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1

Dr. Robert M. Ramirez rramirez@sfsu.edu  

E-Print Network [OSTI]

to design the poster; this is especially true if there are several partners. Pre-sketch a layout. Be clear (sans serif) throughout. Examples: Sans Serif = Arial (simple) Serif = Times New Roman (less simple

2

ORNL/TM-2008/183 [Flush right, 12 pt. Arial or Helvetica, bold  

E-Print Network [OSTI]

after January 1, 1996, are generally available free via the U.S. Department of Energy (DOE) Information Bridge. Web site http://www.osti.gov/bridge Reports produced before January 1, 1996, may be purchased

3

Effective Presentations Organization  

E-Print Network [OSTI]

1 Pericles Effective Presentations · Content · Organization · Delivery · Visual aids and graphics Be brave Graphics · KISS · Powerpoint: ­ Font · Bigger than you'd expect · San serif ­ Lines · Thicker than · Organization · Energy · Clarity · Poise Key: Practice Web Resources · http

Shull, David H.

4

Robustness of optimal binary filters: analysis and design  

E-Print Network [OSTI]

Page 16 Functions Pr(Y = l~xt) and Pr(Y = l~xs) for 43 observation vectors, calculated for triplex font. 36 17 Functions (x, p, Pr(Y = 1 ~x) for 30 observation vectors, calculated for triplex font. 37 18 Functions Pr(Y = l~xq) and Pr(Y = l... for gothic font. 40 21 Functions (x, p, Pr(Y = 1~x) for 30 observation vectors, calculated for gothic font. 41 22 Functions Pr(Y = 1~x~) and Pr(Y = l~xs) for 43 observation vectors, calculated for sans-serif font. 42 23 Functions (x, p, Pr(Y = 1~x...

Grigoryan, Artyom M

2012-06-07T23:59:59.000Z

5

Els UK Job: CDI ch09-i047172 16-11-2007 4:15p.m. Page:325 Trim:165240MM Float:Top/Bot TS: Integra, India Fonts: Palatino & Helvetica 9/11 Margins:Top:4PC Gutter:5PC T. W:30PC open recto 1 Color 49 Lines  

E-Print Network [OSTI]

literature, capacity markets are often viewed as a fix to the "miss- ing money" problem where generators investment in new capacity. Furthermore, some critics claim that such markets impose an extra and unnecessary Part III Capacity, Resource Adequacy, and Investment #12;Els UK Job: CDI ch09-i047172 16-11-2007 4:15p

Oren, Shmuel S.

6

Els UK Job: CDI Ch06-I047172 13-11-2007 11:15a.m. Page:245 Trim:165240MM Float:Top/Bot TS: Integra, India Fonts: Palatino & Helvetica 9/11 Margins:Top:4PC Gutter:5PC T. W:30PC open recto 1 Color 49 Lines  

E-Print Network [OSTI]

Commission, USA Summary With the advent of restructured electricity markets a contentious market design issue Chapter 6 The Cost of Anarchy in Self-Commitment-Based Electricity Markets RAMTEEN SIOSHANSI1 , SHMUEL OREN, AND RICHARD O'NEILL2 1 University of California, Berkeley, USA; 2 Federal Energy Regulatory

Oren, Shmuel S.

7

Improvement of Laser Damage Resistance and Diffraction Efficiency of Multilayer Dielectric Diffraction Gratings by HF-Etchback Linewidth Tailoring  

SciTech Connect (OSTI)

Multilayer dielectric (MLD) diffraction gratings for Petawatt-class laser systems possess unique laser damage characteristics. Details of the shape of the grating lines and the concentration of absorbing impurities on the surface of the grating structures both have strong effects on laser damage threshold. It is known that electric field enhancement in the solid material comprising the grating lines varies directly with the linewidth and inversely with the line height for equivalent diffraction efficiency. Here, they present an overview of laser damage characteristics of MLD gratings, and describe a process for post-processing ion-beam etched grating lines using very dilute buffered hydrofluoric acid solutions. This process acts simultaneously to reduce grating linewidth and remove surface contaminants, thereby improving laser damage thresholds through two pathways.

Nguyen, H T; Larson, C C; Britten, J A

2010-10-28T23:59:59.000Z