foot called spatula. These features are small enough to reach within van der Waals distances of any surface (spatula radius ~100 nm); thus, the combined effect of billions of van der Waals interactions is more than sufficient to hold a gecko's weight to surfaces such as smooth ceilings or wet glass. Two lithographic approaches were used to make hierarchal structures with dimensions similar to the gecko foot dimensions noted above. One approach combined photo-lithography with soft lithography (micro-molding). In this fabrication scheme the fiber feature size, defined by the alumina micromold was 0.2 um in diameter and 60 um in height. The second approach followed more conventional photolithography-based patterning. Patterned features with dimensions ~0.3 mm in diameter by 0.5 mm tall were produced. We used interfacial force microscopy employing a parabolic diamond tip with a diameter of 200 nm to measure the surface adhesion of these structures. The measured adhesive forces ranged from 0.3 uN - 0.6 uN, yielding an average bonding stress between 50 N/cm2 to 100 N/cm2. By comparison the reported literature value for the average stress of a Tokay gecko foot is 10 N/cm2. Acknowledgements This work was funded by Sandia National Laboratory's Laboratory Directed Research & Development program (LDRD). All coating processes were conducted in the cleanroom facility located at the University of New Mexico's Center for High Technology Materials (CHTM). SEM images were performed at UNM's Center for Micro-Engineering on equipment funded by a NSF New Mexico EPSCoR grant. 4

  11. Surface Soil

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservationBio-Inspired Solar Fuel Production 1: TotalofSupplySurface Soil Surface Soil We

  12. On Surface Approximation using Developable Surfaces

    E-Print Network [OSTI]

    Lee, In-Kwon

    manufacturing, e.g. in shipbuilding. Keywords: computer aided design, computer aided manufacturing, surface ap- proximation, reverse engineering, surface of revolution, developable surface, shipbuilding. 2 #12

  13. [Faculty of Science Information and Computing Sciences

    E-Print Network [OSTI]

    Löh, Andres

    [Faculty of Science Information and Computing Sciences] Terminating combinator parsers in Agda and Computing Sciences Utrecht University June 12, 2008 #12;[Faculty of Science Information and Computing Information and Computing Sciences] 3 Totality #12;[Faculty of Science Information and Computing Sciences] 4

  14. Academy of Integrated Science College of Science

    E-Print Network [OSTI]

    Zallen, Richard

    FALL 2015 Academy of Integrated Science College of Science Virginia Tech Integrated Science SCIENCE CURRICULUM COMPILED BY NORA SULLIVAN PROGRAM ACADEMIC ADVISOR ACADEMY OF INTEGRATED SCIENCE COLLEGE OF SCIENCE VIRGINIA TECH NORA84@VT.EDU 540-231-2442 WWW.SCIENCE.VT.EDU/AIS/ISC #12

  15. Nuclear Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    and Reports News and Awards Supporting Organizations Home | Science & Discovery | Nuclear Science Nuclear Science | Nuclear Science SHARE In World War II's Manhattan Project,...

  16. Information Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Information Science and Technology (ASIS&T) American Society for Indexing (ASI) Digital Library Federation (DLF) National Archives and Records Administration (NARA) Special...

  17. Science Potential from a Europa Lander

    E-Print Network [OSTI]

    Pappalardo, R. T.

    The prospect of a future soft landing on the surface of Europa is enticing, as it would create science opportunities that could not be achieved through flyby or orbital remote sensing, with direct relevance to Europa's ...

  18. ATMOSPHERIC SCIENCE LETTERS Atmos. Sci. Let. (2012)

    E-Print Network [OSTI]

    Gerber, Edwin

    2012-01-01

    ATMOSPHERIC SCIENCE LETTERS Atmos. Sci. Let. (2012) Published online in Wiley Online Library using National Centers for Environmental Prediction/National Center for Atmospheric Research (NCEP) concentrations and sea- surface temperatures (SSTs). These integrations enable the relative role of ozone

  19. What Makes Science, Science? Research, Shared Effort ... & A...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Makes Science, Science? Research, Shared Effort ... & A New Office of Science Website What Makes Science, Science? Research, Shared Effort ... & A New Office of Science Website...

  20. NREL: Energy Sciences - Chemical and Materials Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    in the U.S. Department of Energy (DOE) National Photovoltaic Program and DOE Basic Energy Sciences Program. Materials Science. The Materials Science Group's research...

  1. Life sciences

    SciTech Connect (OSTI)

    Day, L. (ed.)

    1991-04-01

    This document is the 1989--1990 Annual Report for the Life Sciences Divisions of the University of California/Lawrence Berkeley Laboratory. Specific progress reports are included for the Cell and Molecular Biology Division, the Research Medicine and Radiation Biophysics Division (including the Advanced Light Source Life Sciences Center), and the Chemical Biodynamics Division. 450 refs., 46 figs. (MHB)

  2. Rover Traverse Science for Increased Mission Science Return

    E-Print Network [OSTI]

    analysis technology for increasing science return from missions. Our technology evaluates the geologic data the primary features populating the Martian landscape. Characterization and understanding of rocks on the surface is a first step leading towards more complex in situ regional geological assessments by the rover

  3. Bachelor of Science & Bachelor of Science (Technology)

    E-Print Network [OSTI]

    Waikato, University of

    Bachelor of Science & Bachelor of Science (Technology) SpecialiSationS Environmental Microbiology environment. This specialisation can be attached to the Environmental Sciences major. Environmental Modelling Sciences major. Land and Freshwater Environments This specialisation is for students interested

  4. Science Learning+: Phase 1 projects Science Learning+

    E-Print Network [OSTI]

    Rambaut, Andrew

    Science Learning+: Phase 1 projects Science Learning+ Phase 1 projects 2 December 2014 #12..............................................................................................................4 Youth access and equity in informal science learning: developing a research and practice agenda..................................................................................................5 Enhancing informal learning through citizen science..............................................6

  5. Security Science & Technology | Nuclear Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Security Treaty Verification Nuclear Systems Modeling, Simulation & Validation Nuclear Systems Technology Reactor Technology Nuclear Science Home | Science & Discovery |...

  6. Earth and Atmospheric Sciences | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Earth and Atmospheric Sciences Nuclear Forensics Climate & Environment Sensors and Measurements Chemical & Engineering Materials Computational Earth Science Systems Modeling...

  7. Space Science : Atmosphere Greenhouse Effect

    E-Print Network [OSTI]

    Johnson, Robert E.

    Space Science : Atmosphere Greenhouse Effect Part-5a Solar + Earth Spectrum IR Absorbers Grey Atmosphere Greenhouse Effect #12;Radiation: Solar and Earth Surface B"(T) Planck Ideal Emission Integrate and it emits Note: heat balance Fvis( = Fout = Te 4 z #12;(simple Greenhouse cont.) 0 1 2 3 4 Ground Space Top

  8. -.-L___ ----------* ----------. ----___. -. A Science Service Feature

    E-Print Network [OSTI]

    been i n the design of the wind-wheel. The rculti-bladed wheel, as commonly employed i n Bmerican of the British xssociation f o r the Advancement of Science. Wind paver i s inexhaustible and costs nothin,-. It is available over a much greater area of the earth's surface than i t s rival, water power. No wonder

  9. 3. Advanced Polymer Molecular Science

    E-Print Network [OSTI]

    Duh, Kevin

    Development to Realize New Energy and Electrical Equipment Advanced Functional Materials 100 nm (PEN and Electrons Surface and Materials Science 1. New Photo-Functional Materials Using Quantum Effects Quantum Analysis System and Molecular Imagining Sensory Materials and Devices 1 mm #12;26. New Material

  10. College of Health Sciences Health Sciences Connection

    E-Print Network [OSTI]

    Barrash, Warren

    College of Health Sciences Health Sciences Connection 1 Dean's Message College of Health Sciences Health Sciences Connection February 2011 Volume IX (3) Since the last COHS newsletter, the faculty Dr. Tim Dunnagan, Dean #12;Health Sciences Connection 2 College News College of Health Sciences

  11. Web of Science Web of ScienceWeb of Science

    E-Print Network [OSTI]

    Wang, Yayu

    Web of Science 2015-3-25 #12;Web of ScienceWeb of Science 93 2 22 7 Web of Science #12; 3.com/WOS_GeneralSearch_input.do?product=WOS&search_ mode=GeneralSearch&SID=4CLD1VklEapSgBPAiM8&preferencesSaved= Web of Science Web of Science core; #12; IDS IDS IDS #12; 50 "" #12; #12; 1. 2. 3. #12;4. 5. #12;6. Web of ScienceSCI 2

  12. Computer Science UNDERGRADUATE

    E-Print Network [OSTI]

    Suzuki, Masatsugu

    447 Computer Science UNDERGRADUATE PROGRAMS The Department of Computer Science provides undergraduate instruction leading to the bachelor's degree in computer science. This program in computer science is accredited by the Computer Science Accreditation Board (CSAB), a specialized accrediting body recognized

  13. Department of Materials Science &

    E-Print Network [OSTI]

    Zhigilei, Leonid V.

    Developing Leaders of Innovation Department of Materials Science & Engineering #12;At the University of Virginia, students in materials science, engineering physics and engineering science choose to tackle compelling issues in materials science and engineering or engineering science

  14. COMPUTER SCIENCE EECS Department

    E-Print Network [OSTI]

    COMPUTER SCIENCE EECS Department The Electrical Engineering and Computer Science (EECS) Department at WSU offers undergraduate degrees in electrical engineering, computer engineering and computer science. The EECS Department offers master of science degrees in computer science, electrical engineering

  15. Lithography-free sub-100nm nanocone array antireflection layer for low-cost silicon solar cell

    E-Print Network [OSTI]

    Xu, Zhida

    2014-01-01

    High density and uniformity sub-100nm surface oxidized silicon nanocone forest structure is created and integrated onto the existing texturization microstructures on photovoltaic device surface by a one-step high throughput plasma enhanced texturization method. We suppressed the broadband optical reflection on chemically textured grade-B silicon solar cells for up to 70.25% through this nanomanufacturing method. The performance of the solar cell is improved with the short circuit current increased by 7.1%, fill factor increased by 7.0%, conversion efficiency increased by 14.66%. Our method demonstrates the potential to improve the photovoltaic device performance with low cost high and throughput nanomanufacturing technology.

  16. Supporting Organizations | Nuclear Science | ORNL

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    for career success. An Environmental Science degree is also appropriate background training for professions Resources A new and integrated set of state-of-the-art laboratory and field equipment has been designed

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    ORNL's long history of neutron science began in the 1940s with the pioneering neutron scattering studies of Ernest Wollan and Clifford Shull. Shull was co-recipient of...

  2. DOI: 10.1126/science.1150690 , 1651 (2008);319Science

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    Glotch, Timothy D.

    2008-01-01

    differences across mountain chains [e.g., (2, 23)]. Another assumption that bears further examinationDOI: 10.1126/science.1150690 , 1651 (2008);319Science , et al.M. M. Osterloo Chloride-Bearing-high mountain chains on Titan (22) and that a pressure field can exert a torque on the surface via pressure

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    Finley Jr., Russell L.

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    Chauve, Cedric

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    Furner, J

    2015-01-01

    of library and information sciences, 3rd ed. , edited byAmerican Society for Information Science and Technology 63,Annual Review of Information Science and Technology 41, no.

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    Dart, Eli

    2011-01-01

    of Energy, Office of Science, Office of Advanced Scientificthe Directors of the Office of Science, Office of Advanced5 Simulation Data Key Remote Science Drivers Instruments and

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    Lakoff, George

    2013-01-01

    interpersonal warmth . ” Science, 322, 2008, 606–607 . Atcold? ” Psychological Science , 19, 2008, 838–842. Subjectsand physical cleansing. Science, 313, 1451–1452. Students

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    2014-01-01

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    [Faculty of Science Information and Computing Sciences] 1 Types in Functional Programming Languages Andres L¨oh Department of Information and Computing Sciences Utrecht University UU General Math Colloquium ­ May 8, 2008 #12;[Faculty of Science Information and Computing Sciences] 2 Overview What

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    E-Print Network [OSTI]

    Shapin, Steven

    1 History of Science 157 Sociology of Science Fall 2009 Steven Shapin Science Center 469 Tuesdays to thinking about science, its historical development, its relations to society and other forms of culture: Science Center 451 Office hours: Mondays 8:30 -> 10.15, or by arrangement #12;2 E-mail: shapin

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    Barrash, Warren

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    Yi, Cheol-Woo

    2007-04-25

    by physical vapor deposition (PVD) onto well-characterized metal substrates. Subsequent characterization was performed using an arsenal of modern surface science tools: low energy ion scattering spectroscopy (LEISS), infrared absorption spectroscopy (IRAS...

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    SciTech Connect (OSTI)

    Zhang, Yonghui; Wei, Tongbo, E-mail: tbwei@semi.ac.cn; Xiong, Zhuo; Shang, Liang; Tian, Yingdong; Zhao, Yun; Zhou, Pengyu; Wang, Junxi; Li, Jinmin [Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

    2014-07-07

    The light-emitting diodes (LEDs) with single, twin, triple, and quadruple photonic crystals (PCs) on p-GaN are fabricated by multiple-exposure nanosphere-lens lithography (MENLL) process utilizing the focusing behavior of polystyrene spheres. Such a technique is easy and economical for use in fabricating compound nano-patterns. The optimized tilted angle is decided to be 26.6° through mathematic calculation to try to avoid the overlay of patterns. The results of scanning electron microscopy and simulations reveal that the pattern produced by MENLL is a combination of multiple ovals. Compared to planar-LED, the light output power of LEDs with single, twin, triple, and quadruple PCs is increased by 14.78%, 36.03%, 53.68%, and 44.85% under a drive current 350?mA, respectively. Furthermore, all PC-structures result in no degradation of the electrical properties. The stimulated results indicate that the highest light extraction efficiency of LED with the clover-shape triple PC is due to the largest scattering effect on propagation of light from GaN into air.

  3. Science Highlights

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    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity of NaturalDukeWakefieldSulfateSciTechtail.Theory ofDidDevelopment Top LDRDUniversitySchedules PrintNIF AboutScienceScience

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    Science &Technology Facilities Council Science &Technology Facilities Council Science and Technology Facilities Council Annual Report and Accounts 2011-2012 Science and Technology Facilities Council Laboratory, Cheshire; UK Astronomy Technology Centre, Edinburgh; Chilbolton Observatory, Hampshire; Isaac

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    1990-01-01

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    Science &Technology Facilities Council Accelerator Science and Technology Centre Daresbury Science)1235 445808 www.stfc.ac.uk/astec Head office, Science and Technology Facilities Council, Polaris House, North Newton Group, La Palma: Joint Astronomy Centre, Hawaii. ASTeC Science Highlights 2009 - 2010 Science

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    Heller, Barbara

    Computer Science Department of Computer Science Stuart Building 10 W. 31st St. Chicago, IL 60616: Bogdan Korel The study of computer science is the inquiry into the nature of computation and its use in solving problems in an information-based society. Computer science is an evolving discipline, but it has

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    Löh, Andres

    [Faculty of Science Information and Computing Sciences] Indexed fixed points Andres Löh Dept. of Information and Computing Sciences, Utrecht University P.O. Box 80.089, 3508 TB Utrecht, The Netherlands Web pages: http://www.cs.uu.nl/wiki/Center GP meeting, 21 November 2008 #12;[Faculty of Science Information

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    E-Print Network [OSTI]

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    E-Print Network [OSTI]

    Löh, Andres

    [Faculty of Science Information and Computing Sciences] Generic programming with the multirec. of Information and Computing Sciences, Utrecht University P.O. Box 80.089, 3508 TB Utrecht, The Netherlands Web pages: http://www.cs.uu.nl/wiki/Center May 15, 2009 #12;[Faculty of Science Information and Computing

  15. [Faculty of Science Information and Computing Sciences

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    Löh, Andres

    [Faculty of Science Information and Computing Sciences] Generic programming with fixed points Dept. of Information and Computing Sciences, Utrecht University P.O. Box 80.089, 3508 TB Utrecht, The Netherlands Web pages: http://www.cs.uu.nl/wiki/Center September 2, 2009 #12;[Faculty of Science Information

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    Holsinger, Kent

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    2013-02-03

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  1. Web of Science Welcome to the Web of Science................................................................................................ 2

    E-Print Network [OSTI]

    Huang, Su-Yun

    Web of Science #12; Welcome to the Web of Science................................................................................................ 2 Web of Science.................................................................................................................. 4 ISI Web of Knowledge

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  4. BioenergizeME Virtual Science Fair: Science & Technology Sustainable...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

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    SciTech Connect (OSTI)

    Not Available

    1992-02-01

    The DOE laboratories play a unique role in bringing multidisciplinary talents -- in biology, physics, chemistry, computer sciences, and engineering -- to bear on major problems in the life and environmental sciences. Specifically, the laboratories utilize these talents to fulfill OHER`s mission of exploring and mitigating the health and environmental effects of energy use, and of developing health and medical applications of nuclear energy-related phenomena. At Lawrence Berkeley Laboratory (LBL) support of this mission is evident across the spectrum of OHER-sponsored research, especially in the broad areas of genomics, structural biology, basic cell and molecular biology, carcinogenesis, energy and environment, applications to biotechnology, and molecular, nuclear and radiation medicine. These research areas are briefly described.

  6. Life sciences and environmental sciences

    SciTech Connect (OSTI)

    Not Available

    1992-02-01

    The DOE laboratories play a unique role in bringing multidisciplinary talents -- in biology, physics, chemistry, computer sciences, and engineering -- to bear on major problems in the life and environmental sciences. Specifically, the laboratories utilize these talents to fulfill OHER's mission of exploring and mitigating the health and environmental effects of energy use, and of developing health and medical applications of nuclear energy-related phenomena. At Lawrence Berkeley Laboratory (LBL) support of this mission is evident across the spectrum of OHER-sponsored research, especially in the broad areas of genomics, structural biology, basic cell and molecular biology, carcinogenesis, energy and environment, applications to biotechnology, and molecular, nuclear and radiation medicine. These research areas are briefly described.

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    SciTech Connect (OSTI)

    1998-10-01

    The Division of Materials Sciences is responsible for basic research and research facilities in materials science topics important to the mission of the Department of Energy. The programmatic divisions under the Office of Basic Energy Sciences are Chemical Sciences, Engineering and Geosciences, and Energy Biosciences. Materials Science is an enabling technology. The performance parameters, economics, environmental acceptability and safety of all energy generation, conversion, transmission and conservation technologies are limited by the properties and behavior of materials. The Materials Sciences programs develop scientific understanding of the synergistic relationship among synthesis, processing, structure, properties, behavior, performance and other characteristics of materials. Emphasis is placed on the development of the capability to discover technologically, economically, and environmentally desirable new materials and processes, and the instruments and national user facilities necessary for achieving such progress. Materials Sciences subfields include: physical metallurgy, ceramics, polymers, solid state and condensed matter physics, materials chemistry, surface science and related disciplines where the emphasis is on the science of materials. This report includes program descriptions for 517 research programs including 255 at 14 DOE National Laboratories, 262 research grants (233 of which are at universities), and 29 Small Business Innovation Research Grants. Five cross-cutting indices located at the rear of this book identify all 517 programs according to principal investigator(s), materials, techniques, phenomena, and environment.

  8. Behavioral Sciences | ornl.gov

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  4. Science Summary

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservation ofAlbuquerque| Stanford SynchrotronVideo-ContestHighlightsScience

  5. Science Summary

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservation ofAlbuquerque| Stanford SynchrotronVideo-ContestHighlightsScienceHasan Research

  6. Science Summary

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservation ofAlbuquerque| Stanford SynchrotronVideo-ContestHighlightsScienceHasan

  7. Science Summary

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservation ofAlbuquerque| Stanford SynchrotronVideo-ContestHighlightsScienceHasan6, 2009

  8. Chemistry and materials science progress report, FY 1994

    SciTech Connect (OSTI)

    NONE

    1995-07-01

    Research is reported in the areas of surface science, fundamentals of the physics and processing of metals, energetic materials, transactinide materials and properties and other indirectly related areas of weapons research.

  9. Innovation in Computer Sciences

    E-Print Network [OSTI]

    Ghosh, Joydeep

    power- up Innovation in Computer Sciences Department of Computer Sciences at The University of Texas at Austin #12;#12;Computer science is the enabling science of our age. It is the engine. In the Department of Computer Sciences at The University of Texas at Austin, one of the top ten departments

  10. Review: Who’s asking? Native Science, Western Science and Science Education

    E-Print Network [OSTI]

    Ferrara, Enzo

    2015-01-01

    Western Science and Science Education By Douglas L. MedinScience and Science Education. Cambridge, MA: MIT Press,previously the director of education at the American Indian

  11. The Computational Sciences. Research

    E-Print Network [OSTI]

    Christensen, Dan

    The Computational Sciences. Research activities range from the theoretical foundations. The teaching mission of the computational sciences includes almost every student in the University for computational hardware and software. The computational sciences are undergoing explosive growth worldwide

  12. Sandia Energy - Fire Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Fire Science Home Stationary Power Nuclear Fuel Cycle Nuclear Energy Safety Technologies Risk and Safety Assessment Fire Science Fire ScienceTara Camacho-Lopez2015-05-11T17:01:52+0...

  13. OPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERING University of New Mexico

    E-Print Network [OSTI]

    New Mexico, University of

    OPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL as waveguiding mechanism in optical fibers. We have shown, both experimentally and numerically, that for a moderate amount of disorder in optical fibers

  14. BES Science Network Requirements

    E-Print Network [OSTI]

    Dart, Eli

    2011-01-01

    the Directors of the Office of Science, Office of AdvancedOffice of Basic Energy Sciences. This is LBNL report LBNL-BES Science Network Requirements Report of the Basic Energy

  15. Computer Science Induction to

    E-Print Network [OSTI]

    Berger, Ulrich

    Computer Science Induction to Postgraduate Research Studies Ulrich Berger Head of Postgraduate Research Supervision Regulations Progression Regulations Computer Science Induction to Postgraduate Research Studies Ulrich Berger Head of Postgraduate Research Department of Computer Science Swansea

  16. E-Science Day

    E-Print Network [OSTI]

    Abad, Raquel

    2012-01-01

    on December 6, 2011, E-Science Day was a day-long event,regional librarians in e-science, and to expose regionalthe initiation of e-science support projects within their

  17. Communicating Evolution as Science

    E-Print Network [OSTI]

    Thanukos, Anastasia

    2010-01-01

    thuringiensis toxins. Science. 1992;258(5087):1451–5. MillerRT, Ruse M. But is it science? Amherst, NY: Prometheusto the philosophy of science: theory and reality. Chicago:

  18. Introduction Health Sciences

    E-Print Network [OSTI]

    Banbara, Mutsunori

    32 Introduction Guide Entrance Life Career Inquiries Health Sciences Health Problems population, changing lifestyle habit, and the coming of globalization age. The role health sciences play, the former Department of Health Sciences of the Graduate School of Medicine, was reorganized

  19. Wood and Fiber Science, 37(1), 2005, pp. 95111 2004 by the Society of Wood Science and Technology

    E-Print Network [OSTI]

    Wood and Fiber Science, 37(1), 2005, pp. 95­111 © 2004 by the Society of Wood Science and Technology SURFACE AND INTERFACIAL CHARACTERIZATION OF WOOD-PVC COMPOSITE: IMAGING MORPHOLOGY AND WETTING wetting behavior of wood-PVC composites in this study. Two-dimensional and time-dependent profiles

  20. Sandia Energy - Computational Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Computational Science Home Energy Research Advanced Scientific Computing Research (ASCR) Computational Science Computational Sciencecwdd2015-03-26T13:35:2...

  1. BES Science Network Requirements

    E-Print Network [OSTI]

    Dart, Eli

    2011-01-01

    21 Neutron Scattering Science User Facilities atlight source facilities, neutron scattering facilities, andup to 40Gbps 7 Neutron Scattering Science User Facilities at

  2. Science and Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Faces of Science The people behind our science Radical Supercomputing Extreme speeds, big data, powerful simulations 70 Years of Innovation Addressing the nation's most complex...

  3. Information science is neither

    E-Print Network [OSTI]

    Furner, J

    2015-01-01

    Information science is neither Jonathan Furner University ofIt would appear that we neither use nor need the conceptabout information, neither is data science primarily about

  4. Fusion Energy Sciences

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Fusion Energy Sciences Fusion Energy Sciences Expanding the fundamental understanding of matter at very high temperatures and densities and to build the scientific foundation...

  5. Security Science & Technology | Nuclear Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Nuclear Security Science & Technology Border Security Comprehensive Vulnerability and Threat Analysis Consequence Management, Safeguards, and Non-Proliferation Tools Export...

  6. Fuel Cycle Science & Technology | Nuclear Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Radiochemical Separation & Processing Recycle & Waste Management Uranium Enrichment Used Nuclear Fuel Storage, Transportation, and Disposal Fusion Nuclear Science Isotope...

  7. Computational Science and Engineering Certification for Computer Science

    E-Print Network [OSTI]

    Gilbert, Matthew

    Computational Science and Engineering Certification for Computer Science The Computational Science credential only available to students currently enrolled in the Computer Science undergraduate degree program that are distinct from already-required coursework. To receive a certificate in "Computational Science

  8. 146 Earth Science 147 Earth Science

    E-Print Network [OSTI]

    Richards-Kortum, Rebecca

    146 Earth Science 147 Earth Science ESCI 101 The Earth or ESCI 102 Evolution of the Earth or ESCI 107 Oceans and Global Change or ESCI 108 Crises of the Earth ESCI 105 Introductory Lab for Earth Geophysics I ESCI 444 Exploration Geophysics II or ESCI 446 Solid Earth Geophysics Math and Other Sciences

  9. College of Science CLINICAL SCIENCE AREA MANUAL

    E-Print Network [OSTI]

    1 College of Science CLINICAL SCIENCE AREA MANUAL DEPARTMENT OF PSYCHOLOGY VIRIGINIA TECH AY2015 Training 24 B. Clinical Science Area Committee 25 C. Graduate Student Representatives 25 D. Advisor 26 E for Continuation on to the Preliminary Examination 49 F. Plan of Study: Doctoral Degree 51 G. The Preliminary

  10. Materials Science Volume 7, Number 4

    E-Print Network [OSTI]

    Poeppelmeier, Kenneth R.

    Materials Science TM Volume 7, Number 4 Technologies for a changing world Nanomaterials for Energy Conversion and Storage Electrode Materials for Lithium Ion Batteries Surface-enhanced Solar Energy Convesion Changing the Landscape of Environmental and Energy Research Through Novel Nanoscale Materials #12

  11. Department of Earth Sciences Syracuse University

    E-Print Network [OSTI]

    Doyle, Robert

    to Hydraulic Fracturing". Environmental Science & Technology, in press. 25. Hardisty, D.S., Lu, Z., Planavsky and in press: 26. Lautz, L.K., Hoke, G.D., Lu, Z., Siegel, D.I., Christian, K., Kessler, J.D., and Teale, N of Paleoproterozoic surface ocean oxygenation". Geology, in press. 24. Limburg, K.E., Walther, B.D., Lu, Z., Jackman

  12. A Compressible Reconfigurable Frequency Selective Surface 

    E-Print Network [OSTI]

    Li, Shuli

    2015-05-11

    my gratitude to the U.S. National Science Foundation for their support. Finally, thanks to my mother and father for their encouragement and love. v NOMENCLATURE FSS Frequency Selective Surface RF Radio Frequency MEMS Microelectromechanical... devices and circuits in the field of RF and microwave wireless systems. There are typically two different methods of tuning components and methods. The first method is using tuning elements like PIN diodes and microelectromechanical system (MEMS...

  13. THEORETICAL MODELING OF LIDAR RETURN PHENOMENOLOGY FROM SNOW AND ICE SURFACES

    E-Print Network [OSTI]

    Kerekes, John

    THEORETICAL MODELING OF LIDAR RETURN PHENOMENOLOGY FROM SNOW AND ICE SURFACES J. Kerekes, J. Zhang the science of lidar sensing of complex ice and snow surfaces as well as in support of the upcoming ICESat- 2 from snow and ice surfaces. First, the anticipated lidar return characteristics for a sloped non

  14. Fluorinated silica microchannel surfaces

    DOE Patents [OSTI]

    Kirby, Brian J.; Shepodd, Timothy Jon

    2005-03-15

    A method for surface modification of microchannels and capillaries. The method produces a chemically inert surface having a lowered surface free energy and improved frictional properties by attaching a fluorinated alkane group to the surface. The coating is produced by hydrolysis of a silane agent that is functionalized with either alkoxy or chloro ligands and an uncharged C.sub.3 -C.sub.10 fluorinated alkane chain. It has been found that the extent of surface coverage can be controlled by controlling the contact time from a minimum of about 2 minutes to a maximum of 120 minutes for complete surface coverage.

  15. Introduction to Computational Science

    E-Print Network [OSTI]

    Introduction to Computational Science (and why you should learn it!) Lyle N. Long Distinguished Professor of Aerospace Engineering and Mathematics Director, Graduate Minor Program in Computational Science #12;Outline · A little about me · What is computational science · Why study computational science

  16. INSTITUTE FOR COASTAL SCIENCE

    E-Print Network [OSTI]

    Gopalakrishnan, K.

    plain, and barrier island systems Social Science and Coastal Policy: Examine politics and public policy

  17. Computer Science Degree options

    E-Print Network [OSTI]

    Brierley, Andrew

    -leading research in human-computer interaction, constraint programming, cloud computing and more. * Our teaching74 Computer Science Degree options BSc (Single Honours Degree) Computer Science BSc (Joint Honours Degrees) Computer Science and one of: Economics Philosophy* Management Management Science * The title

  18. Computer Science Degree options

    E-Print Network [OSTI]

    Brierley, Andrew

    , cloud computing and more. * Our teaching is research-led from first year to fifth. Facilities82 Computer Science Degree options BSc (Single Honours Degree) Computer Science BSc (Joint Honours Degrees) Computer Science and one of: Economics Logic and Philosophy of Science Management Management

  19. Science Serving Sustainability

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Buildings Greening Transportation Green Purchasing & Green Technology Pollution Prevention Science Serving Sustainability ENVIRONMENTAL SUSTAINABILITY GOALS at...

  20. Agricultural and Food Sciences

    E-Print Network [OSTI]

    Faculty of Agricultural and Food Sciences (FAFS) #12;86 Faculty of Agricultural and Food Sciences (FAFS) Undergraduate Catalogue 2014­15 Faculty of Agricultural and Food Sciences (FAFS) Officers in agriculture was initiated in 1956. #12;87Faculty of Agricultural and Food Sciences (FAFS) Undergraduate

  1. Graduate studies Ecosystem Science

    E-Print Network [OSTI]

    Graduate studies in Ecosystem Science and Management Ph.D. M.S. M.Agr. or Natural Resources Development MNRD Department of Ecosystem Science and Management College of Agriculture and Life Sciences. The thesisbased Master of Science and Ph.D. degrees are designed for research or academic careers

  2. Education research Primary Science

    E-Print Network [OSTI]

    Rambaut, Andrew

    Education research Primary Science Survey Report December 2011 #12;Primary Science Survey Report, Wellcome Trust 1 Background In May 2009 Key Stage 2 science SATs (Standard Assessment Tests) were abolished fiasco might occur, where the results were delayed and their quality questioned. The loss of science SATs

  3. Indiana University Cognitive Science

    E-Print Network [OSTI]

    Indiana University

    Indiana University Cognitive Science Exploring the Science of Learning Representations Simulations patterns in plant growth better? In the Cognitive Science Program at IU, we explore educational practices) representations help students understand principles of science and transfer that knowledge to related topics

  4. ENVIRONMENTAL AND RESOURCE SCIENCE/

    E-Print Network [OSTI]

    Fox, Michael

    ENVIRONMENTAL AND RESOURCE SCIENCE/ STUDIES BUILDING ENVIRONMENTAL CITIZENSHIP trentu.ca/ers #12 Science/Studies. WHY TRENT? · Study in the first environmental science program to be accredited's Environmental and Resource Science program was the first to be accredited by ECO Canada Accessible versions

  5. Health sciences at Manchester

    E-Print Network [OSTI]

    Higham, Nicholas J.

    Health sciences at Manchester a time of change and growth Institute of Health Sciences January 2010 #12;The Institute of Health Sciences exists to improve health and healthcare practice through high quality health sciences research in Manchester. It is a collaborative endeavour involving schools

  6. Department of ANIMAL SCIENCE

    E-Print Network [OSTI]

    of the Department of Animal science contributes to research-based knowledge on livestock, environment, bioenergy

  7. Surface Tension of Seawater

    E-Print Network [OSTI]

    Nayar, Kishor Govind

    New measurements and a reference correlation for the surface tension of seawater at atmospheric pressure are presented in this paper. Surface tension of seawater was measured across a salinity range of 20 ? S ? 131 g/kg ...

  8. Extreme-UV lithography system

    DOE Patents [OSTI]

    Replogle, William C. (Livermore, CA); Sweatt, William C. (Albuquerque, NM)

    2001-01-01

    A photolithography system that employs a condenser that includes a series of aspheric mirrors on one side of a small, incoherent source of radiation producing a series of beams is provided. Each aspheric mirror images the quasi point source into a curved line segment. A relatively small arc of the ring image is needed by the camera; all of the beams are so manipulated that they all fall onto this same arc needed by the camera. Also, all of the beams are aimed through the camera's virtual entrance pupil. The condenser includes a correcting mirror for reshaping a beam segment which improves the overall system efficiency. The condenser efficiently fills the larger radius ringfield created by today's advanced camera designs. The system further includes (i) means for adjusting the intensity profile at the camera's entrance pupil or (ii) means for partially shielding the illumination imaging onto the mask or wafer. The adjusting means can, for example, change at least one of: (i) partial coherence of the photolithography system, (ii) mask image illumination uniformity on the wafer or (iii) centroid position of the illumination flux in the entrance pupil. A particularly preferred adjusting means includes at least one vignetting mask that covers at least a portion of the at least two substantially equal radial segments of the parent aspheric mirror.

  9. Fresnel versus Kummer surfaces

    E-Print Network [OSTI]

    Peinke, Joachim

    Fresnel versus Kummer surfaces Alberto Favaro & Friedrich W. Hehl Outline Linear media Linear media-you. Fresnel versus Kummer surfaces: geometrical optics in dispersionless linear (meta)materials and vacuum, 19­23 November 2012 Email: favaro@thp.uni-koeln.de #12;Fresnel versus Kummer surfaces Alberto Favaro

  10. Ames Laboratory Science Intern Awarded a National Science Foundation...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Ames Laboratory Science Intern Awarded a National Science Foundation Graduate Research Fellowship Former Ames Laboratory Science Undergraduate Laboratory Internship (SULI) student...

  11. Surface cleanliness measurement procedure

    DOE Patents [OSTI]

    Schroder, Mark Stewart (Hendersonville, NC); Woodmansee, Donald Ernest (Simpsonville, SC); Beadie, Douglas Frank (Greenville, SC)

    2002-01-01

    A procedure and tools for quantifying surface cleanliness are described. Cleanliness of a target surface is quantified by wiping a prescribed area of the surface with a flexible, bright white cloth swatch, preferably mounted on a special tool. The cloth picks up a substantial amount of any particulate surface contamination. The amount of contamination is determined by measuring the reflectivity loss of the cloth before and after wiping on the contaminated system and comparing that loss to a previous calibration with similar contamination. In the alternative, a visual comparison of the contaminated cloth to a contamination key provides an indication of the surface cleanliness.

  12. Science DMZ National Oceanic and Atmospheric Administration

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    NOAA Science Engagement Move your data Programs & Workshops Science Requirements Reviews Case Studies OSCARS Case Studies Science DMZ Case Studies Science DMZ @ UF Science DMZ @ CU...

  13. Science DMZ at the University of Florida

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    UF Science Engagement Move your data Programs & Workshops Science Requirements Reviews Case Studies OSCARS Case Studies Science DMZ Case Studies Science DMZ @ UF Science DMZ @ CU...

  14. Science DMZ Implemented at CU Boulder

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    CU Science Engagement Move your data Programs & Workshops Science Requirements Reviews Case Studies OSCARS Case Studies Science DMZ Case Studies Science DMZ @ UF Science DMZ @ CU...

  15. Biohackers. The Politics of Open Science

    E-Print Network [OSTI]

    Delfanti, Alessandro

    2013-01-01

    Users and peers: from citizen science to P2P science’, JCOMsource, open access, citizen science and online cooperativeexample, in the case of citizen science projects. Science

  16. Bradbury Science Museum - Science on Wheels

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    To stimulate interest in and enthusiasm for science, technology, engineering and mathematics and promote public understanding and appreciation of Los Alamos National Laboratory...

  17. Climate & Environmental Sciences | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Climate & Environment SHARE Climate and Environmental Sciences Climate and environmental scientists at ORNL conduct research, develop technology and perform analyses to understand...

  18. Climate & Environmental Sciences | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Climate and Environment SHARE Climate and Environmental Sciences Climate and environmental scientists at ORNL conduct research, develop technology and perform analyses to...

  19. Fusion Energy Sciences Network Requirements

    E-Print Network [OSTI]

    Dart, Eli

    2014-01-01

    Division, and the Office of Fusion Energy Sciences. This isFusion Energy Sciences NetworkRequirements Office of Fusion Energy Sciences Energy

  20. ?? / Kagaku / ?? /Ky?ri: Science

    E-Print Network [OSTI]

    Tsukahara, T?go

    2012-01-01

    question when considering science and technology in Japanese?? /Kagaku / ?? /Ky?ri: Science Tsukahara T?go Translationto incorporate and develop science and technology from the

  1. Clean Energy | More Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    sciences, advanced materials, neutron sciences, nuclear sciences, and high-performance computing, and brings multidisciplinary teams together to address key issues. That...

  2. Studies in biological surface science: microfluidics, photopatterning and artificial bilayers 

    E-Print Network [OSTI]

    Holden, Matthew Alexander

    2004-09-30

    ) are not easily patterned using this method, as any particle of dust can cause a break in the continuous form. The sizes of the patterns presented here were tolerant enough to perform most procedures in a dust free laminar flow hood, rather than a clean room.... The flexible line was dipped into a small vial of the solution to be filled, and the plunger of the syringe pulled all the way out, such that fluid in the vial siphoned into the barrel of the syringe. When a drop hung from the end of the syringe barrel...

  3. FIRST BERKELEY CATALYSIS AND SURFACE SCIENCE CONFERENCE JULY 1980

    E-Print Network [OSTI]

    Authors, Various

    2013-01-01

    reduced the volume of crude oil that had to be refined tooil prices, a dwindling supply of indigenous petroleum crude, and

  4. Surface Science Letters Structure, band offsets and photochemistry at

    E-Print Network [OSTI]

    Pennycook, Steve

    . Keywords: Photocatalysis; Heterojunctions; Epitaxial 1. Introduction Heterogeneous photocatalysis on oxide

  5. Center for Nanophase Materials Sciences (CNMS) - STM for Oxide Surfaces,

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 OutreachProductswsicloudwsiclouddenDVA N C E D BGene Network Shaping of InherentInstitute (NTI):CNMS NewsMolecular

  6. ARM - Publications: Science Team Meeting Documents: The Effects of Surface

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach HomeA Better AnodeThe Influence of Clouds, Aerosols,Comparisonatvariability: empiricalCO2,andof

  7. VeGASO!(Venus!Gravity!Assist!Science!Opportunities)! Science!Priority!Matrices!

    E-Print Network [OSTI]

    Rathbun, Julie A.

    ) Solar!Orbiter! (3) Solar!Probe!Plus! April!2015! #12;INSTRUMENT ACRONYM Purpose Potential9Venus9Science9$evenry$balance$(Radiometer) Solar$Imaging$X:ray$Spectrometer SIXS Elemental$surface$composition,$ global$mapping$and$ composition$EIRP Solar$Intensity$X:ray$and$particle$ spectrometer SIXS Monitor$solar:xray$intensity$ and$solar

  8. Materials sciences programs, fiscal year 1994

    SciTech Connect (OSTI)

    1995-04-01

    The Division of Materials Sciences is located within the DOE in the Office of Basic Energy Sciences. The Division of Materials Sciences is responsible for basic research and research facilities in strategic materials science topics of critical importance to the mission of the Department and its Strategic Plan. Materials Science is an enabling technology. The performance parameters, economics, environmental acceptability and safety of all energy generation, conversion, transmission and conservation technologies are limited by the properties and behavior of materials. The Materials Sciences programs develop scientific understanding of the synergistic relationship amongst the synthesis, processing, structure, properties, behavior, performance and other characteristics of materials. Emphasis is placed on the development of the capability to discover technologically, economically, and environmentally desirable new materials and processes, and the instruments and national user facilities necessary for achieving such progress. Materials Sciences sub-fields include physical metallurgy, ceramics, polymers, solid state and condensed matter physics, materials chemistry, surface science and related disciplines where the emphasis is on the science of materials. This report includes program descriptions for 458 research programs including 216 at 14 DOE National Laboratories, 242 research grants (233 for universities), and 9 Small Business Innovation Research (SBIR) Grants. The report is divided into eight sections. Section A contains all Laboratory projects, Section B has all contract research projects, Section C has projects funded under the SBIR Program, Section D describes the Center of Excellence for the Synthesis and Processing of Advanced Materials and E has information on major user facilities. F contains descriptions of other user facilities; G, a summary of funding levels; and H, indices characterizing research projects.

  9. A simplified system of pressure surfaces for atmospheric analysis 

    E-Print Network [OSTI]

    Shay, Francis Schofield

    1959-01-01

    LIBRARY A g M COLLEGE OF TEXAS A SIMPLIFIED SYSTEM OF PRESSURE SURFACES FOR ATMOSPHERIC ANALYSIS A Thesis By FRANCIS S. SHAY + Captain USAF Submitted to the Graduate School of the Agricultural and Mechanical College of Texas in partial... fulfillment of the requirements for the degree of MASTER OP SCIENCE May 1959 Major Subject: Meteorology A SIMPLIFIED SYSTEM OF PRESSURE SURFACES FOR ATMOSPHERIC ANALYSIS A Thesis By FRANCIS S. SHAY Captain USAF jpp roved j as to style and content...

  10. Computational Science and Engineering Certification for Atmospheric Sciences Undergraduate Students

    E-Print Network [OSTI]

    Gilbert, Matthew

    Computational Science and Engineering Certification for Atmospheric Sciences Undergraduate Students The Computational Science and Engineering certificate program is designed to provide ATMS under- graduate students a certificate in "Computational Science and Engineering," students must complete the required courses listed

  11. External Science Review Report of the External Science

    E-Print Network [OSTI]

    Power, Mary Eleanor

    1 External Science Review Report of the External Science Review Committee The Nature Conservancy and Design: Lee Meinicke Jonathan Adams Design and Layout: Naomi Nickerson #12;3 External Science Review............................................................................................................................... 10 The Challenge of Changing Conservation and Changing Science

  12. Science & Technology RoadmapScience & Technology Roadmap 03/24/20063:03 PMSOCD Science & Technology Roadmap

    E-Print Network [OSTI]

    Kuligowski, Bob

    Science & Technology RoadmapScience & Technology Roadmap #12;03/24/20063:03 PMSOCD Science & Technology Roadmap 2 TABLE OF CONTENTS EXECUTIVE SUMMARY ..........................................................................................................................................19 4 ROADMAPS AND LINKAGES

  13. Resources for Teaching Web Science to Computer Science UndergraduatesResources for Teaching Web Science to Computer Science UndergraduatesResources for Teaching Web Science to Computer Science UndergraduatesResources for Teaching Web Science to Computer S

    E-Print Network [OSTI]

    Nelson, Michael L.

    Resources for Teaching Web Science to Computer Science UndergraduatesResources for Teaching Web Science to Computer Science UndergraduatesResources for Teaching Web Science to Computer Science UndergraduatesResources for Teaching Web Science to Computer Science Undergraduates Frank McCown Box 10764

  14. Rank 1995-96 1996-97 1997-98 1998-99 1999-00 2000-01 2001-02 2002-03 2003-04 1 Biological Sciences Biological Sciences Biological Sciences Biological Sciences Biological Sciences Biological Sciences Biological Sciences Biological Sciences Biological Scien

    E-Print Network [OSTI]

    Ullrich, Paul

    Engineering Sociology 3 Sociology 3 Animal Science Animal Science Biochemistry Animal Science Biochem Biological Sciences Biological Sciences Biological Sciences 2 Biochemistry Biochemistry Biochemistry Economics 4 Political Science 2 Political Science 2 Human Development Biochemistry Biochemistry Political

  15. Surface Characterization of Heterogeneous Catalysts Using Low Energy Ion Scattering Spectroscopy Combined with Electrochemistry 

    E-Print Network [OSTI]

    Axnanda, Stephanus R.

    2010-07-14

    Fundamental studies of heterogeneous catalysis were performed and presented in this dissertation to gain a better understanding of heterogeneous catalytic reactions at a molecular level. Surface science techniques were ...

  16. X-ray scattering studies of structure and dynamics of surfaces and interfaces of polymeric liquids

    E-Print Network [OSTI]

    Jiang, Zhang

    2007-01-01

    Evanescent X-ray and Neutron Scattering. Springer-Verlag,Methods of X-ray and neutron scattering in polymer science.Stanley. X-ray and neutron scattering from rough surfaces.

  17. The determination of hemocompatibility of a geometrically-altered poly(dimethylsiloxane) surface

    E-Print Network [OSTI]

    Becker, Geoffrey A

    2005-01-01

    Bio- and hemocompatibility are some of the driving forces behind medical device creation and materials science in this day and age. An experimental study was performed to test whether a geometrically altered surface of ...

  18. College of Science Bachelor of Science, Psychology

    E-Print Network [OSTI]

    Zallen, Richard

    College of Science Bachelor of Science, Psychology Major Checksheet for Students Graduating Education (CLE) courses and the foreign language requirement, psychology majors are required to take 28 OF PSYCHOLOGY (6 hrs.): PSYC 2004-rntroductory Psychology (Prereq. for all other courses) PSYC 2094-Principles

  19. Faculty of Science Health and Biomedical Sciences

    E-Print Network [OSTI]

    Faculty of Science Health and Biomedical Sciences Health care is currently Canada's second-largest service industry and one of the world's fastest-growing employment sectors. Our Health and Biomedical other health or biomedical programs, providing rigorous training that keeps alternate career paths open

  20. COMPUTATIONAL SCIENCE, ENGINEERING & MATHEMATICS

    E-Print Network [OSTI]

    Knopf, Dan

    and engineering; · mathematical modeling; · numerical analysis; · applied mathematics. COMPUTATIONAL ENGINEERINGCOMPUTATIONAL SCIENCE, ENGINEERING & MATHEMATICS: PATH TO DEGREE Fall 2014 Todd Arbogast Chair and Sciences (ICES) and Department of Mathematics The University of Texas at Austin COMPUTATIONAL ENGINEERING

  1. Nuclear Science and Engineering

    E-Print Network [OSTI]

    Bahler, Dennis R.

    Nuclear Science and Engineering Education Sourcebook 2014 American Nuclear Society US Department of Energy #12;Nuclear Science & Engineering Education Sourcebook 2014 North American Edition American Nuclear Society Education, Training, and Workforce Division US Department of Energy Office of Nuclear

  2. Surface modification to waveguides

    DOE Patents [OSTI]

    Timberlake, John R. (Allentown, NJ); Ruzic, David N. (Kendall Park, NJ); Moore, Richard L. (Princeton, NJ); Cohen, Samuel A. (Pennington, NJ); Manos, Dennis M. (Lawrenceville, NJ)

    1983-01-01

    A method of treating the interior surfaces of a waveguide to improve power transmission comprising the steps of mechanically polishing to remove surface protrusions; electropolishing to remove embedded particles; ultrasonically cleaning to remove any residue; coating the interior waveguide surfaces with an alkyd resin solution or electrophoretically depositing carbon lamp black suspended in an alkyd resin solution to form a 1.mu. to 5.mu. thick film; vacuum pyrolyzing the film to form a uniform adherent carbon coating.

  3. Surface modification to waveguides

    DOE Patents [OSTI]

    Timberlake, J.R.; Ruzic, D.N.; Moore, R.L.; Cohen, S.A.; Manos, D.M.

    1982-06-16

    A method is described for treating the interior surfaces of a waveguide to improve power transmission comprising the steps of mechanically polishing to remove surface protrusions; electropolishing to remove embedded particles; ultrasonically cleaning to remove any residue; coating the interior waveguide surfaces with an alkyd resin solution or electrophoretically depositing carbon lamp black suspended in an alkyd resin solution to form a 1..mu.. to 5..mu.. thick film; vacuum pyrolyzing the film to form a uniform adherent carbon coating.

  4. Noncommutative Riemann Surfaces

    E-Print Network [OSTI]

    Joakim Arnlind; Martin Bordemann; Laurent Hofer; Jens Hoppe; Hidehiko Shimada

    2007-11-16

    We introduce C-Algebras of compact Riemann surfaces $\\Sigma$ as non-commutative analogues of the Poisson algebra of smooth functions on $\\Sigma$. Representations of these algebras give rise to sequences of matrix-algebras for which matrix-commutators converge to Poisson-brackets as $N\\to\\infty$. For a particular class of surfaces, nicely interpolating between spheres and tori, we completely characterize (even for the intermediate singular surface) all finite dimensional representations of the corresponding C-algebras.

  5. Physical Sciences 2007 Science & Technology Highlights

    SciTech Connect (OSTI)

    Hazi, A U

    2008-04-07

    The Physical Sciences Directorate applies frontier physics and technology to grand challenges in national security. Our highly integrated and multidisciplinary research program involves collaborations throughout Lawrence Livermore National Laboratory, the National Nuclear Security Administration, the Department of Energy, and with academic and industrial partners. The Directorate has a budget of approximately $150 million, and a staff of approximately 350 employees. Our scientists provide expertise in condensed matter and high-pressure physics, plasma physics, high-energy-density science, fusion energy science and technology, nuclear and particle physics, accelerator physics, radiation detection, optical science, biotechnology, and astrophysics. This document highlights the outstanding research and development activities in the Physical Sciences Directorate that made news in 2007. It also summarizes the awards and recognition received by members of the Directorate in 2007.

  6. MASTER OF SCIENCE IN COMPUTER SCIENCE Mission Statement

    E-Print Network [OSTI]

    O'Laughlin, Jay

    MASTER OF SCIENCE IN COMPUTER SCIENCE Mission Statement The mission of the Department of Computer Learning Outcomes The Computer Science Department offers a Master of Science program in Computer Science with two specializations: Computer Science (CS) and Software Engineering (SE). Upon successful completion

  7. S. Ramaseshan Science Writing Fellowships/Internships Current Science

    E-Print Network [OSTI]

    Giri, Ranjit K.

    S. Ramaseshan Science Writing Fellowships/Internships at Current Science The Current Science Association invites applications for Science Writing Fellowships, instituted in memory of Professor Sivaraj Ramaseshan for his contributions to the journal Current Science and science writing internships for working

  8. Science and the Public A Review of Science

    E-Print Network [OSTI]

    Rambaut, Andrew

    Science and the Public A Review of Science Communication and Public Attitudes to Science in Britain Office of Science and Technology #12;Foreword The Office of Science and Technology and the Wellcome Trust have jointly sponsored this research to help science communicators think about the information needs

  9. Science: The Endless Frontier ---the US National Science Foundation

    E-Print Network [OSTI]

    Leung, Naichung Conan

    Science: The Endless Frontier --- the US National Science Foundation Professor Tony CHAN Mathematics and Physical Sciences US National Science Foundation Abstract: The US National Science Foundation sciences in the US. NSF is also one of three federal funding agencies targeted to receive substantial

  10. International Journal of Computer Science

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    International Journal of Computer Science & Information Security © IJCSIS PUBLICATION 2010 IJCSIS Journal of Computer Science and Information Security (IJCSIS) provides a major venue for rapid publication of high quality computer science research, including multimedia, information science, security, mobile

  11. COMPUTER SCIENCE: MISCONCEPTIONS, CAREER PATHS

    E-Print Network [OSTI]

    Hristidis, Vagelis

    COMPUTER SCIENCE: MISCONCEPTIONS, CAREER PATHS AND RESEARCH CHALLENGES School of Computing Undergraduate Student) #12;Computer Science Misconceptions Intro to Computer Science - Florida International University 2 Some preconceived ideas & stereotypes about Computer Science (CS) are quite common

  12. Energy and Environmental Sciences Directorate

    E-Print Network [OSTI]

    , Director Energy and Transportation Science Division Johney Green, Director Environmental Sciences Division1 4/2/2015 Energy and Environmental Sciences Directorate *Dual-administered with Computing Pierce Climate Change Research Jay Gulledge Biological Systems Science Tony Palumbo Energy Programs

  13. Science Students' Council Western University

    E-Print Network [OSTI]

    Christensen, Dan

    Science Students' Council Western University Natural Sciences Centre, Room 1 Science Students' Council Presents: Intent to Register Information Fair Faculties Participating: Faculty of Science and Schulich School of Medicine

  14. Chemical Sciences Division - CSD

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    CSD Chemical Sciences Division CSD Organization Contact List Search Other Links Research Areas Research Highlights Organization Contacts Publications Awards Employment...

  15. Supercomputing | Computer Science | ORNL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Resilience Engineering of Scientific Software Translation Quantum Computing Machine Learning Information Retrieval Content Tagging Visual Analytics Data Earth Sciences Energy...

  16. Cleaning and passivation of copper surfaces to remove surface radioactivity and prevent oxide formation

    SciTech Connect (OSTI)

    Hoppe, Eric W.; Seifert, Allen; Aalseth, Craig E.; Bachelor, Paula P.; Day, Anthony R.; Edwards, Danny J.; Hossbach, Todd W.; Litke, Kevin E.; McIntyre, Justin I.; Miley, Harry S.; Schulte, Shannon M.; Smart, John E.; Warren, Glen A.

    2007-08-21

    High-purity copper is an attractive material for constructing ultra-low-background radiation measurement devices. Many low-background experiments using high-purity copper have indicated surface contamination emerges as the dominant background. Radon daughters plate out on exposed surfaces, leaving a residual 210Pb background that is difficult to avoid. Dust is also a problem; even under cleanroom conditions, the amount of U and Th deposited on surfaces can represent the largest remaining background. To control these backgrounds, a copper cleaning chemistry has been developed. Designed to replace an effective, but overly aggressive concentrated nitric acid etch, this peroxide-based solution allows for a more controlled cleaning of surfaces. The acidified hydrogen peroxide solution will generally target the Cu+/Cu2+ species which are the predominant surface participants, leaving the bulk of copper metal intact. This preserves the critical tolerances of parts and eliminates significant waste disposal issues. Accompanying passivation chemistry has also been developed that protects copper surfaces from oxidation. Using a high-activity polonium surface spike, the most difficult-to-remove daughter isotope of radon, the performance of these methods are quantified. © 2001 Elsevier Science. All rights reserved

  17. Ammonia volatilization from surface application of ammonium sulfate to carbonate systems 

    E-Print Network [OSTI]

    Feagley, Sam Edward

    1976-01-01

    AMMONIA VOLATILIZATION FROM SURFACE APPLICATION OF AMMONIUM SULFATE TO CARBONATE SYSTEMS A Thesis by SAM EDWARD FEAGLEY Submitted to the Graduate College of Texas A&M University in partial fulfillment of the requirement for the degree... of MASTER OF SCIENCE August 1976 Major Subject; Soil Science AMMONIA VOLATILIZATION FROM SURFACE APPLICATIONS OF AMMONIUM SULFATE TO CARBONATE SYSTEMS A Thesis SAM EDWARD FEAGLEY Approved as to style and content by: Chairman of Committee Head of Dep...

  18. Computer Science and Engineering

    E-Print Network [OSTI]

    Eustice, Ryan

    Graduate Computer Science and Engineering 0 0 11 1 11 0 CSE Graduate Office 3909 Bob and Betty.umich.edu/eecs/graduate/ The Computer Science and Engineering (CSE) graduate program at the University of Michigan has been a leader computer science, mathematics and electrical engineering and other related fields. Bachelors-level students

  19. Computer Science & Engineering

    E-Print Network [OSTI]

    Weiblen, George D

    Computer Science & Engineering at the University of Minnesota Yearsof excellence 40 Department the department head history of the computer science & engineering department Timeline Faculty Awards Software.anderson #12; A Message from the Department Head The University of Minnesota's Computer Science and Engineering

  20. BachelorofScience Biochemistry

    E-Print Network [OSTI]

    Seldin, Jonathan P.

    BachelorofScience Biochemistry This is a planning guide and not a graduation check or guarantee: ____________________________________ Program Planning Guide Major in Biochemistry: www.uleth.ca/artsci/biochemistry Departments: Biological Sciences, and Chemistry and Biochemistry #12;2 Bachelor of Science - Biochemistry Calendar Year - 2013

  1. Communication Science Scholarships

    E-Print Network [OSTI]

    Almor, Amit

    Communication Science Scholarships Complete Scholarship Name Application Deadline Date Contact Name pursuing a graduate degree within the Communication Sciences & Disorders Department. Yes, by nomination of department faculty Rolling Karen Mullis 803.777.4813 kmullis@mailbox.sc.edu Communication Sciences

  2. OPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERING University of New Mexico

    E-Print Network [OSTI]

    New Mexico, University of

    OPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL SCIENCE & ENGINEERINGOPTICAL-locked femtosecond laser. While proving itself to be fantastically successful in its role as the "gears" of optical atomic clocks, the optical frequency comb has further evolved into a valuable tool for a wide range

  3. Division of Laboratory Sciences

    E-Print Network [OSTI]

    #12;#12;Division of Laboratory Sciences U.S. Department of Health and Human Services Centers and Prevention National Center for Environmental Health Division of Laboratory Sciences Atlanta, Georgia 30341 at the Centers for Disease Control and Prevention's (CDC's) Division of Laboratory Sciences have lots

  4. Information Science Tefko Saracevic

    E-Print Network [OSTI]

    Saracevic, Tefko

    Information Science Tefko Saracevic School of Communication, Information and Library Studies@scils.rutgers.edu This essay is a personal analysis of information science as a field of scientific inquiry and professional science in re- spect to the problems of information explosion; the so- cial role of the field; the nature

  5. Alliance of Science Organisations

    E-Print Network [OSTI]

    Falge, Eva

    Alliance of Science Organisations in Germany Statement Alexander von Humboldt Foundation Deutsche Planck Society German Council of Science and Humanities 15 April 2014 Alliance Calls on Policymakers to Swiftly Set the Course for the Future German Research System The Alliance of Science Organisations

  6. Materials Science & Engineering

    E-Print Network [OSTI]

    Simons, Jack

    Materials Science & Engineering The University of Utah 2014-15 Undergraduate Handbook #12;STUDYING FOR A MATERIALS SCIENCE AND ENGINEERING DEGREE Materials Science and Engineering inter-twines numerous disciplines, including chemistry, physics and engineering. It is the one discipline within the College of Engineering

  7. Marine Science Scholarships

    E-Print Network [OSTI]

    Almor, Amit

    Marine Science Scholarships Complete Scholarship Name Application Deadline Date Contact Name Contact Phone Number Contact E-mail Address Marine Science Endowed Student Support Fund Both incoming and current marine science majors are eligible to apply for these merit-based scholarships. Awards consist

  8. Synchrotron Radiation in Polymer Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Synchrotron Radiation in Polymer Science Synchrotron Radiation in Polymer Science March 30-April 2, 2012; San Francisco...

  9. Using Business Scenarios to Surface Requirements for COTS Products WenQian Liu

    E-Print Network [OSTI]

    Easterbrook, Steve

    . lymer@ca.ibm.com Steve Easterbrook Dept. of Computer Science University of Toronto sme Science University of Toronto wl@cs.utoronto.ca Sharon Lymer IBM Toronto Software Lab IBM Canada LtdUsing Business Scenarios to Surface Requirements for COTS Products WenQian Liu Dept. of Computer

  10. Self-assembled nanoparticle surface patterning for improved digital image correlation in a scanning electron microscope

    E-Print Network [OSTI]

    Daly, Samantha

    of these techniques are expensive, require a cleanroom, or can only produce the pattern over small areas of the test, it is an inexpensive and fast patterning technique that does not require cleanroom access or specialized lithography

  11. Computer Science Graduation Requirements Checklist

    E-Print Network [OSTI]

    Zadok, Erez

    Computer Science Graduation Requirements Checklist ­ Fall 2008 Computer Science Courses Course Gr. Sem. Comments CSE 114 Computer Science I [prerequisite: CSE 110] CSE 214 Computer Science II CSE 215 Foundations of Computer Science CSE 219 Computer Science III CSE 220 Computer Organization CSE 300 Writing

  12. Computer Science Graduation Requirements Checklist

    E-Print Network [OSTI]

    Zadok, Erez

    Computer Science Graduation Requirements Checklist ­ Fall 2009 Computer Science Courses Course Gr. Sem. Comments CSE 114 Computer Science I [prerequisite: CSE 110] CSE 214 Computer Science II CSE 215 Foundations of Computer Science CSE 219 Computer Science III CSE 220 Computer Organization CSE 300 Writing

  13. Bachelor of Arts Computer Science

    E-Print Network [OSTI]

    Yu, Sheng-Tao

    Bachelor of Arts Computer Science Degree Requirements Computer Science CSC 1100 (3 cr.) Problem.) Fundamental Structures in Computer Science CSC 1501 (1 cr.) Laboratory for Fundamental Structures in Computer Science CSC 2110 (3 cr.) Computer Science I CSC 2111 (1 cr.) Laboratory for Computer Science I CSC 2200

  14. INFLUENCE OF ARCTIC CLOUD THERMODYNAMIC PHASE ON SURFACE SHORTWAVE FLUX

    E-Print Network [OSTI]

    -phase" category, can affect the surface energy balance at the same order of magnitude as greenhouse gas increases Science Associates, LLC under Contract No. DE-AC02- 98CH10886 with the U.S. Department of Energy a non-exclusive, paid-up, irrevocable, world-wide license to publish or reproduce the published form

  15. Data Management System for Surface Drifters Bob Keeley1

    E-Print Network [OSTI]

    Data Management System for Surface Drifters Bob Keeley1 , Mayra Pazos2 , Bruce Bradshaw1 1. Integrated Science Data Management, Department of Fisheries and Oceans, 200 Kent St., Ottawa, Canada, K1A 0E6. The data management systems to handle the data returned from these platforms started with FGGE and have

  16. 3D Painting on Scanned Surfaces Maneesh Agrawala

    E-Print Network [OSTI]

    Agrawala, Maneesh

    3D Painting on Scanned Surfaces Maneesh Agrawala Andrew C. Beers Marc Levoy Computer Science Department Stanford University Abstract We present an intuitive interface for painting on unparameterized for painting on the mesh, making it intuitive and easy to accurately place color on the mesh. CR categories: 1

  17. Solar absorption surface panel

    DOE Patents [OSTI]

    Santala, Teuvo J. (Attleboro, MA)

    1978-01-01

    A composite metal of aluminum and nickel is used to form an economical solar absorption surface for a collector plate wherein an intermetallic compound of the aluminum and nickel provides a surface morphology with high absorptance and relatively low infrared emittance along with good durability.

  18. BES Science Network Requirements

    SciTech Connect (OSTI)

    Biocca, Alan; Carlson, Rich; Chen, Jackie; Cotter, Steve; Tierney, Brian; Dattoria, Vince; Davenport, Jim; Gaenko, Alexander; Kent, Paul; Lamm, Monica; Miller, Stephen; Mundy, Chris; Ndousse, Thomas; Pederson, Mark; Perazzo, Amedeo; Popescu, Razvan; Rouson, Damian; Sekine, Yukiko; Sumpter, Bobby; Dart, Eli; Wang, Cai-Zhuang -Z; Whitelam, Steve; Zurawski, Jason

    2011-02-01

    The Energy Sciences Network (ESnet) is the primary provider of network connectivityfor the US Department of Energy Office of Science (SC), the single largest supporter of basic research in the physical sciences in the United States. In support of the Office ofScience programs, ESnet regularly updates and refreshes its understanding of the networking requirements of the instruments, facilities, scientists, and science programs that it serves. This focus has helped ESnet to be a highly successful enabler of scientific discovery for over 20 years.

  19. Review: Who’s asking? Native Science, Western Science and Science Education

    E-Print Network [OSTI]

    Ferrara, Enzo

    2015-01-01

    Review: Who’s asking? Native Science,Western Scienceand Science Education By Douglas L. Medin and Megan Bang

  20. Science/Fusion Energy Sciences FY 2007 Congressional Budget Fusion Energy Sciences

    E-Print Network [OSTI]

    Science/Fusion Energy Sciences FY 2007 Congressional Budget Fusion Energy Sciences Funding Profile Adjustments FY 2006 Current Appropriation FY 2007 Request Fusion Energy Sciences Science,182 Total, Fusion Energy Sciences........... 266,947b 290,550 -2,906 287,644 318,950 Public Law

  1. Science, Computational Science and Computer Science: At a D. E. Stevenson

    E-Print Network [OSTI]

    Hallstrom, Jason

    Science, Computational Science and Computer Science: At a Crossroads D. E. Stevenson Department of Computer Science Clemson University Clemson, SC 29634­1906 (803) 656­5880 or steve@cs.clemson.edu August 16, 1993 Abstract We describe computational science as an inter­ disciplinary approach to doing science

  2. Science/Fusion Energy Sciences FY 2011 Congressional Budget Fusion Energy Sciences

    E-Print Network [OSTI]

    Science/Fusion Energy Sciences FY 2011 Congressional Budget Fusion Energy Sciences Funding Profile FY 2010 Current Appropriation FY 2011 Request Fusion Energy Sciences Science 163,479 +57,399 182, Fusion Energy Sciences 394,518b +91,023 426,000 380,000 Public Law Authorizations: Public Law 95

  3. Master of Science in Chemistry/Master of Science in Environmental Science (Public and Environmental Affairs)

    E-Print Network [OSTI]

    de Souza, Romualdo T.

    Master of Science in Chemistry/Master of Science in Environmental Science (Public and Environmental and Environmental Affairs for study toward a M.S. degree in Chemistry and a M.S. in Environmental Science and environmental science, distributed among the following six areas of chemistry and environmental science: (1

  4. http://pic.sagepub.com/ Engineering Science

    E-Print Network [OSTI]

    Barber, James R.

    Features of the stress field at the surface of a flush shrink-fit shaft Published by: http of a flush shrink-fit shaft R J H Paynter1 , D A Hills1 , and J R Barber2 1 Department of Engineering Science-fitted circular shaft in an elastically similar half-space, positioned so that the end of the shaft is flush

  5. A surface science investigation of the formation of passivating layers on copper surfaces 

    E-Print Network [OSTI]

    Hamelin, Elizabeth I.

    1996-01-01

    ), and calcium phosphate dihydrate (e) are compared to . . . 35 . . . 37 phosphate adsorbed from solution (c). . . . . 38 Figure 18 A series of XPS spectra corresponding to the TPD spectra in Figure 15. The spectra are arranged such that from the bottom..., and magnesium chloride. The two solutions termed weak and strong electrolyte varied only in concentration, particularly, the phosphate concentration of 1 ppm and 5 ppm, respectively. To begin this investigation a 5 inonolayer copper film grown on a tantalum...

  6. Comment on ``Ag organisation on Ni(1 1 1) surface" [Surface Science 602 (2008) 2363

    E-Print Network [OSTI]

    Brune, Harald

    2008-01-01

    images were recorded in the constant-current mode (with the stated voltage referring to the electric coverage of 0.1 monolayer (ML). The interpretation of Cham- bon et al. is based on the assumption

  7. Inversion of surface nuclear magnetic resonance data by an adapted Monte Carlo method applied to water resource characterization

    E-Print Network [OSTI]

    Sailhac, Pascal

    Inversion of surface nuclear magnetic resonance data by an adapted Monte Carlo method applied, France Abstract Inversion of surface nuclear magnetic resonance (SNMR) provides important information Science B.V. All rights reserved. Keywords: Inversion; Surface nuclear magnetic resonance; Monte Carlo 1

  8. Rapid prototyping of microchannels with surface patterns for fabrication of polymer fibers

    SciTech Connect (OSTI)

    Goodrich, Payton J.; Sharifi, Farrokh; Hashemi, Nastaran

    2015-08-14

    Microfluidic technology has provided innovative solutions to numerous problems, but the cost of designing and fabricating microfluidic channels is impeding its expansion. In this study, Shrinky-Dink thermoplastic sheets are used to create multilayered complex templates for microfluidic channels. We also used inkjet and laserjet printers to raise a predetermined microchannel geometry by depositing several layers of ink for each feature consecutively. We achieved feature heights over 100 ?m, which were measured and compared with surface profilometry. Templates closest to the target geometry were then used to create microfluidic devices from soft-lithography with the molds as a template. These microfluidic devices were, futhermore used to fabricate polymer microfibers using the microfluidic focusing approach to demonstrate the potential that this process has for microfluidic applications. Finally, an economic analysis was conducted to compare the price of common microfluidic template manufacturing methods. We showed that multilayer microchannels can be created significantly quicker and cheaper than current methods for design prototyping and point-of-care applications in the biomedical area.

  9. Rapid prototyping of microchannels with surface patterns for fabrication of polymer fibers

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Goodrich, Payton J.; Sharifi, Farrokh; Hashemi, Nastaran

    2015-08-14

    Microfluidic technology has provided innovative solutions to numerous problems, but the cost of designing and fabricating microfluidic channels is impeding its expansion. In this study, Shrinky-Dink thermoplastic sheets are used to create multilayered complex templates for microfluidic channels. We also used inkjet and laserjet printers to raise a predetermined microchannel geometry by depositing several layers of ink for each feature consecutively. We achieved feature heights over 100 ?m, which were measured and compared with surface profilometry. Templates closest to the target geometry were then used to create microfluidic devices from soft-lithography with the molds as a template. These microfluidic devicesmore »were, futhermore used to fabricate polymer microfibers using the microfluidic focusing approach to demonstrate the potential that this process has for microfluidic applications. Finally, an economic analysis was conducted to compare the price of common microfluidic template manufacturing methods. We showed that multilayer microchannels can be created significantly quicker and cheaper than current methods for design prototyping and point-of-care applications in the biomedical area.« less

  10. Computer Science 1 Department of Computer Science

    E-Print Network [OSTI]

    Steinberg, Louis

    , networks, and robots ­ In every industry ­ In every size business ­ In every size team #12;Computer Science and Activities ­ The CAVE ­ Hack-R-Space ­ HackRU ­ HackHers ­ Code Red . . . See www

  11. Imaging Science Physics Computer Science Photographic &

    E-Print Network [OSTI]

    Salvaggio, Carl

    Calculus Sequence Professional Communications Concepts of Computer Systems Intro to Computer Science Theory Advanced Principles of Photographic Technology Color Measurement Scientific Photography Fundamentals Devices Electromagnetic Fields and Transmission Lines Computer Program Solving for Engineers Mechatronics

  12. Enhanced surface hydrophobicity by coupling of surface polarity and topography

    E-Print Network [OSTI]

    Enhanced surface hydrophobicity by coupling of surface polarity and topography Nicolas organization and contact angle. We show that when the topography and polarity of the surface act in concert- ciated that the topography of a surface is important in deter- mining the degree of surface

  13. Asteroid Surface Geophysics

    E-Print Network [OSTI]

    Murdoch, Naomi; Schwartz, Stephen R; Miyamoto, Hideaki

    2015-01-01

    The regolith-covered surfaces of asteroids preserve records of geophysical processes that have occurred both at their surfaces and sometimes also in their interiors. As a result of the unique micro-gravity environment that these bodies posses, a complex and varied geophysics has given birth to fascinating features that we are just now beginning to understand. The processes that formed such features were first hypothesised through detailed spacecraft observations and have been further studied using theoretical, numerical and experimental methods that often combine several scientific disciplines. These multiple approaches are now merging towards a further understanding of the geophysical states of the surfaces of asteroids. In this chapter we provide a concise summary of what the scientific community has learned so far about the surfaces of these small planetary bodies and the processes that have shaped them. We also discuss the state of the art in terms of experimental techniques and numerical simulations that...

  14. Entropy and surfaceness

    E-Print Network [OSTI]

    Casper, James Kyle

    1997-01-01

    The layer of the Earth's atmosphere which contains clouds and weather systems is a thin thermoregulatory surface. It maintains an exact energy budget between the Earth and the Sun. Recent work in theoretical physics is ...

  15. SURFACE NONLINEAR OPTICS

    E-Print Network [OSTI]

    Shen, Y.R.

    2010-01-01

    B. de Castro, and Y. R. Shen, Optics Lett. i, 393 See, for3, 1980 SURFACE NONLINEAR OPTICS Y.R. Shen, C.K. Chen, andde Janiero SURFRACE NONLINEAR OPTICS Y. R. Shen, C. K. Chen,

  16. Surface wave interferometry 

    E-Print Network [OSTI]

    Halliday, David Fraser

    2009-01-01

    This thesis concerns the application of seismic interferometry to surface waves. Seismic interferometry is the process by which the wavefield between two recording locations is estimated, resulting in new recordings at ...

  17. Structured surfaces for hemocompatibility

    E-Print Network [OSTI]

    Schrauth, Anthony J

    2005-01-01

    The rise of micro- and nano-technologies has brought to light intriguing examples of scale-driven performance in a diverse array of fields. The quest to create highly hydrophobic surfaces is one such field. The application ...

  18. A surface ionization source 

    E-Print Network [OSTI]

    Buzatu, Daniel J.

    1995-01-01

    The main part of the work described herein is the development and testing of a surface ionization source for use on a collinear fast beam laser spectroscopy apparatus. A description of the previously existing fast beam apparatus is given...

  19. Ultra-short wavelength x-ray system

    DOE Patents [OSTI]

    Umstadter, Donald (Ann Arbor, MI); He, Fei (Ann Arbor, MI); Lau, Yue-Ying (Potomac, MD)

    2008-01-22

    A method and apparatus to generate a beam of coherent light including x-rays or XUV by colliding a high-intensity laser pulse with an electron beam that is accelerated by a synchronized laser pulse. Applications include x-ray and EUV lithography, protein structural analysis, plasma diagnostics, x-ray diffraction, crack analysis, non-destructive testing, surface science and ultrafast science.

  20. Multifunctional thin film surface

    DOE Patents [OSTI]

    Brozik, Susan M.; Harper, Jason C.; Polsky, Ronen; Wheeler, David R.; Arango, Dulce C.; Dirk, Shawn M.

    2015-10-13

    A thin film with multiple binding functionality can be prepared on an electrode surface via consecutive electroreduction of two or more aryl-onium salts with different functional groups. This versatile and simple method for forming multifunctional surfaces provides an effective means for immobilization of diverse molecules at close proximities. The multifunctional thin film has applications in bioelectronics, molecular electronics, clinical diagnostics, and chemical and biological sensing.