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Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
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1

Characterizing organometallic-vapor-phase-epitaxy-grown indium gallium nitride islands on gallium nitride for light emitting diode applications.  

E-Print Network (OSTI)

??The indium-gallium-nitride on gallium-nitride (InGaN/GaN) materials system is a promising candidate for providing a high intensity, high efficiency solution to the yet unsolved problem of (more)

Anderson, Kathy Perkins Jenkins

2011-01-01T23:59:59.000Z

2

Doping of gallium nitride using disilane  

Science Conference Proceedings (OSTI)

Keywords: disilane, gallium nitride, metalorganic chemical vapor deposition, organometallic vapor phase epitaxy, silicon doping

A. E. Wickenden; L. B. Rowland; K. Doverspike; D. K. Gaskill; J. A. Freitas, Jr.; D. S. Simons; P. H. Chi

1995-11-01T23:59:59.000Z

3

Gallium Nitride nanowires: synthesis, contacts, electron ...  

Science Conference Proceedings (OSTI)

... Gallium Nitride nanowires: synthesis, contacts, electron transport, mechanical resonators, and defects. John E. Fischer University of Pennsylvania. ...

4

P-type gallium nitride  

DOE Patents (OSTI)

Several methods have been found to make p-type gallium nitride. P-type gallium nitride has long been sought for electronic devices. N-type gallium nitride is readily available. Discovery of p-type gallium nitride and the methods for making it will enable its use in ultraviolet and blue light-emitting diodes and lasers. pGaN will further enable blue photocathode elements to be made. Molecular beam epitaxy on substrates held at the proper temperatures, assisted by a nitrogen beam of the proper energy produced several types of p-type GaN with hole concentrations of about 5{times}10{sup 11} /cm{sup 3} and hole mobilities of about 500 cm{sup 2} /V-sec, measured at 250 K. P-type GaN can be formed of unintentionally-doped material or can be doped with magnesium by diffusion, ion implantation, or co-evaporation. When applicable, the nitrogen can be substituted with other group III elements such as Al. 9 figs.

Rubin, M.; Newman, N.; Fu, T.; Ross, J.; Chan, J.

1997-08-12T23:59:59.000Z

5

P-type gallium nitride  

DOE Patents (OSTI)

Several methods have been found to make p-type gallium nitride. P-type gallium nitride has long been sought for electronic devices. N-type gallium nitride is readily available. Discovery of p-type gallium nitride and the methods for making it will enable its use in ultraviolet and blue light-emitting diodes and lasers. pGaN will further enable blue photocathode elements to be made. Molecular beam epitaxy on substrates held at the proper temperatures, assisted by a nitrogen beam of the proper energy produced several types of p-type GaN with hole concentrations of about 5.times.10.sup.11 /cm.sup.3 and hole mobilities of about 500 cm.sup.2 /V-sec, measured at 250.degree. K. P-type GaN can be formed of unintentionally-doped material or can be doped with magnesium by diffusion, ion implantation, or co-evaporation. When applicable, the nitrogen can be substituted with other group III elements such as Al.

Rubin, Michael (Berkeley, CA); Newman, Nathan (Montara, CA); Fu, Tracy (Berkeley, CA); Ross, Jennifer (Pleasanton, CA); Chan, James (Berkeley, CA)

1997-01-01T23:59:59.000Z

6

Controlled VLS Growth of Indium, Gallium and Tin Oxide Nanowires via Chemical Vapor Transport  

E-Print Network (OSTI)

technique to synthesize indium oxide, gallium oxide, and tinmaterial systems such as indium oxide, gallium oxide and tinand Characterization A. Indium Oxide Nanowires Indium oxide

Johnson, M.C.; Aloni, S.; McCready, D.E.; Bourret-Courchesne, E.D.

2006-01-01T23:59:59.000Z

7

Solar cell with a gallium nitride electrode  

DOE Patents (OSTI)

A solar cell which comprises a body of silicon having a P-N junction therein with a transparent conducting N-type gallium nitride layer as an ohmic contact on the N-type side of the semiconductor exposed to solar radiation.

Pankove, Jacques I. (Princeton, NJ)

1979-01-01T23:59:59.000Z

8

Formation of copper-indium-selenide and/or copper-indium-gallium-selenide films from indium selenide and copper selenide precursors  

DOE Patents (OSTI)

Liquid-based indium selenide and copper selenide precursors, including copper-organoselenides, particulate copper selenide suspensions, copper selenide ethylene diamine in liquid solvent, nanoparticulate indium selenide suspensions, and indium selenide ethylene diamine coordination compounds in solvent, are used to form crystalline copper-indium-selenide, and/or copper indium gallium selenide films (66) on substrates (52).

Curtis, Calvin J. (Lakewood, CO); Miedaner, Alexander (Boulder, CO); Van Hest, Maikel (Lakewood, CO); Ginley, David S. (Evergreen, CO); Nekuda, Jennifer A. (Lakewood, CO)

2011-11-15T23:59:59.000Z

9

Preparation Of Copper Indium Gallium Diselenide Films For Solar Cells  

DOE Patents (OSTI)

High quality thin films of copper-indium-gallium-diselenide useful in the production of solar cells are prepared by electrodepositing at least one of the constituent metals onto a glass/Mo substrate, followed by physical vapor deposition of copper and selenium or indium and selenium to adjust the final stoichiometry of the thin film to approximately Cu(In,Ga)Se.sub.2. Using an AC voltage of 1-100 KHz in combination with a DC voltage for electrodeposition improves the morphology and growth rate of the deposited thin film. An electrodeposition solution comprising at least in part an organic solvent may be used in conjunction with an increased cathodic potential to increase the gallium content of the electrodeposited thin film.

Bhattacharya, Raghu N. (Littleton, CO); Contreras, Miguel A. (Golden, CO); Keane, James (Lakewood, CO); Tennant, Andrew L. (Denver, CO), Tuttle, John R. (Denver, CO); Ramanathan, Kannan (Lakewood, CO); Noufi, Rommel (Golden, CO)

1998-08-08T23:59:59.000Z

10

Electrochemical Solution Growth: Gallium Nitride Crystal ...  

... and economical bulk gallium nirtide (GaN) substrates needed to meet the performance requirements of high-efficiency LED and high-power transistors.

11

Effect of oxidation on the Mechanical Properties of Liquid Gallium and Eutectic Gallium-Indium  

E-Print Network (OSTI)

Liquid metals exhibit remarkable mechanical properties, in particular large surface tension and low viscosity. However, these properties are greatly affected by oxidation when exposed to air. We measure the viscosity, surface tension, and contact angle of gallium (Ga) and a eutectic gallium-indium alloy (eGaIn) while controlling such oxidation by surrounding the metal with an acid bath of variable concentration. Rheometry measurements reveal a yield stress directly attributable to an oxide skin that obscures the intrinsic behavior of the liquid metals. We demonstrate how the intrinsic viscosity can be obtained with precision through a scaling technique that collapses low- and high-Reynolds number data. Measuring surface tension with a pendant drop method, we show that the oxide skin generates a surface stress that mimics surface tension and develop a simple model to relate this to the yield stress obtained from rheometry. We find that yield stress, surface tension, and contact angle all transition from solid-...

Xu, Qin; Guo, Qiti; Jaeger, Heinrich; Brown, Eric

2012-01-01T23:59:59.000Z

12

Polycrystalline Thin-Film Research: Copper Indium Gallium Diselenide (Fact Sheet)  

DOE Green Energy (OSTI)

Capabilities fact sheet for the National Center for Photovoltaics: Polycrystalline Thin-Film Research: Copper Indium Gallium Diselenide that includes scope, core competencies and capabilities, and contact/web information.

Not Available

2011-06-01T23:59:59.000Z

13

Effect of oxidation on the Mechanical Properties of Liquid Gallium and Eutectic Gallium-Indium  

E-Print Network (OSTI)

Liquid metals exhibit remarkable mechanical properties, in particular large surface tension and low viscosity. However, these properties are greatly affected by oxidation when exposed to air. We measure the viscosity, surface tension, and contact angle of gallium (Ga) and a eutectic gallium-indium alloy (eGaIn) while controlling such oxidation by surrounding the metal with an acid bath of variable concentration. Rheometry measurements reveal a yield stress directly attributable to an oxide skin that obscures the intrinsic behavior of the liquid metals. We demonstrate how the intrinsic viscosity can be obtained with precision through a scaling technique that collapses low- and high-Reynolds number data. Measuring surface tension with a pendant drop method, we show that the oxide skin generates a surface stress that mimics surface tension and develop a simple model to relate this to the yield stress obtained from rheometry. We find that yield stress, surface tension, and contact angle all transition from solid-like to liquid behavior at the same critical acid concentration, thereby quantitatively confirming that the wettability of these liquid metals is due to the oxide skin.

Qin Xu; Nikolai Qudalov; Qiti Guo; Heinrich Jaeger; Eric Brown

2012-01-23T23:59:59.000Z

14

(Polyfluoroaryl) fluoroanions of aluminum, gallium, and indium of enhanced utility, uses thereof, and products based thereon  

DOE Patents (OSTI)

The (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium are novel weakly coordinating anions which are highly fluorinated. (Polyfluoroaryl)fluoroanions of one such type contain at least one ring substituent other than fluorine. These (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium have greater solubility in organic solvents, or have a coordinative ability essentially equal to or less than that of the corresponding (polyfluoroaryl)fluoroanion of aluminum, gallium, or indium in which the substituent is replaced by fluorine. Another type of new (polyfluoroaryl)fluoroanion of aluminum, gallium, and indium have 1-3 perfluorinated fused ring groups and 2-0 perfluorophenyl groups. When used as a cocatalyst in the formation of novel catalytic complexes with d- or f-block metal compounds having at least one leaving group such as a methyl group, these anions, because of their weak coordination to the metal center, do not interfere in the ethylene polymerization process, while affecting the propylene process favorably, if highly isotactic polypropylene is desired. Thus, the (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of this invention are useful in various polymerization processes such as are described.

Marks, Tobin J. (Evanston, IL); Chen, You-Xian (Midland, MI)

2001-01-01T23:59:59.000Z

15

(Polyfluoroaryl) fluoroanions of aluminum, gallium, and indium of enhanced utility, uses thereof, and products based thereon  

DOE Patents (OSTI)

The (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium are novel weakly coordinating anions which are highly fluorinated. (Polyfluoroaryl)fluoroanions of one such type contain at least one ring substituent other than fluorine. These (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium have greater solubility in organic solvents, or have a coordinative ability essentially equal to or less than that of the corresponding (polyfluoroaryl)fluoroanion of aluminum, gallium, or indium in which the substituent is replaced by fluorine. Another type of new (polyfluoroaryl)fluoroanion of aluminum, gallium, and indium have 1-3 perfluorinated fused ring groups and 2-0 perfluorophenyl groups. When used as a cocatalyst in the formation of novel catalytic complexes with d- or f-block metal compounds having at least one leaving group such as a methyl group, these anions, because of their weak coordination to the metal center, do not interfere in the ethylene polymerization process, while affecting the propylene process favorably, if highly isotactic polypropylene is desired. Thus, the (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of this invention are useful in various polymerization processes such as are described.

Marks, Tobin J. (Evanston, IL); Chen, You-Xian (Midland, MI)

2002-01-01T23:59:59.000Z

16

Size and shape dependence on melting temperature of gallium nitride nanoparticles  

Science Conference Proceedings (OSTI)

The study of variation of the size and shape effect on the melting property of gallium nitride nanoparticles with their spherical and cylindrical geometrical feature is theoretically explored. A numerical thermodynamical model has been devoted for the ...

Paneerselvam Antoniammal; Dakshanamoorthy Arivuoli

2012-01-01T23:59:59.000Z

17

Synthesis, characterization, and biotemplated assembly of indium nitride and indium gallium nitride nanoparticles  

E-Print Network (OSTI)

A low-temperature, ambient pressure solution synthesis of colloidal InN nanoparticles is presented. This synthesis utilizes a previously dismissed precursor and results in individual, non-aggregated nanoparticles with ...

Hsieh, Jennifer Chia-Jen

2010-01-01T23:59:59.000Z

18

(Polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of enhanced utility, uses thereof, and products based thereon  

DOE Patents (OSTI)

The (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium are novel weakly coordinating anions which are are highly fluorinated. (Polyfluoroaryl)fluoroanions of one such type contain at least one ring substituent other than fluorine. These (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium have greater solubility in organic solvents, or have a coordinative ability essentially equal to or less than that of the corresponding (polyfluoroaryl)fluoroanion of aluminum, gallium, or indium in which the substituent is replaced by fluorine. Another type of new (polyfluoroaryl)fluoroanion of aluminum, gallium, and indium have 1-3 perfluorinated fused ring groups and 2-0 perfluorophenyl groups. When used as a cocatalyst in the formation of novel catalytic complexes with d- or f-block metal compounds having at least one leaving group such as a methyl group, these anions, because of their weak coordination to the metal center, do not interefere in the ethylene polymerization process, while affecting the the propylene process favorably, if highly isotactic polypropylene is desired. Thus, the (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of this invention are useful in various polymerization processes such as are described.

Marks, Tobin J. (Evanston, IL); Chen, You-Xian (Midland, MI)

2001-01-01T23:59:59.000Z

19

Electrical effect of titanium diffusion on amorphous indium gallium zinc oxide  

Science Conference Proceedings (OSTI)

In this work, thermal diffusion phenomenon of Ti into amorphous indium gallium zinc oxide ({alpha}-IGZO) was carefully investigated with secondary ion mass spectroscopy, I-V, and R{sub s} measurement systems and HSC chemistry simulation tool. According to the experimental and simulated results, the diffused Ti atoms were easily oxidized due to its lowest oxidation free energy. Since oxygen atoms were decomposed from the {alpha}-IGZO during the oxidation of Ti, the number of oxygen vacancies working as electron-donating sites in {alpha}-IGZO was dramatically increased, contributing to the decrease of resistivity ({rho}) from 1.96 {Omega} cm (as-deposited {alpha}-IGZO) to 1.33 Multiplication-Sign 10{sup -3}{Omega} cm (350 Degree-Sign C annealed {alpha}-IGZO).

Choi, Seung-Ha [School of Electronic and Electrical Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Development Group of Oxide Semiconductor, Samsung Display, Yongin 446-711 (Korea, Republic of); Jung, Woo-Shik [Department of Electrical Engineering, Stanford University, Stanford, California 94305 (United States); Park, Jin-Hong [School of Electronic and Electrical Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

2012-11-19T23:59:59.000Z

20

Preparation of copper-indium-gallium-diselenide precursor films by electrodeposition for fabricating high efficiency solar cells  

DOE Patents (OSTI)

A photovoltaic cell exhibiting an overall conversion efficiency of 13.6% is prepared from a copper-indium-gallium-diselenide precursor thin film. The film is fabricated by first simultaneously electrodepositing copper, indium, gallium, and selenium onto a glass/molybdenum substrate (12/14). The electrodeposition voltage is a high frequency AC voltage superimposed upon a DC voltage to improve the morphology and growth rate of the film. The electrodeposition is followed by physical vapor deposition to adjust the final stoichiometry of the thin film to approximately Cu(In.sub.1-n Ga.sub.x)Se.sub.2, with the ratio of Ga/(In+Ga) being approximately 0.39.

Bhattacharya, Raghu N. (Littleton, CO); Hasoon, Falah S. (Arvada, CO); Wiesner, Holm (Golden, CO); Keane, James (Lakewood, CO); Noufi, Rommel (Golden, CO); Ramanathan, Kannan (Golden, CO)

1999-02-16T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


21

Reference Data for the Density and Viscosity of Liquid Cadmium, Cobalt, Gallium, Indium, Mercury, Silicon, Thallium, and Zinc  

Science Conference Proceedings (OSTI)

The available experimental data for the density and viscosity of liquid cadmium, cobalt, gallium, indium, mercury, silicon, thallium, and zinc have been critically examined with the intention of establishing both a density and a viscosity standard. All experimental data have been categorized into primary and secondary data according to the quality of measurement, the technique employed and the presentation of the data, as specified by a series of criteria. The proposed standard reference correlations for the density of liquid cadmium, cobalt, gallium, indium, silicon, thallium, and zinc are characterized by percent deviations at the 95% confidence level of 0.6, 2.1, 0.4, 0.5, 2.2, 0.9, and 0.7, respectively. In the case of mercury, since density reference values already exist, no further work was carried out. The standard reference correlations for the viscosity of liquid cadmium, cobalt, gallium, indium, mercury, silicon, thallium, and zinc are characterized by percent deviations at the 95% confidence level of 9.4, 14.0, 13.5, 2.1, 7.3, 15.7, 5.1, and 9.3, respectively.

Assael, Marc J.; Armyra, Ivi J.; Brillo, Juergen; Stankus, Sergei V.; Wu Jiangtao; Wakeham, William A. [Chemical Engineering Department, Aristotle University, 54124 Thessaloniki (Greece); Institut fuer Materialphysik im Weltraum, Deutsches Zentrum fuer Luft- und Raumfahrt, 51170 Koeln (Germany); Kutateladze Institute of Thermophysics, Siberian Brunch of the Russian Academy of Sciences, Lavrentyev ave. 1, 630090 Novosibirsk (Russian Federation); Center of Thermal and Fluid Science, School of Energy and Power Engineering, Xi'an Jiaotong University, Shaanxi 710049 (China); Chemical Engineering Department, Imperial College, London SW7 2BY (United Kingdom)

2012-09-15T23:59:59.000Z

22

Evaluation of critical materials for five advanced design photovoltaic cells with an assessment of indium and gallium  

DOE Green Energy (OSTI)

The objective of this study is to identify potential material supply constraints due to the large-scale deployment of five advanced photovoltaic (PV) cell designs, and to suggest strategies to reduce the impacts of these production capacity limitations and potential future material shortages. This report presents the results of the screening of the five following advanced PV cell designs: polycrystalline silicon, amorphous silicon, cadmium sulfide/copper sulfide frontwall, polycrystalline gallium arsenide MIS, and advanced concentrator-500X. Each of these five cells is screened individually assuming that they first come online in 1991, and that 25 GWe of peak capacity is online by the year 2000. A second computer screening assumes that each cell first comes online in 1991 and that each cell has 5 GWe of peak capacity by the year 2000, so that the total online cpacity for the five cells is 25 GWe. Based on a review of the preliminary basline screening results, suggestions were made for varying such parameters as the layer thickness, cell production processes, etc. The resulting PV cell characterizations were then screened again by the CMAP computer code. Earlier DOE sponsored work on the assessment of critical materials in PV cells conclusively identtified indium and gallium as warranting further investigation as to their availability. Therefore, this report includes a discussion of the future availability of gallium and indium. (WHK)

Watts, R.L.; Gurwell, W.E.; Jamieson, W.M.; Long, L.W.; Pawlewicz, W.T.; Smith, S.A.; Teeter, R.R.

1980-05-01T23:59:59.000Z

23

Growth and morphology of 0.80 eV photoemitting indium nitride nanowires  

E-Print Network (OSTI)

221 , and ammonolysis of indium oxide 22 . There are alsoand the absence of any indium oxide peaks indicate that the

2004-01-01T23:59:59.000Z

24

Growth and morphology of 0.80 eV photoemitting indium nitride nanowires  

DOE Green Energy (OSTI)

InN nanowires with high efficiency photoluminescence emission at 0.80 eV are reported for the first time. InN nanowires were synthesized via a vapor solid growth mechanism from high purity indium metal and ammonia. The products consist of only hexagonal wurtzite phase InN. Scanning electron microscopy showed wires with diameters of 50-100nm and having fairly smooth morphologies. High-resolution transmission electron microscopy revealed high quality, single crystal InN nanowires which grew in the <0001> direction. The group-III nitrides have become an extremely important technological material over the past decade. They are commonly used in optoelectronic devices, such as high brightness light-emitting diodes (LEDs) and low wavelength laser diodes (LDs), as well as high power/high frequency electronic devices. Recently InN thin films grown by MOCVD and MBE were found to have a bandgap energy in the range of 0.7-0.9 eV, much lower than the value of {approx}1.9 eV found for InN films grown by sputtering. This large decrease in the direct bandgap transition energy and the ability to form ternary (InGaN) and quaternary (AlInGaN) alloys increases the versatility of group-III nitride optoelectronic devices, ranging from the near IR to the UV. Additionally, InN has some promising transport and electronic properties. It has the smallest effective electron mass of all the group-III nitrides which leads to high mobility and high saturation velocity10 and a large drift velocity at room temperature. As a result of these unique properties, there has been a large increase in interest in InN for potential use in optoelectronic devices, such as LDs and high efficiency solar cells, as well as high frequency/high power electronic devices.

Johnson, M.C.; Lee, C.J.; Bourret-Courchesne, E.D.; Konsek, S.L.; Aloni, S.; Han, W.Q.; Zettl, A.

2004-08-13T23:59:59.000Z

25

Gallium-Nitride Transistors for High-Efficiency Industrial Power Supplies, Phase 1: State of Semiconductor Development and Industrial Power Supply Market  

Science Conference Proceedings (OSTI)

This white paper describes recent advancements in the development of Gallium-Nitride (GaN) transistors for power conversion applications. This wide bandgap semiconductor has the potential to reduce losses and improve performance of power converters. The industrial power supply market is described and the application of GaN to power conversion in this segment is introduced for future work.

2013-12-23T23:59:59.000Z

26

Derived reference doses for three compounds used in the photovoltaics industry: Copper indium diselenide, copper gallium diselenide, and cadmium telluride  

DOE Green Energy (OSTI)

Polycrystalline thin-film photovoltaic modules made from copper indium diselenide (CIS), copper gallium diselenide (CGS), and cadmium telluride (CdTe) arc nearing commercial development. A wide range of issues are being examined as these materials move from the laboratory to large-scale production facilities to ensure their commercial success. Issues of traditional interest include module efficiency, stability and cost. More recently, there is increased focus given to environmental, health and safety issues surrounding the commercialization of these same devices. An examination of the toxicological properties of these materials, and their chemical parents is fundamental to this discussion. Chemicals that can present large hazards to human health or the environment are regulated often more strictly than those that are less hazardous. Stricter control over how these materials are handled and disposed can increase the costs associated with the production and use of these modules dramatically. Similarly, public perception can be strongly influenced by the inherent biological hazard that these materials possess. Thus, this report: presents a brief background tutorial on how toxicological data are developed and used; overviews the toxicological data available for CIS, CGS and CdTe; develops ``reference doses`` for each of these compounds; compares the reference doses for these compounds with those of their parents; discusses the implications of these findings to photovoltaics industry.

Moskowitz, P.D.; Bernholc, N.; DePhillips, M.P.; Viren, J.

1995-07-06T23:59:59.000Z

27

Electrical Bias as an Alternate Method for Reproducible Measurement of Copper Indium Gallium Diselenide (CIGS) Photovoltaic Modules: Preprint  

DOE Green Energy (OSTI)

Light-to-dark metastable changes in thin-film photovoltaic (PV) modules can introduce uncertainty when measuring module performance on indoor flash testing equipment. This study describes a method to stabilize module performance through forward-bias current injection rather than light exposure. Measurements of five pairs of thin-film copper indium gallium diselenide (CIGS) PV modules indicate that forward-bias exposure maintained the PV modules at a stable condition (within 1%) while the unbiased modules degraded in performance by up to 12%. It was additionally found that modules exposed to forward bias exhibited stable performance within about 3% of their long-term outdoor exposed performance. This carrier-injection method provides a way to reduce uncertainty arising from fast transients in thin-film module performance between the time a module is removed from light exposure and when it is measured indoors, effectively simulating continuous light exposure by injecting minority carriers that behave much as photocarriers do. This investigation also provides insight into the initial light-induced transients of thin-film modules upon outdoor deployment.

Deline, C.; Stokes, A.; Silverman, T. J.; Rummel, S.; Jordan, D.; Kurtz, S.

2012-08-01T23:59:59.000Z

28

Compact, Interactive Electric Vehicle Charger: Gallium-Nitride Switch Technology for Bi-directional Battery-to-Grid Charger Applications  

SciTech Connect

ADEPT Project: HRL Laboratories is using gallium nitride (GaN) semiconductors to create battery chargers for electric vehicles (EVs) that are more compact and efficient than traditional EV chargers. Reducing the size and weight of the battery charger is important because it would help improve the overall performance of the EV. GaN semiconductors process electricity faster than the silicon semiconductors used in most conventional EV battery chargers. These high-speed semiconductors can be paired with lighter-weight electrical circuit components, which helps decrease the overall weight of the EV battery charger. HRL Laboratories is combining the performance advantages of GaN semiconductors with an innovative, interactive battery-to-grid energy distribution design. This design would support 2-way power flow, enabling EV battery chargers to not only draw energy from the power grid, but also store and feed energy back into it.

2010-10-01T23:59:59.000Z

29

Highest transmittance and high-mobility amorphous indium gallium zinc oxide films on flexible substrate by room-temperature deposition and post-deposition anneals  

Science Conference Proceedings (OSTI)

Amorphous indium gallium zinc oxide (a-IGZO) thin films of the highest transmittance reported in literature were initially deposited onto flexible polymer substrates at room temperature. The films were annealed in vacuum, air, and oxygen to enhance their electrical and optical performances. Electrical and optical characterizations were done before and after anneals. A partial reversal of the degradation in electrical properties upon annealing in oxygen was achieved by subjecting the films to subsequent vacuum anneals. A model was developed based on film texture and structural defects which showed close agreement between the measured and calculated carrier mobility values at low carrier concentrations (2-6 x 10{sup 19} cm{sup -3}).

Gadre, Mandar J. [School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, Arizona 85287 (United States); Alford, T. L. [School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, Arizona 85287 (United States); Flexible Display Center at Arizona State University, Tempe, Arizona 85284 (United States)

2011-08-01T23:59:59.000Z

30

NREL: Process Development and Integration Laboratory - Copper Indium  

NLE Websites -- All DOE Office Websites (Extended Search)

Copper Indium Gallium Diselenide Cluster Tool Capabilities Copper Indium Gallium Diselenide Cluster Tool Capabilities The Copper Indium Gallium Diselenide (CIGS) cluster tool in the Process Development and Integration Laboratory offers powerful capabilities with integrated chambers for depositing, processing, measuring, and characterizing photovoltaic materials and devices. You can read more on the rationale for developing this cluster tool and its capabilities, and check out the National Solar Technology Roadmap for CIGS Photovoltaics. Contact Miguel Contreras for more details on these capabilities. The Copper Indium Gallium Diselenide cluster tool, manufactured by DCA Instruments, will be operational in 2009. Techniques will include evaporation; radiofrequency, direct-current (DC), and pulsed DC sputtering;

31

Using the genetic algorithm to design gallium indium nitride/gallium nitride light-emitting diodes with reduced efficiency droop and reduced spectral instability with respect to injection current  

Science Conference Proceedings (OSTI)

Today we are witnessing a fast growing trend that is redefining the concept of lighting. Numerous governments from all over the world have passed legislation to phase out incandescent light bulbs, with the objective of encouraging energy-efficient ...

Roya Mirhosseini / Partha S. Dutta

2010-01-01T23:59:59.000Z

32

Structural TEM study of nonpolar a-plane gallium nitride grown on (112_0) 4H-SiC by organometallic vapor phase epitaxy  

E-Print Network (OSTI)

nitride grown on (1120) 4H-SiC by organometallic vapor phasea-plane GaN grown on a 4H-SiC substrate with an AlN buffergrown on (0001) Al 2 O 3 , 6H-SiC or free- standing GaN

Zakharov, Dmitri N.; Liliental-Weber, Zuzanna; Wagner, Brian; Reitmeier, Zachary J.; Preble, Edward A.; Davis, Robert F.

2005-01-01T23:59:59.000Z

33

Oxidation of gallium arsenide  

DOE Patents (OSTI)

This invention relates to gallium arsenide semiconductors and, more particularly, to the oxidation of surface layers of gallium arsenide semiconductors for semiconductor device fabrication.

Hoffbauer, M.A.; Cross, J.B.

1991-11-16T23:59:59.000Z

34

Controlling Gallium Nitride Polarity on Native Substrates  

Science Conference Proceedings (OSTI)

Symposium, Advanced Materials for Power Electronics, Power Conditioning, and Power Conversion ... Potential Ceramic Dielectrics for Air Force Applications.

35

Electronic properties of gallium nitride nanowires  

E-Print Network (OSTI)

This thesis presents a systematic study of the electrical transport in GaN nanowires. Particularly, the effect of the surrounding dielectric on the conductivity of GaN nanowires is experimentally shown for the first time. ...

Yoon, Joonah

2008-01-01T23:59:59.000Z

36

Development of gallium nitride power transistors  

E-Print Network (OSTI)

GaN-based high-voltage transistors have outstanding properties for the development of ultra-high efficiency and compact power electronics. This thesis describes a new process technology for the fabrication of GaN power ...

Piedra, Daniel, M. Eng. Massachusetts Institute of Technology

2011-01-01T23:59:59.000Z

37

Session KK: Indium Nitride - Programmaster.org  

Science Conference Proceedings (OSTI)

Jun 25, 2010 ... PL spectra clearly demonstrate two peaks: at 0.678eV due to InN ... Kamimura1; Katsumi Kishino1; Akihiko Kikuchi1; 1Sophia University

38

Indium Corporation | Open Energy Information  

Open Energy Info (EERE)

Corporation Jump to: navigation, search Name Indium Corporation Place New York Product String representation "Indium Corporat ... rope, and Asia." is too long. References Indium...

39

Mechanical Behavior of Indium Nanostructures  

NLE Websites -- All DOE Office Websites (Extended Search)

materials such as indium, since conventional pillar fabrication by focused ion-beam milling techniques ultimately leads to melting or structural degradation. All indium...

40

Local structure of indium oxynitride from x-ray absorption spectroscopy  

SciTech Connect

Synchrotron x-ray absorption near edge structures (XANES) measurements of In L{sub 3} edge is used in conjunction with first principles calculations to characterize rf magnetron sputtered indium oxynitride at different O contents. Good agreement between the measured and the independently calculated spectra are obtained. Calculations show that the XANES spectra of this alloy are sensitive to the coordination numbers of the In atoms, i.e., fourfold for indium nitride-like structures and sixfold for indium oxide-like structures, but not to the substitution of nearest neighbor N by O or vice versa.

T-Thienprasert, J.; Onkaw, D.; Rujirawat, S.; Limpijumnong, S. [School of Physics, Suranaree University of Technology and National Synchrotron Research Center, Nakhon Ratchasima 30000 (Thailand); Nukeaw, J.; Sungthong, A. [Nanotechnology Research Center of KMITL and Department of Applied Physics, King Mongkut' s Institute of Technology Ladkrabang, Bangkok 10520 (Thailand); Porntheeraphat, S. [Thai Microelectronics Center, National Electronics and Computer Technology Center, Pathumthani 12120 (Thailand); Singkarat, S. [Fast Neutron Research Facility, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand)

2008-08-04T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


41

SYNTHESIS OF HIGH-PURITY BULK COPPER INDIUM GALLIUM SELENIDE ...  

A sputtering target formed by the method can have an oxygen content of 10 ppm by weight, ... Biomass and Biofuels; Building Energy Efficiency; Electricity Transmission;

42

Supply Chain Dynamics of Tellurium (Te), Indium (In), and Gallium...  

NLE Websites -- All DOE Office Websites (Extended Search)

CdTe Solar Cells, Solar Energy Materials and Solar Cells, 90 (2006) 2263-2271. 3 CRC Handbook of Chemistry and Physics, CRC Press, Boca Raton, FL, 1986. 4 M.A. Green, K....

43

P-64: A Comparative Study of Metal Oxide Coated Indium-tin Oxide Anodes  

E-Print Network (OSTI)

Indium-tin oxide anodes capped with certain oxides of metals enhance while other oxides degrade the hole-injection and quantum efficiencies of organic light-emitting diodes (OLEDs). The oxides of tin, zinc, praseodymium, yttrium, gallium, terbium and titanium have been investigated. The power efficiency of an OLED with a 1nm thick praseodymium oxide cap is improved by 2.5 times over that of a conventional OLED without an oxide capped anode.

For Organic Light-Emitting; Chengfeng Qiu; Haiying Chen; Zhilang Xie; Man Wong; Hoi Sing Kwok

2002-01-01T23:59:59.000Z

44

Electrochemical investigation of the gallium nitride-aqueous electrolyte interface  

SciTech Connect

GaN (E{sub g} = {approximately}3.4 eV) was photoelectrochemically characterized and the energetic position of its bandedges determined with respect to SHE. Electrochemical impedance spectroscopy was employed to analyze the interface, determine the space charge layer capacitance, and, subsequently obtain the flatband potential of GaN in different aqueous electrolytes. The flatband potential of GaN varied at an approximately Nernstian rate in aqueous buffer electrolytes of different pHs indicating acid-base equilibria at the interface.

Kocha, S.S.; Peterson, M.W.; Arent, D.J.; Turner, J.A. [National Renewable Energy Lab., Golden, CO (United States). Photoconversion Branch; Redwing, J.M.; Tischler, M.A. [Advanced Technology Materials, Inc., Danbury, CT (United States)

1995-12-01T23:59:59.000Z

45

Nanofabrication of gallium nitride photonic crystal light-emitting diodes  

Science Conference Proceedings (OSTI)

We describe a comparison of nanofabrication technologies for the fabrication of 2D photonic crystal structures on GaN/InGaN blue LEDs. Such devices exhibit enhanced brightness and the possibility of controlling the angular emission profile of emitted ... Keywords: GaN dry-etching, Light-emitting diodes, Nanolithography, Photonic crystals

Ali Z. Khokhar; Keith Parsons; Graham Hubbard; Faiz Rahman; Douglas S. Macintyre; Chang Xiong; David Massoubre; Zheng Gong; Nigel P. Johnson; Richard M. De La Rue; Ian M. Watson; Erdan Gu; Martin D. Dawson; Steve J. Abbott; Martin D. B. Charlton; Martin Tillin

2010-11-01T23:59:59.000Z

46

Formation mechanisms of spatially-directed zincblende gallium nitride nanocrystals  

Science Conference Proceedings (OSTI)

We report on the spatially selective formation of GaN nanocrystals embedded in GaAs. Broad-area N{sup +} implantation followed by rapid thermal annealing leads to the formation of nanocrystals at the depth of maximum ion damage. With additional irradiation using a Ga{sup +} focused ion beam, selective lateral positioning of the nanocrystals within the GaAs matrix is observed in isolated regions of increased vacancy concentration. Following rapid thermal annealing, the formation of zincblende GaN is observed in the regions of highest vacancy concentration. The nucleation of zincblende nanocrystals over the wurtzite phase of bulk GaN is consistent with the predictions of a thermodynamic model for the nanoscale size-dependence of GaN nucleation.

Wood, A. W. [Department of Physics, University of Michigan, Ann Arbor, Michigan 48109 (United States); Collino, R. R. [Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Cardozo, B. L. [Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Naab, F. [Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109 (United States); Wang, Y. Q. [Materials Science and Technology Division, Los Alamos National Lab, Los Alamos, New Mexico 87545 (United States); Goldman, R. S. [Department of Physics, University of Michigan, Ann Arbor, Michigan 48109 (United States); Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States)

2011-12-15T23:59:59.000Z

47

Nanoscale-Structured Gallium Nitride Pillars for Light-Emitting ...  

Science Conference Proceedings (OSTI)

... using top-down fabrication scheme, D. Paramanik, A. Motayed, GS Aluri, J.-Y. Ha, S. Krylyuk, AV Davydov, M. King, S. McLaughlin, S. Gupta, and H ...

2013-01-18T23:59:59.000Z

48

Preparation of uranium nitride  

DOE Patents (OSTI)

A process for preparing actinide-nitrides from massive actinide metal which is suitable for sintering into low density fuel shapes by partially hydriding the massive metal and simultaneously dehydriding and nitriding the dehydrided portion. The process is repeated until all of the massive metal is converted to a nitride.

Potter, Ralph A. (Lynchburg, VA); Tennery, Victor J. (Upper Arlington, OH)

1976-01-01T23:59:59.000Z

49

Observation of visible luminescence from indium nitride at room temperature  

SciTech Connect

InN films were grown on sapphire substrates with AlN buffer layers by reactive sputtering. C-axis-oriented crystalline InN films with a wurtzite structure were confirmed by x-ray diffraction and Raman scattering. Strong photoluminescence (PL) at 1.87 eV, together with a clear absorption edge at 1.97 eV, was observed at room temperature, which clearly demonstrates that it is not accurate in the previous assignment of an {approx}0.7 eV fundamental band gap for intrinsic InN simply from PL and absorption data. The possible origin of the present large band gap was discussed in terms of the effects of oxygen and the Burstein-Moss shift.

Guo, Q.X.; Tanaka, T.; Nishio, M.; Ogawa, H.; Pu, X.D.; Shen, W.Z. [Department of Electrical and Electronic Engineering, Saga University, Saga 840-8502 (Japan); Laboratory of Condensed Matter Spectroscopy and Opto-Electronic Physics, Department of Physics, Shanghai Jiao Tong University, 1954 Hua Shan Road, Shanghai 200030 (China)

2005-06-06T23:59:59.000Z

50

Mechanical Behavior of Indium Nanostructures  

NLE Websites -- All DOE Office Websites (Extended Search)

Mechanical Behavior of Indium Nanostructures Print Mechanical Behavior of Indium Nanostructures Print Indium is a key material in lead-free solder applications for microelectronics due to its excellent wetting properties, extended ductility, and high electrical conductivity. With the size of electronic devices continuing to shrink and the promise of indium-based nanotechnologies, it is important to develop a fundamental understanding of this material's small-scale mechanical properties and reliability. Researchers from the University of Waterloo, California Institute of Technology, and Los Alamos National Laboratory have collaborated with a team at ALS Beamline 12.3.2 to investigate the small-scale mechanics of indium nanostructures. Scanning x-ray microdiffraction (μSXRD) studies revealed that the indium microstructure is typical of a well-annealed metal, containing very few initial dislocations and showing close-to-theoretical strength.

51

Mechanical Behavior of Indium Nanostructures  

NLE Websites -- All DOE Office Websites (Extended Search)

Mechanical Behavior of Indium Nanostructures Print Mechanical Behavior of Indium Nanostructures Print Indium is a key material in lead-free solder applications for microelectronics due to its excellent wetting properties, extended ductility, and high electrical conductivity. With the size of electronic devices continuing to shrink and the promise of indium-based nanotechnologies, it is important to develop a fundamental understanding of this material's small-scale mechanical properties and reliability. Researchers from the University of Waterloo, California Institute of Technology, and Los Alamos National Laboratory have collaborated with a team at ALS Beamline 12.3.2 to investigate the small-scale mechanics of indium nanostructures. Scanning x-ray microdiffraction (μSXRD) studies revealed that the indium microstructure is typical of a well-annealed metal, containing very few initial dislocations and showing close-to-theoretical strength.

52

Mechanical Behavior of Indium Nanostructures  

NLE Websites -- All DOE Office Websites (Extended Search)

Mechanical Behavior of Indium Nanostructures Print Mechanical Behavior of Indium Nanostructures Print Indium is a key material in lead-free solder applications for microelectronics due to its excellent wetting properties, extended ductility, and high electrical conductivity. With the size of electronic devices continuing to shrink and the promise of indium-based nanotechnologies, it is important to develop a fundamental understanding of this material's small-scale mechanical properties and reliability. Researchers from the University of Waterloo, California Institute of Technology, and Los Alamos National Laboratory have collaborated with a team at ALS Beamline 12.3.2 to investigate the small-scale mechanics of indium nanostructures. Scanning x-ray microdiffraction (μSXRD) studies revealed that the indium microstructure is typical of a well-annealed metal, containing very few initial dislocations and showing close-to-theoretical strength.

53

Gallium interactions with Zircaloy  

E-Print Network (OSTI)

High fluence ion implantation of Ga ions was conducted ics. on heated Zircaloy-4 in the range of [] Ga ions/[]. Surface effects were studied using SEM and electron microphone analysis. The depth profile of Ga in the Zircaloy was characterized with Rutherford backscattering and SIMS techniques. Results indicate that the Zirc-4 is little affected up to a fluency of [] Ga ions/[]. After implantation of [] Ga ions/[], sub-grain features on the order of 2 gm were observed which may be due to intermetallic compound formation between Ga and Zr. For the highest fluency implant, Ga content in the Zirc-4 reached a saturation value of between 30 and 40 atomic %; significant enhanced diffusion was observed but gallium was not seen to concentrate at grain boundaries.

West, Michael Keith

1998-01-01T23:59:59.000Z

54

Nitride fuel performance  

E-Print Network (OSTI)

The purpose of this work was to assess the potential of nitride fuels in the current context of the nuclear industry. Nitride fuels systems have indeed been for the past decade the subject of new interest from the international community. This renewal of interest can be explained by the strong potential that nitride fuel systems exhibit for applications such as advanced fast reactor technology, waste transmutation and nuclear space power. To assess this potential, a review of the nitride physical properties was performed in comparison to oxide or metal fuel properties. The potential applications of nitride systems were also detailed. A fuel performance computer code was developed to obtain a more quantitative comparison between nitride and oxide fuel. The oxide code FUELROD was taken as a basis for the new code. After modernization, nitride fuel property correlations were implemented to obtain a nitride version of the code. Using this new tool, a comparison between oxide and nitride fuels was performed to highlight their difference in irradiation behavior in order to confirm their potential.

Reynaud, Sylvie Marie Aurel?ie

2002-01-01T23:59:59.000Z

55

Superconducting structure with layers of niobium nitride and aluminum nitride  

DOE Patents (OSTI)

A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources. 8 figs.

Murduck, J.M.; Lepetre, Y.J.; Schuller, I.K.; Ketterson, J.B.

1989-07-04T23:59:59.000Z

56

It's Elemental - The Element Indium  

NLE Websites -- All DOE Office Websites (Extended Search)

Cadmium Cadmium Previous Element (Cadmium) The Periodic Table of Elements Next Element (Tin) Tin The Element Indium [Click for Isotope Data] 49 In Indium 114.818 Atomic Number: 49 Atomic Weight: 114.818 Melting Point: 429.75 K (156.60°C or 313.88°F) Boiling Point: 2345 K (2072°C or 3762°F) Density: 7.31 grams per cubic centimeter Phase at Room Temperature: Solid Element Classification: Metal Period Number: 5 Group Number: 13 Group Name: none What's in a name? Named after the bright indigo line in its spectrum. Say what? Indium is pronounced as IN-dee-em. History and Uses: Indium was discovered by the German chemists Ferdinand Reich and Hieronymus Theodor Richter in 1863. Reich and Richter had been looking for traces of the element thallium in samples of zinc ores. A brilliant indigo line in

57

Synthesis and characterization of visible emission from rare-earth doped aluminum nitride, gallium nitride and gallium aluminum nitride powders and thin films  

E-Print Network (OSTI)

to improve sealing and prevent the ingress of air, as shownimproved sealing and prevented the ingress of air, which

Tao, Jonathan Huai-Tse

2010-01-01T23:59:59.000Z

58

Boron nitride nanotubes  

Science Conference Proceedings (OSTI)

Boron nitride nanotubes are prepared by a process which includes: (a) creating a source of boron vapor; (b) mixing the boron vapor with nitrogen gas so that a mixture of boron vapor and nitrogen gas is present at a nucleation site, which is a surface, the nitrogen gas being provided at a pressure elevated above atmospheric, e.g., from greater than about 2 atmospheres up to about 250 atmospheres; and (c) harvesting boron nitride nanotubes, which are formed at the nucleation site.

Smith, Michael W. (Newport News, VA); Jordan, Kevin (Newport News, VA); Park, Cheol (Yorktown, VA)

2012-06-06T23:59:59.000Z

59

Highly efficient blue organic light emitting device using indium-free transparent anode Ga:ZnO with scalability for large area coating  

Science Conference Proceedings (OSTI)

The availability of economically-produced and environmentally-stable transparent conductive oxide (TCO) coatings is critical for the development of a variety of electronic devices requiring transparent electrodes. Such devices include liquid crystal display pixels and organic light emitting diodes (OLEDs),[1, 2] solar cell applications,[3, 4] and electrically heated windows.[5, 6] The materials fulfilling these requirements are usually wide band gap inorganic transparent conductive oxides (TCOs). Tin-doped indium oxide, or ITO, has traditionally been used for electronic TCO applications because of its low resistivity, high work function and transparency. Due to the increasing cost and limited supply of indium and its tendency to migrate in to the device, there has been increasing research interest to substitute ITO with an indium-free material. A number of alternative metal oxides and doped oxides have been evaluated as TCO materials with varying degrees of success.[7, 8] Among these alternatives to ITO, gallium-doped zinc oxide (GZO) [2, 9] and aluminium-doped zinc oxide (AZO) [10, 11] have drawn particular attention. These materials have been demonstrated to have resistivities and transparencies approaching those of the best ITO, low toxicity, and much lower materials cost. Although AZO is attractive as a TCO electrode material, GZO features a greater resistance to oxidation as a result of galliums greater electronegativity compared to Submitted to 2 aluminum.[12, 13

Wang, Liang (Frank); Matson, Dean W.; Polikarpov, Evgueni; Swensen, James S.; Bonham, Charles C.; Cosimbescu, Lelia; Berry, J. J.; Ginley, D. S.; Gaspar, Daniel J.; Padmaperuma, Asanga B.

2010-02-15T23:59:59.000Z

60

Decreased gallium uptake in acute hematogenous osteomyelitis  

SciTech Connect

Decreased radiopharmaceutical uptake was noted on both bone and gallium scans in the case of acute hematogenous osteomyelitis of the right ilium (acetabular roof). This combination of findings is probably rare. The mechanism of decreased gallium uptake is unknown, but may be related to decreased blood flow.

Ang, J.G.; Gelfand, M.J.

1983-07-01T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


61

Cubic nitride templates  

DOE Patents (OSTI)

A polymer-assisted deposition process for deposition of epitaxial cubic metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be used as templates for the development of high quality cubic GaN based electronic devices.

Burrell, Anthony K; McCleskey, Thomas Mark; Jia, Quanxi; Mueller, Alexander H; Luo, Hongmei

2013-04-30T23:59:59.000Z

62

Recycling of wasted energy : thermal to electrical energy conversion  

E-Print Network (OSTI)

of Amorphous Gallium Indium Zinc Oxide NonvolatileAmorphous gallium indium zinc oxide thin film transistors:Effects in Amorphous GalliumIndium Zinc- xv Oxide Thin Film

Lim, Hyuck

2011-01-01T23:59:59.000Z

63

Fabrication, structure and mechanical properties of indium nanopillars  

E-Print Network (OSTI)

been constructed with indium oxide (In2O3)nanowires [18].and Cho [20], the native indium oxide thickness is 5nm atin nature. The native indium oxide represents 40% of the

Lee, Gyuhyon

2010-01-01T23:59:59.000Z

64

Indium Fluor Sauerstoff Kulturleistung Chemie  

E-Print Network (OSTI)

In F O 49 9 8 Indium Fluor Sauerstoff Kulturleistung Chemie Tag der Chemie Samstag, 18. Juni 2011;Liebe Besucherin, lieber Besucher Hiermit möchten wir Sie herzlich zu unserem «Tag der Chemie» auf dem Experimental- vorführung spannender und verblüffender Phänomene aus der Chemie. Für die Kinder, die gern einmal

Zürich, Universität

65

Superplastic forging nitride ceramics  

DOE Patents (OSTI)

The invention relates to producing relatively flaw free silicon nitride ceramic shapes requiring little or no machining by superplastic forging This invention herein was made in part under Department of Energy Grant DE-AC01-84ER80167, creating certain rights in the United States Government. The invention was also made in part under New York State Science and Technology Grant SB1R 1985-10.

Panda, Prakash C. (Ithaca, NY); Seydel, Edgar R. (Ithaca, NY); Raj, Rishi (Ithaca, NY)

1988-03-22T23:59:59.000Z

66

Quantum wells on indium gallium arsenic compositionally graded buffers realized by molecular beam epitaxy  

E-Print Network (OSTI)

For a long time, there has been a desire to extend the emission wavelength of GaAs-based quantum well lasers, with the aim of eventually replacing InP with GaAs as the substrate of choice for communication applications. ...

Choy, Henry Kwong Hin, 1974-

2005-01-01T23:59:59.000Z

67

Analysis of amorphous indium-gallium-zinc-oxide thin-film transistor contact metal  

E-Print Network (OSTI)

, 157-159 (2008). 22 W.L. Bragg, Philosophical Magazine Series 6, 40:236, 169-189 (1920). 23 N.E. Holden, Pure & Appl. Chem. 52, 2349-2384 (1979). 24 J.F. Shackelford and W. Alexander, Materials science and engineering handbook, ed. 3. (CRC...

Kiani, Ahmed; Hasko, David G.; Milne, William I.; Flewitt, Andrew J.

2013-04-15T23:59:59.000Z

68

Silicon nitride ceramic comprising samaria and ytterbia  

Science Conference Proceedings (OSTI)

This invention relates to a sintered silicon nitride ceramic comprising samaria and ytterbia for enhanced toughness.

Yeckley, Russell L. (Oakham, MA)

1996-01-01T23:59:59.000Z

69

Core-Shell Nanopillar Array Solar Cells using Cadmium Sulfide Coating on Indium Phosphide Nanopillars  

E-Print Network (OSTI)

and structural properties of indiumtinoxide thin films foris used to deposit indium tin oxide (ITO). ITO is commonlytransparent contact, indium tin oxide (ITO), forms ohmic

Tu, Bor-An Clayton

2013-01-01T23:59:59.000Z

70

Cordierite silicon nitride filters  

SciTech Connect

The objective of this project was to develop a silicon nitride based crossflow filter. This report summarizes the findings and results of the project. The project was phased with Phase I consisting of filter material development and crossflow filter design. Phase II involved filter manufacturing, filter testing under simulated conditions and reporting the results. In Phase I, Cordierite Silicon Nitride (CSN) was developed and tested for permeability and strength. Target values for each of these parameters were established early in the program. The values were met by the material development effort in Phase I. The crossflow filter design effort proceeded by developing a macroscopic design based on required surface area and estimated stresses. Then the thermal and pressure stresses were estimated using finite element analysis. In Phase II of this program, the filter manufacturing technique was developed, and the manufactured filters were tested. The technique developed involved press-bonding extruded tiles to form a filter, producing a monolithic filter after sintering. Filters manufactured using this technique were tested at Acurex and at the Westinghouse Science and Technology Center. The filters did not delaminate during testing and operated and high collection efficiency and good cleanability. Further development in areas of sintering and filter design is recommended.

Sawyer, J.; Buchan, B. (Acurex Environmental Corp., Mountain View, CA (United States)); Duiven, R.; Berger, M. (Aerotherm Corp., Mountain View, CA (United States)); Cleveland, J.; Ferri, J. (GTE Products Corp., Towanda, PA (United States))

1992-02-01T23:59:59.000Z

71

Method for Plutonium-Gallium Separation by Anodic Dissolution of a Solid Plutonium-Gallium Alloy  

DOE Patents (OSTI)

Purified plutonium and gallium are efficiently recovered from a solid plutonium-gallium (Pu-Ga) alloy by using an electrorefining process. The solid Pu-Ga alloy is the cell anode, preferably placed in a moving basket within the electrolyte. As the surface of the Pu-Ga anode is depleted in plutonium by the electrotransport of the plutonium to a cathode, the temperature of the electrolyte is sufficient to liquify the surface, preferably at about 500 C, resulting in a liquid anode layer substantially comprised of gallium. The gallium drips from the liquified surface and is collected below the anode within the electrochemical cell. The transported plutonium is collected on the cathode surface and is recovered.

Miller, William E.; Tomczuk, Zygmunt

1998-12-08T23:59:59.000Z

72

Hard carbon nitride and method for preparing same  

DOE Patents (OSTI)

Novel crystalline .alpha. (silicon nitride-like)-carbon nitride and .beta. (silicon nitride-like)-carbon nitride are formed by sputtering carbon in the presence of a nitrogen atmosphere onto a single crystal germanium or silicon, respectively, substrate.

Haller, Eugene E. (Berkeley, CA); Cohen, Marvin L. (Berkeley, CA); Hansen, William L. (Walnut Creek, CA)

1992-01-01T23:59:59.000Z

73

Gallium-positive Lyme disease myocarditis  

Science Conference Proceedings (OSTI)

In the course of a work-up for fever of unknown origin associated with intermittent arrhythmias, a gallium scan was performed which revealed diffuse myocardial uptake. The diagnosis of Lyme disease myocarditis subsequently was confirmed by serologic titers. One month following recovery from the acute illness, the abnormal myocardial uptake completely resolved.

Alpert, L.I.; Welch, P.; Fisher, N.

1985-09-01T23:59:59.000Z

74

Highly efficient blue organic light emitting devices with indium-free transparent anode on flexible substrates  

Science Conference Proceedings (OSTI)

Indium-free transparent conducting oxides may provide a lower cost solution for the transparent anode in flexible displays and energy efficient solid state lighting. We report herein a near room temperature sputtering process for generating an indium-free transparent conductive oxide (TCO) coating on a flexible substrate. Specifically, we deposited gallium-doped zinc oxide (GZO) uniformly over a 12 diameter area at room temperature on polyethylene terephthalate (PET). During deposition, the system heats to about 60oC due to the energetic sputtering conditions, without any noticeable damage to the PET substrate. The GZO films exhibit excellent physical, optical and electrical properties: roughness ~7 nm, transmittance >85% and resistivity ~ 10-3 ohm cm. Phosphorescent blue organic light-emitting devices (OLEDs) were fabricated on these substrates with comparable performance (16% external quantum efficiency and 33 lm/W power efficiency at 1mA/cm2) to that of devices fabricated on GZO (or ITO) deposited on glass substrates, suggesting flexible GZO/PET substrates may be used instead of high-cost and rigid ITO and glass for flexible displays and solid state lighting.

Wang, Liang; Swensen, James S.; Polikarpov, Evgueni; Matson, Dean W.; Bonham, Charles C.; Bennett, Wendy D.; Gaspar, Daniel J.; Padmaperuma, Asanga B.

2010-09-30T23:59:59.000Z

75

Method for producing refractory nitrides  

DOE Patents (OSTI)

Disclosed is a process for making fine, uniform metal nitride powders that can be hot pressed or sintered. A metal salt is placed in a solvent with Melamine and warmed until a metal-Melamine compound forms. The solution is cooled and the metal-Melamine precipitate is calcined at a temperature below 700/sup 0/C to form the metal nitrides and to avoid formation of the metal oxide.

Quinby, T.C.

1986-04-09T23:59:59.000Z

76

Gallium 67 scintigraphy in glomerular disease  

Science Conference Proceedings (OSTI)

To evaluate the diagnostic usefulness of gallium 67 scintigraphy in glomerular disease, 45 patients with various glomerulopathies, excluding lupus nephritis and renal vasculitis, were studied. Persistent renal visualization 48 hours after the gallium injection, a positive scintigram, was graded as + (less than), ++ (equal to), and +++ (greater than) the hepatic uptake. Positive scintigrams were seen in ten of 16 cases of focal segmental glomerulosclerosis, six of 11 cases of proliferative glomerulonephritis, and one case of minimal change, and one of two cases of membranous nephropathy; also in three of six cases of sickle glomerulopathy, two cases of diabetic neuropathy, one of two cases of amyloidosis, and one case of mild chronic allograft rejection. The 25 patients with positive scans were younger than the 20 with negative scans (31 +/- 12 v 42 +/- 17 years; P less than 0.01), and exhibited greater proteinuria (8.19 +/- 7.96 v 2.9 +/- 2.3 S/d; P less than 0.01) and lower serum creatinine values (2 +/- 2 v 4.1 +/- 2.8 mg/dL; P less than 0.01). The amount of proteinuria correlated directly with the intensity grade of the gallium image (P less than 0.02), but there was no correlation between the biopsy diagnosis and the outcome of the gallium scan. It was concluded that gallium scintigraphy is not useful in the differential diagnosis of the glomerular diseases under discussion. Younger patients with good renal function and heavy proteinuria are likely to have a positive renal scintigram regardless of the underlying glomerulopathy.

Bakir, A.A.; Lopez-Majano, V.; Levy, P.S.; Rhee, H.L.; Dunea, G.

1988-12-01T23:59:59.000Z

77

Interactions of Zircaloy cladding with gallium: 1998 midyear status  

Science Conference Proceedings (OSTI)

A program has been implemented to evaluate the effect of gallium in mixed-oxide (MOX) fuel derived from weapons-grade (WG) plutonium on Zircaloy cladding performance. The objective is to demonstrate that low levels of gallium will not compromise the performance of the MOX fuel system in a light-water reactor. The graded, four-phase experimental program was designed to evaluate the performance of prototypic Zircaloy cladding materials against (1) liquid gallium (Phase 1), (2) various concentrations of Ga{sub 2}O{sub 3} (Phase 2), (3) centrally heated surrogate fuel pellets with expected levels of gallium (Phase 3), and (4) centrally heated prototypic MOX fuel pellets (Phase 4). This status report describes the results of a series of tests for Phases 1 and 2. Three types of tests are being performed: (1) corrosion, (2) liquid metal embrittlement, and (3) corrosion-mechanical. These tests will determine corrosion mechanisms, thresholds for temperature and concentration of gallium that may delineate behavioral regimes, and changes in the mechanical properties of Zircaloy. Initial results have generally been favorable for the use of WG-MOX fuel. The MOX fuel cladding, Zircaloy, does react with gallium to form intermetallic compounds at {ge}300 C; however, this reaction is limited by the mass of gallium and is therefore not expected to be significant with a low level (parts per million) of gallium in the MOX fuel. Although continued migration of gallium into the initially formed intermetallic compound can result in large stresses that may lead to distortion, this was shown to be extremely unlikely because of the low mass of gallium or gallium oxide present and expected clad temperatures below 400 C. Furthermore, no evidence for grain boundary penetration by gallium has been observed.

Wilson, D.F.; DiStefano, J.R.; Strizak, J.P.; King, J.F.; Manneschmidt, E.T.

1998-06-01T23:59:59.000Z

78

Interactions of zircaloy cladding with gallium -- 1997 status  

SciTech Connect

A four phase program has been implemented to evaluate the effect of gallium in mixed oxide (MOX) fuel derived from weapons grade (WG) plutonium on Zircaloy cladding performance. The objective is to demonstrate that low levels of gallium will not compromise the performance of the MOX fuel system in LWR. This graded, four phase experimental program will evaluate the performance of prototypic Zircaloy cladding materials against: (1) liquid gallium (Phase 1), (2) various concentrations of Ga{sub 2}O{sub 3} (Phase 2), (3) centrally heated surrogate fuel pellets with expected levels of gallium (Phase 3), and (4) centrally heated prototypic MOX fuel pellets (Phase 4). This status report describes the results of an initial series of tests for phases 1 and 2. Three types of tests are being performed: (1) corrosion, (2) liquid metal embrittlement (LME), and (3) corrosion mechanical. These tests are designed to determine the corrosion mechanisms, thresholds for temperature and concentration of gallium that may delineate behavioral regimes, and changes in mechanical properties of Zircaloy. Initial results have generally been favorable for the use of WG-MOX fuel. The MOX fuel cladding, Zircaloy, does react with gallium to form intermetallic compounds at {ge} 300 C; however, this reaction is limited by the mass of gallium and is therefore not expected to be significant with a low level (in parts per million) of gallium in the MOX fuel. While continued migration of gallium into the initially formed intermetallic compound results in large stresses that can lead to distortion, this is also highly unlikely because of the low mass of gallium or gallium oxide present and expected clad temperatures below 400 C. Furthermore, no evidence for grain boundary penetration by gallium has been observed.

Wilson, D.F.; DiStefano, J.R.; King, J.F.; Manneschmidt, E.T.; Strizak, J.P.

1997-11-01T23:59:59.000Z

79

Survey of the market, supply and availability of gallium  

DOE Green Energy (OSTI)

The objective of this study was to assess the present consumption and supply of gallium, its potential availability in the satellite power system (SPS) implementation time frame, and commercial and new processing methods for increasing the production of gallium. Findings are reported in detail. The findings strongly suggest that with proper long range planning adequate gallium would be available from free-enterprise world supplies of bauxite for SPS implementation.

Rosi, F.D.

1980-07-01T23:59:59.000Z

80

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide...  

NLE Websites -- All DOE Office Websites (Extended Search)

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Low-dimensional materials have gained much attention not only because of the nonstop march toward...

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


81

Cold Atoms Could Replace Hot Gallium in Focused Ion ...  

Science Conference Proceedings (OSTI)

... The high energies needed to focus gallium for milling tasks end up burying small amounts in the sample, contaminating the material. ...

2011-04-26T23:59:59.000Z

82

Gallium uptake by transferrin and interaction with receptor 1  

Science Conference Proceedings (OSTI)

Iron acquisition Gallium uptake Temperature-jump kinetics .... Part of this thera- peutic action is ..... are all considered as hard metals [10] and are com-.

83

Process for making transition metal nitride whiskers  

DOE Patents (OSTI)

A process for making metal nitrides, particularly titanium nitride whiskers, using a cyanide salt as a reducing agent for a metal compound in the presence of an alkali metal oxide. Sodium cyanide, various titanates and titanium oxide mixed with sodium oxide react to provide titanium nitride whiskers that can be used as reinforcement to ceramic composites. 1 fig., 1 tab.

Bamberger, C.E.

1988-04-12T23:59:59.000Z

84

Indium oxide/n-silicon heterojunction solar cells  

DOE Patents (OSTI)

A high photo-conversion efficiency indium oxide/n-silicon heterojunction solar cell is spray deposited from a solution containing indium trichloride. The solar cell exhibits an Air Mass One solar conversion efficiency in excess of about 10%.

Feng, Tom (Morris Plains, NJ); Ghosh, Amal K. (New Providence, NJ)

1982-12-28T23:59:59.000Z

85

Thermal Stability of Chelated Indium Activable Tracers  

SciTech Connect

The thermal stability of indium tracer chelated with organic ligands ethylenediaminetetraacetic acid (EDTA) and nitrilotriacetic acid (NTA) was measured for reservoir temperatures of 150, 200, and 240 C. Measurements of the soluble indium concentration was made as a function of time by neutron activation analysis. From the data, approximate thermal decomposition rates were estimated. At 150 C, both chelated tracers were stable over the experimental period of 20 days. At 200 C, the InEDTA concentration remained constant for 16 days, after which the thermal decomposition occurred at a measured rate constant of k = 0.09 d{sup -1}. The thermal decomposition of InNTA at 200 C showed a first order reaction with a measured rate constant of k = 0.16 d{sup -1}. At 240 C, both indium chelated tracers showed rapid decomposition with rate constants greater than 1.8 d{sup -1}. The data indicate that for geothermal reservoir with temperatures up to about 200 C, indium chelated tracers can be used effectively for transit times of at least 20 days. These experiments were run without reservoir rock media, and do not account for concomitant loss of indium tracer by adsorption processes.

Chrysikopoulos, Costas; Kruger, Paul

1986-01-21T23:59:59.000Z

86

Interactions of gallium with zircaloy cladding  

E-Print Network (OSTI)

A mastering system was constructed and installed on the current low energy accelerator of the Ion Beam Laboratory in the Department of Nuclear Engineering. Galium was implanted into heated zircaloy targets at nuances of 3x10?, 1x10? and 1x10? ions/cm. Rutherford backscattering spectrometry (RBS) using 260 keV alpha particles was used to determine the initial estimates of gallium concentration. Energy dispersive spectroscopy (EDS) and backscattered electron (BSE) imaging was performed to examine concentration and surface morphology, respectively. Zirconium was then implanted to simulate the radiation effects of fission fragments at a fluency of 1.0x10? Zr atoms/cm. RBS results showed enhanced diffusion and indicate saturation of the gallium concentration. Results also showed the possible formation of a Ga-Zr compound.

Mitchell, Lee Josey

1999-01-01T23:59:59.000Z

87

DD4, Oxygen Plasma Exposure Effects on Indium Oxide Nanowire ...  

Science Conference Proceedings (OSTI)

Presentation Title, DD4, Oxygen Plasma Exposure Effects on Indium Oxide Nanowire ... Electronic Materials Science Challenges in Renewable Energy.

88

Structure and electronic properties of saturated and unsaturated gallium nitride nanotubes  

DOE Green Energy (OSTI)

The atomic and electronic structures of saturated and unsaturated GaN nanotubes along the [001] direction with (100) lateral facets are studied using first-principles calculations. Atomic relaxation of nanotubes shows that appreciable distortion occurs in the unsaturated nanotubes. All the nanotubes considered, including saturated and unsaturated ones, exhibit semiconducting, with a direct band gap. Surface states arisen from the threefold-coordinated N and Ga atoms at the lateral facets exist inside the bulk-like band gap. When the nanotubes saturated with hydrogen, these dangling bond bands are removed from the band gap, but the band gap decreases with increasing the wall thickness of the nanotubes.

Wang, Zhiguo; Wang, Shengjie; Li, Jingbo; Gao, Fei; Weber, William J.

2009-11-05T23:59:59.000Z

89

Radiation-Hardened Gallium Nitride Detector and Arrays for Fusion Diagnostics  

Science Conference Proceedings (OSTI)

This poster reports testing to confirm that GaN devices exhibit the extreme radiation hardness needed for use at the NIF, functioning properly after 1x10{sup 12} protons/cm{sup 2} proton irradiation in one year.

Sun, K. X., and MacNeil, L.

2011-09-08T23:59:59.000Z

90

Commercialization of gallium nitride nanorod arrays on silicon for solid-state lighting  

E-Print Network (OSTI)

One important component in energy usage is lighting, which is currently dominated by incandescent and fluorescent lamps. However, due to potentially higher efficiencies and thus higher energy savings, solid-state lighting ...

Wee, Qixun

2008-01-01T23:59:59.000Z

91

Diffusion, Uptake and Release of Hydrogen in p-type Gallium Nitride: Theory and Experiment  

DOE Green Energy (OSTI)

The diffusion, uptake, and release of H in p-type GaN are modeled employing state energies from density-function theory and compared with measurements of deuterium uptake and release using nuclear-reaction analysis. Good semiquantitative agreement is found when account is taken of a surface permeation barrier.

MYERS JR.,SAMUEL M.; WRIGHT,ALAN F.; PETERSEN,GARY A.; WAMPLER,WILLIAM R.; SEAGER,CARLETON H.; CRAWFORD,MARY H.; HAN,JUNG

2000-06-27T23:59:59.000Z

92

The equilibrium state of hydrogen in gallium nitride: Theory and experiment  

DOE Green Energy (OSTI)

Formation energies and vibrational frequencies for H in wurtzite GaN were calculated from density functional theory and used to predict equilibrium state occupancies and solid solubilities for p-type, intrinsic, and n-type material. The solubility of deuterium (D) was measured at 600--800 C as a function of D{sub 2} pressure and doping and compared with theory. Agreement was obtained by reducing the H formation energies 0.2 eV from ab-initio theoretical values. The predicted stretch-mode frequency for H bound to the Mg acceptor lies 5% above an observed infrared absorption attributed to this complex. It is concluded that currently recognized H states and physical processes account for the equilibrium behavior of H examined in this work.

MYERS JR.,SAMUEL M.; WRIGHT,ALAN F.; PETERSEN,GARY A.; SEAGER,CARLETON H.; WAMPLER,WILLIAM R.; CRAWFORD,MARY H.; HAN,JUNG

2000-04-17T23:59:59.000Z

93

Behavior of Zircaloy Cladding in the Presence of Gallium  

Science Conference Proceedings (OSTI)

The U.S. Department of Energy has established a dual-track approach to the disposition of plutonium arising from the dismantling of nuclear weapons. Both immobilization and reactor-based mixed-oxide (MOX) fuel technologies are being evaluated. The reactor-based MOX fuel option requires assessment of the potential impact of concentrations of gallium (on the order of 1 to 10 ppm), not present in conventional MOX fuel, on cladding material performance. An experimental program was designed to evaluate the performance of prototypic Zircaloy cladding materials against (1) liquid gallium, and (2) various concentrations of G~03. Three types of tests were performed: (1) corrosion, (2) liquid metal embrittlement, and (3) corrosion-mechanical. These tests were to determine corrosion mechanisms, thresholds for temperature and concentration of gallium that delineate behavioral regimes, and changes in the mechanical properties of Zircaloy. Results have generally been favorable for the use of weapons-grade (WG) MOX fhel. The Zircaloy cladding does react with gallium to form intermetallic compounds at >3000 C; however, this reaction is limited by the mass of gallium and is therefore not expected to be significant with a low level (parts per million) of gallium in the MOX fuel. Furthermore, no evidence for grain boundary penetration by gallium or liquid metal embrittlement was observed.

DiStefano, J.R.; King, J.F.; Manneschmidt, E.T.; Strizak, J.P.; Wilson, D.F.

1998-09-28T23:59:59.000Z

94

Surface Composition, Work Function, and Electrochemical Characteristics of Gallium-Doped Zinc Oxide  

Science Conference Proceedings (OSTI)

Gallium-doped zinc oxide (GZO) possesses the electric conductivity, thermal stability, and earth abundance to be a promising transparent conductive oxide replacement for indium tin oxide electrodes in a number of molecular electronic devices, including organic solar cells and organic light emitting diodes. The surface chemistry of GZO is complex and dominated by the hydrolysis chemistry of ZnO, which influences the work function via charge transfer and band bending caused by adsorbates. A comprehensive characterization of the surface chemical composition and electrochemical properties of GZO electrodes is presented, using both solution and surface adsorbed redox probe molecules. The GZO surface is characterized using monochromatic X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy after the following pretreatments: (i) hydriodic acid etch, (ii) potassium hydroxide etch, (iii) RF oxygen plasma etching, and (iv) high-vacuum argon-ion sputtering. The O 1s spectra for the GZO electrodes have contributions from the stoichiometric oxide lattice, defects within the lattice, hydroxylated species, and carbonaceous impurities, with relative near-surface compositions varying with pretreatment. Solution etching procedures result in an increase of the work function and ionization potential of the GZO electrode, but yield different near surface Zn:Ga atomic ratios, which significantly influence charge transfer rates for a chemisorbed probe molecule. The near surface chemical composition is shown to be the dominant factor in controlling surface work function and significantly influences the rate of electron transfer to both solution and tethered probe molecules.

Ratcliff, E. L.; Sigdel, A. K.; Macech, M. R.; Nebesny, K.; Lee, P. A.; Ginley, D. S.; Armstrong, N. R.; Berry, J. J.

2012-06-30T23:59:59.000Z

95

Silicon nitride having a high tensile strength  

Science Conference Proceedings (OSTI)

A ceramic body comprising at least about 80 w/o silicon nitride and having a mean tensile strength of at least about 800 MPa.

Pujari, Vimal K. (Northboro, MA); Tracey, Dennis M. (Medfield, MA); Foley, Michael R. (Oxford, MA); Paille, Norman I. (Oxford, MA); Pelletier, Paul J. (Sutton, MA); Sales, Lenny C. (Grafton, MA); Willkens, Craig A. (Worcester, MA); Yeckley, Russell L. (Latrobe, PA)

1998-01-01T23:59:59.000Z

96

Novel Nitride-Modified Multielectron Conversion Electrode ...  

Novel Nitride-Modified Multielectron Conversion Electrode Materials for Lithium Ion Batteries Note: The technology described above is an early stage opportunity.

97

Available Technologies: Synthesizing Boron Nitride Nanotubes and ...  

Nano- & Micro-technology; Software and IT ; Licensing Interest Form Receive Customized Tech Alerts. Synthesizing Boron Nitride Nanotubes and Related Nanoparticles

98

Interactions of Zircaloy Cladding with Gallium: Final Report  

Science Conference Proceedings (OSTI)

The U.S. Department of Energy has established a dual-track approach to the disposition of plutonium arising from the dismantling of nuclear weapons. Both immobilization and reactor-based mixed-oxide (MOX) fuel technologies are being evaluated. The reactor-based MOX fuel option requires assessment of the potential impact of concentrations of gallium (on the order of 1 to 10 ppm), not present in conventional MOX fhel, on cladding material performance. Three previous repmts"3 identified several compatibility issues relating to the presence of gallium in MOX fuel and its possible reaction with fiel cladding. Gallium initially present in weapons-grade (WG) plutonium is largely removed during processing to produce MOX fhel. After blending the plutonium with uranium, only 1 to 10 ppm gallium is expected in the sintered MOX fuel. Gallium present as gallium oxide (G~OJ could be evolved as the suboxide (G~O). Migration of the evolved G~O and diffusion of gallium in the MOX matrix along thermal gradients could lead to locally higher concentrations of G~03. Thus, while an extremely low concentration of gallium in MOX fiel almost ensures a lack of significant interaction of gallium whh Zircaloy fhel cladding, there remains a small probability that corrosion effects will not be negligible. General corrosion in the form of surface alloying resulting from formation of intermetallic compounds between Zircaloy and gallium should be ma& limited and, therefore, superficial because of the expected low ratio of gallium to the surface area or volume of the Zircaloy cladding. Although the expected concentration of gallium is low and there is very limited volubility of gallium in zirconium, especially at temperatures below 700 "C,4 grain boundary penetration and liquid metal embrittlement (LME) are forms of localized corrosion that were also considered. One fuel system darnage mechanism, pellet clad interaction, has led to some failure of the Zircaloy cladding in light-water reactors (LWRS). This has been attributed to stresses in the cladding and one or more aggressive fission products. Stress corrosion cracking by iodines' 6 and LME by cadmium7>8 have been reported, and it is known that Zircaloy can be embrittled by some low-melting metals, (e.g., mercury).g LME is a form of environmentally induced embrittlement that can induce cracking or loss of ductility. LME requties wetting and a tensile stress, but it does not require corrosion penetration. Experimentally, it has been demonstrated that gallium can cause embrittlement of some alloys (e.g., aluminum) at low temperatures,'"' ] ] but experiments relative to LME of zirconium by gallium have been limited and inconclusive.*2 This report describes a series of tests designed to establish the effects of low levels of residual gallium in WG-MOX fhel on its compatibility with Zircaloy. In addition, to establish damage mechanisms it was important to understand types of cladding interactions and available stiety margins with respect to gallium concentration.

D.F. Wilson; E.T. Manneschmidt; J.F. King; J.P. Strizak; J.R. DiStefano

1998-09-01T23:59:59.000Z

99

High optical quality polycrystalline indium phosphide grown on ...  

High optical quality polycrystalline indium phosphide ... IIIV semiconductor solar cells have demonstrated the highest power ... (thermal oxide, 50nm ...

100

Thermodynamics of Indium Dissolution Behavior in FeO-bearing ...  

Science Conference Proceedings (OSTI)

However, the dissolution mechanism of indium into the metallurgical slag has not been ... Clean Production Process of Titanium Sponge and New Method of...

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


101

Method of preparation of uranium nitride  

SciTech Connect

Method for producing terminal uranium nitride complexes comprising providing a suitable starting material comprising uranium; oxidizing the starting material with a suitable oxidant to produce one or more uranium(IV)-azide complexes; and, sufficiently irradiating the uranium(IV)-azide complexes to produce the terminal uranium nitride complexes.

Kiplinger, Jaqueline Loetsch; Thomson, Robert Kenneth James

2013-07-09T23:59:59.000Z

102

It's Elemental - Isotopes of the Element Gallium  

NLE Websites -- All DOE Office Websites (Extended Search)

Zinc Zinc Previous Element (Zinc) The Periodic Table of Elements Next Element (Germanium) Germanium Isotopes of the Element Gallium [Click for Main Data] Most of the isotope data on this site has been obtained from the National Nuclear Data Center. Please visit their site for more information. Naturally Occurring Isotopes Mass Number Natural Abundance Half-life 69 60.108% STABLE 71 39.892% STABLE Known Isotopes Mass Number Half-life Decay Mode Branching Percentage 56 No Data Available Proton Emission (suspected) No Data Available 57 No Data Available Proton Emission (suspected) No Data Available 58 No Data Available Proton Emission (suspected) No Data Available 59 No Data Available Proton Emission (suspected) No Data Available 60 70 milliseconds Electron Capture 98.40%

103

Oxides and nitrides as alternative plasmonic materials in the optical range  

E-Print Network (OSTI)

As alternatives to conventional metals, new plasmonic materials offer many advantages in the rapidly growing fields of plasmonics and metamaterials. These advantages include low intrinsic loss, semiconductor-based design, compatibility with standard nanofabrication processes, tunability, and others. Transparent conducting oxides such as Al:ZnO, Ga:ZnO and indium-tin-oxide (ITO) enable many high-performance metamaterial devices operating in the near-IR. Transition-metal nitrides such as TiN or ZrN can be substitutes for conventional metals in the visible frequencies. In this paper we provide the details of fabrication and characterization of these new materials and discuss their suitability for a number of metamaterial and plasmonic applications.

Naik, Gururaj V; Boltasseva, Alexandra

2011-01-01T23:59:59.000Z

104

Synthesis of transition metal nitride by nitridation of metastable oxide precursor  

SciTech Connect

Metastable transition metal oxides were used as precursors to synthesize transition metal nitrides at low temperature. Amorphous MoO{sub 2} was prepared by reduction of (NH{sub 4}){sub 6}Mo{sub 7}O{sub 24} solution with hydrazine. As-synthesized amorphous MoO{sub 2} was transformed into fcc {gamma}-Mo{sub 2}N at 400 Degree-Sign C and then into hexagonal {delta}-MoN by further increasing the temperature to 600 Degree-Sign C under a NH{sub 3} flow. The nitridation temperature employed here is much lower than that employed in nitridation of crystalline materials, and the amorphous materials underwent a unique nitridation process. Besides this, the bimetallic nitride Ni{sub 2}Mo{sub 3}N was also synthesized by nitridating amorphous bimetallic precursor. These results suggested that the nitridation of amorphous precursor possessed potential to be a general method for synthesizing many interstitial metallic compounds, such as nitrides and carbides at low temperature. - graphical abstract: Amorphous oxide was used as new precursor to prepare nitride at low temperature. Pure {gamma}-Mo{sub 2}N and {delta}-MoN were obtained at 400 Degree-Sign C and at 600 Degree-Sign C, respectively. Highlights: Black-Right-Pointing-Pointer We bring out a new method to synthesize transition metal nitrides at low temperature. Black-Right-Pointing-Pointer Both mono- and bimetallic molybdenum nitrides were synthesized at a mild condition. Black-Right-Pointing-Pointer The formation of two different molybdenum nitrides {gamma}-Mo{sub 2}N and {delta}-MoN can be controlled from the same metastable precursor. Black-Right-Pointing-Pointer The nitridation temperature was much lower than that reported from crystalline precursors. Black-Right-Pointing-Pointer The metastable precursor had different reaction process in comparison with crystalline precursor.

Wang, Huamin; Wu, Zijie; Kong, Jing [Key Laboratory of Advanced Energy Materials Chemistry (MOE), College of Chemistry, Nankai University, Tianjin 300071 (China)] [Key Laboratory of Advanced Energy Materials Chemistry (MOE), College of Chemistry, Nankai University, Tianjin 300071 (China); Wang, Zhiqiang, E-mail: zqwang@mail.nankai.edu.cn [Key Laboratory of Advanced Energy Materials Chemistry (MOE), College of Chemistry, Nankai University, Tianjin 300071 (China) [Key Laboratory of Advanced Energy Materials Chemistry (MOE), College of Chemistry, Nankai University, Tianjin 300071 (China); Tianjin Key Laboratory of Water Environment and Resources, Tianjin Normal University, No. 393 Binshui Road, Xiqing Dist., Tianjin 300387 (China); Zhang, Minghui, E-mail: zhangmh@nankai.edu.cn [Key Laboratory of Advanced Energy Materials Chemistry (MOE), College of Chemistry, Nankai University, Tianjin 300071 (China)] [Key Laboratory of Advanced Energy Materials Chemistry (MOE), College of Chemistry, Nankai University, Tianjin 300071 (China)

2012-10-15T23:59:59.000Z

105

Indium oxide 'rods in dots' nanostructures  

SciTech Connect

The authors have demonstrated a special indium oxide (In{sub 2}O{sub 3}) 'rods in dots' nanostructure with high nanorod sheet density of over 10{sup 12} cm{sup -2}. The approach has been realized through depositing controllable individual In{sub 2}O{sub 3} nanorods in both number and shape within a single porous alumina membrane (PAM) nanochannel under radio frequency magnetron sputtering. The authors further discussed in detail effects of the PAM configurations (pore diameter and thickness) and sputtering conditions (substrate temperature and argon pressure) on the formation of the In{sub 2}O{sub 3} nanostructure.

Ding, G. Q.; Shen, W. Z.; Zheng, M. J.; Zhou, Z. B. [Laboratory of Condensed Matter Spectroscopy and Opto-Electronic Physics, Department of Physics, Shanghai Jiao Tong University, 1954 Hua Shan Road, Shanghai 200030 (China)

2006-08-07T23:59:59.000Z

106

Charge carrier transport in indium oxide nanocrystals  

Science Conference Proceedings (OSTI)

Nanocrystalline indium oxide samples with various sizes of nanocrystals are synthesized by the sol-gel method. The minimal and maximal average sizes of nanocrystals are 7-8 and 18-20 nm, respectively. An analysis of conductivity measured at dc and ac signals in a wide temperature range (T = 50-300 K) shows that the transport of charge carriers at high temperatures takes place over the conduction band, while in the low-temperature range, the hopping mechanism with a varying jump length over localized states is observed.

Forsh, E. A.; Marikutsa, A. V.; Martyshov, M. N.; Forsh, P. A., E-mail: forsh@vega.phys.msu.ru; Rumyantseva, M. N.; Gas'kov, A. M.; Kashkarov, P. K. [Moscow State University (Russian Federation)

2010-10-15T23:59:59.000Z

107

Low frequency pressure modulation of indium antimonide  

Science Conference Proceedings (OSTI)

A lumped parameter resonator capable of generating megapascal pressures at low frequency (kilohertz) is described. Accelerometers are used to determine the applied pressure, and are calibrated with a piezoelectric sample. A laser diagnostic was also developed to measure the pressure in semiconductor samples through the band gap pressure dependence. In addition, the laser diagnostic has been used to measure the attenuation coefficient {alpha} of commercially available indium antimonide (InSb) wafers. The resonator and laser diagnostic have been used with InSb samples to verify the pressure response.

Hallock, Gary A. [University of Texas at Austin, Austin, Texas 78712-0240 (United States); Meier, Mark A. [ExxonMobil Upstream Research Company, Houston, Texas 77252-2189 (United States)

2012-07-15T23:59:59.000Z

108

Process for forming pure silver ohmic contacts to N- and P-type gallium arsenide materials  

DOE Patents (OSTI)

Disclosed is an improved process for manufacturing gallium arsenide semiconductor devices having as its components a n-type gallium arsenide substrate layer and a p-type gallium arsenide diffused layer. The improved process comprises forming a pure silver ohmic contact to both the diffuse layer and the substrate layer wherein the n-type layer comprises a substantially low doping carrier concentration.

Hogan, S.J.

1983-03-13T23:59:59.000Z

109

Pure silver ohmic contacts to N- and P- type gallium arsenide materials  

DOE Patents (OSTI)

Disclosed is an improved process for manufacturing gallium arsenide semiconductor devices having as its components an n-type gallium arsenide substrate layer and a p-type gallium arsenide diffused layer. The improved process comprises forming a pure silver ohmic contact to both the diffused layer and the substrate layer, wherein the n-type layer comprises a substantially low doping carrier concentration.

Hogan, Stephen J. (Golden, CO)

1986-01-01T23:59:59.000Z

110

Silicon nitride reinforced with molybdenum disilicide  

DOE Patents (OSTI)

Compositions of matter comprised of silicon nitride and molybdenum disilicide and methods of making the compositions, where the molybdenum disilicide is present in amounts ranging from about 5 to about 50 vol%.

Petrovic, J.J.; Honnell, R.E.

1990-12-31T23:59:59.000Z

111

Low temperature route to uranium nitride  

SciTech Connect

A method of preparing an actinide nitride fuel for nuclear reactors is provided. The method comprises the steps of a) providing at least one actinide oxide and optionally zirconium oxide; b) mixing the oxide with a source of hydrogen fluoride for a period of time and at a temperature sufficient to convert the oxide to a fluoride salt; c) heating the fluoride salt to remove water; d) heating the fluoride salt in a nitrogen atmosphere for a period of time and at a temperature sufficient to convert the fluorides to nitrides; and e) heating the nitrides under vacuum and/or inert atmosphere for a period of time sufficient to convert the nitrides to mononitrides.

Burrell, Anthony K. (Los Alamos, NM); Sattelberger, Alfred P. (Darien, IL); Yeamans, Charles (Berkeley, CA); Hartmann, Thomas (Idaho Falls, ID); Silva, G. W. Chinthaka (Las Vegas, NV); Cerefice, Gary (Henderson, NV); Czerwinski, Kenneth R. (Henderson, NV)

2009-09-01T23:59:59.000Z

112

Method of nitriding refractory metal articles  

DOE Patents (OSTI)

A method of nitriding a refractory-nitride forming metal or metalloid articles and composite articles. A consolidated metal or metalloid article or composite is placed inside a microwave oven and nitrogen containing gas is introduced into the microwave oven. The metal or metalloid article or composite is heated to a temperature sufficient to react the metal or metalloid with the nitrogen by applying a microwave energy within the microwave oven. The metal or metalloid article or composite is maintained at that temperature for a period of time sufficient to convert the article of metal or metalloid or composite to an article or composite of refractory nitride. In addition, a method of applying a coating, such as a coating of an oxide, a carbide, or a carbo-nitride, to an article of metal or metalloid by microwave heating.

Tiegs, Terry N. (Lenoir City, TN); Holcombe, Cressie E. (Knoxville, TN); Dykes, Norman L. (Oak Ridge, TN); Omatete, Ogbemi O. (Lagos, NG); Young, Albert C. (Flushing, NY)

1994-01-01T23:59:59.000Z

113

Method of nitriding refractory metal articles  

DOE Patents (OSTI)

A method of nitriding a refractory-nitride forming metal or metalloid articles and composite articles. A consolidated metal or metalloid article or composite is placed inside a microwave oven and nitrogen containing gas is introduced into the microwave oven. The metal or metalloid article or composite is heated to a temperature sufficient to react the metal or metalloid with the nitrogen by applying a microwave energy within the microwave oven. The metal or metalloid article or composite is maintained at that temperature for a period of time sufficient to convert the article of metal or metalloid or composite to an article or composite of refractory nitride. In addition, a method of applying a coating, such as a coating of an oxide, a carbide, or a carbo-nitride, to an article of metal or metalloid by microwave heating.

Tiegs, T.N.; Holcombe, C.E.; Dykes, N.L.; Omatete, O.O.; Young, A.C.

1994-03-15T23:59:59.000Z

114

Silicon nitride reinforced with molybdenum disilicide  

DOE Patents (OSTI)

Compositions of matter comprised of silicon nitride and molybdenum disilicide and methods of making the compositions, where the molybdenum disilicide is present in amounts ranging from about 5 to about 50 vol. %.

Petrovic, John J. (Los Alamos, NM); Honnell, Richard E. (Los Alamos, NM)

1991-01-01T23:59:59.000Z

115

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers  

NLE Websites -- All DOE Office Websites (Extended Search)

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Low-dimensional materials have gained much attention not only because of the nonstop march toward miniaturization in the electronics industry but also for the exotic properties that are inherent in their small size. One approach for creating low-dimensional structures is to exploit the nanoscale or atomic-scale features that exist naturally in the three-dimensional (bulk) form of materials. By this means, a group from the University of Washington has demonstrated a new way of creating one-dimensional nanoscale structures (nanowires) in the compound gallium selenide. In short, ordered lines of structural vacancies in the material stimulate the growth of "one-dimensional" structures less than 1 nanometer in width.

116

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers  

NLE Websites -- All DOE Office Websites (Extended Search)

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Low-dimensional materials have gained much attention not only because of the nonstop march toward miniaturization in the electronics industry but also for the exotic properties that are inherent in their small size. One approach for creating low-dimensional structures is to exploit the nanoscale or atomic-scale features that exist naturally in the three-dimensional (bulk) form of materials. By this means, a group from the University of Washington has demonstrated a new way of creating one-dimensional nanoscale structures (nanowires) in the compound gallium selenide. In short, ordered lines of structural vacancies in the material stimulate the growth of "one-dimensional" structures less than 1 nanometer in width.

117

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers  

NLE Websites -- All DOE Office Websites (Extended Search)

Vacancy-Induced Nanoscale Wire Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Wednesday, 21 December 2005 00:00 Low-dimensional materials have gained much attention not only because of the nonstop march toward miniaturization in the electronics industry but also for the exotic properties that are inherent in their small size. One approach for creating low-dimensional structures is to exploit the nanoscale or atomic-scale features that exist naturally in the three-dimensional (bulk) form of materials. By this means, a group from the University of Washington has demonstrated a new way of creating one-dimensional nanoscale structures (nanowires) in the compound gallium selenide. In short, ordered lines of structural vacancies in the material stimulate the growth of "one-dimensional" structures less than 1 nanometer in width.

118

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers  

NLE Websites -- All DOE Office Websites (Extended Search)

Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Vacancy-Induced Nanoscale Wire Structure in Gallium Selenide Layers Print Low-dimensional materials have gained much attention not only because of the nonstop march toward miniaturization in the electronics industry but also for the exotic properties that are inherent in their small size. One approach for creating low-dimensional structures is to exploit the nanoscale or atomic-scale features that exist naturally in the three-dimensional (bulk) form of materials. By this means, a group from the University of Washington has demonstrated a new way of creating one-dimensional nanoscale structures (nanowires) in the compound gallium selenide. In short, ordered lines of structural vacancies in the material stimulate the growth of "one-dimensional" structures less than 1 nanometer in width.

119

Method for improving the growth of cadmium telluride on a gallium arsenide substrate  

DOE Patents (OSTI)

A method for preparing a gallium arsenide substrate, prior to growing a layer of cadmium telluride on a support surface thereof. The preparation includes the steps of cleaning the gallium arsenide substrate and thereafter forming prepatterned shapes on the support surface of the gallium arsenide substrate. The layer of cadmium telluride then grown on the prepared substrate results in dislocation densities of approximately 1{times}10{sup 6}/cm{sup 2} or less. The prepatterned shapes on the support surface of the gallium arsenide substrate are formed by reactive ion etching an original outer surface of the gallium arsenide substrate and into the body of the gallium arsenide substrate to a depth of at least two microns. The prepatterned shapes have the appearance of cylindrical mesas each having a diameter of at lease twelve microns. After the mesas are formed on the support surface of the gallium arsenide substrate, the substrate is again cleaned.

Reno, J.L.

1990-12-31T23:59:59.000Z

120

The natural and industrial cycling of indium in the environment  

E-Print Network (OSTI)

Indium is an important metal whose production is increasing dramatically due to new uses in the rapidly growing electronics, photovoltaic, and LED industries. Little is known, however, about the natural or industrial cycling ...

White, Sarah Jane O'Connell

2012-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


121

An evaluation of indium antimonide quantum well transistor technology  

E-Print Network (OSTI)

Motivated by the super high electron mobility of Indium Antimonide (InSb), researchers have seen great potential to use this new material in high switching speed and low power transistors. In Dec, 2005, Intel and its ...

Liu, Jingwei, M. Eng. Massachusetts Institute of Technology

2006-01-01T23:59:59.000Z

122

Hybrid silicon nanocrystal silicon nitride dynamic random access memory  

Science Conference Proceedings (OSTI)

This paper introduces a silicon nanocrystal-silicon nitride hybrid single transistor cell for potential dynamic RAM (DRAM) applications that stores charge in silicon nanocrystals or a silicon nitride charge trapping layer or both. The memory operates ...

R. F. Steimle; M. Sadd; R. Muralidhar; Rajesh Rao; B. Hradsky; S. Straub; B. E. White, Jr.

2003-12-01T23:59:59.000Z

123

Magnetism and spin transport studies on indium tin oxide  

E-Print Network (OSTI)

MAGNETISM AND SPIN TRANSPORT STUDIES ON INDIUM TIN OXIDE Ali Moraad Hakimi Darwin College University of Cambridge A dissertation submitted for the degree of Doctor of Philosophy at the University of Cambridge February 2011 In loving memory of my... Grandfathers, Cyrus and Peter Abstract This dissertation reports on a detailed systematic study of the investigation into using Indium Oxide based materials in next generation spin-transport electronic ap- plications. Initial studies focused on the optimisation...

Hakimi, Ali Moraad Heydar

2011-07-12T23:59:59.000Z

124

Silicon nitride ceramic having high fatigue life and high toughness  

DOE Patents (OSTI)

A sintered silicon nitride ceramic comprising between about 0.6 mol % and about 3.2 mol % rare earth as rare earth oxide, and between about 85 w/o and about 95 w/o beta silicon nitride grains, wherein at least about 20% of the beta silicon nitride grains have a thickness of greater than about 1 micron.

Yeckley, Russell L. (Oakham, MA)

1996-01-01T23:59:59.000Z

125

LCD, low-temperature soldering and compound semiconductor : the sources, market, applications and future prospects of indium in Malaysia  

E-Print Network (OSTI)

Indium is a minor but very valuable metal. Decreasing supplies of indium from refining and increasing demands from LCD, low-temperature soldering and compound semiconductors have stimulated the indium price increase ...

Yong, Foo Nun

2006-01-01T23:59:59.000Z

126

III-Nitride Semiconductors for Photovoltaic Applications  

DOE Green Energy (OSTI)

Using a band-structure method that includes bandgap correction, we study the chemical trends of the bandgap variation in III-V semiconductors and predict that the bandgap for InN is 0.85 0.1 eV. This result suggests that InN and its III-nitride alloys are suitable for photovoltaic applications. The unusually small bandgap for InN is explained in terms of the atomic energies and the bandgap deformation potentials. The electronic and structural properties of the nitrides and their alloys are also provided.

Wei, S. H.

2003-05-01T23:59:59.000Z

127

Silicon-nitride and metal composite  

SciTech Connect

A composite and a method for bonding the composite. The composite includes a ceramic portion of silicon nitride, a refractory metal portion and a layer of MoSi.sub.2 indirectly bonding the composite together. The method includes contacting the layer of MoSi.sub.2 with a surface of the silicon nitride and with a surface of the metal; heating the layer to a temperature below 1400.degree. C.; and, simultaneously with the heating, compressing the layer such that the contacting is with a pressure of at least 30 MPa. This composite overcomes useful life problems in the fabrication of parts for a helical expander for use in power generation.

Landingham, Richard L. (Livermore, CA); Huffsmith, Sarah A. (Urbana, IL)

1981-01-01T23:59:59.000Z

128

Method for forming indium oxide/n-silicon heterojunction solar cells  

DOE Patents (OSTI)

A high photo-conversion efficiency indium oxide/n-silicon heterojunction solar cell is spray deposited from a solution containing indium trichloride. The solar cell exhibits an Air Mass One solar conversion efficiency in excess of about 10%.

Feng, Tom (Morris Plains, NJ); Ghosh, Amal K. (New Providence, NJ)

1984-03-13T23:59:59.000Z

129

High-Efficiency Nitride-Based Solid-State Lighting  

SciTech Connect

In this final technical progress report we summarize research accomplished during Department of Energy contract DE-FC26-01NT41203, entitled ''High-Efficiency Nitride-Based Solid-State Lighting''. Two teams, from the University of California at Santa Barbara (Principle Investigator: Dr. Shuji Nakamura) and the Lighting Research Center at Rensselaer Polytechnic Institute (led by Dr. N. Narendran), pursued the goals of this contract from thin film growth, characterization, and packaging/luminaire design standpoints. The UCSB team initially pursued the development of blue gallium nitride (GaN)-based vertical-cavity surface-emitting lasers, as well as ultraviolet GaN-based light emitting diodes (LEDs). In Year 2, the emphasis shifted to resonant-cavity light emitting diodes, also known as micro-cavity LEDs when extremely thin device cavities are fabricated. These devices have very directional emission and higher light extraction efficiency than conventional LEDs. Via the optimization of thin-film growth and refinement of device processing, we decreased the total cavity thickness to less than 1 {micro}m, such that micro-cavity effects were clearly observed and a light extraction efficiency of over 10% was reached. We also began the development of photonic crystals for increased light extraction, in particular for so-called ''guided modes'' which would otherwise propagate laterally in the device and be re-absorbed. Finally, we pursued the growth of smooth, high-quality nonpolar a-plane and m-plane GaN films, as well as blue light emitting diodes on these novel films. Initial nonpolar LEDs showed the expected behavior of negligible peak wavelength shift with increasing drive current. M-plane LEDs in particular show promise, as unpackaged devices had unsaturated optical output power of {approx} 3 mW at 200 mA drive current. The LRC's tasks were aimed at developing the subcomponents necessary for packaging UCSB's light emitting diodes, and packaging them to produce a white light fixture. During the third and final year of the project, the LRC team investigated alternate packaging methods for the white LED device to achieve at least 25 percent more luminous efficacy than traditional white LEDs; conducted optical ray-tracing analyses and human factors studies to determine the best form factor for the white light source under development, in terms of high luminous efficacy and greater acceptance by subjects; and developed a new die encapsulant using silicone-epoxy resins that showed less yellowing and slower degradation. At the conclusion of this project, the LRC demonstrated a new packaging method, called scattered photon extraction (SPE), that produced an average luminous flux and corresponding average efficacy of 90.7 lm and 36.3 lm/W, respectively, compared with 56.5 lm and 22.6 lm/W for a similar commercial white LED package. At low currents, the SPE package emitted white light with an efficacy of over 80 lm/W and had chromaticity values very close to the blackbody locus. The SPE package showed an overall improvement of 61% for this particular comparison, exceeding the LRC's third-year goal of 25% improvement.

Paul T. Fini; Shuji Nakamura

2005-07-30T23:59:59.000Z

130

Anisotropic Hexagonal Boron Nitride Nanomaterials - Synthesis and Applications  

SciTech Connect

Boron nitride (BN) is a synthetic binary compound located between III and V group elements in the Periodic Table. However, its properties, in terms of polymorphism and mechanical characteristics, are rather close to those of carbon compared with other III-V compounds, such as gallium nitride. BN crystallizes into a layered or a tetrahedrally linked structure, like those of graphite and diamond, respectively, depending on the conditions of its preparation, especially the pressure applied. Such correspondence between BN and carbon readily can be understood from their isoelectronic structures [1, 2]. On the other hand, in contrast to graphite, layered BN is transparent and is an insulator. This material has attracted great interest because, similar to carbon, it exists in various polymorphic forms exhibiting very different properties; however, these forms do not correspond strictly to those of carbon. Crystallographically, BN is classified into four polymorphic forms: Hexagonal BN (h-BN) (Figure 1(b)); rhombohedral BN (r-BN); cubic BN (c-BN); and wurtzite BN (w-BN). BN does not occur in nature. In 1842, Balmain [3] obtained BN as a reaction product between molten boric oxide and potassium cyanide under atmospheric pressure. Thereafter, many methods for its synthesis were reported. h-BN and r-BN are formed under ambient pressure. c-BN is synthesized from h-BN under high pressure at high temperature while w-BN is prepared from h-BN under high pressure at room temperature [1]. Each BN layer consists of stacks of hexagonal plate-like units of boron and nitrogen atoms linked by SP{sup 2} hybridized orbits and held together mainly by Van der Waals force (Fig 1(b)). The hexagonal polymorph has two-layered repeating units: AA'AA'... that differ from those in graphite: ABAB... (Figure 1(a)). Within the layers of h-BN there is coincidence between the same phases of the hexagons, although the boron atoms and nitrogen atoms are alternatively located along the c-axis. The rhombohedral system consists of three-layered units: ABCABC..., whose honeycomb layers are arranged in a shifted phase, like as those of graphite. Reflecting its weak interlayer bond, the h-BN can be cleaved easily along its layers, and hence, is widely used as a lubricant material. The material is stable up to a high temperature of 2300 C before decomposition sets in [2] does not fuse a nitrogen atmosphere of 1 atm, and thus, is applicable as a refractory material. Besides having such properties, similar to those of graphite, the material is transparent, and acts as a good electric insulator, especially at high temperatures (10{sup 6} {Omega}m at 1000 C) [1]. c-BN and w-BN are tetrahedrally linked BN. The former has a cubic sphalerite-type structure, and the latter has a hexagonal wurtzite-type structure. c-BN is the second hardest known material (the hardest is diamond), the so-called white diamond. It is used mainly for grinding and cutting industrial ferrous materials because it does not react with molten iron, nickel, and related alloys at high temperatures whereas diamond does [1]. It displays the second highest thermal conductivity (6-9 W/cm.deg) after diamond. This chapter focuses principally upon information about h-BN nanomaterials, mainly BN nanotubes (BNNTs), porous BN, mono- and few-layer-BN sheets. There are good reviews book chapters about c-BN in [1, 4-6].

Han,W.Q.

2008-08-01T23:59:59.000Z

131

Effects of asymmetry on electron spin dynamics in gallium arsenide quantum wells.  

E-Print Network (OSTI)

??This work presents optical studies of electron spin dynamics in gallium arsenide (GaAs) quantum wells, focusing on the effect of inversion asymmetric confinement potentials on (more)

Eldridge, Peter Stephen

2009-01-01T23:59:59.000Z

132

Session M: III-Nitrides: Defects and LEDs  

Science Conference Proceedings (OSTI)

Jun 22, 2011 ... A correlation has been established between the optical and structural properties of blue light-emitting diode structures with an indium...

133

Silicon nitride having a high tensile strength  

DOE Patents (OSTI)

A silicon nitride ceramic comprising: a) inclusions no greater than 25 microns in length, b) agglomerates no greater than 20 microns in diameter, and c) a surface finish of less than about 8 microinches, said ceramic having a four-point flexural strength of at least about 900 MPa.

Pujari, Vimal K. (Northboro, MA); Tracey, Dennis M. (Medfield, MA); Foley, Michael R. (Oxford, MA); Paille, Norman I. (Oxford, MA); Pelletier, Paul J. (Millbury, MA); Sales, Lenny C. (Grafton, MA); Willkens, Craig A. (Sterling, MA); Yeckley, Russell L. (Oakham, MA)

1996-01-01T23:59:59.000Z

134

Titanium nitride electrodes for thermoelectric generators  

DOE Patents (OSTI)

The invention is directed to a composite article suitable for use in thermoelectric generators. The article comprises a thin film of titanium nitride as an electrode deposited onto solid electrolyte. The invention is also directed to the method of making same.

Novak, Robert F. (Farmington Hills, MI); Schmatz, Duane J. (Dearborn Heights, MI); Hunt, Thomas K. (Ann Arbor, MI)

1987-12-22T23:59:59.000Z

135

DESIGN AND ANALYSIS OF AN INTEGRATED PULSE MODULATED S-BAND POWER AMPLIFIER IN GALLIUM NITRIDE PROCESS  

SciTech Connect

The design of power amplifiers in any semi-conductor process is not a trivia exercise and it is often encountered that the simulated solution is qualitatively different than the results obtained. Phenomena such as oscillation occurring either in-band or out of band and sometimes at subharmonic intervals, continuous spectrum noticed in some frequency bands, often referred to as chaos, and jumps and hysteresis effects can all be encountered and render a design useless. All of these problems might have been identified through a more rigorous approach to stability analysis. Designing for stability is probably the one area of amplifier design that receives the least amount of attention but incurs the most catastrophic of effects if it is not performed properly. Other parameters such as gain, power output, frequency response and even matching may suitable mitigation paths. But the lack of stability in an amplifier has no mitigating path. In addition to of loss of the design completely there are the increased production cycle costs, costs involved with investigating and resolving the problem and the costs involved with schedule slips or delays resulting from it. The Linville or Rollett stability criteria that many microwave engineers follow and rely exclusively on is not sufficient by itself to ensure a stable and robust design. It will be shown that the universal belief that unconditional stability is obtained through an analysis of the scattering matrix S to determine if 1 and |{Delta}{sub S}| < 1 is only part of the procedure and other tools must be used to validate the criteria. The research shown contributes to the state of the art by developing a more thorough stability design technique for designing amplifiers of any class, whether that be current mode or switch mode, than is currently undertaken with the goal of obtaining first pass design success.

STEVE SEDLOCK

2012-04-04T23:59:59.000Z

136

Comparative band alignment of plasma-enhanced atomic layer deposited high-k dielectrics on gallium nitride  

SciTech Connect

Al{sub 2}O{sub 3} films, HfO{sub 2} films, and HfO{sub 2}/Al{sub 2}O{sub 3} stacked structures were deposited on n-type, Ga-face, GaN wafers using plasma-enhanced atomic layer deposition (PEALD). The wafers were first treated with a wet-chemical clean to remove organics and an in-situ combined H{sub 2}/N{sub 2} plasma at 650 Degree-Sign C to remove residual carbon contamination, resulting in a clean, oxygen-terminated surface. This cleaning process produced slightly upward band bending of 0.1 eV. Additional 650 Degree-Sign C annealing after plasma cleaning increased the upward band bending by 0.2 eV. After the initial clean, high-k oxide films were deposited using oxygen PEALD at 140 Degree-Sign C. The valence band and conduction band offsets (VBOs and CBOs) of the Al{sub 2}O{sub 3}/GaN and HfO{sub 2}/GaN structures were deduced from in-situ x-ray and ultraviolet photoemission spectroscopy (XPS and UPS). The valence band offsets were determined to be 1.8 and 1.4 eV, while the deduced conduction band offsets were 1.3 and 1.0 eV, respectively. These values are compared with the theoretical calculations based on the electron affinity model and charge neutrality level model. Moreover, subsequent annealing had little effect on these offsets; however, the GaN band bending did change depending on the annealing and processing. An Al{sub 2}O{sub 3} layer was investigated as an interfacial passivation layer (IPL), which, as results suggest, may lead to improved stability, performance, and reliability of HfO{sub 2}/IPL/GaN structures. The VBOs were {approx}0.1 and 1.3 eV, while the deduced CBOs were 0.6 and 1.1 eV for HfO{sub 2} with respect to Al{sub 2}O{sub 3} and GaN, respectively.

Yang Jialing; Eller, Brianna S.; Zhu Chiyu; England, Chris; Nemanich, Robert J. [Department of Physics, Arizona State University, Tempe, Arizona 85287-1504 (United States)

2012-09-01T23:59:59.000Z

137

Appraisal of lupus nephritis by renal imaging with gallium-67  

Science Conference Proceedings (OSTI)

To assess the activity of lupus nephritis, 43 patients with systemic lupus erythematosus (SLE) were studied by gallium imaging. Delayed renal visualization 48 hours after the gallium injection, a positive result, was noted in 25 of 48 scans. Active renal disease was defined by the presence of hematuria, pyuria (10 or more red blood cells or white blood cells per high-power field), proteinuria (1 g or more per 24 hours), a rising serum creatinine level, or a recent biopsy specimen showing proliferative and/or necrotizing lesions involving more than 20 percent of glomeruli. Renal disease was active in 18 instances, inactive in 23, and undetermined in seven (a total of 48 scans). Sixteen of the 18 scans (89 percent) in patients with active renal disease showed positive findings, as compared with only four of 23 scans (17 percent) in patients with inactive renal disease (p less than 0.001). Patients with positive scanning results had a higher rate of hypertension (p = 0.02), nephrotic proteinuria (p = 0.01), and progressive renal failure (p = 0.02). Mild mesangial nephritis (World Health Organization classes I and II) was noted only in the patients with negative scanning results (p = 0.02) who, however, showed a higher incidence of severe extrarenal SLE (p = 0.04). It is concluded that gallium imaging is a useful tool in evaluating the activity of lupus nephritis.

Bakir, A.A.; Lopez-Majano, V.; Hryhorczuk, D.O.; Rhee, H.L.; Dunea, G.

1985-08-01T23:59:59.000Z

138

IEEE JOURNAL OF PHOTOVOLTAICS, VOL. 2, NO. 2, APRIL 2012 123 Gallium Arsenide Solar Cell Absorption  

E-Print Network (OSTI)

IEEE JOURNAL OF PHOTOVOLTAICS, VOL. 2, NO. 2, APRIL 2012 123 Gallium Arsenide Solar Cell Absorption flat gallium arsenide solar cell, we show that it is possible to modify the flow of light and enhance above the solar cell. The incoupling element is lossless and, thus, has the advantage that no energy

Grandidier, Jonathan

139

Characteristics of graphene FET directly transformed from a resist pattern through interfacial graphitization of liquid gallium  

Science Conference Proceedings (OSTI)

We found that an extremely thin resist pattern on silicon dioxide can be directly transformed into a graphene field effect transistor (FET) channel via interfacial graphitization of liquid gallium. These patterned graphene FETs have p-type characteristics ... Keywords: Conductance, FET, Gallium, Graphene, Graphitization, Resist, Solid phase reaction

Jun-ichi Fujita; Ryuichi Ueki; Takuya Nishijima; Yosuke Miyazawa

2011-08-01T23:59:59.000Z

140

Amorphous hafnium-indium-zinc oxide semiconductor thin film transistors  

Science Conference Proceedings (OSTI)

We reported on the performance and electrical properties of co-sputtering-processed amorphous hafnium-indium-zinc oxide (?-HfIZO) thin film transistors (TFTs). Co-sputtering-processed ?-HfIZO thin films have shown an amorphous phase in nature. ...

Sheng-Po Chang; San-Syong Shih

2012-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


141

p-type conduction in sputtered indium oxide films  

Science Conference Proceedings (OSTI)

We report p-type conductivity in intrinsic indium oxide (IO) films deposited by magnetron sputtering on fused quartz substrates under oxygen-rich ambient. Highly oriented (111) films were studied by x-ray diffraction, optical absorption, and Hall effect measurements. We fabricated p-n homojunctions on these films.

Stankiewicz, Jolanta; Alcala, Rafael [Instituto de Ciencia de Materiales de Aragon and Departamento de Fisica de la Materia Condensada, CSIC-Universidad de Zaragoza, 50009 Zaragoza (Spain); Villuendas, Francisco [Departamento de Fisica Aplicada, Universidad de Zaragoza, 50009 Zaragoza (Spain)

2010-05-10T23:59:59.000Z

142

Platinum-, rhenium-, indium-containing catalysts for conversion of hydrocarbons  

Science Conference Proceedings (OSTI)

A process is described for the catalytic reforming of naphtha-boiling range charge stock at reforming conditions with a catalytic composite comprising: (a) a refractory inorganic oxide; (b) a first uniform dispersion of a platinum component and a rhenium component; (c) a second dispersion of an indium component thereover; (d) a halogen component; and (e) a sulfur component.

Antos, G.J.; Wang, L.

1986-12-16T23:59:59.000Z

143

Method for locating metallic nitride inclusions in metallic alloy ingots  

DOE Patents (OSTI)

A method of determining the location and history of metallic nitride and/or oxynitride inclusions in metallic melts. The method includes the steps of labeling metallic nitride and/or oxynitride inclusions by making a coreduced metallic-hafnium sponge from a mixture of hafnium chloride and the chloride of a metal, reducing the mixed chlorides with magnesium, nitriding the hafnium-labeled metallic-hafnium sponge, and seeding the sponge to be melted with hafnium-labeled nitride inclusions. The ingots are neutron activated and the hafnium is located by radiometric means. Hafnium possesses exactly the proper metallurgical and radiochemical properties for this use.

White, Jack C. (Albany, OR); Traut, Davis E. (Corvallis, OR); Oden, Laurance L. (Albany, OR); Schmitt, Roman A. (Corvallis, OR)

1992-01-01T23:59:59.000Z

144

Available Technologies: Boron Nitride Nanotubes with Modified Surfaces  

Nano- & Micro-technology; Software and IT ; Licensing Interest Form Receive Customized Tech Alerts. Boron Nitride Nanotubes with Modified Surfaces . IB-2331 and IB-2332 .

145

Processing of Optically Translucent/Transparent Nitrides from ...  

Science Conference Proceedings (OSTI)

With the aim coupling good thermal conductivity with optical light transmission and emission, aluminum nitride with rare earth dopants (Gd2O3, Gd ,Dy etc.)...

146

Measurement of achievable plutonium decontamination from gallium by means of PUREX solvent extraction  

SciTech Connect

The objective of the work described herein was to measure, experimentally, the achievable decontamination of plutonium from gallium by means of the PUREX solvent extraction process. Gallium is present in surplus weapons-grade plutonium (WG-Pu) at a concentration of approximately 1 wt%. Plans are to dispose of surplus WG-Pu by converting it to UO{sub 2}-PuO{sub 2} mixed oxide (MOX) fuel and irradiating it in commercial power reactors. However, the presence of high concentrations of gallium in plutonium is a potential corrosion problem during the process of MOX fuel irradiation. The batch experiments performed in this study were designed to measure the capability of the PUREX solvent extraction process to separate gallium from plutonium under idealized conditions. Radioactive tracing of the gallium with {sup 72}Ga enabled the accurate measurement of low concentrations of extractable gallium. The experiments approximated the proposed flowsheet for WG-Pu purification, except that only one stage was used for each process: extraction, scrubbing, and stripping. With realistic multistage countercurrent systems, much more efficient separations are generally obtained. The gallium decontamination factor (DF) obtained after one extraction stage was about 3 x 10{sup 6}. After one scrub stage, all gallium measurements were less than the detection limit, which corresponded to DFs >5 x 10{sup 6}. All these values exceed a 10{sup 6} DF needed to meet a hypothetical 10-ppb gallium impurity limit in MOX fuel. The results of this study showed no inherent or fundamental problem with regard to removing gallium from plutonium.

Collins, E.D.; Campbell, D.O.; Felker, L.K.

2000-01-01T23:59:59.000Z

147

G3, Electrodeposition of Indium Sulfide Films from Organic Electrolytes  

Science Conference Proceedings (OSTI)

A6, Effect of Superlattices and Surfactants on AlN Homoepitaxy by MBE ... BB4, Formation and Templating of III-V Semiconductor Nanospikes by Focused ..... Reduction in Wafer Bonded n-GaAs / n-GaAs by Sulfur Passivation Methods .... U5, Band Edge Optical Transitions in Bulk GaSbN and InAsN Dilute-Nitride Materials.

148

Nitriding of super alloys for enhancing physical properties  

DOE Patents (OSTI)

The invention teaches the improvement of certain super alloys by exposing the alloy to an atmosphere of elemental nitrogen at elevated temperatures in excess of 750/sup 0/C but less than 1150/sup 0/C for an extended duration, viz., by nitriding the surface of the alloy, to establish barrier nitrides of the order of 25 to 100 micrometers thickness. These barrier

Purohit, A.

1984-06-25T23:59:59.000Z

149

III-Nitride LEDs with photonic crystal structures.  

SciTech Connect

Electrical operation of III-Nitride light emitting diodes (LEDs) with photonic crystal structures is demonstrated. Employing photonic crystal structures in III-Nitride LEDs is a method to increase light extraction efficiency and directionality. The photonic crystal is a triangular lattice formed by dry etching into the III-Nitride LED. A range of lattice constants is considered (a {approx} 270-340nm). The III-Nitride LED layers include a tunnel junction providing good lateral current spreading without a semi-absorbing metal current spreader as is typically done in conventional III-Nitride LEDs. These photonic crystal III-Nitride LED structures are unique because they allow for carrier recombination and light generation proximal to the photonic crystal (light extraction area) yet displaced from the absorbing metal contact. The photonic crystal Bragg scatters what would have otherwise been guided modes out of the LED, increasing the extraction efficiency. The far-field light radiation patterns are heavily modified compared to the typical III-Nitride LED's Lambertian output. The photonic crystal affects the light propagation out of the LED surface, and the radiation pattern changes with lattice size. LEDs with photonic crystals are compared to similar III-Nitride LEDs without the photonic crystal in terms of extraction, directionality, and emission spectra.

Wendt, Joel Robert; Sigalas, M. M. (Agilent Technologies, Palo Alto, CA); Epler, J. E. (Lumileds Lighting, San Jose, CA); Krames, M. R. (Lumileds Lighting, San Jose, CA); Li, D. (University of New Mexico, Albuquerque NM); Brueck, Stephen R. J. (University of New Mexico, Albuquerque NM); Shagam, M. (Boston University, Boston, MA); Gardner, N. F. (Lumileds Lighting, San Jose, CA); Wierer, Jonathan J. (Lumileds Lighting, San Jose, CA)

2005-02-01T23:59:59.000Z

150

Molybdenum enhanced low-temperature deposition of crystalline silicon nitride  

DOE Patents (OSTI)

A process for chemical vapor deposition of crystalline silicon nitride which comprises the steps of: introducing a mixture of a silicon source, a molybdenum source, a nitrogen source, and a hydrogen source into a vessel containing a suitable substrate; and thermally decomposing the mixture to deposit onto the substrate a coating comprising crystalline silicon nitride containing a dispersion of molybdenum silicide.

Lowden, Richard A. (Powell, TN)

1994-01-01T23:59:59.000Z

151

Oxidation Protection of Uranium Nitride Fuel using Liquid Phase Sintering  

SciTech Connect

Two methods are proposed to increase the oxidation resistance of uranium nitride (UN) nuclear fuel. These paths are: (1) Addition of USi{sub x} (e.g. U3Si2) to UN nitride powder, followed by liquid phase sintering, and (2) 'alloying' UN nitride with various compounds (followed by densification via Spark Plasma Sintering or Liquid Phase Sintering) that will greatly increase oxidation resistance. The advantages (high thermal conductivity, very high melting point, and high density) of nitride fuel have long been recognized. The sodium cooled BR-10 reactor in Russia operated for 18 years on uranium nitride fuel (UN was used as the driver fuel for two core loads). However, the potential advantages (large power up-grade, increased cycle lengths, possible high burn-ups) as a Light Water Reactor (LWR) fuel are offset by uranium nitride's extremely low oxidation resistance (UN powders oxidize in air and UN pellets decompose in hot water). Innovative research is proposed to solve this problem and thereby provide an accident tolerant LWR fuel that would resist water leaks and high temperature steam oxidation/spalling during an accident. It is proposed that we investigate two methods to increase the oxidation resistance of UN: (1) Addition of USi{sub x} (e.g. U{sub 3}Si{sub 2}) to UN nitride powder, followed by liquid phase sintering, and (2) 'alloying' UN nitride with compounds (followed by densification via Spark Plasma Sintering) that will greatly increase oxidation resistance.

Dr. Paul A. Lessing

2012-03-01T23:59:59.000Z

152

Process for producing ceramic nitrides anc carbonitrides and their precursors  

DOE Patents (OSTI)

A process for preparing ceramic nitrides and carbon nitrides in the form of very pure, fine particulate powder. Appropriate precursors is prepared by reaching a transition metal alkylamide with ammonia to produce a mixture of metal amide and metal imide in the form of an easily pyrolyzable precipitate.

Brown, G.M.; Maya, L.

1987-02-25T23:59:59.000Z

153

Atomic-level cotrol of the thermoelectric properties in polytypoid nanowires  

E-Print Network (OSTI)

an alloy of indium and gallium oxide. In the IGZO nanowireof 500-900 K for bulk indium zinc oxide (IZO, In 2 O 3 (ZnO)nanowires IZO and indium gallium zinc oxide (IGZO, In 2-x Ga

C.Andrews, Sean

2013-01-01T23:59:59.000Z

154

Microsoft PowerPoint - Gallium Oxide_Ramana  

NLE Websites -- All DOE Office Websites (Extended Search)

Gallium Oxide Nanostructures Gallium Oxide Nanostructures for High Temperature Sensors C.V. Ramana (PI) Evgeny Shafirovich (Co-PI) Mechanical Engineering, University of Texas at El Paso Students: Ernesto Rubio (PhD); S.K. Samala (MS) A.K. Narayana Swamy (PhD); K. Abhilash (MS) Program Manager: Richard Dunst, NETL, DOE Project: DE-FE0007225 Project Period: 10/01/2011 to 09/31/2014 1 06/12/2013 DOE UCR/HBCU Conference, June 11-13, 2013 2  Introduction  Research Objectives  Experiments ► Synthesis ► Characterization  Results and Discussion ► Pure Ga 2 O 3 Thin Films ► W-doped Ga 2 O 3 Thin Films (Physical Methods)  Summary & Future Work 06/12/2013 DOE UCR/HBCU Conference, June 11-13, 2013 3 06/12/2013 DOE UCR/HBCU Conference, June 11-13, 2013 4 Energy Systems High-T High-T High-P High-P

155

Gallium phosphide high-temperature bipolar junction transistor  

DOE Green Energy (OSTI)

Preliminary results are reported on the development of a high-temperature (> 350/sup 0/C) gallium phosphide bipolar junction transistor (BJT) for goethermal and other energy applications. This four-layer p/sup +/n/sup -/pp/sup +/ structure was fromed by liquid phase epitaxy using a supercooling technique to insure uniform nucleation of the thin layers. Magnesium was used as the p-type dopant to avoid excessive out-diffusion into the lightly doped base. By appropriate choice of electrodes, the device may also be driven as an n-channel junction field-effect transistor. The gallium phosphide BJT is observed to have a common-emitter current gain peaking in the range of 6 to 10 (for temperatures from 20/sup 0/C to 400/sup 0/C) and a room-temperature, punchthrough-limited, collector-emitter breakdown voltage of approximately -6V. Other parameters of interest include an f/sub/ = 400 KHz (at 20/sup 0/C) and a collector base leakage current = 200 ..mu..A (at 350/sup 0/C).

Zipperian, T.E.; Dawson, L.R.; Caffin, R.J.

1981-03-01T23:59:59.000Z

156

Highly Conductive Textured Molybdenum Doped Indium Oxide Thin Films  

DOE Green Energy (OSTI)

We report on the pulsed laser deposition (PLD) of Mo-doped indium oxide (IMO) films with mobilities of up to 125 cm2/Vsec. Films have been grown from targets with 1-4 wt.% molybdenum. The optimum electrical and optical properties were obtained with the 2% target and yielded a maximum conductivity of 3717 S/cm with mobilities of 99 cm2/V-sec on (100) yttria stabilized zirconia (YSZ) single crystal substrates. Films also exhibit greater than 90% transparency in the visible range. Compared to commercial indium tin oxide (ITO) films, these PLD-grown IMO films have similar conductivity but since they have substantially higher mobility they have a correspondingly lower carrier concentration. The lower carrier concentration should extend the infrared window of the transparency for films of the same conductivity. This may lead to improved performance in a number of applications requiring improved performance TCOs.

Warmsingh, C.; Yoshida, Y.; Readey, D.; Perkins, J.; Parilla, P.; Teplin, C.; Kaydanova, T.; Alleman, J.; Gedvilas, L.; Keyes, B.; Gessert, T.; Coutts, T.; Ginley, D.

2003-05-01T23:59:59.000Z

157

Titanium nitride thin films for minimizing multipactoring  

DOE Patents (OSTI)

Applying a thin film coating to the surface of a workpiece, in particular, applying a coating of titanium nitride to a klystron window by means of a crossed-field diode sputtering array. The array is comprised of a cohesive group of numerous small hollow electrically conducting cylinders and is mounted so that the open ends of the cylinders on one side of the group are adjacent a titanium cathode plate. The workpiece is mounted so as to face the open ends of the other side of the group. A magnetic field is applied to the array so as to be coaxial with the cylinders and a potential is applied across the cylinders and the cathode plate, the cylinders as an anode being positive with respect to the cathode plate. The cylinders, the cathode plate and the workpiece are situated in an atmosphere of nitrogen which becomes ionized such as by field emission because of the electric field between the cylinders and cathode plate, thereby establishing an anode-cathode discharge that results in sputtering of the titanium plate. The sputtered titanium coats the workpiece and chemically combines with the nitrogen to form a titanium nitride coating on the workpiece. Gas pressure, gas mixtures, cathode material composition, voltages applied to the cathode and anode, the magnetic field, cathode, anode and workpiece spacing, and the aspect ratio (ratio of length to inner diameter) of the anode cylinders, all may be controlled to provide consistent optimum thin film coatings of various compositions and thicknesses. Another facet of the disclosure is the coating of microwave components per se with titanium nitride to reduce multipactoring under operating conditions of the components.

Welch, Kimo M. (Mountain View, CA)

1979-01-01T23:59:59.000Z

158

Method for enhancing the solubility of boron and indium in silicon  

DOE Patents (OSTI)

A method for enhancing the equilibrium solubility of boron and indium in silicon. The method involves first-principles quantum mechanical calculations to determine the temperature dependence of the equilibrium solubility of two important p-type dopants in silicon, namely boron and indium, under various strain conditions. The equilibrium thermodynamic solubility of size-mismatched impurities, such as boron and indium in silicon, can be raised significantly if the silicon substrate is strained appropriately. For example, for boron, a 1% compressive strain raises the equilibrium solubility by 100% at 1100.degree. C.; and for indium, a 1% tensile strain at 1100.degree. C., corresponds to an enhancement of the solubility by 200%.

Sadigh, Babak (Oakland, CA); Lenosky, Thomas J. (Pleasanton, CA); Diaz de la Rubia, Tomas (Danville, CA); Giles, Martin (Hillsborough, OR); Caturla, Maria-Jose (Livermore, CA); Ozolins, Vidvuds (Pleasanton, CA); Asta, Mark (Evanston, IL); Theiss, Silva (St. Paul, MN); Foad, Majeed (Santa Clara, CA); Quong, Andrew (Livermore, CA)

2002-01-01T23:59:59.000Z

159

Hard and low friction nitride coatings and methods for forming the same  

DOE Patents (OSTI)

An improved coating material possessing super-hard and low friction properties and a method for forming the same. The improved coating material includes the use of a noble metal or soft metal homogeneously distributed within a hard nitride material. The addition of small amounts of such metals into nitrides such as molybdenum nitride, titanium nitride, and chromium nitride results in as much as increasing of the hardness of the material as well as decreasing the friction coefficient and increasing the oxidation resistance.

Erdemir, Ali (Naperville, IL); Urgen, Mustafa (Istanbul, TR); Cakir, Ali Fuat (Istanbul, TR); Eryilmaz, Osman Levent (Bolingbrook, IL); Kazmanli, Kursat (Istanbul, TR); Keles, Ozgul (Istanbul, TR)

2007-05-01T23:59:59.000Z

160

Limits on nu_e and anti-nu_e disappearance from Gallium and reactor experiments  

E-Print Network (OSTI)

The deficit observed in the Gallium radioactive source experiments is interpreted as a possible indication of the disappearance of electron neutrinos. In the effective framework of two-neutrino mixing we obtain $\\sin^{2}2\\vartheta \\gtrsim 0.03$ and $\\Delta{m}^{2} \\gtrsim 0.1 \\text{eV}^{2}$. The compatibility of this result with the data of the Bugey and Chooz reactor short-baseline antineutrino disappearance experiments is studied. It is found that the Bugey data present a hint of neutrino oscillations with $0.02 \\lesssim \\sin^{2}2\\vartheta \\lesssim 0.08$ and $\\Delta{m}^{2} \\approx 1.8 \\text{eV}^{2}$, which is compatible with the Gallium allowed region of the mixing parameters. This hint persists in the combined analyses of Bugey and Chooz data, of Gallium and Bugey data, and of Gallium, Bugey, and Chooz data.

Mario A. Acero; Carlo Giunti; Marco Laveder

2007-11-27T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
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161

The radiation bio-effects of gallum-72 on leukemic cells via a gallium-transferrin complex  

E-Print Network (OSTI)

Improved methods for treatment of leukemia would be advantageous for patients and the medical community. This thesis reports results of a study of the cytotoxicity of radiolabeled transferrin in cultured leukemic cells. K-562 cells, from an erythroleukemic cell line, were grown and growth curves were plotted for characterization. K-562 cells grew logarithmically from approximately 250,000 cells mL? to 700,000 cells mL? and display a doubling time of approximately 20-21 hours. K-562 cells were exposed to x rays at an absorbed dose of 0, 1, 2, and 4 gray. Growth curves were plotted to create a dose response curve. Percent-cell survival in this experiment, and all subsequent experiments, was determined based on the extrapolation of the growth curves to time zero, as compared to a control. An absorbed dose of 1, 2, and 4 gray corresponded to a survival of 77([]14)%, 45([]7.4)% and 20([]2.4)%, respectively. This cell line is relatively resistant to radiation. K-562 cells were exposed to a radioactive gallium-72/stable gallium nitrate mixture to determine the effect gallium-72 decay has on cell survival . Simultaneously, K-562 cells were exposed to a concentration of stable gallium nitrate equivalent to the total gallium concentration, radioactive and stable, of the gallium-72/stable gallium mixture. This allowed a comparison of radioactive and chemotoxic effects due to gallium-72 and stable gallium, respectively. Exposures to gallium-72, at an activity of 184.0 kBq mL?, and stable gallium nitrate, at a concentration of 116.7 []M, resulted in a cell survival of 61([]10.5)% and 75([]12. 1)%, respectively. The difference is small when error is taken into consideration. Therefore radioactivity had little effect on cell survival at a specific activity of 6.3 MBq mg?. To properly assess the cytotoxicity of gallium-72 the specific activity must be increased. To determine the effect of ape-transferrin on the cytotoxicity of gallium nitrate, K-562 cells were exposed to stable gallium nitrate and increasing amounts of apo-transferrin. Cells exposed to 115.0 []M gallium nitrate exhibited an 82([]8.8)% cell survival compared to 54([]6.9)% following exposure to 115.0 []M gallium nitrate and 3.75 []M apo-transferrin. Apo-transferrin presumably increases cellular uptake of gallium nitrate thereby increasing its cyctotoxic effects.

Forbes, Christen Douglas

1999-01-01T23:59:59.000Z

162

EMC 2005  

Science Conference Proceedings (OSTI)

... Indium Nitride: Growth, Processing, Characterization, Theory, and Devices; Spin-Dependent (or Spintronic) Electronic Materials; Dilute Nitride Semiconductors...

163

Cordierite silicon nitride filters. Final report  

SciTech Connect

The objective of this project was to develop a silicon nitride based crossflow filter. This report summarizes the findings and results of the project. The project was phased with Phase I consisting of filter material development and crossflow filter design. Phase II involved filter manufacturing, filter testing under simulated conditions and reporting the results. In Phase I, Cordierite Silicon Nitride (CSN) was developed and tested for permeability and strength. Target values for each of these parameters were established early in the program. The values were met by the material development effort in Phase I. The crossflow filter design effort proceeded by developing a macroscopic design based on required surface area and estimated stresses. Then the thermal and pressure stresses were estimated using finite element analysis. In Phase II of this program, the filter manufacturing technique was developed, and the manufactured filters were tested. The technique developed involved press-bonding extruded tiles to form a filter, producing a monolithic filter after sintering. Filters manufactured using this technique were tested at Acurex and at the Westinghouse Science and Technology Center. The filters did not delaminate during testing and operated and high collection efficiency and good cleanability. Further development in areas of sintering and filter design is recommended.

Sawyer, J.; Buchan, B. [Acurex Environmental Corp., Mountain View, CA (United States); Duiven, R.; Berger, M. [Aerotherm Corp., Mountain View, CA (United States); Cleveland, J.; Ferri, J. [GTE Products Corp., Towanda, PA (United States)

1992-02-01T23:59:59.000Z

164

Bright Lights and Even Brighter Ideas | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Bright Lights and Even Brighter Ideas Bright Lights and Even Brighter Ideas Bright Lights and Even Brighter Ideas July 3, 2013 - 2:04pm Addthis Kim Kisslinger, a researcher at Brookhaven Lab's Center for Functional Nanomaterials seen here with a focused-ion beam instrument, reduced the indium gallium nitride (InGaN) samples to a thickness of just 20 nanometers to prepare them for electron microscopy. | Photo courtesy of Brookhaven National Laboratory. Kim Kisslinger, a researcher at Brookhaven Lab's Center for Functional Nanomaterials seen here with a focused-ion beam instrument, reduced the indium gallium nitride (InGaN) samples to a thickness of just 20 nanometers to prepare them for electron microscopy. | Photo courtesy of Brookhaven National Laboratory. Charles Rousseaux Charles Rousseaux

165

Single event upsets in gallium arsenide dynamic logic  

SciTech Connect

The advantages and disadvantages of using gallium arsenide (GaAs) dynamic logic in computers and digital systems are briefly discussed, especially with respect to space applications. A short introduction to the topology and operation of GaAs Two-Phase Dynamic FET Logic (TDFL) circuits is presented. Experiments for testing the SEU sensitivity of GaAs TDFL, using a laser to create charge collection events, are described. Results are used to estimate the heavy-ion, soft error rate for TDFL in a spacecraft in geosynchronous orbit, and the dependence of the SEU sensitivity on clock frequency, clock voltage, and clock phase. Analysis of the data includes a comparison between the SEU sensitivities of TDFL and the more common static form of GaAs logic, Directly Coupled FET Logic (DCFL). This is the first reported SEU testing of GaAs dynamic logic.

Fouts, D.J. (Naval Postgraduate School, Monterey, CA (United States). ECE Dept.); Weatherford, T. (SFA Inc., Landover, MD (United States)); McMorrow, C.; Melinger, J.S.; Campbell, A.B. (Naval Research Lab., Washington, DC (United States))

1994-12-01T23:59:59.000Z

166

Coated gallium arsenide neutron detectors : results of characterizationmeasurements.  

DOE Green Energy (OSTI)

Effective detection of special nuclear materials (SNM) is essential for reducing the threat associated with stolen or improvised nuclear devices. Passive radiation detection technologies are primarily based on gamma-ray detection and subsequent isotope identification or neutron detection (specific to neutron sources and SNM). One major effort supported by the Department of Homeland Security in the area of advanced passive detection is handheld or portable neutron detectors for search and localization tasks in emergency response and interdiction settings. A successful SNM search detector will not only be able to confirm the presence of fissionable materials but also establish the location of the source in as short of time as possible while trying to minimize false alarms due to varying background or naturally occurring radioactive materials (NORM). For instruments based on neutron detectors, this translates to detecting neutrons from spontaneous fission or alpha-n reactions and being able to determine the direction of the source (or localizing the source through subsequent measurements). Polyethylene-coated gallium arsenide detectors were studied because the detection scheme is based on measuring the signal in the gallium arsenide wafers from the electrical charge of the recoil protons produced from the scattering of neutrons from the hydrogen nucleus. The inherent reaction has a directional dependence because the neutron and hydrogen nucleus have equivalent masses. The assessment and measurement of polyethylene-coated gallium arsenide detector properties and characteristics was the first phase of a project being performed for the Department of Homeland Security and the results of these tests are reported in this report. The ultimate goal of the project was to develop a man-portable neutron detection system that has the ability to determine the direction of the source from the detector. The efficiency of GaAs detectors for different sizes of polyethylene layers and different angles between the detector and the neutron source were determined. Preliminary measurements with a neutron generator based on a deuterium-tritium reaction ({approx}14 MeV neutrons) were performed and the results are discussed. This report presents the results of these measurements in terms of efficiency and angular efficiency and compares them to Monte Carlo calculations to validate the calculation scheme in view of further applications. Based on the results of this study, the polyethylene-coated gallium arsenide detectors provide adequate angular resolution based on proton recoil detection from the neutron scattering reaction from hydrogen. However, the intrinsic efficiency for an individual detector is extremely low. Because of this low efficiency, large surface area detectors ( or a large total surface area from many small detectors) would be required to generate adequate statistics to perform directional detection in near-real time. Large surface areas could be created by stacking the detector wafers with only a negligible attenuation of source neutrons. However, the cost of creating such a large array of GaAs is cost-prohibitive at this time.

Klann, R. T.; Perret, G.; Sanders, J.

2006-09-29T23:59:59.000Z

167

High-Temperature Decomposition of Brnsted Acid Sites in Gallium-Substituted Zeolites  

SciTech Connect

The dehydroxylation of Broensted acid sites (BAS) in Ga-substituted zeolites was investigated at temperatures up to 850 C using X-ray absorption spectroscopy (XAS), Fourier transform infrared spectroscopy (FTIR), and mass spectrometry-temperature programmed desorption (MS-TPD). X-ray absorption near-edge spectroscopy (XANES) revealed that the majority of gallium has tetrahedral coordination even after complete dehydroxylation. The interatomic gallium-oxygen distance and gallium coordination number determined by extended X-ray absorption fine structure (EXAFS) are consistent with gallium in tetrahedral coordination at low T (< 550 C). Upon heating Ga-Beta and Ga-ZSM5 to 850 C, analysis of the EXAFS showed that 70 and 80% of the gallium was still in tetrahedral coordination. The remainder of the gallium was found to be in octahedral coordination. No trigonal Ga atoms were observed. FTIR measurements carried out at similar temperatures show that the intensity of the OH vibration due to BAS has been eliminated. MS-TPD revealed that hydrogen in addition to water evolved from the samples during dehydroxylation. This shows that dehydrogenation in addition to dehydration is a mechanism that contributes to BAS decomposition. Dehydrogenation was further confirmed by exposing the sample to hydrogen to regenerate some of the BAS as monitored by FTIR and MS-TPD.

K Al-majnouni; N Hould; W Lonergan; D Vlachos; R Lobo

2011-12-31T23:59:59.000Z

168

Study of liquid gallium at high pressure using synchrotron x-ray  

SciTech Connect

Liquid gallium has been studied at high pressure up to 2 GPa and ambient temperature in a diamond anvil cell using high energy synchrotron x-ray beam. The total x-ray scattering data of liquid gallium were collected up to Q = 12 A{sup -1} and analyzed using pair distribution functions (PDF). The results indicate that the first nearest neighbor peak and second nearest neighbor (shoulder) peak of PDF in liquid gallium does not change with pressure, whereas the higher order (i.e., third and fourth) nearest neighbor peaks shift towards shorter distance with increasing pressure. Reverse Monte Carlo modeling based on the observed data shows that the coordination number in the liquid gallium increases with pressure from 10.5 at 0.3 GPa to 11.6 at 2 GPa. An atomic arrangement similar to the crystalline phase of Ga(II) with coordination number of 12 is proposed for the locally dense-packed rigid unit in liquid gallium. The volume compression data derived from the structure modeling yield a bulk modulus of 12.1(6) GPa for liquid gallium.

Yu, Tony; Guo Quanzhong; Parise, John [Department of Geosciences, Mineral Physics Institute, Stony Brook University, Stony Brook, New York 11794-2100 (United States); Chen Jiuhua [Department of Geosciences, Mineral Physics Institute, Stony Brook University, Stony Brook, New York 11794-2100 (United States); Department of Mechanical and Materials Engineering, Center for the Study of Matters at Extreme Conditions, Florida International University, Miami, Florida 33199 (United States); Ehm, Lars [Department of Geosciences, Mineral Physics Institute, Stony Brook University, Stony Brook, New York 11794-2100 (United States); National Synchrotron Light Source, Brookhaven National Laboratory, Upton, New York 11973-5000 (United States); Huang Shu [Department of Mechanical and Materials Engineering, Center for the Study of Matters at Extreme Conditions, Florida International University, Miami, Florida 33199 (United States); Luo Shengnian [Physics Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

2012-06-01T23:59:59.000Z

169

High efficiency III-nitride light-emitting diodes  

DOE Patents (OSTI)

Tailored doping of barrier layers enables balancing of the radiative recombination among the multiple-quantum-wells in III-Nitride light-emitting diodes. This tailored doping enables more symmetric carrier transport and uniform carrier distribution which help to reduce electron leakage and thus reduce the efficiency droop in high-power III-Nitride LEDs. Mitigation of the efficiency droop in III-Nitride LEDs may enable the pervasive market penetration of solid-state-lighting technologies in high-power lighting and illumination.

Crawford, Mary; Koleske, Daniel; Cho, Jaehee; Zhu, Di; Noemaun, Ahmed; Schubert, Martin F; Schubert, E. Fred

2013-05-28T23:59:59.000Z

170

Iron-Nitride Alloy Magnets: Transformation Enabled Nitride Magnets Absent Rare Earths (TEN Mare)  

Science Conference Proceedings (OSTI)

REACT Project: Case Western is developing a highly magnetic iron-nitride alloy to use in the magnets that power electric motors found in EVs and renewable power generators. This would reduce the overall price of the motor by eliminating the expensive imported rare earth minerals typically found in todays best commercial magnets. The iron-nitride powder is sourced from abundant and inexpensive materials found in the U.S. The ultimate goal of this project is to demonstrate this new magnet system, which contains no rare earths, in a prototype electric motor. This could significantly reduce the amount of greenhouse gases emitted in the U.S. each year by encouraging the use of clean alternatives to oil and coal.

None

2012-01-01T23:59:59.000Z

171

Investigation of post-annealing indium tin oxide for future electro-optical device application  

Science Conference Proceedings (OSTI)

The nanostructure transformation associated with electro-optical properties via post-annealing of indium tin oxide film (ITO) is investigated by increasing post-annealing temperature in ambient oxygen. Although oxygen vacancy and activation Sn ions contribute ... Keywords: Burstein-Moss effect, indium tin oxide film (ITO), oxygen vacancy, photoluminescence, post-annealing

Ching-Yuan Ho; Tse-Yi Tu; Chun-Chieh Wang; Yuan Kang

2011-05-01T23:59:59.000Z

172

Processing and characterization of silicon nitride nanofiber paper  

Science Conference Proceedings (OSTI)

Papers of silicon nitride nanofibers were synthesized by a carbothermal reduction process. These nanofiber papers were synthesized in situ and did not require a secondary processing step. The process utilized silica nanopowders and silica gel as the ...

Kei-Peng Jen, Ronald Warzoha, Ji Guo, Michael Tang, Sridhar Santhanam

2013-01-01T23:59:59.000Z

173

Studies on Plasma Surface Nitriding of Interstitial Free Steel  

Science Conference Proceedings (OSTI)

Plasma nitriding has been carried out at an applied pressure of 5 mbar using a gas mixture of nitrogen (20 %) and hydrogen (80 %) at 450oC for 1-5 h.

174

Photocapacitance spectroscopy of surface states on indium phosphide photoelectrodes  

SciTech Connect

Indium phosphide photoelectrodes have been studied in situ using electrochemical photocapacitance spectroscopy. The observed photocapacitance spectra were a strong function of electrode surface conditions. The photoionization energies of the chemically induced surface states correlated well with previously reported values determined by surface photovoltage spectroscopy. The chemical treatment of the InP electrode surface with Co and Pt reduced the concentration of deep level interface states near the valence band and introduced a new state at E/sub v/+1.2 eV.

Goodman, C.E.; Wessels, B.W.; Ang, P.G.P.

1984-08-15T23:59:59.000Z

175

Molybdenum enhanced low-temperature deposition of crystalline silicon nitride  

DOE Patents (OSTI)

A process for chemical vapor deposition of crystalline silicon nitride is described which comprises the steps of: introducing a mixture of a silicon source, a molybdenum source, a nitrogen source, and a hydrogen source into a vessel containing a suitable substrate; and thermally decomposing the mixture to deposit onto the substrate a coating comprising crystalline silicon nitride containing a dispersion of molybdenum silicide. 5 figures.

Lowden, R.A.

1994-04-05T23:59:59.000Z

176

Low-loss binder for hot pressing boron nitride  

DOE Patents (OSTI)

This report describes an invention utilizing Borazine derivatives as low-loss binders and precursors for making ceramic boron nitirde structures. The derivative forms the same composition as the boron nitride starting material, thereby filling the voids with the same boron nitride material upon forming and hot pressing. The derivatives have a further advantage of being low in carbon thus resulting in less volatile byproduct that can result in bubble formation during pressing.

Maya, L.

1989-06-02T23:59:59.000Z

177

Indium-Gallium Segregation in CuIn$_{x}$Ga$_{1-x}$Se$_2$: An ab initio based Monte Carlo Study  

E-Print Network (OSTI)

Thin-film solar cells with CuIn$_x$Ga$_{1-x}$Se$_2$ (CIGS) absorber are still far below their efficiency limit, although lab cells reach already 19.9%. One important aspect is the homogeneity of the alloy. Large-scale simulations combining Monte Carlo and density functional calculations show that two phases coexist in thermal equilibrium below room temperature. Only at higher temperatures, CIGS becomes more and more a homogeneous alloy. A larger degree of inhomogeneity for Ga-rich CIGS persists over a wide temperature range, which may contribute to the low observed efficiency of Ga-rich CIGS solar cells.

Ludwig, Christian D R; Felser, Claudia; Schilling, Tanja; Windeln, Johannes; Kratzer, Peter

2010-01-01T23:59:59.000Z

178

Feasibility of breeding in hard spectrum boiling water reactors with oxide and nitride fuels  

E-Print Network (OSTI)

This study assesses the neutronic, thermal-hydraulic, and fuel performance aspects of using nitride fuel in place of oxides in Pu-based high conversion light water reactor designs. Using the higher density nitride fuel ...

Feng, Bo, Ph. D. Massachusetts Institute of Technology

2011-01-01T23:59:59.000Z

179

Electron backscatter diffraction of plutonium-gallium alloys  

Science Conference Proceedings (OSTI)

At Los Alamos National Laboratory a recent experimental technique has been developed to characterize reactive metals, including plutonium arid cerium, using electron backscatter diffraction (EBSD). Microstructural characterization of plutonium and its alloys by EBSD had been previously elusive primarily because of the extreme toxicity and rapid surface oxidation rate associated with plutonium metal. The experimental techniques, which included ion-sputtering the metal surface using a scanning auger microprobe (SAM) followed by vacuum transfer of the sample from the SAM to the scanning electron microscope (SEM), used to obtain electron backscatter diffraction Kikuchi patterns (EBSPs) and orientation maps for plutonium-gallium alloys are described and the initial microstructural observations based on the analysis are discussed. Combining the SEM and EBSD observations, the phase transformation behavior between the {delta} and {var_epsilon} structures was explained. This demonstrated sample preparation and characterization technique is expected to be a powerful means to further understand phase transformation behavior, orientation relationships, and texlure in the complicated plutonium alloy systems.

Boehlert, C. J. (Carl J.); Zocco, T. G. (Thomas G.); Schulze, R. K. (Roland K.); Mitchell, J. N. (Jeremy N.); Pereyra, R. A. (Ramiro A.)

2002-01-01T23:59:59.000Z

180

Method for restoring the resistance of indium oxide semiconductors after heating while in sealed structures  

DOE Patents (OSTI)

A method is described for counteracting increases in resistivity encountered when Indium Oxide resistive layers are subjected to high temperature annealing steps during semiconductor device fabrication. The method utilizes a recovery annealing step which returns the Indium Oxide layer to its original resistivity after a high temperature annealing step has caused the resistivity to increase. The recovery anneal comprises heating the resistive layer to a temperature between 100 C and 300 C for a period of time that depends on the annealing temperature. The recovery is observed even when the Indium Oxide layer is sealed under a dielectric layer. 1 fig.

Seager, C.H.; Evans, J.T. Jr.

1998-11-24T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


181

Method for restoring the resistance of indium oxide semiconductors after heating while in sealed structures  

DOE Patents (OSTI)

A method for counteracting increases in resistivity encountered when Indium Oxide resistive layers are subjected to high temperature annealing steps during semiconductor device fabrication. The method utilizes a recovery annealing step which returns the Indium Oxide layer to its original resistivity after a high temperature annealing step has caused the resistivity to increase. The recovery anneal comprises heating the resistive layer to a temperature between 100.degree. C. and 300.degree. C. for a period of time that depends on the annealing temperature. The recovery is observed even when the Indium Oxide layer is sealed under a dielectric layer.

Seager, Carleton H. (1304 Onava Ct., NE., Albuquerque, NM 87112); Evans, Jr., Joseph Tate (13609 Verbena Pl., NE., Albuquerque, NM 87112)

1998-01-01T23:59:59.000Z

182

Cavitation contributes substantially to tensile creep in silicon nitride  

Science Conference Proceedings (OSTI)

During tensile creep of a hot isostatically pressed (HIPed) silicon nitride, the volume fraction of cavities increases linearly with strain; these cavities produce nearly all of the measured strain. In contrast, compressive creep in the same stress and temperature range produces very little cavitation. A stress exponent that increases with stress ({dot {var_epsilon}} {proportional_to} {sigma}{sup n}, 2 < n < 7) characterizes the tensile creep response, while the compressive creep response exhibits a stress dependence of unity. Furthermore, under the same stress and temperature, the material creeps nearly 100 times faster in tension than in compression. Transmission electron microscopy (TEM) indicates that the cavities formed during tensile creep occur in pockets of residual crystalline silicate phase located at silicon nitride multigrain junctions. Small-angle X-ray scattering (SAXS) from crept material quantifies the size distribution of cavities observed in TEM and demonstrates that cavity addition, rather than cavity growth, dominates the cavitation process. These observations are in accord with a model for creep based on the deformation of granular materials in which the microstructure must dilate for individual grains t slide past one another. During tensile creep the silicon nitride grains remain rigid; cavitation in the multigrain junctions allows the silicate to flow from cavities to surrounding silicate pockets, allowing the dilation of the microstructure and deformation of the material. Silicon nitride grain boundary sliding accommodates this expansion and leads to extension of the specimen. In compression, where cavitation is suppressed, deformation occurs by solution-reprecipitation of silicon nitride.

Luecke, W.E.; Wiederhorn, S.M.; Hockey, B.J.; Krause, R.F. Jr.; Long, G.G. [National Institute of Standards and Technology, Gaithersburg, MD (United States)

1995-08-01T23:59:59.000Z

183

Device performance of in situ steam generated gate dielectric nitrided by remote plasma nitridation  

Science Conference Proceedings (OSTI)

In situ steam generated (ISSG) oxides have recently attracted interest for use as gate dielectrics because of their demonstrated reliability improvement over oxides formed by dry oxidation. [G. Minor, G. Xing, H. S. Joo, E. Sanchez, Y. Yokota, C. Chen, D. Lopes, and A. Balakrishna, Electrochem. Soc. Symp. Proc. 99-10, 3 (1999); T. Y. Luo, H. N. Al-Shareef, G. A. Brown, M. Laughery, V. Watt, A. Karamcheti, M. D. Jackson, and H. R. Huff, Proc. SPIE 4181, 220 (2000).] We show in this letter that nitridation of ISSG oxide using a remote plasma decreases the gate leakage current of ISSG oxide by an order of magnitude without significantly degrading transistor performance. In particular, it is shown that the peak normalized transconductance of n-channel devices with an ISSG oxide gate dielectric decreases by only 4% and the normalized drive current by only 3% after remote plasma nitridation (RPN). In addition, it is shown that the reliability of the ISSG oxide exhibits only a small degradation after RPN. These observations suggest that the ISSG/RPN process holds promise for gate dielectric applications. {copyright} 2001 American Institute of Physics.

Al-Shareef, H. N.; Karamcheti, A.; Luo, T. Y.; Bersuker, G.; Brown, G. A.; Murto, R. W.; Jackson, M. D.; Huff, H. R.; Kraus, P.; Lopes, D. (and others)

2001-06-11T23:59:59.000Z

184

Effect of magnetic field on the mechanical properties of magnetostrictive iron-gallium nanowires  

SciTech Connect

This study experimentally investigates the elastic properties of individual iron-gallium nanowires with and without an applied magnetic bias field. The experiments were conducted with a custom manipulator stage designed for use within a scanning electron microscope, where nanowires were mechanically tested both statically and dynamically. Experiments were also performed in the presence of a 20 Oe dc magnetic field in order to identify any variation in wire properties. The results suggest that iron-gallium nanowires possess an elastic modulus very similar to the macroscale value, tensile strengths of more than double the bulk material, and minor magnetic field induced stiffening at low stresses.

Downey, Patrick R.; Flatau, Alison B. [Department of Aerospace Engineering, University of Maryland, 3181 Martin Hall, College Park, Maryland 20742 (United States); McGary, Patrick D.; Stadler, Bethanie J. H. [Department of Electrical and Computer Engineering, University of Minnesota, 200 Union St., Minneapolis, Minnesota 55455 (United States)

2008-04-01T23:59:59.000Z

185

Cooled silicon nitride stationary turbine vane risk reduction. Final report  

SciTech Connect

The purpose of this program was to reduce the technical risk factors for demonstration of air cooled silicon nitride turbine vanes. The effort involved vane prototype fabrication efforts at two U.S. based gas turbine grade silicon nitride component manufacturers. The efficacy of the cooling system was analyzed via a thermal time/temperature flow test technique previously at UTRC. By having multiple vendors work on parts fabrication, the chance of program success increased for producing these challenging components. The majority of the effort under this contract focused on developing methods for, and producing, the complex thin walled silicon nitride vanes. Components developed under this program will undergo engine environment testing within N00014-96-2-0014.

Holowczak, John

1999-12-31T23:59:59.000Z

186

Silicon nitride protective coatings for silvered glass mirrors  

DOE Patents (OSTI)

A protective diffusion barrier for metalized mirror structures is provided by a layer or coating of silicon nitride which is a very dense, transparent, dielectric material that is impervious to water, alkali, and other impurities and corrosive substances that typically attack the metal layers of mirrors and cause degradation of the mirrors' reflectivity. The silicon nitride layer can be deposited on the substrate prior to metal deposition thereon to stabilize the metal/substrate interface, and it can be deposited over the metal to encapsulate it and protect the metal from corrosion or other degradation. Mirrors coated with silicon nitride according to this invention can also be used as front surface mirrors.

Tracy, C.E.; Benson, D.K.

1984-07-20T23:59:59.000Z

187

Synthesis and Optimization of the Sintering Kinetics of Actinide Nitrides  

SciTech Connect

Research conducted for this NERI project has advanced the understanding and feasibility of nitride nuclear fuel processing. In order to perform this research, necessary laboratory infrastructure was developed; including basic facilities and experimental equipment. Notable accomplishments from this project include: the synthesis of uranium, dysprosium, and cerium nitrides using a novel, low-cost mechanical method at room temperature; the synthesis of phase pure UN, DyN, and CeN using thermal methods; and the sintering of UN and (Ux, Dy1-x)N (0.7 ? X ? 1) pellets from phase pure powder that was synthesized in the Advanced Materials Laboratory at Boise State University.

Drryl P. Butt; Brian Jaques

2009-03-31T23:59:59.000Z

188

Preconceptual design for separation of plutonium and gallium by ion exchange  

SciTech Connect

The disposition of plutonium from decommissioned nuclear weapons, by incorporation into commercial UO{sub 2}-based nuclear reactor fuel, is a viable means to reduce the potential for theft of excess plutonium. This fuel, which would be a combination of plutonium oxide and uranium oxide, is referred to as a mixed oxide (MOX). Following power generation in commercial reactors with this fuel, the remaining plutonium would become mixed with highly radioactive fission products in a spent fuel assembly. The radioactivity, complex chemical composition, and large size of this spent fuel assembly, would make theft difficult with elaborate chemical processing required for plutonium recovery. In fabricating the MOX fuel, it is important to maintain current commercial fuel purity specifications. While impurities from the weapons plutonium may or may not have a detrimental affect on the fuel fabrication or fuel/cladding performance, certifying the effect as insignificant could be more costly than purification. Two primary concerns have been raised with regard to the gallium impurity: (1) gallium vaporization during fuel sintering may adversely affect the MOX fuel fabrication process, and (2) gallium vaporization during reactor operation may adversely affect the fuel cladding performance. Consequently, processes for the separation of plutonium from gallium are currently being developed and/or designed. In particular, two separation processes are being considered: (1) a developmental, potentially lower cost and lower waste, thermal vaporization process following PuO{sub 2} powder preparation, and (2) an off-the-shelf, potentially higher cost and higher waste, aqueous-based ion exchange (IX) process. While it is planned to use the thermal vaporization process should its development prove successful, IX has been recommended as a backup process. This report presents a preconceptual design with material balances for separation of plutonium from gallium by IX.

DeMuth, S.F.

1997-09-30T23:59:59.000Z

189

BORON NITRIDE CAPACITORS FOR ADVANCED POWER ELECTRONIC DEVICES  

DOE Green Energy (OSTI)

This project fabricates long-life boron nitride/boron oxynitride thin film -based capacitors for advanced SiC power electronics with a broad operating temperature range using a physical vapor deposition (PVD) technique. The use of vapor deposition provides for precise control and quality material formation.

N. Badi; D. Starikov; C. Boney; A. Bensaoula; D. Johnstone

2010-11-01T23:59:59.000Z

190

Continuous Fiber Ceramic Composite (CFCC) Program: Gaseous Nitridation  

SciTech Connect

Textron has developed a mature process for the fabrication of continuous fiber ceramic composite (CFCC) tubes for application in the aluminum processing and casting industry. The major milestones in this project are System Composition; Matrix Formulation; Preform Fabrication; Nitridation; Material Characterization; Component Evaluation

R. Suplinskas G. DiBona; W. Grant

2001-10-29T23:59:59.000Z

191

Evaluation and silicon nitride internal combustion engine components  

DOE Green Energy (OSTI)

The feasibility of silicon nitride (Si[sub 3]N[sub 4]) use in internal combustion engines was studied by testing three different components for wear resistance and lower reciprocating mass. The information obtained from these preliminary spin rig and engine tests indicates several design changes are necessary to survive high-stress engine applications. The three silicon nitride components tested were valve spring retainers, tappet rollers, and fuel pump push rod ends. Garrett Ceramic Components' gas-pressure sinterable Si[sub 3]N[sub 4] (GS-44) was used to fabricate the above components. Components were final machined from densified blanks that had been green formed by isostatic pressing of GS-44 granules. Spin rig testing of the valve spring retainers indicated that these Si[sub 3]N[sub 4] components could survive at high RPM levels (9,500) when teamed with silicon nitride valves and lower spring tension than standard titanium components. Silicon nitride tappet rollers showed no wear on roller O.D. or I.D. surfaces, steel axles and lifters; however, due to the uncrowned design of these particular rollers the cam lobes indicated wear after spin rig testing. Fuel pump push rod ends were successful at reducing wear on the cam lobe and rod end when tested on spin rigs and in real-world race applications.

Voldrich, W. (Allied-Signal Aerospace Co., Torrance, CA (United States). Garrett Ceramic Components Div.)

1992-04-01T23:59:59.000Z

192

Boron nitride substrates for high-quality graphene electronics  

E-Print Network (OSTI)

Boron nitride substrates for high-quality graphene electronics C. R. Dean1,2 *, A. F. Young3 , I and J. Hone2 * Graphene devices on standard SiO2 substrates are highly disor- dered, exhibiting report the fabrication and characterization of high-quality exfoliated mono- and bilayer graphene devices

Shepard, Kenneth

193

Boron nitride substrates for high-quality graphene electronics  

E-Print Network (OSTI)

(right axis) versus gate voltage at B ¼ 14 T (solid line) and 8.5 T (dashed line) for monolayer grapheneBoron nitride substrates for high-quality graphene electronics C. R. Dean1,2 *, A. F. Young3 , I and J. Hone2 * Graphene devices on standard SiO2 substrates are highly disor- dered, exhibiting

Kim, Philip

194

Gated Conductance of Thin Indium Tin Oxide - The Simplest Transistor  

E-Print Network (OSTI)

Transistors are the fundamental building block of modern electronic devices. So far, all transistors are based on various types of semiconductor junctions. The most common bipolar-junction transistors and metal-oxide-semiconductor field-effect transistors contain p-n junctions to control the current, depending on applied biases across the junctions. Thin-film transistors need metal-semiconductor junctions for injecting and extracting electrons from their channels. Here, by coating a heavily-doped thin indium-tin-oxide (ITO) film through a shadow mask onto a biopolymer chitosan/ITO/glass substrate, we can have a high-performance junctionless transparent organic-inorganic hybrid thin film transistor. This could be the simplest transistor in the world, to our knowledge, not only in its structure, but also its fabrication process. In addition, the device performance is found to be greatly enhanced using a reinforced chitosan/SiO2 hybrid bilayer dielectric stack. Our results clearly show that this architecture can...

Jiang, Jie; Sun, Jia; Dou, Wei; Zhang, Qing

2012-01-01T23:59:59.000Z

195

Adsorption of collagen to indium oxide nanoparticles and infrared emissivity study thereon  

SciTech Connect

Adsorption of collagen to indium oxide nanoparticles was carried out in water-acetone solution at volumetric ratio of 1:1 with pH value varying from 3.2 to 9.3. As indicated by TGA, maximum collagen adsorption to indium oxide nanoparticles occurred at pH of 3.2. It was proposed that noncovalent interactions such as hydrogen bonding, hydrophilic and electrostatic interactions made main contributions to collagen adsorption. The IR emissivity values (8-14 {mu}m) of collagen-adsorbed indium oxide nanoparticles decreased significantly compared to either pure collagen or indium oxide nanoparticles possibly due to the interfacial interactions between collagen and indium oxide nanoparticles. And the lowest infrared emissivity value of 0.587 was obtained at collagen adsorption of 1.94 g/100 g In{sub 2}O{sub 3}. On the chance of improved compatibility with organic adhesives, the chemical activity of adsorbed collagen was further confirmed by grafting copolymerization with methyl methacrylate by formation of polymer shell outside, as evidenced by IR spectrum and transmission electron microscopy.

Zhou Yuming [School of Chemistry and Chemical Engineering, Southeast University, Nanjing 211189 (China)], E-mail: fchem@seu.edu.cn; Shan Yun; Sun Yanqing [School of Chemistry and Chemical Engineering, Southeast University, Nanjing 211189 (China); Ju Huangxian [School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093 (China)

2008-08-04T23:59:59.000Z

196

Available Technologies - Lawrence Berkeley National Laboratory  

Advanced Materials; Biofuels; ... alternative semiconductor materials to be ... (copper indium gallium selenide) have potential, but their raw material sources are ...

197

Ammothermal Growth of Gan Substrates For Leds: High-Pressure Ammonothermal Process for Bulk Gallium Nitride Crystal Growth for Energy Efficient Commercially Competitive Lighting  

Science Conference Proceedings (OSTI)

Broad Funding Opportunity Announcement Project: The new GaN crystal growth method is adapted from that used to grow quartz crystals, which are very inexpensive and represent the second-largest market for single crystals for electronic applications (after silicon). More extreme conditions are required to grow GaN crystals and therefore a new type of chemical growth chamber was invented that is suitable for large-scale manufacturing. A new process was developed that grows GaN crystals at a rate that is more than double that of current processes. The new technology will enable GaN substrates with best-in-world quality at lowest-in-world prices, which in turn will enable new generations of white LEDs, lasers for full-color displays, and high-performance power electronics.

None

2011-01-01T23:59:59.000Z

198

Highly conductive indium zinc oxide prepared by reactive magnetron cosputtering technique using indium and zinc metallic targets  

SciTech Connect

Zn-doped In{sub 2}O{sub 3} film is frequently deposited from an oxide target; but the use of metallic target is increasingly expected as preparing the film with comparable properties. This work aimed to prepare a highly conductive and transparent Zn-doped In{sub 2}O{sub 3} thin film on Corning Eagle{sup 2000} glass substrate by magnetron cosputtering method using indium and zinc targets. Structural characterization was performed using x-ray diffraction and x-ray photoelectron spectroscopy. The film had an amorphous structure when the film was prepared on an unheated substrate, but had an In{sub 2}O{sub 3} polycrystalline structure when the film was deposited on 150 and 300 deg. C substrates. The electrical properties of the film were greatly affected by annealing; the Zn-doped In{sub 2}O{sub 3} film had a low resistivity of 6.1x10{sup -4} {Omega} cm and an average transmittance of 81.7% when the film was deposited without substrate heating and followed a 600 deg. C annealing.

Tsai, T. K.; Chen, H. C.; Lee, J. H.; Huang, Y. Y.; Fang, J. S. [Department of Materials Science and Engineering, National Formosa University, Huwei, Yunlin 632, Taiwan (China); LinCo Technology, Taichung 407, Taiwan (China); Department of Materials Science and Engineering, National Formosa University, Huwei, Yunlin 632, Taiwan (China)

2010-05-15T23:59:59.000Z

199

Effect of Ag thickness on electrical transport and optical properties of indium tin oxide-Ag-indium tin oxide multilayers  

SciTech Connect

We report the dependence of electronic and optical properties on the Ag thickness in transparent conductive indium tin oxide (ITO)-Ag-ITO (IMI) multilayer films deposited on polyethylene naphthalate flexible substrate by sputtering at room temperature. The electrical properties (such as carrier concentration, mobility, and resistivity) changed significantly with incorporation of Ag between the ITO layers. Comparison of sheet resistance of the IMI multilayers and the calculated sheet resistance of the Ag midlayer indicates that most of the conduction is through the Ag film. The critical thickness of Ag to form a continuous conducting layer is found to be 8 nm using electrical and optical analysis. A conduction mechanism is proposed to elucidate the mobility variation with increased Ag thickness. Carrier transport is limited by either interface scattering or grain-boundary scattering depending on the thickness of the Ag midlayer. Interface scattering is dominant for thinner (5.5-7 nm) Ag and grain-boundary scattering is dominant for thicker (8-10.5 nm) Ag midlayers. In addition, the effect of varying Ag midlayer thickness on transmittance behavior is also discussed. A figure of merit is used to compare performance of the IMI multilayer systems as a function of Ag thickness.

Indluru, A.; Alford, T. L. [School of Materials and Flexible Display Center, Arizona State University, Tempe, Arizona 85287 (United States)

2009-06-15T23:59:59.000Z

200

Preparation and properties of electrically conducting ceramics based on indium oxide-rare earth oxides-hafnium oxides  

DOE Green Energy (OSTI)

Electrically conducting refractory oxides based on adding indium oxide to rare earth-stabilized hafnium oxide are being studied for use in magnetohydrodynamic (MHD) generators, fuel cells, and thermoelectric generators. The use of indium oxide generally increases the electrical conductivity. The results of measurements of the electrical conductivity and data on corrosion resistance in molten salts are presented.

Marchant, D.D.; Bates, J.L.

1983-09-01T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


201

Pulsed-magnetron-sputtered low-temperature indium tin oxide films for flat-panel display applications  

Science Conference Proceedings (OSTI)

In this paper, indium tin oxide (ITO) thin films were prepared by unipolar and bipolar direct current (DC)-pulsed magnetron sputtering in a mixture of argon and oxygen onto unheated glass substrates. The target of ITO with 10 wt.% tin is used. The influences ... Keywords: DC-pulsed magnetron sputtering, Indium tin oxide, electrical and optical properties

William J. Lee; Yean-Kuen Fang; Jyh-Jier Ho; Chin-Ying Chen; Rung-Ywan Tsai; Daoyang Huang; Fang C. Ho; H. W. Chou; C. C. Chen

2002-02-01T23:59:59.000Z

202

Detection and classification of volatile organic compounds using Indium Tin Oxide sensor array and artificial neural network  

Science Conference Proceedings (OSTI)

This article reveals the novel approach of fabricating Indium Tin Oxide thin films grown on glass substrate at 648 K temperatures using direct evaporation method for detection of small concentration volatile organic compounds (VOCs) and their ... Keywords: ANNs, ITO thin films, VOC mixtures, VOCs, artificial neural networks, direct evaporation, indium tin oxide, sensor arrays, thin film sensors, volatile organic compounds

H. J. Pandya

2009-05-01T23:59:59.000Z

203

Optical investigations on indium oxide nano-particles prepared through precipitation method  

Science Conference Proceedings (OSTI)

Visible light emitting indium oxide nanoparticles were synthesized by precipitation method. Sodium hydroxide dissolved in ethanol was used as a precipitating agent to obtain indium hydroxide precipitates. Precipitates, thus formed were calcined at 600 deg. C for 1 h to obtain indium oxide nanoparticles. The structure of the particles as determined from the X-Ray diffraction pattern was found to be body centered cubic. The phase transformation of the prepared nanoparticles was analyzed using thermogravimetry. Surface morphology of the prepared nanoparticles was analyzed using high resolution-scanning electron microscopy and transmission electron microscopy. The results of the analysis show cube-like aggregates of size around 50 nm. It was found that the nanoparticles have a strong emission at 427 nm and a weak emission at 530 nm. These emissions were due to the presence of singly ionized oxygen vacancies and the nature of the defect was confirmed through Electron paramagnetic resonance analysis.

Seetha, M.; Bharathi, S.; Dhayal Raj, A. [Thin film and Nanomaterials Laboratory, Department of Physics, Bharathiar University, Coimbatore (India); DRDO-BU center for life sciences, Bharathiar University, Coimbatore (India); Mangalaraj, D., E-mail: dmraj800@yahoo.com [Department of Nanoscience and Technology, Bharathiar University, Coimbatore, Tamilnadu, 641 046 (India); DRDO-BU center for life sciences, Bharathiar University, Coimbatore (India); Nataraj, D. [Thin film and Nanomaterials Laboratory, Department of Physics, Bharathiar University, Coimbatore (India); DRDO-BU center for life sciences, Bharathiar University, Coimbatore (India)

2009-12-15T23:59:59.000Z

204

Decay studies of the highly neutron-deficient indium isotopes  

Science Conference Proceedings (OSTI)

An extension of the experimentally known nuclidic mass surface to nuclei far from the region of beta-stability is of fundamental interest in providing a better determination of the input parameters for the various nuclear mass formulae, allowing a more accurate prediction of the ultimate limits of nuclear stability. In addition, a study of the shape of the mass surface in the vicinity of the doubly-closed nuclide /sup 100/Sn provides initial information on the behavior of the shell closure to be expected when Z = N = 50. Experiments measuring the decay energies of /sup 103/ /sup 105/In by ..beta..-endpoint measurements are described with special attention focused on the development of a plastic scintillator ..beta..-telescope coupled to the on-line mass separator RAMA (Recoil Atom Mass Analyzer). An attempt to measure the ..beta..-endpoint energy of /sup 102/In is also briefly described. The experimentally determined decay energies and derived masses for /sup 103/ /sup 105/In are compared with the predictions of different mass models to identify which models are more successful in this region. Furthermore, the inclusion in these comparisons of the available data on the neutron-rich indium nuclei permits a systematic study of their ground state mass behavior as a function of the neutron number between the shell closures at N = 50 and N = 82. These analyses indicate that the binding energy of /sup 103/In is 1 MeV larger than predicted by the majority of the mass models. An examination of the Q/sub EC/ surface and the single- and two-neutron separation energies in the vicinity of /sup 103/ /sup 105/In is also performed to investigate further the deviation and other possible systematic variations in the mass surface in a model-independent way.

Wouters, J.M.

1982-02-01T23:59:59.000Z

205

Imaging experimental coronary artery thrombosis with indium-111 platelets. [Dogs  

SciTech Connect

The ability of cardiac scintigraphy with indium-111 (/sup 111/In)-labeled platelets to detect coronary artery thrombosis (CAT) was assessed in a canine model. Cardiac imaging and tissue distribution studies were performed shortly after administering /sup 111/In-labeled platelets to 12 dogs (group 1) with acute CAT. Four dogs (group 2) with acute CAT were studied 2 and 22 hours after administering /sup 111/In platelets. In addition, four dogs (group 3) with 24-hour-old CAT were similarly evaluated. In all group 1 animals, in vivo imaging 1 to 2 hours after /sup 111/In platelet administration revealed intense uptake in the region of thrombus-containing left anterior descending arteries that was readily discernible from background blood pool activity. Sequential imaging of the four group 2 animals over a 22-hour period revealed no change in the scintigraphic pattern of the thrombosed arteries. In contrast, /sup 111/In platelet imaging in the four group 3 animals with 24-hour-old CAT failed to reveal enhanced activity within the region of the thrombus-containing coronary artery. In the 12 group 1 animals, the CAT accumulated 69 +- 10 (mean +- SEM) times greater activity than present in blood and 651 +- 135 times greater activity than normal left ventricular myocardium. There was 24 +- 7 times greater /sup 111/In activity in the damaged left anterior descending arteries compared with normal circumflex arteries. Similar uptake ratios were seen in group 2 animals. The 24-hour old thrombi from group 3 animals showed no enhanced /sup 111/In uptake. This study demonstrates that experimental acute CAT can be detected readily with /sup 111/In platelet cardiac scintigraphy.

Riba, A.L. (Yale Univ., New Haven, CT); Thakur, M.L.; Gottschalk, A.; Zaret, B.L.

1979-10-01T23:59:59.000Z

206

Thermodynamic property evaluation and magnetic refrigeration cycle analysis for gadolinium gallium garnet  

SciTech Connect

Based on relevant material property data and previous model formulations, a magnetothermodynamic property map for gadolinium gallium garnet (Gd{sub 3}Ga{sub 5}O{sub 12}) was adapted for refrigeration cycle analysis in the temperature range 4-40 K and the magnetic field range 0-6 T. Employing methods similar to those previously developed for other materials and temperature ranges, assessments of limitations and relative performance were made for Carnot, ideal regenerative, and pseudo-constant field regenerative cycles. It was found that although Carnot cycle limitations on available temperature lift for gadolinium gallium garnet are not as severe as the limitations for materials previously examined, considerable improvement in cooling capacity and temperature lift combinations can be achieved by using regenerative cycles if serious loss mechanisms are avoided.

Murphy, R.W.

1994-12-01T23:59:59.000Z

207

Nano-Scale Nitride-Particle Strengthened High-Temperature Ferritic ...  

Nano-Scale Nitride-Particle Strengthened High-Temperature Ferritic and Martensitic Steels Produced by a Thermo-Mechanical Treatment Process Note: The technology ...

208

Method and apparatus for use of III-nitride wide bandgap semiconductors in optical communications  

DOE Patents (OSTI)

The present disclosure relates to the use of III-nitride wide bandgap semiconductor materials for optical communications. In one embodiment, an optical device includes an optical waveguide device fabricated using a III-nitride semiconductor material. The III-nitride semiconductor material provides for an electrically controllable refractive index. The optical waveguide device provides for high speed optical communications in an infrared wavelength region. In one embodiment, an optical amplifier is provided using optical coatings at the facet ends of a waveguide formed of erbium-doped III-nitride semiconductor materials.

Hui, Rongqing (Lenexa, KS); Jiang,Hong-Xing (Manhattan, KS); Lin, Jing-Yu (Manhattan, KS)

2008-03-18T23:59:59.000Z

209

L3 Hydrogen Storage in Nitrides by the Use of Ammonia as a ...  

Science Conference Proceedings (OSTI)

A37 Unconventional Method of Nitriding of 316l Austenitic Steel A38 Role of ..... I24 The Study of Cotton Finishing by Artemsia Argyi Oil Microcapsules.

210

Page not found | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

71 - 13980 of 28,560 results. 71 - 13980 of 28,560 results. Download CX-010894: Categorical Exclusion Determination Graphene-Based Composite Sensor for Energy Applications CX(s) Applied: B3.6 Date: 06/27/2013 Location(s): West Virginia Offices(s): National Energy Technology Laboratory http://energy.gov/nepa/downloads/cx-010894-categorical-exclusion-determination Download CX-010895: Categorical Exclusion Determination Development and Industrialization of Indium Gallium Nitride/Gallium Nitride (InGaN/GaN) Light Emitting Diodes LEDs on Patterned Sapphire Substrate (PSS) for Low Cost Emitter Architecture CX(s) Applied: B3.6 Date: 06/27/2013 Location(s): California Offices(s): National Energy Technology Laboratory http://energy.gov/nepa/downloads/cx-010895-categorical-exclusion-determination

211

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Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

31 - 9940 of 29,416 results. 31 - 9940 of 29,416 results. Download CX-010893: Categorical Exclusion Determination Modification to Demolish Building 900A and Reconstruct Building 900 Project CX(s) Applied: B1.3, B1.15 Date: 06/28/2013 Location(s): Pennsylvania Offices(s): National Energy Technology Laboratory http://energy.gov/nepa/downloads/cx-010893-categorical-exclusion-determination Download CX-010894: Categorical Exclusion Determination Graphene-Based Composite Sensor for Energy Applications CX(s) Applied: B3.6 Date: 06/27/2013 Location(s): West Virginia Offices(s): National Energy Technology Laboratory http://energy.gov/nepa/downloads/cx-010894-categorical-exclusion-determination Download CX-010895: Categorical Exclusion Determination Development and Industrialization of Indium Gallium Nitride/Gallium Nitride

212

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71 - 13680 of 26,764 results. 71 - 13680 of 26,764 results. Download CX-010895: Categorical Exclusion Determination Development and Industrialization of Indium Gallium Nitride/Gallium Nitride (InGaN/GaN) Light Emitting Diodes LEDs on Patterned Sapphire Substrate (PSS) for Low Cost Emitter Architecture CX(s) Applied: B3.6 Date: 06/27/2013 Location(s): California Offices(s): National Energy Technology Laboratory http://energy.gov/nepa/downloads/cx-010895-categorical-exclusion-determination Download CX-010896: Categorical Exclusion Determination California Low Carbon Fuels Infrastructure Investment Initiative (SUMMARY Categorical Exclusion) CX(s) Applied: B5.22 Date: 06/27/2013 Location(s): California Offices(s): National Energy Technology Laboratory http://energy.gov/nepa/downloads/cx-010896-categorical-exclusion-determination

213

Pulmonary uptake in Indium-111 leukocyte imaging: clinical significance in patients with suspected occult infections  

SciTech Connect

A retrospective review was undertaken to evaluate the frequency and significance of pulmonary activity noted on 306 indium-111 leukocyte studies involving 232 patients with suspected occult infections. Forty-eight studies showed pulmonary activity in one of two patterns of uptake, focal or diffuse. Fourteen of 27 studies (52%) with focal uptake and two of 21 studies (10%) with diffuse uptake were associated with infectious processes. Lung uptake of indium-111-labeled leukocytes was a poor predictor of pulmonary infection in patients studied for occult infection, although the focal pattern was more likely than the diffuse pattern to be associated with infection.

Cook, P.S.; Datz, F.L.; Disbro, M.A.; Alazraki, N.P.; Taylor, A.T.

1984-02-01T23:59:59.000Z

214

Method of preparing uranium nitride or uranium carbonitride bodies  

DOE Patents (OSTI)

Sintered uranium nitride or uranium carbonitride bodies having a controlled final carbon-to-uranium ratio are prepared, in an essentially continuous process, from U.sub.3 O.sub.8 and carbon by varying the weight ratio of carbon to U.sub.3 O.sub.8 in the feed mixture, which is compressed into a green body and sintered in a continuous heating process under various controlled atmospheric conditions to prepare the sintered bodies.

Wilhelm, Harley A. (Ames, IA); McClusky, James K. (Valparaiso, IN)

1976-04-27T23:59:59.000Z

215

Study of high quality indium nitride films grown on Si(100) substrate by RF-MOMBE with GZO and AlN buffer layers  

Science Conference Proceedings (OSTI)

Wurtzite structure InN films were prepared on Si(100) substrates using radio-frequency metal-organic molecular beam epitaxy (RF-MOMBE) system. Ga-doped ZnO (GZO) and Amorphous AlN (a-AlN) film were used as buffer layers for InN films growth. Structural, ...

Wei-Chun Chen, Shou-Yi Kuo

2012-01-01T23:59:59.000Z

216

Biegel, Osman, Yu Analysis of Aluminum-Nitride SOI HiTEC 2000 1 June 11-15, 2000  

E-Print Network (OSTI)

. Bengtsson, M. Bergh, M. Choumas, C. Olesen, and K.O. Jeppson, "Application of Aluminum Nitride Films

Biegel, Bryan

217

Reduction of the Casimir Force from Indium Tin Oxide Film by UV Treatment  

Science Conference Proceedings (OSTI)

A significant decrease in the magnitude of the Casimir force (from 21% to 35%) was observed after an indium tin oxide sample interacting with an Au sphere was subjected to the UV treatment. Measurements were performed by using an atomic force microscope in high vacuum. The experimental results are compared with theory and a hypothetical explanation for the observed phenomenon is proposed.

Chang, C.-C.; Banishev, A. A.; Mohideen, U. [Department of Physics and Astronomy, University of California, Riverside, California 92521 (United States); Klimchitskaya, G. L. [North-West Technical University, Millionnaya Street 5, St. Petersburg, 191065 (Russian Federation); Mostepanenko, V. M. [Noncommercial Partnership ''Scientific Instruments,'' Tverskaya Street 11, Moscow, 103905 (Russian Federation)

2011-08-26T23:59:59.000Z

218

Reduction of the Casimir force from indium tin oxide film by UV treatment  

E-Print Network (OSTI)

A significant decrease in the magnitude of the Casimir force (from 21% to 35%) was observed after an indium tin oxide (ITO) sample interacting with an Au sphere was subjected to the UV treatment. Measurements were performed by using an atomic force microscope (AFM) in high vacuum. The experimental results are compared with theory, and a hypothetical explanation for the observed phenomenon is proposed.

Chang, C C; Klimchitskaya, G L; Mostepanenko, V M; Mohideen, U

2011-01-01T23:59:59.000Z

219

Reduction of the Casimir force from indium tin oxide film by UV treatment  

E-Print Network (OSTI)

A significant decrease in the magnitude of the Casimir force (from 21% to 35%) was observed after an indium tin oxide (ITO) sample interacting with an Au sphere was subjected to the UV treatment. Measurements were performed by using an atomic force microscope (AFM) in high vacuum. The experimental results are compared with theory, and a hypothetical explanation for the observed phenomenon is proposed.

C. C. Chang; A. A. Banishev; G. L. Klimchitskaya; V. M. Mostepanenko; U. Mohideen

2011-08-03T23:59:59.000Z

220

Correlation between the Indium Tin Oxide morphology and the performances of polymer light-emitting diodes  

E-Print Network (OSTI)

: This paper reports on performance enhancement of polymer light-emitting diodes (PLEDs) based on poly(2,5-bis. Keywords : Polymer light emitting diode; Indium tin oxide; Atomic force microscopy; Rutherford backscattering spectroscopy 1. Introduction Polymer light-emitting diodes (PLEDs) have received worldwide

Paris-Sud XI, Université de

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


221

One step process for producing dense aluminum nitride and composites thereof  

DOE Patents (OSTI)

A one step combustion process for the synthesis of dense aluminum nitride compositions is disclosed. The process comprises igniting pure aluminum powder in a nitrogen atmosphere at a pressure of about 1000 atmospheres or higher. The process enables the production of aluminum nitride bodies to be formed directly in a mold of any desired shape.

Holt, J. Birch (San Jose, CA); Kingman, Donald D. (Danville, CA); Bianchini, Gregory M. (Livermore, CA)

1989-01-01T23:59:59.000Z

222

Development of metal etch mask by single layer lift-off for silicon nitride photonic crystals  

Science Conference Proceedings (OSTI)

We present a method for fabrication of nanoscale patterns in silicon nitride (SiN) using a hard chrome mask formed by metal liftoff with a negative ebeam resists (maN-2401). This approach enables fabrication of a robust etch mask without the need for ... Keywords: Metal liftoff, Nanofabrication, Nanophotonics, Photonic crystals (PC), Silicon nitride (SiN)

Kang-mook Lim; Shilpi Gupta; Chad Ropp; Edo Waks

2011-06-01T23:59:59.000Z

223

Ultra-thin ohmic contacts for p-type nitride light emitting devices  

DOE Patents (OSTI)

A semiconductor based Light Emitting Device (LED) can include a p-type nitride layer and a metal ohmic contact, on the p-type nitride layer. The metal ohmic contact can have an average thickness of less than about 25 .ANG. and a specific contact resistivity less than about 10.sup.-3 ohm-cm.sup.2.

Raffetto, Mark (Raleigh, NC); Bharathan, Jayesh (Cary, NC); Haberern, Kevin (Cary, NC); Bergmann, Michael (Chapel Hill, NC); Emerson, David (Chapel Hill, NC); Ibbetson, James (Santa Barbara, CA); Li, Ting (Ventura, CA)

2012-01-03T23:59:59.000Z

224

Process for making boron nitride using sodium cyanide and boron phosphate  

DOE Patents (OSTI)

This is a very simple process for making boron nitride by mixing sodium cyanide and boron phosphate and heating the mixture in an inert atmosphere until a reaction takes place. The product is a white powder of boron nitride that can be used in applications that require compounds that are stable at high temperatures and that exhibit high electrical resistance.

Bamberger, C.E.

1987-02-27T23:59:59.000Z

225

Hard and elastic amorphous carbon nitride thin films studied by 13 C nuclear magnetic  

E-Print Network (OSTI)

Hard and elastic amorphous carbon nitride thin films studied by 13 C nuclear magnetic resonance bonding of hard and elastic amorphous carbon nitride (a-CNx) thin films was examined using solid-state 13 on Si 001 substrates at 300 °C. Nanoindentation tests reveal a recovery of 80%, a hardness of 5 GPa

Reilly, Anne

226

Microwave Nitridation of Sintered Reaction Bonded Silicon Parts for Natural Gas Fueled Diesel Engines  

DOE Green Energy (OSTI)

This cooperative project was a joint development program between Eaton Corporation and Lockheed Martin Energy Research (LMER). Cooperative work was of benefit to both parties. ORNL was able to assess up-scale of the microwave nitridation process using a more intricate-shaped part designed for application in advanced diesel engines. Eaton Corporation mined access to microwave facilities and expertise for the nitridation of SRBSN materials. The broad objective of the CRADA established with Eaton Corporation and ORNL was to develop cost-effective silicon nitride ceramics compared to the current materials available. The following conclusions can be made from the work performed under the CRADA: (1) Demonstrated that the binder burnout step can be incorporated into the SRBSN processing in the microwave furnace. (2) Scale-up of the microwave nitridation process using Eaton Corporation parts showed that the nitridation weight gains were essentially identical to those obtained by conventional heating. (3) Combined nitridation and sintering processes using silicon nitride beads as packing powders results in degradation of the mechanical properties. (4) Gelcasting of silicon nitride materials using Eaton Si mixtures was demonstrated.

Edler, J.; Kiggans, J.O.; Suman, A.W.; Tiegs, T.N.

1999-01-01T23:59:59.000Z

227

Semiconductor Nanowires and Nanotubes for Energy Conversion  

E-Print Network (OSTI)

an alloy of indium and gallium oxide. In the IGZO nanowireprecipitation of indium in zinc oxide. Journal of PhysicsO 3 (ZnO) n ), and indium iron zinc oxide (IFZO, In 2-x Fe x

Fardy, Melissa Anne

2010-01-01T23:59:59.000Z

228

Nanocrystal Photovoltaics: The Case of Cu2S-CdS  

E-Print Network (OSTI)

solid was gallium- or indium- oxide because the EGaIn wasCdS Microarrays on Indium Tin Oxide Substrates Appliedpole figure ITO - indium tin oxide RMS root mean square

Rivest, Jessica Louis Baker

2011-01-01T23:59:59.000Z

229

Mesoporous TiO2 spheres with a nitridated conducting layer  

Science Conference Proceedings (OSTI)

Nitridated TiO2 mesoporous spheres have been synthesized by hydrothermal processing followed by post-nitridation with NH3. Characterization data reveal a nitridated conducting layer, in addition to a mesoporous, and nanosized building-block morphology resulting in a large surface area. The samples have an average pore size and surface area of, respectively, 10 nm and 87 m2/g. The nitridated TiO2 mesoporous spheres exhibit a high capacity of > 200 mAh/g with good cyclability and high rate capability, as the nitridated conducting layer and favorable morphology of nanosized spheres provides good electrical contact, accommodates cycling induced strain smoothly, and facilitates lithium-ion diffusion.

Yoon, Sukeun [ORNL; Bridges, Craig A [ORNL; Unocic, Raymond R [ORNL; Paranthaman, Mariappan Parans [ORNL

2013-01-01T23:59:59.000Z

230

Gallium arsenide thin films on tungsten/graphite substrates. Phase II. Quarterly project report No. 2, December 1, 1977-February 28, 1978  

DOE Green Energy (OSTI)

The objectives of this contract are to investigate thin films of gallium arsenide on tungsten/graphite substrates and to prepare solar cells with an AM1 efficiency of 6% or higher by August 1978. Efforts during this quarter have been directed to: (1) the deposition and characterization of gallium arsenide films on tungsten/graphite substrates by the arsenic and arsine processes, (2) the construction and operation of an apparatus for the deposition of titanium dioxide films, and (3) the fabrication and evaluation of MOS solar cells on tungsten/graphite substrates. Gallium arsenide films have been deposited on tungsten/graphite substrates by the reaction of gallium, hydrogen chloride, and arsenic in a hydrogen flow. The structural and electrical properties of these films are very similar to those obtained by the arsine process. The initial stage of the deposition of gallium arsenide films on tungsten/graphite substrates has been investigated by the scanning electron microscopy.

Chu, S.S.

1978-03-01T23:59:59.000Z

231

Thin film gallium arsenide solar cell research. Third quarterly project report, September 1, 1980-November 30, 1980. [Antireflection coating  

DOE Green Energy (OSTI)

The major objective of this contract is to produce gallium arsenide solar cells of 10% conversion efficiency in films of less than 10 micrometers thick which have been deposited by chemical vapor deposition on graphite or tungsten coated graphite substrates. Major efforts during this quarter were directed to: (1) the optimization of the deposition of gallium arsenide films of 10 ..mu..m thickness or less on tungsten/graphic substrates, (2) the investigation of the effectiveness of various grain boundary passivation techniques, (3) the deposition of tantalum pentoxide by ion beam sputtering as an antireflection coating, (4) the deposition of gallium aluminium arsenide by the organometallic process, and (5) the fabrication and characterization of large area Schottky barrier type solar cells from gallium arsenide films of about 10 ..mu..m thickness. Various grain boundary passivation techniques, such as the anodic oxidation, thermal oxidation, and ruthenium treatment, have been investigated. The combination of thermal oxidation and ruthenium treatment has been used to fabricate Schottky barrier type solar cells. Large area MOS solar cells of 9 cm/sup 2/ area with AMl efficiency of 8.5% have been fabricated from ruthenium treated gallium arsenide films of 10 ..mu..m thickness. The construction of the apparatus for the deposition of gallium aluminum arsenide by the organometallic process has been completed. The deposition of good quality tantalum pentoxide film as an antireflection coating has been carried out by the ion beam sputtering technique. The short-circuit current density and AMl efficiency of the solar cells are increased by approximately 60%, with a slight increase in the open-circuit voltage. Details are presented. (WHK)

Chu, S. S.

1980-12-01T23:59:59.000Z

232

P2.12 Internal Quantum Efficiency Measurement in InGaN/GaN UV ...  

Science Conference Proceedings (OSTI)

Effect of Indium Incorporation on Optical and Structural Properties of M-Plane .... P2.14 Photoluminescence Studies of Indium Nitride Films Grown on Oxide...

233

About this Abstract  

Science Conference Proceedings (OSTI)

Effect of Indium Incorporation on Optical and Structural Properties of M-Plane .... P2.14 Photoluminescence Studies of Indium Nitride Films Grown on Oxide...

234

Kinetics for the reaction of hydrogen with a plutonium-1 weight percent gallium alloy powder  

Science Conference Proceedings (OSTI)

Kinetics for the reaction of hydrogen with plutonium-1 w/o gallium were measured using powder prepared ''in situ.'' The rates obeyed a first-order rate law and were independent of temperature from -29/degree/ to 355/degree/C. A pressure dependence proportional to P/sup //one-half/ was observed at pressures less than 1 kPa. From 1 to 70 kPa the pressure dependence rapidly decreased. Total pressure dependence could be accurately described by a Langmuir equation. Results indicate an adsorption-controlled reaction at low pressures and a reaction-controlled process at high pressure. 19 refs.

Stakebake, J.L.

1981-11-01T23:59:59.000Z

235

Energy level alignment at the interfaces between typical electrodes and nucleobases: Al/adenine/indium-tin-oxide and Al/thymine/indium-tin-oxide  

Science Conference Proceedings (OSTI)

We investigated the interfacial electronic structures of Al/adenine/indium-tin-oxide (ITO) and Al/thymine/ITO using in situ ultraviolet and x-ray photoemission spectroscopy and density functional theory calculations. Adenine shows both an interface dipole and level bending, whereas thymine shows only an interface dipole in contact with ITO. In addition, thymine possesses a larger ionization energy than adenine. These are understood with delocalized {pi} states confirmed with theoretical calculations. For the interface between nucleobases and Al, both nucleobases show a prominent reduction of the electron injection barrier from Al to each base in accordance with a downward level shift.

Lee, Younjoo; Lee, Hyunbok; Park, Soohyung; Yi, Yeonjin [Institute of Physics and Applied Physics, Yonsei University, 50 Yonsei-ro, Seodaemoon-gu, Seoul 120-749 (Korea, Republic of)

2012-12-03T23:59:59.000Z

236

A study of thermal cycling and radiation effects on indium and solder bump bonding  

Science Conference Proceedings (OSTI)

The BTeV hybrid pixel detector is constructed of readout chips and sensor arrays which are developed separately. The detector is assembled by flip-chip mating of the two parts. This method requires the availability of highly reliable, reasonably low cost fine-pitch flip-chip attachment technology. We have tested the quality of two bump-bonding technologies; indium bumps (by Advanced Interconnect Technology Ltd. (AIT) of Hong Kong) and fluxless solder bumps (by MCNC in North Carolina, USA). The results have been presented elsewhere[1]. In this paper we describe tests we performed to further evaluate these technologies. We subjected 15 indium bump-bonded and 15 fluxless solder bump-bonded dummy detectors through a thermal cycle and then a dose of radiation to observe the effects of cooling, heating and radiation on bump-bonds.

Selcuk Cihangir et al.

2001-09-12T23:59:59.000Z

237

DC sputtered indium-tin oxide transparent cathode for organic light-emitting diodes  

E-Print Network (OSTI)

AbstractThe performance of top-emitting organic light-emitting diodes depends not just on the choice of the transparent cathodes but also on their techniques of formation. Compared to the damage induced by radio frequency sputtering of indium-tin oxide cathode, that induced by dc sputtering was verified to be less severe and relatively independent of the sputtering power. Consequently, a high dc sputtering power of 120 W could be employed to achieve a high deposition rate of 0.1 nm/s. Adequate emission efficiency was maintained, even with a relatively thin 7-nm copper (II) phthalocyanine buffer layer. Index TermsIndium-tin oxide, organic light-emitting diodes, sputtering, top-emission, transparent cathode. I.

Haiying Chen; Chengfeng Qiu; Man Wong; Hoi Sing Kwok

2003-01-01T23:59:59.000Z

238

Role of indium in highly crystalline ZnO thin films  

Science Conference Proceedings (OSTI)

Zinc oxide and indium doped zinc oxide (ZnO:In) transparent conducting thin films were deposited on glass substrates by pulsed DC magnetron sputtering using separate Zn and In targets. The independent control of the In content in ZnO has helped us to explore the role of indium in influencing the oriented (002) growth, crystallinity, conductivity and mobility of the doped films. The lowest resistivity of ZnO:In thin film is 2.73 Multiplication-Sign 10{sup -3} ohm-cm. At the optimal condition of high (002) orientation, ZnO:In films with electrical resistivity of 7.63 Multiplication-Sign 10{sup -3} ohm.cm and mobility of 126.4 cm{sup 2}/V.s are achieved.

Singh, Anil; Chaudhary, Sujeet; Pandya, Dinesh K. [Thin Film Laboratory, Physics Department, Indian Institute of Technology Delhi, New Delhi 110016 (India)

2013-02-05T23:59:59.000Z

239

lntersubbancl transitions in high indium content InGaAs/AIGaAs quantum wells  

E-Print Network (OSTI)

lntersubbancl transitions in high indium content InGaAs/AIGaAs quantum wells H. C. Chui, S. M. Lord report the first observation of intersubband transitions in In,Ga, -#s(y=O.3,0.5)/ AlGaAs quantum wells. These quantum wells were grown on a GaAs substrate with a linearly graded InGaAs buffer to achieve strain

Fejer, Martin M.

240

Formation and evolution of self-organized Au nanorings on indium-tin-oxide surface  

Science Conference Proceedings (OSTI)

This work reports on the formation of Au nanoclusters and on their evolution in nanoring structures on indium-tin-oxide surface by sputtering deposition and annealing processes. The quantification of the characteristics of the nanorings (surface density, depth, height, and width) is performed by atomic force microscopy. The possibility to control these characteristics by tuning annealing temperature and time is demonstrated establishing relations which allow to set the process parameters to obtain nanostructures of desired morphological properties for various technological applications.

Ruffino, F.; Simone, F.; Grimaldi, M. G. [Dipartimento di Fisica e Astronomia, Universita di Catania, via S. Sofia 64, 95123 Catania (Italy); MATIS CNR-IMM, via S. Sofia 64, 95123 Catania (Italy); Crupi, I. [MATIS CNR-IMM, via S. Sofia 64, 95123 Catania (Italy)

2011-01-10T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


241

Anionic Gallium-Based Metal;#8722;Organic Framework and Its Sorption and Ion-Exchange Properties  

SciTech Connect

A gallium-based metal-organic framework Ga{sub 6}(C{sub 9}H{sub 3}O{sub 6}){sub 8} {center_dot} (C{sub 2}H{sub 8}N){sub 6}(C{sub 3}H{sub 7}NO){sub 3}(H{sub 2}O){sub 26} [1, Ga{sub 6}(1,3,5-BTC){sub 8} {center_dot} 6DMA {center_dot} 3DMF {center_dot} 26H{sub 2}O], GaMOF-1; BTC = benzenetricarboxylate/trimesic acid and DMA = dimethylamine, with space group I{bar 4}3d, a = 19.611(1) {angstrom}, and V = 7953.4(6) {angstrom}{sup 3}, was synthesized using solvothermal techniques and characterized by synchrotron-based X-ray microcrystal diffraction. Compound 1 contains isolated gallium tetrahedra connected by the organic linker (BTC) forming a 3,4-connected anionic porous network. Disordered positively charged ions and solvent molecules are present in the pore, compensating for the negative charge of the framework. These positively charged molecules could be exchanged with alkali-metal ions, as is evident by an ICP-MS study. The H{sub 2} storage capacity of the parent framework is moderate with a H{sub 2} storage capacity of {approx}0.5 wt % at 77 K and 1 atm.

Banerjee, Debasis; Kim, Sun Jin; Wu, Haohan; Xu, Wenqian; Borkowski, Lauren A.; Li, Jing; Parise, John B. (Kwangju); (Rutgers); (SBU)

2012-04-30T23:59:59.000Z

242

Dynamics of formation of photoresponse in a detector structure made of gallium arsenide  

SciTech Connect

The influence of capture effects on the characteristics of detectors of the ionizing radiation based on semi-insulating gallium arsenide is considered. Generation of nonequilibrium electrons and holes along the entire thickness of the active region was performed under illumination with an infrared light-emitting diode with a wavelength of 0.9 {mu}m. In this case, the situation emerging in the device structure under the effect of X-ray radiation or a high-energy electron beam was simulated. It is shown that the variation in the shape of the output signal with time in this case is caused by variation in the electric field profile due to the capture of holes at deep centers in gallium arsenide. An absolutely different distribution of the electric field emerges in the structure under irradiation of a semitransparent cathode of the structure with a red light-emitting diode, emission of which penetrates into the active region for mere 1 {mu}m. In this case, the transformation of the electric field is caused by the capture of electrons. Under the prolonged effect of such radiation, a space-charge-limited current mode emerges in the device.

Ayzenshtat, G. I., E-mail: ayzen@mail.tomsknet.ru; Lelekov, M. A.; Tolbanov, O. P. [Tomsk State University (Russian Federation)

2008-04-15T23:59:59.000Z

243

Defect Levels of Indium-doped CdMnTe Crystals  

Science Conference Proceedings (OSTI)

Using photoluminescence (PL) and current deep-level transient spectroscopy (I-DLTS), we investigated the electronic defects of indium-doped detector-grade CdMnTe:In (CMT:In) crystals grown by the vertical Bridgman method. We similarly analyzed CdZnTe:In (CZT:In) and undoped CdMnTe (CMT) crystals grown under the amount of same level of excess Te and/or indium doping level to detail the fundamental properties of the electronic defect structure more readily. Extended defects, existing in all the samples, were revealed by synchrotron white beam x-ray diffraction topography and scanning electron microscopy. The electronic structure of CMT is very similar to that of CZT, with shallow traps, A-centers, Cd vacancies, deep levels, and Te antisites. The 1.1-eV deep level, revealed by PL in earlier studies of CZT and CdTe, were attributed to dislocation-induced defects. In our I-DLTS measurements, the 1.1-eV traps showed different activation energies with applied bias voltage and an exponential dependence on the trap-filling time, which are typical characteristics of dislocation-induced defects. We propose a new defect-trap model for indium-doped CMT crystals.

K Kim; A Bolotinikov; G Camarda; R Gul; A Hossain; G Yang; Y Cui; R James

2011-12-31T23:59:59.000Z

244

Boron-Nitride (BN) Nanotubes (BNNT) at TJNAF| U.S. DOE Office of Science  

Office of Science (SC) Website

Boron-Nitride (BN) Nanotubes (BNNT) at Boron-Nitride (BN) Nanotubes (BNNT) at TJNAF Nuclear Physics (NP) NP Home About Research Facilities Science Highlights Benefits of NP Spinoff Applications Spinoff Archives SBIR/STTR Applications of Nuclear Science and Technology Funding Opportunities Nuclear Science Advisory Committee (NSAC) News & Resources Contact Information Nuclear Physics U.S. Department of Energy SC-26/Germantown Building 1000 Independence Ave., SW Washington, DC 20585 P: (301) 903-3613 F: (301) 903-3833 E: sc.np@science.doe.gov More Information » Spinoff Archives Boron-Nitride (BN) Nanotubes (BNNT) at TJNAF Print Text Size: A A A RSS Feeds FeedbackShare Page Application/instrumentation: Boron-Nitride (BN) Nanotubes (BNNT) Developed at: Jefferson Lab Free Electron Facility Developed in: 2008-2011

245

Method of enhancing the wettability of boron nitride for use as an electrochemical cell separator  

DOE Patents (OSTI)

A felt or other fabric of boron nitride suitable for use as an interelectrode separator within an electrochemical cell is wetted with a solution containing a thermally decomposable organic salt of an alkaline earth metal. An aqueous solution of magnesium acetate is the preferred solution for this purpose. After wetting the boron nitride, the solution is dried by heating at a sufficiently low temperature to prevent rapid boiling and the creation of voids within the separator. The dried material is then calcined at an elevated temperature in excess of 400/sup 0/C to provide a coating of an oxide of magnesium on the surface of the boron nitride fibers. A fabric or felt of boron nitride treated in this manner is easily wetted by molten electrolytic salts, such as the alkali metal halides or alkaline earth metal halides, that are used in high temperature, secondary electrochemical cells.

McCoy, L.R.

1981-01-23T23:59:59.000Z

246

Optoelectronic Properties in Monolayers of Hybridized Graphene and Hexagonal Boron Nitride  

E-Print Network (OSTI)

We explain the nature of the electronic energy gap and optical absorption spectrum of carbonboron-nitride (CBN) monolayers using density functional theory, GW and Bethe-Salpeter calculations. The band structure and the ...

Bernardi, Marco

247

Method of nitriding, carburizing, or oxidizing refractory metal articles using microwaves  

DOE Patents (OSTI)

A method of nitriding an article of refractory-nitride-forming metal or metalloids. A consolidated metal or metalloid article is placed inside a microwave oven and nitrogen containing gas is introduced into the microwave oven. The metal or metalloid article is heated to a temperature sufficient to react the metal or metalloid with the nitrogen by applying a microwave energy within the microwave oven. The metal or metalloid article is maintained at that temperature for a period of time sufficient to convert the article of metal or metalloid to an article of refractory nitride. in addition, a method of applying a coating, such as a coating of an oxide, a carbide, or a carbo-nitride, to an article of metal or metalloid by microwave heating.

Holcombe, Cressie E. (Knoxville, TN); Dykes, Norman L. (Oak Ridge, TN); Tiegs, Terry N. (Lenoir City, TN)

1992-01-01T23:59:59.000Z

248

Method of nitriding, carburizing, or oxidizing refractory metal articles using microwaves  

DOE Patents (OSTI)

A method of nitriding an article of refractory-nitride-forming metal or metalloids. A consolidated metal or metalloid article is placed inside a microwave oven and nitrogen containing gas is introduced into the microwave oven. The metal or metalloid article is heated to a temperature sufficient to react the metal or metalloid with the nitrogen by applying a microwave energy within the microwave oven. The metal or metalloid article is maintained at that temperature for a period of time sufficient to convert the article of metal or metalloid to an article of refractory nitride. in addition, a method of applying a coating, such as a coating of an oxide, a carbide, or a carbo-nitride, to an article of metal or metalloid by microwave heating.

Holcombe, C.E.; Dykes, N.L.; Tiegs, T.N.

1992-10-13T23:59:59.000Z

249

Electronic structure analyses and activation studies of a dinitrogen-derived terminal nitride of molybdenum  

E-Print Network (OSTI)

Chapter 1: Complexes obtained by electrophilic attack on a dinitrogen-derived terminal molybdenum nitride: Electronic structure analysis by solid state CP/MAS ?N NMR in combination ... Chapter 2. Carbene chemistry in the ...

Sceats, Emma Louise, 1978-

2004-01-01T23:59:59.000Z

250

Process for preparing transition metal nitrides and transition metal carbonitrides and their reaction intermediates  

DOE Patents (OSTI)

Disclosed is a process for making ammonolytic precursors to nitride and carbonitride ceramics. Extreme reaction conditions are not required and the precursor is a powder-like substance that produces ceramics of improved purity and morphology upon pyrolysis.

Maya, L.

1986-12-09T23:59:59.000Z

251

Recent development of the synthesis and engineering applications of one-dimensional boron nitride nanomaterials  

Science Conference Proceedings (OSTI)

One-dimensional (1D) nanomaterials with novel photoelectric, magnetic, mechanical, and electronic transport properties have long been the research focus throughout the world. Herein, the recent achievements in preparation of 1D boron nitride nanomaterials, ...

Changhui Sun; Hongxiao Yu; Liqiang Xu; Qiang Ma; Yitai Qian

2010-01-01T23:59:59.000Z

252

Spin current switching and spin-filtering effects in Mn-doped boron nitride nanoribbons  

Science Conference Proceedings (OSTI)

The spin transport properties are investigated by means of the first principle approach for boron nitride nanoribbons with one or two substitutional Mn impurities, connected to graphene electrodes. The spin current polarization is evaluated using the ...

G. A. Nemnes

2012-01-01T23:59:59.000Z

253

Proton exchange membrane fuel cells with chromium nitride nanocrystals as electrocatalysts  

E-Print Network (OSTI)

S. Srinivasan, V. Antonucci, Fuel Cells 1, 133 (2001). 15 Y.Proton exchange membrane fuel cells with chromium nitridePolymer electrolyte membrane fuel cells (PEMFCs) are energy

Zhong, Hexiang; Chen, Xiaobo; Zhang, Huamin; Wang, Meiri; Mao, Samuel S.

2007-01-01T23:59:59.000Z

254

Nitride III-V Activities at Sandia National Labs  

NLE Websites -- All DOE Office Websites (Extended Search)

Lighting: Lighting: Synergisms with Office of Science Materials Programs Jerry A. Simmons Semiconductor Materials and Device Sciences Sandia National Laboratories March 13, 2001 EMaCC Meeting OUTLINE *Brief overview of prospects & promise of SSL *National Initiative *Grand Challenge LDRD at Sandia *BES-supported activities at Sandia provided core capabilities *Other NS applications of nitride materials science Will only discuss inorganic materials and devices here. Major motivation for SSL is energy savings: lighting is large fraction of energy consumption 1 10 100 1000 1970 1980 1990 2000 2010 2020 Energy Electricity Illumination (assuming 20% of electricity) Projected WORLD Energy Consumption (Quads) Year 400 Quads 130 Quads 25 Quads 1998 1970 1980 1990 2000 2010 2020 Energy Electricity Illumination

255

High Surface Area Molybdenum Nitride Support for Fuel Cell Electrodes  

SciTech Connect

Alternative supports for polymer electrolyte membrane fuel cells were synthesized and catalytic activity was explored using electrochemical analysis. High surface area, molybdenum nitride supports were synthesized by rapidly heating a gel of polyethyleneimine bound molybdenum in a tube furnace under a forming gas atmosphere. Subsequent disposition of platinum through an incipient wetness approach lead to dispersed crystallites of platinum on the conductive support. All the ceramic materials were characterized with XRD, SEM, TEM and electrochemical analysis. The supports without platinum are highly stable to acidic aqueous conditions and show no signs of oxygen reduction reactivity (ORR). However, once the 20 wt % platinum is added to the material, ORR activity comparable to XC72 based materials is observed.

Blackmore, Karen [Los Alamos National Laboratory (LANL); Elbaz, L [Los Alamos National Laboratory (LANL); Bauer, E D [Los Alamos National Laboratory (LANL); Brosha, Eric [Los Alamos National Laboratory (LANL); More, Karren Leslie [ORNL; Mccleskey, T [Los Alamos National Laboratory (LANL); Burrell, A [Los Alamos National Laboratory (LANL)

2011-01-01T23:59:59.000Z

256

ICP dry etching of III-V nitrides  

DOE Green Energy (OSTI)

Inductively coupled plasma etching of GaN, AlN, InN, InGaN and InAlN was investigated in CH{sub 4}/H{sub 2}/Ar plasmas as a function of dc bias, and ICP power. The etch rates were generally quite low, as is common for III-nitrides in CH{sub 4} based chemistries. The etch rates increased with increasing dc bias. At low rf power (150 W), the etch rates increased with increasing ICP power, while at 350 W rf power, a peak was found between 500 and 750 W ICP power. The etched surfaces were found to be smooth, while selectivities of etch were {le} 6 for InN over GaN, AlN, InGaN and InAlN under all conditions.

Vartuli, C.B.; Lee, J.W.; MacKenzie, J.D. [Univ. of Florida, Gainesville, FL (United States)] [and others

1997-10-01T23:59:59.000Z

257

Role of defects in III-nitride based electronics  

DOE Green Energy (OSTI)

The LDRD entitled ``Role of Defects in III-Nitride Based Devices'' is aimed to place Sandia National Laboratory at the forefront of the field of GaN materials and devices by establishing a scientific foundation in areas such as material growth, defect characterization/modeling, and processing (metalization and etching) chemistry. In this SAND report the authors summarize their studies such as (1) the MOCVD growth and doping of GaN and AlGaN, (2) the characterization and modeling of hydrogen in GaN, including its bonding, diffusion, and activation behaviors, (3) the calculation of energetic of various defects including planar stacking faults, threading dislocations, and point defects in GaN, and (4) dry etching (plasma etching) of GaN (n- and p-types) and AlGaN. The result of the first AlGaN/GaN heterojunction bipolar transistor is also presented.

HAN,JUNG; MYERS JR.,SAMUEL M.; FOLLSTAEDT,DAVID M.; WRIGHT,ALAN F.; CRAWFORD,MARY H.; LEE,STEPHEN R.; SEAGER,CARLETON H.; SHUL,RANDY J.; BACA,ALBERT G.

2000-01-01T23:59:59.000Z

258

Outdoor Performance of a Thin-Film Gallium-Arsenide Photovoltaic Module  

SciTech Connect

We deployed a 855 cm2 thin-film, single-junction gallium arsenide (GaAs) photovoltaic (PV) module outdoors. Due to its fundamentally different cell technology compared to silicon (Si), the module responds differently to outdoor conditions. On average during the test, the GaAs module produced more power when its temperature was higher. We show that its maximum-power temperature coefficient, while actually negative, is several times smaller in magnitude than that of a Si module used for comparison. The positive correlation of power with temperature in GaAs is due to temperature-correlated changes in the incident spectrum. We show that a simple correction based on precipitable water vapor (PWV) brings the photocurrent temperature coefficient into agreement with that measured by other methods and predicted by theory. The low operating temperature and small temperature coefficient of GaAs give it an energy production advantage in warm weather.

Silverman, T. J.; Deceglie, M. G.; Marion, B.; Cowley, S.; Kayes, B.; Kurtz, S.

2013-06-01T23:59:59.000Z

259

Single event upsets in gallium arsenide pseudo-complementary MESFET logic  

SciTech Connect

An introduction to gallium arsenide (GaAs) Pseudo-Complementary MESFET Logic (PCML) circuits is presented. PCML was developed to reduce the sensitivity of high-speed GaAs logic to radiation-induced single event upsets (SEUs). Experiments for testing the single-event upset (SEU) sensitivity of GaAs PCML integrated circuits (ICs) are described. The results of the experiments are analyzed. This new type of high-speed, low-power, GaAs logic provides decreased sensitivity to SEUs compared to more traditional circuit designs such as Directly-Coupled FET Logic (DCFL). PCML is fully compatible with existing GaAs E/D MESFET fabrication processes, such as those commonly used to make DCFL.

Fouts, D.J.; Wolfe, K.; Van Dyk, S.E. [Naval Postgraduate School, Monterey, CA (United States). Dept. of Electrical and Computer Engineering; Weatherford, T.R. [SFA Inc., Landover, MD (United States); McMorrow, D.; Melinger, J.S.; Tran, L.H.; Campbell, A.B. [Naval Research Lab., Washington, DC (United States)

1995-12-01T23:59:59.000Z

260

Atomistic model of helium bubbles in gallium-stabilized plutonium alloys  

Science Conference Proceedings (OSTI)

The varying thermodynamic stability of gallium- (Ga-) stabilized plutonium (Pu) alloys with temperature affords a unique setting for the development of self-irradiation damage. Here, fundamental characteristics of helium (He) bubbles in these alloys with respect to temperature, gallium concentration, and He-to-vacancy ratio are modeled at the atomistic level with a modified embedded atom potential that takes account of this varying stability. Aside from the bubbles themselves, the surrounding matrix material is single-crystal metal or alloy. As a function of temperature, with a 2:1 He-to-vacancy ratio in a 5-at. % Ga fcc lattice, a 1.25-nm bubble is very stable up to about 1000 K. At 1000 K, the bubble distorts the surrounding lattice and precipitates a liquid zone, as is consistent with the phase diagram for the model material. Between 300 and 500 K, this same bubble relaxes slightly through interstitial emission. At 300 K, with a 2:1 He-to-vacancy ratio in a 2.5-at. % Ga fcc lattice, the Ga stabilization is less effective in the model to the point where the bubble distorts the local lattice and expands significantly. Similarly, at 300 K, if the He-to-vacancy ratio is increased to 3:1, there is significant local lattice distortion, as well as ejection of some He atoms into the lattice. The formation of new bubbles is not observed, because those events take place on a longer time scale than can be simulated with the present approach.

Valone, S. M.; Baskes, M. I. [Materials Science and Technology Division and Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States); Martin, R. L. [Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

2006-06-01T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


261

Indium oxide atomic layer deposition facilitated by the synergy between oxygen and water.  

SciTech Connect

This paper explores the atomic layer deposition (ALD) of indium oxide (In{sub 2}O{sub 3}) films using cyclopentadienyl indium (InCp) and combinations of both molecular oxygen and water as the co-reactants. When either O{sub 2} or H{sub 2}O were used individually as the oxygen source the In{sub 2}O{sub 3} growth was negligible over the temperature range 100-250 C. However, when oxygen and water were used in combination either as a simultaneous exposure or supplied sequentially, In{sub 2}O{sub 3} films were deposited at growth rates of 1.0-1.6 {angstrom}/cycle over the full range of deposition temperatures. In situ quadrupole mass spectrometry and quartz crystal microbalance measurements revealed that water serves the function of releasing ligands from the surface while oxygen performs the role of oxidizing the indium. Since both processes are necessary for sustained growth, both O{sub 2} and H{sub 2}O are required for the In{sub 2}O{sub 3} ALD. The electrical resistivity, mobility, and carrier concentration of the In{sub 2}O{sub 3} films varied dramatically with both the deposition temperature and co-reactant sequence and correlated to a crystallization occurring at {approx}140 C observed by X-ray diffraction and scanning electron microscopy. Using this new process we successfully deposited ALD In{sub 2}O{sub 3} films over large area substrates (12 in. x 18 in.) with very high uniformity in thickness and resistivity.

Libera, J. A.; Hryn, J. N.; Elam, J. W. (Energy Systems)

2011-04-26T23:59:59.000Z

262

Alternating layers of plutonium and lead or indium as surrogate for plutonium  

Science Conference Proceedings (OSTI)

Elemental plutonium (Pu) assumes more crystal structures than other elements, plausibly due to bonding f electrons becoming non-bonding. Complex geometries hamper understanding of the transition in Pu, but calculations predict this transition in a system with simpler geometry: alternating layers either of plutonium and lead or of plutonium and indium. Here the transition occurs via a pairing-up of atoms within Pu layers. Calculations stepping through this pairing-up reveal valuable details of the transition, for example that the transition from bonding to non-bonding proceeds smoothly.

Rudin, Sven Peter [Los Alamos National Laboratory

2009-01-01T23:59:59.000Z

263

Waste reduction options for manufacturers of copper indium diselenide photovoltaic cells  

DOE Green Energy (OSTI)

This paper identifies general waste reduction concepts and specific waste reduction options to be used in the production of copper indium diselenide (CIS) photovoltaic cells. A general discussion of manufacturing processes used for the production of photovoltaic cells is followed by a description of the US Environmental Protection Agency (EPA) guidelines for waste reduction (i.e., waste minimization through pollution prevention). A more specific discussion of manufacturing CIS cells is accompanied by detailed suggestions regarding waste minimization options for both inputs and outputs for ten stages of this process. Waste reduction from inputs focuses on source reduction and process changes, and reduction from outputs focuses on material reuse and recycling.

DePhillips, M.P.; Fthenakis, V.M.; Moskowitz, P.D.

1994-03-01T23:59:59.000Z

264

Manganese-doped indium oxide and its application in organic light-emitting diodes  

SciTech Connect

Thin films of manganese-doped indium oxide (IMO) deposited by electron beam evaporation have been investigated as anodes in organic light-emitting diodes (OLEDs). The IMO films have a high work function of 5.35 eV, a desirable surface morphology with an average roughness of 1.1 nm, a high average optical transmittance of 87.2% in the visible region, and a maximum optical transmittance of 92% at 460 nm. It is demonstrated that an IMO anode can effectively improve hole injection at the anode/organic interface, resulting in OLEDs with an increased electroluminescent efficiency.

Liao Yaqin [Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033 (China); Graduate School of Chinese Academy of Sciences, Beijing 100080 (China); Lu Qipeng; Fan Yi; Liu Xingyuan [Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033 (China)

2011-07-11T23:59:59.000Z

265

Origin of ferromagnetism enhancement in bi-layer chromium-doped indium zinc oxides  

SciTech Connect

This work demonstrates that by controlling the rapid thermal annealing temperature, amorphous chromium-doped indium zinc oxide films develop an amorphous-crystalline bi-layer structure and show magnetization up to {approx}30 emu/cm{sup 3}. The crystalline layer arises from significant out-diffusion of Zn from surfaces, leading to a large difference in the Zn:In ratio in amorphous and crystalline layers. Doped Cr ions in amorphous and crystalline layers form different valence configurations, creating a charge reservoir which transfers electrons through amorphous-crystalline interfaces and in turn enhances ferromagnetism.

Hsu, C. Y. [Physics Department, National Sun Yat-Sen University, Kaohsiung 804, Taiwan (China)

2012-08-06T23:59:59.000Z

266

Structural tuning of residual conductivity in highly mismatched III-V layers  

DOE Patents (OSTI)

A new process to control the electrical conductivity of gallium nitride layers grown on a sapphire substrate has been developed. This process is based on initially coating the sapphire substrate with a thin layer of aluminum nitride, then depositing the gallium nitride thereon. This process allows one to controllably produce gallium nitride layers with resistivity varying over as much as 10 orders of magnitude, without requiring the introduction and activation of suitable dopants.

Han, Jung (Albuquerque, NM); Figiel, Jeffrey J. (Albuquerque, NM)

2002-01-01T23:59:59.000Z

267

The design, construction, and testing of a nuclear fuel rod thermal simulation system to study gallium/Zircaloy interactions  

E-Print Network (OSTI)

The presence of gallium in weapons grade plutonium has raised many questions concerning its use in light water reactor (LWR) fuel rods. The biggest concern is that the gallium will migrate down the thermal gradient in the fuel rod and deposit on the inner surface of the clad, which could cause it to fail. In order to study these effects, a fuel rod thermal simulation system (FRTSS) has been developed to recreate the shape and magnitude of the temperature profile in pressurized water reactor (PWR) fuel rods. The system uses electrically heated simulated fuel rods inside of a large, natural convection heat exchanger that uses lead-bismuth eutectic (LBE) (45 <% Pb, 55 <% Bi) as the working fluid. The simulated rods consist of small diameter electric heaters, annular pellets of depleted uranium/cerium oxide doped with approximately 10 ppm of gallium, a small helium filled gap, and generic Zircaloy IV cladding. The system is controlled through a computer-based data acquisition system that is used to record temperature data and operate the various pieces of equipment. A simple mathematical model was used to design the heat exchanger and predict the temperature profile within the simulated rods. Results from system tests indicated that the mathematical model was capable of predicting heater surface temperatures within 6.15% +/- 1.82% and clad outer surface temperatures within 1.91% +/- 4.46%. In addition, the tests also revealed that the system could accurately simulate the temperature profiles of operating PWR fuel rods. Consequently, the FRTSS provides a safe and effective means for studying gallium migration in the fuel pellets and its subsequent interactions with Zircaloy IV.

Allison, Christopher Curtis

1999-01-01T23:59:59.000Z

268

Preparation of CIGS-based solar cells using a buffered electrodeposition bath  

DOE Patents (OSTI)

A photovoltaic cell exhibiting an overall conversion efficiency of at least 9.0% is prepared from a copper-indium-gallium-diselenide thin film. The thin film is prepared by simultaneously electroplating copper, indium, gallium, and selenium onto a substrate using a buffered electro-deposition bath. The electrodeposition is followed by adding indium to adjust the final stoichiometry of the thin film.

Bhattacharya, Raghu Nath (Littleton, CO)

2007-11-20T23:59:59.000Z

269

Excitation wavelength dependence of water-window line emissions from boron-nitride laser-produced plasmas  

E-Print Network (OSTI)

Excitation wavelength dependence of water-window line emissions from boron-nitride laser-produced of laser excitation wavelength on water-window emission lines of laser- produced boron-nitride plasmas. Plasmas are produced by focusing 1064 nm and harmonically generated 532 and 266 nm radiation from a Nd

Harilal, S. S.

270

A study of thermal cycling and radiation effects on indium and solder bump bonds  

Science Conference Proceedings (OSTI)

The BTeV hybrid pixel detector is constructed of readout chips and sensor arrays which are developed separately. The detector is assembled by flip-chip mating of the two parts. This method requires the availability of highly reliable, reasonably low cost fine-pitch flip-chip attachment technology. We have tested the quality of two bump-bonding technologies; indium bumps (by Advanced Interconnect Technology Ltd. (AIT) of Hong Kong) and fluxless solder bumps (by MCNC in North Carolina, USA). The results have been presented elsewhere [1]. In this paper we describe tests we performed to further evaluate these technologies. We subjected 15 indium bump-bonded and 15 fluxless solder bump-bonded dummy detectors through a thermal cycle and then a dose of radiation to observe the effects of cooling, heating and radiation on bump-bonds. We also exercised the processes of HDI mounting and wire bonding to some of the dummy detectors to see the effect of these processes on bump bonds.

Simon Kwan et al.

2001-12-11T23:59:59.000Z

271

Analysis of indium zinc oxide thin films by laser-induced breakdown spectroscopy  

Science Conference Proceedings (OSTI)

We have performed spectroscopic analysis of the plasma generated by Nd:YAG ({lambda} = 266 nm) laser irradiation of thin indium zinc oxide films with variable In content deposited by combinatorial pulsed laser deposition on glass substrates. The samples were irradiated in 5 x 10{sup 4} Pa argon using laser pulses of 5 ns duration and 10 mJ energy. The plasma emission spectra were recorded with an Echelle spectrometer coupled to a gated detector with different delays with respect to the laser pulse. The relative concentrations of indium and zinc were evaluated by comparing the measured spectra to the spectral radiance computed for a plasma in local thermal equilibrium. Plasma temperature and electron density were deduced from the relative intensities and Stark broadening of spectral lines of atomic zinc. Analyses at different locations on the deposited thin films revealed that the In/(In + Zn) concentration ratio significantly varies over the sample surface, from 0.4 at the borders to about 0.5 in the center of the film. The results demonstrate that laser-induced breakdown spectroscopy allows for precise and fast characterization of thin films with variable composition.

Popescu, A. C. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France); National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); Beldjilali, S. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France); LPPMCA, Universite des Sciences et de la Technologie d'Oran, BP 1505 El Mnaouer, Oran (Algeria); Socol, G.; Mihailescu, I. N. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); Craciun, V. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); MAIC, University of Florida, Gainesville, FL 32611 (United States); Hermann, J. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France)

2011-10-15T23:59:59.000Z

272

Transparent conductive indium zinc oxide films prepared by pulsed plasma deposition  

Science Conference Proceedings (OSTI)

Transparent conductive indium zinc oxide films were prepared by pulsed plasma deposition from a ceramic target (90 wt. % In{sub 2}O{sub 3} and 10 wt. % ZnO). The dependences of film properties upon the substrate temperature was investigated using characterization methods including x-ray diffraction, atomic force microscope, Hall measurement, ultraviolet-visible spectroscopy, and x-ray photoelectron spectroscopy. The films grown at room temperature had a rather smooth surface due to the amorphous structure, with a root mean square roughness of less than 1 nm. The atomic ratio of Zn/(Zn + In) in these films is 15.3 at. %, which is close to that in the target, and the chemical states of indium and zinc atoms were In{sup 3+} and Zn{sup 2+}, respectively. The films deposited on a substrate with a temperature of 200 Degree-Sign C exhibited polycrystalline structure and a preferred growth orientation along the (222) plane. Here the electrical properties were improved due to the better crystallinity, with the films exhibiting a minimum resistivity value of 4.2 Multiplication-Sign 10{sup -4}{Omega} cm, a maximum carrier mobility of 45 cm{sup 2} V{sup -1} s{sup -1}, and an optical transmittance over 80% in the visible region.

Wan Runlai; Yang Ming; Zhou Qianfei; Zhang Qun [Department of Materials Science, Fudan University, Shanghai 200433 (China)

2012-11-15T23:59:59.000Z

273

HIGH-EFFICIENCY NITRIDE-BASED SOLID-STATE LIGHTING  

SciTech Connect

In this second annual report we summarize the progress in the second-year period of Department of Energy contract DE-FC26-01NT41203, entitled ''High- Efficiency Nitride-Based Solid-State Lighting''. The two teams, from the University of California at Santa Barbara (Principle Investigator: Dr. Shuji Nakamura) and Rensselaer Polytechnic Institute (led by Dr. N. Narendran), are pursuing the goals of this contract from thin film growth, characterization, and packaging standpoints. The UCSB team has recently made significant progress in the development of light-emitting diodes (LEDs) with AlGaN active regions emitting in the ultraviolet (UV), resonant-cavity LEDs (RCLEDs), as well as lateral epitaxial overgrowth (LEO) techniques to obtain large-area non-polar GaN films with low average dislocation density. The Rensselaer team has benchmarked the performance of commercially available LED systems and has also conducted efforts to develop an optimized RCLED packaging scheme, including development of advanced epoxy encapsulant chemistries.

Paul T. Fini; Shuji Nakamura

2003-10-30T23:59:59.000Z

274

Radial elasticity of multi-walled boron nitride nanotubes  

Science Conference Proceedings (OSTI)

We investigated the radial mechanical properties of multi-walled boron nitride nanotubes (MW-BNNTs) using atomic force microscopy. The employed MW-BNNTs were synthesized using pressurized vapor/condenser (PVC) methods and were dispersed in aqueous solution using ultrasonication methods with the aid of ionic surfactants. Our nanomechanical measurements reveal the elastic deformational behaviors of individual BNNTs with two to four tube walls in their transverse directions. Their effective radial elastic moduli were obtained through interpreting their measured radial deformation profiles using Hertzian contact mechanics models. Our results capture the dependences of the effective radial moduli of MW-BNNTs on both the tube outer diameter and the number of tube layers. The effective radial moduli of double-walled BNNTs are found to be several-fold higher than those of single-walled BNNTs within the same diameter range. Our work contributes directly to a complete understanding of the fundamental structural and mechanical properties of BNNTs and the pursuits of their novel structural and electronics applications.

Michael W. Smith, Cheol Park, Meng Zheng, Changhong Ke ,In-Tae Bae, Kevin Jordan

2012-02-01T23:59:59.000Z

276

Synthesis of fine-grained .alpha.-silicon nitride by a combustion process  

DOE Patents (OSTI)

A combustion synthesis process for the preparation of .alpha.-silicon nitride and composites thereof is disclosed. Preparation of the .alpha.-silicon nitride comprises the steps of dry mixing silicon powder with an alkali metal azide, such as sodium azide, cold-pressing the mixture into any desired shape, or loading the mixture into a fused, quartz crucible, loading the crucible into a combustion chamber, pressurizing the chamber with nitrogen and igniting the mixture using an igniter pellet. The method for the preparation of the composites comprises dry mixing silicon powder (Si) or SiO.sub.2, with a metal or metal oxide, adding a small amount of an alkali metal azide such as sodium azide, introducing the mixture into a suitable combustion chamber, pressurizing the combustion chamber with nitrogen, igniting the mixture within the combustion chamber, and isolating the .alpha.-silicon nitride formed as a reaction product.

Holt, J. Birch (San Jose, CA); Kingman, Donald D. (Danville, CA); Bianchini, Gregory M. (Livermore, CA)

1990-01-01T23:59:59.000Z

277

Alternative Liquid Fuel Effects on Cooled Silicon Nitride Marine Gas Turbine Airfoils  

Science Conference Proceedings (OSTI)

With prior support from the Office of Naval Research, DARPA, and U.S. Department of Energy, United Technologies is developing and engine environment testing what we believe to be the first internally cooled silicon nitride ceramic turbine vane in the United States. The vanes are being developed for the FT8, an aeroderivative stationary/marine gas turbine. The current effort resulted in further manufacturing and development and prototyping by two U.S. based gas turbine grade silicon nitride component manufacturers, preliminary development of both alumina, and YTRIA based environmental barrier coatings (EBC's) and testing or ceramic vanes with an EBC coating.

Holowczak, J.

2002-03-01T23:59:59.000Z

278

Flexible indium zinc oxide/Ag/indium zinc oxide multilayer electrode grown on polyethersulfone substrate by cost-efficient roll-to-roll sputtering for flexible organic photovoltaics  

Science Conference Proceedings (OSTI)

The authors describe the preparation and characteristics of flexible indium zinc oxide (IZO)-Ag-IZO multilayer electrodes grown on flexible polyethersulfone (PES) substrates using a roll-to-roll sputtering system for use in flexible organic photovoltaics. By the continuous roll-to-roll sputtering of the bottom IZO, Ag, and top IZO layers at room temperature, they were able to fabricate a high quality IZO-Ag-IZO multilayer electrode with a sheet resistance of 6.15 {epsilon}/square, optical transmittance of 87.4%, and figure of merit value of 42.03x10{sup -3} {Omega}{sup -1} on the PES substrate. In addition, the IZO-Ag-IZO multilayer electrode exhibited superior flexibility to the roll-to-roll sputter grown single ITO electrode due to the existence of a ductile Ag layer between the IZO layers and stable amorphous structure of the IZO film. Furthermore, the flexible organic solar cells (OSCs) fabricated on the roll-to-roll sputter grown IZO-Ag-IZO electrode showed higher power efficiency (3.51%) than the OSCs fabricated on the roll-to-roll sputter grown single ITO electrode (2.67%).

Park, Yong-Seok; Kim, Han-Ki [Department of Display Materials Engineering, Kyung Hee University, 1 Seochoen-dong, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of)

2010-01-15T23:59:59.000Z

279

Leaching of indium from obsolete liquid crystal displays: Comparing grinding with electrical disintegration in context of LCA  

Science Conference Proceedings (OSTI)

Highlights: Black-Right-Pointing-Pointer Two pre-treatment methods, prior to leaching of indium from obsolete LCD modules, were described. Black-Right-Pointing-Pointer Conventional grinding and electrical disintegration have been evaluated and compared in the context of LCA. Black-Right-Pointing-Pointer Experimental data on the leaching capacity for indium and the electricity consumption of equipment were inputted into the LCA model in order to compare the environmental performance of each method. Black-Right-Pointing-Pointer An estimate for the environmental performance was calculated as the sum of six impact categories. Black-Right-Pointing-Pointer Electrical disintegration method outperforms conventional grinding in all impact categories. - Abstract: In order to develop an effective recycling system for obsolete Liquid Crystal Displays (LCDs), which would enable both the leaching of indium (In) and the recovery of a pure glass fraction for recycling, an effective liberation or size-reduction method would be an important pre-treatment step. Therefore, in this study, two different types of liberation methods: (1) conventional grinding, and (2) electrical disintegration have been tested and evaluated in the context of Life Cycle Assessment (LCA). In other words, the above-mentioned methods were compared in order to find out the one that ensures the highest leaching capacity for indium, as well as the lowest environmental burden. One of the main findings of this study was that the electrical disintegration was the most effective liberation method, since it fully liberated the indium containing-layer, ensuring a leaching capacity of 968.5 mg-In/kg-LCD. In turn, the estimate for the environmental burden was approximately five times smaller when compared with the conventional grinding.

Dodbiba, Gjergj, E-mail: dodbiba@sys.t.u-tokyo.ac.jp [Department of System Innovation, Graduate School of Engineering, University of Tokyo (Japan); Nagai, Hiroki; Wang Lipang; Okaya, Katsunori; Fujita, Toyohisa [Department of System Innovation, Graduate School of Engineering, University of Tokyo (Japan)

2012-10-15T23:59:59.000Z

280

Induction, helicity, and alpha effect in a toroidal screw flow of liquid gallium  

SciTech Connect

We investigate experimentally induction mechanisms in a screw flow of gallium in a toroidal channel. The flow is nonstationary and operated in a spin-down regime: the channel (and fluid) are initially set into solid body rotation; as the channel is stopped the fluid is set into strong helical motion by diverters located inside the channel. In this study, we put a particular emphasis on the induction generated by these helical motions, which are expected to develop over the entire range of turbulent scales. We apply an external magnetic field either perpendicular to the channel axis parallel to it. At large scales the nonlinear induction mechanisms are associated with the Parker stretch and twist effect and with the expulsion due to overall rotation. Induction mechanisms can also originate in the small scale helicity as in the alpha induction effect of mean-field magnetohydrodynamics. Our measurements yield an upper bound for the alpha coefficient, significantly lower than estimates based on dimensional analysis. We discuss the consequences of our observations for the engineering of homogeneous dynamos in the laboratory.

Stepanov, R.; Denisov, S.; Noskov, V. [Institute of Continuous Media MechanicsKorolyov 1, 614061 Perm (Russian Federation); Volk, R.; Frick, P.; Pinton, J.-F. [Laboratoire de Physique de l'Ecole Normale Superieur de Lyon, CNRS UMR5672, 46 allee d'Italie, 69007 Lyon (France)

2006-04-15T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


281

NREL preprints for the 23rd IEEE Photovoltaic Specialists Conference  

DOE Green Energy (OSTI)

Topics covered include various aspects of solar cell fabrication and performance. Aluminium-gallium arsenides, cadmium telluride, amorphous silicon, and copper-indium-gallium selenides are all characterized in their applicability in solar cells.

Fitzgerald, M. [ed.

1993-05-01T23:59:59.000Z

282

Dual Gate Thin Film Transistors Based on Indium Oxide Active Layers  

SciTech Connect

Polycrystalline Indium Oxide (In{sub 2}O{sub 3}) thin films were employed as an active channel layer for the fabrication of bottom and top gate thin film transistors. While conventional SiO{sub 2} served as a bottom gate dielectric, cross-linked poly-4-vinylphenol (PVP) was used a top gate dielectric. These nano-crystalline TFTs exhibited n-channel behavior with their transport behavior highly dependent on the thickness of the channel. The correlation between the thickness of the active layer and TFT parameters such as on/off ratio, field-effect mobility, threshold voltage were carried out. The optical spectra revealed a high transmittance in the entire visible region, thus making them promising candidates for the display technology.

Kekuda, Dhananjaya; Rao, K. Mohan; Tolpadi, Amita [Department of Physics, Manipal Institute of Technology, Manipal University, Manipal 576 104 (India); Chu, C. W. [Research Center for Applied Sciences, Academia Sinica, Taipei, Taiwan (China)

2011-07-15T23:59:59.000Z

283

No difference in sensitivity for occult infection between tropolone- and oxine-labeled indium-111 leukocytes  

SciTech Connect

There is considerable disagreement as to whether oxine or tropolone is the best labeling agent for indium leukocytes. The authors have previously looked at the sensitivity of oxine-labeled /sup 111/In leukocyte scans for occult infections and now present a similar group of patients imaged with tropolone-labeled /sup 111/In leukocytes. Thirty-four patients (38 studies) with possible occult infection were prospectively studied. Patients were imaged 1-4 hr after injection and again at 24 hr postinjection. The differences in sensitivity between oxine and tropolone when imaged early and at 24 hr were not statistically significant. They conclude that there is not significant difference in the ability to detect infection between oxine- and tropolone-labeled leukocytes, both early at 1-4 hr, and on delayed imaging 24 hr after injection.

Datz, F.L.; Bedont, R.A.; Baker, W.J.; Alazraki, N.P.; Taylor, A. Jr.

1985-05-01T23:59:59.000Z

284

Modifying the Casimir force between indium tin oxide film and Au sphere  

E-Print Network (OSTI)

We present complete results of the experiment on measuring the Casimir force between an Au-coated sphere and an untreated or, alternatively, UV-treated indium tin oxide film deposited on a quartz substrate. Measurements were performed using an atomic force microscope in a high vacuum chamber. The measurement system was calibrated electrostatically. Special analysis of the systematic deviations is performed, and respective corrections in the calibration parameters are introduced. The corrected parameters are free from anomalies discussed in the literature. The experimental data for the Casimir force from two measurement sets for both untreated and UV-treated samples are presented. The experimental errors are determined at a 95% confidence level. It is demonstrated that the UV treatment of an I TO plate results in a significant decrease in the magnitude of the Casimir force (from 21% to 35% depending on separation). However, ellipsometry measurements of the imaginary parts of dielectric permittivities of the un...

Banishev, A A; Castillo-Garza, R; Klimchitskaya, G L; Mostepanenko, V M; Mohideen, U; 10.1103/PhysRevB.85.045436

2012-01-01T23:59:59.000Z

285

The electronic structure of co-sputtered zinc indium tin oxide thin films  

SciTech Connect

Zinc indium tin oxide (ZITO) transparent conductive oxide layers were deposited via radio frequency (RF) magnetron co-sputtering at room temperature. A series of samples with gradually varying zinc content was investigated. The samples were characterized with x-ray and ultraviolet photoemission spectroscopy (XPS, UPS) to determine the electronic structure of the surface. Valence and conduction bands maxima (VBM, CBM), and work function were determined. The experiments indicate that increasing Zn content results in films with a higher defect rate at the surface leading to the formation of a degenerately doped surface layer if the Zn content surpasses {approx}50%. Furthermore, the experiments demonstrate that ZITO is susceptible to ultraviolet light induced work function reduction, similar to what was earlier observed on ITO and TiO{sub 2} films.

Carreras, Paz; Antony, Aldrin; Bertomeu, Joan [Departament de Fisica Aplicada i Optica, Universitat de Barcelona, 08028 Barcelona (Spain); Gutmann, Sebastian [Department of Chemistry, University of South Florida, Tampa, Florida 33620 (United States); Schlaf, Rudy [Department of Electrical Engineering, University of South Florida, Tampa, Florida 33620 (United States)

2011-10-01T23:59:59.000Z

286

Defect structure of indium tin oxide and its relationship to conductivity  

DOE Green Energy (OSTI)

Doping In{sub 2}O{sub 3} with tin results in an improved transparent conducting oxide (TCO). Although indium tin oxide (ITO) is the most frequently used commercial TCO, its defect structure is still uncertain. Previously, its defect chemistry has been inferred based on the conductivity of the material. To directly study the defect structure of ITO, the authors prepared powders under different processing environments and performed neutron powder diffraction. Structural information was obtained by performing Rietveld analysis. The results include positions of the atoms, their thermal displacements, the fractional occupancy of the defect oxygen site, and the fractional occupancies of Sn on each of the two nonequivalent cation sites, showing a strong preference for the b site. These structural results are correlated with the measured electrical properties of the same samples.

Gonzalez, G. B.; Cohen, J. B.; Hwang, J.-H.; Mason, T. O.; Hodges, J. P.; Jorgensen, J. D.

2000-05-09T23:59:59.000Z

287

The Influence of Lewis Acid/Base Chemistry on the Removal of Gallium by Volatility from Weapons-Grade Plutonium Dissolved in Molten Chlorides  

Science Conference Proceedings (OSTI)

It has been proposed that GaCl{sub 3} can be removed by direct volatilization from a Pu-Ga alloy that is dissolved in a molten chloride salt. Although pure GaCl{sub 3} is quite volatile (boiling point: 201 deg. C), the behavior of GaCl{sub 3} dissolved in chloride salts is quite different because of solution effects and is critically dependent upon the composition of the solvent salt (i.e., its Lewis acid/base character). In this technical note, the behavior of gallium in prototypical Lewis acid and Lewis base salts is contrasted. It is found that gallium volatility is suppressed in basic melts and promoted in acidic melts. These results have an important influence on the potential for simple gallium removal in molten salt systems.

Williams, David F.; Cul, Guillermo D. del [Oak Ridge National Laboratory (United States); Toth, Louis M. [Electrochemical Systems (United States); Collins, Emory D. [Oak Ridge National Laboratory (United States)

2001-12-15T23:59:59.000Z

288

High-efficiency solar cell and method for fabrication  

DOE Patents (OSTI)

A high-efficiency 3- or 4-junction solar cell is disclosed with a theoretical AM0 energy conversion efficiency of about 40%. The solar cell includes p-n junctions formed from indium gallium arsenide nitride (InGaAsN), gallium arsenide (GaAs) and indium gallium aluminum phosphide (InGaAlP) separated by n-p tunnel junctions. An optional germanium (Ge) p-n junction can be formed in the substrate upon which the other p-n junctions are grown. The bandgap energies for each p-n junction are tailored to provide substantially equal short-circuit currents for each p-n junction, thereby eliminating current bottlenecks and improving the overall energy conversion efficiency of the solar cell. Additionally, the use of an InGaAsN p-n junction overcomes super-bandgap energy losses that are present in conventional multi-junction solar cells. A method is also disclosed for fabricating the high-efficiency 3- or 4-junction solar cell by metal-organic chemical vapor deposition (MOCVD).

Hou, Hong Q. (Albuquerque, NM); Reinhardt, Kitt C. (Albuquerque, NM)

1999-01-01T23:59:59.000Z

289

High-efficiency solar cell and method for fabrication  

DOE Patents (OSTI)

A high-efficiency 3- or 4-junction solar cell is disclosed with a theoretical AM0 energy conversion efficiency of about 40%. The solar cell includes p-n junctions formed from indium gallium arsenide nitride (InGaAsN), gallium arsenide (GaAs) and indium gallium aluminum phosphide (InGaAlP) separated by n-p tunnel junctions. An optional germanium (Ge) p-n junction can be formed in the substrate upon which the other p-n junctions are grown. The bandgap energies for each p-n junction are tailored to provide substantially equal short-circuit currents for each p-n junction, thereby eliminating current bottlenecks and improving the overall energy conversion efficiency of the solar cell. Additionally, the use of an InGaAsN p-n junction overcomes super-bandgap energy losses that are present in conventional multi-junction solar cells. A method is also disclosed for fabricating the high-efficiency 3- or 4-junction solar cell by metal-organic chemical vapor deposition (MOCVD). 4 figs.

Hou, H.Q.; Reinhardt, K.C.

1999-08-31T23:59:59.000Z

290

Hands-On Session 6: Monolayer Boron Nitride BerkeleyGW Workshop  

NLE Websites -- All DOE Office Websites (Extended Search)

Hands-On Session 6: Monolayer Boron Nitride Hands-On Session 6: Monolayer Boron Nitride BerkeleyGW Workshop 11/23/2013 Diana Qiu Goals: 1. Demonstrate a GW-BSE calculation for a 2D semiconductor 2. Look at the behavior of ε -1 00 (q) for a system with a truncated Coulomb interaction 3. Learn how to use BerkeleyGW's visualization tools to look at the exciton wave function Instructions: Please copy the example directory into your scratch directory >> cp -rP /project/projectdirs/m1694/BGW-2013/6-boron_nitride $SCRATCH/ 1-MF ● Please go the directory ``6-boron_nitride/1-mf/`` ● Enter each directory in numerical order and follow the instructions in the README files. Some things to note for 2D calculations: ● The system is in a periodic supercell. Though we will not do so in this calculation, you should always converge the k-grid sampling and amount of vacuum between

291

Method of chemical vapor deposition of boron nitride using polymeric cyanoborane  

DOE Patents (OSTI)

Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.

Maya, Leon (Oak Ridge, TN)

1994-01-01T23:59:59.000Z

292

Silicon-doped boron nitride coated fibers in silicon melt infiltrated composites  

SciTech Connect

A fiber-reinforced silicon-silicon carbide matrix composite having improved oxidation resistance at high temperatures in dry or water-containing environments is produced. The invention also provides a method for protecting the reinforcing fibers in the silicon-silicon carbide matrix composites by coating the fibers with a silicon-doped boron nitride coating.

Corman, Gregory Scot (Ballston Lake, NY); Luthra, Krishan Lal (Schenectady, NY)

2002-01-01T23:59:59.000Z

293

Silicon-doped boron nitride coated fibers in silicon melt infiltrated composites  

SciTech Connect

A fiber-reinforced silicon--silicon carbide matrix composite having improved oxidation resistance at high temperatures in dry or water-containing environments is produced. The invention also provides a method for protecting the reinforcing fibers in the silicon--silicon carbide matrix composites by coating the fibers with a silicon-doped boron nitride coating.

Corman, Gregory Scot (Ballston Lake, NY); Luthra, Krishan Lal (Schenectady, NY)

1999-01-01T23:59:59.000Z

294

Silicon-doped boron nitride coated fibers in silicon melt infiltrated composites  

SciTech Connect

A fiber-reinforced silicon-silicon carbide matrix composite having improved oxidation resistance at high temperatures in dry or water-containing environments is produced. The invention also provides a method for protecting the reinforcing fibers in the silicon-silicon carbide matrix composites by coating the fibers with a silicon-doped boron nitride coating.

Corman, G.S.; Luthra, K.L.

1999-09-14T23:59:59.000Z

295

Compatibility/Stability Issues in the Use of Nitride Kernels in LWR TRISO Fuel  

SciTech Connect

The stability of the SiC layer in the presence of free nitrogen will be dependent upon the operating temperatures and resulting nitrogen pressures whether it is at High Temperature Gas-Cooled Reactor (HTGR) temperatures of 1000-1400 C (coolant design dependent) or LWR temperatures that range from 500-700 C. Although nitrogen released in fissioning will form fission product nitrides, there will remain an overpressure of nitrogen of some magnitude. The nitrogen can be speculated to transport through the inner pyrolytic carbon layer and contact the SiC layer. The SiC layer may be envisioned to fail due to resulting nitridation at the elevated temperatures. However, it is believed that these issues are particularly avoided in the LWR application. Lower temperatures will result in significantly lower nitrogen pressures. Lower temperatures will also substantially reduce nitrogen diffusion rates through the layers and nitriding kinetics. Kinetics calculations were performed using an expression for nitriding silicon. In order to further address these concerns, experiments were run with surrogate fuel particles under simulated operating conditions to determine the resulting phase formation at 700 and 1400 C.

Armstrong, Beth L [ORNL; Besmann, Theodore M [ORNL

2012-02-01T23:59:59.000Z

296

Bonding in hard and elastic amorphous carbon nitride films investigated H NMR spectroscopy  

E-Print Network (OSTI)

Bonding in hard and elastic amorphous carbon nitride films investigated using 15 N, 13 C, and 1 H Received 14 February 2003; published 5 November 2003 The nitrogen bonding in hard and elastic amorphous substrates at 300 °C. Nanoindentation tests revealed an elastic recovery of 80%, a hardness of 5 GPa

Reilly, Anne

297

Sintered Reaction Bonded Silicon Parts by Microwave Nitridation Combined with Gas-Pressure Sintering  

DOE Green Energy (OSTI)

The cooperative project was a joint development program between Ceradyne and Oak Ridge National Laboratory through Lockheed Martin Energy Research (LMER). Cooperative work was of benefit to both parties. ORNL was able to assess the effect of the microwave nitridation process coupled with gas-pressure sintering for fabrication of parts for advanced diesel engines. Ceradyne gained access to gelcasting expertise and microwave facilities and experience for the nitridation of SRBSN materials. The broad objective of the CRADA between Ceradyne and OIWL was to (1) examine the applicability of the gelcasting technology to fabricate parts from SRBSN, and (2) to assess the effect of the microwave nitridation of silicon process coupled with gas-pressure sintering for fabrication of parts for advanced diesel engines. The following conclusions can be made from the work performed under the CRADA: (1) Gelcasting is a viable method to fabricate SRBSN parts using Ceradyne Si mixtures. However, the technique requires further development prior to being put into commercial use. (2) Microwave heating can be utilized to nitride multiple SRBSN parts. Scale-up of the process to fabricate several kilograms of material (up to 6 kg) per furnace run was demonstrated.

Kiggans, J.O.; Mikijelj, B.; Tiegs, T.N.

1999-01-01T23:59:59.000Z

298

Evaluation and silicon nitride internal combustion engine components. Final report, Phase I  

DOE Green Energy (OSTI)

The feasibility of silicon nitride (Si{sub 3}N{sub 4}) use in internal combustion engines was studied by testing three different components for wear resistance and lower reciprocating mass. The information obtained from these preliminary spin rig and engine tests indicates several design changes are necessary to survive high-stress engine applications. The three silicon nitride components tested were valve spring retainers, tappet rollers, and fuel pump push rod ends. Garrett Ceramic Components` gas-pressure sinterable Si{sub 3}N{sub 4} (GS-44) was used to fabricate the above components. Components were final machined from densified blanks that had been green formed by isostatic pressing of GS-44 granules. Spin rig testing of the valve spring retainers indicated that these Si{sub 3}N{sub 4} components could survive at high RPM levels (9,500) when teamed with silicon nitride valves and lower spring tension than standard titanium components. Silicon nitride tappet rollers showed no wear on roller O.D. or I.D. surfaces, steel axles and lifters; however, due to the uncrowned design of these particular rollers the cam lobes indicated wear after spin rig testing. Fuel pump push rod ends were successful at reducing wear on the cam lobe and rod end when tested on spin rigs and in real-world race applications.

Voldrich, W. [Allied-Signal Aerospace Co., Torrance, CA (United States). Garrett Ceramic Components Div.

1992-04-01T23:59:59.000Z

299

Method of chemical vapor deposition of boron nitride using polymeric cyanoborane  

DOE Patents (OSTI)

Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film. 11 figs.

Maya, L.

1994-06-14T23:59:59.000Z

300

Solar Photovoltaic Technologies - Energy Innovation Portal  

From 2002 to 2007 the market for Copper Indium Gallium Selenide ... According to the U.S. Energy Information Administrations 2010 International Energy Outlook, ...

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


301

Nonoxide Fluorescent Nanoparticles - Oak Ridge National Laboratory  

for the U.S. Department of Energy Presentation_name ... y of the dopanmatert Gallium Indium ... Bloo Solar; EPOD Solar. AQT; Canrom. New Solar Ventures;

302

It's Elemental - The Element Germanium  

NLE Websites -- All DOE Office Websites (Extended Search)

is in the semiconductor industry. When doped with small amounts of arsenic, gallium, indium, antimony or phosphorus, germanium is used to make transistors for use in...

303

Solibro AB | Open Energy Information  

Open Energy Info (EERE)

search Name Solibro AB Place Uppsala, Sweden Zip 751 21 Sector Solar Product Develops thin film solar cells using copper indium gallium diselenide (CIGS). References Solibro...

304

Applied Quantum Technology AQT | Open Energy Information  

Open Energy Info (EERE)

AQT Jump to: navigation, search Name Applied Quantum Technology (AQT) Place Santa Clara, California Zip 95054 Product California-based manufacturer of CIGS (copper indium gallium...

305

Indium and impurity incorporation in InGaN films on polar, nonpolar, and semipolar GaN orientations grown by ammonia molecular beam epitaxy  

SciTech Connect

The effects of NH{sub 3} flow, group III flux, and substrate growth temperature on indium incorporation and surface morphology have been investigated for bulk InGaN films grown by ammonia molecular beam epitaxy. The incorporation of unintentional impurity elements (H, C, O) in InGaN films was studied as a function of growth temperature for growth on polar (0001) GaN on sapphire templates, nonpolar (1010) bulk GaN, and semipolar (1122), (2021) bulk GaN substrates. Enhanced indium incorporation was observed on both (1010) and (2021) surfaces relative to c-plane, while reduced indium incorporation was observed on (1122) for co-loaded conditions. Indium incorporation was observed to increase with decreasing growth temperature for all planes, while being relatively unaffected by the group III flux rates for a 1:1 Ga:In ratio. Indium incorporation was found to increase at the expense of a decreased growth rate for higher ammonia flows; however, smooth surface morphology was consistently observed for growth on semipolar orientations. Increased concentrations of oxygen and hydrogen were observed on semipolar and nonpolar orientations with a clear trend of increased hydrogen incorporation with indium content.

Browne, David A.; Young, Erin C.; Lang, Jordan R.; Hurni, Christophe A.; Speck, James S. [Materials Department, University of California Santa Barbara, Santa Barbara, California 93106 (United States)

2012-07-15T23:59:59.000Z

306

Efficiency Improvement of Nitride-Based Solid State Light Emitting Materials -- CRADA Final Report  

SciTech Connect

The development of In{sub x}Ga{sub 1-x} N/GaN thin film growth by Molecular Beam Epitaxy has opened a new route towards energy efficient solid-state lighting. Blue and green LED's became available that can be used to match the whole color spectrum of visible light with the potential to match the eye response curve. Moreover, the efficiency of such devices largely exceeds that of incandescent light sources (tungsten filaments) and even competes favorably with lighting by fluorescent lamps. It is, however, also seen in Figure 1 that it is essential to improve on the luminous performance of green LED's in order to mimic the eye response curve. This lack of sufficiently efficient green LED's relates to particularities of the In{sub x}Ga{sub 1-x}N materials system. This ternary alloy system is polar and large strain is generated during a lattice mismatched thin film growth because of the significantly different lattice parameters between GaN and InN and common substrates such as sapphire. Moreover, it is challenging to incorporate indium into GaN at typical growth temperatures because a miscibility gap exists that can be modified by strain effects. As a result a large parameter space needs exploration to optimize the growth of In{sub x}Ga{sub 1-x}N and to date it is unclear what the detailed physical processes are that affect device efficiencies. In particular, an inhomogeneous distribution indium in GaN modifies the device performance in an unpredictable manner. As a result technology is pushed forward on a trial and error basis in particular in Asian countries such as Japan and Korea, which dominate the market and it is desirable to strengthen the competitiveness of the US industry. This CRADA was initiated to help Lumileds Lighting/USA boosting the performance of their green LED's. The tasks address the distribution of the indium atoms in the active area of their blue and green LED's and its relation to internal and external quantum efficiencies. Procedures to measure the indium distribution with near atomic resolution were developed and applied to test samples and devices that were provided by Lumilids. Further, the optical performance of the device materials was probed by photoluminescence, electroluminescence and time resolved optical measurements. Overall, the programs objective is to provide a physical basis for the development of a simulation program that helps making predictions to improve the growth processes such that the device efficiency can be increased to about 20%. Our study addresses all proposed aspects successfully. Carrier localization, lifetime and recombination as well as the strain-induced generation of electric fields were characterized and modeled. Band gap parameters and their relation to the indium distribution were characterized and modeled. Electron microscopy was developed as a unique tool to measure the formation of indium clusters on a nanometer length scale and it was demonstrated that strain induced atom column displacements can reliably be determined in any materials system with a precision that approaches 2 pm. The relation between the local indium composition x and the strain induced lattice constant c(x) in fully strained In{sub x}Ga{sub 1-x}N quantum wells was found to be: c(x) = 0.5185 + {alpha}x with {alpha} = 0.111 nm. It was concluded that the local indium concentration in the final product can be modulated by growth procedures in a predictable manner to favorably affect external quantum efficiencies that approached target values and that internal quantum efficiencies exceeded them.

Kisielowski, Christian; Weber, Eicke

2010-05-13T23:59:59.000Z

307

Comparison of Cavitation-Erosion Resistance of Carburized and Carburized-Plus-Nitrided 316LN Stainless Steel in Mercury  

SciTech Connect

Annealed type 316LN stainless steel in the (1) carburized and the (2) carburized plus nitrided conditions was evaluated for cavitation-erosion resistance in ambient temperature mercury using a vibratory horn method. The results indicated that, relative to the specimens receiving only the carburizing treatment, the specimens that received both surface treatments exhibited substantially greater weight loss, general thinning, and profile development as a function of sonication time - with all observed degradation limited to the nitrided layer. Further, the nitride layer was observed to be susceptible to extensive cracking (occasionally leading to spallation), but the cracking was never observed to penetrate into the carburized layer. These screening test results suggest there is no improvement in cavitation-erosion resistance associated with augmentation of the carburizing treatment with plasma nitriding.

Pawel, Steven J [ORNL

2007-05-01T23:59:59.000Z

308

Aluminum nitride transitional layer for reducing dislocation density and cracking of AlGaN epitaxial films  

DOE Patents (OSTI)

A denticulated Group III nitride structure that is useful for growing Al.sub.xGa.sub.1-xN to greater thicknesses without cracking and with a greatly reduced threading dislocation (TD) density.

Allerman, Andrew A.; Crawford, Mary H.; Lee, Stephen R.

2013-01-08T23:59:59.000Z

309

Nuclear fuels technologies: Thermally induced gallium removal system (TIGRS), fiscal year 1998 research and development test plan  

SciTech Connect

This document details the research and development (R and D) activities that will be conducted in Fiscal Year 1998 (FY98) by the Thermally Induced Gallium Removal System (TIGRS) team for the Department of Energy Office of Fissile Materials Disposition. This work is a continuation and extension of experimental activities that have been conducted in support of using weapons-derived plutonium in the fabrication of mixed-oxide (MOX) nuclear fuel for reactor-based plutonium disposition. The ultimate purpose of this work is to demonstrate adequate Thermally Induced Gallium Removal with a prototypic system. This Test Plan presents more than the FY98 R and D efforts in order to frame the Task in its entirety. To achieve the TIGRS Program objectives, R and D activities during the next two years will be focused on (1) process development leading to a prototypic TIGRS design, and (2) prototypic TIGRS design and testing leading to and including a prototypic demonstration of TIGRS operation. Both the process development and system testing efforts will consist of a series of surrogate-based cold tests and plutonium-based hot tests. Some of this testing has already occurred and will continue into FY99.

Buksa, J.J.; Butt, D.P.; Chidester, K.; DeMuth, S.F.; Havrilla, G.J.; James, C.A.; Kolman, D.G.

1997-12-24T23:59:59.000Z

310

Indium-Tin-Oxide-Based Transparent Conducting Layers for Highly Efficient Photovoltaic Devices  

Science Conference Proceedings (OSTI)

Additional hydrogen (H{sub 2}) annealing and subsequent electrochemical treatment are found to make tin-doped indium oxide (ITO)-based photoelectrodes suitable for highly efficient dye sensitized solar cells. The additional H{sub 2} annealing process recovered the electrical conductivity of the ITO film the same as its initial high conductivity, which enhanced the charge collecting property. Moreover, the employment of electrochemical oxidation of TiO{sub 2}/ITO photoelectrode improved the energy conversion efficiency of the ITO-based dye-sensitized solar cells (DSSC), higher than that of a conventional FTO-based DSSC. Electrochemical impedance analysis showed that the H2 annealing process reduced the internal resistance of the cell, i.e., the resistance of the ITO and the Schottky barrier at the TiO{sub 2}/ITO interface were reduced, and that the electrochemical treatment recovered the diodelike characteristics of the DSSC by retarding back electron transfer from the photoelectrode to the electrolyte. The present work demonstrates that thermally and electrochemically modified ITO-based photoelectrode is another alternative to the conventionally used FTO-based photoelectrode.

Lee, S.; Noh, J. H.; Bae, S. T.; Cho, I. S.; Kim, J. Y.; Shin, H.; Lee, J. K.; Jung, H. S.; Hong, K. S.

2009-01-01T23:59:59.000Z

311

Interfacial reactions between indium tin oxide and triphenylamine tetramer layers induced by photoirradiation  

Science Conference Proceedings (OSTI)

The effects of photoirradiation on the interfacial chemical reactions between indium tin oxide (ITO) films and layers of triphenylamine tetramer (TPTE) were investigated by using in situ x-ray photoelectron spectroscopy (XPS). Thin TPTE layers deposited onto sputter-deposited ITO films were irradiated with violet light-emitting diodes (peak wavelength: 380 nm). Shifts in the peak positions of spectral components that originated in the organic layer toward the higher binding-energy side were observed in the XPS profiles during the early stages of irradiation. No further peak shifts were observed after additional irradiation. An increase in the ratio of the organic component in the O 1s spectra was also observed during the photoirradiation. The ratio of the organic component increased in proportion to the cube root of the irradiation time. These results suggest that photoirradiation induces an increase in the height of the carrier injection barrier at the interface between TPTE and ITO in the early stages of the irradiation, possibly due to the rapid diffusion controlled formation and growth of an oxidized TPTE layer, which is considered to act as a high resistance layer.

Satoh, Toshikazu; Fujikawa, Hisayoshi [Toyota Central R and D Laboratories, Inc., 41-1 Yokomichi, Nagakute, Aichi 480-1192 (Japan); Yamamoto, Ichiro; Murasaki, Takanori; Kato, Yoshifumi [Toyota Industries Corporation, 8 Chaya, Kyowa, Obu, Aichi 474-8601 (Japan)

2008-05-01T23:59:59.000Z

312

Neutron scattering from elemental indium, the optical model, and the bound-state potential  

Science Conference Proceedings (OSTI)

Neutron differential elastic-scattering cross sections of elemental indium are measured from 4.5 to 10 MeV at incident-energy intervals of {approx}500 keV. Seventy or more differential values are obtained at each incident energy, distributed between {approx}18{degree} and 160{degree}. These experimental results are combined with lower-energy values previously obtained at this laboratory, and with 11 and 14 MeV results in the literature, to form a comprehensive elastic-scattering database extending from {approx}1.5 to 14 MeV. These data are interpreted in terms of a conventional spherical optical model. The resulting potential is extrapolated to the bound-state regime. It is shown that in the middle of the 50--82 neutron shell, the potential derived from the scattering results adequately describes the binding energies of article states, but does not do well for hole states. The latter shortcoming is attributed to the holes states having occupational probabilities sufficiently different from unity, so that the exclusion principle become a factor, and to the rearrangement of the neutron core. 68 refs.

Chiba, S. (Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan)); Guenther, P.T.; Lawson, R.D.; Smith, A.B. (Argonne National Lab., IL (USA))

1990-06-01T23:59:59.000Z

313

Environmental and health aspects of copper-indium-diselenide thin-film photovoltaic modules  

DOE Green Energy (OSTI)

Copper-indium-diselenide (CIS) is a semiconductor compound that can be used to produce thin-film photovoltaic modules. There is on-going research being conducted by various federal agencies and private industries to demonstrate the commercial viability of this material. Because this is a new technology, and because scant information about the health and environmental hazards associated with the use of this material is available, studies have been initiated to characterize the environmental mobility and environmental toxicology of this compound. The objective of these studies is to identify the environmental and health hazards associated with the production, use, and disposal of CIS thin-film photovoltaic modules. The program includes both experimental and theoretical components. Theoretical studies are being undertaken to estimate material flows through the environment for a range of production options as well as use and disposal scenarios. The experimental programs characterize the physical, chemical e.g. leachability and biological parameters e.g. EC{sub 50} in daphnia and algae, and feeding studies in rats.

Steinberger, H. [Fraunhofer Inst. for Solid State Technology, Munich (Germany); Thumm, W.; Freitag, R. [GSF-Inst. of Ecological Chemistry, Oberschleissheim (Germany); Moskowitz, P.D. [Brookhaven National Lab., Upton, NY (United States); Chapin, R. [National Inst. of Environmental Health Sciences, Research Triangle Park, NC (United States)

1994-12-31T23:59:59.000Z

314

Performance enhancement of organic light-emitting diodes by chlorine plasma treatment of indium tin oxide  

SciTech Connect

The characteristics of green phosphorescent organic light-emitting diodes (OLEDs) fabricated on ITO/glass substrates pretreated with low-energy O{sub 2} and Cl{sub 2} plasma were compared. At 20 mA/cm{sup 2}, the OLEDs with O{sub 2} and Cl{sub 2} plasma-treated indium tin oxide (ITO) had voltages of 9.6 and 7.6 eV, and brightness of 9580 and 12380 cd/m{sup 2}, respectively. At {approx}10{sup 4} cd/m{sup 2}, the latter had a 30% higher external quantum efficiency and a 74% higher power efficiency. Photoelectron spectroscopies revealed that Cl{sub 2} plasma treatment created stable In-Cl bonds and raised the work function of ITO by up to 0.9 eV. These results suggest that the better energy level alignment at the chlorinated ITO/organic interface enhances hole injection, leading to more efficient and more reliable operation of the OLEDs. The developed plasma chlorination process is very effective for surface modification of ITO and compatible with the fabrication of various organic electronics.

Cao, X. A.; Zhang, Y. Q. [Department of Computer Science and Electrical Engineering, West Virginia University, Morgantown, West Virginia 26506 (United States)

2012-04-30T23:59:59.000Z

315

The crystallinity and mechanical properties of indium tin oxide coatings on polymer substrates  

SciTech Connect

We present the relationship between the microstructure and mechanical strength of indium tin oxide (ITO) on flexible substrates. With varying thickness (h{sub f}), ITO is deposited on polyethylene terephthalate (PET) by dc magnetron sputtering. The microstructure of ITO is controlled by substrate surface conditions and sputtering parameters. The maximum substrate temperature during deposition is limited to 80 deg. C due to the low glass transition temperature (T{sub g}) of PET. The crystallinity and surface roughness (R{sub rms}) are analyzed by high resolution x-ray diffraction, high resolution transmission electron microscopy, and AFM. The crack resistance of ITO is evaluated by uniaxial tension test. The experimental results reveal that, at a fixed h{sub f}, the degree and quality of crystallinity of ITO are highly improved by increasing sputtering power and the substrate temperature. As the crystallinity is improved, the ratio of preferred growth orientations of (222) to (400) is increased and the degree of peak shifts to lower 2{theta} is decreased. They indicate that the crystallinity is improved as the lattice damage is reduced and film density is increased. The tension test results confirm that, up to a certain h{sub f}, the strength of ITO can be significantly enhanced by improving the microstructures.

Kim, Eun-Hye; Yang, Chan-Woo; Park, Jin-Woo [Department of Materials Science and Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of)

2011-02-15T23:59:59.000Z

316

High density hexagonal boron nitride prepared by hot isostatic pressing in refractory metal containers  

DOE Patents (OSTI)

Boron nitride powder with less than or equal to the oxygen content of starting powder (down to 0.5% or less) is hot isostatically pressed in a refractory metal container to produce hexagonal boron nitride with a bulk density greater than 2.0 g/cc. The refractory metal container is formed of tantalum, niobium, tungsten, molybdenum or alloys thereof in the form of a cansister or alternatively plasma sprayed or chemical vapor deposited onto a powder compact. Hot isostatic pressing at 1800{degrees}C and 30 KSI (206.8 MPa) argon pressure for four hours produces a bulk density of 2.21 g/cc. Complex shapes can be made.

Hoenig, C.L.

1990-12-31T23:59:59.000Z

317

Superstructure of self-aligned hexagonal GaN nanorods formed on nitrided Si(111) surface  

SciTech Connect

We present here the spontaneous formation of catalyst-free, self-aligned crystalline (wurtzite) nanorods on Si(111) surfaces modified by surface nitridation. Nanorods grown by molecular beam epitaxy on bare Si(111) and non-stoichiometric silicon nitride interface are found to be single crystalline but disoriented. Those grown on single crystalline Si{sub 3}N{sub 4} intermediate layer are highly dense c-oriented hexagonal shaped nanorods. The morphology and the self-assembly of the nanorods shows an ordered epitaxial hexagonal superstructure, suggesting that they are nucleated at screw dislocations at the interface and grow spirally in the c-direction. The aligned nanorod assembly shows high-quality structural and optical emission properties.

Kumar, Praveen; Tuteja, Mohit; Kesaria, Manoj; Waghmare, U. V.; Shivaprasad, S. M. [Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bangalore 560 064 (India)

2012-09-24T23:59:59.000Z

318

Understanding the Potential and Limitations of Dilute Nitride Alloys for Solar Cells  

DOE Green Energy (OSTI)

Dilute nitride alloys provide a powerful tool for engineering the band gap and lattice constant of III-V alloys. However, nitrogen degrades the performance of GaAs solar cells. This project seeks to understand and demonstrate the limits of performance of GaInNAs alloys by (a) correlating deep-level transient spectroscopy (DLTS) data with device performance and (b) using molecular beam epitaxy (MBE) to reduce background impurity concentrations.

Kurtz, S.; Ptak, A.; Johnston, S.; Kramer, C.; Young, M.; Friedman, D.; Geisz, J.; McMahon, W.; Kibbler, A.; Olson, J.; Crandall, R.; Branz, H.

2005-11-01T23:59:59.000Z

319

Behavior of molybdenum nitrides as materials for electrochemical capacitors: Comparison with ruthenium oxide  

Science Conference Proceedings (OSTI)

Ruthenium oxide (RuO{sub 2}), formed as a thin film on a Ru or Ti metal substrate, exhibits a large specific (cm{sup {minus}2}) and almost constant, electrochemical capacitance over a 1.35 V range in aqueous H{sub 2}SO{sub 4}. This behavior has led to its investigation and use as a material for fabrication of supercapacitor devices. However, its cost has encouraged search for other materials exhibiting similar behavior. Work reported in the present paper evaluates two nitrides of Mo, Mo{sub 2}N and MoN, as substitutes for RuO{sub 2}. It is shown that very similar capacitance behavior to that of RuO{sub 2} films arises, e.g., in cyclic voltammetry and dc charging curves; in the former, almost mirror-image anodic and cathodic current-response profiles, characteristic of a capacitor, arise. However, the nitride materials have a substantially smaller voltage operating range of only some 0.7 V due to electrochemical decomposition above ca. 0.7 V vs. RHE. This limits their usefulness as a substitute for RuO{sub 2}. Of interest is that the nitride films exhibit potential-decay and potential-recovery on open circuit after respective charge and forced discharge. The decay and recovery processes are logarithmic in time, indicating the role of internal faradaic charge redistribution processes.

Liu, T.C.; Pell, W.G.; Conway, B.E. [Univ. of Ottawa, Ontario (Canada). Dept. of Chemistry; Roberson, S.L. [North Carolina State Univ., Raleigh, NC (United States). Dept. of Materials Science and Engineering

1998-06-01T23:59:59.000Z

320

NIST Manuscript Publication Search  

Science Conference Proceedings (OSTI)

... Abstract: Although the efficiency of the Gallium Nitride (GaN) Light Emitting-Diode (LED) has improved in the past decade, a great opportunity ...

2013-12-19T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


321

Development of a Bulk GaN Growth Technique for Low Defect Density...  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Enabling Next-Generation Power Electronics: Electrochemical Solution Growth (ESG) Technique for Bulk Gallium Nitride Substrates Karen Waldrip Dept. 2546, Advanced Power Sources R&D...

322

Visit the National Academies Press online, the authoritative ...  

Science Conference Proceedings (OSTI)

... of the US electricity generation, and oil prices should not ... swings and a poor heating, ventilating, and air ... to gallium nitride growth is home-built, and ...

2012-09-27T23:59:59.000Z

323

NETL: NEPA Categorical Exclusions - January 2010 to March 2010  

NLE Websites -- All DOE Office Websites (Extended Search)

EEProject Management Center Y 352010 Advanced Epi Tools for Gallium Nitride Light Emitting Diode Devices Applied Materials, Inc. Santa Clara, CA EEBETD Y 352010 Red Birch...

324

Solid-State Lighting: 2012 Solid-State Lighting Manufacturing...  

NLE Websites -- All DOE Office Websites (Extended Search)

Frank Cerio, Veeco Instruments Advanced Epi Tools for Gallium Nitride Light Emitting Diode Devices Vivek Agrawal, Applied Materials Driving Down HB-LED Costs:...

325

Solid-State Lighting Issue 28: Scientific Literature (Mid May...  

NLE Websites -- All DOE Office Websites (Extended Search)

National University of Kaohsiung (Taiwan): "Wavelength shift of gallium nitride light emitting diode with p-down structure." W.H. Lan, IEEE Transactions on Electron Devices,...

326

Categorical Exclusion Determinations: American Recovery and Reinvestme...  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Exclusion Determination Transphorm, Inc. -High Performance Gallium Nitride High Electron Mobility Transistor Modules for Agile Power Electronics CX(s) Applied: B3.6 Date:...

327

Page not found | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Exclusion Determination Transphorm, Inc. -High Performance Gallium Nitride High Electron Mobility Transistor Modules for Agile Power Electronics CX(s) Applied: B3.6 Date:...

328

at-meeting technical program in .pdf format  

Science Conference Proceedings (OSTI)

Jun 24, 1998 ... trical Engr., Walter Scott Engr. Center, Lincoln, NE 68588-0511 USA; ...... Radiative Efficiency of High Quality Gallium Nitride Thin Films: Peter.

329

Analytical and experimental evaluation of joining silicon carbide to silicon carbide and silicon nitride to silicon nitride for advanced heat engine applications Phase 2. Final report  

DOE Green Energy (OSTI)

The purpose of joining, Phase 2 was to develop joining technologies for HIP`ed Si{sub 3}N{sub 4} with 4wt% Y{sub 2}O{sub 3} (NCX-5101) and for a siliconized SiC (NT230) for various geometries including: butt joins, curved joins and shaft to disk joins. In addition, more extensive mechanical characterization of silicon nitride joins to enhance the predictive capabilities of the analytical/numerical models for structural components in advanced heat engines was provided. Mechanical evaluation were performed by: flexure strength at 22 C and 1,370 C, stress rupture at 1,370 C, high temperature creep, 22 C tensile testing and spin tests. While the silicon nitride joins were produced with sufficient integrity for many applications, the lower join strength would limit its use in the more severe structural applications. Thus, the silicon carbide join quality was deemed unsatisfactory to advance to more complex, curved geometries. The silicon carbide joining methods covered within this contract, although not entirely successful, have emphasized the need to focus future efforts upon ways to obtain a homogeneous, well sintered parent/join interface prior to siliconization. In conclusion, the improved definition of the silicon carbide joining problem obtained by efforts during this contract have provided avenues for future work that could successfully obtain heat engine quality joins.

Sundberg, G.J.; Vartabedian, A.M.; Wade, J.A.; White, C.S. [Norton Co., Northboro, MA (United States). Advanced Ceramics Div.

1994-10-01T23:59:59.000Z

330

Chemical thermodynamics of nuclear materials. IX. High temperature heat capacity of plutonium-3. 2 at. % gallium alloy  

Science Conference Proceedings (OSTI)

The heat capacity of delta-stabilized plutonium (Pu - 3.2 at. % Ga) has been determined from 330 to 700/sup 0/K by an adiabatic calorimeter. The heat capacity for this alloy may be expressed by: Cp (Pu-3.2 at. % Ga)/(J K/sup -1/ mol/sup -1/) = 39.249 - 0.0264 (T/K) + 3.595 x 10/sup 5/ (T/K)/sup 2/ - 2.506 x 10/sup 5/ (K/T)/sup 2/. It was found that a large contribution to the heat capacity is due to the electronic heat capacity. The thermal functions for this plutonium-gallium alloy are calculated to 700/sup 0/K.

Adams, R.O.; Oetting, F.L.

1982-01-01T23:59:59.000Z

331

An experiment to test the viability of a gallium-arsenide cathode in a SRF electron gun  

SciTech Connect

Strained gallium arsenide cathodes are used in electron guns for the production of polarized electrons. In order to have a sufficient quantum efficiency lifetime of the cathode the vacuum in the gun must be 10{sup -11} Torr or better, so that the cathode is not destroyed by ion back bombardment or through contamination with residual gases. All successful polarized guns are DC guns, because such vacuum levels can not be obtained in normal conducting RF guns. A superconductive RF gun may provide a sufficient vacuum level due to cryo-pumping of the cavity walls. We report on the progress of our experiment to test such a gun with normal GaAs-Cs crystals.

Kewisch,J.; Ben-Zvi, I.; Rao, T.; Burrill, A.; Pate, D.; Wu, Q.; Todd, R.; Wang, E.; Bluem, H.; Holmes, D.; Schultheiss, T.

2009-05-04T23:59:59.000Z

332

Modifying the Casimir force between indium tin oxide film and Au sphere  

E-Print Network (OSTI)

We present complete results of the experiment on measuring the Casimir force between an Au-coated sphere and an untreated or, alternatively, UV-treated indium tin oxide film deposited on a quartz substrate. Measurements were performed using an atomic force microscope in a high vacuum chamber. The measurement system was calibrated electrostatically. Special analysis of the systematic deviations is performed, and respective corrections in the calibration parameters are introduced. The corrected parameters are free from anomalies discussed in the literature. The experimental data for the Casimir force from two measurement sets for both untreated and UV-treated samples are presented. The experimental errors are determined at a 95% confidence level. It is demonstrated that the UV treatment of an I TO plate results in a significant decrease in the magnitude of the Casimir force (from 21% to 35% depending on separation). However, ellipsometry measurements of the imaginary parts of dielectric permittivities of the untreated and UV-treated samples did not reveal any significant differences. The experimental data are compared with computations in the framework of the Lifshitz theory. It is found that the data for the untreated sample are in a very good agreement with theoretical results taking into account the free charge carriers in an ITO film. For the UV-treated sample the data exclude the theoretical results obtained with account of free charge carriers. These data are in a very good agreement with computations disregarding the contribution of free carriers. According to the explanation provided, this is caused by the phase transition of the ITO film from metallic to dielectric state caused by the UV treatment. Possible applications of the discovered phenomenon in nanotechnology are discussed.

A. A. Banishev; C. -C. Chang; R. Castillo-Garza; G. L. Klimchitskaya; V. M. Mostepanenko; U. Mohideen

2012-01-26T23:59:59.000Z

333

Electronic states at the interface between indium tin oxide and silicon  

Science Conference Proceedings (OSTI)

Electronic properties and thermal stability of interfacial states between indium tin oxide (ITO) and monocrystalline silicon (Si) have been investigated. ITO films with thicknesses of about 300 nm were deposited by dc magnetron sputtering on n- and p-type (100) Si at room temperature. The samples were then annealed for 30 min at different temperatures in the range 100-600 deg. C, and the ITO-Si junction was found to exhibit rectifying behavior. Current-voltage (IV), capacitance-voltage (CV), and deep-level transient spectroscopy (DLTS) measurements have been used to electrically characterize the ITO-Si interface. DLTS measurements on p-type Si samples reveal a dominant hole trap at around 0.37 eV above the valence band edge. In the n-type samples, a broad band of electron traps occur in the range 0.1-0.2 eV below the conduction band edge. These electron traps display wide DLTS peaks, indicating a band of electronic energy levels rather than well-defined states originating from isolated point defects. All the traps in both the p- and n-type samples are found to be located near the ITO-Si interface. Investigations of the thermal stability of the observed electronic states show that the dominant hole trap anneal out after 30 min at 250 deg. C, while the dominant electron traps can be stable up to 500 deg. C. IV and DLTS measurements demonstrate a clear correlation between the annealing of the dominant electronic states and increase in the junction rectification.

Malmbekk, H.; Vines, L.; Monakhov, E. V.; Svensson, B. G. [University of Oslo, Physics Department/Center for Materials Science and Nanotechnology, P.O. Box 1048, Blindern, Oslo N-0316 (Norway)

2011-10-01T23:59:59.000Z

334

Power mixture and green body for producing silicon nitride base articles of high fracture toughness and strength  

DOE Patents (OSTI)

A powder mixture and a green body for producing a silicon nitride-based article of improved fracture toughness and strength are disclosed. The powder mixture includes (a) a bimodal silicon nitride powder blend consisting essentially of about 10-30% by weight of a first silicon nitride powder of an average particle size of about 0.2 [mu]m and a surface area of about 8-12m[sup 2]g, and about 70-90% by weight of a second silicon nitride powder of an average particle size of about 0.4-0.6 [mu]m and a surface area of about 2-4 m[sup 2]/g, (b) about 10-50 percent by volume, based on the volume of the densified article, of refractory whiskers or fibers having an aspect ratio of about 3-150 and having an equivalent diameter selected to produce in the densified article an equivalent diameter ratio of the whiskers or fibers to grains of silicon nitride of greater than 1.0, and (c) an effective amount of a suitable oxide densification aid. The green body is formed from the powder mixture, an effective amount of a suitable oxide densification aid, and an effective amount of a suitable organic binder. No Drawings

Huckabee, M.L.; Buljan, S.T.; Neil, J.T.

1991-09-17T23:59:59.000Z

335

Optical and electrical properties of III-V nitride wide bandgap semiconductors. Annual report, April 1, 1997--May 31, 1998  

SciTech Connect

The objectives of this project were to investigate the optical and electrical properties of III-nitride wide bandgap semiconductors (GaN, InGaN, AlGaN) and quantum wells, to understand the fundamental optical transitions and impurity properties of these materials, to study the physics components of GaN-based devices, and to provide input for new approaches toward the improvement of materials quality and the optimization of device design. We were the first group to employ transport measurement techniques on the persistent photoconductivity (PPC) state to study the impurity properties of III-nitrides. We were also one of the few research groups m in the world to employ picosecond time-resolved photoluminescence (PL) measurement technique to study mechanisms of optical transitions, LED emission, and lasing m in GaN materials. During this funding period, we have investigated a variety of GaN samples and structures grown by MBE as well as by MOCVD. We have also made a significant progress in MOCVD GaN materials growth. This report briefly discusses the following accomplishments: effects of deep level impurities in the AlGaN/GaN heterostructures; materials characterization of III-nitrides alloys; optical studies of III-nitride epilayers and quantum wells; fabrication and optical studies of III-nitride microdisk arrays; and materials growth by MOCVD.

1998-06-01T23:59:59.000Z

336

Low Temperature, Self-nucleated Growth of Indium Tin Oxide Nanostructures by Pulsed Laser Deposition in Argon  

SciTech Connect

Indium tin oxide (ITO) nanostructures were successfully deposited on glass substrate by pulsed laser ablation in argon gas at 250 deg. C. Microstructural changes were observed in the argon gas pressure between 30 to 50 mTorr. The as-grown, nanostructured ITO exhibit In{sub 2}O{sub 3} bixbyite structure orientated at <111> direction. At the initial stage of growth, there was a large number of nucleation sites detected which eventually evolved into needle-like branches. The presence of spheres at the tip of these branches indicates that these nanostructured ITO were likely governed by vapor-liquid-solid (VLS) growth mechanism.

Tan, S. S.; Lee, W. K.; Kee, Y. Y.; Wong, H. Y.; Tou, T. Y. [Faculty of Engineering, Multimedia University, 63100 Cyberjaya (Malaysia)

2011-03-30T23:59:59.000Z

337

The effect of low levels of dopants upon the formation and properties of beta-phase molybdenum nitride  

Science Conference Proceedings (OSTI)

The addition of 1 wt% Pd, Au, Ni and Cu dopants has been demonstrated to strongly alter the morphology of beta-phase molybdenum nitride prepared by treatment of MoO{sub 3} with a 3/1 H{sub 2}/N{sub 2} mixture at 750 deg. C. Furthermore, the addition of Pd significantly enhances the surface area and the formation of the nitride phase. It is proposed that the facile formation of molybdenum bronzes in this system is important in this respect. The dopants have also been observed to modify the denitridation characteristics of the beta-phase, with an overall reduction of the proportion of NH{sub 3} formed upon using a 3/1 H{sub 2}/Ar mixture with respect to the undoped sample. - Graphical abstract: Low levels of Pd, Au, Ni and Cu dopant have significant effects upon the morphology, formation and dentitridation characteristics of beta-phase molybdenum nitride.

Cairns, A.G.; Gallagher, J.G. [WestCHEM, Department of Chemistry, Joseph Black Building, University of Glasgow, Glasgow G12 8QQ (United Kingdom); Hargreaves, J.S.J., E-mail: justinh@chem.gla.ac.u [WestCHEM, Department of Chemistry, Joseph Black Building, University of Glasgow, Glasgow G12 8QQ (United Kingdom); Mckay, D. [WestCHEM, Department of Chemistry, Joseph Black Building, University of Glasgow, Glasgow G12 8QQ (United Kingdom); Rico, J.L., E-mail: jlrico@umich.m [Laboratorio de Catalisis, Facultad de Ingenieria Quimica, Universidad Michoacana, Edificio E, CU, Morelia Mich, C.P. 58060 (Mexico); Wilson, K. [WestCHEM, Department of Chemistry, Joseph Black Building, University of Glasgow, Glasgow G12 8QQ (United Kingdom)

2010-03-15T23:59:59.000Z

338

Distribution of aluminum and indium impurities in crystals of Ge-Si solid solutions grown from the melt  

Science Conference Proceedings (OSTI)

The problem regarding the distribution of aluminum and indium impurities in bulk crystals of solid solutions with a variable composition Ge{sub 1-x}Si{sub x} (0 {<=} x {<=} 0.3) is solved in order to establish regularities of the changes in the segregation coefficients of impurities with variations in the composition of the host lattice in the germanium-silicon system. Aluminum-and indium-doped crystals of Ge{sub 1-x}Si{sub x} (0 {<=} x {<=} 0.3) solid solutions with a silicon content decreasing along the crystallization axis are grown by a modified Bridgman method with the use of a silicon seed. The concentration distribution of impurities over the length of the crystals is determined from Hall measurements. It is demonstrated that the experimental data on the concentration distribution of impurities in the crystals are in good agreement with the results obtained from the theory according to which the equilibrium segregation coefficients of impurities vary linearly with a change in the composition of Ge-Si solid solution crystals.

Kyazimova, V. K. [National Academy of Sciences of Azerbaijan, Institute of Physics (Azerbaijan)], E-mail: zangi@physics.ab.az; Zeynalov, Z. M. [Ganja State University (Azerbaijan); Zakhrabekova, Z. M.; Azhdarov, G. Kh. [National Academy of Sciences of Azerbaijan, Institute of Physics (Azerbaijan)

2006-12-15T23:59:59.000Z

339

Influence of process parameters on properties of reactively sputtered tungsten nitride thin films  

SciTech Connect

Tungsten nitride (WN{sub x}) thin films were produced by reactive dc magnetron sputtering of tungsten in an Ar-N{sub 2} gas mixture. The influence of the deposition power on the properties of tungsten nitride has been analyzed and compared with that induced by nitrogen content variation in the sputtering gas. A combined analysis of structural, electrical and optical properties on thin WN{sub x} films obtained at different deposition conditions has been performed. It was found that at an N{sub 2} content of 14% a single phase structure of W{sub 2}N films was formed with the highest crystalline content. This sputtering gas composition was subsequently used for fabricating films at different deposition powers. Optical analysis showed that increasing the deposition power created tungsten nitride films with a more metallic character, which is confirmed with resistivity measurements. At low sputtering powers the resulting films were crystalline whereas, with an increase of power, an amorphous phase was also present. The incorporation of an excess of nitrogen atoms resulted in an expansion of the W{sub 2}N lattice and this effect was more pronounced at low deposition powers. Infrared analysis revealed that in WN{sub x} films deposited at low power, chemisorbed N{sub 2} molecules did not behave as ligands whereas at high deposition power they clearly appeared as ligands around metallic tungsten. In this study, the influence of the most meaningful deposition parameters on the phase transformation reaction path was established and deposition conditions suitable for producing thermally stable and highly crystalline W{sub 2}N films were found.

Addonizio, Maria L.; Castaldo, Anna; Antonaia, Alessandro; Gambale, Emilia; Iemmo, Laura [ENEA, Portici Research Centre, Piazzale E. Fermi 1, I-80055, Portici (Italy)

2012-05-15T23:59:59.000Z

340

III-antimonide/nitride based semiconductors for optoelectronic materials and device studies : LDRD 26518 final report.  

DOE Green Energy (OSTI)

The goal of this LDRD was to investigate III-antimonide/nitride based materials for unique semiconductor properties and applications. Previous to this study, lack of basic information concerning these alloys restricted their use in semiconductor devices. Long wavelength emission on GaAs substrates is of critical importance to telecommunication applications for cost reduction and integration into microsystems. Currently InGaAsN, on a GaAs substrate, is being commercially pursued for the important 1.3 micrometer dispersion minima of silica-glass optical fiber; due, in large part, to previous research at Sandia National Laboratories. However, InGaAsN has not shown great promise for 1.55 micrometer emission which is the low-loss window of single mode optical fiber used in transatlantic fiber. Other important applications for the antimonide/nitride based materials include the base junction of an HBT to reduce the operating voltage which is important for wireless communication links, and for improving the efficiency of a multijunction solar cell. We have undertaken the first comprehensive theoretical, experimental and device study of this material with promising results. Theoretical modeling has identified GaAsSbN to be a similar or potentially superior candidate to InGaAsN for long wavelength emission on GaAs. We have confirmed these predictions by producing emission out to 1.66 micrometers and have achieved edge emitting and VCSEL electroluminescence at 1.3 micrometers. We have also done the first study of the transport properties of this material including mobility, electron/hole mass, and exciton reduced mass. This study has increased the understanding of the III-antimonide/nitride materials enough to warrant consideration for all of the target device applications.

Kurtz, Steven Ross; Hargett, Terry W.; Serkland, Darwin Keith; Waldrip, Karen Elizabeth; Modine, Normand Arthur; Klem, John Frederick; Jones, Eric Daniel; Cich, Michael Joseph; Allerman, Andrew Alan; Peake, Gregory Merwin

2003-12-01T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


341

Annealing effects in hydrogenated silicon nitride films during high energy ion beam irradiation  

SciTech Connect

The annealing effects during energy recoil detection (ERD) analysis on the structure of hydrogenated silicon nitride film have been investigated by using fourier transform infrared (FTIR) spectroscopy. Hydrogenated silicon nitride films were prepared by plasma enhanced chemical vapor deposition with various substrate temperatures. A 2.5 MeV {sup 4}He{sup ++} ion beam was irradiated onto the film in a vacuum chamber at room temperature. The ERD signal was measured after various ion doses in order to determine the loss of hydrogen counts induced by the ion beam. The IR absorption spectrum was obtained in order to follow the film structural change which occurred due to the ion beam. The films deposited at 200 and 300 C show a significant decrease in the ERD count with increasing ion beam dose, while the film deposited at 400 C, shows no significant changes. The IR absorption peak position for Si-N stretching (830 cm{sup {minus}1}) shifted to smaller wave numbers after ion beam irradiation, while the Si-H stretching (2,160 cm{sup {minus}1}) shifted to the opposite direction. The peak position for N-H (3,360 cm{sup {minus}1}) shows no noticeable changes. Normalized peak area for the Si-N stretching increased after ion beam irradiation. The Si-H peak area decreased slightly. The N-H peak area decreased significantly. A recombination mechanism of the N and H radicals with excess Si radical coming from Si-Si bonds in Si-rich silicon nitride films has been suggested to explain the IR absorption spectral changes which have occurred due to ion beam irradiation.

Lee, J.W. [ETRI, Taejon (Korea, Republic of)]|[KAIST, Taejon (Korea, Republic of); Lee, S.H.; Yoo, H.J. [ETRI, Taejon (Korea, Republic of); Jhon, M.S.; Ryoo, R. [KAIST, Taejon (Korea, Republic of)

1995-09-01T23:59:59.000Z

342

The development of a porous silicon nitride crossflow filter; Final report, September 1988--September 1992  

Science Conference Proceedings (OSTI)

This report summarizes the work performed in developing a permeable form of silicon nitride for application to ceramic crossflow filters for use in advanced coal-fired electric power plants. The program was sponsored by the Department of Energy Morgantown Energy Technology Center and consisted of a design analysis and material development phase and a filter manufacture and demonstration phase. The crossflow filter design and operating requirements were defined. A filter design meeting the requirements was developed and thermal and stress analyses were performed. Material development efforts focused initially on reaction-bonded silicon nitride material. This approach was not successful, and the materials effort was refocused on the development of a permeable form of sintered silicon nitride (SSN). This effort was successful. The SSN material was used for the second phase of the program, filter manufacture and evaluation. Four half-scale SAN filter modules were fabricated. Three of the modules were qualified for filter performance tests. Tests were performed on two of the three qualified modules in the High-Temperature, High-Pressure facility at the Westinghouse Science and Technology Center. The first module failed on test when it expanded into the clamping device, causing dust leakage through the filter. The second module performed well for a cumulative 150-hr test. It displayed excellent filtration capability during the test. The blowback pulse cleaning was highly effective, and the module apparently withstood the stresses induced by the periodic pulse cleaning. Testing of the module resumed, and when the flow of combustion gas through the filter was doubled, cracks developed and the test was concluded.

NONE

1992-09-01T23:59:59.000Z

343

Very long single- and few-walled boron nitride nanotubes via the pressurized vapor/condenser method  

Science Conference Proceedings (OSTI)

Boron nitride nanotubes (BNNTs) are desired for their exceptional mechanical, electronic, thermal, structural, textural, optical, and quantum properties. A new method for producing long, small-diameter, single- and few-walled, boron nitride nanotubes (BNNTs) in macroscopic quantities is reported. The pressurized vapor/condenser (PVC) method produces, without catalysts, highly crystalline, very long, small-diameter, BNNTs. Palm-sized, cotton-like masses of BNNT raw material were grown by this technique and spun directly into centimeters-long yarn. Nanotube lengths were observed to be 100 times that of those grown by the most closely related method. Self-assembly and growth models for these long BNNTs are discussed.

Michael W. Smith, Kevin Jordan, Cheol Park, Jae-Woo Kim, Peter Lillehei, Roy Crooks, Joycelyn Harrison

2009-11-01T23:59:59.000Z

344

Three novel indium MOFs derived from dicarboxylate ligands: Syntheses, structures and photoluminescent properties  

Science Conference Proceedings (OSTI)

The self-assembly of InCl{sub 3} with 1,4-phenylenediacetic acid (1,4-H{sub 2}pda), 1,3-benzendicarboxylic acid (1,3-H{sub 2}bdc) and 1,4-cyclohexanedicarboxylic acid (1,4- H{sub 2}chdc) generates three new In(III) MOFs, (Me{sub 2}NH{sub 2})[In(cis-1,4-pda){sub 2}] (1), HIn(1,3-bdc){sub 2}{center_dot}2DMF (2) and In(OH)(trans-1,4-chdc) (3) (Me{sub 2}NH=dimethylamine, DMF=N, N'-dimethylformamide). Compound 1 displays a novel 1D no-planar double chain. Although a mixture of cis- and trans-1,4-H{sub 2}pda was used, the product of compound 1 is a single phase with only cis-pda{sup 2-} ligands. Compound 2 possesses a 2D square lattice with sql topology. Interestingly, in compound 2, the 4-connected building unit containing InO{sub 6} octahedron is firstly occurred in In-MOFs. Compound 3 is built up from the infinite metal-oxide chains cross-linked by trans-1,4-chdc{sup 2-} to form 3D framework with rhombus-shaped channels. Furthermore, compounds 1-3 present intense solid-state fluorescent emissions at room temperature. - Graphical abstract: Three new In-MOFs based on different dicaboxylate acids display 1D chain, 2D layer and 3D open-framework, respectively and show strong luminescence emissions at room temperature. Highlights: Black-Right-Pointing-Pointer Three new indium metal-organic frameworks have been solvothermal synthesized. Black-Right-Pointing-Pointer The structural variation is attributed to the diverse coordination modes of ligands. Black-Right-Pointing-Pointer Compounds 1-3 exhibit 1D double chain, 2D layer and 3D open-framework, respectively. Black-Right-Pointing-Pointer These compounds exhibit strong solid-state luminescence emission at room temperature.

Wang Liping; Song Tianyou; Li Chao; Xia Jing; Wang Shengyan [College of Chemistry, Jilin University, Changchun 130012 (China); Wang Li, E-mail: lwang99@jlu.edu.cn [College of Chemistry, Jilin University, Changchun 130012 (China); Xu Jianing [State Key Laboratory of Inorganic Synthesis and Preparative Chemistry, College of Chemistry, Jilin University, Changchun 130012 (China)

2012-06-15T23:59:59.000Z

345

Strength and fatigue of NT551 silicon nitride and NT551 diesel exhaust valves  

DOE Green Energy (OSTI)

The content of this report is excerpted from Mark Andrew's Ph.D. Thesis (Andrews, 1999), which was funded by a DOE/OTT High Temperature Materials Laboratory Graduate Fellowship. It involves the characterization of NT551 and valves fabricated with it. The motivations behind using silicon nitride (Si{sub 3}N{sub 4}) as an exhaust valve for a diesel engine are presented in this section. There are several economic factors that have encouraged the design and implementation of ceramic components for internal combustion (IC) engines. The reasons for selecting the diesel engine valve for this are also presented.

Andrews, M.J.; Werezczak, A.A.; Kirkland, T.P.; Breder, K.

2000-02-01T23:59:59.000Z

346

Rf-plasma synthesis of nanosize silicon carbide and nitride. Final report  

DOE Green Energy (OSTI)

A pulsed rf plasma technique is capable of generating ceramic particles of 10 manometer dimension. Experiments using silane/ammonia and trimethylchlorosilane/hydrogen gas mixtures show that both silicon nitride and silicon carbide powders can be synthesized with control of the average particle diameter from 7 to 200 nm. Large size dispersion and much agglomeration appear characteristic of the method, in contrast to results reported by another research group. The as produced powders have a high hydrogen content and are air and moisture sensitive. Post-plasma treatment in a controlled atmosphere at elevated temperature (800{degrees}C) eliminates the hydrogen and stabilizes the powder with respect to oxidation or hydrolysis.

Buss, R.J.

1997-02-01T23:59:59.000Z

347

Light output enhancement of InGaN/GaN light-emitting diodes with contrasting indium tin-oxide nanopatterned structures  

Science Conference Proceedings (OSTI)

Various nanopatterns on the transparent conducting indium tin oxide (ITO) layer are investigated to enhance the light extraction efficiency of the InGaN/GaN light-emitting diodes (LEDs). Triangular, square, and circular nanohole patterns with the square ...

Sang Hyun Jung, Keun Man Song, Young Su Choi, Hyeong-Ho Park, Hyun-Beom Shin, Ho Kwan Kang, Jaejin Lee

2013-01-01T23:59:59.000Z

348

Reduction in interface state density of Al{sub 2}O{sub 3}/InGaAs metal-oxide-semiconductor interfaces by InGaAs surface nitridation  

Science Conference Proceedings (OSTI)

We report the decrease in interface trap density (D{sub it}) in Al{sub 2}O{sub 3}/InGaAs metal-oxide-semiconductor (MOS) capacitors by using electron cyclotron resonance plasma nitridation of the InGaAs surfaces. The impact of the nitridation process on the MOS interface properties is quantitatively examined. The plasma nitridation process is observed to form a nitrided layer at the InGaAs surface. The nitridation using microwave power (P{sub microwave}) of 250 W and nitridation time (t{sub nitridation}) of 420 s can form Al{sub 2}O{sub 3}/InGaAs MOS interfaces with a minimum D{sub it} value of 2.0 Multiplication-Sign 10{sup 11} cm{sup -2} eV{sup -1}. On the other hand, the nitridation process parameters such as P{sub microwave} and t{sub nitridation} are found to strongly alter D{sub it} (both decrease and increase are observed) and capacitance equivalent thickness (CET). It is found that the nitridation with higher P{sub microwave} and shorter t{sub nitridation} can reduce D{sub it} with less CET increase. Also, it is observed that as t{sub nitridation} increases, D{sub it} decreases first and increases later. It is revealed from XPS analyses that minimum D{sub it} can be determined by the balance between the saturation of nitridation and the progress of oxidation. As a result, it is found that the superior MOS interface formed by the nitridation is attributable to the existence of oxide-less InGaN/InGaAs interfaces.

Hoshii, Takuya; Lee, Sunghoon; Suzuki, Rena; Taoka, Noriyuki; Yokoyama, Masafumi; Takenaka, Mitsuru; Takagi, Shinichi [Department of Electrical Engineering and Information Systems, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Yamada, Hishashi; Hata, Masahiko [Sumitomo Chemical Co. Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294 (Japan); Yasuda, Tetsuji [National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568 (Japan)

2012-10-01T23:59:59.000Z

349

Structural Transformations in Ceramics: Perovskite-like Oxides and Group III, IV, and V Nitrides  

SciTech Connect

1 Overview of Results and their Significance Ceramic perovskite-like oxides with the general formula (A. A0. ...)(B. B0. ...)O3and titanium-based oxides are of great technological interest because of their large piezoelectric and dielectric response characteristics.[1] In doped and nanoengineered forms, titantium dioxide finds increasing application as an organic and hydrolytic photocatalyst. The binary main-group-metal nitride compounds have undergone recent advancements of in-situ heating technology in diamond anvil cells leading to a burst of experimental and theoretical interest. In our DOE proposal, we discussed our unique theoretical approach which applies ab initio electronic calculations in conjunction with systematic group-theoretical analysis of lattice distortions to study two representative phase transitions in ceramic materials: (1) displacive phase transitions in primarily titanium-based perovskite-like oxide ceramics, and (2) reconstructive phase transitions in main-group nitride ceramics. A sub area which we have explored in depth is doped titanium dioxide electrical/optical properties.

James P. Lewis (PI, former Co-PI), Dorian M. Hatch (Co-PI, former PI), and Harold T. Stokes (Co-PI)

2006-12-31T23:59:59.000Z

350

Ferromagnetism in Doped Thin-Film Oxide and Nitride Semiconductors and Dielectrics  

SciTech Connect

The principal goal in the field of high-Tc ferromagnetic semiconductors is the synthesis, characterization and utilization of semiconductors which exhibit substantial carrier spin polarization at and above room temperature. Such materials are of critical importance in the emerging field of semiconductor spintronics. The interaction leading to carrier spin polarization, exchange coupling between the dopant spins and the valence or conduction band, is known to be sufficiently weak in conventional semiconductors, such as GaAs and Si, that magnetic ordering above cryogenic temperatures is essentially impossible. Since the provocative theoretical predictions of Tc above ambient in p-Mn:ZnO and p-Mn:GaN (T. Dietl et al., Science 287 1019 (2000)), and the observation of room-temperature ferromagnetism in Co:TiO2 anatase (Y. Matsumoto et al., Science 291 854 (2001)), there has been a flurry of work in oxides and nitrides doped with transition metals with unpaired d electrons. It has even been claimed that room-temperature ferromagnetism can be obtained in certain d0 transition metals oxides without a dopant. In this Report, the field of transition metal doped oxides and nitrides is critically reviewed and assessed from a materials science perspective. Since much of the field centers around thin film growth, this Report focuses on films prepared not only by conventional vacuum deposition methods, but also by spin coating colloidal nanoparticles.

Chambers, Scott A.

2006-10-01T23:59:59.000Z

351

Diffusion Barrier Properties of Nitride-Based Coatings on Fuel Cladding  

SciTech Connect

In this work titanium nitride (TiN) and zirconium nitride (ZrN) coatings are proposed as diffusion barriers between stainless steel nuclear fuel cladding and lanthanide fission products. TiN and ZrN have been coated as barrier materials between pure Fe and Ce, i.e. diffusion couples of Fe/TiN/Ce and Fe/ZrN/Ce, annealed up to a temperature of 600 degrees C, and compared to the diffusion behavior of uncoated Fe/Ce. Backscattered electron images and electron dispersive X-ray spectroscopy measurements confirm that, with a 500 nm TiN or ZrN layer, no obvious diffusion is observed between Fe and Ce. Basic diffusion characteristics of the Fe/Ce couple have also been measured and compared with the TiN and ZrN coated ones. The results strongly advocate that TiN and ZrN coatings provide reliable diffusion barrier characteristics against Ce and possibly other lanthanide fission products.

Fauzia Khatkhatay; Jie Jian; Liang Jiao; Qing Su; Jian Gan; James I. Cole; Haiyan Wang

2013-12-01T23:59:59.000Z

352

Power mixture and green body for producing silicon nitride base & articles of high fracture toughness and strength  

DOE Patents (OSTI)

A powder mixture and a green body for producing a silicon nitride-based article of improved fracture toughness and strength. The powder mixture includes 9a) a bimodal silicon nitride powder blend consisting essentially of about 10-30% by weight of a first silicon mitride powder of an average particle size of about 0.2 .mu.m and a surface area of about 8-12m.sup.2 g, and about 70-90% by weight of a second silicon nitride powder of an average particle size of about 0.4-0.6 .mu.m and a surface area of about 2-4 m.sup.2 /g, (b) about 10-50 percent by volume, based on the volume of the densified article, of refractory whiskers or fibers having an aspect ratio of about 3-150 and having an equivalent diameter selected to produce in the densified articel an equivalent diameter ratio of the whiskers or fibers to grains of silicon nitride of greater than 1.0, and (c) an effective amount of a suitable oxide densification aid. The green body is formed from the powder mixture, an effective amount of a suitable oxide densification aid, and an effective amount of a suitable organic binder.

Huckabee, Marvin L. (Marlboro, MA); Buljan, Sergej-Tomislav (Acton, MA); Neil, Jeffrey T. (Acton, MA)

1991-01-01T23:59:59.000Z

353

Transparent and Conductive Carbon Nanotube Multilayer Thin Films Suitable as an Indium Tin Oxide Replacement  

E-Print Network (OSTI)

Transparent electrodes made from metal oxides suffer from poor flexibility and durability. Highly transparent and electrically conductive thin films based on carbon nanotubes (CNTs) were assembled as a potential indium tin oxide (ITO) replacement using layer-by-layer (LbL) assembly. The ultimate objective of this dissertation work is to produce CNT-based assemblies with sheet resistance below 100 Omega/sq and visible light transmission greater than 85 percent. The alternate deposition of positively charged poly(diallyldimethylammonium chloride) [PDDA] and CNTs stabilized with negatively charged deoxycholate (DOC) exhibit linear film growth and thin film properties can be precisely tuned. Ellipsometry, quartz crystal microbalance, and UV-vis were used to measure the growth of these films as a function of PDDA-CNT bilayers deposited, while TEM, SEM, and AFM were used to visualize the nanostructure of these films. Following a literature review describing potential ITO substitutes and LbL technology, the influence of CNT type on optoelectronic performance of LbL assemblies is described. Three different types of nanotubes were investigated: (1) multiwalled carbon nanotubes (MWNTs), (2) few-walled carbon nanotubes (FWNT), and (3) purified single-walled carbon nanotubes (SWNTs). SWNTs produced the most transparent (>85 percent visible light transmittance) and electrically conductive (148 S/cm, 1.62 kOmega/sq) 20-bilayer films with a 41.6 nm thickness, while MWNT-based films are much thicker and more opaque. A 20-bilayer PDDA/(MWNT DOC) film is approximately 103 nm thick, with a conductivity of 36 S/cm and a transmittance of 30 percent. In an effort to improve both transparency and electrical conductivity, heat and acid treatments were studied. Heating films to 300 degree C reduced sheet resistance to 701 Omega/sq (618 S/cm conductivity, 38.4 nm thickness), with no change in transparency, owing to the removal of insulating component in the film. Despite improving conductivity, heating is not compatible with most plastic substrates, so acid doping was investigated as an alternate means to enhance properties. Exposing SWNT-based assemblies to HNO3 vapor reduced sheet resistance of a 10 BL film to 227 Omega/sq. Replacing SWNTs with double walled carbon nanotubes (DWNTs) provided further reduction in sheet resistance due to the greater metallic of DWNT. A 5 BL DWNT film exhibited the lowest 104 Omega/sq sheet resistance (4200 S/cm conductivity, 22.9 nm thickness) with 84 percent transmittance after nitric acid treatment. DWNT-based assemblies maintained their low sheet resistance after repeated bending and also showed electrochemical stability relative to ITO. This work demonstrates the excellent optoelectronic performance, mechanical flexibility, and electrochemical stability of CNT-based assemblies, which are potentially useful as flexible transparent electrodes for a variety of flexible electronics.

Park, Yong Tae

2011-05-01T23:59:59.000Z

354

Low energy solar neutrino experiments: The Soviet American Gallium Experiment (SAGE). Final report, August 12, 1988--October 31, 1994  

SciTech Connect

Two {sup 71}Ga experiments are currently in operation. The first is the 60 ton Soviet American Gallium Experiment (SAGE) at Baksan, which has recently reported a signal level of 73+18/{minus}16(stat)+5/{minus}7(syst) SNU; the second is the 30 ton GALLEX experiment at Gran Sasso, which sees 87{+-}14{+-}7 SNU. Both results are consistent, and both suggest a neutrino flux level low compared to the total expected from standard solar model calculations. It is not possible, however, to make a case for flux levels lower than the p-p prediction. Assuming the experiments are correct (Neutrino source calibrations are planned for both SAGE and GALLEX in the near future.), it is not at all clear yet whether the answer lies with the neutrino physics, solar physics, or a combination of both. Nevertheless, though solar model effects cannot be ruled out, if the Homestake and Kamiokande results are taken at face value, then these two experiments alone imply that neutrino oscillations or some similar particle physics result must be present to some degree. This report reviews the SAGE experiment and recent results. Non-radiochemical experiments are also discussed, with an emphasis on the Kamiokande water Cerenkov results.

NONE

1995-04-01T23:59:59.000Z

355

Reversible wettability of electron-beam deposited indium-tin-oxide driven by ns-UV irradiation  

Science Conference Proceedings (OSTI)

Indium tin oxide (ITO) is one of the most widely used semiconductor oxides in the field of organic optoelectronics, especially for the realization of anode contacts. Here the authors report on the control of the wettability properties of ITO films deposited by reactive electron beam deposition and irradiated by means of nanosecond-pulsed UV irradiation. The enhancement of the surface water wettability, with a reduction of the water contact angle larger than 50 deg., is achieved by few tens of seconds of irradiation. The analyzed photo-induced wettability change is fully reversible in agreement with a surface-defect model, and it can be exploited to realize optically transparent, conductive surfaces with controllable wetting properties for sensors and microfluidic circuits.

Persano, Luana [NNL, National Nanotechnology Laboratory of CNR-Istituto Nanoscienze, Universita del Salento, via Arnesano, I-73100 Lecce (Italy); Center for Biomolecular Nanotechnologies UNILE, Istituto Italiano di Tecnologia, Via Barsanti, I-73010 Arnesano-LE (Italy); Del Carro, Pompilio [NNL, National Nanotechnology Laboratory of CNR-Istituto Nanoscienze, Universita del Salento, via Arnesano, I-73100 Lecce (Italy); Pisignano, Dario [NNL, National Nanotechnology Laboratory of CNR-Istituto Nanoscienze, Universita del Salento, via Arnesano, I-73100 Lecce (Italy); Center for Biomolecular Nanotechnologies UNILE, Istituto Italiano di Tecnologia, Via Barsanti, I-73010 Arnesano-LE (Italy); Dipartimento di Matematica e Fisica ''Ennio De Giorgi'', Universita del Salento, via Arnesano, I-73100 Lecce (Italy)

2012-04-09T23:59:59.000Z

356

The effect of hydrogen-plasma and PECVD-nitride deposition on bulk and surface passivation in string-ribbon silicon solar cells  

DOE Green Energy (OSTI)

We have investigated whether an in-situ hydrogen or ammonia rf-plasma treatment prior to a PECVD-nitride deposition would promote bulk defect passivation independently of surface effects. We also studied whether the predeposition of a thin silicon-nitride protective layer vbefore performing the plasma treatment would serve to minimize surface damage. We found that for the limited set of deposition conditions in of cells processed using the used five different deposition strategies and compared the resulting cell performance with that investigated so far, the direct deposition of PECVD-nitride produces the best cells on String Ribbon silicon wafers to date, with efficiencies up to 14.5%. Hydrogen and ammonia plasma pretreatments without a protective nitride layer resulted in better bulk passivation, but damaged surfaces. Pretreatments after deposition of the protective layer produced the best surface passivation, but were not effective in passivating the bulk.

Ruby, D.S. [Sandia National Labs., Albuquerque, NM (United States); Wilbanks, W.L.; Fleddermann, C.B. [New Mexico Univ., Albuquerque, NM (United States); Hanoka, J.I. [Evergreen Solar Inc., Waltham, MA (United States)

1995-12-01T23:59:59.000Z

357

LATE NEWS: KK3, Non-Catalytic Synthesis of GaN Nanostructures ...  

Science Conference Proceedings (OSTI)

We have observed the synthesis of gallium nitride (GaN) nanopowders on boron ... as 400C. The synthesis process is based on the reaction between gallium atoms from the decomposition of gallium acetylacetonate and ammonia gas molecules. ... the crystal structure and growth mechanism of the grown nanostructures.

358

BridgeLux | Open Energy Information  

Open Energy Info (EERE)

BridgeLux BridgeLux Jump to: navigation, search Logo: BridgeLux Name BridgeLux Address 1170 Sonora Court Place Sunnyvale, California Zip 94086 Sector Efficiency Product Designs and makes high power indium gallium nitride light emitting diodes Website http://www.bridgelux.com/ Coordinates 37.371138°, -121.998365° Loading map... {"minzoom":false,"mappingservice":"googlemaps3","type":"ROADMAP","zoom":14,"types":["ROADMAP","SATELLITE","HYBRID","TERRAIN"],"geoservice":"google","maxzoom":false,"width":"600px","height":"350px","centre":false,"title":"","label":"","icon":"","visitedicon":"","lines":[],"polygons":[],"circles":[],"rectangles":[],"copycoords":false,"static":false,"wmsoverlay":"","layers":[],"controls":["pan","zoom","type","scale","streetview"],"zoomstyle":"DEFAULT","typestyle":"DEFAULT","autoinfowindows":false,"kml":[],"gkml":[],"fusiontables":[],"resizable":false,"tilt":0,"kmlrezoom":false,"poi":true,"imageoverlays":[],"markercluster":false,"searchmarkers":"","locations":[{"text":"","title":"","link":null,"lat":37.371138,"lon":-121.998365,"alt":0,"address":"","icon":"","group":"","inlineLabel":"","visitedicon":""}]}

359

CX-005363: Categorical Exclusion Determination | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

5363: Categorical Exclusion Determination 5363: Categorical Exclusion Determination CX-005363: Categorical Exclusion Determination Solar Junction's 100 Megawatt Manufacturing Line CX(s) Applied: B1.31 Date: 03/04/2011 Location(s): San Jose, California Office(s): Loan Guarantee Program Office The Department of Energy's proposed action is to issue a loan guarantee to Solar Junction to finance a 100 megawatt (MW) solar cell manufacturing line for multifunction photovoltaic solar cells to expand their existing 7 MW Demonstration Facility at 401 Charcot Avenue, San Jose, California 95131. The proposed project will commercialize an entirely new class of high-efficiency solar cells and concentrating photovoltaic components that incorporate high performance junctions formed with a tunable band gap semiconductor material, Gallium Indium Nitride Arsenide.

360

BridgeLux Inc former eLite Optoelectronics | Open Energy Information  

Open Energy Info (EERE)

BridgeLux Inc former eLite Optoelectronics BridgeLux Inc former eLite Optoelectronics Jump to: navigation, search Name BridgeLux Inc (former eLite Optoelectronics) Place Sunnyvale, California Zip 94086 Product Developer and provider of indium gallium nitride light emitting diodes (InGaN LEDs) for solid state lighting, mobile appliance, signage, and automotive applications. References BridgeLux Inc (former eLite Optoelectronics)[1] LinkedIn Connections CrunchBase Profile No CrunchBase profile. Create one now! This article is a stub. You can help OpenEI by expanding it. BridgeLux Inc (former eLite Optoelectronics) is a company located in Sunnyvale, California . References ↑ "BridgeLux Inc (former eLite Optoelectronics)" Retrieved from "http://en.openei.org/w/index.php?title=BridgeLux_Inc_former_eLite_Optoelectronics&oldid=34303

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361

Gold Nanoparticles Supported on Carbon Nitride: Influence of Surface Hydroxyls on Low Temperature Carbon Monoxide Oxidation  

SciTech Connect

This paper reports the synthesis of 2.5 nm gold clusters on the oxygen free and chemically labile support carbon nitride (C3N4). Despite having small particle sizes and high enough water partial pressure these Au/C3N4 catalysts are inactive for the gas phase and liquid phase oxidation of carbon monoxide. The reason for the lack of activity is attributed to the lack of surface OH groups on the C3N4. These OH groups are argued to be responsible for the activation of CO in the oxidation of CO. The importance of basic OH groups explains the well document dependence of support isoelectric point versus catalytic activity.

Singh, Joseph A [ORNL; Dudney, Nancy J [ORNL; Li, Meijun [ORNL; Overbury, Steven {Steve} H [ORNL; Veith, Gabriel M [ORNL

2012-01-01T23:59:59.000Z

362

Vacancies in fully hydrogenated boron nitride layer: implications for functional nanodevices  

SciTech Connect

Using density functional theory, a series of calculations of structural and electronic properties of hydrogen vacancies in a fully hydrogenated boron nitride (fH-BN) layer were conducted. By dehydrogenating the fH-BN structure, B-terminated vacancies can be created which induce complete spin polarization around the Fermi level, irrespective of the vacancy size. On the contrary, the fH-BN structure with N-terminated vacancies can be a small-gap semiconductor, a typical spin gapless semiconductor, or a metal depending on the vacancy size. Utilizing such vacancy-induced band gap and magnetism changes, possible applications in spintronics are proposed, and a special fH-BN based quantum dot device is designed.

Zhou, Yungang; Wang, Zhiguo; Nie, JL; Yang, Ping; Sun, Xin; Khaleel, Mohammad A.; Zu, Xiaotao; Gao, Fei

2012-03-01T23:59:59.000Z

363

Picosecond laser structuration under high pressures: Observation of boron nitride nanorods  

SciTech Connect

We report on picosecond UV-laser processing of hexagonal boron nitride (BN) at moderately high pressures above 500 bar. The main effect is specific to the ambient gas and laser pulse duration in the ablation regime: when samples are irradiated by 5 or 0.45 ps laser pulses in nitrogen gas environment, multiple nucleation of a new crystalline product-BN nanorods-takes place. This process is triggered on structural defects, which number density strongly decreases upon recrystallization. Nonlinear photon absorption by adsorbed nitrogen molecules is suggested to mediate the nucleation growth. High pressure is responsible for the confinement and strong backscattering of ablation products. A strong surface structuring also appears at longer 150 ps laser irradiation in similar experimental conditions. However, the transformed product in this case is amorphous strongly contaminated by boron suboxides B{sub x}O{sub y}.

Museur, Luc [Laboratoire de Physique des Lasers-LPL CNRS, Institut Galilee, Universite Paris 13, 93430 Villetaneuse (France); Petitet, Jean-Pierre; Kanaev, Andrei V. [Laboratoire d' Ingenierie des Materiaux et des Hautes Pressions-LIMHP CNRS, Institut Galilee, Universite Paris 13, 93430 Villetaneuse (France); Michel, Jean-Pierre [Laboratoire d' Ingenierie des Materiaux et des Hautes Pressions-LIMHP CNRS, Institut Galilee, Universite Paris 13, 93430 Villetaneuse (France); Laboratoire des Proprietes Mecaniques et Thermodynamiques des Materiaux-LPMTM CNRS, Institut Galilee, Universite Paris 13, 93430 Villetaneuse (France); Marine, Wladimir [Centre Interdisciplinaire de Nanoscience de Marseille-CINaM, UPR CNRS 3118, Faculte des Science de Luminy, 13288 Marseille (France); Anglos, Demetrios [Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas (IESL-FORTH), 71110 Heraklion, Crete (Greece); Fotakis, Costas [Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas (IESL-FORTH), 71110 Heraklion, Crete (Greece); Department of Physics, University of Crete, Heraklion, Crete (Greece)

2008-11-01T23:59:59.000Z

364

Steel bonded dense silicon nitride compositions and method for their fabrication  

DOE Patents (OSTI)

A two-stage bonding technique for bonding high density silicon nitride and other ceramic materials to stainless steel and other hard metals, and multilayered ceramic-metal composites prepared by the technique are disclosed. The technique involves initially slurry coating a surface of the ceramic material at about 1500/sup 0/C in a vacuum with a refractory material and the stainless steel is then pressure bonded to the metallic coated surface by brazing it with nickel-copper-silver or nickel-copper-manganese alloys at a temperature in the range of about 850/sup 0/ to 950/sup 0/C in a vacuum. The two-stage bonding technique minimizes the temperature-expansion mismatch between the dissimilar materials.

Landingham, R.L.; Shell, T.E.

1985-05-20T23:59:59.000Z

365

Energy transfer and 1.54 {mu}m emission in amorphous silicon nitride films  

Science Conference Proceedings (OSTI)

Er-doped amorphous silicon nitride films with various Si concentrations (Er:SiN{sub x}) were fabricated by reactive magnetron cosputtering followed by thermal annealing. The effects of Si concentrations and annealing temperatures were investigated in relation to Er emission and excitation processes. Efficient excitation of Er ions was demonstrated within a broad energy spectrum and attributed to disorder-induced localized transitions in amorphous Er:SiN{sub x}. A systematic optimization of the 1.54 {mu}m emission was performed and a fundamental trade-off was discovered between Er excitation and emission efficiency due to excess Si incorporation. These results provide an alternative approach for the engineering of sensitized Si-based light sources and lasers.

Yerci, S.; Li, R. [Department of Electrical and Computer Engineering, Boston University, 8 Saint Mary's Street, Boston, Massachusetts 02215-2421 (United States); Kucheyev, S. O.; Buuren, T. van [Lawrence Livermore National Laboratory, Livermore, California 94551 (United States); Basu, S. N. [Division of Materials Science and Engineering, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts 02446 (United States); Department of Mechanical Engineering, Boston University, 110 Cummington Street, Boston, Massachusetts 02215 (United States); Dal Negro, L. [Department of Electrical and Computer Engineering, Boston University, 8 Saint Mary's Street, Boston, Massachusetts 02215-2421 (United States); Division of Materials Science and Engineering, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts 02446 (United States)

2009-07-20T23:59:59.000Z

366

Dilute Group III-V nitride intermediate band solar cells with contact blocking layers  

DOE Patents (OSTI)

An intermediate band solar cell (IBSC) is provided including a p-n junction based on dilute III-V nitride materials and a pair of contact blocking layers positioned on opposite surfaces of the p-n junction for electrically isolating the intermediate band of the p-n junction by blocking the charge transport in the intermediate band without affecting the electron and hole collection efficiency of the p-n junction, thereby increasing open circuit voltage (V.sub.OC) of the IBSC and increasing the photocurrent by utilizing the intermediate band to absorb photons with energy below the band gap of the absorber layers of the IBSC. Hence, the overall power conversion efficiency of a IBSC will be much higher than an conventional single junction solar cell. The p-n junction absorber layers of the IBSC may further have compositionally graded nitrogen concentrations to provide an electric field for more efficient charge collection.

Walukiewicz, Wladyslaw (Kensington, CA); Yu, Kin Man (Lafayette, CA)

2012-07-31T23:59:59.000Z

367

Crystal and Electronic Structures of Neptunium Nitrides Synthesized Using a Fluoride Route  

SciTech Connect

A low-temperature fluoride route was utilized to synthesize neptunium mononitride, NpN. Through the development of this process, two new neptunium nitride species, NpN{sub 2} and Np{sub 2}N{sub 3}, were identified. The NpN{sub 2} and Np{sub 2}N{sub 3} have crystal structures isomorphous to those of UN{sub 2} and U{sub 2}N{sub 3}, respectively. NpN{sub 2} crystallizes in a face-centered cubic CaF{sub 2}-type structure with a space group of Fm3m and a refined lattice parameter of 5.3236(1) {angstrom}. The Np{sub 2}N{sub 3} adopts the body-centered cubic Mn{sub 2}O{sub 3}-type structure with a space group of Ia{bar 3}. Its refined lattice parameter is 10.6513(4) {angstrom}. The NpN synthesis at temperatures {le} 900 C using the fluoride route discussed here was also demonstrated. Previous computational studies of the neptunium nitride system have focused exclusively on the NpN phase because no evidence was reported experimentally on the presence of NpN{sub x} systems. Here, the crystal structures of NpN{sub 2} and Np{sub 2}N{sub 3} are discussed for the first time, confirming the experimental results by density functional calculations (DFT). These DFT calculations were performed within the local-density approximation (LDA+U) and the generalized-gradient approximation (GGA+U) corrected with an effective Hubbard parameter to account for the strong on-site Coulomb repulsion between Np 5f electrons. The effects of the spin-orbit coupling in the GGA+U calculations have also been investigated for NpN{sub 2} and NpN.

Silva, G W Chinthaka M [ORNL; Weck, Dr. Phil F. [Sandia National Laboratories (SNL); Eunja, Dr. Kim [University of Nevada, Las Vegas; Yeamans, Dr. Charles B. [Lawrence Livermore National Laboratory (LLNL); Cerefice, Gary S. [University of Nevada, Las Vegas; Sattelberger, Alfred P [Argonne National Laboratory (ANL); Czerwinski, Ken R. [University of Nevada, Las Vegas

2012-01-01T23:59:59.000Z

368

Evolution of oxidation and creep damage mechanisms in HIPed silicon nitride materials  

DOE Green Energy (OSTI)

Several yttria-fluxed, hot-isostatically pressed (HIPed) silicon nitrides have been tensile creep tested at temperatures representative of gas turbine engines. Creep and oxidation assisted damage mechanisms concurrently evolve when these materials are tested at high temperatures and low stresses (i.e., long exposure times at temperature). Atmospheric creep testing results in creation of oxygen and yttrium gradients across the radial dimension. High concentrations of oxygen and yttrium coincide with dense populations of lenticular-shaped cavities near the surface of crept specimens. The center of the tensile specimens was devoid of oxygen or yttrium; in addition, lenticular cavities were rare. The gradient in lenticular-cavity concentration is coincident with the oxygen and yttrium gradients. Stress corrosion cracking (SCC) also occurs in these HIPed silicon nitrides when they are subjected to stress at high temperatures in ambient air. The size of this damage zone increases when the temperature is higher and/or the applied stress is lower. Stress-corrosion cracking initiates at the surface of the tensile specimen and advances radially inwards. What nucleates SCC has not yet been identified, but it is believed to result from a stress-concentrator (e.g., machining damage) at the surface and its growth is a result of coalescence of microcracks and cavities. The higher concentration of oxygen and yttrium in the grain boundaries near the specimen`s surface lessens the local high temperature mechanical integrity; this is believed to be associated with the growth of the SCC zone. This SCC zone continues to grow in size during tensile loading until it reaches a critical size which causes fracture.

Wereszczak, A.A.; Ferber, M.K.; Kirkland, T.P.; More, K.L.

1994-10-01T23:59:59.000Z

369

Nitrides I  

Science Conference Proceedings (OSTI)

May 24, 2010... Lincoln Laboratory, Lexington, MA, USA; Rajaram Bhat, Corning Inc ... Clemens Wchter1; Alexander Meyer1; Peter Michler1; 1Universitt...

370

Nitrides III  

Science Conference Proceedings (OSTI)

May 28, 2010... Lincoln Laboratory, Lexington, MA, USA; Rajaram Bhat, Corning Inc ... Jrgen Blsing1; Armin Dadgar1; Thomas Hempel1; Peter Veit1; Alois...

371

Fuel Reliability Program: Post-Irradiation Examination and Testing of High-Fluence Control Rod Silver-Indium-Cadmium Absorber from t he Kernkraftwerk Obrigheim Reactor  

Science Conference Proceedings (OSTI)

Within a project sponsored by the Electric Power Research Institute (EPRI), one control rod absorber silver-indium-cadmium (AgInCd) specimen, KWO395, irradiated in Kernkraftwerk Obrigheim (KWO) and one control rod absorber specimen, R035/F9, irradiated in Ringhals 2 have been examined in the hot cell laboratory at Studsvik. The objective of the examinations was to characterize the absorber material and investigate its physical, chemical, and microstructural changes due to high neutron fluence/exposure us...

2011-09-16T23:59:59.000Z

372

N-polar III-nitride quantum well light-emitting diodes with polarization-induced doping  

Science Conference Proceedings (OSTI)

Nitrogen-polar III-nitride heterostructures present unexplored advantages over Ga(metal)-polar crystals for optoelectronic devices. This work reports N-polar III-nitride quantum-well ultraviolet light-emitting diodes grown by plasma-assisted molecular beam epitaxy that integrate polarization-induced p-type doping by compositional grading from GaN to AlGaN along N-face. The graded AlGaN layer simultaneously acts as an electron blocking layer while facilitating smooth injection of holes into the active region, while the built-in electric field in the barriers improves carrier injection into quantum wells. The enhanced doping, carrier injection, and light extraction indicate that N-polar structures have the potential to exceed the performance of metal-polar ultraviolet light-emitting diodes.

Verma, Jai; Simon, John; Protasenko, Vladimir; Kosel, Thomas; Xing, Huili Grace; Jena, Debdeep [Department of Electrical Engineering, University of Notre Dame, Indiana 46556 (United States)

2011-10-24T23:59:59.000Z

373

Ion exchange separation of plutonium and gallium (1) resource and inventory requirements, (2) waste, emissions, and effluent, and (3) facility size  

SciTech Connect

The following report summarizes an effort intended to estimate within an order-of-magnitude the (1) resource and inventory requirements, (2) waste, emissions, and effluent amounts, and (3) facility size, for ion exchange (IX) separation of plutonium and gallium. This analysis is based upon processing 3.5 MT-Pu/yr. The technical basis for this summary is detailed in a separate document, {open_quotes}Preconceptual Design for Separation of Plutonium and Gallium by Ion Exchange{close_quotes}. The material balances of this separate document are based strictly on stoichiometric amounts rather than details of actual operating experience, in order to avoid classification as Unclassified Controlled Nuclear Information. This approximation neglets the thermodynamics and kinetics which can significantly impact the amount of reagents required. Consequently, the material resource requirements and waste amounts presented here would normally be considered minimums for processing 3.5 MT-Pu/yr; however, the author has compared the inventory estimates presented with that of an actual operating facility and found them similar. Additionally, the facility floor space presented here is based upon actual plutonium processing systems and can be considered a nominal estimate.

DeMuth, S.

1997-09-30T23:59:59.000Z

374

Application of Self-Propagating High Temperature Synthesis to the Fabrication of Actinide Bearing Nitride and Other Ceramic Nuclear Fuels  

Science Conference Proceedings (OSTI)

The high vapor pressures of americium (Am) and americium nitride (AmN) are cause for concern in producing nitride ceramic nuclear fuel that contains Am. Along with the problem of Am retention during the sintering phases of current processing methods, are additional concerns of producing a consistent product of desirable homogeneity, density and porosity. Similar difficulties have been experienced during the laboratory scale process development stage of producing metal alloys containing Am wherein compact powder sintering methods had to be abandoned. Therefore, there is an urgent need to develop a low-temperature or lowheat fuel fabrication process for the synthesis of Am-containing ceramic fuels. Self-propagating high temperature synthesis (SHS), also called combustion synthesis, offers such an alternative process for the synthesis of Am nitride fuels. Although SHS takes thermodynamic advantage of the high combustion temperatures of these exothermic SHS reactions to synthesize the required compounds, the very fast heating, reaction and cooling rates can kinetically generate extremely fast reaction rates and facilitate the retention of volatile species within the rapidly propagating SHS reaction front. The initial objective of the research program is to use Mn as the surrogate for Am to synthesize a reproducible, dense, high quality Zr-Mn-N ceramic compound. Having determined the fundamental SHS reaction parameters and optimized SHS processing steps using Mn as the surrogate for Am, the technology will be transferred to Idaho National Laboratory to successfully synthesize a high quality Zr-Am-N ceramic fuel.

John J. Moore, Douglas E. Burkes, Collin D. Donohoue, Marissa M. Reigel, J. Rory Kennedy

2009-05-18T23:59:59.000Z

375

Conducting and Optical Properties of Transparent Conducting Indium-Doped Zinc Oxide Thin Films by Sol-Gel Processing  

Science Conference Proceedings (OSTI)

Transparent conducting oxides were successfully prepared from mixed zinc nitrate hexahydrate and indium nitrate hydrate solutions in ethylene glycol using sol-gel technique. The In content in the film was varied (0, 2, 10, 20, 40, 75 and 100 atom %). Films were prepared by spin coating of the liquid precursors followed by thermal decomposition at 400 C after each layer. According to X-ray diffraction (XRD) measurements, the pure ZnO and pure InO films (0 and at 100 % In) were crystalline as-deposited. The crystallinity was suppressed in mixed compositions such that the films with compositions between 10 and 75 at % were amorphous. All the films were transparent with the transmission cut-off frequency near 400 nm, which is characteristic of TCO materials. All as-deposited films were conductive with 0 and 100 atom % In having the lowest resistivities. The resistivity of all compositions were improved by post-deposition reducing anneal in pure Ar at 300 C. The lowest resistivity of 0.2 ?cm was obtained for the pure ZnO after Ar anneal. It was two-orders of magnitude higher than reported in the literature for the In-doped ZnO, which was attributed to the low processing temperature. The resistivities of as-deposited and annealed in Ar films were increased by consequent air anneal at 300 C.

Huang, S.; Kaydanova, T.; Miedaner, A.; Ginley, D.S.

2004-01-01T23:59:59.000Z

376

Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers  

Science Conference Proceedings (OSTI)

The etching characteristics of indium zinc oxide (IZO) films were investigated using a high-density plasma in Ar, Ar/Cl{sub 2}, and Ar/CH{sub 4}/H{sub 2} chemistries. The IZO layers were deposited by means of rf magnetron sputtering, in which the target composition and growth temperature were varied to selectively tune the film properties. X-ray diffraction, elastic recoil detection, and Rutherford backscattering spectroscopy were used to determine the crystallization quality, atomic density, and composition of the as-deposited IZO films. As the In/(In+Zn) composition ratio in the IZO layer increases, the etch yield in Ar and Ar/Cl{sub 2} plasmas remains fairly constant, indicating that the etching dynamic is essentially independent of the film properties. In sharp contrast, a strong increase of the IZO etch yield with the In/(In+Zn) fraction is observed in Ar/CH{sub 4}/H{sub 2} plasma due to the preferential desorption of the group-III etch products. By comparing these experimental data to the predictions of a simple rate model accounting for preferential desorption effects, it is concluded that the balance between etching and polymer deposition in the Ar/CH{sub 4}/H{sub 2} plasma plays an important role in the evolution of the IZO etch rate with the In concentration fraction.

Stafford, L.; Lim, W. T.; Pearton, S. J.; Chicoine, M.; Gujrathi, S.; Schiettekatte, F.; Park, Jae-Soung; Song, Ju-Il; Heo, Young-Woo; Lee, Joon-Hyung; Kim, Jeong-Joo; Kravchenko, I. I. [Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States); Departement de Physique, Universite de Montreal, Montreal, Quebec H3C 3J7 (Canada); Department of Inorganic Materials Engineering, Kyungpook National University, Daegu 702-701 (Korea, Republic of); Department of Physics, University of Florida, Gainesville, Florida 32611 (United States)

2007-07-15T23:59:59.000Z

377

Influence of defects and processing parameters on the properties of indium tin oxide films on polyethylene napthalate substrate  

Science Conference Proceedings (OSTI)

Indium tin oxide (ITO) thin films were deposited on polyethylene napthalate (PEN) by rf sputtering using different rf powers (60 and 120 W) and at different substrate temperatures (room temperature and 100 deg. C). Selected PEN substrates were pretreated using an Ar plasma before ITO sputter deposition. Rutherford backscattering spectrometry was used to determine the oxygen content in the films. Hall effect measurements were used to evaluate the electrical properties. In this paper the influence of defect structure, sputtering conditions, and the effect of annealing on the electrical and optical properties of ITO on PEN have been investigated. Electrical properties such as carrier concentration, mobility, and resistivity of the ITO films varied with rf power and substrate temperature. The electrical and optical properties of the films changed after annealing in air. This study also describes how the as-deposited amorphous ITO changes from amorphous to crystalline as a result of heat treatment, and investigates the effects of Sn defect clustering on electrical and optical properties of the ITO films.

Han, H.; Zoo, Yeongseok; Bhagat, S. K.; Lewis, J. S.; Alford, T. L. [School of Materials, Arizona State University, Tempe, Arizona 85287-8706 (United States); Center for Materials and Electronic Technologies, RTI International, P.O. Box 12194, Research Triangle Park, North Carolina 27709-2194 (United States); School of Materials and Flexible Display Center, Arizona State University, Tempe, Arizona 85287-8706 (United States)

2007-09-15T23:59:59.000Z

378

Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm  

Science Conference Proceedings (OSTI)

Laser-induced-damage characteristics of commercial indium-tin oxide (ITO) films deposited by DC magnetron sputtering deposition on K9 glass substrates as a function of the film thickness have been studied at 1064 nm with a 10 ns laser pulse in the 1-on-1 mode, and the various mechanisms for thickness effect on laser-induced-damage threshold (LIDT) of the film have been discussed in detail. It is observed that laser-damage-resistance of ITO film shows dramatic thickness effect with the LIDT of the 50-nm ITO film 7.6 times as large as the value of 300 nm film, and the effect of depressed carrier density by decreasing the film thickness is demonstrated to be the primary reason. Our experiment findings indicate that searching transparent conductive oxide (TCO) film with low carrier density and high carrier mobility is an efficient technique to improve the laser-damage-resistance of TCO films based on maintaining their well electric conductivity.

Wang Haifeng; Huang Zhimeng; Zhang Dayong; Luo Fei; Huang Lixian; Li Yanglong; Luo Yongquan; Wang Weiping; Zhao Xiangjie [Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang 621900 (China)

2011-12-01T23:59:59.000Z

379

Determination of the solubility of tin indium oxide using in situ and ex x-ray diffraction  

SciTech Connect

A novel approach to determine the thermodynamic solubility of tin in indium oxide via the exsolution from tin overdoped nano-ITO powders is presented. High-energy, in situ and ex situ synchrotron X-ray diffraction was utilized to study the solubility limit at temperatures ranging from 900 C to 1375 C. The tin exsolution from overdoped nanopowders and the formation of In{sub 4}Sn{sub 3}O{sub 12} were observed in situ during the first 4-48 h of high-temperature treatment. Samples annealed between 900 C and 1175 C were also studied ex situ with heat treatments for up to 2060 h. Structural results obtained from Rietveld analysis include compositional phase analysis, atomic positions, and lattice parameters. The tin solubility in In{sub 2}O{sub 3} was determined using the phase analysis compositions from X-ray diffraction and the elemental compositions obtained from X-ray fluorescence. Experimental complications that can lead to incorrect tin solubility values in the literature are discussed.

Gonzalez, G. B.; Mason, T. O.; Okasinski, J. S.; Buslaps, T.; Honkimaki, V. (X-Ray Science Division); (DePaul Univ.); (Northwestern Univ.); (European Synchrotron Radiation Facility, Grenoble, France)

2012-02-01T23:59:59.000Z

380

Indium-tin-oxide-free tris(8-hydroxyquinoline) Al organic light-emitting diodes with 80% enhanced power efficiency  

Science Conference Proceedings (OSTI)

Efficient indium tin oxide (ITO)-free small molecule organic light-emitting diodes (SMOLEDs) with multilayered highly conductive poly(3,4-ethylenedioxy thiophene):poly(styrenesulfonate) (PEDOT:PSS) as the anode are demonstrated. PEDOT:PSS/MoO{sub 3}/N,N'-diphenyl- N,N'-bis(1-naphthylphenyl)-1,1'-biphenyl-4,4'-diamine (NPD)/tris(8-hydroxyquinoline) Al (Alq{sub 3})/4,7-diphenyl-1,10-phenanthroline (BPhen)/LiF/Al SMOLEDs exhibited a peak power efficiency of 3.82 lm/W, 81% higher than that of similar ITO-based SMOLEDs (2.11 lm/W). The improved performance is believed to be due to the higher work function, lower refractive index, and decreased surface roughness of PEDOT:PSS vs ITO, and to Ohmic hole injection from PEDOT:PSS to the NPD layer via the MoO{sub 3} interlayer. The results demonstrate that PEDOT:PSS can substitute ITO in SMOLEDs with strongly improved device performance.

Cai, Min; Xiao, Teng; Liu, Rui; Chen, Ying; Shinar, Ruth; Shinar, Joseph

2011-10-11T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


381

Hydrogen Sensor Based on Yttria-Stabilized Zirconia Electrolyte and Tin-Doped Indium Oxide Sensing Electrode  

DOE Green Energy (OSTI)

A solid state electrochemical sensor has been developed for hydrogen leak detection in ambient air. The sensor uses an yttria-stabilized electrolyte with a tin-doped indium oxide sensing electrode and a Pt reference electrode. Excellent sensitivity, and response time of one second or less, are reported for hydrogen gas over the concentration range of 0.03 to 5.5% in air. Cross-sensitivity to relative humidity and to CO{sub 2} are shown to be low. The response to methane, a potentially significant source of interference for such a sensor, is significantly less than that for hydrogen. The sensor shows good reproducibility and was unaffected by thermal cycling over the course of this investigation. The effects of sensing electrode thickness and thermal aging are also reported, and the sensing mechanism is discussed. The sensor is intended for use in vehicles powered by hydrogen fuel cells and hydrogen internal combustion engines. Those vehicles will use and/or store significant quantities of hydrogen, and will require safety sensor for monitoring potential hydrogen leakage in order to ensure passenger safety.

Martin, L P; Glass, R S

2004-03-26T23:59:59.000Z

382

Methods for and products of processing nanostructure nitride, carbonitride and oxycarbonitride electrode power materials by utilizing sol gel technology for supercapacitor applications  

SciTech Connect

Metal nitride, carbonitride, and oxycarbonitride powder with high surface area (up to 150 m.sup.2 /g) is prepared by using sol-gel process. The metal organic precursor, alkoxides or amides, is synthesized firstly. The metal organic precursor is modified by using unhydrolyzable organic ligands or templates. A wet gel is formed then by hydrolysis and condensation process. The solvent in the wet gel is then be removed supercritically to form porous amorphous hydroxide. This porous hydroxide materials is sintered to 725.degree. C. under the ammonia flow and porous nitride powder is formed. The other way to obtain high surface area nitride, carbonitride, and oxycarbonitride powder is to pyrolyze polymerized templated metal amides aerogel in an inert atmosphere. The electrochemical capacitors are prepared by using sol-gel prepared nitride, carbonitride, and oxycarbonitride powder. Two methods are used to assemble the capacitors. Electrode is formed either by pressing the mixture of nitride powder and binder to a foil, or by depositing electrode coating onto metal current collector. The binder or coating is converted into a continuous network of electrode material after thermal treatment to provide enhanced energy and power density. Liquid electrolyte is soaked into porous electrode. The electrochemical capacitor assembly further has a porous separator layer between two electrodes/electrolyte and forming a unit cell.

Huang, Yuhong (West Hills, CA); Wei, Oiang (West Hills, CA); Chu, Chung-tse (Chatsworth, CA); Zheng, Haixing (Oak Park, CA)

2001-01-01T23:59:59.000Z

383

Silicon surface and bulk defect passivation by low temperature PECVD oxides and nitrides  

DOE Green Energy (OSTI)

The effectiveness of PECVD passivation of surface and bulk defects in Si, as well as phosphorous diffused emitters, Is investigated and quantified. Significant hydrogen incorporation coupled with high positive charge density in the PECVD SiN layer is found to play an important role in bulk and surface passivation. It is shown that photo-assisted anneal in a forming gas ambient after PECVD depositions significantly improves the passivation of emitter and bulk defects. PECVD passivation of phosphorous doped emitters and boron doped bare Si surfaces is found to be a strong function of doping concentration. Surface recombination velocity of less than 200 cm/s for 0.2 Ohm-cm and less than 1 cm/s for high resistivity substrates ({approximately} Ohm-cm) were achieved. PECVD passivation improved bulk lifetime in the range of 30% to 70% in multicrystalline Si materials. However, the degree of the passivation was found to be highly material specific. Depending upon the passivation scheme, emitter saturation current density (J{sub oe}) can be reduced by a factor of 3 to 9. Finally, the stability of PECVD oxide/nitride passivation under prolonged UV exposure is established.

Chen, Z.; Rohatgi, A. [Georgia Institute of Technology, Atlanta, GA (United States). Univ. Center of Excellence for Photovoltaics Research and Education; Ruby, D. [Sandia National Labs., Albuquerque, NM (United States)

1995-01-01T23:59:59.000Z

384

Influence of nitrogen background pressure on structure of niobium nitride films grown by pulsed laser deposition  

SciTech Connect

Depositions of niobium nitride thin films on Nb using pulsed laser deposition (PLD) with different nitrogen background pressures (10.7 to 66.7 Pa) have been performed. The effect of nitrogen pressure on NbN formation in this process was examined. The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), and energy dispersive X-ray (EDX) analysis. Hexagonal {beta}-Nb{sub 2}N and cubic {delta}-NbN phases resulted when growth was performed in low nitrogen background pressures. With an increase in nitrogen pressure, NbN films grew in single hexagonal {beta}-Nb{sub 2}N phase. The formation of the hexagonal texture during the film growth was studied. The c/a ratio of the hexagonal {beta}-Nb{sub 2}N unit cell parameter increases with increasing nitrogen pressure. Furthermore, the N:Nb ratio has a strong influence on the lattice parameter of the {delta}-NbN, where the highest value was achieved for this ratio was 1.19. It was found that increasing nitrogen background pressure leads to change in the phase structure of the NbN film. With increasing nitrogen pressure, the film structure changes from hexagonal to a mixed phase and then back to a hexagonal phase.

Ashraf H. Farha, Ali O. Er, Yksel Ufuktepe, Ganapati Myneni, Hani E. Elsayed-Ali

2011-12-01T23:59:59.000Z

385

High Temperature Annealing Studies on the Piezoelectric Properties of Thin Aluminum Nitride Films  

Science Conference Proceedings (OSTI)

A Rapid Thermal Annealing (RTA) system was used to anneal sputtered and MOVPE grown Aluminum Nitride (AlN) thin films at temperatures up to 1000C in ambient and controlled environments. According to Energy Dispersive X-Ray Analysis (EDAX), the films annealed in an ambient environment rapidly oxidize after five minutes at 1000C. Below 1000C the films oxidized linearly as a function of annealing temperature which is consistent with what has been reported in literature [1]. Laser Doppler Vibrometry (LDV) was used to measure the piezoelectric coefficient, d33, of these films. Films annealed in an ambient environment had a weak piezoelectric response indicating that oxidation on the surface of the film reduces the value of d33. A high temperature furnace has been built that is capable of taking in-situ measurements of the piezoelectric response of AlN films. In-situ d33 measurements are recorded up to 300C for both sputtered and MOVPE-grown AlN thin films. The measured piezoelectric response appears to increase with temperature up to 300C possibly due to stress in the film.

R. Farrell; V. R. Pagan; A. Kabulski; Sridhar Kuchibhatl; J. Harman; K. R. Kasarla; L. E. Rodak; P. Famouri; J. Peter Hensel; D. Korakakis

2008-05-01T23:59:59.000Z

386

High Temperature Annealing Studies on the Piezoelectric Properties of Thin Aluminum Nitride Films  

Science Conference Proceedings (OSTI)

A Rapid Thermal Annealing (RTA) system was used to anneal sputtered and MOVPE-grown Aluminum Nitride (AlN) thin films at temperatures up to 1000C in ambient and controlled environments. According to Energy Dispersive X-Ray Analysis (EDAX), the films annealed in an ambient environment rapidly oxidize after five minutes at 1000C. Below 1000C the films oxidized linearly as a function of annealing temperature which is consistent with what has been reported in literature [1]. Laser Doppler Vibrometry (LDV) was used to measure the piezoelectric coefficient, d33, of these films. Films annealed in an ambient environment had a weak piezoelectric response indicating that oxidation on the surface of the film reduces the value of d33. A high temperature furnace has been built that is capable of taking in-situ measurements of the piezoelectric response of AlN films. In-situ d33 measurements are recorded up to 300C for both sputtered and MOVPE-grown AlN thin films. The measured piezoelectric response appears to increase with temperature up to 300C possibly due to stress in the film.

Farrell, R.; Pagan, V.R.; Kabulski, A.; Kuchibhatla, S.; Harman, J.; Kasarla, K.R.; Rodak, L.E.; Hensel, J.P.; Famouri, P.; Korakakis, D.

2008-01-01T23:59:59.000Z

387

Structure and composition of nanometer-sized nitrides in a creep resistant cast austenitic alloy  

SciTech Connect

The microstructure of a new and improved high-temperature creep-resistant cast austenitic alloy, CF8C-Plus, was characterized after creep-rupture testing at 1023 K (750 C) and 100 MPa. Microstructures were investigated by detailed scanning electron microscopy, transmission electron microscopy, and energy-dispersive X-ray spectroscopy (EDS). Principal component analysis of EDS spectrum images was used to examine the complex precipitate morphology. Thermodynamic modeling was performed to predict equilibrium phases in this alloy as well as the compositions of these phases at relevant temperatures. The improved high-temperature creep strength of CF8C-Plus over its predecessor CF8C is suggested to be due to the modified microstructure and phase stability in the alloy, including the absence of {delta}-ferrite in the as-cast condition and the development of a stable, slow-growing precipitation hardening nitride phase - the tetragonal Z-phase - which has not been observed before in cast austenitic stainless steels.

Evans, Neal D [ORNL; Maziasz, Philip J [ORNL; Shingledecker, John P. [Electric Power Research Institute (EPRI); Pollard, Michael J [Caterpillar Technical Center

2010-01-01T23:59:59.000Z

388

Carbide/nitride grain refined rare earth-iron-boron permanent magnet and method of making  

DOE Patents (OSTI)

A method of making a permanent magnet wherein 1) a melt is formed having a base alloy composition comprising RE, Fe and/or Co, and B (where RE is one or more rare earth elements) and 2) TR (where TR is a transition metal selected from at least one of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, and Al) and at least one of C and N are provided in the base alloy composition melt in substantially stoichiometric amounts to form a thermodynamically stable compound (e.g. TR carbide, nitride or carbonitride). The melt is rapidly solidified in a manner to form particulates having a substantially amorphous (metallic glass) structure and a dispersion of primary TRC, TRN and/or TRC/N precipitates. The amorphous particulates are heated above the crystallization temperature of the base alloy composition to nucleate and grow a hard magnetic phase to an optimum grain size and to form secondary TRC, TRN and/or TRC/N precipitates dispersed at grain boundaries. The crystallized particulates are consolidated at an elevated temperature to form a shape. During elevated temperature consolidation, the primary and secondary precipitates act to pin the grain boundaries and minimize deleterious grain growth that is harmful to magnetic properties.

McCallum, R. William (Ames, IA); Branagan, Daniel J. (Ames, IA)

1996-01-23T23:59:59.000Z

389

Antifuse with a single silicon-rich silicon nitride insulating layer  

DOE Patents (OSTI)

An antifuse is disclosed which has an electrically-insulating region sandwiched between two electrodes. The electrically-insulating region has a single layer of a non-hydrogenated silicon-rich (i.e. non-stoichiometric) silicon nitride SiN.sub.X with a nitrogen content X which is generally in the range of 0

Habermehl, Scott D.; Apodaca, Roger T.

2013-01-22T23:59:59.000Z

390

Three Alkali-Metal-Gold-Gallium Systems. Ternary Tunnel Structures and Some Problems with Poorly Ordered Cations  

SciTech Connect

Six new intermetallic compounds have been characterized in the alkali metal (A = Na, Rb, Cs)goldgallium systems. Three isostructural compounds with the general composition A0.55Au2Ga2, two others of AAu3Ga2 (A = Rb, Cs), and the related Na13Au41.2Ga30.3 were synthesized via typical high-temperature reactions and their crystal structures determined by single-crystal X-ray diffraction analysis: Na0.56(9)Au2Ga2 (I, I4/mcm, a = 8.718(1) , c = 4.857(1) , Z = 4), Rb0.56(1)Au2Ga2 (II, I4/mcm, a = 8.950(1) , c = 4.829(1) , Z = 4), Cs0.54(2)Au2Ga2 (III, I4/mcm, a = 9.077(1) , c = 4.815(1) , Z = 4), RbAu3Ga2 (IV, Pnma, a = 13.384(3) , b = 5.577(1) , c = 7.017(1) , Z = 4), CsAu3Ga2 (V, Pnma, a = 13.511(3) , b = 5.614(2) , c = 7.146(1) , Z = 4), Na13Au41.2(1)Ga30.3(1) (VI, P6 mmm, a = 19.550(3) , c = 8.990(2) , Z = 2). The first three compounds (IIII) are isostructural with tetragonal K0.55Au2Ga2 and likewise contain planar eight-member Au/Ga rings that stack along c to generate tunnels and that contain varying degrees of disordered NaCs cations. The cation dispositions are much more clearly and reasonably defined by electron density mapping than through least-squares refinements with conventional anisotropic ellipsoids. Orthorhombic AAu3Ga2 (IV, V) are ordered ternary Rb and Cs derivatives of the SrZn5 type structure, demonstrating structural variability within the AAu3Ga2 family. All attempts to prepare an isotypic NaAu3Ga2 were not successful, but yielded only a similar composition Na13Au41.2Ga30.3 (NaAu3.17Ga2.33) (VI) in a very different structure with two types of cation sites. Crystal orbital Hamilton population (COHP) analysis obtained from tight-binding electronic structure calculations for idealized IIV via linear muffin-tin-orbital (LMTO) methods emphasized the major contributions of heteroatomic AuGa bonding to the structural stability of these compounds. The relative minima (pseudogaps) in the DOS curves for IV correspond well with the valence electron counts of known representatives of this structure type and, thereby, reveal some magic numbers to guide the search for new isotypic compounds. Theoretical calculation of total energies vs volumes obtained by VASP (Vienna Ab initio Simulation Package) calculations for KAu3Ga2 and RbAu3Ga2 suggest a possible transformation from SrZn5- to BaZn5-types at high pressure.

Smetana, Volodymyr; Miller, Gordon J.; Corbett, John D.

2012-06-27T23:59:59.000Z

391

Application of Self-Propagating High Temperature Synthesis to the Fabrication of Actinide Bearing Nitride and Other Ceramic Nuclear Fuels  

SciTech Connect

The project uses an exothermic combustion synthesis reaction, termed self-propagating high-temperature synthesis (SHS), to produce high quality, reproducible nitride fuels and other ceramic type nuclear fuels (cercers and cermets, etc.) in conjunction with the fabrication of transmutation fuels. The major research objective of the project is determining the fundamental SHS processing parameters by first using manganese as a surrogate for americium to produce dense Zr-Mn-N ceramic compounds. These fundamental principles will then be transferred to the production of dense Zr-Am-N ceramic materials. A further research objective in the research program is generating fundamental SHS processing data to the synthesis of (i) Pu-Am-Zr-N and (ii) U-Pu-Am-N ceramic fuels. In this case, Ce will be used as the surrogate for Pu, Mn as the surrogate for Am, and depleted uranium as the surrogate for U. Once sufficient fundamental data has been determined for these surrogate systems, the information will be transferred to Idaho National Laboratory (INL) for synthesis of Zr-Am-N, Pu-Am-Zr-N and U-Pu-Am-N ceramic fuels. The high vapor pressures of americium (Am) and americium nitride (AmN) are cause for concern in producing nitride ceramic nuclear fuel that contains Am. Along with the problem of Am retention during the sintering phases of current processing methods, are additional concerns of producing a consistent product of desirable homogeneity, density and porosity. Similar difficulties have been experienced during the laboratory scale process development stage of producing metal alloys containing Am wherein compact powder sintering methods had to be abandoned. Therefore, there is an urgent need to develop a low-temperature or lowheat fuel fabrication process for the synthesis of Am-containing ceramic fuels. Self-propagating high temperature synthesis (SHS), also called combustion synthesis, offers such an alternative process for the synthesis of Am nitride fuels. Although SHS takes thermodynamic advantage of the high combustion temperatures of these exothermic SHS reactions to synthesize the required compounds, the very fast heating, reaction and cooling rates can kinetically generate extremely fast reaction rates and facilitate the retention of volatile species within the rapidly propagating SHS reaction front. The initial objective of the research program is to use Mn as the surrogate for Am to synthesize a reproducible, dense, high quality Zr-Mn-N ceramic compound. Having determined the fundamental SHS reaction parameters and optimized SHS processing steps using Mn as the surrogate for Am, the technology will be transferred to Idaho National Laboratory to successfully synthesize a high quality Zr-Am-N ceramic fuel.

John J. Moore, Marissa M. Reigel, Collin D. Donohoue

2009-04-30T23:59:59.000Z

392

Benchmark test of neutron transport calculations: Indium, nickel, gold, europium, and cobalt activation with and without energy moderated fission neutrons by iron simulating the Hiroshima atomic bomb casing  

Science Conference Proceedings (OSTI)

A benchmark test of the Monte Carlo neutron and photon transport code system (MCNP) was performed using a bare- and energy-moderated {sup 252}Cf fission neutron source which was obtained by transmission through 10-cm-thick iron. An iron plate was used to simulate the effect of the Hiroshima atomic bomb casing. This test includes the activation of indium and nickel for fast neutrons and gold, europium, and cobalt for thermal and epithermal neutrons, which were inserted in the moderators. The latter two activations are also to validate {sup 152}Eu and {sup 60}Co activity data obtained from the atomic bomb-exposed specimens collected at Hiroshima and Nagasaki, Japan. The neutron moderators used were Lucite and Nylon 6 and the total thickness of each moderator was 60 cm or 65 cm. Measured activity data (reaction yield) of the neutron-irradiated detectors in these moderators decreased to about 1/1,000th or 1/10,000th, which corresponds to about 1,500 m ground distance from the hypocenter in Hiroshima. For all of the indium, nickel, and gold activity data, the measured and calculated values agreed within 25%, and the corresponding values for europium and cobalt were within 40%. From this study, the MCNP code was found to be accurate enough for the bare- and energy-moderated {sup 252}Cf neutron activation calculations of these elements using moderators containing hydrogen, carbon, nitrogen, and oxygen. 18 refs., 10 figs., 4 tabs.

Iwatani, Kazuo; Shizuma, Kiyoshi; Hasai, Hiromi; Hoshi, Masaharu; Hiraoka, Masayuki; Hayakawa, Norihiko [Hiroshima Univ., Higashi-Hiroshima (Japan); Oka, Takamitsu [Kure Women`s College, Hiroshima-ken (Japan)

1994-10-01T23:59:59.000Z

393

Slide 1  

NLE Websites -- All DOE Office Websites (Extended Search)

University Ph.D. Thesis by Peter Eschbach, "Investigation of Buffer Layers in Copper Indium Gallium Selenium Solar Cells" (2002) 50 52 54 56 58 60 62 64 66 Binding Energy (eV)...

394

Research Highlights | ORNL Neutron Sciences  

NLE Websites -- All DOE Office Websites (Extended Search)

on structural properties of new materials, brought a sample from the solid solution of indium-gallium-magnesium-oxide (i.e., InGaCu0.60Mg0.40O4) to the workshop. "The...

395

Alternative Energy Technologies Solar Power  

E-Print Network (OSTI)

(LCDs), flat panel displays, optical coatings, light-emitting diodes (LEDs) antistatic coatings, strain gauges, gas sensors. Light-emitting diodes (LED's) Power amplifiers for cell phones Indium Gallium #12

Scott, Christopher

396

Test vehicle detector characterization system for the Boeing YAL-1 airborne laser  

E-Print Network (OSTI)

The test vehicle detector characterization system provides a convenient and efficient tool for rapidly evaluating the optical sensitivity of the GAP6012, GAP100, GAP300, and GAP1000 indium gallium arsenide detectors used ...

Steininger-Holmes, Jason Thomas

2008-01-01T23:59:59.000Z

397

Barrier Coatings for Thin Film Solar Cells: Final Subcontract Report, September 1, 2002 -- January 30, 2008  

DOE Green Energy (OSTI)

This program has involved investigations of the stability of CdTe and copper-indium-gallium-diselenide (CIGS) solar cells under damp heat conditions and effects of barrier coatings.

Olsen, L. C.

2010-03-01T23:59:59.000Z

398

PTIP Ltd | Open Energy Information  

Open Energy Info (EERE)

Ltd Jump to: navigation, search Name PTIP Ltd Place South Africa Sector Solar Product Thin-film Copper-indium-gallium-sulphur-selenide solar cell technology spinout from the...

399

Nuvosun Inc | Open Energy Information  

Open Energy Info (EERE)

Zip 94303-4601 Product California-based copper indium gallium (di)selenide (CIGS) thin film PV maker. References Nuvosun Inc1 LinkedIn Connections CrunchBase Profile No...

400

MOCVD growth of In GaP-based heterostructures for light emitting devices  

E-Print Network (OSTI)

In this work, we examine fundamental materials processes in the growth of indium gallium phosphide (InGaP) via metalorganic chemical vapor deposition (MOCVD). In particular, we realize improvements in the epitaxial integration ...

McGill, Lisa Megan, 1975-

2004-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


401

Long-Term Performance Data and Analysis of CIS/CIGS Modules Deployed Outdoors  

DOE Green Energy (OSTI)

The long-term performance data of copper indium diselenide (CIS) and gallium-alloyed CIS (CIGS) photovoltaic (PV) modules are investigated to assess the reliability of this technology.

del Cueto, J.A.; Rummel, S.; Kroposki, B.; Anderberg, A.

2008-11-01T23:59:59.000Z

402

Long-Term Performance Data and Analysis of CIS/CIGS Modules Deployed Outdoors (Presentation)  

DOE Green Energy (OSTI)

The long-term performance data of copper indium diselenide (CIS) and gallium-alloyed CIS (CIGS) photovoltaic (PV) modules are investigated to assess the reliability of this technology.

del Cueto, J. A.; Kroposki, B.; Rummel, S.; Anderberg, A.

2008-08-10T23:59:59.000Z

403

InGaAsN/GaAs heterojunction for multi-junction solar cells  

DOE Patents (OSTI)

An InGaAsN/GaAs semiconductor p-n heterojunction is disclosed for use in forming a 0.95-1.2 eV bandgap photodetector with application for use in high-efficiency multi-junction solar cells. The InGaAsN/GaAs p-n heterojunction is formed by epitaxially growing on a gallium arsenide (GaAs) or germanium (Ge) substrate an n-type indium gallium arsenide nitride (InGaAsN) layer having a semiconductor alloy composition In.sub.x Ga.sub.1-x As.sub.1-y N.sub.y with 070%.

Kurtz, Steven R. (Albuquerque, NM); Allerman, Andrew A. (Albuquerque, NM); Klem, John F. (Albuquerque, NM); Jones, Eric D. (Edgewood, NM)

2001-01-01T23:59:59.000Z

404

JOURNAL DE PHYSIQUE Colloque C4, suppltfment au no 4, Tome 40, avril 1979, page C4-31 Magnetic inelastic scattering in uranium nitride  

E-Print Network (OSTI)

inelastic scattering in uranium nitride T. M. Holden, E. C. Svensson, W. J. L. Buyers and G. H. Lander, Illinois, U.S.A. RCsumC. -De tous les pnictures d'uranium de structure cubique, le nitrure d'uranium pour la comprBhensionde la structure tlectronique de l'ion uranium comme des ions actinides en gkn

Paris-Sud XI, Université de

405

Self-organized GaAs patterns on misoriented GaAs (111)B substrates using dilute nitrides by molecular beam epitaxy  

Science Conference Proceedings (OSTI)

Recently, the growth of patterned surfaces is being used to demonstrate the site control of the three-dimensional nanostructures, and in particular quantum dots. Nevertheless the pre-patterning techniques show some disadvantages. In this work, we report ... Keywords: Dilute nitrides, InAs, Molecular beam epitaxy, Patterned surface, Quantum dots

R. Gargallo; J. Miguel-Snchez; . Guzmn; U. Jahn; E. Muoz

2006-12-01T23:59:59.000Z

406

C. Wetzel et al MRS Internet J. Nitride Semicond. Res. 10, 2 (2005) 1 Development of High Power Green Light Emitting Diode Chips  

E-Print Network (OSTI)

Power Green Light Emitting Diode Chips C. Wetzel and T. Detchprohm Future Chips Constellation Abstract The development of high emission power green light emitting diodes chips using GaInN/GaN multi production-scale implementation of this green LED die process. Keywords: nitrides, light emitting diode

Wetzel, Christian M.

407

Low Temperature Chemical Vapor Deposition of Zirconium Nitride in a Fluidized Bed  

E-Print Network (OSTI)

The objective of this research was to design, assemble, and demonstrate the initial performance of a fluidized bed chemical vapor deposition (FB-CVD) system capable of producing thin, uniform zirconium nitride (ZrN) coatings (1 to 10 micrometers thick) on uranium-molybdenum (UMo) particulate fuel. Plate-type fuel with U-xMo (x = 3 to 10 wt.%) particle fuel dispersed in an aluminum matrix is under development at Idaho National Laboratory (INL) for the Reduced Enrichment for Research and Test Reactors (RERTR) program. Initial irradiation tests performed at INL in the Advanced Test Reactor (ATR) indicate an interaction layer forms between the fuel microspheres and the matrix at relatively high power levels. These power levels induce higher temperatures which enables uranium diffusion into the aluminum during irradiation, eventually causing fuel plate failure. The objective of this work was to create a process to mitigate the fuel/matrix interaction by forming a thin barrier coating on the surface of the U-xMo microspheres before incorporation into the dispersion fuel plate matrix. One of the main challenges in performance of the FB-CVD system was the effective fluidization of a powder whose physical characteristics (size, density) are continuously changing. To address this, two types of fluidized bed reaction vessels were designed and improved over the course of this research: a spouted fluidized bed and an inverted fluidized bed. Both reaction vessels utilized tetrakis(dimethylamino)zirconium (TDMAZ) and ammonia gas as precursors at atmospheric pressure. Tungsten wires and zirconia-silica (ZrO2-SiO2) microspheres were used as the substrates for the coating experiments. The substrate temperature and precursor gas flow were manipulated as the process variables. The FB-CVD system was successful in forming zirconium based coatings on surrogate microspheres with elevated levels of chemical impurities. At atmospheric pressure, coatings of thicknesses ranging from 0.5 micrometers to 1.5 micrometers were produced between temperatures of 250 degrees C and 350 degrees C. The deposited coatings were characterized using scanning electron microscopy, energy dispersive spectroscopy and wavelength dispersive spectroscopy.

Arrieta, Marie

2012-08-01T23:59:59.000Z

408

Impact of temperature increments on tunneling barrier height and effective electron mass for plasma nitrided thin SiO{sub 2} layer on a large wafer area  

SciTech Connect

Thermally grown SiO{sub 2} layers were treated by a plasma nitridation process realized in a vertical furnace. The combination of a pulsed-low frequency plasma and a microwave remote plasma with N{sub 2}/NH{sub 3}/He feed gas mixture was used to nitride the thermally grown SiO{sub 2} gate dielectrics of MIS structures. Temperature dependency of effective masses and the barrier heights for electrons in pure thermally grown SiO{sub 2} as well as plasma nitrided SiO{sub 2} in high electric field by means of Fowler-Nordheim regime was determined. It is frequently seen from the literature that either effective electron mass or barrier height (generally effective electron mass) is assumed to be a constant and, as a result, the second parameter is calculated under the chosen assumption. However, in contrast to general attitude of previous studies, this work does not make any such assumptions for the calculation of neither of these two important parameters of an oxide at temperature ranges from 23 to 110 deg. C for SiO{sub 2}, and 23 to 130 deg. C for nitrided oxide. It is also shown here that both parameters are affected from the temperature changes; respectively, the barrier height decreases while the effective mass increases as a result of elevated temperature in both pure SiO{sub 2} and plasma nitrided SiO{sub 2}. Therefore, one parameter could be miscalculated if the other parameter, i.e., effective mass of electron, was assumed to be a constant with respect to variable physical conditions like changing temperature. Additionally, the barrier heights were calculated just by taking constant effective masses for both types of oxides to be able to compare our results to common literature values.

Aygun, G. [Fraunhofer IISB, Schottkystrasse 10, 91058 Erlangen (Germany); Department of Physics, Izmir Institute of Technology, TR-35430 Urla, Izmir (Turkey); Roeder, G.; Erlbacher, T.; Wolf, M.; Schellenberger, M.; Pfitzner, L. [Fraunhofer IISB, Schottkystrasse 10, 91058 Erlangen (Germany)

2010-10-15T23:59:59.000Z

409

Development of White-Light Emitting Active Layers in Nitride Based Heterostructures for Phosphorless Solid State Lighting  

SciTech Connect

This report provides a summary of research activities carried out at the University of California, San Diego and Central Research of OSRAM SYLVANIA in Beverly, MA partially supported by a research contract from US Department of Energy, DE-FC26-04NT422274. The main objective of this project was to develop III-V nitrides activated by rare earth ions, RE{sup 3+}, which could eliminate the need for phosphors in nitride-based solid state light sources. The main idea was to convert electron-hole pairs injected into the active layer in a LED die to white light directly through transitions within the energy levels of the 4f{sup n}-manifold of RE{sup 3+}. We focused on the following materials: Eu{sup 3+}(red), Tb{sup 3+}(green), Er{sup 3+}(green), Dy{sup 3+}(yellow) and Tm{sup 3+}(blue) in AlN, GaN and alloys of AlN and GaN. Our strategy was to explore candidate materials in powder form first, and then study their behavior in thin films. Thin films of these materials were to be deposited on sapphire substrates using pulsed laser deposition (PLD) and metal organic vapor phase epitaxy (MOVPE). The photo- and cathode-luminescence measurements of these materials were used to investigate their suitability for white light generation. The project proceeded along this route with minor modifications needed to produce better materials and to expedite our progress towards the final goal. The project made the following accomplishments: (1) red emission from Eu{sup 3+}, green from Tb{sup 3+}, yellow from Dy{sup 3+} and blue from Tm{sup 3+} in AlN powders; (2) red emission from Eu{sup 3+} and green emission from Tb{sup 3+} in GaN powder; (3) red emission from Eu{sup 3+} in alloys of GaN and AlN; (4) green emission from Tb{sup 3+} in GaN thin films by PLD; (5) red emission from Eu{sup 3+} and Tb{sup 3+} in GaN thin films deposited by MOVPE; (6) energy transfer from host to RE{sup 3+}; (7) energy transfer from Tb{sup 3+} to Eu{sup 3+} in AlN powders; (8) emission from AlN powder samples codoped with (Eu{sup 3+} ,Tb{sup 3+} ) and (Dy{sup 3+}, Tm{sup 3+}); and (9) white emission from AlN codoped with Dy{sup 3+} and Tm{sup 3+}. We also extensively studied the stabilities of rare earth ions in GaN, and the nature of oxygen defects in GaN and its impact on the optical properties of the host material, using first principles method. Results from these theoretical calculations together with fluorescence measurements from the materials essentially proved the underlying concepts for generating white light using RE{sup 3+}-activated nitrides. For this project, we successfully built a horizontal MOVPE reactor and used it to deposit thin films of undoped and doped nitrides of GaN and InGaN, which is a very significant achievement. Since this reactor was designed and built by in-house experts, it could be easily modified and reassembled for specific research purposes. During this study, it was successfully modified for homogeneous distribution of rare earth ions in a deposited film. It will be an ideal tool for future research involving novel thin film material concepts. We examined carefully the suitability of various metal organic precursors for incorporating RE{sup 3+}. In order to avoid oxygen contamination, several oxygen-free RE{sup 3+} precursors were identified. Both oxygen-free and oxygen- containing metal organic precursors were used for certain rare earth ions (Eu{sup 3+}, Tb{sup 3+} and Er{sup 3+}). However, the suitability of any particular type of precursor for MOVPE deposition was not established during this study, and further study is needed. More intensive research in the future is needed to improve the film quality, and eliminate the separation of rare earth oxide phases during the deposition of thin films by MOVPE. The literature in the area of the chemistry of rare earth ions in nitrides is almost nonexistent, in spite of the significant research on luminescence of RE{sup 3+} in nitrides. Consequently, MOVPE as a method of deposition of RE{sup 3+}-activated nitrides is relatively unexplored. In the following sections of this report, the ou

Jan Talbot; Kailash Mishra

2007-12-31T23:59:59.000Z

410

Nonlinear optical properties of low temperature annealed silicon-rich oxide and silicon-rich nitride materials for silicon photonics  

SciTech Connect

We investigate the nonlinear optical properties of Si-rich silicon oxide (SRO) and Si-rich silicon nitride (SRN) samples as a function of silicon content, annealing temperature, and excitation wavelength. Using the Z-scan technique, we measure the non-linear refractive index n{sub 2} and the nonlinear absorption coefficient {beta} for a large number of samples fabricated by reactive co-sputtering. Moreover, we characterize the nonlinear optical parameters of SRN in the broad spectral region 1100-1500 nm and show the strongest nonlinearity at 1500 nm. These results demonstrate the potential of the SRN matrix for the engineering of compact devices with enhanced Kerr nonlinearities for silicon photonics applications.

Minissale, S. [Photonics Center, Boston University, 8 Saint Mary's street, Boston, Massachusetts 02215-2421 (United States) and Division of Materials Science and Engineering, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts 02446 (United States); Yerci, S. [Department of Electrical and Computer Engineering, Boston University, 8 Saint Mary's Street, Boston, Massachusetts 02215-2421 (United States); Dal Negro, L. [Photonics Center, Boston University, 8 Saint Mary's street, Boston, Massachusetts 02215-2421 (United States) and Division of Materials Science and Engineering, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts 02446 (United States); Department of Electrical and Computer Engineering, Boston University, 8 Saint Mary's Street, Boston, Massachusetts 02215-2421 (United States)

2012-01-09T23:59:59.000Z

411

High mobility two-dimensional electron gases in nitride heterostructures with high Al composition AlGaN alloy barriers  

Science Conference Proceedings (OSTI)

We report high-electron mobility nitride heterostructures with >70% Al composition AlGaN alloy barriers grown by molecular beam epitaxy. Direct growth of such AlGaN layers on GaN resulted in hexagonal trenches and a low mobility polarization-induced charge. By applying growth interruption at the heterojunction, the surface morphology improved dramatically and the room temperature two-dimensional electron gas (2DEG) mobility increased by an order of magnitude, exceeding 1300 cm{sup 2}/V s. The 2DEG density was tunable at 0.4-3.7x10{sup 13}/cm{sup 2} by varying the total barrier thickness (t). Surface barrier heights of the heterostructures were extracted and exhibited dependence on t.

Li Guowang; Cao Yu; Xing Huili Grace; Jena, Debdeep [Department of Electrical Engineering, University of Notre Dame, Indiana 46556 (United States)

2010-11-29T23:59:59.000Z

412

Comprehensive Model of Hydrogen Transport into a Solar Cell during Silicon Nitride Processing for Fire-Through Metallization  

DOE Green Energy (OSTI)

A mechanism for the transport of H into a Si solar cell during plasma-enhanced chemical vapor deposition (PECVD) of a hydrogenated silicon nitride (SiN:H) layer and its subsequent fire-through metallization process is described. The PECVD process generates process-induced traps, which ''store'' H at the surface of the solar cell. This stored H is released and diffuses rapidly into the bulk of Si during the high-temperature metallization-firing process. During the ramp-down, the diffused H associates with impurities and defects and passivates them. The firing step partially heals up the surface damage. The proposed model explains a variety of observations and experimental results.

Sopori, B.; Zhang, Y.; Reedy, R.; Jones, K.; Yan, Y.; Al-Jassim, M.; Bathey, B.; Kalejs, J.

2005-02-01T23:59:59.000Z

413

Excitation wavelength dependence of water-window line emissions from boron-nitride laser-produced plasmas  

Science Conference Proceedings (OSTI)

We investigated the effects of laser excitation wavelength on water-window emission lines of laser-produced boron-nitride plasmas. Plasmas are produced by focusing 1064 nm and harmonically generated 532 and 266 nm radiation from a Nd:YAG laser on BN target in vacuum. Soft x-ray emission lines in the water-window region are recorded using a grazing-incidence spectrograph. Filtered photodiodes are used to obtain complementary data for water-window emission intensity and angular dependence. Spectral emission intensity changes in nitrogen Ly-{alpha} and He-{alpha} are used to show how laser wavelength affects emission. Our results show that the relative intensity of spectral lines is laser wavelength dependent, with the ratio of Ly-{alpha} to He-{alpha} emission intensity decreasing as laser wavelength is shortened. Filtered photodiode measurements of angular dependence showed that 266 and 532 nm laser wavelengths produce uniform emission.

Crank, M.; Harilal, S. S.; Hassan, S. M.; Hassanein, A. [Center for Materials Under Extreme Environment, School of Nuclear Engineering, Purdue University, West Lafayette, Indiana 47907 (United States)

2012-02-01T23:59:59.000Z

414

Page not found | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

-High Performance Gallium Nitride High Electron Mobility Transistor Modules for Agile Power Electronics CX(s) Applied: B3.6 Date: 08052010 Location(s): California Office(s):...

415

Page not found | Department of Energy  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Categorical Exclusion Determination Advanced Epi Tools for Gallium Nitride LED (Light Emitting Diode) Devices CX(s) Applied: B3.6 Date: 03052010 Location(s): Santa Clara,...

416

CX-010974: Categorical Exclusion Determination | Department of...  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

CX-010974: Categorical Exclusion Determination Advanced Low-Cost Silicon Carbide (SiC) and Gallium Nitride (GaN) Wide Bandgap Inverters for Under-the-Hood Electric Vehicle...

417

Power Electronics Reliability Kick Off Meeting ? Silicon Power...  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

failure modes of post-silicon power electronic (PE) devices such as silicon carbide (SiC) and gallium nitride (GaN) switches. * Seek opportunities for condition monitoring (CM)...

418

CX-010973: Categorical Exclusion Determination | Department of...  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

CX-010973: Categorical Exclusion Determination Advanced Low-Cost Silicon Carbide (SiC) and Gallium Nitride (GaN) Wide Bandgap Inverters for Under-the-Hood Electric Vehicle...

419

JEM Table of Contents: November 1995 - TMS  

Science Conference Proceedings (OSTI)

Doping of Gallium Nitride Using Disilane [pp. 1547-1550] A.E. Wickenden, L.B. Rowland, K. Doverspike, D.K. Gaskill, J.A. Freitas, Jr., D.S. Simons, and P.H. Chi.

420

CX-001137: Categorical Exclusion Determination | Department of...  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Categorical Exclusion Determination Advanced Epi Tools for Gallium Nitride LED (Light Emitting Diode) Devices CX(s) Applied: B3.6 Date: 03052010 Location(s): Santa Clara,...

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


421

Categorical Exclusion Determinations: National Energy Technology...  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

Categorical Exclusion Determination Advanced Epi Tools for Gallium Nitride LED (Light Emitting Diode) Devices CX(s) Applied: B3.6 Date: 03052010 Location(s): Santa Clara,...

422

NETL F 451.1-1/1 Categorical Exclusion (CX) Designation Form  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

01042010 - 12312011 Santa Clara, Ca Advanced Epi Tools for Gallium Nitride Light Emitting Diode Devices To develop a multi-chamber system such as a two MOCVD chambers, one...

423

Hydrogen, Fuel Cells, and Infrastructure Technologies FY 2002 Progress Report II.D Electrolytic Processes  

E-Print Network (OSTI)

" (in press: International Journal of Hydrogen Energy). 3. "Evaluation of RF-Sputtered Indium-Tin Oxide-Si:Ge), copper-indium-gallium-diselenide (CIGS), iron oxide (Fe2O3), etc.] that match energy requirements (Primary Contact) National Renewable Energy Laboratory 1617 Cole Blvd. Golden, CO 80401 (303) 275-4270, fax

424

SF{sub 6}/O{sub 2} plasma effects on silicon nitride passivation of AlGaN/GaN high electron mobility transistors  

SciTech Connect

The effects of various plasma and wet chemical surface pretreatments on the electrical characteristics of AlGaN/GaN high electron mobility transistors (HEMTs) passivated with plasma-deposited silicon nitride were investigated. The results of pulsed IV measurements show that samples exposed to various SF{sub 6}/O{sub 2} plasma treatments have markedly better rf dispersion characteristics compared to samples that were either untreated or treated in wet buffered oxide etch prior to encapsulation. The improvement in these characteristics correlates with the reduction of carbon on the semiconductor surface as measured with x-ray photoelectron spectroscopy. HEMT channel sheet resistance was also affected by varying silicon nitride deposition parameters.

Meyer, David J.; Flemish, Joseph R.; Redwing, Joan M. [Materials Science and Engineering Department, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)

2006-11-27T23:59:59.000Z

425

Growth and Properties of the Dilute Bismide Semiconductor GaAs1-xBix a Complementary Alloy to the Dilute Nitrides  

DOE Green Energy (OSTI)

In this review we describe the growth and properties of the dilute bismide semiconductor alloy GaAs{sub 1-x}Bi{sub x} and show how its properties are in certain respects complementary to the dilute nitride alloy, GaN{sub y}As{sub 1-y}. Like the dilute nitrides the dilute bismides show a giant band gap bowing effect in which a small concentration of the alloying element has a disproportionate effect on the band gap, however in the case of the bismide the band gap reduction is associated with an increase in the energy of the valence band maximum (VBM) rather than a reduction in the energy of the conduction band minimum (CBM). Under standard GaAs growth conditions Bi acts as a surfactant with associated improvements in surface quality. In order to incorporate Bi, growth temperatures below 400 C are used with As{sub 2}/Ga flux ratios close to unity. The electron mobility of GaAs is only weakly affected by Bi alloying, in contrast to the dilute nitrides where the electron mobility decreases rapidly with N alloying. Bi alloying also produces a giant bowing effect in the spin orbit splitting in the valence band. Strong room temperature photoluminescence is observed. Prospects for future device applications of this new compound semiconductor alloy are discussed.

Tiedje, T.; Young, E. C.; Mascarenhas, A.

2008-01-01T23:59:59.000Z

426

Analytical and experimental evaluation of joining silicon nitride to metal and silicon carbide to metal for advanced heat engine applications  

DOE Green Energy (OSTI)

This report summarizes the results of Phase I of Analytical and Experimental Evaluation of Joining Silicon Nitride to Metal and Silicon Carbide to Metal and Silicon Carbide to Metal for Advanced Heat Engine Applications. A general methodology was developed to optimize the joint geometry and material systems for 650 and 950{degree}C applications. Failure criteria were derived to predict the fracture of the braze and ceramic. Extensive finite element analyses (FEA), using ABAQUS code, were performed to examine various joint geometries and to evaluate the affect of different interlayers on the residual stress state. Also, material systems composed of coating materials, interlayers, and braze alloys were developed for the program based on the chemical stability and strength of the joints during processing and service. Finally, the FEA results were compared with experiments using an idealized strength relationship. The results showed that the measured strength of the joint reached 30--90% of the strength by predicted by FEA. Overall results demonstrated that FEA is an effective tool for designing the geometries of ceramic-metal joints and that joining by brazing is a relevant method for advanced heat engine applications. 33 refs., 54 figs., 36 tabs.

Kang, S.; Selverian, J.H.; Kim, H.; O'Niel, D.; Kim, K. (GTE Labs., Inc., Waltham, MA (USA))

1990-04-01T23:59:59.000Z

427

Electrical transport properties of the Si-doped cubic boron nitride thin films prepared by in situ cosputtering  

SciTech Connect

Si-doped cubic boron nitride (c-BN) films with various Si concentrations were achieved by in situ cosputtering during ion beam assisted deposition. Effects of the Si concentration and rapid thermal annealing (RTA) conditions on the electrical transport properties of Si-doped c-BN thin films were investigated systematically. The results suggest that the optimum RTA condition is at the temperature of 1000 deg. C for 3 min. The resistance of Si-doped c-BN films gradually decreases as the Si concentration increases, indicating an electrical doping effect of the Si impurity. The temperature dependent electrical conductivity of the Si-doped c-BN films suggests that different conduction mechanisms are dominant over the different temperature ranges. Based on the Davis-Mott model, we propose that the extended-state conduction, band tail-state conduction and short-range hopping conduction are responsible for the respective temperature ranges. In addition, the reduction in activation energy of Si impurities is observed as the Si concentration increases.

Ying, J.; Zhang, X. W.; Yin, Z. G.; Tan, H. R.; Zhang, S. G.; Fan, Y. M. [Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

2011-01-15T23:59:59.000Z

428

Structure, optical, and electrical properties of indium tin oxide thin films prepared by sputtering at room temperature and annealed in air or nitrogen  

Science Conference Proceedings (OSTI)

Indium tin oxide (ITO) thin films have been grown onto soda-lime glass substrates by sputtering at room temperature with various oxygen to argon partial pressure ratios. After deposition, the samples have been annealed at temperatures ranging from 100 to 500 degree sign C in nitrogen or in air. The structure, optical, and electrical characteristics of the ITO coatings have been analyzed as a function of the deposition and the annealing parameters by x-ray diffraction, spectrophotometry, and Hall effect measurements. It has been found that the as-grown amorphous layers crystallize in the cubic structure by heating above 200 degree sign C. Simultaneously, the visible optical transmittance increases and the electrical resistance decreases, in proportions that depend mainly on the sputtering conditions. The lowest resistivity values have been obtained by annealing at 400 degree sign C in nitrogen, where the highest carrier concentrations are achieved, related to oxygen vacancy creation. Some relationships between the analyzed properties have been established, showing the dependence of the cubic lattice distortion and the infrared optical characteristics on the carrier concentration.

Guillen, C.; Herrero, J. [Departamento de Energia, CIEMAT, Avda Complutense 22, 28040 Madrid (Spain)

2007-04-01T23:59:59.000Z

429

Ti-Doped Indium Tin Oxide Thin Films for Transparent Field-Effect Transistors: Control of Charge-Carrier Density and Crystalline Structure  

Science Conference Proceedings (OSTI)

Indium tin oxide (ITO) films are representative transparent conducting oxide media for organic light-emitting diodes, liquid crystal displays, and solar cell applications. Extending the utility of ITO films from passive electrodes to active channel layers in transparent field-effect transistors (FETs), however, has been largely limited because of the materials' high carrier density (>1 x 10{sup 20} cm{sup 03}), wide band gap, and polycrystalline structure. Here, we demonstrate that control over the cation composition in ITO-based oxide films via solid doping of titanium (Ti) can optimize the carrier concentration and suppress film crystallization. On 120 nm thick SiO{sub 2}/Mo (200 nm)/glass substrates, transparent n-type FETs prepared with 4 at % Ti-doped ITO films and fabricated via the cosputtering of ITO and TiO{sub 2} exhibited high electron mobilities of 13.4 cm{sup 2} V{sup -1} s{sup -1}, a low subthreshold gate swing of 0.25 V decade{sup -1}, and a high I{sub on}/I{sub off} ratio of >1 x 10{sup 8}.

J Kim; K Ji; M Jang; H Yang; R Choi; J Jeong

2011-12-31T23:59:59.000Z

430

Energy Research and Development Division FINAL PROJECT REPORT  

E-Print Network (OSTI)

FOR GALLIUM NITRIDE LIGHT EMITTING DIODE DEVICES DECEMBER 2012 CEC5002013027 Prepared for: California Nitride Light Emitting Diode Devices is the final report for the grant, PIR10055, conducted by Applied the Energy Commission at 9163271551. #12;3 ABSTRACT For light emitting diodes (LEDs) to realiz

431

Crystal field disorder effects in the optical spectra of Nd{sup 3+} and Yb{sup 3+}-doped calcium lithium niobium gallium garnets laser crystals and ceramics  

SciTech Connect

The optical spectroscopic properties of RE{sup 3+} (Nd, 1 at. % or Yb, 1 to 10 at. %)-doped calcium-lithium-niobium-gallium garnet (CLNGG) single crystals and ceramics in the 10 K-300 K range are analyzed. In these compositionally disordered materials, RE{sup 3+} substitute Ca{sup 2+} in dodecahedral sites and the charge compensation is accomplished by adjusting the proportion of Li{sup +}, Nb{sup 5+}, and Ga{sup 3+} to the doping concentration. The crystals and ceramics show similar optical spectra, with broad and structured (especially at low temperatures) bands whose shape depends on temperature and doping concentration. At 10 K, the Nd{sup 3+4}I{sub 9/2}{yields}{sup 4}F{sub 3/2,5/2} and Yb{sup 3+2}F{sub 7/2}{yields}{sup 2}F{sub 5/2} absorption bands, which show prospect for diode laser pumping, can be decomposed in several lines that can be attributed to centers with large differences in the crystal field. The positions of these components are the same, but the relative intensity depends on the doping concentration and two main centers dominate the spectra. Non-selective excitation evidences broad emission bands, of prospect for short-pulse laser emission, whereas the selective excitation reveals the particular emission spectra of the various centers. The modeling reveals that the nonequivalent centers correspond to RE{sup 3+} ions with different cationic combinations in the nearest octahedral and tetrahedral coordination spheres, and the most abundant two centers have 4Nb and, respectively, 3Nb1Li in the nearest octahedral sphere. At 300 K, the spectral resolution is lost. It is then inferred that the observed optical bands are envelopes of the spectra of various structural centers, whose resolution is determined by the relative contribution of the temperature-dependent homogeneous broadening and the effects of crystal field disordering (multicenter structure, inhomogeneous broadening). The relevance of spectroscopic properties for selection of pumping conditions and of laser design that would enable utilization of the broad optical bands for efficient laser emission and reduced heat generation is discussed.

Lupei, V.; Lupei, A.; Gheorghe, C.; Gheorghe, L.; Achim, A. [National Institute for Lasers, Plasma and Radiation Physics, Lab. ECS, Bucharest (Romania); Ikesue, A. [World-Lab Co. Ltd., Atsuta-ku, Nagoya 456-8587 (Japan)

2012-09-15T23:59:59.000Z

432

Measurement of the solar neutrino capture rate with gallium metal. III: Results for the 2002--2007 data-taking period  

E-Print Network (OSTI)

The Russian-American experiment SAGE began to measure the solar neutrino capture rate with a target of gallium metal in Dec. 1989. Measurements have continued with only a few brief interruptions since that time. We give here the experimental improvements in SAGE since its last published data summary in Dec. 2001. Assuming the solar neutrino production rate was constant during the period of data collection, combined analysis of 168 extractions through Dec. 2007 gives a capture rate of solar neutrinos with energy more than 233 keV of 65.4 (+3.1)(-3.0) (stat) (+2.6)(-2.8) (syst) SNU. The weighted average of the results of all three Ga solar neutrino experiments, SAGE, Gallex, and GNO, is now 66.1 +/- 3.1 SNU, where statistical and systematic uncertainties have been combined in quadrature. During the recent period of data collection a new test of SAGE was made with a reactor-produced 37Ar neutrino source. The ratio of observed to calculated rates in this experiment, combined with the measured rates in the three prior 51Cr neutrino-source experiments with Ga, is 0.87 +/- 0.05. A probable explanation for this low result is that the cross section for neutrino capture by the two lowest-lying excited states in 71Ge has been overestimated. If we assume these cross sections are zero, then the standard solar model including neutrino oscillations predicts a total capture rate in Ga in the range of 63-66 SNU with an uncertainty of about 4%, in good agreement with experiment. We derive the current value of the neutrino flux produced in the Sun by the proton-proton fusion reaction to be (6.0 +/- 0.8) x 10^(10)/(cm^2 s), which agrees well with the pp flux predicted by the standard solar model. Finally, we show that the data are consistent with the assumption that the solar neutrino production rate is constant in time.

SAGE Collaboration; J. N. Abdurashitov; V. N. Gavrin; V. V. Gorbachev; P. P. Gurkina; T. V. Ibragimova; A. V. Kalikhov; N. G. Khairnasov; T. V. Knodel; I. N. Mirmov; A. A. Shikhin; E. P. Veretenkin; V. E. Yants; G. T. Zatsepin; T. J. Bowles; S. R. Elliott; W. A. Teasdale; J. S. Nico; B. T. Cleveland; J. F. Wilkerson

2009-01-15T23:59:59.000Z

433

NETL F 451.1-1/1 Categorical Exclusion (CX) Designation Form  

Energy.gov (U.S. Department of Energy (DOE)) Indexed Site

DE-EE0001967 Quantum Confined Inc. EE BETD 2009 Brett Aristegui 912010-8312011 116 Research Drive, Bethlehem, PA 18015 Scale-up of Indium Nitride Process and Characterization...

434

Novel Approaches to High-Efficiency III-V Nitride Heterostructure Emitters for Next-Generation Lighting Applications  

SciTech Connect

We report research activities and technical progress on the development of high-efficiency long wavelength ({lambda} {approx} 540nm) green light emitting diodes which covers whole years of the three-year program 'Novel approaches to high-efficiency III-V nitride heterostructure emitters for next-generation lighting applications'. The research activities were focused on the development of p-type layer that has less/no detrimental thermal annealing effect on as well as excellent structural and electrical properties and the development of green LED active region that has superior luminescence quality for {lambda}{approx}540nm green LEDs. We have also studied (1) the thermal annealing effect on blue and green LED active region during the p-type layer growth; (2) the effect of growth parameters and structural factors for LED active region on electroluminescence properties; (3) the effect of substrates and orientation on electrical and electro-optical properties of green LEDs. As a progress highlight, we obtained green-LED-active-region-friendly In{sub 0.04}Ga{sub 0.96}N:Mg exhibiting low resistivity with higher hole concentration (p=2.0 x 10{sup 18} cm{sup -3} and a low resistivity of 0.5 {omega}-cm) and improved optical quality green LED active region emitting at {approx}540nm by electroluminescence. The LEDs with p-InGaN layer can act as a quantum-confined Stark effect mitigation layer by reducing strain in the QW. We also have achieved (projected) peak IQE of {approx}25% at {lambda}{approx}530 nm and of {approx}13% at {lambda}{approx}545 nm. Visible LEDs on a non-polar substrate using (11-20) {alpha}-plane bulk substrates. The absence of quantum-confined Stark effect was confirmed but further improvement in electrical and optical properties is required.

Russell Dupuis

2007-06-30T23:59:59.000Z

435

Novel Approaches to High-Efficiency III-V Nitride Heterostructure Emitters for Next-Generation Lighting Applications  

SciTech Connect

We report research activities and technical progress on the development of high-efficiency long wavelength ({lambda} {approx} 540nm) green light emitting diodes which covers the second year of the three-year program ''Novel approaches to high-efficiency III-V nitride heterostructure emitters for next-generation lighting applications''. The second year activities were focused on the development of p-type layer that has less/no detrimental thermal annealing effect on green LED active region as well as excellent structural and electrical properties and the development of green LED active region that has superior luminescence quality for {lambda} {approx}540nm green LEDs. We have also studied the thermal annealing effect on blue and green LED active region during the p-type layer growth. As a progress highlight, we obtained green-LED-active-region-friendly In{sub 0.04}Ga{sub 0.96}N:Mg exhibiting low resistivity with higher hole concentration (p=2.0 x 10{sup 18} cm{sup -3} and a low resistivity of 0.5 {Omega}-cm) and improved optical quality green LED active region emitting at {lambda} {approx}540nm by electroluminescence. The active region of the green LEDs was found to be much more sensitive to the thermal annealing effect during the p-type layer growth than that of the blue LEDs. We have designed grown, fabricated green LED structures for both 520 nm and 540 nm for the evaluation of second year green LED development.

Russell D. Dupuis

2006-01-01T23:59:59.000Z

436

Novel Approaches to High-Efficiency III-V Nitride Heterostructure Emitters for Next-Generation Lighting Applications  

SciTech Connect

We report research activities and technical progress on the development of high-efficiency long wavelength ({lambda} {approx} 540nm) green light emitting diodes which covers whole years of the three-year program 'Novel approaches to high-efficiency III-V nitride heterostructure emitters for next-generation lighting applications'. The research activities were focused on the development of p-type layer that has less/no detrimental thermal annealing effect on as well as excellent structural and electrical properties and the development of green LED active region that has superior luminescence quality for {lambda}{approx}540nm green LEDs. We have also studied (1) the thermal annealing effect on blue and green LED active region during the p-type layer growth; (2) the effect of growth parameters and structural factors for LED active region on electroluminescence properties; (3) the effect of substrates and orientation on electrical and electro-optical properties of green LEDs. As a progress highlight, we obtained green-LED-active-region-friendly In{sub 0.04}Ga{sub 0.96}N:Mg exhibiting low resistivity with higher hole concentration (p=2.0 x 10{sup 18} cm{sup -3} and a low resistivity of 0.5 {omega}-cm) and improved optical quality green LED active region emitting at {approx}540nm by electroluminescence. The LEDs with p-InGaN layer can act as a quantum-confined Stark effect mitigation layer by reducing strain in the QW. We also have achieved (projected) peak IQE of {approx}25% at {lambda}{approx}530 nm and of {approx}13% at {lambda}{approx}545 nm. Visible LEDs on a non-polar substrate using (11-20) {alpha}-plane bulk substrates. The absence of quantum-confined Stark effect was confirmed but further improvement in electrical and optical properties is required.

Russell Dupuis

2007-06-30T23:59:59.000Z

437

Diagnosis of acute myocardial infarction by indium-111 antimyosin antibodies and correlation with the traditional techniques for the evaluation of extent and localization  

Science Conference Proceedings (OSTI)

This clinical study evaluated the accuracy of planar myocardial scintigraphy with antimyosin monoclonal antibodies radiolabeled with indium-111 (AMA-Fab) in the detection and localization of acute myocardial infarction (AMI). Fifty-seven patients admitted for suspected AMI were studied; 17 patients underwent thrombolytic therapy with intravenous streptokinase and 11 had clinical signs of reperfusion; 9 had had a previous myocardial infarction. Fifty of 57 patients were discharged from the coronary care unit with a confirmed diagnosis of AMI. The AMA-Fab study results were positive for AMI in 49 patients (98%) and negative in 1 (2%). Among the 7 patients without AMI, 5 had unstable angina, 1 had Prinzmetal's variant angina and 1 had acute pancreatitis. AMA-Fab results were negative in 6 of 7 patients (85%) and positive in 1 (15%). Therefore, the sensitivity and specificity of AMA-Fab scintigraphy were 0.98 and 0.85, respectively. To assess accuracy in defining the extent and location of AMI, AMA-Fab results were compared with those of the electrocardiogram, echocardiogram, technetium-99m pyrophosphate myocardial scintigraphy and coronary angiography and left ventriculography. AMA-Fab scintigraphy showed a good concordance with the traditional techniques in the topographic definition of the infarcted regions. No uptake of AMA-Fab was seen in the regions of previous old infarcts. Ten healthy volunteers also underwent AMA-Fab scintigraphy. No evidence of myocardial tracer uptake was noted in them. No adverse reactions or side effects were noted after injection of AMA-Fab in any patient. It is concluded that planar myocardial scintigraphy with AMA-Fab is a reliable method for AMI detection and location.

Volpini, M.; Giubbini, R.; Gei, P.; Cuccia, C.; Franzoni, P.; Riva, S.; Terzi, A.; Metra, M.; Bestagno, M.; Visioli, O.

1989-01-01T23:59:59.000Z

438

Manufacturing and Performance Assessment of Stamped, Laser Welded, and Nitrided FeCrV Stainless Steel Bipolar Plates for Proton Exchange Membrane Fuel Cells  

SciTech Connect

A manufacturing and single-cell fuel cell performance study of stamped, laser welded, and gas nitrided ferritic stainless steel foils in an advanced automotive bipolar plate assembly design was performed. Two developmental foil compositions were studied: Fee20Cre4V and Fee23Cre4V wt.%. Foils 0.1 mm thick were stamped and then laser welded together to create single bipolar plate assemblies with cooling channels. The plates were then surface treated by pre-oxidation and nitridation in N2e4H2 based gas mixtures using either a conventional furnace or a short-cycle quartz lamp infrared heating system. Single-cell fuel cell testing was performed at 80 C for 500 h at 0.3 A/cm2 using 100% humidification and a 100%/40% humidification cycle that stresses the membrane and enhances release of the fluoride ion and promotes a more corrosive environment for the bipolar plates. Periodic high frequency resistance potential-current scans during the 500 h fuel cell test and posttest analysis of the membrane indicated no resistance increase of the plates and only trace levels of metal ion contamination.

Brady, Michael P [ORNL; Abdelhamid, Mahmoud [General Motors Technical Center; Dadheech, G [General Motors Technical Center; Bradley, J [General Motors Technical Center; Toops, Todd J [ORNL; Meyer III, Harry M [ORNL; Tortorelli, Peter F [ORNL

2013-01-01T23:59:59.000Z

439

Ga-Zr (Gallium - Zirconium)  

Science Conference Proceedings (OSTI)

Ga-Zr crystallographic data...Ga 5 Zr 3 44.0 oC 32 Cmcm Ga 3 Zr 2 47 oF 40 Fdd 2 βGaZr 56.7 ? ? αGaZr 56.7 tI 16 I 4 1 / amd Ga 4 Zr 5 62.1 hP 18 P 6 3 / mcm Ga 2 Zr 3 66 tP 10 P 4/ mbm Ga 3 Zr 5 68.6 hP 16 P 6 3 / mcm GaZr 2 72.4 tI 12 I 4/ mcm (βZr) ~94 to 100 cI 2 Im m (αZr) 99.4 to 100 hP 2 P 6 3 / mmc...

440

Ba-Ga (Barium - Gallium)  

Science Conference Proceedings (OSTI)

Ba-Ga crystallographic data...Ba-Ga crystallographic data Phase Composition, wt% Ga Pearson symbol Space group (Ba) 0 cI 2 Im m Ba 10 Ga 4.8 cF 176 Fd m Ba 8 Ga 7 30.8 cP 60 P 2 1 3 BaGa 2 50.4 hP 3 P 6/ mmm BaGa 4 67 tI 10 I 4/ mmm (Ga) 100 hP 2 P 6 3 / mmc...

Note: This page contains sample records for the topic "indium gallium nitride" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


441

Gallium interactions with zircaloy cladding  

Science Conference Proceedings (OSTI)

The effects of Ga from weapons-grade plutonium MOX fuel on zircaloy-IV cladding during power reactor operation have been simulated by implantations of 100 keV Ga-69 ions into a polished zircaloy-IV sample while the sample was maintained at a typical cladding temperature of 375{degrees}C. Analyses were based on scanning electron microscopy, Rutherford backscattering of 280 keV He-3 ions, and secondary ion mass spectroscopy. Subgrains at the zircaloy-IV surface formed at a Ga fluence equivalent to total release of approximately 12 ppm by weight of Ga from the fuel. The subgrains may be an intermetallic compound of Zr{sub 2}Ga. Enhanced diffusion of Ga was observed, but Ga concentrations decreased 3 orders of magnitude over a depth of 3000 {angstrom}.

Hart, R.R.; Rennie, J.; Aucoin, K.; West, M. [Texas A& M Univ., College Station, TX (United States)

1998-05-01T23:59:59.000Z

442

A model of the gas-phase chemistry of boron nitride CVC from BCl{sub 3} and NH{sub 3}  

Science Conference Proceedings (OSTI)

The kinetics of gas-phase reactions occurring during the CVD of boron nitride (BN) from BCl{sub 3} and NH{sub 3} are investigated using an elementary reaction mechanism whose rate constants were obtained from theoretical predictions and literature sources. Plug-flow calculations using this mechanism predict that unimolecular decomposition of BCl{sub 3} is not significant under typical CVD conditions, but that some NH{sub 3} decomposition may occur, especially for deposition occurring at atmospheric pressure. Reaction of BCl{sub 3} with NH{sub 3} is rapid under CVD conditions and yields species containing both boron and nitrogen. One of these compounds, Cl{sub 2}BNH{sub 2}, is predicted to be a key gas-phase precursor to BN.

Allendorf, M.D.; Melius, C.F.; Osterheld, T.H.

1995-12-01T23:59:59.000Z

443

Boron nitride insulating material  

DOE Patents (OSTI)

High temperature BN-insulated heaters for use as fuel pin simulators in reactor thermal hydraulic test facility studies comprise a cylindrical housing and a concentric heating element disposed within the housing and spaced apart from the housing to define an annular region therebetween. The annular region contains BN for providing electrical resistance and thermal conductivity between the housing and the heating element. The fabrication method of this invention comprises the steps of cold pressing BN powder at a pressure of 20 to 80,000 psig and a dwell time of at least 0.1-3 seconds to provide hollow cylindrical preforms of suitable dimensions for insertion into the annular region, the BN powder having a tap density of about 0.6-1.1 g/cm.sup.3 and an orientation ratio of at least about 100/3.5. The preforms are inserted into the annular region and crushed in place.

Morgan, Jr., Chester S. (Oak Ridge, TN); Cavin, O. Burl (Knoxville, TN); McCulloch, Reginald W. (Concord, TN); Clark, David L. (Clearwater, FL)

1978-01-01T23:59:59.000Z

444

Nitrided Metallic Bipolar Plates  

NLE Websites -- All DOE Office Websites (Extended Search)

B. Cost (estimated) * Targets (2010) - resistivity < 10 mohm-cm 2 - corrosion < 1 x10 -6 Acm 2 Budget * Total project funding - cost < 5kW - 4530 K (+ 400 K Match) Team...

445

10 Nitrides: Chemistry  

Science Conference Proceedings (OSTI)

May 24, 1999 ... ant Substrates: Koen Vanhollebeke1; Ingrid Moerman1; Peter Van ...... Christine A. Wang1; Douglas C. Oakley1; 1MIT Lincoln Laboratory,...

446

Indium Corporation - Industrial Partnerships Office  

Current Weather. Protocol Office. Where to stay. Tri-Valley Visitors Bureau. City of Livermore. Community. ... solar photovoltaic, and thermal ...

447

In-Sn (Indium - Tin)  

Science Conference Proceedings (OSTI)

In-Sn crystallographic data...In-Sn crystallographic data Phase Composition, wt% Sn Pearson symbol Space group (In) 0 to 12.4 tI 2 I 4/ mmm β 12.4 to 44.8 tI 2 I 4/ mmm γ 73 to ? hP 5 P 6/ mmm (βSn) ? to 100 tI 4 I 4 1 / amd (αSn) 100 cF 8 Fd m...

448

Ge-In (Germanium - Indium)  

Science Conference Proceedings (OSTI)

Ge-In crystallographic data...Ge-In crystallographic data Phase Composition, wt% In Pearson symbol Space group (Ge) 0 cF 8 Fd m (In) 100 tI 2 I 4/ mmm...

449

In-Pb (Indium - Lead)  

Science Conference Proceedings (OSTI)

In-Pb crystallographic data...In-Pb crystallographic data Phase Composition, wt% Pb Pearson symbol Space group (In) 0 to ? tI 2 I 4/ mmm α ~24 to ~44 tI 2 I 4/ mmm (Pb) ? to 100 cF 4 Fm m...

450

In-Zn (Indium - Zinc)  

Science Conference Proceedings (OSTI)

In-Zn crystallographic data...In-Zn crystallographic data Phase Composition, wt% Zn Pearson symbol Space group (In) 0 to 1 tI 2 I 4/ mmm (Zn) 99.8 to 100 hP 2 P 6 3 / mmc...

451

In-Pu (Indium - Plutonium)  

Science Conference Proceedings (OSTI)

In-Pu crystallographic data...Pu Pearson symbol Space group (In) 0 tI 2 I 4/ mmm In 3 Pu 42 to 44 cP 4 Pm m In 5 Pu 3 56.1 ? (a) InPu 66 to 70 tP 2 tI 2 P 4/ mmm I 4/ mmm η 73.8 to 81 ? ? InPu 3 84.5 to 88 cP 4 cF 4 Pm m Fm m (εPu) 99.3 to 100 cI 2 Im m (δ?Pu) 100 tI 2 I 4/ mmm (δPu) 99 to 100 cF 4 Fm m (γPu) 100 oF 8 Fddd...

452

In-Si (Indium - Silicon)  

Science Conference Proceedings (OSTI)

In-Si crystallographic data...In-Si crystallographic data Phase Composition, wt% In Pearson symbol Space group (Si) ~0 cF 8 Fd m (In) ~100 tI 2 I 4/ mmm...

453

Amorphous silicon/polycrystalline thin film solar cells  

DOE Patents (OSTI)

An improved photovoltaic solar cell is described including a p-type amorphous silicon layer, intrinsic amorphous silicon, and an n-type polycrystalline semiconductor such as cadmium sulfide, cadmium zinc sulfide, zinc selenide, gallium phosphide, and gallium nitride. The polycrystalline semiconductor has an energy bandgap greater than that of the amorphous silicon. The solar cell can be provided as a single-junction device or a multijunction device.

Ullal, H.S.

1991-03-13T23:59:59.000Z

454

Analytical and experimental evaluation of joining silicon nitride to metal and silicon carbide to metal for advanced heat engine applications. Final report  

DOE Green Energy (OSTI)

This report summarizes the results of Phase 2 of Analytical and Experimental Evaluation of Joining Silicon Nitride to Metal and Silicon Carbide to Metal for Advanced Heat Engine Applications. A general methodology was developed to optimize the joint geometry and material systems for 650{degrees}C applications. Failure criteria were derived to predict the fracture of the braze and ceramic. Extensive finite element analyses (FEA) were performed to examine various joint geometries and to evaluate the affect of different interlayers on the residual stress state. Also, material systems composed of coating materials, interlayers, and braze alloys were developed for the program based on the chemical stability and strength of the joints during processing, and service. The FEA results were compared with experiments using two methods: (1) an idealized strength relationship of the ceramic, and (2) a probabilistic analysis of the ceramic strength (NASA CARES). The results showed that the measured strength of the joint reached 30--80% of the strength predicted by FEA. Also, potential high-temperature braze alloys were developed and evaluated for the high-temperature application of ceramic-metal joints. 38 tabs, 29 figs, 20 refs.

Kang, S.; Selverian, J.H.; O`Neil, D.; Kim, H. [GTE Labs., Inc., Waltham, MA (US)] [GTE Labs., Inc., Waltham, MA (US); Kim, K. [Brown Univ., Providence, RI (US). Div. of Engineering] [Brown Univ., Providence, RI (US). Div. of Engineering

1993-05-01T23:59:59.000Z

455

Optical method for automated real time control of elemental composition, distribution, and film thickness in CIGS solar cell production  

The solar industry has shown significant growth over the past decade. From 2002 to 2007 the market for Copper Indium Gallium Selenide (CIGS) grew at a 60% annual rate and it is estimated that the global CIGS market will grow to $7.6 billion by 2016. ...

456

When you think of the film industry, what comes to mind? Entertainment. In this issue you will discover how films not only bring us the latest adventures but also are being sculptured at  

E-Print Network (OSTI)

rooftop market. Solyndra uses a copper-indium-gallium-diselenide (CIGS) absorber layer in its solar cell to create revolutionary optics, semiconductors, medical devices, and solar cells. Spring 2009 In This Issue information, visit: www.jbg3.net Alumni Spotlight Phil Kraus (B.S. '93) is the director of technology at solar

Demirel, Melik C.

457

Catalysts for hydrocarbon conversion  

Science Conference Proceedings (OSTI)

Catalyst, particularly useful in catalytic reforming and for producing highly pure aromatic hydrocarbons, comprising an alumina carrier and containing, expressed in proportion of the weight of the alumina carrier: 005 to 1% of platinum 01 to 4% of gallium, indium or thallium 01 to 2% of tungsten, and 1 to 10% of halogen.

Le P. J.; Malmaison, R.; Marcilly, C.; Martino, G.; Miquel, J.

1980-08-12T23:59:59.000Z

458

Iron-Nitride-Based Magnets: Synthesis and Phase Stabilization of Body Center Tetragonal (BCT) Metastable Fe-N Anisotropic Nanocomposite Magnet- A Path to Fabricate Rare Earth Free Magnet  

SciTech Connect

REACT Project: The University of Minnesota will develop an early stage prototype of an iron-nitride permanent magnet material for EVs and renewable power generators. This new material, comprised entirely of low-cost and abundant resources, has the potential to demonstrate the highest energy potential of any magnet to date. This project will provide the basis for an entirely new class of rare-earth-free magnets capable of generating power without costly and scarce rare earth materials. The ultimate goal of this project is to demonstrate a prototype with magnetic properties exceeding state-of-the-art commercial magnets.

None

2012-01-01T23:59:59.000Z

459

Effects of Rare Earth (RE) Intergranular Adsorption on the Phase Transformation and Microstructure Evolution in Silicon Nitride with RE2O3 + MgO Additives: Fracture Behavior  

SciTech Connect

Silicon nitride powders consist primarily of the alpha phase, which transforms to the beta phase during the densification and microstructural evolution of Si3N4 ceramics. The temperature at which the transformation initiates in the presence of a combination of MgO and RE2O3 densification additives is found to decrease with increasing atomic number of the rare earth (RE). This trend coincides with the predicted and observed decrease in the affinity of the rare earth to segregate to and absorb on the prism planes of hexagonal prism shaped beta grains with increase in the atomic number of the RE. When RE adsorption is diminished, Si (and N) attachment on the smooth prism planes is enhanced, which increases diametrical growth rates, normally reaction-rate limited by an attachment mechanism. Combined with the typically fast [0001] growth, it is this augmented grain growth that contributes towards the initiation of the alpha-beta transformation at lower temperatures. With the enhanced transformation, observations reveal an increase in the number of beta grains growing in the early stages of densification. On the other hand, increased RE adsorption leads to greater growth anisotropy resulting in the formation of higher aspect ratio grains. Thus, Lu2O3 generates larger diameter, yet elongated, reinforcing grains, while La2O3 results in reinforcing grains of higher aspect ratio. The Gd2O3 additive transformation and microstructual characteristics lie intermediate to those of the lanthanide end member elements. Despite these differences, a substantial fraction of large reinforcing grains were found for each additive composition. As a result, the mechanical properties of the resultant ceramics are similar with flexure strengths in excess of 1 GPa, fracture toughness values greater than 10 MPa m1/2 at room temperature and excellent strength retention (>800 MPa) at 1200 C.

Becher, Paul F [ORNL; Painter, Gayle S [ORNL; Shibata, Naoya [University of Tokyo, Tokyo, Japan; Waters, Shirley B [ORNL; Lin, Hua-Tay [ORNL

2008-01-01T23:59:59.000Z

460

Commercialization of New Lattice-Matched Multi-Junction Solar Cells Based on Dilute Nitrides: July 8, 2010 - March 7, 2012  

SciTech Connect

Final Technical Progress Report for PV Incubator subcontract NAT-0-99013-03. The overall objective of this Incubator subcontract was to complete the work necessary to make commercial ready solar cells using the dilute nitride technology. The specific objectives of this program were aimed at completing the development of a triple-junction solar cell that incorporates a GaInNAs {approx}1eV subcell to the point of commercial readiness, and determining the cell reliability and, if necessary, identifying and eliminating process or material related issues that lead to early-life cell failures. There were three major objectives for Phase 1, each of which focuses on a key element of the solar cell that determines its performance in a commercial CPV system. One objective was to optimize the quality and performance of the key individual components making up the solar cell structure and then to optimize the integration of these components into a complete triple-junction cell. A second objective was to design and test anti-reflective coating that maximizes the light coupled into a 3J cell with a {approx}1 eV bottom cell bandgap. The third objective was to develop Highly Accelerated Life Tests (HALT) protocols and tools for identifying and correcting potential reliability problems. The Phase 2 objectives were a continuation of the work begun in Phase 1 but aimed at optimizing cell performance for commercial requirements. Phase 2 had four primary objectives: (1) develop a glass-matched anti-reflective coating (ARC) and optimize the cell/ARC to give good performance at 60C operating temperature, (2) optimize the cell for good operation at 60C and high concentration, and (3) complete the light biased HALT system and use it to determine what, if any, failures are observed, and (4) determine the reliability limits of the optimized cell.

Herb, J.

2012-04-01T23:59:59.000Z