Sample records for arc plasma deposition

  1. Vacuum arc deposition devices

    SciTech Connect (OSTI)

    Boxman, R.L.; Zhitomirsky, V.N. [Electrical Discharge and Plasma Laboratory, Faculty of Engineering, Tel Aviv University, P.O. Box 39040, Tel Aviv 69978 (Israel)

    2006-02-15T23:59:59.000Z

    The vacuum arc is a high-current, low-voltage electrical discharge which produces a plasma consisting of vaporized and ionized electrode material. In the most common cathodic arc deposition systems, the arc concentrates at minute cathode spots on the cathode surface and the plasma is emitted as a hypersonic jet, with some degree of contamination by molten droplets [known as macroparticles (MPs)] of the cathode material. In vacuum arc deposition systems, the location and motion of the cathode spots are confined to desired surfaces by an applied magnetic field and shields around undesired surfaces. Substrates are mounted on a holder so that they intercept some portion of the plasma jet. The substrate often provides for negative bias to control the energy of depositing ions and heating or cooling to control the substrate temperature. In some systems, a magnetic field is used to guide the plasma around an obstacle which blocks the MPs. These elements are integrated with a deposition chamber, cooling, vacuum gauges and pumps, and power supplies to produce a vacuum arc deposition system.

  2. Filters for cathodic arc plasmas

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA); MacGill, Robert A. (Richmond, CA); Bilek, Marcela M. M. (Engadine, AU); Brown, Ian G. (Berkeley, CA)

    2002-01-01T23:59:59.000Z

    Cathodic arc plasmas are contaminated with macroparticles. A variety of magnetic plasma filters has been used with various success in removing the macroparticles from the plasma. An open-architecture, bent solenoid filter, with additional field coils at the filter entrance and exit, improves macroparticle filtering. In particular, a double-bent filter that is twisted out of plane forms a very compact and efficient filter. The coil turns further have a flat cross-section to promote macroparticle reflection out of the filter volume. An output conditioning system formed of an expander coil, a straightener coil, and a homogenizer, may be used with the magnetic filter for expanding the filtered plasma beam to cover a larger area of the target. A cathodic arc plasma deposition system using this filter can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

  3. Miniaturized cathodic arc plasma source

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA); MacGill, Robert A. (Richmond, CA)

    2003-04-15T23:59:59.000Z

    A cathodic arc plasma source has an anode formed of a plurality of spaced baffles which extend beyond the active cathode surface of the cathode. With the open baffle structure of the anode, most macroparticles pass through the gaps between the baffles and reflect off the baffles out of the plasma stream that enters a filter. Thus the anode not only has an electrical function but serves as a prefilter. The cathode has a small diameter, e.g. a rod of about 1/4 inch (6.25 mm) diameter. Thus the plasma source output is well localized, even with cathode spot movement which is limited in area, so that it effectively couples into a miniaturized filter. With a small area cathode, the material eroded from the cathode needs to be replaced to maintain plasma production. Therefore, the source includes a cathode advancement or feed mechanism coupled to cathode rod. The cathode also requires a cooling mechanism. The movable cathode rod is housed in a cooled metal shield or tube which serves as both a current conductor, thus reducing ohmic heat produced in the cathode, and as the heat sink for heat generated at or near the cathode. Cooling of the cathode housing tube is done by contact with coolant at a place remote from the active cathode surface. The source is operated in pulsed mode at relatively high currents, about 1 kA. The high arc current can also be used to operate the magnetic filter. A cathodic arc plasma deposition system using this source can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

  4. E-Print Network 3.0 - arc plasma deposition Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Notes Summary: Introduction to Plasma Physics C17 Lecture Notes John Howard Plasma Research Laboratory Research... 12;2 12;Contents 1 BASIC PLASMA PHENOMENA 7 1.1 What is...

  5. Cathodic Arc Plasma Deposition

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth7-1D: Vegetation Proposed New Substation Sites ProposedOccupational Healthcatalysts . |

  6. Purification of tantalum by plasma arc melting

    DOE Patents [OSTI]

    Dunn, Paul S. (Santa Fe, NM); Korzekwa, Deniece R. (Los Alamos, NM)

    1999-01-01T23:59:59.000Z

    Purification of tantalum by plasma arc melting. The level of oxygen and carbon impurities in tantalum was reduced by plasma arc melting the tantalum using a flowing plasma gas generated from a gas mixture of helium and hydrogen. The flowing plasma gases of the present invention were found to be superior to other known flowing plasma gases used for this purpose.

  7. Plasma arc torch with coaxial wire feed

    DOE Patents [OSTI]

    Hooper, Frederick M (Albuquerque, NM)

    2002-01-01T23:59:59.000Z

    A plasma arc welding apparatus having a coaxial wire feed. The apparatus includes a plasma arc welding torch, a wire guide disposed coaxially inside of the plasma arc welding torch, and a hollow non-consumable electrode. The coaxial wire guide feeds non-electrified filler wire through the tip of the hollow non-consumable electrode during plasma arc welding. Non-electrified filler wires as small as 0.010 inches can be used. This invention allows precision control of the positioning and feeding of the filler wire during plasma arc welding. Since the non-electrified filler wire is fed coaxially through the center of the plasma arc torch's electrode and nozzle, the wire is automatically aimed at the optimum point in the weld zone. Therefore, there is no need for additional equipment to position and feed the filler wire from the side before or during welding.

  8. Plasma arc melting of zirconium

    SciTech Connect (OSTI)

    Tubesing, P.K.; Korzekwa, D.R.; Dunn, P.S.

    1997-12-31T23:59:59.000Z

    Zirconium, like some other refractory metals, has an undesirable sensitivity to interstitials such as oxygen. Traditionally, zirconium is processed by electron beam melting to maintain minimum interstitial contamination. Electron beam melted zirconium, however, does not respond positively to mechanical processing due to its large grain size. The authors undertook a study to determine if plasma arc melting (PAM) technology could be utilized to maintain low interstitial concentrations and improve the response of zirconium to subsequent mechanical processing. The PAM process enabled them to control and maintain low interstitial levels of oxygen and carbon, produce a more favorable grain structure, and with supplementary off-gassing, improve the response to mechanical forming.

  9. Modeling of thermal plasma arc technology FY 1994 report

    SciTech Connect (OSTI)

    Hawkes, G.L.; Nguyen, H.D.; Paik, S.; McKellar, M.G.

    1995-03-01T23:59:59.000Z

    The thermal plasma arc process is under consideration to thermally treat hazardous and radioactive waste. A computer model for the thermal plasma arc technology was designed as a tool to aid in the development and use of the plasma arc-Joule beating process. The value of this computer model is to: (a) aid in understanding the plasma arc-Joule beating process as applied to buried waste or exhumed buried waste, (b) help design melter geometry and electrode configuration, (c) calculate the process capability of vitrifying waste (i.e., tons/hour), (d) develop efficient plasma and melter operating conditions to optimize the process and/or reduce safety hazards, (e) calculate chemical reactions during treatment of waste to track chemical composition of off-gas products, and composition of final vitrified waste form and (f) help compare the designs of different plasma-arc facilities. A steady-state model of a two-dimensional axisymmetric transferred plasma arc has been developed and validated. A parametric analysis was performed that studied the effects of arc length, plasma gas composition, and input power on the temperatures and velocity profiles of the slag and plasma gas. A two-dimensional transient thermo-fluid model of the US Bureau of Mines plasma arc melter has been developed. This model includes the growth of a slag pool. The thermo-fluid model is used to predict the temperature and pressure fields within a plasma arc furnace. An analysis was performed to determine the effects of a molten metal pool on the temperature, velocity, and voltage fields within the slag. A robust and accurate model for the chemical equilibrium calculations has been selected to determine chemical composition of final waste form and off-gas based on the temperatures and pressures within the plasma-arc furnace. A chemical database has been selected. The database is based on the materials to be processed in the plasma arc furnaces.

  10. E-Print Network 3.0 - arc plasma method Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Arc System Summary: of the most promising directions. The method of plasma pyrolysis and gasification, where at waste processing... -6. High-current electric arcs or electric arc...

  11. ABSTRACT. Keyhole plasma arc welding is a unique arc welding process for deep

    E-Print Network [OSTI]

    Zhang, YuMing

    ABSTRACT. Keyhole plasma arc welding is a unique arc welding process for deep penetration. To ensure the quality of the welds, the presence of the keyhole is crit- ical. Understanding of the keyhole will certainly benefit the improvement of the process and weld quality. Currently, the size of the keyhole

  12. Acoustic stabilization of electric arc instabilities in nontransferred plasma torches

    SciTech Connect (OSTI)

    Rat, V.; Coudert, J. F. [CNRS, University of Limoges, SPTCS UMR6638, 123 Avenue A. Thomas, 87060 Limoges Cedex (France)

    2010-03-08T23:59:59.000Z

    Electric arc instabilities in dc plasma torches lead to nonhomogeneous treatments of nanosized solid particles or liquids injected within thermal plasma jets. This paper shows that an additional acoustic resonator mounted on the cathode cavity allows reaching a significant damping of these instabilities, particularly the Helmholtz mode of arc oscillations. The acoustic resonator is coupled with the Helmholtz resonator of the plasma torch limiting the amplitude of arc voltage variations. It is also highlighted that this damping is dependent on friction effects in the acoustic resonator.

  13. E-Print Network 3.0 - arc plasma guns Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    guns Search Powered by Explorit Topic List Advanced Search Sample search results for: arc plasma guns...

  14. E-Print Network 3.0 - arc deposition technology Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    role in the Summary: deposition 2 and filtered cathodic vacuum arc 3.such as optical window coatings, scratch resistive... by different types of vapor deposition...

  15. Plasma Chemistry and Plasma Processing, Vol. 12, No.4, 1992 Infrared Radiation from an Arc Plasma and Its

    E-Print Network [OSTI]

    Eagar, Thomas W.

    Plasma and Its Application to Plasma Diagnostics Takayoshi Ohji1 and Thomas W. Eagar Received May 16 ifinfraredradiation from an arc plasma can fie used for diagnostic purposes. Tire properties of IR radiation to be solved in arc plasma diagnostics. For example, the spectro- s~opic method, while powerful, requires

  16. E-Print Network 3.0 - anodic arc plasma Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    SCIENCE, VOL. 33, NO. 1, FEBRUARY 2005 Gliding Arc Discharges... for their application to plasma-chemical processes. Diagnostics of gliding arc discharge: electron temperature,...

  17. Plasma-Therm Workshop: Fundamentals of Plasma Processing (Etching & Deposition)

    E-Print Network [OSTI]

    Martin, Jan M.L.

    The workshop will focus on the fundamentals of plasma etching and deposition. Lectures will includePlasma-Therm Workshop: Fundamentals of Plasma Processing (Etching & Deposition) Nanofabrication an introduction to vacuum technology, the basics of plasma and plasma reactors and an overview of mechanisms

  18. Pulse thermal processing of functional materials using directed plasma arc

    DOE Patents [OSTI]

    Ott, Ronald D. (Knoxville, TN); Blue, Craig A. (Knoxville, TN); Dudney, Nancy J. (Knoxville, TN); Harper, David C. (Kingston, TN)

    2007-05-22T23:59:59.000Z

    A method of thermally processing a material includes exposing the material to at least one pulse of infrared light emitted from a directed plasma arc to thermally process the material, the pulse having a duration of no more than 10 s.

  19. E-Print Network 3.0 - arc plasma furnace Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    PLASMA PHYSICS AND ENGINEERING Summary: replace costly traditional technologies as incineration and conventional plasma arc furnaces, and provide... ASSOCIATED LABORATORY ON...

  20. Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective

    SciTech Connect (OSTI)

    Anders, Andre

    2007-02-28T23:59:59.000Z

    Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."

  1. Liquid injection plasma deposition method and apparatus

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID); Watkins, Arthur D. (Idaho Falls, ID)

    1999-01-01T23:59:59.000Z

    A liquid injection plasma torch deposition apparatus for depositing material onto a surface of a substrate may comprise a plasma torch for producing a jet of plasma from an outlet nozzle. A plasma confinement tube having an inlet end and an outlet end and a central bore therethrough is aligned with the outlet nozzle of the plasma torch so that the plasma jet is directed into the inlet end of the plasma confinement tube and emerges from the outlet end of the plasma confinement tube. The plasma confinement tube also includes an injection port transverse to the central bore. A liquid injection device connected to the injection port of the plasma confinement tube injects a liquid reactant mixture containing the material to be deposited onto the surface of the substrate through the injection port and into the central bore of the plasma confinement tube.

  2. Tribological performance of hybrid filtered arc-magnetron coatings - Part I: Coating deposition process and basic coating properties characterization

    SciTech Connect (OSTI)

    Gorokhovsky, Vladimir; Bowman, C.; Gannon, Paul E.; VanVorous, D.; Voevodin, A. A.; Rutkowski, A.; Muratore, C.; Smith, Richard J.; Kayani, Asghar N.; Gelles, David S.; Shutthanandan, V.; Trusov, B. G.

    2006-12-04T23:59:59.000Z

    Aircraft propulsion applications require low-friction and wear resistant surfaces that operate under high contact loads in severe environments. Recent research on supertough and low friction nanocomposite coatings produced with hybrid plasma deposition processes was demonstrated to have a high potential for such demanding applications. However, industrially scalable hybrid plasma technologies are needed for their commercial realization. The Large area Filtered Arc Deposition (LAFAD) process provides atomically smooth coatings at high deposition rates over large surface areas. The LAFAD technology allows functionally graded, multilayer, super-lattice and nanocomposite architectures of multi-elemental coatings via electro-magnetic mixing of two plasma flows composed of different metal ion vapors. Further advancement can be realized through a combinatorial process using a hybrid filtered arc-magnetron deposition system. In the present study, multilayer and nanostructured TiCrCN/TiCr +TiBC composite cermet coatings were deposited by the hybrid filtered arc-magnetron process. Filtered plasma streams from arc evaporated Ti and Cr targets, and two unbalanced magnetron sputtered B4C targets, were directed to the substrates in the presence of reactive gases. A multiphase nanocomposite coating architecture was designed to provide the optimal combination of corrosion and wear resistance of advanced steels (Pyrowear 675) used in aerospace bearing and gear applications. Coatings were characterized using SEM/EDS, XPS and RBS for morphology and chemistry, XRD and TEM for structural analyses, wafer curvature and nanoindentation for stress and mechanical properties, and Rockwell and scratch indentions for adhesion. Coating properties were evaluated for a variety of coating architectures. Thermodynamic modeling was used for estimation of phase composition of the top TiBC coating segment. Correlations between coating chemistry, structure and mechanical properties are discussed.

  3. Comparative Analysis of Carbon Plasma in Arc and RF Reactors

    SciTech Connect (OSTI)

    Todorovic-Markovic, B.; Markovic, Z. ['Vinca' Institute of Nuclear Sciences, P.O.B. 522, 11001 Belgrade (Serbia and Montenegro); Mohai, I.; Szepvolgyi, J. [Research Laboratory of Materials and Environmental Chemistry, Chemical Research Center, Hungarian Academy of Sciences H-1525 Budapest, POB 17 (Hungary)

    2004-12-01T23:59:59.000Z

    Results on studies of molecular spectra emitted in the initial stages of fullerene formation during the processing of graphite powder in induction RF reactor and evaporation of graphite electrodes in arc reactor are presented in this paper. It was found that C2 radicals were dominant molecular species in both plasmas. C2 radicals have an important role in the process of fullerene synthesis. The rotational-vibrational temperatures of C2 and CN species were calculated by fitting the experimental spectra to the simulated ones. The results of optical emission study of C2 radicals generated in carbon arc plasma have shown that rotational temperature of C2 species depends on carbon concentration and current intensity significantly. The optical emission study of induction RF plasma and SEM analysis of graphite powder before and after plasma treatment have shown that evaporation of the processed graphite powder depends on feed rate and composition of gas phase significantly. Based on the obtained results, it was concluded that in the plasma region CN radicals could be formed by the reaction of C2 species with atomic nitrogen at smaller loads. At larger feed rate of graphite powder, CN species were produced by surface reaction of the hot carbon particles with nitrogen atoms. The presence of nitrogen in induction RF plasma reduces the fullerene yield significantly. The fullerene yield obtained in two different reactors was: 13% in arc reactor and 4.1% in induction RF reactor. However, the fullerene production rate was higher in induction RF reactor-6.4 g/h versus 1.7 g/h in arc reactor.

  4. Direct Modeling of Material Deposit and Identification of Energy Transfer in Gas Metal Arc Welding

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Direct Modeling of Material Deposit and Identification of Energy Transfer in Gas Metal Arc Welding sources for finite element simulation of gas metal arc welding (GMAW). Design for the modeling of metal deposition results in a direct calculation of the formation of the weld bead, without any

  5. Optical emission spectroscopy of metal vapor dominated laser-arc hybrid welding plasma

    SciTech Connect (OSTI)

    Ribic, B.; DebRoy, T. [Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States); Burgardt, P. [Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

    2011-04-15T23:59:59.000Z

    During laser-arc hybrid welding, plasma properties affect the welding process and the weld quality. However, hybrid welding plasmas have not been systematically studied. Here we examine electron temperatures, species densities, and electrical conductivity for laser, arc, and laser-arc hybrid welding using optical emission spectroscopy. The effects of arc currents and heat source separation distances were examined because these parameters significantly affect weld quality. Time-average plasma electron temperatures, electron and ion densities, electrical conductivity, and arc stability decrease with increasing heat source separation distance during hybrid welding. Heat source separation distance affects these properties more significantly than the arc current within the range of currents considered. Improved arc stability and higher electrical conductivity of the hybrid welding plasma result from increased heat flux, electron temperatures, electron density, and metal vapor concentrations relative to arc or laser welding.

  6. E-Print Network 3.0 - arc plasma source Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    UPDATE A newsletter from the Summary: was built at FCIPT for studying SpacecraftSolar panel - Plasma' interactions that can lead to arcing... which lead to arcing. The range of...

  7. Ultrathin diamond-like carbon films deposited by filtered carbon vacuum arcs

    SciTech Connect (OSTI)

    Anders, Andre; Fong, Walton; Kulkarni, Ashok; Ryan, Francis W.; Bhatia, C. Singh

    2001-07-13T23:59:59.000Z

    Ultrathin (< 5 nm) hard carbon films are of great interest to the magnetic storage industry as the areal density approaches 100 Gbit/in{sup 2}. These films are used as overcoats to protect the magnetic layers on disk media and the active elements of the read-write slider. Tetrahedral amorphous carbon films can be produced by filtered cathodic arc deposition, but the films will only be accepted by the storage industry only if the ''macroparticle'' issue has been solved. Better plasma filters have been developed over recent years. Emphasis is put on the promising twist filter system - a compact, open structure that operates with pulsed arcs and high magnetic field. Based on corrosion tests it is shown that the macroparticle reduction by the twist filter is satisfactory for this demanding application, while plasma throughput is very high. Ultrathin hard carbon films have been synthesized using S-filter and twist filter systems. Film properties such as hardness, elastic modulus, wear, and corrosion resistance have been tested.

  8. Plasma arc melting of titanium-tantalum alloys

    SciTech Connect (OSTI)

    Dunn, P.; Patterson, R.A. [Los Alamos National Lab., NM (United States); Haun, R. [Retech, Inc., Ukiah, CA (United States)

    1994-08-01T23:59:59.000Z

    Los Alamos has several applications for high temperature, oxidation and liquid-metal corrosion resistant materials. Further, materials property constraints are dictated by a requirement to maintain low density; e.g., less than the density of stainless steel. Liquid metal compatibility and density requirements have driven the research toward the Ti-Ta system with an upper bound of 60 wt% Ta-40 wt% Ti. Initial melting of these materials was performed in a small button arc melter with several hundred grams of material; however, ingot quantities were soon needed. But, refractory metal alloys whose constituents possess very dissimilar densities, melting temperatures and vapor pressures pose significant difficulty and require specialized melting practices. The Ti-Ta alloys fall into this category with the density of tantalum 16.5 g/cc and that of titanium 4.5 g/cc. Melting is further complicated by the high melting point of Ta(3020 C) and the relatively low boiling point of Ti(3287 C). Previous electron beam melting experience with these materials resulted, in extensive vaporization of the titanium and poor chemical homogeneity. Vacuum arc remelting(VAR) was considered as a melting candidate and discarded due to density and vapor pressure issues associated with electron beam. Plasma arc melting offered the ability to supply a cover gas to deal with vapor pressure issues as well as solidification control to help with macrosegregation in the melt and has successfully produced high quality ingots of the Ti-Ta alloys.

  9. E-Print Network 3.0 - arc discharge plasma Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    by Explorit Topic List Advanced Search Sample search results for: arc discharge plasma Page: << < 1 2 3 4 5 > >> 1 author's e-mail: hirai@plasma.ecei.tohoku.ac.jp...

  10. Method of operating a centrifugal plasma arc furnace

    DOE Patents [OSTI]

    Kujawa, Stephan T. (Butte, MT); Battleson, Daniel M. (Butte, MT); Rademacher, Jr., Edward L. (Butte, MT); Cashell, Patrick V. (Butte, MT); Filius, Krag D. (Butte, MT); Flannery, Philip A. (Ramsey, MT); Whitworth, Clarence G. (Butte, MT)

    1998-01-01T23:59:59.000Z

    A centrifugal plasma arc furnace is used to vitrify contaminated soils and other waste materials. An assessment of the characteristics of the waste is performed prior to introducing the waste into the furnace. Based on the assessment, a predetermined amount of iron is added to each batch of waste. The waste is melted in an oxidizing atmosphere into a slag. The added iron is oxidized into Fe.sub.3 O.sub.4. Time of exposure to oxygen is controlled so that the iron does not oxidize into Fe.sub.2 O.sub.3. Slag in the furnace remains relatively non-viscous and consequently it pours out of the furnace readily. Cooled and solidified slag produced by the furnace is very resistant to groundwater leaching. The slag can be safely buried in the earth without fear of contaminating groundwater.

  11. Method of operating a centrifugal plasma arc furnace

    DOE Patents [OSTI]

    Kujawa, S.T.; Battleson, D.M.; Rademacher, E.L. Jr.; Cashell, P.V.; Filius, K.D.; Flannery, P.A.; Whitworth, C.G.

    1998-03-24T23:59:59.000Z

    A centrifugal plasma arc furnace is used to vitrify contaminated soils and other waste materials. An assessment of the characteristics of the waste is performed prior to introducing the waste into the furnace. Based on the assessment, a predetermined amount of iron is added to each batch of waste. The waste is melted in an oxidizing atmosphere into a slag. The added iron is oxidized into Fe{sub 3}O{sub 4}. Time of exposure to oxygen is controlled so that the iron does not oxidize into Fe{sub 2}O{sub 3}. Slag in the furnace remains relatively non-viscous and consequently it pours out of the furnace readily. Cooled and solidified slag produced by the furnace is very resistant to groundwater leaching. The slag can be safely buried in the earth without fear of contaminating groundwater. 3 figs.

  12. The evolution of ion charge states in cathodic vacuum arc plasmas: a review

    SciTech Connect (OSTI)

    Anders, Andre

    2011-12-18T23:59:59.000Z

    Cathodic vacuum arc plasmas are known to contain multiply charged ions. 20 years after “Pressure Ionization: its role in metal vapour vacuum arc plasmas and ion sources” appeared in vol. 1 of Plasma Sources Science and Technology, it is a great opportunity to re-visit the issue of pressure ionization, a non-ideal plasma effect, and put it in perspective to the many other factors that influence observable charge state distributions, such as the role of the cathode material, the path in the density-temperature phase diagram, the “noise” in vacuum arc plasma as described by a fractal model approach, the effects of external magnetic fields and charge exchange collisions with neutrals. A much more complex image of the vacuum arc plasma emerges putting decades of experimentation and modeling in perspective.

  13. arc deposition system: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    preserve sufficient shielding that the peak power deposition everywhere in the superconduct- ing magnets requires an array of cryogenically cooled superconducting (SC) coils...

  14. Spatial and time-dependent distribution of plasma parameters in the metal-halide arc lamp.

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Spatial and time-dependent distribution of plasma parameters in the metal-halide arc lamp. A. Khakhaev, L. Luizova, K. Ekimov and A. Soloviev Petrozavodsk State University, Russia The metal-halide arc lamp is an effective light source and its investigation has a long history, but even at present some

  15. High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition

    SciTech Connect (OSTI)

    Anders, Andre

    2009-09-01T23:59:59.000Z

    High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

  16. E-Print Network 3.0 - assisted plasma arc Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Groupe d'Optique Atomique Collection: Physics 8 Gliding arc in tornado using a reverse vortex flow Chiranjeev S. Kalra, Young I. Cho,a Summary: . Instead the ignition was plasma...

  17. Spectroscopic characterization and imaging of laser- and unipolar arc-induced plasmas

    SciTech Connect (OSTI)

    Aussems, Damien U. B., E-mail: d.aussems@differ.nl [FOM Institute DIFFER—Dutch Institute for Fundamental Energy Research, Nieuwegein, NL-3430 BE (Netherlands); Nishijima, Daisuke; Brandt, Christian; Doerner, Russell P. [Center for Energy Research, University of California at San Diego, 9500 Gilman Drive, La Jolla, California 92093-0417 (United States); Cardozo, Niek J. Lopes [Science and Technology of Nuclear Fusion, Eindhoven University of Technology, Eindhoven 5612 AZ (Netherlands)

    2014-08-14T23:59:59.000Z

    Tungsten plasmas induced by unipolar arcs were investigated using optical emission spectroscopy and imaging, and compared with laser-induced tungsten plasmas. The unipolar arcs were initiated in the linear-plasma simulator PISCES-A at UCSD under fusion relevant conditions. The electron temperature and density of the unipolar arc plasmas were in the range 0.5–0.7?eV and 0.7–2.0?×?10{sup 20?}m{sup ?3}, respectively, and increased with increasing negative bias voltage, but did not correlate with the surface temperature. In comparison, the electron temperature and density of the laser-induced plasmas were in the range 0.6–1.4?eV and 7?×?10{sup 19}–1?×?10{sup 22?}m{sup ?3}, respectively.

  18. arc plasma torch: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summary: periodA, sagitta in dipoles dipSag." arc2Table::usage "arc2Table R,cirC,pA,pL,phA,,, prints a table periodA, sagitta in dipoles dipSag." Begin "Private"...

  19. arc plasma torches: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summary: periodA, sagitta in dipoles dipSag." arc2Table::usage "arc2Table R,cirC,pA,pL,phA,,, prints a table periodA, sagitta in dipoles dipSag." Begin "Private"...

  20. Glow discharge plasma deposition of thin films

    DOE Patents [OSTI]

    Weakliem, Herbert A. (Pennington, NJ); Vossen, Jr., John L. (Bridgewater, NJ)

    1984-05-29T23:59:59.000Z

    A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.

  1. Mechanism of Synthesis of Ultra-Long Single Wall Carbon Nanotubes in Arc Discharge Plasma

    SciTech Connect (OSTI)

    Keidar, Michael [George Washington University] [George Washington University

    2013-06-23T23:59:59.000Z

    In this project fundamental issues related to synthesis of single wall carbon nanotubes (SWNTs), which is relationship between plasma parameters and SWNT characteristics were investigated. Given that among plasma-based techniques arc discharge stands out as very advantageous in several ways (fewer defects, high flexibility, longer lifetime) this techniques warrants attention from the plasma physics and plasma technology standpoint. Both experimental and theoretical investigations of the plasma and SWNTs synthesis were conducted. Experimental efforts focused on plasma diagnostics, measurements of nanostructures parameters, and nanoparticle characterization. Theoretical efforts focused to focus on multi-dimensional modeling of the arc discharge and single wall nanotube synthesis in arc plasmas. It was demonstrated in experiment and theoretically that controlling plasma parameters can affect nanostucture synthesis altering SWNT properties (length and diameter) and leading to synthesis of new structures such as a few-layer graphene. Among clearly identified parameters affecting synthesis are magnetic and electric fields. Knowledge of the plasma parameters and discharge characteristics is crucial for ability to control synthesis process by virtue of both magnetic and electric fields. New graduate course on plasma engineering was introduced into curriculum. 3 undergraduate students were attracted to the project and 3 graduate students (two are female) were involved in the project. Undergraduate student from Historically Black University was attracted and participated in the project during Summer 2010.

  2. Measurement and modeling of Ar/H2/CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison

    E-Print Network [OSTI]

    Bristol, University of

    of thin, polycrystalline diamond films, and the results of a two-dimensional r,z computer model domains. dc arc jets offer considerable advantages as a route to deposition of polycrystalline diamond

  3. Geochemical tracers of processes affecting the formation of seafloor hydrothermal fluids and deposits in the Manus back-arc basin

    E-Print Network [OSTI]

    Craddock, Paul R

    2009-01-01T23:59:59.000Z

    Systematic differences in trace element compositions (rare earth element (REE), heavy metal, metalloid concentrations) of seafloor vent fluids and related deposits from hydrothermal systems in the Manus back-arc basin ...

  4. arc plasma study: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summary: The Madison plasma dynamo experiment (MPDX) is a novel, versatile, basic plasma research device designed to investigate flow driven magnetohydrodynamic (MHD)...

  5. Use of vacuum arc plasma guns for a metal puff Z-pinch system

    SciTech Connect (OSTI)

    Rousskikh, A. G.; Zhigalin, A. S.; Oreshkin, V. I.; Chaikovsky, S. A.; Labetskaya, N. A. [Institute of High Current Electronics, Siberian Branch, Russian Academy of Sciences, Tomsk 634055 (Russian Federation); Baksht, R. B. [Tel Aviv University, Electrical Discharge and Plasma Laboratory, Tel Aviv 69101 (Israel)

    2011-09-15T23:59:59.000Z

    The performance of a metal puff Z-pinch system has been studied experimentally. In this type of system, the initial cylindrical shell 4 cm in diameter was produced by ten plasma guns. Each gun initiates a vacuum arc operating between magnesium electrodes. The net current of the guns was 80 kA. The arc-produced plasma shell was compressed by using a 450-kA, 450-ns driver, and as a result, a plasma column 0.3 cm in diameter was formed. The electron temperature of the plasma reached 400 eV at an average ion concentration of 1.85 {center_dot} 10{sup 18} cm{sup -3}. The power of the Mg K-line radiation emitted by the plasma for 15-30 ns was 300 MW/cm.

  6. Arc plasma generator of atomic driver for steady-state negative ion source

    SciTech Connect (OSTI)

    Ivanov, A. A.; Belchenko, Yu. I.; Davydenko, V. I. [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation) [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation); Novosibirsk State University, Novosibirsk (Russian Federation); Ivanov, I. A.; Kolmogorov, V. V.; Listopad, A. A., E-mail: a.a.listopad@inp.nsk.su; Mishagin, V. V.; Shulzhenko, G. I. [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation)] [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation); Putvinsky, S. V.; Smirnov, A. [Tri Alpha Energy Inc., Rancho Santa Margarita, California 92688 (United States)] [Tri Alpha Energy Inc., Rancho Santa Margarita, California 92688 (United States)

    2014-02-15T23:59:59.000Z

    The paper reviews the results of development of steady-state arc-discharge plasma generator with directly heated LaB{sub 6} cathode. This arc-discharge plasma generator produces a plasma jet which is to be converted into an atomic one after recombination on a metallic plate. The plate is electrically biased relative to the plasma in order to control the atom energies. Such an intensive jet of hydrogen atoms can be used in negative ion sources for effective production of negative ions on a cesiated surface of plasma grid. All elements of the plasma generator have an augmented water cooling to operate in long pulse mode or in steady state. The thermo-mechanical stresses and deformations of the most critical elements of the plasma generator were determined by simulations. Magnetic field inside the discharge chamber was optimized to reduce the local power loads. The first tests of the steady-state arc plasma generator prototype have performed in long-pulse mode.

  7. Contrib. Plasma Phys. 51, No. 2-3, 293 296 (2011) / DOI 10.1002/ctpp.201000061 LTE Experimental Validation in a Gas Metal Arc Welding Plasma

    E-Print Network [OSTI]

    Validation in a Gas Metal Arc Welding Plasma Column F. Valensi1,2 , S. Pellerin1 , A. Boutaghane3 , K, France 7 CTAS-Air Liquide Welding, Saint Ouen l'Aum^one, 95315 Cergy-Pontoise cedex, France Received 12 Spectroscopy, Boltzmann Plot, Sola method, LTE. During gas metal arc welding (GMAW), the plasma obtained has

  8. An interchangeable-cathode vacuum arc plasma source David K. Olson,a

    E-Print Network [OSTI]

    Hart, Gus

    design based on metal vapor vacuum arc MeVVA concepts is employed as a plasma source for a study of a 7 using a boron-carbide disk as the cathode target. The design is simplified from typical designs with a proton beam. We create our 7 Be on the surface of a sample of enriched boron carbide. Because 7

  9. An interferometric and spectroscopic argon arc plasma diagnostic This article has been downloaded from IOPscience. Please scroll down to see the full text article.

    E-Print Network [OSTI]

    An interferometric and spectroscopic argon arc plasma diagnostic This article has been downloaded An interferometric and spectroscopic argon arc plasma diagnostic K MusioltS, A Czernichowskit, J ChapelleS and C de diagnostics of an arc plasma, when the halfwidth of the Balmer H, line is measured, there is a certain amount

  10. Plasma Arc Technology Dedicated to Solving Military Waste Problems

    E-Print Network [OSTI]

    Smith, E. D.; Zaghloul, H. H.

    mobile plasma unit designed for asbestos destruction would be feasible and commercially competitive. Phase II of the CPAR project involved supporting the developmental efforts to design a mobile plasma asbestos pyrolysis system (pAPS)7.31. PAPS is a... mobile plasma asbestos pyrolysis system (pAPS). PAPS is a truck-mounted furnace for the safe, on-site, thermal treatment of ACM. ACM wastes taken directly from public and commercial buildings were plasma treated at the Georgia Institute of Technology...

  11. Surface Plasma Arc by Radio-Frequency Control Study (SPARCS)

    SciTech Connect (OSTI)

    Ruzic, David N. [University of Illinois at Urbana-Champaign, IL (United States)

    2013-04-29T23:59:59.000Z

    This paper is to summarize the work carried out between April 2012 and April 2013 for development of an experimental device to simulate interactions of o#11;-normal detrimental events in a tokamak and ICRF antenna. The work was mainly focused on development of a pulsed plasma source using theta pinch and coaxial plasma gun. This device, once completed, will have a possible application as a test stand for high voltage breakdown of an ICRF antenna in extreme events in a tokamak such as edge-localized modes or disruption. Currently, DEVeX does not produce plasma with high temperature enough to requirement for an ELM simulator. However, theta pinch is a good way to produce high temperature ions. The unique characteristic of plasma heating by a theta pinch is advantageous for an ELM simulator due to its effective ion heating. The objective of the proposed work, therefore, is to build a test facility using the existing theta pinch facility in addition to a coaxial plasma gun. It is expected to produce a similar pulsed-plasma heat load to the extreme events in tokamaks and to be applied for studying interactions of hot plasma and ICRF antennas.

  12. Pressure and arc voltage coupling in dc plasma torches: Identification and extraction of oscillation modes

    SciTech Connect (OSTI)

    Rat, V.; Coudert, J. F. [SPCTS UMR 6638, CNRS-University of Limoges, 123 Av. A. Thomas, 87060 Limoges Cedex (France)

    2010-08-15T23:59:59.000Z

    This work is devoted to the instabilities occurring in a plasma torch, such as those found in plasma spraying. These instabilities are responsible for a lack of reproducibility of coatings properties, especially in the case of suspension plasma spraying that is an innovative way to obtain thin coatings of submicron-sized particles. Strong Helmholtz oscillations are highlighted in the plasma flow and it is demonstrated that they overlap with different acoustic modes in addition with the more commonly admitted ''restrike'' mode, the later being due to rearcing events in the arc region. The instabilities occur in the arc voltage but it is experimentally shown in this paper that the pressure within the torch body presents the same kind of instabilities. Besides, a numerical filtering technique has been adapted to isolate the different instability components. The operating parameters of the plasma torch were varied in order to highlight their influence on the amplitude of the different modes, both for the arc voltage and the pressure.

  13. Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication

    DOE Patents [OSTI]

    Brown, I.G.; MacGill, R.A.; Galvin, J.E.; Ogletree, D.F.; Salmeron, M.

    1998-11-24T23:59:59.000Z

    A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing. 8 figs.

  14. Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication

    DOE Patents [OSTI]

    Brown, Ian G. (Berkeley, CA); MacGill, Robert A. (Richmond, CA); Galvin, James E. (Emmeryville, CA); Ogletree, David F. (El Cerrito, CA); Salmeron, Miquel (El Cerrito, CA)

    1998-01-01T23:59:59.000Z

    A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.

  15. Bias and self-bias of magnetic macroparticle filters for cathodic arc plasmas

    SciTech Connect (OSTI)

    Byon, Eungsun; Anders, Andre

    2002-12-01T23:59:59.000Z

    Curved magnetic filters are often used for the removal of macroparticles from cathodic arc plasmas. This study addresses the need to further reduce losses and improving plasma throughput. The central figure of merit is the system coefficient Kappa defined as filtered ion current normalized by the plasma-producing arc current. The coefficient Kappa is investigated as a function of DC and pulsed magnetic field operation, magnetic field strength, external electric bias, and arc amplitude. It increases with positive filter bias but saturates at about 15 V for relatively low magnetic field ({approx}10 mT), whereas stronger magnetic fields lead to higher Kappa with saturation at about 25 V. Further increase of positive bias reduces Kappa. These findings are true for both pulsed and DC filters. Bias of pulsed filters has been realized using the voltage drop across a self-bias resistor, eliminating the need for a separate bias circuit. Almost 100 A of filtered copper ions have been obtained in pulse d mode, corresponding to Kappa approximately equal to 0.04. The results are interpreted by a simplified potential trough model.

  16. Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films

    SciTech Connect (OSTI)

    Ehiasarian, A. P.; Anders, A.; Petrov, I. [Materials and Engineering Research Institute, Sheffield Hallam University, Howard St., Sheffield S1 1WB (United Kingdom); Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)

    2007-05-15T23:59:59.000Z

    CrN films were prepared on steel substrates by a hybrid method utilizing filtered cathodic arc for Cr ion pretreatment and magnetron sputtering for coating deposition. During pretreatment the substrates were biased to -1200 V and exposed to filtered chromium plasma. The substrate-coating interface formed during the pretreatment contained a Cr-enriched modified layer with composition that was strongly influenced by the temperature of the substrate as observed by scanning transmission electron microscopy--energy dispersive spectroscopy. The modified layer had a nanocrystalline morphology and thickness of 15 nm. The path of formation of the layer is linked to the combined action of implantation, diffusion, and resputtering. The resulting adhesion of 3 {mu}m thick CrN films was very high with scratch test critical load values of 83 N. The morphology of the films was smooth without large scale defects and the microstructure was columnar. The coatings behaved well in dry sliding tests with very low wear coefficients of 2.3x10{sup -16} m{sup 3} N{sup -1} m{sup -1}, which can be linked to the high adhesion and defect-free microstructure. The smooth coatings also had a high resistance to corrosion as demonstrated by potentiodynamic tests with particularly high pitting potentials of +800 mV.

  17. The determination of ranges of selected properties of an argon plasma using an electric arc of limited power

    E-Print Network [OSTI]

    Farquhar, Bannister Wells

    1963-01-01T23:59:59.000Z

    Discussion of Results VII Conclusions VIII Presentation of Data 20 24 26 33 35 References LIST OF FIGURES Figure Page Cathode Rear Plate Nozzle Flange 0 8 10 3A Collar and Cap Nozzle Schematic of Plasma Generator Energy Losses for Various... Energy Inputs Range of Plasmas Generated 0 12 15 27 28 Close-up of Arc Chamber and Plasma Jet. . . , 41 Over-all View of Plasma Generator 41 10 The Arc Chamber, Control Console and Instrumentation 42 Exploded View of Nozzle Flange, Nozzle...

  18. Formation of cobalt silicide from filter metal vacuum arc deposited films

    SciTech Connect (OSTI)

    Whitlow, Harry J.; Zhang, Yanwen; Wang, Chong M.; McCready, David E.; Zhang, Tonghe; Wu, Yuguang

    2006-06-01T23:59:59.000Z

    The thermal reaction of Co film deposited on Si (111) surfaces by a high current filter metal vacuum arc (FMEVAD) system has been studied. After deposition the films were annealed over the 400-900 C temperature range for 30 min. Rutherford Backscattering Spectrometry (RBS) was used to characterize the elemental depth distributions in the films subjected to different annealing temperatures. Ordered chemical phases were determined by glancing-incidence X-ray diffraction (GIXRD) and the morphology was determined by cross section transmission electron microscopy (TEM). The results show that the phases formed are Co2Si at 400 C, CoSi + CoO at 500 C, CoSi + CoSi2 at 600 C, and CoSi2 at (700-800 C). At 900 C, CoSi2 was formed with a mixture of cubic cobalt and probably an amorphous cobalt oxide surface layer. The interface morphology was a rough cusp-like crenellation at 600 C which became less pronounced after annealing at 800 C.

  19. Spatial and time-dependent distribution of plasma parameters in the metal-halide arc lamp

    E-Print Network [OSTI]

    Khakhaev, A; Ekimov, K; Soloviev, A; Khakhaev, Anatoly; Luizova, Lidia; Ekimov, Konstantin; Soloviev, Alexey

    2004-01-01T23:59:59.000Z

    It was shown by several authors that closed high pressure arc a.c. discharge in mercury vapors with addition of metal halide cannot be described in frames of the local thermodynamic equilibrium (LTE) model. However some plasma parameters (electron and high lying excited states densities as well as Hg metastable levels densities) are assumed to be in equilibrium with electron temperature and these assumptions are applied in plasma diagnostics. To verify these supposition the method of local plasma spectroscopy based on spatial and temporal distribution of spectral line profiles was developed. The experimental set up is based on diffraction spectrometer with large aperture, spatial scanning device and photodetector, which allows to carry out the measurements in chosen phases of current period. The software for data acquisition and processing is based on LabVIEW system. The original method of joint data processing was applied to data arrays containing spatial, spectral and temporal distribution of a source surfa...

  20. 2D Axisymmetric Coupled CFD-kinetics Modeling of a Nonthermal Arc Plasma Torch for Diesel Fuel

    E-Print Network [OSTI]

    Boyer, Edmond

    -assisted diesel fuel reformer developed for two different applications: (i) onboard H2 production for fuel cell been also developed for different reforming reactors: solid oxide fuel cell (SOFC)7 , membrane reformer1 2D Axisymmetric Coupled CFD-kinetics Modeling of a Nonthermal Arc Plasma Torch for Diesel Fuel

  1. Ion velocities in direct current arc plasma generated from compound cathodes

    SciTech Connect (OSTI)

    Zhirkov, I.; Rosen, J. [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden)] [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Eriksson, A. O. [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden) [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Oerlikon Balzers Coating AG, Iramali 18, 9496 Balzers (Liechtenstein)

    2013-12-07T23:59:59.000Z

    Arc plasma from Ti-C, Ti-Al, and Ti-Si cathodes was characterized with respect to charge-state-resolved ion energy. The evaluated peak velocities of different ion species in plasma generated from a compound cathode were found to be equal and independent on ion mass. Therefore, measured difference in kinetic energies can be inferred from the difference in ion mass, with no dependence on ion charge state. The latter is consistent with previous work. These findings can be explained by plasma quasineutrality, ion acceleration by pressure gradients, and electron-ion coupling. Increasing the C concentration in Ti-C cathodes resulted in increasing average and peak ion energies for all ion species. This effect can be explained by the “cohesive energy rule,” where material and phases of higher cohesive energy generally result in increasing energies (velocities). This is also consistent with the here obtained peak velocities around 1.37, 1.42, and 1.55 (10{sup 4} m/s) for ions from Ti{sub 0.84}Al{sub 0.16}, Ti{sub 0.90}Si{sub 0.10}, and Ti{sub 0.90}C{sub 0.10} cathodes, respectively.

  2. Synthesis and Deposition of Nanoparticles Using a Hypersonically Expanded Plasma

    SciTech Connect (OSTI)

    Hafiz, Jami; Wang Xiaoliang; Mukherjee, Rajesh; McMurry, Peter H.; Heberlein, Joachim V.R.; Girshick, Steven L. [Department of Mechanical Engineering, University of Minnesota, 111 Church Street SE, Minneapolis, MN (United States)

    2005-10-31T23:59:59.000Z

    Si-Ti-N nanostructured coatings were synthesized by inertial impaction of nanoparticles using a process called hypersonic plasma particle deposition (HPPD). Transmission electron microscopy on samples prepared by focused ion beam (FIB) milling show TiN nanocrystallites in an amorphous matrix. X-ray photoelectron spectroscopy results indicate the presence of amorphous Si3N4 in similar films. In-situ particle size distribution measurements show that particle size distributions peak around 14 nm under typical operating conditions.

  3. Gas Phase Electrodeposition: A Programmable Multimaterial Deposition Method for

    E-Print Network [OSTI]

    Jacobs, Heiko O.

    plasma induced synthesis,11 and arc discharge12,13 can produce nanoparticles and nanow- ires of various-phase deposition process produces charged tungsten, and platinum and uses externally electrodeposition, arc discharge, atmospheric pressure gas phase deposition, nanoparticle nanostructured electrodes

  4. E-Print Network 3.0 - arc spray deposition Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    using Ti powder in a reactive plasma spray... -plasmatron, mixtures of fine Ni and WC powder 1 3 m were plasma sprayed onto stainless steel substrates. A series... spraying;...

  5. E-Print Network 3.0 - arc vapor deposition Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    has been produced... al Vaporization and melting of materials in fusion devices 325 ENERGY DEPOSITED (Jcm21 Figure 3... VAPORIZATION AND MELTING OF MATERIALS IN FUSION...

  6. Plasma Enhanced Chemical Vapor Deposition on Living Substrates: Development, Characterization, and Biological Applications

    E-Print Network [OSTI]

    Tsai, Tsung-Chan 1982-

    2012-12-05T23:59:59.000Z

    This dissertation proposed the idea of “plasma-enhanced chemical vapor deposition on living substrates (PECVD on living substrates)” to bridge the gap between the thin film deposition technology and the biological and living substrates. This study...

  7. E-Print Network 3.0 - atmospheric plasma deposition Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    plasma enhanced chemical vapor deposition CVD . Both processes gave films... and optoelectronics.3 Recently, the low temperature 400 C atmospheric pressure chemical vapor...

  8. E-Print Network 3.0 - arc deposited amorphous Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ; Materials Science 50 Metal-black scattering centers to enhance light harvesting by thin-film solar cells Summary: . Gold-black was deposited on commercial thin-film solar...

  9. E-Print Network 3.0 - arc plasma science Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Mathematics 35 PLASMA PROCESSING UPDATE A newsletter from the Summary: for Plasma Research , Gujarat DST-PSSI Interaction Meet Dr. S. Mukherjee Popularizing Plasma...

  10. Tunable, self-powered integrated arc plasma-melter vitrification system for waste treatment and resource recovery

    DOE Patents [OSTI]

    Titus, Charles H. (Newtown Square, PA); Cohn, Daniel R. (Chestnuthill, MA); Surma, Jeffrey E. (Kennewick, WA)

    1998-01-01T23:59:59.000Z

    The present invention provides a relatively compact self-powered, tunable waste conversion system and apparatus which has the advantage of highly robust operation which provides complete or substantially complete conversion of a wide range of waste streams into useful gas and a stable, nonleachable solid product at a single location with greatly reduced air pollution to meet air quality standards. The system provides the capability for highly efficient conversion of waste into high quality combustible gas and for high efficiency conversion of the gas into electricity by utilizing a high efficiency gas turbine or by an internal combustion engine. The solid product can be suitable for various commercial applications. Alternatively, the solid product stream, which is a safe, stable material, may be disposed of without special considerations as hazardous material. In the preferred embodiment of the invention, the arc plasma furnace and joule heated melter are formed as a fully integrated unit with a common melt pool having circuit arrangements for the simultaneous independently controllable operation of both the arc plasma and the joule heated portions of the unit without interference with one another. The preferred configuration of this embodiment of the invention utilizes two arc plasma electrodes with an elongated chamber for the molten pool such that the molten pool is capable of providing conducting paths between electrodes. The apparatus may additionally be employed with reduced or without further use of the gases generated by the conversion process. The apparatus may be employed as a self-powered or net electricity producing unit where use of an auxiliary fuel provides the required level of electricity production.

  11. Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al{sub 2}O{sub 3} films deposited by remote plasma atomic layer deposition

    SciTech Connect (OSTI)

    Jung, Hyunsoo [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of) [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Samsung Display Co. Ltd., Tangjeong, Chungcheongnam-Do 336-741 (Korea, Republic of); Choi, Hagyoung; Lee, Sanghun [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)] [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Jeon, Heeyoung [Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)] [Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Jeon, Hyeongtag [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of) [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)

    2013-11-07T23:59:59.000Z

    In the present study, we investigated the gas and moisture permeation barrier properties of Al{sub 2}O{sub 3} films deposited on polyethersulfone films (PES) by capacitively coupled plasma (CCP) type Remote Plasma Atomic Layer Deposition (RPALD) at Radio Frequency (RF) plasma powers ranging from 100 W to 400 W in 100 W increments using Trimethylaluminum [TMA, Al(CH{sub 3}){sub 3}] as the Al source and O{sub 2} plasma as the reactant. To study the gas and moisture permeation barrier properties of 100-nm-thick Al{sub 2}O{sub 3} at various plasma powers, the Water Vapor Transmission Rate (WVTR) was measured using an electrical Ca degradation test. WVTR decreased as plasma power increased with WVTR values for 400 W and 100 W of 2.6 × 10{sup ?4} gm{sup ?2}day{sup ?1} and 1.2 × 10{sup ?3} gm{sup ?2}day{sup ?1}, respectively. The trends for life time, Al-O and O-H bond, density, and stoichiometry were similar to that of WVTR with improvement associated with increasing plasma power. Further, among plasma power ranging from 100 W to 400 W, the highest power of 400 W resulted in the best moisture permeation barrier properties. This result was attributed to differences in volume and amount of ion and radical fluxes, to join the ALD process, generated by O{sub 2} plasma as the plasma power changed during ALD process, which was determined using a plasma diagnosis technique called the Floating Harmonic Method (FHM). Plasma diagnosis by FHM revealed an increase in ion flux with increasing plasma power. With respect to the ALD process, our results indicated that higher plasma power generated increased ion and radical flux compared with lower plasma power. Thus, a higher plasma power provides the best gas and moisture permeation barrier properties.

  12. Photoelectron Emission from Metal Surfaces Induced by VUV-emission of Filament Driven Hydrogen Arc Discharge Plasma

    E-Print Network [OSTI]

    Laulainen, J; Koivisto, H; Komppula, J; Tarvainen, O

    2015-01-01T23:59:59.000Z

    Photoelectron emission measurements have been performed using a filament-driven multi-cusp arc discharge volume production H^- ion source (LIISA). It has been found that photoelectron currents obtained with Al, Cu, Mo, Ta and stainless steel (SAE 304) are on the same order of magnitude. The photoelectron currents depend linearly on the discharge power. It is shown experimentally that photoelectron emission is significant only in the short wavelength range of hydrogen spectrum due to the energy dependence of the quantum efficiency. It is estimated from the measured data that the maximum photoelectron flux from plasma chamber walls is on the order of 1 A per kW of discharge power.

  13. E-Print Network 3.0 - arc plasma evaporation Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    from the Facilitation Centre for Industrial Plasma... Technologies, Institute for Plasma Research Issue 54 May - August 2008 Contents Editor's Note About FCIPT... - Facilitation...

  14. Departures from local thermodynamic equilibrium in cutting arc plasmas derived from electron and gas density measurements using a two-wavelength quantitative Schlieren technique

    SciTech Connect (OSTI)

    Prevosto, L.; Mancinelli, B. [Grupo de Descargas Electricas, Departamento Ing. Electromecanica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto 2600, Santa Fe (Argentina); Artana, G. [Laboratorio de Fluidodinamica, Departamento Ing. Mecanica, Facultad de Ingenieria (UBA), Paseo Colon 850, C1063ACV, Buenos Aires (Argentina); Kelly, H. [Grupo de Descargas Electricas, Departamento Ing. Electromecanica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto 2600, Santa Fe (Argentina); Departamento de Fisica, Facultad de Ciencias Exactas y Naturales (UBA), Instituto de Fisica del Plasma (CONICET), Ciudad Universitaria, Pab. I, 1428 Buenos Aires (Argentina)

    2011-03-15T23:59:59.000Z

    A two-wavelength quantitative Schlieren technique that allows inferring the electron and gas densities of axisymmetric arc plasmas without imposing any assumption regarding statistical equilibrium models is reported. This technique was applied to the study of local thermodynamic equilibrium (LTE) departures within the core of a 30 A high-energy density cutting arc. In order to derive the electron and heavy particle temperatures from the inferred density profiles, a generalized two-temperature Saha equation together with the plasma equation of state and the quasineutrality condition were employed. Factors such as arc fluctuations that influence the accuracy of the measurements and the validity of the assumptions used to derive the plasma species temperature were considered. Significant deviations from chemical equilibrium as well as kinetic equilibrium were found at elevated electron temperatures and gas densities toward the arc core edge. An electron temperature profile nearly constant through the arc core with a value of about 14000-15000 K, well decoupled from the heavy particle temperature of about 1500 K at the arc core edge, was inferred.

  15. Deposition of mullite and mullite-like coatings on silicon carbide by dual-source metal plasma immersion. Topical report, October 1995--September 1996

    SciTech Connect (OSTI)

    Brown, I.G.; Monteiro, O.R. [Lawrence Berkeley National Lab., CA (United States)

    1997-04-01T23:59:59.000Z

    Mullite and mullite-like coatings on silicon carbide have been produced by a Metal Plasma Immersion Ion Implantation and Deposition (Mepiiid) technique based on two cathodic vacuum arc sources and concurrent pulse biasing of the substrate in an oxygen atmosphere. The deposition was carried out at oxygen partial pressures of between 0.66 and 3.33 Pa. The Al:Si ratio in the films varied from 1:1 to 8:1 and was controlled by varying the pulse duration of the separate plasma guns. High bias voltage was used early in the deposition process in order to produce atomic mixing at the film-substrate interface, while lower bias voltage was used later in the deposition; low ion energy allows control of the physical properties of the film as well as faster deposition rates. The as-deposited films were amorphous, and crystalline mullite was formed by subsequent annealing at 1,100 C for 2 hours in air. Strong adhesion between the mullite and the SiC was achieved, in some cases exceeding the 70 MPa instrumental limit of the pull-tester.

  16. Influence of argon and oxygen on charge-state-resolved ion energy distributions of filtered aluminum arcs

    E-Print Network [OSTI]

    Rosen, Johanna; Anders, Andre; Mraz, Stanislav; Atiser, Adil; Schneider, Jochen M.

    2006-01-01T23:59:59.000Z

    energy distributions of filtered aluminum arcs Johanna Roséndistributions (IEDs) in filtered aluminum vacuum arc plasmasfor vacuum arc plasmas. Aluminum plasma, for example,

  17. Properties of C4F8 inductively coupled plasmas. I. Studies of Arc-C4F8 magnetically confined plasmas for etching of SiO2

    E-Print Network [OSTI]

    Kushner, Mark

    and CF3 ion fluxes increase, and CF3 becomes the dominant fluorocarbon ion. The ion energy distributions of passively deposited fluorocarbon films on Si, as measured by x-ray photoemission spectroscopy, differ little: 10.1116/1.1697482 I. INTRODUCTION Fluorocarbon plasmas are extensively used for etching

  18. E-Print Network 3.0 - arc plasma melting Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    - Institut fr Physik, Niedertemperaturplasmaphysik Collection: Plasma Physics and Fusion 4 JOURNALDE PHYSIQUEIV Colloque C7,supplkment au Journalde Physique 111,...

  19. Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics

    SciTech Connect (OSTI)

    Bayiati, P.; Tserepi, A.; Petrou, P. S.; Kakabakos, S. E.; Misiakos, K.; Gogolides, E. [Institute of Microelectronics-NCSR 'Demokritos', POB 60228, 153 10 Aghia Paraskevi, Attiki (Greece); Institute of Radioisotopes and Radiodiagnostic Products-NCSR 'Demokritos', POB 60228, 153 10 Aghia Paraskevi, Attiki (Greece); Institute of Microelectronics-NCSR 'Demokritos', POB 60228, 153 10 Aghia Paraskevi, Attiki (Greece)

    2007-05-15T23:59:59.000Z

    The present work focuses on the plasma deposition of fluorocarbon (FC) films on surfaces and the electrostatic control of their wettability (electrowetting). Such films can be employed for actuation of fluid transport in microfluidic devices, when deposited over patterned electrodes. Here, the deposition was performed using C{sub 4}F{sub 8} and the plasma parameters that permit the creation of films with optimized properties desirable for electrowetting were established. The wettability of the plasma-deposited surfaces was characterized by means of contact angle measurements (in the static and dynamic mode). The thickness of the deposited films was probed in situ by means of spectroscopic ellipsometry, while the surface roughness was provided by atomic force microscopy. These plasma-deposited FC films in combination with silicon nitride, a material of high dielectric constant, were used to create a dielectric structure that requires reduced voltages for successful electrowetting. Electrowetting experiments using protein solutions were conducted on such optimized dielectric structures and were compared with similar structures bearing commercial spin-coated Teflon registered amorphous fluoropolymer (AF) film as the hydrophobic top layer. Our results show that plasma-deposited FC films have desirable electrowetting behavior and minimal protein adsorption, a requirement for successful transport of biological solutions in 'digital' microfluidics.

  20. Lithium phosphorous oxynitride films synthesized by a plasma-assisted directed vapor deposition approach

    E-Print Network [OSTI]

    Wadley, Haydn

    Lithium phosphorous oxynitride films synthesized by a plasma-assisted directed vapor deposition vapor deposition approach has been explored for the synthesis of lithium phosphorous oxynitride Lipon the ionic transport properties of these films. This enabled the synthesis of electrolyte films with lithium

  1. DEPOSITION OF FUEL PELLETS INJECTED INTO TOKAMAK PLASMAS Larry R. Baylor, T. C. Jernigan C. Hsieh

    E-Print Network [OSTI]

    DEPOSITION OF FUEL PELLETS INJECTED INTO TOKAMAK PLASMAS Larry R. Baylor, T. C. Jernigan C. Hsieh Diego, CA 92138 (423) 574-1164 (619) 455- 4491 ABSTRACT Pellet injection has been used on tokamak deposition of these fuel pellets, defined as the change in density profile caused by the pellet, has been

  2. High-pressure arcs as vacuum-atmosphere interface and plasma lens for nonvacuum electron beam welding machines, electron beam melting, and nonvacuum ion material modification

    SciTech Connect (OSTI)

    Hershcovitch, A. [AGS Department, Brookhaven National Laboratory, Upton, New York 11973-5000 (United States)] [AGS Department, Brookhaven National Laboratory, Upton, New York 11973-5000 (United States)

    1995-11-01T23:59:59.000Z

    Atmospheric pressure plasmas can be used to provide a vacuum-atmosphere interface as an alternative to differential pumping. Vacuum-atmosphere interface utilizing a cascade arc discharge was successfully demonstrated and a 175 keV electron beam was successfully propagated from vacuum through such a plasma interface and out into atmospheric pressure. Included in the article are a theoretical framework, experimental results, and possible applications for this novel interface. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  3. Effect of ion mass and charge state on transport of vacuum ARC plasmas through a biased magnetic filter

    SciTech Connect (OSTI)

    Byon, Eungsun; Kim, Jong-Kuk; Kwon, Sik-Chol; Anders, Andre

    2003-12-01T23:59:59.000Z

    The effect of ion mass and charge state on plasma transport through a 90{sup o}-curved magnetic filter is experimentally investigated using a pulsed cathodic arc source. Graphite, copper, and tungsten were selected as test materials. The filter was a bent copper coil biased via the voltage drop across a low-ohm, ''self-bias'' resistor. Ion transport is accomplished via a guiding electric field, whose potential forms a ''trough'' shaped by the magnetic guiding field of the filter coil. Evaluation was done by measuring the filtered ion current and determination of the particle system coefficient, which can be defined as the ratio of filter ion current, divided by the mean ion charge state, to the arc current. It was found that the ion current and particle system coefficient decreased as the mass-to-charge ratio of ions increased. This result can be qualitatively interpreted by a very simply model of ion transport that is based on compensation of the centrifugal force by the electric force associated with the guiding potential trough.

  4. Plasma diagnostics in gas metal arc welding by optical emission spectroscopy This article has been downloaded from IOPscience. Please scroll down to see the full text article.

    E-Print Network [OSTI]

    Plasma diagnostics in gas metal arc welding by optical emission spectroscopy This article has been welding by optical emission spectroscopy F Valensi1,2 , S Pellerin1 , A Boutaghane3 , K Dzierzega4 de Bourges), BP 4043, 18028 Bourges cedex, France 7 CTAS-Air Liquide Welding, Saint Ouen l

  5. PULSED PLASMA DEPOSITED MALEIC ANHYDRIDE THIN FILMS AS FUNCTIONALISED SURFACES IN COMPOSITE

    E-Print Network [OSTI]

    PULSED PLASMA DEPOSITED MALEIC ANHYDRIDE THIN FILMS AS FUNCTIONALISED SURFACES IN COMPOSITE substrate models carbon fibres in composite materials. The substrates are treated with different plasma properties of composite materials are strongly dependent on the integrity of the fibre-matrix interface

  6. arc-discharge plasma source: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Department of Nuclear Engineering, 1406 W. Green St., Urbana, IL 61801, USA 2 Plasma Research Laboratory-mode) to helicon (W-mode) transitions in research reactors having...

  7. E-Print Network 3.0 - arc radiation delivery Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AC Electric Arc System Ph. G... -6. High-current electric arcs or electric arc plasma torches are used practically in all plasma... into the arc is transformed by means of...

  8. E-Print Network 3.0 - arc delivery radiation Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AC Electric Arc System Ph. G... -6. High-current electric arcs or electric arc plasma torches are used practically in all plasma... into the arc is transformed by means of...

  9. Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor

    SciTech Connect (OSTI)

    Jeon, Ki-Moon [Vacuum Center, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Advanced Materials Engineering, Dae Jeon University, Daejeon 300-716 (Korea, Republic of); Shin, Jae-Su [Department of Advanced Materials Engineering, Dae Jeon University, Daejeon 300-716 (Korea, Republic of); Yun, Ju-Young [Vacuum Center, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Nano and Bio Surface Science, University of Science and Technology (UST), Daejeon 305-333 (Korea, Republic of); Jun Lee, Sang [Center of Nanomaterials Characterization, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Nano Science, University of Science and Technology (UST), Daejeon 305-333 (Korea, Republic of); Kang, Sang-Woo, E-mail: swkang@kriss.re.kr [Vacuum Center, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Advanced Device Technology, University of Science and Technology (UST), Daejeon 305-333 (Korea, Republic of)

    2014-05-15T23:59:59.000Z

    The plasma-enhanced atomic layer deposition (PEALD) process was developed as a growth technique of SiO{sub 2} thin films using a plasma-activated triisopropylsilane [TIPS, ((iPr){sub 3}SiH)] precursor. TIPS was activated by an argon plasma at the precursor injection stage of the process. Using the activated TIPS, it was possible to control the growth rate per cycle of the deposited films by adjusting the plasma ignition time. The PEALD technique allowed deposition of SiO{sub 2} films at temperatures as low as 50?°C without carbon impurities. In addition, films obtained with plasma ignition times of 3?s and 10?s had similar values of root-mean-square surface roughness. In order to evaluate the suitability of TIPS as a precursor for low-temperature deposition of SiO{sub 2} films, the vapor pressure of TIPS was measured. The thermal stability and the reactivity of the gas-phase TIPS with respect to water vapor were also investigated by analyzing the intensity changes of the C–H and Si–H peaks in the Fourier-transform infrared spectrum of TIPS.

  10. E-Print Network 3.0 - arc plasma jet Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Mathematics 9 Electrical discharges in theElectrical discharges in the Reverse Vortex FlowReverse Vortex Flow Summary: 2.1 gs 1.4 gsArgon Mass Flow 2.1 gs 1.4 gs Plasma...

  11. Plasma-based ion implantation and deposition: A review of physics,technology, and applications

    SciTech Connect (OSTI)

    Pelletier, Jacques; Anders, Andre

    2005-05-16T23:59:59.000Z

    After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used of PBII&D to produce surgical implants, bio- and blood-compatible surfaces and coatings, etc. With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures. We use the acronym PBII&D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.

  12. Numerical simulation of discharge structures in Ar/Cs nonequilibrium plasma MHD generator

    SciTech Connect (OSTI)

    Okubo, M.; Kabashima, S.; Okuno, Y.; Yamasaki, H.

    1998-07-01T23:59:59.000Z

    As reported in previous papers, the quasi-one-dimensional simulation code has come to predict almost satisfactorily the performance of the shock tube driven disk MHD generator using cesium seeded argon plasma as working fluid. However, the agreement between experimental and predicted performances was not so good on the conditions that the external load resistance was small, the seed fraction was high or the stagnation pressure was low. On these conditions, it was observed that ionization instabilities occur in the MHD channel. On the other hand, high-speed photographs of the nonequilibrium plasma discharge in the MHD generator were taken on several working conditions during the experiment. From these photographs, discharges were classified into almost three kinds of patterns. (a) A single strong luminous ring-type discharge near the nozzle exit for low seed fraction, (b) an almost uniform discharge inside the MHD channel for medium seed fraction, (c) multiple ring-type or spiral discharges in the MHD channel for high seed fraction. The structures of the discharge were sometimes two-dimensional especially for high seed fraction. Therefore, it may be impossible in this case to simulate them and to predict the performance precisely with one-dimensional simulation code. In the present study, two-dimensional (r-q) numerical simulations were made on the disk MHD power generation experiment (thermal input is about 1.5MW). The objectives were to develop a numerical simulator with high accuracy for the disk MHD generator and to explain some interesting phenomena concerned with nonequilibrium plasma discharges. The system of basic equations was solved mainly using CIP method. The calculation region was taken as that located between the throat to the inlet of the second (final) cathode. The main results are summarized as follows; (A) On the condition that the seed fraction was lower than the optimum value, it was succeeded to simulate numerically the single strong luminous ring-type discharge. The ring-type discharge was caused by the partial ionization of argon due to the rapid increase in the electron temperature in the nozzle. The pressure increase like a shock wave was also induced there. (B) On the condition that the seed fraction was near the optimum value, an almost uniform plasma was obtained in the simulation and in the experiment. (C) On the condition that seed fraction was higher than the optimum value, A similar structure of discharge to experimental one was obtained in the calculation due to an ionization instability (streamer) caused by the partial ionization of seeded cesium. (D) The performances of the generator such as enthalpy extraction can be predicted well with this simulation code.

  13. E-Print Network 3.0 - area filtered arc Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Conference Summary: -21, 2008, Philadelphia, Pennsylvania, USA NAWTEC16-1901 PLASMA ARC GASIFICATION FOR SOLID WASTE DISPOSAL... ., Florida, USA, ABSTRACT Plasma arc gasification...

  14. Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

    SciTech Connect (OSTI)

    Dechana, A. [Program of Physics and General Science, Faculty of Science and Technology, Songkhla Rajabhat University, Songkhla 90000 (Thailand); Thamboon, P. [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand); Boonyawan, D., E-mail: dheerawan.b@cmu.ac.th [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand)

    2014-10-15T23:59:59.000Z

    A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al{sub 2}O{sub 3} layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al{sub 2}O{sub 3} films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

  15. Field emission properties of phosphorus doped microwave plasma chemical vapor deposition diamond films by ion implantation

    E-Print Network [OSTI]

    Lee, Jong Duk

    2002; published 5 February 2003 Phosphorus doped polycrystalline diamond films were grown using ion the electrical char- acteristics of diamond FEAs to lower the operating voltage. Polycrystalline diamond hasField emission properties of phosphorus doped microwave plasma chemical vapor deposition diamond

  16. High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma

    E-Print Network [OSTI]

    Zachariah, Michael R.

    High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency Semiconductor, Eden Prairie, MN, USA Received 10 July 2002; accepted 14 July 2002 Abstract Silicon carbide films; Nanomaterials; Silicon carbide; Thermal plasmas; Thin films; Si tetrachlorine precursor Silicon carbide has

  17. Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment

    SciTech Connect (OSTI)

    Lim, Taekyung; Kim, Dongchool; Ju, Sanghyun [Department of Physics, Kyonggi University, Suwon, Gyeonggi-Do 443-760 (Korea, Republic of)

    2013-07-01T23:59:59.000Z

    Deposition of high-quality dielectric on a graphene channel is an essential technology to overcome structural constraints for the development of nano-electronic devices. In this study, we investigated a method for directly depositing aluminum oxide (Al{sub 2}O{sub 3}) on a graphene channel through nitrogen plasma treatment. The deposited Al{sub 2}O{sub 3} thin film on graphene demonstrated excellent dielectric properties with negligible charge trapping and de-trapping in the gate insulator. A top-gate-structural graphene transistor was fabricated using Al{sub 2}O{sub 3} as the gate dielectric with nitrogen plasma treatment on graphene channel region, and exhibited p-type transistor characteristics.

  18. Plasma-enhanced chemical vapor deposition of graphene on copper substrates

    SciTech Connect (OSTI)

    Woehrl, Nicolas, E-mail: nicolas.woehrl@uni-due.de; Schulz, Stephan [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany)] [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany); Ochedowski, Oliver; Gottlieb, Steven [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany)] [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany); Shibasaki, Kosuke [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)] [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)

    2014-04-15T23:59:59.000Z

    A plasma enhanced vapor deposition process is used to synthesize graphene from a hydrogen/methane gas mixture on copper samples. The graphene samples were transferred onto SiO{sub 2} substrates and characterized by Raman spectroscopic mapping and atomic force microscope topographical mapping. Analysis of the Raman bands shows that the deposited graphene is clearly SLG and that the sheets are deposited on large areas of several mm{sup 2}. The defect density in the graphene sheets is calculated using Raman measurements and the influence of the process pressure on the defect density is measured. Furthermore the origin of these defects is discussed with respect to the process parameters and hence the plasma environment.

  19. Laboratory experiments on arc deflection and instability

    SciTech Connect (OSTI)

    Zweben, S.; Karasik, M.

    2000-03-21T23:59:59.000Z

    This article describes experiments on arc deflection instability carried out during the past few years at the Princeton University Plasma Physics Laboratory (PPPL). The approach has been that of plasma physicists interested in arcs, but they believe these results may be useful to engineers who are responsible for controlling arc behavior in large electric steel furnaces.

  20. Effects of plasma-deposited silicon nitride passivation on the radiation hardness of CMOS integrated circuits

    SciTech Connect (OSTI)

    Clement, J. J.

    1980-01-01T23:59:59.000Z

    The use of plasma-deposited silicon nitride as a final passivation over metal-gate CMOS integrated circuits degrades the radiation hardness of these devices. The hardness degradation is manifested by increased radiation-induced threshold voltage shifts caused principally by the charging of new interface states and, to a lesser extent, by the trapping of holes created upon exposure to ionizing radiation. The threshold voltage shifts are a strong function of the deposition temperature, and show very little dependence on thickness for films deposited at 300/sup 0/C. There is some correlation between the threshold voltage shifts and the hydrogen content of the PECVD silicon nitride films used as the final passivation layer as a function of deposition temperature. The mechanism by which the hydrogen contained in these films may react with the Si/SiO/sub 2/ interface is not clear at this point.

  1. Effect of process parameters on properties of argon–nitrogen plasma for titanium nitride film deposition

    SciTech Connect (OSTI)

    Saikia, Partha; Kakati, Bharat [Centre of Plasma Physics, Institute for Plasma Research, Nazirakhat, Sonapur-782 402, Kamrup, Assam (India)] [Centre of Plasma Physics, Institute for Plasma Research, Nazirakhat, Sonapur-782 402, Kamrup, Assam (India)

    2013-11-15T23:59:59.000Z

    In this study, the effect of working pressure and input power on the physical properties and sputtering efficiencies of argon–nitrogen (Ar/N{sub 2}) plasma in direct current magnetron discharge is investigated. The discharge in Ar/N{sub 2} is used to deposit TiN films on high speed steel substrate. The physical plasma parameters are determined by using Langmuir probe and optical emission spectroscopy. On the basis of the different reactions in the gas phase, the variation of plasma parameters and sputtering rate are explained. A prominent change of electron temperature, electron density, ion density, and degree of ionization of Ar is found as a function of working pressure and input power. The results also show that increasing working pressure exerts a negative effect on film deposition rate while increasing input power has a positive impact on the same. To confirm the observed physical properties and evaluate the texture growth as a function of deposition parameters, x-ray diffraction study of deposited TiN films is also done.

  2. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

    SciTech Connect (OSTI)

    Anders, Andre

    2014-08-17T23:59:59.000Z

    High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

  3. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

    DOE Public Access Gateway for Energy & Science Beta (PAGES Beta)

    Anders, Andre

    2014-10-01T23:59:59.000Z

    High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

  4. Plasma treatment process for palladium chemisorption onto polymers before electroless deposition

    SciTech Connect (OSTI)

    Charbonnier, M.; Alami, M.; Romand, M. [Univ. Claude Bernard-Lyon 1, Villeurbanne (France). Lab. de Sciences et Ingenierie des Surfaces

    1996-02-01T23:59:59.000Z

    Before electroless plating, polymer surfaces must be sensitized and/or activated by using either the conventional two-step or one-step process. The latter stage is a compulsory one to make such surfaces catalytic, e.g., for Ni-P deposition. These processes are performed here using O{sub 2}, NH{sub 3}, or N{sub 2} plasma pretreatments. Reaction mechanisms are proposed for each of the processes and for each type of surface considered (oxygenated or both oxygenated and nitrogenated by the plasma treatment). Direct palladium chemisorption onto nitrogenated groups is highlighted. This allows one to simplify the process making the surface catalytic via elimination of the use of SnCl{sub 2} and to extend the method to any polymer. An additional interest of the plasma treatments, besides their high efficiency in grafting chemical functions, is to perform this grafting at will on selected areas which results in selective metallization.

  5. Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

    SciTech Connect (OSTI)

    Demaurex, Bénédicte, E-mail: benedicte.demaurex@epfl.ch; Bartlome, Richard; Seif, Johannes P.; Geissbühler, Jonas; Ballif, Christophe; De Wolf, Stefaan [École Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin-Film Electronics Laboratory, Maladière 71B, CH-2000 Neuchâtel (Switzerland); Alexander, Duncan T. L.; Jeangros, Quentin [École Polytechnique Fédérale de Lausanne (EPFL), Interdisciplinary Centre for Electron Microscopy (CIME), Station 12, CH-1015 Lausanne (Switzerland)

    2014-08-07T23:59:59.000Z

    Low-temperature (?200?°C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-enhanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems not only from the growth conditions but also from unintentional contamination of the reactor. Based on our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.

  6. Increasing Stabilized Performance Of Amorphous Silicon Based Devices Produced By Highly Hydrogen Diluted Lower Temperature Plasma Deposition.

    DOE Patents [OSTI]

    Li, Yaun-Min (Langhorne, PA); Bennett, Murray S. (Langhorne, PA); Yang, Liyou (Plainsboro, NJ)

    1999-08-24T23:59:59.000Z

    High quality, stable photovoltaic and electronic amorphous silicon devices which effectively resist light-induced degradation and current-induced degradation, are produced by a special plasma deposition process. Powerful, efficient single and multi-junction solar cells with high open circuit voltages and fill factors and with wider bandgaps, can be economically fabricated by the special plasma deposition process. The preferred process includes relatively low temperature, high pressure, glow discharge of silane in the presence of a high concentration of hydrogen gas.

  7. Increased Stabilized Performance Of Amorphous Silicon Based Devices Produced By Highly Hydrogen Diluted Lower Temperature Plasma Deposition.

    DOE Patents [OSTI]

    Li, Yaun-Min (Langhorne, PA); Bennett, Murray S. (Langhorne, PA); Yang, Liyou (Plainsboro, NJ)

    1997-07-08T23:59:59.000Z

    High quality, stable photovoltaic and electronic amorphous silicon devices which effectively resist light-induced degradation and current-induced degradation, are produced by a special plasma deposition process. Powerful, efficient single and multi-junction solar cells with high open circuit voltages and fill factors and with wider bandgaps, can be economically fabricated by the special plasma deposition process. The preferred process includes relatively low temperature, high pressure, glow discharge of silane in the presence of a high concentration of hydrogen gas.

  8. P ARC

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    ARC INSTITUTE FOR SCHOOL PARTNERSHIP WIND ENERGY 2 : : D eveloped b y P ARC & S cience O utreach, w ith s upport f rom t he T oshiba A merica F oundation : : W ashington U...

  9. The role of inert gas in MW-enhanced plasmas for the deposition of nanocrystalline diamond thin films

    E-Print Network [OSTI]

    Bristol, University of

    in polycrystalline diamond film CVD [3,4]. While the mechanical, thermal and acoustic properties of MCD films haveThe role of inert gas in MW-enhanced plasmas for the deposition of nanocrystalline diamond thin diamond Nanocrystalline Inert gas Growth Nanocrystalline diamond thin films have been deposited using

  10. Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition

    SciTech Connect (OSTI)

    Liu Jiurong; Martin, Ryan M.; Chang, Jane P. [Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, California 90095 (United States)

    2008-09-15T23:59:59.000Z

    Hafnium silicate films were grown by alternating the deposition cycles of hafnium oxide and silicon oxide using a plasma enhanced atomic layer deposition process. The as-deposited and 900 deg. C annealed hafnium silicate films were determined to be amorphous using grazing incidence x-ray diffraction. This suggested that the formation of hafnium silicate suppressed the crystallization of HfO{sub 2} at high temperatures. The dielectric constants increased from {approx}5 to {approx}17 as the hafnium content increased from 9 to 17 at. % in the hafnium silicate films. The leakage currents through the Hf-rich Hf-silicate films were two to three orders of magnitude lower than that of SiO{sub 2} with the same equivalent oxide thickness in the range of 1.6-2.3 nm. The estimated band gap of Hf-silicate films from the O 1s plasma loss spectra increased with the increasing Si content due to the higher band gap of SiO{sub 2} than that of HfO{sub 2}.

  11. Formation of microchannels from low-temperature plasma-deposited silicon oxynitride

    DOE Patents [OSTI]

    Matzke, Carolyn M. (Los Lunas, NM); Ashby, Carol I. H. (Edgewood, NM); Bridges, Monica M. (Albuquerque, NM); Manginell, Ronald P. (Albuquerque, NM)

    2000-01-01T23:59:59.000Z

    A process for forming one or more fluid microchannels on a substrate is disclosed that is compatible with the formation of integrated circuitry on the substrate. The microchannels can be formed below an upper surface of the substrate, above the upper surface, or both. The microchannels are formed by depositing a covering layer of silicon oxynitride over a mold formed of a sacrificial material such as photoresist which can later be removed. The silicon oxynitride is deposited at a low temperature (.ltoreq.100.degree. C.) and preferably near room temperature using a high-density plasma (e.g. an electron-cyclotron resonance plasma or an inductively-coupled plasma). In some embodiments of the present invention, the microchannels can be completely lined with silicon oxynitride to present a uniform material composition to a fluid therein. The present invention has applications for forming microchannels for use in chromatography and electrophoresis. Additionally, the microchannels can be used for electrokinetic pumping, or for localized or global substrate cooling.

  12. Deposition of nanostructured photocatalytic zinc ferrite films using solution precursor plasma spraying

    SciTech Connect (OSTI)

    Dom, Rekha; Sivakumar, G.; Hebalkar, Neha Y.; Joshi, Shrikant V. [International Advanced Research Centre for Powder Metallurgy and New Materials, Balapur PO, Hyderabad 500 005, AP (India)] [International Advanced Research Centre for Powder Metallurgy and New Materials, Balapur PO, Hyderabad 500 005, AP (India); Borse, Pramod H., E-mail: phborse@arci.res.in [International Advanced Research Centre for Powder Metallurgy and New Materials, Balapur PO, Hyderabad 500 005, AP (India)

    2012-03-15T23:59:59.000Z

    Highlights: Black-Right-Pointing-Pointer Highly economic solution precursor route capable of producing films/coating even for mass scale production. Black-Right-Pointing-Pointer Pure spinel phase ZnFe{sub 2}O{sub 4} porous, immobilized films deposited in single step. Black-Right-Pointing-Pointer Parameter optimization yields access to nanostructuring in SPPS method. Black-Right-Pointing-Pointer The ecofriendly immobilized ferrite films were active under solar radiation. Black-Right-Pointing-Pointer Such magnetic system display advantage w.r.t. recyclability after photocatalyst extraction. -- Abstract: Deposition of pure spinel phase, photocatalytic zinc ferrite films on SS-304 substrates by solution precursor plasma spraying (SPPS) has been demonstrated for the first time. Deposition parameters such as precursor solution pH, concentration, film thickness, plasma power and gun-substrate distance were found to control physico-chemical properties of the film, with respect to their crystallinity, phase purity, and morphology. Alkaline precursor conditions (7 < pH {<=} 10) were found to favor oxide film formation. The nanostructured films produced under optimized conditions, with 500 mM solution at pH {approx} 8.0, yielded pure cubic phase ZnFe{sub 2}O{sub 4} film. Very high/low precursor concentrations yielded mixed phase, less adherent, and highly inhomogeneous thin films. Desired spinel phase was achieved in as-deposited condition under appropriately controlled spray conditions and exhibited a band gap of {approx}1.9 eV. The highly porous nature of the films favored its photocatalytic performance as indicated by methylene blue de-coloration under solar radiation. These immobilized films display good potential for visible light photocatalytic applications.

  13. Thermodynamic properties and interfacial layer characteristics of HfO{sub 2} thin films deposited by plasma-enhanced atomic layer deposition

    SciTech Connect (OSTI)

    Kim, Inhoe; Kuk, Seoungwoo; Kim, Seokhoon; Kim, Jinwoo; Jeon, Hyeongtag; Cho, M.-H.; Chung, K.-B. [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Korea Research Institute of Standard and Science, Daejeon 305-600 (Korea, Republic of)

    2007-05-28T23:59:59.000Z

    The thermodynamic properties and interfacial characteristics of HfO{sub 2} thin films that were deposited by the direct plasma atomic layer deposition (DPALD) method are investigated. The as-deposited HfO{sub 2} films that were deposited by the DPALD method show crystallization of the HfO{sub 2} layers, which initiates at approximately the 35th cycle (about 2.8 nm) of the DPALD process. Medium-energy ion scattering analysis reveals that the direct O{sub 2} plasma causes a compositional change in the interfacial layer as the process progresses. With an increase in the number of process cycles, the Si content decreases and the O content increases at that position, so that the HfO{sub 2}-like Hf-silicate layer is formed on top of the interfacial layer. The enhanced physical reactivity of the oxygen ions in the direct plasma and the Hf-silicate layer may be the driving forces that accelerate the early crystallization of the HfO{sub 2} layer in the DPALD process in the as-deposited state.

  14. Study on plasma assisted metal-organic chemical vapor deposition of Zr,,C,N... and Ti,,C,N... thin films and in situ plasma diagnostics with optical

    E-Print Network [OSTI]

    Boo, Jin-Hyo

    films and in situ plasma diagnostics with optical emission spectroscopy S. J. Cho, S.-H. Nam, C.-K. JungStudy on plasma assisted metal-organic chemical vapor deposition of Zr,,C,N... and Ti,,C,N... thin C,N films were synthesized by pulsed dc plasma assisted metal-organic chemical vapor deposition

  15. E-Print Network 3.0 - atmospheric gliding arc Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    SCIENCE, VOL. 33, NO. 1, FEBRUARY 2005 Gliding Arc Discharges... for their application to plasma-chemical processes. Diagnostics of gliding arc discharge: electron temperature,...

  16. Study of plasma enhanced chemical vapor deposition of boron-doped hydrogenated amorphous silicon thin films and the application to p-channel thin film transistor

    E-Print Network [OSTI]

    Nominanda, Helinda

    2004-01-01T23:59:59.000Z

    The material and process characteristics of boron doped hydrogenated amorphous silicon (a-Si:H) thin film deposited by plasma enhanced chemical vapor deposition technique (PECVD) have been studied. The goal is to apply the high quality films...

  17. Preparation of amorphous electrochromic tungsten oxide and molybdenum oxide by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Tracy, C.E.; Benson, D.K.

    1986-09-01T23:59:59.000Z

    Preliminary experiments have been performed to probe the feasibility of using plasma enhanced chemical vapor deposition (PE--CVD) to prepare electrochromic thin films of tungsten oxide and molybdenum oxide by plasma reaction of WF/sub 6/, W(CO)/sub 6/, and Mo(CO)/sub 6/ with oxygen. Thin films produced in a 300 W, electrodeless, radio-frequency (rf), capacitive discharge were found to be electrochromic when tested with either liquid or solid electrolytes. Optical spectroscopy was performed on two electrochromic coatings after Li/sup +/ ion insertion from a propylene carbonate liquid electrolyte. Broad absorption peaks at --900 nm for WO/sub 3/ and 600 nm for MoO/sub 3/ were observed. Optical results for PE--CVD MoO/sub 3/ films differ from those reported for evaporated MoO/sub 3/ films which have an absorption peak at --800 nm. The shorter wavelength absorption in the PE--CVD MoO/sub 3/ films offers the potential for fabricating electrochromic devices with higher contrast ratios and less color change. Optical emission spectroscopy, Auger, and x-ray diffraction analyses indicate these thin film deposits to be predominantly amorphous tungsten and molybdenum oxides.

  18. Experimental study on the energy deposition of an ns-DBD plasma actuator and its effect on a laminar boundary layer:.

    E-Print Network [OSTI]

    Winkel, R.

    2015-01-01T23:59:59.000Z

    ??An experimental study aimed at the influence of different barrier materials on the energy deposition of nanosecond pulsed dielectric barrier discharge (ns-DBD) plasma actuator was… (more)

  19. Deposition of TiN and HfO{sub 2} in a commercial 200 mm remote plasma atomic layer deposition reactor

    SciTech Connect (OSTI)

    Heil, S. B. S.; Hemmen, J. L. van; Hodson, C. J.; Singh, N.; Klootwijk, J. H.; Roozeboom, F.; Sanden, M. C. M. van de; Kessels, W. M. M. [Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands); Oxford Instruments Plasma Technology, North End, Yatton BS49 4AP (United Kingdom); Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven (Netherlands); NXP Semiconductors Research, High Tech Campus 4, 5656 AE Eindhoven (Netherlands); Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)

    2007-09-15T23:59:59.000Z

    The authors describe a remote plasma atomic layer deposition reactor (Oxford Instruments FlexAL trade mark sign ) that includes an inductively coupled plasma source and a load lock capable of handling substrates up to 200 mm in diameter. The deposition of titanium nitride (TiN) and hafnium oxide (HfO{sub 2}) is described for the combination of the metal-halide precursor TiCl{sub 4} and H{sub 2}-N{sub 2} plasma and the combination of the metallorganic precursor Hf[N(CH{sub 3})(C{sub 2}H{sub 5})]{sub 4} and O{sub 2} plasma, respectively. The influence of the plasma exposure time and substrate temperature has been studied and compositional, structural, and electrical properties are reported. TiN films with a low Cl impurity content were obtained at 350 deg. C at a growth rate of 0.35 A /cycle with an electrical resistivity as low as 150 {mu}{omega} cm. Carbon-free (detection limit <2 at. %) HfO{sub 2} films were obtained at a growth rate of 1.0 A /cycle at 290 deg. C. The thickness and resisitivity nonuniformity was <5% for the TiN and the thickness uniformality was <2% for the HfO{sub 2} films as determined over 200 mm wafers.

  20. NEW NUMERICAL TECHNOLOGIES FOR THE SIMULATION OF ARC WELDING PROCESSES

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    NEW NUMERICAL TECHNOLOGIES FOR THE SIMULATION OF ARC WELDING PROCESSES Michel Bellet 1 , Makhlouf Antipolis, France; soudage@transvalor.com Keywords: welding, finite elements, material deposit, adaptive for arc welding simulation and analysis. The new numerical technologies essentially consist first

  1. Carbon nanowalls grown by microwave plasma enhanced chemical vapor deposition during the carbonization of polyacrylonitrile fibers

    SciTech Connect (OSTI)

    Li Jiangling; Su Shi; Kundrat, Vojtech; Abbot, Andrew M.; Ye, Haitao [School of Engineering and Applied Science, Aston University, Birmingham B4 7ET (United Kingdom); Zhou Lei [Department of Metallurgy and Materials, University of Birmingham, Birmingham B15 2TT (United Kingdom); Mushtaq, Fajer [Department of Mechanical Engineering, ETH Zurich, Zurich 8092 (Switzerland); Ouyang Defang [School of Life and Health Science, Aston University, Birmingham B4 7ET (United Kingdom); James, David; Roberts, Darren [Thermo Fisher Scientific, Stafford House, Hemel Hempstead HP2 7GE (United Kingdom)

    2013-01-14T23:59:59.000Z

    We used microwave plasma enhanced chemical vapor deposition (MPECVD) to carbonize an electrospun polyacrylonitrile (PAN) precursor to form carbon fibers. Scanning electron microscopy, Raman spectroscopy, and Fourier transform infrared spectroscopy were used to characterize the fibers at different evolution stages. It was found that MPECVD-carbonized PAN fibers do not exhibit any significant change in the fiber diameter, whilst conventionally carbonized PAN fibers show a 33% reduction in the fiber diameter. An additional coating of carbon nanowalls (CNWs) was formed on the surface of the carbonized PAN fibers during the MPECVD process without the assistance of any metallic catalysts. The result presented here may have a potential to develop a novel, economical, and straightforward approach towards the mass production of carbon fibrous materials containing CNWs.

  2. Evaluating the robustness of top coatings comprising plasma-deposited fluorocarbons in electrowetting systems

    E-Print Network [OSTI]

    Dimitrios P. Papageorgiou; Elias P. Koumoulos; Costas A. Charitidis; Andreas G. Boudouvis; Athanasios G. Papathanasiou

    2011-10-19T23:59:59.000Z

    Thin dielectric stacks comprising a main insulating layer and a hydrophobic top coating are commonly used in low voltage electrowetting systems. However, in most cases, thin dielectrics fail to endure persistent electrowetting testing at high voltages, namely beyond the saturation onset, as electrolysis indicates dielectric failure. Careful sample inspection via optical microscopy revealed possible local delamination of the top coating under high electric fields. Thus, improvement of the adhesion strength of the hydrophobic top coating to the main dielectric is attempted through a plasma-deposited fluorocarbon interlayer. Interestingly enough the proposed dielectric stack exhibited a) resistance to dielectric breakdown, b) higher contact angle modulation range, and c) electrowetting cycle reversibility. Appearance of electrolysis in the saturation regime is inhibited, suggesting the use of this hydrophobic dielectric stack for the design of more efficient electrowetting systems. The possible causes of the improved performance are investigated by nanoscratch characterization.

  3. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Santra, T. S.; Liu, C. H. [Institute of Nanoengineering and Microsystems (NEMS), National Tsing Hua University, Hsinchu, Taiwan 30043 (China); Bhattacharyya, T. K. [Department of Electronics and Electrical Communication Engineering, Indian Institute of Technology, Kharagpur 721302, West Bengal (India); Patel, P. [Department of Electrical and Computer Engineering, University of Illinois at Urbana Champaign, Urbana, Illinois 61801 (United States); Barik, T. K. [School of Applied Sciences, Haldia Institute of Technology, Haldia 721657, Purba Medinipur, West Bengal (India)

    2010-06-15T23:59:59.000Z

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of C-C, C-H, Si-C, and Si-H bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio I{sub D}/I{sub G}. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  4. Electrical properties of a-C:Mo films produced by dual-cathode filtered cathodic arc plasma deposition

    E-Print Network [OSTI]

    Sansongsiri, Sakon

    2008-01-01T23:59:59.000Z

    and Related Materials Electrical properties of a-C:Mo filmsNo. DE-AC02-05CH11231. Electrical properties of a-C:Mo filmsair. Film resistivity and electrical activation energy were

  5. Al{sub 2}O{sub 3} multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

    SciTech Connect (OSTI)

    Jung, Hyunsoo [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Samsung Display Co. Ltd., Tangjeong, Chungcheongnam-Do 336-741 (Korea, Republic of); Jeon, Heeyoung [Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Choi, Hagyoung; Ham, Giyul; Shin, Seokyoon [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Jeon, Hyeongtag, E-mail: hjeon@hanyang.ac.kr [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)

    2014-02-21T23:59:59.000Z

    Al{sub 2}O{sub 3} films deposited by remote plasma atomic layer deposition have been used for thin film encapsulation of organic light emitting diode. In this study, a multi-density layer structure consisting of two Al{sub 2}O{sub 3} layers with different densities are deposited with different deposition conditions of O{sub 2} plasma reactant time. This structure improves moisture permeation barrier characteristics, as confirmed by a water vapor transmission rate (WVTR) test. The lowest WVTR of the multi-density layer structure was 4.7 × 10{sup ?5} gm{sup ?2} day{sup ?1}, which is one order of magnitude less than WVTR for the reference single-density Al{sub 2}O{sub 3} layer. This improvement is attributed to the location mismatch of paths for atmospheric gases, such as O{sub 2} and H{sub 2}O, in the film due to different densities in the layers. This mechanism is analyzed by high resolution transmission electron microscopy, elastic recoil detection, and angle resolved X-ray photoelectron spectroscopy. These results confirmed that the multi-density layer structure exhibits very good characteristics as an encapsulation layer via location mismatch of paths for H{sub 2}O and O{sub 2} between the two layers.

  6. New approaches for the reduction of plasma arc drop in second-generation thermionic converters. Final report

    SciTech Connect (OSTI)

    Hatziprokopiou, M.E.; Shaw, D.T.

    1981-03-31T23:59:59.000Z

    Investigations of ion generation and recombination mechanisms in the cesium plasma as they pertain to the advanced mode thermionic energy converter are described. The changes in plasma density and temperature within the converter have been studied under the influence of several promising auxiliary ionization candidate sources. Three novel approaches of external cesium ion generation have been investigated in some detail, namely vibrationally excited N/sub 2/ as an energy source of ionization of Cs ions in a DC discharge, microwave power as a means of resonant sustenance of the cesium plasma, and ion generation in a pulse N/sub 2/-Cs mixture. The experimental data obtained and discussed show that all three techniques - i.e. the non-LTE high-voltage pulsing, the energy transfer from vibrationally excited diatomic gases, and the external pumping with a microwave power - have considerable promise as schemes in auxiliary ion generation applicable to the advanced thermionic energy converter.

  7. Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition

    E-Print Network [OSTI]

    Bristol, University of

    chemical vapor deposition of polycrystalline diamond. Several tracer species are monitored in order to gain used for diamond chemical vapor deposition Jie Ma,1 Michael N. R. Ashfold,1,a and Yuri A. Mankelevich2 spectroscopic methods used to diagnose microwave MW plasmas used for diamond chemical vapor deposition CVD . Zhu

  8. THE REMOVAL OF CARBON/BEUTERIUM FROM STAINLESS STEEL AND TUNGSTEN BY TRANSFERRED-ARC CLEANING

    SciTech Connect (OSTI)

    K. J. HOLLIS; R. G. CASTRO; ET AL

    2001-04-01T23:59:59.000Z

    Tungsten and stainless steel samples have been contaminated with deuterium and carbon to simulate deposited layers in magnetic-confinement fusion devices. Deuterium and carbon were co-deposited onto the sample surfaces using a deuterium plasma seeded with varying amounts of deuterated methane. Deuterium was also implanted into the samples in an accelerator to simulate hydrogen isotope ion implantation conditions in magnetic confinement fusion devices. Cathodic arc, or transferred-arc (TA) cleaning was employed to remove the deposits from the samples. The samples were characterized by ion beam analysis both before and after cleaning to determine deuterium and carbon concentrations present. The deuterium content was greatly reduced by the cleaning thus demonstrating the possibility of using the TA cleaning technique for removing deuterium and/or tritium from components exposed to D-T fuels. Removal of surface layers and significant reduction of subsurface carbon concentrations was also observed.

  9. Low voltage arc formation in railguns

    DOE Patents [OSTI]

    Hawke, R.S.

    1985-08-05T23:59:59.000Z

    A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile.

  10. Low voltage arc formation in railguns

    DOE Patents [OSTI]

    Hawke, R.S.

    1987-11-17T23:59:59.000Z

    A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile. 2 figs.

  11. Low voltage arc formation in railguns

    DOE Patents [OSTI]

    Hawke, Ronald S. (Livermore, CA)

    1987-01-01T23:59:59.000Z

    A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile.

  12. Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films

    SciTech Connect (OSTI)

    Van Bui, Hao, E-mail: H.VanBui@utwente.nl; Wiggers, Frank B.; Gupta, Anubha; Nguyen, Minh D.; Aarnink, Antonius A. I.; Jong, Michel P. de; Kovalgin, Alexey Y., E-mail: A.Y.Kovalgin@utwente.nl [MESA Institute for Nanotechnology, University of Twente, P. O. Box 217, 7500 AE Enschede (Netherlands)

    2015-01-01T23:59:59.000Z

    The authors have studied and compared the initial growth and properties of AlN films deposited on Si(111) by thermal and plasma-enhanced atomic layer deposition (ALD) using trimethylaluminum and either ammonia or a N{sub 2}-H{sub 2} mixture as precursors. In-situ spectroscopic ellipsometry was employed to monitor the growth and measure the refractive index of the films during the deposition. The authors found that an incubation stage only occurred for thermal ALD. The linear growth for plasma-enhanced ALD (PEALD) started instantly from the beginning due to the higher nuclei density provided by the presence of plasma. The authors observed the evolution of the refractive index of AlN during the growth, which showed a rapid increase up to a thickness of about 30?nm followed by a saturation. Below this thickness, higher refractive index values were obtained for AlN films grown by PEALD, whereas above that the refractive index was slightly higher for thermal ALD films. X-ray diffraction characterization showed a wurtzite crystalline structure with a (101{sup ¯}0) preferential orientation obtained for all the layers with a slightly better crystallinity for films grown by PEALD.

  13. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition

    SciTech Connect (OSTI)

    Abbasi-Firouzjah, M. [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of)] [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of); Shokri, B. [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of) [Laser and Plasma Research Institute, Shahid Beheshti University G.C., Evin, Tehran 1983963113 (Iran, Islamic Republic of); Physics Department, Shahid Beheshti University G.C., Evin, Tehran (Iran, Islamic Republic of)

    2013-12-07T23:59:59.000Z

    Low dielectric constant (low-k) silica based films were deposited on p-type silicon and polycarbonate substrates by radio frequency (RF) plasma enhanced chemical vapor deposition method at low temperature. A mixture of tetraethoxysilane vapor, oxygen, and tetrafluoromethane (CF{sub 4}) was used for the deposition of the films in forms of two structures called as SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z}. Properties of the films were controlled by amount of porosity and fluorine content in the film matrix. The influence of RF power and CF{sub 4} flow on the elemental composition, deposition rate, surface roughness, leakage current, refractive index, and dielectric constant of the films were characterized. Moreover, optical emission spectroscopy was applied to monitor the plasma process at the different parameters. Electrical characteristics of SiO{sub x}C{sub y} and SiO{sub x}C{sub y}F{sub z} films with metal-oxide-semiconductor structure were investigated using current-voltage analysis to measure the leakage current and breakdown field, as well as capacitance-voltage analysis to obtain the film's dielectric constant. The results revealed that SiO{sub x}C{sub y} films, which are deposited at lower RF power produce more leakage current, meanwhile the dielectric constant and refractive index of these films decreased mainly due to the more porosity in the film structure. By adding CF{sub 4} in the deposition process, fluorine, the most electronegative and the least polarized atom, doped into the silica film and led to decrease in the refractive index and the dielectric constant. In addition, no breakdown field was observed in the electrical characteristics of SiO{sub x}C{sub y}F{sub z} films and the leakage current of these films reduced by increment of the CF{sub 4} flow.

  14. Microwave plasma assisted supersonic gas jet deposition of thin film materials

    DOE Patents [OSTI]

    Schmitt, III, Jerome J. (New Haven, CT); Halpern, Bret L. (Bethany, CT)

    1993-01-01T23:59:59.000Z

    An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures.

  15. Stability measurements of PPL atmospheric pressure arc

    SciTech Connect (OSTI)

    Roquemore, L.; Zweben, S.J. [Princeton Plasma Physics Lab., NJ (United States); Wurden, G.A. [Los Alamos National Lab., NM (United States)

    1997-12-31T23:59:59.000Z

    Experiments on the stability of atmospheric pressure arcs have been started at PPL to understand and improve the performance of arc furnaces used for processing applications in metallurgy and hazardous waste treatment. Previous studies have suggested that the violent instabilities in such arcs may be due to kink modes. A 30 kW, 500 Amp CW DC experimental arc furnace was constructed with a graphite cathode and a molten steel anode. The arc plasma is diagnosed with 4000 frames/sec digital camera, Hall probes, and voltage and current monitors. Under certain conditions, the arc exhibits an intermittent helical instability, with the helix rotating at {approx}600 Hz. The nature of the instability is investigated. A possible instability mechanism is the self-magnetic field of the arc, with saturation occurring due to inhomogeneous heating in a helical arc. The effect of external DC and AC magnetic fields on the instability is investigated. Additionally, arc deflection due to external transverse magnetic field is investigated. The deflection angle is found to be proportional to the applied field, and is in good agreement with a simple model of the {rvec J} x {rvec b} force on the arc jet.

  16. Microwave plasma assisted supersonic gas jet deposition of thin film materials

    DOE Patents [OSTI]

    Schmitt, J.J. III; Halpern, B.L.

    1993-10-26T23:59:59.000Z

    An apparatus for fabricating thin film materials utilizing high speed gas dynamics relies on supersonic free jets of carrier gas to transport depositing vapor species generated in a microwave discharge to the surface of a prepared substrate where the vapor deposits to form a thin film. The present invention generates high rates of deposition and thin films of unforeseen high quality at low temperatures. 5 figures.

  17. Neutral beam dump with cathodic arc titanium gettering

    SciTech Connect (OSTI)

    Smirnov, A.; Korepanov, S. A.; Putvinski, S. [Tri Alpha Energy Inc., Rancho Santa Margarita, California 92688 (United States); Krivenko, A. S.; Murakhtin, S. V.; Savkin, V. Ya. [Budker Institute of Nuclear Physics, Novosibirsk 630090 (Russian Federation)

    2011-03-15T23:59:59.000Z

    An incomplete neutral beam capture can degrade the plasma performance in neutral beam driven plasma machines. The beam dumps mitigating the shine-through beam recycling must entrap and retain large particle loads while maintaining the beam-exposed surfaces clean of the residual impurities. The cathodic arc gettering, which provides high evaporation rate coupled with a fast time response, is a powerful and versatile technique for depositing clean getter films in vacuum. A compact neutral beam dump utilizing the titanium arc gettering was developed for a field-reversed configuration plasma sustained by 1 MW, 20-40 keV neutral hydrogen beams. The titanium evaporator features a new improved design. The beam dump is capable of handling large pulsed gas loads, has a high sorption capacity, and is robust and reliable. With the beam particle flux density of 5 x 10{sup 17} H/(cm{sup 2}s) sustained for 3-10 ms, the beam recycling coefficient, defined as twice the ratio of the hydrogen molecular flux leaving the beam dump to the incident flux of high-energy neutral atoms, is {approx}0.7. The use of the beam dump allows us to significantly reduce the recycling of the shine-through neutral beam as well as to improve the vacuum conditions in the machine.

  18. Mass densification and defect restoration in chemical vapor deposition silicon dioxide film using Ar plasma excited by microwave

    SciTech Connect (OSTI)

    Kawase, Kazumasa, E-mail: Kawase.Kazumasa@ak.MitsubishiElectric.co.jp; Motoya, Tsukasa; Uehara, Yasushi [Advanced Technology R and D Center, Mitsubishi Electric Corporation, 8-1-1 Tsukaguchi-honmachi, Amagasaki, Hyogo 661-8661 (Japan); Teramoto, Akinobu; Suwa, Tomoyuki; Ohmi, Tadahiro [New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba Aramaki, Aoba-ku, Sendai, Miyagi 980-8579 (Japan)

    2014-09-01T23:59:59.000Z

    Silicon dioxide (SiO{sub 2}) films formed by chemical vapor deposition (CVD) have been treated with Ar plasma excited by microwave. The changes of the mass densities, carrier trap densities, and thicknesses of the CVD-SiO{sub 2} films with the Ar plasma treatments were investigated. The mass density depth profiles were estimated with X-Ray Reflectivity (XRR) analysis using synchrotron radiation. The densities of carrier trap centers due to defects of Si-O bond network were estimated with X-ray Photoelectron Spectroscopy (XPS) time-dependent measurement. The changes of the thicknesses due to the oxidation of Si substrates were estimated with the XRR and XPS. The mass densities of the CVD-SiO{sub 2} films are increased by the Ar plasma treatments. The carrier trap densities of the films are decreased by the treatments. The thicknesses of the films are not changed by the treatments. It has been clarified that the mass densification and defect restoration in the CVD-SiO{sub 2} films are caused by the Ar plasma treatments without the oxidation of the Si substrates.

  19. PROCEDURES FOR ARC PROJECTS

    E-Print Network [OSTI]

    Collins, Gary S.

    PROCEDURES FOR ARC PROJECTS Revised - May 2013 Agricultural Research Center Washington State University #12;Table of Contents THE PROJECT SYSTEM, AN INTRODUCTION................................................................................. 5 DEVELOPING AN ARC PROJECT

  20. Plasma deposition of Ultrathin polymer films on carbon nanotubes Donglu Shia)

    E-Print Network [OSTI]

    Liu, Yijun

    Received 21 May 2002; accepted 18 October 2002 Ultrathin films of pyrrole were deposited on the surfaces properties.1­6 One of the important developments in nano- structures is the synthesis of carbon nanotubes

  1. Measurement and modeling of Ar/H2/CH4 arc jet discharge chemical vapor deposition reactors II: Modeling of the spatial dependence of expanded

    E-Print Network [OSTI]

    Bristol, University of

    and used to deposit thin films of polycrystalline diamond. This reactor has been the subject of many prior of micro- and nanocrystalline diamond and diamondlike carbon films. The model incorporates gas activation-containing radical species incident on the growing diamond surface C atoms and CH radicals within this reactor

  2. Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment

    SciTech Connect (OSTI)

    Huang, Hsin-Wei; Chang, Wen-Chih; Lin, Su-Jien; Chueh, Yu-Lun [Department of Materials Science Engineering and Center For Nanotechnology, Material Science, and Microsystem, National Tsing Hua University, Hsinchu 30013, Taiwan (China)

    2012-12-15T23:59:59.000Z

    An inductively coupled plasma technique (ICP), namely, remote-plasma treatment was introduced to ionize the water molecules as the precursor for the deposition of ZnO film via the atomic layer deposition processes. Compared with the H{sub 2}O gas as the precursor for the ALD growth, the ionized water molecules can provide a lesser energy to uniformly stabilize oxidization processes, resulting in a better film quality with a higher resistivity owing to less formation of intrinsic defects at a lower growth temperature. The relationship between resistivity and formation mechanisms have been discussed and investigated through analyses of atomic force microscopy, photonluminescence, and absorption spectra, respectively. Findings indicate that the steric hindrance of the ligands plays an important rule for the ALD-ZnO film sample with the ICP treatment while the limited number of bonding sites will be dominant for the ALD-ZnO film without the ICP treatment owing to decreasing of the reactive sites via the ligand-exchange reaction during the dissociation process. Finally, the enhanced aspect-ratio into the anodic aluminum oxide with the better improved uniform coating of ZnO layer after the ICP treatment was demonstrated, providing an important information for a promising application in electronics based on ZnO ALD films.

  3. Dense Metal Plasma in a Solenoid for Ion Beam Neutralization

    E-Print Network [OSTI]

    Anders, Andre

    2011-01-01T23:59:59.000Z

    Hutchinson, Principles of Plasma Diagnostics Cambridge, UK:magnetic field. III. PLASMA DIAGNOSTICS A. Photography Thediagnostics of vacuum arc cathode spots," IEEE Trans. Plasma

  4. Deposition of lithium on a plasma edge probe in TFTR -- Behavior of lithium-painted walls interacting with edge plasmas

    SciTech Connect (OSTI)

    Hirooka, Y. [Univ. of California, San Diego, La Jolla, CA (United States); Ashida, K. [Toyama Univ. (Japan); Kugel, H. [Princeton Univ., NJ (United States)] [and others

    1998-05-01T23:59:59.000Z

    Recent observations have indicated that lithium pellet injection wall conditioning plays an important role in achieving the enhanced supershot regime in TFTR. However, little is understood about the behavior of lithium-coated limiter walls, interacting with edge plasmas. In the final campaign of TFTR, a cylindrical carbon fiber composite probe was inserted into the boundary plasma region and exposed to ohmically-heated deuterium discharges with lithium pellet injection. The ion-drift side probe surface exhibits a sign of codeposition of lithium, carbon, oxygen, and deuterium, whereas the electron side essentially indicates high-temperature erosion. It is found that lithium is incorporated in these codeposits in the form of oxide at the concentration of a few percent. In the electron side, lithium has been found to penetrate deeply into the probe material, presumably via rapid diffusion through interplane spaces in the graphite crystalline. Though it is not conclusive, materials mixing in the carbon and lithium system appears to be a key process in successful lithium wall conditioning.

  5. E-Print Network 3.0 - arc welding system Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    welding system; (b) DSAW system and coordinate system. density of the arc energy... reduction as a primary goal. As can be seen in figure 1(a), a regular plasma arc welding (PAW)...

  6. Method for minimizing decarburization and other high temperature oxygen reactions in a plasma sprayed material

    DOE Patents [OSTI]

    Lenling, William J. (Madison, WI); Henfling, Joseph A. (Bosque Farms, NM); Smith, Mark F. (Albuquerque, NM)

    1993-06-08T23:59:59.000Z

    A method is disclosed for spray coating material which employs a plasma gun that has a cathode, an anode, an arc gas inlet, a first powder injection port, and a second powder injection port. A suitable arc gas is introduced through the arc gas inlet, and ionization of the arc gas between the cathode and the anode forms a plasma. The plasma is directed to emenate from an open-ended chamber defined by the boundary of the anode. A coating is deposited upon a base metal part by suspending a binder powder within a carrier gas that is fed into the plasma through the first powder injection port; a material subject to degradation by high temperature oxygen reactions is suspended within a carrier gas that is fed into the plasma through the second injection port. The material fed through the second injection port experiences a cooler portion of the plasma and has a shorter dwell time within the plasma to minimize high temperature oxygen reactions. The material of the first port and the material of the second port intermingle within the plasma to form a uniform coating having constituent percentages related to the powder-feed rates of the materials through the respective ports.

  7. Comparative band alignment of plasma-enhanced atomic layer deposited high-k dielectrics on gallium nitride

    SciTech Connect (OSTI)

    Yang Jialing; Eller, Brianna S.; Zhu Chiyu; England, Chris; Nemanich, Robert J. [Department of Physics, Arizona State University, Tempe, Arizona 85287-1504 (United States)

    2012-09-01T23:59:59.000Z

    Al{sub 2}O{sub 3} films, HfO{sub 2} films, and HfO{sub 2}/Al{sub 2}O{sub 3} stacked structures were deposited on n-type, Ga-face, GaN wafers using plasma-enhanced atomic layer deposition (PEALD). The wafers were first treated with a wet-chemical clean to remove organics and an in-situ combined H{sub 2}/N{sub 2} plasma at 650 Degree-Sign C to remove residual carbon contamination, resulting in a clean, oxygen-terminated surface. This cleaning process produced slightly upward band bending of 0.1 eV. Additional 650 Degree-Sign C annealing after plasma cleaning increased the upward band bending by 0.2 eV. After the initial clean, high-k oxide films were deposited using oxygen PEALD at 140 Degree-Sign C. The valence band and conduction band offsets (VBOs and CBOs) of the Al{sub 2}O{sub 3}/GaN and HfO{sub 2}/GaN structures were deduced from in-situ x-ray and ultraviolet photoemission spectroscopy (XPS and UPS). The valence band offsets were determined to be 1.8 and 1.4 eV, while the deduced conduction band offsets were 1.3 and 1.0 eV, respectively. These values are compared with the theoretical calculations based on the electron affinity model and charge neutrality level model. Moreover, subsequent annealing had little effect on these offsets; however, the GaN band bending did change depending on the annealing and processing. An Al{sub 2}O{sub 3} layer was investigated as an interfacial passivation layer (IPL), which, as results suggest, may lead to improved stability, performance, and reliability of HfO{sub 2}/IPL/GaN structures. The VBOs were {approx}0.1 and 1.3 eV, while the deduced CBOs were 0.6 and 1.1 eV for HfO{sub 2} with respect to Al{sub 2}O{sub 3} and GaN, respectively.

  8. Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels

    SciTech Connect (OSTI)

    Bolat, S., E-mail: bolat@ee.bilkent.edu.tr, E-mail: aokyay@ee.bilkent.edu.tr; Tekcan, B. [Department of Electrical and Electronics Engineering, Bilkent University, Ankara 06800 (Turkey); UNAM, National Nanotechnology Research Center, Bilkent University, Ankara 06800 (Turkey); Ozgit-Akgun, C.; Biyikli, N. [UNAM, National Nanotechnology Research Center, Bilkent University, Ankara 06800 (Turkey); Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800 (Turkey); Okyay, A. K., E-mail: bolat@ee.bilkent.edu.tr, E-mail: aokyay@ee.bilkent.edu.tr [Department of Electrical and Electronics Engineering, Bilkent University, Ankara 06800 (Turkey); UNAM, National Nanotechnology Research Center, Bilkent University, Ankara 06800 (Turkey); Institute of Materials Science and Nanotechnology, Bilkent University, Ankara 06800 (Turkey)

    2014-06-16T23:59:59.000Z

    We report GaN thin film transistors (TFT) with a thermal budget below 250?°C. GaN thin films are grown at 200?°C by hollow cathode plasma-assisted atomic layer deposition (HCPA-ALD). HCPA-ALD-based GaN thin films are found to have a polycrystalline wurtzite structure with an average crystallite size of 9.3?nm. TFTs with bottom gate configuration are fabricated with HCPA-ALD grown GaN channel layers. Fabricated TFTs exhibit n-type field effect characteristics. N-channel GaN TFTs demonstrated on-to-off ratios (I{sub ON}/I{sub OFF}) of 10{sup 3} and sub-threshold swing of 3.3?V/decade. The entire TFT device fabrication process temperature is below 250?°C, which is the lowest process temperature reported for GaN based transistors, so far.

  9. ZnO light-emitting diode grown by plasma-assisted metal organic chemical vapor deposition

    SciTech Connect (OSTI)

    Xu, W.Z.; Ye, Z.Z.; Zeng, Y.J.; Zhu, L.P.; Zhao, B.H.; Jiang, L.; Lu, J.G.; He, H.P.; Zhang, S.B. [State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027 (China); National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

    2006-04-24T23:59:59.000Z

    We report a breakthrough in fabricating ZnO homojunction light-emitting diode by metal organic chemical vapor deposition. Using NO plasma, we are able to grow p-type ZnO thin films on n-type bulk ZnO substrates. The as-grown films on glass substrates show hole concentration of 10{sup 16}-10{sup 17} cm{sup -3} and mobility of 1-10 cm{sup 2} V{sup -1} s{sup -1}. Room-temperature photoluminescence spectra reveal nitrogen-related emissions. A typical ZnO homojunction shows rectifying behavior with a turn-on voltage of about 2.3 V. Electroluminescence at room temperature has been demonstrated with band-to-band emission at I=40 mA and defect-related emissions in the blue-yellow spectrum range.

  10. Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy

    SciTech Connect (OSTI)

    Chaukulkar, Rohan P.; Rai, Vikrant R.; Agarwal, Sumit, E-mail: sagarwal@mines.edu [Department of Chemical and Biological Engineering, Colorado School of Mines, Golden, Colorado 80401 (United States); Thissen, Nick F. W. [Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven (Netherlands)

    2014-01-15T23:59:59.000Z

    Atomic layer deposition (ALD) is an ideal technique to deposit ultrathin, conformal, and continuous metal thin films. However, compared to the ALD of binary materials such as metal oxides and metal nitrides, the surface reaction mechanisms during metal ALD are not well understood. In this study, the authors have designed and implemented an in situ reflection-absorption infrared spectroscopy (IRAS) setup to study the surface reactions during the ALD of Cu on Al{sub 2}O{sub 3} using Cu hexafluoroacetylacetonate [Cu(hfac){sub 2}] and a remote H{sub 2} plasma. Our infrared data show that complete ligand-exchange reactions occur at a substrate temperature of 80?°C in the absence of surface hydroxyl groups. Based on infrared data and previous studies, the authors propose that Cu(hfac){sub 2} dissociatively chemisorbs on the Al{sub 2}O{sub 3} surface, where the Al-O-Al bridge acts as the surface reactive site, leading to surface O-Cu-hfac and O-Al-hfac species. Surface saturation during the Cu(hfac){sub 2} half-cycle occurs through blocking of the available chemisorption sites. In the next half-reaction cycle, H radicals from an H{sub 2} plasma completely remove these surface hfac ligands. Through this study, the authors have demonstrated the capability of in situ IRAS as a tool to study surface reactions during ALD of metals. While transmission and internal reflection infrared spectroscopy are limited to the first few ALD cycles, IRAS can be used to probe all stages of metal ALD starting from initial nucleation to the formation of a continuous film.

  11. Characterization of amorphous hydrogenated carbon nitride films prepared by plasma-enhanced chemical vapor deposition using a helical resonator discharge

    SciTech Connect (OSTI)

    Kim, J.H.; Ahn, D.H. [LG Electronics Research Center, 16 Woomyeon-Dong, Seocho-Gu, Seoul 137-140 (Korea)] [LG Electronics Research Center, 16 Woomyeon-Dong, Seocho-Gu, Seoul 137-140 (Korea); Kim, Y.H.; Baik, H.K. [Department of Metallurgical Engineering, Yonsei University, 134 Shinchon-dong, Seodaemun-ku, Seoul 120-749 (Korea)] [Department of Metallurgical Engineering, Yonsei University, 134 Shinchon-dong, Seodaemun-ku, Seoul 120-749 (Korea)

    1997-07-01T23:59:59.000Z

    Amorphous hydrogenated carbon nitride thin films (a-CN{sub x}:H) have been prepared by plasma-enhanced chemical vapor deposition of N{sub 2} and CH{sub 4} gases using a helical resonator discharge. The structural and optical properties of the deposited a-CN{sub x}:H films have been systematically studied as a function of the substrate temperature and radio frequency (rf) substrate bias. The chemical structure and elemental composition of the a-CN{sub x}:H films were characterized by Fourier transform infrared spectroscopy (FT-IR), x-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. The optical properties of the films were evaluated using transmission ultraviolet{endash}visible spectroscopy. The morphology of the films was investigated by scanning electron microscopy and atomic force microscopy. The FT-IR and XPS studies demonstrate the presence of carbon{endash}nitrogen bonds with hydrogenated components in the films. The film composition ratio N/C was found to vary from 0.127 to 0.213 depending on the deposition conditions. The Raman spectra, showing the G and D bands, indicate that the a-CN{sub x}:H films have a graphitic structure. It can be found that the optical band-gap E{sub g} of a-CN{sub x}:H films is associated with graphitic clusters, while the decrease in E{sub g} is correlated with an increase in the size and number of graphitic clusters. Combining the results of Raman and optical measurements, it can be concluded that a progressive graphitization of the films occurs with increasing the substrate temperature and rf substrate bias power, corresponding to bias voltage. {copyright} {ital 1997 American Institute of Physics.}

  12. Atomic layer deposition of Al{sub 2}O{sub 3} on GaSb using in situ hydrogen plasma exposure

    SciTech Connect (OSTI)

    Ruppalt, Laura B.; Cleveland, Erin R.; Champlain, James G.; Prokes, Sharka M.; Brad Boos, J.; Park, Doewon; Bennett, Brian R. [Electronics Science and Technology Division, Naval Research Laboratory, Washington, DC 20375 (United States)

    2012-12-03T23:59:59.000Z

    In this report, we study the effectiveness of hydrogen plasma surface treatments for improving the electrical properties of GaSb/Al{sub 2}O{sub 3} interfaces. Prior to atomic layer deposition of an Al{sub 2}O{sub 3} dielectric, p-GaSb surfaces were exposed to hydrogen plasmas in situ, with varying plasma powers, exposure times, and substrate temperatures. Good electrical interfaces, as indicated by capacitance-voltage measurements, were obtained using higher plasma powers, longer exposure times, and increasing substrate temperatures up to 250 Degree-Sign C. X-ray photoelectron spectroscopy reveals that the most effective treatments result in decreased SbO{sub x}, decreased Sb, and increased GaO{sub x} content at the interface. This in situ hydrogen plasma surface preparation improves the semiconductor/insulator electrical interface without the use of wet chemical pretreatments and is a promising approach for enhancing the performance of Sb-based devices.

  13. Real-time process sensing and metrology in amorphous and selective area silicon plasma enhanced chemical vapor deposition using in situ

    E-Print Network [OSTI]

    Rubloff, Gary W.

    Real-time process sensing and metrology in amorphous and selective area silicon plasma enhanced Materials Processing, North Carolina State University, Raleigh, North Carolina 27695 Received 11 July 1996 silicon deposition. The ability of mass spectrometry to observe process faults in real time is also

  14. Rotating arc spark plug

    DOE Patents [OSTI]

    Whealton, John H.; Tsai, Chin-Chi

    2003-05-27T23:59:59.000Z

    A spark plug device includes a structure for modification of an arc, the modification including arc rotation. The spark plug can be used in a combustion engine to reduce emissions and/or improve fuel economy. A method for operating a spark plug and a combustion engine having the spark plug device includes the step of modifying an arc, the modifying including rotating the arc.

  15. Plasma-enriched chemical vapor deposition of silicon nitride on silicon carbide fibers

    SciTech Connect (OSTI)

    Stinespring, C.D.; Collazos, D.F.; Gupta, R.K. [West Virginia Univ., Morgantown, WV (United States)] [and others

    1994-12-31T23:59:59.000Z

    Near stoichiometric Si:N coatings were deposited by means of PECVD on SCS-6 SiC fibers which contained a carbon-rich coating. Weight loss associated with oxidation of the outer carbon-rich coating of the as-received SiC fibers was greatly reduced for the Si:N coated SiC fibers even after 10 h heat-treatment in oxygen at 800{degrees}C. Auger Electron Spectroscopy (AES) was used to obtain elemental compositions of the as-received and Si:N coated SiC fibers after heat-treatment. Negligible amounts of oxygen were found at the carbon-rich coating of the heat-treated Si:N coated SiC fiber. These results clearly prove the effectiveness of PECVD silicon nitride coating as an oxygen diffusion barrier.

  16. DC arc weld starter

    DOE Patents [OSTI]

    Campiotti, Richard H. (Tracy, CA); Hopwood, James E. (Oakley, CA)

    1990-01-01T23:59:59.000Z

    A system for starting an arc for welding uses three DC power supplies, a high voltage supply for initiating the arc, an intermediate voltage supply for sustaining the arc, and a low voltage welding supply directly connected across the gap after the high voltage supply is disconnected.

  17. Theoretical analysis of ARC constriction

    SciTech Connect (OSTI)

    Stoenescu, M.L.; Brooks, A.W.; Smith, T.M.

    1980-12-01T23:59:59.000Z

    The physics of the thermionic converter is governed by strong electrode-plasma interactions (emissions surface scattering, charge exchange) and weak interactions (diffusion, radiation) at the maximum interelectrode plasma radius. The physical processes are thus mostly convective in thin sheaths in front of the electrodes and mostly diffusive and radiative in the plasma bulk. The physical boundaries are open boundaries to particle transfer (electrons emitted or absorbed by the electrodes, all particles diffusing through some maximum plasma radius) and to convective, conductive and radiative heat transfer. In a first approximation the thermionic converter may be described by a one-dimensional classical transport theory. The two-dimensional effects may be significant as a result of the sheath sensitivity to radial plasma variations and of the strong sheath-plasma coupling. The current-voltage characteristic of the converter is thus the result of an integrated current density over the collector area for which the boundary conditions at each r determine the regime (ignited/unignited) of the local current density. A current redistribution strongly weighted at small radii (arc constriction) limits the converter performance and opens questions on constriction reduction possibilities. The questions addressed are the followng: (1) what are the main contributors to the loss of current at high voltage in the thermionic converter; and (2) is arc constriction observable theoretically and what are the conditions of its occurrence. The resulting theoretical problem is formulated and results are given. The converter electrical current is estimated directly from the electron and ion particle fluxes based on the spatial distribution of the electron/ion density n, temperatures T/sub e/, T/sub i/, electrical voltage V and on the knowledge of the transport coefficients. (WHK)

  18. Plasma rotation and NTM onset driven by central EC deposition in TCV tokamak

    SciTech Connect (OSTI)

    Nowak, S.; Lazzaro, E. [Istituto di Fisica del Plasma CNR, Euratom Association, 20125 Milano (Italy); Sauter, O.; Canal, G.; Duval, B.; Federspiel, L.; Karpushov, A. N.; Kim, D.; Reimerders, H.; Rossel, J.; Testa, D.; Wagner, D. [Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas (CRPP), Association EURATOM-Confederation Suisse, 1015 Lausanne (Switzerland); Raju, D. [Institute for Plasma Research, Bhat, Gandhinagar, Gujarat (India); Collaboration: TCV Team

    2014-02-12T23:59:59.000Z

    The effects of the central electron cyclotron heating (ECH) and current drive (ECCD) on the spontaneous plasma rotation and on the presence of Tearing Modes (TM), observed in the TCV tokamak[1], were recently investigated as an interplay between the toroidal velocity and NTM onset in absence of sawteeth, ELMs and error fields [2–3]. In a set of reproducible TCV discharges (I{sub p}? ?150 kA, B{sub t}? ?1.4 T, ne,{sub av?} 1.5 10{sup 19} m{sup ?3}, T{sub e}? 3 keV and T{sub i}?0.25 keV, q{sub 95}?5.8) with both pure EC heating and current drive the cnt-Ip toroidal velocity was observed to be reduced with subsequent co-Ip appearance of 3/2 and 2/1 modes during the ramp up EC phases. The understanding of the capability of the on-axis EC power to modify the rotation profiles before and after the TM onset and of the sudden disappearance of 3/2 mode when 2/1 starts is the main purpose of this work. The velocity profile modifications are due to a direct effect of the EC absorbed power and also related to some variation of the perpendicular diffusion of the toroidal momentum and to magnetic braking effects of the kind of neoclassical toroidal viscosity (NTV) due to the NTM resonant field perturbations associated to the presence of TM. Numerical investigations are performed using a 1D toroidal momentum balance equation including contributions by external sources, as EC power, and NTV torques. Furthermore, the combined evolution of the 3/2 and 2/1 modes requires considering also coupling effects included in a generalized Rutherford equation for the modelling of the TM time growth.

  19. Characteristics of high-purity Cu thin films deposited on polyimide by radio-frequency Ar/H{sub 2} atmospheric-pressure plasma jet

    SciTech Connect (OSTI)

    Zhao, P. [Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561 (Japan); Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, Hefei 230031 (China); Zheng, W. [Research and Technology Center, Yazaki Corp., 1500 Misyuuku, Susono 410-1194 (Japan); Meng, Y. D. [Institute of Plasma Physics, Chinese Academy of Sciences, P.O. Box 1126, Hefei 230031 (China); Nagatsu, M. [Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561 (Japan)

    2013-03-28T23:59:59.000Z

    With a view to fabricating future flexible electronic devices, an atmospheric-pressure plasma jet driven by 13.56 MHz radio-frequency power is developed for depositing Cu thin films on polyimide, where a Cu wire inserted inside the quartz tube was used as the evaporation source. A polyimide substrate is placed on a water-cooled copper heat sink to prevent it from being thermally damaged. With the aim of preventing oxidation of the deposited Cu film, we investigated the effect of adding H{sub 2} to Ar plasma on film characteristics. Theoretical fitting of the OH emission line in OES spectrum revealed that adding H{sub 2} gas significantly increased the rotational temperature roughly from 800 to 1500 K. The LMM Auger spectroscopy analysis revealed that higher-purity Cu films were synthesized on polyimide by adding hydrogen gas. A possible explanation for the enhancement in the Cu film deposition rate and improvement of purity of Cu films by H{sub 2} gas addition is that atomic hydrogen produced by the plasma plays important roles in heating the gas to promote the evaporation of Cu atoms from the Cu wire and removing oxygen from copper oxide components via reduction reaction.

  20. Arc Position Sensing Technology

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    are often caused by solidification problems that arise during the melting and refining process. A common problem is arc constriction during melting. Previously, these...

  1. Properties of tungsten oxide thin films formed by ion-plasma and laser deposition methods for MOSiC-based hydrogen sensors

    SciTech Connect (OSTI)

    Fominski, V. Y., E-mail: vyfominskij@mephi.ru [National Research Nuclear University 'MEPhI' (Russian Federation); Grigoriev, S. N. [Moscow State Technological University 'Stankin' (Russian Federation); Romanov, R. I.; Zuev, V. V.; Grigoriev, V. V. [National Research Nuclear University 'MEPhI' (Russian Federation)

    2012-03-15T23:59:59.000Z

    Thin-film structures based on gas-sensitive tungsten oxide and catalytic platinum are fabricated by room-temperature deposition on a silicon carbide wafer using pulsed laser and ion-plasma methods. Oxide layer annealing in air to 600 Degree-Sign C caused the formation of microstructured and nanostructured crystalline states depending on the deposition conditions. Structural differences affect the electrical parameters and the stability of characteristics. The maximum response to hydrogen is detected in the structure fabricated by depositing a low-energy laser-induced flow of tungsten atoms in oxygen. The voltage shift of the currentvoltage curves for 2% H{sub 2} in air at 350 Degree-Sign C was 4.6 V at a current of {approx}10 {mu}A. The grown structures' metastability caused a significant decrease in the shift after long-term cyclic testing. The most stable shifts of {approx}2 V at positive bias on the Pt contact were detected for oxide films deposited by ion-plasma sputtering.

  2. Interface effect on dielectric constant of HfO{sub 2}/Al{sub 2}O{sub 3} nanolaminate films deposited by plasma-enhanced atomic layer deposition

    SciTech Connect (OSTI)

    Park, Pan Kwi; Cha, Eun-Soo; Kang, Sang-Won [Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of)

    2007-06-04T23:59:59.000Z

    The effect of the interface between Al{sub 2}O{sub 3} and HfO{sub 2} sublayers on the dielectric constant was investigated in HfO{sub 2}/Al{sub 2}O{sub 3} nanolaminate films deposited using plasma-enhanced atomic layer deposition. After annealing at 700 deg. C, the dielectric constants of the nanolaminate films with a sublayer thickness of 40 A ring or greater were the same as the calculated values for a series of capacitors consisting of amorphous Al{sub 2}O{sub 3} and monoclinic or tetragonal HfO{sub 2}. As the sublayer thickness was reduced to 10 A, the dielectric constant increased up to 17.7 because a thin Hf-O-Al mixture layer, of which the number increases drastically in the nanolaminate films with thin sublayers, is formed at the interface.

  3. Welding arc initiator

    DOE Patents [OSTI]

    Correy, Thomas B. (Richland, WA)

    1989-01-01T23:59:59.000Z

    An improved inert gas shielded tungsten arc welder is disclosed of the type wherein a tungsten electrode is shielded within a flowing inert gas, and, an arc, following ignition, burns between the energized tungsten electrode and a workpiece. The improvement comprises in combination with the tungsten electrode, a starting laser focused upon the tungsten electrode which to ignite the electrode heats a spot on the energized electrode sufficient for formation of a thermionic arc. Interference problems associated with high frequency starters are thus overcome.

  4. Welding arc initiator

    DOE Patents [OSTI]

    Correy, T.B.

    1989-05-09T23:59:59.000Z

    An improved inert gas shielded tungsten arc welder is disclosed of the type wherein a tungsten electrode is shielded within a flowing inert gas, and, an arc, following ignition, burns between the energized tungsten electrode and a workpiece. The improvement comprises in combination with the tungsten electrode, a starting laser focused upon the tungsten electrode which to ignite the electrode heats a spot on the energized electrode sufficient for formation of a thermionic arc. Interference problems associated with high frequency starters are thus overcome. 3 figs.

  5. Electric arc saw apparatus

    DOE Patents [OSTI]

    Deichelbohrer, Paul R [Richland, WA

    1986-01-01T23:59:59.000Z

    A portable, hand held electric arc saw has a small frame for supporting an electrically conducting rotary blade which serves as an electrode for generating an electric arc to erode a workpiece. Electric current is supplied to the blade by biased brushes and a slip ring which are mounted in the frame. A pair of freely movable endless belts in the form of crawler treads stretched between two pulleys are used to facilitate movement of the electric arc saw. The pulleys are formed of dielectric material to electrically insulate the crawler treads from the frame.

  6. Infrared study on room-temperature atomic layer deposition of HfO{sub 2} using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents

    SciTech Connect (OSTI)

    Kanomata, Kensaku [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan and Japan Society for the Promotion of Science, 5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083 (Japan); Ohba, Hisashi; Pungboon Pansila, P.; Ahmmad, Bashir; Kubota, Shigeru; Hirahara, Kazuhiro; Hirose, Fumihiko, E-mail: fhirose@yz.yamagata-u.ac.jp [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510 (Japan)

    2015-01-01T23:59:59.000Z

    Room-temperature atomic layer deposition (ALD) of HfO{sub 2} was examined using tetrakis (ethylmethylamino)hafnium (TEMAH) and remote plasma-excited water and oxygen. A growth rate of 0.26?nm/cycle at room temperature was achieved, and the TEMAH adsorption and its oxidization on HfO{sub 2} were investigated by multiple internal reflection infrared absorption spectroscopy. It was observed that saturated adsorption of TEMAH occurs at exposures of ?1?×?10{sup 5}?L (1 L?=?1?×?10{sup ?6} Torr s) at room temperature, and the use of remote plasma-excited water and oxygen vapor is effective in oxidizing the TEMAH molecules on the HfO{sub 2} surface, to produce OH sites. The infrared study suggested that Hf–OH plays a role as an adsorption site for TEMAH. The reaction mechanism of room temperature HfO{sub 2} ALD is discussed in this paper.

  7. Properties of c-C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Arc-C4F8 O2 discharges

    E-Print Network [OSTI]

    Kushner, Mark

    to experiments for validation. The consequences of charge exchange of fluorocarbon species with Ar and CO on the ratio of light to heavy fluorocarbon ion densities in Ar/c-C4F8 /O2 /CO plasmas are discussed. We found but weakly depend on the addition of O2 . The ratio of light to heavy fluorocarbon ion densities increases

  8. Effects of N{sub 2} remote plasma nitridation on the structural and electrical characteristics of the HfO{sub 2} gate dielectrics grown using remote plasma atomic layer deposition methods

    SciTech Connect (OSTI)

    Choi, Jihoon; Kim, Seokhoon; Kim, Jinwoo; Kang, Hyunseok; Jeon, Hyeongtag; Bae, Choelhwyi [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Physics, North Carolina State University, Raleigh, North Carolina 27695 (United States)

    2006-07-15T23:59:59.000Z

    The characteristics of remote plasma atomic layer deposited HfO{sub 2} on Si, which has a very thin SiO{sub 2} interlayer with and without remote plasma nitridation (RPN), have been investigated. Small amounts of N atoms were successfully incorporated by RPN pretreatment, in which the dominant emission species were excited atomic nitrogen (N{sup *}) and excited molecular nitrogen (N{sub 2}{sup *}), into a very thin SiO{sub 2} interlayer for the growth of HfO{sub 2} thin film. The thin ({approx}1.5 nm) intermediate layer containing nitrogen, which was prepared by sequential O{sub 2} and N{sub 2} remote plasma treatment of the Si substrate, can effectively suppress growth of the unintentional interface layer. In addition, it enhances the thermal stability and the resistance to oxygen diffusion during rapid thermal annealing. The HfO{sub 2} film containing the remote plasma nitrided SiO{sub 2} interlayer annealed at 800 deg. C showed a lower equivalent oxide thickness of {approx}1.89 nm and a lower leakage current density (3.78x10{sup -7} A cm{sup -2} at |V{sub G}-V{sub FB}|=2 V) compared to a non-nitrided sample of the same physical thickness. Also, we compared the characteristics of HfO{sub 2} films annealed in two different ambient environments, N{sub 2} and O{sub 2}.

  9. MICROCAVITYMICROCAVITY PLASMA SCIENCE AND RECENTPLASMA SCIENCE AND RECENT APPLICATIONS: BOUNDAPPLICATIONS: BOUND--FREE COUPLING, TRANSISTORFREE COUPLING, TRANSISTOR

    E-Print Network [OSTI]

    Shyy, Wei

    Plasma Surface Treatment High Intensity Plasma Arc Lamp Spark Gap Plasma Display (150 inch Panasonic Electrode Glass6 mm 250 m LED Backlight Microcavity Lamp #12;OPERATION OF MICROCAVITY PLASMA DEVICESMICROCAVITYMICROCAVITY PLASMA SCIENCE AND RECENTPLASMA SCIENCE AND RECENT APPLICATIONS

  10. A COUPLED APPROACH FOR THE MODELLING OF ARC WELDING Christel Pequet1

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    A COUPLED APPROACH FOR THE MODELLING OF ARC WELDING PROCESSES Christel Pequet1 , Patrice Lasne1 ; email : michel.bellet@ensmp.fr Keywords: welding, finite elements, thermal arising in arc welding as well as their interaction: heat input, metal deposit, solidification, phase

  11. College of Design ARC Architecture

    E-Print Network [OSTI]

    MacAdam, Keith

    College of Design ARC Architecture KEY: # = new course * = course changed = course dropped,landscape,andarchitecturalspaceswithattentiontotheirapplicationtothearchitecturalexperience.Studio:4hoursperweek. Prereq: Admission to the School of Architecture. ARC 102 DRAWING II: OBSERVATIONAL OF ARCHITECTURE. (3

  12. Growth mechanisms of carbon nanotrees with branched carbon nanofibers synthesized by plasma-enhanced chemical vapour deposition

    E-Print Network [OSTI]

    Boyer, Edmond

    be interesting for future applications in nanoelectronic devices and also composite materials. hal-008807221 Growth mechanisms of carbon nanotrees with branched carbon nanofibers synthesized by plasma , Didier Pribat*, 3 1 State Key Laboratory for Advanced Metals and Materials, University of Science

  13. Field emission properties of the polycrystalline diamond film prepared by microwave-assisted plasma chemical vapor deposition

    E-Print Network [OSTI]

    Lee, Jong Duk

    Field emission properties of the polycrystalline diamond film prepared by microwave-assisted plasma Field emission characteristics for the diamond films grown using a gas mixture of different methane V 3.0 V/ m and 9 V 5.5 V/ m , respectively, for the diamond emitter of a little poor quality grown

  14. Deposition of TiO2 thin films by atmospheric plasma post-discharge assisted injection MOCVD

    E-Print Network [OSTI]

    Boyer, Edmond

    -discharge is sent away from electrodes confinement [3]. In this work, we have combined these two systems working combines remote Atmospheric Pressure (AP) Plasma with Pulsed Injection Metallorganic Chemical Vapour developed Pulsed Injection MOCVD [1] method, based on a liquid delivery system controlled by a high speed

  15. JOURNAL DE PHYSIQUE CoZZoque C7, suppZ6ment au n07, Tome 40, JuiZZet 1979, page C7-243 THE ARC DIAMETER AND RATE OF ROTATIONff A MAGNETICALLY

    E-Print Network [OSTI]

    Boyer, Edmond

    A magnetically rotated arc heater producing a uniformly heated and highly turbulent hydrogen plasma is briefly. A magnetically rotated arc heater with hydrogen as the plasma working fluid has been developed for use in ffi 7 = 40°. mined. 2. Apparatus and procedure The arc heater (Figure 1)consisted of a non-transferred. d. c

  16. Highly transparent low capacitance plasma enhanced atomic layer deposition Al{sub 2}O{sub 3}-HfO{sub 2} tunnel junction engineering

    SciTech Connect (OSTI)

    El Hajjam, Khalil, E-mail: khalil.el-hajjam@insa-lyon.fr [INL, INSA, UMR CNRS 5270, 7 Avenue Jean Capelle, 69621 Villeurbanne Cedex, France and Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec (Canada); Baboux, Nicolas; Calmon, Francis [INL, INSA, UMR CNRS 5270, 7 Avenue Jean Capelle, 69621 Villeurbanne Cedex (France); Souifi, Abdelkader [Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463, Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec (Canada); Poncelet, Olivier; Francis, Laurent A. [ICTEAM, ELEN, UCL, Place du Levant 3, 1348 Louvain-la-Neuve (Belgium); Ecoffey, Serge; Drouin, Dominique [Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463, Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec, Canada and Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec (Canada)

    2014-01-15T23:59:59.000Z

    The development of metallic single electron transistor (SET) depends on the downscaling and the electrical properties of its tunnel junctions. These tunnel junctions should insure high tunnel current levels, low thermionic current, and low capacitance. The authors use atomic layer deposition to fabricate Al{sub 2}O{sub 3} and HfO{sub 2} thin layers. Tunnel barrier engineering allows the achievement of low capacitance Al{sub 2}O{sub 3} and HfO{sub 2} tunnel junctions using optimized annealing and plasma exposure conditions. Different stacks were designed and fabricated to increase the transparency of the tunnel junction while minimizing thermionic current. This tunnel junction is meant to be integrated in SET to enhance its electrical properties (e.g., operating temperature, I{sub ON}/I{sub OFF} ratio)

  17. E-Print Network 3.0 - arc discharge effects Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    de mathmatiques Collection: Mathematics 5 Gliding arc in tornado using a reverse vortex flow Chiranjeev S. Kalra, Young I. Cho,a Summary: nonequilib- rium plasma is to use...

  18. E-Print Network 3.0 - arc discharge ion Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    of Texas at Austin Collection: Engineering 8 Gliding arc in tornado using a reverse vortex flow Chiranjeev S. Kalra, Young I. Cho,a Summary: nonequilib- rium plasma is to use...

  19. Controlling electrode gap during vacuum arc remelting at low melting current

    DOE Patents [OSTI]

    Williamson, R.L.; Zanner, F.J.; Grose, S.M.

    1997-04-15T23:59:59.000Z

    An apparatus and method are disclosed for controlling electrode gap in a vacuum arc remelting furnace, particularly at low melting currents. Spectrographic analysis is performed of the metal vapor plasma, from which estimates of electrode gap are derived. 5 figs.

  20. Controlling electrode gap during vacuum arc remelting at low melting current

    DOE Patents [OSTI]

    Williamson, Rodney L. (Albuquerque, NM); Zanner, Frank J. (Sandia Park, NM); Grose, Stephen M. (Glenwood, WV)

    1997-01-01T23:59:59.000Z

    An apparatus and method for controlling electrode gap in a vacuum arc remelting furnace, particularly at low melting currents. Spectrographic analysis is performed of the metal vapor plasma, from which estimates of electrode gap are derived.

  1. Hall-effect arc protector

    DOE Patents [OSTI]

    Rankin, Richard A. (Ammon, ID); Kotter, Dale K. (Shelley, ID)

    1997-01-01T23:59:59.000Z

    The Hall-Effect Arc Protector is used to protect sensitive electronics from high energy arcs. The apparatus detects arcs by monitoring an electrical conductor, of the instrument, for changes in the electromagnetic field surrounding the conductor which would be indicative of a possible arcing condition. When the magnitude of the monitored electromagnetic field exceeds a predetermined threshold, the potential for an instrument damaging are exists and the control system logic activates a high speed circuit breaker. The activation of the breaker shunts the energy imparted to the input signal through a dummy load to the ground. After the arc condition is terminated, the normal signal path is restored.

  2. Hall-effect arc protector

    DOE Patents [OSTI]

    Rankin, R.A.; Kotter, D.K.

    1997-05-13T23:59:59.000Z

    The Hall-Effect Arc Protector is used to protect sensitive electronics from high energy arcs. The apparatus detects arcs by monitoring an electrical conductor, of the instrument, for changes in the electromagnetic field surrounding the conductor which would be indicative of a possible arcing condition. When the magnitude of the monitored electromagnetic field exceeds a predetermined threshold, the potential for an instrument damaging are exists and the control system logic activates a high speed circuit breaker. The activation of the breaker shunts the energy imparted to the input signal through a dummy load to the ground. After the arc condition is terminated, the normal signal path is restored. 2 figs.

  3. Controlled zone microwave plasma system

    DOE Patents [OSTI]

    Ripley, Edward B. (Knoxville, TN); Seals, Roland D. (Oak Ridge, TN); Morrell, Jonathan S. (Knoxville, TN)

    2009-10-20T23:59:59.000Z

    An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

  4. Self-organisation Processes In The Carbon ARC For Nanosynthis

    SciTech Connect (OSTI)

    Ng, Jonathan; Raitses, Yevgeny

    2014-02-26T23:59:59.000Z

    The atmospheric pressure carbon arc in inert gases such as helium is an important method for the production of nanomaterials. It has recently been shown that the formation of the carbon deposit on the cathode from gaseous carbon plays a crucial role in the operation of the arc, reaching the high temperatures necessary for thermionic emission to take place even with low melting point cathodes. Based on observed ablation and deposition rates, we explore the implications of deposit formation on the energy balance at the cathode surface, and show how the operation of the arc is self-organised process. Our results suggest that the can arc operate in two di erent regimes, one of which has an important contribution from latent heat to the cathode energy balance. This regime is characterised by the enhanced ablation rate, which may be favourable for high yield synthesis of nanomaterials. The second regime has a small and approximately constant ablation rate with a negligible contribution from latent heat.

  5. Self-organisation Processes In The Carbon ARC For Nanosynthis

    SciTech Connect (OSTI)

    Ng, J.; Raitses, Yefgeny [Princeton Plasma Physics Lab., Princeton, NJ (United States)

    2014-02-02T23:59:59.000Z

    The atmospheric pressure carbon arc in inert gases such as helium is an important method for the production of nanomaterials. It has recently been shown that the formation of the carbon deposit on the cathode from gaseous carbon plays a crucial role in the operation of the arc, reaching the high temperatures necessary for thermionic emission to take place even with low melting point cathodes. Based on observed ablation and deposition rates, we explore the implications of deposit formation on the energy balance at the cathode surface, and show how the operation of the arc is self-organised process. Our results suggest that the can arc operate in two di erent regimes, one of which has an important contribution from latent heat to the cathode energy balance. This regime is characterised by the enhanced ablation rate, which may be favourable for high yield synthesis of nanomaterials. The second regime has a small and approximately constant ablation rate with a negligible contribution from latent heat.

  6. MIT Lincoln Laboratory Plasma and Ions-1

    E-Print Network [OSTI]

    Wurtman, Richard

    them anions · Fire, lightning, fluorescent lamps, and the Sun and stars all contain plasma ­ In fact include fluorescent lamps, neon signs, plasma globes, plasma TVs ­ They easily form at room temperature lightning carbon arc nuclear blast #12;MIT Lincoln LaboratoryPlasma and Ions-4 A. Siegel 5/12/07 How Does

  7. Thermocapillary and arc phenomena in stainless steel welds

    SciTech Connect (OSTI)

    Pierce, S.W.

    1993-10-01T23:59:59.000Z

    Goal was to study effect of power level and distribution on thermocapiilary-induced weld shape and of arc factors on weld shape. Thermocapillarity was apparent in both conduction mode EB welds and GTA welds, particularly in the former. A non-Gaussian arc distribution is suggested for accounting for the differences between the twoss processes. At higher current levels (200--300 A), plasma shear force also contributes to weld shape development. Evidence suggests that thermocapillary flow reversal is not a factor in normal GTA welds; EDB flow reversal occurs only at high power density levels where the keyhole mode is present.

  8. Arc Position Sensing

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmospheric Optical Depth (AOD)ProductssondeadjustsondeadjustAbout theOFFICEAmesApplication2 (CRAC 2 period)Office2Arbitrary FunctionArc

  9. Nanocrystalline-Si-dot multi-layers fabrication by chemical vapor deposition with H-plasma surface treatment and evaluation of structure and quantum confinement effects

    SciTech Connect (OSTI)

    Kosemura, Daisuke, E-mail: d-kose@isc.meiji.ac.jp; Mizukami, Yuki; Takei, Munehisa; Numasawa, Yohichiroh; Ogura, Atsushi [School of Science and Technology, Meiji University, Kawasaki 214-8571 (Japan)] [School of Science and Technology, Meiji University, Kawasaki 214-8571 (Japan); Ohshita, Yoshio [Toyota Technological Institute, Nagoya 468-8511 (Japan)] [Toyota Technological Institute, Nagoya 468-8511 (Japan)

    2014-01-15T23:59:59.000Z

    100-nm-thick nanocrystalline silicon (nano-Si)-dot multi-layers on a Si substrate were fabricated by the sequential repetition of H-plasma surface treatment, chemical vapor deposition, and surface oxidation, for over 120 times. The diameter of the nano-Si dots was 5–6 nm, as confirmed by both the transmission electron microscopy and X-ray diffraction analysis. The annealing process was important to improve the crystallinity of the nano-Si dot. We investigated quantum confinement effects by Raman spectroscopy and photoluminescence (PL) measurements. Based on the experimental results, we simulated the Raman spectrum using a phenomenological model. Consequently, the strain induced in the nano-Si dots was estimated by comparing the experimental and simulated results. Taking the estimated strain value into consideration, the band gap modulation was measured, and the diameter of the nano-Si dots was calculated to be 5.6 nm by using PL. The relaxation of the q ? 0 selection rule model for the nano-Si dots is believed to be important to explain both the phenomena of peak broadening on the low-wavenumber side observed in Raman spectra and the blue shift observed in PL measurements.

  10. Automated Vacuum Ion-Plasma Setup “TRIO” for Making Nanostructure Coatings

    E-Print Network [OSTI]

    unknown authors

    Abstract – Principle of operation, construction and main parameters of new vacuum ion-plasma setup for arc nitriding and plasma-assisted deposition of such nanostructure coatings as TiAlN, TiCuN on metal substrate are considered. The new setup is assigned for scientific researches with multicom-ponent composite cathode for generation of strain-hardening and protective coatings on tools. The setup is fully automated for high repeatability of complex technological processes. The operating program has planning sheet which contains up to 300 steps in common technological process. The plasma source with heated cathode (PINK) and switch-mode power supply for high-voltage bias on substrate give the opportunity to carry out ion cleaning, etching and activation of substrate sur-face, arc nitriding of tools. There is the opportunity to operate by the inleakage of 2 different gases in necessary proportions. Switch-mode power sup-plies provide stable values of composite cathode currents and automatic discharge initiation in case of arc starvation. The setup main parameters, technical characteristics and supposed application fields are presented. 1.

  11. Characteristics of arcs between porous carbon electrodes E. CARVOU, J.L. Le GARREC, J. B.A. MITCHELL

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    develops into a full blown arc. The very high temperature in the arc (>6000°C) and the subsequent violent Transactions on Plasma Science, 99 (2013) 1-8" DOI : 10.1109/TPS.2013.2283581 #12;2 cable faults in order

  12. Arc fault detection system

    DOE Patents [OSTI]

    Jha, Kamal N. (Bethel Park, PA)

    1999-01-01T23:59:59.000Z

    An arc fault detection system for use on ungrounded or high-resistance-grounded power distribution systems is provided which can be retrofitted outside electrical switchboard circuits having limited space constraints. The system includes a differential current relay that senses a current differential between current flowing from secondary windings located in a current transformer coupled to a power supply side of a switchboard, and a total current induced in secondary windings coupled to a load side of the switchboard. When such a current differential is experienced, a current travels through a operating coil of the differential current relay, which in turn opens an upstream circuit breaker located between the switchboard and a power supply to remove the supply of power to the switchboard.

  13. Arc fault detection system

    DOE Patents [OSTI]

    Jha, K.N.

    1999-05-18T23:59:59.000Z

    An arc fault detection system for use on ungrounded or high-resistance-grounded power distribution systems is provided which can be retrofitted outside electrical switchboard circuits having limited space constraints. The system includes a differential current relay that senses a current differential between current flowing from secondary windings located in a current transformer coupled to a power supply side of a switchboard, and a total current induced in secondary windings coupled to a load side of the switchboard. When such a current differential is experienced, a current travels through a operating coil of the differential current relay, which in turn opens an upstream circuit breaker located between the switchboard and a power supply to remove the supply of power to the switchboard. 1 fig.

  14. amorphous carbon deposited: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    The contamination was believed 2 NICKELHYDROGENATED AMORPHOUS CARBON COMPOSITE FILMS DEPOSITED IN ACETYLENEARGON MICROWAVE PLASMA DISCHARGE CiteSeer Summary:...

  15. Oxygen and Nitrogen Contamination During Arc Welding

    E-Print Network [OSTI]

    Eagar, Thomas W.

    ) ) : ,- Oxygen and Nitrogen Contamination During Arc Welding T. W. Eagar Department of }faterials, shielded metal arc, self-shielded metal arc, and submerged arc welding are reviewed. Calcu- lations upon heating is also discussed. Introduction Oxygen and nitrogen ~ontamination of weld metal

  16. Hydrologic Modeling with Arc Hydro Tools 1 Copyright 2007 ESRI. All rights reserved. Arc Hydro

    E-Print Network [OSTI]

    Kane, Andrew S.

    Hydrologic Modeling with Arc Hydro Tools 1 Copyright © 2007 ESRI. All rights reserved. Arc Hydro Arc Hydro: GIS in Water Resources Seminar/Workshop Gainesville, Florida ­ November 15, 2007 Christine Dartiguenave, ESRI inc. cdartiguenave@esri.com #12;Hydrologic Modeling with Arc Hydro Tools 2 2Arc Hydro

  17. Percussive arc welding apparatus

    DOE Patents [OSTI]

    Hollar, Jr., Donald L. (Overland Park, KS)

    2002-01-01T23:59:59.000Z

    A percussive arc welding apparatus includes a generally cylindrical actuator body having front and rear end portions and defining an internal recess. The front end of the body includes an opening. A solenoid assembly is provided in the rear end portion in the internal recess of the body, and an actuator shaft assembly is provided in the front end portion in the internal recess of the actuator body. The actuator shaft assembly includes a generally cylindrical actuator block having first and second end portions, and an actuator shaft having a front end extending through the opening in the actuator body, and the rear end connected to the first end portion of the actuator block. The second end portion of the actuator block is in operational engagement with the solenoid shaft by a non-rigid connection to reduce the adverse rebound effects of the actuator shaft. A generally transversely extending pin is rigidly secured to the rear end of the shaft. One end of the pin is received in a slot in the nose housing sleeve to prevent rotation of the actuator shaft during operation of the apparatus.

  18. Planar controlled zone microwave plasma system

    DOE Patents [OSTI]

    Ripley, Edward B. (Knoxville, TN); Seals, Roland D. (Oak Ridge, TN); Morrell, Jonathan S. (Knoxvlle, TN)

    2011-10-04T23:59:59.000Z

    An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

  19. Rifting of the Izu-Bonin arc in the Quaternary and Mid-Oligocene

    SciTech Connect (OSTI)

    Taylor, B. (Univ. of Hawaii, Honolulu (USA))

    1990-06-01T23:59:59.000Z

    Eruption of middle Eocene-lower Oligocene boninites and island arc tholeiites created the 200 km wide Izu-Bonin arc massif following the initiation of subduction {approximately}50 Ma. Mid-Oligocene rifting formed a 40-70 km wide forearc basin between the Eocene outer-arc high and the Eo-Oligocene arc (now the frontal arc high), with maximum extension at the latitudes of the Bonin Ridge and Trough. The Oligocene forearc basin was rapidly (100-300 m/m.y.) filled with turbidite and debris flow deposits produced by concurrent volcanism and erosion of the surrounding highs. Contemporaneous stretching in the backarc region produced dominantly east-dipping, NNE-trending, normal faults and culminated in backarc spreading in the Shikoku basin (25-15 Ma), isolating the Palau-Kyushu remnant arc. The forearc and remnant arc sediments record a dearth of volcanogenic input between 23 and 17 Ma; evidence that an arc volcanic minimum accompanied backarc spreading. The middle Miocene to Recent volcanic front formed 0(S)-50(N) km west of the Oligocene arc and has loaded and flexed the forearc. Further west, chains of submarine volcanoes erupted along the extension of Shikoku basin fracture zones. Basaltic sills were emplaced in the forearc. Explosive volcanism from rhyolitic calderas has increased dramatically since the late Pliocene, especially in the last 0.2 Ma. Since {approximately}2 Ma the arc has been stretched again, producing rapidly subsiding (300-2,250 m/m.y.) graben, immediately west of the volcanic front, which are segmented along strike by oblique transfer zones. The Sumisu Rift is partially filled with (<1.5 Ma) volcaniclastic turbidites and hemipelagic sediments and is intruded by backarc basin basalts. About 1 km of syn-rift uplift of the arc margin footwall has produced an unconformity, beneath surficial pumice, that extends back to pumiceous sediments >2.35 Ma.

  20. Gold nanoparticle formation in diamond-like carbon using two different methods: Gold ion implantation and co-deposition of gold and carbon

    SciTech Connect (OSTI)

    Salvadori, M. C.; Teixeira, F. S.; Araujo, W. W. R.; Sgubin, L. G.; Cattani, M. [Institute of Physics, University of Sao Paulo, CP 66318, CEP 05315-970 Sao Paulo, SP (Brazil); Spirin, R. E. [Polytechnic School, University of Sao Paulo, CEP 05508-900 Sao Paulo (Brazil); Brown, I. G. [Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)

    2012-10-01T23:59:59.000Z

    We describe work in which gold nanoparticles were formed in diamond-like carbon (DLC), thereby generating a Au-DLC nanocomposite. A high-quality, hydrogen-free DLC thin film was formed by filtered vacuum arc plasma deposition, into which gold nanoparticles were introduced using two different methods. The first method was gold ion implantation into the DLC film at a number of decreasing ion energies, distributing the gold over a controllable depth range within the DLC. The second method was co-deposition of gold and carbon, using two separate vacuum arc plasma guns with suitably interleaved repetitive pulsing. Transmission electron microscope images show that the size of the gold nanoparticles obtained by ion implantation is 3-5 nm. For the Au-DLC composite obtained by co-deposition, there were two different nanoparticle sizes, most about 2 nm with some 6-7 nm. Raman spectroscopy indicates that the implanted sample contains a smaller fraction of sp{sup 3} bonding for the DLC, demonstrating that some sp{sup 3} bonds are destroyed by the gold implantation.

  1. High pressure neon arc lamp

    DOE Patents [OSTI]

    Sze, Robert C.; Bigio, Irving J.

    2003-07-15T23:59:59.000Z

    A high pressure neon arc lamp and method of using the same for photodynamic therapies is provided. The high pressure neon arc lamp includes a housing that encloses a quantity of neon gas pressurized to about 500 Torr to about 22,000 Torr. At each end of the housing the lamp is connected by electrodes and wires to a pulse generator. The pulse generator generates an initial pulse voltage to breakdown the impedance of the neon gas. Then the pulse generator delivers a current through the neon gas to create an electrical arc that emits light having wavelengths from about 620 nanometers to about 645 nanometers. A method for activating a photosensitizer is provided. Initially, a photosensitizer is administered to a patient and allowed time to be absorbed into target cells. Then the high pressure neon arc lamp is used to illuminate the target cells with red light having wavelengths from about 620 nanometers to about 645 nanometers. The red light activates the photosensitizers to start a chain reaction that may involve oxygen free radicals to destroy the target cells. In this manner, a high pressure neon arc lamp that is inexpensive and efficiently generates red light useful in photodynamic therapy is provided.

  2. 518 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 33, NO. 2, APRIL 2005 Plasma Dynamics During Breakdown in

    E-Print Network [OSTI]

    Kushner, Mark

    , lamp, modeling, plasma. METAL halide arc lamps are widely used sources of in- door and large area plasma hydrodynamics model was used to investigate breakdown in metal halide lamp. Images depicting518 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 33, NO. 2, APRIL 2005 Plasma Dynamics During

  3. Graphite electrode DC arc furnace. Innovative technology summary report

    SciTech Connect (OSTI)

    NONE

    1999-05-01T23:59:59.000Z

    The Graphite Electrode DC Arc Furnace (DC Arc) is a high-temperature thermal process, which has been adapted from a commercial technology, for the treatment of mixed waste. A DC Arc Furnace heats waste to a temperature such that the waste is converted into a molten form that cools into a stable glassy and/or crystalline waste form. Hazardous organics are destroyed through combustion or pyrolysis during the process and the majority of the hazardous metals and radioactive components are incorporated in the molten phase. The DC Arc Furnace chamber temperature is approximately 593--704 C and melt temperatures are as high as 1,500 C. The DC Arc system has an air pollution control system (APCS) to remove particulate and volatiles from the offgas. The advantage of the DC Arc is that it is a single, high-temperature thermal process that minimizes the need for multiple treatment systems and for extensive sorting/segregating of large volumes of waste. The DC Arc has the potential to treat a wide range of wastes, minimize the need for sorting, reduce the final waste volumes, produce a leach resistant waste form, and destroy organic contaminants. Although the DC arc plasma furnace exhibits great promise for treating the types of mixed waste that are commonly present at many DOE sites, several data and technology deficiencies were identified by the Mixed Waste Focus Area (MWFA) regarding this thermal waste processing technique. The technology deficiencies that have been addressed by the current studies include: establishing the partitioning behavior of radionuclides, surrogates, and hazardous metals among the product streams (metal, slag, and offgas) as a function of operating parameters, including melt temperature, plenum atmosphere, organic loading, chloride concentration, and particle size; demonstrating the efficacy of waste product removal systems for slag and metal phases; determining component durability through test runs of extended duration, evaluating the effect of feed composition variations on process operating conditions and slag product performance; and collecting mass balance and operating data to support equipment and instrument design.

  4. Electrode assemblies, plasma apparatuses and systems including electrode assemblies, and methods for generating plasma

    DOE Patents [OSTI]

    Kong, Peter C; Grandy, Jon D; Detering, Brent A; Zuck, Larry D

    2013-09-17T23:59:59.000Z

    Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode.

  5. Metal vapor arc ion plating

    DOE Patents [OSTI]

    Bertram, L.A.; Fisher, R.W.; Mattox, D.M.; Zanner, F.J.

    1986-09-09T23:59:59.000Z

    A method and apparatus for ion plating are described. The apparatus uses more negative than a first electrode voltage in a vacuum arc remelt system to attract low energy ions from the anode electrode to the article to be plated. 2 figs.

  6. Theoretical study of Diesel fuel reforming by a non-thermal arc discharge A. Lebouvier1,2

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    Theoretical study of Diesel fuel reforming by a non-thermal arc discharge A. Lebouvier1,2 , G anti-pollution norm namely for Diesel powered vehicles. NOx (NO, NO2,...) are very irritant pollutants- nologies purge is the use of non-thermal plasma. Plasma reforming of diesel fuel and exhaust gas mix- ture

  7. Use of plasma polymerized highly hydrophobic hexamethyldissilazane (HMDS) films for sensor development

    E-Print Network [OSTI]

    degradation by heating and porous silicon was planarized by the plasma deposition, as shown by infrared

  8. Microwave Plasma Chemical Vapor Deposition of Nano-Structured Sn/C Composite Thin-Film Anodes for Li-ion Batteries

    E-Print Network [OSTI]

    Marcinek, M.

    2008-01-01T23:59:59.000Z

    Meeting on Lithium Batteries, Biarritz, France, June 18–23,Sn/C anodes for lithium batteries. Thin layers of graphiticKeywords: Sn/C; Lithium Batteries; Anode; Plasma; Microwave

  9. Development of Lithium Deposition Techniques for TFTR

    SciTech Connect (OSTI)

    Gorman, J.; Johnson, D.; Kugel, H.W.; Labik, G.; Lemunyan, G.; et al

    1997-10-01T23:59:59.000Z

    The ability to increase the quantity of lithium deposition into TFTR beyond that of the Pellet Injector while minimizing perturbations to the plasma provides interesting experimental and operational options. Two additional lithium deposition tools were developed for possible application during the 1996 Experimental Schedule: a solid lithium target probe for real-time deposition, and a lithium effusion oven for deposition between discharges. The lithium effusion oven was operated in TFTR to deposit lithium on the Inner Limiter in the absence of plasma. This resulted in the third highest power TFTR discharge.

  10. Development of lithium deposition techniques for TFTR

    SciTech Connect (OSTI)

    Kugel, H.W.; Gorman, J.; Johnson, D.; Labik, G.; Lemunyan, G.; Mansfield, D.; Timberlake, J.; Vocaturo, M.

    1997-10-01T23:59:59.000Z

    The ability to increase the quantity of lithium deposition into TFTR beyond that of the Pellet Injector while minimizing perturbations to the plasma provides interesting experimental and operational options. Two additional lithium deposition tools were developed for possible application during the 1996 Experimental Schedule: a solid lithium target probe for real-time deposition, and a lithium effusion oven for deposition between discharges. The lithium effusion oven was operated in TFTR to deposit lithium on the Inner Limiter in the absence of plasma. This resulted in the third highest power TFTR discharge.

  11. Study on a negative hydrogen ion source with hot cathode arc discharge

    SciTech Connect (OSTI)

    Lin, S. H., E-mail: linshh@impcas.ac.cn; Fang, X. [Institute of Modern Physics (IMP), Chinese Academy of Sciences, Lanzhou 730000 (China) [Institute of Modern Physics (IMP), Chinese Academy of Sciences, Lanzhou 730000 (China); University of Chinese Academy of Sciences, Beijing 100039 (China); Zhang, H. J.; Qian, C.; Ma, B. H.; Wang, H.; Li, X. X.; Zhang, X. Z.; Sun, L. T.; Zhang, Z. M.; Yuan, P.; Zhao, H. W. [Institute of Modern Physics (IMP), Chinese Academy of Sciences, Lanzhou 730000 (China)] [Institute of Modern Physics (IMP), Chinese Academy of Sciences, Lanzhou 730000 (China)

    2014-02-15T23:59:59.000Z

    A negative hydrogen (H{sup ?}) ion source with hot cathode arc discharge was designed and fabricated as a primary injector for a 10 MeV PET cyclotron at IMP. 1 mA dc H{sup ?} beam with ? {sub N,} {sub RMS} = 0.08 ??mm?mrad was extracted at 25 kV. Halbach hexapole was adopted to confine the plasma. The state of arc discharge, the parameters including filament current, arc current, gas pressure, plasma electrode bias, and the ratio of I{sub e{sup ?}}/I{sub H{sup ?}} were experimentally studied. The discussion on the result, and opinions to improve the source were given.

  12. Plasma spraying method for forming diamond and diamond-like coatings

    DOE Patents [OSTI]

    Holcombe, C.E.; Seals, R.D.; Price, R.E.

    1997-06-03T23:59:59.000Z

    A method and composition is disclosed for the deposition of a thick layer of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate. The softened or molten composition crystallizes on the substrate to form a thick deposition layer comprising at least a diamond or diamond-like material. The selected composition includes at least glassy carbon as a primary constituent and may include at least one secondary constituent. Preferably, the secondary constituents are selected from the group consisting of at least diamond powder, boron carbide (B{sub 4}C) powder and mixtures thereof. 9 figs.

  13. Plasma spraying method for forming diamond and diamond-like coatings

    DOE Patents [OSTI]

    Holcombe, Cressie E. (Farragut, TN); Seals, Roland D. (Oak Ridge, TN); Price, R. Eugene (Knoxville, TN)

    1997-01-01T23:59:59.000Z

    A method and composition for the deposition of a thick layer (10) of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition (12) including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate (20). The softened or molten composition (18) crystallizes on the substrate (20) to form a thick deposition layer (10) comprising at least a diamond or diamond-like material. The selected composition (12) includes at least glassy carbon as a primary constituent (14) and may include at least one secondary constituent (16). Preferably, the secondary constituents (16) are selected from the group consisting of at least diamond powder, boron carbide (B.sub.4 C) powder and mixtures thereof.

  14. Plasma biasing to control the growth conditions of diamond-likecarbon

    SciTech Connect (OSTI)

    Anders, Andre; Pasaja, Nitisak; Lim, Sunnie H.N.; Petersen, TimC.; Keast, Vicki J.

    2006-04-30T23:59:59.000Z

    It is well known that the structure and properties ofdiamond-like carbon, and in particular the sp3/sp2 ratio, can becontrolled by the energy of the condensing carbon ions or atoms. In manypractical cases, the energy of ions arriving at the surface of thegrowing film is determined by the bias applied to the substrate. The biascauses a sheath to form between substrate and plasma in which thepotential difference between plasma potential and surface potentialdrops. In this contribution, we demonstrate that the same results can beobtained with grounded substrates by shifting the plasma potential. This"plasma biasing" (as opposed to "substrate biasing") is shown to workwell with pulsed cathodic carbon arcs, resulting in tetrahedral amorphouscarbon (ta-C) films that are comparable to the films obtained with theconventional substrate bias. To verify the plasma bias approach, ta-Cfilms were deposited by both conventional and plasma bias andcharacterized by transmission electron microscopy (TEM) and electronenergy loss spectrometry (EELS). Detailed data for comparison of thesefilms are provided.

  15. An arc control and protection system for the JET lower hybrid antenna based on an imaging system

    SciTech Connect (OSTI)

    Figueiredo, J., E-mail: joao.figueiredo@jet.efda.org [Associação EURATOM/IST, Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049-001 Lisboa, Portugal and EFDA-CSU, Culham Science Centre, Abingdon OX14 3DB (United Kingdom); Mailloux, J.; Kirov, K.; Kinna, D.; Stamp, M.; Devaux, S.; Arnoux, G.; Edwards, J. S.; Stephen, A. V.; McCullen, P.; Hogben, C. [EURATOM/CCFE Fusion Association, Culham Science Center, Abingdon OX14 3DB (United Kingdom)

    2014-11-15T23:59:59.000Z

    Arcs are the potentially most dangerous events related to Lower Hybrid (LH) antenna operation. If left uncontrolled they can produce damage and cause plasma disruption by impurity influx. To address this issue an arc real time control and protection imaging system for the Joint European Torus (JET) LH antenna has been implemented. The LH system is one of the additional heating systems at JET. It comprises 24 microwave generators (klystrons, operating at 3.7 GHz) providing up to 5 MW of heating and current drive to the JET plasma. This is done through an antenna composed of an array of waveguides facing the plasma. The protection system presented here is based primarily on an imaging arc detection and real time control system. It has adapted the ITER like wall hotspot protection system using an identical CCD camera and real time image processing unit. A filter has been installed to avoid saturation and spurious system triggers caused by ionization light. The antenna is divided in 24 Regions Of Interest (ROIs) each one corresponding to one klystron. If an arc precursor is detected in a ROI, power is reduced locally with subsequent potential damage and plasma disruption avoided. The power is subsequently reinstated if, during a defined interval of time, arcing is confirmed not to be present by image analysis. This system was successfully commissioned during the restart phase and beginning of the 2013 scientific campaign. Since its installation and commissioning, arcs and related phenomena have been prevented. In this contribution we briefly describe the camera, image processing, and real time control systems. Most importantly, we demonstrate that an LH antenna arc protection system based on CCD camera imaging systems works. Examples of both controlled and uncontrolled LH arc events and their consequences are shown.

  16. Journal of the Less-Common Metak, 164 & 165 (1990) 307-314 307 ECR-PLASMA ASSISTED LASER ABLATION OF AS-DEPOSITED

    E-Print Network [OSTI]

    Van Mieghem, Piet

    , their production process must satisfy some severe requirements depending on the application : - large surface-step production of as-deposited superconducting films at low substrate temperature and low oxygen partial pressure it . One of these ftanges holds the rotating superconducting YBCO pellet 5

  17. Plasma technology directory

    SciTech Connect (OSTI)

    Ward, P.P.; Dybwad, G.L.

    1995-03-01T23:59:59.000Z

    The Plasma Technology Directory has two main goals: (1) promote, coordinate, and share plasma technology experience and equipment within the Department of Energy; and (2) facilitate technology transfer to the commercial sector where appropriate. Personnel are averaged first by Laboratory and next by technology area. The technology areas are accelerators, cleaning and etching deposition, diagnostics, and modeling.

  18. Electrical and thermal finite element modeling of arc faults in photovoltaic bypass diodes.

    SciTech Connect (OSTI)

    Bower, Ward Isaac; Quintana, Michael A.; Johnson, Jay

    2012-01-01T23:59:59.000Z

    Arc faults in photovoltaic (PV) modules have caused multiple rooftop fires. The arc generates a high-temperature plasma that ignites surrounding materials and subsequently spreads the fire to the building structure. While there are many possible locations in PV systems and PV modules where arcs could initiate, bypass diodes have been suspected of triggering arc faults in some modules. In order to understand the electrical and thermal phenomena associated with these events, a finite element model of a busbar and diode was created. Thermoelectrical simulations found Joule and internal diode heating from normal operation would not normally cause bypass diode or solder failures. However, if corrosion increased the contact resistance in the solder connection between the busbar and the diode leads, enough voltage potentially would be established to arc across micron-scale electrode gaps. Lastly, an analytical arc radiation model based on observed data was employed to predicted polymer ignition times. The model predicted polymer materials in the adjacent area of the diode and junction box ignite in less than 0.1 seconds.

  19. BiFeO{sub 3}/La{sub 0.7}Sr{sub 0.3}MnO{sub 3} heterostructures deposited on spark plasma sintered LaAlO{sub 3} substrates

    SciTech Connect (OSTI)

    Pravarthana, D.; Lacotte, M.; David, A.; Prellier, W., E-mail: wilfrid.prellier@ensicaen.fr [Laboratoire CRISMAT, CNRS UMR 6508, ENSICAEN, Normandie Université, 6 Bd Maréchal Juin, F-14050 Caen Cedex 4 (France); Trassin, M. [Department of Physics, University of California, Berkeley, California 94720 (United States); Department of Materials, ETH, Wolfgang-Pauli-Str. 10, 8093 Zurich (Switzerland); Haw Chu, Jiun [Department of Physics, University of California, Berkeley, California 94720 (United States); Ramesh, R. [Department of Physics, University of California, Berkeley, California 94720 (United States); Department of Materials Science and Engineering, University of California, Berkeley, California 94720 (United States); Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Salvador, P. A. [Department of Materials Science and Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, Pennsylvania 15213 (United States)

    2014-02-24T23:59:59.000Z

    Multiferroic BiFeO{sub 3} (BFO)/La{sub 0.7}Sr{sub 0.3}MnO{sub 3} heterostructured thin films were grown by pulsed laser deposition on polished spark plasma sintered LaAlO{sub 3} (LAO) polycrystalline substrates. Both polycrystalline LAO substrates and BFO films were locally characterized using electron backscattering diffraction, which confirmed the high-quality local epitaxial growth on each substrate grain. Piezoforce microscopy was used to image and switch the piezo-domains, and the results are consistent with the relative orientation of the ferroelectric variants with the surface normal. This high-throughput synthesis process opens the routes towards wide survey of electronic properties as a function of crystalline orientation in complex oxide thin film synthesis.

  20. Excitation mechanism and thermal emission quenching of Tb ions in silicon rich silicon oxide thin films grown by plasma-enhanced chemical vapour deposition—Do we need silicon nanoclusters?

    SciTech Connect (OSTI)

    Podhorodecki, A., E-mail: artur.p.podhorodecki@pwr.wroc.pl; Golacki, L. W.; Zatryb, G.; Misiewicz, J. [Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw (Poland); Wang, J.; Jadwisienczak, W. [School of EECS, Ohio University, Stocker Center 363, Athens, Ohio 45701 (United States); Fedus, K. [Institute of Physics, Nicholas Copernicus University, Grudziadzka 5/7, 87-100 Torun (Poland); Wojcik, J.; Wilson, P. R. J.; Mascher, P. [Department of Engineering Physics and Centre for Emerging Device Technologies, McMaster University, 1280 Main St. W, Hamilton, Ontario L8S4L7 (Canada)

    2014-04-14T23:59:59.000Z

    In this work, we will discuss the excitation and emission properties of Tb ions in a Silicon Rich Silicon Oxide (SRSO) matrix obtained at different technological conditions. By means of electron cyclotron resonance plasma-enhanced chemical vapour deposition, undoped and doped SRSO films have been obtained with different Si content (33, 35, 39, 50 at. %) and were annealed at different temperatures (600, 900, 1100?°C). The samples were characterized optically and structurally using photoluminescence (PL), PL excitation, time resolved PL, absorption, cathodoluminescence, temperature dependent PL, Rutherford backscattering spectrometry, Fourier transform infrared spectroscopy and positron annihilation lifetime spectroscopy. Based on the obtained results, we discuss how the matrix modifications influence excitation and emission properties of Tb ions.

  1. ARC-ED Curriculum: The Application of Video Game Formats to Educational Software

    E-Print Network [OSTI]

    Chaffin, Jerry D.; Maxwell, Bill; Thompson, Barbara

    1982-01-01T23:59:59.000Z

    educational practices are examined in relation to the motivational features of arcade games. Also, guidelines for educational curriculum based on arcade game formats are proposed and the term Arc-Ed Curriculum is offered to describe such software. The content...

  2. Linkage of the ArcHydro Data Model with SWAT

    E-Print Network [OSTI]

    Linkage of the ArcHydro Data Model with SWAT Francisco Olivera, Ph.D., P.E. Milver Valenzuela Texas on a hub basis. Independent of the already connected models HUB #12;Arc Hydro Arc Hydro can be used as the hub for connecting hydrologic models. #12;Arc Hydro #12;What it is and what it is not ... Arc Hydro

  3. Plasma jet ignition device

    DOE Patents [OSTI]

    McIlwain, Michael E. (Franklin, MA); Grant, Jonathan F. (Wayland, MA); Golenko, Zsolt (North Reading, MA); Wittstein, Alan D. (Fairfield, CT)

    1985-01-15T23:59:59.000Z

    An ignition device of the plasma jet type is disclosed. The device has a cylindrical cavity formed in insulating material with an electrode at one end. The other end of the cylindrical cavity is closed by a metal plate with a small orifice in the center which plate serves as a second electrode. An arc jumping between the first electrode and the orifice plate causes the formation of a highly-ionized plasma in the cavity which is ejected through the orifice into the engine cylinder area to ignite the main fuel mixture. Two improvements are disclosed to enhance the operation of the device and the length of the plasma plume. One improvement is a metal hydride ring which is inserted in the cavity next to the first electrode. During operation, the high temperature in the cavity and the highly excited nature of the plasma breaks down the metal hydride, liberating hydrogen which acts as an additional fuel to help plasma formation. A second improvement consists of a cavity insert containing a plurality of spaced, metal rings. The rings act as secondary spark gap electrodes reducing the voltage needed to maintain the initial arc in the cavity.

  4. Metals purification by improved vacuum arc remelting

    DOE Patents [OSTI]

    Zanner, Frank J. (Sandia Park, NM); Williamson, Rodney L. (Albuquerque, NM); Smith, Mark F. (Albuquerque, NM)

    1994-12-13T23:59:59.000Z

    The invention relates to improved apparatuses and methods for remelting metal alloys in furnaces, particularly consumable electrode vacuum arc furnaces. Excited reactive gas is injected into a stationary furnace arc zone, thus accelerating the reduction reactions which purify the metal being melted. Additionally, a cooled condensation surface is disposed within the furnace to reduce the partial pressure of water in the furnace, which also fosters the reduction reactions which result in a purer produced ingot. Methods and means are provided for maintaining the stationary arc zone, thereby reducing the opportunity for contaminants evaporated from the arc zone to be reintroduced into the produced ingot.

  5. An Iridate with Fermi Arcs

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May JunDatastreamsmmcrcalgovInstrumentsruc DocumentationP-Series to someone by E-mail ShareRed CrossAn Iridate with Fermi Arcs An Iridate

  6. Capacitance and conductance versus voltage characterization of Al{sub 2}O{sub 3} layers prepared by plasma enhanced atomic layer deposition at 25?°C??T???200?°C

    SciTech Connect (OSTI)

    Henkel, Karsten, E-mail: henkel@tu-cottbus.de; Tallarida, Massimo; Schmeißer, Dieter [Applied Physics and Sensors, Brandenburg University of Technology Cottbus-Senftenberg, K.-Wachsmann-Allee 17, D-03046 Cottbus (Germany); Gargouri, Hassan; Gruska, Bernd; Arens, Michael [Sentech Instruments GmbH, Schwarzschildstraße 2, 12489 Berlin (Germany)

    2014-01-15T23:59:59.000Z

    In this work, plasma enhanced atomic layer deposited (PE-ALD) samples were prepared at substrate temperatures in the range between room temperature (RT) and 200?°C and investigated by capacitance–voltage and conductance–voltage recordings. The measurements are compared to standard thermal atomic layer deposition (T-ALD) at 200?°C. Very low interface state density (D{sub it}) ?10{sup 11}?eV{sup ?1}?cm{sup ?2} could be achieved for the PE-ALD process at 200?°C substrate temperature after postdeposition anneal (PDA) in forming gas at 450?°C. The PDA works very effectively for both the PE-ALD and T-ALD at 200?°C substrate temperature delivering also similar values of negative fixed charge density (N{sub fix}) around ?2.5?×?10{sup 12}?cm{sup ?2}. At the substrate temperature of 150?°C, highest N{sub fix} (?2.9?×?10{sup 12}?cm{sup ?2}) and moderate D{sub it} (2.7?×?10{sup 11}?eV{sup ?1}?cm{sup ?2}) values were observed. The as deposited PE-ALD layer at RT shows both low D{sub it} in the range of (1 to 3)?×?10{sup 11}?eV{sup ?1} cm{sup ?2} and low N{sub fix} (?4.4?×?10{sup 11}?cm{sup ?2}) at the same time. The dependencies of N{sub fix}, D{sub it}, and relative permittivity on the substrate temperatures and its adjustability are discussed.

  7. Vapor deposition of thin films

    DOE Patents [OSTI]

    Smith, David C. (Los Alamos, NM); Pattillo, Stevan G. (Los Alamos, NM); Laia, Jr., Joseph R. (Los Alamos, NM); Sattelberger, Alfred P. (Los Alamos, NM)

    1992-01-01T23:59:59.000Z

    A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

  8. Chemical vapor deposition thin films as biopassivation coatings and directly patternable dielectrics

    E-Print Network [OSTI]

    Pryce Lewis, Hilton G. (Hilton Gavin), 1973-

    2001-01-01T23:59:59.000Z

    Organosilicon thin films deposited by pulsed plasma-enhanced chemical vapor deposition (PPECVD) and hot-filament chemical vapor deposition (HFCVD) were investigated as potential biopassivation coatings for neural probes. ...

  9. Integrated feature scale modeling of plasma processing of porous and solid SiO2 . II. Residual fluorocarbon polymer stripping

    E-Print Network [OSTI]

    Kushner, Mark

    fluorocarbon polymer stripping and barrier layer deposition Arvind Sankarana) Department of Chemical from trenches following etching using fluorocarbon plasmas and the deposition of a continuous barrier these issues, reactions mechanisms for plasma stripping of fluorocarbon polymer using oxygen containing plasmas

  10. Fuel gas production by microwave plasma in liquid

    SciTech Connect (OSTI)

    Nomura, Shinfuku; Toyota, Hiromichi; Tawara, Michinaga; Yamashita, Hiroshi; Matsumoto, Kenya [Graduate School of Science and Engineering, Ehime University, 3 Bunkyo-cho, Matsuyama, Ehime 790-8577 (Japan); Shikoku Industry and Technology Promotion Center, 2-5 Marunouchi, Takamatsu, Kagawa 760-0033 (Japan)

    2006-06-05T23:59:59.000Z

    We propose to apply plasma in liquid to replace gas-phase plasma because we expect much higher reaction rates for the chemical deposition of plasma in liquid than for chemical vapor deposition. A reactor for producing microwave plasma in a liquid could produce plasma in hydrocarbon liquids and waste oils. Generated gases consist of up to 81% hydrogen by volume. We confirmed that fuel gases such as methane and ethylene can be produced by microwave plasma in liquid.

  11. antilles island arc: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    The morphology of the underthrust oceanic crust controls the mag matic activity of the island arc, and particularly the development, in space and time, of "arc compartments." Denis...

  12. Type B Accident Investigation of the Arc Flash at Brookhaven...

    Broader source: Energy.gov (indexed) [DOE]

    Arc Flash at Brookhaven National Laboratory, April 14, 2006 Type B Accident Investigation of the Arc Flash at Brookhaven National Laboratory, April 14, 2006 February 10, 2006 An...

  13. Method of making dense, conformal, ultra-thin cap layers for nanoporous low-k ILD by plasma assisted atomic layer deposition

    DOE Patents [OSTI]

    Jiang, Ying-Bing (Albuquerque, NM); Cecchi, Joseph L. (Albuquerque, NM); Brinker, C. Jeffrey (Albuquerque, NM)

    2011-05-24T23:59:59.000Z

    Barrier layers and methods for forming barrier layers on a porous layer are provided. The methods can include chemically adsorbing a plurality of first molecules on a surface of the porous layer in a chamber and forming a first layer of the first molecules on the surface of the porous layer. A plasma can then be used to react a plurality of second molecules with the first layer of first molecules to form a first layer of a barrier layer. The barrier layers can seal the pores of the porous material, function as a diffusion barrier, be conformal, and/or have a negligible impact on the overall ILD k value of the porous material.

  14. Princeton Plasma Physics Laboratory

    SciTech Connect (OSTI)

    Not Available

    1990-01-01T23:59:59.000Z

    This report discusses the following topics: principal parameters achieved in experimental devices fiscal year 1990; tokamak fusion test reactor; compact ignition tokamak; Princeton beta experiment- modification; current drive experiment-upgrade; international collaboration; x-ray laser studies; spacecraft glow experiment; plasma processing: deposition and etching of thin films; theoretical studies; tokamak modeling; international thermonuclear experimental reactor; engineering department; project planning and safety office; quality assurance and reliability; technology transfer; administrative operations; PPPL patent invention disclosures for fiscal year 1990; graduate education; plasma physics; graduate education: plasma science and technology; science education program; and Princeton Plasma Physics Laboratory reports fiscal year 1990.

  15. Experimental Test Of Whether Electrostatically Charged Micro-organisms And Their Spores Contribute To The Onset Of Arcs Across Vacuum Gaps

    SciTech Connect (OSTI)

    none,; Grisham, Larry R.

    2014-02-24T23:59:59.000Z

    Recently it was proposed [L.R. Grisham, A. vonHalle, A.F. Carpe, Guy Rossi, K.R. Gilton, E.D. McBride, E.P. Gilson, A. Stepanov, T.N. Stevenson, Physics of Plasma 19 023107 (2012)] that one of the initiators of vacuum voltage breakdown between condu cting electrodes might be micro-organisms and their spores, previously deposited during exposure to air, which tnen become electrostatically charged when an electric potential is applied across the vacuum gap. The note describes a simple experiment to compare the number of voltage-conditioning pulses required to reach the nominal maxium operating voltage across a gap between two metallic conductors in a vacuum, comparing cases in which biological cleaning was done just prior to pump-down with cases where this was not done, with each preceded by exposure to ambient air for three days. Based upon these results, it does not appear that air-deposited microbes and their spores constitute a major pathway for arc initiation, at least for exposure periods of a few days, and for vacuum gaps of a few millimeters, in the regime where voltage holding is usually observed to vary linearly with gap distance

  16. Radial heat transfer from a moving plasma

    E-Print Network [OSTI]

    Johnson, James Randall

    1966-01-01T23:59:59.000Z

    . The plasma temperature is assumed constant axially and rad'ally and equal to the value at the exit of tl. e arc. chamber. This temperature was used in the determ'r. a- tion of the Nusselt number a, d the Reynolds number used in the above correlatior... and measured values and estimated the accuracy of the heat flux data to be within Measurements of the total continuum radiatior. or simply the energy transferred by radiation from a wall stabilized argon plasma arc were made by Barzelay (14), Comparisons...

  17. Growth mechanisms study of microcrystalline silicon deposited by SiH{sub 4}/H{sub 2} plasma using tailored voltage waveforms

    SciTech Connect (OSTI)

    Bruneau, B., E-mail: bastien.bruneau@polytechnique.edu; Johnson, E. V. [LPICM-CNRS, Ecole Polytechnique, route de Saclay, 91128 Palaiseau (France); Wang, J. [LPICM-CNRS, Ecole Polytechnique, route de Saclay, 91128 Palaiseau (France); ICARE China-Europe Institute for Clean and Renewable Energy at Huazhong University of Science and Technology, 1037 Luoyu Road, 430074 Wuhan (China); Dornstetter, J.-C. [LPICM-CNRS, Ecole Polytechnique, route de Saclay, 91128 Palaiseau (France); TOTAL New Energies, 24 cours Michelet, 92069 Paris La Défense Cedex (France)

    2014-02-28T23:59:59.000Z

    The use of Tailored Voltage Waveforms is a technique wherein one uses non-sinusoidal waveforms with a period equivalent to RF frequencies to excite a plasma. It has been shown to be an effective technique to decouple maximum Ion Bombardment Energy (IBE) from the ion flux at the surface of the electrodes. In this paper, we use it for the first time as a way to scan through the IBE in order to study the growth mechanism of hydrogenated microcrystalline silicon using a SiH{sub 4}/H{sub 2} chemistry. We find that at critical energies, a stepwise increase in the amorphous to microcrystalline transition thickness is observed, as detected by Real Time Spectroscopic Ellipsometry. The same energy thresholds (30?eV and 70?eV) are found to be very influential on the final surface morphology of the samples, as observed by Atomic Force Microscopy. These thresholds correspond to SiH{sub x}{sup +} bulk displacement (30?eV) and H{sub x}{sup +} (70?eV) surface displacement energies. A model is therefore proposed to account for the impact of these ions on the morphology of ?c-Si:H growth.

  18. Experimental Beam Studies of Plasma-generated Species Interaction with Polymeric Materials and Biomolecules

    E-Print Network [OSTI]

    Chung, Ting-Ying

    2012-01-01T23:59:59.000Z

    example, micromasking, fluorocarbon deposition, and polymerthe roughening of PR in fluorocarbon-containing plasmas. [generated by Ar, HBr or fluorocarbon-containing plasmas have

  19. Large-scale pulsed laser deposition Nini Pryds, AFM, Jrgen Schou, OPL, Finn Saxild, AFM and Sren Linderoth,AFM

    E-Print Network [OSTI]

    ; OPL, Department of Optics and Plasma Research) e-mail: j.schou@risoe.dk Pulsed laser deposition (PLD

  20. Achievement Rewards for College Scientists ARCS Foundation, Inc.

    E-Print Network [OSTI]

    Arnold, Jonathan

    Achievement Rewards for College Scientists ARCS Foundation, Inc. For more information on how of the ARCS Foundation, Inc. funds seven scholarships for exceptional University of Georgia doctoral students. Available to attend the ARCS Foundation Awards Luncheon in Atlanta on November 21, 2013. ARCS Foundation

  1. Exhaust gas fuel reforming of Diesel fuel by non-thermal arc discharge for NOx trap regeneration

    E-Print Network [OSTI]

    Boyer, Edmond

    1 Exhaust gas fuel reforming of Diesel fuel by non- thermal arc discharge for NOx trap regeneration to the reforming of Diesel fuel with Diesel engine exhaust gas using a non-thermal plasma torch for NOx trap Diesel fuel reforming with hal-00617141,version1-17May2013 Author manuscript, published in "Energy

  2. Arc distribution during the vacuum arc remelting of Ti-6Al-4V

    SciTech Connect (OSTI)

    Woodside, Charles Rigel [U.S. DOE; King, Paul E. [U.S. DOE; Nordlund, Chris [ATI Albany Operations

    2013-01-01T23:59:59.000Z

    Currently, the temporal distribution of electric arcs across the ingot during vacuum arc remelting (VAR) is not a known or monitored process parameter. Previous studies indicate that the distribution of arcs can be neither diffuse nor axisymmetric about the center of the furnace. Correct accounting for the heat flux, electric current flux, and mass flux into the ingot is critical to achieving realistic solidification models of the VAR process. The National Energy Technology Laboratory has developed an arc position measurement system capable of locating arcs and determining the arc distribution within an industrial VAR furnace. The system is based on noninvasive magnetic field measurements and a VAR specific form of the Biot–Savart law. The system was installed on a coaxial industrial VAR furnace at ATI Albany Operations in Albany, OR. This article reports on the different arc distributions observed during production of Ti-6Al-4V. It is shown that several characteristic arc distribution modes can develop. This behavior is not apparent in the existing signals used to control the furnace, indicating the measurement system is providing new information. It is also shown that the different arc distribution modes observed may impact local solidification times, particularly at the side wall.

  3. Waste Heat Recovery – Submerged Arc Furnaces (SAF)

    E-Print Network [OSTI]

    O'Brien, T.

    2008-01-01T23:59:59.000Z

    Submerged Arc Furnaces are used to produce high temperature alloys. These furnaces typically run at 3000°F using high voltage electricity along with metallurgical carbon to reduce metal oxides to pure elemental form. The process as currently...

  4. Method for cracking hydrocarbon compositions using a submerged reactive plasma system

    DOE Patents [OSTI]

    Kong, P.C.

    1997-05-06T23:59:59.000Z

    A method is described for cracking a liquid hydrocarbon composition (e.g. crude oil) to produce a cracked hydrocarbon product. A liquid hydrocarbon composition is initially provided. An electrical arc is generated directly within the hydrocarbon composition so that the arc is entirely submerged in the composition. Arc generation is preferably accomplished using a primary and secondary electrode each having a first end submerged in the composition. The first ends of the electrodes are separated from each other to form a gap there between. An electrical potential is then applied to the electrodes to generate the arc within the gap. A reactive gas is thereafter delivered to the arc which forms a bubble around the arc. Gas delivery may be accomplished by providing a passageway through each electrode and delivering the gas through the passageways. The arc and gas cooperate to produce a plasma which efficiently cracks the hydrocarbon composition. 6 figs.

  5. Method for cracking hydrocarbon compositions using a submerged reactive plasma system

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID)

    1997-01-01T23:59:59.000Z

    A method for cracking a liquid hydrocarbon composition (e.g. crude oil) to produce a cracked hydrocarbon product. A liquid hydrocarbon composition is initially provided. An electrical arc is generated directly within the hydrocarbon composition so that the arc is entirely submerged in the composition. Arc generation is preferably accomplished using a primary and secondary electrode each having a first end submerged in the composition. The first ends of the electrodes are separated from each other to form a gap therebetween. An electrical potential is then applied to the electrodes to generate the arc within the gap. A reactive gas is thereafter delivered to the arc which forms a bubble around the arc. Gas delivery may be accomplished by providing a passageway through each electrode and delivering the gas through the passageways. The arc and gas cooperate to produce a plasma which efficiently cracks the hydrocarbon composition.

  6. Ion source with improved primary arc collimation

    DOE Patents [OSTI]

    Dagenhart, William K. (Oak Ridge, TN)

    1985-01-01T23:59:59.000Z

    An improved negative ion source is provided in which a self-biasing, molybdenum collimator is used to define the primary electron stream arc discharge from a filament operated at a negative potential. The collimator is located between the anode and the filament. It is electrically connected to the anode by means of an appropriate size resistor such that the collimator is biased at essentially the filament voltage during operation. Initially, the full arc voltage appears across the filament to collimator until the arc discharge strikes. Then the collimator biases itself to essentially filament potential due to current flow through the resistor thus defining the primary electron stream without intercepting any appreciable arc power. The collimator aperture is slightly smaller than the anode aperture to shield the anode from the arc power, thereby preventing the exposure of the anode to the full arc power which, in the past, has caused overheating and erosion of the anode collimator during extended time pulsed-beam operation of the source. With the self-biasing collimator of this invention, the ion source may be operated from short pulse periods to steady-state without destroying the anode.

  7. Condensation coefficients in plasma sputtering Pascal Brault , Anne-Lise Thomann, Jean-Philippe

    E-Print Network [OSTI]

    Boyer, Edmond

    Condensation coefficients in plasma sputtering deposition Pascal Brault §, Anne-Lise Thomann, Jean Backscattering Spectrom- etry are combined to determine condensation coefficients for plasma sputtering depo- sition. The method is applied for palladium deposition onto various substrates and condensation

  8. E-Print Network 3.0 - arc length control Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    length of the arc. The measurement and control of the arc... and controllability of welding current. However, due to the difficulty met in measuring the arc length in...

  9. Modular hybrid plasma reactor and related systems and methods

    DOE Patents [OSTI]

    Kong, Peter C.; Grandy, Jon D.; Detering, Brent A.

    2010-06-22T23:59:59.000Z

    A device, method and system for generating a plasma is disclosed wherein an electrical arc is established and the movement of the electrical arc is selectively controlled. In one example, modular units are coupled to one another to collectively define a chamber. Each modular unit may include an electrode and a cathode spaced apart and configured to generate an arc therebetween. A device, such as a magnetic or electromagnetic device, may be used to selectively control the movement of the arc about a longitudinal axis of the chamber. The arcs of individual modules may be individually controlled so as to exhibit similar or dissimilar motions about the longitudinal axis of the chamber. In another embodiment, an inlet structure may be used to selectively define the flow path of matter introduced into the chamber such that it travels in a substantially circular or helical path within the chamber.

  10. Ion source with improved primary arc collimation

    DOE Patents [OSTI]

    Dagenhart, W.K.

    1983-12-16T23:59:59.000Z

    An improved negative ion source is provided in which a self-biasing, molybdenum collimator is used to define the primary electron stream arc discharge from a filament operated at a negative potential. The collimator is located between the anode and the filament. It is electrically connected to the anode by means of an appropriate size resistor such that the collimator is biased at essentially the filament voltage during operation. Initially, the full arc voltage appears across the filament to collimator until the arc discharge strikes. Then the collimator biases itself to essentially filament potential due to current flow through the resistor thus defining the primary electron stream without intercepting any appreciable arc power. The collimator aperture is slightly smaller than the anode aperture to shield the anode from the arc power which, in the past, has caused overheating and erosion of the anode collimator during extended time pulsed-beam operation of the source. With the self-biasing collimator of this invention, the ion source may be operated from short pulse periods to steady-state without destroying the anode.

  11. Atmospheric Pressure Plasma Process And Applications

    SciTech Connect (OSTI)

    Peter C. Kong; Myrtle

    2006-09-01T23:59:59.000Z

    This paper provides a general discussion of atmospheric-pressure plasma generation, processes, and applications. There are two distinct categories of atmospheric-pressure plasmas: thermal and nonthermal. Thermal atmospheric-pressure plasmas include those produced in high intensity arcs, plasma torches, or in high intensity, high frequency discharges. Although nonthermal plasmas are at room temperatures, they are extremely effective in producing activated species, e.g., free radicals and excited state atoms. Thus, both thermal and nonthermal atmosphericpressure plasmas are finding applications in a wide variety of industrial processes, e.g. waste destruction, material recovery, extractive metallurgy, powder synthesis, and energy conversion. A brief discussion of recent plasma technology research and development activities at the Idaho National Laboratory is included.

  12. PLASMA DYNAMICS AND PLASMA WALL INTERACTION 130 Problems of Atomic Science and Technology. 2006, 6. Series: Plasma Physics (12), p. 130-134

    E-Print Network [OSTI]

    Harilal, S. S.

    PLASMA DYNAMICS AND PLASMA WALL INTERACTION 130 Problems of Atomic Science and Technology. 2006, 6. Series: Plasma Physics (12), p. 130-134 SIMULATION OF HIGH POWER DEPOSITION ON TARGET MATERIALS: APPLICATIONS IN MAGNETIC, INERTIAL FUSION, AND HIGH POWER PLASMA LITHOGRAPHY DEVICES Ahmed Hassanein Argonne

  13. Fuel injector utilizing non-thermal plasma activation

    DOE Patents [OSTI]

    Coates, Don M. (Santa Fe, NM); Rosocha, Louis A. (Los Alamos, NM)

    2009-12-01T23:59:59.000Z

    A non-thermal plasma assisted combustion fuel injector that uses an inner and outer electrode to create an electric field from a high voltage power supply. A dielectric material is operatively disposed between the two electrodes to prevent arcing and to promote the formation of a non-thermal plasma. A fuel injector, which converts a liquid fuel into a dispersed mist, vapor, or aerosolized fuel, injects into the non-thermal plasma generating energetic electrons and other highly reactive chemical species.

  14. Ion source based on the cathodic arc

    DOE Patents [OSTI]

    Sanders, D.M.; Falabella, S.

    1994-02-01T23:59:59.000Z

    A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated, is described. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles. 3 figures.

  15. Type B Accident Investigation of the Savannah River Site Arc...

    Broader source: Energy.gov (indexed) [DOE]

    the Savannah River Site Arc Flash Burn Injury on September 23, 2009, in the D Area Powerhouse Type B Accident Investigation of the Savannah River Site Arc Flash Burn Injury on...

  16. Arc Geometry and Algebra: Foliations, Moduli ... - Purdue University

    E-Print Network [OSTI]

    2012-07-04T23:59:59.000Z

    the simplicial complex which has one simplex for each arc family ? with the i–the face ..... 1.6.2 Loop graph of an arc family: A geometric construction of the dual.

  17. arc ion sources: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    and performance of vacuum arc ion sources. Brown, I 2013-01-01 2 Development of High Efficiency Versatile Arc Discharge Ion Source (VADIS) at CERN Isolde CERN Preprints Summary: We...

  18. arc ion source: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    and performance of vacuum arc ion sources. Brown, I 2013-01-01 2 Development of High Efficiency Versatile Arc Discharge Ion Source (VADIS) at CERN Isolde CERN Preprints Summary: We...

  19. Heat Recovery From Arc Furnaces Using Water Cooled Panels

    E-Print Network [OSTI]

    Darby, D. F.

    HEAT RECOVERY FROM ARC FURNACES USING WATER COOLED PANELS D. F. Darby Deere & Company Moline, Illinois ABSTRACT In 1980-81, the John Deere Foundry at East Moline underwent an expansion program that in creased its capacity by over 60...%. This expansion was centered around the melt department where the four existing 13MVA electric arc furnaces were augmented with two additional 13MVA arc furnaces. A waste heat recovery system was installed on all six of the arc furnaces which, with modifica...

  20. Correlations between SAR arc intensity and solar and geomagnetic activity

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    ±1960, Rees and Akasofu (1963) and Roach and Roach (1963) found that there are correlations of the SAR arc

  1. Method for depositing high-quality microcrystalline semiconductor materials

    DOE Patents [OSTI]

    Guha, Subhendu (Bloomfield Hills, MI); Yang, Chi C. (Troy, MI); Yan, Baojie (Rochester Hills, MI)

    2011-03-08T23:59:59.000Z

    A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

  2. Achievement Rewards for College Scientists ARCS Foundation, Inc.

    E-Print Network [OSTI]

    Arnold, Jonathan

    Achievement Rewards for College Scientists ARCS Foundation, Inc. Biomedical and Health Sciences the Atlanta chapter of the ARCS Foundation, Inc. funds eight scholarships for exceptional University.S. citizenship. · GPA of 3.5 or above. · Available to attend the ARCS Foundation Awards Luncheon in Atlanta

  3. Way to reduce arc voltage losses in hybrid thermionic converters

    SciTech Connect (OSTI)

    Tskhakaya, V.K.; Yarygin, V.I.

    1982-03-01T23:59:59.000Z

    Experimental results are reported concerning the output and emission characteristics of the arc and hybrid regimes in a plane-parallel thermionic converter with Pt--Zr--O electrode pair. It is shown that arc voltage losses can be reduced to values below those obtainable in ordinary arc thermionic converters.

  4. PYROLYSIS OF METHANE IN A SUPERSONIC, ARC-HEATED FLOW

    E-Print Network [OSTI]

    Texas at Arlington, University of

    1 PYROLYSIS OF METHANE IN A SUPERSONIC, ARC-HEATED FLOW F.K. Lu,* C.M. Roseberry, J.M. Meyers and D arc pyrolysis of methane at supersonic conditions, representative of conditions in the reformer- cate the feasibility of arc pyrolysis of methane. Introduction he high specific enthalpy of combustion

  5. Gas tungsten arc welder with electrode grinder

    DOE Patents [OSTI]

    Christiansen, David W. (Kennewick, WA); Brown, William F. (West Richland, WA)

    1984-01-01T23:59:59.000Z

    A welder for automated closure of fuel pins by a gas tungsten arc process in which a rotating length of cladding is positioned adjacent a welding electrode in a sealed enclosure. An independently movable axial grinder is provided in the enclosure for refurbishing the used electrode between welds.

  6. Costing of Joining Methods -Arc Welding Costs

    E-Print Network [OSTI]

    Colton, Jonathan S.

    Costing of Joining Methods - Arc Welding Costs ver. 1 ME 6222: Manufacturing Processes and Systems.S. Colton © GIT 2009 5 #12;LaborLabor Di t ti f ldi· Direct time of welding ­ time to produce a length of weld ­ labor rate ­ multiplication gives labor cost per length · Set-up time, etc. · Personal time

  7. Energy Savings in Electric Arc Furnace Melting

    E-Print Network [OSTI]

    Lubbeck, W.

    1982-01-01T23:59:59.000Z

    Arc furnace melting which at one time was almost exclusively used to produce alloy steel and steel castings is now widely accepted in the industry as an efficient process to produce all types of steel and iron. Presently, about 28% of steel...

  8. Page 1 of 2 -ARC Cost Transfer Guide v. 06/14/13 ARC SPONSORED PROJECT COST TRANSFER GUIDE

    E-Print Network [OSTI]

    Hone, James

    Page 1 of 2 - ARC Cost Transfer Guide v. 06/14/13 ARC SPONSORED PROJECT COST TRANSFER GUIDE There are three ways to move expenditures onto, off of, or between Sponsored Projects in ARC: AP Journal Voucher in which the voucher accounting date falls, and they are being moved to or between Sponsored Projects GL

  9. Contrib. Plasma Phys. 52, No. 10, 789 794 (2012) / DOI 10.1002/ctpp.201200076 Recent Progress in Complex Plasmas

    E-Print Network [OSTI]

    Fehske, Holger

    " at the Universities in Greifswald and Kiel as well as at the Leibniz-Institute for Plasma Research and Technology interacting with solid surfaces, see Fig. 1. The importance of complex plasma research derives from of nanotechnology including plasma-assisted deposition or etching. The 2007 review on plasma research and its

  10. Chemical vapor deposition of organosilicon composite thin films for porous low-k dielectrics

    E-Print Network [OSTI]

    Ross, April Denise, 1977-

    2005-01-01T23:59:59.000Z

    Pulsed plasma enhanced chemical vapor deposition has produced organosilicon thin films with the potential use as low dielectric constant interconnect materials in microelectronic circuits. Both diethylsilane and ...

  11. Driven Motion and Instability of an Atmospheric Pressure Arc

    SciTech Connect (OSTI)

    Max Karasik

    1999-12-01T23:59:59.000Z

    Atmospheric pressure arcs are used extensively in applications such as welding and metallurgy. However, comparatively little is known of the physics of such arcs in external magnetic fields and the mechanisms of the instabilities present. In order to address questions of equilibrium and stability of such arcs, an experimental arc furnace is constructed and operated in air with graphite cathode and steel anode at currents 100-250 A. The arc is diagnosed with a gated intensified camera and a collimated photodiode array, as well as fast voltage and current probes.

  12. Electron beam melting at high pressures with a vacuum separator/plasma lens

    SciTech Connect (OSTI)

    Hershcovitch, A. [Brookhaven National Laboratory, Upton, NY (United States)

    1995-12-31T23:59:59.000Z

    Plasmas can be used to provide a vacuum-atmosphere interface or separation between vacua regions as an alternative to differential pumping. Vacuum-atmosphere interface utilizing a cascade arc discharge was successfully propagated from vacuum through such a plasma interface and out into atmospheric pressure. This plasma device also functions as an effective plasma lens. Such a device can be adopted for use in electron beam melting.

  13. Electron beam melting at high pressures with a vacuum separator/plasma lens

    SciTech Connect (OSTI)

    Hershcovitch, A.

    1995-12-31T23:59:59.000Z

    Plasmas can be used to provide a vacuum-atmosphere interface or separation between vacua regions as an alternative to differential pumping. Vacuum-atmosphere interface utilizing a cascade arc discharge was successfully demonstrated and a 175 keV electron beam was successfully propagated from vacuum through such a plasma interface and out into atmospheric pressure. This plasma device also functions as an effective plasma tens. Such a device can be adopted for use in electron beam melting.

  14. Atmospheric-pressure plasma jet

    DOE Patents [OSTI]

    Selwyn, Gary S. (Los Alamos, NM)

    1999-01-01T23:59:59.000Z

    Atmospheric-pressure plasma jet. A .gamma.-mode, resonant-cavity plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250.degree. C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two concentric cylindrical electrodes are employed to generate a plasma in the annular region therebetween. A "jet" of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly shaping the rf-powered electrode. Because of the atmospheric pressure operation, no ions survive for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike low-pressure plasma sources and conventional plasma processing methods.

  15. INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 12 (2003) 821 PII: S0963-0252(03)55523-2

    E-Print Network [OSTI]

    Kushner, Mark

    as multi-atmosphere thermal arcs, during their starting phase the lamps are moderate pressure glowINSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 12 (2003) 8­21 PII: S0963-0252(03)55523-2 Breakdown processes in metal halide lamps Brian Lay1

  16. Electrical Safety and Arc Flash Protections

    SciTech Connect (OSTI)

    R. Camp

    2008-03-04T23:59:59.000Z

    Over the past four years, the Electrical Safety Program at PPPL has evolved in addressing changing regulatory requirements and lessons learned from accident events, particularly in regards to arc flash hazards and implementing NFPA 70E requirements. This presentation will discuss PPPL's approaches to the areas of electrical hazards evaluation, both shock and arc flash; engineered solutions for hazards mitigation such as remote racking of medium voltage breakers, operational changes for hazards avoidance, targeted personnel training and hazard appropriate personal protective equipment. Practical solutions for nominal voltage identification and zero voltage checks for lockout/tagout will also be covered. Finally, we will review the value of a comprehensive electrical drawing program, employee attitudes expressed as a personal safety work ethic, integrated safety management, and sustained management support for continuous safety improvement.

  17. Contamination d'un plasma d'argon par des vapeurs anodiques de cuivre P. Andanson et B. Cheminat

    E-Print Network [OSTI]

    Boyer, Edmond

    symboles Nous présentons une étude expérimentale sur la contamination d'un plasma d'arc par des vapeurs775 Contamination d'un plasma d'argon par des vapeurs anodiques de cuivre P. Andanson et B proche de l'anode en cuivre (1 mm à 1 cm) d'un arc stabilisé sous atmosphère d'argon (15 A et 30 A) est

  18. Volumetric modulated arc radiotherapy for esophageal cancer

    SciTech Connect (OSTI)

    Vivekanandan, Nagarajan, E-mail: viveknaren@hotmail.com [Department of Medical Physics, Cancer Institute, Chennai (India); Sriram, Padmanaban; Syam Kumar, S.A.; Bhuvaneswari, Narayanan; Saranya, Kamalakannan [Department of Medical Physics, Cancer Institute, Chennai (India)

    2012-04-01T23:59:59.000Z

    A treatment planning study was performed to evaluate the performance of volumetric arc modulation with RapidArc (RA) against 3D conformal radiation therapy (3D-CRT) and conventional intensity-modulated radiation therapy (IMRT) techniques for esophageal cancer. Computed tomgraphy scans of 10 patients were included in the study. 3D-CRT, 4-field IMRT, and single-arc and double-arc RA plans were generated with the aim to spare organs at risk (OAR) and healthy tissue while enforcing highly conformal target coverage. The planning objective was to deliver 54 Gy to the planning target volume (PTV) in 30 fractions. Plans were evaluated based on target conformity and dose-volume histograms of organs at risk (lung, spinal cord, and heart). The monitor unit (MU) and treatment delivery time were also evaluated to measure the treatment efficiency. The IMRT plan improves target conformity and spares OAR when compared with 3D-CRT. Target conformity improved with RA plans compared with IMRT. The mean lung dose was similar in all techniques. However, RA plans showed a reduction in the volume of the lung irradiated at V{sub 20Gy} and V{sub 30Gy} dose levels (range, 4.62-17.98%) compared with IMRT plans. The mean dose and D{sub 35%} of heart for the RA plans were better than the IMRT by 0.5-5.8%. Mean V{sub 10Gy} and integral dose to healthy tissue were almost similar in all techniques. But RA plans resulted in a reduced low-level dose bath (15-20 Gy) in the range of 14-16% compared with IMRT plans. The average MU needed to deliver the prescribed dose by RA technique was reduced by 20-25% compared with IMRT technique. The preliminary study on RA for esophageal cancers showed improvements in sparing OAR and healthy tissue with reduced beam-on time, whereas only double-arc RA offered improved target coverage compared with IMRT and 3D-CRT plans.

  19. Contrib. Plasma Phys. 26 (1986) 1, 1-12 Sudden Jumps, Hysteresis, and Negative Resistance

    E-Print Network [OSTI]

    Merlino, Robert L.

    are found in glow discharges, carbon arcs, thermionic converters, fluorescent lamps and four-layer diodes [lContrib. Plasma Phys. 26 (1986) 1, 1-12 Sudden Jumps, Hysteresis, and Negative Resistance in an Argon Plasma Discharge I. Discharges with No Magnetic Field R. A. BOSCHand R. L. MERLINO Department

  20. Plasma vitrification of waste materials

    DOE Patents [OSTI]

    McLaughlin, David F. (Oakmont, PA); Dighe, Shyam V. (North Huntingdon, PA); Gass, William R. (Plum Boro, PA)

    1997-01-01T23:59:59.000Z

    This invention provides a process wherein hazardous or radioactive wastes in the form of liquids, slurries, or finely divided solids are mixed with finely divided glassformers (silica, alumina, soda, etc.) and injected directly into the plume of a non-transferred arc plasma torch. The extremely high temperatures and heat transfer rates makes it possible to convert the waste-glassformer mixture into a fully vitrified molten glass product in a matter of milliseconds. The molten product may then be collected in a crucible for casting into final wasteform geometry, quenching in water, or further holding time to improve homogeneity and eliminate bubbles.

  1. Plasma vitrification of waste materials

    DOE Patents [OSTI]

    McLaughlin, D.F.; Dighe, S.V.; Gass, W.R.

    1997-06-10T23:59:59.000Z

    This invention provides a process wherein hazardous or radioactive wastes in the form of liquids, slurries, or finely divided solids are mixed with finely divided glassformers (silica, alumina, soda, etc.) and injected directly into the plume of a non-transferred arc plasma torch. The extremely high temperatures and heat transfer rates makes it possible to convert the waste-glassformer mixture into a fully vitrified molten glass product in a matter of milliseconds. The molten product may then be collected in a crucible for casting into final wasteform geometry, quenching in water, or further holding time to improve homogeneity and eliminate bubbles. 4 figs.

  2. PHOTOVOLTAIC DC ARC FAULT DETECTOR TESTING AT SANDIA NATIONAL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    PHOTOVOLTAIC DC ARC FAULT DETECTOR TESTING AT SANDIA NATIONAL LABORATORIES Jay Johnson 1 , Birger Pahl 2 , Charles Luebke 2 , Tom Pier 2 , Theodore Miller 3 , Jason Strauch 1 ,...

  3. arc magmatism isotopic: Topics by E-print Network

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    J. 3 TECTONIC CONTROLS OF GEOCHEMICAL EVOLUTION IN ARC MAGMATISM OF SE ASIA 359Bali, Indonesia, 10 -13 October 1999PACRIM 99 Geosciences Websites Summary: processes operating at...

  4. A New Survey for Giant Arcs

    SciTech Connect (OSTI)

    Hennawi, Joseph F.; Gladders, Michael D.; Oguri, Masamune; Dalal, Neal; Koester, Benjamin; Natarajan, Priyamvada; Strauss, Michael A.; Inada, Naohisa; Kayo, Issha; Lin,; Lampeitl, Hubert; Annis, James; Bahcall, Neta A.; Schneider, Donald P.

    2006-11-15T23:59:59.000Z

    We report on the first results of an imaging survey to detect strong gravitational lensing targeting the richest clusters selected from the photometric data of the Sloan Digital Sky Survey (SDSS) with follow-up deep imaging observations from the Wisconsin Indiana Yale NOAO (WIYN) 3.5m telescope and the University of Hawaii 88-inch telescope (UH88). The clusters are selected from an area of 8000 deg{sup 2} using the Red Cluster Sequence technique and span the redshift range 0.1 {approx}< z {approx}< 0.6, corresponding to a comoving cosmological volume of {approx} 2Gpc{sup 3}. Our imaging survey thus targets a volume more than an order of magnitude larger than any previous search. A total of 240 clusters were imaged of which 141 had sub-arcsecond image quality. Our survey has uncovered 16 new lensing clusters with definite giant arcs, an additional 12 systems for which the lensing interpretation is very likely, and 9 possible lenses which contain shorter arclets or candidate arcs which are less certain and will require further observations to confirm their lensing origin. The number of new cluster lenses detected in this survey is likely > 30. Among these new systems are several of the most dramatic examples of strong gravitational lensing ever discovered with multiple bright arcs at large angular separation. These will likely become 'poster-child' gravitational lenses similar to Abell 1689 and CL0024+1654. The new lenses discovered in this survey will enable future systematic studies of the statistics of strong lensing and its implications for cosmology and our structure formation paradigm.

  5. Analysis of radiofrequency discharges in plasma

    DOE Patents [OSTI]

    Kumar, D.; McGlynn, S.P.

    1992-08-04T23:59:59.000Z

    Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition. 15 figs.

  6. Method for controlling gas metal arc welding

    DOE Patents [OSTI]

    Smartt, H.B.; Einerson, C.J.; Watkins, A.D.

    1987-08-10T23:59:59.000Z

    The heat input and mass input in a Gas Metal Arc welding process are controlled by a method that comprises calculating appropriate values for weld speed, filler wire feed rate and an expected value for the welding current by algorithmic function means, applying such values for weld speed and filler wire feed rate to the welding process, measuring the welding current, comparing the measured current to the calculated current, using said comparison to calculate corrections for the weld speed and filler wire feed rate, and applying corrections. 3 figs., 1 tab.

  7. Method for controlling gas metal arc welding

    DOE Patents [OSTI]

    Smartt, Herschel B. (Idaho Falls, ID); Einerson, Carolyn J. (Idaho Falls, ID); Watkins, Arthur D. (Idaho Falls, ID)

    1989-01-01T23:59:59.000Z

    The heat input and mass input in a Gas Metal Arc welding process are controlled by a method that comprises calculating appropriate values for weld speed, filler wire feed rate and an expected value for the welding current by algorithmic function means, applying such values for weld speed and filler wire feed rate to the welding process, measuring the welding current, comparing the measured current to the calculated current, using said comparison to calculate corrections for the weld speed and filler wire feed rate, and applying corrections.

  8. Northeast Honshu Arc | Open Energy Information

    Open Energy Info (EERE)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page on Google Bookmark EERE: Alternative Fuels Data CenterFranconia, Virginia: Energy ResourcesLoading map...(Utility Company)References ↑ US Census BureauNorthbrook, Ohio:Honshu Arc Jump

  9. AdaptiveARC | Open Energy Information

    Open Energy Info (EERE)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE: Alternative Fuels Data Center Home Page on Google Bookmark EERE: Alternative Fuels Data Center Home Page on Office of InspectorConcentrating SolarElectric Coop,SaveWhiskeyEnergyAd-Venta Jump to:Colorado:01.AdamsvilleAdaptiveARC

  10. Sandia National Laboratories: parallel arc-fault

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security Administration the1developmentturbine bladelifetime ismobileparallel arc-fault Sandia Research on PV

  11. Sandia National Laboratories: Arc-Fault Detection

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr MayAtmosphericNuclear Security Administration the1 -the Mid-Infrared0Energy Advanced Nuclear EnergyCouncilSandia's Work withArc-Fault

  12. On the mechanism of operation of a cathode spot cell in a vacuum arc

    SciTech Connect (OSTI)

    Mesyats, G. A.; Petrov, A. A. [P. N. Lebedev Physical Institute, RAS, 53 Leninsky Ave., Moscow 119991 (Russian Federation); Bochkarev, M. B. [Institute of Electrophysics, UB, RAS, 106 Amundsen St., Ekaterinburg 620016 (Russian Federation); Barengolts, S. A., E-mail: sb@nsc.gpi.ru [A. M. Prokhorov General Physics Institute, RAS, 38 Vavilov St., Moscow 119991 (Russian Federation)

    2014-05-05T23:59:59.000Z

    The erosive structures formed on a tungsten cathode as a result of the motion of the cathode spot of a vacuum arc over the cathode surface have been examined. It has been found that the average mass of a cathode microprotrusion having the shape of a solidified jet is approximately equal to the mass of ions removed from the cathode within the lifetime of a cathode spot cell carrying a current of several amperes. The time of formation of a new liquid-metal jet under the action of the reactive force of the plasma ejected by the cathode spot is about 10?ns, which is comparable to the lifetime of a cell. The growth rate of a liquid-metal jet is ?10{sup 4}?cm/s. The geometric shape and size of a solidified jet are such that a new explosive emission center (spot cell) can be initiated within several nanoseconds during the interaction of the jet with the dense cathode plasma. This is the underlying mechanism of the self-sustained operation of a vacuum arc.

  13. ARC: A compact, high-field, fusion nuclear science facility and demonstration power plant with demountable magnets

    E-Print Network [OSTI]

    Sorbom, B N; Palmer, T R; Mangiarotti, F J; Sierchio, J M; Bonoli, P; Kasten, C; Sutherland, D A; Barnard, H S; Haakonsen, C B; Goh, J; Sung, C; Whyte, D G

    2014-01-01T23:59:59.000Z

    The affordable, robust, compact (ARC) reactor conceptual design study aims to reduce the size, cost, and complexity of a combined fusion nuclear science facility (FNSF) and demonstration fusion Pilot power plant. ARC is a 270 MWe tokamak reactor with a major radius of 3.3 m, a minor radius of 1.1 m, and an on-axis magnetic field of 9.2 T. ARC has rare earth barium copper oxide (REBCO) superconducting toroidal field coils, which have joints to enable disassembly. This allows the vacuum vessel to be replaced quickly, mitigating first wall survivability concerns, and permits a single device to test many vacuum vessel designs and divertor materials. The design point has a plasma fusion gain of Q_p~13.6, yet is fully non-inductive, with a modest bootstrap fraction of only ~63%. Thus ARC offers a high power gain with relatively large external control of the current profile. This highly attractive combination is enabled by the ~23 T peak field on coil with newly available REBCO superconductor technology. External cu...

  14. Stress-Relaxation and Creep Behavior of Heat-Treated Stand-Alone Plasma-Sprayed 7 wt.% Y2O3-ZrO2 Coatings

    E-Print Network [OSTI]

    Trice, Rodney W.

    Thermal barrier coatings have significantly increased the working efficiency of turbine engine and diesel the stock powder into high velocity arc plasma, which melts the powder while propelling it toward

  15. E-Print Network 3.0 - arc consistency revisited Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    arc source is being investigated as a radiometric source for the near- and mid... -infrared spectral range. This arc is similar to the argon mini-arc, which has been...

  16. Constraints on the composition of the Aleutian arc lower crust from

    E-Print Network [OSTI]

    Shillington, Donna J.

    Determining the bulk composition of island arc lower crust is essential for distinguishing between competing models for arc magmatism and assessing the stability of arc lower crust. We present new constraints on the ...

  17. E-Print Network 3.0 - arc northwesternmost california Sample...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    365 ARC JIW Engineering Design Requirements (4... 201 2. ARC 203 2. ARC 204 (studio) 3. PHY 103 3. PHY ... Source: Bou-Zeid, Elie - Department of Civil and Environmental...

  18. E-Print Network 3.0 - arc dynamic behavior Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    365 ARC JIW Engineering Design Requirements (4... 201 2. ARC 203 2. ARC 204 (studio) 3. PHY 103 3. PHY 104 3. MAT 202 3. CEE 364(a) 4. 4... 478 (thesis) 1. CEE 462...

  19. E-Print Network 3.0 - arc remelt process Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    111,Volume 3, novembre 1993 Summary: processes such as Vacuum Induction Melting (VIM), ;Jacuum Arc Remelting (VAR),Electro Slag Remelting... in the case of vacuum arc...

  20. Type A Investigation of the Electrical Arc Injury at the Stanford...

    Broader source: Energy.gov (indexed) [DOE]

    of the Electrical Arc Injury at the Stanford Linear Accelerator Complex on October 11, 2004 Type A Investigation of the Electrical Arc Injury at the Stanford Linear Accelerator...

  1. E-Print Network 3.0 - arc welding machine Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Vision systems for arc welding, Friction stir... welding, Welding dual-phase steel, Metal transfer behavior, Submerged arc welding ... Source: DuPont, John...

  2. E-Print Network 3.0 - arc welding robot Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    components. These include gas tungsten arc (GTA) and electron beam (EB) welding, laser powder... components using methods, such as gas tungsten arc (GTA), electron beam (EB) and...

  3. E-Print Network 3.0 - automatic arc welding Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    components. These include gas tungsten arc (GTA) and electron beam (EB) welding, laser powder... components using methods, such as gas tungsten arc (GTA), electron beam (EB) and...

  4. E-Print Network 3.0 - arc weld cladding Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    components. These include gas tungsten arc (GTA) and electron beam (EB) welding, laser powder... components using methods, such as gas tungsten arc (GTA), electron beam (EB) and...

  5. E-Print Network 3.0 - argon transferred arc Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Flow Summary: Traditional Gliding Arc Point of Developed Gliding Arc when Maximum Energy is Transferred Gas inlet Reactor Point... in Vortex Flows -- ICP Discharge in Vortex...

  6. E-Print Network 3.0 - arc rating atpv Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    gas tungsten arc welding Reginald Crawford,* George E... : An adaptive control based on fuzzy logic has been implemented for Gas Tungsten Arc Welding (GTAW... -linear relationship...

  7. E-Print Network 3.0 - arc welding electrodes Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    been implemented for Gas Tungsten Arc Welding (GTAW... logic control and adaptive fuzzy logic control of gas tungsten arc ... Source: Zhang, YuMing - Center for Manufacturing &...

  8. E-Print Network 3.0 - arc welding fumes Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    been implemented for Gas Tungsten Arc Welding (GTAW... logic control and adaptive fuzzy logic control of gas tungsten arc ... Source: Zhang, YuMing - Center for Manufacturing &...

  9. E-Print Network 3.0 - arc welding gmaw Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    been implemented for Gas Tungsten Arc Welding (GTAW... logic control and adaptive fuzzy logic control of gas tungsten arc ... Source: Zhang, YuMing - Center for Manufacturing &...

  10. E-Print Network 3.0 - arc welding material Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    been implemented for Gas Tungsten Arc Welding (GTAW... logic control and adaptive fuzzy logic control of gas tungsten arc ... Source: Zhang, YuMing - Center for Manufacturing &...

  11. E-Print Network 3.0 - arc welding parameters Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    been implemented for Gas Tungsten Arc Welding (GTAW... logic control and adaptive fuzzy logic control of gas tungsten arc ... Source: Zhang, YuMing - Center for Manufacturing &...

  12. E-Print Network 3.0 - active banda arc-continent Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    rifting. There was diachronous arc-continent collision of intra- Pacific arcs with this passive Source: Royal Holloway, University of London - Department of Earth Sciences,...

  13. E-Print Network 3.0 - andean arc magmatism Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    arc in central Novaya Zemlya, Arctic Russia... - genian magmatic arc. Zircon and titanite in four samples from Mashigin Fjord and Matochkin Strait yield U... ). The events at...

  14. Particle transport in plasma reactors

    SciTech Connect (OSTI)

    Rader, D.J.; Geller, A.S.; Choi, Seung J. [Sandia National Labs., Albuquerque, NM (United States); Kushner, M.J. [Illinois Univ., Urbana, IL (United States)

    1995-01-01T23:59:59.000Z

    SEMATECH and the Department of Energy have established a Contamination Free Manufacturing Research Center (CFMRC) located at Sandia National Laboratories. One of the programs underway at the CFMRC is directed towards defect reduction in semiconductor process reactors by the application of computational modeling. The goal is to use fluid, thermal, plasma, and particle transport models to identify process conditions and tool designs that reduce the deposition rate of particles on wafers. The program is directed toward defect reduction in specific manufacturing tools, although some model development is undertaken when needed. The need to produce quantifiable improvements in tool defect performance requires the close cooperation among Sandia, universities, SEMATECH, SEMATECH member companies, and equipment manufacturers. Currently, both plasma (e.g., etch, PECVD) and nonplasma tools (e.g., LPCVD, rinse tanks) are being worked on under this program. In this paper the authors summarize their recent efforts to reduce particle deposition on wafers during plasma-based semiconductor manufacturing.

  15. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Jose, CA); Ellingboe, Albert R. (Malahide, IE)

    2008-01-01T23:59:59.000Z

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  16. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Ellingboe, Albert R. (Fremont, CA)

    1999-01-01T23:59:59.000Z

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

  17. Deposition of dopant impurities and pulsed energy drive-in

    DOE Patents [OSTI]

    Wickboldt, P.; Carey, P.G.; Smith, P.M.; Ellingboe, A.R.

    1999-06-29T23:59:59.000Z

    A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique is disclosed. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques. 2 figs.

  18. Electrical studies and plasma characterization of an atmospheric pressure plasma jet operated at low frequency

    SciTech Connect (OSTI)

    Giuliani, L.; Xaubet, M.; Grondona, D.; Minotti, F.; Kelly, H. [Departamento de Física, Facultad de Ciencias Exactas y Naturales, Universidad de Buenos Aires, C1428EHA Buenos Aires, Argentina and Instituto de Física del Plasma (INFIP), Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET), Universidad de Buenos Aires UBA, C1428EHA Buenos Aires (Argentina)] [Departamento de Física, Facultad de Ciencias Exactas y Naturales, Universidad de Buenos Aires, C1428EHA Buenos Aires, Argentina and Instituto de Física del Plasma (INFIP), Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET), Universidad de Buenos Aires UBA, C1428EHA Buenos Aires (Argentina)

    2013-06-15T23:59:59.000Z

    Low-temperature, high-pressure plasma jets have an extensive use in medical and biological applications. Much work has been devoted to study these applications while comparatively fewer studies appear to be directed to the discharge itself. In this work, in order to better understand the kind of electrical discharge and the plasma states existing in those devices, a study of the electrical characteristics of a typical plasma jet, operated at atmospheric pressure, using either air or argon, is reported. It is found that the experimentally determined electrical characteristics are consistent with the model of a thermal arc discharge, with a highly collisional cathode sheet. The only exception is the case of argon at the smallest electrode separation studied, around 1 mm in which case the discharge is better modeled as either a non-thermal arc or a high-pressure glow. Also, variations of the electrical behavior at different gas flow rates are interpreted, consistently with the arc model, in terms of the development of fluid turbulence in the external jet.

  19. 190 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 30, NO. 1, FEBRUARY 2002 Gap Closure in a Cold Metal Halide Lamp

    E-Print Network [OSTI]

    Kushner, Mark

    lamp has been investigated using a two-dimensional, plasma transport model. Im- ages are presented- charge devices, lighting, plasma applications. METAL halide high-intensity-discharge (HID) lamps op- erate as high-pressure thermal arcs [1]. The cold fills of HID lamps are typically 50­100 torr of a rare

  20. Particle deposition in ventilation ducts

    E-Print Network [OSTI]

    Sippola, Mark R.

    2002-01-01T23:59:59.000Z

    and An Evaluation of Thermophoretic Deposition Rates C.1of estimated thermophoretic deposition velocities, v th+ ,of estimated thermophoretic deposition velocities, v th+ ,

  1. Column generation heuristic for a rich arc routing Application to railroad track inspection routing

    E-Print Network [OSTI]

    Ingrand, François

    /LAAS) Optimising maintenance routing ATMOS 2010 7 / 24 #12;Literature review Industrial arc routing problems Hasle

  2. THE PHYSICS OF ARC WELDING PROCESSES Department of Materials Science and Engineering,

    E-Print Network [OSTI]

    Eagar, Thomas W.

    ) THE PHYSICS OF ARC WELDING PROCESSES T.W.EAGAR Department of Materials Science and Engineering, Massachusetts Institute of Technology Abstract Welding is an extremely complex proce ss; however, due to its Wor ds: Arc Welding, Arc Physics, Shielding Gases, Gas Metal Arc Welding. 1. Introduction Langmuir

  3. E-Print Network 3.0 - arc welding process Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    process Search Powered by Explorit Topic List Advanced Search Sample search results for: arc welding process...

  4. E-Print Network 3.0 - arc welding processes Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    processes Search Powered by Explorit Topic List Advanced Search Sample search results for: arc welding processes...

  5. The correlation of radial heat transfer data from a moving plasma

    E-Print Network [OSTI]

    Choksi, Nitinchandra Mafatlal

    1967-01-01T23:59:59.000Z

    , and Str eng (4) measured the stagnation heat flux from an argon plasma jet. A plot was presented showing. the heat flux as a linear function of power supplied to the arc. No correlation was given. For predicting the stagnation heat flux to an object... temperature. Plasma temperature was assumed to be equal to the temperature at the exit of its arc chamber, and this temperature was used in the determination of Nus selt number and Reynolds number used in the above correlation. Since the gas enthalpy...

  6. Zinc recovery by ultrasound acid leaching of double kiln treated electric arc furnace dust

    SciTech Connect (OSTI)

    Barrera Godinez, J.A.

    1989-01-01T23:59:59.000Z

    The need to convert 70,000 tons a year of electric arc furnace (EAF) dust into an environmentally safe or recyclable product has encouraged studies to reclaim zinc from this waste material. Successful characterization of a double-kiln calcine, produced from EAF dust, has shown that the calcine pellets consisted mainly of zinc oxide plates with some iron oxide particles. Preliminary leaching tests using hydrochloric and sulfuric acids indicated that this calcine is suitable for selective ultrasound leaching of zinc. A factorially designed screening test using hydrochloric acid showed that ultrasound significantly lowered iron dissolution and increased zinc dissolution, thus enhancing the selective leaching of zinc. Ultrasound, temperature, air bubbling rate and acidity increased the sulfuric acid selectivity, while fluorosilicic acid was not selective. Reactor characterization through ultrasonic field measurements led to the selection of reactor and ultrasound bath, which were utilized to enhance the selectivity of a laboratory scale sulfuric acid leaching of a double-kiln treated electric arc furnace dust. Results indicated that ultrasonic leaching of this calcine is a satisfactory technique to selectively separate zinc from iron. After further iron removal by precipitation and cementation of nickel, it was possible to electrowin zinc from the leach liquor under common industrial conditions, with current efficiencies from 86% through 92% being observed. Calcine washing showed that a substantial chloride removal is possible, but fluoride ion in the electrolyte caused deposit sticking during electrowinning.

  7. Ultrathin diamond-like carbon films deposited by filtered carbon vacuum arcs

    E-Print Network [OSTI]

    Anders, Andre; Fong, Walton; Kulkarni, Ashok; Ryan, Francis W.; Bhatia, C. Singh

    2001-01-01T23:59:59.000Z

    was supported through the CRADA BG98- 084(01) of the ER-LTRby CVC-Veeco, Inc. , the CRADA Industrial Partner, by thewas supported through the CRADA BG98-084(01) of the ER-LTR

  8. Suppression of Ge-O And Ge-N Bonding at Ge-HfO(2) And Ge-TiO(2) Interfaces By Deposition Onto Plasma-Nitrided Passivated Ge Substrates: Integration Issues Ge Gate Stacks Into Advanced Devices

    SciTech Connect (OSTI)

    Lee, S.; Long, J.P.; Lucovsky, G.; Whitten, J.; Seo, H.; Luning, J.

    2009-05-19T23:59:59.000Z

    A study of changes in nano-scale morphology of thin films of nano-crystalline transition metal (TM) elemental oxides, HfO{sub 2} and TiO{sub 2}, on plasma-nitrided Ge(100) substrates, and Si(100) substrates with ultra-thin (-0.8 nm) plasma-nitrided Si suboxide, SiO{sub x}, x < 2, or SiON interfacial layers is presented. Near edge X-ray absorption spectroscopy (NEXAS) has been used to determine nano-scale morphology of these films by Jahn-Teller distortion removal of band edge d-state degeneracies. These results identify a new and novel application for NEXAS based on the resonant character of the respective O K{sub 1} and N K{sub 1} edge absorptions. This paper also includes a brief discussion of the integration issues for the introduction of this Ge breakthrough into advanced semiconductor circuits and systems. This includes a comparison of nano-crystalline and non-crystalline dielectrics, as well as issues relative to metal gates.

  9. Simple method of impurity injection into tokamak plasmas

    SciTech Connect (OSTI)

    Hildebrandt, D.; Bakos, J.S.; Petravich, G.; Badalec, H.; Jakubka, K.

    1989-04-01T23:59:59.000Z

    Injection of test impurities into the edge plasma of tokamak discharges by erosion probes containing these impurities is described. By applying a short bias pulse to the probe inserted into the sol-plasma, the plasma density and temperature at the probe location can be deduced and the time of injection during the discharge can be controlled. By locating the probe at an appropriate position it is possible to release defined quantities of the material and to influence the fraction which penetrates into the core plasma. The injection of Li into hydrogen discharges of the small-sized tokamaks Castor and MT-1 is demonstrated. The nature of the main erosion process (ion sputtering or arcing) has been found to depend on the radial position of the probe and the probe potential. The lithium amount released by sputtering is determined, while in the case of arcing only an estimate can be given. The temporal evolution and the radial penetration of the Li influx into the plasma have been observed by monitoring the neutral emission line using a grating spectrometer and a CCD camera. In addition, Li transported through the plasma was collected on solid samples. An estimate is given on the fraction of the impurity efflux from the core plasma which is collected on the samples.

  10. Large area atmospheric-pressure plasma jet

    DOE Patents [OSTI]

    Selwyn, Gary S. (Los Alamos, NM); Henins, Ivars (Los Alamos, NM); Babayan, Steve E. (Huntington Beach, CA); Hicks, Robert F. (Los Angeles, CA)

    2001-01-01T23:59:59.000Z

    Large area atmospheric-pressure plasma jet. A plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250.degree. C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two planar, parallel electrodes are employed to generate a plasma in the volume therebetween. A "jet" of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly spacing the rf-powered electrode. Because of the atmospheric pressure operation, there is a negligible density of ions surviving for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike the situation for low-pressure plasma sources and conventional plasma processing methods.

  11. Recycling of electric-arc-furnace dust

    SciTech Connect (OSTI)

    Sresty, G.C.

    1990-05-01T23:59:59.000Z

    Electric arc furnace (EAF) dust is one of the largest solid waste streams produced by steel mills, and is classified as a waste under the Resource Conservation and Recovery Act (RCRA) by the U.S. Environmental Protection Agency (EPA). Successful recycle of the valuable metals (iron, zinc, and lead) present in the dust will result in resource conservation while simultaneously reducing the disposal problems. Technical feasibility of a novel recycling method based on using hydrogen as the reductant was established under this project through laboratory experiments. Sponge iron produced was low in zinc, cadmium, and lead to permit its recycle, and nontoxic to permit its safe disposal as an alternative to recycling. Zinc oxide was analyzed to contain 50% to 58% zinc by weight, and can be marketed for recovering zinc and lead. A prototype system was designed to process 2.5 tons per day (600 tons/year) of EAF dust, and a preliminary economic analysis was conducted. The cost of processing dust by this recycling method was estimated to be comparable to or lower than existing methods, even at such low capacities.

  12. Lightning Induced Arcing an LDRD Report

    SciTech Connect (OSTI)

    JORGENSON,ROY E.; WARNE,LARRY K.; KUNHARDT,ERICH E.

    2000-12-01T23:59:59.000Z

    The purpose of this research was to develop a science-based understanding of the early-time behavior of electric surface arcing in air at atmospheric pressure. As a first step towards accomplishing this, we used a kinetic approach to model an electron swarm as it evolved in a neutral gas under the influence of an applied electric field. A computer code was written in which pseudo-particles, each representing some number of electrons, were accelerated by an electric field. The electric field due to the charged particles was calculated efficiently using a tree algorithm. Collision of the electrons with the background gas led to the creation of new particles through the processes of ionization and photoionization. These processes were accounted for using measured cross-section data and Monte Carlo methods. A dielectric half-space was modeled by imaging the charges in its surface. Secondary electron emission from the surface, resulting in surface charging, was also calculated. Simulation results show the characteristics of a streamer in three dimensions. A numerical instability was encountered before the streamer matured to form branching.

  13. Plasma generators, reactor systems and related methods

    DOE Patents [OSTI]

    Kong, Peter C. (Idaho Falls, ID); Pink, Robert J. (Pocatello, ID); Lee, James E. (Idaho Falls, ID)

    2007-06-19T23:59:59.000Z

    A plasma generator, reactor and associated systems and methods are provided in accordance with the present invention. A plasma reactor may include multiple sections or modules which are removably coupled together to form a chamber. Associated with each section is an electrode set including three electrodes with each electrode being coupled to a single phase of a three-phase alternating current (AC) power supply. The electrodes are disposed about a longitudinal centerline of the chamber and are arranged to provide and extended arc and generate an extended body of plasma. The electrodes are displaceable relative to the longitudinal centerline of the chamber. A control system may be utilized so as to automatically displace the electrodes and define an electrode gap responsive to measure voltage or current levels of the associated power supply.

  14. Stability of very-high pressure arc discharges against perturbations of the electron temperature

    SciTech Connect (OSTI)

    Benilov, M. S. [Departamento de Fisica, Ciencias Exactas e Engenharia, Universidade da Madeira, Largo do Municipio, Funchal 9000 (Portugal); Hechtfischer, U. [Philips Lighting, BU Automotive Lamps, Technology, Philipsstrasse 8, Aachen 52068 (Germany)

    2012-04-01T23:59:59.000Z

    We study the stability of the energy balance of the electron gas in very high-pressure plasmas against longitudinal perturbations, using a local dispersion analysis. After deriving a dispersion equation, we apply the model to a very high-pressure (100 bar) xenon plasma and find instability for electron temperatures, T{sub e}, in a window between 2400 K and 5500-7000 K x 10{sup 3} K, depending on the current density (10{sup 6}-10{sup 8} A/m{sup 2}). The instability can be traced back to the Joule heating of the electron gas being a growing function of T{sub e}, which is due to a rising dependence of the electron-atom collision frequency on T{sub e}. We then analyze the T{sub e} range occurring in very high-pressure xenon lamps and conclude that only the near-anode region exhibits T{sub e} sufficiently low for this instability to occur. Indeed, previous experiments have revealed that such lamps develop, under certain conditions, voltage oscillations accompanied by electromagnetic interference, and this instability has been pinned down to the plasma-anode interaction. A relation between the mechanisms of the considered instability and multiple anodic attachments of high-pressure arcs is discussed.

  15. Plasma Diagnostics and Plasma-Surface Interactions in Inductively Coupled Plasmas

    E-Print Network [OSTI]

    Titus, Monica Joy

    2010-01-01T23:59:59.000Z

    Plasma Diagnostics and Plasma-Surface Interactions inLieberman Spring 2010 Plasma Diagnostics and Plasma-SurfaceJoy Titus Abstract Plasma Diagnostics and Plasma-Surface

  16. Development and Use of the Dual-Mode Plasma Torch

    SciTech Connect (OSTI)

    Womack, R.; Shuey, M.

    2002-02-26T23:59:59.000Z

    After several years of development, a commercially available high-temperature treatment system has been developed and installed that treats heterogeneous low-level radioactive waste. High temperature plasma processing, unique torch design and operating features make it feasible to achieve a volume reduced, permanent, high integrity waste form while eliminating the personnel exposure and costs associated with conventional sorting, characterizing and handling. Plasma technology can also be used to treat previous conditioned waste packages that no longer meet the current acceptance criteria for final disposal. Plasma treatment can result, in many cases, in a substantial volume reduction, which lowers the final disposal costs. This paper covers the recently patented dual mode plasma torch design(1), the lessons learned that fostered its development and the advantages it brings to radioactive waste processing. This paper also provides current full scale Plasma Arc Centrifugal Treatment (PACT) project status and how the dual mode torch is being used in the PACT system.

  17. Plasma flow measurements in a simulated low earth orbit plasma

    SciTech Connect (OSTI)

    Gabriel, S.B. (California Institute of Technology, Jet Propulsion Laboratory, Electrical Power and Propulsion Section, Pasadena, CA); Mccoy, J.E. (NASA, Johnson Space Center, Houston, TX); Carruth, M.R. Jr. (NASA, Marshall Space Flight Center, Huntsville, AL)

    1982-01-01T23:59:59.000Z

    The employment of large, higher power solar arrays for space operation has been considered, taking into account a utilization of high operating voltages. In connection with the consideration of such arrays, attention must be given to the fact that the ambient environment of space contains a tenuous low energy plasma which can interact with the high voltage array causing power 'leakage' and arcing. An investigation has been conducted with the aim to simulate the behavior of such an array in low-earth-orbit (LEO). During the experiments, local concentrations of the 'leakage' current were observed when the panel was at a high voltage. These concentrations could overload or damage a small area of cells in a large string. It was hypothesized that this effect was produced by electrostatic focusing of the particles by the sheath fields. To verify this experimentally, an end-effect Langmuir probe was employed. The obtained results are discussed.

  18. Instrument Series: Deposition and Microfabrication Sputter Deposition

    E-Print Network [OSTI]

    Sensors ­ thin film growth of functional material systems for developing highly sensitive and portable chemical and biological sensors Energy sources ­ development of thin film materials systems for research and solid oxide fuel cells and solar cells for energy generation Microfabrication ­ deposition

  19. Radionuclide deposition control

    DOE Patents [OSTI]

    Brehm, William F. (Richland, WA); McGuire, Joseph C. (Richland, WA)

    1980-01-01T23:59:59.000Z

    The deposition of radionuclides manganese-54, cobalt-58 and cobalt-60 from liquid sodium coolant is controlled by providing surfaces of nickel or high nickel alloys to extract the radionuclides from the liquid sodium, and by providing surfaces of tungsten, molybdenum or tantalum to prevent or retard radionuclide deposition.

  20. E-Print Network 3.0 - ajustable para reactores Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summary: diagnostic measurements of acetylene absorption in hot-filament and DC-arc plasma jet reactors operating... deposition. The acetylene was widely4 2 distributed...

  1. Arcing fault in sub-distribution branch circuits

    SciTech Connect (OSTI)

    Parise, G.; Grasseli, U.; Luozzo, V. Di (Univ. di Roma, Rome (Italy). Dept. di Ingegneria Elettrica)

    1993-04-01T23:59:59.000Z

    It's well known the importance of short-circuit current evaluation for the design of any power system. Every system is subject to faults, moreover short-circuits and ground faults can be expected in any point. Even if the maximum and minimum values are generally defined with reference at a bolted-fault, bolted short-circuits are rare and the fault usually involves arcing and burning; particularly the limit value of minimum short-circuit depends really on arcing-fault. In earlier experimental investigations into the functional simulation of insulation loss, in branch circuit conductors, the authors chose to normalize the arcing-fault simulation to be used in laboratory tests. This conventional simulation allows characterization of this intrinsically random phenomenon by means of a probabilistic approach, in order to define in statistical terms the expected short circuit value. The authors examine more closely the arcing-fault in the design of sub distribution branch-circuits as weak points of the installation. In fact, what they propose are straightforward criteria, whether in the structure of the system or in the coordination of protection, which afford a more rational control on arcing-fault.

  2. Graphite electrode arc melter demonstration Phase 2 test results

    SciTech Connect (OSTI)

    Soelberg, N.R.; Chambers, A.G.; Anderson, G.L.; O`Connor, W.K.; Oden, L.L.; Turner, P.C.

    1996-06-01T23:59:59.000Z

    Several U.S. Department of Energy organizations and the U.S. Bureau of Mines have been collaboratively conducting mixed waste treatment process demonstration testing on the near full-scale graphite electrode submerged arc melter system at the Bureau`s Albany (Oregon) Research Center. An initial test series successfully demonstrated arc melter capability for treating surrogate incinerator ash of buried mixed wastes with soil. The conceptual treatment process for that test series assumed that buried waste would be retrieved and incinerated, and that the incinerator ash would be vitrified in an arc melter. This report presents results from a recently completed second series of tests, undertaken to determine the ability of the arc melter system to stably process a wide range of {open_quotes}as-received{close_quotes} heterogeneous solid mixed wastes containing high levels of organics, representative of the wastes buried and stored at the Idaho National Engineering Laboratory (INEL). The Phase 2 demonstration test results indicate that an arc melter system is capable of directly processing these wastes and could enable elimination of an up-front incineration step in the conceptual treatment process.

  3. Solution deposition assembly

    DOE Patents [OSTI]

    Roussillon, Yann; Scholz, Jeremy H; Shelton, Addison; Green, Geoff T; Utthachoo, Piyaphant

    2014-01-21T23:59:59.000Z

    Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber, at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.

  4. Biomimetic thin film deposition

    SciTech Connect (OSTI)

    Rieke, P.R.; Graff, G.E.; Campbell, A.A.; Bunker, B.C.; Baskaran, S.; Song, L.; Tarasevich, B.J.; Fryxell, G.E.

    1995-09-01T23:59:59.000Z

    Biological mineral deposition for the formation of bone, mollusk shell and other hard tissues provides materials scientists with illustrative materials processing strategies. This presentation will review the key features of biomineralization and how these features can be of technical importance. We have adapted existing knowledge of biomineralization to develop a unique method of depositing inorganic thin films and coating. Our approach to thin film deposition is to modify substrate surfaces to imitate the proteins found in nature that are responsible for controlling mineral deposition. These biomimetic surfaces control the nucleation and growth of the mineral from a supersaturated aqueous solution. This has many processing advantages including simple processing equipment, environmentally benign reagents, uniform coating of highly complex shapes, and enhanced adherence of coating. Many different types of metal oxide, hydroxide, sulfide and phosphate materials with useful mechanical, optical, electronic and biomedical properties can be deposited.

  5. Plasma momentum meter for momentum flux measurements

    DOE Patents [OSTI]

    Zonca, Fulvio (Rome, IT); Cohen, Samuel A. (Hopewell, NJ); Bennett, Timothy (Princeton, NJ); Timberlake, John R. (Allentown, NJ)

    1993-01-01T23:59:59.000Z

    Invention comprises an instrument in which momentum flux onto a biasable target plate is transferred via a suspended quartz tube onto a sensitive force transducer--a capacitance-type pressure gauge. The transducer is protected from thermal damage, arcing and sputtering, and materials used in the target and pendulum are electrically insulating, rigid even at elevated temperatures, and have low thermal conductivity. The instrument enables measurement of small forces (10.sup.-5 to 10.sup.3 N) accompanied by high heat fluxes which are transmitted by energetic particles with 10's of eV of kinetic energy in a intense magnetic field and pulsed plasma environment.

  6. Constricted glow discharge plasma source

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA); Anders, Simone (Albany, CA); Dickinson, Michael (San Leandro, CA); Rubin, Michael (Berkeley, CA); Newman, Nathan (Winnetka, IL)

    2000-01-01T23:59:59.000Z

    A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.

  7. Voltage flicker prediction for two simultaneously operated ac arc furnaces

    SciTech Connect (OSTI)

    Tang, L. [ABB Power T and D Co., Inc., Raleigh, NC (United States)] [ABB Power T and D Co., Inc., Raleigh, NC (United States); Kolluri, S. [Entergy Services, New Orleans, LA (United States)] [Entergy Services, New Orleans, LA (United States); McGranaghan, M.F. [Electrotek Concepts, Inc., Knoxville, TN (United States)] [Electrotek Concepts, Inc., Knoxville, TN (United States)

    1997-04-01T23:59:59.000Z

    An EMTP-based arc furnace model was developed for evaluation of flicker concerns associated with supplying a large integrated steel mill as they go from one to two furnace operation and as system changes are implemented that will affect the short circuit capacity at the 230 kV power supply substation. The model includes a dynamic arc representation which is designed to be characteristic of the initial portions of the melt cycle when the arc characteristics are the most variable (worst flicker conditions). The flicker calculations are verified using previous measurements with one furnace operation. Flicker simulations were then performed to evaluate a variety of different possible system strengths with both one and two furnaces in operation. The primary flicker measure used for this study is the unweighted rms value of the fluctuation envelope, expressed as a percentage of the rms line-to-ground voltage magnitude.

  8. PNNL 331 Building Arc Flash Team Investigation Report

    SciTech Connect (OSTI)

    Deichman, Mark L.; Drewrey, John C.; Hodges, Hurtis; Madson, Vernon J.; Minton, Allen L.; Montgomery, Daniel M.; Olson, Marvin E.; Rojas, Pedro H.; Sanan, Sanjay K.; Sharp, Reed D.; Sparks, Bobby R.; Swearingen, Gary L.

    2006-06-06T23:59:59.000Z

    On Friday, April 21, 2006, a PNNL electrician was performing repair of an electrical system for the 331 Building chilled water pump (CHWP) No.2, when an electrical arc flash occurred inside a 480V combination motor starter. The electrician was taken to the on-site medical provider for evaluation and was released for return to work without restriction. The electrician was not shocked, but did receive a minor, superficial (first degree) burn on the left wrist. This report, the result of a thorough review by the 331 Building Arc Flash Assessment Team, provides an in-depth look at the steps leading up to the arc-flash and recommendations and opportunities for improvement.

  9. Nonequilibrium Alfvenic Plasma Jets Associated with Spheromak Formation Deepak Kumar and Paul M. Bellan

    E-Print Network [OSTI]

    Bellan, Paul M.

    Nonequilibrium Alfve´nic Plasma Jets Associated with Spheromak Formation Deepak Kumar and Paul M the helicity injection stage of the Caltech spheromak experiment. Density and time of flight measurements-current arcs [4], Z-pinch formation [5], spheromak formation [6,7], and sustainment [8]) to extraterrestrial

  10. Electromagnetic Waves Propagation in 3D Plasma Configurations

    E-Print Network [OSTI]

    Electromagnetic Waves Propagation in 3D Plasma Configurations Pavel Popovich, W. Anthony Cooper in a plasma strongly depends on the frequency, therefore the tools used for wave propagation studies are very that will allow for the calculation of the fields and energy deposition of a low-frequency wave propagating

  11. Some effects of magnetic blowouts on arc interruption

    E-Print Network [OSTI]

    Benish, Joe

    1949-01-01T23:59:59.000Z

    . , Ths Electric Arc, Electrician, London, 1902. Holm, op. cit. , pp. 257-70. cnr ~ent s. T p Ga exte nal ircu t res for ist 13 10 X X I I 7 I ? ? -/ ? ?- / I -/ / / / / / / / / / o DotteR cnrve inQica Los maximum values of gap... for Testing Materials, Biblio- Vl graphy on Electrical Contacts, Philadelphia, 19/3. Also 19+, 19/5, a n d 19/6 Supplements. // I 'I (15) Ayr ton, H. , The Electric Arc, Electrician, London, 1902. APPENDIX I SUMMARY OF EXPERIMENTAL DATA EXPERIMENTAL...

  12. Ash deposit workshop: Class outline

    SciTech Connect (OSTI)

    Hatt, R. [Commercial Testing & Engineering Co., Lexington, KY (United States)

    1996-12-31T23:59:59.000Z

    Ash deposits formed from the combustion of coal and other fuels have plagued the steam production industry from the start. The ash fusion test has been around for over eighty years. As steam plant size increased, so have the problems associated with ash deposits. This workshop is designed to cover: (1) The basic types of deposits. (2) Causes of deposits. (3) Analytical procedures for resolving, or at least providing information about deposits and fuels, and (4) Deposit removal and reduction techniques.

  13. Chemical Vapor Deposition of Silicon Dioxide by Direct-Current Corona Discharges in Dry Air

    E-Print Network [OSTI]

    Chen, Junhong

    Chemical Vapor Deposition of Silicon Dioxide by Direct-Current Corona Discharges in Dry Air, Si4O4(CH3)8) widely used as additives in personal care products. In both photocopiers and air in indoor air, the gas-phase processes limit the rate of deposition. KEY WORDS: Corona plasma; corona

  14. Rates of tectonic and magmatic processes in the North Cascades continental magmatic arc

    E-Print Network [OSTI]

    Matzel, Jennifer E. Piontek, 1973-

    2004-01-01T23:59:59.000Z

    Continental magmatic arcs are among the most dynamic. geologic systems, and documentation of the magmatic, thermal, and tectonic evolution of arcs is essential for understanding the processes of magma generation, ascent ...

  15. E-Print Network 3.0 - american volcanic arc Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Sample search results for: american volcanic arc Page: << < 1 2 3 4 5 > >> 1 Project: EARTH-12-TM2: Volcanic volatile fluxes and the Central American Volcanic Arc (CAVA) Summary:...

  16. E-Print Network 3.0 - arc cast lcac Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    rocker bottom... by attaching rigid arc shapes of various radii to the bottoms of rigid boots restricting ankle motion. We... (N10) walking with seven arc radii from 0.02-0.40m....

  17. E-Print Network 3.0 - auroral red arc Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    red arc Search Powered by Explorit Topic List Advanced Search Sample search results for: auroral red arc Page: << < 1 2 3 4 5 > >> 1 Annales Geophysicae, 23, 15231531, 2005...

  18. ARCS FOUNDATION GLOBAL IMPACT AWARD Global Health, Public Good and Graduate Education

    E-Print Network [OSTI]

    Arnold, Jonathan

    1 ARCS FOUNDATION GLOBAL IMPACT AWARD Global Health, Public Good and Graduate Education Case the ARCS Foundation Awards Luncheon in Atlanta on November 21, 2013. Application Materials: 1) A letter

  19. E-Print Network 3.0 - arc protection class Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    in a GIS: A Bidirectional Link between ArcView 2.0TM and XGobi Summary: . The XGobi remote proce- dures callable from within ArcView 2.0 can be grouped into two classes. One...

  20. E-Print Network 3.0 - arc flash protections Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    VOL. 46, NO. 6, NOVEMBERDECEMBER 2010 2233 A Dynamic Model of a High-Temperature Arc Lamp Summary: . 11, pp. 707-711, Nov. 1966. 3 High Performance Flash and Arc Lamps,...

  1. E-Print Network 3.0 - assisted non-consumable arc Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    gas tungsten arc welding Reginald Crawford,* George E... : An adaptive control based on fuzzy logic has been implemented for Gas Tungsten Arc Welding (GTAW Source: Zhang, YuMing -...

  2. Characterization of argon arc source in the infrared J. M. Bridges and A. L. Migdall

    E-Print Network [OSTI]

    Migdall, Alan

    metrologia Characterization of argon arc source in the infrared J. M. Bridges and A. L. Migdall path. Although a resistor of 0,25 is used for ignition, the arc requires no ballast during Metrologia

  3. NSTX Plasma Response to Lithium Coated Divertor

    SciTech Connect (OSTI)

    H.W. Kugel, M.G. Bell, J.P. Allain, R.E. Bell, S. Ding, S.P. Gerhardt, M.A. Jaworski, R. Kaita, J. Kallman, S.M. Kaye, B.P. LeBlanc, R. Maingi, R. Majeski, R. Maqueda, D.K. Mansfield, D. Mueller, R. Nygren, S.F. Paul, R. Raman, A.L. Roquemore, S.A. Sabbagh, H. Schneider, C.H. Skinner, V.A. Soukhanovskii, C.N. Taylor, J.R. Timberlak, W.R. Wampler, L.E. Zakharov, S.J. Zweben, and the NSTX Research Team

    2011-01-21T23:59:59.000Z

    NSTX experiments have explored lithium evaporated on a graphite divertor and other plasma facing components in both L- and H- mode confinement regimes heated by high-power neutral beams. Improvements in plasma performance have followed these lithium depositions, including a reduction and eventual elimination of the HeGDC time between discharges, reduced edge neutral density, reduced plasma density, particularly in the edge and the SOL, increased pedestal electron and ion temperature, improved energy confinement and the suppression of ELMs in the H-mode. However, with improvements in confinement and suppression of ELMs, there was a significant secular increase in the effective ion charge Zeff and the radiated power in H-mode plasmas as a result of increases in the carbon and medium-Z metallic impurities. Lithium itself remained at a very low level in the plasma core, <0.1%. Initial results are reported from operation with a Liquid Lithium Divertor (LLD) recently installed.

  4. Polycrystal diamond growth in a microwave plasma torch

    SciTech Connect (OSTI)

    Sergeichev, K. F.; Lukina, N. A.; Bolshakov, A. P.; Ralchenko, V. G.; Arutyunyan, N. R.; Vlasov, I. I. [Russian Academy of Sciences, Prokhorov Institute of General Physics (Russian Federation)

    2010-12-15T23:59:59.000Z

    Diamond films of different structures were deposited on quartz, WC-Co, and molybdenum substrates in a microwave plasma torch discharge in an argon-hydrogen-methane gas mixture in a sealed chamber at pressures close to atmospheric by using the chemical vapor deposition technique. Images of diamond polycrystal films and separate crystals, as well as results of Raman spectroscopy, are presented. The spectra of optical plasma radiation recorded during film deposition demonstrate the presence of intense H{sub {alpha}} hydrogen and C{sub 2} radical bands known as Swan bands.

  5. Ultrashort pulse laser deposition of thin films

    DOE Patents [OSTI]

    Perry, Michael D. (Livermore, CA); Banks, Paul S. (Livermore, CA); Stuart, Brent C. (Fremont, CA)

    2002-01-01T23:59:59.000Z

    Short pulse PLD is a viable technique of producing high quality films with properties very close to that of crystalline diamond. The plasma generated using femtosecond lasers is composed of single atom ions with no clusters producing films with high Sp.sup.3 /Sp.sup.2 ratios. Using a high average power femtosecond laser system, the present invention dramatically increases deposition rates to up to 25 .mu.m/hr (which exceeds many CVD processes) while growing particulate-free films. In the present invention, deposition rates is a function of laser wavelength, laser fluence, laser spot size, and target/substrate separation. The relevant laser parameters are shown to ensure particulate-free growth, and characterizations of the films grown are made using several diagnostic techniques including electron energy loss spectroscopy (EELS) and Raman spectroscopy.

  6. Sediment Budget Analysis System (SBAS) for ArcGIS 10 -User's Guide Page 1 of 49

    E-Print Network [OSTI]

    US Army Corps of Engineers

    Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 1 of 49 CESAM-OPJ-GIS Document current as of March 28, 2012 10:27 AM Sediment Budget Analysis System (SBAS) for ArcGIS 10 User's Guide D R AFT #12;Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 2 of 49 CESAM

  7. Sediment Budget Analysis System (SBAS) for ArcGIS 10 -User's Guide Page 1 of 50

    E-Print Network [OSTI]

    US Army Corps of Engineers

    Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 1 of 50 CESAM-OPJ-GIS Document current as of June 27, 2012 10:09 AM Sediment Budget Analysis System (SBAS) for ArcGIS 10 User's Guide D R AFT #12;Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 2 of 50 CESAM

  8. Modelling of the bead formation during multi pass hybrid laser/gas metal arc welding

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    - 1 - Modelling of the bead formation during multi pass hybrid laser/gas metal arc welding Olivier dimensional finite element model has been developed to simulate weld bead formation in multi pass hybrid laser/gas metal arc welding. The model considers both a gas metal arc welding (GMAW) electrode and a laser beam

  9. Control Engineering Practice 11 (2003) 14011411 Modeling and control of quasi-keyhole arc welding process

    E-Print Network [OSTI]

    Zhang, YuMing

    Control Engineering Practice 11 (2003) 1401­1411 Modeling and control of quasi-keyhole arc welding to operate the keyhole arc welding process. Because the method's effectiveness depends on the amperage reserved. Keywords: Modeling; Predictive control; Manufacturing; Welding 1. Introduction Keyhole arc

  10. ~.,Slag-Metal Equilibrium During Submerged e-~~ Arc Welding

    E-Print Network [OSTI]

    Eagar, Thomas W.

    ~~ . ~.·,Slag-Metal Equilibrium During Submerged ·e-~~ Arc Welding C. S. CHAI AND T. W. EAGAR A thermodynamic model of the equilibria existing between the slag and the weld metal during submerged arc welding over forty years ago, submerged arc welding has developed into one of the most efficient, most reliable

  11. Individualization of textural and reactional microdomains in eclogites from the Bergen Arcs (Norway): Consequences for

    E-Print Network [OSTI]

    Demouchy, Sylvie

    Individualization of textural and reactional microdomains in eclogites from the Bergen Arcs (Norway in Caledonian eclogites from the Linda°s Nappe, Bergen Arcs, Norway, in order to investigate processes in eclogites from the Bergen Arcs (Norway): Consequences for Rb/Sr and Ar/Ar radiochronometer behavior during

  12. A static voltage-current characteristic for the low current DC arc

    E-Print Network [OSTI]

    Moores, Gregory Lee

    1998-01-01T23:59:59.000Z

    in the literature. Evaluated using the F-statistic, the best model, with a standard error of less than 3V , was a voltage source, opposed to the system voltage, dependent only on arc length. Current only influenced arc lifetime. Varc=l3v+l68v/inch*arc length...

  13. Longitudinally propagating arc wave in the pre-onset optical aurora V. M. Uritsky,1

    E-Print Network [OSTI]

    California at Berkeley, University of

    Longitudinally propagating arc wave in the pre-onset optical aurora V. M. Uritsky,1 J. Liang,1 E aurora ­ the longitudinally propagating arc wave (LPAW) ­ associated with flapping oscillations, and K. H. Glassmeier (2009), Longitudinally propagating arc wave in the pre-onset optical aurora

  14. ACYCLIC GROUPS AND WILD ARCS A. J. BERRICK AND YAN-LOI WONG

    E-Print Network [OSTI]

    Berrick, A J.

    ACYCLIC GROUPS AND WILD ARCS A. J. BERRICK AND YAN-LOI WONG Abstract. We discuss two classes, and is shown to include a number of wild arc groups in the literature. 0. Introduction This paper introduces cyclic cover of X \\ is the complement of a wild arc in S3 with the following properties. (i) S3

  15. A Generic Arc-Consistency Algorithm and its Specializations1

    E-Print Network [OSTI]

    Deville, Yves

    not take into account the semantics of constraints. In this paper, we present a new generic arc satisfaction problems (CSP). A CSP is de ned by a nite set of variables taking values from nite domains of applications include graph-coloring, warehouse locations, car-sequencing and cutting stock (see for instance 4

  16. A Generic ArcConsistency Algorithm and its Specializations 1

    E-Print Network [OSTI]

    Deville, Yves

    , these algorithms do not take into account the semantics of constraints. In this paper, we present a new generic arc as constraint satisfaction problems (CSP). A CSP is defined by a finite set of variables taking values from. Examples of applications include graph­coloring, warehouse locations, car­sequencing and cutting stock (see

  17. The fractal nature of vacuum arc cathode spots

    SciTech Connect (OSTI)

    Anders, Andre

    2005-05-27T23:59:59.000Z

    Cathode spot phenomena show many features of fractals, for example self-similar patterns in the emitted light and arc erosion traces. Although there have been hints on the fractal nature of cathode spots in the literature, the fractal approach to spot interpretation is underutilized. In this work, a brief review of spot properties is given, touching the differences between spot type 1 (on cathodes surfaces with dielectric layers) and spot type 2 (on metallic, clean surfaces) as well as the known spot fragment or cell structure. The basic properties of self-similarity, power laws, random colored noise, and fractals are introduced. Several points of evidence for the fractal nature of spots are provided. Specifically power laws are identified as signature of fractal properties, such as spectral power of noisy arc parameters (ion current, arc voltage, etc) obtained by fast Fourier transform. It is shown that fractal properties can be observed down to the cutoff by measurement resolution or occurrence of elementary steps in physical processes. Random walk models of cathode spot motion are well established: they go asymptotically to Brownian motion for infinitesimal step width. The power spectrum of the arc voltage noise falls as 1/f {sup 2}, where f is frequency, supporting a fractal spot model associated with Brownian motion.

  18. Plasma-Ion Processing of Three-Dimensional Components

    SciTech Connect (OSTI)

    Yukimura, Ken [Department of Electrical Engineering, Doshisha University, Kyotanabe 610-0321 (Japan); Wei Ronghua [Surface Engineering Section, Materials Engineering Department, Southwest Research Institute, San Antonio, Texas 78238-5166 (United States)

    2004-12-01T23:59:59.000Z

    Plasma-based ion implantation and deposition (PBII and D) technology has been developed rapidly in the past decade. This technique is especially promising for modifying three-dimensional components. In PBII and D, plasma is generated in the entire processing chamber and then surrounds the components. When a train of negative voltage pulses are applied to the parts, ions are drawn to all the surfaces exposed to the plasma. At a high energy, ions are implanted to the surfaces, but at a low energy and with a proper precursor gases, ions are deposited to form a film. This technology has found applications in many areas including semiconductors, automotive, aerospace, energy and biomedical. This article reviews PBII and D fundamentals, describes features of various PBII and D systems and plasma sources, and discusses implantation and deposition techniques. The paper will also present application examples of this technology.

  19. The PERC{trademark} process: Existing and potential applications for induction coupled plasma technology in hazardous and radioactive waste treatment

    SciTech Connect (OSTI)

    Blutke, A.S.; Vavruska, J.S.; Serino, J.F. [Plasma Technology, Inc., Santa Fe, NM (United States)

    1996-12-31T23:59:59.000Z

    Plasma Technology, Inc. (PTI), a Santa Fe, New Mexico corporation has developed the Plasma Energy Recycle and Conversion (PERC){trademark} treatment process as a safe and environmentally clean alternative to conventional thermal destruction technologies. The PERC{trademark} treatment process uses as its heat source an advanced Induction Coupled Plasma (ICP) torch connected to a reaction chamber system with an additional emission control system. For example, organic-based gas, liquid, slurry, and/or solid waste streams can be converted into usable or even salable products while residual emissions are reduced to an absolute minimum. In applications for treatment of hazardous and radioactive waste streams, the PERC system could be used for destruction of the hazardous organic constituents and/or significant waste volume reduction while capturing the radioactive fraction in a non-leachable form. Like Direct Current (DC) and Alternating Current (AC) arc plasma systems, ICP torches offer sufficient energy to decompose, melt and/or vitrify any waste stream. The decision for an arc plasma or an IC plasma system has to be made on a case by case evaluation and is highly dependent on the specific waste stream`s form and composition. Induction coupled plasma technology offers one simple, but significant difference compared to DC or AC arc plasma systems: the ICP torch is electrodeless. To date, enormous research effort has been spent to improve the lifetime of electrodes and the effectiveness of related cooling systems. Arc plasma systems are established in research laboratories worldwide and are approaching a broad use in commercial applications. ICP technology has been improved relatively recently, but nowadays offers complete new and beneficial approaches in the field of waste conversion and treatment.

  20. Engineering properties of superhard films with ion energy and post-deposition processing

    SciTech Connect (OSTI)

    Monteiro, Othon R.; Delplancke-Ogletree, Mari-Paule

    2002-10-14T23:59:59.000Z

    Recent developments in plasma synthesis of hard materials using energetic ions are described. Metal Plasma Immersion Ion Implantation and Deposition (MePIIID) has been used to prepare several hard films: from diamondlike carbon (DLC) to carbides, from nitrides to oxides. The energy of the depositing species is controlled to maximize adhesion as well as to change the physical and chemical properties of the films. Adhesion is promoted by the creation of a graded interface between the film and the substrate. The energy of the depositing ions is also used to modify and control the intrinsic stresses and the microstructure of the films. The deposition is carried out at room temperature, which is important for temperature sensitive substrates. A correlation between intrinsic stresses and the energetics of the deposition is presented for the case of DLC films, and means to reduce stress levels are discussed.

  1. Supersonic metal plasma impact on a surface: An optical investigation of the pre-surface region

    SciTech Connect (OSTI)

    Fusion Science Group, AFRD; Plasma Applications Group, AFRD; Ni, Pavel A.; Anders, Andre

    2009-12-15T23:59:59.000Z

    Aluminum plasma, produced in high vacuum by a pulsed, filtered cathodic arc plasma source, was directed onto a wall where if formed a coating. The accompanying ?optical flare? known from the literature was visually observed, photographed, and spectroscopically investigated with appropriately high temporal (1 ?s) and spatial (100 ?m) resolution. Consistent with other observations using different techniques, it was found that the impact of the fully ionized plasma produces metal neutrals as well as desorbed gases, both of which interact with the incoming plasma. Most effectively are charge exchange collisions between doubly charged aluminum and neutral aluminum, which lead to a reduction of the flow of doubly charged before they reach the wall, and a reduction of neutrals as the move away from the surface. Those plasma-wall interactions are relevant for coating processes as well as for interpreting the plasma properties such as ion charge state distributions.

  2. The Wyodak-Anderson coal assessment, Powder River Basin, Wyoming and Montana -- An ArcView project

    SciTech Connect (OSTI)

    Flores, R.M.; Gunther, G.; Ochs, A.; Ellis, M.E.; Stricker, G.D.; Bader, L.R. [Geological Survey, Denver, CO (United States)

    1998-12-31T23:59:59.000Z

    In 1997, more than 305 million short tons of clean and compliant coal were produced from the Wyodak-Anderson and associated coal beds and zones of the Paleocene Fort Union Formation in the Powder River Basin, Wyoming and Montana. To date, all coal produced from the Wyodak-Anderson, which averages 0.47 percent sulfur and 6.44 percent ash, has met regulatory compliance standards. Twenty-eight percent of the total US coal production in 1997 was from the Wyodak-Anderson coal. Based on the current consumption rates and forecast by the Energy Information Administration (1996), the Wyodak-Anderson coal is projected to produce 413 million short tons by the year 2016. In addition, this coal deposit as well as other Fort Union coals have recently been targeted for exploration and development of methane gas. New US Geological Survey (USGS) digital products could provide valuable assistance in future mining and gas development in the Powder River Basin. An interactive format, with querying tools, using ArcView software will display the digital products of the resource assessment of Wyodak-Anderson coal, a part of the USGS National Coal Resource Assessment of the Powder River Basin. This ArcView project includes coverages of the data point distribution; land use; surface and subsurface ownerships; coal geology, stratigraphy, quality and geochemistry; and preliminary coal resource calculations. These coverages are displayed as map views, cross sections, tables, and charts.

  3. Ultrathin ta-C films on heads depositied by twist-filtered cathodic arc carbon plasmas

    E-Print Network [OSTI]

    Anders, Andre; Ryan, Francis W.

    2000-01-01T23:59:59.000Z

    was supported through the CRADA BG98-084(01) of the ER-LTRand by CVC-Veeco, the CRADA Industrial Partner. ULTRATHINwas supported through the CRADA BG98- 084(01) of the ER-LTR

  4. Preliminary flowsheet for plasma arc calcination of selected Hanford tank waste

    SciTech Connect (OSTI)

    Hendrickson, D.W.

    1994-09-19T23:59:59.000Z

    This preliminary flowsheet document was developed for the Initial Pretreatment Module (IPM). This flowsheet documents the calcination technology that can be used to accomplish the destruction of organics, ferrocyanide, and nitrate/nitrite salts in addition to solubilizing aluminum compounds in selected waste tanks at the Hanford Site. The flow sheet conditions are 76 L/min diluted waste feed rate at 800{degrees}C, atmospheric pressure, and 100 millisecond residence time in the calciner. Preliminary flow diagrams, material balances, and energy requirements are presented.

  5. E-Print Network 3.0 - arc plasma-catalyst reformer Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Summary: by reforming their political institutions. States such as Indonesia, Thailand, the Philippines, Taiwan and East... systems and other key democratic...

  6. Arcs statistics as a probe of galaxy evolution

    E-Print Network [OSTI]

    J. Bezecourt

    1998-02-09T23:59:59.000Z

    Number counts and redshift distribution of gravitational arcs are computed in the field of massive clusters of galaxies to probe the universe at high redshift. Using an accurate modelling for the cluster mass distribution and a model for the spectrophotometric evolution of galaxies, the redshift distribution of gravitational arclets is computed in the field of cluster Abell 2218 and in the Hubble Deep Field where a cluster is artificially located. Counts are very well reproduced in the B band but an important population appears at high redshift which is not seen in deep spectroscopic surveys. Unfortunately, the very high sensitivity of the counts with respect to the model for galaxy evolution and to the mass distribution prevents from estimating the cosmological parameters with arcs statistics. Future works have to concentrate on high redshift clusters and take advantage of objects with smaller distortions.

  7. MAGENCO: A map generalization controller for Arc/Info

    SciTech Connect (OSTI)

    Ganter, J.H.; Cashwell, J.W.

    1994-06-01T23:59:59.000Z

    The Arc/Info GENERALIZE command implements the Douglas-Peucker algorithm, a well-regarded approach that preserves line ``character`` while reducing the number of points according to a tolerance parameter supplied by the user. The authors have developed an Arc Macro Language (AML) interface called MAGENCO that allows the user to browse workspaces, select a coverage, extract a sample from this coverage, then apply various tolerances to the sample. The results are shown in multiple display windows that are arranged around the original sample for quick visual comparison. The user may then return to the whole coverage and apply the chosen tolerance. They analyze the ergonomics of line simplification, explain the design (which includes an animated demonstration of the Douglas-Peucker algorithm), and discuss key points of the MAGENCO implementation.

  8. Feedback enhanced plasma spray tool

    DOE Patents [OSTI]

    Gevelber, Michael Alan; Wroblewski, Donald Edward; Fincke, James Russell; Swank, William David; Haggard, Delon C.; Bewley, Randy Lee

    2005-11-22T23:59:59.000Z

    An improved automatic feedback control scheme enhances plasma spraying of powdered material through reduction of process variability and providing better ability to engineer coating structure. The present inventors discovered that controlling centroid position of the spatial distribution along with other output parameters, such as particle temperature, particle velocity, and molten mass flux rate, vastly increases control over the sprayed coating structure, including vertical and horizontal cracks, voids, and porosity. It also allows improved control over graded layers or compositionally varying layers of material, reduces variations, including variation in coating thickness, and allows increasing deposition rate. Various measurement and system control schemes are provided.

  9. A 100 kW three-phase plasma torch for low LHV fuel valorisation and other applications

    E-Print Network [OSTI]

    operating with air, need costly maintenance and uses non consumable electrodes. At center PERSEE a new. In addition to its instantaneous response, security of use and low cost maintenance, Three-phase Arc Torch, the majority of thermal plasma torches are based on DC technology which suffers from reliability problems when

  10. A Glove Box Enclosed Gas-Tungsten Arc Welding System

    SciTech Connect (OSTI)

    Reevr, E, M; Robino, C.V.

    1999-07-01T23:59:59.000Z

    This report describes an inert atmosphere enclosed gas-tungsten arc welding system which has been assembled in support of the MC2730, MC2730A and MC 3500 Radioisotope Thermoelectric Generator (RTG) Enhanced Surveillance Program. One goal of this program is to fabricate welds with microstructures and impurity levels which are similar to production heat source welds previously produced at Los Alamos National Laboratory and the Mound Facility. These welds will subsequently be used for high temperature creep testing as part of the overall component lifetime assessment. In order to maximize the utility of the welding system, means for local control of the arc atmosphere have been incorporated and a wide range of welding environments can easily be evaluated. The gas-tungsten arc welding system used in the assembly is computer controlled, includes two-axis and rotary motion, and can be operated in either continuous or pulsed modes. The system can therefore be used for detailed research studies of welding impurity effects, development of prototype weld schedules, or to mimic a significant range of production-like welding conditions. Fixturing for fabrication of high temperature creep test samples have been designed and constructed, and weld schedules for grip-tab and test welds have been developed. The microstructure of these welds have been evaluated and are consistent with those used during RTG production.

  11. Self-shielding of a plasma-exposed surface during extreme transient heat loads

    SciTech Connect (OSTI)

    Zielinski, J. J.; Meiden, H. J. van der; Morgan, T. W.; Hoen, M. H. J. 't; De Temmerman, G., E-mail: g.c.detemmerman@differ.nl [FOM Institute DIFFER, Dutch Institute for Fundamental Energy Research, Association EURATOM-FOM, Trilateral Euregio Cluster, P.O. Box 1207, 3430 BE Nieuwegein (Netherlands); Schram, D. C. [Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)

    2014-03-24T23:59:59.000Z

    The power deposition on a tungsten surface exposed to combined pulsed/continuous high power plasma is studied. A study of the correlation between the plasma parameters and the power deposition on the surface demonstrates the effect of particle recycling in the strongly coupled regime. Upon increasing the input power to the plasma source, the energy density to the target first increases then decreases. We suggest that the sudden outgassing of hydrogen particles from the target and their subsequent ionization causes this. This back-flow of neutrals impedes the power transfer to the target, providing a shielding of the metal surface from the intense plasma flux.

  12. Plasma Physics

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May Jun Jul(Summary)morphinanInformation Desert Southwest RegionatSearch Welcome to theNews & Blog »Physics PhysicsWeekPlasma

  13. Uranium deposits of Brazil

    SciTech Connect (OSTI)

    NONE

    1991-09-01T23:59:59.000Z

    Brazil is a country of vast natural resources, including numerous uranium deposits. In support of the country`s nuclear power program, Brazil has developed the most active uranium industry in South America. Brazil has one operating reactor (Angra 1, a 626-MWe PWR), and two under construction. The country`s economic challenges have slowed the progress of its nuclear program. At present, the Pocos de Caldas district is the only active uranium production. In 1990, the Cercado open-pit mine produced approximately 45 metric tons (MT) U{sub 3}O{sub 8} (100 thousand pounds). Brazil`s state-owned uranium production and processing company, Uranio do Brasil, announced it has decided to begin shifting its production from the high-cost and nearly depleted deposits at Pocos de Caldas, to lower-cost reserves at Lagoa Real. Production at Lagoa Real is schedules to begin by 1993. In addition to these two districts, Brazil has many other known uranium deposits, and as a whole, it is estimated that Brazil has over 275,000 MT U{sub 3}O{sub 8} (600 million pounds U{sub 3}O{sub 8}) in reserves.

  14. Modeling of implantation and mixing damage during etching of SiO2 over Si in fluorocarbon plasmas

    E-Print Network [OSTI]

    Kushner, Mark

    Modeling of implantation and mixing damage during etching of SiO2 over Si in fluorocarbon plasmas- sions (CD).3 An example of this process is fluorocarbon plasma etching of trenches and vias in SiO2 and stopping on a crystalline Si layer. The fluorocarbon radicals produced in the plasma deposit a polymer

  15. Measurements of plasma bremsstrahlung and plasma energy density produced by electron cyclotron resonance ion source plasmas

    E-Print Network [OSTI]

    Noland, Jonathan David

    2011-01-01T23:59:59.000Z

    high temperature plasma diagnostics used to study high en-high temperature plasma diagnostic. Plasma bremsstrahlungand J Ärje. Plasma breakdown diagnostics with the biased

  16. Epitaxial growth of BaTiO3 thin films at 600 C by metalorganic chemical vapor deposition

    E-Print Network [OSTI]

    Wang, Zhong L.

    with an a-axis perpendicular to the substrate plane. Nanoscale energy dispersive x-ray spectrometry processes include deposition over large areas, high throughput, and uniform coverage of nonplanar shapes by a plasma-enhanced MOCVD pro- cess. It is not known if the added energy from the plasma generates structural

  17. Effective parameters in axial injection suspension plasma spray process of alumina-zirconia ceramics

    E-Print Network [OSTI]

    Medraj, Mamoun

    Effective parameters in axial injection suspension plasma spray process of alumina- zirconia phases using extra small particles as compared to conventional thermal spraying. Suspension spraying% yittria stabilized zirconia was deposited by axial injection SPS process. The effects of principal

  18. E-Print Network 3.0 - arc furnace dust Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Collection: Renewable Energy 2 The Effec' of Furnace Design and Operation on Air Pollution Summary: chemical constituents in furnace gases arc very malodorous, or toxic, when...

  19. E-Print Network 3.0 - arc furnace steel Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    TID electric arc furnaces for MSW ash are ... Source: Columbia University - Waste-to-Energy Research and Technology Council (WTERT) Collection: Renewable Energy Page: << < 1 2...

  20. E-Print Network 3.0 - arc welded aisi Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    pass arc welds... WELDING RESEARCH -s55WELDING JOURNAL ABSTRACT. Dissimilar metal weld (DMW) failures between carbon... along the weld interface and the formation of locally high...

  1. E-Print Network 3.0 - arc swedish section Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    arc swedish section Page: << < 1 2 3 4 5 > >> 1 Brita Bergman (born 303 1946) CURRICULUM VITAE 2011 Sign Language Section, Department of Linguistics Abridged version Summary:...

  2. ARCS FOUNDATION GLOBAL IMPACT AWARD Global Health, Public Good and Graduate Education

    E-Print Network [OSTI]

    Arnold, Jonathan

    ARCS FOUNDATION GLOBAL IMPACT AWARD Global Health, Public Good and Graduate Education Case Foundation Awards Luncheon in Atlanta on November 20, 2014. #12;Application Materials: 1) A letter

  3. E-Print Network 3.0 - arc discharge method Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Engineering ; Materials Science 22 Time displacement for a wall-stabilized electric arc in a transverse magnetic field. Summary: -Barrado 7). The simplest method of...

  4. E-Print Network 3.0 - arc lamp heal Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    particularly... sources and mechanical wafer transport; or electrical lamps, either incandescent or arc, with programmed... in lamp FIG. 1. Temperature sensor signal vs time for...

  5. E-Print Network 3.0 - arcs ii application Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Geosciences 2 FLORIDA ATLANTIC UNIVERSITY 2009-2010 TRANSFER STUDENT MANUAL COLLEGE OF ARCHITECTURE, URBAN AND PUBLIC AFFAIRS Summary: PREREQUISITE COURSES ARC x301...

  6. E-Print Network 3.0 - arc welded gas Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    was welded by gas tungsten arc welding (GTAW or TIG) technique using... .5%, and reduction ... Source: Zhou, Wei - School of Mechanical and Aerospace Engineering, Nanyang...

  7. E-Print Network 3.0 - arc hardfacing process Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    to produce an output... Inderscience Enterprises Ltd. Adaptive voltage control of gas tungsten arc welding Reginald Crawford,* George E... -mail: reginald.crawford@vanderbilt.edu...

  8. E-Print Network 3.0 - arc welding dynamic Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    a system IO board; arc sensor interface board for weld seam tracking... inverter power source renders possible ... Source: Ang Jr.,, Marcelo H. - Department of Mechanical...

  9. E-Print Network 3.0 - arc weld-surfacing process Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Program Summary: including arc processes, laser, electron beam, and friction stir welding. Surface modification of alloys... areas: Alloy Design, Production and Processing ...

  10. Local thermodynamic equilibrium in rapidly heated high energy density plasmas

    SciTech Connect (OSTI)

    Aslanyan, V.; Tallents, G. J. [York Plasma Institute, Department of Physics, University of York, Heslington, York YO10 5DD (United Kingdom)

    2014-06-15T23:59:59.000Z

    Emission spectra and the dynamics of high energy density plasmas created by optical and Free Electron Lasers (FELs) depend on the populations of atomic levels. Calculations of plasma emission and ionization may be simplified by assuming Local Thermodynamic Equilibrium (LTE), where populations are given by the Saha-Boltzmann equation. LTE can be achieved at high densities when collisional processes are much more significant than radiative processes, but may not be valid if plasma conditions change rapidly. A collisional-radiative model has been used to calculate the times taken by carbon and iron plasmas to reach LTE at varying densities and heating rates. The effect of different energy deposition methods, as well as Ionization Potential Depression are explored. This work shows regimes in rapidly changing plasmas, such as those created by optical lasers and FELs, where the use of LTE is justified, because timescales for plasma changes are significantly longer than the times needed to achieve an LTE ionization balance.

  11. IOP PUBLISHING PLASMA PHYSICS AND CONTROLLED FUSION Plasma Phys. Control. Fusion 51 (2009) 014005 (9pp) doi:10.1088/0741-3335/51/1/014005

    E-Print Network [OSTI]

    Strathclyde, University of

    IOP PUBLISHING PLASMA PHYSICS AND CONTROLLED FUSION Plasma Phys. Control. Fusion 51 (2009) 014005 to inertial fusion [1] concerns the propagation and energy deposition of a fast electron beam in strongly change produced in the target material by the shock wave. While the initially cold solid target

  12. Color-based tracking of plasma dust particles

    SciTech Connect (OSTI)

    Villamayor, Michelle Marie S., E-mail: mvillamayor@nip.upd.edu.ph; Soriano, Maricor N.; Ramos, Henry J. [National Institute of Physics, University of the Philippines, Diliman, Quezon City 1101 (Philippines)] [National Institute of Physics, University of the Philippines, Diliman, Quezon City 1101 (Philippines); Kato, Shuichi; Wada, Motoi [Graduate School of Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321 (Japan)] [Graduate School of Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321 (Japan)

    2014-02-15T23:59:59.000Z

    Color-based tracking to observe agglomeration of deposited particles inside a compact planar magnetron during plasma discharge was done by creating high dynamic range (HDR) images of photos captured by a Pentax K10D digital camera. Carbon erosion and redeposition was also monitored using the technique. The HDR images were subjected to a chromaticity-based constraint discoloration inside the plasma chamber indicating film formation or carbon redeposition. Results show that dust deposition occurs first near the evacuation pumps due to the pressure gradient and then accumulates at the positively charged walls of the chamber. This method can be applied to monitor dust formation during dusty plasma experiments without major modification of plasma devices, useful especially for large fusion reactors.

  13. IMPROVED pc-Si p-LAYER AND a-Si i-LAYER MATERIALS USING VHF PLASMA X. Deng, S. J. Jones, T. Liu, M. Izu and S. R. Ovshinsky

    E-Print Network [OSTI]

    Deng, Xunming

    conventional RF (13.56 MHz) plasma enhanced chemical vapor deposition (PECVD) process, the window in deposition by improving their p-layers, and 2) establishrng a wider process window for the deposition of high quality p of these studies were focused on the thin film properties of the VHF deposited materials. Few studies were carried

  14. ARCS - Access Rate Control System - Energy Innovation Portal

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May JunDatastreamsmmcrcalgovInstrumentsrucLasDelivered‰PNGExperience4AJ01) (See95TI07)Operations2AP-XPSAPS50 -Issue 60ARCS - Access Rate

  15. ArcSafe® with Pulsed Arrested Spark Discharge

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May JunDatastreamsmmcrcalgovInstrumentsruc DocumentationP-Series to someone by E-mailRadioimmunotherapy EA15PC3041-3-0withArcSafe® with

  16. Deposition and Microfabrication | EMSL

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    AFDC Printable Version Share this resource Send a link to EERE: Alternative Fuels Data Center Home Page to someone by E-mail Share EERE: Alternative Fuels Data Center Home Page on Facebook Tweet about EERE: Alternative Fuels Data Center Home Page on Twitter Bookmark EERE:1 First Use of Energy for All Purposes (Fuel and Nonfuel),Feet) Year Jan Feb Mar Apr May Jun Jul(Summary)morphinanInformation Desert Southwest Region service area. The Desert Southwest RegionInsideDeposition and

  17. Diamond film growth argon-carbon plasmas

    DOE Patents [OSTI]

    Gruen, D.M.; Krauss, A.R.; Liu, S.Z.; Pan, X.Z.; Zuiker, C.D.

    1998-12-15T23:59:59.000Z

    A method and system are disclosed for manufacturing diamond film. The method involves forming a carbonaceous vapor, providing a gas stream of argon, hydrogen and hydrocarbon and combining the gas with the carbonaceous vapor, passing the combined carbonaceous vapor and gas carrier stream into a chamber, forming a plasma in the chamber causing fragmentation of the carbonaceous and deposition of a diamond film on a substrate. 29 figs.

  18. Boundary Plasma Issues in Burning Plasma Science

    E-Print Network [OSTI]

    Pitcher, C. S.

    of operation ) ···· we know a lot more now than during the BPX design! #12;(1) Wide Dispersal of Power plasma/neutral densities · criterion for high recycling and cold divertor, Tt ~ 5 eV (a prerequisite high energy threshold) · interaction at walls of tenuous plasma: 1. how does plasma reach wall? (rapid

  19. Boundary Plasma Issues in Burning Plasma Science

    E-Print Network [OSTI]

    of operation ) · we know a lot more now than during the BPX design! #12;(1) Wide Dispersal of Power plasma/neutral densities · criterion for high recycling and cold divertor, Tt ~ 5 eV (a prerequisite) · interaction at walls of tenuous plasma: 1.how does plasma reach wall? (rapid transport?) 2.can dominate core

  20. Tunable molten oxide pool assisted plasma-melter vitrification systems

    DOE Patents [OSTI]

    Titus, Charles H. (Newtown Square, PA); Cohn, Daniel R. (Chestnut Hill, MA); Surma, Jeffrey E. (Kennewick, WA)

    1998-01-01T23:59:59.000Z

    The present invention provides tunable waste conversion systems and apparatus which have the advantage of highly robust operation and which provide complete or substantially complete conversion of a wide range of waste streams into useful gas and a stable, nonleachable solid product at a single location with greatly reduced air pollution to meet air quality standards. The systems provide the capability for highly efficient conversion of waste into high quality combustible gas and for high efficiency conversion of the gas into electricity by utilizing a high efficiency gas turbine or an internal combustion engine. The solid product can be suitable for various commercial applications. Alternatively, the solid product stream, which is a safe, stable material, may be disposed of without special considerations as hazardous material. In the preferred embodiment, the arc plasma furnace and joule heated melter are formed as a fully integrated unit with a common melt pool having circuit arrangements for the simultaneous independently controllable operation of both the arc plasma and the joule heated portions of the unit without interference with one another. The preferred configuration of this embodiment of the invention utilizes two arc plasma electrodes with an elongated chamber for the molten pool such that the molten pool is capable of providing conducting paths between electrodes. The apparatus may additionally be employed with reduced use or without further use of the gases generated by the conversion process. The apparatus may be employed as a net energy or net electricity producing unit where use of an auxiliary fuel provides the required level of electricity production. Methods and apparatus for converting metals, non-glass forming waste streams and low-ash producing inorganics into a useful gas are also provided. The methods and apparatus for such conversion include the use of a molten oxide pool having predetermined electrical, thermal and physical characteristics capable of maintaining optimal joule heating and glass forming properties during the conversion process.

  1. Thermal Treatment of Solid Wastes Using the Electric Arc Furnace

    SciTech Connect (OSTI)

    O'Connor, W.K.; Turner, P.C.

    1999-09-01T23:59:59.000Z

    A thermal waste treatment facility has been developed at the Albany Research Center (ARC) over the past seven years to process a wide range of heterogeneous mixed wastes, on a scale of 227 to 907 kg/h (500 to 2,000 lb/h). The current system includes a continuous feed system, a 3-phase AC, 0.8 MW graphite electrode arc furnace, and a dedicated air pollution control system (APCS) which includes a close-coupled thermal oxidizer, spray cooler, baghouse, and wet scrubber. The versatility of the complete system has been demonstrated during 5 continuous melting campaigns, ranging from 11 to 25 mt (12 to 28 st) of treated wastes per campaign, which were conducted on waste materials such as (a) municipal incinerator ash, (b) simulated low-level radioactive, high combustible-bearing mixed wastes, (c) simulated low-level radioactive liquid tank wastes, (d) heavy metal contaminated soils, and (e) organic-contaminated dredging spoils. In all cases, the glass or slag products readily passed the U.S. Environmental Protection Agency (EPA) Toxicity Characteristic Leachability Program (TCLP) test. Additional studies are currently under way on electric utility wastes, steel and aluminum industry wastes, as well as zinc smelter residues. Thermal treatment of these solid waste streams is intended to produce a metallic product along with nonhazardous glass or slag products.

  2. Advanced Resin Cleaning System (ARCS) at Grand Gulf Nuclear Station

    SciTech Connect (OSTI)

    Asay, R.H.; Earls, J.E.; Naughton, M.D. [Centec 21, Inc., Santa Clara, CA (United States)

    1996-10-01T23:59:59.000Z

    Steam generation system in-core components can undergo serious material degradation by a variety of corrosion-related phenomena. These phenomena are largely controlled by boiler water (i.e. reactor water) chemistry which is strongly impacted by the performance of the condensate system mixed bed ion exchange units. In Boiling Water Reactors (BWR), the mixed bed ion exchange units not only provide protection from ionic contaminants, but also remove insoluble corrosion products by filtration/adsorption. These insoluble corrosion products removed by the ion exchange units must then be periodically cleaned from the resin bed by some process external to the BWR primary water loop. A unique resin cleaning process called the {open_quotes}Advanced Resin Cleaning System{close_quotes} (ARCS) was developed in the late 1980`s by members of CENTEC-XXI, located in Santa Clara, CA. This system, which has been successfully operated for several years at a Pressurized Water Reactor is highly efficient for removal of both insoluble corrosion products and anion/cation resin fines, and generates significantly less waste water than other cleaning methods. The ARCS was considered the most attractive method for meeting the demanding and costly resin cleaning needs of a BWR. A {open_quotes}Tailored Collaboration{close_quotes} project was initiated between EPRI, Entergy Operations (Grand Gulf Station), and CENTEC-XXI to demonstrate the {open_quotes}Advanced Resin Cleaning System{close_quotes} in a BWR.

  3. Waste form development for a DC arc furnace

    SciTech Connect (OSTI)

    Feng, X.; Bloomer, P.E.; Chantaraprachoom, N.; Gong, M.; Lamar, D.A.

    1996-09-01T23:59:59.000Z

    A laboratory crucible study was conducted to develop waste forms to treat nonradioactive simulated {sup 238}Pu heterogeneous debris waste from Savannah River, metal waste from the Idaho National Engineering Laboratory (INEL), and nominal waste also from INEL using DC arc melting. The preliminary results showed that the different waste form compositions had vastly different responses for each processing effect. The reducing condition of DC arc melting had no significant effects on the durability of some waste forms while it decreased the waste form durability from 300 to 700% for other waste forms, which resulted in the failure of some TCLP tests. The right formulations of waste can benefit from devitrification and showed an increase in durability by 40%. Some formulations showed no devitrification effects while others decreased durability by 200%. Increased waste loading also affected waste form behavior, decreasing durability for one waste, increasing durability by 240% for another, and showing no effect for the third waste. All of these responses to the processing and composition variations were dictated by the fundamental glass chemistry and can be adjusted to achieve maximal waste loading, acceptable durability, and desired processing characteristics if each waste formulation is designed for the result according to the glass chemistry.

  4. Volume reduction and vitrification of nuclear waste with thermal plasma

    SciTech Connect (OSTI)

    Hoffelner, W. [Moser-Glaser and Co., Muttenz (Switzerland); Chrubasik, A. [NUKEM GmbH, Alzenau (Germany); Eschenbach, R.C. [RETECH Inc., Ukiah, CA (United States)

    1993-12-31T23:59:59.000Z

    A process for efficient and safe destruction of organics and vitrification of low/medium level radioactive waste is presented. A transferred arc plasma torch is employed as the heat source. The process handles several types of feed: combustibles, inorganic materials and metals. A non-leaching glassy solid which can be stored without further treatment is obtained as the final product. High volume-reduction factors can be achieved with this process. A wet gas cleaning system leads to extremely clean off-gas.

  5. Communication through plasma sheaths

    SciTech Connect (OSTI)

    Korotkevich, A. O.; Newell, A. C.; Zakharov, V. E. [Landau Institute for Theoretical Physics RAS, 2, Kosygin Str., Moscow, 119334 (Russian Federation); Department of Mathematics, University of Arizona, 617 N. Santa Rita Ave., Tucson, Arizona 85721 (United States); Department of Mathematics, University of Arizona, 617 N. Santa Rita Ave., Tucson, Arizona 85721 (United States); Lebedev Physical Institute RAS, 53, Leninsky Prosp., GSP-1 Moscow, 119991 (Russian Federation); Landau Institute for Theoretical Physics RAS, 2, Kosygin Str., Moscow, 119334 (Russian Federation) and Waves and Solitons LLC, 918 W. Windsong Dr., Phoenix, Arizona 85045 (United States)

    2007-10-15T23:59:59.000Z

    We wish to transmit messages to and from a hypersonic vehicle around which a plasma sheath has formed. For long distance transmission, the signal carrying these messages must be necessarily low frequency, typically 2 GHz, to which the plasma sheath is opaque. The idea is to use the plasma properties to make the plasma sheath appear transparent.

  6. Electron Cyclotron Heating in RFP plasmas

    SciTech Connect (OSTI)

    Bilato, R.; Poli, E. [MPI fuer Plasmaphysik-Euratom Association Boltzmannstr. 2, D-85748 Garching (Germany); Volpe, F. [Department of Engineering Physics, University of Wisconsin, Madison, WI (United States); Koehn, A. [Institut fuer Plasmaforschung, Universitaet Stuttgart-Stuttgart (Germany); Cavazzana, R.; Paccagnella, R. [Consorzio RFX-Associazione EURATOM-ENEA sulla fusione-Padova (Italy); Farina, D. [IFP-CNR, EURATOM-ENEA-CNR Association-Milano (Italy)

    2009-11-26T23:59:59.000Z

    Reversed field pinches (RFP) plasmas are typically overdense ({omega}{sub pe}>{omega}{sub ce}) and thus not suitable for conventional electron cyclotron (EC) heating and current drive. In recent high plasma current discharges (I{sub p}>1.5 MA), however, the RFX-mod device was operated in underdense conditions ({omega}{sub pe}<{omega}{sub ce}) for the first time in an RFP. Thus, it is now possible to envisage heating the RFP plasma core by conventional EC at the 2nd harmonic, in the ordinary or extraordinary mode. We present a preliminary study of EC-heating feasibility in RFX-mod with the use of beam-tracing and full-wave codes. Although not competitive - as a heating system - with multi-MW Ohmic heating in an RFP, EC might be useful for perturbative transport studies, even at moderate power (hundreds of kW), and, more generally, for applications requiring localized power deposition.

  7. Assimilation of Ultramafic Rock in Subduction-Related Magmatic Arcs Author(s): Peter B. Kelemen

    E-Print Network [OSTI]

    Assimilation of Ultramafic Rock in Subduction-Related Magmatic Arcs Author(s): Peter B. Kelemen Source: The Journal of Geology, Vol. 94, No. 6 (Nov., 1986), pp. 829-843 Published by: The University. http://www.jstor.org #12;ASSIMILATION OF ULTRAMAFIC ROCK IN SUBDUCTION-RELATED MAGMATIC ARCS1 PETER B

  8. ~DELING OF METAL TRANSFKR IN GAS METAL ARC WELDING Yong -Seog Kim and T. W. Eagar

    E-Print Network [OSTI]

    Eagar, Thomas W.

    ) ) ) ~DELING OF METAL TRANSFKR IN GAS METAL ARC WELDING Yong -Seog Kim and T. W. Eagar theory and the pinch i ns t a bility theor y as a function of welding cur rent . Experimental of the gas metal arc process in the late 1940s, it has become one of the most important welding processes

  9. Oxygen and Nitroaen Contamination During Submerged Arc Wel ding of Titanium

    E-Print Network [OSTI]

    Eagar, Thomas W.

    ) ) ) ··- -~ Oxygen and Nitroaen Contamination During Submerged Arc Wel ding of Titanium T· \\v· Eagar* The oxygen content of ti tanium submerged arc wel ~ metal is primaril y derendent uron the purity of the fluo1~ ide fluxes, but it is shown here that the oxygen content of the weld metal may be affected

  10. Memory-influencing intra-basolateral amygdala drug infusions modulate expression of Arc

    E-Print Network [OSTI]

    O'Toole, Alice J.

    Memory-influencing intra-basolateral amygdala drug infusions modulate expression of Arc protein processes. Infusions of the -adrenoreceptor agonist, clen- buterol, into the BLA immediately after training increased Arc protein levels in the dorsal hippocampus. Additionally, posttraining intra-BLA infusions

  11. Langmuir probe measurements in a time-fluctuating-highly ionized non-equilibrium cutting arc: Analysis of the electron retarding part of the time-averaged current-voltage characteristic of the probe

    SciTech Connect (OSTI)

    Prevosto, L.; Mancinelli, B. [Grupo de Descargas Eléctricas, Departamento Ing. Electromecánica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto (2600) Santa Fe (Argentina)] [Grupo de Descargas Eléctricas, Departamento Ing. Electromecánica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto (2600) Santa Fe (Argentina); Kelly, H. [Grupo de Descargas Eléctricas, Departamento Ing. Electromecánica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto (2600) Santa Fe (Argentina) [Grupo de Descargas Eléctricas, Departamento Ing. Electromecánica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto (2600) Santa Fe (Argentina); Instituto de Física del Plasma (CONICET), Departamento de Física, Facultad de Ciencias Exactas y Naturales (UBA) Ciudad Universitaria Pab. I, 1428 Buenos Aires (Argentina)

    2013-12-15T23:59:59.000Z

    This work describes the application of Langmuir probe diagnostics to the measurement of the electron temperature in a time-fluctuating-highly ionized, non-equilibrium cutting arc. The electron retarding part of the time-averaged current-voltage characteristic of the probe was analysed, assuming that the standard exponential expression describing the electron current to the probe in collision-free plasmas can be applied under the investigated conditions. A procedure is described which allows the determination of the errors introduced in time-averaged probe data due to small-amplitude plasma fluctuations. It was found that the experimental points can be gathered into two well defined groups allowing defining two quite different averaged electron temperature values. In the low-current region the averaged characteristic was not significantly disturbed by the fluctuations and can reliably be used to obtain the actual value of the averaged electron temperature. In particular, an averaged electron temperature of 0.98 ± 0.07 eV (= 11400 ± 800 K) was found for the central core of the arc (30 A) at 3.5 mm downstream from the nozzle exit. This average included not only a time-average over the time fluctuations but also a spatial-average along the probe collecting length. The fitting of the high-current region of the characteristic using such electron temperature value together with the corrections given by the fluctuation analysis showed a relevant departure of local thermal equilibrium in the arc core.

  12. Plasma sweeper. [Patents

    DOE Patents [OSTI]

    Motley, R.W.; Glanz, J.

    1982-10-25T23:59:59.000Z

    A device is described for coupling RF power (a plasma sweeper) from RF power introducing means to a plasma having a magnetic field associated therewith comprises at least one electrode positioned near the plasma and near the RF power introducing means. Means are described for generating a static electric field at the electrode directed into the plasma and having a component substantially perpendicular to the plasma magnetic field such that a non-zero vector cross-product of the electric and magnetic fields exerts a force on the plasma causing the plasma to drift.

  13. Princeton University Plasma Physics Laboratory, Princeton, New Jersey. Annual report, October 1, 1990--September 30, 1991

    SciTech Connect (OSTI)

    Not Available

    1991-12-31T23:59:59.000Z

    This report discusses the following topics: Principal parameters of experimental devices; Tokamak Fusion Test Reactor; Burning Plasma Experiment; Princeton Beta Experiment-Modification; Current Drive Experiment-Upgrade; International Thermonuclear Experimental Reactor; International Collaboration; X-Ray Laser Studies; Hyperthermal Atomic Beam Source; Pure Electron Plasma Experiments; Plasma Processing: Deposition and Etching of Thin Films; Theoretical Studies; Tokamak Modeling; Engineering Department; Environment, Safety, and Health and Quality Assurance; Technology Transfer; Office of Human Resources and Administration; PPPL Patent Invention Disclosures; Office of Resource Management; Graduate Education: Plasma Physics; Graduate Education: Program in Plasma Science and Technology; and Science Education Program.

  14. 2780 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 39, NO. 11, NOVEMBER 2011 Jetlike Emission From Colliding

    E-Print Network [OSTI]

    Harilal, S. S.

    attractive applications in the field of X-ray lasers, pulsed-laser deposition (PLD), extreme ultraviolet Colliding Laser-Produced Plasmas Sivanandan S. Harilal, Mathew P. Polek, and Ahmed Hassanein, Member, IEEE Abstract--We report a large jetlike collimated emission feature from colliding laser-produced plasmas (LPPs

  15. High Performance Plasma Sputtered Fuel Cell Electrodes with Ultra Low catalytic metal Loadings

    E-Print Network [OSTI]

    Paris-Sud XI, Université de

    to be reached between 2010 and 2015 are clear: the catalyst of a fuel cell can cost no more than 4 per kilowatt1 High Performance Plasma Sputtered Fuel Cell Electrodes with Ultra Low catalytic metal Loadings C in plasma fuel cell deposition devices. Pt loadings lower than 0.01 mg cm-2 have been realized. The Pt

  16. Effect of nonsinusoidal bias waveforms on ion energy distributions and fluorocarbon plasma etch selectivity

    E-Print Network [OSTI]

    Kushner, Mark

    Effect of nonsinusoidal bias waveforms on ion energy distributions and fluorocarbon plasma etch etching Si and SiO2 in fluorocarbon plasmas could be controlled by adjusting the width and energy etch rates.9 In fluorocarbon gas mixtures, the selectivity of SiO2 over Si is based on the deposition

  17. ARC Meeting: 12/9/2012 Present: Pushpa, Ed, Malvika, Meng Shuen, Julia, Matt Voss, Sandhya, Connor, VLS, Adam,

    E-Print Network [OSTI]

    Low, Steven H.

    (academic vs. research vs. other electives)? Connor: Want to find out across major Pushpa: ARC would like

  18. Formation of Cobalt Silicide Films by Ion Beam Deposition

    SciTech Connect (OSTI)

    Zhang, Yanwen; McCready, David E.; Wang, Chong M.; Young, James S.; Mckinley, Mathew I.; Whitlow, Harry J.; Razpet, Alenka; Possnert, Göran; Zhang, Tonghe; Wu, Yuguang

    2006-01-01T23:59:59.000Z

    Thin films of cobalt silicide are widely used as metallization in very large-scale integrated electronic circuits. In this study, Co ions were deposited on Si (111) wafers by a high beam current filter metal vacuum arc deposition (FMEVAD) system. Surface silicide films were formed after annealing from 500 to 700 C for 30 minutes. Cobalt depth profiles and contaminations were determined using Rutherford backscattering spectrometry (RBS) and time-of-flight energy elastic recoil detection analysis (ToF-E ERDA). The polycrystalline cobalt silicide phases formed were characterized by grazing-incidence x-ray diffraction (GIXRD). The surface topography development and interfaces have been investigated by transmission electron microscopy (TEM) and scanning electron microscopy (SEM). The results show that a thin CoSi2 surface layer with both a smooth surface topography and sharp interface can be achieved by annealing at 700 C. The CoSi phase and O contamination were observed in the samples that were annealed at lower temperatures.

  19. METAL TRANSFER CONTROL IN GAS METAL ARC WELDING L.A. Jones, T.W. Eagar, J.H. Lang

    E-Print Network [OSTI]

    Eagar, Thomas W.

    METAL TRANSFER CONTROL IN GAS METAL ARC WELDING L.A. Jones, T.W. Eagar, J.H. Lang Massachusetts Institute of Technology Cambridge, MA 02139 USA Abstract Power input to the arc in gas metal arc welding to decouple these processes. Methods to achieve this decoupling are discussed. Pulsed-power welding is widely

  20. A comparison of the marginal adaptation of cathode-arc vapor-deposited titanium and cast base metal copings.

    E-Print Network [OSTI]

    Wu, Jean C; Lai, Li-Chung; Sheets, Cherilyn G; Earthman, James; Newcomb, Robert

    2011-01-01T23:59:59.000Z

    improved dental stone and epoxy resin die materials. Part 1:Dimensional accuracy of an epoxy resin die material usingby the accuracy of the epoxy resin die ma- terial. 26,27

  1. Variable temperature semiconductor film deposition

    DOE Patents [OSTI]

    Li, X.; Sheldon, P.

    1998-01-27T23:59:59.000Z

    A method of depositing a semiconductor material on a substrate is disclosed. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  2. Tritium deposition patterns in TFTR

    E-Print Network [OSTI]

    Princeton Plasma Physics Laboratory

    Tritium deposition patterns in TFTR Presented by C. H. Skinner with key contributions from Charles, JAERI #12;· TFTR was a limiter machine - no divertor. · Operated with tritium Nov `93 - April `97. · NetV Limiter Temperature @ 28 MW NBI Low density, high temperature edge #12;Tritium deposition patterns in TFTR

  3. Processing electric arc furnace dust into saleable chemical products

    SciTech Connect (OSTI)

    NONE

    1998-04-01T23:59:59.000Z

    The modern steel industry uses electric arc furnace (EAF) technology to manufacture steel. A major drawback of this technology is the production of EAF dust, which is listed by the U.S. Environmental Protection Agency as a hazardous waste under the Resource Conservation and Recovery Act. The annual disposal of approximately 0.65 million tons of EAF dust in the United States and Canada is an expensive, unresolved problem for the steel industry. EAF dust byproducts are generated during the manufacturing process by a variety of mechanisms. The dust consists of various metals (e.g., zinc, lead, cadmium) that occur as vapors at 1,600{degrees}C (EAF hearth temperature); these vapors are condensed and collected in a baghouse. The production of one ton of steel will generate approximately 25 pounds of EAF dust as a byproduct, which is currently disposed of in landfills.

  4. Gas-tungsten arc welding of aluminum alloys

    DOE Patents [OSTI]

    Frye, Lowell D. (Kingston, TN)

    1984-01-01T23:59:59.000Z

    A gas-tungsten arc welding method for joining together structures formed of aluminum alloy with these structures disposed contiguously to a heat-damagable substrate of a metal dissimilar to the aluminum alloy. The method of the present invention is practiced by diamond machining the fay surfaces of the aluminum alloy structures to provide a mirror finish thereon having a surface roughness in the order of about one microinch. The fay surfaces are aligned and heated sufficiently by the tungsten electrode to fuse the aluminum alloy contiguous to the fay surfaces to effect the weld joint. The heat input used to provide an oxide-free weld is significantly less than that required if the fay surfaces were prepared by using conventional chemical and mechanical practices.

  5. Gas-tungsten arc welding of aluminum alloys

    DOE Patents [OSTI]

    Frye, L.D.

    1982-03-25T23:59:59.000Z

    The present invention is directed to a gas-tungsten arc welding method for joining together structures formed of aluminum alloy with these structures disposed contiguously to a heat-damagable substrate of a metal dissimilar to the aluminum alloy. The method of the present invention is practiced by diamond machining the fay surfaces of the aluminum alloy structures to profice a mirror finish thereon having a surface roughness in the order of about one microinch. The fay surface are aligned and heated sufficiently by the tungsten electrode to fuse the aluminum alloy continguous to the fay surfaces to effect the weld joint. The heat input used to provide an oxide-free weld is significantly less than that required if the fay surfaces were prepared by using conventional chemical and mechanical practices.

  6. Static Heat Loads in the LHC Arc Cryostats: Final Assessment

    E-Print Network [OSTI]

    Parma, V

    2010-01-01T23:59:59.000Z

    This note presents the final assessment of the static heat loads in the LHC arc cryostats, using different experimental methods during the first commissioning period in 2007. This assessment further develops and completes previous estimates made during the commissioning of sector 7_8 [1]. The estimate of the helium inventory, a prerequisite for the heat load calculation, is also presented. Heat loads to the cold mass are evaluated from the internal energy balance during natural as well as powered warm-ups of the helium baths in different subsector. The helium inventory is calculated from the internal energy balance during powered warm-ups and matched with previous assessments. Furthermore, heat loads to the thermal shield are estimated from the non-isothermal cooling of the supercritical helium in line E. The comparison of measured heat loads with previous estimates and with budgeted values is then presented, while their correlation with some important parameters like insulation vacuum pressure and some heat ...

  7. Theoretical & Computational Plasma Physicist | Princeton Plasma...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    Research Requisition Number: 1400777 PPPLTheory Department has an opening at the rank of Research Physicist in theoretical and computational plasma physics in the area of...

  8. Silicon solar cells made by a self-aligned, selective-emitter, plasma-etchback process

    DOE Patents [OSTI]

    Ruby, D.S.; Schubert, W.K.; Gee, J.M.

    1999-02-16T23:59:59.000Z

    A potentially low-cost process for forming and passivating a selective emitter. The process uses a plasma etch of the heavily doped emitter to improve its performance. The grids of the solar cell are used to mask the plasma etch so that only the emitter in the region between the grids is etched, while the region beneath the grids remains heavily doped for low contact resistance. This process is potentially low-cost because it requires no alignment. After the emitter etch, a silicon nitride layer is deposited by plasma-enhanced, chemical vapor deposition, and the solar cell is annealed in a forming gas. 5 figs.

  9. Silicon solar cells made by a self-aligned, selective-emitter, plasma-etchback process

    DOE Patents [OSTI]

    Ruby, Douglas S. (Albuquerque, NM); Schubert, William K. (Albuquerque, NM); Gee, James M. (Albuquerque, NM)

    1999-01-01T23:59:59.000Z

    A potentially low-cost process for forming and passivating a selective emitter. The process uses a plasma etch of the heavily doped emitter to improve its performance. The grids of the solar cell are used to mask the plasma etch so that only the emitter in the region between the grids is etched, while the region beneath the grids remains heavily doped for low contact resistance. This process is potentially low-cost because it requires no alignment. After the emitter etch, a silicon nitride layer is deposited by plasma-enhanced, chemical vapor deposition, and the solar cell is annealed in a forming gas.

  10. TULSA UNIVERSITY PARAFFIN DEPOSITION PROJECTS

    SciTech Connect (OSTI)

    Michael Volk; Cem Sarica

    2003-10-01T23:59:59.000Z

    As oil and gas production moves to deeper and colder water, subsea multiphase production systems become critical for economic feasibility. It will also become increasingly imperative to adequately identify the conditions for paraffin precipitation and predict paraffin deposition rates to optimize the design and operation of these multiphase production systems. Although several oil companies have paraffin deposition predictive capabilities for single-phase oil flow, these predictive capabilities are not suitable for the multiphase flow conditions encountered in most flowlines and wellbores. For deepwater applications in the Gulf of Mexico, it is likely that multiphase production streams consisting of crude oil, produced water and gas will be transported in a single multiphase pipeline to minimize capital cost and complexity at the mudline. Existing single-phase (crude oil) paraffin deposition predictive tools are clearly inadequate to accurately design these pipelines because they do not account for the second and third phases, namely, produced water and gas. The objective of this program is to utilize the current test facilities at The University of Tulsa, as well as member company expertise, to accomplish the following: enhance our understanding of paraffin deposition in single and two-phase (gas-oil) flows; conduct focused experiments to better understand various aspects of deposition physics; and, utilize knowledge gained from experimental modeling studies to enhance the computer programs developed in the previous JIP for predicting paraffin deposition in single and two-phase flow environments. These refined computer models will then be tested against field data from member company pipelines. The following deliverables are scheduled during the first three projects of the program: (1) Single-Phase Studies, with three different black oils, which will yield an enhanced computer code for predicting paraffin deposition in deepwater and surface pipelines. (2) Two-Phase Studies, with a focus on heat transfer and paraffin deposition at various pipe inclinations, which will be used to enhance the paraffin deposition code for gas-liquid flow in pipes. (3) Deposition Physics and Water Impact Studies, which will address the aging process, improve our ability to characterize paraffin deposits and enhance our understanding of the role water plays in paraffin deposition in deepwater pipelines. As in the previous two studies, knowledge gained in this suite of studies will be integrated into a state-of-the-art three-phase paraffin deposition computer program.

  11. Creating dynamic equivalent PV circuit models with impedance spectroscopy for arc-fault modeling.

    SciTech Connect (OSTI)

    Johnson, Jay Dean; Kuszmaul, Scott S.; Strauch, Jason E.; Schoenwald, David Alan

    2011-06-01T23:59:59.000Z

    Article 690.11 in the 2011 National Electrical Code{reg_sign} (NEC{reg_sign}) requires new photovoltaic (PV) systems on or penetrating a building to include a listed arc fault protection device. Currently there is little experimental or empirical research into the behavior of the arcing frequencies through PV components despite the potential for modules and other PV components to filter or attenuate arcing signatures that could render the arc detector ineffective. To model AC arcing signal propagation along PV strings, the well-studied DC diode models were found to inadequately capture the behavior of high frequency arcing signals. Instead dynamic equivalent circuit models of PV modules were required to describe the impedance for alternating currents in modules. The nonlinearities present in PV cells resulting from irradiance, temperature, frequency, and bias voltage variations make modeling these systems challenging. Linearized dynamic equivalent circuits were created for multiple PV module manufacturers and module technologies. The equivalent resistances and capacitances for the modules were determined using impedance spectroscopy with no bias voltage and no irradiance. The equivalent circuit model was employed to evaluate modules having irradiance conditions that could not be measured directly with the instrumentation. Although there was a wide range of circuit component values, the complex impedance model does not predict filtering of arc fault frequencies in PV strings for any irradiance level. Experimental results with no irradiance agree with the model and show nearly no attenuation for 1 Hz to 100 kHz input frequencies.

  12. Ris-R-1140(EN) Deposition of ITO and AZO thin

    E-Print Network [OSTI]

    seen through vacuum window during film deposition. The plasma is the elongated bright area in the blue atmospheres 51 5.1 Indium tin oxide 51 5.1.1 Crystal structure 51 5.1.2 Band structure 52 5.1.3 Conductivity

  13. Arc Detection and Interlock Module for the PEP II Low Level RF System

    SciTech Connect (OSTI)

    Tighe, R.; /SLAC

    2011-08-31T23:59:59.000Z

    A new arc detection and interlock generating module for the SLAC PEP-II low-level RF VXI-based system has been developed. The system is required to turn off the RF drive and high voltage power supply in the event of arcing in the cavity windows, klystron window, or circulator. Infrared photodiodes receive arc signals through radiation resistant optical fibers. Gain and bandwidth are selectable for each channel to allow tailoring response. The module also responds to interlock requests from other modules in the VXI system and communicates with the programmable logic controller (PLC) responsible for much of the low-level RF system's interlock functionality.

  14. Boundary Plasma Issues in Burning Plasma Science

    E-Print Network [OSTI]

    Pitcher, C. S.

    during the BPX design! #12;(1) Wide Dispersal of Power/(cont) ···· high recycling or detached regimes for high recycling and cold divertor, Tt ~ 5 eV (a prerequisite for detachment), L = connection length, nu high energy threshold) · interaction at walls of tenuous plasma: 1. how does plasma reach wall? (rapid

  15. Sol-Gel Deposited Electrochromic Coatings

    E-Print Network [OSTI]

    Ozer, N.

    2010-01-01T23:59:59.000Z

    R A T O R Y Sol-Gel Deposited Electrochromic Coatings NilgunUC-1600 Sol-Gel Deposited Electrochromic Coatings NilgunPaper Sol-gel Deposited Electrochromic Coatings Nilgun Ozer

  16. Particle deposition in ventilation ducts

    SciTech Connect (OSTI)

    Sippola, Mark R.

    2002-09-01T23:59:59.000Z

    Exposure to airborne particles is detrimental to human health and indoor exposures dominate total exposures for most people. The accidental or intentional release of aerosolized chemical and biological agents within or near a building can lead to exposures of building occupants to hazardous agents and costly building remediation. Particle deposition in heating, ventilation and air-conditioning (HVAC) systems may significantly influence exposures to particles indoors, diminish HVAC performance and lead to secondary pollutant release within buildings. This dissertation advances the understanding of particle behavior in HVAC systems and the fates of indoor particles by means of experiments and modeling. Laboratory experiments were conducted to quantify particle deposition rates in horizontal ventilation ducts using real HVAC materials. Particle deposition experiments were conducted in steel and internally insulated ducts at air speeds typically found in ventilation ducts, 2-9 m/s. Behaviors of monodisperse particles with diameters in the size range 1-16 {micro}m were investigated. Deposition rates were measured in straight ducts with a fully developed turbulent flow profile, straight ducts with a developing turbulent flow profile, in duct bends and at S-connector pieces located at duct junctions. In straight ducts with fully developed turbulence, experiments showed deposition rates to be highest at duct floors, intermediate at duct walls, and lowest at duct ceilings. Deposition rates to a given surface increased with an increase in particle size or air speed. Deposition was much higher in internally insulated ducts than in uninsulated steel ducts. In most cases, deposition in straight ducts with developing turbulence, in duct bends and at S-connectors at duct junctions was higher than in straight ducts with fully developed turbulence. Measured deposition rates were generally higher than predicted by published models. A model incorporating empirical equations based on the experimental measurements was applied to evaluate particle losses in supply and return duct runs. Model results suggest that duct losses are negligible for particle sizes less than 1 {micro}m and complete for particle sizes greater than 50 {micro}m. Deposition to insulated ducts, horizontal duct floors and bends are predicted to control losses in duct systems. When combined with models for HVAC filtration and deposition to indoor surfaces to predict the ultimate fates of particles within buildings, these results suggest that ventilation ducts play only a small role in determining indoor particle concentrations, especially when HVAC filtration is present. However, the measured and modeled particle deposition rates are expected to be important for ventilation system contamination.

  17. Basic concept in plasma diagnostics

    E-Print Network [OSTI]

    Rai, V N

    2014-01-01T23:59:59.000Z

    This paper presents the basic concept of various plasma diagnostics used for the study of plasma characteristics in different plasma experiments ranging from low temperature to high energy density plasma.

  18. Thermionic energy conversion plasmas

    SciTech Connect (OSTI)

    Rasor, N.S. (Rasor Associates, Inc., Sunnyvale, CA (United States))

    1991-12-01T23:59:59.000Z

    In this paper the history, application options, and ideal basic performance of the thermionic energy converter are outlined. The basic plasma types associated with various modes of converter operation are described, with emphasis on identification and semi-quantitative characterization of the dominant physical processes and utility of each plasma type. The frontier plasma science issues in thermionic converter applications are briefly summarized.

  19. PHYSICS OF ARC ~vELDING T. ~v. Eagar

    E-Print Network [OSTI]

    Eagar, Thomas W.

    , Cambridge, MA 02139 ABSTRACT A discussion of the factors controlling the size and shape of the weld fusion, plasma jets, and weld pool convection all strongly influence the fusion zone shape; no comprehensive. There are many opportunities f or both theoretical and experimental studies aimed at im'proving our know- ledge

  20. Sol-Gel Deposited Electrochromic Coatings

    E-Print Network [OSTI]

    Ozer, N.

    2010-01-01T23:59:59.000Z

    Handbook of Inorganic Electrochromic Materials, Elsevier, .O R Y Sol-Gel Deposited Electrochromic Coatings Nilgun Ozer1600 Sol-Gel Deposited Electrochromic Coatings Nilgun Ozer

  1. Linked Deposit Loan Program (Kentucky)

    Broader source: Energy.gov [DOE]

    The Linked Deposit Program provides loan financing for small businesses of up to $100,000 for up to 7 years. The State Investment Commission invests funds from the state's Abandoned Property Cash...

  2. Seasonalepisodic control of acid deposition

    E-Print Network [OSTI]

    Fay, James A.

    1988-01-01T23:59:59.000Z

    This report contains the climatological, technical and economic factors for episodic and seasonal control of emissions in existing power plants. Analyzing a large data set of acid deposition for the years 1982-85, we find ...

  3. Asphalt deposition in miscible floods

    E-Print Network [OSTI]

    Hasan, Syed Mir Ahmed

    1964-01-01T23:59:59.000Z

    . ACKNOWLEDGMENTS. . 22 23 8. REFERENCES. 24 9. APPENDIX. 26 LIST OF TABLES Table Page I II IV Properties of the Crude Oils Studied Average Core Properties for Different Tests Average Perrneabilities of Different Sections of Core Before and After... Displacement with Liquefied Petroleum Gas Percent Reduction in Permeability in Different Sections of Core Due to Asphalt Deposition Average Recoveries of Four Crude Oils and Increase in Swept Area due to Plugging by Asphalt Deposition 27 29 ABSTRACT...

  4. Chemical enhancement of surface deposition

    DOE Patents [OSTI]

    Patch, Keith D. (Lexington, MA); Morgan, Dean T. (Sudbury, MA)

    1997-07-29T23:59:59.000Z

    A method and apparatus for increasing the deposition of ions onto a surface, such as the adsorption of uranium ions on the detecting surface of a radionuclide detector. The method includes the step of exposing the surface to a complexing agent, such as a phosphate ion solution, which has an affinity for the dissolved species to be deposited on the surface. This provides, for example, enhanced sensitivity of the radionuclide detector.

  5. Chemical enhancement of surface deposition

    DOE Patents [OSTI]

    Patch, K.D.; Morgan, D.T.

    1997-07-29T23:59:59.000Z

    A method and apparatus are disclosed for increasing the deposition of ions onto a surface, such as the adsorption of uranium ions on the detecting surface of a radionuclide detector. The method includes the step of exposing the surface to a complexing agent, such as a phosphate ion solution, which has an affinity for the dissolved species to be deposited on the surface. This provides, for example, enhanced sensitivity of the radionuclide detector. 16 figs.

  6. Vapor deposition of hardened niobium

    DOE Patents [OSTI]

    Blocher, Jr., John M. (Columbus, OH); Veigel, Neil D. (Columbus, OH); Landrigan, Richard B. (Columbus, OH)

    1983-04-19T23:59:59.000Z

    A method of coating ceramic nuclear fuel particles containing a major amount of an actinide ceramic in which the particles are placed in a fluidized bed maintained at ca. 800.degree. to ca. 900.degree. C., and niobium pentachloride vapor and carbon tetrachloride vapor are led into the bed, whereby niobium metal is deposited on the particles and carbon is deposited interstitially within the niobium. Coating apparatus used in the method is also disclosed.

  7. Solution deposited NiO thin-films as hole transport layers in organic photovoltaics

    SciTech Connect (OSTI)

    Steirer, K. Xerxes [Colorado School of Mines, Golden, CO (United States); Chesin, Jordan P. [Division of Engineering, Brown Univ., Providence, RI (United States); Widjonarko, N. Edwin [University of Colorado, Dept of Physics, Boulder, CO (United States); Berry, Joseph J. [National Renewable Energy Laboratory (NREL), Golden, CO (United States); Miedaner, Alexander [National Renewable Energy Laboratory (NREL), Golden, CO (United States); Ginley, David S. [National Renewable Energy Laboratory (NREL), Golden, CO (United States); Olson, Dana C. [National Renewable Energy Laboratory (NREL), Golden, CO (United States)

    2010-01-01T23:59:59.000Z

    Organic solar cells require suitable anode surface modifiers in order to selectively collect positive charge carriers and improve device performance. We employ a nickel metal organic ink precursor to fabricate NiO hole transport layers on indium tin oxide anodes. This solution deposited NiO annealed at 250 °C and plasma treated, achieves similar OPV device results reported with NiO films from PLD as well as PEDOT:PSS. We demonstrate a tunable work function by post-processing the NiO with an O{sub 2}-plasma surface treatment of varied power and time. We find that plasma treatment is necessary for optimal device performance. Optimal devices utilizing a solution deposited NiO hole transport layer show lower series resistance and increased fill factor when compared to solar cells with PEDOT:PSS.

  8. A Radon Progeny Deposition Model

    E-Print Network [OSTI]

    V. E. Guiseppe; S. R. Elliott; A. Hime; K. Rielage; S. Westerdale

    2010-12-30T23:59:59.000Z

    The next generation low-background detectors operating underground aim for unprecedented low levels of radioactive backgrounds. Although the radioactive decays of airborne radon (particularly Rn-222) and its subsequent progeny present in an experiment are potential backgrounds, also problematic is the deposition of radon progeny on detector materials. Exposure to radon at any stage of assembly of an experiment can result in surface contamination by progeny supported by the long half life (22 y) of Pb-210 on sensitive locations of a detector. An understanding of the potential surface contamination from deposition will enable requirements of radon-reduced air and clean room environments for the assembly of low background experiments. It is known that there are a number of environmental factors that govern the deposition of progeny onto surfaces. However, existing models have not explored the impact of some environmental factors important for low background experiments. A test stand has been constructed to deposit radon progeny on various surfaces under a controlled environment in order to develop a deposition model. Results from this test stand and the resulting deposition model are presented.

  9. An Archean Oceanic Felsic Dyke Swarm In A Nascent Arc- The Hunter...

    Open Energy Info (EERE)

    Felsic Dyke Swarm In A Nascent Arc- The Hunter Mine Group, Abitibi Greenstone Belt, Canada Jump to: navigation, search OpenEI Reference LibraryAdd to library Journal Article: An...

  10. Exhaust-gas measurements from NASAs HYMETS arc jet.

    SciTech Connect (OSTI)

    Miller, Paul Albert

    2010-11-01T23:59:59.000Z

    Arc-jet wind tunnels produce conditions simulating high-altitude hypersonic flight such as occurs upon entry of space craft into planetary atmospheres. They have traditionally been used to study flight in Earth's atmosphere, which consists mostly of nitrogen and oxygen. NASA is presently using arc jets to study entry into Mars' atmosphere, which consists of carbon dioxide and nitrogen. In both cases, a wide variety of chemical reactions take place among the gas constituents and with test articles placed in the flow. In support of those studies, we made measurements using a residual gas analyzer (RGA) that sampled the exhaust stream of a NASA arc jet. The experiments were conducted at the HYMETS arc jet (Hypersonic Materials Environmental Test System) located at the NASA Langley Research Center, Hampton, VA. This report describes our RGA measurements, which are intended to be used for model validation in combination with similar measurements on other systems.

  11. E-Print Network 3.0 - arc-continent collision origin Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    shortening of arc-continent collision at an azimuth of 294 to be 62... -338. Chen, W.S., 1997b. Mesoscopic structures developed in the Lichi ... Source: Chen, Wen-Shan -...

  12. E-Print Network 3.0 - arc box test Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    1 Geo 465565 Lab 8 The Geodatabase and ArcSDE For this lab you will be working with a spatial data... format called the Geodatabase. The Geodatabase (GDB) is the native spatial...

  13. Improving the System Life of Basic Oxygen and Electric Arc Furnace Hoods, Roofs, and Side Vents

    Broader source: Energy.gov [DOE]

    This factsheet describes the benefits of a high-performance aluminum bronze alloy to basic oxygen furnace and electric arc furnace components such as hoods, roofs, and side vents.

  14. Physical aspects of the angle-beta concept in electron arc therapy

    SciTech Connect (OSTI)

    Pla, M.; Podgorsak, E.B.; Pla, C.; Freeman, C.R.; Souhami, L.; Guerra, J. (Department of Radiation Oncology, McGill University, Montreal, Quebec (Canada))

    1991-06-01T23:59:59.000Z

    A technique for the determination of treatment parameters that are required to achieve a desired depth dose distribution in electron arc therapy is discussed and a method for calculating isodose distributions is presented. Both the treatment technique and the dose calculation method rely on the angle beta concept, which uniquely describes the dependence of the radial percentage depth doses in electron arc therapy on the nominal field width, isocenter depth, and virtual source-axis distance. The angle beta concept is discussed in detail and the electron pseudo-arc therapy technique used at McGill is described. Also presented is the method used to achieve dose homogeneity in target volumes treated with the pseudo-arc technique.

  15. E-Print Network 3.0 - arc-continent collisional orogenesis Sample...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    << < 1 2 3 4 5 > >> 1 A model for continental crust genesis by arc accretion: rare earth element evidence from the Irish Caledonides Summary: and upper crustal volcanic prod-...

  16. E-Print Network 3.0 - arc welding Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    was welded by gas tungsten arc welding (GTAW or TIG) technique using... .5%, and reduction in area of 17.3%. The filler rod used ... Source: Zhou, Wei - School of Mechanical...

  17. E-Print Network 3.0 - arc welding welding Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    was welded by gas tungsten arc welding (GTAW or TIG) technique using... .5%, and reduction in area of 17.3%. The filler rod used ... Source: Zhou, Wei - School of Mechanical...

  18. E-Print Network 3.0 - arc hybrid welding Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    was welded by gas tungsten arc welding (GTAW or TIG) technique using... .5%, and reduction in area of 17.3%. The filler rod used ... Source: Zhou, Wei - School of Mechanical...

  19. E-Print Network 3.0 - arc weld process Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    was welded by gas tungsten arc welding (GTAW or TIG) technique using... .5%, and reduction in area of 17.3%. The filler rod used ... Source: Zhou, Wei - School of Mechanical...

  20. E-Print Network 3.0 - arc welding modelisation Sample Search...

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    was welded by gas tungsten arc welding (GTAW or TIG) technique using... .5%, and reduction in area of 17.3%. The filler rod used ... Source: Zhou, Wei - School of Mechanical...

  1. E-Print Network 3.0 - arc discharge lamp Sample Search Results

    Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

    9, SEPTEMBER 2008 Digital Control of a Low-Frequency Square-Wave Summary: of the arc tube, gas pressure, and its composition, and they may vary with the lamp aging. The...

  2. Novel Direct Steelmaking by Combining Microwave, Electric Arc, and Exothermal Heating Technologies

    Broader source: Energy.gov [DOE]

    This factsheet describes a project to develop direct steelmaking through the combination of microwave, electric arc, and exothermal heating, a process which is meant to eliminate traditional, intermediate steelmaking steps.

  3. UPb and geochemical evidence for a Cryogenian magmatic arc in central Novaya Zemlya, Arctic Russia

    E-Print Network [OSTI]

    Svensen, Henrik

    U­Pb and geochemical evidence for a Cryogenian magmatic arc in central Novaya Zemlya, Arctic Russia-0349 Oslo, Norway Introduction The High Arctic of Scandinavia and Russia consists of a collage

  4. Method of detecting the direction of arcing faults on power distribution feeders

    E-Print Network [OSTI]

    Fernando, W. Anand Krisantha

    1992-01-01T23:59:59.000Z

    harmonic symmetrical current components under high impedance arcing faults hss been proposed by Raiser of Power Technologies Inc [I]. Other methods using even, odd, and "in-between" harmonics (with respect to the 60 Hz fundamental frequency) have been... and the second based on the "in-between" harmonic frequency current correlation to the voltage of the faulted feeder [8]. Benner has proposed the correlation of voltage to the difference in line current, caused due to an arcing high impedance fault...

  5. Understanding environmental leachability of electric arc furnace dust

    SciTech Connect (OSTI)

    Stegemann, J.A.; Roy, A.; Caldwell, R.J.; Schilling, P.J.; Tittsworth, R.

    2000-02-01T23:59:59.000Z

    Dust from production of steel in an electric arc furnace (EAF) contains a mixture of elements that pose a challenge for both recovery and disposal. This paper relates the leachability of six Canadian EAF dusts in four leaching tests [distilled water, Ontario Regulation 347 Leachate Extraction Procedure, Amount Available for Leaching (AALT), and pH 5 Stat] to their mineralogy. Chromium and nickel contaminants in EAF dust are largely unleachable (<5% available in AALT and pH 5 Stat), as they are found with the predominant spinel ferrite phase in EAF dust. However, even a small proportion of oxidized chromium can result in significant leachate concentrations of highly toxic chromate. The leachability of zinc (7--50% available), lead (2--17% available), and cadmium (9--55% available) can be significant, as large fractions of these contaminants are found as chlorides and oxides. The leaching of these metals is largely controlled by pH. The acid neutralization capacity of the EAF dusts appeared to be controlled by dissolution of lime and zincite, and results from regulatory leaching tests can be misleading because the variable acid neutralization capacity of EAF dusts can lead to very different final leachate pHs (5--12.4). A more informative approach would be to evaluate the total amounts of contaminants available in the long term, and the acid neutralization capacity.

  6. Recycling of electric arc furnace dust: Jorgensen steel facility

    SciTech Connect (OSTI)

    Jackson, T.W.; Chapman, J.S.

    1995-01-01T23:59:59.000Z

    This document is an evaluation of the Ek Glassification(TM) Process to recycle and convert K061-listed waste (Electric Arc Furnace or EAF dust) and other byproducts of the steel-making industry into usable products. The Process holds potential for replacing the need for expensive disposal costs associated with the listed waste with the generation of marketable products. The products include colored glass and glass-ceramics; ceramic glazes, colorants, and fillers; roofing granules and sandblasting grit; and materials for Portland cement production. Field testing of the technology was conducted by the U.S. Environmental Protection Agency (U.S. EPA) in early July of 1991 at the Earle M. Jorgensen Steel Co. (EMJ) plant in Seattle, Washington, and both technical and economic aspects of the technology were examined. TCLP testing of the product determined that leachability characteristics of metals in the product meet treatment standards for K061-listed waste. The Process was also shown to be economically viable, based on capital and operating cost estimates, and profit and revenue forecasts for a 21,000 ton-per-year operation. Although this effort showed that the technology holds promise, regulatory compliance should be evaluated on the basis of the actual hardware configuration and operating procedures along with the leachability of the specific product formulations to be used.

  7. The modelling of irradiation embrittlement in submerged-arc welds

    SciTech Connect (OSTI)

    Bolton, C.J.; Buswell, J.T.; Jones, R.B.; Moskovic, R.; Priest, R.H. [Nuclear Electric plc, Berkeley (United Kingdom). Berkeley Technology Centre

    1996-12-31T23:59:59.000Z

    Until very recently, the irradiation embrittlement behavior of submerged-arc welds has been interpreted in terms of two mechanisms, namely a matrix damage component and an additional component due to the irradiation-enhanced production of copper-rich precipitates. However, some of the weld specimens from a recent accelerated re-irradiation experiment have shown high Charpy shifts which exceeded the values expected from the measured shift in yield stress. Microstructural examination has revealed the occurrence of intergranular fracture (IGF) in these specimens, accompanied by grain boundary segregation of phosphorus. Theoretical models were developed to predict the parametric dependence of irradiation-enhanced phosphorus segregation on experimental variables. Using these parametric forms, along with the concept of a critical level of segregation for the onset of IGF instead of cleavage, a three mechanism trend curve has been developed. The form of this trend curve, taking into account IGF as well as matrix and copper embrittlement, is thus mechanistically based. The constants in the equation, however, are obtained by a statistical fit to the actual Charpy shift database.

  8. Stainless steel submerged arc weld fusion line toughness

    SciTech Connect (OSTI)

    Rosenfield, A.R.; Held, P.R.; Wilkowski, G.M. [Battelle, Columbus, OH (United States)

    1995-04-01T23:59:59.000Z

    This effort evaluated the fracture toughness of austenitic steel submerged-arc weld (SAW) fusion lines. The incentive was to explain why cracks grow into the fusion line in many pipe tests conducted with cracks initially centered in SAWS. The concern was that the fusion line may have a lower toughness than the SAW. It was found that the fusion line, Ji. was greater than the SAW toughness but much less than the base metal. Of greater importance may be that the crack growth resistance (JD-R) of the fusion line appeared to reach a steady-state value, while the SAW had a continually increasing JD-R curve. This explains why the cracks eventually turn to the fusion line in the pipe experiments. A method of incorporating these results would be to use the weld metal J-R curve up to the fusion-line steady-state J value. These results may be more important to LBB analyses than the ASME flaw evaluation procedures, since there is more crack growth with through-wall cracks in LBB analyses than for surface cracks in pipe flaw evaluations.

  9. Theory and models of material erosion and lifetime during plasma instabilities in a tokamak environment.

    SciTech Connect (OSTI)

    Hassanein, A.; Konkashbaev, I.

    1999-11-08T23:59:59.000Z

    Surface and structural damage to plasma-facing components (PFCs) due to the frequent loss of plasma confinement remains a serious problem for the tokamak reactor concept. The deposited plasma energy causes significant surface erosion, possible structural failure, and frequent plasma contamination. Surface damage consists of vaporization, spallation, and liquid splatter of metallic materials. Structural damage includes large temperature increases in structural materials and at the interfaces between surface coatings and structural members. To evaluate the lifetimes of plasma-facing materials and nearby components and to predict the various forms of damage that they experience, comprehensive models (contained in the HEIGHTS computer simulation package) are developed, integrated self-consistently, and enhanced. Splashing mechanisms such as bubble boiling and various liquid magnetohydrodynamic instabilities and brittle destruction mechanisms of nonmelting materials are being examined. The design requirements and implications of plasma-facing and nearby components are discussed, along with recommendations to mitigate and reduce the effects of plasma instabilities on reactor components.

  10. Statistical quality control for volumetric modulated arc therapy (VMAT) delivery using machine log data

    E-Print Network [OSTI]

    Cheong, Kwang-Ho; Kang, Sei-Kwon; Yoon, Jai-Woong; Park, Soah; Hwang, Taejin; Kim, Haeyoung; Kim, Kyoung Ju; Han, Tae Jin; Bae, Hoonsik

    2015-01-01T23:59:59.000Z

    The aim of this study is to set up statistical quality control for monitoring of volumetric modulated arc therapy (VMAT) delivery error using machine log data. Eclipse and Clinac iX linac with the RapidArc system (Varian Medical Systems, Palo Alto, USA) is used for delivery of the VMAT plan. During the delivery of the RapidArc fields, the machine determines the delivered motor units (MUs) and gantry angle position accuracy and the standard deviations of MU (sigma_MU; dosimetric error) and gantry angle (sigma_GA; geometric error) are displayed on the console monitor after completion of the RapidArc delivery. In the present study, first, the log data was analyzed to confirm its validity and usability; then, statistical process control (SPC) was applied to monitor the sigma_MU and sigma_GA in a timely manner for all RapidArc fields: a total of 195 arc fields for 99 patients. The sigma_MU and sigma_GA were determined twice for all fields, that is, first during the patient-specific plan QA and then again during th...

  11. Influence of electron injection into 27 cm audio plasma cell on the plasma diagnostics

    SciTech Connect (OSTI)

    Haleem, N. A.; Ragheb, M. S.; Zakhary, S. G. [Accelerators Department, Nuclear Research Center, AEA, Cairo 13759 (Egypt)] [Accelerators Department, Nuclear Research Center, AEA, Cairo 13759 (Egypt); El Fiki, S. A.; Nouh, S. A. [Faculty of Science, Ain Shams University, Cairo 11566 (Egypt)] [Faculty of Science, Ain Shams University, Cairo 11566 (Egypt); El Disoki, T. M. [Faculty of Girls, Ain Shams University, Cairo 11566 (Egypt)] [Faculty of Girls, Ain Shams University, Cairo 11566 (Egypt)

    2013-08-15T23:59:59.000Z

    In this article, the plasma is created in a Pyrex tube (L = 27 cm, ?= 4 cm) as a single cell, by a capacitive audio frequency (AF) discharge (f = 10–100 kHz), at a definite pressure of ?0.2 Torr. A couple of tube linear and deviating arrangements show plasma characteristic conformity. The applied AF plasma and the injection of electrons into two gas mediums Ar and N{sub 2} revealed the increase of electron density at distinct tube regions by one order to attain 10{sup 13}/cm{sup 3}. The electrons temperature and density strengths are in contrast to each other. While their distributions differ along the plasma tube length, they show a decaying sinusoidal shape where their peaks position varies by the gas type. The electrons injection moderates electron temperature and expands their density. The later highest peak holds for the N{sub 2} gas, at electrons injection it changes to hold for the Ar. The sinusoidal decaying density behavior generates electric fields depending on the gas used and independent of tube geometry. The effect of the injected electrons performs a responsive impact on electrons density not attributed to the gas discharge. Analytical tools investigate the interaction of the plasma, the discharge current, and the gas used on the electrodes. It points to the emigration of atoms from each one but for greater majority they behave to a preferred direction. Meanwhile, only in the linear regime, small percentage of atoms still moves in reverse direction. Traces of gas atoms revealed on both electrodes due to sheath regions denote lack of their participation in the discharge current. In addition, atoms travel from one electrode to the other by overcoming the sheaths regions occurring transportation of particles agglomeration from one electrode to the other. The electrons injection has contributed to increase the plasma electron density peaks. These electrons populations have raised the generated electrostatic fields assisting the elemental ions emigration to a preferred electrode direction. Regardless of plasma electrodes positions and plasma shape, ions can be departed from one electrode to deposit on the other one. In consequence, as an application the AF plasma type can enhance the metal deposition from one electrode to the other.

  12. Princeton Plasma Physics Laboratory. Annual report, October 1, 1989--September 30, 1990

    SciTech Connect (OSTI)

    Not Available

    1990-12-31T23:59:59.000Z

    This report discusses the following topics: principal parameters achieved in experimental devices fiscal year 1990; tokamak fusion test reactor; compact ignition tokamak; Princeton beta experiment- modification; current drive experiment-upgrade; international collaboration; x-ray laser studies; spacecraft glow experiment; plasma processing: deposition and etching of thin films; theoretical studies; tokamak modeling; international thermonuclear experimental reactor; engineering department; project planning and safety office; quality assurance and reliability; technology transfer; administrative operations; PPPL patent invention disclosures for fiscal year 1990; graduate education; plasma physics; graduate education: plasma science and technology; science education program; and Princeton Plasma Physics Laboratory reports fiscal year 1990.

  13. Princeton University, Plasma Physics Laboratory annual report, October 1, 1988--September 30, 1989

    SciTech Connect (OSTI)

    Not Available

    1989-12-31T23:59:59.000Z

    This report contains discussions on the following topics: principal parameters achieved in experimental devices (FY89); tokamak fusion test reactor; compact ignition tokamak; princeton beta experiment- modification; current drive experiment; international collaboration; x-ray laser studies; spacecraft glow experiment; plasma deposition and etching of thin films; theoretical studies; tokamak modeling; international thermonuclear experimental reactor; engineering department; project planning and safety office; quality assurance and reliability; technology transfer; administrative operations; PPPL patent invention disclosures for (FY89); graduate education: plasma physics; graduate education: plasma science and technology; and Princeton Plasmas Physics Laboratory Reports (FY89).

  14. Princeton University, Plasma Physics Laboratory annual report, October 1, 1988--September 30, 1989

    SciTech Connect (OSTI)

    Not Available

    1989-01-01T23:59:59.000Z

    This report contains discussions on the following topics: principal parameters achieved in experimental devices (FY89); tokamak fusion test reactor; compact ignition tokamak; princeton beta experiment- modification; current drive experiment; international collaboration; x-ray laser studies; spacecraft glow experiment; plasma deposition and etching of thin films; theoretical studies; tokamak modeling; international thermonuclear experimental reactor; engineering department; project planning and safety office; quality assurance and reliability; technology transfer; administrative operations; PPPL patent invention disclosures for (FY89); graduate education: plasma physics; graduate education: plasma science and technology; and Princeton Plasmas Physics Laboratory Reports (FY89).

  15. Sensitivity enhancement of carbon nanotube based ammonium ion sensors through surface modification by using oxygen plasma treatment

    SciTech Connect (OSTI)

    Yeo, Sanghak; Woong Jang, Chi; Lee, Seok; Min Jhon, Young [Sensor System Research Center, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of)] [Sensor System Research Center, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of); Choi, Changrok [Center for Nano-Bio Convergence, Korea Research Institute of Standards and Science, Daejeon 305-340, North Korea (Korea, Republic of)] [Center for Nano-Bio Convergence, Korea Research Institute of Standards and Science, Daejeon 305-340, North Korea (Korea, Republic of)

    2013-02-18T23:59:59.000Z

    We have shown that the sensitivity of carbon nanotube (CNT) based sensors can be enhanced as high as 74 times through surface modification by using the inductively coupled plasma chemical vapor deposition method with oxygen. The plasma treatment power was maintained as low as 10 W within 20 s, and the oxygen plasma was generated far away from the sensors to minimize the plasma damage. From X-ray photoelectron spectroscopy analysis, we found that the concentration of oxygen increased with the plasma treatment time, which implies that oxygen functional groups or defect sites were generated on the CNT surface.

  16. Automated control of linear constricted plasma source array

    DOE Patents [OSTI]

    Anders, Andre (Albany, CA); Maschwitz, Peter A. (Martinsville, VA)

    2000-01-01T23:59:59.000Z

    An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear array of constricted glow plasma sources whose polarity and geometry are set so that the contamination and energy of the ions discharged from the sources are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The quality of film along deposition "tracks" opposite the plasma sources can be measured and compared to desired absolute or relative values by optical and/or electrical sensors. Plasma quality can then be adjusted by adjusting the power current values, gas feed pressure/flow, gas mixtures or a combination of some or all of these to improve the match between the measured values and the desired values.

  17. RISO-M-2438 Dry deposition and resuspension of

    E-Print Network [OSTI]

    deposition to city surfaces. INIS descriptors AEROSOLS; DEPOSITION; DUSTS; MATHEMATICAL MODELS; PARTICLE

  18. Plasma Physics PART Al: INTRODUCTION TO PLASMA SCIENCE

    E-Print Network [OSTI]

    Chen, Francis F.

    PART A7: PLASMA DIAGNOSTICS X. Introduction 75 XI. Remote diagnostics 75 1. Optical spectroscopy 2 and rotational excitation IV. Heavy particle collisions 142 V. Gas phase kinetics 143 PART B5: PLASMA DIAGNOSTICSPlasma Physics PART Al: INTRODUCTION TO PLASMA SCIENCE I. What is a plasma? 1 II. Plasma

  19. Michigan Institute Plasma Science

    E-Print Network [OSTI]

    Shyy, Wei

    Michigan Institute Plasma Science and Engineering Seminar Neutral Atom Imaging of the Terrestrial re- search includes ion heating in the solar corona, electric double layers, magne- tosphere neutral

  20. Michigan Institute for Plasma Sci-

    E-Print Network [OSTI]

    Shyy, Wei

    This talk will focus on the achievements of the Drexel Plasma Institute in direct application of plasmasMichigan Institute for Plasma Sci- ence and Engi- neering Seminar Plasma Medicine: Mechanisms of Direct Non-Thermal Plasma Interaction with Living Tissue Prof. Alexander Fridman Drexel University