Sample records for band-gap semiconductor oxide

  1. Band gap engineering at a semiconductor - crystalline oxide interface

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Moghadam, Jahangir-Moghadam; Shen, Xuan; Chrysler, Matthew; Ahmadi-Majlan, Kamyar; Su, Dong; Ngai, Joseph H.

    2015-03-01T23:59:59.000Z

    The epitaxial growth of crystalline oxides on semiconductors provides a pathway to introduce new functionalities to semiconductor devices. Key to integrating the functionalities of oxides onto semiconductors is controlling the band alignment at interfaces between the two materials. Here we apply principles of band gap engineering traditionally used at heterojunctions between conventional semiconductors to control the band offset between a single crystalline oxide and a semiconductor. Reactive molecular beam epitaxy is used to realize atomically abrupt and structurally coherent interfaces between SrZrxTi1-xO? and Ge, in which the band gap of the former is enhanced with Zr content x. We presentmore »structural and electrical characterization of SrZrxTi1-xO?-Ge heterojunctions and demonstrate a type-I band offset can be achieved. These results demonstrate that band gap engineering can be exploited to realize functional semiconductor crystalline oxide heterojunctions.« less

  2. Implications of mercury interactions with band-gap semiconductor oxides

    SciTech Connect (OSTI)

    Granite, E.J.; King, W.P.; Stanko, D.C.; Pennline, H.W.

    2008-09-01T23:59:59.000Z

    Titanium dioxide is a well-known photooxidation catalyst. It will oxidize mercury in the presence of ultraviolet light from the sun and oxygen and/or moisture to form mercuric oxide. Several companies manufacture self-cleaning windows. These windows have a transparent coating of titanium dioxide. The titanium dioxide is capable of destroying organic contaminants in air in the presence of ultraviolet light from the sun, thereby keeping the windows clean. The commercially available self-cleaning windows were used to sequester mercury from oxygen–nitrogen mixtures. Samples of the self-cleaning glass were placed into specially designed photo-reactors in order to study the removal of elemental mercury from oxygen–nitrogen mixtures resembling air. The possibility of removing mercury from ambient air with a self-cleaning glass apparatus is examined. The intensity of 365-nm ultraviolet light was similar to the natural intensity from sunlight in the Pittsburgh region. Passive removal of mercury from the air may represent an option in lieu of, or in addition to, point source clean-up at combustion facilities. There are several common band-gap semiconductor oxide photocatalysts. Sunlight (both the ultraviolet and visible light components) and band-gap semiconductor particles may have a small impact on the global cycle of mercury in the environment. The potential environmental consequences of mercury interactions with band-gap semiconductor oxides are discussed. Heterogeneous photooxidation might impact the global transport of elemental mercury emanating from flue gases.

  3. Catalyzed Water Oxidation by Solar Irradiation of Band-Gap-Narrowed Semiconductors (Part 1. Overview).

    SciTech Connect (OSTI)

    Fujita,E.; Khalifah, P.; Lymar, S.; Muckerman, J.T.; Rodgriguez, J.

    2008-03-18T23:59:59.000Z

    The objectives of this report are: (1) Investigate the catalysis of water oxidation by cobalt and manganese hydrous oxides immobilized on titania or silica nanoparticles, and dinuclear metal complexes with quinonoid ligands in order to develop a better understanding of the critical water oxidation chemistry, and rationally search for improved catalysts. (2) Optimize the light-harvesting and charge-separation abilities of stable semiconductors including both a focused effort to improve the best existing materials by investigating their structural and electronic properties using a full suite of characterization tools, and a parallel effort to discover and characterize new materials. (3) Combine these elements to examine the function of oxidation catalysts on Band-Gap-Narrowed Semiconductor (BGNSC) surfaces and elucidate the core scientific challenges to the efficient coupling of the materials functions.

  4. Narrow band gap amorphous silicon semiconductors

    DOE Patents [OSTI]

    Madan, A.; Mahan, A.H.

    1985-01-10T23:59:59.000Z

    Disclosed is a narrow band gap amorphous silicon semiconductor comprising an alloy of amorphous silicon and a band gap narrowing element selected from the group consisting of Sn, Ge, and Pb, with an electron donor dopant selected from the group consisting of P, As, Sb, Bi and N. The process for producing the narrow band gap amorphous silicon semiconductor comprises the steps of forming an alloy comprising amorphous silicon and at least one of the aforesaid band gap narrowing elements in amount sufficient to narrow the band gap of the silicon semiconductor alloy below that of amorphous silicon, and also utilizing sufficient amounts of the aforesaid electron donor dopant to maintain the amorphous silicon alloy as an n-type semiconductor.

  5. Wide band gap semiconductor templates

    DOE Patents [OSTI]

    Arendt, Paul N. (Los Alamos, NM); Stan, Liliana (Los Alamos, NM); Jia, Quanxi (Los Alamos, NM); DePaula, Raymond F. (Santa Fe, NM); Usov, Igor O. (Los Alamos, NM)

    2010-12-14T23:59:59.000Z

    The present invention relates to a thin film structure based on an epitaxial (111)-oriented rare earth-Group IVB oxide on the cubic (001) MgO terminated surface and the ion-beam-assisted deposition ("IBAD") techniques that are amendable to be over coated by semiconductors with hexagonal crystal structures. The IBAD magnesium oxide ("MgO") technology, in conjunction with certain template materials, is used to fabricate the desired thin film array. Similarly, IBAD MgO with appropriate template layers can be used for semiconductors with cubic type crystal structures.

  6. Wide-band-gap, alkaline-earth-oxide semiconductor and devices utilizing same

    DOE Patents [OSTI]

    Abraham, Marvin M. (Oak Ridge, TN); Chen, Yok (Oak Ridge, TN); Kernohan, Robert H. (Oak Ridge, TN)

    1981-01-01T23:59:59.000Z

    This invention relates to novel and comparatively inexpensive semiconductor devices utilizing semiconducting alkaline-earth-oxide crystals doped with alkali metal. The semiconducting crystals are produced by a simple and relatively inexpensive process. As a specific example, a high-purity lithium-doped MgO crystal is grown by conventional techniques. The crystal then is heated in an oxygen-containing atmosphere to form many [Li].degree. defects therein, and the resulting defect-rich hot crystal is promptly quenched to render the defects stable at room temperature and temperatures well above the same. Quenching can be effected conveniently by contacting the hot crystal with room-temperature air.

  7. Calculation of semiconductor band gaps with the M06-L density functional Yan Zhao and Donald G. Truhlara

    E-Print Network [OSTI]

    Truhlar, Donald G

    2009 The performance of the M06-L density functional has been tested for band gaps in seven,13 that is designed for main group thermo- chemistry, transition metal bonding, thermochemical kinet- ics in group-4, group 3­5, and metal oxide semiconductors. In Sec. II, we describe the test sets

  8. Fermion space charge in narrow-band gap semiconductors, Weyl semimetals and around highly charged nuclei

    E-Print Network [OSTI]

    Eugene B. Kolomeisky; Joseph P. Straley; Hussain Zaidi

    2013-10-15T23:59:59.000Z

    The field of charged impurities in narrow-band gap semiconductors and Weyl semimetals can create electron-hole pairs when the total charge $Ze$ of the impurity exceeds a value $Z_{c}e$. The particles of one charge escape to infinity, leaving a screening space charge. The result is that the observable dimensionless impurity charge $Q_{\\infty}$ is less than $Z$ but greater than $Z_{c}$. There is a corresponding effect for nuclei with $Z >Z_{c} \\approx 170$, however in the condensed matter setting we find $Z_{c} \\simeq 10$. Thomas-Fermi theory indicates that $Q_{\\infty} = 0$ for the Weyl semimetal, but we argue that this is a defect of the theory. For the case of a highly-charged recombination center in a narrow band-gap semiconductor (or of a supercharged nucleus), the observable charge takes on a nearly universal value. In Weyl semimetals the observable charge takes on the universal value $Q_{\\infty} = Z_{c}$ set by the reciprocal of material's fine structure constant.

  9. The Electrical and Band-Gap Properties of Amorphous Zinc-Indium-Tin Oxide Thin Films

    E-Print Network [OSTI]

    Shahriar, Selim

    MRSEC The Electrical and Band-Gap Properties of Amorphous Zinc-Indium-Tin Oxide Thin Films D Science & Engineering Center For zinc-indium-tin oxide (ZITO) films, grown by pulsed-laser deposition was replaced by substitution with zinc and tin in equal molar proportions (co-substitution). All ZITO films

  10. Toward Photochemical Water Splitting Using Band-Gap-Narrowed Semiconductors and Transition-Metal Based Molecular Catalysts

    SciTech Connect (OSTI)

    Muckerman,J.T.; Rodriguez, J.A.; Fujita, E.

    2009-06-07T23:59:59.000Z

    We are carrying out coordinated theoretical and experimental studies of toward photochemical water splitting using band-gap-narrowed semiconductors (BGNSCs) with attached multi-electron molecular water oxidation and hydrogen production catalysts. We focus on the coupling between the materials properties and the H{sub 2}O redox chemistry, with an emphasis on attaining a fundamental understanding of the individual elementary steps in the following four processes: (1) Light-harvesting and charge-separation of stable oxide or oxide-derived semiconductors for solar-driven water splitting, including the discovery and characterization of the behavior of such materials at the aqueous interface; (2) The catalysis of the four-electron water oxidation by dinuclear hydroxo transition-metal complexes with quinonoid ligands, and the rational search for improved catalysts; (3) Transfer of the design principles learned from the elucidation of the DuBois-type hydrogenase model catalysts in acetonitrile to the rational design of two-electron hydrogen production catalysts for aqueous solution; (4) Combining these three elements to examine the function of oxidation catalysts on BGNSC photoanode surfaces and hydrogen production catalysts on cathode surfaces at the aqueous interface to understand the challenges to the efficient coupling of the materials functions.

  11. Band gap structure modification of amorphous anodic Al oxide film by Ti-alloying

    SciTech Connect (OSTI)

    Canulescu, S., E-mail: stec@fotonik.dtu.dk; Schou, J. [Department of Photonics Engineering, Technical University of Denmark, 4000 Roskilde (Denmark); Rechendorff, K.; Pleth Nielsen, L. [Danish Technological Institute, Kongsvang Alle 29, 8000 Aarhus (Denmark); Borca, C. N. [Paul Scherrer Institute, 5232 Villigen (Switzerland); Jones, N. C.; Hoffmann, S. V. [ISA, Department of Physics and Astronomy, Aarhus University, 8000 Aarhus (Denmark); Bordo, K.; Ambat, R. [Department of Mechanical Engineering, Technical University of Denmark, 2800 Kongens Lyngby (Denmark)

    2014-03-24T23:59:59.000Z

    The band structure of pure and Ti-alloyed anodic aluminum oxide has been examined as a function of Ti concentration varying from 2 to 20 at.?%. The band gap energy of Ti-alloyed anodic Al oxide decreases with increasing Ti concentration. X-ray absorption spectroscopy reveals that Ti atoms are not located in a TiO{sub 2} unit in the oxide layer, but rather in a mixed Ti-Al oxide layer. The optical band gap energy of the anodic oxide layers was determined by vacuum ultraviolet spectroscopy in the energy range from 4.1 to 9.2?eV (300–135?nm). The results indicate that amorphous anodic Al{sub 2}O{sub 3} has a direct band gap of 7.3?eV, which is about ?1.4?eV lower than its crystalline counterpart (single-crystal Al{sub 2}O{sub 3}). Upon Ti-alloying, extra bands appear within the band gap of amorphous Al{sub 2}O{sub 3}, mainly caused by Ti 3d orbitals localized at the Ti site.

  12. Band gap tuning in transition metal oxides by site-specific substitution

    DOE Patents [OSTI]

    Lee, Ho Nyung; Chisholm, Jr., Matthew F; Jellison, Jr., Gerald Earle; Singh, David J; Choi, Woo Seok

    2013-12-24T23:59:59.000Z

    A transition metal oxide insulator composition having a tuned band gap includes a transition metal oxide having a perovskite or a perovskite-like crystalline structure. The transition metal oxide includes at least one first element selected form the group of Bi, Ca, Ba, Sr, Li, Na, Mg, K, Pb, and Pr; and at least one second element selected from the group of Ti, Al, V, Cr, Mn, Fe, Co, Ni, Cu, Zr, Nb, Mo, Ru, Rh, Hf, Ta, W, Re, Os, Ir, and Pt. At least one correlated insulator is integrated into the crystalline structure, including REMO.sub.3, wherein RE is at least one Rare Earth element, and wherein M is at least one element selected from the group of Co, V, Cr, Ni, Mn, and Fe. The composition is characterized by a band gap of less of 4.5 eV.

  13. Effect of silver incorporation in phase formation and band gap tuning of tungsten oxide thin films

    SciTech Connect (OSTI)

    Jolly Bose, R.; Kumar, R. Vinod; Sudheer, S. K.; Mahadevan Pillai, V. P. [Department of Optoelectronics, University of Kerala, Kariyavattom, Thiruvananthapuram, Kerala 695581 (India); Reddy, V. R.; Ganesan, V. [UGC - DAE Consortium for Scientific Research, Khandwa Road, Indore 452017, Madhyapradesh (India)

    2012-12-01T23:59:59.000Z

    Silver incorporated tungsten oxide thin films are prepared by RF magnetron sputtering technique. The effect of silver incorporation in micro structure evolution, phase enhancement, band gap tuning and other optical properties are investigated using techniques such as x-ray diffraction, micro-Raman spectroscopy, atomic force microscopy, scanning electron microscopy, energy dispersive x-ray spectroscopy, and UV-Visible spectroscopy. Effect of silver addition in phase formation and band gap tuning of tungsten oxide thin films are investigated. It is found that the texturing and phase formation improves with enhancement in silver content. It is also found that as the silver incorporation enhances the thickness of the films increases at the same time the strain in the film decreases. Even without annealing the desired phase can be achieved by doping with silver. A broad band centered at the wavelength 437 nm is observed in the absorption spectra of tungsten oxide films of higher silver incorporation and this can be attributed to surface plasmon resonance of silver atoms present in the tungsten oxide matrix. The transmittance of the films is decreased with increase in silver content which can be due to increase in film thickness, enhancement of scattering, and absorption of light caused by the increase of grain size, surface roughness and porosity of films and enhanced absorption due to surface plasmon resonance of silver. It is found that silver can act as the seed for the growth of tungsten oxide grains and found that the grain size increases with silver content which in turn decreases the band gap of tungsten oxide from 3.14 eV to 2.70 eV.

  14. SPECTROSCOPIE DE DEFAUTS -LUMINESCENCE I. THE ANALYSIS OF WIDE BAND GAP SEMICONDUCTORS

    E-Print Network [OSTI]

    Boyer, Edmond

    on analysis depend very much on the device. In semiconductors, light emitting diodes (LEDs) are formed from pn

  15. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Substrate-Induced Band-Gap Opening in Epitaxial Graphene Print Prospective challengers to silicon, the long-reigning king of semiconductors for computer chips and other electronic...

  16. Fabrication of photonic band gap materials

    DOE Patents [OSTI]

    Constant, Kristen (Ames, IA); Subramania, Ganapathi S. (Ames, IA); Biswas, Rana (Ames, IA); Ho, Kai-Ming (Ames, IA)

    2002-01-15T23:59:59.000Z

    A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microspheres, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microspheres therefrom. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microspheres may be polystyrene microspheres.

  17. Band-Gap Engineering of Zinc Oxide Colloids via Lattice Substitution with Sulfur Leading to Materials with Advanced Properties for

    E-Print Network [OSTI]

    Nabben, Reinhard

    gap semiconductors like III/V compounds, for instance, gallium nitride (GaN),2 or II/VI compounds bandgap of 3.37 eV at room temperature.7 Thus, one of its most elemental functions is the absorption

  18. Blueshift of optical band gap in ZnO thin films grown by metal-organic chemical-vapor deposition

    E-Print Network [OSTI]

    . INTRODUCTION Zinc oxide ZnO is a wide direct band-gap 3.37 eV semiconductor with a broad range of applications. Dimethylzinc DMZn , N2 gas, and high-purity O2 were used as the zinc source, carrier gas, and oxidizing agent including light-emitting devices,1 varistors,2 solar cells,3 and gas sensors.4 Moreover, ZnO is a promising

  19. Characterization of Amorphous Zinc Tin Oxide Semiconductors....

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Amorphous Zinc Tin Oxide Semiconductors. Characterization of Amorphous Zinc Tin Oxide Semiconductors. Abstract: Amorphous zinc tin oxide (ZTO) was investigated to determine the...

  20. Narrow energy band gap gallium arsenide nitride semi-conductors and an ion-cut-synthesis method for producing the same

    DOE Patents [OSTI]

    Weng, Xiaojun; Goldman, Rachel S.

    2006-06-06T23:59:59.000Z

    A method for forming a semi-conductor material is provided that comprises forming a donor substrate constructed of GaAs, providing a receiver substrate, implanting nitrogen into the donor substrate to form an implanted layer comprising GaAs and nitrogen. The implanted layer is bonded to the receiver substrate and annealed to form GaAsN and nitrogen micro-blisters in the implanted layer. The micro-blisters allow the implanted layer to be cleaved from the donor substrate.

  1. Low band gap polymers Organic Photovoltaics

    E-Print Network [OSTI]

    Low band gap polymers for Organic Photovoltaics Eva Bundgaard Ph.D. Dissertation Risø National Bundgaard Title: Low band gap polymers for Organic photovoltaics Department: The polymer department Report the area of organic photovoltaics are focusing on low band gap polymers, a type of polymer which absorbs

  2. Chemical dynamics and bonding at gas/semiconductor and oxide/semiconductor interfaces

    E-Print Network [OSTI]

    Bishop, Sarah R.

    2010-01-01T23:59:59.000Z

    applied to alternative semiconductor materials to determinephase oxides and semiconductor surfaces. Both experimentalunderstanding of the oxide/semiconductor interface. The

  3. Photonic band gap structure simulator

    DOE Patents [OSTI]

    Chen, Chiping; Shapiro, Michael A.; Smirnova, Evgenya I.; Temkin, Richard J.; Sirigiri, Jagadishwar R.

    2006-10-03T23:59:59.000Z

    A system and method for designing photonic band gap structures. The system and method provide a user with the capability to produce a model of a two-dimensional array of conductors corresponding to a unit cell. The model involves a linear equation. Boundary conditions representative of conditions at the boundary of the unit cell are applied to a solution of the Helmholtz equation defined for the unit cell. The linear equation can be approximated by a Hermitian matrix. An eigenvalue of the Helmholtz equation is calculated. One computation approach involves calculating finite differences. The model can include a symmetry element, such as a center of inversion, a rotation axis, and a mirror plane. A graphical user interface is provided for the user's convenience. A display is provided to display to a user the calculated eigenvalue, corresponding to a photonic energy level in the Brilloin zone of the unit cell.

  4. Band gap engineering strategy via polarization rotation in perovskite ferroelectrics

    SciTech Connect (OSTI)

    Wang, Fenggong, E-mail: fenggong@sas.upenn.edu; Grinberg, Ilya; Rappe, Andrew M., E-mail: rappe@sas.upenn.edu [The Makineni Theoretical Laboratories, Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104–6323 (United States)

    2014-04-14T23:59:59.000Z

    We propose a strategy to engineer the band gaps of perovskite oxide ferroelectrics, supported by first principles calculations. We find that the band gaps of perovskites can be substantially reduced by as much as 1.2?eV through local rhombohedral-to-tetragonal structural transition. Furthermore, the strong polarization of the rhombohedral perovskite is largely preserved by its tetragonal counterpart. The B-cation off-center displacements and the resulting enhancement of the antibonding character in the conduction band give rise to the wider band gaps of the rhombohedral perovskites. The correlation between the structure, polarization orientation, and electronic structure lays a good foundation for understanding the physics of more complex perovskite solid solutions and provides a route for the design of photovoltaic perovskite ferroelectrics.

  5. Voltage-matched, monolithic, multi-band-gap devices

    SciTech Connect (OSTI)

    Wanlass, Mark W.; Mascarenhas, Angelo

    2006-08-22T23:59:59.000Z

    Monolithic, tandem, photonic cells include at least a first semiconductor layer and a second semiconductor layer, wherein each semiconductor layer includes an n-type region, a p-type region, and a given band-gap energy. Formed within each semiconductor layer is a sting of electrically connected photonic sub-cells. By carefully selecting the numbers of photonic sub-cells in the first and second layer photonic sub-cell string(s), and by carefully selecting the manner in which the sub-cells in a first and second layer photonic sub-cell string(s) are electrically connected, each of the first and second layer sub-cell strings may be made to achieve one or more substantially identical electrical characteristics.

  6. Voltage-Matched, Monolithic, Multi-Band-Gap Devices

    DOE Patents [OSTI]

    Wanlass, M. W.; Mascarenhas, A.

    2006-08-22T23:59:59.000Z

    Monolithic, tandem, photonic cells include at least a first semiconductor layer and a second semiconductor layer, wherein each semiconductor layer includes an n-type region, a p-type region, and a given band-gap energy. Formed within each semiconductor layer is a string of electrically connected photonic sub-cells. By carefully selecting the numbers of photonic sub-cells in the first and second layer photonic sub-cell string(s), and by carefully selecting the manner in which the sub-cells in a first and second layer photonic sub-cell string(s) are electrically connected, each of the first and second layer sub-cell strings may be made to achieve one or more substantially identical electrical characteristics.

  7. Band-Gap Engineering of Carbon Nanotubes with Grain Boundaries...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Band-Gap Engineering of Carbon Nanotubes with Grain Boundaries. Band-Gap Engineering of Carbon Nanotubes with Grain Boundaries. Abstract: Structure and electronic properties of...

  8. Thermophotovoltaic conversion using selective infrared line emitters and large band gap photovoltaic devices

    DOE Patents [OSTI]

    Brandhorst, Jr., Henry W. (Auburn, AL); Chen, Zheng (Auburn, AL)

    2000-01-01T23:59:59.000Z

    Efficient thermophotovoltaic conversion can be performed using photovoltaic devices with a band gap in the 0.75-1.4 electron volt range, and selective infrared emitters chosen from among the rare earth oxides which are thermally stimulated to emit infrared radiation whose energy very largely corresponds to the aforementioned band gap. It is possible to use thermovoltaic devices operating at relatively high temperatures, up to about 300.degree. C., without seriously impairing the efficiency of energy conversion.

  9. Significant Reduction in NiO Band Gap upon Formation of LixNi1?xO Alloys: Applications to Solar Energy Conversion

    SciTech Connect (OSTI)

    Alidoust, Nima; Toroker, Maytal; Keith, John A.; Carter, Emily A.

    2014-01-01T23:59:59.000Z

    Long-term sustainable solar energy conversion relies on identifying economical and versatile semiconductor materials with appropriate band structures for photovoltaic and photocatalytic applications (e.g., band gaps of ?1.5–2.0 eV). Nickel oxide (NiO) is an inexpensive yet highly promising candidate. Its charge-transfer character may lead to longer carrier lifetimes needed for higher efficiencies, and its conduction band edge is suitable for driving hydrogen evolution via water-splitting. However, NiO’s large band gap (?4 eV) severely limits its use in practical applications. Our first-principles quantum mechanics calculations show band gaps dramatically decrease to ?2.0 eV when NiO is alloyed with Li2O. We show that LixNi1?xO alloys (with x=0.125 and 0.25) are p-type semiconductors, contain states with no impurity levels in the gap and maintain NiO’s desirable charge-transfer character. Lastly, we show that the alloys have potential for photoelectrochemical applications, with band edges well-placed for photocatalytic hydrogen production and CO2 reduction, as well as in tandem dye-sensitized solar cells as a photocathode.

  10. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Substrate-Induced Band-Gap Opening in Epitaxial Graphene Substrate-Induced Band-Gap Opening in Epitaxial Graphene Print Wednesday, 26 March 2008 00:00 Prospective challengers to...

  11. Direct band gap narrowing in highly doped Ge

    E-Print Network [OSTI]

    Han, Zhaohong

    Direct band gap narrowing in highly doped n-type Ge is observed through photoluminescence measurements by determining the spectrum peak shift. A linear relationship between the direct band gap emission and carrier concentration ...

  12. acoustic band gaps: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    type of phononic crystals manufactured Institute of Physics. DOI: 10.10631.2167794 The propagation of acoustic waves in periodic composite Deymier, Pierre 2 Acoustic band gap...

  13. Effects of hole localization on limiting p-type conductivity in oxide and nitride semiconductors

    SciTech Connect (OSTI)

    Lyons, J. L.; Janotti, A.; Van de Walle, C. G. [Materials Department, University of California, Santa Barbara, California 93106-5050 (United States)

    2014-01-07T23:59:59.000Z

    We examine how hole localization limits the effectiveness of substitutional acceptors in oxide and nitride semiconductors and explain why p-type doping of these materials has proven so difficult. Using hybrid density functional calculations, we find that anion-site substitutional impurities in AlN, GaN, InN, and ZnO lead to atomic-like states that localize on the impurity atom itself. Substitution with cation-site impurities, on the other hand, triggers the formation of polarons that become trapped on nearest-neighbor anions, generally leading to large ionization energies for these acceptors. Unlike shallow effective-mass acceptors, these two types of deep acceptors couple strongly with the lattice, significantly affecting the optical properties and severely limiting prospects for achieving p-type conductivity in these wide-band-gap materials.

  14. SEMIEMPIRICAL MOLECULAR ORBITAL CALCULATIONS OF BAND GAPS OF CONJUGATED POLYMERS

    E-Print Network [OSTI]

    Goddard III, William A.

    SEMI­EMPIRICAL MOLECULAR ORBITAL CALCULATIONS OF BAND GAPS OF CONJUGATED POLYMERS Tahir Cagin Research and Development Center, Materials Labarotory, Polymer Branch, Wright Patterson AFB, Ohio 45433 geometries and energy band gaps of conjugated polymers. In this study, we used a modified version of semi

  15. Fabrication of Ceramic Layer-by-Layer Infrared Wavelength Photonic Band Gap Crystals

    SciTech Connect (OSTI)

    Henry Hao-Chuan Kang

    2004-12-19T23:59:59.000Z

    Photonic band gap (PBG) crystals, also known as photonic crystals, are periodic dielectric structures which form a photonic band gap that prohibit the propagation of electromagnetic (EM) waves of certain frequencies at any incident angles. Photonic crystals have several potential applications including zero-threshold semiconductor lasers, the inhibition of spontaneous emission, dielectric mirrors, and wavelength filters. If defect states are introduced in the crystals, light can be guided from one location to another or even a sharp bending of light in micron scale can be achieved. This generates the potential for optical waveguide and optical circuits, which will contribute to the improvement in the fiber-optic communications and the development of high-speed computers.

  16. Feasibility of band gap engineering of pyrite FeS?

    E-Print Network [OSTI]

    Sun, Ruoshi

    We use first-principles computations to investigate whether the band gap of pyrite FeS? can be increased by alloying in order to make it a more effective photovoltaic material. In addition to the isostructural compounds ...

  17. Substrate-induced band gap opening in epitaxial graphene

    E-Print Network [OSTI]

    2008-01-01T23:59:59.000Z

    H.A. Electronic states of graphene nanoribbons studied withS.G. Louie. Energy gaps in graphene nanoribbons. Phys. Rev.band-gap engineering of graphene nanoribbons. Phys. Rev.

  18. Characterization of Novel Semiconductor Alloys for Band Gap Engineering

    E-Print Network [OSTI]

    Broesler, Robert Joseph

    2010-01-01T23:59:59.000Z

    including high efficiency photovoltaics and light emittingEngineering 1.2.1 High Efficiency Photovoltaics 1.2.2 High1.2.1 High Efficiency Photovoltaics There has been

  19. Characterization of Novel Semiconductor Alloys for Band Gap Engineering

    E-Print Network [OSTI]

    Broesler, Robert Joseph

    2010-01-01T23:59:59.000Z

    and pulsed laser melting (PLM) to crystallize the amorphousrich crystalline phases, where as PLM results in GaAs-richFurther study into the effects of PLM on amorphous GaNAs is

  20. Recent emission channeling studies in wide band gap semiconductors

    E-Print Network [OSTI]

    Wahl, Ulrich; Rita, E; Alves, E; Carvalho-Soares, João; De Vries, Bart; Matias, V; Vantomme, A

    2005-01-01T23:59:59.000Z

    We present results of recent emission channeling experiments on the lattice location of implanted Fe and rare earths in wurtzite GaN and ZnO. In both cases the majority of implanted atoms are found on substitutional cation sites. The root mean square displacements from the ideal substitutional Ga and Zn sites are given and the stability of the Fe and rare earth lattice location against thermal annealing is discussed.

  1. Method of physical vapor deposition of metal oxides on semiconductors

    DOE Patents [OSTI]

    Norton, David P. (Knoxville, TN)

    2001-01-01T23:59:59.000Z

    A process for growing a metal oxide thin film upon a semiconductor surface with a physical vapor deposition technique in a high-vacuum environment and a structure formed with the process involves the steps of heating the semiconductor surface and introducing hydrogen gas into the high-vacuum environment to develop conditions at the semiconductor surface which are favorable for growing the desired metal oxide upon the semiconductor surface yet is unfavorable for the formation of any native oxides upon the semiconductor. More specifically, the temperature of the semiconductor surface and the ratio of hydrogen partial pressure to water pressure within the vacuum environment are high enough to render the formation of native oxides on the semiconductor surface thermodynamically unstable yet are not so high that the formation of the desired metal oxide on the semiconductor surface is thermodynamically unstable. Having established these conditions, constituent atoms of the metal oxide to be deposited upon the semiconductor surface are directed toward the surface of the semiconductor by a physical vapor deposition technique so that the atoms come to rest upon the semiconductor surface as a thin film of metal oxide with no native oxide at the semiconductor surface/thin film interface. An example of a structure formed by this method includes an epitaxial thin film of (001)-oriented CeO.sub.2 overlying a substrate of (001) Ge.

  2. Anodic Aluminum Oxide Templated Channel Electrodes via Atomic Layer A. B. F. Martinsona,b

    E-Print Network [OSTI]

    60439, USA Dye-sensitized solar cells (DSSCs) utilize high surface area metal oxide sintered particle aluminum oxide membranes via atomic layer deposition. Introduction Dye sensitized solar cells (DSSCs) These photoelectrochemical cells use molecular dyes to sensitize high area, wide band gap semiconductor oxide photoanodes

  3. Special purpose modes in photonic band gap fibers

    DOE Patents [OSTI]

    Spencer, James; Noble, Robert; Campbell, Sara

    2013-04-02T23:59:59.000Z

    Photonic band gap fibers are described having one or more defects suitable for the acceleration of electrons or other charged particles. Methods and devices are described for exciting special purpose modes in the defects including laser coupling schemes as well as various fiber designs and components for facilitating excitation of desired modes. Results are also presented showing effects on modes due to modes in other defects within the fiber and due to the proximity of defects to the fiber edge. Techniques and devices are described for controlling electrons within the defect(s). Various applications for electrons or other energetic charged particles produced by such photonic band gap fibers are also described.

  4. Molecular beam epitaxy of n-type ZnS: A wide band gap emitter for heterojunction PV devices

    E-Print Network [OSTI]

    Atwater, Harry

    Molecular beam epitaxy of n-type ZnS: A wide band gap emitter for heterojunction PV devices Jeffrey and AZO transparent conductive oxides did not. Applications to novel PV devices incorporating low electron-ray diffraction, zinc compounds. I. INTRODUCTION The growing interest in scalable, thin-film photovoltaics (PV

  5. Metal Oxide Semiconductor Nanoparticles Open the Door to New...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Innovations Technology available for licensing: novel nanometer-sized metal oxide semiconductors that allow targeting, initiating and control of in vitro and in vivo chemical...

  6. Multi-junction, monolithic solar cell using low-band-gap materials lattice matched to GaAs or Ge

    DOE Patents [OSTI]

    Olson, Jerry M. (Lakewood, CO); Kurtz, Sarah R. (Golden, CO); Friedman, Daniel J. (Lakewood, CO)

    2001-01-01T23:59:59.000Z

    A multi-junction, monolithic, photovoltaic solar cell device is provided for converting solar radiation to photocurrent and photovoltage with improved efficiency. The solar cell device comprises a plurality of semiconductor cells, i.e., active p/n junctions, connected in tandem and deposited on a substrate fabricated from GaAs or Ge. To increase efficiency, each semiconductor cell is fabricated from a crystalline material with a lattice constant substantially equivalent to the lattice constant of the substrate material. Additionally, the semiconductor cells are selected with appropriate band gaps to efficiently create photovoltage from a larger portion of the solar spectrum. In this regard, one semiconductor cell in each embodiment of the solar cell device has a band gap between that of Ge and GaAs. To achieve desired band gaps and lattice constants, the semiconductor cells may be fabricated from a number of materials including Ge, GaInP, GaAs, GaInAsP, GaInAsN, GaAsGe, BGaInAs, (GaAs)Ge, CuInSSe, CuAsSSe, and GaInAsNP. To further increase efficiency, the thickness of each semiconductor cell is controlled to match the photocurrent generated in each cell. To facilitate photocurrent flow, a plurality of tunnel junctions of low-resistivity material are included between each adjacent semiconductor cell. The conductivity or direction of photocurrent in the solar cell device may be selected by controlling the specific p-type or n-type characteristics for each active junction.

  7. Indirect-to-direct band gap transition in relaxed and strained Ge{sub 1?x?y}Si{sub x}Sn{sub y} ternary alloys

    SciTech Connect (OSTI)

    Attiaoui, Anis; Moutanabbir, Oussama [Department of Engineering Physics, École Polytechnique de Montréal, Montréal, C.P. 6079, Succ. Centre-Ville, Montréal, Québec H3C 3A7 (Canada)

    2014-08-14T23:59:59.000Z

    Sn-containing group IV semiconductors create the possibility to independently control strain and band gap thus providing a wealth of opportunities to develop an entirely new class of low dimensional systems, heterostructures, and silicon-compatible electronic and optoelectronic devices. With this perspective, this work presents a detailed investigation of the band structure of strained and relaxed Ge{sub 1?x?y}Si{sub x}Sn{sub y} ternary alloys using a semi-empirical second nearest neighbors tight binding method. This method is based on an accurate evaluation of the deformation potential constants of Ge, Si, and ?-Sn using a stochastic Monte-Carlo approach as well as a gradient based optimization method. Moreover, a new and efficient differential evolution approach is also developed to accurately reproduce the experimental effective masses and band gaps. Based on this, we elucidated the influence of lattice disorder, strain, and composition on Ge{sub 1?x?y}Si{sub x}Sn{sub y} band gap energy and directness. For 0???x???0.4 and 0???y???0.2, we found that tensile strain lowers the critical content of Sn needed to achieve a direct band gap semiconductor with the corresponding band gap energies below 0.76?eV. This upper limit decreases to 0.43?eV for direct gap, fully relaxed ternary alloys. The obtained transition to direct band gap is given by y?>?0.605?×?x?+?0.077 and y?>?1.364?×?x?+?0.107 for epitaxially strained and fully relaxed alloys, respectively. The effects of strain, at a fixed composition, on band gap directness were also investigated and discussed.

  8. Electronic structure of Pt based topological Heusler compounds with C1{sub b} structure and 'zero band gap'

    SciTech Connect (OSTI)

    Ouardi, Siham; Shekhar, Chandra; Fecher, Gerhard H.; Kozina, Xeniya; Stryganyuk, Gregory; Felser, Claudia [Institut fuer Anorganische Chemie und Analytische Chemie, Johannes Gutenberg-Universitaet, D-55099 Mainz (Germany); Ueda, Shigenori; Kobayashi, Keisuke [NIMS Beamline Station at SPring-8, National Institute for Materials Science, Hyogo 679-5148 (Japan)

    2011-05-23T23:59:59.000Z

    Besides of their well-known wide range of properties it was recently shown that many of the heavy Heusler semiconductors with 1:1:1 composition and C1{sub b} structure exhibit a zero band gap behavior and are topological insulators induced by their inverted band structure. In the present study, the electronic structure of the Heusler compounds PtYSb and PtLaBi was investigated by bulk sensitive hard x-ray photoelectron spectroscopy. The measured valence band spectra are clearly resolved and in well agreement to the first-principles calculations of the electronic structure of the compounds. The experimental results give clear evidence for the zero band gap state.

  9. Indirect-direct band gap transition through electric tuning in bilayer MoS{sub 2}

    SciTech Connect (OSTI)

    Zhang, Z. Y.; Si, M. S., E-mail: sims@lzu.edu.cn; Wang, Y. H.; Gao, X. P. [Key laboratory for Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology, Lanzhou University, Lanzhou 730 000 (China)] [Key laboratory for Magnetism and Magnetic Materials of the Ministry of Education, School of Physical Science and Technology, Lanzhou University, Lanzhou 730 000 (China); Sung, Dongchul; Hong, Suklyun [Graphene Research Institute, Sejong University, Seoul 143 747 (Korea, Republic of)] [Graphene Research Institute, Sejong University, Seoul 143 747 (Korea, Republic of); He, Junjie [Department of Physics, Xiangtan University, Hunan 411 105 (China)] [Department of Physics, Xiangtan University, Hunan 411 105 (China)

    2014-05-07T23:59:59.000Z

    We investigate the electronic properties of bilayer MoS{sub 2} exposed to an external electric field by using first-principles calculations. It is found that a larger interlayer distance, referring to that by standard density functional theory (DFT) with respect to that by DFT with empirical dispersion corrections, makes indirect-direct band gap transition possible by electric control. We show that external electric field effectively manipulates the valence band contrast between the K- and ?-valleys by forming built-in electric dipole fields, which realizes an indirect-direct transition before a semiconductor-metal transition happens. Our results provide a novel efficient access to tune the electronic properties of two-dimensional layered materials.

  10. Transport band gap opening at metal–organic interfaces

    SciTech Connect (OSTI)

    Haidu, Francisc, E-mail: francisc.haidu@physik.tu-chemnitz.de; Salvan, Georgeta; Zahn, Dietrich R. T. [Semiconductor Physics, Technische Universität Chemnitz, D-09107 Chemnitz (Germany); Smykalla, Lars; Hietschold, Michael [Solid Surfaces Analysis, Technische Universität Chemnitz, D-09107 Chemnitz (Germany); Knupfer, Martin [Electronic and Optical Properties Department, IFW Dresden, D-01171 Dresden (Germany)

    2014-07-01T23:59:59.000Z

    The interface formation between copper phthalocyanine (CuPc) and two representative metal substrates, i.e., Au and Co, was investigated by the combination of ultraviolet photoelectron spectroscopy and inverse photoelectron spectroscopy. The occupied and unoccupied molecular orbitals and thus the transport band gap of CuPc are highly influenced by film thickness, i.e., molecule substrate distance. Due to the image charge potential given by the metallic substrates the transport band gap of CuPc “opens” from (1.4?±?0.3) eV for 1?nm thickness to (2.2?±?0.3) eV, and saturates at this value above 10?nm CuPc thickness. The interface dipoles with values of 1.2?eV and 1.0?eV for Au and Co substrates, respectively, predominantly depend on the metal substrate work functions. X-ray photoelectron spectroscopy measurements using synchrotron radiation provide detailed information on the interaction between CuPc and the two metal substrates. While charge transfer from the Au or Co substrate to the Cu metal center is present only at sub-monolayer coverages, the authors observe a net charge transfer from the molecule to the Co substrate for films in the nm range. Consequently, the Fermi level is shifted as in the case of a p-type doping of the molecule. This is, however, a competing phenomenon to the energy band shifts due to the image charge potential.

  11. Wave propagation in ordered, disordered, and nonlinear photonic band gap materials

    SciTech Connect (OSTI)

    Lidorikis, Elefterios

    1999-12-10T23:59:59.000Z

    Photonic band gap materials are artificial dielectric structures that give the promise of molding and controlling the flow of optical light the same way semiconductors mold and control the electric current flow. In this dissertation the author studied two areas of photonic band gap materials. The first area is focused on the properties of one-dimensional PBG materials doped with Kerr-type nonlinear material, while, the second area is focused on the mechanisms responsible for the gap formation as well as other properties of two-dimensional PBG materials. He first studied, in Chapter 2, the general adequacy of an approximate structure model in which the nonlinearity is assumed to be concentrated in equally-spaced very thin layers, or 6-functions, while the rest of the space is linear. This model had been used before, but its range of validity and the physical reasons for its limitations were not quite clear yet. He performed an extensive examination of many aspects of the model's nonlinear response and comparison against more realistic models with finite-width nonlinear layers, and found that the d-function model is quite adequate, capturing the essential features in the transmission characteristics. The author found one exception, coming from the deficiency of processing a rigid bottom band edge, i.e. the upper edge of the gaps is always independent of the refraction index contrast. This causes the model to miss-predict that there are no soliton solutions for a positive Kerr-coefficient, something known to be untrue.

  12. Ultraviolet GaN photodetectors on Si via oxide buffer heterostructures with integrated short period oxide-based distributed Bragg reflectors and leakage suppressing metal-oxide-semiconductor contacts

    SciTech Connect (OSTI)

    Szyszka, A., E-mail: szyszka@ihp-microelectronics.com, E-mail: adam.szyszka@pwr.wroc.pl [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw (Poland); Lupina, L.; Lupina, G.; Schubert, M. A.; Zaumseil, P. [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); Haeberlen, M.; Storck, P.; Thapa, S. B. [Siltronic, Hanns-Seidel-Platz 4, 81737 München (Germany); Schroeder, T. [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); BTU Cottbus-Senftenberg, Konrad-Zuse-Strasse 1, 03046 Cottbus (Germany)

    2014-08-28T23:59:59.000Z

    Based on a novel double step oxide buffer heterostructure approach for GaN integration on Si, we present an optimized Metal-Semiconductor-Metal (MSM)-based Ultraviolet (UV) GaN photodetector system with integrated short-period (oxide/Si) Distributed Bragg Reflector (DBR) and leakage suppressing Metal-Oxide-Semiconductor (MOS) electrode contacts. In terms of structural properties, it is demonstrated by in-situ reflection high energy electron diffraction and transmission electron microscopy-energy dispersive x-ray studies that the DBR heterostructure layers grow with high thickness homogeneity and sharp interface structures sufficient for UV applications; only minor Si diffusion into the Y{sub 2}O{sub 3} films is detected under the applied thermal growth budget. As revealed by comparative high resolution x-ray diffraction studies on GaN/oxide buffer/Si systems with and without DBR systems, the final GaN layer structure quality is not significantly influenced by the growth of the integrated DBR heterostructure. In terms of optoelectronic properties, it is demonstrated that—with respect to the basic GaN/oxide/Si system without DBR—the insertion of (a) the DBR heterostructures and (b) dark current suppressing MOS contacts enhances the photoresponsivity below the GaN band-gap related UV cut-off energy by almost up to two orders of magnitude. Given the in-situ oxide passivation capability of grown GaN surfaces and the one order of magnitude lower number of superlattice layers in case of higher refractive index contrast (oxide/Si) systems with respect to classical III-N DBR superlattices, virtual GaN substrates on Si via functional oxide buffer systems are thus a promising robust approach for future GaN-based UV detector technologies.

  13. Single-junction solar cells with the optimum band gap for terrestrial concentrator applications

    DOE Patents [OSTI]

    Wanlass, Mark W. (Golden, CO)

    1994-01-01T23:59:59.000Z

    A single-junction solar cell having the ideal band gap for terrestrial concentrator applications. Computer modeling studies of single-junction solar cells have shown that the presence of absorption bands in the direct spectrum has the effect of "pinning" the optimum band gap for a wide range of operating conditions at a value of 1.14.+-.0.02 eV. Efficiencies exceeding 30% may be possible at high concentration ratios for devices with the ideal band gap.

  14. Surface Plasmon Band Gap Sensor A new sensor for robust on-field biosensing (SEN 1)

    E-Print Network [OSTI]

    Arnaud Benahmed; Robert Lam; Chih-Ming Ho

    2006-01-01T23:59:59.000Z

    Networked Sensing Surface Plasmon Band Gap Sensor A newsensing concept Nanostructures for Surface Plasmon SensingSurface Plasmon are surface EM waves whose wavelength is

  15. PHYSICAL REVIEW B 90, 115209 (2014) Computational search for direct band gap silicon crystals

    E-Print Network [OSTI]

    Lee, Jooyoung

    2014-01-01T23:59:59.000Z

    of microns thick, while solar cells made from direct band gap materials (such as CdTe, CIGS, or CZTS) can

  16. Thermoelectric power measurements of wide band gap semiconducting Chul-Ho Lee,1

    E-Print Network [OSTI]

    Kim, Philip

    Thermoelectric power measurements of wide band gap semiconducting nanowires Chul-Ho Lee,1 Gyu online 13 January 2009 We investigated the temperature-dependent thermoelectric power TEP of individual concentration in wide band gap semiconducting nano- wires employing temperature-dependent thermoelectric power

  17. Light trapping design for low band-gap polymer solar cells

    E-Print Network [OSTI]

    John, Sajeev

    Light trapping design for low band-gap polymer solar cells Stephen Foster1,* and Sajeev John1,2 1 demonstrate numerically a 2-D nanostructured design for light trapping in a low band-gap polymer solar cell observe an enhancement in solar absorption of almost 40% relative to a planar cell. Improvements

  18. Band gap changes of GaN shocked to 13 GPa M. D. McCluskeya)

    E-Print Network [OSTI]

    McCluskey, Matthew

    Band gap changes of GaN shocked to 13 GPa M. D. McCluskeya) and Y. M. Gupta Institute for Shock, California 94304 Received 24 October 2001; accepted for publication 19 December 2001 The band gap of GaN in shock-wave experiments. Shock waves were generated by impacting the GaN samples with c-cut sapphire

  19. Al-doped HfO2/In0.53Ga0.47As metal-oxide-semiconductor capaci

    E-Print Network [OSTI]

    Stemmer, Susanne

    2011-01-01T23:59:59.000Z

    MOS (Metal Oxide Semiconductor) Phys- ics and Technologywas funded by the Semiconductor Re- search Corporation0.47 As metal-oxide-semiconductor capacitors Yoontae Hwang,

  20. Electrical characterization of native-oxide InAlPGaAs metal-oxide-semiconductor heterostructures using

    E-Print Network [OSTI]

    Electrical characterization of native-oxide InAlPÕGaAs metal-oxide-semiconductor heterostructures 8 December 2003; accepted 20 January 2004 InAIP native oxide/GaAs metal-oxide-semiconductor MOS of Schottky gates can lead to excessive gate leakage current and also restrict the forward gate bias to only

  1. Single-junction solar cells with the optimum band gap for terrestrial concentrator applications

    DOE Patents [OSTI]

    Wanlass, M.W.

    1994-12-27T23:59:59.000Z

    A single-junction solar cell is described having the ideal band gap for terrestrial concentrator applications. Computer modeling studies of single-junction solar cells have shown that the presence of absorption bands in the direct spectrum has the effect of ''pinning'' the optimum band gap for a wide range of operating conditions at a value of 1.14[+-]0.02 eV. Efficiencies exceeding 30% may be possible at high concentration ratios for devices with the ideal band gap. 7 figures.

  2. Generic process for preparing a crystalline oxide upon a group IV semiconductor substrate

    DOE Patents [OSTI]

    McKee, Rodney A. (Kingston, TN); Walker, Frederick J. (Oak Ridge, TN); Chisholm, Matthew F. (Oak Ridge, TN)

    2000-01-01T23:59:59.000Z

    A process for growing a crystalline oxide epitaxially upon the surface of a Group IV semiconductor, as well as a structure constructed by the process, is described. The semiconductor can be germanium or silicon, and the crystalline oxide can generally be represented by the formula (AO).sub.n (A'BO.sub.3).sub.m in which "n" and "m" are non-negative integer repeats of planes of the alkaline earth oxides or the alkaline earth-containing perovskite oxides. With atomic level control of interfacial thermodynamics in a multicomponent semiconductor/oxide system, a highly perfect interface between a semiconductor and a crystalline oxide can be obtained.

  3. Calculation of wakefields in a 17 GHz beam-driven photonic band-gap accelerator structure

    E-Print Network [OSTI]

    Hu, Min

    We present the theoretical analysis and computer simulation of the wakefields in a 17 GHz photonic band-gap (PBG) structure for accelerator applications. Using the commercial code CST Particle Studio, the fundamental ...

  4. Tunable frequency band-gap and pulse propagation in a strongly nonlinear diatomic chain

    E-Print Network [OSTI]

    E. B. Herbold; J. Kim; V. F. Nesterenko; S. Wang; C. Daraio

    2008-06-26T23:59:59.000Z

    One-dimensional nonlinear phononic crystals have been assembled from periodic diatomic chains of stainless steel cylinders alternated with Polytetrafluoroethylene (PTFE) spheres. We report the presence of acoustic band gaps in the dispersion relation of the linearized systems and study the transformation of single and multiple pulses in linear, nonlinear and strongly nonlinear regimes with numerical calculations and experiments. The limiting frequencies of the band gap are within the audible frequency range (20-20,000 Hz) and can be tuned by varying the particle's material properties, mass and initial compression. Pulses rapidly transform within very short distances from the impacted end due to the influence of the band gap in the linear and in nonlinear elastic chains. The effects of an in situ band gap created by a mean dynamic compression are observed in the strongly nonlinear wave regime.

  5. Correlation between surface chemistry, density and band gap in...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    of WO3 films. The XPS analyses indicate the formation of stoichiometric WO3 with tungsten existing in fully oxidized valence state (W6+). However, WO3 films grown at high...

  6. Science and applications of infrared semiconductor nanocrystals

    E-Print Network [OSTI]

    Geyer, Scott Mitchell

    2010-01-01T23:59:59.000Z

    In this work we study several applications of semiconductor nanocrystals (NCs) with infrared band gaps. In the first half, we explore the physics of two systems with applications in NC based photovoltaics. The physics of ...

  7. L{sub g}?=?100?nm In{sub 0.7}Ga{sub 0.3}As quantum well metal-oxide semiconductor field-effect transistors with atomic layer deposited beryllium oxide as interfacial layer

    SciTech Connect (OSTI)

    Koh, D., E-mail: dh.koh@utexas.edu, E-mail: Taewoo.Kim@sematech.org [Department of Electrical and Computer Engineering, Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758 (United States); SEMATECH, Inc., Albany, New York 12203 (United States); Kwon, H. M. [Department of Electronics Engineering, Chungnam National University, Daejeon 305-764 (Korea, Republic of); Kim, T.-W., E-mail: dh.koh@utexas.edu, E-mail: Taewoo.Kim@sematech.org; Veksler, D.; Gilmer, D.; Kirsch, P. D. [SEMATECH, Inc., Albany, New York 12203 (United States); Kim, D.-H. [SEMATECH, Inc., Albany, New York 12203 (United States); GLOBALFOUNDRIES, Malta, New York 12020 (United States); Hudnall, Todd W. [Department of Chemistry and Biochemistry, Texas State University, San Marcos, Texas, 78666 (United States); Bielawski, Christopher W. [Department of Chemistry and Biochemistry, The University of Texas at Austin, Austin, Texas 78712 (United States); Maszara, W. [GLOBALFOUNDRIES, Santa Clara, California 95054 (United States); Banerjee, S. K. [Department of Electrical and Computer Engineering, Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758 (United States)

    2014-04-21T23:59:59.000Z

    In this study, we have fabricated nanometer-scale channel length quantum-well (QW) metal-oxide-semiconductor field effect transistors (MOSFETs) incorporating beryllium oxide (BeO) as an interfacial layer. BeO has high thermal stability, excellent electrical insulating characteristics, and a large band-gap, which make it an attractive candidate for use as a gate dielectric in making MOSFETs. BeO can also act as a good diffusion barrier to oxygen owing to its small atomic bonding length. In this work, we have fabricated In{sub 0.53}Ga{sub 0.47}As MOS capacitors with BeO and Al{sub 2}O{sub 3} and compared their electrical characteristics. As interface passivation layer, BeO/HfO{sub 2} bilayer gate stack presented effective oxide thickness less 1 nm. Furthermore, we have demonstrated In{sub 0.7}Ga{sub 0.3}As QW MOSFETs with a BeO/HfO{sub 2} dielectric, showing a sub-threshold slope of 100?mV/dec, and a transconductance (g{sub m,max}) of 1.1 mS/?m, while displaying low values of gate leakage current. These results highlight the potential of atomic layer deposited BeO for use as a gate dielectric or interface passivation layer for III–V MOSFETs at the 7?nm technology node and/or beyond.

  8. Band gap engineering for graphene by using Na{sup +} ions

    SciTech Connect (OSTI)

    Sung, S. J.; Lee, P. R.; Kim, J. G.; Ryu, M. T.; Park, H. M.; Chung, J. W., E-mail: jwc@postech.ac.kr [Department of Physics, Pohang University of Science and Technology, Pohang 790-784 (Korea, Republic of)

    2014-08-25T23:59:59.000Z

    Despite the noble electronic properties of graphene, its industrial application has been hindered mainly by the absence of a stable means of producing a band gap at the Dirac point (DP). We report a new route to open a band gap (E{sub g}) at DP in a controlled way by depositing positively charged Na{sup +} ions on single layer graphene formed on 6H-SiC(0001) surface. The doping of low energy Na{sup +} ions is found to deplete the ?* band of graphene above the DP, and simultaneously shift the DP downward away from Fermi energy indicating the opening of E{sub g}. The band gap increases with increasing Na{sup +} coverage with a maximum E{sub g}?0.70?eV. Our core-level data, C 1s, Na 2p, and Si 2p, consistently suggest that Na{sup +} ions do not intercalate through graphene, but produce a significant charge asymmetry among the carbon atoms of graphene to cause the opening of a band gap. We thus provide a reliable way of producing and tuning the band gap of graphene by using Na{sup +} ions, which may play a vital role in utilizing graphene in future nano-electronic devices.

  9. Photocatalytic Oxidation of Aqueous Organic Contaminants by Semiconductors using Visible Light Radiation

    E-Print Network [OSTI]

    Meyers, Steven D.

    Photocatalytic Oxidation of Aqueous Organic Contaminants by Semiconductors using Visible Light semiconductor, InVO4, mechanically alloyed to TiO2, to shift photo-initiation into the visible range. 3, the ratio of semiconductors had no significant impact on the reaction rate. Long term goal - develop

  10. One-dimensional electromagnetic band gap structures formed by discharge plasmas in a waveguide

    SciTech Connect (OSTI)

    Arkhipenko, V. I.; Simonchik, L. V., E-mail: l.simonchik@dragon.bas-net.by; Usachonak, M. S. [B.I. Stepanov Institute of Physics of the NAS of Belarus, Ave. Nezavisimostsi 68, 220072 Minsk (Belarus); Callegari, Th.; Sokoloff, J. [Université de Toulouse, UPS, INPT, LAPLACE, Laboratoire Plasma et Conversion d'Energie, 118 route de Narbonne, F-31062 Toulouse cedex 9 (France)

    2014-09-28T23:59:59.000Z

    We demonstrate the ability to develop one-dimensional electromagnetic band gap structure in X-band waveguide solely by using the positive columns of glow discharges in neon at the middle pressure. Plasma inhomogeneities are distributed uniformly along a typical X-band waveguide with cross section of 23?×?10?mm{sup 2}. It is shown that electron densities larger than 10{sup 14?}cm{sup ?3} are needed in order to create an effective one-dimensional electromagnetic band gap structure. Some applications for using the one-dimensional electromagnetic band gap structure in waveguide as a control of microwave (broadband filter and device for variation of pulse duration) are demonstrated.

  11. Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom

    DOE Patents [OSTI]

    Gupta, Sandhya (Bloomington, MN); Tuttle, Gary L. (Ames, IA); Sigalas, Mihail (Ames, IA); McCalmont, Jonathan S. (Ames, IA); Ho, Kai-Ming (Ames, IA)

    2001-08-14T23:59:59.000Z

    A method of manufacturing a flexible metallic photonic band gap structure operable in the infrared region, comprises the steps of spinning on a first layer of dielectric on a GaAs substrate, imidizing this first layer of dielectric, forming a first metal pattern on this first layer of dielectric, spinning on and imidizing a second layer of dielectric, and then removing the GaAs substrate. This method results in a flexible metallic photonic band gap structure operable with various filter characteristics in the infrared region. This method may be used to construct multi-layer flexible metallic photonic band gap structures. Metal grid defects and dielectric separation layer thicknesses are adjusted to control filter parameters.

  12. Direct measurements of band gap grading in polycrystalline CIGS solar cells

    E-Print Network [OSTI]

    Heinrich, M P; Zhang, Y; Kiowski, O; Powalla, M; Lemmer, U; Slobodskyy, A

    2010-01-01T23:59:59.000Z

    We present direct measurements of depth-resolved band gap variations of CuIn(1-x)Ga(x)Se2 thin-film solar cell absorbers. A new measurement technique combining parallel measurements of local thin-film interference and spectral photoluminescence was developed for this purpose. We find sample-dependent correlation parameters between measured band gap depth and composition profiles, and emphasize the importance of direct measurements. These results bring a quantitative insight into the electronic properties of the solar cells and open a new way to analyze parameters that determine the efficiency of solar cells.

  13. Direct measurements of band gap grading in polycrystalline CIGS solar cells

    E-Print Network [OSTI]

    M. P. Heinrich; Z-H. Zhang; Y. Zhang; O. Kiowski; M. Powalla; U. Lemmer; A. Slobodskyy

    2010-09-20T23:59:59.000Z

    We present direct measurements of depth-resolved band gap variations of CuIn(1-x)Ga(x)Se2 thin-film solar cell absorbers. A new measurement technique combining parallel measurements of local thin-film interference and spectral photoluminescence was developed for this purpose. We find sample-dependent correlation parameters between measured band gap depth and composition profiles, and emphasize the importance of direct measurements. These results bring a quantitative insight into the electronic properties of the solar cells and open a new way to analyze parameters that determine the efficiency of solar cells.

  14. Surface Plasmon Polariton Assisted Optical Switching in Noble Metal Nanoparticle Systems: A Sub-Band Gap Approach

    E-Print Network [OSTI]

    Dhara, S

    2015-01-01T23:59:59.000Z

    In a proposed book chapter surface plasmon polariton assisted optical switching in noble metal nanoparticle systems is discussed in the sub-band gap formalism.

  15. New Reconfigurable Power Divider Based on Radial Waveguide and Cylindrical Electromagnetic Band Gap Structure for Low

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Structure for Low Power and Low Cost Smart Antenna Systems Halim Boutayeb, Paul Watson and Toby Kemp AntennaNew Reconfigurable Power Divider Based on Radial Waveguide and Cylindrical Electromagnetic Band Gap halim.boutayeb@huawei.com Abstract--A new low power and low cost technique is proposed for designing

  16. Exploiting pattern transformation to tune phononic band gaps in a two-dimensional granular crystal

    E-Print Network [OSTI]

    ) cylinders is investigated numerically. This system was previously shown to undergo a pattern transformation with uniaxial compression by Go¨ncu¨ et al. [Soft Matter 7, 2321 (2011)]. The dispersion relations, or elastic waves in certain frequency ranges known as band gaps is an important feature of these materials

  17. Energy Band-Gap Engineering of Graphene Nanoribbons Melinda Y. Han,1

    E-Print Network [OSTI]

    Kim, Philip

    , New York, New York 10027, USA 2 Department of Physics, Columbia University, New York, New York 10027Energy Band-Gap Engineering of Graphene Nanoribbons Melinda Y. Han,1 Barbaros O¨ zyilmaz,2 Yuanbo an energy gap near the charge neutrality point. Individual graphene layers are contacted with metal

  18. Plasma process-induced band-gap modifications of a strained SiGe heterostructure

    E-Print Network [OSTI]

    Misra, Durgamadhab "Durga"

    Plasma process-induced band-gap modifications of a strained SiGe heterostructure P. K. Swain,a) S the strain of coherently strained SiGe. This work investigates the change in valence-band discontinuity in plasma-exposed SiGe films due to strain relaxation by a capacitance­voltage (C­V) profiling technique

  19. Chemical Synthesis of Nano-Sized particles of Lead Oxide and their Characterization Studies

    E-Print Network [OSTI]

    M. Alagar; T. Theivasanthi; A. Kubera Raja

    2012-04-04T23:59:59.000Z

    The quantum dots of semiconductor display novel and interesting phenomena that have not been in the bulk material. The color tunability is one of the most attractive characteristics in II-VI semiconductor nanoparticles such as CdS, ZnS, CdSe, ZnSe and PbO. In this work, the semiconductor lead oxide nanoparticles are prepared by chemical method. The average particle size, specific surface area, crystallinity index are estimated from XRD analysis. The structural, functional groups and optical characters are analyzed with using of SEM, FTIR and UV- Visible techniques. The optical band gap value has also been determined.

  20. Chemical Synthesis of Nano-Sized particles of Lead Oxide and their Characterization Studies

    E-Print Network [OSTI]

    Alagar, M; Raja, A Kubera; 10.3923/jas.2012.398.401

    2012-01-01T23:59:59.000Z

    The quantum dots of semiconductor display novel and interesting phenomena that have not been in the bulk material. The color tunability is one of the most attractive characteristics in II-VI semiconductor nanoparticles such as CdS, ZnS, CdSe, ZnSe and PbO. In this work, the semiconductor lead oxide nanoparticles are prepared by chemical method. The average particle size, specific surface area, crystallinity index are estimated from XRD analysis. The structural, functional groups and optical characters are analyzed with using of SEM, FTIR and UV- Visible techniques. The optical band gap value has also been determined.

  1. Reflection technique for thermal mapping of semiconductors

    DOE Patents [OSTI]

    Walter, Martin J. (Lee, NY)

    1989-06-20T23:59:59.000Z

    Semiconductors may be optically tested for their temperatures by illuminating them with tunable monochromatic electromagnetic radiation and observing the light reflected off of them. A transition point will occur when the wavelength of the light corresponds with the actual band gap energy of the semiconductor. At the transition point, the image of the semiconductor will appreciably darken as the light is transmitted through it, rather than being reflected off of it. The wavelength of the light at the transition point corresponds to the actual band gap energy and the actual temperature of the semiconductor.

  2. Semiconductor Quantum Rods as Single Molecule Fluorescent Biological Labels

    E-Print Network [OSTI]

    2006-01-01T23:59:59.000Z

    A. , Gu, W. , Larabell, C. & Alivisatos, A.P. SemiconductorHu, J.T. , Yang, W.D. & Alivisatos, A.P. Band gap variationZanchet, D. , Weiss, S. , ,Alivisatos, A. P. Synthesis and

  3. Periodic dielectric structure for production of photonic band gap and method for fabricating the same

    DOE Patents [OSTI]

    Ozbay, E.; Tuttle, G.; Michel, E.; Ho, K.M.; Biswas, R.; Chan, C.T.; Soukoulis, C.

    1995-04-11T23:59:59.000Z

    A method is disclosed for fabricating a periodic dielectric structure which exhibits a photonic band gap. Alignment holes are formed in a wafer of dielectric material having a given crystal orientation. A planar layer of elongate rods is then formed in a section of the wafer. The formation of the rods includes the step of selectively removing the dielectric material of the wafer between the rods. The formation of alignment holes and layers of elongate rods and wafers is then repeated to form a plurality of patterned wafers. A stack of patterned wafers is then formed by rotating each successive wafer with respect to the next-previous wafer, and then placing the successive wafer on the stack. This stacking results in a stack of patterned wafers having a four-layer periodicity exhibiting a photonic band gap. 42 figures.

  4. Pre-Stressed Viscoelastic Composites: Effective Incremental Moduli and Band-Gap Tuning

    SciTech Connect (OSTI)

    Parnell, William J. [School of Mathematics, Alan Turing Building, University of Manchester, Manchester, M13 9PL (United Kingdom)

    2010-09-30T23:59:59.000Z

    We study viscoelastic wave propagation along pre-stressed nonlinear elastic composite bars. In the pre-stressed state we derive explicit forms for the effective incremental storage and loss moduli with dependence on the pre-stress. We also derive a dispersion relation for the effective wavenumber in the case of arbitrary frequency, hence permitting a study of viscoelastic band-gap tuning via pre-stress.

  5. Engineering of the band gap and optical properties of thin films of yttrium hydride

    SciTech Connect (OSTI)

    You, Chang Chuan; Mongstad, Trygve; Maehlen, Jan Petter; Karazhanov, Smagul, E-mail: smagulk@ife.no [Institute for Energy Technology, P.O. Box 40, NO-2027 Kjeller (Norway)

    2014-07-21T23:59:59.000Z

    Thin films of oxygen-containing yttrium hydride show photochromic effect at room temperature. In this work, we have studied structural and optical properties of the films deposited at different deposition pressures, discovering the possibility of engineering the optical band gap by variation of the oxygen content. In sum, the transparency of the films and the wavelength range of photons triggering the photochromic effect can be controlled by variation of the deposition pressure.

  6. Band gap tunning in BN-doped graphene systems with high carrier mobility

    SciTech Connect (OSTI)

    Kaloni, T. P.; Schwingenschlögl, U., E-mail: udo.schwingenschlogl@kaust.edu.sa [KAUST, PSE Division, Thuwal 23955-6900 (Saudi Arabia); Joshi, R. P.; Adhikari, N. P. [Central Department of Physics, Tribhuvan University, Kirtipur, Kathmandu (Nepal)

    2014-02-17T23:59:59.000Z

    Using density functional theory, we present a comparative study of the electronic properties of BN-doped graphene monolayer, bilayer, trilayer, and multilayer systems. In addition, we address a superlattice of pristine and BN-doped graphene. Five doping levels between 12.5% and 75% are considered, for which we obtain band gaps from 0.02?eV to 2.43?eV. We demonstrate a low effective mass of the charge carriers.

  7. Photonic-band-gap properties for two-component slow light

    SciTech Connect (OSTI)

    Ruseckas, J.; Kudriasov, V.; Juzeliunas, G.; Unanyan, R. G.; Otterbach, J.; Fleischhauer, M. [Institute of Theoretical Physics and Astronomy, Vilnius University, A. Gostauto 12, Vilnius 01108 (Lithuania); Fachbereich Physik and Research Center OPTIMAS, Technische Universitaet Kaiserslautern, Kaiserslautern D-67663 (Germany)

    2011-06-15T23:59:59.000Z

    We consider two-component ''spinor'' slow light in an ensemble of atoms coherently driven by two pairs of counterpropagating control laser fields in a double tripod-type linkage scheme. We derive an equation of motion for the spinor slow light (SSL) representing an effective Dirac equation for a massive particle with the mass determined by the two-photon detuning. By changing the detuning the atomic medium acts as a photonic crystal with a controllable band gap. If the frequency of the incident probe light lies within the band gap, the light experiences reflection from the sample and can tunnel through it. For frequencies outside the band gap, the transmission and reflection probabilities oscillate with the increasing length of the sample. In both cases the reflection takes place into the complementary mode of the probe field. We investigate the influence of the finite excited state lifetime on the transmission and reflection coefficients of the probe light. We discuss possible experimental implementations of the SSL using alkali-metal atoms such as rubidium or sodium.

  8. Blocking a wave: Frequency band gaps in ice shelves with periodic crevasses

    E-Print Network [OSTI]

    Julian Freed-Brown; Jason M. Amundson; Douglas R. MacAyeal; Wendy W. Zhang

    2011-12-14T23:59:59.000Z

    We assess how the propagation of high-frequency elastic-flexural waves through an ice shelf is modified by the presence of spatially periodic crevasses. Analysis of the normal modes supported by the ice shelf with and without crevasses reveals that a periodic crevasse distribution qualitatively changes the mechanical response. The normal modes of an ice shelf free of crevasses are evenly distributed as a function of frequency. In contrast, the normal modes of a crevasse-ridden ice shelf are distributed unevenly. There are "band gaps", frequency ranges over which no eigenmodes exist. A model ice shelf that is 50 km in lateral extent and 300 m thick with crevasses spaced 500 m apart has a band gap from 0.2 to 0.38 Hz. This is a frequency range relevant for ocean wave/ice-shelf interactions. When the outermost edge of the crevassed ice shelf is oscillated at a frequency within the band gap, the ice shelf responds very differently from a crevasse-free ice shelf. The flexural motion of the crevassed ice shelf is confined to a small region near the outermost edge of the ice shelf and effectively "blocked" from reaching the interior.

  9. Blocking a wave: Frequency band gaps in ice shelves with periodic crevasses

    E-Print Network [OSTI]

    Freed-Brown, Julian; MacAyeal, Douglas R; Zhang, Wendy W

    2011-01-01T23:59:59.000Z

    We assess how the propagation of high-frequency elastic-flexural waves through an ice shelf is modified by the presence of spatially periodic crevasses. Analysis of the normal modes supported by the ice shelf with and without crevasses reveals that a periodic crevasse distribution qualitatively changes the mechanical response. The normal modes of an ice shelf free of crevasses are evenly distributed as a function of frequency. In contrast, the normal modes of a crevasse-ridden ice shelf are distributed unevenly. There are "band gaps", frequency ranges over which no eigenmodes exist. A model ice shelf that is 50 km in lateral extent and 300 m thick with crevasses spaced 500 m apart has a band gap from 0.2 to 0.38 Hz. This is a frequency range relevant for ocean wave/ice-shelf interactions. When the outermost edge of the crevassed ice shelf is oscillated at a frequency within the band gap, the ice shelf responds very differently from a crevasse-free ice shelf. The flexural motion of the crevassed ice shelf is c...

  10. Band gap reduction in GaNSb alloys due to the anion mismatch

    SciTech Connect (OSTI)

    Veal, T.D.; Piper, L.F.J.; Jollands, S.; Bennett, B.R.; Jefferson, P.H.; Thomas, P.A.; McConville, C.F.; Murdin, B.N.; Buckle, L.; Smith, G.W.; Ashley, T. [Department of Physics, University of Warwick, Coventry, CV4 7AL (United Kingdom); School of Electronics and Physical Sciences, University of Surrey, Guildford, GU2 5XH (United Kingdom); QinetiQ Ltd., St. Andrews Road, Malvern, Worcestershire, WR14 3PS (United Kingdom)

    2005-09-26T23:59:59.000Z

    The structural and optoelectronic properties in GaN{sub x}Sb{sub 1-x} alloys (0{<=}x<0.02) grown by molecular-beam epitaxy on both GaSb substrates and AlSb buffer layers on GaAs substrates are investigated. High-resolution x-ray diffraction (XRD) and reciprocal space mapping indicate that the GaN{sub x}Sb{sub 1-x} epilayers are of high crystalline quality and the alloy composition is found to be independent of substrate, for identical growth conditions. The band gap of the GaNSb alloys is found to decrease with increasing nitrogen content from absorption spectroscopy. Strain-induced band-gap shifts, Moss-Burstein effects, and band renormalization were ruled out by XRD and Hall measurements. The band-gap reduction is solely due to the substitution of dilute amounts of highly electronegative nitrogen for antimony, and is greater than observed in GaNAs with the same N content.

  11. active complementary metal-oxide-semiconductor: Topics by E-print...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Metal Oxide Semiconductor (CMOS) tech- Corresponding author. Email address: antonio 465 Tycho Brahe CCD CMOS Physics Websites Summary: 12;12;12;117 Tycho Brahe 20 19 70 CCD...

  12. DESIGN, GROWTH, FABRICATION AND CHARACTERIZATION OF HIGH-BAND GAP InGaN/GaN SOLAR CELLS

    E-Print Network [OSTI]

    Honsberg, Christiana

    DESIGN, GROWTH, FABRICATION AND CHARACTERIZATION OF HIGH-BAND GAP InGaN/GaN SOLAR CELLS Omkar Jani1 with a band gap of 2.4 eV or greater. InxGa1-xN is one of a few alloys that can meet this key requirement. InGaN.4 eV. InGaN has the appropriate optical properties and has been well demonstrated for light

  13. Analysis of plasma-magnetic photonic crystal with a tunable band gap

    SciTech Connect (OSTI)

    Mehdian, H.; Mohammadzahery, Z.; Hasanbeigi, A. [Department of Physics and Plasma Research Institute of Tarbiat Moallem University, 49 Dr Mofatteh Avenue, Tehran 15614 (Iran, Islamic Republic of)

    2013-04-15T23:59:59.000Z

    In this paper, electromagnetic wave propagation through the one-dimensional plasma-magnetic photonic crystal in the presence of external magnetic field has been analyzed. The dispersion relation, transmission and reflection coefficients have been obtained by using the transfer matrix method. It is investigated how photonic band gap of photonic crystals will be tuned when both dielectric function {epsilon} and magnetic permeability {mu} of the constitutive materials, depend on applied magnetic field. This is shown by one dimensional photonic crystals consisting of plasma and ferrite material layers stacked alternately.

  14. Waveguides in three-dimensional metallic photonic band-gap materials

    SciTech Connect (OSTI)

    Sigalas, M.M.; Biswas, R.; Ho, K.M.; Soukoulis, C.M. [Ames Laboratory and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011 (United States)] [Ames Laboratory and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011 (United States); Crouch, D.D. [Advanced Electromagnetic Technologies Center, Raytheon Corporation, Rancho Cucamonga, California 91729 (United States)] [Advanced Electromagnetic Technologies Center, Raytheon Corporation, Rancho Cucamonga, California 91729 (United States)

    1999-08-01T23:59:59.000Z

    We theoretically investigate waveguide structures in three-dimensional metallic photonic band-gap (MPBG) materials. The MPBG materials used in this study consist of a three-dimensional mesh of metallic wires embedded in a dielectric. An {ital L}-shaped waveguide is created by removing part of the metallic wires. Using finite difference time domain simulations, we found that an 85{percent} transmission efficiency can be achieved through the 90{degree} bend with just three unit cell thickness MPBG structures. thinsp {copyright} {ital 1999} {ital The American Physical Society}

  15. First-principles study of band gap engineering via oxygen vacancy doping in perovskite ABB'O? solid solutions

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Qi, Tingting; Curnan, Matthew T.; Kim, Seungchul; Bennett, Joseph W.; Grinberg, Ilya; Rappe, Andrew M.

    2011-12-01T23:59:59.000Z

    Oxygen vacancies in perovskite oxide solid solutions are fundamentally interesting and technologically important. However, experimental characterization of the vacancy locations and their impact on electronic structure is challenging. We have carried out first-principles calculations on two Zr-modified solid solutions, Pb(Zn1/3Nb2/3)O? and Pb(Mg1/3Nb2/3)O?, in which vacancies are present. We find that the vacancies are more likely to reside between low-valent cation-cation pairs than high-valent cation-cation pairs. Based on the analysis of our results, we formulate guidelines that can be used to predict the location of oxygen vacancies in perovskite solid solutions. Our results show that vacancies can have a significant impact on both the conduction and valence band energies, in some cases lowering the band gap by ?0.5 eV. The effects of vacancies on the electronic band structure can be understood within the framework of crystal field theory.

  16. First-principles study of band gap engineering via oxygen vacancy doping in perovskite ABB'O? solid solutions

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Qi, Tingting; Curnan, Matthew T.; Kim, Seungchul; Bennett, Joseph W.; Grinberg, Ilya; Rappe, Andrew M.

    2011-12-01T23:59:59.000Z

    Oxygen vacancies in perovskite oxide solid solutions are fundamentally interesting and technologically important. However, experimental characterization of the vacancy locations and their impact on electronic structure is challenging. We have carried out first-principles calculations on two Zr-modified solid solutions, Pb(Zn1/3Nb2/3)O? and Pb(Mg1/3Nb2/3)O?, in which vacancies are present. We find that the vacancies are more likely to reside between low-valent cation-cation pairs than high-valent cation-cation pairs. Based on the analysis of our results, we formulate guidelines that can be used to predict the location of oxygen vacancies in perovskite solid solutions. Our results show that vacancies can have a significant impactmore »on both the conduction and valence band energies, in some cases lowering the band gap by ?0.5 eV. The effects of vacancies on the electronic band structure can be understood within the framework of crystal field theory.« less

  17. Periodic dielectric structure for production of photonic band gap and devices incorporating the same

    DOE Patents [OSTI]

    Ho, Kai-Ming (Ames, IA); Chan, Che-Ting (Ames, IA); Soukoulis, Costas (Ames, IA)

    1994-08-02T23:59:59.000Z

    A periodic dielectric structure which is capable of producing a photonic band gap and which is capable of practical construction. The periodic structure is formed of a plurality of layers, each layer being formed of a plurality of rods separated by a given spacing. The material of the rods contrasts with the material between the rods to have a refractive index contrast of at least two. The rods in each layer are arranged with their axes parallel and at a given spacing. Adjacent layers are rotated by 90.degree., such that the axes of the rods in any given layer are perpendicular to the axes in its neighbor. Alternating layers (that is, successive layers of rods having their axes parallel such as the first and third layers) are offset such that the rods of one are about at the midpoint between the rods of the other. A four-layer periocity is thus produced, and successive layers are stacked to form a three-dimensional structure which exhibits a photonic band gap. By virtue of forming the device in layers of elongate members, it is found that the device is susceptible of practical construction.

  18. Monolithic integration of rare-earth oxides and semiconductors for on-silicon technology

    SciTech Connect (OSTI)

    Dargis, Rytis, E-mail: dargis@translucentinc.com; Clark, Andrew; Erdem Arkun, Fevzi [Translucent, Inc., 952 Commercial St., Palo Alto, California 94303 (United States); Grinys, Tomas; Tomasiunas, Rolandas [Institute of Applied Research, Vilnius University, Sauletekio al. 10, LT-10223 Vilnius (Lithuania); O'Hara, Andy; Demkov, Alexander A. [Department of Physics, The University of Texas at Austin, 2515 Speedway, C1600, Austin, Texas 78712 (United States)

    2014-07-01T23:59:59.000Z

    Several concepts of integration of the epitaxial rare-earth oxides into the emerging advanced semiconductor on silicon technology are presented. Germanium grows epitaxially on gadolinium oxide despite lattice mismatch of more than 4%. Additionally, polymorphism of some of the rare-earth oxides allows engineering of their crystal structure from hexagonal to cubic and formation of buffer layers that can be used for growth of germanium on a lattice matched oxide layer. Molecular beam epitaxy and metal organic chemical vapor deposition of gallium nitride on the rare-earth oxide buffer layers on silicon is discussed.

  19. Fluorine Substituted Conjugated Polymer of Medium Band Gap Yields 7% Efficiency in Polymer--Fullerene Solar Cells

    SciTech Connect (OSTI)

    Price, S C; Stuart, Andrew C.; Yang, L; Zhou, H; You, Wei

    2011-01-01T23:59:59.000Z

    Recent research advances on conjugated polymers for photovoltaic devices have focused on creating low band gap materials, but a suitable band gap is only one of many performance criteria required for a successful conjugated polymer. This work focuses on the design of two medium band gap (?2.0 eV) copolymers for use in photovoltaic cells which are designed to possess a high hole mobility and low highest occupied molecular orbital and lowest unoccupied molecular orbital energy levels. The resulting fluorinated polymer PBnDT?FTAZ exhibits efficiencies above 7% when blended with [6,6]-phenyl C{sub 61}-butyric acid methyl ester in a typical bulk heterojunction, and efficiencies above 6% are still maintained at an active layer thicknesses of 1 ?m. PBnDT?FTAZ outperforms poly(3-hexylthiophene), the current medium band gap polymer of choice, and thus is a viable candidate for use in highly efficient tandem cells. PBnDT?FTAZ also highlights other performance criteria which contribute to high photovoltaic efficiency, besides a low band gap.

  20. AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors using barium strontium titanate

    E-Print Network [OSTI]

    York, Robert A.

    AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors using barium strontium; published 13 October 2004) Use of high-k gate dielectrics in AlGaN/GaN heterostructure field transconductance and pinchoff voltage. To achieve this, AlGaN/GaN metal-oxide-semiconductor heterostructure field

  1. Microwave band gap and cavity mode in spoof-insulator-spoof waveguide with multiscale structured surface

    E-Print Network [OSTI]

    Zhang, Qiang; Han, Dezhuan; Qin, Fei Fei; Zhang, Xiao Ming; Yao, Yong

    2015-01-01T23:59:59.000Z

    We propose a multiscale spoof-insulator-spoof (SIS) waveguide by introducing periodic geometry modulation in the wavelength scale to a SIS waveguide made of perfect electric conductor. The MSIS consists of multiple SIS subcells. The dispersion relationship of the fundamental guided mode of the spoof surface plasmon polaritons (SSPPs) is studied analytically within the small gap approximation. It is shown that the multiscale SIS possesses microwave band gap (MBG) due to the Bragg scattering. The "gap maps" in the design parameter space are provided. We demonstrate that the geometry of the subcells can efficiently adjust the effective refraction index of the elementary SIS and therefore further control the width and the position of the MBG. The results are in good agreement with numerical calculations by the finite element method (FEM). For finite-sized MSIS of given geometry in the millimeter scale, FEM calculations show that the first-order symmetric SSPP mode has zero transmission in the MBG within frequency...

  2. Band gap corrections for molecules and solids using Koopmans theorem and Wannier functions

    E-Print Network [OSTI]

    Ma, Jie

    2015-01-01T23:59:59.000Z

    We have proposed a method for correcting the Kohn-Sham eigen energies in the density functional theory (DFT) based on the Koopmans theorem using Wannier functions. The method provides a general approach applicable for molecules and solids for electronic structure calculations. It does not have any adjustable parameters and the computational cost is at the DFT level. For solids, the calculated eigen energies agree well with the experiments for not only the band gaps, but also the energies of other valence and conduction bands. For molecules, the calculated eigen energies agree well with the experimental ionization potentials and electron affinities, and show better trends than the traditional Delta-self-consistent-field (?SCF) results.

  3. Impact of GaN cap on charges in Al?O?/(GaN/)AlGaN/GaN metal-oxide-semiconductor heterostructures analyzed by means of capacitance measurements and simulations

    SciTech Connect (OSTI)

    ?apajna, M., E-mail: milan.tapajna@savba.sk; Jurkovi?, M.; Válik, L.; Haš?ík, Š.; Gregušová, D.; Kuzmík, J. [Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 841 04 Bratislava (Slovakia); Brunner, F.; Cho, E.-M. [Ferdinand-Braun-Institut, Leibniz Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Strasse 4, 12489 Berlin (Germany); Hashizume, T. [Research Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, 060-0814 Sapporo, Japan and JST-CREST, 102-0075 Tokyo (Japan)

    2014-09-14T23:59:59.000Z

    Oxide/semiconductor interface trap density (D{sub it}) and net charge of Al?O?/(GaN)/AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistor (MOS-HEMT) structures with and without GaN cap were comparatively analyzed using comprehensive capacitance measurements and simulations. D{sub it} distribution was determined in full band gap of the barrier using combination of three complementary capacitance techniques. A remarkably higher D{sub it} (?5–8?×?10¹²eV?¹?cm?²) was found at trap energies ranging from EC-0.5 to 1?eV for structure with GaN cap compared to that (D{sub it}???2–3?×?10¹²eV?¹?cm?²) where the GaN cap was selectively etched away. D{sub it} distributions were then used for simulation of capacitance-voltage characteristics. A good agreement between experimental and simulated capacitance-voltage characteristics affected by interface traps suggests (i) that very high D{sub it} (>10¹³eV?¹?cm?²) close to the barrier conduction band edge hampers accumulation of free electron in the barrier layer and (ii) the higher D{sub it} centered about EC-0.6?eV can solely account for the increased C-V hysteresis observed for MOS-HEMT structure with GaN cap. Analysis of the threshold voltage dependence on Al?O? thickness for both MOS-HEMT structures suggests that (i) positive charge, which compensates the surface polarization, is not necessarily formed during the growth of III-N heterostructure, and (ii) its density is similar to the total surface polarization charge of the GaN/AlGaN barrier, rather than surface polarization of the top GaN layer only. Some constraints for the positive surface compensating charge are discussed.

  4. HIGH-K-INAS METAL-OXIDE-SEMICONDUCTOR CAPACITORS FORMED BY ATOMIC-LAYER DEPOSITION

    E-Print Network [OSTI]

    -k-InAs metal-oxide-semiconductor capacitors. Devices are formed using various substrate pretreatments, film by the Terman method to be in the 1013 cm-2 -eV-1 range at midgap. TEM and XPS data suggest the high trap

  5. High-Temperature Thermoelectric Characterization of IIIV Semiconductor Thin Films by Oxide Bonding

    E-Print Network [OSTI]

    High-Temperature Thermoelectric Characterization of III­V Semiconductor Thin Films by Oxide Bonding and measurement method utilizing a SiO2­SiO2 covalent bonding technique is presented for high-temperature surface passivation, and metallization with a Ti-W-N diffusion barrier. A thermoelectric material, thin

  6. Microbially-mediated method for synthesis of non-oxide semiconductor nanoparticles

    DOE Patents [OSTI]

    Phelps, Tommy J.; Lauf, Robert J.; Moon, Ji Won; Rondinone, Adam J.; Love, Lonnie J.; Duty, Chad Edward; Madden, Andrew Stephen; Li, Yiliang; Ivanov, Ilia N.; Rawn, Claudia Jeanette

    2014-06-24T23:59:59.000Z

    The invention is directed to a method for producing non-oxide semiconductor nanoparticles, the method comprising: (a) subjecting a combination of reaction components to conditions conducive to microbially-mediated formation of non-oxide semiconductor nanoparticles, wherein said combination of reaction components comprises i) anaerobic microbes, ii) a culture medium suitable for sustaining said anaerobic microbes, iii) a metal component comprising at least one type of metal ion, iv) a non-metal component containing at least one non-metal selected from the group consisting of S, Se, Te, and As, and v) one or more electron donors that provide donatable electrons to said anaerobic microbes during consumption of the electron donor by said anaerobic microbes; and (b) isolating said non-oxide semiconductor nanoparticles, which contain at least one of said metal ions and at least one of said non-metals. The invention is also directed to non-oxide semiconductor nanoparticle compositions produced as above and having distinctive properties.

  7. Screening method for selecting semiconductor substrates having defects below a predetermined level in an oxide layer

    DOE Patents [OSTI]

    Warren, W.L.; Vanheusden, K.J.R.; Schwank, J.R.; Fleetwood, D.M.; Shaneyfelt, M.R.; Winokur, P.S.; Devine, R.A.B.

    1998-07-28T23:59:59.000Z

    A method is disclosed for screening or qualifying semiconductor substrates for integrated circuit fabrication. The method comprises the steps of annealing at least one semiconductor substrate at a first temperature in a defect-activating ambient (e.g. hydrogen, forming gas, or ammonia) for sufficient time for activating any defects within on oxide layer of the substrate; measuring a defect-revealing electrical characteristic of at least a portion of the oxide layer for determining a quantity of activated defects therein; and selecting substrates for which the quantity of activated defects is below a predetermined level. The defect-revealing electrical characteristic may be a capacitance-versus voltage (C-V) characteristic or a current-versus-voltage (I-V) characteristic that is dependent on an electrical charge in the oxide layer generated by the activated defects. Embodiments of the present invention may be applied for screening any type of semiconductor substrate or wafer having an oxide layer formed thereon or therein. This includes silicon-on-insulator substrates formed by a separation by the implantation of oxygen (SIMOX) process or the bond and etch back silicon-on-insulator (BESOI) process, as well as silicon substrates having a thermal oxide layer or a deposited oxide layer. 5 figs.

  8. amorphous oxide semiconductor: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summary: alloy of composition correspond- ing to the metallic components of the superconduct- ing oxides respectivement. Abstract. - Previous quenching experiments on 2212...

  9. Photovoltaic devices with low band gap polymers Eva Bundgaarda, Sean Shaheenb, David S. Ginleyb, Frederik C. Krebsa

    E-Print Network [OSTI]

    Photovoltaic devices with low band gap polymers Eva Bundgaarda, Sean Shaheenb, David S. Ginleyb, Colorado, USA Abstract Progress in organic photovoltaic devices has recently resulted in reported temperature, active area of the device and molecular weight of the polymer, on the photovoltaic response

  10. Multipole-cancellation mechanism for high-Q cavities in the absence of a complete photonic band gap

    E-Print Network [OSTI]

    Multipole-cancellation mechanism for high-Q cavities in the absence of a complete photonic band gap in the lowest-order term s of the multipole far-field radiation expansion. We focus on the system of photonic-order term s in a multipole expansion of the far-field radiation, distinct from the near- field multipole

  11. Band-gap grading in Cu(In,Ga)Se2 solar cells M. Gloeckler and J. R. Sites

    E-Print Network [OSTI]

    Sites, James R.

    Band-gap grading in Cu(In,Ga)Se2 solar cells M. Gloeckler and J. R. Sites Department of Physics solar cells, and some researchers have asserted that these fields can enhance performance to show that (1) there can be a beneficial effect of grading, (2) in standard thick- ness CIGS cells

  12. Elastic and viscoelastic effects in rubber/air acoustic band gap structures: A theoretical and experimental study

    E-Print Network [OSTI]

    Deymier, Pierre

    Elastic and viscoelastic effects in rubber/air acoustic band gap structures: A theoretical rubber/air phononic crystal structures is investigated theoretically and experimentally. We introduce in a solid rubber matrix, as well as an array of rubber cylinders in an air matrix, are shown to behave

  13. Optical bistability and phase transitions in a doped photonic band-gap material Sajeev John and Tran Quang

    E-Print Network [OSTI]

    John, Sajeev

    in a pseudophotonic band gap PBG to an applied laser field. It is shown that in the case when the variance of resonant reactive ion etching techniques. The relative dif- ficulty in drilling to a depth of more than a few unit

  14. Effects of surface termination on the band gap of ultrabright Si29 nanoparticles: Experiments and computational models

    E-Print Network [OSTI]

    Braun, Paul

    Effects of surface termination on the band gap of ultrabright Si29 nanoparticles: Experiments constituting a H-terminated reconstructed Si surface was recently proposed as a structural prototype termination with a N linkage in butylamine and O linkage in pentane . The emission band for N-termination

  15. Here, we present the fabrication and use of plastic Photonic Band Gap Bragg fibres in photonic textiles for applications in

    E-Print Network [OSTI]

    Skorobogatiy, Maksim

    Here, we present the fabrication and use of plastic Photonic Band Gap Bragg fibres in photonic­section, Bragg fibres feature periodic sequence of layers of two distinct plastics. Under ambient illumination SCHICKER2 , NING GUO1 , CHARLES DUBOIS3 , RACHEL WINGFIELD2 & MAKSIM SKOROBOGATIY1 COLOUR-ON-DEMAND

  16. Band gap tuning in GaN through equibiaxial in-plane strains S. K. Yadav,2

    E-Print Network [OSTI]

    Alpay, S. Pamir

    in photovoltaics and light emission diodes LEDs . The InGaN system has been intensively studied during the past to the large atomic size mismatch between Ga and In.3 Thus, other methods to tune the band gap are needed for potential appli- cations of GaN and related materials systems. It is well-known that the structure

  17. Method for restoring the resistance of indium oxide semiconductors after heating while in sealed structures

    DOE Patents [OSTI]

    Seager, C.H.; Evans, J.T. Jr.

    1998-11-24T23:59:59.000Z

    A method is described for counteracting increases in resistivity encountered when Indium Oxide resistive layers are subjected to high temperature annealing steps during semiconductor device fabrication. The method utilizes a recovery annealing step which returns the Indium Oxide layer to its original resistivity after a high temperature annealing step has caused the resistivity to increase. The recovery anneal comprises heating the resistive layer to a temperature between 100 C and 300 C for a period of time that depends on the annealing temperature. The recovery is observed even when the Indium Oxide layer is sealed under a dielectric layer. 1 fig.

  18. Method for restoring the resistance of indium oxide semiconductors after heating while in sealed structures

    DOE Patents [OSTI]

    Seager, Carleton H. (1304 Onava Ct., NE., Albuquerque, NM 87112); Evans, Jr., Joseph Tate (13609 Verbena Pl., NE., Albuquerque, NM 87112)

    1998-01-01T23:59:59.000Z

    A method for counteracting increases in resistivity encountered when Indium Oxide resistive layers are subjected to high temperature annealing steps during semiconductor device fabrication. The method utilizes a recovery annealing step which returns the Indium Oxide layer to its original resistivity after a high temperature annealing step has caused the resistivity to increase. The recovery anneal comprises heating the resistive layer to a temperature between 100.degree. C. and 300.degree. C. for a period of time that depends on the annealing temperature. The recovery is observed even when the Indium Oxide layer is sealed under a dielectric layer.

  19. Photonic band gap airbridge microcavity resonances in GaAs/AlxOy waveguides

    E-Print Network [OSTI]

    Fan, Shanhui

    -dielectric-contrast GaAs/AlxOy III­V compound semiconductor structure. The photonic crystal is defined by a regularly of optical states will be modified and quantized by such a cavity. Typical semiconductor optical cavities measurements of a one- dimensional PBG air-bridge optical microcavity are pre- sented here. A schematic

  20. Method for implantation of high dopant concentrations in wide band gap materials

    DOE Patents [OSTI]

    Usov, Igor (Los Alamos, NM); Arendt, Paul N. (Los Alamos, NM)

    2009-09-15T23:59:59.000Z

    A method that combines alternate low/medium ion dose implantation with rapid thermal annealing at relatively low temperatures. At least one dopant is implanted in one of a single crystal and an epitaxial film of the wide band gap compound by a plurality of implantation cycles. The number of implantation cycles is sufficient to implant a predetermined concentration of the dopant in one of the single crystal and the epitaxial film. Each of the implantation cycles includes the steps of: implanting a portion of the predetermined concentration of the one dopant in one of the single crystal and the epitaxial film; annealing one of the single crystal and the epitaxial film and implanted portion at a predetermined temperature for a predetermined time to repair damage to one of the single crystal and the epitaxial film caused by implantation and activates the implanted dopant; and cooling the annealed single crystal and implanted portion to a temperature of less than about 100.degree. C. This combination produces high concentrations of dopants, while minimizing the defect concentration.

  1. Gallium arsenide-based ternary compounds and multi-band-gap solar cell research

    SciTech Connect (OSTI)

    Vernon, S. (Spire Corp., Bedford, MA (United States))

    1993-02-01T23:59:59.000Z

    Aim of this contract is the achievement of a high-efficiency, low-cost solar cell. The basic approach to the problem is centered upon the heteroepitaxial growth of a III-V compound material onto a single-crystal silicon wafer. The growth technique employed is metalorganic chemical vapor deposition. The silicon wafer may serve as a mechanical substrate and ohmic contact for a single-junction device, or may contain a p-n junction of its own and form the bottom cell of a two junction tandem solar cell structure. The III-V material for the single-junction case is GaAs and for the two-junction case is either GaAlAs or GaAsP, either material having the proper composition to yield a band gap of approximately 1.7 eV. Results achieved in this contract include the following: (1) a 17.6% efficient GaAs-on-Si solar cell; (2) an 18.5% efficient GaAs-on-Si concentrator solar cell at 400 suns; (3) a 24.8% efficient GaAs-on-GaAs solar cell; (4) a 28.7% efficient GaAs-on-GaAs concentrator solar cell at 200 suns; (5) measurement of the effects of dislocation density and emitter doping on GaAs cells; and (6) improvements in the growth process to achieve reproducible thin AlGaAs window layers with low recombination velocities and environmental stability.

  2. Hydrogen in semiconductors and insulators

    E-Print Network [OSTI]

    Van de Walle, Chris G.

    2007-01-01T23:59:59.000Z

    level in two different semiconductors, illustrating the06-01999R1 Hydrogen in semiconductors and insulators SpecialA. oxide materials; A. semiconductors; C. electronic

  3. X-Band Photonic Band-Gap Accelerator Structure Breakdown Experiment

    SciTech Connect (OSTI)

    Marsh, Roark A.; /MIT /MIT /NIFS, Gifu /JAERI, Kyoto /LLNL, Livermore; Shapiro, Michael A.; Temkin, Richard J.; /MIT; Dolgashev, Valery A.; Laurent, Lisa L.; Lewandowski, James R.; Yeremian, A.Dian; Tantawi, Sami G.; /SLAC

    2012-06-11T23:59:59.000Z

    In order to understand the performance of photonic band-gap (PBG) structures under realistic high gradient, high power, high repetition rate operation, a PBG accelerator structure was designed and tested at X band (11.424 GHz). The structure consisted of a single test cell with matching cells before and after the structure. The design followed principles previously established in testing a series of conventional pillbox structures. The PBG structure was tested at an accelerating gradient of 65 MV/m yielding a breakdown rate of two breakdowns per hour at 60 Hz. An accelerating gradient above 110 MV/m was demonstrated at a higher breakdown rate. Significant pulsed heating occurred on the surface of the inner rods of the PBG structure, with a temperature rise of 85 K estimated when operating in 100 ns pulses at a gradient of 100 MV/m and a surface magnetic field of 890 kA/m. A temperature rise of up to 250 K was estimated for some shots. The iris surfaces, the location of peak electric field, surprisingly had no damage, but the inner rods, the location of the peak magnetic fields and a large temperature rise, had significant damage. Breakdown in accelerator structures is generally understood in terms of electric field effects. These PBG structure results highlight the unexpected role of magnetic fields in breakdown. The hypothesis is presented that the moderate level electric field on the inner rods, about 14 MV/m, is enhanced at small tips and projections caused by pulsed heating, leading to breakdown. Future PBG structures should be built to minimize pulsed surface heating and temperature rise.

  4. Thermovoltaic semiconductor device including a plasma filter

    DOE Patents [OSTI]

    Baldasaro, Paul F. (Clifton Park, NY)

    1999-01-01T23:59:59.000Z

    A thermovoltaic energy conversion device and related method for converting thermal energy into an electrical potential. An interference filter is provided on a semiconductor thermovoltaic cell to pre-filter black body radiation. The semiconductor thermovoltaic cell includes a P/N junction supported on a substrate which converts incident thermal energy below the semiconductor junction band gap into electrical potential. The semiconductor substrate is doped to provide a plasma filter which reflects back energy having a wavelength which is above the band gap and which is ineffectively filtered by the interference filter, through the P/N junction to the source of radiation thereby avoiding parasitic absorption of the unusable portion of the thermal radiation energy.

  5. Engineering direct-indirect band gap transition in wurtzite GaAs nanowires through size and uniaxial strain

    E-Print Network [OSTI]

    Copple, Andrew; Peng, Xihong; 10.1063/1.4718026

    2012-01-01T23:59:59.000Z

    Electronic structures of wurtzite GaAs nanowires in the [0001] direction were studied using first-principles calculations. It was found that the band gap of GaAs nanowires experience a direct-to-indirect transition when the diameter of the nanowires is smaller than ~28 {\\AA}. For those thin GaAs nanowires with an indirect band gap, it was found that the gap can be tuned to be direct if a moderate external uniaxial strain is applied. Both tensile and compressive strain can trigger the indirect-to-direct gap transition. The critical strains for the gap-transition are determined by the energy crossover of two states in conduction bands.

  6. Wide-band-gap InAlAs solar cell for an alternative multijunction approach Marina S. Leite,1,a

    E-Print Network [OSTI]

    Atwater, Harry

    Wide-band-gap InAlAs solar cell for an alternative multijunction approach Marina S. Leite,1,a Robyn; published online 28 February 2011 We have fabricated an In0.52Al0.48As solar cell lattice-matched to In-free InxAl1-xAs alloyed layers were used to fabricate the single junction solar cell. Photoluminescence

  7. Effect of Temperature on GaGdO/GaN Metal Oxide Semiconductor Field Effect Transistors

    SciTech Connect (OSTI)

    Abernathy, C.R.; Baca, A.; Chu, S.N.G.; Hong, M.; Lothian, J.R.; Marcus, M.A.; Pearton, S.J.; Ren, F.; Schurman, M.J.

    1998-10-14T23:59:59.000Z

    GaGdO was deposited on GaN for use as a gate dielectric in order to fabricate a depletion metal oxide semiconductor field effect transistor (MOSFET). This is the fmt demonstration of such a device in the III-Nitride system. Analysis of the effect of temperature on the device shows that gate leakage is significantly reduced at elevated temperature relative to a conventional metal semiconductor field effeet transistor (MESFET) fabricated on the same GaN layer. MOSFET device operation in fact improved upon heating to 400 C. Modeling of the effeet of temperature on contact resistance suggests that the improvement is due to a reduction in the parasitic resistances present in the device.

  8. Hydrocarbon reaction with HF-cleaned Si(lOQ) and effects on metal-oxide-semiconductor device quality

    E-Print Network [OSTI]

    Rubloff, Gary W.

    Hydrocarbon reaction with HF-cleaned Si(lOQ) and effects on metal-oxide-semiconductor device-cleaned Si( 100) towards hydrocarbon adsorption is examined by surface analysis; most hydrocarbons adsorb oxidation after HF treatment.4'5 In this letter, passivation against hydrocarbon contamination is studied

  9. Band Gap Shift of GaN under Uniaxial Strain Compression H. Y. Peng, M. D. McCluskey, Y. M. Gupta, M. Kneissl1

    E-Print Network [OSTI]

    McCluskey, Matthew

    Band Gap Shift of GaN under Uniaxial Strain Compression H. Y. Peng, M. D. McCluskey, Y. M. Gupta, M.S.A. ABSTRACT The band-gap shift of GaN:Mg epilayers on (0001)-oriented sapphire was studied as a function is approximately 0.026 eV/GPa. Combining this result with the known behavior of wurtzite GaN under hydrostatic

  10. Shock-induced band-gap shift in GaN: Anisotropy of the deformation potentials H. Y. Peng, M. D. McCluskey,* and Y. M. Gupta

    E-Print Network [OSTI]

    McCluskey, Matthew

    Shock-induced band-gap shift in GaN: Anisotropy of the deformation potentials H. Y. Peng, M. D. Mc Alto, California 94304, USA Received 19 October 2004; published 24 March 2005 The band-gap shift of GaN=1.9 eV, and D4=-1.0 eV. These values indicate that the deformation potentials in wurtzite GaN

  11. Structural phase transition, narrow band gap, and room-temperature ferromagnetism in [KNbO{sub 3}]{sub 1?x}[BaNi{sub 1/2}Nb{sub 1/2}O{sub 3??}]{sub x} ferroelectrics

    SciTech Connect (OSTI)

    Zhou, Wenliang; Yang, Pingxiong, E-mail: pxyang@ee.ecnu.edu.cn; Chu, Junhao [Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai 200241 (China); Deng, Hongmei [Instrumental Analysis and Research Center, Institute of Materials, Shanghai University, 99 Shangda Road, Shanghai 200444 (China)

    2014-09-15T23:59:59.000Z

    Structural phase transition, narrow band gap (E{sub g}), and room-temperature ferromagnetism (RTFM) have been observed in the [KNbO{sub 3}]{sub 1?x}[BaNi{sub 1/2}Nb{sub 1/2}O{sub 3??}]{sub x} (KBNNO) ceramics. All the samples have single phase perovskite structure, but exhibit a gradual transition behaviour from the orthorhombic to a cubic structure with the increase of x. Raman spectroscopy analysis not only corroborates this doping-induced change in normal structure but also shows the local crystal symmetry for x ? 0.1 compositions to deviate from the idealized cubic perovskite structure. A possible mechanism for the observed specific changes in lattice structure is discussed. Moreover, it is noted that KBNNO with compositions x?=?0.1–0.3 have quite narrow E{sub g} of below 1.5?eV, much smaller than the 3.2?eV band gap of parent KNbO{sub 3} (KNO), which is due to the increasing Ni 3d electronic states within the gap of KNO. Furthermore, the KBNNO materials present RTFM near a tetragonal to cubic phase boundary. With increasing x from 0 to 0.3, the magnetism of the samples develops from diamagnetism to ferromagnetism and paramagnetism, originating from the ferromagnetic–antiferromagnetic competition. These results are helpful in the deeper understanding of phase transitions, band gap tunability, and magnetism variations in perovskite oxides and show the potential role, such materials can play, in perovskite solar cells and multiferroic applications.

  12. Band-Gap Reduction and Dopant Interaction in Epitaxial La,Cr Co-doped SrTiO3 Thin Films

    SciTech Connect (OSTI)

    Comes, Ryan B.; Sushko, Petr; Heald, Steve M.; Colby, Robert J.; Bowden, Mark E.; Chambers, Scott A.

    2014-12-03T23:59:59.000Z

    We show that by co-doping SrTiO3 (STO) epitaxial thin films with equal amounts of La and Cr it is possible to produce films with an optical band gap ~0.9 eV lower than that of undoped STO. Sr1-xLaxTi1-xCrxO3 thin films were deposited by molecular beam epitaxy and characterized using x-ray photoelectron spectroscopy and x-ray absorption near-edge spectroscopy to show that the Cr dopants are almost exclusively in the Cr3+ oxidation state. Extended x-ray absorption fine structure measurements and theoretical modeling suggest that it is thermodynamically preferred for La and Cr dopants to occupy nearest neighbor A- and B-sites in the lattice. Transport measurements show that the material exhibits variable-range hopping conductivity with high resistivity. These results create new opportunities for the use of doped STO films in photovoltaic and photocatalytic applications.

  13. Atomic and electronic structures of oxides on III-V semiconductors :

    E-Print Network [OSTI]

    Shen, Jian

    2010-01-01T23:59:59.000Z

    and passivation of a compound semiconductor surface duringIn 2 O and SiO/III-V Semiconductor Interface, in press with2 O and SiO/III-V Semiconductor Interface, ECS Transaction (

  14. Lattice matched semiconductor growth on crystalline metallic substrates

    DOE Patents [OSTI]

    Norman, Andrew G; Ptak, Aaron J; McMahon, William E

    2013-11-05T23:59:59.000Z

    Methods of fabricating a semiconductor layer or device and said devices are disclosed. The methods include but are not limited to providing a metal or metal alloy substrate having a crystalline surface with a known lattice parameter (a). The methods further include growing a crystalline semiconductor alloy layer on the crystalline substrate surface by coincident site lattice matched epitaxy. The semiconductor layer may be grown without any buffer layer between the alloy and the crystalline surface of the substrate. The semiconductor alloy may be prepared to have a lattice parameter (a') that is related to the lattice parameter (a). The semiconductor alloy may further be prepared to have a selected band gap.

  15. Real-structure effects: Band gaps of Mg_xZn_{1-x}O, Cd_xZn_{1-x}O, and n-type ZnO from ab-initio calculations

    SciTech Connect (OSTI)

    Schleife, A; Bechstedt, F

    2012-02-15T23:59:59.000Z

    Many-body perturbation theory is applied to compute the quasiparticle electronic structures and the optical-absorption spectra (including excitonic effects) for several transparent conducting oxides. We discuss HSE+G{sub 0}W{sub 0} results for band structures, fundamental band gaps, and effective electron masses of MgO, ZnO, CdO, SnO{sub 2}, SnO, In{sub 2}O{sub 3}, and SiO{sub 2}. The Bethe-Salpeter equation is solved to account for excitonic effects in the calculation of the frequency-dependent absorption coefficients. We show that the HSE+G{sub 0}W{sub 0} approach and the solution of the Bethe-Salpeter equation are very well-suited to describe the electronic structure and the optical properties of various transparent conducting oxides in good agreement with experiment.

  16. Three-dimensional assemblies built up by quantum dots in size-quantization regime: Band gap shifts due to size-distribution of cadmium selenide nanoparticles

    SciTech Connect (OSTI)

    Pejova, Biljana, E-mail: biljana@pmf.ukim.mk

    2013-11-15T23:59:59.000Z

    In the present study, it is predicted that the band gap energy of a three-dimensional quantum dot assembly exhibits a red shift when the dispersion of the crystal size distribution is enlarged, even at a fixed average value thereof. The effect is manifested when the size quantization regime in individual quantum dots constituting the assembly has been entered. Under the same conditions, the sub-band gap absorption tails are characterized with large Urbach energies, which could be one or two orders of magnitude larger than the value characteristic for the non-quantized case. - Graphical abstract: Band gap shifts due to size-distribution of nanoparticles in 3D assemblies built up by quantum dots in size-quantization regime. Display Omitted - Highlights: • Optical absorption of 3D QD assemblies in size-quantization regime is modeled. • Band gap energy of the QD solid depends on the size-distribution of the nanoparticles. • QD solid samples with same ?R? exhibit band gap shift depending on size distribution. • QD size distribution leads to large Urbach energies.

  17. AlGaN/GaN Metal Oxide Semiconductor Field Effect Transistors using Titanium Dioxide P. J. HANSEN

    E-Print Network [OSTI]

    York, Robert A.

    AlGaN/GaN Metal Oxide Semiconductor Field Effect Transistors using Titanium Dioxide P. J. HANSEN 1 epitaxially on AlGaN/GaN HFET structures by molecular beam epitaxy (MBE). Growth was first performed on GaN templates to establish epitaxial growth conditions. X-ray diffraction showed [001] TiO2 || [1010]GaN

  18. Physics of band-gap formation and its evolution in the pillar-based phononic crystal structures

    SciTech Connect (OSTI)

    Pourabolghasem, Reza; Mohammadi, Saeed; Eftekhar, Ali Asghar; Adibi, Ali [School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); Khelif, Abdelkrim [Institut FEMTO-ST, Université de Franche-Comté, CNRS, 32 Avenue de l'Observatoire, 25044 Besançon Cedex (France)

    2014-07-07T23:59:59.000Z

    In this paper, the interplay of Bragg scattering and local resonance is theoretically studied in a phononic crystal (PnC) structure composed of a silicon membrane with periodic tungsten pillars. The comparison of phononic band gaps (PnBGs) in three different lattice types (i.e., square, triangular, and honeycomb) with different pillar geometries shows that different PnBGs have varying degrees of dependency on the lattice symmetry based on the interplay of the local resonances and the Bragg effect. The details of this interplay is discussed. The significance of locally resonating pillars, specially in the case of tall pillars, on PnBGs is discussed and verified by examining the PnBG position and width in perturbed lattices via Monte Carlo simulations. It is shown that the PnBGs caused by the local resonance of the pillars are more resilient to the lattice perturbations than those caused by Bragg scattering.

  19. Band-gap nonlinear optical generation: The structure of internal optical field and the structural light focusing

    SciTech Connect (OSTI)

    Zaytsev, Kirill I., E-mail: kirzay@gmail.com; Katyba, Gleb M.; Yakovlev, Egor V.; Yurchenko, Stanislav O., E-mail: st.yurchenko@mail.ru [Bauman Moscow State Technical University, 2nd Baumanskaya str. 5, Moscow 105005 (Russian Federation); Gorelik, Vladimir S. [P. N. Lebedev Physics Institute of the Russian Academy of Sciences, Leninskiy Prospekt 53, Moscow 119991 (Russian Federation)

    2014-06-07T23:59:59.000Z

    A novel approach for the enhancement of nonlinear optical effects inside globular photonic crystals (PCs) is proposed and systematically studied via numerical simulations. The enhanced optical harmonic generation is associated with two- and three-dimensional PC pumping with the wavelength corresponding to different PC band-gaps. The interactions between light and the PC are numerically simulated using the finite-difference time-domain technique for solving the Maxwell's equations. Both empty and infiltrated two-dimensional PC structures are considered. A significant enhancement of harmonic generation is predicted owing to the highly efficient PC pumping based on the structural light focusing effect inside the PC structure. It is shown that a highly efficient harmonic generation could be attained for both the empty and infiltrated two- and three-dimensional PCs. We are demonstrating the ability for two times enhancement of the parametric decay efficiency, one order enhancement of the second harmonic generation, and two order enhancement of the third harmonic generation in PC structures in comparison to the nonlinear generations in appropriate homogenous media. Obviously, the nonlinear processes should be allowed by the molecular symmetry. The criteria of the nonlinear process efficiency are specified and calculated as a function of pumping wavelength position towards the PC globule diameter. Obtained criterion curves exhibit oscillating characteristics, which indicates that the highly efficient generation corresponds to the various PC band-gap pumping. The highest efficiency of nonlinear conversions could be reached for PC pumping with femtosecond optical pulses; thus, the local peak intensity would be maximized. Possible applications of the observed phenomenon are also discussed.

  20. Differential method of analysis of luminescence spectra of semiconductors

    SciTech Connect (OSTI)

    Emel'yanov, A. M., E-mail: Emelyanov@mail.ioffe.ru [Russian Academy of Sciences, Ioffe Physical Technical Institute (Russian Federation)

    2010-09-15T23:59:59.000Z

    A method for analyzing the luminescence spectra of semiconductors is suggested. The method is based on differentiation of the spectra. The potentialities of the method are demonstrated for luminescence in the region of the fundamental absorption edge of Si and SiGe alloy single crystals. The method is superior in accuracy to previously known luminescence methods of determining the band gap of indirect-gap semiconductors and practically insensitive to different conditions of outputting radiation from the sample.

  1. Iron oxidation state of FeTiO3 under high pressure X. Wu,1,* G. Steinle-Neumann,1 O. Narygina,1 I. Kantor,1,2 C. McCammon,1 S. Pascarelli,3 G. Aquilanti,3 V. Prakapenka,2

    E-Print Network [OSTI]

    Steinle-Neumann, Gerd

    the oxygen bridge in the adjacent octahedral, then decreases at higher pressure due to the ilmenite in the materials and earth sci- ences. Ilmenite is a wide-band-gap semiconductor with a 2.5 eV band gap,1 which

  2. On the sub-band gap optical absorption in heat treated cadmium sulphide thin film deposited on glass by chemical bath deposition technique

    SciTech Connect (OSTI)

    Chattopadhyay, P.; Karim, B.; Guha Roy, S. [Department of Electronic Science, University of Calcutta, 92, A.P.C. Road, Kolkata 700009 (India)

    2013-12-28T23:59:59.000Z

    The sub-band gap optical absorption in chemical bath deposited cadmium sulphide thin films annealed at different temperatures has been critically analyzed with special reference to Urbach relation. It has been found that the absorption co-efficient of the material in the sub-band gap region is nearly constant up to a certain critical value of the photon energy. However, as the photon energy exceeds the critical value, the absorption coefficient increases exponentially indicating the dominance of Urbach rule. The absorption coefficients in the constant absorption region and the Urbach region have been found to be sensitive to annealing temperature. A critical examination of the temperature dependence of the absorption coefficient indicates two different kinds of optical transitions to be operative in the sub-band gap region. After a careful analyses of SEM images, energy dispersive x-ray spectra, and the dc current-voltage characteristics, we conclude that the absorption spectra in the sub-band gap domain is possibly associated with optical transition processes involving deep levels and the grain boundary states of the material.

  3. PHYSICAL REVIEW B 85, 155101 (2012) Electronic properties of layered multicomponent wide-band-gap oxides: A combinatorial approach

    E-Print Network [OSTI]

    Medvedeva, Julia E.

    devices including solar cells, smart windows, and flat panel displays, and they also find application as heating, antistatic, and optical coatings (for select reviews, see Refs. 1­7). Multicomponent TCOs

  4. Soft X-ray Spectroscopy Study of the Electronic Structure of Oxidized and Partially Oxidized Magnetite Nanoparticles

    SciTech Connect (OSTI)

    Gilbert, Benjamin; Katz, Jordan E.; Denlinger, Jonathan D.; Yin, Yadong; Falcone, Roger; Waychunas, Glenn A.

    2010-10-24T23:59:59.000Z

    The crystal structure of magnetite nanoparticles may be transformed to maghemite by complete oxidation, but under many relevant conditions the oxidation is partial, creating a mixed-valence material with structural and electronic properties that are poorly characterized. We used X-ray diffraction, Fe K-edge extended X-ray absorption fine structure (EXAFS) spectroscopy, and soft X-ray absorption and emission spectroscopy to characterize the products of oxidizing uncoated and oleic acid-coated magnetite nanoparticles in air. The oxidization of uncoated magnetite nanoparticles creates a material that is structurally and electronically indistinguishable from maghemite. By contrast, while oxidized oleic acid-coated nanoparticles are also structurally indistinguishable from maghemite, Fe L-edge spectroscopy revealed the presence of interior reduced iron sites even after a 2-year period. We used X-ray emission spectroscopy at the O K-edge to study the valence bands (VB) of the iron oxide nanoparticles, using resonant excitation to remove the contributions from oxygen atoms in the ligands and from low-energy excitations that obscured the VB edge. The bonding in all nanoparticles was typical of maghemite, with no detectable VB states introduced by the long-lived, reduced-iron sites in the oleic acid-coated sample. However, O K-edge absorption spectroscopy observed a 0.2 eV shift in the position of the lowest unoccupied states in the coated sample, indicating an increase in the semiconductor band gap relative to bulk stoichiometric maghemite that was also observed by optical absorption spectroscopy. The results show that the ferrous iron sites within ferric iron oxide nanoparticles coated by an organic ligand can persist under ambient conditions with no evidence of a distinct interior phase and can exert an effect on the global electronic and optical properties of the material. This phenomenon resembles the band gap enlargement caused by electron accumulation in the conduction band of TiO2.

  5. Size-dependent shifts of the Néel temperature and optical band-gap in NiO nanoparticles

    SciTech Connect (OSTI)

    Thota, Subhash, E-mail: mseehra@wvu.edu, E-mail: subhasht@iitg.ac.in [Department of Physics, Indian Institute of Technology, Guwahati, Assam 781039 (India); Shim, J. H.; Seehra, M. S., E-mail: mseehra@wvu.edu, E-mail: subhasht@iitg.ac.in [Department of Physics and Astronomy, West Virginia University, Morgantown, West Virginia 26506 (United States)

    2013-12-07T23:59:59.000Z

    Bulk NiO is a well-known antiferromagnet with Neel temperature T{sub N}(?)?=?524?K and an optical band-gap E{sub g}?=?4.3?eV. With decrease in particle size D from 40?nm to 4?nm of NiO, systematic changes of T{sub N} and E{sub g} are observed and discussed here. From magnetic measurements, the changes in T{sub N} with D are found to fit finite-size scaling equation T{sub N}(D)?=?T{sub N}(?) [1 ? (?{sub o}/D){sup ?}] with ??=?3.2?±?0.5 and ?{sub o}?=?3.2?±?0.2?nm, in good agreement with the predictions for a Heisenberg system. The observed blue shifts of E{sub g} with decrease in D reaching E{sub g}?=?5.12?eV for D???4?nm are likely due to quantum confinement and non-stoichiometry.

  6. Electric-field-dependent electroreflectance spectra of visible-band-gap (InAlGa)P quantum-well structures

    SciTech Connect (OSTI)

    Fritz, I.J.; Blum, O.; Schneider, R.P. Jr.; Howard, A.J.; Follstaedt, D.M. (Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States))

    1994-04-04T23:59:59.000Z

    We present results from the first studies of electric-field effects on optical transitions in visible-band-gap InGaP/InAlGaP multiple-quantum-well (MQW) structures. These structures, grown at 775 [degree]C by metalorganic vapor phase epitaxy on (100) GaAs substrates misoriented 6[degree] towards P(111)[r angle][l angle]111[r angle]A, consist of nominally undoped MQWs surrounded by doped In[sub 0.49]Al[sub 0.51]P cladding layers to form [ital p]-[ital i]-[ital n] diodes. The Stark shifts of various allowed and forbidden quantum-well transitions were observed in bias-dependent electroreflectance spectra of In[sub 0.49]Ga[sub 0.51]P/In[sub 0.49](Al[sub 0.5]Ga[sub 0.5])[sub 0.51]P MQW samples with 10-nm-thick layers. We find the magnitude of these shifts to depend on the details of the Mg doping profile, confirming the importance of Mg diffusion and unintentional background doping in these materials. Our results show that (InAlGa)P materials are promising for visible-wavelength electro-optic modulator applications.

  7. Universal alignment of hydrogen levels in semiconductors and insulators

    E-Print Network [OSTI]

    Van de Walle, C G

    2006-01-01T23:59:59.000Z

    including nitride semiconductors and transparent oxides.and C. G. Van de Walle, in Hydrogen in SemiconductorsII, Semiconductors and Semimetals Vol. 61, edited by N. H.

  8. Visible-light absorption and large band-gap bowing of GaN1-xSbx from first principles

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Sheetz, R. Michael; Richter, Ernst; Andriotis, Antonis N.; Lisenkov, Sergey; Pendyala, Chandrashekhar; Sunkara, Mahendra K.; Menon, Madhu

    2011-08-01T23:59:59.000Z

    Applicability of the Ga(Sbx)N1-x alloys for practical realization of photoelectrochemical water splitting is investigated using first-principles density functional theory incorporating the local density approximation and generalized gradient approximation plus the Hubbard U parameter formalism. Our calculations reveal that a relatively small concentration of Sb impurities is sufficient to achieve a significant narrowing of the band gap, enabling absorption of visible light. Theoretical results predict that Ga(Sbx)N1-x alloys with 2-eV band gaps straddle the potential window at moderate to low pH values, thus indicating that dilute Ga(Sbx)N1-x alloys could be potential candidates for splitting water under visible light irradiation.

  9. Visible-light absorption and large band-gap bowing of GaN1-xSbx from first principles

    SciTech Connect (OSTI)

    Sheetz, R. Michael; Richter, Ernst; Andriotis, Antonis N.; Lisenkov, Sergey; Pendyala, Chandrashekhar; Sunkara, Mahendra K.; Menon, Madhu

    2011-08-01T23:59:59.000Z

    Applicability of the Ga(Sbx)N1-x alloys for practical realization of photoelectrochemical water splitting is investigated using first-principles density functional theory incorporating the local density approximation and generalized gradient approximation plus the Hubbard U parameter formalism. Our calculations reveal that a relatively small concentration of Sb impurities is sufficient to achieve a significant narrowing of the band gap, enabling absorption of visible light. Theoretical results predict that Ga(Sbx)N1-x alloys with 2-eV band gaps straddle the potential window at moderate to low pH values, thus indicating that dilute Ga(Sbx)N1-x alloys could be potential candidates for splitting water under visible light irradiation.

  10. Band gap and band parameters of InN and GaN from quasiparticle energy calculations based on exact-exchange density-functional theory

    E-Print Network [OSTI]

    Band gap and band parameters of InN and GaN from quasiparticle energy calculations based on exact; published online 20 October 2006 The authors have studied the electronic structure of InN and GaN employing. © 2006 American Institute of Physics. DOI: 10.1063/1.2364469 The group III-nitrides AlN, GaN, and In

  11. Structure and red shift of optical band gap in CdO–ZnO nanocomposite synthesized by the sol gel method

    SciTech Connect (OSTI)

    Mosquera, Edgar, E-mail: edemova@ing.uchile.cl [Laboratorio de Materiales a Nanoescala, Departamento de Ciencia de los Materiales, Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Av. Tupper 2069, Santiago (Chile); Pozo, Ignacio del, E-mail: ignacio.dpf@gmail.com [Facultad de Ciencias Naturales, Matemáticas y del Medio Ambiente, Universidad Tecnológica Metropolitana, Av. José Pedro Alessandri 1242, Santiago (Chile); Morel, Mauricio, E-mail: mmorel@ing.uchile.cl [Laboratorio de Materiales a Nanoescala, Departamento de Ciencia de los Materiales, Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Av. Tupper 2069, Santiago (Chile)

    2013-10-15T23:59:59.000Z

    The structure and the optical band gap of CdO–ZnO nanocomposites were studied. Characterization using X-ray diffraction (XRD), transmission electron microscopy (TEM) and diffuse reflectance spectroscopy (DRS) analysis confirms that CdO phase is present in the nanocomposites. TEM analysis confirms the formation of spheroidal nanoparticles and nanorods. The particle size was calculated from Debey–Sherrer?s formula and corroborated by TEM images. FTIR spectroscopy shows residual organic materials (aromatic/Olefinic carbon) from nanocomposites surface. CdO content was modified in the nanocomposites in function of polyvinylalcohol (PVA) added. The optical band gap is found to be red shift from 3.21 eV to 3.11 eV with the increase of CdO content. Photoluminescence (PL) measurements reveal the existence of defects in the synthesized CdO–ZnO nanocomposites. - Graphical abstract: Optical properties of ZnO, CdO and ZnO/CdO nanoparticles. Display Omitted - Highlights: • TEM analysis confirms the presence of spherical nanoparticles and nanorods. • The CdO phase is present in the nanocomposites. • The band gap of the CdO–ZnO nanocomposites is slightly red shift with CdO content. • PL emission of CdO–ZnO nanocomposite are associated to structural defects.

  12. Searching Room Temperature Ferromagnetism in Wide Gap Semiconductors Fe-doped Strontium Titanate and Zinc Oxide

    E-Print Network [OSTI]

    Pereira, LMC; Wahl, U

    Scientic findings in the very beginning of the millennium are taking us a step further in the new paradigm of technology: spintronics. Upgrading charge-based electronics with the additional degree of freedom of the carriers spin-state, spintronics opens a path to the birth of a new generation of devices with the potential advantages of non-volatility and higher processing speed, integration densities and power efficiency. A decisive step towards this new age lies on the attribution of magnetic properties to semiconductors, the building block of today's electronics, that is, the realization of ferromagnetic semiconductors (FS) with critical temperatures above room temperature. Unfruitful search for intrinsic RT FS lead to the concept of Dilute(d) Magnetic Semiconductors (DMS): ordinary semiconductor materials where 3 d transition metals randomly substitute a few percent of the matrix cations and, by some long-range mechanism, order ferromagnetically. The times are of intense research activity and the last few ...

  13. Disorder induced semiconductor to metal transition and modifications of grain boundaries in nanocrystalline zinc oxide thin film

    SciTech Connect (OSTI)

    Singh, Fouran; Kumar, Vinod [Materials Science Group, Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067 (India); Chaudhary, Babloo [Centre of Excellence in Material Sciences and Nanomaterials, Z. H. College of Engineering and Technology, Aligarh Muslim University, Aligarh, U.P. 202001 (India); Singh, R. G. [Department of Electronic Science, Maharaja Agrasen College, University of Delhi, New Delhi 110096 (India); Kumar, Sanjeev [Materials Science Group, Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067 (India); Department of Electronic Science, University of Delhi South Campus, New Delhi 110023 (India); Kapoor, A. [Department of Electronic Science, University of Delhi South Campus, New Delhi 110023 (India)

    2012-10-01T23:59:59.000Z

    This paper report on the disorder induced semiconductor to metal transition (SMT) and modifications of grain boundaries in nanocrystalline zinc oxide thin film. Disorder is induced using energetic ion irradiation. It eliminates the possibility of impurities induced transition. However, it is revealed that some critical concentration of defects is needed for inducing such kind of SMT at certain critical temperature. Above room temperature, the current-voltage characteristics in reverse bias attributes some interesting phenomenon, such as electric field induced charge transfer, charge trapping, and diffusion of defects. The transition is explained by the defects induced disorder and strain in ZnO crystallites created by high density of electronic excitations.

  14. Study of gate oxide traps in HfO[subscript 2]/AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors by use of ac transconductance method

    E-Print Network [OSTI]

    Sun, X.

    We introduce an ac-transconductance method to profile the gate oxide traps in a HfO[subscript 2] gated AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors (MOS-HEMTs) that can exchange carriers with metal ...

  15. Intrazeolite metal carbonyl phototopotaxy: From Tungsten(VI) oxide quantum dots to a zero-dimensional semiconductor quantum supralattice

    SciTech Connect (OSTI)

    Ozin, G.A.; Oezkar, S. (Univ. of Toronto, Ontario (Canada))

    1990-09-20T23:59:59.000Z

    Attention is focused on the use of simple binary metal carbonyls for the nucleation, growth, and stabilization of intrazeolite semiconductor quantum nanostructures. The rationale for selecting this particular group of precursor molecules relates to their volatility, molecular dimensions, ease of purification, availability, and facile and quantitative conversion to the respective metal oxide materials with minimal contamination by carbon. In this study the intrazeolite photooxidation chemistry of {alpha}-cage encapsulated hexacarbonyltungsten(0) in Na{sub 56}Y and H{sub 56}Y, n(W(CO){sub 6})-Na{sub 56}Y(H{sub 56}Y), with O{sub 2} provides a novel synthetic pathway to {alpha}-cage-located tungsten(VI) oxide n(WO{sub 3})-Na{sub 56}Y(H{sub 56}Y) intrazeolite quantum dots and a zero-dimensional semiconductor quantum supralattice (where n = 0-32), which might find applications as new solid-state materials for use in quantum electronic and nonlinear optic devices.

  16. High-Performance Solution-Processed Amorphous-Oxide-Semiconductor TFTs with Organic Polymeric Gate Dielectrics

    E-Print Network [OSTI]

    Pecunia, Vincenzo; Banger, Kulbinder; Sirringhaus, Henning

    2015-01-13T23:59:59.000Z

    energy offsets (? 1 eV) between the conduction/valence bands of the semiconductor and the gate dielectric are needed to confine the charge carriers at the active interface and minimize undesirable charge injection from the semiconductor into the gate... in solution, all the other polymers came in the form of pellets or powder and were dissolved in suitable anhydrous organic solvents: P?MS was dissolved in xylene at a concentration of 60 mg mL-1; SAN in butyronitrile at 40 mg mL-1; PC in 1,2-dichlorobenzene...

  17. Nonadiabatic electron transfer at the nanoscale tin-oxide semiconductor/aqueous solution interface

    E-Print Network [OSTI]

    published as an Advance Article on the web 28th January 2004 Photo-excitation of chromophoric metal forward and back electron transfer reactions involving molecular dyes and wide bandgap semiconductors words, electro- nic coupling rather than nuclear motion appears to govern the reaction dynamics

  18. High temperature thermoelectric characterization of III-V semiconductor thin films by oxide bonding

    E-Print Network [OSTI]

    Bowers, John

    bonding Je-Hyeong Bahka) , Gehong Zenga) , Joshua M. O. Zide b) , Hong Luc) , Rajeev Singhd) , Di Lianga bonding technique is developed for high temperature thermoelectric characterization of the thin film III-W-N diffusion barrier. A thermoelectric material, thin film ErAs:InGaAlAs metal/semiconductor nanocomposite

  19. Diminished Short Channel Effects in Nanoscale Double-Gate Silicon-on-Insulator MetalOxideSemiconductor Field-Effect-Transistors

    E-Print Network [OSTI]

    Kumar, M. Jagadesh

    ) and the back-gate oxide (tb) thickness is 2 nm. The doping in the p-type body and n+ source/drain regions­Oxide­Semiconductor Field-Effect-Transistors due to Induced Back-Gate Step Potential M. Jagadesh KUMAR Ã and G. Venkateshwar surface potential profile at the back gate of an asymmetrical double gate (DG) silicon-on-insulator (SOI

  20. Self-heating simulation of GaN-based metal-oxide-semiconductor high-electron-mobility transistors including hot electron

    E-Print Network [OSTI]

    Ye, Peide "Peter"

    Self-heating simulation of GaN-based metal-oxide-semiconductor high-electron-mobility transistors the results of self-heating simulations of the GaN-based MOS-HEMTs, including hot electron and quantum effects of the gate and source/drain extension lengths on both the output performance and self-heating is discussed

  1. Strained Ge channel p-type metal-oxide-semiconductor field-effect transistors grown on Siâ?â??xGex/Si virtual substrates

    E-Print Network [OSTI]

    Lee, Minjoo L.

    We have fabricated strained Ge channel p-type metal-oxide-semiconductor field-effect transistors (p-MOSFETs) on Siâ??.â??Geâ??.â?? virtual substrates. The poor interface between silicon dioxide (SiOâ??) and the Ge channel ...

  2. Experimental study on vertical scaling of InAs-on-insulator metal-oxide-semiconductor field-effect transistors

    SciTech Connect (OSTI)

    Kim, SangHyeon, E-mail: dadembyora@mosfet.t.u-tokyo.ac.jp, E-mail: sh-kim@kist.re.kr; Yokoyama, Masafumi; Nakane, Ryosho; Takenaka, Mitsuru; Takagi, Shinichi [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Ichikawa, Osamu; Osada, Takenori; Hata, Masahiko [Sumitomo Chemical Co., Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294 (Japan)

    2014-06-30T23:59:59.000Z

    We have investigated effects of the vertical scaling on electrical properties in extremely thin-body InAs-on-insulator (-OI) metal-oxide-semiconductor field-effect transistors (MOSFETs). It is found that the body thickness (T{sub body}) scaling provides better short channel effect (SCE) control, whereas the T{sub body} scaling also causes the reduction of the mobility limited by channel thickness fluctuation (?T{sub body}) scattering (?{sub fluctuation}). Also, in order to achieve better SCEs control, the thickness of InAs channel layer (T{sub channel}) scaling is more favorable than the thickness of MOS interface buffer layer (T{sub buffer}) scaling from a viewpoint of a balance between SCEs control and ?{sub fluctuation} reduction. These results indicate necessity of quantum well channel structure in InAs-OI MOSFETs and these should be considered in future transistor design.

  3. Direct band gap optical emission from compressively strained Ge films grown on relaxed Si{sub 0.5}Ge{sub 0.5} substrate

    SciTech Connect (OSTI)

    Aluguri, R.; Manna, S.; Ray, S. K. [Department of Physics and Meteorology, Indian Institute of Technology Kharagpur, Kharagpur 721302 (India)] [Department of Physics and Meteorology, Indian Institute of Technology Kharagpur, Kharagpur 721302 (India)

    2013-10-14T23:59:59.000Z

    Compressively strained Ge films have been grown on relaxed Si{sub 0.5}Ge{sub 0.5} virtual substrate in ultra high vacuum using molecular beam epitaxy. Structural characterization has shown that the Ge films are compressively strained with partial strain relaxation in a film thicker than 3.0 nm, due to onset of island nucleation. Photoluminescence spectra exhibit the splitting of degenerate Ge valence band into heavy hole and light hole bands with a broad direct band gap emission peak around 0.81 eV. Temperature and excitation power dependent emission characteristics have been studied to investigate the mechanism of luminescence quenching at high temperatures and the role of non-radiative recombination centers.

  4. Band gap engineering of In{sub 2}O{sub 3} by alloying with Tl{sub 2}O{sub 3}

    SciTech Connect (OSTI)

    Scanlon, David O., E-mail: d.scanlon@ucl.ac.uk [Kathleen Lonsdale Materials Chemistry, Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ (United Kingdom); Diamond Light Source Ltd., Diamond House, Harwell Science and Innovation Campus, Didcot, Oxfordshire OX11 0DE (United Kingdom); Regoutz, Anna; Egdell, Russell G. [Department of Chemistry, Inorganic Chemistry Laboratory, University of Oxford, South Parks Road, Oxford OX1 3QR (United Kingdom)] [Department of Chemistry, Inorganic Chemistry Laboratory, University of Oxford, South Parks Road, Oxford OX1 3QR (United Kingdom); Morgan, David J. [Cardiff Catalysis Institute (CCI), School of Chemistry, Cardiff University, Park Place, Cardiff CF10 3AT (United Kingdom)] [Cardiff Catalysis Institute (CCI), School of Chemistry, Cardiff University, Park Place, Cardiff CF10 3AT (United Kingdom); Watson, Graeme W. [School of Chemistry and CRANN, Trinity College Dublin, Dublin 2 (Ireland)] [School of Chemistry and CRANN, Trinity College Dublin, Dublin 2 (Ireland)

    2013-12-23T23:59:59.000Z

    Efficient modulation of the bandgap of In{sub 2}O{sub 3} will open up a route to improved electronic properties. We demonstrate using ab initio calculations that Tl incorporation into In{sub 2}O{sub 3} reduces the band gap and confirm that narrowing of the gap is observed by X-ray photoemission spectroscopy on ceramic surfaces. Incorporation of Tl does not break the symmetry of the allowed optical transitions, meaning that the doped thin films should retain optical transparency in the visible region, in combination with a lowering of the conduction band effective mass. We propose that Tl-doping may be an efficient way to increase the dopability and carrier mobility of In{sub 2}O{sub 3}.

  5. Optical and structural study of GaN nanowires grown by catalyst-free molecular beam epitaxy. II. Sub-band-gap luminescence and electron irradiation effects

    SciTech Connect (OSTI)

    Robins, Lawrence H.; Bertness, Kris A.; Barker, Joy M.; Sanford, Norman A.; Schlager, John B. [National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States); National Institute of Standards and Technology, Boulder, Colorado 80305 (United States)

    2007-06-01T23:59:59.000Z

    GaN nanowires with diameters of 50-250 nm, grown by catalyst-free molecular beam epitaxy, were characterized by photoluminescence (PL) and cathodoluminescence (CL) spectroscopy at temperatures from 3 to 297 K. Both as-grown samples and dispersions of the nanowires onto other substrates were examined. The properties of the near-band-edge PL and CL spectra were discussed in Part I of this study by [Robins et al. [L. H. Robins, K. A. Bertness, J. M. Barker, N. A. Sanford, and J. B. Schlager, J. Appl. Phys. 101,113505 (2007)]. Spectral features below the band gap, and the effect of extended electron irradiation on the CL, are discussed in Part II. The observed sub-band-gap PL and CL peaks are identified as phonon replicas of the free-exciton transitions, or excitons bound to structural defects or surface states. The defect-related peaks in the nanowires are correlated with luminescence lines previously reported in GaN films, denoted the Y lines [M. A. Reshchikov and H. Morkoc, J. Appl. Phys. 97, 061301 (2005)]. The CL was partially quenched by electron beam irradiation for an extended time; the quenching was stronger for the free and shallow-donor-bound exciton peaks than for the defect-related peaks. The quenching appeared to saturate at high irradiation dose (with final intensity {approx_equal}30% of initial intensity) and was reversible on thermal cycling to room temperature. The electron irradiation-induced quenching of the CL is ascribed to charge injection and trapping phenomena.

  6. Light induced instability mechanism in amorphous InGaZn oxide semiconductors

    SciTech Connect (OSTI)

    Robertson, John; Guo, Yuzheng [Department of Engineering, Cambridge University, Cambridge CB2 1PZ (United Kingdom)

    2014-04-21T23:59:59.000Z

    A model of the negative bias illumination stress instability in InGaZn oxide is presented, based on the photo-excitation of electrons from oxygen interstitials. The O interstitials are present to compensate hydrogen donors. The O interstitials are found to spontaneously form in O-rich conditions for Fermi energies at the conduction band edge, much more easily that in related oxides. The excited electrons give rise to a persistent photoconductivity due to an energy barrier to recombination. The formation energy of the O interstitials varies with their separation from the H donors, which leads to a voltage stress dependence on the compensation.

  7. Oxide-based method of making compound semiconductor films and making related electronic devices

    DOE Patents [OSTI]

    Kapur, Vijay K. (Tarzana, CA); Basol, Bulent M. (Manhattan Beach, CA); Leidholm, Craig R. (Woodland Hills, CA); Roe, Robert A. (Glendale, CA)

    2000-01-01T23:59:59.000Z

    A method for forming a compound film includes the steps of preparing a source material, depositing the source material on a base and forming a preparatory film from the source material, heating the preparatory film in a suitable atmosphere to form a precursor film, and providing suitable material to said precursor film to form the compound film. The source material includes oxide-containing particles including Group IB and IIIA elements. The precursor film includes non-oxide Group IB and IIIA elements. The compound film includes a Group IB-IIIA-VIA compound. The oxides may constitute greater than about 95 molar percent of the Group IB elements and greater than about 95 molar percent of the Group IIIA elements in the source material. Similarly, non-oxides may constitute greater than about 95 molar percent of the Group IB elements and greater than about 95 molar percent of the Group IIIA elements in the precursor film. The molar ratio of Group IB to Group IIIA elements in the source material may be greater than about 0.6 and less than about 1.0, or substantially greater that 1.0, in which case this ratio in the compound film may be reduced to greater than about 0.6 and less than about 1.0. The source material may be prepared as an ink from particles in powder form. The oxide-containing particles may include a dopant, as may the compound film. Compound films including a Group IIB-IVA-VA compound may be substituted using appropriate substitutions in the method. The method, also, is applicable to fabrication of solar cells and other electronic devices.

  8. Direct observation of both contact and remote oxygen scavenging of GeO{sub 2} in a metal-oxide-semiconductor stack

    SciTech Connect (OSTI)

    Fadida, S., E-mail: sivanfa@tx.technion.ac.il; Shekhter, P.; Eizenberg, M. [Department of Materials Science and Engineering, Technion-Israel Institute of Technology, Haifa (Israel); Cvetko, D. [Laboratorio TASC/IOM-CNR, Area di ricerca, Trieste (Italy); Department of Physics, Faculty of Mathematics and Physics, University of Ljubljana, Ljubljana (Slovenia); Floreano, L.; Verdini, A. [Laboratorio TASC/IOM-CNR, Area di ricerca, Trieste (Italy); Nyns, L.; Van Elshocht, S. [Imec, Kapeldreef 75, B-3001 Leuven (Belgium); Kymissis, I. [Department of Electrical Engineering, Columbia University, New York, New York 10027 (United States)

    2014-10-28T23:59:59.000Z

    In the path to incorporating Ge based metal-oxide-semiconductor into modern nano-electronics, one of the main issues is the oxide-semiconductor interface quality. Here, the reactivity of Ti on Ge stacks and the scavenging effect of Ti were studied using synchrotron X-ray photoelectron spectroscopy measurements, with an in-situ metal deposition and high resolution transmission electron microscopy imaging. Oxygen removal from the Ge surface was observed both in direct contact as well as remotely through an Al{sub 2}O{sub 3} layer. The scavenging effect was studied in situ at room temperature and after annealing. We find that the reactivity of Ti can be utilized for improved scaling of Ge based devices.

  9. Hybrid density functional calculations of the band gap of GaxIn1-xN Xifan Wu,1 Eric J. Walter,2 Andrew M. Rappe,3 Roberto Car,1 and Annabella Selloni1

    E-Print Network [OSTI]

    Rappe, Andrew M.

    Hybrid density functional calculations of the band gap of GaxIn1-xN Xifan Wu,1 Eric J. Walter,2 Andrew M. Rappe,3 Roberto Car,1 and Annabella Selloni1 1Chemistry Department, Princeton University Recent theoretical work has provided evidence that hybrid functionals, which include a fraction of exact

  10. VOLUME 84, NUMBER 19 P H Y S I C A L R E V I E W L E T T E R S 8 MAY 2000 Theory and Experiments on Elastic Band Gaps

    E-Print Network [OSTI]

    Investigaciones Científicas (CSIC), Serrano 144, 28006 Madrid, Spain 2 Ames Laboratory, Iowa State University, Ames, Iowa 50011 3 Instituto de Acústica, CSIC, Serrano 144, 28006 Madrid, Spain 4 Instituto de Física Aplicada, CSIC, Serrano 144, 28006 Madrid, Spain (Received 26 February 1999) We study elastic band gaps

  11. The Study of Energy Band Gap of In{sub x}Al{sub y}Ga{sub 1-x-y}N Quaternary Alloys using UV-VIS Spectroscopy

    SciTech Connect (OSTI)

    Raof, N. H. Abd.; Ng, S. S.; Hassan, H. Abu; Hassan, Z. [Nano-Optoelectronics Research Laboratory, School of Physics, Universiti Sains Malaysia, 11800 Penang (Malaysia)

    2009-06-01T23:59:59.000Z

    Quaternary In{sub x}Al{sub y}Ga{sub 1-x-y}N alloys with indium (In) mole fraction x ranging from 0.01 to 0.10 and constant aluminum (Al) mole fraction y = 0.06, were grown by molecular beam epitaxy. The energy band gaps of InAlGaN alloys were investigated using UV-VIS spectroscopy under room temperature. The energy band gap decreases with increasing In composition from 0.01 to 0.08. This trend is expected since the incorporation of In lowers the energy band gap of Al{sub 0.06}Ga{sub 0.94}N(3.72 eV). However, for InAlGaN with In composition of 0.1, the band gap shows a sudden increase in energy. This is probably due to local alloy compositional fluctuations in the epilayer, contributed by incomplete substitutions of Ga atoms by the In atoms, thus retaining a much richer GaN structure. Finally, we investigate the bowing parameter appears also to be very sensitive on In content. We obtained b 50.08 for quaternary InAlGaN alloys.

  12. Gallium arsenide-based ternary compounds and multi-band-gap solar cell research. Annual subcontract report, 15 April 1988--14 June 1990

    SciTech Connect (OSTI)

    Vernon, S. [Spire Corp., Bedford, MA (United States)

    1993-02-01T23:59:59.000Z

    Aim of this contract is the achievement of a high-efficiency, low-cost solar cell. The basic approach to the problem is centered upon the heteroepitaxial growth of a III-V compound material onto a single-crystal silicon wafer. The growth technique employed is metalorganic chemical vapor deposition. The silicon wafer may serve as a mechanical substrate and ohmic contact for a single-junction device, or may contain a p-n junction of its own and form the bottom cell of a two junction tandem solar cell structure. The III-V material for the single-junction case is GaAs and for the two-junction case is either GaAlAs or GaAsP, either material having the proper composition to yield a band gap of approximately 1.7 eV. Results achieved in this contract include the following: (1) a 17.6% efficient GaAs-on-Si solar cell; (2) an 18.5% efficient GaAs-on-Si concentrator solar cell at 400 suns; (3) a 24.8% efficient GaAs-on-GaAs solar cell; (4) a 28.7% efficient GaAs-on-GaAs concentrator solar cell at 200 suns; (5) measurement of the effects of dislocation density and emitter doping on GaAs cells; and (6) improvements in the growth process to achieve reproducible thin AlGaAs window layers with low recombination velocities and environmental stability.

  13. Conduction properties of metal/organic monolayer/semiconductor heterostructures

    SciTech Connect (OSTI)

    Li, D.; Bishop, A.; Gim, Y.; Shi, X.B.; Fitzsimmons, M.R.; Jia, Q.X. [Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)] [Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

    1998-11-01T23:59:59.000Z

    We have fabricated and characterized rectifying devices made of metal/organic monolayer/semiconductor heterostructures. The devices consist of an organic barrier layer sandwiched between an aluminum (Al) metal contact and a {ital p}-type Si semiconductor. The barrier materials were chosen from three types of self-assembled monolayers (SAMs) with different electronic properties: (1) wide-band gap poly(diallydimethyl ammonium) chloride (PDDA), (2) narrow-band gap PDDA/NiPc (nickel phthalocyanine tetrasulfonate), and (3) donor type PDDA/PPP (poly {ital p}-quaterphenylene-disulfonic-dicarboxylic acid). From current{endash}voltage (I{endash}V) measurements at room temperature, we have found the turn-on voltage of the devices can be tuned by varying the structure, hence electronic properties, of the organic monolayers, and that there exists a power-law dependence of {ital I} on V, I{proportional_to}V{sup {alpha}}, with the exponent {alpha}=2.2 for PDDA, 2.7 for PDDA/NiPc, and 1.44 for PDDA/PPP as the barrier layer, respectively. Our results imply that the transport properties are controlled by both the electronic properties of the SAMs and those of the metal and semiconductor, as indicated by the power-law dependence of the I{endash}V characteristics. {copyright} {ital 1998 American Institute of Physics.}

  14. Gallium arsenide-based ternary compounds and multi-band-gap solar cell research. Final subcontract report, 1 April 1988--31 March 1990

    SciTech Connect (OSTI)

    Vernon, S. [Spire Corp., Bedford, MA (United States)

    1993-07-01T23:59:59.000Z

    This report describes work to achieve a high-efficiency, low-cost solar cell. The basic approach to the problem is centered upon the heteroepitaxial growth of a III-V compound material onto a single-crystal silicon wafer. The growth technique employed throughout this work is metal-organic chemical vapor deposition. The silicon wafer may serve as a mechanical substrate and ohmic contact for a single-junction device, or it may contain a p-n junction of its own and form the bottom cell of a two-junction tandem solar cell structure. The III-V material for the single-junction case is GaAs, and for the two-junction case it is either GaAlAs or GaAsP, either material having the proper composition to yield a band gap of approximately 1.7 eV. Results achieved in this contract include (1) a 17.6%-efficient GaAs-on-Si solar cell; (2) an 18.5%-efficient GaAs-on-Si concentrator solar cell at 400 suns; (3) a 24.8%-efficient GaAs-on-GaAs solar cell; (4) a 28.7%-efficient GaAs-on-GaAs concentrator solar cell at 200 suns; (5) the measurement of the effects of dislocation density and emitter doping on GaAs cells; and (6) improvements in the growth process to achieve reproducible thin AlGaAs window layers with low recombination velocities and environmental stability.

  15. Ballistic performance comparison of monolayer transition metal dichalcogenide MX{sub 2} (M = Mo, W; X = S, Se, Te) metal-oxide-semiconductor field effect transistors

    SciTech Connect (OSTI)

    Chang, Jiwon; Register, Leonard F.; Banerjee, Sanjay K. [Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758 (United States)

    2014-02-28T23:59:59.000Z

    We study the transport properties of monolayer MX{sub 2} (M?=?Mo, W; X?=?S, Se, Te) n- and p-channel metal-oxide-semiconductor field effect transistors (MOSFETs) using full-band ballistic non-equilibrium Green's function simulations with an atomistic tight-binding Hamiltonian with hopping potentials obtained from density functional theory. We discuss the subthreshold slope, drain-induced barrier lowering (DIBL), as well as gate-induced drain leakage (GIDL) for different monolayer MX{sub 2} MOSFETs. We also report the possibility of negative differential resistance behavior in the output characteristics of nanoscale monolayer MX{sub 2} MOSFETs.

  16. Anomalous output characteristic shift for the n-type lateral diffused metal-oxide-semiconductor transistor with floating P-top layer

    SciTech Connect (OSTI)

    Liu, Siyang; Zhang, Chunwei; Sun, Weifeng, E-mail: swffrog@seu.edu.cn [National ASIC System Engineering Research Center, Southeast University, Nanjing 210096 (China); Su, Wei; Wang, Shaorong; Ma, Shulang; Huang, Yu [CSMC Technologies Corporation, Wuxi 214061 (China)

    2014-04-14T23:59:59.000Z

    Anomalous output characteristic shift of the n-type lateral diffused metal-oxide-semiconductor transistor with floating P-top layer is investigated. It shows that the linear drain current has obvious decrease when the output characteristic of fresh device is measured for two consecutive times. The charge pumping experiments demonstrate that the decrease is not from hot-carrier degradation. The reduction of cross section area for the current flowing, which results from the squeezing of the depletion region surrounding the P-top layer, is responsible for the shift. Consequently, the current capability of this special device should be evaluated by the second measured output characteristic.

  17. An in-depth noise model for giant magnetoresistance current sensors for circuit design and complementary metal–oxide–semiconductor integration

    SciTech Connect (OSTI)

    Roldán, A., E-mail: amroldan@ugr.es; Roldán, J. B. [Department of Electronics and Computer Technology, University of Granada (Spain); Reig, C. [Department of Electronic Engineering, University of Valencia (Spain); Cardoso, S. [INESC-MN and IN, Rua Alves Redol 9, 1000-029 Lisbon (Portugal); Instituto Superior Técnico (IST), Av. Rovisco Pais, 1000-029 Lisbon (Portugal); Cardoso, F. [INESC-MN and IN, Rua Alves Redol 9, 1000-029 Lisbon (Portugal); Ferreira, R. [International Iberian Nanotechnology Laboratory, Braga (Portugal); Freitas, P. P. [INESC-MN and IN, Rua Alves Redol 9, 1000-029 Lisbon (Portugal); International Iberian Nanotechnology Laboratory, Braga (Portugal)

    2014-05-07T23:59:59.000Z

    Full instrumentation bridges based on spin valve of giant magnetoresistance and magnetic tunnel junction devices have been microfabricated and experimentally characterized from the DC and noise viewpoint. A more realistic model of these devices was obtained in this work, an electrical and thermal model previously developed have been improved in such a way that noise effects are also included. We have implemented the model in a circuit simulator and reproduced the experimental measurements accurately. This provides a more realistic and complete tool for circuit design where magnetoresistive elements are combined with well-known complementary metal–oxide–semiconductor modules.

  18. Band gap modification and ferroelectric properties of Bi{sub 0.5}(Na,K){sub 0.5}TiO{sub 3}-based by Li substitution

    SciTech Connect (OSTI)

    Quan, Ngo Duc [Department of General Physics, School of Engineering Physics, Ha Noi University of Science and Technology, 1 Dai Co Viet road, Ha Noi (Viet Nam) [Department of General Physics, School of Engineering Physics, Ha Noi University of Science and Technology, 1 Dai Co Viet road, Ha Noi (Viet Nam); International Training Institute for Materials Science, Hanoi University of Science and Technology, 1 Dai Co Viet road, Hanoi (Viet Nam); Hung, Vu Ngoc [International Training Institute for Materials Science, Hanoi University of Science and Technology, 1 Dai Co Viet road, Hanoi (Viet Nam)] [International Training Institute for Materials Science, Hanoi University of Science and Technology, 1 Dai Co Viet road, Hanoi (Viet Nam); Quyet, Nguyen Van [Hanautech Co., Ltd., 832, Tamnip-dong, Yuseong-gu, Daejeon (Korea, Republic of)] [Hanautech Co., Ltd., 832, Tamnip-dong, Yuseong-gu, Daejeon (Korea, Republic of); Chung, Hoang Vu [Institute of Materials Science, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet street, Hanoi (Viet Nam)] [Institute of Materials Science, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet street, Hanoi (Viet Nam); Dung, Dang Duc, E-mail: dung.dangduc@hust.edu.vn [Department of General Physics, School of Engineering Physics, Ha Noi University of Science and Technology, 1 Dai Co Viet road, Ha Noi (Viet Nam)

    2014-01-15T23:59:59.000Z

    We report on the reduction of band gap in Bi{sub 0.5}(Na{sub 0.82-x}Li{sub x}K{sub 0.18}){sub 0.5}(Ti{sub 0.95}Sn{sub 0.05})O{sub 3} from 2.99 eV to 2.84 eV due to the substitutions of Li{sup +} ions to Na{sup +} sites. In addition, the lithium substitution samples exhibit an increasing of the maximal polarizations from 21.8 to 25.7 ?C/cm{sup 2}. The polarization enhancement of ferroelectric and reduction of the band gaps are strongly related to the Li substitution concentration as evaluated via the electronegative between A-site and oxygen and tolerance factor. The results are promising for photovoltaic and photocatalytic applications.

  19. Electrochemical fabrication and optical properties of porous tin oxide films with structural colors

    SciTech Connect (OSTI)

    Cheng, Hua; Shu, Shiwei; Lee, Chris; Zeng, Shanshan [Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Centre for Functional Photonics, City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue (Hong Kong); Lu, Zhouguang [Department of Materials Science and Engineering, South University of Science and Technology of China, Shenzhen, Guangdong 518055 (China); Lu, Jian, E-mail: jianlu@cityu.edu.hk, E-mail: yangli@cityu.edu.hk [Department of Mechanical and Biomedical Engineering, City University of Hong Kong, Kowloon (Hong Kong); Centre for Advanced Structural Materials, City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-Tech Industrial Park, Nanshan District, Shenzhen (China); Li, Yang Yang, E-mail: jianlu@cityu.edu.hk, E-mail: yangli@cityu.edu.hk [Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Centre for Functional Photonics, City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue (Hong Kong); City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-Tech Industrial Park, Nanshan District, Shenzhen (China)

    2014-10-21T23:59:59.000Z

    Photonic crystals with porous features not only provide the capability to control light but also enable structural colors that are environmentally sensitive. Here, we report a novel kind of tin oxide-based photonic crystal featuring periodically arranged air pores fabricated by the periodic anodization of tin foil. The existence of a photonic band gap in the fabricated structure is verified by its vivid color, and its reflective spectra which are responsive to environmental stimuli. Furthermore, the sample colors (i.e., the photonic band gap positions) can be easily adjusted by manipulating the anodization parameters. The theoretical modeling results of these tin oxide photonic crystals agree well with the reported experimental ones.

  20. Influence of growth temperature on electrical, optical, and plasmonic properties of aluminum:zinc oxide films grown by radio frequency magnetron sputtering

    SciTech Connect (OSTI)

    Dondapati, Hareesh; Santiago, Kevin; Pradhan, A. K. [Center for Materials Research, Norfolk State University, 700 Park Avenue, Norfolk, Virginia 23504 (United States)] [Center for Materials Research, Norfolk State University, 700 Park Avenue, Norfolk, Virginia 23504 (United States)

    2013-10-14T23:59:59.000Z

    We have investigated the responsible mechanism for the observation of metallic conductivity at room temperature and metal-semiconductor transition (MST) at lower temperatures for aluminum-doped zinc oxide (AZO) films. AZO films were grown on glass substrates by radio-frequency magnetron sputtering with varying substrate temperatures (T{sub s}). The films were found to be crystalline with the electrical resistivity close to 1.1 × 10{sup ?3} ? cm and transmittance more than 85% in the visible region. The saturated optical band gap of 3.76 eV was observed for the sample grown at T{sub s} of 400 °C, however, a slight decrease in the bandgap was noticed above 400 °C, which can be explained by Burstein–Moss effect. Temperature dependent resistivity measurements of these highly conducting and transparent films showed a MST at ?110 K. The observed metal-like and metal-semiconductor transitions are explained by taking into account the Mott phase transition and localization effects due to defects. All AZO films demonstrate crossover in permittivity from positive to negative and low loss in the near-infrared region, illustrating its applications for plasmonic metamaterials, including waveguides for near infrared telecommunication region. Based on the results presented in this study, the low electrical resistivity and high optical transmittance of AZO films suggested a possibility for the application in the flexible electronic devices, such as transparent conducting oxide film on LEDs, solar cells, and touch panels.

  1. Semiconductor films on flexible iridium substrates

    DOE Patents [OSTI]

    Goyal, Amit

    2005-03-29T23:59:59.000Z

    A laminate semiconductor article includes a flexible substrate, an optional biaxially textured oxide buffer system on the flexible substrate, a biaxially textured Ir-based buffer layer on the substrate or the buffer system, and an epitaxial layer of a semiconductor. Ir can serve as a substrate with an epitaxial layer of a semiconductor thereon.

  2. Strained Sistrained Ge dual-channel heterostructures on relaxed Si0.5Ge0.5 for symmetric mobility p-type and n-type metal-oxide-semiconductor

    E-Print Network [OSTI]

    Strained SiÕstrained Ge dual-channel heterostructures on relaxed Si0.5Ge0.5 for symmetric mobility By growing heterostructures that combine a surface strained Si layer with a buried strained Ge layer on Si0.5Ge0.5 , we have fabricated metal-oxide-semiconductor field-effect transistors with mobility

  3. Oxidized GaN(0001) Surfaces studied by Scanning Tunneling Microscopy and Spectroscopy and by First-Principles Theory

    E-Print Network [OSTI]

    Feenstra, Randall

    1 Oxidized GaN(0001) Surfaces studied by Scanning Tunneling Microscopy and Spectroscopy Abstract Oxidized Ga-polar GaN surfaces have been studied both experimentally and theoretically. For in tunneling spectroscopy revealed a surface band gap with size close to that of GaN, indicating that any

  4. Theoretical study of influencing factors on the dispersion of bulk band-gap edges and the surface states in topological insulators Bi{sub 2}Te{sub 3} and Bi{sub 2}Se{sub 3}

    SciTech Connect (OSTI)

    Rusinov, I. P., E-mail: rusinovip@gmail.com; Nechaev, I. A. [Tomsk State University (Russian Federation); Chulkov, E. V. [Donostia International Physics Center (DIPC) (Spain)

    2013-06-15T23:59:59.000Z

    The dispersion of the band-gap edge states in bulk topological insulators Bi{sub 2}Te{sub 3} and Bi{sub 2}Se{sub 3} is considered within density functional theory. The dependences of this dispersion both on the approximation used for an exchange-correlation functional at fixed unit cell parameters and atomic positions and on these parameters and positions that are obtained upon structural relaxation performed using a certain approximated functional are analyzed. The relative position of the Dirac point of topologically protected surface states and the valence band maximum in the surface electronic structure of the topological insulators is discussed.

  5. Linker-Induced Anomalous Emission of Organic-Molecule Conjugated Metal-Oxide Nanoparticles

    SciTech Connect (OSTI)

    Turkowski, Volodymyr; Babu, Suresh; Le, Duy; Kumar, Amit; Haldar, Manas K.; Wagh, Anil V.; Hu, Zhongjian; Karakoti, Ajay S.; Gesquiere, Andre J.; Law, Benedict; Mallik, Sanku; Rahman, Talat S.; Leuenberger, Michael N.; Seal, Sudipta

    2012-06-26T23:59:59.000Z

    Semiconductor nanoparticles conjugated with organic- and dye-molecules to yield high efficiency visible photoluminescence (PL) hold great potential for many future technological applications. We show that folic acid (FA)-conjugated to nanosize TiO2 and CeO2 particles demonstrates a dramatic increase of photoemission intensity at wavelengths between 500 and 700 nm when derivatized using aminopropyl trimethoxysilane (APTMS) as spacer-linker molecules between the metal oxide and FA. Using density-functional theory (DFT) and time-dependent DFT calculations we demonstrate that the strong increase of the PL can be explained by electronic transitions between the titania surface oxygen vacancy (OV) states and the low-energy excited states of the FA/APTMS molecule anchored onto the surface oxygen bridge sites in close proximity to the OVs. We suggest this scenario to be a universal feature for a wide class of metal oxide nanoparticles, including nanoceria, possessing a similar band gap (3 eV) and with a large surface-vacancy-related density of electronic states. We demonstrate that the molecule-nanoparticle linker can play a crucial role in tuning the electronic and optical properties of nanosystems by bringing optically active parts of the molecule and of the surface close to each other.

  6. EEE 6397 Semiconductor Device Theory (Fall, 2014, 5th

    E-Print Network [OSTI]

    Fang, Yuguang "Michael"

    1 EEE 6397 Semiconductor Device Theory (Fall, 2014, 5th period MWF, BEN328) Goals: (1) Develop fundamental understanding on the device physics of the most important semiconductor devices, such as PN junctions, metal-semiconductor contacts, metal-oxide-semiconductor capacitors, and field-effect transistors

  7. Isotopically controlled semiconductors

    E-Print Network [OSTI]

    Haller, Eugene E.

    2006-01-01T23:59:59.000Z

    16 Isotopically Controlled Semiconductors Eugene E. Hallerof isotopically engineered semiconductors; for outstandingisotopically controlled semiconductor crystals. This article

  8. Predicted band structures of III-V semiconductors in wurtzite phase

    E-Print Network [OSTI]

    Amrit De; Craig E. Pryor

    2009-08-13T23:59:59.000Z

    While non-nitride III-V semiconductors typically have a zincblende structure, they may also form wurtzite crystals under pressure or when grown as nanowhiskers. This makes electronic structure calculation difficult since the band structures of wurtzite III-V semiconductors are poorly characterized. We have calculated the electronic band structure for nine III-V semiconductors in the wurtzite phase using transferable empirical pseudopotentials including spin-orbit coupling. We find that all the materials have direct gaps. Our results differ significantly from earlier {\\it ab initio} calculations, and where experimental results are available (InP, InAs and GaAs) our calculated band gaps are in good agreement. We tabulate energies, effective masses, and linear and cubic Dresselhaus zero-field spin-splitting coefficients for the zone-center states. The large zero-field spin-splitting coefficients we find may lead to new functionalities for designing devices that manipulate spin degrees of freedom.

  9. Lattice mismatched compound semiconductors and devices on silicon

    E-Print Network [OSTI]

    Yang, Li, Ph. D. Massachusetts Institute of Technology

    2011-01-01T23:59:59.000Z

    III-V compound semiconductors, due to their superior electron mobility, are promising candidates for n-type metal-oxide-semiconductor field effect transistors (MOSFETs). However, the limited size of III-V substrates and ...

  10. Controlled growth of semiconductor crystals

    DOE Patents [OSTI]

    Bourret-Courchesne, E.D.

    1992-07-21T23:59:59.000Z

    A method is disclosed for growth of III-V, II-VI and related semiconductor single crystals that suppresses random nucleation and sticking of the semiconductor melt at the crucible walls. Small pieces of an oxide of boron B[sub x]O[sub y] are dispersed throughout the comminuted solid semiconductor charge in the crucible, with the oxide of boron preferably having water content of at least 600 ppm. The crucible temperature is first raised to a temperature greater than the melt temperature T[sub m1] of the oxide of boron (T[sub m1]=723 K for boron oxide B[sub 2]O[sub 3]), and the oxide of boron is allowed to melt and form a reasonably uniform liquid layer between the crucible walls and bottom surfaces and the still-solid semiconductor charge. The temperature is then raised to approximately the melt temperature T[sub m2] of the semiconductor charge material, and crystal growth proceeds by a liquid encapsulated, vertical gradient freeze process. About half of the crystals grown have a dislocation density of less than 1000/cm[sup 2]. If the oxide of boron has water content less than 600 ppm, the crucible material should include boron nitride, a layer of the inner surface of the crucible should be oxidized before the oxide of boron in the crucible charge is melted, and the sum of thicknesses of the solid boron oxide layer and liquid boron oxide layer should be at least 50 [mu]m. 7 figs.

  11. Controlled growth of semiconductor crystals

    DOE Patents [OSTI]

    Bourret-Courchesne, Edith D. (Richmond, CA)

    1992-01-01T23:59:59.000Z

    A method for growth of III-V, II-VI and related semiconductor single crystals that suppresses random nucleation and sticking of the semiconductor melt at the crucible walls. Small pieces of an oxide of boron B.sub.x O.sub.y are dispersed throughout the comminuted solid semiconductor charge in the crucible, with the oxide of boron preferably having water content of at least 600 ppm. The crucible temperature is first raised to a temperature greater than the melt temperature T.sub.m1 of the oxide of boron (T.sub.m1 =723.degree. K. for boron oxide B.sub.2 O.sub.3), and the oxide of boron is allowed to melt and form a reasonably uniform liquid layer between the crucible walls and bottom surfaces and the still-solid semiconductor charge. The temperature is then raised to approximately the melt temperature T.sub.m2 of the semiconductor charge material, and crystal growth proceeds by a liquid encapsulated, vertical gradient freeze process. About half of the crystals grown have a dislocation density of less than 1000/cm.sup.2. If the oxide of boron has water content less than 600 ppm, the crucible material should include boron nitride, a layer of the inner surface of the crucible should be oxidized before the oxide of boron in the crucible charge is melted, and the sum of thicknesses of the solid boron oxide layer and liquid boron oxide layer should be at least 50 .mu.m.

  12. Variation in band gap of lanthanum chromate by transition metals doping LaCr{sub 0.9}A{sub 0.1}O{sub 3} (A:Fe/Co/Ni)

    SciTech Connect (OSTI)

    Naseem, Swaleha, E-mail: wasiamu@gmail.com; Khan, Wasi, E-mail: wasiamu@gmail.com; Saad, A. A., E-mail: wasiamu@gmail.com; Shoeb, M., E-mail: wasiamu@gmail.com; Ahmed, Hilal, E-mail: wasiamu@gmail.com; Naqvi, A. H. [Centre of Excellence in Materials Science (Nanomaterials), Department of Applied Physics, Z.H. College of Engg. and Technology, Aligarh Muslim University, Aligarh-202002 (India); Husain, Shahid [Department of Physics, Aligarh Muslim University, Aligarh-202002 (India)

    2014-04-24T23:59:59.000Z

    Transition metal (Fe, Co, Ni) doped lanthanum chromate (LaCrO{sub 3}) nanoparticles (NPs) were prepared by gel combustion method and calcinated at 800°C. Microstructural studies were carried by XRD and SEM/EDS techniques. The results of structural characterization show the formation of all samples in single phase without any impurity. Optical properties were studied by UV- visible and photoluminescence techniques. The energy band gap was calculated and the variation was observed with the doping of transition metal ions. Photoluminescence spectra show the emission peak maxima for the pure LaCrO{sub 3} at about 315 nm. Influence of Fe, Co, Ni doping was studied and compared with pure lanthanum chromate nanoparticles.

  13. Characterization of device parameters in high-temperature metal-oxide-semiconductor field-effect transistors in. beta. -SiC thin films

    SciTech Connect (OSTI)

    Palmour, J.W.; Kong, H.S.; Davis, R.F.

    1988-08-15T23:59:59.000Z

    Both inversion- and depletion-mode n-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) have been fabricated on ..beta..-SiC thin films grown by chemical-vapor deposition. The inversion-mode devices were made on in situ doped (Al) p-type ..beta..-SiC(100) thin films grown on Si(100) substrates. The depletion-mode MOSFETs were made on n-type ..beta..-SiC(111) thin films grown on the Si(0001) face of a 6H ..cap alpha..-SiC substrates. Stable saturation and low subthreshold currents were achieved at drain-source voltages exceeding 5 and 25 V for the inversion-mode and depletion-mode devices, respectively. The transconductance increased with temperature up to 673 K for the short-gate-length devices, of either mode, and then decreased with further increases in temperature. It is proposed that the transconductances and threshold voltages for the inversion-mode devices are greatly affected by minority-carrier injection from the source. Stable transistor action was observed for both types of devices at temperatures up to 823 K, with the depletion-mode devices operating very well up to 923 K.

  14. Physical understanding of electron mobility in asymmetrically strained InGaAs-on-insulator metal-oxide-semiconductor field-effect transistors fabricated by lateral strain relaxation

    SciTech Connect (OSTI)

    Kim, SangHyeon, E-mail: dadembyora@mosfet.t.u-tokyo.ac.jp, E-mail: sh-kim@kist.re.kr; Yokoyama, Masafumi; Ikku, Yuki; Nakane, Ryosho; Takenaka, Mitsuru; Takagi, Shinichi [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Ichikawa, Osamu; Osada, Takenori; Hata, Masahiko [Sumitomo Chemical Co. Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294 (Japan)

    2014-03-17T23:59:59.000Z

    In this paper, we fabricated asymmetrically tensile-strained In{sub 0.53}Ga{sub 0.47}As-on-insulator (-OI) metal-oxide-semiconductor field-effect transistors (MOSFETs) using a lateral strain relaxation technique. A stripe-like line structure, fabricated in biaxially strained In{sub 0.53}Ga{sub 0.47}As-OI can lead to the lateral strain relaxation and asymmetric strain configuration in In{sub 0.53}Ga{sub 0.47}As-OI with the channel width of 100?nm. We have found that the effective mobility (?{sub eff}) enhancement in In{sub 0.53}Ga{sub 0.47}As-OI MOSFETs with uniaxial-like asymmetric strain becomes smaller than that in In{sub 0.53}Ga{sub 0.47}As-OI MOSFETs with biaxial strain. We have clarified from a systematic analysis between the strain values and the ?{sub eff} characteristics that this mobility behavior can be understood by the change of the energy level of the conduction band minimum due to the lateral strain relaxation.

  15. Positive bias temperature instability in p-type metal-oxide-semiconductor devices with HfSiON/SiO{sub 2} gate dielectrics

    SciTech Connect (OSTI)

    Samanta, Piyas, E-mail: piyas@vcfw.org [Department of Physics, Vidyasagar College for Women, 39 Sankar Ghosh Lane, Kolkata 700 006 (India); Huang, Heng-Sheng; Chen, Shuang-Yuan [Institute of Mechatronic Engineering, National Taipei University of Technology, No. 1, Sec. 3, Chung-Hsiao E. Rd., Taipei 106, Taiwan (China); Liu, Chuan-Hsi [Department of Mechatronic Technology, National Taiwan Normal University, No. 162, Sec. 1, He-Ping E. Rd., Taipei 106, Taiwan (China); Cheng, Li-Wei [Central R and D Division, United Microelectronics Corporation, No. 3, Li-Hsin Rd. II, Hsinchu 300, Taiwan (China)

    2014-02-21T23:59:59.000Z

    We present a detailed investigation on positive-bias temperature stress (PBTS) induced degradation of nitrided hafnium silicate (HfSiON)/SiO{sub 2} gate stack in n{sup +}-poly crystalline silicon (polySi) gate p-type metal-oxide-semiconductor (pMOS) devices. The measurement results indicate that gate dielectric degradation is a composite effect of electron trapping in as-fabricated as well as newly generated neutral traps, resulting a significant amount of stress-induced leakage current and generation of surface states at the Si/SiO{sub 2} interface. Although, a significant amount of interface states are created during PBTS, the threshold voltage (V{sub T}) instability of the HfSiON based pMOS devices is primarily caused by electron trapping and detrapping. It is also shown that PBTS creates both acceptor- and donor-like interface traps via different depassivation mechanisms of the Si{sub 3}???SiH bonds at the Si/SiO{sub 2} interface in pMOS devices. However, the number of donor-like interface traps ?N{sub it}{sup D} is significantly greater than that of acceptor-like interface traps ?N{sup A}{sub it}, resulting the PBTS induced net interface traps as donor-like.

  16. Thin film three-dimensional topological insulator metal-oxide-semiconductor field-effect-transistors: A candidate for sub-10?nm devices

    SciTech Connect (OSTI)

    Akhavan, N. D., E-mail: nima.dehdashti@uwa.edu.au; Jolley, G.; Umana-Membreno, G. A.; Antoszewski, J.; Faraone, L. [Department of Electrical, Electronic and Computer Engineering, University of Western Australia, Crawley, WA 6009 (Australia)

    2014-08-28T23:59:59.000Z

    Three-dimensional (3D) topological insulators (TI) are a new state of quantum matter in which surface states reside in the bulk insulating energy bandgap and are protected by time-reversal symmetry. It is possible to create an energy bandgap as a consequence of the interaction between the conduction band and valence band surface states from the opposite surfaces of a TI thin film, and the width of the bandgap can be controlled by the thin film thickness. The formation of an energy bandgap raises the possibility of thin-film TI-based metal-oxide-semiconductor field-effect-transistors (MOSFETs). In this paper, we explore the performance of MOSFETs based on thin film 3D-TI structures by employing quantum ballistic transport simulations using the effective continuous Hamiltonian with fitting parameters extracted from ab-initio calculations. We demonstrate that thin film transistors based on a 3D-TI structure provide similar electrical characteristics compared to a Si-MOSFET for gate lengths down to 10?nm. Thus, such a device can be a potential candidate to replace Si-based MOSFETs in the sub-10?nm regime.

  17. Variable temperature semiconductor film deposition

    DOE Patents [OSTI]

    Li, Xiaonan (Golden, CO); Sheldon, Peter (Lakewood, CO)

    1998-01-01T23:59:59.000Z

    A method of depositing a semiconductor material on a substrate. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  18. Variable temperature semiconductor film deposition

    DOE Patents [OSTI]

    Li, X.; Sheldon, P.

    1998-01-27T23:59:59.000Z

    A method of depositing a semiconductor material on a substrate is disclosed. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  19. Direct band gap optical emission from Ge islands grown on relaxed Si{sub 0.5}Ge{sub 0.5}/Si (100) substrate

    SciTech Connect (OSTI)

    Aluguri, R.; Manna, S.; Ray, S. K., E-mail: physkr@phy.iitkgp.ernet.in [Department of Physics and Meteorology, Indian Institute of Technology Kharagpur, Kharagpur 721302 (India)

    2014-01-07T23:59:59.000Z

    Strained Ge islands have been grown on fully relaxed Si{sub 0.5}Ge{sub 0.5} substrate by pulsed laser ablation technique. The formation of strained Ge islands has been found for film with higher thickness following Stranski–Krastanov growth mechanism. The variation of strain with changing Ge layer thickness has been analyzed using Raman spectroscopy and high-resolution X-ray diffraction techniques. X-ray photoelectron spectra have shown the absence of any Si-Ge intermixing and oxidation of Ge films. A strong no-phonon photoluminescence emission from Ge islands has been observed, showing the superior optical characteristics of the islands grown on relaxed substrate.

  20. SEMICONDUCTOR DETECTORS - AN INTRODUCTION

    E-Print Network [OSTI]

    Goulding, F.S.

    2011-01-01T23:59:59.000Z

    infrinfc primely owned dtfiw. SEMICONDUCTOR DETECTORS - ANi) LBL-7282 I. History Semiconductor detectors appeared onof alpha particles by semiconductor diodes several years

  1. Isotopically controlled semiconductors

    E-Print Network [OSTI]

    Haller, E.E.

    2004-01-01T23:59:59.000Z

    and phonons in semiconductors,” J. Non-Cryst. Solids 141 (LVM) Spectroscopy of Semiconductors,” Mat. Res. Soc. Symp.Isotopically Engineered Semiconductors – New Media for the

  2. Isotopically controlled semiconductors

    E-Print Network [OSTI]

    Haller, Eugene E.

    2001-01-01T23:59:59.000Z

    Transmutation Doping of Semiconductor Materials, NationalTransmutation Doping of Semiconductor Materials, NationalProperties of Doped Semiconductors , Solid State Series,

  3. Semiconductor Nanowires: What's Next?

    E-Print Network [OSTI]

    Yang, Peidong

    2011-01-01T23:59:59.000Z

    Semiconductor nanowires, what’s next? Peidong Yang, Ruoxuelater research into semiconductor whiskers with nanoscalewere popularized as semiconductor nanowires in the following

  4. Hydrogen local vibrational modes in semiconductors

    SciTech Connect (OSTI)

    McCluskey, M D [Univ. of California, Berkeley, CA (United States). Dept. of Physics

    1997-06-01T23:59:59.000Z

    Following, a review of experimental techniques, theory, and previous work, the results of local vibrational mode (LVM) spectroscopy on hydrogen-related complexes in several different semiconductors are discussed. Hydrogen is introduced either by annealing in a hydrogen ambient. exposure to a hydrogen plasma, or during growth. The hydrogen passivates donors and acceptors in semiconductors, forming neutral complexes. When deuterium is substituted for hydrogen. the frequency of the LVM decreases by approximately the square root of two. By varying the temperature and pressure of the samples, the microscopic structures of hydrogen-related complexes are determined. For group II acceptor-hydrogen complexes in GaAs, InP, and GaP, hydrogen binds to the host anion in a bond-centered orientation, along the [111] direction, adjacent to the acceptor. The temperature dependent shift of the LVMs are proportional to the lattice thermal energy U(T), a consequence of anharmonic coupling between the LVM and acoustical phonons. In the wide band gap semiconductor ZnSe, epilayers grown by metalorganic chemical vapor phase epitaxy (MOCVD) and doped with As form As-H complexes. The hydrogen assumes a bond-centered orientation, adjacent to a host Zn. In AlSb, the DX centers Se and Te are passivated by hydrogen. The second, third, and fourth harmonics of the wag modes are observed. Although the Se-D complex has only one stretch mode, the Se-H stretch mode splits into three peaks. The anomalous splitting is explained by a new interaction between the stretch LVM and multi-phonon modes of the lattice. As the temperature or pressure is varied, and anti-crossing is observed between LVM and phonon modes.

  5. Modeling the effect of native and laser-induced states on the dielectric breakdown of wide band gap optical materials by multiple subpicosecond laser pulses

    SciTech Connect (OSTI)

    Emmert, Luke A.; Mero, Mark; Rudolph, Wolfgang [Department of Physics and Astronomy, University of New Mexico, Albuquerque, New Mexico 87131 (United States)

    2010-08-15T23:59:59.000Z

    A model for the multiple-pulse laser-induced breakdown behavior of dielectrics is presented. It is based on a critical conduction band (CB) electron density leading to dielectric breakdown. The evolution of the CB electron density during the pulse train is calculated using rate equations involving transitions between band and mid-gap states (native and laser-induced). Using realistic estimations for the trap density and ionization cross-section, the model is able to reproduce the experimentally observed drop in the multiple-pulse damage threshold relative to the single-pulse value, as long as the CB electron density is controlled primarily by avalanche ionization seeded by multiphoton ionization of the traps and the valence band. The model shows that at long pulse duration, the breakdown threshold becomes more sensitive to presence of traps close (within one photon energy) to the CB. The effect of native and laser-induced defects can be distinguished by their saturation behavior. Finally, measurements of the multiple-pulse damage threshold of hafnium oxide films are used to illustrate the application of the model.

  6. A methodology to identify and quantify mobility-reducing defects in 4H-silicon carbide power metal-oxide-semiconductor field-effect transistors

    SciTech Connect (OSTI)

    Ettisserry, D. P., E-mail: deva@umd.edu; Goldsman, N. [Department of Electrical and Computer Engineering, University of Maryland, College Park, Maryland 20742 (United States); Lelis, A. [U.S. Army Research Laboratory, 2800 Powder Mill Road, Adelphi, Maryland 20783 (United States)

    2014-03-14T23:59:59.000Z

    In this paper, we present a methodology for the identification and quantification of defects responsible for low channel mobility in 4H-Silicon Carbide (SiC) power metal-oxide-semiconductor field-effect transistors (MOSFETs). To achieve this, we use an algorithm based on 2D-device simulations of a power MOSFET, density functional simulations, and measurement data. Using physical modeling of carrier mobility and interface traps, we reproduce the experimental I-V characteristics of a 4H-SiC doubly implanted MOSFET through drift-diffusion simulation. We extract the position of Fermi level and the occupied trap density as a function of applied bias and temperature. Using these inputs, our algorithm estimates the number of possible trap types, their energy levels, and concentrations at 4H-SiC/SiO{sub 2} interface. Subsequently, we use density functional theory (DFT)-based ab initio simulations to identify the atomic make-up of defects causing these trap levels. We study silicon vacancy and carbon di-interstitial defects in the SiC side of the interface. Our algorithm indicates that the D{sub it} spectrum near the conduction band edge (3.25?eV) is composed of three trap types located at 2.8–2.85?eV, 3.05?eV, and 3.1–3.2?eV, and also calculates their densities. Based on DFT simulations, this work attributes the trap levels very close to the conduction band edge to the C di-interstitial defect.

  7. Sample size requirements for estimating effective dose from computed tomography using solid-state metal-oxide-semiconductor field-effect transistor dosimetry

    SciTech Connect (OSTI)

    Trattner, Sigal [Department of Medicine, Division of Cardiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States)] [Department of Medicine, Division of Cardiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States); Cheng, Bin [Department of Biostatistics, Columbia University Mailman School of Public Health, New York, New York 10032 (United States)] [Department of Biostatistics, Columbia University Mailman School of Public Health, New York, New York 10032 (United States); Pieniazek, Radoslaw L. [Center for Radiological Research, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States)] [Center for Radiological Research, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States); Hoffmann, Udo [Department of Radiology, Massachusetts General Hospital and Harvard Medical School, Boston, Massachusetts 02114 (United States)] [Department of Radiology, Massachusetts General Hospital and Harvard Medical School, Boston, Massachusetts 02114 (United States); Douglas, Pamela S. [Department of Medicine, Division of Cardiology, Duke University, Durham, North Carolina 27715 (United States)] [Department of Medicine, Division of Cardiology, Duke University, Durham, North Carolina 27715 (United States); Einstein, Andrew J., E-mail: andrew.einstein@columbia.edu [Department of Medicine, Division of Cardiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York and Department of Radiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York (United States)

    2014-04-15T23:59:59.000Z

    Purpose: Effective dose (ED) is a widely used metric for comparing ionizing radiation burden between different imaging modalities, scanners, and scan protocols. In computed tomography (CT), ED can be estimated by performing scans on an anthropomorphic phantom in which metal-oxide-semiconductor field-effect transistor (MOSFET) solid-state dosimeters have been placed to enable organ dose measurements. Here a statistical framework is established to determine the sample size (number of scans) needed for estimating ED to a desired precision and confidence, for a particular scanner and scan protocol, subject to practical limitations. Methods: The statistical scheme involves solving equations which minimize the sample size required for estimating ED to desired precision and confidence. It is subject to a constrained variation of the estimated ED and solved using the Lagrange multiplier method. The scheme incorporates measurement variation introduced both by MOSFET calibration, and by variation in MOSFET readings between repeated CT scans. Sample size requirements are illustrated on cardiac, chest, and abdomen–pelvis CT scans performed on a 320-row scanner and chest CT performed on a 16-row scanner. Results: Sample sizes for estimating ED vary considerably between scanners and protocols. Sample size increases as the required precision or confidence is higher and also as the anticipated ED is lower. For example, for a helical chest protocol, for 95% confidence and 5% precision for the ED, 30 measurements are required on the 320-row scanner and 11 on the 16-row scanner when the anticipated ED is 4 mSv; these sample sizes are 5 and 2, respectively, when the anticipated ED is 10 mSv. Conclusions: Applying the suggested scheme, it was found that even at modest sample sizes, it is feasible to estimate ED with high precision and a high degree of confidence. As CT technology develops enabling ED to be lowered, more MOSFET measurements are needed to estimate ED with the same precision and confidence.

  8. MICROSTRUCTURE-PROPERTY RELATIONSHIPS OF A ZINC OXIDE VARISTOR MATERIAL

    E-Print Network [OSTI]

    Williama, Pamela Louise

    2011-01-01T23:59:59.000Z

    RELATIONSHIPS OF A ZINC OXIDE VARISTOR MATERIAL Pamelaresistors, and zinc oxide varistors are semiconductorRELATIONSHIPS OF A ZINC OXIDE VARISTOR MATERIAL CONTENTS

  9. On band gaps in photonic crystal fibers

    E-Print Network [OSTI]

    Shane Cooper; Ilia Kamotski; Valery Smyshlyaev

    2014-11-02T23:59:59.000Z

    We consider the Maxwell's system for a periodic array of dielectric `fibers' embedded into a `matrix', with respective electric permittivities $\\epsilon_0$ and $\\epsilon_1$, which serves as a model for cladding in photonic crystal fibers (PCF). The interest is in describing admissible and forbidden (gap) pairs $(\\omega,k)$ of frequencies $\\omega$ and propagation constants $k$ along the fibers, for a Bloch wave solution on the cross-section. We show that, for "pre-critical" values of $k(\\omega)$ i.e. those just below $\\omega (\\min\\{\\epsilon_0,\\epsilon_1\\}\\mu)^{1/2}$ (where $\\mu$ is the magnetic permeability assumed constant for simplicity), the coupling specific to the Maxwell's systems leads to a particular partially degenerating PDE system for the axial components of the electromagnetic field. Its asymptotic analysis allows to derive the limit spectral problem where the fields are constrained in one of the phases by Cauchy-Riemann type relations. We prove related spectral convergence. We finally give some examples, in particular of small size "arrow" fibers ($\\epsilon_0>\\epsilon_1$) where the existence of the gaps near appropriate "micro-resonances" is demonstrated by a further asymptotic analysis.

  10. Transformation Optics with Photonic Band Gap Media

    E-Print Network [OSTI]

    Urzhumov, Yaroslav A

    2010-01-01T23:59:59.000Z

    We introduce a class of optical media based on adiabatically modulated, dielectric-only, and potentially extremely low-loss, photonic crystals. The media we describe represent a generalization of the eikonal limit of transformation optics (TO). The foundation of the concept is the possibility to fit frequency isosurfaces in the k-space of photonic crystals with elliptic surfaces, allowing them to mimic the dispersion relation of light in anisotropic effective media. Photonic crystal cloaks and other TO devices operating at visible wavelengths can be constructed from optically transparent substances like glasses, whose attenuation coefficient can be as small as 10 dB/km, suggesting the TO design methodology can be applied to the development of optical devices not limited by the losses inherent to metal-based, passive metamaterials.

  11. Details in Semiconductors Gordon Conference, New London, NH, August 3-8, 2008

    SciTech Connect (OSTI)

    Shengbai Zhang and Nancy Ryan Gray

    2009-09-16T23:59:59.000Z

    Continuing its tradition of excellence, this Gordon Conference will focus on research at the forefront of the field of defects in homogeneous and structured semiconductors. The conference will have a strong emphasis on the control of defects during growth and processing, with an increases emphasis on nanostructures as compared to previous conferences. Electronic, magnetic, and optical properties of bulk, thin film, and nanoscale semiconductors will be discussed in detail. In contrast to many conferences, which tend to focus on specific semiconductors, this conference deals with defects in a broad range of bulk and nanoscale electronic materials. This approach has proved to be extremely fruitful for advancing fundamental understanding in emerging materials such as wide-band-gap semiconductors, doped nanoparticles, and organic semiconductors. Presentations of state-of-the-art theoretical methods will contribute to a fundamental understanding of atomic-scale phenomena. The program consists of about twenty invited talks, with plenty of discussion time, and a number of contributed poster sessions. Because of the large amount of discussion time, the conference provides an ideal forum for dealing with topics that are new and/or controversial.

  12. Life-cycle Assessment of Semiconductors

    E-Print Network [OSTI]

    Boyd, Sarah B.

    2009-01-01T23:59:59.000Z

    SemiconductorThe Semiconductor Industry: Size, Growth andSemiconductor Life-cycle Environmental Impacts . . . . . . .

  13. Optical temperature sensor using thermochromic semiconductors

    DOE Patents [OSTI]

    Kronberg, James W. (Aiken, SC)

    1998-01-01T23:59:59.000Z

    An optical temperature measuring device utilizes thermochromic semiconductors which vary in color in response to changes in temperature. The thermochromic material is sealed in a glass matrix which allows the temperature sensor to detect high temperatures without breakdown. Cuprous oxide and cadmium sulfide are among the semiconductor materials which provide the best results. The changes in color may be detected visually using a sensor chip and an accompanying color card.

  14. Optical temperature sensor using thermochromic semiconductors

    DOE Patents [OSTI]

    Kronberg, James W. (108 Independent Blvd., Aiken, SC 29801)

    1996-01-01T23:59:59.000Z

    An optical temperature measuring device utilizes thermochromic semiconductors which vary in color in response to changes in temperature. The thermochromic material is sealed in a glass matrix which allows the temperature sensor to detect high temperatures without breakdown. Cuprous oxide and cadmium sulfide are among the semiconductor materials which provide the best results. The changes in color may be detected visually or by utilizing an optical fiber and an electrical sensing circuit.

  15. Optical temperature sensor using thermochromic semiconductors

    DOE Patents [OSTI]

    Kronberg, J.W.

    1996-08-20T23:59:59.000Z

    An optical temperature measuring device utilizes thermochromic semiconductors which vary in color in response to changes in temperature. The thermochromic material is sealed in a glass matrix which allows the temperature sensor to detect high temperatures without breakdown. Cuprous oxide and cadmium sulfide are among the semiconductor materials which provide the best results. The changes in color may be detected visually or by utilizing an optical fiber and an electrical sensing circuit. 7 figs.

  16. Optical temperature sensor using thermochromic semiconductors

    DOE Patents [OSTI]

    Kronberg, J.W.

    1998-06-30T23:59:59.000Z

    An optical temperature measuring device utilizes thermochromic semiconductors which vary in color in response to changes in temperature. The thermochromic material is sealed in a glass matrix which allows the temperature sensor to detect high temperatures without breakdown. Cuprous oxide and cadmium sulfide are among the semiconductor materials which provide the best results. The changes in color may be detected visually using a sensor chip and an accompanying color card. 8 figs.

  17. Stable surface passivation process for compound semiconductors

    DOE Patents [OSTI]

    Ashby, Carol I. H. (Edgewood, NM)

    2001-01-01T23:59:59.000Z

    A passivation process for a previously sulfided, selenided or tellurated III-V compound semiconductor surface. The concentration of undesired mid-gap surface states on a compound semiconductor surface is reduced by the formation of a near-monolayer of metal-(sulfur and/or selenium and/or tellurium)-semiconductor that is effective for long term passivation of the underlying semiconductor surface. Starting with the III-V compound semiconductor surface, any oxidation present thereon is substantially removed and the surface is then treated with sulfur, selenium or tellurium to form a near-monolayer of chalcogen-semiconductor of the surface in an oxygen-free atmosphere. This chalcogenated surface is then contacted with a solution of a metal that will form a low solubility chalcogenide to form a near-monolayer of metal-chalcogen-semiconductor. The resulting passivating layer provides long term protection for the underlying surface at or above the level achieved by a freshly chalcogenated compound semiconductor surface in an oxygen free atmosphere.

  18. Fabricating metal-oxide-semiconductor field-effect transistors on a polyethylene terephthalate substrate by applying low-temperature layer transfer of a single-crystalline silicon layer by meniscus force

    SciTech Connect (OSTI)

    Sakaike, Kohei; Akazawa, Muneki; Nakamura, Shogo [Department of Semiconductor Electronics and Integration Science, Graduate School of Advanced Sciences of Matter, Hiroshima University, Kagamiyama 1-3-1, Higashihiroshima, Hiroshima 739-8530 (Japan)] [Department of Semiconductor Electronics and Integration Science, Graduate School of Advanced Sciences of Matter, Hiroshima University, Kagamiyama 1-3-1, Higashihiroshima, Hiroshima 739-8530 (Japan); Higashi, Seiichiro [Department of Semiconductor Electronics and Integration Science, Graduate School of Advanced Sciences of Matter, Hiroshima University, Kagamiyama 1-3-1, Higashihiroshima, Hiroshima 739-8530 (Japan) [Department of Semiconductor Electronics and Integration Science, Graduate School of Advanced Sciences of Matter, Hiroshima University, Kagamiyama 1-3-1, Higashihiroshima, Hiroshima 739-8530 (Japan); Research Institute for Nanodevice and Bio Systems, Hiroshima University, Kagamiyama 1-4-2, Higashihiroshima, Hiroshima 739-8527 (Japan)

    2013-12-02T23:59:59.000Z

    A low-temperature local-layer technique for transferring a single-crystalline silicon (c-Si) film by using a meniscus force was proposed, and an n-channel metal-oxide-semiconductor field-effect transistor (MOSFET) was fabricated on polyethylene terephthalate (PET) substrate. It was demonstrated that it is possible to transfer and form c-Si films in the required shape at the required position on PET substrates at extremely low temperatures by utilizing a meniscus force. The proposed technique for layer transfer was applied for fabricating high-performance c-Si MOSFETs on a PET substrate. The fabricated MOSFET showed a high on/off ratio of more than 10{sup 8} and a high field-effect mobility of 609 cm{sup 2} V{sup ?1} s{sup ?1}.

  19. Infrared spectroscopy of novel semiconductors /

    E-Print Network [OSTI]

    Chapler, Brian Caleb

    2014-01-01T23:59:59.000Z

    dilute magnetic semiconductor . . . . . . . . 1 1.1.1in the topological semiconductors Bi2Te3 and Mn—dopedM. Fundamentals of semiconductors. Springer-Verlag, Berlin,

  20. Novel room temperature ferromagnetic semiconductors

    E-Print Network [OSTI]

    Gupta, Amita

    2004-01-01T23:59:59.000Z

    Spin Related Phenomena in Semiconductors, (27-28 Jan 1997,FERROMAGNETIC SEMICONDUCTORS Amita Gupta Stockholm, Junedata are processed by semiconductor chips, and stored in the

  1. High-field electroluminescence in semiconductor tunnel junctions with a Mn-doped GaAs layer

    SciTech Connect (OSTI)

    Hai, Pham Nam [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-0033 (Japan); Yatsui, Takashi; Ohtsu, Motoichi; Tanaka, Masaaki [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Nanophotonics Research Center, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan)

    2014-09-21T23:59:59.000Z

    We investigated high-field electroluminescence (EL) in semiconductor tunnel junctions with a Mn-doped GaAs layer (here, referred to as GaAs:Mn). Besides the band-gap emission of GaAs, the EL spectra show visible light emissions with two peaks at 1.94?eV and 2.19?eV, which are caused by d-d transitions of the Mn atoms excited by hot electrons. The threshold voltages for band-gap and visible light EL in the tunnel junctions with a GaAs:Mn electrode are 1.3?V higher than those of GaAs:Mn excited by hot holes in reserve biased p{sup +}-n junctions, which is consistent with the hot carrier transport in the band profiles of these structures. Our EL results at room temperature show that the electron temperature in GaAs:Mn can be as high as ?700?K for a low input electrical power density of 0.4?W/cm{sup 2}, while the lattice temperature of the GaAs:Mn layer can be kept at 340?K.

  2. Inorganic Chemistry Solutions to Semiconductor Nanocrystal Problems

    SciTech Connect (OSTI)

    Alvarado, Samuel R. [Ames Laboratory; Guo, Yijun [Ames Laboratory; Ruberu, T. Purnima A. [Ames Laboratory; Tavasoli, Elham [Ames Laboratory; Vela, Javier [Ames Laboratory

    2014-03-15T23:59:59.000Z

    The optoelectronic and chemical properties of semiconductor nanocrystals heavily depend on their composition, size, shape and internal structure, surface functionality, etc. Available strategies to alter these properties through traditional colloidal syntheses and ligand exchange methods place a premium on specific reaction conditions and surfactant combinations. In this invited review, we apply a molecular-level understanding of chemical precursor reactivity to reliably control the morphology, composition and intimate architecture (core/shell vs. alloyed) of semiconductor nanocrystals. We also describe our work aimed at achieving highly selective, low-temperature photochemical methods for the synthesis of semiconductor–metal and semiconductor–metal oxide photocatalytic nanocomposites. In addition, we describe our work on surface modification of semiconductor nanocrystal quantum dots using new approaches and methods that bypass ligand exchange, retaining the nanocrystal's native ligands and original optical properties, as well as on spectroscopic methods of characterization useful in determining surface ligand organization and chemistry. Using recent examples from our group and collaborators, we demonstrate how these efforts have lead to faster, wider and more systematic application of semiconductor nanocrystal-based materials to biological imaging and tracking, and to photocatalysis of unconventional substrates. We believe techniques and methods borrowed from inorganic chemistry (including coordination, organometallic and solid state chemistry) have much to offer in reaching a better understanding of the synthesis, functionalization and real-life application of such exciting materials as semiconductor nanocrystals (quantum dots, rods, tetrapods, etc.).

  3. Mixed semiconductor nanocrystal compositions

    DOE Patents [OSTI]

    Maskaly, Garry R. (Los Alamos, NM); Schaller, Richard D. (Santa Fe, NM); Klimov, Victor I. (Los Alamos, NM)

    2011-02-15T23:59:59.000Z

    Composition comprising one or more energy donors and one or more energy acceptors, wherein energy is transferred from the energy donor to the energy acceptor and wherein: the energy acceptor is a colloidal nanocrystal having a lower band gap energy than the energy donor; the energy donor and the energy acceptor are separated by a distance of 40 nm or less; wherein the average peak absorption energy of the acceptor is at least 20 meV greater than the average peak emission energy of the energy donor; and wherein the ratio of the number of energy donors to the number of energy acceptors is from about 2:1 to about 1000:1.

  4. Unitary lens semiconductor device

    DOE Patents [OSTI]

    Lear, Kevin L. (Albuquerque, NM)

    1997-01-01T23:59:59.000Z

    A unitary lens semiconductor device and method. The unitary lens semiconductor device is provided with at least one semiconductor layer having a composition varying in the growth direction for unitarily forming one or more lenses in the semiconductor layer. Unitary lens semiconductor devices may be formed as light-processing devices such as microlenses, and as light-active devices such as light-emitting diodes, photodetectors, resonant-cavity light-emitting diodes, vertical-cavity surface-emitting lasers, and resonant cavity photodetectors.

  5. Compositional dependence of the luminescence of In{sub 0.49}(Al{sub {ital y}}Ga{sub 1{minus}{ital y}}){sub 0.51}P alloys near the direct{endash}indirect band-gap crossover

    SciTech Connect (OSTI)

    Nelson, J.S.; Jones, E.D. [Semiconductor Materials and Device Sciences Department, 1113, MS-0601, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)] [Semiconductor Materials and Device Sciences Department, 1113, MS-0601, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Myers, S.M.; Follstaedt, D.M. [Semiconductor Nanostructure Physics Department, 1112, MS-1414, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)] [Semiconductor Nanostructure Physics Department, 1112, MS-1414, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Hjalmarson, H.P. [Compound Semiconductor Technology Department, 1322, MS-0603, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)] [Compound Semiconductor Technology Department, 1322, MS-0603, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Schirber, J.E. [Solid State Sciences Department, 1100, MS-1437, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)] [Solid State Sciences Department, 1100, MS-1437, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Schneider, R.P. [Semiconductor Materials Department, 1311, MS-0603, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)] [Semiconductor Materials Department, 1311, MS-0603, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States); Fouquet, J.E.; Robbins, V.M.; Carey, K.W. [Hewlett Packard Laboratories, 3500 Deer Creek Road, Palo Alto, California 94303 (United States)] [Hewlett Packard Laboratories, 3500 Deer Creek Road, Palo Alto, California 94303 (United States)

    1996-06-01T23:59:59.000Z

    A number of complementary experimental characterization tools and theoretical band structure methods were used to determine unambiguously the band-edge luminescence as a function of Al concentration, and to place an upper limit on the short-wavelength emission of InAlGaP alloys lattice matched to GaAs. In particular, the direct-to-indirect band-gap crossing has been determined by analyzing a series of metalorganic vapor-phase-epitaxy-grown In{sub 0.49}(Al{sub {ital y}}Ga{sub 1{minus}{ital y}}){sub 0.51}P alloys lattice matched to GaAs with double-crystal x-ray analysis, Rutherford backscattering spectroscopy, pressure- and temperature-dependent photoluminescence, and transmission electron microscopy. The experimental measurements are compared to first-principles plane-wave pseudopotential band structure calculations for the ternary end points, InGaP and InAlP. The maximum room temperature direct band gap is found to be 2.24 eV, corresponding to an Al composition of {ital y}=0.52{plus_minus}0.02, in good agreement with the theoretical prediction of 0.58{plus_minus}0.05. {copyright} {ital 1996 The American Physical Society.}

  6. Low interface defect density of atomic layer deposition BeO with self-cleaning reaction for InGaAs metal oxide semiconductor field effect transistors

    SciTech Connect (OSTI)

    Shin, H. S. [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of) [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of); SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); The University of Texas, Austin, Texas 78758 (United States); Yum, J. H. [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States) [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); The University of Texas, Austin, Texas 78758 (United States); Johnson, D. W. [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States) [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); Texas A and M University College Station, Texas 77843 (United States); Harris, H. R. [Texas A and M University College Station, Texas 77843 (United States)] [Texas A and M University College Station, Texas 77843 (United States); Hudnall, Todd W. [Texas State University, 601 University Drive, San Marcos, Texas 78666 (United States)] [Texas State University, 601 University Drive, San Marcos, Texas 78666 (United States); Oh, J. [Yonsei University, Incheon, 406-840 (Korea, Republic of)] [Yonsei University, Incheon, 406-840 (Korea, Republic of); Kirsch, P.; Wang, W.-E. [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States)] [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); Bielawski, C. W.; Banerjee, S. K.; Lee, J. C. [The University of Texas, Austin, Texas 78758 (United States)] [The University of Texas, Austin, Texas 78758 (United States); Lee, H. D. [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of)] [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of)

    2013-11-25T23:59:59.000Z

    In this paper, we discuss atomic configuration of atomic layer deposition (ALD) beryllium oxide (BeO) using the quantum chemistry to understand the theoretical origin. BeO has shorter bond length, higher reaction enthalpy, and larger bandgap energy compared with those of ALD aluminum oxide. It is shown that the excellent material properties of ALD BeO can reduce interface defect density due to the self-cleaning reaction and this contributes to the improvement of device performance of InGaAs MOSFETs. The low interface defect density and low leakage current of InGaAs MOSFET were demonstrated using X-ray photoelectron spectroscopy and the corresponding electrical results.

  7. Mismatched semiconductor nanowires: growth and characterization

    E-Print Network [OSTI]

    Yim, Joanne Wing Lan

    2011-01-01T23:59:59.000Z

    SemiconductorFundamentals of Semiconductors: Physics and MaterialsDilute III-V Nitride Semiconductors and Material Systems (

  8. Characterization of illuminated semiconductor/solid-electrolyte junctions. photoelectrochemical investigation of a poly(ethylene oxide) cell. Interim technical report 1 Mar-30 Apr 83

    SciTech Connect (OSTI)

    Sammells, A.F.; Ang, P.G.P.

    1983-05-01T23:59:59.000Z

    Photoelectrochemical effects have been observed with solid-state cells using a poly(ethylene oxide) .NaSCN solid polymer electrolyte containing a Na2S/S redox couple. Photoeffects were observed at the interface of this electrolyte with p-InP, n-GaAs, and in a two-photoelectrode cell of configuration p-InP/PEO-NaSCN, Na2S,S/n-CdS. In this latter cell, photopotentials of 540 mV were generated using 100 mW/cm2 quartz iodine illumination.

  9. Synthesis and characterization of some metal oxide nanocrystals by microwave irradiation

    SciTech Connect (OSTI)

    Rashad, M.; Gaber, A.; Abdelrahim, M. A.; Abdel-Baset, A. M. [Physics Department, Faculty of Science, Assiut University, 71516 Assiut (Egypt); Moharram, A. H. [Physics Dept., College of Science and Arts, King Abdulaziz Univ., Rabigh 21911 (Saudi Arabia)

    2013-12-16T23:59:59.000Z

    Copper oxide and cobalt oxide (CuO, Co3O4) nanocrystals (NCs) have been successfully prepared in a short time using microwave irradiation. The resulted powders of nanocrystals (NCs) were characterized by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Thermogravimetric analysis (TGA) measurements are also studied. Fourier-transform infrared (FT-IR) and UV–visible absorption spectroscopy of both kind of nanoparticels are illustrated. Optical absorption analysis indicated the direct band gap for both kinds of nanocrystals.

  10. Amorphous tin-cadmium oxide films and the production thereof

    DOE Patents [OSTI]

    Li, Xiaonan; Gessert, Timothy A

    2013-10-29T23:59:59.000Z

    A tin-cadmium oxide film having an amorphous structure and a ratio of tin atoms to cadmium atoms of between 1:1 and 3:1. The tin-cadmium oxide film may have an optical band gap of between 2.7 eV and 3.35 eV. The film may also have a charge carrier concentration of between 1.times.10.sup.20 cm.sup.-3 and 2.times.10.sup.20 cm.sup.-3. The tin cadmium oxide film may also exhibit a Hall mobility of between 40 cm.sup.2V.sup.-1 s.sup.-1 and 60 cm.sup.2V.sup.-1 s.sup.-1. Also disclosed is a method of producing an amorphous tin-cadmium oxide film as described and devices using same.

  11. Interconnected semiconductor devices

    DOE Patents [OSTI]

    Grimmer, Derrick P. (White Bear Lake, MN); Paulson, Kenneth R. (North St. Paul, MN); Gilbert, James R. (St. Paul, MN)

    1990-10-23T23:59:59.000Z

    Semiconductor layer and conductive layer formed on a flexible substrate, divided into individual devices and interconnected with one another in series by interconnection layers and penetrating terminals.

  12. Semiconductor bridge (SCB) detonator

    DOE Patents [OSTI]

    Bickes, R.W. Jr.; Grubelich, M.C.

    1999-01-19T23:59:59.000Z

    The present invention is a low-energy detonator for high-density secondary-explosive materials initiated by a semiconductor bridge (SCB) igniter that comprises a pair of electrically conductive lands connected by a semiconductor bridge. The semiconductor bridge is in operational or direct contact with the explosive material, whereby current flowing through the semiconductor bridge causes initiation of the explosive material. Header wires connected to the electrically-conductive lands and electrical feed-throughs of the header posts of explosive devices, are substantially coaxial to the direction of current flow through the SCB, i.e., substantially coaxial to the SCB length. 3 figs.

  13. Semiconductor bridge (SCB) detonator

    DOE Patents [OSTI]

    Bickes, Jr., Robert W. (Albuquerque, NM); Grubelich, Mark C. (Albuquerque, NM)

    1999-01-01T23:59:59.000Z

    The present invention is a low-energy detonator for high-density secondary-explosive materials initiated by a semiconductor bridge igniter that comprises a pair of electrically conductive lands connected by a semiconductor bridge. The semiconductor bridge is in operational or direct contact with the explosive material, whereby current flowing through the semiconductor bridge causes initiation of the explosive material. Header wires connected to the electrically-conductive lands and electrical feed-throughs of the header posts of explosive devices, are substantially coaxial to the direction of current flow through the SCB, i.e., substantially coaxial to the SCB length.

  14. First principles study of Fe in diamond: A diamond-based half metallic dilute magnetic semiconductor

    SciTech Connect (OSTI)

    Benecha, E. M. [Department of Physics, University of South Africa, P.O. Box 392, UNISA 0003 Pretoria (South Africa); Lombardi, E. B., E-mail: lombaeb@unisa.ac.za [College of Graduate Studies, University of South Africa, P.O. Box 392, UNISA 0003 Pretoria (South Africa)

    2013-12-14T23:59:59.000Z

    Half-metallic ferromagnetic ordering in semiconductors, essential in the emerging field of spintronics for injection and transport of highly spin polarised currents, has up to now been considered mainly in III–V and II–VI materials. However, low Curie temperatures have limited implementation in room temperature device applications. We report ab initio Density Functional Theory calculations on the properties of Fe in diamond, considering the effects of lattice site, charge state, and Fermi level position. We show that the lattice sites and induced magnetic moments of Fe in diamond depend strongly on the Fermi level position and type of diamond co-doping, with Fe being energetically most favorable at the substitutional site in p-type and intrinsic diamond, while it is most stable at a divacancy site in n-type diamond. Fe induces spin polarized bands in the band gap, with strong hybridization between Fe-3d and C-2s,2p bands. We further consider Fe-Fe spin interactions in diamond and show that substitutional Fe{sup +1} in p-type diamond exhibits a half-metallic character, with a magnetic moment of 1.0??{sub B} per Fe atom and a large ferromagnetic stabilization energy of 33?meV, an order of magnitude larger than in other semiconductors, with correspondingly high Curie temperatures. These results, combined with diamond's unique properties, demonstrate that Fe doped p-type diamond is likely to be a highly suitable candidate material for spintronics applications.

  15. Features of the band structure and conduction mechanisms in the n-HfNiSn semiconductor heavily doped with Ru

    SciTech Connect (OSTI)

    Romaka, V. A., E-mail: vromaka@polynet.lviv.ua [National Academy of Sciences of Ukraine, Pidstrygach Institute for Applied Problems in Mechanics and Mathematics (Ukraine); Rogl, P. [Universität Wien, Institut für Physikalische Chemie (Austria); Romaka, V. V. [National University Lvivska Politekhnika (Ukraine); Stadnyk, Yu. V. [Ivan Franko National University of Lviv (Ukraine); Korzh, R. O.; Krayovskyy, V. Ya. [National University Lvivska Politekhnika (Ukraine); Horyn, A. M. [Ivan Franko National University of Lviv (Ukraine)

    2014-12-15T23:59:59.000Z

    The crystal and electronic structure and energy and kinetic properties of the n-HfNiSn semiconductor heavily doped with a Ru acceptor impurity are investigated in the temperature and Ru concentration ranges T = 80–400 K and N{sub A}{sup Ru} ? 9.5 × 10{sup 19}?5.7 × 10{sup 20} cm{sup ?3} (x = 0–0.03), respectively. The mechanism of structural-defect generation is established, which changes the band gap and degree of compensation of the semiconductor and consists in the simultaneous concentration reduction and elimination of donor structural defects by means of the displacement of ?1% of Ni atoms from the Hf (4a) positions, the generation of acceptor structural defects upon the substitution of Ru atoms for Ni atoms in the 4c positions, and the generation of donor defects in the form of vacancies in the Sn (4b) positions. The calculated electronic structure of HfNi{sub 1?x}Ru{sub x}Sn is consistent with the experiment. The results obtained are discussed within the Shklovsky-Efros model for a heavily doped and compensated semiconductor.

  16. REVIEW ARTICLE Semiconductor quantum dot-sensitized

    E-Print Network [OSTI]

    Cao, Guozhong

    of low-cost and high-performance solar cells for sustainable energy sources to re- place fossil fuels has) fabrication methods of QDs, and 4) nanocrystalline photoelectrodes for solar cells. We also make suggestions band gap depending on the QD size, 2) a larger extinction coefficient, 3) higher stability toward water

  17. Diameter-Controlled Vapor-Solid Epitaxial Growth and Properties of Aligned ZnO Nanowire Arrays

    E-Print Network [OSTI]

    Qin, Lu-Chang

    . Introduction Wurtzitic zinc oxide is a direct, wide band gap semiconductor that has attracted tremendous (ultraviolet or green/blue) electro-optical devices, chemical sensors, and varistors.1-5 In recent years oxide, so their commercial potential has been limited. Here we report a facile, template-free method

  18. Interpretation of the Phonon Frequency Shifts in ZnO Quantum Dots Khan A. Alim, Vladimir A. Fonoberov, and Alexander A. Balandin

    E-Print Network [OSTI]

    Fonoberov, Vladimir

    made of zinc oxide (ZnO), a wide-bandgap semiconductor, have recently attracted attention due Zinc oxide (ZnO) presents interesting material system because of its wide band gap of 3.37 eV and some ultraviolet (UV) protection films, gas sensors, and varistors. Raman spectroscopy presents a powerful tool

  19. Mesoscopic pointlike defects in semiconductors: Deep-level energies D. D. Nolte

    E-Print Network [OSTI]

    Nolte, David D.

    -semiconductor heterostructures to include metal-semiconductor,1 insulator-semiconductor, and superconductor-semiconductor

  20. Low temperature production of large-grain polycrystalline semiconductors

    DOE Patents [OSTI]

    Naseem, Hameed A. (Fayetteville, AR); Albarghouti, Marwan (Loudonville, NY)

    2007-04-10T23:59:59.000Z

    An oxide or nitride layer is provided on an amorphous semiconductor layer prior to performing metal-induced crystallization of the semiconductor layer. The oxide or nitride layer facilitates conversion of the amorphous material into large grain polycrystalline material. Hence, a native silicon dioxide layer provided on hydrogenated amorphous silicon (a-Si:H), followed by deposited Al permits induced crystallization at temperatures far below the solid phase crystallization temperature of a-Si. Solar cells and thin film transistors can be prepared using this method.

  1. Semiconductor Engineers in a Global Economy

    E-Print Network [OSTI]

    Brown, Clair; Linden, Greg

    2007-01-01T23:59:59.000Z

    Technology: The Case of Semiconductors. Brookings Institute:Society, Space, and Semiconductors in The Restructuring Ofin the Global Semiconductor Industry. ” California

  2. Synthesis and Characterization of Mesoporous Semiconductors

    E-Print Network [OSTI]

    Kang, Chris Byung-hwa

    2012-01-01T23:59:59.000Z

    Brock, S. L. “Porous semiconductor chalcogenide aerogels. ”Nanostructured Semiconductor. ” J. Am. Chem. Soc. , 127,in mesostructured semiconductors based on the [SnSe 4 ]4-

  3. Semiconductor Nanowires and Nanotubes for Energy Conversion

    E-Print Network [OSTI]

    Fardy, Melissa Anne

    2010-01-01T23:59:59.000Z

    Thermoelectricity in semiconductor nanostructures. Science,splitting using semiconductor electrodes. InternationalChalcogenides, Monographs in Semiconductor Physics, ed. L.S.

  4. Ferromagnetic semiconductors based upon AlGaP M. E. Overberg,a)

    E-Print Network [OSTI]

    Hebard, Arthur F.

    band-gap ternary InGaP, which is lattice matched to GaAs. An immediate application of the DMS, with its wide band-gap binary GaP, AlP and ternary InGaP, AlGaP, AlInP components, is used for devices

  5. Diluted II-VI Oxide Semiconductors

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645 3,625govInstrumentstdmadapInactiveVisitingContract Management FermiDavidDiesel pricesDiesel28, 2007, 4:15pm toDiluted

  6. Method of doping a semiconductor

    DOE Patents [OSTI]

    Yang, Chiang Y. (Miller Place, NY); Rapp, Robert A. (Columbus, OH)

    1983-01-01T23:59:59.000Z

    A method for doping semiconductor material. An interface is established between a solid electrolyte and a semiconductor to be doped. The electrolyte is chosen to be an ionic conductor of the selected impurity and the semiconductor material and electrolyte are jointly chosen so that any compound formed from the impurity and the semiconductor will have a free energy no lower than the electrolyte. A potential is then established across the interface so as to allow the impurity ions to diffuse into the semiconductor. In one embodiment the semiconductor and electrolyte may be heated so as to increase the diffusion coefficient.

  7. Multiband semiconductor compositions for photovoltaic devices

    DOE Patents [OSTI]

    Walukiewicz, Wladyslaw (Kensington, CA); Yu, Kin Man (Lafayette, CA); Wu, Junqiao (Belmont, MA)

    2012-03-06T23:59:59.000Z

    The highly mismatched alloy Zn.sub.1-yMn.sub.yO.sub.xTe.sub.1-x, 0.ltoreq.y<1 and 0band gap of the Zn.sub.1-yMn.sub.yTe host. With multiple band gaps that fall within the solar energy spectrum, Zn.sub.1-yMn.sub.yO.sub.xTe.sub.1-x is a material perfectly satisfying the conditions for single-junction photovoltaics with the potential for power conversion efficiencies surpassing 50%.

  8. Multiband semiconductor compositions for photovoltaic devices

    DOE Patents [OSTI]

    Walukiewicz, Wladyslaw; Yu, Kin Man; Wu, Junqiao

    2010-05-04T23:59:59.000Z

    The highly mismatched alloy Zn1-yMnyOxTe1-x, 0.ltoreq.y<1 and 0band gap of the Zn1-yMnyTe host. With multiple band gaps that fall within the solar energy spectrum, Zn1-yMnyOxTe1-x is a material perfectly satisfying the conditions for single-junction photovoltaics with the potential for power conversion efficiencies surpassing 50%.

  9. 2012 DEFECTS IN SEMICONDUCTORS GORDON RESEARCH CONFERENCE, AUGUST 12-17, 2012

    SciTech Connect (OSTI)

    GLASER, EVAN

    2012-08-17T23:59:59.000Z

    The meeting shall strive to develop and further the fundamental understanding of defects and their roles in the structural, electronic, optical, and magnetic properties of bulk, thin film, and nanoscale semiconductors and device structures. Point and extended defects will be addressed in a broad range of electronic materials of particular current interest, including wide bandgap semiconductors, metal-oxides, carbon-based semiconductors (e.g., diamond, graphene, etc.), organic semiconductors, photovoltaic/solar cell materials, and others of similar interest. This interest includes novel defect detection/imaging techniques and advanced defect computational methods.

  10. Structure and electronic properties features of amorphous chalhogenide semiconductor films prepared by ion-plasma spraying

    SciTech Connect (OSTI)

    Korobova, N., E-mail: korobova3@mail.ru; Timoshenkov, S. [Department of Microelectronics, National Research University of Electronic Technology (MIET), Zelenograd (Russian Federation); Almasov, N.; Prikhodko, O. [al-Farabi Kazakh National University, Almaty (Kazakhstan); Tsendin, K. [Ioffe Physical-Technical Institute, Russian Academy of Sciences, St. Petersburg (Russian Federation)

    2014-10-21T23:59:59.000Z

    Structure of amorphous chalcogenide semiconductor glassy As-S-Se films, obtained by high-frequency (HF) ion-plasma sputtering has been investigated. It was shown that the length of the atomic structure medium order and local structure were different from the films obtained by thermal vacuum evaporation. Temperature dependence of dark conductivity, as well as the dependence of the spectral transmittance has been studied. Conductivity value was determined at room temperature. Energy activation conductivity and films optical band gap have been calculated. Temperature and field dependence of the drift mobility of charge carriers in the HF As-S-Se films have been shown. Bipolarity of charge carriers drift mobility has been confirmed. Absence of deep traps for electrons in the As{sub 40}Se{sub 30}S{sub 30} spectrum of localized states for films obtained by HF plasma ion sputtering was determined. Bipolar drift of charge carriers was found in amorphous As{sub 40}Se{sub 30}S{sub 30} films obtained by ion-plasma sputtering of high-frequency, unlike the films of these materials obtained by thermal evaporation.

  11. Quantum Semiconductor Modeling Ansgar Jungel

    E-Print Network [OSTI]

    Jüngel, Ansgar

    Quantum Semiconductor Modeling Ansgar J¨ungel Vienna University of Technology, Austria www.jungel.at.vu Ansgar J¨ungel (TU Wien) Quantum Semiconductor Modeling www.jungel.at.vu 1 / 154 #12;Contents 1 Introduction 2 Semiconductor modeling 3 Microscopic quantum models Density matrices Schr¨odinger models Wigner

  12. The defect chemistry of nitrogen in oxides: A review of experimental and theoretical studies

    SciTech Connect (OSTI)

    Polfus, Jonathan M.; Norby, Truls [University of Oslo, Department of Chemistry, Centre for Materials Science and Nanotechnology (SMN), Gaustadalleen 21, FERMiO, NO-0349 Oslo (Norway)] [University of Oslo, Department of Chemistry, Centre for Materials Science and Nanotechnology (SMN), Gaustadalleen 21, FERMiO, NO-0349 Oslo (Norway); Haugsrud, Reidar, E-mail: reidarha@kjemi.uio.no [University of Oslo, Department of Chemistry, Centre for Materials Science and Nanotechnology (SMN), Gaustadalleen 21, FERMiO, NO-0349 Oslo (Norway)] [University of Oslo, Department of Chemistry, Centre for Materials Science and Nanotechnology (SMN), Gaustadalleen 21, FERMiO, NO-0349 Oslo (Norway)

    2013-02-15T23:59:59.000Z

    Incorporation of nitrogen into oxides has in recent years received increased attention as a variable for tuning their functional properties. A vast number of reports have been devoted to improving the photocatalytic properties of TiO{sub 2}, p-type charge carrier concentration in ZnO and the ionic transport properties of ZrO{sub 2} by nitrogen doping. In comparison, the fundamentals of the nitrogen related defect chemistry for a wider range of oxides have been less focused upon. In the present contribution, we review experimental and computational investigations of the nitrogen related defect chemistry of insulating and semiconducting oxides. The interaction between nitrogen and protons is important and emphasized. Specifically, the stability of nitrogen defects such as N{sub O}{sup /}, NH{sub O}{sup Multiplication-Sign} and (NH{sub 2}){sub O}{sup Bullet} is evaluated under various conditions and their atomistic and electronic structure is presented. A final discussion is devoted to the role of nitrogen with respect to transport properties and photocatalytic activity of oxides. - Graphical abstract: Experimental and theoretical investigations of the nitrogen related defect chemistry of a range of wide band gap oxides is reviewed. The interaction between nitrogen dopants and protons is emphasized and described through the atomistic and electronic structure as well as defect chemical processes involving NH and NH{sub 2} defects. Consequently, the physical properties of oxides containing such species are discussed with respect to e.g., diffusion and photocatalytic properties. Highlights: Black-Right-Pointing-Pointer Experimental and theoretical investigations of the nitrogen and hydrogen related defect chemistry of wide band gap oxides is reviewed. Black-Right-Pointing-Pointer The interaction between nitrogen dopants and protons is important and emphasized. Black-Right-Pointing-Pointer Diffusion and photocatalytic properties of N-doped oxides are discussed.

  13. Infrared spectroscopy of ZnO nanoparticles containing CO2 impurities W. M. Hlaing Oo and M. D. McCluskeya

    E-Print Network [OSTI]

    McCluskey, Matthew

    Institute of Physics. DOI: 10.1063/1.1866511 Zinc oxide ZnO is a wide-band gap semiconductor that is desirable for many applications, such as piezoelectric transducers, varistors, gas sensors, and transparent synthesized by a variety of wet-chemistry methods. The use of precursor materials such as zinc acetate, zinc

  14. Thermal Conductivity of Ordered Mesoporous Titania Films Made from Nanocrystalline Building Blocks and Sol-Gel Reagents

    E-Print Network [OSTI]

    Pilon, Laurent

    significant attention due to their wide range of applications. They have been used in dye-sensitized solar cells for their wide band gap semiconductor properties.1 They have also been considered for solid oxide fuel cells as high proton conductivity porous exchange membranes.2 Mesoporous TiO2 is also a very

  15. Kansas Advanced Semiconductor Project

    SciTech Connect (OSTI)

    Baringer, P.; Bean, A.; Bolton, T.; Horton-Smith, G.; Maravin, Y.; Ratra, B.; Stanton, N.; von Toerne, E.; Wilson, G.

    2007-09-21T23:59:59.000Z

    KASP (Kansas Advanced Semiconductor Project) completed the new Layer 0 upgrade for D0, assumed key electronics projects for the US CMS project, finished important new physics measurements with the D0 experiment at Fermilab, made substantial contributions to detector studies for the proposed e+e- international linear collider (ILC), and advanced key initiatives in non-accelerator-based neutrino physics.

  16. A 250 GHz photonic band gap gyrotron amplifier

    E-Print Network [OSTI]

    Nanni, Emilio A. (Emilio Alessandro)

    2013-01-01T23:59:59.000Z

    This thesis reports the theoretical and experimental investigation of a novel gyrotron traveling-wave-tube (TWT) amplifier at 250 GHz. The gyrotron amplifier designed and tested in this thesis has achieved a peak small ...

  17. Experimental study of photonic band gap accelerator structures

    E-Print Network [OSTI]

    Marsh, Roark A

    2009-01-01T23:59:59.000Z

    This thesis reports theoretical and experimental research on a novel accelerator concept using a photonic bandgap (PBG) structure. Major advances in higher order mode (HOM) damping are required for the next generation of ...

  18. Band Gap Optimization of Two-Dimensional Photonic Crystals Using ...

    E-Print Network [OSTI]

    2009-07-10T23:59:59.000Z

    Jul 10, 2009 ... proven very important as device components for integrated optics ...... Inhibited spontaneous emission in solid-state physics and electronics.

  19. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level:Energy: Grid Integration Redefining What'sis Taking Over Our InstagramStructure of All-Polymer. . ~0sFailureSubscribe Mark A.

  20. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level:Energy: Grid Integration Redefining What'sis Taking Over Our InstagramStructure of All-Polymer. . ~0sFailureSubscribe Mark

  1. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level:Energy: Grid Integration Redefining What'sis Taking Over Our InstagramStructure of All-Polymer. . ~0sFailureSubscribe MarkSubstrate-Induced

  2. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level:Energy: Grid Integration Redefining What'sis Taking Over Our InstagramStructure of All-Polymer. . ~0sFailureSubscribe

  3. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level:Energy: Grid Integration Redefining What'sis Taking Over Our InstagramStructure of All-Polymer. . ~0sFailureSubscribeSubstrate-Induced

  4. Method for Creating Photonic Band Gap Materials - Energy Innovation Portal

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645U.S. DOEThe Bonneville PowerCherries 82981-1cnHighand Retrievals from aRodMIT-HarvardEnergy Innovation Portal

  5. Substrate-Induced Band-Gap Opening in Epitaxial Graphene

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645U.S. DOE Office of ScienceandMesa del SolStrengthening a solid ... StrengtheningLabSubmitting JobsSubseaSubstrate-Induced

  6. Synthesis and Characterization of Mesoporous Semiconductors and Their Energy Applications

    E-Print Network [OSTI]

    Kang, Chris Byung-hwa

    2013-01-01T23:59:59.000Z

    Biomaterials, Ceramics, and Semiconductors. ” Science, 277,I. “Nanostructured Semiconductors Templated by Cholesteryl-Nanostructured Semiconductor. ” J. Am. Chem. Soc. , 127,

  7. A Novel Class of High-TC Ferromagnetic Semiconductors

    E-Print Network [OSTI]

    Shlyk, L. V.

    2008-01-01T23:59:59.000Z

    Diluted magnetic semiconductor or clustering effect? ”,ferromagnetism in semiconductors”, J. Appl. Phys. , inMaking nonmagnetic semiconductors ferromagnetic”, Science,

  8. Magnetization dynamics and spin diffusion in semiconductors and metals

    E-Print Network [OSTI]

    Cywi?ski, ?ukasz

    2007-01-01T23:59:59.000Z

    to (III,Mn)V ferromagnetic semiconductors . . . . . . . . .semiconductors . . . . . . . . . . . . . . . . . .Spin di?usion in semiconductors and metals: a general

  9. Effect of annealing on the kinetic properties and band parameters of Hg{sub 1?x?y}Cd{sub x}Eu{sub y}Se semiconductor crystals

    SciTech Connect (OSTI)

    Kovalyuk, T. T., E-mail: tarik-1006@mail.ru; Maistruk, E. V.; Maryanchuk, P. D. [Chernivtsy National University (Ukraine)

    2014-12-15T23:59:59.000Z

    The results of studies of the kinetic properties of Hg{sub 1?x?y}Cd{sub x}Eu{sub y}Se semiconductor crystals in the ranges of temperatures T = 77–300 K and magnetic fields H = 0.5–5 kOe before and after heat treatment of the samples in Se vapors are reported. It is established that annealing of the samples in Se vapors induces a decrease in the electron concentration. From the concentration dependence of the electron effective mass at the Fermi level, the band gap, the matrix element of interband interaction, and the electron effective mass at the bottom of the conduction band are determined.

  10. Semiconductor radiation detector

    DOE Patents [OSTI]

    Patt, Bradley E. (Sherman Oaks, CA); Iwanczyk, Jan S. (Los Angeles, CA); Tull, Carolyn R. (Orinda, CA); Vilkelis, Gintas (Westlake Village, CA)

    2002-01-01T23:59:59.000Z

    A semiconductor radiation detector is provided to detect x-ray and light photons. The entrance electrode is segmented by using variable doping concentrations. Further, the entrance electrode is physically segmented by inserting n+ regions between p+ regions. The p+ regions and the n+ regions are individually biased. The detector elements can be used in an array, and the p+ regions and the n+ regions can be biased by applying potential at a single point. The back side of the semiconductor radiation detector has an n+ anode for collecting created charges and a number of p+ cathodes. Biased n+ inserts can be placed between the p+ cathodes, and an internal resistor divider can be used to bias the n+ inserts as well as the p+ cathodes. A polysilicon spiral guard can be implemented surrounding the active area of the entrance electrode or surrounding an array of entrance electrodes.

  11. Semiconductor Ion Implanters

    SciTech Connect (OSTI)

    MacKinnon, Barry A. [Isys, 2727 Walsh Ave., Suite 103, Santa Clara, CA 95051 (United States); Ruffell, John P. [Group 3, LLC, Sunnyvale, CA 94086 (United States)

    2011-06-01T23:59:59.000Z

    In 1953 the Raytheon CK722 transistor was priced at $7.60. Based upon this, an Intel Xeon Quad Core processor containing 820,000,000 transistors should list at $6.2 billion. Particle accelerator technology plays an important part in the remarkable story of why that Intel product can be purchased today for a few hundred dollars. Most people of the mid twentieth century would be astonished at the ubiquity of semiconductors in the products we now buy and use every day. Though relatively expensive in the nineteen fifties they now exist in a wide range of items from high-end multicore microprocessors like the Intel product to disposable items containing 'only' hundreds or thousands like RFID chips and talking greeting cards. This historical development has been fueled by continuous advancement of the several individual technologies involved in the production of semiconductor devices including Ion Implantation and the charged particle beamlines at the heart of implant machines. In the course of its 40 year development, the worldwide implanter industry has reached annual sales levels around $2B, installed thousands of dedicated machines and directly employs thousands of workers. It represents in all these measures, as much and possibly more than any other industrial application of particle accelerator technology. This presentation discusses the history of implanter development. It touches on some of the people involved and on some of the developmental changes and challenges imposed as the requirements of the semiconductor industry evolved.

  12. WWW.MOTOROLA.COM/SEMICONDUCTORS Microcontrollers

    E-Print Network [OSTI]

    Song, Joe

    WWW.MOTOROLA.COM/SEMICONDUCTORS M68HC11 Microcontrollers M68HC11RM/D Rev. 6, 4/2002 M68HC11 Reference Manual FreescaleSemiconductor,I Freescale Semiconductor, Inc. For More Information On This Product, Go to: www.freescale.com nc... #12;FreescaleSemiconductor,I Freescale Semiconductor, Inc. For More

  13. Single-Crystal Tungsten Oxide Nanosheets: Photochemical Water Oxidation in the Quantum Confinement Regime

    E-Print Network [OSTI]

    Osterloh, Frank

    Single-Crystal Tungsten Oxide Nanosheets: Photochemical Water Oxidation in the Quantum Confinement, catalysis, WO3, tungsten oxide, nanosheet, nanocrystal, quantum confinement, solar energy conversion INTRODUCTION Tungsten trioxide crystallizes in the ReO3 structure type and is an n-type semiconductor with a 2

  14. Studies on nickel-tungsten oxide thin films

    SciTech Connect (OSTI)

    Usha, K. S. [Department of Physics, Alagappa University, Karaikudi - 630 004 (India); Sivakumar, R., E-mail: krsivakumar1979@yahoo.com [Directorate of Distance Education, Alagappa University, Karaikudi - 630 004 (India); Sanjeeviraja, C. [Department of Physics, Alagappa Chettiar College of Engineering and Technology, Karaikudi - 630 004 (India)

    2014-10-15T23:59:59.000Z

    Nickel-Tungsten oxide (95:5) thin films were prepared by rf sputtering at 200W rf power with various substrate temperatures. X-ray diffraction study reveals the amorphous nature of films. The substrate temperature induced decrease in energy band gap with a maximum transmittance of 71%1 was observed. The Micro-Raman study shows broad peaks at 560 cm{sup ?1} and 1100 cm{sup ?1} correspond to Ni-O vibration and the peak at 860 cm{sup ?1} can be assigned to the vibration of W-O-W bond. Photoluminescence spectra show two peaks centered on 420 nm and 485 nm corresponding to the band edge emission and vacancies created due to the addition of tungsten, respectively.

  15. Method of passivating semiconductor surfaces

    DOE Patents [OSTI]

    Wanlass, Mark W. (Golden, CO)

    1990-01-01T23:59:59.000Z

    A method of passivating Group III-V or II-VI semiconductor compound surfaces. The method includes selecting a passivating material having a lattice constant substantially mismatched to the lattice constant of the semiconductor compound. The passivating material is then grown as an ultrathin layer of passivating material on the surface of the Group III-V or II-VI semiconductor compound. The passivating material is grown to a thickness sufficient to maintain a coherent interface between the ultrathin passivating material and the semiconductor compound. In addition, a device formed from such method is also disclosed.

  16. Sandia National Laboratories: compound semiconductor

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    compound semiconductor Sandia and EMCORE: Solar Photovoltaics, Fiber Optics, MODE, and Energy Efficiency On March 29, 2013, in Concentrating Solar Power, Energy, Partnership,...

  17. Method of passivating semiconductor surfaces

    DOE Patents [OSTI]

    Wanlass, M.W.

    1990-06-19T23:59:59.000Z

    A method is described for passivating Group III-V or II-VI semiconductor compound surfaces. The method includes selecting a passivating material having a lattice constant substantially mismatched to the lattice constant of the semiconductor compound. The passivating material is then grown as an ultrathin layer of passivating material on the surface of the Group III-V or II-VI semiconductor compound. The passivating material is grown to a thickness sufficient to maintain a coherent interface between the ultrathin passivating material and the semiconductor compound. In addition, a device formed from such method is also disclosed.

  18. Efficient semiconductor light-emitting device and method

    DOE Patents [OSTI]

    Choquette, Kent D. (Albuquerque, NM); Lear, Kevin L. (Albuquerque, NM); Schneider, Jr., Richard P. (Albuquerque, NM)

    1996-01-01T23:59:59.000Z

    A semiconductor light-emitting device and method. The semiconductor light-emitting device is provided with at least one control layer or control region which includes an annular oxidized portion thereof to channel an injection current into the active region, and to provide a lateral refractive index profile for index guiding the light generated within the device. A periodic composition grading of at least one of the mirror stacks in the device provides a reduced operating voltage of the device. The semiconductor light-emitting device has a high efficiency for light generation, and may be formed either as a resonant-cavity light-emitting diode (RCLED) or as a vertical-cavity surface-emitting laser (VCSEL).

  19. Efficient semiconductor light-emitting device and method

    DOE Patents [OSTI]

    Choquette, K.D.; Lear, K.L.; Schneider, R.P. Jr.

    1996-02-20T23:59:59.000Z

    A semiconductor light-emitting device and method are disclosed. The semiconductor light-emitting device is provided with at least one control layer or control region which includes an annular oxidized portion thereof to channel an injection current into the active region, and to provide a lateral refractive index profile for index guiding the light generated within the device. A periodic composition grading of at least one of the mirror stacks in the device provides a reduced operating voltage of the device. The semiconductor light-emitting device has a high efficiency for light generation, and may be formed either as a resonant-cavity light-emitting diode (RCLED) or as a vertical-cavity surface-emitting laser (VCSEL). 12 figs.

  20. Noise and synamics in semiconductor lasers

    E-Print Network [OSTI]

    Rana, Farhan, 1971-

    2003-01-01T23:59:59.000Z

    In this thesis, theoretical and experimental work on the noise and dynamics in continuous wave and mode-locked semiconductor lasers is presented. The main focus is on semiconductor cascade lasers and semiconductor mode-locked ...

  1. Semiconductors: From Manipulated to Managed Trade

    E-Print Network [OSTI]

    Tyson, Laura D'Andrea; Yoffie, David B.

    1991-01-01T23:59:59.000Z

    o f the Japanese semiconductor industry is a sucecsslul aridcommodnv product Ol the semiconductor industry. They are afor maJtini: semiconductors: »nc

  2. Electron vortices in semiconductors devicesa... Kamran Mohsenib

    E-Print Network [OSTI]

    Electron vortices in semiconductors devicesa... Kamran Mohsenib Aerospace Engineering Sciencies; published online 3 October 2005 The hydrodynamic model of electron transport in semiconductors is analyzed vorticity effects. Furthermore, conditions for observation of electron vortices in semiconductor devices

  3. Climate VISION: Private Sector Initiatives: Semiconductors

    Office of Scientific and Technical Information (OSTI)

    Agreements The U.S. semiconductor industry, represented by the members of the Environmental Protection Agency's PFC ReductionClimate Partnership for the Semiconductor...

  4. Climate VISION: Private Sector Initiatives: Semiconductors: Resources...

    Office of Scientific and Technical Information (OSTI)

    over 100 companies that account for more than 83% of U.S.-based semiconductor production. The SIA provides a forum for domestic semiconductor companies to work collectively...

  5. Opportunities for Wide Bandgap Semiconductor Power Electronics...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Opportunities for Wide Bandgap Semiconductor Power Electronics for Hydrogen and Fuel Cell Applications Opportunities for Wide Bandgap Semiconductor Power Electronics for Hydrogen...

  6. Layered semiconductor neutron detectors

    DOE Patents [OSTI]

    Mao, Samuel S; Perry, Dale L

    2013-12-10T23:59:59.000Z

    Room temperature operating solid state hand held neutron detectors integrate one or more relatively thin layers of a high neutron interaction cross-section element or materials with semiconductor detectors. The high neutron interaction cross-section element (e.g., Gd, B or Li) or materials comprising at least one high neutron interaction cross-section element can be in the form of unstructured layers or micro- or nano-structured arrays. Such architecture provides high efficiency neutron detector devices by capturing substantially more carriers produced from high energy .alpha.-particles or .gamma.-photons generated by neutron interaction.

  7. Process for producing chalcogenide semiconductors

    DOE Patents [OSTI]

    Noufi, R.; Chen, Y.W.

    1985-04-30T23:59:59.000Z

    A process for producing chalcogenide semiconductor material is disclosed. The process includes forming a base metal layer and then contacting this layer with a solution having a low pH and containing ions from at least one chalcogen to chalcogenize the layer and form the chalcogenide semiconductor material.

  8. Process for producing chalcogenide semiconductors

    DOE Patents [OSTI]

    Noufi, Rommel (Westminster, CO); Chen, Yih-Wen (Omaha, NE)

    1987-01-01T23:59:59.000Z

    A process for producing chalcogenide semiconductor material is disclosed. The process includes forming a base metal layer and then contacting this layer with a solution having a low pH and containing ions from at least one chalcogen to chalcogenize the layer and form the chalcogenide semiconductor material.

  9. Physics with isotopically controlled semiconductors

    SciTech Connect (OSTI)

    Haller, E. E., E-mail: eehaller@lbl.gov [University of California at Berkeley, Department of Materials Science and Engineering (United States)

    2010-07-15T23:59:59.000Z

    This paper is based on a tutorial presentation at the International Conference on Defects in Semiconductors (ICDS-25) held in Saint Petersburg, Russia in July 2009. The tutorial focused on a review of recent research involving isotopically controlled semiconductors. Studies with isotopically enriched semiconductor structures experienced a dramatic expansion at the end of the Cold War when significant quantities of enriched isotopes of elements forming semiconductors became available for worldwide collaborations. Isotopes of an element differ in nuclear mass, may have different nuclear spins and undergo different nuclear reactions. Among the latter, the capture of thermal neutrons which can lead to neutron transmutation doping, is the most prominent effect for semiconductors. Experimental and theoretical research exploiting the differences in all the properties has been conducted and will be illustrated with selected examples.

  10. Laser method for forming low-resistance ohmic contacts on semiconducting oxides

    DOE Patents [OSTI]

    Narayan, Jagdish (Knoxville, TN)

    1981-01-01T23:59:59.000Z

    This invention is a new method for the formation of high-quality ohmic contacts on wide-band-gap semiconducting oxides. As exemplified by the formation of an ohmic contact on n-type BaTiO.sub.3 containing a p-n junction, the invention entails depositing a film of a metallic electroding material on the BaTiO.sub.3 surface and irradiating the film with a Q-switched laser pulse effecting complete melting of the film and localized melting of the surface layer of oxide immediately underlying the film. The resulting solidified metallic contact is ohmic, has unusually low contact resistance, and is thermally stable, even at elevated temperatures. The contact does not require cleaning before attachment of any suitable electrical lead. This method is safe, rapid, reproducible, and relatively inexpensive.

  11. A Low Temperature Fully Lithographic Process For Metal–Oxide Field-Effect Transistors

    E-Print Network [OSTI]

    Sodini, Charles G.

    We report a low temperature ( ~ 100à °C) lithographic method for fabricating hybrid metal oxide/organic field-effect transistors (FETs) that combine a zinc-indium-oxide (ZIO) semiconductor channel and organic, parylene, ...

  12. Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer

    DOE Patents [OSTI]

    Spahn, Olga B. (Albuquerque, NM); Lear, Kevin L. (Albuquerque, NM)

    1998-01-01T23:59:59.000Z

    A semiconductor structure. The semiconductor structure comprises a plurality of semiconductor layers formed on a substrate including at least one layer of a III-V compound semiconductor alloy comprising aluminum (Al) and antimony (Sb), with at least a part of the AlSb-alloy layer being chemically converted by an oxidation process to form superposed electrically insulating and electrically conducting portions. The electrically insulating portion formed from the AlSb-alloy layer comprises an oxide of aluminum (e.g. Al.sub.2 O.sub.3), while the electrically conducting portion comprises Sb. A lateral oxidation process allows formation of the superposed insulating and conducting portions below monocrystalline semiconductor layers for forming many different types of semiconductor structures having particular utility for optoelectronic devices such as light-emitting diodes, edge-emitting lasers, vertical-cavity surface-emitting lasers, photodetectors and optical modulators (waveguide and surface normal), and for electronic devices such as heterojunction bipolar transistors, field-effect transistors and quantum-effect devices. The invention is expected to be particularly useful for forming light-emitting devices for use in the 1.3-1.6 .mu.m wavelength range, with the AlSb-alloy layer acting to define an active region of the device and to effectively channel an electrical current therein for efficient light generation.

  13. Semiconductor device PN junction fabrication using optical processing of amorphous semiconductor material

    DOE Patents [OSTI]

    Sopori, Bhushan; Rangappan, Anikara

    2014-11-25T23:59:59.000Z

    Systems and methods for semiconductor device PN junction fabrication are provided. In one embodiment, a method for fabricating an electrical device having a P-N junction comprises: depositing a layer of amorphous semiconductor material onto a crystalline semiconductor base, wherein the crystalline semiconductor base comprises a crystalline phase of a same semiconductor as the amorphous layer; and growing the layer of amorphous semiconductor material into a layer of crystalline semiconductor material that is epitaxially matched to the lattice structure of the crystalline semiconductor base by applying an optical energy that penetrates at least the amorphous semiconductor material.

  14. Semiconductor Bridge Cable Test

    SciTech Connect (OSTI)

    KING, TONY L.

    2002-01-01T23:59:59.000Z

    The semiconductor bridge (SCB) is an electroexplosive device used to initiate detonators. A C cable is commonly used to connect the SCB to a firing set. A series of tests were performed to identify smaller, lighter cables for firing single and multiple SCBs. This report provides a description of these tests and their results. It was demonstrated that lower threshold voltages and faster firing times can be achieved by increasing the wire size, which reduces ohmic losses. The RF 100 appears to be a reasonable substitute for C cable when firing single SCBs. This would reduce the cable volume by 68% and the weight by 67% while increasing the threshold voltage by only 22%. In general, RG 58 outperforms twisted pair when firing multiple SCBs in parallel. The RG 58's superior performance is attributed to its larger conductor size.

  15. Structural analysis and characterization of layer perovskite oxynitrides made from Dion-Jacobson oxide precursors

    SciTech Connect (OSTI)

    Schottenfeld, Joshua A. [Department of Chemistry, Pennsylvania State University, University Park, PA 16802 (United States); Benesi, Alan J. [Department of Chemistry, Pennsylvania State University, University Park, PA 16802 (United States); Stephens, Peter W. [Department of Physics and Astronomy, State University of New York, Stony Brook, New York 11794 (United States); Chen, Gugang [Departments of Physics, Pennsylvania State University, University Park, PA 16802 (United States); Eklund, Peter C. [Departments of Physics, Pennsylvania State University, University Park, PA 16802 (United States); Mallouk, Thomas E. [Department of Chemistry, Pennsylvania State University, University Park, PA 16802 (United States)]. E-mail: tom@chem.psu.edu

    2005-07-15T23:59:59.000Z

    A three-layer oxynitride Ruddlesden-Popper phase Rb{sub 1+x}Ca{sub 2}Nb{sub 3}O{sub 10-x}N{sub x}.yH{sub 2}O (x=0.7-0.8, y=0.4-0.6) was synthesized by ammonialysis at 800{sup o}C from the Dion-Jacobson phase RbCa{sub 2}Nb{sub 3}O{sub 10} in the presence of Rb{sub 2}CO{sub 3}. Incorporation of nitrogen into the layer perovskite structure was confirmed by XPS, combustion analysis, and MAS NMR. The water content was determined by thermal gravimetric analysis and the rubidium content by ICP-MS. A similar layered perovskite interconversion occurred in the two-layer Dion-Jacobson oxide RbLaNb{sub 2}O{sub 7} to yield Rb{sub 1+x}LaNb{sub 2}O{sub 7-x}N{sub x}.yH{sub 2}O (x=0.7-0.8, y=0.5-1.0). Both compounds were air- and moisture-sensitive, with rapid loss of nitrogen by oxidation and hydrolysis reactions. The structure of the three-layer oxynitride Rb{sub 1.7}Ca{sub 2}Nb{sub 3}O{sub 9.3}N{sub 0.7}.0.5H{sub 2}O was solved in space group P4/mmm with a=3.887(3) and c=18.65(1)A, by Rietveld refinement of X-ray powder diffraction data. The two-layer oxynitride structure Rb{sub 1.8}LaNb{sub 2}O{sub 6.3}N{sub 0.7}.1.0H{sub 2}O was also determined in space group P4/mmm with a=3.934(2) and c=14.697(2)A. GSAS refinement of synchrotron X-ray powder diffraction data showed that the water molecules were intercalated between a double layer of Rb+ ions in both the two- and three-layer Ruddlesden-Popper structures. Optical band gaps were measured by diffuse reflectance UV-vis for both materials. An indirect band gap of 2.51eV and a direct band gap of 2.99eV were found for the three-layer compound, while an indirect band gap of 2.29eV and a direct band gap of 2.84eV were measured for the two-layer compound. Photocatalytic activity tests of the three-layer compound under 380nm pass filtered light with AgNO{sub 3} as a sacrificial electron acceptor gave a quantum yield of 0.025% for oxygen evolution.

  16. Mathematical Modeling of Semiconductor Devices

    E-Print Network [OSTI]

    Jüngel, Ansgar

    fibers. · Optoelectronic emitters convert an electronic signal into light. Examples are light-emitting diodes (LED) used in displays and indication lambs and semiconductor lasers used in compact disk systems

  17. Modeling the semiconductor industry dynamics

    E-Print Network [OSTI]

    Wu, Kailiang

    2008-01-01T23:59:59.000Z

    The semiconductor industry is an exciting and challenging industry. Strong demand at the application end, plus the high capital intensity and rapid technological innovation in manufacturing, makes it difficult to manage ...

  18. Identifying semiconductors by d.c. ionization conductivity

    E-Print Network [OSTI]

    2006-01-01T23:59:59.000Z

    expected from high-Z semiconductor detectors? ,” IEEE Transand binary compound semiconductors and insulators,” J PhysIdentifying Semiconductors by D.C. Ionization Conductivity

  19. Nitride semiconductor Surface and interface characterization and device design

    E-Print Network [OSTI]

    Zhang, Hongtao

    2006-01-01T23:59:59.000Z

    Lett. 80 , D. Schroder, Semiconductor Material and Devicein III-V Nitride Semiconductors: Applications and Devices ,SAN DIEGO Nitride Semiconductor Surface and Interface

  20. Semiconductor Quantum Rods as Single Molecule Fluorescent Biological Labels

    E-Print Network [OSTI]

    2006-01-01T23:59:59.000Z

    Alivisatos, A.P. Semiconductor nanocrystas for biologicalemission from colloidal semiconductor quantum rods. ScienceLight amplification in semiconductor nanocrystals: Quantum

  1. Enhanced Semiconductor Nanocrystal Conductance via Solution Grown Contacts

    E-Print Network [OSTI]

    Sheldon, Matthew T.

    2010-01-01T23:59:59.000Z

    G. ; Avouris, P. , Metal-semiconductor nanocontacts: SiliconIndividual Colloidal Semiconductor Nanorods. Nano Lett 2008,Physical Chemistry of Semiconductor Nanocrystals. J. Phys.

  2. Isovalent Anion Substitution in Ga-Mn-pnictide Ferromagnetic Semiconductors

    E-Print Network [OSTI]

    Stone, Peter

    2010-01-01T23:59:59.000Z

    63. O. Madelung, Semiconductors - Basic Data, 2nd Ed. (in Laser Annealing of Semiconductors, edited by J. M. PoateProperties of Semiconductors ("Atom" Publ. House, Moscow,

  3. Native point defects in yttria and relevance to its use as a high-dielectric-constant gate oxide material: First-principles study

    E-Print Network [OSTI]

    Ceder, Gerbrand

    a promising gate oxide material to replace silicon dioxide in metal-oxide- semiconductor devices. Using-earth-doped lasers. Recently, Y2O3 has re- ceived attention as a promising candidate for replacing sili- con dioxide SiO2 as a gate dielectric material in metal- oxide-semiconductor MOS transistors.1­10 The continual

  4. Template-free hydrothermal derived cobalt oxide nanopowders: Synthesis, characterization, and removal of organic dyes

    SciTech Connect (OSTI)

    Nassar, Mostafa Y. [Chemistry Department, Faculty of Science, Benha University, Benha 13518 (Egypt)] [Chemistry Department, Faculty of Science, Benha University, Benha 13518 (Egypt); Ahmed, Ibrahim S., E-mail: isahmed2010@gmail.com [Chemistry Department, Faculty of Science, Benha University, Benha 13518 (Egypt)

    2012-09-15T23:59:59.000Z

    Graphical abstract: XRD patterns of the products obtained by hydrothermal treatment at 160 °C for 24 h, and at different [Co{sup 2+}]/[CO{sub 3}{sup 2?}] ratios: (a) 1:6, (b) 1:3, (c) 1:1.5, (d) 1:1, (e) 1:0.5. Highlights: ? Spinel cobalt oxide nanoparticles with different morphologies were prepared by hydrothermal approach. ? The optical characteristics of the as-prepared cobalt oxide revealed the presence of two band gaps. ? Adsorption of methylene blue dye on Co{sub 3}O{sub 4} was investigated and the percent uptake was found to be >99% in 24 h. -- Abstract: Pure spinel cobalt oxide nanoparticles were prepared through hydrothermal approach using different counter ions. First, the pure and uniform cobalt carbonate (with particle size of 21.8–29.8 nm) were prepared in high yield (94%) in an autoclave in absence unfriendly organic surfactants or solvents by adjusting different experimental parameters such as: pH, reaction time, temperature, counter ions, and (Co{sup 2+}:CO{sub 3}{sup 2?}) molar ratios. Thence, the spinel Co{sub 3}O{sub 4} (with mean particle size of 30.5–47.35 nm) was produced by thermal decomposition of cobalt carbonate in air at 500 °C for 3 h. The products were characterized by powder X-ray diffraction (XRD), Fourier transform infrared (FTIR), transmission electron microscope (TEM), scanning electron microscope (SEM), and thermal analysis (TA). Also, the optical characteristics of the as-prepared Co{sub 3}O{sub 4} nanoparticles revealed the presence of two band gaps (1.45–1.47, and 1.83–1.93 eV). Additionally, adsorption of methylene blue dye on Co{sub 3}O{sub 4} nanoparticles was investigated and the uptake% was found to be >99% in 24 h.

  5. Impurity gettering in semiconductors

    DOE Patents [OSTI]

    Sopori, B.L.

    1995-06-20T23:59:59.000Z

    A process for impurity gettering in a semiconductor substrate or device such as a silicon substrate or device is disclosed. The process comprises hydrogenating the substrate or device at the back side thereof with sufficient intensity and for a time period sufficient to produce a damaged back side. Thereafter, the substrate or device is illuminated with electromagnetic radiation at an intensity and for a time period sufficient to cause the impurities to diffuse to the back side and alloy with a metal there present to form a contact and capture the impurities. The impurity gettering process also can function to simultaneously passivate defects within the substrate or device, with the defects likewise diffusing to the back side for simultaneous passivation. Simultaneously, substantially all hydrogen-induced damage on the back side of the substrate or device is likewise annihilated. Also taught is an alternate process comprising thermal treatment after hydrogenation of the substrate or device at a temperature of from about 500 C to about 700 C for a time period sufficient to cause the impurities to diffuse to the damaged back side thereof for subsequent capture by an alloying metal. 1 fig.

  6. Impurity gettering in semiconductors

    DOE Patents [OSTI]

    Sopori, Bhushan L. (Denver, CO)

    1995-01-01T23:59:59.000Z

    A process for impurity gettering in a semiconductor substrate or device such as a silicon substrate or device. The process comprises hydrogenating the substrate or device at the back side thereof with sufficient intensity and for a time period sufficient to produce a damaged back side. Thereafter, the substrate or device is illuminated with electromagnetic radiation at an intensity and for a time period sufficient to cause the impurities to diffuse to the back side and alloy with a metal there present to form a contact and capture the impurities. The impurity gettering process also can function to simultaneously passivate defects within the substrate or device, with the defects likewise diffusing to the back side for simultaneous passivation. Simultaneously, substantially all hydrogen-induced damage on the back side of the substrate or device is likewise annihilated. Also taught is an alternate process comprising thermal treatment after hydrogenation of the substrate or device at a temperature of from about 500.degree. C. to about 700.degree. C. for a time period sufficient to cause the impurities to diffuse to the damaged back side thereof for subsequent capture by an alloying metal.

  7. Microstructure of amorphous indium oxide and tin oxide thin films

    SciTech Connect (OSTI)

    Rauf, I.A.; Brown, L.M. (Univ. of Cambridge (United Kingdom))

    1994-03-15T23:59:59.000Z

    Indium oxide, tin oxide, and some other doped and undoped oxide semiconductors show an interesting and technologically important combination of properties. They have high luminous transparency, good electrical conductivity and high infrared reflectivity. Numerous techniques for depositing these materials have been developed and have undergone a number of changes during last two decades. An understanding of the basic physics of these materials has begun to dawn. Most of the literature on transparent conducting oxides consists of studying the dependence of the properties on the composition, preparation conditions, such as deposition rate, substrate temperature or post-deposition heat treatment. In this paper the authors have employed the transmission electron microscopy to study the microstructure of reactively evaporated, electron beam evaporated, ion-beam sputtered amorphous indium oxide and reactively evaporated amorphous tin oxide thin films. These films, which have received little attention in the past, can have enormous potential as transparent conductive coatings on heat-sensitive substrates and inexpensive solar cells.

  8. Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer

    DOE Patents [OSTI]

    Spahn, O.B.; Lear, K.L.

    1998-03-10T23:59:59.000Z

    The semiconductor structure comprises a plurality of semiconductor layers formed on a substrate including at least one layer of a III-V compound semiconductor alloy comprising aluminum (Al) and antimony (Sb), with at least a part of the AlSb-alloy layer being chemically converted by an oxidation process to form superposed electrically insulating and electrically conducting portions. The electrically insulating portion formed from the AlSb-alloy layer comprises an oxide of aluminum (e.g., Al{sub 2}O{sub 3}), while the electrically conducting portion comprises Sb. A lateral oxidation process allows formation of the superposed insulating and conducting portions below monocrystalline semiconductor layers for forming many different types of semiconductor structures having particular utility for optoelectronic devices such as light-emitting diodes, edge-emitting lasers, vertical-cavity surface-emitting lasers, photodetectors and optical modulators (waveguide and surface normal), and for electronic devices such as heterojunction bipolar transistors, field-effect transistors and quantum-effect devices. The invention is expected to be particularly useful for forming light-emitting devices for use in the 1.3--1.6 {mu}m wavelength range, with the AlSb-alloy layer acting to define an active region of the device and to effectively channel an electrical current therein for efficient light generation. 10 figs.

  9. Theory of Organic Magnetoresistance in Disordered Organic Semiconductors

    E-Print Network [OSTI]

    Flatte, Michael E.

    Theory of Organic Magnetoresistance in Disordered Organic Semiconductors Nicholas J. Harmon semiconductors, disordered semiconductors, organic magnetoresistance, percolation theory, spin transport organic semiconductors. The theory proposed here maps the complex phenomena of spin-dependent hopping onto

  10. ECE 344--Semiconductor Devices & Materials ECE Department, UMass Amherst

    E-Print Network [OSTI]

    Massachusetts at Amherst, University of

    1 Syllabus ECE 344--Semiconductor Devices & Materials ECE Department, UMass Amherst Fall 2013 transport in semiconductors Explain the operating principles in semiconductor devices (diodes, capacitors Topics: Fundamentals of Semiconductors; Theory of Electrical Conduction; Device Operations (See "Class

  11. ECE 609 Semiconductor Devices Department of Electrical and Computer Engineering

    E-Print Network [OSTI]

    Massachusetts at Amherst, University of

    ECE 609 ­ Semiconductor Devices Department of Electrical and Computer Engineering University of semiconductor electronic devices in terms of material properties, interface and junction characteristics). ________________________________________________________________________ Preliminary Course Outline 1. Overview of Semiconductor Physics 1.1 Semiconductor Materials

  12. ECE 609 Semiconductor Devices Department of Electrical and Computer Engineering

    E-Print Network [OSTI]

    Massachusetts at Amherst, University of

    ECE 609 ­ Semiconductor Devices Department of Electrical and Computer Engineering University. ________________________________________________________________________ Preliminary Course Outline 1. Overview of Semiconductor Physics 1.1 Semiconductor Materials-V Characteristics, Nonideal Behavior) 2.2 Metal Semiconductor Junctions (Schottky Barriers, Ohmic Contacts) 2

  13. Wide-Bandgap Semiconductors

    SciTech Connect (OSTI)

    Chinthavali, M.S.

    2005-11-22T23:59:59.000Z

    With the increase in demand for more efficient, higher-power, and higher-temperature operation of power converters, design engineers face the challenge of increasing the efficiency and power density of converters [1, 2]. Development in power semiconductors is vital for achieving the design goals set by the industry. Silicon (Si) power devices have reached their theoretical limits in terms of higher-temperature and higher-power operation by virtue of the physical properties of the material. To overcome these limitations, research has focused on wide-bandgap materials such as silicon carbide (SiC), gallium nitride (GaN), and diamond because of their superior material advantages such as large bandgap, high thermal conductivity, and high critical breakdown field strength. Diamond is the ultimate material for power devices because of its greater than tenfold improvement in electrical properties compared with silicon; however, it is more suited for higher-voltage (grid level) higher-power applications based on the intrinsic properties of the material [3]. GaN and SiC power devices have similar performance improvements over Si power devices. GaN performs only slightly better than SiC. Both SiC and GaN have processing issues that need to be resolved before they can seriously challenge Si power devices; however, SiC is at a more technically advanced stage than GaN. SiC is considered to be the best transition material for future power devices before high-power diamond device technology matures. Since SiC power devices have lower losses than Si devices, SiC-based power converters are more efficient. With the high-temperature operation capability of SiC, thermal management requirements are reduced; therefore, a smaller heat sink would be sufficient. In addition, since SiC power devices can be switched at higher frequencies, smaller passive components are required in power converters. Smaller heat sinks and passive components result in higher-power-density power converters. With the advent of the use of SiC devices it is imperative that models of these be made available in commercial simulators. This enables power electronic designers to simulate their designs for various test conditions prior to fabrication. To build an accurate transistor-level model of a power electronic system such as an inverter, the first step is to characterize the semiconductor devices that are present in the system. Suitable test beds need to be built for each device to precisely test the devices and obtain relevant data that can be used for modeling. This includes careful characterization of the parasitic elements so as to emulate the test setup as closely as possible in simulations. This report is arranged as follows: Chapter 2--The testing and characterization of several diodes and power switches is presented. Chapter 3--A 55-kW hybrid inverter (Si insulated gate bipolar transistor--SiC Schottky diodes) device models and test results are presented. A detailed description of the various test setups followed by the parameter extraction, modeling, and simulation study of the inverter performance is presented. Chapter 4--A 7.5-kW all-SiC inverter (SiC junction field effect transistors (JFET)--SiC Schottky diodes) was built and tested. The models built in Saber were validated using the test data and the models were used in system applications in the Saber simulator. The simulation results and a comparison of the data from the prototype tests are discussed in this chapter. Chapter 5--The duration test results of devices utilized in buck converters undergoing reliability testing are presented.

  14. Prediction of new thermodynamically stable aluminum oxides

    E-Print Network [OSTI]

    Liu, Yue; Wang, Shengnan; Zhu, Qiang; Dong, Xiao; Kresse, Georg

    2015-01-01T23:59:59.000Z

    Recently, it has been shown that under pressure, unexpected and counterintuitive chemical compounds become stable. Laser shock experiments (A. Rode, unpublished) on alumina (Al2O3) have shown non-equilibrium decomposition of alumina with the formation of free Al and a mysterious transparent phase. Inspired by these observations, with have explored the possibility of the formation of new chemical compounds in the system Al-O. Using the variable-composition structure prediction algorithm USPEX, in addition to the well-known Al2O3, we have found two extraordinary compounds Al4O7 and AlO2 to be thermodynamically stable in the pressure range 330-443 GPa and above 332 GPa, respectively. Both of these compounds at the same time contain oxide O2- and peroxide O22- ions, and both are insulating. Peroxo-groups are responsible for gap states, which significantly reduce the electronic band gap of both Al4O7 and AlO2.

  15. Heterojunction thin films based on multifunctional metal oxides for photovoltaic application

    SciTech Connect (OSTI)

    Prabhu, M.; Soundararajan, N.; Ramachandran, K. [School of Physics, Madurai Kamaraj University, Madurai - 625021 (India); Marikkannan, M.; Mayandi, J. [School of Chemistry, Madurai Kamaraj University, Madurai - 625021 (India)

    2014-04-24T23:59:59.000Z

    Metal oxides based multifunctional heterojunction thin films of ZnO/SnO{sub 2} and ZnO/SnO{sub 2}/CuO QDs were prepared by spin-coating technique. The crystallographic properties and the surface morphologies of the films were studied by X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. The optical absorption studies revealed that the film thickness has considerable effect on the band gap values and is found to be in the range of 3.73–3.48 eV. The photoluminescence spectra showed several weak visible emission peaks related to the deep level defects (450-575 nm). Finally, the current density-voltage (J-V) characteristic of ZnO/SnO{sub 2}/CuO QDs (ZSCI) based heterojunction thin film coated on ITO is also reported.

  16. Performance of solid oxide fuel cells approaching the two-dimensional limit

    SciTech Connect (OSTI)

    Kerman, K., E-mail: kkerman@fas.harvard.edu; Ramanathan, S. [School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)

    2014-05-07T23:59:59.000Z

    We model electrochemical kinetics and physical conduction mechanisms for carrier transport in electrolyte membranes to determine the limits of dimensionality reduction (down to 1?nm) on maximum power output of solid oxide fuel cells with symmetric Pt electrodes. Using Y-doped ZrO{sub 2}, we find a minimum thickness of ?6?nm to realize near ideal chemical potential in such fuel cells, which is limited by electronic breakdown when approaching the dielectric breakdown strength. For larger electrolyte thicknesses, the greatest source of electronic leakage influencing power loss is from Ohmic transport of minority carriers and emission of trapped carriers. For porous metallic electrodes, an ideal microstructure with the particle size comparable to particle spacing dimensions is found to accurately model experimental results. The role of electronic trap states in the electrolyte band gap on power density characteristics is highlighted.

  17. Correlated exciton dynamics in semiconductor nanostructures

    E-Print Network [OSTI]

    Wen, Patrick, Ph. D. Massachusetts Institute of Technology

    2013-01-01T23:59:59.000Z

    The absorption and dissipation of energy in semiconductor nanostructures are often determined by excited electron dynamics. In semiconductors, one fundamentally important electronic state is an exciton, an excited electron ...

  18. Method of preparing nitrogen containing semiconductor material

    DOE Patents [OSTI]

    Barber, Greg D.; Kurtz, Sarah R.

    2004-09-07T23:59:59.000Z

    A method of combining group III elements with group V elements that incorporates at least nitrogen from a nitrogen halide for use in semiconductors and in particular semiconductors in photovoltaic cells.

  19. Disordered electronic and magnetic systems - transition metal (Mn) and rare earth (Gd) doped amorphous group IV semiconductors (C, Si, Ge)

    E-Print Network [OSTI]

    Zeng, Li

    2007-01-01T23:59:59.000Z

    1.1 Magnetic Semiconductors . . . . . . . . . . . . . . .Semiconductors . . . . . . . . . . . . . . . . . . . 1.3in Semiconductors . . . . . . . . . . . . . . . . . . 1.3.5

  20. Semiconductor electrode with improved photostability characteristics

    DOE Patents [OSTI]

    Frank, A.J.

    1985-02-19T23:59:59.000Z

    An electrode is described for use in photoelectrochemical cells having an electrolyte which includes an aqueous constituent. The electrode consists of a semiconductor and a hydrophobic film disposed between the semiconductor and the aqueous constituent. The hydrophobic film is adapted to permit charges to pass therethrough while substantially decreasing the activity of the aqueous constituent at the semiconductor surface thereby decreasing the photodegradation of the semiconductor electrode.

  1. Semiconductor nanocrystal-based phagokinetic tracking

    DOE Patents [OSTI]

    Alivisatos, A Paul; Larabell, Carolyn A; Parak, Wolfgang J; Le Gros, Mark; Boudreau, Rosanne

    2014-11-18T23:59:59.000Z

    Methods for determining metabolic properties of living cells through the uptake of semiconductor nanocrystals by cells. Generally the methods require a layer of neutral or hydrophilic semiconductor nanocrystals and a layer of cells seeded onto a culture surface and changes in the layer of semiconductor nanocrystals are detected. The observed changes made to the layer of semiconductor nanocrystals can be correlated to such metabolic properties as metastatic potential, cell motility or migration.

  2. Review: Semiconductor Quantum Light Sources

    E-Print Network [OSTI]

    Andrew J Shields

    2007-04-03T23:59:59.000Z

    Lasers and LEDs display a statistical distribution in the number of photons emitted in a given time interval. New applications exploiting the quantum properties of light require sources for which either individual photons, or pairs, are generated in a regulated stream. Here we review recent research on single-photon sources based on the emission of a single semiconductor quantum dot. In just a few years remarkable progress has been made in generating indistinguishable single-photons and entangled photon pairs using such structures. It suggests it may be possible to realise compact, robust, LED-like semiconductor devices for quantum light generation.

  3. Preparation of gallium nitride surfaces for atomic layer deposition of aluminum oxide

    SciTech Connect (OSTI)

    Kerr, A. J. [Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093 (United States); Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093 (United States); Chagarov, E.; Kaufman-Osborn, T.; Kummel, A. C., E-mail: akummel@ucsd.edu [Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093 (United States); Gu, S.; Wu, J.; Asbeck, P. M. [Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093 (United States); Madisetti, S.; Oktyabrsky, S. [Department of Nanoscale Science and Engineering, University at Albany–State University of New York, Albany, New York 12222 (United States)

    2014-09-14T23:59:59.000Z

    A combined wet and dry cleaning process for GaN(0001) has been investigated with XPS and DFT-MD modeling to determine the molecular-level mechanisms for cleaning and the subsequent nucleation of gate oxide atomic layer deposition (ALD). In situ XPS studies show that for the wet sulfur treatment on GaN(0001), sulfur desorbs at room temperature in vacuum prior to gate oxide deposition. Angle resolved depth profiling XPS post-ALD deposition shows that the a-Al{sub 2}O{sub 3} gate oxide bonds directly to the GaN substrate leaving both the gallium surface atoms and the oxide interfacial atoms with XPS chemical shifts consistent with bulk-like charge. These results are in agreement with DFT calculations that predict the oxide/GaN(0001) interface will have bulk-like charges and a low density of band gap states. This passivation is consistent with the oxide restoring the surface gallium atoms to tetrahedral bonding by eliminating the gallium empty dangling bonds on bulk terminated GaN(0001)

  4. Mechanical scriber for semiconductor devices

    DOE Patents [OSTI]

    Lin, P.T.

    1985-03-05T23:59:59.000Z

    A mechanical scriber using a scribing tip, such as a diamond, provides controlled scriber forces with a spring-loaded compound lever arrangement. The scribing force and range of scribing depth are adjusted by a pair of adjustable micrometer heads. A semiconductor device, such as a multilayer solar cell, can be formed into scribed strips at each layer. 5 figs.

  5. Mechanical scriber for semiconductor devices

    DOE Patents [OSTI]

    Lin, Peter T. (East Brunswick, NJ)

    1985-01-01T23:59:59.000Z

    A mechanical scriber using a scribing tip, such as a diamond, provides controlled scriber forces with a spring-loaded compound lever arrangement. The scribing force and range of scribing depth are adjusted by a pair of adjustable micrometer heads. A semiconductor device, such as a multilayer solar cell, can be formed into scribed strips at each layer.

  6. Rational Design and Preparation of Organic Semiconductors for use in Field Effect Transistors and Photovoltaic Cells

    E-Print Network [OSTI]

    Mauldin, Clayton Edward

    2010-01-01T23:59:59.000Z

    Distyryl Oligothiophene Semiconductors Abstract We describebonded Oligothiophene Semiconductor Side Chains Abstract Ato assemble oligothiophene semiconductors and control their

  7. Back-side readout semiconductor photomultiplier

    DOE Patents [OSTI]

    Choong, Woon-Seng; Holland, Stephen E

    2014-05-20T23:59:59.000Z

    This disclosure provides systems, methods, and apparatus related to semiconductor photomultipliers. In one aspect, a device includes a p-type semiconductor substrate, the p-type semiconductor substrate having a first side and a second side, the first side of the p-type semiconductor substrate defining a recess, and the second side of the p-type semiconductor substrate being doped with n-type ions. A conductive material is disposed in the recess. A p-type epitaxial layer is disposed on the second side of the p-type semiconductor substrate. The p-type epitaxial layer includes a first region proximate the p-type semiconductor substrate, the first region being implanted with p-type ions at a higher doping level than the p-type epitaxial layer, and a second region disposed on the first region, the second region being doped with p-type ions at a higher doping level than the first region.

  8. Ann. N.Y. Acad. Sci. 1006: 104121 (2003). 2003 New York Academy of Sciences. doi: 10.1196/annals.1292.007

    E-Print Network [OSTI]

    Zhou, Chongwu

    2003-01-01T23:59:59.000Z

    semiconductor nanowires, semiconducting oxide nanowires, such as ZnO, CdO, and In2O3 are becoming increasingly cells and organic light emitting diodes.13,14 More importantly, In2O3 films have been demonstrated.6eV and an indirect band gap of about 2.5eV). In2O3 in the bulk form has been widely used in solar

  9. PHYSICAL REVIEW B 83, 115329 (2011) Diffusion and interface growth in hafnium oxide and silicate ultrathin films on Si(001)

    E-Print Network [OSTI]

    Garfunkel, Eric

    PHYSICAL REVIEW B 83, 115329 (2011) Diffusion and interface growth in hafnium oxide and silicate­oxide­semiconductor (CMOS) technology necessary.1,2 Transition metal (Hf, Zr, La) oxides, silicates, and ternary Hf to be desirable to have at least one monolayer of SiO2 at the dielectric/Si interface. The Hf oxide (silicate

  10. Measuring Speedy Electrons in Silicon

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    scientists have taken snapshots of this very brief band-gap jump and timed it at 450 attoseconds. Image: Stephen Leone The entire semiconductor industry, not to mention...

  11. Lateral coupled cavity semiconductor laser

    SciTech Connect (OSTI)

    Salzman, J.; Lang, R.; Yariv, A.

    1985-08-01T23:59:59.000Z

    We report the fabrication and operation of a lateral coupled cavity semiconductor laser that consists of two phase-locked parallel lasers of different lengths and with separate electrical contacts. Mode selectivity that results from the interaction between the two supermodes is investigated experimentally. Frequency selectivity and tunability are obtained by controlling the current to each laser separately. Highly stable single mode operation is also demonstrated.

  12. Compound semiconductor optical waveguide switch

    DOE Patents [OSTI]

    Spahn, Olga B.; Sullivan, Charles T.; Garcia, Ernest J.

    2003-06-10T23:59:59.000Z

    An optical waveguide switch is disclosed which is formed from III-V compound semiconductors and which has a moveable optical waveguide with a cantilevered portion that can be bent laterally by an integral electrostatic actuator to route an optical signal (i.e. light) between the moveable optical waveguide and one of a plurality of fixed optical waveguides. A plurality of optical waveguide switches can be formed on a common substrate and interconnected to form an optical switching network.

  13. Passivating ligand and solvent contributions to the electronic properties of semiconductor nanocrystals

    SciTech Connect (OSTI)

    Fischer, S.; Crotty, A.; Kilina, S.; Ivanov, I.; Tretiak, S

    2012-01-01T23:59:59.000Z

    We examine in detail the impact of passivating ligands (i.e., amines, phosphines, phosphine oxides and pyridines) on the electronic and optical spectra of Cd{sub 33}Se{sub 33} quantum dots (QDs) using density functional theory (DFT) and time-dependent DFT (TDDFT) quantum-chemical methodologies. Most ligand orbitals are found deep inside in the valence and conduction bands of the QD, with pyridine being an exception by introducing new states close to the conduction band edge. Importantly, all ligands contribute states which are highly delocalized over both the QD surface and ligands, forming hybridized orbitals rather than ligand-localized trap states. In contrast, the states close to the band gap are delocalized over the QD atoms only and define the lower energy absorption spectra. The random detachment of one of ligands from the QD surface results in the appearance of a highly localized unoccupied state inside the energy gap of the QD. Such changes in the electronic structure are correlated with the respective QD-ligand binding energy and steric ligand-ligand interactions. Polar solvent significantly reduces both effects leading to delocalization and stabilization of the surface states. Thus, trap and surface states are substantially eliminated by the solvent. Polar solvent also blue-shifts (e.g., 0.3-0.4 eV in acetonitrile) the calculated absorption spectra. This shift increases with an increase of the dielectric constant of the solvent. We also found that the approximate single-particle Kohn-Sham (KS) approach is adequate for calculating the absorption spectra of the ligated QDs. Besides a systematic blue-shift, the KS spectra are in very good agreement with their respective counterparts calculated with the more accurate TDDFT method.

  14. Effect of thermal annealing on the properties of transparent conductive In–Ga–Zn oxide thin films

    SciTech Connect (OSTI)

    Li, Ling [Key Laboratory of Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China and School of Information Science and Engineering, Shandong University, Jinan 250100 (China); Fan, Lina; Li, Yanhuai; Song, Zhongxiao; Ma, Fei, E-mail: mafei@mail.xjtu.edu.cn, E-mail: chlliu@mail.xjtu.edu.cn [State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049 (China); Liu, Chunliang, E-mail: mafei@mail.xjtu.edu.cn, E-mail: chlliu@mail.xjtu.edu.cn [Key Laboratory of Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049 (China)

    2014-03-15T23:59:59.000Z

    Amorphous In–Ga–Zn oxide (IGZO) thin films were prepared using radio frequency magnetron sputtering at room temperature. Upon thermal annealing at temperatures even up to 500?°C, the amorphous characteristics were still maintained, but the electronic properties could be considerably enhanced. This could be ascribed to the increased optical band gap and the increased oxygen vacancies, as corroborated by the microstructure characterizations. In addition, the surface became smoother upon thermal annealing, guaranteeing good interface contact between electrode and a-IGZO. The optical transmittance at 400–800?nm exceeded 90% for all samples. All in all, thermal annealing at appropriate temperatures is expected to improve the performances of relevant a-IGZO thin film transistors.

  15. Routing for analog chip design at NXP semiconductors

    E-Print Network [OSTI]

    Utrecht, Universiteit

    Routing for analog chip design at NXP semiconductors Marjan van den Akker Theo Beelen Rob H.O. Box 80.089 3508 TB Utrecht The Netherlands #12;Routing for analog chip designs at NXP Semiconductors.1 NXP Semiconductors NXP Semiconductors N.V. (Nasdaq: NXPI) is a global semiconductor company and a long

  16. Optical devices featuring textured semiconductor layers

    DOE Patents [OSTI]

    Moustakas, Theodore D. (Dover, MA); Cabalu, Jasper S. (Cary, NC)

    2012-08-07T23:59:59.000Z

    A semiconductor sensor, solar cell or emitter, or a precursor therefor, has a substrate and one or more textured semiconductor layers deposited onto the substrate. The textured layers enhance light extraction or absorption. Texturing in the region of multiple quantum wells greatly enhances internal quantum efficiency if the semiconductor is polar and the quantum wells are grown along the polar direction. Electroluminescence of LEDs of the invention is dichromatic, and results in variable color LEDs, including white LEDs, without the use of phosphor.

  17. Optical devices featuring textured semiconductor layers

    DOE Patents [OSTI]

    Moustakas, Theodore D. (Dover, MA); Cabalu, Jasper S. (Cary, NC)

    2011-10-11T23:59:59.000Z

    A semiconductor sensor, solar cell or emitter, or a precursor therefor, has a substrate and one or more textured semiconductor layers deposited onto the substrate. The textured layers enhance light extraction or absorption. Texturing in the region of multiple quantum wells greatly enhances internal quantum efficiency if the semiconductor is polar and the quantum wells are grown along the polar direction. Electroluminescence of LEDs of the invention is dichromatic, and results in variable color LEDs, including white LEDs, without the use of phosphor.

  18. Stretchable semiconductor elements and stretchable electrical circuits

    DOE Patents [OSTI]

    Rogers, John A. (Champaign, IL); Khang, Dahl-Young (Seoul, KR); Menard, Etienne (Durham, NC)

    2009-07-07T23:59:59.000Z

    The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

  19. J Am Cerom Soc 73 [lo] 3026-32 (19901 Electrical Properties of Individual Zinc Oxide

    E-Print Network [OSTI]

    Rohrer, Gregory S.

    properties of single interfaces and grain boundaries. [Keywords: grain boundaries, zinc oxide, varistors semiconductor, zinc oxide (ZnO), which is used commercially as a varistor material. This is an excellentJ Am Cerom Soc 73 [lo] 3026-32 (19901 Electrical Properties of Individual Zinc Oxide Grain

  20. Low Energy Ion Implantationin Semiconductor Manufacturing | U...

    Office of Science (SC) Website

    Low Energy Ion Implantation in Semiconductor Manufacturing Nuclear Physics (NP) NP Home About Research Facilities Science Highlights Benefits of NP Applications of Nuclear Science...

  1. Climate VISION: Private Sector Initiatives: Semiconductors: Work...

    Office of Scientific and Technical Information (OSTI)

    of EPA. The plan describes actions the industry intends to take to achieve its Climate VISION goal by 2010. Read the Semiconductor Industry Association Work Plan (PDF 94...

  2. Climate VISION: Private Sector Initiatives: Semiconductors: Resources...

    Office of Scientific and Technical Information (OSTI)

    to reduce high global warming potential (GWP) greenhouse gas emissions by following a pollution prevention strategy. Today, nearly 80 percent of U.S. semiconductor manufacturers...

  3. Wafer-fused semiconductor radiation detector

    DOE Patents [OSTI]

    Lee, Edwin Y. (Livermore, CA); James, Ralph B. (Livermore, CA)

    2002-01-01T23:59:59.000Z

    Wafer-fused semiconductor radiation detector useful for gamma-ray and x-ray spectrometers and imaging systems. The detector is fabricated using wafer fusion to insert an electrically conductive grid, typically comprising a metal, between two solid semiconductor pieces, one having a cathode (negative electrode) and the other having an anode (positive electrode). The wafer fused semiconductor radiation detector functions like the commonly used Frisch grid radiation detector, in which an electrically conductive grid is inserted in high vacuum between the cathode and the anode. The wafer-fused semiconductor radiation detector can be fabricated using the same or two different semiconductor materials of different sizes and of the same or different thicknesses; and it may utilize a wide range of metals, or other electrically conducting materials, to form the grid, to optimize the detector performance, without being constrained by structural dissimilarity of the individual parts. The wafer-fused detector is basically formed, for example, by etching spaced grooves across one end of one of two pieces of semiconductor materials, partially filling the grooves with a selected electrical conductor which forms a grid electrode, and then fusing the grooved end of the one semiconductor piece to an end of the other semiconductor piece with a cathode and an anode being formed on opposite ends of the semiconductor pieces.

  4. Isovalent Anion Substitution in Ga-Mn-pnictide Ferromagnetic Semiconductors

    E-Print Network [OSTI]

    Stone, Peter

    2010-01-01T23:59:59.000Z

    a so-called diluted magnetic semiconductor (DMS). DMSs arein heavily doped magnetic semiconductors as the probabilitythis method to magnetic semiconductors, the 6×6 k·p matrix

  5. Performance of Adaptive DualDropping ILUT Preconditioners in Semiconductor

    E-Print Network [OSTI]

    Zhang, Jun

    Performance of Adaptive Dual­Dropping ILUT Preconditioners in Semiconductor Dopant Diffusion for iterative solution of sparse linear systems arising in semiconductor dopant diffusion modeling resolution, timestep in the adaptive ODE integrator and the problem physics. Key words: semiconductor TCAD

  6. OPTI 240: Semiconductor Physics and Lasers Instructor: Mahmoud Fallahi

    E-Print Network [OSTI]

    Arizona, University of

    OPTI 240: Semiconductor Physics and Lasers Instructor: Mahmoud Fallahi fallahi@optics.arizona.edu Spring Semester Introduction to Semiconductor Optoelectronic Introduction to quantum mechanics: Energy exclusion principle Metal, Insulator, Semiconductor Conduction band, valance band, energy gap Electrons

  7. Semiconductor Capabilities in the U.S. and Industrializing Asia

    E-Print Network [OSTI]

    Brown, Clair; Linden, Greg

    2008-01-01T23:59:59.000Z

    data. Table 2: U.S. Semiconductor Engineers By Location,medium-sized U.S. semiconductor companies, which togetherto represent all U.S. semiconductor firms. The total

  8. Electrochemical lithiation and delithiation for control of magnetic properties of nanoscale transition metal oxides

    E-Print Network [OSTI]

    Sivakumar, Vikram

    2008-01-01T23:59:59.000Z

    Transition metal oxides comprise a fascinating class of materials displaying a variety of magnetic and electronic properties, ranging from half-metallic ferromagnets like CrO2, ferrimagnetic semiconductors like Fey's, and ...

  9. Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering

    E-Print Network [OSTI]

    Lee, Yun Seog

    Cuprous oxide (Cu[subscript 2]O) is a promising earth-abundant semiconductor for photovoltaic applications. We report Hall mobilities of polycrystalline Cu[subscript 2]O thin films deposited by reactive dc magnetron ...

  10. Low frequency noise in GaN metal semiconductor and metal oxide semiconductor field effect transistors

    E-Print Network [OSTI]

    Pala, Nezih

    , and Systems Engineering and Center for Integrated Electronics and Electronics Manufacturing, CII 9017, University of South Carolina, Columbia, South Carolina 29208 Received 22 January 2001; accepted American Institute of Physics. DOI: 10.1063/1.1372364 I. INTRODUCTION A recent report on GaN highly doped

  11. PROTECTIVE SURFACE COATINGS ON SEMICONDUCTOR NUCLEAR RADIATION DETECTORS

    E-Print Network [OSTI]

    Hansen, W.L.

    2010-01-01T23:59:59.000Z

    ON SEMICONDUCTOR NUCLEAR RADIATION DETECTORS W. L. Hansen,COATINGS ON SEMICONDUCTOR NUCLEAR RADIATION DETECTORS* W. L.the use of germanium nuclear radiation detec­ tors, a new

  12. New ALS Technique Guides IBM in Next-Generation Semiconductor...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    New ALS Technique Guides IBM in Next-Generation Semiconductor Development New ALS Technique Guides IBM in Next-Generation Semiconductor Development Print Wednesday, 21 January 2015...

  13. Hydrogenated Graphene Nanoflakes: Semiconductor to Half-Metal...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Hydrogenated Graphene Nanoflakes: Semiconductor to Half-Metal Transition and Remarkable Large Magnetism. Hydrogenated Graphene Nanoflakes: Semiconductor to Half-Metal Transition...

  14. Engineering Density of States of Earth Abundant Semiconductors...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    of States of Earth Abundant Semiconductors for Enhanced Thermoelectric Power Factor Engineering Density of States of Earth Abundant Semiconductors for Enhanced Thermoelectric...

  15. advanced semiconductor manufacturing: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Websites Summary: Business and Manufacturing Tohru Ogawa Semiconductor Company Sony Corporation 12;WISE 2000 ContentsContents Paradigm Shift in Semiconductor Business...

  16. Webinar: Opportunities for Wide Bandgap Semiconductor Power Electronic...

    Broader source: Energy.gov (indexed) [DOE]

    Opportunities for Wide Bandgap Semiconductor Power Electronics for Hydrogen and Fuel Cell Applications Webinar: Opportunities for Wide Bandgap Semiconductor Power Electronics...

  17. Charge-carrier transport in amorphous organic semiconductors

    E-Print Network [OSTI]

    Limketkai, Benjie, 1982-

    2008-01-01T23:59:59.000Z

    Since the first reports of efficient luminescence and absorption in organic semiconductors, organic light-emitting devices (OLEDs) and photovoltaics (OPVs) have attracted increasing interest. Organic semiconductors have ...

  18. Optic probe for semiconductor characterization

    DOE Patents [OSTI]

    Sopori, Bhushan L. (Denver, CO); Hambarian, Artak (Yerevan, AM)

    2008-09-02T23:59:59.000Z

    Described herein is an optical probe (120) for use in characterizing surface defects in wafers, such as semiconductor wafers. The optical probe (120) detects laser light reflected from the surface (124) of the wafer (106) within various ranges of angles. Characteristics of defects in the surface (124) of the wafer (106) are determined based on the amount of reflected laser light detected in each of the ranges of angles. Additionally, a wafer characterization system (100) is described that includes the described optical probe (120).

  19. Visible Light Water Splitting Using Dye-Sensitized Oxide Semiconductors

    E-Print Network [OSTI]

    - ical energy in the form of fuels. Hydrogen is a key solar fuel because it can be used directly- toelectrodes, molecular donor-acceptor systems linked to cat- alysts for hydrogen and oxygen evolution, and photovoltaic cells coupled directly or indirectly to electrocatalysts. Despite several decades of research

  20. Metal Oxide Semiconductor Nanoparticles Pave the Way for Medical Innovation

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative1 First Use of Energy for All Purposes (Fuel and Nonfuel), 2002; Level: National5Sales for4,645U.S. DOEThe Bonneville PowerCherries 82981-1cnHighand Retrievals from aRod EggertMercuryAdvanced MaterialsPortal-

  1. Single crystalline Pr{sub 2-x}Y{sub x}O{sub 3} (x=0-2) dielectrics on Si with tailored electronic and crystallographic structure

    SciTech Connect (OSTI)

    Seifarth, O.; Schubert, M. A.; Giussani, A.; Schroeder, T. [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); Klenov, D. O. [FEI, Achtseweg Noord 5, 5651 GG Eindhoven (Netherlands); Schmeisser, D. [BTU Cottbus, Konrad Wachsmann Allee 1, 03046 Cottbus (Germany)

    2010-11-15T23:59:59.000Z

    Crystalline oxides on Si with tailored electronic and crystallographic properties are of importance for the integration of functional oxides or alternative semiconductors to enable novel device concepts in Si microelectronics. We present an electronic band gap study of single crystalline Pr{sub 2-x}Y{sub x}O{sub 3} (0{<=}x{<=}2) heterostructures on Si(111). The perfect solubility of the isomorphic bixbyites Pr{sub 2}O{sub 3} and Y{sub 2}O{sub 3} during molecular beam epitaxy thin film growth on Si enables a linear band gap tuning. Special focus is devoted to the determination of the electronic band offsets across the dielectric/Si interface. In addition, the composition x allows to control the crystallographic lattice parameter where, for example, Pr{sub 0.8}Y{sub 1.2}O{sub 3} enables the growth of fully lattice matched oxide heterostructures on Si.

  2. Nonlinear Peltier effect in semiconductors Mona Zebarjadia

    E-Print Network [OSTI]

    Nonlinear Peltier effect in semiconductors Mona Zebarjadia Department of Electrical Engineering; published online 18 September 2007 Nonlinear Peltier coefficient of a doped InGaAs semiconductor is calculated numerically using the Monte Carlo technique. The Peltier coefficient is also obtained analytically

  3. Preparation of a semiconductor thin film

    DOE Patents [OSTI]

    Pehnt, M.; Schulz, D.L.; Curtis, C.J.; Ginley, D.S.

    1998-01-27T23:59:59.000Z

    A process is disclosed for the preparation of a semiconductor film. The process comprises depositing nanoparticles of a semiconductor material onto a substrate whose surface temperature during nanoparticle deposition thereon is sufficient to cause substantially simultaneous fusion of the nanoparticles to thereby coalesce with each other and effectuate film growth.

  4. Ultra-high speed semiconductor lasers

    SciTech Connect (OSTI)

    Lau, K.Y.; Yariv, A.

    1985-02-01T23:59:59.000Z

    Recent progress on semiconductor lasers having a very high direct modulation bandwidth of beyond 10 GHz are described. Issues related to application of these lasers in actual systems are addressed. Possibilities of further extending the bandwidth of semiconductor lasers are examined.

  5. Preparation of a semiconductor thin film

    DOE Patents [OSTI]

    Pehnt, Martin (TuBingen, DE); Schulz, Douglas L. (Denver, CO); Curtis, Calvin J. (Lakewood, CO); Ginley, David S. (Evergreen, CO)

    1998-01-01T23:59:59.000Z

    A process for the preparation of a semiconductor film. The process comprises depositing nanoparticles of a semiconductor material onto a substrate whose surface temperature during nanoparticle deposition thereon is sufficient to cause substantially simultaneous fusion of the nanoparticles to thereby coalesce with each other and effectuate film growth.

  6. Hybrid anode for semiconductor radiation detectors

    DOE Patents [OSTI]

    Yang, Ge; Bolotnikov, Aleksey E; Camarda, Guiseppe; Cui, Yonggang; Hossain, Anwar; Kim, Ki Hyun; James, Ralph B

    2013-11-19T23:59:59.000Z

    The present invention relates to a novel hybrid anode configuration for a radiation detector that effectively reduces the edge effect of surface defects on the internal electric field in compound semiconductor detectors by focusing the internal electric field of the detector and redirecting drifting carriers away from the side surfaces of the semiconductor toward the collection electrode(s).

  7. Semiconductor switch geometry with electric field shaping

    DOE Patents [OSTI]

    Booth, Rex (Livermore, CA); Pocha, Michael D. (Livermore, CA)

    1994-01-01T23:59:59.000Z

    An optoelectric switch is disclosed that utilizes a cylindrically shaped and contoured GaAs medium or other optically active semiconductor medium to couple two cylindrically shaped metal conductors with flat and flared termination points each having an ovoid prominence centrally extending there from. Coupling the truncated ovoid prominence of each conductor with the cylindrically shaped optically active semiconductor causes the semiconductor to cylindrically taper to a triple junction circular line at the base of each prominence where the metal conductor conjoins with the semiconductor and a third medium such as epoxy or air. Tapering the semiconductor at the triple junction inhibits carrier formation and injection at the triple junction and thereby enables greater current carrying capacity through and greater sensitivity of the bulk area of the optically active medium.

  8. Semiconductor switch geometry with electric field shaping

    DOE Patents [OSTI]

    Booth, R.; Pocha, M.D.

    1994-08-23T23:59:59.000Z

    An optoelectric switch is disclosed that utilizes a cylindrically shaped and contoured GaAs medium or other optically active semiconductor medium to couple two cylindrically shaped metal conductors with flat and flared termination points each having an ovoid prominence centrally extending there from. Coupling the truncated ovoid prominence of each conductor with the cylindrically shaped optically active semiconductor causes the semiconductor to cylindrically taper to a triple junction circular line at the base of each prominence where the metal conductor conjoins with the semiconductor and a third medium such as epoxy or air. Tapering the semiconductor at the triple junction inhibits carrier formation and injection at the triple junction and thereby enables greater current carrying capacity through and greater sensitivity of the bulk area of the optically active medium. 10 figs.

  9. Novel room temperature ferromagnetic semiconductors

    SciTech Connect (OSTI)

    Gupta, Amita

    2004-11-01T23:59:59.000Z

    Today's information world, bits of data are processed by semiconductor chips, and stored in the magnetic disk drives. But tomorrow's information technology may see magnetism (spin) and semiconductivity (charge) combined in one 'spintronic' device that exploits both charge and 'spin' to carry data (the best of two worlds). Spintronic devices such as spin valve transistors, spin light emitting diodes, non-volatile memory, logic devices, optical isolators and ultra-fast optical switches are some of the areas of interest for introducing the ferromagnetic properties at room temperature in a semiconductor to make it multifunctional. The potential advantages of such spintronic devices will be higher speed, greater efficiency, and better stability at a reduced power consumption. This Thesis contains two main topics: In-depth understanding of magnetism in Mn doped ZnO, and our search and identification of at least six new above room temperature ferromagnetic semiconductors. Both complex doped ZnO based new materials, as well as a number of nonoxides like phosphides, and sulfides suitably doped with Mn or Cu are shown to give rise to ferromagnetism above room temperature. Some of the highlights of this work are discovery of room temperature ferromagnetism in: (1) ZnO:Mn (paper in Nature Materials, Oct issue, 2003); (2) ZnO doped with Cu (containing no magnetic elements in it); (3) GaP doped with Cu (again containing no magnetic elements in it); (4) Enhancement of Magnetization by Cu co-doping in ZnO:Mn; (5) CdS doped with Mn, and a few others not reported in this thesis. We discuss in detail the first observation of ferromagnetism above room temperature in the form of powder, bulk pellets, in 2-3 mu-m thick transparent pulsed laser deposited films of the Mn (<4 at. percent) doped ZnO. High-resolution transmission electron microscopy (HRTEM) and electron energy loss spectroscopy (EELS) spectra recorded from 2 to 200nm areas showed homogeneous distribution of Mn substituting for Zn a 2+ state in the ZnO lattice. Ferromagnetic Resonance (FMR) technique is used to confirm the existence of ferromagnetic ordering at temperatures as high as 425K. The ab initio calculations were found to be consistent with the observation of ferromagnetism arising from fully polarized Mn 2+ state. The key to observed room temperature ferromagnetism in this system is the low temperature processing, which prevents formation of clusters, secondary phases and the host ZnO from becoming n-type. The electronic structure of the same Mn doped ZnO thin films studied using XAS, XES and RIXS, revealed a strong hybridization between Mn 3d and O 2p states, which is an important characteristic of a Dilute magnetic Semiconductor (DMS). It is shown that the various processing conditions like sintering temperature, dopant concentration and the properties of precursors used for making of DMS have a great influence on the final properties. Use of various experimental techniques to verify the physical properties, and to understand the mechanism involved to give rise to ferromagnetism is presented. Methods to improve the magnetic moment in Mn doped ZnO are also described. New promising DMS materials (such as Cu doped ZnO are explored). The demonstrated new capability to fabricate powder, pellets, and thin films of room temperature ferromagnetic semiconductors thus makes possible the realization of a wide range of complex elements for a variety of new multifunctional phenomena related to Spintronic devices as well as magneto-optic components.

  10. Atomic layer deposition of bismuth oxide using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O

    SciTech Connect (OSTI)

    Austin, Dustin Z., E-mail: austind@eecs.oregonstate.edu; Conley, John F., E-mail: jconley@eecs.oregonstate.edu [Department of Electrical Engineering and Computer Science, Oregon State University, Corvallis, Oregon 97331 (United States); Allman, Derryl; Price, David; Hose, Sallie [ON Semiconductor, Technology Development, Gresham, Oregon 97030 (United States); Saly, Mark [SAFC Hitech, Haverhill, Massachusetts 01832 (United States)

    2014-01-15T23:59:59.000Z

    Bismuth oxide thin films were deposited by atomic layer deposition using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O at deposition temperatures between 90 and 270?°C on Si{sub 3}N{sub 4}, TaN, and TiN substrates. Films were analyzed using spectroscopic ellipsometry, x-ray diffraction, x-ray reflectivity, high-resolution transmission electron microscopy, and Rutherford backscattering spectrometry. Bi{sub 2}O{sub 3} films deposited at 150?°C have a linear growth per cycle of 0.039?nm/cycle, density of 8.3?g/cm{sup 3}, band gap of approximately 2.9?eV, low carbon content, and show the ? phase structure with a (201) preferred crystal orientation. Deposition temperatures above 210?°C and postdeposition anneals caused uneven volumetric expansion, resulting in a decrease in film density, increased interfacial roughness, and degraded optical properties.

  11. Investigation of the basic physics of high efficiency semiconductor hot carrier solar cell. Annual status report, 31 May 1994-30 May 1995

    SciTech Connect (OSTI)

    Alfano, R.R.; Wang, W.B.; Mohaidat, J.M.; Cavicchia, M.A.; Raisky, O.Y.

    1995-05-01T23:59:59.000Z

    The main purpose of this research program is to investigate potential semiconductor materials and their multi-band-gap MQW (multiple quantum wells) structures for high efficiency solar cells for aerospace and commercial applications. The absorption and PL (photoluminescence) spectra, the carrier dynamics, and band structures have been investigated for semiconductors of InP, GaP, GaInP, and InGaAsP/InP MQW structures, and for semiconductors of GaAs and AlGaAs by previous measurements. The barrier potential design criteria for achieving maximum energy conversion efficiency, and the resonant tunneling time as a function of barrier width in high efficiency MQW solar cell structures have also been investigated in the first two years. Based on previous carrier dynamics measurements and the time-dependent short circuit current density calculations, an InAs/InGaAs - InGaAs/GaAs - GaAs/AlGaAs MQW solar cell structure with 15 bandgaps has been designed. The absorption and PL spectra in InGaAsP/InP bulk and MQW structures were measured at room temperature and 77 K with different pump wavelength and intensity, to search for resonant states that may affect the solar cell activities. Time-resolved IR absorption for InGaAsP/InP bulk and MQW structures has been measured by femtosecond visible-pump and IR-probe absorption spectroscopy. This, with the absorption and PL measurements, will be helpful to understand the basic physics and device performance in multi-bandgap InAs/InGaAs - InGaAs/InP - InP/InGaP MQW solar cells. In particular, the lifetime of the photoexcited hot electrons is an important parameter for the device operation of InGaAsP/InP MQW solar cells working in the resonant tunneling conditions. Lastly, time evolution of the hot electron relaxation in GaAs has been measured in the temperature range of 4 K through 288 K using femtosecond pump-IR-probe absorption technique.

  12. Thin film solar cell including a spatially modulated intrinsic layer

    DOE Patents [OSTI]

    Guha, Subhendu (Troy, MI); Yang, Chi-Chung (Troy, MI); Ovshinsky, Stanford R. (Bloomfield Hills, MI)

    1989-03-28T23:59:59.000Z

    One or more thin film solar cells in which the intrinsic layer of substantially amorphous semiconductor alloy material thereof includes at least a first band gap portion and a narrower band gap portion. The band gap of the intrinsic layer is spatially graded through a portion of the bulk thickness, said graded portion including a region removed from the intrinsic layer-dopant layer interfaces. The band gap of the intrinsic layer is always less than the band gap of the doped layers. The gradation of the intrinsic layer is effected such that the open circuit voltage and/or the fill factor of the one or plural solar cell structure is enhanced.

  13. Transport Equations for Semiconductors Prof. Dr. Ansgar Jungel

    E-Print Network [OSTI]

    Jüngel, Ansgar

    - cations have been invented; for instance, semiconductor lasers, solar cells, light-emitting diodes (LED

  14. Kinetic and Macroscopic Models for Semiconductors Ansgar Jungel

    E-Print Network [OSTI]

    Jüngel, Ansgar

    Kinetic and Macroscopic Models for Semiconductors Ansgar J¨ungel Vienna University of Technology, Austria www.jungel.at.vu Ansgar J¨ungel (TU Wien) Kinetic Semiconductor Models www.jungel.at.vu 1 / 165 #12;Contents 1 Introduction 2 Semiconductor modeling Basics of semiconductor physics Kinetic models 3

  15. Heating device for semiconductor wafers

    DOE Patents [OSTI]

    Vosen, S.R.

    1999-07-27T23:59:59.000Z

    An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernible pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light. 4 figs.

  16. Heating device for semiconductor wafers

    DOE Patents [OSTI]

    Vosen, Steven R. (Berkeley, CA)

    1999-01-01T23:59:59.000Z

    An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernable pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light.

  17. Diluted magnetic semiconductor nanowires exhibiting magnetoresistance

    DOE Patents [OSTI]

    Yang, Peidong (El Cerrito, CA); Choi, Heonjin (Seoul, KR); Lee, Sangkwon (Daejeon, KR); He, Rongrui (Albany, CA); Zhang, Yanfeng (El Cerrito, CA); Kuykendal, Tevye (Berkeley, CA); Pauzauskie, Peter (Berkeley, CA)

    2011-08-23T23:59:59.000Z

    A method for is disclosed for fabricating diluted magnetic semiconductor (DMS) nanowires by providing a catalyst-coated substrate and subjecting at least a portion of the substrate to a semiconductor, and dopant via chloride-based vapor transport to synthesize the nanowires. Using this novel chloride-based chemical vapor transport process, single crystalline diluted magnetic semiconductor nanowires Ga.sub.1-xMn.sub.xN (x=0.07) were synthesized. The nanowires, which have diameters of .about.10 nm to 100 nm and lengths of up to tens of micrometers, show ferromagnetism with Curie temperature above room temperature, and magnetoresistance up to 250 Kelvin.

  18. Photodeposition of Pt on Colloidal CdS and CdSe/CdS Semiconductor Nanostructures

    SciTech Connect (OSTI)

    Dukovic, Gordana; Merkle, Maxwell G.; Nelson, James H.; Hughes, Steven M.; Alivisatos, A. Paul

    2008-08-06T23:59:59.000Z

    Semiconductor photocatalysis has been identified as a promising avenue for the conversion of solar energy into environmentally friendly fuels, most notably by the production of hydrogen from water.[1-5] Nanometer-scale materials in particular have attracted considerable scientific attention as the building blocks for light-harvesting applications.[6,7] Their desirable attributes include tunability of the optical properties with size, amenability to relatively inexpensive low-temperature processing, and a high degree of synthetic sophistication leading to increasingly complex and multi-functional architectures. For photocatalysis in particular, the high surface-to-volume ratios in nanoscale materials should lead to an increased availability of carriers for redox reactions on the nanoparticle surface. Recombination of photoexcited carriers directly competes with photocatalytic activity.[3] Charge separation is often achieved with multi-component heterostructures. An early example is the case of TiO2 powders functionalized with Pt and RuO2 particles, where photoexcited electrons are transferred to Pt (the reduction site) and holes to RuO2 (the oxidation site).[8] More recently, many colloidally synthesized nanometer-scale metal-semiconductor heterostructures have been reported.[7,9,10] A majority of these structures are made by thermal methods.[7,10] We have chosen to study photochemical formation of metal-semiconductor heterostructures. The detailed understanding of the mechanisms involved in photodeposition of metals on nanometer-scale semiconductors is necessary to enable a high degree of synthetic control. At the same time, because the results of metal deposition can be directly observed by electron microscopy, it can be used to understand how factors such as nanocrystal composition, shape, carrier dynamics, and surface chemistry influence the photochemical properties of semiconductor nanocrystals. In this communication, we report on the photodeposition of Pt on colloidal CdS and CdSe/CdS core/shell nanocrystals. Among the II-VI semiconductors, CdS is of particular interest because it has the correct band alignment for water photolysis[2] and has been demonstrated to be photocatalytically active.[11-16] We have found that the photoexcitation of CdS and CdSe/CdS in the presence of an organometallic Pt precursor leads to deposition of Pt nanoparticles on the semiconductor surface. Stark differences are observed in the Pt nanoparticle location on the two substrates, and the photodeposition can be completely inhibited by the modification of the semiconductor surface. Our results suggest that tuning of the semiconductor band structure, spatial organization and surface chemistry should be crucial in the design of photocatalytic nanostructures.

  19. Helicon wave excitation to produce energetic electrons for manufacturing semiconductors

    DOE Patents [OSTI]

    Molvik, Arthur W. (Livermore, CA); Ellingboe, Albert R. (Fremont, CA)

    1998-01-01T23:59:59.000Z

    A helicon plasma source is controlled by varying the axial magnetic field or rf power controlling the formation of the helicon wave. An energetic electron current is carried on the wave when the magnetic field is 90 G; but there is minimal energetic electron current when the magnetic field is 100 G in one particular plasma source. Similar performance can be expected from other helicon sources by properly adjusting the magnetic field and power to the particular geometry. This control for adjusting the production of energetic electrons can be used in the semiconductor and thin-film manufacture process. By applying energetic electrons to the insulator layer, such as silicon oxide, etching ions are attracted to the insulator layer and bombard the insulator layer at higher energy than areas that have not accumulated the energetic electrons. Thus, silicon and metal layers, which can neutralize the energetic electron currents will etch at a slower or non-existent rate. This procedure is especially advantageous in the multilayer semiconductor manufacturing because trenches can be formed that are in the range of 0.18-0.35 mm or less.

  20. Helicon wave excitation to produce energetic electrons for manufacturing semiconductors

    DOE Patents [OSTI]

    Molvik, A.W.; Ellingboe, A.R.

    1998-10-20T23:59:59.000Z

    A helicon plasma source is controlled by varying the axial magnetic field or rf power controlling the formation of the helicon wave. An energetic electron current is carried on the wave when the magnetic field is 90 G; but there is minimal energetic electron current when the magnetic field is 100 G in one particular plasma source. Similar performance can be expected from other helicon sources by properly adjusting the magnetic field and power to the particular geometry. This control for adjusting the production of energetic electrons can be used in the semiconductor and thin-film manufacture process. By applying energetic electrons to the insulator layer, such as silicon oxide, etching ions are attracted to the insulator layer and bombard the insulator layer at higher energy than areas that have not accumulated the energetic electrons. Thus, silicon and metal layers, which can neutralize the energetic electron currents will etch at a slower or non-existent rate. This procedure is especially advantageous in the multilayer semiconductor manufacturing because trenches can be formed that are in the range of 0.18--0.35 mm or less. 16 figs.

  1. Near-Infrared Photoluminescence Enhancement in Ge/CdS and Ge/ZnS Core/Shell Nanocrystals: Utilizing IV/II-VI Semiconductor Epitaxy

    SciTech Connect (OSTI)

    Guo, Yijun [Ames Laboratory; Rowland, Clare E [Argonne National Laboratory; Schaller, Richard D [Argonne National Laboratory; Vela, Javier [Ames Laboratory

    2014-08-26T23:59:59.000Z

    Ge nanocrystals have a large Bohr radius and a small, size-tunable band gap that may engender direct character via strain or doping. Colloidal Ge nanocrystals are particularly interesting in the development of near-infrared materials for applications in bioimaging, telecommunications and energy conversion. Epitaxial growth of a passivating shell is a common strategy employed in the synthesis of highly luminescent II–VI, III–V and IV–VI semiconductor quantum dots. Here, we use relatively unexplored IV/II–VI epitaxy as a way to enhance the photoluminescence and improve the optical stability of colloidal Ge nanocrystals. Selected on the basis of their relatively small lattice mismatch compared with crystalline Ge, we explore the growth of epitaxial CdS and ZnS shells using the successive ion layer adsorption and reaction method. Powder X-ray diffraction and electron microscopy techniques, including energy dispersive X-ray spectroscopy and selected area electron diffraction, clearly show the controllable growth of as many as 20 epitaxial monolayers of CdS atop Ge cores. In contrast, Ge etching and/or replacement by ZnS result in relatively small Ge/ZnS nanocrystals. The presence of an epitaxial II–VI shell greatly enhances the near-infrared photoluminescence and improves the photoluminescence stability of Ge. Ge/II–VI nanocrystals are reproducibly 1–3 orders of magnitude brighter than the brightest Ge cores. Ge/4.9CdS core/shells show the highest photoluminescence quantum yield and longest radiative recombination lifetime. Thiol ligand exchange easily results in near-infrared active, water-soluble Ge/II–VI nanocrystals. We expect this synthetic IV/II–VI epitaxial approach will lead to further studies into the optoelectronic behavior and practical applications of Si and Ge-based nanomaterials.

  2. Tuning the oxide/organic interface: Benzene on SnO2,,101... Matthias Batzill,a)

    E-Print Network [OSTI]

    Diebold, Ulrike

    Tuning the oxide/organic interface: Benzene on SnO2,,101... Matthias Batzill,a) Khabibulakh Katsiev,16 As a model molecule for simulating an organic semiconductor film benzene was chosen as a simple -conjugated

  3. Shockwave generation by a semiconductor bridge operation in water

    SciTech Connect (OSTI)

    Zvulun, E.; Toker, G.; Gurovich, V. Tz.; Krasik, Ya. E. [Physics Department, Technion, Haifa 32000 (Israel)

    2014-05-28T23:59:59.000Z

    A semiconductor bridge (SCB) is a silicon device, used in explosive systems as the electrical initiator element. In recent years, SCB plasma has been extensively studied, both electrically and using fast photography and spectroscopic imaging. However, the value of the pressure buildup at the bridge remains unknown. In this study, we operated SCB devices in water and, using shadow imaging and reference beam interferometry, obtained the velocity of the shock wave propagation and distribution of the density of water. These results, together with a self-similar hydrodynamic model, were used to calculate the pressure generated by the exploding SCB. In addition, the results obtained showed that the energy of the water flow exceeds significantly the energy deposited into the exploded SCB. The latter can be explained by the combustion of the aluminum and silicon atoms released in water, which acts as an oxidizing medium.

  4. Spin injection and manipulation in organic semiconductors

    E-Print Network [OSTI]

    Venkataraman, Karthik (Karthik Raman)

    2011-01-01T23:59:59.000Z

    The use of organic semiconductors to enable organic spintronic devices requires the understanding of transport and control of the spin state of the carriers. This thesis deals with the above issue, focusing on the interface ...

  5. Electrical Usage Characterization of Semiconductor Processing Tools

    E-Print Network [OSTI]

    Hinson, S. R.

    This paper presents the basic concepts in performing an energy and power audit of a semiconductor process tool. A protocol exists that fully describes these measurements and their use and applicability and it will be described. This protocol...

  6. Sandia National Laboratories: wide-bandgap semiconductor

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    electroluminescence was first reported by H.J. Round in 1907, and the first light-emitting diode (LED) was reported by O.V. Losev in 1927. Not until the birth of semiconductor...

  7. NANOSTRUCTURES, MAGNETIC SEMICONDUCTORS AND SPINELECTRONICS Paata Kervalishvili

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    to data storage, switching, lighting and other devices, can lead to substantially new hardwareNANOSTRUCTURES, MAGNETIC SEMICONDUCTORS AND SPINELECTRONICS Paata Kervalishvili Georgian Technical and manipulation on a nanometre scale, which allows the fabrication of nanostructures with the properties mainly

  8. Surface phonons of III-V semiconductors

    E-Print Network [OSTI]

    Das, Pradip Kumar

    1994-01-01T23:59:59.000Z

    are the simplest of all semiconductor surfaces. Their atomic relaxations and electronic surface states are rather well understood. There have, however, been surprisingly few experimental studies of their vibrational properties, and ours in the first detailed...

  9. Semiconductor-nanocrystal/conjugated polymer thin films

    DOE Patents [OSTI]

    Alivisatos, A. Paul (Oakland, CA); Dittmer, Janke J. (Munich, DE); Huynh, Wendy U. (Munich, DE); Milliron, Delia (Berkeley, CA)

    2010-08-17T23:59:59.000Z

    The invention described herein provides for thin films and methods of making comprising inorganic semiconductor-nanocrystals dispersed in semiconducting-polymers in high loading amounts. The invention also describes photovoltaic devices incorporating the thin films.

  10. EXCITONIC EIGENSTATES OF DISORDERED SEMICONDUCTOR QUANTUM WIRES

    E-Print Network [OSTI]

    of semiconductors are exploited in solar cells, light emitting diodes, and lasers, and, furthermore, future UNIVERSITY OF MINNESOTA 400 Lind Hall 207 Church Street S.E. Minneapolis, Minnesota 55455­0436 Phone: 612

  11. Nanopatterned Electrically Conductive Films of Semiconductor Nanocrystals

    E-Print Network [OSTI]

    Mentzel, Tamar

    We present the first semiconductor nanocrystal films of nanoscale dimensions that are electrically conductive and crack-free. These films make it possible to study the electrical properties intrinsic to the nanocrystals ...

  12. Fabrication of Semiconductors by Wet Chemical Etch

    E-Print Network [OSTI]

    Francoviglia, Laura

    2008-07-01T23:59:59.000Z

    - ern devices. Beginning with Bardeen, Brittain and Shockley’s invention of the transistor in Bell Labs in 1947 and Kilby and Noyce’s introduction of the integrated circuit about a decade later, semiconductor devices have dramat- ically advanced... ad- dition of impurities, their conductivity can be altered. With the need to manu- facture devices at the micro- and nano- scale, the semiconductor industry has followed “Moore’s Law,” the trend that the number of transistors placed...

  13. Optical temperature indicator using thermochromic semiconductors

    DOE Patents [OSTI]

    Kronberg, J.W.

    1995-01-01T23:59:59.000Z

    A reversible optical temperature indicator utilizes thermochromic semiconductors which vary in color in response to various temperature levels. The thermochromic material is enclosed in an enamel which provides protection and prevents breakdown at higher temperatures. Cadmium sulfide is the preferred semiconductor material. The indicator may be utilized as a sign or in a striped arrangement to clearly provide a warning to a user. The various color responses provide multiple levels of alarm.

  14. A Semiconductor Microlaser for Intracavity Flow Cytometry

    SciTech Connect (OSTI)

    Akhil, O.; Copeland, G.C.; Dunne, J.L.; Gourley, P.L.; Hendricks, J.K.; McDonald, A.E.

    1999-01-20T23:59:59.000Z

    Semiconductor microlasers are attractive components for micro-analysis systems because of their ability to emit coherent intense light from a small aperture. By using a surface-emitting semiconductor geometry, we were able to incorporate fluid flow inside a laser microcavity for the first time. This confers significant advantages for high throughput screening of cells, particulates and fluid analytes in a sensitive microdevice. In this paper we discuss the intracavity microfluidics and present preliminary results with flowing blood and brain cells.

  15. Optical devices featuring nonpolar textured semiconductor layers

    DOE Patents [OSTI]

    Moustakas, Theodore D; Moldawer, Adam; Bhattacharyya, Anirban; Abell, Joshua

    2013-11-26T23:59:59.000Z

    A semiconductor emitter, or precursor therefor, has a substrate and one or more textured semiconductor layers deposited onto the substrate in a nonpolar orientation. The textured layers enhance light extraction, and the use of nonpolar orientation greatly enhances internal quantum efficiency compared to conventional devices. Both the internal and external quantum efficiencies of emitters of the invention can be 70-80% or higher. The invention provides highly efficient light emitting diodes suitable for solid state lighting.

  16. Optical temperature indicator using thermochromic semiconductors

    DOE Patents [OSTI]

    Kronberg, James W. (108 Independent Blvd., Aiken, SC 29801)

    1996-01-01T23:59:59.000Z

    A reversible optical temperature indicator utilizes thermochromic semiconductors which vary in color in response to various temperature levels. The thermochromic material is enclosed in an enamel which provides protection and prevents breakdown at higher temperatures. Cadmium sulfide is the preferred semiconductor material. The indicator may be utilized as a sign or in a striped arrangement to clearly provide a warning to a user. The various color responses provide multiple levels of alarm.

  17. Ultrafast Control of Magnetism in Ferromagnetic Semiconductors via Photoexcited Transient Carriers

    E-Print Network [OSTI]

    Cotoros, Ingrid A.

    2009-01-01T23:59:59.000Z

    1.2 Overview of semiconductor2.2 Dilute magnetic semiconductors . . . . . . . . .generated holes in (In,Mn)As Magnetic semiconductor FET

  18. Electron gas grid semiconductor radiation detectors

    DOE Patents [OSTI]

    Lee, Edwin Y. (Livermore, CA); James, Ralph B. (Livermore, CA)

    2002-01-01T23:59:59.000Z

    An electron gas grid semiconductor radiation detector (EGGSRAD) useful for gamma-ray and x-ray spectrometers and imaging systems is described. The radiation detector employs doping of the semiconductor and variation of the semiconductor detector material to form a two-dimensional electron gas, and to allow transistor action within the detector. This radiation detector provides superior energy resolution and radiation detection sensitivity over the conventional semiconductor radiation detector and the "electron-only" semiconductor radiation detectors which utilize a grid electrode near the anode. In a first embodiment, the EGGSRAD incorporates delta-doped layers adjacent the anode which produce an internal free electron grid well to which an external grid electrode can be attached. In a second embodiment, a quantum well is formed between two of the delta-doped layers, and the quantum well forms the internal free electron gas grid to which an external grid electrode can be attached. Two other embodiments which are similar to the first and second embodiment involve a graded bandgap formed by changing the composition of the semiconductor material near the first and last of the delta-doped layers to increase or decrease the conduction band energy adjacent to the delta-doped layers.

  19. Spin Transport in Semiconductor heterostructures

    SciTech Connect (OSTI)

    Domnita Catalina Marinescu

    2011-02-22T23:59:59.000Z

    The focus of the research performed under this grant has been the investigation of spin transport in magnetic semiconductor heterostructures. The interest in these systems is motivated both by their intriguing physical properties, as the physical embodiment of a spin-polarized Fermi liquid, as well as by their potential applications as spintronics devices. In our work we have analyzed several different problems that affect the spin dynamics in single and bi-layer spin-polarized two-dimensional (2D) systems. The topics of interests ranged from the fundamental aspects of the electron-electron interactions, to collective spin and charge density excitations and spin transport in the presence of the spin-orbit coupling. The common denominator of these subjects is the impact at the macroscopic scale of the spin-dependent electron-electron interaction, which plays a much more subtle role than in unpolarized electron systems. Our calculations of several measurable parameters, such as the excitation frequencies of magneto-plasma modes, the spin mass, and the spin transresistivity, propose realistic theoretical estimates of the opposite-spin many-body effects, in particular opposite-spin correlations, that can be directly connected with experimental measurements.

  20. Dissipative chaos in semiconductor superlattices

    SciTech Connect (OSTI)

    Alekseev, K.N.; Berman, G.P. [Center for Nonlinear Studies and Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)] [Center for Nonlinear Studies and Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States); [Kirensky Institute of Physics, 660036, Krasnoyarsk (Russia); [Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801-3080 (United States); Campbell, D.K.; Cannon, E.H.; Cargo, M.C. [Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801-3080 (United States)] [Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801-3080 (United States)

    1996-10-01T23:59:59.000Z

    We consider the motion of ballistic electrons in a miniband of a semiconductor superlattice (SSL) under the influence of an external, time-periodic electric field. We use a semiclassical, balance-equation approach, which incorporates elastic and inelastic scattering (as dissipation) and the self-consistent field generated by the electron motion. The coupling of electrons in the miniband to the self-consistent field produces a cooperative nonlinear oscillatory mode which, when interacting with the oscillatory external field and the intrinsic Bloch-type oscillatory mode, can lead to complicated dynamics, including dissipative chaos. For a range of values of the dissipation parameters we determine the regions in the amplitude-frequency plane of the external field in which chaos can occur. Our results suggest that for terahertz external fields of the amplitudes achieved by present-day free-electron lasers, chaos may be observable in SSL{close_quote}s. We clarify the nature of this interesting nonlinear dynamics in the superlattice{endash}external-field system by exploring analogies to the Dicke model of an ensemble of two-level atoms coupled with a resonant cavity field, and to Josephson junctions. {copyright} {ital 1996 The American Physical Society.}

  1. Molecular dynamics simulation comparison of atomic scale intermixing at the amorphous Al2O3/semiconductor interface for a-Al2O3/Ge, a-Al2O3/InGaAs,

    E-Print Network [OSTI]

    Kummel, Andrew C.

    /semiconductor interface for a-Al2O3/Ge, a-Al2O3/InGaAs, and a-Al2O3/InAlAs/InGaAs Evgueni A. Chagarov *, Andrew oxides Ge InGaAs InAlAs Oxide­semiconductor stack High-K oxide a b s t r a c t The structural properties of a-Al2O3/Ge, a-Al2O3/In0.5Ga0.5As and a-Al2O3/In0.5Al0.5As/InGaAs interfaces were investigated

  2. Method for removing semiconductor layers from salt substrates

    DOE Patents [OSTI]

    Shuskus, Alexander J. (West Hartford, CT); Cowher, Melvyn E. (East Brookfield, MA)

    1985-08-27T23:59:59.000Z

    A method is described for removing a CVD semiconductor layer from an alkali halide salt substrate following the deposition of the semiconductor layer. The semiconductor-substrate combination is supported on a material such as tungsten which is readily wet by the molten alkali halide. The temperature of the semiconductor-substrate combination is raised to a temperature greater than the melting temperature of the substrate but less than the temperature of the semiconductor and the substrate is melted and removed from the semiconductor by capillary action of the wettable support.

  3. Extracting hot carriers from photoexcited semiconductor nanocrystals

    SciTech Connect (OSTI)

    Zhu, Xiaoyang

    2014-12-10T23:59:59.000Z

    This research program addresses a fundamental question related to the use of nanomaterials in solar energy -- namely, whether semiconductor nanocrystals (NCs) can help surpass the efficiency limits, the so-called “Shockley-Queisser” limit, in conventional solar cells. In these cells, absorption of photons with energies above the semiconductor bandgap generates “hot” charge carriers that quickly “cool” to the band edges before they can be utilized to do work; this sets the solar cell efficiency at a limit of ~31%. If instead, all of the energy of the hot carriers could be captured, solar-to-electric power conversion efficiencies could be increased, theoretically, to as high as 66%. A potential route to capture this energy is to utilize semiconductor nanocrystals. In these materials, the quasi-continuous conduction and valence bands of the bulk semiconductor become discretized due to confinement of the charge carriers. Consequently, the energy spacing between the electronic levels can be much larger than the highest phonon frequency of the lattice, creating a “phonon bottleneck” wherein hot-carrier relaxation is possible via slower multiphonon emission. For example, hot-electron lifetimes as long as ~1 ns have been observed in NCs grown by molecular beam epitaxy. In colloidal NCs, long lifetimes have been demonstrated through careful design of the nanocrystal interfaces. Due to their ability to slow electronic relaxation, semiconductor NCs can in principle enable extraction of hot carriers before they cool to the band edges, leading to more efficient solar cells.

  4. Light sources based on semiconductor current filaments

    DOE Patents [OSTI]

    Zutavern, Fred J. (Albuquerque, NM); Loubriel, Guillermo M. (Albuquerque, NM); Buttram, Malcolm T. (Sandia Park, NM); Mar, Alan (Albuquerque, NM); Helgeson, Wesley D. (Albuquerque, NM); O'Malley, Martin W. (Edgewood, NM); Hjalmarson, Harold P. (Albuquerque, NM); Baca, Albert G. (Albuquerque, NM); Chow, Weng W. (Cedar Crest, NM); Vawter, G. Allen (Albuquerque, NM)

    2003-01-01T23:59:59.000Z

    The present invention provides a new type of semiconductor light source that can produce a high peak power output and is not injection, e-beam, or optically pumped. The present invention is capable of producing high quality coherent or incoherent optical emission. The present invention is based on current filaments, unlike conventional semiconductor lasers that are based on p-n junctions. The present invention provides a light source formed by an electron-hole plasma inside a current filament. The electron-hole plasma can be several hundred microns in diameter and several centimeters long. A current filament can be initiated optically or with an e-beam, but can be pumped electrically across a large insulating region. A current filament can be produced in high gain photoconductive semiconductor switches. The light source provided by the present invention has a potentially large volume and therefore a potentially large energy per pulse or peak power available from a single (coherent) semiconductor laser. Like other semiconductor lasers, these light sources will emit radiation at the wavelength near the bandgap energy (for GaAs 875 nm or near infra red). Immediate potential applications of the present invention include high energy, short pulse, compact, low cost lasers and other incoherent light sources.

  5. Optical spin orientation of a single manganese atom in a semiconductor quantum dot using quasi-resonant excitation

    E-Print Network [OSTI]

    Boyer, Edmond

    of these mem- ories. Dilute magnetic semiconductors (DMS) systems combining semiconductor heterostructures

  6. Antiferromagnetic exchange bias of a ferromagnetic semiconductor by a ferromagnetic metal

    E-Print Network [OSTI]

    Olejnik, K.

    2010-01-01T23:59:59.000Z

    exchange bias of a magnetic semiconductor by a magneticexchange bias in the magnetic semiconductor. The shape and

  7. Semiconductor nanowires for future electronics : growth, characterization, device fabrication, and integration

    E-Print Network [OSTI]

    Dayeh, Shadi A.

    2008-01-01T23:59:59.000Z

    1 1.1 Introduction to Semiconductorin InAs Semiconductor Nanowires. . . . . . . . . . . . .Comparison of different semiconductor NWFETs (non-passivated

  8. Semiconductor electrochemistry of coal pyrite. Technical progress report, October--December 1993

    SciTech Connect (OSTI)

    Osseo-Asare, K.; Wei, D.

    1994-03-01T23:59:59.000Z

    The effects of the semiconductor properties of pyrite on its electrochemical behavior have been explored with the aid of energy level diagram which illustrate the relationship between the energy levels of the solid land the equilibrium potentials of the redox couples in the aqueous solution. A novel approach to the study of pyrite electrochemistry was initiated. This approach is based on pyrite microelectrodes synthesized via aqueous phase precipitation. Preliminary results show that photocurrents can be generated by illumination of the pyrite particles synthesized in our laboratory. Central to this research is the recognition that pyrite is a semiconductor material. (Photo) electrochemical experiments are conducted to unravel the mechanisms of anodic and cathodic processes such as those associated with pyrite decomposition and the reduction of oxidants such as molecular oxygen and the ferric ion.

  9. Using a Semiconductor-to-Metal Transition to Control Optical Transmission through Subwavelength Hole Arrays

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Donev, E. U.; Suh, J. Y.; Lopez, R.; Feldman, L. C.; Haglund, R. F.

    2008-01-01T23:59:59.000Z

    We describe a simple configuration in which the extraordinary optical transmission effect through subwavelength hole arrays in noble-metal films can be switched by the semiconductor-to-metal transition in an underlying thin film of vanadium dioxide. In these experiments, the transition is brought about by thermal heating of the bilayer film. The surprising reverse hysteretic behavior of the transmission through the subwavelength holes in the vanadium oxide suggest that this modulation is accomplished by a dielectric-matching condition rather than plasmon coupling through the bilayer film. The results of this switching, including the wavelength dependence, are qualitatively reproduced by a transfer matrix model.more »The prospects for effecting a similar modulation on a much faster time scale by using ultrafast laser pulses to trigger the semiconductor-to-metal transition are also discussed.« less

  10. Substrate solder barriers for semiconductor epilayer growth

    DOE Patents [OSTI]

    Drummond, T.J.; Ginley, D.S.; Zipperian, T.E.

    1987-10-23T23:59:59.000Z

    During the growth of compound semiconductors by epitaxial processes, substrates are typically mounted to a support. In molecular beam epitaxy, mounting is done using indium as a solder. This method has two drawbacks: the indium reacts with the substrate, and it is difficult to uniformly wet the back of a large diameter substrate. Both of these problems have been successfully overcome by sputter coating the back of the substrate with a thin layer of tungsten carbide or tungsten carbide and gold. In addition to being compatible with the growth of high quality semiconductor epilayers this coating is also inert in all standard substate cleaning etchants used for compound semiconductors, and provides uniform distribution of energy in radiant heating. 1 tab.

  11. Substrate solder barriers for semiconductor epilayer growth

    DOE Patents [OSTI]

    Drummond, Timothy J. (Tijeras, NM); Ginley, David S. (Albuquerque, NM); Zipperian, Thomas E. (Albuquerque, NM)

    1989-01-01T23:59:59.000Z

    During the growth of compound semiconductors by epitaxial processes, substrates are typically mounted to a support. In modular beam epitaxy, mounting is done using indium as a solder. This method has two drawbacks: the indium reacts with the substrate, and it is difficult to uniformly wet the back of a large diameter substrate. Both of these problems have been successfully overcome by sputter coating the back of the substrate with a thin layer of tungsten carbide or tungsten carbide and gold. In addition to being compatible with the growth of high quality semiconductor epilayers this coating is also inert in all standard substrate cleaning etchants used for compound semiconductors, and provides uniform distribution of energy in radiant heating.

  12. Substrate solder barriers for semiconductor epilayer growth

    DOE Patents [OSTI]

    Drummond, T.J.; Ginley, D.S.; Zipperian, T.E.

    1989-05-09T23:59:59.000Z

    During the growth of compound semiconductors by epitaxial processes, substrates are typically mounted to a support. In modular beam epitaxy, mounting is done using indium as a solder. This method has two drawbacks: the indium reacts with the substrate, and it is difficult to uniformly wet the back of a large diameter substrate. Both of these problems have been successfully overcome by sputter coating the back of the substrate with a thin layer of tungsten carbide or tungsten carbide and gold. In addition to being compatible with the growth of high quality semiconductor epilayers this coating is also inert in all standard substrate cleaning etchants used for compound semiconductors, and provides uniform distribution of energy in radiant heating.

  13. Codoped direct-gap semiconductor scintillators

    DOE Patents [OSTI]

    Derenzo, Stephen Edward (Pinole, CA); Bourret-Courchesne, Edith (Berkeley, CA); Weber, Marvin J. (Danville, CA); Klintenberg, Mattias K. (Berkeley, CA)

    2008-07-29T23:59:59.000Z

    Fast, bright inorganic scintillators at room temperature are based on radiative electron-hole recombination in direct-gap semiconductors, e.g. CdS and ZnO. The direct-gap semiconductor is codoped with two different impurity atoms to convert the semiconductor to a fast, high luminosity scintillator. The codopant scheme is based on dopant band to dopant trap recombination. One dopant provides a significant concentration of carriers of one type (electrons or holes) and the other dopant traps carriers of the other type. Examples include CdS:In,Te; CdS:In,Ag; CdS:In,Na; ZnO:Ga,P; ZnO:Ga,N; ZnO:Ga,S; and GaN:Ge,Mg.

  14. Two-Photon Emission from Semiconductors

    E-Print Network [OSTI]

    Alex Hayat; Pavel Ginzburg; Meir Orenstein

    2007-10-25T23:59:59.000Z

    We report the first experimental observations of two-photon emission from semiconductors, to the best of our knowledge, and develop a corresponding theory for the room-temperature process. Spontaneous two-photon emission is demonstrated in optically-pumped bulk GaAs and in electrically-driven GaInP/AlGaInP quantum wells. Singly-stimulated two-photon emission measurements demonstrate the theoretically predicted two-photon optical gain in semiconductors - a necessary ingredient for any realizations of future two-photon semiconductor lasers. Photon-coincidence experiment validates the simultaneity of the electrically-driven GaInP/AlGaInP two-photon emission, limited only by detector's temporal resolution.

  15. Codoped direct-gap semiconductor scintillators

    DOE Patents [OSTI]

    Derenzo, Stephen E.; Bourret-Courchesne, Edith; Weber, Marvin J.; Klintenberg, Mattias K.

    2006-05-23T23:59:59.000Z

    Fast, bright inorganic scintillators at room temperature are based on radiative electron-hole recombination in direct-gap semiconductors, e.g. CdS and ZnO. The direct-gap semiconductor is codoped with two different impurity atoms to convert the semiconductor to a fast, high luminosity scintillator. The codopant scheme is based on dopant band to dopant trap recombination. One dopant provides a significant concentration of carriers of one type (electrons or holes) and the other dopant traps carriers of the other type. Examples include CdS:In,Te; CdS:In,Ag; CdS:In,Na; ZnO:Ga,P; ZnO:Ga,N; ZnO:Ga,S; and GaN:Ge,Mg.

  16. Electroluminescence in ion gel gated organic polymer semiconductor transistors

    E-Print Network [OSTI]

    Bhat, Shrivalli

    2011-07-12T23:59:59.000Z

    This thesis reports the light emission in ion gel gated, thin film organic semiconductor transistors and investigates the light emission mechanism behind these devices. We report that ion gel gated organic polymer semiconductor transistors emit...

  17. Radio frequency identification (RFID) applications in semiconductor manufacturing

    E-Print Network [OSTI]

    Cassett, David Ian, 1971-

    2004-01-01T23:59:59.000Z

    Radio frequency identification (RFID) has an enormous potential impact within the semiconductor supply chain, especially within semiconductor manufacturing. The end benefit of RFID will be in the mass serialization, and ...

  18. A New Cleanroom for a Next-Generation Semiconductor Research...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    A New Cleanroom for a Next-Generation Semiconductor Research Tool A New Cleanroom for a Next-Generation Semiconductor Research Tool Print The new Sector 12 cleanroom under...

  19. A study of corporate entrepreneurship in the semiconductor industry

    E-Print Network [OSTI]

    Tallapureddy, Anish R

    2014-01-01T23:59:59.000Z

    The number of semiconductor companies receiving venture funding has been decreasing through-out the last decade. The economics of manufacturing semiconductors do not offer an attractive risk-reward profile to the traditional ...

  20. Course Information --EE 531 Semiconductor Devices and Device Simulation

    E-Print Network [OSTI]

    Hochberg, Michael

    of Semiconductor Devices" by Hess "Si Processing for the VLSI Era: Vol. 3-- The Submicron MOSFET" by Wolf "Advanced: 20% Exam 1: 30% Exam 2: 30% Project: 20% Prerequisite: Semiconductor Devices (EE 482) or equivalent

  1. High-Throughput Transfer Imprinting for Organic Semiconductors

    E-Print Network [OSTI]

    Choo, Gihoon

    2013-08-06T23:59:59.000Z

    semiconductors because heat and pressure used in thermal nanoimprint do not damage functional materials. However, issues such as residual layer removal and mold contamination still limit the application of nanoimprint for organic semiconductor patterning...

  2. Surface passivation process of compound semiconductor material using UV photosulfidation

    DOE Patents [OSTI]

    Ashby, Carol I. H. (Edgewood, NM)

    1995-01-01T23:59:59.000Z

    A method for passivating compound semiconductor surfaces by photolytically disrupting molecular sulfur vapor with ultraviolet radiation to form reactive sulfur which then reacts with and passivates the surface of compound semiconductors.

  3. Acoustoelectric Harmonic Generation in a Photoconductive Piezoelectric Semiconductor

    E-Print Network [OSTI]

    Acoustoelectric Harmonic Generation in a Photoconductive Piezoelectric Semiconductor W. Arthur, R harmonics in the low frequency regime (. Piezoelectric semiconductors can exhibit harmonic generation because of interactions between the acoustic

  4. Blasting detonators incorporating semiconductor bridge technology

    SciTech Connect (OSTI)

    Bickes, R.W. Jr.

    1994-05-01T23:59:59.000Z

    The enormity of the coal mine and extraction industries in Russia and the obvious need in both Russia and the US for cost savings and enhanced safety in those industries suggests that joint studies and research would be of mutual benefit. The author suggests that mine sites and well platforms in Russia offer an excellent opportunity for the testing of Sandia`s precise time-delay semiconductor bridge detonators, with the potential for commercialization of the detonators for Russian and other world markets by both US and Russian companies. Sandia`s semiconductor bridge is generating interest among the blasting, mining and perforation industries. The semiconductor bridge is approximately 100 microns long, 380 microns wide and 2 microns thick. The input energy required for semiconductor bridge ignition is one-tenth the energy required for conventional bridgewire devices. Because semiconductor bridge processing is compatible with other microcircuit processing, timing and logic circuits can be incorporated onto the chip with the bridge. These circuits can provide for the precise timing demanded for cast effecting blasting. Indeed tests by Martin Marietta and computer studies by Sandia have shown that such precise timing provides for more uniform rock fragmentation, less fly rock, reduce4d ground shock, fewer ground contaminants and less dust. Cost studies have revealed that the use of precisely timed semiconductor bridges can provide a savings of $200,000 per site per year. In addition to Russia`s vast mineral resources, the Russian Mining Institute outside Moscow has had significant programs in rock fragmentation for many years. He anticipated that collaborative studies by the Institute and Sandia`s modellers would be a valuable resource for field studies.

  5. Detection of DNA Hybridization Using the Near-Infrared Band-Gap

    E-Print Network [OSTI]

    Allen, Jont

    shift of 2 meV, with a detection sensitivity of 6 nM. The energy shift is modeled by correlating in the solution- based systems, is advantageous due to the sensitivity and selectivity of the technique.14 absorption of blood and tissue17-19 and the low auto- fluorescence of cells20 in the nIR. Furthermore, SWNTs

  6. PHYSICAL REVIEW B 84, 155438 (2011) Tunable graphene band gaps from superstrate-mediated interactions

    E-Print Network [OSTI]

    Hague, Jim

    2011-01-01T23:59:59.000Z

    , and photovoltaics through the relatively simple application of polarizable materials such as SiO2 and Si3N4. DOI: 10, light-emitting diodes (LEDs), photovoltaics, heterojunctions, and photodetectors. Here, I investigate gap-enhancement effects due to inter- actions mediated through superstrates placed on graphene systems

  7. Alternative Wide-Band-Gap Materials for Gamma-Ray Spectroscopy

    E-Print Network [OSTI]

    He, Zhong

    Engineering and Radiological Sciences) in The University of Michigan 2013 Doctoral Committee: Professor Zhong emotionally, physically, spiritually, and intellectually through every moment of my graduate school career, the Orion group would not be successful without the great work of his graduate students. It has been a truly

  8. Tunable micro-cavities in photonic band-gap yarns and optical fibers

    E-Print Network [OSTI]

    Benoit, Gilles, Ph. D. Massachusetts Institute of Technology

    2006-01-01T23:59:59.000Z

    The vision behind this work is the fabrication of high performance innovative fiber-based optical components over kilometer length-scales. The optical properties of these fibers derive from their multilayer dielectric ...

  9. Partial frequency band gap in one-dimensional magnonic crystals M. Kostylev,1,a

    E-Print Network [OSTI]

    Adeyeye, Adekunle

    approach. It is shown that, due to the one-dimensional artificial periodicity of the medium, the gaps with the artificial spatial periodicity of the structure. In this work, by measuring the frequencies of collective on a silicon substrate using deep ultraviolet lithography with 248 nm exposure wavelength followed by a lift

  10. Novel wide band gap materials for highly efficient thin film tandem solar cells

    SciTech Connect (OSTI)

    Brian E. Hardin, Stephen T. Connor, Craig H. Peters

    2012-06-11T23:59:59.000Z

    Tandem solar cells (TSCs), which use two or more materials to absorb sunlight, have achieved power conversion efficiencies of >25% versus 11-20% for commercialized single junction solar cell modules. The key to widespread commercialization of TSCs is to develop the wide-band, top solar cell that is both cheap to fabricate and has a high open-circuit voltage (i.e. >1V). Previous work in TSCs has generally focused on using expensive processing techniques with slow growth rates resulting in costs that are two orders of magnitude too expensive to be used in conventional solar cell modules. The objective of the PLANT PV proposal was to investigate the feasibility of using Ag(In,Ga)Se2 (AIGS) as the wide-bandgap absorber in the top cell of a thin film tandem solar cell (TSC). Despite being studied by very few in the solar community, AIGS solar cells have achieved one of the highest open-circuit voltages within the chalcogenide material family with a Voc of 949mV when grown with an expensive processing technique (i.e. Molecular Beam Epitaxy). PLANT PV�s goal in Phase I of the DOE SBIR was to 1) develop the chemistry to grow AIGS thin films via solution processing techniques to reduce costs and 2) fabricate new device architectures with high open-circuit voltage to produce full tandem solar cells in Phase II. PLANT PV attempted to translate solution processing chemistries that were successful in producing >12% efficient Cu(In,Ga)Se2 solar cells by replacing copper compounds with silver. The main thrust of the research was to determine if it was possible to make high quality AIGS thin films using solution processing and to fully characterize the materials properties. PLANT PV developed several different types of silver compounds in an attempt to fabricate high quality thin films from solution. We found that silver compounds that were similar to the copper based system did not result in high quality thin films. PLANT PV was able to deposit AIGS thin films using a mixture of solution and physical vapor deposition processing, but these films lacked the p-type doping levels that are required to make decent solar cells. Over the course of the project PLANT PV was able to fabricate efficient CIGS solar cells (8.7%) but could not achieve equivalent performance using AIGS. During the nine-month grant PLANT PV set up a variety of thin film characterization tools (e.g. drive-level capacitance profiling) at the Molecular Foundry, a Department of Energy User Facility, that are now available to both industrial and academic researchers via the grant process. PLANT PV was also able to develop the back end processing of thin film solar cells at Lawrence Berkeley National Labs to achieve 8.7% efficient CIGS solar cells. This processing development will be applied to other types of thin film PV cells at the Lawrence Berkeley National Labs. While PLANT PV was able to study AIGS film growth and optoelectronic properties we concluded that AIGS produced using these methods would have a limited efficiency and would not be commercially feasible. PLANT PV did not apply for the Phase II of this grant.

  11. A Novel Synthesis Method for Designing Electromagnetic Band Gap (EBG) Structures in Packaged Mixed Signal Systems

    E-Print Network [OSTI]

    Swaminathan, Madhavan

    on a periodically patterned power/ground plane. CPA-Method gives a final dimension of EBG structure for a desired. PLM calculates isolation level of an EBG structure based on the transmitted power. The proposed's mixed-signal systems are very sensitive to power/ground noise. For high-speed systems, it has been

  12. Photonic band gap of a graphene-embedded quarter-wave stack

    SciTech Connect (OSTI)

    Fan, Yuancheng [Ames Laboratory; Wei, Zeyong [Tongji University; Li, Hongqiang [Tongji University; Chen, Hong [Tongji University; Soukoulis, Costas M [Ames Laboratory

    2013-12-10T23:59:59.000Z

    Here, we present a mechanism for tailoring the photonic band structure of a quarter-wave stack without changing its physical periods by embedding conductive sheets. Graphene is utilized and studied as a realistic, two-dimensional conductive sheet. In a graphene-embedded quarter-wave stack, the synergic actions of Bragg scattering and graphene conductance contributions open photonic gaps at the center of the reduced Brillouin zone that are nonexistent in conventional quarter-wave stacks. Such photonic gaps show giant, loss-independent density of optical states at the fixed lower-gap edges, of even-multiple characteristic frequency of the quarter-wave stack. The conductive sheet-induced photonic gaps provide a platform for the enhancement of light-matter interactions.

  13. Control of ionization processes in high band gap materials via tailored

    E-Print Network [OSTI]

    Kassel, Universität

    on Ultrafast Electron Dynamics in Femtosecond Optical Breakdown of Dielectrics," Phys. Rev. Lett. 83, 5182­5182

  14. Final Report: Laser-Material Interactions Relevant to Analytic Spectroscopy of Wide Band Gap Materials

    SciTech Connect (OSTI)

    Dickinson, J. T. [Washington State University] [Washington State University

    2014-04-05T23:59:59.000Z

    We summarize our studies aimed at developing an understanding of the underlying physics and chemistry in terms of laser materials interactions relevant to laser-based sampling and chemical analysis of wide bandgap materials. This work focused on the determination of mechanisms for the emission of electrons, ions, atoms, and molecules from laser irradiation of surfaces. We determined the important role of defects on these emissions, the thermal, chemical, and physical interactions responsible for matrix effects and mass-dependent transport/detection. This work supported development of new techniques and technology for the determination of trace elements contained such as nuclear waste materials.

  15. Bispyridinium-phenylene-based copolymers: low band gap n-type alternating copolymers

    E-Print Network [OSTI]

    Swager, Timothy Manning

    Bispyridinium-phenylene-based conjugated donor–acceptor copolymers were synthesized by a Stille cross-coupling and cyclization sequence. These polyelectrolytes are freely soluble in organic solvents and display broad optical ...

  16. Comment on "Direct space-time observation of pulse tunneling in an electromagnetic band gap"

    E-Print Network [OSTI]

    G. Nimtz; A. A. Stahlhofen

    2008-01-13T23:59:59.000Z

    The investigation presented by Doiron, Hache, and Winful [Phys. Rev. A 76, 023823 (2007)] is not valid for the tunneling process as claimed in the paper.

  17. Second harmonic generation from direct band gap quantum dots pumped by femtosecond laser pulses

    SciTech Connect (OSTI)

    Liu, Liwei, E-mail: liulw@cust.edu.cn; Wang, Yue; Hu, Siyi; Ren, Yu; Huang, Chen [School of Science, Changchun University of Science and Technology, Changchun, Jilin 130022, People's Republic of China and International Joint Research Center for Nanophotonics and Biophotonics, Changchun University of Science and Technology, Changchun, Jilin 130022 (China)

    2014-02-21T23:59:59.000Z

    We report on nonlinear optical experiments performed on Cu{sub 2}S quantum dots (QDs) pumped by femtosecond laser pulses. We conduct a theoretical simulation and experiments to determine their second harmonic generation characteristics. Furthermore, we demonstrate that the QDs have a second harmonic generation conversion efficiency of up to 76%. Our studies suggest that these Cu{sub 2}S QDs can be used for solar cells, bioimaging, biosensing, and electric detection.

  18. InAlAs EPITAXIAL GROWTH FOR WIDE BAND GAP SOLAR CELLS Marina S. Leite

    E-Print Network [OSTI]

    Atwater, Harry

    concentrator cells made of metamorphic InGaP/GaAs/InGaAs can achieve > 41 % by using metamorphic epitaxial

  19. Final Report: Tunable Narrow Band Gap Absorbers For Ultra High Efficiency Solar Cells

    SciTech Connect (OSTI)

    Bedair, Salah M. [NCSU; Hauser, John R. [NCSU; Elmasry, Nadia [NCSU; Colter, Peter C. [NCSU; Bradshaw, G. [NCSU; Carlin, C. Z. [NCSU; Samberg, J. [NCSU; Edmonson, Kenneth [Spectrolab

    2012-07-31T23:59:59.000Z

    We report on a joint research program between NCSU and Spectrolab to develop an upright multijunction solar cell structure with a potential efficiency exceeding the current record of 41.6% reported by Spectrolab. The record efficiency Ge/GaAs/InGaP triple junction cell structure is handicapped by the fact that the current generated by the Ge cell is much higher than that of both the middle and top cells. We carried out a modification of the record cell structure that will keep the lattice matched condition and allow better matching of the current generated by each cell. We used the concept of strain balanced strained layer superlattices (SLS), inserted in the i-layer, to reduce the bandgap of the middle cell without violating the desirable lattice matched condition. For the middle GaAs cell, we have demonstrated an n-GaAs/i-(InGaAs/GaAsP)/p-GaAs structure, where the InxGa1-xAs/GaAs1-yPy SLS is grown lattice matched to GaAs and with reduced bandgap from 1.43 eV to 1.2 eV, depending upon the values of x and y.

  20. Nature of the Band Gap and Origin of the Electro-/Photo-Activity...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    oxidematerials in photocatalysis and solar applications. Citation: Qiao L, HY Xiao, HM Meyer, JN Sun, CM Rouleau, AA Puretzky, DB Geohegan, IN Ivanov, M Yoon, WJ Weber, and MD...

  1. Dry etching method for compound semiconductors

    DOE Patents [OSTI]

    Shul, R.J.; Constantine, C.

    1997-04-29T23:59:59.000Z

    A dry etching method is disclosed. According to the present invention, a gaseous plasma comprising, at least in part, boron trichloride, methane, and hydrogen may be used for dry etching of a compound semiconductor material containing layers including aluminum, or indium, or both. Material layers of a compound semiconductor alloy such as AlGaInP or the like may be anisotropically etched for forming electronic devices including field-effect transistors and heterojunction bipolar transistors and for forming photonic devices including vertical-cavity surface-emitting lasers, edge-emitting lasers, and reflectance modulators. 1 fig.

  2. High power semiconductor laser sources. Final report

    SciTech Connect (OSTI)

    Yariv, A.

    1989-01-01T23:59:59.000Z

    The main purpose of the research was to design and fabricate a surface-emitting semiconductor laser based on multi quantum-well amplification. During the contract period, the author succeeded in improving the basic quantum-well active medium so as to result in maximum gain for a given inversion density and analyzed the fabrication of GaAs/GaAlAs multilayer dielectric reflectors for providing the optical feedback to the surface-emitting semiconductor laser. He also made significant progress in the development of diffusion techniques to provide the p and n regions adjacent to the active region for carrier injection.

  3. Dry etching method for compound semiconductors

    DOE Patents [OSTI]

    Shul, Randy J. (Albuquerque, NM); Constantine, Christopher (Safety Harbor, FL)

    1997-01-01T23:59:59.000Z

    A dry etching method. According to the present invention, a gaseous plasma comprising, at least in part, boron trichloride, methane, and hydrogen may be used for dry etching of a compound semiconductor material containing layers including aluminum, or indium, or both. Material layers of a compound semiconductor alloy such as AlGaInP or the like may be anisotropically etched for forming electronic devices including field-effect transistors and heterojunction bipolar transistors and for forming photonic devices including vertical-cavity surface-emitting lasers, edge-emitting lasers, and reflectance modulators.

  4. Semiconductor liquid crystal composition and methods for making the same

    DOE Patents [OSTI]

    Alivisatos, A. Paul; Li, Liang-shi

    2005-04-26T23:59:59.000Z

    Semiconductor liquid crystal compositions and methods for making such compositions are disclosed. One embodiment of the invention is directed to a liquid crystal composition including a solvent and semiconductor particles in the solvent. The solvent and the semiconductor particles are in an effective amount in the liquid crystal composition to form a liquid crystal phase.

  5. Quantum of optical absorption in two-dimensional semiconductors

    E-Print Network [OSTI]

    California at Irvine, University of

    Quantum of optical absorption in two-dimensional semiconductors Hui Fanga,b,c , Hans A. Bechteld semiconductor, where is the fine structure con- stant and nc is an optical local field correction factor quantitative examination of the intrinsic absorption properties of free-standing 2D semiconductor thin films

  6. Effects of Quantum Confinement on the Doping Limit of Semiconductor

    E-Print Network [OSTI]

    Wu, Junqiao

    Effects of Quantum Confinement on the Doping Limit of Semiconductor Nanowires D. R. Khanal,, Joanne concentrations in semiconductor nanowires. Our calculations are based on the amphoteric defect model, which describes the thermodynamic doping limit in semiconductors in terms of the compensation of external dopants

  7. Defects activated photoluminescence in two-dimensional semiconductors

    E-Print Network [OSTI]

    Wu, Junqiao

    Defects activated photoluminescence in two-dimensional semiconductors: interplay between bound of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, People's Republic of China, 3, Berkeley, California 94720, United States. Point defects in semiconductors can trap free charge carriers

  8. Effect of interfacial oxide layers on the current-voltage characteristics of Al-Si contacts 

    E-Print Network [OSTI]

    Nishizono, Taira

    1976-01-01T23:59:59.000Z

    etched using a photolithographic technique. Aluminum was evaporated on the wafers, making the silicon surfaces highly reflective, and a Varian k ? Scope Interferometer was used. The microscopic view through the interferometer, simulated in Fig. 3. 1...-insulator-semiconductor 9 contact. 3 ' 1 Oxide thickness measurement. 0 3. 2 Growth of oxide film ( ? 400A) on silicon. Growth of oxide film ( 200)() on silicon. 3. 4 MOS capacitance structure. 3 ' 5 Capacitance ? voltage curves on MOS. 3. 6 Simplified schematic of C...

  9. Analog Sauter-Schwinger effect in semiconductors

    E-Print Network [OSTI]

    Linder, Malte F

    2015-01-01T23:59:59.000Z

    We develop a 1+1-dimensional model of a semiconductor, which exhibits an analog of the nonperturbative electron-positron pair creation from the quantum vacuum via time-dependent external electric fields (Sauter-Schwinger effect). In the one-particle picture of the relativistic Dirac theory, pair production from the Dirac vacuum can be understood as the excitation of a Dirac sea electron into the upper energy continuum. The analog effect in the semiconductor model is the excitation of electrons from the valence band into the conduction band (electron-hole pair creation). We show that the underlying equations describing the excitation processes in both systems are in some cases formally equivalent. The critical electric field strength for the Sauter-Schwinger effect is much smaller in typical semiconductors than in Dirac theory due to the different physical scales. This fact makes analog systems like the semiconductor model promising candidates for the observation of the Sauter-Schwinger effect in the laborator...

  10. High resolution scintillation detector with semiconductor readout

    DOE Patents [OSTI]

    Levin, Craig S. (Santa Monica, CA); Hoffman, Edward J. (Los Angeles, CA)

    2000-01-01T23:59:59.000Z

    A novel high resolution scintillation detector array for use in radiation imaging such as high resolution Positron Emission Tomography (PET) which comprises one or more parallelepiped crystals with at least one long surface of each crystal being in intimate contact with a semiconductor photodetector such that photons generated within each crystal by gamma radiation passing therethrough is detected by the photodetector paired therewith.

  11. HYDROGEN LOCAL VIBRATIONAL MODES IN COMPOUND SEMICONDUCTORS

    E-Print Network [OSTI]

    McCluskey, Matthew

    HYDROGEN LOCAL VIBRATIONAL MODES IN COMPOUND SEMICONDUCTORS M.D. MCCLUSKEY* University) spectroscopy of hydrogen and deuterium in GaP, AlSb, ZnSe, and GaN has provided important information about the structures of dopant- hydrogen complexes and their interaction with the host lattice. In GaN:Mg, for example

  12. Organic conductive films for semiconductor electrodes

    DOE Patents [OSTI]

    Frank, A.J.

    1984-01-01T23:59:59.000Z

    According to the present invention, improved electrodes overcoated with conductive polymer films and preselected catalysts are provided. The electrodes typically comprise an inorganic semiconductor over-coated with a charge conductive polymer film comprising a charge conductive polymer in or on which is a catalyst or charge-relaying agent.

  13. Optical temperature sensor using thermochromic semiconductors

    DOE Patents [OSTI]

    Kronberg, J.W.

    1994-01-01T23:59:59.000Z

    Optical thermometry is a growing technological field which exploits the ability of certain materials to change their optical properties with temperature. A subclass of such materials are those which change their color as a reversible and reproducible function of temperature. These materials are thermochromic. This invention is a composition to measure temperature utilizing thermochromic semiconductors.

  14. Laterally coupled-cavity semiconductor lasers

    SciTech Connect (OSTI)

    Lang, R.J.; Yariv, A.; Salzman, J.

    1987-04-01T23:59:59.000Z

    The authors analyze the threshold behaviour or a pair of laterally coupled semiconductor lasers of different lengths. The predictions include longitudinal mode selectivity leading to single longitudinal mode operation with a periodicity determined by the length mismatch, and ripples in the equipower curves in the current plane due to carrier-induced index shifts. They present experimental measurements that confirm these predictions.

  15. Theory of longitudinal modes in semiconductor lasers

    SciTech Connect (OSTI)

    Lau, K.Y.; Yariv, A.

    1982-05-01T23:59:59.000Z

    A theory of longitudinal mode lasing spectrum of semiconductor lasers is developed which takes into account the nonuniform carrier and photon distributions and local gain spectrum shifts inside lasers with low end mirror reflectivities. The theory gives results consistent with observed longitudinal mode behavior in lasers with reduced facet reflectivity.

  16. Semiconductor Nanowire Optical Antenna Solar Absorbers

    E-Print Network [OSTI]

    Fan, Shanhui

    a clear, intuitive guidance for the design of efficient NW solar cells. The presented approach technology. KEYWORDS Solar cell, semiconductor nanowires, optical antennas, photon management, light trapping employing non-earth-abundant elements like indium (CuInGaSe or CIGS cells) or tellurium (CdTe cells

  17. Preparation of III-V semiconductor nanocrystals

    DOE Patents [OSTI]

    Alivisatos, A.P.; Olshavsky, M.A.

    1996-04-09T23:59:59.000Z

    Nanometer-scale crystals of III-V semiconductors are disclosed. They are prepared by reacting a group III metal source with a group V anion source in a liquid phase at elevated temperature in the presence of a crystallite growth terminator such as pyridine or quinoline. 4 figs.

  18. Semiconductor laser with multiple lasing wavelengths

    DOE Patents [OSTI]

    Fischer, Arthur J.; Choquette, Kent D.; Chow, Weng W.

    2003-07-29T23:59:59.000Z

    A new class of multi-terminal vertical-cavity semiconductor laser components has been developed. These multi-terminal laser components can be switched, either electrically or optically, between distinct lasing wavelengths, or can be made to lase simultaneously at multiple wavelengths.

  19. Optimal Preventive Maintenance Scheduling in Semiconductor Manufacturing

    E-Print Network [OSTI]

    Marcus, Steven I.

    1 Optimal Preventive Maintenance Scheduling in Semiconductor Manufacturing Xiaodong Yao, Emmanuel on Control Applications in 2001. #12;2 Abstract Preventive Maintenance (PM) scheduling is a very challenging schedule with that of a baseline reference schedule are also presented. Index Terms preventive maintenance

  20. Semiconductor detectors with proximity signal readout

    SciTech Connect (OSTI)

    Asztalos, Stephen J. [XIA, LLC, Hayward, CA (United States)

    2014-01-30T23:59:59.000Z

    Semiconductor-based radiation detectors are routinely used for the detection, imaging, and spectroscopy of x-rays, gamma rays, and charged particles for applications in the areas of nuclear and medical physics, astrophysics, environmental remediation, nuclear nonproliferation, and homeland security. Detectors used for imaging and particle tracking are more complex in that they typically must also measure the location of the radiation interaction in addition to the deposited energy. In such detectors, the position measurement is often achieved by dividing or segmenting the electrodes into many strips or pixels and then reading out the signals from all of the electrode segments. Fine electrode segmentation is problematic for many of the standard semiconductor detector technologies. Clearly there is a need for a semiconductor-based radiation detector technology that can achieve fine position resolution while maintaining the excellent energy resolution intrinsic to semiconductor detectors, can be fabricated through simple processes, does not require complex electrical interconnections to the detector, and can reduce the number of required channels of readout electronics. Proximity electrode signal readout (PESR), in which the electrodes are not in physical contact with the detector surface, satisfies this need.

  1. Solid State Lighting Semiconductor Spectroscopy & Devices

    E-Print Network [OSTI]

    Strathclyde, University of

    and fluorescent lamps, are very inefficient in transforming energy into light. Due to upcoming problems in energy % of Earth's total power consumption is used for lighting! Figure 3: Earth at night from space. Evolution inside a semiconductor for light emission. Over 150 years ago... How to achieve white LEDs? Figure 5

  2. Preparation of III-V semiconductor nanocrystals

    DOE Patents [OSTI]

    Alivisatos, A. Paul (Berkeley, CA); Olshavsky, Michael A. (Brunswick, OH)

    1996-01-01T23:59:59.000Z

    Nanometer-scale crystals of III-V semiconductors are disclosed, They are prepared by reacting a group III metal source with a group V anion source in a liquid phase at elevated temperature in the presence of a crystallite growth terminator such as pyridine or quinoline.

  3. Analog Sauter-Schwinger effect in semiconductors

    E-Print Network [OSTI]

    Malte F. Linder; Ralf Schützhold

    2015-03-24T23:59:59.000Z

    We develop a 1+1-dimensional model of a semiconductor, which exhibits an analog of the nonperturbative electron-positron pair creation from the quantum vacuum via time-dependent external electric fields (Sauter-Schwinger effect). In the one-particle picture of the relativistic Dirac theory, pair production from the Dirac vacuum can be understood as the excitation of a Dirac sea electron into the upper energy continuum. The analog effect in the semiconductor model is the excitation of electrons from the valence band into the conduction band (electron-hole pair creation). We show that the underlying equations describing the excitation processes in both systems are in some cases formally equivalent. The critical electric field strength for the Sauter-Schwinger effect is much smaller in typical semiconductors than in Dirac theory due to the different physical scales. This fact makes analog systems like the semiconductor model promising candidates for the observation of the Sauter-Schwinger effect in the laboratory.

  4. Bi-Se doped with Cu, p-type semiconductor

    DOE Patents [OSTI]

    Bhattacharya, Raghu Nath; Phok, Sovannary; Parilla, Philip Anthony

    2013-08-20T23:59:59.000Z

    A Bi--Se doped with Cu, p-type semiconductor, preferably used as an absorber material in a photovoltaic device. Preferably the semiconductor has at least 20 molar percent Cu. In a preferred embodiment, the semiconductor comprises at least 28 molar percent of Cu. In one embodiment, the semiconductor comprises a molar percentage of Cu and Bi whereby the molar percentage of Cu divided by the molar percentage of Bi is greater than 1.2. In a preferred embodiment, the semiconductor is manufactured as a thin film having a thickness less than 600 nm.

  5. Life-cycle Assessment of Semiconductors

    E-Print Network [OSTI]

    Boyd, Sarah B.

    2009-01-01T23:59:59.000Z

    production, and impact factors for each type of CMP slurry, or the exact composition for generic copper, oxide and tungsten

  6. Chemical Bonding, Interfaces and Defects in Hafnium Oxide/Germanium Oxynitride Gate Stacks on Ge (100)

    SciTech Connect (OSTI)

    Oshima, Yasuhiro; /Stanford U., Materials Sci. Dept.; Sun, Yun; /SLAC, SSRL; Kuzum, Duygu; /Stanford U.; Sugawara, Takuya; Saraswat, Krishna C.; Pianetta, Piero; /SLAC, SSRL; McIntyre, Paul C.; /Stanford U., Materials Sci. Dept.

    2008-10-31T23:59:59.000Z

    Correlations among interface properties and chemical bonding characteristics in HfO{sub 2}/GeO{sub x}N{sub y}/Ge MIS stacks were investigated using in-situ remote nitridation of the Ge (100) surface prior to HfO{sub 2} atomic layer deposition (ALD). Ultra thin ({approx}1.1 nm), thermally stable and aqueous etch-resistant GeO{sub x}N{sub y} interfaces layers that exhibited Ge core level photoelectron spectra (PES) similar to stoichiometric Ge{sub 3}N{sub 4} were synthesized. To evaluate GeO{sub x}N{sub y}/Ge interface defects, the density of interface states (D{sub it}) was extracted by the conductance method across the band gap. Forming gas annealed (FGA) samples exhibited substantially lower D{sub it} ({approx} 1 x 10{sup 12} cm{sup -2} eV{sup -1}) than did high vacuum annealed (HVA) and inert gas anneal (IGA) samples ({approx} 1x 10{sup 13} cm{sup -2} eV{sup -1}). Germanium core level photoelectron spectra from similar FGA-treated samples detected out-diffusion of germanium oxide to the HfO{sub 2} film surface and apparent modification of chemical bonding at the GeO{sub x}N{sub y}/Ge interface, which is related to the reduced D{sub it}.

  7. Structure and magnetism of transition-metal implanted dilute magnetic semiconductors

    E-Print Network [OSTI]

    Pereira, Lino; Temst, K; Araújo, JP; Wahl, U

    The discovery of a dilute magnetic semiconductor (DMS) in which ferromagnetism is carrier-mediated and persists above room temperature is a critical step towards the development of semiconductor-based spintronics. Among the many types of DMS materials which have been investigated, the current research interest can be narrowed down to two main classes of materials: (1) narrow-gap III-V semiconductors, mostly GaAs and InAs, doped with Mn; (2) wide-gap oxides and nitrides doped with 3d transition metals, mostly Mn- and Co-doped ZnO and Mn-doped GaN. With a number of interesting functionalities deriving from the carrier-mediated ferromagnetism and demonstrated in various proof-of-concept devices, Mn-doped GaAs has become, among DMS materials, one of the best candidates for technological application. However, despite major developments over the last 15 years, the maximum Curie temperature (185 K) remains well below room temperature. On the other hand, wide-gap DMS materials appear to exhibit ferromagnetic behavior...

  8. Computational Nanoscience with NWChem. | EMSL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Examples are given of the scientific literature using NWChem, as well as two case studies: 1) Band gaps in oxides using exact-exchange based exchange-correlation...

  9. Visible-light photoconductivity of Zn1-xCoxO and its dependence...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    on Co2+ concentration. Abstract: Many metal oxides investigated for solar photocatalysis or photoelectrochemistry have band gaps that are too wide to absorb a sufficient...

  10. Time-resolved THz studies of carrier dynamics in semiconductors, superconductors, and strongly-correlated electron materials

    E-Print Network [OSTI]

    Kaindl, Robert A

    2011-01-01T23:59:59.000Z

    correlation effects in semiconductors, Nature 411, 549-557,in optically excited semiconductors, Phys. Rev. B 54,and Terahertz Gain in Semiconductors Excited to Resonance,

  11. Proximity charge sensing for semiconductor detectors

    DOE Patents [OSTI]

    Luke, Paul N; Tindall, Craig S; Amman, Mark

    2013-10-08T23:59:59.000Z

    A non-contact charge sensor includes a semiconductor detector having a first surface and an opposing second surface. The detector includes a high resistivity electrode layer on the first surface and a low resistivity electrode on the high resistivity electrode layer. A portion of the low resistivity first surface electrode is deleted to expose the high resistivity electrode layer in a portion of the area. A low resistivity electrode layer is disposed on the second surface of the semiconductor detector. A voltage applied between the first surface low resistivity electrode and the second surface low resistivity electrode causes a free charge to drift toward the first or second surface according to a polarity of the free charge and the voltage. A charge sensitive preamplifier coupled to a non-contact electrode disposed at a distance from the exposed high resistivity electrode layer outputs a signal in response to movement of free charge within the detector.

  12. Semiconductor Probes of Light Dark Matter

    E-Print Network [OSTI]

    Peter W. Graham; David E. Kaplan; Surjeet Rajendran; Matthew T. Walters

    2012-11-12T23:59:59.000Z

    Dark matter with mass below about a GeV is essentially unobservable in conventional direct detection experiments. However, newly proposed technology will allow the detection of single electron events in semiconductor materials with significantly lowered thresholds. This would allow detection of dark matter as light as an MeV in mass. Compared to other detection technologies, semiconductors allow enhanced sensitivity because of their low ionization energy around an eV. Such detectors would be particularly sensitive to dark matter with electric and magnetic dipole moments, with a reach many orders of magnitude beyond current bounds. Observable dipole moment interactions can be generated by new particles with masses as great as 1000 TeV, providing a window to scales beyond the reach of current colliders.

  13. Optical cavity furnace for semiconductor wafer processing

    DOE Patents [OSTI]

    Sopori, Bhushan L.

    2014-08-05T23:59:59.000Z

    An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.

  14. Broad-area tandem semiconductor laser

    SciTech Connect (OSTI)

    Chen, T.R.; Mehuys, D.; Zhuang, Y.H.; Mittelstein, M.; Wang, H.; Derry, P.L.; Kajanto, M.; Yariv, A.

    1988-10-17T23:59:59.000Z

    A tandem combination of a uniform gain broad-area semiconductor laser and a (lateral) periodic gain section displays a stable, near-diffraction-limited single-lobed far-field pattern. The GaAs/GaAlAs quantum well lasers display a high degree of coherence across 60-..mu..m-wide apertures provided that the broad-area section is sufficiently long.

  15. GaTe semiconductor for radiation detection

    DOE Patents [OSTI]

    Payne, Stephen A. (Castro Valley, CA); Burger, Arnold (Nashville, TN); Mandal, Krishna C. (Ashland, MA)

    2009-06-23T23:59:59.000Z

    GaTe semiconductor is used as a room-temperature radiation detector. GaTe has useful properties for radiation detectors: ideal bandgap, favorable mobilities, low melting point (no evaporation), non-hygroscopic nature, and availability of high-purity starting materials. The detector can be used, e.g., for detection of illicit nuclear weapons and radiological dispersed devices at ports of entry, in cities, and off shore and for determination of medical isotopes present in a patient.

  16. Scanning probe microscopy studies of semiconductor surfaces

    SciTech Connect (OSTI)

    Weinberg, W.H. [Univ. of California, Santa Barbara, CA (United States)

    1996-10-01T23:59:59.000Z

    Recent work involving atomic force microscopy and scanning tunneling microscopy is discussed which involves strain-induced, self-assembling nanostructures in compound semiconductor materials. Specific examples include one-dimensional quantum wires of InAs grown by MBE on GaAs(001) and zero-dimensional quantum dots of InP grown by MOCVD on InGaP which is lattice matched to GaAs(001).

  17. Multiple percolation tunneling staircase in metal-semiconductor nanoparticle composites

    SciTech Connect (OSTI)

    Mukherjee, Rupam; Huang, Zhi-Feng; Nadgorny, Boris [Department of Physics and Astronomy, Wayne State University, Detroit, Michigan 48201 (United States)

    2014-10-27T23:59:59.000Z

    Multiple percolation transitions are observed in a binary system of RuO{sub 2}-CaCu{sub 3}Ti{sub 4}O{sub 12} metal-semiconductor nanoparticle composites near percolation thresholds. Apart from a classical percolation transition, associated with the appearance of a continuous conductance path through RuO{sub 2} metal oxide nanoparticles, at least two additional tunneling percolation transitions are detected in this composite system. Such behavior is consistent with the recently emerged picture of a quantum conductivity staircase, which predicts several percolation tunneling thresholds in a system with a hierarchy of local tunneling conductance, due to various degrees of proximity of adjacent conducting particles distributed in an insulating matrix. Here, we investigate a different type of percolation tunneling staircase, associated with a more complex conductive and insulating particle microstructure of two types of non-spherical constituents. As tunneling is strongly temperature dependent, we use variable temperature measurements to emphasize the hierarchical nature of consecutive tunneling transitions. The critical exponents corresponding to specific tunneling percolation thresholds are found to be nonuniversal and temperature dependent.

  18. Visible-wavelength semiconductor lasers and arrays

    DOE Patents [OSTI]

    Schneider, Jr., Richard P. (Albuquerque, NM); Crawford, Mary H. (Albuquerque, NM)

    1996-01-01T23:59:59.000Z

    A visible semiconductor laser. The visible semiconductor laser includes an InAlGaP active region surrounded by one or more AlGaAs layers on each side, with carbon as the sole p-type dopant. Embodiments of the invention are provided as vertical-cavity surface-emitting lasers (VCSELs) and as edge-emitting lasers (EELs). One or more transition layers comprised of a substantially indium-free semiconductor alloy such as AlAsP, AlGaAsP, or the like may be provided between the InAlGaP active region and the AlGaAS DBR mirrors or confinement layers to improve carrier injection and device efficiency by reducing any band offsets. Visible VCSEL devices fabricated according to the invention with a one-wavelength-thick (1.lambda.) optical cavity operate continuous-wave (cw) with lasing output powers up to 8 mW, and a peak power conversion efficiency of up to 11%.

  19. 7/14/2004 World of Compound Semiconductors Page 1 of 191 TThhee WWoorrlldd

    E-Print Network [OSTI]

    7/14/2004 World of Compound Semiconductors Page 1 of 191 TThhee WWoorrlldd ooff CCoommppoouunndd ...... ---- ...... ---- ...... ---- ...... ---- ...... ---- ...... ---- ...... ---- #12;7/14/2004 World of Compound Semiconductors Page 2 of 191 0.1 Scope Compound III-V Semiconductors A new family of semiconductors is changing the way we live. These semiconductors are in our cell phones

  20. 1.0. Semiconductor Diodes 1 of 27 1.2 Ideal Diode

    E-Print Network [OSTI]

    Allen, Gale

    1.0. Semiconductor Diodes 1 of 27 1.2 Ideal Diode ID VD ID Open Circuit Short Circuit VD + - #12;1.0. Semiconductor Diodes 2 of 27 1.3 Semiconductor Materials Conductor Insulator Semiconductor R = (Resistivity Resistivity of a semiconductor decreases as temperature increases. ure coefficient.Negative temperat #12

  1. Photovoltaic healing of non-uniformities in semiconductor devices

    DOE Patents [OSTI]

    Karpov, Victor G.; Roussillon, Yann; Shvydka, Diana; Compaan, Alvin D.; Giolando, Dean M.

    2006-08-29T23:59:59.000Z

    A method of making a photovoltaic device using light energy and a solution to normalize electric potential variations in the device. A semiconductor layer having nonuniformities comprising areas of aberrant electric potential deviating from the electric potential of the top surface of the semiconductor is deposited onto a substrate layer. A solution containing an electrolyte, at least one bonding material, and positive and negative ions is applied over the top surface of the semiconductor. Light energy is applied to generate photovoltage in the semiconductor, causing a redistribution of the ions and the bonding material to the areas of aberrant electric potential. The bonding material selectively bonds to the nonuniformities in a manner such that the electric potential of the nonuniformities is normalized relative to the electric potential of the top surface of the semiconductor layer. A conductive electrode layer is then deposited over the top surface of the semiconductor layer.

  2. Methods and devices for fabricating and assembling printable semiconductor elements

    DOE Patents [OSTI]

    Nuzzo, Ralph G. (Champaign, IL); Rogers, John A. (Champaign, IL); Menard, Etienne (Urbana, IL); Lee, Keon Jae (Savoy, IL); Khang, Dahl-Young (Urbana, IL); Sun, Yugang (Champaign, IL); Meitl, Matthew (Champaign, IL); Zhu, Zhengtao (Urbana, IL)

    2009-11-24T23:59:59.000Z

    The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

  3. Method and system for powering and cooling semiconductor lasers

    DOE Patents [OSTI]

    Telford, Steven J; Ladran, Anthony S

    2014-02-25T23:59:59.000Z

    A semiconductor laser system includes a diode laser tile. The diode laser tile includes a mounting fixture having a first side and a second side opposing the first side and an array of semiconductor laser pumps coupled to the first side of the mounting fixture. The semiconductor laser system also includes an electrical pulse generator thermally coupled to the diode bar and a cooling member thermally coupled to the diode bar and the electrical pulse generator.

  4. Methods and devices for fabricating and assembling printable semiconductor elements

    DOE Patents [OSTI]

    Nuzzo, Ralph G; Rogers, John A; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao

    2014-03-04T23:59:59.000Z

    The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

  5. Graded core/shell semiconductor nanorods and nanorod barcodes

    DOE Patents [OSTI]

    Alivisatos, A. Paul; Scher, Erik C.; Manna, Liberato

    2013-03-26T23:59:59.000Z

    Graded core/shell semiconductor nanorods and shapped nanorods are disclosed comprising Group II-VI, Group III-V and Group IV semiconductors and methods of making the same. Also disclosed are nanorod barcodes using core/shell nanorods where the core is a semiconductor or metal material, and with or without a shell. Methods of labeling analytes using the nanorod barcodes are also disclosed.

  6. Graded core/shell semiconductor nanorods and nanorod barcodes

    DOE Patents [OSTI]

    Alivisatos, A. Paul (Oakland, CA); Scher, Erik C. (San Francisco, CA); Manna, Liberato (Palo Del Collie, IT)

    2009-05-19T23:59:59.000Z

    Disclosed herein is a graded core/shell semiconductor nanorod having at least a first segment of a core of a Group II-VI, Group III-V or a Group IV semiconductor, a graded shell overlying the core, wherein the graded shell comprises at least two monolayers, wherein the at least two monolayers each independently comprise a Group II-VI, Group III-V or a Group IV semiconductor.

  7. Graded core/shell semiconductor nanorods and nanorod barcodes

    DOE Patents [OSTI]

    Alivisatos, A. Paul (Oakland, CA); Scher, Erik C. (San Francisco, CA); Manna, Liberato (Lecce, IT)

    2010-12-14T23:59:59.000Z

    Graded core/shell semiconductor nanorods and shaped nanorods are disclosed comprising Group II-VI, Group III-V and Group IV semiconductors and methods of making the same. Also disclosed are nanorod barcodes using core/shell nanorods where the core is a semiconductor or metal material, and with or without a shell. Methods of labeling analytes using the nanorod barcodes are also disclosed.

  8. Deposition method for producing silicon carbide high-temperature semiconductors

    DOE Patents [OSTI]

    Hsu, George C. (La Crescenta, CA); Rohatgi, Naresh K. (W. Corine, CA)

    1987-01-01T23:59:59.000Z

    An improved deposition method for producing silicon carbide high-temperature semiconductor material comprising placing a semiconductor substrate composed of silicon carbide in a fluidized bed silicon carbide deposition reactor, fluidizing the bed particles by hydrogen gas in a mildly bubbling mode through a gas distributor and heating the substrate at temperatures around 1200.degree.-1500.degree. C. thereby depositing a layer of silicon carbide on the semiconductor substrate.

  9. Methods and devices for fabricating and assembling printable semiconductor elements

    DOE Patents [OSTI]

    Nuzzo, Ralph G; Rogers, John A; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao

    2013-05-14T23:59:59.000Z

    The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

  10. Methods and devices for fabricating and assembling printable semiconductor elements

    DOE Patents [OSTI]

    Nuzzo, Ralph G. (Champaign, IL); Rogers, John A. (Champaign, IL); Menard, Etienne (Durham, NC); Lee, Keon Jae (Daejeon, KR); Khang, Dahl-Young (Urbana, IL); Sun, Yugang (Champaign, IL); Meitl, Matthew (Raleigh, NC); Zhu, Zhengtao (Urbana, IL)

    2011-07-19T23:59:59.000Z

    The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

  11. Method for fabricating an interconnected array of semiconductor devices

    DOE Patents [OSTI]

    Grimmer, Derrick P. (White Bear Lake, MN); Paulson, Kenneth R. (North St. Paul, MN); Gilbert, James R. (St. Paul, MN)

    1989-10-10T23:59:59.000Z

    Semiconductor layer and conductive layer formed on a flexible substrate, divided into individual devices and interconnected with one another in series by interconnection layers and penetrating terminals.

  12. Beam excited acoustic instability in semiconductor quantum plasmas

    SciTech Connect (OSTI)

    Rasheed, A.; Siddique, M.; Huda, F. [Department of Physics, Government College University, Faisalabad 38000 (Pakistan); Jamil, M. [Department of Physics, COMSATS Institute of Information Technology, Lahore 54000 (Pakistan); Jung, Y.-D. [Department of Applied Physics and Department of Bionanotechnology, Hanyang University, Ansan, Kyunggi-Do 426-791 (Korea, Republic of)

    2014-06-15T23:59:59.000Z

    The instability of hole-Acoustic waves due to electron beam in semiconductor quantum plasmas is examined using the quantum hydrodynamic model. The quantum effects are considered including Bohm potential, Fermi degenerate pressure, and exchange potential of the semiconductor quantum plasma species. Our model is applied to nano-sized GaAs semiconductor plasmas. The variation of the growth rate of the unstable mode is obtained over a wide range of system parameters. It is found that the thermal effects of semiconductor species have significance over the hole-Acoustic waves.

  13. Kyungdong Photovoltaic Energy Corp KPE formerly Photon Semiconductor...

    Open Energy Info (EERE)

    Kyungdong Photovoltaic Energy Corp KPE formerly Photon Semiconductor Energy Jump to: navigation, search Name: Kyungdong Photovoltaic Energy Corp (KPE) (formerly Photon...

  14. Magnetic Gas Sensing Using a Dilute Magnetic Semiconductor. ...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Abstract: The authors report on a magnetic gas sensing methodology to detect hydrogen using the ferromagnetic properties of a nanoscale dilute magnetic semiconductor...

  15. Method for depositing high-quality microcrystalline semiconductor materials

    DOE Patents [OSTI]

    Guha, Subhendu (Bloomfield Hills, MI); Yang, Chi C. (Troy, MI); Yan, Baojie (Rochester Hills, MI)

    2011-03-08T23:59:59.000Z

    A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

  16. Statistical Methods for Enhanced Metrology in Semiconductor/Photovoltaic Manufacturing

    E-Print Network [OSTI]

    Zeng, Dekong

    2012-01-01T23:59:59.000Z

    process control charts (SPC) for product quality and processstatistical process control (SPC) charts. The concept is toMethods Univariate SPC for semiconductor manufacturing

  17. Argonne announces new licensing agreement with AKHAN Semiconductor...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Argonne announces new licensing agreement with AKHAN Semiconductor By Jared Sagoff * November 19, 2014 Tweet EmailPrint ARGONNE, Ill. - The U.S. Department of Energy's (DOE)...

  18. Exploring Electron Transfer in Organic Semiconductors | MIT-Harvard...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Electron Transfer in Organic Semiconductors January 28, 2009 at 3pm36-428 Troy Van Voorhis Department of Chemistry, Massachusetts Institute of Technology vanvoorhis2000 abstract:...

  19. Ferromagnetic Semiconductor Nanoclusters: Co-doped Cu2O. | EMSL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    exhibits a temperature dependent decrease. Citation: Antony J, Y Qiang, F Muhammad, D Meyer, DE McCready, and MH Engelhard.2007."Ferromagnetic Semiconductor Nanoclusters:...

  20. The Technical and Economic Potential for Electricity Energy Efficiency in a Semiconductor Manufacturing Plant

    E-Print Network [OSTI]

    Lee, A. H. W.; Golden, J. W.; Zarnikau, J. W.

    In recent years, there has been renewed interest in energy efficiency in the semiconductor industry. The declining prices for semiconductor products has prompted semiconductor manufacturing plants to control costs so as to maintain profitability...