National Library of Energy BETA

Sample records for investigating extreme ultraviolet

  1. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Investigating Extreme Ultraviolet Lithography Mask Defects Print Wednesday, 28 July 2010 00:00 Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using

  2. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  3. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  4. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  5. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  6. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  7. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigating Extreme Ultraviolet Lithography Mask Defects Print Since the 1970s, the semiconductor industry has strived to shrink the cost and size of circuit patterns printed onto computer chips in accordance with Moore's law, doubling the number of transistors on a computer's central processing unit (CPU) every two years. The introduction of extreme ultraviolet (EUV) lithography, printing chips using 13-nm-wavelength light, opens the way to future generations of smaller, faster, and cheaper

  8. Extreme ultraviolet lithography machine

    DOE Patents [OSTI]

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  9. Method for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  10. Method for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E. (727 Clara St., Livermore, Alameda County, CA 94550); Kubiak, G. D. (475 Maple St., Livermore, Alameda County, CA 94550)

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  11. Photoresist composition for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Felter, T. E. (Alameda County, CA); Kubiak, G. D. (Alameda County, CA)

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  12. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    SciTech Connect (OSTI)

    Chen, Hong; Duan, Lian; Lan, Hui; Wang, Xinbing Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-21

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer–Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  13. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

    DOE Patents [OSTI]

    Hassanein, Ahmed; Konkashbaev, Isak

    2006-10-03

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

  14. Xe capillary target for laser-plasma extreme ultraviolet source

    SciTech Connect (OSTI)

    Inoue, Takahiro; Okino, Hideyasu; Nica, Petru Edward; Amano, Sho; Miyamoto, Shuji; Mochizuki, Takayasu

    2007-10-15

    A cryogenic Xe jet system with an annular nozzle has been developed in order to continuously fast supply a Xe capillary target for generating a laser-plasma extreme ultraviolet (EUV) source. The cooling power of the system was evaluated to be 54 W, and the temperature stability was {+-}0.5 K at a cooling temperature of about 180 K. We investigated experimentally the influence of pressure loss inside an annular nozzle on target formation by shortening the nozzle length. Spraying caused by cavitation was mostly suppressed by mitigating the pressure loss, and a focused jet was formed. Around a liquid-solid boundary, a solid-Xe capillary target (100/70 {mu}m {phi}) was formed with a velocity of {<=}0.01 m/s. Laser-plasma EUV generation was tested by focusing a Nd:YAG laser beam on the target. The results suggested that an even thinner-walled capillary target is required to realize the inertial confinement effect.

  15. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

    DOE Patents [OSTI]

    Chapman, Henry N.; Nugent, Keith A.

    2001-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  16. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

    DOE Patents [OSTI]

    Chapman, Henry N.; Nugent, Keith A.

    2002-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  17. MoRu/Be multilayers for extreme ultraviolet applications

    DOE Patents [OSTI]

    Bajt, Sasa C.; Wall, Mark A.

    2001-01-01

    High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

  18. Self-cleaning optic for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  19. Broadband extreme ultraviolet probing of transient gratings in vanadium dioxide

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Sistrunk, Emily; Lawrence Livermore National Lab.; Grilj, Jakob; Ecole Polytechnique Federal de Lausanne; Jeong, Jaewoo; Samant, Mahesh G.; Gray, Alexander X.; Temple Univ. Philadelphia, PA; Drr, Hermann A.; Parkin, Stuart S. P.; et al

    2015-02-11

    Nonlinear spectroscopy in the extreme ultraviolet (EUV) and soft x-ray spectral range offers the opportunity for element selective probing of ultrafast dynamics using core-valence transitions (Mukamel et al., Acc. Chem. Res. 42, 553 (2009)). We demonstrate a step on this path showing core-valence sensitivity in transient grating spectroscopy with EUV probing. We study the optically induced insulator-to-metal transition (IMT) of a VO? film with EUV diffraction from the optically excited sample. The VO? exhibits a change in the 3p-3d resonance of V accompanied by an acoustic response. Due to the broadband probing we are able to separate the two features.

  20. High numerical aperture projection system for extreme ultraviolet projection lithography

    DOE Patents [OSTI]

    Hudyma, Russell M.

    2000-01-01

    An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

  1. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    blemishes. In lithography, the complex process used to create computer chips, a six-inch glass plate called a mask carries one layer of a circuit pattern-the image of which is...

  2. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... Tchikoulaeva, and C. Holfeld, "Actinic imaging of native and programmed defects on a full-field mask," Proc. SPIE 7636, 76361A (2010). ALS Science Highlight 213 ALSNews Vol. 311

  3. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... La Fontaine, A. Tchikoulaeva, and C. Holfeld, "Actinic imaging of native and programmed defects on a full-field mask," Proc. SPIE 7636, 76361A (2010). ALS Science Highlight 213

  4. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Tool The AIT is the world's highest-performing EUV microscope dedicated to photomask research. It operates on bend-magnet Beamline 11.3.2 at the Advanced Light Source, Lawrence...

  5. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    the size of this defect, which appears as a dark line surrounded by a transparent halo. Actinic inspection with the AIT shows that the halo is completely opaque to EUV. This...

  6. Investigating Extreme Ultraviolet Lithography Mask Defects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    At the center of the viewable 30-micron region, the aberration-corrected "sweet spot" covers 5 to 8 microns. The AIT team has developed methods to optimize the alignment of the ...

  7. Method for the protection of extreme ultraviolet lithography optics

    DOE Patents [OSTI]

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  8. THE EXTREME-ULTRAVIOLET EMISSION FROM SUN-GRAZING COMETS

    SciTech Connect (OSTI)

    Bryans, P.; Pesnell, W. D.

    2012-11-20

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses. We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  9. Extreme ultraviolet induced defects on few-layer graphene

    SciTech Connect (OSTI)

    Gao, A.; Zoethout, E.; Lee, C. J.; Rizo, P. J.; Scaccabarozzi, L.; Banine, V.; Bijkerk, F.; MESA Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede

    2013-07-28

    We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e., relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a H{sub 2} background increases the graphene dosage sensitivity, due to reactions caused by the EUV induced hydrogen plasma. X-ray photoelectron spectroscopy results show that the sp{sup 2} bonded carbon fraction decreases while the sp{sup 3} bonded carbon and oxide fraction increases with exposure dose. Our experimental results confirm that even in reducing environment oxidation is still one of the main source of inducing defects.

  10. Sensitivity calibration of an imaging extreme ultraviolet spectrometer-detector system for determining the efficiency of broadband extreme ultraviolet sources

    SciTech Connect (OSTI)

    Fuchs, S.; Roedel, C.; Bierbach, J.; Paz, A. E.; Foerster, E.; Paulus, G. G.; Krebs, M.; Haedrich, S.; Limpert, J.; Kuschel, S.; Wuensche, M.; Hilbert, V.; Zastrau, U.

    2013-02-15

    We report on the absolute sensitivity calibration of an extreme ultraviolet (XUV) spectrometer system that is frequently employed to study emission from short-pulse laser experiments. The XUV spectrometer, consisting of a toroidal mirror and a transmission grating, was characterized at a synchrotron source in respect of the ratio of the detected to the incident photon flux at photon energies ranging from 15.5 eV to 99 eV. The absolute calibration allows the determination of the XUV photon number emitted by laser-based XUV sources, e.g., high-harmonic generation from plasma surfaces or in gaseous media. We have demonstrated high-harmonic generation in gases and plasma surfaces providing 2.3 {mu}W and {mu}J per harmonic using the respective generation mechanisms.

  11. Graphene defect formation by extreme ultraviolet generated photoelectrons

    SciTech Connect (OSTI)

    Gao, A. Lee, C. J.; Bijkerk, F.

    2014-08-07

    We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we have mimicked the process by using low energy primary electrons. Graphene is irradiated by an electron beam with energy lower than 80?eV. After e-beam irradiation, it is found that the D peak, I(D), appears in the Raman spectrum, indicating defect formation in graphene. The evolution of I(D)/I(G) follows the amorphization trajectory with increasing irradiation dose, indicating that graphene goes through a transformation from microcrystalline to nanocrystalline and then further to amorphous carbon. Further, irradiation of graphene with increased water partial pressure does not significantly change the Raman spectra, which suggests that, in the extremely low energy range, e-beam induced chemical reactions between residual water and graphene are not the dominant mechanism driving defect formation in graphene. Single layer graphene, partially suspended over holes was irradiated with EUV radiation. By comparing with the Raman results from e-beam irradiation, it is concluded that the photoelectrons, especially those from the valence band, contribute to defect formation in graphene during irradiation.

  12. Four-mirror extreme ultraviolet (EUV) lithography projection system

    DOE Patents [OSTI]

    Cohen, Simon J; Jeong, Hwan J; Shafer, David R

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  13. AN EXTREME-ULTRAVIOLET WAVE ASSOCIATED WITH A SURGE

    SciTech Connect (OSTI)

    Zheng, Ruisheng; Jiang, Yunchun; Yang, Jiayan; Bi, Yi; Hong, Junchao; Yang, Bo; Yang, Dan

    2013-02-10

    Taking advantage of the high temporal and spatial resolution observations from the Solar Dynamics Observatory, we present an extreme-ultraviolet (EUV) wave associated with a surge on 2010 November 13. Due to the magnetic flux cancelation, some surges formed in the source active region (AR). The strongest surge produced our studied event. The surge was deflected by the nearby loops that connected to another AR, and disrupted the overlying loops that slowly expanded and eventually evolved into a weak coronal mass ejection (CME). The surge was likely associated with the core of the CME. The EUV wave happened after the surge deflected. The wave departed far from the flare center and showed a close location relative to the deflected surge. The wave propagated in a narrow angular extent, mainly in the ejection direction of the surge. The close timing and location relations between the EUV wave and the surge indicate that the wave was closely associated with the CME. The wave had a velocity of 310-350 km s{sup -1}, while the speeds of the surge and the expanding loops were about 130 and 150 km s{sup -1}, respectively. All of the results suggest that the EUV wave was a fast-mode wave and was most likely triggered by the weak CME.

  14. Attosecond extreme ultraviolet generation in cluster by using spatially inhomogeneous field

    SciTech Connect (OSTI)

    Feng, Liqiang; Liu, Hang

    2015-01-15

    A promising method to generate the attosecond extreme ultraviolet (XUV) sources has been theoretically investigated emerging from the two-dimensional Ar{sup +} cluster driven by the spatially inhomogeneous field. The results show that with the introduction of the Ar{sup +} cluster model, not only the harmonic cutoffs are enhanced, but also the harmonic yields are reinforced. Furthermore, by properly moderating the inhomogeneity as well as the laser parameters of the inhomogeneous field, the harmonic cutoff can be further extended. As a result, three almost linearly polarized XUV pulses with durations of 40 as, 42 as, and 45 as can be obtained.

  15. Bright high-repetition-rate source of narrowband extreme-ultraviolet...

    Office of Scientific and Technical Information (OSTI)

    femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ... Spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz ...

  16. Europium (Z=63) n=3-3 lines in the extreme ultraviolet: Na- through...

    Office of Scientific and Technical Information (OSTI)

    Title: Europium (Z63) n3-3 lines in the extreme ultraviolet: Na- through Si-like ions Authors: Trabert, E ; Beiersdorfer, P ; Hell, N ; Brown, G V Publication Date: 2014-08-22 ...

  17. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Li, Zheng; Vendrell, Oriol

    2016-01-13

    The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2O)n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. As a result, for situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20more » to 40 fs driven by strong non-adiabatic effects.« less

  18. Wave-mixing with high-order harmonics in extreme ultraviolet region

    SciTech Connect (OSTI)

    Dao, Lap Van; Dinh, Khuong Ba; Le, Hoang Vu; Gaffney, Naylyn; Hannaford, Peter

    2015-01-12

    We report studies of the wave-mixing process in the extreme ultraviolet region with two near-infrared driving and controlling pulses with incommensurate frequencies (at 1400 nm and 800 nm). A non-collinear scheme for the two beams is used in order to spatially separate and to characterise the properties of the high-order wave-mixing field. We show that the extreme ultraviolet frequency mixing can be treated by perturbative, very high-order nonlinear optics; the modification of the wave-packet of the free electron needs to be considered in this process.

  19. Low-cost method for producing extreme ultraviolet lithography optics

    DOE Patents [OSTI]

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  20. Method for plasma formation for extreme ultraviolet lithography-theta pinch

    DOE Patents [OSTI]

    Hassanein, Ahmed; Konkashbaev, Isak; Rice, Bryan

    2007-02-20

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

  1. Supersonic cluster jet source for debris-free extreme ultraviolet production

    SciTech Connect (OSTI)

    Kubiak, G.D.; Bernardez, L.J.

    1997-09-01

    The supersonic cluster jet has been developed and characterized for use as a target medium to produce a clean source of extreme ultraviolet radiation for extreme ultraviolet lithography and other applications. Spectroscopic characterization of the laser plasma emission produced from Xe, O{sub 2} and Kr cluster gas targets has been performed. Xe is the most efficient target gas, exhibiting a conversion efficiency at 13.5 nm of 0.8% into the relevant 2.5% spectral bandwidth. The other target gases are less efficient in the spectral region of interest and, in the case of oxygen, emit {approximately}5 times less off-band radiation. The angular distribution of the Xe plasma emission has also been characterized.

  2. Extreme Ultraviolet Imaging of Electron Heated Targets in Petawatt Laser Experiments

    SciTech Connect (OSTI)

    Ma, T; MacPhee, A; Key, M; Akli, K; Mackinnon, A; Chen, C; Barbee, T; Freeman, R; King, J; Link, A; Offermann, D; Ovchinnikov, V; Patel, P; Stephens, R; VanWoerkom, L; Zhang, B; Beg, F

    2007-11-29

    The study of the transport of electrons, and the flow of energy into a solid target or dense plasma, is instrumental in the development of fast ignition inertial confinement fusion. An extreme ultraviolet (XUV) imaging diagnostic at 256 eV and 68 eV provides information about heating and energy deposition within petawatt laser-irradiated targets. XUV images of several irradiated solid targets are presented.

  3. Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

    SciTech Connect (OSTI)

    Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria; Barkusky, Frank; Mann, Klaus; Mueller, Matthias

    2013-05-28

    Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

  4. CITIUS: An infrared-extreme ultraviolet light source for fundamental and applied ultrafast science

    SciTech Connect (OSTI)

    Grazioli, C.; Gauthier, D.; Ivanov, R.; De Ninno, G.; Elettra Sincrotrone Trieste, Trieste ; Callegari, C.; Spezzani, C.; Ciavardini, A.; Coreno, M.; Institute of Inorganic Methodologies and Plasmas , Montelibretti, Roma ; Frassetto, F.; Miotti, P.; Poletto, L.; Golob, D.; Kivimäki, A.; Mahieu, B.; Service des Photons Atomes et Molécules, Commissariat à l'Energie Atomique, Centre d'Etudes de Saclay, Bâtiment 522, 91191 Gif-sur-Yvette ; Bučar, B.; Merhar, M.; Polo, E.; Ressel, B.

    2014-02-15

    We present the main features of CITIUS, a new light source for ultrafast science, generating tunable, intense, femtosecond pulses in the spectral range from infrared to extreme ultraviolet (XUV). The XUV pulses (about 10{sup 5}-10{sup 8} photons/pulse in the range 14-80 eV) are produced by laser-induced high-order harmonic generation in gas. This radiation is monochromatized by a time-preserving monochromator, also allowing one to work with high-resolution bandwidth selection. The tunable IR-UV pulses (10{sup 12}-10{sup 15} photons/pulse in the range 0.4-5.6 eV) are generated by an optical parametric amplifier, which is driven by a fraction of the same laser pulse that generates high order harmonics. The IR-UV and XUV pulses follow different optical paths and are eventually recombined on the sample for pump-probe experiments. We also present the results of two pump-probe experiments: with the first one, we fully characterized the temporal duration of harmonic pulses in the time-preserving configuration; with the second one, we demonstrated the possibility of using CITIUS for selective investigation of the ultra-fast dynamics of different elements in a magnetic compound.

  5. Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

    SciTech Connect (OSTI)

    Roy, Amitava E-mail: aroy@barc.gov.in; Murtaza Hassan, Syed; Harilal, Sivanandan S.; Hassanein, Ahmed; Endo, Akira; Mocek, Tomas

    2014-05-15

    We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064?nm, Nd:YAG laser pulses with varying pulse duration (515?ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ?0.5?T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasma show that the ion flux reduces by a factor of ?5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ?1.2?cm/?s and reduced to ?0.75?cm/?s with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5?T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.

  6. Improving Ramsey spectroscopy in the extreme-ultraviolet region with a random-sampling approach

    SciTech Connect (OSTI)

    Eramo, R.; Bellini, M. [Istituto Nazionale di Ottica (INO-CNR), Largo E. Fermi 6, I-50125 Florence (Italy); European Laboratory for Non-linear Spectroscopy (LENS), I-50019 Sesto Fiorentino, Florence (Italy); Corsi, C.; Liontos, I. [European Laboratory for Non-linear Spectroscopy (LENS), I-50019 Sesto Fiorentino, Florence (Italy); Cavalieri, S. [European Laboratory for Non-linear Spectroscopy (LENS), I-50019 Sesto Fiorentino, Florence (Italy); Department of Physics, University of Florence, I-50019 Sesto Fiorentino, Florence (Italy)

    2011-04-15

    Ramsey-like techniques, based on the coherent excitation of a sample by delayed and phase-correlated pulses, are promising tools for high-precision spectroscopic tests of QED in the extreme-ultraviolet (xuv) spectral region, but currently suffer experimental limitations related to long acquisition times and critical stability issues. Here we propose a random subsampling approach to Ramsey spectroscopy that, by allowing experimentalists to reach a given spectral resolution goal in a fraction of the usual acquisition time, leads to substantial improvements in high-resolution spectroscopy and may open the way to a widespread application of Ramsey-like techniques to precision measurements in the xuv spectral region.

  7. Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

    SciTech Connect (OSTI)

    Medvedev, V. V. Kruijs, R. W. E. van de; Yakshin, A. E.; Novikova, N. N.; Krivtsun, V. M.; Louis, E.; Bijkerk, F.; MESA Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede ; Yakunin, A. M.

    2013-11-25

    We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

  8. Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Montcalm, Claude (Livermore, CA); Stearns, Daniel G. (Los Altos, CA); Vernon, Stephen P. (Pleasanton, CA)

    1999-01-01

    A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.

  9. Compact multi-bounce projection system for extreme ultraviolet projection lithography

    DOE Patents [OSTI]

    Hudyma, Russell M.

    2002-01-01

    An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

  10. Properites of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)

    SciTech Connect (OSTI)

    Bajt, S; Edwards, N V; Madey, T E

    2007-06-25

    The contamination of optical surfaces by irradiation shortens optics lifetime and is one of the main concerns for optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools. This paper focuses on properties and surface chemistry of different materials, which as thin layers, could be used as capping layers to protect and extend EUVL optics lifetime. The most promising candidates include single element materials such as ruthenium and rhodium, and oxides such as TiO{sub 2} and ZrO{sub 2}.

  11. Overlying extreme-ultraviolet arcades preventing eruption of a filament observed by AIA/SDO

    SciTech Connect (OSTI)

    Chen, Huadong; Ma, Suli; Zhang, Jun

    2013-11-20

    Using the multi-wavelength data from the Atmospheric Imaging Assembly/Solar Dynamic Observatory (AIA/SDO) and the Sun Earth Connection Coronal and Heliospheric Investigation/Solar Terrestrial Relations Observatory (SECCHI/STEREO), we report a failed filament eruption in NOAA AR 11339 on 2011 November 3. The eruption was associated with an X1.9 flare, but without any coronal mass ejection (CME), coronal dimming, or extreme ultraviolet (EUV) waves. Some magnetic arcades above the filament were observed distinctly in EUV channels, especially in the AIA 94 and 131 wavebands, before and during the filament eruption process. Our results show that the overlying arcades expanded along with the ascent of the filament at first until they reached a projected height of about 49 Mm above the Sun's surface, where they stopped. The following filament material was observed to be confined by the stopped EUV arcades and not to escape from the Sun. After the flare, a new filament formed at the low corona where part of the former filament remained before its eruption. These results support that the overlying arcades play an important role in preventing the filament from successfully erupting outward. We also discuss in this paper the EUV emission of the overlying arcades during the flare. It is rare for a failed filament eruption to be associated with an X1.9 class flare, but not with a CME or EUV waves. Therefore, this study also provides valuable insight into the triggering mechanism of the initiation of CMEs and EUV waves.

  12. Optimizing laser produced plasmas for efficient extreme ultraviolet and soft X-ray light sources

    SciTech Connect (OSTI)

    Sizyuk, Tatyana; Hassanein, Ahmed [Center for Materials under Extreme Environment, School of Nuclear Engineering, Purdue University, West Lafayette, Indiana 47907 (United States)

    2014-08-15

    Photon sources produced by laser beams with moderate laser intensities, up to 10{sup 14?}W/cm{sup 2}, are being developed for many industrial applications. The performance requirements for high volume manufacture devices necessitate extensive experimental research supported by theoretical plasma analysis and modeling predictions. We simulated laser produced plasma sources currently being developed for several applications such as extreme ultraviolet lithography using 13.5%??1% nm bandwidth, possibly beyond extreme ultraviolet lithography using 6. nm wavelengths, and water-window microscopy utilizing 2.48?nm (La-?) and 2.88?nm (He-?) emission. We comprehensively modeled plasma evolution from solid/liquid tin, gadolinium, and nitrogen targets as three promising materials for the above described sources, respectively. Results of our analysis for plasma characteristics during the entire course of plasma evolution showed the dependence of source conversion efficiency (CE), i.e., laser energy to photons at the desired wavelength, on plasma electron density gradient. Our results showed that utilizing laser intensities which produce hotter plasma than the optimum emission temperatures allows increasing CE for all considered sources that, however, restricted by the reabsorption processes around the main emission region and this restriction is especially actual for the 6.?nm sources.

  13. LARGE-SCALE EXTREME-ULTRAVIOLET DISTURBANCES ASSOCIATED WITH A LIMB CORONAL MASS EJECTION

    SciTech Connect (OSTI)

    Dai, Y.; Auchere, F.; Vial, J.-C.; Tang, Y. H.; Zong, W. G.

    2010-01-10

    We present composite observations of a coronal mass ejection (CME) and the associated large-scale extreme-ultraviolet (EUV) disturbances on 2007 December 31 by the Extreme-ultraviolet Imager (EUVI) and COR1 coronagraph on board the recent Solar Terrestrial Relations Observatory mission. For this limb event, the EUV disturbances exhibit some typical characteristics of EUV Imaging Telescope waves: (1) in the 195 A bandpass, diffuse brightenings are observed propagating oppositely away from the flare site with a velocity of approx260 km s{sup -1}, leaving dimmings behind; (2) when the brightenings encounter the boundary of a polar coronal hole, they stop there to form a stationary front. Multi-temperature analysis of the propagating EUV disturbances favors a heating process over a density enhancement in the disturbance region. Furthermore, the EUVI-COR1 composite display shows unambiguously that the propagation of the diffuse brightenings coincides with a large lateral expansion of the CME, which consequently results in a double-loop-structured CME leading edge. Based on these observational facts, we suggest that the wave-like EUV disturbances are a result of magnetic reconfiguration related to the CME liftoff rather than true waves in the corona. Reconnections between the expanding CME magnetic field lines and surrounding quiet-Sun magnetic loops account for the propagating diffuse brightenings; dimmings appear behind them as a consequence of volume expansion. X-ray and radio data provide us with complementary evidence.

  14. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

    DOE Patents [OSTI]

    Kublak, G.D.; Richardson, M.C.

    1996-11-19

    Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.

  15. Study of the extreme ultraviolet spectrum of O/sub 2/ by electron impact

    SciTech Connect (OSTI)

    Ajello, J.M.; Franklin, B.

    1985-03-15

    We have measured in the laboratory the electron impact emission cross sections for O/sub 2/ at 200 eV. Included in the study are all emission features in the extreme ultraviolet from 40 to 131 nm at a resolution of 0.5 nm. The features are entirely from the dissociation products (OI, OII, OIII). Additionally we have measured the excitation functions from 0 to 400 eV for characteristic OI multiplets at 98.9 and 102.6 nm and for OII multiplets at 53.9 and 83.3 nm. We find the OI multiplets are formed near the dissociation limit whereas the OII multiplets have a threshold about 10 eV above the dissociation limit. We also determine the total VUV emission cross section of O/sub 2/ from 40 to 200 nm and indicate the effects of autoionization to the measured emission spectrum.

  16. Enhancement of laser plasma extreme ultraviolet emission by shockwave-laser interaction

    SciTech Connect (OSTI)

    Bruijn, Rene de; Koshelev, Konstantin N.; Zakharov, Serguei V.; Novikov, Vladimir G.; Bijkerk, Fred

    2005-04-15

    A double laser pulse heating scheme has been applied to generate plasmas with enhanced emission in the extreme ultraviolet (EUV). The plasmas were produced by focusing two laser beams (prepulse and main pulse) with a small spatial separation between the foci on a xenon gas jet target. Prepulses with ps-duration were applied to obtain high shockwave densities, following indications of earlier published results obtained using ns prepulses. EUV intensities around 13.5 nm and in the range 5-20 nm were recorded, and a maximum increase in intensity exceeding 2 was measured at an optimal delay of 140 ns between prepulse and main pulse. The gain in intensity is explained by the interaction of the shockwave produced by the prepulse with the xenon in the beam waist of the main pulse. Extensive simulation was done using the radiative magnetohydrodynamic code Z{sup *}.

  17. Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.

    2004-11-23

    A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.

  18. THE HIGH-RESOLUTION EXTREME-ULTRAVIOLET SPECTRUM OF N{sub 2} BY ELECTRON IMPACT

    SciTech Connect (OSTI)

    Heays, A. N.; Ajello, J. M.; Aguilar, A.; Lewis, B. R.; Gibson, S. T.

    2014-04-01

    We have analyzed high-resolution (FWHM = 0.2 ) extreme-ultraviolet (EUV, 800-1350 ) laboratory emission spectra of molecular nitrogen excited by an electron impact at 20 and 100 eV under (mostly) optically thin, single-scattering experimental conditions. A total of 491 emission features were observed from N{sub 2} electronic-vibrational transitions and atomic N I and N II multiplets and their emission cross sections were measured. Molecular emission was observed at vibrationally excited ground-state levels as high as v'' = 17, from the a {sup 1}? {sub g} , b {sup 1}? {sub u} , and b'{sup 1}? {sub u} {sup +} excited valence states and the Rydberg series c'{sub n} {sub +1} {sup 1}? {sub u} {sup +}, c{sub n} {sup 1}? {sub u} , and o{sub n} {sup 1}? {sub u} for n between 3 and 9. The frequently blended molecular emission bands were disentangled with the aid of a sophisticated and predictive quantum-mechanical model of excited states that includes the strong coupling between valence and Rydberg electronic states and the effects of predissociation. Improved model parameters describing electronic transition moments were obtained from the experiment and allowed for a reliable prediction of the vibrationally summed electronic emission cross section, including an extrapolation to unobserved emission bands and those that are optically thick in the experimental spectra. Vibrationally dependent electronic excitation functions were inferred from a comparison of emission features following 20 and 100 eV electron-impact collisional excitation. The electron-impact-induced fluorescence measurements are compared with Cassini Ultraviolet Imaging Spectrograph observations of emissions from Titan's upper atmosphere.

  19. Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

    SciTech Connect (OSTI)

    Shahzad, M.; Culfa, O.; Rossall, A. K.; Tallents, G. J.; Wilson, L. A.; Guilbaud, O.; Kazamias, S.; Delmas, O.; Demailly, J.; Maitrallain, A.; Pittman, M.; Baynard, E.; Farjardo, M.

    2015-02-15

    We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10{sup 16} Wcm{sup −2} is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe{sup 5+} and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV). A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.

  20. A Molecular- and Nano-Electronics Test (MONET) platform fabricated using extreme ultraviolet lithography.

    SciTech Connect (OSTI)

    Dentinger, Paul M.; Cardinale, Gregory F.; Hunter, Luke L.; Talin, Albert Alec

    2003-12-01

    We describe the fabrication and characterization of an electrode array test structure, designed for electrical probing of molecules and nanocrystals. We use Extreme Ultraviolet Lithography (EUVL) to define the electrical test platform features. As fabricated, the platform includes nominal electrode gaps of 0 nm, 40 nm, 60 nm, and 80 nm. Additional variation in electrode gap is achieved by controlling the exposure conditions, such as dose and focus. To enable EUVL based nanofabrication, we develop a novel bi-level photoresist process. The bi-level photoresist consists of a combination of a commercially available polydimethylglutarimide (PMGI) bottom layer and an experimental EUVL photoresist top (imaging) layer. We measure the sensitivity of PMGI to EUV exposure dose as a function of photoresist pre-bake temperature, and using this data, optimize a metal lift-off process. Reliable fabrication of 700 Angstrom thick Au structures with sub-1000 Angstrom critical dimensions is achieved, even without the use of a Au adhesion layer, such as Ti. Several test platforms are used to characterize electrical properties of organic molecules deposited as self assembled monolayers.

  1. Characterization of gas targets for laser produced extreme ultraviolet plasmas with a Hartmann-Shack sensor

    SciTech Connect (OSTI)

    Peth, Christian; Kranzusch, Sebastian; Mann, Klaus; Vioel, Wolfgang

    2004-10-01

    A table top extreme ultraviolet (EUV)-source was developed at Laser-Laboratorium Goettingen for the characterization of optical components and sensoric devices in the wavelength region from 11 to 13 nm. EUV radiation is generated by focusing the beam of a Q-switched Nd:YAG laser into a pulsed xenon gas jet. Since a directed gas jet with a high number density is needed for an optimal performance of the source, conical nozzles with different cone angles were drilled with an excimer laser to produce a supersonic gas jet. The influence of the nozzle geometry on the gas jet was characterized with a Hartmann-Shack wave front sensor. The deformation of a planar wave front after passing the gas jet was analyzed with this sensor, allowing a reconstruction of the gas density distribution. Thus, the gas jet was optimized resulting in an increase of EUV emission by a factor of two and a decrease of the plasma size at the same time.

  2. THE EXTREME ULTRAVIOLET DEFICIT AND MAGNETICALLY ARRESTED ACCRETION IN RADIO-LOUD QUASARS

    SciTech Connect (OSTI)

    Punsly, Brian

    2014-12-20

    The Hubble Space Telescope composite quasar spectra presented in Telfer et al. show a significant deficit of emission in the extreme ultraviolet for the radio-loud component of the quasar population (RLQs) compared to the radio-quiet component of the quasar population. The composite quasar continuum emission between 1100 Å and ∼580 Å is generally considered to be associated with the innermost regions of the accretion flow onto the central black hole. The deficit between 1100 Å and 580 Å in RLQs has a straightforward interpretation as a missing or a suppressed innermost region of local energy dissipation in the accretion flow. It is proposed that this can be the result of islands of large-scale magnetic flux in RLQs that are located close to the central black hole that remove energy from the accretion flow as Poynting flux (sometimes called magnetically arrested accretion). These magnetic islands are natural sites for launching relativistic jets. Based on the Telfer et al. data and the numerical simulations of accretion flows in Penna et al., the magnetic islands are concentrated between the event horizon and an outer boundary of <2.8 M (in geometrized units) for rapidly rotating black holes and <5.5 M for modestly rotating black holes.

  3. Bright high-repetition-rate source of narrowband extreme-ultraviolet...

    Office of Scientific and Technical Information (OSTI)

    This enhancement exceeds the expected dipole scaling, evidencing improved phase-matching for ultraviolet-driven HHG under tight focusing as corroborated by simulations. Spectral ...

  4. Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching

    SciTech Connect (OSTI)

    Shin, H.; Srivastava, S. N.; Ruzic, D. N. [Center for Plasma Material Interactions, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)

    2008-05-15

    Tin (Sn) has the advantage of delivering higher conversion efficiency compared to other fuel materials (e.g., Xe or Li) in an extreme ultraviolet (EUV) source, a necessary component for the leading next generation lithography. However, the use of a condensable fuel in a lithography system leads to some additional challenges for maintaining a satisfactory lifetime of the collector optics. A critical issue leading to decreased mirror lifetime is the buildup of debris on the surface of the primary mirror that comes from the use of Sn in either gas discharge produced plasma (GDPP) or laser produced plasma (LPP). This leads to a decreased reflectivity from the added material thickness and increased surface roughness that contributes to scattering. Inductively coupled plasma reactive ion etching with halide ions is one potential solution to this problem. This article presents results for etch rate and selectivity of Sn over SiO{sub 2} and Ru. The Sn etch rate in a chlorine plasma is found to be much higher (of the order of hundreds of nm/min) than the etch rate of other materials. A thermally evaporated Sn on Ru sample was prepared and cleaned using an inductively coupled plasma etching method. Cleaning was confirmed using several material characterization techniques. Furthermore, a collector mock-up shell was then constructed and etching was performed on Sn samples prepared in a Sn EUV source using an optimized etching recipe. The sample surface before and after cleaning was analyzed by atomic force microscopy, x-ray photoelectron spectroscopy, and Auger electron spectroscopy. The results show the dependence of etch rate on the location of Sn samples placed on the collector mock-up shell.

  5. ACTIVE REGION MOSS: DOPPLER SHIFTS FROM HINODE/EXTREME-ULTRAVIOLET IMAGING SPECTROMETER OBSERVATIONS

    SciTech Connect (OSTI)

    Tripathi, Durgesh [Inter-University Centre for Astronomy and Astrophysics, Pune University Campus, Pune 411007 (India); Mason, Helen E. [Department of Applied Mathematics and Theoretical Physics, University of Cambridge, Wilberforce Road, Cambridge CB3 0WA (United Kingdom); Klimchuk, James A. [NASA Goddard Space Flight Center, Greenbelt, MD 20771 (United States)

    2012-07-01

    Studying the Doppler shifts and the temperature dependence of Doppler shifts in moss regions can help us understand the heating processes in the core of the active regions. In this paper, we have used an active region observation recorded by the Extreme-ultraviolet Imaging Spectrometer (EIS) on board Hinode on 2007 December 12 to measure the Doppler shifts in the moss regions. We have distinguished the moss regions from the rest of the active region by defining a low-density cutoff as derived by Tripathi et al. in 2010. We have carried out a very careful analysis of the EIS wavelength calibration based on the method described by Young et al. in 2012. For spectral lines having maximum sensitivity between log T = 5.85 and log T = 6.25 K, we find that the velocity distribution peaks at around 0 km s{sup -1} with an estimated error of 4-5 km s{sup -1}. The width of the distribution decreases with temperature. The mean of the distribution shows a blueshift which increases with increasing temperature and the distribution also shows asymmetries toward blueshift. Comparing these results with observables predicted from different coronal heating models, we find that these results are consistent with both steady and impulsive heating scenarios. However, the fact that there are a significant number of pixels showing velocity amplitudes that exceed the uncertainty of 5 km s{sup -1} is suggestive of impulsive heating. Clearly, further observational constraints are needed to distinguish between these two heating scenarios.

  6. A chain of winking (oscillating) filaments triggered by an invisible extreme-ultraviolet wave

    SciTech Connect (OSTI)

    Shen, Yuandeng; Tian, Zhanjun; Zhao, Ruijuan; Ichimoto, Kiyoshi; Ishii, Takako T.; Shibata, Kazunari

    2014-05-10

    Winking (oscillating) filaments have been observed for many years. However, observations of successive winking filaments in one event have not yet been reported. In this paper, we present the observations of a chain of winking filaments and a subsequent jet that are observed right after the X2.1 flare in AR11283. The event also produced an extreme-ultraviolet (EUV) wave that has two components: an upward dome-like wave (850 km s{sup 1}) and a lateral surface wave (554 km s{sup 1}) that was very weak (or invisible) in imaging observations. By analyzing the temporal and spatial relationships between the oscillating filaments and the EUV waves, we propose that all the winking filaments and the jet were triggered by the weak (or invisible) lateral surface EUV wave. The oscillation of the filaments last for two or three cycles, and their periods, Doppler velocity amplitudes, and damping times are 11-22 minutes, 6-14 km s{sup 1}, and 25-60 minutes, respectively. We further estimate the radial component magnetic field and the maximum kinetic energy of the filaments, and they are 5-10 G and ?10{sup 19} J, respectively. The estimated maximum kinetic energy is comparable to the minimum energy of ordinary EUV waves, suggesting that EUV waves can efficiently launch filament oscillations on their path. Based on our analysis results, we conclude that the EUV wave is a good agent for triggering and connecting successive but separated solar activities in the solar atmosphere, and it is also important for producing solar sympathetic eruptions.

  7. Note: On the wavelength dependence of the intensity calibration factor of extreme ultraviolet spectrometer determined with profile measurement of bremsstrahlung continuum

    SciTech Connect (OSTI)

    Yamaguchi, N.; Morita, S.; Dong, C. F.; Goto, M.; Maezawa, H.; Miyauchi, H.

    2015-06-15

    The absolute calibration factor of extreme ultraviolet spectroscopic instrument which has recently been determined from absolute radiation profile measurement of bremsstrahlung continuum has been investigated by comparing the calculated diffraction efficiency of grating. An overall tendency of the wavelength dependence of the calibration factor from 40 Å to 500 Å can be reproduced by that of the grating efficiency, especially the agreement between the measured calibration factor and the calculated grating efficiency has been found to be fairly good for the wavelength range 200 Å-500 Å.

  8. JET ROTATION INVESTIGATED IN THE NEAR-ULTRAVIOLET WITH THE HUBBLE SPACE TELESCOPE IMAGING SPECTROGRAPH

    SciTech Connect (OSTI)

    Coffey, Deirdre; Ray, Thomas P.; Rigliaco, Elisabetta; Bacciotti, Francesca; Eisloeffel, Jochen

    2012-04-20

    We present results of the second phase of our near-ultraviolet investigation into protostellar jet rotation using the Hubble Space Telescope Imaging Spectrograph. We obtain long-slit spectra at the base of five T Tauri jets to determine if there is a difference in radial velocity between the jet borders which may be interpreted as a rotation signature. These observations are extremely challenging and push the limits of current instrumentation, but have the potential to provide long-awaited observational support for the magnetocentrifugal mechanism of jet launching in which jets remove angular momentum from protostellar systems. We successfully detect all five jet targets (from RW Aur, HN Tau, DP Tau, and CW Tau) in several near-ultraviolet emission lines, including the strong Mg II doublet. However, only RW Aur's bipolar jet presents a sufficiently high signal-to-noise ratio to allow for analysis. The approaching jet lobe shows a difference of 10 km s{sup -1} in a direction which agrees with the disk rotation sense, but is opposite to previously published optical measurements for the receding jet. The near-ultraviolet difference is not found six months later, nor is it found in the fainter receding jet. Overall, in the case of RW Aur, differences are not consistent with a simple jet rotation interpretation. Indeed, given the renowned complexity and variability of this system, it now seems likely that any rotation signature is confused by other influences, with the inevitable conclusion that RW Aur is not suited to a jet rotation study.

  9. HINODE/EXTREME-ULTRAVIOLET IMAGING SPECTROMETER OBSERVATIONS OF THE TEMPERATURE STRUCTURE OF THE QUIET CORONA

    SciTech Connect (OSTI)

    Brooks, David H.; Warren, Harry P. [Space Science Division, Code 7673, Naval Research Laboratory, Washington, DC 20375 (United States); Williams, David R. [Mullard Space Science Laboratory, University College London, Holmbury St Mary, Dorking, Surrey RH5 6NT (United Kingdom); Watanabe, Tetsuya, E-mail: dhbrooks@ssd5.nrl.navy.mi [National Astronomical Observatory of Japan, Osawa, Mitaka, Tokyo 181-8588 (Japan)

    2009-11-10

    We present a differential emission measure (DEM) analysis of the quiet solar corona on disk using data obtained by the Extreme-ultraviolet Imaging Spectrometer (EIS) on Hinode. We show that the expected quiet-Sun DEM distribution can be recovered from judiciously selected lines, and that their average intensities can be reproduced to within 30%. We present a subset of these selected lines spanning the temperature range log T = 5.6-6.4 K that can be used to derive the DEM distribution reliably, including a subset of iron lines that can be used to derive the DEM distribution free of the possibility of uncertainties in the elemental abundances. The subset can be used without the need for extensive measurements, and the observed intensities can be reproduced to within the estimated uncertainty in the pre-launch calibration of EIS. Furthermore, using this subset, we also demonstrate that the quiet coronal DEM distribution can be recovered on size scales down to the spatial resolution of the instrument (1'' pixels). The subset will therefore be useful for studies of small-scale spatial inhomogeneities in the coronal temperature structure, for example, in addition to studies requiring multiple DEM derivations in space or time. We apply the subset to 45 quiet-Sun data sets taken in the period 2007 January to April, and show that although the absolute magnitude of the coronal DEM may scale with the amount of released energy, the shape of the distribution is very similar up to at least log T approx 6.2 K in all cases. This result is consistent with the view that the shape of the quiet-Sun DEM is mainly a function of the radiating and conducting properties of the plasma and is fairly insensitive to the location and rate of energy deposition. This universal DEM may be sensitive to other factors such as loop geometry, flows, and the heating mechanism, but if so they cannot vary significantly from quiet-Sun region to region.

  10. A study of the terrestrial thermosphere by remote sensing of OI dayglow in the far and extreme ultraviolet

    SciTech Connect (OSTI)

    Cotton, D.M.

    1991-01-01

    The upper region of the Earth's atmosphere, the thermosphere, is a key part of the coupled solar-terrestrial system. An important method of obtaining information in the this region is through analysis of radiation excited through the interactions of the thermosphere with solar ionizing, extreme and far ultraviolet radiation. This dissertation presents one such study by the remote sensing of OI in the far and extreme ultraviolet dayglow. The research program included the development construction, and flight of a sounding rocket spectrometer to test this current understanding of the excitation and transport mechanisms of the OI 1356, 1304, 1027, and 989 {angstrom} emissions. This data set was analyzed using current electron and radiative transport models with the purpose of checking the viability of OI remote sensing; that is, whether existing models and input parameters are adequate to predict these detailed measurements. From discrepancies between modeled and measured emissions, inferences about these input parameters were made. Among other things, the data supports a 40% optically thick cascade contribution to the 1304 {angstrom} emission. From upper lying states corresponding to 1040, 1027 and 989 {angstrom} about half of this cascade has been accounted for in this study. There is also evidence that the Lyman {beta} airglow from the geo-corona contributes a significant proportion (30-50%) to the OI 1027 {angstrom} feature. Furthermore, the photoelectron contribution to the 1027 {angstrom} feature appears to be underestimated in the current models by a factor of 20.

  11. Time-resolved extreme-ultraviolet spectroscopy of laser-produced plasmas originating at the parylene layer of microballon targets

    SciTech Connect (OSTI)

    Griem, H.R.; Moreno, J.

    1991-03-01

    In experiments this past year at the University of Rochester's Laboratory for Laser Energetics we obtained time-integrated and time-resolved spectra from the ultraviolet to the x-ray region. We have investigated various phenomena in laser-produced plasmas including spectral line broadening, plasma expansion velocities, ionization and recombination of low-Z materials in spherical targets, and the formation of satellites near some resonance lines. In addition we have improved our spectroscopic instrumentation.

  12. Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

    DOE Patents [OSTI]

    Ruffner, J.A.

    1999-06-15

    A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet (DUV) and Extreme Ultra-Violet (EUV) wavelengths. The method results in a product with minimum feature sizes of less than 0.10 [micro]m for the shortest wavelength (13.4 nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R[sup 2] factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates. 15 figs.

  13. Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

    DOE Patents [OSTI]

    Ruffner, Judith Alison

    1999-01-01

    A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet ("DUV") and Extreme Ultra-Violet ("EUV") wavelengths. The method results in a product with minimum feature sizes of less than 0.10-.mu.m for the shortest wavelength (13.4-nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R.sup.2 factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates.

  14. A solar type II radio burst from coronal mass ejection-coronal ray interaction: Simultaneous radio and extreme ultraviolet imaging

    SciTech Connect (OSTI)

    Chen, Yao; Du, Guohui; Feng, Shiwei; Kong, Xiangliang; Wang, Bing; Feng, Li; Guo, Fan; Li, Gang

    2014-05-20

    Simultaneous radio and extreme ultraviolet (EUV)/white-light imaging data are examined for a solar type II radio burst occurring on 2010 March 18 to deduce its source location. Using a bow-shock model, we reconstruct the three-dimensional EUV wave front (presumably the type-II-emitting shock) based on the imaging data of the two Solar TErrestrial RElations Observatory spacecraft. It is then combined with the Nanay radio imaging data to infer the three-dimensional position of the type II source. It is found that the type II source coincides with the interface between the coronal mass ejection (CME) EUV wave front and a nearby coronal ray structure, providing evidence that the type II emission is physically related to the CME-ray interaction. This result, consistent with those of previous studies, is based on simultaneous radio and EUV imaging data for the first time.

  15. Effects of the dynamics of droplet-based laser-produced plasma on angular extreme ultraviolet emission profile

    SciTech Connect (OSTI)

    Giovannini, Andrea Z.; Abhari, Reza S.

    2014-05-12

    The emission distribution of extreme ultraviolet (EUV) radiation from droplet targets is dependent on the dynamics of the laser-produced plasma. The EUV emission is measured on a 2% bandwidth centered at 13.5 nm (in-band). The targets of the laser are small (sub-50 μm) tin droplets, and the in-band emission distribution is measured for different laser irradiances and droplet sizes at various angular positions. Larger droplets lead to a faster decay of EUV emission at larger angles with respect to the laser axis. A decrease in laser irradiance has the opposite effect. The measurements are used together with an analytical model to estimate plume dynamics. Additionally, the model is used to estimate EUV emission distribution for a desired droplet diameter and laser irradiance.

  16. Extended-range grazing-incidence spectrometer for high-resolution extreme ultraviolet measurements on an electron beam ion trap

    SciTech Connect (OSTI)

    Beiersdorfer, P.; Magee, E. W.; Brown, G. V.; Träbert, E.; Widmann, K.; Hell, N.

    2014-11-15

    A high-resolution grazing-incidence grating spectrometer has been implemented on the Livermore electron beam ion traps for performing very high-resolution measurements in the soft x-ray and extreme ultraviolet region spanning from below 10 Å to above 300 Å. The instrument operates without an entrance slit and focuses the light emitted by highly charged ions located in the roughly 50 μm wide electron beam onto a cryogenically cooled back-illuminated charge-coupled device detector. The measured line widths are below 0.025 Å above 100 Å, and the resolving power appears to be limited by the source size and Doppler broadening of the trapped ions. Comparisons with spectra obtained with existing grating spectrometers show an order of magnitude improvement in spectral resolution.

  17. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

    DOE Patents [OSTI]

    Kublak, Glenn D.; Richardson, Martin C. (CREOL

    1996-01-01

    Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.

  18. AN ULTRAVIOLET INVESTIGATION OF ACTIVITY ON EXOPLANET HOST STARS

    SciTech Connect (OSTI)

    Shkolnik, Evgenya L.

    2013-03-20

    Using the far-UV (FUV) and near-UV (NUV) photometry from the NASA Galaxy Evolution Explorer (GALEX), we searched for evidence of increased stellar activity due to tidal and/or magnetic star-planet interactions (SPI) in the 272 known FGK planetary hosts observed by GALEX. With the increased sensitivity of GALEX, we are able probe systems with lower activity levels and at larger distances than what has been done to date with X-ray satellites. We compared samples of stars with close-in planets (a < 0.1 AU) to those with far-out planets (a > 0.5 AU) and looked for correlations of excess activity with other system parameters. This statistical investigation found no clear correlations with a, M{sub p} , or M{sub p} /a, in contrast to some X-ray and Ca II studies. However, there is tentative evidence (at a level of 1.8{sigma}) that stars with radial-velocity-(RV)-detected close-in planets are more FUV-active than stars with far-out planets, in agreement with several published X-ray and Ca II results. The case is strengthened to a level of significance to 2.3{sigma} when transit-detected close-in planets are included. This is most likely because the RV-selected sample of stars is significantly less active than the field population of comparable stars, while the transit-selected sample is similarly active. Given the factor of 2-3 scatter in fractional FUV luminosity for a given stellar effective temperature, it is necessary to conduct a time-resolved study of the planet hosts in order to better characterize their UV variability and generate a firmer statistical result.

  19. Quantitative analysis of electron energy loss spectra and modelling of optical properties of multilayer systems for extreme ultraviolet radiation regime

    SciTech Connect (OSTI)

    Gusenleitner, S.; Hauschild, D.; Reinert, F.; Handick, E.

    2014-03-28

    Ruthenium capped multilayer coatings for use in the extreme ultraviolet (EUV) radiation regime have manifold applications in science and industry. Although the Ru cap shall protect the reflecting multilayers, the surface of the heterostructures suffers from contamination issues and surface degradation. In order to get a better understanding of the effects of these impurities on the optical parameters, reflection electron energy loss spectroscopy (REELS) measurements of contaminated and H cleaned Ru multilayer coatings were taken at various primary electron beam energies. Experiments conducted at low primary beam energies between 100?eV and 1000?eV are very surface sensitive due to the short inelastic mean free path of the electrons in this energy range. Therefore, influences of the surface condition on the above mentioned characteristics can be appraised. In this paper, it can be shown that carbon and oxide impurities on the mirror surface decrease the transmission of the Ru cap by about 0.75% and the overall reflectance of the device is impaired as the main share of the non-transmitted EUV light is absorbed in the contamination layer.

  20. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    SciTech Connect (OSTI)

    Plogmaker, S. E-mail: Joachim.Terschluesen@physics.uu.se Terschlüsen, J. A. E-mail: Joachim.Terschluesen@physics.uu.se Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J. E-mail: Joachim.Terschluesen@physics.uu.se

    2015-12-15

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10{sup 10} photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  1. Radiation damage resistance of AlGaN detectors for applications in the extreme-ultraviolet spectral range

    SciTech Connect (OSTI)

    Barkusky, Frank; Peth, Christian; Bayer, Armin; Mann, Klaus; John, Joachim; Malinowski, Pawel E.

    2009-09-15

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky-photodiode-based detectors. AlGaN layers were grown using metal-organic chemical vapor deposition (MOCVD) on Si(111) wafers. The diodes were characterized at a wavelength of 13.5 nm using a table-top extreme-ultraviolet (EUV) radiation source, consisting of a laser-produced xenon plasma and a Schwarzschild objective. The responsivity of the diodes was tested between EUV energies ranging from 320 nJ down to several picojoules. For low fluences, a linear responsivity of 7.14 mAs/J could be determined. Saturation starts at approximately 1 nJ, merging into a linear response of 0.113 mAs/J, which could be attributed to the photoeffect on the Au electrodes on top of the diode. Furthermore, degradation tests were performed up to an absolute dose of 3.3x10{sup 19} photons/cm{sup 2}. AlGaN photodiodes were compared to commercially available silicon-based photodetectors. For AlGaN diodes, responsivity does not change even for the highest EUV dose, whereas the response of the Si diode decreases linearly to {approx}93% after 2x10{sup 19} photons/cm{sup 2}.

  2. Chemical Effect of Dry and Wet Cleaning of the Ru Protective Layer of the Extreme ultraviolet (EUV) Lithography Reflector

    SciTech Connect (OSTI)

    Belau, Leonid; Park, Jeong Y.; Liang, Ted; Seo, Hyungtak; Somorjai, Gabor A.

    2009-04-10

    The authors report the chemical influence of cleaning of the Ru capping layer on the extreme ultraviolet (EUV) reflector surface. The cleaning of EUV reflector to remove the contamination particles has two requirements: to prevent corrosion and etching of the reflector surface and to maintain the reflectivity functionality of the reflector after the corrosive cleaning processes. Two main approaches for EUV reflector cleaning, wet chemical treatments [sulfuric acid and hydrogen peroxide mixture (SPM), ozonated water, and ozonated hydrogen peroxide] and dry cleaning (oxygen plasma and UV/ozone treatment), were tested. The changes in surface morphology and roughness were characterized using scanning electron microscopy and atomic force microscopy, while the surface etching and change of oxidation states were probed with x-ray photoelectron spectroscopy. Significant surface oxidation of the Ru capping layer was observed after oxygen plasma and UV/ozone treatment, while the oxidation is unnoticeable after SPM treatment. Based on these surface studies, the authors found that SPM treatment exhibits the minimal corrosive interactions with Ru capping layer. They address the molecular mechanism of corrosive gas and liquid-phase chemical interaction with the surface of Ru capping layer on the EUV reflector.

  3. DIFFRACTION, REFRACTION, AND REFLECTION OF AN EXTREME-ULTRAVIOLET WAVE OBSERVED DURING ITS INTERACTIONS WITH REMOTE ACTIVE REGIONS

    SciTech Connect (OSTI)

    Shen Yuandeng; Liu Yu; Zhao Ruijuan; Tian Zhanjun; Su Jiangtao; Li Hui; Ichimoto, Kiyoshi; Shibata, Kazunari

    2013-08-20

    We present observations of the diffraction, refraction, and reflection of a global extreme-ultraviolet (EUV) wave propagating in the solar corona. These intriguing phenomena are observed when the wave interacts with two remote active regions, and together they exhibit properties of an EUV wave. When the wave approached AR11465, it became weaker and finally disappeared in the active region, but a few minutes later a new wavefront appeared behind the active region, and it was not concentric with the incoming wave. In addition, a reflected wave was also simultaneously observed on the wave incoming side. When the wave approached AR11459, it transmitted through the active region directly and without reflection. The formation of the new wavefront and the transmission could be explained with diffraction and refraction effects, respectively. We propose that the different behaviors observed during the interactions may be caused by different speed gradients at the boundaries of the two active regions. We find that the EUV wave formed ahead of a group of expanding loops a few minutes after the start of the loops' expansion, which represents the initiation of the associated coronal mass ejection (CME). Based on these results, we conclude that the EUV wave should be a nonlinear magnetosonic wave or shock driven by the associated CME, which propagated faster than the ambient fast mode speed and gradually slowed down to an ordinary linear wave. Our observations support the hybrid model that includes both fast wave and slow non-wave components.

  4. NON-POTENTIAL FIELDS IN THE QUIET SUN NETWORK: EXTREME-ULTRAVIOLET AND MAGNETIC FOOTPOINT OBSERVATIONS

    SciTech Connect (OSTI)

    Chesny, D. L.; Oluseyi, H. M.; Orange, N. B.

    2013-11-20

    The quiet Sun (QS) magnetic network is known to contain dynamics which are indicative of non-potential fields. Non-potential magnetic fields forming ''S-shaped'' loop arcades can lead to the breakdown of static activity and have only been observed in high temperature X-ray coronal structuressome of which show eruptive behavior. Thus, analysis of this type of atmospheric structuring has been restricted to large-scale coronal fields. Here we provide the first identification of non-potential loop arcades exclusive to the QS supergranulation network. High-resolution Atmospheric Imaging Assembly data from the Solar Dynamics Observatory have allowed for the first observations of fine-scale ''S-shaped'' loop arcades spanning the network. We have investigated the magnetic footpoint flux evolution of these arcades from Heliospheric and Magnetic Imager data and find evidence of evolving footpoint flux imbalances accompanying the formation of these non-potential fields. The existence of such non-potentiality confirms that magnetic field dynamics leading to the build up of helicity exist at small scales. QS non-potentiality also suggests a self-similar formation process between the QS network and high temperature corona and the existence of self-organized criticality (SOC) in the form of loop-pair reconnection and helicity dissipation. We argue that this type of behavior could lead to eruptive forms of SOC as seen in active region (AR) and X-ray sigmoids if sufficient free magnetic energy is available. QS magnetic network dynamics may be considered as a coronal proxy at supergranular scales, and events confined to the network can even mimic those in coronal ARs.

  5. Development of extreme ultraviolet and soft x-ray multilayer optics for scientific studies with femtosecond/attosecond sources

    SciTech Connect (OSTI)

    Aquila, Andrew Lee

    2009-05-21

    The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses This thesis describes the design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig- Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy. As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs

  6. Direct photoetching of polymers using radiation of high energy density from a table-top extreme ultraviolet plasma source

    SciTech Connect (OSTI)

    Barkusky, Frank; Bayer, Armin; Peth, Christian; Mann, Klaus

    2009-01-01

    In order to perform material interaction studies with intense extreme ultraviolet (EUV) radiation, a Schwarzschild mirror objective coated with Mo/Si multilayers was adapted to a compact laser-driven EUV plasma source utilizing a solid Au target. By 10x demagnified imaging of the plasma a maximum pulse energy density of {approx}0.73 J/cm{sup 2} at a wavelength of 13.5 nm can be achieved in the image plane of the objective at a pulse duration of 8.8 ns. In this paper we present EUV photoetching rates measured for polymethyl methacrylate, polycarbonate, and polytetrafluoroethylene at various fluence levels. A linear dependence between etch depth and applied EUV pulse number could be observed without the necessity for any incubation pulses. By evaluating the slope of these data, etch rates were determined, revealing also a linear behavior for low fluences. A threshold energy density could not be observed. The slope of the linear etch regime as well as deviations from the linear trend at higher energy densities are discussed and compared to data known from deep UV laser ablation. Furthermore, the surface roughness of the structured polymers was measured by atomic force microscopy and compared to the nonirradiated polymer surface, indicating a rather smooth etch process (roughness increase of 20%-30%). The different shapes of the etch craters observed for the three polymers at high energy densities can be explained by the measured fluence dependence of the etch rates, having consequences for the proper use of polymer ablation for beam profiling of focused EUV radiation.

  7. Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective

    SciTech Connect (OSTI)

    Barkusky, Frank; Peth, Christian; Mann, Klaus; Feigl, Torsten; Kaiser, Norbert

    2005-10-15

    In order to generate high-energy densities of 13.5 nm radiation, an extreme ultraviolet (EUV) Schwarzschild mirror objective with a numerical aperture of 0.44 and a demagnification of 10 was developed and adapted to a compact laser-based EUV source. The annular spherical mirror substrates were coated with Mo/Si multilayer systems. With a single mirror reflectance of more than 65% the total transmittance of the Schwarzschild objective exceeds 40% at 13.5 nm. From the properties of the EUV source (pulse energy 3 mJ at 13.5 nm and plasma diameter approximately 300 {mu}m), energy densities of 73 mJ/cm{sup 2} at a pulse length of 6 ns can be estimated in the image plane of the objective. As a first application, the formation of color centers in lithium fluoride crystals by EUV radiation was investigated. F{sub 2}, F{sub 3}, and F{sub 3}{sup +} color centers could be identified by absorption spectroscopy. The formation dynamics was studied as a function of the EUV dose. By imaging of a pinhole positioned behind the plasma, an EUV spot of 5 {mu}m diameter was generated, which accomplishes direct writing of color centers with micrometer resolution.

  8. Direct photo-etching of poly(methyl methacrylate) using focused extreme ultraviolet radiation from a table-top laser-induced plasma source

    SciTech Connect (OSTI)

    Barkusky, Frank; Peth, Christian; Bayer, Armin; Mann, Klaus

    2007-06-15

    In order to perform material interaction studies with intense extreme ultraviolet (EUV) radiation, a Schwarzschild mirror objective coated with Mo/Si multilayers was adapted to a compact laser-based EUV plasma source (pulse energy 3 mJ at {lambda}=13.5 nm, plasma diameter {approx}300 {mu}m). By 10x demagnified imaging of the plasma a pulse energy density of {approx}75 mJ/cm{sup 2} at a pulse length of 6 ns can be achieved in the image plane of the objective. As demonstrated for poly(methyl methacrylate) (PMMA), photoetching of polymer surfaces is possible at this EUV fluence level. This paper presents first results, including a systematic determination of PMMA etching rates under EUV irradiation. Furthermore, the contribution of out-of-band radiation to the surface etching of PMMA was investigated by conducting a diffraction experiment for spectral discrimination from higher wavelength radiation. Imaging of a pinhole positioned behind the plasma accomplished the generation of an EUV spot of 1 {mu}m diameter, which was employed for direct writing of surface structures in PMMA.

  9. Extreme ultraviolet reflector

    DOE Patents [OSTI]

    Newnam, Brian E.

    1990-01-01

    A multi-faceted mirror forms a retroreflector for a resonator loop in a free electron laser (FEL) operating in the XUV (.lambda.=10-100 nm). The number of facets is determined by the angle-of-incidence needed to obtain total external reflectance (TER) from the facet surface and the angle through which the FEL beam is to be turned. Angles-of-incidence greater than the angle for TER may be used to increase the area of the beam incident on the surface and reduce energy absorption density. Suitable surface films having TER in the 10-100 nm range may be formed from a variety of materials, including Al, single-crystal Si, Ag, and Rh. One of the facets is formed as an off-axis conic section to collimate the output beam with minimum astigmatism.

  10. A fast-time-response extreme ultraviolet spectrometer for measurement of impurity line emissions in the Experimental Advanced Superconducting Tokamak

    SciTech Connect (OSTI)

    Zhang, Ling; Xu, Zong; Wu, Zhenwei; Zhang, Pengfei; Wu, Chengrui; Gao, Wei; Shen, Junsong; Chen, Yingjie; Liu, Xiang; Wang, Yumin; Gong, Xianzu; Hu, Liqun; Chen, Junlin; Zhang, Xiaodong; Wan, Baonian; Li, Jiangang; Morita, Shigeru; Ohishi, Tetsutarou; Goto, Motoshi; Dong, Chunfeng; and others

    2015-12-15

    A flat-field extreme ultraviolet (EUV) spectrometer working in the 20-500 Å wavelength range with fast time response has been newly developed to measure line emissions from highly ionized tungsten in the Experimental Advanced Superconducting Tokamak (EAST) with a tungsten divertor, while the monitoring of light and medium impurities is also an aim in the present development. A flat-field focal plane for spectral image detection is made by a laminar-type varied-line-spacing concave holographic grating with an angle of incidence of 87°. A back-illuminated charge-coupled device (CCD) with a total size of 26.6 × 6.6 mm{sup 2} and pixel numbers of 1024 × 255 (26 × 26 μm{sup 2}/pixel) is used for recording the focal image of spectral lines. An excellent spectral resolution of Δλ{sub 0} = 3-4 pixels, where Δλ{sub 0} is defined as full width at the foot position of a spectral line, is obtained at the 80-400 Å wavelength range after careful adjustment of the grating and CCD positions. The high signal readout rate of the CCD can improve the temporal resolution of time-resolved spectra when the CCD is operated in the full vertical binning mode. It is usually operated at 5 ms per frame. If the vertical size of the CCD is reduced with a narrow slit, the time response becomes faster. The high-time response in the spectral measurement therefore makes possible a variety of spectroscopic studies, e.g., impurity behavior in long pulse discharges with edge-localized mode bursts. An absolute intensity calibration of the EUV spectrometer is also carried out with a technique using the EUV bremsstrahlung continuum at 20-150 Å for quantitative data analysis. Thus, the high-time resolution tungsten spectra have been successfully observed with good spectral resolution using the present EUV spectrometer system. Typical tungsten spectra in the EUV wavelength range observed from EAST discharges are presented with absolute intensity and spectral identification.

  11. Study of extreme-ultraviolet emission and properties of a coronal streamer from PROBA2/SWAP, HINODE/EIS and Mauna Loa Mk4 observations

    SciTech Connect (OSTI)

    Goryaev, F.; Slemzin, V.; Vainshtein, L. [P.N. Lebedev Physical Institute of the RAS (LPI), Moscow 119991 (Russian Federation); Williams, David R., E-mail: goryaev_farid@mail.ru [Mullard Space Science Laboratory, University College London, Holmbury St Mary, Surrey, RH5 6NT (United Kingdom)

    2014-02-01

    Wide-field extreme-ultraviolet (EUV) telescopes imaging in spectral bands sensitive to 1 MK plasma on the Sun often observe extended, ray-like coronal structures stretching radially from active regions to distances of 1.5-2 R {sub ?}, which represent the EUV counterparts of white-light streamers. To explain this phenomenon, we investigated the properties of a streamer observed on 2010 October 20 and 21, by the PROBA2/SWAP EUV telescope together with the Hinode/EIS (HOP 165) and the Mauna Loa Mk4 white-light coronagraph. In the SWAP 174 band comprising the Fe IX-Fe XI lines, the streamer was detected to a distance of 2 R {sub ?}. We assume that the EUV emission is dominated by collisional excitation and resonant scattering of monochromatic radiation coming from the underlying corona. Below 1.2 R {sub ?}, the plasma density and temperature were derived from the Hinode/EIS data by a line-ratio method. Plasma conditions in the streamer and in the background corona above 1.2 R {sub ?} from the disk center were determined by forward-modeling the emission that best fit the observational data in both EUV and white light. It was found that the plasma in the streamer above 1.2 R {sub ?} is nearly isothermal, with a temperature of T = 1.43 0.08 MK. The hydrostatic scale-height temperature determined from the evaluated density distribution was significantly higher (1.72 0.08 MK), which suggests the existence of outward plasma flow along the streamer. We conclude that, inside the streamer, collisional excitation provided more than 90% of the observed EUV emission, whereas, in the background corona, the contribution of resonance scattering became comparable with that of collisions at R ? 2 R {sub ?}.

  12. EVIDENCE FOR THE WAVE NATURE OF AN EXTREME ULTRAVIOLET WAVE OBSERVED BY THE ATMOSPHERIC IMAGING ASSEMBLY ON BOARD THE SOLAR DYNAMICS OBSERVATORY

    SciTech Connect (OSTI)

    Shen Yuandeng; Liu Yu

    2012-07-20

    Extreme-ultraviolet (EUV) waves have been found for about 15 years. However, significant controversy remains over their physical natures and origins. In this paper, we report an EUV wave that was accompanied by an X1.9 flare and a partial halo coronal mass ejection (CME). Using high temporal and spatial resolution observations taken by the Solar Dynamics Observatory and the Solar-TErrestrial RElations Observatory, we are able to investigate the detailed kinematics of the EUV wave. We find several arguments that support the fast-mode wave scenario. (1) The speed of the EUV wave (570 km s{sup -1}) is higher than the sound speed of the quiet-Sun corona. (2) Significant deceleration of the EUV wave (-130 m s{sup -2}) is found during its propagation. (3) The EUV wave resulted in the oscillations of a loop and a filament along its propagation path, and a reflected wave from the polar coronal hole is also detected. (4) Refraction or reflection effect is observed when the EUV wave was passing through two coronal bright points. (5) The dimming region behind the wavefront stopped to expand when the wavefront started to become diffuse. (6) The profiles of the wavefront exhibited a dispersive nature, and the magnetosonic Mach number of the EUV wave derived from the highest intensity jump is about 1.4. In addition, triangulation indicates that the EUV wave propagated within a height range of about 60-100 Mm above the photosphere. We propose that the EUV wave observed should be a nonlinear fast-mode magnetosonic wave that propagated freely in the corona after it was driven by the CME expanding flanks during the initial period.

  13. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

    SciTech Connect (OSTI)

    Yamazoe, Kenji; Mochi, Iacopo; Goldberg, Kenneth A.

    2014-12-01

    The wavefront retrieval by gradient descent algorithm that is typically applied to coherent or incoherent imaging is extended to retrieve a wavefront from a series of through-focus images by partially coherent illumination. For accurate retrieval, we modeled partial coherence as well as object transmittance into the gradient descent algorithm. However, this modeling increases the computation time due to the complexity of partially coherent imaging simulation that is repeatedly used in the optimization loop. To accelerate the computation, we incorporate not only the Fourier transform but also an eigenfunction decomposition of the image. As a demonstration, the extended algorithm is applied to retrieve a field-dependent wavefront of a microscope operated at extreme ultraviolet wavelength (13.4 nm). The retrieved wavefront qualitatively matches the expected characteristics of the lens design.

  14. Temporal characterization of a time-compensated monochromator for high-efficiency selection of extreme-ultraviolet pulses generated by high-order harmonics

    SciTech Connect (OSTI)

    Poletto, L.; Villoresi, P.; Benedetti, E.; Ferrari, F.; Stagira, S.; Sansone, G.; Nisoli, M.

    2008-07-15

    Ultrafast extreme-ultraviolet pulses are spectrally selected by a time-delay-compensated grating monochromator. The intrinsic very short duration of the pulses is obtained by exploiting the high-order harmonic generation process. The temporal characterization of the harmonic pulses is obtained using a cross-correlation method: pulses as short as 8 fs are measured at the output of the monochromator in the case of the 23rd harmonic. This value is in agreement with the expected duration of such pulses, indicating that the influence of the monochromator is negligible. The photon flux has been measured with a calibrated photodiode, pointing out the good efficiency of the monochromator, derived by the exploitation for the two gratings of the conical diffraction mounting.

  15. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Yamazoe, Kenji; Mochi, Iacopo; Goldberg, Kenneth A.

    2014-12-01

    The wavefront retrieval by gradient descent algorithm that is typically applied to coherent or incoherent imaging is extended to retrieve a wavefront from a series of through-focus images by partially coherent illumination. For accurate retrieval, we modeled partial coherence as well as object transmittance into the gradient descent algorithm. However, this modeling increases the computation time due to the complexity of partially coherent imaging simulation that is repeatedly used in the optimization loop. To accelerate the computation, we incorporate not only the Fourier transform but also an eigenfunction decomposition of the image. As a demonstration, the extended algorithm is appliedmore » to retrieve a field-dependent wavefront of a microscope operated at extreme ultraviolet wavelength (13.4 nm). The retrieved wavefront qualitatively matches the expected characteristics of the lens design.« less

  16. Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies

    SciTech Connect (OSTI)

    Wilson, Daniel; Rudolf, Denis Juschkin, Larissa; Weier, Christian; Adam, Roman; Schneider, Claus M.; Winkler, Gerrit; Frmter, Robert; Danylyuk, Serhiy; Bergmann, Klaus; Grtzmacher, Detlev

    2014-10-15

    Generation of circularly polarized light in the extreme ultraviolet (EUV) spectral region (about 25 eV250 eV) is highly desirable for applications in spectroscopy and microscopy but very challenging to achieve in a small-scale laboratory. We present a compact apparatus for generation of linearly and circularly polarized EUV radiation from a gas-discharge plasma light source between 50 eV and 70 eV photon energy. In this spectral range, the 3p absorption edges of Fe (54 eV), Co (60 eV), and Ni (67 eV) offer a high magnetic contrast often employed for magneto-optical and electron spectroscopy as well as for magnetic imaging. We simulated and designed an instrument for generation of linearly and circularly polarized EUV radiation and performed polarimetric measurements of the degree of linear and circular polarization. Furthermore, we demonstrate first measurements of the X-ray magnetic circular dichroism at the Co 3p absorption edge with a plasma-based EUV light source. Our approach opens the door for laboratory-based, element-selective spectroscopy of magnetic materials and spectro-microscopy of ferromagnetic domains.

  17. Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems

    SciTech Connect (OSTI)

    Bartnik, A.; Wachulak, P.; Fok, T.; Węgrzyński, Ł.; Fiedorowicz, H.; Pisarczyk, T.; Chodukowski, T.; Kalinowska, Z.; Dudzak, R.; Dostal, J.; Krousky, E.; Skala, J.; Ullschmied, J.; Hrebicek, J.; Medrik, T.

    2015-04-15

    A comparative study of photoionized plasmas created by two soft X-ray and extreme ultraviolet (SXR/EUV) laser plasma sources with different parameters is presented. The two sources are based on double-stream Xe/He gas-puff targets irradiated with high (500 J/0.3 ns) and low energy (10 J/1 ns) laser pulses. In both cases, the SXR/EUV beam irradiated the gas stream, injected into a vacuum chamber synchronously with the radiation pulse. Irradiation of gases resulted in formation of photoionized plasmas emitting radiation in the SXR/EUV range. The measured Ne plasma radiation spectra are dominated by emission lines corresponding to radiative transitions in singly charged ions. A significant difference concerns origin of the lines: K-shell or L-shell emissions occur in case of the high and low energy irradiating system, respectively. In high energy system, the electron density measurements were also performed by laser interferometry, employing a femtosecond laser system. A maximum electron density for Ne plasma reached the value of 2·10{sup 18 }cm{sup −3}. For the low energy system, a detection limit was too high for the interferometric measurements, thus only an upper estimation for electron density could be made.

  18. Initiation and early evolution of the coronal mass ejection on 2009 May 13 from extreme-ultraviolet and white-light observations

    SciTech Connect (OSTI)

    Reva, A. A.; Ulyanov, A. S.; Bogachev, S. A.; Kuzin, S. V.

    2014-10-01

    We present the results of the observations of a coronal mass ejection (CME) that occurred on 2009 May 13. The most important feature of these observations is that the CME was observed from the very early stage (the solar surface) up to a distance of 15 solar radii (R {sub ?}). Below 2 R {sub ?}, we used the data from the TESIS extreme-ultraviolet telescopes obtained in the Fe 171 and He 304 lines, and above 2 R {sub ?}, we used the observations of the LASCO C2 and C3 coronagraphs. The CME was formed at a distance of 0.2-0.5R {sub ?} from the Sun's surface as a U-shaped structure, which was observed both in the 171 images and in the white light. Observations in the He 304 line showed that the CME was associated with an erupting prominence, which was not located aboveas the standard model predictsbut rather in the lowest part of the U-shaped structure close to the magnetic X point. The prominence location can be explained with the CME breakout model. Estimates showed that CME mass increased with time. The CME trajectory was curvedits heliolatitude decreased with time. The CME started at a latitude of 50 and reached the ecliptic plane at distances of 2.5 R {sub ?}. The CME kinematics can be divided into three phases: initial acceleration, main acceleration, and propagation with constant velocity. After the CME, onset GOES registered a sub-A-class flare.

  19. Space-resolved extreme ultraviolet spectroscopy free of high-energy neutral particle noise in wavelength range of 10–130 Å on the large helical device

    SciTech Connect (OSTI)

    Huang, Xianli; Morita, Shigeru; Oishi, Tetsutarou; Goto, Motoshi; National Institute for Fusion Science, Toki 509-5292 Gifu ; Dong, Chunfeng

    2014-04-15

    A flat-field space-resolved extreme ultraviolet (EUV) spectrometer system working in wavelength range of 10–130 Å has been constructed in the Large Helical Device (LHD) for profile measurements of bremsstrahlung continuum and line emissions of heavy impurities in the central column of plasmas, which are aimed at studies on Z{sub eff} and impurity transport, respectively. Until now, a large amount of spike noise caused by neutral particles with high energies (≤180 keV) originating in neutral beam injection has been observed in EUV spectroscopy on LHD. The new system has been developed with an aim to delete such a spike noise from the signal by installing a thin filter which can block the high-energy neutral particles entering the EUV spectrometer. Three filters of 11 μm thick beryllium (Be), 3.3 μm thick polypropylene (PP), and 0.5 μm thick polyethylene terephthalate (PET: polyester) have been examined to eliminate the spike noise. Although the 11 μm Be and 3.3 μm PP filters can fully delete the spike noise in wavelength range of λ ≤ 20 Å, the signal intensity is also reduced. The 0.5 μm PET filter, on the other hand, can maintain sufficient signal intensity for the measurement and the spike noise remained in the signal is acceptable. As a result, the bremsstrahlung profile is successfully measured without noise at 20 Å even in low-density discharges, e.g., 2.9 × 10{sup 13} cm{sup −3}, when the 0.5 μm PET filter is used. The iron n = 3–2 Lα transition array consisting of FeXVII to FeXXIV is also excellently observed with their radial profiles in wavelength range of 10–18 Å. Each transition in the Lα array can be accurately identified with its radial profile. As a typical example of the method a spectral line at 17.62 Å is identified as FeXVIII transition. Results on absolute intensity calibration of the spectrometer system, pulse height and noise count analyses of the spike noise between holographic and ruled gratings and wavelength

  20. SECONDARY WAVES AND/OR THE 'REFLECTION' FROM AND 'TRANSMISSION' THROUGH A CORONAL HOLE OF AN EXTREME ULTRAVIOLET WAVE ASSOCIATED WITH THE 2011 FEBRUARY 15 X2.2 FLARE OBSERVED WITH SDO/AIA AND STEREO/EUVI

    SciTech Connect (OSTI)

    Olmedo, Oscar; Vourlidas, Angelos; Zhang Jie; Cheng Xin

    2012-09-10

    For the first time, the kinematic evolution of a coronal wave over the entire solar surface is studied. Full Sun maps can be made by combining images from the Solar Terrestrial Relations Observatory satellites, Ahead and Behind, and the Solar Dynamics Observatory, thanks to the wide angular separation between them. We study the propagation of a coronal wave, also known as the 'Extreme Ultraviolet Imaging Telescope' wave, and its interaction with a coronal hole (CH) resulting in secondary waves and/or reflection and transmission. We explore the possibility of the wave obeying the law of reflection. In a detailed example, we find that a loop arcade at the CH boundary cascades and oscillates as a result of the extreme ultraviolet (EUV) wave passage and triggers a wave directed eastward that appears to have reflected. We find that the speed of this wave decelerates to an asymptotic value, which is less than half of the primary EUV wave speed. Thanks to the full Sun coverage we are able to determine that part of the primary wave is transmitted through the CH. This is the first observation of its kind. The kinematic measurements of the reflected and transmitted wave tracks are consistent with a fast-mode magnetohydrodynamic wave interpretation. Eventually, all wave tracks decelerate and disappear at a distance. A possible scenario of the whole process is that the wave is initially driven by the expanding coronal mass ejection and subsequently decouples from the driver and then propagates at the local fast-mode speed.

  1. Investigating Operating System Noise in Extreme-Scale High-Performance Computing Systems using Simulation

    SciTech Connect (OSTI)

    Engelmann, Christian

    2013-01-01

    Hardware/software co-design for future-generation high-performance computing (HPC) systems aims at closing the gap between the peak capabilities of the hardware and the performance realized by applications (application-architecture performance gap). Performance profiling of architectures and applications is a crucial part of this iterative process. The work in this paper focuses on operating system (OS) noise as an additional factor to be considered for co-design. It represents the first step in including OS noise in HPC hardware/software co-design by adding a noise injection feature to an existing simulation-based co-design toolkit. It reuses an existing abstraction for OS noise with frequency (periodic recurrence) and period (duration of each occurrence) to enhance the processor model of the Extreme-scale Simulator (xSim) with synchronized and random OS noise simulation. The results demonstrate this capability by evaluating the impact of OS noise on MPI_Bcast() and MPI_Reduce() in a simulated future-generation HPC system with 2,097,152 compute nodes.

  2. Investigation of exposure to Extremely Low Frequency (ELF) magnetic and electric fields: Ongoing animal studies

    SciTech Connect (OSTI)

    Anderson, L.E.

    1994-03-01

    There is now convincing evidence from a large number of laboratories, that exposure to extremely low frequency (ELF) magnetic and electric fields produces biological responses in animals. Many of the observed effects appear to be directly or indirectly associated with the neural or neuroendocrine systems. Such effects include increased neuronal excitability, chemical and hormonal changes in the nervous system, altered behavioral responses, some of which are related to sensing the presence of the field, and changes in endogenous biological rhythms. Additional indices of general physiological status appear relatively unaffected by exposure, although effects have occasionally been described in bone growth and fracture repair, reproduction and development, and immune system function. A major current emphasis in laboratory research is to determine whether or not the reported epidemiological studies that suggest an association between EMF exposure and risk of cancer are supported in studies using animal models. Three major challenges exist for ongoing research: (1) knowledge about the mechanisms underlying observed bioeffects is incomplete, (2) researchers do not as yet understand what physical aspects of exposure produce biological responses, and (3) health consequences resulting from ELF exposure are unknown. Although no animal studies clearly demonstrate deleterious effects of ELF fields, several are suggestive of potential health impacts. From the perspective of laboratory animal studies, this paper will discuss biological responses to ELF magnetic and/or electric field exposures.

  3. Investigating the Influence of Anthropogenic Forcing on Observed Mean and Extreme Sea Level Pressure Trends over the Mediterranean Region

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Barkhordarian, Armineh

    2012-01-01

    We investigate whether the observed mean sea level pressure (SLP) trends over the Mediterranean region in the period from 1975 to 2004 are significantly consistent with what 17 models projected as response of SLP to anthropogenic forcing (greenhouse gases and sulphate aerosols, GS). Obtained results indicate that the observed trends in mean SLP cannot be explained by natural (internal) variability. Externally forced changes are detectable in all seasons, except spring. The large-scale component (spatial mean) of the GS signal is detectable in all the 17 models in winter and in 12 of the 17 models in summer. However, the small-scalemore » component (spatial anomalies about the spatial mean) of GS signal is only detectable in winter within 11 of the 17 models. We also show that GS signal has a detectable influence on observed decreasing (increasing) tendency in the frequencies of extremely low (high) SLP days in winter and that these changes cannot be explained by internal climate variability. While the detection of GS forcing is robust in winter and summer, there are striking inconsistencies in autumn, where analysis points to the presence of an external forcing, which is not GS forcing.« less

  4. Investigating nearby star-forming galaxies in the ultraviolet with HST/COS spectroscopy. I. Spectral analysis and interstellar abundance determinations

    SciTech Connect (OSTI)

    James, B. L.; Aloisi, A.; Sohn, S. T.; Wolfe, M. A.; Heckman, T.

    2014-11-10

    This is the first in a series of three papers describing a project with the Cosmic Origins Spectrograph on the Hubble Space Telescope to measure abundances of the neutral interstellar medium (ISM) in a sample of nine nearby star-forming galaxies. The goal is to assess the (in)homogeneities of the multiphase ISM in galaxies where the bulk of metals can be hidden in the neutral phase, yet the metallicity is inferred from the ionized gas in the H II regions. The sample, spanning a wide range in physical properties, is to date the best suited to investigate the metallicity behavior of the neutral gas at redshift z = 0. ISM absorption lines were detected against the far-ultraviolet spectra of the brightest star-forming region(s) within each galaxy. Here we report on the observations, data reduction, and analysis of these spectra. Column densities were measured by a multicomponent line-profile fitting technique, and neutral-gas abundances were obtained for a wide range of elements. Several caveats were considered, including line saturation, ionization corrections, and dust depletion. Ionization effects were quantified with ad hoc CLOUDY models reproducing the complex photoionization structure of the ionized and neutral gas surrounding the UV-bright sources. An 'average spectrum of a redshift z = 0 star-forming galaxy' was obtained from the average column densities of unsaturated profiles of neutral-gas species. This template can be used as a powerful tool for studies of the neutral ISM at both low and high redshift.

  5. Ultraviolet absorption hygrometer

    DOE Patents [OSTI]

    Gersh, Michael E.; Bien, Fritz; Bernstein, Lawrence S.

    1986-01-01

    An ultraviolet absorption hygrometer is provided including a source of pulsed ultraviolet radiation for providing radiation in a first wavelength region where water absorbs significantly and in a second proximate wavelength region where water absorbs weakly. Ultraviolet radiation in the first and second regions which has been transmitted through a sample path of atmosphere is detected. The intensity of the radiation transmitted in each of the first and second regions is compared and from this comparison the amount of water in the sample path is determined.

  6. Ultraviolet absorption hygrometer

    DOE Patents [OSTI]

    Gersh, M.E.; Bien, F.; Bernstein, L.S.

    1986-12-09

    An ultraviolet absorption hygrometer is provided including a source of pulsed ultraviolet radiation for providing radiation in a first wavelength region where water absorbs significantly and in a second proximate wavelength region where water absorbs weakly. Ultraviolet radiation in the first and second regions which has been transmitted through a sample path of atmosphere is detected. The intensity of the radiation transmitted in each of the first and second regions is compared and from this comparison the amount of water in the sample path is determined. 5 figs.

  7. PROMINENCE PLASMA DIAGNOSTICS THROUGH EXTREME-ULTRAVIOLET ABSORPTION

    SciTech Connect (OSTI)

    Landi, E.; Reale, F.

    2013-07-20

    In this paper, we introduce a new diagnostic technique that uses EUV and UV absorption to determine the electron temperature and column emission measure, as well as the He/H relative abundance of the absorbing plasma. If a realistic assumption on the geometry of the latter can be made and a spectral code such as CHIANTI is used, then this technique can also yield the absorbing plasma hydrogen and electron density. This technique capitalizes on the absorption properties of hydrogen and helium at different wavelength ranges and temperature regimes. Several cases where this technique can be successfully applied are described. This technique works best when the absorbing plasma is hotter than 15,000 K. We demonstrate this technique on AIA observations of plasma absorption during a coronal mass ejection eruption. This technique can be easily applied to existing observations of prominences and cold plasmas in the Sun from almost all space missions devoted to the study of the solar atmosphere, which we list.

  8. Extreme ultra-violet burst, particle heating, and whistler wave...

    Office of Scientific and Technical Information (OSTI)

    induced by kink-driven Rayleigh-Taylor instability This content will become ... induced by kink-driven Rayleigh-Taylor instability Authors: Chai, Kil-Byoung 1 ...

  9. Reflective optical imaging system for extreme ultraviolet wavelengths

    DOE Patents [OSTI]

    Viswanathan, Vriddhachalam K.; Newnam, Brian E.

    1993-01-01

    A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 .mu.m, and preferably less than 100 .mu.m. An image resolution of features less than 0.05-0.1 .mu.m, is obtained over a large area field; i.e., 25.4 mm .times.25.4 mm, with a distortion less than 0.1 of the resolution over the image field.

  10. Reflective optical imaging system for extreme ultraviolet wavelengths

    DOE Patents [OSTI]

    Viswanathan, V.K.; Newnam, B.E.

    1993-05-18

    A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 [mu]m, and preferably less than 100 [mu]m. An image resolution of features less than 0.05-0.1 [mu]m, is obtained over a large area field; i.e., 25.4 mm [times] 25.4 mm, with a distortion less than 0.1 of the resolution over the image field.

  11. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

    DOE Patents [OSTI]

    Kubiak, Glenn D.; Bernardez, II, Luis J.

    2000-01-04

    A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.

  12. Ultraviolet radiation induced discharge laser

    DOE Patents [OSTI]

    Gilson, Verle A.; Schriever, Richard L.; Shearer, James W.

    1978-01-01

    An ultraviolet radiation source associated with a suitable cathode-anode electrode structure, disposed in a gas-filled cavity of a high pressure pulsed laser, such as a transverse electric atmosphere (TEA) laser, to achieve free electron production in the gas by photoelectric interaction between ultraviolet radiation and the cathode prior to the gas-exciting cathode-to-anode electrical discharge, thereby providing volume ionization of the gas. The ultraviolet radiation is produced by a light source or by a spark discharge.

  13. Type B Accident Investigation Board Report on the June 2002 High Radiation Dose to Extremities in Building 151, Lawrence Livermore National Laboratory

    Broader source: Energy.gov [DOE]

    This report is an independent product of the Type B Accident Investigation Board appointed by Camille Yuan-Soo Hoo, Manager of the U.S. Department of Energy, Oakland Operations Office.

  14. Diffractive element in extreme-UV lithography condenser

    DOE Patents [OSTI]

    Sweatt, William C.; Ray-Chaudhurl, Avijit K.

    2000-01-01

    Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

  15. Diffractive element in extreme-UV lithography condenser

    DOE Patents [OSTI]

    Sweatt, William C.; Ray-Chaudhuri, Avijit

    2001-01-01

    Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

  16. THE ULTRAVIOLET BRIGHTEST TYPE Ia SUPERNOVA 2011de

    SciTech Connect (OSTI)

    Brown, Peter J., E-mail: pbrown@physics.tamu.edu [George P. and Cynthia Woods Mitchell Institute for Fundamental Physics and Astronomy, Texas A and M University, Department of Physics and Astronomy, 4242 TAMU, College Station, TX 77843 (United States)

    2014-11-20

    We present and discuss the ultraviolet (UV)/optical photometric light curves and absolute magnitudes of the TypeIa supernova (SN Ia) 2011de from the Swift Ultraviolet/Optical Telescope. We find it to be the UV brightest SN Ia yet observedmore than a factor of 10 brighter than normal SNe Ia in the mid-ultraviolet. We find that the UV/optical brightness and broad light curve evolution can be modeled with additional flux from the shock of the ejecta hitting a relatively large red giant companion separated by 6 10{sup 13} cm. However, the post-maximum behavior of other UV-bright SNe Ia can also be modeled in a similar manner, including objects with UV spectroscopy or pre-maximum photometry which is inconsistent with this model. This suggests that similar UV luminosities can be intrinsic or caused by other forms of shock interaction. The high velocities reported for SN 2011de make it distinct from the UV-bright ''super-Chandrasekhar'' SNe Ia and the NUV-blue group of normal SNe Ia. SN 2011de is an extreme example of the UV variations in SNe Ia.

  17. Wafer chamber having a gas curtain for extreme-UV lithography

    DOE Patents [OSTI]

    Kanouff, Michael P.; Ray-Chaudhuri, Avijit K.

    2001-01-01

    An EUVL device includes a wafer chamber that is separated from the upstream optics by a barrier having an aperture that is permeable to the inert gas. Maintaining an inert gas curtain in the proximity of a wafer positioned in a chamber of an extreme ultraviolet lithography device can effectively prevent contaminants from reaching the optics in an extreme ultraviolet photolithography device even though solid window filters are not employed between the source of reflected radiation, e.g., the camera, and the wafer. The inert gas removes the contaminants by entrainment.

  18. Microgap ultra-violet detector

    DOE Patents [OSTI]

    Wuest, Craig R.; Bionta, Richard M.

    1994-01-01

    A microgap ultra-violet detector of photons with wavelengths less than 400 run (4000 Angstroms) which comprises an anode and a cathode separated by a gas-filled gap and having an electric field placed across the gap. Either the anode or the cathode is semi-transparent to UV light. Upon a UV photon striking the cathode an electron is expelled and accelerated across the gap by the electric field causing interactions with other electrons to create an electron avalanche which contacts the anode. The electron avalanche is detected and converted to an output pulse.

  19. Microgap ultra-violet detector

    DOE Patents [OSTI]

    Wuest, C.R.; Bionta, R.M.

    1994-09-20

    A microgap ultra-violet detector of photons with wavelengths less than 400 run (4,000 Angstroms) which comprises an anode and a cathode separated by a gas-filled gap and having an electric field placed across the gap is disclosed. Either the anode or the cathode is semi-transparent to UV light. Upon a UV photon striking the cathode an electron is expelled and accelerated across the gap by the electric field causing interactions with other electrons to create an electron avalanche which contacts the anode. The electron avalanche is detected and converted to an output pulse. 2 figs.

  20. Extreme-UV electrical discharge source

    DOE Patents [OSTI]

    Fornaciari, Neal R.; Nygren, Richard E.; Ulrickson, Michael A.

    2002-01-01

    An extreme ultraviolet and soft x-ray radiation electric capillary discharge source that includes a boron nitride housing defining a capillary bore that is positioned between two electrodes one of which is connected to a source of electric potential can generate a high EUV and soft x-ray radiation flux from the capillary bore outlet with minimal debris. The electrode that is positioned adjacent the capillary bore outlet is typically grounded. Pyrolytic boron nitride, highly oriented pyrolytic boron nitride, and cubic boron nitride are particularly suited. The boron nitride capillary bore can be configured as an insert that is encased in an exterior housing that is constructed of a thermally conductive material. Positioning the ground electrode sufficiently close to the capillary bore outlet also reduces bore erosion.

  1. Advanced Instrumentation for Extreme Environments

    SciTech Connect (OSTI)

    Melin, Alexander M; Kisner, Roger; Fugate, David L

    2013-01-01

    The Department of Energy (DOE) Office of Nuclear Energy (NE) is pursuing embedded instrumentation and controls (I&C) technology for next generation nuclear power generation applications. Embedded systems encompass a wide range of configurations and technologies; we define embedding in this instance as the integration of the sensors and the control system design into the component design using a systems engineering process. Embedded I&C systems are often an essential part of developing new capabilities, improving reliability, enhancing performance, and reducing operational costs. The new intrinsically safe, more efficient, and cost effective reactor technologies (Next Generation Nuclear Plant and Small Modular Reactors) require the development and application of new I&C technologies. These new designs raise extreme environmental challenges such as high temperatures (over 700 C) and material compatibility (e.g., molten salts). The desired reliability and functionality requires measurements in these extreme conditions including high radiation environments which were not previously monitored in real time. The DOE/NE Nuclear Energy Enabling Technologies (NEET) program currently has several projects investigating I&C technologies necessary to make these reactor designs realizable. The project described in this paper has the specific goal of investigating embedded I&C with the following objectives: 1.Explore and quantify the potential gains from embedded I&C improved reliability, increased performance, and reduced cost 2.Identify practical control, sensing, and measurement techniques for the extreme environments found in high-temperature reactors 3.Design and fabricate a functional prototype high-temperature cooling pump for molten salts represents target demonstration of improved performance, reliability, and widespread usage There are many engineering challenges in the design of a high-temperature liquid salt cooling pump. The pump and motor are in direct contact with

  2. Ultraviolet Behavior of N = 8 supergravity

    SciTech Connect (OSTI)

    Dixon, Lance J.

    2010-06-07

    In these lectures the author describes the remarkable ultraviolet behavior of N = 8 supergravity, which through four loops is no worse than that of N = 4 super-Yang-Mills theory (a finite theory). I also explain the computational tools that allow multi-loop amplitudes to be evaluated in this theory - the KLT relations and the unitarity method - and sketch how ultraviolet divergences are extracted from the amplitudes.

  3. Extreme Environments (EFree) Center

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Extreme Environments (EFree ) Center LLNL Co-PI: Jonathon Crowhurst [e-mail] [bio] Novel materials for energy applications Ultrafast reflectivity measurements under high pressure Transient reflectivity of BaFe2As2 at the indicated pressures in neon. In this experiment we measure pump-driven ultrafast reflectivity changes in order to infer the time scale of electron phonon coupling, and help to assess its role and importance in new superconducting systems. We believe this is the first time such

  4. UBIQUITOUS ROTATING NETWORK MAGNETIC FIELDS AND EXTREME-ULTRAVIOLET CYCLONES IN THE QUIET SUN

    SciTech Connect (OSTI)

    Zhang Jun; Liu Yang E-mail: yliu@sun.stanford.edu

    2011-11-01

    We present Solar Dynamics Observatory (SDO) Atmospheric Imaging Assembly (AIA) observations of EUV cyclones in the quiet Sun. These cyclones are rooted in the rotating network magnetic fields (RNFs). Such cyclones can last several to more than 10 hr and, at the later phase, they are found to be associated with EUV brightenings (microflares) and even EUV waves. SDO Helioseismic and Magnetic Imager (HMI) observations show a ubiquitous presence of RNFs. Using HMI line-of-sight magnetograms on 2010 July 8, we find 388 RNFs in an area of 800 x 980 arcsec{sup 2} near the disk center where no active region is present. The sense of rotation shows a weak hemisphere preference. The unsigned magnetic flux of the RNFs is about 4.0 x 10{sup 21} Mx, or 78% of the total network flux. These observational phenomena at small scale reported in this Letter are consistent with those at large scale in active regions. The ubiquitous RNFs and EUV cyclones over the quiet Sun may suggest an effective way to heat the corona.

  5. Sparkling extreme-ultraviolet bright dots observed with Hi-C

    SciTech Connect (OSTI)

    Régnier, S.; Alexander, C. E.; Walsh, R. W.; Winebarger, A. R.; Cirtain, J.; Golub, L.; Korreck, K. E.; Weber, M.; Mitchell, N.; Platt, S.; De Pontieu, B.; Title, A.; Kobayashi, K.; Kuzin, S.; DeForest, C. E.

    2014-04-01

    Observing the Sun at high time and spatial scales is a step toward understanding the finest and fundamental scales of heating events in the solar corona. The high-resolution coronal (Hi-C) instrument has provided the highest spatial and temporal resolution images of the solar corona in the EUV wavelength range to date. Hi-C observed an active region on 2012 July 11 that exhibits several interesting features in the EUV line at 193 Å. One of them is the existence of short, small brightenings 'sparkling' at the edge of the active region; we call these EUV bright dots (EBDs). Individual EBDs have a characteristic duration of 25 s with a characteristic length of 680 km. These brightenings are not fully resolved by the SDO/AIA instrument at the same wavelength; however, they can be identified with respect to the Hi-C location of the EBDs. In addition, EBDs are seen in other chromospheric/coronal channels of SDO/AIA, which suggests a temperature between 0.5 and 1.5 MK. Based on their frequency in the Hi-C time series, we define four different categories of EBDs: single peak, double peak, long duration, and bursty. Based on a potential field extrapolation from an SDO/HMI magnetogram, the EBDs appear at the footpoints of large-scale, trans-equatorial coronal loops. The Hi-C observations provide the first evidence of small-scale EUV heating events at the base of these coronal loops, which have a free magnetic energy of the order of 10{sup 26} erg.

  6. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell; Shafer, David R.

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receive a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

  7. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell

    2000-01-01

    An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.

  8. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 .mu.m.

  9. High numerical aperture ring field projection system for extreme ultraviolet lithography

    DOE Patents [OSTI]

    Hudyma, Russell; Shafer, David

    2001-01-01

    An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

  10. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

    DOE Patents [OSTI]

    Menoni, Carmen S.; Rocca, Jorge J.; Vaschenko, Georgiy; Bloom, Scott; Anderson, Erik H.; Chao, Weilun; Hemberg, Oscar

    2011-04-26

    Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

  11. Extreme ultraviolet spectra of highly ionized Ge, Kr and Mo emitted by imploding plasmas

    SciTech Connect (OSTI)

    Goldsmith, S.; Feldman, U.; Cohen, L.; Behring, W.E.

    1984-01-01

    Spectra of highly ionized Ge, Kr and Mo in the spectral region of 10 to 80A were excited in laser-produced plasmas. The plasma was obtained by focusing the energy of the 24 laser beams of the University of Rochester Omega system on 0.4 mm diameter microballoon targets. The laser pulse duration was in the range of 0.87 to 1.09 ns, with total energy in the range of 1.8 to 2.2 kJ. The observed spectral lines include n = 2-2 transitions in the oxygen and fluorine isoelectronic sequences and n = 3 to 4 transitions in the sodium, magnesium and aluminum isoelectronic sequences. The present observations are compared with previous experimental and theoretical studies.

  12. Europium (Z=63) n=3-3 lines in the extreme ultraviolet: Na- through...

    Office of Scientific and Technical Information (OSTI)

    Authors: Trabert, E ; Beiersdorfer, P ; Hell, N ; Brown, G V Publication Date: 2014-08-22 OSTI Identifier: 1228017 Report Number(s): LLNL-JRNL-659246 DOE Contract Number: ...

  13. The diffuse galactic far-ultraviolet sky

    SciTech Connect (OSTI)

    Hamden, Erika T.; Schiminovich, David; Seibert, Mark

    2013-12-20

    We present an all-sky map of the diffuse Galactic far ultraviolet (1344-1786 Å) background using Galaxy Evolution Explorer data, covering 65% of the sky with 11.79 arcmin{sup 2} pixels. We investigate the dependence of the background on Galactic coordinates, finding that a standard cosecant model of intensity is not a valid fit. Furthermore, we compare our map to Galactic all-sky maps of 100 μm emission, N {sub H} {sub I} column, and Hα intensity. We measure a consistent low level far-UV (FUV) intensity at zero points for other Galactic quantities, indicating a 300 photons cm{sup –2} s{sup –1} sr{sup –1} Å{sup –1} non-scattered isotropic component to the diffuse FUV. There is also a linear relationship between FUV and 100 μm emission below 100 μm values of 8 MJy sr{sup –1}. We find a similar linear relationship between FUV and N {sub H} {sub I} below 10{sup 21} cm{sup –2}. The relationship between FUV and Hα intensity has no such constant cutoff. For all Galactic quantities, the slope of the linear portion of the relationship decreases with Galactic latitude. A modified cosecant model, taking into account dust scattering asymmetry and albedo, is able to accurately fit the diffuse FUV at latitudes above 20°. The best fit model indicates an albedo, a, of 0.62 ± 0.04 and a scattering asymmetry function, g, of 0.78 ± 0.05. Deviations from the model fit may indicate regions of excess FUV emission from fluorescence or shock fronts, while low latitude regions with depressed FUV emission are likely the result of self-shielding dusty clouds.

  14. ULTRAVIOLET NUMBER COUNTS OF GALAXIES FROM SWIFT ULTRAVIOLET/OPTICAL TELESCOPE DEEP IMAGING OF THE CHANDRA DEEP FIELD SOUTH

    SciTech Connect (OSTI)

    Hoversten, E. A.; Gronwall, C.; Koch, T. S.; Roming, P. W. A.; Siegel, M. H.; Berk, D. E. Vanden; Breeveld, A. A.; Curran, P. A.; Still, M.

    2009-11-10

    Deep Swift UV/Optical Telescope (UVOT) imaging of the Chandra Deep Field South is used to measure galaxy number counts in three near-ultraviolet (NUV) filters (uvw2: 1928 A, uvm2: 2246 A, and uvw1: 2600 A) and the u band (3645 A). UVOT observations cover the break in the slope of the NUV number counts with greater precision than the number counts by the Hubble Space Telescope Space Telescope Imaging Spectrograph and the Galaxy Evolution Explorer, spanning a range 21 approx< m{sub AB} approx< 25. Model number counts confirm earlier investigations in favoring models with an evolving galaxy luminosity function.

  15. Vacuum ultraviolet laser (Patent) | SciTech Connect

    Office of Scientific and Technical Information (OSTI)

    Vacuum ultraviolet laser Citation Details In-Document Search Title: Vacuum ultraviolet laser Transitions from the 2p.sup.4 (.sup.1 S.sub.0)3s .sup.2 S.sub.12 state of atomic ...

  16. Suppression of H_2 Cooling in the Ultraviolet Background (Journal...

    Office of Scientific and Technical Information (OSTI)

    Country of Publication: United States Language: English Subject: 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ASTROPHYSICS; HYDROGEN; COOLING; ULTRAVIOLET RADIATION; ...

  17. Microwave-driven ultraviolet light sources

    DOE Patents [OSTI]

    Manos, Dennis M.; Diggs, Jessie; Ametepe, Joseph D.

    2002-01-29

    A microwave-driven ultraviolet (UV) light source is provided. The light source comprises an over-moded microwave cavity having at least one discharge bulb disposed within the microwave cavity. At least one magnetron probe is coupled directly to the microwave cavity.

  18. Detectors in Extreme Conditions

    SciTech Connect (OSTI)

    Blaj, G.; Carini, G.; Carron, S.; Haller, G.; Hart, P.; Hasi, J.; Herrmann, S.; Kenney, C.; Segal, J.; Tomada, A.

    2015-08-06

    Free Electron Lasers opened a new window on imaging the motion of atoms and molecules. At SLAC, FEL experiments are performed at LCLS using 120Hz pulses with 1012 - 1013 photons in 10 femtoseconds (billions of times brighter than the most powerful synchrotrons). This extreme detection environment raises unique challenges, from obvious to surprising. Radiation damage is a constant threat due to accidental exposure to insufficiently attenuated beam, focused beam and formation of ice crystals reflecting the beam onto the detector. Often high power optical lasers are also used (e.g., 25TW), increasing the risk of damage or impeding data acquisition through electromagnetic pulses (EMP). The sample can contaminate the detector surface or even produce shrapnel damage. Some experiments require ultra high vacuum (UHV) with strict design, surface contamination and cooling requirements - also for detectors. The setup is often changed between or during experiments with short turnaround times, risking mechanical and ESD damage, requiring work planning, training of operators and sometimes continuous participation of the LCLS Detector Group in the experiments. The detectors used most often at LCLS are CSPAD cameras for hard x-rays and pnCCDs for soft x-rays.

  19. Surface photoconductivity of organosilicate glass dielectrics induced by vacuum-ultraviolet radiation

    SciTech Connect (OSTI)

    Zheng, H.; Nichols, M. T.; Pei, D.; Shohet, J. L.; Nishi, Y.

    2013-08-14

    The temporary increase in the electrical surface conductivity of low-k organosilicate glass (SiCOH) during exposure to vacuum-ultraviolet radiation (VUV) is investigated. To measure the photoconductivity, patterned comb structures are deposited on dielectric films and exposed to synchrotron radiation in the range of 825 eV, which is in the energy range of most plasma vacuum-ultraviolet radiation. The change in photo surface conductivity induced by VUV radiation may be beneficial in limiting charging damage of dielectrics by depleting the plasma-deposited charge.

  20. Nonmaximality of known extremal metrics on torus and Klein bottle

    SciTech Connect (OSTI)

    Karpukhin, M A

    2013-12-31

    The El Soufi-Ilias theorem establishes a connection between minimal submanifolds of spheres and extremal metrics for eigenvalues of the Laplace-Beltrami operator. Recently, this connection was used to provide several explicit examples of extremal metrics. We investigate the properties of these metrics and prove that none of them is maximal. Bibliography: 24 titles.

  1. Ultraviolet nightglow production near the magnetic equator by neutral-particle precipitation

    SciTech Connect (OSTI)

    Abreu, V.J.; Eastes, R.W.; Yee, J.H.; Solomon, S.C.; Chakrabarti, S.

    1986-10-01

    The near-modnight latitudinal (+/-45) distribution of the OI 911-A, 1304-A, and 1356-A emissions, observed by the extreme ultraviolet (EUV) spectrometer on the STP 78-1 satellite, were analyzed and compared as a function of geomagnetic activity. The dominant source of these emissions is radiative recombination of atomic oxygen ions; however, for geomagnetically distributed periods, excess OI 1304-A and 1356-A emission is observed within +/-5 of the dip equator. Neutral-particle precipitation from the ring current is discussed as a possible source of the excess OI 1304-A and 1356-A emission.

  2. Bipolar charging of dust particles under ultraviolet radiation

    SciTech Connect (OSTI)

    Filippov, A. V. Babichev, V. N.; Fortov, V. E.; Gavrikov, A. V.; Pal', A. F.; Petrov, O. F.; Starostin, A. N.; Sarkarov, N. E.

    2011-05-15

    The photoemission charging of dust particles under ultraviolet radiation from a xenon lamp has been investigated. The velocities of yttrium dust particles with a work function of 3.3 eV and their charges have been determined experimentally; the latter are about 400-500 and about 100 elementary charges per micron of radius for the positively and negatively charged fractions, respectively. The dust particle charging and the dust cloud evolution in a photoemission cell after exposure to an ultraviolet radiation source under the applied voltage have been simulated numerically. The photoemission charging of dust particles has been calculated on the basis of nonlocal and local charging models. Only unipolar particle charging is shown to take place in a system of polydisperse dust particles with the same photoemission efficiency. It has been established that bipolar charging is possible in the case of monodisperse particles with different quantum efficiencies. Polydispersity in this case facilitates the appearance of oppositely charged particles in a photoemission plasma.

  3. Intergalactic magnetic fields and gamma-ray observations of extreme TeV blazars

    SciTech Connect (OSTI)

    Arlen, Timothy C.; Vassilev, Vladimir V.; Weisgarber, Thomas; Wakely, Scott P.; Shafi, S. Yusef

    2014-11-20

    The intergalactic magnetic field (IGMF) in cosmic voids can be indirectly probed through its effect on electromagnetic cascades initiated by a source of teraelectronvolt (TeV) gamma-rays, such as active galactic nuclei (AGNs). AGNs that are sufficiently luminous at TeV energies, 'extreme TeV blazars', can produce detectable levels of secondary radiation from inverse Compton scattering of the electrons in the cascade, provided that the IGMF is not too large. We review recent work in the literature that utilizes this idea to derive constraints on the IGMF for three TeV-detected blazars, 1ES 0229+200, 1ES 1218+304, and RGB J0710+591, and we also investigate four other hard-spectrum TeV blazars in the same framework. Through a recently developed, detailed, three-dimensional particle-tracking Monte Carlo code, incorporating all major effects of QED and cosmological expansion, we research the effects of major uncertainties, such as the spectral properties of the source, uncertainty in the ultraviolet and far-infrared extragalactic background light, undersampled very high energy (energy ≥100 GeV) coverage, past history of gamma-ray emission, source versus observer geometry, and the jet AGN Doppler factor. The implications of these effects on the recently reported lower limits of the IGMF are thoroughly examined to conclude that the presently available data are compatible with a zero-IGMF hypothesis.

  4. Is N=8 Supergravity Ultraviolet Finite?

    SciTech Connect (OSTI)

    Bern, Zvi; Dixon, Lance J.; Roiban, Radu

    2006-11-15

    Conventional wisdom holds that no four-dimensional gravity field theory can be ultraviolet finite. This understanding is based mainly on power counting. Recent studies confirm that one-loop N = 8 supergravity amplitudes satisfy the so-called 'no-triangle hypothesis', which states that triangle and bubble integrals cancel from these amplitudes. A consequence of this hypothesis is that for any number of external legs, at one loop N = 8 supergravity and N = 4 super-Yang-Mills have identical superficial degrees of ultraviolet behavior in D dimensions. We describe how the unitarity method allows us to promote these one-loop cancellations to higher loops, suggesting that previous power counts were too conservative. We discuss higher-loop evidence suggesting that N = 8 supergravity has the same degree of divergence as N = 4 super-Yang-Mills theory and is ultraviolet finite in four dimensions. We comment on calculations needed to reinforce this proposal, which are feasible using the unitarity method.

  5. ARM - Measurement - Extreme event time

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    govMeasurementsExtreme event time ARM Data Discovery Browse Data Comments? We would love to hear from you! Send us a note below or call us at 1-888-ARM-DATA. Send Measurement : Extreme event time The time of extreme meteorological events such as min/max temperature and wind gusts. Categories Atmospheric State Instruments The above measurement is considered scientifically relevant for the following instruments. Refer to the datastream (netcdf) file headers of each instrument for a list of all

  6. Viability of Cladosporium herbarum spores under 157 nm laser and vacuum ultraviolet irradiation, low temperature (10 K) and vacuum

    SciTech Connect (OSTI)

    Sarantopoulou, E. Stefi, A.; Kollia, Z.; Palles, D.; Cefalas, A. C.; Petrou, P. S.; Bourkoula, A.; Koukouvinos, G.; Kakabakos, S.; Velentzas, A. D.

    2014-09-14

    Ultraviolet photons can damage microorganisms, which rarely survive prolonged irradiation. In addition to the need for intact DNA, cell viability is directly linked to the functionality of the cell wall and membrane. In this work, Cladosporium herbarum spore monolayers exhibit high viability (7%) when exposed to 157 nm laser irradiation (412 kJm⁻²) or vacuum-ultraviolet irradiation (110–180 nm) under standard pressure and temperature in a nitrogen atmosphere. Spore viability can be determined by atomic-force microscopy, nano-indentation, mass, μ-Raman and attenuated reflectance Fourier-transform far-infrared spectroscopies and DNA electrophoresis. Vacuum ultraviolet photons cause molecular damage to the cell wall, but radiation resistance in spores arises from the activation of a photon-triggered signaling reaction, expressed via the exudation of intracellular substances, which, in combination with the low penetration depth of vacuum-ultraviolet photons, shields DNA from radiation. Resistance to phototoxicity under standard conditions was assessed, as was resistance to additional environmental stresses, including exposure in a vacuum, under different rates of change of pressure during pumping time and low (10 K) temperatures. Vacuum conditions were far more destructive to spores than vacuum-ultraviolet irradiation, and UV-B photons were two orders of magnitude more damaging than vacuum-ultraviolet photons. The viability of irradiated spores was also enhanced at 10 K. This work, in addition to contributing to the photonic control of the viability of microorganisms exposed under extreme conditions, including decontamination of biological warfare agents, outlines the basis for identifying bio-signaling in vivo using physical methodologies.

  7. COMPREHENSIVE OBSERVATIONS OF THE ULTRAVIOLET SPECTRUM AND IMPROVED...

    Office of Scientific and Technical Information (OSTI)

    SPECTRUM AND IMPROVED ENERGY LEVELS FOR SINGLY IONIZED CHROMIUM (Cr II) Citation Details In-Document Search Title: COMPREHENSIVE OBSERVATIONS OF THE ULTRAVIOLET SPECTRUM AND ...

  8. Vacuum-ultraviolet photoreduction of graphene oxide: Electrical...

    Office of Scientific and Technical Information (OSTI)

    Vacuum-ultraviolet photoreduction of graphene oxide: Electrical conductivity of entirely reduced single sheets and reduced micro line patterns Citation Details In-Document Search...

  9. Open-source extreme conditions modeling tools

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... HomeEnergy, Modeling & Analysis, News, Renewable Energy, Water PowerOpen-source extreme ... numerical tools for use in modeling extreme conditions of wave energy converters (WECs). ...

  10. Data triage enables extreme-scale computing

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Data triage enables extreme-scale computing Data triage enables extreme-scale computing Data selection and triage are important techniques for large-scale data, which can ...

  11. Ultraviolet Resonant Raman Enhancements in the Detection of Explosives

    SciTech Connect (OSTI)

    Short, B J; Carter, J C; Gunter, D; Hovland, P; Jagode, H; Karavanic, K; Marin, G; Mellor-Crummey, J; Moore, S; Norris, B; Oliker, L; Olschanowsky, C; Roth, P C; Schulz, M; Shende, S; Snavely, A; Spear, W

    2009-06-03

    Raman-based spectroscopy is potentially militarily useful for standoff detection of high explosives. Normal (non-resonance) and resonance Raman spectroscopies are both light scattering techniques that use a laser to measure the vibrational spectrum of a sample. In resonance Raman, the laser is tuned to match the wavelength of a strong electronic absorbance in the molecule of interest, whereas, in normal Raman the laser is not tuned to any strong electronic absorbance bands. The selection of appropriate excitation wavelengths in resonance Raman can result in a dramatic increase in the Raman scattering efficiency of select band(s) associated with the electronic transition. Other than the excitation wavelength, however, resonance Raman is performed experimentally the same as normal Raman. In these studies, normal and resonance Raman spectral signatures of select solid high explosive (HE) samples and explosive precursors were collected at 785 nm, 244 nm and 229 nm. Solutions of PETN, TNT, and explosive precursors (DNT & PNT) in acetonitrile solvent as an internal Raman standard were quantitatively evaluated using ultraviolet resonance Raman (UVRR) microscopy and normal Raman spectroscopy as a function of power and select excitation wavelengths. Use of an internal standard allowed resonance enhancements to be estimated at 229 nm and 244 nm. Investigations demonstrated that UVRR provided {approx}2000-fold enhancement at 244 nm and {approx}800-fold improvement at 229 nm while PETN showed a maximum of {approx}25-fold at 244 nm and {approx}190-fold enhancement at 229 nm solely from resonance effects when compared to normal Raman measurements. In addition to the observed resonance enhancements, additional Raman signal enhancements are obtained with ultraviolet excitation (i.e., Raman scattering scales as !4 for measurements based on scattered photons). A model, based partly on the resonance Raman enhancement results for HE solutions, is presented for estimating Raman

  12. Extreme Conditions Modeling Workshop Report

    SciTech Connect (OSTI)

    Coe, R. G.; Neary, V. S.; Lawson, M. J.; Yu, Y.; Weber, J.

    2014-07-01

    Sandia National Laboratories (SNL) and the National Renewable Energy Laboratory (NREL) hosted the Wave Energy Converter (WEC) Extreme Conditions Modeling (ECM) Workshop in Albuquerque, NM on May 13th-14th, 2014. The objective of the workshop was to review the current state of knowledge on how to model WECs in extreme conditions (e.g. hurricanes and other large storms) and to suggest how U.S. Department of Energy (DOE) and national laboratory resources could be used to improve ECM methods for the benefit of the wave energy industry.

  13. Extremism

    Office of Scientific and Technical Information (OSTI)

    ... included members of the Black Panthers and the Republic of New Africa (RNA) (Smith, 1994). ... where he was recovering after a bomb he was building exploded in his hands (Smith, 1994). ...

  14. Ultraviolet laser beam monitor using radiation responsive crystals

    DOE Patents [OSTI]

    McCann, Michael P.; Chen, Chung H.

    1988-01-01

    An apparatus and method for monitoring an ultraviolet laser beam includes disposing in the path of an ultraviolet laser beam a substantially transparent crystal that will produce a color pattern in response to ultraviolet radiation. The crystal is exposed to the ultraviolet laser beam and a color pattern is produced within the crystal corresponding to the laser beam intensity distribution therein. The crystal is then exposed to visible light, and the color pattern is observed by means of the visible light to determine the characteristics of the laser beam that passed through crystal. In this manner, a perpendicular cross sectional intensity profile and a longitudinal intensity profile of the ultraviolet laser beam may be determined. The observation of the color pattern may be made with forward or back scattered light and may be made with the naked eye or with optical systems such as microscopes and television cameras.

  15. Photoluminescence performance of thulium doped Li{sub 4}SrCa(SiO{sub 4}){sub 2} under irradiation of ultraviolet and vacuum ultraviolet lights

    SciTech Connect (OSTI)

    Wang, Zhaofeng; Li, Yezhou; Liu, Xiong; Wei, Xingmin; Chen, Yueling; Zhou, Fei; Wang, Yuhua

    2014-11-15

    Highlights: A novel blue-emitting phosphor Li{sub 4}SrCa(SiO{sub 4}){sub 2}:Tm{sup 3+} was reported. Li{sub 4}SrCa(SiO{sub 4}){sub 2}:Tm{sup 3+} exhibited excellent thermal and irradiation stability. Li{sub 4}SrCa(SiO{sub 4}){sub 2}:Tm{sup 3+} was found to possess high color purity. - Abstract: In this work, we synthesized Tm{sup 3+} doped Li{sub 4}SrCa(SiO{sub 4}){sub 2} phosphors and investigated their photoluminescence properties under the excitation of ultraviolet and vacuum ultraviolet lights. The crystal structure analysis and variation of cell parameters confirm that Tm{sup 3+} ions have been successfully doped in the structure of Li{sub 4}SrCa(SiO{sub 4}){sub 2} host by occupying the sites of Ca{sup 2+} with the coordination number of 6. The luminescence results suggest that Li{sub 4}SrCa(SiO{sub 4}){sub 2}:Tm{sup 3+} is a good blue-emitting phosphor when excited by ultraviolet and vacuum ultraviolet irradiations. In addition, it is observed that there is nearly no degradation for Li{sub 4}SrCa(SiO{sub 4}){sub 2}:Tm{sup 3+} after undergoing thermal and irradiation treatments. Possible mechanisms for the luminescence processes are proposed on the basis of the discussion of excitation and emission spectra. In particular, the emission color of Li{sub 4}SrCa(SiO{sub 4}){sub 2}:Tm{sup 3+} by excitation of 147 and 172 nm irradiations is very close to the standard blue color, suggesting that it could be potentially applied in plasma display panels and mercury-free fluorescence lamps.

  16. Extremely high frequency RF effects on electronics.

    SciTech Connect (OSTI)

    Loubriel, Guillermo Manuel; Vigliano, David; Coleman, Phillip Dale; Williams, Jeffery Thomas; Wouters, Gregg A.; Bacon, Larry Donald; Mar, Alan

    2012-01-01

    The objective of this work was to understand the fundamental physics of extremely high frequency RF effects on electronics. To accomplish this objective, we produced models, conducted simulations, and performed measurements to identify the mechanisms of effects as frequency increases into the millimeter-wave regime. Our purpose was to answer the questions, 'What are the tradeoffs between coupling, transmission losses, and device responses as frequency increases?', and, 'How high in frequency do effects on electronic systems continue to occur?' Using full wave electromagnetics codes and a transmission-line/circuit code, we investigated how extremely high-frequency RF propagates on wires and printed circuit board traces. We investigated both field-to-wire coupling and direct illumination of printed circuit boards to determine the significant mechanisms for inducing currents at device terminals. We measured coupling to wires and attenuation along wires for comparison to the simulations, looking at plane-wave coupling as it launches modes onto single and multiconductor structures. We simulated the response of discrete and integrated circuit semiconductor devices to those high-frequency currents and voltages, using SGFramework, the open-source General-purpose Semiconductor Simulator (gss), and Sandia's Charon semiconductor device physics codes. This report documents our findings.

  17. Biological applications of ultraviolet free-electron lasers

    SciTech Connect (OSTI)

    Sutherland, J.C.

    1997-10-01

    This review examines the possibilities for biological research using the three ultraviolet free-electron lasers that are nearing operational status in the US. The projected operating characteristics of major interest in biological research of the free-electron lasers at Brookhaven National Laboratory, the Thomas Jefferson National Accelerator Facility, and Duke University are presented. Experimental applications in the areas of far- and vacuum ultraviolet photophysics and photochemistry, structural biology, environmental photobiology, and medical research are discussed and the prospects for advances in these areas, based upon the characteristics of the new ultraviolet free-electron lasers, are evaluated.

  18. Laser Makes New Shade of Ultraviolet (COSMIC Log on MSNBC.com...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    cosmiclog.nbcnews.comnews201012285725603-laser-makes-new-shade-of-ultraviolet Submitted: Wednesday, December 29...

  19. Ultraviolet Thomson scattering measurements of the electron feature...

    Office of Scientific and Technical Information (OSTI)

    Title: Ultraviolet Thomson scattering measurements of the electron feature with an energetic 263 nm probe Authors: Ross, J S ; Divol, L ; Sorce, C ; Froula, D H ; Glenzer, S H ...

  20. THE LONGITUDINAL PROPERTIES OF A SOLAR ENERGETIC PARTICLE EVENT INVESTIGATED USING MODERN SOLAR IMAGING

    SciTech Connect (OSTI)

    Rouillard, A. P.; Sheeley, N. R.; Tylka, A.; Vourlidas, A.; Rakowski, C.; Ng, C. K.; Cohen, C. M. S.; Mewaldt, R. A.; Mason, G. M.; Reames, D.; Savani, N. P.; StCyr, O. C.; Szabo, A.

    2012-06-10

    We use combined high-cadence, high-resolution, and multi-point imaging by the Solar-Terrestrial Relations Observatory (STEREO) and the Solar and Heliospheric Observatory to investigate the hour-long eruption of a fast and wide coronal mass ejection (CME) on 2011 March 21 when the twin STEREO spacecraft were located beyond the solar limbs. We analyze the relation between the eruption of the CME, the evolution of an Extreme Ultraviolet (EUV) wave, and the onset of a solar energetic particle (SEP) event measured in situ by the STEREO and near-Earth orbiting spacecraft. Combined ultraviolet and white-light images of the lower corona reveal that in an initial CME lateral 'expansion phase', the EUV disturbance tracks the laterally expanding flanks of the CME, both moving parallel to the solar surface with speeds of {approx}450 km s{sup -1}. When the lateral expansion of the ejecta ceases, the EUV disturbance carries on propagating parallel to the solar surface but devolves rapidly into a less coherent structure. Multi-point tracking of the CME leading edge and the effects of the launched compression waves (e.g., pushed streamers) give anti-sunward speeds that initially exceed 900 km s{sup -1} at all measured position angles. We combine our analysis of ultraviolet and white-light images with a comprehensive study of the velocity dispersion of energetic particles measured in situ by particle detectors located at STEREO-A (STA) and first Lagrange point (L1), to demonstrate that the delayed solar particle release times at STA and L1 are consistent with the time required (30-40 minutes) for the CME to perturb the corona over a wide range of longitudes. This study finds an association between the longitudinal extent of the perturbed corona (in EUV and white light) and the longitudinal extent of the SEP event in the heliosphere.

  1. Lamp for generating high power ultraviolet radiation

    DOE Patents [OSTI]

    Morgan, Gary L.; Potter, James M.

    2001-01-01

    The apparatus is a gas filled ultraviolet generating lamp for use as a liquid purifier. The lamp is powred by high voltage AC, but has no metallic electrodes within or in contact with the gas enclosure which is constructed as two concentric quartz cylinders sealed together at their ends with the gas fill between the cylinders. Cooling liquid is pumped through the volume inside the inner quartz cylinder where an electrically conductive pipe spaced from the inner cylinder is used to supply the cooling liquid and act as the high voltage electrode. The gas enclosure is enclosed within but spaced from a metal housing which is connected to operate as the ground electrode of the circuit and through which the treated fluid flows. Thus, the electrical circuit is from the central pipe, and through the cooling liquid, the gas enclosure, the treated liquid on the outside of the outer quartz cylinder, and to the housing. The high voltage electrode is electrically isolated from the source of cooling liquid by a length of insulated hose which also supplies the cooling liquid.

  2. 50MW extreme-scale turbine

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    MW extreme-scale turbine - Sandia Energy Energy Search Icon Sandia Home Locations Contact ... SunShot Grand Challenge: Regional Test Centers 50MW extreme-scale turbine HomeTag:50MW ...

  3. Photodegradation of aniline by goethite doped with boron under ultraviolet and visible light irradiation

    SciTech Connect (OSTI)

    Liu, Guanglong; Liao, Shuijiao; College of Basic Sciences of Huazhong Agricultural University, Wuhan 430070 ; Zhu, Duanwei; Liu, Linghua; Cheng, Dongsheng; Zhou, Huaidong

    2011-08-15

    Highlights: {yields} Goethite modified by boron was prepared by sol-gel method in presence of boron acid at the low temperature. {yields} B-goethite has slight red shift in the band gap transition beside their stronger light absorption compared with pristine goethite. {yields} The results showed that semiconductor photocatalytic reaction mechanism should exist in the process of aniline degradation with goethite and B-goethite as photocatalyst. -- Abstract: In the present study, goethite and goethite doped with boron (B-goethite) were employed to detect the presence or absence of semiconductor photocatalytic reaction mechanism in the reaction systems. B-goethite was prepared by sol-gel method in presence of boron acid in order to improve its photocatalystic efficiency under the ultraviolet and visible light irradiation. The optical properties of goethite and B-goethite were characterized by ultraviolet and visible absorption spectra and the result indicated that B-goethite has slight red shift in the band gap transition beside their stronger light absorption compared with pristine goethite. Degradation of aniline was investigated in presence of goethite and B-goethite in aqueous solution. It was found that the B-goethite photocatalyst exhibited enhanced ultraviolet and visible light photocatalytic activity in degradation of aniline compared with the pristine goethite. The photocatalytic degradation mechanism of B-goethite was discussed.

  4. Characterization of extreme precipitation within atmospheric river events over California

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Jeon, S.; Prabhat,; Byna, S.; Gu, J.; Collins, W. D.; Wehner, M. F.

    2015-11-17

    Atmospheric rivers (ARs) are large, spatially coherent weather systems with high concentrations of elevated water vapor. These systems often cause severe downpours and flooding over the western coastal United States – and with the availability of more atmospheric moisture in the future under global warming we expect ARs to play an important role as potential causes of extreme precipitation changes. Therefore, we aim to investigate changes in extreme precipitation properties correlated with AR events in a warmer climate, which are large-scale meteorological patterns affecting the weather and climate of California. We have recently developed the TECA (Toolkit for Extreme Climatemore » Analysis) software for automatically identifying and tracking features in climate data sets. Specifically, we can now identify ARs that make landfall on the western coast of North America. Based on this detection procedure, we can investigate the impact of ARs by exploring the spatial extent of AR precipitation using climate model (CMIP5) simulations and characterize spatial patterns of dependence for future projections between AR precipitation extremes under climate change within the statistical framework. Our results show that AR events in the future RCP (Representative Concentration Pathway)8.5 scenario (2076–2100) tend to produce heavier rainfall with higher frequency and longer days than events from the historical run (1981–2005). We also find that the dependence between extreme precipitation events has a shorter spatial range, within localized areas in California, under the high future emissions scenario than under the historical run.« less

  5. Response of Simple, Model Systems to Extreme Conditions

    SciTech Connect (OSTI)

    Ewing, Rodney C.; Lang, Maik

    2015-07-30

    The focus of the research was on the application of high-pressure/high-temperature techniques, together with intense energetic ion beams, to the study of the behavior of simple oxide systems (e.g., SiO2, GeO2, CeO2, TiO2, HfO2, SnO2, ZnO and ZrO2) under extreme conditions. These simple stoichiometries provide unique model systems for the analysis of structural responses to pressure up to and above 1 Mbar, temperatures of up to several thousands of kelvin, and the extreme energy density generated by energetic heavy ions (tens of keV/atom). The investigations included systematic studies of radiation- and pressure-induced amorphization of high P-T polymorphs. By studying the response of simple stoichiometries that have multiple structural “outcomes”, we have established the basic knowledge required for the prediction of the response of more complex structures to extreme conditions. We especially focused on the amorphous state and characterized the different non-crystalline structure-types that result from the interplay of radiation and pressure. For such experiments, we made use of recent technological developments, such as the perforated diamond-anvil cell and in situ investigation using synchrotron x-ray sources. We have been particularly interested in using extreme pressures to alter the electronic structure of a solid prior to irradiation. We expected that the effects of modified band structure would be evident in the track structure and morphology, information which is much needed to describe theoretically the fundamental physics of track-formation. Finally, we investigated the behavior of different simple-oxide, composite nanomaterials (e.g., uncoated nanoparticles vs. core/shell systems) under coupled, extreme conditions. This provided insight into surface and boundary effects on phase stability under extreme conditions.

  6. Extreme luminosity imaging conical spectrograph

    SciTech Connect (OSTI)

    Pikuz, S. A.; Shelkovenko, T. A.; Mitchell, M. D.; Chandler, K. M.; Douglass, J. D.; McBride, R. D.; Jackson, D. P.; Hammer, D. A.

    2006-10-15

    A new configuration for a two-dimensional (2D) imaging x-ray spectrograph based on a conically bent crystal is introduced: extreme luminosity imaging conical spectrograph (ELICS). The ELICS configuration has important advantages over spectrographs that are based on cylindrically and spherically bent crystals. The main advantages are that a wide variety of large-aperture crystals can be used, and any desired magnification in the spatial direction (the direction orthogonal to spectral dispersion) can be achieved by the use of different experimental arrangements. The ELICS can be set up so that the detector plane is almost perpendicular to the incident rays, a good configuration for time-resolved spectroscopy. ELICSs with mica crystals of 45x90 mm{sup 2} aperture have been successfully used for imaging on the XP and COBRA pulsed power generators, yielding spectra with spatial resolution in 2D of Z pinches and X pinches.

  7. Deinococcus geothermalis: The Pool of Extreme Radiation Resistance Genes Shrinks

    SciTech Connect (OSTI)

    Makarova, Kira S.; Omelchenko, Marina V.; Gaidamakova, Elena K.; Matrosova, Vera Y.; Vasilenko, Alexander; Zhai, Min; Lapidus, Alla; Copeland, Alex; Kim, Edwin; Land, Miriam; Mavrommatis, Konstantinos; Pitluck, Samuel; Richardson, Paul M.; Detter, Chris; Brettin, Thomas; Saunders, Elizabeth; Lai, Barry; Ravel, Bruce; Kemner, Kenneth M.; Wolf, Yuri I.; Sorokin, Alexander; Gerasimova, Anna V.; Gelfand, Mikhail S.; Fredrickson, James K.; Koonin, Eugene V.; Daly, Michael J.

    2007-07-24

    Bacteria of the genus Deinococcus are extremely resistant to ionizing radiation (IR), ultraviolet light (UV) and desiccation. The mesophile Deinococcus radiodurans was the first member of this group whose genome was completely sequenced. Analysis of the genome sequence of D. radiodurans, however, failed to identify unique DNA repair systems. To further delineate the genes underlying the resistance phenotypes, we report the whole-genome sequence of a second Deinococcus species, the thermophile Deinococcus geothermalis, which at itsoptimal growth temperature is as resistant to IR, UV and desiccation as D. radiodurans, and a comparative analysis of the two Deinococcus genomes. Many D. radiodurans genes previously implicated in resistance, but for which no sensitive phenotype was observed upon disruption, are absent in D. geothermalis. In contrast, most D. radiodurans genes whose mutants displayed a radiation-sensitive phenotype in D. radiodurans are conserved in D. geothermalis. Supporting the existence of a Deinococcus radiation response regulon, a common palindromic DNA motif was identified in a conserved set of genes associated with resistance, and a dedicated transcriptional regulator was predicted. We present the case that these two species evolved essentially the same diverse set of gene families, and that the extreme stress-resistance phenotypes of the Deinococcus lineage emerged progressively by amassing cell-cleaning systems from different sources, but not by acquisition of novel DNA repair systems. Our reconstruction of the genomic evolution of the Deinococcus-Thermus phylum indicates that the corresponding set of enzymes proliferated mainly in the common ancestor of Deinococcus. Results of the comparative analysis weaken the arguments for a role of higher-order chromosome alignment structures in resistance; more clearly define and substantially revise downward the number of uncharacterized genes that might participate in DNA repair and contribute to

  8. Replication of a Holographic Ion-etched Spherical Blazed Grating for use at Extreme-Ultraviolet Wavelengths: Efficiency

    SciTech Connect (OSTI)

    Kowalski,M.; Barbee, T.; Hunter, W.

    2006-01-01

    Using synchrotron radiation, we have measured the efficiency at an angle of incidence of 10 deg of a holographic ion-etched spherical blazed grating and three of its fourth-generation replicas. The measured efficiency profile of replicas 1 and 3 prior to multilayer coating oscillated from thin-film interference produced by the replicas' Al/Al2O3?/SiO2 structure. A Mo2C/Si multilayer coating was applied to the master grating and replicas 1 and 2. After coating, the maximum grating efficiency occurred in the -2nd order and the maximum values were 12.4% at 143.8 Angstroms for the master and 11.6% at 145.2 Angstroms for replicas 1 and 2. On the basis of measurements obtained after coating, the derived groove efficiency was 22.2% for the master, 19.4% for replica 1, and 19.3% for replica 2. The groove efficiency of the uncoated replica 3 was 24.3% at 142.5 Angstroms. We find that the replicas are reasonably faithful copies of the ion-etched master, and models based on measured atomic force microscope groove profiles are in general agreement with measured results. However, subtle issues remain regarding the widths of the peak order profile and the location of its maximum wavelength.

  9. Electron-Heated Target Temperature Measurements in Petawatt Laser Experiments Based on Extreme Ultraviolet Imaging and Spectroscopy

    SciTech Connect (OSTI)

    Ma, T; Beg, F; Macphee, A; Chung, H; Key, M; Mackinnon, A; Patel, P; Hatchett, S; Akli, K; Stephens, R; Chen, C; Freeman, R; Link, A; Offermann, D; Ovchinnikov, V; VanWoerkom, L; Zhang, B

    2008-05-02

    Three independent methods (XUV spectroscopy, imaging at 68 eV and 256 eV) have been used to measure planar target rear surface plasma temperature due to heating by hot electrons. The hot electrons are produced by ultra-intense laser plasma interactions using the 150 J, 0.5 ps Titan laser. Soft x-ray spectroscopy in the 50-400 eV region and imaging at the 68 eV and 256 eV photon energies were used to determine the rear surface temperature of planar CD targets. Temperatures were found to be in the 60-150 eV range, with good agreement between the three diagnostics.

  10. Extreme Scale Computing, Co-Design

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Information Science, Computing, Applied Math Extreme Scale Computing, Co-design Publications Publications Ramon Ravelo, Qi An, Timothy C. Germann, and Brad Lee Holian, ...

  11. Extreme Scale Computing, Co-design

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    datasets and extremely high rate data streams needed to address problems in national security, cyber security, energy ... All Stories Turning windows into solar generators Turning ...

  12. Extremely Low Temperature | Open Energy Information

    Open Energy Info (EERE)

    Extremely Low Temperature: No definition has been provided for this term. Add a Definition Sanyal Temp Classification This temperature scheme was developed by Sanyal in...

  13. Extreme Scale Computing, Co-design

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Extreme Scale Computing, Co-design Informing system design, ensuring productive and efficient code Project Description To address the increasingly complex problems of the modern ...

  14. Wave Energy Converter Extreme Conditions Modeling Workshop |...

    Open Energy Info (EERE)

    process. The WEC industry has adopted extreme conditions design, modeling, and analysis techniques developed for offshore oil & gas and naval architecture applications. While...

  15. Extreme Weather Events and Climate Change

    Broader source: Energy.gov [DOE]

    The presentation will review known variability in extreme weather such as excessive heat, cold waves, floods, droughts, hurricanes, severe thunderstorms and tornadoes. Projections and uncertainties...

  16. CHARACTERIZING ULTRAVIOLET AND INFRARED OBSERVATIONAL PROPERTIES FOR GALAXIES. I. INFLUENCES OF DUST ATTENUATION AND STELLAR POPULATION AGE

    SciTech Connect (OSTI)

    Mao Yewei; Kong Xu [Center for Astrophysics, University of Science and Technology of China, Hefei 230026 (China); Kennicutt, Robert C. Jr. [Institute of Astronomy, University of Cambridge, Madingley Road, Cambridge, CB3 0HA (United Kingdom); Hao, Cai-Na [Tianjin Astrophysics Center, Tianjin Normal University, Tianjin 300387 (China); Zhou Xu, E-mail: owen81@mail.ustc.edu.cn, E-mail: xkong@ustc.edu.cn [National Astronomical Observatories, Chinese Academy of Sciences, Beijing 100012 (China)

    2012-09-20

    The correlation between infrared-to-ultraviolet luminosity ratio and ultraviolet color (or ultraviolet spectral slope), i.e., the IRX-UV (or IRX-{beta}) relation, found in studies of starburst galaxies is a prevalent recipe for correcting extragalactic dust attenuation. Considerable dispersion in this relation discovered for normal galaxies, however, complicates its usability. In order to investigate the cause of the dispersion and to have a better understanding of the nature of the IRX-UV relation, in this paper, we select five nearby spiral galaxies, and perform spatially resolved studies on each of the galaxies, with a combination of ultraviolet and infrared imaging data. We measure all positions within each galaxy and divide the extracted regions into young and evolved stellar populations. By means of this approach, we attempt to discover separate effects of dust attenuation and stellar population age on the IRX-UV relation for individual galaxies. In this work, in addition to dust attenuation, stellar population age is interpreted to be another parameter in the IRX-UV function, and the diversity of star formation histories is suggested to disperse the age effects. At the same time, strong evidence shows the need for more parameters in the interpretation of observational data, such as variations in attenuation/extinction law. Fractional contributions of different components to the integrated luminosities of the galaxies suggest that the integrated measurements of these galaxies, which comprise different populations, would weaken the effect of the age parameter on IRX-UV diagrams. The dependence of the IRX-UV relation on luminosity and radial distance in galaxies presents weak trends, which offers an implication of selective effects. The two-dimensional maps of the UV color and the infrared-to-ultraviolet ratio are displayed and show a disparity in the spatial distributions between the two galaxy parameters, which offers a spatial interpretation of the scatter

  17. Extremely durable biofouling-resistant metallic surfaces based...

    Office of Scientific and Technical Information (OSTI)

    Accepted Manuscript: Extremely durable biofouling-resistant metallic surfaces based on electrodeposited nanoporous tungstite films on steel Title: Extremely durable ...

  18. Complete genome sequences for the anaerobic, extremely thermophilic...

    Office of Scientific and Technical Information (OSTI)

    Complete genome sequences for the anaerobic, extremely thermophilic plant ... Title: Complete genome sequences for the anaerobic, extremely thermophilic plant ...

  19. Soft X-Ray and Vacuum Ultraviolet Based Spectroscopy of the Actinides...

    Office of Scientific and Technical Information (OSTI)

    Conference: Soft X-Ray and Vacuum Ultraviolet Based Spectroscopy of the Actinides Citation Details In-Document Search Title: Soft X-Ray and Vacuum Ultraviolet Based Spectroscopy of ...

  20. Soft X-Ray and Vacuum Ultraviolet Based Spectroscopy of the Actinides...

    Office of Scientific and Technical Information (OSTI)

    Conference: Soft X-Ray and Vacuum Ultraviolet Based Spectroscopy of the Actinides Citation Details In-Document Search Title: Soft X-Ray and Vacuum Ultraviolet Based Spectroscopy of...

  1. Key issues of ultraviolet radiation of OH at high altitudes

    SciTech Connect (OSTI)

    Zhang, Yuhuai; Wan, Tian; Jiang, Jianzheng; Fan, Jing

    2014-12-09

    Ultraviolet (UV) emissions radiated by hydroxyl (OH) is one of the fundamental elements in the prediction of radiation signature of high-altitude and high-speed vehicle. In this work, the OH A{sup 2}?{sup +}?X{sup 2}? ultraviolet emission band behind the bow shock is computed under the experimental condition of the second bow-shock ultraviolet flight (BSUV-2). Four related key issues are discussed, namely, the source of hydrogen element in the high-altitude atmosphere, the formation mechanism of OH species, efficient computational algorithm of trace species in rarefied flows, and accurate calculation of OH emission spectra. Firstly, by analyzing the typical atmospheric model, the vertical distributions of the number densities of different species containing hydrogen element are given. According to the different dominating species containing hydrogen element, the atmosphere is divided into three zones, and the formation mechanism of OH species is analyzed in the different zones. The direct simulation Monte Carlo (DSMC) method and the Navier-Stokes equations are employed to compute the number densities of the different OH electronically and vibrationally excited states. Different to the previous work, the trace species separation (TSS) algorithm is applied twice in order to accurately calculate the densities of OH species and its excited states. Using a non-equilibrium radiation model, the OH ultraviolet emission spectra and intensity at different altitudes are computed, and good agreement is obtained with the flight measured data.

  2. Changes in Concurrent Precipitation and Temperature Extremes

    SciTech Connect (OSTI)

    Hao, Zengchao; AghaKouchak, Amir; Phillips, Thomas J.

    2013-08-01

    While numerous studies have addressed changes in climate extremes, analyses of concurrence of climate extremes are scarce, and climate change effects on joint extremes are rarely considered. This study assesses the occurrence of joint (concurrent) monthly continental precipitation and temperature extremes in Climate Research Unit (CRU) and University of Delaware (UD) observations, and in 13 Coupled Model Intercomparison Project Phase 5 (CMIP5) global climate simulations. Moreover, the joint occurrences of precipitation and temperature extremes simulated by CMIP5 climate models are compared with those derived from the CRU and UD observations for warm/wet, warm/dry, cold/wet, and cold/dry combinations of joint extremes. The number of occurrences of these four combinations during the second half of the 20th century (1951–2004) is assessed on a common global grid. CRU and UD observations show substantial increases in the occurrence of joint warm/dry and warm/wet combinations for the period 1978–2004 relative to 1951–1977. The results show that with respect to the sign of change in the concurrent extremes, the CMIP5 climate model simulations are in reasonable overall agreement with observations. The results reveal notable discrepancies between regional patterns and the magnitude of change in individual climate model simulations relative to the observations of precipitation and temperature.

  3. Changes in Concurrent Precipitation and Temperature Extremes

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Hao, Zengchao; AghaKouchak, Amir; Phillips, Thomas J.

    2013-08-01

    While numerous studies have addressed changes in climate extremes, analyses of concurrence of climate extremes are scarce, and climate change effects on joint extremes are rarely considered. This study assesses the occurrence of joint (concurrent) monthly continental precipitation and temperature extremes in Climate Research Unit (CRU) and University of Delaware (UD) observations, and in 13 Coupled Model Intercomparison Project Phase 5 (CMIP5) global climate simulations. Moreover, the joint occurrences of precipitation and temperature extremes simulated by CMIP5 climate models are compared with those derived from the CRU and UD observations for warm/wet, warm/dry, cold/wet, and cold/dry combinations of joint extremes.more » The number of occurrences of these four combinations during the second half of the 20th century (1951–2004) is assessed on a common global grid. CRU and UD observations show substantial increases in the occurrence of joint warm/dry and warm/wet combinations for the period 1978–2004 relative to 1951–1977. The results show that with respect to the sign of change in the concurrent extremes, the CMIP5 climate model simulations are in reasonable overall agreement with observations. The results reveal notable discrepancies between regional patterns and the magnitude of change in individual climate model simulations relative to the observations of precipitation and temperature.« less

  4. Ultraviolet germicidal irradiation and its effects on elemental distributions in mouse embryonic fibroblast cells in x-ray fluorescence microanalysis

    SciTech Connect (OSTI)

    Jin, Qiaoling; Vogt, Stefan; Lai, Barry; Chen, Si; Finney, Lydia; Gleber, Sophie-Charlotte; Ward, Jesse; Deng, Junjing; Mak, Rachel; Moonier, Nena; Jacobsen, Chris; Brody, James P.

    2015-02-23

    Rapidly-frozen hydrated (cryopreserved) specimens combined with cryo-scanning x-ray fluorescence microscopy provide an ideal approach for investigating elemental distributions in biological cells and tissues. However, because cryopreservation does not deactivate potentially infectious agents associated with Risk Group 2 biological materials, one must be concerned with contamination of expensive and complicated cryogenic x-ray microscopes when working with such materials. We employed ultraviolet germicidal irradiation to decontaminate previously cryopreserved cells under liquid nitrogen, and then investigated its effects on elemental distributions under both frozen hydrated and freeze dried states with x-ray fluorescence microscopy. We show that the contents and distributions of most biologically important elements remain nearly unchanged when compared with non-ultraviolet-irradiated counterparts, even after multiple cycles of ultraviolet germicidal irradiation and cryogenic x-ray imaging. This provides a potential pathway for rendering Risk Group 2 biological materials safe for handling in multiuser cryogenic x-ray microscopes without affecting the fidelity of the results.

  5. Ultraviolet germicidal irradiation and its effects on elemental distributions in mouse embryonic fibroblast cells in x-ray fluorescence microanalysis

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Jin, Qiaoling; Vogt, Stefan; Lai, Barry; Chen, Si; Finney, Lydia; Gleber, Sophie-Charlotte; Ward, Jesse; Deng, Junjing; Mak, Rachel; Moonier, Nena; et al

    2015-02-23

    Rapidly-frozen hydrated (cryopreserved) specimens combined with cryo-scanning x-ray fluorescence microscopy provide an ideal approach for investigating elemental distributions in biological cells and tissues. However, because cryopreservation does not deactivate potentially infectious agents associated with Risk Group 2 biological materials, one must be concerned with contamination of expensive and complicated cryogenic x-ray microscopes when working with such materials. We employed ultraviolet germicidal irradiation to decontaminate previously cryopreserved cells under liquid nitrogen, and then investigated its effects on elemental distributions under both frozen hydrated and freeze dried states with x-ray fluorescence microscopy. We show that the contents and distributions of most biologicallymore » important elements remain nearly unchanged when compared with non-ultraviolet-irradiated counterparts, even after multiple cycles of ultraviolet germicidal irradiation and cryogenic x-ray imaging. This provides a potential pathway for rendering Risk Group 2 biological materials safe for handling in multiuser cryogenic x-ray microscopes without affecting the fidelity of the results.« less

  6. Electrode configuration for extreme-UV electrical discharge source

    DOE Patents [OSTI]

    Spence, Paul Andrew; Fornaciari, Neal Robert; Chang, Jim Jihchyun

    2002-01-01

    It has been demonstrated that debris generation within an electric capillary discharge source, for generating extreme ultraviolet and soft x-ray, is dependent on the magnitude and profile of the electric field that is established along the surfaces of the electrodes. An electrode shape that results in uniform electric field strength along its surface has been developed to minimize sputtering and debris generation. The electric discharge plasma source includes: (a) a body that defines a circular capillary bore that has a proximal end and a distal end; (b) a back electrode positioned around and adjacent to the distal end of the capillary bore wherein the back electrode has a channel that is in communication with the distal end and that is defined by a non-uniform inner surface which exhibits a first region which is convex, a second region which is concave, and a third region which is convex wherein the regions are viewed outwardly from the inner surface of the channel that is adjacent the distal end of the capillary bore so that the first region is closest to the distal end; (c) a front electrode positioned around and adjacent to the proximal end of the capillary bore wherein the front electrode has an opening that is communication with the proximal end and that is defined by a non-uniform inner surface which exhibits a first region which is convex, a second region which is substantially linear, and third region which is convex wherein the regions are viewed outwardly from the inner surface of the opening that is adjacent the proximal end of the capillary bore so that the first region is closest to the proximal end; and (d) a source of electric potential that is connected across the front and back electrodes.

  7. Extreme Balance of System Hardware Cost Reduction

    Broader source: Energy.gov [DOE]

    On September 1, 2011, DOE announced $42.4 million in funding over three years for the Extreme Balance of System Hardware Cost Reduction (BOS-X) funding opportunity. Part of the SunShot Systems...

  8. Slides summary for ExtremeMat project

    SciTech Connect (OSTI)

    Martinez Saez, Enrique

    2015-06-22

    These slides are part of the final report of the Project s14-ExtremeMat, an Institutional Computing project giving us access to LANL’s computers for the CMIME EFRC computational work

  9. Extreme Scale Computing, Co-design

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Information Science, Computing, Applied Math » Extreme Scale Computing, Co-design Extreme Scale Computing, Co-design Computational co-design may facilitate revolutionary designs in the next generation of supercomputers. Get Expertise Tim Germann Physics and Chemistry of Materials Email Allen McPherson Energy and Infrastructure Analysis Email Turab Lookman Physics and Condensed Matter and Complex Systems Email Computational co-design involves developing the interacting components of a

  10. Preconditioned iterations to calculate extreme eigenvalues

    SciTech Connect (OSTI)

    Brand, C.W.; Petrova, S.

    1994-12-31

    Common iterative algorithms to calculate a few extreme eigenvalues of a large, sparse matrix are Lanczos methods or power iterations. They converge at a rate proportional to the separation of the extreme eigenvalues from the rest of the spectrum. Appropriate preconditioning improves the separation of the eigenvalues. Davidson`s method and its generalizations exploit this fact. The authors examine a preconditioned iteration that resembles a truncated version of Davidson`s method with a different preconditioning strategy.

  11. Extreme Scale Computing, Co-design

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Extreme Scale Computing, Co-design Informing system design, ensuring productive and efficient code Project Description To address the increasingly complex problems of the modern world, scientists at Los Alamos are pushing the scale of computing to the extreme, forming partnerships with other national laboratories and industry to develop supercomputers that can achieve "exaflop" speeds-that is, a quintillion (a million trillion) calculations per second. To put such speed in perspective,

  12. Vacuum-Ultraviolet (VUV) Photoionization of Small Methanol and Methanol-Water Clusters

    SciTech Connect (OSTI)

    Kostko, Oleg; Belau, Leonid; Wilson, Kevin R.; Ahmed, Musahid

    2008-04-24

    In this work, we report on the vacuum-ultraviolet (VUV) photoionization of small methanol and methanol-water clusters. Clusters of methanol with water are generated via co-expansion of the gas phase constituents in a continuous supersonic jet expansion of methanol and water seeded in Ar. The resulting clusters are investigated by single photon ionization with tunable vacuum-ultraviolet synchrotron radiation and mass analyzed using reflectron mass spectrometry. Protonated methanol clusters of the form (CH3OH)nH+(n = 1-12) dominate the mass spectrum below the ionization energy of the methanol monomer. With an increase in water concentration, small amounts of mixed clusters of the form (CH3OH n(H2O)H+ (n = 2-11) are detected. The only unprotonated species observed in this work are the methanol monomer and dimer. Appearance energies are obtained from the photoionization efficiency (PIE) curves for CH3OH+, (CH3OH)2+, (CH3OH)nH+ (n = 1-9), and (CH3OH)n(H2O)H+ (n = 2-9) as a function of photon energy. With an increasein the water content in the molecular beam, there is an enhancement of photoionization intensity for the methanol dimer and protonated methanol monomer at threshold. These results are compared and contrasted to previous experimental observations.

  13. Defect-Enabled Electrical Current Leakage in Ultraviolet Light-Emitting Diodes

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Moseley, Michael William; Allerman, Andrew A.; Crawford, Mary H.; Wierer, Jonathan; Smith, Michael L.; Biedermann, Laura

    2015-04-13

    The AlGaN materials system offers a tunable, ultra-wide bandgap that is exceptionally useful for high-power electronics and deep ultraviolet optoelectronics. Moseley et al. (pp. 723–726) investigate a structural defect known as an open-core threading dislocation or ''nanopipe'' that is particularly detrimental to devices that employ these materials. Furthermore, an AlGaN thin film was synthesized using metal-organic chemical-vapor deposition. Electrical current leakage is detected at a discrete point using a conductive atomic-force microscope (CAFM). However, no physical feature or abnormality at this location was visible by an optical microscope. The AlGaN thin film was then etched in hot phosphoric acid, andmore » the same location that was previously analyzed was revisited with the CAFM. The point that previously exhibited electrical current leakage had been decorated with a 1.1 μm wide hexagonal pit, which identified the site of electrical current leakage as a nanopipe and allows these defects to be easily observed by optical microscopy. Moreover, with this nanopipe identification and quantification strategy, the authors were able to correlate decreasing ultraviolet light-emitting diode optical output power with increasing nanopipe density.« less

  14. A Network Contention Model for the Extreme-scale Simulator

    SciTech Connect (OSTI)

    Engelmann, Christian [ORNL; Naughton, III, Thomas J [ORNL

    2015-01-01

    The Extreme-scale Simulator (xSim) is a performance investigation toolkit for high-performance computing (HPC) hardware/software co-design. It permits running a HPC application with millions of concurrent execution threads, while observing its performance in a simulated extreme-scale system. This paper details a newly developed network modeling feature for xSim, eliminating the shortcomings of the existing network modeling capabilities. The approach takes a different path for implementing network contention and bandwidth capacity modeling using a less synchronous and accurate enough model design. With the new network modeling feature, xSim is able to simulate on-chip and on-node networks with reasonable accuracy and overheads.

  15. Superhydrophobic anti-ultraviolet films by doctor blade coating

    SciTech Connect (OSTI)

    Cai, Chang-Yun; Yang, Hongta; Lin, Kun-Yi Andrew

    2014-11-17

    This article reports a scalable technology for fabricating polymer films with excellent water-repelling and anti-ultraviolet properties. A roll-to-roll compatible doctor blade coating technology is utilized to prepare silica colloidal crystal-polymer composites. The silica microspheres can then be selectively removed to create flexible self-standing macroporous polymer films with crystalline arrays of pores. The void sizes are controlled by tuning the duration of a reactive ion etching process prior to the removal of the templating silica microspheres. After surface modification, superhydrophobic surface can be achieved. This study further demonstrates that the as-prepared transparent porous films with 200?nm of pores exhibit diffraction of ultraviolet lights originated from the Bragg's diffractive of light from the three-dimensional highly ordered air cavities.

  16. High extraction efficiency ultraviolet light-emitting diode

    DOE Patents [OSTI]

    Wierer, Jonathan; Montano, Ines; Allerman, Andrew A.

    2015-11-24

    Ultraviolet light-emitting diodes with tailored AlGaN quantum wells can achieve high extraction efficiency. For efficient bottom light extraction, parallel polarized light is preferred, because it propagates predominately perpendicular to the QW plane and into the typical and more efficient light escape cones. This is favored over perpendicular polarized light that propagates along the QW plane which requires multiple, lossy bounces before extraction. The thickness and carrier density of AlGaN QW layers have a strong influence on the valence subband structure, and the resulting optical polarization and light extraction of ultraviolet light-emitting diodes. At Al>0.3, thinner QW layers (<2.5 nm are preferred) result in light preferentially polarized parallel to the QW plane. Also, active regions consisting of six or more QWs, to reduce carrier density, and with thin barriers, to efficiently inject carriers in all the QWs, are preferred.

  17. Inorganic volumetric light source excited by ultraviolet light

    DOE Patents [OSTI]

    Reed, S.; Walko, R.J.; Ashley, C.S.; Brinker, C.J.

    1994-04-26

    The invention relates to a composition for the volumetric generation of radiation. The composition comprises a porous substrate loaded with a component capable of emitting radiation upon interaction with an exciting radiation. Preferably, the composition is an aerogel substrate loaded with a component, e.g., a phosphor, capable of interacting with exciting radiation of a first energy, e.g., ultraviolet light, to produce radiation of a second energy, e.g., visible light. 4 figures.

  18. Amplitudes and Ultraviolet Behavior of N = 8 Supergravity

    SciTech Connect (OSTI)

    Bern, Zvi; Carrasco, John Joseph; Dixon, Lance J.; Johansson, Henrik; Roiban, Radu; /Penn State U.

    2011-05-20

    In this contribution we describe computational tools that permit the evaluation of multi-loop scattering amplitudes in N = 8 supergravity, in terms of amplitudes in N = 4 super-Yang-Mills theory. We also discuss the remarkable ultraviolet behavior of N = 8 supergravity, which follows from these amplitudes, and is as good as that of N = 4 super-Yang-Mills theory through at least four loops.

  19. Inorganic volumetric light source excited by ultraviolet light

    DOE Patents [OSTI]

    Reed, Scott; Walko, Robert J.; Ashley, Carol S.; Brinker, C. Jeffrey

    1994-01-01

    The invention relates to a composition for the volumetric generation of radiation. The composition comprises a porous substrate loaded with a component capable of emitting radiation upon interaction with an exciting radiation. Preferably, the composition is an aerogel substrate loaded with a component, e.g., a phosphor, capable of interacting with exciting radiation of a first energy, e.g., ultraviolet light, to produce radiation of a second energy, e.g., visible light.

  20. Magnetic fluorescent lamp having reduced ultraviolet self-absorption

    DOE Patents [OSTI]

    Berman, Samuel M.; Richardson, Robert W.

    1985-01-01

    The radiant emission of a mercury-argon discharge in a fluorescent lamp assembly (10) is enhanced by providing means (30) for establishing a magnetic field with lines of force along the path of electron flow through the bulb (12) of the lamp assembly, to provide Zeeman splitting of the ultraviolet spectral line. Optimum results are obtained when the magnetic field strength causes a Zeeman splitting of approximately 1.7 times the thermal line width.

  1. Durable Corrosion and Ultraviolet-Resistant Silver Mirror

    DOE Patents [OSTI]

    Jorgensen, G. J.; Gee, R.

    2006-01-24

    A corrosion and ultra violet-resistant silver mirror for use in solar reflectors; the silver layer having a film-forming protective polymer bonded thereto, and a protective shield overlay comprising a transparent multipolymer film that incorporates a UV absorber. The corrosion and ultraviolet resistant silver mirror retains spectral hemispherical reflectance and high optical clarity throughout the UV and visible spectrum when used in solar reflectors.

  2. Extremely stable bare hematite photoanode for solar water splitting...

    Office of Scientific and Technical Information (OSTI)

    Extremely stable bare hematite photoanode for solar water splitting Prev Next Title: Extremely stable bare hematite photoanode for solar water splitting Authors: Dias, Paula ; ...

  3. Extreme Temperature Energy Storage and Generation, for Cost and...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Extreme Temperature Energy Storage and Generation, for Cost and Risk Reduction in Geothermal Exploration Extreme Temperature Energy Storage and Generation, for Cost and Risk ...

  4. Evolution of extreme resistance to ionizing radiation via genetic...

    Office of Scientific and Technical Information (OSTI)

    Published Article: Evolution of extreme resistance to ionizing radiation via genetic adaptation of DNA repair Prev Next Title: Evolution of extreme resistance to ionizing ...

  5. Optical Design for Extremely Large Telescope Adaptive Optics...

    Office of Scientific and Technical Information (OSTI)

    ThesisDissertation: Optical Design for Extremely Large Telescope Adaptive Optics Systems Citation Details In-Document Search Title: Optical Design for Extremely Large Telescope ...

  6. Extreme dynamic compression with a low energy laser pulse (Conference...

    Office of Scientific and Technical Information (OSTI)

    Conference: Extreme dynamic compression with a low energy laser pulse Citation Details In-Document Search Title: Extreme dynamic compression with a low energy laser pulse You ...

  7. Extreme_SeaState_Contour_v1

    SciTech Connect (OSTI)

    2015-10-19

    This software generates environmental contours of extreme sea states using buoy observations of significant wave height and energy period or peak period. The code transforms these observations using principal component analysis (PCA) to create an uncorrelated representation of the data. The subsequent components are modeled using probability distributions and parameter fitting functions. The inverse first-order reliability method (I-FORM) is then applied to these models in order to generate an extreme event contour based on a given return period (i.e., 100 years).The subsequent contour is then transformed back into the original input space defined by the variables of interest in order to create an environmental contour of extreme sea states.

  8. Extreme_SeaState_Contour_v1

    Energy Science and Technology Software Center (OSTI)

    2015-10-19

    This software generates environmental contours of extreme sea states using buoy observations of significant wave height and energy period or peak period. The code transforms these observations using principal component analysis (PCA) to create an uncorrelated representation of the data. The subsequent components are modeled using probability distributions and parameter fitting functions. The inverse first-order reliability method (I-FORM) is then applied to these models in order to generate an extreme event contour based on amore » given return period (i.e., 100 years).The subsequent contour is then transformed back into the original input space defined by the variables of interest in order to create an environmental contour of extreme sea states.« less

  9. Extreme Science (LBNL Science at the Theater)

    SciTech Connect (OSTI)

    Ajo-Franklin, Caroline; Klein, Spencer; Minor, Andrew; Torok, Tamas

    2012-02-27

    On Feb. 27, 2012 at the Berkeley Repertory Theatre, four Berkeley Lab scientists presented talks related to extreme science - and what it means to you. Topics include: Neutrino hunting in Antarctica. Learn why Spencer Klein goes to the ends of the Earth to search for these ghostly particles. From Chernobyl to Central Asia, Tamas Torok travels the globe to study microbial diversity in extreme environments. Andrew Minor uses the world's most advanced electron microscopes to explore materials at ultrahigh stresses and in harsh environments. And microbes that talk to computers? Caroline Ajo-Franklin is pioneering cellular-electrical connections that could help transform sunlight into fuel.

  10. Matter-Radiation Interactions in Extremes

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Matter-Radiation Interactions in Extremes (MaRIE) Matter-Radiation Interactions in Extremes (MaRIE) MaRIE will provide a capability to address the control of performance and production of materials at the mesoscale. MaRIE fills a critical gap in length scale between studies conducted at the integral scale at DARHT and U1a, and at the atomic scale at NIF and Z. MaRIE Why MaRIE NNSA does not currently have a capability to understand and test materials response regimes at resolution necessary to

  11. ULTRAVIOLET RADIATION INSIDE INTERSTELLAR GRAIN AGGREGATES. III. FLUFFY GRAINS

    SciTech Connect (OSTI)

    Cacciola, Adriano; Saija, Rosalba; Borghese, Ferdinando; Denti, Paolo; Cecchi-Pestellini, Cesare; Iati, Maria Antonia

    2009-08-20

    We study the problem of light depolarization within fluffy interstellar dust grains, in which coagulation generates interstitial cavities partly filled with icy condensed gas. A significant amount of elliptical polarized ultraviolet radiation may be generated in situ by geometry-induced depolarization within the cavities. The behavior of the depolarization is studied both by changing the orientation of the aggregates and by changing chemical composition and size of the subunits forming the aggregate. We found that a considerable amount of depolarization occurs within the ice mantles of the subunits, provided their thickness is not too large. We discuss the implications of these results for chiral selection in space.

  12. Large area, surface discharge pumped, vacuum ultraviolet light source

    DOE Patents [OSTI]

    Sze, R.C.; Quigley, G.P.

    1996-12-17

    Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source is disclosed. A contamination-free VUV light source having a 225 cm{sup 2} emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm{sup 2} at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing. 3 figs.

  13. Large area, surface discharge pumped, vacuum ultraviolet light source

    DOE Patents [OSTI]

    Sze, Robert C.; Quigley, Gerard P.

    1996-01-01

    Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source. A contamination-free VUV light source having a 225 cm.sup.2 emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm.sup.2 at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing.

  14. Graphene/GaN diodes for ultraviolet and visible photodetectors

    SciTech Connect (OSTI)

    Lin, Fang; Chen, Shao-Wen; Meng, Jie; Tse, Geoffrey; Fu, Xue-Wen; Xu, Fu-Jun [State Key Laboratory for Mesoscopic Physics, Department of Physics, Peking University, Beijing 100871 (China); Shen, Bo; Liao, Zhi-Min, E-mail: liaozm@pku.edu.cn, E-mail: yudp@pku.edu.cn; Yu, Da-Peng, E-mail: liaozm@pku.edu.cn, E-mail: yudp@pku.edu.cn [State Key Laboratory for Mesoscopic Physics, Department of Physics, Peking University, Beijing 100871 (China); Collaborative Innovation Center of Quantum Matter, Beijing (China)

    2014-08-18

    The Schottky diodes based on graphene/GaN interface are fabricated and demonstrated for the dual-wavelength photodetection of ultraviolet (UV) and green lights. The physical mechanisms of the photoelectric response of the diodes with different light wavelengths are different. For UV illumination, the photo-generated carriers lower the Schottky barrier and increase the photocurrent. For green light illumination, as the photon energy is smaller than the bandgap of GaN, the hot electrons excited in graphene via internal photoemission are responsible for the photoelectric response. Using graphene as a transparent electrode, the diodes show a ?mS photoresponse, providing an alternative route toward multi-wavelength photodetectors.

  15. Ultraviolet Free Electron Laser Facility preliminary design report

    SciTech Connect (OSTI)

    Ben-Zvi, I.

    1993-02-01

    This document, the Preliminary Design Report (PDR) for the Brookhaven Ultraviolet Free Electron Laser (UV FEL) facility, describes all the elements of a facility proposed to meet the needs of a research community which requires ultraviolet sources not currently available as laboratory based lasers. Further, for these experiments, the requisite properties are not extant in either the existing second or upcoming third generation synchrotron light sources. This document is the result of our effort at BNL to identify potential users, determine the requirements of their experiments, and to design a facility which can not only satisfy the existing need, but have adequate flexibility for possible future extensions as need dictates and as evolving technology allows. The PDR is comprised of three volumes. In this, the first volume, background for the development of the proposal is given, including descriptions of the UV FEL facility, and representative examples of the science it was designed to perform. Discussion of the limitations and potential directions for growth are also included. A detailed description of the facility design is then provided, which addresses the accelerator, optical, and experimental systems. Information regarding the conventional construction for the facility is contained in an addendum to volume one (IA).

  16. Materials Science in Radiation and Dynamics Extremes

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    8 Materials Science in Radiation and Dynamics Extremes Our combination of modeling and experimental testing capabilities opens up unparalleled opportunities to do fundamental research leading to physics-based predictive models. Contact Us Group Leader Ellen Cerreta Email Deputy Group Leader Christopher Stanek Email Group Office (505) 665-4735 We predict structure/property relationships of materials, perform computational materials modeling, characterize thermophysical properties, and measure the

  17. Extreme Scale Computing, Co-Design

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Information Science, Computing, Applied Math » Extreme Scale Computing, Co-design » Publications Publications Ramon Ravelo, Qi An, Timothy C. Germann, and Brad Lee Holian, "Large-scale molecular dynamics simulations of shock induced plasticity in tantalum single crystals," AIP Conference Proceedings 1426, 1263-1266 (2012). Frank J. Cherne, Guy Dimonte, and Timothy C. Germann, "Richtymer-Meshkov instability examined with large-scale molecular dynamics simulations," AIP

  18. Gamma ray bursts and extreme energy cosmic rays

    SciTech Connect (OSTI)

    Scarsi, Livio

    1998-06-15

    Extreme Energy Cosmic Ray particles (EECR) with E>10{sup 20} eV arriving on Earth with very low flux ({approx}1 particle/Km{sup 2}-1000yr) require for their investigation very large detecting areas, exceeding values of 1000 km{sup 2} sr. Projects with these dimensions are now being proposed: Ground Arrays ('Auger' with 2x3500 km{sup 2} sr) or exploiting the Earth Atmosphere as seen from space ('AIR WATCH' and OWL,'' with effective area reaching 1 million km{sup 2} sr). In this last case, by using as a target the 10{sup 13} tons of air viewed, also the high energy neutrino flux can be investigated conveniently. Gamma Rays Bursts are suggested as a possible source for EECR and the associated High Energy neutrino flux.

  19. Investigator Award

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Investigations Investigations Investigations The Office of Investigations performs investigations into allegations of fraud, waste, and abuse in programs and operations of the Department, NNSA and FERC. Priority is given to investigations of suspected violations of criminal and civil statutes, as well as serious administrative misconduct. Particular focus is placed on the prevention and detection of contract and grant fraud; environmental, health and safety violations; computer crimes; and

  20. General Investigator

    Broader source: Energy.gov [DOE]

    A successful candidate in this position will: Serve as a investigator in the Counterintelligence (CI) Investigations Division and will develop, lead, conduct, and otherwise oversee CI...

  1. HST-COS observations of AGNs. II. Extended survey of ultraviolet composite spectra from 159 active galactic nuclei

    SciTech Connect (OSTI)

    Stevans, Matthew L.; Shull, J. Michael; Danforth, Charles W.; Tilton, Evan M. E-mail: michael.shull@colorado.edu E-mail: evan.tilton@colorado.edu

    2014-10-10

    The ionizing fluxes from quasars and other active galactic nuclei (AGNs) are critical for interpreting their emission-line spectra and for photoionizing and heating the intergalactic medium. Using far-ultraviolet (FUV) spectra from the Cosmic Origins Spectrograph (COS) on the Hubble Space Telescope (HST), we directly measure the rest-frame ionizing continua and emission lines for 159 AGNs at redshifts 0.001 < z {sub AGN} < 1.476 and construct a composite spectrum from 475 to 1875 Å. We identify the underlying AGN continuum and strong extreme ultraviolet (EUV) emission lines from ions of oxygen, neon, and nitrogen after masking out absorption lines from the H I Lyα forest, 7 Lyman-limit systems (N{sub H} {sub I}≥10{sup 17.2} cm{sup –2}) and 214 partial Lyman-limit systems (14.5

  2. Investigations Memorandum

    Broader source: Energy.gov [DOE]

    Investigation of Allegations Involving False Statements and False Claims at the Yucca Mountain Project

  3. Method for detection of extremely low concentration

    DOE Patents [OSTI]

    Andresen, Brian D.; Miller, Fred S.

    2002-01-01

    An ultratrace detector system for hand-held gas chromatography having high sensitivity, for example, to emissions generated during production of weapons, biological compounds, drugs, etc. The detector system is insensitive to water, air, helium, argon, oxygen, and CO.sub.2. The detector system is basically composed of a hand-held capillary gas chromatography (GC), an insulated heated redox-chamber, a detection chamber, and a vapor trap. For example, the detector system may use gas phase redox reactions and spectral absorption of mercury vapor. The gas chromatograph initially separates compounds that percolate through a bed of heated mercuric oxide (HgO) in a silica--or other metal--aerogel material which acts as an insulator. Compounds easily oxidized by HgO liberate atomic mercury that subsequently pass through a detection chamber which includes a detector cell, such as quartz, that is illuminated with a 254 nm ultra-violet (UV) mercury discharge lamp which generates the exact mercury absorption bands that are used to detect the liberated mercury atoms. Atomic mercury strongly absorbs 254 nm energy is therefore a specific signal for reducing compounds eluting from the capillary GC, whereafter the atomic mercury is trapped for example, in a silicon-aerogel trap.

  4. Impact of plasma jet vacuum ultraviolet radiation on reactive oxygen species generation in bio-relevant liquids

    SciTech Connect (OSTI)

    Jablonowski, H.; Hammer, M. U.; Reuter, S.; Bussiahn, R.; Weltmann, K.-D.; Woedtke, Th. von

    2015-12-15

    Plasma medicine utilizes the combined interaction of plasma produced reactive components. These are reactive atoms, molecules, ions, metastable species, and radiation. Here, ultraviolet (UV, 100–400 nm) and, in particular, vacuum ultraviolet (VUV, 10–200 nm) radiation generated by an atmospheric pressure argon plasma jet were investigated regarding plasma emission, absorption in a humidified atmosphere and in solutions relevant for plasma medicine. The energy absorption was obtained for simple solutions like distilled water (dH{sub 2}O) or ultrapure water and sodium chloride (NaCl) solution as well as for more complex ones, for example, Rosewell Park Memorial Institute (RPMI 1640) cell culture media. As moderate stable reactive oxygen species, hydrogen peroxide (H{sub 2}O{sub 2}) was studied. Highly reactive oxygen radicals, namely, superoxide anion (O{sub 2}{sup •−}) and hydroxyl radicals ({sup •}OH), were investigated by the use of electron paramagnetic resonance spectroscopy. All species amounts were detected for three different treatment cases: Plasma jet generated VUV and UV radiation, plasma jet generated UV radiation without VUV part, and complete plasma jet including all reactive components additionally to VUV and UV radiation. It was found that a considerable amount of radicals are generated by the plasma generated photoemission. From the experiments, estimation on the low hazard potential of plasma generated VUV radiation is discussed.

  5. Multifunctional optical correlator for picosecond ultraviolet laser pulse measurement

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Rakhman, Abdurahim; Wang, Yang; Garcia, Frances; Long, Cary D.; Huang, Chunning; Takeda, Yasuhiro; Liu, Yun

    2014-01-01

    A compact optical correlator system that measures both the autocorrelation between two infrared (IR) lights and the cross-correlation between an IR and an ultraviolet (UV) light using a single nonlinear optical crystal has been designed and experimentally demonstrated. The rapid scanning of optical delay line, switching between auto and cross-correlations, crystal angle tuning, and data acquisition and processing are all computer controlled. Pulse widths of an IR light from a mode-locked laser are measured by the correlator and the results are compared with a direct measurement using a high-speed photodetector system. The correlator has been used to study the parametermore » dependence of the pulse width of a macropulse UV laser designed for laser-assisted hydrogen ion (H-) beam stripping for the Spallation Neutron Source at Oak Ridge National Laboratory.« less

  6. Tunnel junction enhanced nanowire ultraviolet light emitting diodes

    SciTech Connect (OSTI)

    Sarwar, A. T. M. Golam; May, Brelon J.; Deitz, Julia I.; Grassman, Tyler J.; McComb, David W.; Myers, Roberto C.

    2015-09-07

    Polarization engineered interband tunnel junctions (TJs) are integrated in nanowire ultraviolet (UV) light emitting diodes (LEDs). A ∼6 V reduction in turn-on voltage is achieved by the integration of tunnel junction at the base of polarization doped nanowire UV LEDs. Moreover, efficient hole injection into the nanowire LEDs leads to suppressed efficiency droop in TJ integrated nanowire LEDs. The combination of both reduced bias voltage and increased hole injection increases the wall plug efficiency in these devices. More than 100 μW of UV emission at ∼310 nm is measured with external quantum efficiency in the range of 4–6 m%. The realization of tunnel junction within the nanowire LEDs opens a pathway towards the monolithic integration of cascaded multi-junction nanowire LEDs on silicon.

  7. North American extreme temperature events and related large scale meteorological patterns: A review of statistical methods, dynamics, modeling, and trends

    SciTech Connect (OSTI)

    Grotjahn, Richard; Black, Robert; Leung, Ruby; Wehner, Michael F.; Barlow, Mathew; Bosilovich, Michael; Gershunov, Alexander; Gutowski, Jr., William J.; Gyakum, John R.; Katz, Richard W.; Lee, Yun -Young; Lim, Young -Kwon; Prabhat, -

    2015-05-22

    This paper reviews research approaches and open questions regarding data, statistical analyses, dynamics, modeling efforts, and trends in relation to temperature extremes. Our specific focus is upon extreme events of short duration (roughly less than 5 days) that affect parts of North America. These events are associated with large scale meteorological patterns (LSMPs). Methods used to define extreme events statistics and to identify and connect LSMPs to extreme temperatures are presented. Recent advances in statistical techniques can connect LSMPs to extreme temperatures through appropriately defined covariates that supplements more straightforward analyses. A wide array of LSMPs, ranging from synoptic to planetary scale phenomena, have been implicated as contributors to extreme temperature events. Current knowledge about the physical nature of these contributions and the dynamical mechanisms leading to the implicated LSMPs is incomplete. There is a pressing need for (a) systematic study of the physics of LSMPs life cycles and (b) comprehensive model assessment of LSMP-extreme temperature event linkages and LSMP behavior. Generally, climate models capture the observed heat waves and cold air outbreaks with some fidelity. However they overestimate warm wave frequency and underestimate cold air outbreaks frequency, and underestimate the collective influence of low-frequency modes on temperature extremes. Climate models have been used to investigate past changes and project future trends in extreme temperatures. Overall, modeling studies have identified important mechanisms such as the effects of large-scale circulation anomalies and land-atmosphere interactions on changes in extreme temperatures. However, few studies have examined changes in LSMPs more specifically to understand the role of LSMPs on past and future extreme temperature changes. Even though LSMPs are resolvable by global and regional climate models, they are not necessarily well simulated so more

  8. North American extreme temperature events and related large scale meteorological patterns: A review of statistical methods, dynamics, modeling, and trends

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Grotjahn, Richard; Black, Robert; Leung, Ruby; Wehner, Michael F.; Barlow, Mathew; Bosilovich, Michael; Gershunov, Alexander; Gutowski, Jr., William J.; Gyakum, John R.; Katz, Richard W.; et al

    2015-05-22

    This paper reviews research approaches and open questions regarding data, statistical analyses, dynamics, modeling efforts, and trends in relation to temperature extremes. Our specific focus is upon extreme events of short duration (roughly less than 5 days) that affect parts of North America. These events are associated with large scale meteorological patterns (LSMPs). Methods used to define extreme events statistics and to identify and connect LSMPs to extreme temperatures are presented. Recent advances in statistical techniques can connect LSMPs to extreme temperatures through appropriately defined covariates that supplements more straightforward analyses. A wide array of LSMPs, ranging from synoptic tomore » planetary scale phenomena, have been implicated as contributors to extreme temperature events. Current knowledge about the physical nature of these contributions and the dynamical mechanisms leading to the implicated LSMPs is incomplete. There is a pressing need for (a) systematic study of the physics of LSMPs life cycles and (b) comprehensive model assessment of LSMP-extreme temperature event linkages and LSMP behavior. Generally, climate models capture the observed heat waves and cold air outbreaks with some fidelity. However they overestimate warm wave frequency and underestimate cold air outbreaks frequency, and underestimate the collective influence of low-frequency modes on temperature extremes. Climate models have been used to investigate past changes and project future trends in extreme temperatures. Overall, modeling studies have identified important mechanisms such as the effects of large-scale circulation anomalies and land-atmosphere interactions on changes in extreme temperatures. However, few studies have examined changes in LSMPs more specifically to understand the role of LSMPs on past and future extreme temperature changes. Even though LSMPs are resolvable by global and regional climate models, they are not necessarily well simulated so

  9. PREDICTING Lyα AND Mg II FLUXES FROM K AND M DWARFS USING GALAXY EVOLUTION EXPLORER ULTRAVIOLET PHOTOMETRY

    SciTech Connect (OSTI)

    Shkolnik, Evgenya L.; Rolph, Kristina A.; Peacock, Sarah; Barman, Travis S. E-mail: kristina.rolph@fandm.edu E-mail: barman@lpl.arizona.edu

    2014-11-20

    A star's ultraviolet (UV) emission can greatly affect the atmospheric chemistry and physical properties of closely orbiting planets with the potential for severe mass loss. In particular, the Lyα emission line at 1216 Å, which dominates the far-ultraviolet (FUV) spectrum, is a major source of photodissociation of important atmospheric molecules such as water and methane. The intrinsic flux of Lyα, however, cannot be directly measured due to the absorption of neutral hydrogen in the interstellar medium and contamination by geocoronal emission. To date, reconstruction of the intrinsic Lyα line based on Hubble Space Telescope spectra has been accomplished for 46 FGKM nearby stars, 28 of which have also been observed by the Galaxy Evolution Explorer (GALEX). Our investigation provides a correlation between published intrinsic Lyα and GALEX far- and near-ultraviolet (NUV) chromospheric fluxes for K and M stars. The negative correlations between the ratio of the Lyα to the GALEX fluxes reveal how the relative strength of Lyα compared to the broadband fluxes weakens as the FUV and NUV excess flux increase. We also correlate GALEX fluxes with the strong NUV Mg II h+k spectral emission lines formed at lower chromospheric temperatures than Lyα. The reported correlations provide estimates of intrinsic Lyα and Mg II fluxes for the thousands of K and M stars in the archived GALEX all-sky surveys. These will constrain new stellar upper atmosphere models for cool stars and provide realistic inputs to models describing exoplanetary photochemistry and atmospheric evolution in the absence of UV spectroscopy.

  10. Radiation stability of graphene under extreme conditions

    SciTech Connect (OSTI)

    Kumar, Sunil, E-mail: kumar.sunil092@gmail.com; Tripathi, Ambuj; Khan, Saif A.; Pannu, Compesh; Avasthi, Devesh K. [Materials Science Group, Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067 (India)

    2014-09-29

    In this letter, we report radiation stability of graphene under extreme condition of high energy density generated by 150?MeV Au ion irradiation. The experiment reveals that graphene is radiation resistant for irradiation at 10{sup 14?}ions/cm{sup 2} of 150?MeV Au ions. It is significant to note that annealing effects are observed at lower fluences whereas defect production occurs at higher fluences but significant crystallinity is retained. Our results demonstrate applicability of graphene based devices in radiation environment and space applications.

  11. Extremely compliant and highly stretchable patterned graphene

    SciTech Connect (OSTI)

    Zhu, Shuze; Huang, Yinjun; Li, Teng, E-mail: LiT@umd.edu [Department of Mechanical Engineering and Maryland NanoCenter, University of Maryland, College Park, Maryland 20742 (United States)

    2014-04-28

    Graphene is intrinsically ultra-stiff in its plane. Its huge mechanical mismatch when interfacing with ultra-compliant biological tissues and elastomers (79 orders of magnitude difference in stiffness) poses significant challenge in its application to functional devices such as epidermal electronics and sensing prosthesis. We offer a feasible and promising solution to this significant challenge by suitably patterning graphene into a nanomesh. Through systematic coarse-grained simulations, we show that graphene nanomesh can be made extremely compliant with nearly zero stiffness up to about 20% elongation and then remain highly compliant up to about 50% elongation.

  12. Development of an Extreme Environment Materials Research Facility at Princeton

    SciTech Connect (OSTI)

    Cohen, A B; Tully, C G; Austin, R; Calaprice, F; McDonald, K; Ascione, G; Baker, G; Davidson, R; Dudek, L; Grisham, L; Kugel, H; Pagdon, K; Stevenson, T; Woolley, R

    2010-11-17

    The need for a fundamental understanding of material response to a neutron and/or high heat flux environment can yield development of improved materials and operations with existing materials. Such understanding has numerous applications in fields such as nuclear power (for the current fleet and future fission and fusion reactors), aerospace, and other research fields (e.g., high-intensity proton accelerator facilities for high energy physics research). A proposal has been advanced to develop a facility for testing various materials under extreme heat and neutron exposure conditions at Princeton. The Extreme Environment Materials Research Facility comprises an environmentally controlled chamber (48 m^3) capable of high vacuum conditions, with extreme flux beams and probe beams accessing a central, large volume target. The facility will have the capability to expose large surface areas (1 m^2) to 14 MeV neutrons at a fluence in excess of 10^13 n/s. Depending on the operating mode. Additionally beam line power on the order of 15-75 MW/m2 for durations of 1-15 seconds are planned... The multi-second duration of exposure can be repeated every 2-10 minutes for periods of 10-12 hours. The facility will be housed in the test cell that held the Tokamak Fusion Test Reactor (TFTR), which has the desired radiation and safety controls as well as the necessary loading and assembly infrastructure. The facility will allow testing of various materials to their physical limit of thermal endurance and allow for exploring the interplay between radiation-induced embrittlement, swelling and deformation of materials, and the fatigue and fracturing that occur in response to thermal shocks. The combination of high neutron energies and intense fluences will enable accelerated time scale studies. The results will make contributions for refining predictive failure modes (modeling) in extreme environments, as well as providing a technical platform for the development of new alloys, new

  13. Daily HMS Extremes in Met Data - Hanford Site

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Hanford Meteorological Station Daily HMS Extremes in Met Data Hanford Meteorological Station Real Time Met Data from Around the Site Current and Past 48 Hours HMS Observations Daily HMS Extremes in Met Data Met and Climate Data Summary Products Contacts / Hours Current NWS Forecast for the Tri-Cities NWS Windchill Chart Daily HMS Extremes in Met Data Email Email Page | Print Print Page | Text Increase Font Size Decrease Font Size This table shows the daily extremes at each of the remote stations

  14. Tribal Energy System Vulnerabilities to Climate Change and Extreme Weather

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    | Department of Energy System Vulnerabilities to Climate Change and Extreme Weather Tribal Energy System Vulnerabilities to Climate Change and Extreme Weather This U.S. Department of Energy Office of Indian Energy report assesses climate change and extreme weather vulnerabilities specific to tribal energy infrastructure and systems in the contiguous United States and Alaska. It includes information about the impacts from climate change and extreme weather events on both onsite and offsite

  15. LANL Shock Tube Kathy Prestridge Extreme Fluids Team

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Header image FLUID DYNAMICS at Los Alamos Extreme Fluids Team in Physics Division home the team research publications pictures diversity contact The Extreme Fluids Team On the P-23 Extreme Fluids Team at Los Alamos National Laboratory, we apply high-resolution diagnostics to study fluid dynamics problems in extreme environments, such as shock-driven mixing, multiphase flows, and variable-density turbulence. The team is composed of Los Alamos staff, postdocs, and students. EXPERIMENTAL FACILITIES

  16. Funding Opportunity Announcement: Enabling Extreme Real-Time Grid

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Integration of Solar Energy (ENERGISE) | Department of Energy Enabling Extreme Real-Time Grid Integration of Solar Energy (ENERGISE) Funding Opportunity Announcement: Enabling Extreme Real-Time Grid Integration of Solar Energy (ENERGISE) Funding Opportunity Announcement: Enabling Extreme Real-Time Grid Integration of Solar Energy (ENERGISE) Funding Number: DE-FOA-0001495 Funding Amount: $25,000,000 Description The Enabling Extreme Real-Time Grid Integration of Solar Energy (ENERGISE) funding

  17. Method and apparatus for producing durationally short ultraviolet or X-ray laser pulses

    DOE Patents [OSTI]

    MacGowan, Brian J.; Matthews, Dennis L.; Trebes, James E.

    1988-01-01

    A method and apparatus is disclosed for producing ultraviolet or X-ray laser pulses of short duration (32). An ultraviolet or X-ray laser pulse of long duration (12) is progressively refracted, across the surface of an opaque barrier (28), by a streaming plasma (22) that is produced by illuminating a solid target (16, 18) with a pulse of conventional line focused high power laser radiation (20). The short pulse of ultraviolet or X-ray laser radiation (32), which may be amplified to high power (40, 42), is separated out by passage through a slit aperture (30) in the opaque barrier (28).

  18. Method and apparatus for producing durationally short ultraviolet or x-ray laser pulses

    DOE Patents [OSTI]

    MacGowan, B.J.; Matthews, D.L.; Trebes, J.E.

    1987-05-05

    A method and apparatus is disclosed for producing ultraviolet or x- ray laser pulses of short duration. An ultraviolet or x-ray laser pulse of long duration is progressively refracted, across the surface of an opaque barrier, by a streaming plasma that is produced by illuminating a solid target with a pulse of conventional line focused high power laser radiation. The short pulse of ultraviolet or x-ray laser radiation, which may be amplified to high power, is separated out by passage through a slit aperture in the opaque barrier.

  19. Tunnel-injection quantum dot deep-ultraviolet light-emitting diodes with polarization-induced doping in III-nitride heterostructures

    SciTech Connect (OSTI)

    Verma, Jai Islam, S. M.; Protasenko, Vladimir; Kumar Kandaswamy, Prem; Xing, Huili; Jena, Debdeep

    2014-01-13

    Efficient semiconductor optical emitters in the deep-ultraviolet spectral window are encountering some of the most deep rooted problems of semiconductor physics. In III-Nitride heterostructures, obtaining short-wavelength photon emission requires the use of wide bandgap high Al composition AlGaN active regions. High conductivity electron (n-) and hole (p-) injection layers of even higher bandgaps are necessary for electrical carrier injection. This approach requires the activation of very deep dopants in very wide bandgap semiconductors, which is a difficult task. In this work, an approach is proposed and experimentally demonstrated to counter the challenges. The active region of the heterostructure light emitting diode uses ultrasmall epitaxially grown GaN quantum dots. Remarkably, the optical emission energy from GaN is pushed from 365?nm (3.4?eV, the bulk bandgap) to below 240?nm (>5.2?eV) because of extreme quantum confinement in the dots. This is possible because of the peculiar bandstructure and band alignments in the GaN/AlN system. This active region design crucially enables two further innovations for efficient carrier injection: Tunnel injection of carriers and polarization-induced p-type doping. The combination of these three advances results in major boosts in electroluminescence in deep-ultraviolet light emitting diodes and lays the groundwork for electrically pumped short-wavelength lasers.

  20. A Road Map to Extreme High Vacuum

    SciTech Connect (OSTI)

    Ganapati Rao Myneni

    2007-06-20

    Ultimate pressure of a well-designed vacuum system very much depends on pretreatments, processing and the procedures [1,2]. Until now much attention has been paid in minimizing hydrogen outgassing from the chamber material. However, procedures and processing deserves further scrutiny than hitherto given so far. For reducing the gas load, high sensitivity helium leak detection techniques with sensitivities better than 1 10-12 Torr l/sec need to be used. Effects that are induced by vacuum instrumentation need to be reduced in order to obtain accurate pressure measurements. This presentation will discuss: clean assembly procedures, metal sponges for cryosorption pumping of hydrogen to extreme high vacuum, low cost surface diffusion barriers for reducing the hydrogen gas load, cascade pumping, sensitive helium leak detection techniques and the use of modified extractor and residual gas analyzers. Further, alternative back up pumping systems based on active NEGs [3] for turbo molecular pumps will be presented.

  1. Monitoring Extreme-scale Lustre Toolkit

    SciTech Connect (OSTI)

    Brim, Michael J; Lothian, Josh

    2015-01-01

    We discuss the design and ongoing development of the Monitoring Extreme-scale Lustre Toolkit (MELT), a unified Lustre performance monitoring and analysis infrastructure that provides continuous, low-overhead summary information on the health and performance of Lustre, as well as on-demand, in-depth problem diagnosis and root-cause analysis. The MELT infrastructure leverages a distributed overlay network to enable monitoring of center-wide Lustre filesystems where clients are located across many network domains. We preview interactive command-line utilities that help administrators and users to observe Lustre performance at various levels of resolution, from individual servers or clients to whole filesystems, including job-level reporting. Finally, we discuss our future plans for automating the root-cause analysis of common Lustre performance problems.

  2. Left-Wing Extremism: The Current Threat

    SciTech Connect (OSTI)

    Karl A. Seger

    2001-04-30

    Left-wing extremism is ''alive and well'' both in the US and internationally. Although the current domestic terrorist threat within the U. S. is focused on right-wing extremists, left-wing extremists are also active and have several objectives. Leftist extremists also pose an espionage threat to U.S. interests. While the threat to the U.S. government from leftist extremists has decreased in the past decade, it has not disappeared. There are individuals and organizations within the U.S. who maintain the same ideology that resulted in the growth of left-wing terrorism in this country in the 1970s and 1980s. Some of the leaders from that era are still communicating from Cuba with their followers in the U.S., and new leaders and groups are emerging.

  3. The far-ultraviolet UPS and downs of Alpha Centauri (Journal...

    Office of Scientific and Technical Information (OSTI)

    Centauri have yielded a detailed time history of far-ultraviolet (FUV: 1150-1700 ) emissions of the solarlike primary (A: G2 V) and the cooler but more active secondary (B: K1...

  4. Ultraviolet light absorbers having two different chromophors in the same molecule

    DOE Patents [OSTI]

    Vogl, O.; Li, S.

    1983-10-06

    This invention relates to novel ultraviolet light absorbers having two chromophors in the same molecule, and more particularly to benzotriazole substituted dihydroxybenzophenones and acetophenones. More particularly, this invention relates to 3,5-(di(2H-benzotriazole-2-yl))-2,4-dihydroxybenzophenone and 3,5-(di(2H-benzotriazole-2-yl))-2,4-dihydroxyacetophenone which are particularly useful as an ultraviolet light absorbers.

  5. Ultraviolet reflector materials for solar detoxification of hazardous waste

    SciTech Connect (OSTI)

    Jorgensen, G.; Govindarajan, R.

    1991-07-01

    Organic waste detoxification requires cleavage of carbon bonds. Such reactions can be photo-driven by light that is energetic enough to disrupt such bonds. Alternately, light can be used to activate catalyst materials, which in turn can break organic bonds. In either case, photons with wavelengths less than 400 nm are required. Because the terrestrial solar resource below 400 nm is so small (roughly 3% of the available spectrum), highly efficient optical concentrators are needed that can withstand outdoor service conditions. In the past, optical elements for solar application have been designed to prevent ultraviolet (uv) radiation from reaching the reflective layer to avoid the potentially harmful effects of such light on the collector materials themselves. This effectively forfeits the uv part of the spectrum in return for some measure of protection against optical degradation. To optimize the cost/performance benefit of photochemical reaction systems, optical materials must be developed that are not only highly efficient but also inherently stable against the radiation they are designed to concentrate. The requirements of uv optical elements in terms of appropriate spectral bands and level of reflectance are established based upon the needs of photochemical applications. Relevant literature on uv reflector materials is reviewed which, along with discussions with industrial contacts, allows the establishment of a data base of currently available materials. Although a number of related technologies exist that require uv reflectors, to date little attention has been paid to achieving outdoor durability required for solar applications. 49 refs., 3 figs.

  6. Ultraviolet photodissociation of OCS: Product energy and angular distributions

    SciTech Connect (OSTI)

    McBane, G. C. [Department of Chemistry, Grand Valley State University, Allendale, Michigan 49401 (United States); Schmidt, J. A.; Johnson, M. S. [Department of Chemistry, University of Copenhagen, Universitetsparken 5, DK-2100 Copenhagen O (Denmark); Schinke, R. [Max-Planck-Institut fuer Dynamik und Selbstorganisation (MPIDS), D-37077 Goettingen (Germany)

    2013-03-07

    The ultraviolet photodissociation of carbonyl sulfide (OCS) was studied using three-dimensional potential energy surfaces and both quantum mechanical dynamics calculations and classical trajectory calculations including surface hopping. The transition dipole moment functions used in an earlier study [J. A. Schmidt, M. S. Johnson, G. C. McBane, and R. Schinke, J. Chem. Phys. 137, 054313 (2012)] were improved with more extensive treatment of excited electronic states. The new functions indicate a much larger contribution from the 1 {sup 1}A{sup Double-Prime} state ({sup 1}{Sigma}{sup -} in linear OCS) than was found in the previous work. The new transition dipole functions yield absorption spectra that agree with experimental data just as well as the earlier ones. The previously reported potential energy surfaces were also empirically modified in the region far from linearity. The resulting product state distributions P{sub v,j}, angular anisotropy parameters {beta}(j), and carbon monoxide rotational alignment parameters A{sub 0}{sup (2)}(j) agree reasonably well with the experimental results, while those computed from the earlier transition dipole and potential energy functions do not. The higher-j peak in the bimodal rotational distribution is shown to arise from nonadiabatic transitions from state 2 {sup 1}A{sup Prime} to the OCS ground state late in the dissociation.

  7. Oxygen isotope fractionation in the vacuum ultraviolet photodissociation of carbon monoxide: Wavelength, pressure and temperature dependency.

    SciTech Connect (OSTI)

    Chakraborty, Subrata; Davis, Ryan; Ahmed, Musahid; Jackson, Teresa L.; Thiemens, Mark H.

    2012-01-03

    Several absorption bands exist in the VUV region of Carbon monoxide (CO). Emission spectra indicate that these bands are all predissociative. An experimental investigation of CO photodissociation by vacuum ultraviolet photons (90 to 108 nm; ~13 to 11 eV) from the Advanced Light Source Synchrotron and direct measurement of the associated oxygen isotopic composition of the products are presented here. A wavelength dependency of the oxygen isotopic composition in the photodissociation product was observed. Slope values (δ'{sup 18}O/ δ'{sup 17}O) ranging from 0.76 to 1.32 were observed in oxygen three-isotope space (δ'{sup 18}O vs. δ'{sup 17}O) which correlated with increasing synchrotron photon energy, and indicate a dependency of the upper electronic state specific dissociation dynamics (e.g., perturbation and coupling associated with a particular state). An unprecedented magnitude in isotope separation was observed for photodissociation at the 105 and 107 nm synchrotron bands and are found to be associated with accidental predissociation of the vibrational states ({nu} = 0 and 1) of the upper electronic state E{sup 1}Π. For each synchrotron band, a large (few hundred per mil) extent of isotopic fractionation was observed and the range of fractionation is a combination of column density and exposure time. A significant temperature dependency in oxygen isotopic fractionation was observed, indicating a rotational level dependency in the predissociation process.

  8. Norathyriol Suppresses Skin Cancers Induced by Solar Ultraviolet Radiation by Targeting ERK Kinases

    SciTech Connect (OSTI)

    Li, Jixia; Malakhova, Margarita; Mottamal, Madhusoodanan; Reddy, Kanamata; Kurinov, Igor; Carper, Andria; Langfald, Alyssa; Oi, Naomi; Kim, Myoung Ok; Zhu, Feng; Sosa, Carlos P.; Zhou, Keyuan; Bode, Ann M.; Dong, Zigang

    2012-06-27

    Ultraviolet (UV) irradiation is the leading factor in the development of skin cancer, prompting great interest in chemopreventive agents for this disease. In this study, we report the discovery of norathyriol, a plant-derived chemopreventive compound identified through an in silico virtual screening of the Chinese Medicine Library. Norathyriol is a metabolite of mangiferin found in mango, Hypericum elegans, and Tripterospermum lanceolatum and is known to have anticancer activity. Mechanistic investigations determined that norathyriol acted as an inhibitor of extracellular signal-regulated kinase (ERK)1/2 activity to attenuate UVB-induced phosphorylation in mitogen-activated protein kinases signaling cascades. We confirmed the direct and specific binding of norathyriol with ERK2 through a cocrystal structural analysis. The xanthone moiety in norathyriol acted as an adenine mimetic to anchor the compound by hydrogen bonds to the hinge region of the protein ATP-binding site on ERK2. Norathyriol inhibited in vitro cell growth in mouse skin epidermal JB6 P+ cells at the level of G{sub 2}-M phase arrest. In mouse skin tumorigenesis assays, norathyriol significantly suppressed solar UV-induced skin carcinogenesis. Further analysis indicated that norathyriol mediates its chemopreventive activity by inhibiting the ERK-dependent activity of transcriptional factors AP-1 and NF-{kappa}B during UV-induced skin carcinogenesis. Taken together, our results identify norathyriol as a safe new chemopreventive agent that is highly effective against development of UV-induced skin cancer.

  9. THE NEAR-ULTRAVIOLET LUMINOSITY FUNCTION OF YOUNG, EARLY M-TYPE DWARF STARS

    SciTech Connect (OSTI)

    Ansdell, Megan; Baranec, Christoph; Gaidos, Eric; Mann, Andrew W.; Lpine, Sebastien; James, David; Buccino, Andrea; Mauas, Pablo; Petrucci, Romina; Law, Nicholas M.; Riddle, Reed

    2015-01-01

    Planets orbiting within the close-in habitable zones of M dwarf stars will be exposed to elevated high-energy radiation driven by strong magnetohydrodynamic dynamos during stellar youth. Near-ultraviolet (NUV) irradiation can erode and alter the chemistry of planetary atmospheres, and a quantitative description of the evolution of NUV emission from M dwarfs is needed when modeling these effects. We investigated the NUV luminosity evolution of early M-type dwarfs by cross-correlating the Lpine and Gaidos catalog of bright M dwarfs with the Galaxy Evolution Explorer (GALEX) catalog of NUV (1771-2831 ) sources. Of the 4805 sources with GALEX counterparts, 797 have NUV emission significantly (>2.5?) in excess of an empirical basal level. We inspected these candidate active stars using visible-wavelength spectra, high-resolution adaptive optics imaging, time-series photometry, and literature searches to identify cases where the elevated NUV emission is due to unresolved background sources or stellar companions; we estimated the overall occurrence of these ''false positives'' (FPs) as ?16%. We constructed an NUV luminosity function that accounted for FPs, detection biases of the source catalogs, and GALEX upper limits. We found the NUV luminosity function to be inconsistent with predictions from a constant star-formation rate and simplified age-activity relation defined by a two-parameter power law.

  10. Vacuum-ultraviolet (VUV) photoionization of small methanol and methanol-water clusters

    SciTech Connect (OSTI)

    Ahmed, Musahid; Ahmed, Musahid; Wilson, Kevin R.; Belau, Leonid; Kostko, Oleg

    2008-05-12

    In this work we report on thevacuum-ultraviolet (VUV) photoionization of small methanol and methanol-water clusters. Clusters of methanol with water are generated via co-expansion of the gas phase constituents in a continuous supersonic jet expansion of methanol and water seeded in Ar. The resulting clusters are investigated by single photon ionization with tunable vacuumultraviolet synchrotron radiation and mass analyzed using reflectron mass spectrometry. Protonated methanol clusters of the form (CH3OH)nH + (n=1-12) dominate the mass spectrum below the ionization energy of the methanol monomer. With an increase in water concentration, small amounts of mixed clusters of the form (CH3OH)n(H2O)H + (n=2-11) are detected. The only unprotonated species observed in this work are the methanol monomer and dimer. Appearance energies are obtained from the photoionization efficiency (PIE) curves for CH3OH +, (CH 3OH)2 +, (CH3OH)nH + (n=1-9), and (CH 3OH)n(H2O)H + (n=2-9 ) as a function of photon energy. With an increase in the water content in the molecular beam, there is an enhancement of photoionization intensity for methanol dimer and protonated methanol monomer at threshold. These results are compared and contrasted to previous experimental observations.