National Library of Energy BETA

Sample records for arc plasma deposition

  1. Cathodic Arc Plasma Deposition

    Office of Scientific and Technical Information (OSTI)

    ... 1990. 3 H. C. Miller, "A review of anode phenomena in vacuum arcs," IEEE Trans. ... pp. 49-55, 1877. 7 R. L. Boxman, "Early history of vacuum arc deposition," IEEE Trans. ...

  2. Formation of carbon deposits from coal in an arc plasma

    SciTech Connect (OSTI)

    Wang, B.; Tian, Y.; Zhang, Y.; Zhu, S.; Lu, Y.; Zhang, Y.; Xie, K.

    2007-07-01

    The issue of deposited carbon (DC) on a reactor wall during the production of acetylene by the coal/arc plasma process is a potential obstacle for the industrialization process. The formation mechanism of DC is very difficult to reveal because the high complexity of coal and the volatile matter. Combining with quenching technique, the methane, liquid petroleum gas and benzene were employed as the model materials to roughly act as the light gas, chain and aromatic subcomponents of volatile matter, and then the reasonable formation mechanism of DC was subtly speculated accordingly.

  3. Contamination due to memory effects in filtered vacuum arc plasma deposition systems

    SciTech Connect (OSTI)

    Martins, D.R.; Salvadori, M.C.; Verdonck, P.; Brown, I.G.

    2002-08-13

    Thin film synthesis by filtered vacuum arc plasma deposition is a widely used technique with a number of important emerging technological applications. A characteristic feature of the method is that during the deposition process not only is the substrate coated by the plasma, but the plasma gun itself and the magnetic field coil and/or vacuum vessel section constituting the macroparticle filter are also coated to some extent. If then the plasma gun cathode is changed to a new element, there can be a contamination of the subsequent film deposition by sputtering from various parts of the system of the previous coating species. We have experimentally explored this effect and compared our results with theoretical estimates of sputtering from the SRIM (Stopping and Range of Ions in Matter) code. We find film contamination of order 10-4 - 10-3, and the memory of the prior history of the deposition hardware can be relatively long-lasting.

  4. Solid oxide fuel cell processing using plasma arc spray deposition techniques. Final report

    SciTech Connect (OSTI)

    Ray, E.R.; Spengler, C.J.; Herman, H.

    1991-07-01

    The Westinghouse Electric Corporation, in conjunction with the Thermal Spray Laboratory of the State University of New York, Stony Brook, investigated the fabrication of a gas-tight interconnect layer on a tubular solid oxide fuel cell with plasma arc spray deposition. The principal objective was to determine the process variables for the plasma spray deposition of an interconnect with adequate electrical conductivity and other desired properties. Plasma arc spray deposition is a process where the coating material in powder form is heated to or above its melting temperature, while being accelerated by a carrier gas stream through a high power electric arc. The molten powder particles are directed at the substrate, and on impact, form a coating consisting of many layers of overlapping, thin, lenticular particles or splats. The variables investigated were gun power, spray distance, powder feed rate, plasma gas flow rates, number of gun passes, powder size distribution, injection angle of powder into the plasma plume, vacuum or atmospheric plasma spraying, and substrate heating. Typically, coatings produced by both systems showed bands of lanthanum rich material and cracking with the coating. Preheating the substrate reduced but did not eliminate internal coating cracking. A uniformly thick, dense, adherent interconnect of the desired chemistry was finally achieved with sufficient gas- tightness to allow fabrication of cells and samples for measurement of physical and electrical properties. A cell was tested successfully at 1000{degree}C for over 1,000 hours demonstrating the mechanical, electrical, and chemical stability of a plasma-arc sprayed interconnect layer.

  5. Solid oxide fuel cell processing using plasma arc spray deposition techniques

    SciTech Connect (OSTI)

    Ray, E.R.; Spengler, C.J.; Herman, H.

    1991-07-01

    The Westinghouse Electric Corporation, in conjunction with the Thermal Spray Laboratory of the State University of New York, Stony Brook, investigated the fabrication of a gas-tight interconnect layer on a tubular solid oxide fuel cell with plasma arc spray deposition. The principal objective was to determine the process variables for the plasma spray deposition of an interconnect with adequate electrical conductivity and other desired properties. Plasma arc spray deposition is a process where the coating material in powder form is heated to or above its melting temperature, while being accelerated by a carrier gas stream through a high power electric arc. The molten powder particles are directed at the substrate, and on impact, form a coating consisting of many layers of overlapping, thin, lenticular particles or splats. The variables investigated were gun power, spray distance, powder feed rate, plasma gas flow rates, number of gun passes, powder size distribution, injection angle of powder into the plasma plume, vacuum or atmospheric plasma spraying, and substrate heating. Typically, coatings produced by both systems showed bands of lanthanum rich material and cracking with the coating. Preheating the substrate reduced but did not eliminate internal coating cracking. A uniformly thick, dense, adherent interconnect of the desired chemistry was finally achieved with sufficient gas- tightness to allow fabrication of cells and samples for measurement of physical and electrical properties. A cell was tested successfully at 1000{degree}C for over 1,000 hours demonstrating the mechanical, electrical, and chemical stability of a plasma-arc sprayed interconnect layer.

  6. Graphene layer growth on silicon substrates with nickel film by pulse arc plasma deposition

    SciTech Connect (OSTI)

    Fujita, K.; Banno, K.; Aryal, H. R.; Egawa, T.

    2012-10-15

    Carbon layer has been grown on a Ni/SiO{sub 2}/Si(111) substrate under high vacuum pressure by pulse arc plasma deposition. From the results of Raman spectroscopy for the sample, it is found that graphene was formed by ex-situ annealing of sample grown at room temperature. Furthermore, for the sample grown at high temperature, graphene formation was shown and optimum temperature was around 1000 Degree-Sign C. Transmission electron microscopy observation of the sample suggests that the graphene was grown from step site caused by grain of Ni film. The results show that the pulse arc plasma technique has the possibility for acquiring homogenous graphene layer with controlled layer thickness.

  7. Passivation layer on polyimide deposited by combined plasma immersion ion implantation and deposition and cathodic vacuum arc technique

    SciTech Connect (OSTI)

    Han, Z. J.; Tay, B. K.; Sze, J. Y.; Ha, P. C. T.

    2007-05-15

    A thin passivation layer of aluminum oxide was deposited on polyimide by using the combined plasma immersion ion implantation and deposition (PIII and D) and cathodic vacuum arc technique. X-ray photoelectron spectroscopy C 1s spectra showed that the carbonyl bond (C=O) and ether group (C-O-C and C-N-C) presented in pristine polyimide were damaged by implantation of aluminum ions and deposition of an aluminum oxide passivation layer. O 1s and Al 2p spectra confirmed the formation of a thin aluminum oxide passivation layer. This passivation layer can be implemented in aerospace engineering where polyimide may suffer degradation from fast atomic oxygen in the low-earth-orbit environment. To test the protection of this passivation layer to energetic oxygen ions, a plasma-enhanced chemical vapor deposition system was used to simulate the oxygen-ion irradiation, and the results showed that a higher weight occurred for passivated samples compared to pristine ones. X-ray diffraction showed that Al peaks were presented on the surface region, but no aluminum oxide peak was detected. The authors then concluded that Al clusters were formed in polyimide besides aluminum oxide, which was in an x-ray amorphous state. Furthermore, contact-angle measurements showed a reduced contact angle for passivated polyimide from a pristine value of 78 deg. to 20 deg. by using deionized water. Several discussions have been made on the surface chemical and structural property changes by using the combined PIII and D and cathodic vacuum arc technique.

  8. Arc initiation in cathodic arc plasma sources

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA)

    2002-01-01

    A "triggerless" arc initiation method and apparatus is based on simply switching the arc supply voltage to the electrodes (anode and cathode). Neither a mechanical trigger electrode nor a high voltage flashover from a trigger electrode is required. A conducting path between the anode and cathode is provided, which allows a hot spot to form at a location where the path connects to the cathode. While the conductive path is eroded by the cathode spot action, plasma deposition ensures the ongoing repair of the conducting path. Arc initiation is achieved by simply applying the relatively low voltage of the arc power supply, e.g. 500 V-1 kV, with the insulator between the anode and cathode coated with a conducting layer and the current at the layer-cathode interface concentrated at one or a few contact points. The local power density at these contact points is sufficient for plasma production and thus arc initiation. A conductive surface layer, such as graphite or the material being deposited, is formed on the surface of the insulator which separates the cathode from the anode. The mechanism of plasma production (and arc initiation) is based on explosive destruction of the layer-cathode interface caused by joule heating. The current flow between the thin insulator coating and cathode occurs at only a few contact points so the current density is high.

  9. Fabrication of layered self-standing diamond film by dc arc plasma jet chemical vapor deposition

    SciTech Connect (OSTI)

    Chen, G. C.; Dai, F. W.; Li, B.; Lan, H.; Askari, J.; Tang, W. Z.; Lu, F. X.

    2007-01-15

    Layered self-standing diamond films, consisting of an upper layer, buffer layer, and a lower layer, were fabricated by fluctuating the ratio of methane to hydrogen in high power dc arc plasma jet chemical vapor deposition. There were micrometer-sized columnar diamond crystalline grains in both upper layer and lower layer. The size of the columnar diamond crystalline grains was bigger in the upper layer than that in the lower layer. The orientation of the upper layer was (110), while it was (111) for the lower layer. Raman results showed that no sp{sup 3} peak shift was found in the upper layer, but it was found and blueshifted in the lower layer. This indicated that the internal stress within the film body could be tailored by this layered structure. The buffer layer with nanometer-sized diamond grains formed by secondary nucleation was necessary in order to form the layered film. Growth rate was over 10 {mu}m/h in layered self-standing diamond film fabrication.

  10. Filters for cathodic arc plasmas

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA); MacGill, Robert A. (Richmond, CA); Bilek, Marcela M. M. (Engadine, AU); Brown, Ian G. (Berkeley, CA)

    2002-01-01

    Cathodic arc plasmas are contaminated with macroparticles. A variety of magnetic plasma filters has been used with various success in removing the macroparticles from the plasma. An open-architecture, bent solenoid filter, with additional field coils at the filter entrance and exit, improves macroparticle filtering. In particular, a double-bent filter that is twisted out of plane forms a very compact and efficient filter. The coil turns further have a flat cross-section to promote macroparticle reflection out of the filter volume. An output conditioning system formed of an expander coil, a straightener coil, and a homogenizer, may be used with the magnetic filter for expanding the filtered plasma beam to cover a larger area of the target. A cathodic arc plasma deposition system using this filter can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

  11. Miniaturized cathodic arc plasma source

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA); MacGill, Robert A. (Richmond, CA)

    2003-04-15

    A cathodic arc plasma source has an anode formed of a plurality of spaced baffles which extend beyond the active cathode surface of the cathode. With the open baffle structure of the anode, most macroparticles pass through the gaps between the baffles and reflect off the baffles out of the plasma stream that enters a filter. Thus the anode not only has an electrical function but serves as a prefilter. The cathode has a small diameter, e.g. a rod of about 1/4 inch (6.25 mm) diameter. Thus the plasma source output is well localized, even with cathode spot movement which is limited in area, so that it effectively couples into a miniaturized filter. With a small area cathode, the material eroded from the cathode needs to be replaced to maintain plasma production. Therefore, the source includes a cathode advancement or feed mechanism coupled to cathode rod. The cathode also requires a cooling mechanism. The movable cathode rod is housed in a cooled metal shield or tube which serves as both a current conductor, thus reducing ohmic heat produced in the cathode, and as the heat sink for heat generated at or near the cathode. Cooling of the cathode housing tube is done by contact with coolant at a place remote from the active cathode surface. The source is operated in pulsed mode at relatively high currents, about 1 kA. The high arc current can also be used to operate the magnetic filter. A cathodic arc plasma deposition system using this source can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

  12. Filtered cathodic arc deposition apparatus and method

    DOE Patents [OSTI]

    Krauss, Alan R. (24461 W. Blvd. De John, Naperville, IL 60564)

    1999-01-01

    A filtered cathodic arc deposition method and apparatus for the production of highly dense, wear resistant coatings which are free from macro particles. The filtered cathodic arc deposition apparatus includes a cross shaped vacuum chamber which houses a cathode target having an evaporable surface comprised of the coating material, means for generating a stream of plasma, means for generating a transverse magnetic field, and a macro particle deflector. The transverse magnetic field bends the generated stream of plasma in the direction of a substrate. Macro particles are effectively filtered from the stream of plasma by traveling, unaffected by the transverse magnetic field, along the initial path of the plasma stream to a macro particle deflector. The macro particle deflector has a preformed surface which deflects macro particles away from the substrate.

  13. Electrical properties of a-C:Mo films produced by dual-cathode filtered cathodic arc plasma deposition

    SciTech Connect (OSTI)

    Sansongsiri, Sakon; Anders, Andre; Yodsombat, Banchob

    2008-01-20

    Molybdenum-containing amorphous carbon (a-C:Mo) thin films were prepared using a dual-cathode filtered cathodic arc plasma source with a molybdenum and a carbon (graphite) cathode. The Mo content in the films was controlled by varying the deposition pulse ratio of Mo and C. Film sheet resistance was measured in situ at process temperature, which was close to room temperature, as well as ex situ as a function of temperature (300-515 K) in ambient air. Film resistivity and electrical activation energy were derived for different Mo and C ratios and substrate bias. Film thickness was in the range 8-28 nm. Film resistivity varied from 3.55x10-4 Omega m to 2.27x10-6 Omega m when the Mo/C pulse ratio was increased from 0.05 to 0.4, with no substrate bias applied. With carbon-selective bias, the film resistivity was in the range of 4.59x10-2 and 4.05 Omega m at a Mo/C pulse ratio of 0.05. The electrical activation energy decreased from 3.80x10-2 to 3.36x10-4 eV when the Mo/C pulse ratio was increased in the absence of bias, and from 0.19 to 0.14 eV for carbon-selective bias conditions. The resistivity of the film shifts systematically with the amounts of Mo and upon application of substrate bias voltage. The intensity ratio of the Raman D-peak and G-peak (ID/IG) correlated with the pre-exponential factor (sigma 0) which included charge carrier density and density of states.

  14. Purification of tantalum by plasma arc melting

    DOE Patents [OSTI]

    Dunn, Paul S. (Santa Fe, NM); Korzekwa, Deniece R. (Los Alamos, NM)

    1999-01-01

    Purification of tantalum by plasma arc melting. The level of oxygen and carbon impurities in tantalum was reduced by plasma arc melting the tantalum using a flowing plasma gas generated from a gas mixture of helium and hydrogen. The flowing plasma gases of the present invention were found to be superior to other known flowing plasma gases used for this purpose.

  15. Apparatus for gas-metal arc deposition

    DOE Patents [OSTI]

    Buhrmaster, Carol L. (Corning, NY); Clark, Denis E. (Idaho Falls, ID); Smartt, Herschel B. (Idaho Falls, ID)

    1991-01-01

    Apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment with the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspenion of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite.

  16. Method for gas-metal arc deposition

    DOE Patents [OSTI]

    Buhrmaster, Carol L. (Corning, NY); Clark, Denis E. (Idaho Falls, ID); Smartt, Herschel B. (Idaho Falls, ID)

    1990-01-01

    Method and apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment wiht the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspension of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite.

  17. Method for gas-metal arc deposition

    DOE Patents [OSTI]

    Buhrmaster, C.L.; Clark, D.E.; Smartt, H.B.

    1990-11-13

    Method and apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites are disclosed. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment with the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspension of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite. 1 fig.

  18. Plasma arc torch with coaxial wire feed

    DOE Patents [OSTI]

    Hooper, Frederick M (Albuquerque, NM)

    2002-01-01

    A plasma arc welding apparatus having a coaxial wire feed. The apparatus includes a plasma arc welding torch, a wire guide disposed coaxially inside of the plasma arc welding torch, and a hollow non-consumable electrode. The coaxial wire guide feeds non-electrified filler wire through the tip of the hollow non-consumable electrode during plasma arc welding. Non-electrified filler wires as small as 0.010 inches can be used. This invention allows precision control of the positioning and feeding of the filler wire during plasma arc welding. Since the non-electrified filler wire is fed coaxially through the center of the plasma arc torch's electrode and nozzle, the wire is automatically aimed at the optimum point in the weld zone. Therefore, there is no need for additional equipment to position and feed the filler wire from the side before or during welding.

  19. Shunting arc plasma source for pure carbon ion beam

    SciTech Connect (OSTI)

    Koguchi, H.; Sakakita, H.; Kiyama, S.; Shimada, T.; Sato, Y.; Hirano, Y.

    2012-02-15

    A plasma source is developed using a coaxial shunting arc plasma gun to extract a pure carbon ion beam. The pure carbon ion beam is a new type of deposition system for diamond and other carbon materials. Our plasma device generates pure carbon plasma from solid-state carbon material without using a hydrocarbon gas such as methane gas, and the plasma does not contain any hydrogen. The ion saturation current of the discharge measured by a double probe is about 0.2 mA/mm{sup 2} at the peak of the pulse.

  20. ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

    SciTech Connect (OSTI)

    Purandare, Yashodhan Ehiasarian, Arutiun; Hovsepian, Papken; Santana, Antonio

    2014-05-15

    Zirconium nitride (ZrN) coatings were deposited on 1??m finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5??m with hardness in the range of 30–40?GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

  1. Characteristic of a triple-cathode vacuum arc plasma source

    SciTech Connect (OSTI)

    Xiang, W.; Li, M.; Chen, L.

    2012-02-15

    In order to generate a better ion beam, a triple-cathode vacuum arc plasma source has been developed. Three plasma generators in the vacuum arc plasma source are equally located on a circle. Each generator initiated by means of a high-voltage breakdown between the cathode and the anode could be operated separately or simultaneously. The arc plasma expands from the cathode spot region in vacuum. In order to study the behaviors of expanding plasma plume generated in the vacuum arc plasma source, a Langmuir probe array is employed to measure the saturated ion current of the vacuum arc plasma source. The time-dependence profiles of the saturated current density of the triple vacuum arc plasma source operated separately and simultaneously are given. Furthermore, the plasma characteristic of this vacuum arc plasma source is also presented in the paper.

  2. Entropy in an Arc Plasma Source

    SciTech Connect (OSTI)

    Kaminska, A.; Dudeck, M

    2008-03-19

    The entropy properties in a D.C. argon arc plasma source are studied. The local thermodynamical entropy relations are established for a set of uniform sub-systems (Ar, Ar{sup +}, e) in order to deduce the entropy balance equation in presence of dissipative effects and in the case of a thermal non equilibrium. Phenomenological linear laws are deduced in near equilibrium situation. The flow parameters inside the plasma source are calculated by a Navier-Stokes fluid description taking into account a thermal local non equilibrium. The entropy function is calculated in the plasma source using the values of the local variables obtained from the numerical code.

  3. Cathodic Vacuum Arc Plasma of Thallium

    SciTech Connect (OSTI)

    Yushkov, Georgy Yu.; Anders, Andre

    2006-10-02

    Thallium arc plasma was investigated in a vacuum arc ionsource. As expected from previous consideration of cathode materials inthe Periodic Table of the Elements, thallium plasma shows lead-likebehavior. Its mean ion charge state exceeds 2.0 immediately after arctriggering, reaches the predicted 1.60 and 1.45 after about 100 microsecand 150 microsec, respectively. The most likely ion velocity is initially8000 m/s and decays to 6500 m/s and 6200 m/s after 100 microsec and 150microsec, respectively. Both ion charge states and ion velocities decayfurther towards steady state values, which are not reached within the 300microsec pulses used here. It is argued that the exceptionally high vaporpressure and charge exchange reactions are associated with theestablishment of steady state ion values.

  4. Direct-current cathodic vacuum arc system with magnetic-field mechanism for plasma stabilization

    SciTech Connect (OSTI)

    Zhang, H.-S.; Komvopoulos, K.

    2008-07-15

    Filtered cathodic vacuum arc (FCVA) deposition is characterized by plasma beam directionality, plasma energy adjustment via substrate biasing, macroparticle filtering, and independent substrate temperature control. Between the two modes of FCVA deposition, namely, direct current (dc) and pulsed arc, the dc mode yields higher deposition rates than the pulsed mode. However, maintaining the dc arc discharge is challenging because of its inherent plasma instabilities. A system generating a special configuration of magnetic field that stabilizes the dc arc discharge during film deposition is presented. This magnetic field is also part of the out-of-plane magnetic filter used to focus the plasma beam and prevent macroparticle film contamination. The efficiency of the plasma-stabilizing magnetic-field mechanism is demonstrated by the deposition of amorphous carbon (a-C) films exhibiting significantly high hardness and tetrahedral carbon hybridization (sp{sup 3}) contents higher than 70%. Such high-quality films cannot be produced by dc arc deposition without the plasma-stabilizing mechanism presented in this study.

  5. Three-dimensional modeling of the plasma arc in arc welding

    SciTech Connect (OSTI)

    Xu, G.; Tsai, H. L.; Hu, J.

    2008-11-15

    Most previous three-dimensional modeling on gas tungsten arc welding (GTAW) and gas metal arc welding (GMAW) focuses on the weld pool dynamics and assumes the two-dimensional axisymmetric Gaussian distributions for plasma arc pressure and heat flux. In this article, a three-dimensional plasma arc model is developed, and the distributions of velocity, pressure, temperature, current density, and magnetic field of the plasma arc are calculated by solving the conservation equations of mass, momentum, and energy, as well as part of the Maxwell's equations. This three-dimensional model can be used to study the nonaxisymmetric plasma arc caused by external perturbations such as an external magnetic field. It also provides more accurate boundary conditions when modeling the weld pool dynamics. The present work lays a foundation for true three-dimensional comprehensive modeling of GTAW and GMAW including the plasma arc, weld pool, and/or electrode.

  6. Plasma chemistry fluctuations in a reactive arc plasma in the presence of magnetic fields

    SciTech Connect (OSTI)

    Rosen, J.; Anders, A.; Schneider, J.M.

    2002-01-13

    The effect of a magnetic field on the plasma chemistry and pulse-to-pulse fluctuations of cathodic arc ion charge state distributions in a reactive environment were investigated. The plasma composition was measured by time-of-flight charge-to-mass spectrometry. The fluctuation of the concentrations of Al+, Al2+ and Al3+ was found to increase with an increasing magnetic field strength. We suggest that this is caused by magnetic field dependent fluctuations of the energy input into cathode spots as seen through fluctuations of the cathode potential. These results are qualitatively consistent with the model of partial local Saha equilibrium and are of fundamental importance for the evolution of the structure of films deposited by reactive cathodic arc deposition.

  7. Applicability of moire deflection tomography for diagnosing arc plasmas

    SciTech Connect (OSTI)

    Chen Yunyun; Song Yang; He Anzhi; Li Zhenhua

    2009-01-20

    The argon arc plasma whose central temperature, 1.90x10{sup 4} K, is used as a practical example for an experiment to research the applicability of moire deflection tomography in arc plasma flow-field diagnosis. The experimental result indicates that moire deflection of the measured argon arc plasma is very small, even smaller than that of a common flame with the maximal temperature of nearly 1.80x10{sup 3} K. The refractive-index gradient in moire deflection tomography mainly contributes to the temperature gradient in essence when the probe wavelength and pressure are certain in plasma diagnosis. The applicable temperature ranges of moire deflection tomography in the argon arc plasma diagnosis are given with the probe wavelength 532 nm at 1 atm in certain measuring error requirements. In a word, the applicable temperature range of moire deflection tomography for arc plasma diagnosis is intimately related to the probe wavelength and the practical measuring requirements.

  8. Mechanism of carbon nanostructure synthesis in arc plasma

    SciTech Connect (OSTI)

    Keidar, M.; Shashurin, A.; Volotskova, O.; Raitses, Y.; Beilis, I. I.

    2010-05-15

    Plasma enhanced techniques are widely used for synthesis of carbon nanostructures. The primary focus of this paper is to summarize recent experimental and theoretical advances in understanding of single-wall carbon nanotube (SWNT) synthesis mechanism in arcs, and to describe methods of controlling arc plasma parameters. Fundamental issues related to synthesis of SWNTs, which is a relationship between plasma parameters and SWNT characteristics are considered. It is shown that characteristics of synthesized SWNTs can be altered by varying plasma parameters. Effects of electrical and magnetic fields applied during SWNT synthesis in arc plasma are explored. Magnetic field has a profound effect on the diameter, chirality, and length of a SWNT synthesized in the arc plasma. An average length of SWNT increases by a factor of 2 in discharge with magnetic field and an amount of long nanotubes with the length above 5 {mu}m also increases in comparison with that observed in the discharge without a magnetic field. In addition, synthesis of a few-layer graphene in a magnetic field presence is discovered. A coupled model of plasma-electrode phenomena in atmospheric-pressure anodic arc in helium is described. Calculations indicate that substantial fraction of the current at the cathode is conducted by ions (0.7-0.9 of the total current). It is shown that nonmonotonic behavior of the arc current-voltage characteristic can be reproduced taking into account the experimentally observed dependence of the arc radius on arc current.

  9. Acoustic stabilization of electric arc instabilities in nontransferred plasma torches

    SciTech Connect (OSTI)

    Rat, V.; Coudert, J. F.

    2010-03-08

    Electric arc instabilities in dc plasma torches lead to nonhomogeneous treatments of nanosized solid particles or liquids injected within thermal plasma jets. This paper shows that an additional acoustic resonator mounted on the cathode cavity allows reaching a significant damping of these instabilities, particularly the Helmholtz mode of arc oscillations. The acoustic resonator is coupled with the Helmholtz resonator of the plasma torch limiting the amplitude of arc voltage variations. It is also highlighted that this damping is dependent on friction effects in the acoustic resonator.

  10. Plasma sprayed and electrospark deposited zirconium metal diffusion barrier coatings

    SciTech Connect (OSTI)

    Hollis, Kendall J; Pena, Maria I

    2010-01-01

    Zirconium metal coatings applied by plasma spraying and electrospark deposition (ESD) have been investigated for use as diffusion barrier coatings on low enrichment uranium fuel for research nuclear reactors. The coatings have been applied to both stainless steel as a surrogate and to simulated nuclear fuel uranium-molybdenum alloy substrates. Deposition parameter development accompanied by coating characterization has been performed. The structure of the plasma sprayed coating was shown to vary with transferred arc current during deposition. The structure of ESD coatings was shown to vary with the capacitance of the deposition equipment.

  11. Ohmic contacts for solar cells by arc plasma spraying

    DOE Patents [OSTI]

    Narasimhan, Mandayam C. (Seekonk, MA); Roessler, Barton (Barrington, RI); Loferski, Joseph J. (Providence, RI)

    1982-01-01

    The method of applying ohmic contacts to a semiconductor, such as a silicon body or wafer used in solar cells, by the use of arc plasma spraying, and solar cells resulting therefrom.

  12. Synthesis of silicon nanotubes by DC arc plasma method

    SciTech Connect (OSTI)

    Tank, C. M.; Bhoraskar, S. V.; Mathe, V. L.

    2012-06-05

    Plasma synthesis is a novel technique of synthesis of nanomaterials as they provide high rate of production and promote metastable reactions. Very thin walled silicon nanotubes were synthesized in a DC direct arc thermal plasma reactor. The effect of parameters of synthesis i.e. arc current and presence of hydrogen on the morphology of Si nanoparticles is reported. Silicon nanotubes were characterized by Transmission Electron Microscopy (TEM), Local Energy Dispersive X-ray analysis (EDAX), and Scanning Tunneling Microscopy (STM).

  13. Probing instabilities in arc plasma devices using binary gas mixtures

    SciTech Connect (OSTI)

    Ghorui, S.; Vysohlid, M.; Heberlein, J. V. R.; Pfender, E.

    2007-07-15

    This paper presents an experimental approach to identify the sources of instabilities in arc plasma devices. The phenomena of demixing in arcs have been utilized to explore the characteristics of different instabilities. Problems in explaining the observed behavior with our current understanding of the phenomena are discussed. Hydrogen is used as a secondary gas with argon as the primary plasma gas for this study. Results indicate that the observed behavior such as steady, takeover, and restrike modes of instabilities in arcs may essentially originate from the thin boundary layer over the anode wall primarily at the location of the anodic arc root. The bulk core flow apparently does not play any significant role in such instabilities. Arc currents rather than flow rates control the behavior of the instabilities in frequency space. Bifurcation of the system behavior and evidence for the existence of quadratic zones in flow space of binary gas mixtures separating steady and unsteady behavior are discussed.

  14. Measurement of total ion current from vacuum arc plasma sources

    SciTech Connect (OSTI)

    Oks, E.M.; Savkin, K.P.; Yushkov, G.Yu.; Nikolaev, A.G.; Anders, A.; Brown, I.G.

    2006-03-15

    The total ion current generated by a vacuum arc plasma source was measured. The discharge system investigated allowed ion collection from the arc plasma streaming through a hemispherical mesh anode with geometric transparency of 72%. A range of different cathode materials was investigated, and the arc current was varied over the range of 50-500 A. We find that the normalized ion current (I{sub ion}/I{sub arc}) depends on the cathode material, with values in the range from 5% to 19% and generally greater for elements of low cohesive energy. The application of a strong axial magnetic field in the cathode and arc region leads to increased normalized ion current, but only by virtue of enhanced ion charge states formed in a strong magnetic field.

  15. Influence of a transverse magnetic field on arc root movements in a dc plasma torch: Diamagnetic effect of arc column

    SciTech Connect (OSTI)

    Kim, Keun Su

    2009-03-23

    The effect of a transverse magnetic field on the anodic arc root movement inside a dc plasma torch has been investigated. The arc voltage fluctuation, which represents the degree of the arc instability, was reduced to 28.6% of the original value and the high frequency components in the voltage signal also decreased in their magnitudes. The inherent arc instability in a dc thermal plasma torch seems to be suppressed by a diamagnetic effect of the arc column. Furthermore, the measured voltage wave forms indicated that the arc root attachment mode would be controllable by a transverse magnetic field.

  16. Simple filtered repetitively pulsed vacuum arc plasma source

    SciTech Connect (OSTI)

    Chekh, Yu.; Zhirkov, I. S.; Delplancke-Ogletree, M. P.

    2010-02-15

    A very simple design of cathodic filtered vacuum arc plasma source is proposed. The source without filter has only four components and none of them require precise machining. The source operates in a repetitively pulsed regime, and for laboratory experiments it can be used without water cooling. Despite the simple construction, the source provides high ion current at the filter outlet reaching 2.5% of 400 A arc current, revealing stable operation in a wide pressure range from high vacuum to oxygen pressure up to more than 10{sup -2} mbar. There is no need in complicated power supply system for this plasma source, only one power supply can be used to ignite the arc, to provide the current for the arc itself, to generate the magnetic field in the filter, and provide its positive electric biasing without any additional high power resistance.

  17. Plasma deposited diamond-like carbon films for large neutralarrays

    SciTech Connect (OSTI)

    Brown, I.G.; Blakely, E.A.; Bjornstad, K.A.; Galvin, J.E.; Monteiro, O.R.; Sangyuenyongpipat, S.

    2004-07-15

    To understand how large systems of neurons communicate, we need to develop methods for growing patterned networks of large numbers of neurons. We have found that diamond-like carbon thin films formed by energetic deposition from a filtered vacuum arc carbon plasma can serve as ''neuron friendly'' substrates for the growth of large neural arrays. Lithographic masks can be used to form patterns of diamond-like carbon, and regions of selective neuronal attachment can form patterned neural arrays. In the work described here, we used glass microscope slides as substrates on which diamond-like carbon was deposited. PC-12 rat neurons were then cultured on the treated substrates and cell growth monitored. Neuron growth showed excellent contrast, with prolific growth on the treated surfaces and very low growth on the untreated surfaces. Here we describe the vacuum arc plasma deposition technique employed, and summarize results demonstrating that the approach can be used to form large patterns of neurons.

  18. Arc Plasma Synthesis of Nanostructured Materials: Techniques and Innovations

    SciTech Connect (OSTI)

    Das, A. K.; Bhoraskar, S. V.; Kakati, M.; Karmakar, Soumen

    2008-10-23

    Arc plasma aided synthesis of nanostructured materials has the potential of producing complex nano phase structures in bulk quantities. Successful implementation of this potential capability to industrial scale nano generation needs establishment of a plasma parameter control regime in terms of plasma gas, flow pattern, pressure, local temperature and the plasma fields to obtain the desired nano phase structures. However, there is a need to design innovative in situ experiments for generation of an extensive database and subsequently to correlate plasma parameters to the size, shape and phase of the generated nanostructures. The present paper reviews the various approaches utilized in the field of arc plasma nanosynthesis in general and in the authors' laboratories in particular. Simple plasma diagnostics and monitoring schemes have been used in conjunction with nano materials characterization tools to explore the possibility of controlling the size, shape, yield and phase composition of the arc generated nanostructures through plasma control. Case studies related to synthesis of AlN, Al2O3, TiO2, ZrO2, ZnO), magnetic (e.g. {gamma}-Fe2O3, Fe3O4) and single elemental materials (e.g. carbon nanotubes) are presented.

  19. Pulse thermal processing of functional materials using directed plasma arc

    DOE Patents [OSTI]

    Ott, Ronald D. (Knoxville, TN); Blue, Craig A. (Knoxville, TN); Dudney, Nancy J. (Knoxville, TN); Harper, David C. (Kingston, TN)

    2007-05-22

    A method of thermally processing a material includes exposing the material to at least one pulse of infrared light emitted from a directed plasma arc to thermally process the material, the pulse having a duration of no more than 10 s.

  20. Supersonic Argon Flow In An Arc Plasma Source

    SciTech Connect (OSTI)

    Izrar, B.; Dudeck, M.; Andre, P.; Elchinger, M. F.; Aubreton, J.

    2006-01-15

    The plasma properties inside a D.C. arc-jet operating with argon is analysed by means of a continuum description taking into account non equilibrium ionization processes and dissipative effects. The relaxation of the different physical processes inside the nozzle and the evolution of the Mach number are aanalysed.

  1. Anode Sheath Switching in a Carbon Nanotube Arc Plasma

    SciTech Connect (OSTI)

    Abe Fetterman, Yevgeny Raitses, and Michael Keidar

    2008-04-08

    The anode ablation rate is investigated as a function of anode diameter for a carbon nanotube arc plasma. It is found that anomalously high ablation occurs for small anode diameters. This result is explained by the formation of a positive anode sheath. The increased ablation rate due to this positive anode sheath could imply greater production rate for carbon nanotubes.

  2. An interchangeable-cathode vacuum arc plasma source

    SciTech Connect (OSTI)

    Olson, David K.; Peterson, Bryan G.; Hart, Grant W.

    2010-01-15

    A simplified vacuum arc design [based on metal vapor vacuum arc (MeVVA) concepts] is employed as a plasma source for a study of a {sup 7}Be non-neutral plasma. The design includes a mechanism for interchanging the cathode source. Testing of the plasma source showed that it is capable of producing on the order of 10{sup 12} charges at confinable energies using a boron-carbide disk as the cathode target. The design is simplified from typical designs for lower energy and lower density applications by using only the trigger spark rather than the full vacuum arc in high current ion beam designs. The interchangeability of the cathode design gives the source the ability to replace only the source sample, simplifying use of radioactive materials in the plasma source. The sample can also be replaced with a completely different conductive material. The design can be easily modified for use in other plasma confinement or full MeVVA applications.

  3. Comparative Analysis of Carbon Plasma in Arc and RF Reactors

    SciTech Connect (OSTI)

    Todorovic-Markovic, B.; Markovic, Z.; Mohai, I.; Szepvolgyi, J.

    2004-12-01

    Results on studies of molecular spectra emitted in the initial stages of fullerene formation during the processing of graphite powder in induction RF reactor and evaporation of graphite electrodes in arc reactor are presented in this paper. It was found that C2 radicals were dominant molecular species in both plasmas. C2 radicals have an important role in the process of fullerene synthesis. The rotational-vibrational temperatures of C2 and CN species were calculated by fitting the experimental spectra to the simulated ones. The results of optical emission study of C2 radicals generated in carbon arc plasma have shown that rotational temperature of C2 species depends on carbon concentration and current intensity significantly. The optical emission study of induction RF plasma and SEM analysis of graphite powder before and after plasma treatment have shown that evaporation of the processed graphite powder depends on feed rate and composition of gas phase significantly. Based on the obtained results, it was concluded that in the plasma region CN radicals could be formed by the reaction of C2 species with atomic nitrogen at smaller loads. At larger feed rate of graphite powder, CN species were produced by surface reaction of the hot carbon particles with nitrogen atoms. The presence of nitrogen in induction RF plasma reduces the fullerene yield significantly. The fullerene yield obtained in two different reactors was: 13% in arc reactor and 4.1% in induction RF reactor. However, the fullerene production rate was higher in induction RF reactor-6.4 g/h versus 1.7 g/h in arc reactor.

  4. Liquid injection plasma deposition method and apparatus

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID); Watkins, Arthur D. (Idaho Falls, ID)

    1999-01-01

    A liquid injection plasma torch deposition apparatus for depositing material onto a surface of a substrate may comprise a plasma torch for producing a jet of plasma from an outlet nozzle. A plasma confinement tube having an inlet end and an outlet end and a central bore therethrough is aligned with the outlet nozzle of the plasma torch so that the plasma jet is directed into the inlet end of the plasma confinement tube and emerges from the outlet end of the plasma confinement tube. The plasma confinement tube also includes an injection port transverse to the central bore. A liquid injection device connected to the injection port of the plasma confinement tube injects a liquid reactant mixture containing the material to be deposited onto the surface of the substrate through the injection port and into the central bore of the plasma confinement tube.

  5. Liquid injection plasma deposition method and apparatus

    DOE Patents [OSTI]

    Kong, P.C.; Watkins, A.D.

    1999-05-25

    A liquid injection plasma torch deposition apparatus for depositing material onto a surface of a substrate may comprise a plasma torch for producing a jet of plasma from an outlet nozzle. A plasma confinement tube having an inlet end and an outlet end and a central bore therethrough is aligned with the outlet nozzle of the plasma torch so that the plasma jet is directed into the inlet end of the plasma confinement tube and emerges from the outlet end of the plasma confinement tube. The plasma confinement tube also includes an injection port transverse to the central bore. A liquid injection device connected to the injection port of the plasma confinement tube injects a liquid reactant mixture containing the material to be deposited onto the surface of the substrate through the injection port and into the central bore of the plasma confinement tube. 8 figs.

  6. Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective

    SciTech Connect (OSTI)

    Anders, Andre

    2007-02-28

    Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."

  7. Characterization of a Filtered High Current Pulsed Cathodic Vacuum Arc Plasma Source: Plasma Transport Analysis

    SciTech Connect (OSTI)

    Sangines, R.; Tarrant, R. N.; Bilek, M. M. M.; McKenzie, D. R.; Andruczyk, D.

    2008-03-19

    Studies of plasma behavior produced by a filtered high current pulsed cathodic vacuum arc system are reported. Titanium plasma is initiated from the cathode by surface flash over triggering at the centre of the cathode disk. The multiple arc spots move outwards due to their mutual repulsion and the arc current pulse is terminated as the arc spots reach the edge of the cathode disk. The plasma moves into a positively biased quarter-torus magnetic filter and is guided towards the substrate position located 150 mm beyond the filter exit. Electron density and plasma current measurements have been employed to analyze the transport of the plasma associated with different cathode currents, and its dependence on confining magnetic field and bias conditions. For a given cathode current, the optimum plasma transport to the substrate requires the right combination of the strength of the confining magnetic field and the magnetic filter positive bias. The optimum values of these two parameters were found to increase with increasing cathode current. Initially the optimum throughput of plasma increases more strongly than the arc current (roughly 1.5 times the increase in the current); however, at high cathode current regimes (2.4 kA) a significant change of the plasma behavior is seen and transport efficiency is reduced.

  8. Asymmetric injection of cathodic arc plasma into a macroparticlefilter

    SciTech Connect (OSTI)

    Anders, Andre; MacGill, Robert A.

    2004-02-11

    The cathodic arc plasmas produced by cathode spots usuallyinclude macroparticles, which is undesirable for many applications. Acommon way of removing macroparticles is to use curved solenoid filterswhich guide the plasma from the source to the substrate. In this work, anarc source with relatively small cathode is used, limiting the possiblelocations of plasma production. The relative position of cathodic arcsource and macroparticle filtered was systematically varied and thefiltered plasma current was recorded. It was found that axis-symmetricplasma injection leads to maximum throughput only if an anode aperturewas used, which limited the plasma to near-axis flow by scraping offplasma at larger angles to the axis. When the anode aperture was removed,more plasma could enter the filter. In this case, maximum filtered ioncurrent was achieved when the plasma was injected off-axis, namely offsetin the direction where the filter is curved. Such behavior wasanticipated because the plasma column in the filter is known to beshifted by ExB and centrifugal drift as well as by non-axis-symmetriccomponents of the magnetic field in the filter entrance and exit plane.The data have implications for plasma transport variations caused bydifferent spot locations on cathodes that are not small compared to thefilter cross section.

  9. Optical emission spectroscopy of metal vapor dominated laser-arc hybrid welding plasma

    SciTech Connect (OSTI)

    Ribic, B.; DebRoy, T.; Burgardt, P.

    2011-04-15

    During laser-arc hybrid welding, plasma properties affect the welding process and the weld quality. However, hybrid welding plasmas have not been systematically studied. Here we examine electron temperatures, species densities, and electrical conductivity for laser, arc, and laser-arc hybrid welding using optical emission spectroscopy. The effects of arc currents and heat source separation distances were examined because these parameters significantly affect weld quality. Time-average plasma electron temperatures, electron and ion densities, electrical conductivity, and arc stability decrease with increasing heat source separation distance during hybrid welding. Heat source separation distance affects these properties more significantly than the arc current within the range of currents considered. Improved arc stability and higher electrical conductivity of the hybrid welding plasma result from increased heat flux, electron temperatures, electron density, and metal vapor concentrations relative to arc or laser welding.

  10. Dynamic voltage-current characteristics for a water jet plasma arc

    SciTech Connect (OSTI)

    Yang Jiaxiang; Lan Sheng; Xu Zuoming

    2008-05-05

    A virtual instrument technology is used to measure arc current, arc voltage, dynamic V-I characteristics, and nonlinear conductance for a cone-shaped water jet plasma arc under ac voltage. Experimental results show that ac arc discharge mainly happens in water vapor evaporated from water when heated. However, due to water's cooling effect and its conductance, arc conductance, reignition voltage, extinguish voltage, and current zero time are very different from those for ac arc discharge in gas work fluid. These can be valuable to further studies on mechanism and characteristics of plasma ac discharge in water, and even in gas work fluid.

  11. Effects of current on droplet generation and arc plasma in gas metal arc welding

    SciTech Connect (OSTI)

    Hu, J.; Tsai, H. L.

    2006-09-01

    In gas metal arc welding (GMAW), a technology using pulsed currents has been employed to achieve the one-droplet-per-pulse (ODPP) metal transfer mode with the advantages of low average currents, a stable and controllable droplet generation, and reduced spatter. In this paper, a comprehensive model was developed to study the effects of different current profiles on the droplet formation, plasma generation, metal transfer, and weld pool dynamics in GMAW. Five types of welding currents were studied, including two constant currents and three wave form currents. In each type, the transient temperature and velocity distributions of the arc plasma and the molten metal, and the shapes of the droplet and the weld pool were calculated. The results showed that a higher current generates smaller droplets, higher droplet frequency, and higher electromagnetic force that becomes the dominant factor detaching the droplet from the electrode tip. The model has demonstrated that a stable ODPP metal transfer mode can be achieved by choosing a current with proper wave form for given welding conditions.

  12. Characterization of plasma chemistry and ion energy in cathodic arc plasma from Ti-Si cathodes of different compositions

    SciTech Connect (OSTI)

    Eriksson, A. O.; Zhirkov, I.; Dahlqvist, M.; Jensen, J.; Hultman, L.; Rosen, J.

    2013-04-28

    Arc plasma from Ti-Si compound cathodes with up to 25 at. % Si was characterized in a DC arc system with respect to chemistry and charge-state-resolved ion energy. The plasma ion composition showed a lower Si content, diverging up to 12 at. % compared to the cathode composition, yet concurrently deposited films were in accordance with the cathode stoichiometry. Significant contribution to film growth from neutrals is inferred besides ions, since the contribution from macroparticles, estimated by scanning electron microscopy, cannot alone account for the compositional difference between cathode, plasma, and film. The average ion charge states for Ti and Si were higher than reference data for elemental cathodes. This result is likely related to TiSi{sub x} phases of higher cohesive energies in the compound cathodes and higher effective electron temperature in plasma formation. The ion energy distributions extended up to {approx}200 and {approx}130 eV for Ti and Si, respectively, with corresponding average energies of {approx}60 and {approx}30 eV. These averages were, however, not dependent on Si content in the cathode, except for 25 at. % Si where the average energies were increased up to 72 eV for Ti and 47 eV for Si.

  13. Arc plasma simulation of the KAERI large ion source

    SciTech Connect (OSTI)

    In, S. R.; Jeong, S. H.; Kim, T. S.

    2008-02-15

    The KAERI large ion source, developed for the KSTAR NBI system, recently produced ion beams of 100 keV, 50 A levels in the first half campaign of 2007. These results seem to be the best performance of the present ion source at a maximum available input power of 145 kW. A slight improvement in the ion source is certainly necessary to attain the final goal of an 8 MW ion beam. Firstly, the experimental results were analyzed to differentiate the cause and effect for the insufficient beam currents. Secondly, a zero dimensional simulation was carried out on the ion source plasma to identify which factors control the arc plasma and to find out what improvements can be expected.

  14. Comparison of Different Arc Detection Methods during Plasma Operations with ICRF Heating on ASDEX Upgrade

    SciTech Connect (OSTI)

    D'Inca, R.; Assas, S.; Bobkov, V.; Braun, F.; Eckert, B.; Noterdaeme, J.-M.

    2007-09-28

    The Sub-Harmonic Arc Detection (SHAD) system used on ASDEX-Upgrade has been designed with the double objective to detect arcs on the ICRF system and to discriminate them from plasma transients like ELMs. This preliminary study focuses on the achievement of these requirements by analyzing and comparing the behavior of the SHAD with existing arc detectors in operation on AUG.

  15. Low-temperature plasma-deposited silicon epitaxial films: Growth...

    Office of Scientific and Technical Information (OSTI)

    Low-temperature plasma-deposited silicon epitaxial films: Growth and properties Citation Details In-Document Search Title: Low-temperature plasma-deposited silicon epitaxial films:...

  16. Modeling And Measurements Of The Arc Plasma In A Mixture Of Gases

    SciTech Connect (OSTI)

    Pawelec, E.; KsiaPzek, I.

    2006-01-15

    Radial distributions of Ar mass fractions and temperatures in plasmas produced in a wall-stabilized arc have been calculated. Modeling have been performed for many different mixtures of Ar+N2 and three different arc currents. The obtained results show that the radial distributions of Ar mass fractions strongly depend on the chemical composition of the plasma. In plasmas containing large amount of Ar the distributions have local minima at the arc axis (in high temperature plasma regions), whereas in plasmas consisting mainly of nitrogen the distributions reveal maxima on the discharge axis. Those features seem to be connected with the dissociation of the nitrogen.

  17. Method and device for reducing overpenetration at the start of plasma arc welds

    DOE Patents [OSTI]

    Sanders, John M. (Jackson Township, Stark County, OH); Lehmann, John M. (Bedford County, VA); Ryan, Patrick M. (Washington Township, Stark County, OH)

    1998-01-01

    A shim for improving plasma arc weld quality has ends tapered at about 25.degree. and notches at each end roughly centered over the corner between the tapered ends and main body of the shim. The improved shim allows lower starting plasma arc heat input and reduces the occurrence of sagging, or overpenetration, of the weld.

  18. Method and device for reducing overpenetration at the start of plasma arc welds

    SciTech Connect (OSTI)

    Sanders, J.M.; Lehmann, J.M.; Ryan, P.M.

    2000-03-14

    A shim for improving plasma arc weld quality has ends tapered at about 25{degree} and notches at each end roughly centered over the corner between the tapered ends and main body of the shim. The improved shim allows lower starting plasma arc heat input and reduces the occurrence of sagging, or overpenetration, of the weld.

  19. Glass Strengthening via High-Intensity Plasma-Arc Heating

    SciTech Connect (OSTI)

    Wereszczak, Andrew A; Harper, David C; Duty, Chad E; Patel, P

    2010-01-01

    The use of a high-intensity plasma-arc lamp was used to irradiate the surface of soda-lime silicate glass tiles to determine if an increase in strength could be achieved. The lamp had a power density of 3500 W/cm2, a processing area of 1 cm x 10 cm, irradiated near-infrared heating at a wavelength between 0.2 1.4 m, and was controlled to unidirectionally sweep across 50-mm-square tiles at a constant speed of 8 mm/s. Ring-on-ring (RoR) equibiaxial flexure and 4 pt uni-directional flexure testings of entire tiles were used to measure and compare failure stress distributions of treated and untreated glass. Even with non-optimized processing conditions, RoR failure stress increased by approximately 25% and the 4 pt bend failure stress increased by approximately 65%. Strengthening was due to a fire-polishing-like mechanism. The arc-lamp heat-treatment caused the location of the strength-limiting flaws in the 4-pt-bend tiles to change; namely, failure initiation occurred on the gage section surface for the treated glass whereas it occurred at a gage section edge for the untreated. Arc-lamp heat-treatment is attractive not only because it provides strengthening, but because it can (non-contact) process large amounts of glass quickly and inexpensively, and is a process that either a glass manufacturer or end-user can readily employ.

  20. Preparation of transparent conducting B-doped ZnO films by vacuum arc plasma evaporation

    SciTech Connect (OSTI)

    Miyata, Toshihiro; Honma, Yasunori; Minami, Tadatsugu

    2007-07-15

    Highly transparent and conductive B-doped ZnO (BZO) thin films have been prepared by a newly developed vacuum arc plasma evaporation method that provided high-rate film depositions using sintered BZO pellets and fragments. The obtained electrical and optical properties of the deposited BZO thin films were considerably affected by the deposition conditions as well as the preparation method of the BZO pellets and fragments used. The lowest thin film resistivity was obtained with a B doping content [B/(B+Zn) atomic ratio] of approximately 1 at. %. A resistivity as low as 5x10{sup -4} {omega} cm and an average transmittance above about 80% in the wavelength range of 400-1300 nm were obtained in BZO films prepared with a thickness above approximately 400 nm at a substrate temperature of 200 deg. C. In addition, a low resistivity of 7.97x10{sup -4} {omega} cm and average transmittances above about 80% in the visible wavelength range were obtained in a BZO film prepared at a substrate temperature of 100 deg. C and an O{sub 2} gas flow rate of 10 SCCM (SCCM denotes cubic centimeter per minute at STP). The deposition rate of BZO films was typically 170 nm/min with a cathode plasma power of 4.5 kW.

  1. Method of operating a centrifugal plasma arc furnace

    DOE Patents [OSTI]

    Kujawa, S.T.; Battleson, D.M.; Rademacher, E.L. Jr.; Cashell, P.V.; Filius, K.D.; Flannery, P.A.; Whitworth, C.G.

    1998-03-24

    A centrifugal plasma arc furnace is used to vitrify contaminated soils and other waste materials. An assessment of the characteristics of the waste is performed prior to introducing the waste into the furnace. Based on the assessment, a predetermined amount of iron is added to each batch of waste. The waste is melted in an oxidizing atmosphere into a slag. The added iron is oxidized into Fe{sub 3}O{sub 4}. Time of exposure to oxygen is controlled so that the iron does not oxidize into Fe{sub 2}O{sub 3}. Slag in the furnace remains relatively non-viscous and consequently it pours out of the furnace readily. Cooled and solidified slag produced by the furnace is very resistant to groundwater leaching. The slag can be safely buried in the earth without fear of contaminating groundwater. 3 figs.

  2. Method of operating a centrifugal plasma arc furnace

    DOE Patents [OSTI]

    Kujawa, Stephan T. (Butte, MT); Battleson, Daniel M. (Butte, MT); Rademacher, Jr., Edward L. (Butte, MT); Cashell, Patrick V. (Butte, MT); Filius, Krag D. (Butte, MT); Flannery, Philip A. (Ramsey, MT); Whitworth, Clarence G. (Butte, MT)

    1998-01-01

    A centrifugal plasma arc furnace is used to vitrify contaminated soils and other waste materials. An assessment of the characteristics of the waste is performed prior to introducing the waste into the furnace. Based on the assessment, a predetermined amount of iron is added to each batch of waste. The waste is melted in an oxidizing atmosphere into a slag. The added iron is oxidized into Fe.sub.3 O.sub.4. Time of exposure to oxygen is controlled so that the iron does not oxidize into Fe.sub.2 O.sub.3. Slag in the furnace remains relatively non-viscous and consequently it pours out of the furnace readily. Cooled and solidified slag produced by the furnace is very resistant to groundwater leaching. The slag can be safely buried in the earth without fear of contaminating groundwater.

  3. Emission spectra analysis of arc plasma for synthesis of carbon nanostructures in various magnetic conditions

    SciTech Connect (OSTI)

    Li Jian; Kundrapu, Madhusudhan; Shashurin, Alexey; Keidar, Michael

    2012-07-15

    Arc discharge supported by the erosion of anode materials is one of the most practical and efficient methods to synthesize various high-quality carbon nanostructures. By introducing a non-uniform magnetic field in arc plasmas, high-purity single-walled carbon nanotubes (SWCNT) and large-scale graphene flakes can be obtained in a single step. In this paper, ultraviolet-visible emission spectra of arc in different spots under various magnetic conditions are analyzed to provide an in situ investigation for transformation processes of evaporated species and growth of carbon nanostructures in arc. Based on the arc spectra of carbon diatomic Swan bands, vibrational temperature in arc is determined. The vibrational temperature in arc center was measured around 6950 K, which is in good agreement with our simulation results. Experimental and simulation results suggest that SWCNT are formed in the arc periphery region. Transmission electronic microscope and Raman spectroscope are also employed to characterize the properties of carbon nanostructures.

  4. Characterization of an atmospheric double arc argon-nitrogen plasma source

    SciTech Connect (OSTI)

    Tu, X.; Cheron, B. G.; Yan, J. H.; Yu, L.; Cen, K. F.

    2008-05-15

    In the framework of studies devoted to hazardous waste destruction, an original dc double anode plasma torch has been designed and tested, which produces an elongated, weak fluctuation and reproducible plasma jet at atmospheric pressure. The arc instabilities and dynamic behavior of the double arc argon-nitrogen plasma jet are investigated through the oscillations of electrical signals by combined means of fast Fourier transform and Wigner distribution. In our experiment, the restrike mode is identified as the typical fluctuation behavior in an argon-nitrogen plasma jet. The Fourier spectra and Wigner distributions exhibit two characteristic frequencies of 150 Hz and 4.1 kHz, which reveals that the nature of fluctuations in the double arc argon-nitrogen plasma can be ascribed to the undulation of the power supply and both arc roots motion on the anode channels. In addition, the microscopic properties of the plasma jet inside and outside the arc chamber are investigated by means of optical emission spectroscopy, which yields excitation, electronic, rotational, and vibrational temperatures, as well as the electron number density. The results allow us to examine the validity criteria of a local thermodynamic equilibrium (LTE) state in the plasma arc. The measured electron densities are in good agreement with those calculated from the LTE model, which indicates that the atmospheric double arc argon-nitrogen plasma in the core region is close to the LTE state under our experimental conditions.

  5. The evolution of ion charge states in cathodic vacuum arc plasmas: a review

    SciTech Connect (OSTI)

    Anders, Andre

    2011-12-18

    Cathodic vacuum arc plasmas are known to contain multiply charged ions. 20 years after “Pressure Ionization: its role in metal vapour vacuum arc plasmas and ion sources” appeared in vol. 1 of Plasma Sources Science and Technology, it is a great opportunity to re-visit the issue of pressure ionization, a non-ideal plasma effect, and put it in perspective to the many other factors that influence observable charge state distributions, such as the role of the cathode material, the path in the density-temperature phase diagram, the “noise” in vacuum arc plasma as described by a fractal model approach, the effects of external magnetic fields and charge exchange collisions with neutrals. A much more complex image of the vacuum arc plasma emerges putting decades of experimentation and modeling in perspective.

  6. Nanotube array controlled carbon plasma deposition

    SciTech Connect (OSTI)

    Qian, Shi; Cao, Huiliang; Liu, Xuanyong; Ding, Chuanxian

    2013-06-17

    Finding approaches to control the elementary processes of plasma-solid interactions and direct the fluxes of matter at nano-scales becomes an important aspect in science. This letter reports that, by taking advantages of the spacing characteristics of discrete TiO{sub 2} nanotube arrays, the flying trajectories and the subsequent implantation and deposition manner of energetic carbon ions can be directed and controlled to fabricate hollow conical arrays. The study provides an alternative method for plasma nano-manufacturing.

  7. The nature of fluctuations in a double arc argon-nitrogen plasma jet

    SciTech Connect (OSTI)

    Tu Xin; Yan Jianhua; Yu Liang; Cen, Kefa; Cheron, Bruno

    2007-09-24

    The dynamic behavior of the double arc argon-nitrogen plasma jet is investigated by combined means of the fast Fourier transform, correlation function, and Wigner distribution. The restrike mode is identified as the fluctuation behavior in an argon-nitrogen plasma jet. The Fourier spectra exhibit two characteristic frequencies of 150 Hz and 4.1 kHz, which indicates that the nature of fluctuations in the double arc argon-nitrogen plasma can be ascribed to the power supply undulation and both arc roots motion on the anode channels. It is further found that the double anode torch could inhibit and reduce the restrike phenomenon.

  8. Plasma deposition of amorphous metal alloys

    DOE Patents [OSTI]

    Hays, Auda K. (Albuquerque, NM)

    1986-01-01

    Amorphous metal alloy coatings are plasma-deposited by dissociation of vapors of organometallic compounds and metalloid hydrides in the presence of a reducing gas, using a glow discharge. Tetracarbonylnickel, phosphine, and hydrogen constitute a typical reaction mixture of the invention, yielding a NiPC alloy.

  9. Effect of Ti-Al cathode composition on plasma generation and plasma transport in direct current vacuum arc

    SciTech Connect (OSTI)

    Zhirkov, I. Petruhins, A.; Dahlqvist, M.; Ingason, A. S.; Rosen, J.; Eriksson, A. O.

    2014-03-28

    DC arc plasma from Ti, Al, and Ti{sub 1-x}Al{sub x} (x?=?0.16, 0.25, 0.50, and 0.70) compound cathodes was characterized with respect to plasma chemistry and charge-state-resolved ion energy. Scanning electron microscopy, X-ray diffraction, and Energy-dispersive X-ray spectroscopy of the deposited films and the cathode surfaces were used for exploring the correlation between cathode-, plasma-, and film composition. Experimental work was performed at a base pressure of 10{sup ?6}?Torr, to exclude plasma-gas interaction. The plasma ion composition showed a reduction of Al of approximately 5 at. % compared to the cathode composition, while deposited films were in accordance with the cathode stoichiometry. This may be explained by presence of neutrals in the plasma/vapour phase. The average ion charge states (Ti?=?2.2, Al?=?1.65) were consistent with reference data for elemental cathodes, and approximately independent on the cathode composition. On the contrary, the width of the ion energy distributions (IEDs) were drastically reduced when comparing the elemental Ti and Al cathodes with Ti{sub 0.5}Al{sub 0.5}, going from??150 and ?175?eV to ?100 and ?75?eV for Ti and Al ions, respectively. This may be explained by a reduction in electron temperature, commonly associated with the high energy tail of the IED. The average Ti and Al ion energies ranged between ?50 and ?61?eV, and ?30 and ?50?eV, respectively, for different cathode compositions. The attained energy trends were explained by the velocity rule for compound cathodes, which states that the most likely velocities of ions of different mass are equal. Hence, compared to elemental cathodes, the faster Al ions will be decelerated, and the slower Ti ions will be accelerated when originating from compound cathodes. The intensity of the macroparticle generation and thickness of the deposited films were also found to be dependent on the cathode composition. The presented results may be of importance for choice of cathodes for thin film depositions involving compound cathodes.

  10. Effects of shielding gas compositions on arc plasma and metal transfer in gas metal arc welding

    SciTech Connect (OSTI)

    Rao, Z. H.; Liao, S. M.; Tsai, H. L.

    2010-02-15

    This article presents the effects of shielding gas compositions on the transient transport phenomena, including the distributions of temperature, flow velocity, current density, and electromagnetic force in the arc and the metal, and arc pressure in gas metal arc welding of mild steel at a constant current input. The shielding gas considered includes pure argon, 75% Ar, 50% Ar, and 25% Ar with the balance of helium. It is found that the shielding gas composition has significant influences on the arc characteristics; droplet formation, detachment, transfer, and impingement onto the workpiece; and weld pool dynamics and weld bead profile. As helium increases in the shielding gas, the droplet size increases but the droplet detachment frequency decreases. For helium-rich gases, the current converges at the workpiece with a 'ring' shape which produces non-Gaussian-like distributions of arc pressure and temperature along the workpiece surface. Detailed explanations to the physics of the very complex but interesting transport phenomena are given.

  11. High Rate Deposition of High Quality ZnO:Al by Filtered Cathodic Arc

    SciTech Connect (OSTI)

    Mendelsberg, Rueben J.; Lim, S.H.N.; Milliron, D.J.; Anders, Andre

    2010-11-18

    High quality ZnO:Al (AZO) thin films were prepared on glass substrates by direct current filtered cathodic arc deposition. Substrate temperature was varied from room temperature to 425oC, and samples were grown with and without the assistance of low power oxygen plasma (75W). For each growth condition, at least 3 samples were grown to give a statistical look at the effect of the growth environment on the film properties and to explore the reproducibility of the technique. Growth rate was in the 100-400 nm/min range but was apparently random and could not be easily traced to the growth conditions explored. For optimized growth conditions, 300-600 nm AZO films had resistivities of 3-6 x 10-4 ?Omega cm, carrier concentrations in the range of 2-4 x 1020 cm3, Hall mobility as high as 55 cm2/Vs, and optical transmittance greater than 90percent. These films are also highly oriented with the c-axis perpendicular to the substrate and a surface roughness of 2-4 nm.

  12. Probe characterization of high-current driven metal plasma in a vacuum-arc rail gun

    SciTech Connect (OSTI)

    Vijayan, T.; Roychowdhury, P.; Venkatramani, N.

    2004-10-15

    The characteristics of metal plasma launched by high-current electric arc in a vacuum-arc rail gun are determined by employing electrical and magnetic probes. These measurements are validated by results from theoretical simulations. The arc coupled nonlinear circuit equations are solved simultaneously with the Newtonian arc motion and revealed the undercritically damped behavior of the arc current identical to the arc-current signal recorded by the Rogowski magnetic probe. Similarly the arc velocity and displacement derived from the signatures of B-dot probes are shown to concur closely with the results of JxB propulsion from simulation. The heating of plasma is formulated in a three-electron population regime with direct arc energy coupling through magnetohydrodynamic, ion-acoustic, Coulomb, and neutral interactions. This results in high temperature (T{sub e}) of hundreds of eV in the arc as revealed by the simulation. Hence T{sub e} of the rapidly cooling and equilibrating plasma that emerged from the muzzle is high around 80-90 eV, which is confirmed by Langmuir electric probe measurements. Density n{sub e} of this metal plasma is shown to be in the range 4x10{sup 21}-6x10{sup 21} m{sup -3} and includes multiple ion charge states. The exit velocity of the plasma measured by a pair of Langmuir probes is close to 2.2x10{sup 6} cm/s and matched well with the arc velocity determined by the B-dot probes and the results from simulation.

  13. Correlation between cathode properties, burning voltage, and plasma parameters of vacuum arcs

    SciTech Connect (OSTI)

    Anders, Andre; Yotsombat, Banchob; Binder, Robert

    2001-06-15

    Burning voltages of vacuum arcs were measured for 54 cathode materials and compared with literature data. As anticipated, a correlation between the arc burning voltage and the plasma temperature was found. However, more importantly, a correlation between the cohesive energy of the cathode material and the arc burning voltage could be demonstrated. This link between a cathode material property, the cohesive energy, and a discharge property, the arc burning voltage, is essential for the operation of the vacuum arc discharge because is determines the plasma temperature. Energy balance considerations show that this {open_quotes}cohesive energy rule{close_quotes} is responsible for several other secondary relationships, such as the correlation between the mean ion charge state and the boiling temperature of the cathode. {copyright} 2001 American Institute of Physics.

  14. High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition

    SciTech Connect (OSTI)

    Anders, Andre

    2009-09-01

    High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

  15. On characterisation of wire-arc-plasma-sprayed Ni on alumina substrate

    SciTech Connect (OSTI)

    Laik, A.; Chakravarthy, D.P.; Kale, G.B. . E-mail: gbkale@apsara.barc.ernet.in

    2005-08-15

    A study was carried out on metal-ceramic bonding produced by the technique of wire-arc-plasma spraying of Ni on Al{sub 2}O{sub 3} substrate. The Ni layer and the Ni/Al{sub 2}O{sub 3} interface were characterised using optical and electro-optic techniques. The plasma-deposited Ni layer shows a uniform lamellar microstructure throughout the cross-section. The metal-ceramic interface was found to be well bonded with no pores, flaws or cracks in the as-sprayed condition. The optical metallography and concentration profiles established with the help of an electron probe microanalyser confirmed the absence of any intermediate phase at the interface. An annealing treatment at 1273 K for 24 h on the plasma-coated samples did not result in formation of any intermetallic compound or spinel at the Ni/Al{sub 2}O{sub 3} interface. This indicates that the oxygen picked up by Ni during the spraying operation is less than the threshold value required to form the spinel NiAl{sub 2}O{sub 4}.

  16. Studies of Discharge Parameters Influence on the IPD Plasma Deposition Process

    SciTech Connect (OSTI)

    Rabinski, Marek; Zdunek, Krzysztof

    2006-01-15

    The paper presents recent studies of a current sheet dynamics influence on the surface engineering process of impulse plasma deposition (IPD). During the IPD process plasma is generated in the working gas due to a high-voltage high-current oscillating pulse discharge, ignited within an interelectrode region of a coaxial accelerator. The changes of plasma dynamics and generation mechanisms, e.g. the electric arc instead of the plasma sheet formation during the consecutive half-periods of discharge, cause the different deposition efficiency for accelerator with the outer electrode system composed of stainless steel rods instead of standard tubular one. The coating efficiency and deposited layer quality have been examined for the titanium nitride as the model material for surface engineering.

  17. Spectroscopic characterization and imaging of laser- and unipolar arc-induced plasmas

    SciTech Connect (OSTI)

    Aussems, Damien U. B.; Nishijima, Daisuke; Brandt, Christian; Doerner, Russell P.; Cardozo, Niek J. Lopes

    2014-08-14

    Tungsten plasmas induced by unipolar arcs were investigated using optical emission spectroscopy and imaging, and compared with laser-induced tungsten plasmas. The unipolar arcs were initiated in the linear-plasma simulator PISCES-A at UCSD under fusion relevant conditions. The electron temperature and density of the unipolar arc plasmas were in the range 0.5–0.7?eV and 0.7–2.0?×?10{sup 20?}m{sup ?3}, respectively, and increased with increasing negative bias voltage, but did not correlate with the surface temperature. In comparison, the electron temperature and density of the laser-induced plasmas were in the range 0.6–1.4?eV and 7?×?10{sup 19}–1?×?10{sup 22?}m{sup ?3}, respectively.

  18. Application of electrostatic Langmuir probe to atmospheric arc plasmas producing nanostructures

    SciTech Connect (OSTI)

    Shashurin, A.; Li, J.; Zhuang, T.; Keidar, M.; Beilis, I. I.

    2011-07-15

    The temporal evolution of a high pressure He arc producing nanotubes was considered and the Langmuir probe technique was applied for plasma parameter measurements. Two modes of arc were observed: cathodic arc where discharge is supported by erosion of cathode material and anodic arc which is supported by ablation of the anode packed with carbon and metallic catalysts in which carbon nanotubes are synthesized. Voltage-current (V-I) characteristics of single probes were measured and unusually low ratio of saturation current on positively biased probe to that on negatively biased of about 1-4 was observed. This effect was explained by increase of measured current at the negatively biased probe above the level of ion saturation current due to secondary electron emission from the probe surface. Since utilization of standard collisionless approach to determine plasma parameters from the measured V-I characteristic is not correct, the electron saturation current was used to estimate the plasma density.

  19. Glow discharge plasma deposition of thin films

    DOE Patents [OSTI]

    Weakliem, Herbert A. (Pennington, NJ); Vossen, Jr., John L. (Bridgewater, NJ)

    1984-05-29

    A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.

  20. A high voltage pulse power supply for metal plasma immersion ion implantation and deposition

    SciTech Connect (OSTI)

    Salvadori, M. C.; Teixeira, F. S.; Araujo, W. W. R.; Sgubin, L. G.; Sochugov, N. S.; Spirin, R. E.; Brown, I. G.

    2010-12-15

    We describe the design and implementation of a high voltage pulse power supply (pulser) that supports the operation of a repetitively pulsed filtered vacuum arc plasma deposition facility in plasma immersion ion implantation and deposition (Mepiiid) mode. Negative pulses (micropulses) of up to 20 kV in magnitude and 20 A peak current are provided in gated pulse packets (macropulses) over a broad range of possible pulse width and duty cycle. Application of the system consisting of filtered vacuum arc and high voltage pulser is demonstrated by forming diamond-like carbon (DLC) thin films with and without substrate bias provided by the pulser. Significantly enhanced film/substrate adhesion is observed when the pulser is used to induce interface mixing between the DLC film and the underlying Si substrate.

  1. Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

    SciTech Connect (OSTI)

    Park, Taeyong; Lee, Jaesang; Park, Jingyu; Jeon, Heeyoung; Jeon, Hyeongtag; Lee, Ki-Hoon; Cho, Byung-Chul; Kim, Moo-Sung; Ahn, Heui-Bok

    2012-01-15

    Ruthenium thin films were deposited on argon plasma-treated SiO{sub 2} and untreated SiO{sub 2} substrates by remote plasma atomic layer deposition using bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp){sub 2}] as a Ru precursor and ammonia plasma as a reactant. The results of in situ Auger electron spectroscopy (AES) analysis indicate that the initial transient region of Ru deposition was decreased by Ar plasma treatment at 400 deg. C, but did not change significantly at 300 deg. C The deposition rate exhibited linearity after continuous film formation and the deposition rates were about 1.7 A/cycle and 0.4 A/cycle at 400 deg. C and 300 deg. C, respectively. Changes of surface energy and polar and dispersive components were measured by the sessile drop test. The quantity of surface amine groups was measured from the surface nitrogen concentration with AES. Furthermore, the Ar plasma-treated SiO{sub 2} contained more amine groups and less hydroxyl groups on the surface than on untreated SiO{sub 2}. Auger spectra exhibited chemical shifts by Ru-O bonding, and larger shifts were observed on untreated substrates due to the strong adhesion of Ru films.

  2. Heat flux characteristics in an atmospheric double arc argon plasma jet

    SciTech Connect (OSTI)

    Tu Xin; Yu Liang; Yan Jianhua; Cen Kefa; Cheron, Bruno

    2008-10-13

    In this study, the axial evolution of heat flux excited by a double arc argon plasma jet impinging on a flat plate is determined, while the nonstationary behavior of the heat flux is investigated by combined means of the fast Fourier transform, Wigner distribution, and short-time Fourier transform. Two frequency groups (<1 and 2-10 kHz) are identified in both the Fourier spectrum and the time-frequency distributions, which suggest that the nature of fluctuations in the heat flux is strongly associated with the dynamic behavior of the plasma arc and the engulfment of ambient air into different plasma jet regions.

  3. Optical Analysis Of The Vacuum Arc Plasma Generated In Cup-Shape Contacts

    SciTech Connect (OSTI)

    Pavelescu, G.; Gherendi, F.; Pavelescu, D.; Dumitrescu, G.; Anghelita, P.

    2007-04-23

    In this paper are presented the results of the optical analysis on the rotating arc plasma, generated in the vacuum low voltage circuit breaker with cup-shaped contacts. An adequate experimental setup was used for single shot time and spatial resolved spectroscopy in order to analyze the evolution of the vacuum arc plasma. Different current interruption situations are correlated with plasma spectral diagnosis. The study is aimed to contribute to a better understanding of the complex phenomena that take place in the interruption process of high currents that appears in the short-circuit regime of electrical networks.

  4. Mechanism of Synthesis of Ultra-Long Single Wall Carbon Nanotubes in Arc Discharge Plasma

    SciTech Connect (OSTI)

    Keidar, Michael

    2013-06-23

    In this project fundamental issues related to synthesis of single wall carbon nanotubes (SWNTs), which is relationship between plasma parameters and SWNT characteristics were investigated. Given that among plasma-based techniques arc discharge stands out as very advantageous in several ways (fewer defects, high flexibility, longer lifetime) this techniques warrants attention from the plasma physics and plasma technology standpoint. Both experimental and theoretical investigations of the plasma and SWNTs synthesis were conducted. Experimental efforts focused on plasma diagnostics, measurements of nanostructures parameters, and nanoparticle characterization. Theoretical efforts focused to focus on multi-dimensional modeling of the arc discharge and single wall nanotube synthesis in arc plasmas. It was demonstrated in experiment and theoretically that controlling plasma parameters can affect nanostucture synthesis altering SWNT properties (length and diameter) and leading to synthesis of new structures such as a few-layer graphene. Among clearly identified parameters affecting synthesis are magnetic and electric fields. Knowledge of the plasma parameters and discharge characteristics is crucial for ability to control synthesis process by virtue of both magnetic and electric fields. New graduate course on plasma engineering was introduced into curriculum. 3 undergraduate students were attracted to the project and 3 graduate students (two are female) were involved in the project. Undergraduate student from Historically Black University was attracted and participated in the project during Summer 2010.

  5. Fourth-generation plasma immersion ion implantation and deposition facility for hybrid surface modification layer fabrication

    SciTech Connect (OSTI)

    Wang Langping; Huang Lei; Xie Zhiwen; Wang Xiaofeng; Tang Baoyin

    2008-02-15

    The fourth-generation plasma immersion ion implantation and deposition (PIIID) facility for hybrid and batch treatment was built in our laboratory recently. Comparing with our previous PIIID facilities, several novel designs are utilized. Two multicathode pulsed cathodic arc plasma sources are fixed on the chamber wall symmetrically, which can increase the steady working time from 6 h (the single cathode source in our previous facilities) to about 18 h. Meanwhile, the inner diameter of the pulsed cathodic arc plasma source is increased from the previous 80 to 209 mm, thus, large area metal plasma can be obtained by the source. Instead of the simple sample holder in our previous facility, a complex revolution-rotation sample holder composed of 24 shafts, which can rotate around its axis and adjust its position through revolving around the center axis of the vacuum chamber, is fixed in the center of the vacuum chamber. In addition, one magnetron sputtering source is set on the chamber wall instead of the top cover in the previous facility. Because of the above characteristic, the PIIID hybrid process involving ion implantation, vacuum arc, and magnetron sputtering deposition can be acquired without breaking vacuum. In addition, the PIIID batch treatment of cylinderlike components can be finished by installing these components on the rotating shafts on the sample holder.

  6. Modelling on dynamics properties of a stationary argon cascaded arc plasma flows

    SciTech Connect (OSTI)

    Wei, G. D.; Qi, X.; Yang, L.

    2014-03-15

    The gas dynamics properties of a stationary arc plasma flows are studied through the numerical simulations. A two dimensional axis-symmetric turbulent magneto-hydrodynamic plasma model is developed with the commercial code ANSYS FLUENT. The reliable ?-? model is used to account for turbulence. In this paper, the plasma is assumed to be a fluid following Navier–Stokes equations, respecting local thermodynamic equilibrium, and described by only one temperature. Distributions of the pressure, velocity, temperature, density, and electric potential inside of thus cascaded arc are obtained for an arc current density of 10{sup 6}?A/m{sup 2}. The pressure inside the arc varies from 10{sup 5}?Pa to 100?Pa. The temperature at the arc axis can reach as high as 13?600?K. The electric potential drops uniformly along the axis with a magnitude of 160?V. In addition, distributions of the sonic velocity and Mach number are shown to describe supersonic behavior of thus cascaded arc, which have a good agreement with the analytical formula.

  7. High current multicharged metal ion source using high power gyrotron heating of vacuum arc plasma

    SciTech Connect (OSTI)

    Vodopyanov, A. V.; Golubev, S. V.; Khizhnyak, V. I.; Mansfeld, D. A.; Nikolaev, A. G.; Oks, E. M.; Savkin, K. P.; Vizir, A. V.; Yushkov, G. Yu.

    2008-02-15

    A high current, multi charged, metal ion source using electron heating of vacuum arc plasma by high power gyrotron radiation has been developed. The plasma is confined in a simple mirror trap with peak magnetic field in the plug up to 2.5 T, mirror ratio of 3-5, and length variable from 15 to 20 cm. Plasma formed by a cathodic vacuum arc is injected into the trap either (i) axially using a compact vacuum arc plasma gun located on axis outside the mirror trap region or (ii) radially using four plasma guns surrounding the trap at midplane. Microwave heating of the mirror-confined, vacuum arc plasma is accomplished by gyrotron microwave radiation of frequency 75 GHz, power up to 200 kW, and pulse duration up to 150 {mu}s, leading to additional stripping of metal ions by electron impact. Pulsed beams of platinum ions with charge state up to 10+, a mean charge state over 6+, and total (all charge states) beam current of a few hundred milliamperes have been formed.

  8. Shapes of Spectral Lines of Nonuniform Plasma of Electric Arc Discharge Between Copper Electrodes

    SciTech Connect (OSTI)

    Babich, Ida L.; Boretskij, Viacheslav F.; Veklich, Anatoly N.

    2007-09-28

    The radial profiles of the temperature and electron density in the plasma of the free burning electric arc between copper electrodes are studied by optical spectroscopy techniques. The electron density and the temperature in plasma as initial parameters were used in the calculation of the plasma composition in local thermodynamic equilibrium (LTE) assumption. We used the Saha's equation for copper, nitrogen and oxygen, dissociation equation for nitrogen and oxygen, the equation of plasma electrical neutrality and Dalton's law as well. So, it would be possible to determine the amounts of metal vapours in plasma.

  9. Investigation on oblique shock wave control by arc discharge plasma in supersonic airflow

    SciTech Connect (OSTI)

    Wang Jian; Li Yinghong; Xing Fei

    2009-10-01

    Wedge oblique shock wave control by arc discharge plasma in supersonic airflow was investigated theoretically, experimentally, and numerically in this paper. Using thermal choking model, the change in oblique shock wave was deduced, which refer that the start point of shock wave shifts upstream, the shock wave angle decreases, and its intensity weakens. Then the theoretical results were validated experimentally in a Mach 2.2 wind tunnel. On the test conditions of arc discharge power of approx1 kW and arc plasma temperature of approx3000 K, schlieren photography and gas pressure measurements indicated that the start point of shock wave shifted upstream of approx4 mm, the shock wave angle decreased 8.6%, and its intensity weakened 8.8%. The deduced theoretical results match the test results qualitatively, so thermal mechanism and thermal choking model are rational to explain the problem of oblique shock wave control by arc discharge plasma. Finally, numerical simulation was developed. Based on thermal mechanism, the arc discharge plasma was simplified as a thermal source term that added to the Navier-Stokes equations. The simulation results of the change in oblique shock wave were consistent with the test results, so the thermal mechanism indeed dominates the oblique shock wave control process.

  10. Use of vacuum arc plasma guns for a metal puff Z-pinch system

    SciTech Connect (OSTI)

    Rousskikh, A. G.; Zhigalin, A. S.; Oreshkin, V. I.; Chaikovsky, S. A.; Labetskaya, N. A.; Baksht, R. B.

    2011-09-15

    The performance of a metal puff Z-pinch system has been studied experimentally. In this type of system, the initial cylindrical shell 4 cm in diameter was produced by ten plasma guns. Each gun initiates a vacuum arc operating between magnesium electrodes. The net current of the guns was 80 kA. The arc-produced plasma shell was compressed by using a 450-kA, 450-ns driver, and as a result, a plasma column 0.3 cm in diameter was formed. The electron temperature of the plasma reached 400 eV at an average ion concentration of 1.85 {center_dot} 10{sup 18} cm{sup -3}. The power of the Mg K-line radiation emitted by the plasma for 15-30 ns was 300 MW/cm.

  11. Emission and Absorption Spectroscopy of Carbon Arc Plasma during Formation of Carbon Magnetic Encapsulates

    SciTech Connect (OSTI)

    Lange, H.; Labedz, O.; Huczko, A.; Bystrzejewski, M.

    2011-11-29

    Plasma diagnostics of carbon arc discharge under conditions of carbon magnetic encapsulates formation was performed by emission and absorption spectroscopy. Content of C{sub 2} and Fe species, rotational temperatures of excited (d {sup 3} product {sub g}) and non-excited (a {sup 3} product {sub u}) states, and excitation temperatures of a {sup 5}F and a {sup 3}F levels relatively to the a {sup 5}D level of Fe atoms were determined. The results pointed to a non-equilibrium state of carbon arc plasma under prevailing discharge conditions.

  12. Arc plasma generator of atomic driver for steady-state negative ion source

    SciTech Connect (OSTI)

    Ivanov, A. A.; Belchenko, Yu. I.; Davydenko, V. I.; Novosibirsk State University, Novosibirsk ; Ivanov, I. A.; Kolmogorov, V. V.; Listopad, A. A. Mishagin, V. V.; Shulzhenko, G. I.; Putvinsky, S. V.; Smirnov, A.

    2014-02-15

    The paper reviews the results of development of steady-state arc-discharge plasma generator with directly heated LaB{sub 6} cathode. This arc-discharge plasma generator produces a plasma jet which is to be converted into an atomic one after recombination on a metallic plate. The plate is electrically biased relative to the plasma in order to control the atom energies. Such an intensive jet of hydrogen atoms can be used in negative ion sources for effective production of negative ions on a cesiated surface of plasma grid. All elements of the plasma generator have an augmented water cooling to operate in long pulse mode or in steady state. The thermo-mechanical stresses and deformations of the most critical elements of the plasma generator were determined by simulations. Magnetic field inside the discharge chamber was optimized to reduce the local power loads. The first tests of the steady-state arc plasma generator prototype have performed in long-pulse mode.

  13. Optimization of the output and efficiency of a high power cascaded arc hydrogen plasma source

    SciTech Connect (OSTI)

    Vijvers, W. A. J.; Gils, C. A. J. van; Goedheer, W. J.; Meiden, H. J. van der; Veremiyenko, V. P.; Westerhout, J.; Lopes Cardozo, N. J.; Rooij, G. J. van; Schram, D. C.

    2008-09-15

    The operation of a cascaded arc hydrogen plasma source was experimentally investigated to provide an empirical basis for the scaling of this source to higher plasma fluxes and efficiencies. The flux and efficiency were determined as a function of the input power, discharge channel diameter, and hydrogen gas flow rate. Measurements of the pressure in the arc channel show that the flow is well described by Poiseuille flow and that the effective heavy particle temperature is approximately 0.8 eV. Interpretation of the measured I-V data in terms of a one-parameter model shows that the plasma production is proportional to the input power, to the square root of the hydrogen flow rate, and is independent of the channel diameter. The observed scaling shows that the dominant power loss mechanism inside the arc channel is one that scales with the effective volume of the plasma in the discharge channel. Measurements on the plasma output with Thomson scattering confirm the linear dependence of the plasma production on the input power. Extrapolation of these results shows that (without a magnetic field) an improvement in the plasma production by a factor of 10 over where it was in van Rooij et al. [Appl. Phys. Lett. 90, 121501 (2007)] should be possible.

  14. Transparent and conductive indium doped cadmium oxide thin films prepared by pulsed filtered cathodic arc deposition

    SciTech Connect (OSTI)

    Zhu, Yuankun; Mendelsberg, Rueben J.; Zhu, Jiaqi; Han, Jiecai; Anders, André

    2012-11-26

    Indium doped cadmium oxide (CdO:In) films with different In concentrations were prepared on low-cost glass substrates by pulsed filtered cathodic arc deposition (PFCAD). In this study, it is shown that polycrystalline CdO:In films with smooth surface and dense structure are obtained. In-doping introduces extra electrons leading to remarkable improvements of electron mobility and conductivity, as well as improvement in the optical transmittance due to the Burstein Moss effect. CdO:In films on glass substrates with thickness near 230 nm show low resistivity of 7.23 x 10-5 ?cm, high electron mobility of 142 cm2/Vs, and mean transmittance over 80% from 500-1250 nm (including the glass substrate). These high quality pulsed arc-grown CdO:In films are potentially suitable for high efficiency multi-junction solar cells that harvest a broad range of the solar spectrum.

  15. Thermal annealing of FePt thin films by millisecond plasma arc pulses

    SciTech Connect (OSTI)

    Inaba, Yuki; Torres, Karen; Cole, Amanda; Ott, Ronald D; Klemmer, Timothy; Harrell, J W; Thompson, Gregory

    2009-01-01

    A series of 20 and 100 nm Fe{sub 53}Pt{sub 47} thin films sputter-deposited onto Si substrates have been thermally annealed using a pulsed thermal plasma arc lamp. A series of one, three or five pulses were applied to the thin films with widths of either 50 or 100 ms. The microstructure and magnetic properties of these annealed Fe{sub 53}Pt{sub 47} films are discussed according to the various annealing conditions and A1 to L1{sub 0} phase transformation. Upon pulse annealing, the average in-plane grain size of 15 nm (nearly equivalent for both film thicknesses) was observed to increase to values near 20 nm. In general, increasing the pulse width or number of pulses increased the L1{sub 0} order parameter, tetragonality of the c/a ratio and coercivity of the specimen. The exception to this trend was for five pulses at 100 ms for both film thicknesses, which indicated a reduction of the order parameter and coercivity. This reduction is believed to be a result of the interdiffusion of Fe and Pt into the Si substrate and the formation of iron oxide clusters in the grain boundaries characterized by atom probe tomography.

  16. Tomographic interferometry of a filtered high-current vacuum arc plasma

    SciTech Connect (OSTI)

    Warr, George B.; Tarrant, Richard N.; Bilek, Marcela M. M.; McKenzie, David R.; Harris, Jeffrey H.; Howard, John; Blackwell, Boyd D.

    2007-04-01

    Tomography of a plasma enables the distribution of electron density to be visualized. We report on the design of two tomographic interferometer systems used to measure plasma electron density distributions in a high-current pulsed cathodic vacuum arc. The method is shown to be capable of microsecond time resolution. The spatial resolution of the quasioptical interferometer operating at 2 mm wavelength is 20 mm and the spatial resolution of the waveguide-based interferometer operating at 8 mm wavelength is 50 mm. In both cases the resolution achieved depends on the launching and receiving geometries. We developed criteria for assessing the tomogram for artifacts arising from limited sampling. First results of the spatial and temporal history of plasma in a high-current vacuum arc guided by a curved magnetic filter are presented and indicate poloidal field fluctuations reminiscent of magnetohydrodynamic instabilities in pinches. The applicability of the tomographic interferometry method to optimize plasma transport through the filter is also demonstrated.

  17. Surface Plasma Arc by Radio-Frequency Control Study (SPARCS)

    SciTech Connect (OSTI)

    Ruzic, David N.

    2013-04-29

    This paper is to summarize the work carried out between April 2012 and April 2013 for development of an experimental device to simulate interactions of o#11;-normal detrimental events in a tokamak and ICRF antenna. The work was mainly focused on development of a pulsed plasma source using theta pinch and coaxial plasma gun. This device, once completed, will have a possible application as a test stand for high voltage breakdown of an ICRF antenna in extreme events in a tokamak such as edge-localized modes or disruption. Currently, DEVeX does not produce plasma with high temperature enough to requirement for an ELM simulator. However, theta pinch is a good way to produce high temperature ions. The unique characteristic of plasma heating by a theta pinch is advantageous for an ELM simulator due to its effective ion heating. The objective of the proposed work, therefore, is to build a test facility using the existing theta pinch facility in addition to a coaxial plasma gun. It is expected to produce a similar pulsed-plasma heat load to the extreme events in tokamaks and to be applied for studying interactions of hot plasma and ICRF antennas.

  18. Pressure and arc voltage coupling in dc plasma torches: Identification and extraction of oscillation modes

    SciTech Connect (OSTI)

    Rat, V.; Coudert, J. F.

    2010-08-15

    This work is devoted to the instabilities occurring in a plasma torch, such as those found in plasma spraying. These instabilities are responsible for a lack of reproducibility of coatings properties, especially in the case of suspension plasma spraying that is an innovative way to obtain thin coatings of submicron-sized particles. Strong Helmholtz oscillations are highlighted in the plasma flow and it is demonstrated that they overlap with different acoustic modes in addition with the more commonly admitted ''restrike'' mode, the later being due to rearcing events in the arc region. The instabilities occur in the arc voltage but it is experimentally shown in this paper that the pressure within the torch body presents the same kind of instabilities. Besides, a numerical filtering technique has been adapted to isolate the different instability components. The operating parameters of the plasma torch were varied in order to highlight their influence on the amplitude of the different modes, both for the arc voltage and the pressure.

  19. The Radiative Transfer Of CH{sub 4}-N{sub 2} Plasma Arc

    SciTech Connect (OSTI)

    Benallal, R.; Liani, B.

    2008-09-23

    Any physical modelling of a circuit-breaker arc therefore requires an understanding of the radiated energy which is taken into account in the form of a net coefficient. The evaluation of the net emission coefficient is performed by the knowledge of the chemical plasma composition and the resolution of the radiative transfer equation. In this paper, the total radiation which escapes from a CH{sub 4}-N{sub 2} plasma is calculated in the temperature range between 5000 and 30000K on the assumption of a local thermodynamic equilibrium and we have studied the nitrogen effect in the hydrocarbon plasmas.

  20. Free fall plasma-arc reactor for synthesis of carbon nanotubes in microgravity

    SciTech Connect (OSTI)

    Alford, J. M.; Mason, G. R.; Feikema, D. A.

    2006-07-15

    High temperatures inside the plasma of a carbon arc generate strong buoyancy driven convection which has an effect on the growth and morphology of the single-walled carbon nanotubes (SWNTs). To study the effect of buoyancy on the arc process, a miniature carbon arc apparatus was designed and developed to synthesize SWNTs in a microgravity environment substantially free from buoyant convective flows. An arc reactor was operated in the 2.2 and 5.18 s drop towers at the NASA Glenn Research Center. The apparatus employed a 4 mm diameter anode and was powered by a portable battery pack capable of providing in excess of 300 A at 30 V to the arc for the duration of a 5 s drop. However, the principal result is that no dramatic difference in sample yield or composition was noted between normal gravity and 2.2 and 5 s long microgravity runs. Much longer duration microgravity time is required for SWNT's growth such as the zero-G aircraft, but more likely will need to be performed on the international space station or an orbiting spacecraft.

  1. Measurements of 3D slip velocities and plasma column lengths of a gliding arc discharge

    SciTech Connect (OSTI)

    Zhu, Jiajian; Gao, Jinlong; Ehn, Andreas; Aldén, Marcus; Li, Zhongshan E-mail: alpers@ma.tum.de; Moseev, Dmitry; Kusano, Yukihiro; Salewski, Mirko; Alpers, Andreas E-mail: alpers@ma.tum.de; Gritzmann, Peter; Schwenk, Martin

    2015-01-26

    A non-thermal gliding arc discharge was generated at atmospheric pressure in an air flow. The dynamics of the plasma column and tracer particles were recorded using two synchronized high-speed cameras. Whereas the data analysis for such systems has previously been performed in 2D (analyzing the single camera image), we provide here a 3D data analysis that includes 3D reconstructions of the plasma column and 3D particle tracking velocimetry based on discrete tomography methods. The 3D analysis, in particular, the determination of the 3D slip velocity between the plasma column and the gas flow, gives more realistic insight into the convection cooling process. Additionally, with the determination of the 3D slip velocity and the 3D length of the plasma column, we give more accurate estimates for the drag force, the electric field strength, the power per unit length, and the radius of the conducting zone of the plasma column.

  2. Long-pulse arc-discharge plasma source with cold cathode for diagnostic neutral beam injector

    SciTech Connect (OSTI)

    Deichuli, P. P.; Ivanov, A. A.; Stupishin, N. V.

    2008-02-15

    Long-pulse cold cathode arc-discharge plasma generators have been successfully used as high-quality hydrogen ion sources for plasma diagnostic neutral beams. One of the main advantages of this type of plasma source is a high proton fraction (80%-90%). However, the lifetime of the plasma source is limited due to intensive electrode's erosion, especially at the cathode region. An optimized design of the cathode and the nearest electrodes is found which reduces the erosion and allows us to increase the pulse length. The plasma source produces the extracted ion current up to 3 A at a low angular divergence, and at the pulse duration up to 2 s.

  3. Study of the effect of plasma-striking atmosphere on Fe-oxidation in thermal dc arc-plasma processing

    SciTech Connect (OSTI)

    Banerjee, I.; Khollam, Y. B.; Mahapatra, S. K.; Das, A. K.; Bhoraskar, S. V.

    2010-11-15

    The effect of plasma-striking atmosphere: air and air+Ar-gas on the crystallization of Fe-oxide phases was studied using dc thermal arc-plasma processing route. The powders were characterized by x-ray diffraction, vibrating sample magnetometry, transmission electron microscopy, and Moessbauer spectroscopy techniques. At room temperature and O{sub 2} rich atmosphere, arc-evaporated Fe{sup 2+} ions oxidize into either {gamma}-Fe{sub 2}O{sub 3} or Fe{sub 3}O{sub 4} depending upon the combining ratio of Fe with molecular O{sub 2}. Fe/O ratio could be adjusted using proper flow rate of Ar gas to crystallize the pure {gamma}-Fe{sub 2}O{sub 3}.

  4. Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication

    DOE Patents [OSTI]

    Brown, I.G.; MacGill, R.A.; Galvin, J.E.; Ogletree, D.F.; Salmeron, M.

    1998-11-24

    A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing. 8 figs.

  5. Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication

    DOE Patents [OSTI]

    Brown, Ian G. (Berkeley, CA); MacGill, Robert A. (Richmond, CA); Galvin, James E. (Emmeryville, CA); Ogletree, David F. (El Cerrito, CA); Salmeron, Miquel (El Cerrito, CA)

    1998-01-01

    A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.

  6. Analytical expression for the electric potential in the plasma sheath near an arc-cathode

    SciTech Connect (OSTI)

    Askari, S.; Minoo, H.

    2008-04-15

    An expression for the spatial dependence of the electric potential in a collisionless plasma sheath near an electron-emitting cathode is presented. The applicability of this expression for an arc cathode is demonstrated. Comparison with the numerical solutions of the model equations indicates that the sheath thickness and potential variation predicted by this expression are accurate in a wide range of the electron-emission yield.

  7. Transparent and conductive indium doped cadmium oxide thin films prepared by pulsed filtered cathodic arc deposition

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Zhu, Yuankun; Mendelsberg, Rueben J.; Zhu, Jiaqi; Han, Jiecai; Anders, André

    2012-11-26

    Indium doped cadmium oxide (CdO:In) films with different In concentrations were prepared on low-cost glass substrates by pulsed filtered cathodic arc deposition (PFCAD). In this study, it is shown that polycrystalline CdO:In films with smooth surface and dense structure are obtained. In-doping introduces extra electrons leading to remarkable improvements of electron mobility and conductivity, as well as improvement in the optical transmittance due to the Burstein Moss effect. CdO:In films on glass substrates with thickness near 230 nm show low resistivity of 7.23 x 10-5 Ωcm, high electron mobility of 142 cm2/Vs, and mean transmittance over 80% from 500-1250 nmmore » (including the glass substrate). These high quality pulsed arc-grown CdO:In films are potentially suitable for high efficiency multi-junction solar cells that harvest a broad range of the solar spectrum.« less

  8. Railguns and plasma accelerators: arc armatures, pulse power sources and US patents

    SciTech Connect (OSTI)

    Friedrich, O.M. Jr.

    1980-11-01

    Railguns and plasma accelerators have the potential for use in many basic and applied research projects, such as in creating high-pressures for equation-of-state studies and in impact fusion. A brief review of railguns and plasma accelerators with references is presented. Railgun performance is critically dependent on armature operation. Plasma arc railgun armatures are addressed. Pulsed power supplies for multi-stage railguns are considered. This includes brief comments on the compensated pulsed alternator, or compulsator, rotating machinery, and distributed energy sources for railguns. References are given at the end of each section. Appendix A contains a brief review of the US Patents on multi-staging techniques for electromagnetic accelerators, plasma propulsion devices, and electric guns.

  9. Formation of NOx precursors during Chinese pulverized coal pyrolysis in an arc plasma jet

    SciTech Connect (OSTI)

    Wei-ren Bao; Jin-cao Zhang; Fan Li; Li-ping Chang

    2007-08-15

    The formation of NOx precursors (HCN and NH{sub 3}) from the pyrolysis of several Chinese pulverized coals in an arc plasma jet was investigated through both thermodynamic analysis of the C-H-O-N system and experiments. Results of thermodynamic analysis show that the dominant N-containing gaseous species is HCN together with a small amount of ammonia above the temperature of 2000 K. The increase of H content advances the formation of HCN and NH{sub 3}, but the yields of HCN and NH{sub 3} are decreased with a high concentration of O in the system. These results are accordant with the experimental data. The increasing of input power promotes the formation of HCN and NH{sub 3} from coal pyrolysis in an arc plasma jet. Tar-N is not formed during the process. The yield of HCN changes insignificantly with the changing of the residence time of coal particles in the reactor, but that of NH{sub 3} decreases as residence times increase because of the relative instability at high temperature. Adsorption and gasification of CO{sub 2} on the coal surface also can restrain the formation of HCN and NH{sub 3} compare to the results in an Ar plasma jet. Yields of HCN and NH{sub 3} are sensitive to the coal feeding rate, indicating that NOx precursors could interact with the nascent char to form other N-containing species. The formation of HCN and NH{sub 3} during coal pyrolysis in a H{sub 2}/Ar plasma jet are not dependent on coal rank. The N-containing gaseous species is released faster than others in the volatiles during coal pyrolysis in an arc plasma jet, and the final nitrogen content in the char is lower than that in the parent coal, which it is independent of coal type. 16 refs., 9 figs., 1 tab.

  10. Ion Species and Charge States of Vacuum Arc Plasma with Gas Feed and Longitudinal Magnetic Field

    SciTech Connect (OSTI)

    Oks, Efim; Anders, Andre

    2010-06-23

    The evolution of copper ion species and charge state distributions is measured for a long vacuum arc discharge plasma operated in the presence of a longitudinal magnetic field of several 10 mT and working gas (Ar). It was found that changing the cathode-anode distance within 20 cm as well as increasing the gas pressure did not affect the arc burning voltage and power dissipation by much. In contrast, burning voltage and power dissipation were greatly increased as the magnetic field was increased. The longer the discharge gap the greater was the fraction of gaseous ions and the lower the fraction of metal ions, while the mean ion charge state was reduced. It is argued that the results are affected by charge exchange collisions and electron impact ionization.

  11. Characterization of Arc Generated Plasma Interactions with a Liquid Metal Medium

    SciTech Connect (OSTI)

    Hahn, Gregory C.; Martin, Elijah H.; Bourham, Mohamed A.

    2005-05-15

    Plasma interaction with first wall and interior reactor chamber components is an influencing factor in the design of inertial fusion facilities. The concept of a liquid metal wall, in which a circulating lithium curtain would be used, has been considered in many studies. The interaction of plasmas with moving liquid metals is a complex subject due to the influence of hydrodynamics, evaporation and droplet formation, nucleation and agglomeration of condensed particulates. To gain an understanding of some of the specific details of this interaction an experimental setup of an arc-generated plasma interacting with a liquid lead pool has been designed, constructed and operated. This simulation of the plasma-liquid interaction focuses on the particle condensation of the liquid metal after plasma interaction. The experiment generates transient high-density plasma over 50 {mu}s pulse duration. Plasma characteristics are determined by various diagnostics. A set of collection substrates are arranged to collect nucleated particulates condensing from the evolving plume. Particulate size and distribution are analyzed numerically using digital images.

  12. Element- and charge-state-resolved ion energies in the cathodic arc plasma from composite AlCr cathodes in argon, nitrogen and oxygen atmospheres

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Franz, Robert; Polcik, Peter; Anders, André

    2015-06-01

    The energy distribution functions of ions in the cathodic arc plasma using composite AlCr cathodes were measured as a function of the background gas pressure in the range 0.5 to 3.5 Pa for different cathode compositions and gas atmospheres. The most abundant aluminium ions were Al+ regardless of the background gas species, whereas Cr2+ ions were dominating in Ar and N2 and Cr+ in O2 atmospheres. The energy distributions of the aluminium and chromium ions typically consisted of a high-energy fraction due to acceleration in the expanding plasma plume from the cathode spot and thermalised ions that were subjected tomore » collisions in the plasma cloud. The fraction of the latter increased with increasing background gas pressure. Atomic nitrogen and oxygen ions showed similar energy distributions as the aluminium and chromium ions, whereas the argon and molecular nitrogen and oxygen ions were formed at greater distance from the cathode spot and thus less subject to accelerating gradients. In addition to the positively charged metal and gas ions, negatively charged oxygen and oxygen-containing ions were observed in O2 atmosphere. The obtained results are intended to provide a comprehensive overview of the ion energies and charge states in the arc plasma of AlCr composite cathodes in different gas atmospheres as such plasmas are frequently used to deposit thin films and coatings.« less

  13. Element- and charge-state-resolved ion energies in the cathodic arc plasma from composite AlCr cathodes in argon, nitrogen and oxygen atmospheres

    SciTech Connect (OSTI)

    Franz, Robert; Polcik, Peter; Anders, André

    2015-06-01

    The energy distribution functions of ions in the cathodic arc plasma using composite AlCr cathodes were measured as a function of the background gas pressure in the range 0.5 to 3.5 Pa for different cathode compositions and gas atmospheres. The most abundant aluminium ions were Al+ regardless of the background gas species, whereas Cr2+ ions were dominating in Ar and N2 and Cr+ in O2 atmospheres. The energy distributions of the aluminium and chromium ions typically consisted of a high-energy fraction due to acceleration in the expanding plasma plume from the cathode spot and thermalised ions that were subjected to collisions in the plasma cloud. The fraction of the latter increased with increasing background gas pressure. Atomic nitrogen and oxygen ions showed similar energy distributions as the aluminium and chromium ions, whereas the argon and molecular nitrogen and oxygen ions were formed at greater distance from the cathode spot and thus less subject to accelerating gradients. In addition to the positively charged metal and gas ions, negatively charged oxygen and oxygen-containing ions were observed in O2 atmosphere. The obtained results are intended to provide a comprehensive overview of the ion energies and charge states in the arc plasma of AlCr composite cathodes in different gas atmospheres as such plasmas are frequently used to deposit thin films and coatings.

  14. Charge-state-resolved ion energy distribution functions of cathodic vacuum arcs: A study involving the plasma potential and biased plasmas

    SciTech Connect (OSTI)

    Anders, Andre; Oks, Efim

    2007-02-15

    Charge-state-resolved ion energy distribution functions were measured for pulsed cathodic arcs taking the sheath into account that formed between the plasma and the entrance of a combined energy and mass spectrometer. An electron emitting probe was employed to independently determine the plasma potential. All results were obtained by averaging over several individual measurements because the instantaneous energy distributions and the plasma potential show large amplitude fluctuations due to the explosive nature of the arc plasma generation. It was found that the ion energy distribution functions in the plasma were independent of the ion charge state. This is in contrast to findings with continuously operating, direct-current arcs that employ a magnetic field at the cathode to steer the cathode spot motion. The different findings indicate the important role of the magnetic steering field for the plasma properties of direct-current arcs. The results are further supported by experiments with 'biased plasmas' obtained by shifting the potential of the anode. Finally, it was shown that the ion energy distributions were broader and shifted to higher energy at the beginning of each arc pulse. The characteristic time for relaxation to steady state distributions is about 100 {mu}s.

  15. Glow-to-arc transition events in H{sub 2}-Ar direct current pulsed plasma: Automated measurement of current and voltage

    SciTech Connect (OSTI)

    Mendes, Luciano A.; Rodrigues, Jhonatam C.; Mafra, Marcio

    2012-01-15

    The glow-to-arc transition phenomena (arcing) observed in plasma reactors used in materials processing was studied through the arcs characteristic current and voltage waveforms. In order to capture these arcs signals, a LABVIEW based automated instrumentation system (ARCVIEW) was developed, including the integration of an oscilloscope equipped with proper current and voltage probes. The system also allows capturing the process parameters at the arc occurrence moments, which were used to map the arcs events conditions. Experiments in H{sub 2}-Ar DC pulsed plasma returned signals data from 215 arcs events, which were analyzed through software routines. According to the results, an anti-arcing system should react in the time order of few microseconds to prevent most of the damage caused by the undesired arcing phenomena.

  16. Effect of cerium ions in an arc peripheral plasma on the growth of radial single-walled carbon nanotubes

    SciTech Connect (OSTI)

    Sato, Y.; Motomiya, K.; Jeyadevan, B.; Tohji, K.; Sato, G.; Ishida, H.; Hirata, T.; Hatakeyama, R.

    2005-11-01

    Radial single-walled carbon nanotubes (radial SWCNTs) are formed by using a direct current (dc) arc discharge when carbon and metal atoms are mixed in a gas phase after the vaporization and cooled together in a liquid droplet. Since SWCNTs sprout through the precipitation of saturated carbon atoms from liquid droplets during cooling, a mass synthesis of radial SWCNTs can be achieved when a large number of liquid droplets are generated. In order to understand the effects of arc peripheral plasma parameters (electrons, ions, radical atoms, and molecules) on the growth of radial SWCNTs, the optimum production efficiency of radial SWCNTs is investigated by superimposing a radio-frequency (rf) plasma on the thermal arc plasma and controlling the arc peripheral plasma density. Two parameters--the rf power and the dc potential--of the rf electrode, which is equipped above 20 mm from the center of an arc-discharge point, are changed with the constant He pressure (200 Torr), dc arc current (75 A), and power (2000 W). The production yield of radial SWCNTs is found to be enhanced under the condition of the rf power of 100 W and the dc component of the rf electrode voltage of -22 V, revealing that the optimum ion flux and ion bombardment energy are important key parameters for the formation of radial SWCNTs.

  17. Literature review of arc/plasma, combustion, and joule-heated melter vitrification systems

    SciTech Connect (OSTI)

    Freeman, C.J.; Abrigo, G.P.; Shafer, P.J.; Merrill, R.A.

    1995-07-01

    This report provides reviews of papers and reports for three basic categories of melters: arc/plasma-heated melters, combustion-heated melters, and joule-heated melters. The literature reviewed here represents those publications which may lend insight to phase I testing of low-level waste vitrification being performed at the Hanford Site in FY 1995. For each melter category, information from those papers and reports containing enough information to determine steady-state mass balance data is tabulated at the end of each section. The tables show the composition of the feed processed, the off-gas measured via decontamination factors, gross energy consumptions, and processing rates, among other data.

  18. High-Density Plasma Arc Heating Studies of FePt Thin Films

    SciTech Connect (OSTI)

    Cole, Amanda C; Thompson, Gregory; Harrell, J. W.; Weston, James; Ott, Ronald D

    2006-01-01

    The effect of pulsed-thermal-processing with high-density plasma arc heating is discussed for 20 nm thick nanocrystalline FePt thin films. The dependence of the A1 {yields} L1{sub 0} phase transformation on pulsed time and radiant energy of the pulse is quantified through x-ray diffraction and alternating gradient magnetometry. For 100 ms and 250 ms pulse widths, the phase transformation was observed. Higher radiant energy densities resulted in a larger measured coercivity associated with the L1{sub 0} phase.

  19. LLW Processing and Operational Experience using a Plasma ARC Centrifugal Treatment (PACT{sup TM}) System

    SciTech Connect (OSTI)

    Shuey, M.W.; Ottmer, P.P.

    2006-07-01

    After several years of development, a commercially available high-temperature treatment system has been developed, licensed, and installed that treats heterogeneous low-level radioactive waste. High temperature plasma processing, unique torch design and operating features make it feasible to achieve a volume reduced, permanent, high integrity waste form while eliminating the personnel exposure and costs associated with conventional sorting, characterizing and handling. The Plasma Arc Centrifugal Treatment system or PACT{sup TM} manufactured by Retech Systems LLC is a licensed thermal plasma system that processes and consolidates low level radioactive wastes. The first PACT{sup TM} thermal plasma system to be licensed was at ZWILAG (Zwischenlager Wuerenlingen AG, Switzerland) in May 2004, and the second is utilized by the Japan Atomic Power Company (JAPC) in Tsuruga, Japan in March 2005. ZWILAG uses a drum feeder that processes the 200-liter drums from storage horizontally and pours the molten slag into molds. The drums contain organic and inorganic wastes (mixed waste), and by processing the drums directly lowers exposure to processing personnel. ZWILAG production data mid-2004 through mid-June 2005 has fed 9.4 E+10 Bq of mixed waste and stabilized 8.5 E+10 Bq in slag with a mean activity of 2.1 E+09 Bq/drum. The operational experience demonstrated by ZWILAG and JAPC has been a testament to the success of thermal plasma and their unique status has proven the real benefits of using the PACT{sup TM} system. (authors)

  20. Thermodynamic study on the formation of acetylene during coal pyrolysis in the arc plasma jet

    SciTech Connect (OSTI)

    Bao, W.; Li, F.; Cai, G.; Lu, Y.; Chang, L.

    2009-07-01

    Based on the principle of minimizing the Gibbs free energy, the composition of C-H-O-N-S equilibrium system about acetylene formation during the pyrolysis in arc plasma jet for four kinds of different rank-ordered coals such as Datong, Xianfeng, Yangcheng, and Luan was analyzed and calculated. The results indicated that hydrogen, as the reactive atmosphere, was beneficial to the acetylene formation. The coal ranks and the hydrogen, oxygen, nitrogen, and sulfur in coal all could obviously affect the acetylene yield. The mole fraction of acetylene is the maximum when the ratio value of atom H/C was 2. The content of oxygen was related to the acetylene yield, but it does not compete with CO formation. These agreed with the experimental results, and they could help to select the coal type for the production of acetylene through plasma pyrolysis process.

  1. Boron Ion Implantation into Silicon by Use of the Boron Vacuum-Arc Plasma Generator

    SciTech Connect (OSTI)

    Williams, J. M.; Klepper, C. C.; Chivers, D. J.; Hazelton, R. C.; Moschella, J. J.; Keitz, M. D.

    2006-11-13

    This paper continues with presentation of experimental work pertaining to use of the boron vacuum arc (a.k.a. cathodic arc) plasma generator for boron doping in semiconductor silicon, particularly with a view to the problems associated with shallow junction doping. Progress includes development of an excellent and novel macroparticle filter and subsequent ion implantations. An important perceived issue for vacuum arc generators is the production of copious macroparticles from cathode material. This issue is more important for cathodes of materials such as carbon or boron, for which the particles are not molten or plastic, but instead are elastic, and tend to recoil from baffles used in particle filters. The present design starts with two vanes of special orientation, so as to back reflect the particles, while steering the plasma between the vanes by use of high countercurrents in the vanes. Secondly, behind and surrounding the vanes is a complex system of baffles that has been designed by a computer-based strategy to ultimately trap the particles for multiple bounces. The statistical transmittance of particles is less than 5 per coulomb of boron ions transmitted at a position just a few centimeters outside the filter. This value appears adequate for the silicon wafer application, but improvement is easily visualized as wafers will be situated much further away when they are treated in systems. A total of 11 silicon samples, comprising an area of 250 cm2, have been implanted. Particles were not detected. Sample biases ranged from 60 to 500 V. Boron doses ranged from 5 x 1014 to 5 x 1015/cm2. Exposure times ranged from 20 to 200 ms for average transmitted boron current values of about 125 mA. SIMS concentration profiles from crystalline material are presented. The results appear broadly favorable in relation to competitive techniques and will be discussed. It is concluded that doubly charged boron ions are not present in the plume.

  2. Influence of Fe-doped Graphite Electrode Characteristics on Ar-H2 Carbon Arc Plasma and SWCNT Formation

    SciTech Connect (OSTI)

    Huczko, A.; Lange, H.; Bystrzejewski, M.; Ando, Y.; Zhao, X.; Inoue, S.

    2005-09-27

    Two Fe-doped (ca. 1 at.%) homogeneous graphite electrodes (different graphite microcrystals, degree of graphitization and, thereby, electrical conductivities) electrodes were used in the process of production of single-walled carbon nanotubes in Ar-H2 arc plasma under pressure 26 kPa. The C2 content (namely carbon vapor pressure) and temperature distributions in the arc plasma were determined using optical emission spectroscopy. The mechanism of CNT formation based on carbon dimers as the building blocks seems to be at least questionable.

  3. Characterization of a plasma produced by pulsed arc using an electrostatic double probe

    SciTech Connect (OSTI)

    Garcia, L.A.; Pulzara, A.O.; Devia, A.; Restrepo, E.

    2005-05-01

    In this work the determination of plasma parameters of a pulsed-arc discharge by using an electrostatic double probe is presented. The system to generate the plasma is composed mainly of a reaction chamber, where the electrodes of different materials (Ti, Zr, Al) were placed in order to identify the variation of the plasma parameters when the cathode material is changed. An automatic system has been implemented for acquiring data starting from the bias of a double electrostatic probe. This system allowed registering complete curves of current-voltage in relatively short times ({approx_equal}30 ms). The electron density n{sub e} and electron temperature T{sub e} can be extracted from the I-V characteristic curves obtained. The advantage of this technique is its facility to provide the whole quantity of 'in situ' information, which can be compared with the theoretical results using numeric methods for the I-V curves simulation. By means of a suitable fit this allowed the determination of the plasma parameters. The values obtained for T{sub e} were in the order of 1 eV and for n{sub e} of about 10{sup 13} cm{sup -3}. A significant variation for n{sub e} was not found.

  4. Generation of high charge state metal ion beams by electron cyclotron resonance heating of vacuum arc plasma in cusp trap

    SciTech Connect (OSTI)

    Nikolaev, A. G.; Savkin, K. P.; Oks, E. M.; Vizir, A. V.; Yushkov, G. Yu.; Vodopyanov, A. V.; Izotov, I. V.; Mansfeld, D. A.

    2012-02-15

    A method for generating high charge state heavy metal ion beams based on high power microwave heating of vacuum arc plasma confined in a magnetic trap under electron cyclotron resonance conditions has been developed. A feature of the work described here is the use of a cusp magnetic field with inherent ''minimum-B'' structure as the confinement geometry, as opposed to a simple mirror device as we have reported on previously. The cusp configuration has been successfully used for microwave heating of gas discharge plasma and extraction from the plasma of highly charged, high current, gaseous ion beams. Now we use the trap for heavy metal ion beam generation. Two different approaches were used for injecting the vacuum arc metal plasma into the trap - axial injection from a miniature arc source located on-axis near the microwave window, and radial injection from sources mounted radially at the midplane of the trap. Here, we describe preliminary results of heating vacuum arc plasma in a cusp magnetic trap by pulsed (400 {mu}s) high power (up to 100 kW) microwave radiation at 37.5 GHz for the generation of highly charged heavy metal ion beams.

  5. Process maps for plasma spray. Part II: Deposition and properties

    SciTech Connect (OSTI)

    XIANGYANG,JIANG; MATEJICEK,JIRI; KULKARNI,ANAND; HERMAN,HERBERT; SAMPATH,SANJAY; GILMORE,DELWYN L.; NEISER JR.,RICHARD A

    2000-03-28

    This is the second paper of a two part series based on an integrated study carried out at the State University of New York at Stony Brook and Sandia National Laboratories. The goal of the study is the fundamental understanding of the plasma-particle interaction, droplet/substrate interaction, deposit formation dynamics and microstructure development as well as the deposit property. The outcome is science-based relationships, which can be used to link processing to performance. Molybdenum splats and coatings produced at 3 plasma conditions and three substrate temperatures were characterized. It was found that there is a strong mechanical/thermal interaction between droplet and substrate, which builds up the coatings/substrate adhesion. Hardness, thermal conductivity, and modulus increase, while oxygen content and porosity decrease with increasing particle velocity. Increasing deposition temperature resulted in dramatic improvement in coating thermal conductivity and hardness as well as increase in coating oxygen content. Indentation reveals improved fracture resistance for the coatings prepared at higher deposition temperature. Residual stress was significantly affected by deposition temperature, although not significant by particle energy within the investigated parameter range. Coatings prepared at high deposition temperature with high-energy particles suffered considerably less damage in wear tests. Possible mechanisms behind these changes are discussed within the context of relational maps which are under development.

  6. Synthesis and characterization of carbon-encapsulated magnetic nanoparticles via arc-plasma assisted CVD

    SciTech Connect (OSTI)

    Li, Z.T.; Hu, C.; Yu, C.; Qiu, J.S.

    2009-12-15

    Carbon-encapsulated magnetic nanoparticles (CEMNs) were fabricated on a large scale by arc-plasma assisted CVD in acetylene. The coal-derived metal-containing (Fe, Co and Ni) carbon rods were used as anodes, while a high-purity graphite rod was used as a cathode that remained unchanged during the arcing process. The CEMNs obtained were characterized by TEM, XRD, Raman spectroscopy, N{sub 2} adsorption isotherms and VSM. The diameter distribution of the obtained CEMNs varies from 10 to 70 nm, of which the metal cores are proximately 5-50 nm. The core phases in Fe ) nanoparticles are body-centered cubic Fe and orthorhombic Fe3C while Co ) nanoparticles and Ni ) nanoparticles show the characteristic of a face-centered cubic structure. The Fe ), Co ) and Ni ) nanoparticles with well-ordered graphitic shells have the surface area of 89 m{sup 2}/g, 72 m{sup 2}/g and 75 m{sup 2}/g, respectively. The CEMNs show ferromagnetic of which was characterized by a ratio of remnant magnetization (MR) to saturation magnetization (MS).

  7. Ion velocities in direct current arc plasma generated from compound cathodes

    SciTech Connect (OSTI)

    Zhirkov, I.; Rosen, J.; Eriksson, A. O.; Oerlikon Balzers Coating AG, Iramali 18, 9496 Balzers

    2013-12-07

    Arc plasma from Ti-C, Ti-Al, and Ti-Si cathodes was characterized with respect to charge-state-resolved ion energy. The evaluated peak velocities of different ion species in plasma generated from a compound cathode were found to be equal and independent on ion mass. Therefore, measured difference in kinetic energies can be inferred from the difference in ion mass, with no dependence on ion charge state. The latter is consistent with previous work. These findings can be explained by plasma quasineutrality, ion acceleration by pressure gradients, and electron-ion coupling. Increasing the C concentration in Ti-C cathodes resulted in increasing average and peak ion energies for all ion species. This effect can be explained by the “cohesive energy rule,” where material and phases of higher cohesive energy generally result in increasing energies (velocities). This is also consistent with the here obtained peak velocities around 1.37, 1.42, and 1.55 (10{sup 4} m/s) for ions from Ti{sub 0.84}Al{sub 0.16}, Ti{sub 0.90}Si{sub 0.10}, and Ti{sub 0.90}C{sub 0.10} cathodes, respectively.

  8. THERMAL ANNEALING OF ZNO FILMS USING HIGH-DENSITY PLASMA ARC LAMPS

    SciTech Connect (OSTI)

    Sabau, Adrian S; Dinwiddie, Ralph Barton; Xu, Jun; Angelini, Joseph Attilio; Harper, David C

    2011-01-01

    Nanostructured materials are rarely synthesized with appropriate phase and/or morphology. In this study, critical additional of as-synthesized nanostructured materials, such as annealing and/or activation of dopants, are addressed using infrared plasma arc lamps (PAL) over areas as large as 1,000 cm2. The broad spectral range of the PAL and the spectral variation of light absorption in nanostructured materials make the selection of processing parameters extremely difficult, posing a major technological barrier. In this study, the measurement of the surface temperature using various techniques for ZnO films on crystalline silicon wafers is discussed. An energy transport model for the simulation of rapid thermal processing using PAL is presented. The experimental and computational results show that the surface temperature cannot be measured directly and that computer simulation results are an effective tool for obtaining accurate data on processing temperatures.

  9. A Radiative Transport Model for Heating Paints using High Density Plasma Arc Lamps

    SciTech Connect (OSTI)

    Sabau, Adrian S; Duty, Chad E; Dinwiddie, Ralph Barton; Nichols, Mark; Blue, Craig A; Ott, Ronald D

    2009-01-01

    The energy distribution and ensuing temperature evolution within paint-like systems under the influence of infrared radiation was studied. Thermal radiation effects as well as those due to heat conduction were considered. A complete set of material properties was derived and discussed. Infrared measurements were conducted to obtain experimental data for the temperature in the paint film. The heat flux of the incident radiation from the plasma arc lamp was measured using a heat flux sensor with a very short response time. The comparison between the computed and experimental results for temperature show that the models that are based on spectral four-flux RTE and accurate optical properties yield accurate results for the black paint systems.

  10. High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition

    SciTech Connect (OSTI)

    Anders, Andre; Lim, Sunnie H.N.; Yu, Kin Man; Andersson, Joakim; Rosen, Johanna; McFarland, Mike; Brown, Jeff

    2009-04-24

    Aluminum-doped zinc oxide, ZnO:Al or AZO, is a well-known n-type transparent conducting oxide with great potential in a number of applications currently dominated by indium tin oxide (ITO). In this study, the optical and electrical properties of AZO thin films deposited on glass and silicon by pulsed filtered cathodic arc deposition are systematically studied. In contrast to magnetron sputtering, this technique does not produce energetic negative ions, and therefore ion damage can be minimized. The quality of the AZO films strongly depends on the growth temperature while only marginal improvements are obtained with post-deposition annealing. The best films, grown at a temperature of about 200?C, have resistivities in the low to mid 10-4 Omega cm range with a transmittance better than 85percent in the visible part of the spectrum. It is remarkable that relatively good films of small thickness (60 nm) can be fabricated using this method.

  11. Experimental investigation of supersonic low pressure air plasma flows obtained with different arc-jet operating conditions

    SciTech Connect (OSTI)

    Lago, Viviana; Ndiaye, Abdoul-Aziz

    2012-11-27

    A stationary arc-jet plasma flow at low pressure is used to simulate some properties of the gas flow surrounding a vehicle during its entry into celestial body's atmospheres. This paper presents an experimental study concerning plasmas simulating a re-entry into our planet. Optical measurements have been carried out for several operating plasma conditions in the free stream, and in the shock layer formed in front of a flat cylindrical plate, placed in the plasma jet. The analysis of the spectral radiation enabled the identification of the emitting species, the determination of the rotational and vibrational temperatures in the free-stream and in the shock layer and the determination of the distance of the shock to the flat plate face. Some plasma fluid parameters like, stagnation pressure, specific enthalpy and heat flux have been determined experimentally along the plasma-jet axis.

  12. Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Metzler, Dominik; Li, Chen; Engelmann, Sebastian; Bruce, Robert L.; Joseph, Eric A.; Oehrlein, Gottlieb S.

    2015-11-11

    The need for atomic layer etching (ALE) is steadily increasing as smaller critical dimensions and pitches are required in device patterning. A flux-control based cyclic Ar/C4F8 ALE based on steady-state Ar plasma in conjunction with periodic, precise C4F8 injection and synchronized plasma-based low energy Ar+ ion bombardment has been established for SiO2.1 In this work, the cyclic process is further characterized and extended to ALE of silicon under similar process conditions. The use of CHF3 as a precursor is examined and compared to C4F8. CHF3 is shown to enable selective SiO2/Si etching using a fluorocarbon (FC) film build up. Othermore » critical process parameters investigated are the FC film thickness deposited per cycle, the ion energy, and the etch step length. Etching behavior and mechanisms are studied using in situ real time ellipsometry and X-ray photoelectron spectroscopy. Silicon ALE shows less self-limitation than silicon oxide due to higher physical sputtering rates for the maximum ion energies used in this work, ranged from 20 to 30 eV. The surface chemistry is found to contain fluorinated silicon oxide during the etching of silicon. As a result, plasma parameters during ALE are studied using a Langmuir probe and establish the impact of precursor addition on plasma properties.« less

  13. Vacuum Arc Plasma Motion In A Curvilinear Magnetic Field In A Framework Of The Rigid-Rotor Model

    SciTech Connect (OSTI)

    Timoshenko, Aleksandr I.; Gnybida, Mikhail V.; Taran, Valeriy S.; Tereshin, Vladimir I.; Chechel'nitskij, Oleg G.

    2006-01-15

    Vacuum-arc plasma motion in a toroidal magnetic field is described on a base of steady-state ({partial_derivative}/{partial_derivative}t = 0) Vlasov-Maxwell equations for the long plasma column aligned parallel to a constant axial magnetic field. The relations for the self-consistent electric field, which appears due to a displacement of the electrons from the ions at the curvilinear trajectory, were derived within a framework of the drift approximation. The dynamics of the central part of the plasma flow in the electric polarization fields was considered in detail. The displacement of the plasma flow at the output of the plasma duct was calculated. The results are in a good agreement with the experimental data obtained by others authors.

  14. Gas Sensors Based on Tin Oxide Nanoparticles Synthesized from a Mini-Arc Plasma Source

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Lu, Ganhua; Huebner, Kyle L.; Ocola, Leonidas E.; Gajdardziska-Josifovska, Marija; Chen, Junhong

    2006-01-01

    Minimore » aturized gas sensors or electronic noses to rapidly detect and differentiate trace amount of chemical agents are extremely attractive. In this paper, we report on the fabrication and characterization of a functional tin oxide nanoparticle gas sensor. Tin oxide nanoparticles are first synthesized using a convenient and low-cost mini-arc plasma source. The nanoparticle size distribution is measured online using a scanning electrical mobility spectrometer (SEMS). The product nanoparticles are analyzed ex-situ by high resolution transmission electron microscopy (HRTEM) for morphology and defects, energy dispersive X-ray (EDX) spectroscopy for elemental composition, electron diffraction for crystal structure, and X-ray photoelectron spectroscopy (XPS) for surface composition. Nonagglomerated rutile tin oxide ( SnO 2 ) nanoparticles as small as a few nm have been produced. Larger particles bear a core-shell structure with a metallic core and an oxide shell. The nanoparticles are then assembled onto an e-beam lithographically patterned interdigitated electrode using electrostatic force to fabricate the gas sensor. The nanoparticle sensor exhibits a fast response and a good sensitivity when exposed to 100 ppm ethanol vapor in air.« less

  15. Modelling of arc jet plasma flow in transitional regime by Navier Stokes and state-to-state coupling

    SciTech Connect (OSTI)

    Alexandrova, T.; Izrar, B.; Lino da Silva, M.; Dudeck, M.

    2005-05-16

    The combination of 2D Navier-Stokes and state-to-state approaches has been used to describe the air plasma flow in an arc-jet. The gas dynamic parameters were calculated in Navier-Stokes approximation in a steady state description without chemical reaction and vibrational exchanges. And then, the set of equations of vibrational level densities and atomic species densities was locally solved. Experimental validations have been performed.

  16. Comparative study of two- and three-dimensional modeling on arc discharge phenomena inside a thermal plasma torch with hollow electrodes

    SciTech Connect (OSTI)

    Kim, Keun Su; Park, Jin Myung; Choi, Sooseok; Kim, Jongin; Hong, Sang Hee

    2008-02-15

    A comparative study between two- and three-dimensional (2D and 3D) modeling is carried out on arc discharge phenomena inside a thermal plasma torch with hollow electrodes, in order to evaluate the effects of arc root configuration characterized by either 2D annular or 3D highly localized attachment on the electrode surface. For this purpose, a more precise 3D transient model has been developed by taking account of 3D arc current distribution and arc root rotation. The 3D simulation results apparently reveal that the 3D arc root attachment brings about the inherent 3D and turbulence nature of plasma fields inside the torch. It is also found that the constricted arc column near the vortex chamber plays an important role in heating and acceleration of injected arc gases by concentrating arc currents on the axis of the hollow electrodes. The inherent 3D nature of arc discharge is well preserved inside the cathode region, while these 3D features slowly diminish behind the vortex chamber where the turbulent flow begins to be developed in the anode region. Based on the present simulation results, it is noted that the mixing effects of the strong turbulent flow on the heat and mass transfer are mainly responsible for the gradual relaxation of the 3D structures of plasma fields into the 2D axisymmetric ones that eventually appear in the anode region near the torch exit. From a detailed comparison of the 3D results with the 2D ones, the arc root configuration seems to have a significant effect on the heat transfer to the electrode surfaces interacting with the turbulent plasma flow. That is, in the 2D simulation based on an axisymmetric stationary model, the turbulence phenomena are fairly underestimated and the amount of heat transferred to the cold anode wall is calculated to be smaller than that obtained in the 3D simulation. For the validation of the numerical simulations, calculated plasma temperatures and axial velocities are compared with experimentally measured ones, and the 3D simulation turns out to be more accurate than the 2D simulation as a result of a relatively precise description of the turbulent phenomena inside the torch using a more realistic model of arc root attachment. Finally, it is suggested that the 3D transient formulation is indeed required for describing the real arc discharge phenomena inside the torch, while the 2D stationary approach is sometimes useful for getting practical information about the time-averaged plasma characteristics outside the torch because of its simplicity and rapidness in computation.

  17. TiO{sub 2} Film Deposition by Atmospheric Thermal Plasma CVD Using Laminar and Turbulence Plasma Jets

    SciTech Connect (OSTI)

    Ando, Yasutaka; Tobe, Shogo [Ashikaga Institute of Technology, 268-1 Omae, Ashikaga, Tochigi 326-8558 (Japan); Tahara, Hirokazu [Osaka Institute of Technology, 5-16-1 Omiya, Asahi-Ku, Osaka 535-8585 (Japan)

    2008-02-21

    In this study, to provide continuous plasma atmosphere on the substrate surface in the case of atmospheric thermal plasma CVD, TiO{sub 2} film deposition by thermal plasma CVD using laminar plasma jet was carried out. For comparison, the film deposition using turbulence plasma jet was conducted as well. Consequently, transition of the plasma jet from laminar to turbulent occurred on the condition of over 3.5 1/min in Ar working gas flow rate and the plasma jet became turbulent on the condition of over 10 1/min. In the case of the turbulent plasma jet use, anatase rich titanium oxide film could be obtained though plasma jet could not contact with the surface of the substrate continuously even on the condition that feedstock material was injected into the plasma jet. On the other hand,, in the case of laminar gas flow rate, the plasma jet could contact with the substrate continuously without melt down of the substrate during film deposition. Besides, titanium oxide film could be obtained even in the case of the laminar plasma jet use. From these results, this technique was thought to have high potential for atmospheric thermal plasma CVD.

  18. Ion sources with arc-discharge plasma box driven by directly heated LaB{sub 6} electron emitter or cold cathode (invited)

    SciTech Connect (OSTI)

    Ivanov, Alexander A.; Davydenko, Vladimir I.; Deichuli, Petr P.; Shulzhenko, Grigori I.; Stupishin, Nikolay V.

    2008-02-15

    In the Budker Institute, Novosibirsk, an ion source with arc-discharge plasma box has been developed in the recent years for application in thermonuclear devices for plasma diagnostics. Several modifications of the ion source were provided with extracted current ranging from 1 to 7 A and pulse duration of up to 4 s. Initially, the arc-discharge plasma box with cold cathode was used, with which pulse duration is limited to 2 s by the cathode overheating and sputtering in local arc spots. Recently, a directly heated LaB{sub 6} electron emitter was employed instead, which has extended lifetime compared to the cold cathode. In the paper, characteristics of the beam produced with both arrangements of the plasma box are presented.

  19. Tunable, self-powered integrated arc plasma-melter vitrification system for waste treatment and resource recovery

    DOE Patents [OSTI]

    Titus, Charles H.; Cohn, Daniel R.; Surma, Jeffrey E.

    1998-01-01

    The present invention provides a relatively compact self-powered, tunable waste conversion system and apparatus which has the advantage of highly robust operation which provides complete or substantially complete conversion of a wide range of waste streams into useful gas and a stable, nonleachable solid product at a single location with greatly reduced air pollution to meet air quality standards. The system provides the capability for highly efficient conversion of waste into high quality combustible gas and for high efficiency conversion of the gas into electricity by utilizing a high efficiency gas turbine or by an internal combustion engine. The solid product can be suitable for various commercial applications. Alternatively, the solid product stream, which is a safe, stable material, may be disposed of without special considerations as hazardous material. In the preferred embodiment of the invention, the arc plasma furnace and joule heated melter are formed as a fully integrated unit with a common melt pool having circuit arrangements for the simultaneous independently controllable operation of both the arc plasma and the joule heated portions of the unit without interference with one another. The preferred configuration of this embodiment of the invention utilizes two arc plasma electrodes with an elongated chamber for the molten pool such that the molten pool is capable of providing conducting paths between electrodes. The apparatus may additionally be employed with reduced or without further use of the gases generated by the conversion process. The apparatus may be employed as a self-powered or net electricity producing unit where use of an auxiliary fuel provides the required level of electricity production.

  20. Development of a plasma arc system for the destruction of U.S. Department of Defense hazardous waste

    SciTech Connect (OSTI)

    Sartwell, B.D.; Gehrman, F.H. Jr.; Telfer, T.R.

    1999-07-01

    The Naval Base, Norfolk, located in the northern portion of the city of Norfolk, Virginia, is the world's largest naval base and home of the Atlantic Fleet. Activities at the naval base generate approximately 1.4 million kilograms (3.0 million pounds) of industrial waste (hazardous and non-hazardous) annually. Significant components of the waste stream include used paint, cleaning rags, cleaning compounds, solvents, and other chemicals used in industrial operations. The costs of disposing of this waste are significant and are currently over $4 million annually, representing an average of $3.30 per kilogram ($1.50 per pound). Plasma arc technology has been identified as having the potential to cost-effectively treat and destroy various types of waste materials, including contaminated soil, ordnance, pyrotechnics, and low-level radioactive waste. There are currently several pilot-scale plasma arc units being tested in the United States, but at present there are no fully-permitted production-scale units in operation. In July 1995 a project was awarded to the Naval Research Laboratory and Norfolk Naval Base under the DOD Environmental Security Technology Certification Program with the objective of establishing a production scale demonstration plasma arc hazardous waste treatment facility (PAHWTF) at the Naval Base that would be capable of destroying both solid and liquid waste on a production basis and obtaining operational data necessary to determine the cost effectiveness of the process. This paper provides a detailed description of the PAHWTF, which was designed and built by Retech in Ukiah, CA, and also provides results of treatability tests. Information is also provided on the status of an Environmental Impact Statement and of RCRA Research, Development, and Demonstration, and air permits.

  1. Departures from local thermodynamic equilibrium in cutting arc plasmas derived from electron and gas density measurements using a two-wavelength quantitative Schlieren technique

    SciTech Connect (OSTI)

    Prevosto, L.; Mancinelli, B.; Artana, G.; Kelly, H.

    2011-03-15

    A two-wavelength quantitative Schlieren technique that allows inferring the electron and gas densities of axisymmetric arc plasmas without imposing any assumption regarding statistical equilibrium models is reported. This technique was applied to the study of local thermodynamic equilibrium (LTE) departures within the core of a 30 A high-energy density cutting arc. In order to derive the electron and heavy particle temperatures from the inferred density profiles, a generalized two-temperature Saha equation together with the plasma equation of state and the quasineutrality condition were employed. Factors such as arc fluctuations that influence the accuracy of the measurements and the validity of the assumptions used to derive the plasma species temperature were considered. Significant deviations from chemical equilibrium as well as kinetic equilibrium were found at elevated electron temperatures and gas densities toward the arc core edge. An electron temperature profile nearly constant through the arc core with a value of about 14000-15000 K, well decoupled from the heavy particle temperature of about 1500 K at the arc core edge, was inferred.

  2. Measurements of the Ion Species of Cathodic Arc Plasma in an Axial Magnetic Field

    SciTech Connect (OSTI)

    Oks, Efim; Anders, Andre

    2010-10-19

    Metal and gas ion species and their charge state distributions were measured for pulsed copper cathodic arcs in argon background gas in the presence of an axial magnetic field. It was found that changing the cathode position relative to anode and ion extraction system as well as increasing the gas pressure did not much affect the arc burning voltage and the related power dissipation. However, the burning voltage and power dissipation greatly increased as the magnetic field strength was increased. The fraction of metal ions and the mean ion charge state were reduced as the discharge length was increased. The observations can be explained by the combination of charge exchange collisions and electron impact ionization. They confirm that previously published data on characteristic material-dependent charge state distributions (e.g., Anders and Yushkov, J. Appl. Phys., Vol. 91, pp. 4824-4832, 2002) are not universal but valid for high vacuum conditions and the specifics of the applied magnetic fields.

  3. Physical characteristics of gliding arc discharge plasma generated in a laval nozzle

    SciTech Connect (OSTI)

    Lu, S. Y.; Sun, X. M.; Li, X. D.; Yan, J. H.; Du, C. M.

    2012-07-15

    The dynamic behavior of gliding arc discharge generated in a Laval nozzle has been investigated by electrical diagnostics and a high-speed camera. The results show that the voltage waveform keeps the initial shape as the gas flow rate is small, while it becomes less stable with increasing flow rate. During the first half of a cycle, the voltage rises and after that it decreases. In nitrogen and oxygen, the break down voltage for the arc is between 3.3 and 5.5 kV, while it is between 3.3-7.5 kV in air. The waveform of current I remains almost stable; and for nitrogen and oxygen, the maximum value of current I is between 0.28 and 0.46 A. With increasing flow rate, the power consumption in air first increases and then decreases; it remains in the range of 110-217 W, and gradually increases in nitrogen and oxygen. The power consumption in oxygen is lower than that in nitrogen; the input of the energy density decreases with increasing flow rate for all the three gases. The development of the arc is tracked and recorded by a high-speed camera. The cycle is stable at 10 ms for flow rates up to 1 m{sup 3} h{sup -1}. At a higher flow rate, the cycle becomes unstable.

  4. Photoelectron emission from metal surfaces induced by VUV-emission of filament driven hydrogen arc discharge plasma

    SciTech Connect (OSTI)

    Laulainen, J.; Kalvas, T.; Koivisto, H.; Komppula, J.; Tarvainen, O.

    2015-04-08

    Photoelectron emission measurements have been performed using a filament-driven multi-cusp arc discharge volume production H{sup ?} ion source (LIISA). It has been found that photoelectron currents obtained with Al, Cu, Mo, Ta and stainless steel (SAE 304) are on the same order of magnitude. The photoelectron currents depend linearly on the discharge power. It is shown experimentally that photoelectron emission is significant only in the short wavelength range of hydrogen spectrum due to the energy dependence of the quantum efficiency. It is estimated from the measured data that the maximum photoelectron flux from plasma chamber walls is on the order of 1 A per kW of discharge power.

  5. Effect of non-uniform electron energy distribution function on plasma production in large arc driven negative ion source

    SciTech Connect (OSTI)

    Shibata, T.; Koga, S.; Terasaki, R.; Hatayama, A.; Inoue, T.; Dairaku, M.; Kashiwagi, M.; Taniguchi, M.; Tobari, H.; Tsuchida, K.; Umeda, N.; Watanabe, K.

    2012-02-15

    Spatially non-uniform electron energy distribution function (EEDF) in an arc driven negative ion source (JAEA 10A negative ion source: 10 A NIS) is calculated numerically by a three-dimensional Monte Carlo kinetic model for electrons to understand spatial distribution of plasma production (such as atomic and ionic hydrogen (H{sup 0}/H{sup +}) production) in source chamber. The local EEDFs were directly calculated from electron orbits including electromagnetic effects and elastic/inelastic collision forces. From the EEDF, spatial distributions of H{sup 0}/H{sup +} production rate were obtained. The results suggest that spatial non-uniformity of H{sup 0}/H{sup +} productions is enhanced by high energy component of EEDF.

  6. Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics

    SciTech Connect (OSTI)

    Bayiati, P.; Tserepi, A.; Petrou, P. S.; Kakabakos, S. E.; Misiakos, K.; Gogolides, E. [Institute of Microelectronics-NCSR 'Demokritos', POB 60228, 153 10 Aghia Paraskevi, Attiki (Greece); Institute of Radioisotopes and Radiodiagnostic Products-NCSR 'Demokritos', POB 60228, 153 10 Aghia Paraskevi, Attiki (Greece); Institute of Microelectronics-NCSR 'Demokritos', POB 60228, 153 10 Aghia Paraskevi, Attiki (Greece)

    2007-05-15

    The present work focuses on the plasma deposition of fluorocarbon (FC) films on surfaces and the electrostatic control of their wettability (electrowetting). Such films can be employed for actuation of fluid transport in microfluidic devices, when deposited over patterned electrodes. Here, the deposition was performed using C{sub 4}F{sub 8} and the plasma parameters that permit the creation of films with optimized properties desirable for electrowetting were established. The wettability of the plasma-deposited surfaces was characterized by means of contact angle measurements (in the static and dynamic mode). The thickness of the deposited films was probed in situ by means of spectroscopic ellipsometry, while the surface roughness was provided by atomic force microscopy. These plasma-deposited FC films in combination with silicon nitride, a material of high dielectric constant, were used to create a dielectric structure that requires reduced voltages for successful electrowetting. Electrowetting experiments using protein solutions were conducted on such optimized dielectric structures and were compared with similar structures bearing commercial spin-coated Teflon registered amorphous fluoropolymer (AF) film as the hydrophobic top layer. Our results show that plasma-deposited FC films have desirable electrowetting behavior and minimal protein adsorption, a requirement for successful transport of biological solutions in 'digital' microfluidics.

  7. Facility for high heat flux testing of irradiated fusion materials and components using infrared plasma arc lamps

    SciTech Connect (OSTI)

    Sabau, Adrian S; Ohriner, Evan Keith; Kiggans, Jim; Harper, David C; Snead, Lance Lewis; Schaich, Charles Ross

    2014-01-01

    A new high-heat flux testing facility using water-wall stabilized high-power high-pressure argon Plasma Arc Lamps (PALs) has been developed for fusion applications. It can handle irradiated plasma facing component materials and mock-up divertor components. Two PALs currently available at ORNL can provide maximum incident heat fluxes of 4.2 and 27 MW/m2 over a heated area of 9x12 and 1x10 cm2, respectively, which are fusion-prototypical steady state heat flux conditions. The facility will be described and the main differences between the photon-based high-heat flux testing facilities, such as PALs, and the e-beam and particle beam facilities more commonly used for fusion HHF testing are discussed. The components of the test chamber were designed to accommodate radiation safety and materials compatibility requirements posed by high-temperature exposure of low levels irradiated tungsten articles. Issues related to the operation and temperature measurements during testing are presented and discussed.

  8. High-Heat Flux Testing of Irradiated Tungsten based Materials for Fusion Applications using Infrared Plasma Arc Lamps

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Sabau, Adrian S; Ohriner, Evan Keith; Kiggans, Jr, James O; Schaich, Charles Ross; Ueda, Yoshio; Harper, David C; Katoh, Yutai; Snead, Lance Lewis; Byun, Thak Sang

    2014-01-01

    Testing of advanced materials and component mock-ups under prototypical fusion high-heat flux conditions, while historically a mainstay of fusion research has proved challenging, especially for irradiated materials. A new high-heat flux testing facility based on water-wall Plasma Arc Lamps (PALs) is now being used for materials and small component testing. Two PAL systems, utilizing a 12,000 C plasma arc contained in a quartz tube cooled by a spiral water flow over the inside tube surface, are currently in use. The first PAL system provides a maximum incident heat flux of 4.2 MW/m2 over an area of 9x12 cm2. The secondmore » PAL available at ORNL provides a maximum incident heat flux of 27 MW/m2 over an area of 1x10 cm2. The absorbed heat fluxes into a tungsten target for the two PALs are approximately 1.97 and 12.7 MW/m2, respectively. This paper will present the overall design of the new PAL facilities as well as the design and implementation of the Irradiated Material Target Station (IMTS). The IMTS is primarily designed for testing the effects of heat flux or thermal cycling on material coupons of interested, such as those for plasma facing components. Moreover, IMTS designs are underway to extend the testing of small mock-ups for assessing the combined heating and thermomechanical effects of cooled, irradiated components. For the testing of material coupons , the specimens are placed in a shallow recess within the molybdenum holder that is attached to a water-cooled copper alloy rod. As the measurement of the specimen temperature for PAL is historically challenging since traditional approaches of temperature measurement cannot be employed due to the infrared heating and proximity of the PAL reflector to the specimen that does not allow a direct line of site, experiments for temperature calibration are presented. Finally, results for the high-heat flux testing of tungsten-based materials using the PAL are presented. As a demonstration of the system, results will be shown of thermal fatigue and high-heat flux testing of tungsten coupon specimens that were neutron irradiated in the HFIR reactor to neutron dose consistent to ITER lifetime.« less

  9. High-Heat Flux Testing of Irradiated Tungsten based Materials for Fusion Applications using Infrared Plasma Arc Lamps

    SciTech Connect (OSTI)

    Sabau, Adrian S; Ohriner, Evan Keith; Kiggans Jr, James O; Schaich, Charles Ross; Ueda, Yoshio; Harper, David C; Katoh, Yutai; Snead, Lance Lewis; Byun, Thak Sang

    2014-01-01

    Testing of advanced materials and component mock-ups under prototypical fusion high-heat flux conditions, while historically a mainstay of fusion research has proved challenging, especially for irradiated materials. A new high-heat flux testing facility based on water-wall Plasma Arc Lamps (PALs) is now being used for materials and small component testing. Two PAL systems, utilizing a 12,000 C plasma arc contained in a quartz tube cooled by a spiral water flow over the inside tube surface, are currently in use. The first PAL system provides a maximum incident heat flux of 4.2 MW/m2 over an area of 9x12 cm2. The second PAL available at ORNL provides a maximum incident heat flux of 27 MW/m2 over an area of 1x10 cm2. The absorbed heat fluxes into a tungsten target for the two PALs are approximately 1.97 and 12.7 MW/m2, respectively. This paper will present the overall design of the new PAL facilities as well as the design and implementation of the Irradiated Material Target Station (IMTS). The IMTS is primarily designed for testing the effects of heat flux or thermal cycling on material coupons of interested, such as those for plasma facing components. Moreover, IMTS designs are underway to extend the testing of small mock-ups for assessing the combined heating and thermomechanical effects of cooled, irradiated components. For the testing of material coupons , the specimens are placed in a shallow recess within the molybdenum holder that is attached to a water-cooled copper alloy rod. As the measurement of the specimen temperature for PAL is historically challenging since traditional approaches of temperature measurement cannot be employed due to the infrared heating and proximity of the PAL reflector to the specimen that does not allow a direct line of site, experiments for temperature calibration are presented. Finally, results for the high-heat flux testing of tungsten-based materials using the PAL are presented. As a demonstration of the system, results will be shown of thermal fatigue and high-heat flux testing of tungsten coupon specimens that were neutron irradiated in the HFIR reactor to neutron dose consistent to ITER lifetime.

  10. An innovative high-power constant-current pulsed-arc power-supply for a high-density pulsed-arc-plasma ion-source using a LaB{sub 6}-filament

    SciTech Connect (OSTI)

    Ueno, A.; Oguri, H.; Ikegami, K.; Namekawa, Y.; Ohkoshi, K.; Tokuchi, A.

    2010-02-15

    An innovative high-power constant-current (CC) pulsed-arc (PA) power-supply (PS) indispensable for a high-density PA plasma ion-source using a lanthanum hexaboride (LaB{sub 6}) filament was devised by combining a constant-voltage (CV) PA-PS, which is composed of an insulated gate bipolar transistor (IGBT) switch, a CV direct-current (dc) PS and a 270 mF capacitor with a CC-PA-PS, which is composed of an IGBT-switch, a CC-dc-PS and a 400 {mu}H inductor, through the inductor. The hybrid-CC-PA-PS succeeded in producing a flat arc-pulse with a peak power of 56 kW (400 Ax140 V) and a duty factor of more than 1.5%(600 {mu}sx25 Hz) for Japan Proton Accelerator Research Complex (J-PARC) H{sup -} ion-source stably. It also succeeded in shortening the 99% rising-time of the arc-pulse-current to about 20 {mu}s and tilting up or down the arc-pulse-current arbitrarily and almost linearly by changing the setting voltage of its CV-dc-PS.

  11. Niobium thin film coating on a 500-MHz copper cavity by plasma deposition

    SciTech Connect (OSTI)

    Haipeng Wang; Genfa Wu; H. Phillips; Robert Rimmer; Anne-Marie Valente; Andy Wu

    2005-05-16

    A system using an Electron Cyclotron Resonance (ECR) plasma source for the deposition of a thin niobium film inside a copper cavity for superconducting accelerator applications has been designed and is being constructed. The system uses a 500-MHz copper cavity as both substrate and vacuum chamber. The ECR plasma will be created to produce direct niobium ion deposition. The central cylindrical grid is DC biased to control the deposition energy. This paper describes the design of several subcomponents including the vacuum chamber, RF supply, biasing grid and magnet coils. Operational parameters are compared between an operating sample deposition system and this system. Engineering work progress toward the first plasma creation will be reported here.

  12. Niobium Thin Film Coating on a 500-MHz Copper Cavity by Plasma Deposition

    SciTech Connect (OSTI)

    Haipeng Wang; Genfa Wu; H. Phillips; Robert Rimmer; Anne-Marie Valente; Andy Wu

    2005-05-16

    A system using an Electron Cyclotron Resonance (ECR) plasma source for the deposition of a thin niobium film inside a copper cavity for superconducting accelerator applications has been designed and is being constructed. The system uses a 500-MHz copper cavity as both substrate and vacuum chamber. The ECR plasma will be created to produce direct niobium ion deposition. The central cylindrical grid is DC biased to control the deposition energy. This paper describes the design of several subcomponents including the vacuum chamber, RF supply, biasing grid and magnet coils. Operational parameters are compared between an operating sample deposition system and this system. Engineering work progress toward the first plasma creation will be reported here.

  13. High-RRR thin-films of NB produced using energetic condensation from a coaxial, rotating vacuum ARC plasma (CEDTM)

    SciTech Connect (OSTI)

    Enrique Francisco Valderrama, Colt James, Mahadevan Krishnan, Xin Zhao, Larry Phillips, Charles Reece, Kang Seo

    2012-07-01

    We have recently demonstrated unprecedentedly high values of RRR (up to 542) in thin-films of pure Nb deposited on a-plane sapphire and MgO crystal substrates. The Nb films were grown using a vacuum arc discharge struck between a reactor grade Nb cathode rod (RRR {approx} 30) and a coaxial, semi-transparent Mo mesh anode, with a heated substrate placed just outside it. The substrates were pre-heated for several hours prior to deposition at different temperatures. Low pre-heat temperatures (<300 C) and deposition temperatures (<300 C) give low RRR (<50) films, whereas higher pre-heat (700 C) and coating temperatures (500 C) give RRR=214 on a-sapphire and RRR=542 on MgO. XRD (Bragg-Brentano scans and Pole Figures), EBSD and SIMS data reveal several features: (1) on asapphire, higher temperatures show better 3D registry for epitaxial growth of Nb; the crystal structure evolves from textured, polycrystalline (with twins) to single-crystal; (2) on MgO, there is a transition from {l_brace}110{r_brace} planes to {l_brace}100{r_brace} as the temperature is increased beyond 500 C. The dramatic increase in RRR (from {approx}10 at <300 C to {approx}500 at >600 C) is correlated with better epitaxial crystal structure in both a-sapphire and MgO substrate grown films. However, the SIMS data reveal that the most important requirement for high-RRR Nb films on either substrate is the reduction of impurities in the film, especially hydrogen. The hydrogen content in the MgO grown films is 1000 times lower than in bulk Nb tested as a reference from SRF cavity grade Nb. This result has potential implications for SRF accelerators. Coating bulk Nb cavities with an MgO layer followed by our CEDTM deposited Nb films, might create superior SRF cavities that would avoid Q-slope and operate at higher peak fields.

  14. Evaluation of Cooling Conditions for a High Heat Flux Testing Facility Based on Plasma-Arc Lamps

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Charry, Carlos H.; Abdel-khalik, Said I.; Yoda, Minami; Sabau, Adrian S.; Snead, Lance Lewis

    2015-07-31

    The new Irradiated Material Target Station (IMTS) facility for fusion materials at Oak Ridge National Laboratory (ORNL) uses an infrared plasma-arc lamp (PAL) to deliver incident heat fluxes as high as 27 MW/m2. The facility is being used to test irradiated plasma-facing component materials as part of the joint US-Japan PHENIX program. The irradiated samples are to be mounted on molybdenum sample holders attached to a water-cooled copper rod. Depending on the size and geometry of samples, several sample holders and copper rod configurations have been fabricated and tested. As a part of the effort to design sample holders compatiblemore » with the high heat flux (HHF) testing to be conducted at the IMTS facility, numerical simulations have been performed for two different water-cooled sample holder designs using the ANSYS FLUENT 14.0 commercial computational fluid dynamics (CFD) software package. The primary objective of this work is to evaluate the cooling capability of different sample holder designs, i.e. to estimate their maximum allowable incident heat flux values. 2D axisymmetric numerical simulations are performed using the realizable k-ε turbulence model and the RPI nucleate boiling model within ANSYS FLUENT 14.0. The results of the numerical model were compared against the experimental data for two sample holder designs tested in the IMTS facility. The model has been used to parametrically evaluate the effect of various operational parameters on the predicted temperature distributions. The results were used to identify the limiting parameter for safe operation of the two sample holders and the associated peak heat flux limits. The results of this investigation will help guide the development of new sample holder designs.« less

  15. Evaluation of Cooling Conditions for a High Heat Flux Testing Facility Based on Plasma-Arc Lamps

    SciTech Connect (OSTI)

    Charry, Carlos H.; Abdel-khalik, Said I.; Yoda, Minami; Sabau, Adrian S.; Snead, Lance Lewis

    2015-07-31

    The new Irradiated Material Target Station (IMTS) facility for fusion materials at Oak Ridge National Laboratory (ORNL) uses an infrared plasma-arc lamp (PAL) to deliver incident heat fluxes as high as 27 MW/m2. The facility is being used to test irradiated plasma-facing component materials as part of the joint US-Japan PHENIX program. The irradiated samples are to be mounted on molybdenum sample holders attached to a water-cooled copper rod. Depending on the size and geometry of samples, several sample holders and copper rod configurations have been fabricated and tested. As a part of the effort to design sample holders compatible with the high heat flux (HHF) testing to be conducted at the IMTS facility, numerical simulations have been performed for two different water-cooled sample holder designs using the ANSYS FLUENT 14.0 commercial computational fluid dynamics (CFD) software package. The primary objective of this work is to evaluate the cooling capability of different sample holder designs, i.e. to estimate their maximum allowable incident heat flux values. 2D axisymmetric numerical simulations are performed using the realizable k-? turbulence model and the RPI nucleate boiling model within ANSYS FLUENT 14.0. The results of the numerical model were compared against the experimental data for two sample holder designs tested in the IMTS facility. The model has been used to parametrically evaluate the effect of various operational parameters on the predicted temperature distributions. The results were used to identify the limiting parameter for safe operation of the two sample holders and the associated peak heat flux limits. The results of this investigation will help guide the development of new sample holder designs.

  16. Microlaminate composite structures by low pressure plasma spray deposition

    SciTech Connect (OSTI)

    Castro, R.G.; Stanek, P.W.

    1988-01-01

    The low pressure plasma spray (LPPS) process has been utilized in the development and fabrication of metal/metal, metal/carbide, and metal/oxide composite structures; including particulate dispersion and both continuous and discontinuous laminates. This report describes the LPPS process and the development of copper/tungsten microlaminate structures utilizing this processing method. Microstructures and mechanical properties of the Cu/W composites are compared to conventionally produced constituent material properties. 4 refs., 6 figs., 2 tabs.

  17. Nonequilibrium phenomena and determination of plasma parameters in the hot core of the cathode region in free-burning arc discharges

    SciTech Connect (OSTI)

    Kuehn, Gerrit; Kock, Manfred

    2007-01-15

    We present spectroscopic measurements of plasma parameters (electron density n{sub e}, electron temperature T{sub e}, gas temperature T{sub g}, underpopulation factor b) in the hot-core region in front of the cathode of a low-current, free-burning arc discharge in argon under atmospheric pressure. The discharge is operated in the hot-core mode, creating a hot cathode region with plasma parameters similar to high-current arcs in spite of the fact that we use comparatively low currents (less than 20 A). We use continuum emission and (optically thin) line emission to determine n{sub e} and T{sub e}. We apply relaxation measurements based on a power-interruption technique to investigate deviations from local thermodynamic equilibrium (LTE). These measurements let us determine the gas temperature T{sub g}. All measurements are performed side-on with charge-coupled-device cameras as detectors, so that all measured plasma parameters are spatially resolved after an Abel inversion. This yields the first ever spatially resolved observation of the non-LTE phenomena of the hot core in the near-cathode region of free-burning arcs. The results only partly coincide with previously published predictions and measurements in the literature.

  18. Nature of high-energy ions in the cathode plasma jet of a vacuum arc with high rate of current rise

    SciTech Connect (OSTI)

    Beilis, I.I.

    2004-10-04

    The production mechanism of extremely high-energy (up to 10 keV) ions observed in vacuum arcs having only a few tens of volts of arc voltage was considered. A model was developed for the plasma acceleration in a high-current ({>=}1 kA) short pulsed (<1 {mu}s) vacuum arc, taking into account the high rate of rise of the spot current (dI/dt>100 MA/s). A system of equations, including equations for the cathode spot and the plasma jet, was solved self-consistently with dI/dt in the range of 0.1-10 GA/s. It was shown that the plasma could be accelerated to the measured energy in the near spot region due to a gas dynamic mechanism and that the ion energy depends on the ratio of the ion flux to the electron flux. This ratio is determined by the cathode erosion rate. The calculated cathode erosion rate varies from 200 to 10 {mu}g/C when the ion energy increases from 0.1 to 10 keV and well agrees with measurements.

  19. Plasma-based ion implantation and deposition: A review of physics,technology, and applications

    SciTech Connect (OSTI)

    Pelletier, Jacques; Anders, Andre

    2005-05-16

    After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used of PBII&D to produce surgical implants, bio- and blood-compatible surfaces and coatings, etc. With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures. We use the acronym PBII&D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.

  20. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    SciTech Connect (OSTI)

    Dechana, A.; Thamboon, P.; Boonyawan, D.

    2014-10-15

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al{sub 2}O{sub 3} layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al{sub 2}O{sub 3} films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  1. Characterization of bismuth nanospheres deposited by plasma focus device

    SciTech Connect (OSTI)

    Ahmad, M.; Al-Hawat, Sh.; Akel, M.; Mrad, O.

    2015-02-14

    A new method for producing thin layer of bismuth nanospheres based on the use of low energy plasma focus device is demonstrated. Various techniques such as scanning electron microscopy, Rutherford backscattering spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and Raman spectroscopy have been used to characterize the morphology and the composition of the nanospheres. Experimental parameters may be adjusted to favour the formation of bismuth nanospheres instead of microspheres. Therefore, the formation of large surface of homogeneous layer of bismuth nanospheres with sizes of below 100?nm can be obtained. The natural snowball phenomenon is observed to be reproduced in nanoscale where spheres roll over the small nanospheres and grow up to bigger sizes that can reach micro dimensions. The comet-like structure, a reverse phenomenon to snowball is also observed.

  2. Plasma-enhanced chemical vapor deposition of graphene on copper substrates

    SciTech Connect (OSTI)

    Woehrl, Nicolas, E-mail: nicolas.woehrl@uni-due.de; Schulz, Stephan [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany)] [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany); Ochedowski, Oliver; Gottlieb, Steven [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany)] [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany); Shibasaki, Kosuke [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)] [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)

    2014-04-15

    A plasma enhanced vapor deposition process is used to synthesize graphene from a hydrogen/methane gas mixture on copper samples. The graphene samples were transferred onto SiO{sub 2} substrates and characterized by Raman spectroscopic mapping and atomic force microscope topographical mapping. Analysis of the Raman bands shows that the deposited graphene is clearly SLG and that the sheets are deposited on large areas of several mm{sup 2}. The defect density in the graphene sheets is calculated using Raman measurements and the influence of the process pressure on the defect density is measured. Furthermore the origin of these defects is discussed with respect to the process parameters and hence the plasma environment.

  3. Effect of process parameters on properties of argon–nitrogen plasma for titanium nitride film deposition

    SciTech Connect (OSTI)

    Saikia, Partha; Kakati, Bharat

    2013-11-15

    In this study, the effect of working pressure and input power on the physical properties and sputtering efficiencies of argon–nitrogen (Ar/N{sub 2}) plasma in direct current magnetron discharge is investigated. The discharge in Ar/N{sub 2} is used to deposit TiN films on high speed steel substrate. The physical plasma parameters are determined by using Langmuir probe and optical emission spectroscopy. On the basis of the different reactions in the gas phase, the variation of plasma parameters and sputtering rate are explained. A prominent change of electron temperature, electron density, ion density, and degree of ionization of Ar is found as a function of working pressure and input power. The results also show that increasing working pressure exerts a negative effect on film deposition rate while increasing input power has a positive impact on the same. To confirm the observed physical properties and evaluate the texture growth as a function of deposition parameters, x-ray diffraction study of deposited TiN films is also done.

  4. Growth of highly oriented carbon nanotubes by plasma-enhanced hot filament chemical vapor deposition

    SciTech Connect (OSTI)

    Huang, Z.P.; Xu, J.W.; Ren, Z.F.; Wang, J.H.; Siegal, M.P.; Provencio, P.N.

    1998-12-01

    Highly oriented, multiwalled carbon nanotubes were grown on polished polycrystalline and single crystal nickel substrates by plasma enhanced hot filament chemical vapor deposition at temperatures below 666 {degree}C. The carbon nanotubes range from 10 to 500 nm in diameter and 0.1 to 50 {mu}m in length depending on growth conditions. Acetylene is used as the carbon source for the growth of the carbon nanotubes and ammonia is used for dilution gas and catalysis. The plasma intensity, acetylene to ammonia gas ratio, and their flow rates, etc. affect the diameters and uniformity of the carbon nanotubes. {copyright} {ital 1998 American Institute of Physics.}

  5. Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment

    SciTech Connect (OSTI)

    Steven Brandt, E.; Grace, Jeremy M.

    2012-01-15

    The role of surface hydroxyl content in atomic layer deposition (ALD) of aluminum oxide (AO) on polymers is demonstrated by performing an atomic layer deposition of AO onto a variety of polymer types, before and after pretreatment in a plasma struck in water vapor. The treatment and deposition reactions are performed in situ in a high vacuum chamber that is interfaced to an x-ray photoelectron spectrometer to prevent adventitious exposure to atmospheric contaminants. X-ray photoelectron spectroscopy is used to follow the surface chemistries of the polymers, including theformation of surface hydroxyls and subsequent growth of AO by ALD. Using dimethyl aluminum isopropoxide and water as reactants, ALD is obtained for water-plasma-treated poly(styrene) (PS), poly(propylene) (PP), poly(vinyl alcohol) (PVA), and poly(ethylene naphthalate) (PEN). For PS, PP, and PEN, initial growth rates of AO on the native (untreated) polymers are at least an order of magnitude lower than on the same polymer surface following the plasma treatment. By contrast, native PVA is shown to initiate ALD of AO as a result of the presence of intrinsic surface hydroxyls that are derived from the repeat unit of this polymer.

  6. Growth of Highly-Oriented Carbon Nanotubes by Plasma-Enhanced Hot Filament Chemical Vapor Deposition

    SciTech Connect (OSTI)

    Huang, Z.P.; Provencio, P.N.; Ren, Z.F.; Siegal, M.P.; Wang, J.H.; Xu, J.W.

    1998-10-11

    Highly-oriented, multi-walled carbon nanotubes were grown on polished polycrystalline and single crystal nickel substrates by plasma enhanced hot filament chemical vapor deposition at temperatures below 666"C. The carbon nanotubes range from 10 to 500 nm in diameter and 0.1 to 50 pm in length depending on growth conditions. Acetylene is used as the carbon source for the growth of the carbon nanotubes and ammonia is used for dilution gas and catalysis. The plasma intensity, acetylene to ammonia gas ratio and their flow rates, etc. affect the diameters and uniformity of the carbon nanotubes. In summary, we synthesized large-area highly-oriented carbon nanotubes at temperatures below 666C by plasma-enhanced hot filament chemical vapor deposition. Acetylene gas is used to provide carbon for nanotube growth and ammonia gas is used for dilution and catalysis. Plasma intensity is critical in determining the nanotube aspect ratios (diameter and length), and range of both site and height distributions within a given film.

  7. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    SciTech Connect (OSTI)

    Demaurex, Bénédicte; Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Alexander, Duncan T. L.; Jeangros, Quentin; Ballif, Christophe; De Wolf, Stefaan

    2014-08-05

    Low-temperature (? 180 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-ehanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems not only from the growth conditions but also from unintentional contamination of the reactor. As a result of our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.

  8. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Anders, André

    2014-09-02

    In this study, high power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in thismore » review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.« less

  9. Synthesis of single and multi unit-wall MgB{sub 2} nanotubes by arc plasma in inert liquid via self-curling mechanism

    SciTech Connect (OSTI)

    Sano, Noriaki; Tamon, Hajime; Kawanami, Osamu

    2011-02-01

    Magnesium diboride (MgB{sub 2}) is known as a promising superconductor due to its high transmission temperature. Similarly to single-wall carbon nanotube, unique characteristics would be seen if a nanotube structure of MgB{sub 2} having a unit-wall of Mg and B atomic bilayer is prepared. However, such MgB{sub 2} nanotubes have not ever been synthesized. In this article, formation mechanism of unit-wall MgB{sub 2} nanotube is elucidated by molecular mechanics calculation. From the viewpoint of energetic stability, the unit-wall will be curled up to form nanotube structure when MgB{sub 2} crystal is disassembled to an isolated unit-wall layer. An experiment using arc plasma in inert liquid was utilized to produce unit-wall MgB{sub 2} nanotubes. As a result, a single and multiunit-wall MgB{sub 2} nanotube was successfully synthesized. In this reaction field, the arc plasma may play a role to produce isolated MgB{sub 2} unit-wall fragment, and the cold cathode surface can contribute to preserve MgB{sub 2} nanotube structure.

  10. Modelling of the Arc-Jet Plasma Flow in the SR5 Nozzle Using a Thermochemical Nonequilibrium and a State-to-State Approach

    SciTech Connect (OSTI)

    Lino da Silva, M.; Passarinho, F.; Alexandrova, T.; Dudeck, M.

    2005-05-16

    A numerical code has been set-up for estimating the relative importance of the different nonequilibrium physical-chemical processes in the SR5 facility arc-jet plasma generator. The code assumes a quasi-1D description of the flow in the plasma generator convergent-divergent nozzle, allowing the modelling of a large array of processes at low computational cost. The center streamline of the flow is simulated in the nozzle throat where arc energy input is treated as a constant energy input. This center streamline is not assumed to be affected by nozzle walls cooling in the diverging section. Chemical, V-T, V-V, V-D and R-T processes are taken into account for CO2-N2 and N2-O2 flows. The results for a CO2-N2 flow show that rotational equilibrium and near vibrational equilibrium are reached in the nozzle throat, and that the sudden expansion in the diverging section leads to a freezing of chemical compositions and vibrational temperatures, and also rotational nonequilibrium. Only chemical processes are found to affect sensibly the flow macroscopic parameters. Finally a comparison with a state-to-state model for an N2-O2 flow in the diverging section proved that some differences between the vibrational temperatures could be expected due to non-Boltzmann vibrational levels distributions. This is particularly true for the O2 first vibrational temperature.

  11. Increasing Stabilized Performance Of Amorphous Silicon Based Devices Produced By Highly Hydrogen Diluted Lower Temperature Plasma Deposition.

    DOE Patents [OSTI]

    Li, Yaun-Min; Bennett, Murray S.; Yang, Liyou

    1999-08-24

    High quality, stable photovoltaic and electronic amorphous silicon devices which effectively resist light-induced degradation and current-induced degradation, are produced by a special plasma deposition process. Powerful, efficient single and multi-junction solar cells with high open circuit voltages and fill factors and with wider bandgaps, can be economically fabricated by the special plasma deposition process. The preferred process includes relatively low temperature, high pressure, glow discharge of silane in the presence of a high concentration of hydrogen gas.

  12. Increased Stabilized Performance Of Amorphous Silicon Based Devices Produced By Highly Hydrogen Diluted Lower Temperature Plasma Deposition.

    DOE Patents [OSTI]

    Li, Yaun-Min; Bennett, Murray S.; Yang, Liyou

    1997-07-08

    High quality, stable photovoltaic and electronic amorphous silicon devices which effectively resist light-induced degradation and current-induced degradation, are produced by a special plasma deposition process. Powerful, efficient single and multi-junction solar cells with high open circuit voltages and fill factors and with wider bandgaps, can be economically fabricated by the special plasma deposition process. The preferred process includes relatively low temperature, high pressure, glow discharge of silane in the presence of a high concentration of hydrogen gas.

  13. ScanArc ASA | Open Energy Information

    Open Energy Info (EERE)

    to: navigation, search Name: ScanArc ASA Place: Hoyanger, Norway Product: Norway-based firm that provides advice on and develops processes and applications of plasma energy....

  14. Formation of microchannels from low-temperature plasma-deposited silicon oxynitride

    DOE Patents [OSTI]

    Matzke, Carolyn M. (Los Lunas, NM); Ashby, Carol I. H. (Edgewood, NM); Bridges, Monica M. (Albuquerque, NM); Manginell, Ronald P. (Albuquerque, NM)

    2000-01-01

    A process for forming one or more fluid microchannels on a substrate is disclosed that is compatible with the formation of integrated circuitry on the substrate. The microchannels can be formed below an upper surface of the substrate, above the upper surface, or both. The microchannels are formed by depositing a covering layer of silicon oxynitride over a mold formed of a sacrificial material such as photoresist which can later be removed. The silicon oxynitride is deposited at a low temperature (.ltoreq.100.degree. C.) and preferably near room temperature using a high-density plasma (e.g. an electron-cyclotron resonance plasma or an inductively-coupled plasma). In some embodiments of the present invention, the microchannels can be completely lined with silicon oxynitride to present a uniform material composition to a fluid therein. The present invention has applications for forming microchannels for use in chromatography and electrophoresis. Additionally, the microchannels can be used for electrokinetic pumping, or for localized or global substrate cooling.

  15. 200 Years of Arc Discharges

    Office of Scientific and Technical Information (OSTI)

    Tracking Down the Origin of Arc Plasma Science. I. Early Pulsed and Oscillating Discharges André Anders, Fellow Lawrence Berkeley National Laboratory, University of California, 1 Cyclotron Road, Berkeley, California 94720-8223 aanders@lbl.gov ABSTRACT The early development of arc plasma physics is closely related to the development of suitable sources of electrical energy. The harnessing of electrostatic charge in Leyden jars (early capacitors) enabled the controlled production of sparks and

  16. Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide

    SciTech Connect (OSTI)

    Vitale, Steven A.; Wyatt, Peter W.; Hodson, Chris J.

    2012-01-15

    Atomic layer deposition (ALD) of high-quality gadolinium oxide thin films is achieved using Gd(iPrCp){sub 3} and O{sub 2} plasma. Gd{sub 2}O{sub 3} growth is observed from 150 to 350 deg. C, though the optical properties of the film improve at higher temperature. True layer-by-layer ALD growth of Gd{sub 2}O{sub 3} occurred in a relatively narrow window of temperature and precursor dose. A saturated growth rate of 1.4 A/cycle was observed at 250 deg. C. As the temperature increases, high-quality films are deposited, but the growth mechanism appears to become CVD-like, indicating the onset of precursor decomposition. At 250 deg. C, the refractive index of the film is stable at {approx}1.80 regardless of other deposition conditions, and the measured dispersion characteristics are comparable to those of bulk Gd{sub 2}O{sub 3}. XPS data show that the O/Gd ratio is oxygen deficient at 1.3, and that it is also very hygroscopic. The plasma etching rate of the ALD Gd{sub 2}O{sub 3} film in a high-density helicon reactor is very low. Little difference is observed in etching rate between Cl{sub 2} and pure Ar plasmas, suggesting that physical sputtering dominates the etching. A threshold bias power exists below which etching does not occur; thus it may be possible to etch a metal gate material and stop easily on the Gd{sub 2}O{sub 3} gate dielectric. The Gd{sub 2}O{sub 3} film has a dielectric constant of about 16, exhibits low C-V hysteresis, and allows a 50 x reduction in gate leakage compared to SiO{sub 2}. However, the plasma enhanced atomic layer deposition (PE-ALD) process causes formation of an {approx}1.8 nm SiO{sub 2} interfacial layer, and generates a fixed charge of -1.21 x 10{sup 12} cm{sup -2}, both of which may limit use of PE-ALD Gd{sub 2}O{sub 3} as a gate dielectric.

  17. Deposition of nanostructured photocatalytic zinc ferrite films using solution precursor plasma spraying

    SciTech Connect (OSTI)

    Dom, Rekha; Sivakumar, G.; Hebalkar, Neha Y.; Joshi, Shrikant V.; Borse, Pramod H.

    2012-03-15

    Highlights: Black-Right-Pointing-Pointer Highly economic solution precursor route capable of producing films/coating even for mass scale production. Black-Right-Pointing-Pointer Pure spinel phase ZnFe{sub 2}O{sub 4} porous, immobilized films deposited in single step. Black-Right-Pointing-Pointer Parameter optimization yields access to nanostructuring in SPPS method. Black-Right-Pointing-Pointer The ecofriendly immobilized ferrite films were active under solar radiation. Black-Right-Pointing-Pointer Such magnetic system display advantage w.r.t. recyclability after photocatalyst extraction. -- Abstract: Deposition of pure spinel phase, photocatalytic zinc ferrite films on SS-304 substrates by solution precursor plasma spraying (SPPS) has been demonstrated for the first time. Deposition parameters such as precursor solution pH, concentration, film thickness, plasma power and gun-substrate distance were found to control physico-chemical properties of the film, with respect to their crystallinity, phase purity, and morphology. Alkaline precursor conditions (7 < pH {<=} 10) were found to favor oxide film formation. The nanostructured films produced under optimized conditions, with 500 mM solution at pH {approx} 8.0, yielded pure cubic phase ZnFe{sub 2}O{sub 4} film. Very high/low precursor concentrations yielded mixed phase, less adherent, and highly inhomogeneous thin films. Desired spinel phase was achieved in as-deposited condition under appropriately controlled spray conditions and exhibited a band gap of {approx}1.9 eV. The highly porous nature of the films favored its photocatalytic performance as indicated by methylene blue de-coloration under solar radiation. These immobilized films display good potential for visible light photocatalytic applications.

  18. Plasma enhanced chemical vapor deposition (PECVD) method of forming vanadium oxide films and vanadium oxide thin-films prepared thereby

    DOE Patents [OSTI]

    Zhang, Ji-Guang (Golden, CO); Tracy, C. Edwin (Golden, CO); Benson, David K. (Golden, CO); Turner, John A. (Littleton, CO); Liu, Ping (Lakewood, CO)

    2000-01-01

    A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.

  19. A simple method to deposit palladium doped SnO{sub 2} thin films using plasma enhanced chemical vapor deposition technique

    SciTech Connect (OSTI)

    Kim, Young Soon; Wahab, Rizwan; Shin, Hyung-Shik [School of Chemical Engineering, Chonbuk National University, Jeonju 561-756 (Korea, Republic of); Ansari, S. G.; Ansari, Z. A. [Center for Interdisciplinary Research in Basic Sciences, Jamia Millia Islamia, Jamia Nagar, New Delhi 110025 (India)

    2010-11-15

    This work presents a simple method to deposit palladium doped tin oxide (SnO{sub 2}) thin films using modified plasma enhanced chemical vapor deposition as a function of deposition temperature at a radio frequency plasma power of 150 W. Stannic chloride (SnCl{sub 4}) was used as precursor and oxygen (O{sub 2}, 100 SCCM) (SCCM denotes cubic centimeter per minute at STP) as reactant gas. Palladium hexafluroacetyleacetonate (Pd(C{sub 5}HF{sub 6}O{sub 2}){sub 2}) was used as a precursor for palladium. Fine granular morphology was observed with tetragonal rutile structure. A peak related to Pd{sub 2}Sn is observed, whose intensity increases slightly with deposition temperature. Electrical resistivity value decreased from 8.6 to 0.9 m{Omega} cm as a function of deposition temperature from 400 to 600 deg. C. Photoelectron peaks related to Sn 3d, Sn 3p3, Sn 4d, O 1s, and C 1s were detected with varying intensities as a function of deposition temperature.

  20. Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films

    SciTech Connect (OSTI)

    Altuntas, Halit E-mail: biyikli@unam.bilkent.edu.tr; Ozgit-Akgun, Cagla; Donmez, Inci; Biyikli, Necmi E-mail: biyikli@unam.bilkent.edu.tr

    2015-04-21

    Here, we report on the current transport mechanisms in AlN thin films deposited at a low temperature (i.e., 200?°C) on p-type Si substrates by plasma-enhanced atomic layer deposition. Structural characterization of the deposited AlN was carried out using grazing-incidence X-ray diffraction, revealing polycrystalline films with a wurtzite (hexagonal) structure. Al/AlN/ p-Si metal-insulator-semiconductor (MIS) capacitor structures were fabricated and investigated under negative bias by performing current-voltage measurements. As a function of the applied electric field, different types of current transport mechanisms were observed; i.e., ohmic conduction (15.2–21.5 MV/m), Schottky emission (23.6–39.5 MV/m), Frenkel-Poole emission (63.8–211.8 MV/m), trap-assisted tunneling (226–280 MV/m), and Fowler-Nordheim tunneling (290–447 MV/m). Electrical properties of the insulating AlN layer and the fabricated Al/AlN/p-Si MIS capacitor structure such as dielectric constant, flat-band voltage, effective charge density, and threshold voltage were also determined from the capacitance-voltage measurements.

  1. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Demaurex, Bénédicte; Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Alexander, Duncan T. L.; Jeangros, Quentin; Ballif, Christophe; De Wolf, Stefaan

    2014-08-05

    Low-temperature (≤ 180 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-ehanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems notmore » only from the growth conditions but also from unintentional contamination of the reactor. As a result of our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.« less

  2. Effect Of The Plasma Deposition Parameters On The Properties Of Ti/TiN Multilayers For Hard Coatings Applications

    SciTech Connect (OSTI)

    Saoula, N.; Henda, K.; Kesri, R.

    2008-09-23

    In this study, we present the effect of the plasma deposition parameters on the mechanical properties of Ti/TiN multilayers. The elaboration of our films has been carried out by RF-Magnetron Sputtering (13.56 MHz) under nitrogen and argon reactive plasma at low pressure. The film depositions have been done on steel substrates. The first step of our study was the optimization of the depositions conditions in order to obtain good quality films. The amount of nitrogen in the sputtering gases being fixed at 10%. The total pressure was set between 2mTorr to 10mTorr. The deposited multilayers were characterized by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), atomic force microscopy (AFM) and micro-indentation.

  3. Characterization and Surface Treatment of Materials Used in MADEAL S.A. Industry Productive Process of Rims by Plasma Assisted Repetitive Pulsed Arcs Technique

    SciTech Connect (OSTI)

    Jimenez, H.; Salazar, V. H.; Devia, A.; Jaramillo, S.; Velez, G.

    2006-12-04

    A study of materials used in the molds production to aluminium rims manufacture in the MADEAL S.A. factory was carried out for apply a plasma assisted surface treatment consists in growing TiAlN hard coatings that it protects this molds in the productive process. This coating resists high oxidation temperatures, of the other of 800 deg. C, high hardness (2800 Vickers) and low friction coefficient. A plasma assisted repetitive pulsed arcs mono-evaporator system was used in the grow of the TiAlN coatings, the TiAlN target is a sinterized 50% Ti and 50% Al, in the substrate they were used two types of steel that compose the molds injection pieces for the rims production. These materials were subjected to linear and fluctuating thermal changes in the Bruker axs X-Ray diffractometer temperature chamber, what simulated the molds thermal variation in the rims production process and they were compared with TiAlN coatings subjected to same thermal changes. The Materials characterization, before and later of thermal process, was carried out using XRD, SPM and EDS techniques, to analyze the crystallographic, topographic and chemical surface structure behaviours.

  4. New approaches for the reduction of plasma arc drop in second-generation thermionic converters. Final report

    SciTech Connect (OSTI)

    Hatziprokopiou, M.E.; Shaw, D.T.

    1981-03-31

    Investigations of ion generation and recombination mechanisms in the cesium plasma as they pertain to the advanced mode thermionic energy converter are described. The changes in plasma density and temperature within the converter have been studied under the influence of several promising auxiliary ionization candidate sources. Three novel approaches of external cesium ion generation have been investigated in some detail, namely vibrationally excited N/sub 2/ as an energy source of ionization of Cs ions in a DC discharge, microwave power as a means of resonant sustenance of the cesium plasma, and ion generation in a pulse N/sub 2/-Cs mixture. The experimental data obtained and discussed show that all three techniques - i.e. the non-LTE high-voltage pulsing, the energy transfer from vibrationally excited diatomic gases, and the external pumping with a microwave power - have considerable promise as schemes in auxiliary ion generation applicable to the advanced thermionic energy converter.

  5. Highly ionized physical vapor deposition plasma source working at very low pressure

    SciTech Connect (OSTI)

    Stranak, V.; Herrendorf, A.-P.; Drache, S.; Hippler, R.; Cada, M.; Hubicka, Z.; Tichy, M.

    2012-04-02

    Highly ionized discharge for physical vapor deposition at very low pressure is presented in the paper. The discharge is generated by electron cyclotron wave resonance (ECWR) which assists with ignition of high power impulse magnetron sputtering (HiPIMS) discharge. The magnetron gun (with Ti target) was built into the single-turn coil RF electrode of the ECWR facility. ECWR assistance provides pre-ionization effect which allows significant reduction of pressure during HiPIMS operation down to p = 0.05 Pa; this is nearly more than an order of magnitude lower than at typical pressure ranges of HiPIMS discharges. We can confirm that nearly all sputtered particles are ionized (only Ti{sup +} and Ti{sup ++} peaks are observed in the mass scan spectra). This corresponds well with high plasma density n{sub e} {approx} 10{sup 18} m{sup -3}, measured during the HiPIMS pulse.

  6. Argon–germane in situ plasma clean for reduced temperature Ge on Si epitaxy by high density plasma chemical vapor deposition

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Douglas, Erica A.; Sheng, Josephine J.; Verley, Jason C.; Carroll, Malcolm S.

    2015-06-04

    We found that the demand for integration of near infrared optoelectronic functionality with silicon complementary metal oxide semiconductor (CMOS) technology has for many years motivated the investigation of low temperature germanium on silicon deposition processes. Our work describes the development of a high density plasma chemical vapor deposition process that uses a low temperature (<460 °C) in situ germane/argon plasma surface preparation step for epitaxial growth of germanium on silicon. It is shown that the germane/argon plasma treatment sufficiently removes SiOx and carbon at the surface to enable germanium epitaxy. Finally, the use of this surface preparation step demonstrates anmore » alternative way to produce germanium epitaxy at reduced temperatures, a key enabler for increased flexibility of integration with CMOS back-end-of-line fabrication.« less

  7. Argon–germane in situ plasma clean for reduced temperature Ge on Si epitaxy by high density plasma chemical vapor deposition

    SciTech Connect (OSTI)

    Douglas, Erica A.; Sheng, Josephine J.; Verley, Jason C.; Carroll, Malcolm S.

    2015-06-04

    We found that the demand for integration of near infrared optoelectronic functionality with silicon complementary metal oxide semiconductor (CMOS) technology has for many years motivated the investigation of low temperature germanium on silicon deposition processes. Our work describes the development of a high density plasma chemical vapor deposition process that uses a low temperature (<460 °C) in situ germane/argon plasma surface preparation step for epitaxial growth of germanium on silicon. It is shown that the germane/argon plasma treatment sufficiently removes SiOx and carbon at the surface to enable germanium epitaxy. Finally, the use of this surface preparation step demonstrates an alternative way to produce germanium epitaxy at reduced temperatures, a key enabler for increased flexibility of integration with CMOS back-end-of-line fabrication.

  8. Al{sub 2}O{sub 3} multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

    SciTech Connect (OSTI)

    Jung, Hyunsoo [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Samsung Display Co. Ltd., Tangjeong, Chungcheongnam-Do 336-741 (Korea, Republic of); Jeon, Heeyoung [Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Choi, Hagyoung; Ham, Giyul; Shin, Seokyoon [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Jeon, Hyeongtag, E-mail: hjeon@hanyang.ac.kr [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)

    2014-02-21

    Al{sub 2}O{sub 3} films deposited by remote plasma atomic layer deposition have been used for thin film encapsulation of organic light emitting diode. In this study, a multi-density layer structure consisting of two Al{sub 2}O{sub 3} layers with different densities are deposited with different deposition conditions of O{sub 2} plasma reactant time. This structure improves moisture permeation barrier characteristics, as confirmed by a water vapor transmission rate (WVTR) test. The lowest WVTR of the multi-density layer structure was 4.7 × 10{sup ?5} gm{sup ?2} day{sup ?1}, which is one order of magnitude less than WVTR for the reference single-density Al{sub 2}O{sub 3} layer. This improvement is attributed to the location mismatch of paths for atmospheric gases, such as O{sub 2} and H{sub 2}O, in the film due to different densities in the layers. This mechanism is analyzed by high resolution transmission electron microscopy, elastic recoil detection, and angle resolved X-ray photoelectron spectroscopy. These results confirmed that the multi-density layer structure exhibits very good characteristics as an encapsulation layer via location mismatch of paths for H{sub 2}O and O{sub 2} between the two layers.

  9. Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor–insulator–semiconductor heterojunction solar cell

    SciTech Connect (OSTI)

    Talkenberg, Florian Illhardt, Stefan; Schmidl, Gabriele; Schleusener, Alexander; Sivakov, Vladimir; Radnóczi, György Zoltán; Pécz, Béla; Dikhanbayev, Kadyrjan; Mussabek, Gauhar; Gudovskikh, Alexander

    2015-07-15

    Semiconductor–insulator–semiconductor heterojunction solar cells were prepared using atomic layer deposition (ALD) technique. The silicon surface was treated with oxygen and hydrogen plasma in different orders before dielectric layer deposition. A plasma-enhanced ALD process was applied to deposit dielectric Al{sub 2}O{sub 3} on the plasma pretreated n-type Si(100) substrate. Aluminum doped zinc oxide (Al:ZnO or AZO) was deposited by thermal ALD and serves as transparent conductive oxide. Based on transmission electron microscopy studies the presence of thin silicon oxide (SiO{sub x}) layer was detected at the Si/Al{sub 2}O{sub 3} interface. The SiO{sub x} formation depends on the initial growth behavior of Al{sub 2}O{sub 3} and has significant influence on solar cell parameters. The authors demonstrate that a hydrogen plasma pretreatment and a precursor dose step repetition of a single precursor improve the initial growth behavior of Al{sub 2}O{sub 3} and avoid the SiO{sub x} generation. Furthermore, it improves the solar cell performance, which indicates a change of the Si/Al{sub 2}O{sub 3} interface states.

  10. Suppression of current fluctuations in a crossed ExB field system for low-voltage plasma immersion treatment

    SciTech Connect (OSTI)

    Levchenko, I.; Keidar, M.; Ostrikov, K.; Yu, M.Y.

    2006-01-01

    Plasma transport in a hybrid dc vacuum arc plasma source for ion deposition and plasma immersion treatment is considered. It is found that external crossed electric and magnetic fields near the substrate can significantly reduce the relative amplitude of ion current fluctuations I{sub f} at the substrate surface. In particular, I{sub f} decreases with the applied magnetic field when the bias voltage exceeds 300 V, thus allowing one to reduce the deviations from the rated process parameters. This phenomenon can be attributed to an interaction between the metal-plasma jet from the arc source and the discharge plasma in the crossed fields.

  11. Radio frequency emission from high-pressure xenon arcs: A systematic experimental analysis of the underlying near-anode plasma instability

    SciTech Connect (OSTI)

    Hechtfischer, Ulrich

    2011-10-01

    High-pressure Xe discharge lamps at DC operation can show unwanted strong RF (radio-frequency) emission to beyond 1 GHz, correlated to a sharp periodic lamp-voltage instability in the near-anode plasma with a pulse repetition rate {epsilon} of 1-10 MHz. The physical origin of the instability is unclear. Here, its existence and pulse rate have been measured as a function of arc current I = 0.2-1.2 A and anode temperature T{sub a} = 1700-3400 K independently, in experimental lamps with pure-tungsten electrodes and a Xe operating pressure around p = 10 MPa. Surprisingly, the instability is not affected by I or current density j but exists if T{sub a} is lower than a threshold value around 2800-2900 K. The pulse rate {epsilon} is simply a rising linear function of the inverse anode temperature 1/T{sub a}, with only a small I-dependent correction. The average anode heat load is slightly lower in the unstable regime and possibly depends on {epsilon}. The results allow a consistent re-interpretation of earlier and present experimental observations and should be both a valuable help in practical lamp engineering and a tight constraint for future theories of this effect.

  12. Integration of atomic layer deposited high-k dielectrics on GaSb via hydrogen plasma exposure

    SciTech Connect (OSTI)

    Ruppalt, Laura B. Cleveland, Erin R.; Champlain, James G.; Bennett, Brian R.; Prokes, Sharka M.

    2014-12-15

    In this letter we report the efficacy of a hydrogen plasma pretreatment for integrating atomic layer deposited (ALD) high-k dielectric stacks with device-quality p-type GaSb(001) epitaxial layers. Molecular beam eptiaxy-grown GaSb surfaces were subjected to a 30 minute H{sub 2}/Ar plasma treatment and subsequently removed to air. High-k HfO{sub 2} and Al{sub 2}O{sub 3}/HfO{sub 2} bilayer insulating films were then deposited via ALD and samples were processed into standard metal-oxide-semiconductor (MOS) capacitors. The quality of the semiconductor/dielectric interface was probed by current-voltage and variable-frequency admittance measurements. Measurement results indicate that the H{sub 2}-plamsa pretreatment leads to a low density of interface states nearly independent of the deposited dielectric material, suggesting that pre-deposition H{sub 2}-plasma exposure, coupled with ALD of high-k dielectrics, may provide an effective means for achieving high-quality GaSb MOS structures for advanced Sb-based digital and analog electronics.

  13. Low voltage arc formation in railguns

    DOE Patents [OSTI]

    Hawke, R.S.

    1985-08-05

    A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile.

  14. Low voltage arc formation in railguns

    DOE Patents [OSTI]

    Hawke, R.S.

    1987-11-17

    A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile. 2 figs.

  15. Low voltage arc formation in railguns

    DOE Patents [OSTI]

    Hawke, Ronald S. (Livermore, CA)

    1987-01-01

    A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile.

  16. Thermal protection of H13 steel by growth of (TiAl)N films by PAPVD pulsed arc technique

    SciTech Connect (OSTI)

    Jimenez, H.; Devia, D.M.; Benavides, V.; Devia, A. Arango, Y.C.; Arango, P.J.; Velez, J.M.

    2008-08-15

    (TiAl)N Films were grown on H13 steel by a plasma assisted repetitive pulsed arc discharge. To grow the coatings, a TiAl sintered cathode was used, 50% Ti-50% Al. The deposition system consists of a reaction chamber with two electrodes placed face to face. A pulsed power supply, which allows for control of parameters like time active arc, time between arcs, arc energy, and others, is used to generate the discharge. Thermal changes were carried out on H13 steel before and after growing the (TiAl)N films. X-ray diffraction (XRD) was employed to study the coatings, observing the H13 steel and (TiAl)N oxidation temperature. Morphological characteristics were analyzed by means of an Atomic Force Microscopy (AFM). Scanning electron microscopy (SEM) revealed the surface chemical composition of the films and morphological details of the samples.

  17. Arc-based smoothing of ion beam intensity on targets

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Friedman, Alex

    2012-06-20

    Manipulating a set of ion beams upstream of a target, makes it possible to arrange a smoother deposition pattern, so as to achieve more uniform illumination of the target. A uniform energy deposition pattern is important for applications including ion-beam-driven high energy density physics and heavy-ion beam-driven inertial fusion energy (“heavy-ion fusion”). Here, we consider an approach to such smoothing that is based on rapidly “wobbling” each of the beams back and forth along a short arc-shaped path, via oscillating fields applied upstream of the final pulse compression. In this technique, uniformity is achieved in the time-averaged sense; this ismore » sufficient provided the beam oscillation timescale is short relative to the hydrodynamic timescale of the target implosion. This work builds on two earlier concepts: elliptical beams applied to a distributed-radiator target [D. A. Callahan and M. Tabak, Phys. Plasmas 7, 2083 (2000)] and beams that are wobbled so as to trace a number of full rotations around a circular or elliptical path [R. C. Arnold et al., Nucl. Instrum. Methods 199, 557 (1982)]. Here, we describe the arc-based smoothing approach and compare it to results obtainable using an elliptical-beam prescription. In particular, we assess the potential of these approaches for minimization of azimuthal asymmetry, for the case of a ring of beams arranged on a cone. We also found that, for small numbers of beams on the ring, the arc-based smoothing approach offers superior uniformity. In contrast with the full-rotation approach, arc-based smoothing remains usable when the geometry precludes wobbling the beams around a full circle, e.g., for the X-target [E. Henestroza, B. G. Logan, and L. J. Perkins, Phys. Plasmas 18, 032702 (2011)] and some classes of distributed-radiator targets.« less

  18. AdaptiveARC | Open Energy Information

    Open Energy Info (EERE)

    Sector: Biomass Product: Waste-to-clean-energy startup is developing an arc-plasma reactor Website: www.adaptivearc.com Coordinates: 33.07959, -117.22539 Show Map Loading...

  19. Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films

    SciTech Connect (OSTI)

    Van Bui, Hao Wiggers, Frank B.; Gupta, Anubha; Nguyen, Minh D.; Aarnink, Antonius A. I.; Jong, Michel P. de; Kovalgin, Alexey Y.

    2015-01-01

    The authors have studied and compared the initial growth and properties of AlN films deposited on Si(111) by thermal and plasma-enhanced atomic layer deposition (ALD) using trimethylaluminum and either ammonia or a N{sub 2}-H{sub 2} mixture as precursors. In-situ spectroscopic ellipsometry was employed to monitor the growth and measure the refractive index of the films during the deposition. The authors found that an incubation stage only occurred for thermal ALD. The linear growth for plasma-enhanced ALD (PEALD) started instantly from the beginning due to the higher nuclei density provided by the presence of plasma. The authors observed the evolution of the refractive index of AlN during the growth, which showed a rapid increase up to a thickness of about 30?nm followed by a saturation. Below this thickness, higher refractive index values were obtained for AlN films grown by PEALD, whereas above that the refractive index was slightly higher for thermal ALD films. X-ray diffraction characterization showed a wurtzite crystalline structure with a (101{sup Ż}0) preferential orientation obtained for all the layers with a slightly better crystallinity for films grown by PEALD.

  20. Microwave plasma assisted supersonic gas jet deposition of thin film materials

    DOE Patents [OSTI]

    Schmitt, III, Jerome J. (New Haven, CT); Halpern, Bret L. (Bethany, CT)

    1993-01-01

    An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures.

  1. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Abbasi-Firouzjah, M.; Shokri, B.; Physics Department, Shahid Beheshti University G.C., Evin, Tehran

    2013-12-07

    Low dielectric constant (low-k) silica based films were deposited on p-type silicon and polycarbonate substrates by radio frequency (RF) plasma enhanced chemical vapor deposition method at low temperature. A mixture of tetraethoxysilane vapor, oxygen, and tetrafluoromethane (CF{sub 4}) was used for the deposition of the films in forms of two structures called as SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z}. Properties of the films were controlled by amount of porosity and fluorine content in the film matrix. The influence of RF power and CF{sub 4} flow on the elemental composition, deposition rate, surface roughness, leakage current, refractive index, and dielectric constant of the films were characterized. Moreover, optical emission spectroscopy was applied to monitor the plasma process at the different parameters. Electrical characteristics of SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z} films with metal-oxide-semiconductor structure were investigated using current-voltage analysis to measure the leakage current and breakdown field, as well as capacitance-voltage analysis to obtain the film's dielectric constant. The results revealed that SiO{sub x}C{sub y} films, which are deposited at lower RF power produce more leakage current, meanwhile the dielectric constant and refractive index of these films decreased mainly due to the more porosity in the film structure. By adding CF{sub 4} in the deposition process, fluorine, the most electronegative and the least polarized atom, doped into the silica film and led to decrease in the refractive index and the dielectric constant. In addition, no breakdown field was observed in the electrical characteristics of SiO{sub x}C{sub y}F{sub z} films and the leakage current of these films reduced by increment of the CF{sub 4} flow.

  2. Optical characteristics of nanocrystalline Al{sub x}Ga{sub 1?x}N thin films deposited by hollow cathode plasma-assisted atomic layer deposition

    SciTech Connect (OSTI)

    Goldenberg, Eda; Ozgit-Akgun, Cagla; Biyikli, Necmi; Kemal Okyay, Ali

    2014-05-15

    Gallium nitride (GaN), aluminum nitride (AlN), and Al{sub x}Ga{sub 1?x}N films have been deposited by hollow cathode plasma-assisted atomic layer deposition at 200?°C on c-plane sapphire and Si substrates. The dependence of film structure, absorption edge, and refractive index on postdeposition annealing were examined by x-ray diffraction, spectrophotometry, and spectroscopic ellipsometry measurements, respectively. Well-adhered, uniform, and polycrystalline wurtzite (hexagonal) GaN, AlN, and Al{sub x}Ga{sub 1?x}N films were prepared at low deposition temperature. As revealed by the x-ray diffraction analyses, crystallite sizes of the films were between 11.7 and 25.2?nm. The crystallite size of as-deposited GaN film increased from 11.7 to 12.1 and 14.4?nm when the annealing duration increased from 30?min to 2?h (800?°C). For all films, the average optical transmission was ?85% in the visible (VIS) and near infrared spectrum. The refractive indices of AlN and Al{sub x}Ga{sub 1?x}N were lower compared to GaN thin films. The refractive index of as-deposited films decreased from 2.33 to 2.02 (??=?550?nm) with the increased Al content x (0???x???1), while the extinction coefficients (k) were approximately zero in the VIS spectrum (>400?nm). Postdeposition annealing at 900?°C for 2?h considerably lowered the refractive index value of GaN films (2.33–1.92), indicating a significant phase change. The optical bandgap of as-deposited GaN film was found to be 3.95?eV, and it decreased to 3.90?eV for films annealed at 800?°C for 30?min and 2?h. On the other hand, this value increased to 4.1?eV for GaN films annealed at 900?°C for 2?h. This might be caused by Ga{sub 2}O{sub 3} formation and following phase change. The optical bandgap value of as-deposited Al{sub x}Ga{sub 1?x}N films decreased from 5.75 to 5.25?eV when the x values decreased from 1 to 0.68. Furthermore, postdeposition annealing did not affect the bandgap of Al-rich films.

  3. Microwave plasma assisted supersonic gas jet deposition of thin film materials

    DOE Patents [OSTI]

    Schmitt, J.J. III; Halpern, B.L.

    1993-10-26

    An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures. 5 figures.

  4. Neutral beam dump with cathodic arc titanium gettering

    SciTech Connect (OSTI)

    Smirnov, A.; Korepanov, S. A.; Putvinski, S.; Krivenko, A. S.; Murakhtin, S. V.; Savkin, V. Ya.

    2011-03-15

    An incomplete neutral beam capture can degrade the plasma performance in neutral beam driven plasma machines. The beam dumps mitigating the shine-through beam recycling must entrap and retain large particle loads while maintaining the beam-exposed surfaces clean of the residual impurities. The cathodic arc gettering, which provides high evaporation rate coupled with a fast time response, is a powerful and versatile technique for depositing clean getter films in vacuum. A compact neutral beam dump utilizing the titanium arc gettering was developed for a field-reversed configuration plasma sustained by 1 MW, 20-40 keV neutral hydrogen beams. The titanium evaporator features a new improved design. The beam dump is capable of handling large pulsed gas loads, has a high sorption capacity, and is robust and reliable. With the beam particle flux density of 5 x 10{sup 17} H/(cm{sup 2}s) sustained for 3-10 ms, the beam recycling coefficient, defined as twice the ratio of the hydrogen molecular flux leaving the beam dump to the incident flux of high-energy neutral atoms, is {approx}0.7. The use of the beam dump allows us to significantly reduce the recycling of the shine-through neutral beam as well as to improve the vacuum conditions in the machine.

  5. Exploring high temperature phenomena related to post-detonation using an electric arc

    SciTech Connect (OSTI)

    Dai, Z. R. Crowhurst, J. C.; Grant, C. D.; Knight, K. B.; Tang, V.; Chernov, A. A.; Cook, E. G.; Lotscher, J. P.; Hutcheon, I. D.

    2013-11-28

    We report a study of materials recovered from a uranium-containing plasma generated by an electric arc. The device used to generate the arc is capable of sustaining temperatures of an eV or higher for up to 100??s. Samples took the form of a 4??m-thick film deposited onto 8 pairs of 17??m-thick Cu electrodes supported on a 25??m-thick Kapton backing and sandwiched between glass plates. Materials recovered from the glass plates and around the electrode tips after passage of an arc were characterized using scanning and transmission electron microscopy. Recovered materials included a variety of crystalline compounds (e.g., UO{sub 2}, UC{sub 2}, UCu{sub 5},) as well as mixtures of uranium and amorphous glass. Most of the materials collected on the glass plates took the form of spherules having a wide range of diameters from tens of nanometers to tens of micrometers. The composition and size of the spherules depended on location, indicating different chemical and physical environments. A theoretical analysis we have carried out suggests that the submicron spherules presumably formed by deposition during the arc discharge, while at the same time the glass plates were strongly heated due to absorption of plasma radiation mainly by islands of deposited metals (Cu, U). The surface temperature of the glass plates is expected to have risen to ?2300?K thus producing a liquefied glass layer, likely diffusions of the deposited metals on the hot glass surface and into this layer were accompanied by chemical reactions that gave rise to the observed materials. These results, together with the compact scale and relatively low cost, suggest that the experimental technique provides a practical approach to investigate the complex physical and chemical processes that occur when actinide-containing material interacts with the environment at high temperature, for example, during fallout formation following a nuclear detonation.

  6. Multifunctional bulk plasma source based on discharge with electron injection

    SciTech Connect (OSTI)

    Klimov, A. S.; Medovnik, A. V.; Tyunkov, A. V.; Savkin, K. P.; Shandrikov, M. V.; Vizir, A. V.

    2013-01-15

    A bulk plasma source, based on a high-current dc glow discharge with electron injection, is described. Electron injection and some special design features of the plasma arc emitter provide a plasma source with very long periods between maintenance down-times and a long overall lifetime. The source uses a sectioned sputter-electrode array with six individual sputter targets, each of which can be independently biased. This discharge assembly configuration provides multifunctional operation, including plasma generation from different gases (argon, nitrogen, oxygen, acetylene) and deposition of composite metal nitride and oxide coatings.

  7. Weld arc simulator

    DOE Patents [OSTI]

    Burr, Melvin J. (Westminster, CO)

    1990-01-30

    An arc voltage simulator for an arc welder permits the welder response to a variation in arc voltage to be standardized. The simulator uses a linear potentiometer connected to the electrode to provide a simulated arc voltage at the electrode that changes as a function of electrode position.

  8. Molybdenum Coatings with Filtration of Plasma Flow

    SciTech Connect (OSTI)

    Gasilin, V. V.; Nezovibat'ko, Y. N.; Shvets, O. M.; Taran, V. S.; Tereshin, V. I.; Timoshenko, A. I.; Zavaleev, V. A.

    2008-03-19

    Deposition of molybdenum coatings in arc discharge with assistance of HF one is analyzed in this paper. To avoid substrate heating to high temperature and micro-arc formation during cleaning process, the surface cleaning was carried out with HF plasma only. For reduction of droplet fraction in plasma the 'freestanding' filter was utilized. As a filter a solenoid was used, which generated a curvilinear (with the angle of 90 deg.) transportation magnetic field. The effective crosssectional area of the plasma flow at which was observed the uniform distribution of the thickness of the applied coating, was equal to 113 sm{sup 2}. The coating on the base of arc discharge, filter and HF-biasing of substrate were deposited on different substrates, including glass and stainless steel.The optical (refractive index) properties of molybdenum films are presented. The reflective characteristics of the obtained molybdenum films in the range of wavelengths from 200 to 700 nm were measured.Molybdenum films were also investigated under the effect of the plasma emission, using an ECR discharge in a simple double-mirror magnetic trap. The time varying negative potential was supplied to sample holder what provided a wide energy distribution of ions bombarded the sample surface in range 30...1500V.

  9. COMPARISON OF THERMAL PROPERTIES OF THERMAL BARRIER COATING DEPOSITED ON IN738 USING STANDARD AIR PLASMA SPRAY WITH 100HE PLASMA SPRAY SYSTEM

    SciTech Connect (OSTI)

    Uppu, N.; Mensah, P.F.; Ofori, D.

    2006-07-01

    A typical blade material is made of Nickel super alloy and can bear temperatures up to 950°C. But the operating temperature of a gas turbine is above the melting point of super alloy nearly at 1500°C. This could lead to hot corrosions, high temperature oxidation, creep, thermal fatigue may takes place on the blade material. Though the turbine has an internal cooling system, the cooling is not adequate to reduce the temperature of the blade substrate. Therefore to protect the blade material as well as increase the efficiency of the turbine, thermal barrier coatings (TBCs) must be used. A TBC coating of 250 ?m thick can reduce the temperature by up to 200° C. Air Plasma Spray Process (APS) and High Enthalpy Plasma Spray Process (100HE) were the processes used for coating the blades with the TBCs. Because thermal conductivity increases with increase in temperature, it is desired that these processes yield very low thermal conductivities at high temperatures in order not to damage the blade. An experiment was carried out using Flash line 5000 apparatus to compare the thermal conductivity of both processes.The apparatus could also be used to determine the thermal diffusivity and specific heat of the TBCs. 75 to 2800 K was the temperature range used in the experimentation. It was found out that though 100HE has high deposition efficiency, the thermal conductivity increases with increase in temperatures whiles APS yielded low thermal conductivities.

  10. Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels

    SciTech Connect (OSTI)

    Bolat, S. E-mail: aokyay@ee.bilkent.edu.tr; Tekcan, B.; Ozgit-Akgun, C.; Biyikli, N.; Okyay, A. K. E-mail: aokyay@ee.bilkent.edu.tr

    2014-06-16

    We report GaN thin film transistors (TFT) with a thermal budget below 250?°C. GaN thin films are grown at 200?°C by hollow cathode plasma-assisted atomic layer deposition (HCPA-ALD). HCPA-ALD-based GaN thin films are found to have a polycrystalline wurtzite structure with an average crystallite size of 9.3?nm. TFTs with bottom gate configuration are fabricated with HCPA-ALD grown GaN channel layers. Fabricated TFTs exhibit n-type field effect characteristics. N-channel GaN TFTs demonstrated on-to-off ratios (I{sub ON}/I{sub OFF}) of 10{sup 3} and sub-threshold swing of 3.3?V/decade. The entire TFT device fabrication process temperature is below 250?°C, which is the lowest process temperature reported for GaN based transistors, so far.

  11. Temperature measurement of an atmospheric pressure arc discharge plasma jet using the diatomic CN (B {sup 2}{sigma}{sup +}-X {sup 2}{sigma}{sup +}, violet system) molecular spectra

    SciTech Connect (OSTI)

    Moon, Se Youn; Kim, D. B.; Gweon, B.; Choe, W.

    2009-03-01

    The CN (B {sup 2}{sigma}{sup +}-X {sup 2}{sigma}{sup +}) molecular emission spectrum is used to measure both the vibrational and rotational temperatures in atmospheric pressure arc jet discharges. The vibrational and rotational temperature effects on the synthetic diatomic molecular spectra were investigated from the (v{sup '},v{sup ''})=(0,0) band to the (5,5) band. The temperatures obtained from the synthetic spectra compared with the experimental result of a low-frequency arc discharge show a vibrational temperature of (4250-5010) K and a rotational temperature of (3760-3980) K for the input power in the range of (80-280) W. As the (0,0) band is isolated from other vibrational transition bands, determination of the rotational temperature is possible based only on the (0,0) band, which simplifies the temperature measurement. From the result, it was found that the CN molecular spectrum can be used as a thermometer for atmospheric pressure plasmas containing carbon and nitrogen.

  12. Method for minimizing decarburization and other high temperature oxygen reactions in a plasma sprayed material

    DOE Patents [OSTI]

    Lenling, William J. (Madison, WI); Henfling, Joseph A. (Bosque Farms, NM); Smith, Mark F. (Albuquerque, NM)

    1993-06-08

    A method is disclosed for spray coating material which employs a plasma gun that has a cathode, an anode, an arc gas inlet, a first powder injection port, and a second powder injection port. A suitable arc gas is introduced through the arc gas inlet, and ionization of the arc gas between the cathode and the anode forms a plasma. The plasma is directed to emenate from an open-ended chamber defined by the boundary of the anode. A coating is deposited upon a base metal part by suspending a binder powder within a carrier gas that is fed into the plasma through the first powder injection port; a material subject to degradation by high temperature oxygen reactions is suspended within a carrier gas that is fed into the plasma through the second injection port. The material fed through the second injection port experiences a cooler portion of the plasma and has a shorter dwell time within the plasma to minimize high temperature oxygen reactions. The material of the first port and the material of the second port intermingle within the plasma to form a uniform coating having constituent percentages related to the powder-feed rates of the materials through the respective ports.

  13. Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films

    SciTech Connect (OSTI)

    Bolat, Sami Tekcan, Burak; Ozgit-Akgun, Cagla; Biyikli, Necmi; Okyay, Ali Kemal

    2015-01-15

    Electronic and optoelectronic devices, namely, thin film transistors (TFTs) and metal–semiconductor–metal (MSM) photodetectors, based on GaN films grown by hollow cathode plasma-assisted atomic layer deposition (PA-ALD) are demonstrated. Resistivity of GaN thin films and metal-GaN contact resistance are investigated as a function of annealing temperature. Effect of the plasma gas and postmetallization annealing on the performances of the TFTs as well as the effect of the annealing on the performance of MSM photodetectors are studied. Dark current to voltage and responsivity behavior of MSM devices are investigated as well. TFTs with the N{sub 2}/H{sub 2} PA-ALD based GaN channels are observed to have improved stability and transfer characteristics with respect to NH{sub 3} PA-ALD based transistors. Dark current of the MSM photodetectors is suppressed strongly after high-temperature annealing in N{sub 2}:H{sub 2} ambient.

  14. Rotating arc spark plug

    DOE Patents [OSTI]

    Whealton, John H.; Tsai, Chin-Chi

    2003-05-27

    A spark plug device includes a structure for modification of an arc, the modification including arc rotation. The spark plug can be used in a combustion engine to reduce emissions and/or improve fuel economy. A method for operating a spark plug and a combustion engine having the spark plug device includes the step of modifying an arc, the modifying including rotating the arc.

  15. Controlled deposition of sulphur-containing semiconductor and dielectric nano-structured films on metals in SF{sub 6} ion-ion plasma

    SciTech Connect (OSTI)

    Rafalskyi, Dmytro; Bredin, Jérôme; Aanesland, Ane

    2013-12-07

    In the present paper, the deposition processes and formation of films in SF{sub 6} ion-ion plasma, with positive and negative ion flows accelerated to the surface, are investigated. The PEGASES (acronym for Plasma Propulsion with Electronegative GASES) source is used as an ion-ion plasma source capable of generating almost ideal ion-ion plasma with negative ion to electron density ratio more than 2500. It is shown that film deposition in SF{sub 6} ion-ion plasma is very sensitive to the polarity of the incoming ions. The effect is observed for Cu, W, and Pt materials. The films formed on Cu electrodes during negative and positive ion assisted deposition were analyzed. Scanning electron microscope analysis has shown that both positive and negative ion fluxes influence the copper surface and leads to film formation, but with different structures of the surface: the low-energy positive ion bombardment causes the formation of a nano-pored film transparent for ions, while the negative ion bombardment leads to a continuous smooth insulating film. The transversal size of the pores in the porous film varies in the range 50–500 nm, and further analysis of the film has shown that the film forms a diode together with the substrate preventing positive charge drain, and positive ions are neutralized by passing through the nano-pores. The film obtained with the negative ion bombardment has an insulating surface, but probably with a multi-layer structure: destroying the top surface layer allows to measure similar “diode” IV-characteristics as for the nano-pored film case. Basing on results, practical conclusions for the probes and electrodes cleaning in ion-ion SF{sub 6} plasmas have been made. Different applications are proposed for the discovered features of the controlled deposition from ion-ion plasmas, from Li-sulphur rechargeable batteries manufacturing and nanofluidics issues to the applications for microelectronics, including low-k materials formation.

  16. DC arc weld starter

    DOE Patents [OSTI]

    Campiotti, Richard H. (Tracy, CA); Hopwood, James E. (Oakley, CA)

    1990-01-01

    A system for starting an arc for welding uses three DC power supplies, a high voltage supply for initiating the arc, an intermediate voltage supply for sustaining the arc, and a low voltage welding supply directly connected across the gap after the high voltage supply is disconnected.

  17. Growth and characterization of AuN films through the pulsed arc technique

    SciTech Connect (OSTI)

    Devia, A. Castillo, H.A.; Benavides, V.J.; Arango, Y.C.; Quintero, J.H.

    2008-02-15

    AuN films were produced through the PAPVD (Plasma Assisted Physics Vapor Deposition) method, using the pulsed arc technique in a mono-vaporizer noncommercial system, which consists of a chamber with two faced electrodes, and a power controlled system. In order to obtain the films, an Au Target with 99% purity and stainless steel 304 were used as target and substrate respectively. Nitrogen was injected in gaseous phase at 2.3 mbar pressure, and a discharge of 160 V was performed, supplied by the power controlled source. Au4f and N1s narrow spectra were analyzed using XPS (X-ray Photoelectron Spectroscopy)

  18. Plasma

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ... Because the higher harmonics effects are not important in our case, a hot plasma ... We study plasma heating at ci but not at the harmonics of this frequency, so that ...

  19. Plasma rotation and NTM onset driven by central EC deposition in TCV tokamak

    SciTech Connect (OSTI)

    Nowak, S.; Lazzaro, E. [Istituto di Fisica del Plasma CNR, Euratom Association, 20125 Milano (Italy); Sauter, O.; Canal, G.; Duval, B.; Federspiel, L.; Karpushov, A. N.; Kim, D.; Reimerders, H.; Rossel, J.; Testa, D.; Wagner, D. [Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas (CRPP), Association EURATOM-Confederation Suisse, 1015 Lausanne (Switzerland); Raju, D. [Institute for Plasma Research, Bhat, Gandhinagar, Gujarat (India); Collaboration: TCV Team

    2014-02-12

    The effects of the central electron cyclotron heating (ECH) and current drive (ECCD) on the spontaneous plasma rotation and on the presence of Tearing Modes (TM), observed in the TCV tokamak[1], were recently investigated as an interplay between the toroidal velocity and NTM onset in absence of sawteeth, ELMs and error fields [2–3]. In a set of reproducible TCV discharges (I{sub p}? ?150 kA, B{sub t}? ?1.4 T, ne,{sub av?} 1.5 10{sup 19} m{sup ?3}, T{sub e}? 3 keV and T{sub i}?0.25 keV, q{sub 95}?5.8) with both pure EC heating and current drive the cnt-Ip toroidal velocity was observed to be reduced with subsequent co-Ip appearance of 3/2 and 2/1 modes during the ramp up EC phases. The understanding of the capability of the on-axis EC power to modify the rotation profiles before and after the TM onset and of the sudden disappearance of 3/2 mode when 2/1 starts is the main purpose of this work. The velocity profile modifications are due to a direct effect of the EC absorbed power and also related to some variation of the perpendicular diffusion of the toroidal momentum and to magnetic braking effects of the kind of neoclassical toroidal viscosity (NTV) due to the NTM resonant field perturbations associated to the presence of TM. Numerical investigations are performed using a 1D toroidal momentum balance equation including contributions by external sources, as EC power, and NTV torques. Furthermore, the combined evolution of the 3/2 and 2/1 modes requires considering also coupling effects included in a generalized Rutherford equation for the modelling of the TM time growth.

  20. Effects of H{sub 2} plasma treatment on the electrical properties of titanium-doped indium oxide films prepared by polymer-assisted deposition

    SciTech Connect (OSTI)

    Hwang, Joo-Sang; Lee, Ji-Myon; Vishwanath, Sujaya Kumar; Kim, Jihoon

    2015-07-15

    The effects of hydrogen (H{sub 2}) plasma on the optical and electrical properties of titanium-doped InO (TIO) grown on glass substrates using polymer-assisted deposition are reported. Samples were exposed to H{sub 2} plasma formed by inductively coupled plasma (ICP). After plasma treatment at a power of 100?W, the sheet resistance of the TIO films decreased from 11?000 to 285??/sq. Additionally, the Hall mobility and sheet carrier concentration of the films increased as the ICP source power was increased to 100?W, without affecting the optical transmittance of the films, due to the removal of the polymer residues and the formation of oxygen vacancies.

  1. Arc Position Sensing Technology

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Arc Position Sensing Technology Award Winning Technology Flaws in specialty metals used in aerospace and other advanced applications are often caused by solidification problems that arise during the melting and refining process. A common problem is arc constriction during melting. Previously, these conditions could not be identified during furnace operations, requiring ingot manufacturers to perform extensive testing on all ingots. The Arc Position Sensing (APS) technology, developed by NETL's

  2. TIGER Arc Modification Application

    Energy Science and Technology Software Center (OSTI)

    1995-03-06

    The application enables the geometric correction of TIGER arcs to a more accurate spatial data set. This is done in a structured automated environment according to Census Bureau guidelines and New Mexico state GIS standards. Arcs may be deleted, added, combined, split, and moved relative to a coverage or image displayed in the background.

  3. Plasma window characterization

    SciTech Connect (OSTI)

    Krasik, Ya. E.; Gleizer, S.; Gurovich, V.; Kronhaus, I.; Hershcovitch, A.; Nozar, P.; Taliani, C.

    2007-03-01

    Parameters of an arc Ar plasma discharge used as a plasma window with a discharge current of {approx}50 A and a voltage of {approx}58 V are presented. It is shown that this arc discharge allows one to decrease the pressure at the low pressure end of the plasma window almost 380 times using relatively low pumping at the low pressure end of the plasma window. Calculations of the plasma parameters and their spatial distribution using a simple wall-stabilized arc model showed a satisfactory agreement with the experimentally obtained data. It is shown that a significant decrease in gas flow through the plasma window occurs due to the increase in plasma viscosity. An improvement of the plasma window ignition and some of its design aspects are described as well.

  4. Low-pressure hydrogen discharge maintenance in a large-size plasma source with localized high radio-frequency power deposition

    SciTech Connect (OSTI)

    Todorov, D.; Shivarova, A. Paunska, Ts.; Tarnev, Kh.

    2015-03-15

    The development of the two-dimensional fluid-plasma model of a low-pressure hydrogen discharge, presented in the study, is regarding description of the plasma maintenance in a discharge vessel with the configuration of the SPIDER source. The SPIDER source, planned for the neutral-beam-injection plasma-heating system of ITER, is with localized high RF power deposition to its eight drivers (cylindrical-coil inductive discharges) and a large-area second chamber, common for all the drivers. The continuity equations for the charged particles (electrons and the three types of positive ions) and for the neutral species (atoms and molecules), their momentum equations, the energy balance equations for electrons, atoms and molecules and the Poisson equations are involved in the discharge description. In addition to the local processes in the plasma volume, the surface processes of particle reflection and conversion on the walls as well as for a heat exchange with the walls are included in the model. The analysis of the results stresses on the role of the fluxes (particle and energy fluxes) in the formation of the discharge structure. The conclusion is that the discharge behavior is completely obeyed to non-locality. The latter is displayed by: (i) maximum values of plasma parameters (charged particle densities and temperatures of the neutral species) outside the region of the RF power deposition, (ii) shifted maxima of the electron density and temperature, of the plasma potential and of the electron production, (iii) an electron flux, with a vortex structure, strongly exceeding the total ion flux which gives evidence of a discharge regime of non-ambipolarity and (iv) a spatial distribution of the densities of the neutral species resulting from their fluxes.

  5. Plasma

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    confinement by circularly polarized electromagnetic field in toroidal geometry Vladimir A. Svidzinski University of Wisconsin-Madison, Madison, Wisconsin 53706, USA and Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA Í‘Received 21 May 2007; accepted 2 July 2007; published online 31 October 2007Í’ A novel plasma confinement concept based on plasma confinement by electromagnetic pressure of circularly polarized electromagnetic fields is proposed. Practical implementation of this

  6. Welding arc initiator

    DOE Patents [OSTI]

    Correy, T.B.

    1989-05-09

    An improved inert gas shielded tungsten arc welder is disclosed of the type wherein a tungsten electrode is shielded within a flowing inert gas, and, an arc, following ignition, burns between the energized tungsten electrode and a workpiece. The improvement comprises in combination with the tungsten electrode, a starting laser focused upon the tungsten electrode which to ignite the electrode heats a spot on the energized electrode sufficient for formation of a thermionic arc. Interference problems associated with high frequency starters are thus overcome. 3 figs.

  7. Welding arc initiator

    DOE Patents [OSTI]

    Correy, Thomas B. (Richland, WA)

    1989-01-01

    An improved inert gas shielded tungsten arc welder is disclosed of the type wherein a tungsten electrode is shielded within a flowing inert gas, and, an arc, following ignition, burns between the energized tungsten electrode and a workpiece. The improvement comprises in combination with the tungsten electrode, a starting laser focused upon the tungsten electrode which to ignite the electrode heats a spot on the energized electrode sufficient for formation of a thermionic arc. Interference problems associated with high frequency starters are thus overcome.

  8. Electric arc saw apparatus

    DOE Patents [OSTI]

    Deichelbohrer, Paul R [Richland, WA

    1986-01-01

    A portable, hand held electric arc saw has a small frame for supporting an electrically conducting rotary blade which serves as an electrode for generating an electric arc to erode a workpiece. Electric current is supplied to the blade by biased brushes and a slip ring which are mounted in the frame. A pair of freely movable endless belts in the form of crawler treads stretched between two pulleys are used to facilitate movement of the electric arc saw. The pulleys are formed of dielectric material to electrically insulate the crawler treads from the frame.

  9. Chemistry, phase formation, and catalytic activity of thin palladium-containing oxide films synthesized by plasma-assisted physical vapor deposition

    SciTech Connect (OSTI)

    Anders, Andre

    2010-11-26

    The chemistry, microstructure, and catalytic activity of thin films incorporating palladium were studied using scanning and transmission electron microscopies, X-ray diffraction, spectrophotometry, 4-point probe and catalytic tests. The films were synthesized using pulsed filtered cathodic arc and magnetron sputter deposition, i.e. techniques far from thermodynamic equilibrium. Catalytic particles were formed by thermally cycling thin films of the Pd-Pt-O system. The evolution and phase formation in such films as a function of temperature were discussed in terms of the stability of PdO and PtO2 in air. The catalytic efficiency was found to be strongly affected by the chemical composition, with oxidized palladium definitely playing a major role in the combustion of methane. Reactive sputter deposition of thin films in the Pd-Zr-Y-O system allowed us forming microstructures ranging from nanocrystalline zirconia to palladium nanoparticles embedded in a (Zr,Y)4Pd2O matrix. The sequence of phase formation is put in relation to simple thermodynamic considerations.

  10. Multi-cathode metal vapor arc ion source

    DOE Patents [OSTI]

    Brown, Ian G. (1088 Woodside Rd., Berkeley, CA 94708); MacGill, Robert A. (645 Kern St., Richmond, CA 94805)

    1988-01-01

    An ion generating apparatus utilizing a vacuum chamber, a cathode and an anode in the chamber. A source of electrical power produces an arc or discharge between the cathode and anode. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma is directed to an extractor which separates the electrons from the plasma, and accelerates the ions to produce an ion beam. One embodiment of the appaatus utilizes a multi-cathode arrangement for interaction with the anode.

  11. Filtered cathodic arc source

    DOE Patents [OSTI]

    Falabella, Steven (Livermore, CA); Sanders, David M. (Livermore, CA)

    1994-01-01

    A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45.degree. to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles.

  12. Filtered cathodic arc source

    DOE Patents [OSTI]

    Falabella, S.; Sanders, D.M.

    1994-01-18

    A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge is described. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45[degree] to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles. 3 figures.

  13. Electric arc saw apparatus

    DOE Patents [OSTI]

    Deichelbohrer, P.R.

    1983-08-08

    A portable, hand-held electric arc saw apparatus comprising a small frame for supporting an electrically conducting rotary blade which serves as an electrode for generating an electric arc between the blade and a workpiece of opposite polarity. Electrically conducting means are provided on said frame for transmitting current to said blade. A pair of freely movable endless belts in the form of crawler treads are employed to facilitate movement of the apparatus relative to the workpiece.

  14. Measurement of total ion current from vacuum arc plasmasources

    SciTech Connect (OSTI)

    Oks, Efim M.; Savkin, Konstantin P.; Yushkov, Georgiu Yu.; Nikolaev, Alexey G.; Anders, A.; Brown, Ian G.

    2005-07-01

    The total ion current generated by a vacuum arc plasma source was measured. The discharge system investigated allowed ion collection from the arc plasma streaming through a hemispherical mesh anode with geometric transparency of 72 percent. A range of different cathode materials was investigated, and the arc current was varied over the range 50-500 A. We find that the normalized ion current (Iion/Iarc) depends on the cathode material, with values in the range from 5 percent to 19 percent and generally greater for elements of low cohesive energy. The application of a strong axial magnetic field in the cathode and arc region leads to increased normalized ion current, but only by virtue of enhanced ion charge states formed in a strong magnetic field.

  15. Thermocapillary and arc phenomena in stainless steel welding

    SciTech Connect (OSTI)

    Pierce, S.W.; Olson, D.L.; Burgardt, P.

    1999-02-01

    This investigation characterized the effects of power level and Gaussian heat source size on thermocapillary-induced weld shape and estimated the relative influence of various possible arc phenomena in determining weld shape. Welds made with the CTAW process were compared with similar ones made with a conduction-mode EBW process and the differences were related to arc effects. Evidence of thermocapillary flow was readily apparent in both the GTA welds and the conduction-mode EB welds and was qualitatively similar in both. The similarity between the results obtained with the two processes serves to demonstrate that thermocapillary convection is the dominant factor in heat-to-heat weld shape variability. However, a similar one-to-one correspondence between welds produced with the two processes does not exist. Especially at high power, the EB welds showed stronger thermocapillary convection than the GTA welds. One important arc factor that limits thermocapillary flow in ar welds appears to be an increase in arc size with arc length and arc current. A non-Gaussian arc power distribution in GTAW seems to be most important in limiting the fluid flow. Apparently, the arc power distribution is more nearly rectangular in shape for an argon gas arc. At higher currents, above 200 A, plasma shear force may also be an important contributor to weld shape development. The conduction-mode EB welds demonstrate that thermocapillary flow reversal probably does not occur in welds made with a simple Gaussian heat source. The complex shape behavior is likely a result of an arc effect such as plasma shear.

  16. Room temperature photoluminescence from In{sub x}Al{sub (1?x)}N films deposited by plasma-assisted molecular beam epitaxy

    SciTech Connect (OSTI)

    Kong, W. Jiao, W. Y.; Kim, T. H.; Brown, A. S.; Mohanta, A.; Roberts, A. T.; Fournelle, J.; Losurdo, M.; Everitt, H. O.

    2014-09-29

    InAlN films deposited by plasma-assisted molecular beam epitaxy exhibited a lateral composition modulation characterized by 10–12?nm diameter, honeycomb-shaped, columnar domains with Al-rich cores and In-rich boundaries. To ascertain the effect of this microstructure on its optical properties, room temperature absorption and photoluminescence characteristics of In{sub x}Al{sub (1?x)}N were comparatively investigated for indium compositions ranging from x?=?0.092 to 0.235, including x?=?0.166 lattice matched to GaN. The Stokes shift of the emission was significantly greater than reported for films grown by metalorganic chemical vapor deposition, possibly due to the phase separation in these nanocolumnar domains. The room temperature photoluminescence also provided evidence of carrier transfer from the InAlN film to the GaN template.

  17. Infrared study on room-temperature atomic layer deposition of HfO{sub 2} using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents

    SciTech Connect (OSTI)

    Kanomata, Kensaku [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan and Japan Society for the Promotion of Science, 5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083 (Japan); Ohba, Hisashi; Pungboon Pansila, P.; Ahmmad, Bashir; Kubota, Shigeru; Hirahara, Kazuhiro; Hirose, Fumihiko, E-mail: fhirose@yz.yamagata-u.ac.jp [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510 (Japan)

    2015-01-01

    Room-temperature atomic layer deposition (ALD) of HfO{sub 2} was examined using tetrakis (ethylmethylamino)hafnium (TEMAH) and remote plasma-excited water and oxygen. A growth rate of 0.26?nm/cycle at room temperature was achieved, and the TEMAH adsorption and its oxidization on HfO{sub 2} were investigated by multiple internal reflection infrared absorption spectroscopy. It was observed that saturated adsorption of TEMAH occurs at exposures of ?1?×?10{sup 5}?L (1 L?=?1?×?10{sup ?6} Torr s) at room temperature, and the use of remote plasma-excited water and oxygen vapor is effective in oxidizing the TEMAH molecules on the HfO{sub 2} surface, to produce OH sites. The infrared study suggested that Hf–OH plays a role as an adsorption site for TEMAH. The reaction mechanism of room temperature HfO{sub 2} ALD is discussed in this paper.

  18. High spatial resolution mapping of deposition layers on plasma facing materials by laser ablation microprobe time-of-flight mass spectroscopy

    SciTech Connect (OSTI)

    Xiao, Qingmei; Li, Cong; Hai, Ran; Zhang, Lei; Feng, Chunlei; Ding, Hongbin, E-mail: hding@dlut.edu.cn [School of Physics and Optical Electronic Technology, Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Chinese Ministry of Education, Dalian University of Technology, Dalian 116024 (China); Zhou, Yan; Yan, Longwen; Duan, Xuru [Southwestern Institute of Physics, P.O. Box 432, No. 3 South Section 3, Circle Road 2, Chengdu 610041, Sichuan (China)

    2014-05-15

    A laser ablation microprobe time-of-flight mass spectroscopy (LAM-TOF-MS) system with high spatial resolution, ?20 nm in depth and ?500 ?m or better on the surface, is developed to analyze the composition distributions of deposition layers on the first wall materials or first mirrors in tokamak. The LAM-TOF-MS system consists of a laser ablation microprobe combined with a TOF-MS and a data acquisition system based on a LabVIEW program software package. Laser induced ablation combined with TOF-MS is an attractive method to analyze the depth profile of deposited layer with successive laser shots, therefore, it can provide information for composition reconstruction of the plasma wall interaction process. In this work, we demonstrate that the LAM-TOF-MS system is capable of characterizing the depth profile as well as mapping 2D composition of deposited film on the molybdenum first mirror retrieved from HL-2A tokamak, with particular emphasis on some of the species produced during the ablation process. The presented LAM-TOF-MS system provides not only the 3D characterization of deposition but also the removal efficiency of species of concern.

  19. Low-temperature atomic layer deposition of Al{sub 2}O{sub 3} on blown polyethylene films with plasma-treated surfaces

    SciTech Connect (OSTI)

    Beom Lee, Gyeong; Sik Son, Kyung; Won Park, Suk; Hyung Shim, Joon; Choi, Byoung-Ho

    2013-01-15

    In this study, a layer of Al{sub 2}O{sub 3} was deposited on blown polyethylene films by atomic layer deposition (ALD) at low temperatures, and the surface characteristics of these Al{sub 2}O{sub 3}-coated blown polyethylene films were analyzed. In order to examine the effects of the plasma treatment of the surfaces of the blown polyethylene films on the properties of the films, both untreated and plasma-treated film samples were prepared under various processing conditions. The surface characteristics of the samples were determined by x-ray photoelectron spectroscopy, as well as by measuring their surface contact angles. It was confirmed that the surfaces of the plasma-treated samples contained a hydroxyl group, which helped the precursor and the polyethylene substrate to bind. ALD of Al{sub 2}O{sub 3} was performed through sequential exposures to trimethylaluminum and H{sub 2}O at 60 Degree-Sign C. The surface morphologies of the Al{sub 2}O{sub 3}-coated blown polyethylene films were observed using atomic force microscopy and scanning electron microscopy/energy-dispersive x-ray spectroscopy. Further, it was confirmed that after ALD, the surface of the plasma-treated film was covered with alumina grains more uniformly than was the case for the surface of the untreated polymer film. It was also confirmed via the focused ion beam technique that the layer Al{sub 2}O{sub 3} conformed to the surface of the blown polyethylene film.

  20. Parallel vacuum arc discharge with microhollow array dielectric and anode

    SciTech Connect (OSTI)

    Feng, Jinghua; Zhou, Lin; Fu, Yuecheng; Zhang, Jianhua; Xu, Rongkun; Chen, Faxin; Li, Linbo; Meng, Shijian

    2014-07-15

    An electrode configuration with microhollow array dielectric and anode was developed to obtain parallel vacuum arc discharge. Compared with the conventional electrodes, more than 10 parallel microhollow discharges were ignited for the new configuration, which increased the discharge area significantly and made the cathode eroded more uniformly. The vacuum discharge channel number could be increased effectively by decreasing the distances between holes or increasing the arc current. Experimental results revealed that plasmas ejected from the adjacent hollow and the relatively high arc voltage were two key factors leading to the parallel discharge. The characteristics of plasmas in the microhollow were investigated as well. The spectral line intensity and electron density of plasmas in microhollow increased obviously with the decease of the microhollow diameter.

  1. Growth, microstructure, and field-emission properties of synthesized diamond film on adamantane-coated silicon substrate by microwave plasma chemical vapor deposition

    SciTech Connect (OSTI)

    Tiwari, Rajanish N.; Chang Li

    2010-05-15

    Diamond nucleation on unscratched Si surface is great importance for its growth, and detailed understanding of this process is therefore desired for many applications. The pretreatment of the substrate surface may influence the initial growth period. In this study, diamond films have been synthesized on adamantane-coated crystalline silicon {l_brace}100{r_brace} substrate by microwave plasma chemical vapor deposition from a gaseous mixture of methane and hydrogen gases without the application of a bias voltage to the substrates. Prior to adamantane coating, the Si substrates were not pretreated such as abraded/scratched. The substrate temperature was {approx}530 deg. C during diamond deposition. The deposited films are characterized by scanning electron microscopy, Raman spectrometry, x-ray diffraction, and x-ray photoelectron spectroscopy. These measurements provide definitive evidence for high-crystalline quality diamond film, which is synthesized on a SiC rather than clean Si substrate. Characterization through atomic force microscope allows establishing fine quality criteria of the film according to the grain size of nanodiamond along with SiC. The diamond films exhibit a low-threshold (55 V/{mu}m) and high current-density (1.6 mA/cm{sup 2}) field-emission (FE) display. The possible mechanism of formation of diamond films and their FE properties have been demonstrated.

  2. Hall-effect arc protector

    DOE Patents [OSTI]

    Rankin, R.A.; Kotter, D.K.

    1997-05-13

    The Hall-Effect Arc Protector is used to protect sensitive electronics from high energy arcs. The apparatus detects arcs by monitoring an electrical conductor, of the instrument, for changes in the electromagnetic field surrounding the conductor which would be indicative of a possible arcing condition. When the magnitude of the monitored electromagnetic field exceeds a predetermined threshold, the potential for an instrument damaging are exists and the control system logic activates a high speed circuit breaker. The activation of the breaker shunts the energy imparted to the input signal through a dummy load to the ground. After the arc condition is terminated, the normal signal path is restored. 2 figs.

  3. Hall-effect arc protector

    DOE Patents [OSTI]

    Rankin, Richard A. (Ammon, ID); Kotter, Dale K. (Shelley, ID)

    1997-01-01

    The Hall-Effect Arc Protector is used to protect sensitive electronics from high energy arcs. The apparatus detects arcs by monitoring an electrical conductor, of the instrument, for changes in the electromagnetic field surrounding the conductor which would be indicative of a possible arcing condition. When the magnitude of the monitored electromagnetic field exceeds a predetermined threshold, the potential for an instrument damaging are exists and the control system logic activates a high speed circuit breaker. The activation of the breaker shunts the energy imparted to the input signal through a dummy load to the ground. After the arc condition is terminated, the normal signal path is restored.

  4. Numerical analysis of a mixture of Ar/NH{sub 3} microwave plasma chemical vapor deposition reactor

    SciTech Connect (OSTI)

    Li Zhi [School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024 (China); School of Science, University of Science and Technology Liaoning, Anshan 114051 (China); Zhao Zhen [Chemistry Department, Anshan Normal University, Anshan 114007 (China); School of Chemical Engineering, University of Science and Technology Liaoning, Anshan 114051 (China); Li Xuehui [School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024 (China); Physical Science and Technical College, Dalian University, Dalian 116622 (China)

    2012-06-01

    A two-dimensional fluid model has been used to investigate the properties of plasma in Ar/NH{sub 3} microwave electron cyclotron resonance discharge at low pressure. The electromagnetic field model solved by the three-dimensional Simpson method is coupled to a fluid plasma model. The finite difference method was employed to discrete the governing equations. 40 species (neutrals, radicals, ions, and electrons) are consisted in the model. In total, 75 electron-neutral, 43 electron-ion, 167 neutral-neutral, 129 ion-neutral, 28 ion-ion, and 90 3-body reactions are used in the model. According to the simulation, the distribution of the densities of the considered plasma species has been showed and the mechanisms of their variations have been discussed. It is found that the main neutrals (Ar*, Ar**, NH{sub 3}{sup *}, NH, H{sub 2}, NH{sub 2}, H, and N{sub 2}) are present at high densities in Ar/NH{sub 3} microwave electron cyclotron resonance discharge when the mixing ratio of Ar/NH{sub 3} is 1:1 at 20 Pa. The density of NH is more than that of NH{sub 2} atom. And NH{sub 3}{sup +} are the most important ammonia ions. But the uniformity of the space distribution of NH{sub 3}{sup +} is lower than the other ammonia ions.

  5. Microwave Plasma Chemical Vapor Deposition of Nano-Structured Sn/C Composite Thin-Film Anodes for Li-ion Batteries

    SciTech Connect (OSTI)

    Stevenson, Cynthia; Marcinek, M.; Hardwick, L.J.; Richardson, T.J.; Song, X.; Kostecki, R.

    2008-02-01

    In this paper we report results of a novel synthesis method of thin-film composite Sn/C anodes for lithium batteries. Thin layers of graphitic carbon decorated with uniformly distributed Sn nanoparticles were synthesized from a solid organic precursor Sn(IV) tert-butoxide by a one step microwave plasma chemical vapor deposition (MPCVD). The thin-film Sn/C electrodes were electrochemically tested in lithium half cells and produced a reversible capacity of 440 and 297 mAhg{sup -1} at C/25 and 5C discharge rates, respectively. A long term cycling of the Sn/C nanocomposite anodes showed 40% capacity loss after 500 cycles at 1C rate.

  6. Controlling electrode gap during vacuum arc remelting at low melting current

    DOE Patents [OSTI]

    Williamson, R.L.; Zanner, F.J.; Grose, S.M.

    1997-04-15

    An apparatus and method are disclosed for controlling electrode gap in a vacuum arc remelting furnace, particularly at low melting currents. Spectrographic analysis is performed of the metal vapor plasma, from which estimates of electrode gap are derived. 5 figs.

  7. Controlling electrode gap during vacuum arc remelting at low melting current

    DOE Patents [OSTI]

    Williamson, Rodney L. (Albuquerque, NM); Zanner, Frank J. (Sandia Park, NM); Grose, Stephen M. (Glenwood, WV)

    1997-01-01

    An apparatus and method for controlling electrode gap in a vacuum arc remelting furnace, particularly at low melting currents. Spectrographic analysis is performed of the metal vapor plasma, from which estimates of electrode gap are derived.

  8. Controlled zone microwave plasma system

    DOE Patents [OSTI]

    Ripley, Edward B. (Knoxville, TN); Seals, Roland D. (Oak Ridge, TN); Morrell, Jonathan S. (Knoxville, TN)

    2009-10-20

    An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

  9. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    An Iridate with Fermi Arcs An Iridate with Fermi Arcs Print Wednesday, 29 October 2014 00:00 Researchers have discovered that "Fermi arcs," which are much-debated features found in the electronic structure of high-temperature superconducting (HTSC) cuprates, can also be found in an iridate (iridium oxide) compound. At the ALS, the researchers observed the electronic structure of strontium iridate as it evolved through different doping levels and temperatures by using angle-resolved

  10. Ryuku Arc | Open Energy Information

    Open Energy Info (EERE)

    navigation, search GEOTHERMAL ENERGYGeothermal Home Ryuku Arc Details Areas (5) Power Plants (8) Projects (0) Techniques (0) References Geothermal Region Data Country(ies) Japan...

  11. Self-organisation Processes In The Carbon ARC For Nanosynthis

    SciTech Connect (OSTI)

    Ng, J.; Raitses, Yefgeny

    2014-02-02

    The atmospheric pressure carbon arc in inert gases such as helium is an important method for the production of nanomaterials. It has recently been shown that the formation of the carbon deposit on the cathode from gaseous carbon plays a crucial role in the operation of the arc, reaching the high temperatures necessary for thermionic emission to take place even with low melting point cathodes. Based on observed ablation and deposition rates, we explore the implications of deposit formation on the energy balance at the cathode surface, and show how the operation of the arc is self-organised process. Our results suggest that the can arc operate in two di erent regimes, one of which has an important contribution from latent heat to the cathode energy balance. This regime is characterised by the enhanced ablation rate, which may be favourable for high yield synthesis of nanomaterials. The second regime has a small and approximately constant ablation rate with a negligible contribution from latent heat.

  12. Self-organisation Processes In The Carbon ARC For Nanosynthis

    SciTech Connect (OSTI)

    Ng, Jonathan; Raitses, Yevgeny

    2014-02-26

    The atmospheric pressure carbon arc in inert gases such as helium is an important method for the production of nanomaterials. It has recently been shown that the formation of the carbon deposit on the cathode from gaseous carbon plays a crucial role in the operation of the arc, reaching the high temperatures necessary for thermionic emission to take place even with low melting point cathodes. Based on observed ablation and deposition rates, we explore the implications of deposit formation on the energy balance at the cathode surface, and show how the operation of the arc is self-organised process. Our results suggest that the can arc operate in two di erent regimes, one of which has an important contribution from latent heat to the cathode energy balance. This regime is characterised by the enhanced ablation rate, which may be favourable for high yield synthesis of nanomaterials. The second regime has a small and approximately constant ablation rate with a negligible contribution from latent heat.

  13. Thermocapillary and arc phenomena in stainless steel welds

    SciTech Connect (OSTI)

    Pierce, S.W.

    1993-10-01

    Goal was to study effect of power level and distribution on thermocapiilary-induced weld shape and of arc factors on weld shape. Thermocapillarity was apparent in both conduction mode EB welds and GTA welds, particularly in the former. A non-Gaussian arc distribution is suggested for accounting for the differences between the twoss processes. At higher current levels (200--300 A), plasma shear force also contributes to weld shape development. Evidence suggests that thermocapillary flow reversal is not a factor in normal GTA welds; EDB flow reversal occurs only at high power density levels where the keyhole mode is present.

  14. Gallium composition dependence of crystallographic and thermoelectric properties in polycrystalline type-I Ba{sub 8}Ga{sub x}Si{sub 46-x} (nominal x=14-18) clathrates prepared by combining arc melting and spark plasma sintering methods

    SciTech Connect (OSTI)

    Anno, Hiroaki; JST, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 ; Yamada, Hiroki; Nakabayashi, Takahiro; Hokazono, Masahiro; Shirataki, Ritsuko; JST, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075

    2012-09-15

    The gallium composition dependence of crystallographic and thermoelectric properties in polycrystalline n-type Ba{sub 8}Ga{sub x}Si{sub 46-x} (nominal x=14-18) compounds with the type-I clathrate structure is presented. Samples were prepared by combining arc melting and spark plasma sintering methods. Powder x-ray diffraction, Rietveld analysis, scanning electron microscopy, and energy-dispersive x-ray spectroscopy show that the solubility limit of gallium in the type-I clathrate phase is close to x=15, which is slightly higher than that for a single crystal. The carrier concentration at room temperature decreases from 2 Multiplication-Sign 10{sup 21} cm{sup -3} to 4 Multiplication-Sign 10{sup 20} cm{sup -3} as the Ga content x increases. The Seebeck coefficient, the electrical conductivity, and the thermal conductivity vary systematically with the carrier concentration when the Ga content x varies. The effective mass (2.0m{sub 0}), the carrier mobility (10 cm{sup 2} V{sup -1} s{sup -1}), and the lattice thermal conductivity (1.1 W m{sup -1} K{sup -1}) are determined for the Ga content x=14.51. The dimensionless thermoelectric figure of merit ZT is about 0.55 at 900 K for the Ga content x=14.51. The calculation of ZT using the experimentally determined material parameters predicts ZT=0.8 (900 K) at the optimum carrier concentration of about 2 Multiplication-Sign 10{sup 20} cm{sup -3}. - Graphical abstract: The gallium composition dependence of crystallographic and thermoelectric properties is presented on polycrystalline n-type Ba{sub 8}Ga{sub x}Si{sub 46-x} with the type-I clathrate structure prepared by combining arc melting and spark plasma sintering methods. The thermoelectric figure of merit ZT reaches 0.55 at 900 K due to the increase in the Ga content (close to x=15), and a calculation predicts further improvement of ZT at the optimized carrier concentration. Highlights: Black-Right-Pointing-Pointer Crystallographic properties of Ba{sub 8}Ga{sub x}Si{sub 46-x} clathrates are characterized. Black-Right-Pointing-Pointer Arc melting and spark plasma sintering process enables increase of Ga content. Black-Right-Pointing-Pointer We elucidate the Ga composition dependence of thermoelectric properties. Black-Right-Pointing-Pointer Thermoelectric figure of merit ZT is improved due to the increased Ga content. Black-Right-Pointing-Pointer Calculation predicts a potential ZT=0.8 at 900 K at optimized carrier concentration.

  15. Mirror plasma apparatus

    DOE Patents [OSTI]

    Moir, Ralph W. (Livermore, CA)

    1981-01-01

    A mirror plasma apparatus which utilizes shielding by arc discharge to form a blanket plasma and lithium walls to reduce neutron damage to the wall of the apparatus. An embodiment involves a rotating liquid lithium blanket for a tandem mirror plasma apparatus wherein the first wall of the central mirror cell is made of liquid lithium which is spun with angular velocity great enough to keep the liquid lithium against the first material wall, a blanket plasma preventing the lithium vapor from contaminating the plasma.

  16. Arc fault detection system

    DOE Patents [OSTI]

    Jha, K.N.

    1999-05-18

    An arc fault detection system for use on ungrounded or high-resistance-grounded power distribution systems is provided which can be retrofitted outside electrical switchboard circuits having limited space constraints. The system includes a differential current relay that senses a current differential between current flowing from secondary windings located in a current transformer coupled to a power supply side of a switchboard, and a total current induced in secondary windings coupled to a load side of the switchboard. When such a current differential is experienced, a current travels through a operating coil of the differential current relay, which in turn opens an upstream circuit breaker located between the switchboard and a power supply to remove the supply of power to the switchboard. 1 fig.

  17. Arc fault detection system

    DOE Patents [OSTI]

    Jha, Kamal N. (Bethel Park, PA)

    1999-01-01

    An arc fault detection system for use on ungrounded or high-resistance-grounded power distribution systems is provided which can be retrofitted outside electrical switchboard circuits having limited space constraints. The system includes a differential current relay that senses a current differential between current flowing from secondary windings located in a current transformer coupled to a power supply side of a switchboard, and a total current induced in secondary windings coupled to a load side of the switchboard. When such a current differential is experienced, a current travels through a operating coil of the differential current relay, which in turn opens an upstream circuit breaker located between the switchboard and a power supply to remove the supply of power to the switchboard.

  18. Reducing the Risk of Arc-Faults

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    arc-fault detection algorithms by: 1. Performing arcing tests at the Distributed Energy Technologies Laboratory (DETL) with AFCI prototypes to verify their functionality on...

  19. Plasma torch with liquid metal electrodes

    SciTech Connect (OSTI)

    Predtechenskii, M.R.; Tukhto, O.M.

    2006-03-15

    In order to eliminate the negative effect of erosion processes on electrodes in arc plasma generators, a new scheme of arc discharge was proposed in which the surface of a molten metal acts as electrodes. A plasma reactor was designed on the basis of this concept. The electrophysical characteristics of such a discharge in steam and air as plasma gases were studied. Experiments on destruction of toxic polychlorinated biphenyls and steam coal gasification were performed.

  20. Process Simulation of Gas Metal Arc Welding Software

    Energy Science and Technology Software Center (OSTI)

    2005-09-06

    ARCWELDER is a Windows-based application that simulates gas metal arc welding (GMAW) of steel and aluminum. The software simulates the welding process in an accurate and efficient manner, provides menu items for process parameter selection, and includes a graphical user interface with the option to animate the process. The user enters the base and electrode material, open circuit voltage, wire diameter, wire feed speed, welding speed, and standoff distance. The program computes the size andmore » shape of a square-groove or V-groove weld in the flat position. The program also computes the current, arc voltage, arc length, electrode extension, transfer of droplets, heat input, filler metal deposition, base metal dilution, and centerline cooling rate, in English or SI units. The simulation may be used to select welding parameters that lead to desired operation conditions.« less

  1. Experiments with background gas in a vacuum arc centrifuge

    SciTech Connect (OSTI)

    Dallaqua, R.S.; Simpson, S.W.; Del Bosco, E.

    1996-04-01

    Since promising isotope separation results were first reported by Krishnan et al. in 1981, a range of vacuum arc centrifuge experiments have been conducted in laboratories around the world. The PCEN (Plasma CENtrifuge) vacuum arc centrifuge at the Brazilian National Institute for Space Research has been used for isotope separation studies with cathode materials of carbon and magnesium and also to investigate the performance in terms of the rotational velocity attained for different cathode materials. Here, a vacuum arc centrifuge has been operated with an initial filling gas of either argon or hydrogen for pressures ranging from 10{sup {minus}3} to 10{sup {minus}1} Pa. The angular velocity {omega} of the plasma has been determined by cross-correlating the signals from potential probes, and the electron temperature T has been deduced from Langmuir probe data. At high gas pressures and early times during the 14 ms plasma lifetime, high-frequency nonuniformities frequently observed in the vacuum discharge disappear, suggesting that the associated instability is suppressed. Under the same conditions, nonuniformities rotating with much lower angular velocities are observed in the plasma. Temperatures are reduced in the presence of the background gas, and the theoretical figure of merit for separation proportional to {omega}{sup 2}/T is increased compared to its value in the vacuum discharge for both argon and hydrogen gas fillings.

  2. Percussive arc welding apparatus

    DOE Patents [OSTI]

    Hollar, Jr., Donald L. (Overland Park, KS)

    2002-01-01

    A percussive arc welding apparatus includes a generally cylindrical actuator body having front and rear end portions and defining an internal recess. The front end of the body includes an opening. A solenoid assembly is provided in the rear end portion in the internal recess of the body, and an actuator shaft assembly is provided in the front end portion in the internal recess of the actuator body. The actuator shaft assembly includes a generally cylindrical actuator block having first and second end portions, and an actuator shaft having a front end extending through the opening in the actuator body, and the rear end connected to the first end portion of the actuator block. The second end portion of the actuator block is in operational engagement with the solenoid shaft by a non-rigid connection to reduce the adverse rebound effects of the actuator shaft. A generally transversely extending pin is rigidly secured to the rear end of the shaft. One end of the pin is received in a slot in the nose housing sleeve to prevent rotation of the actuator shaft during operation of the apparatus.

  3. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    research: Y.K. Kim, O. Krupin, J.D. Denlinger, A. Bostwick, E. Rotenberg, Q. Zhao, J.F. Mitchell, J.W. Allen, and B.J Kim, "Fermi arcs in a doped pseudospin-12 Heisenberg...

  4. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    An Iridate with Fermi Arcs Print Researchers have discovered that "Fermi arcs," which are much-debated features found in the electronic structure of high-temperature superconducting (HTSC) cuprates, can also be found in an iridate (iridium oxide) compound. At the ALS, the researchers observed the electronic structure of strontium iridate as it evolved through different doping levels and temperatures by using angle-resolved photoemission spectroscopy (ARPES) with in situ electron doping

  5. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    An Iridate with Fermi Arcs Print Researchers have discovered that "Fermi arcs," which are much-debated features found in the electronic structure of high-temperature superconducting (HTSC) cuprates, can also be found in an iridate (iridium oxide) compound. At the ALS, the researchers observed the electronic structure of strontium iridate as it evolved through different doping levels and temperatures by using angle-resolved photoemission spectroscopy (ARPES) with in situ electron doping

  6. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    An Iridate with Fermi Arcs Print Researchers have discovered that "Fermi arcs," which are much-debated features found in the electronic structure of high-temperature superconducting (HTSC) cuprates, can also be found in an iridate (iridium oxide) compound. At the ALS, the researchers observed the electronic structure of strontium iridate as it evolved through different doping levels and temperatures by using angle-resolved photoemission spectroscopy (ARPES) with in situ electron doping

  7. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    An Iridate with Fermi Arcs Print Researchers have discovered that "Fermi arcs," which are much-debated features found in the electronic structure of high-temperature superconducting (HTSC) cuprates, can also be found in an iridate (iridium oxide) compound. At the ALS, the researchers observed the electronic structure of strontium iridate as it evolved through different doping levels and temperatures by using angle-resolved photoemission spectroscopy (ARPES) with in situ electron doping

  8. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    An Iridate with Fermi Arcs Print Researchers have discovered that "Fermi arcs," which are much-debated features found in the electronic structure of high-temperature superconducting (HTSC) cuprates, can also be found in an iridate (iridium oxide) compound. At the ALS, the researchers observed the electronic structure of strontium iridate as it evolved through different doping levels and temperatures by using angle-resolved photoemission spectroscopy (ARPES) with in situ electron doping

  9. Dynamic and spectroscopic characteristics of atmospheric gliding arc in gas-liquid two-phase flow

    SciTech Connect (OSTI)

    Tu, X.; Yu, L.; Yan, J. H.; Cen, K. F.; Cheron, B. G.

    2009-11-15

    In this study, an atmospheric alternating-current gliding arc device in gas-liquid two-phase flow has been developed for the purpose of waste water degradation. The dynamic behavior of the gas-liquid gliding arc is investigated through the oscillations of electrical signals, while the spatial evolution of the arc column is analyzed by high speed photography. Different arc breakdown regimes are reported, and the restrike mode is identified as the typical fluctuation characteristic of the hybrid gliding arc in air-water mixture. Optical emission spectroscopy is employed to investigate the active species generated in the gas-liquid plasma. The axial evolution of the OH (309 nm) intensity is determined, while the rotational and vibrational temperatures of the OH are obtained by a comparison between the experimental and simulated spectra. The significant discrepancy between the rotational and translational temperatures has also been discussed.

  10. A study of vacuum arc ion velocities using a linear set of probes

    SciTech Connect (OSTI)

    Hohenbild, Stefan; Grubel, Christoph; Yushkov, Georgy Yu.; Oks, Efim M.; Anders, Andre

    2008-07-15

    The most likely velocity of ions moving away from vacuum arc cathode spots was measured using a set of probes along the path of plasma expansion. The goal was to determine how much, if any, change of the ion drift velocity occurs in the expanded plasma. The arc discharge current was perturbed to create plasma density markers whose travel is picked up by the set of probes. It was found that the perturbation with current oscillations did not result in consistent data because ion current maxima and minima are not only determined by the plasma production but by the transients of the arc pulse and by the asymmetry of the ion velocity distribution function. Perturbation with a short current spike was more conclusive. The ion velocity was measured to be slightly reduced with increasing distance from the cathode, which can be explained by collisions of ions with the background of neutrals. The ion velocity was increased when the arc current was increased, which correlated with enhanced arc voltage and power dissipation. The ion velocity could be enhanced when the plasma was produced in a non-uniform magnetic field.

  11. Pulse Thermal Processing of Functional Materials Using a Directed Plasma

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Arc - Energy Innovation Portal Early Stage R&D Early Stage R&D Advanced Materials Advanced Materials Find More Like This Return to Search Pulse Thermal Processing of Functional Materials Using a Directed Plasma Arc Oak Ridge National Laboratory Contact ORNL About This Technology Technology Marketing SummaryUsing pulses of high density infrared light from a directed plasma arc, ORNL researchers invented a method to thermally process thin films and other functional materials on

  12. Hollow Plasma in a Solenoid

    SciTech Connect (OSTI)

    Anders, Andre; Kauffeldt, Marina; Oks, Efim M.; Roy, Prabir K.

    2010-11-30

    A ring cathode for a pulsed, high-current, multi-spot cathodic arc discharge was placed inside a pulsed magnetic solenoid. Photography is used to evaluate the plasma distribution. The plasma appears hollow for cathode positions close the center of the solenoid, and it is guided closer to the axis when the cathode is away from the center.

  13. A Catalyst Wire-feed Arc Discharge for Synthesis of Carbon Nanotubes and

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Graphene Particles | Princeton Plasma Physics Lab A Catalyst Wire-feed Arc Discharge for Synthesis of Carbon Nanotubes and Graphene Particles This invention pertains to a highly effective arc-based synthesis of single wall carbon nanotubes and graphene particles using catalysts in the form of wires made from ion group alloys instead of commonly used catalyst powders. The catalyst wire can be introduced into the discharge either from the anode or cathode regions or into the inter-electrode

  14. Self-organisation processes in the carbon arc for nanosynthesis (Journal

    Office of Scientific and Technical Information (OSTI)

    Article) | SciTech Connect Self-organisation processes in the carbon arc for nanosynthesis Citation Details In-Document Search Title: Self-organisation processes in the carbon arc for nanosynthesis Authors: Ng, J. [1] ; Raitses, Y. [1] Search SciTech Connect for author "Raitses, Y." Search SciTech Connect for ORCID "0000000293829963" Search orcid.org for ORCID "0000000293829963" + Show Author Affiliations Princeton Plasma Physics Laboratory, Princeton, New

  15. Ion velocities in a micro-cathode arc thruster

    SciTech Connect (OSTI)

    Zhuang Taisen; Shashurin, Alexey; Keidar, Michael; Beilis, Isak

    2012-06-15

    Ion velocities in the plasma jet generated by the micro-cathode arc thruster are studied by means of time-of-flight method using enhanced ion detection system (EIDS). The EIDS triggers perturbations (spikes) on arc current waveform, and the larger current in the spike generates denser plasma bunches propagating along with the mainstream plasma. The EIDS utilizes double electrostatic probes rather than single probes. The average Ti ion velocity is measured to be around 2 Multiplication-Sign 10{sup 4} m/s without a magnetic field. It was found that the application of a magnetic field does not change ion velocities in the interelectrode region while leads to ion acceleration in the free expanding plasma plume by a factor of about 2. Ion velocities of about 3.5 Multiplication-Sign 10{sup 4} m/s were detected for the magnetic field of about 300 mT at distance of about 100-200 mm from the cathode. It is proposed that plasma is accelerated due to Lorentz force. The average thrust is calculated using the ion velocity measurements and the cathode mass consumption rate, and its increase with the magnetic field is demonstrated.

  16. High pressure neon arc lamp

    DOE Patents [OSTI]

    Sze, Robert C.; Bigio, Irving J.

    2003-07-15

    A high pressure neon arc lamp and method of using the same for photodynamic therapies is provided. The high pressure neon arc lamp includes a housing that encloses a quantity of neon gas pressurized to about 500 Torr to about 22,000 Torr. At each end of the housing the lamp is connected by electrodes and wires to a pulse generator. The pulse generator generates an initial pulse voltage to breakdown the impedance of the neon gas. Then the pulse generator delivers a current through the neon gas to create an electrical arc that emits light having wavelengths from about 620 nanometers to about 645 nanometers. A method for activating a photosensitizer is provided. Initially, a photosensitizer is administered to a patient and allowed time to be absorbed into target cells. Then the high pressure neon arc lamp is used to illuminate the target cells with red light having wavelengths from about 620 nanometers to about 645 nanometers. The red light activates the photosensitizers to start a chain reaction that may involve oxygen free radicals to destroy the target cells. In this manner, a high pressure neon arc lamp that is inexpensive and efficiently generates red light useful in photodynamic therapy is provided.

  17. Planar controlled zone microwave plasma system

    DOE Patents [OSTI]

    Ripley, Edward B. (Knoxville, TN); Seals, Roland D. (Oak Ridge, TN); Morrell, Jonathan S. (Knoxvlle, TN)

    2011-10-04

    An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

  18. Industrial Application of Thin Films (TiAl)N Deposited on Thermo-Wells

    SciTech Connect (OSTI)

    Velez, G.; Jaramillo, S.; Arango, Y. C.; Devia, D.; Quintero, J.; Devia, A.

    2006-12-04

    The thermo-well is formed by two layers, one layer is a ceramic and the other layer is anviloy (comprised tungsten). They are used to coat the thermocouple in the control temperature system during the Aluminum-Silicon alloy melting process. After two weeks of continuous work at 750 deg. C of temperature (the alloy temperature), a high wear in this material is observed, affecting the ceramic. (TiAl)N thin films are deposited directly on the anviloy substrates by the PAPVD (Plasma Assisted Physics Vapor Deposition) in arc pulsed technique, using a TiAl target in a mono-vaporizer system, composed by a reactor and a power controlled system. Two opposite electrodes are placed into the reactor and discharge is produced by a controlled power system. The XRD (X-ray diffraction) patterns show the presence of the (TiAl)N thin film peaks. The morphological characteristics are studied by the scanning probe microscopy (SPM)

  19. Graphite electrode DC arc furnace. Innovative technology summary report

    SciTech Connect (OSTI)

    1999-05-01

    The Graphite Electrode DC Arc Furnace (DC Arc) is a high-temperature thermal process, which has been adapted from a commercial technology, for the treatment of mixed waste. A DC Arc Furnace heats waste to a temperature such that the waste is converted into a molten form that cools into a stable glassy and/or crystalline waste form. Hazardous organics are destroyed through combustion or pyrolysis during the process and the majority of the hazardous metals and radioactive components are incorporated in the molten phase. The DC Arc Furnace chamber temperature is approximately 593--704 C and melt temperatures are as high as 1,500 C. The DC Arc system has an air pollution control system (APCS) to remove particulate and volatiles from the offgas. The advantage of the DC Arc is that it is a single, high-temperature thermal process that minimizes the need for multiple treatment systems and for extensive sorting/segregating of large volumes of waste. The DC Arc has the potential to treat a wide range of wastes, minimize the need for sorting, reduce the final waste volumes, produce a leach resistant waste form, and destroy organic contaminants. Although the DC arc plasma furnace exhibits great promise for treating the types of mixed waste that are commonly present at many DOE sites, several data and technology deficiencies were identified by the Mixed Waste Focus Area (MWFA) regarding this thermal waste processing technique. The technology deficiencies that have been addressed by the current studies include: establishing the partitioning behavior of radionuclides, surrogates, and hazardous metals among the product streams (metal, slag, and offgas) as a function of operating parameters, including melt temperature, plenum atmosphere, organic loading, chloride concentration, and particle size; demonstrating the efficacy of waste product removal systems for slag and metal phases; determining component durability through test runs of extended duration, evaluating the effect of feed composition variations on process operating conditions and slag product performance; and collecting mass balance and operating data to support equipment and instrument design.

  20. Metal vapor arc ion plating

    DOE Patents [OSTI]

    Bertram, L.A.; Fisher, R.W.; Mattox, D.M.; Zanner, F.J.

    1986-09-09

    A method and apparatus for ion plating are described. The apparatus uses more negative than a first electrode voltage in a vacuum arc remelt system to attract low energy ions from the anode electrode to the article to be plated. 2 figs.

  1. Vacuum Arc Ion Sources: Recent Developments and Applications

    SciTech Connect (OSTI)

    Brown, Ian; Oks, Efim

    2005-05-01

    The vacuum arc ion source has evolved over the past twenty years into a standard laboratory tool for the production of high current beams of metal ions, and is now used in a number of different embodiments at many laboratories around the world. The primary application of this kind of source has evolved to be ion implantation for material surface modification. Another important use is for injection of high current beams of heavy metal ions into the front ends of particle accelerators, and much excellent work has been carried out in recent years in optimizing the source for reliable accelerator application. The source also provides a valuable tool for the investigation of the fundamental plasma physics of vacuum arc plasma discharges. As the use of the source has grown and diversified, at the same time the ion source performance and operational characteristics have been improved in a variety of different ways also. Here we review the growth and status of vacuum arc ion sources around the world, and summarize some of the applications for which the sources have been used.

  2. Gold nanoparticle formation in diamond-like carbon using two different methods: Gold ion implantation and co-deposition of gold and carbon

    SciTech Connect (OSTI)

    Salvadori, M. C.; Teixeira, F. S.; Araujo, W. W. R.; Sgubin, L. G.; Cattani, M.; Spirin, R. E.; Brown, I. G.

    2012-10-01

    We describe work in which gold nanoparticles were formed in diamond-like carbon (DLC), thereby generating a Au-DLC nanocomposite. A high-quality, hydrogen-free DLC thin film was formed by filtered vacuum arc plasma deposition, into which gold nanoparticles were introduced using two different methods. The first method was gold ion implantation into the DLC film at a number of decreasing ion energies, distributing the gold over a controllable depth range within the DLC. The second method was co-deposition of gold and carbon, using two separate vacuum arc plasma guns with suitably interleaved repetitive pulsing. Transmission electron microscope images show that the size of the gold nanoparticles obtained by ion implantation is 3-5 nm. For the Au-DLC composite obtained by co-deposition, there were two different nanoparticle sizes, most about 2 nm with some 6-7 nm. Raman spectroscopy indicates that the implanted sample contains a smaller fraction of sp{sup 3} bonding for the DLC, demonstrating that some sp{sup 3} bonds are destroyed by the gold implantation.

  3. Synthesis of few-walled carbon nanotube-Rh nanoparticles by arc discharge: Effect of selective oxidation

    SciTech Connect (OSTI)

    Zhang Yanfeng

    2012-06-15

    Highly crystalline rhodium (Rh) nanoparticles supported on carbon nanotubes were prepared by selective oxidation method. Carbon nanotubes and FeRh nanoparticles were simultaneously generated in hydrogen arc plasma. The as-grown nanomaterials can be purified by heat treatment in open air and by soaking in HCl. X-ray diffraction and selected area electron diffraction results reveal that as-grown FeRh nanoparticles have a typical chemical CsCl-type structure which can be transformed into a face-centered cubic structure by thermal annealing in the purification process. The purification process is selective toward the removal of the amorphous carbon coating the nanoparticles, and transforms Fe to Fe{sub 2}O{sub 3}. Fe{sub 2}O{sub 3} can be easily dissolved in hydrochloric acid, leaving carbon nanotubes-Rh nanoparticles. Rh nanoparticles with diameters of 2-60 nm are deposited uniformly on the surface of the carbon nanotube bundles. This simple and selective chemistry offers a new process for synthesizing and controlling Fe content in carbon nanotube-FeRh nanoparticles. Highlights: Black-Right-Pointing-Pointer High-crystallinity CNTs and FeRh nanoparticles were simultaneously generated in arc plasma. Black-Right-Pointing-Pointer The diameter distribution of CNTs depends on different gases. Black-Right-Pointing-Pointer Heat treatment in open air and soaking in HCl can convert CNTs-FeRh to CNTs-Rh. Black-Right-Pointing-Pointer The selective oxidation mechanisms of metal nanoparticles and carbon materials differ.

  4. Electrode assemblies, plasma apparatuses and systems including electrode assemblies, and methods for generating plasma

    DOE Patents [OSTI]

    Kong, Peter C; Grandy, Jon D; Detering, Brent A; Zuck, Larry D

    2013-09-17

    Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode.

  5. Quantitative characterization of arc discharge as vacuum interface

    SciTech Connect (OSTI)

    Huang, S.; Zhu, K.; Lu, Y. R.; Wang, S. Z.; Hershcovitch, A.; Yang, L.; Zhang, X. Y.

    2014-12-19

    An arc discharge with channel diameters of 3 mm and 6 mm and lengths between 30mm and 60mm was experimentally investigated for its potential to function as plasma window, i.e., interface vacuum regions of different pressures. In this study, electron temperature of the plasma channel measured spectroscopically varied in the range of 7000K to 15000K, increasing with discharge current while decreasing with gas flow rate. The plasma window had a slightly positive I-V characteristics over the whole range of investigated current 30A–70 A. Measurements of pressure separation capability, which were determined by input current, gas flow rate, discharge channel diameter, and length, were well explained by viscosity effect and “thermal-block” effect. The experimental results of global parameters including temperature, gas flow rate, and voltage had a good agreement with the simulation results calculated by an axis-symmetry Fluent-based magneto-hydrodynamic model.

  6. Characterization of arcs in frequency domain

    SciTech Connect (OSTI)

    D'Inca, R.; Siegl, G.; Faugel, H.; Braun, F.; Eckert, B.; Bobkov, V.; El Khaldi, M.; Noterdaeme, J.-M.

    2009-11-26

    Arc detection systems are developed for ICRH on ITER to prevent arcs from damaging the RF components. One of the detectors, the Sub-Harmonic Arc Detector (SHAD) is based on the detection of the frequencies emitted in the MHz range by arcs [R1]. To ensure the high level of reliability required for this safety system, it is necessary to demonstrate that these frequencies present a signal with a Signal to Noise Ratio high enough to be detected under the wide range of operational conditions (frequency, power, configuration) and for the different types of arcs that can appear in the feeding lines and on the antennas (vacuum arc, glow discharge, multipactor-induced discharge). For each type of arc, we analyze the evolution of the frequency spectrum relative to the evolution of other electrical parameters (reflected power, voltage)

  7. The effect of process parameters on Twin Wire Arc spray pattern shape

    SciTech Connect (OSTI)

    Hall, Aaron Christopher; McCloskey, James Francis; Horner, Allison Lynne

    2015-04-20

    A design of experiments approach was used to describe process parameter—spray pattern relationships in the Twin Wire Arc process using zinc feed stock in a TAFA 8835 (Praxair, Concord, NH, USA) spray torch. Specifically, the effects of arc current, primary atomizing gas pressure, and secondary atomizing gas pressure on spray pattern size, spray pattern flatness, spray pattern eccentricity, and coating deposition rate were investigated. Process relationships were investigated with the intent of maximizing or minimizing each coating property. It was determined that spray pattern area was most affected by primary gas pressure and secondary gas pressure. Pattern eccentricity was most affected by secondary gas pressure. Pattern flatness was most affected by primary gas pressure. Lastly, coating deposition rate was most affected by arc current.

  8. The effect of process parameters on Twin Wire Arc spray pattern shape

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Hall, Aaron Christopher; McCloskey, James Francis; Horner, Allison Lynne

    2015-04-20

    A design of experiments approach was used to describe process parameter—spray pattern relationships in the Twin Wire Arc process using zinc feed stock in a TAFA 8835 (Praxair, Concord, NH, USA) spray torch. Specifically, the effects of arc current, primary atomizing gas pressure, and secondary atomizing gas pressure on spray pattern size, spray pattern flatness, spray pattern eccentricity, and coating deposition rate were investigated. Process relationships were investigated with the intent of maximizing or minimizing each coating property. It was determined that spray pattern area was most affected by primary gas pressure and secondary gas pressure. Pattern eccentricity was mostmore » affected by secondary gas pressure. Pattern flatness was most affected by primary gas pressure. Lastly, coating deposition rate was most affected by arc current.« less

  9. MO-H-19A-02: Investigation of Modulated Electron Arc (MeArc) Therapy for the Treatment of Scalp Tumors

    SciTech Connect (OSTI)

    Eldib, A; Jin, L; Martin, J; Li, J; Chibani, O; Galloway, T; Ma, C

    2014-06-15

    Purpose: Electron arc therapy has long been proposed as the most suitable technique for the treatment of superficial tumors that follow circularly curved surfaces. However it was challenged by unsuitability of the conventional applicators and the lack of adequate 3-D dose calculation tools for arc electron beams in the treatment planning systems (TPS). Now with the availability of an electron specific multi-leaf collimator (eMLC) and an in-house Monte Carlo (MC) based TPS, we were motivated to investigate more advanced modulated electron arc (MeARC) therapy and its beneficial outcome. Methods: We initiated the study by a film measurement conducted in a head and neck phantom, where we delivered electron arcs in a step and shoot manner using the light field as a guide to avoid fields abutments. This step was done to insure enough clearance for the arcs with eMLC. MCBEAM and MCPLAN MC codes were used for the treatment head simulation and phantom dose calculation, respectively. Treatment plans were generated for targets drawn in real patient CTs and head and neck phantom. We utilized beams eye view available from a commercial planning system to create beamlets having same isocenter and adjoined at the scalp surface. Then dose-deposition coefficients from those beamlets were calculated for all electron energies using MCPLAN. An in-house optimization code was then used to find the optimum weights needed from individual beamlets. Results: MeARC showed a nicely tailored dose distribution around the circular curved target on the scalp. Some hot spots were noticed and could be attributed to fields abutment problem owing to the bulging nature of electron profiles. Brain dose was shown to be at lower levels compared to photon treatment. Conclusion: MeARC was shown to be a promising modality for treating scalp cases and could be beneficial to all superficial tumors with a circular curvature.

  10. ARC | National Nuclear Security Administration

    National Nuclear Security Administration (NNSA)

    | National Nuclear Security Administration Facebook Twitter Youtube Flickr RSS People Mission Managing the Stockpile Preventing Proliferation Powering the Nuclear Navy Emergency Response Recapitalizing Our Infrastructure Countering Nuclear Terrorism About Our Programs Our History Who We Are Our Leadership Our Locations Budget Our Operations Library Bios Congressional Testimony Fact Sheets Newsletters Press Releases Photo Gallery Jobs Apply for Our Jobs Our Jobs Working at NNSA Blog Home / ARC

  11. Schlieren technique applied to the arc temperature measurement in a high energy density cutting torch

    SciTech Connect (OSTI)

    Prevosto, L.; Mancinelli, B.; Artana, G.; Kelly, H.

    2010-01-15

    Plasma temperature and radial density profiles of the plasma species in a high energy density cutting arc have been obtained by using a quantitative schlieren technique. A Z-type two-mirror schlieren system was used in this research. Due to its great sensibility such technique allows measuring plasma composition and temperature from the arc axis to the surrounding medium by processing the gray-level contrast values of digital schlieren images recorded at the observation plane for a given position of a transverse knife located at the exit focal plane of the system. The technique has provided a good visualization of the plasma flow emerging from the nozzle and its interactions with the surrounding medium and the anode. The obtained temperature values are in good agreement with those values previously obtained by the authors on the same torch using Langmuir probes.

  12. Roughening and removal of surface contamination from beryllium using negative transferred-arc cleaning

    SciTech Connect (OSTI)

    Castro, R.G.; Hollis, K.J.; Elliott, K.E.

    1997-12-01

    Negative transferred-arc (TA) cleaning has been used extensively in the aerospace industry to clean and prepare surfaces prior to plasma spraying of thermal barrier coatings. This non-line of sight process can improve the bond strength of plasma sprayed coatings to the substrate material by cleaning and macroscopically roughening the surface. A variation of this cleaning methodology is also used in gas tungsten arc (GTA) welding to cathodically clean the surfaces of aluminum and magnesium prior to welding. Investigations are currently being performed to quantify the degree in which the negative transferred-arc process can clean and roughen metal surfaces. Preliminary information will be reported on the influence of processing conditions on roughening and the removal of carbon and other contaminates from the surface of beryllium. Optical, spectral and electrical methods to quantify cleaning of the surface will also be discussed. Applications for this technology include chemical-free precision cleaning of beryllium components.

  13. Study on a negative hydrogen ion source with hot cathode arc discharge

    SciTech Connect (OSTI)

    Lin, S. H. Fang, X.; University of Chinese Academy of Sciences, Beijing 100039 ; Zhang, H. J.; Qian, C.; Ma, B. H.; Wang, H.; Li, X. X.; Zhang, X. Z.; Sun, L. T.; Zhang, Z. M.; Yuan, P.; Zhao, H. W.

    2014-02-15

    A negative hydrogen (H{sup ?}) ion source with hot cathode arc discharge was designed and fabricated as a primary injector for a 10 MeV PET cyclotron at IMP. 1 mA dc H{sup ?} beam with ? {sub N,} {sub RMS} = 0.08 ??mm?mrad was extracted at 25 kV. Halbach hexapole was adopted to confine the plasma. The state of arc discharge, the parameters including filament current, arc current, gas pressure, plasma electrode bias, and the ratio of I{sub e{sup ?}}/I{sub H{sup ?}} were experimentally studied. The discussion on the result, and opinions to improve the source were given.

  14. Effect of postdeposition annealing on the electrical properties of ?-Ga{sub 2}O{sub 3} thin films grown on p-Si by plasma-enhanced atomic layer deposition

    SciTech Connect (OSTI)

    Altuntas, Halit; Donmez, Inci; Ozgit-Akgun, Cagla; Biyikli, Necmi

    2014-07-01

    Ga{sub 2}O{sub 3} dielectric thin films were deposited on (111)-oriented p-type silicon wafers by plasma-enhanced atomic layer deposition using trimethylgallium and oxygen plasma. Structural analysis of the Ga{sub 2}O{sub 3} thin films was carried out using grazing-incidence x-ray diffraction. As-deposited films were amorphous. Upon postdeposition annealing at 700, 800, and 900?°C for 30?min under N{sub 2} ambient, films crystallized into ?-form monoclinic structure. Electrical properties of the ?-Ga{sub 2}O{sub 3} thin films were then investigated by fabricating and characterizing Al/?-Ga{sub 2}O{sub 3}/p-Si metal–oxide-semiconductor capacitors. The effect of postdeposition annealing on the leakage current densities, leakage current conduction mechanisms, dielectric constants, flat-band voltages, reverse breakdown voltages, threshold voltages, and effective oxide charges of the capacitors were presented. The effective oxide charges (Q{sub eff}) were calculated from the capacitance–voltage (C-V) curves using the flat-band voltage shift and were found as 2.6?×?10{sup 12}, 1.9?×?10{sup 12}, and 2.5?×?10{sup 12} cm{sup ?2} for samples annealed at 700, 800, and 900?°C, respectively. Effective dielectric constants of the films decreased with increasing annealing temperature. This situation was attributed to the formation of an interfacial SiO{sub 2} layer during annealing process. Leakage mechanisms in the regions where current increases gradually with voltage were well fitted by the Schottky emission model for films annealed at 700 and 900?°C, and by the Frenkel–Poole emission model for film annealed at 800?°C. Leakage current density was found to improve with annealing temperature. ?-Ga{sub 2}O{sub 3} thin film annealed at 800?°C exhibited the highest reverse breakdown field value.

  15. A Summary of Recent Experimental Research on Ion Energy and Charge States of Pulsed Vacuum Arcs

    SciTech Connect (OSTI)

    Oks, Efim M.; Yushkov, Georgy Yu.; Anders, Andre

    2008-06-16

    The paper reviews the results of vacuum arc experimental investigations made collaboratively by research groups from Berkeley and Tomsk over the last two years, i.e. since the last ISDEIV in 2006. Vacuum arc plasma of various metals was produced in pulses of a few hundred microseconds duration, and the research focussed on three topics: (i) the energy distribution functions for different ion charge states, (ii) the temporal development of the ion charge state distribution, and (iii) the evolution of the mean directed ion velocities during plasma expansion. A combined quadruple mass-to-charge and energy ana-lyzer (EQP by HIDEN Ltd) and a time-of-flight spectrometer were employed. Cross-checking data by those complimen-tary techniques helped to avoid possible pitfalls in interpre-tation. It was found that the ion energy distribution func-tions in the plasma were independent of the ion charge state, which implies that the energy distribution on a substrate are not equal to due to acceleration in the substrate's sheath. In pulsed arc mode, the individual ion charge states fractions showed changes leading to a decrease of the mean charge state toward a steady-state value. This decrease can be re-duced by lower arc current, higher pulse repetition rate and reduced length of the discharge gap. It was also found that the directed ion velocity slightly decreased as the plasma expanded into vacuum.

  16. Apparatus for coating a surface with a metal utilizing a plasma source

    DOE Patents [OSTI]

    Brown, Ian G. (Berkeley, CA); MacGill, Robert A. (Richmond, CA); Galvin, James E. (Emeryville, CA)

    1991-01-01

    An apparatus and method for coating or layering a surface with a metal utilizing a metal vapor vacuum arc plasma source. The apparatus includes a trigger mechanism for actuating the metal vacuum vapor arc plasma source in a pulsed mode at a predetermined rate. The surface or substrate to be coated or layered is supported in position with the plasma source in a vacuum chamber. The surface is electrically biased for a selected period of time during the pulsed mode of operation of the plasma source. Both the pulsing of the metal vapor vacuum arc plasma source and the electrical biasing of the surface are synchronized for selected periods of time.

  17. An arc control and protection system for the JET lower hybrid antenna based on an imaging system

    SciTech Connect (OSTI)

    Figueiredo, J.

    2014-11-15

    Arcs are the potentially most dangerous events related to Lower Hybrid (LH) antenna operation. If left uncontrolled they can produce damage and cause plasma disruption by impurity influx. To address this issue an arc real time control and protection imaging system for the Joint European Torus (JET) LH antenna has been implemented. The LH system is one of the additional heating systems at JET. It comprises 24 microwave generators (klystrons, operating at 3.7 GHz) providing up to 5 MW of heating and current drive to the JET plasma. This is done through an antenna composed of an array of waveguides facing the plasma. The protection system presented here is based primarily on an imaging arc detection and real time control system. It has adapted the ITER like wall hotspot protection system using an identical CCD camera and real time image processing unit. A filter has been installed to avoid saturation and spurious system triggers caused by ionization light. The antenna is divided in 24 Regions Of Interest (ROIs) each one corresponding to one klystron. If an arc precursor is detected in a ROI, power is reduced locally with subsequent potential damage and plasma disruption avoided. The power is subsequently reinstated if, during a defined interval of time, arcing is confirmed not to be present by image analysis. This system was successfully commissioned during the restart phase and beginning of the 2013 scientific campaign. Since its installation and commissioning, arcs and related phenomena have been prevented. In this contribution we briefly describe the camera, image processing, and real time control systems. Most importantly, we demonstrate that an LH antenna arc protection system based on CCD camera imaging systems works. Examples of both controlled and uncontrolled LH arc events and their consequences are shown.

  18. Method for generating surface plasma

    DOE Patents [OSTI]

    Miller, Paul A. (Albuquerque, NM); Aragon, Ben P. (Albuquerque, NM)

    2003-05-27

    A method for generating a discharge plasma which covers a surface of a body in a gas at pressures from 0.01 Torr to atmospheric pressure, by applying a radio frequency power with frequencies between approximately 1 MHz and 10 GHz across a plurality of paired insulated conductors on the surface. At these frequencies, an arc-less, non-filamentary plasma can be generated to affect the drag characteristics of vehicles moving through the gas. The plasma can also be used as a source in plasma reactors for chemical reaction operations.

  19. Material-dependent high-frequency current fluctuations of cathodicvacuum arcs: Evidence for the ecton cutoff of the fractal model

    SciTech Connect (OSTI)

    Anders, Andre; Oks, Efim

    2005-12-22

    Current fluctuations of cathodic arcs were recorded withhigh analog bandwidth (up to 1 GHz) and fast digital sampling (up to 5Gsamples/sec). The power spectral density of the arc current wasdetermined by fast Fourier transform clearly showing material dependent,non-linear features in the frequency domain. These features can beassociated with the non-linear impedance of the conducting channelbetween cathode and anode, driven by the explosive nature of electronemission and plasma formation. The characteristic times of less than 100ns can be associated with individual explosive processes, "ectons," andtherefore represent the short-time physical cutoff for the fractal modelof cathodic arcs.

  20. Magnetic-cusp, cathodic-arc source

    DOE Patents [OSTI]

    Falabella, Steven (Livermore, CA)

    1995-01-01

    A magnetic-cusp for a cathodic-arc source wherein the arc is confined to the desired cathode surface, provides a current path for electrons from the cathode to the anode, and utilizes electric and magnetic fields to guide ions from the cathode to a point of use, such as substrates to be coated. The magnetic-cusp insures arc stability by an easy magnetic path from anode to cathode, while the straight-through arrangement leads to high ion transmission.

  1. Plasma spraying method for forming diamond and diamond-like coatings

    DOE Patents [OSTI]

    Holcombe, C.E.; Seals, R.D.; Price, R.E.

    1997-06-03

    A method and composition is disclosed for the deposition of a thick layer of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate. The softened or molten composition crystallizes on the substrate to form a thick deposition layer comprising at least a diamond or diamond-like material. The selected composition includes at least glassy carbon as a primary constituent and may include at least one secondary constituent. Preferably, the secondary constituents are selected from the group consisting of at least diamond powder, boron carbide (B{sub 4}C) powder and mixtures thereof. 9 figs.

  2. Plasma spraying method for forming diamond and diamond-like coatings

    DOE Patents [OSTI]

    Holcombe, Cressie E. (Farragut, TN); Seals, Roland D. (Oak Ridge, TN); Price, R. Eugene (Knoxville, TN)

    1997-01-01

    A method and composition for the deposition of a thick layer (10) of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition (12) including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate (20). The softened or molten composition (18) crystallizes on the substrate (20) to form a thick deposition layer (10) comprising at least a diamond or diamond-like material. The selected composition (12) includes at least glassy carbon as a primary constituent (14) and may include at least one secondary constituent (16). Preferably, the secondary constituents (16) are selected from the group consisting of at least diamond powder, boron carbide (B.sub.4 C) powder and mixtures thereof.

  3. Northeast Honshu Arc | Open Energy Information

    Open Energy Info (EERE)

    search GEOTHERMAL ENERGYGeothermal Home Northeast Honshu Arc Details Areas (5) Power Plants (8) Projects (0) Techniques (0) References Geothermal Region Data Country(ies) Japan...

  4. Metals purification by improved vacuum arc remelting

    DOE Patents [OSTI]

    Zanner, Frank J. (Sandia Park, NM); Williamson, Rodney L. (Albuquerque, NM); Smith, Mark F. (Albuquerque, NM)

    1994-12-13

    The invention relates to improved apparatuses and methods for remelting metal alloys in furnaces, particularly consumable electrode vacuum arc furnaces. Excited reactive gas is injected into a stationary furnace arc zone, thus accelerating the reduction reactions which purify the metal being melted. Additionally, a cooled condensation surface is disposed within the furnace to reduce the partial pressure of water in the furnace, which also fosters the reduction reactions which result in a purer produced ingot. Methods and means are provided for maintaining the stationary arc zone, thereby reducing the opportunity for contaminants evaporated from the arc zone to be reintroduced into the produced ingot.

  5. Three-dimensional model and simulation of vacuum arcs under axial magnetic fields

    SciTech Connect (OSTI)

    Wang Lijun; Jia Shenli; Zhou Xin; Wang Haijing; Shi Zongqian

    2012-01-15

    In this paper, a three-dimensional (3d) magneto-hydro-dynamic (MHD) model of axial magnetic field vacuum arcs (AMFVAs) is established. Based on this model, AMFVAs are simulated and analyzed. Three-dimensional spatial distributions of many important plasma parameters and electric characteristics in AMFVAs can be obtained, such as ion number density, ion temperature, electron temperature, plasma pressure, current densities along different directions (x, y, and z), ion velocities along different directions, electric fields strength along different directions, and so on. Simulation results show that there exist significant spiral-shaped rotational phenomena in the AMFVAs, this kind of rotational phenomenon also can be verified by the many related experiments (AMFVAs photographs, especially for stronger AMF strength). For current simulation results of AMFVAs, the maximal rotational velocity at anode side is about 1100 m/s. Radial electric field is increased from arc center to arc edge; axial electric field is decreased from cathode side to anode side. Radial electric field at arc edge can be larger than axial electric field. Azimuthal electric field in most regions is much smaller than radial and axial electric field, but it can reach about 1.19 kV/m. Radial magnetic field is the smallest one compared with other components, it reaches to maximum value at the position near to anode, it can influence arc characteristics.

  6. Optical emission from a small scale model electric arc furnace in 250-600 nm region

    SciTech Connect (OSTI)

    Maekinen, A.; Tikkala, H.; Aksela, H.; Niskanen, J.

    2013-04-15

    Optical emission spectroscopy has been for long proposed for monitoring and studying industrial steel making processes. Whereas the radiative decay of thermal excitations is always taking place in high temperatures needed in steel production, one of the most promising environment for such studies are electric arc furnaces, creating plasma in excited electronic states that relax with intense characteristic emission in the optical regime. Unfortunately, large industrial scale electric arc furnaces also present a challenging environment for optical emission studies and application of the method is not straightforward. To study the usability of optical emission spectroscopy in real electric arc furnaces, we have developed a laboratory scale DC electric arc furnace presented in this paper. With the setup, optical emission spectra of Fe, Cr, Cr{sub 2}O{sub 3}, Ni, SiO{sub 2}, Al{sub 2}O{sub 3}, CaO, and MgO were recorded in the wavelength range 250-600 nm and the results were analyzed with the help of reference data. The work demonstrates that using characteristic optical emission, obtaining in situ chemical information from oscillating plasma of electric arc furnaces is indeed possible. In spite of complications, the method could possibly be applied to industrial scale steel making process in order to improve its efficiency.

  7. Arc-Fault Detector Algorithm Evaluation Method Utilizing Prerecorded Arcing Signatures

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Arc-Fault Detector Algorithm Evaluation Method Utilizing Prerecorded Arcing Signatures Jay Johnson 1 and Jack Kang 2 1 Sandia National Laboratories, Albuquerque, NM, USA 2 Sensata Technologies, Attleboro, MA, USA ABSTRACT Abstract - The 2011 National Electrical Code® Article 690.11 requires photovoltaic systems on or penetrating a building to include a DC arc-fault protection device. In order to satisfy this requirement, new Arc-Fault Detectors (AFDs) are being developed by multiple

  8. Electrical and thermal finite element modeling of arc faults in photovoltaic bypass diodes.

    SciTech Connect (OSTI)

    Bower, Ward Isaac; Quintana, Michael A.; Johnson, Jay

    2012-01-01

    Arc faults in photovoltaic (PV) modules have caused multiple rooftop fires. The arc generates a high-temperature plasma that ignites surrounding materials and subsequently spreads the fire to the building structure. While there are many possible locations in PV systems and PV modules where arcs could initiate, bypass diodes have been suspected of triggering arc faults in some modules. In order to understand the electrical and thermal phenomena associated with these events, a finite element model of a busbar and diode was created. Thermoelectrical simulations found Joule and internal diode heating from normal operation would not normally cause bypass diode or solder failures. However, if corrosion increased the contact resistance in the solder connection between the busbar and the diode leads, enough voltage potentially would be established to arc across micron-scale electrode gaps. Lastly, an analytical arc radiation model based on observed data was employed to predicted polymer ignition times. The model predicted polymer materials in the adjacent area of the diode and junction box ignite in less than 0.1 seconds.

  9. BiFeO{sub 3}/La{sub 0.7}Sr{sub 0.3}MnO{sub 3} heterostructures deposited on spark plasma sintered LaAlO{sub 3} substrates

    SciTech Connect (OSTI)

    Pravarthana, D.; Lacotte, M.; David, A.; Prellier, W.; Trassin, M.; Haw Chu, Jiun; Ramesh, R.; Salvador, P. A.

    2014-02-24

    Multiferroic BiFeO{sub 3} (BFO)/La{sub 0.7}Sr{sub 0.3}MnO{sub 3} heterostructured thin films were grown by pulsed laser deposition on polished spark plasma sintered LaAlO{sub 3} (LAO) polycrystalline substrates. Both polycrystalline LAO substrates and BFO films were locally characterized using electron backscattering diffraction, which confirmed the high-quality local epitaxial growth on each substrate grain. Piezoforce microscopy was used to image and switch the piezo-domains, and the results are consistent with the relative orientation of the ferroelectric variants with the surface normal. This high-throughput synthesis process opens the routes towards wide survey of electronic properties as a function of crystalline orientation in complex oxide thin film synthesis.

  10. Plasma technology directory

    SciTech Connect (OSTI)

    Ward, P.P.; Dybwad, G.L.

    1995-03-01

    The Plasma Technology Directory has two main goals: (1) promote, coordinate, and share plasma technology experience and equipment within the Department of Energy; and (2) facilitate technology transfer to the commercial sector where appropriate. Personnel are averaged first by Laboratory and next by technology area. The technology areas are accelerators, cleaning and etching deposition, diagnostics, and modeling.

  11. Plasma jet ignition device

    DOE Patents [OSTI]

    McIlwain, Michael E.; Grant, Jonathan F.; Golenko, Zsolt; Wittstein, Alan D.

    1985-01-15

    An ignition device of the plasma jet type is disclosed. The device has a cylindrical cavity formed in insulating material with an electrode at one end. The other end of the cylindrical cavity is closed by a metal plate with a small orifice in the center which plate serves as a second electrode. An arc jumping between the first electrode and the orifice plate causes the formation of a highly-ionized plasma in the cavity which is ejected through the orifice into the engine cylinder area to ignite the main fuel mixture. Two improvements are disclosed to enhance the operation of the device and the length of the plasma plume. One improvement is a metal hydride ring which is inserted in the cavity next to the first electrode. During operation, the high temperature in the cavity and the highly excited nature of the plasma breaks down the metal hydride, liberating hydrogen which acts as an additional fuel to help plasma formation. A second improvement consists of a cavity insert containing a plurality of spaced, metal rings. The rings act as secondary spark gap electrodes reducing the voltage needed to maintain the initial arc in the cavity.

  12. Super-radiance in the sodium resonance lines from sodium iodide arc lamps

    SciTech Connect (OSTI)

    Karabourniotis, D.; Drakakis, E.

    2010-08-09

    Super-radiance observed within the centers of the sodium resonance D lines emitted by arc lamps containing sodium iodide as additive in a high-pressure mercury plasma environment was studied by high-resolution emission spectroscopy. The spectral radiance of these self-reversed lines including super-radiance was simulated by considering a local enhancement of the source function due to the presence of an additional source of radiation near the arc wall. Causes of this hitherto unrecognized source of radiation are given.

  13. COLLOQUIUM: Smaller & Sooner: The ARC Pilot Design for Fusion Development |

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Princeton Plasma Physics Lab November 4, 2014, 4:00pm to 6:30pm Colloquia MBG Auditorium COLLOQUIUM: Smaller & Sooner: The ARC Pilot Design for Fusion Development Professor Dennis Whyte Massachusetts Institute of Technology A new generation of superconducting (SC) tapes puts within reach loss-free magnetic fields with B > 20 Tesla on coil, doubling the field allowed by the present SC technology. The tapes can also provide demountable SC toroidal field coils. The ARC FNSF/Pilot design

  14. A Study Of Scale Deposition- An Analogue Of Meso- To Epithermal...

    Open Energy Info (EERE)

    Study Of Scale Deposition- An Analogue Of Meso- To Epithermal Ore Formation In The Volcano Of Milos, Aegean Arc, Greece Jump to: navigation, search OpenEI Reference LibraryAdd to...

  15. Boron nitride ablation studies in arc jet facilities (Conference...

    Office of Scientific and Technical Information (OSTI)

    Boron nitride ablation studies in arc jet facilities Citation Details In-Document Search Title: Boron nitride ablation studies in arc jet facilities You are accessing a document...

  16. Method of making dense, conformal, ultra-thin cap layers for nanoporous low-k ILD by plasma assisted atomic layer deposition

    DOE Patents [OSTI]

    Jiang, Ying-Bing (Albuquerque, NM); Cecchi, Joseph L. (Albuquerque, NM); Brinker, C. Jeffrey (Albuquerque, NM)

    2011-05-24

    Barrier layers and methods for forming barrier layers on a porous layer are provided. The methods can include chemically adsorbing a plurality of first molecules on a surface of the porous layer in a chamber and forming a first layer of the first molecules on the surface of the porous layer. A plasma can then be used to react a plurality of second molecules with the first layer of first molecules to form a first layer of a barrier layer. The barrier layers can seal the pores of the porous material, function as a diffusion barrier, be conformal, and/or have a negligible impact on the overall ILD k value of the porous material.

  17. Vapor deposition of thin films

    SciTech Connect (OSTI)

    Smith, D.C.; Pattillo, S.G.; Laia, J.R. Jr.; Sattelberger, A.P.

    1990-10-05

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl){sub 3}, iridium(allyl){sub 3}, molybdenum(allyl){sub 4}, tungsten(allyl){sub 4}, rhenium (allyl){sub 4}, platinum(allyl){sub 2}, or palladium(allyl){sub 2} are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  18. Vapor deposition of thin films

    DOE Patents [OSTI]

    Smith, David C. (Los Alamos, NM); Pattillo, Stevan G. (Los Alamos, NM); Laia, Jr., Joseph R. (Los Alamos, NM); Sattelberger, Alfred P. (Los Alamos, NM)

    1992-01-01

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  19. One-dimensional particle-in-cell simulation on the influence of electron and ion temperature on the sheath expansion process in the post-arc stage of vacuum circuit breaker

    SciTech Connect (OSTI)

    Mo, Yongpeng; Shi, Zongqian; Jia, Shenli; Wang, Lijun

    2015-02-15

    The inter-contact region of vacuum circuit breakers is filled with residual plasma at the moment when the current is zero after the burning of metal vapor arc. The residual plasma forms an ion sheath in front of the post-arc cathode. The sheath then expands towards the post-arc anode under the influence of a transient recovery voltage. In this study, a one-dimensional particle-in-cell model is developed to investigate the post-arc sheath expansion. The influence of ion and electron temperatures on the decrease in local plasma density at the post-arc cathode side and post-arc anode side is discussed. When the decay in the local plasma density develops from the cathode and anode sides into the high-density region and merges, the overall plasma density in the inter-contact region begins to decrease. Meanwhile, the ion sheath begins to expand faster. Furthermore, the theory of ion rarefaction wave only explains quantitatively the decrease in the overall plasma density at relatively low ion temperatures. With the increase of ion temperature to certain extent, another possible reason for the decrease in the overall plasma density is proposed and results from the more active thermal diffusion of plasma.

  20. Plasma source ion implantation research and applications at Los Alamos National Laboratory

    SciTech Connect (OSTI)

    Munson, C.P.; Faehl, R.J.; Henins, I.

    1996-12-31

    Plasma Source Ion Implantation research at Los Alamos Laboratory includes direct investigation of the plasma and materials science involved in target surface modification, numerical simulations of the implantation process, and supporting hardware engineering. Target materials of Al, Cr, Cu-Zn, Mg, Ni, Si, Ti, W, and various Fe alloys have been processed using plasmas produced from Ar, NH{sub 3}, N{sub 2}, CH{sub 4}, and C{sub 2}H{sub 2} gases. Individual targets with surface areas as large as {approximately}4 m{sup 2}, or weighing up to 1200 kg, have been treated in the large LANL facility. In collaboration with General Motors and the University of Wisconsin, a process has been developed for application of hard, low friction, diamond-like-carbon layers on assemblies of automotive pistons. Numerical simulations have been performed using a 2{1/2}-D particle- in-cell code, which yields time-dependent implantation energy, dose, and angle of arrival for ions at the target surface for realistic geometries. Plasma source development activities include the investigation of pulsed, inductively coupled sources capable of generating highly dissociated N{sup +} with ion densities n{sub i} {approximately} 10{sup 11}/cm{sup 3}, at {approximately}100 W average input power. Cathodic arc sources have also been used to produce filtered metallic and C plasmas for implantation and deposition either in vacuum, or in conjunction with a background gas for production of highly adherent ceramic coatings.

  1. Magnetic-cusp, cathodic-arc source

    DOE Patents [OSTI]

    Falabella, S.

    1995-11-21

    A magnetic-cusp for a cathodic-arc source wherein the arc is confined to the desired cathode surface, provides a current path for electrons from the cathode to the anode, and utilizes electric and magnetic fields to guide ions from the cathode to a point of use, such as substrates to be coated. The magnetic-cusp insures arc stability by an easy magnetic path from anode to cathode, while the straight-through arrangement leads to high ion transmission. 3 figs.

  2. Blue Arc Machining | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Superfast Machining for Superalloy Metals with Blue Arc(tm) Click to email this to a friend (Opens in new window) Share on Facebook (Opens in new window) Click to share (Opens in new window) Click to share on LinkedIn (Opens in new window) Click to share on Tumblr (Opens in new window) Superfast Machining for Superalloy Metals with Blue Arc(tm) In the race to make higher-quality metal parts faster and more efficiently, scientists and engineers at GE Global Research have developed Blue Arc(tm), a

  3. Princeton Plasma Physics Laboratory

    SciTech Connect (OSTI)

    Not Available

    1990-01-01

    This report discusses the following topics: principal parameters achieved in experimental devices fiscal year 1990; tokamak fusion test reactor; compact ignition tokamak; Princeton beta experiment- modification; current drive experiment-upgrade; international collaboration; x-ray laser studies; spacecraft glow experiment; plasma processing: deposition and etching of thin films; theoretical studies; tokamak modeling; international thermonuclear experimental reactor; engineering department; project planning and safety office; quality assurance and reliability; technology transfer; administrative operations; PPPL patent invention disclosures for fiscal year 1990; graduate education; plasma physics; graduate education: plasma science and technology; science education program; and Princeton Plasma Physics Laboratory reports fiscal year 1990.

  4. Structurally Integrated Coatings for Wear and Corrosion (SICWC): Arc Lamp, InfraRed (IR) Thermal Processing

    SciTech Connect (OSTI)

    Mackiewicz-Ludtka, G.; Sebright, J.

    2007-12-15

    The primary goal of this Cooperative Research and Development Agreement (CRADA) betwe1311 UT-Battelle (Contractor) and Caterpillar Inc. (Participant) was to develop the plasma arc lamp (PAL), infrared (IR) thermal processing technology 1.) to enhance surface coating performance by improving the interfacial bond strength between selected coatings and substrates; and 2.) to extend this technology base for transitioning of the arc lamp processing to the industrial Participant. Completion of the following three key technical tasks (described below) was necessary in order to accomplish this goal. First, thermophysical property data sets were successfully determined for composite coatings applied to 1010 steel substrates, with a more limited data set successfully measured for free-standing coatings. These data are necessary for the computer modeling simulations and parametric studies to; A.) simulate PAL IR processing, facilitating the development of the initial processing parameters; and B.) help develop a better understanding of the basic PAL IR fusing process fundamentals, including predicting the influence of melt pool stirring and heat tnmsfar characteristics introduced during plasma arc lamp infrared (IR) processing; Second, a methodology and a set of procedures were successfully developed and the plasma arc lamp (PAL) power profiles were successfully mapped as a function of PAL power level for the ORNL PAL. The latter data also are necessary input for the computer model to accurately simulate PAL processing during process modeling simulations, and to facilitate a better understand of the fusing process fundamentals. Third, several computer modeling codes have been evaluated as to their capabilities and accuracy in being able to capture and simulate convective mixing that may occur during PAL thermal processing. The results from these evaluation efforts are summarized in this report. The intention of this project was to extend the technology base and provide for transitioning of the arc lamp processing to the industrial Participant.

  5. Experimental test of whether electrostatically charged micro-organisms and their spores contribute to the onset of arcs across vacuum gaps

    SciTech Connect (OSTI)

    Grisham, L. R.; Halle, A. von; Carpe, A. F.; Gilton, K. R.; Rossi, Guy; Stevenson, T. N.

    2013-12-15

    Recently it was proposed [L. R. Grisham et al. Phys. Plasmas 19, 023107 (2012)] that one of the initiators of vacuum voltage breakdown between conducting electrodes might be micro-organisms and their spores, previously deposited during exposure to air, which then become electrostatically charged when an electric potential is applied across the vacuum gap. This note describes a simple experiment to compare the number of voltage-conditioning pulses required to reach the nominal maximum operating voltage across a gap between two metallic conductors in a vacuum, comparing cases in which biological cleaning was done just prior to pump-down with cases where this was not done, with each case preceded by exposure to ambient air for three days. Based upon these results, it does not appear that air-deposited microbes and their spores constitute a major pathway for arc initiation, at least for exposure periods of a few days, and for vacuum gaps of a few millimeters, in the regime where voltage holding is usually observed to vary linearly with gap distance.

  6. Experimental Test Of Whether Electrostatically Charged Micro-organisms And Their Spores Contribute To The Onset Of Arcs Across Vacuum Gaps

    SciTech Connect (OSTI)

    none,; Grisham, Larry R.

    2014-02-24

    Recently it was proposed [L.R. Grisham, A. vonHalle, A.F. Carpe, Guy Rossi, K.R. Gilton, E.D. McBride, E.P. Gilson, A. Stepanov, T.N. Stevenson, Physics of Plasma 19 023107 (2012)] that one of the initiators of vacuum voltage breakdown between condu cting electrodes might be micro-organisms and their spores, previously deposited during exposure to air, which tnen become electrostatically charged when an electric potential is applied across the vacuum gap. The note describes a simple experiment to compare the number of voltage-conditioning pulses required to reach the nominal maxium operating voltage across a gap between two metallic conductors in a vacuum, comparing cases in which biological cleaning was done just prior to pump-down with cases where this was not done, with each preceded by exposure to ambient air for three days. Based upon these results, it does not appear that air-deposited microbes and their spores constitute a major pathway for arc initiation, at least for exposure periods of a few days, and for vacuum gaps of a few millimeters, in the regime where voltage holding is usually observed to vary linearly with gap distance

  7. Motion characteristics of long ac arcs in atmospheric air

    SciTech Connect (OSTI)

    Gu Shanqiang; He Jinliang; Zeng Rong; Zhang Bo; Xu Guozheng; Chen Weijiang

    2007-01-29

    Experiments on the motion of long alternating current arcs in atmospheric air show that the anode and cathode arc roots have different motion characteristics because of different formation mechanisms. During a half cycle of the arc current, the anode arc root moves towards the direction of magnetic force and occasionally has a jumping motion, while the cathode arc root moves sufficiently slow to consider it stationary and hardly has any jump. The arc column has a complex shape and moves under the drive of the magnetic force and is also quickened by the lower arc root.

  8. Ion source with improved primary arc collimation

    DOE Patents [OSTI]

    Dagenhart, William K. (Oak Ridge, TN)

    1985-01-01

    An improved negative ion source is provided in which a self-biasing, molybdenum collimator is used to define the primary electron stream arc discharge from a filament operated at a negative potential. The collimator is located between the anode and the filament. It is electrically connected to the anode by means of an appropriate size resistor such that the collimator is biased at essentially the filament voltage during operation. Initially, the full arc voltage appears across the filament to collimator until the arc discharge strikes. Then the collimator biases itself to essentially filament potential due to current flow through the resistor thus defining the primary electron stream without intercepting any appreciable arc power. The collimator aperture is slightly smaller than the anode aperture to shield the anode from the arc power, thereby preventing the exposure of the anode to the full arc power which, in the past, has caused overheating and erosion of the anode collimator during extended time pulsed-beam operation of the source. With the self-biasing collimator of this invention, the ion source may be operated from short pulse periods to steady-state without destroying the anode.

  9. Vacuum vapor deposition gun assembly

    DOE Patents [OSTI]

    Zeren, Joseph D. (Boulder, CO)

    1985-01-01

    A vapor deposition gun assembly includes a hollow body having a cylindrical outer surface and an end plate for holding an adjustable heat sink, a hot hollow cathode gun, two magnets for steering the plasma from the gun into a crucible on the heat sink, and a shutter for selectively covering and uncovering the crucible.

  10. Quantum cascade laser investigations of CH{sub 4} and C{sub 2}H{sub 2} interconversion in hydrocarbon/H{sub 2} gas mixtures during microwave plasma enhanced chemical vapor deposition of diamond

    SciTech Connect (OSTI)

    Ma Jie; Cheesman, Andrew; Ashfold, Michael N. R.; Hay, Kenneth G.; Wright, Stephen; Langford, Nigel; Duxbury, Geoffrey; Mankelevich, Yuri A.

    2009-08-01

    CH{sub 4} and C{sub 2}H{sub 2} molecules (and their interconversion) in hydrocarbon/rare gas/H{sub 2} gas mixtures in a microwave reactor used for plasma enhanced diamond chemical vapor deposition (CVD) have been investigated by line-of-sight infrared absorption spectroscopy in the wavenumber range of 1276.5-1273.1 cm{sup -1} using a quantum cascade laser spectrometer. Parameters explored include process conditions [pressure, input power, source hydrocarbon, rare gas (Ar or Ne), input gas mixing ratio], height (z) above the substrate, and time (t) after addition of hydrocarbon to a pre-existing Ar/H{sub 2} plasma. The line integrated absorptions so obtained have been converted to species number densities by reference to the companion two-dimensional (r,z) modeling of the CVD reactor described in Mankelevich et al. [J. Appl. Phys. 104, 113304 (2008)]. The gas temperature distribution within the reactor ensures that the measured absorptions are dominated by CH{sub 4} and C{sub 2}H{sub 2} molecules in the cool periphery of the reactor. Nonetheless, the measurements prove to be of enormous value in testing, tensioning, and confirming the model predictions. Under standard process conditions, the study confirms that all hydrocarbon source gases investigated (methane, acetylene, ethane, propyne, propane, and butane) are converted into a mixture dominated by CH{sub 4} and C{sub 2}H{sub 2}. The interconversion between these two species is highly dependent on the local gas temperature and the H atom number density, and thus on position within the reactor. CH{sub 4}->C{sub 2}H{sub 2} conversion occurs most efficiently in an annular shell around the central plasma (characterized by 1400CH{sub 4} is favored in the more distant regions where T{sub gas}<1400 K. Analysis of the multistep interconversion mechanism reveals substantial net consumption of H atoms accompanying the CH{sub 4}->C{sub 2}H{sub 2} conversion, whereas the reverse C{sub 2}H{sub 2}->CH{sub 4} process only requires H atoms to drive the reactions; H atoms are not consumed by the overall conversion.

  11. Quantitative characterization of arc discharge as vacuum interface

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Huang, S.; Zhu, K.; Lu, Y. R.; Wang, S. Z.; Hershcovitch, A.; Yang, L.; Zhang, X. Y.

    2014-12-19

    An arc discharge with channel diameters of 3 mm and 6 mm and lengths between 30mm and 60mm was experimentally investigated for its potential to function as plasma window, i.e., interface vacuum regions of different pressures. In this study, electron temperature of the plasma channel measured spectroscopically varied in the range of 7000K to 15000K, increasing with discharge current while decreasing with gas flow rate. The plasma window had a slightly positive I-V characteristics over the whole range of investigated current 30A–70 A. Measurements of pressure separation capability, which were determined by input current, gas flow rate, discharge channel diameter,more » and length, were well explained by viscosity effect and “thermal-block” effect. The experimental results of global parameters including temperature, gas flow rate, and voltage had a good agreement with the simulation results calculated by an axis-symmetry Fluent-based magneto-hydrodynamic model.« less

  12. Process for depositing Cr-bearing layer

    DOE Patents [OSTI]

    Ellis, Timothy W. (Ames, IA); Lograsso, Thomas A. (Ames, IA); Eshelman, Mark A. (Kentwood, MI)

    1995-05-09

    A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate.

  13. Process for depositing Cr-bearing layer

    DOE Patents [OSTI]

    Ellis, T.W.; Lograsso, T.A.; Eshelman, M.A.

    1995-05-09

    A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate. 7 figs.

  14. On rapid plasma rotation

    SciTech Connect (OSTI)

    Helander, P.

    2007-10-15

    The conditions under which rapid plasma rotation may occur in a general three-dimensional magnetic field with flux surfaces, such as that of a stellarator, are investigated. Rotation velocities comparable to the ion thermal speed are found to be attainable only in magnetic fields whose strength B depends on the arc length l along the field in approximately the same way for all field lines on each flux surface {psi}, i.e., B{approx_equal}f({psi},l). Moreover, it is shown that the rotation must be in the direction of the vector {nabla}{psi}x{nabla}B.

  15. Method for cracking hydrocarbon compositions using a submerged reactive plasma system

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID)

    1997-01-01

    A method for cracking a liquid hydrocarbon composition (e.g. crude oil) to produce a cracked hydrocarbon product. A liquid hydrocarbon composition is initially provided. An electrical arc is generated directly within the hydrocarbon composition so that the arc is entirely submerged in the composition. Arc generation is preferably accomplished using a primary and secondary electrode each having a first end submerged in the composition. The first ends of the electrodes are separated from each other to form a gap therebetween. An electrical potential is then applied to the electrodes to generate the arc within the gap. A reactive gas is thereafter delivered to the arc which forms a bubble around the arc. Gas delivery may be accomplished by providing a passageway through each electrode and delivering the gas through the passageways. The arc and gas cooperate to produce a plasma which efficiently cracks the hydrocarbon composition.

  16. Method for cracking hydrocarbon compositions using a submerged reactive plasma system

    DOE Patents [OSTI]

    Kong, P.C.

    1997-05-06

    A method is described for cracking a liquid hydrocarbon composition (e.g. crude oil) to produce a cracked hydrocarbon product. A liquid hydrocarbon composition is initially provided. An electrical arc is generated directly within the hydrocarbon composition so that the arc is entirely submerged in the composition. Arc generation is preferably accomplished using a primary and secondary electrode each having a first end submerged in the composition. The first ends of the electrodes are separated from each other to form a gap there between. An electrical potential is then applied to the electrodes to generate the arc within the gap. A reactive gas is thereafter delivered to the arc which forms a bubble around the arc. Gas delivery may be accomplished by providing a passageway through each electrode and delivering the gas through the passageways. The arc and gas cooperate to produce a plasma which efficiently cracks the hydrocarbon composition. 6 figs.

  17. Ion source with improved primary arc collimation

    DOE Patents [OSTI]

    Dagenhart, W.K.

    1983-12-16

    An improved negative ion source is provided in which a self-biasing, molybdenum collimator is used to define the primary electron stream arc discharge from a filament operated at a negative potential. The collimator is located between the anode and the filament. It is electrically connected to the anode by means of an appropriate size resistor such that the collimator is biased at essentially the filament voltage during operation. Initially, the full arc voltage appears across the filament to collimator until the arc discharge strikes. Then the collimator biases itself to essentially filament potential due to current flow through the resistor thus defining the primary electron stream without intercepting any appreciable arc power. The collimator aperture is slightly smaller than the anode aperture to shield the anode from the arc power which, in the past, has caused overheating and erosion of the anode collimator during extended time pulsed-beam operation of the source. With the self-biasing collimator of this invention, the ion source may be operated from short pulse periods to steady-state without destroying the anode.

  18. On the formation and origin of substorm growth phase/onset auroral arcs inferred from conjugate space-ground observations

    SciTech Connect (OSTI)

    Motoba, T.; Ohtani, S.; Anderson, B. J.; Korth, H.; Mitchell, D.; Lanzerotti, L. J.; Shiokawa, K.; Connors, M.; Kletzing, C. A.; Reeves, G. D.

    2015-10-27

    In this study, magnetotail processes and structures related to substorm growth phase/onset auroral arcs remain poorly understood mostly due to the lack of adequate observations. In this study we make a comparison between ground-based optical measurements of the premidnight growth phase/onset arcs at subauroral latitudes and magnetically conjugate measurements made by the Active Magnetosphere and Planetary Electrodynamics Response Experiment (AMPERE) at ~780 km in altitude and by the Van Allen Probe B (RBSP-B) spacecraft crossing L values of ~5.0–5.6 in the premidnight inner tail region. The conjugate observations offer a unique opportunity to examine the detailed features of the arc location relative to large-scale Birkeland currents and of the magnetospheric counterpart. Our main findings include (1) at the early stage of the growth phase the quiet auroral arc emerged ~4.3° equatorward of the boundary between the downward Region 2 (R2) and upward Region 1 (R1) currents; (2) shortly before the auroral breakup (poleward auroral expansion) the latitudinal separation between the arc and the R1/R2 demarcation narrowed to ~1.0°; (3) RBSP-B observed a magnetic field signature of a local upward field-aligned current (FAC) connecting the arc with the near-Earth tail when the spacecraft footprint was very close to the arc; and (4) the upward FAC signature was located on the tailward side of a local plasma pressure increase confined near L ~5.2–5.4. These findings strongly suggest that the premidnight arc is connected to highly localized pressure gradients embedded in the near-tail R2 source region via the local upward FAC.

  19. Ion source based on the cathodic arc

    DOE Patents [OSTI]

    Sanders, D.M.; Falabella, S.

    1994-02-01

    A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated, is described. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles. 3 figures.

  20. Ion source based on the cathodic arc

    DOE Patents [OSTI]

    Sanders, David M. (Livermore, CA); Falabella, Steven (Livermore, CA)

    1994-01-01

    A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles.

  1. Modular hybrid plasma reactor and related systems and methods

    DOE Patents [OSTI]

    Kong, Peter C.; Grandy, Jon D.; Detering, Brent A.

    2010-06-22

    A device, method and system for generating a plasma is disclosed wherein an electrical arc is established and the movement of the electrical arc is selectively controlled. In one example, modular units are coupled to one another to collectively define a chamber. Each modular unit may include an electrode and a cathode spaced apart and configured to generate an arc therebetween. A device, such as a magnetic or electromagnetic device, may be used to selectively control the movement of the arc about a longitudinal axis of the chamber. The arcs of individual modules may be individually controlled so as to exhibit similar or dissimilar motions about the longitudinal axis of the chamber. In another embodiment, an inlet structure may be used to selectively define the flow path of matter introduced into the chamber such that it travels in a substantially circular or helical path within the chamber.

  2. Atmospheric Pressure Plasma Process And Applications

    SciTech Connect (OSTI)

    Peter C. Kong; Myrtle

    2006-09-01

    This paper provides a general discussion of atmospheric-pressure plasma generation, processes, and applications. There are two distinct categories of atmospheric-pressure plasmas: thermal and nonthermal. Thermal atmospheric-pressure plasmas include those produced in high intensity arcs, plasma torches, or in high intensity, high frequency discharges. Although nonthermal plasmas are at room temperatures, they are extremely effective in producing activated species, e.g., free radicals and excited state atoms. Thus, both thermal and nonthermal atmosphericpressure plasmas are finding applications in a wide variety of industrial processes, e.g. waste destruction, material recovery, extractive metallurgy, powder synthesis, and energy conversion. A brief discussion of recent plasma technology research and development activities at the Idaho National Laboratory is included.

  3. American Ref Fuel Corporation ARC | Open Energy Information

    Open Energy Info (EERE)

    Ref Fuel Corporation ARC Jump to: navigation, search Name: American Ref-Fuel Corporation (ARC) Place: Montvale, NJ, New Jersey Zip: 76450 Product: Focused on waste-to-energy...

  4. Arc-Fault Detector Algorithm Evaluation Method Utilizing Prerecorded...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Index Terms - photovoltaic systems, arc-fault detection, series arc-faults, monitoring, power system safety I. INTRODUCTION In order to improve fire safety in PV systems, the 2011...

  5. Plasma effect on weld pool surface reconstruction by shape-from-polarization analysis

    SciTech Connect (OSTI)

    Coniglio, N.; Mathieu, A.

    2014-03-31

    The polarimetric state of the thermal radiations emitted by the weld metal contains geometric information about the emitting surface. Even though the analysed thermal radiation has a wavelength corresponding to a blind spectral window of the arc plasma, the physical presence of the arc plasma itself interferes with the rays radiated by the weld pool surface before attaining the polarimeter, thus modifying the geometric information transported by the ray. In the present work, the effect of the arc plasma-surrounding zone on the polarimetric state and propagation direction of the radiated ray is analyzed. The interaction with the arc plasma zone induces a drop in ray intensity and a refraction of ray optical path.

  6. Pairing, pseudogap and Fermi arcs in cuprates

    SciTech Connect (OSTI)

    Kaminski, Adam; Kondo, Takeshi; Takeuchi, Tsunehiro; Gu, Genda

    2014-04-29

    We use Angle Resolved Photoemission Spectroscopy (ARPES) to study the relationship between the pseudogap, pairing and Fermi arcs in cuprates. High quality data measured over a wide range of dopings reveals a consistent picture of Fermiology and pairing in these materials. The pseudogap is due to an ordered state that competes with superconductivity rather than preformed pairs. Pairing does occur below Tpair ~ 150K and significantly above Tc, but well below T* and the doping dependence of this temperature scale is distinct from that of the pseudogap. The d-wave gap is present below Tpair, and its interplay with strong scattering creates “artificial” Fermi arcs for Tc ? T ? Tpair. However, above Tpair, the pseudogap exists only at the antipodal region. This leads to presence of real, gapless Fermi arcs close to the node. The length of these arcs remains constant up to T*, where the full Fermi surface is recovered. As a result, we demonstrate that these findings resolve a number of seemingly contradictory scenarios.

  7. Pairing, pseudogap and Fermi arcs in cuprates

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Kaminski, Adam; Kondo, Takeshi; Takeuchi, Tsunehiro; Gu, Genda

    2014-04-29

    We use Angle Resolved Photoemission Spectroscopy (ARPES) to study the relationship between the pseudogap, pairing and Fermi arcs in cuprates. High quality data measured over a wide range of dopings reveals a consistent picture of Fermiology and pairing in these materials. The pseudogap is due to an ordered state that competes with superconductivity rather than preformed pairs. Pairing does occur below Tpair ~ 150K and significantly above Tc, but well below T* and the doping dependence of this temperature scale is distinct from that of the pseudogap. The d-wave gap is present below Tpair, and its interplay with strong scatteringmore » creates “artificial” Fermi arcs for Tc ≤ T ≤ Tpair. However, above Tpair, the pseudogap exists only at the antipodal region. This leads to presence of real, gapless Fermi arcs close to the node. The length of these arcs remains constant up to T*, where the full Fermi surface is recovered. As a result, we demonstrate that these findings resolve a number of seemingly contradictory scenarios.« less

  8. Gas tungsten arc welder with electrode grinder

    DOE Patents [OSTI]

    Christiansen, David W. (Kennewick, WA); Brown, William F. (West Richland, WA)

    1984-01-01

    A welder for automated closure of fuel pins by a gas tungsten arc process in which a rotating length of cladding is positioned adjacent a welding electrode in a sealed enclosure. An independently movable axial grinder is provided in the enclosure for refurbishing the used electrode between welds.

  9. NETL Issues Licenses for its Arc Position Sensing Technology | Department

    Office of Environmental Management (EM)

    of Energy Issues Licenses for its Arc Position Sensing Technology NETL Issues Licenses for its Arc Position Sensing Technology May 27, 2015 - 8:57am Addthis NETL Issues Licenses for its Arc Position Sensing Technology The U.S. Department of Energy's National Energy Technology Laboratory (NETL) has issued two licenses involving its Arc Position Sensing (APS) technology to KW Associates LLC, an Oregon-based company founded by the technology's inventors. APS technology is a patented,

  10. Theory of the arc discharge in air blast breakers

    SciTech Connect (OSTI)

    Vogel, H.F.

    1980-08-01

    The complete set of equations obtaining in the arc's length element are given. The arc length is determined when the external circuit equations are closed by an expression for the arc inductance as a function of the radius and length, in addition to our relationships for the radius and voltage gradients.

  11. Numerical investigation of the double-arcing phenomenon in a cutting arc torch

    SciTech Connect (OSTI)

    Mancinelli, B. R.; Minotti, F. O.; Kelly, H.; Prevosto, L.

    2014-07-14

    A numerical investigation of the double-arcing phenomenon in a cutting arc torch is reported. The dynamics of the double-arcing were simulated by using a two-dimensional model of the gas breakdown development in the space-charge layer contiguous to the nozzle of a cutting arc torch operated with oxygen. The kinetic scheme includes ionization of heavy particles by electron impact, electron attachment, electron detachment, electron–ion recombination, and ion–ion recombination. Complementary measurements during double-arcing phenomena were also conducted. A marked rise of the nozzle voltage was found. The numerical results showed that the dynamics of a cathode spot at the exit of the nozzle inner surface play a key role in the raising of the nozzle voltage, which in turn allows more electrons to return to the wall at the nozzle inlet. The return flow of electrons thus closes the current loop of the double-arcing. The increase in the (floating) nozzle voltage is due to the fact that the increased electron emission at the spot is mainly compensated by the displacement current (the ions do not play a relevant role due to its low-mobility) until that the stationary state is achieved and the electron return flow fully-compensates the electron emission at the spot. A fairly good agreement was found between the model and the experiment for a spot emission current growth rate of the order of 7?×?10{sup 4}?A/s.

  12. Fuel injector utilizing non-thermal plasma activation

    DOE Patents [OSTI]

    Coates, Don M. (Santa Fe, NM); Rosocha, Louis A. (Los Alamos, NM)

    2009-12-01

    A non-thermal plasma assisted combustion fuel injector that uses an inner and outer electrode to create an electric field from a high voltage power supply. A dielectric material is operatively disposed between the two electrodes to prevent arcing and to promote the formation of a non-thermal plasma. A fuel injector, which converts a liquid fuel into a dispersed mist, vapor, or aerosolized fuel, injects into the non-thermal plasma generating energetic electrons and other highly reactive chemical species.

  13. On the formation and origin of substorm growth phase/onset auroral arcs inferred from conjugate space-ground observations

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Motoba, T.; Ohtani, S.; Anderson, B. J.; Korth, H.; Mitchell, D.; Lanzerotti, L. J.; Shiokawa, K.; Connors, M.; Kletzing, C. A.; Reeves, G. D.

    2015-10-27

    In this study, magnetotail processes and structures related to substorm growth phase/onset auroral arcs remain poorly understood mostly due to the lack of adequate observations. In this study we make a comparison between ground-based optical measurements of the premidnight growth phase/onset arcs at subauroral latitudes and magnetically conjugate measurements made by the Active Magnetosphere and Planetary Electrodynamics Response Experiment (AMPERE) at ~780 km in altitude and by the Van Allen Probe B (RBSP-B) spacecraft crossing L values of ~5.0–5.6 in the premidnight inner tail region. The conjugate observations offer a unique opportunity to examine the detailed features of the arcmore » location relative to large-scale Birkeland currents and of the magnetospheric counterpart. Our main findings include (1) at the early stage of the growth phase the quiet auroral arc emerged ~4.3° equatorward of the boundary between the downward Region 2 (R2) and upward Region 1 (R1) currents; (2) shortly before the auroral breakup (poleward auroral expansion) the latitudinal separation between the arc and the R1/R2 demarcation narrowed to ~1.0°; (3) RBSP-B observed a magnetic field signature of a local upward field-aligned current (FAC) connecting the arc with the near-Earth tail when the spacecraft footprint was very close to the arc; and (4) the upward FAC signature was located on the tailward side of a local plasma pressure increase confined near L ~5.2–5.4. These findings strongly suggest that the premidnight arc is connected to highly localized pressure gradients embedded in the near-tail R2 source region via the local upward FAC.« less

  14. Functionalization of Hydrogen-free Diamond-like Carbon Films using Open-air Dielectric Barrier Discharge Atmospheric Plasma Treatments

    SciTech Connect (OSTI)

    Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA; Instituto de Materiales de Madrid, C.S.I.C., Cantoblanco, 28049 Madrid, Spain; Instituto de Quimica-Fisica"Rocasolano"C.S.I.C., 28006 Madrid, Spain; Mahasarakham University, Mahasarakham 44150, Thailand; CASTI, CNR-INFM Regional Laboratory, L'Aquila 67100, Italy; SUNY Upstate Medical University, Syracuse, NY 13210, USA; Endrino, Jose; Endrino, J. L.; Marco, J. F.; Poolcharuansin, P.; Phani, A.R.; Allen, M.; Albella, J. M.; Anders, A.

    2007-12-28

    A dielectric barrier discharge (DBD) technique has been employed to produce uniform atmospheric plasmas of He and N2 gas mixtures in open air in order to functionalize the surface of filtered-arc deposited hydrogen-free diamond-like carbon (DLC) films. XPS measurements were carried out on both untreated and He/N2 DBD plasma treated DLC surfaces. Chemical states of the C 1s and N 1s peaks were collected and used to characterize the surface bonds. Contact angle measurements were also used to record the short- and long-term variations in wettability of treated and untreated DLC. In addition, cell viability tests were performed to determine the influence of various He/N2 atmospheric plasma treatments on the attachment of osteoblast MC3T3 cells. Current evidence shows the feasibility of atmospheric plasmas in producing long-lasting variations in the surface bonding and surface energy of hydrogen-free DLC and consequently the potential for this technique in the functionalization of DLC coated devices.

  15. Electrical Safety and Arc Flash Protections

    SciTech Connect (OSTI)

    R. Camp

    2008-03-04

    Over the past four years, the Electrical Safety Program at PPPL has evolved in addressing changing regulatory requirements and lessons learned from accident events, particularly in regards to arc flash hazards and implementing NFPA 70E requirements. This presentation will discuss PPPL's approaches to the areas of electrical hazards evaluation, both shock and arc flash; engineered solutions for hazards mitigation such as remote racking of medium voltage breakers, operational changes for hazards avoidance, targeted personnel training and hazard appropriate personal protective equipment. Practical solutions for nominal voltage identification and zero voltage checks for lockout/tagout will also be covered. Finally, we will review the value of a comprehensive electrical drawing program, employee attitudes expressed as a personal safety work ethic, integrated safety management, and sustained management support for continuous safety improvement.

  16. Arc Casting Intermetallic Alloy (Materials Preparation Center)

    SciTech Connect (OSTI)

    2010-01-01

    Arc casting of intermetallic (La-Ni-Sn) AB5 alloy used for metal hydride hydrogen storage. Upon solidification the Sn is partially rejected and increases in concentration in the remaining liquid. Upon completing solidification there is a great deal of internal stress in the ingot. As the ingot cools further the stress is relieved. This material was cast at the Ames Laboratorys Materials Preparation Center http://www.mpc.ameslab.gov

  17. Ion charge state fluctuations in vacuum arcs

    SciTech Connect (OSTI)

    Anders, Andre; Fukuda, Kentaro; Yushkov, Georgy Yu

    2004-12-14

    Ion charge state distributions of cathodic vacuum arcs have been investigated using a modified time-of-flight method. Experiments have been done in double gate and burst gate mode, allowing us to study both systematic and stochastic changes of ion charge state distributions with a time resolution down to 100 ns. In the double gate method, two ion charge spectra are recorded with a well-defined time between measurements. The elements Mg, Bi, and Cu were selected for tests, representing metals of very different properties. For all elements it was found that large stochastic changes occur even at the limit of resolution. This is in agreement with fast changing arc properties observed elsewhere. Correlation of results for short times between measurements was found but it is argued that this is due to velocity mixing rather than due to cathode processes. The burst mode of time-of-flight measurements revealed the systematic time evolution of ion charge states within a single arc discharge, as opposed to previous measurements that relied on data averaged over many pulses. The technique shows the decay of the mean ion charge state as well as the level of material-dependent fluctuations.

  18. Method for depositing high-quality microcrystalline semiconductor materials

    DOE Patents [OSTI]

    Guha, Subhendu (Bloomfield Hills, MI); Yang, Chi C. (Troy, MI); Yan, Baojie (Rochester Hills, MI)

    2011-03-08

    A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

  19. Method for depositing layers of high quality semiconductor material

    DOE Patents [OSTI]

    Guha, Subhendu (Troy, MI); Yang, Chi C. (Troy, MI)

    2001-08-14

    Plasma deposition of substantially amorphous semiconductor materials is carried out under a set of deposition parameters which are selected so that the process operates near the amorphous/microcrystalline threshold. This threshold varies as a function of the thickness of the depositing semiconductor layer; and, deposition parameters, such as diluent gas concentrations, must be adjusted as a function of layer thickness. Also, this threshold varies as a function of the composition of the depositing layer, and in those instances where the layer composition is profiled throughout its thickness, deposition parameters must be adjusted accordingly so as to maintain the amorphous/microcrystalline threshold.

  20. Extreme hydrogen plasma densities achieved in a linear plasma generator

    SciTech Connect (OSTI)

    Rooij, G. J. van; Veremiyenko, V. P.; Goedheer, W. J.; de Groot, B.; Kleyn, A. W.; Smeets, P. H. M.; Versloot, T. W.; Whyte, D. G.; Engeln, R.; Schram, D. C.; Cardozo, N. J. Lopes

    2007-03-19

    A magnetized hydrogen plasma beam was generated with a cascaded arc, expanding in a vacuum vessel at an axial magnetic field of up to 1.6 T. Its characteristics were measured at a distance of 4 cm from the nozzle: up to a 2 cm beam diameter, 7.5x10{sup 20} m{sup -3} electron density, {approx}2 eV electron and ion temperatures, and 3.5 km/s axial plasma velocity. This gives a 2.6x10{sup 24} H{sup +} m{sup -2} s{sup -1} peak ion flux density, which is unprecedented in linear plasma generators. The high efficiency of the source is obtained by the combined action of the magnetic field and an optimized nozzle geometry. This is interpreted as a cross-field return current that leads to power dissipation in the beam just outside the source.

  1. Energy deposition in STARFIRE reactor components

    SciTech Connect (OSTI)

    Gohar, Y.; Brooks, J.N.

    1985-04-01

    The energy deposition in the STARFIRE commercial tokamak reactor was calculated based on detailed models for the different reactor components. The heat deposition and the 14 MeV neutron flux poloidal distributions in the first wall were obtained. The poloidal surface heat load distribution in the first wall was calculated from the plasma radiation. The Monte Carlo method was used for the calculation to allow an accurate modeling for the reactor geometry.

  2. Atmospheric-pressure plasma jet

    DOE Patents [OSTI]

    Selwyn, Gary S. (Los Alamos, NM)

    1999-01-01

    Atmospheric-pressure plasma jet. A .gamma.-mode, resonant-cavity plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250.degree. C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two concentric cylindrical electrodes are employed to generate a plasma in the annular region therebetween. A "jet" of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly shaping the rf-powered electrode. Because of the atmospheric pressure operation, no ions survive for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike low-pressure plasma sources and conventional plasma processing methods.

  3. Apparatus for coating a surface with a metal utilizing a plasma source

    DOE Patents [OSTI]

    Brown, I.G.; MacGill, R.A.; Galvin, J.E.

    1991-05-07

    An apparatus and method are disclosed for coating or layering a surface with a metal utilizing a metal vapor vacuum arc plasma source. The apparatus includes a trigger mechanism for actuating the metal vacuum vapor arc plasma source in a pulsed mode at a predetermined rate. The surface or substrate to be coated or layered is supported in position with the plasma source in a vacuum chamber. The surface is electrically biased for a selected period of time during the pulsed mode of operation of the plasma source. Both the pulsing of the metal vapor vacuum arc plasma source and the electrical biasing of the surface are synchronized for selected periods of time. 10 figures.

  4. Monitoring of Optical Emission from High Temperature Plasma Based on Chromatic Modulation

    SciTech Connect (OSTI)

    Dimitrios, Tomtsis

    2009-08-13

    An integrated experimental approach is presented for processing the optical emission produced from electric arc plasma. The method is based on chromatic modulation techniques to provide a holistic measurement of the persistence of particle decays within the environment of high power circuit breakers. Chromaticity changes in a number of chromatic parameters are related to changes in physical electric arc plasma environment (e.g. particle concentration). The results are in the form of chromatic maps which show how the overall electric arc plasma and its environment behave and respond. Such maps show the totality of information which can be accessed about the arcing event and the level of monitoring discrimination which is achievable with the chromatic methodology in a simple and easy to understand manner. The suggested method provides easier data analysis and high levels of data compression.

  5. Tectonosedimentary evolution of the Crotone basin, Italy: Implications for Calabrian Arc geodynamics

    SciTech Connect (OSTI)

    Smale, J.L. ); Rio, D. ); Thunell, R.C. )

    1990-05-01

    Analysis of outcrop, well, and offshore seismic data has allowed the Neogene tectonosedimentary evolution of an Ionian Sea satellite basin to be outlined. The Crotone basin contains a series of postorogenic sediments deposited since Serravallian time atop a complex nappe system emplaced in the early Miocene. The basin's evolution can be considered predominantly one of distension in a fore-arc setting punctuated by compressional events. The earliest sediments (middle-late Miocene) consist of conglomerates, marls, and evaporites infilling a rapidly subsiding basin. A basin-wide Messinian unconformity and associated intraformational folding mark the close of this sedimentary cycle. Reestablishment of marine conditions in the early Pliocene is documented by sediments which show a distinct color banding and apparent rhythmicity, which may represent the basin margin to lowermost Pliocene marl/limestone rhythmic couplets present in southern Calabria. A bounding unconformity surface of middle Pliocene age (3.0 Ma), which corresponds to a major northwest-southeast compressional event, closes this depositional sequence. The basin depocenter shifted markedly toward the southeast, and both chaotic and strong subparallel reflector seismic facies of wide-ranging thicknesses fill the depositional topography created during this tectonic episode. Basin subsidence decreases dramatically in the late Pliocene and cessates in response to basin margin uplift in the early Pleistocene. The chronostratigraphic hierarchy of these depositional sequences allows them to constrain the deformational history of the basin. In addition, similar depositional hierarchies in adjacent basins (i.e., Paola, Cefalu, and Tyrrhenian Sea) allow them to tie the stratigraphy and evolution of the Crotone basin to the geodynamic evolution of the Calabrian arc system.

  6. Plasma Physics

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    4 Plasma Physics By leveraging plasma under extreme conditions, we concentrate on solving ... smuggled nuclear materials, advancing weapons physics and generating fusion energy. ...

  7. Plasma shield for in-air beam processes

    SciTech Connect (OSTI)

    Hershcovitch, Ady

    2008-05-15

    A novel concept/apparatus, the Plasma Shield, is introduced in this paper. The purpose of the Plasma Shield is designed to shield a target object chemically and thermally by engulfing an area subjected to beam treatment with inert plasma. The shield consists of a vortex-stabilized arc that is employed to shield beams and workpiece area of interaction from an atmospheric or liquid environment. A vortex-stabilized arc is established between a beam generating device (laser, ion or electron gun) and a target object. The arc, which is composed of a pure noble gas, engulfs the interaction region and shields it from any surrounding liquids like water or reactive gases. The vortex is composed of a sacrificial gas or liquid that swirls around and stabilizes the arc. The successful Plasma Shield was experimentally established and very high-quality electron beam welding with partial plasma shielding was performed. The principle of the operation and experimental results are discussed in the paper.

  8. Rapid mapping tool : an ArcMap extension /

    SciTech Connect (OSTI)

    Linger, S. P.; Rich, P. M.; Walther, D.; Witkowski, M. S.; Jones, M. A.; Khalsa, H. S.

    2002-01-01

    Cartographic production laboratories produce large volumes of maps for diverse customers. Turnaround time and consistency are key concerns. The Rapid Mapping Tool is an ArcMap based tool that enables rapid creation of maps to meet customer needs. This tool was constructed using VB/VBA, ArcObjects, and ArcGIS templates. The core capability of ArcMap is extended for custom map production by storing specifications associated with a map or template in a companion XML document. These specifications include settings and preferences used to create custom maps. The tool was developed as a component of an enterprise GIS, which enables spatial data management and delivery using ArcSDE, ArcIMS, Oracle, and a web-based request tracking system.

  9. Method for controlling gas metal arc welding

    DOE Patents [OSTI]

    Smartt, H.B.; Einerson, C.J.; Watkins, A.D.

    1987-08-10

    The heat input and mass input in a Gas Metal Arc welding process are controlled by a method that comprises calculating appropriate values for weld speed, filler wire feed rate and an expected value for the welding current by algorithmic function means, applying such values for weld speed and filler wire feed rate to the welding process, measuring the welding current, comparing the measured current to the calculated current, using said comparison to calculate corrections for the weld speed and filler wire feed rate, and applying corrections. 3 figs., 1 tab.

  10. Method for controlling gas metal arc welding

    DOE Patents [OSTI]

    Smartt, Herschel B. (Idaho Falls, ID); Einerson, Carolyn J. (Idaho Falls, ID); Watkins, Arthur D. (Idaho Falls, ID)

    1989-01-01

    The heat input and mass input in a Gas Metal Arc welding process are controlled by a method that comprises calculating appropriate values for weld speed, filler wire feed rate and an expected value for the welding current by algorithmic function means, applying such values for weld speed and filler wire feed rate to the welding process, measuring the welding current, comparing the measured current to the calculated current, using said comparison to calculate corrections for the weld speed and filler wire feed rate, and applying corrections.

  11. Toughened Graphite Electrode for High Heat Electric Arc Furnaces...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Find More Like This Return to Search Toughened Graphite Electrode for High Heat Electric Arc Furnaces Oak Ridge National Laboratory Contact ORNL About This Technology Technology...

  12. Advanced RenewableEnergy Company ARC Energy | Open Energy Information

    Open Energy Info (EERE)

    (ARC Energy) Place: Nashua, New Hampshire Product: New Hampshire-based stealth mode LED substrate manufacture equipment provider which aims to lower the cost of LEDs....

  13. Nitrogen Control in Electric Arc Furnace Steelmaking by Direct...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    by Direct Reduced Iron Fines Injection Nitrogen Control in Electric Arc Furnace Steelmaking by Direct Reduced Iron Fines Injection This fact sheet describes a new ...

  14. ARCS - Access Rate Control System - Energy Innovation Portal

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ARCS - Access Rate Control System Y-12 National Security Complex Contact Y12 About This Technology Publications: PDF Document Publication Fact Sheet (268 KB) PDF Document...

  15. Plasma vitrification of waste materials

    DOE Patents [OSTI]

    McLaughlin, D.F.; Dighe, S.V.; Gass, W.R.

    1997-06-10

    This invention provides a process wherein hazardous or radioactive wastes in the form of liquids, slurries, or finely divided solids are mixed with finely divided glassformers (silica, alumina, soda, etc.) and injected directly into the plume of a non-transferred arc plasma torch. The extremely high temperatures and heat transfer rates makes it possible to convert the waste-glassformer mixture into a fully vitrified molten glass product in a matter of milliseconds. The molten product may then be collected in a crucible for casting into final wasteform geometry, quenching in water, or further holding time to improve homogeneity and eliminate bubbles. 4 figs.

  16. Plasma vitrification of waste materials

    DOE Patents [OSTI]

    McLaughlin, David F. (Oakmont, PA); Dighe, Shyam V. (North Huntingdon, PA); Gass, William R. (Plum Boro, PA)

    1997-01-01

    This invention provides a process wherein hazardous or radioactive wastes in the form of liquids, slurries, or finely divided solids are mixed with finely divided glassformers (silica, alumina, soda, etc.) and injected directly into the plume of a non-transferred arc plasma torch. The extremely high temperatures and heat transfer rates makes it possible to convert the waste-glassformer mixture into a fully vitrified molten glass product in a matter of milliseconds. The molten product may then be collected in a crucible for casting into final wasteform geometry, quenching in water, or further holding time to improve homogeneity and eliminate bubbles.

  17. Spectrographic temperature measurement of a high power breakdown arc in a high pressure gas switch

    SciTech Connect (OSTI)

    Yeckel, Christopher; Curry, Randy

    2011-09-15

    A procedure for obtaining an approximate temperature value of conducting plasma generated during self-break closure of a RIMFIRE gas switch is described. The plasma is in the form of a breakdown arc which conducts approximately 12 kJ of energy in 1 {mu}s. A spectrographic analysis of the trigger-section of the 6-MV RIMFIRE laser triggered gas switch used in Sandia National Laboratory's ''Z-Machine'' has been made. It is assumed that the breakdown plasma has sufficiently approached local thermodynamic equilibrium allowing a black-body temperature model to be applied. This model allows the plasma temperature and radiated power to be approximated. The gas dielectric used in these tests was pressurized SF{sub 6}. The electrode gap is set at 4.59 cm for each test. The electrode material is stainless steel and insulator material is poly(methyl methacrylate). A spectrum range from 220 to 550 nanometers has been observed and calibrated using two spectral irradiance lamps and three spectrograph gratings. The approximate plasma temperature is reported.

  18. On the mechanism of operation of a cathode spot cell in a vacuum arc

    SciTech Connect (OSTI)

    Mesyats, G. A.; Petrov, A. A.; Bochkarev, M. B.; Barengolts, S. A.

    2014-05-05

    The erosive structures formed on a tungsten cathode as a result of the motion of the cathode spot of a vacuum arc over the cathode surface have been examined. It has been found that the average mass of a cathode microprotrusion having the shape of a solidified jet is approximately equal to the mass of ions removed from the cathode within the lifetime of a cathode spot cell carrying a current of several amperes. The time of formation of a new liquid-metal jet under the action of the reactive force of the plasma ejected by the cathode spot is about 10?ns, which is comparable to the lifetime of a cell. The growth rate of a liquid-metal jet is ?10{sup 4}?cm/s. The geometric shape and size of a solidified jet are such that a new explosive emission center (spot cell) can be initiated within several nanoseconds during the interaction of the jet with the dense cathode plasma. This is the underlying mechanism of the self-sustained operation of a vacuum arc.

  19. Determination of plasma velocity from light fluctuations in a cutting torch

    SciTech Connect (OSTI)

    Prevosto, L.; Mancinelli, B.; Kelly, H.

    2009-09-01

    Measurements of plasma velocities in a 30 A high energy density cutting torch are reported. The velocity diagnostic is based on the analysis of the light fluctuations emitted by the arc which are assumed to propagate with the flow velocity. These light fluctuations originate from plasma temperature and plasma density fluctuations mainly due to hydrodynamic instabilities. Fast photodiodes are employed as the light sensors. The arc core velocity was obtained from spectrally filtered light fluctuations measurements using a band-pass filter to detect light emission fluctuations emitted only from the arc axis. Maximum plasma jet velocities of 5000 m s{sup -1} close to the nozzle exit and about 2000 m s{sup -1} close to the anode were found. The obtained velocity values are in good agreement with those values predicted by a numerical code for a similar torch to that employed in this work.

  20. Numerical simulation study on fluid dynamics of plasma window using argon

    SciTech Connect (OSTI)

    Huang, S.; Zhu, K.; Shi, B. L.; Lu, Y. R.; Hershcovitch, A.; Yang, L.; Zhang, X. Y.; Wei, G. D.

    2013-07-15

    In this paper, a numerical 2D FLUENT-based magneto-hydrodynamic model has been developed to investigate the arc and flow field of plasma window, which is used as a windowless vacuum sealing device. The gas inlet, arc creation-developing and plasma expansion segments are all incorporated together in the integral model. An axis-symmetry cathode structure (hollow cathode) is used in the model. Current distribution of the arc is presented and discussed. The temperature, velocity, and pressure field are presented to show the physical mechanisms for the high pressure gap within the plasma window. Flow acceleration and viscosity effect are concluded as the main reasons for the pressure drop. The result for the pressure distribution in the cylindrical tube section has a good agreement with the analytical model. The validation for the sealing ability of plasma window is verified.

  1. Mass production of magnetic nickel nanoparticle in thermal plasma reactor

    SciTech Connect (OSTI)

    Kanhe, Nilesh S.; Nawale, Ashok B.; Bhoraskar, S. V.; Mathe, V. L.; Das, A. K.

    2014-04-24

    We report the mass production of Ni metal nanoparticles using dc transferred arc thermal plasma reactor by homogeneous gas phase condensation process. To increase the evaporation rate and purity of Ni nanoparticles small amount of hydrogen added along with argon in the plasma. Crystal structure analysis was done by using X-ray diffraction technique. The morphology of as synthesized nanoparticles was carried out using FESEM images. The magnetic properties were measured by using vibrating sample magnetometer at room temperature.

  2. What makes an electric welding arc perform its required function

    SciTech Connect (OSTI)

    Correy, T.B.

    1982-09-01

    The physics of direct current and alternating current welding arcs, the heat transfer of direct current welding arcs, the characteristics of dc welding and ac welding power supplies and recommendations for the procurement and maintenance of precision power supplies are discussed. (LCL)

  3. Concept for lightweight spaced-based deposition technology

    SciTech Connect (OSTI)

    Fulton, Michael; Anders, Andre

    2006-02-28

    In this contribution we will describe a technology path to very high quality coatings fabricated in the vacuum of space. To accomplish the ambitious goals set out in NASA's Lunar-Mars proposal, advanced thin-film deposition technology will be required. The ability to deposit thin-film coatings in the vacuum of lunar-space could be extremely valuable for executing this new space mission. Developing lightweight space-based deposition technology (goal:<300 g, including power supply) will enable the future fabrication and repair of flexible large-area space antennae and fixed telescope mirrors for lunar-station observatories. Filtered Cathodic Arc (FCA) is a proven terrestrial energetic thin-film deposition technology that does not need any processing gas but is well suited for ultra-high vacuum operation. Recently, miniaturized cathodic arcs have already been developed and considered for space propulsion. It is proposed to combine miniaturized pulsed FCA technology and robotics to create a robust, enabling space-based deposition system for the fabrication, improvement, and repair of thin films, especially of silver and aluminum, on telescope mirrors and eventually on large area flexible substrates. Using miniature power supplies with inductive storage, the typical low-voltage supply systems used in space are adequate. It is shown that high-value, small area coatings are within the reach of existing technology, while medium and large area coatings are challenging in terms of lightweight technology and economics.

  4. Observation of objects under intense plasma background illumination

    SciTech Connect (OSTI)

    Buzhinsky, R. O.; Savransky, V. V.; Zemskov, K. I.; Isaev, A. A.; Buzhinsky, O. I.

    2010-12-15

    Experiments on the observation of a brightness-amplified image of an object through a masking arc discharge are presented. The copper-vapor laser active medium was used as an image brightness amplifier. It is shown that the image quality does not worsen under plasma background illumination.

  5. Preparation of Non Oxide Ceramics in Thermal Plasma

    SciTech Connect (OSTI)

    Singh, S. K.

    2008-10-23

    Titanium carbonitride (TiCN) and ultrafine SiC have been prepared in extended arc thermal plasma reactors using graphite electrodes. The prepared materials have been characterized by a variety of analytical methods. It has been possible to produce the materials in a very short time period.

  6. Characteristics of plasma properties in an ablative pulsed plasma thruster

    SciTech Connect (OSTI)

    Schoenherr, Tony; Nees, Frank; Arakawa, Yoshihiro; Komurasaki, Kimiya; Herdrich, Georg

    2013-03-15

    Pulsed plasma thrusters are electric space propulsion devices which create a highly transient plasma bulk in a short-time arc discharge that is expelled to create thrust. The transitional character and the dependency on the discharge properties are yet to be elucidated. In this study, optical emission spectroscopy and Mach-Zehnder interferometry are applied to investigate the plasma properties in variation of time, space, and discharge energy. Electron temperature, electron density, and Knudsen numbers are derived for the plasma bulk and discussed. Temperatures were found to be in the order of 1.7 to 3.1 eV, whereas electron densities showed maximum values of more than 10{sup 17} cm{sup -3}. Both values showed strong dependency on the discharge voltage and were typically higher closer to the electrodes. Capacitance and time showed less influence. Knudsen numbers were derived to be in the order of 10{sup -3}-10{sup -2}, thus, indicating a continuum flow behavior in the main plasma bulk.

  7. Analysis of radiofrequency discharges in plasma

    DOE Patents [OSTI]

    Kumar, D.; McGlynn, S.P.

    1992-08-04

    Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition. 15 figs.

  8. Deposition head for laser

    DOE Patents [OSTI]

    Lewis, Gary K. (Los Alamos, NM); Less, Richard M. (Los Alamos, NM)

    1999-01-01

    A deposition head for use as a part of apparatus for forming articles from materials in particulate form in which the materials are melted by a laser beam and deposited at points along a tool path to form an article of the desired shape and dimensions. The deposition head delivers the laser beam and powder to a deposition zone, which is formed at the tip of the deposition head. A controller comprised of a digital computer directs movement of the deposition zone along the tool path and provides control signals to adjust apparatus functions, such as the speed at which the deposition head moves along the tool path.

  9. Type A Investigation of the Electrical Arc Injury at the Stanford...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    of the Electrical Arc Injury at the Stanford Linear Accelerator Complex on October 11, 2004 Type A Investigation of the Electrical Arc Injury at the Stanford Linear Accelerator...

  10. direct_deposit_111609

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    PROTECT YOUR BANKING INFORMATION: DO NOT complete this form until you are ready to submit it to the Payroll Department. DIRECT DEPOSIT REQUEST Directions: 1. Provide required information neatly, legibly; 2. If Checking Account Direct Deposit, include a voided check. a. DO NOT submit a deposit slip! 3. If Savings Account Direct Deposit, include a copy of savings card. 4. Sign this form; 5. Inter-office mail it to Craft Payroll at "P238." DIRECT DEPOSITION AUTHORIZATION I hereby

  11. Plasma Physics

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Plasma Physics Almost all of the observable matter in the universe is in the plasma state. Formed at high temperatures, plasmas consist of freely moving ions and free electrons. They are often called the "fourth state of matter" because their unique physical properties distinguish them from solids, liquids and gases. Plasma densities and temperatures vary widely, from the cold gases of interstellar space to the extraordinarily hot, dense cores of stars and inside a detonating nuclear

  12. Ion species control in high flux deuterium plasma beams produced by a linear plasma generator

    SciTech Connect (OSTI)

    Luo, G.-N.; Shu, W.M.; Nakamura, H.; O'Hira, S.; Nishi, M.

    2004-11-01

    The ion species ratios in low energy high flux deuterium plasma beams formed in a linear plasma generator were measured by a quadrupole mass spectrometer. And the species control in the plasma generator was evaluated by changing the operational parameters like neutral pressure, arc current, and axial magnetic confinement to the plasma column. The measurements reveal that the lower pressures prefer to form more D{sup +} ions, and the medium magnetic confinement at the higher pressures results in production of more D{sub 2}{sup +}, while the stronger confinement and/or larger arc current are helpful to D{sub 2}{sup +} conversion into D{sub 3}{sup +}. Therefore, the ion species can be controlled by adjusting the operational parameters of the plasma generator. With suitable adjustment, we can achieve plasma beams highly enriched with a single species of D{sup +}, D{sub 2}{sup +}, or D{sub 3}{sup +}, to a ratio over 80%. It has been found that the axial magnetic configuration played a significant role in the formation of D{sub 3}{sup +} within the experimental pressure range.

  13. Electric field induced needle-pulsed arc discharge carbon nanotube production apparatus: Circuitry and mechanical design

    SciTech Connect (OSTI)

    Kia, Kaveh Kazemi; Bonabi, Fahimeh

    2012-12-15

    A simple and low cost apparatus is reported to produce multiwall carbon nanotubes and carbon nano-onions by a low power short pulsed arc discharge reactor. The electric circuitry and the mechanical design details and a micro-filtering assembly are described. The pulsed-plasma is generated and applied between two graphite electrodes. The pulse width is 0.3 {mu}s. A strong dc electric field is established along side the electrodes. The repetitive discharges occur in less than 1 mm distance between a sharp tip graphite rod as anode, and a tubular graphite as cathode. A hydrocarbon vapor, as carbon source, is introduced through the graphite nozzle in the cathode assembly. The pressure of the chamber is controlled by a vacuum pump. A magnetic field, perpendicular to the plasma path, is provided. The results show that the synergetic use of a pulsed-current and a dc power supply enables us to synthesize carbon nanoparticles with short pulsed plasma. The simplicity and inexpensiveness of this plan is noticeable. Pulsed nature of plasma provides some extra degrees of freedom that make the production more controllable. Effects of some design parameters such as electric field, pulse frequency, and cathode shape are discussed. The products are examined using scanning probe microscopy techniques.

  14. Joule heat generation in thermionic cathodes of high-pressure arc discharges

    SciTech Connect (OSTI)

    Benilov, M. S.; Cunha, M. D.

    2013-02-14

    The nonlinear surface heating model of plasma-cathode interaction in high-pressure arcs is extended to take into account the Joule effect inside the cathode body. Calculation results are given for different modes of current transfer to tungsten cathodes of different configurations in argon plasmas of atmospheric or higher pressures. Special attention is paid to analysis of energy balances of the cathode and the near-cathode plasma layer. In all the cases, the variation of potential inside the cathode is much smaller than the near-cathode voltage drop. However, this variation can be comparable to the volt equivalent of the energy flux from the plasma to the cathode and then the Joule effect is essential. Such is the case of the diffuse and mixed modes on rod cathodes at high currents, where the Joule heating causes a dramatic change of thermal and electrical regimes of the cathode. The Joule heating has virtually no effect over characteristics of spots on rod and infinite planar cathodes.

  15. Lidar arc scan uncertainty reduction through scanning geometry optimization

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Wang, H.; Barthelmie, R. J.; Pryor, S. C.; Brown, G.

    2015-10-07

    Doppler lidars are frequently operated in a mode referred to as arc scans, wherein the lidar beam scans across a sector with a fixed elevation angle and the resulting measurements are used to derive an estimate of the n minute horizontal mean wind velocity (speed and direction). Previous studies have shown that the uncertainty in the measured wind speed originates from turbulent wind fluctuations and depends on the scan geometry (the arc span and the arc orientation). This paper is designed to provide guidance on optimal scan geometries for two key applications in the wind energy industry: wind turbine powermore »performance analysis and annual energy production. We present a quantitative analysis of the retrieved wind speed uncertainty derived using a theoretical model with the assumption of isotropic and frozen turbulence, and observations from three sites that are onshore with flat terrain, onshore with complex terrain and offshore, respectively. The results from both the theoretical model and observations show that the uncertainty is scaled with the turbulence intensity such that the relative standard error on the 10 min mean wind speed is about 30 % of the turbulence intensity. The uncertainty in both retrieved wind speeds and derived wind energy production estimates can be reduced by aligning lidar beams with the dominant wind direction, increasing the arc span and lowering the number of beams per arc scan. Large arc spans should be used at sites with high turbulence intensity and/or large wind direction variation when arc scans are used for wind resource assessment.« less

  16. Hydrogen atom temperature measured with wavelength-modulated laser absorption spectroscopy in large scale filament arc negative hydrogen ion source

    SciTech Connect (OSTI)

    Nakano, H. Goto, M.; Tsumori, K.; Kisaki, M.; Ikeda, K.; Nagaoka, K.; Osakabe, M.; Takeiri, Y.; Kaneko, O.; Nishiyama, S.; Sasaki, K.

    2015-04-08

    The velocity distribution function of hydrogen atoms is one of the useful parameters to understand particle dynamics from negative hydrogen production to extraction in a negative hydrogen ion source. Hydrogen atom temperature is one of the indicators of the velocity distribution function. To find a feasibility of hydrogen atom temperature measurement in large scale filament arc negative hydrogen ion source for fusion, a model calculation of wavelength-modulated laser absorption spectroscopy of the hydrogen Balmer alpha line was performed. By utilizing a wide range tunable diode laser, we successfully obtained the hydrogen atom temperature of ?3000?K in the vicinity of the plasma grid electrode. The hydrogen atom temperature increases as well as the arc power, and becomes constant after decreasing with the filling of hydrogen gas pressure.

  17. The Cascaded Arc: High Flows of Rovibrationally Excited H{sub 2} and its Impact on H{sup -} Ion Formation

    SciTech Connect (OSTI)

    Gabriel, O.; Harskamp, W. E. N. van; Schram, D. C.; Sanden, M. C. M. van de; Engeln, R.

    2009-03-12

    The cascaded arc is a plasma source providing high fluxes of excited and reactive species such as ions, radicals and rovibrationally excited molecules. The plasma is produced under pressures of some kPa in a direct current arc with electrical powers up to 10 kW. The plasma leaves the arc channel through a nozzle and expands with supersonic velocity into a vacuum-chamber kept by pumps at low pressures. We investigated the case of a pure hydrogen plasma jet with and without an applied axial magnetic field that confines ions and electrons in the jet. Highly excited molecules and atoms were detected by means of laser-induced fluorescence and optical emission spectroscopy. In case of an applied magnetic field the atomic state distribution of hydrogen atoms shows an overpopulation between the electronic states p = 5, 4 and 3. The influence of the highly excited hydrogen molecules on H{sup -} ion formation and a possible mechanism involving this negative ion and producing atomic hydrogen in state p = 3 will be discussed.

  18. Optical fiber imaging for high speed plasma motion diagnostics: Applied to low voltage circuit breakers

    SciTech Connect (OSTI)

    McBride, J. W.; Balestrero, A.; Tribulato, G.; Ghezzi, L.; Cross, K. J.

    2010-05-15

    An integrated portable measurement system is described for the study of high speed and high temperature unsteady plasma flows such as those found in the vicinity of high current switching arcs. An array of optical fibers allows the formation of low spatial resolution images, with a maximum capture rate of 1x10{sup 6} images per second (1 MHz), with 8 bit intensity resolution. Novel software techniques are reported to allow imaging of the arc; and to measure arc trajectories. Results are presented on high current (2 kA) discharge events in a model test fixture and on the application to a commercial low voltage circuit breaker.

  19. Numerical simulation of carbon arc discharge for nanoparticle synthesis

    SciTech Connect (OSTI)

    Kundrapu, M.; Keidar, M.

    2012-07-15

    Arc discharge with catalyst-filled carbon anode in helium background was used for the synthesis of carbon nanoparticles. In this paper, we present the results of numerical simulation of carbon arc discharges with arc current varying from 10 A to 100 A in a background gas pressure of 68 kPa. Anode sublimation rate and current voltage characteristics are compared with experiments. Distribution of temperature and species density, which is important for the estimation of the growth of nanoparticles, is obtained. The probable location of nanoparticle growth region is identified based on the temperature range for the formation of catalyst clusters.

  20. Dense Metal Plasma in a Solenoid for Ion Beam Neutralization

    SciTech Connect (OSTI)

    Anders, Andre; Kauffeldt, Marina; Oks, Efim M.; Roy, Prabir K.

    2010-10-30

    Space-charge neutralization is required to compress and focus a pulsed, high-current ion beam on a target for warm dense matter physics or heavy ion fusion experiments. We described approaches to produce dense plasma in and near the final focusing solenoid through which the ion beam travels, thereby providing an opportunity for the beam to acquire the necessary space-charge compensating electrons. Among the options are plasma injection from pulsed vacuum arc sources located outside the solenoid, and using a high current (> 4 kA) pulsed vacuum arc plasma from a ring cathode near the edge of the solenoid. The plasma distribution is characterized by photographic means, by an array of movable Langmuir probes, by a small single probe, and by evaluating Stark broadening of the Balmer H beta spectral line. In the main approach described here, the plasma is produced at several cathode spots distributed azimuthally on the ring cathode. It is shown that the plasma is essentially hollow, as determined by the structure of the magnetic field, though the plasma density exceeds 1014 cm-3 in practically all zones of the solenoid volume if the ring electrode is placed a few centimeters off the center of the solenoid. The plasma is non-uniform and fluctuating, however, since its density exceeds the ion beam density it is believed that this approach could provide a practical solution to the space charge neutralization challenge.

  1. Electrical studies and plasma characterization of an atmospheric pressure plasma jet operated at low frequency

    SciTech Connect (OSTI)

    Giuliani, L.; Xaubet, M.; Grondona, D.; Minotti, F.; Kelly, H.

    2013-06-15

    Low-temperature, high-pressure plasma jets have an extensive use in medical and biological applications. Much work has been devoted to study these applications while comparatively fewer studies appear to be directed to the discharge itself. In this work, in order to better understand the kind of electrical discharge and the plasma states existing in those devices, a study of the electrical characteristics of a typical plasma jet, operated at atmospheric pressure, using either air or argon, is reported. It is found that the experimentally determined electrical characteristics are consistent with the model of a thermal arc discharge, with a highly collisional cathode sheet. The only exception is the case of argon at the smallest electrode separation studied, around 1 mm in which case the discharge is better modeled as either a non-thermal arc or a high-pressure glow. Also, variations of the electrical behavior at different gas flow rates are interpreted, consistently with the arc model, in terms of the development of fluid turbulence in the external jet.

  2. A Miocene Island-Arc Volcanic Seamount- The Takashibiyama Formation...

    Open Energy Info (EERE)

    Island-Arc Volcanic Seamount- The Takashibiyama Formation, Shimane Peninsula, Sw Japan Jump to: navigation, search OpenEI Reference LibraryAdd to library Journal Article: A Miocene...

  3. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, P.; Carey, P.G.; Smith, P.M.; Ellingboe, A.R.

    1999-06-29

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique is disclosed. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques. 2 figs.

  4. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Ellingboe, Albert R. (Fremont, CA)

    1999-01-01

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  5. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Jose, CA); Ellingboe, Albert R. (Malahide, IE)

    2008-01-01

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  6. Arc Vault Significantly Reduces Electrical Hazards | GE Global Research

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Arc Vault Significantly Reduces Electrical Hazards Click to email this to a friend (Opens in new window) Share on Facebook (Opens in new window) Click to share (Opens in new window) Click to share on LinkedIn (Opens in new window) Click to share on Tumblr (Opens in new window) Arc Vault Significantly Reduces Electrical Hazards GE Global Research 2012.05.01 Recently, technology developed at GE Global Research received high praise from industry leaders for its ability to shield industrial -

  7. Assessing the feasibility of volumetric-modulated arc therapy using

    Office of Scientific and Technical Information (OSTI)

    simultaneous integrated boost (SIB-VMAT): An analysis for complex head-neck, high-risk prostate and rectal cancer cases (Journal Article) | SciTech Connect Assessing the feasibility of volumetric-modulated arc therapy using simultaneous integrated boost (SIB-VMAT): An analysis for complex head-neck, high-risk prostate and rectal cancer cases Citation Details In-Document Search Title: Assessing the feasibility of volumetric-modulated arc therapy using simultaneous integrated boost (SIB-VMAT):

  8. Reinvestigation of the charge density distribution in arc discharge fusion system

    SciTech Connect (OSTI)

    Sheng, Lin Horng; Yee, Lee Kim; Nan, Phua Yeong; Thung, Yong Yun; Khok, Yong Thian; Rahman, Faidz Abd

    2015-04-24

    A continual arc discharge system has been setup and the light intensity of arc discharge has been profiled. The mathematical model of local energy density distribution in arc discharge fusion has been simulated which is in good qualitative agreement with light intensity profile of arc discharge in the experiments. Eventually, the local energy density distribution of arc discharge system is able to be precisely manipulated to act as heat source in the fabrication of fused fiber devices.

  9. A Seemingly Simple Task: Filling a Solenoid Volume in Vacuum with Dense Plasma

    SciTech Connect (OSTI)

    Anders, Andre; Kauffeldt, Marina; Roy, Prabir; Oks, Efim

    2010-06-24

    Space-charge neutralization of a pulsed, high-current ion beam is required to compress and focus the beam on a target for warm dense matter physics or heavy ion fusion experiments. We described attempts to produce dense plasma in and near the final focusing solenoid through which the ion beam travels, thereby providing an opportunity for the beam to acquire the necessary charge-compensating electrons. Among the options are plasma injection from four pulsed vacuum arc sources located outside the solenoid, and using a high current (> 4 kA) pulsed vacuum arc plasma from a ring cathode near the edge of the solenoid. The plasma distribution is characterized by photographic means and by an array of movable Langmuir probes. The plasma is produced at several cathode spots distributed azimuthally on the ring cathode. Beam neutralization and compression are accomplished, though issues of density, uniformity, and pulse-to-pulse reproducibly remain to be solved.

  10. Production of high quality steels using the scrap/electric arc furnace route

    SciTech Connect (OSTI)

    Houpert, C.; Lanteri, V.; Jolivet, J.M.; Guttmann, M.; Birat, J.P.; Jallon, M.; Confente, M.

    1996-12-31

    Europe, after North America, is increasing the share of electric arc furnace steelmaking at the expense of integrated steel production and the trend appears to be long term. The driving forces for this change are strong: availability of scrap, social pressure to recycle materials and economic benefits to be reaped from the small structure associated with this short and slim production route. The increasing use of scrap does raise some problems however, in terms of the tramp element build up within the scrap deposit over time. Scrap pretreatment, which aims at separating steel from non-ferrous material during preparation, is thus attracting a lot of attention. The purpose of the present work was to investigate quantitatively the potential problems related to increased levels in tramp elements, with two objectives: identify, on a case by case basis, the currently existing practical limits and devise countermeasures to further extend these limits by better controlling process parameters for instance.

  11. Model of the boundary layer of a vacuum-arc magnetic filter

    SciTech Connect (OSTI)

    Minotti, F.; Giuliani, L.; Grondona, D.; Della Torre, H.; Kelly, H.

    2013-03-21

    A model is developed to describe the electrostatic boundary layer in a positively biased magnetic filter in filtered arcs with low collisionality. The set of equations used includes the electron momentum equation, with an anomalous collision term due to micro-instabilities leading to Bohm diffusion, electron mass conservation, and Poisson equation. Analytical solutions are obtained, valid for the regimes of interest, leading to an explicit expression to determine the electron density current to the filter wall as a function of the potential of the filter and the ratio of electron density at the plasma to that at the filter wall. Using a set of planar and cylindrical probes it is verified experimentally that the mentioned ratio of electron densities remains reasonably constant for different magnetic field values and probe bias, which allows to obtain a closed expression for the current. Comparisons are made with the experimentally determined current collected at different sections of a positively biased straight filter.

  12. Large area atmospheric-pressure plasma jet

    DOE Patents [OSTI]

    Selwyn, Gary S. (Los Alamos, NM); Henins, Ivars (Los Alamos, NM); Babayan, Steve E. (Huntington Beach, CA); Hicks, Robert F. (Los Angeles, CA)

    2001-01-01

    Large area atmospheric-pressure plasma jet. A plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250.degree. C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two planar, parallel electrodes are employed to generate a plasma in the volume therebetween. A "jet" of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly spacing the rf-powered electrode. Because of the atmospheric pressure operation, there is a negligible density of ions surviving for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike the situation for low-pressure plasma sources and conventional plasma processing methods.

  13. Plasma valve

    DOE Patents [OSTI]

    Hershcovitch, Ady (Mount Sinai, NY); Sharma, Sushil (Hinsdale, IL); Noonan, John (Naperville, IL); Rotela, Elbio (Clarendon Hills, IL); Khounsary, Ali (Hinsdale, IL)

    2003-01-01

    A plasma valve includes a confinement channel and primary anode and cathode disposed therein. An ignition cathode is disposed adjacent the primary cathode. Power supplies are joined to the cathodes and anode for rapidly igniting and maintaining a plasma in the channel for preventing leakage of atmospheric pressure through the channel.

  14. Plasma generators, reactor systems and related methods

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID); Pink, Robert J. (Pocatello, ID); Lee, James E. (Idaho Falls, ID)

    2007-06-19

    A plasma generator, reactor and associated systems and methods are provided in accordance with the present invention. A plasma reactor may include multiple sections or modules which are removably coupled together to form a chamber. Associated with each section is an electrode set including three electrodes with each electrode being coupled to a single phase of a three-phase alternating current (AC) power supply. The electrodes are disposed about a longitudinal centerline of the chamber and are arranged to provide and extended arc and generate an extended body of plasma. The electrodes are displaceable relative to the longitudinal centerline of the chamber. A control system may be utilized so as to automatically displace the electrodes and define an electrode gap responsive to measure voltage or current levels of the associated power supply.

  15. Hot-filament chemical vapor deposition chamber and process with multiple gas inlets

    DOE Patents [OSTI]

    Deng, Xunming; Povolny, Henry S.

    2004-06-29

    A thin film deposition method uses a vacuum confinement cup that employs a dense hot filament and multiple gas inlets. At least one reactant gas is introduced into the confinement cup both near and spaced apart from the heated filament. An electrode inside the confinement cup is used to generate plasma for film deposition. The method is used to deposit advanced thin films (such as silicon based thin films) at a high quality and at a high deposition rate.

  16. Late Cenozoic fault kinematics and basin development, Calabrian arc, Italy

    SciTech Connect (OSTI)

    Knott, S.D.; Turco, E.

    1988-08-01

    Current views for explaining the present structure of the Calabrian arc emphasize bending or buckling of an initially straight zone by rigid indentation. Although bending has played an important role, bending itself cannot explain all structural features now seen in the arc for the following reasons: (1) across-arc extension is inconsistent with buckling, (2) north-south compression predicted by a bending mechanism to occur in the internal part of a curved mountain belt is not present in the Calabrian arc, and (3) lateral shear occurs throughout the arc, not just along the northern and southern boundaries. The model presented here is based on lateral bending of mantle and lower crust (demonstrated by variation in extension in the Tyrrhenian basin) and semibrittle faulting and block rotation in the upper crust. These two styles of deformation are confined to the upper plate of the Calabrian subduction system. This deformation is considered to have been active from the beginning of extension in the Tyrrhenian basin (late Tortonian) and is still active today (based on Holocene seismicity). Block rotations are a consequence of lateral heterogeneous shear during extension. Therefore, some of the observed rotation of paleo-magnetic declinations may have occurred in areas undergoing extension and not just during thrusting. Inversion of sedimentary basins by block rotation is predicted by the model. The model will be a useful aid in interpreting reflection seismic data and exploring and developing offshore and onshore sedimentary basins in southern Italy.

  17. Graphite electrode arc melter demonstration Phase 2 test results

    SciTech Connect (OSTI)

    Soelberg, N.R.; Chambers, A.G.; Anderson, G.L.; O`Connor, W.K.; Oden, L.L.; Turner, P.C.

    1996-06-01

    Several U.S. Department of Energy organizations and the U.S. Bureau of Mines have been collaboratively conducting mixed waste treatment process demonstration testing on the near full-scale graphite electrode submerged arc melter system at the Bureau`s Albany (Oregon) Research Center. An initial test series successfully demonstrated arc melter capability for treating surrogate incinerator ash of buried mixed wastes with soil. The conceptual treatment process for that test series assumed that buried waste would be retrieved and incinerated, and that the incinerator ash would be vitrified in an arc melter. This report presents results from a recently completed second series of tests, undertaken to determine the ability of the arc melter system to stably process a wide range of {open_quotes}as-received{close_quotes} heterogeneous solid mixed wastes containing high levels of organics, representative of the wastes buried and stored at the Idaho National Engineering Laboratory (INEL). The Phase 2 demonstration test results indicate that an arc melter system is capable of directly processing these wastes and could enable elimination of an up-front incineration step in the conceptual treatment process.

  18. Apparatus and process for deposition of hard carbon films

    DOE Patents [OSTI]

    Nyaiesh, Ali R. (Menlo Park, CA); Garwin, Edward L. (Los Altos, CA)

    1989-01-01

    A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.

  19. Enhancement of microarcing at a grounded chamber wall by nonvanishing ion sheath in a radio-frequency capacitive discharged plasma

    SciTech Connect (OSTI)

    Kwok, Dixon T.K.; Yin Yongbai; Bilek, Marcela M.M.; McKenzie, David

    2005-10-31

    One-dimensional hybrid particle-in-cell simulations in cylindrical r coordinate, with particle ions and Boltzmann's distribution of electrons, are used to investigate the arcing effect in radio-frequency (rf) capacitively coupled discharged plasma. The simulation shows that the arcing at the chamber wall is enhanced by the nonvanishing ion sheath at the surface, such that the emission electrons current will last for several tens of rf cycles. On the other hand, at the inner electrode, the electron emission occurs only during certain phases of the rf cycle and does not promote arc growth.

  20. Development and Use of the Dual-Mode Plasma Torch

    SciTech Connect (OSTI)

    Womack, R.; Shuey, M.

    2002-02-26

    After several years of development, a commercially available high-temperature treatment system has been developed and installed that treats heterogeneous low-level radioactive waste. High temperature plasma processing, unique torch design and operating features make it feasible to achieve a volume reduced, permanent, high integrity waste form while eliminating the personnel exposure and costs associated with conventional sorting, characterizing and handling. Plasma technology can also be used to treat previous conditioned waste packages that no longer meet the current acceptance criteria for final disposal. Plasma treatment can result, in many cases, in a substantial volume reduction, which lowers the final disposal costs. This paper covers the recently patented dual mode plasma torch design(1), the lessons learned that fostered its development and the advantages it brings to radioactive waste processing. This paper also provides current full scale Plasma Arc Centrifugal Treatment (PACT) project status and how the dual mode torch is being used in the PACT system.

  1. Darwin : The Third DOE ARM TWP ARCS Site /

    SciTech Connect (OSTI)

    Clements, William E.; Jones, L. A.; Baldwin, T.; Nitschke, K.

    2002-01-01

    The United States Department of Energy's (DOE) Atmospheric Radiation Measurement (ARM) Program began operations in its Tropical Western Pacific (TWP) locale in October 1996 when the first Atmospheric Radiation and Cloud Station (ARCS) began collecting data on Manus Island in Papua New Guinea (PNG). Two years later, in November 1998, a second ARCS began operations on the island of Nauru in the Central Pacific. Now a third ARCS has begun collecting data in Darwin, Australia. The Manus, Nauru, and Darwin sites are operated through collaborative agreements with the PNG National Weather Service, The Nauru Department of Industry and Economic Development (IED), and the Australian Bureau of Meteorology's (BOM) Special Services Unit (SSU) respectively. All ARM TWP activities in the region are coordinated with the South Pacific Regional Environment Programme (SPREP) based in Apia, Samoa. The Darwin ARM site and its role in the ARM TWP Program are discussed.

  2. High-bandwidth continuous-flow arc furnace

    DOE Patents [OSTI]

    Hardt, David E. (Concord, MA); Lee, Steven G. (Ann Arbor, MI)

    1996-01-01

    A high-bandwidth continuous-flow arc furnace for stream welding applications includes a metal mass contained in a crucible having an orifice. A power source charges an electrode for generating an arc between the electrode and the mass. The arc heats the metal mass to a molten state. A pressurized gas source propels the molten metal mass through the crucible orifice in a continuous stream. As the metal is ejected, a metal feeder replenishes the molten metal bath. A control system regulates the electrode current, shielding gas pressure, and metal source to provide a continuous flow of molten metal at the crucible orifice. Independent control over the electrode current and shield gas pressure decouples the metal flow temperature and the molten metal flow rate, improving control over resultant weld characteristics.

  3. Muon Acceleration with RLA and Non-scaling FFAG Arcs

    SciTech Connect (OSTI)

    Vasiliy Morozov,Alex Bogacz,Dejan Trbojevic

    2010-05-01

    Recirculating Linear Accelerators (RLA) are the most likely means to achieve the rapid acceleration of shortlived muons to multi-GeV energies required for Neutrino Factories and TeV energies required for Muon Colliders. In this paper, we present a novel return-arc optics design based on a Non Scaling Fixed Field Alternating Gradient (NS-FFAG) lattice that allows 5 and 9 GeV/c muons of both charges to be transported in the same string of magnets. The return arcs are made up of super cells with each super cell consisting of three triplets. By employing combined function magnets with dipole, quadrupole, sextupole and octupole magnetic field components, each super cell is designed to be achromatic and to have zero initial and final periodic orbit offsets for both 5 and 9 GeV/c muon momenta. This solution would reduce the number of arcs by a factor of 2, simplifying the overall design.

  4. Muon acceleration with RLA and non-scaling FFAG ARCS

    SciTech Connect (OSTI)

    Morozov, V.S.; Trbojevic, D.; Bogacz, A.

    2010-05-23

    Recirculating Linear Accelerators (RLA) are the most likely means to achieve the rapid acceleration of short-lived muons to multi-GeV energies required for Neutrino Factories and TeV energies required for Muon Colliders. In this paper, we present a novel return-arc optics design based on a Non Scaling Fixed Field Alternating Gradient (NS-FFAG) lattice that allows 5 and 9 GeV/c muons of both charges to be transported in the same string of magnets. The return arcs are made up of super cells with each super cell consisting of three triplets. By employing combined function magnets with dipole, quadrupole, sextupole and octupole magnetic field components, each super cell is designed to be achromatic and to have zero initial and final periodic orbit offsets for both 5 and 9 GeV/c muon momenta. This solution would reduce the number of arcs by a factor of 2, simplifying the overall design.

  5. High-bandwidth continuous-flow arc furnace

    DOE Patents [OSTI]

    Hardt, D.E.; Lee, S.G.

    1996-08-06

    A high-bandwidth continuous-flow arc furnace for stream welding applications includes a metal mass contained in a crucible having an orifice. A power source charges an electrode for generating an arc between the electrode and the mass. The arc heats the metal mass to a molten state. A pressurized gas source propels the molten metal mass through the crucible orifice in a continuous stream. As the metal is ejected, a metal feeder replenishes the molten metal bath. A control system regulates the electrode current, shielding gas pressure, and metal source to provide a continuous flow of molten metal at the crucible orifice. Independent control over the electrode current and shield gas pressure decouples the metal flow temperature and the molten metal flow rate, improving control over resultant weld characteristics. 4 figs.

  6. ArcSafe® with Pulsed Arrested Spark Discharge

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ArcSafe® with Pulsed Arrested Spark Discharge  2007 R&D 100 Award Entry Form ArcSafe® with Pulsed Arrested Spark Discharge  Joint Submitters Submitting Organization Sandia National Laboratories PO Box 5800, MS 1181 Albuquerque, NM 87185-1181 USA Larry Schneider Phone: (505) 845-7135 Fax: (505) 845-7685 Email: lxschne@sandia.gov AFFIRMATION: I affirm that all information submitted as a part of, or supplemental to, this entry is a fair and accurate represen- tation of this product.

  7. Solution deposition assembly

    DOE Patents [OSTI]

    Roussillon, Yann; Scholz, Jeremy H; Shelton, Addison; Green, Geoff T; Utthachoo, Piyaphant

    2014-01-21

    Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber, at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.

  8. Plasma momentum meter for momentum flux measurements

    DOE Patents [OSTI]

    Zonca, Fulvio (Rome, IT); Cohen, Samuel A. (Hopewell, NJ); Bennett, Timothy (Princeton, NJ); Timberlake, John R. (Allentown, NJ)

    1993-01-01

    Invention comprises an instrument in which momentum flux onto a biasable target plate is transferred via a suspended quartz tube onto a sensitive force transducer--a capacitance-type pressure gauge. The transducer is protected from thermal damage, arcing and sputtering, and materials used in the target and pendulum are electrically insulating, rigid even at elevated temperatures, and have low thermal conductivity. The instrument enables measurement of small forces (10.sup.-5 to 10.sup.3 N) accompanied by high heat fluxes which are transmitted by energetic particles with 10's of eV of kinetic energy in a intense magnetic field and pulsed plasma environment.

  9. High Gradient Accelerator Cavities Using Atomic Layer Deposition

    SciTech Connect (OSTI)

    Ives, Robert Lawrence; Parsons, Gregory; Williams, Philip; Oldham, Christopher; Mundy, Zach; Dolgashev, Valery

    2014-12-09

    In the Phase I program, Calabazas Creek Research, Inc. (CCR), in collaboration with North Carolina State University (NCSU), fabricated copper accelerator cavities and used Atomic Layer Deposition (ALD) to apply thin metal coatings of tungsten and platinum. It was hypothesized that a tungsten coating would provide a robust surface more resistant to arcing and arc damage. The platinum coating was predicted to reduce processing time by inhibiting oxides that form on copper surfaces soon after machining. Two sets of cavity parts were fabricated. One was coated with 35 nm of tungsten, and the other with approximately 10 nm of platinum. Only the platinum cavity parts could be high power tested during the Phase I program due to schedule and funding constraints. The platinum coated cavity exhibit poor performance when compared with pure copper cavities. Not only did arcing occur at lower power levels, but the processing time was actually longer. There were several issues that contributed to the poor performance. First, machining of the base copper cavity parts failed to achieve the quality and cleanliness standards specified to SLAC National Accelerator Center. Secondly, the ALD facilities were not configured to provide the high levels of cleanliness required. Finally, the nanometer coating applied was likely far too thin to provide the performance required. The coating was ablated or peeled from the surface in regions of high fields. It was concluded that the current ALD process could not provide improved performance over cavities produced at national laboratories using dedicated facilities.

  10. A Space-Charge-Neutralizing Plasma for Beam Drift Compression

    SciTech Connect (OSTI)

    Roy, P.K.; Seidl, P.A.; Anders, A.; Bieniosek, F.M.; Coleman, J.E.; Gilson, E.P.; Greenway, W.; Grote, D.P.; Jung, J.Y.; Leitner, M.; Lidia, S.M.; Logan, B.G.; Sefkow, A.B.; Waldron, W.L.; Welch, D.R.

    2008-08-01

    Simultaneous radial focusing and longitudinal compression of intense ion beams are being studied to heat matter to the warm dense matter, or strongly coupled plasma regime. Higher compression ratios can be achieved if the beam compression takes place in a plasma-filled drift region in which the space-charge forces of the ion beam are neutralized. Recently, a system of four cathodic arc plasma sources has been fabricated and the axial plasma density has been measured. A movable plasma probe array has been developed to measure the radial and axial plasma distribution inside and outside of a {approx} 10 cm long final focus solenoid (FFS). Measured data show that the plasma forms a thin column of diameter {approx} 5 mm along the solenoid axis when the FFS is powered with an 8T field. Measured plasma density of {ge} 1 x 10{sup 13} cm{sup -3} meets the challenge of n{sub p}/Zn{sub b} > 1, where n{sub p} and n{sub b} are the plasma and ion beam density, respectively, and Z is the mean ion charge state of the plasma ions.

  11. Plasma chemistry in wire chambers

    SciTech Connect (OSTI)

    Wise, J.

    1990-05-01

    The phenomenology of wire chamber aging is discussed and fundamentals of proportional counters are presented. Free-radical polymerization and plasma polymerization are discussed. The chemistry of wire aging is reviewed. Similarities between wire chamber plasma (>1 atm dc-discharge) and low-pressure rf-discharge plasmas, which have been more widely studied, are suggested. Construction and use of a system to allow study of the plasma reactions occurring in wire chambers is reported. A proportional tube irradiated by an {sup 55}Fe source is used as a model wire chamber. Condensable species in the proportional tube effluent are concentrated in a cryotrap and analyzed by gas chromatography/mass spectrometry. Several different wire chamber gases (methane, argon/methane, ethane, argon/ethane, propane, argon/isobutane) are tested and their reaction products qualitatively identified. For all gases tested except those containing methane, use of hygroscopic filters to remove trace water and oxygen contaminants from the gas resulted in an increase in the average molecular weight of the products, consistent with results from low-pressure rf-discharge plasmas. It is suggested that because water and oxygen inhibit polymer growth in the gas phase that they may also reduce polymer deposition in proportional tubes and therefore retard wire aging processes. Mechanistic implications of the plasma reactions of hydrocarbons with oxygen are suggested. Unresolved issues in this work and proposals for further study are discussed.

  12. Synthesis of {gamma}-aluminium oxynitride spinel using thermal plasma technique

    SciTech Connect (OSTI)

    Panda, Pravuram; Singh, S. K.; Sinha, S. P.

    2012-07-23

    The synthesis technique of {gamma}-AlON in NH{sub 3} plasma using extended arc thermal plasma reactor have been reported. Dense cubic AlON spinel was synthesized in liquid state by fusion of mixture of Al{sub 2}O{sub 3} and AlN powder under thermal plasma. The density of the fused AlON was found to be 3.64 g/cc which is 98.11% of theoretical value. The formation of AlON was confirmed from XRD and Raman studies. Well faceted structure of plasma fused AlON was observed in FE-SEM micrograph.

  13. Chemistry modification of high oxygen-carbon powder by plasma melting: Follow up to complete the story

    SciTech Connect (OSTI)

    Dunn, P.S.; Korzekwa, D.R.; Garcia, F.G.; Michaluk, C.A.

    1998-03-01

    State of the art melting of tantalum and tantalum alloys has relied on electron beam (EB) or vacuum arc remelting (VAR) for commercial ingot production. Plasma arc melting (PAM) provides an alternative for melting tantalum that contains very high levels of interstitials where other melting techniques can not be applied. Previous work in this area centered on plasma arc melt quality and final interstitial content of tantalum feedstock containing excessive levels of interstitial impurities as a function of melt rate and plasma gas. This report is an expansion of this prior study and provides the findings from the analysis of second phase components observed in the microstructure of the PAM tantalum. In addition, results from subsequent EB melting trials of PAM tantalum are included.

  14. Constricted glow discharge plasma source

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA); Anders, Simone (Albany, CA); Dickinson, Michael (San Leandro, CA); Rubin, Michael (Berkeley, CA); Newman, Nathan (Winnetka, IL)

    2000-01-01

    A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.

  15. dc-plasma-sprayed electronic-tube device

    DOE Patents [OSTI]

    Meek, T.T.

    1982-01-29

    An electronic tube and associated circuitry which is produced by dc plasma arc spraying techniques is described. The process is carried out in a single step automated process whereby both active and passive devices are produced at very low cost. The circuitry is extremely reliable and is capable of functioning in both high radiation and high temperature environments. The size of the electronic tubes produced are more than an order of magnitude smaller than conventional electronic tubes.

  16. Sandia Energy - Sandia Research on PV Arc-Fault Detection Submitted...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    for US Patent Different types of parallel arc-faults on the DC side of a PV array. Different types of parallel arc-faults on the DC side of a PV array. Sandia National...

  17. Sandia Energy - PV Arc-Fault and Ground Fault Detection and Mitigation...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    prescribe maintenance schedules, and warn of arc-fault events. Investigating the proscons of module-level, string-level, and array-level arc-fault detection schemes....

  18. Synthesis of AlN/Al Polycrystals along with Al Nanoparticles Using Thermal Plasma Route

    SciTech Connect (OSTI)

    Kanhe, Nilesh S.; Nawale, A. B.; Kulkarni, N. V.; Bhoraskar, S. V.; Mathe, V. L.; Das, A. K.

    2011-07-15

    This paper for the first time reports the (200) oriented growth of hexagonal Aluminum nitride crystals during synthesis of aluminum nanoparticles in dc transferred arc thermal plasma reactor by gas phase condensation in nitrogen plasma. The structural and morphological study of as synthesized AlN crystal and aluminium nanoparticles was done by using the x-ray diffraction method, scanning electron microscopy and transmission electron microscopy.

  19. Proposal of an Arc Detection Technique Based on RF Measurements for the ITER ICRF Antenna

    SciTech Connect (OSTI)

    Huygen, S.; Dumortier, P.; Durodie, F.; Messiaen, A.; Vervier, M.; Vrancken, M.

    2011-12-23

    RF arc detection is a key operational and safety issue for the ICRF system on ITER. Indeed the high voltages inside the antenna put it at risk of arcing, which could cause substantial damage. This paper describes the various possibilities explored by circuit simulation and the strategy now considered to protect the ITER ICRF antenna from RF arcs.

  20. Plasma-assisted catalytic ionization using porous nickel plate

    SciTech Connect (OSTI)

    Oohara, W.; Maeda, T.; Higuchi, T.

    2011-09-15

    Hydrogen atomic pair ions, i.e., H{sup +} and H{sup -} ions, are produced by plasma-assisted catalytic ionization using a porous nickel plate. Positive ions in a hydrogen plasma generated by dc arc discharge are irradiated to the porous plate, and pair ions are produced from the back of the irradiation plane. It becomes clear that the production quantity of pair ions mainly depends on the irradiation current of positive ions and the irradiation energy affects the production efficiency of H{sup -} ions.

  1. Perspectives on Deposition Velocity

    Office of Environmental Management (EM)

    Deposition Velocity ... Going down the rabbit hole to explain that sinking feeling Brian DiNunno, Ph.D. Project Enhancement Corporation June 6 th , 2012 Discussion Framework ď‚— Development of the HSS Deposition Velocity Safety Bulletin ď‚— Broader discussion of appropriate conservatism within dispersion modeling and DOE-STD-3009 DOE-STD-3009 Dose Comparison "General discussion is provided for source term calculation and dose estimation, as well as prescriptive guidance for the latter. The

  2. MHD Ballooning Instability in the Plasma Sheet

    SciTech Connect (OSTI)

    C.Z. Cheng; S. Zaharia

    2003-10-20

    Based on the ideal-MHD model the stability of ballooning modes is investigated by employing realistic 3D magnetospheric equilibria, in particular for the substorm growth phase. Previous MHD ballooning stability calculations making use of approximations on the plasma compressibility can give rise to erroneous conclusions. Our results show that without making approximations on the plasma compressibility the MHD ballooning modes are unstable for the entire plasma sheet where beta (sub)eq is greater than or equal to 1, and the most unstable modes are located in the strong cross-tail current sheet region in the near-Earth plasma sheet, which maps to the initial brightening location of the breakup arc in the ionosphere. However, the MHD beq threshold is too low in comparison with observations by AMPTE/CCE at X = -(8 - 9)R(sub)E, which show that a low-frequency instability is excited only when beq increases over 50. The difficulty is mitigated by considering the kinetic effects of ion gyrorad ii and trapped electron dynamics, which can greatly increase the stabilizing effects of field line tension and thus enhance the beta(sub)eq threshold [Cheng and Lui, 1998]. The consequence is to reduce the equatorial region of the unstable ballooning modes to the strong cross-tail current sheet region where the free energy associated with the plasma pressure gradient and magnetic field curvature is maximum.

  3. NSTX Plasma Response to Lithium Coated Divertor

    SciTech Connect (OSTI)

    H.W. Kugel, M.G. Bell, J.P. Allain, R.E. Bell, S. Ding, S.P. Gerhardt, M.A. Jaworski, R. Kaita, J. Kallman, S.M. Kaye, B.P. LeBlanc, R. Maingi, R. Majeski, R. Maqueda, D.K. Mansfield, D. Mueller, R. Nygren, S.F. Paul, R. Raman, A.L. Roquemore, S.A. Sabbagh, H. Schneider, C.H. Skinner, V.A. Soukhanovskii, C.N. Taylor, J.R. Timberlak, W.R. Wampler, L.E. Zakharov, S.J. Zweben, and the NSTX Research Team

    2011-01-21

    NSTX experiments have explored lithium evaporated on a graphite divertor and other plasma facing components in both L- and H- mode confinement regimes heated by high-power neutral beams. Improvements in plasma performance have followed these lithium depositions, including a reduction and eventual elimination of the HeGDC time between discharges, reduced edge neutral density, reduced plasma density, particularly in the edge and the SOL, increased pedestal electron and ion temperature, improved energy confinement and the suppression of ELMs in the H-mode. However, with improvements in confinement and suppression of ELMs, there was a significant secular increase in the effective ion charge Zeff and the radiated power in H-mode plasmas as a result of increases in the carbon and medium-Z metallic impurities. Lithium itself remained at a very low level in the plasma core, <0.1%. Initial results are reported from operation with a Liquid Lithium Divertor (LLD) recently installed.

  4. Plasma technology

    SciTech Connect (OSTI)

    Herlitz, H.G.

    1986-11-01

    This paper describes the uses of plasma technology for the thermal destruction of hazardous wastes such as PCBs, dioxins, hydrocarbons, military chemicals and biological materials; for metals recovery from steel making dusts. One advantage of the process is that destruction of wastes can be carried out on site. Systems in several countries use the excess thermal energy for district heating.

  5. Diamond film growth argon-carbon plasmas

    DOE Patents [OSTI]

    Gruen, Dieter M. (Downers Grove, IL); Krauss, Alan R. (Naperville, IL); Liu, Shengzhong (Canton, MI); Pan, Xianzheng (Wuhan Hubei, CN); Zuiker, Christopher D. (LaGrange, IL)

    1998-01-01

    A method and system for manufacturing diamond film. The method involves forming a carbonaceous vapor, providing a gas stream of argon, hydrogen and hydrocarbon and combining the gas with the carbonaceous vapor, passing the combined carbonaceous vapor and gas carrier stream into a chamber, forming a plasma in the chamber causing fragmentation of the carbonaceous and deposition of a diamond film on a substrate.

  6. Ultrashort pulse laser deposition of thin films

    DOE Patents [OSTI]

    Perry, Michael D.; Banks, Paul S.; Stuart, Brent C.

    2002-01-01

    Short pulse PLD is a viable technique of producing high quality films with properties very close to that of crystalline diamond. The plasma generated using femtosecond lasers is composed of single atom ions with no clusters producing films with high Sp.sup.3 /Sp.sup.2 ratios. Using a high average power femtosecond laser system, the present invention dramatically increases deposition rates to up to 25 .mu.m/hr (which exceeds many CVD processes) while growing particulate-free films. In the present invention, deposition rates is a function of laser wavelength, laser fluence, laser spot size, and target/substrate separation. The relevant laser parameters are shown to ensure particulate-free growth, and characterizations of the films grown are made using several diagnostic techniques including electron energy loss spectroscopy (EELS) and Raman spectroscopy.

  7. Transformational, Large Area Fabrication of Nanostructured Materials Using Plasma Arc Lamps

    SciTech Connect (OSTI)

    2009-03-01

    This factsheet describes a study that will address critical additional steps over large areas of as-synthesized nanostructured materials, such as annealing, phase transformation, or activation of dopants, dramatically reducing the processing costs of the solid-state lighting and photovoltaic materials.

  8. Hydrocarbon and Deposit Morphology Effects on EGR Cooler Deposit Stability

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    and Removal | Department of Energy and Deposit Morphology Effects on EGR Cooler Deposit Stability and Removal Hydrocarbon and Deposit Morphology Effects on EGR Cooler Deposit Stability and Removal This paper reports on studies carried out at ORNL to examine the shear force required to remove particles from a well-developed EGR cooler deposit. PDF icon deer11_sluder.pdf More Documents & Publications Fuel Effects on Emissions Control Technologies Materials Issues Associated with EGR

  9. Darwin: The Third DOE ARM TWP ARCS Site

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Darwin: The Third DOE ARM TWP ARCS Site W. E. Clements and L. Jones Los Alamos National Laboratory, Los Alamos, New Mexico T. Baldwin Special Services Unit Australian Bureau of Meteorology Melbourne, Australia K. Nitschke South Pacific Regional Environment Programme Apia, Samoa Introduction The U.S. Department of Energy's (DOE's) Atmospheric Radiation Measurement (ARM) Program began operations in its Tropical Western Pacific (TWP) locale in October 1996 when the first Atmospheric Radiation and

  10. A Glove Box Enclosed Gas-Tungsten Arc Welding System

    SciTech Connect (OSTI)

    Reevr, E, M; Robino, C.V.

    1999-07-01

    This report describes an inert atmosphere enclosed gas-tungsten arc welding system which has been assembled in support of the MC2730, MC2730A and MC 3500 Radioisotope Thermoelectric Generator (RTG) Enhanced Surveillance Program. One goal of this program is to fabricate welds with microstructures and impurity levels which are similar to production heat source welds previously produced at Los Alamos National Laboratory and the Mound Facility. These welds will subsequently be used for high temperature creep testing as part of the overall component lifetime assessment. In order to maximize the utility of the welding system, means for local control of the arc atmosphere have been incorporated and a wide range of welding environments can easily be evaluated. The gas-tungsten arc welding system used in the assembly is computer controlled, includes two-axis and rotary motion, and can be operated in either continuous or pulsed modes. The system can therefore be used for detailed research studies of welding impurity effects, development of prototype weld schedules, or to mimic a significant range of production-like welding conditions. Fixturing for fabrication of high temperature creep test samples have been designed and constructed, and weld schedules for grip-tab and test welds have been developed. The microstructure of these welds have been evaluated and are consistent with those used during RTG production.

  11. RF Arc Detection in ICRH RDL Antennas by Phase Measurement

    SciTech Connect (OSTI)

    El Khaldi, M.; Vulliez, K.; Magne, R.; Bosia, G.

    2009-11-26

    A voltage breakdown in an Ion Cyclotron Resonance Heating (ICRH) system is usually detected as an abrupt change in the module of the reflection coefficient |{gamma}in| at the power source output. The same effect can be due to a large load variation. This study is carried out by constructing a electrical model for a Tore Supra ITER-like antenna (TS ILA), and to analyse how a voltage breakdown, localized in any part of the system, modifies several electrical parameters of the circuit (with respect to perfect match conditions), as detected at the location of the monitoring points. The phase difference between the reflections coefficients measured at the output of tuning network when an arc strikes in one of two Resonant double loop (RDL) sections of the ICRH TS ILA appears to be the most promising parameter to detect the arc and identify its position. It is also significantly insensitive to a load variation so an arc and edge localized modes (ELMs) can be distinguished.

  12. Plasma stability control using dielectric barriers in radio-frequency atmospheric pressure glow discharges

    SciTech Connect (OSTI)

    Shi, J. J.; Liu, D. W.; Kong, M. G.

    2006-08-21

    It is widely accepted that electrode insulation is unnecessary for generating radio-frequency (rf) atmospheric pressure glow discharges (APGDs). It is also known that rf APGDs with large discharge current are susceptible to the glow-to-arc transition. In this letter, a computational study is presented to demonstrate that dielectric barriers provide an effective control over unlimited current growth and allow rf APGDs to be operated at very high current densities with little danger of the glow-to-arc transition. Characteristics of electrode sheaths are used to show that the stability control is achieved by forcing the plasma-containing electrode unit to acquire positive differential conductivity.

  13. The Wyodak-Anderson coal assessment, Powder River Basin, Wyoming and Montana -- An ArcView project

    SciTech Connect (OSTI)

    Flores, R.M.; Gunther, G.; Ochs, A.; Ellis, M.E.; Stricker, G.D.; Bader, L.R.

    1998-12-31

    In 1997, more than 305 million short tons of clean and compliant coal were produced from the Wyodak-Anderson and associated coal beds and zones of the Paleocene Fort Union Formation in the Powder River Basin, Wyoming and Montana. To date, all coal produced from the Wyodak-Anderson, which averages 0.47 percent sulfur and 6.44 percent ash, has met regulatory compliance standards. Twenty-eight percent of the total US coal production in 1997 was from the Wyodak-Anderson coal. Based on the current consumption rates and forecast by the Energy Information Administration (1996), the Wyodak-Anderson coal is projected to produce 413 million short tons by the year 2016. In addition, this coal deposit as well as other Fort Union coals have recently been targeted for exploration and development of methane gas. New US Geological Survey (USGS) digital products could provide valuable assistance in future mining and gas development in the Powder River Basin. An interactive format, with querying tools, using ArcView software will display the digital products of the resource assessment of Wyodak-Anderson coal, a part of the USGS National Coal Resource Assessment of the Powder River Basin. This ArcView project includes coverages of the data point distribution; land use; surface and subsurface ownerships; coal geology, stratigraphy, quality and geochemistry; and preliminary coal resource calculations. These coverages are displayed as map views, cross sections, tables, and charts.

  14. Radiological Survey Tool Set for ArcGIS 8.3 and ArcPad 6.0

    SciTech Connect (OSTI)

    ROGER, COTTRELL

    2004-11-30

    The Radiological Control Operations (RCO) group at the Savannah River Site (SRS) is tasked with conducting routine surveys for the detection of radiological contaminants in the environment. The Radiological Survey Tool Set (RSTS) was developed by the Environmental & Geographic Information Systems (EGIS) group of SRS to assist RCO personnel in this survey process. The tool set consists of two major components. The first component is a custom extension for ArcGIS 8.3 that allows the user to interactively create a sampling plan prior to entering the field. Additionally, the extension allows the user to upload field-collected data to the GIS with post-processing functionality. The second component is a custom ArcPad 6.0 applet. This applet provides the user with navigational capabilities to a selected origin point with the help of Global Positioning Systems (GPS) technology, and the recording of the sample data results into a hand-held field computer via ArcPad 6.0 software.

  15. Arc Initiation of High Explosives: Final Report (Technical Report...

    Office of Scientific and Technical Information (OSTI)

    71 CLASSICAL AND QUANTUMM MECHANICS, GENERAL PHYSICS; 42 ENGINEERING; 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; 70 PLASMA PHYSICS AND FUSION Word Cloud More...

  16. High Power Hydrogen Injector with Beam Focusing for Plasma Heating

    SciTech Connect (OSTI)

    Deichuli, P.P.; Ivanov, A.A.; Korepanov, S.A.; Mishagin, V.V.; Sorokin, A.V.; Stupishin, N.V

    2005-01-15

    High power neutral beam injector has been developed with the atom energy of 25 keV, a current of 60 A, and several milliseconds pulse duration. Six of these injectors will be used for upgrade of the atomic injection system at central cell of a Gas Dynamic Trap (GDT) device and 2 injectors are planned for SHIP experiment.The injector ion source is based on an arc discharge plasma box. The plasma emitter is produced by a 1 kA arc discharge in hydrogen. A multipole magnetic field produced with permanent magnets at the periphery of the plasma box is used to increase its efficiency and improve homogeneity of the plasma emitter. The ion beam is extracted by a 4-electrodes ion optical system (IOS). Initial beam diameter is 200 mm. The grids of the IOS have a spherical curvature for geometrical focusing of the beam. The optimal IOS geometry and grid potentials were found with the numerical simulation to provide precise beam formation. The measured angular divergence of the beam is 0.02 rad, which corresponds to the 2.5 cm Gaussian radius of the beam profile measured at focal point.

  17. Supersonic metal plasma impact on a surface: An optical investigation of the pre-surface region

    SciTech Connect (OSTI)

    Fusion Science Group, AFRD; Plasma Applications Group, AFRD; Ni, Pavel A.; Anders, Andre

    2009-12-15

    Aluminum plasma, produced in high vacuum by a pulsed, filtered cathodic arc plasma source, was directed onto a wall where if formed a coating. The accompanying ?optical flare? known from the literature was visually observed, photographed, and spectroscopically investigated with appropriately high temporal (1 ?s) and spatial (100 ?m) resolution. Consistent with other observations using different techniques, it was found that the impact of the fully ionized plasma produces metal neutrals as well as desorbed gases, both of which interact with the incoming plasma. Most effectively are charge exchange collisions between doubly charged aluminum and neutral aluminum, which lead to a reduction of the flow of doubly charged before they reach the wall, and a reduction of neutrals as the move away from the surface. Those plasma-wall interactions are relevant for coating processes as well as for interpreting the plasma properties such as ion charge state distributions.

  18. Meter Scale Plasma Source for Plasma Wakefield Experiments (Journal...

    Office of Scientific and Technical Information (OSTI)

    Meter Scale Plasma Source for Plasma Wakefield Experiments Citation Details In-Document Search Title: Meter Scale Plasma Source for Plasma Wakefield Experiments Authors:...

  19. Visual and Electrical Evidence Supporting a Two-Plasma Mechanism of Vacuum Breakdown Initiation

    SciTech Connect (OSTI)

    Castano-Giraldo, C.; Aghazarian, Maro; Caughman, John B; Ruzic, D. N.

    2012-01-01

    The energy available during vacuum breakdown between copper electrodes at high vacuum was limited using resistors in series with the vacuum gap and arresting diodes. Surviving features observed with SEM in postmortem samples were tentatively correlated with electrical signals captured during breakdown using a Rogowski coil and a high-voltage probe. The visual and electrical evidence is consistent with the qualitative model of vacuum breakdown by unipolar arc formation by Schwirzke [1, 2]. The evidence paints a picture of two plasmas of different composition and scale being created during vacuum breakdown: an initial plasma made of degassed material from the metal surface, ignites a plasma made up of the electrode material.

  20. Feedback enhanced plasma spray tool

    DOE Patents [OSTI]

    Gevelber, Michael Alan; Wroblewski, Donald Edward; Fincke, James Russell; Swank, William David; Haggard, Delon C.; Bewley, Randy Lee

    2005-11-22

    An improved automatic feedback control scheme enhances plasma spraying of powdered material through reduction of process variability and providing better ability to engineer coating structure. The present inventors discovered that controlling centroid position of the spatial distribution along with other output parameters, such as particle temperature, particle velocity, and molten mass flux rate, vastly increases control over the sprayed coating structure, including vertical and horizontal cracks, voids, and porosity. It also allows improved control over graded layers or compositionally varying layers of material, reduces variations, including variation in coating thickness, and allows increasing deposition rate. Various measurement and system control schemes are provided.

  1. Formation of Gapless Fermi Arcs and Fingerprints of Order in the Pseudogap State of Cuprate Superconductors

    SciTech Connect (OSTI)

    Kondo, Takeshi; Palczewski, Ari; Hamaya, Yoichiro; Takeuchi, Tsunehiro; Wen, J. S.; Xu, Z. J.; Gu, Genda; Kaminski, Adam

    2013-10-08

    We use angle-resolved photoemission spectroscopy and a new quantitative approach based on the partial density of states to study properties of seemingly disconnected portions of the Fermi surface (FS) that are present in the pseudogap state of cuprates called Fermi arcs. We find that the normal state FS collapses very abruptly into Fermi arcs at the pseudogap temperature (T*). Surprisingly, the length of the Fermi arcs remains constant over an extended temperature range between (T*) and Tpair, consistent with the presence of an ordered state below T*. These arcs collapse again at the temperature below which pair formation occurs (Tpair) either to a point or a very short arc, whose length is limited by our experimental resolution. The tips of the arcs span between points defining a set of wave vectors in momentum space, which are the fingerprints of the ordered state that causes the pseudogap.

  2. Formation of Gapless Fermi Arcs and Fingerprints of Order in the Pseudogap State of Cuprate Superconductors

    SciTech Connect (OSTI)

    Kondo, Takeshi; Palczewski, Ari D.; Hamaya, Yoichiro; Takeuchi, Tsunehiro; Wen, J. S.; Gu, Genda; Kaminski, Adam

    2013-10-11

    We use angle-resolved photoemission spectroscopy and a new quantitative approach based on the partial density of states to study properties of seemingly disconnected portions of the Fermi surface (FS) that are present in the pseudogap state of cuprates called Fermi arcs. We find that the normal state FS collapses very abruptly into Fermi arcs at the pseudogap temperature (T?). Surprisingly, the length of the Fermi arcs remains constant over an extended temperature range between T? and Tpair, consistent with the presence of an ordered state below T?. These arcs collapse again at the temperature below which pair formation occurs (Tpair) either to a point or a very short arc, whose length is limited by our experimental resolution. The tips of the arcs span between points defining a set of wave vectors in momentum space, which are the fingerprints of the ordered state that causes the pseudogap.

  3. Plasma 101 | Princeton Plasma Physics Lab

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Plasma 101 10 Facts You Should Know About Plasma By Larry Bernard February 22, 2016 Tweet Widget Google Plus One Share on Facebook The Aurora Borealis (Northern Lights) (Photo by Philippe Moussette for Nasa.gov) The Aurora Borealis (Northern Lights) Gallery: NSTX interior NSTX interior W7-X plasma W7-X plasma The sun (Photo by nasa.gov) The sun It's the fourth state of matter: Solid, liquid, gas, and plasma. Plasma is a super-heated gas, so hot that its electrons get out of the atom's orbit and

  4. Development of a plasma generator for a long pulse ion source for neutral beam injectors

    SciTech Connect (OSTI)

    Watanabe, K.; Dairaku, M.; Tobari, H.; Kashiwagi, M.; Inoue, T.; Hanada, M.; Jeong, S. H.; Chang, D. H.; Kim, T. S.; Kim, B. R.; Seo, C. S.; Jin, J. T.; Lee, K. W.; In, S. R.; Oh, B. H.; Kim, J.; Bae, Y. S.

    2011-06-15

    A plasma generator for a long pulse H{sup +}/D{sup +} ion source has been developed. The plasma generator was designed to produce 65 A H{sup +}/D{sup +} beams at an energy of 120 keV from an ion extraction area of 12 cm in width and 45 cm in length. Configuration of the plasma generator is a multi-cusp bucket type with SmCo permanent magnets. Dimension of a plasma chamber is 25 cm in width, 59 cm in length, and 32.5 cm in depth. The plasma generator was designed and fabricated at Japan Atomic Energy Agency. Source plasma generation and beam extraction tests for hydrogen coupling with an accelerator of the KSTAR ion source have been performed at the KSTAR neutral beam test stand under the agreement of Japan-Korea collaborative experiment. Spatial uniformity of the source plasma at the extraction region was measured using Langmuir probes and {+-}7% of the deviation from an averaged ion saturation current density was obtained. A long pulse test of the plasma generation up to 200 s with an arc discharge power of 70 kW has been successfully demonstrated. The arc discharge power satisfies the requirement of the beam production for the KSTAR NBI. A 70 keV, 41 A, 5 s hydrogen ion beam has been extracted with a high arc efficiency of 0.9 -1.1 A/kW at a beam extraction experiment. A deuteron yield of 77% was measured even at a low beam current density of 73 mA/cm{sup 2}.

  5. Improved plasma uniformity in a discharge system with electron injection

    SciTech Connect (OSTI)

    Vizir, A. V.; Tyunkov, A. V.; Shandrikov, M. V.

    2009-02-15

    We present the results of experiments leading to improvement in bulk plasma uniformity of a constricted-arc discharge system with electron injection. The steady-state discharge was in argon, at a gas pressure of 0.5 mTorr, and operated with a main discharge voltage between 20 and 100 V and current between 3 and 15 A. The radial plasma distribution was measured with a movable Langmuir probe. We find that geometric modification of the intermediate electrode exit aperture and the main discharge cathode add little to the plasma uniformity. Improved bulk plasma uniformity is observed when a special distributing grid electrode is used and the main discharge voltage is less than 20-30 V. The application of a weakly divergent magnetic field in the region of the intermediate electrode exit aperture decreases the plasma nonuniformity from 20% to 14% over a radial distance of 30 cm. The plasma uniformity was further improved by compensating the magnetic self-field of the injected electron beam by a reverse magnetic field produced with a special electrode compensator. It is shown that an increase in discharge current causes a proportional increase in back current in the distributing electrode. The approach allows a decrease in plasma nonuniformity from 20% to 13% over a radial distance of 30 cm.

  6. Confinement Time Exceeding One Second for a Toroidal Electron Plasma

    SciTech Connect (OSTI)

    Marler, J. P.; Stoneking, M. R.

    2008-04-18

    Nearly steady-state electron plasmas are trapped in a toroidal magnetic field for the first time. We report the first results from a new toroidal electron plasma experiment, the Lawrence Non-neutral Torus II, in which electron densities on the order of 10{sup 7} cm{sup -3} are trapped in a 270 deg. toroidal arc (670 G toroidal magnetic field) by application of trapping potentials to segments of a conducting shell. The total charge inferred from measurements of the frequency of the m=1 diocotron mode is observed to decay on a 3 s time scale, a time scale that approaches the predicted limit due to magnetic pumping transport. Three seconds represents {approx_equal}10{sup 5} periods of the lowest frequency plasma mode, indicating that nearly steady-state conditions are achieved.

  7. Towards the understanding of PETN initiation by a fast, high power arc

    Office of Scientific and Technical Information (OSTI)

    source (Conference) | SciTech Connect Conference: Towards the understanding of PETN initiation by a fast, high power arc source Citation Details In-Document Search Title: Towards the understanding of PETN initiation by a fast, high power arc source We present a thorough characterization of a capacitor driven arc source that can deliver up to 200 mJ of energy to the arc and high explosive in a well-controlled, repeatable manner on the hundreds of nanoseconds time-scale. Our ultimate purpose

  8. Payroll Check Direct Deposit Authorization

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Payroll Check Direct Deposit Authorization (for LANS non-craft salary & wage payments only) Note: Direct Deposit authorizations are available through Oracle LANL Worker Self Service with A-Level access. Limit 5 Direct Deposit authorization accounts per employee Financial Institution Name: Routing/Transit Number: (requires nine digits) Account Number: Type of Account (check one): Checking Savings A separate form is required for each account transaction. Type of Transacton Deposit Type (check

  9. Advanced ST Plasma Scenario Simulations for NSTX

    SciTech Connect (OSTI)

    C.E. Kessel; E.J. Synakowski; D.A. Gates; R.W. Harvey; S.M. Kaye; T.K. Mau; J. Menard; C.K. Phillips; G. Taylor; R. Wilson; the NSTX Research Team

    2004-10-28

    Integrated scenario simulations are done for NSTX [National Spherical Torus Experiment] that address four primary milestones for developing advanced ST configurations: high {beta} and high {beta}{sub N} inductive discharges to study all aspects of ST physics in the high-beta regime; non-inductively sustained discharges for flattop times greater than the skin time to study the various current-drive techniques; non-inductively sustained discharges at high {beta} for flattop times much greater than a skin time which provides the integrated advanced ST target for NSTX; and non-solenoidal start-up and plasma current ramp-up. The simulations done here use the Tokamak Simulation Code (TSC) and are based on a discharge 109070. TRANSP analysis of the discharge provided the thermal diffusivities for electrons and ions, the neutral-beam (NB) deposition profile, and other characteristics. CURRAY is used to calculate the High Harmonic Fast Wave (HHFW) heating depositions and current drive. GENRAY/CQL3D is used to establish the heating and CD [current drive] deposition profiles for electron Bernstein waves (EBW). Analysis of the ideal-MHD stability is done with JSOLVER, BALMSC, and PEST2. The simulations indicate that the integrated advanced ST plasma is reachable, obtaining stable plasmas with {beta} {approx} 40% at {beta}{sub N}'s of 7.7-9, I{sub P} = 1.0 MA, and B{sub T} = 0.35 T. The plasma is 100% non-inductive and has a flattop of 4 skin times. The resulting global energy confinement corresponds to a multiplier of H{sub 98(y,2)} = 1.5. The simulations have demonstrated the importance of HHFW heating and CD, EBW off-axis CD, strong plasma shaping, density control, and early heating/H-mode transition for producing and optimizing these plasma configurations.

  10. Laser Plasma Interactions

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Laser Plasma Interactions Laser Plasma Interactions Understanding and controlling laser produced plasmas for fusion and basic science Contact David Montgomery (505) 665-7994 Email John Kline (505) 667-7062 Email Thomson scattering is widely used to measure plasma temperature, density, and flow velocity in laser-produced plasmas at Trident, and is also used to detect plasma waves driven by unstable and nonlinear processes. A typical configuration uses a low intensity laser beam (2nd, 3rd, or 4th

  11. High rate chemical vapor deposition of carbon films using fluorinated gases

    DOE Patents [OSTI]

    Stafford, Byron L. (Arvada, CO); Tracy, C. Edwin (Golden, CO); Benson, David K. (Golden, CO); Nelson, Arthur J. (Longmont, CO)

    1993-01-01

    A high rate, low-temperature deposition of amorphous carbon films is produced by PE-CVD in the presence of a fluorinated or other halide gas. The deposition can be performed at less than 100.degree. C., including ambient room temperature, with a radio frequency plasma assisted chemical vapor deposition process. With less than 6.5 atomic percent fluorine incorporated into the amorphous carbon film, the characteristics of the carbon film, including index of refraction, mass density, optical clarity, and chemical resistance are within fifteen percent (15%) of those characteristics for pure amorphous carbon films, but the deposition rates are high.

  12. Plasma physics | Princeton Plasma Physics Lab

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    physics Subscribe to RSS - Plasma physics The study of plasma, a partially-ionized gas that is electrically conductive and able to be confined within a magnetic field, and how it ...

  13. Plasma astrophysics | Princeton Plasma Physics Lab

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Subscribe to RSS - Plasma astrophysics A field of physics that is growing in interest ... McComas named vice president for the Princeton Plasma Physics Laboratory David McComas, an ...

  14. Self-shielding of a plasma-exposed surface during extreme transient heat loads

    SciTech Connect (OSTI)

    Zielinski, J. J.; Meiden, H. J. van der; Morgan, T. W.; Hoen, M. H. J. 't; De Temmerman, G.; Schram, D. C.

    2014-03-24

    The power deposition on a tungsten surface exposed to combined pulsed/continuous high power plasma is studied. A study of the correlation between the plasma parameters and the power deposition on the surface demonstrates the effect of particle recycling in the strongly coupled regime. Upon increasing the input power to the plasma source, the energy density to the target first increases then decreases. We suggest that the sudden outgassing of hydrogen particles from the target and their subsequent ionization causes this. This back-flow of neutrals impedes the power transfer to the target, providing a shielding of the metal surface from the intense plasma flux.

  15. Wind Measurements from Arc Scans with Doppler Wind Lidar

    SciTech Connect (OSTI)

    Wang, H.; Barthelmie, R. J.; Clifton, Andy; Pryor, S. C.

    2015-11-25

    When defining optimal scanning geometries for scanning lidars for wind energy applications, we found that it is still an active field of research. Our paper evaluates uncertainties associated with arc scan geometries and presents recommendations regarding optimal configurations in the atmospheric boundary layer. The analysis is based on arc scan data from a Doppler wind lidar with one elevation angle and seven azimuth angles spanning 30° and focuses on an estimation of 10-min mean wind speed and direction. When flow is horizontally uniform, this approach can provide accurate wind measurements required for wind resource assessments in part because of its high resampling rate. Retrieved wind velocities at a single range gate exhibit good correlation to data from a sonic anemometer on a nearby meteorological tower, and vertical profiles of horizontal wind speed, though derived from range gates located on a conical surface, match those measured by mast-mounted cup anemometers. Uncertainties in the retrieved wind velocity are related to high turbulent wind fluctuation and an inhomogeneous horizontal wind field. Moreover, the radial velocity variance is found to be a robust measure of the uncertainty of the retrieved wind speed because of its relationship to turbulence properties. It is further shown that the standard error of wind speed estimates can be minimized by increasing the azimuthal range beyond 30° and using five to seven azimuth angles.

  16. Wind Measurements from Arc Scans with Doppler Wind Lidar

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Wang, H.; Barthelmie, R. J.; Clifton, Andy; Pryor, S. C.

    2015-11-25

    When defining optimal scanning geometries for scanning lidars for wind energy applications, we found that it is still an active field of research. Our paper evaluates uncertainties associated with arc scan geometries and presents recommendations regarding optimal configurations in the atmospheric boundary layer. The analysis is based on arc scan data from a Doppler wind lidar with one elevation angle and seven azimuth angles spanning 30° and focuses on an estimation of 10-min mean wind speed and direction. When flow is horizontally uniform, this approach can provide accurate wind measurements required for wind resource assessments in part because of itsmore » high resampling rate. Retrieved wind velocities at a single range gate exhibit good correlation to data from a sonic anemometer on a nearby meteorological tower, and vertical profiles of horizontal wind speed, though derived from range gates located on a conical surface, match those measured by mast-mounted cup anemometers. Uncertainties in the retrieved wind velocity are related to high turbulent wind fluctuation and an inhomogeneous horizontal wind field. Moreover, the radial velocity variance is found to be a robust measure of the uncertainty of the retrieved wind speed because of its relationship to turbulence properties. It is further shown that the standard error of wind speed estimates can be minimized by increasing the azimuthal range beyond 30° and using five to seven azimuth angles.« less

  17. Microstructural Evolution of EGR Cooler Deposits | Department...

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Evolution of EGR Cooler Deposits Microstructural Evolution of EGR Cooler Deposits Characterize the thermo-physical properties of the deposit under different operating conditions on ...

  18. Multi-chamber deposition system

    DOE Patents [OSTI]

    Jacobson, Richard L.; Jeffrey, Frank R.; Westerberg, Roger K.

    1989-06-27

    A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

  19. Multi-chamber deposition system

    DOE Patents [OSTI]

    Jacobson, Richard L.; Jeffrey, Frank R.; Westerberg, Roger K.

    1989-10-17

    A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

  20. The effect of processing parameters on plasma sprayed beryllium for fusion applications

    SciTech Connect (OSTI)

    Castro, R.G.; Stanek, P.W.; Jacobson, L.A.; Cowgill, D.F.; Snead, L.L.

    1993-10-01

    Plasma spraying is being investigated as a potential coating technique for applying thin (0.1--5mm) layers of beryllium on plasma facing surfaces of blanket modules in ITER and also as an in-situ repair technique for repairing eroded beryllium surfaces in high heat flux divertor regions. High density spray deposits (>98% of theoretical density) of beryllium will be required in order to maximize the thermal conductivity of the beryllium coatings. A preliminary investigation was done to determine the effect of various processing parameters (particle size, particle morphology, secondary gas additions and reduced chamber pressure) on the as-deposited density of beryllium. The deposits were made using spherical beryllium feedstock powder which was produced by centrifugal atomization at Los Alamos National Laboratory (LANL). Improvements in the as-deposited densities and deposit efficiencies of the beryllium spray deposits will be discussed along with the corresponding thermal conductivity and outgassing behavior of these deposits.

  1. Deposition System Controller

    Energy Science and Technology Software Center (OSTI)

    2005-10-01

    This software is a complete thin film deposition controller. The software takes as its input a script file that dictates enablinig/disabling of sputtering power supplies, pause times, velocities and distances to move a substrate. An emulator has been created and built into the software package that can debug in advance any deposition script and decide if there is an overrun condition, accidental infinite look, and can estimate a time for completion. All necessary process variablesmore » are data logged and recorded for later inspection. This emulator currently interfaces to a Parker-Compumotor SX6 stepper moror indexer, but the software is written in such a way that it is easily modifiable for interface to othe brand and models of motor drivers. Other process I/O variables may be easily added. The software uses any multifunction DAQ card from National Instruments via their free NIDAQ API package, but again, the software is written such that othe brand DAQ cards may be used.« less

  2. Mass separation of a multicomponent plasma flow in a curvilinear magnetic field

    SciTech Connect (OSTI)

    Papernyi, V. L.; Krasov, V. I.

    2011-11-15

    The motion of a metal plasma flow of a vacuum-arc discharge in a transportation plasma-optical system with a curvilinear magnetic field is studied experimentally and numerically. The flow position at the output of the system is shown to depend on the cathode material, which determines the mass-to-charge ratio of plasma ions. As a result, the flow with a greater ion mass-to-charge ratio moves along a trajectory with a larger radius. A similar effect is observed in the case of a multicomponent plasma flow generated by a composite cathode. The results of two-fluid MHD simulations of a plasma flow propagating in a curvilinear magnetic field agree qualitatively with the experimental data.

  3. SU-E-T-568: Improving Normal Brain Sparing with Increasing Number of Arc Beams for Volume Modulated Arc Beam Radiosurgery of Multiple Brain Metastases

    SciTech Connect (OSTI)

    Hossain, S; Hildebrand, K; Ahmad, S; Larson, D; Ma, L; Sahgal, A

    2014-06-01

    Purpose: Intensity modulated arc beams have been newly reported for treating multiple brain metastases. The purpose of this study was to determine the variations in the normal brain doses with increasing number of arc beams for multiple brain metastases treatments via the TrueBeam Rapidarc system (Varian Oncology, Palo Alto, CA). Methods: A patient case with 12 metastatic brain lesions previously treated on the Leksell Gamma Knife Perfexion (GK) was used for the study. All lesions and organs at risk were contoured by a senior radiation oncologist and treatment plans for a subset of 3, 6, 9 and all 12 targets were developed for the TrueBeam Rapidarc system via 3 to 7 intensity modulated arc-beams with each target covered by at least 99% of the prescribed dose of 20 Gy. The peripheral normal brain isodose volumes as well as the total beam-on time were analyzed with increasing number of arc beams for these targets. Results: All intensisty modulated arc-beam plans produced efficient treatment delivery with the beam-on time averaging 0.6–1.5 min per lesion at an output of 1200 MU/min. With increasing number of arc beams, the peripheral normal brain isodose volumes such as the 12-Gy isodose line enclosed normal brain tissue volumes were on average decreased by 6%, 11%, 18%, and 28% for the 3-, 6-, 9-, 12-target treatment plans respectively. The lowest normal brain isodose volumes were consistently found for the 7-arc treatment plans for all the cases. Conclusion: With nearly identical beam-on times, the peripheral normal brain dose was notably decreased when the total number of intensity modulated arc beams was increased when treating multiple brain metastases. Dr Sahgal and Dr Ma are currently serving on the board of international society of stereotactic radiosurgery.

  4. Color-based tracking of plasma dust particles

    SciTech Connect (OSTI)

    Villamayor, Michelle Marie S. Soriano, Maricor N.; Ramos, Henry J.; Kato, Shuichi; Wada, Motoi

    2014-02-15

    Color-based tracking to observe agglomeration of deposited particles inside a compact planar magnetron during plasma discharge was done by creating high dynamic range (HDR) images of photos captured by a Pentax K10D digital camera. Carbon erosion and redeposition was also monitored using the technique. The HDR images were subjected to a chromaticity-based constraint discoloration inside the plasma chamber indicating film formation or carbon redeposition. Results show that dust deposition occurs first near the evacuation pumps due to the pressure gradient and then accumulates at the positively charged walls of the chamber. This method can be applied to monitor dust formation during dusty plasma experiments without major modification of plasma devices, useful especially for large fusion reactors.

  5. Temporal evolution characteristics of an annular-mode gliding arc discharge in a vortex flow

    SciTech Connect (OSTI)

    Zhao, Tian-Liang; Liu, Jing-Lin; Li, Xiao-Song; Liu, Jin-Bao; Song, Yuan-Hong; Xu, Yong; Zhu, Ai-Min

    2014-05-15

    An annular-mode gliding arc discharge powered by a 50?Hz alternating current (ac) supply was studied in a vortex flow of dry and humid air. Its temporal evolution characteristics were investigated by electrical measurement, temporally resolved imaging, and temporally resolved optical emission spectroscopic measurements. Three discharge stages of arc-ignition, arc-gliding, and arc-extinction were clearly observed in each half-cycle of the discharge. During the arc-gliding stage, the intensity of light emission from the arc root at the cathode was remarkably higher than that at other areas. The spectral intensity of N{sub 2}(C{sup 3}?{sub u}?B{sup 3}?{sub g}) during the arc-ignition stage was much higher than that during the arc-gliding stage, which was contrary to the temporal evolutions of spectral intensities for N{sub 2}{sup +}(B{sup 2}?{sub u}{sup +}?X{sup 2}?{sub g}{sup +}) and OH(A{sup 2}?{sup +}?X{sup 2}?{sub i}). Temporally resolved vibrational and rotational temperatures of N{sub 2} were also presented and decreased with increasing the water vapor content.

  6. Diamond film growth argon-carbon plasmas

    DOE Patents [OSTI]

    Gruen, D.M.; Krauss, A.R.; Liu, S.Z.; Pan, X.Z.; Zuiker, C.D.

    1998-12-15

    A method and system are disclosed for manufacturing diamond film. The method involves forming a carbonaceous vapor, providing a gas stream of argon, hydrogen and hydrocarbon and combining the gas with the carbonaceous vapor, passing the combined carbonaceous vapor and gas carrier stream into a chamber, forming a plasma in the chamber causing fragmentation of the carbonaceous and deposition of a diamond film on a substrate. 29 figs.

  7. Tunable molten oxide pool assisted plasma-melter vitrification systems

    DOE Patents [OSTI]

    Titus, Charles H.; Cohn, Daniel R.; Surma, Jeffrey E.

    1998-01-01

    The present invention provides tunable waste conversion systems and apparatus which have the advantage of highly robust operation and which provide complete or substantially complete conversion of a wide range of waste streams into useful gas and a stable, nonleachable solid product at a single location with greatly reduced air pollution to meet air quality standards. The systems provide the capability for highly efficient conversion of waste into high quality combustible gas and for high efficiency conversion of the gas into electricity by utilizing a high efficiency gas turbine or an internal combustion engine. The solid product can be suitable for various commercial applications. Alternatively, the solid product stream, which is a safe, stable material, may be disposed of without special considerations as hazardous material. In the preferred embodiment, the arc plasma furnace and joule heated melter are formed as a fully integrated unit with a common melt pool having circuit arrangements for the simultaneous independently controllable operation of both the arc plasma and the joule heated portions of the unit without interference with one another. The preferred configuration of this embodiment of the invention utilizes two arc plasma electrodes with an elongated chamber for the molten pool such that the molten pool is capable of providing conducting paths between electrodes. The apparatus may additionally be employed with reduced use or without further use of the gases generated by the conversion process. The apparatus may be employed as a net energy or net electricity producing unit where use of an auxiliary fuel provides the required level of electricity production. Methods and apparatus for converting metals, non-glass forming waste streams and low-ash producing inorganics into a useful gas are also provided. The methods and apparatus for such conversion include the use of a molten oxide pool having predetermined electrical, thermal and physical characteristics capable of maintaining optimal joule heating and glass forming properties during the conversion process.

  8. Direct Deposit Form | Department of Energy

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    Direct Deposit Form Direct Deposit Form PDF icon Direct Deposit Form More Documents & Publications Employee In-Processing Forms Agreement for Minority Financial Institutions Participation in the Bank Deposit Financial Assistance Program Financial Management Handbook

  9. Plasma sweeper. [Patents

    DOE Patents [OSTI]

    Motley, R.W.; Glanz, J.

    1982-10-25

    A device is described for coupling RF power (a plasma sweeper) from RF power introducing means to a plasma having a magnetic field associated therewith comprises at least one electrode positioned near the plasma and near the RF power introducing means. Means are described for generating a static electric field at the electrode directed into the plasma and having a component substantially perpendicular to the plasma magnetic field such that a non-zero vector cross-product of the electric and magnetic fields exerts a force on the plasma causing the plasma to drift.

  10. Can surface cracks and unipolar arcs explain breakdown and gradient limits?

    SciTech Connect (OSTI)

    Insepov, Zeke; Norem, Jim

    2013-01-15

    The authors argue that the physics of unipolar arcs and surface cracks can help understand rf breakdown and vacuum arc data. They outline a model of the basic mechanisms involved in breakdown and explore how the physics of unipolar arcs and cracks can simplify the picture of breakdown and gradient limits in accelerators, tokamaks as well as laser ablation, micrometeorites, and other applications. Cracks are commonly seen in SEM images of arc damage and they are produced as the liquid metal cools. They can produce the required field enhancements to explain field emission data and can produce mechanical failure of the surface that would trigger breakdown events. Unipolar arcs can produce currents sufficient to short out rf structures, and can cause the sort of damage seen in SEM images. They should be unstable, and possibly self-quenching, as seen in optical fluctuations and surface damage. The authors describe some details and consider the predictions of this simple model.

  11. New focusing multilayer structures for X-ray plasma spectroscopy

    SciTech Connect (OSTI)

    Bibishkin, M S; Luchin, V I; Salashchenko, N N; Chernov, V V; Chkhalo, N I; Kazakov, E D; Shevelko, A P

    2008-02-28

    New focusing short-period multilayer structures are developed which opens up wide possibilities for X-ray and VUV spectroscopy. Multilayer structures are deposited on a flat surface of a mica crystal which is then bent to a small-radius cylinder. The use of this structure in a von Hamos spectrometer for X-ray laser plasma diagnostics is demonstrated. (interaction of laser radiation with matter. laser plasma)

  12. Characterization of an RF plasma ion source for ion implantation

    SciTech Connect (OSTI)

    Kopalidis, Peter M.; Wan Zhimin

    2012-11-06

    A novel inductively coupled RF plasma ion source has been developed for use in a beamline ion implanter. Ion density data have been taken with an array of four Langmuir probes spaced equally at the source extraction arc slit. These provide ion density uniformity information as a function of source pressure, RF power and gas mixture composition. In addition, total extracted ion beam current data are presented for the same conditions. The comparative advantages of the RF source in terms of higher beam current, reduced maintenance and overall productivity improvement compared to a hot cathode source are discussed.

  13. Gas-tungsten arc welding of aluminum alloys

    DOE Patents [OSTI]

    Frye, L.D.

    1982-03-25

    The present invention is directed to a gas-tungsten arc welding method for joining together structures formed of aluminum alloy with these structures disposed contiguously to a heat-damagable substrate of a metal dissimilar to the aluminum alloy. The method of the present invention is practiced by diamond machining the fay surfaces of the aluminum alloy structures to profice a mirror finish thereon having a surface roughness in the order of about one microinch. The fay surface are aligned and heated sufficiently by the tungsten electrode to fuse the aluminum alloy continguous to the fay surfaces to effect the weld joint. The heat input used to provide an oxide-free weld is significantly less than that required if the fay surfaces were prepared by using conventional chemical and mechanical practices.

  14. Recent progress on gas tungsten arc welding of vanadium alloys

    SciTech Connect (OSTI)

    Grossbeck, M.L.; King, J.F.; Alexander, D.J.

    1997-08-01

    Emphasis has been placed on welding 6.4 mm plate, primarily by gas tungsten arc (GTA) welding. The weld properties were tested using blunt notch Charpy testing to determine the ductile to brittle transition temperature (DBTT). Erratic results were attributed to hydrogen and oxygen contamination of the welds. An improved gas clean-up system was installed on the welding glove box and the resulting high purity welds had Charpy impact properties similar to those of electron beam welds with similar grain size. A post-weld heat treatment (PWHT) of 950{degrees}C for two hours did not improve the properties of the weld in cases where low concentrations of impurities were attained. Further improvements in the gas clean-up system are needed to control hydrogen contamination.

  15. Langmuir probe measurements in a time-fluctuating-highly ionized non-equilibrium cutting arc: Analysis of the electron retarding part of the time-averaged current-voltage characteristic of the probe

    SciTech Connect (OSTI)

    Prevosto, L.; Mancinelli, B.; Kelly, H.; Instituto de Física del Plasma , Departamento de Física, Facultad de Ciencias Exactas y Naturales Ciudad Universitaria Pab. I, 1428 Buenos Aires

    2013-12-15

    This work describes the application of Langmuir probe diagnostics to the measurement of the electron temperature in a time-fluctuating-highly ionized, non-equilibrium cutting arc. The electron retarding part of the time-averaged current-voltage characteristic of the probe was analysed, assuming that the standard exponential expression describing the electron current to the probe in collision-free plasmas can be applied under the investigated conditions. A procedure is described which allows the determination of the errors introduced in time-averaged probe data due to small-amplitude plasma fluctuations. It was found that the experimental points can be gathered into two well defined groups allowing defining two quite different averaged electron temperature values. In the low-current region the averaged characteristic was not significantly disturbed by the fluctuations and can reliably be used to obtain the actual value of the averaged electron temperature. In particular, an averaged electron temperature of 0.98 ± 0.07 eV (= 11400 ± 800 K) was found for the central core of the arc (30 A) at 3.5 mm downstream from the nozzle exit. This average included not only a time-average over the time fluctuations but also a spatial-average along the probe collecting length. The fitting of the high-current region of the characteristic using such electron temperature value together with the corrections given by the fluctuation analysis showed a relevant departure of local thermal equilibrium in the arc core.

  16. Momentum Deposition in Curvilinear Coordinates

    SciTech Connect (OSTI)

    Cleveland, Mathew Allen; Lowrie, Robert Byron; Rockefeller, Gabriel M.; Thompson, Kelly Glen; Wollaber, Allan Benton

    2015-08-03

    The momentum imparted into a material by thermal radiation deposition is an important physical process in astrophysics and inertial confinement fusion (ICF) simulations. In recent work we presented a new method of evaluating momentum deposition that relies on the combination of a time-averaged approximation and a numerical integration scheme. This approach robustly and efficiently evaluates the momentum deposition in spherical geometry. Future work will look to extend this approach to 2D cylindrical geometries.

  17. Success Story: Chrome Deposit Corporation

    Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

    continued > Success Story: Chrome Deposit Corporation Despite Growth, Chrome Deposit Corporation Reduces Its Energy Use, Minimizes Its Environmental Impact, and Improves Its Energy- Management Practices Tucked away in a nondescript industrial park off the I-95 corridor, Chrome Deposit Corporation's (CDC's) Newark, Delaware, manufacturing facility is a small site that is making big changes. The Delaware Manufacturing Extension Partnership (DEMEP)-a nonproft resource organization that provides

  18. Carbonate Deposition | Open Energy Information

    Open Energy Info (EERE)

    Alteration Products Carbonate deposits come in many forms and sometimes develop into spectacular colorful terraces such as these at Mammoth Hot Springs in Yellowstone National...

  19. Atomic oxygen flux determined by mixed-phase Ag/Ag2O deposition

    SciTech Connect (OSTI)

    Kaspar, Tiffany C.; Droubay, Timothy C.; Chambers, Scott A.

    2010-11-01

    The flux of atomic oxygen generated in a electron cyclotron resonance (ECR) microwave plasma source was quantified by two different methods. The commonly applied approach of monitoring the frequency change of a silver-coated quartz crystal microbalance (QCM) deposition rate monitor as the silver is oxidized was found to underestimate the atomic oxygen flux by an order of magnitude compared to a more direct deposition approach. In the mixed-phase Ag/Ag2O deposition method, silver films were deposited in the presence of the plasma such that the films were partially oxidized to Ag2O; x-ray photoelectron spectroscopy (XPS) was utilized for quantification of the oxidized fraction. The inaccuracy of the QCM oxidation method was tentatively attributed to efficient catalytic recombination of O atoms on the silver surface.

  20. 2013 Plasma Camp | Princeton Plasma Physics Lab

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Plasma Camp View larger image View larger image View larger image View larger image View larger image View larger image View larger image