Sample records for indium gallium nitride

  1. Distinctive Signature of Indium Gallium Nitride Quantum Dot Lasing in Microdisks Cavities

    E-Print Network [OSTI]

    Woolf, Alexander; Aharanovich, Igor; Zhu, Tongtong; Niu, Nan; Wang, Danqing; Oliver, Rachel A; Hu, Evelyn L

    2014-01-01T23:59:59.000Z

    Low threshold lasers realized within compact, high quality optical cavities enable a variety of nanophotonics applications. Gallium nitride (GaN) materials containing indium gallium nitride (InGaN) quantum dots and quantum wells offer an outstanding platform to study light matter interactions and realize practical devices such as efficient light emitting diodes and nanolasers. Despite progress in the growth and characterization of InGaN quantum dots, their advantages as the gain medium in low threshold lasers have not been clearly demonstrated. This work seeks to better understand the reasons for these limitations by focusing on the simpler, limited-mode microdisk cavities, and by carrying out comparisons of lasing dynamics in those cavities using varying gain media including InGaN quantum wells, fragmented quantum wells, and a combination of fragmented quantum wells with quantum dots. For each gain medium, we utilize the distinctive, high quality (Q~5500) modes of the cavities, and the change in the highest ...

  2. The influence of random indium alloy fluctuations in indium gallium nitride quantum wells on the device behavior

    SciTech Connect (OSTI)

    Yang, Tsung-Jui; Wu, Yuh-Renn, E-mail: yrwu@ntu.edu.tw [Graduate Institute of Photonics and Optoelectronics and Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan (China); Shivaraman, Ravi; Speck, James S. [Department of Materials, University of California, Santa Barbara, California 93106 (United States)

    2014-09-21T23:59:59.000Z

    In this paper, we describe the influence of the intrinsic indium fluctuation in the InGaN quantum wells on the carrier transport, efficiency droop, and emission spectrum in GaN-based light emitting diodes (LEDs). Both real and randomly generated indium fluctuations were used in 3D simulations and compared to quantum wells with a uniform indium distribution. We found that without further hypothesis the simulations of electrical and optical properties in LEDs such as carrier transport, radiative and Auger recombination, and efficiency droop are greatly improved by considering natural nanoscale indium fluctuations.

  3. Electrospun Gallium Nitride Nanofibers

    SciTech Connect (OSTI)

    Melendez, Anamaris; Morales, Kristle; Ramos, Idalia [University of Puerto Rico at Humacao, Humacao (Puerto Rico); Campo, Eva [Centre Nacional de Microelectronica, Barcelona (Spain); Santiago, Jorge J. [University of Pennsylvania, Philadelphia (United States)

    2009-04-19T23:59:59.000Z

    The high thermal conductivity and wide bandgap of gallium nitride (GaN) are desirable characteristics in optoelectronics and sensing applications. In comparison to thin films and powders, in the nanofiber morphology the sensitivity of GaN is expected to increase as the exposed area (proportional to the length) increases. In this work we present electrospinning as a novel technique in the fabrication of GaN nanofibers. Electrospinning, invented in the 1930s, is a simple, inexpensive, and rapid technique to produce microscopically long ultrafine fibers. GaN nanofibers are produced using gallium nitrate and dimethyl-acetamide as precursors. After electrospinning, thermal decomposition under an inert atmosphere is used to pyrolyze the polymer. To complete the preparation, the nanofibers are sintered in a tube furnace under a NH{sub 3} flow. Both scanning electron microscopy and profilometry show that the process produces continuous and uniform fibers with diameters ranging from 20 to a few hundred nanometers, and lengths of up to a few centimeters. X-ray diffraction (XRD) analysis shows the development of GaN nanofibers with hexagonal wurtzite structure. Future work includes additional characterization using transmission electron microscopy and XRD to understand the role of precursors and nitridation in nanofiber synthesis, and the use of single nanofibers for the construction of optical and gas sensing devices.

  4. P-type gallium nitride

    DOE Patents [OSTI]

    Rubin, Michael (Berkeley, CA); Newman, Nathan (Montara, CA); Fu, Tracy (Berkeley, CA); Ross, Jennifer (Pleasanton, CA); Chan, James (Berkeley, CA)

    1997-01-01T23:59:59.000Z

    Several methods have been found to make p-type gallium nitride. P-type gallium nitride has long been sought for electronic devices. N-type gallium nitride is readily available. Discovery of p-type gallium nitride and the methods for making it will enable its use in ultraviolet and blue light-emitting diodes and lasers. pGaN will further enable blue photocathode elements to be made. Molecular beam epitaxy on substrates held at the proper temperatures, assisted by a nitrogen beam of the proper energy produced several types of p-type GaN with hole concentrations of about 5.times.10.sup.11 /cm.sup.3 and hole mobilities of about 500 cm.sup.2 /V-sec, measured at 250.degree. K. P-type GaN can be formed of unintentionally-doped material or can be doped with magnesium by diffusion, ion implantation, or co-evaporation. When applicable, the nitrogen can be substituted with other group III elements such as Al.

  5. P-type gallium nitride

    DOE Patents [OSTI]

    Rubin, M.; Newman, N.; Fu, T.; Ross, J.; Chan, J.

    1997-08-12T23:59:59.000Z

    Several methods have been found to make p-type gallium nitride. P-type gallium nitride has long been sought for electronic devices. N-type gallium nitride is readily available. Discovery of p-type gallium nitride and the methods for making it will enable its use in ultraviolet and blue light-emitting diodes and lasers. pGaN will further enable blue photocathode elements to be made. Molecular beam epitaxy on substrates held at the proper temperatures, assisted by a nitrogen beam of the proper energy produced several types of p-type GaN with hole concentrations of about 5{times}10{sup 11} /cm{sup 3} and hole mobilities of about 500 cm{sup 2} /V-sec, measured at 250 K. P-type GaN can be formed of unintentionally-doped material or can be doped with magnesium by diffusion, ion implantation, or co-evaporation. When applicable, the nitrogen can be substituted with other group III elements such as Al. 9 figs.

  6. Au-free Ohmic Contacts to Gallium Nitride and Graphene 

    E-Print Network [OSTI]

    Ravikirthi, Pradhyumna

    2014-08-10T23:59:59.000Z

    This work deals with Au-free contact metallization schemes for gallium nitride (GaN) and graphene semiconductors. Graphene and gallium nitride are promising materials that can potentially be integrated together in the near future for high frequency...

  7. Au-free Ohmic Contacts to Gallium Nitride and Graphene

    E-Print Network [OSTI]

    Ravikirthi, Pradhyumna

    2014-08-10T23:59:59.000Z

    This work deals with Au-free contact metallization schemes for gallium nitride (GaN) and graphene semiconductors. Graphene and gallium nitride are promising materials that can potentially be integrated together in the near future for high frequency...

  8. Effect of Gallium Nitride Template Layer Strain on the Growth...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Gallium Nitride Template Layer Strain on the Growth of InxGa1-xNGaN Multiple Quantum Well Light Emitting Diodes. Effect of Gallium Nitride Template Layer Strain on the Growth of...

  9. Synthesis and characterization of visible emission from rare-earth doped aluminum nitride, gallium nitride and gallium aluminum nitride powders and thin films

    E-Print Network [OSTI]

    Tao, Jonathan Huai-Tse

    2010-01-01T23:59:59.000Z

    Gallium Nitride Doped With Europium," J. Appl. Phys. , 95Electroluminescence of Europium-doped Gallium Oxide ThinLuminescence Properties of Europium– terbium Double

  10. Gallium nitride junction field-effect transistor

    DOE Patents [OSTI]

    Zolper, John C. (Albuquerque, NM); Shul, Randy J. (Albuquerque, NM)

    1999-01-01T23:59:59.000Z

    An all-ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorous co-implantation, in selected III-V semiconductor materials.

  11. Gallium nitride junction field-effect transistor

    DOE Patents [OSTI]

    Zolper, J.C.; Shul, R.J.

    1999-02-02T23:59:59.000Z

    An ion implanted gallium-nitride (GaN) junction field-effect transistor (JFET) and method of making the same are disclosed. Also disclosed are various ion implants, both n- and p-type, together with or without phosphorus co-implantation, in selected III-V semiconductor materials. 19 figs.

  12. Light-Emitting Diodes on Semipolar Bulk Gallium Nitride Substrate...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    semipolar light-emitting diodes (LEDs) on low-defect bulk gallium nitride (GaN) substrates. Peak internal quantum efficiency (IQE) values of greater than 80% are...

  13. arsenide gallium nitride: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Lundberga,*, J. Lua , A Abstract The diffusion of indium and gallium in polycrystalline thin film Cu(In,Ga)Se2 layers has been with a larger number of vacancies, that facilitates...

  14. Formation of copper-indium-selenide and/or copper-indium-gallium-selenide films from indium selenide and copper selenide precursors

    DOE Patents [OSTI]

    Curtis, Calvin J. (Lakewood, CO); Miedaner, Alexander (Boulder, CO); Van Hest, Maikel (Lakewood, CO); Ginley, David S. (Evergreen, CO); Nekuda, Jennifer A. (Lakewood, CO)

    2011-11-15T23:59:59.000Z

    Liquid-based indium selenide and copper selenide precursors, including copper-organoselenides, particulate copper selenide suspensions, copper selenide ethylene diamine in liquid solvent, nanoparticulate indium selenide suspensions, and indium selenide ethylene diamine coordination compounds in solvent, are used to form crystalline copper-indium-selenide, and/or copper indium gallium selenide films (66) on substrates (52).

  15. Preparation Of Copper Indium Gallium Diselenide Films For Solar Cells

    DOE Patents [OSTI]

    Bhattacharya, Raghu N. (Littleton, CO); Contreras, Miguel A. (Golden, CO); Keane, James (Lakewood, CO); Tennant, Andrew L. (Denver, CO), Tuttle, John R. (Denver, CO); Ramanathan, Kannan (Lakewood, CO); Noufi, Rommel (Golden, CO)

    1998-08-08T23:59:59.000Z

    High quality thin films of copper-indium-gallium-diselenide useful in the production of solar cells are prepared by electrodepositing at least one of the constituent metals onto a glass/Mo substrate, followed by physical vapor deposition of copper and selenium or indium and selenium to adjust the final stoichiometry of the thin film to approximately Cu(In,Ga)Se.sub.2. Using an AC voltage of 1-100 KHz in combination with a DC voltage for electrodeposition improves the morphology and growth rate of the deposited thin film. An electrodeposition solution comprising at least in part an organic solvent may be used in conjunction with an increased cathodic potential to increase the gallium content of the electrodeposited thin film.

  16. IIl-nitride nanowires and heterostructures : growth and optical properties on nanoscale

    E-Print Network [OSTI]

    Zhou, Xiang, Ph. D. Massachusetts Institute of Technology

    2014-01-01T23:59:59.000Z

    Gallium nitride (GaN) and indium gallium nitride (InGaN) nanowires promise potential for further improving the electricity-to-light energy conversion efficiencies in light emitting diodes due to strain relaxation, reduced ...

  17. Delta-phase manganese gallium on gallium nitride: a magnetically tunable spintronic system

    E-Print Network [OSTI]

    with Mn:Ga ratio between 1:1 to 1.5:1 is grown on wurtzite gallium nitride and scandium nitride substrates. Results suggest that for growth on wurtzite GaN, Ga-polar surface promotes quicker interface formation epitaxially on top of wide band-gap Ga-polar wurtzite GaN(0001), with controllable magnetism by adjusting

  18. Synthesis and use of (polyfluoroaryl)fluoroanions of aluminum, gallium and indium

    DOE Patents [OSTI]

    Marks, Tobin J. (Evanston, IL); Chen, You-Xian (Midland, MI)

    2000-01-01T23:59:59.000Z

    Salts of (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium are described. The (polyfluoroaryl)fluoroanions have the formula [ER'R"R'"F].sup..crclbar. wherein E is aluminum, gallium, or indium, wherein F is fluorine, and wherein R', R", and R'" is each a fluorinated phenyl, fluorinated biphenyl, or fluorinated polycyclic group.

  19. Growth of epitaxial iron nitride ultrathin film on zinc-blende gallium nitride

    SciTech Connect (OSTI)

    Pak, J.; Lin, W.; Wang, K.; Chinchore, A.; Shi, M.; Ingram, D. C.; Smith, A. R.; Sun, K.; Lucy, J. M.; Hauser, A. J.; Yang, F. Y. [Department of Physics and Astronomy, Nanoscale and Quantum Phenomena Institute, Ohio University, Athens, Ohio 45701 (United States); Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Department of Physics, The Ohio State University, 191 Woodruff Avenue, Columbus, Ohio 43210 (United States)

    2010-07-15T23:59:59.000Z

    The authors report the growth of iron nitride on zinc-blende gallium nitride using molecular beam epitaxy. First, zinc-blende GaN is grown on a magnesium oxide substrate having (001) orientation; second, an ultrathin layer of FeN is grown on top of the GaN layer. In situ reflection high-energy electron diffraction is used to monitor the surface during growth, and a well-defined epitaxial relationship is observed. Cross-sectional transmission electron microscopy is used to reveal the epitaxial continuity at the gallium nitride-iron nitride interface. Surface morphology of the iron nitride, similar to yet different from that of the GaN substrate, can be described as plateau valley. The FeN chemical stoichiometry is probed using both bulk and surface sensitive methods, and the magnetic properties of the sample are revealed.

  20. (Polyfluoroaryl) fluoroanions of aluminum, gallium, and indium of enhanced utility, uses thereof, and products based thereon

    DOE Patents [OSTI]

    Marks, Tobin J. (Evanston, IL); Chen, You-Xian (Midland, MI)

    2002-01-01T23:59:59.000Z

    The (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium are novel weakly coordinating anions which are highly fluorinated. (Polyfluoroaryl)fluoroanions of one such type contain at least one ring substituent other than fluorine. These (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium have greater solubility in organic solvents, or have a coordinative ability essentially equal to or less than that of the corresponding (polyfluoroaryl)fluoroanion of aluminum, gallium, or indium in which the substituent is replaced by fluorine. Another type of new (polyfluoroaryl)fluoroanion of aluminum, gallium, and indium have 1-3 perfluorinated fused ring groups and 2-0 perfluorophenyl groups. When used as a cocatalyst in the formation of novel catalytic complexes with d- or f-block metal compounds having at least one leaving group such as a methyl group, these anions, because of their weak coordination to the metal center, do not interfere in the ethylene polymerization process, while affecting the propylene process favorably, if highly isotactic polypropylene is desired. Thus, the (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of this invention are useful in various polymerization processes such as are described.

  1. (Polyfluoroaryl) fluoroanions of aluminum, gallium, and indium of enhanced utility, uses thereof, and products based thereon

    DOE Patents [OSTI]

    Marks, Tobin J. (Evanston, IL); Chen, You-Xian (Midland, MI)

    2001-01-01T23:59:59.000Z

    The (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium are novel weakly coordinating anions which are highly fluorinated. (Polyfluoroaryl)fluoroanions of one such type contain at least one ring substituent other than fluorine. These (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium have greater solubility in organic solvents, or have a coordinative ability essentially equal to or less than that of the corresponding (polyfluoroaryl)fluoroanion of aluminum, gallium, or indium in which the substituent is replaced by fluorine. Another type of new (polyfluoroaryl)fluoroanion of aluminum, gallium, and indium have 1-3 perfluorinated fused ring groups and 2-0 perfluorophenyl groups. When used as a cocatalyst in the formation of novel catalytic complexes with d- or f-block metal compounds having at least one leaving group such as a methyl group, these anions, because of their weak coordination to the metal center, do not interfere in the ethylene polymerization process, while affecting the propylene process favorably, if highly isotactic polypropylene is desired. Thus, the (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of this invention are useful in various polymerization processes such as are described.

  2. Smooth cubic commensurate oxides on gallium nitride

    SciTech Connect (OSTI)

    Paisley, Elizabeth A.; Gaddy, Benjamin E.; LeBeau, James M.; Shelton, Christopher T.; Losego, Mark D.; Mita, Seiji; Collazo, Ramón; Sitar, Zlatko; Irving, Douglas L.; Maria, Jon-Paul, E-mail: jpmaria@ncsu.edu [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States); Biegalski, Michael D.; Christen, Hans M. [Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)

    2014-02-14T23:59:59.000Z

    Smooth, commensurate alloys of ?111?-oriented Mg{sub 0.52}Ca{sub 0.48}O (MCO) thin films are demonstrated on Ga-polar, c+ [0001]-oriented GaN by surfactant-assisted molecular beam epitaxy and pulsed laser deposition. These are unique examples of coherent cubic oxide|nitride interfaces with structural and morphological perfection. Metal-insulator-semiconductor capacitor structures were fabricated on n-type GaN. A comparison of leakage current density for conventional and surfactant-assisted growth reveals a nearly 100× reduction in leakage current density for the surfactant-assisted samples. HAADF-STEM images of the MCO|GaN interface show commensurate alignment of atomic planes with minimal defects due to lattice mismatch. STEM and DFT calculations show that GaN c/2 steps create incoherent boundaries in MCO over layers which manifest as two in-plane rotations and determine consequently the density of structural defects in otherwise coherent MCO. This new understanding of interfacial steps between HCP and FCC crystals identifies the steps needed to create globally defect-free heterostructures.

  3. Gallium nitride microcavities formed by photoenhanced wet oxidation

    SciTech Connect (OSTI)

    Peng, L.-H.; Lu, C.-Y.; Wu, W.-H.; Wang, S.-L. [Department of Electrical Engineering and Institute of Electro-Optical Engineering, National Taiwan University, Taipei, Taiwan (China)

    2005-10-17T23:59:59.000Z

    We report the formation of gallium nitride (GaN) microcavities by manipulating a photoenhanced oxidation rate difference between the polar and nonpolar crystallographic planes of GaN. When immersed in a buffered acetic (CH{sub 3}COOH) electrolyte of pH{approx}6.2 at room temperature, it is shown that the photo-oxidation can proceed at a rate that is one order of magnitude slower on the nonpolar plane of {l_brace}1100{r_brace}{sub GaN} than on the polar plane of {l_brace}0001{r_brace}{sub GaN} due to the reduced surface field action. Gallium nitride microcavities bounded by optically smooth {l_brace}1100{r_brace} and {l_brace}1103{r_brace} facets can thus be preferentially formed on the c-plane sapphire substrate after dissolving the oxide layer. The optical properties of these GaN hexagonal cavities reveal characteristic peaks of whispering gallery modes in resonance with the GaN band edge emission spectrum. A typical cavity Q factor of 10{sup 3} is observed in these GaN microcavities due to a reduced optical scattering loss in the wet chemical reaction process.

  4. Luminescence dynamics and waveguide applications of europium doped gallium nitride powder

    E-Print Network [OSTI]

    Lipson, Michal

    Luminescence dynamics and waveguide applications of europium doped gallium nitride powder Carl B, bismuth shot, and europium ingot in an ammonia ambient to initially obtain chunks of the desired material

  5. Diffusion of indium and gallium in Cu(In,Ga)Se2 thin film solar cells

    E-Print Network [OSTI]

    Rockett, Angus

    conversion efficiency of solar cells made from this material [1]. One of the special qualities of the CIGS improve the solar cell performance. In many of the different CIGS fabrication techniques, an in depthDiffusion of indium and gallium in Cu(In,Ga)Se2 thin film solar cells O. Lundberga,*, J. Lua , A

  6. Precursors for formation of copper selenide, indium selenide, copper indium diselenide, and/or copper indium gallium diselenide films

    DOE Patents [OSTI]

    Curtis, Calvin J; Miedaner, Alexander; Van Hest, Maikel; Ginley, David S

    2014-11-04T23:59:59.000Z

    Liquid-based precursors for formation of Copper Selenide, Indium Selenide, Copper Indium Diselenide, and/or copper Indium Galium Diselenide include copper-organoselenides, particulate copper selenide suspensions, copper selenide ethylene diamine in liquid solvent, nanoparticulate indium selenide suspensions, and indium selenide ethylene diamine coordination compounds in solvent. These liquid-based precursors can be deposited in liquid form onto substrates and treated by rapid thermal processing to form crystalline copper selenide and indium selenide films.

  7. aluminium gallium indium: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    on which all indium abundance studies are based, both for the quiet-sun and the sunspot umbra spectrum, employing standard atmosphere models and accounting for hyperfine structure...

  8. aluminum gallium indium: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    on which all indium abundance studies are based, both for the quiet-sun and the sunspot umbra spectrum, employing standard atmosphere models and accounting for hyperfine structure...

  9. amorphous indium gallium: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    on which all indium abundance studies are based, both for the quiet-sun and the sunspot umbra spectrum, employing standard atmosphere models and accounting for hyperfine structure...

  10. Synthesis, characterization, and biotemplated assembly of indium nitride and indium gallium nitride nanoparticles

    E-Print Network [OSTI]

    Hsieh, Jennifer Chia-Jen

    2010-01-01T23:59:59.000Z

    A low-temperature, ambient pressure solution synthesis of colloidal InN nanoparticles is presented. This synthesis utilizes a previously dismissed precursor and results in individual, non-aggregated nanoparticles with ...

  11. In vitro bio-functionality of gallium nitride sensors for radiation biophysics

    SciTech Connect (OSTI)

    Hofstetter, Markus [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany)] [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany); Howgate, John [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany)] [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany); Schmid, Martin [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany)] [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany); Schoell, Sebastian; Sachsenhauser, Matthias [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany)] [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany); Adiguezel, Denis [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany)] [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany); Stutzmann, Martin; Sharp, Ian D. [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany)] [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany); Thalhammer, Stefan, E-mail: stefan.thalhammer@helmholtz-muenchen.de [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany)] [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany)

    2012-07-27T23:59:59.000Z

    Highlights: Black-Right-Pointing-Pointer Gallium nitride based sensors show promising characteristics to monitor cellular parameters. Black-Right-Pointing-Pointer Cell growth experiments reveal excellent biocompatibiltiy of the host GaN material. Black-Right-Pointing-Pointer We present a biofunctionality assay using ionizing radiation. Black-Right-Pointing-Pointer DNA repair is utilized to evaluate material induced alterations in the cellular behavior. Black-Right-Pointing-Pointer GaN shows no bio-functional influence on the cellular environment. -- Abstract: There is an increasing interest in the integration of hybrid bio-semiconductor systems for the non-invasive evaluation of physiological parameters. High quality gallium nitride and its alloys show promising characteristics to monitor cellular parameters. Nevertheless, such applications not only request appropriate sensing capabilities but also the biocompatibility and especially the biofunctionality of materials. Here we show extensive biocompatibility studies of gallium nitride and, for the first time, a biofunctionality assay using ionizing radiation. Analytical sensor devices are used in medical settings, as well as for cell- and tissue engineering. Within these fields, semiconductor devices have increasingly been applied for online biosensing on a cellular and tissue level. Integration of advanced materials such as gallium nitride into these systems has the potential to increase the range of applicability for a multitude of test devices and greatly enhance sensitivity and functionality. However, for such applications it is necessary to optimize cell-surface interactions and to verify the biocompatibility of the semiconductor. In this work, we present studies of mouse fibroblast cell activity grown on gallium nitride surfaces after applying external noxa. Cell-semiconductor hybrids were irradiated with X-rays at air kerma doses up to 250 mGy and the DNA repair dynamics, cell proliferation, and cell growth dynamics of adherent cells were compared to control samples. The impact of ionizing radiation on DNA, along with the associated cellular repair mechanisms, is well characterized and serves as a reference tool for evaluation of substrate effects. The results indicate that gallium nitride does not require specific surface treatments to ensure biocompatibility and suggest that cell signaling is not affected by micro-environmental alterations arising from gallium nitride-cell interactions. The observation that gallium nitride provides no bio-functional influence on the cellular environment confirms that this material is well suited for future biosensing applications without the need for additional chemical surface modification.

  12. (Polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of enhanced utility, uses thereof, and products based thereon

    DOE Patents [OSTI]

    Marks, Tobin J. (Evanston, IL); Chen, You-Xian (Midland, MI)

    2001-01-01T23:59:59.000Z

    The (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium are novel weakly coordinating anions which are are highly fluorinated. (Polyfluoroaryl)fluoroanions of one such type contain at least one ring substituent other than fluorine. These (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium have greater solubility in organic solvents, or have a coordinative ability essentially equal to or less than that of the corresponding (polyfluoroaryl)fluoroanion of aluminum, gallium, or indium in which the substituent is replaced by fluorine. Another type of new (polyfluoroaryl)fluoroanion of aluminum, gallium, and indium have 1-3 perfluorinated fused ring groups and 2-0 perfluorophenyl groups. When used as a cocatalyst in the formation of novel catalytic complexes with d- or f-block metal compounds having at least one leaving group such as a methyl group, these anions, because of their weak coordination to the metal center, do not interefere in the ethylene polymerization process, while affecting the the propylene process favorably, if highly isotactic polypropylene is desired. Thus, the (polyfluoroaryl)fluoroanions of aluminum, gallium, and indium of this invention are useful in various polymerization processes such as are described.

  13. ELECTRON MICROPROBE AND PHOTOLUMINESCENCE ANALYSIS OF EUROPIUM-DOPED GALLIUM NITRIDE LIGHT EMITTERS

    E-Print Network [OSTI]

    Strathclyde, University of

    ELECTRON MICROPROBE AND PHOTOLUMINESCENCE ANALYSIS OF EUROPIUM-DOPED GALLIUM NITRIDE LIGHT EMITTERSN-on-sapphire epilayers implanted with Europium ions, producing characteristic red emission lines between 540 and 680 nm with energies largely independent of the host material. For example, doping with europium, erbium and thulium

  14. Tripodal aminophenolate ligand complexes of aluminum(III), gallium(III), and indium(III) in water

    SciTech Connect (OSTI)

    Caravan, P.; Orvig, C. [Univ. of British Columbia, Vancouver (Canada)] [Univ. of British Columbia, Vancouver (Canada)

    1997-01-15T23:59:59.000Z

    This article focuses on the development of radiopharmaceuticals using new chelators of gallium and indium. The radionuclide kinetics and demetalation kinetics are of great consideration. This work explored the effects of ligand backbone variations on the selectivity of multidentate aminophenolate ligands among the trivalent metal ions Al(III), Ga(III) and In(III) in water. 54 refs., 16 figs., 3 tabs.

  15. Gas source molecular beam epitaxy of scandium nitride on silicon carbide and gallium nitride surfaces

    SciTech Connect (OSTI)

    King, Sean W., E-mail: sean.king@intel.com; Davis, Robert F. [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States); Nemanich, Robert J. [Department of Physics, North Carolina State University, Raleigh, North Carolina 27695 (United States)

    2014-11-01T23:59:59.000Z

    Scandium nitride (ScN) is a group IIIB transition metal nitride semiconductor with numerous potential applications in electronic and optoelectronic devices due to close lattice matching with gallium nitride (GaN). However, prior investigations of ScN have focused primarily on heteroepitaxial growth on substrates with a high lattice mismatch of 7%–20%. In this study, the authors have investigated ammonia (NH{sub 3}) gas source molecular beam epitaxy (NH{sub 3}-GSMBE) of ScN on more closely lattice matched silicon carbide (SiC) and GaN surfaces (<3% mismatch). Based on a thermodynamic analysis of the ScN phase stability window, NH{sub 3}-GSMBE conditions of 10{sup ?5}–10{sup ?4} Torr NH{sub 3} and 800–1050?°C where selected for initial investigation. In-situ x-ray photoelectron spectroscopy (XPS) and ex-situ Rutherford backscattering measurements showed all ScN films grown using these conditions were stoichiometric. For ScN growth on 3C-SiC (111)-(?3?×??3)R30° carbon rich surfaces, the observed attenuation of the XPS Si 2p and C 1s substrate core levels with increasing ScN thickness indicated growth initiated in a layer-by-layer fashion. This was consistent with scanning electron microscopy (SEM) images of 100–200?nm thick films that revealed featureless surfaces. In contrast, ScN films grown on 3C-SiC (111)-(3?×?3) and 3C-SiC (100)-(3?×?2) silicon rich surfaces were found to exhibit extremely rough surfaces in SEM. ScN films grown on both 3C-SiC (111)-(?3?×??3)R30° and 2H-GaN (0001)-(1?×?1) epilayer surfaces exhibited hexagonal (1?×?1) low energy electron diffraction patterns indicative of (111) oriented ScN. X-ray diffraction ?-2? rocking curve scans for these same films showed a large full width half maximum of 0.29° (1047?arc sec) consistent with transmission electron microscopy images that revealed the films to be poly-crystalline with columnar grains oriented at ?15° to the [0001] direction of the 6H-SiC (0001) substrate. In-situ reflection electron energy loss spectroscopy measurements determined the band-gap for the NH{sub 3}-GSMBE ScN films to be 1.5?±?0.3 eV, and thermal probe measurements indicated all ScN films to be n-type. The four point probe sheet resistance of the ScN films was observed to increase with decreasing growth temperature and decreased with unintentional oxygen incorporation. Hg probe capacitance–voltage measurements indicated N{sub D}-N{sub A} decreased with decreasing growth temperature from 10{sup 19} to 10{sup 20}/cm{sup 3} for the lowest resistivity films to ?5?×?10{sup 16}/cm{sup 3} for the highest resistivity films. In-situ ultraviolet photoelectron spectroscopy measurements additionally showed the valence band maximum moving from 1.4 to 0.8 eV below the Fermi level with decreasing growth temperature consistent with the increased resistivity and reduction in carrier concentration. These results suggest that additional reductions in ScN carrier concentrations can be achieved via continued optimization of ScN growth conditions and selection of substrate orientation and surface termination.

  16. In situ analyses on negative ions in the indium-gallium-zinc oxide sputtering process

    SciTech Connect (OSTI)

    Jia, Junjun; Torigoshi, Yoshifumi; Shigesato, Yuzo [Graduate School of Science and Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Chuo, Sagamihara, Kanagawa 252-5258 (Japan)

    2013-07-01T23:59:59.000Z

    The origin of negative ions in the dc magnetron sputtering process using a ceramic indium-gallium-zinc oxide target has been investigated by in situ analyses. The observed negative ions are mainly O{sup -} with energies corresponding to the target voltage, which originates from the target and barely from the reactive gas (O{sub 2}). Dissociation of ZnO{sup -}, GaO{sup -}, ZnO{sub 2}{sup -}, and GaO{sub 2}{sup -} radicals also contributes to the total negative ion flux. Furthermore, we find that some sputtering parameters, such as the type of sputtering gas (Ar or Kr), sputtering power, total gas pressure, and magnetic field strength at the target surface, can be used to control the energy distribution of the O{sup -} ion flux.

  17. Origin of deep subgap states in amorphous indium gallium zinc oxide: Chemically disordered coordination of oxygen

    SciTech Connect (OSTI)

    Sallis, S.; Williams, D. S. [Materials Science and Engineering, Binghamton University, Binghamton, New York 13902 (United States); Butler, K. T.; Walsh, A. [Center for Sustainable Technologies and Department of Chemistry, University of Bath, Claverton Down, Bath BA2 7AY (United Kingdom); Quackenbush, N. F. [Department of Physics, Applied Physics, and Astronomy, Binghamton University, Binghamton, New York 13902 (United States); Junda, M.; Podraza, N. J. [Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States); Fischer, D. A.; Woicik, J. C. [Materials Science and Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States); White, B. E.; Piper, L. F. J., E-mail: lpiper@binghamton.edu [Department of Physics, Applied Physics, and Astronomy, Binghamton University, Binghamton, New York 13902 (United States); Materials Science and Engineering, Binghamton University, Binghamton, New York 13902 (United States)

    2014-06-09T23:59:59.000Z

    The origin of the deep subgap states in amorphous indium gallium zinc oxide (a-IGZO), whether intrinsic to the amorphous structure or not, has serious implications for the development of p-type transparent amorphous oxide semiconductors. We report that the deep subgap feature in a-IGZO originates from local variations in the oxygen coordination and not from oxygen vacancies. This is shown by the positive correlation between oxygen composition and subgap intensity as observed with X-ray photoelectron spectroscopy. We also demonstrate that the subgap feature is not intrinsic to the amorphous phase because the deep subgap feature can be removed by low-temperature annealing in a reducing environment. Atomistic calculations of a-IGZO reveal that the subgap state originates from certain oxygen environments associated with the disorder. Specifically, the subgap states originate from oxygen environments with a lower coordination number and/or a larger metal-oxygen separation.

  18. Preparation of copper-indium-gallium-diselenide precursor films by electrodeposition for fabricating high efficiency solar cells

    DOE Patents [OSTI]

    Bhattacharya, Raghu N. (Littleton, CO); Hasoon, Falah S. (Arvada, CO); Wiesner, Holm (Golden, CO); Keane, James (Lakewood, CO); Noufi, Rommel (Golden, CO); Ramanathan, Kannan (Golden, CO)

    1999-02-16T23:59:59.000Z

    A photovoltaic cell exhibiting an overall conversion efficiency of 13.6% is prepared from a copper-indium-gallium-diselenide precursor thin film. The film is fabricated by first simultaneously electrodepositing copper, indium, gallium, and selenium onto a glass/molybdenum substrate (12/14). The electrodeposition voltage is a high frequency AC voltage superimposed upon a DC voltage to improve the morphology and growth rate of the film. The electrodeposition is followed by physical vapor deposition to adjust the final stoichiometry of the thin film to approximately Cu(In.sub.1-n Ga.sub.x)Se.sub.2, with the ratio of Ga/(In+Ga) being approximately 0.39.

  19. Process for growing epitaxial gallium nitride and composite wafers

    DOE Patents [OSTI]

    Weber, Eicke R.; Subramanya, Sudhir G.; Kim, Yihwan; Kruger, Joachim

    2003-05-13T23:59:59.000Z

    A novel growth procedure to grow epitaxial Group III metal nitride thin films on lattice-mismatched substrates is proposed. Demonstrated are the quality improvement of epitaxial GaN layers using a pure metallic Ga buffer layer on c-plane sapphire substrate. X-ray rocking curve results indicate that the layers had excellent structural properties. The electron Hall mobility increases to an outstandingly high value of .mu.>400 cm.sup.2 /Vs for an electron background concentration of 4.times.10.sup.17 cm.sup.-3.

  20. Advanced Epi Tools for Gallium Nitride Light Emitting Diode Devices

    SciTech Connect (OSTI)

    Patibandla, Nag; Agrawal, Vivek

    2012-12-01T23:59:59.000Z

    Over the course of this program, Applied Materials, Inc., with generous support from the United States Department of Energy, developed a world-class three chamber III-Nitride epi cluster tool for low-cost, high volume GaN growth for the solid state lighting industry. One of the major achievements of the program was to design, build, and demonstrate the world’s largest wafer capacity HVPE chamber suitable for repeatable high volume III-Nitride template and device manufacturing. Applied Materials’ experience in developing deposition chambers for the silicon chip industry over many decades resulted in many orders of magnitude reductions in the price of transistors. That experience and understanding was used in developing this GaN epi deposition tool. The multi-chamber approach, which continues to be unique in the ability of the each chamber to deposit a section of the full device structure, unlike other cluster tools, allows for extreme flexibility in the manufacturing process. This robust architecture is suitable for not just the LED industry, but GaN power devices as well, both horizontal and vertical designs. The new HVPE technology developed allows GaN to be grown at a rate unheard of with MOCVD, up to 20x the typical MOCVD rates of 3{micro}m per hour, with bulk crystal quality better than the highest-quality commercial GaN films grown by MOCVD at a much cheaper overall cost. This is a unique development as the HVPE process has been known for decades, but never successfully commercially developed for high volume manufacturing. This research shows the potential of the first commercial-grade HVPE chamber, an elusive goal for III-V researchers and those wanting to capitalize on the promise of HVPE. Additionally, in the course of this program, Applied Materials built two MOCVD chambers, in addition to the HVPE chamber, and a robot that moves wafers between them. The MOCVD chambers demonstrated industry-leading wavelength yield for GaN based LED wafers and industry-leading uptime enabled in part by a novel in-situ cleaning process developed in this program.

  1. Indium and gallium oxynitrides prepared in the presence of Zn{sup 2+} by ammonolysis of the oxide precursors obtained via the citrate route

    SciTech Connect (OSTI)

    Miyaake, Azumi; Masubuchi, Yuji; Takeda, Takashi [Graduate School of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628 (Japan)] [Graduate School of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628 (Japan); Kikkawa, Shinichi, E-mail: kikkawa@eng.hokudai.ac.jp [Graduate School of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628 (Japan)] [Graduate School of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628 (Japan)

    2010-04-15T23:59:59.000Z

    Ammonia nitridation of indium and gallium oxide precursors obtained through a soft solution route led to their oxynitrides [In{sub 0.97}{open_square}{sub 0.03}][N{sub 0.92}O{sub 0.08}] at 660 {sup o}C and [Ga{sub 0.89}{open_square}{sub 0.11}][N{sub 0.66}O{sub 0.34}] at 850 {sup o}C, respectively, where {open_square} refers to a In or Ga vacancy. Cation vacancies in their wurtzite-type lattice were eliminated in similar preparations with the co-presence of Zn{sup 2+} by forming complete solid solutions of (InN){sub 1-x}(ZnO){sub x} and (GaN){sub 1-y}(ZnO){sub y}. The optical absorption edge shape was found to be relatively steep at the solid solution limits of x {approx} 0.23 and y {approx} 0.33 compared to the case without zinc.

  2. May 20, 2010 Growing gallium arsenide in thick multilayer stacks could make a big

    E-Print Network [OSTI]

    Rogers, John A.

    of photovoltaics and optoelectronic devices such as near-infrared (NIR) imagers looks set to become significantly material systems such as gallium nitride and indium phosphide (Nature 465 329). "We can generate compound of substrates, including glass and plastic. In photovoltaics, we expect the cost reductions to be significant

  3. High-performance amorphous gallium indium zinc oxide thin-film transistors through N{sub 2}O plasma passivation

    SciTech Connect (OSTI)

    Park, Jaechul; Kim, Sangwook; Kim, Changjung; Kim, Sunil; Song, Ihun; Yin, Huaxiang; Kim, Kyoung-Kok; Lee, Sunghoon; Hong, Kiha; Park, Youngsoo [Semiconductor Device Laboratory, Samsung Advanced Institute of Technology, Yongin-Si, Gyeonggi-Do 449-712 (Korea, Republic of); Lee, Jaecheol; Jung, Jaekwan; Lee, Eunha [Analytical Engineering Center, Samsung Advanced Institute of Technology, Yongin-Si, Gyeonggi-Do 449-712 (Korea, Republic of); Kwon, Kee-Won [Department of Semiconductor Systems Engineering, Sungkyunkwan University, Suwon-Si, Gyeonggi-Do 440-746 (Korea, Republic of)

    2008-08-04T23:59:59.000Z

    Amorphous-gallium-indium-zinc-oxide (a-GIZO) thin filmtransistors (TFTs) are fabricated without annealing, using processes and equipment for conventional a-Si:H TFTs. It has been very difficult to obtain sound TFT characteristics, because the a-GIZO active layer becomes conductive after dry etching the Mo source/drain electrode and depositing the a-SiO{sub 2} passivation layer. To prevent such damages, N{sub 2}O plasma is applied to the back surface of the a-GIZO channel layer before a-SiO{sub 2} deposition. N{sub 2}O plasma-treated a-GIZO TFTs exhibit excellent electrical properties: a field effect mobility of 37 cm{sup 2}/V s, a threshold voltage of 0.1 V, a subthreshold swing of 0.25 V/decade, and an I{sub on/off} ratio of 7.

  4. Optical waveguiding properties into porous gallium nitride structures investigated by prism coupling technique

    SciTech Connect (OSTI)

    Alshehri, Bandar; Dogheche, Elhadj, E-mail: elhadj.dogheche@univ-valenciennes.fr [Institute Electronics, Microelectronics and Nanotechnology (IEMN CNRS), University of Valenciennes, Villeneuve d'Ascq (France); Lee, Seung-Min; Kang, Jin-Ho; Ryu, Sang-Wan, E-mail: sangwan@chonnam.ac.kr [Department of Physics, Chonnam National University, Gwangju 500-757 (Korea, Republic of); Gong, Su-Hyun; Cho, Yong-Hoon [Department of Physics and KI for the NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701 (Korea, Republic of)

    2014-08-04T23:59:59.000Z

    In order to modulate the refractive index and the birefringence of Gallium Nitride (GaN), we have developed a chemical etching method to perform porous structures. The aim of this research is to demonstrate that optical properties of GaN can be tuned by controlling the pores density. GaN films are prepared on sapphire by metal organic chemical vapor deposition and the microstructure is characterized by transmission electron microscopy, and scanning electron microscope analysis. Optical waveguide experiment is demonstrated here to determine the key properties as the ordinary (n{sub 0}) and extraordinary (n{sub e}) refractive indices of etched structures. We report here the dispersion of refractive index for porous GaN and compare it to the bulk material. We observe that the refractive index decreases when the porous density p is increased: results obtained at 0.975??m have shown that the ordinary index n{sub 0} is 2.293 for a bulk layer and n{sub 0} is 2.285 for a pores density of 20%. This value corresponds to GaN layer with a pore size of 30?nm and inter-distance of 100?nm. The control of the refractive index into GaN is therefore fundamental for the design of active and passive optical devices.

  5. Real-time x-ray studies of gallium nitride nanodot formation by droplet heteroepitaxy

    SciTech Connect (OSTI)

    Wang Yiyi; Oezcan, Ahmet S.; Sanborn, Christopher; Ludwig, Karl F.; Bhattacharyya, Anirban; Chandrasekaran, Ramya; Moustakas, Theodore D.; Zhou Lin; Smith, David J. [Physics Department, Boston University, Boston, Massachusetts 02215 (United States); Department of Electrical and Computer Engineering, Boston University, Boston, Massachusetts 02215 (United States); Department of Physics, Arizona State University, Tempe, Arizona 85287, USA and School of Materials, Arizona State University, Tempe, Arizona 85287 (United States)

    2007-10-01T23:59:59.000Z

    Self-organized gallium nitride nanodots have been fabricated using droplet heteroepitaxy on c-plane sapphire by plasma-assisted molecular beam epitaxy at different substrate temperatures and Ga fluxes. Nanoscale Ga droplets were initially formed on the sapphire substrate at high temperatures by Ga deposition from an effusion cell in an ultrahigh vacuum growth chamber. Subsequently, the droplets were converted into GaN nanodots using a nitrogen plasma source. The process was monitored and controlled using real-time grazing-incidence small-angle x-ray scattering. The samples were examined postgrowth by in situ grazing incidence x-ray diffraction and reflection high-energy electron diffraction, which confirmed the epitaxial relationship between the GaN nanodots and the sapphire surface. X-ray diffraction indicated that the wurtzite phase was dominant at higher substrate temperature (710 deg. C), but a mixture of wurtzite and zinc blende phases was present at a substrate temperature of 620 deg. C. Ex situ atomic force microscopy and transmission electron microscopy analyses showed that the dot size distribution was bimodal. A thin GaN continuous layer of {approx} three monolayers thick was observed by transmission electron microscopy on the sample grown at a substrate temperature of 620 deg. C, but no such layer was observed for the substrate temperature of 710 deg. C. This suggests that there is little mobility of Ga atoms in contact with the sapphire substrate at the lower temperature so that they cannot easily diffuse to nearby droplets and instead form a thin layer covering the surface.

  6. Real-Time X-ray Studies of Gallium Nitride Nanodot Formation by Droplet Heteroepitaxy

    SciTech Connect (OSTI)

    Wang,Y.; Ozcan, A.; Sanborn, C.; Ludwig, K.; Bhattacharyya, A.; Chandrasekaran, R.; Moustakas, T.; Zhou, L.; Smith, D.

    2007-01-01T23:59:59.000Z

    Self-organized gallium nitride nanodots have been fabricated using droplet heteroepitaxy on c-plane sapphire by plasma-assisted molecular beam epitaxy at different substrate temperatures and Ga fluxes. Nanoscale Ga droplets were initially formed on the sapphire substrate at high temperatures by Ga deposition from an effusion cell in an ultrahigh vacuum growth chamber. Subsequently, the droplets were converted into GaN nanodots using a nitrogen plasma source. The process was monitored and controlled using real-time grazing-incidence small-angle x-ray scattering. The samples were examined postgrowth by in situ grazing incidence x-ray diffraction and reflection high-energy electron diffraction, which confirmed the epitaxial relationship between the GaN nanodots and the sapphire surface. X-ray diffraction indicated that the wurtzite phase was dominant at higher substrate temperature (710? C), but a mixture of wurtzite and zinc blende phases was present at a substrate temperature of 620? C. Ex situ atomic force microscopy and transmission electron microscopy analyses showed that the dot size distribution was bimodal. A thin GaN continuous layer of ? three monolayers thick was observed by transmission electron microscopy on the sample grown at a substrate temperature of 620? C, but no such layer was observed for the substrate temperature of 710? C. This suggests that there is little mobility of Ga atoms in contact with the sapphire substrate at the lower temperature so that they cannot easily diffuse to nearby droplets and instead form a thin layer covering the surface.

  7. Atomic layer structure of manganese atoms on wurtzite gallium nitride Abhijit Chinchore, Kangkang Wang, Wenzhi Lin, Jeongihm Pak, and Arthur R. Smitha

    E-Print Network [OSTI]

    Atomic layer structure of manganese atoms on wurtzite gallium nitride ,,0001¯... Abhijit Chinchore on wurtzite GaN 0001¯ . The surface is monitored using reflection high energy electron diffraction, which to grow with an abrupt interface and well- defined epitaxial orientation on top of wurtzite w -GaN. Re

  8. Electrical Bias as an Alternate Method for Reproducible Measurement of Copper Indium Gallium Diselenide (CIGS) Photovoltaic Modules: Preprint

    SciTech Connect (OSTI)

    Deline, C.; Stokes, A.; Silverman, T. J.; Rummel, S.; Jordan, D.; Kurtz, S.

    2012-08-01T23:59:59.000Z

    Light-to-dark metastable changes in thin-film photovoltaic (PV) modules can introduce uncertainty when measuring module performance on indoor flash testing equipment. This study describes a method to stabilize module performance through forward-bias current injection rather than light exposure. Measurements of five pairs of thin-film copper indium gallium diselenide (CIGS) PV modules indicate that forward-bias exposure maintained the PV modules at a stable condition (within 1%) while the unbiased modules degraded in performance by up to 12%. It was additionally found that modules exposed to forward bias exhibited stable performance within about 3% of their long-term outdoor exposed performance. This carrier-injection method provides a way to reduce uncertainty arising from fast transients in thin-film module performance between the time a module is removed from light exposure and when it is measured indoors, effectively simulating continuous light exposure by injecting minority carriers that behave much as photocarriers do. This investigation also provides insight into the initial light-induced transients of thin-film modules upon outdoor deployment.

  9. Saddle-like deformation in a dielectric elastomer actuator embedded with liquid-phase gallium-indium electrodes

    SciTech Connect (OSTI)

    Wissman, J., E-mail: jwissman@andrew.cmu.edu [Department of Mechanical Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States); Finkenauer, L. [Department of Mechanical Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States); Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States); Deseri, L. [DICAM, Department of Mechanical, Civil and Environmental Engineering, University of Trento, via Mesiano 77 38123 Trento (Italy); TMHRI-Department of Nanomedicine, The Methodist Hospital Research Institute, 6565 Fannin St., MS B-490 Houston, Texas 77030 (United States); Mechanics, Materials and Computing Center, CEE and ME-CIT, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States); Majidi, C. [Department of Mechanical Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States); Robotics Institute and Department of Civil and Environmental Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213 (United States)

    2014-10-14T23:59:59.000Z

    We introduce a dielectric elastomer actuator (DEA) composed of liquid-phase Gallium-Indium (GaIn) alloy electrodes embedded between layers of poly(dimethylsiloxane) (PDMS) and examine its mechanics using a specialized elastic shell theory. Residual stresses in the dielectric and sealing layers of PDMS cause the DEA to deform into a saddle-like geometry (Gaussian curvature K<0). Applying voltage ? to the liquid metal electrodes induces electrostatic pressure (Maxwell stress) on the dielectric and relieves some of the residual stress. This reduces the longitudinal bending curvature and corresponding angle of deflection ?. Treating the elastomer as an incompressible, isotropic, NeoHookean solid, we develop a theory based on the principle of minimum potential energy to predict the principal curvatures as a function of ?. Based on this theory, we predict a dependency of ? on ? that is in strong agreement with experimental measurements performed on a GaIn-PDMS composite. By accurately modeling electromechanical coupling in a soft-matter DEA, this theory can inform improvements in design and fabrication.

  10. Electron transport in the III-V nitride alloys

    SciTech Connect (OSTI)

    Foutz, B.E.; O'Leary, S.K.; Shur, M.S.; Eastman, L.F.

    1999-07-01T23:59:59.000Z

    The authors study electron transport in the alloys of aluminum nitride and gallium nitride and alloys of indium nitride and gallium nitride. In particular, employing Monte Carlo simulations they determine the velocity-field characteristics associated with these alloys for various alloy compositions. They also determine the dependence of the low-field mobility on the alloy composition. They find that while the low-field mobility is a strong function of the alloy composition, the peak and saturation drift velocities exhibit a more mild dependence. Transient electron transport is also considered. They find that the velocity overshoot characteristic is a strong function of the alloy composition. The device implications of these results are discussed.

  11. Compact, Interactive Electric Vehicle Charger: Gallium-Nitride Switch Technology for Bi-directional Battery-to-Grid Charger Applications

    SciTech Connect (OSTI)

    None

    2010-10-01T23:59:59.000Z

    ADEPT Project: HRL Laboratories is using gallium nitride (GaN) semiconductors to create battery chargers for electric vehicles (EVs) that are more compact and efficient than traditional EV chargers. Reducing the size and weight of the battery charger is important because it would help improve the overall performance of the EV. GaN semiconductors process electricity faster than the silicon semiconductors used in most conventional EV battery chargers. These high-speed semiconductors can be paired with lighter-weight electrical circuit components, which helps decrease the overall weight of the EV battery charger. HRL Laboratories is combining the performance advantages of GaN semiconductors with an innovative, interactive battery-to-grid energy distribution design. This design would support 2-way power flow, enabling EV battery chargers to not only draw energy from the power grid, but also store and feed energy back into it.

  12. Low-temperature growth of gallium nitride films by inductively coupled-plasma-enhanced reactive magnetron sputtering

    SciTech Connect (OSTI)

    Ni, Chih-Jui; Chau-Nan Hong, Franklin, E-mail: hong@mail.ncku.edu.tw [Department of Chemical Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan (China)

    2014-05-15T23:59:59.000Z

    Gallium nitride (GaN) films were grown on sapphire substrate by reactive magnetron sputtering. Inductively coupled-plasma (ICP) source was installed between the substrate holder and the sputtering target to increase the plasma density and the degree of ionization of nitrogen gas. Liquid Ga and Ar/N{sub 2} were used as the sputtering target and sputtering gases, respectively. X-ray diffraction measurements confirmed that the authors could grow high quality GaN crystallites at 500?°C. However, the crystalline GaN (0002) peak remained even by lowering the growth temperature down to 300?°C. The N:Ga ratio of the film grown at 500?°C was almost 1:1, and the nitrogen composition became higher toward the 1:1 N:Ga ratio with increasing the growth temperature. The high degree of ionization induced by ICP source was essential to the growth of high crystalline quality GaN films.

  13. Surface reconstructions of cubic gallium nitride ,,001... grown by radio frequency nitrogen plasma molecular beam epitaxy

    E-Print Network [OSTI]

    observed on c-GaN 001 , depending on the growth condi- tions and the substrate. For growth of c-GaN on Ga-rich-grown GaN 001 on MgO 001 substrate. We have deduced that these variant reconstructions are com- posed of Ga; published online 27 October 2006 Cubic GaN has been grown under gallium Ga -rich growth conditions using

  14. Preparation of gallium nitride surfaces for atomic layer deposition of aluminum oxide

    SciTech Connect (OSTI)

    Kerr, A. J. [Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093 (United States); Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093 (United States); Chagarov, E.; Kaufman-Osborn, T.; Kummel, A. C., E-mail: akummel@ucsd.edu [Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093 (United States); Gu, S.; Wu, J.; Asbeck, P. M. [Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093 (United States); Madisetti, S.; Oktyabrsky, S. [Department of Nanoscale Science and Engineering, University at Albany–State University of New York, Albany, New York 12222 (United States)

    2014-09-14T23:59:59.000Z

    A combined wet and dry cleaning process for GaN(0001) has been investigated with XPS and DFT-MD modeling to determine the molecular-level mechanisms for cleaning and the subsequent nucleation of gate oxide atomic layer deposition (ALD). In situ XPS studies show that for the wet sulfur treatment on GaN(0001), sulfur desorbs at room temperature in vacuum prior to gate oxide deposition. Angle resolved depth profiling XPS post-ALD deposition shows that the a-Al{sub 2}O{sub 3} gate oxide bonds directly to the GaN substrate leaving both the gallium surface atoms and the oxide interfacial atoms with XPS chemical shifts consistent with bulk-like charge. These results are in agreement with DFT calculations that predict the oxide/GaN(0001) interface will have bulk-like charges and a low density of band gap states. This passivation is consistent with the oxide restoring the surface gallium atoms to tetrahedral bonding by eliminating the gallium empty dangling bonds on bulk terminated GaN(0001)

  15. Alumina nanoparticle/polymer nanocomposite dielectric for flexible amorphous indium-gallium-zinc oxide thin film transistors on plastic substrate with superior stability

    SciTech Connect (OSTI)

    Lai, Hsin-Cheng [Department of Electrical Engineering, National Chung Hsing University, Taichung 40227, Taiwan (China); Pei, Zingway, E-mail: zingway@dragon.nchu.edu.tw [Department of Electrical Engineering, National Chung Hsing University, Taichung 40227, Taiwan (China); Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 40227, Taiwan (China); Center of Nanoscience and Nanotechnology, National Chung Hsing University, Taichung 40227, Taiwan (China); Jian, Jyun-Ruri; Tzeng, Bo-Jie [Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 40227, Taiwan (China)

    2014-07-21T23:59:59.000Z

    In this study, the Al{sub 2}O{sub 3} nanoparticles were incorporated into polymer as a nono-composite dielectric for used in a flexible amorphous Indium-Gallium-Zinc Oxide (a-IGZO) thin-film transistor (TFT) on a polyethylene naphthalate substrate by solution process. The process temperature was well below 100?°C. The a-IGZO TFT exhibit a mobility of 5.13?cm{sup 2}/V s on the flexible substrate. After bending at a radius of 4?mm (strain?=?1.56%) for more than 100 times, the performance of this a-IGZO TFT was nearly unchanged. In addition, the electrical characteristics are less altered after positive gate bias stress at 10?V for 1500?s. Thus, this technology is suitable for use in flexible displays.

  16. Electrical properties of TiN on gallium nitride grown using different deposition conditions and annealing

    SciTech Connect (OSTI)

    Li, Liuan; Kishi, Akinori; Shiraishi, Takayuki; Jiang, Ying; Wang, Qingpeng; Ao, Jin-Ping, E-mail: jpao@ee.tokushima-u.ac.jp [Institute of Technology and Science, The University of Tokushima, Tokushima 770-8506 (Japan)

    2014-03-15T23:59:59.000Z

    This study evaluates the thermal stability of different refractory metal nitrides used as Schottky electrodes on GaN. The results demonstrate that TiN, MoSiN, and MoN possess good rectification and adhesion strength, with barrier heights of 0.56, 0.54, and 0.36?eV, respectively. After thermal treatment at 850?°C for 1?min, the TiN and MoN electrodes still exhibit rectifying characteristics, while the MoSiN degrades to an ohmic-like contact. For further study, several TiN films are deposited using different N{sub 2}/Ar reactive/inert sputtering gas ratios, thereby varying the nitrogen content present in the sputtering gas. Ohmic-like contact is observed with the pure Ti contact film, and Schottky characteristics are observed with the samples possessing nitrogen in the film. The average Schottky barrier height is about 0.5?eV and remains virtually constant with varying nitrogen deposition content. After examining Raman spectra and x-ray photoelectron spectroscopy results, the increase in the film resistivity after thermal treatment is attributed to oxidation and/or nitridation. Films deposited with a medium (40% and 60%) nitrogen content show the best film quality and thermal stability.

  17. Electrical and Optical Properties of Transparent Conducting Homologous Compounds in the IndiumGalliumZinc Oxide System

    E-Print Network [OSTI]

    Poeppelmeier, Kenneth R.

    , smart windows, and solar cells. Tin-doped indium oxide (ITO) is the commercial TCO of choice. ITO thin TRANSPARENT conducting oxides (TCOs) are used in a wide variety of applications, such as flat-panel displays, and lower cost are desired for use in demanding ap- plications such as next-generation flat-panel displays

  18. Improvement of bias-stability in amorphous-indium-gallium-zinc-oxide thin-film transistors by using solution-processed Y{sub 2}O{sub 3} passivation

    SciTech Connect (OSTI)

    An, Sungjin; Mativenga, Mallory; Kim, Youngoo; Jang, Jin, E-mail: jjang@khu.ac.kr [Advanced Display Research Center, Department of Information Display, Kyung Hee University, Dongdaemun-gu, Seoul 130-701 (Korea, Republic of)

    2014-08-04T23:59:59.000Z

    We demonstrate back channel improvement of back-channel-etch amorphous-indium-gallium-zinc-oxide (a-IGZO) thin-film transistors by using solution-processed yttrium oxide (Y{sub 2}O{sub 3}) passivation. Two different solvents, which are acetonitrile (35%)?+?ethylene glycol (65%), solvent A and deionized water, solvent B are investigated for the spin-on process of the Y{sub 2}O{sub 3} passivation—performed after patterning source/drain (S/D) Mo electrodes by a conventional HNO{sub 3}-based wet-etch process. Both solvents yield devices with good performance but those passivated by using solvent B exhibit better light and bias stability. Presence of yttrium at the a-IGZO back interface, where it occupies metal vacancy sites, is confirmed by X-ray photoelectron spectroscopy. The passivation effect of yttrium is more significant when solvent A is used because of the existence of more metal vacancies, given that the alcohol (65% ethylene glycol) in solvent A may dissolve the metal oxide (a-IGZO) through the formation of alkoxides and water.

  19. Sandia National Laboratories: gallium nitride

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    and Systems Dept.) recently published the article "Band offsets of La2O3 on (0001) GaN grown by reactive molecular-beam epitaxy" in Applied Physics Letters outlining research...

  20. Growth of c-axis oriented gallium nitride thin films on an amorphous substrate by the liquid-target pulsed laser deposition technique

    E-Print Network [OSTI]

    Kwok, Hoi S.

    nitride GaN thin films with a wurtzite structure were grown on fused silica FS substrates by pulsed laser of the current directions in GaN research is to find other alter- native substrates that not only have good as a substrate for GaN film are its excellent optical transparency, low refractive index, and good mechanical

  1. Low-temperature synthesis of gallium nitride thin films using electron cyclotron resonance plasma assisted pulsed laser deposition from a GaAs target

    SciTech Connect (OSTI)

    Sun, J.; Wu, A.M.; Xu, N.; Ying, Z.F.; Shen, X.K.; Dong, Z.B.; Wu, J.D.; Shi, L.Q. [State Key Laboratory for Advanced Photonic Materials and Devices, Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Institute of Modern Physics, Fudan University, Shanghai 200433 (China)

    2005-11-15T23:59:59.000Z

    Using reactive pulsed laser deposition assisted by electron cyclotron resonance (ECR) plasma, we have synthesized GaN thin films from a polycrystalline GaAs target at low temperatures. This was achieved by ablating the GaAs target in the reactive environment of a nitrogen plasma generated from ECR microwave discharge in pure nitrogen gas and depositing the films with concurrent bombardment by the low-energy nitrogen plasma stream. High-energy ion backscattering spectroscopy analysis shows that the synthesized films are gallium rich. Characterizations by x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy confirm the presence of GaN bonds in the films. The recorded absorption spectrum also reveals GaN stretching mode characteristic of the hexagonal GaN phase. The synthesized GaN films are transparent in the visible region and have a band gap of 3.38 eV. Optical emission from the plume during film deposition reveals that the plume created by pulsed laser ablation of the GaAs target consists mainly of monoatomic atoms and ions of gallium and arsenic. Mechanisms responsible for the formation of GaN molecules and the growth of GaN films are also discussed.

  2. Copper Indium Gallium Diselenide | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page on Google Bookmark EERE: Alternative Fuels DataDepartment of Energy Your Density Isn't Your Destiny: Theof"Wave theJuly 30, 2013Department of Energy CoordinatingPhotovoltaics

  3. (Data in kilograms of gallium content, unless noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 1995. Two companies in

    E-Print Network [OSTI]

    : No domestic primary gallium recovery was reported in 1995. Two companies in Oklahoma and Utah recovered devices, which include light-emitting diodes (LED's), laser diodes, photodetectors, and solar cells contract to a consortium of private companies to develop gallium nitride technology. Blue LED's are useful

  4. EURODISPLAY 2002 631 P-64: A Comparative Study of Metal Oxide Coated Indium-tin Oxide Anodes

    E-Print Network [OSTI]

    EURODISPLAY 2002 631 P-64: A Comparative Study of Metal Oxide Coated Indium-tin Oxide Anodes and Technology Clear Water Bay, Kowloon, Hong Kong Abstract Indium-tin oxide anodes capped with certain oxides-emitting diodes (OLEDs). The oxides of tin, zinc, praseodymium, yttrium, gallium, terbium and titanium have been

  5. Electronic properties of gallium nitride nanowires

    E-Print Network [OSTI]

    Yoon, Joonah

    2008-01-01T23:59:59.000Z

    This thesis presents a systematic study of the electrical transport in GaN nanowires. Particularly, the effect of the surrounding dielectric on the conductivity of GaN nanowires is experimentally shown for the first time. ...

  6. Efficient wireless charging with gallium nitride FETs

    E-Print Network [OSTI]

    Yeh, Theresa (Theresa I.)

    2014-01-01T23:59:59.000Z

    Though wireless charging is more convenient than traditional wired charging methods, it is currently less efficient. This not only wastes power but can also result in a longer charging time. Improving the efficiency of ...

  7. Development of gallium nitride power transistors

    E-Print Network [OSTI]

    Piedra, Daniel, M. Eng. Massachusetts Institute of Technology

    2011-01-01T23:59:59.000Z

    GaN-based high-voltage transistors have outstanding properties for the development of ultra-high efficiency and compact power electronics. This thesis describes a new process technology for the fabrication of GaN power ...

  8. (Data in metric tons unless otherwise noted) Domestic Production and Use: Indium was not recovered from ores in the United States in 2007. Indium-containing

    E-Print Network [OSTI]

    were exported to Canada for processing. Two companies, one in New York and the other in Rhode Island gallium diselenide (CIGS) solar cells require approximately 50 metric tons of indium to produce 1 gigawatt of solar power. Research was underway to develop a low-cost manufacturing process for flexible CIGS solar

  9. Mechanical Behavior of Indium Nanostructures

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Indium Under the Nanoscope In this work, Lee et al. investigated the small-scale plastic deformation of indium nanopillars, a previously unstudied material and crystal...

  10. Group III-nitride thin films grown using MBE and bismuth

    DOE Patents [OSTI]

    Kisielowski, Christian K. (Peidmont, CA); Rubin, Michael (Berkeley, CA)

    2000-01-01T23:59:59.000Z

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  11. Group III-nitride thin films grown using MBE and bismuth

    DOE Patents [OSTI]

    Kisielowski, Christian K. (Piedmont, CA); Rubin, Michael (Berkeley, CA)

    2002-01-01T23:59:59.000Z

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  12. Sputtered Molybdenum Bilayer Back Contact for Copper Indium Diselenide-Based Polycrystalline Thin-Film Solar Cells

    E-Print Network [OSTI]

    Scofield, John H.

    of the CIS or CIGS solar cell structure (not to scale). In these investigations, however, the metal layers-Film Solar Cells John H. Scofield1, A. Duda, and D. Albin National Renewable Energy Laboratory, 1617 Cole-of-the-art polycrystalline copper indium gallium diselenide solar cells with good results. Thin Solid Films, 260 (1), pp. 26

  13. Hafnium nitride buffer layers for growth of GaN on silicon

    DOE Patents [OSTI]

    Armitage, Robert D.; Weber, Eicke R.

    2005-08-16T23:59:59.000Z

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 {character pullout}m. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  14. Nitrided Metallic Bipolar Plates

    Broader source: Energy.gov (indexed) [DOE]

    nitrided surface treatment. In this approach, an electrically-conductive and corrosion-resistant chromium-nitride surface layer is formed on the bipolar plate component by...

  15. Preparing titanium nitride powder

    DOE Patents [OSTI]

    Bamberger, Carlos E. (Oak Ridge, TN)

    1989-01-01T23:59:59.000Z

    A process for making titanium nitride powder by reaction of titanium phosphates with sodium cyanide.

  16. Electronic Transport Characteristics of Gallium Nitride Nanowire-based Nanocircuits

    E-Print Network [OSTI]

    Ayres, Virginia

    . The measurements indicate a working field effect transistor utilizing a global back gate configuration. Very high and drain contacts were patterned using electron beam lithography, with Ti/Au used for the conducting source and drain material. The backside of the wafer was stripped of silicon dioxide using hydrofluoric acid and Ti

  17. Neutron irradiation effects on metal-gallium nitride contacts

    SciTech Connect (OSTI)

    Katz, Evan J.; Lin, Chung-Han; Zhang, Zhichun [Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Qiu, Jie; Cao, Lei [Nuclear Engineering Program, Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Mishra, Umesh K. [Departments of Electrical and Computer Engineering and Materials Science and Engineering University of California, Santa Barbara, California 93106 (United States); Brillson, Leonard J., E-mail: brillson.1@osu.edu [Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Department of Physics and Center for Materials Research, The Ohio State University, Columbus, Ohio 43210 (United States)

    2014-03-28T23:59:59.000Z

    We have measured the effect of fast and thermal neutrons on GaN Schottky barriers and ohmic contacts using current–voltage and transmission line method electrical techniques, optical, atomic force and scanning electron microscopy morphological techniques, and X-ray photoemission spectroscopy chemical techniques. These studies reveal a 10{sup 15}?n/cm{sup 2} neutron threshold for Schottky barrier ideality factor increases, a 10{sup 15}?n/cm{sup 2} fast plus thermal neutron threshold for ohmic contact sheet and contact resistance increases, and 10{sup 16}?n/cm{sup 2} neutron fluence threshold for major device degradation identified with thermally driven diffusion of Ga and N into the metal contacts and surface phase changes. These results demonstrate the need for protecting metal-GaN contacts in device applications subject to neutron radiation.

  18. Neutron irradiation effects on gallium nitride-based Schottky diodes

    SciTech Connect (OSTI)

    Lin, Chung-Han; Katz, Evan J.; Zhang, Zhichun [Department of Electrical and Computer Engineering, The Ohio State University, Columbus Ohio 43210 (United States)] [Department of Electrical and Computer Engineering, The Ohio State University, Columbus Ohio 43210 (United States); Qiu, Jie; Cao, Lei [Nuclear Engineering Program, Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, Ohio 43210 (United States)] [Nuclear Engineering Program, Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Mishra, Umesh K. [Departments of Electrical and Computer Engineering and Materials Science and Engineering, University of California, Santa Barbara, California 93106 (United States)] [Departments of Electrical and Computer Engineering and Materials Science and Engineering, University of California, Santa Barbara, California 93106 (United States); Brillson, Leonard J. [Department of Electrical and Computer Engineering, The Ohio State University, Columbus Ohio 43210 (United States) [Department of Electrical and Computer Engineering, The Ohio State University, Columbus Ohio 43210 (United States); Department of Physics and Center for Materials Research, The Ohio State University, Columbus, Ohio 43210 (United States)

    2013-10-14T23:59:59.000Z

    Depth-resolved cathodoluminescence spectroscopy (DRCLS), time-resolved surface photovoltage spectroscopy, X-ray photoemission spectroscopy (XPS), and current-voltage measurements together show that fast versus thermal neutrons differ strongly in their electronic and morphological effects on metal-GaN Schottky diodes. Fast and thermal neutrons introduce GaN displacement damage and native point defects, while thermal neutrons also drive metallurgical reactions at metal/GaN interfaces. Defect densities exhibit a threshold neutron fluence below which thermal neutrons preferentially heal versus create new native point defects. Scanning XPS and DRCLS reveal strong fluence- and metal-dependent electronic and chemical changes near the free surface and metal interfaces that impact diode properties.

  19. Strongly localized excitons in gallium nitride C. Wetzel,a)

    E-Print Network [OSTI]

    Wetzel, Christian M.

    report on strong excitonic luminescence in wurtzite GaN at 3.309 and 3.365 eV T 6 K . These lines lie and characterization of excitonic luminescence transitions in wurtzite GaN about 150 meV below the fundamental elec transitions at 3.309 and 3.365 eV. Wurtzite GaN epilayers were grown by a high tempera- ture vapor phase

  20. Gallium Nitride Integrated Gas/Temperature Sensors for

    E-Print Network [OSTI]

    precision and accuracy · Field test for reliability and lifetime · 1) Sensor Needs and Requirements://www.ott.doe.gov/pdfs/sensor_needs.pdf #12;4 Approach GaN based devices and circuits are an attractive option for high temperature electronic) and hydrogen (30-70%) 80% Complete 2- Determine confounding effects due to multiple components 80% Complete 3

  1. High Quality, Low Cost Bulk Gallium Nitride Substrates Grown...

    Energy Savers [EERE]

    silicon Widespread adoption of efficient load architectures enabled by GaN-based power electronics and lighting can lead to a 25% reduction in world energy consumption ...

  2. Formation mechanisms of spatially-directed zincblende gallium nitride nanocrystals

    SciTech Connect (OSTI)

    Wood, A. W. [Department of Physics, University of Michigan, Ann Arbor, Michigan 48109 (United States); Collino, R. R. [Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Cardozo, B. L. [Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Naab, F. [Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109 (United States); Wang, Y. Q. [Materials Science and Technology Division, Los Alamos National Lab, Los Alamos, New Mexico 87545 (United States); Goldman, R. S. [Department of Physics, University of Michigan, Ann Arbor, Michigan 48109 (United States); Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States)

    2011-12-15T23:59:59.000Z

    We report on the spatially selective formation of GaN nanocrystals embedded in GaAs. Broad-area N{sup +} implantation followed by rapid thermal annealing leads to the formation of nanocrystals at the depth of maximum ion damage. With additional irradiation using a Ga{sup +} focused ion beam, selective lateral positioning of the nanocrystals within the GaAs matrix is observed in isolated regions of increased vacancy concentration. Following rapid thermal annealing, the formation of zincblende GaN is observed in the regions of highest vacancy concentration. The nucleation of zincblende nanocrystals over the wurtzite phase of bulk GaN is consistent with the predictions of a thermodynamic model for the nanoscale size-dependence of GaN nucleation.

  3. Growth and structure of sputtered gallium nitride films

    SciTech Connect (OSTI)

    Yadav, Brajesh S.; Major, S. S.; Srinivasa, R. S. [Department of Physics, Indian Institute of Technology Bombay, Mumbai 400076 (India); Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology Bombay, Mumbai 400076 (India)

    2007-10-01T23:59:59.000Z

    GaN films have been deposited by radio frequency sputtering of a GaAs target with pure nitrogen. The growth, composition, and structure of the films deposited on quartz substrates have been studied by x-ray diffraction, transmission electron microscopy, and Raman spectroscopy. Films deposited below 300 deg. C are amorphous and As rich. Above 300 deg. C, polycrystalline, hexagonal GaN is formed, along with As rich amorphous phase, which reduces with increasing substrate temperature. At a substrate temperature of 700 deg. C, GaN films, practically free of amorphous phase, and As (<0.5 at. %) are formed. The preferred orientation depends strongly on the substrate temperature and is controlled by surface diffusion of adatoms during growth stage. Below 500 deg. C, the surface diffusion between planes dominates and results in the (1011) preferred orientation. Above 500 deg. C, the surface diffusion between grains takes over and results in (0002) preferred orientation.

  4. Electrochemical Solution Growth: Gallium Nitride Crystal Growth - Energy

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645U.S. DOEThe Bonneville Power AdministrationField Campaign:INEAWater Use

  5. Light-Emitting Diodes on Semipolar Bulk Gallium Nitride Substrate |

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page on Google Bookmark EERE: Alternative Fuels Data Center Home Page onYouTube YouTube Note: Since the.pdfBreaking ofOil & Gas »ofMarketing | Department ofEnergy Nuclear

  6. High-Quality, Low-Cost Bulk Gallium Nitride Substrates

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page on Google Bookmark EERE: Alternative Fuels DataDepartment of Energy Your Density Isn't YourTransport(Fact Sheet), GeothermalGridHYDROGEND D e e p p a a r rRancho Cordoba,High-Quality,

  7. Nitride fuel performance 

    E-Print Network [OSTI]

    Reynaud, Sylvie Marie Aurel?ie

    2002-01-01T23:59:59.000Z

    The purpose of this work was to assess the potential of nitride fuels in the current context of the nuclear industry. Nitride fuels systems have indeed been for the past decade the subject of new interest from the international community...

  8. Gallium Safety in the Laboratory

    SciTech Connect (OSTI)

    Cadwallader, L.C.

    2003-05-07T23:59:59.000Z

    A university laboratory experiment for the US Department of Energy magnetic fusion research program required a simulant for liquid lithium. The simulant choices were narrowed to liquid gallium and galinstan (Ga-In-Sn) alloy. Safety information on liquid gallium and galinstan were compiled, and the choice was made to use galinstan. A laboratory safety walkthrough was performed in the fall of 2002 to support the galinstan experiment. The experiment has been operating successfully since early 2002.

  9. Gallium interactions with Zircaloy

    E-Print Network [OSTI]

    West, Michael Keith

    1998-01-01T23:59:59.000Z

    -nitride insulated cylinder wrapped with a tantalum oven wire and provides for evaporation of solid source materials. For an appropriate combination of gas pressure, filament current, and anode voltage, a plasma is formed in the hollow cathode region of the source... of the goniometer motor above 100 'C. In addition, braided copper straps were wrapped around the goniometer motors and connected to the cold plates in the target chamber. Zirc-4 Target Heater Wire Current = 2. 5 A To Current Integrator Inner Cup Bias = -200...

  10. CX-010895: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Development and Industrialization of Indium Gallium Nitride/Gallium Nitride (InGaN/GaN) Light Emitting Diodes LEDs on Patterned Sapphire Substrate (PSS) for Low Cost Emitter Architecture CX(s) Applied: B3.6 Date: 06/27/2013 Location(s): California Offices(s): National Energy Technology Laboratory

  11. Anomalous nonlinear photoresponse in a InGaNGaN heterostructure J. Zeller,* W. Rudolph, and M. Sheik-Bahae

    E-Print Network [OSTI]

    Sheik-Bahae, Mansoor

    deposition on a c-plane sapphire substrate. A 20 nm thick low-temperature grown GaN buffer layer between the sapphire substrate and the n-GaN layer as well as linear photoconductivity in a Gallium nitride/ Indium-Gallium nitride GaN/InGaN heterostructure

  12. Potential effects of gallium on cladding materials

    SciTech Connect (OSTI)

    Wilson, D.F.; Beahm, E.C.; Besmann, T.M.; DeVan, J.H.; DiStefano, J.R.; Gat, U.; Greene, S.R.; Rittenhouse, P.L.; Worley, B.A.

    1997-10-01T23:59:59.000Z

    This paper identifies and examines issues concerning the incorporation of gallium in weapons derived plutonium in light water reactor (LWR) MOX fuels. Particular attention is given to the more likely effects of the gallium on the behavior of the cladding material. The chemistry of weapons grade (WG) MOX, including possible consequences of gallium within plutonium agglomerates, was assessed. Based on the calculated oxidation potentials of MOX fuel, the effect that gallium may have on reactions involving fission products and possible impact on cladding performance were postulated. Gallium transport mechanisms are discussed. With an understanding of oxidation potentials and assumptions of mechanisms for gallium transport, possible effects of gallium on corrosion of cladding were evaluated. Potential and unresolved issues and suggested research and development (R and D) required to provide missing information are presented.

  13. Veeco

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    to design indium gallium nitride (InGaN) MOCVD growth systems. The actual experimental GaN non-uniformity is about four times greater than predicted because the model does not...

  14. Superconducting structure with layers of niobium nitride and aluminum nitride

    DOE Patents [OSTI]

    Murduck, James M. (Lisle, IL); Lepetre, Yves J. (Lauris, FR); Schuller, Ivan K. (Woodridge, IL); Ketterson, John B. (Evanston, IL)

    1989-01-01T23:59:59.000Z

    A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources.

  15. Superconducting structure with layers of niobium nitride and aluminum nitride

    DOE Patents [OSTI]

    Murduck, J.M.; Lepetre, Y.J.; Schuller, I.K.; Ketterson, J.B.

    1989-07-04T23:59:59.000Z

    A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources. 8 figs.

  16. INDIUM--1997 37.1 By Robert D. Brown, Jr.

    E-Print Network [OSTI]

    INDIUM--1997 37.1 INDIUM By Robert D. Brown, Jr. There was no known production of indium at domestic mines, and none was recovered from ores in the United States in 1997. Domestic indium production and Rhode Island, were the major producers of indium metal and indium products in 1997. Several smaller

  17. Synthesis and characterization of visible emission from rare-earth doped aluminum nitride, gallium nitride and gallium aluminum nitride powders and thin films

    E-Print Network [OSTI]

    Tao, Jonathan Huai-Tse

    2010-01-01T23:59:59.000Z

    Converted White-Light-Emitting Diodes," Jap. J. Appl.doped III-N Light-Emitting Diodes," Appl. Phys. Lett. , 84 (in Packaging High Power Light Emitting Diode Arrays," Appl.

  18. Synthesis and characterization of visible emission from rare-earth doped aluminum nitride, gallium nitride and gallium aluminum nitride powders and thin films

    E-Print Network [OSTI]

    Tao, Jonathan Huai-Tse

    2010-01-01T23:59:59.000Z

    High-Color-Rendering LED Lamps Using Oxyfluoride andHigh-pressure mercury lamp LED Luxeon white 5 W LED Cree LRpressure mercury lamps; some Cree LEDs have even comparable

  19. Synthesis and characterization of visible emission from rare-earth doped aluminum nitride, gallium nitride and gallium aluminum nitride powders and thin films

    E-Print Network [OSTI]

    Tao, Jonathan Huai-Tse

    2010-01-01T23:59:59.000Z

    from GaN:Tb 3+ Powders and Thin Films Deposited by MOVPE andHirata, "Eu 3+ Activated GaN Thin Films Grown on Sapphire byTb 3+ in GaN Powders and Thin Films," ECS Trans. , J. Laski,

  20. Synthesis and characterization of visible emission from rare-earth doped aluminum nitride, gallium nitride and gallium aluminum nitride powders and thin films

    E-Print Network [OSTI]

    Tao, Jonathan Huai-Tse

    2010-01-01T23:59:59.000Z

    Growth of Single Crystal GaN Substrate using Hydride VaporZnO Nanowire on a p-GaN Substrate," J. Phys. Chem. C , 114Grown on GaN Nanocrystalline Powder Substrate," J. Cryst.

  1. Local environment and composition of magnesium gallium layered...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    environment and composition of magnesium gallium layered double hydroxides determined from solid-state 1H and 71Ga NMR Local environment and composition of magnesium gallium...

  2. Gallium-67 complexes as radioactive markers to assess gastric and colonic transit

    SciTech Connect (OSTI)

    Bellen, J.C.; Chatterton, B.E.; Penglis, S.; Tsopelas, C. [Royal Adelaide Hospital (Australia)

    1995-03-01T23:59:59.000Z

    Constipation and gastroparesis are gastrointestinal tract disorders that can be assessed by using radioactive markers in conjunction with scintigraphic techniques. Indium-111-DTPA is the radiopharmaceutical of choice for treating colonic transit in constipated patients, but it is an expensive product and its availability has been unreliable. Indium-113m-DTPA was the tracer used in our study to determine the liquid gastric emptying rate in dual-isotope solid-liquid emptying studies, however, cessation of the {sup 113}Sn/{sup 113m}In generator production makes it unavailable. Thus, development of alternative tracers to {sup 111}In-DTPA and {sup 113m}In-DTPA was essential. Gallium-67-citrate and {sup 67}Ga-EDTA were compared to {sup 111}In-DTPA to assess their efficacy for exclusive retention in the GI tract. These markers were orally administered into rats and their three-day cumulative fecal excretion, urine excretion and carcass retention were measured. An in vitro gastric emptying model was used to determine liquid phase partitioning of {sup 113m}In-DTPA, {sup 67}Ga-citrate and {sup 67}Ga-EDTA at 37{degrees}. Gallium-67-citrate was predominantly excreted in the feces (97.2% {+-} 0.2%) after three days, with negligible urine excretion (0.1% {+-} 0.0%) and carcass retention (0.6% {+-} 0.2%). These results are analogous to those obtained for {sup 111}In-DTPA for fecal excretion (96.7% {+-} 2.6%), urine excretion (0.6% {+-} 0.0%) and retention in the carcass (0.2% {+-} 0.0%). Gallium-67-EDTA showed similar partitioning in the liquid phase of the gastric emptying model compared with {sup 113m}In-DTPA. Gallium-67-citrate is an economical and readily available alternative to {sup 111}In-DTPA as a colonic transit radiopharmaceutical. Gallium-67-EDTA is also an alternative to {sup 113m}In-DTPA for assessing liquid-phase emptying in a dual-isotope solid/liquid gastric emptying study. 17 refs., 3 figs., 2 tabs.

  3. Amber light-emitting diode comprising a group III-nitride nanowire active region

    DOE Patents [OSTI]

    Wang, George T.; Li, Qiming; Wierer, Jr., Jonathan J.; Koleske, Daniel

    2014-07-22T23:59:59.000Z

    A temperature stable (color and efficiency) III-nitride based amber (585 nm) light-emitting diode is based on a novel hybrid nanowire-planar structure. The arrays of GaN nanowires enable radial InGaN/GaN quantum well LED structures with high indium content and high material quality. The high efficiency and temperature stable direct yellow and red phosphor-free emitters enable high efficiency white LEDs based on the RGYB color-mixing approach.

  4. Boron nitride nanotubes

    DOE Patents [OSTI]

    Smith, Michael W. (Newport News, VA); Jordan, Kevin (Newport News, VA); Park, Cheol (Yorktown, VA)

    2012-06-06T23:59:59.000Z

    Boron nitride nanotubes are prepared by a process which includes: (a) creating a source of boron vapor; (b) mixing the boron vapor with nitrogen gas so that a mixture of boron vapor and nitrogen gas is present at a nucleation site, which is a surface, the nitrogen gas being provided at a pressure elevated above atmospheric, e.g., from greater than about 2 atmospheres up to about 250 atmospheres; and (c) harvesting boron nitride nanotubes, which are formed at the nucleation site.

  5. Micropatterning of Proteins and Mammalian Cells on Indium Tin Oxide

    E-Print Network [OSTI]

    Revzin, Alexander

    Micropatterning of Proteins and Mammalian Cells on Indium Tin Oxide Sunny S. Shah, Michael C and electrochemical activation to create micropatterned cocultures on indium tin oxide (ITO) substrates applications in tissue engineering and biosensing. KEYWORDS: indium tin oxide · photolithography · switchable

  6. Nitrided Metallic Bipolar Plates

    SciTech Connect (OSTI)

    Brady, Michael P [ORNL; Tortorelli, Peter F [ORNL; Pihl, Josh A [ORNL; Toops, Todd J [ORNL; More, Karren Leslie [ORNL; Meyer III, Harry M [ORNL; Vitek, John Michael [ORNL; Wang, Heli [National Renewable Energy Laboratory (NREL); Turner, John [National Renewable Energy Laboratory (NREL); Wilson, Mahlon [Los Alamos National Laboratory (LANL); Garzon, Fernando [Los Alamos National Laboratory (LANL); Rockward, Tommy [Los Alamos National Laboratory (LANL); Connors, Dan [GenCell Corp; Rakowski, Jim [Allegheny Ludlum; Gervasio, Don [Arizona State University

    2008-01-01T23:59:59.000Z

    The objectives are: (1) Develop and optimize stainless steel alloys amenable to formation of a protective Cr-nitride surface by gas nitridation, at a sufficiently low cost to meet DOE targets and with sufficient ductility to permit manufacture by stamping. (2) Demonstrate capability of nitridation to yield high-quality stainless steel bipolar plates from thin stamped alloy foils (no significant stamped foil warping or embrittlement). (3) Demonstrate single-cell fuel cell performance of stamped and nitrided alloy foils equivalent to that of machined graphite plates of the same flow-field design ({approx}750-1,000 h, cyclic conditions, to include quantification of metal ion contamination of the membrane electrode assembly [MEA] and contact resistance increase attributable to the bipolar plates). (4) Demonstrate potential for adoption in automotive fuel cell stacks. Thin stamped metallic bipolar plates offer the potential for (1) significantly lower cost than currently-used machined graphite bipolar plates, (2) reduced weight/volume, and (3) better performance and amenability to high volume manufacture than developmental polymer/carbon fiber and graphite composite bipolar plates. However, most metals exhibit inadequate corrosion resistance in proton exchange membrane fuel cell (PEMFC) environments. This behavior leads to high electrical resistance due to the formation of surface oxides and/or contamination of the MEA by metallic ions, both of which can significantly degrade fuel cell performance. Metal nitrides offer electrical conductivities up to an order of magnitude greater than that of graphite and are highly corrosion resistant. Unfortunately, most conventional coating methods (for metal nitrides) are too expensive for PEMFC stack commercialization or tend to leave pinhole defects, which result in accelerated local corrosion and unacceptable performance.

  7. Cubic nitride templates

    DOE Patents [OSTI]

    Burrell, Anthony K; McCleskey, Thomas Mark; Jia, Quanxi; Mueller, Alexander H; Luo, Hongmei

    2013-04-30T23:59:59.000Z

    A polymer-assisted deposition process for deposition of epitaxial cubic metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be used as templates for the development of high quality cubic GaN based electronic devices.

  8. Viscoelastic DampingViscoelastic Damping Characteristics of Indium-Tin/Characteristics of Indium-Tin/SiCSiC

    E-Print Network [OSTI]

    Swan Jr., Colby Corson

    1 Viscoelastic DampingViscoelastic Damping Characteristics of Indium-Tin/Characteristics of Indium-Tin Approach: · Based on past experience, indium-tin has well- characterized stiffness/damping. · Fabricate

  9. On the solar abundance of indium

    E-Print Network [OSTI]

    N. Vitas; I. Vince; M. Lugaro; O. Andriyenko; M. Gosic; R. J. Rutten

    2007-11-14T23:59:59.000Z

    The generally adopted value for the solar abundance of indium is over six times higher than the meteoritic value. We address this discrepancy through numerical synthesis of the 451.13 nm line on which all indium abundance studies are based, both for the quiet-sun and the sunspot umbra spectrum, employing standard atmosphere models and accounting for hyperfine structure and Zeeman splitting in detail. The results, as well as a re-appraisal of indium nucleosynthesis, suggest that the solar indium abundance is close to the meteoritic value, and that some unidentified ion line causes the 451.13 nm feature in the quiet-sun spectrum.

  10. Sandia National Laboratories: indium tin oxide

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    indium tin oxide Sandian Selected for Outstanding Engineer Award On December 10, 2014, in Energy, Materials Science, News, News & Events, Photovoltaic, Renewable Energy, Research &...

  11. Highly efficient blue organic light emitting devices with indium...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    efficient blue organic light emitting devices with indium-free transparent anode on flexible substrates. Highly efficient blue organic light emitting devices with indium-free...

  12. Vacancies Ordered in Screw Form (VOSF) and Layered Indium Selenide...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Ordered in Screw Form (VOSF) and Layered Indium Selenide Thin Film Deposition by Laser Back Ablation. Vacancies Ordered in Screw Form (VOSF) and Layered Indium Selenide Thin Film...

  13. Recovery of gallium from aluminum industry residues

    SciTech Connect (OSTI)

    Carvalho, M.S.; Neto, K.C.M.; Nobrega, A.W.; Medeiros, J.A.

    2000-01-01T23:59:59.000Z

    A procedure is proposed to recover gallium from flue dust aluminum residues produced in plants by using solid-phase extraction with a commercial polyether-type polyurethane foam (PUF). Gallium can be separated from high concentrations of aluminum, iron, nickel, titanium, vanadium, copper, zinc, sulfate, fluoride, and chloride by extraction with PUF from 3 M sulfuric acid and 3 M sodium chloride concentration medium with at least a 92% efficiency. Gallium backextraction was fast and quantitative with ethanol solution. In all recovery steps commercial-grade reagents could be used, including tap water. The recovered gallium was precipitated with sodium hydroxide solution, purified by dissolution and precipitation, calcinated, and the final oxide was 98.6% pure.

  14. (Data in kilograms of gallium content unless otherwise noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 2009. One company in Utah

    E-Print Network [OSTI]

    58 GALLIUM (Data in kilograms of gallium content unless otherwise noted) Domestic Production 98% of domestic gallium consumption. About 67% of the gallium consumed was used in integrated and Use: No domestic primary gallium recovery was reported in 2009. One company in Utah recovered

  15. High-Efficiency Nitride-Based Photonic Crystal Light Sources

    Broader source: Energy.gov [DOE]

    The University of California Santa Barbara (UCSB) is maximizing the efficiency of a white LED by enhancing the external quantum efficiency using photonic crystals to extract light that would normally be confined in a conventional structure. Ultimate efficiency can only be achieved by looking at the internal structure of light. To do this, UCSB is focusing on maximizing the light extraction efficiency and total light output from light engines driven by Gallium Nitride (GaN)-based LEDs. The challenge is to engineer large overlap (interaction) between modes and photonic crystals. The project is focused on achieving high extraction efficiency in LEDs, controlled directionality of emitted light, integrated design of vertical device structure, and nanoscale patterning of lateral structure.

  16. Mechanical Behavior of Indium Nanostructures

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645U.S. DOEThe Bonneville PowerCherries 82981-1cnHighand Retrievals from a NewCuneo Matthew1,Mechanical Behavior of Indium

  17. amorphous indium-gallium-zinc oxide: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summary: alloy of composition correspond- ing to the metallic components of the superconduct- ing oxides respectivement. Abstract. - Previous quenching experiments on 2212...

  18. Superplastic forging nitride ceramics

    DOE Patents [OSTI]

    Panda, Prakash C. (Ithaca, NY); Seydel, Edgar R. (Ithaca, NY); Raj, Rishi (Ithaca, NY)

    1988-03-22T23:59:59.000Z

    The invention relates to producing relatively flaw free silicon nitride ceramic shapes requiring little or no machining by superplastic forging This invention herein was made in part under Department of Energy Grant DE-AC01-84ER80167, creating certain rights in the United States Government. The invention was also made in part under New York State Science and Technology Grant SB1R 1985-10.

  19. Silicon nitride ceramic comprising samaria and ytterbia

    DOE Patents [OSTI]

    Yeckley, Russell L. (Oakham, MA)

    1996-01-01T23:59:59.000Z

    This invention relates to a sintered silicon nitride ceramic comprising samaria and ytterbia for enhanced toughness.

  20. Functionalized boron nitride nanotubes

    DOE Patents [OSTI]

    Sainsbury, Toby; Ikuno, Takashi; Zettl, Alexander K

    2014-04-22T23:59:59.000Z

    A plasma treatment has been used to modify the surface of BNNTs. In one example, the surface of the BNNT has been modified using ammonia plasma to include amine functional groups. Amine functionalization allows BNNTs to be soluble in chloroform, which had not been possible previously. Further functionalization of amine-functionalized BNNTs with thiol-terminated organic molecules has also been demonstrated. Gold nanoparticles have been self-assembled at the surface of both amine- and thiol-functionalized boron nitride Nanotubes (BNNTs) in solution. This approach constitutes a basis for the preparation of highly functionalized BNNTs and for their utilization as nanoscale templates for assembly and integration with other nanoscale materials.

  1. Pulmonary gallium-67 uptake in amiodarone pneumonitis

    SciTech Connect (OSTI)

    van Rooij, W.J.; van der Meer, S.C.; van Royen, E.A.; van Zandwijk, N.; Darmanata, J.I.

    1984-02-01T23:59:59.000Z

    Three patients are presented suffering from interstitial pneumonitis caused by amiodarone. Pulmonary Ga-67 uptake occurred in all three. There appeared to be a discrepancy between the scintigraphic and radiographic findings in two patients. Gallium-67 lung scintigraphy may offer an early, sensitive indicator for amiodarone pneumonitis.

  2. (Data in kilograms of gallium content unless otherwise noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 2005. One company in Utah

    E-Print Network [OSTI]

    66 GALLIUM (Data in kilograms of gallium content unless otherwise noted) Domestic Production, [(703) 648-7719, dkramer@usgs.gov, fax: (703) 648-7975] #12;67 GALLIUM Consolidation of companies and Use: No domestic primary gallium recovery was reported in 2005. One company in Utah recovered

  3. (Data in kilograms of gallium content, unless otherwise noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 1998. Two companies in

    E-Print Network [OSTI]

    66 GALLIUM (Data in kilograms of gallium content, unless otherwise noted) Domestic Production A. Kramer [(703) 648-7719, dkramer@usgs.gov, fax: (703) 648-7722] #12;67 GALLIUM Events, Trends and Use: No domestic primary gallium recovery was reported in 1998. Two companies in Oklahoma and Utah

  4. Indium oxide/n-silicon heterojunction solar cells

    DOE Patents [OSTI]

    Feng, Tom (Morris Plains, NJ); Ghosh, Amal K. (New Providence, NJ)

    1982-12-28T23:59:59.000Z

    A high photo-conversion efficiency indium oxide/n-silicon heterojunction solar cell is spray deposited from a solution containing indium trichloride. The solar cell exhibits an Air Mass One solar conversion efficiency in excess of about 10%.

  5. Interactions of zircaloy cladding with gallium -- 1997 status

    SciTech Connect (OSTI)

    Wilson, D.F.; DiStefano, J.R.; King, J.F.; Manneschmidt, E.T.; Strizak, J.P.

    1997-11-01T23:59:59.000Z

    A four phase program has been implemented to evaluate the effect of gallium in mixed oxide (MOX) fuel derived from weapons grade (WG) plutonium on Zircaloy cladding performance. The objective is to demonstrate that low levels of gallium will not compromise the performance of the MOX fuel system in LWR. This graded, four phase experimental program will evaluate the performance of prototypic Zircaloy cladding materials against: (1) liquid gallium (Phase 1), (2) various concentrations of Ga{sub 2}O{sub 3} (Phase 2), (3) centrally heated surrogate fuel pellets with expected levels of gallium (Phase 3), and (4) centrally heated prototypic MOX fuel pellets (Phase 4). This status report describes the results of an initial series of tests for phases 1 and 2. Three types of tests are being performed: (1) corrosion, (2) liquid metal embrittlement (LME), and (3) corrosion mechanical. These tests are designed to determine the corrosion mechanisms, thresholds for temperature and concentration of gallium that may delineate behavioral regimes, and changes in mechanical properties of Zircaloy. Initial results have generally been favorable for the use of WG-MOX fuel. The MOX fuel cladding, Zircaloy, does react with gallium to form intermetallic compounds at {ge} 300 C; however, this reaction is limited by the mass of gallium and is therefore not expected to be significant with a low level (in parts per million) of gallium in the MOX fuel. While continued migration of gallium into the initially formed intermetallic compound results in large stresses that can lead to distortion, this is also highly unlikely because of the low mass of gallium or gallium oxide present and expected clad temperatures below 400 C. Furthermore, no evidence for grain boundary penetration by gallium has been observed.

  6. Photonuclear Reaction Cross Sections for Gallium Isotopes

    E-Print Network [OSTI]

    Serkan Akkoyun; Tuncay Bayram

    2014-09-08T23:59:59.000Z

    The photon induced reactions which are named as photonuclear reactions have a great importance in many field of nuclear, radiation physics and related fields. Since we have planned to perform photonuclear reaction on gallium target with bremmstrahlung photons from clinical linear accelerator in the future, the cross-sections of neutron (photo-neutron ({\\gamma},xn)) and proton (photo-proton ({\\gamma},xn)) productions after photon activation have been calculated by using TALYS 1.2 computer code in this study. The target nucleus has been considered gallium which has two stable isotopes, 69Ga and 71Ga. According to the results, we have seen that the calculations are in harmony in the limited literature values. Furthermore, the pre-equilibrium and compound process contributions to the total cross-section have been investigated.

  7. Optical Constants ofOptical Constants of Uranium Nitride Thin FilmsUranium Nitride Thin Films

    E-Print Network [OSTI]

    Hart, Gus

    Optical Constants ofOptical Constants of Uranium Nitride Thin FilmsUranium Nitride Thin FilmsDelta--Beta Scatter Plot at 220 eVBeta Scatter Plot at 220 eV #12;Why Uranium Nitride?Why Uranium Nitride? UraniumUranium, uranium,Bombard target, uranium, with argon ionswith argon ions Uranium atoms leaveUranium atoms leave

  8. Gallium nanoparticles grow where light is

    E-Print Network [OSTI]

    K. F. MacDonald; W. S. Brocklesby; V. I. Emelyanov; V. A. Fedotov; S. Pochon; K. J. Ross; G. Stevens; N. I. Zheludev

    2001-05-15T23:59:59.000Z

    The study of metallic nanoparticles has a long tradition in linear and nonlinear optics [1], with current emphasis on the ultrafast dynamics, size, shape and collective effects in their optical response [2-6]. Nanoparticles also represent the ultimate confined geometry:high surface-to-volume ratios lead to local field enhancements and a range of dramatic modifications of the material's properties and phase diagram [7-9]. Confined gallium has become a subject of special interest as the light-induced structural phase transition recently observed in gallium films [10, 11] has allowed for the demonstration of all-optical switching devices that operate at low laser power [12]. Spontaneous self-assembly has been the main approach to the preparation of nanoparticles (for a review see 13). Here we report that light can dramatically influence the nanoparticle self-assembly process: illumination of a substrate exposed to a beam of gallium atoms results in the formation of nanoparticles with a relatively narrow size distribution. Very low light intensities, below the threshold for thermally-induced evaporation, exert considerable control over nanoparticle formation through non-thermal atomic desorption induced by electronic excitation.

  9. Empirical modeling of uranium nitride fuels

    E-Print Network [OSTI]

    Brozak, Daniel Edward

    1987-01-01T23:59:59.000Z

    of this work was to develop an irradiation performance data base for nitride fuels and to provide empirical modeling capabilities for fuel swelling and fission gas release in nitride fuels. The nitride fuels data base represents the most extensive effort... to date to systematically collect, evaluate and analyze irradiation performance data for nitride fuels. The data base will be a valuable tool for all researchers in the advanced fuel modeling field in that it provides a foundation for the construction...

  10. Epitaxial GaN films by hyperthermal ion-beam nitridation of Ga droplets

    SciTech Connect (OSTI)

    Gerlach, J. W.; Ivanov, T.; Neumann, L.; Hoeche, Th.; Hirsch, D.; Rauschenbach, B. [Leibniz-Institut fuer Oberflaechenmodifizierung (IOM), D-04318 Leipzig (Germany)

    2012-06-01T23:59:59.000Z

    Epitaxial GaN film formation on bare 6H-SiC(0001) substrates via the process of transformation of Ga droplets into a thin GaN film by applying hyperthermal nitrogen ions is investigated. Pre-deposited Ga atoms in well defined amounts form large droplets on the substrate surface which are subsequently nitridated at a substrate temperature of 630 Degree-Sign C by a low-energy nitrogen ion beam from a constricted glow-discharge ion source. The Ga deposition and ion-beam nitridation process steps are monitored in situ by reflection high-energy electron diffraction. Ex situ characterization by x-ray diffraction and reflectivity techniques, Rutherford backscattering spectrometry, and electron microscopy shows that the thickness of the resulting GaN films depends on the various amounts of pre-deposited gallium. The films are epitaxial to the substrate, exhibit a mosaic like, smooth surface topography and consist of coalesced large domains of low defect density. Possible transport mechanisms of reactive nitrogen species during hyperthermal nitridation are discussed and the formation of GaN films by an ion-beam assisted process is explained.

  11. Process for making transition metal nitride whiskers

    DOE Patents [OSTI]

    Bamberger, Carlos E. (Oak Ridge, TN)

    1989-01-01T23:59:59.000Z

    A process for making metal nitrides, particularly titanium nitride whiskers, using a cyanide salt as a reducing agent for a metal compound in the presence of an alkali metal oxide. Sodium cyanide, various titanates and titanium oxide mixed with sodium oxide react to provide titanium nitride whiskers that can be used as reinforcement to ceramic composites.

  12. Process for making transition metal nitride whiskers

    DOE Patents [OSTI]

    Bamberger, C.E.

    1988-04-12T23:59:59.000Z

    A process for making metal nitrides, particularly titanium nitride whiskers, using a cyanide salt as a reducing agent for a metal compound in the presence of an alkali metal oxide. Sodium cyanide, various titanates and titanium oxide mixed with sodium oxide react to provide titanium nitride whiskers that can be used as reinforcement to ceramic composites. 1 fig., 1 tab.

  13. GALLIUM--2001 29.1 By Deborah A. Kramer

    E-Print Network [OSTI]

    the largest application for gallium, with optoelectronic devices [mostly laser diodes and light near the town of McDermitt in Humboldt County, NV. The company began initial drilling in October and announced preliminary results in November. According to the drilling results, gallium concentrations over

  14. Electrical properties of atomic layer deposited aluminum oxide on gallium nitride

    SciTech Connect (OSTI)

    Esposto, Michele; Krishnamoorthy, Sriram; Nath, Digbijoy N.; Bajaj, Sanyam; Hung, Ting-Hsiang; Rajan, Siddharth

    2011-09-26T23:59:59.000Z

    We report on our investigation of the electrical properties of metal/Al{sub 2}O{sub 3}/GaN metal-insulator-semiconductor capacitors. We determined the conduction band offset and interface charge density of the alumina/GaN interface by analyzing the capacitance-voltage characteristics of atomic layer deposited Al{sub 2}O{sub 3} films on GaN substrates. The conduction band offset at the Al{sub 2}O{sub 3}/GaN interface was calculated to be 2.13 eV, in agreement with theoretical predications. A non-zero field of 0.93 MV/cm in the oxide under flat-band conditions in the GaN was inferred, which we attribute to a fixed net positive charge density of magnitude 4.60 x 10{sup 12 }cm{sup -2} at the Al{sub 2}O{sub 3}/GaN interface. We provide hypotheses to explain the origin of this charge by analyzing the energy band line-up.

  15. Commercialization of gallium nitride nanorod arrays on silicon for solid-state lighting

    E-Print Network [OSTI]

    Wee, Qixun

    2008-01-01T23:59:59.000Z

    One important component in energy usage is lighting, which is currently dominated by incandescent and fluorescent lamps. However, due to potentially higher efficiencies and thus higher energy savings, solid-state lighting ...

  16. The equilibrium state of hydrogen in gallium nitride: Theory and experiment

    SciTech Connect (OSTI)

    MYERS JR.,SAMUEL M.; WRIGHT,ALAN F.; PETERSEN,GARY A.; SEAGER,CARLETON H.; WAMPLER,WILLIAM R.; CRAWFORD,MARY H.; HAN,JUNG

    2000-04-17T23:59:59.000Z

    Formation energies and vibrational frequencies for H in wurtzite GaN were calculated from density functional theory and used to predict equilibrium state occupancies and solid solubilities for p-type, intrinsic, and n-type material. The solubility of deuterium (D) was measured at 600--800 C as a function of D{sub 2} pressure and doping and compared with theory. Agreement was obtained by reducing the H formation energies 0.2 eV from ab-initio theoretical values. The predicted stretch-mode frequency for H bound to the Mg acceptor lies 5% above an observed infrared absorption attributed to this complex. It is concluded that currently recognized H states and physical processes account for the equilibrium behavior of H examined in this work.

  17. Diffusion, Uptake and Release of Hydrogen in p-type Gallium Nitride: Theory and Experiment

    SciTech Connect (OSTI)

    MYERS JR.,SAMUEL M.; WRIGHT,ALAN F.; PETERSEN,GARY A.; WAMPLER,WILLIAM R.; SEAGER,CARLETON H.; CRAWFORD,MARY H.; HAN,JUNG

    2000-06-27T23:59:59.000Z

    The diffusion, uptake, and release of H in p-type GaN are modeled employing state energies from density-function theory and compared with measurements of deuterium uptake and release using nuclear-reaction analysis. Good semiquantitative agreement is found when account is taken of a surface permeation barrier.

  18. Radiation-Hardened Gallium Nitride Detector and Arrays for Fusion Diagnostics

    SciTech Connect (OSTI)

    Sun, K. X., and MacNeil, L.

    2011-09-08T23:59:59.000Z

    This poster reports testing to confirm that GaN devices exhibit the extreme radiation hardness needed for use at the NIF, functioning properly after 1x10{sup 12} protons/cm{sup 2} proton irradiation in one year.

  19. X-ray photoelectron spectroscopy of gallium nitride films grown by radical-beam gettering epitaxy

    SciTech Connect (OSTI)

    Rogozin, I. V. [Berdyansk State Pedagogical University (Ukraine)], E-mail: rogozin@bdpu.org; Kotlyarevsky, M. B. [Academy of Management and Information Technology (Ukraine)

    2007-05-15T23:59:59.000Z

    Thin GaN films were grown on GaAs(111) substrates by radical-beam gettering epitaxy. The structural quality of the films was studied by high-resolution x-ray diffraction. The chemical composition of the GaAs surface and GaN film was studied by x-ray photoelectron spectroscopy. It is shown that Ga-N and As-N bonds are formed on the GaAs surface at initial growth stages at low temperatures. The state of the film-substrate interface was studied. It was found that prolonged annealing of GaN films in nitrogen radicals shifts the composition to nitrogen excess.

  20. High Quality, Low Cost Bulk Gallium Nitride Substrates Grown by the Electrochemical Solution Growth Method

    Broader source: Energy.gov (indexed) [DOE]

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645 3,625 1,006 492 742Energy ChinaofSchaefer To:Department of EnergySeacrist, Senior Fellow - Emerging Technologies

  1. High-Quality, Low-Cost Bulk Gallium Nitride Substrates | Department of

    Broader source: Energy.gov (indexed) [DOE]

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645 3,625 1,006 492 742Energy ChinaofSchaefer To:Department of EnergySeacrist, SeniorVolume 6 Building

  2. Sandia Energy - BES Web Highlight: Single-mode gallium nitride nanowire

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level:Energy: Grid Integration Redefining What's PossibleRadiation Protection245C Unlimited ReleaseWelcome ton6Andy

  3. Compatibility of ITER candidate structural materials with static gallium

    SciTech Connect (OSTI)

    Luebbers, P.R.; Michaud, W.F.; Chopra, O.K.

    1993-12-01T23:59:59.000Z

    Tests were conducted on the compatibility of gallium with candidate structural materials for the International Thermonuclear Experimental Reactor, e.g., Type 316 SS, Inconel 625, and Nb-5 Mo-1 Zr alloy, as well as Armco iron, Nickel 270, and pure chromium. Type 316 stainless steel is least resistant to corrosion in static gallium and Nb-5 Mo-1 Zr alloy is most resistant. At 400{degrees}C, corrosion rates are {approx}4.0, 0.5, and 0.03 mm/yr for type 316 SS, Inconel 625, and Nb-5 Mo- 1 Zr alloy, respectively. The pure metals react rapidly with gallium. In contrast to findings in earlier studies, pure iron shows greater corrosion than nickel. The corrosion rates at 400{degrees}C are {ge}88 and 18 mm/yr, respectively, for Armco iron and Nickel 270. The results indicate that at temperatures up to 400{degrees}C, corrosion occurs primarily by dissolution and is accompanied by formation of metal/gallium intermetallic compounds. The solubility data for pure metals and oxygen in gallium are reviewed. The physical, chemical, and radioactive properties of gallium are also presented. The supply and availability of gallium, as well as price predictions through the year 2020, are summarized.

  4. Investigation into nitrided spur gears

    SciTech Connect (OSTI)

    Yilbas, B.S.; Coban, A.; Nickel, J.; Sunar, M.; Sami, M.; Abdul Aleem, B.J. [King Fahd Univ. of Petroleum and Minerals, Dhahran (Saudi Arabia)

    1996-12-01T23:59:59.000Z

    The cold forging method has been widely used in industry to produce machine parts. In general, gears are produced by shaping or hobbing. One of the shaping techniques is precision forging, which has several advantages over hobbing. In the present study, cold forging of spur gears from Ti-6Al-4V material is introduced. To improve the surface properties of the resulting gears, plasma nitriding was carried out. Nuclear reaction analysis was carried out to obtain the nitrogen concentration, while the micro-PIXE technique was used to determine the elemental distribution in the matrix after forging and nitriding processes. Scanning electron microscopy and x-ray powder diffraction were used to investigate the metallurgical changes and formation of nitride components in the surface region. Microhardness and friction tests were carried out to measure the hardness depth profile and friction coefficient at the surface. Finally, scoring failure tests were conducted to determine the rotational speed at which the gears failed. Three distinct regions were obtained in the nitride region, and at the initial stages of the scoring tests, failure in surface roughness was observed in the vicinity of the tip of the gear tooth. This occurred at a particular rotational speed and work input.

  5. (Data in metric tons unless otherwise noted) Domestic Production and Use: Indium was not recovered from ores in the United States in 2008. Indium-containing

    E-Print Network [OSTI]

    : Data on the quantity of secondary indium recovered from scrap were not available. Indium is most loop--from collection of scrap to production of secondary materials--now takes less than 30 days. ITO to dissolve the ITO, from which the indium is recovered. Indium recovery from tailings was thought to have

  6. Harmonic generation from indium-rich plasmas

    SciTech Connect (OSTI)

    Ganeev, R. A.; Kulagin, I. A. [Akadempribor Scientific Association, Academy of Sciences of Uzbekistan, Tashkent 700125 (Uzbekistan); Singhal, H.; Naik, P. A.; Arora, V.; Chakravarty, U.; Chakera, J. A.; Khan, R. A.; Raghuramaiah, M.; Gupta, P. D. [Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore 452013 (India); Redkin, P. V. [Samarkand State University, Samarkand 703004 (Uzbekistan)

    2006-12-15T23:59:59.000Z

    An experimental study of high-order harmonic generation in In, InSb, InP, and InGaP plasmas using femtosecond laser radiation with variable chirp is presented. Intensity enhancement of the 13th and 21st harmonics compared to the neighboring harmonics by a factor of 200 and 10, respectively, is observed. It is shown that the harmonic spectrum from indium-containing plasma plumes can be considerably modified by controlling the chirp of the driving laser pulse.

  7. (Data in kilograms of gallium content, unless otherwise noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 1996. Two companies in

    E-Print Network [OSTI]

    on world production of primary gallium were unavailable because data on the output of the few producers62 GALLIUM (Data in kilograms of gallium content, unless otherwise noted) Domestic Production in optoelectronic devices, which include light-emitting diodes (LED's), laser diodes, photodetectors, and solar

  8. Reversible expansion of gallium-stabilized (delta)-plutonium

    SciTech Connect (OSTI)

    Wolfer, W G; Oudot, B; Baclet, N

    2006-02-27T23:59:59.000Z

    It is shown that the transient expansion of plutonium-gallium alloys observed both in the lattice parameter as well as in the dimension of a sample held at ambient temperature can be explained by assuming incipient precipitation of Pu{sub 3}Ga. However, this ordered {zeta}-phase is also subject to radiation-induced disordering. As a result, the gallium-stabilized {delta}-phase, being metastable at ambient temperature, is driven towards thermodynamic equilibrium by radiation-enhanced diffusion of gallium and at the same time reverted back to its metastable state by radiation-induced disordering. A steady state is reached in which only a modest fraction of the gallium present is arranged in ordered {zeta}-phase regions.

  9. Design and Implementation of Silicon Nitride Valves for Heavy...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Implementation of Silicon Nitride Valves for Heavy Duty Diesel Engines Design and Implementation of Silicon Nitride Valves for Heavy Duty Diesel Engines Poster presentation at the...

  10. amorphous carbon nitride: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Si-rich nitride Er:SRN materials have 3 Carbon Nitride and Conjugated Polymer Composite Materials. Open Access Theses and Dissertations Summary: ??The semiconductor and...

  11. Nitride semiconductor Surface and interface characterization and device design

    E-Print Network [OSTI]

    Zhang, Hongtao

    2006-01-01T23:59:59.000Z

    Lett. 80 , D. Schroder, Semiconductor Material and Devicein III-V Nitride Semiconductors: Applications and Devices ,SAN DIEGO Nitride Semiconductor Surface and Interface

  12. Nanostructure, Chemistry and Crystallography of Iron Nitride...

    Broader source: Energy.gov (indexed) [DOE]

    Nanostructure, Chemistry and Crystallography of Iron Nitride Magnetic Materials by Ultra-High-Resolution Electron Microscopy and Related Methods DOE 2011 Vehicle Technologies...

  13. Silicon nitride having a high tensile strength

    DOE Patents [OSTI]

    Pujari, Vimal K. (Northboro, MA); Tracey, Dennis M. (Medfield, MA); Foley, Michael R. (Oxford, MA); Paille, Norman I. (Oxford, MA); Pelletier, Paul J. (Sutton, MA); Sales, Lenny C. (Grafton, MA); Willkens, Craig A. (Worcester, MA); Yeckley, Russell L. (Latrobe, PA)

    1998-01-01T23:59:59.000Z

    A ceramic body comprising at least about 80 w/o silicon nitride and having a mean tensile strength of at least about 800 MPa.

  14. Nanostructure, Chemistry and Crystallography of Iron Nitride...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Nanostructure, Chemistry and Crystallography of Iron Nitride Magnetic Materials by Ultra-High-Resolution Electron Microscopy and Related Methods Nanostructure, Chemistry and...

  15. Sandia National Laboratories: III-nitride materials

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    III-nitride materials SSLS Scientist Andy Armstrong Receives 2013 Employee Recognition Award On September 9, 2013, in EC, Energy, Energy Efficiency, Events, News, News & Events,...

  16. Inhalation developmental toxicology studies: Gallium arsenide in mice and rats

    SciTech Connect (OSTI)

    Mast, T.J.; Greenspan, B.J.; Dill, J.A.; Stoney, K.H.; Evanoff, J.J.; Rommereim, R.L.

    1990-12-01T23:59:59.000Z

    Gallium arsenide is a crystalline compound used extensively in the semiconductor industry. Workers preparing solar cells and gallium arsenide ingots and wafers are potentially at risk from the inhalation of gallium arsenide dust. The potential for gallium arsenide to cause developmental toxicity was assessed in Sprague- Dawley rats and CD-1 (Swiss) mice exposed to 0, 10, 37, or 75 mg/m{sup 3} gallium arsenide, 6 h/day, 7 days/week. Each of the four treatment groups consisted of 10 virgin females (for comparison), and {approx}30 positively mated rats or {approx}24 positively mated mice. Mice were exposed on 4--17 days of gestation (dg), and rats on 4--19 dg. The day of plug or sperm detection was designated as 0 dg. Body weights were obtained throughout the study period, and uterine and fetal body weights were obtained at sacrifice (rats, 20 dg; mice, 18 dg). Implants were enumerated and their status recorded. Live fetuses were sexed and examined for gross, visceral, skeletal, and soft-tissue craniofacial defects. Gallium and arsenic concentrations were determined in the maternal blood and uterine contents of the rats (3/group) at 7, 14, and 20 dg. 37 refs., 11 figs., 30 tabs.

  17. Method of preparation of uranium nitride

    DOE Patents [OSTI]

    Kiplinger, Jaqueline Loetsch; Thomson, Robert Kenneth James

    2013-07-09T23:59:59.000Z

    Method for producing terminal uranium nitride complexes comprising providing a suitable starting material comprising uranium; oxidizing the starting material with a suitable oxidant to produce one or more uranium(IV)-azide complexes; and, sufficiently irradiating the uranium(IV)-azide complexes to produce the terminal uranium nitride complexes.

  18. Application of ultrasound in solvent extraction of nickel and gallium

    SciTech Connect (OSTI)

    Pesic, B.

    1996-07-01T23:59:59.000Z

    The effects of ultrasound on the rate of solvent extraction of nickel with Lix 65N and Lix 70, and gallium with Kelex 100 were investigated. These solvent extraction systems are noted by their sluggish nature. Low frequency (20 kHz) ultrasound increased the rates of extraction of nickel by factors of four to seven. The ultrasound had no effect on the final chemical equilibrium. Gallium extraction rates were enhanced with the use of ultrasound by as much as a factor of 15. Again, the ultrasound had no effect on extraction equilibrium. For both nickel and gallium, the enhanced rates were attributed to increased interfacial surface area associated with ultrasonically induced cavitation and microdroplet formation. The stability of the microdroplets permitted intermittent application of ultrasound with corresponding decreases in ultrasonic energy requirements. The lowest energy consumption was observed with short (0.25 to 5 s) bursts of high power (41 to 61 W) ultrasonic inputs. The study also provided insight into the factors that affect the complex extraction of gallium from sodium aluminate solutions. The rate controlling step was found to be the dehydration of the gallate ion, Ga(OH)4, and the first complex formation between gallium and Kelex 100. Sodium was found to enhance the extraction rate up to a point, beyond which increased concentration was detrimental. Increasing aluminum concentration was found to slow extraction rates. Modifiers and diluents were shown to markedly affect extraction rates even without ultrasound. Ketone modifiers, particularly 2-undecanone, when used with Kermac 470B or Escaid 200 diluents enhanced extraction rates of gallium to the point that the use of ultrasound provided no additional benefits. The positive effects of ketone modifiers for the solvent extraction of gallium had not been previously reported.

  19. Molten-Salt-Based Growth of Group III Nitrides

    DOE Patents [OSTI]

    Waldrip, Karen E. (Albuquerque, NM); Tsao, Jeffrey Y. (Albuquerque, NM); Kerley, Thomas M. (Albuquerque, NM)

    2008-10-14T23:59:59.000Z

    A method for growing Group III nitride materials using a molten halide salt as a solvent to solubilize the Group-III ions and nitride ions that react to form the Group III nitride material. The concentration of at least one of the nitride ion or Group III cation is determined by electrochemical generation of the ions.

  20. Process for forming pure silver ohmic contacts to N- and P-type gallium arsenide materials

    DOE Patents [OSTI]

    Hogan, S.J.

    1983-03-13T23:59:59.000Z

    Disclosed is an improved process for manufacturing gallium arsenide semiconductor devices having as its components a n-type gallium arsenide substrate layer and a p-type gallium arsenide diffused layer. The improved process comprises forming a pure silver ohmic contact to both the diffuse layer and the substrate layer wherein the n-type layer comprises a substantially low doping carrier concentration.

  1. Sandia Energy - Light Creation Materials

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ZnO, will be important. AlGaInN Materials LEDs based on gallium nitride (GaN) and ternary alloys with indium (InGaN) and aluminum (AlGaN) as well as quaternary alloys (AlGaInN) can...

  2. Sandia National Laboratories: Light Creation Materials

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    for example ZnO, will be important. AlGaInN Materials LEDs based on gallium nitride (GaN) and ternary alloys with indium (InGaN) and aluminum (AlGaN) as well as quaternary...

  3. Synthesis, characterization, and exciton dynamics of II-VI semiconducting nanomaterials and ab-initio studies for applications in explosives sensing

    E-Print Network [OSTI]

    Cooper, Jason Kyle

    2013-01-01T23:59:59.000Z

    gallium diselenide (CIGS) solar cells were studied. TheCIGS (copper indium gallium diselenide) thin film solar cells

  4. Interaction of a Liquid Gallium Jet with ISTTOK Edge Plasmas

    SciTech Connect (OSTI)

    Gomes, R. B.; Fernandes, H.; Silva, C.; Pereira, T.; Figueiredo, J.; Carvalho, B.; Soares, A.; Duarte, P.; Varandas, C. [Associacao EURATOM/IST, Centro de Fusao Nuclear, Av. Rovisco Pais, 1049-001 Lisboa, Porugal (Portugal); Sarakovskis, A.; Lielausis, O.; Klyukin, A.; Platacis, E.; Tale, I. [Association EURATOM/University of Latvia, Institute of Solid State Physics, 8 Kengaraga Str., LV-1063 Riga (Latvia)

    2008-04-07T23:59:59.000Z

    The use of liquid metals as plasma facing components in tokamaks has recently experienced a renewed interest stimulated by their advantages in the development of a fusion reactor. Liquid metals have been proposed to solve problems related to the erosion and neutronic activation of solid walls submitted to high power loads allowing an efficient heat exhaust from fusion devices. Presently the most promising candidate materials are lithium and gallium. However, lithium has a short liquid state range when compared, for example, with gallium that has essentially better thermal properties and lower vapor pressure. To explore further these properties, ISTTOK tokamak is being used to test the interaction of a free flying, fully formed liquid gallium jet with the plasma. The interacting, 2.3 mm diameter, jet is generated by hydrostatic pressure and has a 2.5 m/s flow velocity. The liquid metal injector has been build to allow the positioning of the jet inside the tokamak chamber, within a 13 mm range. This paper presents the first obtained experimental results concerning the liquid gallium jet-plasma interaction. A stable jet has been obtained, which was not noticeably affected by the magnetic field transients. ISTTOK has been successfully operated with the gallium jet without degradation of the discharge or a significant plasma contamination by liquid metal. This observation is supported by spectroscopic measurements showing that gallium radiation is limited to the region around the jet. Furthermore, the power deposited on the jet has been evaluated at different radial locations and the surface temperature increase estimated.

  5. An evaluation of indium antimonide quantum well transistor technology

    E-Print Network [OSTI]

    Liu, Jingwei, M. Eng. Massachusetts Institute of Technology

    2006-01-01T23:59:59.000Z

    Motivated by the super high electron mobility of Indium Antimonide (InSb), researchers have seen great potential to use this new material in high switching speed and low power transistors. In Dec, 2005, Intel and its ...

  6. The natural and industrial cycling of indium in the environment

    E-Print Network [OSTI]

    White, Sarah Jane O'Connell

    2012-01-01T23:59:59.000Z

    Indium is an important metal whose production is increasing dramatically due to new uses in the rapidly growing electronics, photovoltaic, and LED industries. Little is known, however, about the natural or industrial cycling ...

  7. Low temperature route to uranium nitride

    DOE Patents [OSTI]

    Burrell, Anthony K. (Los Alamos, NM); Sattelberger, Alfred P. (Darien, IL); Yeamans, Charles (Berkeley, CA); Hartmann, Thomas (Idaho Falls, ID); Silva, G. W. Chinthaka (Las Vegas, NV); Cerefice, Gary (Henderson, NV); Czerwinski, Kenneth R. (Henderson, NV)

    2009-09-01T23:59:59.000Z

    A method of preparing an actinide nitride fuel for nuclear reactors is provided. The method comprises the steps of a) providing at least one actinide oxide and optionally zirconium oxide; b) mixing the oxide with a source of hydrogen fluoride for a period of time and at a temperature sufficient to convert the oxide to a fluoride salt; c) heating the fluoride salt to remove water; d) heating the fluoride salt in a nitrogen atmosphere for a period of time and at a temperature sufficient to convert the fluorides to nitrides; and e) heating the nitrides under vacuum and/or inert atmosphere for a period of time sufficient to convert the nitrides to mononitrides.

  8. Method of nitriding refractory metal articles

    DOE Patents [OSTI]

    Tiegs, Terry N. (Lenoir City, TN); Holcombe, Cressie E. (Knoxville, TN); Dykes, Norman L. (Oak Ridge, TN); Omatete, Ogbemi O. (Lagos, NG); Young, Albert C. (Flushing, NY)

    1994-01-01T23:59:59.000Z

    A method of nitriding a refractory-nitride forming metal or metalloid articles and composite articles. A consolidated metal or metalloid article or composite is placed inside a microwave oven and nitrogen containing gas is introduced into the microwave oven. The metal or metalloid article or composite is heated to a temperature sufficient to react the metal or metalloid with the nitrogen by applying a microwave energy within the microwave oven. The metal or metalloid article or composite is maintained at that temperature for a period of time sufficient to convert the article of metal or metalloid or composite to an article or composite of refractory nitride. In addition, a method of applying a coating, such as a coating of an oxide, a carbide, or a carbo-nitride, to an article of metal or metalloid by microwave heating.

  9. Silicon nitride having a high tensile strength

    DOE Patents [OSTI]

    Pujari, V.K.; Tracey, D.M.; Foley, M.R.; Paille, N.I.; Pelletier, P.J.; Sales, L.C.; Willkens, C.A.; Yeckley, R.L.

    1998-06-02T23:59:59.000Z

    A ceramic body is disclosed comprising at least about 80 w/o silicon nitride and having a mean tensile strength of at least about 800 MPa. 4 figs.

  10. High thermal conductivity aluminum nitride ceramic body

    SciTech Connect (OSTI)

    Huseby, I. C.; Bobik, C. F.

    1985-10-15T23:59:59.000Z

    A process for producing a polycrystalline aluminum nitride ceramic body having a porosity of less than about 10% by volume of said body and a thermal conductivity greater than 1.0 W/cm-K at 22/sup 0/ C., which comprises forming a mixture comprised of aluminum nitride powder and an yttrium additive selected from the group consisting of yttrium, yttrium hydride, yttrium nitride and mixtures thereof, said aluminum nitride and yttrium additive having a predetermined oxygen content, said mixture having a composition wherein the equivalent % of yttrium, aluminum, nitrogen and oxygen shapping said mixture into a compact and sintering said compact at a temperature ranging from about 1850/sup 0/ C. to about 2170/sup 0/ C. in an atmosphere selected from the group consisting of nitrogen, argon, hydrogen and mixtures thereof to produce said polycrystalline body.

  11. LCD, low-temperature soldering and compound semiconductor : the sources, market, applications and future prospects of indium in Malaysia

    E-Print Network [OSTI]

    Yong, Foo Nun

    2006-01-01T23:59:59.000Z

    Indium is a minor but very valuable metal. Decreasing supplies of indium from refining and increasing demands from LCD, low-temperature soldering and compound semiconductors have stimulated the indium price increase ...

  12. Metal Nitride Diffusion Barriers for Copper Interconnects

    E-Print Network [OSTI]

    Araujo, Roy A.

    2010-01-14T23:59:59.000Z

    nanocrystalline TiN film enhances grain boundary sliding and grain boundary diffusion related creep phenomena, and the ductility of the coatings is also improved. On the other hand, compositional designed TiN based alloys, such as cubic-phase Ti1-xAlxN thin... Nitrides ...................... 26 2.3 Composition and Structures of TiN, TaN and HfN ................. 33 2.4 Nitride Formation, Electronegativity, Atomic Radius and Bonding...

  13. The Nitrogen-Nitride Anode.

    SciTech Connect (OSTI)

    Delnick, Frank M.

    2014-10-01T23:59:59.000Z

    Nitrogen gas N 2 can be reduced to nitride N -3 in molten LiCl-KCl eutectic salt electrolyte. However, the direct oxidation of N -3 back to N 2 is kinetically slow and only occurs at high overvoltage. The overvoltage for N -3 oxidation can be eliminated by coordinating the N -3 with BN to form the dinitridoborate (BN 2 -3 ) anion which forms a 1-D conjugated linear inorganic polymer with -Li-N-B-N- repeating units. This polymer precipitates out of solution as Li 3 BN 2 which becomes a metallic conductor upon delithiation. Li 3 BN 2 is oxidized to Li + + N 2 + BN at about the N 2 /N -3 redox potential with very little overvoltage. In this report we evaluate the N 2 /N -3 redox couple as a battery anode for energy storage.

  14. Corrosion behavior of mesoporous transition metal nitrides

    SciTech Connect (OSTI)

    Yang, Minghui, E-mail: m.yang@cornell.edu [Department of Chemistry, Cornell University, Ithaca 14853-1301, NY (United States); Allen, Amy J.; Nguyen, Minh T. [Department of Chemistry, Cornell University, Ithaca 14853-1301, NY (United States); Ralston, Walter T. [College of Chemistry, University of California, Berkeley 94720-1460, CA (United States); MacLeod, Michelle J. [Department of Chemistry, Massachusetts Institute of Technology, Cambridge 02139-4307, MA (United States); DiSalvo, Francis J., E-mail: fjd3@cornell.edu [Department of Chemistry, Cornell University, Ithaca 14853-1301, NY (United States)

    2013-09-15T23:59:59.000Z

    Transition metal nitrides (TMN) have many desirable characteristics such as high hardness and good thermal stability under reducing conditions. This work reports an initial survey of the chemical stability of mesoporous TMNs (TM=Nb, V, Cr and Ti) in water at 80 °C at neutral, acidic and alkaline pH. The mesoporous TMNs had specific surface areas of 25–60 m{sup 2}/g with average pore sizes ranging from 10 to 50 nm. The high surface areas of these materials enhance the rate of corrosion per unit mass over that of a bulk material, making detection of corrosion much easier. The products were characterized by Rietveld refinement of powder X-ray diffraction (PXRD) patterns and by scanning electron microscopy (SEM). Several nitrides have corrosion rates that are, within error, not distinguishable from zero (±1 Å/day). Of the nitrides examined, CrN appears to be the most corrosion resistant under acidic conditions. None of the nitrides studied are corrosion resistant under alkaline conditions. - Graphical abstract: Corrosion behavior of mesoporous transition metal nitrides (TM=Nb, V, Cr and Ti) in acidic and alkaline solutions at 80 °C for 2 weeks. Display Omitted - highlights: • Corrosion rates of mesoporous transition metal nitrides in aqueous solution is reported. • The mesoporous TMNs had surface areas of 25–60 m{sup 2}/g. • CrN is the most corrosion resistant under the conditions studied.

  15. Pair distribution function study on compression of liquid gallium

    SciTech Connect (OSTI)

    Luo, Shengnian [Los Alamos National Laboratory; Yu, Tony [SUNY-SB; Chen, Jiuhua [SUNY-SB; Ehm, Lars [SUNY-SB; Guo, Quanzhong [SUNY-SB; Parise, John [SUNY-SB

    2008-01-01T23:59:59.000Z

    Integrating a hydrothermal diamond anvil cell (HDAC) and focused high energy x-ray beam from the superconductor wiggler X17 beamline at the National Synchrotron Light Source (NSLS) at the Brookhaven National Laboratory (BNL), we have successfully collected high quality total x-ray scattering data of liquid gallium. The experiments were conducted at a pressure range from 0.1GPa up to 2GPa at ambient temperature. For the first time, pair distribution functions (PDF) for liquid gallium at high pressure were derived up to 10 {angstrom}. Liquid gallium structure has been studied by x-ray absorption (Di Cicco & Filipponi, 1993; Wei et al., 2000; Comez et al., 2001), x-ray diffraction studies (Waseda & Suzuki, 1972), and molecular dynamics simulation (Tsay, 1993; Hui et al., 2002). These previous reports have focused on the 1st nearest neighbor structure, which tells us little about the atomic arrangement outside the first shell in non- crystalline materials. This study focuses on the structure of liquid gallium and the atomic structure change due to compression. The PDF results show that the observed atomic distance of the first nearest neighbor at 2.78 {angstrom} (first G(r) peak and its shoulder at the higher Q position) is consistent with previous studies by x-ray absorption (2.76 {angstrom}, Comez et al., 2001). We have also observed that the first nearest neighbor peak position did not change with pressure increasing, while the farther peaks positions in the intermediate distance range decreased with pressure increasing. This leads to a conclusion of the possible existence of 'locally rigid units' in the liquid. With the addition of reverse Monte Carlo modeling, we have observed that the coordination number in the local rigit unit increases with pressure. The bulk modulus of liquid gallium derived from the volume compression curve at ambient temperature (300K) is 12.1(6) GPa.

  16. Self- and zinc diffusion in gallium antimonide

    SciTech Connect (OSTI)

    Nicols, Samuel Piers

    2002-03-26T23:59:59.000Z

    The technological age has in large part been driven by the applications of semiconductors, and most notably by silicon. Our lives have been thoroughly changed by devices using the broad range of semiconductor technology developed over the past forty years. Much of the technological development has its foundation in research carried out on the different semiconductors whose properties can be exploited to make transistors, lasers, and many other devices. While the technological focus has largely been on silicon, many other semiconductor systems have applications in industry and offer formidable academic challenges. Diffusion studies belong to the most basic studies in semiconductors, important from both an application as well as research standpoint. Diffusion processes govern the junctions formed for device applications. As the device dimensions are decreased and the dopant concentrations increased, keeping pace with Moore's Law, a deeper understanding of diffusion is necessary to establish and maintain the sharp dopant profiles engineered for optimal device performance. From an academic viewpoint, diffusion in semiconductors allows for the study of point defects. Very few techniques exist which allow for the extraction of as much information of their properties. This study focuses on diffusion in the semiconductor gallium antimonide (GaSb). As will become clear, this compound semiconductor proves to be a powerful one for investigating both self- and foreign atom diffusion. While the results have direct applications for work on GaSb devices, the results should also be taken in the broader context of III-V semiconductors. Results here can be compared and contrasted to results in systems such as GaAs and even GaN, indicating trends within this common group of semiconductors. The results also have direct importance for ternary and quaternary semiconductor systems used in devices such as high speed InP/GaAsSb/InP double heterojunction bipolar transistors (DHBT) [Dvorak, (2001)]. Many of the findings which will be reported here were previously published in three journal articles. Hartmut Bracht was the lead author on two articles on self-diffusion studies in GaSb [Bracht, (2001), (2000)], while this report's author was the lead author on Zn diffusion results [Nicols, (2001)]. Much of the information contained herein can be found in those articles, but a more detailed treatment is presented here.

  17. (Data in kilograms of gallium content, unless otherwise noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 2002. Two companies in

    E-Print Network [OSTI]

    and Use: No domestic primary gallium recovery was reported in 2002. Two companies in Oklahoma and Utah diodes, photodetectors, and solar cells. Integrated circuits represented 65% of gallium demand forecasts of market growth, several companies were consolidating, reducing, or eliminating their Ga

  18. Method of manufacture of atomically thin boron nitride

    DOE Patents [OSTI]

    Zettl, Alexander K

    2013-08-06T23:59:59.000Z

    The present invention provides a method of fabricating at least one single layer hexagonal boron nitride (h-BN). In an exemplary embodiment, the method includes (1) suspending at least one multilayer boron nitride across a gap of a support structure and (2) performing a reactive ion etch upon the multilayer boron nitride to produce the single layer hexagonal boron nitride suspended across the gap of the support structure. The present invention also provides a method of fabricating single layer hexagonal boron nitride. In an exemplary embodiment, the method includes (1) providing multilayer boron nitride suspended across a gap of a support structure and (2) performing a reactive ion etch upon the multilayer boron nitride to produce the single layer hexagonal boron nitride suspended across the gap of the support structure.

  19. Method for forming indium oxide/n-silicon heterojunction solar cells

    DOE Patents [OSTI]

    Feng, Tom (Morris Plains, NJ); Ghosh, Amal K. (New Providence, NJ)

    1984-03-13T23:59:59.000Z

    A high photo-conversion efficiency indium oxide/n-silicon heterojunction solar cell is spray deposited from a solution containing indium trichloride. The solar cell exhibits an Air Mass One solar conversion efficiency in excess of about 10%.

  20. High-efficiency indium tin oxide/indium phosphide solar cells

    SciTech Connect (OSTI)

    Li, X.; Wanlass, M. W.; Gessert, T. A.; Emery, K. A.; Coutts, T. J.

    1989-06-26T23:59:59.000Z

    Improvements in the performance of indium tin oxide/indium phosphide (ITO/InP) solar cells have been achieved by using dc magnetron sputter deposited /ital n/-ITO onto an epitaxial /ital p///ital p//sup +/ structure grown on good quality commercial /ital p//sup +/ bulk substrates. The composition of the sputtering gas has been investigated and the highest efficiency cells resulted when the surface of the epilayer was exposed to an Ar/H/sub 2/ plasma before depositing the bulk of the ITO in a more typical Ar/O/sub 2/ plasma. With H/sub 2/ processing, record efficiencies of 18.9% global, 1000 W m/sup /minus/2/, 25 /degree/C (17.0% air mass zero) were achieved. Without H/sub 2/ processing, the devices exhibited lower efficiencies and were unstable. Type conversion of the InP was shown to occur and was established as being associated with the ITO (possibly due to Sn donors) rather than sputter damage. These improvements in performance have resulted from the optimization of the doping, thickness, transport, and surface properties of the /ital p/-type base, as well as from better control over the ITO deposition procedure.

  1. Silicon nitride ceramic having high fatigue life and high toughness

    DOE Patents [OSTI]

    Yeckley, Russell L. (Oakham, MA)

    1996-01-01T23:59:59.000Z

    A sintered silicon nitride ceramic comprising between about 0.6 mol % and about 3.2 mol % rare earth as rare earth oxide, and between about 85 w/o and about 95 w/o beta silicon nitride grains, wherein at least about 20% of the beta silicon nitride grains have a thickness of greater than about 1 micron.

  2. P-31 / Schlott P-31: Nodule Formation on Indium-Oxide Tin-Oxide

    E-Print Network [OSTI]

    P-31 / Schlott P-31: Nodule Formation on Indium-Oxide Tin-Oxide Sputtering Targets M. Schlott, M from indium-oxide tin-oxide (ITO) targets [1]. Unfor- tunately, black growths, or nodules, commonly isostatic pressing partly reduced powder mixtures of 90 wt.% indium-oxide and 10 wt.% tin-oxide [4

  3. Laser Direct Write Patterned Indium Tin Oxide Films for Photomasks and Anisotropic Resist Applications

    E-Print Network [OSTI]

    Chapman, Glenn H.

    Laser Direct Write Patterned Indium Tin Oxide Films for Photomasks and Anisotropic Resist bimetallic Sn/In film into a indium tin oxide layer. Sn over In films (15-120nm thick) with a 1:10 thickness mask, etch resist. 1. Introduction The transparent and conductive films like indium tin oxide (ITO

  4. E-Print Network 3.0 - arsenide- gallium instrument Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Materials Science 5 Formation of etch pits during carbon doping of gallium arsenide with carbon tetrachloride by metalorganic vapor-phase epitaxy Summary: Formation of etch pits...

  5. Nanosecond dynamics of a gallium mirror's light-induced reflectivity change

    E-Print Network [OSTI]

    V. Albanis; S. Dhanjal; V. I. Emelyanov; V. A. Fedotov; K. F. MacDonald; P. Petropoulos; D. J. Richardson; N. I. Zheludev

    2000-10-05T23:59:59.000Z

    Transient pump-probe optical reflectivity measurements of the nano/microsecond dynamics of a fully reversible, light-induced, surface-assisted metallization of gallium interfaced with silica are reported. The metallization leads to a considerable increase in the interface's reflectivity when solid a-gallium is on the verge of melting. The reflectivity change was found to be a cumulative effect that grows with light intensity and pulse duration. The reflectivity relaxes back to that of alpha-gallium when the excitation is withdrawn in a time that increases critically at gallium's melting point. The effect is attributed to a non-thermal light-induced structural phase transition.

  6. Nitride Fuel Development at the INL

    SciTech Connect (OSTI)

    W.E. Windes

    2007-06-01T23:59:59.000Z

    A new method for fabricating nitride-based fuels for nuclear applications is under development at the Idaho National Laboratory (INL). A primary objective of this research is the development of a process that could be operated as an automated or semi-automated technique reducing costs, worker doses, and eventually improving the final product form. To achieve these goals the fabrication process utilizes a new cryo-forming technique to produce microspheres formed from sub-micron oxide powder to improve material handling issues, yield rapid kinetics for conversion to nitrides, and reduced material impurity levels within the nitride compounds. The microspheres are converted to a nitride form within a high temperature particle fluidizing bed using a carbothermic process that utilizes a hydrocarbon – hydrogen - nitrogen gas mixture. A new monitor and control system using differential pressure changes in the fluidizing gas allows for real-time monitoring and control of the spouted bed reactor during conversion. This monitor and control system can provide real-time data that is used to control the gas flow rates, temperatures, and gas composition to optimize the fluidization of the particle bed. The small size (0.5 µm) of the oxide powders in the microspheres dramatically increases the kinetics of the conversion process yielding reduced process times and temperatures. Initial studies using surrogate ZrO2 powder have yielded conversion efficiencies of 90 -95 % nitride formation with only small levels of oxide and carbide contaminants present. Further studies are being conducted to determine optimal gas mixture ratios, process time, and temperature range for providing complete conversion to a nitride form.

  7. High-Efficiency Nitride-Based Solid-State Lighting

    SciTech Connect (OSTI)

    Paul T. Fini; Shuji Nakamura

    2005-07-30T23:59:59.000Z

    In this final technical progress report we summarize research accomplished during Department of Energy contract DE-FC26-01NT41203, entitled ''High-Efficiency Nitride-Based Solid-State Lighting''. Two teams, from the University of California at Santa Barbara (Principle Investigator: Dr. Shuji Nakamura) and the Lighting Research Center at Rensselaer Polytechnic Institute (led by Dr. N. Narendran), pursued the goals of this contract from thin film growth, characterization, and packaging/luminaire design standpoints. The UCSB team initially pursued the development of blue gallium nitride (GaN)-based vertical-cavity surface-emitting lasers, as well as ultraviolet GaN-based light emitting diodes (LEDs). In Year 2, the emphasis shifted to resonant-cavity light emitting diodes, also known as micro-cavity LEDs when extremely thin device cavities are fabricated. These devices have very directional emission and higher light extraction efficiency than conventional LEDs. Via the optimization of thin-film growth and refinement of device processing, we decreased the total cavity thickness to less than 1 {micro}m, such that micro-cavity effects were clearly observed and a light extraction efficiency of over 10% was reached. We also began the development of photonic crystals for increased light extraction, in particular for so-called ''guided modes'' which would otherwise propagate laterally in the device and be re-absorbed. Finally, we pursued the growth of smooth, high-quality nonpolar a-plane and m-plane GaN films, as well as blue light emitting diodes on these novel films. Initial nonpolar LEDs showed the expected behavior of negligible peak wavelength shift with increasing drive current. M-plane LEDs in particular show promise, as unpackaged devices had unsaturated optical output power of {approx} 3 mW at 200 mA drive current. The LRC's tasks were aimed at developing the subcomponents necessary for packaging UCSB's light emitting diodes, and packaging them to produce a white light fixture. During the third and final year of the project, the LRC team investigated alternate packaging methods for the white LED device to achieve at least 25 percent more luminous efficacy than traditional white LEDs; conducted optical ray-tracing analyses and human factors studies to determine the best form factor for the white light source under development, in terms of high luminous efficacy and greater acceptance by subjects; and developed a new die encapsulant using silicone-epoxy resins that showed less yellowing and slower degradation. At the conclusion of this project, the LRC demonstrated a new packaging method, called scattered photon extraction (SPE), that produced an average luminous flux and corresponding average efficacy of 90.7 lm and 36.3 lm/W, respectively, compared with 56.5 lm and 22.6 lm/W for a similar commercial white LED package. At low currents, the SPE package emitted white light with an efficacy of over 80 lm/W and had chromaticity values very close to the blackbody locus. The SPE package showed an overall improvement of 61% for this particular comparison, exceeding the LRC's third-year goal of 25% improvement.

  8. Anisotropic Hexagonal Boron Nitride Nanomaterials - Synthesis and Applications

    SciTech Connect (OSTI)

    Han,W.Q.

    2008-08-01T23:59:59.000Z

    Boron nitride (BN) is a synthetic binary compound located between III and V group elements in the Periodic Table. However, its properties, in terms of polymorphism and mechanical characteristics, are rather close to those of carbon compared with other III-V compounds, such as gallium nitride. BN crystallizes into a layered or a tetrahedrally linked structure, like those of graphite and diamond, respectively, depending on the conditions of its preparation, especially the pressure applied. Such correspondence between BN and carbon readily can be understood from their isoelectronic structures [1, 2]. On the other hand, in contrast to graphite, layered BN is transparent and is an insulator. This material has attracted great interest because, similar to carbon, it exists in various polymorphic forms exhibiting very different properties; however, these forms do not correspond strictly to those of carbon. Crystallographically, BN is classified into four polymorphic forms: Hexagonal BN (h-BN) (Figure 1(b)); rhombohedral BN (r-BN); cubic BN (c-BN); and wurtzite BN (w-BN). BN does not occur in nature. In 1842, Balmain [3] obtained BN as a reaction product between molten boric oxide and potassium cyanide under atmospheric pressure. Thereafter, many methods for its synthesis were reported. h-BN and r-BN are formed under ambient pressure. c-BN is synthesized from h-BN under high pressure at high temperature while w-BN is prepared from h-BN under high pressure at room temperature [1]. Each BN layer consists of stacks of hexagonal plate-like units of boron and nitrogen atoms linked by SP{sup 2} hybridized orbits and held together mainly by Van der Waals force (Fig 1(b)). The hexagonal polymorph has two-layered repeating units: AA'AA'... that differ from those in graphite: ABAB... (Figure 1(a)). Within the layers of h-BN there is coincidence between the same phases of the hexagons, although the boron atoms and nitrogen atoms are alternatively located along the c-axis. The rhombohedral system consists of three-layered units: ABCABC..., whose honeycomb layers are arranged in a shifted phase, like as those of graphite. Reflecting its weak interlayer bond, the h-BN can be cleaved easily along its layers, and hence, is widely used as a lubricant material. The material is stable up to a high temperature of 2300 C before decomposition sets in [2] does not fuse a nitrogen atmosphere of 1 atm, and thus, is applicable as a refractory material. Besides having such properties, similar to those of graphite, the material is transparent, and acts as a good electric insulator, especially at high temperatures (10{sup 6} {Omega}m at 1000 C) [1]. c-BN and w-BN are tetrahedrally linked BN. The former has a cubic sphalerite-type structure, and the latter has a hexagonal wurtzite-type structure. c-BN is the second hardest known material (the hardest is diamond), the so-called white diamond. It is used mainly for grinding and cutting industrial ferrous materials because it does not react with molten iron, nickel, and related alloys at high temperatures whereas diamond does [1]. It displays the second highest thermal conductivity (6-9 W/cm.deg) after diamond. This chapter focuses principally upon information about h-BN nanomaterials, mainly BN nanotubes (BNNTs), porous BN, mono- and few-layer-BN sheets. There are good reviews book chapters about c-BN in [1, 4-6].

  9. DESIGN AND ANALYSIS OF AN INTEGRATED PULSE MODULATED S-BAND POWER AMPLIFIER IN GALLIUM NITRIDE PROCESS

    SciTech Connect (OSTI)

    STEVE SEDLOCK

    2012-04-04T23:59:59.000Z

    The design of power amplifiers in any semi-conductor process is not a trivia exercise and it is often encountered that the simulated solution is qualitatively different than the results obtained. Phenomena such as oscillation occurring either in-band or out of band and sometimes at subharmonic intervals, continuous spectrum noticed in some frequency bands, often referred to as chaos, and jumps and hysteresis effects can all be encountered and render a design useless. All of these problems might have been identified through a more rigorous approach to stability analysis. Designing for stability is probably the one area of amplifier design that receives the least amount of attention but incurs the most catastrophic of effects if it is not performed properly. Other parameters such as gain, power output, frequency response and even matching may suitable mitigation paths. But the lack of stability in an amplifier has no mitigating path. In addition to of loss of the design completely there are the increased production cycle costs, costs involved with investigating and resolving the problem and the costs involved with schedule slips or delays resulting from it. The Linville or Rollett stability criteria that many microwave engineers follow and rely exclusively on is not sufficient by itself to ensure a stable and robust design. It will be shown that the universal belief that unconditional stability is obtained through an analysis of the scattering matrix S to determine if 1 and |{Delta}{sub S}| < 1 is only part of the procedure and other tools must be used to validate the criteria. The research shown contributes to the state of the art by developing a more thorough stability design technique for designing amplifiers of any class, whether that be current mode or switch mode, than is currently undertaken with the goal of obtaining first pass design success.

  10. Synthesis and microstructure of gallium phosphide nanowires W. S. Shi, Y. F. Zheng, N. Wang,a)

    E-Print Network [OSTI]

    Zheng, Yufeng

    Synthesis and microstructure of gallium phosphide nanowires W. S. Shi, Y. F. Zheng, N. Wang,a) C. S May 2001 Gallium phosphide GaP nanowires of 22 nm in diameter and hundreds micrometers in length were synthesized by laser ablation of a powder mixture of GaP and gallium oxide (Ga2O3 . The morphology

  11. Indium-111 labeled anti-melanoma monoclonal antibodies

    DOE Patents [OSTI]

    Srivastava, S.C.; Fawwaz, R.A.; Ferrone, S.

    1984-04-30T23:59:59.000Z

    A monoclonal antibody to a high molecular weight melanoma-associated antigen was chelated and radiolabeled with indium-111. This material shows high affinity for melanoma and thus can be used in the detection, localization and imaging of melanoma. 1 figure.

  12. INDIUM--2001 37.1 By Robert D. Brown, Jr.

    E-Print Network [OSTI]

    smelter (Platts Metals Week, 2001c). The indium is contained in the flue dust that had accumulated for more than 50 years, until the smelter's closure in 1981. Shortly after the closure, the U.S. Environmental Protection Agency (EPA), declared the former smelter a Superfund site, under a regulation

  13. Photodetectors using III-V nitrides

    DOE Patents [OSTI]

    Moustakas, T.D.

    1998-12-08T23:59:59.000Z

    A bandpass photodetector using a III-V nitride and having predetermined electrical properties is disclosed. The bandpass photodetector detects electromagnetic radiation between a lower transition wavelength and an upper transition wavelength. That detector comprises two low pass photodetectors. The response of the two low pass photodetectors is subtracted to yield a response signal. 24 figs.

  14. Boron nitride solid state neutron detector

    DOE Patents [OSTI]

    Doty, F. Patrick

    2004-04-27T23:59:59.000Z

    The present invention describes an apparatus useful for detecting neutrons, and particularly for detecting thermal neutrons, while remaining insensitive to gamma radiation. Neutrons are detected by direct measurement of current pulses produced by an interaction of the neutrons with hexagonal pyrolytic boron nitride.

  15. Nitride-bonded silicon carbide composite filter

    SciTech Connect (OSTI)

    Thomson, B.N.; DiPietro, S.G.

    1995-12-01T23:59:59.000Z

    The objective of this program is to develop and demonstrate an advanced hot gas filter, using ceramic component technology, with enhanced durability to provide increased resistance to thermal fatigue and crack propagation. The material is silicon carbide fiber reinforced nitride bonded silicon carbide.

  16. Titanium nitride electrodes for thermoelectric generators

    DOE Patents [OSTI]

    Novak, Robert F. (Farmington Hills, MI); Schmatz, Duane J. (Dearborn Heights, MI); Hunt, Thomas K. (Ann Arbor, MI)

    1987-12-22T23:59:59.000Z

    The invention is directed to a composite article suitable for use in thermoelectric generators. The article comprises a thin film of titanium nitride as an electrode deposited onto solid electrolyte. The invention is also directed to the method of making same.

  17. Silicon nitride having a high tensile strength

    DOE Patents [OSTI]

    Pujari, Vimal K. (Northboro, MA); Tracey, Dennis M. (Medfield, MA); Foley, Michael R. (Oxford, MA); Paille, Norman I. (Oxford, MA); Pelletier, Paul J. (Millbury, MA); Sales, Lenny C. (Grafton, MA); Willkens, Craig A. (Sterling, MA); Yeckley, Russell L. (Oakham, MA)

    1996-01-01T23:59:59.000Z

    A silicon nitride ceramic comprising: a) inclusions no greater than 25 microns in length, b) agglomerates no greater than 20 microns in diameter, and c) a surface finish of less than about 8 microinches, said ceramic having a four-point flexural strength of at least about 900 MPa.

  18. Photodetectors using III-V nitrides

    DOE Patents [OSTI]

    Moustakas, Theodore D. (Dover, MA)

    1998-01-01T23:59:59.000Z

    A bandpass photodetector using a III-V nitride and having predetermined electrical properties. The bandpass photodetector detects electromagnetic radiation between a lower transition wavelength and an upper transition wavelength. That detector comprises two low pass photodetectors. The response of the two low pass photodetectors is subtracted to yield a response signal.

  19. IEEE JOURNAL OF PHOTOVOLTAICS, VOL. 2, NO. 2, APRIL 2012 123 Gallium Arsenide Solar Cell Absorption

    E-Print Network [OSTI]

    Grandidier, Jonathan

    IEEE JOURNAL OF PHOTOVOLTAICS, VOL. 2, NO. 2, APRIL 2012 123 Gallium Arsenide Solar Cell Absorption--Gallium arsenide, nanospheres, photovoltaic systems, whispering gallery modes (WGMs). I. INTRODUCTION THE route as the active layer is thinned [2]. Thin-film photovoltaics offer the possibility to significantly reduce

  20. Two-photon photovoltaic effect in gallium arsenide Jeff Chiles,1

    E-Print Network [OSTI]

    Fathpour, Sasan

    Two-photon photovoltaic effect in gallium arsenide Jichi Ma,1 Jeff Chiles,1 Yagya D. Sharma,2 214669); published September 4, 2014 The two-photon photovoltaic effect is demonstrated in gallium; (230.0250) Optoelectronics; (040.5350) Photovoltaic; (130.4310) Nonlinear. http://dx.doi.org/10.1364/OL

  1. Gallium/aluminum nanocomposite material for nonlinear optics and nonlinear plasmonics

    E-Print Network [OSTI]

    Zheludev, Nikolay

    Gallium/aluminum nanocomposite material for nonlinear optics and nonlinear plasmonics A. V penetration of gallium into an aluminum film. These composite films form mirrorlike interfaces with silica optics and active plasmonics. The material is a polycrystalline aluminum film on a silica sub- strate

  2. Low-loss binder for hot pressing boron nitride

    DOE Patents [OSTI]

    Maya, Leon (Oak Ridge, TN)

    1991-01-01T23:59:59.000Z

    Borazine derivatives used as low-loss binders and precursors for making ceramic boron nitride structures. The derivative forms the same composition as the boron nitride starting material, thereby filling the voids with the same boron nitride material upon forming and hot pressing. The derivatives have a further advantage of being low in carbon thus resulting in less volatile byproduct that can result in bubble formation during pressing.

  3. Spectroscopy of vanadium (III) doped gallium lanthanum sulphide chalcogenide glass

    E-Print Network [OSTI]

    Hughes, M; Rutt, H; Hewak, D

    2014-01-01T23:59:59.000Z

    Vanadium doped gallium lanthanum sulphide glass (V:GLS) displays three absorption bands at 580, 730 and 1155 nm identified by photoluminescence excitation measurements. Broad photoluminescence, with a full width half maximum (FWHM) of 500 nm, is observed peaking at 1500 nm when exciting at 514, 808 and 1064 nm. The fluorescence lifetime and quantum efficiency at 300 K were measured to be 33.4 us and 4 % respectively. From the available spectroscopic data we propose the vanadium ions valence to be 3+ and be in tetrahedral coordination The results indicate potential for development of a laser or optical amplifier based on V:GLS.

  4. Fabrication of a gated gallium arsenide heterostructure resonant tunneling diode

    E-Print Network [OSTI]

    Kinard, William Brian

    1989-01-01T23:59:59.000Z

    , . ' 'CONTACT PAD' PLANAR I ZED POLYAM I DE RECTIFYI CONTACT N DBHS Pig. 2. f'utavvay vieiv of a gated gallium arsenide heterostructure resonant tunneling diode 1018 graded from 10 18 io" 10? (lightly doped) units=cm 8 ?graded from 10 to 18...FABRICATION OF A GATED GALLIL". tl ARSEXIDE HETEROSTRL CTL RF. RESONANT TF'XXELI'XG DIODE A Thesis bt ttrILLIAAI BRIA'. s KI'iARD Subnut ted to the Office of Graduate Studies of Texas AE;M Eniverstty tn partial fulfillment of the requirements...

  5. Vacancies in fully hydrogenated boron nitride layer: implications...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Using density functional theory, a series of calculations of structural and electronic properties of hydrogen vacancies in a fully hydrogenated boron nitride (fH-BN) layer were...

  6. aluminium nitrides: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    (more) Mutombo, Faustin Kalenda 2012-01-01 22 Carbon Nitride and Conjugated Polymer Composite Materials. Open Access Theses and Dissertations Summary: ??The semiconductor and...

  7. americium nitrides: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    heterostructure Zhang, Hongtao 2006-01-01 19 Carbon Nitride and Conjugated Polymer Composite Materials. Open Access Theses and Dissertations Summary: ??The semiconductor and...

  8. aligned carbon nitride: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    22 23 24 25 Next Page Last Page Topic Index 1 Carbon Nitride and Conjugated Polymer Composite Materials. Open Access Theses and Dissertations Summary: ??The semiconductor and...

  9. III-Nitride Nanowires: Emerging Materials for Lighting and Energy...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    building blocks in LEDs, lasers, sensors, photovoltaics, and high power and high speed electronics. Compared to planar films, III-nitride nanowires have several potential...

  10. Electrodeposition of a nickel-indium alloy from an ammonium citrate electrolyte

    SciTech Connect (OSTI)

    Vinogradov, S.N.; Perelygin, Yu.P.

    1988-05-01T23:59:59.000Z

    The possibility of the electrolytic deposition of a nickel-indium alloy from an ammonium citrate electrolyte for purposes of increasing the cathode current output was investigated. The alloy antifriction coating was deposited in a rectangular glass bath of an electrolyte containing indium in the forms of a sulfate and a hydroxocitrate complex and nickel in the forms of mixed ammonium and citrate complexes as well as in sulfate form. The dependence of indium content and current output of the alloy on current density and indium sulfate concentration in the electrolyte was determined. Polarization curves for alloy precipitation established that indium precipitated at more negative potentials than nickel. The effect of indium content on microhardness was also assessed. An optimum electrolyte composition, pH value, and current density were established.

  11. Microstructure of amorphous indium oxide and tin oxide thin films

    SciTech Connect (OSTI)

    Rauf, I.A.; Brown, L.M. (Univ. of Cambridge (United Kingdom))

    1994-03-15T23:59:59.000Z

    Indium oxide, tin oxide, and some other doped and undoped oxide semiconductors show an interesting and technologically important combination of properties. They have high luminous transparency, good electrical conductivity and high infrared reflectivity. Numerous techniques for depositing these materials have been developed and have undergone a number of changes during last two decades. An understanding of the basic physics of these materials has begun to dawn. Most of the literature on transparent conducting oxides consists of studying the dependence of the properties on the composition, preparation conditions, such as deposition rate, substrate temperature or post-deposition heat treatment. In this paper the authors have employed the transmission electron microscopy to study the microstructure of reactively evaporated, electron beam evaporated, ion-beam sputtered amorphous indium oxide and reactively evaporated amorphous tin oxide thin films. These films, which have received little attention in the past, can have enormous potential as transparent conductive coatings on heat-sensitive substrates and inexpensive solar cells.

  12. Absorption of ac fields in amorphous indium-oxide films

    SciTech Connect (OSTI)

    Ovadyahu, Z. [Racah Institute of Physics, the Hebrew University, Jerusalem 91904 (Israel)

    2014-08-20T23:59:59.000Z

    Absorption data from applied ac fields in Anderson-localized amorphous indium-oxide (In{sub x}O) films are shown to be frequency and disorder dependent. The absorption shows a roll-off at a frequency which is much lower than the electron-electron scattering rate of the material when it is in the diffusive regime. This is interpreted as evidence for discreteness of the energy spectrum of the deeply localized regime. This is consistent with recent many-body localization scenarios. As the metal-insulator transition is approached, the absorption shifts to higher frequencies. Comparing with the previously obtained results on the crystalline version of indium-oxide (In{sub 2}O{sub 3?x}) implies a considerably higher inelastic electron-phonon scattering rate in the amorphous material. The range over which the absorption versus frequency decreases may indicate that a wide distribution of localization length is a common feature in these systems.

  13. A high frequency titration of indium with benzenephosphinic acid

    E-Print Network [OSTI]

    Keilt, Francis Xavier

    1960-01-01T23:59:59.000Z

    of the titrant would not indicate any change in the conductance of the solution. Tin, titanium, zirconium, bismuth, molybdenum, uranium, tungsten, and cerium would interfere with the ti. tration of indium. TABLE OF COHTEHTS Page I? XHTRODUCTIOH... from titanium, molybdenum, tungsten, uranium, cerium, zirconium, silver, mercury, tin or bismuth by the recosaended procedure. It is quite possible that in using a high fre- quency method these elements uould not interfere. This would have...

  14. Gallium phosphide high-temperature bipolar junction transistor

    SciTech Connect (OSTI)

    Zipperian, T.E.; Dawson, L.R.; Caffin, R.J.

    1981-03-01T23:59:59.000Z

    Preliminary results are reported on the development of a high-temperature (> 350/sup 0/C) gallium phosphide bipolar junction transistor (BJT) for goethermal and other energy applications. This four-layer p/sup +/n/sup -/pp/sup +/ structure was fromed by liquid phase epitaxy using a supercooling technique to insure uniform nucleation of the thin layers. Magnesium was used as the p-type dopant to avoid excessive out-diffusion into the lightly doped base. By appropriate choice of electrodes, the device may also be driven as an n-channel junction field-effect transistor. The gallium phosphide BJT is observed to have a common-emitter current gain peaking in the range of 6 to 10 (for temperatures from 20/sup 0/C to 400/sup 0/C) and a room-temperature, punchthrough-limited, collector-emitter breakdown voltage of approximately -6V. Other parameters of interest include an f/sub/ = 400 KHz (at 20/sup 0/C) and a collector base leakage current = 200 ..mu..A (at 350/sup 0/C).

  15. Core-Shell Nanopillar Array Solar Cells using Cadmium Sulfide Coating on Indium Phosphide Nanopillars

    E-Print Network [OSTI]

    Tu, Bor-An Clayton

    2013-01-01T23:59:59.000Z

    Nanocrystalline dye-sensitized solar cell/copper indium3, pp. M. Grätzel, “Dye-sensitized solar cells,” Journal ofefficiency solar cell based on dye- sensitized colloidal

  16. Method for enhancing the solubility of boron and indium in silicon

    DOE Patents [OSTI]

    Sadigh, Babak (Oakland, CA); Lenosky, Thomas J. (Pleasanton, CA); Diaz de la Rubia, Tomas (Danville, CA); Giles, Martin (Hillsborough, OR); Caturla, Maria-Jose (Livermore, CA); Ozolins, Vidvuds (Pleasanton, CA); Asta, Mark (Evanston, IL); Theiss, Silva (St. Paul, MN); Foad, Majeed (Santa Clara, CA); Quong, Andrew (Livermore, CA)

    2002-01-01T23:59:59.000Z

    A method for enhancing the equilibrium solubility of boron and indium in silicon. The method involves first-principles quantum mechanical calculations to determine the temperature dependence of the equilibrium solubility of two important p-type dopants in silicon, namely boron and indium, under various strain conditions. The equilibrium thermodynamic solubility of size-mismatched impurities, such as boron and indium in silicon, can be raised significantly if the silicon substrate is strained appropriately. For example, for boron, a 1% compressive strain raises the equilibrium solubility by 100% at 1100.degree. C.; and for indium, a 1% tensile strain at 1100.degree. C., corresponds to an enhancement of the solubility by 200%.

  17. Emission and spectral characteristics of electrodeless indium halide lamp

    SciTech Connect (OSTI)

    Takeda, M.; Hochi, A.; Horii, S.; Matsuoka, T. [Matsushita Electric Industrial Co., Ltd., Kyoto (Japan). Lighting Research Lab.

    1997-12-31T23:59:59.000Z

    The electrodeless HID lamp excited by microwave has been intensively investigated because of its long life, high efficacy and environmental aspect. This study reports excellent emission and spectral characteristics of electrodeless HID lamp containing indium halides. The authors investigate InI and InBr as ingredients, and measure the microwave excited spectra and luminous intensities of lamps which are made from spherical silica glass in 10--40 mm outer diameter and with various amounts of halides. It is well known that such indium halides in the usual metal-halide lamps have strong blue line emission at 410 and 451nm. But, in the authors` microwave excited lamps, continuous spectrum can be observed in addition in the visible region. Increasing input of power of microwave makes this continuous spectrum stronger. Below 1kW microwave input power, the spectrum of InBr lamp almost resembled the CIE standard illuminant D65. As a consequence of the spectrum, they found that the color rendering and the duv of InBr lamp were excellent as high as 95 and smaller than 0.002, respectively, in the region of 400--800W input power. The efficacy higher than 100 lm/W was further achieved at 400W. The authors confirm that the microwave excited indium halides lamps can be applicable to many fields of lighting.

  18. Nitrided Metallic Bipolar Plates M.P. Brady (project lead)

    E-Print Network [OSTI]

    Nitrided Metallic Bipolar Plates M.P. Brady (project lead) P. F. Tortorelli Oak Ridge National - $2480 K · ORNL (Lead) · Allegheny Ludlum · Funding for Year 2 · Arizona State University - $2050 K wt.% ­ pre-oxidation key to protective surface nitride formation ­ V segregation into Cr-oxide makes

  19. Dual Templating Synthesis of Mesoporous Titanium Nitride Microspheres

    E-Print Network [OSTI]

    Suslick, Kenneth S.

    Dual Templating Synthesis of Mesoporous Titanium Nitride Microspheres By Jin Ho Bang and Kenneth S pyrolysis (USP) preparation of hierarchically nanostructured titanium nitride (TiN) using an in situ dual as a nitrogen source.[5b,7] Several attempts have been made toward the preparation of nanostructured TiN,[5a,6a

  20. Isothermal nitridation kinetics of TiSi{sub 2} powders

    SciTech Connect (OSTI)

    Roger, J., E-mail: roger@lcts.u-bordeaux1.fr; Maillé, L.; Dourges, M.A.

    2014-04-01T23:59:59.000Z

    The aim of the present work is to determine the kinetics of reaction between TiSi{sub 2} powder and gaseous nitrogen. Isothermal nitridation of TiSi{sub 2} powders with fine (1.4 µm) and medium (4.5 µm) particle size has been studied in pure nitrogen atmosphere from 1000 to 1200 °C for duration up to 50 h. The isothermal nitridation kinetics of TiSi{sub 2} powders were investigated by thermogravimetry. The nitridation rate strongly depends on the particle size and temperature. Smaller size particle exhibits higher nitridation rate due to its larger surface area. The conversion process is complex with nucleation and growth of TiN at the surface of the grain and Si{sub 3}N{sub 4} inside the grain promoted by the Kirkendall effect with an influence of the volume increase. - Graphical abstract: Backscattered electrons image of a transverse TiSi{sub 2} grain nitrurated at 1100 °C for 50 h. - Highlights: • Influence of grain size on TiSi{sub 2} powder nitridation. • Influence of temperature on TiSi{sub 2} powder nitridation. • Experimental measurements of the nitridation kinetics. • An explanation of the nitridation mechanism.

  1. Oxidation Protection of Uranium Nitride Fuel using Liquid Phase Sintering

    SciTech Connect (OSTI)

    Dr. Paul A. Lessing

    2012-03-01T23:59:59.000Z

    Two methods are proposed to increase the oxidation resistance of uranium nitride (UN) nuclear fuel. These paths are: (1) Addition of USi{sub x} (e.g. U3Si2) to UN nitride powder, followed by liquid phase sintering, and (2) 'alloying' UN nitride with various compounds (followed by densification via Spark Plasma Sintering or Liquid Phase Sintering) that will greatly increase oxidation resistance. The advantages (high thermal conductivity, very high melting point, and high density) of nitride fuel have long been recognized. The sodium cooled BR-10 reactor in Russia operated for 18 years on uranium nitride fuel (UN was used as the driver fuel for two core loads). However, the potential advantages (large power up-grade, increased cycle lengths, possible high burn-ups) as a Light Water Reactor (LWR) fuel are offset by uranium nitride's extremely low oxidation resistance (UN powders oxidize in air and UN pellets decompose in hot water). Innovative research is proposed to solve this problem and thereby provide an accident tolerant LWR fuel that would resist water leaks and high temperature steam oxidation/spalling during an accident. It is proposed that we investigate two methods to increase the oxidation resistance of UN: (1) Addition of USi{sub x} (e.g. U{sub 3}Si{sub 2}) to UN nitride powder, followed by liquid phase sintering, and (2) 'alloying' UN nitride with compounds (followed by densification via Spark Plasma Sintering) that will greatly increase oxidation resistance.

  2. Process for producing ceramic nitrides anc carbonitrides and their precursors

    DOE Patents [OSTI]

    Brown, G.M.; Maya, L.

    1987-02-25T23:59:59.000Z

    A process for preparing ceramic nitrides and carbon nitrides in the form of very pure, fine particulate powder. Appropriate precursors is prepared by reaching a transition metal alkylamide with ammonia to produce a mixture of metal amide and metal imide in the form of an easily pyrolyzable precipitate.

  3. Specific interaction of fluoride ions with aluminum and gallium solvates in an ethylene glycol solutions

    SciTech Connect (OSTI)

    Petrosyants, S.P.; Tsabel', E.R.; Buslaev, Yu.A.

    1986-01-01T23:59:59.000Z

    The interaction of aluminum chloride and gallium chloride with KF in ethylene glycol solutions with F:M/sup 3 +/ mole ratios approximately equal to 2 includes a step involving the formation of fluorine-containing species, in which the fluoride ions are held in the outer sphere of ethylene glycol solvates of aluminum and gallium. Complexes based on hexacoordinate solvates predominate in the solutions of aluminum, while in the case of gallium, in contrast to aluminum, the coexistence of tetra- and hexacoordinate complexes is characteristic. The configurational equilibrium in the solutions of gallium is one of the causes of the structurization of the solutions, i.e., polymerization due to the formation of H bonds between the fluoride ions and the coordinated ethylene glycol molecules.

  4. First Results of the Testing of the Liquid Gallium Jet Limiter Concept for ISTTOK

    SciTech Connect (OSTI)

    Gomes, R. B.; Fernandes, H.; Silva, C.; Borba, D.; Carvalho, B.; Varandas, C. [Associacao EURATOM/IST, Centro de FuSao Nuclear, Av. Rovisco Pais, 1049-001 Lisbon (Portugal); Lielausis, O.; Klyukin, A.; Platacis, E.; Mikelsons, A.; Platnieks, I. [Association EURATOM/University of Latvia, Institute of Physics, 32 Miera Str., Salaspils, LV-2169 (Latvia)

    2006-12-04T23:59:59.000Z

    The use of liquid metals as plasma facing components in tokamaks has recently experienced a renewed interest stimulated by their advantages to the development of a fusion reactor. Liquid metals have been proposed to solve problems related to the erosion and neutronic activation of solid walls submitted to high power loads allowing an efficient heat exhaustion from fusion devices. Presently the most promising materials are Lithium and Gallium. ISTTOK, a small size tokamak, will be used to test the behavior of a liquid Gallium jet in the vacuum chamber and its influence on the plasma. This paper presents a description of the conceived setup as well as experimental results. The liquid Gallium jet is generated by hydrostatic pressure and injected in a radial position close to a moveable stainless steel limiter. Both the jet and the limiter positions are variable allowing for a controlled exposure of the liquid Gallium to the edge plasma. The main components of the Gallium loop are a MHD pump, the liquid metal injector and a filtering system. The MHD pump is of the induction type, based on rotating permanent magnets. The injector is build from a stainless steel pipe ended by a shaping nozzle. A setup has been developed to introduce oxide-free Gallium inside the loop's main supply tank. Raw liquid metal is placed inside a chamber heated and degassed under high vacuum while clean Gallium is extracted from the main body of the liquefied metal. Prior to installation on the tokamak, the experimental rig has been implemented using a Pyrex tube as test chamber to investigate the stability of the Gallium jet and its break-up length for several nozzle sizes. Results are presented in this paper. This rig was also useful to assess the behavior of the overall implemented apparatus.

  5. High-Temperature Decomposition of Brønsted Acid Sites in Gallium-Substituted Zeolites

    SciTech Connect (OSTI)

    K Al-majnouni; N Hould; W Lonergan; D Vlachos; R Lobo

    2011-12-31T23:59:59.000Z

    The dehydroxylation of Broensted acid sites (BAS) in Ga-substituted zeolites was investigated at temperatures up to 850 C using X-ray absorption spectroscopy (XAS), Fourier transform infrared spectroscopy (FTIR), and mass spectrometry-temperature programmed desorption (MS-TPD). X-ray absorption near-edge spectroscopy (XANES) revealed that the majority of gallium has tetrahedral coordination even after complete dehydroxylation. The interatomic gallium-oxygen distance and gallium coordination number determined by extended X-ray absorption fine structure (EXAFS) are consistent with gallium in tetrahedral coordination at low T (< 550 C). Upon heating Ga-Beta and Ga-ZSM5 to 850 C, analysis of the EXAFS showed that 70 and 80% of the gallium was still in tetrahedral coordination. The remainder of the gallium was found to be in octahedral coordination. No trigonal Ga atoms were observed. FTIR measurements carried out at similar temperatures show that the intensity of the OH vibration due to BAS has been eliminated. MS-TPD revealed that hydrogen in addition to water evolved from the samples during dehydroxylation. This shows that dehydrogenation in addition to dehydration is a mechanism that contributes to BAS decomposition. Dehydrogenation was further confirmed by exposing the sample to hydrogen to regenerate some of the BAS as monitored by FTIR and MS-TPD.

  6. Study of liquid gallium at high pressure using synchrotron x-ray

    SciTech Connect (OSTI)

    Yu, Tony; Guo Quanzhong; Parise, John [Department of Geosciences, Mineral Physics Institute, Stony Brook University, Stony Brook, New York 11794-2100 (United States); Chen Jiuhua [Department of Geosciences, Mineral Physics Institute, Stony Brook University, Stony Brook, New York 11794-2100 (United States); Department of Mechanical and Materials Engineering, Center for the Study of Matters at Extreme Conditions, Florida International University, Miami, Florida 33199 (United States); Ehm, Lars [Department of Geosciences, Mineral Physics Institute, Stony Brook University, Stony Brook, New York 11794-2100 (United States); National Synchrotron Light Source, Brookhaven National Laboratory, Upton, New York 11973-5000 (United States); Huang Shu [Department of Mechanical and Materials Engineering, Center for the Study of Matters at Extreme Conditions, Florida International University, Miami, Florida 33199 (United States); Luo Shengnian [Physics Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

    2012-06-01T23:59:59.000Z

    Liquid gallium has been studied at high pressure up to 2 GPa and ambient temperature in a diamond anvil cell using high energy synchrotron x-ray beam. The total x-ray scattering data of liquid gallium were collected up to Q = 12 A{sup -1} and analyzed using pair distribution functions (PDF). The results indicate that the first nearest neighbor peak and second nearest neighbor (shoulder) peak of PDF in liquid gallium does not change with pressure, whereas the higher order (i.e., third and fourth) nearest neighbor peaks shift towards shorter distance with increasing pressure. Reverse Monte Carlo modeling based on the observed data shows that the coordination number in the liquid gallium increases with pressure from 10.5 at 0.3 GPa to 11.6 at 2 GPa. An atomic arrangement similar to the crystalline phase of Ga(II) with coordination number of 12 is proposed for the locally dense-packed rigid unit in liquid gallium. The volume compression data derived from the structure modeling yield a bulk modulus of 12.1(6) GPa for liquid gallium.

  7. Patterning of indium tin oxide by projection photoablation and lift-off process for fabrication of flat-panel displays

    E-Print Network [OSTI]

    Jain, Kanti

    Patterning of indium tin oxide by projection photoablation and lift-off process for fabrication online 25 June 2007 Indium tin oxide ITO , an important material used as a transparent conductive oxide in such fabrication. Therefore, innovations in patterning tech- nology, especially for materials such as indium tin

  8. The Electrical and Band-Gap Properties of Amorphous Zinc-Indium-Tin Oxide Thin Films

    E-Print Network [OSTI]

    Shahriar, Selim

    MRSEC The Electrical and Band-Gap Properties of Amorphous Zinc-Indium-Tin Oxide Thin Films D Science & Engineering Center For zinc-indium-tin oxide (ZITO) films, grown by pulsed-laser deposition was replaced by substitution with zinc and tin in equal molar proportions (co-substitution). All ZITO films

  9. Study of Magnetohydrodynamic Surface Waves on Liquid Gallium

    SciTech Connect (OSTI)

    Hantao Ji; William Fox; David Pace; H.L. Rappaport

    2004-05-13T23:59:59.000Z

    Magnetohydrodynamic (MHD) surface waves on liquid gallium are studied theoretically and experimentally in the small magnetic Reynolds number limit. A linear dispersion relation is derived when a horizontal magnetic field and a horizontal electric current is imposed. No wave damping is found in the shallow liquid limit while waves always damp in the deep liquid limit with a magnetic field parallel to the propagation direction. When the magnetic field is weak, waves are weakly damped and the real part of the dispersion is unaffected, while in the opposite limit waves are strongly damped with shortened wavelengths. In a table-top experiment, planar MHD surface waves on liquid gallium are studied in detail in the regime of weak magnetic field and deep liquid. A non-invasive diagnostic accurately measures surface waves at multiple locations by reflecting an array of lasers off the surface onto a screen, which is recorded by an Intensified-CCD camera. The measured dispersion relation is consistent with the linear theory with a reduced surface tension likely due to surface oxidation. In excellent agreement with linear theory, it is observed that surface waves are damped only when a horizontal magnetic field is imposed parallel to the propagation direction. No damping is observed under a perpendicular magnetic field. The existence of strong wave damping even without magnetic field suggests the importance of the surface oxide layer. Implications to the liquid metal wall concept in fusion reactors, especially on the wave damping and a Rayleigh-Taylor instability when the Lorentz force is used to support liquid metal layer against gravity, are discussed.

  10. Nanowire-templated lateral epitaxial growth of non-polar group III nitrides

    DOE Patents [OSTI]

    Wang, George T. (Albuquerque, NM); Li, Qiming (Albuquerque, NM); Creighton, J. Randall (Albuquerque, NM)

    2010-03-02T23:59:59.000Z

    A method for growing high quality, nonpolar Group III nitrides using lateral growth from Group III nitride nanowires. The method of nanowire-templated lateral epitaxial growth (NTLEG) employs crystallographically aligned, substantially vertical Group III nitride nanowire arrays grown by metal-catalyzed metal-organic chemical vapor deposition (MOCVD) as templates for the lateral growth and coalescence of virtually crack-free Group III nitride films. This method requires no patterning or separate nitride growth step.

  11. Hard and low friction nitride coatings and methods for forming the same

    DOE Patents [OSTI]

    Erdemir, Ali (Naperville, IL); Urgen, Mustafa (Istanbul, TR); Cakir, Ali Fuat (Istanbul, TR); Eryilmaz, Osman Levent (Bolingbrook, IL); Kazmanli, Kursat (Istanbul, TR); Keles, Ozgul (Istanbul, TR)

    2007-05-01T23:59:59.000Z

    An improved coating material possessing super-hard and low friction properties and a method for forming the same. The improved coating material includes the use of a noble metal or soft metal homogeneously distributed within a hard nitride material. The addition of small amounts of such metals into nitrides such as molybdenum nitride, titanium nitride, and chromium nitride results in as much as increasing of the hardness of the material as well as decreasing the friction coefficient and increasing the oxidation resistance.

  12. Improved superconducting qubit coherence using titanium nitride

    E-Print Network [OSTI]

    J. Chang; M. R. Vissers; A. D. Corcoles; M. Sandberg; J. Gao; David W. Abraham; Jerry M. Chow; Jay M. Gambetta; M. B. Rothwell; G. A. Keefe; Matthias Steffen; D. P. Pappas

    2013-03-17T23:59:59.000Z

    We demonstrate enhanced relaxation and dephasing times of transmon qubits, up to ~ 60 \\mu s by fabricating the interdigitated shunting capacitors using titanium nitride (TiN). Compared to lift-off aluminum deposited simultaneously with the Josephson junction, this represents as much as a six-fold improvement and provides evidence that previous planar transmon coherence times are limited by surface losses from two-level system (TLS) defects residing at or near interfaces. Concurrently, we observe an anomalous temperature dependent frequency shift of TiN resonators which is inconsistent with the predicted TLS model.

  13. Thermal neutron flux perturbation due to indium foils in water

    E-Print Network [OSTI]

    Stinson, Ronald Calvin

    1961-01-01T23:59:59.000Z

    of MASTER OF SCIENCE August, i 96I Major Subject: Nuclear Engineering THERMAL NEUTRON FLUX PERTURBATION DUE TO INDIUM FOILS IN WATER A Thesis by Ronald C. Stinson, Jr. Approved as to style and content by: Chai man of Committee Head of Department.... 2. Tittle, C. N. , Nucleonics 8, (6), 5 (1951); Ibid 9 (1), 60 (1951). 3. Skyrme, T, H. R. , "Reduction in Neutron Density Caused by an Absorbing Disc. " MS-91 (N. D. ) 4. Dalton, G. R. and Osborn, R. K. , Nuclear Science and En ineerin 9, 19...

  14. Synthesis, Crystal Structure, and Elastic Properties of Novel Tungsten Nitrides

    SciTech Connect (OSTI)

    Wang, Shanmin; Yu, Xiaohui; Lin, Zhijun; Zhang, Ruifeng; He, Duanwei; Qin, Jiaqian; Zhu, Jinlong; Han, Jiantao; Wang, Lin; Mao, Ho-kwang; Zhang, Jianzhong; Zhao, Yusheng (UNLV); (Ehime U); (CIW); (Sichuan U.); (LANL)

    2012-12-13T23:59:59.000Z

    Among transition metal nitrides, tungsten nitrides possess unique and/or superior chemical, mechanical, and thermal properties. Preparation of these nitrides, however, is challenging because the incorporation of nitrogen into tungsten lattice is thermodynamically unfavorable at atmospheric pressure. To date, most materials in the W-N system are in the form of thin films produced by nonequilibrium processes and are often poorly crystallized, which severely limits their use in diverse technological applications. Here we report synthesis of tungsten nitrides through new approaches involving solid-state ion exchange and nitrogen degassing under pressure. We unveil a number of novel nitrides including hexagonal and rhombohedral W{sub 2}N{sub 3}. The final products are phase-pure and well-crystallized in bulk forms. For hexagonal W{sub 2}N{sub 3}, hexagonal WN, and cubic W3N4, they exhibit elastic properties rivaling or even exceeding cubic-BN. All four nitrides are prepared at a moderate pressure of 5 GPa, the lowest among high-pressure synthesis of transition metal nitrides, making it practically feasible for massive and industrial-scale production.

  15. Silicon nitride protective coatings for silvered glass mirrors

    DOE Patents [OSTI]

    Tracy, C. Edwin (Golden, CO); Benson, David K. (Golden, CO)

    1988-01-01T23:59:59.000Z

    A protective diffusion barrier for metalized mirror structures is provided by a layer or coating of silicon nitride which is a very dense, transparent, dielectric material that is impervious to water, alkali, and other impurities and corrosive substances that typically attack the metal layers of mirrors and cause degradation of the mirrors' reflectivity. The silicon nitride layer can be deposited on the substrate before metal deposition to stabilize the metal/substrate interface, and it can be deposited over the metal to encapsulate it and protect the metal from corrosion or other degradation. Mirrors coated with silicon nitride according to this invention can also be used as front surface mirrors.

  16. High efficiency III-nitride light-emitting diodes

    DOE Patents [OSTI]

    Crawford, Mary; Koleske, Daniel; Cho, Jaehee; Zhu, Di; Noemaun, Ahmed; Schubert, Martin F; Schubert, E. Fred

    2013-05-28T23:59:59.000Z

    Tailored doping of barrier layers enables balancing of the radiative recombination among the multiple-quantum-wells in III-Nitride light-emitting diodes. This tailored doping enables more symmetric carrier transport and uniform carrier distribution which help to reduce electron leakage and thus reduce the efficiency droop in high-power III-Nitride LEDs. Mitigation of the efficiency droop in III-Nitride LEDs may enable the pervasive market penetration of solid-state-lighting technologies in high-power lighting and illumination.

  17. Silicon nitride protective coatings for silvered glass mirrors

    DOE Patents [OSTI]

    Tracy, C.E.; Benson, D.K.

    1984-07-20T23:59:59.000Z

    A protective diffusion barrier for metalized mirror structures is provided by a layer or coating of silicon nitride which is a very dense, transparent, dielectric material that is impervious to water, alkali, and other impurities and corrosive substances that typically attack the metal layers of mirrors and cause degradation of the mirrors' reflectivity. The silicon nitride layer can be deposited on the substrate prior to metal deposition thereon to stabilize the metal/substrate interface, and it can be deposited over the metal to encapsulate it and protect the metal from corrosion or other degradation. Mirrors coated with silicon nitride according to this invention can also be used as front surface mirrors.

  18. Conductive and robust nitride buffer layers on biaxially textured substrates

    DOE Patents [OSTI]

    Sankar, Sambasivan [Chicago, IL; Goyal, Amit [Knoxville, TN; Barnett, Scott A [Evanston, IL; Kim, Ilwon [Skokie, IL; Kroeger, Donald M [Knoxville, TN

    2009-03-31T23:59:59.000Z

    The present invention relates to epitaxial, electrically conducting and mechanically robust, cubic nitride buffer layers deposited epitaxially on biaxially textured substrates such as metals and alloys. The invention comprises of a biaxially textured substrate with epitaxial layers of nitrides. The invention also discloses a method to form such epitaxial layers using a high rate deposition method as well as without the use of forming gases. The invention further comprises epitaxial layers of oxides on the biaxially textured nitride layer. In some embodiments the article further comprises electromagnetic devices which may have superconducting properties.

  19. By Deborah A. Kramer No primary gallium was produced in the United States in consumption were adjusted to reflect full industry coverage.

    E-Print Network [OSTI]

    that it would reopen its 50-ton-per-year gallium recovery facility in Pinjarra, Western Australia, in 1996

  20. Iron-Nitride Alloy Magnets: Transformation Enabled Nitride Magnets Absent Rare Earths (TEN Mare)

    SciTech Connect (OSTI)

    None

    2012-01-01T23:59:59.000Z

    REACT Project: Case Western is developing a highly magnetic iron-nitride alloy to use in the magnets that power electric motors found in EVs and renewable power generators. This would reduce the overall price of the motor by eliminating the expensive imported rare earth minerals typically found in today’s best commercial magnets. The iron-nitride powder is sourced from abundant and inexpensive materials found in the U.S. The ultimate goal of this project is to demonstrate this new magnet system, which contains no rare earths, in a prototype electric motor. This could significantly reduce the amount of greenhouse gases emitted in the U.S. each year by encouraging the use of clean alternatives to oil and coal.

  1. (Data in kilograms of gallium content, unless otherwise noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 1997. Two companies in

    E-Print Network [OSTI]

    and Use: No domestic primary gallium recovery was reported in 1997. Two companies in Oklahoma and Utah in optoelectronic devices, which include light-emitting diodes (LED's), laser diodes, photodetectors, and solar-than-expected increase in demand. The company planned to operate its refineries in France and Germany using stockpiled

  2. (Data in kilograms of gallium content, unless otherwise noted) Domestic Production and Use: No domestic primary gallium recovery was reported in 1999. Two companies in

    E-Print Network [OSTI]

    and Use: No domestic primary gallium recovery was reported in 1999. Two companies in Oklahoma and Utah in optoelectronic devices, which include light-emitting diodes (LED's), laser diodes, photodetectors, and solar in July. The additional facility was expected to double the company's refinery capacity to 100

  3. Indium-Gallium Segregation in CuIn$_{x}$Ga$_{1-x}$Se$_2$: An ab initio based Monte Carlo Study

    E-Print Network [OSTI]

    Ludwig, Christian D R; Felser, Claudia; Schilling, Tanja; Windeln, Johannes; Kratzer, Peter

    2010-01-01T23:59:59.000Z

    Thin-film solar cells with CuIn$_x$Ga$_{1-x}$Se$_2$ (CIGS) absorber are still far below their efficiency limit, although lab cells reach already 19.9%. One important aspect is the homogeneity of the alloy. Large-scale simulations combining Monte Carlo and density functional calculations show that two phases coexist in thermal equilibrium below room temperature. Only at higher temperatures, CIGS becomes more and more a homogeneous alloy. A larger degree of inhomogeneity for Ga-rich CIGS persists over a wide temperature range, which may contribute to the low observed efficiency of Ga-rich CIGS solar cells.

  4. Exploration of Novel Reaction Pathway for Formation of Copper Indium Gallium Diselenide: Cooperative Research and Development Final Report, CRADA Number CRD-03-121

    SciTech Connect (OSTI)

    van Hest, M.

    2014-11-01T23:59:59.000Z

    The investigation will explore a potentially low-cost method of forming CIGS for use in solar cells. Investigators from HelioVolt will work in NREL laboratories to modify and apply our tools in fabrication of the CIGS layer. Investigators from NREL will assist in preparing substrates and in compleing solar cells composed of these CIGS layers to evaluate the effectiveness of the HelioVolt processes.

  5. A thermalization energy analysis of the threshold voltage shift in amorphous indium gallium zinc oxide thin film transistors under simultaneous negative gate bias and illumination

    E-Print Network [OSTI]

    Flewitt, Andrew J.; Powell, M.J.

    2014-01-01T23:59:59.000Z

    of the display industry as it moves from liquid crystal to organic light emitting diode technology and with requirements for larger areas and higher resolutions. A number of alternative material systems to a-Si:H have emerged, including organic semiconductors...

  6. Reactive DC magnetron sputtering of ultrathin superconducting niobium nitride films

    E-Print Network [OSTI]

    Dane, Andrew E. (Andrew Edward)

    2015-01-01T23:59:59.000Z

    DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber ...

  7. NOVEL SALTS OF GRAPHITE AND A BORON NITRIDE SALT

    E-Print Network [OSTI]

    Bartlett, Neil

    2011-01-01T23:59:59.000Z

    ~ i\\f'{y AND DOCUMENTS SECTION NOVEL SALTS OF GRAPHITE ANDA BORON NITRIDE SALT Neil Bartlett, R. N. Biagioni, B. W.privately owned rights. Novel Salts of Graphite and a Boron

  8. argon nitrides: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    crystals of these nitrides are potentially (more) Du, Li 2011-01-01 8 The Argon Dark Matter Experiment HEP - Experiment (arXiv) Summary: The ArDM experiment, a 1 ton liquid argon...

  9. aluminum nitride insulator: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    K-r grown by a modified Bridgman tech- nique,r6 Rollins, Andrew M. 27 Low-voltage organic thin film transistors with hydrophobic aluminum nitride film as gate insulator Materials...

  10. Single-layer graphene on silicon nitride micromembrane resonators

    E-Print Network [OSTI]

    Schmid, Silvan

    Due to their low mass, high quality factor, and good optical properties, silicon nitride (SiN) micromembrane resonators are widely used in force and mass sensing applications, particularly in optomechanics. The metallization ...

  11. Apparatus for the production of boron nitride nanotubes

    SciTech Connect (OSTI)

    Smith, Michael W; Jordan, Kevin

    2014-06-17T23:59:59.000Z

    An apparatus for the large scale production of boron nitride nanotubes comprising; a pressure chamber containing; a continuously fed boron containing target; a source of thermal energy preferably a focused laser beam; a cooled condenser; a source of pressurized nitrogen gas; and a mechanism for extracting boron nitride nanotubes that are condensed on or in the area of the cooled condenser from the pressure chamber.

  12. Multi-length Scale Modeling of Titanium Nitride Coatings

    E-Print Network [OSTI]

    Grujicic, Mica

    Multi-length Scale Modeling of Titanium Nitride Coatings M. Grujicic and S. G. LaiM. Grujicic and S Conservation Circumferential Momentum Conservation Thermal Energy Balance Species Continuity Dependent of Titanium Nitride Surface Species TiCl4(S): NH2(S): TiCl2(S): NH(S): TiCl(S): N(S): Ti (S): N*(S): Ti*(S): N

  13. The design, construction, and testing of a nuclear fuel rod thermal simulation system to study gallium/Zircaloy interactions

    E-Print Network [OSTI]

    Allison, Christopher Curtis

    1999-01-01T23:59:59.000Z

    The presence of gallium in weapons grade plutonium has raised many questions concerning its use in light water reactor (LWR) fuel rods. The biggest concern is that the gallium will migrate down the thermal gradient in the fuel rod and deposit...

  14. Method for restoring the resistance of indium oxide semiconductors after heating while in sealed structures

    DOE Patents [OSTI]

    Seager, C.H.; Evans, J.T. Jr.

    1998-11-24T23:59:59.000Z

    A method is described for counteracting increases in resistivity encountered when Indium Oxide resistive layers are subjected to high temperature annealing steps during semiconductor device fabrication. The method utilizes a recovery annealing step which returns the Indium Oxide layer to its original resistivity after a high temperature annealing step has caused the resistivity to increase. The recovery anneal comprises heating the resistive layer to a temperature between 100 C and 300 C for a period of time that depends on the annealing temperature. The recovery is observed even when the Indium Oxide layer is sealed under a dielectric layer. 1 fig.

  15. Method for restoring the resistance of indium oxide semiconductors after heating while in sealed structures

    DOE Patents [OSTI]

    Seager, Carleton H. (1304 Onava Ct., NE., Albuquerque, NM 87112); Evans, Jr., Joseph Tate (13609 Verbena Pl., NE., Albuquerque, NM 87112)

    1998-01-01T23:59:59.000Z

    A method for counteracting increases in resistivity encountered when Indium Oxide resistive layers are subjected to high temperature annealing steps during semiconductor device fabrication. The method utilizes a recovery annealing step which returns the Indium Oxide layer to its original resistivity after a high temperature annealing step has caused the resistivity to increase. The recovery anneal comprises heating the resistive layer to a temperature between 100.degree. C. and 300.degree. C. for a period of time that depends on the annealing temperature. The recovery is observed even when the Indium Oxide layer is sealed under a dielectric layer.

  16. Process for preparing titanium nitride powder

    DOE Patents [OSTI]

    Bamberger, C.E.

    1988-06-17T23:59:59.000Z

    A process for making titanium nitride powder by reaction of titanium phosphates with sodium cyanide. The process of this invention may comprise mixing one or more phosphates of Ti with a cyanide salt in the absence of oxygen and heating to a temperature sufficient to cause reaction to occur. In the preferred embodiment the ratio of cyanide salt to Ti should be at least 2 which results in the major Ti-containing product being TiN rather than sodium titanium phosphate byproducts. The process is an improvement over prior processes since the byproducts are water soluble salts of sodium which can easily be removed from the preferred TiN product by washing. 2 tabs.

  17. A boron nitride nanotube peapod thermal rectifier

    SciTech Connect (OSTI)

    Loh, G. C., E-mail: jgloh@mtu.edu [Department of Physics, Michigan Technological University, Houghton, Michigan 49931 (United States); Institute of High Performance Computing, 1 Fusionopolis Way, #16-16 Connexis, Singapore 138632 (Singapore); Baillargeat, D. [CNRS-International-NTU-Thales Research Alliance (CINTRA), 50 Nanyang Drive, Singapore 637553 (Singapore)

    2014-06-28T23:59:59.000Z

    The precise guidance of heat from one specific location to another is paramount in many industrial and commercial applications, including thermal management and thermoelectric generation. One of the cardinal requirements is a preferential conduction of thermal energy, also known as thermal rectification, in the materials. This study introduces a novel nanomaterial for rectifying heat—the boron nitride nanotube peapod thermal rectifier. Classical non-equilibrium molecular dynamics simulations are performed on this nanomaterial, and interestingly, the strength of the rectification phenomenon is dissimilar at different operating temperatures. This is due to the contingence of the thermal flux on the conductance at the localized region around the scatterer, which varies with temperature. The rectification performance of the peapod rectifier is inherently dependent on its asymmetry. Last but not least, the favourable rectifying direction in the nanomaterial is established.

  18. Method for silicon nitride precursor solids recovery

    DOE Patents [OSTI]

    Crosbie, Gary M. (Dearborn, MI); Predmesky, Ronald L. (Livonia, MI); Nicholson, John M. (Wayne, MI)

    1992-12-15T23:59:59.000Z

    Method and apparatus are provided for collecting reaction product solids entrained in a gaseous outflow from a reaction situs, wherein the gaseous outflow includes a condensable vapor. A condensate is formed of the condensable vapor on static mixer surfaces within a static mixer heat exchanger. The entrained reaction product solids are captured in the condensate which can be collected for further processing, such as return to the reaction situs. In production of silicon imide, optionally integrated into a production process for making silicon nitride caramic, wherein reactant feed gas comprising silicon halide and substantially inert carrier gas is reacted with liquid ammonia in a reaction vessel, silicon imide reaction product solids entrained in a gaseous outflow comprising residual carrier gas and vaporized ammonia can be captured by forming a condensate of the ammonia vapor on static mixer surfaces of a static mixer heat exchanger.

  19. Apparatus for silicon nitride precursor solids recovery

    DOE Patents [OSTI]

    Crosbie, Gary M. (Dearborn, MI); Predmesky, Ronald L. (Livonia, MI); Nicholson, John M. (Wayne, MI)

    1995-04-04T23:59:59.000Z

    Method and apparatus are provided for collecting reaction product solids entrained in a gaseous outflow from a reaction situs, wherein the gaseous outflow includes a condensable vapor. A condensate is formed of the condensable vapor on static mixer surfaces within a static mixer heat exchanger. The entrained reaction product solids are captured in the condensate which can be collected for further processing, such as return to the reaction situs. In production of silicon imide, optionally integrated into a production process for making silicon nitride caramic, wherein reactant feed gas comprising silicon halide and substantially inert carrier gas is reacted with liquid ammonia in a reaction vessel, silicon imide reaction product solids entrained in a gaseous outflow comprising residual carrier gas and vaporized ammonia can be captured by forming a condensate of the ammonia vapor on static mixer surfaces of a static mixer heat exchanger.

  20. Electron backscatter diffraction of plutonium-gallium alloys

    SciTech Connect (OSTI)

    Boehlert, C. J. (Carl J.); Zocco, T. G. (Thomas G.); Schulze, R. K. (Roland K.); Mitchell, J. N. (Jeremy N.); Pereyra, R. A. (Ramiro A.)

    2002-01-01T23:59:59.000Z

    At Los Alamos National Laboratory a recent experimental technique has been developed to characterize reactive metals, including plutonium arid cerium, using electron backscatter diffraction (EBSD). Microstructural characterization of plutonium and its alloys by EBSD had been previously elusive primarily because of the extreme toxicity and rapid surface oxidation rate associated with plutonium metal. The experimental techniques, which included ion-sputtering the metal surface using a scanning auger microprobe (SAM) followed by vacuum transfer of the sample from the SAM to the scanning electron microscope (SEM), used to obtain electron backscatter diffraction Kikuchi patterns (EBSPs) and orientation maps for plutonium-gallium alloys are described and the initial microstructural observations based on the analysis are discussed. Combining the SEM and EBSD observations, the phase transformation behavior between the {delta} and {var_epsilon} structures was explained. This demonstrated sample preparation and characterization technique is expected to be a powerful means to further understand phase transformation behavior, orientation relationships, and texlure in the complicated plutonium alloy systems.

  1. Crystal chemistry and self-lubricating properties of monochalcogenides gallium selenide and tin selenide

    SciTech Connect (OSTI)

    Erdemir, A.

    1993-02-01T23:59:59.000Z

    This paper describes the fundamentals of the crystal chemistry and self-lubricating mechanisms of two monochalcogenides; tin selenide and gallium selenide. Specifically, it enumerates their inter-atomic array and bond structure in crystalline states, and correlates this fundamental knowledge with their self-lubricating capacity. Friction tests assessing the self-lubricating performance of gallium and tin selenides were carried out on a pin-on-disk machine. Specifically, large crystalline pieces of gallium selenide and tin selenide were cut and cleaved into flat squares and subsequently rubbed against the sapphire balls. In another case, the fine powders (particle size {approx} 50--100 {mu}m) of gallium selenide and tin selenide were manually fed into the sliding interfaces of 440C pins and 440C disks. For the specific test conditions explored, it was found that the friction coefficients of the sapphire/gallium selenide and sapphire/tin selenide pairs were {approx} 0.23 and {approx} 0.35, respectively. The friction coefficients of 440C pin/440C disk test pairs with gallium selenide and tin selenide powders were on the orders of {approx} 0.22 and {approx} 0.38, respectively. For comparison, a number of parallel friction tests were performed with MoS{sub 2} powders and compacts and the results of these tests were also reported. The friction data together with the crystal-chemical knowledge and the electron microscopic evidence supported the conclusion that the lubricity and self-lubricating mechanisms of these solids are closely related to their crystal chemistry and the nature of interlayer bonding.

  2. Transparent and Conductive Carbon Nanotube Multilayer Thin Films Suitable as an Indium Tin Oxide Replacement 

    E-Print Network [OSTI]

    Park, Yong Tae

    2012-07-16T23:59:59.000Z

    Transparent electrodes made from metal oxides suffer from poor flexibility and durability. Highly transparent and electrically conductive thin films based on carbon nanotubes (CNTs) were assembled as a potential indium tin oxide (ITO) replacement...

  3. Results of the Gallium-Clad Phase 3 and Phase 4 tasks (canceled prior to completion)

    SciTech Connect (OSTI)

    Morris, R.N.

    1998-08-01T23:59:59.000Z

    This report summarizes the results of the Gallium-Clad interactions Phase 3 and 4 tasks. Both tasks were to involve examining the out-of-pile stability of residual gallium in short fuel rods with an imposed thermal gradient. The thermal environment was to be created by an electrical heater in the center of the fuel rod and coolant flow on the rod outer cladding. Both tasks were canceled due to difficulties with fuel pellet fabrication, delays in the preparation of the test apparatus, and changes in the Fissile Materials Disposition program budget.

  4. Percolation of gallium dominates the electrical resistance of focused ion beam deposited metals

    SciTech Connect (OSTI)

    Faraby, H. [Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093 (United States); DiBattista, M. [Qualcomm Technologies Incorporated, San Diego, California 92121 (United States); Bandaru, P. R., E-mail: pbandaru@ucsd.edu [Department of Mechanical and Aerospace Engineering, University of California, San Diego, La Jolla, California 92093 (United States)

    2014-04-28T23:59:59.000Z

    Metal deposition through focused ion beam (FIB) based systems is thought to result in material composed of the primary metal from the metallo-organic precursor in addition to carbon, oxygen, and gallium. We determined, through electrical resistance and chemical composition measurements on a wide range of FIB deposited platinum and tungsten lines, that the gallium ion (Ga{sup +}) concentration in the metal lines plays the dominant role in controlling the electrical resistivity. Effective medium theory, based on McLachlan's formalisms, was used to describe the relationship between the Ga{sup +} concentration and the corresponding resistivity.

  5. Synthesis of III-V nitride nanowires with controlled structure, morphology, and composition

    E-Print Network [OSTI]

    Crawford, Samuel Curtis

    2014-01-01T23:59:59.000Z

    The III-V nitride materials system offers tunable electronic and optical properties that can be tailored for specific electronic and optoelectronic applications by varying the (In,Ga,Al)N alloy composition. While nitride ...

  6. Comparing directed efficiency of III-nitride nanowire light-emitting diodes

    E-Print Network [OSTI]

    Gradecak, Silvija

    III-nitride-based nanowires are a promising platform for solid-state lighting. III-nitride nanowires that act as natural waveguides to enhance directed extraction have previously been shown to be free of extended defects ...

  7. Feasibility of breeding in hard spectrum boiling water reactors with oxide and nitride fuels

    E-Print Network [OSTI]

    Feng, Bo, Ph. D. Massachusetts Institute of Technology

    2011-01-01T23:59:59.000Z

    This study assesses the neutronic, thermal-hydraulic, and fuel performance aspects of using nitride fuel in place of oxides in Pu-based high conversion light water reactor designs. Using the higher density nitride fuel ...

  8. SUBMILLIMETER OPTICAL PROPERTIES OF HEXAGONAL BORON NITRIDE A. J. Gatesman, R. H. Giles and J. Waldman

    E-Print Network [OSTI]

    Massachusetts at Lowell, University of

    boron nitride was obtained in four grades (A, HP, M, M26) from The Carborundum Co. in Niagara Fall, NY

  9. Millimeter wave ferromagnetic resonance in gallium-substituted ?-iron oxide

    SciTech Connect (OSTI)

    Chao, Liu, E-mail: liu.chao@tufts.edu; Afsar, Mohammed N. [Department of Electrical and Computer Engineering, Tufts University, Medford, Massachusetts 02155 (United States); Ohkoshi, Shin-ichi [Department of Chemistry, School of Science, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033 (Japan)

    2014-05-07T23:59:59.000Z

    In millimeter wave frequency range, hexagonal ferrites with high uniaxial anisotropic magnetic fields are used as absorbers. These ferrites include M-type barium ferrite (BaFe{sub 12}O{sub 19}) and strontium ferrite (SrFe{sub 12}O{sub 19}), which have natural ferromagnetic resonant frequency range from 40 GHz to 60?GHz. However, the higher frequency range lacks suitable materials that support the higher frequency ferromagnetic resonance. A new series of gallium-substituted ?-iron oxides (?-Ga{sub x}Fe{sub 2?x}O{sub 3}) are synthesized which have ferromagnetic resonant frequencies appearing over the frequency range 30 GHz–150 GHz. The ?-Ga{sub x}Fe{sub 2?x}O{sub 3} is synthesized by the combination of reverse micelle and sol-gel techniques or the sol-gel method only. The particle sizes are observed to be smaller than 100 nm. In this paper, the free space magneto-optical approach has been employed to study these newly developed ?-Ga{sub x}Fe{sub 2?x}O{sub 3} particles in millimeter waves. This technique enables to obtain precise transmission spectra to determine the dielectric and magnetic properties of both isotropic and anisotropic ferrites in the millimeter wave frequency range from a single set of direct measurements. The transmittance and absorbance spectra of ?-Ga{sub x}Fe{sub 2?x}O{sub 3} are shown in this paper. Strong ferromagnetic resonances at different frequencies determined by the x parameter are found.

  10. OXIDATION MECHANISMS OF LOW ENERGY-HIGH FLUX NITRIDED ODS FeAl INTERMETALLIC ALLOY

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    OXIDATION MECHANISMS OF LOW ENERGY-HIGH FLUX NITRIDED ODS FeAl INTERMETALLIC ALLOY F. Pedraza*, J)5.46.45.72.72 Abstract Microscopy studies of low energy-high flux nitrided ODS FeAl Grade 3 intermetallic alloy reveal nitridation treatment at moderate temperature of ODS FeAl Grade 3 has been performed to modify the surface

  11. Silicon nitride/silicon carbide composite densified materials prepared using composite powders

    DOE Patents [OSTI]

    Dunmead, S.D.; Weimer, A.W.; Carroll, D.F.; Eisman, G.A.; Cochran, G.A.; Susnitzky, D.W.; Beaman, D.R.; Nilsen, K.J.

    1997-07-01T23:59:59.000Z

    Prepare silicon nitride-silicon carbide composite powders by carbothermal reduction of crystalline silica powder, carbon powder and, optionally, crystalline silicon nitride powder. The crystalline silicon carbide portion of the composite powders has a mean number diameter less than about 700 nanometers and contains nitrogen. The composite powders may be used to prepare sintered ceramic bodies and self-reinforced silicon nitride ceramic bodies.

  12. DETERMINING OPTICAL CONSTANTS OF URANIUM NITRIDE THIN FILMS IN THE EXTREME

    E-Print Network [OSTI]

    Hart, Gus

    DETERMINING OPTICAL CONSTANTS OF URANIUM NITRIDE THIN FILMS IN THE EXTREME ULTRAVIOLET (1.6-35 NM deposition and characterization of reactively-sputtered uranium nitride thin films. I also report optical.1 Application 1 1.2 Optical Constants 2 1.3 Project Focus 7 2 Uranium Nitride Thin Films 8 2.1 Sputtering 8 2

  13. Molecular orbital studies of titanium nitride chemical vapor deposition: gas phase b-elimination

    E-Print Network [OSTI]

    Schlegel, H. Bernhard

    Molecular orbital studies of titanium nitride chemical vapor deposition: gas phase b) of titanium nitride can be carried out using TiNR24 and NH3 (R Me or Et). Imido compounds are thought. Ó 2001 Pub- lished by Elsevier Science B.V. 1. Introduction It is well known that titanium nitride

  14. Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Gas Phase Complex Formation,

    E-Print Network [OSTI]

    Schlegel, H. Bernhard

    Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Gas Phase Complex Received June 6, 2000 The chemical vapor deposition (CVD) of titanium nitride can be carried out with TiCl4 Titanium nitride thin films have a variety of proper- ties, such as extreme hardness, high chemical

  15. Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Imido Dimer Formation and

    E-Print Network [OSTI]

    Schlegel, H. Bernhard

    Molecular Orbital Studies of Titanium Nitride Chemical Vapor Deposition: Imido Dimer Formation- ization of Ti(NR2)2NH in the chemical vapor deposition (CVD) of titanium nitride films. This study uses lead to the formation of higher oligomers. Introduction Titanium nitride thin films have a number

  16. Half-metallic to insulating behavior of rare-earth nitrides C. M. Aerts,1

    E-Print Network [OSTI]

    Svane, Axel Torstein

    Half-metallic to insulating behavior of rare-earth nitrides C. M. Aerts,1 P. Strange,1 M. Horne,1 W in the literature that rare-earth nitrides may form half-metallic ferromagnets.6­8 This is sur- prising because 30 January 2004 The electronic structure of the rare-earth nitrides is studied systematically using

  17. Europium Nitride: A Novel Diluted Magnetic Semiconductor Do Le Binh,1

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Europium Nitride: A Novel Diluted Magnetic Semiconductor Do Le Binh,1 B. J. Ruck,1,* F. Natali,1 H June 2013; published 18 October 2013) Europium nitride is semiconducting and contains nonmagnetic Eu3þ­24]. Europium nitride has also been demonstrated to be semiconducting [25], but EuN stands out amongst the rare

  18. Gallium-cladding compatibility testing plan: Phase 3 -- Test plan for centrally heated surrogate rodlet test. Revision 2

    SciTech Connect (OSTI)

    Morris, R.N.; Baldwin, C.A.; Wilson, D.F.

    1998-07-01T23:59:59.000Z

    The Fissile Materials Disposition Program (FMDP) is investigating the use of weapons grade plutonium in mixed oxide (MOX) fuel for light-water reactors (LWR). Commercial MOX fuel has been successfully used in overseas reactors for many years; however, weapons derived fuel may differ from the previous commercial fuels because of small amounts of gallium impurities. A concern presently exists that the gallium may migrate out of the fuel, react with and weaken the clad, and thereby promote loss of fuel pin integrity. Phases 1 and 2 of the gallium task are presently underway to investigate the types of reactions that occur between gallium and clad materials. This is a Level-2 document as defined in the Fissile Materials Disposition Program Light-Water Reactor Mixed-Oxide Fuel Irradiation Test Project Plan. This Plan summarizes the projected Phase 3 Gallium-Cladding compatibility heating test and the follow-on post test examination (PTE). This work will be performed using centrally-heated surrogate pellets, to avoid unnecessary complexities and costs associated with working with plutonium and an irradiation environment. Two sets of rodlets containing pellets prepared by two different methods will be heated. Both sets will have an initial bulk gallium content of approximately 10 ppm. The major emphasis of the PTE task will be to examine the material interactions, particularly indications of gallium transport from the pellets to the clad.

  19. Development and modeling of iron-gallium alloys Rick Allen Kellogg

    E-Print Network [OSTI]

    Flatau, Alison B.

    Development and modeling of iron-gallium alloys by Rick Allen Kellogg A dissertation submitted APPENDIX C: POISSON'S RATIOS OF Fe-Al ALLOYS 154 REFERENCES 155 #12;iv ACKNOWLEDGEMENTS Many people deserve University and the Department of Aerospace Engineering and Engineering Mechanics for providing academic

  20. Optical, electrical, and solar energy-conversion properties of gallium arsenide nanowire-array

    E-Print Network [OSTI]

    Zhou, Chongwu

    Optical, electrical, and solar energy-conversion properties of gallium arsenide nanowire, and will aid in the design and optimization of nanowire-based systems for solar energy-conversion applications, and the photoelectrochemical energy-conversion properties of GaAs nanowire arrays were evaluated in contact with one

  1. Active Control of Nitride Plasmonic Dispersion in the Far Infrared.

    SciTech Connect (OSTI)

    Shaner, Eric A.; Dyer, Gregory Conrad; Seng, William Francis; Bethke, Donald Thomas; Grine, Albert Dario,; Baca, Albert G.; Allerman, Andrew A.

    2014-11-01T23:59:59.000Z

    We investigate plasmonic structures in nitride-based materials for far-infrared (IR) applications. The two dimensional electron gas (2DEG) in the GaN/AlGaN material system, much like metal- dielectric structures, is a patternable plasmonic medium. However, it also permits for direct tunability via an applied voltage. While there have been proof-of-principle demonstrations of plasma excitations in nitride 2DEGs, exploration of the potential of this material system has thus far been limited. We recently demonstrated coherent phenomena such as the formation of plasmonic crystals, strong coupling of tunable crystal defects to a plasmonic crystal, and electromagnetically induced transparency in GaAs/AlGaAs 2DEGs at sub-THz frequencies. In this project, we explore whether these effects can be realized in nitride 2DEG materials above 1 THz and at temperatures exceeding 77 K.

  2. Characterization of nitrided silicon-silicon dioxide interfaces

    SciTech Connect (OSTI)

    Polignano, M.L.; Alessandri, M.; Brazzelli, D. [and others

    2000-07-01T23:59:59.000Z

    A newly-developed technique for the simultaneous characterization of the oxide-silicon interface properties and of bulk impurities was used for a systematic study of the nitridation process of thin oxides. This technique is based upon surface recombination velocity measurements, and does not require the formation of a capacitor structure, so it is very suitable for the characterization of as-grown interfaces. Oxides grown both in dry and in wet environments were considered, and nitridation processes in N{sub 2}O and in NO were compared to N{sub 2} annealing processes. The effect of nitridation temperature and duration were also studied, and RTO/RTN processes were compared to conventional furnace nitridation processes. Surface recombination velocity was correlated with nitrogen concentration at the oxide-silicon interface obtained by Secondary Ion Mass Spectroscopy (SIMS) measurements. Surface recombination velocity (hence surface state density) decreases with increasing nitrogen pile-up at the oxide-silicon interface, indicating that in nitrided interfaces surface state density is limited by nitridation. NO treatments are much more effective than N{sub 2}O treatments in the formation of nitrogen-rich interface layer and, as a consequence, in surface state reduction. Surface state density was measured in fully processed wafers before and after constant current stress. After a complete device process surface states are annealed out by hydrogen passivation, however they are reactivated by the electrical stress, and surface state results after stress were compared with data of surface recombination velocity in as-processed wafers.

  3. Structural studies of magnesium nitride fluorides by powder neutron diffraction

    SciTech Connect (OSTI)

    Brogan, Michael A. [School of Chemistry, University of Nottingham, Nottingham NG7 2RD (United Kingdom); Hughes, Robert W. [WestCHEM, School of Chemistry, University of Glasgow, Glasgow G12 8QQ (United Kingdom); Smith, Ronald I. [ISIS Pulsed Neutron and Muon Source, Science and Technology Facilities Council, Rutherford Appleton Laboratory, Harwell Oxford, Didcot OX11 0QX (United Kingdom); Gregory, Duncan H., E-mail: Duncan.Gregory@glasgow.ac.uk [WestCHEM, School of Chemistry, University of Glasgow, Glasgow G12 8QQ (United Kingdom)

    2012-01-15T23:59:59.000Z

    Samples of ternary nitride fluorides, Mg{sub 3}NF{sub 3} and Mg{sub 2}NF have been prepared by solid state reaction of Mg{sub 3}N{sub 2} and MgF{sub 2} at 1323-1423 K and investigated by powder X-ray and powder neutron diffraction techniques. Mg{sub 3}NF{sub 3} is cubic (space group: Pm3m) and has a structure related to rock-salt MgO, but with one cation site vacant. Mg{sub 2}NF is tetragonal (space group: I4{sub 1}/amd) and has an anti-LiFeO{sub 2} related structure. Both compounds are essentially ionic and form structures in which nitride and fluoride anions are crystallographically ordered. The nitride fluorides show temperature independent paramagnetic behaviour between 5 and 300 K. - Graphical abstract: Definitive structures of the ternary magnesium nitride fluorides Mg{sub 3}NF{sub 3} and the lower temperature polymorph of Mg{sub 2}NF have been determined from powder neutron diffraction data. The nitride halides are essentially ionic and exhibit weak temperature independent paramagnetic behaviour. Highlights: Black-Right-Pointing-Pointer Definitive structures of Mg{sub 3}NF{sub 3} and Mg{sub 2}NF were determined by neutron diffraction. Black-Right-Pointing-Pointer Nitride and fluoride anions are crystallographically ordered in both structures. Black-Right-Pointing-Pointer Both compounds exhibit weak, temperature independent paramagnetic behaviour. Black-Right-Pointing-Pointer The compounds are essentially ionic with ionicity increasing with F{sup -} content.

  4. Preconceptual design for separation of plutonium and gallium by ion exchange

    SciTech Connect (OSTI)

    DeMuth, S.F.

    1997-09-30T23:59:59.000Z

    The disposition of plutonium from decommissioned nuclear weapons, by incorporation into commercial UO{sub 2}-based nuclear reactor fuel, is a viable means to reduce the potential for theft of excess plutonium. This fuel, which would be a combination of plutonium oxide and uranium oxide, is referred to as a mixed oxide (MOX). Following power generation in commercial reactors with this fuel, the remaining plutonium would become mixed with highly radioactive fission products in a spent fuel assembly. The radioactivity, complex chemical composition, and large size of this spent fuel assembly, would make theft difficult with elaborate chemical processing required for plutonium recovery. In fabricating the MOX fuel, it is important to maintain current commercial fuel purity specifications. While impurities from the weapons plutonium may or may not have a detrimental affect on the fuel fabrication or fuel/cladding performance, certifying the effect as insignificant could be more costly than purification. Two primary concerns have been raised with regard to the gallium impurity: (1) gallium vaporization during fuel sintering may adversely affect the MOX fuel fabrication process, and (2) gallium vaporization during reactor operation may adversely affect the fuel cladding performance. Consequently, processes for the separation of plutonium from gallium are currently being developed and/or designed. In particular, two separation processes are being considered: (1) a developmental, potentially lower cost and lower waste, thermal vaporization process following PuO{sub 2} powder preparation, and (2) an off-the-shelf, potentially higher cost and higher waste, aqueous-based ion exchange (IX) process. While it is planned to use the thermal vaporization process should its development prove successful, IX has been recommended as a backup process. This report presents a preconceptual design with material balances for separation of plutonium from gallium by IX.

  5. Synthesis and Optimization of the Sintering Kinetics of Actinide Nitrides

    SciTech Connect (OSTI)

    Drryl P. Butt; Brian Jaques

    2009-03-31T23:59:59.000Z

    Research conducted for this NERI project has advanced the understanding and feasibility of nitride nuclear fuel processing. In order to perform this research, necessary laboratory infrastructure was developed; including basic facilities and experimental equipment. Notable accomplishments from this project include: the synthesis of uranium, dysprosium, and cerium nitrides using a novel, low-cost mechanical method at room temperature; the synthesis of phase pure UN, DyN, and CeN using thermal methods; and the sintering of UN and (Ux, Dy1-x)N (0.7 ? X ? 1) pellets from phase pure powder that was synthesized in the Advanced Materials Laboratory at Boise State University.

  6. Process for synthesizing titanium carbide, titanium nitride and titanium carbonitride

    DOE Patents [OSTI]

    Koc, Rasit (Lakewood, CO); Glatzmaier, Gregory C. (Boulder, CO)

    1995-01-01T23:59:59.000Z

    A process for synthesizing titanium carbide, titanium nitride or titanium carbonitride. The process comprises placing particles of titanium, a titanium salt or titanium dioxide within a vessel and providing a carbon-containing atmosphere within the vessel. The vessel is heated to a pyrolysis temperature sufficient to pyrolyze the carbon to thereby coat the particles with a carbon coating. Thereafter, the carbon-coated particles are heated in an inert atmosphere to produce titanium carbide, or in a nitrogen atmosphere to produce titanium nitride or titanium carbonitride, with the heating being of a temperature and time sufficient to produce a substantially complete solid solution.

  7. Process for synthesizing titanium carbide, titanium nitride and titanium carbonitride

    DOE Patents [OSTI]

    Koc, R.; Glatzmaier, G.C.

    1995-05-23T23:59:59.000Z

    A process is disclosed for synthesizing titanium carbide, titanium nitride or titanium carbonitride. The process comprises placing particles of titanium, a titanium salt or titanium dioxide within a vessel and providing a carbon-containing atmosphere within the vessel. The vessel is heated to a pyrolysis temperature sufficient to pyrolyze the carbon to thereby coat the particles with a carbon coating. Thereafter, the carbon-coated particles are heated in an inert atmosphere to produce titanium carbide, or in a nitrogen atmosphere to produce titanium nitride or titanium carbonitride, with the heating being of a temperature and time sufficient to produce a substantially complete solid solution.

  8. 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim5742 www.advmat.de

    E-Print Network [OSTI]

    -generation photo- voltaics, such as copper indium gallium selenide (CIGS)[5,6] and copper zinc tin sulfide (CZTS

  9. Surface modification of indium tin oxide by plasma treatment: An effective method to improve the efficiency, brightness, and reliability of organic

    E-Print Network [OSTI]

    Surface modification of indium tin oxide by plasma treatment: An effective method to improve; accepted for publication 7 January 1997 We demonstrate the improvement of an indium tin oxide anode contact conductivity, and effi- ciency as a hole injector into organic materials, indium tin oxide ITO has been widely

  10. Indium tin oxide single-mode waveguide modulator Ray T. Chen, Dan Robinson, Huey Lu, Lev Sadovnik, and Zonh-Zen Ho

    E-Print Network [OSTI]

    Chen, Ray

    Indium tin oxide single-mode waveguide modulator Ray T. Chen, Dan Robinson, Huey Lu, Lev Sadovnik containing an indium tin oxide waveguide, two holographic mirrors, two microprisms, and two ohmic contacts range of interest. The index of refraction of an indium tin oxide film can be represented by 362 / SPIE

  11. (Data in metric tons unless otherwise noted) Domestic Production and Use: Indium was not recovered from ores in the United States in 2004. Two companies,

    E-Print Network [OSTI]

    80 INDIUM (Data in metric tons unless otherwise noted) Domestic Production and Use: Indium-efficiency photovoltaic devices. A major manufacturer is testing indium for a new application as a heat-management material in computers, which could increase consumption by 40 metric tons per year. The estimated

  12. Polyorganosilazane preceramic binder development for reaction bonded silicon nitride composites

    SciTech Connect (OSTI)

    Mohr, D.L.; Starr, T.L. [Georgia Tech Research Inst., Atlanta, GA (United States)

    1992-11-01T23:59:59.000Z

    This study has examined the use of two commercially available polyorganosilazanes for application as preceramic binders in a composite composed of silicon carbide fibers in a reaction bonded silicon nitride (RBSN) matrix. Ceramic monolithic and composite samples were produced. Density of monolithic and whisker reinforced RBSN samples containing the polysilazane binder was increased. Mercury intrusion porosimetry revealed a significant decrease in the pore sizes of samples containing a polyorganosilazane binder. Electron micrographs of samples containing the preceramic binder looked similar to control samples containing no precursor. Overall, incorporation of the polysilazane into monolithic and whisker reinforced samples resulted in significantly increased density and decreased porosity. Nitriding of the RBSN was slightly retarded by addition of the polysilazane binder. Samples with the preceramic binders contained increased contents of {alpha} versus {beta}-silicon nitride which may be due to interaction of hydrogen evolved from polysilazane pyrolysis with the nitriding process. Initial efforts to produce continuous fiber reinforced composites via this method have not realized the same improvements in density and porosity which have been observed for monolithic and whisker reinforced samples. Further, the addition of perceramic binder resulted in a more brittle fracture morphology as compared to similar composites made without the binder.

  13. Polyorganosilazane preceramic binder development for reaction bonded silicon nitride composites

    SciTech Connect (OSTI)

    Mohr, D.L.; Starr, T.L. (Georgia Tech Research Inst., Atlanta, GA (United States))

    1992-11-01T23:59:59.000Z

    This study has examined the use of two commercially available polyorganosilazanes for application as preceramic binders in a composite composed of silicon carbide fibers in a reaction bonded silicon nitride (RBSN) matrix. Ceramic monolithic and composite samples were produced. Density of monolithic and whisker reinforced RBSN samples containing the polysilazane binder was increased. Mercury intrusion porosimetry revealed a significant decrease in the pore sizes of samples containing a polyorganosilazane binder. Electron micrographs of samples containing the preceramic binder looked similar to control samples containing no precursor. Overall, incorporation of the polysilazane into monolithic and whisker reinforced samples resulted in significantly increased density and decreased porosity. Nitriding of the RBSN was slightly retarded by addition of the polysilazane binder. Samples with the preceramic binders contained increased contents of [alpha] versus [beta]-silicon nitride which may be due to interaction of hydrogen evolved from polysilazane pyrolysis with the nitriding process. Initial efforts to produce continuous fiber reinforced composites via this method have not realized the same improvements in density and porosity which have been observed for monolithic and whisker reinforced samples. Further, the addition of perceramic binder resulted in a more brittle fracture morphology as compared to similar composites made without the binder.

  14. Methods for improved growth of group III nitride buffer layers

    DOE Patents [OSTI]

    Melnik, Yurity; Chen, Lu; Kojiri, Hidehiro

    2014-07-15T23:59:59.000Z

    Methods are disclosed for growing high crystal quality group III-nitride epitaxial layers with advanced multiple buffer layer techniques. In an embodiment, a method includes forming group III-nitride buffer layers that contain aluminum on suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system. A hydrogen halide or halogen gas is flowing into the growth zone during deposition of buffer layers to suppress homogeneous particle formation. Some combinations of low temperature buffers that contain aluminum (e.g., AlN, AlGaN) and high temperature buffers that contain aluminum (e.g., AlN, AlGaN) may be used to improve crystal quality and morphology of subsequently grown group III-nitride epitaxial layers. The buffer may be deposited on the substrate, or on the surface of another buffer. The additional buffer layers may be added as interlayers in group III-nitride layers (e.g., GaN, AlGaN, AlN).

  15. Continuous Fiber Ceramic Composite (CFCC) Program: Gaseous Nitridation

    SciTech Connect (OSTI)

    R. Suplinskas G. DiBona; W. Grant

    2001-10-29T23:59:59.000Z

    Textron has developed a mature process for the fabrication of continuous fiber ceramic composite (CFCC) tubes for application in the aluminum processing and casting industry. The major milestones in this project are System Composition; Matrix Formulation; Preform Fabrication; Nitridation; Material Characterization; Component Evaluation

  16. Cubic Lithium Nitride Amy Lazicki1,2

    E-Print Network [OSTI]

    Islam, M. Saif

    Cubic Lithium Nitride to 200 GPa Amy Lazicki1,2 Choong-Shik Yoo1, Warren Pickett2, Richard electrolyte material for lithium-based batteries · possible hydrogen storage material Thrust of this research ­ differences between the XRS and PDOS are indications of the presence of core-hole interactions (excitons

  17. BORON NITRIDE CAPACITORS FOR ADVANCED POWER ELECTRONIC DEVICES

    SciTech Connect (OSTI)

    N. Badi; D. Starikov; C. Boney; A. Bensaoula; D. Johnstone

    2010-11-01T23:59:59.000Z

    This project fabricates long-life boron nitride/boron oxynitride thin film -based capacitors for advanced SiC power electronics with a broad operating temperature range using a physical vapor deposition (PVD) technique. The use of vapor deposition provides for precise control and quality material formation.

  18. Evaluation and silicon nitride internal combustion engine components

    SciTech Connect (OSTI)

    Voldrich, W. (Allied-Signal Aerospace Co., Torrance, CA (United States). Garrett Ceramic Components Div.)

    1992-04-01T23:59:59.000Z

    The feasibility of silicon nitride (Si[sub 3]N[sub 4]) use in internal combustion engines was studied by testing three different components for wear resistance and lower reciprocating mass. The information obtained from these preliminary spin rig and engine tests indicates several design changes are necessary to survive high-stress engine applications. The three silicon nitride components tested were valve spring retainers, tappet rollers, and fuel pump push rod ends. Garrett Ceramic Components' gas-pressure sinterable Si[sub 3]N[sub 4] (GS-44) was used to fabricate the above components. Components were final machined from densified blanks that had been green formed by isostatic pressing of GS-44 granules. Spin rig testing of the valve spring retainers indicated that these Si[sub 3]N[sub 4] components could survive at high RPM levels (9,500) when teamed with silicon nitride valves and lower spring tension than standard titanium components. Silicon nitride tappet rollers showed no wear on roller O.D. or I.D. surfaces, steel axles and lifters; however, due to the uncrowned design of these particular rollers the cam lobes indicated wear after spin rig testing. Fuel pump push rod ends were successful at reducing wear on the cam lobe and rod end when tested on spin rigs and in real-world race applications.

  19. Heterostructures for Increased Quantum Efficiency in Nitride LEDs

    SciTech Connect (OSTI)

    Davis, Robert

    2010-09-30T23:59:59.000Z

    Task 1. Development of an advanced LED simulator useful for the design of efficient nitride-based devices. Simulator will contain graphical interface software that can be used to specify the device structure, the material parameters, the operating conditions and the desired output results. I-4 Task 2. Theoretical and experimental investigations regarding the influence on the microstructure, defect concentration, mechanical stress and strain and IQE of controlled changes in the chemistry and process route of deposition of the buffer layer underlying the active region of nitride-based blue- and greenemitting LEDs. I-9 Task 3. Theoretical and experimental investigations regarding the influence on the physical properties including polarization and IQE of controlled changes in the geometry, chemistry, defect density, and microstructure of components in the active region of nitride-based blue- and green-emitting LEDs. II-37 Task 4. Theoretical and experimental investigations regarding the influence on IQE of novel heterostructure designs to funnel carriers into the active region for enhanced recombination efficiency and elimination of diffusion beyond this region. II-52 Task 5. Theoretical and experimental investigations regarding the influence of enhanced p-type doping on the chemical, electrical, and microstructural characteristics of the acceptor-doped layers, the hole injection levels at Ohmic contacts, the specific contact resistivity and the IQE of nitride-based blue- and green-emitting LEDs. Development and optical and electrical characterization of reflective Ohmic contacts to n- and p-type GaN films. I

  20. Inversion by metalorganic chemical vapor deposition from N- to Ga-polar gallium nitride and its application to multiple quantum well light-emitting diodes

    SciTech Connect (OSTI)

    Hosalli, A. M.; Van Den Broeck, D. M.; Bedair, S. M. [Department of Electrical and Computer Engineering, NCSU, Raleigh, North Carolina 27695 (United States)] [Department of Electrical and Computer Engineering, NCSU, Raleigh, North Carolina 27695 (United States); Bharrat, D.; El-Masry, N. A. [Department of Material Science and Engineering, NCSU, Raleigh, North Carolina 27695 (United States)] [Department of Material Science and Engineering, NCSU, Raleigh, North Carolina 27695 (United States)

    2013-12-02T23:59:59.000Z

    We demonstrate a metalorganic chemical vapor deposition growth approach for inverting N-polar to Ga-polar GaN by using a thin inversion layer grown with high Mg flux. The introduction of this inversion layer allowed us to grow p-GaN films on N-polar GaN thin film. We have studied the dependence of hole concentration, surface morphology, and degree of polarity inversion for the inverted Ga-polar surface on the thickness of the inversion layer. We then use this approach to grow a light emitting diode structure which has the MQW active region grown on the advantageous N-polar surface and the p-layer grown on the inverted Ga-polar surface.

  1. Narrow energy band gap gallium arsenide nitride semi-conductors and an ion-cut-synthesis method for producing the same

    DOE Patents [OSTI]

    Weng, Xiaojun; Goldman, Rachel S.

    2006-06-06T23:59:59.000Z

    A method for forming a semi-conductor material is provided that comprises forming a donor substrate constructed of GaAs, providing a receiver substrate, implanting nitrogen into the donor substrate to form an implanted layer comprising GaAs and nitrogen. The implanted layer is bonded to the receiver substrate and annealed to form GaAsN and nitrogen micro-blisters in the implanted layer. The micro-blisters allow the implanted layer to be cleaved from the donor substrate.

  2. Ammothermal Growth of Gan Substrates For Leds: High-Pressure Ammonothermal Process for Bulk Gallium Nitride Crystal Growth for Energy Efficient Commercially Competitive Lighting

    SciTech Connect (OSTI)

    None

    2011-01-01T23:59:59.000Z

    Broad Funding Opportunity Announcement Project: The new GaN crystal growth method is adapted from that used to grow quartz crystals, which are very inexpensive and represent the second-largest market for single crystals for electronic applications (after silicon). More extreme conditions are required to grow GaN crystals and therefore a new type of chemical growth chamber was invented that is suitable for large-scale manufacturing. A new process was developed that grows GaN crystals at a rate that is more than double that of current processes. The new technology will enable GaN substrates with best-in-world quality at lowest-in-world prices, which in turn will enable new generations of white LEDs, lasers for full-color displays, and high-performance power electronics.

  3. Osteomyelitis and infarction in sickle cell hemoglobinopathies: differentiation by combined technetium and gallium scintigraphy

    SciTech Connect (OSTI)

    Amundsen, T.R.; Siegel, M.J.; Siegel, B.A.

    1984-12-01T23:59:59.000Z

    Clinical records and scintigrams were reviewed of 18 patients with sickle cell hemoglobinophaties who had undergone combined technetium and gallium scintigraphy during 22 separate episodes of suspected osseous infection. The combined scintigrams were correctly interpreted as indicating osteomyelitis in four studies. Of 18 studies in patients with infarction, the combined scintigrams were correctly interpreted in 16 and showed either no local accumulation of Ga-67 or less accumulation than that of Tc-99m MDP at symptomatic sites. In the other two studies, the scintigrams were falsely interpreted as indicating osteomyelitis and showed congruent, increased accumulation of both Tc-99, MDP and Ga-67. This pattern must be considered indeterminate. Overall, the results indicate that the combination of technetium and gallium scintigraphy is an effective means to distinguish osteomyelitis from infarction in patients with sickle cell hemoglobinopathies.

  4. Fast neutron scattering on Gallium target at 14.8 MeV

    E-Print Network [OSTI]

    R. Han; R. Wada; Z. Chen; Y. Nie; X. Liu; S. Zhang; P. Ren; B. Jia; G. Tian; F. Luo; W. Lin; J. Liu; F. Shi; M. Huang; X. Ruan; J. Ren; Z. Zhou; H. Huang; J. Bao; K. Zhang; B. Hu

    2014-11-03T23:59:59.000Z

    Benchmarking of evaluated nuclear data libraries was performed for $\\sim 14.8$ MeV neutrons on Gallium targets. The experiments were performed at China Institute of Atomic Energy(CIAE). Solid samples of natural Gallium (3.2 cm and 6.4 cm thick) were bombarded by $\\sim 14.8$ MeV neutrons and leakage neutron energy spectra were measured at 60$^{\\circ}$ and 120$^{\\circ}$. The measured spectra are rather well reproduced by MCNP-4C simulations with the CENDL-3.1, ENDF/B-VII and JENDL-4.0 evaluated nuclear data libraries, except for the inelastic contributions around $E_{n} = 10-13$ MeV. All three libraries significantly underestimate the inelastic contributions. The inelastic contributions are further studied, using the Talys simulation code and the experimental spectra are reproduced reasonably well in the whole energy range by the Talys calculation, including the inelastic contributions.

  5. Fast neutron scattering on Gallium target at 14.8 MeV

    E-Print Network [OSTI]

    Han, R; Chen, Z; Nie, Y; Liu, X; Zhang, S; Ren, P; Jia, B; Tian, G; Luo, F; Lin, W; Liu, J; Shi, F; Huang, M; Ruan, X; Ren, J; Zhou, Z; Huang, H; Bao, J; Zhang, K; Hu, B

    2014-01-01T23:59:59.000Z

    Benchmarking of evaluated nuclear data libraries was performed for $\\sim 14.8$ MeV neutrons on Gallium targets. The experiments were performed at China Institute of Atomic Energy(CIAE). Solid samples of natural Gallium (3.2 cm and 6.4 cm thick) were bombarded by $\\sim 14.8$ MeV neutrons and leakage neutron energy spectra were measured at 60$^{\\circ}$ and 120$^{\\circ}$. The measured spectra are rather well reproduced by MCNP-4C simulations with the CENDL-3.1, ENDF/B-VII and JENDL-4.0 evaluated nuclear data libraries, except for the inelastic contributions around $E_{n} = 10-13$ MeV. All three libraries significantly underestimate the inelastic contributions. The inelastic contributions are further studied, using the Talys simulation code and the experimental spectra are reproduced reasonably well in the whole energy range by the Talys calculation, including the inelastic contributions.

  6. Interaction of hydrogen with gallium vacancies in wurtzite GaN

    SciTech Connect (OSTI)

    Wright, A. F.

    2001-08-01T23:59:59.000Z

    First-principles techniques are used to investigate the interaction of hydrogen with gallium vacancies in wurtzite GaN. The calculations reveal that hydrogen can either compensate a vacancy by donating an electron to a vacancy acceptor level, or passivate the vacancy by forming a hydrogen-vacancy complex. A gallium vacancy can bind up to four hydrogen atoms, and hydrogen removal energies are computed as a function of the number of hydrogen atoms. Removal energies are found to depend strongly on Fermi level and complexes containing more than two hydrogen atoms are predicted to be unstable in n-type GaN. Hydrogen vibration frequencies are computed and compared with previously reported infrared absorption measurements for hydrogen-implanted GaN.

  7. Origin of color centers in the flux-grown europium gallium garnet

    SciTech Connect (OSTI)

    Aleksandrovsky, A. S.; Arkhipkin, V. G.; Bezmaternykh, L. N.; Gudim, I. A.; Krylov, A. S. [L. V. Kirensky Institute of Physics, Akademgorodok, Krasnoyarsk 660036, Russia and Siberian Federal University, Krasnoyarsk 660079 (Russian Federation); Vagizov, F. [Department of Physics, Texas A and M University, College Station, Texas 77840 (United States)

    2008-04-15T23:59:59.000Z

    Europium gallium garnet (EuGG) single crystals were grown from fluxes with various contents. Optical absorption spectra of EuGG grown from a flux containing calcium show an additional band in the ultraviolet and blue regions of the spectra as compared to the case of a calcium-free flux. Moessbauer spectra of the samples grown from the fluxes with different additives show no signs of other valence states of the europium ions except for 3+. However, they indicate changes in the crystal field due to the entrance of additive ions. The nature of the additional absorption must be the same as that for calcium-doped gadolinium gallium garnet, i.e., anion vacancies. Moessbauer isotope shifts and quadrupole splitting for EuGG are determined.

  8. Gallium suboxide vapor attack on chromium, cobalt, molybdenum, tungsten and their alloys at 1200 [degrees] C

    SciTech Connect (OSTI)

    Kolman, D. G. (David G.); Taylor, T. N. (Thomas N.); Park, Y. (Youngsoo); Stan, M. (Marius); Butt, D. P. (Darryl P.); Maggiore, C. J. (Carl J.); Tesmer, Joseph R.; Havrilla, G. J. (George J.)

    2004-01-01T23:59:59.000Z

    Our prior work elucidated the failure mechanism of furnace materi als (304 SS, 316 SS, and Hastelloy C-276) exposed to gallium suboxide (Ga{sub 2}O) and/or gallium oxide (Ga{sub 2}O{sub 3}) during plutonium - gallium compound processing. Failure was hypothesized to result from concurrent alloy oxidation/Ga compound reduction followed by Ga uptake. The aim of the current work is to screen candidate replacement materials. Alloys Haynes 25 (49 Co - 20 Cr - 15 W - 10 Ni - 3 Fe - 2 Mn - 0.4 Si, wt%), 52 Mo - 48 Re (wt%), 62 W - 38 Cu (wt%), and commercially pure Cr, Co, Mo, W, and alumina were examined. Preliminary assessments of commercially pure W and Mo - Re suggest that these materials may be suitable for furnace construction. Thermodynamics calculations indicating that materials containing Al, Cr, Mn, Si, and V would be susceptible to oxidation in the presence of Ga{sub 2}O were validated by experimental results. In contrast to that reported previously, an alternate reaction mechanism for Ga uptake, which does not require concurrent alloy oxidation, controls Ga uptake for certain materials. A correlation between Ga solubility and uptake was noted.

  9. 2010 Minerals Yearbook U.S. Department of the Interior

    E-Print Network [OSTI]

    in 2010. A number of smaller companies produced specialty indium alloys and other indium products (t) of indium. The company has owned the property since 2005 (Lithic Resources Ltd., 2010). Indium and sputtering takes place. Indium can also be recovered from copper-indium-gallium- diselenide (CIGS) solar

  10. Correlation between the Indium Tin Oxide morphology and the performances of polymer light-emitting diodes

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    : This paper reports on performance enhancement of polymer light-emitting diodes (PLEDs) based on poly(2,5-bis. Keywords : Polymer light emitting diode; Indium tin oxide; Atomic force microscopy; Rutherford backscattering spectroscopy 1. Introduction Polymer light-emitting diodes (PLEDs) have received worldwide

  11. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 18, NO. 1, FEBRUARY 2009 103 Indium Phosphide MEMS Cantilever Resonator

    E-Print Network [OSTI]

    Rubloff, Gary W.

    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 18, NO. 1, FEBRUARY 2009 103 Indium Phosphide MEMS, Subramaniam Kanakaraju, Neil Goldsman, and Reza Ghodssi Abstract--We report a microelectromechanical system, microelectromechanical system (MEMS) cantilevers, pentacene, III­V MEMS. I. INTRODUCTION THE NEED to monitor

  12. Electrochemical study of the properties of indium in room temperature chloroaluminate molten salts

    SciTech Connect (OSTI)

    Liu, J.S.Y.; Sun, I.W. [National Cheng-Kung Univ., Tainan (Taiwan, Province of China). Dept. of Chemistry

    1997-01-01T23:59:59.000Z

    The electrochemistry of indium was studied with voltammetry and chronoamperometry at glassy carbon, tungsten, and nickel electrodes in the basic and acidic aluminum chloride-1,2-dimethyl-3-propylimidazolium chloride molten salt at 27 C. In the basic melt, In(III) is complexed as [InCl{sub 5}]{sup 2{minus}}, which could be reduced to indium metal through a three-electron reduction process. The electrodeposition of indium on glassy carbon and tungsten electrodes involves progressive three-dimensional nucleation on a finite number of active sites with diffusion-controlled growth of the nuclei. The electrodeposition of indium metal on a nickel electrode entails progressive three-dimensional nucleation on a large number of active sites. The formal potentials of the In(III)/In couple in the 44.4 to 55.6 and 49.0 to 51.0 mole percent (m/o) melts are {minus}1.096 and {minus}1.009 V, respectively, vs. Al(III)Al in the 66.7 to 33.3 m/o.

  13. Indium-induced changes in GaN,,0001... surface morphology John E. Northrup

    E-Print Network [OSTI]

    Indium-induced changes in GaN,,0001... surface morphology John E. Northrup Xerox Palo Alto Research-principles calculations of the energetics of the In-terminated GaN 0001 , (0001), (1011), and (1011) surfaces indicate- retical studies to determine the behavior of In on GaN sur- faces. The term surfactant is used often

  14. Method and apparatus for use of III-nitride wide bandgap semiconductors in optical communications

    DOE Patents [OSTI]

    Hui, Rongqing (Lenexa, KS); Jiang,Hong-Xing (Manhattan, KS); Lin, Jing-Yu (Manhattan, KS)

    2008-03-18T23:59:59.000Z

    The present disclosure relates to the use of III-nitride wide bandgap semiconductor materials for optical communications. In one embodiment, an optical device includes an optical waveguide device fabricated using a III-nitride semiconductor material. The III-nitride semiconductor material provides for an electrically controllable refractive index. The optical waveguide device provides for high speed optical communications in an infrared wavelength region. In one embodiment, an optical amplifier is provided using optical coatings at the facet ends of a waveguide formed of erbium-doped III-nitride semiconductor materials.

  15. Synthesis and Functionalization of Carbon and Boron Nitride Nanomaterials and Their Applications

    E-Print Network [OSTI]

    Erickson, Kristopher John

    2012-01-01T23:59:59.000Z

    Carbon Nitrides for Hydrogen Storage. Adv. Funct. Mater.N compounds for chemical hydrogen storage. Chemical SocietyT. , High-Pressure Hydrogen Storage in Zeolite-Templated

  16. amorphous carbon-nitride films: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    in hard and elastic amorphous carbon nitride films investigated H NMR spectroscopy Materials Science Websites Summary: Received 14 February 2003; published 5 November 2003 The...

  17. The phase diagram and hardness of carbon nitrides

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Dong, Huafeng; Oganov, Artem R.; Zhu, Qiang; Qian, Guang-Rui

    2015-05-06T23:59:59.000Z

    Novel superhard materials, especially those with superior thermal and chemical stability, are needed to replace diamond. Carbon nitrides (C-N), which are likely to possess these characteristics and have even been expected to be harder than diamond, are excellent candidates. Here we report three new superhard and thermodynamically stable carbon nitride phases. Based on a systematic evolutionary structure searches, we report a complete phase diagram of the C-N system at 0–300 GPa and analyze the hardest metastable structures. Surprisingly, we find that at zero pressure, the earlier proposed graphitic-C3N4 structure (P_6m2) is dynamically unstable, and we find the lowest-energy structure based on s-triazine unit and s-heptazine unit.

  18. Development of silicon nitride composites with continuous fiber reinforcement

    SciTech Connect (OSTI)

    Starr, T.L.; Mohr, D.L.; Lackey, W.J.; Hanigofsky, J.A. [Georgia Inst. of Tech., Atlanta, GA (United States). Georgia Technology Research Inst.

    1993-10-01T23:59:59.000Z

    The composites were fabricated using ultrafine Si powders prepared by attritor milling; the powders exhibits full conversion to Si nitride in < 3 h at {le} 1200 C (these conditions reduce degradation of the fibers compared to conventional). Effects of processing conditions on fiber properties and the use of fiber coatings to improve stability during processing as well as change the fiber-matrix interfacial properties were investigated. A duplex carbon-silicon carbide coating, deposited by CVD, reduced fiber degradation in processing, and it modified the fiber-matrix adhesion. Si nitride matrix composites were fabricated using reaction sintering, forming laminates, filament-wound plates, and tubes. In each case, an attritor milled Si powder slurry is infiltrated into ceramic fiber preforms or tows, which are then assembled to form a 3-D structure for reaction sintering. The resulting composites have properties comparable to chemical vapor infiltration densified composites, with reasonable strengths and graceful composite fracture behavior.

  19. Purification of boron nitride nanotubes via polymer wrapping

    SciTech Connect (OSTI)

    Choi, Jin-Hyuk [Department of Nano Science and Technology, Sejong University, 98 Gunja, Gwangjin, Seoul 143-747 (Korea, Republic of); Kim, Jaewoo [Nuclear Materials Research Division, Korea Atomic Energy Research Institute, 1045 Daedukdaero, Daejeon 305-353 (Korea, Republic of); WCI Quantum Beam based Radiation Research Center, Korea Atomic Energy Research Institute, 1045 Daedukdaero, Daejeon 305-353 (Korea, Republic of); Seo, Duckbong [Nuclear Materials Research Division, Korea Atomic Energy Research Institute, 1045 Daedukdaero, Daejeon 305-353 (Korea, Republic of); Seo, Young-Soo, E-mail: ysseo@sejong.ac.kr [Department of Nano Science and Technology, Sejong University, 98 Gunja, Gwangjin, Seoul 143-747 (Korea, Republic of)

    2013-03-15T23:59:59.000Z

    Highlights: ? Surface modification of boron nitride nanotubes using polymeric materials. ? Surface-modified BNNT was purified with a simple dilution-centrifugation step. ? Surface-modified BNNT can be directly used for polymer composite fabrication ? Degree of purification was analyzed by Raman spectroscopy. - Abstract: Boron nitride nanotubes (BNNT) synthesized by a ball milling-annealing were surface-modified using three different types of polymeric materials. Those materials were chosen depending on future applications especially in polymer nanocomposite fabrications. We found that the surface-modified BNNT can be purified with a simple dilution-centrifugation step, which would be suitable for large-scale purification. Degree of purification was monitored by means of the center peak position and FWHM of E{sub 2g} mode of BNNT in Raman spectra. As the purification of BNNT develops, the peak position was up-shifted while FWHM of the peak was narrowed.

  20. The phase diagram and hardness of carbon nitrides

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Dong, Huafeng; Oganov, Artem R.; Zhu, Qiang; Qian, Guang-Rui

    2015-05-06T23:59:59.000Z

    Novel superhard materials, especially those with superior thermal and chemical stability, are needed to replace diamond. Carbon nitrides (C-N), which are likely to possess these characteristics and have even been expected to be harder than diamond, are excellent candidates. Here we report three new superhard and thermodynamically stable carbon nitride phases. Based on a systematic evolutionary structure searches, we report a complete phase diagram of the C-N system at 0–300 GPa and analyze the hardest metastable structures. Surprisingly, we find that at zero pressure, the earlier proposed graphitic-C3N4 structure (P_6m2) is dynamically unstable, and we find the lowest-energy structure basedmore »on s-triazine unit and s-heptazine unit.« less

  1. Electrically dependent bandgaps in graphene on hexagonal boron nitride

    SciTech Connect (OSTI)

    Kaplan, D., E-mail: daniel.b.kaplan.civ@mail.mil; Swaminathan, V. [U.S. Army RDECOM-ARDEC, Fuze Precision Armaments and Technology Directorate, Picatinny Arsenal, New Jersey 07806 (United States); Recine, G. [Department of Applied Physics, Polytechnic Institute of New York University, Brooklyn, New York 11201 (United States); Department of Physics and Engineering Physics, Fordham University, Bronx, New York 10458 (United States)

    2014-03-31T23:59:59.000Z

    We present first-principles calculations on the bandgap of graphene on a layer of hexagonal boron nitride in three different stacking configurations. Relative stability of the configurations is identified and bandgap tunability is demonstrated through the application of an external, perpendicularly applied electric field. We carefully examine the bandgap's sensitivity to both magnitude of the applied field as well as separation between the graphene and hexagonal boron nitride layers. Features of the band structure are examined and configuration-dependent relationships between the field and bandgap are revealed and elucidated through the atom-projected density of states. These findings suggest the potential for opening and modulating a bandgap in graphene as high as several hundred meV.

  2. Synthesis of silicon nitride powders in pulsed RF plasmas

    SciTech Connect (OSTI)

    Buss, R.J.; Ho, P. [Sandia National Labs., Albuquerque, NM (United States); Babu, S.V. [Sandia National Labs., Albuquerque, NM (United States)]|[Clarkson Univ., Potsdam, NY (United States). Dept. of Chemical Engineering

    1995-05-01T23:59:59.000Z

    Nanometer size silicon nitride particles are synthesized using a pulsed radio frequency plasma technique. The plasma is modulated with a square-wave on/off cycle of varying period to control size and morphology and to deduce the growth kinetics. In situ laser light scattering and ex situ particle analysis are used to study the nucleation and growth. For SiH{sub 4}/Ar plasmas which nucleate silicon particles, an initial extremely rapid growth phase is followed by a slower growth rate, approaching the rate of thin film deposition on adjacent flat surfaces. In SiH{sub 4}/NH{sub 3} plasmas, silicon nitride particle size can be tightly controlled by adjusting the plasma-on time. The size dispersion of the particles is large and is consistent with a process of continual nucleation during the plasma-on period. The observed polydispersity differs dramatically from that reported from other laboratories.

  3. Use of silicon in liquid sintered silicon nitrides and sialons

    DOE Patents [OSTI]

    Raj, Rishi (Ithaca, NY); Baik, Sunggi (Ithaca, NY)

    1984-12-11T23:59:59.000Z

    This invention relates to the production of improved high density nitrogen based ceramics by liquid-phase densification of silicon nitride or a compound of silicon-nitrogen-oxygen-metal, e.g. a sialon. In the process and compositions of the invention minor amounts of finely divided silicon are employed together with the conventional liquid phase producing additives to enhance the densification of the resultant ceramic.

  4. Use of silicon in liquid sintered silicon nitrides and sialons

    DOE Patents [OSTI]

    Raj, R.; Baik, S.

    1984-12-11T23:59:59.000Z

    This invention relates to the production of improved high density nitrogen based ceramics by liquid-phase densification of silicon nitride or a compound of silicon-nitrogen-oxygen-metal, e.g. a sialon. In the process and compositions of the invention minor amounts of finely divided silicon are employed together with the conventional liquid phase producing additives to enhance the densification of the resultant ceramic. 4 figs.

  5. Study the gas sensing properties of boron nitride nanosheets

    SciTech Connect (OSTI)

    Sajjad, Muhammad; Feng, Peter, E-mail: p.feng@upr.edu

    2014-01-01T23:59:59.000Z

    Graphical abstract: - Highlights: • We synthesized boron nitride nanosheets (BNNSs) on silicon substrate. • We analyzed gas sensing properties of BNNSs-based gas-sensor device. • CH{sub 4} gas is used to measure gas-sensing properties of the device. • Quick response and recovery time of the device is recorded. • BNNSs showed excellent sensitivity to the working gas. - Abstract: In the present communication, we report on the synthesis of boron nitride nanosheets (BNNSs) and study of their gas sensing properties. BNNSs are synthesized by irradiating pyrolytic hexagonal boron nitride (h-BN) target using CO{sub 2} laser pulses. High resolution transmission electron microscopic measurements (HRTEM) revealed 2-dientional honeycomb crystal lattice structure of BNNSs. HRTEM, electron diffraction, XRD and Raman scattering measurements clearly identified h-BN. Gas sensing properties of synthesized BNNSs were analyzed with prototype gas sensor using methane as working gas. A systematic response curve of the sensor is recorded in each cycle of gas “in” and “out”; suggesting excellent sensitivity and high performance of BNNSs-based gas-sensor.

  6. Nitridation under ammonia of high surface area vanadium aerogels

    SciTech Connect (OSTI)

    Merdrignac-Conanec, Odile [Laboratoire Verres et Ceramiques, UMR CNRS 6512, Institut de Chimie de Rennes, Universite de Rennes 1, Campus de Beaulieu, F-35042 Rennes Cedex (France)]. E-mail: odile.merdrignac@univ-rennes1.fr; El Badraoui, Khadija [Laboratoire Verres et Ceramiques, UMR CNRS 6512, Institut de Chimie de Rennes, Universite de Rennes 1, Campus de Beaulieu, F-35042 Rennes Cedex (France); L'Haridon, Paul [Laboratoire Verres et Ceramiques, UMR CNRS 6512, Institut de Chimie de Rennes, Universite de Rennes 1, Campus de Beaulieu, F-35042 Rennes Cedex (France)

    2005-01-15T23:59:59.000Z

    Vanadium pentoxide gels have been obtained from decavanadic acid prepared by ion exchange on a resin from ammonium metavanadate solution. The progressive removal of water by solvent exchange in supercritical conditions led to the formation of high surface area V{sub 2}O{sub 5}, 1.6H{sub 2}O aerogels. Heat treatment under ammonia has been performed on these aerogels in the 450-900 deg. C temperature range. The oxide precursors and oxynitrides have been characterized by XRD, SEM, TGA, BET. Nitridation leads to divided oxynitride powders in which the fibrous structure of the aerogel is maintained. The use of both very low heating rates and high surface area aerogel precursors allows a higher rate and a lower threshold of nitridation than those reported in previous works. By adjusting the nitridation temperature, it has been possible to prepare oxynitrides with various nitrogen enrichment and vanadium valency states. Whatever the V(O,N) composition, the oxidation of the oxynitrides in air starts between 250 and 300 deg. C. This determines their potential use as chemical gas sensors at a maximum working temperature of 250 deg. C.

  7. Abstract--Titanium nitride (TiN) has been investigated as a material for MEMS hotplate heaters operating at high

    E-Print Network [OSTI]

    Technische Universiteit Delft

    Abstract--Titanium nitride (TiN) has been investigated as a material for MEMS hotplate heaters widely available. A material similar to Ta5Si3 is titanium nitride (TiN). It combines a very high melting TiN Bond pad TiN Figure 1. Schematic cross section of the hotplate. Titanium Nitride for MEMS

  8. TITANIUM NITRIDE COATING AS A MULTIPACTOR SUPPRESSOR Walid Kaabi*, Alessandro Variola (LAL/IN2P3-CNRS, Orsay)

    E-Print Network [OSTI]

    Boyer, Edmond

    TITANIUM NITRIDE COATING AS A MULTIPACTOR SUPPRESSOR Walid Kaabi*, Alessandro Variola (LAL/IN2P3 Emission Yield (SEY). Titanium Nitride is a good candidate for this purpose since its SEY is about 1.5 [2 was made in a previous paper [5]. Ti- TiN transition determination Titanium to titanium nitride transition

  9. NITRIDATION EFFECTS ON THE OXIDATION MECHANISMS OF AN ODS FeAl INTERMETALLIC ALLOY

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    NITRIDATION EFFECTS ON THE OXIDATION MECHANISMS OF AN ODS FeAl INTERMETALLIC ALLOY F. Pedraza*, J-mail: fpedraza@univ-lr.fr Abstract An ODS FeAl intermetallic alloy has been nitrided at low-energy high flux of an ODS FeAl alloy have been discussed [13], indicating the formation of AlN and again of -Fe after

  10. Isotope Effect on the Thermal Conductivity of Boron Nitride Nanotubes C. W. Chang,1,5

    E-Print Network [OSTI]

    Zettl, Alex

    been achieved in Si and Ge via isotopic enrichment [7,8], with enriched carbon (diamond) showing that an enhancement of due to isotope enrichment could be large in boron nitride nanotubes [20]. Although previousIsotope Effect on the Thermal Conductivity of Boron Nitride Nanotubes C. W. Chang,1,5 A. M

  11. MOVPE growth of semipolar III-nitride semiconductors on CVD graphene Priti Gupta n

    E-Print Network [OSTI]

    Deshmukh, Mandar M.

    MOVPE growth of semipolar III-nitride semiconductors on CVD graphene Priti Gupta n , A.A. Rahman pressure metalorganic vapor phase epitaxy B1. Graphene B1. Nitrides B2. Semiconducting III­V materials a b on graphene grown by chemical vapour deposition. GaN, AlGaN alloys, and InN layers are grown using an Al

  12. Ultra-thin ohmic contacts for p-type nitride light emitting devices

    DOE Patents [OSTI]

    Raffetto, Mark (Raleigh, NC); Bharathan, Jayesh (Cary, NC); Haberern, Kevin (Cary, NC); Bergmann, Michael (Chapel Hill, NC); Emerson, David (Chapel Hill, NC); Ibbetson, James (Santa Barbara, CA); Li, Ting (Ventura, CA)

    2012-01-03T23:59:59.000Z

    A semiconductor based Light Emitting Device (LED) can include a p-type nitride layer and a metal ohmic contact, on the p-type nitride layer. The metal ohmic contact can have an average thickness of less than about 25 .ANG. and a specific contact resistivity less than about 10.sup.-3 ohm-cm.sup.2.

  13. TITANIUM NITRIDE COATING AS A MULTIPACTOR SUPPRESSOR ON RF COUPLER CERAMIC WINDOWS*

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    TITANIUM NITRIDE COATING AS A MULTIPACTOR SUPPRESSOR ON RF COUPLER CERAMIC WINDOWS* W. Kaabi# , H. The obtained measurements point out how the Nitrogen vacancy on the film can be controlled very well acting a low Secondary Electron Emission Yield (SEY). Titanium Nitride is a good candidate for this purpose

  14. Ab initio studies of magnetic properties of cobalt and tetracobalt nitride Co4N

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Ab initio studies of magnetic properties of cobalt and tetracobalt nitride Co4N S. F. Matara) , A of perovskite structure Co4N nitride have been in- vestigated within density functional theory using both pseudo versus volume show that the ground state is ferromagnetic in both materials. HCP-Co is found to be more

  15. Field emission and current-voltage properties of boron nitride nanotubes

    E-Print Network [OSTI]

    Rubloff, Gary W.

    Field emission and current-voltage properties of boron nitride nanotubes John Cumings*, A. Zettl microscope. Stable currents were measured in a field emission geometry, but in contact the nanotubes Published by Elsevier Ltd. PACS: 79.70. þ q Keywords: A. Boron nitride; B. Nanotubes; C. Field emission

  16. The effect of surface mechanical attrition treatment on low temperature plasma nitriding of an austenitic stainless

    E-Print Network [OSTI]

    Boyer, Edmond

    of an austenitic stainless steel M. Chemkhi1 , D. Retraint1,* , A. Roos1 , C. Garnier1 , L. Waltz2 , C. Demangel3) followed by plasma nitriding on the mechanical properties of a medical grade austenitic stainless steel, nanocrystalline materials, plasma nitriding, austenitic steels 1. Introduction Austenitic stainless steel AISI 316

  17. Hard superconducting nitrides Xiao-Jia Chen*, Viktor V. Struzhkin*, Zhigang Wu*, Maddury Somayazulu

    E-Print Network [OSTI]

    Wu, Zhigang

    Hard superconducting nitrides Xiao-Jia Chen*, Viktor V. Struzhkin*, Zhigang Wu*, Maddury Somayazulu, and hardness of selected superconducting transition-metal nitrides reveals inter- esting correlations among with the neutron scattering data. The cubic -NbN superconducting phase possesses a bulk modulus of 348 GPa

  18. Microwave Nitridation of Sintered Reaction Bonded Silicon Parts for Natural Gas Fueled Diesel Engines

    SciTech Connect (OSTI)

    Edler, J.; Kiggans, J.O.; Suman, A.W.; Tiegs, T.N.

    1999-01-01T23:59:59.000Z

    This cooperative project was a joint development program between Eaton Corporation and Lockheed Martin Energy Research (LMER). Cooperative work was of benefit to both parties. ORNL was able to assess up-scale of the microwave nitridation process using a more intricate-shaped part designed for application in advanced diesel engines. Eaton Corporation mined access to microwave facilities and expertise for the nitridation of SRBSN materials. The broad objective of the CRADA established with Eaton Corporation and ORNL was to develop cost-effective silicon nitride ceramics compared to the current materials available. The following conclusions can be made from the work performed under the CRADA: (1) Demonstrated that the binder burnout step can be incorporated into the SRBSN processing in the microwave furnace. (2) Scale-up of the microwave nitridation process using Eaton Corporation parts showed that the nitridation weight gains were essentially identical to those obtained by conventional heating. (3) Combined nitridation and sintering processes using silicon nitride beads as packing powders results in degradation of the mechanical properties. (4) Gelcasting of silicon nitride materials using Eaton Si mixtures was demonstrated.

  19. Alternated high-and low-pressure nitriding of austenitic stainless steel: Mechanisms and results

    E-Print Network [OSTI]

    Alternated high- and low-pressure nitriding of austenitic stainless steel: Mechanisms and results G a gas mixture of (N2 /H2):(50/50) in pressure, was applied to stainless-steel AISI 304. In the first or plasma nitriding of metal parts, in par- ticular those made of steel and cast iron, is extensively ap

  20. Tunneling characteristics in chemical vapor deposited graphene hexagonal boron nitride graphene junctions

    E-Print Network [OSTI]

    Feenstra, Randall

    1 Tunneling characteristics in chemical vapor deposited graphene ­ hexagonal boron nitride ­ graphene junctions T. Roy1 , L. Liu2 , S. de la Barrera,3 B. Chakrabarti1,4 , Z. R. Hesabi1 , C. A. Joiner1 Abstract: Large area chemical vapor deposited graphene and hexagonal boron nitride was used to fabricate

  1. Brief Communication Ultra fine carbon nitride nanocrystals synthesized by laser ablation

    E-Print Network [OSTI]

    Bristol, University of

    Brief Communication Ultra fine carbon nitride nanocrystals synthesized by laser ablation in liquid form 15 October 2006 Key words: carbon nitride, laser ablation, liquid-solid interface, nanoparticle synthesized at room tem- perature and pressure using the novel technique of pulsed laser ablation

  2. Iron-based alloy and nitridation treatment for PEM fuel cell bipolar plates

    DOE Patents [OSTI]

    Brady, Michael P. (Oak Ridge, TN) [Oak Ridge, TN; Yang, Bing (Oak Ridge, TN) [Oak Ridge, TN; Maziasz, Philip J. (Oak Ridge, TN) [Oak Ridge, TN

    2010-11-09T23:59:59.000Z

    A corrosion resistant electrically conductive component that can be used as a bipolar plate in a PEM fuel cell application is composed of an alloy substrate which has 10-30 wt. % Cr, 0.5 to 7 wt. % V, and base metal being Fe, and a continuous surface layer of chromium nitride and vanadium nitride essentially free of base metal. A oxide layer of chromium vanadium oxide can be disposed between the alloy substrate and the continuous surface nitride layer. A method to prepare the corrosion resistant electrically conductive component involves a two-step nitridization sequence by exposing the alloy to a oxygen containing gas at an elevated temperature, and subsequently exposing the alloy to an oxygen free nitrogen containing gas at an elevated temperature to yield a component where a continuous chromium nitride layer free of iron has formed at the surface.

  3. Fabrication of optoelectronic microwave linear and ring resonators on a gallium arsenide substrate

    E-Print Network [OSTI]

    Yeh, Chun-Liang

    1993-01-01T23:59:59.000Z

    for the degree of MASTER OF SCIENCE August 1993 Major Subject: Electrical Engineering FABRICATION OF OPTOELECTRONIC MICROWAVE LINEAR AND RING RESONATORS ON A GALLIUM ARSENIDE SUBSTRATE A Thesis by CHUN-LIANG YEH Approved as to style and content by: Mark... and the first modes at 4. 87, 4. 89, 4. 91 GHz have been designed, simulated, and fabricated on a GaAs substrate. A microstrip ring resonator with 3/4 pm coupling gaps and the first mode at 3. 456 GHz also has been fabricated on GaAs. A reliable high yield...

  4. Process development for the fabrication of monolithic optoelectronic resonators on gallium arsenide substrates

    E-Print Network [OSTI]

    Fairchild, Brock Wilson

    1990-01-01T23:59:59.000Z

    with fairly good adhension prop- erties with gallium arsenide and gold. A layer of nickel was deposited on top of the AuGe to reduce the GaAs/AuGe interfacial strain that causes the AuGe to peal during plating. Good adhesion can be formed with GaAs when Au.... 57 LIST OF FIGURES FIGURE Page Typical ring resonator with coupled feed lines. Width/height ratio of photoresist in the gap region. Process steps for the fabrication of resonating structures. (a). Deposition of AuGe and nickel. (b). Spin...

  5. Thermoelectric properties of indium doped PbTe{sub 1-y}Se{sub y} alloys

    SciTech Connect (OSTI)

    Bali, Ashoka; Mallik, Ramesh Chandra, E-mail: rcmallik@physics.iisc.ernet.in [Thermoelectric Materials and Devices Laboratory, Department of Physics, Indian Institute of Science, Bangalore 560012, Karnataka (India); Wang, Heng; Snyder, G. Jeffrey [Department of Materials Science, California Institute of Technology, Pasadena, California 91125 (United States)

    2014-07-21T23:59:59.000Z

    Lead telluride and its alloys are well known for their thermoelectric applications. Here, a systematic study of PbTe{sub 1-y}Se{sub y} alloys doped with indium has been done. The powder X-Ray diffraction combined with Rietveld analysis confirmed the polycrystalline single phase nature of the samples, while microstructural analysis with scanning electron microscope results showed densification of samples and presence of micrometer sized particles. The temperature dependent transport properties showed that in these alloys, indium neither pinned the Fermi level as it does in PbTe, nor acted as a resonant dopant as in SnTe. At high temperatures, bipolar effect was observed which restricted the zT to 0.66 at 800?K for the sample with 30% Se content.

  6. Synthesis of silicon nitride particles in pulsed Rf plasmas

    SciTech Connect (OSTI)

    Buss, R.J.; Babu, S.V.

    1995-11-01T23:59:59.000Z

    Silicon nitride (hydrogenated) particles are synthesized using a pulsed 13.56 Mhz glow discharge. The plasma is modulated with a square-wave on/off cycle of varying period to study the growth kinetics. In situ laser light scattering and ex situ particle analysis are used to study the nucleation and growth. For SiH{sub 4}/Ar and SiH{sub 4}/NH{sub 3} plasmas, an initial very rapid growth phase is followed by slower growth, approaching the rate of thin film deposition on adjacent flat surfaces. The average particle size can be controlled in the 10-100 nm range by adjusting the plasma-on time. The size dispersion of the particles is large and is consistent with a process of continuous nucleation during the plasma-on period. The large polydispersity is also reported for silicon particles from silane and differs from that reported in other laboratories. The silicon nitride particle morphology is compared to that of silicon and silicon carbide particles generated by the same technique. Whereas Si particles appear as rough clusters of smaller subunits, the SiC particles are smooth spheres, and the Si{sub 3}N{sub 4} particles are smooth but non-spherical. Post-plasma oxidation kinetics of the particles are studied with FTIR and are consistent with a hydrolysis mechanism proposed in earlier work with continuous plasmas. Heat treatment of the powder in an ammonia atmosphere results in the elimination of hydrogen, rendering the silicon nitride resistant to atmospheric oxidation.

  7. Synthesis of silicon nitride particles in pulsed radio frequency plasmas

    SciTech Connect (OSTI)

    Buss, R.J. [Sandia National Laboratories, Albuquerque, New Mexico 87185-0367 (United States)] [Sandia National Laboratories, Albuquerque, New Mexico 87185-0367 (United States); Babu, S.V. [Department of Chemical Engineering, Clarkson University, Potsdam, New York 13699-5705 (United States)] [Department of Chemical Engineering, Clarkson University, Potsdam, New York 13699-5705 (United States)

    1996-03-01T23:59:59.000Z

    Silicon nitride (hydrogenated) particles are synthesized using a pulsed 13.56 MHz glow discharge. The plasma is modulated with a square-wave on/off cycle of varying period to study the growth kinetics. {ital In} {ital situ} laser light scattering and {ital ex} {ital situ} particle analysis are used to study the nucleation and growth. For SiH{sub 4}/Ar and SiH{sub 4}/NH{sub 3} plasmas, an initial very rapid growth phase is followed by slower growth, approaching the rate of thin film deposition on adjacent flat surfaces. The average particle size can be controlled in the 10{endash}100 nm range by adjusting the plasma-on time. The size dispersion of the particles is large and is consistent with a process of continuous nucleation during the plasma-on period. The large polydispersity is also reported for silicon particles from silane and differs from that reported in other laboratories. The silicon nitride particle morphology is compared to that of silicon and silicon carbide particles generated by the same technique. Whereas Si particles appear as rough clusters of smaller subunits, the SiC particles are smooth spheres, and the Si{sub 3}N{sub 4} particles are smooth but nonspherical. Postplasma oxidation kinetics of the particles are studied with Fourier transform infrared spectra and are consistent with a hydrolysis mechanism proposed in earlier work with continuous plasmas. Heat treatment of the powder in an ammonia atmosphere results in the elimination of hydrogen, rendering the silicon nitride resistant to atmospheric oxidation. {copyright} {ital 1996 American Vacuum Society}

  8. Boron nitride nanosheets as oxygen-atom corrosion protective coatings

    SciTech Connect (OSTI)

    Yi, Min [Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); Plasma Laboratory, Ministry-of-Education Key Laboratory of Fluid Mechanics, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); Shen, Zhigang, E-mail: shenzhg@buaa.edu.cn [Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); Plasma Laboratory, Ministry-of-Education Key Laboratory of Fluid Mechanics, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); School of Material Science and Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); Zhao, Xiaohu [Plasma Laboratory, Ministry-of-Education Key Laboratory of Fluid Mechanics, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); Liang, Shuaishuai [Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); Liu, Lei [Beijing Key Laboratory for Powder Technology Research and Development, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China); School of Material Science and Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100191 (China)

    2014-04-07T23:59:59.000Z

    The research of two-dimensional nanomaterials for anticorrosion applications is just recently burgeoning. Herein, we demonstrate the boron nitride nanosheets (BNNSs) coatings for protecting polymer from oxygen-atom corrosion. High-quality BNNSs, which are produced by an effective fluid dynamics method with multiple exfoliation mechanisms, can be assembled into coatings with controlled thickness by vacuum filtration. After exposed in atom oxygen, the naked polymer is severely corroded with remarkable mass loss, while the BNNSs-coated polymer remains intact. Barrier and bonding effects of the BNNSs are responsible for the coating's protective performance. These preliminary yet reproducible results pave a way for resisting oxygen-atom corrosion.

  9. Field emission characteristics from graphene on hexagonal boron nitride

    SciTech Connect (OSTI)

    Yamada, Takatoshi, E-mail: takatoshi-yamada@aist.go.jp [National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565 (Japan); Masuzawa, Tomoaki; Ebisudani, Taishi; Okano, Ken [International Christian University, 3-10-2 Osawa, Mitaka, Tokyo 181-8585 (Japan); Taniguchi, Takashi [National Institute for Material Science (NIMS), 1-1-1 Namiki, Tsukuba 305-0044 (Japan)

    2014-06-02T23:59:59.000Z

    An attempt has been made to utilize uniquely high electron mobility of graphene on hexagonal boron nitride (h-BN) to electron emitter. The field emission property of graphene/h-BN/Si structure has shown enhanced threshold voltage and emission current, both of which are key to develop novel vacuum nanoelectronics devices. The field emission property was discussed along with the electronic structure of graphene investigated by Fowler-Nordheim plot and ultraviolet photoelectron spectroscopy. The result suggested that transferring graphene on h-BN modified its work function, which changed field emission mechanism. Our report opens up a possibility of graphene-based vacuum nanoelectronics devices with tuned work function.

  10. Method of nitriding niobium to form a superconducting surface

    DOE Patents [OSTI]

    Kelley, Michael J.; Klopf, John Michael; Singaravelu, Senthilaraja

    2014-08-19T23:59:59.000Z

    A method of forming a delta niobium nitride .delta.-NbN layer on the surface of a niobium object including cleaning the surface of the niobium object; providing a treatment chamber; placing the niobium object in the treatment chamber; evacuating the chamber; passing pure nitrogen into the treatment chamber; focusing a laser spot on the niobium object; delivering laser fluences at the laser spot until the surface of the niobium object reaches above its boiling temperature; and rastering the laser spot over the surface of the niobium object.

  11. Glow-discharge synthesis of silicon nitride precursor powders

    SciTech Connect (OSTI)

    Ho, P.; Buss, R.J.; Loehman, R.E. (Sandia National Laboratories, Albuquerque, New Mexico 87185-5800 (US))

    1989-07-01T23:59:59.000Z

    A radio-frequency glow discharge is used for the synthesis of submicron, amorphous, silicon nitride precursor powders from silane and ammonia. Powders are produced with a range of Si/N ratios, including stoichiometric, Si-rich, and N-rich, and contain substantial amounts of hydrogen. The powders appear to be similar to silicon diimide and are easily converted to oxide by water vapor. The powders lose weight and crystallize to a mixture of {alpha} and {beta}-Si{sub 3}N{sub 4} after prolonged heating at 1600{degree}C. Studies of spectrally and spatially resolved optical emission from the plasma are reported.

  12. Dynamics of formation of photoresponse in a detector structure made of gallium arsenide

    SciTech Connect (OSTI)

    Ayzenshtat, G. I., E-mail: ayzen@mail.tomsknet.ru; Lelekov, M. A.; Tolbanov, O. P. [Tomsk State University (Russian Federation)

    2008-04-15T23:59:59.000Z

    The influence of capture effects on the characteristics of detectors of the ionizing radiation based on semi-insulating gallium arsenide is considered. Generation of nonequilibrium electrons and holes along the entire thickness of the active region was performed under illumination with an infrared light-emitting diode with a wavelength of 0.9 {mu}m. In this case, the situation emerging in the device structure under the effect of X-ray radiation or a high-energy electron beam was simulated. It is shown that the variation in the shape of the output signal with time in this case is caused by variation in the electric field profile due to the capture of holes at deep centers in gallium arsenide. An absolutely different distribution of the electric field emerges in the structure under irradiation of a semitransparent cathode of the structure with a red light-emitting diode, emission of which penetrates into the active region for mere 1 {mu}m. In this case, the transformation of the electric field is caused by the capture of electrons. Under the prolonged effect of such radiation, a space-charge-limited current mode emerges in the device.

  13. Anionic Gallium-Based Metal;#8722;Organic Framework and Its Sorption and Ion-Exchange Properties

    SciTech Connect (OSTI)

    Banerjee, Debasis; Kim, Sun Jin; Wu, Haohan; Xu, Wenqian; Borkowski, Lauren A.; Li, Jing; Parise, John B. (Kwangju); (Rutgers); (SBU)

    2012-04-30T23:59:59.000Z

    A gallium-based metal-organic framework Ga{sub 6}(C{sub 9}H{sub 3}O{sub 6}){sub 8} {center_dot} (C{sub 2}H{sub 8}N){sub 6}(C{sub 3}H{sub 7}NO){sub 3}(H{sub 2}O){sub 26} [1, Ga{sub 6}(1,3,5-BTC){sub 8} {center_dot} 6DMA {center_dot} 3DMF {center_dot} 26H{sub 2}O], GaMOF-1; BTC = benzenetricarboxylate/trimesic acid and DMA = dimethylamine, with space group I{bar 4}3d, a = 19.611(1) {angstrom}, and V = 7953.4(6) {angstrom}{sup 3}, was synthesized using solvothermal techniques and characterized by synchrotron-based X-ray microcrystal diffraction. Compound 1 contains isolated gallium tetrahedra connected by the organic linker (BTC) forming a 3,4-connected anionic porous network. Disordered positively charged ions and solvent molecules are present in the pore, compensating for the negative charge of the framework. These positively charged molecules could be exchanged with alkali-metal ions, as is evident by an ICP-MS study. The H{sub 2} storage capacity of the parent framework is moderate with a H{sub 2} storage capacity of {approx}0.5 wt % at 77 K and 1 atm.

  14. An assessment of the validity of cerium oxide as a surrogate for plutonium oxide gallium removal studies

    SciTech Connect (OSTI)

    Kolman, D.G.; Park, Y.; Stan, M.; Hanrahan, R.J. Jr.; Butt, D.P.

    1999-03-01T23:59:59.000Z

    Methods for purifying plutonium metal have long been established. These methods use acid solutions to dissolve and concentrate the metal. However, these methods can produce significant mixed waste, that is, waste containing both radioactive and chemical hazards. The volume of waste produced from the aqueous purification of thousands of weapons would be expensive to treat and dispose. Therefore, a dry method of purification is highly desirable. Recently, a dry gallium removal research program commenced. Based on initial calculations, it appeared that a particular form of gallium (gallium suboxide, Ga{sub 2}O) could be evaporated from plutonium oxide in the presence of a reducing agent, such as small amounts of hydrogen dry gas within an inert environment. Initial tests using ceria-based material (as a surrogate for PuO{sub 2}) showed that thermally-induced gallium removal (TIGR) from small samples (on the order of one gram) was indeed viable. Because of the expense and difficulty of optimizing TIGR from plutonium dioxide, TIGR optimization tests using ceria have continued. This document details the relationship between the ceria surrogate tests and those conducted using plutonia.

  15. Formation of etch pits during carbon doping of gallium arsenide with carbon tetrachloride by metalorganic vapor-phase epitaxy

    E-Print Network [OSTI]

    Li, Lian

    Formation of etch pits during carbon doping of gallium arsenide with carbon tetrachloride to examine the effects of carbon tetrachloride concentration and temperature on the morphology of carbon with increasing carbon tetrachloride concentration. Step bunching and pinning was observed at a IV/III ratio

  16. Simulation assisted design of a gallium phosphide np photovoltaic junction Charles R. Allen, Jong-Hyeok Jeon , Jerry M. Woodall

    E-Print Network [OSTI]

    Woodall, Jerry M.

    University, 1205 W State Street, West Lafayette, IN, USA a r t i c l e i n f o Article history: Received 27 February 2010 Keywords: Gallium phosphide Solar cell Multi-junction CPV Simulation a b s t r a c with measurements of the dark and light response. The light current was measured under an illumination of air mass

  17. Organometallic vapor-phase homoepitaxy of gallium arsenide assisted by a downstream hydrogen afterglow plasma in the growth region

    E-Print Network [OSTI]

    Collins, George J.

    Organometallic vapor-phase homoepitaxy of gallium arsenide assisted by a downstream hydrogen 1991; accepted for publication 3 April 1992) hz situ generated arsenic hydrides are reacted downstream with trimethylgallium (TMGa), both in the presence of and in the absence of a downstream hydrogen afterglow plasma. The

  18. Scanning Tunneling Microscopy and Surface Simulation of Zinc-Blende GaN(001) Intrinsic 4 Reconstruction: Linear Gallium Tetramers?

    E-Print Network [OSTI]

    Reconstruction: Linear Gallium Tetramers? Hamad A. AL-Brithen, Rong Yang, Muhammad B. Haider, Costel Constantin and occupied states, in agreement with surface simulations based on the 4 1 linear tetramer model the existence of linear Ga tetramers. DOI: PACS numbers: 68.35.Bs, 68.37.Ef, 73.20.At Based on both fundamental

  19. Radiation tolerance of piezoelectric bulk single-crystal aluminum nitride

    SciTech Connect (OSTI)

    David A. Parks; Bernhard R. Tittmann

    2014-07-01T23:59:59.000Z

    For practical use in harsh radiation environments, we pose selection criteria for piezoelectric materials for nondestructive evaluation (NDE) and material characterization. Using these criteria, piezoelectric aluminum nitride is shown to be an excellent candidate. The results of tests on an aluminumnitride-based transducer operating in a nuclear reactor are also presented. We demonstrate the tolerance of single-crystal piezoelectric aluminum nitride after fast and thermal neutron fluences of 1.85 × 1018 neutron/cm2 and 5.8 × 1018 neutron/cm2, respectively, and a gamma dose of 26.8 MGy. The radiation hardness of AlN is most evident from the unaltered piezoelectric coefficient d33, which measured 5.5 pC/N after a fast and thermal neutron exposure in a nuclear reactor core for over 120 MWh, in agreement with the published literature value. The results offer potential for improving reactor safety and furthering the understanding of radiation effects on materials by enabling structural health monitoring and NDE in spite of the high levels of radiation and high temperatures, which are known to destroy typical commercial ultrasonic transducers.

  20. Nitride and Oxynitride Based Phosphors for Solid State Lighting

    SciTech Connect (OSTI)

    Tian, Yongchi

    2011-10-15T23:59:59.000Z

    The objective of the project is to advance the technology of the Lightscape Materials Inc. (Lightscape) proprietary nitride and oxynitride phosphors for solid state lighting (SSL) from the current level of maturity of applied research to advanced engineering development. This objective will be accomplished by optimizing the novel nitride and oxynitride phosphors, whose formulations are listed in Table 1, and establishing cost-effective preparation processes for the phosphors. The target performances of the phosphors are: • High luminescence efficiency: Quantum Yield = 90%. • Superior thermal stability of luminescence: Thermal Quenching Loss <10% at 150 °C. • Superior environmental stability: Luminescence Maintenance >90% after 5,000 hours at 85 °C and 85% relative humidity. • Scattering loss <10%. • Cost-effective preparation processes. The resulting phosphor materials and their preparation processes are anticipated to be a drop-in component for product development paths undertaken by LED lamp makers in the SSL industry. Upon program completion, Lightscape will target market insertion that enables high efficacy, high color rendering index (CRI), high thermal stability and long lifetime LED-based lighting products for general illumination that realizes substantial energy savings.

  1. High upper critical field in disordered niobium nitride superconductor

    SciTech Connect (OSTI)

    Baskaran, R., E-mail: baskaran@igcar.gov.in; Thanikai Arasu, A. V.; Amaladass, E. P.; Janawadkar, M. P. [Materials Science Group, IGCAR, Kalpakkam-603102 (India)

    2014-10-28T23:59:59.000Z

    Superconducting Niobium Nitride thin films have been deposited on glass, aluminum nitride buffered glass, and oxidized silicon substrates by reactive DC magnetron sputtering at ambient substrate temperatures. The crystal structure of these thin films has been determined to be cubic fcc B1 structure by Glancing Incidence X-Ray Diffraction analysis. The superconducting transition temperatures of the thin films were measured to be greater than 11.6?K with a maximum of 13.4?K. The negative temperature coefficient of resistance observed in these thin films indicates the presence of disorder. Magneto-resistance measurements have been carried out on these thin films patterned into standard four probe geometry upto a maximum magnetic field of 12?T for two films and upto 15?T for the other two films. The dependence of transition temperature on the applied field is analyzed to estimate the upper critical field. The upper critical field for most of the films was estimated to exceed 35?T, while one of the most disordered films had an estimated upper critical field greater than 70?T.

  2. Tunneling characteristics in chemical vapor deposited graphene–hexagonal boron nitride–graphene junctions

    SciTech Connect (OSTI)

    Roy, T.; Hesabi, Z. R.; Joiner, C. A.; Vogel, E. M. [School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, Georgia 30332 (United States); Liu, L.; Gu, G. [Department of Electrical Engineering and Computer Science, University of Tennessee, 1520 Middle Drive, Knoxville, Tennessee 37996 (United States); Barrera, S. de la; Feenstra, R. M. [Department of Physics, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, Pennsylvania 15213 (United States); Chakrabarti, B. [School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive, Atlanta, Georgia 30332 (United States); Department of Materials Science and Engineering, University of Texas at Dallas, 800 West Campbell Rd., Richardson, Texas 75080 (United States)

    2014-03-24T23:59:59.000Z

    Large area chemical vapor deposited graphene and hexagonal boron nitride was used to fabricate graphene–hexagonal boron nitride–graphene symmetric field effect transistors. Gate control of the tunneling characteristics is observed similar to previously reported results for exfoliated graphene–hexagonal boron nitride–graphene devices. Density-of-states features are observed in the tunneling characteristics of the devices, although without large resonant peaks that would arise from lateral momentum conservation. The lack of distinct resonant behavior is attributed to disorder in the devices, and a possible source of the disorder is discussed.

  3. Low Temperature Chemical Vapor Deposition of Zirconium Nitride in a Fluidized Bed 

    E-Print Network [OSTI]

    Arrieta, Marie

    2012-10-19T23:59:59.000Z

    The objective of this research was to design, assemble, and demonstrate the initial performance of a fluidized bed chemical vapor deposition (FB-CVD) system capable of producing thin, uniform zirconium nitride (ZrN) coatings (1 to 10 micrometers...

  4. Assessment of uranium-free nitride fuels for spent fuel transmutation in fast reactor systems 

    E-Print Network [OSTI]

    Szakaly, Frank Joseph

    2004-09-30T23:59:59.000Z

    The purpose of this work is to investigate the implementation of nitride fuels containing little or no uranium in a fast-spectrum nuclear reactor to reduce the amount of plutonium and minor actinides in spent nuclear fuel ...

  5. Method of nitriding, carburizing, or oxidizing refractory metal articles using microwaves

    DOE Patents [OSTI]

    Holcombe, Cressie E. (Knoxville, TN); Dykes, Norman L. (Oak Ridge, TN); Tiegs, Terry N. (Lenoir City, TN)

    1992-01-01T23:59:59.000Z

    A method of nitriding an article of refractory-nitride-forming metal or metalloids. A consolidated metal or metalloid article is placed inside a microwave oven and nitrogen containing gas is introduced into the microwave oven. The metal or metalloid article is heated to a temperature sufficient to react the metal or metalloid with the nitrogen by applying a microwave energy within the microwave oven. The metal or metalloid article is maintained at that temperature for a period of time sufficient to convert the article of metal or metalloid to an article of refractory nitride. in addition, a method of applying a coating, such as a coating of an oxide, a carbide, or a carbo-nitride, to an article of metal or metalloid by microwave heating.

  6. Process for preparing transition metal nitrides and transition metal carbonitrides and their reaction intermediates

    DOE Patents [OSTI]

    Maya, Leon (Oak Ridge, TN)

    1988-05-24T23:59:59.000Z

    A process for making ammonolytic precursors to nitride and carbonitride ceramics. Extreme reaction conditions are not required and the precursor is a powder-like substance that produces ceramics of improved purity and morphology upon pyrolysis.

  7. Precursors in the preparation of transition metal nitrides and transition metal carbonitrides and their reaction intermediates

    DOE Patents [OSTI]

    Maya, Leon (Oak Ridge, TN)

    1991-01-01T23:59:59.000Z

    A process for making ammonolytic precursors to nitride and carbonitride ceramics. Extreme reaction conditions are not required and the precursor is a powder-like substance that produces ceramics of improved purity and morphology upon pyrolysis.

  8. Photon-induced tunneling in graphene-boron nitride-graphene heterostructures

    E-Print Network [OSTI]

    Nair, Nityan

    2013-01-01T23:59:59.000Z

    Graphene is a material that has generated much interest due to its many unique electronic and optical properties. In this work, we present optoelectronic measurements performed on ultrathin graphene-boron nitride-graphene ...

  9. Electronic structure analyses and activation studies of a dinitrogen-derived terminal nitride of molybdenum

    E-Print Network [OSTI]

    Sceats, Emma Louise, 1978-

    2004-01-01T23:59:59.000Z

    Chapter 1: Complexes obtained by electrophilic attack on a dinitrogen-derived terminal molybdenum nitride: Electronic structure analysis by solid state CP/MAS ¹?N NMR in combination ... Chapter 2. Carbene chemistry in the ...

  10. Thermal stability of -titanium in contact with titanium nitride Shi-Qing Wang

    E-Print Network [OSTI]

    Allen, Leslie H.

    Thermal stability of -titanium in contact with titanium nitride Shi-Qing Wang SEMATECH, 2706 microscopy. It was found that nitrogen dissolves from TiN into Ti between 405 and 474 °C and a significant

  11. Aluminum nitride transitional layer for reducing dislocation density and cracking of AIGan epitaxial films

    DOE Patents [OSTI]

    Allerman, Andrew A. (Tijeras, NM); Crawford, Mary H. (Albuquerque, NM); Koleske, Daniel D. (Albuquerque, NM); Lee, Stephen R. (Albuquerque, NM)

    2011-03-29T23:59:59.000Z

    A denticulated Group III nitride structure that is useful for growing Al.sub.xGa.sub.1-xN to greater thicknesses without cracking and with a greatly reduced threading dislocation (TD) density.

  12. Structure and electrical characterization of gallium arsenide nanowires with different V/III ratio growth parameters

    SciTech Connect (OSTI)

    Muhammad, R.; Ahamad, R. [Sustainability Research Alliance, Universiti Teknologi Malaysia, 81310 Skudai, Johor (Malaysia); Ibrahim, Z.; Othaman, Z. [Physic Department, Faculty of Science, Universiti Teknologi Malaysia, 81310 Skudai, Johor (Malaysia)

    2014-03-05T23:59:59.000Z

    Gallium arsenide (GaAs) nanowires were grown vertically on GaAs(111)B substrate by gold-assisted using metal-organic chemical vapour deposition. Field-emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM) and conductivity atomic force microscopy (CAFM) analysis were carried out to investigate the effects of V/III ratio on structural properties and current-voltage changes in the wires. Results show that GaAs NWs grow preferably in the wurtzite crystal structure than zinc blende crystal structure with increasing V/III ratio. Additionally, CAFM studies have revealed that zincblende nanowires indicate ohmic characteristic compared to oscillation current occurred for wurtzite structures. The GaAs NWs with high quality structures are needed in solar cells technology for trapping energy that directly converts of sunlight into electricity with maximum capacity.

  13. Outdoor Performance of a Thin-Film Gallium-Arsenide Photovoltaic Module

    SciTech Connect (OSTI)

    Silverman, T. J.; Deceglie, M. G.; Marion, B.; Cowley, S.; Kayes, B.; Kurtz, S.

    2013-06-01T23:59:59.000Z

    We deployed a 855 cm2 thin-film, single-junction gallium arsenide (GaAs) photovoltaic (PV) module outdoors. Due to its fundamentally different cell technology compared to silicon (Si), the module responds differently to outdoor conditions. On average during the test, the GaAs module produced more power when its temperature was higher. We show that its maximum-power temperature coefficient, while actually negative, is several times smaller in magnitude than that of a Si module used for comparison. The positive correlation of power with temperature in GaAs is due to temperature-correlated changes in the incident spectrum. We show that a simple correction based on precipitable water vapor (PWV) brings the photocurrent temperature coefficient into agreement with that measured by other methods and predicted by theory. The low operating temperature and small temperature coefficient of GaAs give it an energy production advantage in warm weather.

  14. Analysis of gallium arsenide deposition in a horizontal chemical vapor deposition reactor using massively parallel computations

    SciTech Connect (OSTI)

    Salinger, A.G.; Shadid, J.N.; Hutchinson, S.A. [and others

    1998-01-01T23:59:59.000Z

    A numerical analysis of the deposition of gallium from trimethylgallium (TMG) and arsine in a horizontal CVD reactor with tilted susceptor and a three inch diameter rotating substrate is performed. The three-dimensional model includes complete coupling between fluid mechanics, heat transfer, and species transport, and is solved using an unstructured finite element discretization on a massively parallel computer. The effects of three operating parameters (the disk rotation rate, inlet TMG fraction, and inlet velocity) and two design parameters (the tilt angle of the reactor base and the reactor width) on the growth rate and uniformity are presented. The nonlinear dependence of the growth rate uniformity on the key operating parameters is discussed in detail. Efficient and robust algorithms for massively parallel reacting flow simulations, as incorporated into our analysis code MPSalsa, make detailed analysis of this complicated system feasible.

  15. Impurity-induced disorder in III-nitride materials and devices

    DOE Patents [OSTI]

    Wierer, Jr., Jonathan J; Allerman, Andrew A

    2014-11-25T23:59:59.000Z

    A method for impurity-induced disordering in III-nitride materials comprises growing a III-nitride heterostructure at a growth temperature and doping the heterostructure layers with a dopant during or after the growth of the heterostructure and post-growth annealing of the heterostructure. The post-growth annealing temperature can be sufficiently high to induce disorder of the heterostructure layer interfaces.

  16. Preparation of CIGS-based solar cells using a buffered electrodeposition bath

    DOE Patents [OSTI]

    Bhattacharya, Raghu Nath (Littleton, CO)

    2007-11-20T23:59:59.000Z

    A photovoltaic cell exhibiting an overall conversion efficiency of at least 9.0% is prepared from a copper-indium-gallium-diselenide thin film. The thin film is prepared by simultaneously electroplating copper, indium, gallium, and selenium onto a substrate using a buffered electro-deposition bath. The electrodeposition is followed by adding indium to adjust the final stoichiometry of the thin film.

  17. Enhanced thermoelectric properties in hybrid graphene-boron nitride nanoribbons

    E-Print Network [OSTI]

    Kaike Yang; Yuanping Chen; Roberto D'Agosta; Yuee Xie; Jianxin Zhong; Angel Rubio

    2012-04-06T23:59:59.000Z

    The thermoelectric properties of hybrid graphene-boron nitride nanoribbons (BCNNRs) are investigated using the non-equilibrium Green's function (NEGF) approach. We find that the thermoelectric figure of merit (ZT) can be remarkably enhanced by periodically embedding hexagonal BN (h-BN) into graphene nanoribbons (GNRs). Compared to pristine GNRs, the ZT for armchair-edged BCNNRs with width index 3p+2 is enhanced up to 10~20 times while the ZT of nanoribbons with other widths is enhanced just by 1.5~3 times. As for zigzag-edge nanoribbons, the ZT is enhanced up to 2~3 times. This improvement comes from the combined increase in the Seebeck coefficient and the reduction in the thermal conductivity outweighing the decrease in the electrical conductance. In addition, the effect of component ratio of h-BN on the thermoelectric transport properties is discussed. These results qualify BCNNRs as a promising candidate for building outstanding thermoelectric devices.

  18. Role of defects in III-nitride based electronics

    SciTech Connect (OSTI)

    HAN,JUNG; MYERS JR.,SAMUEL M.; FOLLSTAEDT,DAVID M.; WRIGHT,ALAN F.; CRAWFORD,MARY H.; LEE,STEPHEN R.; SEAGER,CARLETON H.; SHUL,RANDY J.; BACA,ALBERT G.

    2000-01-01T23:59:59.000Z

    The LDRD entitled ``Role of Defects in III-Nitride Based Devices'' is aimed to place Sandia National Laboratory at the forefront of the field of GaN materials and devices by establishing a scientific foundation in areas such as material growth, defect characterization/modeling, and processing (metalization and etching) chemistry. In this SAND report the authors summarize their studies such as (1) the MOCVD growth and doping of GaN and AlGaN, (2) the characterization and modeling of hydrogen in GaN, including its bonding, diffusion, and activation behaviors, (3) the calculation of energetic of various defects including planar stacking faults, threading dislocations, and point defects in GaN, and (4) dry etching (plasma etching) of GaN (n- and p-types) and AlGaN. The result of the first AlGaN/GaN heterojunction bipolar transistor is also presented.

  19. Enhanced thermoelectric properties in hybrid graphene-boron nitride nanoribbons

    E-Print Network [OSTI]

    Yang, Kaike; D'Agosta, Roberto; Xie, Yuee; Zhong, Jianxin; Rubio, Angel

    2012-01-01T23:59:59.000Z

    The thermoelectric properties of hybrid graphene-boron nitride nanoribbons (BCNNRs) are investigated using the non-equilibrium Green's function (NEGF) approach. We find that the thermoelectric figure of merit (ZT) can be remarkably enhanced by periodically embedding hexagonal BN (h-BN) into graphene nanoribbons (GNRs). Compared to pristine GNRs, the ZT for armchair-edged BCNNRs with width index 3p+2 is enhanced up to 10~20 times while the ZT of nanoribbons with other widths is enhanced just by 1.5~3 times. As for zigzag-edge nanoribbons, the ZT is enhanced up to 2~3 times. This improvement comes from the combined increase in the Seebeck coefficient and the reduction in the thermal conductivity outweighing the decrease in the electrical conductance. In addition, the effect of component ratio of h-BN on the thermoelectric transport properties is discussed. These results qualify BCNNRs as a promising candidate for building outstanding thermoelectric devices.

  20. High-Q terahertz metamaterial from superconducting niobium nitride films

    E-Print Network [OSTI]

    Zhang, C H; Jin, B B; Ji, Z M; Kang, L; Xu, W W; Chen, J; Wu, P H

    2011-01-01T23:59:59.000Z

    We present in this letter terahertz (THz) metamaterials with low ohmic losses made from low-temperature superconductor niobium nitride (NbN) films. The resonance properties are characterized by THz time-domain spectroscopy. The unloaded quality factor reaches as high as about 178 at 8 K with the resonance frequency at around 0.58 THz, which is about 24 times as many as gold metamaterials with the same structure. The unloaded quality factor also keeps high as the resonance frequency increases, which is about 90 at 1.02 THz that is close the gap frequency of NbN film. All these experimental observations are well understood in the framework of Bardeen-Cooper-Schrieffer theory and equivalent circuit model. Our work offers an efficient way to design and make high-performance THz electronic devices.

  1. Using indium tin oxide material to implement the imaging of microwave plasma ignition process

    SciTech Connect (OSTI)

    Wang, Qiang; Hou, Lingyun; Zhang, Guixin, E-mail: guixin@mail.tsinghua.edu.cn; Zhang, Boya; Liu, Cheng [Department of Electrical Engineering, Tsinghua University, Beijing 100084 (China); Wang, Zhi; Huang, Jian [State Key Laboratory of Automotive Safety and Energy, Tsinghua University, Beijing 100084 (China)

    2014-02-17T23:59:59.000Z

    In this paper, a method is introduced to get global observation of microwave plasma ignition process at high pressure. A microwave resonator was designed with an indium tin oxide coated glass at bottom. Microwave plasma ignition was implemented in methane and air mixture at 10 bars by a 2?ms-3?kW-2.45?GHz microwave pulse, and the high speed images of the ignition process were obtained. The images visually proved that microwave plasma ignition could lead to a multi-point ignition. The system may also be applied to obtain Schlieren images, which is commonly used to observe the development of flame kernel in an ignition process.

  2. High temperature mechanical performance of a hot isostatically pressed silicon nitride

    SciTech Connect (OSTI)

    Wereszczak, A.A.; Ferber, M.K.; Jenkins, M.G.; Lin, C.K.J. [and others] [and others

    1996-01-01T23:59:59.000Z

    Silicon nitride ceramics are an attractive material of choice for designers and manufacturers of advanced gas turbine engine components for many reasons. These materials typically have potentially high temperatures of usefulness (up to 1400{degrees}C), are chemically inert, have a relatively low specific gravity (important for inertial effects), and are good thermal conductors (i.e., resistant to thermal shock). In order for manufacturers to take advantage of these inherent properties of silicon nitride, the high-temperature mechanical performance of the material must first be characterized. The mechanical response of silicon nitride to static, dynamic, and cyclic conditions at elevated temperatures, along with reliable and representative data, is critical information that gas turbine engine designers and manufacturers require for the confident insertion of silicon nitride components into gas turbine engines. This final report describes the high-temperature mechanical characterization and analyses that were conducted on a candidate structural silicon nitride ceramic. The high-temperature strength, static fatigue (creep rupture), and dynamic and cyclic fatigue performance were characterized. The efforts put forth were part of Work Breakdown Structure Subelement 3.2.1, {open_quotes}Rotor Data Base Generation.{close_quotes} PY6 is comparable to other hot isostatically pressed (HIPed) silicon nitrides currently being considered for advanced gas turbine engine applications.

  3. Use of additives to improve microstructures and fracture resistance of silicon nitride ceramics

    DOE Patents [OSTI]

    Becher, Paul F. (Oak Ridge, TN); Lin, Hua-Tay (Oak Ridge, TN)

    2011-06-28T23:59:59.000Z

    A high-strength, fracture-resistant silicon nitride ceramic material that includes about 5 to about 75 wt-% of elongated reinforcing grains of beta-silicon nitride, about 20 to about 95 wt-% of fine grains of beta-silicon nitride, wherein the fine grains have a major axis of less than about 1 micron; and about 1 to about 15 wt-% of an amorphous intergranular phase comprising Si, N, O, a rare earth element and a secondary densification element. The elongated reinforcing grains have an aspect ratio of 2:1 or greater and a major axis measuring about 1 micron or greater. The elongated reinforcing grains are essentially isotropically oriented within the ceramic microstructure. The silicon nitride ceramic exhibits a room temperature flexure strength of 1,000 MPa or greater and a fracture toughness of 9 MPa-m.sup.(1/2) or greater. The silicon nitride ceramic exhibits a peak strength of 800 MPa or greater at 1200 degrees C. Also included are methods of making silicon nitride ceramic materials which exhibit the described high flexure strength and fracture-resistant values.

  4. Silver delafossite nitride, AgTaN{sub 2}?

    SciTech Connect (OSTI)

    Miura, Akira [Institute of Inorganic Chemistry, RWTH Aachen University, Landoltweg 1, 52074 Aachen (Germany); Department of Chemistry and Chemical Biology, Baker Laboratory, Cornell University, Ithaca, New York 14853 (United States); Lowe, Michael; Leonard, Brian M.; Subban, Chinmayee V. [Department of Chemistry and Chemical Biology, Baker Laboratory, Cornell University, Ithaca, New York 14853 (United States); Masubuchi, Yuji; Kikkawa, Shinichi [Graduate School of Engineering, Hokkaido University, N13W8, Kita-ku Sapporo 060-8628 (Japan); Dronskowski, Richard [Institute of Inorganic Chemistry, RWTH Aachen University, Landoltweg 1, 52074 Aachen (Germany); Hennig, Richard G. [Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States); Abruna, Hector D. [Department of Chemistry and Chemical Biology, Baker Laboratory, Cornell University, Ithaca, New York 14853 (United States); DiSalvo, Francis J., E-mail: fjd3@cornell.ed [Department of Chemistry and Chemical Biology, Baker Laboratory, Cornell University, Ithaca, New York 14853 (United States)

    2011-01-15T23:59:59.000Z

    A new silver nitride, AgTaN{sub 2}, was synthesized from NaTaN{sub 2} by a cation-exchange reaction, using a AgNO{sub 3}-NH{sub 4}NO{sub 3} flux at 175 {sup o}C. Its crystal structure type is delafossite (R3-bar m) with hexagonal lattice parameters of a=3.141(3) A, c=18.81(2) A, in which silver is linearly coordinated to nitrogen. Energy dispersive X-ray analysis and combustion nitrogen/oxygen analysis gave a composition with atomic ratios of Ag:Ta:N:O as 1.0:1.2(1):2.1(1):0.77(4), which is somewhat Ta rich and indicates some oxide formation. The X-ray photoelectron spectroscopy analysis showed a Ta- and O-rich surface and transmission electron microscope observation exhibited aggregates of ca. 4-5 nm-sized particles on the surface, which are probably related to the composition deviation from a AgTaN{sub 2}. The lattice parameters of stoichiometric AgTaN{sub 2} calculated by density functional theory agree with the experimental ones, but the possibility of some oxygen incorporation and/or silver deficiency is not precluded. -- Graphical abstract: A delafossite silver nitride, AgTaN{sub 2}, was synthesized from NaTaN{sub 2} by a cation-exchange reaction using a AgNO{sub 3}-NH{sub 4}NO{sub 3} flux. It contains N-Ag-N linear bonding. Display Omitted

  5. Structural tuning of residual conductivity in highly mismatched III-V layers

    DOE Patents [OSTI]

    Han, Jung (Albuquerque, NM); Figiel, Jeffrey J. (Albuquerque, NM)

    2002-01-01T23:59:59.000Z

    A new process to control the electrical conductivity of gallium nitride layers grown on a sapphire substrate has been developed. This process is based on initially coating the sapphire substrate with a thin layer of aluminum nitride, then depositing the gallium nitride thereon. This process allows one to controllably produce gallium nitride layers with resistivity varying over as much as 10 orders of magnitude, without requiring the introduction and activation of suitable dopants.

  6. Flexible inverted polymer solar cells with an indium-free tri-layer cathode

    SciTech Connect (OSTI)

    El Hajj, Ahmad; Lucas, Bruno, E-mail: bruno.lucas@unilim.fr; Schirr-Bonnans, Martin; Ratier, Bernard [XLIM-CNRS 7252, Université de Limoges, 123 avenue Albert Thomas, 87060 Limoges (France); Kraft, Thomas M. [XLIM-CNRS 7252, Université de Limoges, 123 avenue Albert Thomas, 87060 Limoges (France); Department of Chemistry, Chernoff Hall, Queen's University, Kingston, Ontario K7L 3N6 (Canada); Torchio, Philippe [Institut Matériaux Microélectronique Nanosciences de Provence, Aix-Marseille Université, IM2NP-CNRS 7334, Domaine Universitaire de Saint-Jérôme, Service 231, 13 397 Marseille Cedex 20 (France)

    2014-01-21T23:59:59.000Z

    Indium tin oxide (ITO)-free inverted polymer solar cells (PSCs) have been fabricated without the need of an additional electron transport layer. The indium-free transparent electrode consists of a tri-layer stack ZnO (30?nm)/Ag (14?nm)/ZnO (30?nm) deposited on glass and plastic substrates via ion-beam sputtering. The tri-layer electrodes exhibit similar physical properties to its ITO counterpart, specifically yielding high transmittance and low resistivity (76.5% T at 550?nm, R{sub sq} of 8 ?/?) on plastic substrates. The novel tri-layer electrode allows for the fabrication of inverted PSCs without the additional ZnO interfacial layer commonly deposited between ITO and the photoactive layer. This allows for the preparation of thinner plastic solar cells using less material than conventional architectures. Initial studies involving the newly realized architecture (tri-layer electrode/P3HT:PCBM/PEDOT:PSS/Ag) have shown great promise for the transition from ITO to other viable electrodes in organic electronics.

  7. Applicability of carbon and boron nitride nanotubes as biosensors: Effect of biomolecular adsorption on the transport properties of carbon and boron

    E-Print Network [OSTI]

    Pandey, Ravi

    Applicability of carbon and boron nitride nanotubes as biosensors: Effect of biomolecular;Applicability of carbon and boron nitride nanotubes as biosensors: Effect of biomolecular adsorption University, Houghton, Michigan 49931, USA 2 US Army Research Laboratory, Weapons and Materials Research

  8. EA-1686: Department of Energy Loan Guarantee to SoloPower Inc. for the Electrodeposition-based Copper indium gallium selenide (CIGS) Solar Technology Manufacturing Facility near San Jose, California

    Broader source: Energy.gov [DOE]

    EA cancelled due to a change in project scope; DOE prepared a categorical exclusion determination (8/15/11).

  9. Leaching of indium from obsolete liquid crystal displays: Comparing grinding with electrical disintegration in context of LCA

    SciTech Connect (OSTI)

    Dodbiba, Gjergj, E-mail: dodbiba@sys.t.u-tokyo.ac.jp [Department of System Innovation, Graduate School of Engineering, University of Tokyo (Japan); Nagai, Hiroki; Wang Lipang; Okaya, Katsunori; Fujita, Toyohisa [Department of System Innovation, Graduate School of Engineering, University of Tokyo (Japan)

    2012-10-15T23:59:59.000Z

    Highlights: Black-Right-Pointing-Pointer Two pre-treatment methods, prior to leaching of indium from obsolete LCD modules, were described. Black-Right-Pointing-Pointer Conventional grinding and electrical disintegration have been evaluated and compared in the context of LCA. Black-Right-Pointing-Pointer Experimental data on the leaching capacity for indium and the electricity consumption of equipment were inputted into the LCA model in order to compare the environmental performance of each method. Black-Right-Pointing-Pointer An estimate for the environmental performance was calculated as the sum of six impact categories. Black-Right-Pointing-Pointer Electrical disintegration method outperforms conventional grinding in all impact categories. - Abstract: In order to develop an effective recycling system for obsolete Liquid Crystal Displays (LCDs), which would enable both the leaching of indium (In) and the recovery of a pure glass fraction for recycling, an effective liberation or size-reduction method would be an important pre-treatment step. Therefore, in this study, two different types of liberation methods: (1) conventional grinding, and (2) electrical disintegration have been tested and evaluated in the context of Life Cycle Assessment (LCA). In other words, the above-mentioned methods were compared in order to find out the one that ensures the highest leaching capacity for indium, as well as the lowest environmental burden. One of the main findings of this study was that the electrical disintegration was the most effective liberation method, since it fully liberated the indium containing-layer, ensuring a leaching capacity of 968.5 mg-In/kg-LCD. In turn, the estimate for the environmental burden was approximately five times smaller when compared with the conventional grinding.

  10. NREL preprints for the 23rd IEEE Photovoltaic Specialists Conference

    SciTech Connect (OSTI)

    Fitzgerald, M. [ed.

    1993-05-01T23:59:59.000Z

    Topics covered include various aspects of solar cell fabrication and performance. Aluminium-gallium arsenides, cadmium telluride, amorphous silicon, and copper-indium-gallium selenides are all characterized in their applicability in solar cells.

  11. 2011 Minerals Yearbook U.S. Department of the Interior

    E-Print Network [OSTI]

    Cs) and optoelectronic devices [laser diodes, light-emitting diodes (lEDs), photodetectors, and solar cells]. Gallium solar energy systems by about 75%, and thereby allow copper-indium-gallium diselenide (CiGS) solar

  12. Investigation of buried homojunctions in p -InP formed during sputter deposition of both indium tin oxide and indium oxide

    SciTech Connect (OSTI)

    Gessert, T.A.; Li, X.; Wanlass, M.W.; Nelson, A.J.; Coutts, T.J. (Solar Energy Research Institute, Golden, CO (USA))

    1990-05-01T23:59:59.000Z

    Although it is apparent that direct current (dc) magnetron sputter deposition of indium tin oxide (ITO) leads to the formation of a buried homojunction in single crystal {ital p}-type InP, the actual mechanism of type conversion of the InP surface is not clear, nor is it immediately obvious how further improvements may be achieved. Previously, we have suggested that type conversion is caused by indiffusion of Sn during the ITO deposition process and additionally demonstrated that this effect is strengthened by the presence of hydrogen in the sputtering gas. Recently, however, efficiencies of almost 17% (Global) have been achieved for cells fabricated by sputter depositing In{sub 2}O{sub 3}(IO) alone, strongly suggesting that the Sn may not be an essential part of type conversion. In this work, a variety of electrical and optical techniques has been used to assess the changes at the ITO/InP and IO/InP interfaces. From these, it is concluded that several mechanisms, including passivation of acceptors by hydrogen and sputter damage,'' occur simultaneously. This analysis suggests several directions for further improvement of these devices.

  13. Polymerized carbon nitride nanobells G. Y. Zhang, X. C. Ma, D. Y. Zhong, and E. G. Wanga)

    E-Print Network [OSTI]

    Zhang, Guangyu

    Polymerized carbon nitride nanobells G. Y. Zhang, X. C. Ma, D. Y. Zhong, and E. G. Wanga) State Key Academy of Sciences, Beijing 100080, People's Republic of China Received 12 November 2001; accepted for publication 8 March 2002 Well-aligned carbon nitride nanotubes are fabricated by microwave plasma assisted

  14. Diffusion of nitrogen implanted in titanium nitride (TiN1-x) F. Abautret and P. Eveno

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    1113 Diffusion of nitrogen implanted in titanium nitride (TiN1- x) F. Abautret and P. Eveno The diffusion of nitrogen 15, implanted in non-stoichiometric titanium nitride single-crystals (03B4 - TiN1-x on i usion m m ri es compared with the oxides. No data are available about nitrogen (or titanium

  15. Single-Photon Detection, Kinetic Inductance, and Non-Equilibrium Dynamics in Niobium and Niobium Nitride Superconducting Nanowires

    E-Print Network [OSTI]

    Devoret, Michel H.

    Abstract Single-Photon Detection, Kinetic Inductance, and Non-Equilibrium Dynamics in Niobium and Niobium Nitride Superconducting Nanowires Anthony Joseph Annunziata 2010 This thesis is a study of superconducting niobium and niobium nitride nanowires used as single optical and near-infrared photon detectors

  16. hal-00132485,version1-21Feb2007 Liquid nitrogen to room temperature thermometry using niobium nitride thin films

    E-Print Network [OSTI]

    Boyer, Edmond

    hal-00132485,version1-21Feb2007 Liquid nitrogen to room temperature thermometry using niobium´eel, CNRS-UJF, 25 avenue des Martyrs, 38042 Grenoble, France (Dated: February 21, 2007) Niobium nitride thin, the interesting properties of niobium nitride (NbN) as well as amorphous Nb-Si have been ex- tensively used

  17. From localization to superconductivity in granular niobium nitride thin R. Cabanel (**), J. Chaussy, J. Mazuer and J. C. Villegier (1)

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    795 From localization to superconductivity in granular niobium nitride thin films (*) R. Cabanel 300 K les variations de la résistivité de films de nitrure de niobium préparés par pulvérisation.60 - 74.70D - 81.15C Introduction. Niobium nitride studies extensively grew during the past twenty years

  18. Graphitic carbon nitride materials: variation of structure and morphology and their use as metal-free catalysts

    E-Print Network [OSTI]

    properties of carbon nitrides, they show unexpected catalytic activity for a variety of reactions, such as for the activation of benzene, trimerization reactions, and also the activation of carbon dioxide. Model calculationsGraphitic carbon nitride materials: variation of structure and morphology and their use as metal

  19. HIGH-EFFICIENCY NITRIDE-BASED SOLID-STATE LIGHTING

    SciTech Connect (OSTI)

    Paul T. Fini; Shuji Nakamura

    2003-10-30T23:59:59.000Z

    In this second annual report we summarize the progress in the second-year period of Department of Energy contract DE-FC26-01NT41203, entitled ''High- Efficiency Nitride-Based Solid-State Lighting''. The two teams, from the University of California at Santa Barbara (Principle Investigator: Dr. Shuji Nakamura) and Rensselaer Polytechnic Institute (led by Dr. N. Narendran), are pursuing the goals of this contract from thin film growth, characterization, and packaging standpoints. The UCSB team has recently made significant progress in the development of light-emitting diodes (LEDs) with AlGaN active regions emitting in the ultraviolet (UV), resonant-cavity LEDs (RCLEDs), as well as lateral epitaxial overgrowth (LEO) techniques to obtain large-area non-polar GaN films with low average dislocation density. The Rensselaer team has benchmarked the performance of commercially available LED systems and has also conducted efforts to develop an optimized RCLED packaging scheme, including development of advanced epoxy encapsulant chemistries.

  20. Growth and control of microscale to nanoscale carbon nitride particles

    SciTech Connect (OSTI)

    Li, H. Y.; Shi, Y. C.; Feng, P. X. [Physics Department, Dong Hua University, Shanghai 200051 (China); University of Puerto Rico, Rio Piedras, San Juan, Puerto Rico 00931 (Puerto Rico) and Physics Department, Dong Hua University, Shanghai 200051 (China)

    2006-10-02T23:59:59.000Z

    Microscale to nanoscale carbon nitride (China) particles are prepared using plasma sputtering deposition techniques. The preferred orientation of nanoscale CN particle distributions is obtained. Particles are examined using scanning electron microscopy (SEM) and Raman scattering spectroscopy. SEM micrographs show that the CN particles are spherical with nearly the same diameters of 2.5 {mu}m prepared without setting bias voltage. The distribution of these particles is random. Setting bias voltage up to 5 kV, plasma sputtering deposition yields several dispersed ring patterns of particle distributions where many small groups of nanoscale particles are observed. Each group of these particles is in a sunflower type of distribution, in which the biggest (85 nm) particle at the center is surrounded by many small sizes (30 nm) of CN particles. Disk type of the particles with a diameter of 10 {mu}m is also observed at different deposition conditions. Typical carbon bands and CN band in the Raman spectra of the samples are identified. The intensity of the bands obviously varies at the different deposition conditions.

  1. Mechanical deformations of boron nitride nanotubes in crossed junctions

    SciTech Connect (OSTI)

    Zhao, Yadong; Chen, Xiaoming; Ke, Changhong, E-mail: cke@binghamton.edu [Department of Mechanical Engineering, State University of New York at Binghamton, Binghamton, New York 13902 (United States); Park, Cheol [NASA Langley Research Center, Hampton, Virginia 23681 (United States); Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, Virginia 22904 (United States); Fay, Catharine C. [NASA Langley Research Center, Hampton, Virginia 23681 (United States); Stupkiewicz, Stanislaw [Institute of Fundamental Technological Research, Warsaw (Poland)

    2014-04-28T23:59:59.000Z

    We present a study of the mechanical deformations of boron nitride nanotubes (BNNTs) in crossed junctions. The structure and deformation of the crossed tubes in the junction are characterized by using atomic force microscopy. Our results show that the total tube heights are reduced by 20%–33% at the crossed junctions formed by double-walled BNNTs with outer diameters in the range of 2.21–4.67?nm. The measured tube height reduction is found to be in a nearly linear relationship with the summation of the outer diameters of the two tubes forming the junction. The contact force between the two tubes in the junction is estimated based on contact mechanics theories and found to be within the range of 4.2–7.6 nN. The Young's modulus of BNNTs and their binding strengths with the substrate are quantified, based on the deformation profile of the upper tube in the junction, and are found to be 1.07?±?0.11 TPa and 0.18–0.29 nJ/m, respectively. Finally, we perform finite element simulations on the mechanical deformations of the crossed BNNT junctions. The numerical simulation results are consistent with both the experimental measurements and the analytical analysis. The results reported in this paper contribute to a better understanding of the structural and mechanical properties of BNNTs and to the pursuit of their applications.

  2. HIGH-EFFICIENCY NITRIDE-BASED SOLID-STATE LIGHTING

    SciTech Connect (OSTI)

    Dr. Paul T. Fini; Prof. Shuji Nakamura

    2002-04-30T23:59:59.000Z

    In this semiannual report we summarize the progress obtained in the first six months with the support of DoE contract No.DE-FC26-01NT41203, entitled ''High-Efficiency Nitride-Based Solid-State Lighting''. The two teams, from the University of California at Santa Barbara (Principle Investigator: Dr. Shuji Nakamura) and Rensselaer Polytechnic Institute (led by Dr. N. Narendran), are pursuing the goals of this contract from thin film growth, characterization, and packaging standpoints. The UCSB team has made significant progress in the development of GaN vertical cavity surface-emitting lasers (VCSELs) as well as light-emitting diodes (LEDs) with AlGaN active regions emitting in the ultraviolet (UV). The Rensselaer team has developed target specifications for some of the key parameters for the proposed solid-state lighting system, including a luminous flux requirement matrix for various lighting applications, optimal spectral power distributions, and the performance characteristics of currently available commercial LEDs for eventual comparisons to the devices developed in the scope of this project.

  3. HIGH-EFFICIENCY NITRIDE-BASED SOLID-STATE LIGHTING

    SciTech Connect (OSTI)

    Dr. Paul T. Fini; Prof. Shuji Nakamura

    2002-09-01T23:59:59.000Z

    In this annual report we summarize the progress obtained in the first year with the support of DoE contract No.DE-FC26-01NT41203, entitled ''High-Efficiency Nitride-Based Solid-State Lighting''. The two teams, from the University of California at Santa Barbara (Principle Investigator: Dr. Shuji Nakamura) and Rensselaer Polytechnic Institute (led by Dr. N. Narendran), are pursuing the goals of this contract from thin film growth, characterization, and packaging standpoints. The UCSB team has made significant progress in the development of GaN vertical cavity surface-emitting lasers (VCSELs) as well as light-emitting diodes (LEDs) with AlGaN active regions emitting in the ultraviolet (UV). The Rensselaer team has developed target specifications for some of the key parameters for the proposed solid-state lighting system, including a luminous flux requirement matrix for various lighting applications, optimal spectral power distributions, and the performance characteristics of currently available commercial LEDs for eventual comparisons to the devices developed in the scope of this project.

  4. High-efficiency solar cell and method for fabrication

    DOE Patents [OSTI]

    Hou, H.Q.; Reinhardt, K.C.

    1999-08-31T23:59:59.000Z

    A high-efficiency 3- or 4-junction solar cell is disclosed with a theoretical AM0 energy conversion efficiency of about 40%. The solar cell includes p-n junctions formed from indium gallium arsenide nitride (InGaAsN), gallium arsenide (GaAs) and indium gallium aluminum phosphide (InGaAlP) separated by n-p tunnel junctions. An optional germanium (Ge) p-n junction can be formed in the substrate upon which the other p-n junctions are grown. The bandgap energies for each p-n junction are tailored to provide substantially equal short-circuit currents for each p-n junction, thereby eliminating current bottlenecks and improving the overall energy conversion efficiency of the solar cell. Additionally, the use of an InGaAsN p-n junction overcomes super-bandgap energy losses that are present in conventional multi-junction solar cells. A method is also disclosed for fabricating the high-efficiency 3- or 4-junction solar cell by metal-organic chemical vapor deposition (MOCVD). 4 figs.

  5. High-efficiency solar cell and method for fabrication

    DOE Patents [OSTI]

    Hou, Hong Q. (Albuquerque, NM); Reinhardt, Kitt C. (Albuquerque, NM)

    1999-01-01T23:59:59.000Z

    A high-efficiency 3- or 4-junction solar cell is disclosed with a theoretical AM0 energy conversion efficiency of about 40%. The solar cell includes p-n junctions formed from indium gallium arsenide nitride (InGaAsN), gallium arsenide (GaAs) and indium gallium aluminum phosphide (InGaAlP) separated by n-p tunnel junctions. An optional germanium (Ge) p-n junction can be formed in the substrate upon which the other p-n junctions are grown. The bandgap energies for each p-n junction are tailored to provide substantially equal short-circuit currents for each p-n junction, thereby eliminating current bottlenecks and improving the overall energy conversion efficiency of the solar cell. Additionally, the use of an InGaAsN p-n junction overcomes super-bandgap energy losses that are present in conventional multi-junction solar cells. A method is also disclosed for fabricating the high-efficiency 3- or 4-junction solar cell by metal-organic chemical vapor deposition (MOCVD).

  6. Investigation on properties of ultrafast switching in a bulk gallium arsenide avalanche semiconductor switch

    SciTech Connect (OSTI)

    Hu, Long, E-mail: hulong-1226@126.com [Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049 (China); Science and Technology on High Power Microwave Laboratory, Northwest Institute of Nuclear Technology, Xi'an 710024 (China); Su, Jiancang; Ding, Zhenjie; Hao, Qingsong; Yuan, Xuelin [Science and Technology on High Power Microwave Laboratory, Northwest Institute of Nuclear Technology, Xi'an 710024 (China)

    2014-03-07T23:59:59.000Z

    Properties of ultrafast switching in a bulk gallium arsenide (GaAs) avalanche semiconductor switch based on semi-insulating wafer, triggered by an optical pulse, were analyzed using physics-based numerical simulations. It has been demonstrated that when a voltage with amplitude of 5.2?kV is applied, after an exciting optical pulse with energy of 1??J arrival, the structure with thickness of 650??m reaches a high conductivity state within 110 ps. Carriers are created due to photons absorption, and electrons and holes drift to anode and cathode terminals, respectively. Static ionizing domains appear both at anode and cathode terminals, and create impact-generated carriers which contribute to the formation of electron-hole plasma along entire channel. When the electric field in plasma region increases above the critical value (?4?kV/cm) at which the electrons drift velocity peaks, a domain comes into being. An increase in carrier concentration due to avalanche multiplication in the domains reduces the domain width and results in the formation of an additional domain as soon as the field outside the domains increases above ?4?kV/cm. The formation and evolution of multiple powerfully avalanching domains observed in the simulations are the physical reasons of ultrafast switching. The switch exhibits delayed breakdown with the characteristics affected by biased electric field, current density, and optical pulse energy. The dependence of threshold energy of the exciting optical pulse on the biased electric field is discussed.

  7. Electronic passivation of silicon surfaces by thin films of atomic layer deposited gallium oxide

    SciTech Connect (OSTI)

    Allen, T. G., E-mail: thomas.allen@anu.edu.au; Cuevas, A. [Research School of Engineering, Australian National University, Canberra 0200 (Australia)

    2014-07-21T23:59:59.000Z

    This paper proposes the application of gallium oxide (Ga{sub 2}O{sub 3}) thin films to crystalline silicon solar cells. Effective passivation of n- and p-type crystalline silicon surfaces has been achieved by the application of very thin Ga{sub 2}O{sub 3} films prepared by atomic layer deposition using trimethylgallium (TMGa) and ozone (O{sub 3}) as the reactants. Surface recombination velocities as low as 6.1?cm/s have been recorded with films less than 4.5?nm thick. A range of deposition parameters has been explored, with growth rates of approximately 0.2?Å/cycle providing optimum passivation. The thermal activation energy for passivation of the Si-Ga{sub 2}O{sub 3} interface has been found to be approximately 0.5?eV. Depassivation of the interface was observed for prolonged annealing at increased temperatures. The activation energy for depassivation was measured to be 1.9?eV.

  8. Gallium ion implantation greatly reduces thermal conductivity and enhances electronic one of ZnO nanowires

    SciTech Connect (OSTI)

    Xia, Minggang, E-mail: xiamg@mail.xjtu.edu.cn [Laboratory of Nanostructure and its Physics Properties, Department of Optical Information Science and Technology, Department of Applied Physics, and MOE Key Laboratory for Non-equilibrium Synthesis and Modulation of Condensed Matter, School of Science, Xi'an Jiaotong University, 710049 China (China); Department of Physics and Centre for Computational Science and Engineering, National University of Singapore, Singapore 117542 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Cheng, Zhaofang; Han, Jinyun; Zhang, Shengli [Laboratory of Nanostructure and its Physics Properties, Department of Optical Information Science and Technology, Department of Applied Physics, and MOE Key Laboratory for Non-equilibrium Synthesis and Modulation of Condensed Matter, School of Science, Xi'an Jiaotong University, 710049 China (China); Zheng, Minrui [Department of Physics and Centre for Computational Science and Engineering, National University of Singapore, Singapore 117542 (Singapore); Sow, Chorng-Haur [Department of Physics and Centre for Computational Science and Engineering, National University of Singapore, Singapore 117542 (Singapore); National University of Singapore Nanoscience and Nanotechnology Initiative, National University of Singapore, Singapore 117542 (Singapore); Thong, John T. L. [Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore); Li, Baowen [Department of Physics and Centre for Computational Science and Engineering, National University of Singapore, Singapore 117542 (Singapore); National University of Singapore Nanoscience and Nanotechnology Initiative, National University of Singapore, Singapore 117542 (Singapore); Center for Phononics and Thermal Energy Science, School of Physics Science and Engineering, Tongji University, Shanghai 200092 (China)

    2014-05-15T23:59:59.000Z

    The electrical and thermal conductivities are measured for individual zinc oxide (ZnO) nanowires with and without gallium ion (Ga{sup +}) implantation at room temperature. Our results show that Ga{sup +} implantation enhances electrical conductivity by one order of magnitude from 1.01 × 10{sup 3} ?{sup ?1}m{sup ?1} to 1.46 × 10{sup 4} ?{sup ?1}m{sup ?1} and reduces its thermal conductivity by one order of magnitude from 12.7 Wm{sup ?1}K{sup ?1} to 1.22 Wm{sup ?1}K{sup ?1} for ZnO nanowires of 100 nm in diameter. The measured thermal conductivities are in good agreement with those in theoretical simulation. The increase of electrical conductivity origins in electron donor doping by Ga{sup +} implantation and the decrease of thermal conductivity is due to the longitudinal and transverse acoustic phonons scattering by Ga{sup +} point scattering. For pristine ZnO nanowires, the thermal conductivity decreases only two times when its diameter reduces from 100 nm to 46 nm. Therefore, Ga{sup +}-implantation may be a more effective method than diameter reduction in improving thermoelectric performance.

  9. Crystal structure and electron microprobe analyses of a lanthanum lutetium gallium garnet

    SciTech Connect (OSTI)

    Parise, J.B.; Harlow, R.L.; Shannon, R.D. (Central Research and Development Department, E. I. DuPont De Nemours and Co., Experimental Station, Wilmington, Delaware 19880-0228 (United States)); Kwei, G.H. (LANSCE, MS-H805, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)); Allik, T.H. (Science Applications International Corporation, 1710 Goodridge Dr., P.O. Box 1303, McLean, Virginia 22102 (United States)); Armstrong, J.T. (Department of Geological and Planetary Sciences, California Institute of Technology, Pasadena, California 91125 (United States))

    1992-09-15T23:59:59.000Z

    Single-crystal electron microprobe analysis of a lanthanum lutetium gallium garnet has resulted in a composition of La{sub 2.37}Nd{sub 0.07}Pb{sub 0.01}Lu{sub 2.54}Cr{sub 0.01} Ga{sub 3.00}O{sub 12}. This composition gives better agreement between observed and calculated total dielectric polarizabilities than previously reported compositions (La{sub 2.26--2.32}Nd{sub 0.04}Lu{sub 2.57--2.63}Ga{sub 3.07}O{sub 12} by x-ray fluorescence and La{sub 2.655}Nd{sub 0.027}Lu{sub 2.656}Ga{sub 2.655}O{sub 12} by inductively coupled plasma analyses), and does not imply the crystal-chemically improbable presence of Lu{sup 3+} in the tetrahedral site. X-ray and neutron crystal-structure analyses have confirmed that little or no Lu resides in this site.

  10. Optimal composition of europium gallium oxide thin films for device applications

    SciTech Connect (OSTI)

    Wellenius, P.; Muth, J. F. [Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States); Smith, E. R. [Kratos Defense and Security Solutions, Inc., 5030 Bradford Drive, Huntsville, Alabama 35805 (United States); LeBoeuf, S. M. [Valencell, Inc., 920 Main Campus Drive, Raleigh, North Carolina 27615 (United States); Everitt, H. O. [Army Aviation and Missile RD and E Center, Redstone Arsenal, Alabama 35898 (United States) and Department of Physics, Duke University, Durham, North Carolina 27708 (United States)

    2010-05-15T23:59:59.000Z

    Europium gallium oxide (Eu{sub x}Ga{sub 1-x}){sub 2}O{sub 3} thin films were deposited on sapphire substrates by pulsed laser deposition with varying Eu content from x=2.4 to 20 mol %. The optical and physical effects of high europium concentration on these thin films were studied using photoluminescence (PL) spectroscopy, x-ray diffraction (XRD), and Rutherford backscattering spectrometry. PL spectra demonstrate that emission due to the {sup 5}D{sub 0} to {sup 7}F{sub J} transitions in Eu{sup 3+} grows linearly with Eu content up to 10 mol %. Time-resolved PL indicates decay parameters remain similar for films with up to 10 mol % Eu. At 20 mol %, however, PL intensity decreases substantially and PL decay accelerates, indicative of parasitic energy transfer processes. XRD shows films to be polycrystalline and beta-phase for low Eu compositions. Increasing Eu content beyond 5 mol % does not continue to modify the film structure and thus, changes in PL spectra and decay cannot be attributed to structural changes in the host. These data indicate the optimal doping for optoelectronic devices based on (Eu{sub x}Ga{sub 1-x}){sub 2}O{sub 3} thin films is between 5 and 10 mol %.

  11. Transparent and conductive indium doped cadmium oxide thin films prepared by pulsed filtered cathodic arc deposition

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Zhu, Yuankun; Mendelsberg, Rueben J.; Zhu, Jiaqi; Han, Jiecai; Anders, Andre

    2013-01-01T23:59:59.000Z

    Indium doped cadmium oxide (CdO:In) films with different In concentrations were prepared on low-cost glass substrates by pulsed filtered cathodic arc deposition (PFCAD). It is shown that polycrystalline CdO:In films with smooth surface and dense structure are obtained. In-doping introduces extra electrons leading to remarkable improvements of electron mobility and conductivity, as well as improvement in the optical transmittance due to the Burstein Moss effect. CdO:In films on glass substrates with thickness near 230 nm show low resistivity of 7.23 10-5 cm, high electron mobility of 142 cm2/Vs, and mean transmittance over 80percent from 500-1250 nm (including the glass substrate).more »These high quality pulsed arc-grown CdO:In films are potentially suitable for high efficiency multi-junction solar cells that harvest a broad range of the solar spectrum.« less

  12. Optimisation of the material properties of indium tin oxide layers for use in organic photovoltaics

    SciTech Connect (OSTI)

    Doggart, P.; Bristow, N.; Kettle, J., E-mail: j.kettle@bangor.ac.uk [School of Electronic Engineering, Bangor University, Dean St., Bangor, Gwynedd, Wales LL57 1UT (United Kingdom)

    2014-09-14T23:59:59.000Z

    The influence of indium tin oxide [(In{sub 2}O{sub 3}:Sn), ITO] material properties on the output performance of organic photovoltaic (OPV) devices has been modelled and investigated. In particular, the effect of altering carrier concentration (n), thickness (t), and mobility (?{sub e}) in ITO films and their impact on the optical performance, parasitic resistances and overall efficiency in OPVs was studied. This enables optimal values of these parameters to be calculated for solar cells made with P3HT:PC{sub 61}BM and PCPDTBT:PC{sub 71}BM active layers. The optimal values of n, t and ?{sub e} are not constant between different OPV active layers and depend on the absorption spectrum of the underlying active layer material system. Consequently, design rules for these optimal values as a function of donor bandgap in bulk-heterojunction active layers have been formulated.

  13. Contact resistance improvement using interfacial silver nanoparticles in amorphous indium-zinc-oxide thin film transistors

    SciTech Connect (OSTI)

    Xu, Rui; He, Jian [School of Engineering, Brown University, Providence, Rhode Island 02912 (United States); State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China (UESTC), Chengdu 610054 (China); Song, Yang [Department of Physics, Brown University, Providence, Rhode Island 02912 (United States); Li, Wei [State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China (UESTC), Chengdu 610054 (China); Zaslavsky, A. [School of Engineering, Brown University, Providence, Rhode Island 02912 (United States); Department of Physics, Brown University, Providence, Rhode Island 02912 (United States); Paine, D. C., E-mail: David-Paine@brown.edu [School of Engineering, Brown University, Providence, Rhode Island 02912 (United States)

    2014-09-01T23:59:59.000Z

    We describe an approach to reduce the contact resistance at compositional conducting/semiconducting indium-zinc-oxide (IZO) homojunctions used for contacts in thin film transistors (TFTs). By introducing silver nanoparticles (Ag NPs) at the homojunction interface between the conducting IZO electrodes and the amorphous IZO channel, we reduce the specific contact resistance, obtained by transmission line model measurements, down to ?10{sup ?2?}??cm{sup 2}, ?3 orders of magnitude lower than either NP-free homojunction contacts or solid Ag metal contacts. The resulting back-gated TFTs with Ag NP contacts exhibit good field effect mobility of ?27?cm{sup 2}/V?s and an on/off ratio >10{sup 7}. We attribute the improved contact resistance to electric field concentration by the Ag NPs.

  14. Appearance of acute gouty arthritis on indium-111-labeled leukocyte scintigraphy

    SciTech Connect (OSTI)

    Palestro, C.J.; Vega, A.; Kim, C.K.; Swyer, A.J.; Goldsmith, S.J. (Mt. Sinai Medical Center, New York, NY (USA))

    1990-05-01T23:59:59.000Z

    Indium-111-labeled leukocyte scintigraphy was performed on a 66-yr-old male with polyarticular acute gouty arthritis. Images revealed intense labeled leukocyte accumulation in a pattern indistinguishable from septic arthritis, in both knees and ankles, and the metatarsophalangeal joint of both great toes, all of which were involved in the acute gouty attack. Joint aspirate as well as blood cultures were reported as no growth; the patient was treated with intravenous colchicine and ACTH for 10 days with dramatic improvement noted. Labeled leukocyte imaging, repeated 12 days after the initial study, revealed near total resolution of joint abnormalities, concordant with the patient's clinical improvement. This case demonstrates that while acute gouty arthritis is a potential pitfall in labeled leukocyte imaging, in the presence of known gout, it may provide a simple, objective, noninvasive method of evaluating patient response to therapy.

  15. Transparent and conductive indium doped cadmium oxide thin films prepared by pulsed filtered cathodic arc deposition

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Zhu, Yuankun [Harbin Institute of Technology (China). Center for Composite Materials and Structures; Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Plasma Applications Group; Mendelsberg, Rueben J. [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Plasma Applications Group and Molecular Foundry; Zhu, Jiaqi [Harbin Institute of Technology (China). Center for Composite Materials and Structures; Han, Jiecai [Harbin Institute of Technology (China). Center for Composite Materials and Structures; Anders, Andre [Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Plasma Applications Group

    2013-01-01T23:59:59.000Z

    Indium doped cadmium oxide (CdO:In) films with different In concentrations were prepared on low-cost glass substrates by pulsed filtered cathodic arc deposition (PFCAD). It is shown that polycrystalline CdO:In films with smooth surface and dense structure are obtained. In-doping introduces extra electrons leading to remarkable improvements of electron mobility and conductivity, as well as improvement in the optical transmittance due to the Burstein Moss effect. CdO:In films on glass substrates with thickness near 230 nm show low resistivity of 7.23 10-5 cm, high electron mobility of 142 cm2/Vs, and mean transmittance over 80percent from 500-1250 nm (including the glass substrate). These high quality pulsed arc-grown CdO:In films are potentially suitable for high efficiency multi-junction solar cells that harvest a broad range of the solar spectrum.

  16. Synthesis of fine-grained .alpha.-silicon nitride by a combustion process

    DOE Patents [OSTI]

    Holt, J. Birch (San Jose, CA); Kingman, Donald D. (Danville, CA); Bianchini, Gregory M. (Livermore, CA)

    1990-01-01T23:59:59.000Z

    A combustion synthesis process for the preparation of .alpha.-silicon nitride and composites thereof is disclosed. Preparation of the .alpha.-silicon nitride comprises the steps of dry mixing silicon powder with an alkali metal azide, such as sodium azide, cold-pressing the mixture into any desired shape, or loading the mixture into a fused, quartz crucible, loading the crucible into a combustion chamber, pressurizing the chamber with nitrogen and igniting the mixture using an igniter pellet. The method for the preparation of the composites comprises dry mixing silicon powder (Si) or SiO.sub.2, with a metal or metal oxide, adding a small amount of an alkali metal azide such as sodium azide, introducing the mixture into a suitable combustion chamber, pressurizing the combustion chamber with nitrogen, igniting the mixture within the combustion chamber, and isolating the .alpha.-silicon nitride formed as a reaction product.

  17. The different adsorption mechanism of methane molecule onto a boron nitride and a graphene flakes

    SciTech Connect (OSTI)

    Seyed-Talebi, Seyedeh Mozhgan [Shahid Chamran University, Golestan boulevard, Ahvaz, Khouzestan (Iran, Islamic Republic of); Neek-Amal, M., E-mail: neekamal@srttu.edu [Shahid Rajaee Teacher Training University, Lavizan, Tehran (Iran, Islamic Republic of)

    2014-10-21T23:59:59.000Z

    Graphene and single layer hexagonal boron-nitride are two newly discovered 2D materials with wonderful physical properties. Using density functional theory, we study the adsorption mechanism of a methane molecule over a hexagonal flake of single layer hexagonal boron-nitride (h-BN) and compare the results with those of graphene. We found that independent of the used functional in our ab-initio calculations, the adsorption energy in the h-BN flake is larger than that for graphene. Despite of the adsorption energy profile of methane over a graphene flake, we show that there is a long range behavior beyond minimum energy in the adsorption energy of methane over h-BN flake. This result reveals the higher sensitivity of h-BN sheet to the adsorption of a typical closed shell molecule with respect to graphene. The latter gives insight in the recent experiments of graphene over hexagonal boron nitride.

  18. The internal-nitriding behavior of Co-Fe-Al alloys

    SciTech Connect (OSTI)

    Chen, I.C. [Raytheon Systems Co., El Segundo, CA (United States). Sensors and Electronics Systems] [Raytheon Systems Co., El Segundo, CA (United States). Sensors and Electronics Systems; Douglass, D.L. [Univ. of Arizona, Tucson, AZ (United States). Arizona Materials Labs.] [Univ. of Arizona, Tucson, AZ (United States). Arizona Materials Labs.

    1999-10-01T23:59:59.000Z

    Co-10Fe, Co-20Fe, and Co-40Fe alloys containing 3 at.% Al were internally nitrided in NH{sub 3}/H{sub 2} mixtures over the range 700--1000 C. The kinetics of thickening of the internal-reaction zone followed the parabolic rate law, suggesting that solid-state diffusion was rate controlling. Nitrogen permeabilities were obtained for each alloy. AlN was the only nitride to form for all materials and at all temperatures. At high temperature, the nitride precipitates formed hexagonal plates near the surface, the precipitates becoming more blocky near the reaction front. Precipitate size increased with increasing depth in the alloy and increasing temperature, because of competition between nucleation and growth processes. Increasing iron content increased the reaction kinetics due to increased nitrogen solubility with increasing iron content.

  19. (Data in metric tons, unless otherwise noted) Domestic Production and Use: No indium was recovered from ores in the United States in 1997. Domestically

    E-Print Network [OSTI]

    --United States: 1993 1994 1995 1996 1997e Production, refinery -- -- -- -- -- Imports for consumption 73.4 70 for the indium market remains promising. World Refinery Production, Reserves, and Reserve Base: Refinery

  20. Design and Synthesis of Plasmonic Core/Shell Nanorods for Light Trapping in Organic Photo-Voltaics, Non-Linear Optics and Photo-Thermal Tumor Therapy

    E-Print Network [OSTI]

    Jankovic, Vladan

    2013-01-01T23:59:59.000Z

    solar cells, developed in the 1980s and based on amorphous or polycrystalline silicon (Si), copper indium gallium (di)selenide (CIGS), and

  1. Microstructural characterization of silicon nitride ceramics processed by pressureless sintering, overpressure sintering, and sinter/HIP

    SciTech Connect (OSTI)

    Selkregg, K.R. (Oak Ridge National Lab., TN (USA)); More, K.L.; Seshadri, S.G.; McMurtry, C.H. (Carborundum Co., Niagara Falls, NY (USA))

    1990-01-01T23:59:59.000Z

    Silicon nitride ceramics of the same nominal sialon composition have been sintered under different conditions including atmospheric sintering, overpressure sintering, reaction bonded (nitrided pressureless sinter) and sinter/HIP cycles. The sintered ceramics, which exhibited dramatic differences in fracture toughness, have been characterized by x-ray diffraction, scanning electron microscopy, analytical transmission electron microscopy, and image analysis techniques. Fracture toughness data have been correlated to the microstructural and chemical analysis of the grain boundary phases. The microstructure was the strongest influencing factor on the observed fracture toughness difference. 5 refs., 5 tabs.

  2. Assessing cytotoxicity of boron nitride nanotubes: Interference with the MTT assay

    SciTech Connect (OSTI)

    Ciofani, Gianni, E-mail: g.ciofani@sssup.it [Italian Institute of Technology, Smart Materials Lab, Center of MicroBioRobotics at Scuola Superiore Sant'Anna, Viale Rinaldo Piaggio, 34, 56025 Pontedera (Pisa) (Italy)] [Italian Institute of Technology, Smart Materials Lab, Center of MicroBioRobotics at Scuola Superiore Sant'Anna, Viale Rinaldo Piaggio, 34, 56025 Pontedera (Pisa) (Italy); Danti, Serena; D'Alessandro, Delfo [Otology-Cochlear Implants, Cisanello Hospital, Via Paradisa 2, 56124 Pisa (Italy)] [Otology-Cochlear Implants, Cisanello Hospital, Via Paradisa 2, 56124 Pisa (Italy); Moscato, Stefania [Department of Human Morphology and Applied Biology, University of Pisa, Via Roma 55, 56126 Pisa (Italy)] [Department of Human Morphology and Applied Biology, University of Pisa, Via Roma 55, 56126 Pisa (Italy); Menciassi, Arianna [Italian Institute of Technology, Smart Materials Lab, Center of MicroBioRobotics at Scuola Superiore Sant'Anna, Viale Rinaldo Piaggio, 34, 56025 Pontedera (Pisa) (Italy) [Italian Institute of Technology, Smart Materials Lab, Center of MicroBioRobotics at Scuola Superiore Sant'Anna, Viale Rinaldo Piaggio, 34, 56025 Pontedera (Pisa) (Italy); CRIM Lab, Scuola Superiore Sant'Anna, Viale Rinaldo Piaggio, 34, 56025 Pontedera (Pisa) (Italy)

    2010-04-02T23:59:59.000Z

    Thanks to a non-covalent wrapping with glycol-chitosan, highly biocompatible and highly concentrated dispersions of boron nitride nanotubes were obtained and tested on human neuroblastoma cells. A systematic investigation of the cytotoxicity of these nanovectors with several complementary qualitative and quantitative assays allowed a strong interference with the MTT metabolic assay to be highlighted, similar to a phenomenon already observed for carbon nanotubes, that would wrongly suggest toxicity of boron nitride nanotubes. These results confirm the high complexity of these new nanomaterials, and the needing of extensive investigations on their exciting potential applications in the biomedical field.

  3. Efficient boron nitride nanotube formation via combined laser-gas flow levitation

    DOE Patents [OSTI]

    Whitney, R. Roy; Jordan, Kevin; Smith, Michael

    2014-03-18T23:59:59.000Z

    A process for producing boron nitride nanotubes and/or boron-carbon-nitrogen nanotubes of the general formula B.sub.xC.sub.yN.sub.z. The process utilizes a combination of laser light and nitrogen gas flow to support a boron ball target during heating of the boron ball target and production of a boron vapor plume which reacts with nitrogen or nitrogen and carbon to produce boron nitride nanotubes and/or boron-carbon-nitrogen nanotubes of the general formula B.sub.xC.sub.yN.sub.z.

  4. Thermal conductivity of ultra-thin chemical vapor deposited hexagonal boron nitride films

    SciTech Connect (OSTI)

    Alam, M. T.; Haque, M. A., E-mail: mah37@psu.edu [Mechanical and Nuclear Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States); Bresnehan, M. S.; Robinson, J. A. [Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA and The Center for Two-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States)] [Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA and The Center for Two-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States)

    2014-01-06T23:59:59.000Z

    Thermal conductivity of freestanding 10?nm and 20?nm thick chemical vapor deposited hexagonal boron nitride films was measured using both steady state and transient techniques. The measured value for both thicknesses, about 100?±?10?W m{sup ?1} K{sup ?1}, is lower than the bulk basal plane value (390?W m{sup ?1} K{sup ?1}) due to the imperfections in the specimen microstructure. Impressively, this value is still 100 times higher than conventional dielectrics. Considering scalability and ease of integration, hexagonal boron nitride grown over large area is an excellent candidate for thermal management in two dimensional materials-based nanoelectronics.

  5. Improved porous mixture of molybdenum nitride and tantalum oxide as a charge storage material

    SciTech Connect (OSTI)

    Deng, C.Z.; Pynenburg, R.A.J.; Tsai, K.C. [Pinnacle Research Inst., Inc., Los Gatos, CA (United States)

    1998-04-01T23:59:59.000Z

    High surface area {gamma}-molybdenum nitride has shown promise as a charge storage material. The addition of amorphous tantalum oxide to the molybdenum nitride system not only improves the film cohesion tremendously, but also widens the voltage stability window from 0.8 to 1.1 V. This occurs without adversely effecting the capacitance. Ultracapacitors, also called supercapacitors or electrochemical capacitors, are high power storage devices which have found application in products as diverse as cardiac pacemakers, cellular phones, electric vehicles, and air bags.

  6. Indium and impurity incorporation in InGaN films on polar, nonpolar, and semipolar GaN orientations grown by ammonia molecular beam epitaxy

    SciTech Connect (OSTI)

    Browne, David A.; Young, Erin C.; Lang, Jordan R.; Hurni, Christophe A.; Speck, James S. [Materials Department, University of California Santa Barbara, Santa Barbara, California 93106 (United States)

    2012-07-15T23:59:59.000Z

    The effects of NH{sub 3} flow, group III flux, and substrate growth temperature on indium incorporation and surface morphology have been investigated for bulk InGaN films grown by ammonia molecular beam epitaxy. The incorporation of unintentional impurity elements (H, C, O) in InGaN films was studied as a function of growth temperature for growth on polar (0001) GaN on sapphire templates, nonpolar (1010) bulk GaN, and semipolar (1122), (2021) bulk GaN substrates. Enhanced indium incorporation was observed on both (1010) and (2021) surfaces relative to c-plane, while reduced indium incorporation was observed on (1122) for co-loaded conditions. Indium incorporation was observed to increase with decreasing growth temperature for all planes, while being relatively unaffected by the group III flux rates for a 1:1 Ga:In ratio. Indium incorporation was found to increase at the expense of a decreased growth rate for higher ammonia flows; however, smooth surface morphology was consistently observed for growth on semipolar orientations. Increased concentrations of oxygen and hydrogen were observed on semipolar and nonpolar orientations with a clear trend of increased hydrogen incorporation with indium content.

  7. Desorption and sublimation kinetics for fluorinated aluminum nitride surfaces

    SciTech Connect (OSTI)

    King, Sean W., E-mail: sean.king@intel.com; Davis, Robert F. [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States); Nemanich, Robert J. [Department of Physics, North Carolina State University, Raleigh, North Carolina 27695 (United States)

    2014-09-01T23:59:59.000Z

    The adsorption and desorption of halogen and other gaseous species from surfaces is a key fundamental process for both wet chemical and dry plasma etch and clean processes utilized in nanoelectronic fabrication processes. Therefore, to increase the fundamental understanding of these processes with regard to aluminum nitride (AlN) surfaces, temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy (XPS) have been utilized to investigate the desorption kinetics of water (H{sub 2}O), fluorine (F{sub 2}), hydrogen (H{sub 2}), hydrogen fluoride (HF), and other related species from aluminum nitride thin film surfaces treated with an aqueous solution of buffered hydrogen fluoride (BHF) diluted in methanol (CH{sub 3}OH). Pre-TPD XPS measurements of the CH{sub 3}OH:BHF treated AlN surfaces showed the presence of a variety of Al-F, N-F, Al-O, Al-OH, C-H, and C-O surfaces species in addition to Al-N bonding from the AlN thin film. The primary species observed desorbing from these same surfaces during TPD measurements included H{sub 2}, H{sub 2}O, HF, F{sub 2}, and CH{sub 3}OH with some evidence for nitrogen (N{sub 2}) and ammonia (NH{sub 3}) desorption as well. For H{sub 2}O, two desorption peaks with second order kinetics were observed at 195 and 460?°C with activation energies (E{sub d}) of 51?±?3 and 87?±?5?kJ/mol, respectively. Desorption of HF similarly exhibited second order kinetics with a peak temperature of 475?°C and E{sub d} of 110?±?5?kJ/mol. The TPD spectra for F{sub 2} exhibited two peaks at 485 and 585?°C with second order kinetics and E{sub d} of 62?±?3 and 270?±?10?kJ/mol, respectively. These values are in excellent agreement with previous E{sub d} measurements for desorption of H{sub 2}O from SiO{sub 2} and AlF{sub x} from AlN surfaces, respectively. The F{sub 2} desorption is therefore attributed to fragmentation of AlF{sub x} species in the mass spectrometer ionizer. H{sub 2} desorption exhibited an additional high temperature peak at 910?°C with E{sub d}?=?370?±?10?kJ/mol that is consistent with both the dehydrogenation of surface AlOH species and H{sub 2} assisted sublimation of AlN. Similarly, N{sub 2} exhibited a similar higher temperature desorption peak with E{sub d}?=?535?±?40?kJ/mol that is consistent with the activation energy for direct sublimation of AlN.

  8. Shear strain mediated magneto-electric effects in composites of piezoelectric lanthanum gallium silicate or tantalate and ferromagnetic alloys

    SciTech Connect (OSTI)

    Sreenivasulu, G.; Piskulich, E.; Srinivasan, G., E-mail: srinivas@oakland.edu [Physics Department, Oakland University, Rochester, Michigan 48409 (United States); Qu, P.; Qu, Hongwei [Electrical and Computer Engineering, Oakland University, Rochester, Michigan 48309 (United States); Petrov, V. M. [Institute of Electronic Information Systems, Novgorod State University, Veliky Novgorod (Russian Federation); Fetisov, Y. K. [Moscow State Technical University of Radio Engineering, Electronics and Automation, Moscow 19454 (Russian Federation); Nosov, A. P. [Institute of Metal Physics, Ural Division of Russian Academy of Sciences, 18 S. Kovalevskaya St, Ekaterinburg 620990 (Russian Federation)

    2014-07-21T23:59:59.000Z

    Shear strain mediated magneto-electric (ME) coupling is studied in composites of piezoelectric Y-cut lanthanum gallium silicate (LGS) or tantalate (LGT) and ferromagnetic Fe-Co-V alloys. It is shown that extensional strain does not result in ME effects in these layered composites. Under shear strain generated by an ac and dc bias magnetic fields along the length and width of the sample, respectively, strong ME coupling is measured at low-frequencies and at mechanical resonance. A model is discussed for the ME effects. These composites of Y-cut piezoelectrics and ferromagnetic alloys are of importance for shear strain based magnetic field sensors.

  9. A numerical simulation study of gallium-phosphide/silicon heterojunction passivated emitter and rear solar cells

    SciTech Connect (OSTI)

    Wagner, Hannes [Department of Solar Energy, Institute Solid-State Physics, Leibniz University of Hannover, Appelstr. 2, 30167 Hannover (Germany); ARC Photovoltaics Centre of Excellence, University of New South Wales (UNSW), Sydney, NSW 2052 (Australia); Ohrdes, Tobias [Institute for Solar Energy Research Hamelin (ISFH), 31860 Emmerthal (Germany); Dastgheib-Shirazi, Amir [Div. Photovoltaics, Department of Physics, University of Konstanz, 78457 Konstanz (Germany); Puthen-Veettil, Binesh; König, Dirk [ARC Photovoltaics Centre of Excellence, University of New South Wales (UNSW), Sydney, NSW 2052 (Australia); Altermatt, Pietro P. [Department of Solar Energy, Institute Solid-State Physics, Leibniz University of Hannover, Appelstr. 2, 30167 Hannover (Germany)

    2014-01-28T23:59:59.000Z

    The performance of passivated emitter and rear (PERC) solar cells made of p-type Si wafers is often limited by recombination in the phosphorus-doped emitter. To overcome this limitation, a realistic PERC solar cell is simulated, whereby the conventional phosphorus-doped emitter is replaced by a thin, crystalline gallium phosphide (GaP) layer. The resulting GaP/Si PERC cell is compared to Si PERC cells, which have (i) a standard POCl{sub 3} diffused emitter, (ii) a solid-state diffused emitter, or (iii) a high efficiency ion-implanted emitter. The maximum efficiencies for these realistic PERC cells are between 20.5% and 21.2% for the phosphorus-doped emitters (i)–(iii), and up to 21.6% for the GaP emitter. The major advantage of this GaP hetero-emitter is a significantly reduced recombination loss, resulting in a higher V{sub oc}. This is so because the high valence band offset between GaP and Si acts as a nearly ideal minority carrier blocker. This effect is comparable to amorphous Si. However, the GaP layer can be contacted with metal fingers like crystalline Si, so no conductive oxide is necessary. Compared to the conventional PERC structure, the GaP/Si PERC cell requires a lower Si base doping density, which reduces the impact of the boron-oxygen complexes. Despite the lower base doping, fewer rear local contacts are necessary. This is so because the GaP emitter shows reduced recombination, leading to a higher minority electron density in the base and, in turn, to a higher base conductivity.

  10. Experimental Analysis of the Elastic Plastic Transition During Nanoindentation of Single Crystal a-Silicon Nitride

    SciTech Connect (OSTI)

    Jang, Jae-il [Hanyang University, Korea; Bei, Hongbin [ORNL; Becher, Paul F [ORNL; Pharr, George M [University of Tennessee, Knoxville (UTK) & Oak Ridge National Laboratory (ORNL)

    2012-01-01T23:59:59.000Z

    The elastic-to-plastic transition in single crystal a-silicon nitride was experimentally characterized through a series of nanoindentation experiments using a spherical indenter. The experimental results provide a quantitative description of the critical shear strengths for the transition, as well as estimates of the shear modulus and nanohardness of the material.

  11. Assessment of uranium-free nitride fuels for spent fuel transmutation in fast reactor systems

    E-Print Network [OSTI]

    Szakaly, Frank Joseph

    2004-09-30T23:59:59.000Z

    The purpose of this work is to investigate the implementation of nitride fuels containing little or no uranium in a fast-spectrum nuclear reactor to reduce the amount of plutonium and minor actinides in spent nuclear fuel destined for the Yucca...

  12. Effect of contact metals on the piezoelectric properties of aluminum nitride thin films

    SciTech Connect (OSTI)

    Harman, J.P.; Kabulski, A. (West Virginia U., Morgantown, WV); Pagan, V.R. (West Virginia U., Morgantown, WV); Famouri, K. (West Virginia U., Morgantown, WV); Kasarla, K.R.; Rodak, L.E. (West Virginia U., Morgantown, WV); Hensel, J.P.; Korakakis, D.

    2008-07-01T23:59:59.000Z

    The converse piezoelectric response of aluminum nitride evaluated using standard metal insulator semiconductor structures has been found to exhibit a linear dependence on the work function of the metal used as the top electrode. The apparent d33 of the 150–1100 nm films also depends on the dc bias applied to the samples.

  13. Effect of swift heavy ion irradiations in polycrystalline aluminum nitride J.C. Nappa,*

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    conductivity, aluminum nitride may be a serious candidate as fuel coating for the Gas Fast Reactor. However.41.Bm, 78.60.Kn, 78.20.Ci 1. Introduction Gas Fast Reactor (GFR) is one of the six new systems is also studied in the framework of fusion reactors, in which this material, thanks to its high electrical

  14. Supplemental Materials: Effective Cleaning of Hexagonal Boron Nitride for Graphene Devices

    E-Print Network [OSTI]

    Goldhaber-Gordon, David

    Supplemental Materials: Effective Cleaning of Hexagonal Boron Nitride for Graphene Devices Andrei G-mail: ag254@stanford.edu; goldhaber-gordon@stanford.edu We discuss in greater detail the sample preparation procedure and transport measure- ments of our graphene/h-BN devices. Flakes of h-BN were produced

  15. Spontaneous Spatial Alignment of Polymer Cylindrical Nanodomains on Silicon Nitride Gratings

    E-Print Network [OSTI]

    Sibener, Steven

    a simple method to align lying-down cylindrical domains of PS-b-PMMA in the trough regions of 555 nm deepSpontaneous Spatial Alignment of Polymer Cylindrical Nanodomains on Silicon Nitride Gratings Deepak to the orientation of the grating lines and essentially spans the width of the grating trough. The proposed mechanism

  16. Silicon-doped boron nitride coated fibers in silicon melt infiltrated composites

    DOE Patents [OSTI]

    Corman, Gregory Scot (Ballston Lake, NY); Luthra, Krishan Lal (Schenectady, NY)

    1999-01-01T23:59:59.000Z

    A fiber-reinforced silicon--silicon carbide matrix composite having improved oxidation resistance at high temperatures in dry or water-containing environments is produced. The invention also provides a method for protecting the reinforcing fibers in the silicon--silicon carbide matrix composites by coating the fibers with a silicon-doped boron nitride coating.

  17. Silicon-doped boron nitride coated fibers in silicon melt infiltrated composites

    DOE Patents [OSTI]

    Corman, Gregory Scot (Ballston Lake, NY); Luthra, Krishan Lal (Schenectady, NY)

    2002-01-01T23:59:59.000Z

    A fiber-reinforced silicon-silicon carbide matrix composite having improved oxidation resistance at high temperatures in dry or water-containing environments is produced. The invention also provides a method for protecting the reinforcing fibers in the silicon-silicon carbide matrix composites by coating the fibers with a silicon-doped boron nitride coating.

  18. Practical Issues for Atom Probe Tomography Analysis of III-Nitride Semiconductor Materials

    E-Print Network [OSTI]

    Tanga, Fengzai; Moodya, Michael P.; Martina, Tomas L.; Bagota, Paul A. J.; Kappersa, Menno J.; Oliver, Rachel A.

    2015-04-30T23:59:59.000Z

    study of Cu grains 385 (Kempshall, et al., 2001). In terms of binary III-nitrides, the metal–N bond length in the 386 wurtzite structure increases from AlN, to GaN and to InN (Ambacher, 1998), being 387 associated with corresponding bond energy of 2...

  19. Theoretical study of nonpolar surfaces of aluminum nitride: Zinc blende ,,110... and wurtzite ,,1010...

    E-Print Network [OSTI]

    Pandey, Ravi

    Theoretical study of nonpolar surfaces of aluminum nitride: Zinc blende ,,110... and wurtzite ,,101 structure and electronic properties of the nonpolar surfaces, namely zinc blende 110 and wurtzite (10 1 and small ther- mal expansion coefficient. At ambient conditions, AlN crys- tallizes in the wurtzite phase

  20. Line-source E beam crystallization of Si on silicon nitride layers

    SciTech Connect (OSTI)

    Knapp, J.A.; Picraux, S.T.; Lee, K.; Gibbons, J.F.; Sedgwick, T.O.; Depp, S.W.

    1981-01-01T23:59:59.000Z

    The use of a swept line-source electron beam is reported for liquid phase recrystallization of Si films on Si/sub 3/N/sub 4/ layers over Si substrates. For the case of 5000A of Si on 1000A of Si/sub 3/N/sub 4/ layers over Si the growth of Si crystalline regions as large as 0.5 x 5 mm of predominately (100) orientation normal to the film and (010) in the sweep direction has been demonstrated. The nucleation of grain growth for this case occurred at small defects in the nitride layer at the edge of the treated area, growing out as far as 500 ..mu..m over intact nitride. Thicker nitrides (2500A) remained intact at power densities useful for treating the Si film. For this thicker nitride non-seeded growth is demonstrated for single and repetitively melted Si. In all cases the surface morphology of the regrown regions is suggestive of rapid growth along <100> directions.

  1. CHARGE STABILITY IN LPCVD SILICON NITRIDE FOR SURFACE PASSIVATION OF SILICON SOLAR CELLS

    E-Print Network [OSTI]

    CHARGE STABILITY IN LPCVD SILICON NITRIDE FOR SURFACE PASSIVATION OF SILICON SOLAR CELLS Yongling Ren, Natalita M Nursam, Da Wang and Klaus J Weber Centre for Sustainable Energy Systems, College of Engineering and Computer Science, The Australian National University, Canberra, ACT 0200, Australia ABSTRACT

  2. Reversible Intercalation of Hexagonal Boron Nitride with Brnsted Nina I. Kovtyukhova,*,

    E-Print Network [OSTI]

    materials.1-3 Intercalation reactions are often used as the first step in exfoliation of lamellar crystals dichalogenides,10,12 and hexagonal boron nitride (h-BN)13-15 can be mechanically exfoliated to form crystalline, several solution-based chem- ical approaches have been studied.10,16-22 Among these, only exfoliation

  3. ORDER AND DISORDER IN CARBIDES AND NITRIDES Ch. H. DE NOVION and V. MAURICE

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    transition metals, rare earths and actinides react with carbon and nitrogen to form metallic carbides or nitrogen 2p atomic electron states : they may be described by a stacking of units consisting of a central and nitrides is their large composition range, for example Tico.,, to Tic,.,, for titanium mono- carbide

  4. Monolayer Passivation of Ge(100) Surface via Nitridation and Oxidation Joon Sung Leea,b

    E-Print Network [OSTI]

    Kummel, Andrew C.

    Monolayer Passivation of Ge(100) Surface via Nitridation and Oxidation Joon Sung Leea,b , Sarah R passivation of Ge(100) surface via formation of Ge-N and Ge-O surface species was studied using scanning cyclotron resonance (ECR) plasma source formed an ordered Ge-N structure on a Ge(100) surface at 500o C. DFT

  5. Epitaxial ternary nitride thin films prepared by a chemical solution method

    SciTech Connect (OSTI)

    Luo, Hongmei [Los Alamos National Laboratory; Feldmann, David M [Los Alamos National Laboratory; Wang, Haiyan [TEXAS A& M; Bi, Zhenxing [TEXAS A& M

    2008-01-01T23:59:59.000Z

    It is indispensable to use thin films for many technological applications. This is the first report of epitaxial growth of ternary nitride AMN2 films. Epitaxial tetragonal SrTiN2 films have been successfully prepared by a chemical solution approach, polymer-assisted deposition. The structural, electrical, and optical properties of the films are also investigated.

  6. Evaluation and silicon nitride internal combustion engine components. Final report, Phase I

    SciTech Connect (OSTI)

    Voldrich, W. [Allied-Signal Aerospace Co., Torrance, CA (United States). Garrett Ceramic Components Div.

    1992-04-01T23:59:59.000Z

    The feasibility of silicon nitride (Si{sub 3}N{sub 4}) use in internal combustion engines was studied by testing three different components for wear resistance and lower reciprocating mass. The information obtained from these preliminary spin rig and engine tests indicates several design changes are necessary to survive high-stress engine applications. The three silicon nitride components tested were valve spring retainers, tappet rollers, and fuel pump push rod ends. Garrett Ceramic Components` gas-pressure sinterable Si{sub 3}N{sub 4} (GS-44) was used to fabricate the above components. Components were final machined from densified blanks that had been green formed by isostatic pressing of GS-44 granules. Spin rig testing of the valve spring retainers indicated that these Si{sub 3}N{sub 4} components could survive at high RPM levels (9,500) when teamed with silicon nitride valves and lower spring tension than standard titanium components. Silicon nitride tappet rollers showed no wear on roller O.D. or I.D. surfaces, steel axles and lifters; however, due to the uncrowned design of these particular rollers the cam lobes indicated wear after spin rig testing. Fuel pump push rod ends were successful at reducing wear on the cam lobe and rod end when tested on spin rigs and in real-world race applications.

  7. Light emission from silicon-rich nitride nanostructures L. Dal Negro,a

    E-Print Network [OSTI]

    Light emission from silicon-rich nitride nanostructures L. Dal Negro,a J. H. Yi, and L. C-infrared emission, large absorption/ emission Stokes shift, and nanosecond recombination. Our results are supported a crucial role in the emission mechanism of SRN films. Light emission from SRN systems can provide

  8. Free Electron Laser Nitriding of Metals: From basis physics to industrial applications

    E-Print Network [OSTI]

    Rapin, Gerd

    Accelerator Facility, Free Electron Laser Group, Newport News, VA 23606, USA Abstract Titanium was laser-liquid interface energy and the strain. Further in- vestigations showed that the dendritic growth is beginning treatment, laser nitriding, titanium PACS: 81.65.Lp, 52.50.Jm, 61.80.Ba, 76.80.+y 1 Introduction Titanium

  9. Graphene field-effect transistors based on boron nitride gate dielectrics Inanc Meric1

    E-Print Network [OSTI]

    Shepard, Kenneth

    Graphene field-effect transistors based on boron nitride gate dielectrics Inanc Meric1 , Cory Dean1, 10027 Tel: (212) 854-2529, Fax: (212) 932-9421, Email: shepard@ee.columbia.edu Abstract Graphene field of graphene, as the gate dielectric. The devices ex- hibit mobility values exceeding 10,000 cm2 /V

  10. Disordered graphene and boron nitride in a microwave tight-binding analogue S. Barkhofen,1

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Disordered graphene and boron nitride in a microwave tight-binding analogue S. Barkhofen,1 M Sophia-Antipolis, 06108 Nice, France (Dated: December 20, 2012) Experiments on hexagonal graphene of the high flexibility of the discs positions, consequences of the disorder introduced in the graphene

  11. Characterization of multilayer nitride coatings by electron microscopy and modulus mapping

    SciTech Connect (OSTI)

    Pemmasani, Sai Pramod [International Advanced Research Centre for Powder Metallurgy and New Materials (ARCI), Balapur P.O., Hyderabad — 500005 India (India); School of Engineering Sciences and Technology, University of Hyderabad, Gachibowli, Hyderabad — 500046 India (India); Rajulapati, Koteswararao V. [School of Engineering Sciences and Technology, University of Hyderabad, Gachibowli, Hyderabad — 500046 India (India); Ramakrishna, M.; Valleti, Krishna [International Advanced Research Centre for Powder Metallurgy and New Materials (ARCI), Balapur P.O., Hyderabad — 500005 India (India); Gundakaram, Ravi C., E-mail: ravi.gundakaram@arci.res.in [International Advanced Research Centre for Powder Metallurgy and New Materials (ARCI), Balapur P.O., Hyderabad — 500005 India (India); Joshi, Shrikant V. [International Advanced Research Centre for Powder Metallurgy and New Materials (ARCI), Balapur P.O., Hyderabad — 500005 India (India)

    2013-07-15T23:59:59.000Z

    This paper discusses multi-scale characterization of physical vapour deposited multilayer nitride coatings using a combination of electron microscopy and modulus mapping. Multilayer coatings with a triple layer structure based on TiAlN and nanocomposite nitrides with a nano-multilayered architecture were deposited by Cathodic arc deposition and detailed microstructural studies were carried out employing Energy Dispersive Spectroscopy, Electron Backscattered Diffraction, Focused Ion Beam and Cross sectional Transmission Electron Microscopy in order to identify the different phases and to study microstructural features of the various layers formed as a result of the deposition process. Modulus mapping was also performed to study the effect of varying composition on the moduli of the nano-multilayers within the triple layer coating by using a Scanning Probe Microscopy based technique. To the best of our knowledge, this is the first attempt on modulus mapping of cathodic arc deposited nitride multilayer coatings. This work demonstrates the application of Scanning Probe Microscopy based modulus mapping and electron microscopy for the study of coating properties and their relation to composition and microstructure. - Highlights: • Microstructure of a triple layer nitride coating studied at multiple length scales. • Phases identified by EDS, EBSD and SAED (TEM). • Nanolayered, nanocomposite structure of the coating studied using FIB and TEM. • Modulus mapping identified moduli variation even in a nani-multilayer architecture.

  12. Atmospheric ageing of nanosized silicon nitride powders Janos Szepvolgyi,*a

    E-Print Network [OSTI]

    Gubicza, Jenõ

    . Introduction Silicon nitride powders produced in high temperature thermal plasmas by the vapour phase reaction of silicon tetrachloride and ammonia have many interesting properties including high purity, mainly amorphous powders subjected to atmospheric ageing, including amino, hydroxy and silanol groups, adsorbed CO2

  13. Method for Improving Mg Doping During Group-III Nitride MOCVD

    DOE Patents [OSTI]

    Creighton, J. Randall (Albuquerque, NM); Wang, George T. (Albuquerque, NM)

    2008-11-11T23:59:59.000Z

    A method for improving Mg doping of Group III-N materials grown by MOCVD preventing condensation in the gas phase or on reactor surfaces of adducts of magnesocene and ammonia by suitably heating reactor surfaces between the location of mixing of the magnesocene and ammonia reactants and the Group III-nitride surface whereon growth is to occur.

  14. Characterization of the nitrogen split interstitial defect in wurtzite aluminum nitride using density functional theory

    SciTech Connect (OSTI)

    Szállás, A., E-mail: szallas.attila@wigner.mta.hu [Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest (Hungary); Szász, K. [Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest (Hungary); Institute of Physics, Eötvös University, Pázmány Péter sétány 1/A, H-1117 Budapest (Hungary); Trinh, X. T.; Son, N. T.; Janzén, E. [Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping (Sweden); Gali, A., E-mail: gali.adam@wigner.mta.hu [Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest (Hungary); Department of Atomic Physics, Budapest University of Technology and Economics, Budafoki út 8, H-1111 Budapest (Hungary)

    2014-09-21T23:59:59.000Z

    We carried out Heyd-Scuseria-Ernzerhof hybrid density functional theory plane wave supercell calculations in wurtzite aluminum nitride in order to characterize the geometry, formation energies, transition levels, and hyperfine tensors of the nitrogen split interstitial defect. The calculated hyperfine tensors may provide useful fingerprint of this defect for electron paramagnetic resonance measurement.

  15. LPCVD SILICON NITRIDE-ON-SILICON SPACER TECHNOLOGY H. W. van Zeijl, L.K. Nanver

    E-Print Network [OSTI]

    Technische Universiteit Delft

    of obtaining self-aligned sub- lithographic dimensions. In many processes were spacers are applied to separate-etching affects the dimensions of the spacer which could lead to a lack of control over the spacer-related deviceLPCVD SILICON NITRIDE-ON-SILICON SPACER TECHNOLOGY H. W. van Zeijl, L.K. Nanver DIMES Delft

  16. Base-contact proximity effects in bipolar transistors with nitride-spacer technology

    E-Print Network [OSTI]

    Technische Universiteit Delft

    -lithographic dimensions. For example, in the double polysilicon bipolar transistor, spacers are used to separate the baseBase-contact proximity effects in bipolar transistors with nitride-spacer technology Henk van Zeijl-BJT's with spacer separated Al/Si emitter and base contacts are fabricated and characterized. Due to the proximity

  17. CO-IMPLANTATION AND DRY-ETCH DAMAGE RECOVERY BY PLASMA NITRIDATION IN GaN

    E-Print Network [OSTI]

    Pearton, Stephen J.

    CO-IMPLANTATION AND DRY-ETCH DAMAGE RECOVERY BY PLASMA NITRIDATION IN GaN BY DONALD G. KENT III ............................................................................ x CHAPTERS 1 INTRODUCTION ................................................................. 1 1.1 GaN Applications ........................................................ 1 1.2 GaN Material Issues

  18. Process for preparing a densified beta-phase silicon nitride material having at least one densification aid, and the material resulting therefrom

    SciTech Connect (OSTI)

    Edler, J.P.; Lisowsky, B.

    1993-05-25T23:59:59.000Z

    A process is described for preparing an alpha-phase silicon nitride material and thereafter sintering to a densified beta-phase silicon nitride material, comprising: (a) comminuting a slurry including a mixture of (i) silicon-containing powder, (ii) water, and (iii) at least one densification aid to aid in later densifying of the silicon nitride material, said comminuting being performed to form fresh, non-oxidized surfaces on the silicon powder and to allow substantial chemical reaction between the silicon and the water, said comminuting being performed to form fresh, non-oxidized surfaces on the silicon powder and to allow substantial chemical reaction between the silicon and the water, yielding a mass; (b) nitriding the mass by exposure to a sufficient amount of a nitriding gas including at least nitrogen at a sufficient temperature for a sufficient length of time to form a mass of substantially alpha-phase silicon nitride; and (c) sintering the resultant silicon nitride mass at a sintering holding temperature of from about 1,450 C to about 2,100 C for a sufficient length of time to convert the silicon nitride from a predominantly alpha-phase material to a predominantly densified beta phase silicon nitride material exhibiting a decrease in bulk volume of the silicon nitride due to the densification.

  19. Additive-assisted synthesis of boride, carbide, and nitride micro/nanocrystals

    SciTech Connect (OSTI)

    Chen, Bo [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China)] [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China); Yang, Lishan [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Shandong University), Ministry of Education, and School of Materials Science and Engineering, Shandong University, Jinan 250061 (China)] [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Shandong University), Ministry of Education, and School of Materials Science and Engineering, Shandong University, Jinan 250061 (China); Heng, Hua; Chen, Jingzhong; Zhang, Linfei; Xu, Liqiang [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China)] [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China); Qian, Yitai, E-mail: ytqian@sdu.edu.cn [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China)] [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China); Yang, Jian, E-mail: yangjian@sdu.edu.cn [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China)] [Key Laboratory of Colloid and Interface Chemistry (Shandong University), Ministry of Education, and Department of Chemistry, Shandong University, Jinan 250100 (China)

    2012-10-15T23:59:59.000Z

    General and simple methods for the syntheses of borides, carbides and nitrides are highly desirable, since those materials have unique physical properties and promising applications. Here, a series of boride (TiB{sub 2}, ZrB{sub 2}, NbB{sub 2}, CeB{sub 6}, PrB{sub 6}, SmB{sub 6}, EuB{sub 6}, LaB{sub 6}), carbide (SiC, TiC, NbC, WC) and nitride (TiN, BN, AlN, MgSiN{sub 2}, VN) micro/nanocrystals were prepared from related oxides and amorphous boron/active carbon/NaN{sub 3} with the assistance of metallic Na and elemental S. In-situ temperature monitoring showed that the reaction temperature could increase quickly to {approx}850 Degree-Sign C, once the autoclave was heated to 100 Degree-Sign C. Such a rapid temperature increase was attributed to the intense exothermic reaction between Na and S, which assisted the formation of borides, carbides and nitrides. The as-obtained products were characterized by XRD, SEM, TEM, and HRTEM techniques. Results in this report will greatly benefit the future extension of this approach to other compounds. - Graphical abstract: An additive-assisted approach is successfully developed for the syntheses of borides, carbides and nitrides micro/nanocrystals with the assistance of the exothermic reaction between Na and S. Highlights: Black-Right-Pointing-Pointer An additive-assisted synthesis strategy is developed for a number of borides, carbides and nitrides. Black-Right-Pointing-Pointer The reaction mechanism is demonstrated by the case of SiC nanowires. Black-Right-Pointing-Pointer The formation of SiC nanowires is initiated by the exothermic reaction of Na and S.

  20. Synthesis of Germanium-Gallium-Tellurium (Ge-Ga-Te) ceramics by ball-milling and sintering Mathieu Hubert, Elena Petracovschi, Xiang-Hua Zhang and Laurent Calvez*

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Synthesis of Germanium-Gallium-Tellurium (Ge-Ga-Te) ceramics by ball-milling and sintering Mathieu, France *laurent.calvez@univ-rennes1.fr Tel: (33) 2 23 23 67 13 Fax: (33) 2 23 23 56 11 Abstract, the semiconductor behavior of CdTe is exploited for the production of solar panels [1, 2], the rapid and reversible

  1. The reaction of carbon tetrachloride with gallium arsenide ,,001... L. Li., S, Gan, B.-K. Han, H. Qi, and R. F. Hicksa)

    E-Print Network [OSTI]

    Li, Lian

    The reaction of carbon tetrachloride with gallium arsenide ,,001... L. Li., S, Gan, B.-K. Han, H, California 90095 Received 26 June 1997; accepted for publication 30 December 1997 Carbon tetrachloride of steps during the vapor-phase epitaxial growth of III­V compound semiconductors.3,4 Carbon tetrachloride

  2. EFFECT OF PHASE SEPARATION ON PERFORMANCE OF III-V NITRIDE SOLAR CELLS Omkar Jani1

    E-Print Network [OSTI]

    Honsberg, Christiana

    of a suitable lattice- matched substrate. Although sapphire is the substrate of choice for growth of GaN of the epitaxy. A high n-type defect density in thick InGaN test structures compensates the p-type doping, which is confirmed for thin InGaN test structures with indium compositions as high as 28%, and the resultant test

  3. X-ray diffraction, optical microscopy, and microhardness studies of gas nitrided titanium alloys and titanium aluminide

    SciTech Connect (OSTI)

    Sha, W. [Metals Research Group, School of Planning, Architecture and Civil Engineering, The Queen's University of Belfast, Belfast BT7 1NN (United Kingdom)], E-mail: w.sha@qub.ac.uk; Haji Mat Don, M.A.; Mohamed, A.; Wu, X.; Siliang, B. [Metals Research Group, School of Planning, Architecture and Civil Engineering, The Queen's University of Belfast, Belfast BT7 1NN (United Kingdom); Zhecheva, A. [Sifco Applied Surface Concepts (UK) Ltd., Division of Sifco Industries, Inc., European Headquarters, 38 Walkers Road, Moons Moat North, Redditch, Worcestershire B98 9HD (United Kingdom)

    2008-03-15T23:59:59.000Z

    Thermochemical surface gas nitriding of {beta}21s, Timetal 205 and a Ti-Al alloy was conducted using differential scanning calorimeter equipment, in nominally pure nitrogen at 850 deg. C and 950 deg. C ({beta}21s), 730 deg. C and 830 deg. C (Timetal 205), and 950 deg. C and 1050 deg. C (Ti-Al) for 1 h, 3 h and 5 h. X-ray diffraction analyses showed new phases formed in the nitrided layer, depending on the alloy and the time and the temperature of nitriding. Microstructures were analyzed using optical microscopy. Cross-sectional microhardness profiles of cross-sectional samples after nitriding were obtained using a Knoop indenter.

  4. Aluminum nitride transitional layer for reducing dislocation density and cracking of AlGaN epitaxial films

    DOE Patents [OSTI]

    Allerman, Andrew A.; Crawford, Mary H.; Lee, Stephen R.

    2013-01-08T23:59:59.000Z

    A denticulated Group III nitride structure that is useful for growing Al.sub.xGa.sub.1-xN to greater thicknesses without cracking and with a greatly reduced threading dislocation (TD) density.

  5. Performance enhancement of organic light-emitting diodes by chlorine plasma treatment of indium tin oxide

    SciTech Connect (OSTI)

    Cao, X. A.; Zhang, Y. Q. [Department of Computer Science and Electrical Engineering, West Virginia University, Morgantown, West Virginia 26506 (United States)

    2012-04-30T23:59:59.000Z

    The characteristics of green phosphorescent organic light-emitting diodes (OLEDs) fabricated on ITO/glass substrates pretreated with low-energy O{sub 2} and Cl{sub 2} plasma were compared. At 20 mA/cm{sup 2}, the OLEDs with O{sub 2} and Cl{sub 2} plasma-treated indium tin oxide (ITO) had voltages of 9.6 and 7.6 eV, and brightness of 9580 and 12380 cd/m{sup 2}, respectively. At {approx}10{sup 4} cd/m{sup 2}, the latter had a 30% higher external quantum efficiency and a 74% higher power efficiency. Photoelectron spectroscopies revealed that Cl{sub 2} plasma treatment created stable In-Cl bonds and raised the work function of ITO by up to 0.9 eV. These results suggest that the better energy level alignment at the chlorinated ITO/organic interface enhances hole injection, leading to more efficient and more reliable operation of the OLEDs. The developed plasma chlorination process is very effective for surface modification of ITO and compatible with the fabrication of various organic electronics.

  6. Ag-Pd-Cu alloy inserted transparent indium tin oxide electrodes for organic solar cells

    SciTech Connect (OSTI)

    Kim, Hyo-Joong; Seo, Ki-Won; Kim, Han-Ki, E-mail: imdlhkkim@khu.ac.kr [Department of Advanced Materials Engineering for Information and Electronics, Kyung-Hee University, 1 Seocheon-dong, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of); Noh, Yong-Jin; Na, Seok-In [Graduate School of Flexible and Printable Electronics, Chonbuk National University, 664-14, Deokjin-dong, Jeonju-si, Jeollabuk-do 561-756 (Korea, Republic of)

    2014-09-01T23:59:59.000Z

    The authors report on the characteristics of Ag-Pd-Cu (APC) alloy-inserted indium tin oxide (ITO) films sputtered on a glass substrate at room temperature for application as transparent anodes in organic solar cells (OSCs). The effect of the APC interlayer thickness on the electrical, optical, structural, and morphological properties of the ITO/APC/ITO multilayer were investigated and compared to those of ITO/Ag/ITO multilayer electrodes. At the optimized APC thickness of 8?nm, the ITO/APC/ITO multilayer exhibited a resistivity of 8.55?×?10{sup ?5} ? cm, an optical transmittance of 82.63%, and a figure-of-merit value of 13.54?×?10{sup ?3} ?{sup ?1}, comparable to those of the ITO/Ag/ITO multilayer. Unlike the ITO/Ag/ITO multilayer, agglomeration of the metal interlayer was effectively relieved with APC interlayer due to existence of Pd and Cu elements in the thin region of the APC interlayer. The OSCs fabricated on the ITO/APC/ITO multilayer showed higher power conversion efficiency than that of OSCs prepared on the ITO/Ag/ITO multilayer below 10?nm due to the flatness of the APC layer. The improved performance of the OSCs with ITO/APC/ITO multilayer electrodes indicates that the APC alloy interlayer prevents the agglomeration of the Ag-based metal interlayer and can decrease the thickness of the metal interlayer in the oxide-metal-oxide multilayer of high-performance OSCs.

  7. Interfacial reactions between indium tin oxide and triphenylamine tetramer layers induced by photoirradiation

    SciTech Connect (OSTI)

    Satoh, Toshikazu; Fujikawa, Hisayoshi [Toyota Central R and D Laboratories, Inc., 41-1 Yokomichi, Nagakute, Aichi 480-1192 (Japan); Yamamoto, Ichiro; Murasaki, Takanori; Kato, Yoshifumi [Toyota Industries Corporation, 8 Chaya, Kyowa, Obu, Aichi 474-8601 (Japan)

    2008-05-01T23:59:59.000Z

    The effects of photoirradiation on the interfacial chemical reactions between indium tin oxide (ITO) films and layers of triphenylamine tetramer (TPTE) were investigated by using in situ x-ray photoelectron spectroscopy (XPS). Thin TPTE layers deposited onto sputter-deposited ITO films were irradiated with violet light-emitting diodes (peak wavelength: 380 nm). Shifts in the peak positions of spectral components that originated in the organic layer toward the higher binding-energy side were observed in the XPS profiles during the early stages of irradiation. No further peak shifts were observed after additional irradiation. An increase in the ratio of the organic component in the O 1s spectra was also observed during the photoirradiation. The ratio of the organic component increased in proportion to the cube root of the irradiation time. These results suggest that photoirradiation induces an increase in the height of the carrier injection barrier at the interface between TPTE and ITO in the early stages of the irradiation, possibly due to the rapid diffusion controlled formation and growth of an oxidized TPTE layer, which is considered to act as a high resistance layer.

  8. Measurement of the solar neutrino capture rate with gallium metal, part III

    SciTech Connect (OSTI)

    Elliott, Steven Ray [Los Alamos National Laboratory

    2008-01-01T23:59:59.000Z

    The Russian-American experiment SAGE began to measure the solar neutrino capture rate with a target of gallium metal in December 1989. Measurements have continued with only a few brief interruptions since that time. In this article we present the experimental improvements in SAGE since its last published data summary in December 2001. Assuming the solar neutrino production rate was constant during the period of data collection, combined analysis of 168 extractions through December 2007 gives a capture rate of solar neutrinos with energy more than 233 keY of 65.4{sup +3.1}{sub 3.0} (stat) {sup +2.6}{sub -2.8} (syst) SNU. The weighted average of the results of all three Ga solar neUlrino experiments, SAGE, Gallex, and GNO, is now 66.1 {+-} 3.1 SNU, where statistical and systematic uncertainties have been combined in quadrature. During the recent period of data collection a new test of SAGE was made with a reactor-produced {sup 37}Ar neutrino source. The ratio of observed to calculated rates in this experiment, combined with the measured rates in the three prior {sup 51}Cr neutrino-source experiments with Ga, is 0.88 {+-} 0.05. A probable explanation for this low result is that the cross section for neutrino capture by the two lowest-lying excited states in {sup 71}Ge has been overestimated. If we assume these cross sections are zero, then the standard solar model including neutrino oscillations predicts a total capture rate in Ga in the range of 63--67 SNU with an uncertainly of about 5%, in good agreement with experiment. We derive the current value of the pp neutrino flux produced in the Sun to be {phi}{sup {circle_dot}}{sub pp} = (6.1 {+-} 0.8) x 10{sup 10}/(cm{sup 2} s), which agrees well with the flux predicted by the standard solar model. Finally, we make several tests and show that the data are consistent with the assumption that the solar neutrino production rate is constant in time.

  9. A study into effects of CO{sub 2} laser melting of nitrided Ti-6Al-4V alloy

    SciTech Connect (OSTI)

    Mohammed, M.A. [Saudi Aramco, Dhahran (Saudi Arabia); Hashmi, M.S.J. [Dublin City Univ. (Ireland); Yilbas, B.S. [KFDUPM, Dhahran (Saudi Arabia)

    1997-10-01T23:59:59.000Z

    Multiple treatment of engineering surfaces can provide improved surface properties that cannot be obtained by a single surface treatment. Consequently, this study investigates the effects of laser melting on the microstructures of plasma nitrided Ti-6Al-4V alloy. The study consists of two parts. In the first part, governing equations pertinent to the laser melting process are developed, and temperature variation across the melted zone is predicted. In the second, an experiment is conducted to nitride the surface of the alloy through plasma nitriding process and to melt the plasma nitrided and the untreated alloy surfaces with a CO{sub 2} laser beam. The resulting metallurgical changes are examined using x-ray diffraction (XRD), energy-dispersive spectrometry (EDS), and scanning electron microscopy (SEM) techniques. It is shown that three distinct nitride layers are formed in the vicinity of the alloy surface prior to the laser melting process, and that after the melting process nitrided species are depleted while cellular and dendritic structures are formed. In addition, the structure consisting of transformed {beta} containing coarse and fine acicular {alpha} is observed in the melted regions.

  10. Structure analysis of aluminium silicon manganese nitride precipitates formed in grain-oriented electrical steels

    SciTech Connect (OSTI)

    Bernier, Nicolas, E-mail: n.bernier@yahoo.fr [OCAS N.V., ArcelorMittal Global R and D Gent, Pres. J.F. Kennedylaan 3, 9060 Zelzate (Belgium); Xhoffer, Chris [OCAS N.V., ArcelorMittal Global R and D Gent, Pres. J.F. Kennedylaan 3, 9060 Zelzate (Belgium); Van De Putte, Tom, E-mail: tom.vandeputte@arcelormittal.com [OCAS N.V., ArcelorMittal Global R and D Gent, Pres. J.F. Kennedylaan 3, 9060 Zelzate (Belgium); Galceran, Montserrat [Université Libre de Bruxelles, 4MAT (Materials Engineering, Characterization, Synthesis and Recycling), Avenue F.D. Roosevelt 50, 1050 Brussels (Belgium); CIC Energigune, Albert Einstein 48, 01510 Miñano (Álava) (Spain); Godet, Stéphane [Université Libre de Bruxelles, 4MAT (Materials Engineering, Characterization, Synthesis and Recycling), Avenue F.D. Roosevelt 50, 1050 Brussels (Belgium)

    2013-12-15T23:59:59.000Z

    We report a detailed structural and chemical characterisation of aluminium silicon manganese nitrides that act as grain growth inhibitors in industrially processed grain-oriented (GO) electrical steels. The compounds are characterised using energy dispersive X-ray spectrometry (EDX) and energy filtered transmission electron microscopy (EFTEM), while their crystal structures are analysed using X-ray diffraction (XRD) and TEM in electron diffraction (ED), dark-field, high-resolution and automated crystallographic orientation mapping (ACOM) modes. The chemical bonding character is determined using electron energy loss spectroscopy (EELS). Despite the wide variation in composition, all the precipitates exhibit a hexagonal close-packed (h.c.p.) crystal structure and lattice parameters of aluminium nitride. The EDX measurement of ? 900 stoichiometrically different precipitates indicates intermediate structures between pure aluminium nitride and pure silicon manganese nitride, with a constant Si/Mn atomic ratio of ? 4. It is demonstrated that aluminium and silicon are interchangeably precipitated with the same local arrangement, while both Mn{sup 2+} and Mn{sup 3+} are incorporated in the h.c.p. silicon nitride interstitial sites. The oxidation of the silicon manganese nitrides most likely originates from the incorporation of oxygen during the decarburisation annealing process, thus creating extended planar defects such as stacking faults and inversion domain boundaries. The chemical composition of the inhibitors may be written as (AlN){sub x}(SiMn{sub 0.25}N{sub y}O{sub z}){sub 1?x} with x ranging from 0 to 1. - Highlights: • We study the structure of (Al,Si,Mn)N inhibitors in grain oriented electrical steels. • Inhibitors have the hexagonal close-packed symmetry with lattice parameters of AlN. • Inhibitors are intermediate structures between pure AlN and (Si,Mn)N with Si/Mn ? 4. • Al and Si share the same local arrangement; Mn is incorporated in both Mn{sup 2+} and Mn{sup 3+}. • Oxygen incorporation is invoked to account for the thermal stability of (Al,Si,Mn)N.

  11. Indium incorporation and surface segregation during InGaN growth by molecular beam epitaxy: experiment and theory

    E-Print Network [OSTI]

    Feenstra, Randall

    of 670 C. Following the GaN growth with typical thickness of 200 nm, the substrate temperature is lowered to 580­620 C for the InGaN deposition. GaN(000 ) was grown at 720 C, on sapphire substrates, with pre-growth nitridation of the substrate performed at 1050 C and using a low-temperature GaN buffer layer grown at 550 C

  12. 1100/,,1102... twin boundaries in wurtzite ZnO and group-III-nitrides Yanfa Yan and M. M. Al-Jassim

    E-Print Network [OSTI]

    Pennycook, Steve

    11¯00/,,1102... twin boundaries in wurtzite ZnO and group-III-nitrides Yanfa Yan and M. M. Al that the same twin boundaries in wurtzite group-III-nitrides adopt the same structure, but the twin states in the band gap in either ZnO or the wurtzite group-III-nitrides. DOI: 10.1103/PhysRevB.71

  13. 2012 Solid-State Lighting Manufacturing R&D Workshop Presentations...

    Broader source: Energy.gov (indexed) [DOE]

    Frank Cerio, Veeco Instruments Advanced Epi Tools for Gallium Nitride Light Emitting Diode Devices Vivek Agrawal, Applied Materials Driving Down HB-LED Costs:...

  14. Effect of Thermal Annealing in Ammonia on the Properties of InGaN Nanowires with Different Indium Concentrations

    SciTech Connect (OSTI)

    Hahn, Cristopher; Cordones, Amy; Andrews, Sean; Gao, Hanwei; Fu, Anthony; Leone, Stephen; Yang, Peidong

    2012-10-02T23:59:59.000Z

    The utility of an annealing procedure in ammonia ambient is investigated for improving the optical characteristics of InxGa1?xN nanowires (0.07 ? x ? 0.42) grown on c-Al2O3 using a halide chemical vapor deposition method. Morphological studies using scanning electron microscopy confirm that the nanowire morphology is retained after annealing in ammonia at temperatures up to 800 ?C. However, significant indium etching and composition inhomogeneities are observed for higher indium composition nanowires (x = 0.28, 0.42), as measured by energy-dispersive X-ray spectroscopy and Z-contrast scanning transmission electron microscopy. Structural analyses, using X-ray diffraction and high-resolution transmission electron microscopy, indicate that this is a result of the greater thermal instability of higher indium composition nanowires. The effect of these structural changes on the optical quality of InGaN nanowires is examined using steady-state and time-resolved photoluminescence measurements. Annealing in ammonia enhances the integrated photoluminescence intensity of InxGa1?xN nanowires by up to a factor of 4.11 ? 0.03 (for x = 0.42) by increasing the rate of radiative recombination. Fitting of photoluminescence decay curves to a Kohlrausch stretched exponential indicates that this increase is directly related to a larger distribution of recombination rates from composition inhomogeneities caused by annealing. The results demonstrate the role of thermal instability on the improved optical properties of InGaN nanowires annealed in ammonia.

  15. Thermal transport in boron nitride nanotorus—towards a nanoscopic thermal shield

    SciTech Connect (OSTI)

    Loh, G. C., E-mail: jgloh@mtu.edu [Institute of High Performance Computing, 1 Fusionopolis Way, 16-16 Connexis, Singapore 138632 (Singapore); Department of Physics, Michigan Technological University, Houghton, Michigan 49931 (United States); Baillargeat, D. [CNRS-International-NTU-Thales Research Alliance (CINTRA), 50 Nanyang Drive, Singapore 637553 (Singapore)

    2013-11-14T23:59:59.000Z

    Nanotori, or nanorings, are topological variants of nanotubes and are conceived to have different properties from their tubular form. In this study, the toroidal arrangement of boron nitride is introduced. Using classical molecular dynamics simulations, the thermal behaviour (thermal conductivity and thermal stability) of the boron nitride nanotorus and its relationship with the structural characteristics are investigated. Its circumferential thermal rectification strength displays a linear dependence on the bending coefficient of the nanostructure. Surface kinks are relatively inconsequential on its circumferential mode of conduction, as compared to its axial sense. The circumferential conductivity in the diffusive regime is calculated to be approximately 10?W/m K, while the axial conductivity is more than tenfold of this value. All nanotori with different toroidal characters show excellent thermal stability at extremely high temperatures approaching 3400?K. With consideration to its favourable properties, a thermal shield made up of a parallel row of nanotori is proposed as a nanoscale thermal insulation device.

  16. The Durability of Various Crucible Materials for Aluminum Nitride Crystal growth by Sublimation

    SciTech Connect (OSTI)

    Liu,B.; Edgar, J.; Gu, Z.; Zhuang, D.; Raghothamachar, B.; Dudley, M.; Sarua, A.; Kuball, M.; Meyer, H.

    2004-01-01T23:59:59.000Z

    Producing high purity aluminum nitride crystals by the sublimation-recondensation technique is difficult due to the inherently reactive crystal growth environment, normally at temperature in excess of 2100 C. The durability of the furnace fixture materials (crucibles, retorts, etc.) at such a high temperature remains a critical problem. In the present study, the suitability of several refractory materials for AlN crystal growth is investigated, including tantalum carbide, niobium carbide, tungsten, graphite, and hot-pressed boron nitride. The thermal and chemical properties and performance of these materials in inert gas, as well as under AlN crystal growth conditions are discussed. TaC and NbC are the most stable crucible materials with very low elemental vapor pressures in the crystal growth system. Compared with refractory material coated graphite crucibles, HPBN crucible is better for AlN self-seeded growth, as crystals tend to nucleate in thin colorless platelets with low dislocation density.

  17. High density hexagonal boron nitride prepared by hot isostatic pressing in refractory metal containers

    DOE Patents [OSTI]

    Hoenig, Clarence L. (Livermore, CA)

    1992-01-01T23:59:59.000Z

    Boron nitride powder with less than or equal to the oxygen content of starting powder (down to 0.5% or less) is hot isostatically pressed in a refractory metal container to produce hexagonal boron nitride with a bulk density greater than 2.0 g/cc. The refractory metal container is formed of tantalum, niobium, tungsten, molybdenum or alloys thereof in the form of a canister or alternatively plasma sprayed or chemical vapor deposited onto a powder compact. Hot isostatic pressing at 1800.degree. C. and 30 KSI (206.8 MPa) argon pressure for four hours produces a bulk density of 2.21 g/cc. Complex shapes can be made.

  18. Phase transformations of nano-sized cubic boron nitride to white graphene and white graphite

    SciTech Connect (OSTI)

    Dang, Hongli; Liu, Yingdi; Xue, Wenhua; Anderson, Ryan S.; Sewell, Cody R. [Department of Physics and Engineering Physics, The University of Tulsa, Tulsa, Oklahoma 74104 (United States); Xue, Sha; Crunkleton, Daniel W. [Department of Chemical Engineering, The University of Tulsa, Tulsa, Oklahoma 74104 (United States); Institute of Alternate Energy, The University of Tulsa, Tulsa, Oklahoma 74104 (United States); Shen, Yaogen [Department of Mechanical and Biomedical Engineering, City University of Hong Kong, Kowloon (Hong Kong); Wang, Sanwu, E-mail: sanwu-wang@utulsa.edu [Department of Physics and Engineering Physics, The University of Tulsa, Tulsa, Oklahoma 74104 (United States); Institute of Alternate Energy, The University of Tulsa, Tulsa, Oklahoma 74104 (United States)

    2014-03-03T23:59:59.000Z

    We report quantum-mechanical investigations that predict the formation of white graphene and nano-sized white graphite from the first-order phase transformations of nano-sized boron nitride thin-films. The phase transformations from the nano-sized diamond-like structure, when the thickness d?>?1.4?nm, to the energetically more stable nano-sized white graphite involve low activation energies of less than 1.0?eV. On the other hand, the diamond-like structure transforms spontaneously to white graphite when d???1.4?nm. In particular, the two-dimensional structure with single-layer boron nitride, the so-called white graphene, could be formed as a result of such transformation.

  19. An experiment to test the viability of a gallium-arsenide cathode in a SRF electron gun

    SciTech Connect (OSTI)

    Kewisch,J.; Ben-Zvi, I.; Rao, T.; Burrill, A.; Pate, D.; Wu, Q.; Todd, R.; Wang, E.; Bluem, H.; Holmes, D.; Schultheiss, T.

    2009-05-04T23:59:59.000Z

    Strained gallium arsenide cathodes are used in electron guns for the production of polarized electrons. In order to have a sufficient quantum efficiency lifetime of the cathode the vacuum in the gun must be 10{sup -11} Torr or better, so that the cathode is not destroyed by ion back bombardment or through contamination with residual gases. All successful polarized guns are DC guns, because such vacuum levels can not be obtained in normal conducting RF guns. A superconductive RF gun may provide a sufficient vacuum level due to cryo-pumping of the cavity walls. We report on the progress of our experiment to test such a gun with normal GaAs-Cs crystals.

  20. A comparison of ZnO films deposited on indium tin oxide and soda lime glass under identical conditions

    SciTech Connect (OSTI)

    Deka, Angshuman; Nanda, Karuna Kar [Materials Research Centre, Indian Institute of Science, Bangalore - 560012 (India)

    2013-06-15T23:59:59.000Z

    ZnO films have been grown via a vapour phase transport (VPT) on soda lime glass (SLG) and indium-tin oxide (ITO) coated glass. ZnO film on ITO had traces of Zn and C which gives them a dark appearance while that appears yellowish-white on SLG. X-ray photoelectron spectroscopy studies confirm the traces of C in the form of C-O. The photoluminescence studies reveal a prominent green luminescence band for ZnO film on ITO.

  1. Integrated rig for the production of boron nitride nanotubes via the pressurized vapor-condenser method

    DOE Patents [OSTI]

    Smith, Michael W; Jordan, Kevin C

    2014-03-25T23:59:59.000Z

    An integrated production apparatus for production of boron nitride nanotubes via the pressure vapor-condenser method. The apparatus comprises: a pressurized reaction chamber containing a continuously fed boron containing target having a boron target tip, a source of pressurized nitrogen and a moving belt condenser apparatus; a hutch chamber proximate the pressurized reaction chamber containing a target feed system and a laser beam and optics.

  2. Dispersion engineered high-Q silicon Nitride Ring-Resonators via Atomic Layer Deposition

    E-Print Network [OSTI]

    Riemensberger, Johann; Herr, Tobias; Brasch, Victor; Holzwarth, Ronald; Kippenberg, Tobias J

    2012-01-01T23:59:59.000Z

    We demonstrate dispersion engineering of integrated silicon nitride based ring resonators through conformal coating with hafnium dioxide deposited on top of the structures via atomic layer deposition (ALD). Both, magnitude and bandwidth of anomalous dispersion can be significantly increased. All results are confirmed by high resolution frequency-comb-assisted-diode-laser spectroscopy and are in very good agreement with the simulated modification of the mode spectrum.

  3. Ligand-Based Reduction of CO2 to CO Mediated by an Anionic Niobium Nitride Complex

    E-Print Network [OSTI]

    Silvia, Jared Scott

    The terminal nitride anion complex [Na][N?Nb(N[tBu]Ar)3] ([Na][1], Ar = 3,5-Me2C6H3) reacts quantitatively with CO2 to give the carbamate complex [Na][O2CN?Nb(N[tBu]Ar)3] ([Na][O2C-1]). The structure of [Na][O2C-1] as the ...

  4. Use of free silicon in liquid phase sintering of silicon nitrides and sialons

    DOE Patents [OSTI]

    Raj, R.; Baik, S.

    1985-11-12T23:59:59.000Z

    This invention relates to the production of improved high density nitrogen based ceramics by liquid-phase densification of silicon nitride or a compound of silicon-nitrogen-oxygen-metal, e.g. a sialon. In the process and compositions of the invention minor amounts of finely divided silicon are employed together with the conventional liquid phase producing additives to enhance the densification of the resultant ceramic. 4 figs.

  5. Use of free silicon in liquid phase sintering of silicon nitrides and sialons

    DOE Patents [OSTI]

    Raj, Rishi (Ithaca, NY); Baik, Sunggi (Ithaca, NY)

    1985-11-12T23:59:59.000Z

    This invention relates to the production of improved high density nitrogen based ceramics by liquid-phase densification of silicon nitride or a compound of silicon-nitrogen-oxygen-metal, e.g. a sialon. In the process and compositions of the invention minor amounts of finely divided silicon are employed together with the conventional liquid phase producing additives to enhance the densification of the resultant ceramic.

  6. Ab initio study of phase transition of boron nitride between zinc-blende and rhombohedral structures

    SciTech Connect (OSTI)

    Nishida, S.; Funashima, H.; Sato, K.; Katayama-Yoshida, H. [Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531 (Japan)

    2013-12-04T23:59:59.000Z

    Boron nitride has polymorphs such as zinc-blende (c-BN), wurtzite (w-BN), rhombohedral (r-BN), and graphite-like (h-BN) forms. We simulate the direct conversion of r-BN to c-BN through electronic excitation. In our calculation, the conversion is made possible by increasing the hole concentration to over 0.06/atom. This conversion should be experimentally possible by hole-doping via an electric double layer transistor (EDLT) or capacitor.

  7. Partitioning of fission products from irradiated nitride fuel using inductive vaporization

    SciTech Connect (OSTI)

    Shcherbina, N.; Kulik, D.A.; Kivel, N.; Potthast, H.D.; Guenther-Leopold, I. [Paul Scherrer Institut - PSI, Villigen 5232 (Switzerland)

    2013-07-01T23:59:59.000Z

    Irradiated nitride fuel (Pu{sub 0.3}Zr{sub 0.7})N fabricated at PSI in frame of the CONFIRM project and having a burn-up of 10.4 % FIMA (Fission per Initial Metal Atom) has been investigated by means of inductive vaporization. The study of thermal stability and release behavior of Pu, Am, Zr and fission products (FPs) was performed in a wide temperature range (up to 2300 C. degrees) and on different redox conditions. On-line monitoring by ICP-MS detected low nitride stability and significant loss of Pu and Am at T>1900 C. degrees during annealing under inert atmosphere (Ar). The oxidative pre-treatment of nitride fuel on air at 1000 C. degrees resulted in strong retention of Pu and Am in the solid, as well as of most FPs. Thermodynamic modelling of elemental speciation using GEM-Selektor v.3 code (Gibbs Energy Minimization Selektor), supported by a comprehensive literature review on thermodynamics of actinides and FPs, revealed a number of binary compounds of Cs, Mo, Te, Sr and Ba to occur in the solid. Speciation of some FPs in the fuel is discussed and compared to earlier results of electron probe microanalysis (EPMA). Predominant vapor species predicted by GEM-Selektor calculations were Pu(g), Am(g) and N{sub 2}. Nitrogen can be completely released from the fuel after complete oxidation at 1000 C. degrees. With regard to the irradiated nitride reprocessing technology, this result can have an important practical application as an alternative way for {sup 15}N recovery. (authors)

  8. IMPROVEMENT OF CRYSTALLINE QUALITY OF GROUP III NITRIDES ON SAPPHIRE USING LOW TEMPERATURE INTERLAYERS

    E-Print Network [OSTI]

    Wetzel, Christian M.

    cm-2 that originate at the interface between GaN and the LT-BL and/or sapphire substrate [9,10]. TDs sapphire substrate and HT-GaN is called buffer layer (BL), while the LT-layer between HT-nitride is called on the sapphire substrate. The thickness was ~20nm. HT-GaN was grown at 1,050°C on the LT-BL. The thickness

  9. Direct measurement of the reactivity of NH and OH on a silicon nitride surface

    SciTech Connect (OSTI)

    Buss, R.J.; Ho, P.; Breiland, W.G. [Sandia National Labs., Albuquerque, NM (United States); Fisher, E.R. [Colorado State Univ., Fort Collins, CO (United States). Dept. of Chemistry

    1993-12-31T23:59:59.000Z

    In order to understand and successfully model the plasma processing used in device fabrication, it is important to determine the role played by plasma-generated radicals. The authors have used the IRIS technique (Imaging of Radicals Interacting Surfaces) to obtain the reactivity of NH (X{sup 3}S{sup {minus}}) and OH (X{sup 2}P) at a silicon nitride film surface while the film is exposed to a plasma-type environment. The reactivity of NH was found to be zero both during exposure of the surface to an NH{sub 3} plasma and during active deposition of silicon nitride from a SiH{sub 4}/NH{sub 3} plasma. No NH surface reaction was detectable for any rotational states of NH and over a surface temperature range of 300--700 K. OH radicals generated in an H{sub 2}O plasma were found to have a reactivity of 0.57 on a room temperature oxidized silicon nitride surface. The OH reactivity falls to zero as the temperature of the substrate is raised.

  10. MOCVD synthesis of group III-nitride heterostructure nanowires for solid-state lighting.

    SciTech Connect (OSTI)

    Wang, George T.; Creighton, James Randall; Talin, Albert Alec

    2006-11-01T23:59:59.000Z

    Solid-state lighting (SSL) technologies, based on semiconductor light emitting devices, have the potential to reduce worldwide electricity consumption by more than 10%, which could significantly reduce U.S. dependence on imported energy and improve energy security. The III-nitride (AlGaInN) materials system forms the foundation for white SSL and could cover a wide spectral range from the deep UV to the infrared. For this LDRD program, we have investigated the synthesis of single-crystalline III-nitride nanowires and heterostructure nanowires, which may possess unique optoelectronic properties. These novel structures could ultimately lead to the development of novel and highly efficient SSL nanodevice applications. GaN and III-nitride core-shell heterostructure nanowires were successfully synthesized by metal organic chemical vapor deposition (MOCVD) on two-inch wafer substrates. The effect of process conditions on nanowire growth was investigated, and characterization of the structural, optical, and electrical properties of the nanowires was also performed.

  11. Transmission electron microscopy investigation of acicular ferrite precipitation in {gamma}'-Fe{sub 4}N nitride

    SciTech Connect (OSTI)

    Xiong, X.C., E-mail: xiaochuan.xiong@sjtu.edu.cn [Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China); Institut Jean Lamour, UMR 7198 CNRS, Nancy-Universite, UPV-Metz, Ecole des Mines de Nancy, Parc de Saurupt CS 14234, F-54042 Nancy Cedex (France); Redjaimia, A. [Institut Jean Lamour, UMR 7198 CNRS, Nancy-Universite, UPV-Metz, Ecole des Mines de Nancy, Parc de Saurupt CS 14234, F-54042 Nancy Cedex (France); Goune, M. [Institut Jean Lamour, UMR 7198 CNRS, Nancy-Universite, UPV-Metz, Ecole des Mines de Nancy, Parc de Saurupt CS 14234, F-54042 Nancy Cedex (France); ArcelorMittal SA, Voie Romaine, BP 30320, F-57283 Maizieres-les-Metz (France)

    2010-11-15T23:59:59.000Z

    Acicular-shaped crystals precipitate from {gamma}'-Fe{sub 4}N nitride in an iron-nitrogen alloy and were identified by electron microdiffraction as {alpha}-ferrite. Acicular ferrite develops both the Nishiyama-Wassermann and the Kurdjumov-Sachs orientation relationships with {gamma}'-Fe{sub 4}N nitride. These orientation relationships were discussed in terms of the symmetry theory. The driving force for acicular ferrite formation was related to the increasing nitrogen content of {gamma}'-Fe{sub 4}N, in equilibrium with {alpha}-ferrite, with decreasing temperature. The passage from lamellar to acicular structure in Fe-N system was proposed. - Research Highlights: {yields} Acicular crystals precipitate from pearlitic{gamma}'-Fe{sub 4}N nitride in an iron-nitrogen alloy and were identified by electron microdiffraction as acicular ferrite. {yields} The crystal structure, orientation relationships with the matrix and morphologies of acicular ferrite, were studied by transmission electron microscopy. {yields} The driving force for the formation of acicular ferrite is related to the temperature dependence of nitrogen content of {gamma}'-Fe{sub 4}N, in equilibrium with ferrite. {yields} The passage from the pearlitic structure to the acicular structure in the present iron-nitrogen alloy was proposed.

  12. Behavior of molybdenum nitrides as materials for electrochemical capacitors: Comparison with ruthenium oxide

    SciTech Connect (OSTI)

    Liu, T.C.; Pell, W.G.; Conway, B.E. [Univ. of Ottawa, Ontario (Canada). Dept. of Chemistry; Roberson, S.L. [North Carolina State Univ., Raleigh, NC (United States). Dept. of Materials Science and Engineering

    1998-06-01T23:59:59.000Z

    Ruthenium oxide (RuO{sub 2}), formed as a thin film on a Ru or Ti metal substrate, exhibits a large specific (cm{sup {minus}2}) and almost constant, electrochemical capacitance over a 1.35 V range in aqueous H{sub 2}SO{sub 4}. This behavior has led to its investigation and use as a material for fabrication of supercapacitor devices. However, its cost has encouraged search for other materials exhibiting similar behavior. Work reported in the present paper evaluates two nitrides of Mo, Mo{sub 2}N and MoN, as substitutes for RuO{sub 2}. It is shown that very similar capacitance behavior to that of RuO{sub 2} films arises, e.g., in cyclic voltammetry and dc charging curves; in the former, almost mirror-image anodic and cathodic current-response profiles, characteristic of a capacitor, arise. However, the nitride materials have a substantially smaller voltage operating range of only some 0.7 V due to electrochemical decomposition above ca. 0.7 V vs. RHE. This limits their usefulness as a substitute for RuO{sub 2}. Of interest is that the nitride films exhibit potential-decay and potential-recovery on open circuit after respective charge and forced discharge. The decay and recovery processes are logarithmic in time, indicating the role of internal faradaic charge redistribution processes.

  13. Analytical and experimental evaluation of joining silicon carbide to silicon carbide and silicon nitride to silicon nitride for advanced heat engine applications Phase 2. Final report

    SciTech Connect (OSTI)

    Sundberg, G.J.; Vartabedian, A.M.; Wade, J.A.; White, C.S. [Norton Co., Northboro, MA (United States). Advanced Ceramics Div.

    1994-10-01T23:59:59.000Z

    The purpose of joining, Phase 2 was to develop joining technologies for HIP`ed Si{sub 3}N{sub 4} with 4wt% Y{sub 2}O{sub 3} (NCX-5101) and for a siliconized SiC (NT230) for various geometries including: butt joins, curved joins and shaft to disk joins. In addition, more extensive mechanical characterization of silicon nitride joins to enhance the predictive capabilities of the analytical/numerical models for structural components in advanced heat engines was provided. Mechanical evaluation were performed by: flexure strength at 22 C and 1,370 C, stress rupture at 1,370 C, high temperature creep, 22 C tensile testing and spin tests. While the silicon nitride joins were produced with sufficient integrity for many applications, the lower join strength would limit its use in the more severe structural applications. Thus, the silicon carbide join quality was deemed unsatisfactory to advance to more complex, curved geometries. The silicon carbide joining methods covered within this contract, although not entirely successful, have emphasized the need to focus future efforts upon ways to obtain a homogeneous, well sintered parent/join interface prior to siliconization. In conclusion, the improved definition of the silicon carbide joining problem obtained by efforts during this contract have provided avenues for future work that could successfully obtain heat engine quality joins.

  14. Power mixture and green body for producing silicon nitride base articles of high fracture toughness and strength

    DOE Patents [OSTI]

    Huckabee, M.L.; Buljan, S.T.; Neil, J.T.

    1991-09-17T23:59:59.000Z

    A powder mixture and a green body for producing a silicon nitride-based article of improved fracture toughness and strength are disclosed. The powder mixture includes (a) a bimodal silicon nitride powder blend consisting essentially of about 10-30% by weight of a first silicon nitride powder of an average particle size of about 0.2 [mu]m and a surface area of about 8-12m[sup 2]g, and about 70-90% by weight of a second silicon nitride powder of an average particle size of about 0.4-0.6 [mu]m and a surface area of about 2-4 m[sup 2]/g, (b) about 10-50 percent by volume, based on the volume of the densified article, of refractory whiskers or fibers having an aspect ratio of about 3-150 and having an equivalent diameter selected to produce in the densified article an equivalent diameter ratio of the whiskers or fibers to grains of silicon nitride of greater than 1.0, and (c) an effective amount of a suitable oxide densification aid. The green body is formed from the powder mixture, an effective amount of a suitable oxide densification aid, and an effective amount of a suitable organic binder. No Drawings

  15. Aluminum Nitride Thin Films on Titanium for Piezoelectric MEMS Applications Seth Boeshore, Emily Parker, Vanni Lughi, Noel C. MacDonald

    E-Print Network [OSTI]

    MacDonald, Noel C.

    Aluminum Nitride Thin Films on Titanium for Piezoelectric MEMS Applications Seth Boeshore, Emily nitride thin films have been deposited onto titanium substrates for the purpose of fabricating piezoelectric MEMS. Titanium is a new and attractive platform for MEMS because of its corrosion resistance

  16. Role of silicon excess in Er-doped silicon-rich nitride light emitting devices at 1.54??m

    SciTech Connect (OSTI)

    Ramírez, J. M., E-mail: jmramirez@el.ub.edu; Berencén, Y.; Garrido, B. [MIND-IN2UB, Department Electrònica, Universitat de Barcelona, Martí i Franquès 1, Barcelona 08028 (Spain); Cueff, S. [Institut des Nanotechnologies de Lyon, École Centrale de Lyon, Écully 69134 (France); Labbé, C. [Centre de Recherche sur les Ions, les Matériaux et la Photonique (CIMAP), UMR 6252 CNRS/CEA/Ensicaen/UCBN, Caen 14050 (France)

    2014-08-28T23:59:59.000Z

    Erbium-doped silicon-rich nitride electroluminescent thin-films emitting at 1.54??m have been fabricated and integrated within a metal-oxide-semiconductor structure. By gradually varying the stoichiometry of the silicon nitride, we uncover the role of silicon excess on the optoelectronic properties of devices. While the electrical transport is mainly enabled in all cases by Poole-Frenkel conduction, power efficiency and conductivity are strongly altered by the silicon excess content. Specifically, the increase in silicon excess remarkably enhances the conductivity and decreases the charge trapping; however, it also reduces the power efficiency. The main excitation mechanism of Er{sup 3+} ions embedded in silicon-rich nitrides is discussed. The optimum Si excess that balances power efficiency, conductivity, and charge trapping density is found to be close to 16%.

  17. Substrate nitridation induced modulations in transport properties of wurtzite GaN/p-Si (100) heterojunctions grown by molecular beam epitaxy

    SciTech Connect (OSTI)

    Bhat, Thirumaleshwara N.; Rajpalke, Mohana K.; Krupanidhi, S. B. [Materials Research Centre, Indian Institute of Science, Bangalore- 560012 (India); Roul, Basanta; Kumar, Mahesh [Materials Research Centre, Indian Institute of Science, Bangalore- 560012 (India); Central Research Laboratory, Bharat Electronics, Bangalore-560013 (India)

    2011-11-01T23:59:59.000Z

    Phase pure wurtzite GaN films were grown on Si (100) substrates by introducing a silicon nitride layer followed by low temperature GaN growth as buffer layers. GaN films grown directly on Si (100) were found to be phase mixtured, containing both cubic ({beta}) and hexagonal ({alpha}) modifications. The x-ray diffraction (XRD), scanning electron microscopy (SEM), photoluminescence (PL) spectroscopy studies reveal that the significant enhancement in the structural as well as in the optical properties of GaN films grown with silicon nitride buffer layer grown at 800 deg. C when compared to the samples grown in the absence of silicon nitride buffer layer and with silicon nitride buffer layer grown at 600 deg. C. Core-level photoelectron spectroscopy of Si{sub x}N{sub y} layers reveals the sources for superior qualities of GaN epilayers grown with the high temperature substrate nitridation process. The discussion has been carried out on the typical inverted rectification behavior exhibited by n-GaN/p-Si heterojunctions. Considerable modulation in the transport mechanism was observed with the nitridation conditions. The heterojunction fabricated with the sample of substrate nitridation at high temperature exhibited superior rectifying nature with reduced trap concentrations. Lowest ideality factors ({approx}1.5) were observed in the heterojunctions grown with high temperature substrate nitridation which is attributed to the recombination tunneling at the space charge region transport mechanism at lower voltages and at higher voltages space charge limited current conduction is the dominating transport mechanism. Whereas, thermally generated carrier tunneling and recombination tunneling are the dominating transport mechanisms in the heterojunctions grown without substrate nitridation and low temperature substrate nitridation, respectively.

  18. Bonding distances as Exact Sums of the Radii of the Constituent Atoms in Nanomaterials - Boron Nitride and Coronene

    E-Print Network [OSTI]

    Raji Heyrovska

    2011-12-19T23:59:59.000Z

    This paper presents for the first time the exact structures at the atomic level of two important nanomaterials, boron nitride and coronene. Both these compounds are hexagonal layer structures similar to graphene in two dimensions and to graphite in three-dimensions. However, they have very different properties: whereas graphene is a conductor, h-BN is an electrical insulator and coronene is a polycyclic aromatic hydrocarbon of cosmological interest. The atomic structures presented here for boron nitride, coronene and graphene have been drawn to scale based on bond lengths as sums of the atomic radii.

  19. The electroluminescence mechanism of Er³? in different silicon oxide and silicon nitride environments

    SciTech Connect (OSTI)

    Rebohle, L., E-mail: l.rebohle@hzdr.de; Wutzler, R.; Braun, M.; Helm, M.; Skorupa, W. [Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden - Rossendorf, Bautzner Landstraße 400, 01328 Dresden (Germany); Berencén, Y.; Ramírez, J. M.; Garrido, B. [Dept. Electrònica, Martí i Franquès 1, Universitat de Barcelona, 08028 Barcelona (Spain); Hiller, D. [IMTEK, Faculty of Engineering, Albert-Ludwigs-University Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg (Germany)

    2014-09-28T23:59:59.000Z

    Rare earth doped metal-oxide-semiconductor (MOS) structures are of great interest for Si-based light emission. However, several physical limitations make it difficult to achieve the performance of light emitters based on compound semiconductors. To address this point, in this work the electroluminescence (EL) excitation and quenching mechanism of Er-implanted MOS structures with different designs of the dielectric stack are investigated. The devices usually consist of an injection layer made of SiO? and an Er-implanted layer made of SiO?, Si-rich SiO?, silicon nitride, or Si-rich silicon nitride. All structures implanted with Er show intense EL around 1540 nm with EL power efficiencies in the order of 2 × 10?³ (for SiO?:Er) or 2 × 10??(all other matrices) for lower current densities. The EL is excited by the impact of hot electrons with an excitation cross section in the range of 0.5–1.5 × 10?¹?cm?². Whereas the fraction of potentially excitable Er ions in SiO? can reach values up to 50%, five times lower values were observed for other matrices. The decrease of the EL decay time for devices with Si-rich SiO? or Si nitride compared to SiO? as host matrix implies an increase of the number of defects adding additional non-radiative de-excitation paths for Er³?. For all investigated devices, EL quenching cross sections in the 10?²? cm² range and charge-to-breakdown values in the range of 1–10 C cm?² were measured. For the present design with a SiO? acceleration layer, thickness reduction and the use of different host matrices did not improve the EL power efficiency or the operation lifetime, but strongly lowered the operation voltage needed to achieve intense EL.

  20. Influence of process parameters on properties of reactively sputtered tungsten nitride thin films

    SciTech Connect (OSTI)

    Addonizio, Maria L.; Castaldo, Anna; Antonaia, Alessandro; Gambale, Emilia; Iemmo, Laura [ENEA, Portici Research Centre, Piazzale E. Fermi 1, I-80055, Portici (Italy)

    2012-05-15T23:59:59.000Z

    Tungsten nitride (WN{sub x}) thin films were produced by reactive dc magnetron sputtering of tungsten in an Ar-N{sub 2} gas mixture. The influence of the deposition power on the properties of tungsten nitride has been analyzed and compared with that induced by nitrogen content variation in the sputtering gas. A combined analysis of structural, electrical and optical properties on thin WN{sub x} films obtained at different deposition conditions has been performed. It was found that at an N{sub 2} content of 14% a single phase structure of W{sub 2}N films was formed with the highest crystalline content. This sputtering gas composition was subsequently used for fabricating films at different deposition powers. Optical analysis showed that increasing the deposition power created tungsten nitride films with a more metallic character, which is confirmed with resistivity measurements. At low sputtering powers the resulting films were crystalline whereas, with an increase of power, an amorphous phase was also present. The incorporation of an excess of nitrogen atoms resulted in an expansion of the W{sub 2}N lattice and this effect was more pronounced at low deposition powers. Infrared analysis revealed that in WN{sub x} films deposited at low power, chemisorbed N{sub 2} molecules did not behave as ligands whereas at high deposition power they clearly appeared as ligands around metallic tungsten. In this study, the influence of the most meaningful deposition parameters on the phase transformation reaction path was established and deposition conditions suitable for producing thermally stable and highly crystalline W{sub 2}N films were found.