National Library of Energy BETA

Sample records for deposition cxs applied

  1. Apply

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Apply Application Process Bringing together top, space science students with internationally recognized researchers at Los Alamos in an educational and collaborative atmosphere. Contacts Director Misa Cowee Email Administrative Assistant Mary Wubbena Email Request more information Email Applications for the 2016 summer school are now closed. Applications were due on February 5, 2016. PLEASE NOTE: After the 2016 session, the program will not be offered again until 2018. Before applying Check your

  2. Applied combustion

    SciTech Connect (OSTI)

    1993-12-31

    From the title, the reader is led to expect a broad practical treatise on combustion and combustion devices. Remarkably, for a book of modest dimension, the author is able to deliver. The text is organized into 12 Chapters, broadly treating three major areas: combustion fundamentals -- introduction (Ch. 1), thermodynamics (Ch. 2), fluid mechanics (Ch. 7), and kinetics (Ch. 8); fuels -- coal, municipal solid waste, and other solid fuels (Ch. 4), liquid (Ch. 5) and gaseous (Ch. 6) fuels; and combustion devices -- fuel cells (Ch. 3), boilers (Ch. 4), Otto (Ch. 10), diesel (Ch. 11), and Wankel (Ch. 10) engines and gas turbines (Ch. 12). Although each topic could warrant a complete text on its own, the author addresses each of these major themes with reasonable thoroughness. Also, the book is well documented with a bibliography, references, a good index, and many helpful tables and appendices. In short, Applied Combustion does admirably fulfill the author`s goal for a wide engineering science introduction to the general subject of combustion.

  3. mhtml:file://H:\CATX\APPROVED-CXS\EERE FOA 1201 - Rankine Cycle

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Eaton Corporation STATE: WI PROJECT TITLE : Affordable Rankine Cycle Waste Heat Recovery for Heavy Duty Trucks Funding Opportunity Announcement Number Procurement Instrument Number NEPA Control Number CID Number DE-FOA-0001201 DE-EE0007286 Based on my review of the information concerning the proposed action, as NEPA Compliance Officer (authorized under DOE Order 451.1A), I have made the following determination: CX, EA, EIS APPENDIX AND NUMBER: Description: B3.6 Small-scale research and

  4. Particle deposition in ventilation ducts

    SciTech Connect (OSTI)

    Sippola, Mark R.

    2002-09-01

    Exposure to airborne particles is detrimental to human health and indoor exposures dominate total exposures for most people. The accidental or intentional release of aerosolized chemical and biological agents within or near a building can lead to exposures of building occupants to hazardous agents and costly building remediation. Particle deposition in heating, ventilation and air-conditioning (HVAC) systems may significantly influence exposures to particles indoors, diminish HVAC performance and lead to secondary pollutant release within buildings. This dissertation advances the understanding of particle behavior in HVAC systems and the fates of indoor particles by means of experiments and modeling. Laboratory experiments were conducted to quantify particle deposition rates in horizontal ventilation ducts using real HVAC materials. Particle deposition experiments were conducted in steel and internally insulated ducts at air speeds typically found in ventilation ducts, 2-9 m/s. Behaviors of monodisperse particles with diameters in the size range 1-16 {micro}m were investigated. Deposition rates were measured in straight ducts with a fully developed turbulent flow profile, straight ducts with a developing turbulent flow profile, in duct bends and at S-connector pieces located at duct junctions. In straight ducts with fully developed turbulence, experiments showed deposition rates to be highest at duct floors, intermediate at duct walls, and lowest at duct ceilings. Deposition rates to a given surface increased with an increase in particle size or air speed. Deposition was much higher in internally insulated ducts than in uninsulated steel ducts. In most cases, deposition in straight ducts with developing turbulence, in duct bends and at S-connectors at duct junctions was higher than in straight ducts with fully developed turbulence. Measured deposition rates were generally higher than predicted by published models. A model incorporating empirical equations based on the experimental measurements was applied to evaluate particle losses in supply and return duct runs. Model results suggest that duct losses are negligible for particle sizes less than 1 {micro}m and complete for particle sizes greater than 50 {micro}m. Deposition to insulated ducts, horizontal duct floors and bends are predicted to control losses in duct systems. When combined with models for HVAC filtration and deposition to indoor surfaces to predict the ultimate fates of particles within buildings, these results suggest that ventilation ducts play only a small role in determining indoor particle concentrations, especially when HVAC filtration is present. However, the measured and modeled particle deposition rates are expected to be important for ventilation system contamination.

  5. Deposition head for laser

    DOE Patents [OSTI]

    Lewis, Gary K. (Los Alamos, NM); Less, Richard M. (Los Alamos, NM)

    1999-01-01

    A deposition head for use as a part of apparatus for forming articles from materials in particulate form in which the materials are melted by a laser beam and deposited at points along a tool path to form an article of the desired shape and dimensions. The deposition head delivers the laser beam and powder to a deposition zone, which is formed at the tip of the deposition head. A controller comprised of a digital computer directs movement of the deposition zone along the tool path and provides control signals to adjust apparatus functions, such as the speed at which the deposition head moves along the tool path.

  6. direct_deposit_111609

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    PROTECT YOUR BANKING INFORMATION: DO NOT complete this form until you are ready to submit it to the Payroll Department. DIRECT DEPOSIT REQUEST Directions: 1. Provide required information neatly, legibly; 2. If Checking Account Direct Deposit, include a voided check. a. DO NOT submit a deposit slip! 3. If Savings Account Direct Deposit, include a copy of savings card. 4. Sign this form; 5. Inter-office mail it to Craft Payroll at "P238." DIRECT DEPOSITION AUTHORIZATION I hereby

  7. How To Apply

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    CSCNSI How To Apply How to Apply for Computer System, Cluster, and Networking Summer Institute Emphasizes practical skills development Contact Leader Stephan Eidenbenz (505)...

  8. CX-007533: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Chemical Vapor Deposition - Based Valence-Mending Passivation for Crystalline-Silicon Solar Cells CX(s) Applied: A9, B3.6 Date: 01102012 Location(s): Arizona Offices(s): Golden ...

  9. CX-009311: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Optimization of Reservoir Storage Capacity in Different Depositional Environments (Champaign) CX(s) Applied: A9 Date: 08/30/2012 Location(s): Illinois Offices(s): National Energy Technology Laboratory

  10. CX-009310: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Optimization of Reservoir Storage Capacity in Different Depositional Environments (Rock Sampling) CX(s) Applied: B3.1 Date: 08/30/2012 Location(s): Multiple Offices(s): National Energy Technology Laboratory

  11. CX-009549: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Vapor Transport Deposition for Thin Film III-V Photovoltaics CX(s) Applied: A9, B3.6 Date: 11/09/2012 Location(s): CX: none Offices(s): Golden Field Office

  12. Applied Research Center

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ARC Privacy and Security Notice Skip over navigation Search the JLab Site Applied Research Center Please upgrade your browser. This site's design is only visible in a graphical browser that supports web standards, but its content is accessible to any browser. Concerns? Applied Research Center ARC Home Consortium News EH&S Reports print version ARC Resources Commercial Tenants ARC Brochure Library Conference Room Applied Research Center Applied Research Center front view Applied Research

  13. Plasma sprayed and electrospark deposited zirconium metal diffusion barrier coatings

    SciTech Connect (OSTI)

    Hollis, Kendall J; Pena, Maria I

    2010-01-01

    Zirconium metal coatings applied by plasma spraying and electrospark deposition (ESD) have been investigated for use as diffusion barrier coatings on low enrichment uranium fuel for research nuclear reactors. The coatings have been applied to both stainless steel as a surrogate and to simulated nuclear fuel uranium-molybdenum alloy substrates. Deposition parameter development accompanied by coating characterization has been performed. The structure of the plasma sprayed coating was shown to vary with transferred arc current during deposition. The structure of ESD coatings was shown to vary with the capacitance of the deposition equipment.

  14. Metal deposition using seed layers

    DOE Patents [OSTI]

    Feng, Hsein-Ping; Chen, Gang; Bo, Yu; Ren, Zhifeng; Chen, Shuo; Poudel, Bed

    2013-11-12

    Methods of forming a conductive metal layers on substrates are disclosed which employ a seed layer to enhance bonding, especially to smooth, low-roughness or hydrophobic substrates. In one aspect of the invention, the seed layer can be formed by applying nanoparticles onto a surface of the substrate; and the metallization is achieved by electroplating an electrically conducting metal onto the seed layer, whereby the nanoparticles serve as nucleation sites for metal deposition. In another approach, the seed layer can be formed by a self-assembling linker material, such as a sulfur-containing silane material.

  15. Solution deposition assembly

    DOE Patents [OSTI]

    Roussillon, Yann; Scholz, Jeremy H; Shelton, Addison; Green, Geoff T; Utthachoo, Piyaphant

    2014-01-21

    Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber, at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.

  16. Applied Energy Programs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Applied Energy Programs Applied Energy Programs Los Alamos is using its world-class scientific capabilities to enhance national energy security by developing energy sources with limited environmental impact and by improving the efficiency and reliability of the energy infrastructure. CONTACT US Program Director Melissa Fox (505) 665-0896 Email Applied Energy Program Office serves as the hub connecting the Laboratory's scientific and technical resources to DOE sponsors, DoD programs, and to

  17. Applied & Computational Math

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    & Computational Math - Sandia Energy Energy Search Icon Sandia Home Locations Contact Us ... Twitter Google + Vimeo GovDelivery SlideShare Applied & Computational Math HomeEnergy ...

  18. Applied Math & Software

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Math & Software - Sandia Energy Energy Search Icon Sandia Home Locations Contact Us ... Twitter Google + Vimeo GovDelivery SlideShare Applied Math & Software HomeTransportation ...

  19. MACCS2/Deposition Velocity Workshop | Department of Energy

    Office of Environmental Management (EM)

    MACCS2/Deposition Velocity Workshop MACCS2/Deposition Velocity Workshop The Department of Energy's Chief of Nuclear Safety hosted a MACCS2/Deposition Velocity Workshop on June 5-6, 2012, in Germantown, Maryland. Approximately 70 participants attended. The purpose of the workshop was to: Discuss MACCS2 and atmospheric dispersion models as applied to DOE consequence analysis. Discuss implementation of HSS Safety Bulletin 2011-2, Accident Analysis Parameter Update, at field sites. Develop a

  20. Cathodic Arc Plasma Deposition

    Office of Scientific and Technical Information (OSTI)

    ... 1990. 3 H. C. Miller, "A review of anode phenomena in vacuum arcs," IEEE Trans. ... pp. 49-55, 1877. 7 R. L. Boxman, "Early history of vacuum arc deposition," IEEE Trans. ...

  1. Perspectives on Deposition Velocity

    Office of Environmental Management (EM)

    Deposition Velocity ... Going down the rabbit hole to explain that sinking feeling Brian DiNunno, Ph.D. Project Enhancement Corporation June 6 th , 2012 Discussion Framework  Development of the HSS Deposition Velocity Safety Bulletin  Broader discussion of appropriate conservatism within dispersion modeling and DOE-STD-3009 DOE-STD-3009 Dose Comparison "General discussion is provided for source term calculation and dose estimation, as well as prescriptive guidance for the latter. The

  2. How To Apply

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    How To Apply How to Apply for Computer System, Cluster, and Networking Summer Institute Emphasizes practical skills development Contacts Program Lead Carolyn Connor (505) 665-9891 Email Professional Staff Assistant Nickole Aguilar Garcia (505) 665-3048 Email The 2016 application process will commence January 5 through February 13, 2016. Applicants must be U.S. citizens. Required Materials Current resume Official university transcript (with Spring courses posted and/or a copy of Spring 2016

  3. Germanium films by polymer-assisted deposition (Patent) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    Title: Germanium films by polymer-assisted deposition Highly ordered Ge films are prepared directly on single crystal Si substrates by applying an aqueous coating solution having ...

  4. Hydrocarbon and Deposit Morphology Effects on EGR Cooler Deposit Stability

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    and Removal | Department of Energy and Deposit Morphology Effects on EGR Cooler Deposit Stability and Removal Hydrocarbon and Deposit Morphology Effects on EGR Cooler Deposit Stability and Removal This paper reports on studies carried out at ORNL to examine the shear force required to remove particles from a well-developed EGR cooler deposit. PDF icon deer11_sluder.pdf More Documents & Publications Fuel Effects on Emissions Control Technologies Materials Issues Associated with EGR

  5. Apply for Beamtime

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Apply for Beamtime Apply for Beamtime Print Friday, 28 August 2009 13:23 Available Beamlines Determine which ALS beamlines are suitable for your experiment. To do this, you can review the ALS Beamlines Directory, contact the appropriate beamline scientist listed on the Directory, and/or contact the This e-mail address is being protected from spambots. You need JavaScript enabled to view it . Log In to the ALSHub user portal ALSHub Login For More Information About the Types of Proposals To learn

  6. Applied Science/Techniques

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Applied Science/Techniques Applied Science/Techniques Print The ALS is an excellent incubator of new scientific techniques and instrumentation. Many of the technical advances that make the ALS a world-class soft x-ray facility are developed at the ALS itself. The optical components in use at the ALS-mirrors and lenses optimized for x-ray wavelengths-require incredibly high-precision surfaces and patterns (often formed through extreme ultraviolet lithography at the ALS) and must undergo rigorous

  7. Apparatus and method for selective area deposition of thin films on electrically biased substrates

    DOE Patents [OSTI]

    Zuhr, R.A.; Haynes, T.E.; Golanski, A.

    1999-06-08

    An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repels the ionized particles. 3 figs.

  8. Apparatus and method for selective area deposition of thin films on electrically biased substrates

    DOE Patents [OSTI]

    Zuhr, Raymond A. (Oak Ridge, TN); Haynes, Tony E. (Knoxville, TN); Golanski, Andrzej (Le Cheylas, FR)

    1999-01-01

    An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

  9. Apparatus and method for selective area deposition of thin films on electrically biased substrates

    DOE Patents [OSTI]

    Zuhr, Raymond A. (Oak Ridge, TN); Haynes, Tony E. (Knoxville, TN); Golanski, Andrzej (Cheylas, FR)

    1994-01-01

    An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

  10. Information Science, Computing, Applied Math

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Capabilities Information Science, Computing, Applied Math science-innovationassetsimagesicon-science.jpg Information Science, Computing, Applied Math National security ...

  11. Apply for Technical Assistance

    Office of Environmental Management (EM)

    Apply for Technical Assistance Use this online form to request technical assistance from the DOE Offce of Indian Energy for planning and implementing energy projects on tribal lands. To help us determine whether your request fts within the program's scope and can be addressed with available resources, please provide the information below and then click on "Submit Request." Only requests from federally recognized Indian Tribes, bands, nations, tribal energy resource develop- ment

  12. Applied Computer Science

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ADTSC » CCS » CCS-7 Applied Computer Science Innovative co-design of applications, algorithms, and architectures in order to enable scientific simulations at extreme scale Leadership Group Leader Linn Collins Email Deputy Group Leader (Acting) Bryan Lally Email Climate modeling visualization Results from a climate simulation computed using the Model for Prediction Across Scales (MPAS) code. This visualization shows the temperature of ocean currents using a green and blue color scale. These

  13. Applied Modern Physics

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    1 Applied Modern Physics From the first bionic eye to airport scanners that detect liquid explosives, our expertise in developing advanced diagnostics results in real-world innovations. Contact Us Group Leader (acting) Larry Schultz Email Deputy Group Leader John George Email Group Office (505) 665-2545 QkarD Quantum key distribution technology could ensure truly secure commerce, banking, communications and data transfer. Read more... A history of excellence in the development and use of

  14. Apply for Beamtime

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Apply for Beamtime Print Available Beamlines Determine which ALS beamlines are suitable for your experiment. To do this, you can review the ALS Beamlines Directory, contact the appropriate beamline scientist listed on the Directory, and/or contact the This e-mail address is being protected from spambots. You need JavaScript enabled to view it . Log In to the ALSHub user portal ALSHub Login For More Information About the Types of Proposals To learn more about the three different types of

  15. Applied Science/Techniques

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Applied Science/Techniques Print The ALS is an excellent incubator of new scientific techniques and instrumentation. Many of the technical advances that make the ALS a world-class soft x-ray facility are developed at the ALS itself. The optical components in use at the ALS-mirrors and lenses optimized for x-ray wavelengths-require incredibly high-precision surfaces and patterns (often formed through extreme ultraviolet lithography at the ALS) and must undergo rigorous calibration and testing

  16. Apply for Beamtime

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Apply for Beamtime Print Available Beamlines Determine which ALS beamlines are suitable for your experiment. To do this, you can review the ALS Beamlines Directory, contact the appropriate beamline scientist listed on the Directory, and/or contact the This e-mail address is being protected from spambots. You need JavaScript enabled to view it . Log In to the ALSHub user portal ALSHub Login For More Information About the Types of Proposals To learn more about the three different types of

  17. Underpotential deposition-mediated layer-by-layer growth of thin films

    DOE Patents [OSTI]

    Wang, Jia Xu; Adzic, Radoslav R.

    2015-05-19

    A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves the use of underpotential deposition of a first element to mediate the growth of a second material by overpotential deposition. Deposition occurs between a potential positive to the bulk deposition potential for the mediating element where a full monolayer of mediating element forms, and a potential which is less than, or only slightly greater than, the bulk deposition potential of the material to be deposited. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis. This process is especially suitable for the formation of a catalytically active layer on core-shell particles for use in energy conversion devices such as fuel cells.

  18. Payroll Check Direct Deposit Authorization

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Payroll Check Direct Deposit Authorization (for LANS non-craft salary & wage payments only) Note: Direct Deposit authorizations are available through Oracle LANL Worker Self Service with A-Level access. Limit 5 Direct Deposit authorization accounts per employee Financial Institution Name: Routing/Transit Number: (requires nine digits) Account Number: Type of Account (check one): Checking Savings A separate form is required for each account transaction. Type of Transacton Deposit Type (check

  19. ORISE: Applied health physics projects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Applied health physics projects The Oak Ridge Institute for Science and Education (ORISE) provides applied health physics services to government agencies needing technical support ...

  20. Microstructural Evolution of EGR Cooler Deposits | Department...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Evolution of EGR Cooler Deposits Microstructural Evolution of EGR Cooler Deposits Characterize the thermo-physical properties of the deposit under different operating conditions on ...

  1. Multi-chamber deposition system

    DOE Patents [OSTI]

    Jacobson, Richard L.; Jeffrey, Frank R.; Westerberg, Roger K.

    1989-06-27

    A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

  2. Multi-chamber deposition system

    DOE Patents [OSTI]

    Jacobson, Richard L.; Jeffrey, Frank R.; Westerberg, Roger K.

    1989-10-17

    A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

  3. Deposition System Controller

    Energy Science and Technology Software Center (OSTI)

    2005-10-01

    This software is a complete thin film deposition controller. The software takes as its input a script file that dictates enablinig/disabling of sputtering power supplies, pause times, velocities and distances to move a substrate. An emulator has been created and built into the software package that can debug in advance any deposition script and decide if there is an overrun condition, accidental infinite look, and can estimate a time for completion. All necessary process variablesmore » are data logged and recorded for later inspection. This emulator currently interfaces to a Parker-Compumotor SX6 stepper moror indexer, but the software is written in such a way that it is easily modifiable for interface to othe brand and models of motor drivers. Other process I/O variables may be easily added. The software uses any multifunction DAQ card from National Instruments via their free NIDAQ API package, but again, the software is written such that othe brand DAQ cards may be used.« less

  4. Process for depositing Cr-bearing layer

    DOE Patents [OSTI]

    Ellis, Timothy W. (Ames, IA); Lograsso, Thomas A. (Ames, IA); Eshelman, Mark A. (Kentwood, MI)

    1995-05-09

    A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate.

  5. Process for depositing Cr-bearing layer

    DOE Patents [OSTI]

    Ellis, T.W.; Lograsso, T.A.; Eshelman, M.A.

    1995-05-09

    A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate. 7 figs.

  6. Direct Deposit Form | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Direct Deposit Form Direct Deposit Form PDF icon Direct Deposit Form More Documents & Publications Employee In-Processing Forms Agreement for Minority Financial Institutions Participation in the Bank Deposit Financial Assistance Program Financial Management Handbook

  7. Momentum Deposition in Curvilinear Coordinates

    SciTech Connect (OSTI)

    Cleveland, Mathew Allen; Lowrie, Robert Byron; Rockefeller, Gabriel M.; Thompson, Kelly Glen; Wollaber, Allan Benton

    2015-08-03

    The momentum imparted into a material by thermal radiation deposition is an important physical process in astrophysics and inertial confinement fusion (ICF) simulations. In recent work we presented a new method of evaluating momentum deposition that relies on the combination of a time-averaged approximation and a numerical integration scheme. This approach robustly and efficiently evaluates the momentum deposition in spherical geometry. Future work will look to extend this approach to 2D cylindrical geometries.

  8. Success Story: Chrome Deposit Corporation

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    continued > Success Story: Chrome Deposit Corporation Despite Growth, Chrome Deposit Corporation Reduces Its Energy Use, Minimizes Its Environmental Impact, and Improves Its Energy- Management Practices Tucked away in a nondescript industrial park off the I-95 corridor, Chrome Deposit Corporation's (CDC's) Newark, Delaware, manufacturing facility is a small site that is making big changes. The Delaware Manufacturing Extension Partnership (DEMEP)-a nonproft resource organization that provides

  9. Carbonate Deposition | Open Energy Information

    Open Energy Info (EERE)

    Alteration Products Carbonate deposits come in many forms and sometimes develop into spectacular colorful terraces such as these at Mammoth Hot Springs in Yellowstone National...

  10. COAL-FIRED UTILITY BOILERS: SOLVING ASH DEPOSITION PROBLEMS

    SciTech Connect (OSTI)

    Christopher J. Zygarlicke; Donald P. McCollor; Steven A. Benson; Jay R. Gunderson

    2001-04-01

    The accumulation of slagging and fouling ash deposits in utility boilers has been a source of aggravation for coal-fired boiler operators for over a century. Many new developments in analytical, modeling, and combustion testing methods in the past 20 years have made it possible to identify root causes of ash deposition. A concise and comprehensive guidelines document has been assembled for solving ash deposition as related to coal-fired utility boilers. While this report accurately captures the current state of knowledge in ash deposition, note that substantial research and development is under way to more completely understand and mitigate slagging and fouling. Thus, while comprehensive, this document carries the title ''interim,'' with the idea that future work will provide additional insight. Primary target audiences include utility operators and engineers who face plant inefficiencies and significant operational and maintenance costs that are associated with ash deposition problems. Pulverized and cyclone-fired coal boilers are addressed specifically, although many of the diagnostics and solutions apply to other boiler types. Logic diagrams, ash deposit types, and boiler symptoms of ash deposition are used to aid the user in identifying an ash deposition problem, diagnosing and verifying root causes, determining remedial measures to alleviate or eliminate the problem, and then monitoring the situation to verify that the problem has been solved. In addition to a step-by-step method for identifying and remediating ash deposition problems, this guideline document (Appendix A) provides descriptions of analytical techniques for diagnostic testing and gives extensive fundamental and practical literature references and addresses of organizations that can provide help in alleviating ash deposition problems.

  11. Applied Optoelectronics | Open Energy Information

    Open Energy Info (EERE)

    optical semiconductor devices, packaged optical components, optical subsystems, laser transmitters, and fiber optic transceivers. References: Applied Optoelectronics1...

  12. Variable temperature semiconductor film deposition

    DOE Patents [OSTI]

    Li, X.; Sheldon, P.

    1998-01-27

    A method of depositing a semiconductor material on a substrate is disclosed. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  13. Variable temperature semiconductor film deposition

    DOE Patents [OSTI]

    Li, Xiaonan (Golden, CO); Sheldon, Peter (Lakewood, CO)

    1998-01-01

    A method of depositing a semiconductor material on a substrate. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  14. Apply

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Unofficial transcripts are acceptable. If transcripts are not in English, provide a translation. If grades are not in the U.S.-traditional lettered (A,B,C), or GPA (out of 4.0)...

  15. Near-infrared radiation curable multilayer coating systems and methods for applying same

    DOE Patents [OSTI]

    Bowman, Mark P; Verdun, Shelley D; Post, Gordon L

    2015-04-28

    Multilayer coating systems, methods of applying and related substrates are disclosed. The coating system may comprise a first coating comprising a near-IR absorber, and a second coating deposited on a least a portion of the first coating. Methods of applying a multilayer coating composition to a substrate may comprise applying a first coating comprising a near-IR absorber, applying a second coating over at least a portion of the first coating and curing the coating with near infrared radiation.

  16. Mathematical modeling of silica deposition in Tongonan-I reinjection wells, Philippines

    SciTech Connect (OSTI)

    Malate, R.C.M.; O`Sullivan, M.J.

    1993-10-01

    Mathematical models of silica deposition are derived using the method of characteristics for the problem of variable rate injection into a well producing radially symmetric flow. Solutions are developed using the first order rate equation of silica deposition suggested by Rimstidt and Barnes (1980). The changes in porosity and permeability resulting from deposition are included in the models. The models developed are successfully applied in simulating the changes in injection capacity in some of the reinjection wells in Tongonan geothermal field, Philippines.

  17. Hydrocarbon and Deposit Morphology Effects on EGR Cooler Deposit...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    reports on studies carried out at ORNL to examine the shear force required to remove particles from a well-developed EGR cooler deposit. PDF icon deer11sluder.pdf More Documents...

  18. Applied Materials | Open Energy Information

    Open Energy Info (EERE)

    Jump to: navigation, search Name: Applied Materials Address: 3050 Bowers Avenue Place: Santa Clara, California Zip: 95054 Sector: Solar Website: www.appliedmaterials.com...

  19. Sandia Energy - Applied Turbulent Combustion

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    submodels that bridge fundamental energy sciences with applied device engineering and optimization. Turbulent-combustion-lab1-300x218 Complementary burner facilities with...

  20. Success Story: Chrome Deposit Corporation

    Broader source: Energy.gov [DOE]

    This case study describes how Chrome Deposit Corporation was able to reduce plant-wide energy use, minimize its environmental impact, and improve energy management practices amidst ongoing growth.

  1. Process for applying control variables having fractal structures

    DOE Patents [OSTI]

    Bullock, J.S. IV; Lawson, R.L.

    1996-01-23

    A process and apparatus are disclosed for the application of a control variable having a fractal structure to a body or process. The process of the present invention comprises the steps of generating a control variable having a fractal structure and applying the control variable to a body or process reacting in accordance with the control variable. The process is applicable to electroforming where first, second and successive pulsed-currents are applied to cause the deposition of material onto a substrate, such that the first pulsed-current, the second pulsed-current, and successive pulsed currents form a fractal pulsed-current waveform. 3 figs.

  2. Process for applying control variables having fractal structures

    DOE Patents [OSTI]

    Bullock, IV, Jonathan S. (Oak Ridge, TN); Lawson, Roger L. (Oliver Springs, TN)

    1996-01-01

    A process and apparatus for the application of a control variable having a fractal structure to a body or process. The process of the present invention comprises the steps of generating a control variable having a fractal structure and applying the control variable to a body or process reacting in accordance with the control variable. The process is applicable to electroforming where first, second and successive pulsed-currents are applied to cause the deposition of material onto a substrate, such that the first pulsed-current, the second pulsed-current, and successive pulsed currents form a fractal pulsed-current waveform.

  3. Chemical enhancement of surface deposition

    DOE Patents [OSTI]

    Patch, K.D.; Morgan, D.T.

    1997-07-29

    A method and apparatus are disclosed for increasing the deposition of ions onto a surface, such as the adsorption of uranium ions on the detecting surface of a radionuclide detector. The method includes the step of exposing the surface to a complexing agent, such as a phosphate ion solution, which has an affinity for the dissolved species to be deposited on the surface. This provides, for example, enhanced sensitivity of the radionuclide detector. 16 figs.

  4. Vapor deposition of hardened niobium

    DOE Patents [OSTI]

    Blocher, Jr., John M.; Veigel, Neil D.; Landrigan, Richard B.

    1983-04-19

    A method of coating ceramic nuclear fuel particles containing a major amount of an actinide ceramic in which the particles are placed in a fluidized bed maintained at ca. 800.degree. to ca. 900.degree. C., and niobium pentachloride vapor and carbon tetrachloride vapor are led into the bed, whereby niobium metal is deposited on the particles and carbon is deposited interstitially within the niobium. Coating apparatus used in the method is also disclosed.

  5. Chemical enhancement of surface deposition

    DOE Patents [OSTI]

    Patch, Keith D. (Lexington, MA); Morgan, Dean T. (Sudbury, MA)

    1997-07-29

    A method and apparatus for increasing the deposition of ions onto a surface, such as the adsorption of uranium ions on the detecting surface of a radionuclide detector. The method includes the step of exposing the surface to a complexing agent, such as a phosphate ion solution, which has an affinity for the dissolved species to be deposited on the surface. This provides, for example, enhanced sensitivity of the radionuclide detector.

  6. A x-ray radiography-densitometry technique for the quantitative determination of metal deposit profiles

    SciTech Connect (OSTI)

    Will, F.G.; Iacovangelo, C.D.

    1984-03-01

    The application of x-ray radiography in conjunction with high resolution optical densitometry for the quantitative determination of metal deposit profiles parallel and perpendicular to the substrate surface is described. The principles of the technique and the range of its applicability are discussed. The technique is applied to the study of zinc deposition on highly porous carbon foams from circulating aqueous zinc bromide solutions. The effect of substrate pore size on the zinc distribution is explored. Zinc is found to deposit predominantly on the porous substrate/electrolyte and substrate/current collector interfaces. Smaller pore size favors smoother and more uniform deposits throughout the substrate.

  7. Applied Sedimentology | Open Energy Information

    Open Energy Info (EERE)

    Sedimentology Jump to: navigation, search OpenEI Reference LibraryAdd to library Book: Applied Sedimentology Author R.C. Salley Published Academic Press, 2000 DOI Not Provided...

  8. ORISE: Applied health physics projects

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Applied health physics projects The Oak Ridge Institute for Science and Education (ORISE) provides applied health physics services to government agencies needing technical support for decommissioning projects. Whether the need is assistance with the development of technical basis documents or advice on how to identify, measure and assess the presence of radiological materials, ORISE can help determine the best course for an environmental cleanup project. Our key areas of expertise include fuel

  9. Information Science, Computing, Applied Math

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Capabilities » Information Science, Computing, Applied Math /science-innovation/_assets/images/icon-science.jpg Information Science, Computing, Applied Math National security depends on science and technology. The United States relies on Los Alamos National Laboratory for the best of both. No place on Earth pursues a broader array of world-class scientific endeavors. Computer, Computational, and Statistical Sciences (CCS)» High Performance Computing (HPC)» Extreme Scale Computing, Co-design»

  10. Low Speed Carbon Deposition Process for Hermetic Optical Fibers

    SciTech Connect (OSTI)

    ABRAMCZYK,JAROSLAW; ARTHUR,SARA E. TALLANT,DAVID R.; HIKANSSON,ADAM S.; LINDHOLM,ERIC A.; LO,JIE

    1999-09-29

    For optical fibers used in adverse environments, a carbon coating is frequently deposited on the fiber surface to prevent water and hydrogen ingression that lead respectively to strength degradation through fatigue and hydrogen-induced attenuation. The deposition of a hermetic carbon coating onto an optical fiber during the draw process holds a particular challenge when thermally-cured specialty coatings are subsequently applied because of the slower drawing rate. In this paper, we report on our efforts to improve the low-speed carbon deposition process by altering the composition and concentration of hydrocarbon precursor gases. The resulting carbon layers have been analyzed for electrical resistance, Raman spectra, coating thickness, and surface roughness, then compared to strength data and dynamic fatigue behavior.

  11. TULSA UNIVERSITY PARAFFIN DEPOSITION PROJECTS

    SciTech Connect (OSTI)

    Cem Sarica; Michael Volk

    2004-06-01

    As oil and gas production moves to deeper and colder water, subsea multiphase production systems become critical for economic feasibility. It will also become increasingly imperative to adequately identify the conditions for paraffin precipitation and predict paraffin deposition rates to optimize the design and operation of these multi-phase production systems. Although several oil companies have paraffin deposition predictive capabilities for single-phase oil flow, these predictive capabilities are not suitable for the multiphase flow conditions encountered in most flowlines and wellbores. For deepwater applications in the Gulf of Mexico, it is likely that multiphase production streams consisting of crude oil, produced water and gas will be transported in a single multiphase pipeline to minimize capital cost and complexity at the mudline. Existing single-phase (crude oil) paraffin deposition predictive tools are clearly inadequate to accurately design these pipelines, because they do not account for the second and third phases, namely, produced water and gas. The objective of this program is to utilize the current test facilities at The University of Tulsa, as well as member company expertise, to accomplish the following: enhance our understanding of paraffin deposition in single and two-phase (gas-oil) flows; conduct focused experiments to better understand various aspects of deposition physics; and, utilize knowledge gained from experimental modeling studies to enhance the computer programs developed in the previous JIP for predicting paraffin deposition in single and two-phase flow environments. These refined computer models will then be tested against field data from member company pipelines.

  12. Vapor deposition of thin films

    SciTech Connect (OSTI)

    Smith, D.C.; Pattillo, S.G.; Laia, J.R. Jr.; Sattelberger, A.P.

    1990-10-05

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl){sub 3}, iridium(allyl){sub 3}, molybdenum(allyl){sub 4}, tungsten(allyl){sub 4}, rhenium (allyl){sub 4}, platinum(allyl){sub 2}, or palladium(allyl){sub 2} are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  13. Vapor deposition of thin films

    DOE Patents [OSTI]

    Smith, David C. (Los Alamos, NM); Pattillo, Stevan G. (Los Alamos, NM); Laia, Jr., Joseph R. (Los Alamos, NM); Sattelberger, Alfred P. (Los Alamos, NM)

    1992-01-01

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  14. Fluidized bed deposition of diamond

    DOE Patents [OSTI]

    Laia, Jr., Joseph R. (Los Alamos, NM); Carroll, David W. (Los Alamos, NM); Trkula, Mitchell (Los Alamos, NM); Anderson, Wallace E. (Los Alamos, NM); Valone, Steven M. (Santa Fe, NM)

    1998-01-01

    A process for coating a substrate with diamond or diamond-like material including maintaining a substrate within a bed of particles capable of being fluidized, the particles having substantially uniform dimensions and the substrate characterized as having different dimensions than the bed particles, fluidizing the bed of particles, and depositing a coating of diamond or diamond-like material upon the substrate by chemical vapor deposition of a carbon-containing precursor gas mixture, the precursor gas mixture introduced into the fluidized bed under conditions resulting in excitation mechanisms sufficient to form the diamond coating.

  15. Vacuum vapor deposition gun assembly

    DOE Patents [OSTI]

    Zeren, Joseph D. (Boulder, CO)

    1985-01-01

    A vapor deposition gun assembly includes a hollow body having a cylindrical outer surface and an end plate for holding an adjustable heat sink, a hot hollow cathode gun, two magnets for steering the plasma from the gun into a crucible on the heat sink, and a shutter for selectively covering and uncovering the crucible.

  16. Summer of Applied Geophysical Experience

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summer of Applied Geophysical Experience (SAGE) 2016 - Our 34 rd Year! SAGE is a 3-4 week research and education program in exploration geophysics for graduate, undergraduate students, and working professionals based in Santa Fe, NM, U.S.A. Application deadline March 27, 2016, 5:00pm MDT SAGE students, faculty, teaching assistants, and visiting scientists acquire, process and interpret reflection/refraction seismic, magnetotelluric (MT)/electromagnetic (EM), ground penetrating radar (GPR),

  17. Applied Films Corporation | Open Energy Information

    Open Energy Info (EERE)

    Place: Longmont, Colorado Zip: 80504 Sector: Services, Solar Product: Provider of thin film deposition equipment and services, particularly to the solar industry....

  18. Deposition

    National Nuclear Security Administration (NNSA)

    ... I think we're probably going to wind 21 up doing it certainly with two out of the three. ... to you of 3 nuclear technology is under consideration by the 4 Secretary of Energy. ...

  19. Deposition

    National Nuclear Security Administration (NNSA)

    Reporting Company 866.488.DEPO www.CapitalReportingCompany.com 1 DEPARTMENT OF ENERGY 1 2 PROPOSED CHANGES FOR DOE PART 810 3 ASSISTANCE TO FOREIGN NUCLEAR ACTIVITIES 4 5 NNSA - SNOPR ROLLOUT MEETING 6 7 Department of Energy 8 1000 Independence Avenue, S.W. 9 Forrestal Building 10 Washington, D.C. 11 12 13 Monday, August 5, 2013 14 1:00 p.m. 15 16 17 18 19 Reported by: Natalia Thomas, 20 Capital Reporting Company 21 22 Capital Reporting Company 866.488.DEPO www.CapitalReportingCompany.com 2 A P

  20. DOE Workshop - Deposition Velocity Status

    Office of Environmental Management (EM)

    Safely Delivering DOE's Vision for the East Tennessee Technology Park Mission Safely Delivering the Department of Energy's Vision for the East Tennessee Technology Park Mission DOE Workshop Deposition Velocity Status Mike Hitchler, Manager Nuclear Facility Safety June 5, 2012 Safely Delivering DOE's Vision for the East Tennessee Technology Park Mission Existing UCOR Analyses * UCOR facilities at East Tennessee Technology Park (ETTP) and Oak Ridge National Laboratory (ORNL) use various plume

  1. Zinc deposition in acid electrolytes

    SciTech Connect (OSTI)

    McBreen, J.; Gannon, E.

    1981-01-01

    In the past decade, two aqueous zinc/halogen batteries, the zinc/chlorine, and the zinc/bromine systems, have been considered for load-leveling and vehicular applications. Even though considerable progress has been made in engineering these batteries, several problems related to the zinc electrode have yet to be solved. These are related to the growth of dendritic zinc and a maldistribution of the zinc deposit that can occur during cycling. Both problems are exacerbated by recharge of the battery after partial discharge of the zinc deposit. A survey of the literature indicates that a more desireable zinc morphology can be achieved by use of inorganic additives, fluorinated surfactants, and A-C modulation of the charging current. In this investigation, the deposition of zinc from zinc bromide and zinc chloride electrolytes was investigated under conditions that precluded dendrite growth. The techniques used were cyclic voltammetry, the potential step technique and scanning electron microscopy. The variables investigated were the substrate (zinc and dense graphite), electrolyte pH, inorganic additives (Pb/sup + +/ and Bi/sup 3 +/) and A-V modulation of the charging potential by superimposed square waves.

  2. International combustion engines; Applied thermosciences

    SciTech Connect (OSTI)

    Ferguson, C.R.

    1985-01-01

    Focusing on thermodynamic analysis - from the requisite first law to more sophisticated applications - and engine design, this book is an introduction to internal combustion engines and their mechanics. It covers the many types of internal combustion engines, including spark ignition, compression ignition, and stratified charge engines, and examines processes, keeping equations of state simple by assuming constant specific heats. Equations are limited to heat engines and later applied to combustion engines. Topics include realistic equations of state, stroichiometry, predictions of chemical equilibrium, engine performance criteria, and friction, which is discussed in terms of the hydrodynamic theory of lubrication and experimental methods such as dimensional analysis.

  3. Crediting Tritium Deposition in Accident Analysis

    SciTech Connect (OSTI)

    Murphy, C.E. Jr.

    2001-06-20

    This paper describes the major aspects of tritium dispersion phenomenology, summarizes deposition attributes of the computer models used in the DOE Complex for tritium dispersion, and recommends an approach to account for deposition in accident analysis.

  4. EGR Cooler Deposit Analysis | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Deposit Analysis EGR Cooler Deposit Analysis Analysis of fouling and performance of exhaust gas recirculation (EGR) coolers as a function of EGR flow rate, inlet gas and coolant temperatures, soot level, and hydrocarbon concentration PDF icon deer11_lance.pdf More Documents & Publications Materials Issues Associated with EGR Systems (Agreement ID:18571) Microstructural Evolution of EGR Cooler Deposits Characterization of Field-Aged Exhaust Gas Recirculation Cooler Deposits

  5. CX-008829: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Proliferation Detection Research for Discovery and Development of Process for Deposition of Pure, Stoichiometric and Conformal Films of Magnesium Diboride at Harvard University CX(s) Applied: A9, A11, B3.6 Date: 08/06/2012 Location(s): Massachusetts Offices(s): NNSA-Defense Science University Programs

  6. Deposition of biological aerosols on HVAC heat exchangers

    SciTech Connect (OSTI)

    Siegel, Jeffrey; Walker, Ian

    2001-09-01

    Many biologically active materials are transported as bioaerosols 1-10 {micro}m in diameter. These particles can deposit on cooling and heating coils and lead to serious indoor air quality problems. This paper investigates several of the mechanisms that lead to aerosol deposition on fin and tube heat exchangers. A model has been developed that incorporates the effects of several deposition mechanisms, including impaction, Brownian and turbulent diffusion, turbophoresis, thermophoresis, diffusiophoresis, and gravitational settling. The model is applied to a typical range of air velocities that are found in commercial and residential HVAC systems 1 - 6 m/s (200 - 1200 ft/min), particle diameters from 1 - 8 {micro}m, and fin spacings from 3.2 - 7.9 fins/cm (8 - 16 fins/inch or FPI). The results from the model are compared to results from an experimental apparatus that directly measures deposition on a 4.7 fins/cm (12 FPI) coil. The model agrees reasonably well with this measured data and suggests that cooling coils are an important sink for biological aerosols and consequently a potential source of indoor air quality problems.

  7. Ion beam assisted deposition of thermal barrier coatings

    DOE Patents [OSTI]

    Youchison, Dennis L. (Albuquerque, NM); McDonald, Jimmie M. (Albuquerque, NM); Lutz, Thomas J. (Albuquerque, NM); Gallis, Michail A. (Albuquerque, NM)

    2010-11-23

    Methods and apparatus for depositing thermal barrier coatings on gas turbine blades and vanes using Electron Beam Physical Vapor Deposition (EBPVD) combined with Ion Beam Assisted Deposition (IBAD).

  8. Chemical vapor deposition of epitaxial silicon

    DOE Patents [OSTI]

    Berkman, Samuel (Florham Park, NJ)

    1984-01-01

    A single chamber continuous chemical vapor deposition (CVD) reactor is described for depositing continuously on flat substrates, for example, epitaxial layers of semiconductor materials. The single chamber reactor is formed into three separate zones by baffles or tubes carrying chemical source material and a carrier gas in one gas stream and hydrogen gas in the other stream without interaction while the wafers are heated to deposition temperature. Diffusion of the two gas streams on heated wafers effects the epitaxial deposition in the intermediate zone and the wafers are cooled in the final zone by coolant gases. A CVD reactor for batch processing is also described embodying the deposition principles of the continuous reactor.

  9. Chemical vapor deposition of sialon

    DOE Patents [OSTI]

    Landingham, Richard L. (Livermore, CA); Casey, Alton W. (Livermore, CA)

    1982-01-01

    A laminated composite and a method for forming the composite by chemical vapor deposition. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200.degree. C.; and impinging a gas containing in a flowing atmosphere of air N.sub.2, SiCl.sub.4, and AlCl.sub.3 on the surface.

  10. Applied Materials Wind Turbine | Open Energy Information

    Open Energy Info (EERE)

    Wind Turbine Jump to: navigation, search Name Applied Materials Wind Turbine Facility Applied Materials Sector Wind energy Facility Type Community Wind Facility Status In Service...

  11. Building America Expert Meeting: Recommendations for Applying...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Recommendations for Applying Water Heaters in Combination Space and Domestic Water Heating Systems Building America Expert Meeting: Recommendations for Applying Water Heaters in ...

  12. Applied Ventures LLC | Open Energy Information

    Open Energy Info (EERE)

    Applied Ventures LLC Name: Applied Ventures LLC Address: 3050 Bowers Avenue Place: Santa Clara, California Zip: 95054 Region: Southern CA Area Product: Venture capital. Number...

  13. Applied Intellectual Capital AIC | Open Energy Information

    Open Energy Info (EERE)

    Intellectual Capital AIC Jump to: navigation, search Name: Applied Intellectual Capital (AIC) Place: California Zip: 94501-1010 Product: Applied Intellectual Capital (AIC) was...

  14. Apparatus and process for deposition of hard carbon films

    DOE Patents [OSTI]

    Nyaiesh, Ali R. (Menlo Park, CA); Garwin, Edward L. (Los Altos, CA)

    1989-01-01

    A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.

  15. Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

    SciTech Connect (OSTI)

    Mackus, A. J. M.; Sanden, M. C. M. van de; Kessels, W. M. M.; Mulders, J. J. L.

    2010-06-15

    An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions.

  16. Modeling particle deposition on HVAC heat exchangers

    SciTech Connect (OSTI)

    Siegel, J.A.; Nazaroff, W.W.

    2002-01-01

    Fouling of fin-and-tube heat exchangers by particle deposition leads to diminished effectiveness in supplying ventilation and air conditioning. This paper explores mechanisms that cause particle deposition on heat exchanger surfaces. We present a model that accounts for impaction, diffusion, gravitational settling, and turbulence. Simulation results suggest that some submicron particles deposit in the heat exchanger core, but do not cause significant performance impacts. Particles between 1 and 10 {micro}m deposit with probabilities ranging from 1-20% with fin edge impaction representing the dominant mechanism. Particles larger than 10 {micro}m deposit by impaction on refrigerant tubes, gravitational settling on fin corrugations, and mechanisms associated with turbulent airflow. The model results agree reasonably well with experimental data, but the deposition of larger particles at high velocities is underpredicted. Geometric factors, such as discontinuities in the fins, are hypothesized to be responsible for the discrepancy.

  17. Giant landslide deposits in northwest Argentina

    SciTech Connect (OSTI)

    Fauque, L.; Strecker, M.R.; Bloom, A.L.

    1985-01-01

    Giant Quaternary landslide deposits occur along mountain fronts in the structural transition zone between the high-angle reverse-fault-bounded Sierras Pampeanas and the low-angle thrust belt of the Sierras Subandinas. There are two modes of occurrence: (1) chaotic masses without distinct geometry, and (2) masses with distinct lobate geometry similar to glacial moraines. Type (1) deposits occur where the moving rock mass followed a narrow valley and blocked the drainage. Many of these caused subsequent formation of lakes and changed the sedimentation processes on pediments at the mountain fronts. In type (2) deposits, lateral and frontal ridges are up to 10 m higher than the interior parts; in some places pressure ridges within the lobes are well preserved. Type (2) deposits show reverse grading and were deposited on relatively smooth pediments or alluvial fans. The lobate geometry strongly suggests that type (2) deposits are a product of flowage and are debris stream or sturzstrom deposits (sense of Heim, 1932 and Hsu, 1975). All investigated deposits occur in areas of demonstrated Quaternary faulting and are interpreted as the result of tectonic movements, although structural inhomogeneities in the source area may have been a significant factor for some of the landslides. No datable materials have yet been found associated with the deposits.

  18. Other Hydrothermal Deposits | Open Energy Information

    Open Energy Info (EERE)

    Capping Other Hydrothermal Alteration Products Colorful hydrothermal deposits dot the landscape at the Hverir Geothermal Area, Iceland. Photo by Darren Atkins User-specified field...

  19. Selective deposition of nanostructured ruthenium oxide using...

    Office of Scientific and Technical Information (OSTI)

    ruthenium oxide using Tobacco mosaic virus for micro-supercapacitors in solid Nafion ... Title: Selective deposition of nanostructured ruthenium oxide using Tobacco mosaic virus ...

  20. Atomic Layer Deposition | Argonne National Laboratory

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Atomic Layer Deposition New nanophase thin film materials with properties tailored to specifically meet the needs of industry New software simulates ALD over multiple length scale,...

  1. Methods of electrophoretic deposition for functionally graded...

    Office of Scientific and Technical Information (OSTI)

    Methods of electrophoretic deposition for functionally graded porous nanostructures and systems thereof Citation Details In-Document Search Title: Methods of electrophoretic...

  2. Hydrothermally Deposited Rock | Open Energy Information

    Open Energy Info (EERE)

    at Paleochori, Milos, Greece. http:www.photovolcanica.comVolcanoInfoMilosMilos.html Hydrothermally deposited rock includes rocks and minerals that have precipitated from...

  3. Chemical surface deposition of ultra-thin semiconductors

    DOE Patents [OSTI]

    McCandless, Brian E. (243 W. Main St., Elkton, MD 21921); Shafarman, William N. (1905 N. Van Buren St., Wilmington, DE 19802)

    2003-03-25

    A chemical surface deposition process for forming an ultra-thin semiconducting film of Group IIB-VIA compounds onto a substrate. This process eliminates particulates formed by homogeneous reactions in bath, dramatically increases the utilization of Group IIB species, and results in the formation of a dense, adherent film for thin film solar cells. The process involves applying a pre-mixed liquid coating composition containing Group IIB and Group VIA ionic species onto a preheated substrate. Heat from the substrate causes a heterogeneous reaction between the Group IIB and VIA ionic species of the liquid coating composition, thus forming a solid reaction product film on the substrate surface.

  4. Atomic oxygen flux determined by mixed-phase Ag/Ag2O deposition

    SciTech Connect (OSTI)

    Kaspar, Tiffany C.; Droubay, Timothy C.; Chambers, Scott A.

    2010-11-01

    The flux of atomic oxygen generated in a electron cyclotron resonance (ECR) microwave plasma source was quantified by two different methods. The commonly applied approach of monitoring the frequency change of a silver-coated quartz crystal microbalance (QCM) deposition rate monitor as the silver is oxidized was found to underestimate the atomic oxygen flux by an order of magnitude compared to a more direct deposition approach. In the mixed-phase Ag/Ag2O deposition method, silver films were deposited in the presence of the plasma such that the films were partially oxidized to Ag2O; x-ray photoelectron spectroscopy (XPS) was utilized for quantification of the oxidized fraction. The inaccuracy of the QCM oxidation method was tentatively attributed to efficient catalytic recombination of O atoms on the silver surface.

  5. In situ method for recovering hydrocarbon from subterranean oil shale deposits

    SciTech Connect (OSTI)

    Friedman, R.H.

    1987-11-03

    This patent describes in situ method for recovering hydrocarbons from subterranean oil shale deposits, the deposits comprising mineral rock and kerogen, comprising (a) penetrating the oil shale deposit with at least one well; (b) forming a zone of fractured and/or rubbilized oil shale material adjacent the well by hydraulic or explosive fracturing; (c) introducing a hydrogen donor solvent including tetralin into the portion of the oil shale formation treated in step (b) in a volume sufficient to fill substantially all of the void space created by the fracturing and rubbilizing treatment; (d) applying hydrogen to the tetralin and maintaining a predetermined pressure for a predetermined period of time sufficient to cause disintegration of the oil shale material; (e) thereafter introducing an oxidative environment into the portion of the oil shale deposit (f) producing the solvent in organic fragments to the surface of the earth, and (g) separating the organic fragments from the solvent.

  6. Optical Properties of Zn(O,S) Thin Films Deposited by RF Sputtering, Atomic Layer Deposition, and Chemical Bath Deposition: Preprint

    SciTech Connect (OSTI)

    Li, J.; Glynn, S.; Christensen, S.; Mann, J.; To, B.; Ramanathan, K.; Noufi, R.; Furtak, T. E.; Levi, D.

    2012-06-01

    Zn(O,S) thin films 27 - 100 nm thick were deposited on glass or Cu(InxGa1-x)Se2/Molybdenum/glass with RF sputtering, atomic layer deposition, and chemical bath deposition.

  7. Thick adherent dielectric films on plastic substrates and method for depositing same

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Ellingboe, Albert R. (Fremont, CA); Theiss, Steven D. (Woodbury, MN); Smith, Patrick M. (San Ramon, CA)

    2002-01-01

    Thick adherent dielectric films deposited on plastic substrates for use as a thermal barrier layer to protect the plastic substrates from high temperatures which, for example, occur during laser annealing of layers subsequently deposited on the dielectric films. It is desirable that the barrier layer has properties including: a thickness of 1 .mu.m or greater, adheres to a plastic substrate, does not lift-off when cycled in temperature, has few or no cracks and does not crack when subjected to bending, resistant to lift-off when submersed in fluids, electrically insulating and preferably transparent. The thick barrier layer may be composed, for example, of a variety of dielectrics and certain metal oxides, and may be deposited on a variety of plastic substrates by various known deposition techniques. The key to the method of forming the thick barrier layer on the plastic substrate is maintaining the substrate cool during deposition of the barrier layer. Cooling of the substrate maybe accomplished by the use of a cooling chuck on which the plastic substrate is positioned, and by directing cooling gas, such as He, Ar and N.sub.2, between the plastic substrate and the cooling chucks. Thick adherent dielectric films up to about 5 .mu.m have been deposited on plastic substrates which include the above-referenced properties, and which enable the plastic substrates to withstand laser processing temperatures applied to materials deposited on the dielectric films.

  8. Apply for Beam Time | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    All About Proposals Users Home Apply for Beam Time Deadlines Proposal Types Concepts, Definitions, and Help My APS Portal My APS Portal Apply for Beam Time Next Proposal Deadline...

  9. How to Apply for the ENERGY STAR®

    Broader source: Energy.gov [DOE]

    Join us to learn about applying for ENERGY STAR Certification in Portfolio Manager. Understand the value of the ENERGY STAR certification, see the step-by-step process of applying, and gain tips to...

  10. Chemical vapor deposition of mullite coatings

    DOE Patents [OSTI]

    Sarin, Vinod (Lexington, MA); Mulpuri, Rao (Boston, MA)

    1998-01-01

    This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

  11. Ammonia release method for depositing metal oxides

    DOE Patents [OSTI]

    Silver, Gary L. (Centerville, OH); Martin, Frank S. (Farmersville, OH)

    1994-12-13

    A method of depositing metal oxides on substrates which is indifferent to the electrochemical properties of the substrates and which comprises forming ammine complexes containing metal ions and thereafter effecting removal of ammonia from the ammine complexes so as to permit slow precipitation and deposition of metal oxide on the substrates.

  12. Ammonia release method for depositing metal oxides

    DOE Patents [OSTI]

    Silver, G.L.; Martin, F.S.

    1994-12-13

    A method is described for depositing metal oxides on substrates which is indifferent to the electrochemical properties of the substrates and which comprises forming ammine complexes containing metal ions and thereafter effecting removal of ammonia from the ammine complexes so as to permit slow precipitation and deposition of metal oxide on the substrates. 1 figure.

  13. Apparatus for gas-metal arc deposition

    DOE Patents [OSTI]

    Buhrmaster, Carol L. (Corning, NY); Clark, Denis E. (Idaho Falls, ID); Smartt, Herschel B. (Idaho Falls, ID)

    1991-01-01

    Apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment with the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspenion of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite.

  14. Method for gas-metal arc deposition

    DOE Patents [OSTI]

    Buhrmaster, Carol L. (Corning, NY); Clark, Denis E. (Idaho Falls, ID); Smartt, Herschel B. (Idaho Falls, ID)

    1990-01-01

    Method and apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment wiht the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspension of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite.

  15. Method for gas-metal arc deposition

    DOE Patents [OSTI]

    Buhrmaster, C.L.; Clark, D.E.; Smartt, H.B.

    1990-11-13

    Method and apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites are disclosed. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment with the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspension of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite. 1 fig.

  16. Photobiomolecular deposition of metallic particles and films

    DOE Patents [OSTI]

    Hu, Zhong-Cheng

    2005-02-08

    The method of the invention is based on the unique electron-carrying function of a photocatalytic unit such as the photosynthesis system I (PSI) reaction center of the protein-chlorophyll complex isolated from chloroplasts. The method employs a photo-biomolecular metal deposition technique for precisely controlled nucleation and growth of metallic clusters/particles, e.g., platinum, palladium, and their alloys, etc., as well as for thin-film formation above the surface of a solid substrate. The photochemically mediated technique offers numerous advantages over traditional deposition methods including quantitative atom deposition control, high energy efficiency, and mild operating condition requirements.

  17. Applied geodesy (Book) | SciTech Connect

    Office of Scientific and Technical Information (OSTI)

    Book: Applied geodesy Citation Details In-Document Search Title: Applied geodesy This volume is based on the proceedings of the CERN Accelerator School's course on Applied Geodesy for Particle Accelerators held in April 1986. The purpose was to record and disseminate the knowledge gained in recent years on the geodesy of accelerators and other large systems. The latest methods for positioning equipment to sub-millimetric accuracy in deep underground tunnels several tens of kilometers long are

  18. Apply for Your First NERSC Allocation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Apply for Your First Allocation Apply for Your First NERSC Allocation Initial Steps Needed to Apply for Your First NERSC Allocation All work done at NERSC must be within the DOE Office of Science mission. See the Mission descriptions for each office at Allocations Overview and Eligibility. Prospective Principal Investigators without a NERSC login need to fill out two forms: The online ERCAP Access Request Form. If you wish to designate another person to fill out the request form you may

  19. Applied Field Research Initiative Attenuation Based Remedies

    Office of Environmental Management (EM)

    Laboratory (SRNL), the initiative is a collaborative effort that leverages DOE invest- ments in applied research and basic science and the work of the site contractors to...

  20. Applied Materials Inc AMAT | Open Energy Information

    Open Energy Info (EERE)

    manufacturer of equipment used in solar (silicon, thin-film, BIPV), semiconductor, and LCD markets. References: Applied Materials Inc (AMAT)1 This article is a stub. You can...

  1. Applied Quantum Technology AQT | Open Energy Information

    Open Energy Info (EERE)

    Quantum Technology AQT Jump to: navigation, search Name: Applied Quantum Technology (AQT) Place: Santa Clara, California Zip: 95054 Product: California-based manufacturer of CIGS...

  2. Applied Energy Management | Open Energy Information

    Open Energy Info (EERE)

    Energy Management Jump to: navigation, search Name: Applied Energy Management Place: Huntersville, North Carolina Zip: 28078 Sector: Efficiency, Renewable Energy Product: North...

  3. Source replenishment device for vacuum deposition

    DOE Patents [OSTI]

    Hill, Ronald A. (Albuquerque, NM)

    1988-01-01

    A material source replenishment device for use with a vacuum deposition apparatus. The source replenishment device comprises an intermittent motion producing gear arrangement disposed within the vacuum deposition chamber. An elongated rod having one end operably connected to the gearing arrangement is provided with a multiarmed head at the opposite end disposed adjacent the heating element of the vacuum deposition apparatus. An inverted U-shaped source material element is releasably attached to the outer end of each arm member whereby said multiarmed head is moved to locate a first of said material elements above said heating element, whereupon said multiarmed head is lowered to engage said material element with the heating element and further lowered to release said material element on the heating element. After vaporization of said material element, second and subsequent material elements may be provided to the heating element without the need for opening the vacuum deposition apparatus to the atmosphere.

  4. Source replenishment device for vacuum deposition

    DOE Patents [OSTI]

    Hill, R.A.

    1986-05-15

    A material source replenishment device for use with a vacuum deposition apparatus is described. The source replenishment device comprises an intermittent motion producing gear arrangement disposed within the vacuum deposition chamber. An elongated rod having one end operably connected to the gearing arrangement is provided with a multiarmed head at the opposite end disposed adjacent the heating element of the vacuum deposition apparatus. An inverted U-shaped source material element is releasably attached to the outer end of each arm member whereby said multiarmed head is moved to locate a first of said material elements above said heating element, whereupon said multiarmed head is lowered to engage said material element with the heating element and further lowered to release said material element on the heating element. After vaporization of said material element, second and subsequent material elements may be provided to the heating element without the need for opening the vacuum deposition apparatus to the atmosphere.

  5. Orderly Deposition of Uncontaminated Graphene - Energy Innovation...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Technology Marketing SummaryXiaogan Liang of Berkeley Lab has invented an inexpensive, high-throughput process for depositing pure few-layer-graphene (FLG) in a desired pattern...

  6. Energy deposition in STARFIRE reactor components

    SciTech Connect (OSTI)

    Gohar, Y.; Brooks, J.N.

    1985-04-01

    The energy deposition in the STARFIRE commercial tokamak reactor was calculated based on detailed models for the different reactor components. The heat deposition and the 14 MeV neutron flux poloidal distributions in the first wall were obtained. The poloidal surface heat load distribution in the first wall was calculated from the plasma radiation. The Monte Carlo method was used for the calculation to allow an accurate modeling for the reactor geometry.

  7. Method of deposition by molecular beam epitaxy

    DOE Patents [OSTI]

    Chalmers, S.A.; Killeen, K.P.; Lear, K.L.

    1995-01-10

    A method is described for reproducibly controlling layer thickness and varying layer composition in an MBE deposition process. In particular, the present invention includes epitaxially depositing a plurality of layers of material on a substrate with a plurality of growth cycles whereby the average of the instantaneous growth rates for each growth cycle and from one growth cycle to the next remains substantially constant as a function of time. 9 figures.

  8. Semiconductor assisted metal deposition for nanolithography applications

    DOE Patents [OSTI]

    Rajh, Tijana (Naperville, IL); Meshkov, Natalia (Downers Grove, IL); Nedelijkovic, Jovan M. (Belgrade, YU); Skubal, Laura R. (West Brooklyn, IL); Tiede, David M. (Elmhurst, IL); Thurnauer, Marion (Downers Grove, IL)

    2001-01-01

    An article of manufacture and method of forming nanoparticle sized material components. A semiconductor oxide substrate includes nanoparticles of semiconductor oxide. A modifier is deposited onto the nanoparticles, and a source of metal ions are deposited in association with the semiconductor and the modifier, the modifier enabling electronic hole scavenging and chelation of the metal ions. The metal ions and modifier are illuminated to cause reduction of the metal ions to metal onto the semiconductor nanoparticles.

  9. Semiconductor assisted metal deposition for nanolithography applications

    DOE Patents [OSTI]

    Rajh, Tijana (Naperville, IL); Meshkov, Natalia (Downers Grove, IL); Nedelijkovic, Jovan M. (Belgrade, YU); Skubal, Laura R. (West Brooklyn, IL); Tiede, David M. (Elmhurst, IL); Thurnauer, Marion (Downers Grove, IL)

    2002-01-01

    An article of manufacture and method of forming nanoparticle sized material components. A semiconductor oxide substrate includes nanoparticles of semiconductor oxide. A modifier is deposited onto the nanoparticles, and a source of metal ions are deposited in association with the semiconductor and the modifier, the modifier enabling electronic hole scavenging and chelation of the metal ions. The metal ions and modifier are illuminated to cause reduction of the metal ions to metal onto the semiconductor nanoparticles.

  10. Method of deposition by molecular beam epitaxy

    DOE Patents [OSTI]

    Chalmers, Scott A. (Albuquerque, NM); Killeen, Kevin P. (Albuquerque, NM); Lear, Kevin L. (Albuquerque, NM)

    1995-01-01

    A method is described for reproducibly controlling layer thickness and varying layer composition in an MBE deposition process. In particular, the present invention includes epitaxially depositing a plurality of layers of material on a substrate with a plurality of growth cycles whereby the average of the instantaneous growth rates for each growth cycle and from one growth cycle to the next remains substantially constant as a function of time.

  11. Polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey, Thomas M. (Los Alamos, NM); Burrell; Anthony K. (Los Alamos, NM); Jia; Quanxi (Los Alamos, NM); Lin; Yuan (Los Alamos, NM)

    2009-10-20

    A polymer assisted deposition process for deposition of metal oxide films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films and the like. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  12. Polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey, Thomas M. (Los Alamos, NM); Burrell, Anthony K. (Los Alamos, NM); Jia, Quanxi (Los Alamos, NM); Lin, Yuan (Los Alamos, NM)

    2008-04-29

    A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  13. Process for metallization of a substrate by curing a catalyst applied thereto

    DOE Patents [OSTI]

    Chen, Ken S. (Albuquerque, NM); Morgan, William P. (Albuquerque, NM); Zich, John L. (Albuquerque, NM)

    2002-10-08

    An improved additive process for metallization of substrates is described whereby a catalyst solution is applied to a surface of a substrate. Metallic catalytic clusters can be formed in the catalyst solution on the substrate surface by heating the substrate. Electroless plating can then deposit metal onto the portion of the substrate surface coated with catalyst solution. Additional metallization thickness can be obtained by electrolytically plating the substrate surface after the electroless plating step.

  14. Process for metallization of a substrate by irradiative curing of a catalyst applied thereto

    DOE Patents [OSTI]

    Chen, Ken S. (Albuquerque, NM); Morgan, William P. (Albuquerque, NM); Zich, John L. (Albuquerque, NM)

    1999-01-01

    An improved additive process for metallization of substrates is described whereby a catalyst solution is applied to a surface of a substrate. Metallic catalytic clusters can be formed in the catalyst solution on the substrate surface by irradiating the substrate. Electroless plating can then deposit metal onto the portion of the substrate surface having metallic clusters. Additional metallization thickness can be obtained by electrolytically plating the substrate surface after the electroless plating step.

  15. Eulerian CFD Models to Predict Thermophoretic Deposition of Soot...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Eulerian CFD Models to Predict Thermophoretic Deposition of Soot Particles in EGR Coolers Eulerian CFD Models to Predict Thermophoretic Deposition of Soot Particles in EGR Coolers...

  16. Low-temperature plasma-deposited silicon epitaxial films: Growth...

    Office of Scientific and Technical Information (OSTI)

    Low-temperature plasma-deposited silicon epitaxial films: Growth and properties Citation Details In-Document Search Title: Low-temperature plasma-deposited silicon epitaxial films:...

  17. Precursors for the polymer-assisted deposition of films (Patent...

    Office of Scientific and Technical Information (OSTI)

    A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having ...

  18. Spatial atomic layer deposition on flexible substrates using...

    Office of Scientific and Technical Information (OSTI)

    Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor Citation Details In-Document Search Title: Spatial atomic layer deposition on...

  19. Solvothermal Thin Film Deposition of Electron Blocking Layers...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Solvothermal Thin Film Deposition of Electron Blocking Layers Home > Research > ANSER Research Highlights > Solvothermal Thin Film Deposition of Electron Blocking Layers...

  20. Atomic Layer Deposition of Metal Sulfide Materials | Argonne...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Atomic Layer Deposition of Metal Sulfide Materials Title Atomic Layer Deposition of Metal Sulfide Materials Publication Type Journal Article Year of Publication 2015 Authors...

  1. Geology and Mineral Deposits of Churchill County, Nevada | Open...

    Open Energy Info (EERE)

    Mineral Deposits of Churchill County, Nevada Jump to: navigation, search OpenEI Reference LibraryAdd to library Report: Geology and Mineral Deposits of Churchill County, Nevada...

  2. Nuclear Facilities and Applied Technologies at Sandia

    SciTech Connect (OSTI)

    Wheeler, Dave; Kaiser, Krista; Martin, Lonnie; Hanson, Don; Harms, Gary; Quirk, Tom

    2014-11-28

    The Nuclear Facilities and Applied Technologies organization at Sandia National Laboratories Technical Area Five (TA-V) is the leader in advancing nuclear technologies through applied radiation science and unique nuclear environments. This video describes the organizations capabilities, facilities, and culture.

  3. Dose distribution from x-ray microbeam arrays applied to radiation therapy:

    Office of Scientific and Technical Information (OSTI)

    An EGS4 Monte Carlo study (Journal Article) | SciTech Connect Dose distribution from x-ray microbeam arrays applied to radiation therapy: An EGS4 Monte Carlo study Citation Details In-Document Search Title: Dose distribution from x-ray microbeam arrays applied to radiation therapy: An EGS4 Monte Carlo study We present EGS4 Monte Carlo calculations of the spatial distribution of the dose deposited by a single x-ray pencil beam, a planar microbeam, and an array of parallel planar microbeams as

  4. Palladium catalysts synthesized by atomic layer deposition for methanol decomposition.

    SciTech Connect (OSTI)

    Elam, J. W.; Feng, H.; Stair, P. C.; Libera, J. A.; Setthapun, W.; Northwestern Univ.

    2010-05-25

    Atomic layer deposition (ALD) palladium films were deposited at 200 C on various ALD metal oxide surfaces using sequential exposures to Pd(II) hexafluoroacetylacetonate (Pd(hfac)2) and formalin. In situ quartz crystal microbalance measurements as well as ex situ measurements performed on planar substrates revealed that the Pd growth begins with a relatively slow nucleation process and accelerates once an adequate amount of Pd has deposited on the surface. Furthermore, the Pd nucleation is faster on ALD ZnO surfaces compared to ALD Al2O3 surfaces. ALD was utilized to synthesize highly dispersed, uniform Pd nanoparticles (1 to 2 nm in diameter) on ALD ZnO and Al2O3 coated mesoporous silica gel, and the catalytic performances of these samples were compared in the methanol decomposition reaction. The ALD Pd-Al2O3 showed high activity and hydrogen selectivity at relatively low temperatures while the ALD Pd-ZnO showed very low activity as well as quick deactivation. In situ extended X-ray absorption fine structure (EXAFS) measurement revealed that the Pd supported on ZnO 'dissolves' into the substrate during the methanol decomposition reaction which accounts for the gradual disappearance of its catalytic activity. By applying one cycle of ALD Al2O3 on top of the Pd-ZnO catalyst, the activity was enhanced and the catalyst deactivation was mitigated. This Al2O3 overcoating method stabilizes the Pd-ZnO and effectively prevents the dissolution of Pd into the ZnO substrate.

  5. Patterns of permeability in eolian deposits

    SciTech Connect (OSTI)

    Goggin, D.J.; Chandler, M.A.; Kocurek, G.; Lake, L.W.

    1988-06-01

    The eolian, Jurassic Page sandstone of northeastern Arizona is marked by a highly ordered heterogeneity. The heterogeneity is expressed by the intricate association of stratification types, which are a direct result of the depositional processes. The dominant stratification types in eolian reservoirs are grainflow, grainfall, and wind-ripple deposits, which form on the lee faces of migrating dunes; interdune deposits, which form between migrating dunes; and extra-erg deposits, which occur sporadically when other depositional environments encroach upon an eolian system. These stratification types each have a unique permeability range, which implies that the fluid migration routes in eolian reservoirs will be dictated by the geometry and types of stratification present. One of the most important aspects of this study is the correlation of qualitative geologic descriptions with quantitative variables such as permeability. About 2,000 measurements were made with a field minipermeameter on an outcrop of the Page sandstone. These data show that three distinct permeability modes directly relate to the different stratification types.

  6. Apparatus for laser assisted thin film deposition

    DOE Patents [OSTI]

    Warner, B.E.; McLean, W. II

    1996-02-13

    A pulsed laser deposition apparatus uses fiber optics to deliver visible output beams. One or more optical fibers are coupled to one or more laser sources, and delivers visible output beams to a single chamber, to multiple targets in the chamber or to multiple chambers. The laser can run uninterrupted if one of the deposition chambers ceases to operate because other chambers can continue their laser deposition processes. The laser source can be positioned at a remote location relative to the deposition chamber. The use of fiber optics permits multi-plexing. A pulsed visible laser beam is directed at a generally non-perpendicular angle upon the target in the chamber, generating a plume of ions and energetic neutral species. A portion of the plume is deposited on a substrate as a thin film. A pulsed visible output beam with a high pulse repetition frequency is used. The high pulse repetition frequency is greater than 500 Hz, and more preferably, greater than about 1000 Hz. Diamond-like-carbon (DLC) is one of the thin films produced using the apparatus. 9 figs.

  7. Apparatus for laser assisted thin film deposition

    DOE Patents [OSTI]

    Warner, Bruce E. (Pleasanton, CA); McLean, II, William (Oakland, CA)

    1996-01-01

    A pulsed laser deposition apparatus uses fiber optics to deliver visible output beams. One or more optical fibers are coupled to one or more laser sources, and delivers visible output beams to a single chamber, to multiple targets in the chamber or to multiple chambers. The laser can run uninterrupted if one of the deposition chambers ceases to operate because other chambers can continue their laser deposition processes. The laser source can be positioned at a remote location relative to the deposition chamber. The use of fiber optics permits multi-plexing. A pulsed visible laser beam is directed at a generally non-perpendicular angle upon the target in the chamber, generating a plume of ions and energetic neutral species. A portion of the plume is deposited on a substrate as a thin film. A pulsed visible output beam with a high pulse repetition frequency is used. The high pulse repetition frequency is greater than 500 Hz, and more preferably, greater than about 1000 Hz. Diamond-like-carbon (DLC) is one of the thin films produced using the apparatus.

  8. Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective

    SciTech Connect (OSTI)

    Anders, Andre

    2007-02-28

    Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."

  9. Swimming motility reduces Azotobacter vinelandii deposition to silica surfaces

    SciTech Connect (OSTI)

    Lu, Nanxi; Massoudieh, Arash; Liang, Xiaomeng; Hu, Dehong; Kamai, Tamir; Ginn, Timothy R.; Zilles, Julie L.; Nguyen, Thanh H.

    2015-09-16

    The role of swimming motility on bacterial transport and fate in porous media was evaluated. We present microscopic evidence showing that strong swimming motility reduces attachment of Azotobacter vinelandii cells to silica surfaces. Applying global and cluster statistical analyses to microscopic videos taken under non-flow conditions, wild type, flagellated A. vinelandii strain DJ showed strong swimming ability with an average speed of 13.1 ?m/s, DJ77 showed impaired swimming averaged at 8.7 ?m/s, and both the non-flagellated JZ52 and chemically treated DJ cells were non-motile. Quantitative analyses of trajectories observed at different distances above the collector of a radial stagnation point flow cell (RSPF) revealed that both swimming and non-swimming cells moved with the flow when at a distance of at least 20 ?m from the collector surface. Near the surface, DJ cells showed both horizontal and vertical movement diverging them from reaching surfaces, while chemically treated DJ cells moved with the flow to reach surfaces, suggesting that strong swimming reduced attachment. In agreement with the RSPF results, the deposition rates obtained for two-dimensional multiple-collector micromodels were also lowest for DJ, while DJ77 and JZ52 showed similar values. Strong swimming specifically reduced deposition on the upstream surfaces of the micromodel collectors.

  10. Pi in Applied Optics | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Inside the Applied Optics Lab II Click to email this to a friend (Opens in new window) Share on Facebook (Opens in new window) Click to share (Opens in new window) Click to share...

  11. Apply to the Cyclotron Institute REU Program

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    an advanced physicschemistry course. To apply for the REU Program, complete the 3 steps below: Fill out the on-line 2016 Cyclotron Institute REU Application Note: You will be...

  12. Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Elam, Jeffrey W.; Xiong, Guang; Han, Catherine Y.; Wang, H. Hau; Birrell, James P.; Welp, Ulrich; Hryn, John N.; Pellin, Michael J.; Baumann, Theodore F.; Poco, John F.; et al

    2006-01-01

    Amore » tomic layer deposition ( ALD ) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used ALD to coat two nanoporous solids: anodic aluminum oxide ( AAO ) and silica aerogels. AAO possesses hexagonally ordered pores with diameters d ∼ 40 nm and pore length L ∼ 70 microns. The AAO membranes were coated by ALD to fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. Additional AAO membranes coated with ALD Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors by ALD .« less

  13. Liquid-phase-deposited siloxane-based capping layers for silicon solar cells

    SciTech Connect (OSTI)

    Veith-Wolf, Boris; Wang, Jianhui; Hannu-Kuure, Milja; Chen, Ning; Hadzic, Admir; Williams, Paul; Leivo, Jarkko; Karkkainen, Ari; Schmidt, Jan

    2015-02-02

    We apply non-vacuum processing to deposit dielectric capping layers on top of ultrathin atomic-layer-deposited aluminum oxide (AlO{sub x}) films, used for the rear surface passivation of high-efficiency crystalline silicon solar cells. We examine various siloxane-based liquid-phase-deposited (LPD) materials. Our optimized AlO{sub x}/LPD stacks show an excellent thermal and chemical stability against aluminum metal paste, as demonstrated by measured surface recombination velocities below 10 cm/s on 1.3 Ωcm p-type silicon wafers after firing in a belt-line furnace with screen-printed aluminum paste on top. Implementation of the optimized LPD layers into an industrial-type screen-printing solar cell process results in energy conversion efficiencies of up to 19.8% on p-type Czochralski silicon.

  14. Methods and systems for electrophoretic deposition of energetic materials and compositions thereof

    DOE Patents [OSTI]

    Sullivan, Kyle T.; Gash, Alexander E.; Kuntz, Joshua D.; Worsley, Marcus A.

    2015-06-23

    A product includes: a part including at least one component characterized as an energetic material, where the at least one component is at least partially characterized by physical characteristics of being deposited by an electrophoretic deposition process. A method includes: providing a plurality of particles of an energetic material suspended in a dispersion liquid to an EPD chamber or configuration; applying a voltage difference across a first pair of electrodes to generate a first electric field in the EPD chamber; and depositing at least some of the particles of the energetic material on at least one surface of a substrate, the substrate being one of the electrodes or being coupled to one of the electrodes.

  15. Applying computationally efficient schemes for biogeochemical cycles

    Office of Scientific and Technical Information (OSTI)

    (ACES4BGC) (Technical Report) | SciTech Connect Applying computationally efficient schemes for biogeochemical cycles (ACES4BGC) Citation Details In-Document Search Title: Applying computationally efficient schemes for biogeochemical cycles (ACES4BGC) NCAR contributed to the ACES4BGC project through software engineering work on aerosol model implementation, build system and script changes, coupler enhancements for biogeochemical tracers, improvements to the Community Land Model (CLM) code and

  16. SAGE, Summer of Applied Geophysical Experience

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    About Apply Who Qualifies Special Undergrad Information Contributors Faculty Past Programs Photo Gallery NSEC » CSES » SAGE SAGE, the Summer of Applied Geophysical Experience Application deadline: March 27, 2016, 5:00 pm MDT Contacts Institute Director Reinhard Friedel-Los Alamos SAGE Co-Director W. Scott Baldridge-Los Alamos SAGE Co-Director Larry Braile-Purdue University Professional Staff Assistant Georgia Sanchez (505) 665-0855 Email Application process for SAGE 2016 is now open. U.S.

  17. LANSCE | Lujan Center | Apply for Beamtime

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Apply for Beamtime LANSCE User Resources Tips for a Successful Proposal Step 1: Apply for Beam Time 1. Select an Instrument and a Local Contact 2. Submit Your Proposal Step 2: Before You Arrive 1. Complete the LANSCE User Facility Agreement Questionnaire 2. Arrange for Site Access 3. Prepare for Your Experiment: Contact Lujan Experiment Coordinator to arrange shipping of your samples. Talk to the beamline scientist about any electrical equipment you might bring. 4. Complete your training Step 3:

  18. How to Apply | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Postdoctoral Research Awards » How to Apply How to Apply Online Application Available at www.zintellect.com/Posting/Details/853 Application deadline May 7, 2015. Familiarize yourself with the benefits, obligations, eligibility requirements, and evaluation criteria. Familiarize yourself with the requirements and obligations to determine whether your education and professional goals are well aligned with the EERE Postdoctoral Research Awards. Read the Evaluation Criteria that will be used to

  19. Method and apparatus for conducting variable thickness vapor deposition

    DOE Patents [OSTI]

    Nesslage, G.V.

    1984-08-03

    A method of vapor depositing metal on a substrate in variable thickness comprises conducting the deposition continuously without interruption to avoid formation of grain boundaries. To achieve reduced deposition in specific regions a thin wire or ribbon blocking body is placed between source and substrate to partially block vapors from depositing in the region immediately below.

  20. Forming aspheric optics by controlled deposition

    DOE Patents [OSTI]

    Hawryluk, Andrew M. (Modesto, CA)

    1998-01-01

    An aspheric optical element formed by depositing material onto a spherical surface of an optical element by controlled deposition to form an aspheric surface of desired shape. A reflecting surface, single or multi-layer, can then be formed on the aspheric surface by evaporative or sputtering techniques. Aspheric optical elements are suitable for deep ultra-violet (UV) and x-ray wavelengths. The reflecting surface may, for example, be a thin (.about.100 nm) layer of aluminum, or in some cases the deposited modifying layer may function as the reflecting surface. For certain applications, multi-layer reflective surfaces may be utilized, such as chromium-carbon or tungsten-carbon multi-layer, with the number of layers and thickness being determined by the intended application.

  1. Liquid injection plasma deposition method and apparatus

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID); Watkins, Arthur D. (Idaho Falls, ID)

    1999-01-01

    A liquid injection plasma torch deposition apparatus for depositing material onto a surface of a substrate may comprise a plasma torch for producing a jet of plasma from an outlet nozzle. A plasma confinement tube having an inlet end and an outlet end and a central bore therethrough is aligned with the outlet nozzle of the plasma torch so that the plasma jet is directed into the inlet end of the plasma confinement tube and emerges from the outlet end of the plasma confinement tube. The plasma confinement tube also includes an injection port transverse to the central bore. A liquid injection device connected to the injection port of the plasma confinement tube injects a liquid reactant mixture containing the material to be deposited onto the surface of the substrate through the injection port and into the central bore of the plasma confinement tube.

  2. Forming aspheric optics by controlled deposition

    DOE Patents [OSTI]

    Hawryluk, A.M.

    1998-04-28

    An aspheric optical element is disclosed formed by depositing material onto a spherical surface of an optical element by controlled deposition to form an aspheric surface of desired shape. A reflecting surface, single or multi-layer, can then be formed on the aspheric surface by evaporative or sputtering techniques. Aspheric optical elements are suitable for deep ultra-violet (UV) and x-ray wavelengths. The reflecting surface may, for example, be a thin ({approx}100 nm) layer of aluminum, or in some cases the deposited modifying layer may function as the reflecting surface. For certain applications, multi-layer reflective surfaces may be utilized, such as chromium-carbon or tungsten-carbon multi-layer, with the number of layers and thickness being determined by the intended application. 4 figs.

  3. Glow discharge plasma deposition of thin films

    DOE Patents [OSTI]

    Weakliem, Herbert A. (Pennington, NJ); Vossen, Jr., John L. (Bridgewater, NJ)

    1984-05-29

    A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.

  4. Chemical vapor deposition of group IIIB metals

    DOE Patents [OSTI]

    Erbil, A.

    1989-11-21

    Coatings of Group IIIB metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula given in the patent where M is a Group IIIB metal, such as lanthanum or yttrium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula 1 is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as lanthanum telluride can be deposited from a lanthanum compound of formula 1 and a heat decomposable tellurium compound under nonoxidizing conditions.

  5. Chemical vapor deposition of group IIIB metals

    DOE Patents [OSTI]

    Erbil, Ahmet (Atlanta, GA)

    1989-01-01

    Coatings of Group IIIB metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula (I) ##STR1## where M is a Group IIIB metal, such as lanthanum or yttrium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula I is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as lanthanum telluride can be deposited from a lanthanum compound of formula I and a heat decomposable tellurium compound under nonoxidizing conditions.

  6. Line-of-sight deposition method

    DOE Patents [OSTI]

    Patten, J.W.; McClanahan, E.D.; Bayne, M.A.

    1980-04-16

    A line-of-sight method of depositing a film having substantially 100% of theoretical density on a substrate. A pressure vessel contains a target source having a surface thereof capable of emitting particles therefrom and a substrate with the source surface and the substrate surface positioned such that the source surface is substantially parallel to the direction of the particles impinging upon the substrate surface, the distance between the most remote portion of the substrate surface receiving the particles and the source surface emitting the particles in a direction parallel to the substrate surface being relatively small. The pressure in the vessel is maintained less than about 5 microns to prevent scattering and permit line-of-sight deposition. By this method the angles of incidence of the particles impinging upon the substrate surface are in the range of from about 45/sup 0/ to 90/sup 0/ even when the target surface area is greatly expanded to increase the deposition rate.

  7. Supplemental heating of deposition tooling shields

    DOE Patents [OSTI]

    Ohlhausen, James A. (Albuquerque, NM); Peebles, Diane E. (Albuquerque, NM); Hunter, John A. (Albuquerque, NM); Eckelmeyer, Kenneth H. (Albuquerque, NM)

    2000-01-01

    A method of reducing particle generation from the thin coating deposited on the internal surfaces of a deposition chamber which undergoes temperature variation greater than 100.degree. C. comprising maintaining the temperature variation of the internal surfaces low enough during the process cycle to keep thermal expansion stresses between the coating and the surfaces under 500 MPa. For titanium nitride deposited on stainless steel, this means keeping temperature variations under approximately 70.degree. C. in a chamber that may be heated to over 350.degree. C. during a typical processing operation. Preferably, a supplemental heater is mounted behind the upper shield and controlled by a temperature sensitive element which provides feedback control based on the temperature of the upper shield.

  8. Liquid injection plasma deposition method and apparatus

    DOE Patents [OSTI]

    Kong, P.C.; Watkins, A.D.

    1999-05-25

    A liquid injection plasma torch deposition apparatus for depositing material onto a surface of a substrate may comprise a plasma torch for producing a jet of plasma from an outlet nozzle. A plasma confinement tube having an inlet end and an outlet end and a central bore therethrough is aligned with the outlet nozzle of the plasma torch so that the plasma jet is directed into the inlet end of the plasma confinement tube and emerges from the outlet end of the plasma confinement tube. The plasma confinement tube also includes an injection port transverse to the central bore. A liquid injection device connected to the injection port of the plasma confinement tube injects a liquid reactant mixture containing the material to be deposited onto the surface of the substrate through the injection port and into the central bore of the plasma confinement tube. 8 figs.

  9. Method for deposition of a conductor in integrated circuits

    DOE Patents [OSTI]

    Creighton, J. Randall (Albuquerque, NM); Dominguez, Frank (Albuquerque, NM); Johnson, A. Wayne (Albuquerque, NM); Omstead, Thomas R. (Albuquerque, NM)

    1997-01-01

    A method is described for fabricating integrated semiconductor circuits and, more particularly, for the selective deposition of a conductor onto a substrate employing a chemical vapor deposition process. By way of example, tungsten can be selectively deposited onto a silicon substrate. At the onset of loss of selectivity of deposition of tungsten onto the silicon substrate, the deposition process is interrupted and unwanted tungsten which has deposited on a mask layer with the silicon substrate can be removed employing a halogen etchant. Thereafter, a plurality of deposition/etch back cycles can be carried out to achieve a predetermined thickness of tungsten.

  10. Method for deposition of a conductor in integrated circuits

    DOE Patents [OSTI]

    Creighton, J.R.; Dominguez, F.; Johnson, A.W.; Omstead, T.R.

    1997-09-02

    A method is described for fabricating integrated semiconductor circuits and, more particularly, for the selective deposition of a conductor onto a substrate employing a chemical vapor deposition process. By way of example, tungsten can be selectively deposited onto a silicon substrate. At the onset of loss of selectivity of deposition of tungsten onto the silicon substrate, the deposition process is interrupted and unwanted tungsten which has deposited on a mask layer with the silicon substrate can be removed employing a halogen etchant. Thereafter, a plurality of deposition/etch back cycles can be carried out to achieve a predetermined thickness of tungsten. 2 figs.

  11. Ruthenium / aerogel nanocomposits via Atomic Layer Deposition

    SciTech Connect (OSTI)

    Biener, J; Baumann, T F; Wang, Y; Nelson, E J; Kucheyev, S O; Hamza, A V; Kemell, M; Ritala, M; Leskela, M

    2006-08-28

    We present a general approach to prepare metal/aerogel nanocomposites via template directed atomic layer deposition (ALD). In particular, we used a Ru ALD process consisting of alternating exposures to bis(cyclopentadienyl)ruthenium (RuCp{sub 2}) and air at 350 C to deposit metallic Ru nanoparticles on the internal surfaces of carbon and silica aerogels. The process does not affect the morphology of the aerogel template and offers excellent control over metal loading by simply adjusting the number of ALD cycles. We also discuss the limitations of our ALD approach, and suggest ways to overcome these.

  12. Polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey,Thomas M. (Los Alamos, NM); Burrell,Anthony K. (Los Alamos, NM); Jia,Quanxi (Los Alamos, NM); Lin,Yuan (Chandler, AZ)

    2012-02-28

    A polymer assisted deposition process for deposition of metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be conformal on a variety of substrates including non-planar substrates. In some instances, the films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  13. Dual ion beam assisted deposition of biaxially textured template layers

    DOE Patents [OSTI]

    Groves, James R.; Arendt, Paul N.; Hammond, Robert H.

    2005-05-31

    The present invention is directed towards a process and apparatus for epitaxial deposition of a material, e.g., a layer of MgO, onto a substrate such as a flexible metal substrate, using dual ion beams for the ion beam assisted deposition whereby thick layers can be deposited without degradation of the desired properties by the material. The ability to deposit thicker layers without loss of properties provides a significantly broader deposition window for the process.

  14. Suspension chemistry and electrophoretic deposition of zirconia electrolyte on conducting and non-conducting substrates

    SciTech Connect (OSTI)

    Das, Debasish; Basu, Rajendra N.

    2013-09-01

    Graphical abstract: - Highlights: Stable suspension of yttria stabilized zirconia (YSZ) obtained in isopropanol medium. Suspension chemistry and process parameters for electrophoretic deposition optimized. Deposited film quality changed with iodine and water (dispersants) concentration. Dense YSZ film (?5 ?m) fabricated onto non-conducting porous NiO-YSZ anode substrate. - Abstract: Suspensions of 8 mol% yttria stabilized zirconia (YSZ) particulates in isopropanol medium are prepared using acetylacetone, iodine and water as dispersants. The effect of dispersants concentration on suspension stability, particle size distribution, electrical conductivity and pH of the suspensions are studied in detail to optimize the suspension chemistry. Electrophoretic deposition (EPD) has been conducted to produce thin and dense YSZ electrolyte films. Deposition kinetics have been studied in depth and good quality films on conducting substrate are obtained at an applied voltage of 15 V for 3 min. YSZ films are also fabricated on non-conducting NiO-YSZ anode substrate using a steel plate on the reverse side of the substrate. Upon co-firing at 1400 C for 6 h a dense YSZ film of thickness ?5 ?m is obtained. Such a half cell (anode + electrolyte) can be used to fabricate a solid oxide fuel cell on applying a suitable cathode layer.

  15. Photochemical Deposition of Semiconductor Thin Films and Their Application for Solar Cells and Gas Sensors

    SciTech Connect (OSTI)

    Ichimura, M.; Gunasekaran, M.; Sueyoshi, T.

    2009-06-01

    The photochemical deposition (PCD) technique was applied for solar cells and gas sensors. CdS and Cd{sub 1-x}Zn{sub x}S were deposited by PCD. Thiosulfate ions S{sub 2}O{sub 3}{sup 2-} act as a reductant and a sulfur source. The SnS absorption layer was deposited by three-step pulse electrochemical deposition. For the CdS/SnS structure, the best cell showed an efficiency of about 0.2%, while for the Cd{sub 1-x}Zn{sub x}S/SnS structure, an efficiency of up to 0.7% was obtained. For the gas sensor application, SnO{sub 2} was deposited by PCD from a solution containing SnSO{sub 4} and HNO{sub 3}. To enhance the sensitivity to hydrogen, Pd was doped by the photochemical doping method. The current increased by a factor of 10{sup 4} upon exposure to 5000 ppm hydrogen within 1 min at room temperature. 10{sup 3} times conductivity increase was observed even for 50 ppm hydrogen.

  16. Atomic layer deposition of nanoporous biomaterials.

    SciTech Connect (OSTI)

    Narayan, R. J.; Adiga, S. P.; Pellin, M. J.; Curtiss, L. A.; Stafslien, S.; Chisholm, B.; Monteiro-Riviere, N. A.; Brigmon, R. L.; Elam, J. W.; Univ. of North Carolina; North Carolina State Univ.; Eastman Kodak Co.; North Dakota State Univ.; SRL

    2010-03-01

    Due to its chemical stability, uniform pore size, and high pore density, nanoporous alumina is being investigated for use in biosensing, drug delivery, hemodialysis, and other medical applications. In recent work, we have examined the use of atomic layer deposition for coating the surfaces of nanoporous alumina membranes. Zinc oxide coatings were deposited on nanoporous alumina membranes using atomic layer deposition. The zinc oxide-coated nanoporous alumina membranes demonstrated antimicrobial activity against Escherichia coli and Staphylococcus aureus bacteria. These results suggest that atomic layer deposition is an attractive technique for modifying the surfaces of nanoporous alumina membranes and other nanostructured biomaterials. Nanoporous alumina, also known as anodic aluminum oxide (AAO), is a nanomaterial that exhibits several unusual properties, including high pore densities, straight pores, small pore sizes, and uniform pore sizes. In 1953, Keller et al. showed that anodizing aluminum in acid electrolytes results in a thick layer of nearly cylindrical pores, which are arranged in a close-packed hexagonal cell structure. More recently, Matsuda & Fukuda demonstrated preparation of highly ordered platinum and gold nanohole arrays using a replication process. In this study, a negative structure of nanoporous alumina was initially fabricated and a positive structure of a nanoporous metal was subsequently fabricated. Over the past fifteen years, nanoporous alumina membranes have been used as templates for growth of a variety of nanostructured materials, including nanotubes, nanowires, nanorods, and nanoporous membranes.

  17. Chemical vapor deposition of aluminum oxide

    DOE Patents [OSTI]

    Gordon, Roy; Kramer, Keith; Liu, Xinye

    2000-01-01

    An aluminum oxide film is deposited on a heated substrate by CVD from one or more alkylaluminum alkoxide compounds having composition R.sub.n Al.sub.2 (OR').sub.6-n, wherein R and R' are alkyl groups and n is in the range of 1 to 5.

  18. Plasma deposition of amorphous metal alloys

    DOE Patents [OSTI]

    Hays, Auda K. (Albuquerque, NM)

    1986-01-01

    Amorphous metal alloy coatings are plasma-deposited by dissociation of vapors of organometallic compounds and metalloid hydrides in the presence of a reducing gas, using a glow discharge. Tetracarbonylnickel, phosphine, and hydrogen constitute a typical reaction mixture of the invention, yielding a NiPC alloy.

  19. Uniform insulation applied-B ion diode

    DOE Patents [OSTI]

    Seidel, David B. (Albuquerque, NM); Slutz, Stephen A. (Albuquerque, NM)

    1988-01-01

    An applied-B field extraction ion diode has uniform insulation over an anode surface for increased efficiency. When the uniform insulation is accomplished with anode coils, and a charge-exchange foil is properly placed, the ions may be focused at a point on the z axis.

  20. How to Apply for Senior Executive positions

    Broader source: Energy.gov [DOE]

    To apply vacancies for SENIOR EXECUTIVE SERVICE (SES) , SENIOR LEVEL (SL), SCIENTIFIC AND PROFESSIONAL (ST) positions within the Department of Energy please visit OPM's website: http://www.usajobs.gov. From this site, you may download announcements for vacancies of interest to you.

  1. High Gradient Accelerator Cavities Using Atomic Layer Deposition

    SciTech Connect (OSTI)

    Ives, Robert Lawrence; Parsons, Gregory; Williams, Philip; Oldham, Christopher; Mundy, Zach; Dolgashev, Valery

    2014-12-09

    In the Phase I program, Calabazas Creek Research, Inc. (CCR), in collaboration with North Carolina State University (NCSU), fabricated copper accelerator cavities and used Atomic Layer Deposition (ALD) to apply thin metal coatings of tungsten and platinum. It was hypothesized that a tungsten coating would provide a robust surface more resistant to arcing and arc damage. The platinum coating was predicted to reduce processing time by inhibiting oxides that form on copper surfaces soon after machining. Two sets of cavity parts were fabricated. One was coated with 35 nm of tungsten, and the other with approximately 10 nm of platinum. Only the platinum cavity parts could be high power tested during the Phase I program due to schedule and funding constraints. The platinum coated cavity exhibit poor performance when compared with pure copper cavities. Not only did arcing occur at lower power levels, but the processing time was actually longer. There were several issues that contributed to the poor performance. First, machining of the base copper cavity parts failed to achieve the quality and cleanliness standards specified to SLAC National Accelerator Center. Secondly, the ALD facilities were not configured to provide the high levels of cleanliness required. Finally, the nanometer coating applied was likely far too thin to provide the performance required. The coating was ablated or peeled from the surface in regions of high fields. It was concluded that the current ALD process could not provide improved performance over cavities produced at national laboratories using dedicated facilities.

  2. Method for depositing layers of high quality semiconductor material

    DOE Patents [OSTI]

    Guha, Subhendu (Troy, MI); Yang, Chi C. (Troy, MI)

    2001-08-14

    Plasma deposition of substantially amorphous semiconductor materials is carried out under a set of deposition parameters which are selected so that the process operates near the amorphous/microcrystalline threshold. This threshold varies as a function of the thickness of the depositing semiconductor layer; and, deposition parameters, such as diluent gas concentrations, must be adjusted as a function of layer thickness. Also, this threshold varies as a function of the composition of the depositing layer, and in those instances where the layer composition is profiled throughout its thickness, deposition parameters must be adjusted accordingly so as to maintain the amorphous/microcrystalline threshold.

  3. Filtered cathodic arc deposition apparatus and method

    DOE Patents [OSTI]

    Krauss, Alan R. (24461 W. Blvd. De John, Naperville, IL 60564)

    1999-01-01

    A filtered cathodic arc deposition method and apparatus for the production of highly dense, wear resistant coatings which are free from macro particles. The filtered cathodic arc deposition apparatus includes a cross shaped vacuum chamber which houses a cathode target having an evaporable surface comprised of the coating material, means for generating a stream of plasma, means for generating a transverse magnetic field, and a macro particle deflector. The transverse magnetic field bends the generated stream of plasma in the direction of a substrate. Macro particles are effectively filtered from the stream of plasma by traveling, unaffected by the transverse magnetic field, along the initial path of the plasma stream to a macro particle deflector. The macro particle deflector has a preformed surface which deflects macro particles away from the substrate.

  4. Methods for patterned deposition on a substrate

    DOE Patents [OSTI]

    Rye, R.R.; Ricco, A.J.; Hampden-Smith, M.J.; Kodas, T.T.

    1995-01-10

    A method is described for patterned depositions of a material onto a substrate. A surface of a polymeric substrate is first etched so as to form an etched layer having enhanced adhesions characteristics and then selected portions of the etched layer are removed so as to define a pattern having enhanced and diminished adhesion characteristics for the deposition of a conductor onto the remaining etched layer. In one embodiment, a surface of a PTFE substrate is chemically etched so as to improve the adhesion of copper thereto. Thereafter, selected portions of the etched surface are irradiated with a laser beam so as to remove the etched selected portions of the etched surface and form patterns of enhanced and diminished adhesion of copper thereto. 5 figures.

  5. Methods for patterned deposition on a substrate

    DOE Patents [OSTI]

    Rye, Robert R. (Albuquerque, NM); Ricco, Antonio J. (Albuquerque, NM); Hampden-Smith, M. J. (Albuquerque, NM); Kodas, T. T. (Albuquerque, NM)

    1995-01-01

    A method is described for patterned depositions of a material onto a substrate. A surface of a polymeric substrate is first etched so as to form an etched layer having enhanced adhesions characteristics and then selected portions of the etched layer are removed so as to define a pattern having enhanced and diminished adhesion characteristics for the deposition of a conductor onto the remaining etched layer. In one embodiment, a surface of a PTFE substrate is chemically etched so as to improve the adhesion of copper thereto. Thereafter, selected portions of the etched surface are irradiated with a laser beam so as to remove the etched selected portions of the etched surface and form patterns of enhanced and diminished adhesion of copper thereto.

  6. Substrate heater for thin film deposition

    DOE Patents [OSTI]

    Foltyn, Steve R. (111 Beryl St., Los Alamos, NM 87544)

    1996-01-01

    A substrate heater for thin film deposition of metallic oxides upon a target substrate configured as a disk including means for supporting in a predetermined location a target substrate configured as a disk, means for rotating the target substrate within the support means, means for heating the target substrate within the support means, the heating means about the support means and including a pair of heating elements with one heater element situated on each side of the predetermined location for the target substrate, with one heater element defining an opening through which desired coating material can enter for thin film deposition and with the heating means including an opening slot through which the target substrate can be entered into the support means, and, optionally a means for thermal shielding of the heating means from surrounding environment is disclosed.

  7. Surface acoustic wave dust deposition monitor

    DOE Patents [OSTI]

    Fasching, G.E.; Smith, N.S. Jr.

    1988-02-12

    A system is disclosed for using the attenuation of surface acoustic waves to monitor real time dust deposition rates on surfaces. The system includes a signal generator, a tone-burst generator/amplifier connected to a transmitting transducer for converting electrical signals into acoustic waves. These waves are transmitted through a path defining means adjacent to a layer of dust and then, in turn, transmitted to a receiving transducer for changing the attenuated acoustic wave to electrical signals. The signals representing the attenuated acoustic waves may be amplified and used in a means for analyzing the output signals to produce an output indicative of the dust deposition rates and/or values of dust in the layer. 8 figs.

  8. Ultrashort pulse laser deposition of thin films

    DOE Patents [OSTI]

    Perry, Michael D.; Banks, Paul S.; Stuart, Brent C.

    2002-01-01

    Short pulse PLD is a viable technique of producing high quality films with properties very close to that of crystalline diamond. The plasma generated using femtosecond lasers is composed of single atom ions with no clusters producing films with high Sp.sup.3 /Sp.sup.2 ratios. Using a high average power femtosecond laser system, the present invention dramatically increases deposition rates to up to 25 .mu.m/hr (which exceeds many CVD processes) while growing particulate-free films. In the present invention, deposition rates is a function of laser wavelength, laser fluence, laser spot size, and target/substrate separation. The relevant laser parameters are shown to ensure particulate-free growth, and characterizations of the films grown are made using several diagnostic techniques including electron energy loss spectroscopy (EELS) and Raman spectroscopy.

  9. Stationary phase deposition based on onium salts

    DOE Patents [OSTI]

    Wheeler, David R. (Albuquerque, NM); Lewis, Patrick R. (Albuquerque, NM); Dirk, Shawn M. (Albuquerque, NM); Trudell, Daniel E. (Albuquerque, NM)

    2008-01-01

    Onium salt chemistry can be used to deposit very uniform thickness stationary phases on the wall of a gas chromatography column. In particular, the stationary phase can be bonded to non-silicon based columns, especially microfabricated metal columns. Non-silicon microfabricated columns may be manufactured and processed at a fraction of the cost of silicon-based columns. In addition, the method can be used to phase-coat conventional capillary columns or silicon-based microfabricated columns.

  10. Electrostatic force assisted deposition of graphene

    DOE Patents [OSTI]

    Liang, Xiaogan (Berkeley, CA)

    2011-11-15

    An embodiment of a method of depositing graphene includes bringing a stamp into contact with a substrate over a contact area. The stamp has at least a few layers of the graphene covering the contact area. An electric field is developed over the contact area. The stamp is removed from the vicinity of the substrate which leaves at least a layer of the graphene substantially covering the contact area.

  11. Apparatus and method for photochemical vapor deposition

    DOE Patents [OSTI]

    Jackson, Scott C. (Wilmington, DE); Rocheleau, Richard E. (Wilmington, DE)

    1987-03-31

    A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.

  12. DEPOSITION OF METAL ON NONMETAL FILAMENT

    DOE Patents [OSTI]

    Magel, T.T.

    1959-02-10

    A method is described for purifying metallic uranium by passing a halogen vapor continuously over the impure uranium to form uranium halide vapor and immediately passing the halide vapor into contact with a nonmetallic refractory surface which is at a temperature above the melting point of uranium metal. The halide is decomposed at the heated surface depositing molten metal, which collects and falls into a receiver below.

  13. Nanotube array controlled carbon plasma deposition

    SciTech Connect (OSTI)

    Qian, Shi; Cao, Huiliang; Liu, Xuanyong; Ding, Chuanxian

    2013-06-17

    Finding approaches to control the elementary processes of plasma-solid interactions and direct the fluxes of matter at nano-scales becomes an important aspect in science. This letter reports that, by taking advantages of the spacing characteristics of discrete TiO{sub 2} nanotube arrays, the flying trajectories and the subsequent implantation and deposition manner of energetic carbon ions can be directed and controlled to fabricate hollow conical arrays. The study provides an alternative method for plasma nano-manufacturing.

  14. Applied Cathode Enhancement and Robustness Technologies (ACERT)

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Accelerators, Electrodynamics » ACERT Applied Cathode Enhancement and Robustness Technologies (ACERT) World leading experts from fields of accelerator design & testing, chemical synthesis of nanomaterials, and shielding application of nanomaterials. thumbnail of Nathan Moody Nathan Moody Principal Investigator (PI) Email ACERT Logo Team Our project team, a part of Los Alamos National Laboratory (LANL) comprised of world leading experts from fields of accelerator design & testing,

  15. Chemical deposition methods using supercritical fluid solutions

    DOE Patents [OSTI]

    Sievers, Robert E. (Boulder, CO); Hansen, Brian N. (Boulder, CO)

    1990-01-01

    A method for depositing a film of a desired material on a substrate comprises dissolving at least one reagent in a supercritical fluid comprising at least one solvent. Either the reagent is capable of reacting with or is a precursor of a compound capable of reacting with the solvent to form the desired product, or at least one additional reagent is included in the supercritical solution and is capable of reacting with or is a precursor of a compound capable of reacting with the first reagent or with a compound derived from the first reagent to form the desired material. The supercritical solution is expanded to produce a vapor or aerosol and a chemical reaction is induced in the vapor or aerosol so that a film of the desired material resulting from the chemical reaction is deposited on the substrate surface. In an alternate embodiment, the supercritical solution containing at least one reagent is expanded to produce a vapor or aerosol which is then mixed with a gas containing at least one additional reagent. A chemical reaction is induced in the resulting mixture so that a film of the desired material is deposited.

  16. Solvothermal Thin Film Deposition of Electron Blocking Layers | ANSER

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Center | Argonne-Northwestern National Laboratory Solvothermal Thin Film Deposition of Electron Blocking Layers Home > Research > ANSER Research Highlights > Solvothermal Thin Film Deposition of Electron Blocking Layers

  17. THE ELECTRICAL PROPERTIES OF NATIVE AND DEPOSITED THIN ALUMINUM...

    Office of Scientific and Technical Information (OSTI)

    ... Soc., 121,1322 (1974). 10.0. Glemser, Z. Elektrochem, 45,865 (1939). 1 2 3 4 5 Voltage 0 Fig. I. Current-voltage characteris- tics for as-deposited and hydrated ECR deposited A1 ...

  18. Microsoft Word - Deposition Request Form Rev10-12.doc

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Deposition Request Form rev10/12-sm Personal Contact Information Date: ____/____/______ Name:_________________________________ Phone #__________________ E-Mail_____________________________ Project Reference Number: _________________________ Dept _________________ Professor _____________________________ Professor Email ________________________________ Substrate Description ( substrate provided by user) Total Number of Substrates: ________ Deposition Specifications Film

  19. Plasma-based ion implantation and deposition: A review of physics,technology, and applications

    SciTech Connect (OSTI)

    Pelletier, Jacques; Anders, Andre

    2005-05-16

    After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used of PBII&D to produce surgical implants, bio- and blood-compatible surfaces and coatings, etc. With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures. We use the acronym PBII&D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.

  20. CX-012557: Categorical Exclusion Determination | Department of Energy

    Energy Savers [EERE]

    2557: Categorical Exclusion Determination CX-012557: Categorical Exclusion Determination Electrodepositon of Molybdenum, NickelMolybdenum alloy, Cesium, and Strontium CX(s) Applied: B3.6 Date: 41876 Location(s): South Carolina Offices(s): Savannah River Operations Office Molybdenum (Mo) metal or NickelMolybdenum (NiMo) alloy will be plated from solutions. Non-radioactive Cesium (Cs) or Strontium (Sr) will be electrochemically deposited from solution. Document(s) Available for Download PDF icon

  1. Formation of amorphous metal alloys by chemical vapor deposition

    DOE Patents [OSTI]

    Mullendore, A.W.

    1988-03-18

    Amorphous alloys are deposited by a process of thermal dissociation of mixtures of organometallic compounds and metalloid hydrides,e.g., transition metal carbonyl, such as nickel carbonyl and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit. 1 fig.

  2. Formation of amorphous metal alloys by chemical vapor deposition

    DOE Patents [OSTI]

    Mullendore, Arthur W.

    1990-01-01

    Amorphous alloys are deposited by a process of thermal dissociation of mixtures or organometallic compounds and metalloid hydrides, e.g., transition metal carbonyl such as nickel carbonyl, and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit.

  3. Microstructure, Phase Formation, and Stress of Reactively-Deposited Metal

    Office of Scientific and Technical Information (OSTI)

    Hydride Thin Films (Technical Report) | SciTech Connect Microstructure, Phase Formation, and Stress of Reactively-Deposited Metal Hydride Thin Films Citation Details In-Document Search Title: Microstructure, Phase Formation, and Stress of Reactively-Deposited Metal Hydride Thin Films This document summarizes research of reactively deposited metal hydride thin films and their properties. Reactive deposition processes are of interest, because desired stoichiometric phases are created in a

  4. Liquid-Phase Deposition of Silicon Nanocrystal Films - Energy Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Portal Liquid-Phase Deposition of Silicon Nanocrystal Films University of Minnesota DOE Grant Recipients Contact GRANT About This Technology Technology Marketing Summary Silicon Nanocrystal Deposition A method to deposit colloidal silicon nanocrystal thin films using a liquid-phase process has been developed. The method lowers costs because the films are deposited unfunctionalized (no insulating ligand termination). The process allows for precise control of the size of the crystals; giving

  5. Borehole Logging Methods for Exploration and Evaluation of Uranium Deposits

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    (1967) | Department of Energy Borehole Logging Methods for Exploration and Evaluation of Uranium Deposits (1967) Borehole Logging Methods for Exploration and Evaluation of Uranium Deposits (1967) Borehole Logging Methods for Exploration and Evaluation of Uranium Deposits (1967) PDF icon Borehole Logging Methods for Exploration and Evaluation of Uranium Deposits (1967) More Documents & Publications Gamma-Ray Logging Workshop (February 1981) Grade Assignments for Models Used for

  6. Low-Temperature Engineering Algorithm of Deposition Risk

    Energy Science and Technology Software Center (OSTI)

    1992-12-08

    LEADER is designed to qualitatively predict the potential coal ash deposition in an utility boiler in convective pass heat exchange surfaces below 1850 F. This program concentrates on those deposits which develop their strength through sulfation and not silicate sintering. Massive deposits that form on the upstream sides of boiler tubes at higher temperatures are not considered in this model.

  7. Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

    SciTech Connect (OSTI)

    Park, Taeyong; Lee, Jaesang; Park, Jingyu; Jeon, Heeyoung; Jeon, Hyeongtag; Lee, Ki-Hoon; Cho, Byung-Chul; Kim, Moo-Sung; Ahn, Heui-Bok

    2012-01-15

    Ruthenium thin films were deposited on argon plasma-treated SiO{sub 2} and untreated SiO{sub 2} substrates by remote plasma atomic layer deposition using bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp){sub 2}] as a Ru precursor and ammonia plasma as a reactant. The results of in situ Auger electron spectroscopy (AES) analysis indicate that the initial transient region of Ru deposition was decreased by Ar plasma treatment at 400 deg. C, but did not change significantly at 300 deg. C The deposition rate exhibited linearity after continuous film formation and the deposition rates were about 1.7 A/cycle and 0.4 A/cycle at 400 deg. C and 300 deg. C, respectively. Changes of surface energy and polar and dispersive components were measured by the sessile drop test. The quantity of surface amine groups was measured from the surface nitrogen concentration with AES. Furthermore, the Ar plasma-treated SiO{sub 2} contained more amine groups and less hydroxyl groups on the surface than on untreated SiO{sub 2}. Auger spectra exhibited chemical shifts by Ru-O bonding, and larger shifts were observed on untreated substrates due to the strong adhesion of Ru films.

  8. Applied Energy Programs, SPO-AE: LANL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Kevin Ott 505-663-5537 Program Administrator Jutta Kayser 505-663-5649 Program Manager Karl Jonietz 505-663-5539 Program Manager Melissa Fox 505-663-5538 Budget Analyst Fawn Gore 505-665-0224 The Applied Energy Program Office (SPO-AE) manages Los Alamos National Laboratory programs funded by the Department of Energy's Offices of Energy Efficiency/Renewable Energy, Electricity Delivery and Energy Reliability, and Fossil Energy. With energy use increasing across the nation and the world, Los

  9. Apply for a Job | Argonne National Laboratory

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    FAQs Answers to frequently asked questions about applying for a job at Argonne A Note About Privacy We do not ask you for personally identifiable information such as birthdate, social security number, or driver's license number. To ensure your privacy, please do not include such information in the documents that you upload to the system A Note About File Size Our application system has a file size limit of 820KB. While this is sufficient for the vast majority of documents, we have found that

  10. In-place stabilization of pond ash deposits by hydrated lime columns

    SciTech Connect (OSTI)

    Chand, S.K.; Subbarao, C.

    2007-12-15

    Abandoned coal ash ponds cover up vast stretches of precious land and cause environmental problems. Application of suitable in situ stabilization methods may bring about improvement in the geotechnical properties of the ash deposit as a whole, converting it to a usable site. In this study, a technique of in-place stabilization by hydrated lime columns was applied to large-scale laboratory models of ash ponds. Samples collected from different radial distances and different depths of the ash deposit were tested to study the improvements in the water content, dry density, particle size distribution, unconfined compressive strength, pH, hydraulic conductivity, and leachate characteristics over a period of one year. The in-place stabilization by lime column technique has been found effective in increasing the unconfined compressive strength and reducing hydraulic conductivity of pond ash deposits in addition to modifying other geotechnical parameters. The method has also proved to be useful in reducing the contamination potential of the ash leachates, thus mitigating the adverse environmental effects of ash deposits.

  11. 2009 Applied and Environmental Microbiology GRC

    SciTech Connect (OSTI)

    Nicole Dubilier

    2009-07-12

    The topic of the 2009 Gordon Conference on Applied and Environmental Microbiology is: From Single Cells to the Environment. The Conference will present and discuss cutting-edge research on applied and environmental microbiology with a focus on understanding interactions between microorganisms and the environment at levels ranging from single cells to complex communities. The Conference will feature a wide range of topics such as single cell techniques (including genomics, imaging, and NanoSIMS), microbial diversity at scales ranging from clonal to global, environmental 'meta-omics', biodegradation and bioremediation, metal - microbe interactions, animal microbiomes and symbioses. The Conference will bring together investigators who are at the forefront of their field, and will provide opportunities for junior scientists and graduate students to present their work in poster format and exchange ideas with leaders in the field. Some poster presenters will be selected for short talks. The collegial atmosphere of this Conference, with extensive discussion sessions as well as opportunities for informal gatherings in the afternoons and evenings, provides an ideal setting for scientists from different disciplines to exchange ideas, brainstorm and discuss cross-disciplinary collaborations.

  12. Methods of electrophoretic deposition for functionally graded...

    Office of Scientific and Technical Information (OSTI)

    includes adding particles of an impurity and a solution to an EPD chamber, applying a voltage difference across the two electrodes of the EPD chamber to create an electric field...

  13. Vapor-deposited porous films for energy conversion

    DOE Patents [OSTI]

    Jankowski, Alan F.; Hayes, Jeffrey P.; Morse, Jeffrey D.

    2005-07-05

    Metallic films are grown with a "spongelike" morphology in the as-deposited condition using planar magnetron sputtering. The morphology of the deposit is characterized by metallic continuity in three dimensions with continuous and open porosity on the submicron scale. The stabilization of the spongelike morphology is found over a limited range of the sputter deposition parameters, that is, of working gas pressure and substrate temperature. This spongelike morphology is an extension of the features as generally represented in the classic zone models of growth for physical vapor deposits. Nickel coatings were deposited with working gas pressures up 4 Pa and for substrate temperatures up to 1000 K. The morphology of the deposits is examined in plan and in cross section views with scanning electron microscopy (SEM). The parametric range of gas pressure and substrate temperature (relative to absolute melt point) under which the spongelike metal deposits are produced appear universal for other metals including gold, silver, and aluminum.

  14. FY 1990 Applied Sciences Branch annual report

    SciTech Connect (OSTI)

    Keyes, B.M.; Dippo, P.C.

    1991-11-01

    The Applied Sciences Branch actively supports the advancement of DOE/SERI goals for the development and implementation of the solar photovoltaic technology. The primary focus of the laboratories is to provide state-of-the-art analytical capabilities for materials and device characterization and fabrication. The branch houses a comprehensive facility which is capable of providing information on the full range of photovoltaic components. A major objective of the branch is to aggressively pursue collaborative research with other government laboratories, universities, and industrial firms for the advancement of photovoltaic technologies. Members of the branch disseminate research findings to the technical community in publications and presentations. This report contains information on surface and interface analysis, materials characterization, development, electro-optical characterization module testing and performance, surface interactions and FTIR spectroscopy.

  15. Method for applying a high-temperature bond coat on a metal substrate, and related compositions and articles

    DOE Patents [OSTI]

    Hasz, Wayne Charles; Sangeeta, D

    2006-04-18

    A method for applying a bond coat on a metal-based substrate is described. A slurry which contains braze material and a volatile component is deposited on the substrate. The slurry can also include bond coat material. Alternatively, the bond coat material can be applied afterward, in solid form or in the form of a second slurry. The slurry and bond coat are then dried and fused to the substrate. A repair technique using this slurry is also described, along with related compositions and articles.

  16. Method for applying a high-temperature bond coat on a metal substrate, and related compositions and articles

    DOE Patents [OSTI]

    Hasz, Wayne Charles (Pownal, VT); Sangeeta, D (Cincinnati, OH)

    2002-01-01

    A method for applying a bond coat on a metal-based substrate is described. A slurry which contains braze material and a volatile component is deposited on the substrate. The slurry can also include bond coat material. Alternatively, the bond coat material can be applied afterward, in solid form or in the form of a second slurry. The slurry and bond coat are then dried and fused to the substrate. A repair technique using this slurry is also described, along with related compositions and articles.

  17. DEVELOPMENT OF DEPOSIT DETECTION SYSTEM IN PIPELINES OF THE STEELWORKS USING CS-137 GAMMA-RAY

    SciTech Connect (OSTI)

    Song, Won-Joon; Lee, Seung-Hee; Jeong, Hee-Dong

    2008-02-28

    The deposit is built up in the pipeline of the steelworks by the chemical reaction among COG (coke oven gas), BFG (blast furnace gas), moisture, and steel in the high temperature environment and obstructs the smooth gas flow. In this study a gamma-ray system is developed to detect the deposit accumulated in pipelines and calculate the accumulation rate with respect to the cross section area of pipes. Cs-137 is used as the gamma-ray source and the system is designed to apply to pipes of various diameters. This system also includes the DB for storage and display of the measurement results so that it can be used for the efficient management of the pipelines.

  18. Methods of electrophoretic deposition for functionally graded porous nanostructures and systems thereof

    DOE Patents [OSTI]

    Worsley, Marcus A; Baumann, Theodore F; Satcher, Joe H; Olson, Tammy Y; Kuntz, Joshua D; Rose, Klint A

    2015-03-03

    In one embodiment, an aerogel includes a layer of shaped particles having a particle packing density gradient in a thickness direction of the layer, wherein the shaped particles are characterized by being formed in an electrophoretic deposition (EPD) process using an impurity. In another embodiment, a method for forming a functionally graded porous nanostructure includes adding particles of an impurity and a solution to an EPD chamber, applying a voltage difference across the two electrodes of the EPD chamber to create an electric field in the EPD chamber, and depositing the material onto surfaces of the particles of the impurity to form shaped particles of the material. Other functionally graded materials and methods are described according to more embodiments.

  19. Apparatus and method for pulsed laser deposition of materials on wires and pipes

    DOE Patents [OSTI]

    Fernandez, Felix E. (Mayaguez, PR)

    2003-01-01

    Methods and apparatuses are disclosed which allow uniform coatings to be applied by pulsed laser deposition (PLD) on inner and outer surfaces of cylindrical objects, such as rods, pipes, tubes, and wires. The use of PLD makes this technique particularly suitable for complex multicomponent materials, such as superconducting ceramics. Rigid objects of any length, i.e., pipes up to a few meters, and with diameters from less than 1 centimeter to over 10 centimeters can be coated using this technique. Further, deposition is effected simultaneously onto an annular region of the pipe wall. This particular arrangement simplifies the apparatus, reduces film uniformity control difficulties, and can result in faster operation cycles. In addition, flexible wires of any length can be continuously coated using the disclosed invention.

  20. Ultra-low loading Pt nanocatalysts prepared by atomic layer deposition on carbon aerogels

    SciTech Connect (OSTI)

    King, J S; Wittstock, A; Biener, J; Kucheyev, S O; Wang, Y M; Baumann, T F; Giri, S; Hamza, A V; Baeumer, M; Bent, S F

    2008-04-21

    Using atomic layer deposition (ALD), we show that Pt nanoparticles can be deposited on the inner surfaces of carbon aerogels (CA). The resultant Pt-loaded materials exhibit high catalytic activity for the oxidation of CO even at loading levels as low as {approx}0.05 mg Pt/cm{sup 2}. We observe a conversion efficiency of nearly 100% in the temperatures range 150-250 C, and the total conversion rate seems to be only limited by the thermal stability of our CA support in ambient oxygen. Our ALD approach described here is universal in nature, and can be applied to the design of new catalytic materials for a variety of applications, including fuel cells, hydrogen storage, pollution control, green chemistry, and liquid fuel production.

  1. Electrochemically deposited BiTe-based nanowires for thermoelectric applications

    SciTech Connect (OSTI)

    Ng, Inn-Khuan; Kok, Kuan-Ying; Rahman, Che Zuraini Che Ab; Saidin, Nur Ubaidah; Ilias, Suhaila Hani; Choo, Thye-Foo

    2014-02-12

    Nanostructured materials systems such as thin-films and nanowires (NWs) are promising for thermoelectric power generation and refrigeration compared to traditional counterparts in bulk, due to their enhanced thermoelectric figures-of-merit. BiTe and its derivative compounds, in particular, are well-known for their near-room temperature thermoelectric performance. In this work, both the binary and ternary BiTe-based nanowires namely, BiTe and BiSbTe, were synthesized using template-assisted electrodeposition. Diameters of the nanowires were controlled by the pore sizes of the anodised alumina (AAO) templates used. Systematic study on the compositional change as a function of applied potential was carried out via Linear Sweep Voltanmetry (LSV). Chemical compositions of the nanowires were studied using Energy Dispersive X-ray Spectrometry (EDXS) and their microstructures evaluated using diffraction and imaging techniques. Results from chemical analysis on the nanowires indicated that while the Sb content in BiSbTe nanowires increased with more negative deposition potentials, the formation of Te{sup 0} and Bi{sub 2}Te{sub 3} were favorable at more positive potentials.

  2. Hydroquinone-ZnO nano-laminate deposited by molecular-atomic layer deposition

    SciTech Connect (OSTI)

    Huang, Jie; Lucero, Antonio T.; Cheng, Lanxia; Kim, Jiyoung; Hwang, Hyeon Jun; Ha, Min-Woo

    2015-03-23

    In this study, we have deposited organic-inorganic hybrid semiconducting hydroquinone (HQ)/zinc oxide (ZnO) superlattices using molecular-atomic layer deposition, which enables accurate control of film thickness, excellent uniformity, and sharp interfaces at a low deposition temperature (150 °C). Self-limiting growth of organic layers is observed for the HQ precursor on ZnO surface. Nano-laminates were prepared by varying the number of HQ to ZnO cycles in order to investigate the physical and electrical effects of different HQ to ZnO ratios. It is indicated that the addition of HQ layer results in enhanced mobility and reduced carrier concentration. The highest Hall mobility of approximately 2.3 cm{sup 2}/V·s and the lowest n-type carrier concentration of approximately 1.0 × 10{sup 18}/cm{sup 3} were achieved with the organic-inorganic superlattice deposited with a ratio of 10 ZnO cycles to 1 HQ cycle. This study offers an approach to tune the electrical transport characteristics of ALD ZnO matrix thin films using an organic dopant. Moreover, with organic embedment, this nano-laminate material may be useful for flexible electronics.

  3. Rational Catalyst Design Applied to Development of Advanced Oxidation...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Rational Catalyst Design Applied to Development of Advanced Oxidation Catalysts for Diesel Emission Control Rational Catalyst Design Applied to Development of Advanced Oxidation ...

  4. Energy Department Extends Deadline to Apply for START Tribal...

    Energy Savers [EERE]

    Extends Deadline to Apply for START Tribal Renewable Energy Project Development Assistance to May 22, 2015 Energy Department Extends Deadline to Apply for START Tribal Renewable...

  5. Tritium research activities in Safety and Tritium Applied Research...

    Office of Environmental Management (EM)

    research activities in Safety and Tritium Applied Research (STAR) facility, Idaho National Laboratory Tritium research activities in Safety and Tritium Applied Research (STAR)...

  6. James Webb Space Telescope: PM Lessons Applied - Eric Smith,...

    Energy Savers [EERE]

    James Webb Space Telescope: PM Lessons Applied - Eric Smith, Deputy Program Director, NASA James Webb Space Telescope: PM Lessons Applied - Eric Smith, Deputy Program Director,...

  7. Opportunities to Apply Phase Change Materials to Building Enclosures...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Opportunities to Apply Phase Change Materials to Building Enclosures Webinar Opportunities to Apply Phase Change Materials to Building Enclosures Webinar Slides from the Building...

  8. Applying physics, teamwork to fusion energy science | Princeton Plasma

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Physics Lab Applying physics, teamwork to fusion energy science American Fusion News Category: Massachusetts Institute of Technology (MIT) Link: Applying physics, teamwork to fusion energy science

  9. 2008 Annual Merit Review Results Summary - 2. Applied Battery...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    2. Applied Battery Research 2008 Annual Merit Review Results Summary - 2. Applied Battery Research DOE Vehicle Technologies Annual Merit Review PDF icon 2008meritreview2.pdf...

  10. Advanced Multivariate Analysis Tools Applied to Surface Analysis...

    Office of Scientific and Technical Information (OSTI)

    Advanced Multivariate Analysis Tools Applied to Surface Analysis. Citation Details In-Document Search Title: Advanced Multivariate Analysis Tools Applied to Surface Analysis. No...

  11. Statistical and Domain Analytics Applied to PV Module Lifetime...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Statistical and Domain Analytics Applied to PV Module Lifetime and Degradation Science Statistical and Domain Analytics Applied to PV Module Lifetime and Degradation Science...

  12. Optical Diagnostics and Modeling Tools Applied to Diesel HCCI...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Optical Diagnostics and Modeling Tools Applied to Diesel HCCI Optical Diagnostics and Modeling Tools Applied to Diesel HCCI 2002 DEER Conference Presentation: Caterpillar Engine...

  13. Magnetic relaxometry as applied to sensitive cancer detection...

    Office of Scientific and Technical Information (OSTI)

    relaxometry as applied to sensitive cancer detection and localization Title: Magnetic relaxometry as applied to sensitive cancer detection and localization Here we describe ...

  14. Applying the Battery Ownership Model in Pursuit of Optimal Battery...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Applying the Battery Ownership Model in Pursuit of Optimal Battery Use Strategies Applying the Battery Ownership Model in Pursuit of Optimal Battery Use Strategies 2012 DOE ...

  15. Artificial intelligence technologies applied to terrain analysis

    SciTech Connect (OSTI)

    Wright, J.C. ); Powell, D.R. )

    1990-01-01

    The US Army Training and Doctrine Command is currently developing, in cooperation with Los Alamos National Laboratory, a Corps level combat simulation to support military analytical studies. This model emphasizes high resolution modeling of the command and control processes, with particular attention to architectural considerations that enable extension of the model. A planned future extension is the inclusion of an computer based planning capability for command echelons that can be dynamical invoked during the execution of then model. Command and control is the process through which the activities of military forces are directed, coordinated, and controlled to achieve the stated mission. To perform command and control the commander must understand the mission, perform terrain analysis, understand his own situation and capabilities as well as the enemy situation and his probable actions. To support computer based planning, data structures must be available to support the computer's ability to understand'' the mission, terrain, own capabilities, and enemy situation. The availability of digitized terrain makes it feasible to apply artificial intelligence technologies to emulate the terrain analysis process, producing data structures for uses in planning. The work derived thus for to support the understanding of terrain is the topic of this paper. 13 refs., 5 figs., 6 tabs.

  16. Vacuum deposition and curing of liquid monomers

    DOE Patents [OSTI]

    Affinito, J.D.

    1995-03-07

    The present invention is the formation of solid polymer layers under vacuum. More specifically, the present invention is the use of ``standard`` polymer layer-making equipment that is generally used in an atmospheric environment in a vacuum, and degassing the monomer material prior to injection into the vacuum. Additional layers of polymer or metal or oxide may be vacuum deposited onto solid polymer layers. Formation of polymer layers under a vacuum improves material and surface characteristics, and subsequent quality of bonding to additional layers. Further advantages include use of less to no photoinitiator for curing, faster curing, fewer impurities in the polymer electrolyte, as well as improvement in material properties including no trapped gas resulting in greater density, and reduced monomer wetting angle that facilitates spreading of the monomer and provides a smoother finished surface.

  17. Vacuum deposition and curing of liquid monomers

    DOE Patents [OSTI]

    Affinito, John D. (Richland, WA)

    1993-01-01

    The present invention is the formation of solid polymer layers under vacuum. More specifically, the present invention is the use of "standard" polymer layer-making equipment that is generally used in an atmospheric environment in a vacuum, and degassing the monomer material prior to injection into the vacuum. Additional layers of polymer or metal may be vacuum deposited onto solid polymer layers. Formation of polymer layers under a vacuum improves material and surface characteristics, and subsequent quality of bonding to additional layers. Further advantages include use of less to no photoinitiator for curing, faster curing, fewer impurities in the polymer electrolyte, as well as improvement in material properties including no trapped gas resulting in greater density, and reduced monomer wetting angle that facilitates spreading of the monomer and provides a smoother finished surface.

  18. Vacuum deposition and curing of liquid monomers

    DOE Patents [OSTI]

    Affinito, John D. (Kennewick, WA)

    1995-01-01

    The present invention is the formation of solid polymer layers under vacuum. More specifically, the present invention is the use of "standard" polymer layer-making equipment that is generally used in an atmospheric environment in a vacuum, and degassing the monomer material prior to injection into the vacuum. Additional layers of polymer or metal or oxide may be vacuum deposited onto solid polymer layers. Formation of polymer layers under a vacuum improves material and surface characteristics, and subsequent quality of bonding to additional layers. Further advantages include use of less to no photoinitiator for curing, faster curing, fewer impurities in the polymer electrolyte, as well as improvement in material properties including no trapped gas resulting in greater density, and reduced monomer wetting angle that facilitates spreading of the monomer and provides a smoother finished surface.

  19. Vacuum deposition and curing of liquid monomers

    DOE Patents [OSTI]

    Affinito, J.D.

    1993-11-09

    The present invention is the formation of solid polymer layers under vacuum. More specifically, the present invention is the use of standard polymer layer-making equipment that is generally used in an atmospheric environment in a vacuum, and degassing the monomer material prior to injection into the vacuum. Additional layers of polymer or metal may be vacuum deposited onto solid polymer layers. Formation of polymer layers under a vacuum improves material and surface characteristics, and subsequent quality of bonding to additional layers. Further advantages include use of less to no photoinitiator for curing, faster curing, fewer impurities in the polymer electrolyte, as well as improvement in material properties including no trapped gas resulting in greater density, and reduced monomer wetting angle that facilitates spreading of the monomer and provides a smoother finished surface.

  20. Electro-deposition of superconductor oxide films

    DOE Patents [OSTI]

    Bhattacharya, Raghu N. (Littleton, CO)

    2001-01-01

    Methods for preparing high quality superconducting oxide precursors which are well suited for further oxidation and annealing to form superconducting oxide films. The method comprises forming a multilayered superconducting precursor on a substrate by providing an electrodeposition bath comprising an electrolyte medium and a substrate electrode, and providing to the bath a plurality of precursor metal salts which are capable of exhibiting superconducting properties upon subsequent treatment. The superconducting precursor is then formed by electrodepositing a first electrodeposited (ED) layer onto the substrate electrode, followed by depositing a layer of silver onto the first electrodeposited (ED) layer, and then electrodepositing a second electrodeposited (ED) layer onto the Ag layer. The multilayered superconducting precursor is suitable for oxidation at a sufficient annealing temperature in air or an oxygen-containing atmosphere to form a crystalline superconducting oxide film.

  1. Method and apparatus for electrospark deposition

    DOE Patents [OSTI]

    Bailey, Jeffrey A.; Johnson, Roger N.; Park, Walter R.; Munley, John T.

    2004-12-28

    A method and apparatus for controlling electrospark deposition (ESD) comprises using electrical variable waveforms from the ESD process as a feedback parameter. The method comprises measuring a plurality of peak amplitudes from a series of electrical energy pulses delivered to an electrode tip. The maximum peak value from among the plurality of peak amplitudes correlates to the contact force between the electrode tip and a workpiece. The method further comprises comparing the maximum peak value to a set point to determine an offset and optimizing the contact force according to the value of the offset. The apparatus comprises an electrode tip connected to an electrical energy wave generator and an electrical signal sensor, which connects to a high-speed data acquisition card. An actuator provides relative motion between the electrode tip and a workpiece by receiving a feedback drive signal from a processor that is operably connected to the actuator and the high-speed data acquisition card.

  2. CX-009418: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Electron Beam Melting CX(s) Applied: None applied. Date: 10/30/2012 Location(s): Missouri Offices(s): Kansas City Site Office

  3. CX-009420: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Additive Manufacturing Using EOSINT M280 CX(s) Applied: None applied. Date: 10/30/2012 Location(s): Missouri Offices(s): Kansas City Site Office

  4. CX-009419: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Magnetic Pulser CX(s) Applied: None applied. Date: 10/30/2012 Location(s): Missouri Offices(s): Kansas City Site Office

  5. Nanostructure templating using low temperature atomic layer deposition

    DOE Patents [OSTI]

    Grubbs, Robert K.; Bogart, Gregory R.; Rogers, John A.

    2011-12-20

    Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.

  6. Pulsed laser deposition of AlMgB14 thin films

    SciTech Connect (OSTI)

    Russell, Alan; Bastawros, Ashraf; Tan, Xiaoli

    2008-11-18

    Hard, wear-resistant coatings of thin film borides based on AlMgB{sub 14} have the potential to be applied industrially to improve the tool life of cutting tools and pump vanes and may account for several million dollars in savings as a result of reduced wear on these parts. Past work with this material has shown that it can have a hardness of up to 45GPa and be fabricated into thin films with a similar hardness using pulsed laser deposition. These films have already been shown to be promising for industrial applications. Cutting tools coated with AlMgB{sub 14} used to mill titanium alloys have been shown to substantially reduce the wear on the cutting tool and extend its cutting life. However, little research into the thin film fabrication process using pulsed laser deposition to make AlMgB{sub 14} has been conducted. In this work, research was conducted into methods to optimize the deposition parameters for the AlMgB{sub 14} films. Processing methods to eliminate large particles on the surface of the AlMgB{sub 14} films, produce films that were at least 1m thick, reduce the surface roughness of the films, and improve the adhesion of the thin films were investigated. Use of a femtosecond laser source rather than a nanosecond laser source was found to be effective in eliminating large particles considered detrimental to wear reduction properties from the films. Films produced with the femtosecond laser were also found to be deposited at a rate 100 times faster than those produced with the nanosecond laser. However, films produced with the femtosecond laser developed a relatively high RMS surface roughness around 55nm. Attempts to decrease the surface roughness were largely unsuccessful. Neither increasing the surface temperature of the substrate during deposition nor using a double pulse to ablate the material was found to be extremely successful to reduce the surface roughness. Finally, the adhesion of the thin films to M2 tool steel substrates, assessed using the Rockwell C indentation adhesion test, was found to be substantially improved by the deposition of a titanium interlayer, but unaffected by increasing the temperature of the substrates. The titanium was found to improve the adhesion strength of the films because it reacted with both the steel and the AlMgB{sub 14} compound to form new compounds. Ultimately, it was concluded that the films with the best properties were produced with a femtosecond pulsed laser and were deposited on top of a titanium interlayer to improve the thin film adhesion.

  7. Atmospheric Pressure Deposition for Electrochromic Windows | Department of

    Office of Environmental Management (EM)

    Energy Atmospheric Pressure Deposition for Electrochromic Windows Atmospheric Pressure Deposition for Electrochromic Windows Emerging Technologies Project for the 2013 Building Technologies Office's Program Peer Review PDF icon emrgtech22_tenent_040413.pdf More Documents & Publications NREL senior scientist, Robert Tenent, Ph.D., with equipment for low cost processing (deposition) of window coatings materials. Dynamic Windows Low-Cost Solutions for Dynamic Window Material CX-003799:

  8. Deposition method for producing silicon carbide high-temperature semiconductors

    DOE Patents [OSTI]

    Hsu, George C. (La Crescenta, CA); Rohatgi, Naresh K. (W. Corine, CA)

    1987-01-01

    An improved deposition method for producing silicon carbide high-temperature semiconductor material comprising placing a semiconductor substrate composed of silicon carbide in a fluidized bed silicon carbide deposition reactor, fluidizing the bed particles by hydrogen gas in a mildly bubbling mode through a gas distributor and heating the substrate at temperatures around 1200.degree.-1500.degree. C. thereby depositing a layer of silicon carbide on the semiconductor substrate.

  9. Inhomogeneity smoothing using density valley formed by ion beam deposition

    Office of Scientific and Technical Information (OSTI)

    in ICF fuel pellet (Journal Article) | SciTech Connect Inhomogeneity smoothing using density valley formed by ion beam deposition in ICF fuel pellet Citation Details In-Document Search Title: Inhomogeneity smoothing using density valley formed by ion beam deposition in ICF fuel pellet We study the beam non-uniformity smoothing effect of the radiation transport in the density valley formed by an ion-beam deposition in an ion-beam inertial confinement fusion pellets by numerical simulation.

  10. Atomic Layer Deposition for Stabilization of Amorphous Silicon Anodes |

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Department of Energy Atomic Layer Deposition for Stabilization of Amorphous Silicon Anodes Atomic Layer Deposition for Stabilization of Amorphous Silicon Anodes 2012 DOE Hydrogen and Fuel Cells Program and Vehicle Technologies Program Annual Merit Review and Peer Evaluation Meeting PDF icon es145_dillon_2012_p.pdf More Documents & Publications Nanostructured Metal Oxide Anodes Atomic Layer Deposition for Stabilization of Silicon Anodes Development of Industrially Viable Battery Electrode

  11. Dual Layer Solid State Thin Film Deposition - Energy Innovation Portal

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Energy Storage Energy Storage Find More Like This Return to Search Dual Layer Solid State Thin Film Deposition National Renewable Energy Laboratory Contact NREL About This Technology <em>The dual-layered electrolyte material can be deposited at different vacuum pressures to suit desired physical properties such as high ionic conductivity, mechanical fracture toughness, and low diffusion constant for atmospheric gases. </em> The dual-layered electrolyte material can be deposited at

  12. Eulerian CFD Models to Predict Thermophoretic Deposition of Soot Particles

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    in EGR Coolers | Department of Energy Eulerian CFD Models to Predict Thermophoretic Deposition of Soot Particles in EGR Coolers Eulerian CFD Models to Predict Thermophoretic Deposition of Soot Particles in EGR Coolers This paper describes an Eulerian axisymmetric method in Fluent(R) to predict the overall heat transfer reduction of a surrogate tube due to thermophoretic deposition of submicron particles. PDF icon deer11_abarham.pdf More Documents & Publications Vehicle Technologies

  13. EGR Cooler Fouling - Visualization of Deposition and Removal Mechanis |

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Department of Energy Fouling - Visualization of Deposition and Removal Mechanis EGR Cooler Fouling - Visualization of Deposition and Removal Mechanis Presents experimental data on exhaust gas recirculation(EGR) cooler fouling using new test apparatus that allows for in-situ observation of deposition and removal processes PDF icon deer11_styles.pdf More Documents & Publications Factors Impacting EGR Cooler Fouling - Main Effects and Interactions Materials Issues Associated with EGR

  14. CFD Analysis of Particle Deposition During DPF Filtration Processes |

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Department of Energy Analysis of Particle Deposition During DPF Filtration Processes CFD Analysis of Particle Deposition During DPF Filtration Processes A 3-D DPF model is developed to predict thermo-physical properties during filtration processes and to quantitatively investigate particle deposition regarding its size and number distribution. PDF icon p-14_lee.pdf More Documents & Publications Particulate Emissions Control by Advanced Filtration Systems or GDI Engines Development of

  15. CFD Analysis of Particle Deposition During DPF Filtration Processes...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    particle deposition regarding its size and number distribution. PDF icon p-14lee.pdf More Documents & Publications Particulate Emissions Control by Advanced Filtration...

  16. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, P.; Carey, P.G.; Smith, P.M.; Ellingboe, A.R.

    1999-06-29

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique is disclosed. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques. 2 figs.

  17. A radon progeny deposition model (Journal Article) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    backgrounds, also problematic is the deposition of radon progeny on detector materials. Exposure to radon at any stage of assembly of an experiment can result in surface...

  18. Atomic Layer Deposition for Stabilization of Amorphous Silicon...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Documents & Publications Nanostructured Metal Oxide Anodes Atomic Layer Deposition for Stabilization of Silicon Anodes Development of Industrially Viable Battery Electrode Coatings...

  19. EGR Cooler Fouling - Visualization of Deposition and Removal...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    EGR Cooler Fouling - Visualization of Deposition and Removal Mechanis Presents experimental data on exhaust gas recirculation(EGR) cooler fouling using new test apparatus that...

  20. Method of depositing a high-emissivity layer

    DOE Patents [OSTI]

    Wickersham, Charles E. (Columbus, OH); Foster, Ellis L. (Powell, OH)

    1983-01-01

    A method of depositing a high-emissivity layer on a substrate comprising RF sputter deposition of a carbide-containing target in an atmosphere of a hydrocarbon gas and a noble gas. As the carbide is deposited on the substrate the hydrocarbon gas decomposes to hydrogen and carbon. The carbon deposits on the target and substrate causing a carbide/carbon composition gradient to form on the substrate. At a sufficiently high partial pressure of hydrocarbon gas, a film of high-emissivity pure carbon will eventually form over the substrate.

  1. Remote Detection of Quaternary Borate Deposits with ASTER Satellite...

    Open Energy Info (EERE)

    Deposits with ASTER Satellite Imagery as a Geothermal Exploration Tool Abstract In the Great Basin of the western United States, geothermal fluids are sometimes associated with...

  2. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Ellingboe, Albert R. (Fremont, CA)

    1999-01-01

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  3. USE OF ATOMIC LAYER DEPOSITION OF FUNCTIONALIZATION OF NANOPOROUS BIOMATERIALS

    SciTech Connect (OSTI)

    Brigmon, R.; Narayan, R.; Adiga, S.; Pellin, M.; Curtiss, L.; Stafslien, S.; Chisholm, B.; Monteiro-Riviere, N.; Elam, J.

    2010-02-08

    Due to its chemical stability, uniform pore size, and high pore density, nanoporous alumina is being investigated for use in biosensing, drug delivery, hemodialysis, and other medical applications. In recent work, we have examined the use of atomic layer deposition for coating the surfaces of nanoporous alumina membranes. Zinc oxide coatings were deposited on nanoporous alumina membranes using atomic layer deposition. The zinc oxide-coated nanoporous alumina membranes demonstrated antimicrobial activity against Escherichia coli and Staphylococcus aureus bacteria. These results suggest that atomic layer deposition is an attractive technique for modifying the surfaces of nanoporous alumina membranes and other nanostructured biomaterials.

  4. OLEDWORKS DEVELOPS INNOVATIVE HIGH-PERFORMANCE DEPOSITION TECHNOLOGY...

    Energy Savers [EERE]

    high-performance deposition technology that addresses two major aspects of this manufacturing cost: the expense of organic materials per area of useable product, and the...

  5. System and Method for Sealing a Vapor Deposition Source - Energy...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    costs and minimizes system downtime for cleaning Applications and Industries Thin film solar Deposition of any thin film Patents and Patent Applications ID Number Title and...

  6. Development and Characterization of a Spray Deposited CNT/PVDF...

    Office of Scientific and Technical Information (OSTI)

    Conference: Development and Characterization of a Spray Deposited CNTPVDF Thin Film. ... Country of Publication: United States Language: English Word Cloud More Like This Full ...

  7. Active Geothermal Systems And Associated Gold Deposits In The...

    Open Energy Info (EERE)

    Geothermal Systems And Associated Gold Deposits In The Great Basin Jump to: navigation, search OpenEI Reference LibraryAdd to library Conference Paper: Active Geothermal Systems...

  8. Methodology for Improved Adhesion for Deposited Fluorinated Transparen...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Advanced Materials Advanced Materials Find More Like This Return to Search Methodology for Improved Adhesion for Deposited Fluorinated Transparent Conducting Oxide Films on a...

  9. Atomic Layer Deposition and in Situ Characterization of Ultraclean...

    Office of Scientific and Technical Information (OSTI)

    Hydroxide Citation Details In-Document Search Title: Atomic Layer Deposition and in Situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide Authors: Kozen,...

  10. Analysis Of Hot Springs And Associated Deposits In Yellowstone...

    Open Energy Info (EERE)

    Spaceborne Thermal Emission and Reflection Radiometer (ASTER) and the Airborne VisibleIR Image Spectrometer (AVIRIS) data were used to characterize hot spring deposits in the...

  11. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Jose, CA); Ellingboe, Albert R. (Malahide, IE)

    2008-01-01

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  12. Rhyolites and Associated Deposits of the Valles-Toledo Caldera...

    Open Energy Info (EERE)

    Complex Jump to: navigation, search OpenEI Reference LibraryAdd to library Journal Article: Rhyolites and Associated Deposits of the Valles-Toledo Caldera Complex Abstract...

  13. Fabrication of Conductive Paths on a Fused Deposition Modeling Substrate using Inkjet Deposition

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Zhou, Wenchao; List, III, Frederick Alyious; Duty, Chad E.; Babu, Sudarsanam Suresh

    2015-01-15

    Inkjet deposition is one of the most attractive fabrication techniques for producing cost efficient and lightweight electronic devices on various substrates with low environmental impact. Fused Deposition Modeling (FDM) is one of the most used and reliable additive manufacturing processes by extrusion of wire-shaped thermoplastic materials, which provides an opportunity for embedding printed electronics into mechanical structures during the building process and enables the design of compact smart structures that can sense and adapt to their own state and the environment. This paper represents one of the first explorations of integrating inkjet deposition of silver nanoparticle inks with the FDMmore » process for making compact electro-mechanical structures. Three challenges have been identified and investigated, including the discontinuity of the printed lines resulting from the irregular surface of the FDM substrate, the non-conductivity of the printed lines due to the particle segregation during the droplet drying process, and the slow drying process caused by the skinning effect . Two different techniques are developed in this paper to address the issue of continuity of the printed lines, including surface ironing and a novel thermal plow technique that plows a channel in the FDM substrate to seal off the pores in the substrate and contain the deposited inks. Two solutions are also found for obtaining conductivity from the continuous printed lines, including porous surface coating and using a more viscous ink with larger nanoparticle size. Then the effects of the printing and post-processing parameters on the conductivity are examined. It is found that post-processing is a dominant factor in determining the conductivity of the printed lines.« less

  14. Germanium films by polymer-assisted deposition

    DOE Patents [OSTI]

    Jia, Quanxi; Burrell, Anthony K.; Bauer, Eve; Ronning, Filip; McCleskey, Thomas Mark; Zou, Guifu

    2013-01-15

    Highly ordered Ge films are prepared directly on single crystal Si substrates by applying an aqueous coating solution having Ge-bound polymer onto the substrate and then heating in a hydrogen-containing atmosphere. A coating solution was prepared by mixing water, a germanium compound, ethylenediaminetetraacetic acid, and polyethyleneimine to form a first aqueous solution and then subjecting the first aqueous solution to ultrafiltration.

  15. Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films

    SciTech Connect (OSTI)

    Altuntas, Halit E-mail: biyikli@unam.bilkent.edu.tr; Ozgit-Akgun, Cagla; Donmez, Inci; Biyikli, Necmi E-mail: biyikli@unam.bilkent.edu.tr

    2015-04-21

    Here, we report on the current transport mechanisms in AlN thin films deposited at a low temperature (i.e., 200?C) on p-type Si substrates by plasma-enhanced atomic layer deposition. Structural characterization of the deposited AlN was carried out using grazing-incidence X-ray diffraction, revealing polycrystalline films with a wurtzite (hexagonal) structure. Al/AlN/ p-Si metal-insulator-semiconductor (MIS) capacitor structures were fabricated and investigated under negative bias by performing current-voltage measurements. As a function of the applied electric field, different types of current transport mechanisms were observed; i.e., ohmic conduction (15.221.5 MV/m), Schottky emission (23.639.5 MV/m), Frenkel-Poole emission (63.8211.8 MV/m), trap-assisted tunneling (226280 MV/m), and Fowler-Nordheim tunneling (290447 MV/m). Electrical properties of the insulating AlN layer and the fabricated Al/AlN/p-Si MIS capacitor structure such as dielectric constant, flat-band voltage, effective charge density, and threshold voltage were also determined from the capacitance-voltage measurements.

  16. Application of Radial Basis Functional Link Networks to Exploration for Proterozoic Mineral Deposits in Central Iran

    SciTech Connect (OSTI)

    Behnia, Pouran [Geological Survey of Iran, Geomatics Department (Iran, Islamic Republic of)], E-mail: pouranb@yahoo.com

    2007-06-15

    The metallogeny of Central Iran is characterized mainly by the presence of several iron, apatite, and uranium deposits of Proterozoic age. Radial Basis Function Link Networks (RBFLN) were used as a data-driven method for GIS-based predictive mapping of Proterozoic mineralization in this area. To generate the input data for RBFLN, the evidential maps comprising stratigraphic, structural, geophysical, and geochemical data were used. Fifty-eight deposits and 58 'nondeposits' were used to train the network. The operations for the application of neural networks employed in this study involve both multiclass and binary representation of evidential maps. Running RBFLN on different input data showed that an increase in the number of evidential maps and classes leads to a larger classification sum of squared error (SSE). As a whole, an increase in the number of iterations resulted in the improvement of training SSE. The results of applying RBFLN showed that a successful classification depends on the existence of spatially well distributed deposits and nondeposits throughout the study area.

  17. Electroplating method for producing ultralow-mass fissionable deposits

    DOE Patents [OSTI]

    Ruddy, Francis H. (Monroeville, PA)

    1989-01-01

    A method for producing ultralow-mass fissionable deposits for nuclear reactor dosimetry is described, including the steps of holding a radioactive parent until the radioactive parent reaches secular equilibrium with a daughter isotope, chemically separating the daughter from the parent, electroplating the daughter on a suitable substrate, and holding the electroplated daughter until the daughter decays to the fissionable deposit.

  18. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride

    DOE Patents [OSTI]

    Lowden, Richard A. (Powell, TN)

    1994-01-01

    A process for chemical vapor deposition of crystalline silicon nitride which comprises the steps of: introducing a mixture of a silicon source, a molybdenum source, a nitrogen source, and a hydrogen source into a vessel containing a suitable substrate; and thermally decomposing the mixture to deposit onto the substrate a coating comprising crystalline silicon nitride containing a dispersion of molybdenum silicide.

  19. Method of depositing epitaxial layers on a substrate

    DOE Patents [OSTI]

    Goyal, Amit

    2003-12-30

    An epitaxial article and method for forming the same includes a substrate having a textured surface, and an electrochemically deposited substantially single orientation epitaxial layer disposed on and in contact with the textured surface. The epitaxial article can include an electromagnetically active layer and an epitaxial buffer layer. The electromagnetically active layer and epitaxial buffer layer can also be deposited electrochemically.

  20. Sputter deposition for multi-component thin films

    DOE Patents [OSTI]

    Krauss, Alan R. (Plainfield, IL); Auciello, Orlando (Cary, NC)

    1990-01-01

    Ion beam sputter-induced deposition using a single ion beam and a multicomponent target is capable of reproducibly producing thin films of arbitrary composition, including those which are close to stoichiometry. Using a quartz crystal deposition monitor and a computer controlled, well-focused ion beam, this sputter-deposition approach is capable of producing metal oxide superconductors and semiconductors of the superlattice type such as GaAs-AlGaAs as well as layered metal/oxide/semiconductor/superconductor structures. By programming the dwell time for each target according to the known sputtering yield and desired layer thickness for each material, it is possible to deposit composite films from a well-controlled sub-monolayer up to thicknesses determined only by the available deposition time. In one embodiment, an ion beam is sequentially directed via a set of X-Y electrostatic deflection plates onto three or more different element or compound targets which are constituents of the desired film. In another embodiment, the ion beam is directed through an aperture in the deposition plate and is displaced under computer control to provide a high degree of control over the deposited layer. In yet another embodiment, a single fixed ion beam is directed onto a plurality of sputter targets in a sequential manner where the targets are each moved in alignment with the beam under computer control in forming a multilayer thin film. This controlled sputter-deposition approach may also be used with laser and electron beams.

  1. Sputter deposition for multi-component thin films

    DOE Patents [OSTI]

    Krauss, A.R.; Auciello, O.

    1990-05-08

    Ion beam sputter-induced deposition using a single ion beam and a multicomponent target is capable of reproducibly producing thin films of arbitrary composition, including those which are close to stoichiometry. Using a quartz crystal deposition monitor and a computer controlled, well-focused ion beam, this sputter-deposition approach is capable of producing metal oxide superconductors and semiconductors of the superlattice type such as GaAs-AlGaAs as well as layered metal/oxide/semiconductor/superconductor structures. By programming the dwell time for each target according to the known sputtering yield and desired layer thickness for each material, it is possible to deposit composite films from a well-controlled sub-monolayer up to thicknesses determined only by the available deposition time. In one embodiment, an ion beam is sequentially directed via a set of X-Y electrostatic deflection plates onto three or more different element or compound targets which are constituents of the desired film. In another embodiment, the ion beam is directed through an aperture in the deposition plate and is displaced under computer control to provide a high degree of control over the deposited layer. In yet another embodiment, a single fixed ion beam is directed onto a plurality of sputter targets in a sequential manner where the targets are each moved in alignment with the beam under computer control in forming a multilayer thin film. This controlled sputter-deposition approach may also be used with laser and electron beams. 10 figs.

  2. Method of and apparatus for determining deposition-point temperature

    DOE Patents [OSTI]

    Mansure, A.J.; Spates, J.J.; Martin, S.J.

    1998-10-27

    Acoustic-wave sensor apparatus and method are disclosed for analyzing a normally liquid petroleum-based composition for monitoring deposition-point temperature. The apparatus includes at least one acoustic-wave device such as SAW, QCM, FPM, TSM or APM type devices in contact with the petroleum-based composition for sensing or detecting the surface temperature at which deposition occurs and/or rate of deposition as a function of temperature by sensing an accompanying change in frequency, phase shift, damping voltage or damping current of an electrical oscillator to a known calibrated condition. The acoustic wave device is actively cooled to monitor the deposition of constituents such as paraffins by determining the point at which solids from the liquid composition begin to form on the acoustic wave device. The acoustic wave device can be heated to melt or boil off the deposits to reset the monitor and the process can be repeated. 5 figs.

  3. Method of and apparatus for determining deposition-point temperature

    DOE Patents [OSTI]

    Mansure, Arthur J. (Albuquerque, NM); Spates, James J. (Albuquerque, NM); Martin, Stephen J. (Albuquerque, NM)

    1998-01-01

    Acoustic-wave sensor apparatus and method for analyzing a normally liquid petroleum-based composition for monitoring deposition-point temperature. The apparatus includes at least one acoustic-wave device such as SAW, QCM, FPM, TSM or APM type devices in contact with the petroleum-based composition for sensing or detecting the surface temperature at which deposition occurs and/or rate of deposition as a function of temperature by sensing an accompanying change in frequency, phase shift, damping voltage or damping current of an electrical oscillator to a known calibrated condition. The acoustic wave device is actively cooled to monitor the deposition of constituents such as paraffins by determining the point at which solids from the liquid composition begin to form on the acoustic wave device. The acoustic wave device can be heated to melt or boil off the deposits to reset the monitor and the process can be repeated.

  4. How to make deposition of images a reality

    SciTech Connect (OSTI)

    Guss, J. Mitchell; McMahon, Brian

    2014-10-01

    An analysis is performed of the technical and financial challenges to be overcome if deposition of primary experimental data is to become routine. The IUCr Diffraction Data Deposition Working Group is investigating the rationale and policies for routine deposition of diffraction images (and other primary experimental data sets). An information-management framework is described that should inform policy directions, and some of the technical and other issues that need to be addressed in an effort to achieve such a goal are analysed. In the near future, routine data deposition could be encouraged at one of the growing number of institutional repositories that accept data sets or at a generic data-publishing web repository service. To realise all of the potential benefits of depositing diffraction data, specialized archives would be preferable. Funding such an initiative will be challenging.

  5. Analysis of the magnetic corrosion product deposits on a boiling water reactor cladding

    SciTech Connect (OSTI)

    Orlov, Andrey; Degueldre, Claude; Kaufmann, Wilfried

    2013-01-15

    The buildup of corrosion product deposits (CRUD) on the fuel cladding of the boiling water reactor (BWR) before and after zinc injection has been investigated by applying local experimental analytical techniques. Under the BWR water chemistry conditions, Zn addition together with the presence of Ni and Mn induce the formation of (Zn,Ni,Mn)[Fe{sub 2}O{sub 4}] spinel solid solutions. X-ray absorption spectroscopy (XAS) revealed inversion ratios of cation distribution in spinels deposited from the solid solution. Based on this information, a two-site ferrite spinel solid solution model is proposed. Electron probe microanalysis (EPMA) and extended X-ray absorption fine structure (EXAFS) findings suggest the zinc-rich ferrite spinels formation on BWR fuel cladding mainly at lower pin. - Graphical Abstract: Analysis of spinels in corrosion product deposits on boiling water reactor fuel rod. Combining EPMA and XAFS results: schematic representation of the ferrite spinels in terms of the end members and their extent of inversion. Note that the ferrites are represented as a surface between the normal (upper plane, M[Fe{sub 2}]O{sub 4}) and the inverse (lower plane, Fe[MFe]O{sub 4}). Actual compositions red Black-Small-Square for the specimen at low elevation (810 mm), blue Black-Small-Square for the specimen at mid elevation (1800 mm). The results have an impact on the properties of the CRUD material. Highlights: Black-Right-Pointing-Pointer Buildup of corrosion product deposits on fuel claddings of a boiling water reactor (BWR) are investigated. Black-Right-Pointing-Pointer Under BWR water conditions, Zn addition with Ni and Mn induced formation of (Zn,Ni,Mn)[Fe{sub 2}O{sub 4}]. Black-Right-Pointing-Pointer X-Ray Adsorption Spectroscopy (XAS) revealed inversion of cations in spinel solid solutions. Black-Right-Pointing-Pointer Zinc-rich ferrite spinels are formed on BWR fuel cladding mainly at lower pin elevations.

  6. X-Ray Photoelectron Spectroscopy (XPS) Applied to Soot & What...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Photoelectron Spectroscopy (XPS) Applied to Soot & What It Can Do for You X-Ray Photoelectron Spectroscopy (XPS) Applied to Soot & What It Can Do for You Presentation given at DEER...

  7. DOE - Office of Legacy Management -- Case School of Applied Science...

    Office of Legacy Management (LM)

    Case School of Applied Science Ohio State University - OH 0-01 FUSRAP Considered Sites Site: Case School of Applied Science, Ohio State University (OH.0-01 ) Eliminated from...

  8. Oregon Learning About and Applying for Water Rights Webpage ...

    Open Energy Info (EERE)

    Learning About and Applying for Water Rights Webpage Jump to: navigation, search OpenEI Reference LibraryAdd to library Web Site: Oregon Learning About and Applying for Water...

  9. Risk assessment based on point source deposition

    SciTech Connect (OSTI)

    Chadwick, G.F.

    1997-12-31

    The International Joint Commission (IJC) in a recently published report states that various clean-up techniques have resulted in significantly cleaner lakes than 20 years ago. Both the US EPA and Environment Canada have passed laws that require emissions controls on significant sources of contaminants. Improved emission controls have played a large part in the reduced pollution levels to the Great Lakes. Improved controls have significantly reduced the pollutants deposited to both land and water. This paper will discuss a Risk Analysis for the emissions from a Hospital in Rochester, New York. Current New York Department of Environmental Conservation (DEC) regulations require emission controls on such incinerators. This hospital has added both a scrubber and a bag house to control emissions. Twenty years ago, such incinerators, like many other emission sources would not have had control devices. New York`s Department of Environmental Conservation requires, as part of the Permitting process, that an Impact Analysis and if required, a multipathway Health Risk Assessment (HRA) be performed for all Medical Waste Incinerators before a Permit can be issued. This insures that the emissions will not create a health hazard to humans. Such an analysis was performed for a new 1,000 lb/hr Medical Waste Incinerator (MWI) installed in the North-East part of Rochester, New York. An Air Quality Impact Assessment (AQIA) based on an actual stack test indicated that this facility`s dioxin emissions would exceed the NY DEC Guideline levels. The Carcinogenic Risk (of death) for our most exposed individual (MEI) was calculated to be 8.75 E{sup {minus}06} (<1:100,000). The Hazard Index calculated for this MEI was 0.43. Hazard Index`s less then 1 are considered a reasonable risk. Health risk assessments are by design, very conservative. EPA sources have concluded that calculated death risks between one (1) and one hundred (100) per million are not excessive.

  10. Fluorine contamination in yttrium-doped barium zirconate film deposited by atomic layer deposition

    SciTech Connect (OSTI)

    An Jihwan; Beom Kim, Young; Sun Park, Joong; Hyung Shim, Joon; Guer, Turgut M.; Prinz, Fritz B.

    2012-01-15

    The authors have investigated the change of chemical composition, crystallinity, and ionic conductivity in fluorine contaminated yttrium-doped barium zirconate (BYZ) fabricated by atomic layer deposition (ALD). It has been identified that fluorine contamination can significantly affect the conductivity of the ALD BYZ. The authors have also successfully established the relationship between process temperature and contamination and the source of fluorine contamination, which was the perfluoroelastomer O-ring used for vacuum sealing. The total removal of fluorine contamination was achieved by using all-metal sealed chamber instead of O-ring seals.

  11. Aachen University of Applied Sciences | Open Energy Information

    Open Energy Info (EERE)

    Aachen University of Applied Sciences Place: Germany Sector: Services Product: General Financial & Legal Services ( Academic Research foundation ) References: Aachen...

  12. Applied Process Engineering Laborotory APEL | Open Energy Information

    Open Energy Info (EERE)

    Engineering Laborotory (APEL) Place: United States Sector: Services Product: General Financial & Legal Services ( Private family-controlled ) References: Applied Process...

  13. Applying for PMCDP/FPD Certification (initial) | Department of Energy

    Energy Savers [EERE]

    Services » Career Development (PMCDP) » Applying for PMCDP/FPD Certification (initial) Applying for PMCDP/FPD Certification (initial) Certification applicants are nominated by their respective Program Secretarial Office (PSO) to apply for FPD certification - candidates may not apply without program sponsorship. Each participating program has a dedicated point of contact (POC) whose role is to support the FPD applicant in preparing their certification package. First time applicants, as well as

  14. Attenuation-Based Remedies in the Subsurface Applied Field Research

    Energy Savers [EERE]

    Initiative (ABRS AFRI) | Department of Energy Attenuation-Based Remedies in the Subsurface Applied Field Research Initiative (ABRS AFRI) Attenuation-Based Remedies in the Subsurface Applied Field Research Initiative (ABRS AFRI) Attenuation-Based Remedies in the Subsurface Applied Field Research Initiative (ABRS AFRI) Located at the Savannah River Site in Aiken, South Carolina, the Attenuation-Based Remedies in the Subsurface Applied Field Research Initiative (ABRS AFRI) was established to

  15. Vehicle Technologies Office: Applied Battery Research | Department of

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Energy Applied Battery Research Vehicle Technologies Office: Applied Battery Research Applied battery research addresses the barriers facing the lithium-ion systems that are closest to meeting the technical energy and power requirements for hybrid electric vehicle (HEV) and electric vehicle (EV) applications. In addition, applied battery research concentrates on technology transfer to ensure that the research results and lessons learned are effectively provided to U.S. automotive and battery

  16. Review of Natural Phenomena Hazards (NPH) Requirements Currently Applied to

    Office of Environmental Management (EM)

    the Thomas Jefferson National Accelerator Facility (TJNAF) | Department of Energy Review of Natural Phenomena Hazards (NPH) Requirements Currently Applied to the Thomas Jefferson National Accelerator Facility (TJNAF) Review of Natural Phenomena Hazards (NPH) Requirements Currently Applied to the Thomas Jefferson National Accelerator Facility (TJNAF) Review of Natural Phenomena Hazards (NPH) Requirements Currently Applied to the Thomas Jefferson National Accelerator Facility (TJNAF) By:

  17. Overview of Applied Battery Research | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    10 DOE Vehicle Technologies and Hydrogen Programs Annual Merit Review and Peer Evaluation Meeting, June 7-11, 2010 -- Washington D.C. PDF icon es014_henriksen_2010_o.pdf More Documents & Publications Overview of Applied Battery Research Overview and Progress of the Applied Battery Research (ABR) Activity Overview and Progress of the Applied Battery Research (ABR) Activity

  18. Applied Mathematics | U.S. DOE Office of Science (SC)

    Office of Science (SC) Website

    Applied Mathematics Advanced Scientific Computing Research (ASCR) ASCR Home About Research Applied Mathematics Applied Mathematics Conferences And Workshops Computer Science Next Generation Networking Scientific Discovery through Advanced Computing (SciDAC) ASCR SBIR-STTR Facilities Science Highlights Benefits of ASCR Funding Opportunities Advanced Scientific Computing Advisory Committee (ASCAC) Community Resources Contact Information Advanced Scientific Computing Research U.S. Department of

  19. Atomic and molecular layer deposition for surface modification

    SciTech Connect (OSTI)

    Vh-Nissi, Mika; Sievnen, Jenni; Salo, Erkki; Heikkil, Pirjo; Kentt, Eija; Johansson, Leena-Sisko; Koskinen, Jorma T.; Harlin, Ali

    2014-06-01

    Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gassolid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. However, thin even non-uniform atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid. - Graphical abstract: Print quality of a polylactide film surface modified with atomic layer deposition prior to inkjet printing (360 dpi) with an aqueous ink. Number of printed dots illustrated as a function of 0, 5, 15 and 25 deposition cycles of trimethylaluminum and water. - Highlights: ALD/MLD can be used to adjust surface characteristics of films and fiber materials. Hydrophobicity after few deposition cycles of Al{sub 2}O{sub 3} due to e.g. complex formation. Same effect on cellulosic fabrics observed with low temperature deposited TiO{sub 2}. Different film growth and oxidation potential with different precursors. Hybrid layer on inorganic layer can be used to improve adhesion of polymer melt.

  20. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Abbasi-Firouzjah, M.; Shokri, B.; Physics Department, Shahid Beheshti University G.C., Evin, Tehran

    2013-12-07

    Low dielectric constant (low-k) silica based films were deposited on p-type silicon and polycarbonate substrates by radio frequency (RF) plasma enhanced chemical vapor deposition method at low temperature. A mixture of tetraethoxysilane vapor, oxygen, and tetrafluoromethane (CF{sub 4}) was used for the deposition of the films in forms of two structures called as SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z}. Properties of the films were controlled by amount of porosity and fluorine content in the film matrix. The influence of RF power and CF{sub 4} flow on the elemental composition, deposition rate, surface roughness, leakage current, refractive index, and dielectric constant of the films were characterized. Moreover, optical emission spectroscopy was applied to monitor the plasma process at the different parameters. Electrical characteristics of SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z} films with metal-oxide-semiconductor structure were investigated using current-voltage analysis to measure the leakage current and breakdown field, as well as capacitance-voltage analysis to obtain the film's dielectric constant. The results revealed that SiO{sub x}C{sub y} films, which are deposited at lower RF power produce more leakage current, meanwhile the dielectric constant and refractive index of these films decreased mainly due to the more porosity in the film structure. By adding CF{sub 4} in the deposition process, fluorine, the most electronegative and the least polarized atom, doped into the silica film and led to decrease in the refractive index and the dielectric constant. In addition, no breakdown field was observed in the electrical characteristics of SiO{sub x}C{sub y}F{sub z} films and the leakage current of these films reduced by increment of the CF{sub 4} flow.

  1. Method for depositing high-quality microcrystalline semiconductor materials

    DOE Patents [OSTI]

    Guha, Subhendu (Bloomfield Hills, MI); Yang, Chi C. (Troy, MI); Yan, Baojie (Rochester Hills, MI)

    2011-03-08

    A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

  2. Ultrasonically assisted deposition of colloidal crystals

    SciTech Connect (OSTI)

    Wollmann, Sabine; Patel, Raj B.; Wixforth, Achim; Krenner, Hubert J.

    2014-07-21

    Colloidal particles are a versatile physical system which have found uses across a range of applications such as the simulation of crystal kinetics, etch masks for fabrication, and the formation of photonic band-gap structures. Utilization of colloidal particles often requires a means to produce highly ordered, periodic structures. One approach is the use of surface acoustic waves (SAWs) to direct the self-assembly of colloidal particles. Previous demonstrations using standing SAWs were shown to be limited in terms of crystal size and dimensionality. Here, we report a technique to improve the spatial alignment of colloidal particles using traveling SAWs. Through control of the radio frequency power, which drives the SAW, we demonstrate enhanced quality and dimensionality of the crystal growth. We show that this technique can be applied to a range of particle sizes in the ?m-regime and may hold potential for particles in the sub-?m-regime.

  3. Surface treatment of nanocrystal quantum dots after film deposition

    DOE Patents [OSTI]

    Sykora, Milan; Koposov, Alexey; Fuke, Nobuhiro

    2015-02-03

    Provided are methods of surface treatment of nanocrystal quantum dots after film deposition so as to exchange the native ligands of the quantum dots for exchange ligands that result in improvement in charge extraction from the nanocrystals.

  4. Methods of coping with silica deposition - the PNOC experience

    SciTech Connect (OSTI)

    Candelaria, M.N.R.; Garcia, S.E.; Baltazar, A.D.J. Jr.; Solis, R.P.

    1996-12-31

    Several methods of coping with silica deposition from geothermal waters have been undertaken by PNOC-EDC to maximize Power Output from these fluids. Initially, the problem of amorphous silica deposition in surface pipelines and the reinjection well was prevented by operating the production separators at pressures higher or equal to amorphous silica saturation. However, increasing demands for additional power and stringent environmental controls have dictated the need to find alternative methods of coping with silica deposition. Several options have been studied and tested to be able to optimize fluid utilization for production. These include: acid treatment polymerization and deposition of silica in surface ponds or sumps, and chemical inhibition. As each brine is unique, methodologies used for mitigation of the silica problem have been varied.

  5. Method of depositing buffer layers on biaxially textured metal...

    Office of Scientific and Technical Information (OSTI)

    eu; gd; tb; tm; resup1subx; resup2sub1-xsub2; osub3; buffer; layer; deposited; sol-gel; metal-organic; decomposition; laminate; article; layer; ybco; resup1subx; ...

  6. Geology of the Florida Canyon gold deposit, Pershing County,...

    Open Energy Info (EERE)

    Pershing County, Nevada, in: Gold and Silver Deposits of Western Nevada Authors Hastings, J.S., Burkhart, T.H., and Richardson and R.E. Published Geological Society of Nevada 1993...

  7. Fabrication of solid oxide fuel cell by electrochemical vapor deposition

    DOE Patents [OSTI]

    Brian, Riley (Willimantic, CT); Szreders, Bernard E. (Oakdale, CT)

    1989-01-01

    In a high temperature solid oxide fuel cell (SOFC), the deposition of an impervious high density thin layer of electrically conductive interconnector material, such as magnesium doped lanthanum chromite, and of an electrolyte material, such as yttria stabilized zirconia, onto a porous support/air electrode substrate surface is carried out at high temperatures (approximately 1100.degree.-1300.degree. C.) by a process of electrochemical vapor deposition. In this process, the mixed chlorides of the specific metals involved react in the gaseous state with water vapor resulting in the deposit of an impervious thin oxide layer on the support tube/air electrode substrate of between 20-50 microns in thickness. An internal heater, such as a heat pipe, is placed within the support tube/air electrode substrate and induces a uniform temperature profile therein so as to afford precise and uniform oxide deposition kinetics in an arrangement which is particularly adapted for large scale, commercial fabrication of SOFCs.

  8. Fabrication of solid oxide fuel cell by electrochemical vapor deposition

    DOE Patents [OSTI]

    Riley, B.; Szreders, B.E.

    1988-04-26

    In a high temperature solid oxide fuel cell (SOFC), the deposition of an impervious high density thin layer of electrically conductive interconnector material, such as magnesium doped lanthanum chromite, and of an electrolyte material, such as yttria stabilized zirconia, onto a porous support/air electrode substrate surface is carried out at high temperatures (/approximately/1100/degree/ /minus/ 1300/degree/C) by a process of electrochemical vapor deposition. In this process, the mixed chlorides of the specific metals involved react in the gaseous state with water vapor resulting in the deposit of an impervious thin oxide layer on the support tube/air electrode substrate of between 20--50 microns in thickness. An internal heater, such as a heat pipe, is placed within the support tube/air electrode substrate and induces a uniform temperature profile therein so as to afford precise and uniform oxide deposition kinetics in an arrangement which is particularly adapted for large scale, commercial fabrication of SOFCs.

  9. Carbon nanotube forests growth using catalysts from atomic layer deposition

    SciTech Connect (OSTI)

    Chen, Bingan; Zhang, Can; Esconjauregui, Santiago; Xie, Rongsi; Zhong, Guofang; Robertson, John; Bhardwaj, Sunil; Cepek, Cinzia

    2014-04-14

    We have grown carbon nanotubes using Fe and Ni catalyst films deposited by atomic layer deposition. Both metals lead to catalytically active nanoparticles for growing vertically aligned nanotube forests or carbon fibres, depending on the growth conditions and whether the substrate is alumina or silica. The resulting nanotubes have narrow diameter and wall number distributions that are as narrow as those grown from sputtered catalysts. The state of the catalyst is studied by in-situ and ex-situ X-ray photoemission spectroscopy. We demonstrate multi-directional nanotube growth on a porous alumina foam coated with Fe prepared by atomic layer deposition. This deposition technique can be useful for nanotube applications in microelectronics, filter technology, and energy storage.

  10. Electrostatic particle trap for ion beam sputter deposition

    DOE Patents [OSTI]

    Vernon, Stephen P. (Pleasanton, CA); Burkhart, Scott C. (Livermore, CA)

    2002-01-01

    A method and apparatus for the interception and trapping of or reflection of charged particulate matter generated in ion beam sputter deposition. The apparatus involves an electrostatic particle trap which generates electrostatic fields in the vicinity of the substrate on which target material is being deposited. The electrostatic particle trap consists of an array of electrode surfaces, each maintained at an electrostatic potential, and with their surfaces parallel or perpendicular to the surface of the substrate. The method involves interception and trapping of or reflection of charged particles achieved by generating electrostatic fields in the vicinity of the substrate, and configuring the fields to force the charged particulate material away from the substrate. The electrostatic charged particle trap enables prevention of charged particles from being deposited on the substrate thereby enabling the deposition of extremely low defect density films, such as required for reflective masks of an extreme ultraviolet lithography (EUVL) system.

  11. Particle deposition in ventilation ducts: Connectors, bends anddeveloping flow

    SciTech Connect (OSTI)

    Sippola, Mark R.; Nazaroff, William W.

    2004-03-01

    In ventilation duct flow the turbulent flow profile is commonly disturbed or not fully developed and these conditions are likely to influence particle deposition to duct surfaces. Particle deposition rates at eight S-connectors, in two 90{sup o} duct bends and in two ducts where the turbulent flow profile was not fully developed were measured in a laboratory duct system with both galvanized steel and internally insulated ducts with hydraulic diameters of 15.2 cm. In the steel duct system, experiments with nominal particle diameters of 1, 3, 5, 9 and 16 {micro}m were conducted at each of three nominal air speeds: 2.2, 5.3 and 9.0 m/s. In the insulated duct system, deposition of particles with nominal diameters of 1, 3, 5, 8 and 13 {micro}m was measured at nominal air speeds of 2.2, 5.3 and 8.8 m/s. Fluorescent techniques were used to directly measure the deposition velocities of monodisperse fluorescent particles to duct surfaces. Deposition at S-connectors, in bends and in straight ducts with developing turbulence was often greater than deposition in straight ducts with fully developed turbulence for equal particle sizes, air speeds and duct surface orientations. Deposition rates at all locations were found to increase with an increase in particle size or air speed. High deposition rates at S-connectors resulted from impaction and these rates were nearly independent of the orientation of the S-connector. Deposition rates in the two 90{sup o} bends differed by more than an order of magnitude in some cases, probably because of the difference in turbulence conditions at the bend inlets. In straight steel ducts where the turbulent flow profile was developing, the deposition enhancement relative to fully developed turbulence generally increased with air speed and decreased with downstream distance from the duct inlet. This enhancement was greater at the duct ceiling and wall than at the duct floor. In insulated ducts, deposition enhancement was less pronounced overall than in steel ducts. Trends that were observed in steel ducts were present, but weaker, in insulated ducts.

  12. Quick, Efficient Film Deposition for Nanomaterials - Energy Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Portal Solar Photovoltaic Solar Photovoltaic Find More Like This Return to Search Quick, Efficient Film Deposition for Nanomaterials Oak Ridge National Laboratory Contact ORNL About This Technology Publications: PDF Document Publication Quick, Efficient Film Deposition for Nanomaterials (900 KB) Technology Marketing SummaryResearchers at ORNL developed a process for manufacturing a thin film from a layer of particles, as well as complex three dimensional devices. The nanomaterials are

  13. Hot-Wire Chemical Vapor Deposition (HWCVD) technologies - Energy Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Portal Photovoltaic Solar Photovoltaic Find More Like This Return to Search Hot-Wire Chemical Vapor Deposition (HWCVD) technologies Rapid, controllable growth of epitaxial silicon films National Renewable Energy Laboratory Contact NREL About This Technology Publications: PDF Document Publication Landry, et al., WO 2011-106624, "Hot Wire Chemical Vaport Deposition (HWCVD) with Carbide Filaments" (1,533 KB) Technology Marketing Summary NREL scientists have discovered a unique way to

  14. Optical and infrared properties of glancing angle deposited nanostructured

    Office of Scientific and Technical Information (OSTI)

    tungsten films (Journal Article) | SciTech Connect Optical and infrared properties of glancing angle deposited nanostructured tungsten films Citation Details In-Document Search Title: Optical and infrared properties of glancing angle deposited nanostructured tungsten films Authors: Ungaro, Craig [1] ; Shah, Ankit [1] ; Kravchenko, Ivan I [2] ; Hensley, Dale K [2] ; Gray, Stephen K. [3] ; Gupta, Mool C. [1] + Show Author Affiliations University of Virginia, Charlottesville ORNL Argonne

  15. Methods of electrophoretic deposition for functionally graded porous

    Office of Scientific and Technical Information (OSTI)

    nanostructures and systems thereof (Patent) | SciTech Connect Methods of electrophoretic deposition for functionally graded porous nanostructures and systems thereof Citation Details In-Document Search Title: Methods of electrophoretic deposition for functionally graded porous nanostructures and systems thereof In one embodiment, an aerogel includes a layer of shaped particles having a particle packing density gradient in a thickness direction of the layer, wherein the shaped particles are

  16. Molybdenum enhanced low-temperature deposition of crystalline silicon nitride

    DOE Patents [OSTI]

    Lowden, R.A.

    1994-04-05

    A process for chemical vapor deposition of crystalline silicon nitride is described which comprises the steps of: introducing a mixture of a silicon source, a molybdenum source, a nitrogen source, and a hydrogen source into a vessel containing a suitable substrate; and thermally decomposing the mixture to deposit onto the substrate a coating comprising crystalline silicon nitride containing a dispersion of molybdenum silicide. 5 figures.

  17. Electroless Atomic Layer Deposition: A Scalable Approach to Surface

    Office of Scientific and Technical Information (OSTI)

    Modified Metal Powders. (Journal Article) | SciTech Connect Electroless Atomic Layer Deposition: A Scalable Approach to Surface Modified Metal Powders. Citation Details In-Document Search Title: Electroless Atomic Layer Deposition: A Scalable Approach to Surface Modified Metal Powders. Abstract not provided. Authors: Cappillino, Patrick ; Robinson, David ; El Gabaly Marquez, Farid ; Sugar, Joshua Daniel ; Cai, Trevor ; Stickney, John ; Liu, Zhi Publication Date: 2014-01-01 OSTI Identifier:

  18. Process for thin film deposition of cadmium sulfide

    DOE Patents [OSTI]

    Muruska, H. Paul (East Windsor, NJ); Sansregret, Joseph L. (Scotch Plains, NJ); Young, Archie R. (Montclair, NJ)

    1982-01-01

    The present invention teaches a process for depositing layers of cadmium sulfide. The process includes depositing a layer of cadmium oxide by spray pyrolysis of a cadmium salt in an aqueous or organic solvent. The oxide film is then converted into cadmium sulfide by thermal ion exchange of the O.sup.-2 for S.sup.-2 by annealing the oxide layer in gaseous sulfur at elevated temperatures.

  19. Deposition of Graded Thermal Barrier Coatings for Gas Turbine Blades -

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Energy Innovation Portal Wind Energy Wind Energy Industrial Technologies Industrial Technologies Advanced Materials Advanced Materials Find More Like This Return to Search Deposition of Graded Thermal Barrier Coatings for Gas Turbine Blades Sandia National Laboratories Contact SNL About This Technology Publications: PDF Document Publication Market Sheet (825 KB) Technology Marketing SummarySandia has developed a method and apparatus for depositing thermal barrier coatings on gas turbine

  20. Precursors for the polymer-assisted deposition of films

    DOE Patents [OSTI]

    McCleskey, Thomas M.; Burrell, Anthony K.; Jia, Quanxi; Lin, Yuan

    2013-09-10

    A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  1. Liquid Metal Heat Exchanger for Geologic Deposits - Energy Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Portal Liquid Metal Heat Exchanger for Geologic Deposits Oak Ridge National Laboratory Contact ORNL About This Technology Technology Marketing SummaryResearchers at ORNL developed a down-well heating apparatus that efficiently heats subterranean geological deposits, such as oil shale, to extract hydrocarbons for energy needs. The apparatus provides more efficient heat transfer than existing technologies for hydrocarbon extraction. It also holds promise for in situ remediation of contaminated

  2. Characterization of Field-Aged Exhaust Gas Recirculation Cooler Deposits |

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Department of Energy Field-Aged Exhaust Gas Recirculation Cooler Deposits Characterization of Field-Aged Exhaust Gas Recirculation Cooler Deposits Characterized field-aged exhaust gas recirculation coolers from 7 engine manufacturers, discussed differences and commonalities, and provided understanding of cooler fouling and prevention. PDF icon deer10_lance.pdf More Documents & Publications Materials Issues Associated with EGR Systems Materials Issues Associated with EGR Systems Materials

  3. Selective deposition of nanostructured ruthenium oxide using Tobacco mosaic

    Office of Scientific and Technical Information (OSTI)

    virus for micro-supercapacitors in solid Nafion electrolyte (Journal Article) | SciTech Connect Journal Article: Selective deposition of nanostructured ruthenium oxide using Tobacco mosaic virus for micro-supercapacitors in solid Nafion electrolyte Citation Details In-Document Search Title: Selective deposition of nanostructured ruthenium oxide using Tobacco mosaic virus for micro-supercapacitors in solid Nafion electrolyte Authors: Gnerlich, Markus ; Ben-Yoav, Hadar ; Culver, James ;

  4. Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor–insulator–semiconductor heterojunction solar cell

    SciTech Connect (OSTI)

    Talkenberg, Florian Illhardt, Stefan; Schmidl, Gabriele; Schleusener, Alexander; Sivakov, Vladimir; Radnóczi, György Zoltán; Pécz, Béla; Dikhanbayev, Kadyrjan; Mussabek, Gauhar; Gudovskikh, Alexander

    2015-07-15

    Semiconductor–insulator–semiconductor heterojunction solar cells were prepared using atomic layer deposition (ALD) technique. The silicon surface was treated with oxygen and hydrogen plasma in different orders before dielectric layer deposition. A plasma-enhanced ALD process was applied to deposit dielectric Al{sub 2}O{sub 3} on the plasma pretreated n-type Si(100) substrate. Aluminum doped zinc oxide (Al:ZnO or AZO) was deposited by thermal ALD and serves as transparent conductive oxide. Based on transmission electron microscopy studies the presence of thin silicon oxide (SiO{sub x}) layer was detected at the Si/Al{sub 2}O{sub 3} interface. The SiO{sub x} formation depends on the initial growth behavior of Al{sub 2}O{sub 3} and has significant influence on solar cell parameters. The authors demonstrate that a hydrogen plasma pretreatment and a precursor dose step repetition of a single precursor improve the initial growth behavior of Al{sub 2}O{sub 3} and avoid the SiO{sub x} generation. Furthermore, it improves the solar cell performance, which indicates a change of the Si/Al{sub 2}O{sub 3} interface states.

  5. Analysis of gallium arsenide deposition in a horizontal chemical vapor deposition reactor using massively parallel computations

    SciTech Connect (OSTI)

    Salinger, A.G.; Shadid, J.N.; Hutchinson, S.A.

    1998-01-01

    A numerical analysis of the deposition of gallium from trimethylgallium (TMG) and arsine in a horizontal CVD reactor with tilted susceptor and a three inch diameter rotating substrate is performed. The three-dimensional model includes complete coupling between fluid mechanics, heat transfer, and species transport, and is solved using an unstructured finite element discretization on a massively parallel computer. The effects of three operating parameters (the disk rotation rate, inlet TMG fraction, and inlet velocity) and two design parameters (the tilt angle of the reactor base and the reactor width) on the growth rate and uniformity are presented. The nonlinear dependence of the growth rate uniformity on the key operating parameters is discussed in detail. Efficient and robust algorithms for massively parallel reacting flow simulations, as incorporated into our analysis code MPSalsa, make detailed analysis of this complicated system feasible.

  6. 1987 wet deposition temporal and spatial patterns in North America

    SciTech Connect (OSTI)

    Simpson, J.C.; Olsen, A.R.

    1990-03-01

    The focus of this report is on North American wet deposition temporal patterns from 1979 to 1987 and spatial patterns for 1987. The report investigates the patterns of annual precipitation-weighted average concentration and annual deposition for nine ion species: hydrogen, sulfate, nitrate, ammonium, calcium, chloride, sodium, potassium, and magnesium. Data are from the Acid Deposition System (ADS) for the statistical reporting of North American deposition data which includes the National Atmospheric Deposition Program/National Trends Network (NADP/NTN), the MAP3S precipitation chemistry network, the Utility Acid Precipitation Study Program (UAPSP), the Canadian Precipitation Monitoring Network (CAPMoN), and the daily and 4-weekly Acidic Precipitation in Ontario Study (APIOS-D and APIOS-C). Mosaic maps, based on surface estimation using kriging, display concentration and deposition spatial patterns of pH, hydrogen, sulfate, nitrate, ammonium, and calcium ion species for 1987 annual, winter, and summer periods. The temporal pattern analyses use a subset of 39 sites over a 9-year (1979--1987) period and an expanded subset of 140 sites with greater spatial coverage over a 6-year (1982--1987) period. 68 refs., 15 figs., 15 tabs.

  7. 1986 wet deposition temporal and spatial patterns in North America

    SciTech Connect (OSTI)

    Olsen, A.R.

    1989-07-01

    The focus of this report is on North American wet deposition temporal patterns from 1979 to 1986 and spatial patterns for 1986. The report provides statistical distribution summaries of annual precipitation-weighted average concentration and annual deposition for nine ion species: hydrogen, sulfate, nitrate, ammonium, calcium, chloride, sodium, potassium, and magnesium. The data in the report are from the Acid Depositing System (ADS) for the statistical reporting of North American deposition data. Isopleth maps, based on surface estimation using kriging, display concentration and deposition spatial patterns of pH, hydrogen, sulfate, nitrate, ammonium, and calcium ion species for 1986 annual, winter, and summer periods. The temporal pattern analyses use a subset of 30 sites over an 8-year (1979-1986) period and an expanded subset of 137 sites with greater spatial coverage over a 5-year (1982-1986) period. The 8-year period represents the longest period with wet deposition monitoring data unavailable that has a sufficient number of sites with data of known quality to allow a descriptive summary of annual temporal patterns. 19 refs., 105 figs., 29 tabs.

  8. Natural mercury isotope variation in coal deposits and organic soils

    SciTech Connect (OSTI)

    Abir, Biswas; Joel D. Blum; Bridget A. Bergquist; Gerald J. Keeler; Zhouqing Xie

    2008-11-15

    There is a need to distinguish among sources of Hg to the atmosphere in order to more fully understand global Hg pollution. In this study we investigate whether coal deposits within the United States, China, and Russia-Kazakhstan, which are three of the five greatest coal-producing regions, have diagnostic Hg isotopic fingerprints that can be used to discriminate among Hg sources. We also investigate the Hg isotopic composition of modern organic soil horizons developed in areas distant from point sources of Hg in North America. Mercury stored in coal deposits displays a wide range of both mass dependent fractionation and mass independent fractionation. {delta}{sup 202}Hg varies in coals by 3{per_thousand} and {Delta}{sup 201}Hg varies by 0.9{per_thousand}. Combining these two Hg isotope signals results in what may be a unique isotopic 'fingerprint' for many coal deposits. Mass independent fractionation of mercury has been demonstrated to occur during photochemical reactions of mercury. This suggests that Hg found in most coal deposits was subjected to photochemical reduction near the Earth's surface prior to deposition. The similarity in MDF and MIF of modern organic soils and coals from North America suggests that Hg deposition from coal may have imprinted an isotopic signature on soils. This research offers a new tool for characterizing mercury inputs from natural and anthropogenic sources to the atmosphere and provides new insights into the geochemistry of mercury in coal and soils. 35 refs., 2 figs., 1 tab.

  9. Process maps for plasma spray. Part II: Deposition and properties

    SciTech Connect (OSTI)

    XIANGYANG,JIANG; MATEJICEK,JIRI; KULKARNI,ANAND; HERMAN,HERBERT; SAMPATH,SANJAY; GILMORE,DELWYN L.; NEISER JR.,RICHARD A

    2000-03-28

    This is the second paper of a two part series based on an integrated study carried out at the State University of New York at Stony Brook and Sandia National Laboratories. The goal of the study is the fundamental understanding of the plasma-particle interaction, droplet/substrate interaction, deposit formation dynamics and microstructure development as well as the deposit property. The outcome is science-based relationships, which can be used to link processing to performance. Molybdenum splats and coatings produced at 3 plasma conditions and three substrate temperatures were characterized. It was found that there is a strong mechanical/thermal interaction between droplet and substrate, which builds up the coatings/substrate adhesion. Hardness, thermal conductivity, and modulus increase, while oxygen content and porosity decrease with increasing particle velocity. Increasing deposition temperature resulted in dramatic improvement in coating thermal conductivity and hardness as well as increase in coating oxygen content. Indentation reveals improved fracture resistance for the coatings prepared at higher deposition temperature. Residual stress was significantly affected by deposition temperature, although not significant by particle energy within the investigated parameter range. Coatings prepared at high deposition temperature with high-energy particles suffered considerably less damage in wear tests. Possible mechanisms behind these changes are discussed within the context of relational maps which are under development.

  10. Quantitation of absorbed or deposited materials on a substrate that measures energy deposition

    DOE Patents [OSTI]

    Grant, Patrick G.; Bakajin, Olgica; Vogel, John S.; Bench, Graham

    2005-01-18

    This invention provides a system and method for measuring an energy differential that correlates to quantitative measurement of an amount mass of an applied localized material. Such a system and method remains compatible with other methods of analysis, such as, for example, quantitating the elemental or isotopic content, identifying the material, or using the material in biochemical analysis.

  11. Tritium Permeation Activity at Safety and Tritium Applied Research (STAR)

    Office of Environmental Management (EM)

    Facility | Department of Energy Permeation Activity at Safety and Tritium Applied Research (STAR) Facility Tritium Permeation Activity at Safety and Tritium Applied Research (STAR) Facility Presentation from the 34th Tritium Focus Group Meeting held in Idaho Falls, Idaho on September 23-25, 2014. PDF icon Tritium Permeation Activity at Safety and Tritium Applied Research (STAR) Facility More Documents & Publications Tritium Behavior in Lead Lithium Eutectic (LLE) at Low Tritium Partial

  12. Apply for the Parallel Computing Summer Research Internship

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Parallel Computing » How to Apply Apply for the Parallel Computing Summer Research Internship Creating next-generation leaders in HPC research and applications development Program Co-Lead Robert (Bob) Robey Email Program Co-Lead Gabriel Rockefeller Email Program Co-Lead Hai Ah Nam Email Professional Staff Assistant Nicole Aguilar Garcia (505) 665-3048 Email Current application deadline is February 5, 2016 with notification by early March 2016. Who can apply? Upper division undergraduate

  13. 2008 Annual Merit Review Results Summary - 2. Applied Battery Research

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    2-1 2. Applied Battery Research Introduction Applied battery research focuses on addressing the cross-cutting barriers facing the lithium-ion systems that are closest to meeting all of the technical energy and power requirements for hybrid electric vehicle (HEV) and electric vehicle (EV) applications. In addition, the applied battery research activity concentrates on technology transfer to ensure that the research results and lessons learned are effectively provided to U.S. automotive and

  14. Large Eddy Simulation (LES) Applied to Advanced Engine Combustion Research

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    | Department of Energy Advanced Engine Combustion Research Large Eddy Simulation (LES) Applied to Advanced Engine Combustion Research 2012 DOE Hydrogen and Fuel Cells Program and Vehicle Technologies Program Annual Merit Review and Peer Evaluation Meeting PDF icon ace007_oefelein_2012_o.pdf More Documents & Publications Large Eddy Simulation (LES) Applied to Advanced Engine Combustion Research Large Eddy Simulation (LES) Applied to Low-Temperature and Diesel Engine Combustion Research

  15. El Paso County Geothermal Project: Innovative Research Technologies Applied

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    to the Geothermal Reosurce Potential at Fort Bliss | Department of Energy El Paso County Geothermal Project: Innovative Research Technologies Applied to the Geothermal Reosurce Potential at Fort Bliss El Paso County Geothermal Project: Innovative Research Technologies Applied to the Geothermal Reosurce Potential at Fort Bliss El Paso County Geothermal Project: Innovative Research Technologies Applied to the Geothermal Reosurce Potential at Fort Bliss presentation at the April 2013 peer

  16. Opportunities to Apply Phase Change Materials to Building Enclosures

    Energy Savers [EERE]

    Webinar | Department of Energy Opportunities to Apply Phase Change Materials to Building Enclosures Webinar Opportunities to Apply Phase Change Materials to Building Enclosures Webinar Slides from the Building America webinar on November 11, 2011. PDF icon webinar_pcm_enclosures_20111111.pdf More Documents & Publications Building America Webinar: Opportunities to Apply Phase Change Materials to Building Enclosures 2011 Residential Energy Efficiency Technical Update Meeting Summary

  17. Building America Expert Meeting: Recommendations for Applying Water Heaters

    Energy Savers [EERE]

    in Combination Space and Domestic Water Heating Systems | Department of Energy Recommendations for Applying Water Heaters in Combination Space and Domestic Water Heating Systems Building America Expert Meeting: Recommendations for Applying Water Heaters in Combination Space and Domestic Water Heating Systems This expert meeting was conducted by Building Science Corporation on July 31, 2011 in Westford, Massachusetts ; the topic of this meeting was 'Recommendations For Applying Water Heaters

  18. Energy Department Extends Deadline to Apply for START Tribal Renewable

    Office of Environmental Management (EM)

    Energy Project Development Assistance to May 22, 2015 | Department of Energy Extends Deadline to Apply for START Tribal Renewable Energy Project Development Assistance to May 22, 2015 Energy Department Extends Deadline to Apply for START Tribal Renewable Energy Project Development Assistance to May 22, 2015 April 30, 2015 - 4:05pm Addthis Energy Department Extends Deadline to Apply for START Tribal Renewable Energy Project Development Assistance to May 22, 2015 WASHINGTON, DC - The U.S.

  19. APPLIED TECHNOLOGY R&D | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Research & Development » APPLIED TECHNOLOGY R&D APPLIED TECHNOLOGY R&D rdplan-thumb.jpg Applied technology R&D projects monitor SSL technology advances and provide laboratory and field evaluations of emerging products. Impartial, trusted analysis from DOE identifies and characterizes technology problems early on, alerting manufacturers to needed improvements, and helping to put detailed information into the hands of buyers, which when used in discussions with manufacturers can

  20. Where to Apply for Weatherization Assistance | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    You are here Home » Weatherization Assistance Program » Where to Apply for Weatherization Assistance Where to Apply for Weatherization Assistance To apply for weatherization assistance you need to contact your state weatherization agency. The U.S. Department of Energy (DOE) does not provide weatherization services or services of any kind to individuals. DOE also does not process applications-this process is handled by each state. How to Determine if You Are Eligible for Weatherization

  1. Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes

    DOE Patents [OSTI]

    Tsuo, S.; Langford, A.A.

    1989-03-28

    Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate. 3 figs.

  2. Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes

    DOE Patents [OSTI]

    Tsuo, Simon (Lakewood, CO); Langford, Alison A. (Boulder, CO)

    1989-01-01

    Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate.

  3. Overview and Progress of the Applied Battery Research (ABR) Activity...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Fabricate PHEV Cells for Testing & Diagnostics Overview and Progress of the Applied Battery Research (ABR) Activity Current Research Activities in Electrode and Cell Prototyping...

  4. WEBINAR: UNDERSTANDING AND APPLYING TM-30-15 | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    provided examples of how they can be applied by various users, and demonstrated the Excel tools that are distributed with the document. View the presentation slides View the ...

  5. Apply: Funding Opportunity - Advancing Solutions to Improve Energy...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Advancing Solutions to Improve Energy Efficiency of Commercial Buildings Apply: Funding Opportunity - Advancing Solutions to Improve Energy Efficiency of Commercial Buildings ...

  6. Apply: Small Business Funding Opportunity for Lighting, Integrated...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Small Business Funding Opportunity for Lighting, Integrated Storage, and Distributed Generation Apply: Small Business Funding Opportunity for Lighting, Integrated Storage, and ...

  7. Crivelli, Silvia; Meza, Juan 60 APPLIED LIFE SCIENCES Ernest...

    Office of Scientific and Technical Information (OSTI)

    folding via divide-and-conquer optimization Oliva, Ricardo; Crivelli, Silvia; Meza, Juan 60 APPLIED LIFE SCIENCES Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA...

  8. Apply: Building Energy Efficiency Frontiers and Incubator Technologies...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Incubator Technologies (BENEFIT) - 2014 (DE-FOA-0001027) Apply: Building Energy Efficiency Frontiers and Incubator Technologies (BENEFIT) - 2014 (DE-FOA-0001027) February 4, 2014 - ...

  9. Solar Applied Materials Technology Corp | Open Energy Information

    Open Energy Info (EERE)

    Name: Solar Applied Materials Technology Corp Place: Tainan, Taiwan Product: Taiwan's material process specialists with over 20 years experience and in the areas of sputtering...

  10. Building America Whole-House Solutions for Existing Homes: Applying...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Building America Whole-House Solutions for Existing Homes: Applying Best Practices to Florida Local Government Retrofit Programs - Central Florida (Fact Sheet) Building America...

  11. ENERGY STAR Webinar: How to Apply for the ENERGY STAR

    Broader source: Energy.gov [DOE]

    The U.S. Environmental Protection Agency (EPA) is hosting a webinar on how to apply for ENERGY STAR certification in Portfolio Manager.

  12. The generalized finite element method applied to the dynamic...

    Office of Scientific and Technical Information (OSTI)

    Title: The generalized finite element method applied to the dynamic response of heterogeneous media. Authors: Robbins, Joshua ; Voth, Thomas E. Publication Date: 2013-02-01 OSTI ...

  13. Large Eddy Simulation (LES) Applied to Advanced Engine Combustion...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Advanced Engine Combustion Research Large Eddy Simulation (LES) Applied to Advanced Engine Combustion Research 2012 DOE Hydrogen and Fuel Cells Program and Vehicle Technologies...

  14. Applied Materials Switzerland SA Formerly HCT Shaping Systems...

    Open Energy Info (EERE)

    Switzerland SA Formerly HCT Shaping Systems SA Jump to: navigation, search Name: Applied Materials Switzerland SA (Formerly HCT Shaping Systems SA) Place: Chezeaux, Switzerland...

  15. Building America Webinar: Opportunities to Apply Phase Change...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Building America Webinar: Opportunities to Apply Phase Change Materials to Building Enclosures This webinar, presented by research team Fraunhofer Center for Sustainable Energy ...

  16. Attenuation-Based Remedies in the Subsurface Applied Field Research...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    (DOE) Environmental Management (EM) sites. The ABRS AFRI site provides a unique setting for researchers in both applied and basic science fields. A wealth of subsurface data is ...

  17. Applied Solar LLC formerly Open Energy Corp and Barnabus Energy...

    Open Energy Info (EERE)

    Open Energy Corp and Barnabus Energy Inc Jump to: navigation, search Name: Applied Solar LLC (formerly Open Energy Corp and Barnabus Energy Inc) Place: San Diego, California...

  18. BLM Manual 2804: Applying for FLPMA Grants | Open Energy Information

    Open Energy Info (EERE)

    search OpenEI Reference LibraryAdd to library PermittingRegulatory Guidance - GuideHandbook: BLM Manual 2804: Applying for FLPMA GrantsPermittingRegulatory...

  19. Deep Vadose Zone Applied Field Research Initiative (DVZ-AFRI...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Located on the Hanford Site in Richland, Washington, the Deep Vadose Zone Applied Field Research Initiative (DVZ AFRI) was established to protect water resources by addressing the ...

  20. Modular Applied General Equilibrium Tool (MAGNET) | Open Energy...

    Open Energy Info (EERE)

    Related Tools CRiSTAL Forests MCA4Climate - Guidance for scientifically sound climate change planning Environmental Impact and Sustainability Applied General Equilibrium Model...

  1. Am Shav Technological Applied Development Center | Open Energy...

    Open Energy Info (EERE)

    Technological Applied Development Center Place: Israel Sector: Services Product: General Financial & Legal Services ( Private family-controlled ) References: Am-Shav...

  2. Remote Gas Well Monitoring Technology Applied to Marcellus Shale...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    ... for Improved Enhanced Oil Recovery Technique Remote Gas Well Monitoring Technology Applied to Marcellus Shale Site New Breathalyzer Offers Hope of Pain-Free Diabetes Monitoring

  3. Ash Deposit Formation and Deposit Properties. A Comprehensive Summary of Research Conducted at Sandia's Combustion Research Facility

    SciTech Connect (OSTI)

    Larry L. Baxter

    2000-08-01

    This report summarizes experimental and theoretical work performed at Sandia's Combustion Research Facility over the past eight years on the fate of inorganic material during coal combustion. This work has been done under four broad categories: coal characterization, fly ash formation, ash deposition, and deposit property development. The objective was to provide sufficient understanding of these four areas to be able to predict coal behavior in current and advanced conversion systems. This work has led to new characterization techniques for fuels that provide, for the first time, systematic and species specific information regarding the inorganic material. The transformations of inorganic material during combustion can be described in terms of the net effects of the transformations of these individual species. Deposit formation mechanisms provide a framework for predicting deposition rates for abroad range of particle sizes. Predictions based on these rates many times are quite accurate although there are important exceptions. A rigorous framework for evaluating deposit has been established. Substantial data have been obtained with which to exercise this framework, but this portion of the work is less mature than is any other. Accurate prediction of deposit properties as functions of fuel properties, boiler design, and boiler operating conditions represents the single most critical area where additional research is needed.

  4. CX-008179: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Building 09-056 Demolition CX(s) Applied: B1.23 Date: 04/24/2012 Location(s): Texas Offices(s): Pantex Site Office

  5. CX-007550: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Kearney - Waste Water Treatment Plant CX(s) Applied: B5.1 Date: 01/10/2012 Location(s): Missouri Offices(s): Golden Field Office

  6. CX-007549: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Harrisonville - Waste Water Treatment Plant CX(s) Applied: B5.1 Date: 01/10/2012 Location(s): Missouri Offices(s): Golden Field Office

  7. CX-012310: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Sawmill Creek Stream Bank Erosion CX(s) Applied: B1.3 Date: 06/06/2014 Location(s): Illinois Offices(s): Argonne Site Office

  8. CX-009423: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Relay and Switchboard Panel Replacements CX(s) Applied: B4.6 Date: 10/29/2012 Location(s): Arkansas Offices(s): Southwestern Power Administration

  9. CX-011626: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Line Yard Fence Project CX(s) Applied: B1.11 Date: 06/05/2013 Location(s): Tennessee Offices(s): Y-12 Site Office

  10. CX-011628: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Enclosure Modification Project CX(s) Applied: B1.3 Date: 06/05/2013 Location(s): Tennessee Offices(s): Y-12 Site Office

  11. CX-011630: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    9831 Wall Construction Project CX(s) Applied: B1.3 Date: 06/05/2013 Location(s): Tennessee Offices(s): Y-12 Site Office

  12. CX-009753: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Propane Corridor Development Program CX(s) Applied: B5.22 Date: 12/06/2012 Location(s): Georgia Offices(s): National Energy Technology Laboratory

  13. CX-012799: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Malin-Hilltop Wood Pole Replacements CX(s) Applied: B1.3Date: 41915 Location(s): CaliforniaOffices(s): Bonneville Power Administration

  14. CX-012805: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Brasada-Harney #1 Wood Pole Replacements CX(s) Applied: B1.3Date: 41908 Location(s): OregonOffices(s): Bonneville Power Administration

  15. CX-012813: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Redmond-Pilot Butte #1 Wood Pole Replacements CX(s) Applied: B1.3Date: 41893 Location(s): OregonOffices(s): Bonneville Power Administration

  16. CX-010479: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Load Control System Reliability CX(s) Applied: A9 Date: 05/29/2013 Location(s): Wyoming Offices(s): National Energy Technology Laboratory

  17. FE Categorical Exclusions | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    8, 2011 CX-006459: Categorical Exclusion Determination Analytical Physics - Transmission Electron Microscopy (TEM) CX(s) Applied: B3.6 Date: 08082011 Location(s): Albany, Oregon...

  18. CX-012619: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Chromatography and Analytical Sensor Measurements CX(s) Applied: B3.6Date: 41799 Location(s): South CarolinaOffices(s): Savannah River Operations Office

  19. CX-007587: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Gas Chromatography CX(s) Applied: B3.6 Date: 12/29/2011 Location(s): Oregon Offices(s): National Energy Technology Laboratory

  20. CX-009202: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Port Angeles Substation Equipment Additions CX(s) Applied: B4.6 Date: 09/14/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  1. CX-012791: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Grizzly Captain Jack Transmission Line Access Road Acquisition CX(s) Applied: B1.24Date: 41935 Location(s): OregonOffices(s): Bonneville Power Administration

  2. CX-010772: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Water Security Test Bed (WSTB) CX(s) Applied: B3.6 Date: 07/17/2013 Location(s): Idaho Offices(s): Nuclear Energy

  3. CX-012706: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Radiochemistry Laboratory (RCL) Supply Intake Filter Housing CX(s) Applied: B2.5Date: 41858 Location(s): IdahoOffices(s): Nuclear Energy

  4. CX-012433: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Computer Simulation and Prototype Construction and Testing CX(s) Applied: A9Date: 41878 Location(s): GeorgiaOffices(s): National Energy Technology Laboratory

  5. CX-008571: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Project Blue Energy CX(s) Applied: A9 Date: 06/20/2012 Location(s): Utah Offices(s): Golden Field Office

  6. CX-009442: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Cutters Grove, Anoka CX(s) Applied: A9, B5.19 Date: 07/31/2012 Location(s): Minnesota Offices(s): Golden Field Office

  7. FE Categorical Exclusions | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Investigation of Cathode Electrocatalytic Activity using Surfaced Engineered Thin Film Samples CX(s) Applied: B3.6 Date: 09082011 Location(s): Pittsburgh,...

  8. CX-009543: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sopogy Subcontract CX(s) Applied: A9, B5.15 Date: 11/28/2012 Location(s): Hawaii Offices(s): Golden Field Office

  9. CX-012195: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Alfalfa Substation Control House Replacement CX(s) Applied: B4.11 Date: 05/02/2014 Location(s): Washington Offices(s): Bonneville Power Administration

  10. CX-012469: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Gas Analysis Services CX(s) Applied: B3.6Date: 41876 Location(s): OregonOffices(s): National Energy Technology Laboratory

  11. CX-012512: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Amber Kinetics Flywheel Energy Storage Demonstration CX(s) Applied: B3.6Date: 41848 Location(s): CaliforniaOffices(s): National Energy Technology Laboratory

  12. CX-008215: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Small Hydropower Research and Development Technology Project CX(s) Applied: A9 Date: 04/03/2012 Location(s): Colorado Offices(s): Golden Field Office

  13. CX-012666: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Carib Energy (USA) LLC CX(s) Applied: B5.7Date: 05/30//2014 Location(s): FloridaOffices(s): Fossil Energy

  14. CX-012434: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Low Cost Titanium Casting Technology CX(s) Applied: B3.6Date: 41878 Location(s): OhioOffices(s): National Energy Technology Laboratory

  15. CX-008700: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Natapoc Property Funding CX(s) Applied: B1.25 Date: 06/12/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  16. CX-010727: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Dayton Tap Line Retirement CX(s) Applied: B4.10 Date: 08/13/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  17. CX-011173: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Yaak Substation Transformer Replacement CX(s) Applied: B4.6 Date: 09/18/2013 Location(s): Montana Offices(s): Bonneville Power Administration

  18. CX-008204: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Finch CX(s) Applied: B5.19 Date: 03/23/2012 Location(s): Missouri Offices(s): Golden Field Office

  19. CX-008203: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Demoret CX(s) Applied: B5.19 Date: 03/23/2012 Location(s): Missouri Offices(s): Golden Field Office

  20. CX-008241: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Teter CX(s) Applied: B5.19 Date: 05/15/2012 Location(s): Missouri Offices(s): Golden Field Office

  1. CX-008205: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energize Missouri HUG Weaver CX(s) Applied: B5.19 Date: 03/23/2012 Location(s): Missouri Offices(s): Golden Field Office

  2. CX-009132: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Landfill Gas Utilization Plant CX(s) Applied: B5.21 Date: 08/02/2012 Location(s): New York Offices(s): Golden Field Office

  3. CX-010618: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Midwest Region Alternative Fuels Project CX(s) Applied: 0 Date: 07/19/2013 Location(s): Missouri Offices(s): National Energy Technology Laboratory

  4. CX-008438: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Biogas Reconditioning Project CX(s) Applied: B5.1 Date: 06/27/2012 Location(s): Nevada Offices(s): National Energy Technology Laboratory

  5. CX-008282: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Biogas Reconditioning Project CX(s) Applied: B5.1 Date: 05/01/2012 Location(s): Nevada Offices(s): National Energy Technology Laboratory

  6. CX-010339: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Flight's End Property Funding CX(s) Applied: B1.25 Date: 05/20/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  7. CX-012311: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Accelerator Test Facility II CX(s) Applied: B3.10 Date: 05/28/2014 Location(s): New York Offices(s): Brookhaven Site Office

  8. CX-007866: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    SunShot Massachusetts CX(s) Applied: A9, A11 Date: 01/27/2012 Location(s): Massachusetts Offices(s): Golden Field Office

  9. CX-012570: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Install Elevated Fire Water Storage Tank CX(s) Applied: B2.5Date: 41862 Location(s): South CarolinaOffices(s): Savannah River Operations Office

  10. CX-012231: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Mica Peak Radio Station upgrade CX(s) Applied: B1.19 Date: 06/09/2014 Location(s): Washington Offices(s): Bonneville Power Administration

  11. CX-009850: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Pittsburgh Nanomaterials Preparation Lab CX(s) Applied: B3.6 Date: 01/29/2013 Location(s): Pennsylvania Offices(s): National Energy Technology Laboratory

  12. CX-011534: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Grays River Confluence Property Funding CX(s) Applied: B1.25 Date: 11/08/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  13. CX-012656: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    North Bend Communication Site Engine Generator Replacement CX(s) Applied: B1.3Date: 41848 Location(s): WashingtonOffices(s): Bonneville Power Administration

  14. CX-010195: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Polymer Synthesis Lab - Modification CX(s) Applied: B3.6 Date: 04/15/2013 Location(s): Pennsylvania Offices(s): National Energy Technology Laboratory

  15. CX-007779: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Routine Maintenance CX(s) Applied: B1.3 Date: 01/13/2012 Location(s): Washington Offices(s): River Protection-Richland Operations Office

  16. CX-009159: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Montana Formaul State Energy Program CX(s) Applied: A9, A11 Date: 09/06/2012 Location(s): Montana Offices(s): Golden Field Office

  17. CX-007522: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Crane Removal Project CX(s) Applied: B1.23 Date: 12/15/2011 Location(s): Tennessee Offices(s): Y-12 Site Office

  18. CX-012645: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Wenatchee District 2014 Transmission Line Maintenance - Multiple Lines CX(s) Applied: B1.3Date: 41862 Location(s): WashingtonOffices(s): Bonneville Power Administration

  19. CX-010237: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Pittsburgh Green Innovators Synergy Center CX(s) Applied: A9 Date: 02/28/2013 Location(s): Pennsylvania Offices(s): Golden Field Office

  20. CX-007650: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Control Room Consolidation CX(s) Applied: B2.2 Date: 12/29/2011 Location(s): South Carolina Offices(s): Savannah River Operations Office

  1. CX-012653: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Holcomb-Naselle #1 Access Road Improvements CX(s) Applied: B1.3Date: 41855 Location(s): WashingtonOffices(s): Bonneville Power Administration

  2. CX-012643: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Chehalis-Covington #1 Access Roads CX(s) Applied: B1.13Date: 41865 Location(s): WashingtonOffices(s): Bonneville Power Administration

  3. CX-012641: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Mossy Rock-Chehalis #1 Access Road Maintenance CX(s) Applied: B1.3Date: 41865 Location(s): WashingtonOffices(s): Bonneville Power Administration

  4. CX-010514: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Center for Nanoscale Energy CX(s) Applied: B3.6 Date: 06/24/2013 Location(s): North Dakota Offices(s): Golden Field Office

  5. CX-007778: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Support Buildings CX(s) Applied: B1.15 Date: 01/13/2012 Location(s): Washington Offices(s): River Protection-Richland Operations Office

  6. CX-010091: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Power Line Configuration 2013-1 CX(s) Applied: B4.13 Date: 04/15/2012 Location(s): Idaho Offices(s): Nuclear Energy

  7. CX-010398: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Power Line Configuration CX(s) Applied: B4.13 Date: 04/25/2013 Location(s): Idaho Offices(s): Idaho Operations Office

  8. CX-009312: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Pecan Street Smart Grid Extension Service CX(s) Applied: A9 Date: 08/30/2012 Location(s): Texas Offices(s): National Energy Technology Laboratory

  9. CX-100159 Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Proposed Rulemaking for Energy Conservation Standards for Commercial and Industrial Pumps RIN: 1904-AC54 CX(s) Applied: B5.1

  10. CX-011065: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Midwest Region Alternative Fuels Project CX(s) Applied: A1 Date: 08/29/2013 Location(s): Kansas Offices(s): National Energy Technology Laboratory

  11. CX-011788: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    I-75 Green Corridor Project CX(s) Applied: A1 Date: 02/10/2014 Location(s): Tennessee Offices(s): National Energy Technology Laboratory

  12. CX-007497: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Clean Energy Coalition - Michigan Green Fleets CX(s) Applied: A1 Date: 12/06/2011 Location(s): Michigan Offices(s): National Energy Technology Laboratory

  13. CX-011712: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Midwest Region Alternative Fuels Project CX(s) Applied: A1 Date: 01/08/2014 Location(s): Missouri Offices(s): National Energy Technology Laboratory

  14. CX-010938: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Midwest Region Alternative Fuels Project CX(s) Applied: A1 Date: 09/17/2013 Location(s): Kansas, Kansas Offices(s): National Energy Technology Laboratory

  15. CX-011271: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Idaho Petroleum Reduction Leadership Project CX(s) Applied: A1 Date: 09/30/2013 Location(s): Idaho Offices(s): National Energy Technology Laboratory

  16. CX-012722: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Test Reactor Area (TRA)-653 Conference Room Modifications CX(s) Applied: B1.15Date: 41829 Location(s): IdahoOffices(s): Nuclear Energy

  17. CX-012189: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Microbial Laboratory Analysis CX(s) Applied: B3.12 Date: 05/06/2014 Location(s): Illinois Offices(s): Argonne Site Office

  18. CX-010797: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Serration Behavior of High Entropy Alloys CX(s) Applied: A9 Date: 08/14/2013 Location(s): Illinois Offices(s): National Energy Technology Laboratory

  19. CX-012632: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    LURR 20140456 - Salmon Creek Avenue Pathway Project CX(s) Applied: B4.9Date: 41885 Location(s): WashingtonOffices(s): Bonneville Power Administration

  20. CX-009203: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Ross Maintenance Headquarters Project CX(s) Applied: B1.15 Date: 09/19/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  1. CX-012788: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Bio-Aviation Fuel LCA with GREET CX(s) Applied: B5.15Date: 41906 Location(s): IllinoisOffices(s): Argonne Site Office

  2. CX-011069: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Induction Furnace Melting CX(s) Applied: B3.6 Date: 08/29/2013 Location(s): Oregon Offices(s): National Energy Technology Laboratory

  3. CX-010768: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    ZIRCEX Nuclear Fuel Dissolution Testing CX(s) Applied: B3.6 Date: 08/12/2013 Location(s): Idaho Offices(s): Nuclear Energy

  4. CX-012002: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Raver-Covington Conductor Replacement CX(s) Applied: B1.3 Date: 04/24/2014 Location(s): Washington Offices(s): Bonneville Power Administration

  5. CX-007795: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Easement Acquisition, Carroll County, Arkansas CX(s) Applied: B1.24 Date: 02/07/2011 Location(s): Arkansas Offices(s): Southwestern Power Administration

  6. CX-008161: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Prosser Hatchery Backup Generator Replacement CX(s) Applied: B1.31 Date: 04/16/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  7. CX-012472: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Technology Integration Program CX(s) Applied: A9, A11, B3.11Date: 41873 Location(s): OhioOffices(s): National Energy Technology Laboratory

  8. CX-007613: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Next Generation Ultra Lean Burn Powertrain CX(s) Applied: A9 Date: 01/10/2012 Location(s): California Offices(s): National Energy Technology Laboratory

  9. CX-012200: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Determination of Excess Real Property CX(s) Applied: B1.36 Date: 05/01/2014 Location(s): Colorado Offices(s): Legacy Management

  10. CX-012495: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Building 6 Stack Replacement CX(s) Applied: B1.3Date: 41855 Location(s): West VirginiaOffices(s): National Energy Technology Laboratory

  11. CX-007428: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Ralls Independent School District CX(s) Applied: B5.18 Date: 12/20/2011 Location(s): Texas Offices(s): Golden Field Office

  12. CX-007423: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Highland Independent School District CX(s) Applied: B5.18 Date: 12/13/2011 Location(s): Texas Offices(s): Golden Field Office

  13. CX-007426: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sharyland Independent School District CX(s) Applied: B5.16 Date: 12/13/2011 Location(s): Texas Offices(s): Golden Field Office

  14. CX-010150: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Celilo Fiber System CX(s) Applied: B4.7 Date: 04/15/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  15. CX-009587: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    City of Houston, Texas CX(s) Applied: B5.1 Date: 12/12/2012 Location(s): Texas Offices(s): Golden Field Office

  16. CX-012228: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Deer Park Substation Connection Modifications CX(s) Applied: B4.11 Date: 06/17/2014 Location(s): Washington Offices(s): Bonneville Power Administration

  17. CX-012333: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Support Buildings CX(s) Applied: B1.15 Date: 06/03/2014 Location(s): Washington Offices(s): River Protection-Richland Operations Office

  18. CX-006646: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Restoration South of 54-TPX-10CX(s) Applied: B6.1Date: 02/09/2010Location(s): Casper, WyomingOffice(s): RMOTC

  19. CX-003164: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Categorical Exclusion Determination CX-003164: Categorical Exclusion Determination Optimization of Biomass Production Across a Landscape CX(s) Applied: A9 Date: 07262010...

  20. CX-012796: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Big Eddy-Redmond #1 Wood Pole Replacements CX(s) Applied: B1.3Date: 41919 Location(s): OregonOffices(s): Bonneville Power Administration

  1. CX-008471: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Tree Planting Initiative - Rebuild Western Mass CX(s) Applied: A1 Date: 06/08/2012 Location(s): Massachusetts Offices(s): National Energy Technology Laboratory

  2. CX-012803: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Sacajawea Substation Expansion and Upgrade CX(s) Applied: B4.6Date: 41912 Location(s): WashingtonOffices(s): Bonneville Power Administration

  3. CX-012665: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Cheniere Marketing, LLC CX(s) Applied: B5.7Date: 06/04/2014 Location(s): Multiple LocationsOffices(s): Fossil Energy

  4. CX-011707: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Laser Nanoparticle Lab CX(s) Applied: B3.6 Date: 01/15/2014 Location(s): Pennsylvania Offices(s): National Energy Technology Laboratory

  5. CX-008341: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    A-6 Office Building CX(s) Applied: B1.15 Date: 04/19/2012 Location(s): Pennsylvania Offices(s): Naval Nuclear Propulsion Program

  6. CX-011177: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Hebo Substation Access Road Maintenance CX(s) Applied: B1.3 Date: 09/13/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  7. CX-006491: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Categorical Exclusion Determination CX-006491: Categorical Exclusion Determination Photovoltaic Manufacturing Consortium CX(s) Applied: B3.6 Date: 09012011 Location(s): Florida...

  8. CX-007873: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination CX-007873: Categorical Exclusion Determination Northeast Photovoltaic Regional Training Provider CX(s) Applied: A9, A11, B3.14 Date: 01272012...

  9. CX-007867: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination CX-007867: Categorical Exclusion Determination Northeast Photovoltaic Regional Training Provider CX(s) Applied: A9, A11, B5.16 Date: 01272012...

  10. CX-012640: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Lexington-Longview #1 Access Road Maintenance CX(s) Applied: B1.3Date: 41865 Location(s): WashingtonOffices(s): Bonneville Power Administration

  11. CX-011189: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Naselle Ridge Emergency Generator Replacement CX(s) Applied: B4.6 Date: 08/26/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  12. CX-011237: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Lightspeed Networks Inc. Fiber Installation CX(s) Applied: B4.9 Date: 10/24/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  13. CX-010756: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Solar Utility Network Deployment Acceleration CX(s) Applied: A9, A11 Date: 08/15/2013 Location(s): Virginia Offices(s): Golden Field Office

  14. CX-011102: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    American Solar Transformation Initiative CX(s) Applied: A11 Date: 08/09/2013 Location(s): California Offices(s): Golden Field Office

  15. CX-012790: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Haystack Butte Radio Site Land Acquisition CX(s) Applied: B1.24Date: 41939 Location(s): WashingtonOffices(s): Bonneville Power Administration

  16. CX-010426: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Vista View Fields Land Acquisition CX(s) Applied: B1.25 Date: 06/19/2013 Location(s): Washington Offices(s): Bonneville Power Administration

  17. CX-008250: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Geotechnical Core Drilling for USGS 138 CX(s) Applied: B3.1 Date: 04/18/2012 Location(s): Idaho Offices(s): Nuclear Energy

  18. CX-010699: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    North Boulevard Annex Lease Termination CX(s) Applied: B1.24 Date: 07/11/2013 Location(s): Idaho Offices(s): Idaho Operations Office

  19. CX-008251: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    International Way Office Building Lease Termination CX(s) Applied: B1.24 Date: 03/21/2012 Location(s): Idaho Offices(s): Nuclear Energy

  20. CX-007793: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Jonesboro Maintenance Facility Additions CX(s) Applied: B1.15 Date: 05/10/2011 Location(s): Arkansas Offices(s): Southwestern Power Administration

  1. CX-007794: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Grandview, Arkansas Interconnection CX(s) Applied: B4.12 Date: 04/08/2011 Location(s): Arkansas Offices(s): Southwestern Power Administration

  2. CX-007798: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Springfield Maintenance Garage CX(s) Applied: B1.15 Date: 12/08/2010 Location(s): Missouri Offices(s): Southwestern Power Administration

  3. CX-009704: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Pasco Land Acquisition CX(s) Applied: B1.24 Date: 12/17/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  4. CX-008684: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Metaline Radio Station Upgrade Project CX(s) Applied: B1.19 Date: 07/11/2012 Location(s): Washington Offices(s): Bonneville Power Administration

  5. CX-008989: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    State Energy Program CX(s) Applied: A9, A11 Date: 08/27/2012 Location(s): Kansas Offices(s): Golden Field Office

  6. CX-012728: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    BHP-3 Offsite Bump Repair CX(s) Applied: B1.3Date: 41885 Location(s): TexasOffices(s): Strategic Petroleum Reserve Field Office

  7. CX-009786: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Beck Road Substation Meter Installation CX(s) Applied: B1.7 Date: 01/07/2013 Location(s): Idaho Offices(s): Bonneville Power Administration

  8. CX-010742: Categorical Exclusion Determination

    Office of Energy Efficiency and Renewable Energy (EERE)

    Integrated Simulation Development and Decision Support CX(s) Applied: A9 Date: 08/15/2013 Location(s): California Offices(s): Golden Field Office

  9. CX-012730: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Replace West Hackberry Radio Tower CX(s) Applied: B1.19Date: 41880 Location(s): LouisianaOffices(s): Strategic Petroleum Reserve Field Office

  10. CX-012531: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Distributed Wireless Antenna Sensors for Boiler Condition CX(s) Applied: B3.6Date: 41836 Location(s): CaliforniaOffices(s): National Energy Technology Laboratory

  11. CX-012539: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Distributed Wireless Antenna Sensors for Boiler Condition CX(s) Applied: B3.6Date: 41836 Location(s): TexasOffices(s): National Energy Technology Laboratory

  12. CX-010019: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Iodine Speciation CX(s) Applied: B3.6 Date: 01/28/2013 Location(s): South Carolina Offices(s): Savannah River Operations Office

  13. CX-009295: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Energy Regional Innovation Cluster CX(s) Applied: B3.6 Date: 09/05/2012 Location(s): Pennsylvania Offices(s): National Energy Technology Laboratory

  14. CX-001856: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Exclusion Determination Rural Cooperative Geothermal Development Electric and Agriculture CX(s) Applied: B3.1 Date: 04282010 Location(s): Paisley, Oregon Office(s): Energy...

  15. CX-010763: Categorical Exclusion Determination | Department of...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    CX-010763: Categorical Exclusion Determination Nevada Desert Research Institute- Photovoltaic Installation CX(s) Applied: B5.16 Date: 07172013 Location(s): Nevada Offices(s):...

  16. CX-010258: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Bangladesh Meteorological Instrumentation Installation CX(s) Applied: A9 Date: 04/26/2013 Location(s): Colorado Offices(s): Golden Field Office

  17. CX-012482: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Mid-Atlantic Regional Infrastructure Development Project CX(s) Applied: B5.22Date: 41862 Location(s): MarylandOffices(s): National Energy Technology Laboratory

  18. CX-010057: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Eugene Substation Protective Relay Installation CX(s) Applied: B1.7 Date: 01/29/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  19. CX-010338: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Eugene Substation Fiber Interconnection CX(s) Applied: B4.7 Date: 05/21/2013 Location(s): Oregon Offices(s): Bonneville Power Administration

  20. CX-010343: Categorical Exclusion Determination

    Broader source: Energy.gov [DOE]

    Bald Hill Farms Property Funding CX(s) Applied: B1.25 Date: 05/10/2013 Location(s): Oregon Offices(s): Bonneville Power Administration