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1

Narrow band gap amorphous silicon semiconductors  

DOE Patents [OSTI]

Disclosed is a narrow band gap amorphous silicon semiconductor comprising an alloy of amorphous silicon and a band gap narrowing element selected from the group consisting of Sn, Ge, and Pb, with an electron donor dopant selected from the group consisting of P, As, Sb, Bi and N. The process for producing the narrow band gap amorphous silicon semiconductor comprises the steps of forming an alloy comprising amorphous silicon and at least one of the aforesaid band gap narrowing elements in amount sufficient to narrow the band gap of the silicon semiconductor alloy below that of amorphous silicon, and also utilizing sufficient amounts of the aforesaid electron donor dopant to maintain the amorphous silicon alloy as an n-type semiconductor.

Madan, A.; Mahan, A.H.

1985-01-10T23:59:59.000Z

2

Wide band gap semiconductor templates  

DOE Patents [OSTI]

The present invention relates to a thin film structure based on an epitaxial (111)-oriented rare earth-Group IVB oxide on the cubic (001) MgO terminated surface and the ion-beam-assisted deposition ("IBAD") techniques that are amendable to be over coated by semiconductors with hexagonal crystal structures. The IBAD magnesium oxide ("MgO") technology, in conjunction with certain template materials, is used to fabricate the desired thin film array. Similarly, IBAD MgO with appropriate template layers can be used for semiconductors with cubic type crystal structures.

Arendt, Paul N. (Los Alamos, NM); Stan, Liliana (Los Alamos, NM); Jia, Quanxi (Los Alamos, NM); DePaula, Raymond F. (Santa Fe, NM); Usov, Igor O. (Los Alamos, NM)

2010-12-14T23:59:59.000Z

3

Wide-band-gap, alkaline-earth-oxide semiconductor and devices utilizing same  

DOE Patents [OSTI]

This invention relates to novel and comparatively inexpensive semiconductor devices utilizing semiconducting alkaline-earth-oxide crystals doped with alkali metal. The semiconducting crystals are produced by a simple and relatively inexpensive process. As a specific example, a high-purity lithium-doped MgO crystal is grown by conventional techniques. The crystal then is heated in an oxygen-containing atmosphere to form many [Li].degree. defects therein, and the resulting defect-rich hot crystal is promptly quenched to render the defects stable at room temperature and temperatures well above the same. Quenching can be effected conveniently by contacting the hot crystal with room-temperature air.

Abraham, Marvin M. (Oak Ridge, TN); Chen, Yok (Oak Ridge, TN); Kernohan, Robert H. (Oak Ridge, TN)

1981-01-01T23:59:59.000Z

4

The Electrical and Band-Gap Properties of Amorphous Zinc-Indium-Tin Oxide Thin Films  

E-Print Network [OSTI]

MRSEC The Electrical and Band-Gap Properties of Amorphous Zinc-Indium-Tin Oxide Thin Films D Science & Engineering Center For zinc-indium-tin oxide (ZITO) films, grown by pulsed-laser deposition was replaced by substitution with zinc and tin in equal molar proportions (co-substitution). All ZITO films

Shahriar, Selim

5

Toward Photochemical Water Splitting Using Band-Gap-Narrowed Semiconductors and Transition-Metal Based Molecular Catalysts  

SciTech Connect (OSTI)

We are carrying out coordinated theoretical and experimental studies of toward photochemical water splitting using band-gap-narrowed semiconductors (BGNSCs) with attached multi-electron molecular water oxidation and hydrogen production catalysts. We focus on the coupling between the materials properties and the H{sub 2}O redox chemistry, with an emphasis on attaining a fundamental understanding of the individual elementary steps in the following four processes: (1) Light-harvesting and charge-separation of stable oxide or oxide-derived semiconductors for solar-driven water splitting, including the discovery and characterization of the behavior of such materials at the aqueous interface; (2) The catalysis of the four-electron water oxidation by dinuclear hydroxo transition-metal complexes with quinonoid ligands, and the rational search for improved catalysts; (3) Transfer of the design principles learned from the elucidation of the DuBois-type hydrogenase model catalysts in acetonitrile to the rational design of two-electron hydrogen production catalysts for aqueous solution; (4) Combining these three elements to examine the function of oxidation catalysts on BGNSC photoanode surfaces and hydrogen production catalysts on cathode surfaces at the aqueous interface to understand the challenges to the efficient coupling of the materials functions.

Muckerman,J.T.; Rodriguez, J.A.; Fujita, E.

2009-06-07T23:59:59.000Z

6

Band gap structure modification of amorphous anodic Al oxide film by Ti-alloying  

SciTech Connect (OSTI)

The band structure of pure and Ti-alloyed anodic aluminum oxide has been examined as a function of Ti concentration varying from 2 to 20 at.?%. The band gap energy of Ti-alloyed anodic Al oxide decreases with increasing Ti concentration. X-ray absorption spectroscopy reveals that Ti atoms are not located in a TiO{sub 2} unit in the oxide layer, but rather in a mixed Ti-Al oxide layer. The optical band gap energy of the anodic oxide layers was determined by vacuum ultraviolet spectroscopy in the energy range from 4.1 to 9.2?eV (300–135?nm). The results indicate that amorphous anodic Al{sub 2}O{sub 3} has a direct band gap of 7.3?eV, which is about ?1.4?eV lower than its crystalline counterpart (single-crystal Al{sub 2}O{sub 3}). Upon Ti-alloying, extra bands appear within the band gap of amorphous Al{sub 2}O{sub 3}, mainly caused by Ti 3d orbitals localized at the Ti site.

Canulescu, S., E-mail: stec@fotonik.dtu.dk; Schou, J. [Department of Photonics Engineering, Technical University of Denmark, 4000 Roskilde (Denmark); Rechendorff, K.; Pleth Nielsen, L. [Danish Technological Institute, Kongsvang Alle 29, 8000 Aarhus (Denmark); Borca, C. N. [Paul Scherrer Institute, 5232 Villigen (Switzerland); Jones, N. C.; Hoffmann, S. V. [ISA, Department of Physics and Astronomy, Aarhus University, 8000 Aarhus (Denmark); Bordo, K.; Ambat, R. [Department of Mechanical Engineering, Technical University of Denmark, 2800 Kongens Lyngby (Denmark)

2014-03-24T23:59:59.000Z

7

Band gap tuning in transition metal oxides by site-specific substitution  

DOE Patents [OSTI]

A transition metal oxide insulator composition having a tuned band gap includes a transition metal oxide having a perovskite or a perovskite-like crystalline structure. The transition metal oxide includes at least one first element selected form the group of Bi, Ca, Ba, Sr, Li, Na, Mg, K, Pb, and Pr; and at least one second element selected from the group of Ti, Al, V, Cr, Mn, Fe, Co, Ni, Cu, Zr, Nb, Mo, Ru, Rh, Hf, Ta, W, Re, Os, Ir, and Pt. At least one correlated insulator is integrated into the crystalline structure, including REMO.sub.3, wherein RE is at least one Rare Earth element, and wherein M is at least one element selected from the group of Co, V, Cr, Ni, Mn, and Fe. The composition is characterized by a band gap of less of 4.5 eV.

Lee, Ho Nyung; Chisholm, Jr., Matthew F; Jellison, Jr., Gerald Earle; Singh, David J; Choi, Woo Seok

2013-12-24T23:59:59.000Z

8

Effect of silver incorporation in phase formation and band gap tuning of tungsten oxide thin films  

SciTech Connect (OSTI)

Silver incorporated tungsten oxide thin films are prepared by RF magnetron sputtering technique. The effect of silver incorporation in micro structure evolution, phase enhancement, band gap tuning and other optical properties are investigated using techniques such as x-ray diffraction, micro-Raman spectroscopy, atomic force microscopy, scanning electron microscopy, energy dispersive x-ray spectroscopy, and UV-Visible spectroscopy. Effect of silver addition in phase formation and band gap tuning of tungsten oxide thin films are investigated. It is found that the texturing and phase formation improves with enhancement in silver content. It is also found that as the silver incorporation enhances the thickness of the films increases at the same time the strain in the film decreases. Even without annealing the desired phase can be achieved by doping with silver. A broad band centered at the wavelength 437 nm is observed in the absorption spectra of tungsten oxide films of higher silver incorporation and this can be attributed to surface plasmon resonance of silver atoms present in the tungsten oxide matrix. The transmittance of the films is decreased with increase in silver content which can be due to increase in film thickness, enhancement of scattering, and absorption of light caused by the increase of grain size, surface roughness and porosity of films and enhanced absorption due to surface plasmon resonance of silver. It is found that silver can act as the seed for the growth of tungsten oxide grains and found that the grain size increases with silver content which in turn decreases the band gap of tungsten oxide from 3.14 eV to 2.70 eV.

Jolly Bose, R.; Kumar, R. Vinod; Sudheer, S. K.; Mahadevan Pillai, V. P. [Department of Optoelectronics, University of Kerala, Kariyavattom, Thiruvananthapuram, Kerala 695581 (India); Reddy, V. R.; Ganesan, V. [UGC - DAE Consortium for Scientific Research, Khandwa Road, Indore 452017, Madhyapradesh (India)

2012-12-01T23:59:59.000Z

9

Conductivity and optical band gaps of polyethylene oxide doped with Li{sub 2}SO{sub 4} salt  

SciTech Connect (OSTI)

The conductivity and optical properties of Li{sub 2}SO{sub 4} doped polyethylene oxide (PEO) films were studied. The polymer electrolyte films are prepared using solution casting technique. The material phase change was confirmed by X-ray diffraction (XRD) technique. Optical absorption study was conducted using UV- Vis. Spectroscopy in the wavelength range 190–1100nm on pure and doped PEO films. The direct and indirect optical band gaps were found decreased from 5.81–4.51eV and 4.84–3.43eV respectively with increasing the Li{sub 2}SO{sub 4}. The conductivity found to increases with increasing the dopant concentration due to strong hopping mechanism at room temperature.

Chapi, Sharanappa, E-mail: dehu2010@gmail.com; Raghu, S., E-mail: dehu2010@gmail.com; Subramanya, K., E-mail: dehu2010@gmail.com; Archana, K., E-mail: dehu2010@gmail.com; Mini, V., E-mail: dehu2010@gmail.com; Devendrappa, H., E-mail: dehu2010@gmail.com [Dept. of Physics, Mangalore University, Mangalagangothri-574199 (India)

2014-04-24T23:59:59.000Z

10

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Substrate-Induced Band-Gap Opening in Epitaxial Graphene Print Prospective challengers to silicon, the long-reigning king of semiconductors for computer chips and other electronic...

11

Fabrication of photonic band gap materials  

DOE Patents [OSTI]

A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microspheres, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microspheres therefrom. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microspheres may be polystyrene microspheres.

Constant, Kristen (Ames, IA); Subramania, Ganapathi S. (Ames, IA); Biswas, Rana (Ames, IA); Ho, Kai-Ming (Ames, IA)

2002-01-15T23:59:59.000Z

12

Adaptive algorithms for QCSE optical modulators Excitonic optical absorption at near band gap photon energies in III-V compound semiconductor  

E-Print Network [OSTI]

. Typically, such designs make use of simple rectangular potential wells in the AlGaAs/GaAs or InP/InGaAsP1 Adaptive algorithms for QCSE optical modulators Excitonic optical absorption at near band gap of the quantum well, the excitonic optical absorption strength and energy can be manipulated. This quantum

Levi, Anthony F. J.

13

Effects of anneals in ammonia on the interface trap density near the band edges in 4Hsilicon carbide metal-oxide-semiconductor capacitors  

E-Print Network [OSTI]

­silicon carbide metal-oxide-semiconductor capacitors Gilyong Chung, Chin Che Tin, and John R. Williamsa) Physics. Silicon carbide is the only wide band gap semiconductor that has a native oxide, and metal temperature capacitance­voltage measurements are reported for SiO2/4H­SiC n and p type metal

Pantelides, Sokrates T.

14

Blueshift of optical band gap in ZnO thin films grown by metal-organic chemical-vapor deposition  

E-Print Network [OSTI]

. INTRODUCTION Zinc oxide ZnO is a wide direct band-gap 3.37 eV semiconductor with a broad range of applications. Dimethylzinc DMZn , N2 gas, and high-purity O2 were used as the zinc source, carrier gas, and oxidizing agent including light-emitting devices,1 varistors,2 solar cells,3 and gas sensors.4 Moreover, ZnO is a promising

15

Narrow energy band gap gallium arsenide nitride semi-conductors and an ion-cut-synthesis method for producing the same  

DOE Patents [OSTI]

A method for forming a semi-conductor material is provided that comprises forming a donor substrate constructed of GaAs, providing a receiver substrate, implanting nitrogen into the donor substrate to form an implanted layer comprising GaAs and nitrogen. The implanted layer is bonded to the receiver substrate and annealed to form GaAsN and nitrogen micro-blisters in the implanted layer. The micro-blisters allow the implanted layer to be cleaved from the donor substrate.

Weng, Xiaojun; Goldman, Rachel S.

2006-06-06T23:59:59.000Z

16

Characterization of Amorphous Zinc Tin Oxide Semiconductors....  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Amorphous Zinc Tin Oxide Semiconductors. Characterization of Amorphous Zinc Tin Oxide Semiconductors. Abstract: Amorphous zinc tin oxide (ZTO) was investigated to determine the...

17

Low band gap polymers Organic Photovoltaics  

E-Print Network [OSTI]

Low band gap polymers for Organic Photovoltaics Eva Bundgaard Ph.D. Dissertation Risø National Bundgaard Title: Low band gap polymers for Organic photovoltaics Department: The polymer department Report the area of organic photovoltaics are focusing on low band gap polymers, a type of polymer which absorbs

18

Ferromagnetism in Oxide Semiconductors  

SciTech Connect (OSTI)

In order to become a practical technology, semiconductor spintronics requires the discovery and utilization of ferromagnetic semiconductors which exhibit spin polarization in the majority carrier band at and above room temperature. Intrinsic remanent magnetization would allow spin polarized currents to be propagated in such materials without the need for a continuous magnetic field. However, the discovery and understanding of such materials is proving to be a grand challenge in solid-state science. Indeed, one of the 125 critical unanswered scientific questions recently posed in Science magazine asks, “Is it possible to create magnetic semiconductors that work at room temperature?”

Chambers, Scott A.; Droubay, Timothy C.; Wang, Chong M.; Rosso, Kevin M.; Heald, Steve M.; Schwartz, S. A.; Kittilstved, Kevin R.; Gamelin, Daniel R.

2006-11-01T23:59:59.000Z

19

Voltage-matched, monolithic, multi-band-gap devices  

SciTech Connect (OSTI)

Monolithic, tandem, photonic cells include at least a first semiconductor layer and a second semiconductor layer, wherein each semiconductor layer includes an n-type region, a p-type region, and a given band-gap energy. Formed within each semiconductor layer is a sting of electrically connected photonic sub-cells. By carefully selecting the numbers of photonic sub-cells in the first and second layer photonic sub-cell string(s), and by carefully selecting the manner in which the sub-cells in a first and second layer photonic sub-cell string(s) are electrically connected, each of the first and second layer sub-cell strings may be made to achieve one or more substantially identical electrical characteristics.

Wanlass, Mark W.; Mascarenhas, Angelo

2006-08-22T23:59:59.000Z

20

Voltage-Matched, Monolithic, Multi-Band-Gap Devices  

DOE Patents [OSTI]

Monolithic, tandem, photonic cells include at least a first semiconductor layer and a second semiconductor layer, wherein each semiconductor layer includes an n-type region, a p-type region, and a given band-gap energy. Formed within each semiconductor layer is a string of electrically connected photonic sub-cells. By carefully selecting the numbers of photonic sub-cells in the first and second layer photonic sub-cell string(s), and by carefully selecting the manner in which the sub-cells in a first and second layer photonic sub-cell string(s) are electrically connected, each of the first and second layer sub-cell strings may be made to achieve one or more substantially identical electrical characteristics.

Wanlass, M. W.; Mascarenhas, A.

2006-08-22T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


21

Thermophotovoltaic conversion using selective infrared line emitters and large band gap photovoltaic devices  

DOE Patents [OSTI]

Efficient thermophotovoltaic conversion can be performed using photovoltaic devices with a band gap in the 0.75-1.4 electron volt range, and selective infrared emitters chosen from among the rare earth oxides which are thermally stimulated to emit infrared radiation whose energy very largely corresponds to the aforementioned band gap. It is possible to use thermovoltaic devices operating at relatively high temperatures, up to about 300.degree. C., without seriously impairing the efficiency of energy conversion.

Brandhorst, Jr., Henry W. (Auburn, AL); Chen, Zheng (Auburn, AL)

2000-01-01T23:59:59.000Z

22

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security AdministrationcontrollerNanocrystalline Gallium Oxide ThinIon CoolingSubstrateSubstrate-Induced Band-Gap

23

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security AdministrationcontrollerNanocrystalline Gallium Oxide ThinIonSubstrate-Induced Band-Gap Opening in

24

Significant Reduction in NiO Band Gap upon Formation of LixNi1?xO Alloys: Applications to Solar Energy Conversion  

SciTech Connect (OSTI)

Long-term sustainable solar energy conversion relies on identifying economical and versatile semiconductor materials with appropriate band structures for photovoltaic and photocatalytic applications (e.g., band gaps of ?1.5–2.0 eV). Nickel oxide (NiO) is an inexpensive yet highly promising candidate. Its charge-transfer character may lead to longer carrier lifetimes needed for higher efficiencies, and its conduction band edge is suitable for driving hydrogen evolution via water-splitting. However, NiO’s large band gap (?4 eV) severely limits its use in practical applications. Our first-principles quantum mechanics calculations show band gaps dramatically decrease to ?2.0 eV when NiO is alloyed with Li2O. We show that LixNi1?xO alloys (with x=0.125 and 0.25) are p-type semiconductors, contain states with no impurity levels in the gap and maintain NiO’s desirable charge-transfer character. Lastly, we show that the alloys have potential for photoelectrochemical applications, with band edges well-placed for photocatalytic hydrogen production and CO2 reduction, as well as in tandem dye-sensitized solar cells as a photocathode.

Alidoust, Nima; Toroker, Maytal; Keith, John A.; Carter, Emily A.

2014-01-01T23:59:59.000Z

25

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Substrate-Induced Band-Gap Opening in Epitaxial Graphene Substrate-Induced Band-Gap Opening in Epitaxial Graphene Print Wednesday, 26 March 2008 00:00 Prospective challengers to...

26

Method for Creating Photonic Band Gap Materials - Energy Innovation...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

a photonic band gap. These microstructures have the potential to change the way optoelectronic devices, such as photodiodes, LEDs, and integrated optical circuit elements, are...

27

acoustic band gaps: Topics by E-print Network  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

type of phononic crystals manufactured Institute of Physics. DOI: 10.10631.2167794 The propagation of acoustic waves in periodic composite Deymier, Pierre 2 Acoustic band gap...

28

Oxide Ferromagnetic Semiconductors for Spin-Electronic Transprt  

SciTech Connect (OSTI)

The objective of this research was to investigate the viability of oxide magnetic semiconductors as potential materials for spintronics. We identified some members of the solid solution series of ilmenite (FeTiO3) and hematite (Fe2O3), abbreviated as (IH) for simplicity, for our investigations based on their ferromagnetic and semiconducting properties. With this objective in focus we limited our investigations to the following members of the modified Fe-titanates: IH33 (ilmenitehematite with 33 atomic percent hematite), IH45 (ilmenite-hematite with 45 atomic percent hematite), Mn-substituted ilmenite (Mn-FeTiO3), and Mn-substituted pseudobrookite (Mn- Fe2TiO5). All of them are: 1. wide bandgap semiconductors with band gaps ranging in values between 2.5 to 3.5 eV; 2. n-type semiconductors; 3.they exhibit well defined magnetic hysteresis loops and 4. their magnetic Curie points are greater than 400K. Ceramic, film and single crystal samples were studied and based on their properties we produced varistors (also known as voltage dependent resistors) for microelectronic circuit protection from power surges, three-terminal microelectronic devices capable of generating bipolar currents, and an integrated structured device with controlled magnetic switching of spins. Eleven refereed journal papers, three refereed conference papers and three invention disclosures resulted from our investigations. We also presented invited papers in three international conferences and one national conference. Furthermore two students graduated with Ph.D. degrees, three with M.S. degrees and one with B.S. degree. Also two post-doctoral fellows were actively involved in this research. We established the radiation hardness of our devices in collaboration with a colleague in an HBCU institution, at the Cyclotron Center at Texas A&M University, and at DOE National Labs (Los Alamos and Brookhaven). It is to be appreciated that we met most of our goals and expanded vastly the scope of research by including investigations of Mn-FeTiO3, Mn-Fe2TiO5 and by producing a novel three terminal device capable of generating bipolar currents besides producing radiation resistant varistors and a magnetically switchable device. Furthermore we conclusively established the radiation hardness of the four modified iron titanates we studied. In all our publications, conference and seminar presentations, dissertations and theses sponsorship of DOE has been acknowledged

Dr. R. K. Pandey, Cudworth Endowed Professor (Professor Emeritus of The Unviersity of Alabama)

2008-11-24T23:59:59.000Z

29

Fabrication of Ceramic Layer-by-Layer Infrared Wavelength Photonic Band Gap Crystals  

SciTech Connect (OSTI)

Photonic band gap (PBG) crystals, also known as photonic crystals, are periodic dielectric structures which form a photonic band gap that prohibit the propagation of electromagnetic (EM) waves of certain frequencies at any incident angles. Photonic crystals have several potential applications including zero-threshold semiconductor lasers, the inhibition of spontaneous emission, dielectric mirrors, and wavelength filters. If defect states are introduced in the crystals, light can be guided from one location to another or even a sharp bending of light in micron scale can be achieved. This generates the potential for optical waveguide and optical circuits, which will contribute to the improvement in the fiber-optic communications and the development of high-speed computers.

Henry Hao-Chuan Kang

2004-12-19T23:59:59.000Z

30

Characterization of Novel Semiconductor Alloys for Band Gap Engineering  

E-Print Network [OSTI]

including high efficiency photovoltaics and light emittingEngineering 1.2.1 High Efficiency Photovoltaics 1.2.2 High1.2.1 High Efficiency Photovoltaics There has been

Broesler, Robert Joseph

2010-01-01T23:59:59.000Z

31

Recent emission channeling studies in wide band gap semiconductors  

E-Print Network [OSTI]

We present results of recent emission channeling experiments on the lattice location of implanted Fe and rare earths in wurtzite GaN and ZnO. In both cases the majority of implanted atoms are found on substitutional cation sites. The root mean square displacements from the ideal substitutional Ga and Zn sites are given and the stability of the Fe and rare earth lattice location against thermal annealing is discussed.

Wahl, Ulrich; Rita, E; Alves, E; Carvalho-Soares, João; De Vries, Bart; Matias, V; Vantomme, A

2005-01-01T23:59:59.000Z

32

Substrate-induced band gap opening in epitaxial graphene  

E-Print Network [OSTI]

H.A. Electronic states of graphene nanoribbons studied withS.G. Louie. Energy gaps in graphene nanoribbons. Phys. Rev.band-gap engineering of graphene nanoribbons. Phys. Rev.

2008-01-01T23:59:59.000Z

33

Method of physical vapor deposition of metal oxides on semiconductors  

DOE Patents [OSTI]

A process for growing a metal oxide thin film upon a semiconductor surface with a physical vapor deposition technique in a high-vacuum environment and a structure formed with the process involves the steps of heating the semiconductor surface and introducing hydrogen gas into the high-vacuum environment to develop conditions at the semiconductor surface which are favorable for growing the desired metal oxide upon the semiconductor surface yet is unfavorable for the formation of any native oxides upon the semiconductor. More specifically, the temperature of the semiconductor surface and the ratio of hydrogen partial pressure to water pressure within the vacuum environment are high enough to render the formation of native oxides on the semiconductor surface thermodynamically unstable yet are not so high that the formation of the desired metal oxide on the semiconductor surface is thermodynamically unstable. Having established these conditions, constituent atoms of the metal oxide to be deposited upon the semiconductor surface are directed toward the surface of the semiconductor by a physical vapor deposition technique so that the atoms come to rest upon the semiconductor surface as a thin film of metal oxide with no native oxide at the semiconductor surface/thin film interface. An example of a structure formed by this method includes an epitaxial thin film of (001)-oriented CeO.sub.2 overlying a substrate of (001) Ge.

Norton, David P. (Knoxville, TN)

2001-01-01T23:59:59.000Z

34

Anodic Aluminum Oxide Templated Channel Electrodes via Atomic Layer A. B. F. Martinsona,b  

E-Print Network [OSTI]

60439, USA Dye-sensitized solar cells (DSSCs) utilize high surface area metal oxide sintered particle aluminum oxide membranes via atomic layer deposition. Introduction Dye sensitized solar cells (DSSCs) These photoelectrochemical cells use molecular dyes to sensitize high area, wide band gap semiconductor oxide photoanodes

35

Multi-junction, monolithic solar cell using low-band-gap materials lattice matched to GaAs or Ge  

DOE Patents [OSTI]

A multi-junction, monolithic, photovoltaic solar cell device is provided for converting solar radiation to photocurrent and photovoltage with improved efficiency. The solar cell device comprises a plurality of semiconductor cells, i.e., active p/n junctions, connected in tandem and deposited on a substrate fabricated from GaAs or Ge. To increase efficiency, each semiconductor cell is fabricated from a crystalline material with a lattice constant substantially equivalent to the lattice constant of the substrate material. Additionally, the semiconductor cells are selected with appropriate band gaps to efficiently create photovoltage from a larger portion of the solar spectrum. In this regard, one semiconductor cell in each embodiment of the solar cell device has a band gap between that of Ge and GaAs. To achieve desired band gaps and lattice constants, the semiconductor cells may be fabricated from a number of materials including Ge, GaInP, GaAs, GaInAsP, GaInAsN, GaAsGe, BGaInAs, (GaAs)Ge, CuInSSe, CuAsSSe, and GaInAsNP. To further increase efficiency, the thickness of each semiconductor cell is controlled to match the photocurrent generated in each cell. To facilitate photocurrent flow, a plurality of tunnel junctions of low-resistivity material are included between each adjacent semiconductor cell. The conductivity or direction of photocurrent in the solar cell device may be selected by controlling the specific p-type or n-type characteristics for each active junction.

Olson, Jerry M. (Lakewood, CO); Kurtz, Sarah R. (Golden, CO); Friedman, Daniel J. (Lakewood, CO)

2001-01-01T23:59:59.000Z

36

Optical absorption and band gap reduction in (Fe1-xCrx)2O3 solid...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Optical absorption and band gap reduction in (Fe1-xCrx)2O3 solid solutions: A first-principles study. Optical absorption and band gap reduction in (Fe1-xCrx)2O3 solid solutions: A...

37

Electronic structure of Pt based topological Heusler compounds with C1{sub b} structure and 'zero band gap'  

SciTech Connect (OSTI)

Besides of their well-known wide range of properties it was recently shown that many of the heavy Heusler semiconductors with 1:1:1 composition and C1{sub b} structure exhibit a zero band gap behavior and are topological insulators induced by their inverted band structure. In the present study, the electronic structure of the Heusler compounds PtYSb and PtLaBi was investigated by bulk sensitive hard x-ray photoelectron spectroscopy. The measured valence band spectra are clearly resolved and in well agreement to the first-principles calculations of the electronic structure of the compounds. The experimental results give clear evidence for the zero band gap state.

Ouardi, Siham; Shekhar, Chandra; Fecher, Gerhard H.; Kozina, Xeniya; Stryganyuk, Gregory; Felser, Claudia [Institut fuer Anorganische Chemie und Analytische Chemie, Johannes Gutenberg-Universitaet, D-55099 Mainz (Germany); Ueda, Shigenori; Kobayashi, Keisuke [NIMS Beamline Station at SPring-8, National Institute for Materials Science, Hyogo 679-5148 (Japan)

2011-05-23T23:59:59.000Z

38

Electrical characteristics and thermal stability of HfO{sub 2} metal-oxide-semiconductor capacitors fabricated on clean reconstructed GaSb surfaces  

SciTech Connect (OSTI)

HfO{sub 2}/GaSb interfaces fabricated by high-vacuum HfO{sub 2} deposition on clean reconstructed GaSb surfaces were examined to explore a thermally stable GaSb metal-oxide-semiconductor structure with low interface-state density (D{sub it}). Interface Sb-O bonds were electrically and thermally unstable, and post-metallization annealing at temperatures higher than 200?°C was required to stabilize the HfO{sub 2}/GaSb interfaces. However, the annealing led to large D{sub it} in the upper-half band gap. We propose that the decomposition products that are associated with elemental Sb atoms act as interface states, since a clear correlation between the D{sub it} and the Sb coverage on the initial GaSb surfaces was observed.

Miyata, Noriyuki, E-mail: nori.miyata@aist.go.jp; Mori, Takahiro; Yasuda, Tetsuji [National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568 (Japan); Ohtake, Akihiro [National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044 (Japan); Ichikawa, Masakazu [The University of Tokyo, Tokyo 113-8656 (Japan)

2014-06-09T23:59:59.000Z

39

Single-junction solar cells with the optimum band gap for terrestrial concentrator applications  

DOE Patents [OSTI]

A single-junction solar cell having the ideal band gap for terrestrial concentrator applications. Computer modeling studies of single-junction solar cells have shown that the presence of absorption bands in the direct spectrum has the effect of "pinning" the optimum band gap for a wide range of operating conditions at a value of 1.14.+-.0.02 eV. Efficiencies exceeding 30% may be possible at high concentration ratios for devices with the ideal band gap.

Wanlass, Mark W. (Golden, CO)

1994-01-01T23:59:59.000Z

40

Ultraviolet GaN photodetectors on Si via oxide buffer heterostructures with integrated short period oxide-based distributed Bragg reflectors and leakage suppressing metal-oxide-semiconductor contacts  

SciTech Connect (OSTI)

Based on a novel double step oxide buffer heterostructure approach for GaN integration on Si, we present an optimized Metal-Semiconductor-Metal (MSM)-based Ultraviolet (UV) GaN photodetector system with integrated short-period (oxide/Si) Distributed Bragg Reflector (DBR) and leakage suppressing Metal-Oxide-Semiconductor (MOS) electrode contacts. In terms of structural properties, it is demonstrated by in-situ reflection high energy electron diffraction and transmission electron microscopy-energy dispersive x-ray studies that the DBR heterostructure layers grow with high thickness homogeneity and sharp interface structures sufficient for UV applications; only minor Si diffusion into the Y{sub 2}O{sub 3} films is detected under the applied thermal growth budget. As revealed by comparative high resolution x-ray diffraction studies on GaN/oxide buffer/Si systems with and without DBR systems, the final GaN layer structure quality is not significantly influenced by the growth of the integrated DBR heterostructure. In terms of optoelectronic properties, it is demonstrated that—with respect to the basic GaN/oxide/Si system without DBR—the insertion of (a) the DBR heterostructures and (b) dark current suppressing MOS contacts enhances the photoresponsivity below the GaN band-gap related UV cut-off energy by almost up to two orders of magnitude. Given the in-situ oxide passivation capability of grown GaN surfaces and the one order of magnitude lower number of superlattice layers in case of higher refractive index contrast (oxide/Si) systems with respect to classical III-N DBR superlattices, virtual GaN substrates on Si via functional oxide buffer systems are thus a promising robust approach for future GaN-based UV detector technologies.

Szyszka, A., E-mail: szyszka@ihp-microelectronics.com, E-mail: adam.szyszka@pwr.wroc.pl [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw (Poland); Lupina, L.; Lupina, G.; Schubert, M. A.; Zaumseil, P. [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); Haeberlen, M.; Storck, P.; Thapa, S. B. [Siltronic, Hanns-Seidel-Platz 4, 81737 München (Germany); Schroeder, T. [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); BTU Cottbus-Senftenberg, Konrad-Zuse-Strasse 1, 03046 Cottbus (Germany)

2014-08-28T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


41

Light trapping design for low band-gap polymer solar cells  

E-Print Network [OSTI]

Light trapping design for low band-gap polymer solar cells Stephen Foster1,* and Sajeev John1,2 1 demonstrate numerically a 2-D nanostructured design for light trapping in a low band-gap polymer solar cell, "Light harvesting improvement of organic solar cells with self- enhanced active layer designs," Opt

John, Sajeev

42

Modeling of Photonic Band Gap Crystals and Applications  

SciTech Connect (OSTI)

In this work, the authors have undertaken a theoretical approach to the complex problem of modeling the flow of electromagnetic waves in photonic crystals. The focus is to address the feasibility of using the exciting phenomena of photonic gaps (PBG) in actual applications. The authors start by providing analytical derivations of the computational electromagnetic methods used in their work. They also present a detailed explanation of the physics underlying each approach, as well as a comparative study of the strengths and weaknesses of each method. The Plane Wave expansion, Transfer Matrix, and Finite Difference time Domain Methods are addressed. They also introduce a new theoretical approach, the Modal Expansion Method. They then shift the attention to actual applications. They begin with a discussion of 2D photonic crystal wave guides. The structure addressed consists of a 2D hexagonal structure of air cylinders in a layered dielectric background. Comparison with the performance of a conventional guide is made, as well as suggestions for enhancing it. The studies provide an upper theoretical limit on the performance of such guides, as they assumed no crystal imperfections and non-absorbing media. Next, they study 3D metallic PBG materials at near infrared and optical wavelengths. The main objective is to study the importance of absorption in the metal and the suitability of observing photonic band gaps in such structures. They study simple cubic structures where the metallic scatters are either cubes or interconnected metallic rods. Several metals are studied (aluminum, gold, copper, and silver). The effect of topology is addressed and isolated metallic cubes are found to be less lossy than the connected rod structures. The results reveal that the best performance is obtained by choosing metals with a large negative real part of the dielectric function, together with a relatively small imaginary part. Finally, they point out a new direction in photonic crystal research that involves the interplay of metallic-PBG rejection and photonic band edge absorption. They propose that an absolute metallic-PBG may be used to suppress the infrared part of the blackbody emission and, emit its energy only through a sharp absorption band. Potential applications of this new PBG mechanism include highly efficient incandescent lamps and enhanced thermophotovoltaic energy conversion. The suggested lamp would be able to recycle the energy that would otherwise go into the unwanted heat associated with usual lamps, into light emitted in the visible spectrum. It is estimated this would increase the efficiency over conventional lamps by about 40%.

Ihab Fathy El-Kady

2002-08-27T23:59:59.000Z

43

Single-junction solar cells with the optimum band gap for terrestrial concentrator applications  

DOE Patents [OSTI]

A single-junction solar cell is described having the ideal band gap for terrestrial concentrator applications. Computer modeling studies of single-junction solar cells have shown that the presence of absorption bands in the direct spectrum has the effect of ''pinning'' the optimum band gap for a wide range of operating conditions at a value of 1.14[+-]0.02 eV. Efficiencies exceeding 30% may be possible at high concentration ratios for devices with the ideal band gap. 7 figures.

Wanlass, M.W.

1994-12-27T23:59:59.000Z

44

OPTIMIZATION OF GRADED BAND GAP CdHgTe SOLAR CELLS A. BOUAZZI (*), Y. MARFAING and J. MIMILA-ARROYO  

E-Print Network [OSTI]

145 OPTIMIZATION OF GRADED BAND GAP CdHgTe SOLAR CELLS A. BOUAZZI (*), Y. MARFAING and J. MIMILA and an n-type CdHgTe alloy of uniform band gap as the base region. The optimization of solar energy conversion is conducted with respect to two constitutive para- meters : the gradient of the band gap

Boyer, Edmond

45

Generic process for preparing a crystalline oxide upon a group IV semiconductor substrate  

DOE Patents [OSTI]

A process for growing a crystalline oxide epitaxially upon the surface of a Group IV semiconductor, as well as a structure constructed by the process, is described. The semiconductor can be germanium or silicon, and the crystalline oxide can generally be represented by the formula (AO).sub.n (A'BO.sub.3).sub.m in which "n" and "m" are non-negative integer repeats of planes of the alkaline earth oxides or the alkaline earth-containing perovskite oxides. With atomic level control of interfacial thermodynamics in a multicomponent semiconductor/oxide system, a highly perfect interface between a semiconductor and a crystalline oxide can be obtained.

McKee, Rodney A. (Kingston, TN); Walker, Frederick J. (Oak Ridge, TN); Chisholm, Matthew F. (Oak Ridge, TN)

2000-01-01T23:59:59.000Z

46

Tunable frequency band-gap and pulse propagation in a strongly nonlinear diatomic chain  

E-Print Network [OSTI]

One-dimensional nonlinear phononic crystals have been assembled from periodic diatomic chains of stainless steel cylinders alternated with Polytetrafluoroethylene (PTFE) spheres. We report the presence of acoustic band gaps in the dispersion relation of the linearized systems and study the transformation of single and multiple pulses in linear, nonlinear and strongly nonlinear regimes with numerical calculations and experiments. The limiting frequencies of the band gap are within the audible frequency range (20-20,000 Hz) and can be tuned by varying the particle's material properties, mass and initial compression. Pulses rapidly transform within very short distances from the impacted end due to the influence of the band gap in the linear and in nonlinear elastic chains. The effects of an in situ band gap created by a mean dynamic compression are observed in the strongly nonlinear wave regime.

E. B. Herbold; J. Kim; V. F. Nesterenko; S. Wang; C. Daraio

2008-06-26T23:59:59.000Z

47

Calculation of wakefields in a 17 GHz beam-driven photonic band-gap accelerator structure  

E-Print Network [OSTI]

We present the theoretical analysis and computer simulation of the wakefields in a 17 GHz photonic band-gap (PBG) structure for accelerator applications. Using the commercial code CST Particle Studio, the fundamental ...

Hu, Min

48

Correlation between surface chemistry, density and band gap in...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

of WO3 films. The XPS analyses indicate the formation of stoichiometric WO3 with tungsten existing in fully oxidized valence state (W6+). However, WO3 films grown at high...

49

Science and applications of infrared semiconductor nanocrystals  

E-Print Network [OSTI]

In this work we study several applications of semiconductor nanocrystals (NCs) with infrared band gaps. In the first half, we explore the physics of two systems with applications in NC based photovoltaics. The physics of ...

Geyer, Scott Mitchell

2010-01-01T23:59:59.000Z

50

E-Print Network 3.0 - active complementary metal-oxide-semiconductor...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

ion-implanted p and n dopants in germanium Summary: wavelength spectrum allowing optoelectronic integra- tion to enhance complementary-metal-oxide- semiconductor... lim- its in...

51

E-Print Network 3.0 - area metal-oxide-semiconductor electron...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

inversion layer mobility Joo-Hiuk Son,a) Seongtae... measured absorption of terahertz radiation pulses by metal-oxide-semiconductor MOS inversion layers... of the...

52

Band gap engineering for graphene by using Na{sup +} ions  

SciTech Connect (OSTI)

Despite the noble electronic properties of graphene, its industrial application has been hindered mainly by the absence of a stable means of producing a band gap at the Dirac point (DP). We report a new route to open a band gap (E{sub g}) at DP in a controlled way by depositing positively charged Na{sup +} ions on single layer graphene formed on 6H-SiC(0001) surface. The doping of low energy Na{sup +} ions is found to deplete the ?* band of graphene above the DP, and simultaneously shift the DP downward away from Fermi energy indicating the opening of E{sub g}. The band gap increases with increasing Na{sup +} coverage with a maximum E{sub g}?0.70?eV. Our core-level data, C 1s, Na 2p, and Si 2p, consistently suggest that Na{sup +} ions do not intercalate through graphene, but produce a significant charge asymmetry among the carbon atoms of graphene to cause the opening of a band gap. We thus provide a reliable way of producing and tuning the band gap of graphene by using Na{sup +} ions, which may play a vital role in utilizing graphene in future nano-electronic devices.

Sung, S. J.; Lee, P. R.; Kim, J. G.; Ryu, M. T.; Park, H. M.; Chung, J. W., E-mail: jwc@postech.ac.kr [Department of Physics, Pohang University of Science and Technology, Pohang 790-784 (Korea, Republic of)

2014-08-25T23:59:59.000Z

53

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security AdministrationcontrollerNanocrystalline Gallium Oxide ThinIon CoolingSubstrate

54

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security AdministrationcontrollerNanocrystalline Gallium Oxide ThinIon

55

L{sub g}?=?100?nm In{sub 0.7}Ga{sub 0.3}As quantum well metal-oxide semiconductor field-effect transistors with atomic layer deposited beryllium oxide as interfacial layer  

SciTech Connect (OSTI)

In this study, we have fabricated nanometer-scale channel length quantum-well (QW) metal-oxide-semiconductor field effect transistors (MOSFETs) incorporating beryllium oxide (BeO) as an interfacial layer. BeO has high thermal stability, excellent electrical insulating characteristics, and a large band-gap, which make it an attractive candidate for use as a gate dielectric in making MOSFETs. BeO can also act as a good diffusion barrier to oxygen owing to its small atomic bonding length. In this work, we have fabricated In{sub 0.53}Ga{sub 0.47}As MOS capacitors with BeO and Al{sub 2}O{sub 3} and compared their electrical characteristics. As interface passivation layer, BeO/HfO{sub 2} bilayer gate stack presented effective oxide thickness less 1 nm. Furthermore, we have demonstrated In{sub 0.7}Ga{sub 0.3}As QW MOSFETs with a BeO/HfO{sub 2} dielectric, showing a sub-threshold slope of 100?mV/dec, and a transconductance (g{sub m,max}) of 1.1 mS/?m, while displaying low values of gate leakage current. These results highlight the potential of atomic layer deposited BeO for use as a gate dielectric or interface passivation layer for III–V MOSFETs at the 7?nm technology node and/or beyond.

Koh, D., E-mail: dh.koh@utexas.edu, E-mail: Taewoo.Kim@sematech.org [Department of Electrical and Computer Engineering, Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758 (United States); SEMATECH, Inc., Albany, New York 12203 (United States); Kwon, H. M. [Department of Electronics Engineering, Chungnam National University, Daejeon 305-764 (Korea, Republic of); Kim, T.-W., E-mail: dh.koh@utexas.edu, E-mail: Taewoo.Kim@sematech.org; Veksler, D.; Gilmer, D.; Kirsch, P. D. [SEMATECH, Inc., Albany, New York 12203 (United States); Kim, D.-H. [SEMATECH, Inc., Albany, New York 12203 (United States); GLOBALFOUNDRIES, Malta, New York 12020 (United States); Hudnall, Todd W. [Department of Chemistry and Biochemistry, Texas State University, San Marcos, Texas, 78666 (United States); Bielawski, Christopher W. [Department of Chemistry and Biochemistry, The University of Texas at Austin, Austin, Texas 78712 (United States); Maszara, W. [GLOBALFOUNDRIES, Santa Clara, California 95054 (United States); Banerjee, S. K. [Department of Electrical and Computer Engineering, Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758 (United States)

2014-04-21T23:59:59.000Z

56

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security AdministrationcontrollerNanocrystalline Gallium Oxide ThinIon CoolingSubstrateSubstrate-Induced

57

Band gap and electronic structure of MgSiN{sub 2}  

SciTech Connect (OSTI)

Density functional theory calculations and electron energy loss spectroscopy indicate that the electronic structure of ordered orthorhombic MgSiN{sub 2} is similar to that of wurtzite AlN. A band gap of 5.7?eV was calculated for both MgSiN{sub 2} (indirect) and AlN (direct) using the Heyd-Scuseria-Ernzerhof approximation. Correction with respect to the experimental room-temperature band gap of AlN indicates that the true band gap of MgSiN{sub 2} is 6.2?eV. MgSiN{sub 2} has an additional direct gap of 6.3?eV at the ? point.

Quirk, J. B., E-mail: james.quirk09@imperial.ac.uk; Råsander, M.; McGilvery, C. M.; Moram, M. A. [Department of Materials, Imperial College London, Exhibition Road, London SW7 2AZ (United Kingdom); Palgrave, R. [Department of Chemistry, University College London, Gordon Street WC1H 0AJ (United Kingdom)

2014-09-15T23:59:59.000Z

58

Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom  

DOE Patents [OSTI]

A method of manufacturing a flexible metallic photonic band gap structure operable in the infrared region, comprises the steps of spinning on a first layer of dielectric on a GaAs substrate, imidizing this first layer of dielectric, forming a first metal pattern on this first layer of dielectric, spinning on and imidizing a second layer of dielectric, and then removing the GaAs substrate. This method results in a flexible metallic photonic band gap structure operable with various filter characteristics in the infrared region. This method may be used to construct multi-layer flexible metallic photonic band gap structures. Metal grid defects and dielectric separation layer thicknesses are adjusted to control filter parameters.

Gupta, Sandhya (Bloomington, MN); Tuttle, Gary L. (Ames, IA); Sigalas, Mihail (Ames, IA); McCalmont, Jonathan S. (Ames, IA); Ho, Kai-Ming (Ames, IA)

2001-08-14T23:59:59.000Z

59

One-dimensional electromagnetic band gap structures formed by discharge plasmas in a waveguide  

SciTech Connect (OSTI)

We demonstrate the ability to develop one-dimensional electromagnetic band gap structure in X-band waveguide solely by using the positive columns of glow discharges in neon at the middle pressure. Plasma inhomogeneities are distributed uniformly along a typical X-band waveguide with cross section of 23?×?10?mm{sup 2}. It is shown that electron densities larger than 10{sup 14?}cm{sup ?3} are needed in order to create an effective one-dimensional electromagnetic band gap structure. Some applications for using the one-dimensional electromagnetic band gap structure in waveguide as a control of microwave (broadband filter and device for variation of pulse duration) are demonstrated.

Arkhipenko, V. I.; Simonchik, L. V., E-mail: l.simonchik@dragon.bas-net.by; Usachonak, M. S. [B.I. Stepanov Institute of Physics of the NAS of Belarus, Ave. Nezavisimostsi 68, 220072 Minsk (Belarus); Callegari, Th.; Sokoloff, J. [Université de Toulouse, UPS, INPT, LAPLACE, Laboratoire Plasma et Conversion d'Energie, 118 route de Narbonne, F-31062 Toulouse cedex 9 (France)

2014-09-28T23:59:59.000Z

60

Direct measurements of band gap grading in polycrystalline CIGS solar cells  

E-Print Network [OSTI]

We present direct measurements of depth-resolved band gap variations of CuIn(1-x)Ga(x)Se2 thin-film solar cell absorbers. A new measurement technique combining parallel measurements of local thin-film interference and spectral photoluminescence was developed for this purpose. We find sample-dependent correlation parameters between measured band gap depth and composition profiles, and emphasize the importance of direct measurements. These results bring a quantitative insight into the electronic properties of the solar cells and open a new way to analyze parameters that determine the efficiency of solar cells.

M. P. Heinrich; Z-H. Zhang; Y. Zhang; O. Kiowski; M. Powalla; U. Lemmer; A. Slobodskyy

2010-09-20T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


61

Direct measurements of band gap grading in polycrystalline CIGS solar cells  

E-Print Network [OSTI]

We present direct measurements of depth-resolved band gap variations of CuIn(1-x)Ga(x)Se2 thin-film solar cell absorbers. A new measurement technique combining parallel measurements of local thin-film interference and spectral photoluminescence was developed for this purpose. We find sample-dependent correlation parameters between measured band gap depth and composition profiles, and emphasize the importance of direct measurements. These results bring a quantitative insight into the electronic properties of the solar cells and open a new way to analyze parameters that determine the efficiency of solar cells.

Heinrich, M P; Zhang, Y; Kiowski, O; Powalla, M; Lemmer, U; Slobodskyy, A

2010-01-01T23:59:59.000Z

62

SPECTROSCOPIE DE DEFAUTS -LUMINESCENCE I. THE ANALYSIS OF WIDE BAND GAP SEMICONDUCTORS  

E-Print Network [OSTI]

'impuretes donneurs, accepteurs et pieges isoelectroniques,et de leur extension a I'identification d'espkces chimiques of impurity, donors, acceptors and isoelectronic traps, and their extension to the identification of chemical junctions with quite heavy doping to provide the desired high bulk conduc- tivity, certainly in the 10'' cm

Boyer, Edmond

63

Energy Band-Gap Engineering of Graphene Nanoribbons Melinda Y. Han,1  

E-Print Network [OSTI]

, New York, New York 10027, USA 2 Department of Physics, Columbia University, New York, New York 10027Energy Band-Gap Engineering of Graphene Nanoribbons Melinda Y. Han,1 Barbaros O¨ zyilmaz,2 Yuanbo an energy gap near the charge neutrality point. Individual graphene layers are contacted with metal

Kim, Philip

64

Current transport, gate dielectrics and band gap engineering in graphene devices  

E-Print Network [OSTI]

Current transport, gate dielectrics and band gap engineering in graphene devices Wenjuan Zhu In this work, we studied current transport in mono-, bi- and tri-layer graphene. We find that both of the electrical field of the substrate surface polar phonons in bi-layer/tri-layer graphenes. We also find

Perebeinos, Vasili

65

Metallic photonic-band-gap filament architectures for optimized incandescent lighting Sajeev John and Rongzhou Wang  

E-Print Network [OSTI]

Metallic photonic-band-gap filament architectures for optimized incandescent lighting Sajeev John occur 3,4 . Tra- ditionally incandescent lighting filaments, despite being driven from equilibrium the blackbody spectrum. This suggests the pos- sibility of higher efficiency incandescent lighting, through

John, Sajeev

66

Size effect on the electronic and optical band gap of CdSe QD  

SciTech Connect (OSTI)

Present paper deals with a critical and comprehensive analysis of the dependence of photo emission (PE) electronic band gap and optical absorption (OA) excitonic band gap on the size of CdSe QD, via connecting it with excitonic absorbance wavelength. Excitonic absorbance wavelength is determined through an empirical fit of established experimental evidences. Effective excitonic charge and Bohr radius is determined as a function of size. Increase in size of the CdSe QD results in greater Bohr radius and smaller effective excitonic charge. Excitonic binding energy as a degree of size of QD is also calculated which further relates with the difference in PE electronic and OA optical band gaps. It is also shown that with increase in size of CdSe QD, the excitonic binding energy decreases which consequently increases differences in two band gaps. Our results are very well comparable with the established results. Explanation for the origin of the unusual optical properties of CdSe QD has been also discussed.

Sisodia, Namita, E-mail: namitasisodiya@gmail.com [Department of Physics, Holkar Science College, Indore-45200 (India)

2014-04-24T23:59:59.000Z

67

Exploiting pattern transformation to tune phononic band gaps in a two-dimensional granular crystal  

E-Print Network [OSTI]

) cylinders is investigated numerically. This system was previously shown to undergo a pattern transformation with uniaxial compression by Go¨ncu¨ et al. [Soft Matter 7, 2321 (2011)]. The dispersion relations, or elastic waves in certain frequency ranges known as band gaps is an important feature of these materials

68

Reflection technique for thermal mapping of semiconductors  

DOE Patents [OSTI]

Semiconductors may be optically tested for their temperatures by illuminating them with tunable monochromatic electromagnetic radiation and observing the light reflected off of them. A transition point will occur when the wavelength of the light corresponds with the actual band gap energy of the semiconductor. At the transition point, the image of the semiconductor will appreciably darken as the light is transmitted through it, rather than being reflected off of it. The wavelength of the light at the transition point corresponds to the actual band gap energy and the actual temperature of the semiconductor.

Walter, Martin J. (Lee, NY)

1989-06-20T23:59:59.000Z

69

Chemical Synthesis of Nano-Sized particles of Lead Oxide and their Characterization Studies  

E-Print Network [OSTI]

The quantum dots of semiconductor display novel and interesting phenomena that have not been in the bulk material. The color tunability is one of the most attractive characteristics in II-VI semiconductor nanoparticles such as CdS, ZnS, CdSe, ZnSe and PbO. In this work, the semiconductor lead oxide nanoparticles are prepared by chemical method. The average particle size, specific surface area, crystallinity index are estimated from XRD analysis. The structural, functional groups and optical characters are analyzed with using of SEM, FTIR and UV- Visible techniques. The optical band gap value has also been determined.

M. Alagar; T. Theivasanthi; A. Kubera Raja

2012-04-04T23:59:59.000Z

70

Pre-Stressed Viscoelastic Composites: Effective Incremental Moduli and Band-Gap Tuning  

SciTech Connect (OSTI)

We study viscoelastic wave propagation along pre-stressed nonlinear elastic composite bars. In the pre-stressed state we derive explicit forms for the effective incremental storage and loss moduli with dependence on the pre-stress. We also derive a dispersion relation for the effective wavenumber in the case of arbitrary frequency, hence permitting a study of viscoelastic band-gap tuning via pre-stress.

Parnell, William J. [School of Mathematics, Alan Turing Building, University of Manchester, Manchester, M13 9PL (United Kingdom)

2010-09-30T23:59:59.000Z

71

Photonic-band-gap properties for two-component slow light  

SciTech Connect (OSTI)

We consider two-component ''spinor'' slow light in an ensemble of atoms coherently driven by two pairs of counterpropagating control laser fields in a double tripod-type linkage scheme. We derive an equation of motion for the spinor slow light (SSL) representing an effective Dirac equation for a massive particle with the mass determined by the two-photon detuning. By changing the detuning the atomic medium acts as a photonic crystal with a controllable band gap. If the frequency of the incident probe light lies within the band gap, the light experiences reflection from the sample and can tunnel through it. For frequencies outside the band gap, the transmission and reflection probabilities oscillate with the increasing length of the sample. In both cases the reflection takes place into the complementary mode of the probe field. We investigate the influence of the finite excited state lifetime on the transmission and reflection coefficients of the probe light. We discuss possible experimental implementations of the SSL using alkali-metal atoms such as rubidium or sodium.

Ruseckas, J.; Kudriasov, V.; Juzeliunas, G.; Unanyan, R. G.; Otterbach, J.; Fleischhauer, M. [Institute of Theoretical Physics and Astronomy, Vilnius University, A. Gostauto 12, Vilnius 01108 (Lithuania); Fachbereich Physik and Research Center OPTIMAS, Technische Universitaet Kaiserslautern, Kaiserslautern D-67663 (Germany)

2011-06-15T23:59:59.000Z

72

Waveguides in three-dimensional metallic photonic band-gap materials  

SciTech Connect (OSTI)

We theoretically investigate waveguide structures in three-dimensional metallic photonic band-gap (MPBG) materials. The MPBG materials used in this study consist of a three-dimensional mesh of metallic wires embedded in a dielectric. An {ital L}-shaped waveguide is created by removing part of the metallic wires. Using finite difference time domain simulations, we found that an 85{percent} transmission efficiency can be achieved through the 90{degree} bend with just three unit cell thickness MPBG structures. thinsp {copyright} {ital 1999} {ital The American Physical Society}

Sigalas, M.M.; Biswas, R.; Ho, K.M.; Soukoulis, C.M. [Ames Laboratory and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011 (United States)] [Ames Laboratory and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011 (United States); Crouch, D.D. [Advanced Electromagnetic Technologies Center, Raytheon Corporation, Rancho Cucamonga, California 91729 (United States)] [Advanced Electromagnetic Technologies Center, Raytheon Corporation, Rancho Cucamonga, California 91729 (United States)

1999-08-01T23:59:59.000Z

73

Analysis of plasma-magnetic photonic crystal with a tunable band gap  

SciTech Connect (OSTI)

In this paper, electromagnetic wave propagation through the one-dimensional plasma-magnetic photonic crystal in the presence of external magnetic field has been analyzed. The dispersion relation, transmission and reflection coefficients have been obtained by using the transfer matrix method. It is investigated how photonic band gap of photonic crystals will be tuned when both dielectric function {epsilon} and magnetic permeability {mu} of the constitutive materials, depend on applied magnetic field. This is shown by one dimensional photonic crystals consisting of plasma and ferrite material layers stacked alternately.

Mehdian, H.; Mohammadzahery, Z.; Hasanbeigi, A. [Department of Physics and Plasma Research Institute of Tarbiat Moallem University, 49 Dr Mofatteh Avenue, Tehran 15614 (Iran, Islamic Republic of)

2013-04-15T23:59:59.000Z

74

Direct space-time observation of pulse tunneling in an electromagnetic band gap  

SciTech Connect (OSTI)

We present space-time-resolved measurements of electromagnetic pulses tunneling through a coaxial electromagnetic band gap structure. The results show that during the tunneling process the field distribution inside the barrier is an exponentially decaying standing wave whose amplitude increases and decreases as it slowly follows the temporal evolution of the input pulse. At no time is a pulse maximum found inside the barrier, and hence the transmitted peak is not the incident peak that has propagated to the exit. The results support the quasistatic interpretation of tunneling dynamics and confirm that the group delay is not the traversal time of the input pulse peak.

Doiron, Serge; Hache, Alain [Department de physique et d'astronomie, Universite de Moncton, Moncton, New Brunswick, E1A 3E9 (Canada); Winful, Herbert G. [Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109-2122 (United States)

2007-08-15T23:59:59.000Z

75

Periodic dielectric structure for production of photonic band gap and devices incorporating the same  

DOE Patents [OSTI]

A periodic dielectric structure which is capable of producing a photonic band gap and which is capable of practical construction. The periodic structure is formed of a plurality of layers, each layer being formed of a plurality of rods separated by a given spacing. The material of the rods contrasts with the material between the rods to have a refractive index contrast of at least two. The rods in each layer are arranged with their axes parallel and at a given spacing. Adjacent layers are rotated by 90.degree., such that the axes of the rods in any given layer are perpendicular to the axes in its neighbor. Alternating layers (that is, successive layers of rods having their axes parallel such as the first and third layers) are offset such that the rods of one are about at the midpoint between the rods of the other. A four-layer periocity is thus produced, and successive layers are stacked to form a three-dimensional structure which exhibits a photonic band gap. By virtue of forming the device in layers of elongate members, it is found that the device is susceptible of practical construction.

Ho, Kai-Ming (Ames, IA); Chan, Che-Ting (Ames, IA); Soukoulis, Costas (Ames, IA)

1994-08-02T23:59:59.000Z

76

Monolithic integration of rare-earth oxides and semiconductors for on-silicon technology  

SciTech Connect (OSTI)

Several concepts of integration of the epitaxial rare-earth oxides into the emerging advanced semiconductor on silicon technology are presented. Germanium grows epitaxially on gadolinium oxide despite lattice mismatch of more than 4%. Additionally, polymorphism of some of the rare-earth oxides allows engineering of their crystal structure from hexagonal to cubic and formation of buffer layers that can be used for growth of germanium on a lattice matched oxide layer. Molecular beam epitaxy and metal organic chemical vapor deposition of gallium nitride on the rare-earth oxide buffer layers on silicon is discussed.

Dargis, Rytis, E-mail: dargis@translucentinc.com; Clark, Andrew; Erdem Arkun, Fevzi [Translucent, Inc., 952 Commercial St., Palo Alto, California 94303 (United States); Grinys, Tomas; Tomasiunas, Rolandas [Institute of Applied Research, Vilnius University, Sauletekio al. 10, LT-10223 Vilnius (Lithuania); O'Hara, Andy; Demkov, Alexander A. [Department of Physics, The University of Texas at Austin, 2515 Speedway, C1600, Austin, Texas 78712 (United States)

2014-07-01T23:59:59.000Z

77

Transition metal oxides on organic semiconductors Yongbiao Zhao a  

E-Print Network [OSTI]

semiconductors (OSs) structure has been widely used in inverted organic optoelectronic devices, including toward in simplifying the fabrication process of the organic optoelectronic devices. Ã? 2014 Elsevier B], have gained great attention because of their wide applications in optoelectronic devices composed

Demir, Hilmi Volkan

78

Band gap corrections for molecules and solids using Koopmans theorem and Wannier functions  

E-Print Network [OSTI]

We have proposed a method for correcting the Kohn-Sham eigen energies in the density functional theory (DFT) based on the Koopmans theorem using Wannier functions. The method provides a general approach applicable for molecules and solids for electronic structure calculations. It does not have any adjustable parameters and the computational cost is at the DFT level. For solids, the calculated eigen energies agree well with the experiments for not only the band gaps, but also the energies of other valence and conduction bands. For molecules, the calculated eigen energies agree well with the experimental ionization potentials and electron affinities, and show better trends than the traditional Delta-self-consistent-field (?SCF) results.

Ma, Jie

2015-01-01T23:59:59.000Z

79

Microwave band gap and cavity mode in spoof-insulator-spoof waveguide with multiscale structured surface  

E-Print Network [OSTI]

We propose a multiscale spoof-insulator-spoof (SIS) waveguide by introducing periodic geometry modulation in the wavelength scale to a SIS waveguide made of perfect electric conductor. The MSIS consists of multiple SIS subcells. The dispersion relationship of the fundamental guided mode of the spoof surface plasmon polaritons (SSPPs) is studied analytically within the small gap approximation. It is shown that the multiscale SIS possesses microwave band gap (MBG) due to the Bragg scattering. The "gap maps" in the design parameter space are provided. We demonstrate that the geometry of the subcells can efficiently adjust the effective refraction index of the elementary SIS and therefore further control the width and the position of the MBG. The results are in good agreement with numerical calculations by the finite element method (FEM). For finite-sized MSIS of given geometry in the millimeter scale, FEM calculations show that the first-order symmetric SSPP mode has zero transmission in the MBG within frequency...

Zhang, Qiang; Han, Dezhuan; Qin, Fei Fei; Zhang, Xiao Ming; Yao, Yong

2015-01-01T23:59:59.000Z

80

Microbially-mediated method for synthesis of non-oxide semiconductor nanoparticles  

DOE Patents [OSTI]

The invention is directed to a method for producing non-oxide semiconductor nanoparticles, the method comprising: (a) subjecting a combination of reaction components to conditions conducive to microbially-mediated formation of non-oxide semiconductor nanoparticles, wherein said combination of reaction components comprises i) anaerobic microbes, ii) a culture medium suitable for sustaining said anaerobic microbes, iii) a metal component comprising at least one type of metal ion, iv) a non-metal component containing at least one non-metal selected from the group consisting of S, Se, Te, and As, and v) one or more electron donors that provide donatable electrons to said anaerobic microbes during consumption of the electron donor by said anaerobic microbes; and (b) isolating said non-oxide semiconductor nanoparticles, which contain at least one of said metal ions and at least one of said non-metals. The invention is also directed to non-oxide semiconductor nanoparticle compositions produced as above and having distinctive properties.

Phelps, Tommy J.; Lauf, Robert J.; Moon, Ji Won; Rondinone, Adam J.; Love, Lonnie J.; Duty, Chad Edward; Madden, Andrew Stephen; Li, Yiliang; Ivanov, Ilia N.; Rawn, Claudia Jeanette

2014-06-24T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


81

amorphous oxide semiconductor: Topics by E-print Network  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Summary: alloy of composition correspond- ing to the metallic components of the superconduct- ing oxides respectivement. Abstract. - Previous quenching experiments on 2212...

82

Effects of surface termination on the band gap of ultrabright Si29 nanoparticles: Experiments and computational models  

E-Print Network [OSTI]

Effects of surface termination on the band gap of ultrabright Si29 nanoparticles: Experiments constituting a H-terminated reconstructed Si surface was recently proposed as a structural prototype termination with a N linkage in butylamine and O linkage in pentane . The emission band for N-termination

Braun, Paul

83

Here, we present the fabrication and use of plastic Photonic Band Gap Bragg fibres in photonic textiles for applications in  

E-Print Network [OSTI]

Here, we present the fabrication and use of plastic Photonic Band Gap Bragg fibres in photonic­section, Bragg fibres feature periodic sequence of layers of two distinct plastics. Under ambient illumination SCHICKER2 , NING GUO1 , CHARLES DUBOIS3 , RACHEL WINGFIELD2 & MAKSIM SKOROBOGATIY1 COLOUR-ON-DEMAND

Skorobogatiy, Maksim

84

Photovoltaic devices with low band gap polymers Eva Bundgaarda, Sean Shaheenb, David S. Ginleyb, Frederik C. Krebsa  

E-Print Network [OSTI]

Photovoltaic devices with low band gap polymers Eva Bundgaarda, Sean Shaheenb, David S. Ginleyb, Colorado, USA Abstract Progress in organic photovoltaic devices has recently resulted in reported temperature, active area of the device and molecular weight of the polymer, on the photovoltaic response

85

Band gap tuning in GaN through equibiaxial in-plane strains S. K. Yadav,2  

E-Print Network [OSTI]

in photovoltaics and light emission diodes LEDs . The InGaN system has been intensively studied during the past to the large atomic size mismatch between Ga and In.3 Thus, other methods to tune the band gap are needed for potential appli- cations of GaN and related materials systems. It is well-known that the structure

Alpay, S. Pamir

86

Predicting New TiO2 Phases with Low Band Gaps by a Multiobjective Global Optimization Approach  

E-Print Network [OSTI]

stable. This is equivalent to a global optimization problem of a biobjective function, i.e., total energyPredicting New TiO2 Phases with Low Band Gaps by a Multiobjective Global Optimization Approach Hou as a novel global optimization algorithm to predict new polymorphs of bulk TiO2 with better optical

Gong, Xingao

87

Wide-band-gap InAlAs solar cell for an alternative multijunction approach Marina S. Leite,1,a  

E-Print Network [OSTI]

Wide-band-gap InAlAs solar cell for an alternative multijunction approach Marina S. Leite,1,a Robyn L. Woo,2 William D. Hong,2 Daniel C. Law,2 and Harry A. Atwater1 1 California Institute of Technology, 1200 E. California Blvd., Pasadena, California 91125, USA 2 Boeing-Spectrolab Inc., 12500

Atwater, Harry

88

Ferromagnetism in Doped Thin-Film Oxide and Nitride Semiconductors and Dielectrics  

SciTech Connect (OSTI)

The principal goal in the field of high-Tc ferromagnetic semiconductors is the synthesis, characterization and utilization of semiconductors which exhibit substantial carrier spin polarization at and above room temperature. Such materials are of critical importance in the emerging field of semiconductor spintronics. The interaction leading to carrier spin polarization, exchange coupling between the dopant spins and the valence or conduction band, is known to be sufficiently weak in conventional semiconductors, such as GaAs and Si, that magnetic ordering above cryogenic temperatures is essentially impossible. Since the provocative theoretical predictions of Tc above ambient in p-Mn:ZnO and p-Mn:GaN (T. Dietl et al., Science 287 1019 (2000)), and the observation of room-temperature ferromagnetism in Co:TiO2 anatase (Y. Matsumoto et al., Science 291 854 (2001)), there has been a flurry of work in oxides and nitrides doped with transition metals with unpaired d electrons. It has even been claimed that room-temperature ferromagnetism can be obtained in certain d0 transition metals oxides without a dopant. In this Report, the field of transition metal doped oxides and nitrides is critically reviewed and assessed from a materials science perspective. Since much of the field centers around thin film growth, this Report focuses on films prepared not only by conventional vacuum deposition methods, but also by spin coating colloidal nanoparticles.

Chambers, Scott A.

2006-10-01T23:59:59.000Z

89

Photonic band gap airbridge microcavity resonances in GaAs/AlxOy waveguides  

E-Print Network [OSTI]

-dielectric-contrast GaAs/AlxOy III­V compound semiconductor structure. The photonic crystal is defined by a regularly of optical states will be modified and quantized by such a cavity. Typical semiconductor optical cavities measurements of a one- dimensional PBG air-bridge optical microcavity are pre- sented here. A schematic

Fan, Shanhui

90

Gallium arsenide-based ternary compounds and multi-band-gap solar cell research  

SciTech Connect (OSTI)

Aim of this contract is the achievement of a high-efficiency, low-cost solar cell. The basic approach to the problem is centered upon the heteroepitaxial growth of a III-V compound material onto a single-crystal silicon wafer. The growth technique employed is metalorganic chemical vapor deposition. The silicon wafer may serve as a mechanical substrate and ohmic contact for a single-junction device, or may contain a p-n junction of its own and form the bottom cell of a two junction tandem solar cell structure. The III-V material for the single-junction case is GaAs and for the two-junction case is either GaAlAs or GaAsP, either material having the proper composition to yield a band gap of approximately 1.7 eV. Results achieved in this contract include the following: (1) a 17.6% efficient GaAs-on-Si solar cell; (2) an 18.5% efficient GaAs-on-Si concentrator solar cell at 400 suns; (3) a 24.8% efficient GaAs-on-GaAs solar cell; (4) a 28.7% efficient GaAs-on-GaAs concentrator solar cell at 200 suns; (5) measurement of the effects of dislocation density and emitter doping on GaAs cells; and (6) improvements in the growth process to achieve reproducible thin AlGaAs window layers with low recombination velocities and environmental stability.

Vernon, S. (Spire Corp., Bedford, MA (United States))

1993-02-01T23:59:59.000Z

91

PHYSICAL REVIEW B 90, 115209 (2014) Computational search for direct band gap silicon crystals  

E-Print Network [OSTI]

abundance, silicon is the preferred solar-cell material despite the fact that current silicon materials have semiconductor. For this reason, the most widely used solar-cell materials are all silicon based [1]. Current

Lee, Jooyoung

92

X-Band Photonic Band-Gap Accelerator Structure Breakdown Experiment  

SciTech Connect (OSTI)

In order to understand the performance of photonic band-gap (PBG) structures under realistic high gradient, high power, high repetition rate operation, a PBG accelerator structure was designed and tested at X band (11.424 GHz). The structure consisted of a single test cell with matching cells before and after the structure. The design followed principles previously established in testing a series of conventional pillbox structures. The PBG structure was tested at an accelerating gradient of 65 MV/m yielding a breakdown rate of two breakdowns per hour at 60 Hz. An accelerating gradient above 110 MV/m was demonstrated at a higher breakdown rate. Significant pulsed heating occurred on the surface of the inner rods of the PBG structure, with a temperature rise of 85 K estimated when operating in 100 ns pulses at a gradient of 100 MV/m and a surface magnetic field of 890 kA/m. A temperature rise of up to 250 K was estimated for some shots. The iris surfaces, the location of peak electric field, surprisingly had no damage, but the inner rods, the location of the peak magnetic fields and a large temperature rise, had significant damage. Breakdown in accelerator structures is generally understood in terms of electric field effects. These PBG structure results highlight the unexpected role of magnetic fields in breakdown. The hypothesis is presented that the moderate level electric field on the inner rods, about 14 MV/m, is enhanced at small tips and projections caused by pulsed heating, leading to breakdown. Future PBG structures should be built to minimize pulsed surface heating and temperature rise.

Marsh, Roark A.; /MIT /MIT /NIFS, Gifu /JAERI, Kyoto /LLNL, Livermore; Shapiro, Michael A.; Temkin, Richard J.; /MIT; Dolgashev, Valery A.; Laurent, Lisa L.; Lewandowski, James R.; Yeremian, A.Dian; Tantawi, Sami G.; /SLAC

2012-06-11T23:59:59.000Z

93

Thermovoltaic semiconductor device including a plasma filter  

DOE Patents [OSTI]

A thermovoltaic energy conversion device and related method for converting thermal energy into an electrical potential. An interference filter is provided on a semiconductor thermovoltaic cell to pre-filter black body radiation. The semiconductor thermovoltaic cell includes a P/N junction supported on a substrate which converts incident thermal energy below the semiconductor junction band gap into electrical potential. The semiconductor substrate is doped to provide a plasma filter which reflects back energy having a wavelength which is above the band gap and which is ineffectively filtered by the interference filter, through the P/N junction to the source of radiation thereby avoiding parasitic absorption of the unusable portion of the thermal radiation energy.

Baldasaro, Paul F. (Clifton Park, NY)

1999-01-01T23:59:59.000Z

94

Fast 8 kV metal-oxide semiconductor field-effect transistor switch R. E. Continetti, D. R. Cyr,al and D. M. Neumarkb)  

E-Print Network [OSTI]

V. A key to this approach is the use of a metal-oxide varistor (MOV) to clamp the voltage acrossa givenFast 8 kV metal-oxide semiconductor field-effect transistor switch R. E. Continetti, D. R. Cyr transformer-isolatedpower metal-oxide semiconductor field-effect transistors in seriesis described

Neumark, Daniel M.

95

Band-Gap Reduction and Dopant Interaction in Epitaxial La,Cr Co-doped SrTiO3 Thin Films  

SciTech Connect (OSTI)

We show that by co-doping SrTiO3 (STO) epitaxial thin films with equal amounts of La and Cr it is possible to produce films with an optical band gap ~0.9 eV lower than that of undoped STO. Sr1-xLaxTi1-xCrxO3 thin films were deposited by molecular beam epitaxy and characterized using x-ray photoelectron spectroscopy and x-ray absorption near-edge spectroscopy to show that the Cr dopants are almost exclusively in the Cr3+ oxidation state. Extended x-ray absorption fine structure measurements and theoretical modeling suggest that it is thermodynamically preferred for La and Cr dopants to occupy nearest neighbor A- and B-sites in the lattice. Transport measurements show that the material exhibits variable-range hopping conductivity with high resistivity. These results create new opportunities for the use of doped STO films in photovoltaic and photocatalytic applications.

Comes, Ryan B.; Sushko, Petr; Heald, Steve M.; Colby, Robert J.; Bowden, Mark E.; Chambers, Scott A.

2014-12-03T23:59:59.000Z

96

Lattice matched semiconductor growth on crystalline metallic substrates  

DOE Patents [OSTI]

Methods of fabricating a semiconductor layer or device and said devices are disclosed. The methods include but are not limited to providing a metal or metal alloy substrate having a crystalline surface with a known lattice parameter (a). The methods further include growing a crystalline semiconductor alloy layer on the crystalline substrate surface by coincident site lattice matched epitaxy. The semiconductor layer may be grown without any buffer layer between the alloy and the crystalline surface of the substrate. The semiconductor alloy may be prepared to have a lattice parameter (a') that is related to the lattice parameter (a). The semiconductor alloy may further be prepared to have a selected band gap.

Norman, Andrew G; Ptak, Aaron J; McMahon, William E

2013-11-05T23:59:59.000Z

97

AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors using barium strontium titanate  

E-Print Network [OSTI]

AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors using barium strontium-effect transistors have been formed by incorporating barium strontium titanate (BST) deposited by rf magnetron in increased leakage. Due to its large dielectric constant, barium strontium ti- tanate [Ba1-xSrxTiO3, (BST

York, Robert A.

98

Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems  

SciTech Connect (OSTI)

The Al{sub 2}O{sub 3}/GaAs and HfO{sub 2}/GaAs interfaces after atomic layer deposition are studied using in situ monochromatic x-ray photoelectron spectroscopy. Samples are deliberately exposed to atmospheric conditions and interfacial oxide re-growth is observed. The extent of this re-growth is found to depend on the dielectric material and the exposure temperature. Comparisons with previous studies show that ex situ characterization can result in misleading conclusions about the interface reactions occurring during the metal oxide deposition process.

McDonnell, S.; Dong, H.; Hawkins, J. M.; Brennan, B.; Milojevic, M.; Aguirre-Tostado, F. S.; Zhernokletov, D. M.; Hinkle, C. L.; Kim, J.; Wallace, R. M.

2012-04-02T23:59:59.000Z

99

Transient radiation hardened CMOS (complementary metal oxide semiconductor) operational amplifiers. Master's thesis  

SciTech Connect (OSTI)

General strategies are developed for designing radiation hardened bulk and silicon on insulator (SOI) complementary metal oxide semiconductor (CMOS) operational amplifiers. Comparisons are made between each technology concerning photocurrent mechanisms and the inherent advantages of SOI CMOS. Methods are presented for analysing circuit designs and minimizing the net photocurrent responses. Analysis is performed on standard operational amplifier circuits and subcircuits to demonstrate the usefulness of these methods. Radiation hardening topics discussed include superior radiation hardened topologies, photocurrent compensation and its limitations, and methods to ensure a preferred direction of photocurrent response. Several operational amplifier subcircuits are compared for their hardness characteristics. Folded cascode and three-stage operational amplifiers were fabricated on an SOI CMOS test chip supported by Texas Instruments, Incorporated. At the time of publication, the circuit operation was verified but radiation data were not yet available.

Trombley, G.J.

1989-01-01T23:59:59.000Z

100

Physics of band-gap formation and its evolution in the pillar-based phononic crystal structures  

SciTech Connect (OSTI)

In this paper, the interplay of Bragg scattering and local resonance is theoretically studied in a phononic crystal (PnC) structure composed of a silicon membrane with periodic tungsten pillars. The comparison of phononic band gaps (PnBGs) in three different lattice types (i.e., square, triangular, and honeycomb) with different pillar geometries shows that different PnBGs have varying degrees of dependency on the lattice symmetry based on the interplay of the local resonances and the Bragg effect. The details of this interplay is discussed. The significance of locally resonating pillars, specially in the case of tall pillars, on PnBGs is discussed and verified by examining the PnBG position and width in perturbed lattices via Monte Carlo simulations. It is shown that the PnBGs caused by the local resonance of the pillars are more resilient to the lattice perturbations than those caused by Bragg scattering.

Pourabolghasem, Reza; Mohammadi, Saeed; Eftekhar, Ali Asghar; Adibi, Ali [School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); Khelif, Abdelkrim [Institut FEMTO-ST, Université de Franche-Comté, CNRS, 32 Avenue de l'Observatoire, 25044 Besançon Cedex (France)

2014-07-07T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


101

Investigation of anisotropic photonic band gaps in three-dimensional magnetized plasma photonic crystals containing the uniaxial material  

SciTech Connect (OSTI)

In this paper, the dispersive properties of three-dimensional (3D) magnetized plasma photonic crystals (MPPCs) composed of anisotropic dielectric (the uniaxial material) spheres immersed in homogeneous magnetized plasma background with face-centered-cubic (fcc) lattices are theoretically investigated by the plane wave expansion method, as the Voigt effects of magnetized plasma are considered. The equations for calculating the anisotropic photonic band gaps (PBGs) in the first irreducible Brillouin zone are theoretically deduced. The anisotropic PBGs and two flatbands regions can be obtained. The effects of the ordinary-refractive index, extraordinary-refractive index, filling factor, plasma frequency, and external magnetic field on the dispersive properties of the 3D MPPCs are investigated in detail, respectively, and some corresponding physical explanations are also given. The numerical results show that the anisotropy can open partial band gaps in 3D MPPCs with fcc lattices and the complete PBGs can be found compared to the conventional 3D MPPCs doped by the isotropic material. The bandwidths of PBGs can be tuned by introducing the magnetized plasma into 3D PCs containing the uniaxial material. It is also shown that the anisotropic PBGs can be manipulated by the ordinary-refractive index, extraordinary-refractive index, filling factor, plasma frequency, and external magnetic field, respectively. The locations of flatbands regions cannot be manipulated by any parameters except for the plasma frequency and external magnetic field. Introducing the uniaxial material can obtain the complete PBGs as the 3D MPPCs with high symmetry and also provides a way to design the tunable devices.

Zhang, Hai-Feng [College of Electronic and Information Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016 (China) [College of Electronic and Information Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016 (China); Nanjing Artillery Academy, Nanjing 211132 (China)] [China; Liu, Shao-Bin; Kong, Xiang-Kun [College of Electronic and Information Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016 (China)] [College of Electronic and Information Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016 (China)

2013-09-15T23:59:59.000Z

102

Band-gap nonlinear optical generation: The structure of internal optical field and the structural light focusing  

SciTech Connect (OSTI)

A novel approach for the enhancement of nonlinear optical effects inside globular photonic crystals (PCs) is proposed and systematically studied via numerical simulations. The enhanced optical harmonic generation is associated with two- and three-dimensional PC pumping with the wavelength corresponding to different PC band-gaps. The interactions between light and the PC are numerically simulated using the finite-difference time-domain technique for solving the Maxwell's equations. Both empty and infiltrated two-dimensional PC structures are considered. A significant enhancement of harmonic generation is predicted owing to the highly efficient PC pumping based on the structural light focusing effect inside the PC structure. It is shown that a highly efficient harmonic generation could be attained for both the empty and infiltrated two- and three-dimensional PCs. We are demonstrating the ability for two times enhancement of the parametric decay efficiency, one order enhancement of the second harmonic generation, and two order enhancement of the third harmonic generation in PC structures in comparison to the nonlinear generations in appropriate homogenous media. Obviously, the nonlinear processes should be allowed by the molecular symmetry. The criteria of the nonlinear process efficiency are specified and calculated as a function of pumping wavelength position towards the PC globule diameter. Obtained criterion curves exhibit oscillating characteristics, which indicates that the highly efficient generation corresponds to the various PC band-gap pumping. The highest efficiency of nonlinear conversions could be reached for PC pumping with femtosecond optical pulses; thus, the local peak intensity would be maximized. Possible applications of the observed phenomenon are also discussed.

Zaytsev, Kirill I., E-mail: kirzay@gmail.com; Katyba, Gleb M.; Yakovlev, Egor V.; Yurchenko, Stanislav O., E-mail: st.yurchenko@mail.ru [Bauman Moscow State Technical University, 2nd Baumanskaya str. 5, Moscow 105005 (Russian Federation); Gorelik, Vladimir S. [P. N. Lebedev Physics Institute of the Russian Academy of Sciences, Leninskiy Prospekt 53, Moscow 119991 (Russian Federation)

2014-06-07T23:59:59.000Z

103

Iron oxidation state of FeTiO3 under high pressure X. Wu,1,* G. Steinle-Neumann,1 O. Narygina,1 I. Kantor,1,2 C. McCammon,1 S. Pascarelli,3 G. Aquilanti,3 V. Prakapenka,2  

E-Print Network [OSTI]

the oxygen bridge in the adjacent octahedral, then decreases at higher pressure due to the ilmenite in the materials and earth sci- ences. Ilmenite is a wide-band-gap semiconductor with a 2.5 eV band gap,1 which

Steinle-Neumann, Gerd

104

PHYSICAL REVIEW B 85, 155101 (2012) Electronic properties of layered multicomponent wide-band-gap oxides: A combinatorial approach  

E-Print Network [OSTI]

devices including solar cells, smart windows, and flat panel displays, and they also find application as heating, antistatic, and optical coatings (for select reviews, see Refs. 1­7). Multicomponent TCOs

Medvedeva, Julia E.

105

PHYSICAL REVIEW B 86, 085123 (2012) Composition-dependent oxygen vacancy formation in multicomponent wide-band-gap oxides  

E-Print Network [OSTI]

PHYSICAL REVIEW B 86, 085123 (2012) Composition-dependent oxygen vacancy formation University of Science and Technology, Rolla, Missouri 65409, USA (Received 17 April 2012; revised manuscript received 19 July 2012; published 16 August 2012) The formation and distribution of oxygen vacancy

Medvedeva, Julia E.

106

On the sub-band gap optical absorption in heat treated cadmium sulphide thin film deposited on glass by chemical bath deposition technique  

SciTech Connect (OSTI)

The sub-band gap optical absorption in chemical bath deposited cadmium sulphide thin films annealed at different temperatures has been critically analyzed with special reference to Urbach relation. It has been found that the absorption co-efficient of the material in the sub-band gap region is nearly constant up to a certain critical value of the photon energy. However, as the photon energy exceeds the critical value, the absorption coefficient increases exponentially indicating the dominance of Urbach rule. The absorption coefficients in the constant absorption region and the Urbach region have been found to be sensitive to annealing temperature. A critical examination of the temperature dependence of the absorption coefficient indicates two different kinds of optical transitions to be operative in the sub-band gap region. After a careful analyses of SEM images, energy dispersive x-ray spectra, and the dc current-voltage characteristics, we conclude that the absorption spectra in the sub-band gap domain is possibly associated with optical transition processes involving deep levels and the grain boundary states of the material.

Chattopadhyay, P.; Karim, B.; Guha Roy, S. [Department of Electronic Science, University of Calcutta, 92, A.P.C. Road, Kolkata 700009 (India)

2013-12-28T23:59:59.000Z

107

Size-dependent shifts of the Néel temperature and optical band-gap in NiO nanoparticles  

SciTech Connect (OSTI)

Bulk NiO is a well-known antiferromagnet with Neel temperature T{sub N}(?)?=?524?K and an optical band-gap E{sub g}?=?4.3?eV. With decrease in particle size D from 40?nm to 4?nm of NiO, systematic changes of T{sub N} and E{sub g} are observed and discussed here. From magnetic measurements, the changes in T{sub N} with D are found to fit finite-size scaling equation T{sub N}(D)?=?T{sub N}(?) [1 ? (?{sub o}/D){sup ?}] with ??=?3.2?±?0.5 and ?{sub o}?=?3.2?±?0.2?nm, in good agreement with the predictions for a Heisenberg system. The observed blue shifts of E{sub g} with decrease in D reaching E{sub g}?=?5.12?eV for D???4?nm are likely due to quantum confinement and non-stoichiometry.

Thota, Subhash, E-mail: mseehra@wvu.edu, E-mail: subhasht@iitg.ac.in [Department of Physics, Indian Institute of Technology, Guwahati, Assam 781039 (India); Shim, J. H.; Seehra, M. S., E-mail: mseehra@wvu.edu, E-mail: subhasht@iitg.ac.in [Department of Physics and Astronomy, West Virginia University, Morgantown, West Virginia 26506 (United States)

2013-12-07T23:59:59.000Z

108

High temperature thermoelectric characterization of III-V semiconductor thin films by oxide bonding  

E-Print Network [OSTI]

-W-N diffusion barrier. A thermoelectric material, thin film ErAs:InGaAlAs metal/semiconductor nanocomposite temperature to 840 K for this material and the results show the thermoelectric power factor multiplied material characterization of semiconductor thin films for thermoelectric power generation, photovoltaic

Bowers, John

109

High-Temperature Thermoelectric Characterization of IIIV Semiconductor Thin Films by Oxide Bonding  

E-Print Network [OSTI]

-temperature thermoelectric charac- terization of thin-film III­V semiconductor materials that suffer from the side- effect-temperature surface passivation, and metallization with a Ti-W-N diffusion barrier. A thermoelectric material, thin-temperature material characterization of semiconductor thin films for thermoelectric power generation, photovoltaic

110

Visible-light absorption and large band-gap bowing of GaN1-xSbx from first principles  

DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

Applicability of the Ga(Sbx)N1-x alloys for practical realization of photoelectrochemical water splitting is investigated using first-principles density functional theory incorporating the local density approximation and generalized gradient approximation plus the Hubbard U parameter formalism. Our calculations reveal that a relatively small concentration of Sb impurities is sufficient to achieve a significant narrowing of the band gap, enabling absorption of visible light. Theoretical results predict that Ga(Sbx)N1-x alloys with 2-eV band gaps straddle the potential window at moderate to low pH values, thus indicating that dilute Ga(Sbx)N1-x alloys could be potential candidates for splitting water under visible light irradiation.

Sheetz, R. Michael; Richter, Ernst; Andriotis, Antonis N.; Lisenkov, Sergey; Pendyala, Chandrashekhar; Sunkara, Mahendra K.; Menon, Madhu

2011-08-01T23:59:59.000Z

111

Structure and red shift of optical band gap in CdO–ZnO nanocomposite synthesized by the sol gel method  

SciTech Connect (OSTI)

The structure and the optical band gap of CdO–ZnO nanocomposites were studied. Characterization using X-ray diffraction (XRD), transmission electron microscopy (TEM) and diffuse reflectance spectroscopy (DRS) analysis confirms that CdO phase is present in the nanocomposites. TEM analysis confirms the formation of spheroidal nanoparticles and nanorods. The particle size was calculated from Debey–Sherrer?s formula and corroborated by TEM images. FTIR spectroscopy shows residual organic materials (aromatic/Olefinic carbon) from nanocomposites surface. CdO content was modified in the nanocomposites in function of polyvinylalcohol (PVA) added. The optical band gap is found to be red shift from 3.21 eV to 3.11 eV with the increase of CdO content. Photoluminescence (PL) measurements reveal the existence of defects in the synthesized CdO–ZnO nanocomposites. - Graphical abstract: Optical properties of ZnO, CdO and ZnO/CdO nanoparticles. Display Omitted - Highlights: • TEM analysis confirms the presence of spherical nanoparticles and nanorods. • The CdO phase is present in the nanocomposites. • The band gap of the CdO–ZnO nanocomposites is slightly red shift with CdO content. • PL emission of CdO–ZnO nanocomposite are associated to structural defects.

Mosquera, Edgar, E-mail: edemova@ing.uchile.cl [Laboratorio de Materiales a Nanoescala, Departamento de Ciencia de los Materiales, Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Av. Tupper 2069, Santiago (Chile); Pozo, Ignacio del, E-mail: ignacio.dpf@gmail.com [Facultad de Ciencias Naturales, Matemáticas y del Medio Ambiente, Universidad Tecnológica Metropolitana, Av. José Pedro Alessandri 1242, Santiago (Chile); Morel, Mauricio, E-mail: mmorel@ing.uchile.cl [Laboratorio de Materiales a Nanoescala, Departamento de Ciencia de los Materiales, Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Av. Tupper 2069, Santiago (Chile)

2013-10-15T23:59:59.000Z

112

Searching Room Temperature Ferromagnetism in Wide Gap Semiconductors Fe-doped Strontium Titanate and Zinc Oxide  

E-Print Network [OSTI]

Scientic findings in the very beginning of the millennium are taking us a step further in the new paradigm of technology: spintronics. Upgrading charge-based electronics with the additional degree of freedom of the carriers spin-state, spintronics opens a path to the birth of a new generation of devices with the potential advantages of non-volatility and higher processing speed, integration densities and power efficiency. A decisive step towards this new age lies on the attribution of magnetic properties to semiconductors, the building block of today's electronics, that is, the realization of ferromagnetic semiconductors (FS) with critical temperatures above room temperature. Unfruitful search for intrinsic RT FS lead to the concept of Dilute(d) Magnetic Semiconductors (DMS): ordinary semiconductor materials where 3 d transition metals randomly substitute a few percent of the matrix cations and, by some long-range mechanism, order ferromagnetically. The times are of intense research activity and the last few ...

Pereira, LMC; Wahl, U

113

Multichannel, time-resolved picosecond laser ultrasound imaging and spectroscopy with custom complementary metal-oxide-semiconductor detector  

SciTech Connect (OSTI)

This paper presents a multichannel, time-resolved picosecond laser ultrasound system that uses a custom complementary metal-oxide-semiconductor linear array detector. This novel sensor allows parallel phase-sensitive detection of very low contrast modulated signals with performance in each channel comparable to that of a discrete photodiode and a lock-in amplifier. Application of the instrument is demonstrated by parallelizing spatial measurements to produce two-dimensional thickness maps on a layered sample, and spectroscopic parallelization is demonstrated by presenting the measured Brillouin oscillations from a gallium arsenide wafer. This paper demonstrates the significant advantages of our approach to pump probe systems, especially picosecond ultrasonics.

Smith, Richard J.; Light, Roger A.; Johnston, Nicholas S.; Pitter, Mark C.; Somekh, Mike G. [Institute of Biophysics, Imaging and Optical Science, University of Nottingham, Nottinghamshire NG7 2RD (United Kingdom); Sharples, Steve D. [Applied Optics Group, Electrical Systems and Optics Research Division, University of Nottingham, Nottinghamshire NG7 2RD (United Kingdom)

2010-02-15T23:59:59.000Z

114

Investigation on edge fringing effect and oxide thickness dependence of inversion current in metal-oxide-semiconductor tunneling diodes with comb-shaped electrodes  

SciTech Connect (OSTI)

A particular edge-dependent inversion current behavior of metal-oxide-semiconductor (MOS) tunneling diodes was investigated utilizing square and comb-shaped electrodes. The inversion tunneling current exhibits the strong dependence on the tooth size of comb-shaped electrodes and oxide thickness. Detailed illustrations of current conduction mechanism are developed by simulation and experimental measurement results. It is found that the electron diffusion current and Schottky barrier height lowering for hole tunneling current both contribute on inversion current conduction. In MOS tunneling photodiode applications, the photoresponse can be improved by decreasing SiO{sub 2} thickness and using comb-shaped electrodes with smaller tooth spacing. Meantime, the high and steady photosensitivity can also be approached by introducing HfO{sub 2} into dielectric stacks.

Lin, Chien-Chih; Hsu, Pei-Lun; Lin, Li; Hwu, Jenn-Gwo, E-mail: jghwu@ntu.edu.tw [Graduate Institute of Electronics Engineering, Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan (China)

2014-03-28T23:59:59.000Z

115

Nonadiabatic electron transfer at the nanoscale tin-oxide semiconductor/aqueous solution interface  

E-Print Network [OSTI]

are of considerable interest in the context of dye-sensitized liquid-junction cells for sunlight-to-electrical- energy forward and back electron transfer reactions involving molecular dyes and wide bandgap semiconductors conversion ­ for example, Grätzel cells.1­3 We have examined the kinetics of back electron transfer (b

116

Theory of non-Markovian decay of a cascade atom in high-Q cavities and photonic band-gap materials  

E-Print Network [OSTI]

The dynamics of a three-level atom in a cascade configuration with both transitions coupled to a single structured reservoir of quantized field modes is treated using Laplace transform methods applied to the coupled amplitude equations. Results are also obtained from master equations by two different approaches, that is, involving either pseudomodes or quasimodes. Two different types of reservoir are considered, namely a high-Q cavity and a photonic band-gap system, in which the respective reservoir structure functions involve Lorentzians. Non-resonant transitions are included in the model. In all cases non-Markovian behaviour for the atomic system can be found, such as oscillatory decay for the high-Q cavity case and population trapping for the photonic band-gap case. In the master equation approaches, the atomic system is augmented by a small number of pseudomodes or quasimodes, which in the quasimode approach themselves undergo Markovian relaxation into a flat reservoir of continuum quasimodes. Results from these methods are found to be identical to those from the Laplace transform method including two-photon excitation of the reservoir with both emitting sequences. This shows that complicated non-Markovian decays of an atomic system into structured EM field reservoirs can be described by Markovian models for the atomic system coupled to a small number of pseudomodes or quasimodes.

B. M. Garraway; B. J. Dalton

2006-02-13T23:59:59.000Z

117

Experimental study on vertical scaling of InAs-on-insulator metal-oxide-semiconductor field-effect transistors  

SciTech Connect (OSTI)

We have investigated effects of the vertical scaling on electrical properties in extremely thin-body InAs-on-insulator (-OI) metal-oxide-semiconductor field-effect transistors (MOSFETs). It is found that the body thickness (T{sub body}) scaling provides better short channel effect (SCE) control, whereas the T{sub body} scaling also causes the reduction of the mobility limited by channel thickness fluctuation (?T{sub body}) scattering (?{sub fluctuation}). Also, in order to achieve better SCEs control, the thickness of InAs channel layer (T{sub channel}) scaling is more favorable than the thickness of MOS interface buffer layer (T{sub buffer}) scaling from a viewpoint of a balance between SCEs control and ?{sub fluctuation} reduction. These results indicate necessity of quantum well channel structure in InAs-OI MOSFETs and these should be considered in future transistor design.

Kim, SangHyeon, E-mail: dadembyora@mosfet.t.u-tokyo.ac.jp, E-mail: sh-kim@kist.re.kr; Yokoyama, Masafumi; Nakane, Ryosho; Takenaka, Mitsuru; Takagi, Shinichi [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Ichikawa, Osamu; Osada, Takenori; Hata, Masahiko [Sumitomo Chemical Co., Ltd., 6 Kitahara, Tsukuba, Ibaraki 300-3294 (Japan)

2014-06-30T23:59:59.000Z

118

Electronic properties and reliability of the silicon dioxide / silicon carbide interface.  

E-Print Network [OSTI]

??Silicon carbide has been preferred over other wide band-gap semiconductors for high power applications because of its unique ability to grow a thermal oxide, challenges… (more)

Rozen, John

2008-01-01T23:59:59.000Z

119

PHYSICAL REVIEW B 84, 245206 (2011) First-principles study of band gap engineering via oxygen vacancy doping  

E-Print Network [OSTI]

formulate guidelines that can be used to predict the location of oxygen vacancies in perovskite solid transport of O2- ions through the oxide electrolyte membrane over a range of temperatures. In solar energy several chemical compositions and different cation arrangements for the two Zr-modified solid solutions

Rappe, Andrew M.

120

Oxide-based method of making compound semiconductor films and making related electronic devices  

DOE Patents [OSTI]

A method for forming a compound film includes the steps of preparing a source material, depositing the source material on a base and forming a preparatory film from the source material, heating the preparatory film in a suitable atmosphere to form a precursor film, and providing suitable material to said precursor film to form the compound film. The source material includes oxide-containing particles including Group IB and IIIA elements. The precursor film includes non-oxide Group IB and IIIA elements. The compound film includes a Group IB-IIIA-VIA compound. The oxides may constitute greater than about 95 molar percent of the Group IB elements and greater than about 95 molar percent of the Group IIIA elements in the source material. Similarly, non-oxides may constitute greater than about 95 molar percent of the Group IB elements and greater than about 95 molar percent of the Group IIIA elements in the precursor film. The molar ratio of Group IB to Group IIIA elements in the source material may be greater than about 0.6 and less than about 1.0, or substantially greater that 1.0, in which case this ratio in the compound film may be reduced to greater than about 0.6 and less than about 1.0. The source material may be prepared as an ink from particles in powder form. The oxide-containing particles may include a dopant, as may the compound film. Compound films including a Group IIB-IVA-VA compound may be substituted using appropriate substitutions in the method. The method, also, is applicable to fabrication of solar cells and other electronic devices.

Kapur, Vijay K. (Tarzana, CA); Basol, Bulent M. (Manhattan Beach, CA); Leidholm, Craig R. (Woodland Hills, CA); Roe, Robert A. (Glendale, CA)

2000-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


121

Direct observation of both contact and remote oxygen scavenging of GeO{sub 2} in a metal-oxide-semiconductor stack  

SciTech Connect (OSTI)

In the path to incorporating Ge based metal-oxide-semiconductor into modern nano-electronics, one of the main issues is the oxide-semiconductor interface quality. Here, the reactivity of Ti on Ge stacks and the scavenging effect of Ti were studied using synchrotron X-ray photoelectron spectroscopy measurements, with an in-situ metal deposition and high resolution transmission electron microscopy imaging. Oxygen removal from the Ge surface was observed both in direct contact as well as remotely through an Al{sub 2}O{sub 3} layer. The scavenging effect was studied in situ at room temperature and after annealing. We find that the reactivity of Ti can be utilized for improved scaling of Ge based devices.

Fadida, S., E-mail: sivanfa@tx.technion.ac.il; Shekhter, P.; Eizenberg, M. [Department of Materials Science and Engineering, Technion-Israel Institute of Technology, Haifa (Israel); Cvetko, D. [Laboratorio TASC/IOM-CNR, Area di ricerca, Trieste (Italy); Department of Physics, Faculty of Mathematics and Physics, University of Ljubljana, Ljubljana (Slovenia); Floreano, L.; Verdini, A. [Laboratorio TASC/IOM-CNR, Area di ricerca, Trieste (Italy); Nyns, L.; Van Elshocht, S. [Imec, Kapeldreef 75, B-3001 Leuven (Belgium); Kymissis, I. [Department of Electrical Engineering, Columbia University, New York, New York 10027 (United States)

2014-10-28T23:59:59.000Z

122

Electronic properties of III-nitride semiconductors: A first-principles investigation using the Tran-Blaha modified Becke-Johnson potential  

SciTech Connect (OSTI)

In this work, we use density functional theory to investigate the influence of semilocal exchange and correlation effects on the electronic properties of III-nitride semiconductors considering zinc-blende and wurtzite crystal structures. We find that the inclusion of such effects through the use of the Tran-Blaha modified Becke-Johnson potential yields an excellent description of the electronic structures of these materials giving energy band gaps which are systematically larger than the ones obtained with standard functionals such as the generalized gradient approximation. The discrepancy between the experimental and theoretical band gaps is then significantly reduced with semilocal exchange and correlation effects. However, the effective masses are overestimated in the zinc-blende nitrides, but no systematic trend is found in the wurtzite compounds. New results for energy band gaps and effective masses of zinc-blende and wurtzite indium nitrides are presented.

Araujo, Rafael B., E-mail: rafaelbna@gmail.com; Almeida, J. S. de, E-mail: jailton-almeida@hotmail.com; Ferreira da Silva, A. [Instituto de Física, Universidade Federal da Bahia, Campus Universitário de Ondina, 40210-340 Salvador, Bahia (Brazil)

2013-11-14T23:59:59.000Z

123

VOLUME 84, NUMBER 19 P H Y S I C A L R E V I E W L E T T E R S 8 MAY 2000 Theory and Experiments on Elastic Band Gaps  

E-Print Network [OSTI]

Investigaciones Científicas (CSIC), Serrano 144, 28006 Madrid, Spain 2 Ames Laboratory, Iowa State University, Ames, Iowa 50011 3 Instituto de Acústica, CSIC, Serrano 144, 28006 Madrid, Spain 4 Instituto de Física Aplicada, CSIC, Serrano 144, 28006 Madrid, Spain (Received 26 February 1999) We study elastic band gaps

124

Hybrid density functional calculations of the band gap of GaxIn1-xN Xifan Wu,1 Eric J. Walter,2 Andrew M. Rappe,3 Roberto Car,1 and Annabella Selloni1  

E-Print Network [OSTI]

Hybrid density functional calculations of the band gap of GaxIn1-xN Xifan Wu,1 Eric J. Walter,2 Andrew M. Rappe,3 Roberto Car,1 and Annabella Selloni1 1Chemistry Department, Princeton University Recent theoretical work has provided evidence that hybrid functionals, which include a fraction of exact

Rappe, Andrew M.

125

Selective CO{sub 2} reduction conjugated with H{sub 2}O oxidation utilizing semiconductor/metal-complex hybrid photocatalysts  

SciTech Connect (OSTI)

We developed a new hybrid photocatalyst for CO{sub 2} reduction, which is composed of a semiconductor and a metal complex. In the hybrid photocatalyst, ?G between the position of conduction band minimum (E{sub CBM}) of the semiconductor and the CO{sub 2} reduction potential of the complex is an essential factor for realizing fast electron transfer from the conduction band of semiconductor to metal complex leading to high photocatalytic activity. On the basis of this concept, the hybrid photocatalyst InP/Ru-complex, which functions in aqueous media, was developed. The photoreduction of CO{sub 2} to formate using water as an electron donor and a proton source was successfully achieved as a Z-scheme system by functionally conjugating the InP/Ru-complex photocatalyst for CO{sub 2} reduction with a TiO{sub 2} photocatalyst for water oxidation. The conversion efficiency from solar energy to chemical energy was ca. 0.04%, which approaches that for photosynthesis in a plant. Because this system can be applied to many other inorganic semiconductors and metal-complex catalysts, the efficiency and reaction selectivity can be enhanced by optimization of the electron transfer process including the energy-band configurations, conjugation conformations, and catalyst structures. This electrical-bias-free reaction is a huge leap forward for future practical applications of artificial photosynthesis under solar irradiation to produce organic species.

Morikawa, T., E-mail: morikawa@mosk.tytlabs.co.jp; Sato, S., E-mail: morikawa@mosk.tytlabs.co.jp; Arai, T., E-mail: morikawa@mosk.tytlabs.co.jp; Uemura, K., E-mail: morikawa@mosk.tytlabs.co.jp; Yamanaka, K. I., E-mail: morikawa@mosk.tytlabs.co.jp; Suzuki, T. M., E-mail: morikawa@mosk.tytlabs.co.jp; Kajino, T., E-mail: morikawa@mosk.tytlabs.co.jp; Motohiro, T., E-mail: morikawa@mosk.tytlabs.co.jp [Toyota Central R and D Labs, Inc., Nagakute, Aichi 480-1192 (Japan)

2013-12-10T23:59:59.000Z

126

Band gap of CdTe and Cd{sub 0.9}Zn{sub 0.1}Te crystals  

SciTech Connect (OSTI)

The band gap E{sub g} of the CdTe and Cd{sub 0.9}Zn{sub 0.1}Te crystals and its temperature dependence are determined by optical methods. This is motivated by considerable contradictoriness of the published data, which hampers the interpretation and calculation of characteristics of detectors of X-ray and {gamma} radiation based on these materials (E{sub g} = 1.39-1.54 and 1.51-1.6 eV for CdTe and Cd{sub 0.9}Zn{sub 0.1}Te, respectively). The used procedure of determination of E{sub g} is analyzed from the viewpoint of the influence of the factors leading to inaccuracies in determination of its value. The measurements are performed for well-purified high-quality samples. The acquired data for CdTe (E{sub g} = 1.47-1.48 eV) and Cd{sub 0.9}Zn{sub 0.1}Te (E{sub g} = 1.52-1.53 eV) at room temperature substantially narrow the range of accurate determination of E{sub g}.

Kosyachenko, L. A., E-mail: lakos@chv.ukrpact.net; Sklyarchuk, V. M.; Sklyarchuk, O. V.; Maslyanchuk, O. L. [Chernovtsy National University (Ukraine)

2011-10-15T23:59:59.000Z

127

Gallium arsenide-based ternary compounds and multi-band-gap solar cell research. Annual subcontract report, 15 April 1988--14 June 1990  

SciTech Connect (OSTI)

Aim of this contract is the achievement of a high-efficiency, low-cost solar cell. The basic approach to the problem is centered upon the heteroepitaxial growth of a III-V compound material onto a single-crystal silicon wafer. The growth technique employed is metalorganic chemical vapor deposition. The silicon wafer may serve as a mechanical substrate and ohmic contact for a single-junction device, or may contain a p-n junction of its own and form the bottom cell of a two junction tandem solar cell structure. The III-V material for the single-junction case is GaAs and for the two-junction case is either GaAlAs or GaAsP, either material having the proper composition to yield a band gap of approximately 1.7 eV. Results achieved in this contract include the following: (1) a 17.6% efficient GaAs-on-Si solar cell; (2) an 18.5% efficient GaAs-on-Si concentrator solar cell at 400 suns; (3) a 24.8% efficient GaAs-on-GaAs solar cell; (4) a 28.7% efficient GaAs-on-GaAs concentrator solar cell at 200 suns; (5) measurement of the effects of dislocation density and emitter doping on GaAs cells; and (6) improvements in the growth process to achieve reproducible thin AlGaAs window layers with low recombination velocities and environmental stability.

Vernon, S. [Spire Corp., Bedford, MA (United States)

1993-02-01T23:59:59.000Z

128

Performance analysis of boron nitride embedded armchair graphene nanoribbon metal–oxide–semiconductor field effect transistor with Stone Wales defects  

SciTech Connect (OSTI)

We study the performance of a hybrid Graphene-Boron Nitride armchair nanoribbon (a-GNR-BN) n-MOSFET at its ballistic transport limit. We consider three geometric configurations 3p, 3p + 1, and 3p + 2 of a-GNR-BN with BN atoms embedded on either side (2, 4, and 6 BN) on the GNR. Material properties like band gap, effective mass, and density of states of these H-passivated structures are evaluated using the Density Functional Theory. Using these material parameters, self-consistent Poisson-Schrodinger simulations are carried out under the Non Equilibrium Green's Function formalism to calculate the ballistic n-MOSFET device characteristics. For a hybrid nanoribbon of width ?5?nm, the simulated ON current is found to be in the range of 265??A–280??A with an ON/OFF ratio 7.1 × 10{sup 6}–7.4 × 10{sup 6} for a V{sub DD}?=?0.68?V corresponding to 10?nm technology node. We further study the impact of randomly distributed Stone Wales (SW) defects in these hybrid structures and only 2.5% degradation of ON current is observed for SW defect density of 3.18%.

Chanana, Anuja; Sengupta, Amretashis; Mahapatra, Santanu [Nano Scale Device Research Laboratory, Department of Electronic Systems Engineering, Indian Institute of Science, Bangalore 560 012 (India)

2014-01-21T23:59:59.000Z

129

Gallium arsenide-based ternary compounds and multi-band-gap solar cell research. Final subcontract report, 1 April 1988--31 March 1990  

SciTech Connect (OSTI)

This report describes work to achieve a high-efficiency, low-cost solar cell. The basic approach to the problem is centered upon the heteroepitaxial growth of a III-V compound material onto a single-crystal silicon wafer. The growth technique employed throughout this work is metal-organic chemical vapor deposition. The silicon wafer may serve as a mechanical substrate and ohmic contact for a single-junction device, or it may contain a p-n junction of its own and form the bottom cell of a two-junction tandem solar cell structure. The III-V material for the single-junction case is GaAs, and for the two-junction case it is either GaAlAs or GaAsP, either material having the proper composition to yield a band gap of approximately 1.7 eV. Results achieved in this contract include (1) a 17.6%-efficient GaAs-on-Si solar cell; (2) an 18.5%-efficient GaAs-on-Si concentrator solar cell at 400 suns; (3) a 24.8%-efficient GaAs-on-GaAs solar cell; (4) a 28.7%-efficient GaAs-on-GaAs concentrator solar cell at 200 suns; (5) the measurement of the effects of dislocation density and emitter doping on GaAs cells; and (6) improvements in the growth process to achieve reproducible thin AlGaAs window layers with low recombination velocities and environmental stability.

Vernon, S. [Spire Corp., Bedford, MA (United States)

1993-07-01T23:59:59.000Z

130

Ballistic performance comparison of monolayer transition metal dichalcogenide MX{sub 2} (M = Mo, W; X = S, Se, Te) metal-oxide-semiconductor field effect transistors  

SciTech Connect (OSTI)

We study the transport properties of monolayer MX{sub 2} (M?=?Mo, W; X?=?S, Se, Te) n- and p-channel metal-oxide-semiconductor field effect transistors (MOSFETs) using full-band ballistic non-equilibrium Green's function simulations with an atomistic tight-binding Hamiltonian with hopping potentials obtained from density functional theory. We discuss the subthreshold slope, drain-induced barrier lowering (DIBL), as well as gate-induced drain leakage (GIDL) for different monolayer MX{sub 2} MOSFETs. We also report the possibility of negative differential resistance behavior in the output characteristics of nanoscale monolayer MX{sub 2} MOSFETs.

Chang, Jiwon; Register, Leonard F.; Banerjee, Sanjay K. [Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758 (United States)

2014-02-28T23:59:59.000Z

131

Electrochemical fabrication and optical properties of porous tin oxide films with structural colors  

SciTech Connect (OSTI)

Photonic crystals with porous features not only provide the capability to control light but also enable structural colors that are environmentally sensitive. Here, we report a novel kind of tin oxide-based photonic crystal featuring periodically arranged air pores fabricated by the periodic anodization of tin foil. The existence of a photonic band gap in the fabricated structure is verified by its vivid color, and its reflective spectra which are responsive to environmental stimuli. Furthermore, the sample colors (i.e., the photonic band gap positions) can be easily adjusted by manipulating the anodization parameters. The theoretical modeling results of these tin oxide photonic crystals agree well with the reported experimental ones.

Cheng, Hua; Shu, Shiwei; Lee, Chris; Zeng, Shanshan [Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Centre for Functional Photonics, City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue (Hong Kong); Lu, Zhouguang [Department of Materials Science and Engineering, South University of Science and Technology of China, Shenzhen, Guangdong 518055 (China); Lu, Jian, E-mail: jianlu@cityu.edu.hk, E-mail: yangli@cityu.edu.hk [Department of Mechanical and Biomedical Engineering, City University of Hong Kong, Kowloon (Hong Kong); Centre for Advanced Structural Materials, City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-Tech Industrial Park, Nanshan District, Shenzhen (China); Li, Yang Yang, E-mail: jianlu@cityu.edu.hk, E-mail: yangli@cityu.edu.hk [Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Centre for Functional Photonics, City University of Hong Kong, 83 Tat Chee Av. Hong Kong (Hong Kong); Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue (Hong Kong); City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-Tech Industrial Park, Nanshan District, Shenzhen (China)

2014-10-21T23:59:59.000Z

132

Influence of growth temperature on electrical, optical, and plasmonic properties of aluminum:zinc oxide films grown by radio frequency magnetron sputtering  

SciTech Connect (OSTI)

We have investigated the responsible mechanism for the observation of metallic conductivity at room temperature and metal-semiconductor transition (MST) at lower temperatures for aluminum-doped zinc oxide (AZO) films. AZO films were grown on glass substrates by radio-frequency magnetron sputtering with varying substrate temperatures (T{sub s}). The films were found to be crystalline with the electrical resistivity close to 1.1 × 10{sup ?3} ? cm and transmittance more than 85% in the visible region. The saturated optical band gap of 3.76 eV was observed for the sample grown at T{sub s} of 400 °C, however, a slight decrease in the bandgap was noticed above 400 °C, which can be explained by Burstein–Moss effect. Temperature dependent resistivity measurements of these highly conducting and transparent films showed a MST at ?110 K. The observed metal-like and metal-semiconductor transitions are explained by taking into account the Mott phase transition and localization effects due to defects. All AZO films demonstrate crossover in permittivity from positive to negative and low loss in the near-infrared region, illustrating its applications for plasmonic metamaterials, including waveguides for near infrared telecommunication region. Based on the results presented in this study, the low electrical resistivity and high optical transmittance of AZO films suggested a possibility for the application in the flexible electronic devices, such as transparent conducting oxide film on LEDs, solar cells, and touch panels.

Dondapati, Hareesh; Santiago, Kevin; Pradhan, A. K. [Center for Materials Research, Norfolk State University, 700 Park Avenue, Norfolk, Virginia 23504 (United States)] [Center for Materials Research, Norfolk State University, 700 Park Avenue, Norfolk, Virginia 23504 (United States)

2013-10-14T23:59:59.000Z

133

Theoretical study of influencing factors on the dispersion of bulk band-gap edges and the surface states in topological insulators Bi{sub 2}Te{sub 3} and Bi{sub 2}Se{sub 3}  

SciTech Connect (OSTI)

The dispersion of the band-gap edge states in bulk topological insulators Bi{sub 2}Te{sub 3} and Bi{sub 2}Se{sub 3} is considered within density functional theory. The dependences of this dispersion both on the approximation used for an exchange-correlation functional at fixed unit cell parameters and atomic positions and on these parameters and positions that are obtained upon structural relaxation performed using a certain approximated functional are analyzed. The relative position of the Dirac point of topologically protected surface states and the valence band maximum in the surface electronic structure of the topological insulators is discussed.

Rusinov, I. P., E-mail: rusinovip@gmail.com; Nechaev, I. A. [Tomsk State University (Russian Federation); Chulkov, E. V. [Donostia International Physics Center (DIPC) (Spain)

2013-06-15T23:59:59.000Z

134

Linker-Induced Anomalous Emission of Organic-Molecule Conjugated Metal-Oxide Nanoparticles  

SciTech Connect (OSTI)

Semiconductor nanoparticles conjugated with organic- and dye-molecules to yield high efficiency visible photoluminescence (PL) hold great potential for many future technological applications. We show that folic acid (FA)-conjugated to nanosize TiO2 and CeO2 particles demonstrates a dramatic increase of photoemission intensity at wavelengths between 500 and 700 nm when derivatized using aminopropyl trimethoxysilane (APTMS) as spacer-linker molecules between the metal oxide and FA. Using density-functional theory (DFT) and time-dependent DFT calculations we demonstrate that the strong increase of the PL can be explained by electronic transitions between the titania surface oxygen vacancy (OV) states and the low-energy excited states of the FA/APTMS molecule anchored onto the surface oxygen bridge sites in close proximity to the OVs. We suggest this scenario to be a universal feature for a wide class of metal oxide nanoparticles, including nanoceria, possessing a similar band gap (3 eV) and with a large surface-vacancy-related density of electronic states. We demonstrate that the molecule-nanoparticle linker can play a crucial role in tuning the electronic and optical properties of nanosystems by bringing optically active parts of the molecule and of the surface close to each other.

Turkowski, Volodymyr; Babu, Suresh; Le, Duy; Kumar, Amit; Haldar, Manas K.; Wagh, Anil V.; Hu, Zhongjian; Karakoti, Ajay S.; Gesquiere, Andre J.; Law, Benedict; Mallik, Sanku; Rahman, Talat S.; Leuenberger, Michael N.; Seal, Sudipta

2012-06-26T23:59:59.000Z

135

Predicted band structures of III-V semiconductors in the wurtzite phase  

SciTech Connect (OSTI)

While non-nitride III-V semiconductors typically have a zinc-blende structure, they may also form wurtzite crystals under pressure or when grown as nanowhiskers. This makes electronic structure calculation difficult since the band structures of wurtzite III-V semiconductors are poorly characterized. We have calculated the electronic band structure for nine III-V semiconductors in the wurtzite phase using transferable empirical pseudopotentials including spin-orbit coupling. We find that all the materials have direct gaps. Our results differ significantly from earlier ab initio calculations, and where experimental results are available (InP, InAs, and GaAs) our calculated band gaps are in good agreement. We tabulate energies, effective masses, and linear and cubic Dresselhaus zero-field spin-splitting coefficients for the zone-center states. The large zero-field spin-splitting coefficients we find may facilitate the development of spin-based devices.

De, A.; Pryor, Craig E. [Department of Physics and Astronomy and Optical Science and Technology Center, University of Iowa, Iowa City, Iowa 52242 (United States)

2010-04-15T23:59:59.000Z

136

Lattice mismatched compound semiconductors and devices on silicon  

E-Print Network [OSTI]

III-V compound semiconductors, due to their superior electron mobility, are promising candidates for n-type metal-oxide-semiconductor field effect transistors (MOSFETs). However, the limited size of III-V substrates and ...

Yang, Li, Ph. D. Massachusetts Institute of Technology

2011-01-01T23:59:59.000Z

137

IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 10, NO. 3, MAY 2011 499 TiSi2 Nanocrystal Metal Oxide Semiconductor Field  

E-Print Network [OSTI]

IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL. 10, NO. 3, MAY 2011 499 TiSi2 Nanocrystal Metal Oxide memory window, faster writing and erasing, and longer retention lifetime as a result of the metallic property of the silicide NCs. Due to thermally stable, CMOS compatible properties, TiSi2 NCs are highly

Yang, Zheng

138

Variable temperature semiconductor film deposition  

DOE Patents [OSTI]

A method of depositing a semiconductor material on a substrate is disclosed. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

Li, X.; Sheldon, P.

1998-01-27T23:59:59.000Z

139

Thin film three-dimensional topological insulator metal-oxide-semiconductor field-effect-transistors: A candidate for sub-10?nm devices  

SciTech Connect (OSTI)

Three-dimensional (3D) topological insulators (TI) are a new state of quantum matter in which surface states reside in the bulk insulating energy bandgap and are protected by time-reversal symmetry. It is possible to create an energy bandgap as a consequence of the interaction between the conduction band and valence band surface states from the opposite surfaces of a TI thin film, and the width of the bandgap can be controlled by the thin film thickness. The formation of an energy bandgap raises the possibility of thin-film TI-based metal-oxide-semiconductor field-effect-transistors (MOSFETs). In this paper, we explore the performance of MOSFETs based on thin film 3D-TI structures by employing quantum ballistic transport simulations using the effective continuous Hamiltonian with fitting parameters extracted from ab-initio calculations. We demonstrate that thin film transistors based on a 3D-TI structure provide similar electrical characteristics compared to a Si-MOSFET for gate lengths down to 10?nm. Thus, such a device can be a potential candidate to replace Si-based MOSFETs in the sub-10?nm regime.

Akhavan, N. D., E-mail: nima.dehdashti@uwa.edu.au; Jolley, G.; Umana-Membreno, G. A.; Antoszewski, J.; Faraone, L. [Department of Electrical, Electronic and Computer Engineering, University of Western Australia, Crawley, WA 6009 (Australia)

2014-08-28T23:59:59.000Z

140

Characterization of device parameters in high-temperature metal-oxide-semiconductor field-effect transistors in. beta. -SiC thin films  

SciTech Connect (OSTI)

Both inversion- and depletion-mode n-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) have been fabricated on ..beta..-SiC thin films grown by chemical-vapor deposition. The inversion-mode devices were made on in situ doped (Al) p-type ..beta..-SiC(100) thin films grown on Si(100) substrates. The depletion-mode MOSFETs were made on n-type ..beta..-SiC(111) thin films grown on the Si(0001) face of a 6H ..cap alpha..-SiC substrates. Stable saturation and low subthreshold currents were achieved at drain-source voltages exceeding 5 and 25 V for the inversion-mode and depletion-mode devices, respectively. The transconductance increased with temperature up to 673 K for the short-gate-length devices, of either mode, and then decreased with further increases in temperature. It is proposed that the transconductances and threshold voltages for the inversion-mode devices are greatly affected by minority-carrier injection from the source. Stable transistor action was observed for both types of devices at temperatures up to 823 K, with the depletion-mode devices operating very well up to 923 K.

Palmour, J.W.; Kong, H.S.; Davis, R.F.

1988-08-15T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
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141

Positive bias temperature instability in p-type metal-oxide-semiconductor devices with HfSiON/SiO{sub 2} gate dielectrics  

SciTech Connect (OSTI)

We present a detailed investigation on positive-bias temperature stress (PBTS) induced degradation of nitrided hafnium silicate (HfSiON)/SiO{sub 2} gate stack in n{sup +}-poly crystalline silicon (polySi) gate p-type metal-oxide-semiconductor (pMOS) devices. The measurement results indicate that gate dielectric degradation is a composite effect of electron trapping in as-fabricated as well as newly generated neutral traps, resulting a significant amount of stress-induced leakage current and generation of surface states at the Si/SiO{sub 2} interface. Although, a significant amount of interface states are created during PBTS, the threshold voltage (V{sub T}) instability of the HfSiON based pMOS devices is primarily caused by electron trapping and detrapping. It is also shown that PBTS creates both acceptor- and donor-like interface traps via different depassivation mechanisms of the Si{sub 3}???SiH bonds at the Si/SiO{sub 2} interface in pMOS devices. However, the number of donor-like interface traps ?N{sub it}{sup D} is significantly greater than that of acceptor-like interface traps ?N{sup A}{sub it}, resulting the PBTS induced net interface traps as donor-like.

Samanta, Piyas, E-mail: piyas@vcfw.org [Department of Physics, Vidyasagar College for Women, 39 Sankar Ghosh Lane, Kolkata 700 006 (India); Huang, Heng-Sheng; Chen, Shuang-Yuan [Institute of Mechatronic Engineering, National Taipei University of Technology, No. 1, Sec. 3, Chung-Hsiao E. Rd., Taipei 106, Taiwan (China); Liu, Chuan-Hsi [Department of Mechatronic Technology, National Taiwan Normal University, No. 162, Sec. 1, He-Ping E. Rd., Taipei 106, Taiwan (China); Cheng, Li-Wei [Central R and D Division, United Microelectronics Corporation, No. 3, Li-Hsin Rd. II, Hsinchu 300, Taiwan (China)

2014-02-21T23:59:59.000Z

142

A Sensor System Based on Semi-Conductor Metal Oxide Technology for In Situ Detection of Coal Fired Combustion Gases  

SciTech Connect (OSTI)

Sensor Research and Development Corporation (SRD) proposed a two-phase program to develop a robust, autonomous prototype analyzer for in situ, real-time detection, identification, and measurement of coal-fired combustion gases and perform field-testing at an approved power generation facility. SRD developed and selected sensor materials showing selective responses to carbon monoxide, carbon dioxide, nitric oxide, nitrogen dioxide, ammonia, sulfur dioxide and hydrogen chloride. Sensor support electronics were also developed to enable prototype to function in elevated temperatures without any issues. Field-testing at DOE approved facility showed the ability of the prototype to detect and estimate the concentration of combustion by-products accurately with relatively low false-alarm rates at very fast sampling intervals.

Brent Marquis

2007-05-31T23:59:59.000Z

143

Sample size requirements for estimating effective dose from computed tomography using solid-state metal-oxide-semiconductor field-effect transistor dosimetry  

SciTech Connect (OSTI)

Purpose: Effective dose (ED) is a widely used metric for comparing ionizing radiation burden between different imaging modalities, scanners, and scan protocols. In computed tomography (CT), ED can be estimated by performing scans on an anthropomorphic phantom in which metal-oxide-semiconductor field-effect transistor (MOSFET) solid-state dosimeters have been placed to enable organ dose measurements. Here a statistical framework is established to determine the sample size (number of scans) needed for estimating ED to a desired precision and confidence, for a particular scanner and scan protocol, subject to practical limitations. Methods: The statistical scheme involves solving equations which minimize the sample size required for estimating ED to desired precision and confidence. It is subject to a constrained variation of the estimated ED and solved using the Lagrange multiplier method. The scheme incorporates measurement variation introduced both by MOSFET calibration, and by variation in MOSFET readings between repeated CT scans. Sample size requirements are illustrated on cardiac, chest, and abdomen–pelvis CT scans performed on a 320-row scanner and chest CT performed on a 16-row scanner. Results: Sample sizes for estimating ED vary considerably between scanners and protocols. Sample size increases as the required precision or confidence is higher and also as the anticipated ED is lower. For example, for a helical chest protocol, for 95% confidence and 5% precision for the ED, 30 measurements are required on the 320-row scanner and 11 on the 16-row scanner when the anticipated ED is 4 mSv; these sample sizes are 5 and 2, respectively, when the anticipated ED is 10 mSv. Conclusions: Applying the suggested scheme, it was found that even at modest sample sizes, it is feasible to estimate ED with high precision and a high degree of confidence. As CT technology develops enabling ED to be lowered, more MOSFET measurements are needed to estimate ED with the same precision and confidence.

Trattner, Sigal [Department of Medicine, Division of Cardiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States)] [Department of Medicine, Division of Cardiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States); Cheng, Bin [Department of Biostatistics, Columbia University Mailman School of Public Health, New York, New York 10032 (United States)] [Department of Biostatistics, Columbia University Mailman School of Public Health, New York, New York 10032 (United States); Pieniazek, Radoslaw L. [Center for Radiological Research, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States)] [Center for Radiological Research, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York 10032 (United States); Hoffmann, Udo [Department of Radiology, Massachusetts General Hospital and Harvard Medical School, Boston, Massachusetts 02114 (United States)] [Department of Radiology, Massachusetts General Hospital and Harvard Medical School, Boston, Massachusetts 02114 (United States); Douglas, Pamela S. [Department of Medicine, Division of Cardiology, Duke University, Durham, North Carolina 27715 (United States)] [Department of Medicine, Division of Cardiology, Duke University, Durham, North Carolina 27715 (United States); Einstein, Andrew J., E-mail: andrew.einstein@columbia.edu [Department of Medicine, Division of Cardiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York and Department of Radiology, Columbia University Medical Center and New York-Presbyterian Hospital, New York, New York (United States)

2014-04-15T23:59:59.000Z

144

A methodology to identify and quantify mobility-reducing defects in 4H-silicon carbide power metal-oxide-semiconductor field-effect transistors  

SciTech Connect (OSTI)

In this paper, we present a methodology for the identification and quantification of defects responsible for low channel mobility in 4H-Silicon Carbide (SiC) power metal-oxide-semiconductor field-effect transistors (MOSFETs). To achieve this, we use an algorithm based on 2D-device simulations of a power MOSFET, density functional simulations, and measurement data. Using physical modeling of carrier mobility and interface traps, we reproduce the experimental I-V characteristics of a 4H-SiC doubly implanted MOSFET through drift-diffusion simulation. We extract the position of Fermi level and the occupied trap density as a function of applied bias and temperature. Using these inputs, our algorithm estimates the number of possible trap types, their energy levels, and concentrations at 4H-SiC/SiO{sub 2} interface. Subsequently, we use density functional theory (DFT)-based ab initio simulations to identify the atomic make-up of defects causing these trap levels. We study silicon vacancy and carbon di-interstitial defects in the SiC side of the interface. Our algorithm indicates that the D{sub it} spectrum near the conduction band edge (3.25?eV) is composed of three trap types located at 2.8–2.85?eV, 3.05?eV, and 3.1–3.2?eV, and also calculates their densities. Based on DFT simulations, this work attributes the trap levels very close to the conduction band edge to the C di-interstitial defect.

Ettisserry, D. P., E-mail: deva@umd.edu; Goldsman, N. [Department of Electrical and Computer Engineering, University of Maryland, College Park, Maryland 20742 (United States); Lelis, A. [U.S. Army Research Laboratory, 2800 Powder Mill Road, Adelphi, Maryland 20783 (United States)

2014-03-14T23:59:59.000Z

145

Calculation of the electron structure of vacancies and their compensated states in III-VI semiconductors  

SciTech Connect (OSTI)

The Green's functions theory and the bond-orbital model are used as a basis for calculations of the electron structure of local defects-specifically, vacancies and their compensated states in III-VI semiconductors. The energy levels in the band gap are established, and the changes induced in the electron densities in the GaS, GaSe, and InSe semiconductors by anion and cation vacancies and their compensated states are calculated. It is established that, if a vacancy is compensated by an atom of an element from the same subgroup with the same tetrahedral coordination and if the ionic radius of the compensating atom is smaller than that of the substituted atom, the local levels formed by the vacancy completely disappear. It is shown that this mechanism of compensation of vacancies provides a means not only for recovering the parameters of the crystal, but for improving the characteristics of the crystal as well.

Mehrabova, M. A., E-mail: Mehrabova@mail.ru; Madatov, R. S. [Azerbaijan National Academy of Sciences, Institute of Radiation Problems (Azerbaijan)

2011-08-15T23:59:59.000Z

146

MICROSTRUCTURE-PROPERTY RELATIONSHIPS OF A ZINC OXIDE VARISTOR MATERIAL  

E-Print Network [OSTI]

RELATIONSHIPS OF A ZINC OXIDE VARISTOR MATERIAL Pamelaresistors, and zinc oxide varistors are semiconductorRELATIONSHIPS OF A ZINC OXIDE VARISTOR MATERIAL CONTENTS

Williama, Pamela Louise

2011-01-01T23:59:59.000Z

147

L-asparagine crystals with wide gap semiconductor features: Optical absorption measurements and density functional theory computations  

SciTech Connect (OSTI)

Results of optical absorption measurements are presented together with calculated structural, electronic, and optical properties for the anhydrous monoclinic L-asparagine crystal. Density functional theory (DFT) within the generalized gradient approximation (GGA) including dispersion effects (TS, Grimme) was employed to perform the calculations. The optical absorption measurements revealed that the anhydrous monoclinic L-asparagine crystal is a wide band gap material with 4.95 eV main gap energy. DFT-GGA+TS simulations, on the other hand, produced structural parameters in very good agreement with X-ray data. The lattice parameter differences ?a, ?b, ?c between theory and experiment were as small as 0.020, 0.051, and 0.022 Å, respectively. The calculated band gap energy is smaller than the experimental data by about 15%, with a 4.23 eV indirect band gap corresponding to Z???? and Z???? transitions. Three other indirect band gaps of 4.30 eV, 4.32 eV, and 4.36 eV are assigned to ?3 ???, ?1 ???, and ?2 ??? transitions, respectively. ?-sol computations, on the other hand, predict a main band gap of 5.00 eV, just 50 meV above the experimental value. Electronic wavefunctions mainly originating from O 2p–carboxyl, C 2p–side chain, and C 2p–carboxyl orbitals contribute most significantly to the highest valence and lowest conduction energy bands, respectively. By varying the lattice parameters from their converged equilibrium values, we show that the unit cell is less stiff along the b direction than for the a and c directions. Effective mass calculations suggest that hole transport behavior is more anisotropic than electron transport, but the mass values allow for some charge mobility except along a direction perpendicular to the molecular layers of L-asparagine which form the crystal, so anhydrous monoclinic L-asparagine crystals could behave as wide gap semiconductors. Finally, the calculations point to a high degree of optical anisotropy for the absorption and complex dielectric function, with more structured curves for incident light polarized along the 100 and 101 directions.

Zanatta, G.; Gottfried, C. [Departamento de Bioquímica, Universidade Federal do Rio Grande do Sul, 90035-003 Porto Alegre-RS (Brazil)] [Departamento de Bioquímica, Universidade Federal do Rio Grande do Sul, 90035-003 Porto Alegre-RS (Brazil); Silva, A. M. [Universidade Estadual do Piauí, 64260-000 Piripiri-Pi (Brazil)] [Universidade Estadual do Piauí, 64260-000 Piripiri-Pi (Brazil); Caetano, E. W. S., E-mail: ewcaetano@gmail.com [Instituto de Educação, Ciência e Tecnologia do Ceará, 60040-531 Fortaleza-CE (Brazil)] [Instituto de Educação, Ciência e Tecnologia do Ceará, 60040-531 Fortaleza-CE (Brazil); Sales, F. A. M.; Freire, V. N. [Departamento de Física, Universidade Federal do Ceará, Caixa Postal 6030, 60455-760 Fortaleza-CE (Brazil)] [Departamento de Física, Universidade Federal do Ceará, Caixa Postal 6030, 60455-760 Fortaleza-CE (Brazil)

2014-03-28T23:59:59.000Z

148

Transformation Optics with Photonic Band Gap Media  

E-Print Network [OSTI]

We introduce a class of optical media based on adiabatically modulated, dielectric-only, and potentially extremely low-loss, photonic crystals. The media we describe represent a generalization of the eikonal limit of transformation optics (TO). The foundation of the concept is the possibility to fit frequency isosurfaces in the k-space of photonic crystals with elliptic surfaces, allowing them to mimic the dispersion relation of light in anisotropic effective media. Photonic crystal cloaks and other TO devices operating at visible wavelengths can be constructed from optically transparent substances like glasses, whose attenuation coefficient can be as small as 10 dB/km, suggesting the TO design methodology can be applied to the development of optical devices not limited by the losses inherent to metal-based, passive metamaterials.

Urzhumov, Yaroslav A

2010-01-01T23:59:59.000Z

149

Ferromagnetism in Oxide Semiconductors . | EMSL  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: Vegetation ProposedUsing ZirconiaPolicyFeasibility ofSmall15.000TechnologyTune ITFerrin| EMSL

150

Impact of SF{sub 6} plasma treatment on performance of TaN-HfO{sub 2}-InP metal-oxide-semiconductor field-effect transistor  

SciTech Connect (OSTI)

In this work, the experimental impact of SF{sub 6} plasma treatment on the performance of InP metal-oxide-semiconductor field-effect transistors is presented. S and F are incorporated into atomic layer deposited HfO{sub 2} via postgate SF{sub 6} plasma treatment. The decreased subthreshold swing, gate leakage (I{sub g}), and increased effective channel mobility ({mu}{sub eff}) indicate that better interface and bulk oxide quality have been achieved with SF{sub 6} plasma treatment due to the formation of stronger Hf-F bonds. Drive current (I{sub d}), transconductance (G{sub m}), and effective channel mobility ({mu}{sub eff}) are improved by 22.3%, 35%, and 35%, respectively, compared with those of control devices.

Wang Yanzhen; Chen Yenting; Zhao Han; Xue Fei; Zhou Fei; Lee, Jack C. [Department of Electrical and Computer Engineering, Microelectronics Research Center, University of Texas at Austin, Austin, Texas 78758 (United States)

2011-01-24T23:59:59.000Z

151

Waste minimization in semiconductor processing  

SciTech Connect (OSTI)

The US semiconductor industry uses 5--7 thousand pounds of arsine annually. Fifty to eighty percent of the arsine used becomes a waste product, which requires abatement. Traditional methods of abatement are reviewed with an emphasis on dry chemical scrubbing. A variety of dry chemical scrubbing materials were evaluated for arsine capacity, using activated carbon as the baseline for comparison. Of the available technologies, dry chemical scrubbing is the most effective means of minimizing arsenic containing waste generated from semiconductor effluents. A copper oxide based media has been identified which has high capacity, high efficiency and treats the spectrum of gases used in MOCVD processes. Reclaim and recovery of spent scrubber media has the potential to drastically reduce arsenic waste from semiconductor manufacturing.

Hardwick, S.J.; Mailloux, J.C. [Novapure Corp., Danbury, CT (United States)

1994-12-31T23:59:59.000Z

152

Surface Science Letters Bulk-defect dependent adsorption on a metal oxide surface  

E-Print Network [OSTI]

-6028(01)01067-6 #12;Titanium dioxide is a wide-band gap semicon- ductor (Egap 3 eV) that can easily be reducedSurface Science Letters Bulk-defect dependent adsorption on a metal oxide surface: S/TiO2(1 1 0) E Abstract The adsorption of molecular sulfur on TiO2(1 1 0)(1 Ã? 1) has been studied with scanning tunneling

Diebold, Ulrike

153

High-field electroluminescence in semiconductor tunnel junctions with a Mn-doped GaAs layer  

SciTech Connect (OSTI)

We investigated high-field electroluminescence (EL) in semiconductor tunnel junctions with a Mn-doped GaAs layer (here, referred to as GaAs:Mn). Besides the band-gap emission of GaAs, the EL spectra show visible light emissions with two peaks at 1.94?eV and 2.19?eV, which are caused by d-d transitions of the Mn atoms excited by hot electrons. The threshold voltages for band-gap and visible light EL in the tunnel junctions with a GaAs:Mn electrode are 1.3?V higher than those of GaAs:Mn excited by hot holes in reserve biased p{sup +}-n junctions, which is consistent with the hot carrier transport in the band profiles of these structures. Our EL results at room temperature show that the electron temperature in GaAs:Mn can be as high as ?700?K for a low input electrical power density of 0.4?W/cm{sup 2}, while the lattice temperature of the GaAs:Mn layer can be kept at 340?K.

Hai, Pham Nam [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-0033 (Japan); Yatsui, Takashi; Ohtsu, Motoichi; Tanaka, Masaaki [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan); Nanophotonics Research Center, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan)

2014-09-21T23:59:59.000Z

154

Mixed semiconductor nanocrystal compositions  

DOE Patents [OSTI]

Composition comprising one or more energy donors and one or more energy acceptors, wherein energy is transferred from the energy donor to the energy acceptor and wherein: the energy acceptor is a colloidal nanocrystal having a lower band gap energy than the energy donor; the energy donor and the energy acceptor are separated by a distance of 40 nm or less; wherein the average peak absorption energy of the acceptor is at least 20 meV greater than the average peak emission energy of the energy donor; and wherein the ratio of the number of energy donors to the number of energy acceptors is from about 2:1 to about 1000:1.

Maskaly, Garry R. (Los Alamos, NM); Schaller, Richard D. (Santa Fe, NM); Klimov, Victor I. (Los Alamos, NM)

2011-02-15T23:59:59.000Z

155

Unitary lens semiconductor device  

DOE Patents [OSTI]

A unitary lens semiconductor device and method. The unitary lens semiconductor device is provided with at least one semiconductor layer having a composition varying in the growth direction for unitarily forming one or more lenses in the semiconductor layer. Unitary lens semiconductor devices may be formed as light-processing devices such as microlenses, and as light-active devices such as light-emitting diodes, photodetectors, resonant-cavity light-emitting diodes, vertical-cavity surface-emitting lasers, and resonant cavity photodetectors.

Lear, Kevin L. (Albuquerque, NM)

1997-01-01T23:59:59.000Z

156

Low interface defect density of atomic layer deposition BeO with self-cleaning reaction for InGaAs metal oxide semiconductor field effect transistors  

SciTech Connect (OSTI)

In this paper, we discuss atomic configuration of atomic layer deposition (ALD) beryllium oxide (BeO) using the quantum chemistry to understand the theoretical origin. BeO has shorter bond length, higher reaction enthalpy, and larger bandgap energy compared with those of ALD aluminum oxide. It is shown that the excellent material properties of ALD BeO can reduce interface defect density due to the self-cleaning reaction and this contributes to the improvement of device performance of InGaAs MOSFETs. The low interface defect density and low leakage current of InGaAs MOSFET were demonstrated using X-ray photoelectron spectroscopy and the corresponding electrical results.

Shin, H. S. [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of) [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of); SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); The University of Texas, Austin, Texas 78758 (United States); Yum, J. H. [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States) [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); The University of Texas, Austin, Texas 78758 (United States); Johnson, D. W. [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States) [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); Texas A and M University College Station, Texas 77843 (United States); Harris, H. R. [Texas A and M University College Station, Texas 77843 (United States)] [Texas A and M University College Station, Texas 77843 (United States); Hudnall, Todd W. [Texas State University, 601 University Drive, San Marcos, Texas 78666 (United States)] [Texas State University, 601 University Drive, San Marcos, Texas 78666 (United States); Oh, J. [Yonsei University, Incheon, 406-840 (Korea, Republic of)] [Yonsei University, Incheon, 406-840 (Korea, Republic of); Kirsch, P.; Wang, W.-E. [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States)] [SEMATECH, 2706 Montopolis Dr., Austin, Texas 78741 (United States); Bielawski, C. W.; Banerjee, S. K.; Lee, J. C. [The University of Texas, Austin, Texas 78758 (United States)] [The University of Texas, Austin, Texas 78758 (United States); Lee, H. D. [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of)] [Department of Electronics Engineering, Chungnam National University, Daejeon (Korea, Republic of)

2013-11-25T23:59:59.000Z

157

Semiconductor bridge (SCB) detonator  

DOE Patents [OSTI]

The present invention is a low-energy detonator for high-density secondary-explosive materials initiated by a semiconductor bridge igniter that comprises a pair of electrically conductive lands connected by a semiconductor bridge. The semiconductor bridge is in operational or direct contact with the explosive material, whereby current flowing through the semiconductor bridge causes initiation of the explosive material. Header wires connected to the electrically-conductive lands and electrical feed-throughs of the header posts of explosive devices, are substantially coaxial to the direction of current flow through the SCB, i.e., substantially coaxial to the SCB length.

Bickes, Jr., Robert W. (Albuquerque, NM); Grubelich, Mark C. (Albuquerque, NM)

1999-01-01T23:59:59.000Z

158

Semiconductor bridge (SCB) detonator  

DOE Patents [OSTI]

The present invention is a low-energy detonator for high-density secondary-explosive materials initiated by a semiconductor bridge (SCB) igniter that comprises a pair of electrically conductive lands connected by a semiconductor bridge. The semiconductor bridge is in operational or direct contact with the explosive material, whereby current flowing through the semiconductor bridge causes initiation of the explosive material. Header wires connected to the electrically-conductive lands and electrical feed-throughs of the header posts of explosive devices, are substantially coaxial to the direction of current flow through the SCB, i.e., substantially coaxial to the SCB length. 3 figs.

Bickes, R.W. Jr.; Grubelich, M.C.

1999-01-19T23:59:59.000Z

159

Thin Film Reliability SEMICONDUCTORS  

E-Print Network [OSTI]

Thin Film Reliability SEMICONDUCTORS Our goal is to develop new ways to evaluate the reliability $250 billion per year. As semiconductor devices become ultra miniaturized, reliability testing becomes-world conditions as possible will enable product designers to better balance performance and reliability

160

First principles study of Fe in diamond: A diamond-based half metallic dilute magnetic semiconductor  

SciTech Connect (OSTI)

Half-metallic ferromagnetic ordering in semiconductors, essential in the emerging field of spintronics for injection and transport of highly spin polarised currents, has up to now been considered mainly in III–V and II–VI materials. However, low Curie temperatures have limited implementation in room temperature device applications. We report ab initio Density Functional Theory calculations on the properties of Fe in diamond, considering the effects of lattice site, charge state, and Fermi level position. We show that the lattice sites and induced magnetic moments of Fe in diamond depend strongly on the Fermi level position and type of diamond co-doping, with Fe being energetically most favorable at the substitutional site in p-type and intrinsic diamond, while it is most stable at a divacancy site in n-type diamond. Fe induces spin polarized bands in the band gap, with strong hybridization between Fe-3d and C-2s,2p bands. We further consider Fe-Fe spin interactions in diamond and show that substitutional Fe{sup +1} in p-type diamond exhibits a half-metallic character, with a magnetic moment of 1.0??{sub B} per Fe atom and a large ferromagnetic stabilization energy of 33?meV, an order of magnitude larger than in other semiconductors, with correspondingly high Curie temperatures. These results, combined with diamond's unique properties, demonstrate that Fe doped p-type diamond is likely to be a highly suitable candidate material for spintronics applications.

Benecha, E. M. [Department of Physics, University of South Africa, P.O. Box 392, UNISA 0003 Pretoria (South Africa); Lombardi, E. B., E-mail: lombaeb@unisa.ac.za [College of Graduate Studies, University of South Africa, P.O. Box 392, UNISA 0003 Pretoria (South Africa)

2013-12-14T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


161

Synthesis and characterization of some metal oxide nanocrystals by microwave irradiation  

SciTech Connect (OSTI)

Copper oxide and cobalt oxide (CuO, Co3O4) nanocrystals (NCs) have been successfully prepared in a short time using microwave irradiation. The resulted powders of nanocrystals (NCs) were characterized by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Thermogravimetric analysis (TGA) measurements are also studied. Fourier-transform infrared (FT-IR) and UV–visible absorption spectroscopy of both kind of nanoparticels are illustrated. Optical absorption analysis indicated the direct band gap for both kinds of nanocrystals.

Rashad, M.; Gaber, A.; Abdelrahim, M. A.; Abdel-Baset, A. M. [Physics Department, Faculty of Science, Assiut University, 71516 Assiut (Egypt); Moharram, A. H. [Physics Dept., College of Science and Arts, King Abdulaziz Univ., Rabigh 21911 (Saudi Arabia)

2013-12-16T23:59:59.000Z

162

Photoelectrochemistry of Semiconductor Nanowire Arrays  

SciTech Connect (OSTI)

This project supported research on the growth and photoelectrochemical characterization of semiconductor nanowire arrays, and on the development of catalytic materials for visible light water splitting to produce hydrogen and oxygen. Silicon nanowires were grown in the pores of anodic aluminum oxide films by the vapor-liquid-solid technique and were characterized electrochemically. Because adventitious doping from the membrane led to high dark currents, silicon nanowire arrays were then grown on silicon substrates. The dependence of the dark current and photovoltage on preparation techniques, wire diameter, and defect density was studied for both p-silicon and p-indium phosphide nanowire arrays. The open circuit photovoltage of liquid junction cells increased with increasing wire diameter, reaching 350 mV for micron-diameter silicon wires. Liquid junction and radial p-n junction solar cells were fabricated from silicon nano- and microwire arrays and tested. Iridium oxide cluster catalysts stabilized by bidentate malonate and succinate ligands were also made and studied for the water oxidation reaction. Highlights of this project included the first papers on silicon and indium phosphide nanowire solar cells, and a new procedure for making ligand-stabilized water oxidation catalysts that can be covalently linked to molecular photosensitizers or electrode surfaces.

Mallouk, Thomas E; Redwing, Joan M

2009-11-10T23:59:59.000Z

163

REVIEW ARTICLE Semiconductor quantum dot-sensitized  

E-Print Network [OSTI]

of low-cost and high-performance solar cells for sustainable energy sources to re- place fossil fuels has) fabrication methods of QDs, and 4) nanocrystalline photoelectrodes for solar cells. We also make suggestions band gap depending on the QD size, 2) a larger extinction coefficient, 3) higher stability toward water

Cao, Guozhong

164

Features of the band structure and conduction mechanisms in the n-HfNiSn semiconductor heavily doped with Ru  

SciTech Connect (OSTI)

The crystal and electronic structure and energy and kinetic properties of the n-HfNiSn semiconductor heavily doped with a Ru acceptor impurity are investigated in the temperature and Ru concentration ranges T = 80–400 K and N{sub A}{sup Ru} ? 9.5 × 10{sup 19}?5.7 × 10{sup 20} cm{sup ?3} (x = 0–0.03), respectively. The mechanism of structural-defect generation is established, which changes the band gap and degree of compensation of the semiconductor and consists in the simultaneous concentration reduction and elimination of donor structural defects by means of the displacement of ?1% of Ni atoms from the Hf (4a) positions, the generation of acceptor structural defects upon the substitution of Ru atoms for Ni atoms in the 4c positions, and the generation of donor defects in the form of vacancies in the Sn (4b) positions. The calculated electronic structure of HfNi{sub 1?x}Ru{sub x}Sn is consistent with the experiment. The results obtained are discussed within the Shklovsky-Efros model for a heavily doped and compensated semiconductor.

Romaka, V. A., E-mail: vromaka@polynet.lviv.ua [National Academy of Sciences of Ukraine, Pidstrygach Institute for Applied Problems in Mechanics and Mathematics (Ukraine); Rogl, P. [Universität Wien, Institut für Physikalische Chemie (Austria); Romaka, V. V. [National University Lvivska Politekhnika (Ukraine); Stadnyk, Yu. V. [Ivan Franko National University of Lviv (Ukraine); Korzh, R. O.; Krayovskyy, V. Ya. [National University Lvivska Politekhnika (Ukraine); Horyn, A. M. [Ivan Franko National University of Lviv (Ukraine)

2014-12-15T23:59:59.000Z

165

Amorphous tin-cadmium oxide films and the production thereof  

DOE Patents [OSTI]

A tin-cadmium oxide film having an amorphous structure and a ratio of tin atoms to cadmium atoms of between 1:1 and 3:1. The tin-cadmium oxide film may have an optical band gap of between 2.7 eV and 3.35 eV. The film may also have a charge carrier concentration of between 1.times.10.sup.20 cm.sup.-3 and 2.times.10.sup.20 cm.sup.-3. The tin cadmium oxide film may also exhibit a Hall mobility of between 40 cm.sup.2V.sup.-1 s.sup.-1 and 60 cm.sup.2V.sup.-1 s.sup.-1. Also disclosed is a method of producing an amorphous tin-cadmium oxide film as described and devices using same.

Li, Xiaonan; Gessert, Timothy A

2013-10-29T23:59:59.000Z

166

Invited paper History of Semiconductors  

E-Print Network [OSTI]

Abstract—The history of semiconductors is presented beginning with the first documented observation of a semiconductor effect (Faraday), through the development of the first devices (point-contact rectifiers and transistors, early field-effect transistors) and the theory of semiconductors up to the contemporary devices (SOI and multigate devices). Keywords—band theory, laser, Moore’s law, semiconductor, transistor.

Lidia ?ukasiak; Andrzej Jakubowski

167

Thermal Conductivity of Polycrystalline Semiconductors and Ceramics  

E-Print Network [OSTI]

semiconductors and ceramics with desired thermalthermal conductivity of several polycrystalline semiconductors and ceramics,Thermal Conductivity of Polycrystalline Semiconductors and Ceramics

Wang, Zhaojie

2012-01-01T23:59:59.000Z

168

Diameter-Controlled Vapor-Solid Epitaxial Growth and Properties of Aligned ZnO Nanowire Arrays  

E-Print Network [OSTI]

. Introduction Wurtzitic zinc oxide is a direct, wide band gap semiconductor that has attracted tremendous (ultraviolet or green/blue) electro-optical devices, chemical sensors, and varistors.1-5 In recent years oxide, so their commercial potential has been limited. Here we report a facile, template-free method

Qin, Lu-Chang

169

Interpretation of the Phonon Frequency Shifts in ZnO Quantum Dots Khan A. Alim, Vladimir A. Fonoberov, and Alexander A. Balandin  

E-Print Network [OSTI]

made of zinc oxide (ZnO), a wide-bandgap semiconductor, have recently attracted attention due Zinc oxide (ZnO) presents interesting material system because of its wide band gap of 3.37 eV and some ultraviolet (UV) protection films, gas sensors, and varistors. Raman spectroscopy presents a powerful tool

Fonoberov, Vladimir

170

Low temperature production of large-grain polycrystalline semiconductors  

DOE Patents [OSTI]

An oxide or nitride layer is provided on an amorphous semiconductor layer prior to performing metal-induced crystallization of the semiconductor layer. The oxide or nitride layer facilitates conversion of the amorphous material into large grain polycrystalline material. Hence, a native silicon dioxide layer provided on hydrogenated amorphous silicon (a-Si:H), followed by deposited Al permits induced crystallization at temperatures far below the solid phase crystallization temperature of a-Si. Solar cells and thin film transistors can be prepared using this method.

Naseem, Hameed A. (Fayetteville, AR); Albarghouti, Marwan (Loudonville, NY)

2007-04-10T23:59:59.000Z

171

Initiation of a passivated interface between hafnium oxide and In(Ga)As(0 0 1)-(4x2)  

SciTech Connect (OSTI)

Hafnium oxide interfaces were studied on two related group III rich semiconductor surfaces, InAs(0 0 1)-(4x2) and In{sub 0.53}Ga{sub 0.47}As(0 0 1)-(4x2), via two different methods: reactive oxidation of deposited Hf metal and electron beam deposition of HfO{sub 2}. The interfaces were investigated with scanning tunneling microscopy and spectroscopy (STS). Single Hf atom chemisorption sites were identified that are resistant to oxidation by O{sub 2}, but Hf islands are reactive to O{sub 2}. After e{sup -} beam deposition of <<1 ML of HfO{sub 2}, single chemisorption sites were identified. At low coverage (<1 ML), the n-type and p-type HfO{sub 2}/InGaAs(0 0 1)-(4x2) interfaces show p-type character in STS, which is typical of clean InGaAs(0 0 1)-(4x2). After annealing below 200 deg. C, full coverage HfO{sub 2}/InGaAs(0 0 1)-(4x2) (1-3 ML) has the surface Fermi level shifted toward the conduction band minimum for n-type InGaAs, but near the valence band maximum for p-type InGaAs. This is consistent with the HfO{sub 2}/InGaAs(0 0 1)-(4x2) interface being at least partially unpinned, i.e., a low density of states in the band gap. The partially unpinned interface results from the modest strength of the bonding between HfO{sub 2} and InGaAs(0 0 1)-(4x2) that prevents substrate atom disruption. The fortuitous structure of HfO{sub 2} on InAs(0 0 1)-(4x2) and InGaAs(0 0 1)-(4x2) allows for the elimination of the partially filled dangling bonds on the surface, which are usually responsible for Fermi level pinning.

Clemens, Jonathon B.; Bishop, Sarah R.; Kummel, Andrew C. [Department of Chemistry and Biochemistry, University of California, San Diego, 9500 Gilman Dr., 0358, La Jolla, California 92093-0358 (United States); Lee, Joon Sung [Department of Chemistry and Biochemistry/Materials Science and Engineering Program, University of California, San Diego, 9500 Gilman Dr., 0358, La Jolla, California 92093-0358 (United States); Droopad, Ravi [Department of Physics, Texas State University-San Marcos, San Marcos, Texas 78666 (United States)

2010-06-28T23:59:59.000Z

172

Metal Oxide Semiconductors for Solar Energy Harvesting.  

E-Print Network [OSTI]

??The correlation between energy consumption and human development illustrates the importance of this societal resource. We will consume more energy in the future. In light… (more)

Thimsen, Elijah

2009-01-01T23:59:59.000Z

173

Hybrid structure laser based on semiconductor nanowires and a silica microfiber knot cavity  

E-Print Network [OSTI]

Hybrid structure laser based on semiconductor nanowires and a silica microfiber knot cavity Qing://apl.aip.org/about/rights_and_permissions #12;Hybrid structure laser based on semiconductor nanowires and a silica microfiber knot cavity Qing 2009 We demonstrate a hybrid structure laser consisting of a single or multiple zinc oxide Zn

Wu, Shin-Tson

174

Investigation of abnormal negative threshold voltage shift under positive bias stress in input/output n-channel metal-oxide-semiconductor field-effect transistors with TiN/HfO{sub 2} structure using fast I-V measurement  

SciTech Connect (OSTI)

This letter investigates abnormal negative threshold voltage shifts under positive bias stress in input/output (I/O) TiN/HfO{sub 2} n-channel metal-oxide-semiconductor field-effect transistors using fast I-V measurement. This phenomenon is attributed to a reversible charge/discharge effect in pre-existing bulk traps. Moreover, in standard performance devices, threshold-voltage (V{sub t}) shifts positively during fast I-V double sweep measurement. However, in I/O devices, V{sub t} shifts negatively since electrons escape from bulk traps to metal gate rather than channel electrons injecting to bulk traps. Consequently, decreasing pre-existing bulk traps in I/O devices, which can be achieved by adopting Hf{sub x}Zr{sub 1?x}O{sub 2} as gate oxide, can reduce the charge/discharge effect.

Ho, Szu-Han; Chen, Ching-En; Tseng, Tseung-Yuen [Department of Electronics Engineering, National Chiao Tung University, Hsinchu 300, Taiwan (China); Chang, Ting-Chang, E-mail: tcchang@mail.phys.nsysu.edu.tw; Lu, Ying-Hsin; Tsai, Jyun-Yu; Liu, Kuan-Ju [Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan (China); Cheng, Osbert; Huang, Cheng-Tung; Lu, Ching-Sen [Device Department, United Microelectronics Corporation, Tainan Science Park, Taiwan (China)

2014-03-17T23:59:59.000Z

175

Multiband semiconductor compositions for photovoltaic devices  

DOE Patents [OSTI]

The highly mismatched alloy Zn1-yMnyOxTe1-x, 0.ltoreq.y<1 and 0band gap of the Zn1-yMnyTe host. With multiple band gaps that fall within the solar energy spectrum, Zn1-yMnyOxTe1-x is a material perfectly satisfying the conditions for single-junction photovoltaics with the potential for power conversion efficiencies surpassing 50%.

Walukiewicz, Wladyslaw; Yu, Kin Man; Wu, Junqiao

2010-05-04T23:59:59.000Z

176

Multiband semiconductor compositions for photovoltaic devices  

DOE Patents [OSTI]

The highly mismatched alloy Zn.sub.1-yMn.sub.yO.sub.xTe.sub.1-x, 0.ltoreq.y<1 and 0band gap of the Zn.sub.1-yMn.sub.yTe host. With multiple band gaps that fall within the solar energy spectrum, Zn.sub.1-yMn.sub.yO.sub.xTe.sub.1-x is a material perfectly satisfying the conditions for single-junction photovoltaics with the potential for power conversion efficiencies surpassing 50%.

Walukiewicz, Wladyslaw (Kensington, CA); Yu, Kin Man (Lafayette, CA); Wu, Junqiao (Belmont, MA)

2012-03-06T23:59:59.000Z

177

2012 DEFECTS IN SEMICONDUCTORS GORDON RESEARCH CONFERENCE, AUGUST 12-17, 2012  

SciTech Connect (OSTI)

The meeting shall strive to develop and further the fundamental understanding of defects and their roles in the structural, electronic, optical, and magnetic properties of bulk, thin film, and nanoscale semiconductors and device structures. Point and extended defects will be addressed in a broad range of electronic materials of particular current interest, including wide bandgap semiconductors, metal-oxides, carbon-based semiconductors (e.g., diamond, graphene, etc.), organic semiconductors, photovoltaic/solar cell materials, and others of similar interest. This interest includes novel defect detection/imaging techniques and advanced defect computational methods.

GLASER, EVAN

2012-08-17T23:59:59.000Z

178

Kansas Advanced Semiconductor Project  

SciTech Connect (OSTI)

KASP (Kansas Advanced Semiconductor Project) completed the new Layer 0 upgrade for D0, assumed key electronics projects for the US CMS project, finished important new physics measurements with the D0 experiment at Fermilab, made substantial contributions to detector studies for the proposed e+e- international linear collider (ILC), and advanced key initiatives in non-accelerator-based neutrino physics.

Baringer, P.; Bean, A.; Bolton, T.; Horton-Smith, G.; Maravin, Y.; Ratra, B.; Stanton, N.; von Toerne, E.; Wilson, G.

2007-09-21T23:59:59.000Z

179

Structure and electronic properties features of amorphous chalhogenide semiconductor films prepared by ion-plasma spraying  

SciTech Connect (OSTI)

Structure of amorphous chalcogenide semiconductor glassy As-S-Se films, obtained by high-frequency (HF) ion-plasma sputtering has been investigated. It was shown that the length of the atomic structure medium order and local structure were different from the films obtained by thermal vacuum evaporation. Temperature dependence of dark conductivity, as well as the dependence of the spectral transmittance has been studied. Conductivity value was determined at room temperature. Energy activation conductivity and films optical band gap have been calculated. Temperature and field dependence of the drift mobility of charge carriers in the HF As-S-Se films have been shown. Bipolarity of charge carriers drift mobility has been confirmed. Absence of deep traps for electrons in the As{sub 40}Se{sub 30}S{sub 30} spectrum of localized states for films obtained by HF plasma ion sputtering was determined. Bipolar drift of charge carriers was found in amorphous As{sub 40}Se{sub 30}S{sub 30} films obtained by ion-plasma sputtering of high-frequency, unlike the films of these materials obtained by thermal evaporation.

Korobova, N., E-mail: korobova3@mail.ru; Timoshenkov, S. [Department of Microelectronics, National Research University of Electronic Technology (MIET), Zelenograd (Russian Federation); Almasov, N.; Prikhodko, O. [al-Farabi Kazakh National University, Almaty (Kazakhstan); Tsendin, K. [Ioffe Physical-Technical Institute, Russian Academy of Sciences, St. Petersburg (Russian Federation)

2014-10-21T23:59:59.000Z

180

Band Gap Optimization of Two-Dimensional Photonic Crystals Using ...  

E-Print Network [OSTI]

Jul 10, 2009 ... proven very important as device components for integrated optics ...... Inhibited spontaneous emission in solid-state physics and electronics.

2009-07-10T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


181

Experimental study of photonic band gap accelerator structures  

E-Print Network [OSTI]

This thesis reports theoretical and experimental research on a novel accelerator concept using a photonic bandgap (PBG) structure. Major advances in higher order mode (HOM) damping are required for the next generation of ...

Marsh, Roark A

2009-01-01T23:59:59.000Z

182

Method for Creating Photonic Band Gap Materials - Energy Innovation Portal  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: VegetationEquipment Surfaces andMapping theEnergy StorageAdvancedMetamaterialsInnovationEnergy

183

Correlation between surface chemistry, density and band gap in  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: Vegetation Proposed Newcatalyst phases on &gamma;-Al2O3. | EMSLHydrogenin

184

Substrate-Induced Band-Gap Opening in Epitaxial Graphene  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May JunDatastreamsmmcrcalgovInstrumentsrucLas ConchasPassiveSubmittedStatus TomAbout »Lab (Newport NewsStyle Substrate-Induced

185

Semiconductor radiation detector  

DOE Patents [OSTI]

A semiconductor radiation detector is provided to detect x-ray and light photons. The entrance electrode is segmented by using variable doping concentrations. Further, the entrance electrode is physically segmented by inserting n+ regions between p+ regions. The p+ regions and the n+ regions are individually biased. The detector elements can be used in an array, and the p+ regions and the n+ regions can be biased by applying potential at a single point. The back side of the semiconductor radiation detector has an n+ anode for collecting created charges and a number of p+ cathodes. Biased n+ inserts can be placed between the p+ cathodes, and an internal resistor divider can be used to bias the n+ inserts as well as the p+ cathodes. A polysilicon spiral guard can be implemented surrounding the active area of the entrance electrode or surrounding an array of entrance electrodes.

Patt, Bradley E. (Sherman Oaks, CA); Iwanczyk, Jan S. (Los Angeles, CA); Tull, Carolyn R. (Orinda, CA); Vilkelis, Gintas (Westlake Village, CA)

2002-01-01T23:59:59.000Z

186

Thermal Conductivity of Ordered Mesoporous Titania Films Made from Nanocrystalline Building Blocks and Sol-Gel Reagents  

E-Print Network [OSTI]

significant attention due to their wide range of applications. They have been used in dye-sensitized solar cells for their wide band gap semiconductor properties.1 They have also been considered for solid oxide fuel cells as high proton conductivity porous exchange membranes.2 Mesoporous TiO2 is also a very

Pilon, Laurent

187

Infrared spectroscopy of ZnO nanoparticles containing CO2 impurities W. M. Hlaing Oo and M. D. McCluskeya  

E-Print Network [OSTI]

Institute of Physics. DOI: 10.1063/1.1866511 Zinc oxide ZnO is a wide-band gap semiconductor that is desirable for many applications, such as piezoelectric transducers, varistors, gas sensors, and transparent synthesized by a variety of wet-chemistry methods. The use of precursor materials such as zinc acetate, zinc

McCluskey, Matthew

188

Effect of annealing on the kinetic properties and band parameters of Hg{sub 1?x?y}Cd{sub x}Eu{sub y}Se semiconductor crystals  

SciTech Connect (OSTI)

The results of studies of the kinetic properties of Hg{sub 1?x?y}Cd{sub x}Eu{sub y}Se semiconductor crystals in the ranges of temperatures T = 77–300 K and magnetic fields H = 0.5–5 kOe before and after heat treatment of the samples in Se vapors are reported. It is established that annealing of the samples in Se vapors induces a decrease in the electron concentration. From the concentration dependence of the electron effective mass at the Fermi level, the band gap, the matrix element of interband interaction, and the electron effective mass at the bottom of the conduction band are determined.

Kovalyuk, T. T., E-mail: tarik-1006@mail.ru; Maistruk, E. V.; Maryanchuk, P. D. [Chernivtsy National University (Ukraine)

2014-12-15T23:59:59.000Z

189

Semiconductor Ion Implanters  

SciTech Connect (OSTI)

In 1953 the Raytheon CK722 transistor was priced at $7.60. Based upon this, an Intel Xeon Quad Core processor containing 820,000,000 transistors should list at $6.2 billion. Particle accelerator technology plays an important part in the remarkable story of why that Intel product can be purchased today for a few hundred dollars. Most people of the mid twentieth century would be astonished at the ubiquity of semiconductors in the products we now buy and use every day. Though relatively expensive in the nineteen fifties they now exist in a wide range of items from high-end multicore microprocessors like the Intel product to disposable items containing 'only' hundreds or thousands like RFID chips and talking greeting cards. This historical development has been fueled by continuous advancement of the several individual technologies involved in the production of semiconductor devices including Ion Implantation and the charged particle beamlines at the heart of implant machines. In the course of its 40 year development, the worldwide implanter industry has reached annual sales levels around $2B, installed thousands of dedicated machines and directly employs thousands of workers. It represents in all these measures, as much and possibly more than any other industrial application of particle accelerator technology. This presentation discusses the history of implanter development. It touches on some of the people involved and on some of the developmental changes and challenges imposed as the requirements of the semiconductor industry evolved.

MacKinnon, Barry A. [Isys, 2727 Walsh Ave., Suite 103, Santa Clara, CA 95051 (United States); Ruffell, John P. [Group 3, LLC, Sunnyvale, CA 94086 (United States)

2011-06-01T23:59:59.000Z

190

Method of passivating semiconductor surfaces  

DOE Patents [OSTI]

A method of passivating Group III-V or II-VI semiconductor compound surfaces. The method includes selecting a passivating material having a lattice constant substantially mismatched to the lattice constant of the semiconductor compound. The passivating material is then grown as an ultrathin layer of passivating material on the surface of the Group III-V or II-VI semiconductor compound. The passivating material is grown to a thickness sufficient to maintain a coherent interface between the ultrathin passivating material and the semiconductor compound. In addition, a device formed from such method is also disclosed.

Wanlass, Mark W. (Golden, CO)

1990-01-01T23:59:59.000Z

191

Method of passivating semiconductor surfaces  

SciTech Connect (OSTI)

A method is described for passivating Group III-V or II-VI semiconductor compound surfaces. The method includes selecting a passivating material having a lattice constant substantially mismatched to the lattice constant of the semiconductor compound. The passivating material is then grown as an ultrathin layer of passivating material on the surface of the Group III-V or II-VI semiconductor compound. The passivating material is grown to a thickness sufficient to maintain a coherent interface between the ultrathin passivating material and the semiconductor compound. In addition, a device formed from such method is also disclosed.

Wanlass, M.W.

1990-06-19T23:59:59.000Z

192

Noise and synamics in semiconductor lasers  

E-Print Network [OSTI]

In this thesis, theoretical and experimental work on the noise and dynamics in continuous wave and mode-locked semiconductor lasers is presented. The main focus is on semiconductor cascade lasers and semiconductor mode-locked ...

Rana, Farhan, 1971-

2003-01-01T23:59:59.000Z

193

Layered semiconductor neutron detectors  

DOE Patents [OSTI]

Room temperature operating solid state hand held neutron detectors integrate one or more relatively thin layers of a high neutron interaction cross-section element or materials with semiconductor detectors. The high neutron interaction cross-section element (e.g., Gd, B or Li) or materials comprising at least one high neutron interaction cross-section element can be in the form of unstructured layers or micro- or nano-structured arrays. Such architecture provides high efficiency neutron detector devices by capturing substantially more carriers produced from high energy .alpha.-particles or .gamma.-photons generated by neutron interaction.

Mao, Samuel S; Perry, Dale L

2013-12-10T23:59:59.000Z

194

Avalanche semiconductor radiation detectors  

SciTech Connect (OSTI)

Operation of novel avalanche semiconductor detector, produced on the basis of heterojunctions Si-SiC and Si-Si{sub x}O{sub y} is described. A uniform avalanche process with gain from 10{sup 3} to 10{sup 5} can be reached depending on the conductivity of SiC and Si{sub x}O{sub y} layers. Two types of avalanche photodetectors designed for applications in wavelength range 500--10,00 nm with quantum efficiency 60 {+-} 10% (650 nm) and 200--700 nm with quantum efficiency 60 {+-} 15% (450 nm) are presented.

Sadygov, Z.Y. [Joint Inst. for Nuclear Research, Dubna (Russian Federation)] [Joint Inst. for Nuclear Research, Dubna (Russian Federation); [Azerbaijan Academy of Sciences, Baku (Azerbaijan). Physics Inst.; Zheleznykh, I.M.; Kirillova, T.A. [Russian Academy of Sciences, Moscow (Russian Federation). Inst. for Nuclear Research] [Russian Academy of Sciences, Moscow (Russian Federation). Inst. for Nuclear Research; Malakhov, N.A.; Jejer, V.N. [Joint Inst. for Nuclear Research, Dubna (Russian Federation)] [Joint Inst. for Nuclear Research, Dubna (Russian Federation)

1996-06-01T23:59:59.000Z

195

Efficient semiconductor light-emitting device and method  

DOE Patents [OSTI]

A semiconductor light-emitting device and method. The semiconductor light-emitting device is provided with at least one control layer or control region which includes an annular oxidized portion thereof to channel an injection current into the active region, and to provide a lateral refractive index profile for index guiding the light generated within the device. A periodic composition grading of at least one of the mirror stacks in the device provides a reduced operating voltage of the device. The semiconductor light-emitting device has a high efficiency for light generation, and may be formed either as a resonant-cavity light-emitting diode (RCLED) or as a vertical-cavity surface-emitting laser (VCSEL).

Choquette, Kent D. (Albuquerque, NM); Lear, Kevin L. (Albuquerque, NM); Schneider, Jr., Richard P. (Albuquerque, NM)

1996-01-01T23:59:59.000Z

196

Efficient semiconductor light-emitting device and method  

DOE Patents [OSTI]

A semiconductor light-emitting device and method are disclosed. The semiconductor light-emitting device is provided with at least one control layer or control region which includes an annular oxidized portion thereof to channel an injection current into the active region, and to provide a lateral refractive index profile for index guiding the light generated within the device. A periodic composition grading of at least one of the mirror stacks in the device provides a reduced operating voltage of the device. The semiconductor light-emitting device has a high efficiency for light generation, and may be formed either as a resonant-cavity light-emitting diode (RCLED) or as a vertical-cavity surface-emitting laser (VCSEL). 12 figs.

Choquette, K.D.; Lear, K.L.; Schneider, R.P. Jr.

1996-02-20T23:59:59.000Z

197

Opportunities for Wide Bandgap Semiconductor Power Electronics...  

Energy Savers [EERE]

Opportunities for Wide Bandgap Semiconductor Power Electronics for Hydrogen and Fuel Cell Applications Opportunities for Wide Bandgap Semiconductor Power Electronics for Hydrogen...

198

Process for producing chalcogenide semiconductors  

DOE Patents [OSTI]

A process for producing chalcogenide semiconductor material is disclosed. The process includes forming a base metal layer and then contacting this layer with a solution having a low pH and containing ions from at least one chalcogen to chalcogenize the layer and form the chalcogenide semiconductor material.

Noufi, R.; Chen, Y.W.

1985-04-30T23:59:59.000Z

199

Ternary Cobalt Spinel Oxides for Solar Driven Hydrogen Production: Theory and Experiment  

SciTech Connect (OSTI)

Discovery of a chemically stable, light absorbing and low resistivity metal oxide with band edges aligned to the water redox potentials has been a goal of physical scientists for the past forty years. Despite an immense amount of effort, no solution has been uncovered. We present a combined theoretical and experimental exploration of a series of unconventional ternary cobalt spinel oxides, which offer chemical functionality through substitution on the octahedral spinel B site. First-principles predictions of the substitution of group 13 cations (Al, Ga, In) in Co{sub 3}O{sub 4} to form a series of homologous CoX{sub 2}O{sub 4} spinel compounds are combined with experimental synthesis and photoelectrochemical characterization. Ultimately, while tunable band gaps in the visible range can be obtained, the material performance is limited by poor carrier transport properties associated with small polaron carriers. Future design pathways for metal oxide exploration are discussed.

Walsh, A.; Ahn, K. S.; Shet, S.; Huda, M. N.; Deutsch, T. G.; Wang, H.; Turner, J. A.; Wei, S. H.; Yan, Y.; Al-Jassim, M. M.

2009-01-01T23:59:59.000Z

200

E-Print Network 3.0 - ambient oxidizer concentration Sample Search...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

of anneals in ammonia on the interface trap density near the band edges in 4Hsilicon carbide metal-oxide-semiconductor capacitors Summary: -silicon carbide...

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


201

Physics with isotopically controlled semiconductors  

SciTech Connect (OSTI)

This paper is based on a tutorial presentation at the International Conference on Defects in Semiconductors (ICDS-25) held in Saint Petersburg, Russia in July 2009. The tutorial focused on a review of recent research involving isotopically controlled semiconductors. Studies with isotopically enriched semiconductor structures experienced a dramatic expansion at the end of the Cold War when significant quantities of enriched isotopes of elements forming semiconductors became available for worldwide collaborations. Isotopes of an element differ in nuclear mass, may have different nuclear spins and undergo different nuclear reactions. Among the latter, the capture of thermal neutrons which can lead to neutron transmutation doping, is the most prominent effect for semiconductors. Experimental and theoretical research exploiting the differences in all the properties has been conducted and will be illustrated with selected examples.

Haller, E. E., E-mail: eehaller@lbl.gov [University of California at Berkeley, Department of Materials Science and Engineering (United States)

2010-07-15T23:59:59.000Z

202

Single-Crystal Tungsten Oxide Nanosheets: Photochemical Water Oxidation in the Quantum Confinement Regime  

E-Print Network [OSTI]

Single-Crystal Tungsten Oxide Nanosheets: Photochemical Water Oxidation in the Quantum Confinement, catalysis, WO3, tungsten oxide, nanosheet, nanocrystal, quantum confinement, solar energy conversion INTRODUCTION Tungsten trioxide crystallizes in the ReO3 structure type and is an n-type semiconductor with a 2

Osterloh, Frank

203

Studies on nickel-tungsten oxide thin films  

SciTech Connect (OSTI)

Nickel-Tungsten oxide (95:5) thin films were prepared by rf sputtering at 200W rf power with various substrate temperatures. X-ray diffraction study reveals the amorphous nature of films. The substrate temperature induced decrease in energy band gap with a maximum transmittance of 71%1 was observed. The Micro-Raman study shows broad peaks at 560 cm{sup ?1} and 1100 cm{sup ?1} correspond to Ni-O vibration and the peak at 860 cm{sup ?1} can be assigned to the vibration of W-O-W bond. Photoluminescence spectra show two peaks centered on 420 nm and 485 nm corresponding to the band edge emission and vacancies created due to the addition of tungsten, respectively.

Usha, K. S. [Department of Physics, Alagappa University, Karaikudi - 630 004 (India); Sivakumar, R., E-mail: krsivakumar1979@yahoo.com [Directorate of Distance Education, Alagappa University, Karaikudi - 630 004 (India); Sanjeeviraja, C. [Department of Physics, Alagappa Chettiar College of Engineering and Technology, Karaikudi - 630 004 (India)

2014-10-15T23:59:59.000Z

204

Thermal ionization induced metal-semiconductor transition and room temperature ferromagnetism in trivalent doped ZnO codoped with lithium  

SciTech Connect (OSTI)

Thermal ionization induced metallic to semiconductor (MST) transition occurring at 460?K for Zn{sub 0.97}Al{sub 0.03}O, 463?K for Zn{sub 0.94}Al{sub 0.03}Li{sub 0.03}O, and 503?K for Zn{sub 0.91}Al{sub 0.03}Li{sub 0.03}Mn{sub 0.03}O has been found in the sol-gel synthesized (using hexamethylenetetramine), trivalent doped (Al, Mn) ZnO codoped with lithium. Increase in the thermally ionized carrier concentration due to Al doping is responsible for near band edge (NBE) peak shift causing Fermi level to move into conduction band making it metallic consistent with resistivity results. Free carrier (thermally activated) neutralization with ionized donor is responsible for semiconducting nature, which is supported from the free carrier screening produced energy shift in the NBE of photoluminescence peak. Furthermore, independently band gap shrinkage is also obtained from UV-Visible studies confirming localization induced MST. An anti-correlation is found between defect density (DLE) and room temperature ferromagnetism (RTFM) indicating intrinsic defects are not directly responsible for RTFM.

Sivagamasundari, A.; Chandrasekar, S.; Pugaze, R.; Kannan, R., E-mail: kannan@pec.edu [Department of Physics, Pondicherry Engineering College, Puducherry 605 014 (India); Rajagopan, S. [Department of Chemistry, Pondicherry Engineering College, Puducherry 605 014 (India)

2014-03-07T23:59:59.000Z

205

Metal-semiconductor hybrid thin films in field-effect transistors  

SciTech Connect (OSTI)

Metal-semiconductor hybrid thin films consisting of an amorphous oxide semiconductor and a number of aluminum dots in different diameters and arrangements are formed by electron beam lithography and employed for thin-film transistors (TFTs). Experimental and computational demonstrations systematically reveal that the field-effect mobility of the TFTs enhances but levels off as the dot density increases, which originates from variations of the effective channel length that strongly depends on the electric field distribution in a transistor channel.

Okamura, Koshi, E-mail: koshi.okamura@kit.edu; Dehm, Simone [Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe (Germany)] [Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe (Germany); Hahn, Horst [Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe (Germany) [Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), 76021 Karlsruhe (Germany); KIT-TUD Joint Research Laboratory Nanomaterials, Technische Universität Darmstadt, Petersenstr. 32, 64287 Darmstadt (Germany)

2013-12-16T23:59:59.000Z

206

Semiconductor radiation detector  

DOE Patents [OSTI]

A semiconductor detector for ionizing electromagnetic radiation, neutrons, and energetic charged particles. The detecting element is comprised of a compound having the composition I-III-VI.sub.2 or II-IV-V.sub.2 where the "I" component is from column 1A or 1B of the periodic table, the "II" component is from column 2B, the "III" component is from column 3A, the "IV" component is from column 4A, the "V" component is from column 5A, and the "VI" component is from column 6A. The detecting element detects ionizing radiation by generating a signal proportional to the energy deposited in the element, and detects neutrons by virtue of the ionizing radiation emitted by one or more of the constituent materials subsequent to capture. The detector may contain more than one neutron-sensitive component.

Bell, Zane W. (Oak Ridge, TN); Burger, Arnold (Knoxville, TN)

2010-03-30T23:59:59.000Z

207

Semiconductor Bridge Cable Test  

SciTech Connect (OSTI)

The semiconductor bridge (SCB) is an electroexplosive device used to initiate detonators. A C cable is commonly used to connect the SCB to a firing set. A series of tests were performed to identify smaller, lighter cables for firing single and multiple SCBs. This report provides a description of these tests and their results. It was demonstrated that lower threshold voltages and faster firing times can be achieved by increasing the wire size, which reduces ohmic losses. The RF 100 appears to be a reasonable substitute for C cable when firing single SCBs. This would reduce the cable volume by 68% and the weight by 67% while increasing the threshold voltage by only 22%. In general, RG 58 outperforms twisted pair when firing multiple SCBs in parallel. The RG 58's superior performance is attributed to its larger conductor size.

KING, TONY L.

2002-01-01T23:59:59.000Z

208

Semiconductor device PN junction fabrication using optical processing of amorphous semiconductor material  

DOE Patents [OSTI]

Systems and methods for semiconductor device PN junction fabrication are provided. In one embodiment, a method for fabricating an electrical device having a P-N junction comprises: depositing a layer of amorphous semiconductor material onto a crystalline semiconductor base, wherein the crystalline semiconductor base comprises a crystalline phase of a same semiconductor as the amorphous layer; and growing the layer of amorphous semiconductor material into a layer of crystalline semiconductor material that is epitaxially matched to the lattice structure of the crystalline semiconductor base by applying an optical energy that penetrates at least the amorphous semiconductor material.

Sopori, Bhushan; Rangappan, Anikara

2014-11-25T23:59:59.000Z

209

Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer  

DOE Patents [OSTI]

A semiconductor structure. The semiconductor structure comprises a plurality of semiconductor layers formed on a substrate including at least one layer of a III-V compound semiconductor alloy comprising aluminum (Al) and antimony (Sb), with at least a part of the AlSb-alloy layer being chemically converted by an oxidation process to form superposed electrically insulating and electrically conducting portions. The electrically insulating portion formed from the AlSb-alloy layer comprises an oxide of aluminum (e.g. Al.sub.2 O.sub.3), while the electrically conducting portion comprises Sb. A lateral oxidation process allows formation of the superposed insulating and conducting portions below monocrystalline semiconductor layers for forming many different types of semiconductor structures having particular utility for optoelectronic devices such as light-emitting diodes, edge-emitting lasers, vertical-cavity surface-emitting lasers, photodetectors and optical modulators (waveguide and surface normal), and for electronic devices such as heterojunction bipolar transistors, field-effect transistors and quantum-effect devices. The invention is expected to be particularly useful for forming light-emitting devices for use in the 1.3-1.6 .mu.m wavelength range, with the AlSb-alloy layer acting to define an active region of the device and to effectively channel an electrical current therein for efficient light generation.

Spahn, Olga B. (Albuquerque, NM); Lear, Kevin L. (Albuquerque, NM)

1998-01-01T23:59:59.000Z

210

Mathematical Modeling of Semiconductor Devices  

E-Print Network [OSTI]

fibers. · Optoelectronic emitters convert an electronic signal into light. Examples are light-emitting diodes (LED) used in displays and indication lambs and semiconductor lasers used in compact disk systems

Jüngel, Ansgar

211

Seebeck coefficient in organic semiconductors  

E-Print Network [OSTI]

Seebeck coefficient in organic semiconductors A dissertation submitted for the degree of Doctor of Philosophy Deepak Venkateshvaran Fitzwilliam College & Optoelectronics Group, Cavendish Laboratory University of Cambridge February 2014 “The end...

Venkateshvaran, Deepak

2014-07-01T23:59:59.000Z

212

Modeling the semiconductor industry dynamics  

E-Print Network [OSTI]

The semiconductor industry is an exciting and challenging industry. Strong demand at the application end, plus the high capital intensity and rapid technological innovation in manufacturing, makes it difficult to manage ...

Wu, Kailiang

2008-01-01T23:59:59.000Z

213

Wide-Bandgap Semiconductors  

SciTech Connect (OSTI)

With the increase in demand for more efficient, higher-power, and higher-temperature operation of power converters, design engineers face the challenge of increasing the efficiency and power density of converters [1, 2]. Development in power semiconductors is vital for achieving the design goals set by the industry. Silicon (Si) power devices have reached their theoretical limits in terms of higher-temperature and higher-power operation by virtue of the physical properties of the material. To overcome these limitations, research has focused on wide-bandgap materials such as silicon carbide (SiC), gallium nitride (GaN), and diamond because of their superior material advantages such as large bandgap, high thermal conductivity, and high critical breakdown field strength. Diamond is the ultimate material for power devices because of its greater than tenfold improvement in electrical properties compared with silicon; however, it is more suited for higher-voltage (grid level) higher-power applications based on the intrinsic properties of the material [3]. GaN and SiC power devices have similar performance improvements over Si power devices. GaN performs only slightly better than SiC. Both SiC and GaN have processing issues that need to be resolved before they can seriously challenge Si power devices; however, SiC is at a more technically advanced stage than GaN. SiC is considered to be the best transition material for future power devices before high-power diamond device technology matures. Since SiC power devices have lower losses than Si devices, SiC-based power converters are more efficient. With the high-temperature operation capability of SiC, thermal management requirements are reduced; therefore, a smaller heat sink would be sufficient. In addition, since SiC power devices can be switched at higher frequencies, smaller passive components are required in power converters. Smaller heat sinks and passive components result in higher-power-density power converters. With the advent of the use of SiC devices it is imperative that models of these be made available in commercial simulators. This enables power electronic designers to simulate their designs for various test conditions prior to fabrication. To build an accurate transistor-level model of a power electronic system such as an inverter, the first step is to characterize the semiconductor devices that are present in the system. Suitable test beds need to be built for each device to precisely test the devices and obtain relevant data that can be used for modeling. This includes careful characterization of the parasitic elements so as to emulate the test setup as closely as possible in simulations. This report is arranged as follows: Chapter 2--The testing and characterization of several diodes and power switches is presented. Chapter 3--A 55-kW hybrid inverter (Si insulated gate bipolar transistor--SiC Schottky diodes) device models and test results are presented. A detailed description of the various test setups followed by the parameter extraction, modeling, and simulation study of the inverter performance is presented. Chapter 4--A 7.5-kW all-SiC inverter (SiC junction field effect transistors (JFET)--SiC Schottky diodes) was built and tested. The models built in Saber were validated using the test data and the models were used in system applications in the Saber simulator. The simulation results and a comparison of the data from the prototype tests are discussed in this chapter. Chapter 5--The duration test results of devices utilized in buck converters undergoing reliability testing are presented.

Chinthavali, M.S.

2005-11-22T23:59:59.000Z

214

Structural analysis and characterization of layer perovskite oxynitrides made from Dion-Jacobson oxide precursors  

SciTech Connect (OSTI)

A three-layer oxynitride Ruddlesden-Popper phase Rb{sub 1+x}Ca{sub 2}Nb{sub 3}O{sub 10-x}N{sub x}.yH{sub 2}O (x=0.7-0.8, y=0.4-0.6) was synthesized by ammonialysis at 800{sup o}C from the Dion-Jacobson phase RbCa{sub 2}Nb{sub 3}O{sub 10} in the presence of Rb{sub 2}CO{sub 3}. Incorporation of nitrogen into the layer perovskite structure was confirmed by XPS, combustion analysis, and MAS NMR. The water content was determined by thermal gravimetric analysis and the rubidium content by ICP-MS. A similar layered perovskite interconversion occurred in the two-layer Dion-Jacobson oxide RbLaNb{sub 2}O{sub 7} to yield Rb{sub 1+x}LaNb{sub 2}O{sub 7-x}N{sub x}.yH{sub 2}O (x=0.7-0.8, y=0.5-1.0). Both compounds were air- and moisture-sensitive, with rapid loss of nitrogen by oxidation and hydrolysis reactions. The structure of the three-layer oxynitride Rb{sub 1.7}Ca{sub 2}Nb{sub 3}O{sub 9.3}N{sub 0.7}.0.5H{sub 2}O was solved in space group P4/mmm with a=3.887(3) and c=18.65(1)A, by Rietveld refinement of X-ray powder diffraction data. The two-layer oxynitride structure Rb{sub 1.8}LaNb{sub 2}O{sub 6.3}N{sub 0.7}.1.0H{sub 2}O was also determined in space group P4/mmm with a=3.934(2) and c=14.697(2)A. GSAS refinement of synchrotron X-ray powder diffraction data showed that the water molecules were intercalated between a double layer of Rb+ ions in both the two- and three-layer Ruddlesden-Popper structures. Optical band gaps were measured by diffuse reflectance UV-vis for both materials. An indirect band gap of 2.51eV and a direct band gap of 2.99eV were found for the three-layer compound, while an indirect band gap of 2.29eV and a direct band gap of 2.84eV were measured for the two-layer compound. Photocatalytic activity tests of the three-layer compound under 380nm pass filtered light with AgNO{sub 3} as a sacrificial electron acceptor gave a quantum yield of 0.025% for oxygen evolution.

Schottenfeld, Joshua A. [Department of Chemistry, Pennsylvania State University, University Park, PA 16802 (United States); Benesi, Alan J. [Department of Chemistry, Pennsylvania State University, University Park, PA 16802 (United States); Stephens, Peter W. [Department of Physics and Astronomy, State University of New York, Stony Brook, New York 11794 (United States); Chen, Gugang [Departments of Physics, Pennsylvania State University, University Park, PA 16802 (United States); Eklund, Peter C. [Departments of Physics, Pennsylvania State University, University Park, PA 16802 (United States); Mallouk, Thomas E. [Department of Chemistry, Pennsylvania State University, University Park, PA 16802 (United States)]. E-mail: tom@chem.psu.edu

2005-07-15T23:59:59.000Z

215

Electromagnetic compatibility in semiconductor manufacturing  

SciTech Connect (OSTI)

Electromagnetic Interference (EMI) causes problems in semiconductor manufacturing facilities that range from nuisances to major disruptions of production. In many instances, these issues are addressed in a reactionary rather than proactive manner by individuals who do not have the experience or the equipment necessary to combat EMI problems in a timely, cost effective manner. This approach leads to expensive retrofits, reduced equipment availability, long recovery times, and in some cases, line yield impacts. The goal of electromagnetic compatibility (EMC) in semiconductor manufacturing is to ensure that semiconductor process, metrology, and support equipment operate as intended without being affected by electromagnetic disturbances either transmitted through air (radiated interference), or transferred into the equipment via a conductive media (conducted interference). Rather than being neglected until serious issues arise, EMC should be considered in the early stages of facility design, in order to gain the most benefit at the lowest cost.

Montoya, J.A. [Intel Corp., Hillsboro, OR (United States)

1995-12-31T23:59:59.000Z

216

Optical Properties and Potential Applications of Doped Semiconductor...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Optical Properties and Potential Applications of Doped Semiconductor Nanoparticles. Optical Properties and Potential Applications of Doped Semiconductor Nanoparticles. Abstract:...

217

Semiconductor structures having electrically insulating and conducting portions formed from an AlSb-alloy layer  

DOE Patents [OSTI]

The semiconductor structure comprises a plurality of semiconductor layers formed on a substrate including at least one layer of a III-V compound semiconductor alloy comprising aluminum (Al) and antimony (Sb), with at least a part of the AlSb-alloy layer being chemically converted by an oxidation process to form superposed electrically insulating and electrically conducting portions. The electrically insulating portion formed from the AlSb-alloy layer comprises an oxide of aluminum (e.g., Al{sub 2}O{sub 3}), while the electrically conducting portion comprises Sb. A lateral oxidation process allows formation of the superposed insulating and conducting portions below monocrystalline semiconductor layers for forming many different types of semiconductor structures having particular utility for optoelectronic devices such as light-emitting diodes, edge-emitting lasers, vertical-cavity surface-emitting lasers, photodetectors and optical modulators (waveguide and surface normal), and for electronic devices such as heterojunction bipolar transistors, field-effect transistors and quantum-effect devices. The invention is expected to be particularly useful for forming light-emitting devices for use in the 1.3--1.6 {mu}m wavelength range, with the AlSb-alloy layer acting to define an active region of the device and to effectively channel an electrical current therein for efficient light generation. 10 figs.

Spahn, O.B.; Lear, K.L.

1998-03-10T23:59:59.000Z

218

Correlated exciton dynamics in semiconductor nanostructures  

E-Print Network [OSTI]

The absorption and dissipation of energy in semiconductor nanostructures are often determined by excited electron dynamics. In semiconductors, one fundamentally important electronic state is an exciton, an excited electron ...

Wen, Patrick, Ph. D. Massachusetts Institute of Technology

2013-01-01T23:59:59.000Z

219

Method of preparing nitrogen containing semiconductor material  

DOE Patents [OSTI]

A method of combining group III elements with group V elements that incorporates at least nitrogen from a nitrogen halide for use in semiconductors and in particular semiconductors in photovoltaic cells.

Barber, Greg D.; Kurtz, Sarah R.

2004-09-07T23:59:59.000Z

220

Sandia National Laboratories: Semiconductor Revolution  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security Administration the1 -theErikGroundbreaking Work onClimateSemiconductor Revolution Semiconductor

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


221

Semiconductor electrode with improved photostability characteristics  

DOE Patents [OSTI]

An electrode is described for use in photoelectrochemical cells having an electrolyte which includes an aqueous constituent. The electrode consists of a semiconductor and a hydrophobic film disposed between the semiconductor and the aqueous constituent. The hydrophobic film is adapted to permit charges to pass therethrough while substantially decreasing the activity of the aqueous constituent at the semiconductor surface thereby decreasing the photodegradation of the semiconductor electrode.

Frank, A.J.

1985-02-19T23:59:59.000Z

222

Semiconductor nanocrystal-based phagokinetic tracking  

DOE Patents [OSTI]

Methods for determining metabolic properties of living cells through the uptake of semiconductor nanocrystals by cells. Generally the methods require a layer of neutral or hydrophilic semiconductor nanocrystals and a layer of cells seeded onto a culture surface and changes in the layer of semiconductor nanocrystals are detected. The observed changes made to the layer of semiconductor nanocrystals can be correlated to such metabolic properties as metastatic potential, cell motility or migration.

Alivisatos, A Paul; Larabell, Carolyn A; Parak, Wolfgang J; Le Gros, Mark; Boudreau, Rosanne

2014-11-18T23:59:59.000Z

223

Template-free hydrothermal derived cobalt oxide nanopowders: Synthesis, characterization, and removal of organic dyes  

SciTech Connect (OSTI)

Graphical abstract: XRD patterns of the products obtained by hydrothermal treatment at 160 °C for 24 h, and at different [Co{sup 2+}]/[CO{sub 3}{sup 2?}] ratios: (a) 1:6, (b) 1:3, (c) 1:1.5, (d) 1:1, (e) 1:0.5. Highlights: ? Spinel cobalt oxide nanoparticles with different morphologies were prepared by hydrothermal approach. ? The optical characteristics of the as-prepared cobalt oxide revealed the presence of two band gaps. ? Adsorption of methylene blue dye on Co{sub 3}O{sub 4} was investigated and the percent uptake was found to be >99% in 24 h. -- Abstract: Pure spinel cobalt oxide nanoparticles were prepared through hydrothermal approach using different counter ions. First, the pure and uniform cobalt carbonate (with particle size of 21.8–29.8 nm) were prepared in high yield (94%) in an autoclave in absence unfriendly organic surfactants or solvents by adjusting different experimental parameters such as: pH, reaction time, temperature, counter ions, and (Co{sup 2+}:CO{sub 3}{sup 2?}) molar ratios. Thence, the spinel Co{sub 3}O{sub 4} (with mean particle size of 30.5–47.35 nm) was produced by thermal decomposition of cobalt carbonate in air at 500 °C for 3 h. The products were characterized by powder X-ray diffraction (XRD), Fourier transform infrared (FTIR), transmission electron microscope (TEM), scanning electron microscope (SEM), and thermal analysis (TA). Also, the optical characteristics of the as-prepared Co{sub 3}O{sub 4} nanoparticles revealed the presence of two band gaps (1.45–1.47, and 1.83–1.93 eV). Additionally, adsorption of methylene blue dye on Co{sub 3}O{sub 4} nanoparticles was investigated and the uptake% was found to be >99% in 24 h.

Nassar, Mostafa Y. [Chemistry Department, Faculty of Science, Benha University, Benha 13518 (Egypt)] [Chemistry Department, Faculty of Science, Benha University, Benha 13518 (Egypt); Ahmed, Ibrahim S., E-mail: isahmed2010@gmail.com [Chemistry Department, Faculty of Science, Benha University, Benha 13518 (Egypt)

2012-09-15T23:59:59.000Z

224

Mechanical scriber for semiconductor devices  

DOE Patents [OSTI]

A mechanical scriber using a scribing tip, such as a diamond, provides controlled scriber forces with a spring-loaded compound lever arrangement. The scribing force and range of scribing depth are adjusted by a pair of adjustable micrometer heads. A semiconductor device, such as a multilayer solar cell, can be formed into scribed strips at each layer.

Lin, Peter T. (East Brunswick, NJ)

1985-01-01T23:59:59.000Z

225

Mechanical scriber for semiconductor devices  

DOE Patents [OSTI]

A mechanical scriber using a scribing tip, such as a diamond, provides controlled scriber forces with a spring-loaded compound lever arrangement. The scribing force and range of scribing depth are adjusted by a pair of adjustable micrometer heads. A semiconductor device, such as a multilayer solar cell, can be formed into scribed strips at each layer. 5 figs.

Lin, P.T.

1985-03-05T23:59:59.000Z

226

HAPPY NEW YEAR! Semiconductor Spintronics  

E-Print Network [OSTI]

Semiconductors MnGa S=5/2 moment Mn++ plus hole 200 unit cells Yakunin et al. PRL 96 216806 (2004) #12;Atomic Insulating Metallic Carrier-mediated Long-range Order Ohno, Munekata et al. PRL '89 PRL '92 APL `96 Mechanism;Theory of Spin Hamiltonian Konig et al. PRL (2000), PRB (2002) #12;Envelope Function Theory Light Holes

Nikolic, Branislav K.

227

Molecular dynamics simulation comparison of atomic scale intermixing at the amorphous Al2O3/semiconductor interface for a-Al2O3/Ge, a-Al2O3/InGaAs,  

E-Print Network [OSTI]

Molecular dynamics simulation comparison of atomic scale intermixing at the amorphous Al2O3/semiconductor interface for a-Al2O3/Ge, a-Al2O3/InGaAs, and a-Al2O3/InAlAs/InGaAs Evgueni A. Chagarov *, Andrew oxides Ge InGaAs InAlAs Oxide­semiconductor stack High-K oxide a b s t r a c t The structural properties

Kummel, Andrew C.

228

Back-side readout semiconductor photomultiplier  

DOE Patents [OSTI]

This disclosure provides systems, methods, and apparatus related to semiconductor photomultipliers. In one aspect, a device includes a p-type semiconductor substrate, the p-type semiconductor substrate having a first side and a second side, the first side of the p-type semiconductor substrate defining a recess, and the second side of the p-type semiconductor substrate being doped with n-type ions. A conductive material is disposed in the recess. A p-type epitaxial layer is disposed on the second side of the p-type semiconductor substrate. The p-type epitaxial layer includes a first region proximate the p-type semiconductor substrate, the first region being implanted with p-type ions at a higher doping level than the p-type epitaxial layer, and a second region disposed on the first region, the second region being doped with p-type ions at a higher doping level than the first region.

Choong, Woon-Seng; Holland, Stephen E

2014-05-20T23:59:59.000Z

229

High-performance self-aligned inversion-channel In{sub 0.53}Ga{sub 0.47}As metal-oxide-semiconductor field-effect-transistors by in-situ atomic-layer-deposited HfO{sub 2}  

SciTech Connect (OSTI)

Self-aligned inversion-channel In{sub 0.53}Ga{sub 0.47}As metal-oxide-semiconductor field-effect-transistors (MOSFETs) have been fabricated using the gate dielectrics of in-situ directly atomic-layer-deposited (ALD) HfO{sub 2} followed by ALD-Al{sub 2}O{sub 3}. There were no surface pretreatments and no interfacial passivation/barrier layers prior to the ALD. TiN/Al{sub 2}O{sub 3} (4?nm)/HfO{sub 2} (1?nm)/In{sub 0.53}Ga{sub 0.47}As/InP MOS capacitors exhibited well-behaved capacitance-voltage characteristics with true inversion behavior, low leakage current densities of ?10{sup ?8}?A/cm{sup 2} at ±1?MV/cm, and thermodynamic stability at high temperatures. Al{sub 2}O{sub 3} (3?nm)/HfO{sub 2} (1?nm)/In{sub 0.53}Ga{sub 0.47}As MOSFETs of 1 ?m gate length, with 700?°C–800?°C rapid thermal annealing in source/drain activation, have exhibited high extrinsic drain current (I{sub D}) of 1.5?mA/?m, transconductance (G{sub m}) of 0.84 mS/?m, I{sub ON}/I{sub OFF} of ?10{sup 4}, low sub-threshold swing of 103?mV/decade, and field-effect electron mobility of 1100 cm{sup 2}/V?·?s. The devices have also achieved very high intrinsic I{sub D} and G{sub m} of 2?mA/?m and 1.2?mS/?m, respectively.

Lin, T. D.; Chang, W. H.; Chang, Y. C.; Hong, M., E-mail: raynien@phys.nthu.edu.tw, E-mail: mhong@phys.ntu.edu.tw [Graduate Institute of Applied Physics and Department of Physics, National Taiwan University, Taipei 10617, Taiwan (China); Chu, R. L.; Chang, Y. H. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China)] [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Lee, M. Y.; Hong, P. F.; Chen, Min-Cheng [National Nano Device Laboratories, Hsinchu 30076, Taiwan (China)] [National Nano Device Laboratories, Hsinchu 30076, Taiwan (China); Kwo, J., E-mail: raynien@phys.nthu.edu.tw, E-mail: mhong@phys.ntu.edu.tw [Department of Physics, National Tsing Hua University, Hsinchu 30013, Taiwan (China)

2013-12-16T23:59:59.000Z

230

Performance of solid oxide fuel cells approaching the two-dimensional limit  

SciTech Connect (OSTI)

We model electrochemical kinetics and physical conduction mechanisms for carrier transport in electrolyte membranes to determine the limits of dimensionality reduction (down to 1?nm) on maximum power output of solid oxide fuel cells with symmetric Pt electrodes. Using Y-doped ZrO{sub 2}, we find a minimum thickness of ?6?nm to realize near ideal chemical potential in such fuel cells, which is limited by electronic breakdown when approaching the dielectric breakdown strength. For larger electrolyte thicknesses, the greatest source of electronic leakage influencing power loss is from Ohmic transport of minority carriers and emission of trapped carriers. For porous metallic electrodes, an ideal microstructure with the particle size comparable to particle spacing dimensions is found to accurately model experimental results. The role of electronic trap states in the electrolyte band gap on power density characteristics is highlighted.

Kerman, K., E-mail: kkerman@fas.harvard.edu; Ramanathan, S. [School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)

2014-05-07T23:59:59.000Z

231

Physical properties of erbium implanted tungsten oxide filmsdeposited by reactive dual magnetron sputtering  

SciTech Connect (OSTI)

Amorphous and partially crystalline WO3 thin films wereprepared by reactive dual magnetron sputtering and successively implantedby erbium ions with a fluence in the range from 7.7 x 1014 to 5 x 1015ions/cm2. The electrical and optical properties were studied as afunction of the film deposition parameters and the ion fluence. Ionimplantation caused a strong decrease of the resistivity, a moderatedecrease of the index of refraction and a moderate increase of theextinction coefficient in the visible and near infrared, while theoptical band gap remained almost unchanged. These effects could belargely ascribed to ion-induced oxygen deficiency. When annealed in air,the already low resistivities of the implanted samples decreased furtherup to 70oC, whereas oxidation, and hence a strong increase of theresistivity, was observed at higher annealing temperatures.

Mohamed, Sodky H.; Anders, Andre

2006-11-08T23:59:59.000Z

232

Heterojunction thin films based on multifunctional metal oxides for photovoltaic application  

SciTech Connect (OSTI)

Metal oxides based multifunctional heterojunction thin films of ZnO/SnO{sub 2} and ZnO/SnO{sub 2}/CuO QDs were prepared by spin-coating technique. The crystallographic properties and the surface morphologies of the films were studied by X-ray diffraction (XRD) and scanning electron microscopy (SEM), respectively. The optical absorption studies revealed that the film thickness has considerable effect on the band gap values and is found to be in the range of 3.73–3.48 eV. The photoluminescence spectra showed several weak visible emission peaks related to the deep level defects (450-575 nm). Finally, the current density-voltage (J-V) characteristic of ZnO/SnO{sub 2}/CuO QDs (ZSCI) based heterojunction thin film coated on ITO is also reported.

Prabhu, M.; Soundararajan, N.; Ramachandran, K. [School of Physics, Madurai Kamaraj University, Madurai - 625021 (India); Marikkannan, M.; Mayandi, J. [School of Chemistry, Madurai Kamaraj University, Madurai - 625021 (India)

2014-04-24T23:59:59.000Z

233

Stretchable semiconductor elements and stretchable electrical circuits  

DOE Patents [OSTI]

The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

Rogers, John A. (Champaign, IL); Khang, Dahl-Young (Seoul, KR); Menard, Etienne (Durham, NC)

2009-07-07T23:59:59.000Z

234

Optical devices featuring textured semiconductor layers  

DOE Patents [OSTI]

A semiconductor sensor, solar cell or emitter, or a precursor therefor, has a substrate and one or more textured semiconductor layers deposited onto the substrate. The textured layers enhance light extraction or absorption. Texturing in the region of multiple quantum wells greatly enhances internal quantum efficiency if the semiconductor is polar and the quantum wells are grown along the polar direction. Electroluminescence of LEDs of the invention is dichromatic, and results in variable color LEDs, including white LEDs, without the use of phosphor.

Moustakas, Theodore D. (Dover, MA); Cabalu, Jasper S. (Cary, NC)

2012-08-07T23:59:59.000Z

235

Optical devices featuring textured semiconductor layers  

DOE Patents [OSTI]

A semiconductor sensor, solar cell or emitter, or a precursor therefor, has a substrate and one or more textured semiconductor layers deposited onto the substrate. The textured layers enhance light extraction or absorption. Texturing in the region of multiple quantum wells greatly enhances internal quantum efficiency if the semiconductor is polar and the quantum wells are grown along the polar direction. Electroluminescence of LEDs of the invention is dichromatic, and results in variable color LEDs, including white LEDs, without the use of phosphor.

Moustakas, Theodore D. (Dover, MA); Cabalu, Jasper S. (Cary, NC)

2011-10-11T23:59:59.000Z

236

Low Energy Ion Implantationin Semiconductor Manufacturing | U...  

Office of Science (SC) Website

Low Energy Ion Implantation in Semiconductor Manufacturing Nuclear Physics (NP) NP Home About Research Facilities Science Highlights Benefits of NP Applications of Nuclear Science...

237

Wafer-fused semiconductor radiation detector  

DOE Patents [OSTI]

Wafer-fused semiconductor radiation detector useful for gamma-ray and x-ray spectrometers and imaging systems. The detector is fabricated using wafer fusion to insert an electrically conductive grid, typically comprising a metal, between two solid semiconductor pieces, one having a cathode (negative electrode) and the other having an anode (positive electrode). The wafer fused semiconductor radiation detector functions like the commonly used Frisch grid radiation detector, in which an electrically conductive grid is inserted in high vacuum between the cathode and the anode. The wafer-fused semiconductor radiation detector can be fabricated using the same or two different semiconductor materials of different sizes and of the same or different thicknesses; and it may utilize a wide range of metals, or other electrically conducting materials, to form the grid, to optimize the detector performance, without being constrained by structural dissimilarity of the individual parts. The wafer-fused detector is basically formed, for example, by etching spaced grooves across one end of one of two pieces of semiconductor materials, partially filling the grooves with a selected electrical conductor which forms a grid electrode, and then fusing the grooved end of the one semiconductor piece to an end of the other semiconductor piece with a cathode and an anode being formed on opposite ends of the semiconductor pieces.

Lee, Edwin Y. (Livermore, CA); James, Ralph B. (Livermore, CA)

2002-01-01T23:59:59.000Z

238

Photon Statistics of Semiconductor Light Sources.  

E-Print Network [OSTI]

??In recent years, semiconductor light sources have become more and more interesting in terms of applications due to their high efficiency and low cost. Advanced… (more)

Aßmann, Marc

2010-01-01T23:59:59.000Z

239

CCEC Seminar Wireless Sensors for SemiconductorWireless Sensors for Semiconductor  

E-Print Network [OSTI]

CCEC Seminar Wireless Sensors for SemiconductorWireless Sensors for Semiconductor Manufacturing perhaps. In this talk, we describe our efforts in developing a new class of wireless sensors for use in semiconductor manufacturing. These sensors are fully self-contained with on board power, communications

Akhmedov, Azer

240

Passivating ligand and solvent contributions to the electronic properties of semiconductor nanocrystals  

SciTech Connect (OSTI)

We examine in detail the impact of passivating ligands (i.e., amines, phosphines, phosphine oxides and pyridines) on the electronic and optical spectra of Cd{sub 33}Se{sub 33} quantum dots (QDs) using density functional theory (DFT) and time-dependent DFT (TDDFT) quantum-chemical methodologies. Most ligand orbitals are found deep inside in the valence and conduction bands of the QD, with pyridine being an exception by introducing new states close to the conduction band edge. Importantly, all ligands contribute states which are highly delocalized over both the QD surface and ligands, forming hybridized orbitals rather than ligand-localized trap states. In contrast, the states close to the band gap are delocalized over the QD atoms only and define the lower energy absorption spectra. The random detachment of one of ligands from the QD surface results in the appearance of a highly localized unoccupied state inside the energy gap of the QD. Such changes in the electronic structure are correlated with the respective QD-ligand binding energy and steric ligand-ligand interactions. Polar solvent significantly reduces both effects leading to delocalization and stabilization of the surface states. Thus, trap and surface states are substantially eliminated by the solvent. Polar solvent also blue-shifts (e.g., 0.3-0.4 eV in acetonitrile) the calculated absorption spectra. This shift increases with an increase of the dielectric constant of the solvent. We also found that the approximate single-particle Kohn-Sham (KS) approach is adequate for calculating the absorption spectra of the ligated QDs. Besides a systematic blue-shift, the KS spectra are in very good agreement with their respective counterparts calculated with the more accurate TDDFT method.

Fischer, S.; Crotty, A.; Kilina, S.; Ivanov, I.; Tretiak, S

2012-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


241

Photovoltaic property of bismuth ferrite thin films and its application in non-volatile memory.  

E-Print Network [OSTI]

??In conventional junction-based photovoltaic cells, the photovoltage is usually smaller than the semiconductor band gap, due to the limitation of the energy barrier at the… (more)

Guo, Rui.

2013-01-01T23:59:59.000Z

242

Low Frequency Noise in Nano-Devices  

E-Print Network [OSTI]

device quality, reliability and the degradation processes. The generation- recombination noise which. His current research interests include low frequency noise, wide-band-gap semiconductors, UV light

243

Minding the Gap Makes for More Efficient Solar Cells  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

properties of these materials go through a dramatic change that makes them ideal for solar energy applications. These materials can go from indirect band gap semiconductors to...

244

Measuring Speedy Electrons in Silicon  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

scientists have taken snapshots of this very brief band-gap jump and timed it at 450 attoseconds. Image: Stephen Leone The entire semiconductor industry, not to mention...

245

Ann. N.Y. Acad. Sci. 1006: 104121 (2003). 2003 New York Academy of Sciences. doi: 10.1196/annals.1292.007  

E-Print Network [OSTI]

semiconductor nanowires, semiconducting oxide nanowires, such as ZnO, CdO, and In2O3 are becoming increasingly cells and organic light emitting diodes.13,14 More importantly, In2O3 films have been demonstrated.6eV and an indirect band gap of about 2.5eV). In2O3 in the bulk form has been widely used in solar

Zhou, Chongwu

2003-01-01T23:59:59.000Z

246

Optic probe for semiconductor characterization  

DOE Patents [OSTI]

Described herein is an optical probe (120) for use in characterizing surface defects in wafers, such as semiconductor wafers. The optical probe (120) detects laser light reflected from the surface (124) of the wafer (106) within various ranges of angles. Characteristics of defects in the surface (124) of the wafer (106) are determined based on the amount of reflected laser light detected in each of the ranges of angles. Additionally, a wafer characterization system (100) is described that includes the described optical probe (120).

Sopori, Bhushan L. (Denver, CO); Hambarian, Artak (Yerevan, AM)

2008-09-02T23:59:59.000Z

247

PHYSICAL REVIEW B 83, 115329 (2011) Diffusion and interface growth in hafnium oxide and silicate ultrathin films on Si(001)  

E-Print Network [OSTI]

PHYSICAL REVIEW B 83, 115329 (2011) Diffusion and interface growth in hafnium oxide and silicate­oxide­semiconductor (CMOS) technology necessary.1,2 Transition metal (Hf, Zr, La) oxides, silicates, and ternary Hf to be desirable to have at least one monolayer of SiO2 at the dielectric/Si interface. The Hf oxide (silicate

Garfunkel, Eric

248

Webinar: Opportunities for Wide Bandgap Semiconductor Power Electronic...  

Broader source: Energy.gov (indexed) [DOE]

Opportunities for Wide Bandgap Semiconductor Power Electronics for Hydrogen and Fuel Cell Applications Webinar: Opportunities for Wide Bandgap Semiconductor Power Electronics...

249

New ALS Technique Guides IBM in Next-Generation Semiconductor...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

New ALS Technique Guides IBM in Next-Generation Semiconductor Development New ALS Technique Guides IBM in Next-Generation Semiconductor Development Print Wednesday, 21 January 2015...

250

Engineering Density of States of Earth Abundant Semiconductors...  

Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

of States of Earth Abundant Semiconductors for Enhanced Thermoelectric Power Factor Engineering Density of States of Earth Abundant Semiconductors for Enhanced Thermoelectric...

251

Hydrogenated Graphene Nanoflakes: Semiconductor to Half-Metal...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Hydrogenated Graphene Nanoflakes: Semiconductor to Half-Metal Transition and Remarkable Large Magnetism. Hydrogenated Graphene Nanoflakes: Semiconductor to Half-Metal Transition...

252

Preparation of a semiconductor thin film  

DOE Patents [OSTI]

A process for the preparation of a semiconductor film. The process comprises depositing nanoparticles of a semiconductor material onto a substrate whose surface temperature during nanoparticle deposition thereon is sufficient to cause substantially simultaneous fusion of the nanoparticles to thereby coalesce with each other and effectuate film growth.

Pehnt, Martin (TuBingen, DE); Schulz, Douglas L. (Denver, CO); Curtis, Calvin J. (Lakewood, CO); Ginley, David S. (Evergreen, CO)

1998-01-01T23:59:59.000Z

253

Hybrid anode for semiconductor radiation detectors  

DOE Patents [OSTI]

The present invention relates to a novel hybrid anode configuration for a radiation detector that effectively reduces the edge effect of surface defects on the internal electric field in compound semiconductor detectors by focusing the internal electric field of the detector and redirecting drifting carriers away from the side surfaces of the semiconductor toward the collection electrode(s).

Yang, Ge; Bolotnikov, Aleksey E; Camarda, Guiseppe; Cui, Yonggang; Hossain, Anwar; Kim, Ki Hyun; James, Ralph B

2013-11-19T23:59:59.000Z

254

Preparation of a semiconductor thin film  

DOE Patents [OSTI]

A process is disclosed for the preparation of a semiconductor film. The process comprises depositing nanoparticles of a semiconductor material onto a substrate whose surface temperature during nanoparticle deposition thereon is sufficient to cause substantially simultaneous fusion of the nanoparticles to thereby coalesce with each other and effectuate film growth.

Pehnt, M.; Schulz, D.L.; Curtis, C.J.; Ginley, D.S.

1998-01-27T23:59:59.000Z

255

e! Science News Semiconductor manufacturing technique holds  

E-Print Network [OSTI]

arsenide chips manufactured in multilayer stacks: light sensors, high-speed transistors and solar cellse! Science News Semiconductor manufacturing technique holds promise for solar energy Published semiconductor manufacturing method pioneered at the University of Illinois, the future of solar energy just got

Rogers, John A.

256

Nonlinear Peltier effect in semiconductors Mona Zebarjadia  

E-Print Network [OSTI]

Nonlinear Peltier effect in semiconductors Mona Zebarjadia Department of Electrical Engineering; published online 18 September 2007 Nonlinear Peltier coefficient of a doped InGaAs semiconductor is calculated numerically using the Monte Carlo technique. The Peltier coefficient is also obtained analytically

257

Semiconductor switch geometry with electric field shaping  

DOE Patents [OSTI]

An optoelectric switch is disclosed that utilizes a cylindrically shaped and contoured GaAs medium or other optically active semiconductor medium to couple two cylindrically shaped metal conductors with flat and flared termination points each having an ovoid prominence centrally extending there from. Coupling the truncated ovoid prominence of each conductor with the cylindrically shaped optically active semiconductor causes the semiconductor to cylindrically taper to a triple junction circular line at the base of each prominence where the metal conductor conjoins with the semiconductor and a third medium such as epoxy or air. Tapering the semiconductor at the triple junction inhibits carrier formation and injection at the triple junction and thereby enables greater current carrying capacity through and greater sensitivity of the bulk area of the optically active medium.

Booth, Rex (Livermore, CA); Pocha, Michael D. (Livermore, CA)

1994-01-01T23:59:59.000Z

258

Semiconductor switch geometry with electric field shaping  

DOE Patents [OSTI]

An optoelectric switch is disclosed that utilizes a cylindrically shaped and contoured GaAs medium or other optically active semiconductor medium to couple two cylindrically shaped metal conductors with flat and flared termination points each having an ovoid prominence centrally extending there from. Coupling the truncated ovoid prominence of each conductor with the cylindrically shaped optically active semiconductor causes the semiconductor to cylindrically taper to a triple junction circular line at the base of each prominence where the metal conductor conjoins with the semiconductor and a third medium such as epoxy or air. Tapering the semiconductor at the triple junction inhibits carrier formation and injection at the triple junction and thereby enables greater current carrying capacity through and greater sensitivity of the bulk area of the optically active medium. 10 figs.

Booth, R.; Pocha, M.D.

1994-08-23T23:59:59.000Z

259

Nano- sized strontium titanate metal oxide semiconductor oxygen gas sensors.  

E-Print Network [OSTI]

??The project focuses on strontium titanate (SrTiO3> material, a very important material for oxygen sensors. The advantages of the material are low cost and stability… (more)

Hu, Ying.

2008-01-01T23:59:59.000Z

260

Visible Light Water Splitting Using Dye-Sensitized Oxide Semiconductors  

E-Print Network [OSTI]

- ical energy in the form of fuels. Hydrogen is a key solar fuel because it can be used directly. This Account describes our approach to two problems in solar water splitting: the organization of molecules in photochemistry.1,2 Efficient photocatalytic water-splitting systems could have practical value for solar energy

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


261

Characterization of Amorphous Zinc Tin Oxide Semiconductors. | EMSL  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: Vegetation Proposed New Substation SitesStanding FriedelIron-Sulfur3-1 November8-1DerivedfromCu,Region

262

Metal Oxide Semiconductor Nanoparticles Open the Door to New Medical  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: VegetationEquipment Surfaces andMapping theEnergy StorageAdvanced Materials AdvancedInnovations | Argonne

263

Metal Oxide Semiconductor Nanoparticles Pave the Way for Medical Innovation  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: VegetationEquipment Surfaces andMapping theEnergy StorageAdvanced Materials AdvancedInnovations |

264

Novel room temperature ferromagnetic semiconductors  

SciTech Connect (OSTI)

Today's information world, bits of data are processed by semiconductor chips, and stored in the magnetic disk drives. But tomorrow's information technology may see magnetism (spin) and semiconductivity (charge) combined in one 'spintronic' device that exploits both charge and 'spin' to carry data (the best of two worlds). Spintronic devices such as spin valve transistors, spin light emitting diodes, non-volatile memory, logic devices, optical isolators and ultra-fast optical switches are some of the areas of interest for introducing the ferromagnetic properties at room temperature in a semiconductor to make it multifunctional. The potential advantages of such spintronic devices will be higher speed, greater efficiency, and better stability at a reduced power consumption. This Thesis contains two main topics: In-depth understanding of magnetism in Mn doped ZnO, and our search and identification of at least six new above room temperature ferromagnetic semiconductors. Both complex doped ZnO based new materials, as well as a number of nonoxides like phosphides, and sulfides suitably doped with Mn or Cu are shown to give rise to ferromagnetism above room temperature. Some of the highlights of this work are discovery of room temperature ferromagnetism in: (1) ZnO:Mn (paper in Nature Materials, Oct issue, 2003); (2) ZnO doped with Cu (containing no magnetic elements in it); (3) GaP doped with Cu (again containing no magnetic elements in it); (4) Enhancement of Magnetization by Cu co-doping in ZnO:Mn; (5) CdS doped with Mn, and a few others not reported in this thesis. We discuss in detail the first observation of ferromagnetism above room temperature in the form of powder, bulk pellets, in 2-3 mu-m thick transparent pulsed laser deposited films of the Mn (<4 at. percent) doped ZnO. High-resolution transmission electron microscopy (HRTEM) and electron energy loss spectroscopy (EELS) spectra recorded from 2 to 200nm areas showed homogeneous distribution of Mn substituting for Zn a 2+ state in the ZnO lattice. Ferromagnetic Resonance (FMR) technique is used to confirm the existence of ferromagnetic ordering at temperatures as high as 425K. The ab initio calculations were found to be consistent with the observation of ferromagnetism arising from fully polarized Mn 2+ state. The key to observed room temperature ferromagnetism in this system is the low temperature processing, which prevents formation of clusters, secondary phases and the host ZnO from becoming n-type. The electronic structure of the same Mn doped ZnO thin films studied using XAS, XES and RIXS, revealed a strong hybridization between Mn 3d and O 2p states, which is an important characteristic of a Dilute magnetic Semiconductor (DMS). It is shown that the various processing conditions like sintering temperature, dopant concentration and the properties of precursors used for making of DMS have a great influence on the final properties. Use of various experimental techniques to verify the physical properties, and to understand the mechanism involved to give rise to ferromagnetism is presented. Methods to improve the magnetic moment in Mn doped ZnO are also described. New promising DMS materials (such as Cu doped ZnO are explored). The demonstrated new capability to fabricate powder, pellets, and thin films of room temperature ferromagnetic semiconductors thus makes possible the realization of a wide range of complex elements for a variety of new multifunctional phenomena related to Spintronic devices as well as magneto-optic components.

Gupta, Amita

2004-11-01T23:59:59.000Z

265

Low interfacial trap density and sub-nm equivalent oxide thickness in In{sub 0.53}Ga{sub 0.47}As (001) metal-oxide-semiconductor devices using molecular beam deposited HfO{sub 2}/Al{sub 2}O{sub 3} as gate dielectrics  

SciTech Connect (OSTI)

We investigated the passivation of In{sub 0.53}Ga{sub 0.47}As (001) surface by molecular beam epitaxy techniques. After growth of strained In{sub 0.53}Ga{sub 0.47}As on InP (001) substrate, HfO{sub 2}/Al{sub 2}O{sub 3} high-{kappa} oxide stacks have been deposited in-situ after surface reconstruction engineering. Excellent capacitance-voltage characteristics have been demonstrated along with low gate leakage currents. The interfacial density of states (D{sub it}) of the Al{sub 2}O{sub 3}/In{sub 0.53}Ga{sub 0.47}As interface have been revealed by conductance measurement, indicating a downward D{sub it} profile from the energy close to the valence band (medium 10{sup 12} cm{sup -2}eV{sup -1}) towards that close to the conduction band (10{sup 11} cm{sup -2}eV{sup -1}). The low D{sub it}'s are in good agreement with the high Fermi-level movement efficiency of greater than 80%. Moreover, excellent scalability of the HfO{sub 2} has been demonstrated as evidenced by the good dependence of capacitance oxide thickness on the HfO{sub 2} thickness (dielectric constant of HfO{sub 2}{approx}20) and the remained low D{sub it}'s due to the thin Al{sub 2}O{sub 3} passivation layer. The sample with HfO{sub 2} (3.4 nm)/Al{sub 2}O{sub 3} (1.2 nm) as the gate dielectrics has exhibited an equivalent oxide thickness of {approx}0.93 nm.

Chu, L. K. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Katholieke Universiteit Leuven, 3001 Leuven (Belgium); Merckling, C.; Dekoster, J.; Caymax, M. [Interuniversity Microelectronics Center (IMEC vzw), 3001 Leuven (Belgium); Alian, A.; Heyns, M. [Katholieke Universiteit Leuven, 3001 Leuven (Belgium); Interuniversity Microelectronics Center (IMEC vzw), 3001 Leuven (Belgium); Kwo, J. [Department of Physics, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Center for Condensed Matter Sciences, National Taiwan University, Taipei 10617, Taiwan (China); Hong, M. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China)

2011-07-25T23:59:59.000Z

266

J Am Cerom Soc 73 [lo] 3026-32 (19901 Electrical Properties of Individual Zinc Oxide  

E-Print Network [OSTI]

properties of single interfaces and grain boundaries. [Keywords: grain boundaries, zinc oxide, varistors semiconductor, zinc oxide (ZnO), which is used commercially as a varistor material. This is an excellentJ Am Cerom Soc 73 [lo] 3026-32 (19901 Electrical Properties of Individual Zinc Oxide Grain

Rohrer, Gregory S.

267

Synchrotron x-ray reflectivity study of oxidation/passivation of copper and silicon.  

SciTech Connect (OSTI)

Synchrotron x-ray-scattering technique studies of copper and silicon electrochemical interfaces are reported. These two examples illustrate the application of synchrotron x-ray techniques for oxidation, passivation, and dissolution of metals and semiconductors.

Chu, Y.; Nagy, Z.; Parkhutik, V.; You, H.

1999-07-21T23:59:59.000Z

268

Electrochemical lithiation and delithiation for control of magnetic properties of nanoscale transition metal oxides  

E-Print Network [OSTI]

Transition metal oxides comprise a fascinating class of materials displaying a variety of magnetic and electronic properties, ranging from half-metallic ferromagnets like CrO2, ferrimagnetic semiconductors like Fey's, and ...

Sivakumar, Vikram

2008-01-01T23:59:59.000Z

269

Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering  

E-Print Network [OSTI]

Cuprous oxide (Cu[subscript 2]O) is a promising earth-abundant semiconductor for photovoltaic applications. We report Hall mobilities of polycrystalline Cu[subscript 2]O thin films deposited by reactive dc magnetron ...

Lee, Yun Seog

270

Low temperature lithographically patterned metal oxide transistors for large area electronics  

E-Print Network [OSTI]

Optically transparent, wide bandgap metal oxide semiconductors are a promising candidate for large-area electronics technologies that require lightweight, temperature-sensitive flexible substrates. Because these thin films ...

Wang, Annie I. (Annie I-Jen), 1981-

2011-01-01T23:59:59.000Z

271

Boron doping a semiconductor particle  

DOE Patents [OSTI]

A method (10,30) of boron doping a semiconductor particle using boric acid to obtain a p-type doped particle. Either silicon spheres or silicon powder is mixed with a diluted solution of boric acid having a predetermined concentration. The spheres are dried (16), with the boron film then being driven (18) into the sphere. A melt procedure mixes the driven boron uniformly throughout the sphere. In the case of silicon powder, the powder is metered out (38) into piles and melted/fused (40) with an optical furnace. Both processes obtain a p-type doped silicon sphere with desired resistivity. Boric acid is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirements.

Stevens, Gary Don (18912 Ravenglen Ct., Dallas, TX 75287); Reynolds, Jeffrey Scott (703 Horizon, Murphy, TX 75094); Brown, Louanne Kay (2530 Poplar Tr., Garland, TX 75042)

1998-06-09T23:59:59.000Z

272

Phosphorous doping a semiconductor particle  

DOE Patents [OSTI]

A method (10) of phosphorus doping a semiconductor particle using ammonium phosphate. A p-doped silicon sphere is mixed with a diluted solution of ammonium phosphate having a predetermined concentration. These spheres are dried (16, 18), with the phosphorus then being diffused (20) into the sphere to create either a shallow or deep p-n junction. A good PSG glass layer is formed on the surface of the sphere during the diffusion process. A subsequent segregation anneal process is utilized to strip metal impurities from near the p-n junction into the glass layer. A subsequent HF strip procedure is then utilized to removed the PSG layer. Ammonium phosphate is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirement.

Stevens, Gary Don (18912 Ravenglen Ct, Dallas, TX 75287); Reynolds, Jeffrey Scott (703 Horizon, Murphy, TX 75094)

1999-07-20T23:59:59.000Z

273

Heating device for semiconductor wafers  

DOE Patents [OSTI]

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernable pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light.

Vosen, Steven R. (Berkeley, CA)

1999-01-01T23:59:59.000Z

274

Heating device for semiconductor wafers  

DOE Patents [OSTI]

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernible pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light. 4 figs.

Vosen, S.R.

1999-07-27T23:59:59.000Z

275

Transport Equations for Semiconductors Prof. Dr. Ansgar Jungel  

E-Print Network [OSTI]

- cations have been invented; for instance, semiconductor lasers, solar cells, light-emitting diodes (LED

Jüngel, Ansgar

276

ECE 344--Semiconductor Devices & Materials ECE Department, UMass Amherst  

E-Print Network [OSTI]

Topics: Fundamentals of Semiconductors; Theory of Electrical Conduction; Device Operations (See "Class

Massachusetts at Amherst, University of

277

Diluted magnetic semiconductor nanowires exhibiting magnetoresistance  

DOE Patents [OSTI]

A method for is disclosed for fabricating diluted magnetic semiconductor (DMS) nanowires by providing a catalyst-coated substrate and subjecting at least a portion of the substrate to a semiconductor, and dopant via chloride-based vapor transport to synthesize the nanowires. Using this novel chloride-based chemical vapor transport process, single crystalline diluted magnetic semiconductor nanowires Ga.sub.1-xMn.sub.xN (x=0.07) were synthesized. The nanowires, which have diameters of .about.10 nm to 100 nm and lengths of up to tens of micrometers, show ferromagnetism with Curie temperature above room temperature, and magnetoresistance up to 250 Kelvin.

Yang, Peidong (El Cerrito, CA); Choi, Heonjin (Seoul, KR); Lee, Sangkwon (Daejeon, KR); He, Rongrui (Albany, CA); Zhang, Yanfeng (El Cerrito, CA); Kuykendal, Tevye (Berkeley, CA); Pauzauskie, Peter (Berkeley, CA)

2011-08-23T23:59:59.000Z

278

Single crystalline Pr{sub 2-x}Y{sub x}O{sub 3} (x=0-2) dielectrics on Si with tailored electronic and crystallographic structure  

SciTech Connect (OSTI)

Crystalline oxides on Si with tailored electronic and crystallographic properties are of importance for the integration of functional oxides or alternative semiconductors to enable novel device concepts in Si microelectronics. We present an electronic band gap study of single crystalline Pr{sub 2-x}Y{sub x}O{sub 3} (0{<=}x{<=}2) heterostructures on Si(111). The perfect solubility of the isomorphic bixbyites Pr{sub 2}O{sub 3} and Y{sub 2}O{sub 3} during molecular beam epitaxy thin film growth on Si enables a linear band gap tuning. Special focus is devoted to the determination of the electronic band offsets across the dielectric/Si interface. In addition, the composition x allows to control the crystallographic lattice parameter where, for example, Pr{sub 0.8}Y{sub 1.2}O{sub 3} enables the growth of fully lattice matched oxide heterostructures on Si.

Seifarth, O.; Schubert, M. A.; Giussani, A.; Schroeder, T. [IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany); Klenov, D. O. [FEI, Achtseweg Noord 5, 5651 GG Eindhoven (Netherlands); Schmeisser, D. [BTU Cottbus, Konrad Wachsmann Allee 1, 03046 Cottbus (Germany)

2010-11-15T23:59:59.000Z

279

Investigation of the basic physics of high efficiency semiconductor hot carrier solar cell. Annual status report, 31 May 1994-30 May 1995  

SciTech Connect (OSTI)

The main purpose of this research program is to investigate potential semiconductor materials and their multi-band-gap MQW (multiple quantum wells) structures for high efficiency solar cells for aerospace and commercial applications. The absorption and PL (photoluminescence) spectra, the carrier dynamics, and band structures have been investigated for semiconductors of InP, GaP, GaInP, and InGaAsP/InP MQW structures, and for semiconductors of GaAs and AlGaAs by previous measurements. The barrier potential design criteria for achieving maximum energy conversion efficiency, and the resonant tunneling time as a function of barrier width in high efficiency MQW solar cell structures have also been investigated in the first two years. Based on previous carrier dynamics measurements and the time-dependent short circuit current density calculations, an InAs/InGaAs - InGaAs/GaAs - GaAs/AlGaAs MQW solar cell structure with 15 bandgaps has been designed. The absorption and PL spectra in InGaAsP/InP bulk and MQW structures were measured at room temperature and 77 K with different pump wavelength and intensity, to search for resonant states that may affect the solar cell activities. Time-resolved IR absorption for InGaAsP/InP bulk and MQW structures has been measured by femtosecond visible-pump and IR-probe absorption spectroscopy. This, with the absorption and PL measurements, will be helpful to understand the basic physics and device performance in multi-bandgap InAs/InGaAs - InGaAs/InP - InP/InGaP MQW solar cells. In particular, the lifetime of the photoexcited hot electrons is an important parameter for the device operation of InGaAsP/InP MQW solar cells working in the resonant tunneling conditions. Lastly, time evolution of the hot electron relaxation in GaAs has been measured in the temperature range of 4 K through 288 K using femtosecond pump-IR-probe absorption technique.

Alfano, R.R.; Wang, W.B.; Mohaidat, J.M.; Cavicchia, M.A.; Raisky, O.Y.

1995-05-01T23:59:59.000Z

280

Helicon wave excitation to produce energetic electrons for manufacturing semiconductors  

DOE Patents [OSTI]

A helicon plasma source is controlled by varying the axial magnetic field or rf power controlling the formation of the helicon wave. An energetic electron current is carried on the wave when the magnetic field is 90 G; but there is minimal energetic electron current when the magnetic field is 100 G in one particular plasma source. Similar performance can be expected from other helicon sources by properly adjusting the magnetic field and power to the particular geometry. This control for adjusting the production of energetic electrons can be used in the semiconductor and thin-film manufacture process. By applying energetic electrons to the insulator layer, such as silicon oxide, etching ions are attracted to the insulator layer and bombard the insulator layer at higher energy than areas that have not accumulated the energetic electrons. Thus, silicon and metal layers, which can neutralize the energetic electron currents will etch at a slower or non-existent rate. This procedure is especially advantageous in the multilayer semiconductor manufacturing because trenches can be formed that are in the range of 0.18-0.35 mm or less.

Molvik, Arthur W. (Livermore, CA); Ellingboe, Albert R. (Fremont, CA)

1998-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


281

Helicon wave excitation to produce energetic electrons for manufacturing semiconductors  

DOE Patents [OSTI]

A helicon plasma source is controlled by varying the axial magnetic field or rf power controlling the formation of the helicon wave. An energetic electron current is carried on the wave when the magnetic field is 90 G; but there is minimal energetic electron current when the magnetic field is 100 G in one particular plasma source. Similar performance can be expected from other helicon sources by properly adjusting the magnetic field and power to the particular geometry. This control for adjusting the production of energetic electrons can be used in the semiconductor and thin-film manufacture process. By applying energetic electrons to the insulator layer, such as silicon oxide, etching ions are attracted to the insulator layer and bombard the insulator layer at higher energy than areas that have not accumulated the energetic electrons. Thus, silicon and metal layers, which can neutralize the energetic electron currents will etch at a slower or non-existent rate. This procedure is especially advantageous in the multilayer semiconductor manufacturing because trenches can be formed that are in the range of 0.18--0.35 mm or less. 16 figs.

Molvik, A.W.; Ellingboe, A.R.

1998-10-20T23:59:59.000Z

282

EXCITONIC EIGENSTATES OF DISORDERED SEMICONDUCTOR QUANTUM WIRES  

E-Print Network [OSTI]

of semiconductors are exploited in solar cells, light emitting diodes, and lasers, and, furthermore, future UNIVERSITY OF MINNESOTA 400 Lind Hall 207 Church Street S.E. Minneapolis, Minnesota 55455­0436 Phone: 612

283

Semiconductor-nanocrystal/conjugated polymer thin films  

DOE Patents [OSTI]

The invention described herein provides for thin films and methods of making comprising inorganic semiconductor-nanocrystals dispersed in semiconducting-polymers in high loading amounts. The invention also describes photovoltaic devices incorporating the thin films.

Alivisatos, A. Paul (Oakland, CA); Dittmer, Janke J. (Munich, DE); Huynh, Wendy U. (Munich, DE); Milliron, Delia (Berkeley, CA)

2010-08-17T23:59:59.000Z

284

Electrical Usage Characterization of Semiconductor Processing Tools  

E-Print Network [OSTI]

This paper presents the basic concepts in performing an energy and power audit of a semiconductor process tool. A protocol exists that fully describes these measurements and their use and applicability and it will be described. This protocol...

Hinson, S. R.

285

Surface phonons of III-V semiconductors  

E-Print Network [OSTI]

are the simplest of all semiconductor surfaces. Their atomic relaxations and electronic surface states are rather well understood. There have, however, been surprisingly few experimental studies of their vibrational properties, and ours in the first detailed...

Das, Pradip Kumar

1994-01-01T23:59:59.000Z

286

Optical temperature indicator using thermochromic semiconductors  

DOE Patents [OSTI]

A reversible optical temperature indicator utilizes thermochromic semiconductors which vary in color in response to various temperature levels. The thermochromic material is enclosed in an enamel which provides protection and prevents breakdown at higher temperatures. Cadmium sulfide is the preferred semiconductor material. The indicator may be utilized as a sign or in a striped arrangement to clearly provide a warning to a user. The various color responses provide multiple levels of alarm.

Kronberg, J.W.

1995-01-01T23:59:59.000Z

287

Optical devices featuring nonpolar textured semiconductor layers  

DOE Patents [OSTI]

A semiconductor emitter, or precursor therefor, has a substrate and one or more textured semiconductor layers deposited onto the substrate in a nonpolar orientation. The textured layers enhance light extraction, and the use of nonpolar orientation greatly enhances internal quantum efficiency compared to conventional devices. Both the internal and external quantum efficiencies of emitters of the invention can be 70-80% or higher. The invention provides highly efficient light emitting diodes suitable for solid state lighting.

Moustakas, Theodore D; Moldawer, Adam; Bhattacharyya, Anirban; Abell, Joshua

2013-11-26T23:59:59.000Z

288

Fabrication of Semiconductors by Wet Chemical Etch  

E-Print Network [OSTI]

- ern devices. Beginning with Bardeen, Brittain and Shockley’s invention of the transistor in Bell Labs in 1947 and Kilby and Noyce’s introduction of the integrated circuit about a decade later, semiconductor devices have dramat- ically advanced... ad- dition of impurities, their conductivity can be altered. With the need to manu- facture devices at the micro- and nano- scale, the semiconductor industry has followed “Moore’s Law,” the trend that the number of transistors placed...

Francoviglia, Laura

2008-07-01T23:59:59.000Z

289

Semiconductor heterojunction band offsets and charge neutrality  

E-Print Network [OSTI]

involving lasers, light emitting diodes, and metal-semiconductor field effect transistors, the models of Schottky and Bardeen correspond only to limiting cases, in which the energy barriers for electrons at the interface respectively vary linearly... of metal-lead sulfide contacts on the polarity of the applied voltage. In the 1930's, Tamm, Mott, Schottky and others developed the basic theory related to surface and interface semiconductor properties. Schottky introduced the first modern model Journal...

Lee, Chomsik

2012-06-07T23:59:59.000Z

290

A Semiconductor Microlaser for Intracavity Flow Cytometry  

SciTech Connect (OSTI)

Semiconductor microlasers are attractive components for micro-analysis systems because of their ability to emit coherent intense light from a small aperture. By using a surface-emitting semiconductor geometry, we were able to incorporate fluid flow inside a laser microcavity for the first time. This confers significant advantages for high throughput screening of cells, particulates and fluid analytes in a sensitive microdevice. In this paper we discuss the intracavity microfluidics and present preliminary results with flowing blood and brain cells.

Akhil, O.; Copeland, G.C.; Dunne, J.L.; Gourley, P.L.; Hendricks, J.K.; McDonald, A.E.

1999-01-20T23:59:59.000Z

291

Electron gas grid semiconductor radiation detectors  

DOE Patents [OSTI]

An electron gas grid semiconductor radiation detector (EGGSRAD) useful for gamma-ray and x-ray spectrometers and imaging systems is described. The radiation detector employs doping of the semiconductor and variation of the semiconductor detector material to form a two-dimensional electron gas, and to allow transistor action within the detector. This radiation detector provides superior energy resolution and radiation detection sensitivity over the conventional semiconductor radiation detector and the "electron-only" semiconductor radiation detectors which utilize a grid electrode near the anode. In a first embodiment, the EGGSRAD incorporates delta-doped layers adjacent the anode which produce an internal free electron grid well to which an external grid electrode can be attached. In a second embodiment, a quantum well is formed between two of the delta-doped layers, and the quantum well forms the internal free electron gas grid to which an external grid electrode can be attached. Two other embodiments which are similar to the first and second embodiment involve a graded bandgap formed by changing the composition of the semiconductor material near the first and last of the delta-doped layers to increase or decrease the conduction band energy adjacent to the delta-doped layers.

Lee, Edwin Y. (Livermore, CA); James, Ralph B. (Livermore, CA)

2002-01-01T23:59:59.000Z

292

Shockwave generation by a semiconductor bridge operation in water  

SciTech Connect (OSTI)

A semiconductor bridge (SCB) is a silicon device, used in explosive systems as the electrical initiator element. In recent years, SCB plasma has been extensively studied, both electrically and using fast photography and spectroscopic imaging. However, the value of the pressure buildup at the bridge remains unknown. In this study, we operated SCB devices in water and, using shadow imaging and reference beam interferometry, obtained the velocity of the shock wave propagation and distribution of the density of water. These results, together with a self-similar hydrodynamic model, were used to calculate the pressure generated by the exploding SCB. In addition, the results obtained showed that the energy of the water flow exceeds significantly the energy deposited into the exploded SCB. The latter can be explained by the combustion of the aluminum and silicon atoms released in water, which acts as an oxidizing medium.

Zvulun, E.; Toker, G.; Gurovich, V. Tz.; Krasik, Ya. E. [Physics Department, Technion, Haifa 32000 (Israel)

2014-05-28T23:59:59.000Z

293

E-Print Network 3.0 - amorphous semiconductor state Sample Search...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

semiconductors have been proposed... sensitivity) and use the power of organic chemistry to rationally design new synthetic semiconductors without... semiconductors?" one is...

294

E-Print Network 3.0 - area semiconductor laser Sample Search...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

areas of semiconductor... for conducting research on wide bandgap semiconductor optoelectronics in my research group, within the Center... bandgap III-Nitride semiconductor...

295

Near-Infrared Photoluminescence Enhancement in Ge/CdS and Ge/ZnS Core/Shell Nanocrystals: Utilizing IV/II-VI Semiconductor Epitaxy  

SciTech Connect (OSTI)

Ge nanocrystals have a large Bohr radius and a small, size-tunable band gap that may engender direct character via strain or doping. Colloidal Ge nanocrystals are particularly interesting in the development of near-infrared materials for applications in bioimaging, telecommunications and energy conversion. Epitaxial growth of a passivating shell is a common strategy employed in the synthesis of highly luminescent II–VI, III–V and IV–VI semiconductor quantum dots. Here, we use relatively unexplored IV/II–VI epitaxy as a way to enhance the photoluminescence and improve the optical stability of colloidal Ge nanocrystals. Selected on the basis of their relatively small lattice mismatch compared with crystalline Ge, we explore the growth of epitaxial CdS and ZnS shells using the successive ion layer adsorption and reaction method. Powder X-ray diffraction and electron microscopy techniques, including energy dispersive X-ray spectroscopy and selected area electron diffraction, clearly show the controllable growth of as many as 20 epitaxial monolayers of CdS atop Ge cores. In contrast, Ge etching and/or replacement by ZnS result in relatively small Ge/ZnS nanocrystals. The presence of an epitaxial II–VI shell greatly enhances the near-infrared photoluminescence and improves the photoluminescence stability of Ge. Ge/II–VI nanocrystals are reproducibly 1–3 orders of magnitude brighter than the brightest Ge cores. Ge/4.9CdS core/shells show the highest photoluminescence quantum yield and longest radiative recombination lifetime. Thiol ligand exchange easily results in near-infrared active, water-soluble Ge/II–VI nanocrystals. We expect this synthetic IV/II–VI epitaxial approach will lead to further studies into the optoelectronic behavior and practical applications of Si and Ge-based nanomaterials.

Guo, Yijun [Ames Laboratory; Rowland, Clare E [Argonne National Laboratory; Schaller, Richard D [Argonne National Laboratory; Vela, Javier [Ames Laboratory

2014-08-26T23:59:59.000Z

296

Thin film solar cell including a spatially modulated intrinsic layer  

DOE Patents [OSTI]

One or more thin film solar cells in which the intrinsic layer of substantially amorphous semiconductor alloy material thereof includes at least a first band gap portion and a narrower band gap portion. The band gap of the intrinsic layer is spatially graded through a portion of the bulk thickness, said graded portion including a region removed from the intrinsic layer-dopant layer interfaces. The band gap of the intrinsic layer is always less than the band gap of the doped layers. The gradation of the intrinsic layer is effected such that the open circuit voltage and/or the fill factor of the one or plural solar cell structure is enhanced.

Guha, Subhendu (Troy, MI); Yang, Chi-Chung (Troy, MI); Ovshinsky, Stanford R. (Bloomfield Hills, MI)

1989-03-28T23:59:59.000Z

297

Dissipative chaos in semiconductor superlattices  

SciTech Connect (OSTI)

We consider the motion of ballistic electrons in a miniband of a semiconductor superlattice (SSL) under the influence of an external, time-periodic electric field. We use a semiclassical, balance-equation approach, which incorporates elastic and inelastic scattering (as dissipation) and the self-consistent field generated by the electron motion. The coupling of electrons in the miniband to the self-consistent field produces a cooperative nonlinear oscillatory mode which, when interacting with the oscillatory external field and the intrinsic Bloch-type oscillatory mode, can lead to complicated dynamics, including dissipative chaos. For a range of values of the dissipation parameters we determine the regions in the amplitude-frequency plane of the external field in which chaos can occur. Our results suggest that for terahertz external fields of the amplitudes achieved by present-day free-electron lasers, chaos may be observable in SSL{close_quote}s. We clarify the nature of this interesting nonlinear dynamics in the superlattice{endash}external-field system by exploring analogies to the Dicke model of an ensemble of two-level atoms coupled with a resonant cavity field, and to Josephson junctions. {copyright} {ital 1996 The American Physical Society.}

Alekseev, K.N.; Berman, G.P. [Center for Nonlinear Studies and Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)] [Center for Nonlinear Studies and Theoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States); [Kirensky Institute of Physics, 660036, Krasnoyarsk (Russia); [Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801-3080 (United States); Campbell, D.K.; Cannon, E.H.; Cargo, M.C. [Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801-3080 (United States)] [Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801-3080 (United States)

1996-10-01T23:59:59.000Z

298

Spin Transport in Semiconductor heterostructures  

SciTech Connect (OSTI)

The focus of the research performed under this grant has been the investigation of spin transport in magnetic semiconductor heterostructures. The interest in these systems is motivated both by their intriguing physical properties, as the physical embodiment of a spin-polarized Fermi liquid, as well as by their potential applications as spintronics devices. In our work we have analyzed several different problems that affect the spin dynamics in single and bi-layer spin-polarized two-dimensional (2D) systems. The topics of interests ranged from the fundamental aspects of the electron-electron interactions, to collective spin and charge density excitations and spin transport in the presence of the spin-orbit coupling. The common denominator of these subjects is the impact at the macroscopic scale of the spin-dependent electron-electron interaction, which plays a much more subtle role than in unpolarized electron systems. Our calculations of several measurable parameters, such as the excitation frequencies of magneto-plasma modes, the spin mass, and the spin transresistivity, propose realistic theoretical estimates of the opposite-spin many-body effects, in particular opposite-spin correlations, that can be directly connected with experimental measurements.

Domnita Catalina Marinescu

2011-02-22T23:59:59.000Z

299

Atomic layer deposition of bismuth oxide using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O  

SciTech Connect (OSTI)

Bismuth oxide thin films were deposited by atomic layer deposition using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O at deposition temperatures between 90 and 270?°C on Si{sub 3}N{sub 4}, TaN, and TiN substrates. Films were analyzed using spectroscopic ellipsometry, x-ray diffraction, x-ray reflectivity, high-resolution transmission electron microscopy, and Rutherford backscattering spectrometry. Bi{sub 2}O{sub 3} films deposited at 150?°C have a linear growth per cycle of 0.039?nm/cycle, density of 8.3?g/cm{sup 3}, band gap of approximately 2.9?eV, low carbon content, and show the ? phase structure with a (201) preferred crystal orientation. Deposition temperatures above 210?°C and postdeposition anneals caused uneven volumetric expansion, resulting in a decrease in film density, increased interfacial roughness, and degraded optical properties.

Austin, Dustin Z., E-mail: austind@eecs.oregonstate.edu; Conley, John F., E-mail: jconley@eecs.oregonstate.edu [Department of Electrical Engineering and Computer Science, Oregon State University, Corvallis, Oregon 97331 (United States); Allman, Derryl; Price, David; Hose, Sallie [ON Semiconductor, Technology Development, Gresham, Oregon 97030 (United States); Saly, Mark [SAFC Hitech, Haverhill, Massachusetts 01832 (United States)

2014-01-15T23:59:59.000Z

300

Pulsed laser ablation growth and doping of epitaxial compound semiconductor films  

SciTech Connect (OSTI)

Pulsed laser ablation (PLA) has several characteristics that are potentially attractive for the growth and doping of chemically complex compound semiconductors including (1) stoichiometric (congruent) transfer of composition from target to film, (2) the use of reactive gases to control film composition and/or doping via energetic-beam-induced reactions, and (3) low-temperature nonequilibrium phase formation in the laser-generated plasma ``plume.`` However, the electrical properties of compound semiconductors are far more sensitive to low concentrations of defects than are the oxide metals/ceramics for which PLA has been so successful. Only recently have doped epitaxial compound semiconductor films been grown by PLA. Fundamental studies are being carried out to relate film electrical and microstructural properties to the energy distribution of ablated species, to the temporal evolution of the ablation pulse in ambient gases, and to beam assisted surface and/or gas-phase reactions. In this paper the authors describe results of ex situ Hall effect, high-resolution x-ray diffraction, transmission electron microscopy, and Rutherford backscattering measurements that are being used in combination with in situ RHEED and time-resolved ion probe measurements to evaluate PLA for growth of doped epitaxial compound semiconductor films and heterostructures. Examples are presented and results analyzed for doped II-VI, I-III-VI, and column-III nitride materials grown recently in this and other laboratories.

Lowndes, D.H.; Rouleau, C.M.; Geohegan, D.B.; Budai, J.D.; Poker, D.B. [Oak Ridge National Lab., TN (United States). Solid State Div.; Puretzky, A.A. [Inst. of Spectroscopy, Troitsk (Russian Federation); Strauss, M.A.; Pedraza, A.J.; Park, J.W. [Univ. of Tennessee, Knoxville, TN (United States)

1995-12-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


301

Light sources based on semiconductor current filaments  

DOE Patents [OSTI]

The present invention provides a new type of semiconductor light source that can produce a high peak power output and is not injection, e-beam, or optically pumped. The present invention is capable of producing high quality coherent or incoherent optical emission. The present invention is based on current filaments, unlike conventional semiconductor lasers that are based on p-n junctions. The present invention provides a light source formed by an electron-hole plasma inside a current filament. The electron-hole plasma can be several hundred microns in diameter and several centimeters long. A current filament can be initiated optically or with an e-beam, but can be pumped electrically across a large insulating region. A current filament can be produced in high gain photoconductive semiconductor switches. The light source provided by the present invention has a potentially large volume and therefore a potentially large energy per pulse or peak power available from a single (coherent) semiconductor laser. Like other semiconductor lasers, these light sources will emit radiation at the wavelength near the bandgap energy (for GaAs 875 nm or near infra red). Immediate potential applications of the present invention include high energy, short pulse, compact, low cost lasers and other incoherent light sources.

Zutavern, Fred J. (Albuquerque, NM); Loubriel, Guillermo M. (Albuquerque, NM); Buttram, Malcolm T. (Sandia Park, NM); Mar, Alan (Albuquerque, NM); Helgeson, Wesley D. (Albuquerque, NM); O'Malley, Martin W. (Edgewood, NM); Hjalmarson, Harold P. (Albuquerque, NM); Baca, Albert G. (Albuquerque, NM); Chow, Weng W. (Cedar Crest, NM); Vawter, G. Allen (Albuquerque, NM)

2003-01-01T23:59:59.000Z

302

Extracting hot carriers from photoexcited semiconductor nanocrystals  

SciTech Connect (OSTI)

This research program addresses a fundamental question related to the use of nanomaterials in solar energy -- namely, whether semiconductor nanocrystals (NCs) can help surpass the efficiency limits, the so-called “Shockley-Queisser” limit, in conventional solar cells. In these cells, absorption of photons with energies above the semiconductor bandgap generates “hot” charge carriers that quickly “cool” to the band edges before they can be utilized to do work; this sets the solar cell efficiency at a limit of ~31%. If instead, all of the energy of the hot carriers could be captured, solar-to-electric power conversion efficiencies could be increased, theoretically, to as high as 66%. A potential route to capture this energy is to utilize semiconductor nanocrystals. In these materials, the quasi-continuous conduction and valence bands of the bulk semiconductor become discretized due to confinement of the charge carriers. Consequently, the energy spacing between the electronic levels can be much larger than the highest phonon frequency of the lattice, creating a “phonon bottleneck” wherein hot-carrier relaxation is possible via slower multiphonon emission. For example, hot-electron lifetimes as long as ~1 ns have been observed in NCs grown by molecular beam epitaxy. In colloidal NCs, long lifetimes have been demonstrated through careful design of the nanocrystal interfaces. Due to their ability to slow electronic relaxation, semiconductor NCs can in principle enable extraction of hot carriers before they cool to the band edges, leading to more efficient solar cells.

Zhu, Xiaoyang

2014-12-10T23:59:59.000Z

303

Two-Photon Emission from Semiconductors  

E-Print Network [OSTI]

We report the first experimental observations of two-photon emission from semiconductors, to the best of our knowledge, and develop a corresponding theory for the room-temperature process. Spontaneous two-photon emission is demonstrated in optically-pumped bulk GaAs and in electrically-driven GaInP/AlGaInP quantum wells. Singly-stimulated two-photon emission measurements demonstrate the theoretically predicted two-photon optical gain in semiconductors - a necessary ingredient for any realizations of future two-photon semiconductor lasers. Photon-coincidence experiment validates the simultaneity of the electrically-driven GaInP/AlGaInP two-photon emission, limited only by detector's temporal resolution.

Alex Hayat; Pavel Ginzburg; Meir Orenstein

2007-10-25T23:59:59.000Z

304

Substrate solder barriers for semiconductor epilayer growth  

DOE Patents [OSTI]

During the growth of compound semiconductors by epitaxial processes, substrates are typically mounted to a support. In modular beam epitaxy, mounting is done using indium as a solder. This method has two drawbacks: the indium reacts with the substrate, and it is difficult to uniformly wet the back of a large diameter substrate. Both of these problems have been successfully overcome by sputter coating the back of the substrate with a thin layer of tungsten carbide or tungsten carbide and gold. In addition to being compatible with the growth of high quality semiconductor epilayers this coating is also inert in all standard substrate cleaning etchants used for compound semiconductors, and provides uniform distribution of energy in radiant heating.

Drummond, Timothy J. (Tijeras, NM); Ginley, David S. (Albuquerque, NM); Zipperian, Thomas E. (Albuquerque, NM)

1989-01-01T23:59:59.000Z

305

Substrate solder barriers for semiconductor epilayer growth  

DOE Patents [OSTI]

During the growth of compound semiconductors by epitaxial processes, substrates are typically mounted to a support. In modular beam epitaxy, mounting is done using indium as a solder. This method has two drawbacks: the indium reacts with the substrate, and it is difficult to uniformly wet the back of a large diameter substrate. Both of these problems have been successfully overcome by sputter coating the back of the substrate with a thin layer of tungsten carbide or tungsten carbide and gold. In addition to being compatible with the growth of high quality semiconductor epilayers this coating is also inert in all standard substrate cleaning etchants used for compound semiconductors, and provides uniform distribution of energy in radiant heating.

Drummond, T.J.; Ginley, D.S.; Zipperian, T.E.

1989-05-09T23:59:59.000Z

306

Substrate solder barriers for semiconductor epilayer growth  

DOE Patents [OSTI]

During the growth of compound semiconductors by epitaxial processes, substrates are typically mounted to a support. In molecular beam epitaxy, mounting is done using indium as a solder. This method has two drawbacks: the indium reacts with the substrate, and it is difficult to uniformly wet the back of a large diameter substrate. Both of these problems have been successfully overcome by sputter coating the back of the substrate with a thin layer of tungsten carbide or tungsten carbide and gold. In addition to being compatible with the growth of high quality semiconductor epilayers this coating is also inert in all standard substate cleaning etchants used for compound semiconductors, and provides uniform distribution of energy in radiant heating. 1 tab.

Drummond, T.J.; Ginley, D.S.; Zipperian, T.E.

1987-10-23T23:59:59.000Z

307

Blasting detonators incorporating semiconductor bridge technology  

SciTech Connect (OSTI)

The enormity of the coal mine and extraction industries in Russia and the obvious need in both Russia and the US for cost savings and enhanced safety in those industries suggests that joint studies and research would be of mutual benefit. The author suggests that mine sites and well platforms in Russia offer an excellent opportunity for the testing of Sandia`s precise time-delay semiconductor bridge detonators, with the potential for commercialization of the detonators for Russian and other world markets by both US and Russian companies. Sandia`s semiconductor bridge is generating interest among the blasting, mining and perforation industries. The semiconductor bridge is approximately 100 microns long, 380 microns wide and 2 microns thick. The input energy required for semiconductor bridge ignition is one-tenth the energy required for conventional bridgewire devices. Because semiconductor bridge processing is compatible with other microcircuit processing, timing and logic circuits can be incorporated onto the chip with the bridge. These circuits can provide for the precise timing demanded for cast effecting blasting. Indeed tests by Martin Marietta and computer studies by Sandia have shown that such precise timing provides for more uniform rock fragmentation, less fly rock, reduce4d ground shock, fewer ground contaminants and less dust. Cost studies have revealed that the use of precisely timed semiconductor bridges can provide a savings of $200,000 per site per year. In addition to Russia`s vast mineral resources, the Russian Mining Institute outside Moscow has had significant programs in rock fragmentation for many years. He anticipated that collaborative studies by the Institute and Sandia`s modellers would be a valuable resource for field studies.

Bickes, R.W. Jr.

1994-05-01T23:59:59.000Z

308

DECENTRALIZING SEMICONDUCTOR CAPACITY PLANNING VIA INTERNAL MARKET COORDINATION  

E-Print Network [OSTI]

1 DECENTRALIZING SEMICONDUCTOR CAPACITY PLANNING VIA INTERNAL MARKET COORDINATION SULEYMAN KARABUK semiconductor manufacturer: marketing managers reserve capacity from manufacturing based on product demands, while attempting to maximize profit; manufacturing managers allocate capacity to competing marketing

Wu, David

309

APPLIED PHYSICS REVIEWS Semi-insulating semiconductor heterostructures: Optoelectronic  

E-Print Network [OSTI]

APPLIED PHYSICS REVIEWS Semi-insulating semiconductor heterostructures: Optoelectronic properties of optoelectronic properties of and uses for semi-insulating semiconductor heterostructures and thin films. The principal optical and optoelectronic properties of semi-insulating epilayers and heterostructures

Nolte, David D.

310

A New Cleanroom for a Next-Generation Semiconductor Research...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

A New Cleanroom for a Next-Generation Semiconductor Research Tool A New Cleanroom for a Next-Generation Semiconductor Research Tool Print The new Sector 12 cleanroom under...

311

Electroluminescence in ion gel gated organic polymer semiconductor transistors  

E-Print Network [OSTI]

This thesis reports the light emission in ion gel gated, thin film organic semiconductor transistors and investigates the light emission mechanism behind these devices. We report that ion gel gated organic polymer semiconductor transistors emit...

Bhat, Shrivalli

2011-07-12T23:59:59.000Z

312

Acoustoelectric Harmonic Generation in a Photoconductive Piezoelectric Semiconductor  

E-Print Network [OSTI]

Acoustoelectric Harmonic Generation in a Photoconductive Piezoelectric Semiconductor W. Arthur, R harmonics in the low frequency regime (. Piezoelectric semiconductors can exhibit harmonic generation because of interactions between the acoustic

313

Dry etching method for compound semiconductors  

DOE Patents [OSTI]

A dry etching method. According to the present invention, a gaseous plasma comprising, at least in part, boron trichloride, methane, and hydrogen may be used for dry etching of a compound semiconductor material containing layers including aluminum, or indium, or both. Material layers of a compound semiconductor alloy such as AlGaInP or the like may be anisotropically etched for forming electronic devices including field-effect transistors and heterojunction bipolar transistors and for forming photonic devices including vertical-cavity surface-emitting lasers, edge-emitting lasers, and reflectance modulators.

Shul, Randy J. (Albuquerque, NM); Constantine, Christopher (Safety Harbor, FL)

1997-01-01T23:59:59.000Z

314

Semiconductor nanowires DOI: 10.1002/smll.200500094  

E-Print Network [OSTI]

of a semiconductor Si nanowire, synthesized via the VLS pro- cess, into metallic nickel silicide through parameters. Anisotropic growth of a metal onto a semiconductor nanowire (or a semicon- ductor on a metal approach to prepare metal/semiconductor nano- wire heterostructures by transforming specific sections

Rogers, John A.

315

Porous Diblock Copolymer Thin Films in High-Performance Semiconductor Microelectronics  

SciTech Connect (OSTI)

The engine fueling more than 40 years of performance improvements in semiconductor integrated circuits (ICs) has been industry's ability to pattern circuit elements at ever-higher resolution and with ever-greater precision. Steady advances in photolithography - the process wherein ultraviolet light chemically changes a photosensitive polymer resist material in order to create a latent image - have resulted in scaling of minimum printed feature sizes from tens of microns during the 1980s to sub-50 nanometer transistor gate lengths in today's state-of-the-art ICs. The history of semiconductor technology scaling as well as future technology requirements is documented in the International Technology Roadmap for Semiconductors (ITRS). The progression of the semiconductor industry to the realm of nanometer-scale sizes has brought enormous challenges to device and circuit fabrication, rendering performance improvements by conventional scaling alone increasingly difficult. Most often this discussion is couched in terms of field effect transistor (FET) feature sizes such as the gate length or gate oxide thickness, however these challenges extend to many other aspects of the IC, including interconnect dimensions and pitch, device packing density, power consumption, and heat dissipation. The ITRS Technology Roadmap forecasts a difficult set of scientific and engineering challenges with no presently-known solutions. The primary focus of this chapter is the research performed at IBM on diblock copolymer films composed of polystyrene (PS) and poly(methyl-methacrylate) (PMMA) (PS-b-PMMA) with total molecular weights M{sub n} in the range of {approx}60K (g/mol) and polydispersities (PD) of {approx}1.1. These materials self assemble to form patterns having feature sizes in the range of 15-20nm. PS-b-PMMA was selected as a self-assembling patterning material due to its compatibility with the semiconductor microelectronics manufacturing infrastructure, as well as the significant body of existing research on understanding its material properties.

Black, C.T.

2011-02-01T23:59:59.000Z

316

Control of ionization processes in high band gap materials via tailored  

E-Print Network [OSTI]

on Ultrafast Electron Dynamics in Femtosecond Optical Breakdown of Dielectrics," Phys. Rev. Lett. 83, 5182­5182

Kassel, Universität

317

Strain-tunable Photonic Band Gap Microcavity Waveguides in Silicon at 1.55 m  

E-Print Network [OSTI]

+ , Sang-Gook Kim+ * Columbia University, New York, NY 10027 + Massachusetts Institute of Technology for reconfiguration of the optical characteristics based on user-demand, but also for compensation against external the Optical Response of Photonic Bandgap Structures, edited by Philippe M. Fauchet, Paul V. Braun, Proceedings

318

Tunable band gap in graphene with a noncentrosymmetric superlattice potential Rakesh P. Tiwari and D. Stroud  

E-Print Network [OSTI]

and a hexagonal Brillouin zone BZ . The Fermi-energy EF of homogeneous, neutral graphene lies at the so A number of workers have investigated the possibility of building graphene electronic circuits without of the low-energy charge carriers is anisotropically renormalized,11 while a corrugated graphene sheet

Stroud, David

319

E-Print Network 3.0 - accurate band gaps Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Technological University Collection: Physics 7 Improving the efficiency of bulk heterojunction solar cells Summary: the amount of photons absorbed by the film by decreasing the...

320

Partial frequency band gap in one-dimensional magnonic crystals M. Kostylev,1,a  

E-Print Network [OSTI]

approach. It is shown that, due to the one-dimensional artificial periodicity of the medium, the gaps with the artificial spatial periodicity of the structure. In this work, by measuring the frequencies of collective on a silicon substrate using deep ultraviolet lithography with 248 nm exposure wavelength followed by a lift

Adeyeye, Adekunle

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


321

Novel wide band gap materials for highly efficient thin film tandem solar cells  

SciTech Connect (OSTI)

Tandem solar cells (TSCs), which use two or more materials to absorb sunlight, have achieved power conversion efficiencies of >25% versus 11-20% for commercialized single junction solar cell modules. The key to widespread commercialization of TSCs is to develop the wide-band, top solar cell that is both cheap to fabricate and has a high open-circuit voltage (i.e. >1V). Previous work in TSCs has generally focused on using expensive processing techniques with slow growth rates resulting in costs that are two orders of magnitude too expensive to be used in conventional solar cell modules. The objective of the PLANT PV proposal was to investigate the feasibility of using Ag(In,Ga)Se2 (AIGS) as the wide-bandgap absorber in the top cell of a thin film tandem solar cell (TSC). Despite being studied by very few in the solar community, AIGS solar cells have achieved one of the highest open-circuit voltages within the chalcogenide material family with a Voc of 949mV when grown with an expensive processing technique (i.e. Molecular Beam Epitaxy). PLANT PV�s goal in Phase I of the DOE SBIR was to 1) develop the chemistry to grow AIGS thin films via solution processing techniques to reduce costs and 2) fabricate new device architectures with high open-circuit voltage to produce full tandem solar cells in Phase II. PLANT PV attempted to translate solution processing chemistries that were successful in producing >12% efficient Cu(In,Ga)Se2 solar cells by replacing copper compounds with silver. The main thrust of the research was to determine if it was possible to make high quality AIGS thin films using solution processing and to fully characterize the materials properties. PLANT PV developed several different types of silver compounds in an attempt to fabricate high quality thin films from solution. We found that silver compounds that were similar to the copper based system did not result in high quality thin films. PLANT PV was able to deposit AIGS thin films using a mixture of solution and physical vapor deposition processing, but these films lacked the p-type doping levels that are required to make decent solar cells. Over the course of the project PLANT PV was able to fabricate efficient CIGS solar cells (8.7%) but could not achieve equivalent performance using AIGS. During the nine-month grant PLANT PV set up a variety of thin film characterization tools (e.g. drive-level capacitance profiling) at the Molecular Foundry, a Department of Energy User Facility, that are now available to both industrial and academic researchers via the grant process. PLANT PV was also able to develop the back end processing of thin film solar cells at Lawrence Berkeley National Labs to achieve 8.7% efficient CIGS solar cells. This processing development will be applied to other types of thin film PV cells at the Lawrence Berkeley National Labs. While PLANT PV was able to study AIGS film growth and optoelectronic properties we concluded that AIGS produced using these methods would have a limited efficiency and would not be commercially feasible. PLANT PV did not apply for the Phase II of this grant.

Brian E. Hardin, Stephen T. Connor, Craig H. Peters

2012-06-11T23:59:59.000Z

322

Bispyridinium-phenylene-based copolymers: low band gap n-type alternating copolymers  

E-Print Network [OSTI]

Bispyridinium-phenylene-based conjugated donor–acceptor copolymers were synthesized by a Stille cross-coupling and cyclization sequence. These polyelectrolytes are freely soluble in organic solvents and display broad optical ...

Swager, Timothy Manning

323

Final Report: Laser-Material Interactions Relevant to Analytic Spectroscopy of Wide Band Gap Materials  

SciTech Connect (OSTI)

We summarize our studies aimed at developing an understanding of the underlying physics and chemistry in terms of laser materials interactions relevant to laser-based sampling and chemical analysis of wide bandgap materials. This work focused on the determination of mechanisms for the emission of electrons, ions, atoms, and molecules from laser irradiation of surfaces. We determined the important role of defects on these emissions, the thermal, chemical, and physical interactions responsible for matrix effects and mass-dependent transport/detection. This work supported development of new techniques and technology for the determination of trace elements contained such as nuclear waste materials.

Dickinson, J. T. [Washington State University] [Washington State University

2014-04-05T23:59:59.000Z

324

Detection of DNA Hybridization Using the Near-Infrared Band-Gap  

E-Print Network [OSTI]

shift of 2 meV, with a detection sensitivity of 6 nM. The energy shift is modeled by correlating in the solution- based systems, is advantageous due to the sensitivity and selectivity of the technique.14 absorption of blood and tissue17-19 and the low auto- fluorescence of cells20 in the nIR. Furthermore, SWNTs

Allen, Jont

325

Photonic band gap of a graphene-embedded quarter-wave stack  

SciTech Connect (OSTI)

Here, we present a mechanism for tailoring the photonic band structure of a quarter-wave stack without changing its physical periods by embedding conductive sheets. Graphene is utilized and studied as a realistic, two-dimensional conductive sheet. In a graphene-embedded quarter-wave stack, the synergic actions of Bragg scattering and graphene conductance contributions open photonic gaps at the center of the reduced Brillouin zone that are nonexistent in conventional quarter-wave stacks. Such photonic gaps show giant, loss-independent density of optical states at the fixed lower-gap edges, of even-multiple characteristic frequency of the quarter-wave stack. The conductive sheet-induced photonic gaps provide a platform for the enhancement of light-matter interactions.

Fan, Yuancheng [Ames Laboratory; Wei, Zeyong [Tongji University; Li, Hongqiang [Tongji University; Chen, Hong [Tongji University; Soukoulis, Costas M [Ames Laboratory

2013-12-10T23:59:59.000Z

326

Engineering the electromagnetic vacuum for controlling light with light in a photonic-band-gap microchip  

E-Print Network [OSTI]

laser beams ( 1 W steady-state holding power and 5 nW switching power) through mutual coherent resonant broadened collection of "atoms" situated adjacent to the waveguide channel. The "inverted" atomic system can the PBG, light cannot propagate, leading to some fundamentally new opti- cal phenomena

John, Sajeev

327

Alternative Wide-Band-Gap Materials for Gamma-Ray Spectroscopy  

E-Print Network [OSTI]

Engineering and Radiological Sciences) in The University of Michigan 2013 Doctoral Committee: Professor Zhong emotionally, physically, spiritually, and intellectually through every moment of my graduate school career, the Orion group would not be successful without the great work of his graduate students. It has been a truly

He, Zhong

328

Second harmonic generation from direct band gap quantum dots pumped by femtosecond laser pulses  

SciTech Connect (OSTI)

We report on nonlinear optical experiments performed on Cu{sub 2}S quantum dots (QDs) pumped by femtosecond laser pulses. We conduct a theoretical simulation and experiments to determine their second harmonic generation characteristics. Furthermore, we demonstrate that the QDs have a second harmonic generation conversion efficiency of up to 76%. Our studies suggest that these Cu{sub 2}S QDs can be used for solar cells, bioimaging, biosensing, and electric detection.

Liu, Liwei, E-mail: liulw@cust.edu.cn; Wang, Yue; Hu, Siyi; Ren, Yu; Huang, Chen [School of Science, Changchun University of Science and Technology, Changchun, Jilin 130022, People's Republic of China and International Joint Research Center for Nanophotonics and Biophotonics, Changchun University of Science and Technology, Changchun, Jilin 130022 (China)

2014-02-21T23:59:59.000Z

329

Tuning laser-induced band gaps in graphene Hernn L. Calvo,1,2  

E-Print Network [OSTI]

Statistischen Physik, RWTH Aachen University, D-52056 Aachen, Germany 3 CIN2 (ICN­CSIC), Catalan Institute-infrared laser technology in a transport setup, thereby opening prom- ising prospects for graphene to the Dirac points K and K . Since we consider a clean sample and given that the ac field does not introduce

330

Broadband optical coupling between microstructured fibers and photonic band gap circuits: Two-dimensional paradigms  

E-Print Network [OSTI]

simple two-dimensional design models. We demonstrate an effective large- bandwidth small-footprint beam platform for integrated optics. Unlike conventional paradigms such as silicon on insulator SOI waveguides that guide light on a chip by total internal reflection index guiding , PBG-based microcircuits can guide

John, Sajeev

331

Tunable micro-cavities in photonic band-gap yarns and optical fibers  

E-Print Network [OSTI]

The vision behind this work is the fabrication of high performance innovative fiber-based optical components over kilometer length-scales. The optical properties of these fibers derive from their multilayer dielectric ...

Benoit, Gilles, Ph. D. Massachusetts Institute of Technology

2006-01-01T23:59:59.000Z

332

Excitation, Ionization, and Desorption: How Sub-band gap Photons Modify the  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: Vegetation ProposedUsing ZirconiaPolicy and Assistance100 tonusingdeposition. | EMSLStructure of

333

Band-Gap Engineering of Carbon Nanotubes with Grain Boundaries. | EMSL  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May JunDatastreamsmmcrcalgovInstrumentsruc DocumentationP-Series to someone6 M. Babzien, I. Ben-Zvi, P. Study ofJ U LYOffsets at

334

Band-Gap Reduction and Dopant Interaction in Epitaxial La,Cr Co-doped  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May JunDatastreamsmmcrcalgovInstrumentsruc DocumentationP-Series to someone6 M. Babzien, I. Ben-Zvi, P. Study ofJ U LYOffsets atSrTiO3 Thin

335

Optimal Preventive Maintenance Scheduling in Semiconductor Manufacturing  

E-Print Network [OSTI]

1 Optimal Preventive Maintenance Scheduling in Semiconductor Manufacturing Xiaodong Yao, Emmanuel on Control Applications in 2001. #12;2 Abstract Preventive Maintenance (PM) scheduling is a very challenging schedule with that of a baseline reference schedule are also presented. Index Terms preventive maintenance

Marcus, Steven I.

336

Semiconductor detectors with proximity signal readout  

SciTech Connect (OSTI)

Semiconductor-based radiation detectors are routinely used for the detection, imaging, and spectroscopy of x-rays, gamma rays, and charged particles for applications in the areas of nuclear and medical physics, astrophysics, environmental remediation, nuclear nonproliferation, and homeland security. Detectors used for imaging and particle tracking are more complex in that they typically must also measure the location of the radiation interaction in addition to the deposited energy. In such detectors, the position measurement is often achieved by dividing or segmenting the electrodes into many strips or pixels and then reading out the signals from all of the electrode segments. Fine electrode segmentation is problematic for many of the standard semiconductor detector technologies. Clearly there is a need for a semiconductor-based radiation detector technology that can achieve fine position resolution while maintaining the excellent energy resolution intrinsic to semiconductor detectors, can be fabricated through simple processes, does not require complex electrical interconnections to the detector, and can reduce the number of required channels of readout electronics. Proximity electrode signal readout (PESR), in which the electrodes are not in physical contact with the detector surface, satisfies this need.

Asztalos, Stephen J. [XIA, LLC, Hayward, CA (United States)

2014-01-30T23:59:59.000Z

337

Organic conductive films for semiconductor electrodes  

DOE Patents [OSTI]

According to the present invention, improved electrodes overcoated with conductive polymer films and preselected catalysts are provided. The electrodes typically comprise an inorganic semiconductor over-coated with a charge conductive polymer film comprising a charge conductive polymer in or on which is a catalyst or charge-relaying agent.

Frank, A.J.

1984-01-01T23:59:59.000Z

338

Optical temperature sensor using thermochromic semiconductors  

DOE Patents [OSTI]

Optical thermometry is a growing technological field which exploits the ability of certain materials to change their optical properties with temperature. A subclass of such materials are those which change their color as a reversible and reproducible function of temperature. These materials are thermochromic. This invention is a composition to measure temperature utilizing thermochromic semiconductors.

Kronberg, J.W.

1994-01-01T23:59:59.000Z

339

Solid State Lighting Semiconductor Spectroscopy & Devices  

E-Print Network [OSTI]

and fluorescent lamps, are very inefficient in transforming energy into light. Due to upcoming problems in energy % of Earth's total power consumption is used for lighting! Figure 3: Earth at night from space. Evolution inside a semiconductor for light emission. Over 150 years ago... How to achieve white LEDs? Figure 5

Strathclyde, University of

340

Mathematical Tools in Optimal Semiconductor Design  

E-Print Network [OSTI]

year to year. The original aim was to produce more devices per unit area, e.g. the Semiconductor discuss the construction of descent algorithms employing the ad- joint state and investigate the electronic behavior of the device appropriately. This reveals several challenging problems for electrical

Hinze, Michael

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


341

HYDROGEN LOCAL VIBRATIONAL MODES IN COMPOUND SEMICONDUCTORS  

E-Print Network [OSTI]

HYDROGEN LOCAL VIBRATIONAL MODES IN COMPOUND SEMICONDUCTORS M.D. MCCLUSKEY* University) spectroscopy of hydrogen and deuterium in GaP, AlSb, ZnSe, and GaN has provided important information about the structures of dopant- hydrogen complexes and their interaction with the host lattice. In GaN:Mg, for example

McCluskey, Matthew

342

High resolution scintillation detector with semiconductor readout  

DOE Patents [OSTI]

A novel high resolution scintillation detector array for use in radiation imaging such as high resolution Positron Emission Tomography (PET) which comprises one or more parallelepiped crystals with at least one long surface of each crystal being in intimate contact with a semiconductor photodetector such that photons generated within each crystal by gamma radiation passing therethrough is detected by the photodetector paired therewith.

Levin, Craig S. (Santa Monica, CA); Hoffman, Edward J. (Los Angeles, CA)

2000-01-01T23:59:59.000Z

343

Bi-Se doped with Cu, p-type semiconductor  

DOE Patents [OSTI]

A Bi--Se doped with Cu, p-type semiconductor, preferably used as an absorber material in a photovoltaic device. Preferably the semiconductor has at least 20 molar percent Cu. In a preferred embodiment, the semiconductor comprises at least 28 molar percent of Cu. In one embodiment, the semiconductor comprises a molar percentage of Cu and Bi whereby the molar percentage of Cu divided by the molar percentage of Bi is greater than 1.2. In a preferred embodiment, the semiconductor is manufactured as a thin film having a thickness less than 600 nm.

Bhattacharya, Raghu Nath; Phok, Sovannary; Parilla, Philip Anthony

2013-08-20T23:59:59.000Z

344

Native point defects in yttria and relevance to its use as a high-dielectric-constant gate oxide material: First-principles study  

E-Print Network [OSTI]

and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139 states are considered. We find that within the band gap of Y2O3 oxygen vacancies, oxygen interstitials chemical potentials. When the Fermi level is constrained to be within the band gap of silicon, oxygen

Ceder, Gerbrand

345

EMSL - oxides  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

oxides en Influence of Adsorption Site and Wavelength on the Photodesorption of NO from the (Fe,Cr)3O4(111) Mixed Oxide Surface. http:www.emsl.pnl.govemslwebpublications...

346

Life-cycle Assessment of Semiconductors  

E-Print Network [OSTI]

production, and impact factors for each type of CMP slurry, or the exact composition for generic copper, oxide and tungsten

Boyd, Sarah B.

2009-01-01T23:59:59.000Z

347

Semiconductor P-I-N detector  

DOE Patents [OSTI]

A semiconductor P-I-N detector including an intrinsic wafer, a P-doped layer, an N-doped layer, and a boundary layer for reducing the diffusion of dopants into the intrinsic wafer. The boundary layer is positioned between one of the doped regions and the intrinsic wafer. The intrinsic wafer can be composed of CdZnTe or CdTe, the P-doped layer can be composed of ZnTe doped with copper, and the N-doped layer can be composed of CdS doped with indium. The boundary layers is formed of an undoped semiconductor material. The boundary layer can be deposited onto the underlying intrinsic wafer. The doped regions are then typically formed by a deposition process or by doping a section of the deposited boundary layer.

Sudharsanan, Rengarajan (53 Timber Line Dr., Nashua, NH 03062); Karam, Nasser H. (577 Lowell St., Lexington, MA 02173)

2001-01-01T23:59:59.000Z

348

Optical cavity furnace for semiconductor wafer processing  

DOE Patents [OSTI]

An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.

Sopori, Bhushan L.

2014-08-05T23:59:59.000Z

349

Proximity charge sensing for semiconductor detectors  

DOE Patents [OSTI]

A non-contact charge sensor includes a semiconductor detector having a first surface and an opposing second surface. The detector includes a high resistivity electrode layer on the first surface and a low resistivity electrode on the high resistivity electrode layer. A portion of the low resistivity first surface electrode is deleted to expose the high resistivity electrode layer in a portion of the area. A low resistivity electrode layer is disposed on the second surface of the semiconductor detector. A voltage applied between the first surface low resistivity electrode and the second surface low resistivity electrode causes a free charge to drift toward the first or second surface according to a polarity of the free charge and the voltage. A charge sensitive preamplifier coupled to a non-contact electrode disposed at a distance from the exposed high resistivity electrode layer outputs a signal in response to movement of free charge within the detector.

Luke, Paul N; Tindall, Craig S; Amman, Mark

2013-10-08T23:59:59.000Z

350

Method of transferring strained semiconductor structure  

DOE Patents [OSTI]

The transfer of strained semiconductor layers from one substrate to another substrate involves depositing a multilayer structure on a substrate having surface contaminants. An interface that includes the contaminants is formed in between the deposited layer and the substrate. Hydrogen atoms are introduced into the structure and allowed to diffuse to the interface. Afterward, the deposited multilayer structure is bonded to a second substrate and is separated away at the interface, which results in transferring a multilayer structure from one substrate to the other substrate. The multilayer structure includes at least one strained semiconductor layer and at least one strain-induced seed layer. The strain-induced seed layer can be optionally etched away after the layer transfer.

Nastasi, Michael A. (Santa Fe, NM); Shao, Lin (College Station, TX)

2009-12-29T23:59:59.000Z

351

GaTe semiconductor for radiation detection  

DOE Patents [OSTI]

GaTe semiconductor is used as a room-temperature radiation detector. GaTe has useful properties for radiation detectors: ideal bandgap, favorable mobilities, low melting point (no evaporation), non-hygroscopic nature, and availability of high-purity starting materials. The detector can be used, e.g., for detection of illicit nuclear weapons and radiological dispersed devices at ports of entry, in cities, and off shore and for determination of medical isotopes present in a patient.

Payne, Stephen A. (Castro Valley, CA); Burger, Arnold (Nashville, TN); Mandal, Krishna C. (Ashland, MA)

2009-06-23T23:59:59.000Z

352

A Markovian analysis of semiconductor manufacturing processes  

E-Print Network [OSTI]

) Karan L. Watson (Member) Martin A. Wortman (Member) ep Sastri (Member) o W. Howze (Head of Department) December 1991 ABSTRACT A Markovian Analysis of Semiconductor Manufacturing Processes. (December 1991) Kent Eugene Schultz, B. S. , Iowa... grateful to Dr. Martin Wortman, for his pa- tience and endless stream of examples to help me understand stochastic processes. I would also like to thank Dr. Tep Sastri for his patience and for always having a refer- ence available when I needed it...

Schultz, Kent Eugene

2012-06-07T23:59:59.000Z

353

Multiple percolation tunneling staircase in metal-semiconductor nanoparticle composites  

SciTech Connect (OSTI)

Multiple percolation transitions are observed in a binary system of RuO{sub 2}-CaCu{sub 3}Ti{sub 4}O{sub 12} metal-semiconductor nanoparticle composites near percolation thresholds. Apart from a classical percolation transition, associated with the appearance of a continuous conductance path through RuO{sub 2} metal oxide nanoparticles, at least two additional tunneling percolation transitions are detected in this composite system. Such behavior is consistent with the recently emerged picture of a quantum conductivity staircase, which predicts several percolation tunneling thresholds in a system with a hierarchy of local tunneling conductance, due to various degrees of proximity of adjacent conducting particles distributed in an insulating matrix. Here, we investigate a different type of percolation tunneling staircase, associated with a more complex conductive and insulating particle microstructure of two types of non-spherical constituents. As tunneling is strongly temperature dependent, we use variable temperature measurements to emphasize the hierarchical nature of consecutive tunneling transitions. The critical exponents corresponding to specific tunneling percolation thresholds are found to be nonuniversal and temperature dependent.

Mukherjee, Rupam; Huang, Zhi-Feng; Nadgorny, Boris [Department of Physics and Astronomy, Wayne State University, Detroit, Michigan 48201 (United States)

2014-10-27T23:59:59.000Z

354

Photovoltaic healing of non-uniformities in semiconductor devices  

DOE Patents [OSTI]

A method of making a photovoltaic device using light energy and a solution to normalize electric potential variations in the device. A semiconductor layer having nonuniformities comprising areas of aberrant electric potential deviating from the electric potential of the top surface of the semiconductor is deposited onto a substrate layer. A solution containing an electrolyte, at least one bonding material, and positive and negative ions is applied over the top surface of the semiconductor. Light energy is applied to generate photovoltage in the semiconductor, causing a redistribution of the ions and the bonding material to the areas of aberrant electric potential. The bonding material selectively bonds to the nonuniformities in a manner such that the electric potential of the nonuniformities is normalized relative to the electric potential of the top surface of the semiconductor layer. A conductive electrode layer is then deposited over the top surface of the semiconductor layer.

Karpov, Victor G.; Roussillon, Yann; Shvydka, Diana; Compaan, Alvin D.; Giolando, Dean M.

2006-08-29T23:59:59.000Z

355

Graded core/shell semiconductor nanorods and nanorod barcodes  

DOE Patents [OSTI]

Graded core/shell semiconductor nanorods and shapped nanorods are disclosed comprising Group II-VI, Group III-V and Group IV semiconductors and methods of making the same. Also disclosed are nanorod barcodes using core/shell nanorods where the core is a semiconductor or metal material, and with or without a shell. Methods of labeling analytes using the nanorod barcodes are also disclosed.

Alivisatos, A. Paul; Scher, Erik C.; Manna, Liberato

2013-03-26T23:59:59.000Z

356

Methods and devices for fabricating and assembling printable semiconductor elements  

DOE Patents [OSTI]

The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

Nuzzo, Ralph G. (Champaign, IL); Rogers, John A. (Champaign, IL); Menard, Etienne (Urbana, IL); Lee, Keon Jae (Savoy, IL); Khang, Dahl-Young (Urbana, IL); Sun, Yugang (Champaign, IL); Meitl, Matthew (Champaign, IL); Zhu, Zhengtao (Urbana, IL)

2009-11-24T23:59:59.000Z

357

Methods and devices for fabricating and assembling printable semiconductor elements  

DOE Patents [OSTI]

The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

Nuzzo, Ralph G; Rogers, John A; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao

2013-05-14T23:59:59.000Z

358

Methods and devices for fabricating and assembling printable semiconductor elements  

DOE Patents [OSTI]

The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

Nuzzo, Ralph G; Rogers, John A; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao

2014-03-04T23:59:59.000Z

359

Methods and devices for fabricating and assembling printable semiconductor elements  

DOE Patents [OSTI]

The invention provides methods and devices for fabricating printable semiconductor elements and assembling printable semiconductor elements onto substrate surfaces. Methods, devices and device components of the present invention are capable of generating a wide range of flexible electronic and optoelectronic devices and arrays of devices on substrates comprising polymeric materials. The present invention also provides stretchable semiconductor structures and stretchable electronic devices capable of good performance in stretched configurations.

Nuzzo, Ralph G. (Champaign, IL); Rogers, John A. (Champaign, IL); Menard, Etienne (Durham, NC); Lee, Keon Jae (Daejeon, KR); Khang, Dahl-Young (Urbana, IL); Sun, Yugang (Champaign, IL); Meitl, Matthew (Raleigh, NC); Zhu, Zhengtao (Urbana, IL)

2011-07-19T23:59:59.000Z

360

Deposition method for producing silicon carbide high-temperature semiconductors  

DOE Patents [OSTI]

An improved deposition method for producing silicon carbide high-temperature semiconductor material comprising placing a semiconductor substrate composed of silicon carbide in a fluidized bed silicon carbide deposition reactor, fluidizing the bed particles by hydrogen gas in a mildly bubbling mode through a gas distributor and heating the substrate at temperatures around 1200.degree.-1500.degree. C. thereby depositing a layer of silicon carbide on the semiconductor substrate.

Hsu, George C. (La Crescenta, CA); Rohatgi, Naresh K. (W. Corine, CA)

1987-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


361

Method and system for powering and cooling semiconductor lasers  

DOE Patents [OSTI]

A semiconductor laser system includes a diode laser tile. The diode laser tile includes a mounting fixture having a first side and a second side opposing the first side and an array of semiconductor laser pumps coupled to the first side of the mounting fixture. The semiconductor laser system also includes an electrical pulse generator thermally coupled to the diode bar and a cooling member thermally coupled to the diode bar and the electrical pulse generator.

Telford, Steven J; Ladran, Anthony S

2014-02-25T23:59:59.000Z

362

Graded core/shell semiconductor nanorods and nanorod barcodes  

DOE Patents [OSTI]

Graded core/shell semiconductor nanorods and shaped nanorods are disclosed comprising Group II-VI, Group III-V and Group IV semiconductors and methods of making the same. Also disclosed are nanorod barcodes using core/shell nanorods where the core is a semiconductor or metal material, and with or without a shell. Methods of labeling analytes using the nanorod barcodes are also disclosed.

Alivisatos, A. Paul (Oakland, CA); Scher, Erik C. (San Francisco, CA); Manna, Liberato (Lecce, IT)

2010-12-14T23:59:59.000Z

363

Method of transferring a thin crystalline semiconductor layer  

DOE Patents [OSTI]

A method for transferring a thin semiconductor layer from one substrate to another substrate involves depositing a thin epitaxial monocrystalline semiconductor layer on a substrate having surface contaminants. An interface that includes the contaminants is formed in between the deposited layer and the substrate. Hydrogen atoms are introduced into the structure and allowed to diffuse to the interface. Afterward, the thin semiconductor layer is bonded to a second substrate and the thin layer is separated away at the interface, which results in transferring the thin epitaxial semiconductor layer from one substrate to the other substrate.

Nastasi, Michael A. (Sante Fe, NM); Shao, Lin (Los Alamos, NM); Theodore, N. David (Mesa, AZ)

2006-12-26T23:59:59.000Z

364

Electronic Structure and Magnetism in Diluted Magnetic Semiconductors  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Electronic Structure and Magnetism in Diluted Magnetic Semiconductors Print The possibility of using electrons' spins in addition to their charge in information technology has...

365

Statistical Methods for Enhanced Metrology in Semiconductor/Photovoltaic Manufacturing  

E-Print Network [OSTI]

process control charts (SPC) for product quality and processstatistical process control (SPC) charts. The concept is toMethods Univariate SPC for semiconductor manufacturing

Zeng, Dekong

2012-01-01T23:59:59.000Z

366

Multiplex Chaos Synchronization in Semiconductor Lasers with Multiple Optoelectronic Feedbacks  

E-Print Network [OSTI]

Secure chaos based multiplex communication system scheme is proposed utilizing globally coupled semiconductor lasers with multiple variable time delay optoelectronic feedbacks.

E. M. Shahverdiev; K. A. Shore

2011-11-06T23:59:59.000Z

367

Beam excited acoustic instability in semiconductor quantum plasmas  

SciTech Connect (OSTI)

The instability of hole-Acoustic waves due to electron beam in semiconductor quantum plasmas is examined using the quantum hydrodynamic model. The quantum effects are considered including Bohm potential, Fermi degenerate pressure, and exchange potential of the semiconductor quantum plasma species. Our model is applied to nano-sized GaAs semiconductor plasmas. The variation of the growth rate of the unstable mode is obtained over a wide range of system parameters. It is found that the thermal effects of semiconductor species have significance over the hole-Acoustic waves.

Rasheed, A.; Siddique, M.; Huda, F. [Department of Physics, Government College University, Faisalabad 38000 (Pakistan); Jamil, M. [Department of Physics, COMSATS Institute of Information Technology, Lahore 54000 (Pakistan); Jung, Y.-D. [Department of Applied Physics and Department of Bionanotechnology, Hanyang University, Ansan, Kyunggi-Do 426-791 (Korea, Republic of)

2014-06-15T23:59:59.000Z

368

Method for depositing high-quality microcrystalline semiconductor materials  

DOE Patents [OSTI]

A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

Guha, Subhendu (Bloomfield Hills, MI); Yang, Chi C. (Troy, MI); Yan, Baojie (Rochester Hills, MI)

2011-03-08T23:59:59.000Z

369

Exchange interaction studies in magnetic semiconductors by neutron scattering.  

E-Print Network [OSTI]

??Theories predict that making a dilute magnetic semiconductor strongly p -type would allow it to remain ferromagnetic at room temperature. This is of intrest as… (more)

Wiren, Zachary Quincy

2008-01-01T23:59:59.000Z

370

Growth of SiC thin films on graphite for oxidation-protective coating J.-H. Boo,a)  

E-Print Network [OSTI]

, it is necessary to improve its resistance to oxidation. SiC is used as a semiconductor material for high of the SiC layers compared to those grown by thermal MOCVD. The mechanical and oxidation-resistant-2101 00 18204-1 I. INTRODUCTION Graphite, with its advantages of high thermal conductiv- ity, low-thermal

Boo, Jin-Hyo

371

One-step synthesis of titanium oxide nanocrystal- rutile by hydrothermal method  

SciTech Connect (OSTI)

Pure rutile phase titanium oxides (TiO{sub 2}) nanocrystals were synthesized via hydrothermal method with titanium tetrachloride (TiCl{sub 4}) and water (H{sub 2}O) treated in an autoclave. The particle size and phase assemblages were characterized using Scanning electron microscopy (SEM) and X-ray diffraction (XRD) respectively. Band gap energy (E{sub g}) of the nanocrystals was estimated from the Ultra violet – visible light (UV-vis) absorption spectra. It was demonstrated that TiO{sub 2} nanocrystals can be prepared through increasing of temperature and period of treatment. It is believed that the presence of acid chloride (HCl) as by-product during the hydrolysis played an important role in controlling the growth of morphology and crystal structures. The E{sub g} of the samples were estimated from the plot of modified Kubelka-Munk function were in the range of 3.04 – 3.26eV for the samples synthesized at temperature ranging from 50 to 200°C for 16 hours.

Yan, Evyan Yang Chia [School of Applied Physics, Faculty of Science and Technology, University Kebangsaan Malaysia, 43600 Bangi, Selangor, Malaysia and Department of Applied Science, Faculty of Science, Engineering and Technology, Nilai University, Persiaran Universiti, P (Malaysia); Zakaria, Sarani; Chia, Chin Hua [School of Applied Physics, Faculty of Science and Technology, University Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia)

2014-09-03T23:59:59.000Z

372

Chemical Bonding, Interfaces and Defects in Hafnium Oxide/Germanium Oxynitride Gate Stacks on Ge (100)  

SciTech Connect (OSTI)

Correlations among interface properties and chemical bonding characteristics in HfO{sub 2}/GeO{sub x}N{sub y}/Ge MIS stacks were investigated using in-situ remote nitridation of the Ge (100) surface prior to HfO{sub 2} atomic layer deposition (ALD). Ultra thin ({approx}1.1 nm), thermally stable and aqueous etch-resistant GeO{sub x}N{sub y} interfaces layers that exhibited Ge core level photoelectron spectra (PES) similar to stoichiometric Ge{sub 3}N{sub 4} were synthesized. To evaluate GeO{sub x}N{sub y}/Ge interface defects, the density of interface states (D{sub it}) was extracted by the conductance method across the band gap. Forming gas annealed (FGA) samples exhibited substantially lower D{sub it} ({approx} 1 x 10{sup 12} cm{sup -2} eV{sup -1}) than did high vacuum annealed (HVA) and inert gas anneal (IGA) samples ({approx} 1x 10{sup 13} cm{sup -2} eV{sup -1}). Germanium core level photoelectron spectra from similar FGA-treated samples detected out-diffusion of germanium oxide to the HfO{sub 2} film surface and apparent modification of chemical bonding at the GeO{sub x}N{sub y}/Ge interface, which is related to the reduced D{sub it}.

Oshima, Yasuhiro; /Stanford U., Materials Sci. Dept.; Sun, Yun; /SLAC, SSRL; Kuzum, Duygu; /Stanford U.; Sugawara, Takuya; Saraswat, Krishna C.; Pianetta, Piero; /SLAC, SSRL; McIntyre, Paul C.; /Stanford U., Materials Sci. Dept.

2008-10-31T23:59:59.000Z

373

Novel synthesis of hafnium oxide nanoparticles by precipitation method and its characterization  

SciTech Connect (OSTI)

Highlights: ? HfO{sub 2} NPs were prepared by precipitation method. ? XRD and Raman analysis revealed the presence of monoclinic phase. ? The average particle size of HfO{sub 2} NPs is 20 nm. ? The method is a simple, low cost and eco-friendly approach. -- Abstract: Hafnium oxide nanoparticles (HfO{sub 2} NPs) have been successfully synthesized by means of a novel precipitation method and were characterized by using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Field emission scanning electron microscopy (FESEM), UV–visible, Fourier transform infrared (FTIR) and laser Raman spectroscopy. The XRD and Raman analysis revealed the presence of pure monoclinic HfO{sub 2} NPs. FESEM image showed that the HfO{sub 2} NPs were of spherical shape with an average particle size of about 20 nm. The optical band gap of the HfO{sub 2} NPs was found to be 6.12 eV. Advantages of this method were simple and low cost of synthesis of HfO{sub 2} NPs includes the small and narrow particle size distribution.

Ramadoss, Ananthakumar; Krishnamoorthy, Karthikeyan [Nanomaterials and System Lab, Department of Mechanical System Engineering, Jeju National University, Jeju 690-756 (Korea, Republic of)] [Nanomaterials and System Lab, Department of Mechanical System Engineering, Jeju National University, Jeju 690-756 (Korea, Republic of); Kim, Sang Jae, E-mail: kimsangj@jejunu.ac.kr [Nanomaterials and System Lab, Department of Mechanical System Engineering, Jeju National University, Jeju 690-756 (Korea, Republic of); Department of Mechatronics Engineering, Jeju National University, Jeju 690-756 (Korea, Republic of)

2012-09-15T23:59:59.000Z

374

The Technical and Economic Potential for Electricity Energy Efficiency in a Semiconductor Manufacturing Plant  

E-Print Network [OSTI]

In recent years, there has been renewed interest in energy efficiency in the semiconductor industry. The declining prices for semiconductor products has prompted semiconductor manufacturing plants to control costs so as to maintain profitability...

Lee, A. H. W.; Golden, J. W.; Zarnikau, J. W.

375

Semiconductor bridge, SCB, ignition of energetic materials  

SciTech Connect (OSTI)

Sandia National Laboratories` semiconductor bridge, SCB, is now being used for the ignition or initiation of a wide variety of exeoergic materials. Applications of this new technology arose because of a need at the system level to provide light weight, small volume and low energy explosive assemblies. Conventional bridgewire devices could not meet the stringent size, weight and energy requirements of our customers. We present an overview of SCB technology and the ignition characteristics for a number of energetic materials including primary and secondary explosives, pyrotechnics, thermites and intermetallics. We provide examples of systems designed to meet the modern requirements that sophisticated systems must satisfy in today`s market environments.

Bickes, R.W.; Grubelich, M.D.; Harris, S.M.; Merson, J.A.; Tarbell, W.W.

1997-04-01T23:59:59.000Z

376

Silicon metal-semiconductor-metal photodetector  

DOE Patents [OSTI]

Silicon MSM photodiodes sensitive to radiation in the visible to near infrared spectral range are produced by altering the absorption characteristics of crystalline Si by ion implantation. The implantation produces a defected region below the surface of the silicon with the highest concentration of defects at its base which acts to reduce the contribution of charge carriers formed below the defected layer. The charge carriers generated by the radiation in the upper regions of the defected layer are very quickly collected between biased Schottky barrier electrodes which form a metal-semiconductor-metal structure for the photodiode.

Brueck, Steven R. J. (Albuquerque, NM); Myers, David R. (Albuquerque, NM); Sharma, Ashwani K. (Albuquerque, NM)

1997-01-01T23:59:59.000Z

377

Silicon metal-semiconductor-metal photodetector  

DOE Patents [OSTI]

Silicon MSM photodiodes sensitive to radiation in the visible to near infrared spectral range are produced by altering the absorption characteristics of crystalline Si by ion implantation. The implantation produces a defected region below the surface of the silicon with the highest concentration of defects at its base which acts to reduce the contribution of charge carriers formed below the defected layer. The charge carriers generated by the radiation in the upper regions of the defected layer are very quickly collected between biased Schottky barrier electrodes which form a metal-semiconductor-metal structure for the photodiode.

Brueck, Steven R. J. (Albuquerque, NM); Myers, David R. (Albuquerque, NM); Sharma, Ashwani K. (Albuquerque, NM)

1995-01-01T23:59:59.000Z

378

Transient Rayleigh scattering from single semiconductor nanowires  

SciTech Connect (OSTI)

Transient Rayleigh scattering spectroscopy is a new pump-probe technique to study the dynamics and cooling of photo-excited carriers in single semiconductor nanowires. By studying the evolution of the transient Rayleigh spectrum in time after excitation, one can measure the time evolution of the density and temperature of photo-excited electron-hole plasma (EHP) as they equilibrate with lattice. This provides detailed information of dynamics and cooling of carriers including linear and bimolecular recombination properties, carrier transport characteristics, and the energy-loss rate of hot electron-hole plasma through the emission of LO and acoustic phonons.

Montazeri, Mohammad; Jackson, Howard E.; Smith, Leigh M. [Department of Physics, University of Cincinnati, Cincinnati, OH 45221-0011 (United States); Yarrison-Rice, Jan M. [Department of Physics, Miami University, Oxford, OH 45056 (United States); Kang, Jung-Hyun; Gao, Qiang; Tan, Hark Hoe; Jagadish, Chennupati [Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra, ACT 0200 (Australia)

2013-12-04T23:59:59.000Z

379

Low temperature atmospheric pressure chemical vapor deposition of group 14 oxide films  

SciTech Connect (OSTI)

Depositions of high quality SiO{sub 2} and SnO{sub 2} films from the reaction of homoleptic amido precursors M(NMe{sub 2})4 (M = Si,Sn) and oxygen were carried out in an atmospheric pressure chemical vapor deposition r. The films were deposited on silicon, glass and quartz substrates at temperatures of 250 to 450C. The silicon dioxide films are stoichiometric (O/Si = 2.0) with less than 0.2 atom % C and 0.3 atom % N and have hydrogen contents of 9 {plus_minus} 5 atom %. They are deposited with growth rates from 380 to 900 {angstrom}/min. The refractive indexes of the SiO{sub 2} films are 1.46, and infrared spectra show a possible Si-OH peak at 950 cm{sup {minus}1}. X-Ray diffraction studies reveal that the SiO{sub 2} film deposited at 350C is amorphous. The tin oxide films are stoichiometric (O/Sn = 2.0) and contain less than 0.8 atom % carbon, and 0.3 atom % N. No hydrogen was detected by elastic recoil spectroscopy. The band gap for the SnO{sub 2} films, as estimated from transmission spectra, is 3.9 eV. The resistivities of the tin oxide films are in the range 10{sup {minus}2} to 10{sup {minus}3} {Omega}cm and do not vary significantly with deposition temperature. The tin oxide film deposited at 350C is cassitterite with some (101) orientation.

Hoffman, D.M. [Houston Univ., TX (United States); Atagi, L.M. [Houston Univ., TX (United States)]|[Los Alamos National Lab., NM (United States); Chu, Wei-Kan; Liu, Jia-Rui; Zheng, Zongshuang [Houston Univ., TX (United States); Rubiano, R.R. [Massachusetts Inst. of Tech., Cambridge, MA (United States); Springer, R.W.; Smith, D.C. [Los Alamos National Lab., NM (United States)

1994-06-01T23:59:59.000Z

380

Magnetically and electrically tunable semiconductor quantum waveguide inverter  

E-Print Network [OSTI]

Magnetically and electrically tunable semiconductor quantum waveguide inverter M. J. Gilbert,a) R implementations. We present an electrically tunable semiconductor quantum waveguide implementation of an inverter. On the other hand, if a ``0'' is present in the control bit, then the qubit is inverted. In a recent study

Gilbert, Matthew

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


381

ECE 451 -Fall 2011 Physics of Semiconductor Devices (3)  

E-Print Network [OSTI]

ECE 451 - Fall 2011 Physics of Semiconductor Devices (3) Electronics and Optoelectronics-Photon Scattering Processes (Optional) 18. Novel Optoelectronics and Electronics Devices (Optional) Structure on Semiconductor Physics and Device Physics, Draft Version (2010). Other Additional References or Readings: 1. J

Gilchrist, James F.

382

Communication using Synchronization of Chaos in Semiconductor Lasers with optoelectronic  

E-Print Network [OSTI]

Communication using Synchronization of Chaos in Semiconductor Lasers with optoelectronic feedback S. The Chaos in the single-mode semiconductor lasers is generated by means of an optoelectronic feedback with optoelectronic feedback has been demonstrated for quite slow data rates by using chaotic wavelength fluctuations

Illing, Lucas

383

Multistability in a semiconductor laser with optoelectronic feedback  

E-Print Network [OSTI]

Multistability in a semiconductor laser with optoelectronic feedback Guang-Qiong Xia1,2 , Sze with delayed optoelectronic feedback is observed experimentally. For a given delay time, the observed dynamical-oscillating semiconductor lasers subject to delayed optoelectronic mutual coupling," Phys. Rev. E 73, 047201-1-4 (2006) 8. G

Chan, Sze-Chun

384

On a mathematical model for hot carrier injection in semiconductors  

E-Print Network [OSTI]

On a mathematical model for hot carrier injection in semiconductors Naoufel Ben Abdallah (1) Pierre of a semiconductor device heavily depends on the injection mechanism of carriers into the active regions through by the relation V bi = U th log N + N \\Gamma ; where U th = kBT=q is the thermal voltage and N + ; N \\Gamma

Schmeiser, Christian

385

hal00267005, Modeling semiconductor thermal properties. The dispersion role.  

E-Print Network [OSTI]

, or in solar panels 3 , and are even used in medicine 4 . The increasing use of semiconductor micro in transistors 6 and semiconductor nano#12;lms in solar cells. At these low scale, Fourier's law may give , similar to photon intensity used in radiative transfer 24 . Thus, the energy ux per apparent surface unit

Paris-Sud XI, Université de

386

Modular Algorithms for Transient Semiconductor Device Simulation, Part I  

E-Print Network [OSTI]

Modular Algorithms for Transient Semiconductor Device Simulation, Part I: Analysis of the Outer, is introduced at dis- crete time steps for the one-dimensional semiconductor device model. The it- eration as approximate Newton iterations. Continuation is employed as the time-stepping bridge. 1 Introduction In Part I

Jerome, Joseph W.

387

Photonic switching devices based on semiconductor nanostructures  

E-Print Network [OSTI]

Focusing and guiding light into semiconductor nanostructures can deliver revolutionary concepts for photonic devices, which offer a practical pathway towards next-generation power-efficient optical networks. In this review, we consider the prospects for photonic switches using semiconductor quantum dots (QDs) and photonic cavities which possess unique properties based on their low dimensionality. The optical nonlinearity of such photonic switches is theoretically analyzed by introducing the concept of a field enhancement factor. This approach reveals drastic improvement in both power-density and speed, which is able to overcome the limitations that have beset conventional photonic switches for decades. In addition, the overall power consumption is reduced due to the atom-like nature of QDs as well as the nano-scale footprint of photonic cavities. Based on this theoretical perspective, the current state-of-the-art of QD/cavity switches is reviewed in terms of various optical nonlinearity phenomena which have been utilized to demonstrate photonic switching. Emerging techniques, enabled by cavity nonlinear effects such as wavelength tuning, Purcell-factor tuning and plasmonic effects are also discussed.

Chao-Yuan Jin; Osamu Wada

2014-02-26T23:59:59.000Z

388

Coated semiconductor devices for neutron detection  

DOE Patents [OSTI]

A device for detecting neutrons includes a semi-insulated bulk semiconductor substrate having opposed polished surfaces. A blocking Schottky contact comprised of a series of metals such as Ti, Pt, Au, Ge, Pd, and Ni is formed on a first polished surface of the semiconductor substrate, while a low resistivity ("ohmic") contact comprised of metals such as Au, Ge, and Ni is formed on a second, opposed polished surface of the substrate. In one embodiment, n-type low resistivity pinout contacts comprised of an Au/Ge based eutectic alloy or multi-layered Pd/Ge/Ti/Au are also formed on the opposed polished surfaces and in contact with the Schottky and ohmic contacts. Disposed on the Schottky contact is a neutron reactive film, or coating, for detecting neutrons. The coating is comprised of a hydrogen rich polymer, such as a polyolefin or paraffin; lithium or lithium fluoride; or a heavy metal fissionable material. By varying the coating thickness and electrical settings, neutrons at specific energies can be detected. The coated neutron detector is capable of performing real-time neutron radiography in high gamma fields, digital fast neutron radiography, fissile material identification, and basic neutron detection particularly in high radiation fields.

Klann, Raymond T. (Bolingbrook, IL); McGregor, Douglas S. (Whitmore Lake, MI)

2002-01-01T23:59:59.000Z

389

Apparatus for the etching for semiconductor devices  

SciTech Connect (OSTI)

Apparatus for the etching of semiconductor devices which includes, in combination, an etching chamber containing the semiconductor device to be etched, an electrodeless etching plasma forming chamber having an inlet connected to a source of continuously flowing etching gas and having an outlet connected to said etching chamber in fluid flow communication; a helical inductive resonator coupler for coupling a source of R.F. electrical power into the electrodeless plasma forming chamber for continuously forming etching plasma from the etching gas flowing therethrough; this inductive resonator coupler including a grounded hollow cylinder of electrically conductive material, with a grounded base member at one end; a helically coiled wire conductor concentrically mounted within the cylinder and spaced from the inner walls thereof; the plasma forming chamber being mounted substantially concentrically within the coil, the end of the coil toward the base member being grounded; and an electrical coupling for applying into the coil an R.F. source of electrical power at a position near, but spaced from, the grounded end thereof.

Reinberg, A.R.; Steinberg, G.N.

1983-01-11T23:59:59.000Z

390

Distributed Quantum Computation Architecture Using Semiconductor Nanophotonics  

E-Print Network [OSTI]

In a large-scale quantum computer, the cost of communications will dominate the performance and resource requirements, place many severe demands on the technology, and constrain the architecture. Unfortunately, fault-tolerant computers based entirely on photons with probabilistic gates, though equipped with "built-in" communication, have very large resource overheads; likewise, computers with reliable probabilistic gates between photons or quantum memories may lack sufficient communication resources in the presence of realistic optical losses. Here, we consider a compromise architecture, in which semiconductor spin qubits are coupled by bright laser pulses through nanophotonic waveguides and cavities using a combination of frequent probabilistic and sparse determinstic entanglement mechanisms. The large photonic resource requirements incurred by the use of probabilistic gates for quantum communication are mitigated in part by the potential high-speed operation of the semiconductor nanophotonic hardware. The system employs topological cluster-state quantum error correction for achieving fault-tolerance. Our results suggest that such an architecture/technology combination has the potential to scale to a system capable of attacking classically intractable computational problems.

Rodney Van Meter; Thaddeus D. Ladd; Austin G. Fowler; Yoshihisa Yamamoto

2009-09-17T23:59:59.000Z

391

Life-cycle Assessment of Semiconductors  

E-Print Network [OSTI]

of isopropyl alcohol (IPA), CO, NO X , ethyl lactate andHMDS: hexa-methyl disilizane IPA: isopropyl alcohol OMCTS:liquid H 2 SO 4 HCl NH 4 OH IPA oxide CMP slurry, chemicals

Boyd, Sarah B.

2009-01-01T23:59:59.000Z

392

Development of fluorocarbon evaporative cooling recirculators and controls for the ATLAS pixel and semiconductor tracking detectors  

E-Print Network [OSTI]

Development of fluorocarbon evaporative cooling recirculators and controls for the ATLAS pixel and semiconductor tracking detectors

Bayer, C; Bonneau, P; Bosteels, Michel; Burckhart, H J; Cragg, D; English, R; Hallewell, G D; Hallgren, Björn I; Kersten, S; Kind, P; Langedrag, K; Lindsay, S; Merkel, M; Stapnes, Steinar; Thadome, J; Vacek, V

2000-01-01T23:59:59.000Z

393

Simulation of neutron radiation damage in silicon semiconductor devices.  

SciTech Connect (OSTI)

A code, Charon, is described which simulates the effects that neutron damage has on silicon semiconductor devices. The code uses a stabilized, finite-element discretization of the semiconductor drift-diffusion equations. The mathematical model used to simulate semiconductor devices in both normal and radiation environments will be described. Modeling of defect complexes is accomplished by adding an additional drift-diffusion equation for each of the defect species. Additionally, details are given describing how Charon can efficiently solve very large problems using modern parallel computers. Comparison between Charon and experiment will be given, as well as comparison with results from commercially-available TCAD codes.

Shadid, John Nicolas; Hoekstra, Robert John; Hennigan, Gary Lee; Castro, Joseph Pete Jr.; Fixel, Deborah A.

2007-10-01T23:59:59.000Z

394

Electronic Structure, Oxidation State of Sn, and Chemical Stability of Photovoltaic Perovskite Variant Cs2SnI6  

E-Print Network [OSTI]

Cs2SnI6, a variant of perovskite CsSnI3, is expected for a photovoltaic material. Based on a simple ionic model, it is expected that Cs2SnI6 is composed of Cs+, I-, and Sn4+ ions and that the band gap is primarily made of occupied I- 5p6 valence band maximum (VBM) and unoccupied Sn4+ 5s conduction band minimum (CBM) similar to SnO2. In this work, we performed density functional theory (DFT) calculations and revealed that the real charge state of the Sn ion in this compound is +2 similar to CsSnI3. This is due to strong covalent nature between the I ion and the Sn ion, the VBM consists of I 5p - I 5p antibonding states, and the CBM of I 5p - Sn 5s antibonding states. The +2 oxidation state of Sn is realized by the apparent charge state of I-2/3, because the I 5p - Sn 5s antibonding states form the unoccupied CBM and apparently 1/18 of the I 5p orbitals are unoccupied. These results are further supported by comparing chemical bonding analyses with those of related compounds. The chemical stability of the Cs2SnI...

Xiao, Zewen; Zhang, Xiao; Zhou, Yuanyuan; Hosono, Hideo; Kamiya, Toshio

2015-01-01T23:59:59.000Z

395

Oxidation catalyst  

DOE Patents [OSTI]

The present invention generally relates to catalyst systems and methods for oxidation of carbon monoxide. The invention involves catalyst compositions which may be advantageously altered by, for example, modification of the catalyst surface to enhance catalyst performance. Catalyst systems of the present invention may be capable of performing the oxidation of carbon monoxide at relatively lower temperatures (e.g., 200 K and below) and at relatively higher reaction rates than known catalysts. Additionally, catalyst systems disclosed herein may be substantially lower in cost than current commercial catalysts. Such catalyst systems may be useful in, for example, catalytic converters, fuel cells, sensors, and the like.

Ceyer, Sylvia T. (Cambridge, MA); Lahr, David L. (Cambridge, MA)

2010-11-09T23:59:59.000Z

396

Processing and Characterization of P-Type Doped Zinc Oxide Thin Films  

E-Print Network [OSTI]

Applications of zinc oxide (ZnO) for optoelectronic devices, including light emitting diodes, semiconductor lasers, and solar cells have not yet been realized due to the lack of high-quality p-type ZnO. In the research presented herein, pulsed laser...

Myers, Michelle Anne

2013-03-18T23:59:59.000Z

397

A novel "gelsol" strategy to synthesize TiO2 nanorod combining reduced graphene oxide composites  

E-Print Network [OSTI]

Graphene oxide Titanium dioxide Nanostructure Semiconductors Nanorods a b s t r a c t In this studyH value benefits the deprotonation of TEOA for adsorption to the stationary nuclei. Therefore triethanolamine (TEOA) with titanium (IV) isopropoxide (TIPO) at a molar ratio of [TEOA]:[TIPO]¼2:1, was added

Guo, John Zhanhu

398

Template-Based Growth of Various Oxide Nanorods by SolGel Electrophoresis**  

E-Print Network [OSTI]

catalytic growth, LAC) has been used to form nano- rods of compound semiconductors.[4] A third example for nanostructures such as rods, wires, and hollow tubules is the template-based synthesis technique. In this method, including metal and polymer nano- rods,[2,7±9] oxide nanorods,[2,7,10,11] and composite nanostruc- tures.[2

Cao, Guozhong

399

Ultrathin amorphous zinc-tin-oxide buffer layer for enhancing heterojunction interface quality in  

E-Print Network [OSTI]

-abundant, non-toxic, and air-stable materials represent a promising class of photovoltaic (PV) devices for cost-effective manufacturing. Earth- abundant metal-oxide semiconductors comprise an attractive set of materials for photovoltaic applications, given their auspicious optoelec- tronic properties and chemical

400

Energy Conservation Through Water Usage Reduction in the Semiconductor Industry  

E-Print Network [OSTI]

The semiconductor industry uses large amounts of Ultrapure Water (UPW) in the wafer fabrication process. Producing UPW involves energy-intensive operations, such as membrane separations, ultraviolet lamps, and continuous pumping and recirculation...

Mendicino, L.; McCormack, K.; Gibson, S.; Patton, B.; Lyon, D.; Covington, J.

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


401

Data sheet acquired from Harris Semiconductor Buffered Inputs  

E-Print Network [OSTI]

1 Data sheet acquired from Harris Semiconductor SCHS121D Features · Buffered Inputs · Typical. The suffixes 96 and R denote tape and reel. The suffix T denotes a small-quantity reel of 250. CAUTION

Kretchmar, R. Matthew

402

Data sheet acquired from Harris Semiconductor Four Operating Modes  

E-Print Network [OSTI]

1 Data sheet acquired from Harris Semiconductor SCHS164F Features · Four Operating Modes - Shift Ld PDIP NOTE: When ordering, use the entire part number. The suffixes 96 and R denote tape and reel

Kretchmar, R. Matthew

403

AlGaN/GaN-based power semiconductor switches  

E-Print Network [OSTI]

AlGaN/GaN-based high-electron-mobility transistors (HEMTs) have great potential for their use as high efficiency and high speed power semiconductor switches, thanks to their high breakdown electric field, mobility and ...

Lu, Bin, Ph. D. Massachusetts Institute of Technology

2013-01-01T23:59:59.000Z

404

Thermo-electrically pumped semiconductor light emitting diodes  

E-Print Network [OSTI]

Thermo-electric heat exchange in semiconductor light emitting diodes (LEDs) allows these devices to emit optical power in excess of the electrical power used to drive them, with the remaining power drawn from ambient heat. ...

Santhanam, Parthiban

2014-01-01T23:59:59.000Z

405

Improving reuse of semiconductor equipment through benchmarking, standardization, and automation  

E-Print Network [OSTI]

The 6D program at Intel® Corporation was set up to improve operations around capital equipment reuse, primarily in their semiconductor manufacturing facilities. The company was faced with a number of challenges, including ...

Silber, Jacob B. (Jacob Bradley)

2006-01-01T23:59:59.000Z

406

Semiconductor nanowire array: potential substrates for photocatalysis and photovoltaics  

E-Print Network [OSTI]

Semiconductor nanowire array: potential substrates for photocatalysis and photovoltaics Yiying Wu, these nanowire arrays could find unique applications in photocatalysis and photovoltaics. KEY WORDS luminescence efficiency [5,6], enhancement of thermoelectric figure of merit [7] and lowered lasing threshold

Yang, Peidong

407

Translating semiconductor device physics into nanoparticle films for electronic applications  

E-Print Network [OSTI]

This thesis explores and quantifies some of the important device physics, parameters, and mechanisms of semiconductor nanocrystal quantum dot (QD) electronic devices, and photovoltaic devices in particular. This involves ...

Wanger, Darcy Deborah

2014-01-01T23:59:59.000Z

408

Semiconductor nanocrystals : synthesis, mechanisms of formation, and applications in biology  

E-Print Network [OSTI]

The primary focus of this thesis is the synthesis and applications of semiconductor nanocrystals, or quantum dots (QDs). Novel synthetic routes to ternary 1-III-VI QDs are presented, and we report the first highly luminescent ...

Allen, Peter M. (Peter Matthew)

2010-01-01T23:59:59.000Z

409

Exploring and enhancing conductivity in semiconductor nanoparticle films  

E-Print Network [OSTI]

Semiconductor nanocrystals (NCs) are a promising material for use in opto-electronic devices as their optical properties tune with particle size. NCs formed via colloidal synthesis are suspended in solution by the organic ...

Porter, Venda Jane

2007-01-01T23:59:59.000Z

410

Phenomenological band structure model of magnetic coupling in semiconductors  

E-Print Network [OSTI]

Phenomenological band structure model of magnetic coupling in semiconductors Gustavo M. Dalpian a,1­18]. Several models have been proposed to explain the phenomena, including the phenomenological Zener

Gong, Xingao

411

FRONTIERS ARTICLE Theory of multiexciton generation in semiconductor nanocrystals  

E-Print Network [OSTI]

FRONTIERS ARTICLE Theory of multiexciton generation in semiconductor nanocrystals Eran Rabani a's function formalism to calculate the efficiency of multiexciton generation in nanocrystal quantum dots multiexciton generation in nanocrystals, are reviewed and rederived from the unified theory as certain

Baer, Roi

412

Conductive layer for biaxially oriented semiconductor film growth  

DOE Patents [OSTI]

A conductive layer for biaxially oriented semiconductor film growth and a thin film semiconductor structure such as, for example, a photodetector, a photovoltaic cell, or a light emitting diode (LED) that includes a crystallographically oriented semiconducting film disposed on the conductive layer. The thin film semiconductor structure includes: a substrate; a first electrode deposited on the substrate; and a semiconducting layer epitaxially deposited on the first electrode. The first electrode includes a template layer deposited on the substrate and a buffer layer epitaxially deposited on the template layer. The template layer includes a first metal nitride that is electrically conductive and has a rock salt crystal structure, and the buffer layer includes a second metal nitride that is electrically conductive. The semiconducting layer is epitaxially deposited on the buffer layer. A method of making such a thin film semiconductor structure is also described.

Findikoglu, Alp T. (Los Alamos, NM); Matias, Vladimir (Santa Fe, NM)

2007-10-30T23:59:59.000Z

413

Printable semiconductor structures and related methods of making and assembling  

DOE Patents [OSTI]

The present invention provides a high yield pathway for the fabrication, transfer and assembly of high quality printable semiconductor elements having selected physical dimensions, shapes, compositions and spatial orientations. The compositions and methods of the present invention provide high precision registered transfer and integration of arrays of microsized and/or nanosized semiconductor structures onto substrates, including large area substrates and/or flexible substrates. In addition, the present invention provides methods of making printable semiconductor elements from low cost bulk materials, such as bulk silicon wafers, and smart-materials processing strategies that enable a versatile and commercially attractive printing-based fabrication platform for making a broad range of functional semiconductor devices.

Nuzzo, Ralph G. (Champaign, IL); Rogers, John A. (Champaign, IL); Menard, Etienne (Urbana, IL); Lee, Keon Jae (Tokyo, JP); Khang, Dahl-Young (Urbana, IL); Sun, Yugang (Westmont, IL); Meitl, Matthew (Champaign, IL); Zhu, Zhengtao (Rapid City, SD); Ko, Heung Cho (Urbana, IL); Mack, Shawn (Goleta, CA)

2010-09-21T23:59:59.000Z

414

Printable semiconductor structures and related methods of making and assembling  

DOE Patents [OSTI]

The present invention provides a high yield pathway for the fabrication, transfer and assembly of high quality printable semiconductor elements having selected physical dimensions, shapes, compositions and spatial orientations. The compositions and methods of the present invention provide high precision registered transfer and integration of arrays of microsized and/or nanosized semiconductor structures onto substrates, including large area substrates and/or flexible substrates. In addition, the present invention provides methods of making printable semiconductor elements from low cost bulk materials, such as bulk silicon wafers, and smart-materials processing strategies that enable a versatile and commercially attractive printing-based fabrication platform for making a broad range of functional semiconductor devices.

Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang; , Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao; Ko, Heung Cho; Mack, Shawn

2013-03-12T23:59:59.000Z

415

Printable semiconductor structures and related methods of making and assembling  

DOE Patents [OSTI]

The present invention provides a high yield pathway for the fabrication, transfer and assembly of high quality printable semiconductor elements having selected physical dimensions, shapes, compositions and spatial orientations. The compositions and methods of the present invention provide high precision registered transfer and integration of arrays of microsized and/or nanosized semiconductor structures onto substrates, including large area substrates and/or flexible substrates. In addition, the present invention provides methods of making printable semiconductor elements from low cost bulk materials, such as bulk silicon wafers, and smart-materials processing strategies that enable a versatile and commercially attractive printing-based fabrication platform for making a broad range of functional semiconductor devices.

Nuzzo, Ralph G. (Champaign, IL); Rogers, John A. (Champaign, IL); Menard, Etienne (Durham, NC); Lee, Keon Jae (Tokyo, JP); Khang, Dahl-Young (Urbana, IL); Sun, Yugang (Westmont, IL); Meitl, Matthew (Raleigh, NC); Zhu, Zhengtao (Rapid City, SD); Ko, Heung Cho (Urbana, IL); Mack, Shawn (Goleta, CA)

2011-10-18T23:59:59.000Z

416

Spectral properties of semiconductor nanocrystals and their applications  

E-Print Network [OSTI]

The ability to engineer the optical properties of the semiconductor nanocrystals by controlling their growth - size, shape, materials, coatings, etc - makes them appealing for many optical applications. Despite the impressive ...

Liptay, Thomas J. (Thomas John)

2007-01-01T23:59:59.000Z

417

Thermally robust semiconductor optical amplifiers and laser diodes  

DOE Patents [OSTI]

A highly heat conductive layer is combined with or placed in the vicinity of the optical waveguide region of active semiconductor components. The thermally conductive layer enhances the conduction of heat away from the active region, which is where the heat is generated in active semiconductor components. This layer is placed so close to the optical region that it must also function as a waveguide and causes the active region to be nearly the same temperature as the ambient or heat sink. However, the semiconductor material itself should be as temperature insensitive as possible and therefore the invention combines a highly thermally conductive dielectric layer with improved semiconductor materials to achieve an overall package that offers improved thermal performance. The highly thermally conductive layer serves two basic functions. First, it provides a lower index material than the semiconductor device so that certain kinds of optical waveguides may be formed, e.g., a ridge waveguide. The second and most important function, as it relates to this invention, is that it provides a significantly higher thermal conductivity than the semiconductor material, which is the principal material in the fabrication of various optoelectronic devices.

Dijaili, Sol P. (Moraga, CA); Patterson, Frank G. (Danville, CA); Walker, Jeffrey D. (El Cerrito, CA); Deri, Robert J. (Pleasanton, CA); Petersen, Holly (Manteca, CA); Goward, William (Antioch, CA)

2002-01-01T23:59:59.000Z

418

A Fully Integrated Nanosystem of Semiconductor Nanowires for Direct Solar Water Splitting  

SciTech Connect (OSTI)

Artificial photosynthesis, the biomimetic approach to converting sunlight?s energy directly into chemical fuels, aims to imitate nature by using an integrated system of nanostructures, each of which plays a specific role in the sunlight-to-fuel conversion process. Here we describe a fully integrated system of nanoscale photoelectrodes assembled from inorganic nanowires for direct solar water splitting. Similar to the photosynthetic system in a chloroplast, the artificial photosynthetic system comprises two semiconductor light absorbers with large surface area, an interfacial layer for charge transport, and spatially separated cocatalysts to facilitate the water reduction and oxidation. Under simulated sunlight, a 0.12percent solar-to-fuel conversion efficiency is achieved, which is comparable to that of natural photosynthesis. The result demonstrates the possibility of integrating material components into a functional system that mimics the nanoscopic integration in chloroplasts. It also provides a conceptual blueprint of modular design that allows incorporation of newly discovered components for improved performance.

Liu, Chong; Tang, Jinyao; Chen, HaoMing; Liu, Bin; Yang, Peidong

2013-02-21T23:59:59.000Z

419

Celebrating Faculty Excellence acclaiming the awards, honors,  

E-Print Network [OSTI]

of the world's foremost experts on doping wide band-gap semiconductors, creating blue and ultraviolet light-emitting diodes (leds) and lasers that have led to improved consumer products, including sharper laser printers

420

Photoluminescence and Extended X-ray Absorption Fine Structure Studies on CdTe Material.  

E-Print Network [OSTI]

??The direct-band-gap semiconductor CdTe is an important material for fabricating high efficiency, polycrystalline thin-film solar cells in a heterojunction configuration. The outstanding physical properties of… (more)

Liu, Xiangxin

2006-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


421

Optical properties of two-dimensional transition metal dichalcogenides  

E-Print Network [OSTI]

The re-discovery of the atomically thin transition metal dichalcogenides (TMDs), which are mostly semiconductors with a wide range of band gaps, has diversified the family of two-dimensional materials and boosted the ...

Lin, Yuxuan, S.M. Massachusetts Institute of Technology

2014-01-01T23:59:59.000Z

422

Visible and Infra-red Light Emission in Boron-Doped Wurtzite Silicon Nanowires  

E-Print Network [OSTI]

Silicon, the mainstay semiconductor in microelectronic circuitry, is considered unsuitable for optoelectronic applications owing to its indirect electronic band gap, which limits its efficiency as a light emitter. Here we ...

Fabbri, Filippo

423

Characterization and electrical modeling of semiconductors bridges  

SciTech Connect (OSTI)

Semiconductor bridges (SCBs) are finding increased use as initiators for explosive and pyrotechnic devices. They offer advantages in reduced voltage and energy requirements, coupled with excellent safety features. The design of explosive systems which implement either SCBs or metal bridgewires can be facilitated through the use of electrical simulation software such as the PSpice{reg_sign} computer code. A key component in the electrical simulation of such systems is an electrical model of the bridge. This report has two objectives: (1) to present and characterize electrical data taken in tests of detonators which employ SCBs with BNCP as the explosive powder; and (2) to derive appropriate electrical models for such detonators. The basis of such models is a description of the resistance as a function of energy deposited in the SCB. However, two important features which must be added to this are (1) the inclusion of energy loss through such mechanisms as ohmic heating of the aluminum lands and heat transfer from the bridge to the surrounding media; and (2) accounting for energy deposited in the SCB through heat transfer to the bridge from the explosive powder after the powder ignites. The modeling procedure is entirely empirical; i.e., models for the SCB resistance and the energy gain and loss have been estimated from experimental data taken over a range of firing conditions. We present results obtained by applying the model to the simulation of SCB operation in representative tests.

Marx, K.D. [Sandia National Labs., Livermore, CA (United States); Bickes, R.W. Jr.; Wackerbarth, D.E. [Sandia National Labs., Albuquerque, NM (United States)

1997-03-01T23:59:59.000Z

424

Growth and properties of crystalline barium oxide on the GaAs(100) substrate  

SciTech Connect (OSTI)

Growing a crystalline oxide film on III-V semiconductor renders possible approaches to improve operation of electronics and optoelectronics heterostructures such as oxide/semiconductor junctions for transistors and window layers for solar cells. We demonstrate the growth of crystalline barium oxide (BaO) on GaAs(100) at low temperatures, even down to room temperature. Photoluminescence (PL) measurements reveal that the amount of interface defects is reduced for BaO/GaAs, compared to Al{sub 2}O{sub 3}/GaAs, suggesting that BaO is a useful buffer layer to passivate the surface of the III-V device material. PL and photoemission data show that the produced junction tolerates the post heating around 600?°C.

Yasir, M.; Dahl, J.; Lång, J.; Tuominen, M.; Punkkinen, M. P. J.; Laukkanen, P., E-mail: pekka.laukkanen@utu.fi; Kokko, K. [Department of Physics and Astronomy, University of Turku, FI-20014 Turku (Finland)] [Department of Physics and Astronomy, University of Turku, FI-20014 Turku (Finland); Kuzmin, M. [Department of Physics and Astronomy, University of Turku, FI-20014 Turku (Finland) [Department of Physics and Astronomy, University of Turku, FI-20014 Turku (Finland); Ioffe Physical-Technical Institute, Russian Academy of Sciences, St. Petersburg 194021 (Russian Federation); Korpijärvi, V.-M.; Polojärvi, V.; Guina, M. [Optoelectronics Research Centre, Tampere University of Technology, FI-33101 Tampere (Finland)] [Optoelectronics Research Centre, Tampere University of Technology, FI-33101 Tampere (Finland)

2013-11-04T23:59:59.000Z

425

Project Profile: High Performance Reduction/Oxidation Metal Oxides...  

Office of Environmental Management (EM)

High Performance ReductionOxidation Metal Oxides for Thermochemical Energy Storage Project Profile: High Performance ReductionOxidation Metal Oxides for Thermochemical Energy...

426

Optoelectronic cooling of mechanical modes in a semiconductor nanomembrane  

E-Print Network [OSTI]

Optical cavity cooling of mechanical resonators has recently become a research frontier. The cooling has been realized with a metal-coated silicon microlever via photo-thermal force and subsequently with dielectric objects via radiation pressure. Here we report cavity cooling with a crystalline semiconductor membrane via a new mechanism, in which the cooling force arises from the interaction between the photo-induced electron-hole pairs and the mechanical modes through the deformation potential coupling. The optoelectronic mechanism is so efficient as to cool a mode down to 4 K from room temperature with just 50 uW of light and a cavity with a finesse of 10 consisting of a standard mirror and the sub-wavelength-thick semiconductor membrane itself. The laser-cooled narrow-band phonon bath realized with semiconductor mechanical resonators may open up a new avenue for photonics and spintronics devices.

K. Usami; A. Naesby; T. Bagci; B. Melholt Nielsen; J. Liu; S. Stobbe; P. Lodahl; E. S. Polzik

2010-11-22T23:59:59.000Z

427

Reactive codoping of GaAlInP compound semiconductors  

DOE Patents [OSTI]

A GaAlInP compound semiconductor and a method of producing a GaAlInP compound semiconductor are provided. The apparatus and method comprises a GaAs crystal substrate in a metal organic vapor deposition reactor. Al, Ga, In vapors are prepared by thermally decomposing organometallic compounds. P vapors are prepared by thermally decomposing phospine gas, group II vapors are prepared by thermally decomposing an organometallic group IIA or IIB compound. Group VIB vapors are prepared by thermally decomposing a gaseous compound of group VIB. The Al, Ga, In, P, group II, and group VIB vapors grow a GaAlInP crystal doped with group IIA or IIB and group VIB elements on the substrate wherein the group IIA or IIB and a group VIB vapors produced a codoped GaAlInP compound semiconductor with a group IIA or IIB element serving as a p-type dopant having low group II atomic diffusion.

Hanna, Mark Cooper (Boulder, CO); Reedy, Robert (Golden, CO)

2008-02-12T23:59:59.000Z

428

Spin-polarized lasing in a highly photoexcited semiconductor microcavity  

E-Print Network [OSTI]

Lasing in semiconductors is generally independent of the spins of electrons and holes, which constitute the gain medium. However, in a few spin-controlled lasers, spin-polarized carriers with long spin relaxation times ($\\sim$1 ns) result in continuous or sub-nanosecond pulsed circularly polarized stimulated emission. In these spin-controlled semiconductor lasers, a spin-imbalanced population inversion has been considered necessary. Here, we demonstrate room-temperature spin-polarized ultrafast ($\\sim$10 ps) lasing in a highly optically excited GaAs microcavity embedded with InGaAs multiple quantum wells within which the spin relaxation time is less than 10 ps. The laser radiation remains highly circularly polarized even when excited by \\emph{nonresonant} \\emph{elliptically} polarized light. In contrast to conventional semiconductor lasers, it exhibits a nonlinear input-output relation, energy shifts, and spectral broadening as a function of the photoexcited density. Such spin-polarized lasing is attributed t...

Hsu, Feng-kuo; Lee, Yi-Shan; Lin, Sheng-Di; Lai, Chih-Wei

2015-01-01T23:59:59.000Z

429

Wafer Fusion for Integration of Semiconductor Materials and Devices  

SciTech Connect (OSTI)

We have developed a wafer fusion technology to achieve integration of semiconductor materials and heterostructures with widely disparate lattice parameters, electronic properties, and/or optical properties for novel devices not now possible on any one substrate. Using our simple fusion process which uses low temperature (400-600 C) anneals in inert N{sub 2} gas, we have extended the scope of this technology to examine hybrid integration of dissimilar device technologies. As a specific example, we demonstrate wafer bonding vertical cavity surface emitting lasers (VCSELs) to transparent AlGaAs and GaP substrates to fabricate bottom-emitting short wavelength VCSELs. As a baseline fabrication technology applicable to many semiconductor systems, wafer fusion will revolutionize the way we think about possible semiconductor devices, and enable novel device configurations not possible by epitaxial growth.

Choquette, K.D.; Geib, K.M.; Hou, H.Q.; Allerman, A.A.; Kravitz, S.; Follstaedt, D.M.; Hindi, J.J.

1999-05-01T23:59:59.000Z

430

OPTICAL AND DYNAMIC PROPERTIES OF UNDOPED AND DOPED SEMICONDUCTOR NANOSTRUCTURES  

SciTech Connect (OSTI)

This chapter provides an overview of some recent research activities on the study of optical and dynamic properties of semiconductor nanomaterials. The emphasis is on unique aspects of these properties in nanostructures as compared to bulk materials. Linear, including absorption and luminescence, and nonlinear optical as well as dynamic properties of semiconductor nanoparticles are discussed with focus on their dependence on particle size, shape, and surface characteristics. Both doped and undoped semiconductor nanomaterials are highlighted and contrasted to illustrate the use of doping to effectively alter and probe nanomaterial properties. Some emerging applications of optical nanomaterials are discussed towards the end of the chapter, including solar energy conversion, optical sensing of chemicals and biochemicals, solid state lighting, photocatalysis, and photoelectrochemistry.

Grant, C D; Zhang, J Z

2007-09-28T23:59:59.000Z

431

Wavelength-resonant surface-emitting semiconductor laser  

DOE Patents [OSTI]

A wavelength resonant semiconductor gain medium is disclosed. The essential feature of this medium is a multiplicity of quantum-well gain regions separated by semiconductor spacer regions of higher bandgap. Each period of this medium consisting of one quantum-well region and the adjacent spacer region is chosen such that the total width is equal to an integral multiple of 1/2 the wavelength in the medium of the radiation with which the medium is interacting. Optical, electron-beam and electrical injection pumping of the medium is disclosed. This medium may be used as a laser medium for single devices or arrays either with or without reflectors, which may be either semiconductor or external.

Brueck, Steven R. J. (Albuquerque, NM); Schaus, Christian F. (Albuquerque, NM); Osinski, Marek A. (Albuquerque, NM); McInerney, John G. (Cedar Crest, NM); Raja, M. Yasin A. (Albuquerque, NM); Brennan, Thomas M. (Albuquerque, NM); Hammons, Burrell E. (Tijeras, NM)

1989-01-01T23:59:59.000Z

432

Solar Energy Materials & Solar Cells 91 (2007) 15991610 Improving solar cell efficiency using photonic band-gap materials  

E-Print Network [OSTI]

Solar Energy Materials & Solar Cells 91 (2007) 1599­1610 Improving solar cell efficiency using) solar energy conversion systems (or solar cells) are the most widely used power systems. However and reliable solar-cell devices is presented. We show that due their ability to modify the spectral and angular

Dowling, Jonathan P.

433

PHYSICAL REVIEW B 84, 035315 (2011) Theoretical analysis of the crystal structure, band-gap energy, polarization, and piezoelectric  

E-Print Network [OSTI]

have already been incorporated in flat panel displays and solar cells as transparent electrodesO can be tailored by alloying ZnO with BeO for applications such as electrodes in flat panel displays and solar cells, blue and ultraviolet (UV) light emitting devices, and highly sensitive UV detectors. We

Alpay, S. Pamir

2011-01-01T23:59:59.000Z

434

One-photon band gap engineering of borate glass doped with ZnO for photonics applications  

SciTech Connect (OSTI)

Lithium tungsten borate glass of the composition (0.56-x)B{sub 2}O{sub 3}-0.4Li{sub 2}O-xZnO-0.04WO{sub 3} (0 {<=}x{<=} 0.1 mol. %) is prepared for photonics applications. The glass is doped with ZnO to tune the glass absorption characteristics in a wide spectrum range (200-2500 nm). Chemical bond approach, including chemical structure, electronegativity, bond ionicity, nearest-neighbor coordination, and other chemical bonding aspect, is used to analyze and to explain the obtained glass properties such as: transmittance, absorption, electronic structure parameters (bandgap, Fermi level, and Urbach exciton-phonon coupling), Wannier free excitons excitation (applying Elliott's model), and two-photon absorption coefficient as a result of replacement of B{sub 2}O{sub 3} by ZnO.

Abdel-Baki, Manal [Glass Department, National Research Centre, Dokki 12311 Giza (Egypt); Abdel-Wahab, Fathy A.; El-Diasty, Fouad [Physics Department, Faculty of Science, Ain Shams University, Abbasia, 11566 Cairo (Egypt)

2012-04-01T23:59:59.000Z

435

Exploring Visible-Light-Responsive Photocatalysts for Water Splitting Based on Novel Band-gap Engineering Strategies  

E-Print Network [OSTI]

Chapter 4 Boron Carbides as Efficient, Metal-Free, Visible-and transition metals, the boron carbide products werex Chapter Boron Carbides as Efficient, Metal-free, Visible-

Liu, Jikai

2013-01-01T23:59:59.000Z

436

Quasiparticle band structure and density-functional theory: Single-particle excitations and band gaps in lattice models  

E-Print Network [OSTI]

ARTICLES Quasiparticle band structure and density-functional theory: Single-particle excitations-particle eigenvalues. Without rigorous basis even for the exact density-functional theory , these are often taken, eigenvalues obtained from density-functional theory DFT , and those from a corresponding LDA. Notable among

Hess, Daryl W.

437

Propagation of Lamb waves in one-dimensional quasiperiodic composite thin plates: A split of phonon band gap  

E-Print Network [OSTI]

Propagation of Lamb waves in one-dimensional quasiperiodic composite thin plates: A split of phonon the propagation of Lamb waves in one-dimensional quasiperiodic composite thin plates made of tungsten B spectra, Raman scattering spectra, and propagating modes of acoustic waves on corrugated surfaces.14

Li, Baowen

438

Nature of the Band Gap and Origin of the Electro-/Photo-Activity of Co3O4.  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security Administration the Contributions andDataNational Library of1, 2007 (next release3,3,NatureNature|

439

Optical absorption and band gap reduction in (Fe1-xCrx)2O3 solid solutions:  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security Administration the1 - September 2006 The 2002 WholesaleEnergy'sRunningOperationsDistribution,RainA

440

Thin film reactions on alloy semiconductor substrates  

SciTech Connect (OSTI)

The interactions between Pt and In{sub .53}Ga{sub .47}As have been studied. In{sub .53}Ga{sub .47}As substrates with 70nm Pt films were encapsulated in SiO{sub 2}, and annealed up to 600{degree}C in flowing forming gas. The composition and morphology of the reaction product phases were studied using x-ray diffraction, Auger depth profiling, and transmission electron microscopy. The reaction kinetics were examined with Rutherford Backscattering. Results show that Pt/In{sub .53}Ga{sub .47}As reacts to form many of the reaction products encountered in the Pt/GaAs and Pt/InP reactions: PtGa, Pt{sub 3}Ga, and PtAs{sub 2}. In addition, a ternary phase, Pt(In:Ga){sub 2}, develops, which is a solid solution between PtIn{sub 2} and PtGa{sub 2}. The amount of Ga in the ternary phase increases with annealing temperature, which causes a decrease in the lattice parameter of the phase. The reaction products show a tendency to form layered structures, especially for higher temperatures and longer annealing times. Unlike the binary case, the PtAs{sub 2}, phase is randomly oriented on the substrate, and is intermingle with a significant amount of Pt(In:Ga){sub 2}. Following Pt/In{sub .53}Ga{sub .47}As reactions, two orientation relationships between the Pt(In:Ga){sub 2} product phase and the substrate were observed, despite the large mismatch with the substrate ({approximately}8%). For many metal/compound semiconductor interactions, the reaction rate is diffusion limited, i.e. exhibits a parabolic dependence on time. An additional result of this study was the development of an In-rich layer beneath the reacted layer. The Auger depth profile showed a substantial increase in the sample at this layer. This is a significant result for the production of ohmic contacts, as the Schottky barrier height in this system lower for higher In concentrations. 216 refs.

Olson, D.A.

1990-11-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


441

Optimization of Preventive Maintenance Scheduling in Semiconductor Manufacturing Models Using a Simulation-Based Approximate  

E-Print Network [OSTI]

Optimization of Preventive Maintenance Scheduling in Semiconductor Manufacturing Models Using Dynamic Programming (ADP) approach for the optimization of Preventive Maintenance (PM) scheduling schedules. I. INTRODUCTION In semiconductor manufacturing systems, or fabs, pre- ventive maintenance (PM

Fernandez, Emmanuel

442

Semiconductor wire array structures, and solar cells and photodetectors based on such structures  

DOE Patents [OSTI]

A structure comprising an array of semiconductor structures, an infill material between the semiconductor materials, and one or more light-trapping elements is described. Photoconverters and photoelectrochemical devices based on such structure also described.

Kelzenberg, Michael D.; Atwater, Harry A.; Briggs, Ryan M.; Boettcher, Shannon W.; Lewis, Nathan S.; Petykiewicz, Jan A.

2014-08-19T23:59:59.000Z

443

Adaptive feedback control of ultrafast semiconductor nonlinearities J. Kunde,a)  

E-Print Network [OSTI]

that adaptive feedback optical pulse shaping can be used to control ultrafast semiconductor nonlinearities insight into the interaction of semiconduc- tors and ultrafast optical pulses. Specifically, we develop spectroscopy. More- over, the optimized pulse shape can substantially enhance ultrafast semiconductor

Keller, Ursula

444

E-Print Network 3.0 - active fabry-perot semiconductor Sample...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Physics 45 The Laser DiodeThe Laser Diode Jason HillJason Hill Summary: to a Light Emitting Diode Active medium is a semiconductor pActive medium is a semiconductor p--n...

445

Operations improvement in a semiconductor capital equipment manufacturing plant : component level and assembly level inventory management  

E-Print Network [OSTI]

Semiconductor capital equipment is manufactured in a high-mix and low-volume environment at Varian Semiconductor Equipment business unit of Applied Materials. Due to the demand growth over the past years, Varian has been ...

Wu, Yiming, M. Eng. Massachusetts Institute of Technology

2012-01-01T23:59:59.000Z

446

Band offsets of Al{sub 2}O{sub 3} and HfO{sub 2} oxides deposited by atomic layer deposition technique on hydrogenated diamond  

SciTech Connect (OSTI)

High-k oxide insulators (Al{sub 2}O{sub 3} and HfO{sub 2}) have been deposited on a single crystalline hydrogenated diamond (H-diamond) epilayer by an atomic layer deposition technique at temperature as low as 120 Degree-Sign C. Interfacial electronic band structures are characterized by X-ray photoelectron spectroscopy. Based on core-level binding energies and valence band maximum values, valence band offsets are found to be 2.9 {+-} 0.2 and 2.6 {+-} 0.2 eV for Al{sub 2}O{sub 3}/H-diamond and HfO{sub 2}/H-diamond heterojunctions, respectively. Band gaps of the Al{sub 2}O{sub 3} and HfO{sub 2} have been determined to be 7.2 {+-} 0.2 and 5.4 {+-} 0.2 eV by measuring O 1s energy loss spectra, respectively. Both the Al{sub 2}O{sub 3}/H-diamond and HfO{sub 2}/H-diamond heterojunctions are concluded to be type-II staggered band configurations with conduction band offsets of 1.2 {+-} 0.2 and 2.7 {+-} 0.2 eV, respectively.

Liu, J. W.; Liao, M. Y.; Imura, M. [Optical and Electronic Materials Unit, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan); Koide, Y. [Optical and Electronic Materials Unit, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan); Nanofabrication Platform, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047 (Japan); Center of Materials Research for Low Carbon Emission, NIMS, 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan)

2012-12-17T23:59:59.000Z

447

The origin of 2.7 eV luminescence and 5.2 eV excitation band in hafnium oxide  

SciTech Connect (OSTI)

The origin of a blue luminescence band at 2.7 eV and a luminescence excitation band at 5.2 eV of hafnia has been studied in stoichiometric and non-stoichiometric hafnium oxide films. Experimental and calculated results from the first principles valence band spectra showed that the stoichiometry violation leads to the formation of the peak density of states in the band gap caused by oxygen vacancies. Cathodoluminescence in the non-stoichiometric film exhibits a band at 2.65 eV that is excited at the energy of 5.2 eV. The optical absorption spectrum calculated for the cubic phase of HfO{sub 2} with oxygen vacancies shows a peak at 5.3?eV. Thus, it could be concluded that the blue luminescence band at 2.7?eV and HfO{sub x} excitation peak at 5.2?eV are due to oxygen vacancies. The thermal trap energy in hafnia was estimated.

Perevalov, T. V., E-mail: timson@isp.nsc.ru [A. V. Rzhanov Institute of Semiconductor Physics of SB RAS, 13 Lavrentieva Ave, 630090 Novosibirsk (Russian Federation); Novosibirsk State University, 2 Pirogova St., 630090 Novosibirsk (Russian Federation); Aliev, V. Sh.; Gritsenko, V. A. [A. V. Rzhanov Institute of Semiconductor Physics of SB RAS, 13 Lavrentieva Ave, 630090 Novosibirsk (Russian Federation); Saraev, A. A. [Boreskov Institute of Catalysis of SB RAS, 5 Lavrentieva Ave, 630090 Novosibirsk (Russian Federation); Kaichev, V. V. [Novosibirsk State University, 2 Pirogova St., 630090 Novosibirsk (Russian Federation); Boreskov Institute of Catalysis of SB RAS, 5 Lavrentieva Ave, 630090 Novosibirsk (Russian Federation); Ivanova, E. V.; Zamoryanskaya, M. V. [Ioffe Physicotechnical Institute of RAS, 26 Politechnicheskaya St., 194021 St. Petersburg (Russian Federation)

2014-02-17T23:59:59.000Z

448

Controlled Chemical Doping of Semiconductor Nanocrystals Using Redox Buffers  

SciTech Connect (OSTI)

Semiconductor nanocrystal solids are attractive materials for active layers in next-generation optoelectronic devices; however, their efficient implementation has been impeded by the lack of precise control over dopant concentrations. Herein we demonstrate a chemical strategy for the controlled doping of nanocrystal solids under equilibrium conditions. Exposing lead selenide nanocrystal thin films to solutions containing varying proportions of decamethylferrocene and decamethylferrocenium incrementally and reversibly increased the carrier concentration in the solid by 2 orders of magnitude from their native values. This application of redox buffers for controlled doping provides a new method for the precise control of the majority carrier concentration in porous semiconductor thin films.

Engel, Jesse H.; Surendranath, Yogesh; Alivisatos, Paul

2013-07-09T23:59:59.000Z

449

Toward a Unified Treatment of Electronic Processes in Organic Semiconductors  

SciTech Connect (OSTI)

A quantitative study of n-type doping in highly crystalline organic semiconductor films establishes the predominant influence of electrostatic forces in these low-dielectric materials. Based on these findings, a self-consistent model of doped (purposely or not) organic semiconductors is proposed in which: (1) the equilibrium free carrier density, nf, is a small fraction of the total charge density; (2) a superlinear increase in conductivity with doping density is universal; (3) nf increases with applied electric field; and (4) the carrier mobility is field-dependent regardless of crystallinity.

Gregg. B.A.

2005-01-01T23:59:59.000Z

450

Entrainment by Spatiotemporal Chaos in Glow Discharge-Semiconductor Systems  

E-Print Network [OSTI]

Entrainment of limit cycles by chaos [1] is discovered numerically through specially designed unidirectional coupling of two glow discharge-semiconductor systems. By utilizing the auxiliary system approach [2], it is verified that the phenomenon is not a chaos synchronization. Simulations demonstrate various aspects of the chaos appearance in both drive and response systems. Chaotic control is through the external circuit equation and governs the electrical potential on the boundary. The expandability of the theory to collectives of glow discharge systems is discussed, and this increases the potential of applications of the results. Moreover, the research completes the previous discussion of the chaos appearance in a glow discharge-semiconductor system [3].

Marat Akhmet; Ismail Rafatov; Mehmet Onur Fen

2014-06-15T23:59:59.000Z

451

Contact formation and gettering of precipitated impurities by multiple firing during semiconductor device fabrication  

DOE Patents [OSTI]

Methods for contact formation and gettering of precipitated impurities by multiple firing during semiconductor device fabrication are provided. In one embodiment, a method for fabricating an electrical semiconductor device comprises: a first step that includes gettering of impurities from a semiconductor wafer and forming a backsurface field; and a second step that includes forming a front contact for the semiconductor wafer, wherein the second step is performed after completion of the first step.

Sopori, Bhushan

2014-05-27T23:59:59.000Z

452

E-Print Network 3.0 - advanced semiconductor devices Sample Search...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Northern Illinois University Collection: Engineering 39 Kompetenzzentrum fr Automobil-und Industrieelektronik Summary: of materials for these advanced semiconductor...

453

Growth and field-emission property of tungsten oxide nanotip arrays Jun Zhou, Li Gong, Shao Zhi Deng,a  

E-Print Network [OSTI]

and Engineering, SunYat-Sen (Zhongshan) University, Guangzhou, 510275, China Rusen Yang and Zhong Lin Wangb School in the threshold field.14­16 Tungsten oxide is a very important semiconductor. It has been found to be of great- tion deposition process. The experimental setup consists of a vacuum chamber 300 mm 400 mm , two copper

Wang, Zhong L.

454

In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques  

E-Print Network [OSTI]

-type semiconductor metal oxide that has many applications in various fields due to its special optical, electrical capacity anode for next gen- eration lithium ion batteries.3,4 SnO2 can also be used as a catalyst typically around 10-2 cm. The adsorp- tion of O2 from air removes the electron charge carriers from

George, Steven M.

455

Local laser induced rapid thermal oxidation of SOI substrates , R.A. Deutschmann, R. Neumann, K. Brunner, G. Abstreiter  

E-Print Network [OSTI]

lasers are used as well as cw lasers in the whole spectral range of infrared, visible and UV radiation of implanted semiconductors for healing the implantation damage and recrystallisation of thin ®lms, laser of the temperature pro®le [3]. However, due to varied optical properties in the buried oxide and the thermal

Deutschmann, Rainer

456

Asphalt Oxidation Kinetics and Pavement Oxidation Modeling  

E-Print Network [OSTI]

Most paved roads in the United States are surfaced with asphalt. These asphalt pavements suffer from fatigue cracking and thermal cracking, aggravated by the oxidation and hardening of asphalt. This negative impact of asphalt oxidation on pavement...

Jin, Xin

2012-07-16T23:59:59.000Z

457

Electronic displays using optically pumped luminescent semiconductor nanocrystals  

SciTech Connect (OSTI)

A multicolor electronic display is based on an array of luminescent semiconductor nanocrystals. Nanocrystals which emit light of different colors are grouped into pixels. The nanocrystals are optically pumped to produce a multicolor display. Different sized nanocrystals are used to produce the different colors. A variety of pixel addressing systems can be used.

Weiss, Shimon; Schlamp, Michael C; Alivisatos, A. Paul

2014-02-11T23:59:59.000Z

458

Electronic displays using optically pumped luminescent semiconductor nanocrystals  

SciTech Connect (OSTI)

A multicolor electronic display is based on an array of luminescent semiconductor nanocrystals. Nanocrystals which emit tight of different colors are grouped into pixels. The nanocrystals are optically pumped to produce a multicolor display. Different sized nanocrystals are used to produce the different colors. A variety of pixel addressing systems can be used.

Weiss, Shimon; Schlam, Michael C; Alivisatos, A. Paul

2014-03-25T23:59:59.000Z

459

Optical absorption intensity of semiconductor single-wall carbon nanotubes  

E-Print Network [OSTI]

Optical absorption intensity of semiconductor single-wall carbon nanotubes Y. Oyama1 , R. Saito1. The optical absorption intensity is inversely proportional to the diameter in the unit of per carbon atom of single-wall carbon nanotubes (SWNT) synthesized by alcohol CCVD (ACCVD) method and HiPco method [1

Maruyama, Shigeo

460

Dielectric function of diluted magnetic semiconductors in the infrared regime  

E-Print Network [OSTI]

We present a study of the dielectric function of metallic (III,Mn)V diluted magnetic semiconductors in the infrared regime. Our theoretical approach is based on the kinetic exchange model for carrier induced (III,Mn)V ferromagnetism. The dielectric...

Aguado, R.; Lopez-Sancho, MP; Sinova, Jairo; Brey, L.

2004-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


461

Wide Bandgap Semiconductors for Power Electronics, Optoelectronics, and Advanced Communications  

E-Print Network [OSTI]

Wide Bandgap Semiconductors for Power Electronics, Optoelectronics, and Advanced Communications with material composition over a range of 0.7 to 5 eV. This factor allows them to be used for optoelectronic. Improvement in growth quality and doping of GaN is needed to improve the performance of optoelectronics

Li, Mo

462

Semiconductor Components Industries, LLC, 2004 July, 2004 -Rev. 13  

E-Print Network [OSTI]

© Semiconductor Components Industries, LLC, 2004 July, 2004 - Rev. 13 Publication Order Number: LM339/D 1 LM339, LM239, LM2901, LM2901V, NCV2901, MC3302 Single Supply Quad Comparators://onsemi.com TSSOP-14 DTB SUFFIX CASE 948G 1 14 #12;LM339, LM239, LM2901, LM2901V, NCV2901, MC3302 http

Ravikumar, B.

463

Electric-dipole-induced spin resonance in disordered semiconductors  

E-Print Network [OSTI]

ARTICLES Electric-dipole-induced spin resonance in disordered semiconductors MATHIAS DUCKHEIM One of the hallmarks of spintronics is the control of magnetic moments by electric fields enabled in such structures is electric-dipole-induced spin resonance (EDSR), where the radio-frequency fields driving

Loss, Daniel

464

(Electron transfer rates at semiconductor/liquid interfaces)  

SciTech Connect (OSTI)

Work has focused on several aspects of the fundamental chemistry and physics semiconductor/liquid junction behavior. These projects have been directed primarily towards GaAs/liquid contacts, because GaAs/liquid systems provide high energy conversion efficiencies and offer an opportunity to gain mechanistic understanding of the factors that are important to control in an efficient photoelectrochemical energy conversion system.

Lewis, N.S.

1992-01-01T23:59:59.000Z

465

[Electron transfer rates at semiconductor/liquid interfaces]. Progress report  

SciTech Connect (OSTI)

Work has focused on several aspects of the fundamental chemistry and physics semiconductor/liquid junction behavior. These projects have been directed primarily towards GaAs/liquid contacts, because GaAs/liquid systems provide high energy conversion efficiencies and offer an opportunity to gain mechanistic understanding of the factors that are important to control in an efficient photoelectrochemical energy conversion system.

Lewis, N.S.

1992-08-01T23:59:59.000Z

466

Infrared photothermal radiometry of deep subsurface defects in semiconductor materials  

E-Print Network [OSTI]

Infrared photothermal radiometry of deep subsurface defects in semiconductor materials M. E. Rodri-resistivity Si wafer with a mechanical damage on the backsurface, probed from the front intact surface that the position of the underlying damage is well resolved in both images, with the phase image showing

Mandelis, Andreas

467

CHARACTERISATION OF SEMICONDUCTOR OPTICAL AMPLIFIERS FOR ALL-OPTICAL REGENERATION  

E-Print Network [OSTI]

electrical pumping, broad spectral range and opportunities for integration and mass production. Among these components, the semiconductor optical amplifier (SOA) with gain saturation, low optical and electrical power Various SOAs from Alcatel-Thales III-V lab were characterized in the framework of the French project FUTUR

Paris-Sud XI, Université de

468

FLUID MECHANICS AND HEAT TRANSFER OF ELECTRON FLOW IN SEMICONDUCTORS  

E-Print Network [OSTI]

= heat, f = LO-mode, g = LO, h = LA-mode, i = negligible, j = remote heat sink 7/ 70 #12;Heat conductionFLUID MECHANICS AND HEAT TRANSFER OF ELECTRON FLOW IN SEMICONDUCTORS Mihir Sen Department · Shallow water analogy · Vorticity dynamics · Linear stability analysis · Numerical simulations of heat

Sen, Mihir

469

IntroductiontoPowerSuppliesAN-556 National Semiconductor  

E-Print Network [OSTI]

TL G 10061 IntroductiontoPowerSuppliesAN-556 National Semiconductor Application Note 556 Ralph E ripple voltage to capacitor C1 The bridge rectifier circuit has a simple transformer but current must in a full-wave bridge for the same input voltage TL G 10061­1 FIGURE 1 Idealized Power Supply TL G 10061

Paderborn, Universität

470

Coherent Control of Colloidal Semiconductor Nanocrystals R. Wilcken,  

E-Print Network [OSTI]

Hannover e.V., Semiconductor and Photovoltaics-Group, Hollerithallee 8, D-30419 Hannover, Germany ABSTRACT on different quantum systems. In the pertubative regime, interferences of multiple excitation pathways enable variations in transition energies because of the NCs size distribution into account are required

Kassel, Universität

471

Hydrogen in compound semiconductors M. D. McCluskeya)  

E-Print Network [OSTI]

Hydrogen in compound semiconductors M. D. McCluskeya) and N. M. Johnson Xerox Palo Alto Research Center, Palo Alto, California 94304 Received 9 October 1998; accepted 18 December 1998 Hydrogen can consequence of hydrogenation is the passivation of dopant impurities, which leads to a decrease

McCluskey, Matthew

472

Method for altering the luminescence of a semiconductor  

DOE Patents [OSTI]

A method is described for altering the luminescence of a light emitting semiconductor (LES) device. In particular, a method is described whereby a silicon LES device can be selectively irradiated with a radiation source effective for altering the intensity of luminescence of the irradiated region. 4 figs.

Barbour, J.C.; Dimos, D.B.

1999-01-12T23:59:59.000Z

473

Atomic scale studies of interface formation between oxides and III-V semiconductor surfaces  

E-Print Network [OSTI]

112 Figure 35. Reaction of IPA with InAs(0 0 1)-(4 × 2) vs.116 Figure 36. IPA dosing at 25 °C and annealing at 200 °C,121 vii STS measurements for IPA, H 2 O, HOOH on n- and p-

Clemens, Jonathon Boyd

2010-01-01T23:59:59.000Z

474

Synthesis, Characterization, and Ultrafast Dynamics of Metal, Metal Oxide, and Semiconductor Nanomaterials  

E-Print Network [OSTI]

electron storage, electrochromic, and photoelectrochromicV. Thin Solid Films Electrochromic and photoelectrochemical

Wheeler, Damon Andreas

2013-01-01T23:59:59.000Z

475

Synthesis, Characterization, and Ultrafast Dynamics of Metal, Metal Oxide, and Semiconductor Nanomaterials  

E-Print Network [OSTI]

purity hydrogen gas (Praxair). 5.3.3 Electron Microscopy (purity hydrogen gas (Praxair). 6.3.3 UV-Vis, Electron

Wheeler, Damon Andreas

2013-01-01T23:59:59.000Z

476

Synthesis, Characterization, and Ultrafast Dynamics of Metal, Metal Oxide, and Semiconductor Nanomaterials  

E-Print Network [OSTI]

cancer treatment, sensors, lasers, and solar cells. Onedetectors, solar energy conversion, sensors, and manydetectors, solar energy conversion, lasers, and sensors. A

Wheeler, Damon Andreas

2013-01-01T23:59:59.000Z

477

Synthesis, Characterization, and Ultrafast Dynamics of Metal, Metal Oxide, and Semiconductor Nanomaterials  

E-Print Network [OSTI]

S. R. ; Cowan, A. J. ; Barroso, M. ; Sivula, K. ; Ye, J. ;3861. (167) Pendlebury, S. R. ; Barroso, M. ; Cowan, A. J. ;+. (199) Pendlebury, S. ; Barroso, M. ; Cowan, A. ; Sivula,

Wheeler, Damon Andreas

2013-01-01T23:59:59.000Z

478

Semiconductor nanocrystal probes for biological applications and process for making and using such probes  

DOE Patents [OSTI]

A semiconductor nanocrystal compound and probe are described. The compound is capable of linking to one or more affinity molecules. The compound comprises (1) one or more semiconductor nanocrystals capable of, in response to exposure to a first energy, providing a second energy, and (2) one or more linking agents, having a first portion linked to the one or more semiconductor nanocrystals and a second portion capable of linking to one or more affinity molecules. One or more semiconductor nanocrystal compounds are linked to one or more affinity molecules to form a semiconductor nanocrystal probe capable of bonding with one or more detectable substances in a material being analyzed, and capable of, in response to exposure to a first energy, providing a second energy. Also described are processes for respectively: making the semiconductor nanocrystal compound; making the semiconductor nanocrystal probe; and treating materials with the probe.

Weiss, Shimon; Bruchez, Marcel; Alivisatos, Paul

2014-01-28T23:59:59.000Z

479

Semiconductor nanocrystal probes for biological applications and process for making and using such probes  

DOE Patents [OSTI]

A semiconductor nanocrystal compound and probe are described. The compound is capable of linking to one or more affinity molecules. The compound comprises (1) one or more semiconductor nanocrystals capable of, in response to exposure to a first energy, providing a second energy, and (2) one or more linking agents, having a first portion linked to the one or more semiconductor nanocrystals and a second portion capable of linking to one or more affinity molecules. One or more semiconductor nanocrystal compounds are linked to one or more affinity molecules to form a semiconductor nanocrystal probe capable of bonding with one or more detectable substances in a material being analyzed, and capable of, in response to exposure to a first energy, providing a second energy. Also described are processes for respectively: making the semiconductor nanocrystal compound; making the semiconductor nanocrystal probe; and treating materials with the probe.

Weiss, Shimon; Bruchez, Marcel; Alivisatos, Paul

2012-10-16T23:59:59.000Z

480

Visible Light Photocatalysis with Platinized Rutile TiO2 for Aqueous Organic Oxidation  

E-Print Network [OSTI]

chemicals containing different functional groups (formic acid, salicylic acid, 4-chlorophenol, 2,4,6-trichlorophenol, diethyl phosphoramidate) were selected for photooxidationtestswith 1/2 wt about 4% of the solar spectrum, the need to develop photocatalysts with smaller band gaps is paramount.6

Boolchand, Punit

Note: This page contains sample records for the topic "band-gap semiconductor oxide" from the National Library of EnergyBeta (NLEBeta).
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they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


481

Reduction of native oxides on InAs by atomic layer deposited Al{sub 2}O{sub 3} and HfO{sub 2}  

SciTech Connect (OSTI)

Thin high-{kappa} oxide films on InAs, formed by atomic layer deposition, are the key to achieve high-speed metal-oxide-semiconductor devices. We have studied the native oxide and the interface between InAs and 2 nm thick Al{sub 2}O{sub 3} or HfO{sub 2} layers using synchrotron x-ray photoemission spectroscopy. Both films lead to a strong oxide reduction, obtaining less than 10% of the native As-oxides and between 10% and 50% of the native In-oxides, depending on the deposition temperature. The ratio of native In- to As-oxides is determined to be 2:1. The exact composition and the influence of different oxidation states and suboxides is discussed in detail.

Timm, R.; Fian, A.; Hjort, M.; Thelander, C.; Lind, E.; Andersen, J. N.; Wernersson, L.-E.; Mikkelsen, A. [Department of Physics, Nanometer Structure Consortium, Lund University, P.O. Box 118, 22 100 Lund (Sweden)

2010-09-27T23:59:59.000Z

482

Photo-oxidation catalysts  

DOE Patents [OSTI]

Photo-oxidation catalysts and methods for cleaning a metal-based catalyst are disclosed. An exemplary catalyst system implementing a photo-oxidation catalyst may comprise a metal-based catalyst, and a photo-oxidation catalyst for cleaning the metal-based catalyst in the presence of light. The exposure to light enables the photo-oxidation catalyst to substantially oxidize absorbed contaminants and reduce accumulation of the contaminants on the metal-based catalyst. Applications are also disclosed.

Pitts, J. Roland (Lakewood, CO); Liu, Ping (Irvine, CA); Smith, R. Davis (Golden, CO)

2009-07-14T23:59:59.000Z

483

NiO-silica based nanostructured materials obtained by microemulsion assisted sol-gel procedure  

SciTech Connect (OSTI)

Graphical abstract: TEM micrograph of NiO/SiO{sub 2} nanoparticles. Highlights: {yields} Microemulsion assisted sol-gel procedure for NiO silica nanomaterials synthesis. {yields} Controlling the size and shape of nanoparticles and avoiding their aggregation. {yields} Narrow band-gap semiconductors (energies <3 eV) absorbing VIS or near-UV light biologically and chemically inert semiconductors entrapping/coating in silica network. {yields} Low cost as the microemulsion is firstly used in water metallic cation extraction. -- Abstract: NiO-silica based materials have been synthesized by microemulsion assisted sol-gel procedure. The versatility of these soft nanotechnology techniques has been exploited in order to obtain different types of nanostructures, such as NiO nanoparticles, NiO silica coated nanoparticles and NiO embedded in silica matrix. These materials have been characterized by adequate structural and morphology techniques: DLS, HR-TEM/SAED, BET, AFM. Optical and semiconducting properties (band-gap values) of the synthesized materials have been quantified by means of VIS-NIR diffuse reflectance spectra, thus demonstrating their applicative potential in various electron transfer phenomena such as photocatalysis, electrochromic thin films, solid oxide fuel cells.

Mihaly, M.; Comanescu, A.F. [University POLITEHNICA Bucharest, Faculty of Applied Chemistry and Materials Science, 1 Polizu, 011061 Bucharest (Romania)] [University POLITEHNICA Bucharest, Faculty of Applied Chemistry and Materials Science, 1 Polizu, 011061 Bucharest (Romania); Rogozea, A.E. [ILIE MURGULESCU Institute of Physical Chemistry of the Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania)] [ILIE MURGULESCU Institute of Physical Chemistry of the Romanian Academy, 202 Splaiul Independentei, 060021 Bucharest (Romania); Vasile, E. [METAV Research and Development, 31 C.A. Rosetti, 020011 Bucharest (Romania)] [METAV Research and Development, 31 C.A. Rosetti, 020011 Bucharest (Romania); Meghea, A., E-mail: a.meghea@gmail.com [University POLITEHNICA Bucharest, Faculty of Applied Chemistry and Materials Science, 1 Polizu, 011061 Bucharest (Romania)

2011-10-15T23:59:59.000Z

484

Alternative Gate Dielectrics on Semiconductors for MOSFET Device Applications  

SciTech Connect (OSTI)

We have investigated the synthesis and properties of deposited oxides on Si and Ge for use as alternative gate dielectrics in MOSFET applications. The capacitance and leakage current behavior of polycrystalline Y{sub 2}O{sub 3} films synthesized by pulsed-laser deposition is reported. In addition, we also discuss the growth of epitaxial oxide structures. In particular, we have investigated the use of silicide termination for oxide growth on (001) Si using laser-molecular beam epitaxy. In addition, we discuss a novel approach involving the use of hydrogen to eliminate native oxide during initial dielectric oxide nucleation on (001) Ge.

Norton, D.P.; Budai, J.D.; Chisholm, M.F.; Pennycook, S.J.; McKee, R.; Walker, F.; Lee, Y.; Park, C.

1999-12-06T23:59:59.000Z

485

Electrical spin injection in 2D semiconductors and topological insulators  

SciTech Connect (OSTI)

We have developed a theory of spin orientation by electric current in 2D semiconductors. It is shown that the spin depends on the relation between the energy and spin relaxation times and can vary by a factor of two for the limiting cases of fast and slow energy relaxation. For symmetrically-doped (110)-grown semiconductor quantum wells the effect of current-induced spin orientation is shown to exist due to random spatial variation of the Rashba spin-orbit splitting. We demonstrate that the spin depends strongly on the correlation length of this random spin-orbit field. We calculate the spin orientation degree in two-dimensional topological insulators. In high electric fields when the “streaming” regime is realized, the spin orientation degree weakly depends on the electric field and can reach values about 5%.

Golub, L. E.; Ivchenko, E. L. [Ioffe Physical-Technical Institute of the Russian Academy of Sciences, St. Petersburg (Russian Federation)

2013-12-04T23:59:59.000Z

486

Method of plasma etching Ga-based compound semiconductors  

DOE Patents [OSTI]

A method of plasma etching Ga-based compound semiconductors includes providing a process chamber and a source electrode adjacent to the process chamber. The process chamber contains a sample comprising a Ga-based compound semiconductor. The sample is in contact with a platen which is electrically connected to a first power supply, and the source electrode is electrically connected to a second power supply. The method includes flowing SiCl.sub.4 gas into the chamber, flowing Ar gas into the chamber, and flowing H.sub.2 gas into the chamber. RF power is supplied independently to the source electrode and the platen. A plasma is generated based on the gases in the process chamber, and regions of a surface of the sample adjacent to one or more masked portions of the surface are etched to create a substantially smooth etched surface including features having substantially vertical walls beneath the masked portions.

Qiu, Weibin; Goddard, Lynford L.

2012-12-25T23:59:59.000Z

487

Semiconductor Nanocrystals-Based White Light Emitting Diodes  

SciTech Connect (OSTI)

In response to the demands for energy and the concerns of global warming and climate change, energy efficient and environmentally friendly solid state lighting, such as white light emitting diodes (WLEDs), is considered to be the most promising and suitable light source. Because of their small size, high efficiency, and long lifetime, WLEDs based on colloidal semiconductor nanocrystals (or quantum dots) are emerging as a completely new technology platform for the development of flat-panel displays and solid state lighting, exhibiting the potential to replace the conventionally used incandescent and fluorescent lamps. This replacement could cut the ever-increasing energy consumption, solve the problem of rapidly depleting fossil fuel reserves, and improve the quality of the global environment. In this review, we highlight the recent progress in semiconductor nanocrystals-based WLEDs, compare different approaches for generating white light, and discuss the benefits and challenges of the solid state lighting technology.

Dai, Quanqin [ORNL; Hu, Michael Z. [ORNL; Duty, Chad E [ORNL

2010-01-01T23:59:59.000Z

488

Semiconductor-Nanocrystals-Based White Light-Emitting Diodes  

SciTech Connect (OSTI)

In response to the demands for energy and the concerns of global warming and climate change, energy efficient and environmentally friendly solid-state lighting, such as white lightemitting diodes (WLEDs), is considered to be the most promising and suitable light source. Because of their small size, high efficiency, and long lifetime, WLEDs based on colloidal semiconductor nanocrystals (or quantum dots) are emerging as a completely new technology platform for the development of flat-panel displays and solid-state lighting, exhibiting the potential to replace the conventionally used incandescent and fluorescent lamps. This replacement can cut the ever-increasing level of energy consumption, solve the problem of rapidly depleting fossil fuel reserves, and improve the quality of the global environment. In this review, the recent progress in semiconductor-nanocrystals-based WLEDs is highlighted, the different approaches for generating white light are compared, and the benefits and challenges of the solid-state lighting technology are discussed.

Dai, Quanqin [ORNL; Duty, Chad E [ORNL; Hu, Michael Z. [ORNL

2010-01-01T23:59:59.000Z

489

Neutron detection using boron gallium nitride semiconductor material  

SciTech Connect (OSTI)

In this study, we developed a new neutron-detection device using a boron gallium nitride (BGaN) semiconductor in which the B atom acts as a neutron converter. BGaN and gallium nitride (GaN) samples were grown by metal organic vapor phase epitaxy, and their radiation detection properties were evaluated. GaN exhibited good sensitivity to ?-rays but poor sensitivity to ?-rays. Moreover, we confirmed that electrons were generated in the depletion layer under neutron irradiation. This resulted in a neutron-detection signal after ?-rays were generated by the capture of neutrons by the B atoms. These results prove that BGaN is useful as a neutron-detecting semiconductor material.

Atsumi, Katsuhiro [Department of Electrical and Electronic Engineering, Graduate School of Engineering, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561 (Japan); Inoue, Yoku; Nakano, Takayuki, E-mail: ttnakan@ipc.shizuoka.ac.jp [Department of Electrical and Materials Science, Graduate School of Engineering, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561 (Japan); Mimura, Hidenori; Aoki, Toru [Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011 (Japan)

2014-03-01T23:59:59.000Z

490

Method for mapping charge pulses in semiconductor radiation detectors  

SciTech Connect (OSTI)

An efficient method for determining the distribution of charge pulses produced by semiconductor detectors is presented. The method is based on a quasi-steady-state model for semiconductor detector operation. A complete description of the model and underlying assumptions is given. Mapping of charge pulses is accomplished by solving an adjoint carrier continuity equation. The solution of the adjoint equation yields Green`s function, a time- and position-dependent map that contains all possible charge pulses that can be produced by the detector for charge generated at discrete locations (e.g., by gamma-ray interactions). Because the map is generated by solving a single, time-dependent problem, the potential for reduction in computational effort over direct mapping methods is significant, particularly for detectors with complex electrode structures. In this paper, the adjoint equation is derived and the mapping method is illustrated for a simple case.

Prettyman, T.H.

1998-12-01T23:59:59.000Z

491

Method of plasma etching GA-based compound semiconductors  

DOE Patents [OSTI]

A method of plasma etching Ga-based compound semiconductors includes providing a process chamber and a source electrode adjacent thereto. The chamber contains a Ga-based compound semiconductor sample in contact with a platen which is electrically connected to a first power supply, and the source electrode is electrically connected to a second power supply. SiCl.sub.4 and Ar gases are flowed into the chamber. RF power is supplied to the platen at a first power level, and RF power is supplied to the source electrode. A plasma is generated. Then, RF power is supplied to the platen at a second power level lower than the first power level and no greater than about 30 W. Regions of a surface of the sample adjacent to one or more masked portions of the surface are etched at a rate of no more than about 25 nm/min to create a substantially smooth etched surface.

Qiu, Weibin; Goddard, Lynford L.

2013-01-01T23:59:59.000Z

492

Semiconductor light source with electrically tunable emission wavelength  

DOE Patents [OSTI]

A semiconductor light source comprises a substrate, lower and upper claddings, a waveguide region with imbedded active area, and electrical contacts to provide voltage necessary for the wavelength tuning. The active region includes single or several heterojunction periods sandwiched between charge accumulation layers. Each of the active region periods comprises higher and lower affinity semiconductor layers with type-II band alignment. The charge carrier accumulation in the charge accumulation layers results in electric field build-up and leads to the formation of generally triangular electron and hole potential wells in the higher and lower affinity layers. Nonequillibrium carriers can be created in the active region by means of electrical injection or optical pumping. The ground state energy in the triangular wells and the radiation wavelength can be tuned by changing the voltage drop across the active region.

Belenky, Gregory (Port Jefferson, NY); Bruno, John D. (Bowie, MD); Kisin, Mikhail V. (Centereach, NY); Luryi, Serge (Setauket, NY); Shterengas, Leon (Centereach, NY); Suchalkin, Sergey (Centereach, NY); Tober, Richard L. (Elkridge, MD)

2011-01-25T23:59:59.000Z

493

Oxidation of propylene over copper oxide catalysts  

E-Print Network [OSTI]

work on other phases of this project concerning cata- lytic oxidation of hydrocarbons has been described by Sanderson (59), Looney (34), Burns (11), Dunlop (17), Woodham (71), and Perkins (49). The early work of Sanderson indicated that chromia-alumina... and pro- moted chromia?alumina agents possessed the ability to catalyze the oxidation of propane by air. Subsequent work of Looney suggested that propylene was a primary product of this oxidation; hence most investigations since then have been confined...

Billingsley, David Stuart

1958-01-01T23:59:59.000Z

494

Method for measuring the drift mobility in doped semiconductors  

DOE Patents [OSTI]

A method for measuring the drift mobility of majority carriers in semiconductors consists of measuring the current transient in a Schottky-barrier device following the termination of a forward bias pulse. An example is given using an amorphous silicon hydrogenated material doped with 0.2% phosphorous. The method is particularly useful with material in which the dielectric relaxation time is shorter than the carrier transit time. It is particularly useful in material useful in solar cells.

Crandall, Richard S. (Princeton, NJ)

1982-01-01T23:59:59.000Z

495

Method for measuring the drift mobility in doped semiconductors  

DOE Patents [OSTI]

A method for measuring the drift mobility of majority carriers in semiconductors consists of measuring the current transient in a Schottky-barrier device following the termination of a forward bias pulse. An example is given using an amorphous silicon hydrogenated material doped with 0.2% phosphorus. The method is particularly useful with material in which the dielectric relaxation time is shorter than the carrier transit time. It is particularly useful in material useful in solar cells. 10 figs.

Crandall, R.S.

1982-03-09T23:59:59.000Z

496

Observation of the photodielectric effect in an amorphous semiconductor  

E-Print Network [OSTI]

OBSERVATION OF THE PHOTODIELECTRIC EFFECT IN AN AHGRPBGUS SFNICONDUCTOR A THESIS by STEPHEN ANTHONY COLLINS Subqitted tu the Graduate College of Texas A&M University iu Partial fulfillment of. the requirement for the. degree of 1IASTER OI...' SCIFNCE August 1971 Hajcr Suhjec '. Fleqtricel magic. earing OBSERVATION OF THE PHOTODIELECTRIC EFFECT IN AN AMORPHOUS SEMICONDUCTOR A THESIS by STEPHEN ANTHONY COLLINS Approved as to style and content by: (Chairman of Committee) (Head of epartm...

Collins, Stephen Anthony

1971-01-01T23:59:59.000Z

497

BNCP prototype detonator studies using a semiconductor bridge initiator  

SciTech Connect (OSTI)

We report on experiments with prototype BNCP detonators incorporating a semiconductor bridge, SCB. We tested two device designs; one for DoD and one for DOE applications. We report tests with the DoD detonator using different firing conditions and two different grain sizes of BNCP. The DOE detonator utilized a 50 {mu}F CDU firing set with a 24 V all-fire condition.

Fyfe, D.W.; Fronabarger, J.W. [Pacific Scientific Co., Avondale-Goodyear, AZ (United States). Energy Dynamics Div.; Bickes, R.W. Jr. [Sandia National Labs., Albuquerque, NM (United States)

1994-06-01T23:59:59.000Z

498

Semiconductor-based, large-area, flexible, electronic devices  

SciTech Connect (OSTI)

Novel articles and methods to fabricate the same resulting in flexible, large-area, triaxially textured, single-crystal or single-crystal-like, semiconductor-based, electronic devices are disclosed. Potential applications of resulting articles are in areas of photovoltaic devices, flat-panel displays, thermophotovoltaic devices, ferroelectric devices, light emitting diode devices, computer hard disc drive devices, magnetoresistance based devices, photoluminescence based devices, non-volatile memory devices, dielectric devices, thermoelectric devices and quantum dot laser devices.

Goyal, Amit (Knoxville, TN)

2011-03-15T23:59:59.000Z

499

Ramgraber Semiconductor Equipment GmbH | Open Energy Information  

Open Energy Info (EERE)

AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page on Google Bookmark EERE: Alternative Fuels Data CenterFranconia, Virginia:FAQ < RAPID Jump to: navigation, search RAPIDColoradosource HistoryRaft River0422°Ramgraber Semiconductor

500

Cerium Oxide Coating for Oxidation Reduction  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Award In order to produce power more efficiently and cleanly, the next generation of power plant boilers, turbines, solid oxide fuel cells (SOFCs) and other essential...