Sample records for helvetica sans-serif line-height

  1. Production of Teaching Material for Undergraduates

    E-Print Network [OSTI]

    Cameron, Peter

    onto transparency for use on an OHP. The package is designed to use sans serif fonts for text because, and the default to two column format. To use this all you need do is place the file smallslides.cls in your tex to Mac users. Many of us do not have Adobe Acrobat and Distiller installed on our machines, so Wilfrid

  2. Effective Presentations Organization

    E-Print Network [OSTI]

    Shull, David H.

    1 Pericles Effective Presentations · Content · Organization · Delivery · Visual aids and graphics Be brave Graphics · KISS · Powerpoint: ­ Font · Bigger than you'd expect · San serif ­ Lines · Thicker than · Organization · Energy · Clarity · Poise Key: Practice Web Resources · http

  3. Els UK Job: CDI Ch06-I047172 13-11-2007 11:15a.m. Page:245 Trim:165240MM Float:Top/Bot TS: Integra, India Fonts: Palatino & Helvetica 9/11 Margins:Top:4PC Gutter:5PC T. W:30PC open recto 1 Color 49 Lines

    E-Print Network [OSTI]

    Oren, Shmuel S.

    Commission, USA Summary With the advent of restructured electricity markets a contentious market design issue Chapter 6 The Cost of Anarchy in Self-Commitment-Based Electricity Markets RAMTEEN SIOSHANSI1 , SHMUEL OREN, AND RICHARD O'NEILL2 1 University of California, Berkeley, USA; 2 Federal Energy Regulatory

  4. Els UK Job: CDI Ch01-I047172 30-10-2007 9:17a.m. Page:25 Trim:165240MM Float:Top/Bot TS: Integra, India Fonts: Palatino & Helvetica 9/11 Margins:Top:4PC Gutter:5PC T. W:30PC open recto 1 Color 49 Lines

    E-Print Network [OSTI]

    Oren, Shmuel S.

    Els UK Job: CDI Ch01-I047172 30-10-2007 9:17a.m. Page:25 Trim:165240MM Float:Top/Bot TS: Integra Part I Market Reform Evolution #12;Els UK Job: CDI Ch01-I047172 30-10-2007 9:17a.m. Page:26 Trim:165:30PC open recto 1 Color 49 Lines #12;Els UK Job: CDI Ch01-I047172 30-10-2007 9:17a.m. Page:27 Trim

  5. Els UK Job: CDI ch09-i047172 16-11-2007 4:15p.m. Page:325 Trim:165240MM Float:Top/Bot TS: Integra, India Fonts: Palatino & Helvetica 9/11 Margins:Top:4PC Gutter:5PC T. W:30PC open recto 1 Color 49 Lines

    E-Print Network [OSTI]

    Oren, Shmuel S.

    Els UK Job: CDI ch09-i047172 16-11-2007 4:15p.m. Page:325 Trim:165240MM Float:Top/Bot TS: Integra Part III Capacity, Resource Adequacy, and Investment #12;Els UK Job: CDI ch09-i047172 16-11-2007 4:15pPC Gutter:5PC T. W:30PC open recto 1 Color 49 Lines #12;Els UK Job: CDI ch09-i047172 16-11-2007 4:15p

  6. Improvement of Laser Damage Resistance and Diffraction Efficiency of Multilayer Dielectric Diffraction Gratings by HF-Etchback Linewidth Tailoring

    SciTech Connect (OSTI)

    Nguyen, H T; Larson, C C; Britten, J A

    2010-10-28T23:59:59.000Z

    Multilayer dielectric (MLD) diffraction gratings for Petawatt-class laser systems possess unique laser damage characteristics. Details of the shape of the grating lines and the concentration of absorbing impurities on the surface of the grating structures both have strong effects on laser damage threshold. It is known that electric field enhancement in the solid material comprising the grating lines varies directly with the linewidth and inversely with the line height for equivalent diffraction efficiency. Here, they present an overview of laser damage characteristics of MLD gratings, and describe a process for post-processing ion-beam etched grating lines using very dilute buffered hydrofluoric acid solutions. This process acts simultaneously to reduce grating linewidth and remove surface contaminants, thereby improving laser damage thresholds through two pathways.