National Library of Energy BETA

Sample records for deposition cxs applied

  1. Society for Geology Applied to Ore Deposits GENEVA MINERALS: Industry and Academia

    E-Print Network [OSTI]

    Halazonetis, Thanos

    Society for Geology Applied to Ore Deposits GENEVA MINERALS: Industry and Academia Creating links Tripodi, Vanga Resources, Geneva · A student view of economic geology. Honza Catchpole, President

  2. Apply

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Apply Application Process Bringing together top, space science students with internationally recognized researchers at Los Alamos in an educational and collaborative atmosphere....

  3. Apply

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 OutreachProductswsicloudwsiclouddenDVA N C E D B L O O D SFederal FacilityApplicantOffice ofApply Application

  4. Blue carbon storage potential of marine carbonate deposits Project reference IAP/13/50. Please quote this reference when applying.

    E-Print Network [OSTI]

    Guo, Zaoyang

    IAPETUS Blue carbon storage potential of marine carbonate deposits Project reference IAP/13 Henrik Stahl, Scottish Association for Marine Science Key Words 1. Blue carbon 2. Carbonate 3. Coralline is referred to as `blue carbon' to differentiate it from terrestrial carbon stores. Known blue carbon sinks

  5. CRYSTALLINE SILICON THIN-FILM SOLAR CELLS FROM THE POROUS SILICON PROCESS APPLYING CONVECTION ASSISTED CHEMICAL VAPOR DEPOSITION

    E-Print Network [OSTI]

    CRYSTALLINE SILICON THIN-FILM SOLAR CELLS FROM THE POROUS SILICON PROCESS APPLYING CONVECTION for the first time to monocrystalline Si thin-film solar cells from the porous silicon (PSI) layer transfer for manufacturing high efficiency silicon thin-film solar cells. Industrially feasible epitaxy systems therefore

  6. Send Copy of receipt to: This form is used for a deposit not applied to a Customer's Account or an Invoice in Oracle. Please bring TWO copies

    E-Print Network [OSTI]

    Winfree, Erik

    of money received in advance for future debit card purchases. Patent Royalties Payable: Inventor's portion the Institute and Inventor(s) isknown. Royalties Payable Holding Account: Holding account for deposits and Inventor(s) isunknown. 8. General Ledger Account: Supply General Ledger account number if different from

  7. Different seismic evaluation methods, Refraction Seismics, Refraction Tomography for exploring the rockslide deposits and Reflection Seismics for exploring the basement, were applied.The results show p-wave velocities of 2150

    E-Print Network [OSTI]

    Brückl, Ewald

    an underground map of a boundary can be created, which shows a small basin diving in NNE direction. Because of and Sturzstrom deposits in the valley. These Sturzstrom deposits blocked the valley, that even a lake was dammed

  8. CX-007533: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Chemical Vapor Deposition - Based Valence-Mending Passivation for Crystalline-Silicon Solar Cells CX(s) Applied: A9, B3.6 Date: 01/10/2012 Location(s): Arizona Offices(s): Golden Field Office

  9. CX-009549: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Vapor Transport Deposition for Thin Film III-V Photovoltaics CX(s) Applied: A9, B3.6 Date: 11/09/2012 Location(s): CX: none Offices(s): Golden Field Office

  10. CX-009310: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Optimization of Reservoir Storage Capacity in Different Depositional Environments (Rock Sampling) CX(s) Applied: B3.1 Date: 08/30/2012 Location(s): Multiple Offices(s): National Energy Technology Laboratory

  11. CX-009311: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Optimization of Reservoir Storage Capacity in Different Depositional Environments (Champaign) CX(s) Applied: A9 Date: 08/30/2012 Location(s): Illinois Offices(s): National Energy Technology Laboratory

  12. Uranium deposits of Canada

    SciTech Connect (OSTI)

    Evans, E.L.

    1986-01-01

    Topics covered in this book include: the history, early Aphebian conglomerate-hosted deposits; proterozoic deposits hosted by folded, metamorphosed rocks; Hudsonion classical vein deposits, Saskatchewan unconformity-associated and sedimentary-hosted deposits of Helikian age; other Helikian unconformity-associated and sedimentary-hosted rocks; and Phanerozoic deposits.

  13. Particle deposition in ventilation ducts

    SciTech Connect (OSTI)

    Sippola, Mark R.

    2002-09-01

    Exposure to airborne particles is detrimental to human health and indoor exposures dominate total exposures for most people. The accidental or intentional release of aerosolized chemical and biological agents within or near a building can lead to exposures of building occupants to hazardous agents and costly building remediation. Particle deposition in heating, ventilation and air-conditioning (HVAC) systems may significantly influence exposures to particles indoors, diminish HVAC performance and lead to secondary pollutant release within buildings. This dissertation advances the understanding of particle behavior in HVAC systems and the fates of indoor particles by means of experiments and modeling. Laboratory experiments were conducted to quantify particle deposition rates in horizontal ventilation ducts using real HVAC materials. Particle deposition experiments were conducted in steel and internally insulated ducts at air speeds typically found in ventilation ducts, 2-9 m/s. Behaviors of monodisperse particles with diameters in the size range 1-16 {micro}m were investigated. Deposition rates were measured in straight ducts with a fully developed turbulent flow profile, straight ducts with a developing turbulent flow profile, in duct bends and at S-connector pieces located at duct junctions. In straight ducts with fully developed turbulence, experiments showed deposition rates to be highest at duct floors, intermediate at duct walls, and lowest at duct ceilings. Deposition rates to a given surface increased with an increase in particle size or air speed. Deposition was much higher in internally insulated ducts than in uninsulated steel ducts. In most cases, deposition in straight ducts with developing turbulence, in duct bends and at S-connectors at duct junctions was higher than in straight ducts with fully developed turbulence. Measured deposition rates were generally higher than predicted by published models. A model incorporating empirical equations based on the experimental measurements was applied to evaluate particle losses in supply and return duct runs. Model results suggest that duct losses are negligible for particle sizes less than 1 {micro}m and complete for particle sizes greater than 50 {micro}m. Deposition to insulated ducts, horizontal duct floors and bends are predicted to control losses in duct systems. When combined with models for HVAC filtration and deposition to indoor surfaces to predict the ultimate fates of particles within buildings, these results suggest that ventilation ducts play only a small role in determining indoor particle concentrations, especially when HVAC filtration is present. However, the measured and modeled particle deposition rates are expected to be important for ventilation system contamination.

  14. RIPPLED DEPOSITS PART IV --RIPPLED DEPOSITS

    E-Print Network [OSTI]

    Gudmundsson, Jon Steinar

    . The conditions existing at the interface between a deposit surface and a flowing fluid will therefore fluids. It results in changes in the flow and pressure drop character istics of tubes subjected of deposit roughness are much more uncertain. Deposition on a clean surface, with commercial roughness say

  15. Perspectives on Deposition Velocity

    Office of Environmental Management (EM)

    direction, and stability. Dispersion and Deposition Dispersion is dependent on Wind speed Stability Deposition is dependent on Wind speed Stability 95 th...

  16. Applied Math

    E-Print Network [OSTI]

    $author.value

    Current research topics by the Applied Math Faculty members include: Numerical analysis and applications of finite difference, finite element and spectral ...

  17. PARTICULATE DEPOSITION OF MAGNETITE

    E-Print Network [OSTI]

    Gudmundsson, Jon Steinar

    PART V PARTICULATE DEPOSITION OF MAGNETITE #12;- 75 - PART V - DEPOSITION OF PARTICULATE MAGNETITE conduits and equipment in conventional boilers and nuclear reactors, the particulate corrosion products tend to deposit at heated and unheated surfaces. The deposition affects the thermohydraulic performance

  18. Instrument Series: Deposition and Microfabrication Sputter Deposition

    E-Print Network [OSTI]

    and solid oxide fuel cells and solar cells for energy generation Microfabrication ­ deposition offers operational flexibility, efficiency, and control, allowing a range of applications and materials

  19. Chapter 3--Lahar Deposits Lahar Deposits

    E-Print Network [OSTI]

    del Moral, Roger

    with snow and ice, the rapid melting causes lahars that flow down canyons. Slurries entrain soil, rocks above the deposit (July 1980). 27 #12;Chapter 3--Lahar Deposits out. Glaciers and snow fields melt rapidly and small block- ing dams (often glacial moraines) collapse to produce mas- sive surges

  20. Plasma sprayed and electrospark deposited zirconium metal diffusion barrier coatings

    SciTech Connect (OSTI)

    Hollis, Kendall J; Pena, Maria I

    2010-01-01

    Zirconium metal coatings applied by plasma spraying and electrospark deposition (ESD) have been investigated for use as diffusion barrier coatings on low enrichment uranium fuel for research nuclear reactors. The coatings have been applied to both stainless steel as a surrogate and to simulated nuclear fuel uranium-molybdenum alloy substrates. Deposition parameter development accompanied by coating characterization has been performed. The structure of the plasma sprayed coating was shown to vary with transferred arc current during deposition. The structure of ESD coatings was shown to vary with the capacitance of the deposition equipment.

  1. Metal deposition using seed layers

    DOE Patents [OSTI]

    Feng, Hsein-Ping; Chen, Gang; Bo, Yu; Ren, Zhifeng; Chen, Shuo; Poudel, Bed

    2013-11-12

    Methods of forming a conductive metal layers on substrates are disclosed which employ a seed layer to enhance bonding, especially to smooth, low-roughness or hydrophobic substrates. In one aspect of the invention, the seed layer can be formed by applying nanoparticles onto a surface of the substrate; and the metallization is achieved by electroplating an electrically conducting metal onto the seed layer, whereby the nanoparticles serve as nucleation sites for metal deposition. In another approach, the seed layer can be formed by a self-assembling linker material, such as a sulfur-containing silane material.

  2. Applied combustion

    SciTech Connect (OSTI)

    1993-12-31

    From the title, the reader is led to expect a broad practical treatise on combustion and combustion devices. Remarkably, for a book of modest dimension, the author is able to deliver. The text is organized into 12 Chapters, broadly treating three major areas: combustion fundamentals -- introduction (Ch. 1), thermodynamics (Ch. 2), fluid mechanics (Ch. 7), and kinetics (Ch. 8); fuels -- coal, municipal solid waste, and other solid fuels (Ch. 4), liquid (Ch. 5) and gaseous (Ch. 6) fuels; and combustion devices -- fuel cells (Ch. 3), boilers (Ch. 4), Otto (Ch. 10), diesel (Ch. 11), and Wankel (Ch. 10) engines and gas turbines (Ch. 12). Although each topic could warrant a complete text on its own, the author addresses each of these major themes with reasonable thoroughness. Also, the book is well documented with a bibliography, references, a good index, and many helpful tables and appendices. In short, Applied Combustion does admirably fulfill the author`s goal for a wide engineering science introduction to the general subject of combustion.

  3. Solution deposition assembly

    SciTech Connect (OSTI)

    Roussillon, Yann; Scholz, Jeremy H; Shelton, Addison; Green, Geoff T; Utthachoo, Piyaphant

    2014-01-21

    Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber, at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.

  4. Deposition of Dielectrics

    E-Print Network [OSTI]

    Garmestani, Hamid

    Deposition of Dielectrics Benjamin A. Small Cleanroom Technical Staff September 26th, 2000 #12 of Microelectronic Fabrication. 1996. MiRC cleanroom users PlasmaTherm, Inc. Surface Technology Systems, Inc. #12;

  5. Apparatus and method for selective area deposition of thin films on electrically biased substrates

    DOE Patents [OSTI]

    Zuhr, R.A.; Haynes, T.E.; Golanski, A.

    1999-06-08

    An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repels the ionized particles. 3 figs.

  6. Underpotential deposition-mediated layer-by-layer growth of thin films

    DOE Patents [OSTI]

    Wang, Jia Xu; Adzic, Radoslav R.

    2015-05-19

    A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves the use of underpotential deposition of a first element to mediate the growth of a second material by overpotential deposition. Deposition occurs between a potential positive to the bulk deposition potential for the mediating element where a full monolayer of mediating element forms, and a potential which is less than, or only slightly greater than, the bulk deposition potential of the material to be deposited. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis. This process is especially suitable for the formation of a catalytically active layer on core-shell particles for use in energy conversion devices such as fuel cells.

  7. Applied Mathematics Department of Applied Mathematics

    E-Print Network [OSTI]

    Applied Mathematics Department of Applied Mathematics 208 Engineering 1 Building 10 W. 32nd St, Graduate Studies: Xiaofan Li The Department of Applied Mathematics puts mathe- matics to work solving, such as how to construct methods for multi-criteria decision making (requiring discrete mathematics

  8. Environmental Performance Characterization of Atomic Layer Deposition

    E-Print Network [OSTI]

    Yuan, Chris; Dornfeld, David

    2008-01-01

    Rahtu and R. Gordon. “Atomic layer deposition of transitionoxide films grown by atomic layer deposition from iodide andand S. M. George. “Atomic layer deposition of ultrathin and

  9. Multi-chamber deposition system

    DOE Patents [OSTI]

    Jacobson, Richard L. (Roseville, MN); Jeffrey, Frank R. (Shoreview, MN); Westerberg, Roger K. (Cottage Grove, MN)

    1989-10-17

    A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

  10. Multi-chamber deposition system

    DOE Patents [OSTI]

    Jacobson, Richard L. (Roseville, MN); Jeffrey, Frank R. (Shoreview, MN); Westerberg, Roger K. (Cottage Grove, MN)

    1989-06-27

    A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

  11. Process for depositing Cr-bearing layer

    DOE Patents [OSTI]

    Ellis, T.W.; Lograsso, T.A.; Eshelman, M.A.

    1995-05-09

    A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate. 7 figs.

  12. COAL-FIRED UTILITY BOILERS: SOLVING ASH DEPOSITION PROBLEMS

    SciTech Connect (OSTI)

    Christopher J. Zygarlicke; Donald P. McCollor; Steven A. Benson; Jay R. Gunderson

    2001-04-01

    The accumulation of slagging and fouling ash deposits in utility boilers has been a source of aggravation for coal-fired boiler operators for over a century. Many new developments in analytical, modeling, and combustion testing methods in the past 20 years have made it possible to identify root causes of ash deposition. A concise and comprehensive guidelines document has been assembled for solving ash deposition as related to coal-fired utility boilers. While this report accurately captures the current state of knowledge in ash deposition, note that substantial research and development is under way to more completely understand and mitigate slagging and fouling. Thus, while comprehensive, this document carries the title ''interim,'' with the idea that future work will provide additional insight. Primary target audiences include utility operators and engineers who face plant inefficiencies and significant operational and maintenance costs that are associated with ash deposition problems. Pulverized and cyclone-fired coal boilers are addressed specifically, although many of the diagnostics and solutions apply to other boiler types. Logic diagrams, ash deposit types, and boiler symptoms of ash deposition are used to aid the user in identifying an ash deposition problem, diagnosing and verifying root causes, determining remedial measures to alleviate or eliminate the problem, and then monitoring the situation to verify that the problem has been solved. In addition to a step-by-step method for identifying and remediating ash deposition problems, this guideline document (Appendix A) provides descriptions of analytical techniques for diagnostic testing and gives extensive fundamental and practical literature references and addresses of organizations that can provide help in alleviating ash deposition problems.

  13. Study of plasma enhanced chemical vapor deposition of boron-doped hydrogenated amorphous silicon thin films and the application to p-channel thin film transistor 

    E-Print Network [OSTI]

    Nominanda, Helinda

    2004-01-01

    The material and process characteristics of boron doped hydrogenated amorphous silicon (a-Si:H) thin film deposited by plasma enhanced chemical vapor deposition technique (PECVD) have been studied. The goal is to apply the high quality films...

  14. Mathematical modeling of silica deposition in Tongonan-I reinjection wells, Philippines

    SciTech Connect (OSTI)

    Malate, R.C.M.; O`Sullivan, M.J.

    1993-10-01

    Mathematical models of silica deposition are derived using the method of characteristics for the problem of variable rate injection into a well producing radially symmetric flow. Solutions are developed using the first order rate equation of silica deposition suggested by Rimstidt and Barnes (1980). The changes in porosity and permeability resulting from deposition are included in the models. The models developed are successfully applied in simulating the changes in injection capacity in some of the reinjection wells in Tongonan geothermal field, Philippines.

  15. Compositional Variations in Vapor Deposited Samarium Zirconate Coatings

    E-Print Network [OSTI]

    Wadley, Haydn

    Compositional Variations in Vapor Deposited Samarium Zirconate Coatings A Thesis Presented temperatures instead have relied on the development of thermal barrier coating (TBC) systems. The thermal barrier coating systems applied to superalloys consist of three layers: (i) an aluminum rich metallic bond

  16. Variable temperature semiconductor film deposition

    DOE Patents [OSTI]

    Li, X.; Sheldon, P.

    1998-01-27

    A method of depositing a semiconductor material on a substrate is disclosed. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  17. OCTOBER 1990 DEPOSITION AND REMOVAL

    E-Print Network [OSTI]

    , shielding, resuspension, indoor deposition, the relative airborne con- centrations indoors and outdoors RESUSPENSION; PLANTS; RADIATION DOSE DISTRIBUTION; REMEDIAL ACTION; SHIELDING; SURFACE CONTAMINATION; URBAN effected by road traffic, and street cleaning the degree of resuspension, i.e. the return of deposited

  18. PARAFFIN WAX DEPOSITION AND FOULING

    E-Print Network [OSTI]

    Gudmundsson, Jon Steinar

    hydrocarbons are cooled in heat exchangers they tend to deposit and cause fouling; increasing the overall heat by proper design and operation of pipelines and heat exchangers. This requires knowledge of the deposition at standard conditions. The crystalline nature of paraffin wax has been investigated by a number of workers(9

  19. Mechanistic Origins of Hierarchical Order in Organic Monolayers Deposited From Liquid Crystal Solvents

    E-Print Network [OSTI]

    Patrick, David L.

    Solvents Nick E. Gislason, Calvin Murphy, and David L. Patrick* Department of Chemistry, Western Washington two oriented liquid crystal solvents and one isotropic solvent using a sacrificial template method in which a solvent film applied in a first deposition step is displaced by BOC in a second deposition step

  20. MATHMATICS & APPLIED STATISTICS

    E-Print Network [OSTI]

    Frey, Jesse C.

    MATHMATICS & APPLIED STATISTICS Graduate Studies in Build Your Future with Graduate Study in Mathematics or Applied Statistics Our graduate programs can help you advance your career in education will deepen your knowledge and prepare you for further study. The Master of Science in Applied Statistics

  1. TULSA UNIVERSITY PARAFFIN DEPOSITION PROJECTS

    SciTech Connect (OSTI)

    Michael Volk; Cem Sarica

    2003-10-01

    As oil and gas production moves to deeper and colder water, subsea multiphase production systems become critical for economic feasibility. It will also become increasingly imperative to adequately identify the conditions for paraffin precipitation and predict paraffin deposition rates to optimize the design and operation of these multiphase production systems. Although several oil companies have paraffin deposition predictive capabilities for single-phase oil flow, these predictive capabilities are not suitable for the multiphase flow conditions encountered in most flowlines and wellbores. For deepwater applications in the Gulf of Mexico, it is likely that multiphase production streams consisting of crude oil, produced water and gas will be transported in a single multiphase pipeline to minimize capital cost and complexity at the mudline. Existing single-phase (crude oil) paraffin deposition predictive tools are clearly inadequate to accurately design these pipelines because they do not account for the second and third phases, namely, produced water and gas. The objective of this program is to utilize the current test facilities at The University of Tulsa, as well as member company expertise, to accomplish the following: enhance our understanding of paraffin deposition in single and two-phase (gas-oil) flows; conduct focused experiments to better understand various aspects of deposition physics; and, utilize knowledge gained from experimental modeling studies to enhance the computer programs developed in the previous JIP for predicting paraffin deposition in single and two-phase flow environments. These refined computer models will then be tested against field data from member company pipelines. The following deliverables are scheduled during the first three projects of the program: (1) Single-Phase Studies, with three different black oils, which will yield an enhanced computer code for predicting paraffin deposition in deepwater and surface pipelines. (2) Two-Phase Studies, with a focus on heat transfer and paraffin deposition at various pipe inclinations, which will be used to enhance the paraffin deposition code for gas-liquid flow in pipes. (3) Deposition Physics and Water Impact Studies, which will address the aging process, improve our ability to characterize paraffin deposits and enhance our understanding of the role water plays in paraffin deposition in deepwater pipelines. As in the previous two studies, knowledge gained in this suite of studies will be integrated into a state-of-the-art three-phase paraffin deposition computer program.

  2. CX-008829: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Proliferation Detection Research for Discovery and Development of Process for Deposition of Pure, Stoichiometric and Conformal Films of Magnesium Diboride at Harvard University CX(s) Applied: A9, A11, B3.6 Date: 08/06/2012 Location(s): Massachusetts Offices(s): NNSA-Defense Science University Programs

  3. A x-ray radiography-densitometry technique for the quantitative determination of metal deposit profiles

    SciTech Connect (OSTI)

    Will, F.G.; Iacovangelo, C.D.

    1984-03-01

    The application of x-ray radiography in conjunction with high resolution optical densitometry for the quantitative determination of metal deposit profiles parallel and perpendicular to the substrate surface is described. The principles of the technique and the range of its applicability are discussed. The technique is applied to the study of zinc deposition on highly porous carbon foams from circulating aqueous zinc bromide solutions. The effect of substrate pore size on the zinc distribution is explored. Zinc is found to deposit predominantly on the porous substrate/electrolyte and substrate/current collector interfaces. Smaller pore size favors smoother and more uniform deposits throughout the substrate.

  4. Applied Research Center

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ARC Privacy and Security Notice Skip over navigation Search the JLab Site Applied Research Center Please upgrade your browser. This site's design is only visible in a graphical...

  5. Applied Math Publications

    E-Print Network [OSTI]

    The following sample of the publications has been made available to you by members of the Applied faculty through their personal homepages. Prof. Zhiqiang

  6. Applied Modern Physics

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    1 Applied Modern Physics From the first bionic eye to airport scanners that detect liquid explosives, our expertise in developing advanced diagnostics results in real-world...

  7. Sol-Gel Deposited Electrochromic Coatings

    E-Print Network [OSTI]

    Ozer, N.

    2010-01-01

    Deposited Electrochromic Coatings Nilgun Ozer and Carl M.the Optical Interference Coatings Topical Meeting, Tucson,Deposited Electrochromic Coatings Nilgun Ozer and Carl M.

  8. Atomic scale heating in energetic plasma deposition

    E-Print Network [OSTI]

    Anders, Andre

    2001-01-01

    equation (2), for cathodic arc plasmas. The kinetic energiesscale heating in cathodic arc plasma deposition André Andersscale heating in cathodic arc plasma deposition André Anders

  9. Seasonalepisodic control of acid deposition

    E-Print Network [OSTI]

    Fay, James A.

    1988-01-01

    This report contains the climatological, technical and economic factors for episodic and seasonal control of emissions in existing power plants. Analyzing a large data set of acid deposition for the years 1982-85, we find ...

  10. Particle deposition in ventilation ducts

    E-Print Network [OSTI]

    Sippola, Mark R.

    2002-01-01

    were observed to lead to resuspension of particles in thethe nozzles may lead to resuspension of deposited particles.resuspension, the decreased response to turbulent velocity fluctuations of the very large particles should lead

  11. MACCS2/Deposition Velocity Workshop

    Office of Energy Efficiency and Renewable Energy (EERE)

    The Department of Energy’s Chief of Nuclear Safety hosted a MACCS2/Deposition Velocity Workshop on June 5-6, 2012, in Germantown, Maryland. Approximately 70 participants attended. The purpose of...

  12. Aerosol Deposition in Transport Lines 

    E-Print Network [OSTI]

    Muyshondt, Arnoldo

    1995-01-01

    Particle deposition in contraction fittings with half-angles of 12 degrees, 45 degrees, and 90 degrees; expansion fittings with half-angles of 3 degrees, 6 degrees, 12 degrees, 45 degrees, and 90 degrees; and ...

  13. A Radon Progeny Deposition Model

    E-Print Network [OSTI]

    V. E. Guiseppe; S. R. Elliott; A. Hime; K. Rielage; S. Westerdale

    2010-12-30

    The next generation low-background detectors operating underground aim for unprecedented low levels of radioactive backgrounds. Although the radioactive decays of airborne radon (particularly Rn-222) and its subsequent progeny present in an experiment are potential backgrounds, also problematic is the deposition of radon progeny on detector materials. Exposure to radon at any stage of assembly of an experiment can result in surface contamination by progeny supported by the long half life (22 y) of Pb-210 on sensitive locations of a detector. An understanding of the potential surface contamination from deposition will enable requirements of radon-reduced air and clean room environments for the assembly of low background experiments. It is known that there are a number of environmental factors that govern the deposition of progeny onto surfaces. However, existing models have not explored the impact of some environmental factors important for low background experiments. A test stand has been constructed to deposit radon progeny on various surfaces under a controlled environment in order to develop a deposition model. Results from this test stand and the resulting deposition model are presented.

  14. INTRODUCTION APPLIED GEOPHYSICS

    E-Print Network [OSTI]

    Merriam, James

    GEOL 384.3 INTRODUCTION TO APPLIED GEOPHYSICS OUTLINE INTRODUCTION TO APPLIED GEOPHYSICS GEOL 384 unknowns; the ones we don't know we don't know. And if one looks throughout the history of geophysics he didn't really say geophysics. He said, " ... our country and other free countries ...". But I am

  15. Applied Music Curriculum Guide

    E-Print Network [OSTI]

    Kearfott, R. Baker

    1 Applied Music Curriculum Guide The University of Louisiana at Lafayette School of Music #12;2 Revised Spring 2009 UNIVERSITY OF LOUISIANA, Lafayette SCHOOL OF MUSIC APPLIED MUSIC CURRICULUM GUIDE Dr. Garth Alper, Director DEGREES OFFERED Bachelor of Music with emphases in Performance, Theory

  16. Extended Heat Deposition in Hot Jupiters: Application to Ohmic Heating

    E-Print Network [OSTI]

    Ginzburg, Sivan

    2015-01-01

    Many giant exoplanets in close orbits have observed radii which exceed theoretical predictions. One suggested explanation for this discrepancy is heat deposited deep inside the atmospheres of these "hot Jupiters". Here, we study extended power sources which distribute heat from the photosphere to the deep interior of the planet. Our analytical treatment is a generalization of a previous analysis of localized "point sources". We model the deposition profile as a power law in the optical depth and find that planetary cooling and contraction halt when the internal luminosity (i.e. cooling rate) of the planet drops below the heat deposited in the planet's convective region. A slowdown in the evolutionary cooling prior to equilibrium is possible only for sources which do not extend to the planet's center. We estimate the Ohmic dissipation resulting from the interaction between the atmospheric winds and the planet's magnetic field, and apply our analytical model to Ohmically heated planets. Our model can account fo...

  17. Potpourri of deposition and resuspension questions

    SciTech Connect (OSTI)

    Slinn, W.G.N.

    1983-01-01

    Twenty questions and answers are listed dealing with particulate deposition, resuspension, and precipitation scavenging.

  18. Analytical Chemistry Applied Mathematics

    E-Print Network [OSTI]

    Heller, Barbara

    Architecture Information Technology & Management Integrated Building Delivery Landscape Architecture ManagementAnalytical Chemistry Applied Mathematics Architectural Engineering Architecture Architecture Electricity Markets Environmental Engineering Food Process Engineering Food Safety & Technology

  19. Sandia Energy - Applied & Computational Math

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Applied & Computational Math Home Energy Research Advanced Scientific Computing Research (ASCR) Applied & Computational Math Applied & Computational Mathcwdd2015-03-26T13:34:5...

  20. KATAYUN (KATY) BARMAK Department of Applied Physics and Applied Mathematics

    E-Print Network [OSTI]

    Columbia University

    MEMBERSHIP OF PROFESSIONAL SOCIETIES IEEE, Materials Research Society (MRS); American Physical Society (APS1 KATAYUN (KATY) BARMAK Department of Applied Physics and Applied Mathematics Seeley W. Mudd. of Applied Physics and Applied Mathematics, Columbia University 2011-present Philips Electronics Professor

  1. TULSA UNIVERSITY PARAFFIN DEPOSITION PROJECTS

    SciTech Connect (OSTI)

    Cem Sarica; Michael Volk

    2004-06-01

    As oil and gas production moves to deeper and colder water, subsea multiphase production systems become critical for economic feasibility. It will also become increasingly imperative to adequately identify the conditions for paraffin precipitation and predict paraffin deposition rates to optimize the design and operation of these multi-phase production systems. Although several oil companies have paraffin deposition predictive capabilities for single-phase oil flow, these predictive capabilities are not suitable for the multiphase flow conditions encountered in most flowlines and wellbores. For deepwater applications in the Gulf of Mexico, it is likely that multiphase production streams consisting of crude oil, produced water and gas will be transported in a single multiphase pipeline to minimize capital cost and complexity at the mudline. Existing single-phase (crude oil) paraffin deposition predictive tools are clearly inadequate to accurately design these pipelines, because they do not account for the second and third phases, namely, produced water and gas. The objective of this program is to utilize the current test facilities at The University of Tulsa, as well as member company expertise, to accomplish the following: enhance our understanding of paraffin deposition in single and two-phase (gas-oil) flows; conduct focused experiments to better understand various aspects of deposition physics; and, utilize knowledge gained from experimental modeling studies to enhance the computer programs developed in the previous JIP for predicting paraffin deposition in single and two-phase flow environments. These refined computer models will then be tested against field data from member company pipelines.

  2. Vapor deposition of thin films

    DOE Patents [OSTI]

    Smith, David C. (Los Alamos, NM); Pattillo, Stevan G. (Los Alamos, NM); Laia, Jr., Joseph R. (Los Alamos, NM); Sattelberger, Alfred P. (Los Alamos, NM)

    1992-01-01

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  3. The Guaranty of Bank Deposits

    E-Print Network [OSTI]

    Hopper, E.B.

    1913-06-01

    depositors their money- except in small sums and in many instances they paid them. i n cashier^ checks or other forms of credit money. Those irho had money in the bank began to wonder if the bank had the right so to hold their deposits and began to demand... result good banks will not grow any faster than bad banks. (a) Harpers Weekly Jan. 25th 1909. (b) Forum for June 1912. (e) "Money and Credit" Horace White. 7 He save it ie all right for Savings Banks to guarantee their deposits. However, he shows...

  4. Vapor deposition of thin films

    SciTech Connect (OSTI)

    Smith, D.C.; Pattillo, S.G.; Laia, J.R. Jr.; Sattelberger, A.P.

    1990-10-05

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl){sub 3}, iridium(allyl){sub 3}, molybdenum(allyl){sub 4}, tungsten(allyl){sub 4}, rhenium (allyl){sub 4}, platinum(allyl){sub 2}, or palladium(allyl){sub 2} are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  5. Information Science, Computing, Applied Math

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Information Science, Computing, Applied Math science-innovationassetsimagesicon-science.jpg Information Science, Computing, Applied Math National security depends on science...

  6. Vacuum vapor deposition gun assembly

    DOE Patents [OSTI]

    Zeren, Joseph D. (Boulder, CO)

    1985-01-01

    A vapor deposition gun assembly includes a hollow body having a cylindrical outer surface and an end plate for holding an adjustable heat sink, a hot hollow cathode gun, two magnets for steering the plasma from the gun into a crucible on the heat sink, and a shutter for selectively covering and uncovering the crucible.

  7. Apply for Beamtime

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 OutreachProductswsicloudwsiclouddenDVA N C E D B L O O D SFederal FacilityApplicantOffice ofApply ApplicationApply

  8. Precipitation scavenging, dry deposition, and resuspension. Volume 2: dry deposition and resuspension

    SciTech Connect (OSTI)

    Pruppacher, H.R.; Semanin, R.G.; Slinn, W.G.N.

    1983-01-01

    Papers are presented under the headings: dry deposition of gases, dry deposition of particles, wind erosion, plutonium deposition and resuspension, air-sea exchange, tropical and polar, global scale, and future studies.

  9. Near-infrared radiation curable multilayer coating systems and methods for applying same

    SciTech Connect (OSTI)

    Bowman, Mark P; Verdun, Shelley D; Post, Gordon L

    2015-04-28

    Multilayer coating systems, methods of applying and related substrates are disclosed. The coating system may comprise a first coating comprising a near-IR absorber, and a second coating deposited on a least a portion of the first coating. Methods of applying a multilayer coating composition to a substrate may comprise applying a first coating comprising a near-IR absorber, applying a second coating over at least a portion of the first coating and curing the coating with near infrared radiation.

  10. Journal of applied mechanics

    E-Print Network [OSTI]

    Nov 11, 2009 ... Location: Engineering (Periodicals) ... wave propagation in such systems is examined in reference (4). Gassman (5, 6) has ... Now Research Scientist at Missile. Systems ... Presented at the Applied Mechanics Division Summer Conference,. Berkeley ..... This will be true in some cases for a water- saturated ...

  11. SUSTAINABILITY WHO CAN APPLY

    E-Print Network [OSTI]

    FUNDED BY CALL FOR SUSTAINABILITY RESEARCH STUDENT WHO CAN APPLY Undergraduate and graduate Participate in the Global Change & Sustainability Center's Research Symposium; attend workshops with faculty or publish in the U's student-run sustainability publication to be released in May 2014. Are you conducting

  12. APPLYING RESEARCH ON METACOGNITION

    E-Print Network [OSTI]

    School of Medicine01/09/14 #12;Define metacognition and explain its importance in teaching and learning, understand key genetic terms.) Next, apply knowledge to determine inheritance patterns and to formulate students presume that a best response strategy is to relate everything they know about a subject figuring

  13. Numerical modeling of mixed sediment resuspension, transport, and deposition during the March 1998 episodic events in southern Lake

    E-Print Network [OSTI]

    Numerical modeling of mixed sediment resuspension, transport, and deposition during the March 1998 sediment resuspension of mixed (cohesive plus noncohesive) sediment is developed and applied to quantitatively simulate the March 1998 resuspension events in southern Lake Michigan. Some characteristics

  14. Formation of metal oxides by cathodic arc deposition

    SciTech Connect (OSTI)

    Anders, S.; Anders, A.; Rubin, M.; Wang, Z.; Raoux, S.; Kong, F.; Brown, I.G.

    1995-03-01

    Metal oxide thin films are of interest for a number of applications. Cathodic arc deposition, an established, industrially applied technique for formation of nitrides (e.g. TiN), can also be used for metal oxide thin film formation. A cathodic arc plasma source with desired cathode material is operated in an oxygen atmosphere, and metal oxides of various stoichiometric composition can be formed on different substrates. We report here on a series of experiments on metal oxide formation by cathodic arc deposition for different applications. Black copper oxide has been deposited on ALS components to increase the radiative heat transfer between the parts. Various metal oxides such as tungsten oxide, niobium oxide, nickel oxide and vanadium oxide have been deposited on ITO glass to form electrochromic films for window applications. Tantalum oxide films are of interest for replacing polymer electrolytes. Optical waveguide structures can be formed by refractive index variation using oxide multilayers. We have synthesized multilayers of Al{sub 2}O{sub 3}/Y{sub 2}O{sub 3}/AI{sub 2}O{sub 3}/Si as possible basic structures for passive optoelectronic integrated circuits, and Al{sub 2-x}Er{sub x}O{sub 3} thin films with a variable Er concentration which is a potential component layer for the production of active optoelectronic integrated devices such as amplifiers or lasers at a wavelength of 1.53 {mu}m. Aluminum and chromium oxide films have been deposited on a number of substrates to impart improved corrosion resistance at high temperature. Titanium sub-oxides which are electrically conductive and corrosion resistant and stable in a number of aggressive environments have been deposited on various substrates. These sub-oxides are of great interest for use in electrochemical cells.

  15. Structural and depositional evolution, KH field, West Natuna Basin, offshore Indonesia 

    E-Print Network [OSTI]

    Meirita, Maria Fransisca

    2004-09-30

    describes the structural and depositional evolution in the KH field in West Natuna Basin, Indonesia. Data for the study were acquired by three-dimensional (3D) seismic reflection volume and a complete suite of well logs. The regional basin underwent... to exploration. 4 This study applied three-dimensional (3-D) seismic data and well logs to interpret deposition and structural relationships within the formation in KH field. The seismic data were acquired by Marathon Petroleum Indonesia during March...

  16. Paraffin deposition in offshore oil production 

    E-Print Network [OSTI]

    Elphingstone, Gerald Mason

    1995-01-01

    on the interior wall of submerged oil production lines. The important parameters of paraffin deposition are identified. The completed computer simulation can be used to quantify the effects of different physical properties on paraffin deposition and therefore...

  17. Microstructural Evolution of EGR Cooler Deposits

    Broader source: Energy.gov [DOE]

    Characterize the thermo-physical properties of the deposit under different operating conditions on model EGR cooler tube and determine the long-term changes in deposit properties due to thermal cycling and water/HC condensation

  18. Modeling deposit formation in diesel injector nozzle

    E-Print Network [OSTI]

    Sudhiesh Kumar, Chintoo

    2009-01-01

    Formation of deposit in the diesel injector nozzle affects the injection behavior and hinders performance. Under running condition, deposit precursors are washed away by the ensuing injection. However, during the cool down ...

  19. Formation mechanisms of combustion chamber deposits

    E-Print Network [OSTI]

    O'Brien, Christopher J. (Christopher John)

    2001-01-01

    Combustion chamber deposits are found in virtually all internal combustion engines after a few hundred hours of operation. Deposits form on cylinder, piston, and head surfaces that are in contact with fuel-air mixture ...

  20. Crediting Tritium Deposition in Accident Analysis

    SciTech Connect (OSTI)

    Murphy, C.E. Jr.

    2001-06-20

    This paper describes the major aspects of tritium dispersion phenomenology, summarizes deposition attributes of the computer models used in the DOE Complex for tritium dispersion, and recommends an approach to account for deposition in accident analysis.

  1. Chemical vapor deposition of functionalized isobenzofuran polymers

    E-Print Network [OSTI]

    Olsson, Ylva Kristina

    2007-01-01

    This thesis develops a platform for deposition of polymer thin films that can be further tailored by chemical surface modification. First, we explore chemical vapor deposition of functionalized isobenzofuran films using ...

  2. Cameral deposits in cephalopod shells

    E-Print Network [OSTI]

    Fischer, A. G.; Teichert, C.

    1969-01-30

    , DELESSE, HÉBERT, and MICHELIN par- ticipated. BARRANDE (1859) developed the following criteria for recognition of organically constructed deposits in cephalopod camerae: 1) They were formed before mud could penetrate into the cam- erae. 2) In Bohemian...). A few highlights not touched upon by these writers, as well as more recent developments, are added below. Among earlier descriptions of cameral de- posits, those by GIRTY (1915, p. 230-231) of Pseudorthoceras have been generally overlooked. He...

  3. Deposition

    National Nuclear Security Administration (NNSA)

    it as simple as possible. So that when 123 13 comes into effect, then the Secretary of Energy, with 14 the concurrence of the State Department and consulting 15 with the other...

  4. Deposition

    National Nuclear Security Administration (NNSA)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity of NaturalDukeWakefield Municipal GasAdministration Medal01 Sandia National 1 PAGE 1 OF2Guidance toTons (short)Reporting

  5. Zinc deposition in acid electrolytes

    SciTech Connect (OSTI)

    McBreen, J.; Gannon, E.

    1981-01-01

    In the past decade, two aqueous zinc/halogen batteries, the zinc/chlorine, and the zinc/bromine systems, have been considered for load-leveling and vehicular applications. Even though considerable progress has been made in engineering these batteries, several problems related to the zinc electrode have yet to be solved. These are related to the growth of dendritic zinc and a maldistribution of the zinc deposit that can occur during cycling. Both problems are exacerbated by recharge of the battery after partial discharge of the zinc deposit. A survey of the literature indicates that a more desireable zinc morphology can be achieved by use of inorganic additives, fluorinated surfactants, and A-C modulation of the charging current. In this investigation, the deposition of zinc from zinc bromide and zinc chloride electrolytes was investigated under conditions that precluded dendrite growth. The techniques used were cyclic voltammetry, the potential step technique and scanning electron microscopy. The variables investigated were the substrate (zinc and dense graphite), electrolyte pH, inorganic additives (Pb/sup + +/ and Bi/sup 3 +/) and A-V modulation of the charging potential by superimposed square waves.

  6. Ion beam assisted deposition of thermal barrier coatings

    DOE Patents [OSTI]

    Youchison, Dennis L. (Albuquerque, NM); McDonald, Jimmie M. (Albuquerque, NM); Lutz, Thomas J. (Albuquerque, NM); Gallis, Michail A. (Albuquerque, NM)

    2010-11-23

    Methods and apparatus for depositing thermal barrier coatings on gas turbine blades and vanes using Electron Beam Physical Vapor Deposition (EBPVD) combined with Ion Beam Assisted Deposition (IBAD).

  7. Deposition of biological aerosols on HVAC heat exchangers

    SciTech Connect (OSTI)

    Siegel, Jeffrey; Walker, Ian

    2001-09-01

    Many biologically active materials are transported as bioaerosols 1-10 {micro}m in diameter. These particles can deposit on cooling and heating coils and lead to serious indoor air quality problems. This paper investigates several of the mechanisms that lead to aerosol deposition on fin and tube heat exchangers. A model has been developed that incorporates the effects of several deposition mechanisms, including impaction, Brownian and turbulent diffusion, turbophoresis, thermophoresis, diffusiophoresis, and gravitational settling. The model is applied to a typical range of air velocities that are found in commercial and residential HVAC systems 1 - 6 m/s (200 - 1200 ft/min), particle diameters from 1 - 8 {micro}m, and fin spacings from 3.2 - 7.9 fins/cm (8 - 16 fins/inch or FPI). The results from the model are compared to results from an experimental apparatus that directly measures deposition on a 4.7 fins/cm (12 FPI) coil. The model agrees reasonably well with this measured data and suggests that cooling coils are an important sink for biological aerosols and consequently a potential source of indoor air quality problems.

  8. Atomic Layer DepositionAtomic Layer Deposition (ALD) Conformality in(ALD) Conformality in

    E-Print Network [OSTI]

    Rubloff, Gary W.

    Atomic Layer DepositionAtomic Layer Deposition (ALD) Conformality in(ALD) Conformality in Nanopores, removal of template, and subsequent TEM analysis. Significance Atomic layer deposition (ALD) is widely in Nanopores Intellectual merit While atomic layer deposition (ALD) enables unprecedented control of atomic

  9. ORISE: Applied health physics projects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Applied health physics projects The Oak Ridge Institute for Science and Education (ORISE) provides applied health physics services to government agencies needing technical support...

  10. Applied ALARA techniques

    SciTech Connect (OSTI)

    Waggoner, L.O.

    1998-02-05

    The presentation focuses on some of the time-proven and new technologies being used to accomplish radiological work. These techniques can be applied at nuclear facilities to reduce radiation doses and protect the environment. The last reactor plants and processing facilities were shutdown and Hanford was given a new mission to put the facilities in a safe condition, decontaminate, and prepare them for decommissioning. The skills that were necessary to operate these facilities were different than the skills needed today to clean up Hanford. Workers were not familiar with many of the tools, equipment, and materials needed to accomplish:the new mission, which includes clean up of contaminated areas in and around all the facilities, recovery of reactor fuel from spent fuel pools, and the removal of millions of gallons of highly radioactive waste from 177 underground tanks. In addition, this work has to be done with a reduced number of workers and a smaller budget. At Hanford, facilities contain a myriad of radioactive isotopes that are 2048 located inside plant systems, underground tanks, and the soil. As cleanup work at Hanford began, it became obvious early that in order to get workers to apply ALARA and use hew tools and equipment to accomplish the radiological work it was necessary to plan the work in advance and get radiological control and/or ALARA committee personnel involved early in the planning process. Emphasis was placed on applying,ALARA techniques to reduce dose, limit contamination spread and minimize the amount of radioactive waste generated. Progress on the cleanup has,b6en steady and Hanford workers have learned to use different types of engineered controls and ALARA techniques to perform radiological work. The purpose of this presentation is to share the lessons learned on how Hanford is accomplishing radiological work.

  11. Applied Science/Techniques

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity of NaturalDukeWakefieldSulfateSciTechtail.Theory of raregovAboutRecovery ActTools to someone byApplied Science/Techniques

  12. Chemical vapor deposition of epitaxial silicon

    DOE Patents [OSTI]

    Berkman, Samuel (Florham Park, NJ)

    1984-01-01

    A single chamber continuous chemical vapor deposition (CVD) reactor is described for depositing continuously on flat substrates, for example, epitaxial layers of semiconductor materials. The single chamber reactor is formed into three separate zones by baffles or tubes carrying chemical source material and a carrier gas in one gas stream and hydrogen gas in the other stream without interaction while the wafers are heated to deposition temperature. Diffusion of the two gas streams on heated wafers effects the epitaxial deposition in the intermediate zone and the wafers are cooled in the final zone by coolant gases. A CVD reactor for batch processing is also described embodying the deposition principles of the continuous reactor.

  13. APPLIED TECHNOLOGY Strategic Plan Summary

    E-Print Network [OSTI]

    Heller, Barbara

    SCHOOL OF APPLIED TECHNOLOGY Strategic Plan Summary #12;School of Applied Technology Strategic Plan Summary | 1 SCHOOL OF APPLIED TECHNOLOGY STRATEGIC PLAN SUMMARY MISSION STATEMENT The mission Technology and Management program to achieve national visibility. #12;School of Applied Technology Strategic

  14. Process for applying control variables having fractal structures

    DOE Patents [OSTI]

    Bullock, IV, Jonathan S. (Oak Ridge, TN); Lawson, Roger L. (Oliver Springs, TN)

    1996-01-01

    A process and apparatus for the application of a control variable having a fractal structure to a body or process. The process of the present invention comprises the steps of generating a control variable having a fractal structure and applying the control variable to a body or process reacting in accordance with the control variable. The process is applicable to electroforming where first, second and successive pulsed-currents are applied to cause the deposition of material onto a substrate, such that the first pulsed-current, the second pulsed-current, and successive pulsed currents form a fractal pulsed-current waveform.

  15. Process for applying control variables having fractal structures

    DOE Patents [OSTI]

    Bullock, J.S. IV; Lawson, R.L.

    1996-01-23

    A process and apparatus are disclosed for the application of a control variable having a fractal structure to a body or process. The process of the present invention comprises the steps of generating a control variable having a fractal structure and applying the control variable to a body or process reacting in accordance with the control variable. The process is applicable to electroforming where first, second and successive pulsed-currents are applied to cause the deposition of material onto a substrate, such that the first pulsed-current, the second pulsed-current, and successive pulsed currents form a fractal pulsed-current waveform. 3 figs.

  16. Modeling particle deposition on HVAC heat exchangers

    SciTech Connect (OSTI)

    Siegel, J.A.; Nazaroff, W.W.

    2002-01-01

    Fouling of fin-and-tube heat exchangers by particle deposition leads to diminished effectiveness in supplying ventilation and air conditioning. This paper explores mechanisms that cause particle deposition on heat exchanger surfaces. We present a model that accounts for impaction, diffusion, gravitational settling, and turbulence. Simulation results suggest that some submicron particles deposit in the heat exchanger core, but do not cause significant performance impacts. Particles between 1 and 10 {micro}m deposit with probabilities ranging from 1-20% with fin edge impaction representing the dominant mechanism. Particles larger than 10 {micro}m deposit by impaction on refrigerant tubes, gravitational settling on fin corrugations, and mechanisms associated with turbulent airflow. The model results agree reasonably well with experimental data, but the deposition of larger particles at high velocities is underpredicted. Geometric factors, such as discontinuities in the fins, are hypothesized to be responsible for the discrepancy.

  17. Chemical surface deposition of ultra-thin semiconductors

    DOE Patents [OSTI]

    McCandless, Brian E. (243 W. Main St., Elkton, MD 21921); Shafarman, William N. (1905 N. Van Buren St., Wilmington, DE 19802)

    2003-03-25

    A chemical surface deposition process for forming an ultra-thin semiconducting film of Group IIB-VIA compounds onto a substrate. This process eliminates particulates formed by homogeneous reactions in bath, dramatically increases the utilization of Group IIB species, and results in the formation of a dense, adherent film for thin film solar cells. The process involves applying a pre-mixed liquid coating composition containing Group IIB and Group VIA ionic species onto a preheated substrate. Heat from the substrate causes a heterogeneous reaction between the Group IIB and VIA ionic species of the liquid coating composition, thus forming a solid reaction product film on the substrate surface.

  18. Selective deposition of nanostructured ruthenium oxide using...

    Office of Scientific and Technical Information (OSTI)

    Selective deposition of nanostructured ruthenium oxide using Tobacco mosaic virus for micro-supercapacitors in solid Nafion electrolyte Citation Details In-Document Search Title:...

  19. External Surveillance of Geothermal Scale Deposits Employing...

    Open Energy Info (EERE)

    brine to provide in situ scale deposition observations without the disadvantage of dismantling piping for visual scale inspection. Exposure times and film orientations have been...

  20. MODELING PARTICLE DEPOSITION ON HVAC HEAT EXCHANGERS

    E-Print Network [OSTI]

    in supplying ventilation and air conditioning. This paper explores mechanisms that cause particle deposition energy and indoor air quality degradation for heating, ventilating, and air conditioning (HVAC) systems

  1. Sequence stratigraphy and depositional environments of the

    E-Print Network [OSTI]

    Engelder, Terry

    Sequence stratigraphy and depositional environments of the Shamokin (Union Springs) Member. Currently, his research focuses on earth surface processes, sedimentation, and stratigraphy. Mike Arthur

  2. In situ method for recovering hydrocarbon from subterranean oil shale deposits

    SciTech Connect (OSTI)

    Friedman, R.H.

    1987-11-03

    This patent describes in situ method for recovering hydrocarbons from subterranean oil shale deposits, the deposits comprising mineral rock and kerogen, comprising (a) penetrating the oil shale deposit with at least one well; (b) forming a zone of fractured and/or rubbilized oil shale material adjacent the well by hydraulic or explosive fracturing; (c) introducing a hydrogen donor solvent including tetralin into the portion of the oil shale formation treated in step (b) in a volume sufficient to fill substantially all of the void space created by the fracturing and rubbilizing treatment; (d) applying hydrogen to the tetralin and maintaining a predetermined pressure for a predetermined period of time sufficient to cause disintegration of the oil shale material; (e) thereafter introducing an oxidative environment into the portion of the oil shale deposit (f) producing the solvent in organic fragments to the surface of the earth, and (g) separating the organic fragments from the solvent.

  3. Applied Bohmian Mechanics

    E-Print Network [OSTI]

    A. Benseny; G. Albareda; A. S. Sanz; J. Mompart; X. Oriols

    2014-10-20

    Bohmian mechanics provides an explanation of quantum phenomena in terms of point particles guided by wave functions. This review focuses on the formalism of non-relativistic Bohmian mechanics, rather than its interpretation. Although the Bohmian and standard quantum theories have different formalisms, both give exactly the same predictions for all phenomena. Fifteen years ago, the quantum chemistry community began to study the practical usefulness of Bohmian mechanics. Since then, the scientific community has mainly applied it to study the (unitary) evolution of single-particle wave functions, either by developing efficient quantum trajectory algorithms or by providing a trajectory-based explanation of complicated quantum phenomena. Here we present a large list of examples showing how the Bohmian formalism provides a useful solution in different forefront research fields for this kind of problems (where the Bohmian and the quantum hydrodynamic formalisms coincide). In addition, this work also emphasizes that the Bohmian formalism can be a useful tool in other types of (non-unitary and nonlinear) quantum problems where the influence of the environment or the global wave function are unknown. This review contains also examples on the use of the Bohmian formalism for the many-body problem, decoherence and measurement processes. The ability of the Bohmian formalism to analyze this last type of problems for (open) quantum systems remains mainly unexplored by the scientific community. The authors of this review are convinced that the final status of the Bohmian theory among the scientific community will be greatly influenced by its potential success in these type of problems that present non-unitary and/or nonlinear quantum evolutions. A brief introduction of the Bohmian formalism and some of its extensions are presented in the last part of this review.

  4. Thick adherent dielectric films on plastic substrates and method for depositing same

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Ellingboe, Albert R. (Fremont, CA); Theiss, Steven D. (Woodbury, MN); Smith, Patrick M. (San Ramon, CA)

    2002-01-01

    Thick adherent dielectric films deposited on plastic substrates for use as a thermal barrier layer to protect the plastic substrates from high temperatures which, for example, occur during laser annealing of layers subsequently deposited on the dielectric films. It is desirable that the barrier layer has properties including: a thickness of 1 .mu.m or greater, adheres to a plastic substrate, does not lift-off when cycled in temperature, has few or no cracks and does not crack when subjected to bending, resistant to lift-off when submersed in fluids, electrically insulating and preferably transparent. The thick barrier layer may be composed, for example, of a variety of dielectrics and certain metal oxides, and may be deposited on a variety of plastic substrates by various known deposition techniques. The key to the method of forming the thick barrier layer on the plastic substrate is maintaining the substrate cool during deposition of the barrier layer. Cooling of the substrate maybe accomplished by the use of a cooling chuck on which the plastic substrate is positioned, and by directing cooling gas, such as He, Ar and N.sub.2, between the plastic substrate and the cooling chucks. Thick adherent dielectric films up to about 5 .mu.m have been deposited on plastic substrates which include the above-referenced properties, and which enable the plastic substrates to withstand laser processing temperatures applied to materials deposited on the dielectric films.

  5. Large Area Vacuum Deposited Coatings

    SciTech Connect (OSTI)

    Martin, Peter M.

    2003-04-30

    It's easy to make the myriad of types of large area and decorative coatings for granted. We probably don't even think about most of them; the low-e and heat mirror coatings on our windows and car windows, the mirrors in displays, antireflection coatings on windows and displays, protective coatings on aircraft windows, heater coatings on windshields and aircraft windows, solar reflectors, thin film solar cells, telescope mirrors, Hubble mirrors, transparent conductive coatings, and the list goes on. All these products require large deposition systems and chambers. Also, don't forget that large batches of small substrates or parts are coated in large chambers. In order to be cost effective hundreds of ophthalmic lenses, automobile reflectors, display screens, lamp reflectors, cell phone windows, laser reflectors, DWDM filters, are coated in batches.

  6. DepositMOre: Applying tools to increase full-text content in

    E-Print Network [OSTI]

    Southampton, University of

    Facebook SWORD client hbp://blog.stuartlewis.com/2009/06/02/how-does-the-facebook-sword-client-actually

  7. Optical Properties of Zn(O,S) Thin Films Deposited by RF Sputtering, Atomic Layer Deposition, and Chemical Bath Deposition: Preprint

    SciTech Connect (OSTI)

    Li, J.; Glynn, S.; Christensen, S.; Mann, J.; To, B.; Ramanathan, K.; Noufi, R.; Furtak, T. E.; Levi, D.

    2012-06-01

    Zn(O,S) thin films 27 - 100 nm thick were deposited on glass or Cu(InxGa1-x)Se2/Molybdenum/glass with RF sputtering, atomic layer deposition, and chemical bath deposition.

  8. Applying Mathematics.... ... to catch criminals

    E-Print Network [OSTI]

    O'Leary, Michael

    Applying Mathematics.... ... to catch criminals Mike O'Leary Department of Mathematics Towson University Stevenson University Kappa Mu Epsion 2008 Mike O'Leary (Towson University) Applying mathematics Department Mike O'Leary (Towson University) Applying mathematics to catch criminals September 10, 2008 2 / 42

  9. Journal of Applied Ecology 2004

    E-Print Network [OSTI]

    Holl, Karen

    Journal of Applied Ecology 2004 41, 922­933 © 2004 British Ecological Society Blackwell Publishing-scale, Sacramento River, succession, vegetation Journal of Applied Ecology (2004) 41, 922­933 Introduction More than@ucsc.edu). #12;923 Riparian forest restoration © 2004 British Ecological Society, Journal of Applied Ecology, 41

  10. Journal of Applied Ecology 2002

    E-Print Network [OSTI]

    Holl, Karen

    Journal of Applied Ecology 2002 39, 960­970 © 2002 British Ecological Society Blackwell Science- tion, succession. Journal of Applied Ecology (2002) 39, 960­970 Introduction Efforts to reclaim@ucsc.edu). #12;961 Vegetation on reclaimed mines © 2002 British Ecological Society, Journal of Applied Ecology

  11. Journal of Applied Ecology 2007

    E-Print Network [OSTI]

    Journal of Applied Ecology 2007 44, 748­759 © 2007 The Authors. Journal compilation © 2007 British, distribution, edge, marbled murrelets, model transferability, old-growth Journal of Applied Ecology (2007) 44-nesting Alcid © 2007 The Authors. Journal compilation © 2007 British Ecological Society, Journal of Applied

  12. Continuous near-field electrospinning for large area deposition of orderly nanofiber patterns

    E-Print Network [OSTI]

    Lin, Liwei

    Continuous near-field electrospinning for large area deposition of orderly nanofiber patterns Chieh; accepted 4 August 2008; published online 24 September 2008 A continuous near-field electrospinning NFES the onset of electrospinning, a bias voltage is applied to a semispherical shaped polymer droplet outside

  13. DEPOSITION OF SILICA FROM GEOTHERIAL WATERS ON

    E-Print Network [OSTI]

    Gudmundsson, Jon Steinar

    DEPOSITION OF SILICA FROM GEOTHERIAL WATERS ON HEAT T RAN5FER SU R FACES by J.S, GUDMtJNDSSQN & T in specia1l designed equipment have been carried out on deposition from hot geothermal water from two, it was stated that low temperature waters (8O--ll0°C) have traditionally been used for district heating purposes

  14. Chemical vapor deposition of mullite coatings

    DOE Patents [OSTI]

    Sarin, Vinod (Lexington, MA); Mulpuri, Rao (Boston, MA)

    1998-01-01

    This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

  15. GPS Tracking Performance under Avalanche Deposited Snow

    E-Print Network [OSTI]

    Calgary, University of

    GPS Tracking Performance under Avalanche Deposited Snow John B. Schleppe and Gérard Lachapelle Positioning System (HSGPS) receivers under avalanche deposited snow was investigated. Two field trials were in the snow pack. GPS Signal attenuation of approximately 1.8 dB per metre of snow penetration was measured

  16. depositional framework 30 ka isochronous surface

    E-Print Network [OSTI]

    Chen, Wen-Shan

    in the Quaternary of the Virginia coast, USA. Sedimentology, 50, 81-111. #12;114 How to reconstruct the depositional, it is difficult to reconstruct the subsurface depositional framework of litho-stratigraphy due to strong lateral be derived through the study of chrono-stratigraphy Key words: the last glacial period, sequence stratigraphy

  17. Energy deposition update Front End phone meeting

    E-Print Network [OSTI]

    McDonald, Kirk

    Energy deposition update P. Snopok Front End phone meeting March 31, 2015 #12;MARS · Modified geometry is strongly desired · Energy change is via RF kick at the center of the cavity ­ MARS invokes in ICOOL/G4beamline · How thick the beampipe and shielding around (if any) should be ­ energy deposition

  18. Ammonia release method for depositing metal oxides

    DOE Patents [OSTI]

    Silver, G.L.; Martin, F.S.

    1994-12-13

    A method is described for depositing metal oxides on substrates which is indifferent to the electrochemical properties of the substrates and which comprises forming ammine complexes containing metal ions and thereafter effecting removal of ammonia from the ammine complexes so as to permit slow precipitation and deposition of metal oxide on the substrates. 1 figure.

  19. Ammonia release method for depositing metal oxides

    DOE Patents [OSTI]

    Silver, Gary L. (Centerville, OH); Martin, Frank S. (Farmersville, OH)

    1994-12-13

    A method of depositing metal oxides on substrates which is indifferent to the electrochemical properties of the substrates and which comprises forming ammine complexes containing metal ions and thereafter effecting removal of ammonia from the ammine complexes so as to permit slow precipitation and deposition of metal oxide on the substrates.

  20. Chemical vapor deposition coating for micromachines

    SciTech Connect (OSTI)

    MANI,SEETHAMBAL S.; FLEMING,JAMES G.; SNIEGOWSKI,JEFFRY J.; DE BOER,MAARTEN P.; IRWIN,LAWRENCE W.; WALRAVEN,JEREMY A.; TANNER,DANELLE M.; DUGGER,MICHAEL T.

    2000-04-21

    Two major problems associated with Si-based MEMS devices are stiction and wear. Surface modifications are needed to reduce both adhesion and friction in micromechanical structures to solve these problems. In this paper, the authors will present a process used to selectively coat MEMS devices with tungsten using a CVD (Chemical Vapor Deposition) process. The selective W deposition process results in a very conformal coating and can potentially solve both stiction and wear problems confronting MEMS processing. The selective deposition of tungsten is accomplished through silicon reduction of WF{sub 6}, which results in a self-limiting reaction. The selective deposition of W only on polysilicon surfaces prevents electrical shorts. Further, the self-limiting nature of this selective W deposition process ensures the consistency necessary for process control. Selective tungsten is deposited after the removal of the sacrificial oxides to minimize process integration problems. This tungsten coating adheres well and is hard and conducting, requirements for device performance. Furthermore, since the deposited tungsten infiltrates under adhered silicon parts and the volume of W deposited is less than the amount of Si consumed, it appears to be possible to release stuck parts that are contacted over small areas such as dimples. Results from tungsten deposition on MEMS structures with dimples will be presented. The effect of wet and vapor phase cleanings prior to the deposition will be discussed along with other process details. The W coating improved wear by orders of magnitude compared to uncoated parts. Tungsten CVD is used in the integrated-circuit industry, which makes this approach manufacturable.

  1. Sandia Energy - Applied Turbulent Combustion

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    and they form the basis for the creation of validated submodels that bridge fundamental energy sciences with applied device engineering and optimization. Turbulent-combustion-lab...

  2. Photobiomolecular deposition of metallic particles and films

    DOE Patents [OSTI]

    Hu, Zhong-Cheng

    2005-02-08

    The method of the invention is based on the unique electron-carrying function of a photocatalytic unit such as the photosynthesis system I (PSI) reaction center of the protein-chlorophyll complex isolated from chloroplasts. The method employs a photo-biomolecular metal deposition technique for precisely controlled nucleation and growth of metallic clusters/particles, e.g., platinum, palladium, and their alloys, etc., as well as for thin-film formation above the surface of a solid substrate. The photochemically mediated technique offers numerous advantages over traditional deposition methods including quantitative atom deposition control, high energy efficiency, and mild operating condition requirements.

  3. Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures

    E-Print Network [OSTI]

    Pham, Calvin Dinh-Tu

    2015-01-01

    deposited by metalorganic chemical vapor deposition on Pt/M. and et al. (1993). "Chemical vapour deposition of high-Tand J. P. Chang (2012). "Chemical Processing of Materials on

  4. Integrated Sustainability Analysis of Atomic Layer Deposition for Microelectronics Manufacturing

    E-Print Network [OSTI]

    Yuan, Chris Yingchun; David Dornfeld

    2010-01-01

    E. , 2002, “Thin Film Atomic Layer Deposition Equipment forA. , 2000, “Atomic Layer Deposition of Titanium Oxide FromHarsta, A. , 2001, “Atomic Layer Deposition of Zirco- nium

  5. Atomic Layer Deposition Enabled Synthesis of Multiferroic Nanostructures

    E-Print Network [OSTI]

    Pham, Calvin Dinh-Tu

    2015-01-01

    Thin Films by Atomic Layer Deposition." Advanced FunctionalPlasma enhanced atomic layer deposition of HfO 2 and ZrO 2et al. (2003). "Atomic Layer Deposition (ALD) of Bismuth

  6. The Foundations of Applied Mathematics

    E-Print Network [OSTI]

    Baez, John

    The Foundations of Applied Mathematics John Baez Category-Theoretic Foundations of Mathematics Workshop May 5, 2013 #12;We often picture the flow of information about mathematics a bit like this: SCIENCE AND ENGINEERING APPLIED MATHEMATICS PURE MATHEMATICS FOUNDATIONS OF MATHEMATICS #12;Of course

  7. Surface Chemistry in Chemical Deposition of Manganese-Based Thin Films on Silicon Substrates

    E-Print Network [OSTI]

    Sun, Huaxing

    2013-01-01

    1.2  Atomic  layer  deposition……………………………………………………………………3  especially   atomic   layer   deposition,  to  deposit  Cu  CVD)   and   atomic  layer  deposition  (ALD)  from  the  

  8. Innovative High-Performance Deposition Technology for Low-Cost...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Innovative High-Performance Deposition Technology for Low-Cost Manufacturing of OLED Lighting Innovative High-Performance Deposition Technology for Low-Cost Manufacturing of OLED...

  9. Low-temperature plasma-deposited silicon epitaxial films: Growth...

    Office of Scientific and Technical Information (OSTI)

    Low-temperature plasma-deposited silicon epitaxial films: Growth and properties Citation Details In-Document Search Title: Low-temperature plasma-deposited silicon epitaxial films:...

  10. Solvothermal Thin Film Deposition of Electron Blocking Layers...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Solvothermal Thin Film Deposition of Electron Blocking Layers Home > Research > ANSER Research Highlights > Solvothermal Thin Film Deposition of Electron Blocking Layers...

  11. Analysis Of Hot Springs And Associated Deposits In Yellowstone...

    Open Energy Info (EERE)

    analysis, and VNIR spectroscopy. Samples of hot spring deposits, geyser deposits, and soil were also collected. Analysis of ASTER data provided broad scale characteristics of the...

  12. Spatial atomic layer deposition on flexible substrates using...

    Office of Scientific and Technical Information (OSTI)

    Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor Citation Details In-Document Search Title: Spatial atomic layer deposition on...

  13. Electroless Atomic Layer Deposition: A Scalable Approach to Surface...

    Office of Scientific and Technical Information (OSTI)

    Electroless Atomic Layer Deposition: A Scalable Approach to Surface Modified Metal Powders. Citation Details In-Document Search Title: Electroless Atomic Layer Deposition: A...

  14. An electroless approach to atomic layer deposition on noble metal...

    Office of Scientific and Technical Information (OSTI)

    An electroless approach to atomic layer deposition on noble metal powders. Citation Details In-Document Search Title: An electroless approach to atomic layer deposition on noble...

  15. Source replenishment device for vacuum deposition

    DOE Patents [OSTI]

    Hill, Ronald A. (Albuquerque, NM)

    1988-01-01

    A material source replenishment device for use with a vacuum deposition apparatus. The source replenishment device comprises an intermittent motion producing gear arrangement disposed within the vacuum deposition chamber. An elongated rod having one end operably connected to the gearing arrangement is provided with a multiarmed head at the opposite end disposed adjacent the heating element of the vacuum deposition apparatus. An inverted U-shaped source material element is releasably attached to the outer end of each arm member whereby said multiarmed head is moved to locate a first of said material elements above said heating element, whereupon said multiarmed head is lowered to engage said material element with the heating element and further lowered to release said material element on the heating element. After vaporization of said material element, second and subsequent material elements may be provided to the heating element without the need for opening the vacuum deposition apparatus to the atmosphere.

  16. Source replenishment device for vacuum deposition

    DOE Patents [OSTI]

    Hill, R.A.

    1986-05-15

    A material source replenishment device for use with a vacuum deposition apparatus is described. The source replenishment device comprises an intermittent motion producing gear arrangement disposed within the vacuum deposition chamber. An elongated rod having one end operably connected to the gearing arrangement is provided with a multiarmed head at the opposite end disposed adjacent the heating element of the vacuum deposition apparatus. An inverted U-shaped source material element is releasably attached to the outer end of each arm member whereby said multiarmed head is moved to locate a first of said material elements above said heating element, whereupon said multiarmed head is lowered to engage said material element with the heating element and further lowered to release said material element on the heating element. After vaporization of said material element, second and subsequent material elements may be provided to the heating element without the need for opening the vacuum deposition apparatus to the atmosphere.

  17. Chemical vapor deposition of antimicrobial polymer coatings

    E-Print Network [OSTI]

    Martin, Tyler Philip, 1977-

    2007-01-01

    There is large and growing interest in making a wide variety of materials and surfaces antimicrobial. Initiated chemical vapor deposition (iCVD), a solventless low-temperature process, is used to form thin films of polymers ...

  18. Resuspension and dry deposition research needs

    SciTech Connect (OSTI)

    Sehmel, G.A.

    1983-01-01

    The author concludes that better predictive models are needed for the signifcant health, ecological, and economic impacts of resuspended particles and their subsequent dry deposition. Both chemical and radioactive aerosols are discussed. (PSB)

  19. Modeling particle deposition on HVAC heat exchangers

    E-Print Network [OSTI]

    Siegel, J.A.; Nazaroff, W.W.

    2002-01-01

    Vol. 11, pp 943-945. Muyshondt A, Nutter D, and Gordon M.particle deposition (Muyshondt et al. , 1998). The purposedynamic simulations of Muyshondt et al. (1998). Despite some

  20. Method of deposition by molecular beam epitaxy

    DOE Patents [OSTI]

    Chalmers, S.A.; Killeen, K.P.; Lear, K.L.

    1995-01-10

    A method is described for reproducibly controlling layer thickness and varying layer composition in an MBE deposition process. In particular, the present invention includes epitaxially depositing a plurality of layers of material on a substrate with a plurality of growth cycles whereby the average of the instantaneous growth rates for each growth cycle and from one growth cycle to the next remains substantially constant as a function of time. 9 figures.

  1. Nitrogen Deposition in the Southern High Plains 

    E-Print Network [OSTI]

    Upadhyay, Jeetendra; Auvermann, Brent W.; Bush, K. Jack; Mukhtar, Saqib

    2008-02-11

    convert nitrogen into other chemical forms. Legume roots sustain rhizobia, the organisms capable of nitrogen fixation, a microbial process for con- verting nitrogen into ammonium (NH 4 ). Reactive nitrogen species (RNS) are nitrogen- bearing compounds... acid gas can dissolve as the ammonium ion (NH 4 +), where it may react with Sources Transport / Transformation Removal Effects Photochemistry Chemical Transformations Cloud Processes Vertical Mixing Prevailing Winds Dry DepositionWet Deposition...

  2. Polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey, Thomas M. (Los Alamos, NM); Burrell, Anthony K. (Los Alamos, NM); Jia, Quanxi (Los Alamos, NM); Lin, Yuan (Los Alamos, NM)

    2008-04-29

    A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  3. Polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey, Thomas M. (Los Alamos, NM); Burrell; Anthony K. (Los Alamos, NM); Jia; Quanxi (Los Alamos, NM); Lin; Yuan (Los Alamos, NM)

    2009-10-20

    A polymer assisted deposition process for deposition of metal oxide films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films and the like. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  4. Energy deposition in STARFIRE reactor components

    SciTech Connect (OSTI)

    Gohar, Y.; Brooks, J.N.

    1985-04-01

    The energy deposition in the STARFIRE commercial tokamak reactor was calculated based on detailed models for the different reactor components. The heat deposition and the 14 MeV neutron flux poloidal distributions in the first wall were obtained. The poloidal surface heat load distribution in the first wall was calculated from the plasma radiation. The Monte Carlo method was used for the calculation to allow an accurate modeling for the reactor geometry.

  5. Semiconductor assisted metal deposition for nanolithography applications

    DOE Patents [OSTI]

    Rajh, Tijana (Naperville, IL); Meshkov, Natalia (Downers Grove, IL); Nedelijkovic, Jovan M. (Belgrade, YU); Skubal, Laura R. (West Brooklyn, IL); Tiede, David M. (Elmhurst, IL); Thurnauer, Marion (Downers Grove, IL)

    2002-01-01

    An article of manufacture and method of forming nanoparticle sized material components. A semiconductor oxide substrate includes nanoparticles of semiconductor oxide. A modifier is deposited onto the nanoparticles, and a source of metal ions are deposited in association with the semiconductor and the modifier, the modifier enabling electronic hole scavenging and chelation of the metal ions. The metal ions and modifier are illuminated to cause reduction of the metal ions to metal onto the semiconductor nanoparticles.

  6. Hydrocarbon and Deposit Morphology Effects on EGR Cooler Deposit Stability and Removal

    Office of Energy Efficiency and Renewable Energy (EERE)

    This paper reports on studies carried out at ORNL to examine the shear force required to remove particles from a well-developed EGR cooler deposit.

  7. Applied Surface Science 256 (2010) 43574364 Contents lists available at ScienceDirect

    E-Print Network [OSTI]

    Bristol, University of

    2010-01-01

    deposited on tungsten carbide can lead to major improvements in the life and performance of cutting tools. © 2010 Elsevier B.V. All rights reserved. 1. Introduction The materials used for cutting tools, sliding]. Coatings of superhard materials are often applied to increase the useful lifespan of such tools [2­4]. Dia

  8. GRADUATE BOOKLET Physics / Applied Physics

    E-Print Network [OSTI]

    Rock, Chris

    GRADUATE BOOKLET Physics / Applied Physics This booklet contains rules, guidelines and general information about graduate studies in the Physics Department at Texas Tech University. It does not replace documents. Contents I. General Comments: Admission, general policies, deadlines, etc II. Minimum

  9. Modeling applied to problem solving

    E-Print Network [OSTI]

    Pawl, Andrew

    We describe a modeling approach to help students learn expert problem solving. Models are used to present and hierarchically organize the syllabus content and apply it to problem solving, but students do not develop and ...

  10. IIT SCHOOL OF APPLIED TECHNOLOGY

    E-Print Network [OSTI]

    Heller, Barbara

    . MANUFACTURINGTECHNOLOGY. #12;BE A LEADER OF THE NEXT INDUSTRIAL REVOLUTION. An undergraduate degree in IndustrialINDUSTRIAL TECHNOLOGY AND MANAGEMENT IIT SCHOOL OF APPLIED TECHNOLOGY INDUSTRIAL OPERATIONS. RESOURCE MANAGEMENT. INDUSTRIAL FACILITIES. SUPPLY CHAIN MANAGEMENT. SUSTAINABILITY

  11. Palladium catalysts synthesized by atomic layer deposition for methanol decomposition.

    SciTech Connect (OSTI)

    Elam, J. W.; Feng, H.; Stair, P. C.; Libera, J. A.; Setthapun, W.; Northwestern Univ.

    2010-05-25

    Atomic layer deposition (ALD) palladium films were deposited at 200 C on various ALD metal oxide surfaces using sequential exposures to Pd(II) hexafluoroacetylacetonate (Pd(hfac)2) and formalin. In situ quartz crystal microbalance measurements as well as ex situ measurements performed on planar substrates revealed that the Pd growth begins with a relatively slow nucleation process and accelerates once an adequate amount of Pd has deposited on the surface. Furthermore, the Pd nucleation is faster on ALD ZnO surfaces compared to ALD Al2O3 surfaces. ALD was utilized to synthesize highly dispersed, uniform Pd nanoparticles (1 to 2 nm in diameter) on ALD ZnO and Al2O3 coated mesoporous silica gel, and the catalytic performances of these samples were compared in the methanol decomposition reaction. The ALD Pd-Al2O3 showed high activity and hydrogen selectivity at relatively low temperatures while the ALD Pd-ZnO showed very low activity as well as quick deactivation. In situ extended X-ray absorption fine structure (EXAFS) measurement revealed that the Pd supported on ZnO 'dissolves' into the substrate during the methanol decomposition reaction which accounts for the gradual disappearance of its catalytic activity. By applying one cycle of ALD Al2O3 on top of the Pd-ZnO catalyst, the activity was enhanced and the catalyst deactivation was mitigated. This Al2O3 overcoating method stabilizes the Pd-ZnO and effectively prevents the dissolution of Pd into the ZnO substrate.

  12. Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective

    SciTech Connect (OSTI)

    Anders, Andre

    2007-02-28

    Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."

  13. Wax Deposition and Aging in Flowlines from Irreversible Thermodynamics

    E-Print Network [OSTI]

    Firoozabadi, Abbas

    Wax Deposition and Aging in Flowlines from Irreversible Thermodynamics Hussein Hoteit, Reza Banki of the wax deposit. However, most of these models assume that the wax-oil (gel) deposit has a constant wax content. In this work, we analyze wax deposition in laminar flow regime to predict the thickness

  14. Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Elam, Jeffrey W.; Xiong, Guang; Han, Catherine Y.; Wang, H. Hau; Birrell, James P.; Welp, Ulrich; Hryn, John N.; Pellin, Michael J.; Baumann, Theodore F.; Poco, John F.; et al

    2006-01-01

    Atomic layer deposition ( ALD ) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used ALD to coat two nanoporous solids: anodic aluminum oxide ( AAO ) and silica aerogels. AAO possesses hexagonally ordered pores with diameters d ? 40 nm and pore length L ? 70 microns. The AAO membranes were coated by ALD to fabricatemore »catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. Additional AAO membranes coated with ALD Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors by ALD . « less

  15. Patterns of permeability in eolian deposits

    SciTech Connect (OSTI)

    Goggin, D.J.; Chandler, M.A.; Kocurek, G.; Lake, L.W.

    1988-06-01

    The eolian, Jurassic Page sandstone of northeastern Arizona is marked by a highly ordered heterogeneity. The heterogeneity is expressed by the intricate association of stratification types, which are a direct result of the depositional processes. The dominant stratification types in eolian reservoirs are grainflow, grainfall, and wind-ripple deposits, which form on the lee faces of migrating dunes; interdune deposits, which form between migrating dunes; and extra-erg deposits, which occur sporadically when other depositional environments encroach upon an eolian system. These stratification types each have a unique permeability range, which implies that the fluid migration routes in eolian reservoirs will be dictated by the geometry and types of stratification present. One of the most important aspects of this study is the correlation of qualitative geologic descriptions with quantitative variables such as permeability. About 2,000 measurements were made with a field minipermeameter on an outcrop of the Page sandstone. These data show that three distinct permeability modes directly relate to the different stratification types.

  16. Atmospheric P deposition to the subtropical North Atlantic: sources, properties, and relationship to N deposition

    E-Print Network [OSTI]

    Hansell, Dennis

    phosphorus. Here we report measurements of phosphorus in aerosols and wet deposition at Miami and Barbados. African dust is the major aerosol P source at both Miami and Barbados, containing ~880 ppm total. Estimated SRP deposition in Barbados and Miami is 0.21 and 0.13 mmol mÀ2 dÀ1 phosphorus, respectively

  17. Method for deposition of a conductor in integrated circuits

    DOE Patents [OSTI]

    Creighton, J.R.; Dominguez, F.; Johnson, A.W.; Omstead, T.R.

    1997-09-02

    A method is described for fabricating integrated semiconductor circuits and, more particularly, for the selective deposition of a conductor onto a substrate employing a chemical vapor deposition process. By way of example, tungsten can be selectively deposited onto a silicon substrate. At the onset of loss of selectivity of deposition of tungsten onto the silicon substrate, the deposition process is interrupted and unwanted tungsten which has deposited on a mask layer with the silicon substrate can be removed employing a halogen etchant. Thereafter, a plurality of deposition/etch back cycles can be carried out to achieve a predetermined thickness of tungsten. 2 figs.

  18. Suspension chemistry and electrophoretic deposition of zirconia electrolyte on conducting and non-conducting substrates

    SciTech Connect (OSTI)

    Das, Debasish; Basu, Rajendra N.

    2013-09-01

    Graphical abstract: - Highlights: • Stable suspension of yttria stabilized zirconia (YSZ) obtained in isopropanol medium. • Suspension chemistry and process parameters for electrophoretic deposition optimized. • Deposited film quality changed with iodine and water (dispersants) concentration. • Dense YSZ film (?5 ?m) fabricated onto non-conducting porous NiO-YSZ anode substrate. - Abstract: Suspensions of 8 mol% yttria stabilized zirconia (YSZ) particulates in isopropanol medium are prepared using acetylacetone, iodine and water as dispersants. The effect of dispersants concentration on suspension stability, particle size distribution, electrical conductivity and pH of the suspensions are studied in detail to optimize the suspension chemistry. Electrophoretic deposition (EPD) has been conducted to produce thin and dense YSZ electrolyte films. Deposition kinetics have been studied in depth and good quality films on conducting substrate are obtained at an applied voltage of 15 V for 3 min. YSZ films are also fabricated on non-conducting NiO-YSZ anode substrate using a steel plate on the reverse side of the substrate. Upon co-firing at 1400 °C for 6 h a dense YSZ film of thickness ?5 ?m is obtained. Such a half cell (anode + electrolyte) can be used to fabricate a solid oxide fuel cell on applying a suitable cathode layer.

  19. A Generic Model for the Resuspension of Multilayer Aerosol Deposits by Turbulent Flow

    SciTech Connect (OSTI)

    Friess, H.; Yadigaroglu, G. [Swiss Federal Institute of Technology (Switzerland)

    2001-06-15

    An idealized lattice structure is considered of multilayer aerosol deposits, where every particle at the deposit surface is associated with a resuspension rate constant depending on a statistically distributed particle parameter and on flow conditions. The response of this generic model is represented by a set of integrodifferential equations. As a first application of the general formalism, the behavior of Fromentin's multilayer model is analyzed, and the model parameters are adapted to experimental data. In addition, improved relations between model parameters and physical input parameters are proposed. As a second application, a method is proposed for building multilayer models by using resuspension rate constants of existing monolayer models. The method is illustrated by a sample of monolayer data resulting from the model of Reeks, Reed, and Hall. Also discussed is the error to be expected if a monolayer resuspension model, which works well for thin aerosol deposits, is applied to thick deposits under the classical monolayer assumption that all deposited particles interact with the fluid at all times.

  20. CX-009418: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Electron Beam Melting CX(s) Applied: None applied. Date: 10/30/2012 Location(s): Missouri Offices(s): Kansas City Site Office

  1. CX-009420: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Additive Manufacturing Using EOSINT M280 CX(s) Applied: None applied. Date: 10/30/2012 Location(s): Missouri Offices(s): Kansas City Site Office

  2. CX-009419: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Magnetic Pulser CX(s) Applied: None applied. Date: 10/30/2012 Location(s): Missouri Offices(s): Kansas City Site Office

  3. Line-of-sight deposition method

    DOE Patents [OSTI]

    Patten, J.W.; McClanahan, E.D.; Bayne, M.A.

    1980-04-16

    A line-of-sight method of depositing a film having substantially 100% of theoretical density on a substrate. A pressure vessel contains a target source having a surface thereof capable of emitting particles therefrom and a substrate with the source surface and the substrate surface positioned such that the source surface is substantially parallel to the direction of the particles impinging upon the substrate surface, the distance between the most remote portion of the substrate surface receiving the particles and the source surface emitting the particles in a direction parallel to the substrate surface being relatively small. The pressure in the vessel is maintained less than about 5 microns to prevent scattering and permit line-of-sight deposition. By this method the angles of incidence of the particles impinging upon the substrate surface are in the range of from about 45/sup 0/ to 90/sup 0/ even when the target surface area is greatly expanded to increase the deposition rate.

  4. Forming aspheric optics by controlled deposition

    DOE Patents [OSTI]

    Hawryluk, A.M.

    1998-04-28

    An aspheric optical element is disclosed formed by depositing material onto a spherical surface of an optical element by controlled deposition to form an aspheric surface of desired shape. A reflecting surface, single or multi-layer, can then be formed on the aspheric surface by evaporative or sputtering techniques. Aspheric optical elements are suitable for deep ultra-violet (UV) and x-ray wavelengths. The reflecting surface may, for example, be a thin ({approx}100 nm) layer of aluminum, or in some cases the deposited modifying layer may function as the reflecting surface. For certain applications, multi-layer reflective surfaces may be utilized, such as chromium-carbon or tungsten-carbon multi-layer, with the number of layers and thickness being determined by the intended application. 4 figs.

  5. Forming aspheric optics by controlled deposition

    DOE Patents [OSTI]

    Hawryluk, Andrew M. (Modesto, CA)

    1998-01-01

    An aspheric optical element formed by depositing material onto a spherical surface of an optical element by controlled deposition to form an aspheric surface of desired shape. A reflecting surface, single or multi-layer, can then be formed on the aspheric surface by evaporative or sputtering techniques. Aspheric optical elements are suitable for deep ultra-violet (UV) and x-ray wavelengths. The reflecting surface may, for example, be a thin (.about.100 nm) layer of aluminum, or in some cases the deposited modifying layer may function as the reflecting surface. For certain applications, multi-layer reflective surfaces may be utilized, such as chromium-carbon or tungsten-carbon multi-layer, with the number of layers and thickness being determined by the intended application.

  6. Glow discharge plasma deposition of thin films

    DOE Patents [OSTI]

    Weakliem, Herbert A. (Pennington, NJ); Vossen, Jr., John L. (Bridgewater, NJ)

    1984-05-29

    A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.

  7. Ash & Pulverized Coal Deposition in Combustors & Gasifiers

    SciTech Connect (OSTI)

    Goodarz Ahmadi

    1998-12-02

    Further progress in achieving the objectives of the project was made in the period of January I to March 31, 1998. The direct numerical simulation of particle removal process in turbulent gas flows was completed. Variations of particle trajectories are studied. It is shown that the near wall vortices profoundly affect the particle removal process in turbulent boundary layer flows. Experimental data for transport and deposition of fibrous particles in the aerosol wind tunnel was obtained. The measured deposition velocity for irregular fibrous particles is compared with the empirical correlation and the available data for glass fibers and discussed. Additional progress on the sublayer model for evaluating the particle deposition and resuspension in turbulent flows was made.

  8. Ash & Pulverized Coal Deposition in Combustors & Gasifiers

    SciTech Connect (OSTI)

    Goodarz Ahmadi

    1998-12-02

    Further progress in achieving the objectives of the project was made in the period of October 1 to December 31, 1996. In particular, the sublayer model for evaluating the particle deposition in turbulent flows was extended to include the effect of particle rebound. A new more advance flow model for the near wall vortices is also used in these analysis. The computational model for simulating particle transport in turbulent flows was used to analyze the dispersion and deposition of particles in a recirculating flow region. The predictions of the particle resuspension model is compared with the experimental data. It is shown that when the effects of the near wall flow structure, as we as the surface roughness are included the model agrees with the available experimental data. Considerable progress was also made in the direct numerical simulation of particle removal process in turbulent gas flows. Experimental data for transport and deposition of glass fiber in the aerosol wind tunnel was also obtained.

  9. Supplemental heating of deposition tooling shields

    DOE Patents [OSTI]

    Ohlhausen, James A. (Albuquerque, NM); Peebles, Diane E. (Albuquerque, NM); Hunter, John A. (Albuquerque, NM); Eckelmeyer, Kenneth H. (Albuquerque, NM)

    2000-01-01

    A method of reducing particle generation from the thin coating deposited on the internal surfaces of a deposition chamber which undergoes temperature variation greater than 100.degree. C. comprising maintaining the temperature variation of the internal surfaces low enough during the process cycle to keep thermal expansion stresses between the coating and the surfaces under 500 MPa. For titanium nitride deposited on stainless steel, this means keeping temperature variations under approximately 70.degree. C. in a chamber that may be heated to over 350.degree. C. during a typical processing operation. Preferably, a supplemental heater is mounted behind the upper shield and controlled by a temperature sensitive element which provides feedback control based on the temperature of the upper shield.

  10. Chemical vapor deposition of group IIIB metals

    DOE Patents [OSTI]

    Erbil, A.

    1989-11-21

    Coatings of Group IIIB metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula given in the patent where M is a Group IIIB metal, such as lanthanum or yttrium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula 1 is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as lanthanum telluride can be deposited from a lanthanum compound of formula 1 and a heat decomposable tellurium compound under nonoxidizing conditions.

  11. Liquid injection plasma deposition method and apparatus

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID); Watkins, Arthur D. (Idaho Falls, ID)

    1999-01-01

    A liquid injection plasma torch deposition apparatus for depositing material onto a surface of a substrate may comprise a plasma torch for producing a jet of plasma from an outlet nozzle. A plasma confinement tube having an inlet end and an outlet end and a central bore therethrough is aligned with the outlet nozzle of the plasma torch so that the plasma jet is directed into the inlet end of the plasma confinement tube and emerges from the outlet end of the plasma confinement tube. The plasma confinement tube also includes an injection port transverse to the central bore. A liquid injection device connected to the injection port of the plasma confinement tube injects a liquid reactant mixture containing the material to be deposited onto the surface of the substrate through the injection port and into the central bore of the plasma confinement tube.

  12. Liquid injection plasma deposition method and apparatus

    DOE Patents [OSTI]

    Kong, P.C.; Watkins, A.D.

    1999-05-25

    A liquid injection plasma torch deposition apparatus for depositing material onto a surface of a substrate may comprise a plasma torch for producing a jet of plasma from an outlet nozzle. A plasma confinement tube having an inlet end and an outlet end and a central bore therethrough is aligned with the outlet nozzle of the plasma torch so that the plasma jet is directed into the inlet end of the plasma confinement tube and emerges from the outlet end of the plasma confinement tube. The plasma confinement tube also includes an injection port transverse to the central bore. A liquid injection device connected to the injection port of the plasma confinement tube injects a liquid reactant mixture containing the material to be deposited onto the surface of the substrate through the injection port and into the central bore of the plasma confinement tube. 8 figs.

  13. Ash and pulverized coal deposition in combustors and gasifiers. Quarterly technical progress report, April 1, 1996--June 30, 1996

    SciTech Connect (OSTI)

    Ahmadi, G.

    1996-10-01

    The general goal of this project is to provide a fundamental understanding of deposition processes of flyash and pulverized coal particles in coal combustors and coal gasifiers. In the period of April 1 to June 30, 1996, further research progress was made. The computational model for simulating particle motions in turbulent flows was applied to the dispersion and deposition analysis. The study of particle transport and deposition in a circular duct was completed and the major findings are summarized. A detailed model for particle resuspension process in a gas flow is developed. The new model accounts for the surface adhesion, surface roughness, as well as the structure of near wall turbulent flows. The model also accounts for all the relevant hydrodynamic forces and torques exerted on the particle attached to a surface. Progress was also made in the experimental study of glass fiber transport and deposition in the aerosol wind tunnel.

  14. Polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey,Thomas M. (Los Alamos, NM); Burrell,Anthony K. (Los Alamos, NM); Jia,Quanxi (Los Alamos, NM); Lin,Yuan (Chandler, AZ)

    2012-02-28

    A polymer assisted deposition process for deposition of metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be conformal on a variety of substrates including non-planar substrates. In some instances, the films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  15. Ruthenium / aerogel nanocomposits via Atomic Layer Deposition

    SciTech Connect (OSTI)

    Biener, J; Baumann, T F; Wang, Y; Nelson, E J; Kucheyev, S O; Hamza, A V; Kemell, M; Ritala, M; Leskela, M

    2006-08-28

    We present a general approach to prepare metal/aerogel nanocomposites via template directed atomic layer deposition (ALD). In particular, we used a Ru ALD process consisting of alternating exposures to bis(cyclopentadienyl)ruthenium (RuCp{sub 2}) and air at 350 C to deposit metallic Ru nanoparticles on the internal surfaces of carbon and silica aerogels. The process does not affect the morphology of the aerogel template and offers excellent control over metal loading by simply adjusting the number of ALD cycles. We also discuss the limitations of our ALD approach, and suggest ways to overcome these.

  16. Applying for a Training Contract

    E-Print Network [OSTI]

    , usual deadline is July 31, 2013 for entry in September 2015. Students should apply in the 2nd year aimed at 2nd year LLB students & final year non-law students. Competition for these places is often more will successfully complete the Legal Practice Course each year. From the point of view of the student, there can

  17. Applied Sustainability Political Science 319

    E-Print Network [OSTI]

    Young, Paul Thomas

    1 Applied Sustainability Political Science 319 College of Charleston Spring 2013 Day/Time: TH 1 Address: fisherb@cofc.edu Office: 284 King Street, #206 (Office of Sustainability) Office Hours: by appt sustainability. It will focus on the development of semester-long sustainability projects, from conception

  18. Journal of Applied Ecology 2006

    E-Print Network [OSTI]

    Thomas, Len

    Journal of Applied Ecology 2006 43, 377­384 © 2006 The Authors. Journal compilation © 2006 British Ecological Society Blackwell Publishing Ltd METHODOLOGICAL INSIGHTS Point transect sampling with traps, Etive House, Beechwood Park, Inverness IV2 3BW, UK Summary 1. The ability to monitor abundance of animal

  19. Applying the Continuous Monitoring Technical

    E-Print Network [OSTI]

    by providing technical leadership for the nation's measurement and standards infrastructure. ITL develops tests of technical, physical, administrative, and management standards and guidelines for the cost-effective securityApplying the Continuous Monitoring Technical Reference Model to the Asset, Configuration

  20. temperature heat pumps applied to

    E-Print Network [OSTI]

    Oak Ridge National Laboratory

    Very high- temperature heat pumps applied to energy efficiency in industry Application of industrial heat pumps June 21 th 2012 J-L Peureux, E. Sapora, D. Bobelin EDF R&D #12;Achema 2012 Frankfurt There are thermal requirements in the industrial plant Treq Heat exchanger = Cons ~ 0 CO2 ~ -100% Treq

  1. Numerical modeling of mixed sediment resuspension, transport, and deposition during the March 1998 episodic events in southern Lake

    E-Print Network [OSTI]

    Stroud, Jonathan

    Numerical modeling of mixed sediment resuspension, transport, and deposition during the March 1998 2006; published 17 February 2007. [1] A two-dimensional sediment transport model capable of simulating sediment resuspension of mixed (cohesive plus noncohesive) sediment is developed and applied

  2. Rare Earth Element Mines, Deposits, and Occurrences

    E-Print Network [OSTI]

    Torgersen, Christian

    Rare Earth Element Mines, Deposits, and Occurrences by Greta J. Orris1 and Richard I. Grauch2 Open Table 1. Rare earth mineral codes and associated mineral names.......................................................................................6 Table 2. Non-rare earth mineral codes and associated mineral names

  3. Electron and Photon Energy Deposition in Universe

    E-Print Network [OSTI]

    Toru Kanzaki; Masahiro Kawasaki

    2008-05-26

    We consider energy deposition of high energy electrons and photons in universe. We carry out detailed calculations of fractions of the initial energy of the injected electron or photon which are used to heat, ionize and excite background plasma in the early universe for various ionization states and redshifts.

  4. High Gradient Accelerator Cavities Using Atomic Layer Deposition

    SciTech Connect (OSTI)

    Ives, Robert Lawrence; Parsons, Gregory; Williams, Philip; Oldham, Christopher; Mundy, Zach; Dolgashev, Valery

    2014-12-09

    In the Phase I program, Calabazas Creek Research, Inc. (CCR), in collaboration with North Carolina State University (NCSU), fabricated copper accelerator cavities and used Atomic Layer Deposition (ALD) to apply thin metal coatings of tungsten and platinum. It was hypothesized that a tungsten coating would provide a robust surface more resistant to arcing and arc damage. The platinum coating was predicted to reduce processing time by inhibiting oxides that form on copper surfaces soon after machining. Two sets of cavity parts were fabricated. One was coated with 35 nm of tungsten, and the other with approximately 10 nm of platinum. Only the platinum cavity parts could be high power tested during the Phase I program due to schedule and funding constraints. The platinum coated cavity exhibit poor performance when compared with pure copper cavities. Not only did arcing occur at lower power levels, but the processing time was actually longer. There were several issues that contributed to the poor performance. First, machining of the base copper cavity parts failed to achieve the quality and cleanliness standards specified to SLAC National Accelerator Center. Secondly, the ALD facilities were not configured to provide the high levels of cleanliness required. Finally, the nanometer coating applied was likely far too thin to provide the performance required. The coating was ablated or peeled from the surface in regions of high fields. It was concluded that the current ALD process could not provide improved performance over cavities produced at national laboratories using dedicated facilities.

  5. Method for depositing layers of high quality semiconductor material

    DOE Patents [OSTI]

    Guha, Subhendu (Troy, MI); Yang, Chi C. (Troy, MI)

    2001-08-14

    Plasma deposition of substantially amorphous semiconductor materials is carried out under a set of deposition parameters which are selected so that the process operates near the amorphous/microcrystalline threshold. This threshold varies as a function of the thickness of the depositing semiconductor layer; and, deposition parameters, such as diluent gas concentrations, must be adjusted as a function of layer thickness. Also, this threshold varies as a function of the composition of the depositing layer, and in those instances where the layer composition is profiled throughout its thickness, deposition parameters must be adjusted accordingly so as to maintain the amorphous/microcrystalline threshold.

  6. Plasma-based ion implantation and deposition: A review of physics,technology, and applications

    SciTech Connect (OSTI)

    Pelletier, Jacques; Anders, Andre

    2005-05-16

    After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used of PBII&D to produce surgical implants, bio- and blood-compatible surfaces and coatings, etc. With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures. We use the acronym PBII&D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.

  7. A Multiscale Simulator for Low Pressure Chemical Vapor Deposition

    E-Print Network [OSTI]

    A Multiscale Simulator for Low Pressure Chemical Vapor Deposition Matthias K. Gobbert Institute-6206 ABSTRACT An integrated simulator for chemical vapor deposition is introduced. In addition to a reactor

  8. Computational Fluid Dynamics Study of Aerosol Transport and Deposition Mechanisms 

    E-Print Network [OSTI]

    Tang, Yingjie

    2012-07-16

    regional particle deposition occurred due to inertial separation. At higher free wind speeds gravity had less effect on particle deposition. An empirical equation for efficiency prediction was developed considering inertial and gravitational effects, which...

  9. Geology of the Florida Canyon gold deposit, Pershing County,...

    Open Energy Info (EERE)

    Geology of the Florida Canyon gold deposit, Pershing County, Nevada, in: Gold and Silver Deposits of Western Nevada Jump to: navigation, search OpenEI Reference LibraryAdd to...

  10. Aeolian depositional landforms of the south eastern Mojave Desert, California 

    E-Print Network [OSTI]

    Alvis, William Thomas

    2000-01-01

    Remote sensing and photo interpretation techniques are used to describe and map aeolian deposits found along two sediment transport corridors in the south eastern Mojave Desert. The first pathway and associated sand deposits extend eastward from...

  11. Constitutive modeling of fused deposition modeling acrylonitrile butadiene styrene (ABS) 

    E-Print Network [OSTI]

    Mamadapur, Monish Shivappa

    2009-05-15

    Fused deposition modeling is a rapid prototyping process that is widely used to create prototypes. Acrylonitrile butadiene styrene is the most widely used material for fused deposition modeling. The parts are fabricated ...

  12. Mineral Deposit Research Unit The University of British Columbia

    E-Print Network [OSTI]

    Michelson, David G.

    1 Mineral Deposit Research Unit The University of British Columbia Earth Sciences Building metallogenic constraints on mineralization in poorly understood or exposed portions of Yukon and Alaska. The mineral deposit studies, models, and metallogenic frameworks developed in this project

  13. All graphene electromechanical switch fabricated by chemical vapor deposition

    E-Print Network [OSTI]

    Milaninia, Kaveh M.

    We demonstrate an electromechanical switch comprising two polycrystalline graphene films; each deposited using ambient pressure chemical vapor deposition. The top film is pulled into electrical contact with the bottom film ...

  14. Numerical simulation of a single wafer atomic layer deposition process

    E-Print Network [OSTI]

    Jones, A. Andrew D., III (Akhenaton-Andrew Dhafir)

    2010-01-01

    Atomic Layer Deposition (ALD) is a process used to deposit nanometer scale films for use in nano electronics. A typical experimental reactor consist of a warm wall horizontal flow tube, a single disc mounted halfway down ...

  15. Geochemical and sedimentological investigations of Youngest Toba Tuff ashfall deposits

    E-Print Network [OSTI]

    Gatti, Emma

    2013-03-12

    sedimentological structures and geometry ...................................................... 90 5.5 Discussion .......................................................................................................................... 91 5.5.1 The local... ..................................................... 97 5.6 Conclusion ......................................................................................................................... 97 CHAPTER 6. DEPOSITIONAL PROCESSES AND SEDIMENTOLOGY OF YTT DEPOSITS IN THE LENGGONG VALLEY, MALAYSIA...

  16. Applied Mathematics Conferences and Workshops | U.S. DOE Office...

    Office of Science (SC) Website

    Applied Mathematics Applied Mathematics Conferences And Workshops Advanced Scientific Computing Research (ASCR) ASCR Home About Research Applied Mathematics Applied Mathematics...

  17. Filtered cathodic arc deposition apparatus and method

    DOE Patents [OSTI]

    Krauss, Alan R. (24461 W. Blvd. De John, Naperville, IL 60564)

    1999-01-01

    A filtered cathodic arc deposition method and apparatus for the production of highly dense, wear resistant coatings which are free from macro particles. The filtered cathodic arc deposition apparatus includes a cross shaped vacuum chamber which houses a cathode target having an evaporable surface comprised of the coating material, means for generating a stream of plasma, means for generating a transverse magnetic field, and a macro particle deflector. The transverse magnetic field bends the generated stream of plasma in the direction of a substrate. Macro particles are effectively filtered from the stream of plasma by traveling, unaffected by the transverse magnetic field, along the initial path of the plasma stream to a macro particle deflector. The macro particle deflector has a preformed surface which deflects macro particles away from the substrate.

  18. Methods for patterned deposition on a substrate

    DOE Patents [OSTI]

    Rye, Robert R. (Albuquerque, NM); Ricco, Antonio J. (Albuquerque, NM); Hampden-Smith, M. J. (Albuquerque, NM); Kodas, T. T. (Albuquerque, NM)

    1995-01-01

    A method is described for patterned depositions of a material onto a substrate. A surface of a polymeric substrate is first etched so as to form an etched layer having enhanced adhesions characteristics and then selected portions of the etched layer are removed so as to define a pattern having enhanced and diminished adhesion characteristics for the deposition of a conductor onto the remaining etched layer. In one embodiment, a surface of a PTFE substrate is chemically etched so as to improve the adhesion of copper thereto. Thereafter, selected portions of the etched surface are irradiated with a laser beam so as to remove the etched selected portions of the etched surface and form patterns of enhanced and diminished adhesion of copper thereto.

  19. Methods for patterned deposition on a substrate

    DOE Patents [OSTI]

    Rye, R.R.; Ricco, A.J.; Hampden-Smith, M.J.; Kodas, T.T.

    1995-01-10

    A method is described for patterned depositions of a material onto a substrate. A surface of a polymeric substrate is first etched so as to form an etched layer having enhanced adhesions characteristics and then selected portions of the etched layer are removed so as to define a pattern having enhanced and diminished adhesion characteristics for the deposition of a conductor onto the remaining etched layer. In one embodiment, a surface of a PTFE substrate is chemically etched so as to improve the adhesion of copper thereto. Thereafter, selected portions of the etched surface are irradiated with a laser beam so as to remove the etched selected portions of the etched surface and form patterns of enhanced and diminished adhesion of copper thereto. 5 figures.

  20. Compositional characterization of atomic layer deposited alumina

    SciTech Connect (OSTI)

    Philip, Anu; Thomas, Subin; Kumar, K. Rajeev [Department of Instrumentation, Cochin University of Science and Technology, Cochin-22, Kerala (India)

    2014-01-28

    As the microelectronic industry demands feature size in the order of few and sub nanometer regime, the film composition and other film properties become critical issues and ALD has emerged as the choice of industry. Aluminum oxide is a material with wide applications in electronic and optoelectronic devices and protective and ion barrier layers. Al{sub 2}O{sub 3} is an excellent dielectric because of its large band gap (8.7eV), large band offsets with silicon. We have deposited thin layers of alumina on silicon wafer (p-type) for gate dielectric applications by ALD technique and compositional characterizations of the deposited thin films were done using EDS, XPS and FTIR spectra.

  1. Surface acoustic wave dust deposition monitor

    DOE Patents [OSTI]

    Fasching, G.E.; Smith, N.S. Jr.

    1988-02-12

    A system is disclosed for using the attenuation of surface acoustic waves to monitor real time dust deposition rates on surfaces. The system includes a signal generator, a tone-burst generator/amplifier connected to a transmitting transducer for converting electrical signals into acoustic waves. These waves are transmitted through a path defining means adjacent to a layer of dust and then, in turn, transmitted to a receiving transducer for changing the attenuated acoustic wave to electrical signals. The signals representing the attenuated acoustic waves may be amplified and used in a means for analyzing the output signals to produce an output indicative of the dust deposition rates and/or values of dust in the layer. 8 figs.

  2. Substrate heater for thin film deposition

    DOE Patents [OSTI]

    Foltyn, Steve R. (111 Beryl St., Los Alamos, NM 87544)

    1996-01-01

    A substrate heater for thin film deposition of metallic oxides upon a target substrate configured as a disk including means for supporting in a predetermined location a target substrate configured as a disk, means for rotating the target substrate within the support means, means for heating the target substrate within the support means, the heating means about the support means and including a pair of heating elements with one heater element situated on each side of the predetermined location for the target substrate, with one heater element defining an opening through which desired coating material can enter for thin film deposition and with the heating means including an opening slot through which the target substrate can be entered into the support means, and, optionally a means for thermal shielding of the heating means from surrounding environment is disclosed.

  3. Ultrashort pulse laser deposition of thin films

    DOE Patents [OSTI]

    Perry, Michael D. (Livermore, CA); Banks, Paul S. (Livermore, CA); Stuart, Brent C. (Fremont, CA)

    2002-01-01

    Short pulse PLD is a viable technique of producing high quality films with properties very close to that of crystalline diamond. The plasma generated using femtosecond lasers is composed of single atom ions with no clusters producing films with high Sp.sup.3 /Sp.sup.2 ratios. Using a high average power femtosecond laser system, the present invention dramatically increases deposition rates to up to 25 .mu.m/hr (which exceeds many CVD processes) while growing particulate-free films. In the present invention, deposition rates is a function of laser wavelength, laser fluence, laser spot size, and target/substrate separation. The relevant laser parameters are shown to ensure particulate-free growth, and characterizations of the films grown are made using several diagnostic techniques including electron energy loss spectroscopy (EELS) and Raman spectroscopy.

  4. Micro Chemical Vapor Deposition for the Synthesis of Nanomaterials

    E-Print Network [OSTI]

    Zhou, Qin

    2011-01-01

    Deposition," Journal of MicroElectroMechanical Systems, vol.Chair MEMS (Microelectromechanical Systems) technologiesby MEMS (Microelectromechanical Systems) technologies many

  5. Formation of amorphous metal alloys by chemical vapor deposition

    DOE Patents [OSTI]

    Mullendore, A.W.

    1988-03-18

    Amorphous alloys are deposited by a process of thermal dissociation of mixtures of organometallic compounds and metalloid hydrides,e.g., transition metal carbonyl, such as nickel carbonyl and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit. 1 fig.

  6. Formation of amorphous metal alloys by chemical vapor deposition

    DOE Patents [OSTI]

    Mullendore, Arthur W. (Sandia Park, NM)

    1990-01-01

    Amorphous alloys are deposited by a process of thermal dissociation of mixtures or organometallic compounds and metalloid hydrides, e.g., transition metal carbonyl such as nickel carbonyl, and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit.

  7. International combustion engines; Applied thermosciences

    SciTech Connect (OSTI)

    Ferguson, C.R.

    1985-01-01

    Focusing on thermodynamic analysis - from the requisite first law to more sophisticated applications - and engine design, this book is an introduction to internal combustion engines and their mechanics. It covers the many types of internal combustion engines, including spark ignition, compression ignition, and stratified charge engines, and examines processes, keeping equations of state simple by assuming constant specific heats. Equations are limited to heat engines and later applied to combustion engines. Topics include realistic equations of state, stroichiometry, predictions of chemical equilibrium, engine performance criteria, and friction, which is discussed in terms of the hydrodynamic theory of lubrication and experimental methods such as dimensional analysis.

  8. ORISE: Applied health physics projects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home Room NewsInformationJesseworkSURVEY UNIVERSE The 2014 surveyNuclearHow toContactUndergraduateApplied

  9. Sandia Energy - Applied Turbulent Combustion

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Homesum_a_epg0_fpd_mmcf_m.xls" ,"Available from WebQuantity ofkandz-cm11 Outreach Home RoomPreservation of Fe(II) byMultidayAlumni >ScientificApplied Turbulent Combustion Home

  10. Stationary phase deposition based on onium salts

    DOE Patents [OSTI]

    Wheeler, David R. (Albuquerque, NM); Lewis, Patrick R. (Albuquerque, NM); Dirk, Shawn M. (Albuquerque, NM); Trudell, Daniel E. (Albuquerque, NM)

    2008-01-01

    Onium salt chemistry can be used to deposit very uniform thickness stationary phases on the wall of a gas chromatography column. In particular, the stationary phase can be bonded to non-silicon based columns, especially microfabricated metal columns. Non-silicon microfabricated columns may be manufactured and processed at a fraction of the cost of silicon-based columns. In addition, the method can be used to phase-coat conventional capillary columns or silicon-based microfabricated columns.

  11. Nanotube array controlled carbon plasma deposition

    SciTech Connect (OSTI)

    Qian, Shi; Cao, Huiliang; Liu, Xuanyong; Ding, Chuanxian

    2013-06-17

    Finding approaches to control the elementary processes of plasma-solid interactions and direct the fluxes of matter at nano-scales becomes an important aspect in science. This letter reports that, by taking advantages of the spacing characteristics of discrete TiO{sub 2} nanotube arrays, the flying trajectories and the subsequent implantation and deposition manner of energetic carbon ions can be directed and controlled to fabricate hollow conical arrays. The study provides an alternative method for plasma nano-manufacturing.

  12. Electrostatic force assisted deposition of graphene

    DOE Patents [OSTI]

    Liang, Xiaogan (Berkeley, CA)

    2011-11-15

    An embodiment of a method of depositing graphene includes bringing a stamp into contact with a substrate over a contact area. The stamp has at least a few layers of the graphene covering the contact area. An electric field is developed over the contact area. The stamp is removed from the vicinity of the substrate which leaves at least a layer of the graphene substantially covering the contact area.

  13. Apparatus and method for photochemical vapor deposition

    DOE Patents [OSTI]

    Jackson, Scott C. (Wilmington, DE); Rocheleau, Richard E. (Wilmington, DE)

    1987-03-31

    A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.

  14. Hydrothermally Deposited Rock | Open Energy Information

    Open Energy Info (EERE)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page on Google Bookmark EERE: Alternative Fuels Data Center Home Page on QA:QAsource History View NewTexas: Energy Resources JumpNewTexas:Hydrothermally Deposited Rock Jump to: navigation,

  15. Ash & Pulverized Coal Deposition in Combustors & Gasifiers

    SciTech Connect (OSTI)

    Goodarz Ahmadi

    1998-12-02

    Further progress in achieving the objectives of the project was made in the period of October I to December 31, 1997. The direct numerical simulation of particle removal process in turbulent gas flows was continued. Variations of vorticity contours which are averaged over a short time duration are studied. It is shown that the near wall vortices profoundly affect the particle removal process in turbulent boundary layer flows. The sublayer model for evaluating the particle deposition in turbulent flows was extended to include the effect of particle rebound. A new more advance flow model for the near wall vortices is also used in these analysis. Sample particle trajectories are obtained and discussed. Experimental data for transport and deposition of fibrous particles in the aerosol wind tunnel was obtained. The measured deposition velocity is compared with the empirical correlation and the available data and discussed. Particle resuspension process in turbulent flows are studied. The model is compared with the experimental data. It is shown that when the effects of the near wall flow structure, as well as the surface roughness are included the model agrees with the available experimental data.

  16. Ash & Pulverized Coal Deposition in Combustors & Gasifiers

    SciTech Connect (OSTI)

    Goodarz Ahmadi

    1998-12-02

    Further progress in achieving the objectives of the project was made in the period of July 1 to September 30, 1997. The direct numerical simulation of particle removal process in turbulent gas flows was continued. Variations of vorticity contours which are averaged over a short time duration are studied. It is shown that the near wall vortices profoundly affect the particle removal process in turbulent boundary layer flows. The sublayer model for evaluating the particle deposition in turbulent flows was extended to include the effect of particle rebound. A new more advance flow model for the near wall vortices is also used in these analysis. Sample particle trajectories are obtained and discussed. Experimental data for transport and deposition of fibrous particles in the aerosol wind tunnel was obtained. The measured deposition velocity is compared with the empirical correlation and the available data and discussed. Particle resuspension process in turbulent flows are studied. The model is compared with the experimental data. It is shown that when the effects of the near wall flow structure, as well as the surface roughness are included the model agrees with the available experimental data.

  17. Revised July 2014 Library Declaration and Deposit Agreement

    E-Print Network [OSTI]

    Siksek, Samir

    Revised July 2014 Library Declaration and Deposit Agreement 1. STUDENT DETAILS Please complete submitted for a Master's degree by Research (MA, MSc, LLM, MS or MMedSci) are not being deposited in WRAP are depositing a thesis for a Master's degree by Research, the options below only relate to the hard copy thesis

  18. RISO-M-2438 Dry deposition and resuspension of

    E-Print Network [OSTI]

    CO RISO-M-2438 2 S Dry deposition and resuspension of particulate matter in city environments N 1984 få #12;RISØ-M-2438 DRY DEPOSITION AND RESUSPENSION OF PARITUCLATE NATTER IN CITY ENVIRONMENTS N.O. Jensen Abstract. The report describes, mostly in qualitative terms, the deposition and resuspension

  19. Stratigraphy of the PB-1 well, Nopal I uranium deposit, Sierra Pena Blanca, Chihuahua, Mexico

    E-Print Network [OSTI]

    Dobson, P.

    2009-01-01

    of the Nopal I uranium deposit, Mexico: Proceedings, 2006of the Nopal I uranium deposit (Sierra Peña Blanca, Mexico),Chihuahua, Mexico, in Uranium Deposits in Volcanic Rocks,

  20. Surface Preparation of Gallium Nitride for Atomic Layer Deposition of Aluminum Oxide /

    E-Print Network [OSTI]

    Kerr, Amanda J.

    2014-01-01

    Nitride for Atomic Layer Deposition of Aluminum Oxide AForce Microscopy Atomic Layer Deposition Capacitance-VoltageSurfaces for Atomic Layer Deposition of Aluminum Oxide” x

  1. Selective Chemistry of Metal Oxide Atomic Layer Deposition on Si Based Substrate Surfaces

    E-Print Network [OSTI]

    Guo, Lei

    2015-01-01

    Kolanek, K. , et al. , Atomic layer deposition reactor forconcepts for atomic layer deposition on agitated particles:W.M.M. Kessels, Atomic layer deposition for photovoltaics:

  2. Surface Reactivity of Copper Precursors for Atomic Layer Deposition (ALD) on Metal Surfaces

    E-Print Network [OSTI]

    MA, QIANG

    2010-01-01

    1 1.2. Atomic layer deposition………………………………………………..…. …2cell for atomic layer deposition……………………………26 2.8.Scheme process of atomic layer deposition (ALD) of copper(

  3. Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

    SciTech Connect (OSTI)

    Park, Taeyong; Lee, Jaesang; Park, Jingyu; Jeon, Heeyoung; Jeon, Hyeongtag; Lee, Ki-Hoon; Cho, Byung-Chul; Kim, Moo-Sung; Ahn, Heui-Bok

    2012-01-15

    Ruthenium thin films were deposited on argon plasma-treated SiO{sub 2} and untreated SiO{sub 2} substrates by remote plasma atomic layer deposition using bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp){sub 2}] as a Ru precursor and ammonia plasma as a reactant. The results of in situ Auger electron spectroscopy (AES) analysis indicate that the initial transient region of Ru deposition was decreased by Ar plasma treatment at 400 deg. C, but did not change significantly at 300 deg. C The deposition rate exhibited linearity after continuous film formation and the deposition rates were about 1.7 A/cycle and 0.4 A/cycle at 400 deg. C and 300 deg. C, respectively. Changes of surface energy and polar and dispersive components were measured by the sessile drop test. The quantity of surface amine groups was measured from the surface nitrogen concentration with AES. Furthermore, the Ar plasma-treated SiO{sub 2} contained more amine groups and less hydroxyl groups on the surface than on untreated SiO{sub 2}. Auger spectra exhibited chemical shifts by Ru-O bonding, and larger shifts were observed on untreated substrates due to the strong adhesion of Ru films.

  4. At the Intersection of Applied Formal Methods

    E-Print Network [OSTI]

    Zimmerman, Daniel M.

    of Technology University of Washington Tacoma NTU Graduate Seminar, - 7 January 2011 #12;Outline · Applied

  5. Building Reliable Software Applied Formal Methods

    E-Print Network [OSTI]

    Zimmerman, Daniel M.

    Institute of Technology University of Washington Tacoma #12;Outline · Applied Formal Methods · Correctness

  6. Ancillary effects of selected acid deposition control policies

    SciTech Connect (OSTI)

    Moe, R.J.; Lyke, A.J.; Nesse, R.J.

    1986-08-01

    NAPAP is examining a number of potential ways to reduce the precursors (sulfur dioxide and nitrogen oxides) to acid deposition. However, the policies to reduce acid deposition will have other physical, biological and economic effects unrelated to acid deposition. For example, control policies that reduce sulfur dioxide emissions may also increase visibility. The effects of an acid deposition policy that are unrelated to acid deposition are referred to as ''ancillary'' effects. This reserch identifies and characterizes the principle physical and economic ancillary effects associated with acid deposition control and mitigation policies. In this study the ancillary benefits associated with four specific acid deposition policy options were investigated. The four policy options investigated are: (1) flue gas desulfurization, (2) coal blending or switching, (3) reductions in automobile emissions of NO/sub x/, and (4) lake liming. Potential ancillary benefits of each option were identified and characterized. Particular attention was paid to the literature on economic valuation of potential ancillary effects.

  7. Vapor-deposited porous films for energy conversion

    DOE Patents [OSTI]

    Jankowski, Alan F.; Hayes, Jeffrey P.; Morse, Jeffrey D.

    2005-07-05

    Metallic films are grown with a "spongelike" morphology in the as-deposited condition using planar magnetron sputtering. The morphology of the deposit is characterized by metallic continuity in three dimensions with continuous and open porosity on the submicron scale. The stabilization of the spongelike morphology is found over a limited range of the sputter deposition parameters, that is, of working gas pressure and substrate temperature. This spongelike morphology is an extension of the features as generally represented in the classic zone models of growth for physical vapor deposits. Nickel coatings were deposited with working gas pressures up 4 Pa and for substrate temperatures up to 1000 K. The morphology of the deposits is examined in plan and in cross section views with scanning electron microscopy (SEM). The parametric range of gas pressure and substrate temperature (relative to absolute melt point) under which the spongelike metal deposits are produced appear universal for other metals including gold, silver, and aluminum.

  8. DEVELOPMENT OF DEPOSIT DETECTION SYSTEM IN PIPELINES OF THE STEELWORKS USING CS-137 GAMMA-RAY

    SciTech Connect (OSTI)

    Song, Won-Joon; Lee, Seung-Hee; Jeong, Hee-Dong

    2008-02-28

    The deposit is built up in the pipeline of the steelworks by the chemical reaction among COG (coke oven gas), BFG (blast furnace gas), moisture, and steel in the high temperature environment and obstructs the smooth gas flow. In this study a gamma-ray system is developed to detect the deposit accumulated in pipelines and calculate the accumulation rate with respect to the cross section area of pipes. Cs-137 is used as the gamma-ray source and the system is designed to apply to pipes of various diameters. This system also includes the DB for storage and display of the measurement results so that it can be used for the efficient management of the pipelines.

  9. Ultra-low loading Pt nanocatalysts prepared by atomic layer deposition on carbon aerogels

    SciTech Connect (OSTI)

    King, J S; Wittstock, A; Biener, J; Kucheyev, S O; Wang, Y M; Baumann, T F; Giri, S; Hamza, A V; Baeumer, M; Bent, S F

    2008-04-21

    Using atomic layer deposition (ALD), we show that Pt nanoparticles can be deposited on the inner surfaces of carbon aerogels (CA). The resultant Pt-loaded materials exhibit high catalytic activity for the oxidation of CO even at loading levels as low as {approx}0.05 mg Pt/cm{sup 2}. We observe a conversion efficiency of nearly 100% in the temperatures range 150-250 C, and the total conversion rate seems to be only limited by the thermal stability of our CA support in ambient oxygen. Our ALD approach described here is universal in nature, and can be applied to the design of new catalytic materials for a variety of applications, including fuel cells, hydrogen storage, pollution control, green chemistry, and liquid fuel production.

  10. Apparatus and method for pulsed laser deposition of materials on wires and pipes

    DOE Patents [OSTI]

    Fernandez, Felix E. (Mayaguez, PR)

    2003-01-01

    Methods and apparatuses are disclosed which allow uniform coatings to be applied by pulsed laser deposition (PLD) on inner and outer surfaces of cylindrical objects, such as rods, pipes, tubes, and wires. The use of PLD makes this technique particularly suitable for complex multicomponent materials, such as superconducting ceramics. Rigid objects of any length, i.e., pipes up to a few meters, and with diameters from less than 1 centimeter to over 10 centimeters can be coated using this technique. Further, deposition is effected simultaneously onto an annular region of the pipe wall. This particular arrangement simplifies the apparatus, reduces film uniformity control difficulties, and can result in faster operation cycles. In addition, flexible wires of any length can be continuously coated using the disclosed invention.

  11. Atomic layer deposited zinc tin oxide channel for amorphous oxide thin film transistors

    E-Print Network [OSTI]

    methods, such as pulsed laser deposition,10 solution deposition,11 inkjet printing12 and combustion13 have

  12. Electrochemically deposited BiTe-based nanowires for thermoelectric applications

    SciTech Connect (OSTI)

    Ng, Inn-Khuan; Kok, Kuan-Ying; Rahman, Che Zuraini Che Ab; Saidin, Nur Ubaidah; Ilias, Suhaila Hani; Choo, Thye-Foo [Malaysian Nuclear Agency, Bangi, 43000 Kajang, Selangor Darul Ehsan (Malaysia)

    2014-02-12

    Nanostructured materials systems such as thin-films and nanowires (NWs) are promising for thermoelectric power generation and refrigeration compared to traditional counterparts in bulk, due to their enhanced thermoelectric figures-of-merit. BiTe and its derivative compounds, in particular, are well-known for their near-room temperature thermoelectric performance. In this work, both the binary and ternary BiTe-based nanowires namely, BiTe and BiSbTe, were synthesized using template-assisted electrodeposition. Diameters of the nanowires were controlled by the pore sizes of the anodised alumina (AAO) templates used. Systematic study on the compositional change as a function of applied potential was carried out via Linear Sweep Voltanmetry (LSV). Chemical compositions of the nanowires were studied using Energy Dispersive X-ray Spectrometry (EDXS) and their microstructures evaluated using diffraction and imaging techniques. Results from chemical analysis on the nanowires indicated that while the Sb content in BiSbTe nanowires increased with more negative deposition potentials, the formation of Te{sup 0} and Bi{sub 2}Te{sub 3} were favorable at more positive potentials.

  13. CX-007571: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Pulaski County - Wastewater CX(s) Applied: B5.1 Date: 12/29/2011 Location(s): Missouri Offices(s): Golden Field Office

  14. CX-007596: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Ohio Advanced Transportation Partnership CX(s) Applied: B5.23 Date: 01/25/2012 Location(s): Ohio Offices(s): National Energy Technology Laboratory

  15. CX-012729: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Hydrogen Sulfide Scavenger BOA (Multiple) CX(s) Applied: B5.2Date: 41880 Location(s): LouisianaOffices(s): Strategic Petroleum Reserve Field Office

  16. CX-008588: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    St. Petersburg Solar Pilot Project CX(s) Applied: B5.1 Date: 07/19/2012 Location(s): Florida Offices(s): Golden Field Office

  17. CX-008684: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Metaline Radio Station Upgrade Project CX(s) Applied: B1.19 Date: 07/11/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  18. CX-010148: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Merritt Radio Station Upgrade CX(s) Applied: B1.19 Date: 04/18/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  19. CX-008706: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Tunk Mountain Radio Station Upgrade CX(s) Applied: B1.19 Date: 05/30/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  20. CX-012716: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    General Scientific Infrastructure Support for University of Wisconsin CX(s) Applied: B1.31Date: 41844 Location(s): WisconsinOffices(s): Nuclear Energy

  1. CX-008543: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Colorado State Energy Plan 2012 CX(s) Applied: A9, A11 Date: 06/25/2012 Location(s): Colorado Offices(s): Golden Field Office

  2. CX-012333: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Support Buildings CX(s) Applied: B1.15 Date: 06/03/2014 Location(s): Washington Offices(s): River Protection-Richland Operations Office

  3. CX-011165: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Heavy Mineral Separation CX(s) Applied: B3.6 Date: 08/07/2013 Location(s): South Carolina Offices(s): Savannah River Operations Office

  4. CX-012817: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Bell Maintenance Headquarters Access Road Maintenance CX(s) Applied: B1.3Date: 41890 Location(s): WashingtonOffices(s): Bonneville Power Administration

  5. CX-006225: Categorical Exclusion Determination | Department of...

    Broader source: Energy.gov (indexed) [DOE]

    Infrastructure Upgrades - Materials and Fuel Complex (MFC)- Irradiated Materials Characterization Laboratory (IMCL) CX(s) Applied: B3.6 Date: 06072011 Location(s): Idaho Falls,...

  6. CX-010791: Categorical Exclusion Determination | Department of...

    Energy Savers [EERE]

    Exclusion Determination Gulf of Mexico Miocene Carbon Dioxide (CO2) Site Characterization Mega Transect CX(s) Applied: A9, A11 Date: 08142013 Location(s): Texas...

  7. Categorical Exclusion Determinations: Science | Department of...

    Broader source: Energy.gov (indexed) [DOE]

    Determination Establishment of an Easement for Enhanced Electrical Service to the Computational Sciences Facility CX(s) Applied: B1.7 Date: 08302011 Location(s):...

  8. CX-011634: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Closure Turf Installation CX(s) Applied: B6.1 Date: 08/27/2013 Location(s): Texas Offices(s): Pantex Site Office

  9. CX-008993: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    CX-008993: Categorical Exclusion Determination "Continuous Processing of High Thermal Conductivity Polyethylene Fibers and Sheets CX(s) Applied: A9, B3.6 Date: 0822...

  10. CX-012776: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Catalyst Processing, KCP14-05 CX(s) Applied: NOT NOTEDDate: 41857 Location(s): MissouriOffices(s): Kansas City Site Office

  11. CX-008146: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Advanced Formation Evaluator Tools (Haliburton) CX(s) Applied: B3.7 Date: 09/11/2011 Location(s): Wyoming Offices(s): RMOTC

  12. CX-004095: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination CX-004095: Categorical Exclusion Determination Thermal Transport Properties of Nanostructured Materials for Energy Conversion CX(s) Applied: B3.6 Date: 09...

  13. CX-008144: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Planned Repair of Flow Lines CX(s) Applied: B5.4 Date: 08/09/2011 Location(s): Wyoming Offices(s): RMOTC

  14. CX-003164: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Categorical Exclusion Determination CX-003164: Categorical Exclusion Determination Optimization of Biomass Production Across a Landscape CX(s) Applied: A9 Date: 07262010...

  15. CX-012730: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Replace West Hackberry Radio Tower CX(s) Applied: B1.19Date: 41880 Location(s): LouisianaOffices(s): Strategic Petroleum Reserve Field Office

  16. CX-011069: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Induction Furnace Melting CX(s) Applied: B3.6 Date: 08/29/2013 Location(s): Oregon Offices(s): National Energy Technology Laboratory

  17. CX-010057: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Eugene Substation Protective Relay Installation CX(s) Applied: B1.7 Date: 01/29/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  18. CX-011214: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sensitive Instrument Facility CX(s) Applied: B3.6 Date: 07/10/2013 Location(s): Iowa Offices(s): Ames Site Office

  19. CX-012795: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    North Bonneville Substation 23- Kilovolt Line Retermination CX(s) Applied: B4.11Date: 41926 Location(s): WashingtonOffices(s): Bonneville Power Administration

  20. CX-010618: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Midwest Region Alternative Fuels Project CX(s) Applied: 0 Date: 07/19/2013 Location(s): Missouri Offices(s): National Energy Technology Laboratory

  1. CX-012789: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Building 440 CNM Clean Room Expansion CX(s) Applied: B3.15Date: 41906 Location(s): IllinoisOffices(s): Argonne Site Office

  2. CX-008438: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Biogas Reconditioning Project CX(s) Applied: B5.1 Date: 06/27/2012 Location(s): Nevada Offices(s): National Energy Technology Laboratory

  3. CX-008282: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Biogas Reconditioning Project CX(s) Applied: B5.1 Date: 05/01/2012 Location(s): Nevada Offices(s): National Energy Technology Laboratory

  4. Categorical Exclusion Determinations: Western Area PowerAdministratio...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Center October 26, 2009 CX-005544: Categorical Exclusion Determination Power Rate Formula for the Provo River Project of the Western Area Power Administration CX(s) Applied:...

  5. CX-012311: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Accelerator Test Facility II CX(s) Applied: B3.10 Date: 05/28/2014 Location(s): New York Offices(s): Brookhaven Site Office

  6. CX-008799: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Jack Case Showers Projects CX(s) Applied: B1.3 Date: 06/04/2012 Location(s): Tennessee Offices(s): Y-12 Site Office

  7. CX-010763: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    CX-010763: Categorical Exclusion Determination Nevada Desert Research Institute- Photovoltaic Installation CX(s) Applied: B5.16 Date: 07172013 Location(s): Nevada Offices(s):...

  8. CX-012254: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Hydro Research Foundation University Research Awards - Vanderbilt CX(s) Applied: A9 Date: 05/28/2014 Location(s): Tennessee Offices(s): Golden Field Office

  9. CX-012253: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Hydro Research Foundation University Research Awards - OSU CX(s) Applied: A9 Date: 05/27/2014 Location(s): Oregon Offices(s): Golden Field Office

  10. CX-004351: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    4351: Categorical Exclusion Determination CX-004351: Categorical Exclusion Determination Center for Development of Math, Science and Technology CX(s) Applied: B1.15 Date: 1029...

  11. CX-003959: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    59: Categorical Exclusion Determination CX-003959: Categorical Exclusion Determination Federal Bureau of Investigation Radiological Dispersion Device Training CX(s) Applied: B1.2...

  12. CX-010689: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Generic CX Determination for Financial Assistance Awards CX(s) Applied: Unknown Date: 07/17/2013 Location(s): Illinois Offices(s): Chicago Office

  13. CX-005987: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    87: Categorical Exclusion Determination CX-005987: Categorical Exclusion Determination Stion Corporation - Superstrate Device for High Efficiency Tandem Modules CX(s) Applied: A9,...

  14. Categorical Exclusion (CX) Determinations By Date | Department...

    Office of Environmental Management (EM)

    (CX) Determinations By Date Categorical Exclusion (CX) Determinations By Date August 25, 2015 CX-012469: Categorical Exclusion Determination Gas Analysis Services CX(s) Applied:...

  15. CX-100022: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    CX-100022: Categorical Exclusion Determination CX-100022: Categorical Exclusion Determination EERE Demonstration for Advanced Retro-Commissioning Technology CX(s) Applied: A9,...

  16. CX-001378: Categorical Exclusion Determination | Department of...

    Office of Environmental Management (EM)

    378: Categorical Exclusion Determination CX-001378: Categorical Exclusion Determination Wackenhut Services, Incorporated Training Facility CX(s) Applied: B1.2 Date: 10282009...

  17. CX-012664: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    SBIR/STTR Phase 0 Outreach and Assistance Program CX(s) Applied: A8Date: 41844 Location(s): IllinoisOffices(s): Chicago Office

  18. CX-007826: Categorical Exclusion Determination | Department of...

    Energy Savers [EERE]

    007826: Categorical Exclusion Determination CX-007826: Categorical Exclusion Determination "Crittenden City Facilities Re-Roofing CX(s) Applied: B5.1 Date: 01312012 Location(s):...

  19. CX-012433: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Computer Simulation and Prototype Construction and Testing CX(s) Applied: A9Date: 41878 Location(s): GeorgiaOffices(s): National Energy Technology Laboratory

  20. CX-000310: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    0: Categorical Exclusion Determination CX-000310: Categorical Exclusion Determination New Jersey Revision 1 - Energy Efficiency Upgrades for State Buildings CX(s) Applied: A9, A11,...

  1. CX-009923: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    CX-009923: Categorical Exclusion Determination CX-009923: Categorical Exclusion Determination Project Icebreaker CX(s) Applied: A9, B3.1 Date: 01072013 Location(s): Ohio...

  2. CX-007056: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    7056: Categorical Exclusion Determination CX-007056: Categorical Exclusion Determination Interstate Electrification Improvement CX(s) Applied: B5.1 Date: 09192011 Location(s):...

  3. CX-100290 Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    0 Categorical Exclusion Determination CX-100290 Categorical Exclusion Determination Location, Location, Efficiency (Milwaukee, WI) Award Number: DE-EE0007069 CX(s) Applied: A9,...

  4. CX-003197: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    7: Categorical Exclusion Determination CX-003197: Categorical Exclusion Determination Low Cost High Concentration Photovoltaic Systems for Utility Power Generation CX(s) Applied:...

  5. CX-007370: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    370: Categorical Exclusion Determination CX-007370: Categorical Exclusion Determination Idaho-TRIBE-SHOSHONE-BANNOCK TRIBE OF THE FORT HALL RESERVATION OF IDAHO CX(s) Applied:...

  6. CX-008534: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Peter Wentz Geothermal CX(s) Applied: B5.19 Date: 05/23/2012 Location(s): Pennsylvania Offices(s): Golden Field Office

  7. CX-008204: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Finch CX(s) Applied: B5.19 Date: 03/23/2012 Location(s): Missouri Offices(s): Golden Field Office

  8. CX-008203: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Demoret CX(s) Applied: B5.19 Date: 03/23/2012 Location(s): Missouri Offices(s): Golden Field Office

  9. CX-009442: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Cutters Grove, Anoka CX(s) Applied: A9, B5.19 Date: 07/31/2012 Location(s): Minnesota Offices(s): Golden Field Office

  10. CX-007836: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Building Retrofits CX(s) Applied: B5.19 Date: 01/30/2012 Location(s): Illinois Offices(s): Energy Efficiency and Renewable Energy

  11. CX-008241: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Teter CX(s) Applied: B5.19 Date: 05/15/2012 Location(s): Missouri Offices(s): Golden Field Office

  12. CX-008205: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Weaver CX(s) Applied: B5.19 Date: 03/23/2012 Location(s): Missouri Offices(s): Golden Field Office

  13. CX-012097: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Microgrid Demonstration Project CX(s) Applied: B5.15 Date: 03/24/2014 Location(s): Idaho Offices(s): Idaho Operations Office

  14. CX-002327: Categorical Exclusion Determination | Department of...

    Office of Environmental Management (EM)

    Determination Central Facility Area and Advanced Test Reactor-Complex Analytical and Research and Development Laboratory Operation (Overarching) CX(s) Applied: B3.6 Date: 05...

  15. CX-005162: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    5162: Categorical Exclusion Determination CX-005162: Categorical Exclusion Determination Green Chemistry - CEAM Phase 3 - Working Bug LLC CX(s) Applied: B5.1 Date: 02082011...

  16. CX-008545: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Solar Energy Evolution and Diffusion Studies CX(s) Applied: A9 Date: 06/19/2012 Location(s): CX: none Offices(s): Golden Field Office

  17. CX-012200: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Determination of Excess Real Property CX(s) Applied: B1.36 Date: 05/01/2014 Location(s): Colorado Offices(s): Legacy Management

  18. CX-100081: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination CX-100081: Categorical Exclusion Determination Harnessing the Hydro-Electric Potential of Engineered Drops Award Number: DE-EE0005428 CX(s) Applied:...

  19. CX-012122: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    OCGen Module Mooring Project CX(s) Applied: B5.25 Date: 04/29/2014 Location(s): Maine Offices(s): Golden Field Office

  20. CX-006209: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Determination Missouri Independent Energy Efficiency Program: Anheuser-Busch - Brewery Energy Efficiency Retrofits CX(s) Applied: B5.1 Date: 07012011 Location(s): Saitn...

  1. CX-010109: Categorical Exclusion Determination | Department of...

    Office of Environmental Management (EM)

    09: Categorical Exclusion Determination CX-010109: Categorical Exclusion Determination Curecanti-Poncha 230 Kilovolt Transmission Line Cross Bar Ranch Project CX(s) Applied: B1.3...

  2. CX-008683: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Shaniko Radio Station Replacement Project CX(s) Applied: B1.19 Date: 07/11/2012 Location(s): Oregon Offices(s): Bonneville Power Administration

  3. CX-009698: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sale of Lakeside Radio Station CX(s) Applied: B1.24 Date: 12/27/2012 Location(s): Oregon Offices(s): Bonneville Power Administration

  4. CX-012231: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Mica Peak Radio Station upgrade CX(s) Applied: B1.19 Date: 06/09/2014 Location(s): Washington Offices(s): Bonneville Power Administration

  5. CX-011190: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Alberton Communication Site Construction CX(s) Applied: B1.19 Date: 08/26/2013 Location(s): Montana Offices(s): Bonneville Power Administration

  6. CX-010155: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Augspurger Radio Tower Replacement Project CX(s) Applied: B1.19 Date: 04/03/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  7. CX-011401: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Minto Lodge Rehabilitation CX(s) Applied: B5.1 Date: 11/19/2013 Location(s): Alaska Offices(s): Golden Field Office

  8. CX-010237: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Pittsburgh Green Innovators Synergy Center CX(s) Applied: A9 Date: 02/28/2013 Location(s): Pennsylvania Offices(s): Golden Field Office

  9. CX-008973: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Petrography Laboratory CX(s) Applied: B3.6 Date: 08/01/2012 Location(s): West Virginia Offices(s): National Energy Technology Laboratory

  10. CX-010730: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Paisley Geothermal Integration CX(s) Applied: B1.7 Date: 08/09/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  11. CX-008161: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Prosser Hatchery Backup Generator Replacement CX(s) Applied: B1.31 Date: 04/16/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  12. CX-008700: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Natapoc Property Funding CX(s) Applied: B1.25 Date: 06/12/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  13. CX-012788: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Bio-Aviation Fuel LCA with GREET CX(s) Applied: B5.15Date: 41906 Location(s): IllinoisOffices(s): Argonne Site Office

  14. CX-012718: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Idaho State University Reactor Laboratory Modernization CX(s) Applied: B1.31Date: 41844 Location(s): IdahoOffices(s): Nuclear Energy

  15. CX-012189: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Microbial Laboratory Analysis CX(s) Applied: B3.12 Date: 05/06/2014 Location(s): Illinois Offices(s): Argonne Site Office

  16. CX-012317: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    High Performance Computing Upgrades CX(s) Applied: B1.31 Date: 06/16/2014 Location(s): Idaho Offices(s): Nuclear Energy

  17. CX-012725: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Materials and Fuel Complex (MFC)-782 Fire Sprinkler Installation CX(s) Applied: B2.2Date: 41829 Location(s): IdahoOffices(s): Nuclear Energy

  18. CX-010515: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energy Efficiency Public Service Campaign CX(s) Applied: A9 Date: 06/14/2013 Location(s): New York Offices(s): Golden Field Office

  19. CX-007856: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sacramento Regional Energy Alliance CX(s) Applied: B5.23 Date: 01/27/2012 Location(s): California Offices(s): Golden Field Office

  20. CX-007858: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Southwest Solar Transformation Initiative CX(s) Applied: A9, A11 Date: 01/27/2012 Location(s): California Offices(s): Golden Field Office

  1. CX-008250: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Geotechnical Core Drilling for USGS 138 CX(s) Applied: B3.1 Date: 04/18/2012 Location(s): Idaho Offices(s): Nuclear Energy

  2. CX-012110: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Cowlitz Falls Fish Facility Access Agreement Extension CX(s) Applied: A2 Date: 04/02/2014 Location(s): Washington Offices(s): Bonneville Power Administration

  3. CX-009398: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Domestic Source Recovery CX(s) Applied: B2.6 Date: 11/01/2012 Location(s): New Mexico Offices(s): Los Alamos Site Office

  4. CX-012705: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Materials and Fuels Complex (MFC)-703 Fire Alarm Replacement CX(s) Applied: B2.2Date: 41858 Location(s): IdahoOffices(s): Nuclear Energy

  5. CX-011250: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Determination Transforming Photovoltaic Installations Toward Dispatchable, Schedulable Energy Solutions CX(s) Applied: B3.6, B5.15 Date: 10172013 Location(s): Oregon...

  6. CX-005950: Categorical Exclusion Determination | Department of...

    Energy Savers [EERE]

    Determination Wisconsin Clean Transportation Partnership: Riteway Bus Services Propane Fueling Infrastructure CX(s) Applied: B5.1 Date: 06012011 Location(s): Oak Creek,...

  7. CX-006893: Categorical Exclusion Determination | Department of...

    Energy Savers [EERE]

    Exclusion Determination Ohio Advanced Transportation PartnershipFrito Lay Columbus Propane Fueling Infrastructure CX(s) Applied: B5.1 Date: 09282011 Location(s): Columbus,...

  8. CX-008535: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    King County Biogas and Nutrient Reduction CX(s) Applied: A9 Date: 05/22/2012 Location(s): Washington Offices(s): Golden Field Office

  9. CX-011110: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Advancements in Algal Biomass Yield CX(s) Applied: A9 Date: 08/29/2013 Location(s): Hawaii Offices(s): Golden Field Office

  10. CX-010343: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Bald Hill Farms Property Funding CX(s) Applied: B1.25 Date: 05/10/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  11. CX-011630: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    9831 Wall Construction Project CX(s) Applied: B1.3 Date: 06/05/2013 Location(s): Tennessee Offices(s): Y-12 Site Office

  12. CX-012816: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Rogue-Gold Beach Access Road Improvement CX(s) Applied: B1.3Date: 41890 Location(s): OregonOffices(s): Bonneville Power Administration

  13. CX-011177: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Hebo Substation Access Road Maintenance CX(s) Applied: B1.3 Date: 09/13/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  14. CX-011184: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Salmon Creek Pond Property Funding CX(s) Applied: B1.25 Date: 08/29/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  15. CX-008698: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Poorman Ponds Property Funding CX(s) Applied: B1.25 Date: 06/12/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  16. CX-009630: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    ICP Routine Maintenance CX(s) Applied: B1.3 Date: 11/06/2012 Location(s): Idaho Offices(s): Idaho Operations Office

  17. CX-009632: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    INTEC – Suspect RH-TRU (AMWTP) CX(s) Applied: NO CX GIVEN Date: 11/23/2012 Location(s): Idaho Offices(s): Idaho Operations Office

  18. CX-012722: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Test Reactor Area (TRA)-653 Conference Room Modifications CX(s) Applied: B1.15Date: 41829 Location(s): IdahoOffices(s): Nuclear Energy

  19. CX-011564: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Excess Facilities Deactivation and Demolition CX(s) Applied: B1.23 Date: 11/05/2013 Location(s): Idaho Offices(s): Idaho Operations Office

  20. CX-009753: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Propane Corridor Development Program CX(s) Applied: B5.22 Date: 12/06/2012 Location(s): Georgia Offices(s): National Energy Technology Laboratory

  1. CX-012482: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Mid-Atlantic Regional Infrastructure Development Project CX(s) Applied: B5.22Date: 41862 Location(s): MarylandOffices(s): National Energy Technology Laboratory

  2. CX-012002: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Raver-Covington Conductor Replacement CX(s) Applied: B1.3 Date: 04/24/2014 Location(s): Washington Offices(s): Bonneville Power Administration

  3. CX-010772: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Water Security Test Bed (WSTB) CX(s) Applied: B3.6 Date: 07/17/2013 Location(s): Idaho Offices(s): Nuclear Energy

  4. CX-100159 Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Proposed Rulemaking for Energy Conservation Standards for Commercial and Industrial Pumps RIN: 1904-AC54 CX(s) Applied: B5.1

  5. CX-100160 Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Proposed Rulemaking for Energy Conservation Standards for Residential Dehumidifiers RIN: 1904-AC81 CX(s) Applied: B5.1

  6. CX-012706: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Radiochemistry Laboratory (RCL) Supply Intake Filter Housing CX(s) Applied: B2.5Date: 41858 Location(s): IdahoOffices(s): Nuclear Energy

  7. CX-009295: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energy Regional Innovation Cluster CX(s) Applied: B3.6 Date: 09/05/2012 Location(s): Pennsylvania Offices(s): National Energy Technology Laboratory

  8. CX-003226: Categorical Exclusion Determination | Department of...

    Energy Savers [EERE]

    Exclusion Determination Parris Island Wind Resource Assessment; National Renewable Energy Laboratory Tracking Number 10-032 CX(s) Applied: A9, B3.1 Date: 08042010...

  9. CX-010258: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Bangladesh Meteorological Instrumentation Installation CX(s) Applied: A9 Date: 04/26/2013 Location(s): Colorado Offices(s): Golden Field Office

  10. CX-008803: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Milling Machine Replacement Projects CX(s) Applied: B1.31 Date: 05/14/2012 Location(s): Tennessee Offices(s): Y-12 Site Office

  11. CX-002355: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Categorical Exclusion Determination CX-002355: Categorical Exclusion Determination Kansas City Power and Light (KCP&L) Green Impact Zone Smart Grid Demonstration CX(s) Applied:...

  12. CX-010113: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Compression Stress Relaxometer CX(s) Applied: B3.6 Date: 03/28/2013 Location(s): South Carolina Offices(s): Savannah River Operations Office

  13. CX-012434: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Low Cost Titanium Casting Technology CX(s) Applied: B3.6Date: 41878 Location(s): OhioOffices(s): National Energy Technology Laboratory

  14. CX-009587: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    City of Houston, Texas CX(s) Applied: B5.1 Date: 12/12/2012 Location(s): Texas Offices(s): Golden Field Office

  15. CX-010261: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Nevada State Energy Program Formula CX(s) Applied: B5.16 Date: 04/26/2013 Location(s): Nevada Offices(s): Golden Field Office

  16. CX-009635: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    INTEC – U-233 Waste Stream Disposition CX(s) Applied: NO CX GIVEN Date: 12/15/2012 Location(s): Idaho Offices(s): Idaho Operations Office

  17. CX-009019: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Determination CX-009019: Categorical Exclusion Determination "Catalyst-Assisted Manufacture of Olefins from Natural Gas Liquids: Prototype Development CX(s) Applied: A9, B3.6...

  18. CX-011625: Categorical Exclusion Determinationc

    Broader source: Energy.gov [DOE]

    9103 Second Floor Refurbishment CX(s) Applied: B1.3 Date: 06/05/2013 Location(s): Tennessee Offices(s): Y-12 Site Office

  19. CX-008609: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Vermont State Energy Program CX(s) Applied: A9, A11 Date: 07/03/2012 Location(s): Vermont Offices(s): Golden Field Office

  20. CX-012790: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Haystack Butte Radio Site Land Acquisition CX(s) Applied: B1.24Date: 41939 Location(s): WashingtonOffices(s): Bonneville Power Administration

  1. CX-004247: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination CX-004247: Categorical Exclusion Determination Carolina Blue Skies Initiative CX(s) Applied: A1, B5.1 Date: 10142010 Location(s): Indian Trail,...

  2. CX-012655: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Acquisition of Access Road Easements CX(s) Applied: B1.24Date: 41849 Location(s): WashingtonOffices(s): Bonneville Power Administration

  3. CX-012809: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    LURR 20140313 City of Vancouver Sewer Lateral CX(s) Applied: B4.9Date: 41906 Location(s): WashingtonOffices(s): Bonneville Power Administration

  4. CX-012651: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    LURR20140464 - Spencer May - Fence Construction CX(s) Applied: B4.9Date: 41858 Location(s): WashingtonOffices(s): Bonneville Power Administration

  5. CX-012632: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    LURR 20140456 - Salmon Creek Avenue Pathway Project CX(s) Applied: B4.9Date: 41885 Location(s): WashingtonOffices(s): Bonneville Power Administration

  6. CX-012808: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    LURR 20140504 Ross Substation Comcast Fiber Installation CX(s) Applied: B4.9Date: 41906 Location(s): WashingtonOffices(s): Bonneville Power Administration

  7. CX-012637: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    LURR 20140521 - David King - Sewer Line Installation CX(s) Applied: B4.9Date: 41876 Location(s): OregonOffices(s): Bonneville Power Administration

  8. CX-010398: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Power Line Configuration CX(s) Applied: B4.13 Date: 04/25/2013 Location(s): Idaho Offices(s): Idaho Operations Office

  9. CX-010091: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Power Line Configuration 2013-1 CX(s) Applied: B4.13 Date: 04/15/2012 Location(s): Idaho Offices(s): Nuclear Energy

  10. CX-002194: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    CX-002194: Categorical Exclusion Determination Install Demonstration Wind Turbine at Weldon Spring, Missouri, Site CX(s) Applied: B5.1 Date: 04282010 Location(s):...

  11. CX-012812: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Chemawa-Salem #1 & #2 Access Road Maintenance CX(s) Applied: B1.3Date: 41893 Location(s): OregonOffices(s): Bonneville Power Administration

  12. CX-012469: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Gas Analysis Services CX(s) Applied: B3.6Date: 41876 Location(s): OregonOffices(s): National Energy Technology Laboratory

  13. CX-010656: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Stormwater Drainage Repair CX(s) Applied: B1.3 Date: 06/18/2013 Location(s): South Carolina Offices(s): Savannah River Operations Office

  14. CX-011995: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination CX-011995: Categorical Exclusion Determination Hat Rock Tap Switching Station Equipment Transfer CX(s) Applied: B1.24 Date: 04102014 Location(s):...

  15. CX-005991: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    CX-005991: Categorical Exclusion Determination Prairie Village, Kansas Ground Source Heat Pump Relocation CX(s) Applied: B5.1 Date: 05252011 Location(s): Prairie Village,...

  16. CX-012118: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Hydro Research Foundation University Research Awards - Tufts CX(s) Applied: A9 Date: 05/21/2014 Location(s): Georgia Offices(s): Golden Field Office

  17. CX-010437: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Rocky Ridge Radio Station Upgrade CX(s) Applied: B1.19 Date: 05/31/2013 Location(s): Montana Offices(s): Bonneville Power Administration

  18. CX-011239: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Security Upgrades at Multiple Substations CX(s) Applied: ? Date: 10/02/2013 Location(s): Oregon, Washington Offices(s): Bonneville Power Administration

  19. CX-012474: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Refractories/Ceramics Project CX(s) Applied: B3.6Date: 41870 Location(s): OregonOffices(s): National Energy Technology Laboratory

  20. CX-007418: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sidewalks to School CX(s) Applied: B1.13 Date: 12/13/2011 Location(s): South Carolina Offices(s): Golden Field Office

  1. CX-006211: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination Missouri Independent Energy Efficiency Program: Henniges Automotive - Process Air Compressor Upgrades CX(s) Applied: B5.1 Date: 07182011 Location(s):...

  2. CX-009423: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Relay and Switchboard Panel Replacements CX(s) Applied: B4.6 Date: 10/29/2012 Location(s): Arkansas Offices(s): Southwestern Power Administration

  3. CX-012310: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sawmill Creek Stream Bank Erosion CX(s) Applied: B1.3 Date: 06/06/2014 Location(s): Illinois Offices(s): Argonne Site Office

  4. CX-009132: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Landfill Gas Utilization Plant CX(s) Applied: B5.21 Date: 08/02/2012 Location(s): New York Offices(s): Golden Field Office

  5. CX-012566: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Z-Area Fire Tank Painting CX(s) Applied: B1.3Date: 41865 Location(s): South CarolinaOffices(s): Savannah River Operations Office

  6. CX-007893: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    SunShot Massachusetts CX(s) Applied: A9, A11 Date: 02/10/2012 Location(s): Massachusetts Offices(s): Golden Field Office

  7. CX-012463: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Reliable SOFC Systems CX(s) Applied: A9, B3.6Date: 41877 Location(s): ConnecticutOffices(s): National Energy Technology Laboratory

  8. CX-011626: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Line Yard Fence Project CX(s) Applied: B1.11 Date: 06/05/2013 Location(s): Tennessee Offices(s): Y-12 Site Office

  9. CX-010869: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Nauticas Research Program CX(s) Applied: B3.6 Date: 08/07/2013 Location(s): Illinois Offices(s): Argonne Site Office

  10. CX-007407: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Advanced Floating Turbine CX(s) Applied: A9 Date: 12/07/2011 Location(s): Ohio Offices(s): Golden Field Office

  11. CX-010768: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    ZIRCEX Nuclear Fuel Dissolution Testing CX(s) Applied: B3.6 Date: 08/12/2013 Location(s): Idaho Offices(s): Nuclear Energy

  12. CX-012810: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    St. Johns-Keeler Minor Access Road Improvement CX(s) Applied: B1.3Date: 41901 Location(s): OregonOffices(s): Bonneville Power Administration

  13. CX-009513: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Aquatic Invasive Mussels Monitoring CX(s) Applied: B3.1 Date: 10/15/2012 Location(s): CX: none Offices(s): Bonneville Power Administration

  14. CX-012658: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Chief Joseph and Custer Substations Security Fence Replacement CX(s) Applied: B1.11Date: 41843 Location(s): WashingtonOffices(s): Bonneville Power Administration

  15. CX-007549: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Harrisonville - Waste Water Treatment Plant CX(s) Applied: B5.1 Date: 01/10/2012 Location(s): Missouri Offices(s): Golden Field Office

  16. CX-007550: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Kearney - Waste Water Treatment Plant CX(s) Applied: B5.1 Date: 01/10/2012 Location(s): Missouri Offices(s): Golden Field Office

  17. CX-007417: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Shift CX(s) Applied: B5.1 Date: 12/21/2011 Location(s): Pennsylvania Offices(s): Golden Field Office

  18. CX-010532: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Various Demolition Jobs CX(s) Applied: B1.23 Date: 06/07/2013 Location(s): Illinois Offices(s): Fermi Site Office

  19. CX-012796: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Big Eddy-Redmond #1 Wood Pole Replacements CX(s) Applied: B1.3Date: 41919 Location(s): OregonOffices(s): Bonneville Power Administration

  20. CX-012818: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    La Pine-Chiloquin Wood Pole Replacements CX(s) Applied: B1.3Date: 41887 Location(s): OregonOffices(s): Bonneville Power Administration

  1. CX-012813: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Redmond-Pilot Butte #1 Wood Pole Replacements CX(s) Applied: B1.3Date: 41893 Location(s): OregonOffices(s): Bonneville Power Administration

  2. CX-012799: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Malin-Hilltop Wood Pole Replacements CX(s) Applied: B1.3Date: 41915 Location(s): CaliforniaOffices(s): Bonneville Power Administration

  3. CX-012805: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Brasada-Harney #1 Wood Pole Replacements CX(s) Applied: B1.3Date: 41908 Location(s): OregonOffices(s): Bonneville Power Administration

  4. CX-012798: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Davis Creek Tap Wood Pole Replacements CX(s) Applied: B1.3Date: 41915 Location(s): CaliforniaOffices(s): Bonneville Power Administration

  5. CX-009166: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Integration of Waste Heat Recovery, Waste-to-Energy Conversion, and Waste-to-Chemical Conversion with Industrial Gas and Chemical Manufacturing Processes CX(s) Applied:...

  6. CX-011534: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Grays River Confluence Property Funding CX(s) Applied: B1.25 Date: 11/08/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  7. On the dry deposition of submicron particles

    SciTech Connect (OSTI)

    Wesely, M. L.

    1999-10-08

    The air-surface exchange of particles can have a strong role in determining the amount, size, and chemical composition of particles in the troposphere. Here the authors consider only dry processes (deposition processes not directly aided by precipitation) and mostly address particles less than about 2 {micro}m in diameter (often referred to as submicron particles because most of such particles are less than 1 {micro}m in diameter). The processes that control the dry exchange of particulate material between the atmosphere and the surface of the Earth are numerous, highly varied, and sometimes poorly understood. As a result, determining which of the surface processes to parameterize or simulate in modeling the tropospheric mass budget of a particulate substance can be a significant challenge. Dry deposition, for example, can be controlled by a combination of Brownian diffusion, impaction, interception, and gravitational settling, depending on the size of the particles, the roughness of the surface on both micrometeorological and microscopic scales, the geometrical structure of vegetative canopies, and other surface characteristics such as wetness. Particles can be added to the lower atmosphere by resuspension from land surfaces and sea spray. The roles of rapid gas-to-particle conversion and growth or shrinkage of particles as a result of water condensation or evaporation in the lower few meters of the atmosphere can also have a significant impact on particle concentrations in the lower atmosphere. Here, a few micrometeorological observations and inferences on particle air-surface exchange are briefly addressed.

  8. Pulsed laser deposition of AlMgB14 thin films

    SciTech Connect (OSTI)

    Russell, Alan; Bastawros, Ashraf; Tan, Xiaoli

    2008-11-18

    Hard, wear-resistant coatings of thin film borides based on AlMgB{sub 14} have the potential to be applied industrially to improve the tool life of cutting tools and pump vanes and may account for several million dollars in savings as a result of reduced wear on these parts. Past work with this material has shown that it can have a hardness of up to 45GPa and be fabricated into thin films with a similar hardness using pulsed laser deposition. These films have already been shown to be promising for industrial applications. Cutting tools coated with AlMgB{sub 14} used to mill titanium alloys have been shown to substantially reduce the wear on the cutting tool and extend its cutting life. However, little research into the thin film fabrication process using pulsed laser deposition to make AlMgB{sub 14} has been conducted. In this work, research was conducted into methods to optimize the deposition parameters for the AlMgB{sub 14} films. Processing methods to eliminate large particles on the surface of the AlMgB{sub 14} films, produce films that were at least 1m thick, reduce the surface roughness of the films, and improve the adhesion of the thin films were investigated. Use of a femtosecond laser source rather than a nanosecond laser source was found to be effective in eliminating large particles considered detrimental to wear reduction properties from the films. Films produced with the femtosecond laser were also found to be deposited at a rate 100 times faster than those produced with the nanosecond laser. However, films produced with the femtosecond laser developed a relatively high RMS surface roughness around 55nm. Attempts to decrease the surface roughness were largely unsuccessful. Neither increasing the surface temperature of the substrate during deposition nor using a double pulse to ablate the material was found to be extremely successful to reduce the surface roughness. Finally, the adhesion of the thin films to M2 tool steel substrates, assessed using the Rockwell C indentation adhesion test, was found to be substantially improved by the deposition of a titanium interlayer, but unaffected by increasing the temperature of the substrates. The titanium was found to improve the adhesion strength of the films because it reacted with both the steel and the AlMgB{sub 14} compound to form new compounds. Ultimately, it was concluded that the films with the best properties were produced with a femtosecond pulsed laser and were deposited on top of a titanium interlayer to improve the thin film adhesion.

  9. Academic Plan Faculty of Applied Science & Engineering

    E-Print Network [OSTI]

    Toronto, University of

    Academic Plan Faculty of Applied Science & Engineering University of Toronto 2011 to 2016 Approved by Faculty Council October 6, 2011 #12;Faculty of Applied Science & Engineering Academic Plan Table ........................................................................................... 13 Chapter 4: Educating Future Engineers

  10. Nanostructure templating using low temperature atomic layer deposition

    DOE Patents [OSTI]

    Grubbs, Robert K. (Albuquerque, NM); Bogart, Gregory R. (Corrales, NM); Rogers, John A. (Champaign, IL)

    2011-12-20

    Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.

  11. Deep Vadose Zone Applied Field Research Initiative

    E-Print Network [OSTI]

    Deep Vadose Zone­ Applied Field Research Initiative Fiscal Year 2012 Annual Report #12;Prepared Tasks 25 References 25 Appendix: FY2012 Products for the Deep Vadose Zone­ Applied Field Research Initiative Contents #12;Message from the Deep Vadose Zone- Applied Field Research Initiative Project Manager

  12. Montana State University 1 Applied Mathematics

    E-Print Network [OSTI]

    Maxwell, Bruce D.

    Montana State University 1 Applied Mathematics Option M 171Q Calculus I 4 or M 181Q 348 Techniques of Applied Math I 3 M 349 Techniques of Applied Mathematics II 3 M 386R Software Applications in Mathematics 3 M 441 Numerical Linear Algebra & Optimization 3 M 442 Numerical Solution

  13. Journal of Computational and Applied Mathematics

    E-Print Network [OSTI]

    Bohner, Martin

    Journal of Computational and Applied Mathematics Most downloaded articles January - August 2004 1: a survey Journal of Computational and Applied Mathematics, 141 (2002) 1-26 2. M. Z. Liu, M. H. Song and Z([t])*1 Journal of Computational and Applied Mathematics, 166 (2004) 361-370 3. S. Kutluay, A. Esen and I

  14. Online Master of Science in Applied Psychology

    E-Print Network [OSTI]

    Zhou, Xianghong Jasmine

    Online Master of Science in Applied Psychology #12;Online Master of Science in Applied Psychology of psychology to today's changing business environment. On behalf of the University of Southern California, I Psychology online program. Here at USC, we recognize the importance of applying psychology in many areas

  15. Deposition method for producing silicon carbide high-temperature semiconductors

    DOE Patents [OSTI]

    Hsu, George C. (La Crescenta, CA); Rohatgi, Naresh K. (W. Corine, CA)

    1987-01-01

    An improved deposition method for producing silicon carbide high-temperature semiconductor material comprising placing a semiconductor substrate composed of silicon carbide in a fluidized bed silicon carbide deposition reactor, fluidizing the bed particles by hydrogen gas in a mildly bubbling mode through a gas distributor and heating the substrate at temperatures around 1200.degree.-1500.degree. C. thereby depositing a layer of silicon carbide on the semiconductor substrate.

  16. USE OF ATOMIC LAYER DEPOSITION OF FUNCTIONALIZATION OF NANOPOROUS BIOMATERIALS

    SciTech Connect (OSTI)

    Brigmon, R.; Narayan, R.; Adiga, S.; Pellin, M.; Curtiss, L.; Stafslien, S.; Chisholm, B.; Monteiro-Riviere, N.; Elam, J.

    2010-02-08

    Due to its chemical stability, uniform pore size, and high pore density, nanoporous alumina is being investigated for use in biosensing, drug delivery, hemodialysis, and other medical applications. In recent work, we have examined the use of atomic layer deposition for coating the surfaces of nanoporous alumina membranes. Zinc oxide coatings were deposited on nanoporous alumina membranes using atomic layer deposition. The zinc oxide-coated nanoporous alumina membranes demonstrated antimicrobial activity against Escherichia coli and Staphylococcus aureus bacteria. These results suggest that atomic layer deposition is an attractive technique for modifying the surfaces of nanoporous alumina membranes and other nanostructured biomaterials.

  17. Innovative High-Performance Deposition Technology for Low-Cost...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Hamer, Tim Spencer OLEDWorks LLC Innovative High-Performance Deposition Technology for Low-Cost Manufacturing of OLED Lighting 2015 Building Technologies Office Peer Review DOE...

  18. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Ellingboe, Albert R. (Fremont, CA)

    1999-01-01

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  19. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Jose, CA); Ellingboe, Albert R. (Malahide, IE)

    2008-01-01

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  20. EGR Cooler Fouling- Visualization of Deposition and Removal Mechanis

    Broader source: Energy.gov [DOE]

    Presents experimental data on exhaust gas recirculation(EGR) cooler fouling using new test apparatus that allows for in-situ observation of deposition and removal processes

  1. Atomic Layer Deposition for Stabilization of Amorphous Silicon...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Documents & Publications Nanostructured Metal Oxide Anodes Atomic Layer Deposition for Stabilization of Silicon Anodes Development of Industrially Viable Battery Electrode Coatings...

  2. Physics of arcing, and implications to sputter deposition

    E-Print Network [OSTI]

    Anders, Andre

    2005-01-01

    A. Anders, Cathodic Arc Plasma Deposition: From FractalApplications of Vacuum-Arc-Produced Plasma, Ion and Electronstandard) textbooks on plasmas [1], arcs are introduced as

  3. CFD Analysis of Particle Deposition During DPF Filtration Processes

    Broader source: Energy.gov [DOE]

    A 3-D DPF model is developed to predict thermo-physical properties during filtration processes and to quantitatively investigate particle deposition regarding its size and number distribution.

  4. Development and Characterization of a Spray Deposited CNT/PVDF...

    Office of Scientific and Technical Information (OSTI)

    Conference: Development and Characterization of a Spray Deposited CNTPVDF Thin Film. Citation Details In-Document Search Title: Development and Characterization of a Spray...

  5. Remote Detection of Quaternary Borate Deposits with ASTER Satellite...

    Open Energy Info (EERE)

    Exploration Tool Jump to: navigation, search OpenEI Reference LibraryAdd to library Conference Paper: Remote Detection of Quaternary Borate Deposits with ASTER Satellite Imagery...

  6. Method of depositing a high-emissivity layer

    DOE Patents [OSTI]

    Wickersham, Charles E. (Columbus, OH); Foster, Ellis L. (Powell, OH)

    1983-01-01

    A method of depositing a high-emissivity layer on a substrate comprising RF sputter deposition of a carbide-containing target in an atmosphere of a hydrocarbon gas and a noble gas. As the carbide is deposited on the substrate the hydrocarbon gas decomposes to hydrogen and carbon. The carbon deposits on the target and substrate causing a carbide/carbon composition gradient to form on the substrate. At a sufficiently high partial pressure of hydrocarbon gas, a film of high-emissivity pure carbon will eventually form over the substrate.

  7. Eulerian CFD Models to Predict Thermophoretic Deposition of Soot...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    This paper describes an Eulerian axisymmetric method in Fluent(R) to predict the overall heat transfer reduction of a surrogate tube due to thermophoretic deposition of submicron...

  8. Vacuum deposition and curing of liquid monomers

    DOE Patents [OSTI]

    Affinito, J.D.

    1993-11-09

    The present invention is the formation of solid polymer layers under vacuum. More specifically, the present invention is the use of standard polymer layer-making equipment that is generally used in an atmospheric environment in a vacuum, and degassing the monomer material prior to injection into the vacuum. Additional layers of polymer or metal may be vacuum deposited onto solid polymer layers. Formation of polymer layers under a vacuum improves material and surface characteristics, and subsequent quality of bonding to additional layers. Further advantages include use of less to no photoinitiator for curing, faster curing, fewer impurities in the polymer electrolyte, as well as improvement in material properties including no trapped gas resulting in greater density, and reduced monomer wetting angle that facilitates spreading of the monomer and provides a smoother finished surface.

  9. Electro-deposition of superconductor oxide films

    DOE Patents [OSTI]

    Bhattacharya, Raghu N. (Littleton, CO)

    2001-01-01

    Methods for preparing high quality superconducting oxide precursors which are well suited for further oxidation and annealing to form superconducting oxide films. The method comprises forming a multilayered superconducting precursor on a substrate by providing an electrodeposition bath comprising an electrolyte medium and a substrate electrode, and providing to the bath a plurality of precursor metal salts which are capable of exhibiting superconducting properties upon subsequent treatment. The superconducting precursor is then formed by electrodepositing a first electrodeposited (ED) layer onto the substrate electrode, followed by depositing a layer of silver onto the first electrodeposited (ED) layer, and then electrodepositing a second electrodeposited (ED) layer onto the Ag layer. The multilayered superconducting precursor is suitable for oxidation at a sufficient annealing temperature in air or an oxygen-containing atmosphere to form a crystalline superconducting oxide film.

  10. Method and apparatus for electrospark deposition

    DOE Patents [OSTI]

    Bailey, Jeffrey A.; Johnson, Roger N.; Park, Walter R.; Munley, John T.

    2004-12-28

    A method and apparatus for controlling electrospark deposition (ESD) comprises using electrical variable waveforms from the ESD process as a feedback parameter. The method comprises measuring a plurality of peak amplitudes from a series of electrical energy pulses delivered to an electrode tip. The maximum peak value from among the plurality of peak amplitudes correlates to the contact force between the electrode tip and a workpiece. The method further comprises comparing the maximum peak value to a set point to determine an offset and optimizing the contact force according to the value of the offset. The apparatus comprises an electrode tip connected to an electrical energy wave generator and an electrical signal sensor, which connects to a high-speed data acquisition card. An actuator provides relative motion between the electrode tip and a workpiece by receiving a feedback drive signal from a processor that is operably connected to the actuator and the high-speed data acquisition card.

  11. Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films

    SciTech Connect (OSTI)

    Altuntas, Halit E-mail: biyikli@unam.bilkent.edu.tr; Ozgit-Akgun, Cagla; Donmez, Inci; Biyikli, Necmi E-mail: biyikli@unam.bilkent.edu.tr

    2015-04-21

    Here, we report on the current transport mechanisms in AlN thin films deposited at a low temperature (i.e., 200?°C) on p-type Si substrates by plasma-enhanced atomic layer deposition. Structural characterization of the deposited AlN was carried out using grazing-incidence X-ray diffraction, revealing polycrystalline films with a wurtzite (hexagonal) structure. Al/AlN/ p-Si metal-insulator-semiconductor (MIS) capacitor structures were fabricated and investigated under negative bias by performing current-voltage measurements. As a function of the applied electric field, different types of current transport mechanisms were observed; i.e., ohmic conduction (15.2–21.5 MV/m), Schottky emission (23.6–39.5 MV/m), Frenkel-Poole emission (63.8–211.8 MV/m), trap-assisted tunneling (226–280 MV/m), and Fowler-Nordheim tunneling (290–447 MV/m). Electrical properties of the insulating AlN layer and the fabricated Al/AlN/p-Si MIS capacitor structure such as dielectric constant, flat-band voltage, effective charge density, and threshold voltage were also determined from the capacitance-voltage measurements.

  12. Application of Radial Basis Functional Link Networks to Exploration for Proterozoic Mineral Deposits in Central Iran

    SciTech Connect (OSTI)

    Behnia, Pouran [Geological Survey of Iran, Geomatics Department (Iran, Islamic Republic of)], E-mail: pouranb@yahoo.com

    2007-06-15

    The metallogeny of Central Iran is characterized mainly by the presence of several iron, apatite, and uranium deposits of Proterozoic age. Radial Basis Function Link Networks (RBFLN) were used as a data-driven method for GIS-based predictive mapping of Proterozoic mineralization in this area. To generate the input data for RBFLN, the evidential maps comprising stratigraphic, structural, geophysical, and geochemical data were used. Fifty-eight deposits and 58 'nondeposits' were used to train the network. The operations for the application of neural networks employed in this study involve both multiclass and binary representation of evidential maps. Running RBFLN on different input data showed that an increase in the number of evidential maps and classes leads to a larger classification sum of squared error (SSE). As a whole, an increase in the number of iterations resulted in the improvement of training SSE. The results of applying RBFLN showed that a successful classification depends on the existence of spatially well distributed deposits and nondeposits throughout the study area.

  13. Raymond R. Ma School of Engineering and Applied Sciences,

    E-Print Network [OSTI]

    Haller, Gary L.

    technique called hybrid deposition manufactur- ing (HDM), which combines additive manufacturing (AM-mail: aaron.dollar@yale.edu Hybrid Deposition Manufacturing: Design Strategies for Multimaterial Mechanisms) processes such as fused depo- sition manufacturing (FDM) with material deposition and embedded components

  14. Electroplating method for producing ultralow-mass fissionable deposits

    DOE Patents [OSTI]

    Ruddy, Francis H. (Monroeville, PA)

    1989-01-01

    A method for producing ultralow-mass fissionable deposits for nuclear reactor dosimetry is described, including the steps of holding a radioactive parent until the radioactive parent reaches secular equilibrium with a daughter isotope, chemically separating the daughter from the parent, electroplating the daughter on a suitable substrate, and holding the electroplated daughter until the daughter decays to the fissionable deposit.

  15. Evaluating Simple Repository Deposit for Open Educational Resources

    E-Print Network [OSTI]

    Giles, C. Lee

    Evaluating Simple Repository Deposit for Open Educational Resources Morwan Mohamed Nour, Kyle software tools have been identified as drivers for the Open Educational Resources (OER) move- ment. However resources, repository, deposit, desktop 1 Introduction Open Educational Resources (OER) are digital objects

  16. A Bidirectional Deposition Model of Wax Crayons Dave Rudolf

    E-Print Network [OSTI]

    Mould, David

    A Bidirectional Deposition Model of Wax Crayons Dave Rudolf dave.rudolf@usask.ca David Mould mould present a physically-inspired model of wax crayons, which synthesizes drawings from collections of user that evolves as it interacts with the paper. The amount of wax deposition is computed based on the crayon

  17. Subaqueous Explosive Eruption and Welding of Pyroclastic Deposits

    E-Print Network [OSTI]

    Busby, Cathy

    Subaqueous Explosive Eruption and Welding of Pyroclastic Deposits Peter Kokelaar and Cathy Busby fabrics indicative of welding of glass shards and pumice at temperatures >500"C. The occurrence emplacement temperature in pyroclas- tic deposits is welding. Welding is hot-state viscous deformation

  18. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride

    DOE Patents [OSTI]

    Lowden, Richard A. (Powell, TN)

    1994-01-01

    A process for chemical vapor deposition of crystalline silicon nitride which comprises the steps of: introducing a mixture of a silicon source, a molybdenum source, a nitrogen source, and a hydrogen source into a vessel containing a suitable substrate; and thermally decomposing the mixture to deposit onto the substrate a coating comprising crystalline silicon nitride containing a dispersion of molybdenum silicide.

  19. Sputter deposition for multi-component thin films

    DOE Patents [OSTI]

    Krauss, A.R.; Auciello, O.

    1990-05-08

    Ion beam sputter-induced deposition using a single ion beam and a multicomponent target is capable of reproducibly producing thin films of arbitrary composition, including those which are close to stoichiometry. Using a quartz crystal deposition monitor and a computer controlled, well-focused ion beam, this sputter-deposition approach is capable of producing metal oxide superconductors and semiconductors of the superlattice type such as GaAs-AlGaAs as well as layered metal/oxide/semiconductor/superconductor structures. By programming the dwell time for each target according to the known sputtering yield and desired layer thickness for each material, it is possible to deposit composite films from a well-controlled sub-monolayer up to thicknesses determined only by the available deposition time. In one embodiment, an ion beam is sequentially directed via a set of X-Y electrostatic deflection plates onto three or more different element or compound targets which are constituents of the desired film. In another embodiment, the ion beam is directed through an aperture in the deposition plate and is displaced under computer control to provide a high degree of control over the deposited layer. In yet another embodiment, a single fixed ion beam is directed onto a plurality of sputter targets in a sequential manner where the targets are each moved in alignment with the beam under computer control in forming a multilayer thin film. This controlled sputter-deposition approach may also be used with laser and electron beams. 10 figs.

  20. Sputter deposition for multi-component thin films

    DOE Patents [OSTI]

    Krauss, Alan R. (Plainfield, IL); Auciello, Orlando (Cary, NC)

    1990-01-01

    Ion beam sputter-induced deposition using a single ion beam and a multicomponent target is capable of reproducibly producing thin films of arbitrary composition, including those which are close to stoichiometry. Using a quartz crystal deposition monitor and a computer controlled, well-focused ion beam, this sputter-deposition approach is capable of producing metal oxide superconductors and semiconductors of the superlattice type such as GaAs-AlGaAs as well as layered metal/oxide/semiconductor/superconductor structures. By programming the dwell time for each target according to the known sputtering yield and desired layer thickness for each material, it is possible to deposit composite films from a well-controlled sub-monolayer up to thicknesses determined only by the available deposition time. In one embodiment, an ion beam is sequentially directed via a set of X-Y electrostatic deflection plates onto three or more different element or compound targets which are constituents of the desired film. In another embodiment, the ion beam is directed through an aperture in the deposition plate and is displaced under computer control to provide a high degree of control over the deposited layer. In yet another embodiment, a single fixed ion beam is directed onto a plurality of sputter targets in a sequential manner where the targets are each moved in alignment with the beam under computer control in forming a multilayer thin film. This controlled sputter-deposition approach may also be used with laser and electron beams.

  1. Atomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides

    E-Print Network [OSTI]

    Atomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides Jill S. Becker, Esther Kim, and conformal coatings of higher nitrides of hafnium and zirconium were produced by atomic layer deposition from-colored, and highly conducting. I. Introduction The mononitrides of hafnium and zirconium of stoi- chiometry MN (M

  2. Deposition Modeling for Paint Application on Surfaces Embedded in

    E-Print Network [OSTI]

    Deposition Modeling for Paint Application on Surfaces Embedded in ¢¡¤£ David C. Conner Prasad N and efficient trajectory planning tools for automotive painting. Not only must the paint applicator pass over recently become widely used in the automotive painting industry. Conventional deposition models, used

  3. Analysis of the magnetic corrosion product deposits on a boiling water reactor cladding

    SciTech Connect (OSTI)

    Orlov, Andrey; Degueldre, Claude; Kaufmann, Wilfried

    2013-01-15

    The buildup of corrosion product deposits (CRUD) on the fuel cladding of the boiling water reactor (BWR) before and after zinc injection has been investigated by applying local experimental analytical techniques. Under the BWR water chemistry conditions, Zn addition together with the presence of Ni and Mn induce the formation of (Zn,Ni,Mn)[Fe{sub 2}O{sub 4}] spinel solid solutions. X-ray absorption spectroscopy (XAS) revealed inversion ratios of cation distribution in spinels deposited from the solid solution. Based on this information, a two-site ferrite spinel solid solution model is proposed. Electron probe microanalysis (EPMA) and extended X-ray absorption fine structure (EXAFS) findings suggest the zinc-rich ferrite spinels formation on BWR fuel cladding mainly at lower pin. - Graphical Abstract: Analysis of spinels in corrosion product deposits on boiling water reactor fuel rod. Combining EPMA and XAFS results: schematic representation of the ferrite spinels in terms of the end members and their extent of inversion. Note that the ferrites are represented as a surface between the normal (upper plane, M[Fe{sub 2}]O{sub 4}) and the inverse (lower plane, Fe[MFe]O{sub 4}). Actual compositions red Black-Small-Square for the specimen at low elevation (810 mm), blue Black-Small-Square for the specimen at mid elevation (1800 mm). The results have an impact on the properties of the CRUD material. Highlights: Black-Right-Pointing-Pointer Buildup of corrosion product deposits on fuel claddings of a boiling water reactor (BWR) are investigated. Black-Right-Pointing-Pointer Under BWR water conditions, Zn addition with Ni and Mn induced formation of (Zn,Ni,Mn)[Fe{sub 2}O{sub 4}]. Black-Right-Pointing-Pointer X-Ray Adsorption Spectroscopy (XAS) revealed inversion of cations in spinel solid solutions. Black-Right-Pointing-Pointer Zinc-rich ferrite spinels are formed on BWR fuel cladding mainly at lower pin elevations.

  4. Method of and apparatus for determining deposition-point temperature

    DOE Patents [OSTI]

    Mansure, A.J.; Spates, J.J.; Martin, S.J.

    1998-10-27

    Acoustic-wave sensor apparatus and method are disclosed for analyzing a normally liquid petroleum-based composition for monitoring deposition-point temperature. The apparatus includes at least one acoustic-wave device such as SAW, QCM, FPM, TSM or APM type devices in contact with the petroleum-based composition for sensing or detecting the surface temperature at which deposition occurs and/or rate of deposition as a function of temperature by sensing an accompanying change in frequency, phase shift, damping voltage or damping current of an electrical oscillator to a known calibrated condition. The acoustic wave device is actively cooled to monitor the deposition of constituents such as paraffins by determining the point at which solids from the liquid composition begin to form on the acoustic wave device. The acoustic wave device can be heated to melt or boil off the deposits to reset the monitor and the process can be repeated. 5 figs.

  5. Method of and apparatus for determining deposition-point temperature

    DOE Patents [OSTI]

    Mansure, Arthur J. (Albuquerque, NM); Spates, James J. (Albuquerque, NM); Martin, Stephen J. (Albuquerque, NM)

    1998-01-01

    Acoustic-wave sensor apparatus and method for analyzing a normally liquid petroleum-based composition for monitoring deposition-point temperature. The apparatus includes at least one acoustic-wave device such as SAW, QCM, FPM, TSM or APM type devices in contact with the petroleum-based composition for sensing or detecting the surface temperature at which deposition occurs and/or rate of deposition as a function of temperature by sensing an accompanying change in frequency, phase shift, damping voltage or damping current of an electrical oscillator to a known calibrated condition. The acoustic wave device is actively cooled to monitor the deposition of constituents such as paraffins by determining the point at which solids from the liquid composition begin to form on the acoustic wave device. The acoustic wave device can be heated to melt or boil off the deposits to reset the monitor and the process can be repeated.

  6. Metal oxide morphology in argon-assisted glancing angle deposition

    SciTech Connect (OSTI)

    Sorge, J. B.; Taschuk, M. T.; Wakefield, N. G.; Sit, J. C.; Brett, M. J. [Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4 (Canada); Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4 (Canada) and NRC National Institute for Nanotechnology, Edmonton, AB T6G 2M9 (Canada)

    2012-03-15

    Glancing angle deposition (GLAD) is a thin film deposition technique capable of fabricating columnar architectures such as posts, helices, and chevrons with control over nanoscale film features. Argon bombardment during deposition modifies the GLAD process, producing films with new morphologies which have shown promise for sensing and photonic devices. The authors report modification of column tilt angle, film density, and specific surface area for 12 different metal oxide and fluoride film materials deposited using Ar-assisted GLAD. For the vapor flux/ion beam geometry and materials studied here, with increasing argon flux, the column tilt increases, film density increases, and specific surface area decreases. With a better understanding of the nature of property modification and the mechanisms responsible, the Ar-assisted deposition process can be more effectively targeted towards specific applications, including birefringent thin films or photonic crystal square spirals.

  7. Germanium films by polymer-assisted deposition

    DOE Patents [OSTI]

    Jia, Quanxi; Burrell, Anthony K.; Bauer, Eve; Ronning, Filip; McCleskey, Thomas Mark; Zou, Guifu

    2013-01-15

    Highly ordered Ge films are prepared directly on single crystal Si substrates by applying an aqueous coating solution having Ge-bound polymer onto the substrate and then heating in a hydrogen-containing atmosphere. A coating solution was prepared by mixing water, a germanium compound, ethylenediaminetetraacetic acid, and polyethyleneimine to form a first aqueous solution and then subjecting the first aqueous solution to ultrafiltration.

  8. Building America Expert Meeting: Recommendations for Applying...

    Energy Savers [EERE]

    Building America Expert Meeting: Recommendations for Applying Water Heaters in Combination Space and Domestic Water Heating Systems Building America Expert Meeting: Recommendations...

  9. Alumni & Industry Magazine Chemical Engineering & Applied Chemistry

    E-Print Network [OSTI]

    Prodiæ, Aleksandar

    grease, waste animal fats, recycled veg- etable oils and agricultural seed oils into biodiesel. BioxAlumni & Industry Magazine Chemical Engineering & Applied Chemistry University of Toronto Volume 10

  10. Modeling International Relationships in Applied General Equilibrium...

    Open Energy Info (EERE)

    in Applied General Equilibrium (MIRAGE) AgencyCompany Organization: International Food Policy Research Institute, Centre d'Etudes Prospectives et d'Informations...

  11. Environmental Impact and Sustainability Applied General Equilibrium...

    Open Energy Info (EERE)

    Model (ENVISAGE) Jump to: navigation, search Tool Summary LAUNCH TOOL Name: Environmental Impact and Sustainability Applied General Equilibrium Model (ENVISAGE) Agency...

  12. Conduction mechanisms in thin atomic layer deposited Al{sub 2}O{sub 3} layers

    SciTech Connect (OSTI)

    Spahr, Holger; Montzka, Sebastian; Reinker, Johannes; Hirschberg, Felix; Kowalsky, Wolfgang; Johannes, Hans-Hermann, E-mail: h2.johannes@ihf.tu-bs.de [Institut für Hochfrequenztechnik, Technische Universität Braunschweig, Schleinitzstraße 22, 38106 Braunschweig (Germany)

    2013-11-14

    Thin Al{sub 2}O{sub 3} layers of 2–135?nm thickness deposited by thermal atomic layer deposition at 80?°C were characterized regarding the current limiting mechanisms by increasing voltage ramp stress. By analyzing the j(U)-characteristics regarding ohmic injection, space charge limited current (SCLC), Schottky-emission, Fowler-Nordheim-tunneling, and Poole-Frenkel-emission, the limiting mechanisms were identified. This was performed by rearranging and plotting the data in a linear scale, such as Schottky-plot, Poole-Frenkel-plot, and Fowler-Nordheim-plot. Linear regression then was applied to the data to extract the values of relative permittivity from Schottky-plot slope and Poole-Frenkel-plot slope. From Fowler-Nordheim-plot slope, the Fowler-Nordheim-energy-barrier was extracted. Example measurements in addition to a statistical overview of the results of all investigated samples are provided. Linear regression was applied to the region of the data that matches the realistic values most. It is concluded that ohmic injection and therefore SCLC only occurs at thicknesses below 12?nm and that the Poole-Frenkel-effect is no significant current limiting process. The extracted Fowler-Nordheim-barriers vary in the range of up to approximately 4?eV but do not show a specific trend. It is discussed whether the negative slope in the Fowler-Nordheim-plot could in some cases be a misinterpreted trap filled limit in the case of space charge limited current.

  13. Thermal barrier coating deposition by rarefied gas jet assisted processes: Simulations of deposition on a stationary airfoil

    E-Print Network [OSTI]

    Wadley, Haydn

    Thermal barrier coating deposition by rarefied gas jet assisted processes: Simulations) The uniform coating of a complex shaped substrate, such as a gas turbine airfoil, by collisionless physical thermal barrier coating are used to investigate fundamental aspects of the deposition process, including

  14. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Abbasi-Firouzjah, M.; Shokri, B.; Physics Department, Shahid Beheshti University G.C., Evin, Tehran

    2013-12-07

    Low dielectric constant (low-k) silica based films were deposited on p-type silicon and polycarbonate substrates by radio frequency (RF) plasma enhanced chemical vapor deposition method at low temperature. A mixture of tetraethoxysilane vapor, oxygen, and tetrafluoromethane (CF{sub 4}) was used for the deposition of the films in forms of two structures called as SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z}. Properties of the films were controlled by amount of porosity and fluorine content in the film matrix. The influence of RF power and CF{sub 4} flow on the elemental composition, deposition rate, surface roughness, leakage current, refractive index, and dielectric constant of the films were characterized. Moreover, optical emission spectroscopy was applied to monitor the plasma process at the different parameters. Electrical characteristics of SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z} films with metal-oxide-semiconductor structure were investigated using current-voltage analysis to measure the leakage current and breakdown field, as well as capacitance-voltage analysis to obtain the film's dielectric constant. The results revealed that SiO{sub x}C{sub y} films, which are deposited at lower RF power produce more leakage current, meanwhile the dielectric constant and refractive index of these films decreased mainly due to the more porosity in the film structure. By adding CF{sub 4} in the deposition process, fluorine, the most electronegative and the least polarized atom, doped into the silica film and led to decrease in the refractive index and the dielectric constant. In addition, no breakdown field was observed in the electrical characteristics of SiO{sub x}C{sub y}F{sub z} films and the leakage current of these films reduced by increment of the CF{sub 4} flow.

  15. In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on GaAs using trimethyaluminum

    E-Print Network [OSTI]

    In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on Ga 26 June 2008; published online 21 July 2008 In situ atomic-layer deposition ALD of Al2O3 on p­4 Recently, many ex situ methods such as atomic-layer deposition ALD of high-k on GaAs have achieved success

  16. UNL Core for Applied Genomics and Ecology

    E-Print Network [OSTI]

    Farritor, Shane

    UNL Core for Applied Genomics and Ecology Bioinformatics training Roche 454 GS-FLX Registration, Microbiomes, Variant Analysis, Whole Genomes, Transcriptomes Data Analysis and Statistics CAGE database and employer. University of Nebraska-Lincoln*Core for Applied Genomics and Ecology* 323 Filley Hall *Lincoln

  17. FACULTY OF APPLIED SCIENCE ENGINEERING NEWS

    E-Print Network [OSTI]

    Pulfrey, David L.

    in the race. After their two competition cars were totalled, they've now regroupFACULTY OF APPLIED SCIENCE ENGINEERING NEWS FALL 2014 / WINTER 2015 PROTECTING THE ENVIRONMENT -- USING NATURAL ENGINEERING SURVIVE AND THRIVE APPLIED RESEARCH FACILITY -- STAR -- TAKES OFF

  18. Disease management Applying Stylet Oil, Sulforix or

    E-Print Network [OSTI]

    Isaacs, Rufus

    1 Disease management Applying Stylet Oil, Sulforix or Armicarb now to vines with powdery mildew will reduce disease pressure next year. Do not apply Sulforix to sulfur-sensitive grapes. Bunch rots are best controlled by leaf pulling, but application of Fungastop may help reduce sour rot. Insect management Low

  19. Nuclear Facilities and Applied Technologies at Sandia

    SciTech Connect (OSTI)

    Wheeler, Dave; Kaiser, Krista; Martin, Lonnie; Hanson, Don; Harms, Gary; Quirk, Tom

    2014-11-28

    The Nuclear Facilities and Applied Technologies organization at Sandia National Laboratories’ Technical Area Five (TA-V) is the leader in advancing nuclear technologies through applied radiation science and unique nuclear environments. This video describes the organization’s capabilities, facilities, and culture.

  20. Fluorine contamination in yttrium-doped barium zirconate film deposited by atomic layer deposition

    SciTech Connect (OSTI)

    An Jihwan; Beom Kim, Young; Sun Park, Joong; Hyung Shim, Joon; Guer, Turgut M.; Prinz, Fritz B.

    2012-01-15

    The authors have investigated the change of chemical composition, crystallinity, and ionic conductivity in fluorine contaminated yttrium-doped barium zirconate (BYZ) fabricated by atomic layer deposition (ALD). It has been identified that fluorine contamination can significantly affect the conductivity of the ALD BYZ. The authors have also successfully established the relationship between process temperature and contamination and the source of fluorine contamination, which was the perfluoroelastomer O-ring used for vacuum sealing. The total removal of fluorine contamination was achieved by using all-metal sealed chamber instead of O-ring seals.

  1. Comparative biosedimentology of some terraced travertine deposits

    SciTech Connect (OSTI)

    Farmer, J.D.; Des Marais, D.J. (NASA, Moffett Field, CA (United States). Ames Research Center)

    1992-01-01

    The authors have compared several travertine spring systems representing a range of thermal regimes and geological settings. The goal is to derive a facies model for terraced travertine deposits that integrates biological influences on sedimentary fabric and microstructure. The springs chosen for comparison include Asta Spring (Upper Geyser Basin, Yellowstone; [le] 85 C), Angel Terrace (Mammoth Group, Yellowstone; [le] 72 C), and Big Horn Spring, Wyoming ([le] 56 C). At the highest temperatures microbial mats are absent and primary structures are dense, botryoidal masses of calcite exhibiting radial acicular fabrics. At intermediate temperatures a variety of mat types and associated sedimentary fabrics were observed, their distribution being correlated with temperature and flow velocity. Two types of current-oriented streamer fabrics were observed, a type at 72--74 C formed by the precipitation of aragonite on surfaces of a finely-filamentous bacterial species resembling Thiothrix, and a second type at 45--55 C, formed by aragonite blades associated with thin microbial mats dominated by Spirulina that appear to bind small dumbell-shaped crystals of aragonite. In quiet water at 45--50 C, microbial mats dominated by species of Phormidium formed tufted mats associated with ridged networks and open fenestral fabrics. At Big Horn Spring, a filamentous eukaryotic alga forms mats in lower terracette ponds at < 40 C. Moving down the system, algal-coated pisoids up to 1 cm. became abundant. Algal filaments were able to retain mm-sized pisoids on spillways, where they had become embedded in terracette faces. All of the biogenic fabrics noted above survive early diagenesis, and have been identified in Holocene and Pleistocene travertines.

  2. Method for depositing high-quality microcrystalline semiconductor materials

    DOE Patents [OSTI]

    Guha, Subhendu (Bloomfield Hills, MI); Yang, Chi C. (Troy, MI); Yan, Baojie (Rochester Hills, MI)

    2011-03-08

    A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

  3. Depressurization-induced gas production from Class 1 and Class 2 hydrate deposits

    E-Print Network [OSTI]

    Moridis, George J.; Kowalsky, Michael

    2006-01-01

    Induced Gas Production From Class 1 Hydrate Deposits, SPEso in Stage IV. 3. In Class 1W deposits, up to 65% of the4. Production from Class 1G deposits is continuous, free of

  4. Adhesion improvement of electroless copper depositions on titanium nitride by low temperature annealing 

    E-Print Network [OSTI]

    Eiserer, Rex Anthony

    1999-01-01

    Due to the ever decreasing dimensions of the inter-level metallic interconnects, alternative metal deposition processes must be explored as the current processes (chemical vapor deposition (CVD) and physical vapor deposition ...

  5. Concentration, size distribution, and dry deposition rate of particle-associated metals in the Los Angeles region

    E-Print Network [OSTI]

    Lim, Jeong-Hee H; Sabin, L D; Schiff, K C; Stolzenbach, K D

    2006-01-01

    the result of cyclical resuspension and deposition of dustNRI; Dry Deposition Velocity; Resuspension; Image Analysis;upon contact without resuspension, the deposition velocity

  6. Sensitivity Analysis of Gas Production from Class 2 and Class 3 Hydrate Deposits

    E-Print Network [OSTI]

    Reagan, Matthew

    2009-01-01

    during production from a Class 2 oceanic deposit withinduced gas production from Class 1 hydrate deposits,” (Gas Production From Oceanic Class 3 Hydrate Accumulations”

  7. Stratigraphy of the PB-1 well, Nopal I uranium deposit, Sierra Pena Blanca, Chihuahua, Mexico

    E-Print Network [OSTI]

    Dobson, P.

    2009-01-01

    and geochronology of the Nopal I uranium deposit, Mexico:with hydrothermally altered Nopal Formation rhyolitic tuff.uranium mineralization at the Nopal deposit include Calas (

  8. Quantifying channelized submarine depositional systems from bed to basin scale

    E-Print Network [OSTI]

    Lyons, William J., 1965-

    2004-01-01

    The challenges of directly observing active turbidity currents necessitates the consideration of preserved deposits for deciphering the behavior of these systems. In this thesis, I take advantage 3-D subsurface seismic ...

  9. Computational Intelligence for Deepwater Reservoir Depositional Environments Interpretation

    E-Print Network [OSTI]

    Yu, Tina; Clark, Julian; Sullivan, Morgan; 10.1016/j.jngse.2011.07.014

    2013-01-01

    Predicting oil recovery efficiency of a deepwater reservoir is a challenging task. One approach to characterize a deepwater reservoir and to predict its producibility is by analyzing its depositional information. This research proposes a deposition-based stratigraphic interpretation framework for deepwater reservoir characterization. In this framework, one critical task is the identification and labeling of the stratigraphic components in the reservoir, according to their depositional environments. This interpretation process is labor intensive and can produce different results depending on the stratigrapher who performs the analysis. To relieve stratigrapher's workload and to produce more consistent results, we have developed a novel methodology to automate this process using various computational intelligence techniques. Using a well log data set, we demonstrate that the developed methodology and the designed workflow can produce finite state transducer models that interpret deepwater reservoir depositional...

  10. Enabling integration of vapor-deposited polymer thin films

    E-Print Network [OSTI]

    Petruczok, Christy D. (Christy Danielle)

    2014-01-01

    Initiated Chemical Vapor Deposition (iCVD) is a versatile, one-step process for synthesizing conformal and functional polymer thin films on a variety of substrates. This thesis emphasizes the development of tools to further ...

  11. Electrochemical deposition of small molecules for electronic materials 

    E-Print Network [OSTI]

    Allwright, Emily Marieke

    2014-11-27

    The method of the deposition of films of small molecules for use in electronic applications is just as important as the molecule design itself as the film’s morphology and continuity influence the performance of the ...

  12. Kinetic Monte Carlo simulations of nanocrystalline film deposition

    E-Print Network [OSTI]

    Ruan, Shiyun

    A full diffusion kinetic Monte Carlo algorithm is used to model nanocrystalline film deposition, and study the mechanisms of grain nucleation and microstructure formation in such films. The major finding of this work is ...

  13. ORIGINAL PAPER From Tethys to Eastern Paratethys: Oligocene depositional

    E-Print Network [OSTI]

    Jiménez-Moreno, Gonzalo

    of New Mexico, Albuquerque 86011, USA S. Coric Geologische Bundesanstalt, Neulinggasse 38, 1031 Vienna anoxic bottom conditions (e.g. Schulz et al. 2005) and the deposition of black shales in large parts

  14. Sediment distribution and depositional processes on the Carnegie Ridge 

    E-Print Network [OSTI]

    Pazmino Manrique, Nelson Andres

    2005-08-29

    Sediment sampling, bathymetric data, and seismic reflection profiling were used to classify sediment deposition patterns on the Carnegie Ridge. Core sampling was used to relate compositional characteristics between equivalent areas, and seismic...

  15. Initiated chemical vapor deposition of functional polyacrylic thin films

    E-Print Network [OSTI]

    Mao, Yu, 1975-

    2005-01-01

    Initiated chemical vapor deposition (iCVD) was explored as a novel method for synthesis of functional polyacrylic thin films. The process introduces a peroxide initiator, which can be decomposed at low temperatures (<200?C) ...

  16. Methods of coping with silica deposition - the PNOC experience

    SciTech Connect (OSTI)

    Candelaria, M.N.R.; Garcia, S.E.; Baltazar, A.D.J. Jr.; Solis, R.P.

    1996-12-31

    Several methods of coping with silica deposition from geothermal waters have been undertaken by PNOC-EDC to maximize Power Output from these fluids. Initially, the problem of amorphous silica deposition in surface pipelines and the reinjection well was prevented by operating the production separators at pressures higher or equal to amorphous silica saturation. However, increasing demands for additional power and stringent environmental controls have dictated the need to find alternative methods of coping with silica deposition. Several options have been studied and tested to be able to optimize fluid utilization for production. These include: acid treatment polymerization and deposition of silica in surface ponds or sumps, and chemical inhibition. As each brine is unique, methodologies used for mitigation of the silica problem have been varied.

  17. Precipitation scavenging, dry deposition, and resuspension. Volume 2. Proceedings

    SciTech Connect (OSTI)

    Pruppacher, H.R.; Semonin, R.G.; Slinn, W.G.N.

    1983-01-01

    Volume 2 of these proceedings contains papers on dry deposition and resuspension of airborne pollutants. Items within the scope of EDB have been entered separately into the data base. (ACR)

  18. Chemical vapor deposition of organosilicon and sacrificial polymer thin films

    E-Print Network [OSTI]

    Casserly, Thomas Bryan

    2005-01-01

    Chemical vapor deposition (CVD) produced films for a wide array of applications from a variety of organosilicon and organic precursors. The structure and properties of thin films were controlled by varying processing ...

  19. Chapter 8: Modelling Sediment Records of Atmospherically Deposited Contaminants

    E-Print Network [OSTI]

    Short, Daniel

    73 Chapter 8: Modelling Sediment Records of Atmospherically Deposited Contaminants 8.1. Catchment the Water Column...............................................79 8.3 Water Column to Bottom Sediment Transfer......................................80 #12;Chapter 8: Modelling Sediment Records... 74 8

  20. Modeling the dynamics and depositional patterns of sandy rivers

    E-Print Network [OSTI]

    Jerolmack, Douglas J

    2006-01-01

    This thesis seeks to advance our understanding of the dynamic nature, spatial organization and depositional record of topography in sand-bedded rivers. I examine patterns and processes over a wide range of scales, on Earth ...

  1. Surface treatment of nanocrystal quantum dots after film deposition

    DOE Patents [OSTI]

    Sykora, Milan; Koposov, Alexey; Fuke, Nobuhiro

    2015-02-03

    Provided are methods of surface treatment of nanocrystal quantum dots after film deposition so as to exchange the native ligands of the quantum dots for exchange ligands that result in improvement in charge extraction from the nanocrystals.

  2. Source apportionment of wet sulfate deposition in eastern North America

    E-Print Network [OSTI]

    Fay, James A.

    1985-01-01

    An analytical model of long distance transport of air pollutants (Fay and Rosenzweig, 1980) has been adapted for the estimation of long term (e.g. annual) wet sulfate deposition in eastern N. America. The model parameters ...

  3. Enhancement of fine particle deposition to permeable sediments

    E-Print Network [OSTI]

    Fries, Jerry Stephen, 1972-

    2002-01-01

    Predictions of deposition rate are integral to the transport of many constituents including contaminants, organic matter, and larvae. Review of the literature demonstrates a general appreciation for the potential control ...

  4. Carbon nanotube forests growth using catalysts from atomic layer deposition

    SciTech Connect (OSTI)

    Chen, Bingan; Zhang, Can; Esconjauregui, Santiago; Xie, Rongsi; Zhong, Guofang; Robertson, John; Bhardwaj, Sunil; Cepek, Cinzia

    2014-04-14

    We have grown carbon nanotubes using Fe and Ni catalyst films deposited by atomic layer deposition. Both metals lead to catalytically active nanoparticles for growing vertically aligned nanotube forests or carbon fibres, depending on the growth conditions and whether the substrate is alumina or silica. The resulting nanotubes have narrow diameter and wall number distributions that are as narrow as those grown from sputtered catalysts. The state of the catalyst is studied by in-situ and ex-situ X-ray photoemission spectroscopy. We demonstrate multi-directional nanotube growth on a porous alumina foam coated with Fe prepared by atomic layer deposition. This deposition technique can be useful for nanotube applications in microelectronics, filter technology, and energy storage.

  5. Fabrication of solid oxide fuel cell by electrochemical vapor deposition

    DOE Patents [OSTI]

    Brian, Riley (Willimantic, CT); Szreders, Bernard E. (Oakdale, CT)

    1989-01-01

    In a high temperature solid oxide fuel cell (SOFC), the deposition of an impervious high density thin layer of electrically conductive interconnector material, such as magnesium doped lanthanum chromite, and of an electrolyte material, such as yttria stabilized zirconia, onto a porous support/air electrode substrate surface is carried out at high temperatures (approximately 1100.degree.-1300.degree. C.) by a process of electrochemical vapor deposition. In this process, the mixed chlorides of the specific metals involved react in the gaseous state with water vapor resulting in the deposit of an impervious thin oxide layer on the support tube/air electrode substrate of between 20-50 microns in thickness. An internal heater, such as a heat pipe, is placed within the support tube/air electrode substrate and induces a uniform temperature profile therein so as to afford precise and uniform oxide deposition kinetics in an arrangement which is particularly adapted for large scale, commercial fabrication of SOFCs.

  6. Fabrication of solid oxide fuel cell by electrochemical vapor deposition

    DOE Patents [OSTI]

    Riley, B.; Szreders, B.E.

    1988-04-26

    In a high temperature solid oxide fuel cell (SOFC), the deposition of an impervious high density thin layer of electrically conductive interconnector material, such as magnesium doped lanthanum chromite, and of an electrolyte material, such as yttria stabilized zirconia, onto a porous support/air electrode substrate surface is carried out at high temperatures (/approximately/1100/degree/ /minus/ 1300/degree/C) by a process of electrochemical vapor deposition. In this process, the mixed chlorides of the specific metals involved react in the gaseous state with water vapor resulting in the deposit of an impervious thin oxide layer on the support tube/air electrode substrate of between 20--50 microns in thickness. An internal heater, such as a heat pipe, is placed within the support tube/air electrode substrate and induces a uniform temperature profile therein so as to afford precise and uniform oxide deposition kinetics in an arrangement which is particularly adapted for large scale, commercial fabrication of SOFCs.

  7. Roadmap: Applied Engineering Applied Engineering and Technology Management Bachelor of Science

    E-Print Network [OSTI]

    Sheridan, Scott

    Roadmap: Applied Engineering ­ Applied Engineering and Technology Management ­ Bachelor of Science­2013 Page 1 of 2 | Last Updated: 21-May-12/JS This roadmap is a recommended semester-by-semester plan TECH 43550 Computer-Aided Manufacturing 3 General Elective 6 #12;Roadmap: Applied Engineering

  8. Particle deposition in ventilation ducts: Connectors, bends anddeveloping flow

    SciTech Connect (OSTI)

    Sippola, Mark R.; Nazaroff, William W.

    2004-03-01

    In ventilation duct flow the turbulent flow profile is commonly disturbed or not fully developed and these conditions are likely to influence particle deposition to duct surfaces. Particle deposition rates at eight S-connectors, in two 90{sup o} duct bends and in two ducts where the turbulent flow profile was not fully developed were measured in a laboratory duct system with both galvanized steel and internally insulated ducts with hydraulic diameters of 15.2 cm. In the steel duct system, experiments with nominal particle diameters of 1, 3, 5, 9 and 16 {micro}m were conducted at each of three nominal air speeds: 2.2, 5.3 and 9.0 m/s. In the insulated duct system, deposition of particles with nominal diameters of 1, 3, 5, 8 and 13 {micro}m was measured at nominal air speeds of 2.2, 5.3 and 8.8 m/s. Fluorescent techniques were used to directly measure the deposition velocities of monodisperse fluorescent particles to duct surfaces. Deposition at S-connectors, in bends and in straight ducts with developing turbulence was often greater than deposition in straight ducts with fully developed turbulence for equal particle sizes, air speeds and duct surface orientations. Deposition rates at all locations were found to increase with an increase in particle size or air speed. High deposition rates at S-connectors resulted from impaction and these rates were nearly independent of the orientation of the S-connector. Deposition rates in the two 90{sup o} bends differed by more than an order of magnitude in some cases, probably because of the difference in turbulence conditions at the bend inlets. In straight steel ducts where the turbulent flow profile was developing, the deposition enhancement relative to fully developed turbulence generally increased with air speed and decreased with downstream distance from the duct inlet. This enhancement was greater at the duct ceiling and wall than at the duct floor. In insulated ducts, deposition enhancement was less pronounced overall than in steel ducts. Trends that were observed in steel ducts were present, but weaker, in insulated ducts.

  9. Process for thin film deposition of cadmium sulfide

    DOE Patents [OSTI]

    Muruska, H. Paul (East Windsor, NJ); Sansregret, Joseph L. (Scotch Plains, NJ); Young, Archie R. (Montclair, NJ)

    1982-01-01

    The present invention teaches a process for depositing layers of cadmium sulfide. The process includes depositing a layer of cadmium oxide by spray pyrolysis of a cadmium salt in an aqueous or organic solvent. The oxide film is then converted into cadmium sulfide by thermal ion exchange of the O.sup.-2 for S.sup.-2 by annealing the oxide layer in gaseous sulfur at elevated temperatures.

  10. Subenvironments of deposition in San Antonio Bay, Texas 

    E-Print Network [OSTI]

    Hall, Gary Lynn

    1973-01-01

    SUBENVIRONMENTS OF DEPOSITION IN SAN ANTONIO BAY, TEXAS A Thesis by GARY LYNN HALL Submitted to the Graduate College of Texas ASM University in partial fulfillment of the requirement for the degree of MASTER OF SCIENCE December 1973 Major... Subject: Oceanography SUBENVIRONMENTS OF DEPOSITION IN SAN ANTONIO BAY, TEXAS A Thesis by GARY LYNN HALL Approved as to style and content by: hairman o ommi ttee Head of epartme, Mem er Mem e er December 1973 ABSTRACT Subenvironments...

  11. Precursors for the polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey, Thomas M.; Burrell, Anthony K.; Jia, Quanxi; Lin, Yuan

    2013-09-10

    A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  12. apply to program Energy audit and

    E-Print Network [OSTI]

    , the country has the potential to improve the energy performance of one third of its building stock's demand for fossil fuel imports. Improving energy! SAV ING S! Homeowners apply to program Energy audit and retrofit plan Financing though grants

  13. 15.075 Applied Statistics, Spring 2003

    E-Print Network [OSTI]

    Newton, Elizabeth

    This course is an introduction to applied statistics and data analysis. Topics include collecting and exploring data, basic inference, simple and multiple linear regression, analysis of variance, nonparametric methods, and ...

  14. MSc Applied Mathematics Stochastic Operations Research

    E-Print Network [OSTI]

    Boucherie, Richard J.

    MSc Applied Mathematics Stochastic Operations Research Richard Boucherie #12;20150106Stochastic Operations Research #12;Stochastic Operations Research: Team http://www.utwente.nl/ewi/sor/staff/ 20150106Stochastic Operations Research #12;Operations Research: The World http

  15. Applying Ethical Principles to Information and Communication

    E-Print Network [OSTI]

    California at San Diego, University of

    Applying Ethical Principles to Information and Communication Technology Research A Companion Clayman, DHS Science & Technology · John Heidemann, University of California, ISI · Douglas Maughan, DHS Science & Technology · Jenny McNeill, SRI International · Peter Neumann, SRI International · Charlotte

  16. Fluid Bed Combustion Applied to Industrial Waste 

    E-Print Network [OSTI]

    Mullen, J. F.; Sneyd, R. J.

    1985-01-01

    Because of its unique ability to handle a wide variety of liquids and solids in an energy efficient and environmentally acceptable manner, fluid bed combustion is being increasingly applied to the utilization of waste materials and low grade fuels...

  17. A. La Rosa Lecture Notes APPLIED OPTICS

    E-Print Network [OSTI]

    light energy is transmitted from one point to another in an optical system. 2. Classical theoryA. La Rosa Lecture Notes APPLIED OPTICS ________________________________________________________________________ 11.1 Optics in different regimes The electromagnetic spectrum From: http

  18. Applied Fluid Mechanics I) Course goals

    E-Print Network [OSTI]

    Leu, Tzong-Shyng "Jeremy"

    design. #12;2 Textbook " Applied Fluid Mechanics" by Robert L. Mott, Sixth Edition in SI unit 1 Exam 30 Final Exam 30 (Total of 100) (30%)(&10%) () PDF lecture notes if any can be downloaded from

  19. Process maps for plasma spray. Part II: Deposition and properties

    SciTech Connect (OSTI)

    XIANGYANG,JIANG; MATEJICEK,JIRI; KULKARNI,ANAND; HERMAN,HERBERT; SAMPATH,SANJAY; GILMORE,DELWYN L.; NEISER JR.,RICHARD A

    2000-03-28

    This is the second paper of a two part series based on an integrated study carried out at the State University of New York at Stony Brook and Sandia National Laboratories. The goal of the study is the fundamental understanding of the plasma-particle interaction, droplet/substrate interaction, deposit formation dynamics and microstructure development as well as the deposit property. The outcome is science-based relationships, which can be used to link processing to performance. Molybdenum splats and coatings produced at 3 plasma conditions and three substrate temperatures were characterized. It was found that there is a strong mechanical/thermal interaction between droplet and substrate, which builds up the coatings/substrate adhesion. Hardness, thermal conductivity, and modulus increase, while oxygen content and porosity decrease with increasing particle velocity. Increasing deposition temperature resulted in dramatic improvement in coating thermal conductivity and hardness as well as increase in coating oxygen content. Indentation reveals improved fracture resistance for the coatings prepared at higher deposition temperature. Residual stress was significantly affected by deposition temperature, although not significant by particle energy within the investigated parameter range. Coatings prepared at high deposition temperature with high-energy particles suffered considerably less damage in wear tests. Possible mechanisms behind these changes are discussed within the context of relational maps which are under development.

  20. Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes

    DOE Patents [OSTI]

    Tsuo, Simon (Lakewood, CO); Langford, Alison A. (Boulder, CO)

    1989-01-01

    Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate.