Sample records for helvetica sans-serif line-height from the National Library of Energy Beta (NLEBeta)
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to design the poster; this is especially true if there are several partners. Pre-sketch a layout. Be clear (sansserif) throughout. Examples: SansSerif = Arial (simple) Serif = Times New Roman (less simple
after January 1, 1996, are generally available free via the U.S. Department of Energy (DOE) Information Bridge. Web site http://www.osti.gov/bridge Reports produced before January 1, 1996, may be purchased
1 Pericles Effective Presentations · Content · Organization · Delivery · Visual aids and graphics Be brave Graphics · KISS · Powerpoint: Font · Bigger than you'd expect · Sanserif Lines · Thicker than · Organization · Energy · Clarity · Poise Key: Practice Web Resources · http
literature, capacity markets are often viewed as a fix to the "miss- ing money" problem where generators investment in new capacity. Furthermore, some critics claim that such markets impose an extra and unnecessary Part III Capacity, Resource Adequacy, and Investment #12;Els UK Job: CDI ch09-i047172 16-11-2007 4:15p
Commission, USA Summary With the advent of restructured electricity markets a contentious market design issue Chapter 6 The Cost of Anarchy in Self-Commitment-Based Electricity Markets RAMTEEN SIOSHANSI1 , SHMUEL OREN, AND RICHARD O'NEILL2 1 University of California, Berkeley, USA; 2 Federal Energy Regulatory
Multilayer dielectric (MLD) diffraction gratings for Petawatt-class laser systems possess unique laser damage characteristics. Details of the shape of the grating lines and the concentration of absorbing impurities on the surface of the grating structures both have strong effects on laser damage threshold. It is known that electric field enhancement in the solid material comprising the grating lines varies directly with the linewidth and inversely with the lineheight for equivalent diffraction efficiency. Here, they present an overview of laser damage characteristics of MLD gratings, and describe a process for post-processing ion-beam etched grating lines using very dilute buffered hydrofluoric acid solutions. This process acts simultaneously to reduce grating linewidth and remove surface contaminants, thereby improving laser damage thresholds through two pathways.