National Library of Energy BETA

Sample records for borrador source mem

  1. Sources of stress gradients in electrodeposited Ni MEMS. (Conference...

    Office of Scientific and Technical Information (OSTI)

    Title: Sources of stress gradients in electrodeposited Ni MEMS. The ability of future integrated metal-semiconductor micro-systems such as RF MEMS to perform highly complex ...

  2. memP

    Energy Science and Technology Software Center (OSTI)

    2010-02-05

    The lightweight heap profiling tool memP Version 1 provides a library that can be used with MPI applications that make use of heap memory allocations to provide profile data based on the per-task high-water-mark of heap allocation. The memP output is generated as a text report that can present summary information or specific detail of the allocation call site data for each task The memP library source code is based on teh mpiP MPI profilingmore » library (http://mpip.sourceforge.net), but is substantially different in functionality and organization.« less

  3. Sandia MEMS

    Energy Science and Technology Software Center (OSTI)

    2002-06-13

    SUMMiT V (Sandia Ultra planar Multi level MEMS Technology) is a 5 level surface micromachine fabrication technology, which customers intornal and external to Sandia can access to fabricate prototype MEMS devices. This CD contains an integrated set of electronic files that: a) Describe the SUMMiT V fabrication process b) Provide enabling educational information (including pictures, videos, technical information) c) Facilitate the process of designing MEMS with the SUMMiT process (prototype file, Design Rule Checker, Standardmore » Parts Library) d) Facilitate the process of having MEMS fabricated at Sandia National Laboratories e) Facilitate the process of having post-fabrication services performed. While there exist some files on the CD that are used in conjunction with software package AutoCAD, these files are not intended for use independent of the CD. Nole that the customer must purchase his/her own copy of Aut0CAD to use with these files.« less

  4. SWERA borrador051110

    Open Energy Info (EERE)

    de casas, comunidades o instalaciones tcnicas en lugares fuera del alcance de la red interconectada. En el rea rural tambin se pueden encontrar aplicaciones de energa...

  5. Challenges in the Packaging of MEMS

    SciTech Connect (OSTI)

    Malshe, A.P.; Singh, S.B.; Eaton, W.P.; O'Neal, C.; Brown, W.D.; Miller, W.M.

    1999-03-26

    The packaging of Micro-Electro-Mechanical Systems (MEMS) is a field of great importance to anyone using or manufacturing sensors, consumer products, or military applications. Currently much work has been done in the design and fabrication of MEMS devices but insufficient research and few publications have been completed on the packaging of these devices. This is despite the fact that packaging is a very large percentage of the total cost of MEMS devices. The main difference between IC packaging and MEMS packaging is that MEMS packaging is almost always application specific and greatly affected by its environment and packaging techniques such as die handling, die attach processes, and lid sealing. Many of these aspects are directly related to the materials used in the packaging processes. MEMS devices that are functional in wafer form can be rendered inoperable after packaging. MEMS dies must be handled only from the chip sides so features on the top surface are not damaged. This eliminates most current die pick-and-place fixtures. Die attach materials are key to MEMS packaging. Using hard die attach solders can create high stresses in the MEMS devices, which can affect their operation greatly. Low-stress epoxies can be high-outgassing, which can also affect device performance. Also, a low modulus die attach can allow the die to move during ultrasonic wirebonding resulting to low wirebond strength. Another source of residual stress is the lid sealing process. Most MEMS based sensors and devices require a hermetically sealed package. This can be done by parallel seam welding the package lid, but at the cost of further induced stress on the die. Another issue of MEMS packaging is the media compatibility of the packaged device. MEMS unlike ICS often interface with their environment, which could be high pressure or corrosive. The main conclusion we can draw about MEMS packaging is that the package affects the performance and reliability of the MEMS devices. There is a

  6. Monolithic integration of a MOSFET with a MEMS device

    DOE Patents [OSTI]

    Bennett, Reid; Draper, Bruce

    2003-01-01

    An integrated microelectromechanical system comprises at least one MOSFET interconnected to at least one MEMS device on a common substrate. A method for integrating the MOSFET with the MEMS device comprises fabricating the MOSFET and MEMS device monolithically on the common substrate. Conveniently, the gate insulator, gate electrode, and electrical contacts for the gate, source, and drain can be formed simultaneously with the MEMS device structure, thereby eliminating many process steps and materials. In particular, the gate electrode and electrical contacts of the MOSFET and the structural layers of the MEMS device can be doped polysilicon. Dopant diffusion from the electrical contacts is used to form the source and drain regions of the MOSFET. The thermal diffusion step for forming the source and drain of the MOSFET can comprise one or more of the thermal anneal steps to relieve stress in the structural layers of the MEMS device.

  7. Micro electromechanical systems (MEMS) for mechanical engineers

    SciTech Connect (OSTI)

    Lee, A. P., LLNL

    1996-11-18

    The ongoing advances in Microelectromechanical Systems (MEMS) are providing man-kind the freedom to travel to dimensional spaces never before conceivable. Advances include new fabrication processes, new materials, tailored modeling tools, new fabrication machines, systems integration, and more detailed studies of physics and surface chemistry as applied to the micro scale. In the ten years since its inauguration, MEMS technology is penetrating industries of automobile, healthcare, biotechnology, sports/entertainment, measurement systems, data storage, photonics/optics, computer, aerospace, precision instruments/robotics, and environment monitoring. It is projected that by the turn of the century, MEMS will impact every individual in the industrial world, totaling sales up to $14 billion (source: System Planning Corp.). MEMS programs in major universities have spawned up all over the United States, preparing the brain-power and expertise for the next wave of MEMS breakthroughs. It should be pointed out that although MEMS has been initiated by electrical engineering researchers through the involvement of IC fabrication techniques, today it has evolved such that it requires a totally multi-disciplinary team to develop useful devices. Mechanical engineers are especially crucial to the success of MEMS development, since 90% of the physical realm involved is mechanical. Mechanical engineers are needed for the design of MEMS, the analysis of the mechanical system, the design of testing apparatus, the implementation of analytical tools, and the packaging process. Every single aspect of mechanical engineering is being utilized in the MEMS field today, however, the impact could be more substantial if more mechanical engineers are involved in the systems level designing. In this paper, an attempt is made to create the pathways for a mechanical engineer to enter in the MEMS field. Examples of application in optics and medical devices will be used to illustrate how mechanical

  8. MEMS Pro Design Kit - Parts A, B, and C

    Energy Science and Technology Software Center (OSTI)

    2006-06-15

    Part A: SUMMiT V design Kit components for use with MEMS Pro from SoftMEMS Part B: SUMMiT V remote DRC and gear generator source code for use with autocad visual basic Part C: SUMMiT V DRC rules source and test cases for Calibre DRC engine

  9. Failure mechanisms in MEMS.

    SciTech Connect (OSTI)

    Walraven, Jeremy Allen

    2003-07-01

    MEMS components by their very nature have different and unique failure mechanisms than their macroscopic counterparts. This paper discusses failure mechanisms observed in various MEMS components and technologies. MEMS devices fabricated using bulk and surface micromachining process technologies are emphasized. MEMS devices offer uniqueness in their application, fabrication, and functionality. Their uniqueness creates various failure mechanisms not typically found in their bulk or IC counterparts. In ICs, electrical precautions are taken to mitigate failure. In MEMS, both electrical and mechanical precautions must be enacted to reduce the risk of failure and increased reliability. Unlike ICs, many MEMS components are designed to interact with their environment, making the fabrication, testing, and packaging processes critical for the success of the device.

  10. MEMS in microfluidic channels.

    SciTech Connect (OSTI)

    Ashby, Carol Iris Hill; Okandan, Murat; Michalske, Terry A.; Sounart, Thomas L.; Matzke, Carolyn M.

    2004-03-01

    Microelectromechanical systems (MEMS) comprise a new class of devices that include various forms of sensors and actuators. Recent studies have shown that microscale cantilever structures are able to detect a wide range of chemicals, biomolecules or even single bacterial cells. In this approach, cantilever deflection replaces optical fluorescence detection thereby eliminating complex chemical tagging steps that are difficult to achieve with chip-based architectures. A key challenge to utilizing this new detection scheme is the incorporation of functionalized MEMS structures within complex microfluidic channel architectures. The ability to accomplish this integration is currently limited by the processing approaches used to seal lids on pre-etched microfluidic channels. This report describes Sandia's first construction of MEMS instrumented microfluidic chips, which were fabricated by combining our leading capabilities in MEMS processing with our low-temperature photolithographic method for fabricating microfluidic channels. We have explored in-situ cantilevers and other similar passive MEMS devices as a new approach to directly sense fluid transport, and have successfully monitored local flow rates and viscosities within microfluidic channels. Actuated MEMS structures have also been incorporated into microfluidic channels, and the electrical requirements for actuation in liquids have been quantified with an elegant theory. Electrostatic actuation in water has been accomplished, and a novel technique for monitoring local electrical conductivities has been invented.

  11. MEMS Relays | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    The Next Revolution in MEMS Click to email this to a friend (Opens in new window) Share on Facebook (Opens in new window) Click to share (Opens in new window) Click to share on LinkedIn (Opens in new window) Click to share on Tumblr (Opens in new window) The Next Revolution in MEMS Microelectromechanical systems (MEMS) engineers share what GE Global Research is doing to revolutionize MEMS technology. You Might Also Like 2-1-8-v-mems-applications Engineer Chris Keimel Introduces MEMS Technology

  12. MEMS fluidic actuator

    DOE Patents [OSTI]

    Kholwadwala, Deepesh K.; Johnston, Gabriel A.; Rohrer, Brandon R.; Galambos, Paul C.; Okandan, Murat

    2007-07-24

    The present invention comprises a novel, lightweight, massively parallel device comprising microelectromechanical (MEMS) fluidic actuators, to reconfigure the profile, of a surface. Each microfluidic actuator comprises an independent bladder that can act as both a sensor and an actuator. A MEMS sensor, and a MEMS valve within each microfluidic actuator, operate cooperatively to monitor the fluid within each bladder, and regulate the flow of the fluid entering and exiting each bladder. When adjacently spaced in a array, microfluidic actuators can create arbitrary surface profiles in response to a change in the operating environment of the surface. In an embodiment of the invention, the profile of an airfoil is controlled by independent extension and contraction of a plurality of actuators, that operate to displace a compliant cover.

  13. Development of MEMS based pyroelectric thermal energy harvesters

    Office of Scientific and Technical Information (OSTI)

    (Conference) | SciTech Connect Conference: Development of MEMS based pyroelectric thermal energy harvesters Citation Details In-Document Search Title: Development of MEMS based pyroelectric thermal energy harvesters The efficient conversion of waste thermal energy into electrical energy is of considerable interest due to the huge sources of low-grade thermal energy available in technologically advanced societies. Our group at the Oak Ridge National Laboratory (ORNL) is developing a new type

  14. Failure analysis issues in microelectromechanical systems (MEMS...

    Office of Scientific and Technical Information (OSTI)

    Title: Failure analysis issues in microelectromechanical systems (MEMS). Failure analysis and device characterization of MEMS components are critical steps in understanding the ...

  15. Future challenges for MEMS failure analysis. (Conference) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    Title: Future challenges for MEMS failure analysis. MEMS processes and components are ... Specific areas of concern for the failure analyst will also be discussed. MEMS components ...

  16. Ovenized microelectromechanical system (MEMS) resonator

    DOE Patents [OSTI]

    Olsson, Roy H; Wojciechowski, Kenneth; Kim, Bongsang

    2014-03-11

    An ovenized micro-electro-mechanical system (MEMS) resonator including: a substantially thermally isolated mechanical resonator cavity; a mechanical oscillator coupled to the mechanical resonator cavity; and a heating element formed on the mechanical resonator cavity.

  17. Optically transduced MEMS magnetometer

    DOE Patents [OSTI]

    Nielson, Gregory N; Langlois, Eric

    2014-03-18

    MEMS magnetometers with optically transduced resonator displacement are described herein. Improved sensitivity, crosstalk reduction, and extended dynamic range may be achieved with devices including a deflectable resonator suspended from the support, a first grating extending from the support and disposed over the resonator, a pair of drive electrodes to drive an alternating current through the resonator, and a second grating in the resonator overlapping the first grating to form a multi-layer grating having apertures that vary dimensionally in response to deflection occurring as the resonator mechanically resonates in a plane parallel to the first grating in the presence of a magnetic field as a function of the Lorentz force resulting from the alternating current. A plurality of such multi-layer gratings may be disposed across a length of the resonator to provide greater dynamic range and/or accommodate fabrication tolerances.

  18. MemAxes Visualization Software

    Energy Science and Technology Software Center (OSTI)

    2014-08-28

    Hardware advancements such as Intel's PEBS and AMD's IBS, as well as software developments such as the perf_event API in Linux have made available the acquisition of memory access samples with performance information. MemAxes is a visualization and analysis tool for memory access sample data. By mapping the samples to their associated code, variables, node topology, and application dataset, MemAxes provides intuitive views of the data.

  19. Microelectromechanical (MEM) thermal actuator

    DOE Patents [OSTI]

    Garcia, Ernest J.; Fulcher, Clay W. G.

    2012-07-31

    Microelectromechanical (MEM) buckling beam thermal actuators are disclosed wherein the buckling direction of a beam is constrained to a desired direction of actuation, which can be in-plane or out-of-plane with respect to a support substrate. The actuators comprise as-fabricated, linear beams of uniform cross section supported above the substrate by supports which rigidly attach a beam to the substrate. The beams can be heated by methods including the passage of an electrical current through them. The buckling direction of an initially straight beam upon heating and expansion is controlled by incorporating one or more directional constraints attached to the substrate and proximal to the mid-point of the beam. In the event that the beam initially buckles in an undesired direction, deformation of the beam induced by contact with a directional constraint generates an opposing force to re-direct the buckling beam into the desired direction. The displacement and force generated by the movement of the buckling beam can be harnessed to perform useful work, such as closing contacts in an electrical switch.

  20. Electrostatic MEMS devices with high reliability

    DOE Patents [OSTI]

    Goldsmith, Charles L; Auciello, Orlando H; Sumant, Anirudha V; Mancini, Derrick C; Gudeman, Chris; Sampath, Suresh; Carlilse, John A; Carpick, Robert W; Hwang, James

    2015-02-24

    The present invention provides for an electrostatic microelectromechanical (MEMS) device comprising a dielectric layer separating a first conductor and a second conductor. The first conductor is moveable towards the second conductor, when a voltage is applied to the MEMS device. The dielectric layer recovers from dielectric charging failure almost immediately upon removal of the voltage from the MEMS device.

  1. Metal MEMS Devices | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    MEMS: Inside the Global Research Cleanroom Click to email this to a friend (Opens in new window) Share on Facebook (Opens in new window) Click to share (Opens in new window) Click to share on LinkedIn (Opens in new window) Click to share on Tumblr (Opens in new window) MEMS: Inside the Global Research Cleanroom This follow-up to our introduction to MEMS takes you inside the GE Global Research cleanroom to see more about how MEMS are made. You Might Also Like 2-1-8-v-mems-applications Engineer

  2. Inertial measurement unit using rotatable MEMS sensors

    DOE Patents [OSTI]

    Kohler, Stewart M.; Allen, James J.

    2007-05-01

    A MEM inertial sensor (e.g. accelerometer, gyroscope) having integral rotational means for providing static and dynamic bias compensation is disclosed. A bias compensated MEM inertial sensor is described comprising a MEM inertial sense element disposed on a rotatable MEM stage. A MEM actuator drives the rotation of the stage between at least two predetermined rotational positions. Measuring and comparing the output of the MEM inertial sensor in the at least two rotational positions allows for both static and dynamic bias compensation in inertial calculations based on the sensor's output. An inertial measurement unit (IMU) comprising a plurality of independently rotatable MEM inertial sensors and methods for making bias compensated inertial measurements are disclosed.

  3. Inertial measurement unit using rotatable MEMS sensors

    DOE Patents [OSTI]

    Kohler, Stewart M.; Allen, James J.

    2006-06-27

    A MEM inertial sensor (e.g. accelerometer, gyroscope) having integral rotational means for providing static and dynamic bias compensation is disclosed. A bias compensated MEM inertial sensor is described comprising a MEM inertial sense element disposed on a rotatable MEM stage. A MEM actuator for drives the rotation of the stage between at least two predetermined rotational positions. Measuring and comparing the output of the MEM inertial sensor in the at least two rotational positions allows, for both static and dynamic bias compensation in inertial calculations based on the sensor's output. An inertial measurement unit (IMU) comprising a plurality of independently rotatable MEM inertial sensors and methods for making bias compensated inertial measurements are disclosed.

  4. W-Coating for MEMS

    SciTech Connect (OSTI)

    Fleming, J.G.; Mani, S.S.; Sniegowski, J.J.

    1999-07-08

    The integration of miniaturized mechanical components has spawned a new technology known as microelectromechanical systems (MEMS). Surface micromachining, defined as the fabrication of micromechanical structures from deposited thin films, is one of the core technological processes underlying MEMS. Surface micromachined structures have a large ratio of surface area to volume which makes them particularly vulnerable to adhesion to the substrate or adjacent structures during release or in use--a problem is called stiction. Since microactuators can have surfaces in normal or sliding contact, function and wear are critical issues for reliable operation of MEMS devices. Surface modifications are needed to reduce adhesion and friction in micromechanical structures. In this paper, we will present a process used to selectively coat MEMS devices with Tungsten using a CVD (Chemical Vapor Deposition) process. We will discuss the effect of wet and vapor phase cleans along with different process variables. Endurance of the W coating is important, especially in applications where wear due to repetitive contacts with the film may occur. Further, tungsten is hard and chemically inert, Tungsten CVD is used in the integrated-circuit industry, which makes this, approach manufacturable.

  5. MEMS packaging efforts at Sandia National Laboratories.

    SciTech Connect (OSTI)

    Custer, Jonathan Sloane

    2003-02-01

    Sandia National Laboratories has programs covering a broad range of MEMS technologies from LIGA to bulk to surface micromachining. These MEMS technologies are being considered for an equally broad range of applications, including sensors, actuators, optics, and microfluidics. As these technologies have moved from the research to the prototype product stage, packaging has been required to develop new capabilities to integrated MEMS and other technologies into functional microsystems. This paper discusses several of Sandia's MEMS packaging efforts, focusing mainly on inserting Sandia's SUMMIT V (5-level polysilicon) surface micromachining technology into fieldable microsystems.

  6. The Sandia MEMS Passive Shock Sensor : FY08 failure analysis...

    Office of Scientific and Technical Information (OSTI)

    Technical Report: The Sandia MEMS Passive Shock Sensor : FY08 failure analysis activities. Citation Details In-Document Search Title: The Sandia MEMS Passive Shock Sensor : FY08 ...

  7. MEMS based pyroelectric thermal energy harvester (Patent) | DOEPatents

    Office of Scientific and Technical Information (OSTI)

    Data Explorer Search Results MEMS based pyroelectric thermal energy harvester Title: MEMS based pyroelectric thermal energy harvester A pyroelectric thermal energy harvesting ...

  8. The Sandia MEMS Passive Shock Sensor : dormancy and aging. (Technical...

    Office of Scientific and Technical Information (OSTI)

    The Sandia MEMS Passive Shock Sensor : dormancy and aging. Citation Details In-Document Search Title: The Sandia MEMS Passive Shock Sensor : dormancy and aging. This report ...

  9. Science-based MEMS reliability methodology. (Conference) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    Science-based MEMS reliability methodology. Citation Details In-Document Search Title: Science-based MEMS reliability methodology. No abstract prepared. Authors: Walraven, Jeremy ...

  10. Integration of optoelectronics and MEMS by free-space micro-optics

    SciTech Connect (OSTI)

    WARREN,MIAL E.; SPAHN,OLGA B.; SWEATT,WILLIAM C.; SHUL,RANDY J.; WENDT,JOEL R.; VAWTER,GREGORY A.; KRYGOWSKI,TOM W.; REYES,DAVID NMN; RODGERS,M. STEVEN; SNIEGOWSKI,JEFFRY J.

    2000-06-01

    This report represents the completion of a three-year Laboratory-Directed Research and Development (LDRD) program to investigate combining microelectromechanical systems (MEMS) with optoelectronic components as a means of realizing compact optomechanical subsystems. Some examples of possible applications are laser beam scanning, switching and routing and active focusing, spectral filtering or shattering of optical sources. The two technologies use dissimilar materials with significant compatibility problems for a common process line. This project emphasized a hybrid approach to integrating optoelectronics and MEMS. Significant progress was made in developing processing capabilities for adding optical function to MEMS components, such as metal mirror coatings and through-vias in the substrate. These processes were used to demonstrate two integration examples, a MEMS discriminator driven by laser illuminated photovoltaic cells and a MEMS shutter or chopper. Another major difficulty with direct integration is providing the optical path for the MEMS components to interact with the light. The authors explored using folded optical paths in a transparent substrate to provide the interconnection route between the components of the system. The components can be surface-mounted by flip-chip bonding to the substrate. Micro-optics can be fabricated into the substrate to reflect and refocus the light so that it can propagate from one device to another and them be directed out of the substrate into free space. The MEMS components do not require the development of transparent optics and can be completely compatible with the current 5-level polysilicon process. They report progress on a MEMS-based laser scanner using these concepts.

  11. MEMS3DMODELERV1.0

    Energy Science and Technology Software Center (OSTI)

    2001-10-30

    The MEMS 3 D Modeler is a software package that creates 3D CAD solid models from 2D layout masks and a MEMS process definition. The solid models may be generated in either the ACIS SAT or IGES format. The result is an accurate representation that may be used for visualization or FEA analysis

  12. Differentially-driven MEMS spatial light modulator

    DOE Patents [OSTI]

    Stappaerts, Eddy A.

    2004-09-14

    A MEMS SLM and an electrostatic actuator associated with a pixel in an SLM. The actuator has three electrodes: a lower electrode; an upper electrode fixed with respect to the lower electrode; and a center electrode suspended and actuable between the upper and lower electrodes. The center electrode is capable of resiliently-biasing to restore the center electrode to a non-actuated first equilibrium position, and a mirror is operably connected to the center electrode. A first voltage source provides a first bias voltage across the lower and center electrodes and a second voltage source provides a second bias voltage across the upper and center electrodes, with the first and second bias voltages determining the non-actuated first equilibrium position of the center electrode. A third voltage source provides a variable driver voltage across one of the lower/center and upper/center electrode pairs in series with the corresponding first or second bias voltage, to actuate the center electrode to a dynamic second equilibrium position.

  13. Development of MEMS photoacoustic spectroscopy

    SciTech Connect (OSTI)

    Robinson, Alex Lockwood; Eichenfield, Matthew S.; Griffin, Benjamin; Harvey, Heidi Alyssa; Nielson, Gregory N.; Okandan, Murat; Langlois, Eric; Resnick, Paul James; Shaw, Michael J.; Young, Ian; Givler, Richard C.; Reinke, Charles M.

    2014-01-01

    After years in the field, many materials suffer degradation, off-gassing, and chemical changes causing build-up of measurable chemical atmospheres. Stand-alone embedded chemical sensors are typically limited in specificity, require electrical lines, and/or calibration drift makes data reliability questionable. Along with size, these "Achilles' heels" have prevented incorporation of gas sensing into sealed, hazardous locations which would highly benefit from in-situ analysis. We report on development of an all-optical, mid-IR, fiber-optic based MEMS Photoacoustic Spectroscopy solution to address these limitations. Concurrent modeling and computational simulation are used to guide hardware design and implementation.

  14. Ultrasensitive measurement of MEMS cantilever displacement sensitivity below the shot noise limit

    SciTech Connect (OSTI)

    Pooser, Raphael C; Lawrie, Benjamin J

    2015-01-01

    The displacement of micro-electro-mechanical-systems (MEMs) cantilevers is used to measure a variety of phe- nomena in devices ranging from force microscopes for single spin detection[1] to biochemical sensors[2] to un- cooled thermal imaging systems[3]. The displacement readout is often performed optically with segmented de- tectors or interference measurements. Until recently, var- ious noise sources have limited the minimum detectable displacement in MEMs systems, but it is now possible to minimize all other sources[4] so that the noise level of the coherent light eld, called the shot noise limit (SNL), becomes the dominant source. Light sources dis- playing quantum-enhanced statistics below this limit are available[5, 6], with applications in gravitational wave astronomy[7] and bioimaging[8], but direct displacement measurements of MEMS cantilevers below the SNL have been impossible until now. Here, we demonstrate the rst direct measurement of a MEMs cantilever displace- ment with sub-SNL sensitivity, thus enabling ultratrace sensing, imaging, and microscopy applications. By com- bining multi-spatial-mode quantum light sources with a simple dierential measurement, we show that sub-SNL MEMs displacement sensitivity is highly accessible com- pared to previous eorts that measured the displacement of macroscopic mirrors with very distinct spatial struc- tures crafted with multiple optical parametric ampliers and locking loops[9]. We apply this technique to a com- mercially available microcantilever in order to detect dis- placements 60% below the SNL at frequencies where the microcantilever is shot-noise-limited. These results sup- port a new class of quantum MEMS sensor whose ulti- mate signal to noise ratio is determined by the correla- tions possible in quantum optics systems.

  15. MEMS reliability in shock environments

    SciTech Connect (OSTI)

    TANNER,DANELLE M.; WALRAVEN,JEREMY A.; HELGESEN,KAREN SUE; IRWIN,LLOYD W.; BROWN,FREDERICK A.; SMITH,NORMAN F.; MASTERS,NATHAN

    2000-02-09

    In order to determine the susceptibility of the MEMS (MicroElectroMechanical Systems) devices to shock, tests were performed using haversine shock pulses with widths of 1 to 0.2 ms in the range from 500g to 40,000g. The authors chose a surface-micromachined microengine because it has all the components needed for evaluation: springs that flex, gears that are anchored, and clamps and spring stops to maintain alignment. The microengines, which were unpowered for the tests, performed quite well at most shock levels with a majority functioning after the impact. Debris from the die edges moved at levels greater than 4,000g causing shorts in the actuators and posing reliability concerns. The coupling agent used to prevent stiction in the MEMS release weakened the die-attach bond, which produced failures at 10,000g and above. At 20,000g the authors began to observe structural damage in some of the thin flexures and 2.5-micron diameter pin joints. The authors observed electrical failures caused by the movement of debris. Additionally, they observed a new failure mode where stationary comb fingers contact the ground plane resulting in electrical shorts. These new failure were observed in the control group indicating that they were not shock related.

  16. Design of Surface Micromachined Compliant MEMS

    SciTech Connect (OSTI)

    Joe Anthony Bradley

    2002-12-31

    The consideration of compliant mechanisms as Microelectromechanical Systems (MEMS) is the focus of this research endeavor. MEMS are micron to millimeter devices that combine electrical, mechanical, and information processing capabilities on the same device. These MEMS need some mechanical motion or parts that move relative to each other. This relative motion, using multiple parts, is not desired because of the assembly requirement and the friction introduced. Compliant devices limits or eliminates friction and the need for multi-component assembly. Compliant devices improve designs by creating single piece mechanisms. The purpose of this research is to validate surface micromachining as a viable fabrication process for compliant MEMS designs. Specifically, this research has sought to fabricate a micro-compliant gripper and a micro-compliant clamp to illustrate the process. While other researchers have created compliant MEMs, most have used comb-drive actuation methods and bulk micromachining processes. This research focused on fully-compliant devices that use device flexibility for motion and actuation. Validation of these compliant MEMS is achieved by structural optimization of device design and functional performance testing. This research contributes to the ongoing research in MEMS by evaluating the potential of using surface micromachining as a process for fabricating compliant micro-mechanisms.

  17. Design of Surface micromachined Compliant MEMS

    SciTech Connect (OSTI)

    Joe Anthony Bradley

    2002-08-01

    The consideration of compliant mechanisms as Microelectromechanical Systems (MEMS) is the focus of this research endeavor. MEMS are micron to millimeter devices that combine electrical, mechanical, and information processing capabilities on the same device. These MEMS need some mechanical motion or parts that move relative to each other. This relative motion, using multiple parts, is not desired because of the assembly requirement and the friction introduced. Compliant devices limits or eliminates friction and the need for multi-component assembly. Compliant devices improve designs by creating single piece mechanisms. The purpose of this research is to validate surface micromachining as a viable fabrication process for compliant MEMS designs. Specifically, this research has sought to fabricate a micro-compliant gripper and a micro-compliant clamp to illustrate the process. While other researchers have created compliant MEMS, most have used comb-drive actuation methods and bulk micromachining processes. This research focuses on fully-compliant devices that use device flexibility for motion and actuation. Validation of these compliant MEMS is achieved by structural optimization of device design and functional performance testing. This research contributes to the ongoing research in MEMS by evaluating the potential of using surface micromachining as a process for fabricating compliant micro-mechanisms.

  18. Si-based RF MEMS components.

    SciTech Connect (OSTI)

    Stevens, James E.; Nordquist, Christopher Daniel; Baker, Michael Sean; Fleming, James Grant; Stewart, Harold D.; Dyck, Christopher William

    2005-01-01

    Radio frequency microelectromechanical systems (RF MEMS) are an enabling technology for next-generation communications and radar systems in both military and commercial sectors. RF MEMS-based reconfigurable circuits outperform solid-state circuits in terms of insertion loss, linearity, and static power consumption and are advantageous in applications where high signal power and nanosecond switching speeds are not required. We have demonstrated a number of RF MEMS switches on high-resistivity silicon (high-R Si) that were fabricated by leveraging the volume manufacturing processes available in the Microelectronics Development Laboratory (MDL), a Class-1, radiation-hardened CMOS manufacturing facility. We describe novel tungsten and aluminum-based processes, and present results of switches developed in each of these processes. Series and shunt ohmic switches and shunt capacitive switches were successfully demonstrated. The implications of fabricating on high-R Si and suggested future directions for developing low-loss RF MEMS-based circuits are also discussed.

  19. 05670_MEMS | netl.doe.gov

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Fabry-Perot MEMS Accelerometers for Advanced Seismic Imaging Last Reviewed 1212015 DE-FC26-09NT0005670 Goal The objective of this project is to build an accelerometer and...

  20. RF MEMS reconfigurable triangular patch antenna.

    SciTech Connect (OSTI)

    Nordquist, Christopher Daniel; Christodoulou, Christos George; Feldner, Lucas Matthew

    2005-01-01

    A Ka-band RF MEMS enabled frequency reconfigurable triangular microstrip patch antenna has been designed for monolithic integration with RF MEMS phase shifters to demonstrate a low-cost monolithic passive electronically scanned array (PESA). This paper introduces our first prototype reconfigurable triangular patch antenna currently in fabrication. The aperture coupled patch antenna is fabricated on a dual-layer quartz/alumina substrate using surface micromachining techniques.

  1. RF MEMS reconfigurable triangular patch antenna.

    SciTech Connect (OSTI)

    Christodoulou, Christos George; Nordquist, Christopher Daniel; Feldner, Lucas Matthew

    2005-07-01

    A Ka-band RF MEMS enabled frequency reconfigurable triangular microstrip patch antenna has been designed for monolithic integration with RF MEMS phase shifters to demonstrate a low-cost monolithic passive electronically scanned array (PESA). This paper introduces our first prototype reconfigurable triangular patch antenna currently in fabrication. The aperture coupled patch antenna is fabricated on a dual-layer quartz/alumina substrate using surface micromachining techniques.

  2. Future challenges for MEMS failure analysis.

    SciTech Connect (OSTI)

    Walraven, Jeremy Allen

    2003-07-01

    MEMS processes and components are rapidly changing in device design, processing, and, most importantly, application. This paper will discuss the future challenges faced by the MEMS failure analysis as the field of MEMS (fabrication, component design, and applications) grows. Specific areas of concern for the failure analyst will also be discussed. MEMS components are extremely diverse in their application and function. Failure analysts will have to be equally diverse and/or multidisciplinary in their analysis of these devices. Many tools and techniques developed from the IC industry have been used for MEMS FA, but more MEMS-specific FA toolsets have to be developed for diagnosis of these failure mechanisms. Many of the devices discussed in this paper have global issues associated with failure analysis. Many non destructive techniques must be developed to assess the failure mechanisms. Tools and techniques that can perform these functions on a larger scale will also be required. To achieve this, industry will have to work with academia and government institutions to create the knowledge base required for tool and technique development for global and local defect localization.

  3. Challenges in the Packaging of MEMS

    SciTech Connect (OSTI)

    BROWN, WILLIAM D.; EATON, WILLIAM P.; MALSHE, AJAY P.; MILLER, WILLIAM M.; O'NEAL, CHAD; SINGH, SUSHILA B.

    1999-09-24

    Microelectromechanical Systems (MEMS) packaging is much different from conventional integrated circuit (IC) packaging. Many MEMS devices must interface to the environment in order to perform their intended function, and the package must be able to facilitate access with the environment while protecting the device. The package must also not interfere with or impede the operation of the MEMS device. The die attachment material should be low stress, and low outgassing, while also minimizing stress relaxation overtime which can lead to scale factor shifts in sensor devices. The fabrication processes used in creating the devices must be compatible with each other, and not result in damage to the devices. Many devices are application specific requiring custom packages that are not commercially available. Devices may also need media compatible packages that can protect the devices from harsh environments in which the MEMS device may operate. Techniques are being developed to handle, process, and package the devices such that high yields of functional packaged parts will result. Currently, many of the processing steps are potentially harmful to MEMS devices and negatively affect yield. It is the objective of this paper to review and discuss packaging challenges that exist for MEMS systems and to expose these issues to new audiences from the integrated circuit packaging community.

  4. The Sandia MEMS passive shock sensor : FY08 design summary. ...

    Office of Scientific and Technical Information (OSTI)

    Technical Report: The Sandia MEMS passive shock sensor : FY08 design summary. Citation Details In-Document Search Title: The Sandia MEMS passive shock sensor : FY08 design summary. ...

  5. Sandia National Laboratories SUMMiT VTM MEMS Process: Mature...

    Office of Scientific and Technical Information (OSTI)

    SUMMiT VTM MEMS Process: Mature Technology with an Exciting Future. Citation Details In-Document Search Title: Sandia National Laboratories SUMMiT VTM MEMS Process: Mature ...

  6. Combined photonics and MEMs function demonstration

    SciTech Connect (OSTI)

    Blum, O.; Warren, M.E.; Hou, H.Q.; Choquette, K.D.; Rogers, M.S.; Sniegowski, J.J. [Sandia National Labs., Albuquerque, NM (United States); Carson, R.F. [Microoptical Devices, Inc., Albuquerque, NM (United States)

    1998-01-01

    The authors have recently demonstrated two prototypes where photonics and microelectromechanical system (MEMs) technologies have been integrated to show proof-of-principle functionality for weapon surety functions. These activities are part of a program which is exploring the miniaturization of electromechanical components for making weapon systems safer. Such miniaturization can lead to a low-cost, small, high-performance ``systems-on-a-chip``, and have many applications ranging from advanced military systems to large-volume commercial markets like automobiles, rf or land-based communications networks and equipment, or commercial electronics. One of the key challenges in realization of the microsystem is integration of several technologies including digital electronics; analog and rf electronics, optoelectronics (light emitting and detecting devices and circuits), sensors and actuators, and advanced packaging technologies. In this work the authors describe efforts in integrating MEMs and photonic functions and the fabrication constraints on both system components. Here, they discuss two examples of integration of MEMs and a photonic device. In the first instance, a MEMs locking device pin is driven by a voltage generated by photovoltaic cells connected in series, which are driven by a laser. In the second case, a VCSEL emitting at 1.06 {micro}m is packaged together with a metallized MEMs shutter. By appropriate alignment to the opening in the shutter, the VCSEL is turned on and off by the movement of the Si chopper wheel.

  7. Release Resistant Electrical Interconnections For Mems Devices

    DOE Patents [OSTI]

    Peterson, Kenneth A.; Garrett, Stephen E.; Reber, Cathleen A.

    2005-02-22

    A release resistant electrical interconnection comprising a gold-based electrical conductor compression bonded directly to a highly-doped polysilicon bonding pad in a MEMS, IMEMS, or MOEMS device, without using any intermediate layers of aluminum, titanium, solder, or conductive adhesive disposed in-between the conductor and polysilicon pad. After the initial compression bond has been formed, subsequent heat treatment of the joint above 363 C creates a liquid eutectic phase at the bondline comprising gold plus approximately 3 wt % silicon, which, upon re-solidification, significantly improves the bond strength by reforming and enhancing the initial bond. This type of electrical interconnection is resistant to chemical attack from acids used for releasing MEMS elements (HF, HCL), thereby enabling the use of a "package-first, release-second" sequence for fabricating MEMS devices. Likewise, the bond strength of an Au--Ge compression bond may be increased by forming a transient liquid eutectic phase comprising Au-12 wt % Ge.

  8. Failure analysis issues in microelectromechanical systems (MEMS).

    SciTech Connect (OSTI)

    Walraven, Jeremy Allen

    2005-07-01

    Failure analysis and device characterization of MEMS components are critical steps in understanding the root causes of failure and improving device performance. At the wafer and die level these tasks can be performed with little or no sample preparation. Larger challenges occur after fabrication when the device is packaged, capped, sealed, or otherwise obstructed from view. The challenges and issues of MEMS failure analysis lie in identifying the root cause of failure for these packaged, capped, and sealed devices without perturbing the device or its immediate environment. Novel methods of gaining access to the device or preparing the device for analysis are crucial to accurately determining the root cause of failure. This paper will discuss issues identified in performing root cause failure analysis of packaged MEMS devices, as well as the methods employed to analyze them.

  9. IC-Compatible Technologies for Optical MEMS

    SciTech Connect (OSTI)

    Krygowski, T.W.; Sniegowski, J.J.

    1999-04-30

    Optical Micro Electro Mechanical Systems (Optical MEMS) Technology holds the promise of one-day producing highly integrated optical systems on a common, monolithic substrate. The choice of fabrication technology used to manufacture Optical MEMS will play a pivotal role in the size, functionality and ultimately the cost of optical Microsystems. By leveraging the technology base developed for silicon integrated circuits, large batches of routers, emitters, detectors and amplifiers will soon be fabricated for literally pennies per part. In this article we review the current status of technologies used for Optical MEMS, as well as fabrication technologies of the future, emphasizing manufacturable surface micromachining approaches to producing reliable, low-cost devices for optical communications applications.

  10. MEMS reliability: The challenge and the promise

    SciTech Connect (OSTI)

    Miller, W.M.; Tanner, D.M.; Miller, S.L.; Peterson, K.A.

    1998-05-01

    MicroElectroMechanical Systems (MEMS) that think, sense, act and communicate will open up a broad new array of cost effective solutions only if they prove to be sufficiently reliable. A valid reliability assessment of MEMS has three prerequisites: (1) statistical significance; (2) a technique for accelerating fundamental failure mechanisms, and (3) valid physical models to allow prediction of failures during actual use. These already exist for the microelectronics portion of such integrated systems. The challenge lies in the less well understood micromachine portions and its synergistic effects with microelectronics. This paper presents a methodology addressing these prerequisites and a description of the underlying physics of reliability for micromachines.

  11. Introduction to applications and industries for Microelectromechanical Systems (MEMS).

    SciTech Connect (OSTI)

    Walraven, Jeremy Allen

    2003-07-01

    Microelectromechanical Systems (MEMS) have gained acceptance as viable products for many commercial and government applications. MEMS are currently being used as displays for digital projection systems, sensors for airbag deployment systems, inkjet print head systems, and optical routers. This paper will discuss current and future MEMS applications. What are MEMS? MEMS are typically defined as microscopic devices designed, processed, and used to interact or produce changes within a local environment. A mechanical, electrical, or chemical stimulus can be used to create a mechanical, electrical, or chemical response in a local environment. These smaller, more sophisticated devices that think, act, sense, and communicate are replacing their bulk counterparts in many traditional applications.

  12. Progress toward a MEMS fabricated 100 GHz oscillator.

    SciTech Connect (OSTI)

    Loubriel, Guillermo Manuel; Lemp, Thomas; Weyn, Mark L.; Coleman, Phillip Dale; Rowley, James E.

    2006-02-01

    This report summarizes an LDRD effort which looked at the feasibility of building a MEMS (Micro-Electro-Mechanical Systems) fabricated 100 GHz micro vacuum tube. PIC Simulations proved to be a very useful tool in investigating various device designs. Scaling parameters were identified. This in turn allowed predictions of oscillator growth based on beam parameters, cavity geometry, and cavity loading. The electron beam source was identified as a critical element of the design. FEA's (Field Emission Arrays) were purchased to be built into the micro device. Laboratory testing of the FEA's was also performed which pointed out care and handling issues along with maximum current capabilities. Progress was made toward MEMS fabrication of the device. Techniques were developed and successfully employed to build up several of the subassemblies of the device. However, the lower wall fabrication proved to be difficult and a successful build was not completed. Alternative approaches to building this structure have been identified. Although these alternatives look like good solutions for building the device, it was not possible to complete a redesign and build during the timeframe of this effort.

  13. Sandia Agile MEMS Prototyping, Layout Tools, Education and Services Program

    SciTech Connect (OSTI)

    Schriner, H.; Davies, B.; Sniegowski, J.; Rodgers, M.S.; Allen, J.; Shepard, C.

    1998-05-01

    Research and development in the design and manufacture of Microelectromechanical Systems (MEMS) is growing at an enormous rate. Advances in MEMS design tools and fabrication processes at Sandia National Laboratories` Microelectronics Development Laboratory (MDL) have broadened the scope of MEMS applications that can be designed and manufactured for both military and commercial use. As improvements in micromachining fabrication technologies continue to be made, MEMS designs can become more complex, thus opening the door to an even broader set of MEMS applications. In an effort to further research and development in MEMS design, fabrication, and application, Sandia National Laboratories has launched the Sandia Agile MEMS Prototyping, Layout Tools, Education and Services Program or SAMPLES program. The SAMPLES program offers potential partners interested in MEMS the opportunity to prototype an idea and produce hardware that can be used to sell a concept. The SAMPLES program provides education and training on Sandia`s design tools, analysis tools and fabrication process. New designers can participate in the SAMPLES program and design MEMS devices using Sandia`s design and analysis tools. As part of the SAMPLES program, participants` designs are fabricated using Sandia`s 4 level polycrystalline silicon surface micromachine technology fabrication process known as SUMMiT (Sandia Ultra-planar, Multi-level MEMS Technology). Furthermore, SAMPLES participants can also opt to obtain state of the art, post-fabrication services provided at Sandia such as release, packaging, reliability characterization, and failure analysis. This paper discusses the components of the SAMPLES program.

  14. Predicting fracture in micron-scale polycrystalline silicon MEMS

    Office of Scientific and Technical Information (OSTI)

    structures. (Technical Report) | SciTech Connect Technical Report: Predicting fracture in micron-scale polycrystalline silicon MEMS structures. Citation Details In-Document Search Title: Predicting fracture in micron-scale polycrystalline silicon MEMS structures. Designing reliable MEMS structures presents numerous challenges. Polycrystalline silicon fractures in a brittle manner with considerable variability in measured strength. Furthermore, it is not clear how to use a measured tensile

  15. Preliminary characterization of active MEMS valves. (Technical Report) |

    Office of Scientific and Technical Information (OSTI)

    SciTech Connect Preliminary characterization of active MEMS valves. Citation Details In-Document Search Title: Preliminary characterization of active MEMS valves. Partial characterization of a series of electrostatically actuated active microfluidic valves is to be performed. Tests are performed on a series of 24 valves from two different MEMS sets. Focus is on the physical deformation of the structures under variable pressure loadings, as well as voltage levels. Other issues that inhibit

  16. The Sandia MEMS Passive Shock Sensor : dormancy and aging. (Technical

    Office of Scientific and Technical Information (OSTI)

    Report) | SciTech Connect The Sandia MEMS Passive Shock Sensor : dormancy and aging. Citation Details In-Document Search Title: The Sandia MEMS Passive Shock Sensor : dormancy and aging. This report presents the results of an aging experiment that was established in FY09 and completed in FY10 for the Sandia MEMS Passive Shock Sensor. A total of 37 packages were aged at different temperatures and times, and were then tested after aging to determine functionality. Aging temperatures were

  17. MEMS Packaging - Current Issues and Approaches

    SciTech Connect (OSTI)

    DRESSENDORFER,PAUL V.; PETERSON,DAVID W.; REBER,CATHLEEN ANN

    2000-01-19

    The assembly and packaging of MEMS (Microelectromechanical Systems) devices raise a number of issues over and above those normally associated with the assembly of standard microelectronic circuits. MEMS components include a variety of sensors, microengines, optical components, and other devices. They often have exposed mechanical structures which during assembly require particulate control, space in the package, non-contact handling procedures, low-stress die attach, precision die placement, unique process schedules, hermetic sealing in controlled environments (including vacuum), and other special constraints. These constraints force changes in the techniques used to separate die on a wafer, in the types of packages which can be used in the assembly processes and materials, and in the sealing environment and process. This paper discusses a number of these issues and provides information on approaches being taken or proposed to address them.

  18. Strength of Polysilicon for MEMS Devices

    SciTech Connect (OSTI)

    Buchheit, Thomas E.; LaVan, David A.

    1999-07-20

    The safe, secure and reliable application of Microelectromechanical Systems (MEMS) devices requires knowledge about the distribution in material and mechanical properties of the small-scale structures. A new testing program at Sandia is quantifying the strength distribution using polysilicon samples that reflect the dimensions of critical MEMS components. The strength of polysilicon fabricated at Sandia's Microelectronic Development Laboratory was successfully measured using samples 2.5 microns thick, 1.7 microns wide with lengths between 15 and 25 microns. These tensile specimens have a freely moving hub on one end that anchors the sample to the silicon die and allows free rotation. Each sample is loaded in uniaxial tension by pulling laterally with a flat tipped diamond in a computer-controlled Nanoindenter. The stress-strain curve is calculated using the specimen cross section and gage length dimensions verified by measuring against a standard in the SEM.

  19. GE MEMS for LTE Advanced Mobile Devices | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    GE MEMS Switch Technology Demonstrates Performance Which Could Meet Demands for ... longer battery life, and the advanced RF designs required of LTE-Advanced devices. ...

  20. Review of pyroelectric thermal energy harvesting and new MEMs...

    Office of Scientific and Technical Information (OSTI)

    Conference: Review of pyroelectric thermal energy harvesting and new MEMs based resonant energy conversion techniques Citation Details In-Document Search Title: Review of ...

  1. Predicting fracture in micron-scale polycrystalline silicon MEMS...

    Office of Scientific and Technical Information (OSTI)

    Predicting fracture in micron-scale polycrystalline silicon MEMS structures. Citation Details In-Document Search Title: Predicting fracture in micron-scale polycrystalline silicon ...

  2. Accelerated testing of sliding-contact MEMS devices. (Conference...

    Office of Scientific and Technical Information (OSTI)

    at the Mechanical Reliability of Silicon MEMS held February 27-28, 2006 in Hale, Germany. ... Language: English Subject: 42 ENGINEERING; SILICON; TESTING; MICROELECTRONIC CIRCUITS; ...

  3. Design and reliability of a MEMS thermal rotary actuator. (Conference...

    Office of Scientific and Technical Information (OSTI)

    Citation Details In-Document Search Title: Design and reliability of a MEMS thermal rotary ... Resource Relation: Conference: Proposed for presentation at the TEXMEMS IX held September ...

  4. Thin Silicon MEMS Contact-Stress Sensor Kotovksy, J; Tooker,...

    Office of Scientific and Technical Information (OSTI)

    A; Horsley, D 42 ENGINEERING; 42 ENGINEERING; ACCURACY; ACTUATORS; SILICON This thin, MEMS contact-stress sensor continuously and accurately measures time-varying, solid...

  5. Thin Silicon MEMS Contact-Stress Sensor Kotovsky, J; Tooker,...

    Office of Scientific and Technical Information (OSTI)

    ACCURACY; ACTUATORS; CALIBRATION; DIAPHRAGM; SILICON; STABILITY; THICKNESS This thin, MEMS contact-stress (CS) sensor continuously and accurately measures time-varying, solid...

  6. Thin Silicon MEMS Contact-Stress Sensor Kotovsky, J; Tooker,...

    Office of Scientific and Technical Information (OSTI)

    LIFETIME; PACKAGING; PERFORMANCE; SILICON; THICKNESS This work offers the first, thin, MEMS contact-stress (CS) sensor capable of accurate in situ measruement of time-varying,...

  7. Frequency Stabilization in Nonlinear MEMS and NEMS Oscillators...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Frequency Stabilization in Nonlinear MEMS and NEMS Oscillators Technology available for licensing: a method to create micro- and nanoscale mechanical oscillators with excellent...

  8. Optical system properties of a reconfigurable MEMS interconnect...

    Office of Scientific and Technical Information (OSTI)

    system properties of a reconfigurable MEMS interconnect. Citation Details In-Document ... Sponsoring Org: USDOE Country of Publication: United States Language: English Subject: 42 ...

  9. Integrated superhard and metallic coatings for MEMS : LDRD 57300...

    Office of Scientific and Technical Information (OSTI)

    usemore than previous methods such as high temperature ... MEMS. A method to study the adhesion of these ... Country of Publication: United States Language: English ...

  10. Update on the Sandia MEMS Passive Shock Sensor. (Conference)...

    Office of Scientific and Technical Information (OSTI)

    on the Sandia MEMS Passive Shock Sensor. Abstract not provided. Authors: Mitchell, John Anthony ; Gustafson, Carl Publication Date: 2008-03-01 OSTI Identifier: 1145847 Report...

  11. Failure mechanisms in MEMS. (Conference) | SciTech Connect

    Office of Scientific and Technical Information (OSTI)

    In MEMS, both electrical and mechanical precautions must be enacted to reduce the risk of ... Subject: 42 ENGINEERING; MICROELECTRONICS; FAILURE MODE ANALYSIS; FABRICATION; PACKAGING; ...

  12. Mem. S.A.It. Vol.

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Mem. S.A.It. Vol. 76, 114 c SAIt 2005 Memorie della Polarization and energy content of parsec-scale AGN jets Maxim Lyutikov 1 , Vladimir Pariev 2,3 , Denise Gabuzda 4 1 University of British Columbia, Vancouver, Canada 2 University of Wisconsin Madison, Madison, USA and 3 Lebedev Physical Institute, Moscow, Russia 4 University College Cork, Cork, Ireland Abstract. Most of energy carried by relativistic AGN jets remains undetected until hun- dreds of kiloparsecs where interaction with

  13. Tunable Young's Modulus in Carbon MEMS using Graphene-based Stiffeners...

    Office of Scientific and Technical Information (OSTI)

    Tunable Young's Modulus in Carbon MEMS using Graphene-based Stiffeners. Citation Details In-Document Search Title: Tunable Young's Modulus in Carbon MEMS using Graphene-based ...

  14. The challenge of reliability in MEMS commercialization

    SciTech Connect (OSTI)

    Miller, W.M.; Tanner, D.M.; Miller, S.L.

    1998-09-01

    MicroElectroMechanical Systems (MEMS) that think, sense, act and communicate will open up a broad new array of cost-effective solutions only if MEMS is demonstrated to be sufficiently reliable. This could prove to be a major challenge if it is not addressed concurrently with technology development. There are three requirements for a valid assessment of reliability: statistical significance, identification of fundamental failure mechanisms and development of techniques for accelerating them, and valid physical models to allow prediction of failures during actual use. While these already exist for the microelectronics portion of such integrated systems, the real challenge lies in the less well-understood micromachine portions and its synergistic effects with microelectronics. This requires the elicitation of a methodology focused on MEMS reliability, which the authors discuss. A new testing and analysis infrastructure must also be developed to meet the needs of this methodology. They describe their implementation of this infrastructure and its success in addressing the three requirements for a valid reliability assessment.

  15. Solid polymer MEMS-based fuel cells

    DOE Patents [OSTI]

    Jankowski, Alan F.; Morse, Jeffrey D.

    2008-04-22

    A micro-electro-mechanical systems (MEMS) based thin-film fuel cells for electrical power applications. The MEMS-based fuel cell may be of a solid oxide type (SOFC), a solid polymer type (SPFC), or a proton exchange membrane type (PEMFC), and each fuel cell basically consists of an anode and a cathode separated by an electrolyte layer. The electrolyte layer can consist of either a solid oxide or solid polymer material, or proton exchange membrane electrolyte materials may be used. Additionally catalyst layers can also separate the electrodes (cathode and anode) from the electrolyte. Gas manifolds are utilized to transport the fuel and oxidant to each cell and provide a path for exhaust gases. The electrical current generated from each cell is drawn away with an interconnect and support structure integrated with the gas manifold. The fuel cells utilize integrated resistive heaters for efficient heating of the materials. By combining MEMS technology with thin-film deposition technology, thin-film fuel cells having microflow channels and full-integrated circuitry can be produced that will lower the operating temperature an will yield an order of magnitude greater power density than the currently known fuel cells.

  16. Solid oxide MEMS-based fuel cells

    DOE Patents [OSTI]

    Jankowksi, Alan F.; Morse, Jeffrey D.

    2007-03-13

    A micro-electro-mechanical systems (MEMS) based thin-film fuel cells for electrical power applications. The MEMS-based fuel cell may be of a solid oxide type (SOFC), a solid polymer type (SPFC), or a proton exchange membrane type (PEMFC), and each fuel cell basically consists of an anode and a cathode separated by an electrolyte layer. The electrolyte layer can consist of either a solid oxide or solid polymer material, or proton exchange membrane electrolyte materials may be used. Additionally catalyst layers can also separate the electrodes (cathode and anode) from the electrolyte. Gas manifolds are utilized to transport the fuel and oxidant to each cell and provide a path for exhaust gases. The electrical current generated from each cell is drawn away with an interconnect and support structure integrated with the gas manifold. The fuel cells utilize integrated resistive heaters for efficient heating of the materials. By combining MEMS technology with thin-film deposition technology, thin-film fuel cells having microflow channels and full-integrated circuitry can be produced that will lower the operating temperature an will yield an order of magnitude greater power density than the currently known fuel cells.

  17. SOURCE?

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    on the direction and maintanence of the core code * The code base is platform- neutral ... Its core function is to allow users to merge multiple sources of building energy data into ...

  18. Tools and techniques for failure analysis and qualification of MEMS.

    SciTech Connect (OSTI)

    Walraven, Jeremy Allen

    2003-07-01

    Many of the tools and techniques used to evaluate and characterize ICs can be applied to MEMS technology. In this paper we discuss various tools and techniques used to provide structural, chemical, and electrical analysis and how these data aid in qualifying MEMS technologies.

  19. Pre-release plastic packaging of MEMS and IMEMS devices

    SciTech Connect (OSTI)

    Peterson, Kenneth A.; Conley, William R.

    2002-01-01

    A method is disclosed for pre-release plastic packaging of MEMS and IMEMS devices. The method can include encapsulating the MEMS device in a transfer molded plastic package. Next, a perforation can be made in the package to provide access to the MEMS elements. The non-ablative material removal process can include wet etching, dry etching, mechanical machining, water jet cutting, and ultrasonic machining, or any combination thereof. Finally, the MEMS elements can be released by using either a wet etching or dry plasma etching process. The MEMS elements can be protected with a parylene protective coating. After releasing the MEMS elements, an anti-stiction coating can be applied. The perforating step can be applied to both sides of the device or package. A cover lid can be attached to the face of the package after releasing any MEMS elements. The cover lid can include a window for providing optical access. The method can be applied to any plastic packaged microelectronic device that requires access to the environment, including chemical, pressure, or temperature-sensitive microsensors; CCD chips, photocells, laser diodes, VCSEL's, and UV-EPROMS. The present method places the high-risk packaging steps ahead of the release of the fragile portions of the device. It also provides protection for the die in shipment between the molding house and the house that will release the MEMS elements and subsequently treat the surfaces.

  20. RF-MEMS capacitive switches with high reliability

    DOE Patents [OSTI]

    Goldsmith, Charles L.; Auciello, Orlando H.; Carlisle, John A.; Sampath, Suresh; Sumant, Anirudha V.; Carpick, Robert W.; Hwang, James; Mancini, Derrick C.; Gudeman, Chris

    2013-09-03

    A reliable long life RF-MEMS capacitive switch is provided with a dielectric layer comprising a "fast discharge diamond dielectric layer" and enabling rapid switch recovery, dielectric layer charging and discharging that is efficient and effective to enable RF-MEMS switch operation to greater than or equal to 100 billion cycles.

  1. Are diamonds a MEM's best friend?

    SciTech Connect (OSTI)

    Auciello, O.; Pacheco, S.; Sumant, A. V.; Gudeman, C.; Sampath, S.; Datta, A.; Carpick, R. W.; Adiga, V. P.; Zurcher, P.; Ma, Z.; Yuan, H.-C.; Carlisle, J. A.; Kabius, B.; Hiller, J.; Srinivasan, S.; Freescale Semiconductor; Innovative MicroTech.; Univ. of Pennsylvania; Univ. of Wisconsin at Madison; Advanced Diamond Tech., Inc.; INTEL Res. Lab.

    2007-12-01

    Next-generation military and civilian communication systems will require technologies capable of handling data/ audio, and video simultaneously while supporting multiple RF systems operating in several different frequency bands from the MHz to the GHz range. RF microelectromechani-cal/nanoelectromechanical (MEMS/NEMS) devices, such as resonators and switches, are attractive to industry as they offer a means by which performance can be greatly improved for wireless applications while at the same time potentially reducing overall size and weight as well as manufacturing costs.

  2. The Sandia MEMS passive shock sensor : FY07 maturation activities.

    SciTech Connect (OSTI)

    Houston, Jack E.; Blecke, Jill; Mitchell, John Anthony; Wittwer, Jonathan W.; Crowson, Douglas A.; Clemens, Rebecca C.; Walraven, Jeremy Allen; Epp, David S.; Baker, Michael Sean

    2008-08-01

    This report describes activities conducted in FY07 to mature the MEMS passive shock sensor. The first chapter of the report provides motivation and background on activities that are described in detail in later chapters. The second chapter discusses concepts that are important for integrating the MEMS passive shock sensor into a system. Following these two introductory chapters, the report details modeling and design efforts, packaging, failure analysis and testing and validation. At the end of FY07, the MEMS passive shock sensor was at TRL 4.

  3. Superhydrophobic Surface Coatings for Microfluidics and MEMs.

    SciTech Connect (OSTI)

    Branson, Eric D.; Singh, Seema [Sandia National Laboratories, Livermore, CA] [Sandia National Laboratories, Livermore, CA; Houston, Jack E.; van Swol, Frank B.; Brinker, C. Jeffrey

    2006-11-01

    Low solid interfacial energy and fractally rough surface topography confer to Lotus plants superhydrophobic (SH) properties like high contact angles, rolling and bouncing of liquid droplets, and self-cleaning of particle contaminants. This project exploits the porous fractal structure of a novel, synthetic SH surface for aerosol collection, its self-cleaning properties for particle concentration, and its slippery nature 3 to enhance the performance of fluidic and MEMS devices. We propose to understand fundamentally the conditions needed to cause liquid droplets to roll rather than flow/slide on a surface and how this %22rolling transition%22 influences the boundary condition describing fluid flow in a pipe or micro-channel. Rolling of droplets is important for aerosol collection strategies because it allows trapped particles to be concentrated and transported in liquid droplets with no need for a pre-defined/micromachined fluidic architecture. The fluid/solid boundary condition is important because it governs flow resistance and rheology and establishes the fluid velocity profile. Although many research groups are exploring SH surfaces, our team is the first to unambiguously determine their effects on fluid flow and rheology. SH surfaces could impact all future SNL designs of collectors, fluidic devices, MEMS, and NEMS. Interfaced with inertial focusing aerosol collectors, SH surfaces would allow size-specific particle populations to be collected, concentrated, and transported to a fluidic interface without loss. In microfluidic systems, we expect to reduce the energy/power required to pump fluids and actuate MEMS. Plug-like (rather than parabolic) velocity profiles can greatly improve resolution of chip-based separations and enable unprecedented control of concentration profiles and residence times in fluidic-based micro-reactors. Patterned SH/hydrophilic channels could induce mixing in microchannels and enable development of microflow control elements

  4. Sandia Advanced MEMS Design Tools, V2.1

    Energy Science and Technology Software Center (OSTI)

    2002-02-04

    SUMMiT V (Sandia Ultra planar Multi level MEMS Technology) is a 5 level surface micromachine fabrication technology, which customers intornal and external to Sandia can access to fabricate prototype MEMS devices. This CD contains an integrated set of electronic files that: a) Describe the SUMMiT V fabrication process b) Provide enabling educational information (including pictures, videos, technical information) c) Facilitate the process of designing MEMS with the SUMMiT process (prototype file, Design Rule Checker, Standardmore » Parts Library) d) Facilitate the process of having MEMS fabricated at Sandia National Laboratories e) Facilitate the process of having post-fabrication services performed. While there exist some files on the CD that are used in conjunction with software package AutoCAD, these files are not intended for use independent of the CD. Nole that the customer must purchase his/her own copy of Aut0CAD to use with these files.« less

  5. Sandia Advanced MEMS Design Tools, Version 2.0

    Energy Science and Technology Software Center (OSTI)

    2002-06-13

    Sandia Advanced MEMS Design Tools is a 5-level surface micromachine fabrication technology, which customers internal and external to Sandia can access to fabricate prototype MEMS devices. This CD contains an integrated set of electronic files that: a) Describe the SUMMiT V fabrication process b) Provide enabling educational information (including pictures, videos, technical information) c)Facilitate the process of designing MEMS with the SUMMiT process (prototype file, Design Rule Checker, Standard Parts Library) d) Facilitate the processmore » of having MEMS fabricated at SNL e) Facilitate the process of having post-fabrication services performed While there exist some files on the CD that are used in conjunction with the software AutoCAD, these files are not intended for use independent of the CD. NOTE: THE CUSTOMER MUST PURCHASE HIS/HER OWN COPY OF AutoCAD TO USE WITH THESE FILES.« less

  6. The Sandia MEMS passive shock sensor : FY08 design summary. ...

    Office of Scientific and Technical Information (OSTI)

    Technical Report: The Sandia MEMS passive shock sensor : FY08 design summary. Citation ... Word Cloud More Like This Full Text preview image File size NAView Full Text View Full ...

  7. The Sandia MEMS Passive Shock Sensor : FY08 failure analysis...

    Office of Scientific and Technical Information (OSTI)

    Technical Report: The Sandia MEMS Passive Shock Sensor : FY08 failure analysis activities. ... Word Cloud More Like This Full Text preview image File size NAView Full Text View Full ...

  8. The MEMS Technology Revolution Is Beginning | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Some of the very first MEMS devices were ink-jet print heads and pressure sensors. Later ... devices are used in different parts of a car including the engine, tires and the airbags. ...

  9. Planarization techniques for MEMS: enabling new structures and enhancing manufacturability

    SciTech Connect (OSTI)

    Smith, J.H.

    1996-12-31

    Planarization techniques such as chemical-mechanical polishing (CMP) have emerged as enabling technologies for the manufacturing of multi- level metal interconnects used in high-density Integrated Circuits (IC). An overview of general planarization techniques for MicroElectroMechanical Systems (MEMS) and, in particular, the extension of CMP from sub-micron IC manufacturing to the fabrication of complex surface-micromachined MEMS will be presented. Planarization technique alleviates processing problems associated with fabrication of multi-level polysilicon structures, eliminates design constraints linked with non-planar topography, and provides an avenue for integrating different process technologies. The CMP process and present examples of the use of CMP in fabricating MEMS devices such as microengines, pressure sensors, and proof masses for accelerometers along with its use for monolithically integrating MEMS devices with microelectronics are presented.

  10. Integrated superhard and metallic coatings for MEMS : LDRD 57300...

    Office of Scientific and Technical Information (OSTI)

    ... This approach was used to deposit copper, gold and rhodium onto polysilicon MEMS. A method to study the adhesion of these metals to polysilicon was developed. It was also shown ...

  11. MEMS inertial sensors with integral rotation means.

    SciTech Connect (OSTI)

    Kohler, Stewart M.

    2003-09-01

    The state-of-the-art of inertial micro-sensors (gyroscopes and accelerometers) has advanced to the point where they are displacing the more traditional sensors in many size, power, and/or cost-sensitive applications. A factor limiting the range of application of inertial micro-sensors has been their relatively poor bias stability. The incorporation of an integral sensitive axis rotation capability would enable bias mitigation through proven techniques such as indexing, and foster the use of inertial micro-sensors in more accuracy-sensitive applications. Fabricating the integral rotation mechanism in MEMS technology would minimize the penalties associated with incorporation of this capability, and preserve the inherent advantages of inertial micro-sensors.

  12. Mechanics and tribology of MEMS materials.

    SciTech Connect (OSTI)

    Prasad, Somuri V.; Dugger, Michael Thomas; Boyce, Brad Lee; Buchheit, Thomas Edward

    2004-04-01

    Micromachines have the potential to significantly impact future weapon component designs as well as other defense, industrial, and consumer product applications. For both electroplated (LIGA) and surface micromachined (SMM) structural elements, the influence of processing on structure, and the resultant effects on material properties are not well understood. The behavior of dynamic interfaces in present as-fabricated microsystem materials is inadequate for most applications and the fundamental relationships between processing conditions and tribological behavior in these systems are not clearly defined. We intend to develop a basic understanding of deformation, fracture, and surface interactions responsible for friction and wear of microelectromechanical system (MEMS) materials. This will enable needed design flexibility for these devices, as well as strengthen our understanding of material behavior at the nanoscale. The goal of this project is to develop new capabilities for sub-microscale mechanical and tribological measurements, and to exercise these capabilities to investigate material behavior at this size scale.

  13. MEMS packaging with etching and thinning of lid wafer to form lids and expose device wafer bond pads

    SciTech Connect (OSTI)

    Chanchani, Rajen; Nordquist, Christopher; Olsson, Roy H; Peterson, Tracy C; Shul, Randy J; Ahlers, Catalina; Plut, Thomas A; Patrizi, Gary A

    2013-12-03

    In wafer-level packaging of microelectromechanical (MEMS) devices a lid wafer is bonded to a MEMS wafer in a predermined aligned relationship. Portions of the lid wafer are removed to separate the lid wafer into lid portions that respectively correspond in alignment with MEMS devices on the MEMS wafer, and to expose areas of the MEMS wafer that respectively contain sets of bond pads respectively coupled to the MEMS devices.

  14. High-G testing of MEMS mechanical non-volatile memory and silicon...

    Office of Scientific and Technical Information (OSTI)

    High-G testing of MEMS mechanical non-volatile memory and silicon re-entry switch. Citation Details In-Document Search Title: High-G testing of MEMS mechanical non-volatile memory ...

  15. On-chip monitoring of MEMS gear motion. (Conference) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    Conference: On-chip monitoring of MEMS gear motion. Citation Details In-Document Search Title: On-chip monitoring of MEMS gear motion. We have designed and fabricated a polysilicon ...

  16. High-G testing of MEMS mechanical non-volatile memory and silicon...

    Office of Scientific and Technical Information (OSTI)

    Technical Report: High-G testing of MEMS mechanical non-volatile memory and silicon re-entry switch. Citation Details In-Document Search Title: High-G testing of MEMS mechanical ...

  17. The use of a high-order MEMS deformable mirror in the Gemini Planet Imager

    Office of Scientific and Technical Information (OSTI)

    (Conference) | SciTech Connect The use of a high-order MEMS deformable mirror in the Gemini Planet Imager Citation Details In-Document Search Title: The use of a high-order MEMS deformable mirror in the Gemini Planet Imager We briefly review the development history of the Gemini Planet Imager's 4K Boston Micromachines MEMS deformable mirror. We discuss essential calibration steps and algorithms to control the MEMS with nanometer precision, including voltage-phase calibration and influence

  18. In the OSTI Collections: MEMS | OSTI, US Dept of Energy Office of

    Office of Scientific and Technical Information (OSTI)

    Scientific and Technical Information MEMS View Past "In the OSTI Collections" Articles. Article Acknowledgement: Dr. William N. Watson, Physicist DOE Office of Scientific and Technical Information MEMS as Sensors MEMS as Actuators The Characterization of MEMS References Research Organizations Reports available through SciTech Connect Patents available through DOepatents Report Cited in SciTech Connect Additional References The information-processing components in today's computers

  19. Novel Fabrication and Simple Hybridization of Exotic Material MEMS

    SciTech Connect (OSTI)

    Datskos, P.G.; Rajic, S.

    1999-11-13

    Work in materials other than silicon for MEMS applications has typically been restricted to metals and metal oxides instead of more ''exotic'' semiconductors. However, group III-V and II-VI semiconductors form a very important and versatile collection of material and electronic parameters available to the MEMS and MOEMS designer. With these materials, not only are the traditional mechanical material variables (thermal conductivity, thermal expansion, Young's modulus, etc.) available, but also chemical constituents can be varied in ternary and quaternary materials. This flexibility can be extremely important for both friction and chemical compatibility issues for MEMS. In addition, the ability to continually vary the bandgap energy can be particularly useful for many electronics and infrared detection applications. However, there are two major obstacles associated with alternate semiconductor material MEMS. The first issue is the actual fabrication of non-silicon devices and the second impediment is communicating with these novel devices. We will describe an essentially material independent fabrication method that is amenable to most group III-V and II-VI semiconductors. This technique uses a combination of non-traditional direct write precision fabrication processes such as diamond turning, ion milling, laser ablation, etc. This type of deterministic fabrication approach lends itself to an almost trivial assembly process. We will also describe in detail the mechanical, electrical, and optical self-aligning hybridization technique used for these alternate-material MEMS.

  20. MEMS: A new approach to micro-optics

    SciTech Connect (OSTI)

    Sniegowski, J.J.

    1997-12-31

    MicroElectroMechanical Systems (MEMS) and their fabrication technologies provide great opportunities for application to micro-optical systems (MOEMS). Implementing MOEMS technology ranges from simple, passive components to complicated, active systems. Here, an overview of polysilicon surface micromachining MEMS combined with optics is presented. Recent advancements to the technology, which may enhance its appeal for micro-optics applications are emphasized. Of all the MEMS fabrication technologies, polysilicon surface micromachining technology has the greatest basis in and leverages the most the infrastructure for silicon integrated circuit fabrication. In that respect, it provides the potential for very large volume, inexpensive production of MOEMS. This paper highlights polysilicon surface micromachining technology in regards to its capability to provide both passive and active mechanical elements with quality optical elements.

  1. SAMPLE (Sandia Agile MEMS Prototyping, Layout tools, and Education)

    SciTech Connect (OSTI)

    Davies, B.R.; Barron, C.C.; Sniegowski, J.J.; Rodgers, M.S.

    1997-08-01

    The SAMPLE (Sandia Agile MEMS Protyping, Layout tools, and Education) service makes Sandia`s state-of-the-art surface-micromachining fabrication process, known as SUMMiT, available to US industry for the first time. The service provides a short cause and customized computer-aided design (CAD) tools to assist customers in designing micromachine prototypes to be fabricated in SUMMiT. Frequent small-scale manufacturing runs then provide SAMPLE designers with hundreds of sophisticated MEMS (MicroElectroMechanical Systems) chips. SUMMiT (Sandia Ultra-planar, Multi-level MEMS Technology) offers unique surface-micromachining capabilities, including four levels of polycrystalline silicon (including the ground layer), flanged hubs, substrate contacts, one-micron design rules, and chemical-mechanical polishing (CMP) planarization. This paper describes the SUMMiT process, design tools, and other information relevant to the SAMPLE service and SUMMiT process.

  2. Hidden Challenges to MEMS Commercialization: Design Realization and Reliability Assurance

    SciTech Connect (OSTI)

    McWhorter, P.J.; Miller, S.L.; Miller, W.M.; Rodger, M.S.; Yarberry, V.R.

    1999-01-20

    The successful commercialization of MicroElectroMechanical Systems (MEMS) is an essential prerequisite for their implementation in many critical government applications. Several unique challenges must be overcome to achieve this widespread commercialization. Challenges associated with design realization and reliability assurance are discussed, along with approaches taken by Sandia to successfully overcome these challenges.

  3. Sandia Advanced MEMS Design Tools, Version 2.2.5

    Energy Science and Technology Software Center (OSTI)

    2010-01-19

    The Sandia National Laboratories Advanced MEMS Design Tools, Version 2.2.5, is a collection of menus, prototype drawings, and executables that provide significant productivity enhancements when using AutoCAD to design MEMS components. This release is designed for AutoCAD 2000i, 2002, or 2004 and is supported under Windows NT 4.0, Windows 2000, or XP. SUMMiT V (Sandia Ultra planar Multi level MEMS Technology) is a 5 level surface micromachine fabrication technology, which customers internal and external tomore » Sandia can access to fabricate prototype MEMS devices. This CD contains an integrated set of electronic files that: a) Describe the SUMMiT V fabrication process b) Facilitate the process of designing MEMS with the SUMMiT process (prototype file, Design Rule Checker, Standard Parts Library) New features in this version: AutoCAD 2004 support has been added. SafeExplode ? a new feature that explodes blocks without affecting polylines (avoids exploding polylines into objects that are ignored by the DRC and Visualization tools). Layer control menu ? a pull-down menu for selecting layers to isolate, freeze, or thaw. Updated tools: A check has been added to catch invalid block names. DRC features: Added username/password validation, added a method to update the user?s password. SNL_DRC_WIDTH ? a value to control the width of the DRC error lines. SNL_BIAS_VALUE ? a value use to offset selected geometry SNL_PROCESS_NAME ? a value to specify the process name Documentation changes: The documentation has been updated to include the new features. While there exist some files on the CD that are used in conjunction with software package AutoCAD, these files are not intended for use independent of the CD. Note that the customer must purchase his/her own copy of AutoCAD to use with these files.« less

  4. Sandia Advanced MEMS Design Tools, Version 2.2.5

    SciTech Connect (OSTI)

    Yarberry, Victor; Allen, James; Lantz, Jeffery; Priddy, Brian; & Westling, Belinda

    2010-01-19

    The Sandia National Laboratories Advanced MEMS Design Tools, Version 2.2.5, is a collection of menus, prototype drawings, and executables that provide significant productivity enhancements when using AutoCAD to design MEMS components. This release is designed for AutoCAD 2000i, 2002, or 2004 and is supported under Windows NT 4.0, Windows 2000, or XP. SUMMiT V (Sandia Ultra planar Multi level MEMS Technology) is a 5 level surface micromachine fabrication technology, which customers internal and external to Sandia can access to fabricate prototype MEMS devices. This CD contains an integrated set of electronic files that: a) Describe the SUMMiT V fabrication process b) Facilitate the process of designing MEMS with the SUMMiT process (prototype file, Design Rule Checker, Standard Parts Library) New features in this version: AutoCAD 2004 support has been added. SafeExplode ? a new feature that explodes blocks without affecting polylines (avoids exploding polylines into objects that are ignored by the DRC and Visualization tools). Layer control menu ? a pull-down menu for selecting layers to isolate, freeze, or thaw. Updated tools: A check has been added to catch invalid block names. DRC features: Added username/password validation, added a method to update the user?s password. SNL_DRC_WIDTH ? a value to control the width of the DRC error lines. SNL_BIAS_VALUE ? a value use to offset selected geometry SNL_PROCESS_NAME ? a value to specify the process name Documentation changes: The documentation has been updated to include the new features. While there exist some files on the CD that are used in conjunction with software package AutoCAD, these files are not intended for use independent of the CD. Note that the customer must purchase his/her own copy of AutoCAD to use with these files.

  5. The Sandia MEMS passive shock sensor : FY08 design summary. (Technical

    Office of Scientific and Technical Information (OSTI)

    Report) | SciTech Connect Technical Report: The Sandia MEMS passive shock sensor : FY08 design summary. Citation Details In-Document Search Title: The Sandia MEMS passive shock sensor : FY08 design summary. This report summarizes design and modeling activities for the MEMS passive shock sensor. It provides a description of past design revisions, including the purposes and major differences between design revisions but with a focus on Revisions 4 through 7 and the work performed in fiscal

  6. Thin Silicon MEMS Contact-Stress Sensor (Conference) | SciTech Connect

    Office of Scientific and Technical Information (OSTI)

    Conference: Thin Silicon MEMS Contact-Stress Sensor Citation Details In-Document Search Title: Thin Silicon MEMS Contact-Stress Sensor This thin, MEMS contact-stress (CS) sensor continuously and accurately measures time-varying, solid interface loads in embedded systems over tens of thousands of load cycles. Unlike all other interface load sensors, the CS sensor is extremely thin (< 150 {micro}m), provides accurate, high-speed measurements, and exhibits good stability over time with no loss

  7. Damage of MEMS thermal actuators heated by laser irradiation.

    SciTech Connect (OSTI)

    Walraven, Jeremy Allen; Klody, Kelly Anne; Sackos, John T.; Phinney, Leslie Mary

    2005-01-01

    Optical actuation of microelectromechanical systems (MEMS) is advantageous for applications for which electrical isolation is desired. Thirty-two polycrystalline silicon opto-thermal actuators, optically-powered MEMS thermal actuators, were designed, fabricated, and tested. The design of the opto-thermal actuators consists of a target for laser illumination suspended between angled legs that expand when heated, providing the displacement and force output. While the amount of displacement observed for the opto-thermal actuators was fairly uniform for the actuators, the amount of damage resulting from the laser heating ranged from essentially no damage to significant amounts of damage on the target. The likelihood of damage depended on the target design with two of the four target designs being more susceptible to damage. Failure analysis of damaged targets revealed the extent and depth of the damage.

  8. Damage of MEMS thermal actuators heated by laser irradiation.

    SciTech Connect (OSTI)

    Walraven, Jeremy Allen; Klody, Kelly Anne; Sackos, John T.; Phinney, Leslie Mary

    2004-11-01

    Optical actuation of microelectromechanical systems (MEMS) is advantageous for applications for which electrical isolation is desired. Thirty-two polycrystalline silicon opto-thermal actuators, optically-powered MEMS thermal actuators, were designed, fabricated, and tested. The design of the opto-thermal actuators consists of a target for laser illumination suspended between angled legs that expand when heated, providing the displacement and force output. While the amount of displacement observed for the opto-thermal actuators was fairly uniform for the actuators, the amount of damage resulting from the laser heating ranged from essentially no damage to significant amounts of damage on the target. The likelihood of damage depended on the target design with two of the four target designs being more susceptible to damage. Failure analysis of damaged targets revealed the extent and depth of the damage.

  9. Piston-Driven Fluid Ejectors In Silicon Mems

    DOE Patents [OSTI]

    Galambos, Paul C.; Benavides, Gilbert L.; Jokiel, Jr., Bernhard; Jakubczak II, Jerome F.

    2005-05-03

    A surface-micromachined fluid-ejection apparatus is disclosed which utilizes a piston to provide for the ejection of jets or drops of a fluid (e.g. for ink-jet printing). The piston, which is located at least partially inside a fluid reservoir, is moveable into a cylindrical fluid-ejection chamber connected to the reservoir by a microelectromechanical (MEM) actuator which is located outside the reservoir. In this way, the reservoir and fluid-ejection chamber can be maintained as electric-field-free regions thereby allowing the apparatus to be used with fluids that are electrically conductive or which may react or break down in the presence of a high electric field. The MEM actuator can comprise either an electrostatic actuator or a thermal actuator.

  10. Next-gen RF MEMS Switch for a Smarter, Faster Internet of Things...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    RF MEMS Switch for a Smarter, Faster Internet of Things Karen Lightman 2014.03.28 Big Data. Internet of Things. Quantified Self. Connected Home. Connected City. These...

  11. The Sandia MEMS Passive Shock Sensor : FY08 testing for functionality...

    Office of Scientific and Technical Information (OSTI)

    Shock Sensor : FY08 testing for functionality, model validation, and technology readiness. Citation Details In-Document Search Title: The Sandia MEMS Passive Shock Sensor : FY08 ...

  12. Critical issues for the application of integrated MEMS/CMOS technologies to inertial measurement units

    SciTech Connect (OSTI)

    Smith, J.H.; Ellis, J.R.; Montague, S.; Allen, J.J.

    1997-03-01

    One of the principal applications of monolithically integrated micromechanical/microelectronic systems has been accelerometers for automotive applications. As integrated MEMS/CMOS technologies such as those developed by U.C. Berkeley, Analog Devices, and Sandia National Laboratories mature, additional systems for more sensitive inertial measurements will enter the commercial marketplace. In this paper, the authors will examine key technology design rules which impact the performance and cost of inertial measurement devices manufactured in integrated MEMS/CMOS technologies. These design parameters include: (1) minimum MEMS feature size, (2) minimum CMOS feature size, (3) maximum MEMS linear dimension, (4) number of mechanical MEMS layers, (5) MEMS/CMOS spacing. In particular, the embedded approach to integration developed at Sandia will be examined in the context of these technology features. Presently, this technology offers MEMS feature sizes as small as 1 {micro}m, CMOS critical dimensions of 1.25 {micro}m, MEMS linear dimensions of 1,000 {micro}m, a single mechanical level of polysilicon, and a 100 {micro}m space between MEMS and CMOS. This is applicable to modern precision guided munitions.

  13. In the OSTI Collections: MEMS | OSTI, US Dept of Energy Office...

    Office of Scientific and Technical Information (OSTI)

    ... entitled "MEMS based pyroelectric thermal energy harvester"DOepatents (US Patent ... much of this could be turned into useful energyWikipedia, but present-day conversion ...

  14. Thin Silicon MEMS Contact-Stress Sensor (Conference) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    thin, MEMS contact-stress (CS) sensor continuously and accurately measures time-varying, ... and exhibits good stability over time with no loss of calibration with load cycling. ...

  15. Thin Silicon MEMS Contact-Stress Sensor (Conference) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    Conference: Thin Silicon MEMS Contact-Stress Sensor Citation Details In-Document Search ... and exhibits good stability over time with no loss of calibration with load cycling. ...

  16. Performance and characterization of a MEMS-based device for alignment...

    Office of Scientific and Technical Information (OSTI)

    of a MEMS-based device for alignment and manipulation of x-ray nanofocusing optics Xu, Weihe Brookhaven National Laboratory, Upton, NY, 11973 USA; Lauer, Kenneth...

  17. Friction of different monolayer lubricants in MEMs interfaces.

    SciTech Connect (OSTI)

    Carpick, Robert W. (University of Wisconsin, Madison, WI); Street, Mark D.; Ashurst, William Robert; Corwin, Alex David

    2006-01-01

    This report details results from our last year of work (FY2005) on friction in MEMS as funded by the Campaign 6 program for the Microscale Friction project. We have applied different monolayers to a sensitive MEMS friction tester called the nanotractor. The nanotractor is also a useful actuator that can travel {+-}100 {micro}m in 40 nm steps, and is being considered for several MEMS applications. With this tester, we can find static and dynamic coefficients of friction. We can also quantify deviations from Amontons' and Coulomb's friction laws. Because of the huge surface-to-volume ratio at the microscale, surface properties such as adhesion and friction can dominate device performance, and therefore such deviations are important to quantify and understand. We find that static and dynamic friction depend on the monolayer lubricant applied. The friction data can be modeled with a non-zero adhesion force, which represents a deviation from Amontons' Law. Further, we show preliminary data indicating that the adhesion force depends not only on the monolayer, but also on the normal load applied. Finally, we also observe slip deflections before the transition from static to dynamic friction, and find that they depend on the monolayer.

  18. Selective W for coating and releasing MEMS devices

    SciTech Connect (OSTI)

    Mani, S.S.; Fleming, J.G.; Sniegowski, J.J.; Boer, M.P. de; Irwin, L.W.; Walraven, J.A.; Tanner, D.M.; Lavan, D.A.

    2000-01-04

    Two major problems associated with Si-based MEMS (MicroElectroMechanical Systems) devices are stiction and wear. Surface modifications are needed to reduce both adhesion and friction in micromechanical structures to solve these problems. In this paper, the authors will present a CVD (Chemical Vapor Deposition) process that selectively coats MEMS devices with tungsten and significantly enhances device durability. Tungsten CVD is used in the integrated-circuit industry, which makes this approach manufacturable. This selective deposition process results in a very conformal coating and can potentially address both stiction and wear problems confronting MEMS processing. The selective deposition of tungsten is accomplished through the silicon reduction of WF{sub 6}. The self-limiting nature of this selective W deposition process ensures the consistency necessary for process control. The tungsten is deposited after the removal of the sacrificial oxides to minimize stress and process integration problems. Tungsten coating adheres well and is hard and conducting, requirements for device performance. Furthermore, since the deposited tungsten infiltrates under adhered silicon parts and the volume of W deposited is less than the amount of Si consumed, it appears to be possible to release stuck parts that are contacted over small areas such as dimples. The wear resistance of selectively coated W parts has been shown to be significantly improved on microengine test structures.

  19. MEMS-based thin-film fuel cells

    DOE Patents [OSTI]

    Jankowksi, Alan F.; Morse, Jeffrey D.

    2003-10-28

    A micro-electro-mechanical systems (MEMS) based thin-film fuel cells for electrical power applications. The MEMS-based fuel cell may be of a solid oxide type (SOFC), a solid polymer type (SPFC), or a proton exchange membrane type (PEMFC), and each fuel cell basically consists of an anode and a cathode separated by an electrolyte layer. Additionally catalyst layers can also separate the electrodes (cathode and anode) from the electrolyte. Gas manifolds are utilized to transport the fuel and oxidant to each cell and provide a path for exhaust gases. The electrical current generated from each cell is drawn away with an interconnect and support structure integrated with the gas manifold. The fuel cells utilize integrated resistive heaters for efficient heating of the materials. By combining MEMS technology with thin-film deposition technology, thin-film fuel cells having microflow channels and full-integrated circuitry can be produced that will lower the operating temperature an will yield an order of magnitude greater power density than the currently known fuel cells.

  20. Multi-tunable microelectromechanical system (MEMS) resonators

    DOE Patents [OSTI]

    Stalford, Harold L.; Butler, Michael A.; Schubert, W. Kent

    2006-08-22

    A method for tuning a vibratory device including a cantilevered resonator comprising the steps of increasing a voltage V.sub.0 supplied to the vibratory device to thereby increase the bandwidth of the vibratory device; and keeping the resonant frequency of the vibratory device at substantially that natural frequency of the cantilevered resonator, wherein the vibratory device comprises: a capacitor including a movable plate and a fixed plate spaced from each other, the movable plate being part of the cantilevered resonator; a voltage source connected to the capacitor for providing voltage V.sub.0 across the capacitor to produce an attractive force between movable plate and fixed plate; a circuit connecting the voltage source to the capacitor; and a load resistor in said circuit having a resistance R.sub.L satisfying the following equation: .mu..omega..times..times..lamda. ##EQU00001## where: .mu. is at least 10; .omega..sub.0 is the beam constant for the cantilevered resonator; c.sub.0 is the capacitance for the capacitor; and .lamda. is the voltage dependent coupling parameter for voltage V.sub.0.

  1. Validation of thermal models for a prototypical MEMS thermal actuator.

    SciTech Connect (OSTI)

    Gallis, Michail A.; Torczynski, John Robert; Piekos, Edward Stanley; Serrano, Justin Raymond; Gorby, Allen D.; Phinney, Leslie Mary

    2008-09-01

    This report documents technical work performed to complete the ASC Level 2 Milestone 2841: validation of thermal models for a prototypical MEMS thermal actuator. This effort requires completion of the following task: the comparison between calculated and measured temperature profiles of a heated stationary microbeam in air. Such heated microbeams are prototypical structures in virtually all electrically driven microscale thermal actuators. This task is divided into four major subtasks. (1) Perform validation experiments on prototypical heated stationary microbeams in which material properties such as thermal conductivity and electrical resistivity are measured if not known and temperature profiles along the beams are measured as a function of electrical power and gas pressure. (2) Develop a noncontinuum gas-phase heat-transfer model for typical MEMS situations including effects such as temperature discontinuities at gas-solid interfaces across which heat is flowing, and incorporate this model into the ASC FEM heat-conduction code Calore to enable it to simulate these effects with good accuracy. (3) Develop a noncontinuum solid-phase heat transfer model for typical MEMS situations including an effective thermal conductivity that depends on device geometry and grain size, and incorporate this model into the FEM heat-conduction code Calore to enable it to simulate these effects with good accuracy. (4) Perform combined gas-solid heat-transfer simulations using Calore with these models for the experimentally investigated devices, and compare simulation and experimental temperature profiles to assess model accuracy. These subtasks have been completed successfully, thereby completing the milestone task. Model and experimental temperature profiles are found to be in reasonable agreement for all cases examined. Modest systematic differences appear to be related to uncertainties in the geometric dimensions of the test structures and in the thermal conductivity of the

  2. Charging characteritiscs of ultrananocrystalline diamond in RF MEMS capacitive switches.

    SciTech Connect (OSTI)

    Sumant, A. V.; Goldsmith, C.; Auciello, O.; Carlisle, J.; Zheng, H.; Hwang, J. C. M.; Palego, C.; Wang, W.; Carpick, R.; Adiga, V.; Datta, A.; Gudeman, C.; O'Brien, S.; Sampath, S.

    2010-05-01

    Modifications to a standard capacitive MEMS switch process have been made to allow the incorporation of ultra-nano-crystalline diamond as the switch dielectric. The impact on electromechanical performance is minimal. However, these devices exhibit uniquely different charging characteristics, with charging and discharging time constants 5-6 orders of magnitude quicker than conventional materials. This operation opens the possibility of devices which have no adverse effects of dielectric charging and can be operated near-continuously in the actuated state without significant degradation in reliability.

  3. Micro Electro-Mechanical System (MEMS) Pressure Sensor for Footwear

    DOE Patents [OSTI]

    Kholwadwala, Deepesh K.; Rohrer, Brandon R.; Spletzer, Barry L.; Galambos, Paul C.; Wheeler, Jason W.; Hobart, Clinton G.; Givler, Richard C.

    2008-09-23

    Footwear comprises a sole and a plurality of sealed cavities contained within the sole. The sealed cavities can be incorporated as deformable containers within an elastic medium, comprising the sole. A plurality of micro electro-mechanical system (MEMS) pressure sensors are respectively contained within the sealed cavity plurality, and can be adapted to measure static and dynamic pressure within each of the sealed cavities. The pressure measurements can provide information relating to the contact pressure distribution between the sole of the footwear and the wearer's environment.

  4. Tunable cavity resonator including a plurality of MEMS beams

    DOE Patents [OSTI]

    Peroulis, Dimitrios; Fruehling, Adam; Small, Joshua Azariah; Liu, Xiaoguang; Irshad, Wasim; Arif, Muhammad Shoaib

    2015-10-20

    A tunable cavity resonator includes a substrate, a cap structure, and a tuning assembly. The cap structure extends from the substrate, and at least one of the substrate and the cap structure defines a resonator cavity. The tuning assembly is positioned at least partially within the resonator cavity. The tuning assembly includes a plurality of fixed-fixed MEMS beams configured for controllable movement relative to the substrate between an activated position and a deactivated position in order to tune a resonant frequency of the tunable cavity resonator.

  5. The use of a high-order MEMS deformable mirror in the Gemini Planet Imager

    SciTech Connect (OSTI)

    Poyneer, L A; Bauman, B; Cornelissen, S; Jones, S; Macintosh, B; Palmer, D; Isaacs, J

    2010-12-17

    We briefly review the development history of the Gemini Planet Imager's 4K Boston Micromachines MEMS deformable mirror. We discuss essential calibration steps and algorithms to control the MEMS with nanometer precision, including voltage-phase calibration and influence function characterization. We discuss the integration of the MEMS into GPI's Adaptive Optics system at Lawrence Livermore and present experimental results of 1.5 kHz closed-loop control. We detail mitigation strategies in the coronagraph to reduce the impact of abnormal actuators on final image contrast.

  6. Performance of a MEMS-base Adaptive Optics Optical Coherency Tomography System

    SciTech Connect (OSTI)

    Evans, J; Zadwadzki, R J; Jones, S; Olivier, S; Opkpodu, S; Werner, J S

    2008-01-16

    We have demonstrated that a microelectrical mechanical systems (MEMS) deformable mirror can be flattened to < 1 nm RMS within controllable spatial frequencies over a 9.2-mm aperture making it a viable option for high-contrast adaptive optics systems (also known as Extreme Adaptive Optics). The Extreme Adaptive Optics Testbed at UC Santa Cruz is being used to investigate and develop technologies for high-contrast imaging, especially wavefront control. A phase shifting diffraction interferometer (PSDI) measures wavefront errors with sub-nm precision and accuracy for metrology and wavefront control. Consistent flattening, required testing and characterization of the individual actuator response, including the effects of dead and low-response actuators. Stability and repeatability of the MEMS devices was also tested. An error budget for MEMS closed loop performance will summarize MEMS characterization.

  7. Thin Silicon MEMS Contact-Stress Sensor (Conference) | SciTech...

    Office of Scientific and Technical Information (OSTI)

    work offers the first, thin, MEMS contact-stress (CS) sensor capable of accurate in situ measruement of time-varying, contact-stress between two solid interfaces (e.g. in vivo ...

  8. Inertial sensing microelectromechanical (MEM) safe-arm device

    DOE Patents [OSTI]

    Roesler, Alexander W.; Wooden, Susan M.

    2009-05-12

    Microelectromechanical (MEM) safe-arm devices comprise a substrate upon which a sense mass, that can contain an energetic material, is constrained to move along a pathway defined by a track disposed on the surface of the substrate. The pathway has a first end comprising a "safe" position and a second end comprising an "armed" position, whereat the second end the sense mass can be aligned proximal to energetic materials comprising the explosive train, within an explosive component. The sense mass can be confined in the safe position by a first latch, operable to release the sense mass by an acceleration acting in a direction substantially normal to the surface of the substrate. A second acceleration, acting in a direction substantially parallel to the surface of the substrate, can cause the sense mass to traverse the pathway from the safe position to the armed position.

  9. Method and system for automated on-chip material and structural certification of MEMS devices

    DOE Patents [OSTI]

    Sinclair, Michael B.; DeBoer, Maarten P.; Smith, Norman F.; Jensen, Brian D.; Miller, Samuel L.

    2003-05-20

    A new approach toward MEMS quality control and materials characterization is provided by a combined test structure measurement and mechanical response modeling approach. Simple test structures are cofabricated with the MEMS devices being produced. These test structures are designed to isolate certain types of physical response, so that measurement of their behavior under applied stress can be easily interpreted as quality control and material properties information.

  10. Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches

    DOE Patents [OSTI]

    Sumant, Anirudha V.; Auciello, Orlando H.; Mancini, Derrick C.

    2013-01-15

    An efficient deposition process is provided for fabricating reliable RF MEMS capacitive switches with multilayer ultrananocrystalline (UNCD) films for more rapid recovery, charging and discharging that is effective for more than a billion cycles of operation. Significantly, the deposition process is compatible for integration with CMOS electronics and thereby can provide monolithically integrated RF MEMS capacitive switches for use with CMOS electronic devices, such as for insertion into phase array antennas for radars and other RF communication systems.

  11. MEMS closed-loop control incorporating a memristor as feedback sensing element

    SciTech Connect (OSTI)

    Garcia, Ernest J.; Almeida, Sergio F.; Mireles, Jr., Jose; Zubia, David

    2015-12-01

    In this work the integration of a memristor with a MEMS parallel plate capacitor coupled by an amplification stage is simulated. It is shown that the MEMS upper plate position can be controlled up to 95% of the total gap. Due to its common operation principle, the change in the MEMS plate position can be interpreted by the change in the memristor resistance, or memristance. A memristance modulation of ~1 KΩ was observed. A polynomial expression representing the MEMS upper plate displacement as a function of the memristance is presented. Thereafter a simple design for a voltage closed-loop control is presented showing that the MEMS upper plate can be stabilized up to 95% of the total gap using the memristor as a feedback sensing element. As a result, the memristor can play important dual roles in overcoming the limited operation range of MEMS parallel plate capacitors and in simplifying read-out circuits of those devices by representing the motion of the upper plate in the form of resistance change instead of capacitance change.

  12. MEMS closed-loop control incorporating a memristor as feedback sensing element

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Garcia, Ernest J.; Almeida, Sergio F.; Mireles, Jr., Jose; Zubia, David

    2015-12-01

    In this work the integration of a memristor with a MEMS parallel plate capacitor coupled by an amplification stage is simulated. It is shown that the MEMS upper plate position can be controlled up to 95% of the total gap. Due to its common operation principle, the change in the MEMS plate position can be interpreted by the change in the memristor resistance, or memristance. A memristance modulation of ~1 KΩ was observed. A polynomial expression representing the MEMS upper plate displacement as a function of the memristance is presented. Thereafter a simple design for a voltage closed-loop control ismore » presented showing that the MEMS upper plate can be stabilized up to 95% of the total gap using the memristor as a feedback sensing element. As a result, the memristor can play important dual roles in overcoming the limited operation range of MEMS parallel plate capacitors and in simplifying read-out circuits of those devices by representing the motion of the upper plate in the form of resistance change instead of capacitance change.« less

  13. MEMS Switches Are XS in Size, XXL in Power | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    MEMS Switches Are XS in Size, XXL in Power Click to email this to a friend (Opens in new window) Share on Facebook (Opens in new window) Click to share (Opens in new window) Click to share on LinkedIn (Opens in new window) Click to share on Tumblr (Opens in new window) MEMS Switches Are XS in Size, XXL in Power Chris Keimel 2012.09.28 Walk into a dark room and flip a light switch on. This simple action connected an electrical circuit and caused a light to illuminate the room. That switch is a

  14. Improved Design of Optical MEMS Using the SUMMiT Fabrication Process

    SciTech Connect (OSTI)

    Michalicek, M.A.; Comtois, J.H.; Barron, C.C.

    1997-12-31

    This paper describes the design and fabrication of optical Microelectromechanical Systems (MEMS) devices using the Sandia Ultra planar Multilevel MEMS Technology (SUMMiT) fabrication process. This state of the art process, offered by Sandia National Laboratories, provides unique and very advantageous features which make it ideal for optical devices. This enabling process permits the development of micromirror devices with near ideal characteristics which have previously been unrealizable in standard polysilicon processes. This paper describes such characteristics as elevated address electrodes, individual address wiring beneath the device, planarized mirror surfaces, unique post-process metallization, and the best active surface area to date.

  15. Patterning of nanocrystalline diamond films for diamond microstructures useful in MEMS and other devices

    DOE Patents [OSTI]

    Gruen, Dieter M.; Busmann, Hans-Gerd; Meyer, Eva-Maria; Auciello, Orlando; Krauss, Alan R.; Krauss, Julie R.

    2004-11-02

    MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.

  16. Research and Development of Non-Spectroscopic MEMS-Based Sensor Arrays for

    Office of Scientific and Technical Information (OSTI)

    Targeted Gas Detection (Technical Report) | SciTech Connect Research and Development of Non-Spectroscopic MEMS-Based Sensor Arrays for Targeted Gas Detection Citation Details In-Document Search Title: Research and Development of Non-Spectroscopic MEMS-Based Sensor Arrays for Targeted Gas Detection Authors: Loui, A ; McCall, S K ; Zumstein, J M Publication Date: 2012-11-21 OSTI Identifier: 1059450 Report Number(s): LLNL-TR-606593 DOE Contract Number: W-7405-ENG-48 Resource Type: Technical

  17. MEMS-based fuel cells with integrated catalytic fuel processor and method thereof

    DOE Patents [OSTI]

    Jankowski, Alan F.; Morse, Jeffrey D.; Upadhye, Ravindra S.; Havstad, Mark A.

    2011-08-09

    Described herein is a means to incorporate catalytic materials into the fuel flow field structures of MEMS-based fuel cells, which enable catalytic reforming of a hydrocarbon based fuel, such as methane, methanol, or butane. Methods of fabrication are also disclosed.

  18. A dynamic system matching technique for improving the accuracy of MEMS gyroscopes

    SciTech Connect (OSTI)

    Stubberud, Peter A.; Stubberud, Stephen C.; Stubberud, Allen R.

    2014-12-10

    A classical MEMS gyro transforms angular rates into electrical values through Euler's equations of angular rotation. Production models of a MEMS gyroscope will have manufacturing errors in the coefficients of the differential equations. The output signal of a production gyroscope will be corrupted by noise, with a major component of the noise due to the manufacturing errors. As is the case of the components in an analog electronic circuit, one way of controlling the variability of a subsystem is to impose extremely tight control on the manufacturing process so that the coefficient values are within some specified bounds. This can be expensive and may even be impossible as is the case in certain applications of micro-electromechanical (MEMS) sensors. In a recent paper [2], the authors introduced a method for combining the measurements from several nominally equal MEMS gyroscopes using a technique based on a concept from electronic circuit design called dynamic element matching [1]. Because the method in this paper deals with systems rather than elements, it is called a dynamic system matching technique (DSMT). The DSMT generates a single output by randomly switching the outputs of several, nominally identical, MEMS gyros in and out of the switch output. This has the effect of 'spreading the spectrum' of the noise caused by the coefficient errors generated in the manufacture of the individual gyros. A filter can then be used to eliminate that part of the spread spectrum that is outside the pass band of the gyro. A heuristic analysis in that paper argues that the DSMT can be used to control the effects of the random coefficient variations. In a follow-on paper [4], a simulation of a DSMT indicated that the heuristics were consistent. In this paper, analytic expressions of the DSMT noise are developed which confirm that the earlier conclusions are valid. These expressions include the various DSMT design parameters and, therefore, can be used as design tools for DSMT

  19. Mechanical behavior simulation of MEMS-based cantilever beam using COMSOL multiphysics

    SciTech Connect (OSTI)

    Acheli, A. Serhane, R.

    2015-03-30

    This paper presents the studies of mechanical behavior of MEMS cantilever beam made of poly-silicon material, using the coupling of three application modes (plane strain, electrostatics and the moving mesh) of COMSOL Multi-physics software. The cantilevers playing a key role in Micro Electro-Mechanical Systems (MEMS) devices (switches, resonators, etc) working under potential shock. This is why they require actuation under predetermined conditions, such as electrostatic force or inertial force. In this paper, we present mechanical behavior of a cantilever actuated by an electrostatic force. In addition to the simplification of calculations, the weight of the cantilever was not taken into account. Different parameters like beam displacement, electrostatics force and stress over the beam have been calculated by finite element method after having defining the geometry, the material of the cantilever model (fixed at one of ends but is free to move otherwise) and his operational space.

  20. MEMS Fuel Cells--Low Temp--High Power Density - Energy Innovation Portal

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Energy Storage Energy Storage Find More Like This Return to Search MEMS Fuel Cells--Low Temp--High Power Density Lawrence Livermore National Laboratory Contact LLNL About This Technology Technology Marketing Summary Rechargeable batteries presently provide limited energy density and cyclical lifetime for portable power applications, with only incremental improvements forecasted in the foreseeable future. Furthermore, recharging requires access to electrical outlets via a tethered charger. The

  1. Solution-verified reliability analysis and design of bistable MEMS using error estimation and adaptivity.

    SciTech Connect (OSTI)

    Eldred, Michael Scott; Subia, Samuel Ramirez; Neckels, David; Hopkins, Matthew Morgan; Notz, Patrick K.; Adams, Brian M.; Carnes, Brian; Wittwer, Jonathan W.; Bichon, Barron J.; Copps, Kevin D.

    2006-10-01

    This report documents the results for an FY06 ASC Algorithms Level 2 milestone combining error estimation and adaptivity, uncertainty quantification, and probabilistic design capabilities applied to the analysis and design of bistable MEMS. Through the use of error estimation and adaptive mesh refinement, solution verification can be performed in an automated and parameter-adaptive manner. The resulting uncertainty analysis and probabilistic design studies are shown to be more accurate, efficient, reliable, and convenient.

  2. X-ray diffraction characterization of suspended structures forMEMS applications

    SciTech Connect (OSTI)

    Goudeau, P.; Tamura, N.; Lavelle, B.; Rigo, S.; Masri, T.; Bosseboeuf, A.; Sarnet, T.; Petit, J.-A.; Desmarres, J.-M.

    2005-09-15

    Mechanical stress control is becoming one of the major challenges for the future of micro and nanotechnologies. Micro scanning X-ray diffraction is one of the promising techniques that allows stress characterization in such complex structures at sub micron scales. Two types of MEMS structure have been studied: a bilayer cantilever composed of a gold film deposited on poly-silicon and a boron doped silicon bridge. X-ray diffraction results are discussed in view of numerical simulation experiments.

  3. MEMS 3-DoF gyroscope design, modeling and simulation through equivalent circuit lumped parameter model

    SciTech Connect (OSTI)

    Mian, Muhammad Umer Khir, M. H. Md.; Tang, T. B.; Dennis, John Ojur; Riaz, Kashif; Iqbal, Abid; Bazaz, Shafaat A.

    2015-07-22

    Pre-fabrication, behavioural and performance analysis with computer aided design (CAD) tools is a common and fabrication cost effective practice. In light of this we present a simulation methodology for a dual-mass oscillator based 3 Degree of Freedom (3-DoF) MEMS gyroscope. 3-DoF Gyroscope is modeled through lumped parameter models using equivalent circuit elements. These equivalent circuits consist of elementary components which are counterpart of their respective mechanical components, used to design and fabricate 3-DoF MEMS gyroscope. Complete designing of equivalent circuit model, mathematical modeling and simulation are being presented in this paper. Behaviors of the equivalent lumped models derived for the proposed device design are simulated in MEMSPRO T-SPICE software. Simulations are carried out with the design specifications following design rules of the MetalMUMPS fabrication process. Drive mass resonant frequencies simulated by this technique are 1.59 kHz and 2.05 kHz respectively, which are close to the resonant frequencies found by the analytical formulation of the gyroscope. The lumped equivalent circuit modeling technique proved to be a time efficient modeling technique for the analysis of complex MEMS devices like 3-DoF gyroscopes. The technique proves to be an alternative approach to the complex and time consuming couple field analysis Finite Element Analysis (FEA) previously used.

  4. MEMS Lubrication by In-Situ Tribochemical Reactions From the Vapor Phase.

    SciTech Connect (OSTI)

    Dugger, Michael T.; Asay, David B.; Kim, Seong H.

    2008-01-01

    Vapor Phase Lubrication (VPL) of silicon surfaces with pentanol has been demonstrated. Two potential show stoppers with respect to application of this approach to real MEMS devices have been investigated. Water vapor was found to reduce the effectiveness of VPL with alcohol for a given alcohol concentration, but the basic reaction mechanism observed in water-free environments is still active, and devices operated much longer in mixed alcohol and water vapor environments than with chemisorbed monolayer lubricants alone. Complex MEMS gear trains were successfully lubricated with alcohol vapors, resulting in a factor of 104 improvement in operating life without failure. Complex devices could be made to fail if operated at much higher frequencies than previously used, and there is some evidence that the observed failure is due to accumulation of reaction products at deeply buried interfaces. However, if hypothetical reaction mechanisms involving heated surfaces are valid, then the failures observed at high frequency may not be relevant to operation at normal frequencies. Therefore, this work demonstrates that VPL is a viable approach for complex MEMS devices in conventional packages. Further study of the VPL reaction mechanisms are recommended so that the vapor composition may be optimized for low friction and for different substrate materials with potential application to conventionally fabricated, metal alloy parts in weapons systems. Reaction kinetics should be studied to define effective lubrication regimes as a function of the partial pressure of the vapor phase constituent, interfacial shear rate, substrate composition, and temperature.

  5. SPICE Level 3 and BSIM3v3.1 characterization of monolithic integrated CMOS-MEMS devices

    SciTech Connect (OSTI)

    Staple, B.D.; Watts, H.A.; Dyck, C.; Griego, A.P.; Hewlett, F.W.; Smith, J.H.

    1998-08-01

    The monolithic integration of MicroElectroMechanical Systems (MEMS) with the driving, controlling, and signal processing electronics promises to improve the performance of micromechanical devices as well as lower their manufacturing, packaging, and instrumentation costs. Key to this integration is the proper interleaving, combining, and customizing of the manufacturing processes to produce functional integrated micromechanical devices with electronics. The authors have developed a MEMS-first monolithic integrated process that first seals the micromechanical devices in a planarized trench and then builds the electronics in a conventional CMOS process. To date, most of the research published on this technology has focused on the performance characteristics of the mechanical portion of the devices, with little information on the attributes of the accompanying electronics. This work attempts to reduce this information void by presenting the results of SPICE Level 3 and BSIM3v3.1 model parameters extracted for the CMOS portion of the MEMS-first process. Transistor-level simulations of MOSFET current, capacitance, output resistance, and transconductance versus voltage using the extracted model parameters closely match the measured data. Moreover, in model validation efforts, circuit-level simulation values for the average gate propagation delay in a 101-stage ring oscillator are within 13--18% of the measured data. In general, the BSIM3v3.1 models provide improved accuracy over the SPICE Level 3 models. These results establish the following: (1) the MEMS-first approach produces functional CMOS devices integrated on a single chip with MEMS devices and (2) the devices manufactured in the approach have excellent transistor characteristics. Thus, the MEMS-first approach renders a solid technology foundation for customers designing in the technology.

  6. Integrated optical MEMS using through-wafer vias and bump-bonding.

    SciTech Connect (OSTI)

    McCormick, Frederick Bossert; Frederick, Scott K.

    2008-01-01

    This LDRD began as a three year program to integrate through-wafer vias, micro-mirrors and control electronics with high-voltage capability to yield a 64 by 64 array of individually controllable micro-mirrors on 125 or 250 micron pitch with piston, tip and tilt movement. The effort was a mix of R&D and application. Care was taken to create SUMMiT{trademark} (Sandia's ultraplanar, multilevel MEMS technology) compatible via and mirror processes, and the ultimate goal was to mate this MEMS fabrication product to a complementary metal-oxide semiconductor (CMOS) electronics substrate. Significant progress was made on the via and mirror fabrication and design, the attach process development as well as the electronics high voltage (30 volt) and control designs. After approximately 22 months, the program was ready to proceed with fabrication and integration of the electronics, final mirror array, and through wafer vias to create a high resolution OMEMS array with individual mirror electronic control. At this point, however, mission alignment and budget constraints reduced the last year program funding and redirected the program to help support the through-silicon via work in the Hyper-Temporal Sensors (HTS) Grand Challenge (GC) LDRD. Several months of investigation and discussion with the HTS team resulted in a revised plan for the remaining 10 months of the program. We planned to build a capability in finer-pitched via fabrication on thinned substrates along with metallization schemes and bonding techniques for very large arrays of high density interconnects (up to 2000 x 2000 vias). Through this program, Sandia was able to build capability in several different conductive through wafer via processes using internal and external resources, MEMS mirror design and fabrication, various bonding techniques for arrayed substrates, and arrayed electronics control design with high voltage capability.

  7. Encapsulants for protecting MEMS devices during post-packaging release etch

    DOE Patents [OSTI]

    Peterson, Kenneth A.

    2005-10-18

    The present invention relates to methods to protect a MEMS or microsensor device through one or more release or activation steps in a "package first, release later" manufacturing scheme: This method of fabrication permits wirebonds, other interconnects, packaging materials, lines, bond pads, and other structures on the die to be protected from physical, chemical, or electrical damage during the release etch(es) or other packaging steps. Metallic structures (e.g., gold, aluminum, copper) on the device are also protected from galvanic attack because they are protected from contact with HF or HCL-bearing solutions.

  8. Thin Silicon MEMS Contact-Stress Sensor (Conference) | SciTech Connect

    Office of Scientific and Technical Information (OSTI)

    work offers the first, thin, MEMS contact-stress (CS) sensor capable of accurate in situ measruement of time-varying, contact-stress between two solid interfaces (e.g. in vivo cartilage contact-stress and body armor dynamic loading). This CS sensor is a silicon-based device with a load sensitive diaphragm. The diaphragm is doped to create piezoresistors arranged in a full Wheatstone bridge. The sensor is similar in performance to established silicon pressure sensors, but it is reliably produced

  9. Thin Silicon MEMS Contact-Stress Sensor (Conference) | SciTech Connect

    Office of Scientific and Technical Information (OSTI)

    thin, MEMS contact-stress sensor continuously and accurately measures time-varying, solid interface loads over tens of thousands of load cycles. The contact-stress sensor is extremely thin (150 {mu}m) and has a linear output with an accuracy of {+-} 1.5% FSO. Authors: Kotovksy, J ; Tooker, A ; Horsley, D Publication Date: 2010-05-28 OSTI Identifier: 984646 Report Number(s): LLNL-PROC-433955 TRN: US201016%%1413 DOE Contract Number: W-7405-ENG-48 Resource Type: Conference Resource Relation:

  10. A Small Area In-Situ MEMS Test Structure to Accurately Measure Fracture Strength by Electrostatic Probing

    SciTech Connect (OSTI)

    Bitsie, Fernando; Jensen, Brian D.; de Boer, Maarten

    1999-07-15

    We have designed, fabricated, tested and modeled a first generation small area test structure for MEMS fracture studies by electrostatic rather than mechanical probing. Because of its small area, this device has potential applications as a lot monitor of strength or fatigue of the MEMS structural material. By matching deflection versus applied voltage data to a 3-D model of the test structure, we develop high confidence that the local stresses achieved in the gage section are greater than 1 GPa. Brittle failure of the polycrystalline silicon was observed.

  11. Missile Captive Carry Monitoring using a Capacitive MEMS Accelerometer

    SciTech Connect (OSTI)

    Hatchell, Brian K.; Mauss, Fredrick J.; Santiago-Rojas, Emiliano; Amaya, Ivan A.; Skorpik, James R.; Silvers, Kurt L.; Marotta, Steve

    2010-04-08

    Military missiles are exposed to many sources of mechanical vibration that can affect system reliability, safety, and mission effectiveness. One of the most significant exposures to vibration occurs when the missile is being carried by an aviation platform, which is a condition known as captive carry. If the duration of captive carry exposure could be recorded during the missile’s service life, several advantages could be realized. Missiles that have been exposed to durations outside the design envelop could be flagged or screened for maintenance or inspection; lightly exposed missiles could be selected for critical mission applications; and missile allocation to missions could be based on prior use to avoid overuse. The U. S. Army Aviation and Missile Research Development and Engineering Center (AMRDEC) has been developing health monitoring systems to assess and improve reliability of missiles during storage and field exposures. Under the direction of AMRDEC staff, engineers at the Pacific Northwest National Laboratory have developed a Captive Carry Health Monitor (CCHM) for the HELLFIRE II missile. The CCHM is an embedded usage monitoring device installed on the outer skin of the HELLFIRE II missile to record the cumulative hours the host missile has been in captive carry mode and thereby assess the overall health of the missile. This paper provides an overview of the CCHM electrical and package design, describes field testing and data analysis techniques used to identify captive carry, and discusses the potential application of missile health and usage data for real-time reliability analysis and fleet management.

  12. Method of forming a package for MEMS-based fuel cell

    SciTech Connect (OSTI)

    Morse, Jeffrey D; Jankowski, Alan F

    2013-05-21

    A MEMS-based fuel cell package and method thereof is disclosed. The fuel cell package comprises seven layers: (1) a sub-package fuel reservoir interface layer, (2) an anode manifold support layer, (3) a fuel/anode manifold and resistive heater layer, (4) a Thick Film Microporous Flow Host Structure layer containing a fuel cell, (5) an air manifold layer, (6) a cathode manifold support structure layer, and (7) a cap. Fuel cell packages with more than one fuel cell are formed by positioning stacks of these layers in series and/or parallel. The fuel cell package materials such as a molded plastic or a ceramic green tape material can be patterned, aligned and stacked to form three dimensional microfluidic channels that provide electrical feedthroughs from various layers which are bonded together and mechanically support a MEMS-based miniature fuel cell. The package incorporates resistive heating elements to control the temperature of the fuel cell stack. The package is fired to form a bond between the layers and one or more microporous flow host structures containing fuel cells are inserted within the Thick Film Microporous Flow Host Structure layer of the package.

  13. Design and fabrication of a MEMS chevron-type thermal actuator

    SciTech Connect (OSTI)

    Baracu, Angela; Voicu, Rodica; Müller, Raluca; Avram, Andrei; Pustan, Marius Chiorean, Radu Birleanu, Corina Dudescu, Cristian

    2015-02-17

    This paper presents the design and fabrication of a MEMS chevron-type thermal actuator. The device was designed for fabrication in the standard MEMS technology, where the topography of the upper layers depends on the patterns of structural and sacrificial layers underneath. The proposed actuator presents some advantages over usual thermal vertical chevron actuators by means of low operating voltages, high output force and linear movement without deformation of the shaft. The device simulations were done using COVENTOR software. The movement obtained by simulation was 12 μm, for a voltage of 0.2 V and the current intensity of 257 mA. The design optimizes the in-plane displacement by fixed anchors and beam inclination angle. Heating is provided by Joule dissipation. The material used for manufacture of chevron-based actuator was aluminum due to its thermal and mechanical properties. The release of the movable part was performed using isotropic dry etching by Reactive Ion Etching (RIE). A first inspection was achieved using Scanning Electron Microscope (SEM). In order to obtain the in-plane displacement we carried out electrical measurements. The thermal actuator can be used for a variety of optical and microassembling applications. This kind of thermal actuator could be integrated easily with other micro devices since its fabrication is compatible with the general semiconductor processes.

  14. A Robust MEMS Based Multi-Component Sensor for 3D Borehole Seismic Arrays

    SciTech Connect (OSTI)

    Paulsson Geophysical Services

    2008-03-31

    The objective of this project was to develop, prototype and test a robust multi-component sensor that combines both Fiber Optic and MEMS technology for use in a borehole seismic array. The use such FOMEMS based sensors allows a dramatic increase in the number of sensors that can be deployed simultaneously in a borehole seismic array. Therefore, denser sampling of the seismic wave field can be afforded, which in turn allows us to efficiently and adequately sample P-wave as well as S-wave for high-resolution imaging purposes. Design, packaging and integration of the multi-component sensors and deployment system will target maximum operating temperature of 350-400 F and a maximum pressure of 15000-25000 psi, thus allowing operation under conditions encountered in deep gas reservoirs. This project aimed at using existing pieces of deployment technology as well as MEMS and fiber-optic technology. A sensor design and analysis study has been carried out and a laboratory prototype of an interrogator for a robust borehole seismic array system has been assembled and validated.

  15. Science and technology of piezoelectric/diamond heterostructures for monolithically integrated high performance MEMS/NEMS/CMOS devices.

    SciTech Connect (OSTI)

    Auciello, O.; Sumant, A. V.; Hiller, J.; Kabius, B.; Ma, Z.; Srinivasan, S.

    2008-12-01

    This paper describes the fundamental and applied science performed to integrate piezoelectric PbZr{sub x}Ti{sub 1-x}O{sub 3} and AlN films with a novel mechanically robust ultrananocrystalline diamond layer to enable a new generation of low voltage/high-performance piezoactuated hybrid piezoelectric/diamond MEMS/NEMS devices.

  16. Design of DC-contact RF MEMS switch with temperature stability

    SciTech Connect (OSTI)

    Sun, Junfeng; Li, Zhiqun; Zhu, Jian; Yu, Yuanwei; Jiang, Lili

    2015-04-15

    In order to improve the temperature stability of DC-contact RF MEMS switch, a thermal buckle-beam structure is implemented. The stability of the switch pull-in voltage versus temperature is not only improved, but also the impact of stress and stress gradient on the drive voltage is suppressed. Test results show that the switch pull-in voltage is less sensitive to temperature between -20 °C and 100 °C. The variable rate of pull-in voltage to temperature is about -120 mV/°C. The RF performance of the switch is stable, and the isolation is almost independent of temperature. After being annealed at 280 °C for 12 hours, our switch samples, which are suitable for packaging, have less than 1.5% change in the rate of pull-in voltage.

  17. Fast Simulating High Order Models Application to Micro Electro-Mechanical Systems (MEMS)

    SciTech Connect (OSTI)

    Yacine, Z.; Benfdila, A.; Djennoune, S.

    2009-03-05

    The approximation of high order systems by low order models is one of the important problems in system theory. The use of a reduced order model makes it easier to implement analysis, simulations and control system designs. Numerous methods are available in the literature for order reduction of linear continuous systems in time domain as well as in frequency domain. But, this is not the case for non linear systems. The well known Trajectory Piece-Wise Linear approach (TPWL) elaborated to nonlinear model order reduction guarantees a simplification and an accurate representation of the behaviour of strongly non linear systems handling local and global approximation. The present attempt is towards evolving an improvement for the TPWL order reduction technique, which ensures a good quality of approximation combining the advantages of the Krylov subspaces method and the local linearization. We illustrate the technique on a MEMS circuit (Micro Electro-Mechanical System)

  18. Compliant membranes for the development of MEMS dual-backplate capacitive microphone using the SUMMiT V fabrication process.

    SciTech Connect (OSTI)

    Martin, David (University of Florida, Gainesville, FL)

    2005-11-01

    The objective of this project is the investigation of compliant membranes for the development of a MicroElectrical Mechanical Systems (MEMS) microphone using the Sandia Ultraplanar, Multilevel MEMS Technology (SUMMiT V) fabrication process. The microphone is a dual-backplate capacitive microphone utilizing electrostatic force feedback. The microphone consists of a diaphragm and two porous backplates, one on either side of the diaphragm. This forms a capacitor between the diaphragm and each backplate. As the incident pressure deflects the diaphragm, the value of each capacitor will change, thus resulting in an electrical output. Feedback may be used in this device by applying a voltage between the diaphragm and the backplates to balance the incident pressure keeping the diaphragm stationary. The SUMMiT V fabrication process is unique in that it can meet the fabrication requirements of this project. All five layers of polysilicon are used in the fabrication of this device. The SUMMiT V process has been optimized to provide low-stress mechanical layers that are ideal for the construction of the microphone's diaphragm. The use of chemical mechanical polishing in the SUMMiT V process results in extremely flat structural layers and uniform spacing between the layers, both of which are critical to the successful fabrication of the MEMS microphone. The MEMS capacitive microphone was fabricated at Sandia National Laboratories and post-processed, packaged, and tested at the University of Florida. The microphone demonstrates a flat frequency response, a linear response up to the designed limit, and a sensitivity that is close to the designed value. Future work will focus on characterization of additional devices, extending the frequency response measurements, and investigating the use of other types of interface circuitry.

  19. Measured and predicted temperature profiles along MEMS bridges at pressures from 0.05 to 625 torr.

    SciTech Connect (OSTI)

    Gallis, Michail A.; Torczynski, John Robert; Piekos, Edward Stanley; Serrano, Justin Raymond; Gorby, Allen D.; Phinney, Leslie Mary

    2010-10-01

    We will present experimental and computational investigations of the thermal performance of microelectromechanical systems (MEMS) as a function of the surrounding gas pressure. Lowering the pressure in MEMS packages reduces gas damping, providing increased sensitivity for certain MEMS sensors; however, such packaging also dramatically affects their thermal performance since energy transfer to the environment is substantially reduced. High-spatial-resolution Raman thermometry was used to measure the temperature profiles on electrically heated, polycrystalline silicon bridges that are nominally 10 microns wide, 2.25 microns thick, 12 microns above the substrate, and either 200 or 400 microns long in nitrogen atmospheres with pressures ranging from 0.05 to 625 Torr. Finite element modeling of the thermal behavior of the MEMS bridges is performed and compared to the experimental results. Noncontinuum gas effects are incorporated into the continuum finite element model by imposing temperature discontinuities at gas-solid interfaces that are determined from noncontinuum simulations. The experimental and simulation results indicate that at pressures below 0.5 Torr the gas-phase heat transfer is negligible compared to heat conduction through the thermal actuator legs. As the pressure increases above 0.5 Torr, the gas-phase heat transfer becomes more significant. At ambient pressures, gas-phase heat transfer drastically impacts the thermal performance. The measured and simulated temperature profiles are in qualitative agreement in the present study. Quantitative agreement between experimental and simulated temperature profiles requires accurate knowledge of temperature-dependent thermophysical properties, the device geometry, and the thermal accommodation coefficient.

  20. Two- and three-dimensional ultrananocrystalline diamond (UNCD) structures for a high resolution diamond-based MEMS technology.

    SciTech Connect (OSTI)

    Auciello, O.; Krauss, A. R.; Gruen, D. M.; Busmann, H. G.; Meyer, E. M.; Tucek, J.; Sumant, A.; Jayatissa, A.; Moldovan, N.; Mancini, D. C.; Gardos, M. N.

    2000-01-17

    Silicon is currently the most commonly used material for the fabrication of microelectromechanical systems (MEMS). However, silicon-based MEMS will not be suitable for long-endurance devices involving components rotating at high speed, where friction and wear need to be minimized, components such as 2-D cantilevers that may be subjected to very large flexural displacements, where stiction is a problem, or components that will be exposed to corrosive environments. The mechanical, thermal, chemical, and tribological properties of diamond make it an ideal material for the fabrication of long-endurance MEMS components. Cost-effective fabrication of these components could in principle be achieved by coating Si with diamond films and using conventional lithographic patterning methods in conjunction with e. g. sacrificial Ti or SiO{sub 2} layers. However, diamond coatings grown by conventional chemical vapor deposition (CVD) methods exhibit a coarse-grained structure that prevents high-resolution patterning, or a fine-grained microstructure with a significant amount of intergranular non-diamond carbon. The authors demonstrate here the fabrication of 2-D and 3-D phase-pure ultrananocrystalline diamond (UNCD) MEMS components by coating Si with UNCD films, coupled with lithographic patterning methods involving sacrificial release layers. UNCD films are grown by microwave plasma CVD using C{sub 60}-Ar or CH{sub 4}-Ar gas mixtures, which result in films that have 3--5 nm grain size, are 10--20 times smoother than conventionally grown diamond films, are extremely resistant to corrosive environments, and are predicted to have a brittle fracture strength similar to that of single crystal diamond.

  1. Light Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    a Light Source Data and Analysis Framework at NERSC Jack Deslippe, Shane Canon, Eli Dart, Abdelilah Essiari, Alexander Hexemer, Dula Parkinson, Simon Patton, Craig Tull + Many More The ALS Data Needs September 21, 2010 - NIST (MD) Light source data volumes are growing many times faster than Moore's law. ● Light source luminosity ● Detector resolution & rep-rates ● Sample automation BES user facilities serve 10,000 scientists and engineers every year. Mostly composed of many small

  2. Ion source

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Ehlers, Kenneth W.

    1984-01-01

    A magnetic filter for an ion source reduces the production of undesired ion species and improves the ion beam quality. High-energy ionizing electrons are confined by the magnetic filter to an ion source region, where the high-energy electrons ionize gas molecules. One embodiment of the magnetic filter uses permanent magnets oriented to establish a magnetic field transverse to the direction of travel of ions from the ion source region to the ion extraction region. In another embodiment, low energy 16 eV electrons are injected into the ion source to dissociate gas molecules and undesired ion species into desired ion species.

  3. A microsystems enabled field desorption source.

    SciTech Connect (OSTI)

    Hertz, Kristin L.; Resnick, Paul James; Schwoebel, Paul R. (University of New Mexico, Albuquerque, NM); Holland, Christopher E. (SRI International, Menlo Park, CA); Chichester, David L. (Idaho National Laboratory, Idaho Falls, ID)

    2010-07-01

    Technologies that have been developed for microelectromechanical systems (MEMS) have been applied to the fabrication of field desorption arrays. These techniques include the use of thick films for enhanced dielectric stand-off, as well as an integrated gate electrode. The increased complexity of MEMS fabrication provides enhanced design flexibility over traditional methods.

  4. ION SOURCE

    DOE Patents [OSTI]

    Martina, E.F.

    1958-04-22

    An improved ion source particularly adapted to provide an intense beam of ions with minimum neutral molecule egress from the source is described. The ion source structure includes means for establishing an oscillating electron discharge, including an apertured cathode at one end of the discharge. The egress of ions from the source is in a pencil like beam. This desirable form of withdrawal of the ions from the plasma created by the discharge is achieved by shaping the field at the aperture of the cathode. A tubular insulator is extended into the plasma from the aperture and in cooperation with the electric fields at the cathode end of the discharge focuses the ions from the source,

  5. Method of forming a package for mems-based fuel cell

    DOE Patents [OSTI]

    Morse, Jeffrey D.; Jankowski, Alan F.

    2004-11-23

    A MEMS-based fuel cell package and method thereof is disclosed. The fuel cell package comprises seven layers: (1) a sub-package fuel reservoir interface layer, (2) an anode manifold support layer, (3) a fuel/anode manifold and resistive heater layer, (4) a Thick Film Microporous Flow Host Structure layer containing a fuel cell, (5) an air manifold layer, (6) a cathode manifold support structure layer, and (7) a cap. Fuel cell packages with more than one fuel cell are formed by positioning stacks of these layers in series and/or parallel. The fuel cell package materials such as a molded plastic or a ceramic green tape material can be patterned, aligned and stacked to form three dimensional microfluidic channels that provide electrical feedthroughs from various layers which are bonded together and mechanically support a MEMOS-based miniature fuel cell. The package incorporates resistive heating elements to control the temperature of the fuel cell stack. The package is fired to form a bond between the layers and one or more microporous flow host structures containing fuel cells are inserted within the Thick Film Microporous Flow Host Structure layer of the package.

  6. Development of a MEMS dual-axis differential capacitance floating element shear stress sensor

    SciTech Connect (OSTI)

    Barnard, Casey; Griffin, Benjamin

    2015-09-01

    A single-axis MEMS wall shear stress sensor with differential capacitive transduction method is produced. Using a synchronous modulation and demodulation interface circuit, the system is capable of making real time measurements of both mean and fluctuating wall shear stress. A sensitivity of 3.44 mV/Pa is achieved, with linearity in response demonstrated up to testing limit of 2 Pa. Minimum detectable signals of 340 μPa at 100 Hz and 120 μPa at 1 kHz are indicated, with a resonance of 3.5 kHz. Multiple full scale wind tunnel tests are performed, producing spectral measurements of turbulent boundary layers in wind speeds ranging up to 0.5 Ma (18 Pa of mean wall shear stress). The compact packaging allows for minimally invasive installation, and has proven relatively robust over multiple testing events. Temperature sensitivity, likely due to poor CTE matching of packaged materials, is an ongoing concern being addressed. These successes are being directly leveraged into a development plan for a dual-axis wall shear stress sensor, capable of producing true vector estimates at the wall.

  7. NEUTRON SOURCES

    DOE Patents [OSTI]

    Richmond, J.L.; Wells, C.E.

    1963-01-15

    A neutron source is obtained without employing any separate beryllia receptacle, as was formerly required. The new method is safer and faster, and affords a source with both improved yield and symmetry of neutron emission. A Be container is used to hold and react with Pu. This container has a thin isolating layer that does not obstruct the desired Pu--Be reaction and obviates procedures previously employed to disassemble and remove a beryllia receptacle. (AEC)

  8. Neutron source

    DOE Patents [OSTI]

    Cason, J.L. Jr.; Shaw, C.B.

    1975-10-21

    A neutron source which is particularly useful for neutron radiography consists of a vessel containing a moderating media of relatively low moderating ratio, a flux trap including a moderating media of relatively high moderating ratio at the center of the vessel, a shell of depleted uranium dioxide surrounding the moderating media of relatively high moderating ratio, a plurality of guide tubes each containing a movable source of neutrons surrounding the flux trap, a neutron shield surrounding one part of each guide tube, and at least one collimator extending from the flux trap to the exterior of the neutron source. The shell of depleted uranium dioxide has a window provided with depleted uranium dioxide shutters for each collimator. Reflectors are provided above and below the flux trap and on the guide tubes away from the flux trap.

  9. ION SOURCE

    DOE Patents [OSTI]

    Leland, W.T.

    1960-01-01

    The ion source described essentially eliminater the problem of deposits of nonconducting materials forming on parts of the ion source by certain corrosive gases. This problem is met by removing both filament and trap from the ion chamber, spacing them apart and outside the chamber end walls, placing a focusing cylinder about the filament tip to form a thin collimated electron stream, aligning the cylinder, slits in the walls, and trap so that the electron stream does not bombard any part in the source, and heating the trap, which is bombarded by electrons, to a temperature hotter than that in the ion chamber, so that the tendency to build up a deposit caused by electron bombardment is offset by the extra heating supplied only to the trap.

  10. NEUTRON SOURCE

    DOE Patents [OSTI]

    Reardon, W.A.; Lennox, D.H.; Nobles, R.G.

    1959-01-13

    A neutron source of the antimony--beryllium type is presented. The source is comprised of a solid mass of beryllium having a cylindrical recess extending therein and a cylinder containing antimony-124 slidably disposed within the cylindrical recess. The antimony cylinder is encased in aluminum. A berylliunn plug is removably inserted in the open end of the cylindrical recess to completely enclose the antimony cylinder in bsryllium. The plug and antimony cylinder are each provided with a stud on their upper ends to facilitate handling remotely.

  11. Characterization of microscale wear in a ploysilicon-based MEMS device using AFM and PEEM-NEXAFS spectromicroscopy.

    SciTech Connect (OSTI)

    Grierson, D. S.; Konicek, A. R.; Wabiszewski, G. E.; Sumant, A. V.; de Boer, M. P.; Corwin, A. D.; Carpick, R. W. (Center for Nanoscale Materials); ( PSC-USR); (Univ. of Wisconsin at Madison); (Univ. of Pennsylvania); (SNL)

    2009-12-01

    Mechanisms of microscale wear in silicon-based microelectromechanical systems (MEMS) are elucidated by studying a polysilicon nanotractor, a device specifically designed to conduct friction and wear tests under controlled conditions. Photoelectron emission microscopy (PEEM) was combined with near-edge X-ray absorption fine structure (NEXAFS) spectroscopy and atomic force microscopy (AFM) to quantitatively probe chemical changes and structural modification, respectively, in the wear track of the nanotractor. The ability of PEEM-NEXAFS to spatially map chemical variations in the near-surface region of samples at high lateral spatial resolution is unparalleled and therefore ideally suited for this study. The results show that it is possible to detect microscopic chemical changes using PEEM-NEXAFS, specifically, oxidation at the sliding interface of a MEMS device. We observe that wear induces oxidation of the polysilicon at the immediate contact interface, and the spectra are consistent with those from amorphous SiO{sub 2}. The oxidation is correlated with gouging and debris build-up in the wear track, as measured by AFM and scanning electron microscopy (SEM).

  12. ION SOURCE

    DOE Patents [OSTI]

    Brobeck, W.M.

    1959-04-14

    This patent deals with calutrons and more particularly to an arrangement therein whereby charged bottles in a calutron source unit may be replaced without admitting atmospheric air to the calutron vacuum chamber. As described, an ion unit is disposed within a vacuum tank and has a reservoir open toward a wall of the tank. A spike projects from thc source into the reservoir. When a charge bottle is placed in the reservoir, the spike breaks a frangible seal on the bottle. After the contents of the bottle are expended the bottle may be withdrawn and replaced with another charge bottle by a varuum lock arrangement in conjunction with an arm for manipulating the bottle.

  13. ION SOURCE

    DOE Patents [OSTI]

    Bell, W.A. Jr.; Love, L.O.; Prater, W.K.

    1958-01-28

    An ion source is presented capable of producing ions of elements which vaporize only at exceedingly high temperatures, i.e.,--1500 degrees to 3000 deg C. The ion source utilizes beams of electrons focused into a first chamber housing the material to be ionized to heat the material and thereby cause it to vaporize. An adjacent second chamber receives the vaporized material through an interconnecting passage, and ionization of the vaporized material occurs in this chamber. The ionization action is produced by an arc discharge sustained between a second clectron emitting filament and the walls of the chamber which are at different potentials. The resultant ionized material egresses from a passageway in the second chamber. Using this device, materials which in the past could not be processed in mass spectometers may be satisfactorily ionized for such applications.

  14. Atomistic modeling of nanowires, small-scale fatigue damage in cast magnesium, and materials for MEMS.

    SciTech Connect (OSTI)

    Dunn, Martin L.; Talmage, Mellisa J.; McDowell, David L., 1956- (,-Georgia Institute of Technology, Atlanta, GA); West, Neil (University of Colorado, Boulder, CO); Gullett, Philip Michael (Mississippi State University , MS); Miller, David C. (University of Colorado, Boulder, CO); Spark, Kevin (University of Colorado, Boulder, CO); Diao, Jiankuai (University of Colorado, Boulder, CO); Horstemeyer, Mark F. (Mississippi State University , MS); Zimmerman, Jonathan A.; Gall, K

    2006-10-01

    titled 'Atomistic Modeling of Nanowires, Small-scale Fatigue Damage in Cast Magnesium, and Materials for MEMS'. This project supported a strategic partnership between Sandia National Laboratories and the University of Colorado at Boulder by providing funding for the lead author, Ken Gall, and his students, while he was a member of the University of Colorado faculty.

  15. Radiation source

    DOE Patents [OSTI]

    Thode, Lester E.

    1981-01-01

    A device and method for relativistic electron beam heating of a high-density plasma in a small localized region. A relativistic electron beam generator or accelerator produces a high-voltage electron beam which propagates along a vacuum drift tube and is modulated to initiate electron bunching within the beam. The beam is then directed through a low-density gas chamber which provides isolation between the vacuum modulator and the relativistic electron beam target. The relativistic beam is then applied to a high-density target plasma which typically comprises DT, DD, or similar thermonuclear gas at a density of 10.sup.17 to 10.sup.20 electrons per cubic centimeter. The target gas is ionized prior to application of the relativistic electron beam by means of a laser or other preionization source to form a plasma. Utilizing a relativistic electron beam with an individual particle energy exceeding 3 MeV, classical scattering by relativistic electrons passing through isolation foils is negligible. As a result, relativistic streaming instabilities are initiated within the high-density target plasma causing the relativistic electron beam to efficiently deposit its energy into a small localized region of the high-density plasma target.

  16. Contaminant Sources are Known

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Sources are Known Historical contaminant sources from liquid discharges and solid waste management units are known. August 1, 2013 Contaminant source map LANL contaminant...

  17. Acceleration of dormant storage effects to address the reliability of silicon surface micromachined Micro-Electro-Mechanical Systems (MEMS).

    SciTech Connect (OSTI)

    Cox, James V.; Candelaria, Sam A.; Dugger, Michael Thomas; Duesterhaus, Michelle Ann; Tanner, Danelle Mary; Timpe, Shannon J.; Ohlhausen, James Anthony; Skousen, Troy J.; Jenkins, Mark W.; Jokiel, Bernhard, Jr.; Walraven, Jeremy Allen; Parson, Ted Blair

    2006-06-01

    Qualification of microsystems for weapon applications is critically dependent on our ability to build confidence in their performance, by predicting the evolution of their behavior over time in the stockpile. The objective of this work was to accelerate aging mechanisms operative in surface micromachined silicon microelectromechanical systems (MEMS) with contacting surfaces that are stored for many years prior to use, to determine the effects of aging on reliability, and relate those effects to changes in the behavior of interfaces. Hence the main focus was on 'dormant' storage effects on the reliability of devices having mechanical contacts, the first time they must move. A large number ({approx}1000) of modules containing prototype devices and diagnostic structures were packaged using the best available processes for simple electromechanical devices. The packaging processes evolved during the project to better protect surfaces from exposure to contaminants and water vapor. Packages were subjected to accelerated aging and stress tests to explore dormancy and operational environment effects on reliability and performance. Functional tests and quantitative measurements of adhesion and friction demonstrated that the main failure mechanism during dormant storage is change in adhesion and friction, precipitated by loss of the fluorinated monolayer applied after fabrication. The data indicate that damage to the monolayer can occur at water vapor concentrations as low as 500 ppm inside the package. The most common type of failure was attributed to surfaces that were in direct contact during aging. The application of quantitative methods for monolayer lubricant analysis showed that even though the coverage of vapor-deposited monolayers is generally very uniform, even on hidden surfaces, locations of intimate contact can be significantly depleted in initial concentration of lubricating molecules. These areas represent defects in the film prone to adsorption of water or

  18. Venezuela-MEM/USA-DOE Fossil Energy Report IV-11: Supporting technology for enhanced oil recovery - EOR thermal processes

    SciTech Connect (OSTI)

    Venezuela

    2000-04-06

    This report contains the results of efforts under the six tasks of the Tenth Amendment anti Extension of Annex IV, Enhanced Oil Recovery Thermal Processes of the Venezuela/USA Energy Agreement. This report is presented in sections (for each of the six Tasks) and each section contains one or more reports that were prepared to describe the results of the effort under each of the Tasks. A statement of each Task, taken from the Agreement Between Project Managers, is presented on the first page of each section. The Tasks are numbered 68 through 73. The first through tenth report on research performed under Annex IV Venezuela MEM/USA-DOE Fossil Energy Report Number IV-1, IV-2, IV-3, IV-4, IV-5, IV-6, IV-7, IV-8, IV-9, IV-10 contain the results of the first 67 Tasks. These reports are dated April 1983, August 1984, March 1986, July 1987, November 1988, December 1989, October 1991, February 1993, March 1995, and December 1997, respectively.

  19. Innovative high pressure gas MEM's based neutron detector for ICF and active SNM detection.

    SciTech Connect (OSTI)

    Martin, Shawn Bryan; Derzon, Mark Steven; Renzi, Ronald F.; Chandler, Gordon Andrew

    2007-12-01

    An innovative helium3 high pressure gas detection system, made possible by utilizing Sandia's expertise in Micro-electrical Mechanical fluidic systems, is proposed which appears to have many beneficial performance characteristics with regards to making these neutron measurements in the high bremsstrahlung and electrical noise environments found in High Energy Density Physics experiments and especially on the very high noise environment generated on the fast pulsed power experiments performed here at Sandia. This same system may dramatically improve active WMD and contraband detection as well when employed with ultrafast (10-50 ns) pulsed neutron sources.

  20. Contaminant Sources are Known

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Contaminant Sources are Known Contaminant Sources are Known Historical contaminant sources from liquid discharges and solid waste management units are known. August 1, 2013 Contaminant source map LANL contaminant source map RELATED IMAGES http://farm4.staticflickr.com/3789/9631743884_4caeb970f9_t.jpg Enlarge

  1. Light-Source Facilities

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Safety Light Source Facilities America ALS - Advanced Light Source, USA APS - Advanced Photon Source, USA CAMD - Center for Advanced Microstructures & Devices, USA CHESS - Cornell High Energy Synchrotron Source, USA CLS - Canadian Light Source, Canada CTST - UCSB Center for Terahertz Science and Technology, USA DFELL - Duke Free Electron Laser Laboratory, USA Jlab - Jefferson Lab, USA LCLS - Linear Coherent Light Source, USA LNLS - Laboratorio Nacional de Luz Sincrotron, Brazil NSLS -

  2. Review of pyroelectric thermal energy harvesting and new MEMs based resonant energy conversion techniques

    SciTech Connect (OSTI)

    Hunter, Scott Robert; Lavrik, Nickolay V; Mostafa, Salwa; Rajic, Slobodan; Datskos, Panos G

    2012-01-01

    Harvesting electrical energy from thermal energy sources using pyroelectric conversion techniques has been under investigation for over 50 years, but it has not received the attention that thermoelectric energy harvesting techniques have during this time period. This lack of interest stems from early studies which found that the energy conversion efficiencies achievable using pyroelectric materials were several times less than those potentially achievable with thermoelectrics. More recent modeling and experimental studies have shown that pyroelectric techniques can be cost competitive with thermoelectrics and, using new temperature cycling techniques, has the potential to be several times as efficient as thermoelectrics under comparable operating conditions. This paper will review the recent history in this field and describe the techniques that are being developed to increase the opportunities for pyroelectric energy harvesting. The development of a new thermal energy harvester concept, based on temperature cycled pyroelectric thermal-to-electrical energy conversion, are also outlined. The approach uses a resonantly driven, pyroelectric capacitive bimorph cantilever structure that can be used to rapidly cycle the temperature in the energy harvester. The device has been modeled using a finite element multi-physics based method, where the effect of the structure material properties and system parameters on the frequency and magnitude of temperature cycling, and the efficiency of energy recycling using the proposed structure, have been modeled. Results show that thermal contact conductance and heat source temperature differences play key roles in dominating the cantilever resonant frequency and efficiency of the energy conversion technique. This paper outlines the modeling, fabrication and testing of cantilever and pyroelectric structures and single element devices that demonstrate the potential of this technology for the development of high efficiency thermal

  3. Electrolytes for power sources

    DOE Patents [OSTI]

    Doddapaneni, Narayan; Ingersoll, David

    1995-01-01

    Electrolytes for power sources, particularly alkaline and acidic power sources, comprising benzene polysulfonic acids and benzene polyphosphonic acids or salts of such acids.

  4. Electrolytes for power sources

    DOE Patents [OSTI]

    Doddapaneni, N.; Ingersoll, D.

    1995-01-03

    Electrolytes are disclosed for power sources, particularly alkaline and acidic power sources, comprising benzene polysulfonic acids and benzene polyphosphonic acids or salts of such acids. 7 figures.

  5. Source Selection Guide

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    source selection in accordance with Part 15 of the Federal Acquisition Regulation (FAR). ... CERTIFICATIONS Although there is no regulation requiring each Source Evaluation Board ...

  6. Redox buffered hydrofluoric acid etchant for the reduction of galvanic attack during release etching of MEMS devices having noble material films

    SciTech Connect (OSTI)

    Hankins, Matthew G.

    2009-10-06

    Etchant solutions comprising a redox buffer can be used during the release etch step to reduce damage to the structural layers of a MEMS device that has noble material films. A preferred redox buffer comprises a soluble thiophosphoric acid, ester, or salt that maintains the electrochemical potential of the etchant solution at a level that prevents oxidation of the structural material. Therefore, the redox buffer preferentially oxidizes in place of the structural material. The sacrificial redox buffer thereby protects the exposed structural layers while permitting the dissolution of sacrificial oxide layers during the release etch.

  7. Multilevel cascade voltage source inverter with seperate DC sources...

    Office of Scientific and Technical Information (OSTI)

    Multilevel cascade voltage source inverter with seperate DC sources Citation Details In-Document Search Title: Multilevel cascade voltage source inverter with seperate DC sources ...

  8. Multilevel cascade voltage source inverter with seperate DC sources...

    Office of Scientific and Technical Information (OSTI)

    Multilevel cascade voltage source inverter with seperate DC sources Citation Details In-Document Search Title: Multilevel cascade voltage source inverter with seperate DC sources A ...

  9. SummitView 1.0: a code to automatically generate 3D solid models of surface micro-machining based MEMS designs.

    SciTech Connect (OSTI)

    McBride, Cory L. (Elemental Technologies, American Fort, UT); Yarberry, Victor R.; Schmidt, Rodney Cannon; Meyers, Ray J.

    2006-11-01

    This report describes the SummitView 1.0 computer code developed at Sandia National Laboratories. SummitView is designed to generate a 3D solid model, amenable to visualization and meshing, that represents the end state of a microsystem fabrication process such as the SUMMiT (Sandia Ultra-Planar Multilevel MEMS Technology) V process. Functionally, SummitView performs essentially the same computational task as an earlier code called the 3D Geometry modeler [1]. However, because SummitView is based on 2D instead of 3D data structures and operations, it has significant speed and robustness advantages. As input it requires a definition of both the process itself and the collection of individual 2D masks created by the designer and associated with each of the process steps. The definition of the process is contained in a special process definition file [2] and the 2D masks are contained in MEM format files [3]. The code is written in C++ and consists of a set of classes and routines. The classes represent the geometric data and the SUMMiT V process steps. Classes are provided for the following process steps: Planar Deposition, Planar Etch, Conformal Deposition, Dry Etch, Wet Etch and Release Etch. SummitView is built upon the 2D Boolean library GBL-2D [4], and thus contains all of that library's functionality.

  10. SOURCE SELECTION INFORMATION -

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    SOURCE SELECTION INFORMATION - SEE FEDERAL ACQUISITION REGULATION (FAR) 2.101 AND 3.104 ... SOURCE SELECTION INFORMATION - SEE FEDERAL ACQUISITION REGULATION (FAR) 2.101 AND 3.104 ...

  11. Sources_Sought_Notices

    Office of Environmental Management (EM)

    Sources for Office Supplies Sources for Office Supplies Consistent with the Office of Management and Budget's savings mandates and the Acting Director of the Office of Procurement and Assistance Management's memorandum entitled "Sources for Office Supplies," dated September 9, 2011, the Department of Energy (DOE) supports utilization of: (1) the General Service Administration's (GSA) Blanket Purchase Agreements (BPA) under the Federal Strategic Sourcing Initiative for Office Supplies

  12. DC source assemblies

    DOE Patents [OSTI]

    Campbell, Jeremy B; Newson, Steve

    2013-02-26

    Embodiments of DC source assemblies of power inverter systems of the type suitable for deployment in a vehicle having an electrically grounded chassis are provided. An embodiment of a DC source assembly comprises a housing, a DC source disposed within the housing, a first terminal, and a second terminal. The DC source also comprises a first capacitor having a first electrode electrically coupled to the housing, and a second electrode electrically coupled to the first terminal. The DC source assembly further comprises a second capacitor having a first electrode electrically coupled to the housing, and a second electrode electrically coupled to the second terminal.

  13. Microwave ion source

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Reijonen, Jani; Thomae, Rainer W.

    2005-07-26

    A compact microwave ion source has a permanent magnet dipole field, a microwave launcher, and an extractor parallel to the source axis. The dipole field is in the form of a ring. The microwaves are launched from the middle of the dipole ring using a coaxial waveguide. Electrons are heated using ECR in the magnetic field. The ions are extracted from the side of the source from the middle of the dipole perpendicular to the source axis. The plasma density can be increased by boosting the microwave ion source by the addition of an RF antenna. Higher charge states can be achieved by increasing the microwave frequency. A xenon source with a magnetic pinch can be used to produce intense EUV radiation.

  14. Open Source Software

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Open Source Software Open Source Software All open source software available through the Laboratory is listed below. Contact thumbnail of Kathleen McDonald Head of Intellectual Property, Business Development Executive Kathleen McDonald Richard P. Feynman Center for Innovation (505) 667-5844 Email For more information regarding how to access software from Los Alamos, contact the Software Team. brulilo, Version 0.x brulilo is a Python package for building and evolving thermonuclear reaction

  15. Dynamic radioactive particle source

    DOE Patents [OSTI]

    Moore, Murray E.; Gauss, Adam Benjamin; Justus, Alan Lawrence

    2012-06-26

    A method and apparatus for providing a timed, synchronized dynamic alpha or beta particle source for testing the response of continuous air monitors (CAMs) for airborne alpha or beta emitters is provided. The method includes providing a radioactive source; placing the radioactive source inside the detection volume of a CAM; and introducing an alpha or beta-emitting isotope while the CAM is in a normal functioning mode.

  16. Overview | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    APS Overview: Introduction APS Systems Map LINAC Booster Synchrotron Storage Ring Insertion Devices Experiment Hall LOMs & Beamlines Overview of the APS The Advanced Photon Source...

  17. SOURCE SELECTION INFORMATION -

    Broader source: Energy.gov (indexed) [DOE]

    SOURCE SELECTION INFORMATION - SEE FEDERAL ACQUISITION REGULATION (FAR) 2.101 AND 3.104 Department of Energy Washington, DC 20585 (enter date here, centered revised template...

  18. Improved ion source

    DOE Patents [OSTI]

    Leung, K.N.; Ehlers, K.W.

    1982-05-04

    A magnetic filter for an ion source reduces the production of undesired ion species and improves the ion beam quality. High-energy ionizing electrons are confined by the magnetic filter to an ion source region, where the high-energy electrons ionize gas molecules. One embodiment of the magnetic filter uses permanent magnets oriented to establish a magnetic field transverse to the direction of travel of ions from the ion source region to the ion extraction region. In another embodiment, low energy 16 eV electrons are injected into the ion source to dissociate gas molecules and undesired ion species into desired ion species,

  19. Recycling, Source Reduction,

    U.S. Energy Information Administration (EIA) Indexed Site

    ... Recovery and Electricity Generation" "(d)","Relative to National Average Landfill" "GREENHOUSE GAS EFFECTS OF RECYCLING, SOURCE REDUCING, AND COMPOSTING VARIOUS WASTE MATERIALS ...

  20. Beamlines | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Beamlines Beamlines Home Beamlines Directory Research Techniques Sectors Directory Status and Schedule Safety and Training Beamlines The Advanced Photon Source consists of 34...

  1. Radiation Source Replacement Workshop

    SciTech Connect (OSTI)

    Griffin, Jeffrey W.; Moran, Traci L.; Bond, Leonard J.

    2010-12-01

    This report summarizes a Radiation Source Replacement Workshop in Houston Texas on October 27-28, 2010, which provided a forum for industry and researchers to exchange information and to discuss the issues relating to replacement of AmBe, and potentially other isotope sources used in well logging.

  2. PORTABLE SOURCE OF RADIOACTIVITY

    DOE Patents [OSTI]

    Goertz, R.C.; Ferguson, K.R.; Rylander, E.W.; Safranski, L.M.

    1959-06-16

    A portable source for radiogiaphy or radiotherapy is described. It consists of a Tl/sup 170/ or Co/sup 60/ source mounted in a rotatable tungsten alloy plug. The plug rotates within a brass body to positions of safety or exposure. Provision is made for reloading and carrying the device safely. (T.R.H.)

  3. Radioisotopic heat source

    DOE Patents [OSTI]

    Jones, G.J.; Selle, J.E.; Teaney, P.E.

    1975-09-30

    Disclosed is a radioisotopic heat source and method for a long life electrical generator. The source includes plutonium dioxide shards and yttrium or hafnium in a container of tantalum-tungsten-hafnium alloy, all being in a nickel alloy outer container, and subjected to heat treatment of from about 1570$sup 0$F to about 1720$sup 0$F for about one h. (auth)

  4. National Library of Energy : Main View : Search Results for Keyword...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Search: Keyword: microelectromechanical OR mems OR mem Did you mean ? Create new alert from this search New Search My Selections (0) Alerts Source Status Activity Indicator 0 top...

  5. Piezotube borehole seismic source

    DOE Patents [OSTI]

    Daley, Tom M; Solbau, Ray D; Majer, Ernest L

    2014-05-06

    A piezoelectric borehole source capable of permanent or semipermanent insertion into a well for uninterrupted well operations is described. The source itself comprises a series of piezoelectric rings mounted to an insulative mandrel internally sized to fit over a section of well tubing, the rings encased in a protective housing and electrically connected to a power source. Providing an AC voltage to the rings will cause expansion and contraction sufficient to create a sonic pulse. The piezoelectric borehole source fits into a standard well, and allows for uninterrupted pass-through of production tubing, and other tubing and electrical cables. Testing using the source may be done at any time, even concurrent with well operations, during standard production.

  6. Photonic crystal light source

    DOE Patents [OSTI]

    Fleming, James G.; Lin, Shawn-Yu; Bur, James A.

    2004-07-27

    A light source is provided by a photonic crystal having an enhanced photonic density-of-states over a band of frequencies and wherein at least one of the dielectric materials of the photonic crystal has a complex dielectric constant, thereby producing enhanced light emission at the band of frequencies when the photonic crystal is heated. The dielectric material can be a metal, such as tungsten. The spectral properties of the light source can be easily tuned by modification of the photonic crystal structure and materials. The photonic crystal light source can be heated electrically or other heating means. The light source can further include additional photonic crystals that exhibit enhanced light emission at a different band of frequencies to provide for color mixing. The photonic crystal light source may have applications in optical telecommunications, information displays, energy conversion, sensors, and other optical applications.

  7. Pulsed ion beam source

    DOE Patents [OSTI]

    Greenly, John B.

    1996-01-01

    An improved magnetically-confined anode plasma pulsed ion beam source. Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure and the slow field structure near the anode of the ion beam source, by a gas port design which localizes the gas delivery into the gap between the fast coil and the anode, by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means which optimally adjusts the plasma formation position in the ion beam source.

  8. Microfabricated diffusion source

    DOE Patents [OSTI]

    Oborny, Michael C.; Frye-Mason, Gregory C.; Manginell, Ronald P.

    2008-07-15

    A microfabricated diffusion source to provide for a controlled diffusion rate of a vapor comprises a porous reservoir formed in a substrate that can be filled with a liquid, a headspace cavity for evaporation of the vapor therein, a diffusion channel to provide a controlled diffusion of the vapor, and an outlet to release the vapor into a gas stream. The microfabricated diffusion source can provide a calibration standard for a microanalytical system. The microanalytical system with an integral diffusion source can be fabricated with microelectromechanical systems technologies.

  9. CALUTRON ION SOURCE

    DOE Patents [OSTI]

    Lofgren, E.J.

    1959-02-17

    An improvement is described in ion source mechanisms whereby the source structure is better adapted to withstanid the ravages of heat, erosion, and deterioration concomitant with operation of an ion source of the calutron type. A pair of molybdenum plates define the exit opening of the arc chamber and are in thermal contact with the walls of the chamber. These plates are maintained at a reduced temperature by a pair of copper blocks in thermal conducting contact therewith to form subsequent diverging margins for the exit opening.

  10. CALUTRON ION SOURCE

    DOE Patents [OSTI]

    Brobeck, W.M.

    1959-02-24

    An ion source is described wherein a portion of the filament serving as a cathode for the arc is protected from the effects of non-ionized particles escaping from the ionizing mechanism. In the described ion source, the source block has a gas chamber and a gas passage extending from said gas chamber to two adjacent faces of the source block. A plate overlies the passage and abuts one of the aforementioned block faces, while extending beyond the other face. In addition, the plate is apertured in line with the block passage. The filament overlies the aperture to effectively shield the portion of the filament not directiy aligned with the passage where the arc is produced.

  11. SOURCE SELECTION INFORMATION -

    Broader source: Energy.gov (indexed) [DOE]

    an action described in Section 311 of P.L. 112-74 in excess of 1,000,000. This information is source selection information related to the conduct of a Federal agency...

  12. National Synchrotron Light Source

    ScienceCinema (OSTI)

    None

    2010-01-08

    A tour of Brookhaven's National Synchrotron Light Source (NSLS). The NSLS is one of the world's most widely used scientific research facilities, hosting more than 2,500 guest researchers each year. The NSLS provides intense beams of infrared, ultraviole

  13. Field emission electron source

    DOE Patents [OSTI]

    Zettl, Alexander Karlwalter; Cohen, Marvin Lou

    2000-01-01

    A novel field emitter material, field emission electron source, and commercially feasible fabrication method is described. The inventive field emission electron source produces reliable electron currents of up to 400 mA/cm.sup.2 at 200 volts. The emitter is robust and the current it produces is not sensitive to variability of vacuum or the distance between the emitter tip and the cathode. The novel emitter has a sharp turn-on near 100 volts.

  14. Photon Source Parameters

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Photon Source Parameters Print Summary Graph of Brightness Curves for All Insertion Devices Insertion Device and Bend Magnet Parameters Bend Magnet Superbend Magnet U30 Undulator U50 Undulator U80 Undulator U100 Undulator W114 Wiggler The ALS has six elliptically polarizing undulators, two in straight 4, two in straight 11, and one each in straights 6 and 7. All are arranged with chicanes so that two such devices can be installed to feed two independent beamlines. They

  15. Magnetron sputtering source

    DOE Patents [OSTI]

    Makowiecki, D.M.; McKernan, M.A.; Grabner, R.F.; Ramsey, P.B.

    1994-08-02

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal. 12 figs.

  16. Magnetron sputtering source

    DOE Patents [OSTI]

    Makowiecki, Daniel M. (Livermore, WA); McKernan, Mark A. (Livermore, CA); Grabner, R. Fred (Brentwood, CA); Ramsey, Philip B. (Livermore, CA)

    1994-01-01

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal.

  17. Source Selection Guide

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Chapter 15.1 1 Source Selection Overview This chapter provides guidance to the acquisition team on conducting source selection in accordance with Part 15 of the Federal Acquisition Regulation (FAR). Background The mid 1990's was a time of significant change in many areas of procurement, particularly in the introduction of new tools and processes that help the procurement professional better meet the needs of demanding customers. The passage of the Federal Acquisition Streamlining Act in 1994

  18. National Synchrotron Light Source

    ScienceCinema (OSTI)

    BNL

    2009-09-01

    A tour of Brookhaven's National Synchrotron Light Source (NSLS), hosted by Associate Laboratory Director for Light Sources, Stephen Dierker. The NSLS is one of the world's most widely used scientific research facilities, hosting more than 2,500 guest researchers each year. The NSLS provides intense beams of infrared, ultraviolet, and x-ray light for basic and applied research in physics, chemistry, medicine, geophysics, environmental, and materials sciences.

  19. HIGH VOLTAGE ION SOURCE

    DOE Patents [OSTI]

    Luce, J.S.

    1960-04-19

    A device is described for providing a source of molecular ions having a large output current and with an accelerated energy of the order of 600 kv. Ions are produced in an ion source which is provided with a water-cooled source grid of metal to effect maximum recombination of atomic ions to molecular ions. A very high accelerating voltage is applied to withdraw and accelerate the molecular ions from the source, and means are provided for dumping the excess electrons at the lowest possible potentials. An accelerating grid is placed adjacent to the source grid and a slotted, grounded accelerating electrode is placed adjacent to the accelerating grid. A potential of about 35 kv is maintained between the source grid and accelerating grid, and a potential of about 600 kv is maintained between the accelerating grid and accelerating electrode. In order to keep at a minimum the large number of oscillating electrons which are created when such high voltages are employed in the vicinity of a strong magnetic field, a plurality of high voltage cascaded shields are employed with a conventional electron dumping system being employed between each shield so as to dump the electrons at the lowest possible potential rather than at 600 kv.

  20. Pulsed ion beam source

    DOE Patents [OSTI]

    Greenly, J.B.

    1997-08-12

    An improved pulsed ion beam source is disclosed having a new biasing circuit for the fast magnetic field. This circuit provides for an initial negative bias for the field created by the fast coils in the ion beam source which pre-ionize the gas in the source, ionize the gas and deliver the gas to the proper position in the accelerating gap between the anode and cathode assemblies in the ion beam source. The initial negative bias improves the interaction between the location of the nulls in the composite magnetic field in the ion beam source and the position of the gas for pre-ionization and ionization into the plasma as well as final positioning of the plasma in the accelerating gap. Improvements to the construction of the flux excluders in the anode assembly are also accomplished by fabricating them as layered structures with a high melting point, low conductivity material on the outsides with a high conductivity material in the center. 12 figs.

  1. Dual source heat pump

    DOE Patents [OSTI]

    Ecker, Amir L.; Pietsch, Joseph A.

    1982-01-01

    What is disclosed is a heat pump apparatus for conditioning a fluid characterized by a fluid handler and path for circulating the fluid in heat exchange relationship with a refrigerant fluid; at least two refrigerant heat exchangers, one for effecting heat exchange with the fluid and a second for effecting heat exchange between refrigerant and a heat exchange fluid and the ambient air; a compressor for efficiently compressing the refrigerant; at least one throttling valve for throttling liquid refrigerant; a refrigerant circuit; refrigerant; a source of heat exchange fluid; heat exchange fluid circulating device and heat exchange fluid circuit for circulating the heat exchange fluid in heat exchange relationship with the refrigerant; and valves or switches for selecting the heat exchangers and direction of flow of the refrigerant therethrough for selecting a particular mode of operation. The heat exchange fluid provides energy for defrosting the second heat exchanger when operating in the air source mode and also provides a alternate source of heat.

  2. COASTING ARC ION SOURCE

    DOE Patents [OSTI]

    Foster, J.S. Jr.

    1957-09-10

    An improved ion source is described and in particular a source in which the ions are efficiently removed. The plasma is generated in a tubular amode structure by the oscillation of electrons in an axial magnetic field, as in the Phillips Ion Gage. The novel aspect of the source is the expansion of the plasma as it leaves the anode structure, so as to reduce the ion density at the axis of the anode and present a uniform area of plasma to an extraction grid. The structure utilized in the present patent to expand the plasma comprises flange members of high permeability at the exitgrid end of the amode to diverge the magnetic field adjacent the exit.

  3. Intense fusion neutron sources

    SciTech Connect (OSTI)

    Kuteev, B. V.; Goncharov, P. R.; Sergeev, V. Yu.; Khripunov, V. I.

    2010-04-15

    The review describes physical principles underlying efficient production of free neutrons, up-to-date possibilities and prospects of creating fission and fusion neutron sources with intensities of 10{sup 15}-10{sup 21} neutrons/s, and schemes of production and application of neutrons in fusion-fission hybrid systems. The physical processes and parameters of high-temperature plasmas are considered at which optimal conditions for producing the largest number of fusion neutrons in systems with magnetic and inertial plasma confinement are achieved. The proposed plasma methods for neutron production are compared with other methods based on fusion reactions in nonplasma media, fission reactions, spallation, and muon catalysis. At present, intense neutron fluxes are mainly used in nanotechnology, biotechnology, material science, and military and fundamental research. In the near future (10-20 years), it will be possible to apply high-power neutron sources in fusion-fission hybrid systems for producing hydrogen, electric power, and technological heat, as well as for manufacturing synthetic nuclear fuel and closing the nuclear fuel cycle. Neutron sources with intensities approaching 10{sup 20} neutrons/s may radically change the structure of power industry and considerably influence the fundamental and applied science and innovation technologies. Along with utilizing the energy produced in fusion reactions, the achievement of such high neutron intensities may stimulate wide application of subcritical fast nuclear reactors controlled by neutron sources. Superpower neutron sources will allow one to solve many problems of neutron diagnostics, monitor nano-and biological objects, and carry out radiation testing and modification of volumetric properties of materials at the industrial level. Such sources will considerably (up to 100 times) improve the accuracy of neutron physics experiments and will provide a better understanding of the structure of matter, including that of the

  4. FABRICATION OF NEUTRON SOURCES

    DOE Patents [OSTI]

    Birden, J.H.

    1959-04-21

    A method is presented for preparing a neutron source from polonium-210 and substances, such as beryllium and boron, characterized by emission of neutrons upon exposure to alpha particles from the polonium. According to the invention, a source is prepared by placing powdered beryllium and a platinum foil electroplated with polonium-2;.0 in a beryllium container. The container is sealed and then heated by induction to a temperature of 450 to 1100 deg C to volatilize the polonium off the foil into the powder. The heating step is terminated upon detection of a maximum in the neutron flux level.

  5. Sources for Office Supplies

    Broader source: Energy.gov [DOE]

    Consistent with the Office of Management and Budget's savings mandates and the Acting Director of the Office of Procurement and Assistance Management's memorandum entitled "Sources for Office Supplies," dated September 9, 2011, the Department of Energy (DOE) supports utilization of: (1) the General Service Administration's (GSA) Blanket Purchase Agreements (BPA) under the Federal Strategic Sourcing Initiative for Office Supplies Second Generation (FSSI OS2); and/or (2) the DOE's AbilityOne Supply Stores, Paperclips, Etc., (Forrestal Building and Germantown). More information on the FSSI can be found at http://www.gsa.gov/fssi.

  6. OLED area illumination source

    DOE Patents [OSTI]

    Foust, Donald Franklin; Duggal, Anil Raj; Shiang, Joseph John; Nealon, William Francis; Bortscheller, Jacob Charles

    2008-03-25

    The present invention relates to an area illumination light source comprising a plurality of individual OLED panels. The individual OLED panels are configured in a physically modular fashion. Each OLED panel comprising a plurality of OLED devices. Each OLED panel comprises a first electrode and a second electrode such that the power being supplied to each individual OLED panel may be varied independently. A power supply unit capable of delivering varying levels of voltage simultaneously to the first and second electrodes of each of the individual OLED panels is also provided. The area illumination light source also comprises a mount within which the OLED panels are arrayed.

  7. Plasma Sources Sci. Technol.

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Sources Sci. Technol. 6 (1997) 492-498. Printed in the UK PII: S0963-0252(97)87196-4 Impurities, temperature and density in a miniature electrostatic plasma and current source D J Den Hartog†, D J Craig†, G Fiksel‡ and J S Sarff‡ † Department of Physics, University of Wisconsin-Madison, 1150 University Avenue, Madison, WI 53706, USA ‡ Sterling Scientific, Inc., 1415 Rutledge Street, Madison, WI 53703, USA Received 23 October 1996, in final form 25 July 1997 Abstract. We have

  8. CALUTRON ION SOURCE

    DOE Patents [OSTI]

    Oppenheimer, F.F.

    1959-06-01

    A shielding arrangement for eliminating oscillating electrons in the ion source region of calutrons is offered. Metal plates are attached to the ion generator so as to intercept the magnetic field between ion generator and accelerating electrode. The oscillating electrons are discharged on the plates. (T.R.H.)

  9. Selective ion source

    DOE Patents [OSTI]

    Leung, K.N.

    1996-05-14

    A ion source is described wherein selected ions maybe extracted to the exclusion of unwanted ion species of higher ionization potential. Also described is a method of producing selected ions from a compound, such as P{sup +} from PH{sub 3}. The invention comprises a plasma chamber, an electron source, a means for introducing a gas to be ionized by electrons from the electron source, means for limiting electron energy from the electron source to a value between the ionization energy of the selected ion species and the greater ionization energy of an unwanted ion specie, and means for extracting the target ion specie from the plasma chamber. In one embodiment, the electrons are generated in a plasma cathode chamber immediately adjacent to the plasma chamber. A small extractor draws the electrons from the plasma cathode chamber into the relatively positive plasma chamber. The energy of the electrons extracted in this manner is easily controlled. The invention is particularly useful for doping silicon with P{sup +}, As{sup +}, and B{sup +} without the problematic presence of hydrogen, helium, water, or carbon oxide ions. Doped silicon is important for manufacture of semiconductors and semiconductor devices. 6 figs.

  10. Sealed Radioactive Source Accountability

    Broader source: Directives, Delegations, and Requirements [Office of Management (MA)]

    1991-12-24

    To establish Department of Energy (DOE) interim policy and to provide guidance for sealed radioactive source accountability. The directive does not cancel any directives. Extended by DOE N 5400.10 to 12-24-93 & Extended by DOE N 5400.12 to 12-24-94.

  11. Selective ion source

    DOE Patents [OSTI]

    Leung, Ka-Ngo

    1996-01-01

    A ion source is described wherein selected ions maybe extracted to the exclusion of unwanted ion species of higher ionization potential. Also described is a method of producing selected ions from a compound, such as P.sup.+ from PH.sub.3. The invention comprises a plasma chamber, an electron source, a means for introducing a gas to be ionized by electrons from the electron source, means for limiting electron energy from the electron source to a value between the ionization energy of the selected ion species and the greater ionization energy of an unwanted ion specie, and means for extracting the target ion specie from the plasma chamber. In one embodiment, the electrons are generated in a plasma cathode chamber immediately adjacent to the plasma chamber. A small extractor draws the electrons from the plasma cathode chamber into the relatively positive plasma chamber. The energy of the electrons extracted in this manner is easily controlled. The invention is particularly useful for doping silicon with P.sup.+, AS.sup.+, and B.sup.+ without the problematic presence of hydrogen, helium, water, or carbon oxide ions. Doped silicon is important for manufacture of semiconductors and semiconductor devices.

  12. Sealed Radioactive Source Accountability

    Broader source: Directives, Delegations, and Requirements [Office of Management (MA)]

    1994-12-22

    This Notice extends DOE N 5400.9, Sealed Radioactive Source Accountability, of 12-24-91, until 12-24-95, unless sooner superseded or rescinded. The contents of DOE N 5400.9 will be updated and incorporated in the revised DOE O 5480.11, Radiation Protection for Occupational Workers.

  13. Evaluated teletherapy source library

    DOE Patents [OSTI]

    Cox, Lawrence J.; Schach Von Wittenau, Alexis E.

    2000-01-01

    The Evaluated Teletherapy Source Library (ETSL) is a system of hardware and software that provides for maintenance of a library of useful phase space descriptions (PSDs) of teletherapy sources used in radiation therapy for cancer treatment. The PSDs are designed to be used by PEREGRINE, the all-particle Monte Carlo dose calculation system. ETSL also stores other relevant information such as monitor unit factors (MUFs) for use with the PSDs, results of PEREGRINE calculations using the PSDs, clinical calibration measurements, and geometry descriptions sufficient for calculational purposes. Not all of this information is directly needed by PEREGRINE. It also is capable of acting as a repository for the Monte Carlo simulation history files from which the generic PSDs are derived.

  14. Filtered cathodic arc source

    DOE Patents [OSTI]

    Falabella, Steven; Sanders, David M.

    1994-01-01

    A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45.degree. to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles.

  15. Filtered cathodic arc source

    DOE Patents [OSTI]

    Falabella, S.; Sanders, D.M.

    1994-01-18

    A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge is described. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45[degree] to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles. 3 figures.

  16. Heat Source Lire,

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Total Consumption Electric Power Other Sectors Period: Monthly Annual Download Series History Download Series History Definitions, Sources & Notes Definitions, Sources & Notes Show Data By: Data Series Area 2010 2011 2012 2013 2014 2015 View History U.S. 1,023 1,022 1,024 1,027 1,030 1,037 2003-2015 Alabama 1,018 1,018 1,016 1,017 1,025 1,030 2007-2015 Alaska 1,005 1,013 1,012 1,002 1,002 1,001 2007-2015 Arizona 1,016 1,015 1,021 1,025 1,029 1,039 2007-2015 Arkansas 1,012 1,017 1,015

  17. Calibrated vapor generator source

    DOE Patents [OSTI]

    Davies, John P.; Larson, Ronald A.; Goodrich, Lorenzo D.; Hall, Harold J.; Stoddard, Billy D.; Davis, Sean G.; Kaser, Timothy G.; Conrad, Frank J.

    1995-01-01

    A portable vapor generator is disclosed that can provide a controlled source of chemical vapors, such as, narcotic or explosive vapors. This source can be used to test and calibrate various types of vapor detection systems by providing a known amount of vapors to the system. The vapor generator is calibrated using a reference ion mobility spectrometer. A method of providing this vapor is described, as follows: explosive or narcotic is deposited on quartz wool, placed in a chamber that can be heated or cooled (depending on the vapor pressure of the material) to control the concentration of vapors in the reservoir. A controlled flow of air is pulsed over the quartz wool releasing a preset quantity of vapors at the outlet.

  18. Calibrated vapor generator source

    DOE Patents [OSTI]

    Davies, J.P.; Larson, R.A.; Goodrich, L.D.; Hall, H.J.; Stoddard, B.D.; Davis, S.G.; Kaser, T.G.; Conrad, F.J.

    1995-09-26

    A portable vapor generator is disclosed that can provide a controlled source of chemical vapors, such as, narcotic or explosive vapors. This source can be used to test and calibrate various types of vapor detection systems by providing a known amount of vapors to the system. The vapor generator is calibrated using a reference ion mobility spectrometer. A method of providing this vapor is described, as follows: explosive or narcotic is deposited on quartz wool, placed in a chamber that can be heated or cooled (depending on the vapor pressure of the material) to control the concentration of vapors in the reservoir. A controlled flow of air is pulsed over the quartz wool releasing a preset quantity of vapors at the outlet. 10 figs.

  19. Voltage controlled current source

    DOE Patents [OSTI]

    Casne, Gregory M.

    1992-01-01

    A seven decade, voltage controlled current source is described for use in testing intermediate range nuclear instruments that covers the entire test current range of from 10 picoamperes to 100 microamperes. High accuracy is obtained throughout the entire seven decades of output current with circuitry that includes a coordinated switching scheme responsive to the input signal from a hybrid computer to control the input voltage to an antilog amplifier, and to selectively connect a resistance to the antilog amplifier output to provide a continuous output current source as a function of a preset range of input voltage. An operator controlled switch provides current adjustment for operation in either a real-time simulation test mode or a time response test mode.

  20. FABRICATION OF NEUTRON SOURCES

    DOE Patents [OSTI]

    Birden, J.H.

    1959-01-20

    A method is presented for preparing a more efficient neutron source comprising inserting in a container a quantity of Po-210, inserting B powder coated with either Ag, Pt, or Ni. The container is sealed and then slowly heated to about 450 C to volatilize the Po and effect combination of the coated powder with the Po. The neutron flux emitted by the unit is moritored and the heating step is terminated when the flux reaches a maximum or selected level.

  1. SOURCE SELECTION INFORMATION -

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    SOURCE SELECTION INFORMATION - SEE FEDERAL ACQUISITION REGULATION (FAR) 2.101 AND 3.104 Department of Energy Washington, DC 20585 (enter date here, centered revised template April 26, 2013) The Honorable Harold Rogers The Honorable Barbara A. Mikulski Chairman, Committee on Appropriations Chairwoman, Committee on Appropriations U.S. House of Representatives U.S. Senate Washington, DC 20515 Washington, DC 20510 The Honorable Rodney P. Frelinghuysen The Honorable Dianne Feinstein Chairman,

  2. High current ion source

    DOE Patents [OSTI]

    Brown, Ian G.; MacGill, Robert A.; Galvin, James E.

    1990-01-01

    An ion source utilizing a cathode and anode for producing an electric arc therebetween. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma leaves the generation region and expands through another regon. The density profile of the plasma may be flattened using a magnetic field formed within a vacuum chamber. Ions are extracted from the plasma to produce a high current broad on beam.

  3. Greenhouse Gas Source Attribution

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Greenhouse Gas Source Attribution - Sandia Energy Energy Search Icon Sandia Home Locations Contact Us Employee Locator Energy & Climate Secure & Sustainable Energy Future Stationary Power Energy Conversion Efficiency Solar Energy Wind Energy Water Power Supercritical CO2 Geothermal Natural Gas Safety, Security & Resilience of the Energy Infrastructure Energy Storage Nuclear Power & Engineering Grid Modernization Battery Testing Nuclear Energy Defense Waste Management Programs

  4. The European Spallation Source

    SciTech Connect (OSTI)

    Peggs, S; Eshraqi, M; Hahn, H; Jansson, A; Lindroos, M; Ponton, A; Rathsman, K; Trahern, G; Bousso, S; Calaga, R; Devanz, G; Duperrier, R D; Eguia, J; Gammino, S; Moller, S P; Oyon, C; Ruber, R.J.M.Y.

    2011-03-01

    The European Spallation Source (ESS) is a 5 MW, 2.5 GeV long pulse proton linac, to be built and commissioned in Lund, Sweden. The Accelerator Design Update (ADU) project phase is under way, to be completed at the end of 2012 by the delivery of a Technical Design Report. Improvements to the 2003 ESS design will be summarised, and the latest design activities will be presented.

  5. Open-Source GIS

    SciTech Connect (OSTI)

    Vatsavai, Raju; Burk, Thomas E; Lime, Steve

    2012-01-01

    The components making up an Open Source GIS are explained in this chapter. A map server (Sect. 30.1) can broadly be defined as a software platform for dynamically generating spatially referenced digital map products. The University of Minnesota MapServer (UMN Map Server) is one such system. Its basic features are visualization, overlay, and query. Section 30.2 names and explains many of the geospatial open source libraries, such as GDAL and OGR. The other libraries are FDO, JTS, GEOS, JCS, MetaCRS, and GPSBabel. The application examples include derived GIS-software and data format conversions. Quantum GIS, its origin and its applications explained in detail in Sect. 30.3. The features include a rich GUI, attribute tables, vector symbols, labeling, editing functions, projections, georeferencing, GPS support, analysis, and Web Map Server functionality. Future developments will address mobile applications, 3-D, and multithreading. The origins of PostgreSQL are outlined and PostGIS discussed in detail in Sect. 30.4. It extends PostgreSQL by implementing the Simple Feature standard. Section 30.5 details the most important open source licenses such as the GPL, the LGPL, the MIT License, and the BSD License, as well as the role of the Creative Commons.

  6. Negative ion source

    DOE Patents [OSTI]

    Delmore, James E.

    1987-01-01

    A method and apparatus for providing a negative ion source accelerates electrons away from a hot filament electron emitter into a region of crossed electric and magnetic fields arranged in a magnetron configuration. During a portion of the resulting cycloidal path, the electron velocity is reduced below its initial value. The electron accelerates as it leaves the surface at a rate of only slightly less than if there were no magnetic field, thereby preventing a charge buildup at the surface of the emitter. As the electron traverses the cycloid, it is decelerated during the second, third, and fourth quadrants, then reeccelerated as it approaches the end of the fourth quadrant to regain its original velocity. The minimum velocity occurs during the fourth quadrant, and corresponds to an electron temperature of 200.degree. to 500.degree. for the electric and magnetic fields commonly encountered in the ion sources of magnetic sector mass spectrometers. An ion source using the above-described thermalized electrons is also disclosed.

  7. Improved negative ion source

    DOE Patents [OSTI]

    Delmore, J.E.

    1984-05-01

    A method and apparatus for providing a negative ion source accelerates electrons away from a hot filament electron emitter into a region of crossed electric and magnetic fields arranged in a magnetron configuration. During a portion of the resulting cycloidal path, the electron velocity is reduced below its initial value. The electron accelerates as it leaves the surface at a rate of only slightly less than if there were no magnetic field, thereby preventing a charge buildup at the surface of the emitter. As the electron traverses the cycloid, it is decelerated during the second, third, and fourth quadrants, then reaccelerated as it approaches the end of the fourth quadrant to regain its original velocity. The minimum velocity occurs during the fourth quadrant, and corresponds to an electron temperature of 200 to 500/sup 0/C for the electric and magnetic fields commonly encountered in the ion sources of magnetic sector mass spectrometers. An ion source using the above-described thermalized electrons is also disclosed.

  8. Capillary discharge source

    DOE Patents [OSTI]

    Bender, III, Howard Albert

    2003-11-25

    Debris generation from an EUV electric discharge plasma source device can be significantly reduced or essentially eliminated by encasing the electrodes with dielectric or electrically insulating material so that the electrodes are shielded from the plasma, and additionally by providing a path for the radiation to exit wherein the electrodes are not exposed to the area where the radiation is collected. The device includes: (a) a body, which is made of an electrically insulating material, that defines a capillary bore that has a proximal end and a distal end and that defines at least one radiation exit; (b) a first electrode that defines a first channel that has a first inlet end that is connected to a source of gas and a first outlet end that is in communication with the capillary bore, wherein the first electrode is positioned at the distal end of the capillary bore; (c) a second electrode that defines a second channel that has a second inlet end that is in communication with the capillary bore and an outlet end, wherein the second electrode is positioned at the proximal end of the capillary bore; and (d) a source of electric potential that is connected across the first and second electrodes, wherein radiation generated within the capillary bore is emitted through the at least one radiation exit and wherein the first electrode and second electrode are shielded from the emitted radiation.

  9. BERNAS ION SOURCE DISCHARGE SIMULATION

    SciTech Connect (OSTI)

    RUDSKOY,I.; KULEVOY, T.V.; PETRENKO, S.V.; KUIBEDA, R.P.; SELEZNEV, D.N.; PERSHIN, V.I.; HERSHCOVITCH, A.; JOHNSON, B.M.; GUSHENETS, V.I.; OKS, E.M.; POOLE, H.J.

    2007-08-26

    The joint research and development program is continued to develop steady-state ion source of decaborane beam for ion implantation industry. Bemas ion source is the wide used ion source for ion implantation industry. The new simulation code was developed for the Bemas ion source discharge simulation. We present first results of the simulation for several materials interested in semiconductors. As well the comparison of results obtained with experimental data obtained at the ITEP ion source test-bench is presented.

  10. Energy Sources | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Sources Energy Sources Renewable Energy Renewable Energy Learn more about energy from solar, wind, water, geothermal and biomass. Read more Nuclear Nuclear Learn more about how we use nuclear energy. Read more Electricity Electricity Learn more about how we use electricity as an energy source. Read more Fossil Fossil Learn more about our fossil energy sources: coal, oil and natural gas. Read more Primary energy sources take many forms, including nuclear energy, fossil energy -- like oil, coal

  11. Variable leak gas source

    DOE Patents [OSTI]

    Henderson, Timothy M.; Wuttke, Gilbert H.

    1977-01-01

    A variable leak gas source and a method for obtaining the same which includes filling a quantity of hollow glass micro-spheres with a gas, storing said quantity in a confined chamber having a controllable outlet, heating said chamber above room temperature, and controlling the temperature of said chamber to control the quantity of gas passing out of said controllable outlet. Individual gas filled spheres may be utilized for calibration purposes by breaking a sphere having a known quantity of a known gas to calibrate a gas detection apparatus.

  12. Photon Source Parameters

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Print Summary Graph of Brightness Curves for All Insertion Devices Insertion Device and Bend Magnet Parameters Bend Magnet Superbend Magnet U30 Undulator U50 Undulator U80 Undulator U100 Undulator W114 Wiggler The ALS has six elliptically polarizing undulators, two in straight 4, two in straight 11, and one each in straights 6 and 7. All are arranged with chicanes so that two such devices can be installed to feed two independent beamlines. They can be used in a variety

  13. Photon Source Parameters

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Print Summary Graph of Brightness Curves for All Insertion Devices Insertion Device and Bend Magnet Parameters Bend Magnet Superbend Magnet U30 Undulator U50 Undulator U80 Undulator U100 Undulator W114 Wiggler The ALS has six elliptically polarizing undulators, two in straight 4, two in straight 11, and one each in straights 6 and 7. All are arranged with chicanes so that two such devices can be installed to feed two independent beamlines. They can be used in a variety

  14. Photon Source Parameters

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Print Summary Graph of Brightness Curves for All Insertion Devices Insertion Device and Bend Magnet Parameters Bend Magnet Superbend Magnet U30 Undulator U50 Undulator U80 Undulator U100 Undulator W114 Wiggler The ALS has six elliptically polarizing undulators, two in straight 4, two in straight 11, and one each in straights 6 and 7. All are arranged with chicanes so that two such devices can be installed to feed two independent beamlines. They can be used in a variety

  15. Compact ion accelerator source

    DOE Patents [OSTI]

    Schenkel, Thomas; Persaud, Arun; Kapadia, Rehan; Javey, Ali

    2014-04-29

    An ion source includes a conductive substrate, the substrate including a plurality of conductive nanostructures with free-standing tips formed on the substrate. A conductive catalytic coating is formed on the nanostructures and substrate for dissociation of a molecular species into an atomic species, the molecular species being brought in contact with the catalytic coating. A target electrode placed apart from the substrate, the target electrode being biased relative to the substrate with a first bias voltage to ionize the atomic species in proximity to the free-standing tips and attract the ionized atomic species from the substrate in the direction of the target electrode.

  16. Photon Source Parameters

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Print Summary Graph of Brightness Curves for All Insertion Devices Insertion Device and Bend Magnet Parameters Bend Magnet Superbend Magnet U30 Undulator U50 Undulator U80 Undulator U100 Undulator W114 Wiggler The ALS has six elliptically polarizing undulators, two in straight 4, two in straight 11, and one each in straights 6 and 7. All are arranged with chicanes so that two such devices can be installed to feed two independent beamlines. They can be used in a variety

  17. Photon Source Parameters

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Print Summary Graph of Brightness Curves for All Insertion Devices Insertion Device and Bend Magnet Parameters Bend Magnet Superbend Magnet U30 Undulator U50 Undulator U80 Undulator U100 Undulator W114 Wiggler The ALS has six elliptically polarizing undulators, two in straight 4, two in straight 11, and one each in straights 6 and 7. All are arranged with chicanes so that two such devices can be installed to feed two independent beamlines. They can be used in a variety

  18. Photon Source Parameters

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Print Summary Graph of Brightness Curves for All Insertion Devices Insertion Device and Bend Magnet Parameters Bend Magnet Superbend Magnet U30 Undulator U50 Undulator U80 Undulator U100 Undulator W114 Wiggler The ALS has six elliptically polarizing undulators, two in straight 4, two in straight 11, and one each in straights 6 and 7. All are arranged with chicanes so that two such devices can be installed to feed two independent beamlines. They can be used in a variety

  19. Ion Sources - 88-Inch Cyclotron

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Sources The 88-Inch Cyclotron is fed by three Electron Cyclotron Resonance (ECR) high-charge-state ion sources, the ECR, the AECR, and VENUS, currently the most powerful ECR ion source in the world. Built to answer the demand for intense heavy ion beams, these high performance ion sources enable the 88-Inch Cyclotron to accelerate beams of ions from hydrogen to uranium. The ECR ion sources allow the efficient use of rare isotopes of stable elements, either from natural or enriched sources. A

  20. Infrared source test

    SciTech Connect (OSTI)

    Ott, L.

    1994-11-15

    The purpose of the Infrared Source Test (IRST) is to demonstrate the ability to track a ground target with an infrared sensor from an airplane. The system is being developed within the Advance Technology Program`s Theater Missile Defense/Unmanned Aerial Vehicle (UAV) section. The IRST payload consists of an Amber Radiance 1 infrared camera system, a computer, a gimbaled mirror, and a hard disk. The processor is a custom R3000 CPU board made by Risq Modular Systems, Inc. for LLNL. The board has ethernet, SCSI, parallel I/O, and serial ports, a DMA channel, a video (frame buffer) interface, and eight MBytes of main memory. The real-time operating system VxWorks has been ported to the processor. The application code is written in C on a host SUN 4 UNIX workstation. The IRST is the result of a combined effort by physicists, electrical and mechanical engineers, and computer scientists.

  1. Fortran 90 Source Module

    Energy Science and Technology Software Center (OSTI)

    1998-01-13

    A major advance contained in the new Fortran 90 language standard is the ability to define new data types and the operators associated with them. Writing computer code to implement computations with real and complex three domensional vectors and dyadics is greatly simplified if the equations can be implemented directly, without the need to code the vector arithmetic explicitly. The Fortran 90 module VECTORS contains source code which defines new data types for real andmore » complex 3-dimensional vectors and dyadics, along with the common operations needed to work with these objects. Routines to allow convenient initalization and output of the new types are also included. in keeping with the philosophy of data abstraction, the details of the implementation of the data types are maintained private, and the functions and operators are made generic to simplify the combining of real, complex, single and double precision vectors and dyadics.« less

  2. Thulium-170 heat source

    DOE Patents [OSTI]

    Walter, Carl E.; Van Konynenburg, Richard; VanSant, James H.

    1992-01-01

    An isotopic heat source is formed using stacks of thin individual layers of a refractory isotopic fuel, preferably thulium oxide, alternating with layers of a low atomic weight diluent, preferably graphite. The graphite serves several functions: to act as a moderator during neutron irradiation, to minimize bremsstrahlung radiation, and to facilitate heat transfer. The fuel stacks are inserted into a heat block, which is encased in a sealed, insulated and shielded structural container. Heat pipes are inserted in the heat block and contain a working fluid. The heat pipe working fluid transfers heat from the heat block to a heat exchanger for power conversion. Single phase gas pressure controls the flow of the working fluid for maximum heat exchange and to provide passive cooling.

  3. PULSED ION SOURCE

    DOE Patents [OSTI]

    Anderson, C.E.; Ehlers, K.W.

    1958-06-17

    An ion source is described for producing very short high density pulses of ions without bcam scattering. The ions are created by an oscillating electron discharge within a magnetic field. After the ions are drawn from the ionization chamber by an accelerating electrode the ion beam is under the influence of the magnetic field for separation of the ions according to mass and, at the same time, passes between two neutralizing plntes maintained nt equal negative potentials. As the plates are formed of a material having a high ratio of secondary electrons to impinging ions, the ion bombardment of the plntes emits electrons which neutralize the frirge space-charge of the beam and tend to prevent widening of the beam cross section due to the mutual repulsion of the ions.

  4. Multiple source heat pump

    DOE Patents [OSTI]

    Ecker, Amir L.

    1983-01-01

    A heat pump apparatus for conditioning a fluid characterized by a fluid handler and path for circulating a fluid in heat exchange relationship with a refrigerant fluid, at least three refrigerant heat exchangers, one for effecting heat exchange with the fluid, a second for effecting heat exchange with a heat exchange fluid, and a third for effecting heat exchange with ambient air; a compressor for compressing the refrigerant; at least one throttling valve connected at the inlet side of a heat exchanger in which liquid refrigerant is vaporized; a refrigerant circuit; refrigerant; a source of heat exchange fluid; heat exchange fluid circuit and pump for circulating the heat exchange fluid in heat exchange relationship with the refrigerant; and valves or switches for selecting the heat exchangers and directional flow of refrigerant therethrough for selecting a particular mode of operation. Also disclosed are a variety of embodiments, modes of operation, and schematics therefor.

  5. Advanced Photon Source Upgrade Project

    ScienceCinema (OSTI)

    Mitchell, John; Gibson, Murray; Young, Linda; Joachimiak, Andrzej

    2013-04-19

    Upgrade to Advanced Photon Source announced by Department Of Energy. Read more: http://go.usa.gov/ivZ

  6. The SIAM Photon Source

    SciTech Connect (OSTI)

    Pairsuwan, Weerapong

    2007-01-19

    A short history of the SIAM Photon Source in Thailand is described. The facility is based on the 1 GeV storage ring obtained from the SORTEC consortium in Japan. After a redesign to include insertion straight sections it produced the first light in December 2001 and the first beam line became operational in early 2002. Special difficulties appear when a synchrotron light facility is obtained by donation, which have mostly to do with the absence of human resource development that elsewhere is commonly accomplished during design and construction. Additional problems arise by the distance of a developing country like Thailand from the origin of technical parts of the donation. A donation does not provide time to generate local capabilities or include in the technical design locally obtainable parts. This makes future developments, repairs and maintenance more time consuming, difficult and expensive than it should be. In other cases, parts of components are proprietary or obsolete or both which requires redesign and engineering at a time when the replacement part should be available to prevent stoppage of operation.The build-up of a user community is very difficult, especially when the radiation spectrum is confined to the VUV regime. Most of scientific interest these days is focused on the x-ray regime. Due to its low beam energy, the SIAM storage ring did not produce useful x-ray intensities and we are therefore in the midst of an upgrade to produce harder radiation. The first step has been achieved with a 20% increase of energy to 1.2 GeV. This step shifts the critical photon energy of bending magnet radiation from 800 eV to 1.4 keV providing useful radiation up to 7 keV. A XAS-beam line has been completed in 2005 and experimentation is very active by now. The next step is to install a 6.4 T wavelength shifter by the end of 2006 resulting in a critical photon energy of 6.15 keV. Further upgrades are planed for the comming years.

  7. Constricted glow discharge plasma source

    DOE Patents [OSTI]

    Anders, Andre; Anders, Simone; Dickinson, Michael; Rubin, Michael; Newman, Nathan

    2000-01-01

    A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.

  8. WIPP Opportunities - Procurement - Sources Sought

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Procurement Sources Sought This page displays a listing Sources Sought. If you are interested in submitting an outline, please contact the cognizant buyer to find out more. Please respond by e-mail to the buyer and include: Close date Buyer's name Your name or name of contact E-mail address and/or phone number Type of business All outlines must be received on or before the listed closing date. _________________________________________ Sources Sought Nuclear Waste Partnership LLC (NWP) is seeking

  9. Source Selection | Department of Energy

    Office of Environmental Management (EM)

    Status Reporting Requirement (pdf) Source Evaluation Board (SEB) Secretariat and Knowledge Manager - Acquisition Guide Chapter 1.4 (pdf) Acquisition Planning - Acquisition...

  10. ION SOURCE UNIT FOR CALUTRON

    DOE Patents [OSTI]

    Sloan, D.H.; Yockey, H.P.; Schmidt, F.H.

    1959-04-14

    An improvement in the mounting arrangement for an ion source within the vacuum tank of a calutron device is reported. The cathode and arc block of the source are independently supported from a stem passing through the tank wall. The arc block may be pivoted and moved longitudinally with respect to the stem to thereby align the arc chamber in the biock with the cathode and magnetic field in the tank. With this arrangement the elements of the ion source are capable of precise adjustment with respect to one another, promoting increased source efficiency.

  11. Media Center | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    distributed to all APS users and others interested in the APS. Research Highlights Books Articles on Advanced Photon Source research and engineering highlights that are written...

  12. Advanced Neutron Source (ANS) Project

    SciTech Connect (OSTI)

    Campbell, J.H.; Selby, D.L.; Harrington, R.M.; Peretz, F.J.

    1991-02-01

    This report discusses the research and development, design and safety of the Advanced Neutron Source at Oak Ridge National Laboratory. (LSP)

  13. Linac Coherent Light Source Overview

    ScienceCinema (OSTI)

    None

    2013-05-29

    Take an animated tour of the Linac Coherent Light Source (LCLS). Follow the laser pulse from the injector gun all the way through to the Far Experimental Hall.

  14. APS Science | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Science APS Science features articles on Advanced Photon Source research and engineering highlights that are written for the interested public as well as the synchrotron x-ray,...

  15. Presentation: Synchrotron Radiation Light Sources

    Broader source: Energy.gov [DOE]

    A briefing to the Secretary's Energy Advisory Board on Synchrotron Radiation Light Sources delivered by Patricia Dehmer, U.S. Department of Energy

  16. Video Library | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Archives APS Brochure Annual Reports Posters Podcasts Image Gallery external site Video Library Syndicated Feeds (RSS) Now Playing: The Advanced Photon Source More videos:...

  17. Linac Coherent Light Source Overview

    Office of Energy Efficiency and Renewable Energy (EERE)

    Take an animated tour of the Linac Coherent Light Source (LCLS). Follow the laser pulse from the injector gun all the way through to the Far Experimental Hall.

  18. Video Library | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Video Library Related Links: APS Colloquium APS Podcasts APS Today More videos: Introduction to the APS Physics of the Blues Now Playing: Building the Advanced Photon Source This...

  19. The Linac Coherent Light Source

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    White, William E.; Robert, Aymeric; Dunne, Mike

    2015-05-01

    The Linac Coherent Light Source (LCLS) at the SLAC National Accelerator Laboratory was the first hard X-ray free-electron laser (FEL) to operate as a user facility. After five years of operation, LCLS is now a mature FEL user facility. Our personal views about opportunities and challenges inherent to these unique light sources are discussed.

  20. Hollow electrode plasma excitation source

    DOE Patents [OSTI]

    Ballou, Nathan E.

    1992-01-01

    A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures.

  1. Hollow electrode plasma excitation source

    DOE Patents [OSTI]

    Ballou, N.E.

    1992-04-14

    A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures. 5 figs.

  2. Installing a Light Source 'Racetrack'

    Broader source: Energy.gov [DOE]

    This month, workers at Brookhaven National Laboratory’s National Synchrotron Light Source II (NSLS-II), the half-mile electron racetrack for one of the world’s most advanced light sources, will begin filling the facility’s steel and concrete shell.

  3. Sealed source peer review plan

    SciTech Connect (OSTI)

    Feldman, Alexander; Leonard, Lee; Burns, Ron

    2009-01-01

    Sealed sources are known quantities of radioactive materials that have been encapsulated in quantities that produce known radiation fields. Sealed sources have multiple uses ranging from instrument calibration sources to sources that produce radiation fields for experimental applications. The Off-Site Source Recovery (OSR) Project at Los Alamos National Laboratory (LANL), created in 1999, under the direction of the Waste Management Division of the U.S. Department of Energy (DOE) Albuquerque has been assigned the responsibility to recover and manage excess and unwanted radioactive sealed sources from the public and private sector. LANL intends to ship drums containing qualified sealed sources to the Waste Isolation Pilot Plant (WIPP) for disposal. Prior to shipping, these drums must be characterized with respect to radiological content and other parameters. The U. S. Environmental Protection Agency (EPA) requires that ten radionulcides be quantified and reported for every container of waste to be disposed in the WIPP. The methods traditionally approved by the EPA include non-destructive assay (NDA) in accordance with Appendix A of the Contact-Handled Transuranic Waste Acceptance Criteria for the Waste Isolation Pilot Plant (DOE, 2002) (CH WAC). However, because of the nature and pedigree of historical records for sealed sources and the technical infeasibility of performing NDA on these sources, LANL proposes to characterize the content of these waste drums using qualified existing radiological data in lieu of direct measurement. This plan describes the process and documentation requirements for the use of the peer review process to qualify existing data for sealed radiological sources in lieu of perfonning radioassay. The peer review process will be performed in accordance with criteria provided in 40 CFR {section} 194.22 which specifies the use of the NUREG 1297 guidelines. The plan defines the management approach, resources, schedule, and technical requirements

  4. Diversity employment and recruitment sources

    SciTech Connect (OSTI)

    Not Available

    1994-08-01

    Effective human resources management has been identified as one of four critical success factors in the Department of Energy Strategic Plan. The Plan states relative to this factor: ``The Department seeks greater alignment of resources with agency priorities and increased diversification of the workforce, including gender, ethnicity, age, and skills. This diversification will bring new thinking and perspectives that heretofore have not had a voice in departmental decision-making.`` This Guide has been developed as a key tool to assist Department of Energy management and administrative staff in achieving Goal 2 of this critical success factor, which is to ``Ensure a diverse and talented workforce.`` There are numerous sources from which to recruit minorities, women and persons with disabilities. Applying creativity and proactive effort, using traditional and non-traditional approaches, and reaching out to various professional, academic and social communities will increase the reservoir of qualified candidates from which to make selections. In addition, outreach initiatives will undoubtedly yield further benefits such as a richer cultural understanding and diversity awareness. The resource listings presented in this Guide are offered to encourage active participation in the diversity recruitment process. This Guide contains resource listings by state for organizations in the following categories: (1) African American Recruitment Sources; (2) Asian American/Pacific Islander Recruitment Sources; (3) Hispanic Recruitment Sources; (4) Native American/Alaskan Native Recruitment Sources; (5) Persons with Disabilities Recruitment Sources; and (6) Women Recruitment Sources.

  5. International Data on Radiological Sources

    SciTech Connect (OSTI)

    Martha Finck; Margaret Goldberg

    2010-07-01

    ABSTRACT The mission of radiological dispersal device (RDD) nuclear forensics is to identify the provenance of nuclear and radiological materials used in RDDs and to aid law enforcement in tracking nuclear materials and routes. The application of databases to radiological forensics is to match RDD source material to a source model in the database, provide guidance regarding a possible second device, and aid the FBI by providing a short list of manufacturers and distributors, and ultimately to the last legal owner of the source. The Argonne/Idaho National Laboratory RDD attribution database is a powerful technical tool in radiological forensics. The database (1267 unique vendors) includes all sealed sources and a device registered in the U.S., is complemented by data from the IAEA Catalogue, and is supported by rigorous in-lab characterization of selected sealed sources regarding physical form, radiochemical composition, and age-dating profiles. Close working relationships with global partners in the commercial sealed sources industry provide invaluable technical information and expertise in the development of signature profiles. These profiles are critical to the down-selection of potential candidates in either pre- or post- event RDD attribution. The down-selection process includes a match between an interdicted (or detonated) source and a model in the database linked to one or more manufacturers and distributors.

  6. MEMS Actuator | Argonne National Laboratory

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    TO: FROM: SUBJECT: Department of Energy Washington, DC 20585 May 29,2014 ADAM SIEMINSKI ADMINISTRATOR ENERGY INFORMATION ADMINIST~ON CHRISTOPHER SMITH ~v- PRINCIPAL DEPUTY ASSISTANT SECRETARY OFFICE OF FOSSIL ENERGY Request for an Update ofEIA's January 2012 Study of Liquefied Natural Gas Export Scenarios The Office of Fossil Energy (FE) requests the Energy Infmmation Administration (EIA) to evaluate the impact of increased natural gas demand, reflecting possible exports of U.S. natural gas, on

  7. High G MEMS integrated accelerometer

    SciTech Connect (OSTI)

    Davies, B.R.; Barron, C.C.; Montague, S.; Smith, J.H.; Murray, J.R.; Christenson, T.R.; Bateman, V.I.

    1996-12-31

    This paper describes the design and implementation of a surface micromachined accelerometer for measuring very high levels of acceleration (up to 50,000 G). Both the mechanical and electronic portions of the sensor were integrated on a single substrate using a process developed at Sandia National Laboratories. In this process, the mechanical components of the sensor were first fabricated at the bottom of a trench etched into the water substrate. The trench was then filled with oxide and sealed to protect the mechanical components during subsequent microelectronics processing. The wafer surface was then planarized in preparation for CMOS processing using Chemical Mechanical Polishing (CMP). Next, the CMOS electronics were fabricated on areas of the wafer adjacent to the embedded structures. Finally, the mechanical structures were released and the sensor tested. The mechanical structure of the sensor consisted of two polysilicon plate masses suspended by multiple springs (cantilevered beam structures) over corresponding polysilicon plates fixed to the substrate to form two parallel plate capacitors. The first polysilicon plate mass was suspended using compliant springs (cantilever beams) and acted as a variable capacitor during sensor acceleration. The second polysilicon plate mass was suspended using very stiff springs and acted as a fixed capacitor during acceleration. Acceleration was measured by comparing the capacitance of the variable capacitor (compliant suspension) with the fixed capacitance (stiff suspension).

  8. Hydraulically amplified PZT mems actuator

    DOE Patents [OSTI]

    Miles, Robin R.

    2004-11-02

    A hydraulically amplified microelectromechanical systems actuator. A piece of piezoelectric material or stacked piezo bimorph is bonded or deposited as a thin film. The piece is operatively connected to a primary membrane. A reservoir is operatively connected to the primary membrane. The reservoir contains a fluid. A membrane is operatively connected to the reservoir. In operation, energizing the piezoelectric material causing the piezoelectric material to bow. Bowing of the piezoelectric material causes movement of the primary membrane. Movement of the primary membrane results in a force in being transmitted to the liquid in the reservoir. The force in the liquid causes movement of the membrane. Movement of the membrane results in an operating actuator.

  9. Optically transduced MEMS gyro device

    DOE Patents [OSTI]

    Nielson, Gregory N; Bogart, Gregory R; Langlois, Eric; Okandan, Murat

    2014-05-20

    A bulk micromachined vibratory gyro in which a proof mass has a bulk substrate thickness for a large mass and high inertial sensitivity. In embodiments, optical displacement transduction is with multi-layer sub-wavelength gratings for high sensitivity and low cross-talk with non-optical drive elements. In embodiments, the vibratory gyro includes a plurality of multi-layer sub-wavelength gratings and a plurality of drive electrodes to measure motion of the proof mass induced by drive forces and/or moments and induced by the Coriolis Effect when the gyro experiences a rotation. In embodiments, phase is varied across the plurality gratings and a multi-layer grating having the best performance is selected from the plurality.

  10. Environmental Technology Verification of Mobile Sources Control...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Environmental Technology Verification of Mobile Sources Control Technologies Environmental Technology Verification of Mobile Sources Control Technologies 2005 Diesel Engine...

  11. Alternative Water Sources Maps | Department of Energy

    Office of Environmental Management (EM)

    Facilities Water Efficiency Alternative Water Sources Maps Alternative Water Sources Maps Rainwater Harvesting Regulations Rainwater Harvesting Regulations Read more ...

  12. Three chamber negative ion source

    DOE Patents [OSTI]

    Leung, K.N.; Ehlers, K.W.; Hiskes, J.R.

    1983-11-10

    It is an object of this invention provide a negative ion source which efficiently provides a large flux of negatively ionized particles. This invention provides a volume source of negative ions which has a current density sufficient for magnetic fusion applications and has electrons suppressed from the output. It is still another object of this invention to provide a volume source of negative ions which can be electrostatically accelerated to high energies and subsequently neutralized to form a high energy neutral beam for use with a magnetically confined plasma.

  13. Protection #1: Remove the Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Remove the Source Protection #1: Remove the Source The 3 Protections = Defense in Depth August 1, 2013 Waste being removed from MDA-B inside a metal building Excavation of waste from MDA-B thumbnail of Removing the source means excavating contaminants, sorting these by waste type, and transporting to a disposal area in which contaminants are contained. RELATED IMAGES http://farm8.staticflickr.com/7388/9571274521_679fe1e34a_t.jpg Enlarge http://farm4.staticflickr.com/3726/9571272211_6873a5717f

  14. Primary ion sources for EBIS

    SciTech Connect (OSTI)

    Keller, R.

    2001-03-21

    This paper gives an introduction into the topic of primary ion sources that can be used to feed ions of normally solid elements into EBIS devices. Starting with a set of typical requirements for primary ion sources, some major types of ion generators are discussed first, with emphasis on their working principles rather than trying to give a fully representative listing of used and proposed generators. Beam-transport issues between primary ion source and EBIS are then examined, and generic characteristics of suitable beam-formation and transport systems are explained.

  15. Magnetic Materials | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Materials Internal Magnetic Materials The Magnetic Material Group (MMG) is part of the X-ray Science Division (XSD) at the Advanced Photon Source (APS). Our research focuses on the...

  16. Manhattan Project: Sources and Notes

    Office of Scientific and Technical Information (OSTI)

    this web site. For a discussion of the most important works on the Manhattan Project, see the "Suggested Readings." For a general discussion of the use of sources in this web site, ...

  17. Radiation source with shaped emission

    DOE Patents [OSTI]

    Kubiak, Glenn D.; Sweatt, William C.

    2003-05-13

    Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.

  18. Electrolyte salts for power sources

    DOE Patents [OSTI]

    Doddapaneni, Narayan; Ingersoll, David

    1995-01-01

    Electrolyte salts for power sources comprising salts of phenyl polysulfonic acids and phenyl polyphosphonic acids. The preferred salts are alkali and alkaline earth metal salts, most preferably lithium salts.

  19. E Source | Open Energy Information

    Open Energy Info (EERE)

    use and provision of energy. Who Is E Source? Whether you're an electric or natural gas utility or a large business customer served by a utility, your problems are probably...

  20. APS Podcasts | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    of Art Preservation and Connoisseurship August 14, 2007; mp3 - 1.88MB Franceska Casadio, Art Institute of Chicago: November 3, 2004 The Advanced Photon Source (videomp4) August...

  1. Next Generation Light Source Workshops

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Next Generation Light Source Workshops A series of workshops will be held in late August with the goal of refining the scientific drivers for the facility and translating the...

  2. Storage Ring Synchrotron Radiation Sources

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    BRAZIL Campinas LNLS 1.35 Dedicated CANADA Saskatoon CLS (Canadian Light Source) 2.9 Dedicated CHINA (PRC) Beijing < td WIDTH"40%" bgcolor"FFFFFF">BSRF (Inst. High En. Phys.) ...

  3. Sponsored E-Source Membership

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Programs Service (EDRP) With EDRP, you'll discover ways to make your EE and demand-response programs more effective. With E Source EDRP you can: Identify attributes...

  4. ARM - Sources of Atmospheric Carbon

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Sources of Atmospheric Carbon Outreach Home Room News Publications Traditional Knowledge Kiosks Barrow, Alaska Tropical Western Pacific Site Tours Contacts Students Study Hall About ARM Global Warming FAQ Just for Fun Meet our Friends Cool Sites Teachers Teachers' Toolbox Lesson Plans Sources of Atmospheric Carbon Atmospheric carbon represented a steady state system, where influx equaled outflow, before the Industrial Revolution. Currently, it is no longer a steady state system because the

  5. Multilevel cascade voltage source inverter with seperate DC sources

    DOE Patents [OSTI]

    Peng, Fang Zheng (Knoxville, TN); Lai, Jih-Sheng (Blacksburg, VA)

    2002-01-01

    A multilevel cascade voltage source inverter having separate DC sources is described herein. This inverter is applicable to high voltage, high power applications such as flexible AC transmission systems (FACTS) including static VAR generation (SVG), power line conditioning, series compensation, phase shifting and voltage balancing and fuel cell and photovoltaic utility interface systems. The M-level inverter consists of at least one phase wherein each phase has a plurality of full bridge inverters equipped with an independent DC source. This inverter develops a near sinusoidal approximation voltage waveform with only one switching per cycle as the number of levels, M, is increased. The inverter may have either single-phase or multi-phase embodiments connected in either wye or delta configurations.

  6. Multilevel cascade voltage source inverter with separate DC sources

    DOE Patents [OSTI]

    Peng, F.Z.; Lai, J.S.

    1997-06-24

    A multilevel cascade voltage source inverter having separate DC sources is described herein. This inverter is applicable to high voltage, high power applications such as flexible AC transmission systems (FACTS) including static VAR generation (SVG), power line conditioning, series compensation, phase shifting and voltage balancing and fuel cell and photovoltaic utility interface systems. The M-level inverter consists of at least one phase wherein each phase has a plurality of full bridge inverters equipped with an independent DC source. This inverter develops a near sinusoidal approximation voltage waveform with only one switching per cycle as the number of levels, M, is increased. The inverter may have either single-phase or multi-phase embodiments connected in either wye or delta configurations. 15 figs.

  7. Multilevel cascade voltage source inverter with seperate DC sources

    DOE Patents [OSTI]

    Peng, Fang Zheng; Lai, Jih-Sheng

    2001-04-03

    A multilevel cascade voltage source inverter having separate DC sources is described herein. This inverter is applicable to high voltage, high power applications such as flexible AC transmission systems (FACTS) including static VAR generation (SVG), power line conditioning, series compensation, phase shifting and voltage balancing and fuel cell and photovoltaic utility interface systems. The M-level inverter consists of at least one phase wherein each phase has a plurality of full bridge inverters equipped with an independent DC source. This inverter develops a near sinusoidal approximation voltage waveform with only one switching per cycle as the number of levels, M, is increased. The inverter may have either single-phase or multi-phase embodiments connected in either wye or delta configurations.

  8. Multilevel cascade voltage source inverter with seperate DC sources

    DOE Patents [OSTI]

    Peng, Fang Zheng; Lai, Jih-Sheng

    1997-01-01

    A multilevel cascade voltage source inverter having separate DC sources is described herein. This inverter is applicable to high voltage, high power applications such as flexible AC transmission systems (FACTS) including static VAR generation (SVG), power line conditioning, series compensation, phase shifting and voltage balancing and fuel cell and photovoltaic utility interface systems. The M-level inverter consists of at least one phase wherein each phase has a plurality of full bridge inverters equipped with an independent DC source. This inverter develops a near sinusoidal approximation voltage waveform with only one switching per cycle as the number of levels, M, is increased. The inverter may have either single-phase or multi-phase embodiments connected in either wye or delta configurations.

  9. Miniature x-ray source

    DOE Patents [OSTI]

    Trebes, James E.; Bell, Perry M.; Robinson, Ronald B.

    2000-01-01

    A miniature x-ray source utilizing a hot filament cathode. The source has a millimeter scale size and is capable of producing broad spectrum x-ray emission over a wide range of x-ray energies. The miniature source consists of a compact vacuum tube assembly containing the hot filament cathode, an anode, a high voltage feedthru for delivering high voltage to the cathode, a getter for maintaining high vacuum, a connector for initial vacuum pump down and crimp-off, and a high voltage connection for attaching a compact high voltage cable to the high voltage feedthru. At least a portion of the vacuum tube wall is fabricated from highly x-ray transparent materials, such as sapphire, diamond, or boron nitride.

  10. Miniature x-ray source

    DOE Patents [OSTI]

    Trebes, James E.; Stone, Gary F.; Bell, Perry M.; Robinson, Ronald B.; Chornenky, Victor I.

    2002-01-01

    A miniature x-ray source capable of producing broad spectrum x-ray emission over a wide range of x-ray energies. The miniature x-ray source comprises a compact vacuum tube assembly containing a cathode, an anode, a high voltage feedthru for delivering high voltage to the anode, a getter for maintaining high vacuum, a connection for an initial vacuum pump down and crimp-off, and a high voltage connection for attaching a compact high voltage cable to the high voltage feedthru. At least a portion of the vacuum tube wall is highly x-ray transparent and made, for example, from boron nitride. The compact size and potential for remote operation allows the x-ray source, for example, to be placed adjacent to a material sample undergoing analysis or in proximity to the region to be treated for medical applications.

  11. SOURCE PHENOMENOLOGY EXPERIMENTS IN ARIZONA

    SciTech Connect (OSTI)

    Jessie L. Bonner; Brian Stump; Mark Leidig; Heather Hooper; Xiaoning Yang; Rongmao Zhou; Tae Sung Kim; William R. Walter; Aaron Velasco; Chris Hayward; Diane Baker; C. L. Edwards; Steven Harder; Travis Glenn; Cleat Zeiler; James Britton; James F. Lewkowicz

    2005-09-30

    The Arizona Source Phenomenology Experiments (SPE) have resulted in an important dataset for the nuclear monitoring community. The 19 dedicated single-fired explosions and multiple delay-fired mining explosions were recorded by one of the most densely instrumented accelerometer and seismometer arrays ever fielded, and the data have already proven useful in quantifying confinement and excitation effects for the sources. It is very interesting to note that we have observed differences in the phenomenology of these two series of explosions resulting from the differences between the relatively slow (limestone) and fast (granodiorite) media. We observed differences at the two SPE sites in the way the rock failed during the explosions, how the S-waves were generated, and the amplitude behavior as a function of confinement. Our consortium's goal is to use the synergy of the multiple datasets collected during this experiment to unravel the phenomenological differences between the two emplacement media. The data suggest that the main difference between single-fired chemical and delay-fired mining explosion seismograms at regional distances is the increased surface wave energy for the latter source type. The effect of the delay-firing is to decrease the high-frequency P-wave amplitudes while increasing the surface wave energy because of the longer source duration and spall components. The results suggest that the single-fired explosions are surrogates for nuclear explosions in higher frequency bands (e.g., 6-8 Hz Pg/Lg discriminants). We have shown that the SPE shots, together with the mining explosions, are efficient sources of S-wave energy, and our next research stage is to postulate the possible sources contributing to the shear-wave energy.

  12. Energy Sources | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Sources Energy Sources June 6, 2016 Installing a concentrating solar power system in Gila Bend, Arizona. The curved mirrors are tilted toward the sun, focusing sunlight on tubes that run the length of the mirrors. The reflected sunlight heats a fluid flowing through the tubes. The hot fluid then is used to boil water in a conventional steam-turbine generator to produce electricity. | Photo by Dennis Schroeder. Top 6 Things You Didn't Know About Solar Energy Counting down our list of top things

  13. Sensor/source electrometer circuit

    SciTech Connect (OSTI)

    Hughes, W.J.

    1991-12-31

    A multiple decade electrometer circuit is claimed which can measure low input currents or act as a current source and is comprised of a microprocessor controlled digital to analog converters to derive individual decades. A plurality of decades are created by multiple D-A voltage sources which generate electrometer currents through scaled resistors. After a first series of decades of current are successively produced, the converters are 10 cycled to generate current through new resistors scaled to produce another series decades of current. In this manner, the electrometer circuit generates or senses a plurality of decades of current without significant scale change.

  14. Introduction to APS | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Introduction to APS What is the APS? What is the APS? The Advanced Photon Source is a synchrotron light source that produces high-energy, high-brightness x-ray beams. The source is...

  15. Property:HeatSource | Open Energy Information

    Open Energy Info (EERE)

    HeatSource Jump to: navigation, search Property Name HeatSource Property Type String Description A description of the resource heat source in the geothermal area. Describes what...

  16. EPA Source Reduction Assistance Grant Program

    Broader source: Energy.gov [DOE]

    The U.S. Environmental Protection Agency (EPA) is accepting applications for the Source Reduction Assistance Grant Program to support pollution prevention/source reduction and/or resource conservation projects that reduce or eliminate pollution at the source.

  17. Focused X-ray source

    DOE Patents [OSTI]

    Piestrup, M.A.; Boyers, D.G.; Pincus, C.I.; Maccagno, P.

    1990-08-21

    Disclosed is an intense, relatively inexpensive X-ray source (as compared to a synchrotron emitter) for technological, scientific, and spectroscopic purposes. A conical radiation pattern produced by a single foil or stack of foils is focused by optics to increase the intensity of the radiation at a distance from the conical radiator. 8 figs.

  18. Focused X-ray source

    DOE Patents [OSTI]

    Piestrup, Melvin A.; Boyers, David G.; Pincus, Cary I.; Maccagno, Pierre

    1990-01-01

    An intense, relatively inexpensive X-ray source (as compared to a synchrotron emitter) for technological, scientific, and spectroscopic purposes. A conical radiation pattern produced by a single foil or stack of foils is focused by optics to increase the intensity of the radiation at a distance from the conical radiator.

  19. CALUTRON ION SOURCE SLIT CLEANER

    DOE Patents [OSTI]

    Starr, A.M.

    1959-08-25

    >An apparatus is described for removing deposits from the beam forming slits of the source without affecting the vacuum. A scraper element having a configuration conforming to the cross section of the slit is posttioned therein, and linkage is provided for moving the scraper along the slit and for retracting the scraper to one end during normal operation.

  20. National Synchrotron Light Source II

    ScienceCinema (OSTI)

    Steve Dierker

    2010-01-08

    The National Synchrotron Light Source II (NSLS-II) at the U.S. Department of Energy's Brookhaven National Laboratory is a proposed new state-of-the-art medium energy storage ring designed to deliver world-leading brightness and flux with top-off operation

  1. Reporting of Radioactive Sealed Sources

    Broader source: Directives, Delegations, and Requirements [Office of Management (MA)]

    2008-02-27

    To establish U.S. Department of Energy requirements for inventory reporting, transaction reporting, verification of reporting, and assign responsibilities for reporting of radioactive sealed sources. DOE N 251.86 extends this notice until 5-6-11. No cancellations. Canceled by DOE O 231.1B

  2. Miniaturized cathodic arc plasma source

    DOE Patents [OSTI]

    Anders, Andre; MacGill, Robert A.

    2003-04-15

    A cathodic arc plasma source has an anode formed of a plurality of spaced baffles which extend beyond the active cathode surface of the cathode. With the open baffle structure of the anode, most macroparticles pass through the gaps between the baffles and reflect off the baffles out of the plasma stream that enters a filter. Thus the anode not only has an electrical function but serves as a prefilter. The cathode has a small diameter, e.g. a rod of about 1/4 inch (6.25 mm) diameter. Thus the plasma source output is well localized, even with cathode spot movement which is limited in area, so that it effectively couples into a miniaturized filter. With a small area cathode, the material eroded from the cathode needs to be replaced to maintain plasma production. Therefore, the source includes a cathode advancement or feed mechanism coupled to cathode rod. The cathode also requires a cooling mechanism. The movable cathode rod is housed in a cooled metal shield or tube which serves as both a current conductor, thus reducing ohmic heat produced in the cathode, and as the heat sink for heat generated at or near the cathode. Cooling of the cathode housing tube is done by contact with coolant at a place remote from the active cathode surface. The source is operated in pulsed mode at relatively high currents, about 1 kA. The high arc current can also be used to operate the magnetic filter. A cathodic arc plasma deposition system using this source can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

  3. Alternative Water Sources Map | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Facilities Water Efficiency Alternative Water Sources Map Alternative Water Sources Map The Federal Energy Management Program (FEMP) created the Alternative Water Map to ...

  4. Agri Source Fuels | Open Energy Information

    Open Energy Info (EERE)

    search Name: Agri-Source Fuels Place: Pensacola, Florida Zip: 32505 Product: Biodiesel producer located in Florida that owns a plant in Dade City. References: Agri-Source...

  5. Open Source Strategy | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    What are the benefits of open source software?The open source approach to software development engages a community of interested users and developers in a collaborative ...

  6. Open Source Software | Argonne National Laboratory

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Open Source Software TDC encourages Argonne authors to post on the GitHub platform to facilitate transfer of open source software.

  7. APS Organization Chart | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    APS Organization Chart The Advanced Photon Source (APS) organization comprises three divisions and one project office. Advanced Photon Source Organization Photon Sciences Overview...

  8. Power Sources Inc | Open Energy Information

    Open Energy Info (EERE)

    Sources Inc Jump to: navigation, search Name: Power Sources Inc. Place: Charlotte, North Carolina Sector: Biomass Product: US-based operator and developer of biomass-to-energy...

  9. Blue Source LLC | Open Energy Information

    Open Energy Info (EERE)

    Source LLC Jump to: navigation, search Name: Blue Source LLC Place: Salt Lake City, Utah Zip: 84121 Product: Salt Lake City-based emission offset aggregation company. References:...

  10. Alternative Water Sources Map | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Facilities Water Efficiency Alternative Water Sources Map Alternative Water Sources Map The Federal Energy Management Program (FEMP) created the Alternative Water Map to...

  11. Source Selection Guide | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Source Selection Guide PDF icon Source Selection Guide More Documents & Publications Acquisition Guide Chapter 50.1- Extraordinary Contractual Actions (January 2009) Chapter...

  12. Alternative Energy Sources Inc | Open Energy Information

    Open Energy Info (EERE)

    Sources Inc Jump to: navigation, search Name: Alternative Energy Sources Inc Place: Kansas City, Missouri Zip: 64108 Product: Kansas City-based company that constructs, owns and...

  13. Ground Source Solutions | Open Energy Information

    Open Energy Info (EERE)

    Kingdom Zip: NG22 9GW Sector: Buildings Product: UK-based installer of ground source energy systems to domestic and commercial buildings. References: Ground Source...

  14. Source Geometric Considerations for OMEGA Dante Measurements...

    Office of Scientific and Technical Information (OSTI)

    Source Geometric Considerations for OMEGA Dante Measurements Citation Details In-Document Search Title: Source Geometric Considerations for OMEGA Dante Measurements You are...

  15. X-ray lithography source

    DOE Patents [OSTI]

    Piestrup, M.A.; Boyers, D.G.; Pincus, C.

    1991-12-31

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits is disclosed. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and eliminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an excellent moderate-priced X-ray source for lithography. 26 figures.

  16. X-ray lithography source

    DOE Patents [OSTI]

    Piestrup, Melvin A.; Boyers, David G.; Pincus, Cary

    1991-01-01

    A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

  17. Safety Around Sources of Radiation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Keeping Exposure Low Working Safely Around Radioactive Contamination Types of Radiation Exposure Managing Radiation Emergencies Procedure Demonstration Is it safe to be around sources? Too much radiation exposure is harmful. The degree of radiation injury depends on the amount of radiation received and the time involved. In general, the higher the amount, the greater the severity of early effects (occurring within a few weeks) and the greater the possibility of late effects such as cancer. The

  18. Next Generation Light Source Workshops

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Next Generation Light Source Workshops A series of workshops will be held in late August with the goal of refining the scientific drivers for the facility and translating the scientific needs into the technical performance requirements. Feedback from these workshops will provide important input for advancing the design of the facility. Workshops are planned in the following areas Fundamental Atomic, Molecular, Optical Physics & Combustion Dynamics Mon. Aug. 20 - Tues. Aug 21, 2012 Physical

  19. ION SOURCE FOR A CALUTRON

    DOE Patents [OSTI]

    Backus, J.G.

    1957-12-24

    This patent relates to ion sources and more particularly describes an ion source for a calutron which has the advantage of efficient production of an ion beam and long operation time without recharging. The source comprises an arc block provided with an arc chamber connected to a plurality of series-connected charge chambers and means for heating the charge within the chambers. A cathode is disposed at one end of the arc chamber and enclosed hy a vapor tight housing to protect the cathode. The arc discharge is set up between the cathode and the block due to a difference in potentials placed on these parts, and a magnetic field is aligned with the arc discharge. Cooling of the arc block is accomplished by passing coolant through a hollow stem secured at one end to the block and rotatably mounted at the other end through the wall of the calutron. The ions are removed through a slit in the arc chamber by accelerating electrodes.

  20. ILC Electron Source Injector Simuations

    SciTech Connect (OSTI)

    Lakshmanan, Manu; /Cornell U., LNS /SLAC

    2007-08-29

    As part of the global project aimed at proposing an efficient design for the ILC (International Linear Collider), we simulated possible setups for the electron source injector, which will provide insight into how the electron injector for the ILC should be designed in order to efficiently accelerate the electron beams through the bunching system. This study uses three types of software: E-Gun to simulate electron beam emission, Superfish to calculate solenoidal magnetic fields, and GPT (General Particle Tracer) to trace charged particles after emission through magnetic fields and subharmonic bunchers. We performed simulations of the electron source injector using various electron gun bias voltages (140kV - 200kV), emitted beam lengths (500ps - 1ns) and radii (7mm - 10mm), and electromagnetic field strengths of the first subharmonic buncher (5 - 20 MV/m). The results of the simulations show that for the current setup of the ILC, a modest electron gun bias voltage ({approx}140kV) is sufficient to achieve the required bunching of the beam in the injector. Extensive simulations of parameters also involving the second subharmonic buncher should be performed in order to gain more insight into possible efficient designs for the ILC electron source injector.

  1. Best Management Practice #14: Alternative Water Sources

    Office of Energy Efficiency and Renewable Energy (EERE)

    Many federal facilities may have water uses that can be met with non-potable water from alternative water sources. Potentially available alternative water sources for Federal sources include municipal-supplied reclaimed water, treated gray water from on-site sanitary sources, and storm water.

  2. National Synchrotron Light Source Activity Report 1998

    SciTech Connect (OSTI)

    Rothman, Eva

    1999-05-01

    National Synchrotron Light Source Activity Report for period October 1, 1997 through September 30, 1998

  3. Compact x-ray source and panel

    DOE Patents [OSTI]

    Sampayon, Stephen E.

    2008-02-12

    A compact, self-contained x-ray source, and a compact x-ray source panel having a plurality of such x-ray sources arranged in a preferably broad-area pixelized array. Each x-ray source includes an electron source for producing an electron beam, an x-ray conversion target, and a multilayer insulator separating the electron source and the x-ray conversion target from each other. The multi-layer insulator preferably has a cylindrical configuration with a plurality of alternating insulator and conductor layers surrounding an acceleration channel leading from the electron source to the x-ray conversion target. A power source is connected to each x-ray source of the array to produce an accelerating gradient between the electron source and x-ray conversion target in any one or more of the x-ray sources independent of other x-ray sources in the array, so as to accelerate an electron beam towards the x-ray conversion target. The multilayer insulator enables relatively short separation distances between the electron source and the x-ray conversion target so that a thin panel is possible for compactness. This is due to the ability of the plurality of alternating insulator and conductor layers of the multilayer insulators to resist surface flashover when sufficiently high acceleration energies necessary for x-ray generation are supplied by the power source to the x-ray sources.

  4. Gamma source for active interrogation

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Lou, Tak Pui; Barletta, William A.

    2012-10-02

    A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360.degree. and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.

  5. Compact ion source neutron generator

    DOE Patents [OSTI]

    Schenkel, Thomas; Persaud, Arun; Kapadia, Rehan; Javey, Ali; Chang-Hasnain, Constance; Rangelow, Ivo; Kwan, Joe

    2015-10-13

    A neutron generator includes a conductive substrate comprising a plurality of conductive nanostructures with free-standing tips and a source of an atomic species to introduce the atomic species in proximity to the free-standing tips. A target placed apart from the substrate is voltage biased relative to the substrate to ionize and accelerate the ionized atomic species toward the target. The target includes an element capable of a nuclear fusion reaction with the ionized atomic species to produce a one or more neutrons as a reaction by-product.

  6. Charge exchange molecular ion source

    DOE Patents [OSTI]

    Vella, Michael C.

    2003-06-03

    Ions, particularly molecular ions with multiple dopant nucleons per ion, are produced by charge exchange. An ion source contains a minimum of two regions separated by a physical barrier and utilizes charge exchange to enhance production of a desired ion species. The essential elements are a plasma chamber for production of ions of a first species, a physical separator, and a charge transfer chamber where ions of the first species from the plasma chamber undergo charge exchange or transfer with the reactant atom or molecules to produce ions of a second species. Molecular ions may be produced which are useful for ion implantation.

  7. The RHIC polarized source upgrade

    SciTech Connect (OSTI)

    Zelenski, A.; Atoian, G.; Davydenko, V.; Ivanov, A.; Kolmogorov, A.; Ritter, J.; Steski, D.; Zubets, V.

    2010-09-27

    The RHIC polarized H{sup -} ion source is being upgraded to higher intensity (5-10 mA) and polarization for use in the RHIC polarization physics program at enhanced luminosity RHIC operation. The higher beam peak intensity will allow reduction of the transverse beam emittance at injection to AGS to reduce polarization losses in AGS. There is also a planned RHIC luminosity upgrade by using the electron beam lens to compensate the beam-beam interaction at collision points. This upgrade is also essential for future BNL plans for a high-luminosity electron - proton (ion) Collider eRHIC.

  8. Gamma source for active interrogation

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Lou, Tak Pui; Barletta, William A.

    2009-09-29

    A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360.degree. and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.

  9. Relating to monitoring ion sources

    DOE Patents [OSTI]

    Orr, Christopher Henry; Luff, Craig Janson; Dockray, Thomas; Macarthur, Duncan Whittemore; Bounds, John Alan

    2002-01-01

    The apparatus and method provide techniques for monitoring the position on alpha contamination in or on items or locations. The technique is particularly applicable to pipes, conduits and other locations to which access is difficult. The technique uses indirect monitoring of alpha emissions by detecting ions generated by the alpha emissions. The medium containing the ions is moved in a controlled manner frog in proximity with the item or location to the detecting unit and the signals achieved over time are used to generate alpha source position information.

  10. CHINA SPALLATION NEUTRON SOURCE DESIGN.

    SciTech Connect (OSTI)

    WEI,J.

    2007-01-29

    The China Spallation Neutron Source (CSNS) is an accelerator-based high-power project currently in preparation under the direction of the Chinese Academy of Sciences (CAS). The complex is based on an H- linear accelerator, a rapid cycling proton synchrotron accelerating the beam to 1.6 GeV, a solid tungsten target station, and five initial instruments for spallation neutron applications. The facility will operate at 25 Hz repetition rate with a phase-I beam power of about 120 kW. The major challenge is to build a robust and reliable user's facility with upgrade potential at a fractional of ''world standard'' cost.

  11. SOURCE OF MICROBUNCHING AT BNL NSLS SOURCE DEVELOPMENT LABORATORY

    SciTech Connect (OSTI)

    Seletskiy, S.; Hidaka, Y.; Murphy, J.B.; Podobedov, B.; Qian, H.; Shen, Y.; Wang, J.; Yang, X.

    2011-03-28

    We report experimental studies of the origins of electron beam microbunching instability at BNL Source Development Laboratory (SDL). We eliminated laser-induced microbunching by utilizing an ultra-short photocathode laser. The measurements of the resulting electron beam led us to conclude that, at SDL, microbunching arising from shot noise is not amplified to any significant level. Our results demonstrated that the only source of microbunching instability at SDL is the longitudinal modulation of the photocathode laser pulse. Our work shows that assuring a longitudinally smoothed photocathode laser pulse allows mitigating microbunching instability at a typical FEL injector with a moderate microbunching gain. In this paper we investigated the source of microbunching instability at the SDL. To distinguish microbunching induced by shot noise from that arising from the longitudinal modulation of the photocathode laser, we studied the beam created by a very short laser pulse, thus eliminating the possibility of laser-induced microbunching. While the measured energy spectra of compressed beam did reveal severe longitudinal fragmentation, an analysis of the beam dynamics proved this to be due to self-fields acting on a beam with an initially smooth longitudinal profile, and not due to microbunching instability. Such fragmentation only was possible with the very short bunch chosen for these studies, and is absent in routine SDL operations. Our experiment shows that in the absence of the initial laser-induced beam modulation, microbunching instability at the SDL is not observed, and must be well below the levels that would limit the FEL performance. This result agrees with assumption of previous SDL studies that (when present under different machine conditions) microbunching instability at the SDL was laser-induced. Microbunching instability gain at the SDL is moderate. This is mainly because the SDL utilizes a single stage bunch compressor as well as due to the small

  12. Detecting fission from special nuclear material sources

    DOE Patents [OSTI]

    Rowland, Mark S.; Snyderman, Neal J.

    2012-06-05

    A neutron detector system for discriminating fissile material from non-fissile material wherein a digital data acquisition unit collects data at high rate, and in real-time processes large volumes of data directly into information that a first responder can use to discriminate materials. The system comprises counting neutrons from the unknown source and detecting excess grouped neutrons to identify fission in the unknown source. The system includes a graphing component that displays the plot of the neutron distribution from the unknown source over a Poisson distribution and a plot of neutrons due to background or environmental sources. The system further includes a known neutron source placed in proximity to the unknown source to actively interrogate the unknown source in order to accentuate differences in neutron emission from the unknown source from Poisson distributions and/or environmental sources.

  13. Multi-source ion funnel

    DOE Patents [OSTI]

    Tang, Keqi; Belov, Mikhail B.; Tolmachev, Aleksey V.; Udseth, Harold R.; Smith, Richard D.

    2005-12-27

    A method for introducing ions generated in a region of relatively high pressure into a region of relatively low pressure by providing at least two electrospray ion sources, providing at least two capillary inlets configured to direct ions generated by the electrospray sources into and through each of the capillary inlets, providing at least two sets of primary elements having apertures, each set of elements having a receiving end and an emitting end, the primary sets of elements configured to receive a ions from the capillary inlets at the receiving ends, and providing a secondary set of elements having apertures having a receiving end and an emitting end, the secondary set of elements configured to receive said ions from the emitting end of the primary sets of elements and emit said ions from said emitting end of the secondary set of elements. The method may further include the step of providing at least one jet disturber positioned within at least one of the sets of primary elements, providing a voltage, such as a dc voltage, in the jet disturber, thereby adjusting the transmission of ions through at least one of the sets of primary elements.

  14. Fluid jet electric discharge source

    DOE Patents [OSTI]

    Bender, Howard A.

    2006-04-25

    A fluid jet or filament source and a pair of coaxial high voltage electrodes, in combination, comprise an electrical discharge system to produce radiation and, in particular, EUV radiation. The fluid jet source is composed of at least two serially connected reservoirs, a first reservoir into which a fluid, that can be either a liquid or a gas, can be fed at some pressure higher than atmospheric and a second reservoir maintained at a lower pressure than the first. The fluid is allowed to expand through an aperture into a high vacuum region between a pair of coaxial electrodes. This second expansion produces a narrow well-directed fluid jet whose size is dependent on the size and configuration of the apertures and the pressure used in the reservoir. At some time during the flow of the fluid filament, a high voltage pulse is applied to the electrodes to excite the fluid to form a plasma which provides the desired radiation; the wavelength of the radiation being determined by the composition of the fluid.

  15. Repatriation of US sources from Brazil

    SciTech Connect (OSTI)

    Tompkins, Andrew J

    2008-01-01

    IAEA's interest in excess and unwanted sealed sources extends back to when radium sources were a problem throughout the world. Sta11ing in 1994, world wide IAEA member states inventoried and consolidated radium (Ra)-226 sources. IAEA then trained Regional Teams in the conditioning of Ra-226 sealed sources for long term storage, which resulted in the Regional Teams conditioning about 14,000 radium sources. These sources remained in their respective IAEA member state locations. Regional teams were seen as a way to encourage member state (local) management of a world wide problem, as well as a more cost effective solution.

  16. Liquid metal ion source and alloy

    DOE Patents [OSTI]

    Clark, Jr., William M.; Utlaut, Mark W.; Behrens, Robert G.; Szklarz, Eugene G.; Storms, Edmund K.; Santandrea, Robert P.; Swanson, Lynwood W.

    1988-10-04

    A liquid metal ion source and alloy, wherein the species to be emitted from the ion source is contained in a congruently vaporizing alloy. In one embodiment, the liquid metal ion source acts as a source of arsenic, and in a source alloy the arsenic is combined with palladium, preferably in a liquid alloy having a range of compositions from about 24 to about 33 atomic percent arsenic. Such an alloy may be readily prepared by a combustion synthesis technique. Liquid metal ion sources thus prepared produce arsenic ions for implantation, have long lifetimes, and are highly stable in operation.

  17. Solenoid and monocusp ion source

    DOE Patents [OSTI]

    Brainard, John Paul; Burns, Erskine John Thomas; Draper, Charles Hadley

    1997-01-01

    An ion source which generates hydrogen ions having high atomic purity incorporates a solenoidal permanent magnets to increase the electron path length. In a sealed envelope, electrons emitted from a cathode traverse the magnetic field lines of a solenoid and a monocusp magnet between the cathode and a reflector at the monocusp. As electrons collide with gas, the molecular gas forms a plasma. An anode grazes the outer boundary of the plasma. Molecular ions and high energy electrons remain substantially on the cathode side of the cusp, but as the ions and electrons are scattered to the aperture side of the cusp, additional collisions create atomic ions. The increased electron path length allows for smaller diameters and lower operating pressures.

  18. Solenoid and monocusp ion source

    DOE Patents [OSTI]

    Brainard, J.P.; Burns, E.J.T.; Draper, C.H.

    1997-10-07

    An ion source which generates hydrogen ions having high atomic purity incorporates a solenoidal permanent magnets to increase the electron path length. In a sealed envelope, electrons emitted from a cathode traverse the magnetic field lines of a solenoid and a monocusp magnet between the cathode and a reflector at the monocusp. As electrons collide with gas, the molecular gas forms a plasma. An anode grazes the outer boundary of the plasma. Molecular ions and high energy electrons remain substantially on the cathode side of the cusp, but as the ions and electrons are scattered to the aperture side of the cusp, additional collisions create atomic ions. The increased electron path length allows for smaller diameters and lower operating pressures. 6 figs.

  19. Conventional power sources for colliders

    SciTech Connect (OSTI)

    Allen, M.A.

    1987-07-01

    At SLAC we are developing high peak-power klystrons to explore the limits of use of conventional power sources in future linear colliders. In an experimental tube we have achieved 150 MW at 1 ..mu..sec pulse width at 2856 MHz. In production tubes for SLAC Linear Collider (SLC) we routinely achieve 67 MW at 3.5 ..mu..sec pulse width and 180 pps. Over 200 of the klystrons are in routine operation in SLC. An experimental klystron at 8.568 GHz is presently under construction with a design objective of 30 MW at 1 ..mu..sec. A program is starting on the relativistic klystron whose performance will be analyzed in the exploration of the limits of klystrons at very short pulse widths.

  20. Sources Sought | National Nuclear Security Administration

    National Nuclear Security Administration (NNSA)

    Sought Synopsis was issued on FedConnect.gov on September 9, 2013 under Reference No. DE-SOL-0005982. Sources Sought Modification 1 was issued on September 10, 2013. Sources...

  1. Complex-Wide Strategic Sourcing- Update

    Broader source: Energy.gov [DOE]

    Policy Flash 2008-03 transmitted information on the enhanced strategic sourcing website as well as an order of precedence for considering the use of strategic sourcing agreements first. Policy...

  2. Manhattan Project: A Note on Sources

    Office of Scientific and Technical Information (OSTI)

    A NOTE ON SOURCES Resources > Note on Sources The text for this web site is a combination of original material and adaptations from previous publications of the Department of ...

  3. Driver circuit for solid state light sources

    DOE Patents [OSTI]

    Palmer, Fred; Denvir, Kerry; Allen, Steven

    2016-02-16

    A driver circuit for a light source including one or more solid state light sources, a luminaire including the same, and a method of so driving the solid state light sources are provided. The driver circuit includes a rectifier circuit that receives an alternating current (AC) input voltage and provides a rectified AC voltage. The driver circuit also includes a switching converter circuit coupled to the light source. The switching converter circuit provides a direct current (DC) output to the light source in response to the rectified AC voltage. The driver circuit also includes a mixing circuit, coupled to the light source, to switch current through at least one solid state light source of the light source in response to each of a plurality of consecutive half-waves of the rectified AC voltage.

  4. Vermont Source Testing Review | Open Energy Information

    Open Energy Info (EERE)

    ReviewLegal Abstract This form initiates the review and approval process for required studies and testing to be conducted on source(s) to serve Proposed or Existing Public...

  5. Colorado Nonpoint Source Website | Open Energy Information

    Open Energy Info (EERE)

    Source Website Jump to: navigation, search OpenEI Reference LibraryAdd to library Web Site: Colorado Nonpoint Source Website Abstract This is the website of the Colorado...

  6. Insertion Devices & Brilliance | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    light sources. Some, like the Advanced Light Source in California and the SuperACO in France, provide radiation in the ultravioletsoft x-ray part of the spectrum. The 7-GeV APS...

  7. Problems with packaged sources in foreign countries

    SciTech Connect (OSTI)

    Abeyta, Cristy L; Matzke, James L; Zarling, John; Tompkin, J. Andrew

    2010-01-01

    The Global Threat Reduction Initiative's (GTRI) Off-Site Source Recovery Project (OSRP), which is administered by the Los Alamos National Laboratory (LANL), removes excess, unwanted, abandoned, or orphan radioactive sealed sources that pose a potential threat to national security, public health, and safety. In total, GTRI/OSRP has been able to recover more than 25,000 excess and unwanted sealed sources from over 825 sites. In addition to transuranic sources, the GTRI/OSRP mission now includes recovery of beta/gamma emitting sources, which are of concern to both the U.S. government and the International Atomic Energy Agency (IAEA). This paper provides a synopsis of cooperative efforts in foreign countries to remove excess and unwanted sealed sources by discussing three topical areas: (1) The Regional Partnership with the International Atomic Energy Agency; (2) Challenges in repatriating sealed sources; and (3) Options for repatriating sealed sources.

  8. ThermaSource Inc | Open Energy Information

    Open Energy Info (EERE)

    ThermaSource Inc Jump to: navigation, search Name: ThermaSource Inc Place: Santa Rosa, California Zip: 95403 Sector: Geothermal energy, Services Product: A US-based company...

  9. Manhattan Project: A Note on Sources

    Office of Scientific and Technical Information (OSTI)

    A NOTE ON SOURCES Resources > Note on Sources The text for this web site is a combination ... To the best of our knowledge, all text and images on this web site are in the public ...

  10. Ground Source Heat Pump Subprogram Overview

    Broader source: Energy.gov [DOE]

    This overview of GTP's Ground Source Heat Pump subprogram was given at GTP's Program Peer Review on May 18, 2010.

  11. Laser-Compton Light Source Technology

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    mega ray Laser-Compton Light Source Technology Laser-Compton light source technology enables production of mono-energetic gamma rays and x rays. In the gamma-ray regime, these sources enable new, isotope-specific nuclear materials detection systems and photon-based study of nuclear processes (nuclear photonics). Laser-Compton light sources and related nuclear missions concepts were conceived of and realized over the course of the last decade at LLNL. Created by Compton scattering short-duration

  12. Seeding Coherent Radiation Sources with Sawtooth Modulation ...

    Office of Scientific and Technical Information (OSTI)

    HARMONICS; INSTABILITY; MODULATION; PERFORMANCE; PHASE SPACE; POLARIZATION; RADIATION SOURCES; SATURATION; SEEDS; WAVE FORMS; WAVELENGTHS Accelerators,ACCPHY, SYNCHRAD, XFEL

  13. Memorandum, Reporting of Radiological Sealed Sources Transactions

    Broader source: Energy.gov [DOE]

    The requirements for reporting transactions involving radiological sealed sources are identified in Department of Energy (DOE) Notice (N) 234.1, Reporting of Radioactive Sealed Sources. The data reported in accordance with DOE N 234.1 are maintained in the DOE Radiological Source Registry and Tracking (RSRT) database by the Office of Information Management, within the Office of Environment, Health, Safety and Security.

  14. Backup power sources for DOE facilities

    SciTech Connect (OSTI)

    Not Available

    1994-09-01

    This standard establishes fundamental requirements and guidance for backup power sources at DOE facilities. Purpose is to document good engineering practices for installation, testing, and maintenance of these backup power sources, which also covers emergency power sources. Examples are those which supply power to nuclear safety systems, radiation monitors and alarms, fire protection systems, security systems, and emergency lighting.

  15. WAC 173-400-110 - New Source Review for Sources and Portable...

    Open Energy Info (EERE)

    SourcesLegal Abstract Sets forth statutory requirements for review of new sources of air pollution. Published NA Year Signed or Took Effect 2012 Legal Citation WAC...

  16. Ion source based on the cathodic arc

    DOE Patents [OSTI]

    Sanders, D.M.; Falabella, S.

    1994-02-01

    A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated, is described. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles. 3 figures.

  17. Ion source based on the cathodic arc

    DOE Patents [OSTI]

    Sanders, David M. (Livermore, CA); Falabella, Steven (Livermore, CA)

    1994-01-01

    A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles.

  18. High stability wavefront reference source

    DOE Patents [OSTI]

    Feldman, M.; Mockler, D.J.

    1994-05-03

    A thermally and mechanically stable wavefront reference source which produces a collimated output laser beam is disclosed. The output beam comprises substantially planar reference wavefronts which are useful for aligning and testing optical interferometers. The invention receives coherent radiation from an input optical fiber, directs a diverging input beam of the coherent radiation to a beam folding mirror (to produce a reflected diverging beam), and collimates the reflected diverging beam using a collimating lens. In a class of preferred embodiments, the invention includes a thermally and mechanically stable frame comprising rod members connected between a front end plate and a back end plate. The beam folding mirror is mounted on the back end plate, and the collimating lens mounted to the rods between the end plates. The end plates and rods are preferably made of thermally stable metal alloy. Preferably, the input optical fiber is a single mode fiber coupled to an input end of a second single mode optical fiber that is wound around a mandrel fixedly attached to the frame of the apparatus. The output end of the second fiber is cleaved so as to be optically flat, so that the input beam emerging therefrom is a nearly perfect diverging spherical wave. 7 figures.

  19. High stability wavefront reference source

    DOE Patents [OSTI]

    Feldman, Mark; Mockler, Daniel J.

    1994-01-01

    A thermally and mechanically stable wavefront reference source which produces a collimated output laser beam. The output beam comprises substantially planar reference wavefronts which are useful for aligning and testing optical interferometers. The invention receives coherent radiation from an input optical fiber, directs a diverging input beam of the coherent radiation to a beam folding mirror (to produce a reflected diverging beam), and collimates the reflected diverging beam using a collimating lens. In a class of preferred embodiments, the invention includes a thermally and mechanically stable frame comprising rod members connected between a front end plate and a back end plate. The beam folding mirror is mounted on the back end plate, and the collimating lens mounted to the rods between the end plates. The end plates and rods are preferably made of thermally stable metal alloy. Preferably, the input optical fiber is a single mode fiber coupled to an input end of a second single mode optical fiber that is wound around a mandrel fixedly attached to the frame of the apparatus. The output end of the second fiber is cleaved so as to be optically flat, so that the input beam emerging therefrom is a nearly perfect diverging spherical wave.

  20. International workshop on cold neutron sources

    SciTech Connect (OSTI)

    Russell, G.J.; West, C.D. )

    1991-08-01

    The first meeting devoted to cold neutron sources was held at the Los Alamos National Laboratory on March 5--8, 1990. Cosponsored by Los Alamos and Oak Ridge National Laboratories, the meeting was organized as an International Workshop on Cold Neutron Sources and brought together experts in the field of cold-neutron-source design for reactors and spallation sources. Eighty-four people from seven countries attended. Because the meeting was the first of its kind in over forty years, much time was spent acquainting participants with past and planned activities at reactor and spallation facilities worldwide. As a result, the meeting had more of a conference flavor than one of a workshop. The general topics covered at the workshop included: Criteria for cold source design; neutronic predictions and performance; energy deposition and removal; engineering design, fabrication, and operation; material properties; radiation damage; instrumentation; safety; existing cold sources; and future cold sources.

  1. Opportunities for high aspect ratio micro-electro-magnetic-mechanical systems (HAR-MEMMS) at Lawrence Berkeley Laboratory

    SciTech Connect (OSTI)

    Hunter, S.

    1993-10-01

    This report contains viewgraphs on the following topics: Opportunities for HAR-MEMMS at LBL; Industrial Needs and Opportunities; Deep Etch X-ray Lithography; MEMS Activities at BSAC; DNA Amplification with Microfabricated Reaction Chamber; Electrochemistry Research at LBL; MEMS Activities at LLNL; Space Microsensors and Microinstruments; The Advanced Light Source; Institute for Micromaching; IBM MEMS Interests; and Technology Transfer Opportunities at LBL.

  2. Spent Sealed Sources Management in Switzerland - 12011

    SciTech Connect (OSTI)

    Beer, H.F.

    2012-07-01

    Information is provided about the international recommendations for the safe management of disused and spent sealed radioactive sources wherein the return to the supplier or manufacturer is encouraged for large radioactive sources. The legal situation in Switzerland is described mentioning the demand of minimization of radioactive waste as well as the situation with respect to the interim storage facility at the Paul Scherrer Institute (PSI). Based on this information and on the market situation with a shortage of some medical radionuclides the management of spent sealed sources is provided. The sources are sorted according to their activity in relation to the nuclide-specific A2-value and either recycled as in the case of high active sources or conditioned as in the case for sources with lower activity. The results are presented as comparison between recycled and conditioned activity for three selected nuclides, i.e. Cs-137, Co-60 and Am-241. (author)

  3. HTGR Mechanistic Source Terms White Paper

    SciTech Connect (OSTI)

    Wayne Moe

    2010-07-01

    The primary purposes of this white paper are: (1) to describe the proposed approach for developing event specific mechanistic source terms for HTGR design and licensing, (2) to describe the technology development programs required to validate the design methods used to predict these mechanistic source terms and (3) to obtain agreement from the NRC that, subject to appropriate validation through the technology development program, the approach for developing event specific mechanistic source terms is acceptable

  4. Promising Technology: Ground Source Heat Pumps

    Broader source: Energy.gov [DOE]

    Ground source heat pumps (GSHP) use the constant temperature of the Earth as the heat exchange medium instead of the outside air temperature. During the winter, a GSHP uses the ground as a heat source to provide heating, and during the summer, a GSHP uses the ground as a heat sink to provide cooling. Although more expensive than air-source heat pumps, GSHP’s are much more efficient, especially in cold temperatures.

  5. Radiation attenuation gauge with magnetically coupled source

    DOE Patents [OSTI]

    Wallace, Steven A.

    1978-01-01

    A radiaton attenuation gauge for measuring thickness and density of a material comprises, in combination, a source of gamma radiation contained within a housing comprising magnetic or ferromagnetic material, and a means for measuring the intensity of gamma radiation. The measuring means has an aperture and magnetic means disposed adjacent to the aperture for attracting and holding the housed source in position before the aperture. The material to be measured is disposed between the source and the measuring means.

  6. Environmental Technology Verification of Mobile Sources Control

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Technologies | Department of Energy Environmental Technology Verification of Mobile Sources Control Technologies Environmental Technology Verification of Mobile Sources Control Technologies 2005 Diesel Engine Emissions Reduction (DEER) Conference Presentations and Posters 2005_deer_elion.pdf (158.94 KB) More Documents & Publications EPA Mobile Source Rule Update Efficient Use of Natural Gas Based Fuels in Heavy-Duty Engines The California Demonstration Program for Control of PM from

  7. Alternative Energy Sources - An Interdisciplinary Module for...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    An Interdisciplinary Module for Energy Education Alternative Energy Sources - An ... Energy Basics, Wind Energy, Solar Summary Find activities focused on renewable energy ...

  8. Mission and Goals | Advanced Photon Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Mission and Goals The mission of the Advanced Photon Source (APS) is to deliver world-class science and technology by operating an outstanding synchrotron radiation research...

  9. Building the World's Most Advanced Light Source

    SciTech Connect (OSTI)

    2012-08-03

    View this time-lapse video showing construction of the National Synchrotron Light Source II at Brookhaven National Laboratory. Construction is shown from 2009-2012.

  10. Prestressed glass, aezoelectric electrical power source

    DOE Patents [OSTI]

    Newson, Melvin M.

    1976-01-01

    An electrical power source which comprises a body of prestressed glass having a piezoelectric transducer supported on the body in direct mechanical coupling therewith.

  11. Controlling NOx emission from industrial sources

    SciTech Connect (OSTI)

    Srivastava, R.K.; Nueffer, W.; Grano, D.; Khan, S.; Staudt, J.E.; Jozewicz, W.

    2005-07-01

    A number of regulatory actions focused on reducing NOx emissions from stationary combustion sources have been taken in the United States in the last decade. These actions include the Acid Rain NOx regulations, the Ozone Transport Commission's NOx Budget Program, and the NOx SIP Call rulemakings. In addition to these regulations, the recent Interstate Air Quality Rulemaking proposal and other bills in the Congress are focusing on additional reductions of NOx. Industrial combustion sources accounted for about 18016 of NOx emissions in the United States in 2000 and constituted the second largest emitting source category within stationary sources, only behind electric utility sources. Based on these data, reduction of NOx emissions from industrial combustion sources is an important consideration in efforts undertaken to address the environmental concerns associated with NOx. This paper discusses primary and secondary NOx control technologies applicable to various major categories of industrial sources. The sources considered in this paper include large boilers, furnaces and fired heaters, combustion turbines, large IC engines, and cement kilns. For each source category considered in this paper, primary NOx controls are discussed first, followed by a discussion of secondary NOx controls.

  12. Green Source Consulting | Open Energy Information

    Open Energy Info (EERE)

    Consulting Jump to: navigation, search Name: Green Source Consulting Place: Wien Vienna, Austria Zip: 1010 Product: Private Austrian project developer with a focus in the Central...

  13. Memorandum, Reporting of Radiological Sealed Sources Transactions...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    The requirements for reporting transactions involving radiological sealed sources are identified in Department of Energy (DOE) Notice (N) 234.1, Reporting of Radioactive Sealed ...

  14. higher penetration of renewable energy sources

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    higher penetration of renewable energy sources - Sandia Energy Energy Search Icon Sandia Home Locations Contact Us Employee Locator Energy & Climate Secure & Sustainable Energy ...

  15. Oregon Nonpoint Source Program Implementation Webpage | Open...

    Open Energy Info (EERE)

    Implementation Webpage Jump to: navigation, search OpenEI Reference LibraryAdd to library Web Site: Oregon Nonpoint Source Program Implementation Webpage Abstract Provides...

  16. ION SOURCE WITH SPACE CHARGE NEUTRALIZATION

    DOE Patents [OSTI]

    Flowers, J.W.; Luce, J.S.; Stirling, W.L.

    1963-01-22

    This patent relates to a space charge neutralized ion source in which a refluxing gas-fed arc discharge is provided between a cathode and a gas-fed anode to provide ions. An electron gun directs a controlled, monoenergetic electron beam through the discharge. A space charge neutralization is effected in the ion source and accelerating gap by oscillating low energy electrons, and a space charge neutralization of the source exit beam is effected by the monoenergetic electron beam beyond the source exit end. The neutralized beam may be accelerated to any desired energy at densities well above the limitation imposed by Langmuir-Child' s law. (AEC)

  17. Carbothermic reduction with parallel heat sources

    DOE Patents [OSTI]

    Troup, Robert L.; Stevenson, David T.

    1984-12-04

    Disclosed are apparatus and method of carbothermic direct reduction for producing an aluminum alloy from a raw material mix including aluminum oxide, silicon oxide, and carbon wherein parallel heat sources are provided by a combustion heat source and by an electrical heat source at essentially the same position in the reactor, e.g., such as at the same horizontal level in the path of a gravity-fed moving bed in a vertical reactor. The present invention includes providing at least 79% of the heat energy required in the process by the electrical heat source.

  18. Astronomy Particle Physics Light Sources Genomics

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    1 - 2 Astronomy Particle Physics Light Sources Genomics Climate * Big Data Software - Broad ecosystem of capabilities and technologies - Research and evaluate - Customize and...

  19. Alaska Local Ordinances Governing Nonpoint Source Pollution ...

    Open Energy Info (EERE)

    Not Provided DOI Not Provided Check for DOI availability: http:crossref.org Online Internet link for Alaska Local Ordinances Governing Nonpoint Source Pollution Citation Alaska...

  20. High intensity, pulsed thermal neutron source

    DOE Patents [OSTI]

    Carpenter, J.M.

    1973-12-11

    This invention relates to a high intensity, pulsed thermal neutron source comprising a neutron-producing source which emits pulses of fast neutrons, a moderator block adjacent to the last neutron source, a reflector block which encases the fast neutron source and the moderator block and has a thermal neutron exit port extending therethrough from the moderator block, and a neutron energy- dependent decoupling reflector liner covering the interior surfaces of the thermal neutron exit port and surrounding all surfaces of the moderator block except the surface viewed by the thermal neutron exit port. (Official Gazette)

  1. " Row: NAICS Codes; Column: Energy Sources...

    U.S. Energy Information Administration (EIA) Indexed Site

    Energy Sources","Row" "Code(a)","Subsector and ... 324,"Petroleum and Coal ... Division, Form EIA-810, 'Monthly Refinery Report' for 2002.

  2. Integrating multiple data sources for malware classification

    DOE Patents [OSTI]

    Anderson, Blake Harrell; Storlie, Curtis B; Lane, Terran

    2015-04-28

    Disclosed herein are representative embodiments of tools and techniques for classifying programs. According to one exemplary technique, at least one graph representation of at least one dynamic data source of at least one program is generated. Also, at least one graph representation of at least one static data source of the at least one program is generated. Additionally, at least using the at least one graph representation of the at least one dynamic data source and the at least one graph representation of the at least one static data source, the at least one program is classified.

  3. Open-source extreme conditions modeling tools

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... HomeEnergy, Modeling & Analysis, News, Renewable Energy, Water PowerOpen-source extreme ... numerical tools for use in modeling extreme conditions of wave energy converters (WECs). ...

  4. Capital Sources and Providers | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Capital Sources and Providers Capital Sources and Providers An image of a blue diagram showing an arrow labeled "Lender" pointing to a rectangle labeled "Borrower" with a curved arrow labeled "Repayment" pointing back to "Lender." Another arrow labeled "Capital Sources" also points to the arrow labeled "Lender." The most important elements of a clean energy lending program are the capital source and the capital provider. The capital

  5. An overview of LINAC ion sources

    SciTech Connect (OSTI)

    Keller, Roderich

    2008-01-01

    This paper discusses ion sources used in high-duty-factor proton and H{sup -} Linacs as well as in accelerators utilizing multi-charged heavy ions, mostly for nuclear physics applications. The included types are Electron Cyclotron Resonance (ECR) sources as well as filament and rf driven multicusp sources. The paper does not strive to attain encyclopedic character but rather to highlight major lines of development, peak performance parameters and type-specific limitations and problems of these sources. The main technical aspects being discussed are particle feed, plasma generation and ion production by discharges, and plasma confinement.

  6. Environmental Assessment Radioactive Source Recovery Program

    SciTech Connect (OSTI)

    1995-12-20

    In a response to potential risks to public health and safety, the U.S. Department of Energy (DOE) is evaluating the recovery of sealed neutron sources under the Radioactive Source Recovery Program (RSRP). This proposed program would enhance the DOE`s and the U.S. Nuclear Regulatory Commission`s (NRC`s) joint capabilities in the safe management of commercially held radioactive source materials. Currently there are no federal or commercial options for the recovery, storage, or disposal of sealed neutron sources. This Environmental Assessment (EA) analyzes the potential environmental impacts that would be expected to occur if the DOE were to implement a program for the receipt and recovery at the Los Alamos National Laboratory (LANL), Los Alamos, New Mexico, of unwanted and excess plutonium-beryllium ({sup 238}Pu-Be) and americium-beryllium ({sup 241}Am-Be) sealed neutron sources. About 1 kg (2.2 lb) plutonium and 3 kg (6.6 lb) americium would be recovered over a 15-year project. Personnel at LANL would receive neutron sources from companies, universities, source brokers, and government agencies across the country. These neutron sources would be temporarily stored in floor holes at the CMR Hot Cell Facility. Recovery reduces the neutron emissions from the source material and refers to a process by which: (1) the stainless steel cladding is removed from the neutron source material, (2) the mixture of the radioactive material (Pu-238 or Am-241) and beryllium that constitutes the neutron source material is chemically separated (recovered), and (3) the recovered Pu-238 or Am-241 is converted to an oxide form ({sup 238}PuO{sub 2} or {sup 241}AmO{sub 2}). The proposed action would include placing the {sup 238}PuO{sub 2} or {sup 241}AmO{sub 2} in interim storage in a special nuclear material vault at the LANL Plutonium Facility.

  7. OLED Testing Call for Sources | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    OLED Testing Call for Sources OLED Testing Call for Sources PDF icon OLED Testing Call for Sources - November 2015 More Documents & Publications CX-010821: Categorical Exclusion ...

  8. National Synchrotron Light Source II (NSLS-II) Project | Department...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    National Synchrotron Light Source II (NSLS-II) Project National Synchrotron Light Source II (NSLS-II) Project National Synchrotron Light Source II (NSLS-II) Project Frank ...

  9. Natural Gas Regulation - Other Gas-Related Information Sources...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Natural Gas Regulation - Other Gas-Related Information Sources Natural Gas Regulation - Other Gas-Related Information Sources The single largest source of energy information...

  10. North Village Ground Source Heat Pumps | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    North Village Ground Source Heat Pumps North Village Ground Source Heat Pumps Overview: Installation of Ground Source Heat Pumps. Replacement of Aging Heat Pumps. Alignment with ...

  11. X-ray source safety shutter

    DOE Patents [OSTI]

    Robinet, McLouis

    1977-05-31

    An apparatus is provided for controlling the activation of a high energy radiation source having a shutter. The apparatus includes magnets and magnetically responsive switches appropriately placed and interconnected so that only with the shutter and other parts of the source in proper position can safe emission of radiation out an open shutter occur.

  12. Power conditioning system for energy sources

    DOE Patents [OSTI]

    Mazumder, Sudip K.; Burra, Rajni K.; Acharya, Kaustuva

    2008-05-13

    Apparatus for conditioning power generated by an energy source includes an inverter for converting a DC input voltage from the energy source to a square wave AC output voltage, and a converter for converting the AC output voltage from the inverter to a sine wave AC output voltage.

  13. SOURCE OF PRODUCTS OF NUCLEAR FISSION

    DOE Patents [OSTI]

    Harteck, P.; Dondes, S.

    1960-03-15

    A source of fission product recoil energy suitable for use in radiation chemistry is reported. The source consists of thermal neutron irradiated glass wool having a diameter of 1 to 5 microns and containing an isotope fissionable by thermal neutrons, such as U/sup 235/.

  14. FERMI LARGE AREA TELESCOPE SECOND SOURCE CATALOG

    SciTech Connect (OSTI)

    Nolan, P. L.; Ajello, M.; Allafort, A.; Bechtol, K.; Berenji, B.; Blandford, R. D.; Bloom, E. D.; Abdo, A. A.; Ackermann, M.; Antolini, E.; Bonamente, E.; Atwood, W. B.; Belfiore, A.; Axelsson, M.; Baldini, L.; Bellazzini, R.; Ballet, J.; Bastieri, D.; Bignami, G. F. E-mail: Gino.Tosti@pg.infn.it E-mail: tburnett@u.washington.edu; and others

    2012-04-01

    We present the second catalog of high-energy {gamma}-ray sources detected by the Large Area Telescope (LAT), the primary science instrument on the Fermi Gamma-ray Space Telescope (Fermi), derived from data taken during the first 24 months of the science phase of the mission, which began on 2008 August 4. Source detection is based on the average flux over the 24 month period. The second Fermi-LAT catalog (2FGL) includes source location regions, defined in terms of elliptical fits to the 95% confidence regions and spectral fits in terms of power-law, exponentially cutoff power-law, or log-normal forms. Also included are flux measurements in five energy bands and light curves on monthly intervals for each source. Twelve sources in the catalog are modeled as spatially extended. We provide a detailed comparison of the results from this catalog with those from the first Fermi-LAT catalog (1FGL). Although the diffuse Galactic and isotropic models used in the 2FGL analysis are improved compared to the 1FGL catalog, we attach caution flags to 162 of the sources to indicate possible confusion with residual imperfections in the diffuse model. The 2FGL catalog contains 1873 sources detected and characterized in the 100 MeV to 100 GeV range of which we consider 127 as being firmly identified and 1171 as being reliably associated with counterparts of known or likely {gamma}-ray-producing source classes.

  15. Inductively generated streaming plasma ion source

    DOE Patents [OSTI]

    Glidden, Steven C.; Sanders, Howard D.; Greenly, John B.

    2006-07-25

    A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam. The beam supplies ions for applications requiring excellent control of ion species, low remittance, high current density, and spatial uniformity.

  16. SHIELDING ANALYSIS FOR PORTABLE GAUGING COMBINATION SOURCES

    SciTech Connect (OSTI)

    J. TOMPKINS; L. LEONARD; ET AL

    2000-08-01

    Radioisotopic decay has been used as a source of photons and neutrons for industrial gauging operations since the late 1950s. Early portable moisture/density gauging equipment used Americium (Am)-241/Beryllium (Be)/Cesium (Cs)-137 combination sources to supply the required nuclear energy for gauging. Combination sources typically contained 0.040 Ci of Am-241 and 0.010 Ci of CS-137 in the same source capsule. Most of these sources were manufactured approximately 30 years ago. Collection, transportation, and storage of these sources once removed from their original device represent a shielding problem with distinct gamma and neutron components. The Off-Site Source Recovery (OSR) Project is planning to use a multi-function drum (MFD) for the collection, shipping, and storage of AmBe sources, as well as the eventual waste package for disposal. The MFD is an approved TRU waste container design for DOE TRU waste known as the 12 inch Pipe Component Overpack. As the name indicates, this drum is based on a 12 inch ID stainless steel weldment approximately 25 inch in internal length. The existing drum design allows for addition of shielding within the pipe component up to the 110 kg maximum pay load weight. The 12 inch pipe component is packaged inside a 55-gallon drum, with the balance of the interior space filled with fiberboard dunnage. This packaging geometry is similar to the design of a DOT 6M, Type B shipping container.

  17. Improved Characterization and Monitoring of Electromagnetic Sources -

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Energy Innovation Portal Energy Analysis Energy Analysis Electricity Transmission Electricity Transmission Find More Like This Return to Search Improved Characterization and Monitoring of Electromagnetic Sources Lawrence Livermore National Laboratory Contact LLNL About This Technology Technology Marketing Summary LLNL's technology is useful in fields such as power systems engineering, security monitoring, and vehicle tracking to identify, locate and monitor a particular source of

  18. Microwave-driven ultraviolet light sources

    DOE Patents [OSTI]

    Manos, Dennis M.; Diggs, Jessie; Ametepe, Joseph D.

    2002-01-29

    A microwave-driven ultraviolet (UV) light source is provided. The light source comprises an over-moded microwave cavity having at least one discharge bulb disposed within the microwave cavity. At least one magnetron probe is coupled directly to the microwave cavity.

  19. Beam current controller for laser ion source

    DOE Patents [OSTI]

    Okamura, Masahiro

    2014-10-28

    The present invention relates to the design and use of an ion source with a rapid beam current controller for experimental and medicinal purposes. More particularly, the present invention relates to the design and use of a laser ion source with a magnetic field applied to confine a plasma flux caused by laser ablation.

  20. Portable thermo-photovoltaic power source

    DOE Patents [OSTI]

    Zuppero, Anthony C.; Krawetz, Barton; Barklund, C. Rodger; Seifert, Gary D.

    1997-01-14

    A miniature thermo-photovoltaic (TPV) device for generation of electrical power for use in portable electronic devices. A TPV power source is constructed to provide a heat source chemical reactor capable of using various fuels, such as liquid hydrocarbons, including but not limited to propane, LPG, butane, alcohols, oils and diesel fuels to generate a source of photons. A reflector dish guides misdirected photon energy from the photon source toward a photovoltaic array. A thin transparent protector sheet is disposed between the photon source and the array to reflect back thermal energy that cannot be converted to electricity, and protect the array from thermal damage. A microlens disposed between the protector sheet and the array further focuses the tailored band of photon energy from the photon source onto an array of photovoltaic cells, whereby the photon energy is converted to electrical power. A heat recuperator removes thermal energy from reactor chamber exhaust gases, preferably using mini- or micro-bellows to force air and fuel past the exhaust gases, and uses the energy to preheat the fuel and oxidant before it reaches the reactor, increasing system efficiency. Mini- or micro-bellows force ambient air through the system both to supply oxidant and to provide cooling. Finally, an insulator, which is preferably a super insulator, is disposed around the TPV power source to reduce fuel consumption, and to keep the TPV power source cool to the touch so it can be used in hand-held devices.

  1. Apparatus for safeguarding a radiological source

    SciTech Connect (OSTI)

    Bzorgi, Fariborz M

    2014-10-07

    A tamper detector is provided for safeguarding a radiological source that is moved into and out of a storage location through an access porthole for storage and use. The radiological source is presumed to have an associated shipping container approved by the U.S. Nuclear Regulatory Commission for transporting the radiological source. The tamper detector typically includes a network of sealed tubing that spans at least a portion of the access porthole. There is an opening in the network of sealed tubing that is large enough for passage therethrough of the radiological source and small enough to prevent passage therethrough of the associated shipping cask. Generally a gas source connector is provided for establishing a gas pressure in the network of sealed tubing, and a pressure drop sensor is provided for detecting a drop in the gas pressure below a preset value.

  2. Ion source with external RF antenna

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Ji, Qing; Wilde, Stephen

    2005-12-13

    A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source.

  3. Electrospray ion source with reduced analyte electrochemistry

    DOE Patents [OSTI]

    Kertesz, Vilmos; Van Berkel, Gary J

    2013-07-30

    An electrospray ion (ESI) source and method capable of ionizing an analyte molecule without oxidizing or reducing the analyte of interest. The ESI source can include an emitter having a liquid conduit, a working electrode having a liquid contacting surface, a spray tip, a secondary working electrode, and a charge storage coating covering partially or fully the liquid contacting surface of the working electrode. The liquid conduit, the working electrode and the secondary working electrode can be in liquid communication. The electrospray ion source can also include a counter electrode proximate to, but separated from, said spray tip. The electrospray ion source can also include a power system for applying a voltage difference between the working electrodes and a counter-electrode. The power system can deliver pulsed voltage changes to the working electrodes during operation of said electrospray ion source to minimize the surface potential of the charge storage coating.

  4. Electrospray ion source with reduced analyte electrochemistry

    DOE Patents [OSTI]

    Kertesz, Vilmos [Knoxville, TN; Van Berkel, Gary [Clinton, TN

    2011-08-23

    An electrospray ion (ESI) source and method capable of ionizing an analyte molecule without oxidizing or reducing the analyte of interest. The ESI source can include an emitter having a liquid conduit, a working electrode having a liquid contacting surface, a spray tip, a secondary working electrode, and a charge storage coating covering partially or fully the liquid contacting surface of the working electrode. The liquid conduit, the working electrode and the secondary working electrode can be in liquid communication. The electrospray ion source can also include a counter electrode proximate to, but separated from, said spray tip. The electrospray ion source can also include a power system for applying a voltage difference between the working electrodes and a counter-electrode. The power system can deliver pulsed voltage changes to the working electrodes during operation of said electrospray ion source to minimize the surface potential of the charge storage coating.

  5. Event reconstruction for line source releases

    SciTech Connect (OSTI)

    Zajic, Dragan; Brown, Michael J; Williams, Michael D

    2010-01-01

    The goal of source inversion, also called event reconstruction, is the calculation of source parameters from information obtained by network of concentration (or dosage) and meteorological sensors. Source parameters include source location and strength, but in certain cases there could be more than one source so the inversion procedure could deal with determination of number of sources, as well. In a case of limited time period pollutant emission events, as for example during accidents or intentional releases, it is of great use to estimate starting and ending times of the event. This kind of research is very useful for estimating the source parameters of industrial pollutants since it provides important information for regulation purposes. Also it provides information to fast responders in a case of accidental pollutant releases or for homeland security needs when chemical, biological or radiological agent is deliberately released. Development of faster and more accurate algorithms is very important since it could help reduce the populace's exposure to dangerous airborne contaminants, plan evacuation routes, and help assess the magnitude of clean up. During the last decade, the large number of research papers in area of source inversion was published where many different approaches were used. Most of the source inversion work publish to date apply to point source releases. The forward dispersion models used range from fast Gaussian plume and puff codes that enable almost instantaneous calculations of concentrations and dosages to Computational Fluid Dynamics (CFD) codes that provide more detailed and precise calculation but at the same time are expensive with respect to time and computer resources. The optimization methods were often used and examples are simulated annealing and genetic algorithms.

  6. Report of the Snowmass T4 working group on particle sources: Positron sources, anti-proton sources and secondary beams

    SciTech Connect (OSTI)

    N. Mokhov et al.

    2002-12-05

    This report documents the activities of the Snowmass 2001 T4 Particle Sources Working Group. T4 was charged with examining the most challenging aspects of positron sources for linear colliders and antiproton sources for proton-antiproton colliders, and the secondary beams of interest to the physics community that will be available from the next generation of high-energy particle accelerators. The leading issues, limiting technologies, and most important R and D efforts of positron production, antiproton production, and secondary beams are discussed in this paper. A listing of T4 Presentations is included.

  7. Regulatory Control of Sealed Sources in Germany including Regulations Regarding Spent and Disused Sources - 13176

    SciTech Connect (OSTI)

    Dollan, Ralph; Haeusler, Uwe; Czarwinski, Renate

    2013-07-01

    Effective regulatory control is essential to ensure the safe and secure use of radioactive material and the appropriate management of radioactive waste. To ensure a sustainable control of high radioactive sources, the European Commission published the Council Directive 2003/122/EURATOM on the control of high-activity sealed radioactive sources and orphan sources, which had to be transferred into national legislation by all member states of the European Union. Major requirement of the Directive is a system to ensure traceability of high-activity sealed sources from 'cradle to grave' as well as the provision to take back disused sources by the supplier or manufacturer. With the Act on high-activity sealed radioactive sources Germany implemented the requirements of the Directive 2003/122/EURATOM and established a national registry of high-activity sealed sources in 2006. Currently, about 27.000 high-activity sealed sources are recorded in this national registry. (authors)

  8. Evaluation of a vibration source detection scheme

    SciTech Connect (OSTI)

    Jendrzejczyk, J.A.; Wambsganss, M.W.; Smith, R.K.

    1992-04-01

    When the Advanced Photon Source (APS) facility is commissioned, there will be many potential sources of local ground motion excitation (near-field sources). Some of these may be of sufficient amplitude and at a specific frequency so as to be detrimental to the stability of the storage ring beamline. A sampling of possible sources is as follows: 2500-hp chillers in the utility building; six cooling-tower fans that are powered by 75-hp electric motors; various water circulation pumps; power supplies, controllers, and transformers; and air-handling units and associated fans. To detect equipment that causes excessive ground excitation at a site as large as the APS, it will be necessary to have a validated source detection scheme. When performing low-amplitude vibration testing in and around Building 335 of Argonne National Laboratory (ANL), we observed a cyclic 8-Hz vibration. The cyclic nature of the signal is apparent in Fig. 1, which represents data measured on the floor at the main level of Building 335 on March 31, 1992. A simple vibration source location scheme, based on triangulation, was evaluated as a means to locate the source of the 8-Hz vibration and is the subject of this technical note. 1 ref.

  9. Source storage and transfer cask: Users Guide

    SciTech Connect (OSTI)

    Eccleston, G.W.; Speir, L.G.; Garcia, D.C.

    1985-04-01

    The storage and shield cask for the dual californium source is designed to shield and transport up to 3.7 mg (2 Ci) of /sup 252/Cf. the cask meets Department of Transportation (DOT) license requirements for Type A materials (DOT-7A). The cask is designed to transfer sources to and from the Flourinel and Fuel Storage (FAST) facility delayed-neutron interrogator. Californium sources placed in the cask must be encapsulated in the SR-CF-100 package and attached to Teleflex cables. The cask contains two source locations. Each location contains a gear box that allows a Teleflex cable to be remotely moved by a hand crank into and out of the cask. This transfer procedure permits sources to be easily removed and inserted into the delayed-neutron interrogator and reduces personnel radiation exposure during transfer. The radiation dose rate with the maximum allowable quantity of californium (3.7 mg) in the cask is 30 mR/h at the surface and less than 2 mR/h 1 m from the cask surface. This manual contains information about the cask, californium sources, describes the method to ship the cask, and how to insert and remove sources from the cask. 28 figs.

  10. A new storage-ring light source

    SciTech Connect (OSTI)

    Chao, Alex

    2015-06-01

    A recently proposed technique in storage ring accelerators is applied to provide potential high-power sources of photon radiation. The technique is based on the steady-state microbunching (SSMB) mechanism. As examples of this application, one may consider a high-power DUV photon source for research in atomic and molecular physics or a high-power EUV radiation source for industrial lithography. A less challenging proof-of-principle test to produce IR radiation using an existing storage ring is also considered.

  11. Entropy in an Arc Plasma Source

    SciTech Connect (OSTI)

    Kaminska, A.; Dudeck, M

    2008-03-19

    The entropy properties in a D.C. argon arc plasma source are studied. The local thermodynamical entropy relations are established for a set of uniform sub-systems (Ar, Ar{sup +}, e) in order to deduce the entropy balance equation in presence of dissipative effects and in the case of a thermal non equilibrium. Phenomenological linear laws are deduced in near equilibrium situation. The flow parameters inside the plasma source are calculated by a Navier-Stokes fluid description taking into account a thermal local non equilibrium. The entropy function is calculated in the plasma source using the values of the local variables obtained from the numerical code.

  12. Low temperature ion source for calutrons

    DOE Patents [OSTI]

    Veach, Allen M.; Bell, Jr., William A.; Howell, Jr., George D.

    1981-01-01

    A new ion source assembly for calutrons has been provided for the efficient separation of elements having high vapor pressures. The strategic location of cooling pads and improved insulation permits operation of the source at lower temperatures. A vapor valve constructed of graphite and located in a constantly increasing temperature gradient provides reliable control of the vapor flow from the charge bottle to the arc chamber. A pronounced saving in calutron operating time and equipment maintenance has been achieved with the use of the present ion source.

  13. Low temperature ion source for calutrons

    DOE Patents [OSTI]

    Veach, A.M.; Bell, W.A. Jr.; Howell, G.D. Jr.

    1979-10-10

    A new ion source assembly for calutrons has been provided for the efficient separation of elements having high vapor pressures. The strategic location of cooling pads and improved insulation permits operation of the source at lower temperatures. A vapor valve constructed of graphite and located in a constantly increasing temperature gradient provides reliable control of the vapor flow from the charge bottle to the arc chamber. A pronounced saving in calutron operating time and equipment maintenance has been achieved with the use of the present ion source.

  14. Newtonian Hydrodynamics with Arbitrary Volumetric Sources

    SciTech Connect (OSTI)

    Lowrie, Robert Byron

    2015-11-12

    In this note, we derive how to handle mass, momentum, and energy sources for Newtonian hydrodynamics. Much of this is classic, although we’re unaware of a reference that treats mass sources, necessary for certain physics and the method of manufactured solutions. In addition, we felt it important to emphasize that the integral form of the governing equations results in a straightforward treatment of the sources. With the integral form, we’ll demonstrate that there’s no ambiguity between the Lagrangian and Eulerian form of the equations, which is less clear with the differential forms.

  15. Spallation Neutron Source reaches megawatt power

    SciTech Connect (OSTI)

    Dr. William F. Brinkman

    2009-09-30

    The Department of Energy's Spallation Neutron Source (SNS), already the world's most powerful facility for pulsed neutron scattering science, is now the first pulsed spallation neutron source to break the one-megawatt barrier. "Advances in the materials sciences are fundamental to the development of clean and sustainable energy technologies. In reaching this milestone of operating power, the Spallation Neutron Source is providing scientists with an unmatched resource for unlocking the secrets of materials at the molecular level," said Dr. William F. Brinkman, Director of DOE's Office of Science.

  16. Spallation Neutron Source reaches megawatt power

    ScienceCinema (OSTI)

    Dr. William F. Brinkman

    2010-01-08

    The Department of Energy's Spallation Neutron Source (SNS), already the world's most powerful facility for pulsed neutron scattering science, is now the first pulsed spallation neutron source to break the one-megawatt barrier. "Advances in the materials sciences are fundamental to the development of clean and sustainable energy technologies. In reaching this milestone of operating power, the Spallation Neutron Source is providing scientists with an unmatched resource for unlocking the secrets of materials at the molecular level," said Dr. William F. Brinkman, Director of DOE's Office of Science.

  17. Anomaly metrics to differentiate threat sources from benign sources in primary vehicle screening.

    SciTech Connect (OSTI)

    Cohen, Israel Dov; Mengesha, Wondwosen

    2011-09-01

    Discrimination of benign sources from threat sources at Port of Entries (POE) is of a great importance in efficient screening of cargo and vehicles using Radiation Portal Monitors (RPM). Currently RPM's ability to distinguish these radiological sources is seriously hampered by the energy resolution of the deployed RPMs. As naturally occurring radioactive materials (NORM) are ubiquitous in commerce, false alarms are problematic as they require additional resources in secondary inspection in addition to impacts on commerce. To increase the sensitivity of such detection systems without increasing false alarm rates, alarm metrics need to incorporate the ability to distinguish benign and threat sources. Principal component analysis (PCA) and clustering technique were implemented in the present study. Such techniques were investigated for their potential to lower false alarm rates and/or increase sensitivity to weaker threat sources without loss of specificity. Results of the investigation demonstrated improved sensitivity and specificity in discriminating benign sources from threat sources.

  18. Energy Intensity Indicators: Residential Source Energy Consumption

    Broader source: Energy.gov [DOE]

    Figure R1 below reports as index numbers over the period 1970 through 2011: 1) the number of U.S. households, 2) the average size of those housing units, 3) residential source energy consumption, 4...

  19. Energy Intensity Indicators: Commercial Source Energy Consumption

    Broader source: Energy.gov [DOE]

    Figure C1 below reports as index numbers over the period 1970 through 2011: 1) commercial building floor space, 2) energy use based on source energy consumption, 3) energy intensity, and 4) the...

  20. Advanced Photon Source Upgrade Project - Energy

    ScienceCinema (OSTI)

    Gibson, Murray; Chamberlain, Jeff; Young, Linda

    2013-04-19

    An upgrade to the Advanced Photon Source (announced by DOE - http://go.usa.gov/ivZ) will help scientists better understand complex environments such as in catalytic reactions.

  1. Residential Air-Source Heat Pump Program

    Broader source: Energy.gov [DOE]

    Massachusetts offers rebates of up to $2,500 for the installation of high-efficiency, cold-climate air-source heat pumps (ASHPs) in residential buildings of one to four units. 

  2. LBNL SEED: Why Open Source Overview

    Office of Energy Efficiency and Renewable Energy (EERE)

    One page overview produced by Lawrence Berkeley National Lab detailing the strengths and flexibility of the open source data platform used by the Standard Energy Efficiency Data (SEED) platform.

  3. Advanced Light Source Activity Report 2000

    SciTech Connect (OSTI)

    Greiner, A.; Moxon, L.; Robinson, A.; Tamura, L.

    2001-04-01

    This is an annual report, detailing activities at the Advanced Light Source for the year 2000. It includes highlights of scientific research by users of the facility as well as information about the development of the facility itself.

  4. California Nonpoint Source Program Strategy and Implementation...

    Open Energy Info (EERE)

    Nonpoint Source Program Strategy and Implementation Plan, 1998-2013 Jump to: navigation, search OpenEI Reference LibraryAdd to library Legal Document- OtherOther: California...

  5. Vertical transport and sources in flux models

    SciTech Connect (OSTI)

    Canavan, G.H.

    1997-01-01

    Vertical transport in flux models in examined and shown to reproduce expected limits for densities and fluxes. Disparities with catalog distributions are derived and inverted to find the sources required to rectify them.

  6. Advanced Photon Source Upgrade Project - Materials

    ScienceCinema (OSTI)

    Gibbson, Murray;

    2013-04-19

    An upgrade to Advanced Photon Source announced by DOE - http://go.usa.gov/ivZ -- will help scientists break through bottlenecks in materials design in order to develop materials with desirable functions.

  7. Laser ion source with solenoid field

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Kanesue, Takeshi; Fuwa, Yasuhiro; Kondo, Kotaro; Okamura, Masahiro

    2014-11-12

    Pulse length extension of highly charged ion beam generated from a laser ion source is experimentally demonstrated. In this study, the laser ion source (LIS) has been recognized as one of the most powerful heavy ion source. However, it was difficult to provide long pulse beams. By applying a solenoid field (90 mT, 1 m) at plasma drifting section, a pulse length of carbon ion beam reached 3.2 μs which was 4.4 times longer than the width from a conventional LIS. The particle number of carbon ions accelerated by a radio frequency quadrupole linear accelerator was 1.2 × 1011, whichmore » was provided by a single 1 J Nd-YAG laser shot. A laser ion source with solenoid field could be used in a next generation heavy ion accelerator.« less

  8. Laser ion source with solenoid field

    SciTech Connect (OSTI)

    Kanesue, Takeshi Okamura, Masahiro; Fuwa, Yasuhiro; Kondo, Kotaro

    2014-11-10

    Pulse length extension of highly charged ion beam generated from a laser ion source is experimentally demonstrated. The laser ion source (LIS) has been recognized as one of the most powerful heavy ion source. However, it was difficult to provide long pulse beams. By applying a solenoid field (90?mT, 1?m) at plasma drifting section, a pulse length of carbon ion beam reached 3.2??s which was 4.4 times longer than the width from a conventional LIS. The particle number of carbon ions accelerated by a radio frequency quadrupole linear accelerator was 1.2??10{sup 11}, which was provided by a single 1?J Nd-YAG laser shot. A laser ion source with solenoid field could be used in a next generation heavy ion accelerator.

  9. Laser ion source with solenoid field

    SciTech Connect (OSTI)

    Kanesue, Takeshi; Fuwa, Yasuhiro; Kondo, Kotaro; Okamura, Masahiro

    2014-11-12

    Pulse length extension of highly charged ion beam generated from a laser ion source is experimentally demonstrated. In this study, the laser ion source (LIS) has been recognized as one of the most powerful heavy ion source. However, it was difficult to provide long pulse beams. By applying a solenoid field (90 mT, 1 m) at plasma drifting section, a pulse length of carbon ion beam reached 3.2 ?s which was 4.4 times longer than the width from a conventional LIS. The particle number of carbon ions accelerated by a radio frequency quadrupole linear accelerator was 1.2 1011, which was provided by a single 1 J Nd-YAG laser shot. A laser ion source with solenoid field could be used in a next generation heavy ion accelerator.

  10. Sample inlet tube for ion source

    DOE Patents [OSTI]

    Prior, David [Hermiston, OR; Price, John [Richland, WA; Bruce, Jim [Oceanside, CA

    2002-09-24

    An improved inlet tube is positioned within an aperture through the device to allow the passage of ions from the ion source, through the improved inlet tube, and into the interior of the device. The inlet tube is designed with a larger end and a smaller end wherein the larger end has a larger interior diameter than the interior diameter of the smaller end. The inlet tube is positioned within the aperture such that the larger end is pointed towards the ion source, to receive ions therefrom, and the smaller end is directed towards the interior of the device, to deliver the ions thereto. Preferably, the ion source utilized in the operation of the present invention is a standard electrospray ionization source. Similarly, the present invention finds particular utility in conjunction with analytical devices such as mass spectrometers.

  11. Ground Source Heat Pump Subprogram Overview

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    EGS Demonstration s, 51.4 Innovative Exploration Technologies, 98.1 Ground Source Heat Pumps, ... chiller, VAV air handling system, and gas-fired hot water boiler *54 GHP units, 200 ...

  12. Ground Source Heat Pumps | Open Energy Information

    Open Energy Info (EERE)

    efficient when cooling your home. Not only does this save energy and money, it reduces air pollution. GSHP System Ground source heat pump systems consist of three parts: the...

  13. OPERATION OF THE RHIC AU ION SOURCE.

    SciTech Connect (OSTI)

    STESKI,D.B.; ALESSI,J.; BENJAMIN,J.; CARLSON,C.; MANNI,M.; THIEBERGER,P.; WIPLICH,M.

    2001-09-02

    The Relativistic Heavy Ion Collider (RHIC) at Brookhaven National Laboratory (BNL) is beginning its second year of operation. A cesium sputter ion source injecting into a tandem Van de Graaff provides the gold ions for RHIC. The ion source is operated in the pulsed beam mode and produces a 500{micro}sec long pulse of Au{sup -} with a peak intensity of 290pA at the entrance of the tandem. After acceleration in the tandem and post stripping, this results in a beam of Au{sup +32} with an intensity of 80e{micro}A and an energy of 182MeV. Over the last several years, a series of improvements have been made to increase the intensity of the pulsed beam from the ion source. Details of the source performance and improvements will be presented. In addition, an effort is under way to provide other beam species for RHIC collisions.

  14. Atmospheric sampling glow discharge ionization source

    DOE Patents [OSTI]

    McLuckey, S.A.; Glish, G.L.

    1989-07-18

    An atmospheric sampling glow discharge ionization source that can be used in combination with an analytical instrument which operates at high vacuum, such as a mass spectrometer. The atmospheric sampling glow discharge ionization source comprises a chamber with at least one pair of electrodes disposed therein, an inlet for a gaseous sample to be analyzed and an outlet communicating with an analyzer which operates at subatmospheric pressure. The ionization chamber is maintained at a pressure below atmospheric pressure, and a voltage difference is applied across the electrodes to induce a glow discharge between the electrodes, so that molecules passing through the inlet are ionized by the glow discharge and directed into the analyzer. The ionization source accepts the sample under atmospheric pressure conditions and processes it directly into the high vacuum instrument, bridging the pressure gap and drawing off unwanted atmospheric gases. The invention also includes a method for analyzing a gaseous sample using the glow discharge ionization source described above. 3 figs.

  15. ECR ion source with electron gun

    DOE Patents [OSTI]

    Xie, Z.Q.; Lyneis, C.M.

    1993-10-26

    An Advanced Electron Cyclotron Resonance ion source having an electron gun for introducing electrons into the plasma chamber of the ion source is described. The ion source has a injection enclosure and a plasma chamber tank. The plasma chamber is defined by a plurality of longitudinal magnets. The electron gun injects electrons axially into the plasma chamber such that ionization within the plasma chamber occurs in the presence of the additional electrons produced by the electron gun. The electron gun has a cathode for emitting electrons therefrom which is heated by current supplied from an AC power supply while bias potential is provided by a bias power supply. A concentric inner conductor and outer conductor carry heating current to a carbon chuck and carbon pusher which hold the cathode in place and also heat the cathode. In the Advanced Electron Cyclotron Resonance ion source, the electron gun replaces the conventional first stage used in prior electron cyclotron resonance ion generators. 5 figures.

  16. The Electron Beam Ion Source (EBIS)

    ScienceCinema (OSTI)

    Brookhaven Lab

    2010-01-08

    Brookhaven National Lab has successfully developed a new pre-injector system, called the Electron Beam Ion Source, for the Relativistic Heavy Ion Collider (RHIC) and NASA Space Radiation Laboratory science programs. The first of several planned improvemen

  17. Voltage balanced multilevel voltage source converter system ...

    Office of Scientific and Technical Information (OSTI)

    The rectifier is equipped with at least one phase leg and a source input node for each of ... The inverter is equipped with at least one phase leg and a load output node for each of ...

  18. Muon acceleration in cosmic-ray sources

    SciTech Connect (OSTI)

    Klein, Spencer R.; Mikkelsen, Rune E. [Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States); Becker Tjus, Julia [Fakultt fr Physik and Astronomie, Theoretische Physik I, Ruhr-Universitt Bochum, D-44780 Bochum (Germany)

    2013-12-20

    Many models of ultra-high energy cosmic-ray production involve acceleration in linear accelerators located in gamma-ray bursts, magnetars, or other sources. These transient sources have short lifetimes, which necessitate very high accelerating gradients, up to 10{sup 13} keV cm{sup 1}. At gradients above 1.6 keV cm{sup 1}, muons produced by hadronic interactions undergo significant acceleration before they decay. This muon acceleration hardens the neutrino energy spectrum and greatly increases the high-energy neutrino flux. Using the IceCube high-energy diffuse neutrino flux limits, we set two-dimensional limits on the source opacity and matter density, as a function of accelerating gradient. These limits put strong constraints on different models of particle acceleration, particularly those based on plasma wake-field acceleration, and limit models for sources like gamma-ray bursts and magnetars.

  19. Advanced Light Source Activity Report 2002

    SciTech Connect (OSTI)

    Duque, Theresa; Greiner, Annette; Moxon, Elizabeth; Robinson, Arthur; Tamura, Lori

    2003-06-12

    This annual report of the Advanced Light Source details science highlights and facility improvements during the year. It also offers information on events sponsored by the facility, technical specifications, and staff and publication information.

  20. SPEAR3 | A Brighter Source at SSRL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... Once our oldest light source, SSRL is now our newest and shiniest. And its future is bright indeed. In addition to my congratulations, Ray Orbach, the Director of the Office of ...

  1. Atmospheric sampling glow discharge ionization source

    DOE Patents [OSTI]

    McLuckey, Scott A. (Oak Ridge, TN); Glish, Gary L. (Oak Ridge, TN)

    1989-01-01

    An atmospheric sampling glow discharge ionization source that can be used in combination with an analytical instrument which operates at high vacuum, such as a mass spectrometer. The atmospheric sampling glow discharge ionization source comprises a chamber with at least one pair of electrodes disposed therein, an inlet for a gaseous sample to be analyzed and an outlet communicating with an analyzer which operates at subatmospheric pressure. The ionization chamber is maintained at a pressure below atmospheric pressure, and a voltage difference is applied across the electrodes to induce a glow discharge between the electrodes, so that molecules passing through the inlet are ionized by the glow discharge and directed into the analyzer. The ionization source accepts the sample under atmospheric pressure conditions and processes it directly into the high vacuum instrument, bridging the pressure gap and drawing off unwanted atmospheric gases. The invention also includes a method for analyzing a gaseous sample using the glow discharge ionization source described above.

  2. Photon Source Parameters | Stanford Synchrotron Radiation Lightsource

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Photon Source Parameters Beam Lines by Techniques | Beam Lines by Number Beam Energy 3 GeV Injection Energy 3 GeV Current 300-500 mA Fill Pattern 270 bunches distributed in six...

  3. (International Collaboration on Advanced Neutron Sources)

    SciTech Connect (OSTI)

    Hayter, J.B.

    1990-11-08

    The International Collaboration on Advanced Neutron Sources was started about a decade ago with the purpose of sharing information throughout the global neutron community. The collaboration has been extremely successful in optimizing the use of resources, and the discussions are open and detailed, with reasons for failure shared as well as reasons for success. Although the meetings have become increasingly oriented toward pulsed neutron sources, many of the neutron instrumentation techniques, such as the development of better monochromators, fast response detectors and various data analysis methods, are highly relevant to the Advanced Neutron Source (ANS). I presented one paper on the ANS, and another on the neutron optical polarizer design work which won a 1989 R D-100 Award. I also gained some valuable design ideas, in particular for the ANS hot source, in discussions with individual researchers from Canada, Western Europe, and Japan.

  4. National Synchrotron Light Source annual report 1988

    SciTech Connect (OSTI)

    Hulbert, S.; Lazarz, N.; Williams, G.

    1988-01-01

    This report discusses the experiment done at the National Synchrotron Light Source. Most experiments discussed involves the use of the x-ray beams to study physical properties of solid materials. (LSP)

  5. Neutron Sources for Standard-Based Testing

    SciTech Connect (OSTI)

    Radev, Radoslav; McLean, Thomas

    2014-11-10

    The DHS TC Standards and the consensus ANSI Standards use 252Cf as the neutron source for performance testing because its energy spectrum is similar to the 235U and 239Pu fission sources used in nuclear weapons. An emission rate of 20,000 ± 20% neutrons per second is used for testing of the radiological requirements both in the ANSI standards and the TCS. Determination of the accurate neutron emission rate of the test source is important for maintaining consistency and agreement between testing results obtained at different testing facilities. Several characteristics in the manufacture and the decay of the source need to be understood and accounted for in order to make an accurate measurement of the performance of the neutron detection instrument. Additionally, neutron response characteristics of the particular instrument need to be known and taken into account as well as neutron scattering in the testing environment.

  6. Laser ion source with solenoid field

    SciTech Connect (OSTI)

    Kanesue, Takeshi; Fuwa, Yasuhiro; Kondo, Kotaro; Okamura, Masahiro

    2014-11-10

    Pulse length extension of highly charged ion beam generated from a laser ion source is experimentally demonstrated. The laser ion source (LIS) has been recognized as one of the most powerful heavy ion source. However, it was difficult to provide long pulse beams. By applying a solenoid field (90 mT, 1 m) at plasma drifting section, a pulse length of carbon ion beam reached 3.2 ?s which was 4.4 times longer than the width from a conventional LIS. The particle number of carbon ions accelerated by a radio frequency quadrupole linear accelerator was 1.2 1011, which was provided by a single 1 J Nd-YAG laser shot. A laser ion source with solenoid field could be used in a next generation heavy ion accelerator.

  7. LANSCE | International Collaboration on Advanced Neutron Sources...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ICANS-XIX Paul Scherrer Institit (PSI) Gindelwald, Switzerland March 8012, 2010 ICANS-XVIII China Spallation Neutron Source, Beijing, China, April 26-29, 2007 ICANS-XVII Bishop's ...

  8. Open Source Software | The Ames Laboratory

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Open Source Software The Ames Laboratory has a number of open source software packages available which are listed below: CyDime: As the rate, sophistication, and potential damage of cyber attacks continue to grow, the latency of human-speed analysis and response is becoming increasingly costly. Intelligent response to detected attacks and other malicious activity requires both knowledge of the characteristics of the attack as well as how resources involved in the attack related to the mission of

  9. Diamondoid Monolayers as Monochromatic Electron Source

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Diamondoid Monolayers as Monochromatic Electron Source Diamondoid Monolayers as Monochromatic Electron Source Print Wednesday, 28 November 2007 00:00 Diamondoids are nanometer-sized molecules that feature diamond-crystal cage structures. Adamantane, the smallest member in the family, consists of one cage structure, diamantane two, triamantane three, tetramantane four, and so on. On all of these, the dangling bonds on the outer surfaces are terminated by hydrogen atoms. Because of their potential

  10. High gradient accelerators for linear light sources

    SciTech Connect (OSTI)

    Barletta, W.A.

    1988-09-26

    Ultra-high gradient radio frequency linacs powered by relativistic klystrons appear to be able to provide compact sources of radiation at XUV and soft x-ray wavelengths with a duration of 1 picosecond or less. This paper provides a tutorial review of the physics applicable to scaling the present experience of the accelerator community to the regime applicable to compact linear light sources. 22 refs., 11 figs., 21 tabs.

  11. Table Definitions, Sources, and Explanatory Notes

    Gasoline and Diesel Fuel Update (EIA)

    Maximum U.S. Active Seismic Crew Counts Definitions Key Terms Definition Dimensions In two-dimensional (2D) reflection seismic surveying both the sound source and the sound detectors (numbering up to a hundred or more per shot) are moved along a straight line. The resultant product can be thought of as a vertical sonic cross-section of the subsurface beneath the survey line. It is constructed by summing many compressional (pressure) wave reflections from the various sound source and sound

  12. ON COMPUTING UPPER LIMITS TO SOURCE INTENSITIES

    SciTech Connect (OSTI)

    Kashyap, Vinay L.; Siemiginowska, Aneta [Smithsonian Astrophysical Observatory, 60 Garden Street, Cambridge, MA 02138 (United States); Van Dyk, David A.; Xu Jin [Department of Statistics, University of California, Irvine, CA 92697-1250 (United States); Connors, Alanna [Eureka Scientific, 2452 Delmer Street, Suite 100, Oakland, CA 94602-3017 (United States); Freeman, Peter E. [Department of Statistics, Carnegie Mellon University, 5000 Forbes Avenue, Pittsburgh, PA 15213 (United States); Zezas, Andreas, E-mail: vkashyap@cfa.harvard.ed, E-mail: asiemiginowska@cfa.harvard.ed, E-mail: dvd@ics.uci.ed, E-mail: jinx@ics.uci.ed, E-mail: aconnors@eurekabayes.co, E-mail: pfreeman@cmu.ed, E-mail: azezas@cfa.harvard.ed [Physics Department, University of Crete, P.O. Box 2208, GR-710 03, Heraklion, Crete (Greece)

    2010-08-10

    A common problem in astrophysics is determining how bright a source could be and still not be detected in an observation. Despite the simplicity with which the problem can be stated, the solution involves complicated statistical issues that require careful analysis. In contrast to the more familiar confidence bound, this concept has never been formally analyzed, leading to a great variety of often ad hoc solutions. Here we formulate and describe the problem in a self-consistent manner. Detection significance is usually defined by the acceptable proportion of false positives (background fluctuations that are claimed as detections, or Type I error), and we invoke the complementary concept of false negatives (real sources that go undetected, or Type II error), based on the statistical power of a test, to compute an upper limit to the detectable source intensity. To determine the minimum intensity that a source must have for it to be detected, we first define a detection threshold and then compute the probabilities of detecting sources of various intensities at the given threshold. The intensity that corresponds to the specified Type II error probability defines that minimum intensity and is identified as the upper limit. Thus, an upper limit is a characteristic of the detection procedure rather than the strength of any particular source. It should not be confused with confidence intervals or other estimates of source intensity. This is particularly important given the large number of catalogs that are being generated from increasingly sensitive surveys. We discuss, with examples, the differences between these upper limits and confidence bounds. Both measures are useful quantities that should be reported in order to extract the most science from catalogs, though they answer different statistical questions: an upper bound describes an inference range on the source intensity, while an upper limit calibrates the detection process. We provide a recipe for computing upper

  13. Table Definitions, Sources, and Explanatory Notes

    Gasoline and Diesel Fuel Update (EIA)

    Maximum U.S. Active Seismic Crew Counts Definitions Key Terms Definition Dimensions In two-dimensional (2D) reflection seismic surveying both the sound source and the sound detectors (numbering up to a hundred or more per shot) are moved along a straight line. The resultant product can be thought of as a vertical sonic cross-section of the subsurface beneath the survey line. It is constructed by summing many compressional (pressure) wave reflections from the various sound source and sound

  14. Appendix SOTERM: Actinide Chemistry Source Term

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    SOTERM-2014 Actinide Chemistry Source Term United States Department of Energy Waste Isolation Pilot Plant Carlsbad Field Office Carlsbad, New Mexico Compliance Recertification Application 2014 Appendix SOTERM-2014 Actinide Chemistry Source Term Table of Contents SOTERM-1.0 Introduction SOTERM-2.0 Expected WIPP Repository Conditions, Chemistry, and Processes SOTERM-2.1 Ambient Geochemical Conditions SOTERM-2.2 Repository Conditions SOTERM-2.2.1 Repository Pressure SOTERM-2.2.2 Repository

  15. Fluid driven torsional dipole seismic source

    DOE Patents [OSTI]

    Hardee, Harry C.

    1991-01-01

    A compressible fluid powered oscillating downhole seismic source device capable of periodically generating uncontaminated horizontally-propagated, shear waves is provided. A compressible fluid generated oscillation is created within the device which imparts an oscillation to a housing when the device is installed in a housing such as the cylinder off an existing downhole tool, thereby a torsional seismic source is established. Horizontal waves are transferred to the surrounding bore hole medium through downhole clamping.

  16. Flexible feature interface for multimedia sources

    DOE Patents [OSTI]

    Coffland, Douglas R.

    2009-06-09

    A flexible feature interface for multimedia sources system that includes a single interface for the addition of features and functions to multimedia sources and for accessing those features and functions from remote hosts. The interface utilizes the export statement: export "C" D11Export void FunctionName(int argc, char ** argv,char * result, SecureSession *ctrl) or the binary equivalent of the export statement.

  17. Source Recertification, Refurbishment, and Transfer Logistics

    SciTech Connect (OSTI)

    Gastelum, Zoe N.; Duckworth, Leesa L.; Greenfield, Bryce A.; Doll, Stephanie R.

    2013-09-01

    The 2012 Gap Analysis of Department of Energy Radiological Sealed Sources, Standards, and Materials for Safeguards Technology Development [1] report, and the subsequent Reconciliation of Source Needs and Surpluses across the U.S. Department of Energy National Laboratory Complex [2] report, resulted in the identification of 33 requests for nuclear or radiological sealed sources for which there was potentially available, suitable material from within the U.S. Department of Energy (DOE) complex to fill the source need. Available, suitable material was defined by DOE laboratories as material slated for excess, or that required recertification or refurbishment before being used for safeguards technology development. This report begins by outlining the logistical considerations required for the shipment of nuclear and radiological materials between DOE laboratories. Then, because of the limited need for transfer of matching sources, the report also offers considerations for an alternative approach – the shipment of safeguards equipment between DOE laboratories or technology testing centers. Finally, this report addresses repackaging needs for the two source requests for which there was available, suitable material within the DOE complex.

  18. Negative ion source with external RF antenna

    DOE Patents [OSTI]

    Leung, Ka-Ngo; Hahto, Sami K.; Hahto, Sari T.

    2007-02-13

    A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source. A converter can be included in the ion source to produce negative ions.

  19. Electron Storage Ring Development for ICS Sources

    SciTech Connect (OSTI)

    Loewen, Roderick

    2015-09-30

    There is an increasing world-wide interest in compact light sources based on Inverse Compton Scattering. Development of these types of light sources includes leveraging the investment in accelerator technology first developed at DOE National Laboratories. Although these types of light sources cannot replace the larger user-supported synchrotron facilities, they offer attractive alternatives for many x-ray science applications. Fundamental research at the SLAC National Laboratory in the 1990’s led to the idea of using laser-electron storage rings as a mechanism to generate x-rays with many properties of the larger synchrotron light facilities. This research led to a commercial spin-off of this technology. The SBIR project goal is to understand and improve the performance of the electron storage ring system of the commercially available Compact Light Source. The knowledge gained from studying a low-energy electron storage ring may also benefit other Inverse Compton Scattering (ICS) source development. Better electron storage ring performance is one of the key technologies necessary to extend the utility and breadth of applications of the CLS or related ICS sources. This grant includes a subcontract with SLAC for technical personnel and resources for modeling, feedback development, and related accelerator physics studies.

  20. Accelerator-driven X-ray Sources

    SciTech Connect (OSTI)

    Nguyen, Dinh Cong

    2015-11-09

    After an introduction which mentions x-ray tubes and storage rings and gives a brief review of special relativity, the subject is treated under the following topics and subtopics: synchrotron radiation (bending magnet radiation, wiggler radiation, undulator radiation, brightness and brilliance definition, synchrotron radiation facilities), x-ray free-electron lasers (linac-driven X-ray FEL, FEL interactions, self-amplified spontaneous emission (SASE), SASE self-seeding, fourth-generation light source facilities), and other X-ray sources (energy recovery linacs, Inverse Compton scattering, laser wakefield accelerator driven X-ray sources. In summary, accelerator-based light sources cover the entire electromagnetic spectrum. Synchrotron radiation (bending magnet, wiggler and undulator radiation) has unique properties that can be tailored to the users’ needs: bending magnet and wiggler radiation is broadband, undulator radiation has narrow spectral lines. X-ray FELs are the brightest coherent X-ray sources with high photon flux, femtosecond pulses, full transverse coherence, partial temporal coherence (SASE), and narrow spectral lines with seeding techniques. New developments in electron accelerators and radiation production can potentially lead to more compact sources of coherent X-rays.

  1. Microsoft Word - FAQs _Spanish_ 1-22-10b WITH NEW EDITS mk 01-26-10.doc

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Borrador de la Declaración Sobre el Impacto Ambiental del Cierre de Contenedores y la Disposición de Desechos del Establecimiento de Hanford, Richland, Washington (Borrador de la DIA CC & DD) (DOE/EIS-0391-D) Preguntas Frecuentes ¿Cuáles son las propuestas de acción del Departamento de Energía de los Estados Unidos (DDE) (U.S. Department of Energy) en el Borrador de la DIA CC & DD (Draft Tank Closure and Waste Management Environmental Impact Statement for the Hanford Site,

  2. What Is MEMS? | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Materials, Surfaces and Interfaces 2-2-6-v GE Scientists Demonstrate Promising Anti-icing Nano Surfaces 2-2-5-v GE Unveils High-Tech Superhero, GENIUS MAN ...

  3. Search for: microelectromechanical OR MEMS | DOE PAGES

    Office of Scientific and Technical Information (OSTI)

    Have feedback or suggestions for a way to improve these results? Mapping photovoltaic ... uniquely providing nanoscale maps of photovoltaic (PV) performance parameters such as ...

  4. Optical MEMS at Sandia National Laboratories. (Conference) |...

    Office of Scientific and Technical Information (OSTI)

    DOE Contract Number: AC04-94AL85000 Resource Type: Conference Resource Relation: Conference: Proposed for presentation at the CfAO Fall Retreat held November 10-13, 2005 in Lake ...

  5. Search for: microelectromechanical OR MEMS | DOE PAGES

    Office of Scientific and Technical Information (OSTI)

    Monroe, Matthew E. (3) Mostepanenko, V. M. (3) Nowadnick, E. A. (3) Olsson, Roy H. (3) Smith, Adam W. (3) Smith, Richard D. (3) Save Results Excel (limit 2000) CSV (limit 5000) XML ...

  6. Optically transduced MEMS magnetometer (Patent) | DOEPatents

    Office of Scientific and Technical Information (OSTI)

    Issue Date: 2014-03-18 OSTI Identifier: 1127102 Assignee: Sandia Corporation (Albuquerque, NM) SNL Patent Number(s): 8,674,689 Application Number: 13326,139 Contract Number: ...

  7. Stress gradients in electrodeposited Ni MEMS. (Conference) |...

    Office of Scientific and Technical Information (OSTI)

    Resource Relation: Conference: Proposed for presentation at the Electrochemical Society 206th meeting held October 3-8, 2004 in Honolulu, HI. Research Org: Sandia National ...

  8. Preliminary characterization of active MEMS valves. (Technical...

    Office of Scientific and Technical Information (OSTI)

    Eight separate silicon die are discussed, each with a series of four active valves ... supplies and along traces on the silicon.more Pressure is supplied from a ...

  9. Search for: microelectromechanical OR MEMS | DOE PAGES

    Office of Scientific and Technical Information (OSTI)

    Lee, S. W. (3) Magierski, Piotr (3) Monroe, Matthew E. (3) Olsson, Roy H. (3) Smith, Adam W. (3) Smith, Richard D. (3) Wang, H. (3) Wlazowski, Gabriel (3) Aad, G. (2) Adkins, ...

  10. Optically transduced MEMS magnetometer (Patent) | DOEPatents

    Office of Scientific and Technical Information (OSTI)

    the resonator to provide greater dynamic range andor accommodate fabrication tolerances. ... Full Text View Full Text View Full Text Have feedback or suggestions for a way to improve ...

  11. Introduction to Microelectromechanical Systems (MEMS) failure...

    Office of Scientific and Technical Information (OSTI)

    Sponsoring Org: USDOE Country of Publication: United States Language: English Subject: 77 NANOSCIENCE AND NANOTECHNOLOGY; COMMERCIALIZATION; ELECTROMECHANICS; NANOSTRUCTURES; ...

  12. Optically transduced MEMS gyro device (Patent) | DOEPatents

    Office of Scientific and Technical Information (OSTI)

    In embodiments, the vibratory gyro includes a plurality of multi-layer sub-wavelength gratings and a plurality of drive electrodes to measure motion of the proof mass induced by ...

  13. Search for: microelectromechanical OR MEMS | DOE PAGES

    Office of Scientific and Technical Information (OSTI)

    ... Studies on measuring surface adhesion between sidewalls in boron doped ultrananocrystalline diamond based microelectromechanical devices Buja, Federico ; Kokorian, Jaap ; Sumant, ...

  14. Preliminary characterization of active MEMS valves. (Technical...

    Office of Scientific and Technical Information (OSTI)

    Electrical contact is supplied from the underlying printed circuit board, attached to external supplies and along traces on the silicon.more Pressure is supplied from a ...

  15. MEMS based pyroelectric thermal energy harvester

    DOE Patents [OSTI]

    Hunter, Scott R; Datskos, Panagiotis G

    2013-08-27

    A pyroelectric thermal energy harvesting apparatus for generating an electric current includes a cantilevered layered pyroelectric capacitor extending between a first surface and a second surface, where the first surface includes a temperature difference from the second surface. The layered pyroelectric capacitor includes a conductive, bimetal top electrode layer, an intermediate pyroelectric dielectric layer and a conductive bottom electrode layer. In addition, a pair of proof masses is affixed at a distal end of the layered pyroelectric capacitor to face the first surface and the second surface, wherein the proof masses oscillate between the first surface and the second surface such that a pyroelectric current is generated in the pyroelectric capacitor due to temperature cycling when the proof masses alternately contact the first surface and the second surface.

  16. Preliminary characterization of active MEMS valves. (Technical...

    Office of Scientific and Technical Information (OSTI)

    An Omega DPG4000-500 pressure gauge produced pressure measurements. Optical measurements were returned via a WYKO Interferometry probe station. This would allow for determination ...

  17. Light sources based on semiconductor current filaments

    DOE Patents [OSTI]

    Zutavern, Fred J.; Loubriel, Guillermo M.; Buttram, Malcolm T.; Mar, Alan; Helgeson, Wesley D.; O'Malley, Martin W.; Hjalmarson, Harold P.; Baca, Albert G.; Chow, Weng W.; Vawter, G. Allen

    2003-01-01

    The present invention provides a new type of semiconductor light source that can produce a high peak power output and is not injection, e-beam, or optically pumped. The present invention is capable of producing high quality coherent or incoherent optical emission. The present invention is based on current filaments, unlike conventional semiconductor lasers that are based on p-n junctions. The present invention provides a light source formed by an electron-hole plasma inside a current filament. The electron-hole plasma can be several hundred microns in diameter and several centimeters long. A current filament can be initiated optically or with an e-beam, but can be pumped electrically across a large insulating region. A current filament can be produced in high gain photoconductive semiconductor switches. The light source provided by the present invention has a potentially large volume and therefore a potentially large energy per pulse or peak power available from a single (coherent) semiconductor laser. Like other semiconductor lasers, these light sources will emit radiation at the wavelength near the bandgap energy (for GaAs 875 nm or near infra red). Immediate potential applications of the present invention include high energy, short pulse, compact, low cost lasers and other incoherent light sources.

  18. Note: Development of ESS Bilbao's proton ion source: Ion Source Hydrogen Positive

    SciTech Connect (OSTI)

    Miracoli, R. Feuchtwanger, J.; Arredondo, I.; Belver, D.; Gonzalez, P. J.; Corres, J.; Djekic, S.; Echevarria, P.; Eguiraun, M.; Garmendia, N.; Muguira, L.

    2014-02-15

    The Ion Source Hydrogen positive is a 2.7 GHz off-resonance microwave discharge ion source. It uses four coils to generate an axial magnetic field in the plasma chamber around 0.1 T that exceeds the ECR resonance field. A new magnetic system was designed as a combination of the four coils and soft iron in order to increase the reliability of the source. The description of the simulations of the magnetic field and the comparison with the magnetic measurements are presented. Moreover, results of the initial commissioning of the source for extraction voltage until 50 kV will be reported.

  19. Ion sources for ion implantation technology (invited)

    SciTech Connect (OSTI)

    Sakai, Shigeki Hamamoto, Nariaki; Inouchi, Yutaka; Umisedo, Sei; Miyamoto, Naoki

    2014-02-15

    Ion sources for ion implantation are introduced. The technique is applied not only to large scale integration (LSI) devices but also to flat panel display. For LSI fabrication, ion source scheduled maintenance cycle is most important. For CMOS image sensor devices, metal contamination at implanted wafer is most important. On the other hand, to fabricate miniaturized devices, cluster ion implantation has been proposed to make shallow PN junction. While for power devices such as silicon carbide, aluminum ion is required. For doping processes of LCD fabrication, a large ion source is required. The extraction area is about 150 cm 10 cm, and the beam uniformity is important as well as the total target beam current.

  20. Operating flexibility for Title IV sources

    SciTech Connect (OSTI)

    Dayal, P.; Beckham, B.

    1995-12-31

    Developing a comprehensive permit strategy for electric utilities is probably the most critical step in achieving compliance with the Clean Air Act Amendments of 1990, (the Act). The two key components of a complete permit strategy are the permit shield and operational flexibility. Sources need to ensure that the permit shield is complete, and that an operational flexibility approach is developed. If sources design and draft their own permit, not just complete the application, there is a greater possibility of ensuring that the shield is complete and maximum operational flexibility is achieved. Finally, sources should begin to develop a reporting schedule and format, conduct operating permit training, and develop a compliance manual for plant operators.