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1

Cathodic Arc Plasma Deposition  

Office of Scientific and Technical Information (OSTI)

Cathodic Arc Plasma Deposition Cathodic Arc Plasma Deposition André Anders Lawrence Berkeley National Laboratory, University of California, 1 Cyclotron Road, Mailstop 53, Berkeley, California 94720 aanders@lbl.gov Abstract Cathodic arc plasma deposition is one of oldest coatings technologies. Over the last two decades it has become the technology of choice for hard, wear resistant coatings on cutting and forming tools, corrosion resistant and decorative coatings on door knobs, shower heads, jewelry, and many other substrates. The history, basic physics of cathodic arc operation, the infamous macroparticle problem and common filter solutions are reviewed. Cathodic arc plasmas stand out due to their high degree of ionization, with important consequences for film nucleation, growth, and efficient utilization of substrate bias. The

2

Comparative analysis of methods for ion-plasma sputter deposition and micro-arc oxidation  

Science Journals Connector (OSTI)

We describe the following advantages of micro-arc oxidation (MAO) over ion-plasma sputter deposition ... of operation by personnel. These advantages make micro-arc oxidation a promising technique for metallurgica...

M. V. Gerasimov

2007-11-01T23:59:59.000Z

3

Vacuum arc deposition devices  

SciTech Connect (OSTI)

The vacuum arc is a high-current, low-voltage electrical discharge which produces a plasma consisting of vaporized and ionized electrode material. In the most common cathodic arc deposition systems, the arc concentrates at minute cathode spots on the cathode surface and the plasma is emitted as a hypersonic jet, with some degree of contamination by molten droplets [known as macroparticles (MPs)] of the cathode material. In vacuum arc deposition systems, the location and motion of the cathode spots are confined to desired surfaces by an applied magnetic field and shields around undesired surfaces. Substrates are mounted on a holder so that they intercept some portion of the plasma jet. The substrate often provides for negative bias to control the energy of depositing ions and heating or cooling to control the substrate temperature. In some systems, a magnetic field is used to guide the plasma around an obstacle which blocks the MPs. These elements are integrated with a deposition chamber, cooling, vacuum gauges and pumps, and power supplies to produce a vacuum arc deposition system.

Boxman, R.L.; Zhitomirsky, V.N. [Electrical Discharge and Plasma Laboratory, Faculty of Engineering, Tel Aviv University, P.O. Box 39040, Tel Aviv 69978 (Israel)

2006-02-15T23:59:59.000Z

4

Graphene layer growth on silicon substrates with nickel film by pulse arc plasma deposition  

SciTech Connect (OSTI)

Carbon layer has been grown on a Ni/SiO{sub 2}/Si(111) substrate under high vacuum pressure by pulse arc plasma deposition. From the results of Raman spectroscopy for the sample, it is found that graphene was formed by ex-situ annealing of sample grown at room temperature. Furthermore, for the sample grown at high temperature, graphene formation was shown and optimum temperature was around 1000 Degree-Sign C. Transmission electron microscopy observation of the sample suggests that the graphene was grown from step site caused by grain of Ni film. The results show that the pulse arc plasma technique has the possibility for acquiring homogenous graphene layer with controlled layer thickness.

Fujita, K.; Banno, K.; Aryal, H. R.; Egawa, T. [Research Center for Nano-Device and System, Nagoya Institute of Technology, Gokiso-cho, Showa-Ku, Nagoya 466-8555 (Japan)

2012-10-15T23:59:59.000Z

5

A Study on the Deposition of Al2O3 Coatings on Polymer Substrates by a Plasma Spray/Micro-Arc Oxidation Two-Step Method  

Science Journals Connector (OSTI)

To increase the wear resistance of polymer matrix composites, alumina coatings were deposited on polymer substrates by a two-step method combining plasma spraying and micro-arc oxidation. The microstructures and ...

Guanhong Sun; Xiaodong He; Jiuxing Jiang; Yue Sun…

2013-02-01T23:59:59.000Z

6

On the structure and properties of a material deposited from arc discharge plasma near the cathode and onto vacuum-chamber walls  

Science Journals Connector (OSTI)

The structure and composition of a material (composite) deposited onto vacuum-chamber walls from arc discharge plasma during the crystallization of cathode spot products in electric and magnetic fields is studied...

N. A. Smolanov; N. A. Pankin

2014-09-01T23:59:59.000Z

7

Filters for cathodic arc plasmas  

DOE Patents [OSTI]

Cathodic arc plasmas are contaminated with macroparticles. A variety of magnetic plasma filters has been used with various success in removing the macroparticles from the plasma. An open-architecture, bent solenoid filter, with additional field coils at the filter entrance and exit, improves macroparticle filtering. In particular, a double-bent filter that is twisted out of plane forms a very compact and efficient filter. The coil turns further have a flat cross-section to promote macroparticle reflection out of the filter volume. An output conditioning system formed of an expander coil, a straightener coil, and a homogenizer, may be used with the magnetic filter for expanding the filtered plasma beam to cover a larger area of the target. A cathodic arc plasma deposition system using this filter can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

Anders, Andre (Albany, CA); MacGill, Robert A. (Richmond, CA); Bilek, Marcela M. M. (Engadine, AU); Brown, Ian G. (Berkeley, CA)

2002-01-01T23:59:59.000Z

8

Miniaturized cathodic arc plasma source  

DOE Patents [OSTI]

A cathodic arc plasma source has an anode formed of a plurality of spaced baffles which extend beyond the active cathode surface of the cathode. With the open baffle structure of the anode, most macroparticles pass through the gaps between the baffles and reflect off the baffles out of the plasma stream that enters a filter. Thus the anode not only has an electrical function but serves as a prefilter. The cathode has a small diameter, e.g. a rod of about 1/4 inch (6.25 mm) diameter. Thus the plasma source output is well localized, even with cathode spot movement which is limited in area, so that it effectively couples into a miniaturized filter. With a small area cathode, the material eroded from the cathode needs to be replaced to maintain plasma production. Therefore, the source includes a cathode advancement or feed mechanism coupled to cathode rod. The cathode also requires a cooling mechanism. The movable cathode rod is housed in a cooled metal shield or tube which serves as both a current conductor, thus reducing ohmic heat produced in the cathode, and as the heat sink for heat generated at or near the cathode. Cooling of the cathode housing tube is done by contact with coolant at a place remote from the active cathode surface. The source is operated in pulsed mode at relatively high currents, about 1 kA. The high arc current can also be used to operate the magnetic filter. A cathodic arc plasma deposition system using this source can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

Anders, Andre (Albany, CA); MacGill, Robert A. (Richmond, CA)

2003-04-15T23:59:59.000Z

9

Low-temperature deposited Cu electrode on chip inductors by abnormal glow discharge plasma with arc source  

Science Journals Connector (OSTI)

A new preparation method of Cu electrodes of chip inductors by an abnormal glow discharge technique with arc source at low temperature is presented. SEM observed the microstructure of the Cu electrode joints and EDX detected the interfacial diffusion between the electrodes and the ceramic matrix. The results show that the new technique can effectively suppress interfacial diffusion and Cu oxidation whereas reserve good adhesion in the electrode layer due to low deposition temperature, which can be achieved by suitable control of glow discharge voltage. Consequently, the compromise magnetic properties of the samples can be obtained.

Yaowen Wang; Hongguo Zhang; Qiang Chen; Junde Pan; Longtu Li

2002-01-01T23:59:59.000Z

10

Confined plasma gliding arc discharges  

Science Journals Connector (OSTI)

A confined plasma gliding arc is produced in a reactor with two-electrodes contained within a very narrow channel and water spray injected into the discharge. The evolution of pH and conductivity and the formation of hydrogen peroxide in pure water with different carrier gases and the decolourisation and mineralisation of an organic dye were compared with results for a non-confined three-electrode gliding arc reactor. The energy efficiency for the decolourisation of an organic blue dye in the confined reactor is twice that of the non-confined reactor. Significant levels of total organic carbon are removed in the confined plasma reactor.

Radu Burlica; Bruce R. Locke

2008-01-01T23:59:59.000Z

11

Method for gas-metal arc deposition  

DOE Patents [OSTI]

Method and apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment wiht the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspension of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite.

Buhrmaster, Carol L. (Corning, NY); Clark, Denis E. (Idaho Falls, ID); Smartt, Herschel B. (Idaho Falls, ID)

1990-01-01T23:59:59.000Z

12

Method for gas-metal arc deposition  

DOE Patents [OSTI]

Method and apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites are disclosed. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment with the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspension of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite. 1 fig.

Buhrmaster, C.L.; Clark, D.E.; Smartt, H.B.

1990-11-13T23:59:59.000Z

13

Apparatus for gas-metal arc deposition  

DOE Patents [OSTI]

Apparatus for gas-metal arc deposition of metal, metal alloys, and metal matrix composites. The apparatus contains an arc chamber for confining a D.C. electrical arc discharge, the arc chamber containing an outlet orifice in fluid communication with a deposition chamber having a deposition opening in alignment with the orifice for depositing metal droplets on a coatable substrate. Metal wire is passed continuously into the arc chamber in alignment with the orifice. Electric arcing between the metal wire anode and the orifice cathode produces droplets of molten metal from the wire which pass through the orifice and into the deposition chamber for coating a substrate exposed at the deposition opening. When producing metal matrix composites, a suspenion of particulates in an inert gas enters the deposition chamber via a plurality of feed openings below and around the orifice so that reinforcing particulates join the metal droplets to produce a uniform mixture which then coats the exposed substrate with a uniform metal matrix composite.

Buhrmaster, Carol L. (Corning, NY); Clark, Denis E. (Idaho Falls, ID); Smartt, Herschel B. (Idaho Falls, ID)

1991-01-01T23:59:59.000Z

14

Physics of arcing, and implications to sputter deposition  

SciTech Connect (OSTI)

Arcing is a well-known, unwanted discharge regime observed on the surface of sputtering targets. The discharge voltage breaks down to less than 50 V while the current jumps to elevated levels. Arcing is unwanted because it prevents uniform deposition and creates particulates. The issue of arcing has been dealt with by target surface conditioning and by using modern power supplies that have arc suppression incorporated. With increasing quality requirements in terms of uniformity of coatings, and absence of particulates, especially for electrochromic and other advanced coatings applications, the issue of arcing warrants a closer examination with the goal to find other, physics-based, and hopefully better approaches of arcing prevention. From a physics point of view, the onset of arcing is nothing else than the transition of the discharge to a cathodic arc mode, which is characterized by the ignition of non-stationary arc spots. Arc spots operate by a sequence of microexplosions, enabling explosive electron emission, as opposed to secondary electron emission. Arc spots and their fragments have a size distribution in the micrometer and sub-micrometer range, and a characteristic time distribution that has components shorter than microseconds. Understanding the ignition conditions of arc spots are of central physical interest. Spot ignition is associated with electric field enhancement, which can be of geometric nature (roughness,particles), or chemical nature (e.g. oxide formation) and related local accumulation of surface charge. Therefore, it is clear that these issues are of particular concern when operating with high-density plasmas, such as in high-power pulsed sputtering, and when using reactive sputter gases.

Anders, Andre

2003-12-15T23:59:59.000Z

15

Plasma of Electric Arc Discharge between Melted Electrodes  

Science Journals Connector (OSTI)

Plasma of electric arc discharge between melted electrodes was experimentally investigated. Diagnostics of electric arc plasma was carried out. Optical emission and ... in plasma tends to be located at the arc ax...

A.N. Veklich; I.L. Babich

2001-01-01T23:59:59.000Z

16

Shunting arc plasma source for pure carbon ion beam  

SciTech Connect (OSTI)

A plasma source is developed using a coaxial shunting arc plasma gun to extract a pure carbon ion beam. The pure carbon ion beam is a new type of deposition system for diamond and other carbon materials. Our plasma device generates pure carbon plasma from solid-state carbon material without using a hydrocarbon gas such as methane gas, and the plasma does not contain any hydrogen. The ion saturation current of the discharge measured by a double probe is about 0.2 mA/mm{sup 2} at the peak of the pulse.

Koguchi, H.; Sakakita, H.; Kiyama, S.; Shimada, T.; Sato, Y.; Hirano, Y. [Energy Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568 (Japan)

2012-02-15T23:59:59.000Z

17

Cathodic Vacuum Arc Plasma of Thallium  

SciTech Connect (OSTI)

Thallium arc plasma was investigated in a vacuum arc ionsource. As expected from previous consideration of cathode materials inthe Periodic Table of the Elements, thallium plasma shows lead-likebehavior. Its mean ion charge state exceeds 2.0 immediately after arctriggering, reaches the predicted 1.60 and 1.45 after about 100 microsecand 150 microsec, respectively. The most likely ion velocity is initially8000 m/s and decays to 6500 m/s and 6200 m/s after 100 microsec and 150microsec, respectively. Both ion charge states and ion velocities decayfurther towards steady state values, which are not reached within the 300microsec pulses used here. It is argued that the exceptionally high vaporpressure and charge exchange reactions are associated with theestablishment of steady state ion values.

Yushkov, Georgy Yu.; Anders, Andre

2006-10-02T23:59:59.000Z

18

Modeling of thermal plasma arc technology FY 1994 report  

SciTech Connect (OSTI)

The thermal plasma arc process is under consideration to thermally treat hazardous and radioactive waste. A computer model for the thermal plasma arc technology was designed as a tool to aid in the development and use of the plasma arc-Joule beating process. The value of this computer model is to: (a) aid in understanding the plasma arc-Joule beating process as applied to buried waste or exhumed buried waste, (b) help design melter geometry and electrode configuration, (c) calculate the process capability of vitrifying waste (i.e., tons/hour), (d) develop efficient plasma and melter operating conditions to optimize the process and/or reduce safety hazards, (e) calculate chemical reactions during treatment of waste to track chemical composition of off-gas products, and composition of final vitrified waste form and (f) help compare the designs of different plasma-arc facilities. A steady-state model of a two-dimensional axisymmetric transferred plasma arc has been developed and validated. A parametric analysis was performed that studied the effects of arc length, plasma gas composition, and input power on the temperatures and velocity profiles of the slag and plasma gas. A two-dimensional transient thermo-fluid model of the US Bureau of Mines plasma arc melter has been developed. This model includes the growth of a slag pool. The thermo-fluid model is used to predict the temperature and pressure fields within a plasma arc furnace. An analysis was performed to determine the effects of a molten metal pool on the temperature, velocity, and voltage fields within the slag. A robust and accurate model for the chemical equilibrium calculations has been selected to determine chemical composition of final waste form and off-gas based on the temperatures and pressures within the plasma-arc furnace. A chemical database has been selected. The database is based on the materials to be processed in the plasma arc furnaces.

Hawkes, G.L.; Nguyen, H.D.; Paik, S.; McKellar, M.G.

1995-03-01T23:59:59.000Z

19

Plasma Chemistry and Plasma Processing, Vol. 12, No.4, 1992 Infrared Radiation from an Arc Plasma and Its  

E-Print Network [OSTI]

of an atmospheric-pressure arc plasma are described from the viewpoint of continuorts radiation tlieory of the atmospheric arc plasma column is very sensitive to the electron density in the near infrared frequency rangeB ) Plasma Chemistry and Plasma Processing, Vol. 12, No.4, 1992 Infrared Radiation from an Arc

Eagar, Thomas W.

20

Mechanism of carbon nanostructure synthesis in arc plasma  

SciTech Connect (OSTI)

Plasma enhanced techniques are widely used for synthesis of carbon nanostructures. The primary focus of this paper is to summarize recent experimental and theoretical advances in understanding of single-wall carbon nanotube (SWNT) synthesis mechanism in arcs, and to describe methods of controlling arc plasma parameters. Fundamental issues related to synthesis of SWNTs, which is a relationship between plasma parameters and SWNT characteristics are considered. It is shown that characteristics of synthesized SWNTs can be altered by varying plasma parameters. Effects of electrical and magnetic fields applied during SWNT synthesis in arc plasma are explored. Magnetic field has a profound effect on the diameter, chirality, and length of a SWNT synthesized in the arc plasma. An average length of SWNT increases by a factor of 2 in discharge with magnetic field and an amount of long nanotubes with the length above 5 {mu}m also increases in comparison with that observed in the discharge without a magnetic field. In addition, synthesis of a few-layer graphene in a magnetic field presence is discovered. A coupled model of plasma-electrode phenomena in atmospheric-pressure anodic arc in helium is described. Calculations indicate that substantial fraction of the current at the cathode is conducted by ions (0.7-0.9 of the total current). It is shown that nonmonotonic behavior of the arc current-voltage characteristic can be reproduced taking into account the experimentally observed dependence of the arc radius on arc current.

Keidar, M.; Shashurin, A.; Volotskova, O. [George Washington University, Washington, DC 20052 (United States); Raitses, Y. [Princeton Plasma Physics Laboratory, Princeton, New Jersey 08543 (United States); Beilis, I. I. [Tel Aviv University, Tel Aviv 69978 (Israel)

2010-05-15T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


21

E-Print Network 3.0 - arc plasma gun Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

gun Search Powered by Explorit Topic List Advanced Search Sample search results for: arc plasma gun...

22

Synthesis of silicon nanotubes by DC arc plasma method  

SciTech Connect (OSTI)

Plasma synthesis is a novel technique of synthesis of nanomaterials as they provide high rate of production and promote metastable reactions. Very thin walled silicon nanotubes were synthesized in a DC direct arc thermal plasma reactor. The effect of parameters of synthesis i.e. arc current and presence of hydrogen on the morphology of Si nanoparticles is reported. Silicon nanotubes were characterized by Transmission Electron Microscopy (TEM), Local Energy Dispersive X-ray analysis (EDAX), and Scanning Tunneling Microscopy (STM).

Tank, C. M.; Bhoraskar, S. V.; Mathe, V. L. [Department of Physics, University of Pune, Pune-7, Maharashtra (India)

2012-06-05T23:59:59.000Z

23

Plasma-Therm Workshop: Fundamentals of Plasma Processing (Etching & Deposition)  

E-Print Network [OSTI]

Plasma-Therm Workshop: Fundamentals of Plasma Processing (Etching & Deposition) Nanofabrication The workshop will focus on the fundamentals of plasma etching and deposition. Lectures will include an introduction to vacuum technology, the basics of plasma and plasma reactors and an overview of mechanisms

Martin, Jan M.L.

24

E-Print Network 3.0 - arc deposition system Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

in the Asir terrane, which was active between... erosion and deposition in the back-arc basin environment (Camp, 1984). Regional metamorphism in the WBMD... volcanic arc system. J....

25

Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective  

SciTech Connect (OSTI)

Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."

Anders, Andre

2007-02-28T23:59:59.000Z

26

Anode Sheath Switching in a Carbon Nanotube Arc Plasma  

SciTech Connect (OSTI)

The anode ablation rate is investigated as a function of anode diameter for a carbon nanotube arc plasma. It is found that anomalously high ablation occurs for small anode diameters. This result is explained by the formation of a positive anode sheath. The increased ablation rate due to this positive anode sheath could imply greater production rate for carbon nanotubes.

Abe Fetterman, Yevgeny Raitses, and Michael Keidar

2008-04-08T23:59:59.000Z

27

E-Print Network 3.0 - arc plasma furnace Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

PLASMA PHYSICS AND ENGINEERING Summary: replace costly traditional technologies as incineration and conventional plasma arc furnaces, and provide... ASSOCIATED LABORATORY ON...

28

Parameters of free-burning arc discharge plasma in air with silver-based electrodes  

Science Journals Connector (OSTI)

We have used optical spectroscopy to study the radial temperature profiles for an electric arc plasma between silver electrodes and electrodes made ... . We established that the parameters of the arc discharge pl...

I. L. Babich; A. N. Veklich; L. A. Kryachko…

2006-05-01T23:59:59.000Z

29

Dynamic voltage-current characteristics for a water jet plasma arc  

SciTech Connect (OSTI)

A virtual instrument technology is used to measure arc current, arc voltage, dynamic V-I characteristics, and nonlinear conductance for a cone-shaped water jet plasma arc under ac voltage. Experimental results show that ac arc discharge mainly happens in water vapor evaporated from water when heated. However, due to water's cooling effect and its conductance, arc conductance, reignition voltage, extinguish voltage, and current zero time are very different from those for ac arc discharge in gas work fluid. These can be valuable to further studies on mechanism and characteristics of plasma ac discharge in water, and even in gas work fluid.

Yang Jiaxiang; Lan Sheng; Xu Zuoming [College of Electrical and Electronic Engineering, Harbin University of Science and Technology, Harbin, Heilongjiang 150040 (China)

2008-05-05T23:59:59.000Z

30

Development of a Plasma Arc Manufacturing Process and Machine to Create Metal Oxide Particles in Water From Wire Feedstock.  

E-Print Network [OSTI]

??A plasma arc erosion process can be used to create metal and metal oxide particles in the ultra-fine size range (<70 um). An electric arc… (more)

George, Jonathan Alan 1983-

2010-01-01T23:59:59.000Z

31

Spectroscopy of atmospheric pressure air jet plasma in transverse arc discharge Valeriy Chernyak1  

E-Print Network [OSTI]

Spectroscopy of atmospheric pressure air jet plasma in transverse arc discharge Valeriy Chernyak1 of the atmospheric pressure air jet plasma in the transverse cw dc arc discharge of high voltage was done. Within.g. application of approximation of the optically thin plasma in conditions of high atmospheric pressure

Paris-Sud XI, Université de

32

Measurement and modeling of Ar ? H 2 ? C H 4 arc jet discharge chemical vapor deposition reactors II: Modeling of the spatial dependence of expanded plasma parameters and species number densities  

Science Journals Connector (OSTI)

Detailed methodology and results are presented for a two-dimensional ( r z ) computer model applicable to dc arc jet reactors operating on argon/hydrogen/hydrocarbon gas mixtures and used for chemical vapor deposition of micro- and nanocrystalline diamond and diamondlike carbon films. The model incorporates gas activation expansion into the low pressure reactor chamber and the chemistry of the neutral and charged species. It predicts the spatial variation of temperature flow velocities and number densities of 25 neutral and 14 charged species and the dependence of these parameters on the operating conditions of the reactor such as flows of H 2 and C H 4 and input power. Selected outcomes of the model are compared with experimental data in the accompanying paper [C. J. Rennick et al. J. Appl. Phys.102 063309 (2007)]. Two-dimensional spatial maps of the number densities of key radical and molecular species in the reactor derived from the model provide a summary of the complicated chemical processing that occurs. In the vortex region beyond the plume the key transformations are C H 4 ? C H 3 ? C 2 H 2 ? large hydrocarbons; in the plume or the transition zone to the cooler regions the chemical processing involves C 2 H x ? ( C H y and C H z ) C 3 H x ? ( C H y and C 2 H z ) ( C 2 H y and C 2 H z ) ? C 4 H x ? ( C H y and C 3 H z ) . Depending on the local gas temperature T g and the H ? H 2 ratio the equilibria of H-shifting reactions favor C CH and C 2 species (in the hot H-rich axial region of the plume) or C H 2 C 2 H and C 2 H 2 species (at the outer boundary of the transition zone). Deductions are drawn about the most abundant C-containing radical species incident on the growing diamond surface (C atoms and CH radicals) within this reactor and the importance of chemistry involving charged species is discussed. Modifications to the boundary conditions and model reactor geometry allow its application to a lower power arc jet reactor operated and extensively studied by Jeffries and co-workers at SRI International and comparisons are drawn with the reported laser induced fluorescence data from these studies.

Yu. A. Mankelevich; M. N. R. Ashfold; A. J. Orr-Ewing

2007-01-01T23:59:59.000Z

33

Modeling And Measurements Of The Arc Plasma In A Mixture Of Gases  

SciTech Connect (OSTI)

Radial distributions of Ar mass fractions and temperatures in plasmas produced in a wall-stabilized arc have been calculated. Modeling have been performed for many different mixtures of Ar+N2 and three different arc currents. The obtained results show that the radial distributions of Ar mass fractions strongly depend on the chemical composition of the plasma. In plasmas containing large amount of Ar the distributions have local minima at the arc axis (in high temperature plasma regions), whereas in plasmas consisting mainly of nitrogen the distributions reveal maxima on the discharge axis. Those features seem to be connected with the dissociation of the nitrogen.

Pawelec, E.; KsiaPzek, I. [University of Opole, Oleska 48, Opole (Poland)

2006-01-15T23:59:59.000Z

34

Application of cathodic arc deposited amorphous hard carbon films to the head/disk tribology  

SciTech Connect (OSTI)

Amorphous hard carbon films deposited by filtered cathodic arc deposition exhibit very high hardness and elastic modulus, high mass density, low coefficient of friction, and the films are very smooth. All these properties are beneficial to applications of these films for the head/disk interface tribology. The properties of cathodic arc deposited amorphous carbon films are summarized, and they are compared to sputter deposited, hydrogenated (CH{sub x}), and nitrogenated (CN{sub x}) carbon films which are the present choice for hard disk and slider coatings. New developments in cathodic arc coaters are discussed which are of interest to the disk drive industry. Experiments on the nanotribology, mass density and hardness, corrosion behavior, and tribochemical behavior of cathodic arc films are reported. A number of applications of cathodic arc deposited films to hard disk and slider coatings are described. It is shown that their tribological performance is considerably better compared to CH{sub x} and CN{sub x} films.

Anders, S. [Lawrence Berkeley National Lab., CA (United States). Advanced Light Source Div.; Bhatia, C.S. [SSD/IBM, San Jose, CA (United States); Fong, W.; Lo, R.Y.; Bogy, D.B. [Univ. of California, Berkeley, CA (United States). Computer Mechanics Lab.

1998-04-01T23:59:59.000Z

35

Method of operating a centrifugal plasma arc furnace  

DOE Patents [OSTI]

A centrifugal plasma arc furnace is used to vitrify contaminated soils and other waste materials. An assessment of the characteristics of the waste is performed prior to introducing the waste into the furnace. Based on the assessment, a predetermined amount of iron is added to each batch of waste. The waste is melted in an oxidizing atmosphere into a slag. The added iron is oxidized into Fe{sub 3}O{sub 4}. Time of exposure to oxygen is controlled so that the iron does not oxidize into Fe{sub 2}O{sub 3}. Slag in the furnace remains relatively non-viscous and consequently it pours out of the furnace readily. Cooled and solidified slag produced by the furnace is very resistant to groundwater leaching. The slag can be safely buried in the earth without fear of contaminating groundwater. 3 figs.

Kujawa, S.T.; Battleson, D.M.; Rademacher, E.L. Jr.; Cashell, P.V.; Filius, K.D.; Flannery, P.A.; Whitworth, C.G.

1998-03-24T23:59:59.000Z

36

Method of operating a centrifugal plasma arc furnace  

DOE Patents [OSTI]

A centrifugal plasma arc furnace is used to vitrify contaminated soils and other waste materials. An assessment of the characteristics of the waste is performed prior to introducing the waste into the furnace. Based on the assessment, a predetermined amount of iron is added to each batch of waste. The waste is melted in an oxidizing atmosphere into a slag. The added iron is oxidized into Fe.sub.3 O.sub.4. Time of exposure to oxygen is controlled so that the iron does not oxidize into Fe.sub.2 O.sub.3. Slag in the furnace remains relatively non-viscous and consequently it pours out of the furnace readily. Cooled and solidified slag produced by the furnace is very resistant to groundwater leaching. The slag can be safely buried in the earth without fear of contaminating groundwater.

Kujawa, Stephan T. (Butte, MT); Battleson, Daniel M. (Butte, MT); Rademacher, Jr., Edward L. (Butte, MT); Cashell, Patrick V. (Butte, MT); Filius, Krag D. (Butte, MT); Flannery, Philip A. (Ramsey, MT); Whitworth, Clarence G. (Butte, MT)

1998-01-01T23:59:59.000Z

37

Cathodic Arc Deposition of Copper Oxide Thin Films  

E-Print Network [OSTI]

plasma source with a copper cathode was operated in an oxygen atmosphereplasma source with a copper cathode in an oxygen atmosphere.plasma source with a copper cathode (5 cm diameter) operated in an oxygen atmosphere.

MacGill, R.A.

2011-01-01T23:59:59.000Z

38

Characterization of an atmospheric double arc argon-nitrogen plasma source  

SciTech Connect (OSTI)

In the framework of studies devoted to hazardous waste destruction, an original dc double anode plasma torch has been designed and tested, which produces an elongated, weak fluctuation and reproducible plasma jet at atmospheric pressure. The arc instabilities and dynamic behavior of the double arc argon-nitrogen plasma jet are investigated through the oscillations of electrical signals by combined means of fast Fourier transform and Wigner distribution. In our experiment, the restrike mode is identified as the typical fluctuation behavior in an argon-nitrogen plasma jet. The Fourier spectra and Wigner distributions exhibit two characteristic frequencies of 150 Hz and 4.1 kHz, which reveals that the nature of fluctuations in the double arc argon-nitrogen plasma can be ascribed to the undulation of the power supply and both arc roots motion on the anode channels. In addition, the microscopic properties of the plasma jet inside and outside the arc chamber are investigated by means of optical emission spectroscopy, which yields excitation, electronic, rotational, and vibrational temperatures, as well as the electron number density. The results allow us to examine the validity criteria of a local thermodynamic equilibrium (LTE) state in the plasma arc. The measured electron densities are in good agreement with those calculated from the LTE model, which indicates that the atmospheric double arc argon-nitrogen plasma in the core region is close to the LTE state under our experimental conditions.

Tu, X. [State Key Laboratory of Clean Energy Utilization, Zhejiang University, Hangzhou 310027 (China); UMR 6614 CNRS CORIA, Saint Etienne du Rouvray 76801 (France); Cheron, B. G. [UMR 6614 CNRS CORIA, Saint Etienne du Rouvray 76801 (France); Yan, J. H.; Yu, L.; Cen, K. F. [State Key Laboratory of Clean Energy Utilization, Zhejiang University, Hangzhou 310027 (China)

2008-05-15T23:59:59.000Z

39

E-Print Network 3.0 - arc spray deposition Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Acta mater. 49 (2001) 15651575 www.elsevier.comlocateactamat Summary: AlY bond coat and atmospheric plasma spray (APS) zirconia top coat were deposited onto a nickel...

40

S-shaped magnetic macroparticle filter for cathodic arc deposition  

SciTech Connect (OSTI)

A new magnetic macroparticle filter design consisting of two 90{sup o} filters forming an S-shape is described. Transport properties of this S-filter are investigated using Langmuir and deposition probes. It is shown that filter efficiency is product of the efficiencies of two 90{sup o} filters and the deposition rate is still acceptably high to perform thin film deposition. Films of amorphous hard carbon have been deposited using a 90{sup o} filter and the S-filter, and macroparticle content of the films are compared.

Anders, S.; Anders, A.; Dickinson, M.R.; MacGill, R.A.; Brown, I.G.

1996-04-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


41

Studies of Discharge Parameters Influence on the IPD Plasma Deposition Process  

SciTech Connect (OSTI)

The paper presents recent studies of a current sheet dynamics influence on the surface engineering process of impulse plasma deposition (IPD). During the IPD process plasma is generated in the working gas due to a high-voltage high-current oscillating pulse discharge, ignited within an interelectrode region of a coaxial accelerator. The changes of plasma dynamics and generation mechanisms, e.g. the electric arc instead of the plasma sheet formation during the consecutive half-periods of discharge, cause the different deposition efficiency for accelerator with the outer electrode system composed of stainless steel rods instead of standard tubular one. The coating efficiency and deposited layer quality have been examined for the titanium nitride as the model material for surface engineering.

Rabinski, Marek [Department of Plasma Physics and Technology, Institute for Nuclear Studies, 05-400 Otwock-Swierk (Poland); Zdunek, Krzysztof [Faculty of Materials Science, Warsaw University of Technology, Woloska 141, 02-507 Warsaw (Poland)

2006-01-15T23:59:59.000Z

42

High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition  

SciTech Connect (OSTI)

High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

Anders, Andre

2009-09-01T23:59:59.000Z

43

Deposition of nanolayers by means of dense plasma focus  

Science Journals Connector (OSTI)

In our preliminary experiments, reported in this paper, dense plasma focus (DPF) device is used for deposition...

M. Chernyshova; I. Ivanova-Stanik; L. Karpi?ski…

2006-10-01T23:59:59.000Z

44

Radial Mass Fraction Distributions In Ar+N Plasmas Produced In A Wall-Stabilized Arc  

SciTech Connect (OSTI)

Radial distributions of Ar mass fractions in plasmas produced in a wall-stabilized arc have been studied. Measurements have been performed for seven different mixtures of Ar+N2. The obtained results show that the radial distributions of Ar mass fractions strongly depend on the chemical composition of the plasma. In plasmas containing large amount of Ar the distributions have local minima at the arc axis (in high temperature plasma regions), whereas in plasmas consisting mainly of nitrogen the distributions reveal maxima on the discharge axis.

KsiaPzek, Ireneusz [Institute of Physics, Opole University, ul. Oleska 48, 45-052 Opole (Poland)

2006-01-15T23:59:59.000Z

45

Cathodic Arc Deposition of Copper Oxide Thin Films  

E-Print Network [OSTI]

in the range 1-1.25 GHz, UHV compatible, and very adhesivefulfill the requirements for UHV compatibility. A cathodic85 MPa) and fulfill all UHV requirements. The deposition

MacGill, R.A.

2011-01-01T23:59:59.000Z

46

Spatial and time-dependent distribution of plasma parameters in the metal-halide arc lamp.  

E-Print Network [OSTI]

Spatial and time-dependent distribution of plasma parameters in the metal-halide arc lamp. A. Khakhaev, L. Luizova, K. Ekimov and A. Soloviev Petrozavodsk State University, Russia The metal-halide arc lamp is an effective light source and its investigation has a long history, but even at present some

Paris-Sud XI, Université de

47

TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma  

Science Journals Connector (OSTI)

The plasma enhanced chemical vapour deposition method applying atmospheric dielectric barrier discharge (ADBD) plasma was used for TiOx thin films deposition employing titanium (IV) isopropoxide and oxygen as rea...

Y. Klenko; J. Pichal

2012-12-01T23:59:59.000Z

48

Surface Modification of Smectite Clay Induced by Non-thermal Gliding Arc Plasma at Atmospheric Pressure  

Science Journals Connector (OSTI)

Smectite clay from Sabga (west-Cameroon) was treated in aqueous suspension by gliding arc plasma to modify its surface properties. The evolution of the modifications was followed with the exposure time and pos...

Antoine Tiya Djowe; Samuel Laminsi…

2013-08-01T23:59:59.000Z

49

Carbon nanostructures production by AC arc discharge plasma process at atmospheric pressure  

Science Journals Connector (OSTI)

Carbon nanostructures have received much attention for a wide range of applications. In this paper, we produced carbon nanostructures by decomposition of benzene using AC arc discharge plasma process at atmospheric pressure. Discharge was carried out ...

Shenqiang Zhao; Ruoyu Hong; Zhi Luo; Haifeng Lu; Biao Yan

2011-01-01T23:59:59.000Z

50

E-Print Network 3.0 - assisted plasma arc Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Groupe d'Optique Atomique Collection: Physics 8 Gliding arc in tornado using a reverse vortex flow Chiranjeev S. Kalra, Young I. Cho,a Summary: . Instead the ignition was plasma...

51

Glow discharge plasma deposition of thin films  

DOE Patents [OSTI]

A glow discharge plasma reactor for deposition of thin films from a reactive RF glow discharge is provided with a screen positioned between the walls of the chamber and the cathode to confine the glow discharge region to within the region defined by the screen and the cathode. A substrate for receiving deposition material from a reactive gas is positioned outside the screened region. The screen is electrically connected to the system ground to thereby serve as the anode of the system. The energy of the reactive gas species is reduced as they diffuse through the screen to the substrate. Reactive gas is conducted directly into the glow discharge region through a centrally positioned distribution head to reduce contamination effects otherwise caused by secondary reaction products and impurities deposited on the reactor walls.

Weakliem, Herbert A. (Pennington, NJ); Vossen, Jr., John L. (Bridgewater, NJ)

1984-05-29T23:59:59.000Z

52

What we know and what we do not know about plasma arc cutting  

Science Journals Connector (OSTI)

After a brief history of plasma arc cutting (PAC) is given, its types and abilities are discussed. Experimental data (unfortunately, little is available) on plasma parameters are reviewed. The status of contemporary understanding of the process involved in PAC is presented. The main emphasis is on those processes that determine the technological abilities of the method. Along with the existing theories reviewed, we propose qualitative hypotheses on some of these processes. Among them are: dependence of the cyclic cathode erosion on the rate of current increase, double arcing and the role of insulating inclusions at the nozzle orifice on double arcing, dross formation and the shape of the kerf.

V A Nemchinsky; W S Severance

2006-01-01T23:59:59.000Z

53

Application of electrostatic Langmuir probe to atmospheric arc plasmas producing nanostructures  

SciTech Connect (OSTI)

The temporal evolution of a high pressure He arc producing nanotubes was considered and the Langmuir probe technique was applied for plasma parameter measurements. Two modes of arc were observed: cathodic arc where discharge is supported by erosion of cathode material and anodic arc which is supported by ablation of the anode packed with carbon and metallic catalysts in which carbon nanotubes are synthesized. Voltage-current (V-I) characteristics of single probes were measured and unusually low ratio of saturation current on positively biased probe to that on negatively biased of about 1-4 was observed. This effect was explained by increase of measured current at the negatively biased probe above the level of ion saturation current due to secondary electron emission from the probe surface. Since utilization of standard collisionless approach to determine plasma parameters from the measured V-I characteristic is not correct, the electron saturation current was used to estimate the plasma density.

Shashurin, A.; Li, J.; Zhuang, T.; Keidar, M. [Department of Mechanical and Aerospace Engineering, School of Engineering and Applied Science, George Washington University, Washington, District of Columbia 20052 (United States); Beilis, I. I. [School of Electrical Engineering, Tel Aviv University, Ramat Aviv 69978 (Israel)

2011-07-15T23:59:59.000Z

54

Atmospheric Plasma Deposited Dense Silica Coatings on Plastics  

Science Journals Connector (OSTI)

Atmospheric Plasma Deposited Dense Silica Coatings on Plastics ... (8) Finally, some plasma techniques including atmospheric plasmas work at low gas temperature, are suitable for treating plastics with low glass transition temperatures, and can even be used on biological samples. ... These results suggest that the mechanism in the atm.-pressure plasma is the same as that in low-pressure plasmas. ...

Linying Cui; Alpana N. Ranade; Marvi A. Matos; Liam S. Pingree; Theo J. Frot; Geraud Dubois; Reinhold H. Dauskardt

2012-11-26T23:59:59.000Z

55

Heat flux characteristics in an atmospheric double arc argon plasma jet  

SciTech Connect (OSTI)

In this study, the axial evolution of heat flux excited by a double arc argon plasma jet impinging on a flat plate is determined, while the nonstationary behavior of the heat flux is investigated by combined means of the fast Fourier transform, Wigner distribution, and short-time Fourier transform. Two frequency groups (<1 and 2-10 kHz) are identified in both the Fourier spectrum and the time-frequency distributions, which suggest that the nature of fluctuations in the heat flux is strongly associated with the dynamic behavior of the plasma arc and the engulfment of ambient air into different plasma jet regions.

Tu Xin; Yu Liang; Yan Jianhua; Cen Kefa [Zhejiang University, Hangzhou 310027 (China); Cheron, Bruno [UMR 6614 CNRS CORIA, Saint Etienne du Rouvray 76801 (France)

2008-10-13T23:59:59.000Z

56

Gnrateur Plasma d'Arc Air de 2 kW ABDERRAHMANE HALIS1  

E-Print Network [OSTI]

1 Générateur à Plasma d'Arc à Air de 2 kW ABDERRAHMANE HALIS1 , BERNARD PATEYRON2 , MOHAMMED EL : Une torche plasma d'arc à air de moins de 2 kW a été conçue et réalisée dans le laboratoire de imposent l'usage d'une flamme plasma : soudage, découpage, rechargement de métaux, traitement thermique de

Boyer, Edmond

57

A forevacuum pulse arc-discharge-based plasma electron source  

Science Journals Connector (OSTI)

An arc-discharge-based electron source is described, which is designed for forming a pulsed wideaperture electron beam in the forevacuum pressure range (4...2 in the submillisecond range of pulse durations. The c...

A. V. Kazakov; V. A. Burdovitsin; A. V. Medovnik…

2013-11-01T23:59:59.000Z

58

Atmospheric Plasma Deposition of Diamond-like Carbon Coatings  

SciTech Connect (OSTI)

There is great demand for thin functional coatings in the semiconductor, optics, electronics, medical, automotive and aerospace industries [1-13]. As fabricated components become smaller and more complex, the properties of the materials’ surface take on greater importance. Thin coatings play a key role in tailoring surfaces to give them the desired hardness, wear resistance, chemical inertness, and electrical characteristics. Diamond-like carbon (DLC) coatings possess an array of desirable properties, including outstanding abrasion and wear resistance, chemical inertness, hardness, a low coefficient of friction and exceptionally high dielectric strength [14-22]. Diamond-like carbon is considered to be an amorphous material, containing a mixture of sp2 and sp3 bonded carbon. Based on the percentage of sp3 carbon and the hydrogen content, four different types of DLC coatings have been identified: tetrahedral carbon (ta-C), hydrogenated amorphous carbon (a-C:H) hard, a-C:H soft, and hydrogenated tetrahedral carbon (ta-C:H) [20,24,25]. Possessing the highest hardness of 80 GPa, ta-C possesses an sp3 carbon content of 80 to 88u%, and no appreciable hydrogen content whereas a-C:H soft possesses a hardness of less than 10 GPa, contains an sp3 carbon content of 60% and a hydrogen content between 30 to 50%. Methods used to deposit DLC coatings include ion beam deposition, cathodic arc spray, pulsed laser ablation, argon ion sputtering, and plasma-enhanced chemical vapor deposition [73-83]. Researchers contend that several advantages exist when depositing DLC coatings in a low-pressure environment. For example, ion beam processes are widely utilized since the ion bombardment is thought to promote denser sp3-bonded carbon networks. Other processes, such as sputtering, are better suited for coating large parts [29,30,44]. However, the deposition of DLC in a vacuum system has several disadvantages, including high equipment cost and restrictions on the size and shape of material that may be treated. The deposition of DLC at atmospheric pressure has been demonstrated by several researchers. Izake, et al [53] and Novikov and Dymont [54] have demonstrated an electrochemical process that is carried out with organic compounds such as methanol and acetylene dissolved in ammonia. This process requires that the substrates be immersed in the liquid [53-54]. The atmospheric pressure deposition of DLC was also demonstrated by Kulik, et al. utilizing a plasma torch. However, this process requires operating temperatures in excess of 800 oC [55]. In this report, we investigate the deposition of diamond-like carbon films using a low temperature, atmospheric pressure plasma-enhanced chemical vapor deposition (PECVD) process. The films were characterized by solid-state carbon-13 nuclear magnetic resonance (13C NMR) and found to have a ratio of sp2 to sp3 carbon of 43 to 57%. The films were also tested for adhesion, coefficient of friction, and dielectric strength.

Ladwig, Angela

2008-01-23T23:59:59.000Z

59

Micro arc oxidation and electrophoretic deposition effect on damping and sound transmission characteristics of AZ31B magnesium alloy  

Science Journals Connector (OSTI)

Micro arc oxidation (MAO) and electrophoretic deposition (EPD)...L ST) is improved in the stiffness control stage of the sound transmission verse frequency curve. To the samples by electrophoresis...

Zhi Luo ??; Zhi-yong Hao ???; Bai-ling Jiang ???…

2014-09-01T23:59:59.000Z

60

Fullerene Formation in Carbon Arc:? Electrode Gap Dependence and Plasma Spectroscopy  

Science Journals Connector (OSTI)

The arc discharge technique is presently considered the most efficient method for the production of fullerene. ... The experiments were carried out in a fullerene arc reactor operating in a semi-continuous fashion, described previously in detail by Huczko et al.20 On the basis of earlier work,20-22 the parameters, ac or dc feeding mode, input power, buffer gas, and pressure, were optimized and electrode gaps between 0.5 and 4 mm were used for dc arcing. ... The interelectrode gap strongly influences the electric properties of the arc and characteristics of generated carbon plasma as well as the radiation level and heat exchange between the plasma and the surrounding high-temperature zone. ...

Andrzej Huczko; Hubert Lange; Przemyslaw Byszewski; Magdalena Poplawska; Andrzej Starski

1997-02-13T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


61

Mechanism of Synthesis of Ultra-Long Single Wall Carbon Nanotubes in Arc Discharge Plasma  

SciTech Connect (OSTI)

In this project fundamental issues related to synthesis of single wall carbon nanotubes (SWNTs), which is relationship between plasma parameters and SWNT characteristics were investigated. Given that among plasma-based techniques arc discharge stands out as very advantageous in several ways (fewer defects, high flexibility, longer lifetime) this techniques warrants attention from the plasma physics and plasma technology standpoint. Both experimental and theoretical investigations of the plasma and SWNTs synthesis were conducted. Experimental efforts focused on plasma diagnostics, measurements of nanostructures parameters, and nanoparticle characterization. Theoretical efforts focused to focus on multi-dimensional modeling of the arc discharge and single wall nanotube synthesis in arc plasmas. It was demonstrated in experiment and theoretically that controlling plasma parameters can affect nanostucture synthesis altering SWNT properties (length and diameter) and leading to synthesis of new structures such as a few-layer graphene. Among clearly identified parameters affecting synthesis are magnetic and electric fields. Knowledge of the plasma parameters and discharge characteristics is crucial for ability to control synthesis process by virtue of both magnetic and electric fields. New graduate course on plasma engineering was introduced into curriculum. 3 undergraduate students were attracted to the project and 3 graduate students (two are female) were involved in the project. Undergraduate student from Historically Black University was attracted and participated in the project during Summer 2010.

Keidar, Michael [George Washington University] [George Washington University

2013-06-23T23:59:59.000Z

62

Pulsed plasma-Used injection sources for remote plasma activated chemical vapor deposition  

E-Print Network [OSTI]

Pulsed plasma- Used injection sources for remote plasma activated chemical vapor deposition Mark J, Urbana, Illinois 61801 (Received 21 October 1992; accepted for publication 12 January 1993) Remote plasma the substrate is immersed in the plasma. This selectivity can be compromised if the deposition gases, which

Kushner, Mark

63

Shapes of Spectral Lines of Nonuniform Plasma of Electric Arc Discharge Between Copper Electrodes  

SciTech Connect (OSTI)

The radial profiles of the temperature and electron density in the plasma of the free burning electric arc between copper electrodes are studied by optical spectroscopy techniques. The electron density and the temperature in plasma as initial parameters were used in the calculation of the plasma composition in local thermodynamic equilibrium (LTE) assumption. We used the Saha's equation for copper, nitrogen and oxygen, dissociation equation for nitrogen and oxygen, the equation of plasma electrical neutrality and Dalton's law as well. So, it would be possible to determine the amounts of metal vapours in plasma.

Babich, Ida L.; Boretskij, Viacheslav F.; Veklich, Anatoly N. [Radiophysics Faculty, Taras Shevchenko Kyiv National University, 64, Volodymyrs'ka Str., Kyiv 01033 (Ukraine)

2007-09-28T23:59:59.000Z

64

Investigation on oblique shock wave control by arc discharge plasma in supersonic airflow  

SciTech Connect (OSTI)

Wedge oblique shock wave control by arc discharge plasma in supersonic airflow was investigated theoretically, experimentally, and numerically in this paper. Using thermal choking model, the change in oblique shock wave was deduced, which refer that the start point of shock wave shifts upstream, the shock wave angle decreases, and its intensity weakens. Then the theoretical results were validated experimentally in a Mach 2.2 wind tunnel. On the test conditions of arc discharge power of approx1 kW and arc plasma temperature of approx3000 K, schlieren photography and gas pressure measurements indicated that the start point of shock wave shifted upstream of approx4 mm, the shock wave angle decreased 8.6%, and its intensity weakened 8.8%. The deduced theoretical results match the test results qualitatively, so thermal mechanism and thermal choking model are rational to explain the problem of oblique shock wave control by arc discharge plasma. Finally, numerical simulation was developed. Based on thermal mechanism, the arc discharge plasma was simplified as a thermal source term that added to the Navier-Stokes equations. The simulation results of the change in oblique shock wave were consistent with the test results, so the thermal mechanism indeed dominates the oblique shock wave control process.

Wang Jian; Li Yinghong [Engineering College, Air Force Engineering University, Xi'an 710038 (China); Xing Fei [College of Economics and Management, Northwest University of Politics and Law, Xi'an 710063 (China)

2009-10-01T23:59:59.000Z

65

Spectroscopy peculiarities of thermal plasma of electric arc discharge between electrodes with Zn admixtures  

Science Journals Connector (OSTI)

Abstract Plasma of the free burning electric arc between Ag–SnO2–ZnO composite electrodes as well as brass electrodes were investigated. The plasma temperature distributions were obtained by Boltzmann plot method involving Cu I, Ag I or Zn I spectral line emissions. The electron density distributions were obtained from the width and from absolute intensity of spectral lines. The laser absorption spectroscopy was used for measurement of copper atom concentration in plasma. Plasma equilibrium composition was calculated using two independent groups of experimental values (temperature and copper atom concentration, temperature and electron density). It was found that plasma of the free burning electric arc between brass electrodes is in local thermodynamical equilibrium. The experimental verification of the spectroscopic data of Zn I spectral lines was carried out.

R.V. Semenyshyn; A.N. Veklich; I.L. Babich; V.F. Boretskij

2014-01-01T23:59:59.000Z

66

Emission and Absorption Spectroscopy of Carbon Arc Plasma during Formation of Carbon Magnetic Encapsulates  

SciTech Connect (OSTI)

Plasma diagnostics of carbon arc discharge under conditions of carbon magnetic encapsulates formation was performed by emission and absorption spectroscopy. Content of C{sub 2} and Fe species, rotational temperatures of excited (d {sup 3} product {sub g}) and non-excited (a {sup 3} product {sub u}) states, and excitation temperatures of a {sup 5}F and a {sup 3}F levels relatively to the a {sup 5}D level of Fe atoms were determined. The results pointed to a non-equilibrium state of carbon arc plasma under prevailing discharge conditions.

Lange, H.; Labedz, O.; Huczko, A.; Bystrzejewski, M. [Faculty of Chemistry, Warsaw University, Pasteur str. 1,02-093 Warsaw (Poland)

2011-11-29T23:59:59.000Z

67

Arc plasma generator of atomic driver for steady-state negative ion source  

SciTech Connect (OSTI)

The paper reviews the results of development of steady-state arc-discharge plasma generator with directly heated LaB{sub 6} cathode. This arc-discharge plasma generator produces a plasma jet which is to be converted into an atomic one after recombination on a metallic plate. The plate is electrically biased relative to the plasma in order to control the atom energies. Such an intensive jet of hydrogen atoms can be used in negative ion sources for effective production of negative ions on a cesiated surface of plasma grid. All elements of the plasma generator have an augmented water cooling to operate in long pulse mode or in steady state. The thermo-mechanical stresses and deformations of the most critical elements of the plasma generator were determined by simulations. Magnetic field inside the discharge chamber was optimized to reduce the local power loads. The first tests of the steady-state arc plasma generator prototype have performed in long-pulse mode.

Ivanov, A. A.; Belchenko, Yu. I.; Davydenko, V. I. [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation) [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation); Novosibirsk State University, Novosibirsk (Russian Federation); Ivanov, I. A.; Kolmogorov, V. V.; Listopad, A. A., E-mail: a.a.listopad@inp.nsk.su; Mishagin, V. V.; Shulzhenko, G. I. [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation)] [Budker Institute of Nuclear Physics, Novosibirsk (Russian Federation); Putvinsky, S. V.; Smirnov, A. [Tri Alpha Energy Inc., Rancho Santa Margarita, California 92688 (United States)] [Tri Alpha Energy Inc., Rancho Santa Margarita, California 92688 (United States)

2014-02-15T23:59:59.000Z

68

Ion bombardment in silane VHF deposition plasmas  

SciTech Connect (OSTI)

The measurement of mass resolved ion energy distributions at the grounded substrate in an RF glow discharge allows to determine the ion flux and the ion energy flux towards the surface of a growing hydrogenated amorphous silicon (a-Si:H) layer. This provides the means to study the influence of ions on the structural properties of a-Si:H. Here the authors focus on the {alpha}-{gamma}{prime} transition as occurs in silane-hydrogen plasmas at an RF frequency of 50 MHz and a substrate temperature of 250 C. The structural properties of the layers appear to depend on the kinetic energy of the arriving ions. This is supported by measurements of ion fluxes under other deposition conditions and by characterization of the corresponding layers. The influence of ions on the growth is discussed in terms of their flux, and the amount of delivered kinetic and potential energy to the growing film. The measurements suggest that a threshold energy of about 5 eV per deposited atom is needed for the construction of a dense amorphous silicon network.

Hamers, E.A.G.; Bezemer, J.; Meiling, H.; Van Sark, W.G.J.H.M.; Van Der Weg, W.F.

1997-07-01T23:59:59.000Z

69

A parameter design of CNC plasma-arc cutting of carbon steel plates using robust design  

Science Journals Connector (OSTI)

An optimisation of the cutting parameters during CNC plasma-arc cutting of St37 mild steel plates is attempted using robust design. The process parameters tested were plate thickness, cutting speed, arc ampere, arc voltage, air pressure, pierce height, and torch standoff distance. An orthogonal matrix experiment [L18 (21 × 37) ] was conducted and the right bevel angle was measured and optimised according to the process parameters using an analysis of means and an analysis of variances. The results show that the arc ampere has an effect mainly on the bevel angle (50.89%), while the plate thickness and torch standoff distance also have an influence of 6.22 and 15.9% respectively. The other parameters have an F factor smaller than one, and thus their variations do not significantly affect the bevel angle in the experimental region. Finally, an additive model was applied on the experimental results to predict the optimum combination and was compared with actual values.

John Kechagias; Michael Billis; Stergios Maropoulos

2010-01-01T23:59:59.000Z

70

Optimization of the output and efficiency of a high power cascaded arc hydrogen plasma source  

SciTech Connect (OSTI)

The operation of a cascaded arc hydrogen plasma source was experimentally investigated to provide an empirical basis for the scaling of this source to higher plasma fluxes and efficiencies. The flux and efficiency were determined as a function of the input power, discharge channel diameter, and hydrogen gas flow rate. Measurements of the pressure in the arc channel show that the flow is well described by Poiseuille flow and that the effective heavy particle temperature is approximately 0.8 eV. Interpretation of the measured I-V data in terms of a one-parameter model shows that the plasma production is proportional to the input power, to the square root of the hydrogen flow rate, and is independent of the channel diameter. The observed scaling shows that the dominant power loss mechanism inside the arc channel is one that scales with the effective volume of the plasma in the discharge channel. Measurements on the plasma output with Thomson scattering confirm the linear dependence of the plasma production on the input power. Extrapolation of these results shows that (without a magnetic field) an improvement in the plasma production by a factor of 10 over where it was in van Rooij et al. [Appl. Phys. Lett. 90, 121501 (2007)] should be possible.

Vijvers, W. A. J.; Gils, C. A. J. van; Goedheer, W. J.; Meiden, H. J. van der; Veremiyenko, V. P.; Westerhout, J.; Lopes Cardozo, N. J.; Rooij, G. J. van [FOM-Institute for Plasma Physics Rijnhuizen, Association EURATOM-FOM, Trilateral Euregio Cluster, P.O. Box 1207, 3430 BE Nieuwegein (Netherlands); Schram, D. C. [Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)

2008-09-15T23:59:59.000Z

71

An interchangeable-cathode vacuum arc plasma source David K. Olson,a  

E-Print Network [OSTI]

design based on metal vapor vacuum arc MeVVA concepts is employed as a plasma source for a study of a 7 using a boron-carbide disk as the cathode target. The design is simplified from typical designs with a proton beam. We create our 7 Be on the surface of a sample of enriched boron carbide. Because 7

Hart, Gus

72

Plasma Arc Technology Dedicated to Solving Military Waste Problems  

E-Print Network [OSTI]

mobile plasma unit designed for asbestos destruction would be feasible and commercially competitive. Phase II of the CPAR project involved supporting the developmental efforts to design a mobile plasma asbestos pyrolysis system (pAPS)7.31. PAPS is a... mobile plasma asbestos pyrolysis system (pAPS). PAPS is a truck-mounted furnace for the safe, on-site, thermal treatment of ACM. ACM wastes taken directly from public and commercial buildings were plasma treated at the Georgia Institute of Technology...

Smith, E. D.; Zaghloul, H. H.

73

A General Theory of the Plasma of an Arc  

Science Journals Connector (OSTI)

The conception of random positive ion velocities corresponding to ion temperatures in a plasma has serious theoretical difficulties and is lacking in direct experimental verification. It is more reasonable to assume that each ion starts from rest and subsequently possesses only the velocity which it acquires by falling through a static electric field which is itself maintained by the balance of electron and ion charges. This new viewpoint thus ascribes motions to the positive ions which, for long free paths, are ordered rather than chaotic, each negative body in contact with the discharge collecting ions from a definite region of the plasma and from it only. The resulting integral ? the plasma-sheath potential distribution have been set up for plane, cylindrical, and spherical plasmas, for long, short and intermediate length ion free paths, and for both constant rate of ionization throughout the plasma and rate proportional to electron density, and these equations have been solved for the potential distribution in the plasma in all important cases. The case of short ion free paths in a cylinder with ion generation proportional to electron density gives the same potential distribution as found for the positive column by Schottky using his ambipolar diffusion theory, with the advantages that ambipolarity and quasineutrality need not appear as postulates. The calculated potential distribution agrees with that found experimentally. The potential difference between center and edge of plasma approximates Te11,600 volts in all long ion free path cases. The theory yields two equations. One, the ion current equation, simply equates the total number of ions reaching the discharge tube wall to the total number of ions generated in the plasma, but it affords a new method of calculating the density of ionization. The second, the plasma balance equation, relates rate of ion generation, discharge tube diameter (in the cylindrical case), and electron temperature. It can be used to calculate the rate of ion generation, the resulting values checking (to order of magnitude) those calculated from one-stage ionization probabilities. The potential difference between the center of the plasma and a non-conducting bounding wall as calculated from the ion current equation agrees with that found experimentally.The solution of the general plasma-sheath equation has been extended into the sheath surrounding the plasma to determine the first order correction which is to be subtracted from the discharge tube radius to obtain the plasma radius. The wall sheath in the positive column is several times the thickness given by the simple space charge equation.Actually the ions do not start from rest when formed but have small random velocities corresponding to the gas temperature, Tg. In the long ion free path cases this leads to an error of the order of only TgTe in the calculated potential distributions.In the plasma surrounding a fine negatively charged probe wire the potential difference between plasma potential maximum and sheath edge may be so small that the ions generated within the plasma potential maximum are not trapped but can traverse the maximum by virtue of their finite initial velocities. This justifies the use of a sufficiently fine negatively charged wire in the usual way to measure positive ion concentrations, although certain difficulties appear which are thought to be connected with the collector theory rather than the present plasma theory.

Lewi Tonks and Irving Langmuir

1929-09-15T23:59:59.000Z

74

Long-pulse arc-discharge plasma source with cold cathode for diagnostic neutral beam injector  

SciTech Connect (OSTI)

Long-pulse cold cathode arc-discharge plasma generators have been successfully used as high-quality hydrogen ion sources for plasma diagnostic neutral beams. One of the main advantages of this type of plasma source is a high proton fraction (80%-90%). However, the lifetime of the plasma source is limited due to intensive electrode's erosion, especially at the cathode region. An optimized design of the cathode and the nearest electrodes is found which reduces the erosion and allows us to increase the pulse length. The plasma source produces the extracted ion current up to 3 A at a low angular divergence, and at the pulse duration up to 2 s.

Deichuli, P. P.; Ivanov, A. A.; Stupishin, N. V. [Budker Institute of Nuclear Physics, Novosibirsk 630090 (Russian Federation)

2008-02-15T23:59:59.000Z

75

High rate deposition of microcrystalline silicon films by high-pressure radio frequency plasma enhanced chemical vapor deposition (PECVD)  

Science Journals Connector (OSTI)

Hydrogenated microcrystalline silicon (?c-Si:H) thin films were prepared by high-pressure radio-frequency (13.56 MHz) plasma enhanced chemical vapor deposition (rf-PECVD) with a screened plasma. The deposition ra...

BingQing Zhou; MeiFang Zhu; FengZhen Liu…

2008-04-01T23:59:59.000Z

76

Combined filtered cathodic arc etching pretreatment-magnetron sputter deposition of highly adherent CrN films  

SciTech Connect (OSTI)

CrN films were prepared on steel substrates by a hybrid method utilizing filtered cathodic arc for Cr ion pretreatment and magnetron sputtering for coating deposition. During pretreatment the substrates were biased to -1200 V and exposed to filtered chromium plasma. The substrate-coating interface formed during the pretreatment contained a Cr-enriched modified layer with composition that was strongly influenced by the temperature of the substrate as observed by scanning transmission electron microscopy--energy dispersive spectroscopy. The modified layer had a nanocrystalline morphology and thickness of 15 nm. The path of formation of the layer is linked to the combined action of implantation, diffusion, and resputtering. The resulting adhesion of 3 {mu}m thick CrN films was very high with scratch test critical load values of 83 N. The morphology of the films was smooth without large scale defects and the microstructure was columnar. The coatings behaved well in dry sliding tests with very low wear coefficients of 2.3x10{sup -16} m{sup 3} N{sup -1} m{sup -1}, which can be linked to the high adhesion and defect-free microstructure. The smooth coatings also had a high resistance to corrosion as demonstrated by potentiodynamic tests with particularly high pitting potentials of +800 mV.

Ehiasarian, A. P.; Anders, A.; Petrov, I. [Materials and Engineering Research Institute, Sheffield Hallam University, Howard St., Sheffield S1 1WB (United Kingdom); Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)

2007-05-15T23:59:59.000Z

77

Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication  

DOE Patents [OSTI]

A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing. 8 figs.

Brown, I.G.; MacGill, R.A.; Galvin, J.E.; Ogletree, D.F.; Salmeron, M.

1998-11-24T23:59:59.000Z

78

Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication  

DOE Patents [OSTI]

A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.

Brown, Ian G. (Berkeley, CA); MacGill, Robert A. (Richmond, CA); Galvin, James E. (Emmeryville, CA); Ogletree, David F. (El Cerrito, CA); Salmeron, Miquel (El Cerrito, CA)

1998-01-01T23:59:59.000Z

79

Deposition of Plasma Polymer Films by an Atmospheric Pressure Glow Discharge  

Science Journals Connector (OSTI)

Plasma assisted chemical vapor deposition is a proven ... . The application of non-thermal low pressure plasmas containing organic compounds for thin film deposition by plasma polymerization is well known1.... Th...

Rüdiger Foest; Florian Sigeneger; Martin Schmidt

2001-01-01T23:59:59.000Z

80

Formation of cobalt silicide from filter metal vacuum arc deposited films  

SciTech Connect (OSTI)

The thermal reaction of Co film deposited on Si (111) surfaces by a high current filter metal vacuum arc (FMEVAD) system has been studied. After deposition the films were annealed over the 400-900 C temperature range for 30 min. Rutherford Backscattering Spectrometry (RBS) was used to characterize the elemental depth distributions in the films subjected to different annealing temperatures. Ordered chemical phases were determined by glancing-incidence X-ray diffraction (GIXRD) and the morphology was determined by cross section transmission electron microscopy (TEM). The results show that the phases formed are Co2Si at 400 C, CoSi + CoO at 500 C, CoSi + CoSi2 at 600 C, and CoSi2 at (700-800 C). At 900 C, CoSi2 was formed with a mixture of cubic cobalt and probably an amorphous cobalt oxide surface layer. The interface morphology was a rough cusp-like crenellation at 600 C which became less pronounced after annealing at 800 C.

Whitlow, Harry J.; Zhang, Yanwen; Wang, Chong M.; McCready, David E.; Zhang, Tonghe; Wu, Yuguang

2006-06-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


81

Spatial and time-dependent distribution of plasma parameters in the metal-halide arc lamp  

E-Print Network [OSTI]

It was shown by several authors that closed high pressure arc a.c. discharge in mercury vapors with addition of metal halide cannot be described in frames of the local thermodynamic equilibrium (LTE) model. However some plasma parameters (electron and high lying excited states densities as well as Hg metastable levels densities) are assumed to be in equilibrium with electron temperature and these assumptions are applied in plasma diagnostics. To verify these supposition the method of local plasma spectroscopy based on spatial and temporal distribution of spectral line profiles was developed. The experimental set up is based on diffraction spectrometer with large aperture, spatial scanning device and photodetector, which allows to carry out the measurements in chosen phases of current period. The software for data acquisition and processing is based on LabVIEW system. The original method of joint data processing was applied to data arrays containing spatial, spectral and temporal distribution of a source surfa...

Khakhaev, A; Ekimov, K; Soloviev, A; Khakhaev, Anatoly; Luizova, Lidia; Ekimov, Konstantin; Soloviev, Alexey

2004-01-01T23:59:59.000Z

82

Effect of cerium ions in an arc peripheral plasma on the growth of radial single-walled carbon nanotubes  

SciTech Connect (OSTI)

Radial single-walled carbon nanotubes (radial SWCNTs) are formed by using a direct current (dc) arc discharge when carbon and metal atoms are mixed in a gas phase after the vaporization and cooled together in a liquid droplet. Since SWCNTs sprout through the precipitation of saturated carbon atoms from liquid droplets during cooling, a mass synthesis of radial SWCNTs can be achieved when a large number of liquid droplets are generated. In order to understand the effects of arc peripheral plasma parameters (electrons, ions, radical atoms, and molecules) on the growth of radial SWCNTs, the optimum production efficiency of radial SWCNTs is investigated by superimposing a radio-frequency (rf) plasma on the thermal arc plasma and controlling the arc peripheral plasma density. Two parameters--the rf power and the dc potential--of the rf electrode, which is equipped above 20 mm from the center of an arc-discharge point, are changed with the constant He pressure (200 Torr), dc arc current (75 A), and power (2000 W). The production yield of radial SWCNTs is found to be enhanced under the condition of the rf power of 100 W and the dc component of the rf electrode voltage of -22 V, revealing that the optimum ion flux and ion bombardment energy are important key parameters for the formation of radial SWCNTs.

Sato, Y.; Motomiya, K.; Jeyadevan, B.; Tohji, K.; Sato, G.; Ishida, H.; Hirata, T.; Hatakeyama, R. [Graduate School of Environmental Studies, Tohoku University, Sendai 980-8579 (Japan); Department of Electronic Engineering, Tohoku University, Sendai 980-8579 (Japan)

2005-11-01T23:59:59.000Z

83

Unipolar arc simulation device  

SciTech Connect (OSTI)

We describe a simple laboratory device for establishing a vacuum arc plasma discharge that can serve to simulate a unipolar arc. The technique makes use of a triggered vacuum arc plasma gun to generate a plasma plume that in turn causes breakdown of a secondary discharge. The device is in fact a secondary vacuum arc discharge that is triggered by a primary vacuum arc discharge, with some of the features of the secondary plasma discharge having similarities with a unipolar arc configuration. Here we describe the experimental setup and outline how the device can be used for some areas of unipolar arc materials research. [copyright] [ital 1999 American Institute of Physics.

Wang, S.G.; Brown, I.G. (Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720 (United States))

1999-09-01T23:59:59.000Z

84

Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials  

Science Journals Connector (OSTI)

The atmospheric pressure plasmachemical vapor deposition(CVD) system has been developed to fabricate functional thin films at very high deposition rate. The atmospheric pressure plasma in which high-density radicals are created has been effectively used to depositthin films. Combination of the newly designed rotary electrode and the 150 MHz very high frequency power supply makes it possible not only to generate the high-density atmospheric pressure plasma but also to avoid ion bombardment against the film. By virtue of these noble characteristics of the system high quality films can be fabricated at an unprecedented high deposition rate. In order to demonstrate the effectiveness of the atmospheric pressure plasmaCVD system hydrogenated amorphous silicon (a- Si:H ) films were prepared in gas mixtures containing He H 2 and SiH 4 . The results showed that homogeneous a- Si:H films grew when substrates were heated at 200?°C. Extremely high deposition rate which was more than 100 times faster than that of the conventional low-pressure plasma CVD technique was realized.

Y. Mori; K. Yoshii; H. Kakiuchi; K. Yasutake

2000-01-01T23:59:59.000Z

85

Atmospheric plasma deposition of diamond-like carbon coatings Angela M. Ladwig a,b,  

E-Print Network [OSTI]

Atmospheric plasma deposition of diamond-like carbon coatings Angela M. Ladwig a,b, , Ronald D Available online xxxx Keywords: Atmospheric pressure plasma Diamond-like carbon deposition DLC PECVD The atmospheric pressure plasma-enhanced chemical vapor deposition of diamond-like carbon (DLC) has been

Hicks, Robert F.

86

Generation of high charge state metal ion beams by electron cyclotron resonance heating of vacuum arc plasma in cusp trap  

SciTech Connect (OSTI)

A method for generating high charge state heavy metal ion beams based on high power microwave heating of vacuum arc plasma confined in a magnetic trap under electron cyclotron resonance conditions has been developed. A feature of the work described here is the use of a cusp magnetic field with inherent ''minimum-B'' structure as the confinement geometry, as opposed to a simple mirror device as we have reported on previously. The cusp configuration has been successfully used for microwave heating of gas discharge plasma and extraction from the plasma of highly charged, high current, gaseous ion beams. Now we use the trap for heavy metal ion beam generation. Two different approaches were used for injecting the vacuum arc metal plasma into the trap - axial injection from a miniature arc source located on-axis near the microwave window, and radial injection from sources mounted radially at the midplane of the trap. Here, we describe preliminary results of heating vacuum arc plasma in a cusp magnetic trap by pulsed (400 {mu}s) high power (up to 100 kW) microwave radiation at 37.5 GHz for the generation of highly charged heavy metal ion beams.

Nikolaev, A. G.; Savkin, K. P.; Oks, E. M.; Vizir, A. V.; Yushkov, G. Yu. [High Current Electronics Institute, Siberian Division of Russian Academy Science, Tomsk 634055 (Russian Federation); Vodopyanov, A. V.; Izotov, I. V.; Mansfeld, D. A. [Institute of Applied Physics, Russian Academy of Science, Nizhniy Novgorod 603950 (Russian Federation)

2012-02-15T23:59:59.000Z

87

Power Deposition on Tokamak Plasma-Facing Components  

E-Print Network [OSTI]

The SMARDDA software library is used to model plasma interaction with complex engineered surfaces. A simple flux-tube model of power deposition necessitates the following of magnetic fieldlines until they meet geometry taken from a CAD (Computer Aided Design) database. Application is made to 1) models of ITER tokamak limiter geometry and 2) MASTU tokamak divertor designs, illustrating the accuracy and effectiveness of SMARDDA, even in the presence of significant nonaxisymmetric ripple field. SMARDDA's ability to exchange data with CAD databases and its speed of execution also give it the potential for use directly in the design of tokamak plasma facing components.

Arter, Wayne; Fishpool, Geoff

2014-01-01T23:59:59.000Z

88

Kinetics and Properties of Micro Arc Oxidation Coatings Deposited on Commercial Al Alloys  

Science Journals Connector (OSTI)

The micro arc oxidation (MAO) technique is being increasingly recognized...6Si2O13 (mullite) is observed to form. With increasing Si content, the corresponding mullite phase also increases. Increasing mullite con...

L. Rama krishna; A. Sudha Purnima…

2007-02-01T23:59:59.000Z

89

Synthesis and Deposition of Nanoparticles Using a Hypersonically Expanded Plasma  

SciTech Connect (OSTI)

Si-Ti-N nanostructured coatings were synthesized by inertial impaction of nanoparticles using a process called hypersonic plasma particle deposition (HPPD). Transmission electron microscopy on samples prepared by focused ion beam (FIB) milling show TiN nanocrystallites in an amorphous matrix. X-ray photoelectron spectroscopy results indicate the presence of amorphous Si3N4 in similar films. In-situ particle size distribution measurements show that particle size distributions peak around 14 nm under typical operating conditions.

Hafiz, Jami; Wang Xiaoliang; Mukherjee, Rajesh; McMurry, Peter H.; Heberlein, Joachim V.R.; Girshick, Steven L. [Department of Mechanical Engineering, University of Minnesota, 111 Church Street SE, Minneapolis, MN (United States)

2005-10-31T23:59:59.000Z

90

2009 US-Japan Workshop on Advanced Simulation Methods in Plasma Physics Holistic Simulation of Auroral Arcs Formation  

E-Print Network [OSTI]

2009 US-Japan Workshop on Advanced Simulation Methods in Plasma Physics Holistic Simulation convection flow generated in the vicinity of the magnetospheric equator by the solar wind is expected) simulations on the basis of the feedback instability theory attempted to demonstrate the quiet auroral arcs

Ito, Atsushi

91

2D Axisymmetric Coupled CFD-kinetics Modeling of a Nonthermal Arc Plasma Torch for Diesel Fuel  

E-Print Network [OSTI]

-assisted diesel fuel reformer developed for two different applications: (i) onboard H2 production for fuel cell been also developed for different reforming reactors: solid oxide fuel cell (SOFC)7 , membrane reformer1 2D Axisymmetric Coupled CFD-kinetics Modeling of a Nonthermal Arc Plasma Torch for Diesel Fuel

Boyer, Edmond

92

Experimental investigation of supersonic low pressure air plasma flows obtained with different arc-jet operating conditions  

SciTech Connect (OSTI)

A stationary arc-jet plasma flow at low pressure is used to simulate some properties of the gas flow surrounding a vehicle during its entry into celestial body's atmospheres. This paper presents an experimental study concerning plasmas simulating a re-entry into our planet. Optical measurements have been carried out for several operating plasma conditions in the free stream, and in the shock layer formed in front of a flat cylindrical plate, placed in the plasma jet. The analysis of the spectral radiation enabled the identification of the emitting species, the determination of the rotational and vibrational temperatures in the free-stream and in the shock layer and the determination of the distance of the shock to the flat plate face. Some plasma fluid parameters like, stagnation pressure, specific enthalpy and heat flux have been determined experimentally along the plasma-jet axis.

Lago, Viviana; Ndiaye, Abdoul-Aziz [Laboratoire ICARE CNRS, 1C Av. de la Recherche Scientifique 45071 Orleans Cedex 2 (France)

2012-11-27T23:59:59.000Z

93

Dependence of thermal destabilization of electric-arc plasma in an air flow on discharge conditions  

Science Journals Connector (OSTI)

The effect of the conditions of electric-arc burning in an air flow on the ... processes in the development of instability in an arc-discharge column is shown.

V. N. Borisyuk; S. V. Goncharik…

1997-03-01T23:59:59.000Z

94

Gas Phase Electrodeposition: A Programmable Multimaterial Deposition Method for  

E-Print Network [OSTI]

plasma induced synthesis,11 and arc discharge12,13 can produce nanoparticles and nanow- ires of various-phase deposition process produces charged tungsten, and platinum and uses externally electrodeposition, arc discharge, atmospheric pressure gas phase deposition, nanoparticle nanostructured electrodes

Jacobs, Heiko O.

95

Enhanced Adhesion over Aluminum Solid Substrates by Controlled Atmospheric Plasma Deposition of Amine-Rich Primers  

Science Journals Connector (OSTI)

Enhanced Adhesion over Aluminum Solid Substrates by Controlled Atmospheric Plasma Deposition of Amine-Rich Primers ... Plasma polymer allylamine (pPAAm) films were deposited using a semidynamic DBD reactor at open atmosphere described elsewhere. ... In the past decade, the use of nonthermal plasmas for selective surface modification was a rapidly growing research field. ...

Julien Petersen; Thierry Fouquet; Marc Michel; Valérie Toniazzo; Aziz Dinia; David Ruch; João A. S. Bomfim

2012-01-25T23:59:59.000Z

96

Plasma Enhanced Chemical Vapor Deposition on Living Substrates: Development, Characterization, and Biological Applications  

E-Print Network [OSTI]

This dissertation proposed the idea of “plasma-enhanced chemical vapor deposition on living substrates (PECVD on living substrates)” to bridge the gap between the thin film deposition technology and the biological and living substrates. This study...

Tsai, Tsung-Chan 1982-

2012-12-05T23:59:59.000Z

97

Crystal Phase Transition of HfO2 Films Evaporated by Plasma Ion-Assisted Deposition  

Science Journals Connector (OSTI)

HfO2 films were evaluated by spectroscopic ellipsometry, indicating crystal phase transition due to plasma ion momentum transfer during deposition. The film inhomogeneity,...

Wang, Jue; Maier, Robert L; Schreiber, Horst

98

Surface hardening of metallic alloys by electrospark deposition followed by plasma nitriding .  

E-Print Network [OSTI]

??This paper presents the results of a study concerned with the surface hardening of nonferrous and ferrous alloys, by integrating the electrospark deposition and plasma… (more)

Béjar Vega, Marco

2006-01-01T23:59:59.000Z

99

The growth characteristics of microcrystalline Si thin film deposited by atmospheric pressure plasma-enhanced chemical vapor deposition  

Science Journals Connector (OSTI)

Microcrystalline silicon thin film was grown by atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) ... with a cylindrical rotary electrode supplied with 150 MHz very-high-frequency power. T...

Jung-Dae Kwon

2013-11-01T23:59:59.000Z

100

Tailored Distribution of Single-Wall Carbon Nanotubes from Arc Plasma Synthesis Using Magnetic Fields  

Science Journals Connector (OSTI)

We would like to acknowledge PPPL Offsite Research Program supported by the Office of Fusion Energy Sciences for supporting arc experiments. ...

Olga Volotskova; Jeffrey A. Fagan; Ji Yeon Huh; Frederick R. Phelan Jr.; Alexey Shashurin; Michael Keidar

2010-08-13T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


101

Deposition and current conduction of mixed hexagonal and cubic phases of AlN/p-Si films prepared by vacuum arc discharge: Effect of deposition temperature  

Science Journals Connector (OSTI)

Abstract Cubic and hexagonal AlN films have been prepared by vacuum arc discharge technique at different deposition temperatures 100, 200 and 300 °C. The depositions were carried out from pure aluminum targets under nitrogen gas on p-type Si substrates, with Al forming the gate in a metal–insulator–semiconductor configuration. Preferential orientations (111) and (002) of the cubic and hexagonal phases have been affirmed by X-ray diffraction analysis. The Fourier transform infrared spectra revealed the manifestation of the two phases as well. The effect of deposition temperature on the crystalline quality and texture of the films has been also investigated and the grain size of which, has been evaluated as a function of temperature. The best crystalline quality i.e., largest grain size was found to be at 200 °C. The composition and stoichiometry of the films have been determined by the time-of-flight elastic recoil detection analysis (TOF-ERDA) and Rutherford backscattering techniques. The Al/N ratio was found to be around 1, while the O content was less than 1.8%. Scanning electron microscopy and TOF-ERDA measurements demonstrated films thickness of 260 nm. Current density versus electric field and capacitance–voltage (C–V) measurements were also investigated to reveal the field emission and conduction mechanism of the Al/AlN/p-Si devices. Schottky, Pool–Frenkel and Fowler–Nordheim conduction have been found to contribute to the electron transport, and the best emission properties were manifested at 200 °C with a highest current density 525 ?A/cm2 at a field 71 V/?m. From C–V curves, the density of traps has been estimated to be 18 × 109 cm? 2 eV? 1 indicating a good quality of the deposited films.

B. Abdallah; S. Al-Khawaja; A. Alkhawwam; I.M. Ismail

2014-01-01T23:59:59.000Z

102

Comparative study of two- and three-dimensional modeling on arc discharge phenomena inside a thermal plasma torch with hollow electrodes  

SciTech Connect (OSTI)

A comparative study between two- and three-dimensional (2D and 3D) modeling is carried out on arc discharge phenomena inside a thermal plasma torch with hollow electrodes, in order to evaluate the effects of arc root configuration characterized by either 2D annular or 3D highly localized attachment on the electrode surface. For this purpose, a more precise 3D transient model has been developed by taking account of 3D arc current distribution and arc root rotation. The 3D simulation results apparently reveal that the 3D arc root attachment brings about the inherent 3D and turbulence nature of plasma fields inside the torch. It is also found that the constricted arc column near the vortex chamber plays an important role in heating and acceleration of injected arc gases by concentrating arc currents on the axis of the hollow electrodes. The inherent 3D nature of arc discharge is well preserved inside the cathode region, while these 3D features slowly diminish behind the vortex chamber where the turbulent flow begins to be developed in the anode region. Based on the present simulation results, it is noted that the mixing effects of the strong turbulent flow on the heat and mass transfer are mainly responsible for the gradual relaxation of the 3D structures of plasma fields into the 2D axisymmetric ones that eventually appear in the anode region near the torch exit. From a detailed comparison of the 3D results with the 2D ones, the arc root configuration seems to have a significant effect on the heat transfer to the electrode surfaces interacting with the turbulent plasma flow. That is, in the 2D simulation based on an axisymmetric stationary model, the turbulence phenomena are fairly underestimated and the amount of heat transferred to the cold anode wall is calculated to be smaller than that obtained in the 3D simulation. For the validation of the numerical simulations, calculated plasma temperatures and axial velocities are compared with experimentally measured ones, and the 3D simulation turns out to be more accurate than the 2D simulation as a result of a relatively precise description of the turbulent phenomena inside the torch using a more realistic model of arc root attachment. Finally, it is suggested that the 3D transient formulation is indeed required for describing the real arc discharge phenomena inside the torch, while the 2D stationary approach is sometimes useful for getting practical information about the time-averaged plasma characteristics outside the torch because of its simplicity and rapidness in computation.

Kim, Keun Su; Park, Jin Myung; Choi, Sooseok; Kim, Jongin; Hong, Sang Hee [Department of Nuclear Engineering, Seoul National University, Seoul 151-742 (Korea, Republic of)

2008-02-15T23:59:59.000Z

103

Gyrocenter Shift of Low-Temperature Plasmas and the Retrograde Motion of Cathode Spots in Arc Discharges  

SciTech Connect (OSTI)

The gyrocenter shift phenomenon explained the mechanism of radial electric field formation at the high confinement mode transition in fusion devices. This Letter reports that the theory of gyrocenter shift is also applicable to low temperature high collisional plasmas such as arc discharges by the generalization of the theory resulting from a short mean free path compared with the gyroradius. The retrograde motion of cathode spots in the arc discharge is investigated through a model with the expanded formula of gyrocenter shift. It is found that a reversed electric field is formed in front of the cathode spots when they are under a magnetic field, and this reversed electric field generates a rotation of cathode spots opposite to the Amperian direction. The ion drift velocity profiles calculated from the model are in agreement with the experimental results as functions of magnetic flux density and gas pressure.

Lee, K. C. [Department of Applied Science, University of California, Davis, California 95616 (United States)

2007-08-10T23:59:59.000Z

104

High Charge State Ions Extracted from Metal Plasmas in the Transition Regime from Vacuum Spark to High Current Vacuum Arc  

SciTech Connect (OSTI)

Metal ions were extracted from pulsed discharge plasmas operating in the transition region between vacuum spark (transient high voltage of kV) and vacuum arc (arc voltage ~;; 20 V). At a peak current of about 4 kA, and with a pulse duration of 8 ?s, we observed mean ion charges states of about 6 for several cathode materials. In the case of platinum, the highest average charge state was 6.74 with ions of charge states as high as 10 present. For gold we found traces of charge state 11, with the highest average charge state of 7.25. At currents higher than 5 kA, non-metallic contaminations started to dominate the ion beam, preventing further enhancement of the metal charge states.

Yushkov, Georgy Yu.; Anders, A.

2008-06-19T23:59:59.000Z

105

Characterization of YSZ solid oxide fuel cells electrolyte deposited by atmospheric plasma spraying and low pressure plasma spraying  

Science Journals Connector (OSTI)

Yttria doped zirconia has been widely used as electrolyte materials for solid oxide fuel cells (SOFC). Plasma spraying is a cost-effective process to...2O3 stabilized ZrO2...(YSZ) layer was deposited by low press...

C. Zhang; H. L. Liao; W. Y. Li; G. Zhang; C. Coddet…

2006-12-01T23:59:59.000Z

106

Surface Reactivity and Plasma Energetics of SiH Radicals during Plasma Deposition of Silicon-Based Materials  

Science Journals Connector (OSTI)

The surface reactivity of the SiH radical was measured during plasma deposition of various silicon-based materials using the imaging of radicals interacting with surfaces (IRIS) method. In this technique, spatially resolved laser-induced fluorescence (LIF)...

W. M. M. Kessels; Patrick R. McCurdy; Keri L. Williams; G. R. Barker; Vincent A. Venturo; Ellen R. Fisher

2002-02-09T23:59:59.000Z

107

LARGE AREA FILTERED ARC DEPOSITION OF CARBON AND BORON BASED HARD COATINGS  

SciTech Connect (OSTI)

This document is a final report covering work performed under Contract No. DE-FG02-99ER82911 from the Department of Energy under a SBIR Phase II Program. Wear resistant, hard coatings can play a vital role in many engineering applications. The primary goal of this project was to develop coatings containing boron and carbon with hardness greater than 30 GPa and evaluate these coatings for machining applications. UES has developed a number of carbon and boron containing coatings with hardness in the range of 34 to 65 GPa using a combination of filtered cathodic arc and magnetron sputtering. The boron containing coatings were based on TiB2, TiBN, and TiBCN, while the carbon containing coatings ere TiC+C and hydrogen free diamond-like-carbon. Machining tests were performed with single and multilayer coated tools. The turning and milling tests were run at TechSolve Inc., under a subcontract at Ohio State University. Significant increases in tool lives were realized in end milling of H-13 die steel (8X) and titanium alloy (80%) using the TiBN coating. A multilayer TiBN/TiN performed the best in end-milling of highly abrasive Al-Si alloys. A 40% increase in life over the TiAlN benchmark coating was found. Further evaluations of these coatings with commercialization partners are currently in progress.

Bhattacharya, Rabi S.

2003-12-05T23:59:59.000Z

108

Ion sources with arc-discharge plasma box driven by directly heated LaB{sub 6} electron emitter or cold cathode (invited)  

SciTech Connect (OSTI)

In the Budker Institute, Novosibirsk, an ion source with arc-discharge plasma box has been developed in the recent years for application in thermonuclear devices for plasma diagnostics. Several modifications of the ion source were provided with extracted current ranging from 1 to 7 A and pulse duration of up to 4 s. Initially, the arc-discharge plasma box with cold cathode was used, with which pulse duration is limited to 2 s by the cathode overheating and sputtering in local arc spots. Recently, a directly heated LaB{sub 6} electron emitter was employed instead, which has extended lifetime compared to the cold cathode. In the paper, characteristics of the beam produced with both arrangements of the plasma box are presented.

Ivanov, Alexander A.; Davydenko, Vladimir I.; Deichuli, Petr P.; Shulzhenko, Grigori I.; Stupishin, Nikolay V. [Budker Institute of Nuclear Physics, 630090 Novosibirsk (Russian Federation)

2008-02-15T23:59:59.000Z

109

Tunable, self-powered integrated arc plasma-melter vitrification system for waste treatment and resource recovery  

DOE Patents [OSTI]

The present invention provides a relatively compact self-powered, tunable waste conversion system and apparatus which has the advantage of highly robust operation which provides complete or substantially complete conversion of a wide range of waste streams into useful gas and a stable, nonleachable solid product at a single location with greatly reduced air pollution to meet air quality standards. The system provides the capability for highly efficient conversion of waste into high quality combustible gas and for high efficiency conversion of the gas into electricity by utilizing a high efficiency gas turbine or by an internal combustion engine. The solid product can be suitable for various commercial applications. Alternatively, the solid product stream, which is a safe, stable material, may be disposed of without special considerations as hazardous material. In the preferred embodiment of the invention, the arc plasma furnace and joule heated melter are formed as a fully integrated unit with a common melt pool having circuit arrangements for the simultaneous independently controllable operation of both the arc plasma and the joule heated portions of the unit without interference with one another. The preferred configuration of this embodiment of the invention utilizes two arc plasma electrodes with an elongated chamber for the molten pool such that the molten pool is capable of providing conducting paths between electrodes. The apparatus may additionally be employed with reduced or without further use of the gases generated by the conversion process. The apparatus may be employed as a self-powered or net electricity producing unit where use of an auxiliary fuel provides the required level of electricity production.

Titus, Charles H. (Newtown Square, PA); Cohn, Daniel R. (Chestnuthill, MA); Surma, Jeffrey E. (Kennewick, WA)

1998-01-01T23:59:59.000Z

110

Titanium nitride thin films deposited by reactive pulsed-laser ablation in RF plasma  

Science Journals Connector (OSTI)

Titanium nitride thin films were deposited on Si (100) substrates by pulsed laser ablation of a titanium target in a N2 atmosphere (gas pressure approx. 10 Pa) using a doubled frequency Nd:YAG laser (532 nm) also assisted by a 13.56-MHz radio frequency (RF) plasma. Deposition was carried out at various substrate temperatures ranging from 373 up to 873 K and films were analyzed by X-ray diffractometry, scanning electron microscopy and optical emission spectroscopy. A comparison between the ‘normal’ pulsed laser deposition (PLD) and the RF plasma-assisted PLD showed the influence of the plasma on the structural characteristics of the thin films.

A. Giardini; V. Marotta; S. Orlando; G.P. Parisi

2002-01-01T23:59:59.000Z

111

Departures from local thermodynamic equilibrium in cutting arc plasmas derived from electron and gas density measurements using a two-wavelength quantitative Schlieren technique  

SciTech Connect (OSTI)

A two-wavelength quantitative Schlieren technique that allows inferring the electron and gas densities of axisymmetric arc plasmas without imposing any assumption regarding statistical equilibrium models is reported. This technique was applied to the study of local thermodynamic equilibrium (LTE) departures within the core of a 30 A high-energy density cutting arc. In order to derive the electron and heavy particle temperatures from the inferred density profiles, a generalized two-temperature Saha equation together with the plasma equation of state and the quasineutrality condition were employed. Factors such as arc fluctuations that influence the accuracy of the measurements and the validity of the assumptions used to derive the plasma species temperature were considered. Significant deviations from chemical equilibrium as well as kinetic equilibrium were found at elevated electron temperatures and gas densities toward the arc core edge. An electron temperature profile nearly constant through the arc core with a value of about 14000-15000 K, well decoupled from the heavy particle temperature of about 1500 K at the arc core edge, was inferred.

Prevosto, L.; Mancinelli, B. [Grupo de Descargas Electricas, Departamento Ing. Electromecanica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto 2600, Santa Fe (Argentina); Artana, G. [Laboratorio de Fluidodinamica, Departamento Ing. Mecanica, Facultad de Ingenieria (UBA), Paseo Colon 850, C1063ACV, Buenos Aires (Argentina); Kelly, H. [Grupo de Descargas Electricas, Departamento Ing. Electromecanica, Facultad Regional Venado Tuerto (UTN), Laprida 651, Venado Tuerto 2600, Santa Fe (Argentina); Departamento de Fisica, Facultad de Ciencias Exactas y Naturales (UBA), Instituto de Fisica del Plasma (CONICET), Ciudad Universitaria, Pab. I, 1428 Buenos Aires (Argentina)

2011-03-15T23:59:59.000Z

112

Room-temperature high radio-frequency source power effects on silicon nitride films deposited by using a plasma-enhanced chemical vapor deposition  

Science Journals Connector (OSTI)

Silicon nitride films were deposited at room temperature using a plasma-enhanced chemical vapor deposition system. In this study, the effects of radio frequency (RF) source power ranging from 200 W to ... charact...

Byungwhan Kim; Suyeon Kim

2008-10-01T23:59:59.000Z

113

Influence of argon and oxygen on charge-state-resolved ion energy distributions of filtered aluminum arcs  

E-Print Network [OSTI]

energy distributions of filtered aluminum arcs Johanna Roséndistributions (IEDs) in filtered aluminum vacuum arc plasmasfor vacuum arc plasmas. Aluminum plasma, for example,

Rosen, Johanna; Anders, Andre; Mraz, Stanislav; Atiser, Adil; Schneider, Jochen M.

2006-01-01T23:59:59.000Z

114

Nickel catalyst faceting in plasma-enhanced direct current chemical vapor deposition of carbon nanofibers  

E-Print Network [OSTI]

1 Nickel catalyst faceting in plasma-enhanced direct current chemical vapor deposition of carbon vapor deposition with Ni catalysts on the top of nanofibers. Transmission electron microscopy was used to study the morphology and crystallography of Ni catalysts, which are essential for the nucleation

Paris-Sud XI, Université de

115

PULSED PLASMA DEPOSITED MALEIC ANHYDRIDE THIN FILMS AS FUNCTIONALISED SURFACES IN COMPOSITE  

E-Print Network [OSTI]

PULSED PLASMA DEPOSITED MALEIC ANHYDRIDE THIN FILMS AS FUNCTIONALISED SURFACES IN COMPOSITE substrate models carbon fibres in composite materials. The substrates are treated with different plasma properties of composite materials are strongly dependent on the integrity of the fibre-matrix interface

116

Plasma parameters in electrospark deposition of silver coatings  

Science Journals Connector (OSTI)

Spectroscopic measurements and mathematical simulations are conducted to study the composition and parameters of spark discharge in depositing coatings with silver electrodes using an Élitron-22 generator. The...

V. D. Kurochkin; L. P. Kravchenko; L. O. Kryachko…

2008-11-01T23:59:59.000Z

117

Physical characteristics of gliding arc discharge plasma generated in a laval nozzle  

SciTech Connect (OSTI)

The dynamic behavior of gliding arc discharge generated in a Laval nozzle has been investigated by electrical diagnostics and a high-speed camera. The results show that the voltage waveform keeps the initial shape as the gas flow rate is small, while it becomes less stable with increasing flow rate. During the first half of a cycle, the voltage rises and after that it decreases. In nitrogen and oxygen, the break down voltage for the arc is between 3.3 and 5.5 kV, while it is between 3.3-7.5 kV in air. The waveform of current I remains almost stable; and for nitrogen and oxygen, the maximum value of current I is between 0.28 and 0.46 A. With increasing flow rate, the power consumption in air first increases and then decreases; it remains in the range of 110-217 W, and gradually increases in nitrogen and oxygen. The power consumption in oxygen is lower than that in nitrogen; the input of the energy density decreases with increasing flow rate for all the three gases. The development of the arc is tracked and recorded by a high-speed camera. The cycle is stable at 10 ms for flow rates up to 1 m{sup 3} h{sup -1}. At a higher flow rate, the cycle becomes unstable.

Lu, S. Y.; Sun, X. M.; Li, X. D.; Yan, J. H. [State Key Laboratory of Clean Energy Utilization, Institute for Thermal Power Engineering, Zhejiang University, Hangzhou 310027 (China); Du, C. M. [School of Environmental Science and Engineering, Sun Yat-sen University, Guangzhou 510275 (China)

2012-07-15T23:59:59.000Z

118

Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor  

SciTech Connect (OSTI)

The plasma-enhanced atomic layer deposition (PEALD) process was developed as a growth technique of SiO{sub 2} thin films using a plasma-activated triisopropylsilane [TIPS, ((iPr){sub 3}SiH)] precursor. TIPS was activated by an argon plasma at the precursor injection stage of the process. Using the activated TIPS, it was possible to control the growth rate per cycle of the deposited films by adjusting the plasma ignition time. The PEALD technique allowed deposition of SiO{sub 2} films at temperatures as low as 50?°C without carbon impurities. In addition, films obtained with plasma ignition times of 3?s and 10?s had similar values of root-mean-square surface roughness. In order to evaluate the suitability of TIPS as a precursor for low-temperature deposition of SiO{sub 2} films, the vapor pressure of TIPS was measured. The thermal stability and the reactivity of the gas-phase TIPS with respect to water vapor were also investigated by analyzing the intensity changes of the C–H and Si–H peaks in the Fourier-transform infrared spectrum of TIPS.

Jeon, Ki-Moon [Vacuum Center, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Advanced Materials Engineering, Dae Jeon University, Daejeon 300-716 (Korea, Republic of); Shin, Jae-Su [Department of Advanced Materials Engineering, Dae Jeon University, Daejeon 300-716 (Korea, Republic of); Yun, Ju-Young [Vacuum Center, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Nano and Bio Surface Science, University of Science and Technology (UST), Daejeon 305-333 (Korea, Republic of); Jun Lee, Sang [Center of Nanomaterials Characterization, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Nano Science, University of Science and Technology (UST), Daejeon 305-333 (Korea, Republic of); Kang, Sang-Woo, E-mail: swkang@kriss.re.kr [Vacuum Center, Division of Industrial Metrology, Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, South Korea and Department of Advanced Device Technology, University of Science and Technology (UST), Daejeon 305-333 (Korea, Republic of)

2014-05-15T23:59:59.000Z

119

Niobium thin film coating on a 500-MHz copper cavity by plasma deposition  

SciTech Connect (OSTI)

A system using an Electron Cyclotron Resonance (ECR) plasma source for the deposition of a thin niobium film inside a copper cavity for superconducting accelerator applications has been designed and is being constructed. The system uses a 500-MHz copper cavity as both substrate and vacuum chamber. The ECR plasma will be created to produce direct niobium ion deposition. The central cylindrical grid is DC biased to control the deposition energy. This paper describes the design of several subcomponents including the vacuum chamber, RF supply, biasing grid and magnet coils. Operational parameters are compared between an operating sample deposition system and this system. Engineering work progress toward the first plasma creation will be reported here.

Haipeng Wang; Genfa Wu; H. Phillips; Robert Rimmer; Anne-Marie Valente; Andy Wu

2005-05-16T23:59:59.000Z

120

Niobium Thin Film Coating on a 500-MHz Copper Cavity by Plasma Deposition  

SciTech Connect (OSTI)

A system using an Electron Cyclotron Resonance (ECR) plasma source for the deposition of a thin niobium film inside a copper cavity for superconducting accelerator applications has been designed and is being constructed. The system uses a 500-MHz copper cavity as both substrate and vacuum chamber. The ECR plasma will be created to produce direct niobium ion deposition. The central cylindrical grid is DC biased to control the deposition energy. This paper describes the design of several subcomponents including the vacuum chamber, RF supply, biasing grid and magnet coils. Operational parameters are compared between an operating sample deposition system and this system. Engineering work progress toward the first plasma creation will be reported here.

Haipeng Wang; Genfa Wu; H. Phillips; Robert Rimmer; Anne-Marie Valente; Andy Wu

2005-05-16T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


121

Influence of Electrolyte Chemistry on Morphology and Corrosion Resistance of Micro Arc Oxidation Coatings Deposited on Magnesium  

Science Journals Connector (OSTI)

In the present work, micro arc oxidation (MAO) coatings were synthesized on magnesium...2SiO3), potassium hydroxide (KOH), and sodium aluminate (NaAlO2). The resultant coatings were subjected to coating thickness...

L. Rama Krishna; G. Poshal; G. Sundararajan

2010-12-01T23:59:59.000Z

122

Correlation between Microstructure and Mechanical Properties of TiC Films Produced by Vacuum arc Deposition and Reactive Magnetron Sputtering  

E-Print Network [OSTI]

and mechanical properties of TiC films produced by vacuumstudied the synthesis of TiC films by vacuum arc depositionproduced a broad range of TiC x film compositions. In both

Monteiro, O.R.; Delplancke-Ogletree, M.P.; Winand, R.; Brown, I.G.

1999-01-01T23:59:59.000Z

123

E-Print Network 3.0 - arc plasma jet Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Mathematics 9 Electrical discharges in theElectrical discharges in the Reverse Vortex FlowReverse Vortex Flow Summary: 2.1 gs 1.4 gsArgon Mass Flow 2.1 gs 1.4 gs Plasma...

124

Facility for high-heat flux testing of irradiated fusion materials and components using infrared plasma arc lamps  

Science Journals Connector (OSTI)

A new high-heat flux testing (HHFT) facility using water-wall stabilized high-power high-pressure argon plasma arc lamps (PALs) has been developed for fusion applications. It can accommodate irradiated plasma facing component materials and sub-size mock-up divertor components. Two PALs currently available at Oak Ridge National Laboratory can provide maximum incident heat fluxes of 4.2 and 27 MW m?2, which are prototypic of fusion steady state heat flux conditions, over a heated area of 9 ? 12 and 1 ? 10 cm2, respectively. The use of PAL permits the heat source to be environmentally separated from the components of the test chamber, simplifying the design to accommodate safe testing of low-level irradiated articles and materials under high-heat flux. Issues related to the operation and temperature measurements during testing of tungsten samples are presented and discussed. The relative advantages and disadvantages of this photon-based HHFT facility are compared to existing e-beam and particle beam facilities used for similar purposes.

Adrian S Sabau; Evan K Ohriner; Jim Kiggans; David C Harper; Lance L Snead; Charles R Schaich

2014-01-01T23:59:59.000Z

125

Facility for high heat flux testing of irradiated fusion materials and components using infrared plasma arc lamps  

SciTech Connect (OSTI)

A new high-heat flux testing facility using water-wall stabilized high-power high-pressure argon Plasma Arc Lamps (PALs) has been developed for fusion applications. It can handle irradiated plasma facing component materials and mock-up divertor components. Two PALs currently available at ORNL can provide maximum incident heat fluxes of 4.2 and 27 MW/m2 over a heated area of 9x12 and 1x10 cm2, respectively, which are fusion-prototypical steady state heat flux conditions. The facility will be described and the main differences between the photon-based high-heat flux testing facilities, such as PALs, and the e-beam and particle beam facilities more commonly used for fusion HHF testing are discussed. The components of the test chamber were designed to accommodate radiation safety and materials compatibility requirements posed by high-temperature exposure of low levels irradiated tungsten articles. Issues related to the operation and temperature measurements during testing are presented and discussed.

Sabau, Adrian S [ORNL] [ORNL; Ohriner, Evan Keith [ORNL] [ORNL; Kiggans, Jim [ORNL] [ORNL; Harper, David C [ORNL] [ORNL; Snead, Lance Lewis [ORNL] [ORNL; Schaich, Charles Ross [ORNL] [ORNL

2014-01-01T23:59:59.000Z

126

Deposition of platinum catalyst by plasma sputtering for fuel cells: 3D simulation and experiments  

Science Journals Connector (OSTI)

Plasma sputtering is one of the most promising methods for reducing the amount of platinum catalyst in porous electrodes for low temperature fuel cells. Here, a simulation of the platinum deposition by radio frequency plasma sputtering has been developed and compared with experimental results to allow optimization of the deposition process. In the simulation, the transport of sputtered atoms through the argon plasma is obtained using a 3D Monte Carlo model called SPaTinG (Sputtered Particles Transport in Gas). The Yamamura formula provides the Pt sputtering yield on the target, and the initial energy distribution of sputtered atoms is given by the Thompson distribution. A 1D hybrid model is used to estimate the mean energy of argon ions impinging onto the platinum target. Experimentally, platinum is deposited on silicon in two plasma sputtering chambers with different geometries. The deposition rate is measured by Rutherford backscattering spectroscopy. The angular distribution of the Pt atoms ejected from the target surface and the condensation coefficient of the Pt atoms on silicon are calculated by adjusting the simulated and experimental deposition rates at 0.5?Pa. A good agreement between the simulation and the experiment is observed as a function of the target–substrate distance for the two system geometries at low pressure (0.5?Pa).

A Caillard; C Charles; R Boswell; A Meige; P Brault

2008-01-01T23:59:59.000Z

127

Surface hardening of metallic alloys by electrospark deposition followed by plasma nitriding  

Science Journals Connector (OSTI)

This paper presents the results of a study concerned with the surface hardening of nonferrous and ferrous alloys, by integrating the electrospark deposition and plasma nitriding processes. Specimens of an aluminium bronze and of a grey cast iron were firstly electrospark coated with AISI-304 stainless steel and, then, ion nitrided in a 25%N2 + 75%H2 dc plasma. It is shown that by using these two treatments, the surface hardness of this two materials can be substantially increased.

M.A. Béjar; W. Schnake; W. Saavedra; J.P. Vildósola

2006-01-01T23:59:59.000Z

128

Heat Transfer from Augmented Flames and Plasma Jets Based on Magnetically Rotated Arcs  

Science Journals Connector (OSTI)

...November 1971 research-article Heat Transfer from Augmented Flames and Plasma...Jones F. J. Weinberg Rates of heat transfer to the inner surface of a surrounding...experimental data on a computer to yield heat transfer coefficients is developed on this...

1971-01-01T23:59:59.000Z

129

Tribological performance of hybrid filtered arc-magnetron coatings...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Tribological performance of hybrid filtered arc-magnetron coatings - Part I: Coating deposition process and basic coating Tribological performance of hybrid filtered arc-magnetron...

130

High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma  

E-Print Network [OSTI]

High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency Semiconductor, Eden Prairie, MN, USA Received 10 July 2002; accepted 14 July 2002 Abstract Silicon carbide films; Nanomaterials; Silicon carbide; Thermal plasmas; Thin films; Si tetrachlorine precursor Silicon carbide has

Zachariah, Michael R.

131

Versatile high rate plasma deposition and processing with very high frequency excitation  

SciTech Connect (OSTI)

The interest in plasma deposition using very high frequency (VHF) excitation arose after the preparation of a-Si:H at high growth rates was demonstrated. Subsequently the improved process flexibility and the control of material properties offered by the variation of the plasma excitation frequency was recognized. The preparation of amorphous and microcrystalline thin films in a VHF-plasma is described. The increased growth rates have been attributed to an enhancement of film precursor formation at VHF, to the decreased sheath thickness as well as to an enhancement of the surface reactivity by positive ions. Plasma diagnostic investigations show that the parameters mainly affected by the excitation frequency are the ion flux to the electrodes as well as the sheaths potentials and widths, rather than the plasma density. 55 refs., 13 figs.

Heintze, M.

1997-07-01T23:59:59.000Z

132

Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment  

SciTech Connect (OSTI)

Deposition of high-quality dielectric on a graphene channel is an essential technology to overcome structural constraints for the development of nano-electronic devices. In this study, we investigated a method for directly depositing aluminum oxide (Al{sub 2}O{sub 3}) on a graphene channel through nitrogen plasma treatment. The deposited Al{sub 2}O{sub 3} thin film on graphene demonstrated excellent dielectric properties with negligible charge trapping and de-trapping in the gate insulator. A top-gate-structural graphene transistor was fabricated using Al{sub 2}O{sub 3} as the gate dielectric with nitrogen plasma treatment on graphene channel region, and exhibited p-type transistor characteristics.

Lim, Taekyung; Kim, Dongchool; Ju, Sanghyun [Department of Physics, Kyonggi University, Suwon, Gyeonggi-Do 443-760 (Korea, Republic of)

2013-07-01T23:59:59.000Z

133

Plasma-enhanced chemical vapor deposition of graphene on copper substrates  

SciTech Connect (OSTI)

A plasma enhanced vapor deposition process is used to synthesize graphene from a hydrogen/methane gas mixture on copper samples. The graphene samples were transferred onto SiO{sub 2} substrates and characterized by Raman spectroscopic mapping and atomic force microscope topographical mapping. Analysis of the Raman bands shows that the deposited graphene is clearly SLG and that the sheets are deposited on large areas of several mm{sup 2}. The defect density in the graphene sheets is calculated using Raman measurements and the influence of the process pressure on the defect density is measured. Furthermore the origin of these defects is discussed with respect to the process parameters and hence the plasma environment.

Woehrl, Nicolas, E-mail: nicolas.woehrl@uni-due.de; Schulz, Stephan [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany)] [Faculty of Chemistry and CENIDE, University Duisburg-Essen, Carl-Benz-Straße 199, 47057 Duisburg (Germany); Ochedowski, Oliver; Gottlieb, Steven [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany)] [Faculty of Physics and CENIDE, University Duisburg Essen, Lotharstraße 1, 47057 Duisburg (Germany); Shibasaki, Kosuke [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)] [Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)

2014-04-15T23:59:59.000Z

134

Numerical simulation of discharge structures in Ar/Cs nonequilibrium plasma MHD generator  

SciTech Connect (OSTI)

As reported in previous papers, the quasi-one-dimensional simulation code has come to predict almost satisfactorily the performance of the shock tube driven disk MHD generator using cesium seeded argon plasma as working fluid. However, the agreement between experimental and predicted performances was not so good on the conditions that the external load resistance was small, the seed fraction was high or the stagnation pressure was low. On these conditions, it was observed that ionization instabilities occur in the MHD channel. On the other hand, high-speed photographs of the nonequilibrium plasma discharge in the MHD generator were taken on several working conditions during the experiment. From these photographs, discharges were classified into almost three kinds of patterns. (a) A single strong luminous ring-type discharge near the nozzle exit for low seed fraction, (b) an almost uniform discharge inside the MHD channel for medium seed fraction, (c) multiple ring-type or spiral discharges in the MHD channel for high seed fraction. The structures of the discharge were sometimes two-dimensional especially for high seed fraction. Therefore, it may be impossible in this case to simulate them and to predict the performance precisely with one-dimensional simulation code. In the present study, two-dimensional (r-q) numerical simulations were made on the disk MHD power generation experiment (thermal input is about 1.5MW). The objectives were to develop a numerical simulator with high accuracy for the disk MHD generator and to explain some interesting phenomena concerned with nonequilibrium plasma discharges. The system of basic equations was solved mainly using CIP method. The calculation region was taken as that located between the throat to the inlet of the second (final) cathode. The main results are summarized as follows; (A) On the condition that the seed fraction was lower than the optimum value, it was succeeded to simulate numerically the single strong luminous ring-type discharge. The ring-type discharge was caused by the partial ionization of argon due to the rapid increase in the electron temperature in the nozzle. The pressure increase like a shock wave was also induced there. (B) On the condition that the seed fraction was near the optimum value, an almost uniform plasma was obtained in the simulation and in the experiment. (C) On the condition that seed fraction was higher than the optimum value, A similar structure of discharge to experimental one was obtained in the calculation due to an ionization instability (streamer) caused by the partial ionization of seeded cesium. (D) The performances of the generator such as enthalpy extraction can be predicted well with this simulation code.

Okubo, M.; Kabashima, S.; Okuno, Y.; Yamasaki, H.

1998-07-01T23:59:59.000Z

135

Nonequilibrium phenomena and determination of plasma parameters in the hot core of the cathode region in free-burning arc discharges  

SciTech Connect (OSTI)

We present spectroscopic measurements of plasma parameters (electron density n{sub e}, electron temperature T{sub e}, gas temperature T{sub g}, underpopulation factor b) in the hot-core region in front of the cathode of a low-current, free-burning arc discharge in argon under atmospheric pressure. The discharge is operated in the hot-core mode, creating a hot cathode region with plasma parameters similar to high-current arcs in spite of the fact that we use comparatively low currents (less than 20 A). We use continuum emission and (optically thin) line emission to determine n{sub e} and T{sub e}. We apply relaxation measurements based on a power-interruption technique to investigate deviations from local thermodynamic equilibrium (LTE). These measurements let us determine the gas temperature T{sub g}. All measurements are performed side-on with charge-coupled-device cameras as detectors, so that all measured plasma parameters are spatially resolved after an Abel inversion. This yields the first ever spatially resolved observation of the non-LTE phenomena of the hot core in the near-cathode region of free-burning arcs. The results only partly coincide with previously published predictions and measurements in the literature.

Kuehn, Gerrit; Kock, Manfred [Institut fuer Atom- and Molekuelphysik, Abteilung Plasmaphysik, Universitaet Hannover, Germany Institut fuer Gravitationsphysik, Universitaet Hannover (Germany) and Max-Planck-Institut fuer Gravitationsphysik, Albert-Einstein-Institut, Hannover (Germany); Institut fuer Atom- and Molekuelphysik, Abteilung Plasmaphysik, Universitaet Hannover (Germany)

2007-01-15T23:59:59.000Z

136

Low pressure and atmospheric pressure plasma-jet systems and their application for deposition of thin films  

E-Print Network [OSTI]

1 Low pressure and atmospheric pressure plasma-jet systems and their application for deposition atmospheric discharge plasma jet. This system works at open air without any vacuum system. This system on polymer substrates. Under certain condition in the atmospheric plasma jet, these films have crystalline

Paris-Sud XI, Université de

137

Deposition of TiO2 thin films by atmospheric plasma post-discharge assisted injection MOCVD  

E-Print Network [OSTI]

Deposition of TiO2 thin films by atmospheric plasma post-discharge assisted injection MOCVD C Keywords : Injection MOCVD, Atmospheric Plasma, titanium oxide, anatase, PECVD Abstract TiO2 thin films combines remote Atmospheric Pressure (AP) Plasma with Pulsed Injection Metallorganic Chemical Vapour

Boyer, Edmond

138

VHF plasma deposition of {mu}c-Si p-layer materials  

SciTech Connect (OSTI)

Microcrystalline silicon ({micro}c-Si) p-layers have been widely used in amorphous silicon (a-Si) solar cell research and manufacturing to achieve record high solar cell efficiency. In order to further improve the solar cell performance and achieve wider parameter windows for the process conditions, the authors studied the deposition of high quality {micro}c-Si p-layer material using a very high frequency (VHF) plasma enhanced CVD process. A design of experiment (DOE) approach was used for the exploration and optimization of deposition parameters. The usage of DOE leads to a quick optimization of the deposition process within a short time frame. In addition, by using a modified VHF deposition process, they have improved the solar cell blue response which leads to a 6--10% improvement in the solar cell efficiency. Such an improvement is likely due to an improved microcrystalline formation in the p-layer.

Deng, X.; Jones, S.J.; Liu, T.; Izu, M.; Ovshinsky, S.R.; Hoffman, K.

1997-07-01T23:59:59.000Z

139

Effects of plasma-deposited silicon nitride passivation on the radiation hardness of CMOS integrated circuits  

SciTech Connect (OSTI)

The use of plasma-deposited silicon nitride as a final passivation over metal-gate CMOS integrated circuits degrades the radiation hardness of these devices. The hardness degradation is manifested by increased radiation-induced threshold voltage shifts caused principally by the charging of new interface states and, to a lesser extent, by the trapping of holes created upon exposure to ionizing radiation. The threshold voltage shifts are a strong function of the deposition temperature, and show very little dependence on thickness for films deposited at 300/sup 0/C. There is some correlation between the threshold voltage shifts and the hydrogen content of the PECVD silicon nitride films used as the final passivation layer as a function of deposition temperature. The mechanism by which the hydrogen contained in these films may react with the Si/SiO/sub 2/ interface is not clear at this point.

Clement, J. J.

1980-01-01T23:59:59.000Z

140

Effect of input pulse chirp on nonlinear energy deposition and plasma excitation in water  

E-Print Network [OSTI]

We analyze numerically and experimentally the effect of the input pulse chirp on the nonlinear energy transfer from 5 {\\mu}J fs-pulses at 800 nm to water. Numerical results are also shown for pulses at 400 nm, where linear losses are minimized, and for different focusing geometries. Input chirp is found to have a big impact on the transmitted energy and on the plasma distribution around focus, thus providing a simple and effective mechanism to tune the electron density and energy deposition. We identify three relevant ways in which plasma features may be tuned.

Milián, C; Brelet, Y; Jukna, V; Houard, A; Mysyrowicz, A; Couairon, A

2014-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


141

Effect of Plasma Deposition Using Low-Power/Non-thermal Atmospheric Pressure Plasma on Promoting Adhesion of Composite Resin to Enamel  

Science Journals Connector (OSTI)

...This study investigated the effect of monomer deposition through a low-power, non-thermal atmospheric pressure plasma (NT-APP) on adhesion of resin ... stereomicroscope and a scanning electron microscope. The

Geum-Jun Han; Jae-Hoon Kim; Sung-No Chung…

2014-07-01T23:59:59.000Z

142

Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus  

Science Journals Connector (OSTI)

Pulsed laser deposition synthesized ZnO thin films, grown at 400 °C substrate temperature in different oxygen gas pressures, were irradiated with 6 shots of pulsed nitrogen ions obtained from 2.94 kJ dense plasma focus to achieve the nitrogen doping in ZnO. Structural, compositional and optical properties of as-deposited and nitrogen ion irradiated ZnO thin films were investigated to confirm the successful doping of nitrogen in irradiated samples. Spectral changes have been seen in the nitrogen irradiated ZnO thin film samples from the low temperature PL measurements. Free electron to acceptor emissions can be observed from the irradiated samples, which hints towards the successful nitrogen doping in films. Compositional analysis by X-ray photoelectron spectroscopy and corresponding shifts in binding energy core peaks of oxygen and nitrogen confirmed the successful use of plasma focus device as a novel source for nitrogen ion doping in ZnO thin films.

S. Karamat; R.S. Rawat; T.L. Tan; P. Lee; S.V. Springham; E. Ghareshabani; R. Chen; H.D. Sun

2011-01-01T23:59:59.000Z

143

Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions  

Science Journals Connector (OSTI)

Tungsten nitride thin films were deposited on stainless steel–304 substrates by using a low energy (2 kJ) Mather type plasma focus device. X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and microhardness are used to study the surface of treated samples. The XRD analysis shows that the degree of crystallinity of deposited thin films strongly depends on axial and angular positions of samples. The SEM micrographs of the deposited films at different angular positions (0°, 10° and 30°) and axial position of 8 cm show that the content of WN sub-micro crystalline structures on the surface of deposited films decreased with increasing the angle with respect to anode axis. From AFM results we observe that for the sample deposited at 8 cm and 0° axial and angular positions, respectively, the most uniform surface and the most homogenous distribution of grains are obtained. Also the hardness results show that the highest mechanical hardness is obtained when the film is deposited at 8 cm and 0° axial and angular positions, respectively.

M.T. Hosseinnejad; M. Ghoranneviss; G.R. Etaati; M. Shirazi; Z. Ghorannevis

2011-01-01T23:59:59.000Z

144

Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment  

SciTech Connect (OSTI)

The role of surface hydroxyl content in atomic layer deposition (ALD) of aluminum oxide (AO) on polymers is demonstrated by performing an atomic layer deposition of AO onto a variety of polymer types, before and after pretreatment in a plasma struck in water vapor. The treatment and deposition reactions are performed in situ in a high vacuum chamber that is interfaced to an x-ray photoelectron spectrometer to prevent adventitious exposure to atmospheric contaminants. X-ray photoelectron spectroscopy is used to follow the surface chemistries of the polymers, including theformation of surface hydroxyls and subsequent growth of AO by ALD. Using dimethyl aluminum isopropoxide and water as reactants, ALD is obtained for water-plasma-treated poly(styrene) (PS), poly(propylene) (PP), poly(vinyl alcohol) (PVA), and poly(ethylene naphthalate) (PEN). For PS, PP, and PEN, initial growth rates of AO on the native (untreated) polymers are at least an order of magnitude lower than on the same polymer surface following the plasma treatment. By contrast, native PVA is shown to initiate ALD of AO as a result of the presence of intrinsic surface hydroxyls that are derived from the repeat unit of this polymer.

Steven Brandt, E.; Grace, Jeremy M. [Eastman Kodak Company, 1999 Lake Avenue, Rochester, New York 14650-2022 (United States)

2012-01-15T23:59:59.000Z

145

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)  

SciTech Connect (OSTI)

High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

Anders, Andre

2014-08-17T23:59:59.000Z

146

CF4 Glow Discharge Modification of CH4 Plasma Polymer Layers Deposited onto Asymmetric Polysulfone Gas Separation Membranes  

Science Journals Connector (OSTI)

Post CF4 glow discharge modification of methane plasma polymer layers deposited onto asymmetric polysulfone membranes has been investigated by XPS, FTIR, AFM, and gas permeability measurements. Oxygen and nitrogen gas permeability and permselectivity ...

J. Hopkins; J. P. S. Badyal

1996-08-21T23:59:59.000Z

147

Continuous nanoparticle generation and assembly by atmospheric pressure arc discharge  

E-Print Network [OSTI]

Continuous nanoparticle generation and assembly by atmospheric pressure arc discharge Jesse J. Cole a dc arc discharge plasma. The particles are positively charged by the arc and form a room temperature precursor materials.5,6 High temperature plasmas in the form of dc arc discharges led to the discovery

Jacobs, Heiko O.

148

Increasing Stabilized Performance Of Amorphous Silicon Based Devices Produced By Highly Hydrogen Diluted Lower Temperature Plasma Deposition.  

DOE Patents [OSTI]

High quality, stable photovoltaic and electronic amorphous silicon devices which effectively resist light-induced degradation and current-induced degradation, are produced by a special plasma deposition process. Powerful, efficient single and multi-junction solar cells with high open circuit voltages and fill factors and with wider bandgaps, can be economically fabricated by the special plasma deposition process. The preferred process includes relatively low temperature, high pressure, glow discharge of silane in the presence of a high concentration of hydrogen gas.

Li, Yaun-Min (Langhorne, PA); Bennett, Murray S. (Langhorne, PA); Yang, Liyou (Plainsboro, NJ)

1999-08-24T23:59:59.000Z

149

Increased Stabilized Performance Of Amorphous Silicon Based Devices Produced By Highly Hydrogen Diluted Lower Temperature Plasma Deposition.  

DOE Patents [OSTI]

High quality, stable photovoltaic and electronic amorphous silicon devices which effectively resist light-induced degradation and current-induced degradation, are produced by a special plasma deposition process. Powerful, efficient single and multi-junction solar cells with high open circuit voltages and fill factors and with wider bandgaps, can be economically fabricated by the special plasma deposition process. The preferred process includes relatively low temperature, high pressure, glow discharge of silane in the presence of a high concentration of hydrogen gas.

Li, Yaun-Min (Langhorne, PA); Bennett, Murray S. (Langhorne, PA); Yang, Liyou (Plainsboro, NJ)

1997-07-08T23:59:59.000Z

150

Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films  

SciTech Connect (OSTI)

Here we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH{sub 4}) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 mus. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stochastic heating due to the rapid advancing of the sheath edge. The hot population had an electron temperature T{sub e}{sup hot} of over 10 eV and an initial low density n{sub e}{sup hot} which decreased to zero. Cold electrons of temperature T{sub e}{sup cold}approx1 eV represented the majority of each discharge. The density of cold electrons n{sub e}{sup cold} showed a monotonic increase over time within the negative pulse, peaking at almost 7x10{sup 10} cm{sup -3}, corresponding to the cooling of the hot electrons. The plasma potential V{sub p} of approx30 V underwent a smooth increase during the pulse and fell at the end of the negative region. Different rates of CH{sub 4} conversion were calculated from the DLC deposition rate. These were explained in terms of the specific activation energy E{sub a} and the conversion factor x{sub dep} associated with the plasma processes. The work deepens our understanding of the advantages of using pulsed power supplies for the PECVD of hard metallic and protective coatings for industrial applications (optics, biomedicine, and electronics).

Corbella, C.; Rubio-Roy, M.; Bertran, E.; Andujar, J. L. [FEMAN Group, IN2UB, Departament de Fisica Aplicada i Optica, Universitat de Barcelona, c/Marti i Franques 1, E-08028 Barcelona (Spain)

2009-08-01T23:59:59.000Z

151

Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas  

Science Journals Connector (OSTI)

Fluorinated gas discharges are widely used by the semiconductor industry in etching and chamber cleaning applications but the performance of these discharges varies in unpredictable ways for unknown reasons believed to be electrical in origin. To investigate possible mechanisms for this behavior we have measured the electrical characteristics of NF 3 /Ar CF 4 /O 2 /Ar and C 2 F 6 /O 2 /Ar chamber cleaning plasmas at 6.7–267 Pa in a 13.56 MHz capacitively coupled parallel-plate reactor using radio-frequency current and voltage probes and optical emission spectroscopy. From the measurements power losses in the external circuitry surrounding the discharge were determined. Furthermore using the measurements and equivalent circuit models the mechanisms by which power was absorbed within the discharge itself were investigated. Power was absorbed most efficiently at particular values of the discharge impedance. These optimal impedances occur in the middle of a transition from capacitive impedances at low pressures to resistive impedances at high pressures. These results illustrate that the plasma impedance is a useful parameter for monitoring and optimizing plasma processes in highly electronegative gases.

M. A. Sobolewski; J. G. Langan; B. S. Felker

1998-01-01T23:59:59.000Z

152

The augmented saddle field discharge characteristics and its applications for plasma enhanced chemical vapour deposition  

SciTech Connect (OSTI)

A high ion flux parallel electrode plasma is proposed and studied in its DC configuration. By cascading a diode source region which supplies electrons and a saddle field region where these seed electrons are energized and amplified, the energy of ion bombardment on the substrate can be decoupled from the plasma density. The sufficiently large density of electrons and holes in the vicinity of the substrate raises the possibility to perform plasma enhanced chemical vapour deposition on insulating materials, at low sheath voltages (around 40 V in the configuration studied), at low temperatures in which the surface mobility of film growth species may be provided by the bombardment of moderate energy ions. As a benchmarking exercise, experiments are carried out on silane discharge characteristics and deposition of hydrogenated amorphous silicon (a-Si:H) on both silicon wafer and glass. The films grown at low anode voltages have excellent microstructures with predominantly monohydride bonds, sharp band tails, but relatively high integrated defect density in the mid 10{sup 16}/cm{sup 3} range for the particular substrate temperature of 180 Degree-Sign C, indicating that further optimizations are necessary if the electrode configuration is to be used to create a-Si:H devices.

Wong, Johnson; Yeghikyan, Davit; Kherani, Nazir P. [Department of Electrical and Computer Engineering, University of Toronto, 10 King's college Rd., M5S 3G4 Toronto (Canada)

2013-04-07T23:59:59.000Z

153

Growing carbon nanotubes by microwave plasma-enhanced chemical vapor deposition  

E-Print Network [OSTI]

observed from multiwalled carbon nanotubes produced by arc discharge.6 Recent experimental studies have of nanocarbon on large scales ever since it was first observed at the cathode in an electric arc evaporation experi- ment where the anode had been consumed.1 In addition to the refinement of the arc discharge

Qin, Lu-Chang

154

Plasma enhanced chemical vapor deposition (PECVD) method of forming vanadium oxide films and vanadium oxide thin-films prepared thereby  

DOE Patents [OSTI]

A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.

Zhang, Ji-Guang (Golden, CO); Tracy, C. Edwin (Golden, CO); Benson, David K. (Golden, CO); Turner, John A. (Littleton, CO); Liu, Ping (Lakewood, CO)

2000-01-01T23:59:59.000Z

155

Deposition of diamond-like carbon film using dense plasma focus  

Science Journals Connector (OSTI)

This paper reports the deposition of amorphous diamond-like carbon (DLC) films on Si ?1 0 0?, using a low energy (1.45 kJ) dense plasma focus. The high purity graphite is inserted at the tip of the tapered anode, which serves as a carbon source. Silicon substrates are placed in front of the anode tip at different axial and angular positions. The films are deposited using multiple focus shots. Raman spectroscopy and X-ray diffractometer (XRD) are used to carry out the structural information of these deposited films. The elemental composition is studied by energy dispersive X-ray spectroscopy (EDX) whereas scanning electron microscope (SEM) is employed for the study of the surface morphology. Raman spectroscopy shows the deposition of both diamond type tetragonal sp3 and graphite type trigonal sp2 films. The results point towards the formation of good quality amorphous carbon (DLC) films with higher sp3 content as compared to sp2 content. XRD pattern confirms the amorphous nature of the films showing no additional peak except a peak at 2? = 69° which corresponds to substrate original peak Si(4 0 0). SEM results demonstrate that the smoothness of the surface decreases with increasing value of angles with respect to anode axis. The substrates placed closer to anode axis have higher carbon content as compared to those placed away from anode axis whereas carbon content decreases with increasing axial distances from anode tip.

Shaista Zeb; Mehboob Sadiq; A. Qayyum; Ghulam Murtaza; M. Zakaullah

2007-01-01T23:59:59.000Z

156

Vacuum arc ignition by penning discharge in a strong magnetic field  

SciTech Connect (OSTI)

Vacuum arc with cathode spots on the cold electrode is widely used as a plasma generator in a such kind of devices like metal ion sources, plasma cathode electron guns, thing films deposition facilities and others. Most vacuum arc devices utilize a high voltage discharge across an insulator surface to provide a trigger plasma which in turn initiates the main arc discharge. Operation of vacuum arc in a repetitively pulsed mode required a stable triggering system for the long time. But with a discharge across the insulators the number of stable pulses is limited by 100,000 or little bit more. The better method for vacuum arc ignition is low pressure discharge. As shown in this paper it is possible to increase the lifetime of the ignition system in 10 times at least, but negative characteristic of this system is a relatively high pressure (about 0.1 mtorr). In some kinds of vacuum arc applications it is impermissible because it leads to the {open_quotes}contamination{close_quotes} of the metal plasma by the gaseous one. In order to decrease the background pressure, using the gas discharge ignition system for vacuum arc, Penning discharge is suggested. The main new feature of this system is an applying the strong magnetic field not only for stabilization of the cathode spot moving and for the rise the high charge states of ions in metal plasma, but also for the essential decrease the lowest point of the background gas pressure when the Penning discharge is still in a stable operation. Under the stable mode of Penning discharge there was always a stable vacuum arc ignition.

Nikolaev, A.G.; Schanin, P.M.; Yushkov, G.Yu. [High Current Electronics Inst., Tomsk (Russian Federation)] [and others

1995-12-31T23:59:59.000Z

157

Deposition of tungsten nitride on stainless steel substrates using plasma focus device  

Science Journals Connector (OSTI)

Tungsten nitride (WN) films were deposited on the stainless steel-304 substrate by a 2 kJ Mather-type plasma focus device. The preparation method and characterization data are presented. X-ray diffractometer (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) were employed for the characterization of the samples obtained with different number of focus shots, respectively. The average size of crystallites (from XRD), sub-micro-structures (from SEM) and particles (from AFM images) increase when the number of shots increase from 10 to 20 then 30, then they decrease when the substrate is exposed to 40 shots.

G.R. Etaati; M.T. Hosseinnejad; M. Ghoranneviss; M. Habibi; M. shirazi

2011-01-01T23:59:59.000Z

158

Model of enhanced energy deposition in a Z-pinch plasma  

SciTech Connect (OSTI)

In numerous experiments, magnetic energy coupled to strongly radiating Z-pinch plasmas exceeds the thermalized kinetic energy, sometimes by a factor of 2-3. An analytical model describing this additional energy deposition based on the concept of macroscopic magnetohydrodynamic (MHD) turbulent pinch heating proposed by Rudakov and Sudan [Phys. Reports 283, 253 (1997)] is presented. The pinch plasma is modeled as a foam-like medium saturated with toroidal ''magnetic bubbles'' produced by the development of surface m=0 Rayleigh-Taylor and MHD instabilities. As the bubbles converge to the pinch axis, their magnetic energy is converted to thermal energy of the plasma through pdV work. Explicit formulas for the average dissipation rate of this process and the corresponding contribution to the resistance of the load, which compare favorably to the experimental data and simulation results, are presented. The possibility of using this enhanced (relative to Ohmic heating) dissipation mechanism to power novel plasma radiation sources and produce high K-shell yields using long current rise time machines is discussed. (c) 2000 American Institute of Physics.

Velikovich, A. L. [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States)] [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States); Davis, J. [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States)] [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States); Thornhill, J. W. [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States)] [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States); Giuliani, J. L. Jr. [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States)] [Radiation Hydrodynamics Branch, Plasma Physics Division, Naval Research Laboratory, Washington, D.C. 20375 (United States); Rudakov, L. I. [Advanced Power Technologies, Inc., Washington, D.C. 20037 (United States)] [Advanced Power Technologies, Inc., Washington, D.C. 20037 (United States); Deeney, C. [Sandia National Laboratories, Albuquerque, New Mexico 87545 (United States)] [Sandia National Laboratories, Albuquerque, New Mexico 87545 (United States)

2000-08-01T23:59:59.000Z

159

Thermodynamic properties and interfacial layer characteristics of HfO{sub 2} thin films deposited by plasma-enhanced atomic layer deposition  

SciTech Connect (OSTI)

The thermodynamic properties and interfacial characteristics of HfO{sub 2} thin films that were deposited by the direct plasma atomic layer deposition (DPALD) method are investigated. The as-deposited HfO{sub 2} films that were deposited by the DPALD method show crystallization of the HfO{sub 2} layers, which initiates at approximately the 35th cycle (about 2.8 nm) of the DPALD process. Medium-energy ion scattering analysis reveals that the direct O{sub 2} plasma causes a compositional change in the interfacial layer as the process progresses. With an increase in the number of process cycles, the Si content decreases and the O content increases at that position, so that the HfO{sub 2}-like Hf-silicate layer is formed on top of the interfacial layer. The enhanced physical reactivity of the oxygen ions in the direct plasma and the Hf-silicate layer may be the driving forces that accelerate the early crystallization of the HfO{sub 2} layer in the DPALD process in the as-deposited state.

Kim, Inhoe; Kuk, Seoungwoo; Kim, Seokhoon; Kim, Jinwoo; Jeon, Hyeongtag; Cho, M.-H.; Chung, K.-B. [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Korea Research Institute of Standard and Science, Daejeon 305-600 (Korea, Republic of)

2007-05-28T23:59:59.000Z

160

Study of plasma enhanced chemical vapor deposition of boron-doped hydrogenated amorphous silicon thin films and the application to p-channel thin film transistor  

E-Print Network [OSTI]

The material and process characteristics of boron doped hydrogenated amorphous silicon (a-Si:H) thin film deposited by plasma enhanced chemical vapor deposition technique (PECVD) have been studied. The goal is to apply the high quality films...

Nominanda, Helinda

2012-06-07T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


161

[ital In] [ital situ] infrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated silicon  

SciTech Connect (OSTI)

This research has performed preliminary [ital in] [ital situ] Fourier transform infrared (FTIR) measurements during the plasma deposition of amorphous silicon ([ital a]-Si:H). Experiments demonstrate both gas phase and film measurements within a simple SiH[sub 4] plasma reactor using a specially modified FTIR spectrometer. Films are deposited on substrates of either gold (mirror finish) or stainless steel (matte finish). In particular, [ital in] [ital situ] emission/reflection FTIR of the film yields information about surface temperature, film thickness, and film composition. We have measured surface temperature to [plus minus]5 K and detected the onset of poor film growth at a thickness of 500--1000 A using the 2080 cm[sup [minus]1] absorption feature. A simple model for the reflectance of a film on a metal is employed to determine the thickness of the films. [ital In] [ital situ] emission/transmission FTIR of the plasma determines the gas composition and average gas temperature. Measurements show that the silane conversion is [similar to]11% within the plasma region for a typical deposition at 250 [degree]C and roughly doubles for a deposition at room temperature. The FTIR spectra show that most of this converted silane reappears as disilane (Si[sub 2]H[sub 6]). Before starting the plasma, the silane gas is [similar to]30 K cooler than the nominal substrate temperature of 250 [degree]C; starting the plasma raises the average temperature another 20 [degree]C.

Morrison, P.W. Jr.; Haigis, J.R. (Advanced Fuel Research, Inc., East Hartford, Connecticut 06108 (United States))

1993-05-01T23:59:59.000Z

162

Characterization and tribological application of diamond-like carbon (DLC) films prepared by radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) technique  

Science Journals Connector (OSTI)

Diamond-like carbon (DLC) films were successfully prepared on glass substrates and surfaces of selenium drums via radio frequency plasma enhanced chemical vapor deposition method. The...

Ning Cao; Zhen-yi Fei; Yong-xin Qi; Wen-wen Chen…

2009-12-01T23:59:59.000Z

163

Experimental study on the energy deposition of an ns-DBD plasma actuator and its effect on a laminar boundary layer:.  

E-Print Network [OSTI]

??An experimental study aimed at the influence of different barrier materials on the energy deposition of nanosecond pulsed dielectric barrier discharge (ns-DBD) plasma actuator was… (more)

Winkel, R.

2015-01-01T23:59:59.000Z

164

Deposition of TiN and HfO{sub 2} in a commercial 200 mm remote plasma atomic layer deposition reactor  

SciTech Connect (OSTI)

The authors describe a remote plasma atomic layer deposition reactor (Oxford Instruments FlexAL trade mark sign ) that includes an inductively coupled plasma source and a load lock capable of handling substrates up to 200 mm in diameter. The deposition of titanium nitride (TiN) and hafnium oxide (HfO{sub 2}) is described for the combination of the metal-halide precursor TiCl{sub 4} and H{sub 2}-N{sub 2} plasma and the combination of the metallorganic precursor Hf[N(CH{sub 3})(C{sub 2}H{sub 5})]{sub 4} and O{sub 2} plasma, respectively. The influence of the plasma exposure time and substrate temperature has been studied and compositional, structural, and electrical properties are reported. TiN films with a low Cl impurity content were obtained at 350 deg. C at a growth rate of 0.35 A /cycle with an electrical resistivity as low as 150 {mu}{omega} cm. Carbon-free (detection limit <2 at. %) HfO{sub 2} films were obtained at a growth rate of 1.0 A /cycle at 290 deg. C. The thickness and resisitivity nonuniformity was <5% for the TiN and the thickness uniformality was <2% for the HfO{sub 2} films as determined over 200 mm wafers.

Heil, S. B. S.; Hemmen, J. L. van; Hodson, C. J.; Singh, N.; Klootwijk, J. H.; Roozeboom, F.; Sanden, M. C. M. van de; Kessels, W. M. M. [Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands); Oxford Instruments Plasma Technology, North End, Yatton BS49 4AP (United Kingdom); Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven (Netherlands); NXP Semiconductors Research, High Tech Campus 4, 5656 AE Eindhoven (Netherlands); Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)

2007-09-15T23:59:59.000Z

165

In situ nitrogen-doped graphene grown from polydimethylsiloxane by plasma enhanced chemical vapor deposition  

SciTech Connect (OSTI)

Due to its unique electronic properties and wide spectrum of promising applications, graphene has attracted much attention from scientists in various fields. Control and engineering of graphene’s semiconducting properties is considered to be the key of its applications in electronic devices. Here, we report a novel method to prepare in situ nitrogen-doped graphene by microwave plasma assisted chemical vapor deposition (CVD) using PDMS (Polydimethylsiloxane) as a solid carbon source. Based on this approach, the concentration of nitrogen-doping can be easily controlled via the flow rate of nitrogen during the CVD process. X-ray photoelectron spectroscopy results indicated that the nitrogen atoms doped into graphene lattice were mainly in the forms of pyridinic and pyrrolic structures. Moreover, first-principles calculations show that the incorporated nitrogen atoms can lead to p-type doping of graphene. This in situ approach provides a promising strategy to prepare graphene with controlled electronic properties.

Wang, Chundong; Zhou, Yungang; He, Lifang; Ng, Tsz-Wai; Hong, Guo; Wu, Qi-Hui; Gao, Fei; Lee, Chun-Sing; Zhang, Wenjun

2013-01-21T23:59:59.000Z

166

Structure control of carbon nanotubes using radio-frequency plasma enhanced chemical vapor deposition  

Science Journals Connector (OSTI)

Carbon nanotube structures such as tube diameter, growth site, and formation density are controlled using radio-frequency (RF, 13.56 MHz) plasma enhanced chemical vapor deposition (RF-PECVD) method. We have produced uniformly well-aligned multi-walled carbon nanotubes (MWNTs) grown over the large scale area and linearly arrayed \\{MWNTs\\} grown in a selected area without any highly-sophisticated patterning process. In our RF-PECVD experiment, furthermore, individually grown single-walled carbon nanotubes (SWNTs) or their thin bundles are synthesized for the first time within the scope of the PECVD methods. These results indicate that PECVD method provides the high potential for the further development of nano-technology.

T. Kato; G.-H. Jeong; T. Hirata; R. Hatakeyama

2004-01-01T23:59:59.000Z

167

Suppression of current fluctuations in a crossed ExB field system for low-voltage plasma immersion treatment  

SciTech Connect (OSTI)

Plasma transport in a hybrid dc vacuum arc plasma source for ion deposition and plasma immersion treatment is considered. It is found that external crossed electric and magnetic fields near the substrate can significantly reduce the relative amplitude of ion current fluctuations I{sub f} at the substrate surface. In particular, I{sub f} decreases with the applied magnetic field when the bias voltage exceeds 300 V, thus allowing one to reduce the deviations from the rated process parameters. This phenomenon can be attributed to an interaction between the metal-plasma jet from the arc source and the discharge plasma in the crossed fields.

Levchenko, I.; Keidar, M.; Ostrikov, K.; Yu, M.Y. [School of Physics, University of Sydney, Sydney NSW 2006 (Australia); Department of Aerospace Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); School of Physics, University of Sydney, Sydney NSW 2006 (Australia); Institute for Theoretical Physics I, Ruhr University Bochum, Bochum 44780 (Germany)

2006-01-01T23:59:59.000Z

168

Stability of hydrogenated amorphous silicon deposited at high temperatures with a remote hydrogen plasma  

Science Journals Connector (OSTI)

It is demonstrated that the stability of hydrogenated amorphous silicon (a?Si:H) is improved by deposition under the combined conditions of high substrate temperature (e.g. T D =400?°C) and high hydrogen dilution as are readily achieved in a remote hydrogen plasma reactor. In comparison with optimized films from conventional rfglow dischargedeposition (e.g. silane 230?°C 2 W) undoped high T D films possess a lower midgap defect density the dark dc conductivity in n?type (phosphorus?doped) films displays higher equilibration temperatures and longer relaxation times at a given temperature with an activation energy of 1.0 eV and undoped high T D films have a lower saturated density of light?induced defects. It is proposed that the ability to achieve the improved stability is a consequence of two effects: (1) the use of hydrogen dilution during deposition to maintain the hydrogen concentration in the film near 10 at.?% even at 400?°C and (2) the possibility that at high T D ’s the hydrogen is more stably incorporated in the random network and/or that the density of weak Si—Si bonds is smaller.

N. M. Johnson; C. E. Nebel; P. V. Santos; W. B. Jackson; R. A. Street; K. S. Stevens; J. Walker

1991-01-01T23:59:59.000Z

169

Structural properties of amorphous carbon thin films deposited by LF (100 kHz), RF (13.56 MHz), and pulsed RF (13.56 MHz) plasma CVD  

Science Journals Connector (OSTI)

Amorphous carbon thin films were deposited by LF (100 kHz), RF (13.56 MHz), and pulsed RF (13.56 MHz) plasma CVD with DC self-bias voltage of? ... properties of the deposited films in an asymmetric plasma reactor...

Dong-Sun Kim

2005-07-01T23:59:59.000Z

170

Al{sub 2}O{sub 3} multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition  

SciTech Connect (OSTI)

Al{sub 2}O{sub 3} films deposited by remote plasma atomic layer deposition have been used for thin film encapsulation of organic light emitting diode. In this study, a multi-density layer structure consisting of two Al{sub 2}O{sub 3} layers with different densities are deposited with different deposition conditions of O{sub 2} plasma reactant time. This structure improves moisture permeation barrier characteristics, as confirmed by a water vapor transmission rate (WVTR) test. The lowest WVTR of the multi-density layer structure was 4.7 × 10{sup ?5} gm{sup ?2} day{sup ?1}, which is one order of magnitude less than WVTR for the reference single-density Al{sub 2}O{sub 3} layer. This improvement is attributed to the location mismatch of paths for atmospheric gases, such as O{sub 2} and H{sub 2}O, in the film due to different densities in the layers. This mechanism is analyzed by high resolution transmission electron microscopy, elastic recoil detection, and angle resolved X-ray photoelectron spectroscopy. These results confirmed that the multi-density layer structure exhibits very good characteristics as an encapsulation layer via location mismatch of paths for H{sub 2}O and O{sub 2} between the two layers.

Jung, Hyunsoo [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Samsung Display Co. Ltd., Tangjeong, Chungcheongnam-Do 336-741 (Korea, Republic of); Jeon, Heeyoung [Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Choi, Hagyoung; Ham, Giyul; Shin, Seokyoon [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Jeon, Hyeongtag, E-mail: hjeon@hanyang.ac.kr [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)

2014-02-21T23:59:59.000Z

171

Polymer film deposition in inductively coupled radio-frequency discharge plasma of perfluorocyclobutane mixed with sulfur hexafluoride  

Science Journals Connector (OSTI)

The effect of an SF6...admixture on the rate of formation and the composition of a polymer film deposited on a substrate in low-pressure inductively coupled radiofrequency (RF) discharge plasma of C4F8 + SF6 unde...

I. I. Amirov; N. V. Alov

172

Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films  

Science Journals Connector (OSTI)

We adopted an ultrathin blocking layer of PEALD Al2O3 (10 cycles, 1 nm in thickness) for the leakage current suppression between BTO (5 nm) and Si substrate (Figure S2). ... For Al2O3 deposition, we used the plasma-enhanced ALD reactor (FlexAl) by Oxford Instruments. ...

Jihwan An; Takane Usui; Manca Logar; Joonsuk Park; Dickson Thian; Sam Kim; Kihyun Kim; Fritz B. Prinz

2014-06-19T23:59:59.000Z

173

Low temperature deposition of transparent conducting oxide films: Comparison of different pulsed sputtering and arc plasma methods  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Electrochromically switched, gas-reservoir metal hydride devices with Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows André Anders, Jonathan L. Slack, and Thomas J. Richardson Lawrence Berkeley National Laboratory Berkeley, California Abstract Proof-of-principle gas-reservoir MnNiMg electrochromic mirror devices have been investigated. In contrast to conventional electrochromic approaches, hydrogen is stored (at low concentration) in the gas volume between glass panes of the insulated glass units (IGUs). The elimination of a solid state ion storage layer simplifies the layer stack, enhances overall transmission, and reduces cost. The cyclic switching properties were demonstrated and system durability improved with the incorporation a thin Zr barrier layer between the MnNiMg layer

174

Electrical properties of a-C:Mo films produced by dual-cathode filtered cathodic arc plasma deposition  

E-Print Network [OSTI]

and Related Materials Electrical properties of a-C:Mo filmsNo. DE-AC02-05CH11231. Electrical properties of a-C:Mo filmsair. Film resistivity and electrical activation energy were

Sansongsiri, Sakon

2008-01-01T23:59:59.000Z

175

Characterization and formation mechanism of nano-structured hydroxyapatite coatings deposited by the liquid precursor plasma spraying process  

Science Journals Connector (OSTI)

Nano-structured hydroxyapatite (HA) coatings were deposited on the Ti-6Al-4V alloy substrate by the liquid precursor plasma spraying (LPPS) process. The thermal behavior of the HA liquid precursor was analyzed to interpret the phase change and structure transformation during the formation process of the nano-structured HA coatings. The phase composition, structure and morphology of the nano-structured HA coatings were characterized by x-ray diffraction (XRD), scanning electron microscope (SEM) and Fourier transform infrared (FTIR) spectroscopy. The XRD spectra showed that the coatings deposited by the LPPS process mainly consisted of the HA phase and the crystallite size was measured to be 56 nm. The SEM observation showed that the as-deposited LPPS coatings had small splat size, and nano-scale HA particles were found in certain regions of the coating surface. The FTIR spectroscopy showed the strong presence of the OH? group in the as-deposited LPPS coatings, indicating a superior structural integrity. In addition, the coatings deposited by the LPPS process were also carbonated HA coatings. The results indicate that the LPPS process is a promising plasma spraying technique for depositing nano-structured HA coatings with unique microstructural features that are desirable for improving the biological performance of the HA coatings.

Yi Huang; Lei Song; Tao Huang; Xiaoguang Liu; Yanfeng Xiao; Yao Wu; Fang Wu; Zhongwei Gu

2010-01-01T23:59:59.000Z

176

New approaches for the reduction of plasma arc drop in second-generation thermionic converters. Final report  

SciTech Connect (OSTI)

Investigations of ion generation and recombination mechanisms in the cesium plasma as they pertain to the advanced mode thermionic energy converter are described. The changes in plasma density and temperature within the converter have been studied under the influence of several promising auxiliary ionization candidate sources. Three novel approaches of external cesium ion generation have been investigated in some detail, namely vibrationally excited N/sub 2/ as an energy source of ionization of Cs ions in a DC discharge, microwave power as a means of resonant sustenance of the cesium plasma, and ion generation in a pulse N/sub 2/-Cs mixture. The experimental data obtained and discussed show that all three techniques - i.e. the non-LTE high-voltage pulsing, the energy transfer from vibrationally excited diatomic gases, and the external pumping with a microwave power - have considerable promise as schemes in auxiliary ion generation applicable to the advanced thermionic energy converter.

Hatziprokopiou, M.E.; Shaw, D.T.

1981-03-31T23:59:59.000Z

177

Effect of Micro Arc Oxidation Coatings on Corrosion Resistance of 6061-Al Alloy  

Science Journals Connector (OSTI)

In the present study, the corrosion behavior of micro arc oxidation (MAO) coatings deposited at two current...

Nitin P. Wasekar; A. Jyothirmayi…

2008-10-01T23:59:59.000Z

178

Tribological performance of Al–12Si coatings created via Electrospark Deposition and Spark Plasma Sintering  

Science Journals Connector (OSTI)

Abstract Spark plasma sintering (SPS) and Electrospark deposition (ESD) were used as two manufacturing routes to create Al–12Si coatings with refined microstructures. The tribological performance of these coatings was tested using a linear reciprocating tribometer. The SPS and ESD coatings were compared to a conventionally as-cast ingot (AC) of Al–12Si to observe the effect of particle refinement and morphology changes. The ESD sample exhibited lower wear rates than the AC and SPS samples. During the wear process, the Al and Si phases on the surface of the AC sample were significantly refined. This refinement led to a microstructure near the surface that was similar to the sample generated by SPS, and therefore showed similar wear rates at the end of testing. Subsurface cracking, which is known to occur in the wear of powder metallurgy alloys, was observed for sample SPS. The refinement of the Al and Si phases achieved for ESD process was much greater than what resulted during the wear of the AC and SPS surfaces and as a result the ESD sample showed lower wear rates throughout the entire test.

J. Milligan; J.M. Shockley; R.R. Chromik; M. Brochu

2013-01-01T23:59:59.000Z

179

Radio frequency emission from high-pressure xenon arcs: A systematic experimental analysis of the underlying near-anode plasma instability  

SciTech Connect (OSTI)

High-pressure Xe discharge lamps at DC operation can show unwanted strong RF (radio-frequency) emission to beyond 1 GHz, correlated to a sharp periodic lamp-voltage instability in the near-anode plasma with a pulse repetition rate {epsilon} of 1-10 MHz. The physical origin of the instability is unclear. Here, its existence and pulse rate have been measured as a function of arc current I = 0.2-1.2 A and anode temperature T{sub a} = 1700-3400 K independently, in experimental lamps with pure-tungsten electrodes and a Xe operating pressure around p = 10 MPa. Surprisingly, the instability is not affected by I or current density j but exists if T{sub a} is lower than a threshold value around 2800-2900 K. The pulse rate {epsilon} is simply a rising linear function of the inverse anode temperature 1/T{sub a}, with only a small I-dependent correction. The average anode heat load is slightly lower in the unstable regime and possibly depends on {epsilon}. The results allow a consistent re-interpretation of earlier and present experimental observations and should be both a valuable help in practical lamp engineering and a tight constraint for future theories of this effect.

Hechtfischer, Ulrich [Philips Lighting, GBU Automotive Lamps, Technology, Philipsstrasse 8, 52068 Aachen (Germany)

2011-10-01T23:59:59.000Z

180

The determination of ranges of selected properties of an argon plasma using an electric arc of limited power  

E-Print Network [OSTI]

Discussion of Results VII Conclusions VIII Presentation of Data 20 24 26 33 35 References LIST OF FIGURES Figure Page Cathode Rear Plate Nozzle Flange 0 8 10 3A Collar and Cap Nozzle Schematic of Plasma Generator Energy Losses for Various... rate of cooling water through the cathode ibm/hr Mass of gas in cylinder at beginning of test Mass of gas in cylinder at end of test ibm Mass of gas in cylinder Stagnation pressure before nozzle in, Hg p s Stagnation pressure (corrected, i. e...

Farquhar, Bannister Wells

2012-06-07T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


181

Low voltage arc formation in railguns  

DOE Patents [OSTI]

A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile.

Hawke, R.S.

1985-08-05T23:59:59.000Z

182

Low voltage arc formation in railguns  

DOE Patents [OSTI]

A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile. 2 figs.

Hawke, R.S.

1987-11-17T23:59:59.000Z

183

Low voltage arc formation in railguns  

DOE Patents [OSTI]

A low voltage plasma arc is first established across the rails behind the projectile by switching a low voltage high current source across the rails to establish a plasma arc by vaporizing a fuse mounted on the back of the projectile, maintaining the voltage across the rails below the railgun breakdown voltage to prevent arc formation ahead of the projectile. After the plasma arc has been formed behind the projectile a discriminator switches the full energy bank across the rails to accelerate the projectile. A gas gun injector may be utilized to inject a projectile into the breech of a railgun. The invention permits the use of a gas gun or gun powder injector and an evacuated barrel without the risk of spurious arc formation in front of the projectile.

Hawke, Ronald S. (Livermore, CA)

1987-01-01T23:59:59.000Z

184

Role of GaAs surface clearing in plasma deposition of silicon nitride films for encapsulated annealing  

SciTech Connect (OSTI)

The role of GaAs surface cleaning and plasma reactor cleaning prior to deposition of silicon nitride films for encapsulated annealing has been investigated. X-ray photoelectron spectroscopy was employed to determine the surface characteristics of GaAs treated with HCl, HF, and NH4OH solutions preceded by a degreasing procedure. The HCl clean left the least amount of oxygen on the surface. Fluorine contamination resulting from the CF4 plasma used to clean the reactor was found to be located at the film-substrate interface by Auger electron spectroscopy with argon-ion sputtering. A modified deposition procedure was developed to eliminate the fluorine contamination. Plasma deposition of silicon nitride encapsulating films was found to modify the I-V characteristics of Schottky diodes subsequently formed on GaAs surface. The reverse current of the diodes was slightly reduced. Substrates implanted with Si at 100 keV and a dose of 5 x 10 to the 12th/sq cm showed a peak electron concentration of 1.7 x 10 to the 17th/cu cm at a depth of 0.1-micron with 60 percent activation after encapsulation and annealing at 800 C for 7 min. 9 references.

Valco, G.J.; Kapoor, V.J.

1985-06-01T23:59:59.000Z

185

Anode and Cathode Arcs  

Science Journals Connector (OSTI)

... we call an anode arc, produces a circular pit on the anode and a general roughening of the opposed cathode. Photomicrographs of single anode-type arcs were published1 before the ... arcs\tCathode arcs

L. H. GERMER; W. S. BOYLE

1955-11-26T23:59:59.000Z

186

Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition  

SciTech Connect (OSTI)

ZnO films deposited by plasma-enhanced atomic layer deposition (PEALD) have been used to investigate resistive memory behavior. The bipolar resistance switching properties were observed in the Al/PEALD-ZnO/Pt devices. The resistance ratio for the high and low resistance states (HRS/LRS) is more than 10{sup 3}, better than ZnO devices deposited by other methods. The dominant conduction mechanisms of HRS and LRS are trap-controlled space charge limited current and Ohmic behavior, respectively. The resistive switching behavior is induced upon the formation/disruption of conducting filaments. This study demonstrated that the PEALD-ZnO films have better properties for the application in 3D resistance random access memory.

Zhang Jian; Yang Hui; Zhang Qilong [Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027 (China)] [Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027 (China); Dong Shurong [Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027 (China)] [Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027 (China); Luo, J. K. [Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027 (China) [Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027 (China); Institute of Material Research and Innovation, Bolton University, Deane Road, Bolton BL3 5AB (United Kingdom)

2013-01-07T23:59:59.000Z

187

DEPOSITION OF FUEL PELLETS INJECTED INTO TOKAMAK PLASMAS Larry R. Baylor, T. C. Jernigan C. Hsieh  

E-Print Network [OSTI]

reactor grade tokamak. In the ideal case, the pellet deposition is expected to follow directly from occurs during the flow along field lines that may be driven by B effects. A comparison of the deposition, or pellet deposition, is very important in developing fueling systems for a reactor device that can achieve

188

High rate (?3 nm/s) deposition of dense silicon nitride films at low substrate temperatures (plasma and substrate biasing  

Science Journals Connector (OSTI)

The deposition of amorphous silicon nitride (a-SiNx:H) films at high deposition rates (?3 nm/s) and at low substrate temperatures (plasma technique operated on an Ar–NH3–SiH4 reactant mixture. To increase the atomic density of the films by ion bombardment, low frequency (lf, 400 kHz) and radio-frequency (rf, 13.6 MHz) substrate biasing has been employed during deposition such that the ions are accelerated towards the substrate up to energies of ?250 eV. From spectroscopic ellipsometry and Rutherford backscattering measurements, it is demonstrated that the film density increases with increasing substrate bias even under these high deposition rate conditions. An increase in film atomic density from 7.6×1022 cm?3 to 8.8×1022 cm?3 has been observed for rf biasing when going from almost zero substrate bias to a bias voltage of ?250 V. It is shown that this increased film density reduces the oxygen content in the a-SiNx:H caused by post-deposition oxygen and/or moisture permeation by more than 50%.

F.J.H. van Assche; W.M.M. Kessels; R. Vangheluwe; W.S. Mischke; M. Evers; M.C.M. van de Sanden

2005-01-01T23:59:59.000Z

189

Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications  

Science Journals Connector (OSTI)

This paper describes a systematic approach to analyze the simultaneous impact of various reactant plasma parameters of remote plasma enhanced ALD (PEALD) on the ZnO thin film properties. Particular emphasis is placed on the film stoichiometry which affects the electrical properties of the thin film. Design of Experiment (DOE) is used to study the impact of the oxygen plasma parameters such as the RF power, pressure and plasma time to realize semiconductor quality of ZnO thin film. Based on the optimized plasma condition, staggered bottom-gate \\{TFTs\\} were fabricated and its electrical characteristics were measured.

S.M. Sultan; O.D. Clark; T.B. Masaud; Q. Fang; R. Gunn; M.M.A. Hakim; K. Sun; P. Ashburn; H.M.H. Chong

2012-01-01T23:59:59.000Z

190

Decomposition of Naphthalene by dc Gliding Arc Gas Discharge  

Science Journals Connector (OSTI)

Decomposition of Naphthalene by dc Gliding Arc Gas Discharge ... In the air and oxygen gliding arc discharges, the naphthalene degradation is mainly governed by reactions with oxygen-derived radicals. ... Therefore, the local electric field strength is relatively low in argon gliding arc plasma. ...

Liang Yu; Xiaodong Li; Xin Tu; Yu Wang; Shengyong Lu; Jianhua Yan

2009-12-11T23:59:59.000Z

191

The effect of solids and dispersant loadings on the suspension viscosities and deposition rates of suspension plasma sprayed YSZ coatings  

Science Journals Connector (OSTI)

Suspension plasma spraying (SPS) is a promising modification of traditional plasma spraying techniques that uses small (? 2 ?m) particles suspended in a liquid to fabricate coatings with fine microstructures and controlled porosity rapidly and without the need for post-deposition heat treatments. These qualities make SPS an interesting new technique to manufacture solid oxide fuel cell (SOFC) active layers. However, in order to be able to manufacture layers with good microstructures, the properties of the feedstock suspension must be optimized to enhance particle dispersion and improve feedability. This study uses a pressurized gas delivery system to feed aqueous YSZ suspensions containing an organic dispersant to a Northwest Mettech Axial III axial injection suspension plasma spray system. Three different dispersant types (polyacrylic acid (PAA), polyethylene imine (PEI) and 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA)) were characterized and the effects of solid loadings, dispersant type, and dispersant concentration on suspension properties such as viscosity and feedability, and layer characteristics such as microstructure and deposited thickness were examined.

D. Waldbillig; O. Kesler

2009-01-01T23:59:59.000Z

192

Atmospheric pressure plasma chemical deposition by using dielectric barrier discharge system.  

E-Print Network [OSTI]

??During the last decade atmospheric pressure plasma sources have been very successful in various practical applications such as surface cleaning, modification and sterilization. Lately thin… (more)

Hong, Jungmi

2013-01-01T23:59:59.000Z

193

Ion–assisted sputter deposition  

Science Journals Connector (OSTI)

...formation of special micro- and nano-features...plasma of a vacuum arc of macroparticles...Microstruc- ture and oxidation resistance of Ti1-x-y-zAlxCryYzN...combined steered- arc/unbalanced-magnetron-sputter...UBM) and combined arc/unbalanced magnetron...High temperature oxidation of (Ti1-xAlx...

2004-01-01T23:59:59.000Z

194

Arc Vault Significantly Reduces Electrical Hazards | GE Global...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

The transfer of arc flash energy is accomplished by triggering an ablative plasma gun to generate a 3-phase fault within a safe containment. The plasma gun operates in few...

195

Exploring high temperature phenomena related to post-detonation using an electric arc  

SciTech Connect (OSTI)

We report a study of materials recovered from a uranium-containing plasma generated by an electric arc. The device used to generate the arc is capable of sustaining temperatures of an eV or higher for up to 100??s. Samples took the form of a 4??m-thick film deposited onto 8 pairs of 17??m-thick Cu electrodes supported on a 25??m-thick Kapton backing and sandwiched between glass plates. Materials recovered from the glass plates and around the electrode tips after passage of an arc were characterized using scanning and transmission electron microscopy. Recovered materials included a variety of crystalline compounds (e.g., UO{sub 2}, UC{sub 2}, UCu{sub 5},) as well as mixtures of uranium and amorphous glass. Most of the materials collected on the glass plates took the form of spherules having a wide range of diameters from tens of nanometers to tens of micrometers. The composition and size of the spherules depended on location, indicating different chemical and physical environments. A theoretical analysis we have carried out suggests that the submicron spherules presumably formed by deposition during the arc discharge, while at the same time the glass plates were strongly heated due to absorption of plasma radiation mainly by islands of deposited metals (Cu, U). The surface temperature of the glass plates is expected to have risen to ?2300?K thus producing a liquefied glass layer, likely diffusions of the deposited metals on the hot glass surface and into this layer were accompanied by chemical reactions that gave rise to the observed materials. These results, together with the compact scale and relatively low cost, suggest that the experimental technique provides a practical approach to investigate the complex physical and chemical processes that occur when actinide-containing material interacts with the environment at high temperature, for example, during fallout formation following a nuclear detonation.

Dai, Z. R., E-mail: dai1@llnl.gov; Crowhurst, J. C.; Grant, C. D.; Knight, K. B.; Tang, V.; Chernov, A. A.; Cook, E. G.; Lotscher, J. P.; Hutcheon, I. D. [Lawrence Livermore National Laboratory, Livermore, California 94551-0808 (United States)

2013-11-28T23:59:59.000Z

196

Multifunctional bulk plasma source based on discharge with electron injection  

SciTech Connect (OSTI)

A bulk plasma source, based on a high-current dc glow discharge with electron injection, is described. Electron injection and some special design features of the plasma arc emitter provide a plasma source with very long periods between maintenance down-times and a long overall lifetime. The source uses a sectioned sputter-electrode array with six individual sputter targets, each of which can be independently biased. This discharge assembly configuration provides multifunctional operation, including plasma generation from different gases (argon, nitrogen, oxygen, acetylene) and deposition of composite metal nitride and oxide coatings.

Klimov, A. S.; Medovnik, A. V. [Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050 (Russian Federation); Tyunkov, A. V. [Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050 (Russian Federation); Institute of High Current Electronics, Tomsk 634055 (Russian Federation); Savkin, K. P.; Shandrikov, M. V.; Vizir, A. V. [Institute of High Current Electronics, Tomsk 634055 (Russian Federation)

2013-01-15T23:59:59.000Z

197

PROCEDURES FOR ARC PROJECTS  

E-Print Network [OSTI]

PROCEDURES FOR ARC PROJECTS Revised - May 2013 Agricultural Research Center Washington State University #12;Table of Contents THE PROJECT SYSTEM, AN INTRODUCTION................................................................................. 5 DEVELOPING AN ARC PROJECT

Collins, Gary S.

198

Molybdenum Coatings with Filtration of Plasma Flow  

SciTech Connect (OSTI)

Deposition of molybdenum coatings in arc discharge with assistance of HF one is analyzed in this paper. To avoid substrate heating to high temperature and micro-arc formation during cleaning process, the surface cleaning was carried out with HF plasma only. For reduction of droplet fraction in plasma the 'freestanding' filter was utilized. As a filter a solenoid was used, which generated a curvilinear (with the angle of 90 deg.) transportation magnetic field. The effective crosssectional area of the plasma flow at which was observed the uniform distribution of the thickness of the applied coating, was equal to 113 sm{sup 2}. The coating on the base of arc discharge, filter and HF-biasing of substrate were deposited on different substrates, including glass and stainless steel.The optical (refractive index) properties of molybdenum films are presented. The reflective characteristics of the obtained molybdenum films in the range of wavelengths from 200 to 700 nm were measured.Molybdenum films were also investigated under the effect of the plasma emission, using an ECR discharge in a simple double-mirror magnetic trap. The time varying negative potential was supplied to sample holder what provided a wide energy distribution of ions bombarded the sample surface in range 30...1500V.

Gasilin, V. V.; Nezovibat'ko, Y. N.; Shvets, O. M.; Taran, V. S.; Tereshin, V. I.; Timoshenko, A. I.; Zavaleev, V. A. [National Science Center Kharkov Institute of Physics and Technology, Akademicheskaya 1, 61108, Kharkov (Ukraine)

2008-03-19T23:59:59.000Z

199

Plasma Chem Plasma Process 28 (2008):123146  

E-Print Network [OSTI]

in the literature, they are namely the arc discharge, the laser ablation and the catalytic chemical vapor deposition. In the laser ablation [1] and in the electric arc [2] methods, gas temperature is supposed to be above

Paris-Sud XI, Université de

200

Comparative band alignment of plasma-enhanced atomic layer deposited high-k dielectrics on gallium nitride  

SciTech Connect (OSTI)

Al{sub 2}O{sub 3} films, HfO{sub 2} films, and HfO{sub 2}/Al{sub 2}O{sub 3} stacked structures were deposited on n-type, Ga-face, GaN wafers using plasma-enhanced atomic layer deposition (PEALD). The wafers were first treated with a wet-chemical clean to remove organics and an in-situ combined H{sub 2}/N{sub 2} plasma at 650 Degree-Sign C to remove residual carbon contamination, resulting in a clean, oxygen-terminated surface. This cleaning process produced slightly upward band bending of 0.1 eV. Additional 650 Degree-Sign C annealing after plasma cleaning increased the upward band bending by 0.2 eV. After the initial clean, high-k oxide films were deposited using oxygen PEALD at 140 Degree-Sign C. The valence band and conduction band offsets (VBOs and CBOs) of the Al{sub 2}O{sub 3}/GaN and HfO{sub 2}/GaN structures were deduced from in-situ x-ray and ultraviolet photoemission spectroscopy (XPS and UPS). The valence band offsets were determined to be 1.8 and 1.4 eV, while the deduced conduction band offsets were 1.3 and 1.0 eV, respectively. These values are compared with the theoretical calculations based on the electron affinity model and charge neutrality level model. Moreover, subsequent annealing had little effect on these offsets; however, the GaN band bending did change depending on the annealing and processing. An Al{sub 2}O{sub 3} layer was investigated as an interfacial passivation layer (IPL), which, as results suggest, may lead to improved stability, performance, and reliability of HfO{sub 2}/IPL/GaN structures. The VBOs were {approx}0.1 and 1.3 eV, while the deduced CBOs were 0.6 and 1.1 eV for HfO{sub 2} with respect to Al{sub 2}O{sub 3} and GaN, respectively.

Yang Jialing; Eller, Brianna S.; Zhu Chiyu; England, Chris; Nemanich, Robert J. [Department of Physics, Arizona State University, Tempe, Arizona 85287-1504 (United States)

2012-09-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


201

Method for minimizing decarburization and other high temperature oxygen reactions in a plasma sprayed material  

DOE Patents [OSTI]

A method is disclosed for spray coating material which employs a plasma gun that has a cathode, an anode, an arc gas inlet, a first powder injection port, and a second powder injection port. A suitable arc gas is introduced through the arc gas inlet, and ionization of the arc gas between the cathode and the anode forms a plasma. The plasma is directed to emenate from an open-ended chamber defined by the boundary of the anode. A coating is deposited upon a base metal part by suspending a binder powder within a carrier gas that is fed into the plasma through the first powder injection port; a material subject to degradation by high temperature oxygen reactions is suspended within a carrier gas that is fed into the plasma through the second injection port. The material fed through the second injection port experiences a cooler portion of the plasma and has a shorter dwell time within the plasma to minimize high temperature oxygen reactions. The material of the first port and the material of the second port intermingle within the plasma to form a uniform coating having constituent percentages related to the powder-feed rates of the materials through the respective ports.

Lenling, William J. (Madison, WI); Henfling, Joseph A. (Bosque Farms, NM); Smith, Mark F. (Albuquerque, NM)

1993-06-08T23:59:59.000Z

202

Mechanism of current redistribution between jets in a double-jet electric arc  

Science Journals Connector (OSTI)

Characteristics of a double-jet electric arc have been determined by numerical simulation of ... plasma electrodes, along which the character of arc discharge changes from self-sustained to non-self-...

E. B. Kulumbaev; T. B. Nikulicheva

2013-01-01T23:59:59.000Z

203

Epitaxial growth of Si1 ? xGex alloys and Ge on Si(100) by electron-cyclotron-resonance Ar plasma chemical vapor deposition without substrate heating  

Science Journals Connector (OSTI)

Abstract By using electron-cyclotron-resonance (ECR) Ar-plasma chemical vapor deposition (CVD) without substrate heating, the epitaxial growth process of Si1 ? xGex alloy and Ge films deposited directly on dilute-HF-treated Si(100) was investigated. From the reflection high energy electron diffraction patterns of the deposited Si1 ? xGex alloy (x = 0.50, 0.75) and Ge films on Si(100), it is confirmed that epitaxial growth can be realized without substrate heating, and that crystallinity degradation at larger film thickness is observed. The X-ray diffraction peak of the epitaxial films reveals the existence of large compressive strain, which is induced by lattice matching with the Si(100) substrate at smaller film thicknesses, as well as strain relaxation behavior at larger film thicknesses. The Ge fraction of Si1 ? xGex thin film is in good agreement with the normalized GeH4 partial pressure. The Si1 ? xGex deposition rate increases with an increase of GeH4 partial pressure. The GeH4 partial pressure dependence of partial deposition rates [(Si or Ge fraction) × (Si1 ? xGex thickness) / (deposition time)] shows that the Si partial deposition rate is slightly enhanced by the existence of Ge. From these results, it is proposed that the ECR-plasma CVD process can be utilized for Ge fraction control in highly-strained heterostructure formation of group IV semiconductors.

Naofumi Ueno; Masao Sakuraba; Junichi Murota; Shigeo Sato

2014-01-01T23:59:59.000Z

204

Experimental Study on Gasoline Reforming Assisted by Nonthermal Arc Discharge  

Science Journals Connector (OSTI)

The gasoline conversion efficiency decreased when the electric discharge regime was changing from continuous to gliding arc and from gliding to streamer. ... Compared with catalytic reformers, plasma devices have so far lower performances, which is explained by the early stage of research on nonthermal plasma reforming and the need of an external energy input (electricity). ... and design of the plasma reactor, composed of two gliding arc discharges in series, were detailed. ...

Jean-Damien Rollier; José Gonzalez-Aguilar; Guillaume Petitpas; Adeline Darmon; Laurent Fulcheri; Rudolf Metkemeijer

2007-12-06T23:59:59.000Z

205

Plasma immersion ion implantation on polymers.  

E-Print Network [OSTI]

??The focus of this thesis is to achieve plasma based surface modification of polymers. Highly ionized carbon plasma was generated from a filtered cathodic arc… (more)

Sze, Jia Yin.

2010-01-01T23:59:59.000Z

206

Controlled deposition of sulphur-containing semiconductor and dielectric nano-structured films on metals in SF{sub 6} ion-ion plasma  

SciTech Connect (OSTI)

In the present paper, the deposition processes and formation of films in SF{sub 6} ion-ion plasma, with positive and negative ion flows accelerated to the surface, are investigated. The PEGASES (acronym for Plasma Propulsion with Electronegative GASES) source is used as an ion-ion plasma source capable of generating almost ideal ion-ion plasma with negative ion to electron density ratio more than 2500. It is shown that film deposition in SF{sub 6} ion-ion plasma is very sensitive to the polarity of the incoming ions. The effect is observed for Cu, W, and Pt materials. The films formed on Cu electrodes during negative and positive ion assisted deposition were analyzed. Scanning electron microscope analysis has shown that both positive and negative ion fluxes influence the copper surface and leads to film formation, but with different structures of the surface: the low-energy positive ion bombardment causes the formation of a nano-pored film transparent for ions, while the negative ion bombardment leads to a continuous smooth insulating film. The transversal size of the pores in the porous film varies in the range 50–500 nm, and further analysis of the film has shown that the film forms a diode together with the substrate preventing positive charge drain, and positive ions are neutralized by passing through the nano-pores. The film obtained with the negative ion bombardment has an insulating surface, but probably with a multi-layer structure: destroying the top surface layer allows to measure similar “diode” IV-characteristics as for the nano-pored film case. Basing on results, practical conclusions for the probes and electrodes cleaning in ion-ion SF{sub 6} plasmas have been made. Different applications are proposed for the discovered features of the controlled deposition from ion-ion plasmas, from Li-sulphur rechargeable batteries manufacturing and nanofluidics issues to the applications for microelectronics, including low-k materials formation.

Rafalskyi, Dmytro; Bredin, Jérôme; Aanesland, Ane [LPP, CNRS–Ecole Polytechnique, 91128 Palaiseau cedex (France)] [LPP, CNRS–Ecole Polytechnique, 91128 Palaiseau cedex (France)

2013-12-07T23:59:59.000Z

207

Deposition Process  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Pulsed Plasma Processing Pulsed Plasma Processing NEW: Downloadable: Invited Talk "Pulsed Metal Plasmas," presented at the 2006 AVS Meeting, San Francisco, California, November 15, 2006. (PDF, file size 8 MB). Plasma Sources for Window Coatings Deposition processes for low-emittance and solar control coatings can be improved through the use of advanced plasma technology developed at LBNL. A new type of constricted glow-discharge plasma source was selected for the 1997 R&D 100 Award. Invented by LBNL researchers Andre Anders, Mike Rubin, and Mike Dickinson, the source was designed to be compatible with industrial vacuum deposition equipment and practice. Construction is simple, rugged and inexpensive. It can operate indefinitely over a wide range of chamber pressure without any consumable parts such as filaments or grids. Several different gases including Argon, Oxygen and Nitrogen have been tested successfully.

208

Plasma-enriched chemical vapor deposition of silicon nitride on silicon carbide fibers  

SciTech Connect (OSTI)

Near stoichiometric Si:N coatings were deposited by means of PECVD on SCS-6 SiC fibers which contained a carbon-rich coating. Weight loss associated with oxidation of the outer carbon-rich coating of the as-received SiC fibers was greatly reduced for the Si:N coated SiC fibers even after 10 h heat-treatment in oxygen at 800{degrees}C. Auger Electron Spectroscopy (AES) was used to obtain elemental compositions of the as-received and Si:N coated SiC fibers after heat-treatment. Negligible amounts of oxygen were found at the carbon-rich coating of the heat-treated Si:N coated SiC fiber. These results clearly prove the effectiveness of PECVD silicon nitride coating as an oxygen diffusion barrier.

Stinespring, C.D.; Collazos, D.F.; Gupta, R.K. [West Virginia Univ., Morgantown, WV (United States)] [and others

1994-12-31T23:59:59.000Z

209

Temperature measurement of an atmospheric pressure arc discharge plasma jet using the diatomic CN (B {sup 2}{sigma}{sup +}-X {sup 2}{sigma}{sup +}, violet system) molecular spectra  

SciTech Connect (OSTI)

The CN (B {sup 2}{sigma}{sup +}-X {sup 2}{sigma}{sup +}) molecular emission spectrum is used to measure both the vibrational and rotational temperatures in atmospheric pressure arc jet discharges. The vibrational and rotational temperature effects on the synthetic diatomic molecular spectra were investigated from the (v{sup '},v{sup ''})=(0,0) band to the (5,5) band. The temperatures obtained from the synthetic spectra compared with the experimental result of a low-frequency arc discharge show a vibrational temperature of (4250-5010) K and a rotational temperature of (3760-3980) K for the input power in the range of (80-280) W. As the (0,0) band is isolated from other vibrational transition bands, determination of the rotational temperature is possible based only on the (0,0) band, which simplifies the temperature measurement. From the result, it was found that the CN molecular spectrum can be used as a thermometer for atmospheric pressure plasmas containing carbon and nitrogen.

Moon, Se Youn; Kim, D. B.; Gweon, B.; Choe, W. [Department of Physics, Korea Advanced Institute of Science and Technology, 335 Gwahangno, Yuseong-gu, Daejeon 305-701 (Korea, Republic of)

2009-03-01T23:59:59.000Z

210

Interactions between radical growth precursors on plasma-deposited silicon thin-film surfaces  

SciTech Connect (OSTI)

We present a detailed analysis of the interactions between growth precursors, SiH{sub 3} radicals, on surfaces of silicon thin films. The analysis is based on a synergistic combination of density functional theory calculations on the hydrogen-terminated Si(001)-(2x1) surface and molecular-dynamics (MD) simulations of film growth on surfaces of MD-generated hydrogenated amorphous silicon (a-Si:H) thin films. In particular, the authors find that two interacting growth precursors may either form disilane (Si{sub 2}H{sub 6}) and desorb from the surface, or disproportionate, resulting in the formation of a surface dihydride (adsorbed SiH{sub 2} species) and gas-phase silane (SiH{sub 4}). The reaction barrier for disilane formation is found to be strongly dependent on the local chemical environment on the silicon surface and reduces (or vanishes) if one/both of the interacting precursors is/are in a ''fast diffusing state,'' i.e., attached to fivefold coordinated surface Si atoms. Finally, activation energy barriers in excess of 1 eV are obtained for two chemisorbed (i.e., bonded to a fourfold coordinated surface Si atom) SiH{sub 3} radicals. Activation energy barriers for disproportionation follow the same tendency, though, in most cases, higher barriers are obtained compared to disilane formation reactions starting from the same initial configuration. MD simulations confirm that disilane formation and disproportionation reactions also occur on a-Si:H growth surfaces, preferentially in configurations where at least one of the SiH{sub 3} radicals is in a ''diffusive state.'' Our results are in agreement with experimental observations and results of plasma process simulators showing that the primary source for disilane in low-power plasmas may be the substrate surface.

Bakos, Tamas; Valipa, Mayur S.; Maroudas, Dimitrios [Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-3110 (United States)

2007-03-21T23:59:59.000Z

211

Effect of electric arc discharge on hypersonic blunt body drag  

Science Journals Connector (OSTI)

Experimental results on the effect of energy deposition using an electric arc discharge, upstream of a 60°...half angle blunt cone configuration in a hypersonic flow is reported.Investigations involving drag meas...

K. Satheesh; G. Jagadeesh

2009-01-01T23:59:59.000Z

212

AdaptiveARC | Open Energy Information  

Open Energy Info (EERE)

AdaptiveARC AdaptiveARC Jump to: navigation, search Name AdaptiveARC Address 7683 Sitio Manana Place Carlsbad, California Zip 92009 Sector Biomass Product Waste-to-clean-energy startup is developing an arc-plasma reactor Website http://www.adaptivearc.com/ Coordinates 33.07959°, -117.22539° Loading map... {"minzoom":false,"mappingservice":"googlemaps3","type":"ROADMAP","zoom":14,"types":["ROADMAP","SATELLITE","HYBRID","TERRAIN"],"geoservice":"google","maxzoom":false,"width":"600px","height":"350px","centre":false,"title":"","label":"","icon":"","visitedicon":"","lines":[],"polygons":[],"circles":[],"rectangles":[],"copycoords":false,"static":false,"wmsoverlay":"","layers":[],"controls":["pan","zoom","type","scale","streetview"],"zoomstyle":"DEFAULT","typestyle":"DEFAULT","autoinfowindows":false,"kml":[],"gkml":[],"fusiontables":[],"resizable":false,"tilt":0,"kmlrezoom":false,"poi":true,"imageoverlays":[],"markercluster":false,"searchmarkers":"","locations":[{"text":"","title":"","link":null,"lat":33.07959,"lon":-117.22539,"alt":0,"address":"","icon":"","group":"","inlineLabel":"","visitedicon":""}]}

213

Deposition of yttria-stabilized zirconia thermal barrier coatings by laser-assisted plasma coating at atmospheric pressure.  

E-Print Network [OSTI]

??This thesis details the design and construction of a microwave generation system, and a coaxial cylindrical plasma torch, where an atmospheric-pressure plasma (APP) can be… (more)

Ouyang, Zihao

2011-01-01T23:59:59.000Z

214

Plasma rotation and NTM onset driven by central EC deposition in TCV tokamak  

SciTech Connect (OSTI)

The effects of the central electron cyclotron heating (ECH) and current drive (ECCD) on the spontaneous plasma rotation and on the presence of Tearing Modes (TM), observed in the TCV tokamak[1], were recently investigated as an interplay between the toroidal velocity and NTM onset in absence of sawteeth, ELMs and error fields [2–3]. In a set of reproducible TCV discharges (I{sub p}? ?150 kA, B{sub t}? ?1.4 T, ne,{sub av?} 1.5 10{sup 19} m{sup ?3}, T{sub e}? 3 keV and T{sub i}?0.25 keV, q{sub 95}?5.8) with both pure EC heating and current drive the cnt-Ip toroidal velocity was observed to be reduced with subsequent co-Ip appearance of 3/2 and 2/1 modes during the ramp up EC phases. The understanding of the capability of the on-axis EC power to modify the rotation profiles before and after the TM onset and of the sudden disappearance of 3/2 mode when 2/1 starts is the main purpose of this work. The velocity profile modifications are due to a direct effect of the EC absorbed power and also related to some variation of the perpendicular diffusion of the toroidal momentum and to magnetic braking effects of the kind of neoclassical toroidal viscosity (NTV) due to the NTM resonant field perturbations associated to the presence of TM. Numerical investigations are performed using a 1D toroidal momentum balance equation including contributions by external sources, as EC power, and NTV torques. Furthermore, the combined evolution of the 3/2 and 2/1 modes requires considering also coupling effects included in a generalized Rutherford equation for the modelling of the TM time growth.

Nowak, S.; Lazzaro, E. [Istituto di Fisica del Plasma CNR, Euratom Association, 20125 Milano (Italy); Sauter, O.; Canal, G.; Duval, B.; Federspiel, L.; Karpushov, A. N.; Kim, D.; Reimerders, H.; Rossel, J.; Testa, D.; Wagner, D. [Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas (CRPP), Association EURATOM-Confederation Suisse, 1015 Lausanne (Switzerland); Raju, D. [Institute for Plasma Research, Bhat, Gandhinagar, Gujarat (India); Collaboration: TCV Team

2014-02-12T23:59:59.000Z

215

Theoretical analysis of ARC constriction  

SciTech Connect (OSTI)

The physics of the thermionic converter is governed by strong electrode-plasma interactions (emissions surface scattering, charge exchange) and weak interactions (diffusion, radiation) at the maximum interelectrode plasma radius. The physical processes are thus mostly convective in thin sheaths in front of the electrodes and mostly diffusive and radiative in the plasma bulk. The physical boundaries are open boundaries to particle transfer (electrons emitted or absorbed by the electrodes, all particles diffusing through some maximum plasma radius) and to convective, conductive and radiative heat transfer. In a first approximation the thermionic converter may be described by a one-dimensional classical transport theory. The two-dimensional effects may be significant as a result of the sheath sensitivity to radial plasma variations and of the strong sheath-plasma coupling. The current-voltage characteristic of the converter is thus the result of an integrated current density over the collector area for which the boundary conditions at each r determine the regime (ignited/unignited) of the local current density. A current redistribution strongly weighted at small radii (arc constriction) limits the converter performance and opens questions on constriction reduction possibilities. The questions addressed are the followng: (1) what are the main contributors to the loss of current at high voltage in the thermionic converter; and (2) is arc constriction observable theoretically and what are the conditions of its occurrence. The resulting theoretical problem is formulated and results are given. The converter electrical current is estimated directly from the electron and ion particle fluxes based on the spatial distribution of the electron/ion density n, temperatures T/sub e/, T/sub i/, electrical voltage V and on the knowledge of the transport coefficients. (WHK)

Stoenescu, M.L.; Brooks, A.W.; Smith, T.M.

1980-12-01T23:59:59.000Z

216

Low-temperature formation of Si O 2 layers using a two-step atmospheric pressure plasma-enhanced deposition-oxidation process  

Science Journals Connector (OSTI)

Silicon oxide ( Si O 2 ) layers were fabricated at low temperatures ( ? 400 ° C ) by combining the deposition of hydrogenated amorphous Si ( a - Si : H ) with its oxidation using atmospheric pressure plasmas excited by a 150 MHz very high-frequency (VHF) power. The surface excitation by the atmospheric pressure VHF plasma was capable of reducing the temperature for the hydrogen effusion from a - Si : H . As a result a porous a - Si : H film containing a large amount of hydrogen could be transformed into a stoichiometric Si O 2 with an approximately 24% increase in oxidation rate compared with the oxidation of Si(001) at a temperature of 400 ° C .

Hiroaki Kakiuchi; Hiromasa Ohmi; Makoto Harada; Heiji Watanabe; Kiyoshi Yasutake

2007-01-01T23:59:59.000Z

217

Characteristics of high-purity Cu thin films deposited on polyimide by radio-frequency Ar/H2 atmospheric-pressure plasma jet  

Science Journals Connector (OSTI)

With a view to fabricating future flexible electronic devices an atmospheric-pressure plasma jet driven by 13.56?MHz radio-frequency power is developed for depositing Cu thin films on polyimide where a Cu wire inserted inside the quartz tube was used as the evaporation source. A polyimide substrate is placed on a water-cooled copper heat sink to prevent it from being thermally damaged. With the aim of preventing oxidation of the deposited Cu film we investigated the effect of adding H2 to Ar plasma on film characteristics. Theoretical fitting of the OH emission line in OES spectrum revealed that adding H2 gas significantly increased the rotational temperature roughly from 800 to 1500?K. The LMM Auger spectroscopy analysis revealed that higher-purity Cu films were synthesized on polyimide by adding hydrogen gas. A possible explanation for the enhancement in the Cu film deposition rate and improvement of purity of Cu films by H2 gas addition is that atomic hydrogen produced by the plasma plays important roles in heating the gas to promote the evaporation of Cu atoms from the Cu wire and removing oxygen from copper oxide components via reduction reaction.

P. Zhao; W. Zheng; Y. D. Meng; M. Nagatsu

2013-01-01T23:59:59.000Z

218

Use of SiBN and SiBON films prepared by plasma enhanced chemical vapor deposition from borazine as interconnection dielectrics  

SciTech Connect (OSTI)

Thin films of silicon boron nitride (SiBN) of typical composition Si{sub 0.09}B{sub 0.39}N{sub 0.51} and silicon boron oxynitride (SiBON) of typical composition Si{sub 0.16}B{sub 0.29}O{sub 0.41}N{sub 0.14} were prepared by plasma enhanced chemical vapor deposition and the properties of these films were evaluated with respect to their suitability as interconnection dielectrics in microelectronic fabrication. Films were deposited on 125 mm silicon substrates in a parallel-plate reactor at a substrate temperature of 400 C and a plasma power of 0.5 W/cm{sup 2}. Boron nitride, for comparison of electrical properties, was deposited from borazine (B{sub 3}N{sub 3}H{sub 6}); silicon boron nitride was deposited from borazine, disilane (Si{sub 2}H{sub 6}), and ammonia (NH{sub 3}); silicon boron oxynitride was deposited from borazine, disilane, ammonia, and nitrous oxide (N{sub 2}O). Metal-insulator-metal capacitors were fabricated and electrical measurements indicated that all three films had excellent dielectric properties with dielectric constants of 4.1, 4.7, and 3.9 for BN, SiBN, and SiBON, respectively. Tests of conformality indicated that deposition into trenches with an aspect ratio of 4:1 gave conformality greater than 70%. Silicon boron oxynitride was shown to be an excellent barrier to the diffusion of copper. A planar, single level metal-insulator structure was constructed using a SiBN/SiBON insulator with copper metallization.

Kane, W.F.; Cohen, S.A.; Hummel, J.P.; Luther, B. [IBM Research Div., Yorktown Heights, NY (United States). T.J. Watson Research Center; Beach, D.B. [Oak Ridge National Lab., TN (United States). Chemical and Analytical Sciences Div.

1997-02-01T23:59:59.000Z

219

Synthesis of carbon nanotubes on diamond-like carbon by the hot filament plasma-enhanced chemical vapor deposition method  

E-Print Network [OSTI]

by laser ablation of carbon rods, direct current arc-discharge between electrodes, or by chemical vapor emission scanning electron microscopy (FE-SEM), high resolution transmission scanning electron micro- scopy natural oxide. The synthesis of the DLC films was carried out using 13.56 MHz RF-PECVD. Prior to the DLC

Hong, Byungyou

220

Experimental evidence of chaotic behavior in atmospheric pressure arc discharge  

SciTech Connect (OSTI)

Thermal plasma technology is already playing an important role in the production of new materials, in the destruction of toxic wastes, and in the development of safer and more efficient manufacturing and material processing applications. In free burning as well as in stabilized arc columns, the inherent movement of arc root results in fluctuation in arc voltage. A full knowledge and control over the arc root dynamics can effectively lengthen the life time, drastically improve performance and reliability in arc plasma devices. In this paper, the authors experimentally investigate the fluctuating voltage signals generated from an atmospheric pressure arc discharge produced in a hollow electrode plasma torch. For the first time, analysis of these signals reveal them to exhibit chaotic behavior. The present analysis is supported with real time behavior, phase portraits, power spectra and Lyapunov exponents. Dependence of system behavior on various control parameters is also investigated. This approach is interesting in the sense that it can lead to better understanding of physics for future researches on arc plasma jets and related devices.

Ghorui, S.; Sahasrabudhe, S.N.; Murthy, P.S.S.; Das, A.K.; Venkatramani, N.

2000-02-01T23:59:59.000Z

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221

Plasma-Assisted Synthesis of TiO2 Nanorods by Gliding Arc Discharge Processing at Atmospheric Pressure for Photocatalytic Applications  

Science Journals Connector (OSTI)

The present study explores a new method of synthesis of TiO2 nano-particles in an aqueous medium from TiCl3 precursor by non-thermal plasma in humid air as feeding gas obtained at atmospheric pressure. The precur...

E. Acayanka; A. Tiya Djowe; S. Laminsi…

2013-08-01T23:59:59.000Z

222

Plasma window characterization  

SciTech Connect (OSTI)

Parameters of an arc Ar plasma discharge used as a plasma window with a discharge current of {approx}50 A and a voltage of {approx}58 V are presented. It is shown that this arc discharge allows one to decrease the pressure at the low pressure end of the plasma window almost 380 times using relatively low pumping at the low pressure end of the plasma window. Calculations of the plasma parameters and their spatial distribution using a simple wall-stabilized arc model showed a satisfactory agreement with the experimentally obtained data. It is shown that a significant decrease in gas flow through the plasma window occurs due to the increase in plasma viscosity. An improvement of the plasma window ignition and some of its design aspects are described as well.

Krasik, Ya. E.; Gleizer, S.; Gurovich, V.; Kronhaus, I.; Hershcovitch, A.; Nozar, P.; Taliani, C. [Physics Department, Technion, 32000 Haifa (Israel); Brookhaven National Laboratory, New York 11973-5000 (United States); Istituto per lo Studio dei Materiali Nanostrutturati, 40 129 Bologna (Italy)

2007-03-01T23:59:59.000Z

223

Hydrogen incorporation during deposition of a-Si:H from an intense source of SiH{sub 3}  

SciTech Connect (OSTI)

The incorporation of hydrogen during the fast deposition of a-Si:H from an expanding thermal arc is investigated by means of isotope labeling of the precursor gases silane and hydrogen. It is found that hydrogen in a-Si:H originates dominantly from the silyl radical. A small fraction of the hydrogen in a-Si:H is due to exchange reaction of atomic hydrogen in the plasma with hydrogen chemisorbed on the surface during growth.

Van de Sanden, M.C.M.; Severens, R.J.; Kessels, W.M.M.; Van de Pas, F.; Van Ijzendoorn, L.; Schram, D.C.

1997-07-01T23:59:59.000Z

224

Taupo's atypical arc  

Science Journals Connector (OSTI)

... many other continental arcs around the world, with andesite-dacite cone volcaaoes and relatively low geothermal heat fluxes. In sharp contrast, in the middle

Colin J. N. Wilson

1996-01-04T23:59:59.000Z

225

Interface effect on dielectric constant of HfO{sub 2}/Al{sub 2}O{sub 3} nanolaminate films deposited by plasma-enhanced atomic layer deposition  

SciTech Connect (OSTI)

The effect of the interface between Al{sub 2}O{sub 3} and HfO{sub 2} sublayers on the dielectric constant was investigated in HfO{sub 2}/Al{sub 2}O{sub 3} nanolaminate films deposited using plasma-enhanced atomic layer deposition. After annealing at 700 deg. C, the dielectric constants of the nanolaminate films with a sublayer thickness of 40 A ring or greater were the same as the calculated values for a series of capacitors consisting of amorphous Al{sub 2}O{sub 3} and monoclinic or tetragonal HfO{sub 2}. As the sublayer thickness was reduced to 10 A, the dielectric constant increased up to 17.7 because a thin Hf-O-Al mixture layer, of which the number increases drastically in the nanolaminate films with thin sublayers, is formed at the interface.

Park, Pan Kwi; Cha, Eun-Soo; Kang, Sang-Won [Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of)

2007-06-04T23:59:59.000Z

226

Chemistry, phase formation, and catalytic activity of thin palladium-containing oxide films synthesized by plasma-assisted physical vapor deposition  

SciTech Connect (OSTI)

The chemistry, microstructure, and catalytic activity of thin films incorporating palladium were studied using scanning and transmission electron microscopies, X-ray diffraction, spectrophotometry, 4-point probe and catalytic tests. The films were synthesized using pulsed filtered cathodic arc and magnetron sputter deposition, i.e. techniques far from thermodynamic equilibrium. Catalytic particles were formed by thermally cycling thin films of the Pd-Pt-O system. The evolution and phase formation in such films as a function of temperature were discussed in terms of the stability of PdO and PtO2 in air. The catalytic efficiency was found to be strongly affected by the chemical composition, with oxidized palladium definitely playing a major role in the combustion of methane. Reactive sputter deposition of thin films in the Pd-Zr-Y-O system allowed us forming microstructures ranging from nanocrystalline zirconia to palladium nanoparticles embedded in a (Zr,Y)4Pd2O matrix. The sequence of phase formation is put in relation to simple thermodynamic considerations.

Anders, Andre

2010-11-26T23:59:59.000Z

227

Thermodynamics and Kinetics Analysis of Gasoline Reforming Assisted by Arc Discharge  

Science Journals Connector (OSTI)

Thermodynamics and Kinetics Analysis of Gasoline Reforming Assisted by Arc Discharge ... In the first one, the electric discharge is accounted for as a homogeneous energy source inside the whole reactor. ... kinetic schemes, without inclusion of specific plasma processes, is sufficient for simulation of H prodn. in discharges with hot plasmas, in particular, in low-current arc discharges. ...

Jean-Damien Rollier; Guillaume Petitpas; José Gonzalez-Aguilar; Adeline Darmon; Laurent Fulcheri; Rudolf Metkemeijer

2008-04-18T23:59:59.000Z

228

Axial Distributions of Spectral Line Intensities in the Arc Under the Influence of External Rotating Magnetic Field  

Science Journals Connector (OSTI)

The influence of external rotating magnetic field (RMF) on the electric arc plasma, and therefore the axial distributions of the spectral line intensities and the atomic...

Pavlovic, B V; Mihailidi, T A

1981-01-01T23:59:59.000Z

229

Low-temperature formation of SiO{sub 2} layers using a two-step atmospheric pressure plasma-enhanced deposition-oxidation process  

SciTech Connect (OSTI)

Silicon oxide (SiO{sub 2}) layers were fabricated at low temperatures ({<=}400 deg. C) by combining the deposition of hydrogenated amorphous Si (a-Si:H) with its oxidation using atmospheric pressure plasmas excited by a 150 MHz very high-frequency (VHF) power. The surface excitation by the atmospheric pressure VHF plasma was capable of reducing the temperature for the hydrogen effusion from a-Si:H. As a result, a porous a-Si:H film containing a large amount of hydrogen could be transformed into a stoichiometric SiO{sub 2} with an approximately 24% increase in oxidation rate compared with the oxidation of Si(001) at a temperature of 400 deg. C.

Kakiuchi, Hiroaki; Ohmi, Hiromasa; Harada, Makoto; Watanabe, Heiji; Yasutake, Kiyoshi [Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)

2007-10-15T23:59:59.000Z

230

Dual-chamber plasma deposition of A-Si:H solar cells at high rates using disilane  

SciTech Connect (OSTI)

The use of a separated chamber deposition system for the fabrication of a-Si:H solar cells from disilane at high deposition rates results in a substantial improvement in short circuit current compared to that obtained from a single-chamber system. The spectral responses of cells fabricated in the dual-chamber mode are compared to those made in the single-chamber mode. The results are interpreted by assuming that the rate of removal of boron contaminants from the chamber is independent of deposition rate.

Rajeswaran, G.; Vanier, P.E.; Corderman, R.R.; Kampas, F.J.

1985-01-01T23:59:59.000Z

231

Generation of high charge state ions in vacuum arc ion sources by a ``current jump'' method  

SciTech Connect (OSTI)

In the investigation of ion charge state distributions (CSD) in vacuum arc plasmas, good correlation between increase in arc operating voltage and mean ion charge state has been established. Therefore, to increase the mean charge state of a vacuum arc plasma, it is necessary to find ways to increase the arc operating voltage. The voltage can be increased via transients associated with the arc current by means of which a rather high operation voltage can be established across the discharge gap. Experiments were performed both in Tomsk and Berkeley with the discharge system of a vacuum arc ion source. To effect a step current rise an additional power supply was connected to the usual vacuum arc supply. This power supply made it possible to increase the vacuum arc current up to 1 kA for several {micro}s. As a rule the current jump was produced after 100--200 {micro}s into the main discharge pulse when all principal parameters of the vacuum arc were already established. To measure the CSD a time-of-flight method was used. As followed from experiments, superposition of a short, high current pulse to the vacuum arc current pulse is accompanied by a jump in arc operation voltage. Subsequently during the current step the voltage falls exponentially to one hundred volts after the completion of the current jump, and the arc voltage takes its conventional value (20--40V). Because of this increase in arc operation voltage, an enhancement of high charge station ion fractions was observed. For example, with a Ti-cathode with conventional arc parameters there is only very small value to Ti{sup 4+} ion fraction in the vacuum arc plasma. Applying strong magnetic field increases the fraction of these ions up to 20% of the total beam current. The current jump enhanced this value up to 40%.

Bugaev, A.S.; Oks, E.M.; Yushkov, G.Y.; Brown, I.G.

1999-07-01T23:59:59.000Z

232

Electric arc saw apparatus  

DOE Patents [OSTI]

A portable, hand held electric arc saw has a small frame for supporting an electrically conducting rotary blade which serves as an electrode for generating an electric arc to erode a workpiece. Electric current is supplied to the blade by biased brushes and a slip ring which are mounted in the frame. A pair of freely movable endless belts in the form of crawler treads stretched between two pulleys are used to facilitate movement of the electric arc saw. The pulleys are formed of dielectric material to electrically insulate the crawler treads from the frame.

Deichelbohrer, Paul R [Richland, WA

1986-01-01T23:59:59.000Z

233

Welding arc initiator  

DOE Patents [OSTI]

An improved inert gas shielded tungsten arc welder is disclosed of the type wherein a tungsten electrode is shielded within a flowing inert gas, and, an arc, following ignition, burns between the energized tungsten electrode and a workpiece. The improvement comprises in combination with the tungsten electrode, a starting laser focused upon the tungsten electrode which to ignite the electrode heats a spot on the energized electrode sufficient for formation of a thermionic arc. Interference problems associated with high frequency starters are thus overcome. 3 figs.

Correy, T.B.

1989-05-09T23:59:59.000Z

234

Welding arc initiator  

DOE Patents [OSTI]

An improved inert gas shielded tungsten arc welder is disclosed of the type wherein a tungsten electrode is shielded within a flowing inert gas, and, an arc, following ignition, burns between the energized tungsten electrode and a workpiece. The improvement comprises in combination with the tungsten electrode, a starting laser focused upon the tungsten electrode which to ignite the electrode heats a spot on the energized electrode sufficient for formation of a thermionic arc. Interference problems associated with high frequency starters are thus overcome.

Correy, Thomas B. (Richland, WA)

1989-01-01T23:59:59.000Z

235

Measurement of total ion current from vacuum arc plasmasources  

SciTech Connect (OSTI)

The total ion current generated by a vacuum arc plasma source was measured. The discharge system investigated allowed ion collection from the arc plasma streaming through a hemispherical mesh anode with geometric transparency of 72 percent. A range of different cathode materials was investigated, and the arc current was varied over the range 50-500 A. We find that the normalized ion current (Iion/Iarc) depends on the cathode material, with values in the range from 5 percent to 19 percent and generally greater for elements of low cohesive energy. The application of a strong axial magnetic field in the cathode and arc region leads to increased normalized ion current, but only by virtue of enhanced ion charge states formed in a strong magnetic field.

Oks, Efim M.; Savkin, Konstantin P.; Yushkov, Georgiu Yu.; Nikolaev, Alexey G.; Anders, A.; Brown, Ian G.

2005-07-01T23:59:59.000Z

236

Colloquia Archive | Princeton Plasma Physics Lab  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Achieving 10MW Fusion Power in TFTR: a Retrospective November 18, 2014 Dr. Michael Bell Princeton Plasma Physics Laboratory COLLOQUIUM: Smaller & Sooner: The ARC Pilot Design for...

237

Effects of N{sub 2} remote plasma nitridation on the structural and electrical characteristics of the HfO{sub 2} gate dielectrics grown using remote plasma atomic layer deposition methods  

SciTech Connect (OSTI)

The characteristics of remote plasma atomic layer deposited HfO{sub 2} on Si, which has a very thin SiO{sub 2} interlayer with and without remote plasma nitridation (RPN), have been investigated. Small amounts of N atoms were successfully incorporated by RPN pretreatment, in which the dominant emission species were excited atomic nitrogen (N{sup *}) and excited molecular nitrogen (N{sub 2}{sup *}), into a very thin SiO{sub 2} interlayer for the growth of HfO{sub 2} thin film. The thin ({approx}1.5 nm) intermediate layer containing nitrogen, which was prepared by sequential O{sub 2} and N{sub 2} remote plasma treatment of the Si substrate, can effectively suppress growth of the unintentional interface layer. In addition, it enhances the thermal stability and the resistance to oxygen diffusion during rapid thermal annealing. The HfO{sub 2} film containing the remote plasma nitrided SiO{sub 2} interlayer annealed at 800 deg. C showed a lower equivalent oxide thickness of {approx}1.89 nm and a lower leakage current density (3.78x10{sup -7} A cm{sup -2} at |V{sub G}-V{sub FB}|=2 V) compared to a non-nitrided sample of the same physical thickness. Also, we compared the characteristics of HfO{sub 2} films annealed in two different ambient environments, N{sub 2} and O{sub 2}.

Choi, Jihoon; Kim, Seokhoon; Kim, Jinwoo; Kang, Hyunseok; Jeon, Hyeongtag; Bae, Choelhwyi [Division of Materials Science and Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Physics, North Carolina State University, Raleigh, North Carolina 27695 (United States)

2006-07-15T23:59:59.000Z

238

Dielectric properties of Ba{sub 0.6}Sr{sub 0.4}TiO{sub 3} thin films deposited by mist plasma evaporation using aqueous solution precursor  

SciTech Connect (OSTI)

Mist plasma evaporation (MPE) technique has been developed to deposit Ba{sub 0.6}Sr{sub 0.4}TiO{sub 3} (BST) thin films on SiO{sub 2}/Si and Pt/Ti/SiO{sub 2}/Si substrates at atmospheric pressure using metal nitrate aqueous solution as precursor. MPE is characterized by the injection of liquid reactants into thermal plasma where the source materials in the droplets are evaporated by the high temperature of the thermal plasma. Nanometer-scale clusters are formed in the tail flame of the plasma, and then deposited and rearranged on the substrate at a lower temperature. Due to the high temperature annealing process of the thermal plasma before deposition, well-crystallized BST films were deposited at substrate temperature of 630 deg. C. The dielectric constant and dielectric loss of the film at 100 kHz are 715 and 0.24, respectively. Due to the good crystallinity of the BST films deposited by MPE, high dielectric tunability up to 39.3% is achieved at low applied electric field of 100 kV cm{sup -1}.

Huang Hui; Shi Peng; Wang Minqiang; Yao Xi; Tan, O.K. [Electronic Materials Research Laboratory, Xi'an Jiaotong University, Xi'an 710049 (China); Microelectronics Center, School of EEE, Nanyang Technological University, 639798 Singapore (Singapore)

2006-06-01T23:59:59.000Z

239

Effect of a floating electrode on an atmospheric-pressure non-thermal arc discharge  

Science Journals Connector (OSTI)

Characteristics of the atmospheric non-thermal ac arc air plasmas produced by a plasma generator with a floating electrode are investigated. The measurements show that with the help of the surface dielectric barrier discharges between the main electrodes and the floating electrode the ignition voltage of the non-thermal arc discharges can be reduced significantly and an arc discharge mode can be stabilized at high gas flow rates. The measuredtemperatures of the non-thermal arcs are at the level of 2000–3000 K under different operating conditions.

Zhi-Bin Wang; Guo-Xu Chen; Zhe Wang; Nan Ge; He-Ping Li; Cheng-Yu Bao

2011-01-01T23:59:59.000Z

240

Nano-Ag-loaded hydroxyapatite coatings on titanium surfaces by electrochemical deposition  

Science Journals Connector (OSTI)

...magnetron sputtering [23], micro-arc oxidation [24] and sol-gel technology...calcium phosphate coating formed by micro-arc oxidation. J. Biomed. Mater. Res...deposition of octacalcium phosphate micro-fiber/chitosan composite...

2011-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


241

MICROCAVITYMICROCAVITY PLASMA SCIENCE AND RECENTPLASMA SCIENCE AND RECENT APPLICATIONS: BOUNDAPPLICATIONS: BOUND--FREE COUPLING, TRANSISTORFREE COUPLING, TRANSISTOR  

E-Print Network [OSTI]

Plasma Surface Treatment High Intensity Plasma Arc Lamp Spark Gap Plasma Display (150 inch Panasonic Electrode Glass6 mm 250 m LED Backlight Microcavity Lamp #12;OPERATION OF MICROCAVITY PLASMA DEVICESMICROCAVITYMICROCAVITY PLASMA SCIENCE AND RECENTPLASMA SCIENCE AND RECENT APPLICATIONS

Shyy, Wei

242

Effective phase control of silicon films during high-rate deposition in atmospheric-pressure very high-frequency plasma: Impacts of gas residence time on the performance of bottom-gate thin film transistors  

Science Journals Connector (OSTI)

Abstract Hydrogenated amorphous silicon (a-Si) and microcrystalline silicon (?c-Si) films were grown in atmospheric-pressure (AP) He/H2/SiH4 plasma excited by a 150-MHz very high-frequency (VHF) power at a temperature of 220 °C. The variations in thickness and crystallinity of the deposited Si films along the gas flow direction were studied as functions of gas residence time in the plasma, VHF power density and H2 flow rate. Furthermore, the electrical characteristics of bottom-gate thin film transistors (TFTs) were investigated to evaluate the film quality. The results revealed that the chemical reactions both in gas phase and on the growing film surface were significantly enhanced in AP-VHF plasma, promoting phase transition from amorphous to microcrystalline in a time of the order of 0.1 ms. The performance of the \\{TFTs\\} showed that a-Si layers formed in the upstream portion of the plasma zone had reasonably good electrical property (field-effect mobility of approximately 2 cm2/V s) despite very high deposition rates around 20 nm/s. While ?c-Si layers deposited in the downstream portion were very defective, which might come from the insufficient passivation of grain boundaries with a-Si tissues due to a too long gas residence time in the plasma. The precise control of gas residence time by adjusting the length of plasma will be effective for the phase control of Si films with desired quality.

H. Kakiuchi; H. Ohmi; T. Yamada; A. Hirano; T. Tsushima; W. Lin; K. Yasutake

2013-01-01T23:59:59.000Z

243

Thermal motion of carbon clusters and production of carbon nanotubes by gravity-free arc discharge  

SciTech Connect (OSTI)

Thermal and diffusion properties of hot gas around a dc arc discharge under a gravity-free condition are investigated using a jet plane in order to improve the arc production of carbon clusters. Spherically symmetric temperature distribution of He gas around the arc plasma and monotonic slow expansion of the high-temperature region are observed. By means of the passive-type Mie scattering method, random slow diffusion of carbon clusters around the arc plasma is clearly observed under the gravity-free condition. This indicates that carbon clusters including single-walled carbon nanotubes are synthesized around the arc plasma where the He temperature is higher than 1000 K. It is confirmed that large bundles of fatter single-walled carbon nanotubes are produced under the gravity-free condition.

Mieno, T.; Takeguchi, M. [Department of Physics, Shizuoka University, Ooya, Suruga-ku, Shizuoka 422-8529 (Japan); National Institute for Material Science, Sakura, Tsukuba 305-0003 (Japan)

2006-05-15T23:59:59.000Z

244

Plasma deposition of wide gap, highly photoconductive a-Si:H thin films from disilane-helium mixtures  

SciTech Connect (OSTI)

Wide gap (>1.9 eV), photoconductive, intrinsic amorphous silicon films were made in a uhv system from Si/sub 2/H/sub 6/-He mixtures. The hydrogen concentrations, optical gaps and photoconductivities were measured. Unlike films made from SiH/sub 4/, Si/sub 2/H/sub 6/-produced films exhibit excellent electronic properties even at low deposition temperatures. The ratio of AM1 photoconductivity to dark conductivity was as high as 10/sup 7/.

Rajeswaran, G.; Vanier, P.E.; Corderman, R.R.; Kampas, F.J.

1984-01-01T23:59:59.000Z

245

Highly transparent low capacitance plasma enhanced atomic layer deposition Al{sub 2}O{sub 3}-HfO{sub 2} tunnel junction engineering  

SciTech Connect (OSTI)

The development of metallic single electron transistor (SET) depends on the downscaling and the electrical properties of its tunnel junctions. These tunnel junctions should insure high tunnel current levels, low thermionic current, and low capacitance. The authors use atomic layer deposition to fabricate Al{sub 2}O{sub 3} and HfO{sub 2} thin layers. Tunnel barrier engineering allows the achievement of low capacitance Al{sub 2}O{sub 3} and HfO{sub 2} tunnel junctions using optimized annealing and plasma exposure conditions. Different stacks were designed and fabricated to increase the transparency of the tunnel junction while minimizing thermionic current. This tunnel junction is meant to be integrated in SET to enhance its electrical properties (e.g., operating temperature, I{sub ON}/I{sub OFF} ratio)

El Hajjam, Khalil, E-mail: khalil.el-hajjam@insa-lyon.fr [INL, INSA, UMR CNRS 5270, 7 Avenue Jean Capelle, 69621 Villeurbanne Cedex, France and Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec (Canada); Baboux, Nicolas; Calmon, Francis [INL, INSA, UMR CNRS 5270, 7 Avenue Jean Capelle, 69621 Villeurbanne Cedex (France); Souifi, Abdelkader [Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463, Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec (Canada); Poncelet, Olivier; Francis, Laurent A. [ICTEAM, ELEN, UCL, Place du Levant 3, 1348 Louvain-la-Neuve (Belgium); Ecoffey, Serge; Drouin, Dominique [Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463, Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec, Canada and Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, 3000 Boulevard Université, Sherbrooke, J1K OA5, Québec (Canada)

2014-01-15T23:59:59.000Z

246

College of Design ARC Architecture  

E-Print Network [OSTI]

College of Design ARC Architecture KEY: # = new course * = course changed = course dropped,landscape,andarchitecturalspaceswithattentiontotheirapplicationtothearchitecturalexperience.Studio:4hoursperweek. Prereq: Admission to the School of Architecture. ARC 102 DRAWING II: OBSERVATIONAL OF ARCHITECTURE. (3

MacAdam, Keith

247

Super-conducting niobium films produced by means of UHV arc  

Science Journals Connector (OSTI)

The paper shows that high-quality super-conducting Nb films can be deposited by means of arc discharges under ultra-high vacuum conditions. The critical temperatureT c...of Nb-films obtained with ...

J. Langner; M. J. Sadowski; K. Czaus; R. Mirowski…

2004-03-01T23:59:59.000Z

248

A Miocene Island-Arc Volcanic Seamount- The Takashibiyama Formation,  

Open Energy Info (EERE)

Island-Arc Volcanic Seamount- The Takashibiyama Formation, Island-Arc Volcanic Seamount- The Takashibiyama Formation, Shimane Peninsula, Sw Japan Jump to: navigation, search GEOTHERMAL ENERGYGeothermal Home Journal Article: A Miocene Island-Arc Volcanic Seamount- The Takashibiyama Formation, Shimane Peninsula, Sw Japan Details Activities (0) Areas (0) Regions (0) Abstract: The Miocene volcanic complex of the Takashibiyama Formation consists largely of subalkali, subaqueous basalt to andesite lavas and andesite to dacite subaqueous volcaniclastic flow deposits. Most of subaqueous lavas are moderately to intensely brecciated with rugged rough surfaces and ramp structures similar to subaerial block lava. Volcaniclastic flow deposits commonly include basalt to andesite lava fragments and/or pyroclastic materials, and are similar in internal

249

Plasma deposition of wide gap, highly photoconductive a-Si:H thin films from disilane-helium mixtures  

SciTech Connect (OSTI)

Wide gap (> 1.9 eV), photoconductive, intrinsic amorphous silicon films were made in a UHV system from Si/sub 2/H/sub 6/-He mixtures. The hydrogen concentrations, optical gaps and photoconductivities were measured. Unlike films made from SiH/sub 4/, Si/sub 2/H/sub 6/-produced films exhibit excellent electronic properties even at low deposition temperatures. The ratio of AM1 photoconductivity to dark conductivity was as high as 10/sup 7/. 17 references, 5 figures, 1 table.

Rajeswaran, G.; Vanier, P.E.; Corderman, R.R.; Kampas, F.J.

1985-01-01T23:59:59.000Z

250

The stability and the conditions for initiation of electric-arc discharges in railguns  

Science Journals Connector (OSTI)

Characteristic physical features of plasma formations in high-velocity sliding electric contacts are treated, in particular, those in railguns with both electric-arc and metal armatures. Comparison is made of ...

A. P. Glinov

2007-04-01T23:59:59.000Z

251

Numerical Investigation of the Effect of the Cathode Geometry on the Characteristics of an Electric Arc  

Science Journals Connector (OSTI)

The effect of the cathode geometry on the characteristics of an electric arc is treated. It is found that the characteristics of plasma in discharges with cathodes of different geometry (cone, ... . It is assumed...

R. M. Urusov; T. E. Urusova

252

Controlling electrode gap during vacuum arc remelting at low melting current  

DOE Patents [OSTI]

An apparatus and method are disclosed for controlling electrode gap in a vacuum arc remelting furnace, particularly at low melting currents. Spectrographic analysis is performed of the metal vapor plasma, from which estimates of electrode gap are derived. 5 figs.

Williamson, R.L.; Zanner, F.J.; Grose, S.M.

1997-04-15T23:59:59.000Z

253

E-Print Network 3.0 - arc discharge effects Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

de mathmatiques Collection: Mathematics 5 Gliding arc in tornado using a reverse vortex flow Chiranjeev S. Kalra, Young I. Cho,a Summary: nonequilib- rium plasma is to use...

254

E-Print Network 3.0 - arc discharge ion Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

of Texas at Austin Collection: Engineering 8 Gliding arc in tornado using a reverse vortex flow Chiranjeev S. Kalra, Young I. Cho,a Summary: nonequilib- rium plasma is to use...

255

Hall-effect arc protector  

DOE Patents [OSTI]

The Hall-Effect Arc Protector is used to protect sensitive electronics from high energy arcs. The apparatus detects arcs by monitoring an electrical conductor, of the instrument, for changes in the electromagnetic field surrounding the conductor which would be indicative of a possible arcing condition. When the magnitude of the monitored electromagnetic field exceeds a predetermined threshold, the potential for an instrument damaging are exists and the control system logic activates a high speed circuit breaker. The activation of the breaker shunts the energy imparted to the input signal through a dummy load to the ground. After the arc condition is terminated, the normal signal path is restored.

Rankin, Richard A. (Ammon, ID); Kotter, Dale K. (Shelley, ID)

1997-01-01T23:59:59.000Z

256

Hall-effect arc protector  

DOE Patents [OSTI]

The Hall-Effect Arc Protector is used to protect sensitive electronics from high energy arcs. The apparatus detects arcs by monitoring an electrical conductor, of the instrument, for changes in the electromagnetic field surrounding the conductor which would be indicative of a possible arcing condition. When the magnitude of the monitored electromagnetic field exceeds a predetermined threshold, the potential for an instrument damaging are exists and the control system logic activates a high speed circuit breaker. The activation of the breaker shunts the energy imparted to the input signal through a dummy load to the ground. After the arc condition is terminated, the normal signal path is restored. 2 figs.

Rankin, R.A.; Kotter, D.K.

1997-05-13T23:59:59.000Z

257

Three Stages Modeling of n-Octane Reforming Assisted by a Nonthermal Arc Discharge  

Science Journals Connector (OSTI)

Three Stages Modeling of n-Octane Reforming Assisted by a Nonthermal Arc Discharge ... After a description of the model and its main assumptions, a parametric analysis of plasma reformer performance addressing the influence of plasma volume, H2O/C ratio, O/C ratio, and input electric power is presented. ... Most of them were particularly dealt with technologies based on arc discharges. ...

José Gonzalez-Aguilar; Guillaume Petitpas; Alexandre Lebouvier; Jean-Damien Rollier; Adeline Darmon; Laurent Fulcheri

2009-09-08T23:59:59.000Z

258

International Symposium on Plasma Chemistry (ISPC 21) Sunday 4 August Friday 9 August 2013  

E-Print Network [OSTI]

. Generally, only one arc can exist at time and arc discharge follows the maximal electric gap potential. Each obtained experimentally. Keywords: electric arc motion, 3-phase AC plasma torch, MHD modeling. 1 Cairns Convention Centre, Queensland, Australia Experimental analysis of arcs behavior in a 3-Phase AC

Paris-Sud XI, Université de

259

GIS Fundamentals: Supplementary Lessons with ArcGIS Introduction to ArcGIS Lesson 1: Introduction to ArcGIS  

E-Print Network [OSTI]

GIS Fundamentals: Supplementary Lessons with ArcGIS Introduction to ArcGIS 1 Lesson 1: Introduction to ArcGIS What You'll Learn: -Start ArcMap -Create a new map -Add data layers -Pan and zoom -Change data errors. Background: This is the first in a series of introductory exercises for ArcGIS

Harbor, David

260

Self-organisation Processes In The Carbon ARC For Nanosynthis  

SciTech Connect (OSTI)

The atmospheric pressure carbon arc in inert gases such as helium is an important method for the production of nanomaterials. It has recently been shown that the formation of the carbon deposit on the cathode from gaseous carbon plays a crucial role in the operation of the arc, reaching the high temperatures necessary for thermionic emission to take place even with low melting point cathodes. Based on observed ablation and deposition rates, we explore the implications of deposit formation on the energy balance at the cathode surface, and show how the operation of the arc is self-organised process. Our results suggest that the can arc operate in two di erent regimes, one of which has an important contribution from latent heat to the cathode energy balance. This regime is characterised by the enhanced ablation rate, which may be favourable for high yield synthesis of nanomaterials. The second regime has a small and approximately constant ablation rate with a negligible contribution from latent heat.

Ng, Jonathan; Raitses, Yevgeny

2014-02-26T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


261

Measurements of the total ion flux from vacuum arc cathodespots  

SciTech Connect (OSTI)

The ion flux from vacuum arc cathode spots was measured in two vacuum arc systems. The first was a vacuum arc ion source which was modified allowing us to collect ions from arc plasma streaming through an anode mesh. The second discharge system essentially consisted of a cathode placed near the center of a spherically shaped mesh anode. In both systems, the ion current streaming through the mesh was measured by a biased collector. The mesh anodes had geometric transmittances of 60 percent and 72 percent, respectively, which were taken into account as correction factors. The ion current from different cathode materials was measured for 50-500 A of arc current. The ion current normalized by the arc current was found to depend on the cathode material, with values in the range from 5 percent to 19 percent. The normalized ion current is generally greater for elements of low cohesive energy. The ion erosion rates were determined from values of ion current and ion charge states, which were previously measured in the same ion source. The absolute ion erosion rates range from 16-173 mu g/C.

Anders, Andre; Oks, Efim M.; Yushkov, Georgy Yu; Savkin,Konstantin P.; Brown, Ian G.; Nikolaev, Alexey G.

2005-05-25T23:59:59.000Z

262

MIT Lincoln Laboratory Plasma and Ions-1  

E-Print Network [OSTI]

them anions · Fire, lightning, fluorescent lamps, and the Sun and stars all contain plasma ­ In fact include fluorescent lamps, neon signs, plasma globes, plasma TVs ­ They easily form at room temperature lightning carbon arc nuclear blast #12;MIT Lincoln LaboratoryPlasma and Ions-4 A. Siegel 5/12/07 How Does

Wurtman, Richard

263

Plasma and Ion Sources in Large Area Coatings: A Review  

E-Print Network [OSTI]

vapor deposition in the atmospheric glow plasma [100, 101].years, plasma processing at atmospheric and near-atmosphericHigh (near atmospheric) pressure microwave plasma sources

Anders, Andre

2005-01-01T23:59:59.000Z

264

Plasma and Ion Sources in Large Area Coatings: A Review  

E-Print Network [OSTI]

vapor deposition in the atmospheric glow plasma [100, 101].High (near atmospheric) pressure microwave plasma sources7. Large area plasma at atmospheric or near-atmospheric

Anders, Andre

2005-01-01T23:59:59.000Z

265

Nanocrystalline-Si-dot multi-layers fabrication by chemical vapor deposition with H-plasma surface treatment and evaluation of structure and quantum confinement effects  

SciTech Connect (OSTI)

100-nm-thick nanocrystalline silicon (nano-Si)-dot multi-layers on a Si substrate were fabricated by the sequential repetition of H-plasma surface treatment, chemical vapor deposition, and surface oxidation, for over 120 times. The diameter of the nano-Si dots was 5–6 nm, as confirmed by both the transmission electron microscopy and X-ray diffraction analysis. The annealing process was important to improve the crystallinity of the nano-Si dot. We investigated quantum confinement effects by Raman spectroscopy and photoluminescence (PL) measurements. Based on the experimental results, we simulated the Raman spectrum using a phenomenological model. Consequently, the strain induced in the nano-Si dots was estimated by comparing the experimental and simulated results. Taking the estimated strain value into consideration, the band gap modulation was measured, and the diameter of the nano-Si dots was calculated to be 5.6 nm by using PL. The relaxation of the q ? 0 selection rule model for the nano-Si dots is believed to be important to explain both the phenomena of peak broadening on the low-wavenumber side observed in Raman spectra and the blue shift observed in PL measurements.

Kosemura, Daisuke, E-mail: d-kose@isc.meiji.ac.jp; Mizukami, Yuki; Takei, Munehisa; Numasawa, Yohichiroh; Ogura, Atsushi [School of Science and Technology, Meiji University, Kawasaki 214-8571 (Japan)] [School of Science and Technology, Meiji University, Kawasaki 214-8571 (Japan); Ohshita, Yoshio [Toyota Technological Institute, Nagoya 468-8511 (Japan)] [Toyota Technological Institute, Nagoya 468-8511 (Japan)

2014-01-15T23:59:59.000Z

266

Electrical and structural properties of p-type ZnO:N thin films prepared by plasma enhanced chemical vapour deposition  

Science Journals Connector (OSTI)

Thin films of p-type ZnO:N have been obtained by thermally oxidizing zinc oxynitride films prepared by plasma enhanced chemical vapour deposition (PECVD). The p-type ZnO:N thin film with a hole concentration of 2.7 ? 1016 cm?3 was obtained after an annealing process was conducted at 600 °C. A conductivity transition from n-type to p-type was observed, which was systematically researched via structural and compositional analyses. In terms of these analyses, it helped to better understand the properties and behaviour of nitrogen in ZnO. First, nitrogen was incorporated into ZnO films during the growth process to occupy oxygen positions, and also partly compensated some donors induced from non-stoichiometric (ZnO1–x) composition. Second, the amount of activated nitrogen gradually increased in an oxidizing atmosphere and exceeded those donor states to realize an effective compensation, yielding p-type conductivity during the course of thermal oxidation.

Zhiyan Xiao; Yichun Liu; Jiying Zhang; Dongxu Zhao; Youming Lu; Dezhen Shen; Xiwu Fan

2005-01-01T23:59:59.000Z

267

Preparation of Al2O3/TiO2-containing Coating on Aluminium Alloys by Micro-arc Oxidation  

Science Journals Connector (OSTI)

TiO2-containing ceramic coatings were deposited on the surface of aluminium alloys by micro-arc oxidition. Surface and cross-section topograph of ceramic coating were observed using scanning electron microscopy (SEM). The phase composition of ceramic ... Keywords: Micro-arc oxidation, TiO2 additive, Al2O3/TiO2 phase, antiwear behavior

Cheng Gao; Jinyong Xu; Yusheng Lan; Yonghui Ma; Weixiang Su; Yajuan Liu

2010-03-01T23:59:59.000Z

268

Epitaxial growth of B-doped Si on Si(100) by electron-cyclotron-resonance Ar plasma chemical vapor deposition in a SiH4–B2H6–H2 gas mixture without substrate heating  

Science Journals Connector (OSTI)

Abstract Characteristics of B-doped Si epitaxial growth on Si(100) by using electron-cyclotron-resonance Ar plasma enhanced chemical vapor deposition without substrate heating in a SiH4–B2H6–H2–Ar gas mixture were investigated. B concentration in the deposited films increases with decreasing microwave power for plasma generation. At the microwave power of 125 W, the B concentration increases up to 5 × 1021 cm? 3. Deposition rate of the B-doped Si tends to be enhanced at the higher B2H6 partial pressure. Resistivity of the B-doped Si film tends to increase with decreasing the microwave power. Referring Irvin curve, in the case of 200 W, the carrier concentration is estimated to be at least about 1017 cm? 3 at the B concentration of 1021 cm? 3. After heat treatment in N2 atmosphere at 200 °C and 300 °C for 2 h, the resistivity drastically decreases to the value which corresponds to carrier concentration of around 1019 cm? 3. From Fourier transform infrared spectroscopy measurement, it is found that hydrogen incorporated in the as-deposited film desorbed by the heat treatment.

Yusuke Abe; Masao Sakuraba; Junichi Murota

2014-01-01T23:59:59.000Z

269

Measurement of total ion flux in vacuum Arc discharges  

SciTech Connect (OSTI)

A vacuum arc ion source was modified allowing us to collections from arc plasma streaming through an anode mesh. The mesh had ageometric transmittance of 60 percent, which was taken into account as acorrection factor. The ion current from twenty-two cathode materials wasmeasured at an arc current of 100 A. The ion current normalized by thearc current was found to depend on the cathode material, with valuesinthe range from 5 percent to 11 percent. The normalized ion current isgenerally greater for light elements than for heavy elements. The ionerosion rates were determined fromvalues of ion currentand ion chargestates, which were previously measured in the same experimental system.The ion erosion rates range from 12-94 mu g/C.

Anders, Andre; Oks, Efim M.; Yushkov, Georgy Yu.; Brown, Ian G.

2004-04-12T23:59:59.000Z

270

Characteristics of arcs between porous carbon electrodes E. CARVOU, J.L. Le GARREC, J. B.A. MITCHELL  

E-Print Network [OSTI]

develops into a full blown arc. The very high temperature in the arc (>6000°C) and the subsequent violent Transactions on Plasma Science, 99 (2013) 1-8" DOI : 10.1109/TPS.2013.2283581 #12;2 cable faults in order

Paris-Sud XI, Université de

271

Arc fault detection system  

DOE Patents [OSTI]

An arc fault detection system for use on ungrounded or high-resistance-grounded power distribution systems is provided which can be retrofitted outside electrical switchboard circuits having limited space constraints. The system includes a differential current relay that senses a current differential between current flowing from secondary windings located in a current transformer coupled to a power supply side of a switchboard, and a total current induced in secondary windings coupled to a load side of the switchboard. When such a current differential is experienced, a current travels through a operating coil of the differential current relay, which in turn opens an upstream circuit breaker located between the switchboard and a power supply to remove the supply of power to the switchboard.

Jha, Kamal N. (Bethel Park, PA)

1999-01-01T23:59:59.000Z

272

A study of vacuum arc ion velocities using a linear set of probes  

SciTech Connect (OSTI)

The most likely velocity of ions moving away from vacuum arc cathode spots was measured using a set of probes along the path of plasma expansion. The goal was to determine how much, if any, change of the ion drift velocity occurs in the expanded plasma. The arc discharge current was perturbed to create plasma density markers whose travel is picked up by the set of probes. It was found that the perturbation with current oscillations did not result in consistent data because ion current maxima and minima are not only determined by the plasma production but by the transients of the arc pulse and by the asymmetry of the ion velocity distribution function. Perturbation with a short current spike was more conclusive. The ion velocity was measured to be slightly reduced with increasing distance from the cathode, which can be explained by collisions of ions with the background of neutrals. The ion velocity was increased when the arc current was increased, which correlated with enhanced arc voltage and power dissipation. The ion velocity could be enhanced when the plasma was produced in a non-uniform magnetic field.

Hohenbild, Stefan; Grubel, Christoph; Yushkov, Georgy Yu.; Oks, Efim M.; Anders, Andre

2008-07-15T23:59:59.000Z

273

Rifting of the Izu-Bonin arc in the Quaternary and Mid-Oligocene  

SciTech Connect (OSTI)

Eruption of middle Eocene-lower Oligocene boninites and island arc tholeiites created the 200 km wide Izu-Bonin arc massif following the initiation of subduction {approximately}50 Ma. Mid-Oligocene rifting formed a 40-70 km wide forearc basin between the Eocene outer-arc high and the Eo-Oligocene arc (now the frontal arc high), with maximum extension at the latitudes of the Bonin Ridge and Trough. The Oligocene forearc basin was rapidly (100-300 m/m.y.) filled with turbidite and debris flow deposits produced by concurrent volcanism and erosion of the surrounding highs. Contemporaneous stretching in the backarc region produced dominantly east-dipping, NNE-trending, normal faults and culminated in backarc spreading in the Shikoku basin (25-15 Ma), isolating the Palau-Kyushu remnant arc. The forearc and remnant arc sediments record a dearth of volcanogenic input between 23 and 17 Ma; evidence that an arc volcanic minimum accompanied backarc spreading. The middle Miocene to Recent volcanic front formed 0(S)-50(N) km west of the Oligocene arc and has loaded and flexed the forearc. Further west, chains of submarine volcanoes erupted along the extension of Shikoku basin fracture zones. Basaltic sills were emplaced in the forearc. Explosive volcanism from rhyolitic calderas has increased dramatically since the late Pliocene, especially in the last 0.2 Ma. Since {approximately}2 Ma the arc has been stretched again, producing rapidly subsiding (300-2,250 m/m.y.) graben, immediately west of the volcanic front, which are segmented along strike by oblique transfer zones. The Sumisu Rift is partially filled with (<1.5 Ma) volcaniclastic turbidites and hemipelagic sediments and is intruded by backarc basin basalts. About 1 km of syn-rift uplift of the arc margin footwall has produced an unconformity, beneath surficial pumice, that extends back to pumiceous sediments >2.35 Ma.

Taylor, B. (Univ. of Hawaii, Honolulu (USA))

1990-06-01T23:59:59.000Z

274

Improved blue response and efficiency of A-Si:H solar cells deposited from disilane using a dual-chamber plasma system  

SciTech Connect (OSTI)

Thin film amorphous silicon solar cells with glass/SnO/sub 2//p/i/n/Al structures and 6 to 7% AM1 conversion efficiencies were fabricated at rapid deposition rates in a newly constructed dual-chamber glow discharge deposition system. The 500 nm thick intrinsic layer was deposited at the rate of 1.7 nm/s using disilane (Si/sub 2/H/sub 6/)-helium mixtures. This deposition rate is an order of magnitude greater than conventional high efficiency amorphous silicon solar cell depositions. Residual boron doping effects at the p/i interface can severely degrade cell performance particularly when the intrinsic layer is deposited in one chamber of the dual-chamber system and the intrinsic layer is deposited in the other chamber that is free of boron contaminants. Parameters such as electrode spacing, Si/sub 2/H/sub 6/ partial pressure and flow rate were optimized to produce uniform deposition over large areas. At the substrate temperature T/sub s/ selected for solar cell intrinsic layer deposition, the spin density was measured to be a minimum at 5 x 10/sup 15//cm/sup 3/. For a given T/sub s/, an intrinsic layer deposited from Si/sub 2/H/sub 6/ absorbs fewer photons and can generate less current under solar simulation than a similar film produced from monosilane. Identical solar cells were deposited in either the single-chamber mode or the dual-chamber mode for comparison. Single-chamber mode cells perform poorly over the visible wavelengths and hence produce low short circuit currents. The dual-chamber mode cells show a significant improvement in blue response and a factor of two increase in short circuit current over the single-chamber mode cells. Under short circuit conditions, 15 mA/cm/sup 2/ was generated from rapidly deposited (1.7 nm/s) cells from disilane and 18 mA/cm/sup 2/ from low deposition rate (0.18 nm/s) monosilane cells. These values are comparable to or better than those reported for similar cells by other groups.

Rajeswaran, G.; Vanier, P.E.; Corderman, R.R.; Kampas, F.J.

1985-01-01T23:59:59.000Z

275

Mass spectrometric study of NF3 plasma etching of silicon  

Science Journals Connector (OSTI)

NF3 plasma etching is used for dry cleaning of reactors after plasma-enhanced chemical vapor deposition of hydrogenated amorphous silicon from SiH4. The NF3 plasma chemistry, in a closed isothermal plasma box wit...

Jerome Perrin; Jacques Méot; Jean-Marie Siéfert…

1990-12-01T23:59:59.000Z

276

518 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 33, NO. 2, APRIL 2005 Plasma Dynamics During Breakdown in  

E-Print Network [OSTI]

, lamp, modeling, plasma. METAL halide arc lamps are widely used sources of in- door and large area plasma hydrodynamics model was used to investigate breakdown in metal halide lamp. Images depicting518 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 33, NO. 2, APRIL 2005 Plasma Dynamics During

Kushner, Mark

277

Increasing the length of single-wall carbon nanotubes in a magnetically enhanced arc discharge  

SciTech Connect (OSTI)

It is demonstrated that a magnetic field has a profound effect on the length of a single-wall carbon nanotube (SWCNT) synthesized in the arc discharge. The average length of SWCNT increases by a factor of 2 in discharge with magnetic field as compared with the discharge without magnetic field, and the yield of long nanotubes with lengths above 5 {mu}m also increases. A model of SWCNT growth on metal catalyst in arc plasma was developed. Monte-Carlo simulations confirm that the increase of the plasma density in the magnetic field leads to an increase in the nanotube growth rate and thus leads to longer nanotubes.

Keidar, Michael [Department of Mechanical and Aerospace Engineering, George Washington University, Washington, District of Columbia 20052 (United States); Levchenko, Igor; Ostrikov, Kostya [Plasma Nanoscience, School of Physics, The University of Sydney, Sydney, New South Wales 2006 (Australia); Arbel, Tamir [Department of Material Science, University of Michigan, Ann Arbor, Michigan 48109 (United States); Alexander, Myriam [Department of Geophysical Science, University of Chicago, Chicago, Illinois 60637 (United States); Waas, Anthony M. [Department of Aerospace Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States)

2008-01-28T23:59:59.000Z

278

Graphite electrode DC arc furnace. Innovative technology summary report  

SciTech Connect (OSTI)

The Graphite Electrode DC Arc Furnace (DC Arc) is a high-temperature thermal process, which has been adapted from a commercial technology, for the treatment of mixed waste. A DC Arc Furnace heats waste to a temperature such that the waste is converted into a molten form that cools into a stable glassy and/or crystalline waste form. Hazardous organics are destroyed through combustion or pyrolysis during the process and the majority of the hazardous metals and radioactive components are incorporated in the molten phase. The DC Arc Furnace chamber temperature is approximately 593--704 C and melt temperatures are as high as 1,500 C. The DC Arc system has an air pollution control system (APCS) to remove particulate and volatiles from the offgas. The advantage of the DC Arc is that it is a single, high-temperature thermal process that minimizes the need for multiple treatment systems and for extensive sorting/segregating of large volumes of waste. The DC Arc has the potential to treat a wide range of wastes, minimize the need for sorting, reduce the final waste volumes, produce a leach resistant waste form, and destroy organic contaminants. Although the DC arc plasma furnace exhibits great promise for treating the types of mixed waste that are commonly present at many DOE sites, several data and technology deficiencies were identified by the Mixed Waste Focus Area (MWFA) regarding this thermal waste processing technique. The technology deficiencies that have been addressed by the current studies include: establishing the partitioning behavior of radionuclides, surrogates, and hazardous metals among the product streams (metal, slag, and offgas) as a function of operating parameters, including melt temperature, plenum atmosphere, organic loading, chloride concentration, and particle size; demonstrating the efficacy of waste product removal systems for slag and metal phases; determining component durability through test runs of extended duration, evaluating the effect of feed composition variations on process operating conditions and slag product performance; and collecting mass balance and operating data to support equipment and instrument design.

NONE

1999-05-01T23:59:59.000Z

279

C. Tavakoli et al.: Dynamics and Modeling of AC Arc on Surface of Ice 1070-9878/06/$20.00 2006 IEEE  

E-Print Network [OSTI]

discharge activities leading to flashover on ice-covered insulator surface is presented. This model takes modeling, arc modeling, outdoor insulation, atmospheric icing. 1 INTRODUCTION OVERHEAD power lines icing deposited on insulators. The study and understanding of arc initiation and propagation

Paris-Sud XI, Université de

280

Vacuum Arc Ion Sources: Recent Developments and Applications  

SciTech Connect (OSTI)

The vacuum arc ion source has evolved over the past twenty years into a standard laboratory tool for the production of high current beams of metal ions, and is now used in a number of different embodiments at many laboratories around the world. The primary application of this kind of source has evolved to be ion implantation for material surface modification. Another important use is for injection of high current beams of heavy metal ions into the front ends of particle accelerators, and much excellent work has been carried out in recent years in optimizing the source for reliable accelerator application. The source also provides a valuable tool for the investigation of the fundamental plasma physics of vacuum arc plasma discharges. As the use of the source has grown and diversified, at the same time the ion source performance and operational characteristics have been improved in a variety of different ways also. Here we review the growth and status of vacuum arc ion sources around the world, and summarize some of the applications for which the sources have been used.

Brown, Ian; Oks, Efim

2005-05-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


281

MagLab - Arc Lamp Tutorial  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

with 2,000 cells to create an arc across a 4-inch (100 millimeter) gap. When suitable electric generators became available in the late 1870s, the practical use of arc lamps began....

282

Oxygen and Nitrogen Contamination During Arc Welding  

E-Print Network [OSTI]

) ) : ,- Oxygen and Nitrogen Contamination During Arc Welding T. W. Eagar Department of }faterials, mechanisms, and expected levels of oxygen and nitrogen contamination during gas tungsten arc, gas metal arc indicating the importance of dec9mposition of SiOz into silicon monoxide and oxygen are presented, indicating

Eagar, Thomas W.

283

Deposition of vertically oriented carbon nanofibers in atmospheric pressure radio frequency discharge  

SciTech Connect (OSTI)

Deposition of vertically oriented carbon nanofibers (CNFs) has been studied in an atmospheric pressure radio frequency discharge without dielectric barrier covering the metallic electrodes. When the frequency is sufficiently high so that ions reside in the gap for more than one rf cycle ('trapped ions'), the operating voltage decreases remarkably and the transition from a uniform glow discharge to an arc discharge is suppressed even without dielectric barriers. More importantly, the trapped ions are able to build up a cathodic ion sheath. A large potential drop is created in the sheath between the bulk plasma and the electrode, which is essential for aligning growing CNFs. At the same time, the damage to CNFs due to ion bombardment can be minimized at atmospheric pressure. The primary interest of the present work is in identifying the cathodic ion sheath and investigating how it influences the alignment of growing CNFs in atmospheric pressure plasma-enhanced chemical-vapor deposition. Spectral emission profiles of He (706 nm), H{alpha} (656 nm), and CH (432 nm) clearly showed that a dark space is formed between the cathode layer and the heated bottom electrode. However, increasing the rf power induced the transition to a nonuniform {gamma}-mode discharge which creates intense plasma spots in the dark space. Aligned CNFs can be grown at moderate input power during the initial stage of the deposition process. Catalyst particles were heavily contaminated by precipitated carbon in less than 5 min. Alignment deteriorates as CNFs grow and deposition was virtually terminated by the deactivation of catalyst particles.

Nozaki, Tomohiro; Goto, Tomoya; Okazaki, Ken; Ohnishi, Kuma; Mangolini, Lorenzo; Heberlein, Joachim; Kortshagen, Uwe [Department of Mechanical and Control Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro Tokyo 1528552 (Japan); Department of Mechanical Engineering, University of Minnesota, Minneapolis, Minnesota 55455 (United States)

2006-01-15T23:59:59.000Z

284

Massachusetts Institute of Technology Plasma Fusion Center 1992--1993 report to the President  

SciTech Connect (OSTI)

This report discusses research being conducted at MIT`s plasma fusion center. Some of the areas covered are: plasma diagnostics; rf plasma heating; gyrotron research; treatment of solid waste by arc plasma; divertor experiments; tokamak studies; and plasma and fusion theory.

Not Available

1993-07-01T23:59:59.000Z

285

Plasma spraying method for forming diamond and diamond-like coatings  

DOE Patents [OSTI]

A method and composition for the deposition of a thick layer (10) of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition (12) including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate (20). The softened or molten composition (18) crystallizes on the substrate (20) to form a thick deposition layer (10) comprising at least a diamond or diamond-like material. The selected composition (12) includes at least glassy carbon as a primary constituent (14) and may include at least one secondary constituent (16). Preferably, the secondary constituents (16) are selected from the group consisting of at least diamond powder, boron carbide (B.sub.4 C) powder and mixtures thereof.

Holcombe, Cressie E. (Farragut, TN); Seals, Roland D. (Oak Ridge, TN); Price, R. Eugene (Knoxville, TN)

1997-01-01T23:59:59.000Z

286

Plasma spraying method for forming diamond and diamond-like coatings  

DOE Patents [OSTI]

A method and composition is disclosed for the deposition of a thick layer of diamond or diamond-like material. The method includes high temperature processing wherein a selected composition including at least glassy carbon is heated in a direct current plasma arc device to a selected temperature above the softening point, in an inert atmosphere, and is propelled to quickly quenched on a selected substrate. The softened or molten composition crystallizes on the substrate to form a thick deposition layer comprising at least a diamond or diamond-like material. The selected composition includes at least glassy carbon as a primary constituent and may include at least one secondary constituent. Preferably, the secondary constituents are selected from the group consisting of at least diamond powder, boron carbide (B{sub 4}C) powder and mixtures thereof. 9 figs.

Holcombe, C.E.; Seals, R.D.; Price, R.E.

1997-06-03T23:59:59.000Z

287

An electron source with a multiarc plasma emitter for obtaining submillisecond pulsed megawatt beams  

Science Journals Connector (OSTI)

An electron source with a plasma emitter based on an...2...area. The arc-current amplitude for each cathode amounts to 100–300 A. Under the action of a constant accelerating voltage applied between the plasma emi...

M. S. Vorob’ev; S. A. Gamermaister; V. N. Devyatkov…

2014-06-01T23:59:59.000Z

288

Schlieren technique applied to the arc temperature measurement in a high energy density cutting torch  

SciTech Connect (OSTI)

Plasma temperature and radial density profiles of the plasma species in a high energy density cutting arc have been obtained by using a quantitative schlieren technique. A Z-type two-mirror schlieren system was used in this research. Due to its great sensibility such technique allows measuring plasma composition and temperature from the arc axis to the surrounding medium by processing the gray-level contrast values of digital schlieren images recorded at the observation plane for a given position of a transverse knife located at the exit focal plane of the system. The technique has provided a good visualization of the plasma flow emerging from the nozzle and its interactions with the surrounding medium and the anode. The obtained temperature values are in good agreement with those values previously obtained by the authors on the same torch using Langmuir probes.

Prevosto, L.; Mancinelli, B. [Departamento Ing. Electromecanica, Grupo de Descargas Electricas, Universidad Tecnologica Nacional, Regional Venado Tuerto, Las Heras 644, Venado Tuerto, Santa Fe 2600 (Argentina); Artana, G. [Departamento Ing. Mecanica, Laboratorio de Fluidodinamica, Facultad de Ingenieria (UBA), Paseo Colon 850 (C1063ACV), Buenos Aires (Argentina); Kelly, H. [Departamento de Fisica, Instituto de Fisica del Plasma (CONICET), Facultad de Ciencias Exactas y Naturales (UBA), Ciudad Universitaria Pab. I, Buenos Aires 1428 (Argentina)

2010-01-15T23:59:59.000Z

289

Roughening and removal of surface contamination from beryllium using negative transferred-arc cleaning  

SciTech Connect (OSTI)

Negative transferred-arc (TA) cleaning has been used extensively in the aerospace industry to clean and prepare surfaces prior to plasma spraying of thermal barrier coatings. This non-line of sight process can improve the bond strength of plasma sprayed coatings to the substrate material by cleaning and macroscopically roughening the surface. A variation of this cleaning methodology is also used in gas tungsten arc (GTA) welding to cathodically clean the surfaces of aluminum and magnesium prior to welding. Investigations are currently being performed to quantify the degree in which the negative transferred-arc process can clean and roughen metal surfaces. Preliminary information will be reported on the influence of processing conditions on roughening and the removal of carbon and other contaminates from the surface of beryllium. Optical, spectral and electrical methods to quantify cleaning of the surface will also be discussed. Applications for this technology include chemical-free precision cleaning of beryllium components.

Castro, R.G.; Hollis, K.J.; Elliott, K.E. [Los Alamos National Lab., NM (United States). Materials Science and Technology Div.

1997-12-01T23:59:59.000Z

290

Cylindrical bubble evolution and acoustic signature through the arc phase of an electrical discharge.  

Science Journals Connector (OSTI)

The arc phase of an electrical discharge in salt water is investigated using a 1?D nonlinear fluid model in cylindrical (r) coordinates. For most electrode geometries the arc phase is more accurately modeled using a cylindrical geometry compared to the usual and simpler to implement spherical model. This is due to the fact that until the bubble radius is comparable to the distance between electrodes the preferred geometry is cylindrical. Both the bubbles external (water) and internal (dissociated water and plasma) are discretized and modeled with nonlinear fluid equations. The model includes the energy flow from the capacitor into the plasma arc through its resistivity and then finally into the hydroacoustic pulse. Simulation results will be compared to experiments. Also the efficiency of various electrode configurations will be investigated. [Work supported by the Office of Naval Research.

David L. Fisher; Robert L. Rogers

1996-01-01T23:59:59.000Z

291

Hall current layer formation in arc discharge across magnetic field and transfer of fast ions out of discharge  

SciTech Connect (OSTI)

In the work presented here the geometry of the Hall current layer in a plasma of the vacuum arc discharge in the transverse magnetic field are analyzed. The extraction of an intense pure flux of fast ions generated in the cathode spots with the help of the Hall layer is discussed. Experiments on the arc source of carbon fast ions are described. The anode geometry adequate to the mechanism of the arc current passage through the transverse magnetic field is found out experimentally. Up to 70% of fast ions are extracted out of the arc discharge in the arched magnetic field. In experiments, the Hall current layer formation in the vacuum arc discharge across magnetic field is confidently confirmed.

Bender, E.D.; Dimov, G.I.; Krivenko, A.S.; Razorenov, V.V. [Lumiks PTI Ltd., Yarne 81223 (Israel); Budker Institute of Nuclear Physics, Novosibirsk 630090 (Russian Federation)

2006-01-15T23:59:59.000Z

292

Characterization of arcs in frequency domain  

SciTech Connect (OSTI)

Arc detection systems are developed for ICRH on ITER to prevent arcs from damaging the RF components. One of the detectors, the Sub-Harmonic Arc Detector (SHAD) is based on the detection of the frequencies emitted in the MHz range by arcs [R1]. To ensure the high level of reliability required for this safety system, it is necessary to demonstrate that these frequencies present a signal with a Signal to Noise Ratio high enough to be detected under the wide range of operational conditions (frequency, power, configuration) and for the different types of arcs that can appear in the feeding lines and on the antennas (vacuum arc, glow discharge, multipactor-induced discharge). For each type of arc, we analyze the evolution of the frequency spectrum relative to the evolution of other electrical parameters (reflected power, voltage)

D'Inca, R.; Siegl, G.; Faugel, H.; Braun, F.; Eckert, B.; Bobkov, V. [Max Planck Institut fuer Plasmaphysik, Garching, Germany, EURATOM Association (Germany); El Khaldi, M. [CEA, IRFM, F-13108 Saint-Paul-lez-Durance (France); Noterdaeme, J.-M. [Max Planck Institut fuer Plasmaphysik, Garching, Germany, EURATOM Association (Germany); Gent University, EESA Department (Belgium)

2009-11-26T23:59:59.000Z

293

A hierarchy of diffusion models for partially ionized plasmas. Isabelle Choquet  

E-Print Network [OSTI]

. These plasmas are the following electrical discharges: a thermal arc discharge, glow discharges in local thermo (or flow). Keywords: Arc discharge, glow discharge, electron flow, gas mixture, disparate masses, im, the electric discharge in a gas, or gas discharge. Various electric discharges exist and produce plasma

Paris-Sud XI, Université de

294

BiFeO{sub 3}/La{sub 0.7}Sr{sub 0.3}MnO{sub 3} heterostructures deposited on spark plasma sintered LaAlO{sub 3} substrates  

SciTech Connect (OSTI)

Multiferroic BiFeO{sub 3} (BFO)/La{sub 0.7}Sr{sub 0.3}MnO{sub 3} heterostructured thin films were grown by pulsed laser deposition on polished spark plasma sintered LaAlO{sub 3} (LAO) polycrystalline substrates. Both polycrystalline LAO substrates and BFO films were locally characterized using electron backscattering diffraction, which confirmed the high-quality local epitaxial growth on each substrate grain. Piezoforce microscopy was used to image and switch the piezo-domains, and the results are consistent with the relative orientation of the ferroelectric variants with the surface normal. This high-throughput synthesis process opens the routes towards wide survey of electronic properties as a function of crystalline orientation in complex oxide thin film synthesis.

Pravarthana, D.; Lacotte, M.; David, A.; Prellier, W., E-mail: wilfrid.prellier@ensicaen.fr [Laboratoire CRISMAT, CNRS UMR 6508, ENSICAEN, Normandie Université, 6 Bd Maréchal Juin, F-14050 Caen Cedex 4 (France); Trassin, M. [Department of Physics, University of California, Berkeley, California 94720 (United States); Department of Materials, ETH, Wolfgang-Pauli-Str. 10, 8093 Zurich (Switzerland); Haw Chu, Jiun [Department of Physics, University of California, Berkeley, California 94720 (United States); Ramesh, R. [Department of Physics, University of California, Berkeley, California 94720 (United States); Department of Materials Science and Engineering, University of California, Berkeley, California 94720 (United States); Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Salvador, P. A. [Department of Materials Science and Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, Pennsylvania 15213 (United States)

2014-02-24T23:59:59.000Z

295

Excitation mechanism and thermal emission quenching of Tb ions in silicon rich silicon oxide thin films grown by plasma-enhanced chemical vapour deposition—Do we need silicon nanoclusters?  

SciTech Connect (OSTI)

In this work, we will discuss the excitation and emission properties of Tb ions in a Silicon Rich Silicon Oxide (SRSO) matrix obtained at different technological conditions. By means of electron cyclotron resonance plasma-enhanced chemical vapour deposition, undoped and doped SRSO films have been obtained with different Si content (33, 35, 39, 50 at. %) and were annealed at different temperatures (600, 900, 1100?°C). The samples were characterized optically and structurally using photoluminescence (PL), PL excitation, time resolved PL, absorption, cathodoluminescence, temperature dependent PL, Rutherford backscattering spectrometry, Fourier transform infrared spectroscopy and positron annihilation lifetime spectroscopy. Based on the obtained results, we discuss how the matrix modifications influence excitation and emission properties of Tb ions.

Podhorodecki, A., E-mail: artur.p.podhorodecki@pwr.wroc.pl; Golacki, L. W.; Zatryb, G.; Misiewicz, J. [Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw (Poland); Wang, J.; Jadwisienczak, W. [School of EECS, Ohio University, Stocker Center 363, Athens, Ohio 45701 (United States); Fedus, K. [Institute of Physics, Nicholas Copernicus University, Grudziadzka 5/7, 87-100 Torun (Poland); Wojcik, J.; Wilson, P. R. J.; Mascher, P. [Department of Engineering Physics and Centre for Emerging Device Technologies, McMaster University, 1280 Main St. W, Hamilton, Ontario L8S4L7 (Canada)

2014-04-14T23:59:59.000Z

296

Electrical and thermal finite element modeling of arc faults in photovoltaic bypass diodes.  

SciTech Connect (OSTI)

Arc faults in photovoltaic (PV) modules have caused multiple rooftop fires. The arc generates a high-temperature plasma that ignites surrounding materials and subsequently spreads the fire to the building structure. While there are many possible locations in PV systems and PV modules where arcs could initiate, bypass diodes have been suspected of triggering arc faults in some modules. In order to understand the electrical and thermal phenomena associated with these events, a finite element model of a busbar and diode was created. Thermoelectrical simulations found Joule and internal diode heating from normal operation would not normally cause bypass diode or solder failures. However, if corrosion increased the contact resistance in the solder connection between the busbar and the diode leads, enough voltage potentially would be established to arc across micron-scale electrode gaps. Lastly, an analytical arc radiation model based on observed data was employed to predicted polymer ignition times. The model predicted polymer materials in the adjacent area of the diode and junction box ignite in less than 0.1 seconds.

Bower, Ward Isaac; Quintana, Michael A.; Johnson, Jay

2012-01-01T23:59:59.000Z

297

Metals purification by improved vacuum arc remelting  

DOE Patents [OSTI]

The invention relates to improved apparatuses and methods for remelting metal alloys in furnaces, particularly consumable electrode vacuum arc furnaces. Excited reactive gas is injected into a stationary furnace arc zone, thus accelerating the reduction reactions which purify the metal being melted. Additionally, a cooled condensation surface is disposed within the furnace to reduce the partial pressure of water in the furnace, which also fosters the reduction reactions which result in a purer produced ingot. Methods and means are provided for maintaining the stationary arc zone, thereby reducing the opportunity for contaminants evaporated from the arc zone to be reintroduced into the produced ingot.

Zanner, Frank J. (Sandia Park, NM); Williamson, Rodney L. (Albuquerque, NM); Smith, Mark F. (Albuquerque, NM)

1994-12-13T23:59:59.000Z

298

Exhaust Gas Fuel Reforming of Diesel Fuel by Nonthermal Arc Discharge for NOx Trap Regeneration Application  

Science Journals Connector (OSTI)

Exhaust Gas Fuel Reforming of Diesel Fuel by Nonthermal Arc Discharge for NOx Trap Regeneration Application ... It has been demonstrated that low current arc discharges are highly nonhomogenous. ... In the second case, which corresponds to the most favorable one, assuming (i) a 100 kW car engine thermal power (i.e., 40 kW mechanical power), (ii) that the plasma will treat only a small fraction of the exhaust gas (typically 3.5%), (iii) that the plasma will operate under a cycling operating mode, and (iv) an 80% efficiency for the onboard production of electricity from the car engine, one can estimate that the electric power needed to run the plasma will be around 2.2% of the engine power only during 12 s every 11 km (6.8 miles), that is, 12 s every 6 min assuming a 110 km·h?1 (68 mph) average car velocity. ...

Alexandre Lebouvier; Franc?ois Fresnet; Fre?de?ric Fabry; Vale?rie Boch; Vandad Rohani; Franc?ois Cauneau; Laurent Fulcheri

2011-02-03T23:59:59.000Z

299

Influence of Peroxynitrite in Gliding Arc Discharge Treatment of Alizarin Red S and Postdischarge Effects  

Science Journals Connector (OSTI)

(15-17) Some nonthermal plasma techniques, such as corona,(18, 19) dielectric barrier discharge (DBD),(20) or gliding arc discharges (GAD) belong to these AOPs: they burn at atmospheric pressure in conditions halfway from thermal and nonthermal plasmas, since electrons and heavy particles are not fully thermalized as they are in thermal plasmas. ... Technical cost evaluation takes into account the reagents used and electricity consumption. ... Kamgang Youbi, G.; Herry, J.-M.; Bellon-Fontaine, M.-N.; Brisset, J.-L.; Doubla, A.; Naïtali, M.Evidence of the temporal post-discharge decontamination of bacteria by gliding electric discharges: Application to Hafnia alvei Appl. ...

D. R. Merouani; F. Abdelmalek; M. R. Ghezzar; A. Semmoud; A. Addou; J. L. Brisset

2012-12-24T23:59:59.000Z

300

The Temperature of the Copper Arc  

Science Journals Connector (OSTI)

...Laboratory, General Electric Company. | Journal Article...TEMPERATURE OF THE COPPER ARC By C. G. SUITS RESEARCH LABORATORY, GENERAL ELECTRIC COMPANY Read before the...figure 1, where Fis an arc burning between the electrodes...experiment is a condensed discharge between the electrode...

C. G. Suits

1935-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


301

Vacuum vapor deposition gun assembly  

DOE Patents [OSTI]

A vapor deposition gun assembly includes a hollow body having a cylindrical outer surface and an end plate for holding an adjustable heat sink, a hot hollow cathode gun, two magnets for steering the plasma from the gun into a crucible on the heat sink, and a shutter for selectively covering and uncovering the crucible.

Zeren, Joseph D. (Boulder, CO)

1985-01-01T23:59:59.000Z

302

Local arc discharge mechanism and requirements of power supply in micro-arc oxidation of magnesium alloy  

Science Journals Connector (OSTI)

To study the requirements of the power supply in micro-arc oxidation (MAO) of magnesium alloy, many experiments ... . Based on the experimental results and electric arc theory, the separate local arc discharge me...

Ming Chen; Yuezhou Ma; Yuan Hao

2010-03-01T23:59:59.000Z

303

Nitrogen Control in Electric Arc Furnace Steelmaking by Direct...  

Office of Energy Efficiency and Renewable Energy (EERE) Indexed Site

Nitrogen Control in Electric Arc Furnace Steelmaking by Direct Reduced Iron Fines Injection Nitrogen Control in Electric Arc Furnace Steelmaking by Direct Reduced Iron Fines...

304

Electrophoretic deposition of biomaterials  

Science Journals Connector (OSTI)

...hybrid treatment involving micro-arc discharge oxidation and EPD. A dual-coating...the porous TiO2 layer by micro-arc oxidation coupled with EPD has been...within porous TiO2 layer by micro-arc oxidation coupled with electrophoretic...

2010-01-01T23:59:59.000Z

305

Experimental Test Of Whether Electrostatically Charged Micro-organisms And Their Spores Contribute To The Onset Of Arcs Across Vacuum Gaps  

SciTech Connect (OSTI)

Recently it was proposed [L.R. Grisham, A. vonHalle, A.F. Carpe, Guy Rossi, K.R. Gilton, E.D. McBride, E.P. Gilson, A. Stepanov, T.N. Stevenson, Physics of Plasma 19 023107 (2012)] that one of the initiators of vacuum voltage breakdown between condu cting electrodes might be micro-organisms and their spores, previously deposited during exposure to air, which tnen become electrostatically charged when an electric potential is applied across the vacuum gap. The note describes a simple experiment to compare the number of voltage-conditioning pulses required to reach the nominal maxium operating voltage across a gap between two metallic conductors in a vacuum, comparing cases in which biological cleaning was done just prior to pump-down with cases where this was not done, with each preceded by exposure to ambient air for three days. Based upon these results, it does not appear that air-deposited microbes and their spores constitute a major pathway for arc initiation, at least for exposure periods of a few days, and for vacuum gaps of a few millimeters, in the regime where voltage holding is usually observed to vary linearly with gap distance

none,; Grisham, Larry R.

2014-02-24T23:59:59.000Z

306

Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field  

SciTech Connect (OSTI)

Because plasma production at vacuum cathode spots is approximately proportional to the arc current, arc current modulation can be used to generate ion current modulation that can be detected far from the spot using a negatively biased ion collector. The drift time to the ion detector can used to determine kinetic ion energies. A very wide range of cathode materials have been used. It has been found that the kinetic ion energy is higher at the beginning of each discharge and approximately constant after 150 {micro}s. The kinetic energy is correlated with the arc voltage and the cohesive energy of the cathode material. The ion erosion rate has in inverse relation to the cohesive energy, enhancing the effect that the power input per plasma particle correlates with the cohesive energy of the cathode material. The influence of three magnetic field configurations on the kinetic energy has been investigated. Generally, a magnetic field increases the plasma impedance, arc burning voltage, and kinetic ion energy. However, if the plasma is produced in a region of low field strength and streaming into a region of higher field strength, the velocity may decrease due to the mirror effect. A magnetic field can increase the plasma temperature but may reduce the density gradients by preventing free expansion into vacuum. Therefore, depending on the configuration, a magnetic field may increase or decrease the kinetic energy of ions. Additionally, the angular distribution of the ion flux and ion kinetic energy has been investigated in the absence of an external magnetic field. The result can be fitted by a superposition of an isotropic and a cosine distribution.

Anders, Andre; Yushkov, George Yu.

2001-10-02T23:59:59.000Z

307

Interaction of dense nitrogen plasma with SS304 surface using APF plasma focus device  

Science Journals Connector (OSTI)

The nitridation of SS304 surfaces is obtained by irradiating nitrogen ions from Amirkabir plasma focus device, which use multiple focus deposition shots...

M. Afrashteh; M. Habibi; E. Heydari

2012-04-01T23:59:59.000Z

308

Microwave Plasma Chemical Vapor Deposition of Carbon Coatings on LiNi1/3Co1/3Mn1/3O2 for Li-Ion Battery Composite Cathodes  

SciTech Connect (OSTI)

In this paper, we report results of a novel synthesis method of thin film conductive carbon coatings on LiNi{sub 1/3}Co{sub 1/3}Mn{sub 1/3}O{sub 2} cathode active material powders for lithium-ion batteries. Thin layers of graphitic carbon were produced from a solid organic precursor, anthracene, by a one-step microwave plasma chemical vapor deposition (MPCVD) method. The structure and morphology of the carbon coatings were examined using SEM, TEM, and Raman spectroscopy. The composite LiNi{sub 1/3}Co{sub 1/3}Mn{sub 1/3}O{sub 2} electrodes were electrochemically tested in lithium half coin cells. The composite cathodes made of the carbon-coated LiNi{sub 1/3}Co{sub 1/3}Mn{sub 1/3}O{sub 2} powder showed superior electrochemical performance and increased capacity compared to standard composite LiNi{sub 1/3}Co{sub 1/3}Mn{sub 1/3}O{sub 2} electrodes.

Doeff, M.M.; Kostecki, R.; Marcinek, M.; Wilcoc, J.D.

2008-12-10T23:59:59.000Z

309

Magnetic-cusp, cathodic-arc source  

DOE Patents [OSTI]

A magnetic-cusp for a cathodic-arc source wherein the arc is confined to the desired cathode surface, provides a current path for electrons from the cathode to the anode, and utilizes electric and magnetic fields to guide ions from the cathode to a point of use, such as substrates to be coated. The magnetic-cusp insures arc stability by an easy magnetic path from anode to cathode, while the straight-through arrangement leads to high ion transmission. 3 figs.

Falabella, S.

1995-11-21T23:59:59.000Z

310

Exhaust gas fuel reforming of Diesel fuel by non-thermal arc discharge for NOx trap regeneration  

E-Print Network [OSTI]

1 Exhaust gas fuel reforming of Diesel fuel by non- thermal arc discharge for NOx trap regeneration to the reforming of Diesel fuel with Diesel engine exhaust gas using a non-thermal plasma torch for NOx trap Diesel fuel reforming with hal-00617141,version1-17May2013 Author manuscript, published in "Energy

Boyer, Edmond

311

Achievement Rewards for College Scientists ARCS Foundation, Inc.  

E-Print Network [OSTI]

Achievement Rewards for College Scientists ARCS Foundation, Inc. For more information on how of the ARCS Foundation, Inc. funds seven scholarships for exceptional University of Georgia doctoral students. Available to attend the ARCS Foundation Awards Luncheon in Atlanta on November 21, 2013. ARCS Foundation

Arnold, Jonathan

312

A Study Of Scale Deposition- An Analogue Of Meso- To Epithermal Ore  

Open Energy Info (EERE)

Study Of Scale Deposition- An Analogue Of Meso- To Epithermal Ore Study Of Scale Deposition- An Analogue Of Meso- To Epithermal Ore Formation In The Volcano Of Milos, Aegean Arc, Greece Jump to: navigation, search GEOTHERMAL ENERGYGeothermal Home Journal Article: A Study Of Scale Deposition- An Analogue Of Meso- To Epithermal Ore Formation In The Volcano Of Milos, Aegean Arc, Greece Details Activities (0) Areas (0) Regions (0) Abstract: The viability of boiling as a mechanism for meso- to epithermal ore formation has been tested in the Milos volcano, Aegean Island Arc, by investigating rates of deposition and composition of scale, and by drawing an analogy between the results and actual field occurrences on the island. Milos offers ideal conditions for such testing: it consists of predominantly felsic volcanic rocks with numerous late-stage hydrovolcanic

313

Method for cracking hydrocarbon compositions using a submerged reactive plasma system  

DOE Patents [OSTI]

A method is described for cracking a liquid hydrocarbon composition (e.g. crude oil) to produce a cracked hydrocarbon product. A liquid hydrocarbon composition is initially provided. An electrical arc is generated directly within the hydrocarbon composition so that the arc is entirely submerged in the composition. Arc generation is preferably accomplished using a primary and secondary electrode each having a first end submerged in the composition. The first ends of the electrodes are separated from each other to form a gap there between. An electrical potential is then applied to the electrodes to generate the arc within the gap. A reactive gas is thereafter delivered to the arc which forms a bubble around the arc. Gas delivery may be accomplished by providing a passageway through each electrode and delivering the gas through the passageways. The arc and gas cooperate to produce a plasma which efficiently cracks the hydrocarbon composition. 6 figs.

Kong, P.C.

1997-05-06T23:59:59.000Z

314

Method for cracking hydrocarbon compositions using a submerged reactive plasma system  

DOE Patents [OSTI]

A method for cracking a liquid hydrocarbon composition (e.g. crude oil) to produce a cracked hydrocarbon product. A liquid hydrocarbon composition is initially provided. An electrical arc is generated directly within the hydrocarbon composition so that the arc is entirely submerged in the composition. Arc generation is preferably accomplished using a primary and secondary electrode each having a first end submerged in the composition. The first ends of the electrodes are separated from each other to form a gap therebetween. An electrical potential is then applied to the electrodes to generate the arc within the gap. A reactive gas is thereafter delivered to the arc which forms a bubble around the arc. Gas delivery may be accomplished by providing a passageway through each electrode and delivering the gas through the passageways. The arc and gas cooperate to produce a plasma which efficiently cracks the hydrocarbon composition.

Kong, Peter C. (Idaho Falls, ID)

1997-01-01T23:59:59.000Z

315

Arc Statistics in Clusters: Galaxy Contribution  

E-Print Network [OSTI]

The frequency with which background galaxies appear as long arcs as a result of gravitational lensing by foreground clusters of galaxies has recently been found to be a very sensitive probe of cosmological models by Bartelmann et al. (1998). They have found that such arcs would be expected far less frequently than observed (by an order of magnitude) in the currently favored model for the universe, with a large cosmological constant $\\Omega_\\Lambda \\sim 0.7$. Here we analyze whether including the effect of cluster galaxies on the likelihood of clusters to generate long-arc images of background galaxies can change the statistics. Taking into account a variety of constraints on the properties of cluster galaxies, we find that there are not enough sufficiently massive galaxies in a cluster for them to significantly enhance the cross section of clusters to generate long arcs. We find that cluster galaxies typically enhance the cross section by only $\\lesssim 15%$.

R. A. Flores; A. H. Maller; J. R. Primack

1999-09-23T23:59:59.000Z

316

Detection of arcs in automotive electrical systems  

E-Print Network [OSTI]

At the present time, there is no established method for the detection of DC electric arcing. This is a concern for forthcoming advanced automotive electrical systems which consist of higher DC electric power bus voltages, ...

Mishrikey, Matthew David

2005-01-01T23:59:59.000Z

317

Condensation coefficients in plasma sputtering Pascal Brault , Anne-Lise Thomann, Jean-Philippe  

E-Print Network [OSTI]

Condensation coefficients in plasma sputtering deposition Pascal Brault §, Anne-Lise Thomann, Jean Backscattering Spectrom- etry are combined to determine condensation coefficients for plasma sputtering depo- sition. The method is applied for palladium deposition onto various substrates and condensation

Boyer, Edmond

318

Ion source with improved primary arc collimation  

DOE Patents [OSTI]

An improved negative ion source is provided in which a self-biasing, molybdenum collimator is used to define the primary electron stream arc discharge from a filament operated at a negative potential. The collimator is located between the anode and the filament. It is electrically connected to the anode by means of an appropriate size resistor such that the collimator is biased at essentially the filament voltage during operation. Initially, the full arc voltage appears across the filament to collimator until the arc discharge strikes. Then the collimator biases itself to essentially filament potential due to current flow through the resistor thus defining the primary electron stream without intercepting any appreciable arc power. The collimator aperture is slightly smaller than the anode aperture to shield the anode from the arc power, thereby preventing the exposure of the anode to the full arc power which, in the past, has caused overheating and erosion of the anode collimator during extended time pulsed-beam operation of the source. With the self-biasing collimator of this invention, the ion source may be operated from short pulse periods to steady-state without destroying the anode.

Dagenhart, William K. (Oak Ridge, TN)

1985-01-01T23:59:59.000Z

319

A new experimental technique for investigation of plasma generated with plasmotrons in electrophysical installations  

E-Print Network [OSTI]

discharges and electric arc generators of low temperature plasma ­ plasmotrons [8, 9]. Plasmotron allows of megawatt. In palsmotron internal energy of electric arc transforms in internal energy of gas surrounding, increasing destruction speed, reducing consumption of electric power and consumable chemicals, and a whole

Boyer, Edmond

320

The Consumption of Carbon in the Electric Arc. I. Variation with Current and Arc-Length. II. Influence upon the Luminous Radiation from the Arc  

Science Journals Connector (OSTI)

1 December 1915 research-article The Consumption of Carbon in the Electric Arc. I. Variation with Current and Arc-Length. II. Influence upon the Luminous Radiation from the...

1915-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


321

Pulsed Laser Deposition | EMSL  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Pulsed Laser Deposition Pulsed Laser Deposition EMSL's pulsed laser deposition (PLD) system is designed for epitaxial growth of oxide, ceramic, or synthetic mineral thin films and...

322

Formation of laser plasma channels in a stationary gas A. Dunaevsky  

E-Print Network [OSTI]

a high-current arc discharge leads to overdense plasma near the front pinhole and further refraction-current glow discharge initiated in the chamber improves the uniformity of the plasma channel slightly, while fluctuation of the plasma density is nez ne a0 p , 1 where a0=eE/mc is normalized electric field in the beam

323

SciTech Connect: plasma  

Office of Scientific and Technical Information (OSTI)

plasma Find plasma Find How should I search Scitech Connect ... Basic or Advanced? Basic Search Advanced × Advanced Search Options Full Text: Bibliographic Data: Creator / Author: Name Name ORCID Title: Subject: Identifier Numbers: Research Org.: Sponsoring Org.: Site: All Alaska Power Administration, Juneau, Alaska (United States) Albany Research Center (ARC), Albany, OR (United States) Albuquerque Complex - NNSA Albuquerque Operations Office, Albuquerque, NM (United States) Amarillo National Resource Center for Plutonium, Amarillo, TX (United States) Ames Laboratory (AMES), Ames, IA (United States) Argonne National Laboratory (ANL), Argonne, IL (United States) Argonne National Laboratory-Advanced Photon Source (United States) Atlanta Regional Office, Atlanta, GA (United States) Atmospheric Radiation Measurement (ARM)

324

Plasma Processing of Advanced Materials  

SciTech Connect (OSTI)

Plasma Processing of Advanced Materials The project had the overall objective of improving our understanding of the influences of process parameters on the properties of advanced superhard materials. The focus was on high rate deposition processes using thermal plasmas and atmospheric pressure glow discharges, and the emphasis on superhard materials was chosen because of the potential impact of such materials on industrial energy use and on the environment. In addition, the development of suitable diagnostic techniques was pursued. The project was divided into four tasks: (1) Deposition of superhard boron containing films using a supersonic plasma jet reactor (SPJR), and the characterization of the deposition process. (2) Deposition of superhard nanocomposite films in the silicon-nitrogen-carbon system using the triple torch plasma reactor (TTPR), and the characterization of the deposition process. (3) Deposition of films consisting of carbon nanotubes using an atmospheric pressure glow discharge reactor. (4) Adapting the Thomson scattering method for characterization of atmospheric pressure non-uniform plasmas with steep spatial gradients and temporal fluctuations. This report summarizes the results.

Heberlein, Joachim, V.R.; Pfender, Emil; Kortshagen, Uwe

2005-02-28T23:59:59.000Z

325

Vertical Arc for ILC Low Emittance Transport  

SciTech Connect (OSTI)

The design and parameters of a vertical arc for the ILC Low Emittance Transport (LET) are reviewed. A 1 TeV CM ILC which relies upon 30 MV/m accelerating cavities with a packing fraction of 65% will require almost 48 km of main linac, which suggests that the total site length including BDS and bunch compressors will be on the order of 53 km. If built in a laser-straight tunnel with the low-energy ends near the surface, and assuming a perfectly spherical ''cue ball'' planetary surface with radius 6370 km, the collider halls will necessarily be 55 meters below grade, as shown in the top plot of Figure 1. Such depths would demand extensive use of deep tunneling, which would potentially drive up the cost and difficulty of ILC construction. An alternate solution is to use discrete vertical arcs at a few locations to allow a ''piecewise straight'' construction in which the depth of the tunnel below grade does not vary by more than a few meters. This approach is shown schematically in the bottom plot of Figure 1. In this Note we consider the issues for a design with one such vertical arc at the 250 GeV/c point (ie, midway down the linac for 1 TeV CM), and a second arc at the entrance to the BDS (ie, the entire BDS lies in one plane, with vertical arcs at each end).

Tenenbaum, P.; Woodley, M.; /SLAC

2005-06-07T23:59:59.000Z

326

Ion source with improved primary arc collimation  

DOE Patents [OSTI]

An improved negative ion source is provided in which a self-biasing, molybdenum collimator is used to define the primary electron stream arc discharge from a filament operated at a negative potential. The collimator is located between the anode and the filament. It is electrically connected to the anode by means of an appropriate size resistor such that the collimator is biased at essentially the filament voltage during operation. Initially, the full arc voltage appears across the filament to collimator until the arc discharge strikes. Then the collimator biases itself to essentially filament potential due to current flow through the resistor thus defining the primary electron stream without intercepting any appreciable arc power. The collimator aperture is slightly smaller than the anode aperture to shield the anode from the arc power which, in the past, has caused overheating and erosion of the anode collimator during extended time pulsed-beam operation of the source. With the self-biasing collimator of this invention, the ion source may be operated from short pulse periods to steady-state without destroying the anode.

Dagenhart, W.K.

1983-12-16T23:59:59.000Z

327

Method for depositing high-quality microcrystalline semiconductor materials  

DOE Patents [OSTI]

A process for the plasma deposition of a layer of a microcrystalline semiconductor material is carried out by energizing a process gas which includes a precursor of the semiconductor material and a diluent with electromagnetic energy so as to create a plasma therefrom. The plasma deposits a layer of the microcrystalline semiconductor material onto the substrate. The concentration of the diluent in the process gas is varied as a function of the thickness of the layer of microcrystalline semiconductor material which has been deposited. Also disclosed is the use of the process for the preparation of an N-I-P type photovoltaic device.

Guha, Subhendu (Bloomfield Hills, MI); Yang, Chi C. (Troy, MI); Yan, Baojie (Rochester Hills, MI)

2011-03-08T23:59:59.000Z

328

Ion source based on the cathodic arc  

DOE Patents [OSTI]

A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated, is described. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles. 3 figures.

Sanders, D.M.; Falabella, S.

1994-02-01T23:59:59.000Z

329

Ion source based on the cathodic arc  

DOE Patents [OSTI]

A cylindrically symmetric arc source to produce a ring of ions which leave the surface of the arc target radially and are reflected by electrostatic fields present in the source to a point of use, such as a part to be coated. An array of electrically isolated rings positioned in the source serves the dual purpose of minimizing bouncing of macroparticles and providing electrical insulation to maximize the electric field gradients within the source. The source also includes a series of baffles which function as a filtering or trapping mechanism for any macroparticles.

Sanders, David M. (Livermore, CA); Falabella, Steven (Livermore, CA)

1994-01-01T23:59:59.000Z

330

E-Print Network 3.0 - assisted deposition method Sample Search...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

York Collection: Biotechnology ; Biology and Medicine 27 Deposition of TiO2 thin films by atmospheric plasma post-discharge assisted injection MOCVD Summary: Deposition of TiO2...

331

High-performance simulations for atmospheric pressure plasma reactor  

Science Journals Connector (OSTI)

Plasma-assisted processing and deposition of materials is an important component of modern industrial applications, with plasma reactors sharing 30% to 40% of manufacturing steps in microelectronics production. Development of new flexible electronics ...

Svyatoslav Chugunov / Iskander Akhatov

2012-01-01T23:59:59.000Z

332

CONTROL OF AN ARC DISCHARGE BY MEANS OF A GRID  

Science Journals Connector (OSTI)

CONTROL OF AN ARC DISCHARGE BY MEANS OF A GRID Albert...Research Laboratory, General Electric Co., Schenectady , N. Y. CONTROL OF AN ARC DISCHARGE BY MEANS OF A GRID. | Research Laboratory, General Electric Co., Schenectady , N...

Albert W. Hull; Irving Langmuir

1929-01-01T23:59:59.000Z

333

Fluorination of Arc-Produced Carbon Material Containing Multiwall Nanotubes  

Science Journals Connector (OSTI)

In this work we studied the fluorination process of MWNTs produced in an electric arc. ... Carbon material was synthesized by using a setup for arc-discharge graphite evaporation described elsewhere. ...

Nicolai F. Yudanov; Alexander V. Okotrub; Yuri V. Shubin; Lyudmila I. Yudanova; Lyubov G. Bulusheva; Andrew L. Chuvilin; Jean-Marc Bonard

2002-03-21T23:59:59.000Z

334

Type B Accident Investigation of the Savannah River Site Arc...  

Broader source: Energy.gov (indexed) [DOE]

the Savannah River Site Arc Flash Burn Injury on September 23, 2009, in the D Area Powerhouse Type B Accident Investigation of the Savannah River Site Arc Flash Burn Injury on...

335

Synthesis of multiwall carbon nanotubes by electric arc discharge in liquid environments  

Science Journals Connector (OSTI)

This work reports the experimental results from the production of multiwall carbon nanotubes (MWCN) synthesized by an electric arc discharge performed in liquid environments between pure graphite electrodes. Both liquid nitrogen and deionised water were suitable for a successful synthesis of this form of carbon aggregation. We report a successful synthesis of MWCN by arc discharge submerged in deionised water. Electron microscopy observations of both the reaction products and the surface of the as-synthesized raw material showed the presence of structural degradation of the MWCN, which probably operates after their growth at the cathode. The degradation is tentatively ascribed to a combination of overheating and high current density experienced by the as-synthesized MWNT, which can be caused by the loose structure of the as-deposited material. The damage appeared to be less severe in water environments, probably owing to the better cooling capacity of water relative to liquid nitrogen.

Marco Vittori Antisari; Renzo Marazzi; Radenka Krsmanovic

2003-01-01T23:59:59.000Z

336

Measurement of the temperature of a pulsating electric arc discharge  

Science Journals Connector (OSTI)

A simple method for determining the temperature on the axis of an oscillating arc column is proposed.

A. Marotta

1994-06-01T23:59:59.000Z

337

Achievement Rewards for College Scientists ARCS Foundation, Inc.  

E-Print Network [OSTI]

Achievement Rewards for College Scientists ARCS Foundation, Inc. Biomedical and Health Sciences the Atlanta chapter of the ARCS Foundation, Inc. funds eight scholarships for exceptional University.S. citizenship. · GPA of 3.5 or above. · Available to attend the ARCS Foundation Awards Luncheon in Atlanta

Arnold, Jonathan

338

Way to reduce arc voltage losses in hybrid thermionic converters  

SciTech Connect (OSTI)

Experimental results are reported concerning the output and emission characteristics of the arc and hybrid regimes in a plane-parallel thermionic converter with Pt--Zr--O electrode pair. It is shown that arc voltage losses can be reduced to values below those obtainable in ordinary arc thermionic converters.

Tskhakaya, V.K.; Yarygin, V.I.

1982-03-01T23:59:59.000Z

339

Calculating the parameters of electric-arc heaters with gas-stabilized arcs  

Science Journals Connector (OSTI)

We used a turbulent model of a longitudinally streamlined electric arc to derive an analytical solution for the ... of the distribution of the primary flow and discharge parameters in a cylindrical discharge chan...

N. A. Zyrichev

1969-07-01T23:59:59.000Z

340

Gas tungsten arc welder with electrode grinder  

DOE Patents [OSTI]

A welder for automated closure of fuel pins by a gas tungsten arc process in which a rotating length of cladding is positioned adjacent a welding electrode in a sealed enclosure. An independently movable axial grinder is provided in the enclosure for refurbishing the used electrode between welds.

Christiansen, David W. (Kennewick, WA); Brown, William F. (West Richland, WA)

1984-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


341

Large-scale purification of single-wall carbon nanotubes prepared by electric arc discharge  

Science Journals Connector (OSTI)

High-yield single-wall carbon nanotubes (SWNTs) have been mass-produced by dc arc discharge evaporation of a carbon electrode including 1 at.% Fe catalyst in hydrogen mixed gas [i.e., H2–inert gas (Ne, Ar, Kr, Xe), or H2–N2]. The as-grown \\{SWNTs\\} have high-crystallinity due to the high temperature of arc plasma, and the coexisting Fe catalyst nanoparticles are embedded in very thin amorphous carbon because of the in situ etching effects of hydrogen. A macroscale purification technique, which is a whole liquid-phase purification process, first reflux treatment in H2O2 solution and then rinsing with hydrochloric acid, has been developed to eliminate the coexisting Fe catalyst nanoparticles and obtain \\{SWNTs\\} with purity higher than 90 at.%.

Xinluo Zhao; Masato Ohkohchi; Sakae Inoue; Tomoko Suzuki; Takenori Kadoya; Yoshinori Ando

2006-01-01T23:59:59.000Z

342

Page 1 of 2 -ARC Cost Transfer Guide v. 06/14/13 ARC SPONSORED PROJECT COST TRANSFER GUIDE  

E-Print Network [OSTI]

Page 1 of 2 - ARC Cost Transfer Guide v. 06/14/13 ARC SPONSORED PROJECT COST TRANSFER GUIDE There are three ways to move expenditures onto, off of, or between Sponsored Projects in ARC: AP Journal Voucher in which the voucher accounting date falls, and they are being moved to or between Sponsored Projects GL

Hone, James

343

Time-dependence ion charge state distributions of vacuum arcs: An interpretation involving atoms and charge exchange collisions  

SciTech Connect (OSTI)

Experimentally observed charge state distributions are known to be higher at the beginning of each arc discharge. Up to know, this has been attributed to cathode surface effects in terms of changes of temperature, chemical composition and spot mode. Here it is shown that the initial decay of charge states of cathodic arc plasmas may at least in part due to charge exchange collisions of ions with neutrals that gradually fill the discharge volume. Sources of neutrals may include evaporated atoms from macroparticles and still-hot craters of previously active arc spots. More importantly, atoms are also produced by energetic condensation of the cathodic arc plasma. Self-sputtering is significant when ions impact with near-normal angle of incidence, and ions have low sticking probability when impacting at oblique angle of incidence. Estimates show that the characteristic time for filling the near-cathode discharge volume agrees well with the charge state decay time, and the likelihood of charge exchange is reasonably large to be taken into account.

Anders, Andre

2004-08-27T23:59:59.000Z

344

Plasma turbulence  

SciTech Connect (OSTI)

The origin of plasma turbulence from currents and spatial gradients in plasmas is described and shown to lead to the dominant transport mechanism in many plasma regimes. A wide variety of turbulent transport mechanism exists in plasmas. In this survey the authors summarize some of the universally observed plasma transport rates.

Horton, W. [Univ. of Texas, Austin, TX (United States). Inst. for Fusion Studies; Hu, G. [Globalstar LP, San Jose, CA (United States)

1998-07-01T23:59:59.000Z

345

The air plasma spraying  

Science Journals Connector (OSTI)

The air plasma spraying is characterized by using of a compressed air as a plasma forming gas. Here is shown the application of benefits of the present technology compared with other spraying process. The creation of the present process was possible due to a reliable plasma torch and certain condition of heating and deposition of powder materials on a work. Plasma torch develops a power up to 50 kW and can work during 14 hours without replacement of a cathode and during 25 hours as for an anode what is acceptable for industrial application. When spraying of coatings a minimum waste of alloying elements is attained with slight increase of oxygen in coating which is comparable with argon plasma spraying in the open. In certain cases the air plasma spraying allows to obtain more perfect coatings and at high performance. The present method finds large application at restoration and strengthening of machine parts, at forming of components etc. The air plasma spraying provides high quality coatings at low cost of components.

Valery S. Klubnikin

1993-01-01T23:59:59.000Z

346

INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 12 (2003) 821 PII: S0963-0252(03)55523-2  

E-Print Network [OSTI]

as multi-atmosphere thermal arcs, during their starting phase the lamps are moderate pressure glowINSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 12 (2003) 8­21 PII: S0963-0252(03)55523-2 Breakdown processes in metal halide lamps Brian Lay1

Kushner, Mark

347

Contamination d'un plasma d'argon par des vapeurs anodiques de cuivre P. Andanson et B. Cheminat  

E-Print Network [OSTI]

symboles Nous présentons une étude expérimentale sur la contamination d'un plasma d'arc par des vapeurs775 Contamination d'un plasma d'argon par des vapeurs anodiques de cuivre P. Andanson et B proche de l'anode en cuivre (1 mm à 1 cm) d'un arc stabilisé sous atmosphère d'argon (15 A et 30 A) est

Boyer, Edmond

348

Hybrid Arc Cell Studies: Status Report  

SciTech Connect (OSTI)

I report on the status, at the end of FY12, of the studies of an arc cell for a hybrid synchrotron accelerating from 375 GeV/c to 750 GeV/c in momentum. Garren produced a complete lattice that gives a good outline of the structure of a hybrid synchrotron lattice. It is, however, lacking in some details: it does not maintain a constant time of flight, it lacks chromaticity correction, its cell structure is not ideal for removing aberrations from chromaticity correction, and it probably needs more space between magnets. I have begun studying cell structures for the arc cells to optimize the lattice performance and cost. I present some preliminary results for two magnets per half cell. I then discuss difficulties encountered, some preliminary attempts at resolving them, and the future plans for this work.

Berg J. S.

2012-09-28T23:59:59.000Z

349

Electrical Safety and Arc Flash Protections  

SciTech Connect (OSTI)

Over the past four years, the Electrical Safety Program at PPPL has evolved in addressing changing regulatory requirements and lessons learned from accident events, particularly in regards to arc flash hazards and implementing NFPA 70E requirements. This presentation will discuss PPPL's approaches to the areas of electrical hazards evaluation, both shock and arc flash; engineered solutions for hazards mitigation such as remote racking of medium voltage breakers, operational changes for hazards avoidance, targeted personnel training and hazard appropriate personal protective equipment. Practical solutions for nominal voltage identification and zero voltage checks for lockout/tagout will also be covered. Finally, we will review the value of a comprehensive electrical drawing program, employee attitudes expressed as a personal safety work ethic, integrated safety management, and sustained management support for continuous safety improvement.

R. Camp

2008-03-04T23:59:59.000Z

350

Delivery quality assurance with ArcCHECK  

SciTech Connect (OSTI)

Radiation therapy requires delivery quality assurance (DQA) to ensure that treatment is accurate and closely follows the plan. We report our experience with the ArcCHECK phantom and investigate its potential optimization for the DQA process. One-hundred seventy DQA plans from 84 patients were studied. Plans were classified into 2 groups: those with the target situated on the diodes of the ArcCHECK (D plans) and those with the target situated at the center (C plans). Gamma pass rates for 8 target sites were examined. The parameters used to analyze the data included 3%/3 mm with the Van Dyk percent difference criteria (VD) on, 3%/3 mm with the VD off, 2%/2 mm with the VD on, and x/3 mm with the VD on and the percentage dosimetric agreement “x” for diode plans adjusted. D plans typically displayed maximum planned dose (MPD) on the cylindrical surface containing ArcCHECK diodes than center plans, resulting in inflated gamma pass rates. When this was taken into account by adjusting the percentage dosimetric agreement, C plans outperformed D plans by an average of 3.5%. ArcCHECK can streamline the DQA process, consuming less time and resources than radiographic films. It is unnecessary to generate 2 DQA plans for each patient; a single center plan will suffice. Six of 8 target sites consistently displayed pass rates well within our acceptance criteria; the lesser performance of head and neck and spinal sites can be attributed to marginally lower doses and increased high gradient of plans.

Neilson, Christopher; Klein, Michael; Barnett, Rob [London Regional Cancer Program, London Health Sciences Centre, London, Ontario (Canada); Yartsev, Slav, E-mail: slav.yartsev@lhsc.on.ca [London Regional Cancer Program, London Health Sciences Centre, London, Ontario (Canada)

2013-04-01T23:59:59.000Z

351

Volumetric modulated arc radiotherapy for esophageal cancer  

SciTech Connect (OSTI)

A treatment planning study was performed to evaluate the performance of volumetric arc modulation with RapidArc (RA) against 3D conformal radiation therapy (3D-CRT) and conventional intensity-modulated radiation therapy (IMRT) techniques for esophageal cancer. Computed tomgraphy scans of 10 patients were included in the study. 3D-CRT, 4-field IMRT, and single-arc and double-arc RA plans were generated with the aim to spare organs at risk (OAR) and healthy tissue while enforcing highly conformal target coverage. The planning objective was to deliver 54 Gy to the planning target volume (PTV) in 30 fractions. Plans were evaluated based on target conformity and dose-volume histograms of organs at risk (lung, spinal cord, and heart). The monitor unit (MU) and treatment delivery time were also evaluated to measure the treatment efficiency. The IMRT plan improves target conformity and spares OAR when compared with 3D-CRT. Target conformity improved with RA plans compared with IMRT. The mean lung dose was similar in all techniques. However, RA plans showed a reduction in the volume of the lung irradiated at V{sub 20Gy} and V{sub 30Gy} dose levels (range, 4.62-17.98%) compared with IMRT plans. The mean dose and D{sub 35%} of heart for the RA plans were better than the IMRT by 0.5-5.8%. Mean V{sub 10Gy} and integral dose to healthy tissue were almost similar in all techniques. But RA plans resulted in a reduced low-level dose bath (15-20 Gy) in the range of 14-16% compared with IMRT plans. The average MU needed to deliver the prescribed dose by RA technique was reduced by 20-25% compared with IMRT technique. The preliminary study on RA for esophageal cancers showed improvements in sparing OAR and healthy tissue with reduced beam-on time, whereas only double-arc RA offered improved target coverage compared with IMRT and 3D-CRT plans.

Vivekanandan, Nagarajan, E-mail: viveknaren@hotmail.com [Department of Medical Physics, Cancer Institute, Chennai (India); Sriram, Padmanaban; Syam Kumar, S.A.; Bhuvaneswari, Narayanan; Saranya, Kamalakannan [Department of Medical Physics, Cancer Institute, Chennai (India)

2012-04-01T23:59:59.000Z

352

Atmospheric-pressure plasma jet  

SciTech Connect (OSTI)

A {gamma}-mode, resonant-cavity plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250 C at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two concentric cylindrical electrodes are employed to generate a plasma in the annular region there between. A jet of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly shaping the rf-powered electrode. Because of the atmospheric pressure operation, no ions survive for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike low-pressure plasma sources and conventional plasma processing methods.

Selwyn, G.S.

1999-10-05T23:59:59.000Z

353

Advances in the electrospark deposition coating process  

Science Journals Connector (OSTI)

Electrospark deposition (ESD) is a pulsed?arc microwelding process using short?duration high?current electrical pulses to deposit an electrode material on a metallic substrate. It is one of the few methods available by which a fused metallurgically bonded coating can be applied with such a low total heat input that the bulk substrate material remains at or near ambient temperatures. The short duration of the electrical pulse allows an extremely rapid solidification of the deposited material and results in an exceptionally fine?grained homogeneous coating that approaches (and with some materials actually is) an amorphous structure. This structure is believed to contribute to the good tribological and corrosion performance observed for hardsurfacing materials used in the demanding environments of high temperatures liquid metals and neutron irradiation. A brief historical review of the process is provided followed by descriptions of the present state of the art and of the performance and applications of electrospark deposition coating in liquid–metal?cooled nuclear reactors.

Roger N. Johnson; G. L. Sheldon

1986-01-01T23:59:59.000Z

354

Contrib. Plasma Phys. 26 (1986) 1, 1-12 Sudden Jumps, Hysteresis, and Negative Resistance  

E-Print Network [OSTI]

are found in glow discharges, carbon arcs, thermionic converters, fluorescent lamps and four-layer diodes [lContrib. Plasma Phys. 26 (1986) 1, 1-12 Sudden Jumps, Hysteresis, and Negative Resistance in an Argon Plasma Discharge I. Discharges with No Magnetic Field R. A. BOSCHand R. L. MERLINO Department

Merlino, Robert L.

355

Development of the RF plasma source at atmospheric pressure  

Science Journals Connector (OSTI)

A radio frequency (RF) plasma source operates by feeding helium or argon gas through two coaxial electrodes driven by a 13.56 \\{MHz\\} RF source. In order to prevent an arc discharge, a dielectric material is loaded outside the center electrode. A stable, arc-free discharge is produced at a flow rate of 1.5 l/min of helium gas. The temperature of the gas flame varies from 100 to 150 °C depending on the RF power. The breakdown voltage also changes when the flow rate varies. The plasma generation in a hot chamber is much more efficient than that in a cold chamber. The plasma characteristics are diagnosed by using optical emission spectroscopy. One of the applications of the RF plasma source is the printed circuit board (PCB) cleaning process, needed for environmental protection. The PCB cleaning device forms an asymmetric biaxial reactor.

Jung G. Kang; Hyoung S. Kim; Sung W. Ahn; Han S. Uhm

2003-01-01T23:59:59.000Z

356

Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates: Annual technical status report, 11 March 1998--11 March 1999  

SciTech Connect (OSTI)

This report describes work performed by Energy Conversion Devices, Inc. (ECD) during this phase of this subcontract. ECD researchers have made significant progress in advancing the very high frequency (VHF), high-rate technology. They demonstrated that 8.0% stable efficiencies can be achieved for a-Si:H cells whose i-layers are prepared at rates near 10 {angstrom}/s using the VHF technique. Presently, there is not a great difference in the performance of a-Si:H cells made using the VHF technique and i-layer deposition rates near 10 {angstrom}/s and that for cells made using the standard 13.56 MHz technique and rates near 1 {angstrom}/s in the same deposition system. In terms of the a-SiGe:H cells, researchers have completed a number of studies of devices with properties appropriate for middle-junction cells-that is, cells without Ag/ZnO back-reflectors having Voc values near 0.75V and Jsc values near 8.0 mA/cm{sup 2} when measured using AM1.5 light filtered using a 530-nm, low-band-pass filter. The stabilized proper ties for these cells prepared at i-layer rates near 10 {angstrom}/s are again similar to a-SiGe:H cells made using the same deposition hardware and the low-rate 13.56 MHz method. Establishing an initial 10.5% for a triple-junction cell whose i-layers are prepared at the high rates sets the baseline for ECD's future studies. The triple-junction cell degradation (10%--13%) with prolonged light soaking is similar to that regularly obtained for cells prepared at low i-layer deposition rates (1 {angstrom}/s). This is important because the use of high-rate methods to prepare i-layers typically leads to less-stable materials and cells. Increasing the buffer-layer deposition rate to 6 {angstrom}/s leads to nearly a 15-min decrease in the total deposition time, whereas the increase in the n-layer and p-layer deposition rates both decrease the total time by 5 and 5.8 min, respectively. Thus, besides the i-layer growth rates, increasing the buffer layer growth rate has the strongest effect on the deposition time of the triple-junction semiconductor structures.

Jones, S.J.; Liu, T.; Tsu, D.; Izu, M.

1999-10-25T23:59:59.000Z

357

Arc Flash Boundary Calculations Using Computer Software Tools  

SciTech Connect (OSTI)

Arc Flash Protection boundary calculations have become easier to perform with the availability of personal computer software. These programs incorporate arc flash protection boundary formulas for different voltage and current levels, calculate the bolted fault current at each bus, and use built in time-current coordination curves to determine the clearing time of protective devices in the system. Results of the arc flash protection boundary calculations can be presented in several different forms--as an annotation to the one-line diagram, as a table of arc flash protection boundary distances, and as printed placards to be attached to the appropriate equipment. Basic arc flash protection boundary principles are presented in this paper along with several helpful suggestions for performing arc flash protection boundary calculations.

Gibbs, M.D.

2005-01-07T23:59:59.000Z

358

Numerical simulation study on fluid dynamics of plasma window using argon  

SciTech Connect (OSTI)

In this paper, a numerical 2D FLUENT-based magneto-hydrodynamic model has been developed to investigate the arc and flow field of plasma window, which is used as a windowless vacuum sealing device. The gas inlet, arc creation-developing and plasma expansion segments are all incorporated together in the integral model. An axis-symmetry cathode structure (hollow cathode) is used in the model. Current distribution of the arc is presented and discussed. The temperature, velocity, and pressure field are presented to show the physical mechanisms for the high pressure gap within the plasma window. Flow acceleration and viscosity effect are concluded as the main reasons for the pressure drop. The result for the pressure distribution in the cylindrical tube section has a good agreement with the analytical model. The validation for the sealing ability of plasma window is verified.

Huang, S.; Zhu, K.; Shi, B. L.; Lu, Y. R. [State Key Laboratory of Nuclear Physics and Technology, Peking University, Beijing 100871 (China)] [State Key Laboratory of Nuclear Physics and Technology, Peking University, Beijing 100871 (China); Hershcovitch, A. [Brookhaven National Laboratory, New York 11973-5000 (United States)] [Brookhaven National Laboratory, New York 11973-5000 (United States); Yang, L.; Zhang, X. Y.; Wei, G. D. [Institute of Modern Physics, Chinese Academy of Science, Lanzhou 730000 (China)] [Institute of Modern Physics, Chinese Academy of Science, Lanzhou 730000 (China)

2013-07-15T23:59:59.000Z

359

Analysis of radiofrequency discharges in plasma  

DOE Patents [OSTI]

Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition. 15 figs.

Kumar, D.; McGlynn, S.P.

1992-08-04T23:59:59.000Z

360

Analysis of radiofrequency discharges in plasma  

DOE Patents [OSTI]

Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition.

Kumar, Devendra (Baton Rouge, LA); McGlynn, Sean P. (Baton Rouge, LA)

1992-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
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361

A Miocene Island-Arc Volcanic Seamount- The Takashibiyama Formation...  

Open Energy Info (EERE)

Island-Arc Volcanic Seamount- The Takashibiyama Formation, Shimane Peninsula, Sw Japan Jump to: navigation, search OpenEI Reference LibraryAdd to library Journal Article: A...

362

Observation of objects under intense plasma background illumination  

SciTech Connect (OSTI)

Experiments on the observation of a brightness-amplified image of an object through a masking arc discharge are presented. The copper-vapor laser active medium was used as an image brightness amplifier. It is shown that the image quality does not worsen under plasma background illumination.

Buzhinsky, R. O.; Savransky, V. V. [Russian Academy of Sciences, Natural Science Center, Prokhorov Institute of General Physics (Russian Federation); Zemskov, K. I.; Isaev, A. A. [Russian Academy of Sciences, Lebedev Physical Institute (Russian Federation); Buzhinsky, O. I. [Troitsk Institute for Innovation and Fusion Research (Russian Federation)

2010-12-15T23:59:59.000Z

363

Three-dimensional Ion Distribution in a Filtered Vacuum Arc Discharge  

SciTech Connect (OSTI)

Three-dimensional measurements of the ion flux along the filter of a magnetically filtered d-c vacuum arc are presented. The device includes a metallic plasma-generating chamber with cooper electrodes coupled to a substrate chamber through a quarter-torus magnetic filter. The filtering magnetic field was high enough to magnetize the electrons but not the ions. The ion current distribution was studied using a multi-element Cu probes, placed at three different positions along the filter. The ion saturation current of each probe was measured by biasing the probe at -70V with respect the grounded anode. Preliminary results of the three dimensional ion flux distribution and the floating potential of the plasma as functions of the bias filter voltage and magnetic field intensity are reported.

Kelly, H.; Marquez, A.; Pirrera, M. [Instituto de Fisica del Plasma, CONICET-Dpto. de Fisica, FCEN, UBA, Ciudad Universitaria Pab. 1 (1428EHA) Ciudad de Buenos Aires (Argentina)

2006-12-04T23:59:59.000Z

364

A New Survey for Giant Arcs  

SciTech Connect (OSTI)

We report on the first results of an imaging survey to detect strong gravitational lensing targeting the richest clusters selected from the photometric data of the Sloan Digital Sky Survey (SDSS) with follow-up deep imaging observations from the Wisconsin Indiana Yale NOAO (WIYN) 3.5m telescope and the University of Hawaii 88-inch telescope (UH88). The clusters are selected from an area of 8000 deg{sup 2} using the Red Cluster Sequence technique and span the redshift range 0.1 {approx}< z {approx}< 0.6, corresponding to a comoving cosmological volume of {approx} 2Gpc{sup 3}. Our imaging survey thus targets a volume more than an order of magnitude larger than any previous search. A total of 240 clusters were imaged of which 141 had sub-arcsecond image quality. Our survey has uncovered 16 new lensing clusters with definite giant arcs, an additional 12 systems for which the lensing interpretation is very likely, and 9 possible lenses which contain shorter arclets or candidate arcs which are less certain and will require further observations to confirm their lensing origin. The number of new cluster lenses detected in this survey is likely > 30. Among these new systems are several of the most dramatic examples of strong gravitational lensing ever discovered with multiple bright arcs at large angular separation. These will likely become 'poster-child' gravitational lenses similar to Abell 1689 and CL0024+1654. The new lenses discovered in this survey will enable future systematic studies of the statistics of strong lensing and its implications for cosmology and our structure formation paradigm.

Hennawi, Joseph F.; Gladders, Michael D.; Oguri, Masamune; Dalal, Neal; Koester, Benjamin; Natarajan, Priyamvada; Strauss, Michael A.; Inada, Naohisa; Kayo, Issha; Lin,; Lampeitl, Hubert; Annis, James; Bahcall, Neta A.; Schneider, Donald P.

2006-11-15T23:59:59.000Z

365

The effective spectral irradiance of ultra-violet radiations from inert-gas-shielded welding processes in relation to the ARC current density  

E-Print Network [OSTI]

lamp filaments, the electrodes of an electric arc, and molten metals of high melting point. The emission of an incandescent object is due to its temperature and depends little upon the chemical nature of the radiator. The Stefan- 13 Boltzmann law... is automatically fed by the welding machine into the weld puddle. Metal is transferred through the arc plasma to the base material being welded. The wire is of the same metallic composition as the base metal, and generally the same diameter is used for most...

DeVore, Robin Kent

1973-01-01T23:59:59.000Z

366

Sensing the gas metal arc welding process  

SciTech Connect (OSTI)

Control of gas metal arc welding (GMAW) requires real-time sensing of the process. Three sensing techniques for GMAW are being developed at the Idaho National Engineering Laboratory (INEL). These are (1) noncontacting ultrasonic sensing using a laser/EMAT (electromagnetic acoustic transducer) to detect defects in the solidified weld on a pass-bypass basis, (2) integrated optical sensing using a CCD camera and a laser stripe to obtain cooling rate and weld bead geometry information, and (3) monitoring fluctuations in digitized welding voltage data to detect the mode of metal droplet transfer and assure that the desired mass input is achieved.

Carlson, N.M.; Johnson, J.A.; Smartt, H.B.; Watkins, A.D.; Larsen, E.D.; Taylor, P.L. [EG and G Idaho, Inc., Idaho Falls, ID (United States); Waddoups, M.A. [Idaho National Engineering Lab., Idaho Falls, ID (United States)

1992-10-01T23:59:59.000Z

367

Sensing the gas metal arc welding process  

SciTech Connect (OSTI)

Control of gas metal arc welding (GMAW) requires real-time sensing of the process. Three sensing techniques for GMAW are being developed at the Idaho National Engineering Laboratory (INEL). These are (1) noncontacting ultrasonic sensing using a laser/EMAT (electromagnetic acoustic transducer) to detect defects in the solidified weld on a pass-bypass basis, (2) integrated optical sensing using a CCD camera and a laser stripe to obtain cooling rate and weld bead geometry information, and (3) monitoring fluctuations in digitized welding voltage data to detect the mode of metal droplet transfer and assure that the desired mass input is achieved.

Carlson, N.M.; Johnson, J.A.; Smartt, H.B.; Watkins, A.D.; Larsen, E.D.; Taylor, P.L. (EG and G Idaho, Inc., Idaho Falls, ID (United States)); Waddoups, M.A. (Idaho National Engineering Lab., Idaho Falls, ID (United States))

1992-01-01T23:59:59.000Z

368

Characteristics of plasma properties in an ablative pulsed plasma thruster  

SciTech Connect (OSTI)

Pulsed plasma thrusters are electric space propulsion devices which create a highly transient plasma bulk in a short-time arc discharge that is expelled to create thrust. The transitional character and the dependency on the discharge properties are yet to be elucidated. In this study, optical emission spectroscopy and Mach-Zehnder interferometry are applied to investigate the plasma properties in variation of time, space, and discharge energy. Electron temperature, electron density, and Knudsen numbers are derived for the plasma bulk and discussed. Temperatures were found to be in the order of 1.7 to 3.1 eV, whereas electron densities showed maximum values of more than 10{sup 17} cm{sup -3}. Both values showed strong dependency on the discharge voltage and were typically higher closer to the electrodes. Capacitance and time showed less influence. Knudsen numbers were derived to be in the order of 10{sup -3}-10{sup -2}, thus, indicating a continuum flow behavior in the main plasma bulk.

Schoenherr, Tony; Nees, Frank; Arakawa, Yoshihiro [Department of Aeronautics and Astronautics, University of Tokyo, Bunkyo, Tokyo 113-8656 (Japan); Komurasaki, Kimiya [Department of Advanced Energy, University of Tokyo, Kashiwa, Chiba 277-8561 (Japan); Herdrich, Georg [Institute of Space Systems (IRS), University of Stuttgart, 70569 Stuttgart, Baden-Wuerttemberg (Germany)

2013-03-15T23:59:59.000Z

369

Comparison of the efficiency of N2 and NH3 plasma treatments to improve the adhesion of PP films to in situ deposited Al coatings. Study of ageing phenomena in terms of acid-base properties  

Science Journals Connector (OSTI)

This paper reports on the characteristics of polypropylene (PP) treated at two different frequencies, 70 kHz and 13.56 MHz, in two plasma atmospheres, NH3 and N2 plasmas. Chemical modifications created on the plasma-treated material were investigated by different complementary surface analytical techniques (X-ray photoelectron spectroscopy (XPS) and contact angle measurements), which revealed a higher reactivity of the NH3 plasma. The incorporation of nitrogen plays an important role as revealed by the adhesion study of thermally evaporated aluminium with treated PP: the measured peel strengths were two times higher for NH3-treated surfaces than for N2-treated ones, with XPS measurements showing a sharper increase of N/C ratio as a function of treatment time for the former treatment. Ageing of the PP pretreated in NH3 was also studied in terms of surface acid-base properties. The work of adhesion, calculated from contact angle measurements, showed a distinct dependence on the pH value of the test liquids and good correlations were obtained with peel test results. The basic character of the NH3-treated PP disappears with ageing, leading to an amphoteric surface.

M. Tatoulian; F. Arefi-Khonsari; N. Shahidzadeh-Ahmadi; J. Amouroux

1995-01-01T23:59:59.000Z

370

Atmospheric pressure plasma processing with microstructure electrodes and microplanar reactors  

Science Journals Connector (OSTI)

Atmospheric pressure plasmas can be generated, if the distance between the plasma generating electrodes is in the range of 100 ?m, and radio-frequencies of 13.56 or 27.12 \\{MHz\\} are applied. Such small dimensioned plasmas are only of interest for industrial plasma applications if larger areas can be processed. It will be shown that both with microstructure electrodes as with microplanar-reactor, plasma processing can be carried out for typical substrate dimensions of 100 mm and more using helium or neon for plasma generation. First experiments of plasma surface treatment of polymers and of thin film deposition on silicon will be presented. With mixtures of some percentage C2H2 in atmospheric pressure helium, diamond-like carbon films with deposition rates between 1–10 ?m/min can be deposited.

H. Schlemm; D. Roth

2001-01-01T23:59:59.000Z

371

ARC: A compact, high-field, fusion nuclear science facility and demonstration power plant with demountable magnets  

E-Print Network [OSTI]

The affordable, robust, compact (ARC) reactor conceptual design study aims to reduce the size, cost, and complexity of a combined fusion nuclear science facility (FNSF) and demonstration fusion Pilot power plant. ARC is a 270 MWe tokamak reactor with a major radius of 3.3 m, a minor radius of 1.1 m, and an on-axis magnetic field of 9.2 T. ARC has rare earth barium copper oxide (REBCO) superconducting toroidal field coils, which have joints to enable disassembly. This allows the vacuum vessel to be replaced quickly, mitigating first wall survivability concerns, and permits a single device to test many vacuum vessel designs and divertor materials. The design point has a plasma fusion gain of Q_p~13.6, yet is fully non-inductive, with a modest bootstrap fraction of only ~63%. Thus ARC offers a high power gain with relatively large external control of the current profile. This highly attractive combination is enabled by the ~23 T peak field on coil with newly available REBCO superconductor technology. External cu...

Sorbom, B N; Palmer, T R; Mangiarotti, F J; Sierchio, J M; Bonoli, P; Kasten, C; Sutherland, D A; Barnard, H S; Haakonsen, C B; Goh, J; Sung, C; Whyte, D G

2014-01-01T23:59:59.000Z

372

Stress-Relaxation and Creep Behavior of Heat-Treated Stand-Alone Plasma-Sprayed 7 wt.% Y2O3-ZrO2 Coatings  

E-Print Network [OSTI]

Thermal barrier coatings have significantly increased the working efficiency of turbine engine and diesel the stock powder into high velocity arc plasma, which melts the powder while propelling it toward

Trice, Rodney W.

373

Oxydation par plasma électrolytique : influence des paramètres du procédé sur le comportement des micro-décharges et conséquences sur les couches d’oxydes.  

E-Print Network [OSTI]

??L’oxydation par plasma électrolytique (ou oxydation micro-arc) est un procédé de traitement des alliages légers (Al, Mg, V, Ti, etc.) apte à pallier les limites… (more)

Melhem, Amer

2011-01-01T23:59:59.000Z

374

E-Print Network 3.0 - arc magmatism isotopic Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

& Nakamura (1993) Nature 370 e.g. Izu arc: Ishikawa & Nakamura (1993) Nature 370 Boron isotopes help... --Th isotopes in arc magmasTh isotopes in arc magmas For equilibrium:...

375

E-Print Network 3.0 - arc northwesternmost california Sample...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

365 ARC JIW Engineering Design Requirements (4... 201 2. ARC 203 2. ARC 204 (studio) 3. PHY 103 3. PHY ... Source: Bou-Zeid, Elie - Department of Civil and Environmental...

376

E-Print Network 3.0 - arc detector system Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

by hand later) Summary: . The spatial resolution is approximately 1 arc sec in the E-W direction and 2 arc sec along the slit (N... ,0) (3,0) (0,910) Slit n ? (arc sec 2 ) ...

377

E-Print Network 3.0 - assisted non-consumable arc Sample Search...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Sample search results for: assisted non-consumable arc Page: << < 1 2 3 4 5 > >> 1 GIS by ESRITM What is ArcGIS Summary: GIS by ESRITM What is ArcGIS TM ? 12;Copyright ...

378

E-Print Network 3.0 - arc dynamic behavior Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Search Sample search results for: arc dynamic behavior Page: << < 1 2 3 4 5 > >> 1 GIS by ESRITM What is ArcGIS Summary: and events Dynamic segmentation Importing ArcView GIS...

379

Deposition of dopant impurities and pulsed energy drive-in  

DOE Patents [OSTI]

A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Jose, CA); Ellingboe, Albert R. (Malahide, IE)

2008-01-01T23:59:59.000Z

380

Deposition of dopant impurities and pulsed energy drive-in  

DOE Patents [OSTI]

A semiconductor doping process which enhances the dopant incorporation achievable using the Gas Immersion Laser Doping (GILD) technique. The enhanced doping is achieved by first depositing a thin layer of dopant atoms on a semiconductor surface followed by exposure to one or more pulses from either a laser or an ion-beam which melt a portion of the semiconductor to a desired depth, thus causing the dopant atoms to be incorporated into the molten region. After the molten region recrystallizes the dopant atoms are electrically active. The dopant atoms are deposited by plasma enhanced chemical vapor deposition (PECVD) or other known deposition techniques.

Wickboldt, Paul (Walnut Creek, CA); Carey, Paul G. (Mountain View, CA); Smith, Patrick M. (San Ramon, CA); Ellingboe, Albert R. (Fremont, CA)

1999-01-01T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


381

TiO2-assisted degradation of a perfluorinated surfactant in aqueous solutions treated by gliding arc discharge  

Science Journals Connector (OSTI)

The plasma–chemical degradation of Forafac 1110, a perfluorinated non-ionic surfactant, in aqueous solutions was investigated using TiO2 catalysts. The considered plasma was the gliding arc in humid air, which results from an electric discharge at atmospheric pressure and quasi-ambient temperature. Two titanium dioxide powders were used and their synergistic effects on the Forafac degradation were compared. The results were discussed through the evolution of the pH, the conductivity, the fluoride ions concentration released in solutions, the surfactant concentration remaining after treatment and the chemical oxygen demand (COD) measurement. The combination of the plasma–chemical treatment with heterogeneous catalysis through the use of TiO2 accelerated the Forafac degradation, since only 60 min was sufficient to remove 96% instead of 360 min needed in the absence of TiO2. The use of anatase and rutile under the trade-name of Rhodia TiO2 and Merck TiO2, respectively, led to different results, because Rhodia TiO2 has proven to be more efficient. It would seem that the crystalline phase as well as the crystallite size, explain the efficiency of anatase. The advantage of the plasma-catalysis is due to the fact that there is a significant production of the OH• radicals not only generated by the gliding arc discharge but also by TiO2.

Kheira Marouf-Khelifa; Fatiha Abdelmalek; Amine Khelifa; Ahmed Addou

2008-01-01T23:59:59.000Z

382

Arc Geometry and Algebra: Foliations, Moduli Spaces, String ...  

E-Print Network [OSTI]

exhaustive if wti(?) = 0 for all i. We set Arcs g(r ?1) ? As g,r and DArcs g(r ?1) ? Ds g,r to be the subsets of exhaustive elements. We furthermore set Arc(n) = ?g,

2012-05-02T23:59:59.000Z

383

Connecting ARC/INFO and SNACTor Project Report  

E-Print Network [OSTI]

Connecting ARC/INFO and SNACTor Project Report June 1991 Stuart C. Shapiro, Hans Chalupsky;Connecting ARC/INFO* and SNACTor --- Project Report1 Stuart C. Shapiro2 , Hans Chalupsky2 and Hsueh and reasoning system developed by Stuart C. Shapiro et al. at the State University of New York at Buffalo

California at Santa Barbara, University of

384

Sandy Depositional Systems  

Science Journals Connector (OSTI)

Why is the study of sandy depositional systems central to the understanding of sand and sandstone? From earliest times geologists have wanted to know where and under what conditions a sandstone was deposited—t...

F. J. Pettijohn; Paul Edwin Potter; Raymond Siever

1987-01-01T23:59:59.000Z

385

Optical fiber imaging for high speed plasma motion diagnostics: Applied to low voltage circuit breakers  

SciTech Connect (OSTI)

An integrated portable measurement system is described for the study of high speed and high temperature unsteady plasma flows such as those found in the vicinity of high current switching arcs. An array of optical fibers allows the formation of low spatial resolution images, with a maximum capture rate of 1x10{sup 6} images per second (1 MHz), with 8 bit intensity resolution. Novel software techniques are reported to allow imaging of the arc; and to measure arc trajectories. Results are presented on high current (2 kA) discharge events in a model test fixture and on the application to a commercial low voltage circuit breaker.

McBride, J. W. [School of Engineering Sciences, University of Southampton, Highfield, Southampton SO17 1BJ (United Kingdom); Balestrero, A.; Tribulato, G. [ABB SACE DIVISION, ABB S.p.A., Via Baioni, Bergamo 35 IT-24123 (Italy); Ghezzi, L. [ABB SACE DIVISION, ABB S.p.A., Viale dell'Industria, Vittuone (MI)18 IT-20010 (Italy); Cross, K. J. [Taicaan Ltd., 2 Venture Road, Southampton Science Park, Southampton, Hampshire SO16 7NP (United Kingdom)

2010-05-15T23:59:59.000Z

386

Darwin: The Third DOE ARM TWP ARCS Site  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Darwin: The Third DOE ARM TWP ARCS Site Darwin: The Third DOE ARM TWP ARCS Site W. E. Clements and L. Jones Los Alamos National Laboratory, Los Alamos, New Mexico T. Baldwin Special Services Unit Australian Bureau of Meteorology Melbourne, Australia K. Nitschke South Pacific Regional Environment Programme Apia, Samoa Introduction The U.S. Department of Energy's (DOE's) Atmospheric Radiation Measurement (ARM) Program began operations in its Tropical Western Pacific (TWP) locale in October 1996 when the first Atmospheric Radiation and Cloud Station (ARCS) began collecting data on Manus Island in Papua New Guinea (PNG). Two years later, in November 1998 a second ARCS began operations on the island of Nauru in the Central Pacific. Now a third ARCS has begun collecting data in Darwin, Australia. See Figure 1 for

387

Type A Investigation of the Electrical Arc Injury at the Stanford...  

Office of Environmental Management (EM)

of the Electrical Arc Injury at the Stanford Linear Accelerator Complex on October 11, 2004 Type A Investigation of the Electrical Arc Injury at the Stanford Linear Accelerator...

388

E-Print Network 3.0 - area filtered arc Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

of Electrical and Computer Engineering, University of Kentucky Collection: Engineering 3 GIS by ESRITM What is ArcGIS Summary: and terrainmodelingcapabilities. ArcGIS 3D Analyst...

389

E-Print Network 3.0 - andean arc magmatism Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

arc in central Novaya Zemlya, Arctic Russia... - genian magmatic arc. Zircon and titanite in four samples from Mashigin Fjord and Matochkin Strait yield U... ). The events at...

390

Electric field induced needle-pulsed arc discharge carbon nanotube production apparatus: Circuitry and mechanical design  

SciTech Connect (OSTI)

A simple and low cost apparatus is reported to produce multiwall carbon nanotubes and carbon nano-onions by a low power short pulsed arc discharge reactor. The electric circuitry and the mechanical design details and a micro-filtering assembly are described. The pulsed-plasma is generated and applied between two graphite electrodes. The pulse width is 0.3 {mu}s. A strong dc electric field is established along side the electrodes. The repetitive discharges occur in less than 1 mm distance between a sharp tip graphite rod as anode, and a tubular graphite as cathode. A hydrocarbon vapor, as carbon source, is introduced through the graphite nozzle in the cathode assembly. The pressure of the chamber is controlled by a vacuum pump. A magnetic field, perpendicular to the plasma path, is provided. The results show that the synergetic use of a pulsed-current and a dc power supply enables us to synthesize carbon nanoparticles with short pulsed plasma. The simplicity and inexpensiveness of this plan is noticeable. Pulsed nature of plasma provides some extra degrees of freedom that make the production more controllable. Effects of some design parameters such as electric field, pulse frequency, and cathode shape are discussed. The products are examined using scanning probe microscopy techniques.

Kia, Kaveh Kazemi [Department of Electrical and Computer Engineering, Islamic Azad University of Bonab, Bonab (Iran, Islamic Republic of); Bonabi, Fahimeh [Department of Engineering, Islamic Azad University of Bonab, Bonab (Iran, Islamic Republic of)

2012-12-15T23:59:59.000Z

391

An algorithm to calculate a collapsed arc dose matrix in volumetric modulated arc therapy  

SciTech Connect (OSTI)

Purpose: The delivery of volumetric modulated arc therapy (VMAT) is more complex than other conformal radiotherapy techniques. In this work, the authors present the feasibility of performing routine verification of VMAT delivery using a dose matrix measured by a gantry mounted 2D ion chamber array and corresponding dose matrix calculated by an inhouse developed algorithm.Methods: Pinnacle, v9.0, treatment planning system (TPS) was used in this study to generate VMAT plans for a 6 MV photon beam from an Elekta-Synergy linear accelerator. An algorithm was developed and implemented with inhouse computer code to calculate the dose matrix resulting from a VMAT arc in a plane perpendicular to the beam at isocenter. The algorithm was validated using measurement of standard patterns and clinical VMAT plans with a 2D ion chamber array. The clinical VMAT plans were also validated using ArcCHECK measurements. The measured and calculated dose matrices were compared using gamma ({gamma}) analysis with 3%/3 mm criteria and {gamma} tolerance of 1.Results: The dose matrix comparison of standard patterns has shown excellent agreement with the mean {gamma} pass rate 97.7 ({sigma}= 0.4)%. The validation of clinical VMAT plans using the dose matrix predicted by the algorithm and the corresponding measured dose matrices also showed good agreement with the mean {gamma} pass rate of 97.6 ({sigma}= 1.6)%. The validation of clinical VMAT plans using ArcCHECK measurements showed a mean pass rate of 95.6 ({sigma}= 1.8)%.Conclusions: The developed algorithm was shown to accurately predict the dose matrix, in a plane perpendicular to the beam, by considering all possible leaf trajectories in a VMAT delivery. This enables the verification of VMAT delivery using a 2D array detector mounted on a treatment head.

Arumugam, Sankar; Xing Aitang [Liverpool and Macarthur Cancer Therapy Centres and Ingham Institute, New South Wales 2170 (Australia); Jameson, Michael [Liverpool and Macarthur Cancer Therapy Centres and Ingham Institute, New South Wales 2170 (Australia); Centre for Medical Radiation Physics, University of Wollongong, Wollongong, New South Wales 2522 (Australia); Holloway, Lois [Liverpool and Macarthur Cancer Therapy Centres and Ingham Institute, New South Wales 2170 (Australia); Centre for Medical Radiation Physics, University of Wollongong, Wollongong, New South Wales 2522 (Australia); South West Clinical School, University of New South Wales, Sydney, New South Wales 2052 (Australia); Institute of Medical Physics, School of Physics, University of Sydney, Sydney, New South Wales 2006 (Australia)

2013-07-15T23:59:59.000Z

392

Electrical studies and plasma characterization of an atmospheric pressure plasma jet operated at low frequency  

Science Journals Connector (OSTI)

Low-temperature high-pressure plasma jets have an extensive use in medical and biological applications. Much work has been devoted to study these applications while comparatively fewer studies appear to be directed to the discharge itself. In this work in order to better understand the kind of electrical discharge and the plasma states existing in those devices a study of the electrical characteristics of a typical plasma jet operated at atmospheric pressure using either air or argon is reported. It is found that the experimentally determined electrical characteristics are consistent with the model of a thermal arc discharge with a highly collisional cathode sheet. The only exception is the case of argon at the smallest electrode separation studied around 1?mm in which case the discharge is better modeled as either a non-thermal arc or a high-pressure glow. Also variations of the electrical behavior at different gas flow rates are interpreted consistently with the arc model in terms of the development of fluid turbulence in the external jet.

2013-01-01T23:59:59.000Z

393

190 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 30, NO. 1, FEBRUARY 2002 Gap Closure in a Cold Metal Halide Lamp  

E-Print Network [OSTI]

lamp has been investigated using a two-dimensional, plasma transport model. Im- ages are presented- charge devices, lighting, plasma applications. METAL halide high-intensity-discharge (HID) lamps op- erate as high-pressure thermal arcs [1]. The cold fills of HID lamps are typically 50­100 torr of a rare

Kushner, Mark

394

44 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 27, NO. 1, FEBRUARY 1999 Ultraviolet Imaging of the Anode Attachment  

E-Print Network [OSTI]

of the Anode Attachment in Transferred-Arc Plasma Cutting Byron L. Bemis and Gary S. Settles Abstract-- The anode phenomena occurring at the location of current transfer from the plasma jet to the plate affects imaging technique was used to visualize the anode attachment spot under various cut- ting conditions

Settles, Gary S.

395

Suppression of Ge-O And Ge-N Bonding at Ge-HfO(2) And Ge-TiO(2) Interfaces By Deposition Onto Plasma-Nitrided Passivated Ge Substrates: Integration Issues Ge Gate Stacks Into Advanced Devices  

SciTech Connect (OSTI)

A study of changes in nano-scale morphology of thin films of nano-crystalline transition metal (TM) elemental oxides, HfO{sub 2} and TiO{sub 2}, on plasma-nitrided Ge(100) substrates, and Si(100) substrates with ultra-thin (-0.8 nm) plasma-nitrided Si suboxide, SiO{sub x}, x < 2, or SiON interfacial layers is presented. Near edge X-ray absorption spectroscopy (NEXAS) has been used to determine nano-scale morphology of these films by Jahn-Teller distortion removal of band edge d-state degeneracies. These results identify a new and novel application for NEXAS based on the resonant character of the respective O K{sub 1} and N K{sub 1} edge absorptions. This paper also includes a brief discussion of the integration issues for the introduction of this Ge breakthrough into advanced semiconductor circuits and systems. This includes a comparison of nano-crystalline and non-crystalline dielectrics, as well as issues relative to metal gates.

Lee, S.; Long, J.P.; Lucovsky, G.; Whitten, J.; Seo, H.; Luning, J.

2009-05-19T23:59:59.000Z

396

Arc Energy Estimations: Applications in Lightning-Induced Concrete Spall  

SciTech Connect (OSTI)

After lightning contacts a building, the possibility of a physical break in its conductive path to ground may exist. Given such a break, an electric field may develop across the gap until it exceeds the breakdown strength of the non-conducting, or dielectric, material. Breakdown subsequently occurs and energy is dissipated during the development of an arc channel. If the dielectric is concrete, a concern exists that the energy available for arc formation may be capable of launching pieces of spall into sensitive equipment. This paper discusses the mechanisms of energy dissipation in arc formation and quantifies the energy available for concrete spall.

Tully, L K; Ong, M M

2008-06-03T23:59:59.000Z

397

Numerical simulation of carbon arc discharge for nanoparticle synthesis  

SciTech Connect (OSTI)

Arc discharge with catalyst-filled carbon anode in helium background was used for the synthesis of carbon nanoparticles. In this paper, we present the results of numerical simulation of carbon arc discharges with arc current varying from 10 A to 100 A in a background gas pressure of 68 kPa. Anode sublimation rate and current voltage characteristics are compared with experiments. Distribution of temperature and species density, which is important for the estimation of the growth of nanoparticles, is obtained. The probable location of nanoparticle growth region is identified based on the temperature range for the formation of catalyst clusters.

Kundrapu, M.; Keidar, M. [Department of Mechanical and Aerospace Engineering, George Washington University, Washington, DC 20052 (United States)

2012-07-15T23:59:59.000Z

398

direct_deposit_111609  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

PROTECT YOUR BANKING INFORMATION: PROTECT YOUR BANKING INFORMATION: DO NOT complete this form until you are ready to submit it to the Payroll Department. DIRECT DEPOSIT REQUEST Directions: 1. Provide required information neatly, legibly; 2. If Checking Account Direct Deposit, include a voided check. a. DO NOT submit a deposit slip! 3. If Savings Account Direct Deposit, include a copy of savings card. 4. Sign this form; 5. Inter-office mail it to Craft Payroll at "P238." DIRECT DEPOSITION AUTHORIZATION I hereby authorize Los Alamos National Laboratory, hereinafter called The Laboratory, to initiate credit entries and, if necessary, debit entries and adjustments for any credit entries in error to my account listed on this form. If deposit is for:

399

FusionArc optimization: A hybrid volumetric modulated arc therapy (VMAT) and intensity modulated radiation therapy (IMRT) planning strategy  

SciTech Connect (OSTI)

Purpose: To introduce a hybrid volumetric modulated arc therapy/intensity modulated radiation therapy (VMAT/IMRT) optimization strategy called FusionArc that combines the delivery efficiency of single-arc VMAT with the potentially desirable intensity modulation possible with IMRT.Methods: A beamlet-based inverse planning system was enhanced to combine the advantages of VMAT and IMRT into one comprehensive technique. In the hybrid strategy, baseline single-arc VMAT plans are optimized and then the current cost function gradients with respect to the beamlets are used to define a metric for predicting which beam angles would benefit from further intensity modulation. Beams with the highest metric values (called the gradient factor) are converted from VMAT apertures to IMRT fluence, and the optimization proceeds with the mixed variable set until convergence or until additional beams are selected for conversion. One phantom and two clinical cases were used to validate the gradient factor and characterize the FusionArc strategy. Comparisons were made between standard IMRT, single-arc VMAT, and FusionArc plans with one to five IMRT/hybrid beams.Results: The gradient factor was found to be highly predictive of the VMAT angles that would benefit plan quality the most from beam modulation. Over the three cases studied, a FusionArc plan with three converted beams achieved superior dosimetric quality with reductions in final cost ranging from 26.4% to 48.1% compared to single-arc VMAT. Additionally, the three beam FusionArc plans required 22.4%-43.7% fewer MU/Gy than a seven beam IMRT plan. While the FusionArc plans with five converted beams offer larger reductions in final cost-32.9%-55.2% compared to single-arc VMAT-the decrease in MU/Gy compared to IMRT was noticeably smaller at 12.2%-18.5%, when compared to IMRT.Conclusions: A hybrid VMAT/IMRT strategy was implemented to find a high quality compromise between gantry-angle and intensity-based degrees of freedom. This optimization method will allow patients to be simultaneously planned for dosimetric quality and delivery efficiency without switching between delivery techniques. Example phantom and clinical cases suggest that the conversion of only three VMAT segments to modulated beams may result in a good combination of quality and efficiency.

Matuszak, Martha M.; McShan, Daniel L.; Ten Haken, Randall K. [Department of Radiation Oncology, University of Michigan, Ann Arbor, Michigan 48109 (United States); Steers, Jennifer M. [Department of Radiation Oncology, University of Michigan, Ann Arbor, Michigan 48109 and Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109 (United States); Long, Troy; Edwin Romeijn, H. [Department of Industrial and Operations Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States); Fraass, Benedick A. [Department of Radiation Oncology, Cedars-Sinai Medical Center, Los Angeles, California 90048 (United States)

2013-07-15T23:59:59.000Z

400

Plasma Physics  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

of light years can emerge from the frenetic motion of plasmas. A team of Lawrence Livermore researchers has discovered that supersonic counter-streaming (directed at each...

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


401

Spores from Devonian Deposits  

Science Journals Connector (OSTI)

... IN a well-illustrated paper on "Spores from Devonian Deposits, Mimerdalen, Spitsbergen" (Norsk. Polarinstitutt Skrifter, No. 132, 1964), Jorunn Os Vigran deals with the dispersed ...

1965-06-05T23:59:59.000Z

402

EMSL - ion deposition  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

deposition en Physical Properties of Ambient and Laboratory-Generated Secondary Organic Aerosol. http:www.emsl.pnl.govemslwebpublicationsphysical-properties-ambient-and-labora...

403

EMSL - Deposition and Microfabrication  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

ion beam for nanolithography and deposition and manipulation of structures at the nano scale* Microfabrication suite for designing and etching complex patterns into varied...

404

DOE Solar Decathlon: News Blog » SCI-Arc/Caltech  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

SCI-Arc/Caltech SCI-Arc/Caltech Below you will find Solar Decathlon news from the SCI-Arc/Caltech archive, sorted by date. CHIP House Takes Design to Different Heights (Literally) Friday, May 13, 2011 By April Saylor Editor's Note: This entry has been cross-posted from DOE's Energy Blog. In honor of the U.S. Department of Energy Solar Decathlon-which challenges 20 collegiate teams to design, build, and operate solar-powered houses that are cost-effective, energy-efficient, and attractive-we are profiling each of the 20 teams participating in the competition. The students from the Southern California Institute of Architecture and California Institute of Technology, otherwise known as the SCI-Arc/Caltech team, have teamed up to take an interesting approach to the design of their

405

Capabilities of the ARCS Instrument - ORNL Neutron Sciences  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Capabilities of the ARCS Instrument Capabilities of the ARCS Instrument ARCS Overview The wide angular-range chopper spectrometer ARCS at the Spallation Neutron Source (SNS) is optimized to provide a high neutron flux at the sample position with a large solid angle of detector coverage. The instrument incorporates modern neutron instrumentation, such as an elliptically focused neutron guide, high speed magnetic bearing choppers, and a massive array of 3He linear position sensitive detectors. Novel features of the spectrometer include the use of a large gate valve between the sample and detector vacuum chambers and the placement of the detectors within the vacuum, both of which provide a window-free final flight path to minimize background scattering while allowing rapid changing of the sample and

406

Micro-arc oxidation coatings on Mg-Li alloys  

Science Journals Connector (OSTI)

Micro-arc oxidation (MAO) method was used for the...in-situ fabricated on the Mg-Li alloy. The morphology feature, phase composition, and corrosion-resistance of the formed ceramic coatings were studied by SEM, X...

Yongjun Xu; Kang Li; Zhongping Yao; Zhaohua Jiang; Milin Zhang

2009-04-01T23:59:59.000Z

407

Type B Accident Investigation of the Arc Flash at Brookhaven...  

Broader source: Energy.gov (indexed) [DOE]

B Accident Investigation of the Arc Flash at Brookhaven National Laboratory, April 14, 2006 More Documents & Publications DOE-HDBK-1092-1998 DOE-HDBK-1092-2004 DOE-HDBK-1092-2013...

408

Problems of physical modeling of electric-arc discharges  

Science Journals Connector (OSTI)

Special features of physical modeling of high-current arc discharges are considered. It is shown that the employment of dimensionless criterial expressions makes it possible to establish only approximate simil...

O. I. Yas'ko

409

Electric Parameters of the D.C. Carbon Arc  

Science Journals Connector (OSTI)

The basic electric parameters of an arc discharge are the current strength (i) and the voltage drop across the gap (V). Both quantities can be measured without difficulty. In general, a relationship between V and...

P. W. J. M. Boumans

1966-01-01T23:59:59.000Z

410

Velocity of the electric arc in a plasmatron discharge chamber  

Science Journals Connector (OSTI)

An experimental investigation of the velocity of a high-current arc with air injection in the discharge chamber of a coaxial sectioned plasmatron is described. The experiments showed that the velocity of the c...

A. S. Shaboltas

1969-09-01T23:59:59.000Z

411

JOURNAL DE PPHYSIQUE THEORY OF =LOW CATHODEINATMOSPHERIC ARC INNOBLE GAS  

E-Print Network [OSTI]

. S. S. R. 1. The hollow arc discharge i n cylindrical hollow cathode (IiC) with s l i g h t l yJOURNAL DE PPHYSIQUE THEORY OF =LOW CATHODEINATMOSPHERIC ARC INNOBLE GAS F.G. Baksht, A.B. Rybakov. 4-22742~-j,2x$-.@+.j# .Ya4z(5) 4. he pre-electr*e ionization ~ w e r(L df 9 e L 4 - ~ = d ; ) must

Boyer, Edmond

412

Scale-up analysis and development of gliding arc discharge facility for volatile organic compounds decomposition  

Science Journals Connector (OSTI)

The influences of inlet gas flow rate and reactor configuration on volatile organic compounds (VOCs) decomposition efficiency in a traditional gliding arc (T-GA) facility are studied based on laboratory experiments and numerical simulation. The ratio of the nozzle diameter and the shortest distance of two electrodes should be maintained in a suitable value range to guarantee the decomposition efficiency, which indicates simply enlarging the nozzle inner diameter is not a proper way to raise the T-GA treatment capacity in a fixed supply voltage condition. A developed gliding arc gas discharge (D-GA) reactor based on a modified gas feed system is proposed: small flow rate air goes through the bottom nozzle to process the GA evolution, and high flow rate contaminated gas goes frontal through the plasma region and decomposes. The performances of D-GA reactor in the decomposition of \\{VOCs\\} with relative high gas flow rate, including decomposition efficiency and specific energy consumption, are better than T-GA reactor. D-GA reactor also avoids the drawbacks of the increases of power system amount and electric power consumption in multi-electrode GA system.

Zheng Bo; Jianhua Yan; Xiaodong Li; Yong Chi; Kefa Cen

2008-01-01T23:59:59.000Z

413

Lightning Induced Arcing an LDRD Report  

SciTech Connect (OSTI)

The purpose of this research was to develop a science-based understanding of the early-time behavior of electric surface arcing in air at atmospheric pressure. As a first step towards accomplishing this, we used a kinetic approach to model an electron swarm as it evolved in a neutral gas under the influence of an applied electric field. A computer code was written in which pseudo-particles, each representing some number of electrons, were accelerated by an electric field. The electric field due to the charged particles was calculated efficiently using a tree algorithm. Collision of the electrons with the background gas led to the creation of new particles through the processes of ionization and photoionization. These processes were accounted for using measured cross-section data and Monte Carlo methods. A dielectric half-space was modeled by imaging the charges in its surface. Secondary electron emission from the surface, resulting in surface charging, was also calculated. Simulation results show the characteristics of a streamer in three dimensions. A numerical instability was encountered before the streamer matured to form branching.

JORGENSON,ROY E.; WARNE,LARRY K.; KUNHARDT,ERICH E.

2000-12-01T23:59:59.000Z

414

High-speed EDM milling with moving electric arcs  

Science Journals Connector (OSTI)

A novel high-speed electrical discharge machining (EDM) milling method using moving electric arcs has been proposed in this study. We connected a copper electrode rotating rapidly around its axis and a work piece to a DC power supply to generate a moving electric arc. To ensure high relative speed of any point on the electrode with respect to the work piece, the electrode was shaped like a pipe. It was observed that the electric arcs move rapidly within the discharge gap due to the revolution of the tool electrode, removing the materials on the electrode along the track of the arc roots. To explore the characteristics of machining with moving electric arcs, an EDM milling apparatus was devised. Two planes with approximately the same roughness were machined separately by this equipment and a traditional EDM machine for comparison. It was found that a much higher material removal rate can be easily achieved by EDM milling with moving electric arcs. In the meanwhile, wear of the tool electrode in this new method is negligible, which is greatly favorable for machining accuracy. The microstructures of these surfaces were also investigated for further information.

Fuzhu Han; Yongxain Wang; Ming Zhou

2009-01-01T23:59:59.000Z

415

Design And Diagnosis Of A New Type Radio Frequency Driven In Vacuum Arc Ion Source  

SciTech Connect (OSTI)

The discharge mechanism of this source is based on the use of both RF- driven (15 MHz -300W) and vacuum arc to create discharge plasma of higher intensity. An internal antenna is used to couple the RF power to the plasma. Lower ignition voltage (50 up to 200V) and higher plasma intensity feature the characteristics of this source. The source is considered self extracted ion current and could deliver ion currents of {approx}10mA for thin beam ({phi} = 2mm.) and {approx}20 mA for broad beam ({phi} {approx} 6cm.) at {approx} 200V extraction voltage. The beam diagnostics (for thin beam) of this source are measured which include: the beam profiles, beam emittance, energy spread and distribution of the ion species in the ion beam. The increase of the anode voltage decreases the beam emittance, while the energy spread increases with the decrease of the discharge pressure. The beam emittance is found to be around 200 up to 400 mm.m.rad. and the energy spread of the ions in the ion beam is around 40 up to 80 eV. The Ar ion specie extracted from the source could reach Ar+5. The beam profiles show that the beam is more convergent with the increase of the accelerating voltage and with the use of proper capacitors between the extraction electrodes.

Zakhary, S.G. [Accelerators Dept., Nuclear Research Center, Atomic Energy Authority, P.O.Box 13759 Cairo (Egypt)

2005-03-17T23:59:59.000Z

416

Stability of very-high pressure arc discharges against perturbations of the electron temperature  

SciTech Connect (OSTI)

We study the stability of the energy balance of the electron gas in very high-pressure plasmas against longitudinal perturbations, using a local dispersion analysis. After deriving a dispersion equation, we apply the model to a very high-pressure (100 bar) xenon plasma and find instability for electron temperatures, T{sub e}, in a window between 2400 K and 5500-7000 K x 10{sup 3} K, depending on the current density (10{sup 6}-10{sup 8} A/m{sup 2}). The instability can be traced back to the Joule heating of the electron gas being a growing function of T{sub e}, which is due to a rising dependence of the electron-atom collision frequency on T{sub e}. We then analyze the T{sub e} range occurring in very high-pressure xenon lamps and conclude that only the near-anode region exhibits T{sub e} sufficiently low for this instability to occur. Indeed, previous experiments have revealed that such lamps develop, under certain conditions, voltage oscillations accompanied by electromagnetic interference, and this instability has been pinned down to the plasma-anode interaction. A relation between the mechanisms of the considered instability and multiple anodic attachments of high-pressure arcs is discussed.

Benilov, M. S. [Departamento de Fisica, Ciencias Exactas e Engenharia, Universidade da Madeira, Largo do Municipio, Funchal 9000 (Portugal); Hechtfischer, U. [Philips Lighting, BU Automotive Lamps, Technology, Philipsstrasse 8, Aachen 52068 (Germany)

2012-04-01T23:59:59.000Z

417

Plasma jets and plasma bullets  

Science Journals Connector (OSTI)

Plasma plumes, or plasma jets, belong to a large family of gas discharges whereby the discharge plasma is extended beyond the plasma generation region into the surrounding ambience, either by a field (e.g. electromagnetic, convective gas flow, or shock wave) or a gradient of a directionless physical quantity (e.g. particle density, pressure, or temperature). This physical extension of a plasma plume gives rise to a strong interaction with its surrounding environment, and the interaction alters the properties of both the plasma and the environment, often in a nonlinear and dynamic fashion. The plasma is therefore not confined by defined physical walls, thus extending opportunities for material treatment applications as well as bringing in new challenges in science and technology associated with complex open-boundary problems. Some of the most common examples may be found in dense plasmas with very high dissipation of externally supplied energy (e.g. in electrical, optical or thermal forms) and often in or close to thermal equilibrium. For these dense plasmas, their characteristics are determined predominantly by strong physical forces of different fields, such as electrical, magnetic, thermal, shock wave, and their nonlinear interactions [1]. Common to these dense plasma plumes are significant macroscopic plasma movement and considerable decomposition of solid materials (e.g. vaporization). Their applications are numerous and include detection of elemental traces, synthesis of high-temperature materials and welding, laser--plasma interactions, and relativistic jets in particle accelerators and in space [2]–[4]. Scientific challenges in the understanding of plasma jets are exciting and multidisciplinary, involving interweaving transitions of all four states of matter, and their technological applications are wide-ranging and growing rapidly. Using the Web of Science database, a search for journal papers on non-fusion plasma jets reveals that a long initial phase up to 1990 with only 31 papers per year on average, and a total of some 1300 papers, precedes a considerable growth of some 35–50% in research activity every five years, over the last 20 years or so. As shown in the table, the annual dissemination of the field is more than 1600 papers and the total number of papers is in excess of 20000. This upwards trajectory is typical of a strong and growing subject area in physical science, with considerable capacity in both fundamental science and applications. PeriodNumber of papersPapers per annum 1948–1990130031 1991–19952279456 1996–20003447689 2001–20054571914 2006–201066401328 2011 1658 In many of the dense plasma jets discussed above, strong physical forces generated by the plasma are often desired and this favours plasma generation at elevated gas pressure, including atmospheric pressure, which favours a high level of gas ionization. Historically it has been challenging to reduce and control the strong physical forces in high-pressure plasmas for applications where these are unwanted, for example, surface modification of polymeric sheets [5]. Indeed, there is a real need for a vast range of material processing applications at temperatures below 100oC (or below 400 K) and this favours atmospheric-pressure plasma jets sustained far from thermal equilibrium with the dissipated electrical energy largely used not in heat generation but in unleashing non-equilibrium chemical reactions. The long-standing difficulty of effectively controlling the level of gas ionization at atmospheric pressure was overcome by the technological breakthrough of achieving atmospheric-pressure glow discharges in the late 1980s [6]. A related challenge stemming from high collisionality of atmospheric-pressure plasmas (v >> ?0) means that large-area plasmas sustained between parallel-plate electrodes are very susceptible to strong plasma instabilities when molecular gases are introduced for processing applications. This led to an effective technological solution in the early to late 1990s of confining atmospheric plasmas in a small v

M G Kong; B N Ganguly; R F Hicks

2012-01-01T23:59:59.000Z

418

Plasma Radiation  

Science Journals Connector (OSTI)

... JUST over ten years ago the first book on plasma physics as a subject in its own right appeared; in a gradually swelling stream ... been surprisingly few monographs. One topic which has had scant coverage in any form is plasma radiation (except for spectral-line radiation which has been dealt with very fully in ...

T. J. M. BOYD

1967-07-01T23:59:59.000Z

419

Measurment of Depositing and Bombarding Species Involved in the Plasma Production of Amorphous Silicon and Silicon/Germanium Solar Cells: Annual Technical Report, 1 June 2002 - 31 May 2005  

SciTech Connect (OSTI)

The objective of this study is to measure the molecular species that lead to the growth of hydrogenated amorphous silicon (a-Si:H) and microcrystalline silicon (..mu..c-Si) photovoltaic (PV) devices from RF discharges. Neutral radicals produce most of the film growth during this PV-device production, and, by implication, radicals primarily determine the device structure and electrical characteristics. The most important feature of the present experiment is thus the measurement of neutral-radical fluxes to the substrate. Additional depositing species that can influence film properties are positive ions and silicon-based particles produced by the discharge; we also measure these positive-ion species here. Some studies have already measured some of these radical and positive-ion species in silane and silane/argon discharges, but not for discharge conditions similar to those used to produce most photovoltaic devices. Our objective is to measure all of these species for conditions typically used for device production. In particular, we have studied 13.6 MHz-excited discharges in pure silane and silane/hydrogen vapors.

Gallagher, A.; Rozsa, K.; Horvath, P.; Kujundcik, D.

2006-06-01T23:59:59.000Z

420

Model of the boundary layer of a vacuum-arc magnetic filter  

SciTech Connect (OSTI)

A model is developed to describe the electrostatic boundary layer in a positively biased magnetic filter in filtered arcs with low collisionality. The set of equations used includes the electron momentum equation, with an anomalous collision term due to micro-instabilities leading to Bohm diffusion, electron mass conservation, and Poisson equation. Analytical solutions are obtained, valid for the regimes of interest, leading to an explicit expression to determine the electron density current to the filter wall as a function of the potential of the filter and the ratio of electron density at the plasma to that at the filter wall. Using a set of planar and cylindrical probes it is verified experimentally that the mentioned ratio of electron densities remains reasonably constant for different magnetic field values and probe bias, which allows to obtain a closed expression for the current. Comparisons are made with the experimentally determined current collected at different sections of a positively biased straight filter.

Minotti, F.; Giuliani, L.; Grondona, D.; Della Torre, H.; Kelly, H. [Departamento de Fisica, FCEyN, Universidad de Buenos Aires, Instituto de Fisica del Plasma, CONICET-UBA, Cdad. Universitaria, Pab.I, 1428 Buenos Aires (Argentina)

2013-03-21T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


421

Solution deposition assembly  

DOE Patents [OSTI]

Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber, at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.

Roussillon, Yann; Scholz, Jeremy H; Shelton, Addison; Green, Geoff T; Utthachoo, Piyaphant

2014-01-21T23:59:59.000Z

422

A uniform glow discharge plasma source at atmospheric pressure  

Science Journals Connector (OSTI)

An atmospheric-pressure uniform continuous glowplasma was produced in ambient air assisted by argon feeding gas using a 13.56 MHz rf source. Based on the measured current–voltage curve and optical emission spectrum intensity the plasma showed typical glow discharge characteristics free from streamers and arc. The measured rotational and vibrational temperatures were in the range of 490 to 630 K and 2000 to 3300 K respectively within the operation range of argon flow rate and rf power. From the spatial measurement of total optical emission intensity and rotational and vibrational temperatures the plasma shows very high uniformity (over 93%) in the lengthwise direction. The plasma size for this study was 200 mm×50 mm×5 mm although a plasma was produced in the scaled-up version of 600 mm in length aiming for large-area plasma applications.

Se Youn Moon; W. Choe; B. K. Kang

2004-01-01T23:59:59.000Z

423

Perspectives on Deposition Velocity  

Broader source: Energy.gov (indexed) [DOE]

Deposition Deposition Velocity ... Going down the rabbit hole to explain that sinking feeling Brian DiNunno, Ph.D. Project Enhancement Corporation June 6 th , 2012 Discussion Framework ï‚— Development of the HSS Deposition Velocity Safety Bulletin ï‚— Broader discussion of appropriate conservatism within dispersion modeling and DOE-STD-3009 DOE-STD-3009 Dose Comparison "General discussion is provided for source term calculation and dose estimation, as well as prescriptive guidance for the latter. The intent is that calculations be based on reasonably conservative estimates of the various input parameters." - DOE-STD-3009, Appendix A.3 DOE-STD-3009 Dispersion

424

THE PHYSICS AND CHEMISTRY OF SPUTTERING BY ENERGETIC PLASMA IONS  

E-Print Network [OSTI]

of a number of solar system bodies. These energetic incident ions deposit energy in the gas or solid. This can the ejection of atoms and molecules from a natural surface or atmosphere by an energetic incident plasma ion is a process by which an energetic ion deposits its energy in a material initiating a cascade of events which

Johnson, Robert E.

425

3D MHD modelling of the glidarc behaviour of a low current high voltage DC plasma torch Journal of Physics D: Applied Physics  

E-Print Network [OSTI]

in terms of: global behaviour, arc length, mean voltage and glidarc frequency. 1. Introduction The non-thermal on magnetohydrodynamic (MHD) modelling of atmospheric pressure direct current (DC) plasma torch operating at low current3D MHD modelling of the glidarc behaviour of a low current ­ high voltage DC plasma torch Journal

Paris-Sud XI, Université de

426

Prepared for the U.S. Department of Energy under Contract DE-AC02-76CH03073. Princeton Plasma Physics Laboratory  

E-Print Network [OSTI]

in the discharge voltage range of 200-700 V. The arcing between the floating velvet electrodes and the plasma) Electronic mail: yraitses@pppl.gov 1 #12;The Hall thruster1 is a plasma discharge device with axial electric with the discharge voltage at a fixed magnetic field. The observations reported here also extend the regimes wherein

427

Plasma momentum meter for momentum flux measurements  

DOE Patents [OSTI]

Invention comprises an instrument in which momentum flux onto a biasable target plate is transferred via a suspended quartz tube onto a sensitive force transducer--a capacitance-type pressure gauge. The transducer is protected from thermal damage, arcing and sputtering, and materials used in the target and pendulum are electrically insulating, rigid even at elevated temperatures, and have low thermal conductivity. The instrument enables measurement of small forces (10.sup.-5 to 10.sup.3 N) accompanied by high heat fluxes which are transmitted by energetic particles with 10's of eV of kinetic energy in a intense magnetic field and pulsed plasma environment.

Zonca, Fulvio (Rome, IT); Cohen, Samuel A. (Hopewell, NJ); Bennett, Timothy (Princeton, NJ); Timberlake, John R. (Allentown, NJ)

1993-01-01T23:59:59.000Z

428

EMSL: Capabilities: Deposition and Microfabrication  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Deposition and Microfabrication Deposition and Microfabrication Additional Information Meet the Deposition and Microfabrication Experts Related EMSL User Projects Deposition and Microfabrication Tools are Applied to all Science Themes Deposition and Microfabrication brochure Designed to augment research important to a variety of disciplines, EMSL's Deposition and Microfabrication Capability tackles serious scientific challenges from a microscopic perspective. From deposition instruments that emphasize oxide films and interfaces to a state-of-the-art microfabrication suite, EMSL has equipment to tailor surfaces, as diverse as single-crystal thin films or nanostructures, or create the microenvironments needed for direct experimentation at micron scales. Users benefit from coupling deposition and microfabrication applications

429

Electrophoretic deposition of biomaterials  

Science Journals Connector (OSTI)

...Wilson 2003). The use of citric acid as a dispersant allowed the deposition of thin...poly(lactic-co-glycolic acid) (PLGA) nanoparticles embedded...stent for local drug delivery. Polyacrylic acid was used as surfactant because...

2010-01-01T23:59:59.000Z

430

Electron Beam Emission Characteristics from Plasma Focus Devices  

Science Journals Connector (OSTI)

In this paper we observed the characteristics of the electron beam emission from our plasma focus machine filling neon argon helium and hydrogen. Rogowski coil and CCD based magnetic spectrometer were used to obtain temporal and energy distribution of electron emission. And the preliminary results of deposited FeCo thin film using electron beam from our plasma focus device were presented.

T. Zhang; A. Patran; D. Wong; S. M. Hassan; S. V. Springham; T. L. Tan; P. Lee; S. Lee; R. S. Rawat

2006-01-01T23:59:59.000Z

431

Plasma post-hydrogenation of hydrogenated amorphous silicon and germanium  

SciTech Connect (OSTI)

Incorporation and kinetics of hydrogen during plasma post-hydrogenation and thermal treatment are discussed for a-Si:H and a-Ge:H films. For material of low hydrogen content, the hydrogen surface concentration reached by plasma treatment equals the hydrogen concentration obtained by deposition at the same temperature and under similar plasma conditions. Enhancements of the hydrogen diffusion coefficient and of hydrogen solubility observed for plasma treatment at temperatures {le}400 C and {le}300 C for a-Si:H and a-Ge:H, respectively, are attributed to a plasma induced rise of the surface hydrogen chemical potential.

Beyer, W.; Zastrow, U. [Forschungszentrum Juelich (Germany). Inst. fuer Schicht- und Ionentechnik

1996-12-31T23:59:59.000Z

432

A Volume Of Fluid method for a two-dimensional plasma expansion problem  

E-Print Network [OSTI]

electrical discharges on satellite solar panels and more precisely the transition from the primary discharge to the electric arc, see [6, 18, 24, 28]. Note that this study can be also applied to electron beam driven flash x, well known in plasma physics (see [5, 29]). The Debye length is the typical length at which electric

Vignal, Marie-Hélène

433

Fundamentals of Discharge Initiation in Gas-Fed Pulsed Plasma Thrusters  

E-Print Network [OSTI]

-conductivity arc discharges are required for critically-damped matching of circuit components, and that relativelyFundamentals of Discharge Initiation in Gas-Fed Pulsed Plasma Thrusters IEPC-2005-153 Presented at the 29th International Electric Propulsion Conference, Princeton University October 31 ­ November 4, 2005

Choueiri, Edgar

434

A laboratory plasma experiment for studying magnetic dynamics of accretion discs and jets  

Science Journals Connector (OSTI)

......law, implies that an electric field E will be induced...component creates an electric potential drop V between...accretion disc, an electric potential V gun is applied...eight images per plasma discharge. The camera view is...b), the discrete arcs have expanded and begun......

S. C. Hsu; P. M. Bellan

2002-08-01T23:59:59.000Z

435

Streamwise and spanwise plasma actuators for flow-induced cavity noise control  

E-Print Network [OSTI]

the flow field local to plasma actuators by electric discharges. The first one is the local heating of the airflow caused by arc filaments5 or direct cur- rent discharges:6,7 Heat energy is added between electrically charged particles and neutral air molecules by an externally applied electric field

Huang, Xun

436

Nonequilibrium Alfvenic Plasma Jets Associated with Spheromak Formation Deepak Kumar and Paul M. Bellan  

E-Print Network [OSTI]

Nonequilibrium Alfve´nic Plasma Jets Associated with Spheromak Formation Deepak Kumar and Paul M the helicity injection stage of the Caltech spheromak experiment. Density and time of flight measurements-current arcs [4], Z-pinch formation [5], spheromak formation [6,7], and sustainment [8]) to extraterrestrial

Bellan, Paul M.

437

Advanced RenewableEnergy Company ARC Energy | Open Energy Information  

Open Energy Info (EERE)

Advanced RenewableEnergy Company ARC Energy Advanced RenewableEnergy Company ARC Energy Jump to: navigation, search Name Advanced RenewableEnergy Company (ARC Energy) Place Nashua, New Hampshire Product New Hampshire-based stealth mode LED substrate manufacture equipment provider which aims to lower the cost of LEDs. Coordinates 42.758365°, -71.464209° Loading map... {"minzoom":false,"mappingservice":"googlemaps3","type":"ROADMAP","zoom":14,"types":["ROADMAP","SATELLITE","HYBRID","TERRAIN"],"geoservice":"google","maxzoom":false,"width":"600px","height":"350px","centre":false,"title":"","label":"","icon":"","visitedicon":"","lines":[],"polygons":[],"circles":[],"rectangles":[],"copycoords":false,"static":false,"wmsoverlay":"","layers":[],"controls":["pan","zoom","type","scale","streetview"],"zoomstyle":"DEFAULT","typestyle":"DEFAULT","autoinfowindows":false,"kml":[],"gkml":[],"fusiontables":[],"resizable":false,"tilt":0,"kmlrezoom":false,"poi":true,"imageoverlays":[],"markercluster":false,"searchmarkers":"","locations":[{"text":"","title":"","link":null,"lat":42.758365,"lon":-71.464209,"alt":0,"address":"","icon":"","group":"","inlineLabel":"","visitedicon":""}]}

438

ArcSafe® with Pulsed Arrested Spark Discharge  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

ArcSafe® ArcSafe® with Pulsed Arrested Spark Discharge  2007 R&D 100 Award Entry Form ArcSafe® with Pulsed Arrested Spark Discharge  Joint Submitters Submitting Organization Sandia National Laboratories PO Box 5800, MS 1181 Albuquerque, NM 87185-1181 USA Larry Schneider Phone: (505) 845-7135 Fax: (505) 845-7685 Email: lxschne@sandia.gov AFFIRMATION: I affirm that all information submitted as a part of, or supplemental to, this entry is a fair and accurate represen- tation of this product. (Signature)______________________________________ Astronics-Advanced Electronic Systems, Inc. 9845 Willows Rd NE City: Redmond State: WA Zip/Postal: 98052-2540 USA Contact Name: Michael Ballas, Program Manager Phone: (425) 895-4304 Fax: (425)702.4930 Email: michael.ballas@astronics.com

439

Voltage flicker prediction for two simultaneously operated ac arc furnaces  

SciTech Connect (OSTI)

An EMTP-based arc furnace model was developed for evaluation of flicker concerns associated with supplying a large integrated steel mill as they go from one to two furnace operation and as system changes are implemented that will affect the short circuit capacity at the 230 kV power supply substation. The model includes a dynamic arc representation which is designed to be characteristic of the initial portions of the melt cycle when the arc characteristics are the most variable (worst flicker conditions). The flicker calculations are verified using previous measurements with one furnace operation. Flicker simulations were then performed to evaluate a variety of different possible system strengths with both one and two furnaces in operation. The primary flicker measure used for this study is the unweighted rms value of the fluctuation envelope, expressed as a percentage of the rms line-to-ground voltage magnitude.

Tang, L. [ABB Power T and D Co., Inc., Raleigh, NC (United States)] [ABB Power T and D Co., Inc., Raleigh, NC (United States); Kolluri, S. [Entergy Services, New Orleans, LA (United States)] [Entergy Services, New Orleans, LA (United States); McGranaghan, M.F. [Electrotek Concepts, Inc., Knoxville, TN (United States)] [Electrotek Concepts, Inc., Knoxville, TN (United States)

1997-04-01T23:59:59.000Z

440

PNNL 331 Building Arc Flash Team Investigation Report  

SciTech Connect (OSTI)

On Friday, April 21, 2006, a PNNL electrician was performing repair of an electrical system for the 331 Building chilled water pump (CHWP) No.2, when an electrical arc flash occurred inside a 480V combination motor starter. The electrician was taken to the on-site medical provider for evaluation and was released for return to work without restriction. The electrician was not shocked, but did receive a minor, superficial (first degree) burn on the left wrist. This report, the result of a thorough review by the 331 Building Arc Flash Assessment Team, provides an in-depth look at the steps leading up to the arc-flash and recommendations and opportunities for improvement.

Deichman, Mark L.; Drewrey, John C.; Hodges, Hurtis; Madson, Vernon J.; Minton, Allen L.; Montgomery, Daniel M.; Olson, Marvin E.; Rojas, Pedro H.; Sanan, Sanjay K.; Sharp, Reed D.; Sparks, Bobby R.; Swearingen, Gary L.

2006-06-06T23:59:59.000Z

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
While these samples are representative of the content of NLEBeta,
they are not comprehensive nor are they the most current set.
We encourage you to perform a real-time search of NLEBeta
to obtain the most current and comprehensive results.


441

Multipass Arc Lattice Design for Recirculating Linac Muon Accelerators  

SciTech Connect (OSTI)

Recirculating linear accelerators (RLA) are the most likely means to achieve rapid acceleration of short-lived muons to multi-GeV energies required for Neutrino Factories and TeV energies required for Muon Colliders. A drawback of this scheme is that a separate return arc is required for each passage of the muons through the linac. In the work described here, a novel arc optics based on a Non-Scaling Fixed Field Alternating Gradient (NSFFAG) lattice is developed, which would provide sufficient momentum acceptance to allow multiple passes (two or more consecutive energies) to be transported in one string of magnets. An RLA with significantly fewer arcs will reduce the cost. We will develop the optics and technical requirements to allow the maximum number of passes by using an adjustable path length to accurately control the returned beam to synchronize with the linac RF phase.

G.M. Wang, R.P. Johnson, S.A. Bogacz, D. Trbojevic

2009-05-01T23:59:59.000Z

442

Multiphase stationary plasma generators working on oxidizing media  

Science Journals Connector (OSTI)

The subject of this paper is the design of two types of stationary multiphase ac plasma generators, developed for plasma chemical methods of waste destruction and processing (including syngas production). This paper presents plasma generators of average power (up to 50?kW) and high power (up to 500?kW) working on oxidizing media and describes the basic physical processes in the discharge chamber of a multiphase low-temperature (thermal) plasma generator. The presence of diffuse mode of arc burning at ne ~ 1014–1015?cm?3 and contracted mode ne ? 1016?cm?3 is detected. The external characteristics (dependence of working gas heat content, power in arcs and efficiency on flow rate) based on experimental data are presented. The influence of plasma forming gas variation on electric parameters is demonstrated. The powerful multiphase plasma generator works at atmospheric pressure on oxidizing media (air) in the power range 100–500?kW and the flow rates 10–70?g?s?1 with thermal efficiency of 70–90% and electrode lifetime of more than a hundred hours. The thermal efficiency of an average power (up to 50?kW) plasma generator in the range of air flow rate of 2–25?g?s?1 is 80–95%, while the electrode lifetime is hundreds of hours. The described multiphase plasma generators allow the working gas heat content to be controlled in a wide range at the outlet (for air—from 1.5?MJ?kg?1 up to 12.5?MJ?kg?1), which is important for the realization of plasma technologies, including syngas production.

Ph G Rutberg; A A Safronov; S D Popov; A V Surov; Gh V Nakonechny

2005-01-01T23:59:59.000Z

443

Polycrystal diamond growth in a microwave plasma torch  

SciTech Connect (OSTI)

Diamond films of different structures were deposited on quartz, WC-Co, and molybdenum substrates in a microwave plasma torch discharge in an argon-hydrogen-methane gas mixture in a sealed chamber at pressures close to atmospheric by using the chemical vapor deposition technique. Images of diamond polycrystal films and separate crystals, as well as results of Raman spectroscopy, are presented. The spectra of optical plasma radiation recorded during film deposition demonstrate the presence of intense H{sub {alpha}} hydrogen and C{sub 2} radical bands known as Swan bands.

Sergeichev, K. F.; Lukina, N. A.; Bolshakov, A. P.; Ralchenko, V. G.; Arutyunyan, N. R.; Vlasov, I. I. [Russian Academy of Sciences, Prokhorov Institute of General Physics (Russian Federation)

2010-12-15T23:59:59.000Z

444

SciTech Connect: "plasma science"  

Office of Scientific and Technical Information (OSTI)

plasma science" Find plasma science" Find How should I search Scitech Connect ... Basic or Advanced? Basic Search Advanced × Advanced Search Options Full Text: Bibliographic Data: Creator / Author: Name Name ORCID Title: Subject: Identifier Numbers: Research Org.: Sponsoring Org.: Site: All Alaska Power Administration, Juneau, Alaska (United States) Albany Research Center (ARC), Albany, OR (United States) Albuquerque Complex - NNSA Albuquerque Operations Office, Albuquerque, NM (United States) Amarillo National Resource Center for Plutonium, Amarillo, TX (United States) Ames Laboratory (AMES), Ames, IA (United States) Argonne National Laboratory (ANL), Argonne, IL (United States) Argonne National Laboratory-Advanced Photon Source (United States) Atlanta Regional Office, Atlanta, GA (United States) Atmospheric Radiation Measurement (ARM)

445

Plasma-assisted catalytic ionization using porous nickel plate  

SciTech Connect (OSTI)

Hydrogen atomic pair ions, i.e., H{sup +} and H{sup -} ions, are produced by plasma-assisted catalytic ionization using a porous nickel plate. Positive ions in a hydrogen plasma generated by dc arc discharge are irradiated to the porous plate, and pair ions are produced from the back of the irradiation plane. It becomes clear that the production quantity of pair ions mainly depends on the irradiation current of positive ions and the irradiation energy affects the production efficiency of H{sup -} ions.

Oohara, W.; Maeda, T.; Higuchi, T. [Department of Electronic Device Engineering, Yamaguchi University, Ube 755-8611 (Japan)

2011-09-15T23:59:59.000Z

446

The effects of atmospheric pressure plasma on the synthesis of carbon nanotubes  

Science Journals Connector (OSTI)

In this study, we investigated the effects of atmospheric plasma on the synthesis of carbon nanotubes (CNTs) forests. Tall and high CNTs forests have been successfully grown on a large scale using a newly developed system called atmospheric pressure ... Keywords: Atmospheric pressure, Carbon nanotubes, Mass production, Plasma effects, Plasma enhanced chemical vapor deposition

Seok Seung Shin; Bum Ho Choi; Young Mi Kim; Jong Ho Lee; Dong Chan Shin

2009-04-01T23:59:59.000Z

447

Rates of tectonic and magmatic processes in the North Cascades continental magmatic arc  

E-Print Network [OSTI]

Continental magmatic arcs are among the most dynamic. geologic systems, and documentation of the magmatic, thermal, and tectonic evolution of arcs is essential for understanding the processes of magma generation, ascent ...

Matzel, Jennifer E. Piontek, 1973-

2004-01-01T23:59:59.000Z

448

ARCS FOUNDATION GLOBAL IMPACT AWARD Global Health, Public Good and Graduate Education  

E-Print Network [OSTI]

1 ARCS FOUNDATION GLOBAL IMPACT AWARD Global Health, Public Good and Graduate Education Case the ARCS Foundation Awards Luncheon in Atlanta on November 21, 2013. Application Materials: 1) A letter

Arnold, Jonathan

449

Evolution of residual stresses in micro-arc oxidation ceramic coatings on 6061 Al alloy  

Science Journals Connector (OSTI)

Most researches on micro-arc oxidation mainly focus on the application rather than ... dimensional stability and corrosion resistance, etc. The micro-arc oxidation ceramic coatings are produced on the surfaces .....

Dejiu Shen; Jingrui Cai; Changhong Guo…

2013-11-01T23:59:59.000Z

450

Numerical modeling of the interaction between an electric arc and a gas flow  

Science Journals Connector (OSTI)

The interaction between an equilibrium arc discharge and a gas (air or argon) ... The dynamics and the special features of the electric arc formation are studied for both gases. In the air the electrically conduc...

E. N. Vasil’ev; D. A. Nesterov

2013-03-01T23:59:59.000Z

451

Optimization of NH3 Decomposition by Control of Discharge Mode in a Rotating Arc  

Science Journals Connector (OSTI)

In this study, the characteristic behavior of a rotating arc was investigated. Various modes, depending on the electric power supplied, can be observed in a rotating arc. Each mode produces different discharge ch...

Dae Hoon Lee; Kwan-Tae Kim; Hee Seok Kang…

2014-01-01T23:59:59.000Z

452

Sliding electric arc discharge as a means of aircraft trajectory control  

Science Journals Connector (OSTI)

The dynamics of sliding electric arc discharge and the formation of shock waves in the stages of leader motion and the electric arc development in a supersonic air flow behind ... (bar). The air flow in the discharge

V. S. Aksenov; V. V. Golub; S. A. Gubin; V. P. Efremov…

2004-10-01T23:59:59.000Z

453

Numerical computation of electric arc with annular attachment on the cathode butt end  

Science Journals Connector (OSTI)

The results of computing a stationary arc with annular attachment on the butt end of a solid cylindrical cathode are presented. The influence of the discharge external parameters on the characteristics of arc ...

A. Zh. Zhainakov; R. M. Urusov; T. E. Urusova

2006-12-01T23:59:59.000Z

454

Growth Conditions of Double-Walled Carbon Nanotubes in Arc Discharge  

Science Journals Connector (OSTI)

Growth Conditions of Double-Walled Carbon Nanotubes in Arc Discharge ... Preparation conditions for large-scale synthesis of double-walled carbon nanotubes (DWCNTs) by using electric arc discharge were examined. ...

Yahachi Saito; Takanori Nakahira; Sashiro Uemura

2003-01-04T23:59:59.000Z

455

E-Print Network 3.0 - arc box test Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

box test Search Powered by Explorit Topic List Advanced Search Sample search results for: arc box test Page: << < 1 2 3 4 5 > >> 1 Fat arcs for implicitly defined curves Szilvia...

456

A static voltage-current characteristic for the low current DC arc  

E-Print Network [OSTI]

systems has failed to detect arcing faults numerous times with disastrous consequences. The fault leaves a charred furrow, known as the ''arc track'', through Kapton cable insulation. Tests by NASA and others have confirmed that the average circuit...

Moores, Gregory Lee

2012-06-07T23:59:59.000Z

457

E-Print Network 3.0 - arc protection class Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

in a GIS: A Bidirectional Link between ArcView 2.0TM and XGobi Summary: . The XGobi remote proce- dures callable from within ArcView 2.0 can be grouped into two classes. One...

458

E-Print Network 3.0 - arc routing problem Sample Search Results  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Search Sample search results for: arc routing problem Page: << < 1 2 3 4 5 > >> 1 GIS by ESRITM What is ArcGIS Summary: allocation) Solving complex routing problems Querying...

459

E-Print Network 3.0 - arc weld-surfacing process Sample Search...  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

of Electrical and Computer Engineering, University of Kentucky Collection: Engineering 3 GIS by ESRITM What is ArcGIS Summary: PlotTM, ArcEditTM, and so on). Geo- processing Map...

460

Instrument Series: Deposition and Microfabrication  

Broader source: All U.S. Department of Energy (DOE) Office Webpages (Extended Search)

Deposition and Microfabrication Deposition and Microfabrication Sputter Deposition System Only available at EMSL, the Discovery ® Deposition System has been customized to be a fully automated multi-functional "hybrid" instrument with several modes for thin film processing, including multi-target sputtering, effusion cell deposition, electron beam deposition, and in-situ reflection high-energy electron diffraction (RHEED) materials characterization. Unlike most systems, the Discovery ® Deposition System's unique configuration offers operational flexibility, efficiency, and control, allowing a range of applications and materials to be processed simultaneously. Because it is software controlled, users can provide their own "recipes" and have a complete log of what happens throughout the

Note: This page contains sample records for the topic "arc plasma deposition" from the National Library of EnergyBeta (NLEBeta).
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461

Cyclic Strength of Titanium Alloys, Anodized under Micro-Arc Conditions, in Sea Water  

Science Journals Connector (OSTI)

The durability of titanium alloys having undergone micro-arc oxidation and then exposed to sea water is...

G. A. Lavrushin; S. V. Gnedenkov; P. S. Gordienko…

2002-07-01T23:59:59.000Z

462

Proposal of an Arc Detection Technique Based on RF Measurements for the ITER ICRF Antenna  

SciTech Connect (OSTI)

RF arc detection is a key operational and safety issue for the ICRF system on ITER. Indeed the high voltages inside the antenna put it at risk of arcing, which could cause substantial damage. This paper describes the various possibilities explored by circuit simulation and the strategy now considered to protect the ITER ICRF antenna from RF arcs.

Huygen, S.; Dumortier, P.; Durodie, F.; Messiaen, A.; Vervier, M.; Vrancken, M. [LPP/ERM-KMS, Association EURATOM-Belgian State, Brussels (Belgium); Wooldridge, E. [EURATOM/CCFE Fusion Association, Culham Science Centre (United Kingdom)

2011-12-23T23:59:59.000Z

463

Electric Arc Locator in Photovoltaic Power Systems Using Advanced Signal Processing Techniques  

E-Print Network [OSTI]

in detecting the partial discharges associated with the production of an electric arc in a high voltage power in fault detection and localization. In [1] we have shown that electric arc (or partial dischargeElectric Arc Locator in Photovoltaic Power Systems Using Advanced Signal Processing Techniques

Paris-Sud XI, Université de

464

EDFA Gain Flattening Using Long-Period Fibre Gratings Based on the Electric Arc Technique  

E-Print Network [OSTI]

of new stresses during the electric arc discharges as the main mechanism for their formation [5]. #12EDFA Gain Flattening Using Long-Period Fibre Gratings Based on the Electric Arc Technique O. Frazão of the long-period fibre grating is based on the electric arc technique. 1. Introduction. The gain flattening

Haddadi, Hamed

465

Sediment Budget Analysis System (SBAS) for ArcGIS 10 -User's Guide Page 1 of 49  

E-Print Network [OSTI]

Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 1 of 49 CESAM-OPJ-GIS Document current as of March 28, 2012 10:27 AM Sediment Budget Analysis System (SBAS) for ArcGIS 10 User's Guide D R AFT #12;Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 2 of 49 CESAM

US Army Corps of Engineers

466

Sediment Budget Analysis System (SBAS) for ArcGIS 10 -User's Guide Page 1 of 50  

E-Print Network [OSTI]

Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 1 of 50 CESAM-OPJ-GIS Document current as of June 27, 2012 10:09 AM Sediment Budget Analysis System (SBAS) for ArcGIS 10 User's Guide D R AFT #12;Sediment Budget Analysis System (SBAS) for ArcGIS 10 - User's Guide Page 2 of 50 CESAM

US Army Corps of Engineers

467

The fractal nature of vacuum arc cathode spots  

SciTech Connect (OSTI)

Cathode spot phenomena show many features of fractals, for example self-similar patterns in the emitted light and arc erosion traces. Although there have been hints on the fractal nature of cathode spots in the literature, the fractal approach to spot interpretation is underutilized. In this work, a brief review of spot properties is given, touching the differences between spot type 1 (on cathodes surfaces with dielectric layers) and spot type 2 (on metallic, clean surfaces) as well as the known spot fragment or cell structure. The basic properties of self-similarity, power laws, random colored noise, and fractals are introduced. Several points of evidence for the fractal nature of spots are provided. Specifically power laws are identified as signature of fractal properties, such as spectral power of noisy arc parameters (ion current, arc voltage, etc) obtained by fast Fourier transform. It is shown that fractal properties can be observed down to the cutoff by measurement resolution or occurrence of elementary steps in physical processes. Random walk models of cathode spot motion are well established: they go asymptotically to Brownian motion for infinitesimal step width. The power spectrum of the arc voltage noise falls as 1/f {sup 2}, where f is frequency, supporting a fractal spot model associated with Brownian motion.

Anders, Andre

2005-05-27T23:59:59.000Z

468

A Distributed Arc-Consistency Algorithm T. Nguyen, Y. Deville  

E-Print Network [OSTI]

cient way of tackling constraint satisfaction problems (CSP). In particular, various arc and hardware design. Informally, a CSP is com- posed of a nite set of variables, each of which is taking values the variables can simultaneously take. Resolving a CSP consists in nding one or all complete assignments

Deville, Yves

469

A Generic ArcConsistency Algorithm and its Specializations 1  

E-Print Network [OSTI]

con­ straint satisfaction problems (CSP). In particular, various arc­consistency algorithms have been constraints) and d is the size of the largest domain. Being applicable to the whole class of (binary) CSP as constraint satisfaction problems (CSP). A CSP is defined by a finite set of variables taking values from

Deville, Yves

470

A Generic Arc-Consistency Algorithm and its Specializations1  

E-Print Network [OSTI]

satisfaction problems (CSP). In particular, various arc-consistency algorithms have been proposed, originating is the size of the largest domain. Being applicable to the whole class of (binary) CSP, these algorithms do satisfaction problems (CSP). A CSP is de ned by a nite set of variables taking values from nite domains

Deville, Yves

471

Synthesis of a material for semiconductor applications: Boron oxynitride prepared by low frequency rf plasma-assisted metalorganic chemical  

E-Print Network [OSTI]

rf plasma-assisted metalorganic chemical vapor deposition G. C. Chen, D.-C. Lim, S.-B. Lee, and J-derived plasma-assisted metalorganic chemical vapor deposition MOCVD , and have studied the electrical compounds have become promising functional materials for integrated circuits, flash memories, and solar

Boo, Jin-Hyo

472

Glass Inclusions in Mariana Arc Phenocrysts: A New Perspective on Magmatic Evolution in a Typical Intra-oceanic Arc1  

E-Print Network [OSTI]

Glass Inclusions in Mariana Arc Phenocrysts: A New Perspective on Magmatic Evolution in a Typical at Dallas, Box 830688, Richardson, TX 75083-0688, USA A B S T R A C T Major element compositions of glass of these lavas reflects accumulation of plagioclase. Glass inclusions also show the common occurrence of felsic

Stern, Robert J.

473

Stability analysis of multi-phase AC arc discharge for in-flight glass melting  

Science Journals Connector (OSTI)

A stable multi-phase AC arc was generated to by transformers at a commercial electric system. The arc discharge behavior and the stability were investigated by the high-speed video camera observation synchronized with the voltage waveform analysis. The effect of the number of phase and the flaming gas addition into the arc region on the arc behavior and the arc stability were studied. Results showed that the re-ignition occurred between adjacent electrodes periodically. Two kinds of the stability analysis methods were introduced. The estimated fluctuation degree showed that an increase of the number of the phase leads to the stable multi-phase AC arc. The deviation of the arc voltage from the average arc voltage was estimated to evaluate the uniformity of the multi-phase AC arc. Although an addition of the oxygen flame into the arc region leads to lower uniformity, the modification of the electrode position can improve the uniformity of the multi-phase AC arc.

Manabu Tanaka; Yosuke Tsuruoka; Yaping Liu; Tsugio Matsuura; Takayuki Watanabe

2011-01-01T23:59:59.000Z

474

Synthesis of late Paleozoic and Mesozoic eolian deposits of the Western Interior of the United States  

Science Journals Connector (OSTI)

Late Paleozoic and Mesozoic eolian deposits include rock units that were deposited in ergs (eolian sand seas), erg margins and dune fields. They form an important part of Middle Pennsylvanian through Upper Jurassic sedimentary rocks across the Western Interior of the United States. These sedimentary rock units comprise approximately three dozen major eolian-bearing sequences and several smaller ones. Isopach and facies maps and accompanying cross sections indicate that most eolian units display varied geometry and complex facies relations to adjacent non-eolian rocks. Paleozoic erg deposits are widespread from Montana to Arizona and include Pennsylvanian formations (Weber, Tensleep, Casper and Quadrant Sandstones) chiefly in the Northern and Central Rocky Mountains with some deposits (Hermosa and Supai Groups) on the Colorado Plateau. Lower Permian (Wolfcampian) erg deposits (Weber, Tensleep, Casper, Minnelusa, Ingleside, Cedar Mesa, Elephant Canyon, Queantoweap and Esplanade Formations) are more widespread and thicken into the central Colorado Plateau. Middle Permian (Leonardian I) erg deposits (De Chelly and Schnebly Hill Formations) are distributed across the southern Colorado Plateau on the north edge of the Holbrook basin. Leonardian II erg deposits (Coconino and Glorieta Sandstones) are slightly more widespread on the southern Colorado Plateau. Leonardian III erg deposits formed adjacent to the Toroweap-Kaibab sea in Utah and Arizona (Coconino and White Rim Sandstones) and in north-central Colorado (Lyons Sandstone). Recognized Triassic eolian deposits include major erg deposits in the Jelm Formation of central Colorado-Wyoming and smaller eolian deposits in the Rock Point Member of the Wingate Sandstone and upper Dolores Formation, both of the Four Corners region. None of these have as yet received a modern or thorough study. Jurassic deposits of eolian origin extend from the Black Hills to the southern Cordilleran arc terrain. Lower Jurassic intervals include the Jurassic part of the Wingate Sandstone and the Navajo-Aztec-Nugget complex and coeval deposits in the arc terrain to the south and west of the Colorado Plateau. Major Middle Jurassic deposits include the Page Sandstone on the Colorado Plateau and the widespread Entrada Sandstone, Sundance Formation, and coeval deposits. Less extensive eolian deposits occur in the Carmel Formation, Temple Cap Sandstone, Romana Sandstone and Moab Tongue of the Entrada Sandstone, mostly on the central and western Colorado Plateau. Upper Jurassic eolian deposits include the Bluff Sandstone Member and Recapture Member of the Morrison Formation and Junction Creek Sandstone, all of the Four Corners region, and smaller eolian deposits in the Morrison Formation of central Wyoming and apparently coeval Unkpapa Sandstone of the Black Hills. Late Paleozoic and Mesozoic eolian deposits responded to changing climatic, tectonic and eustatic controls that are documented elsewhere in this volume. All of the eolian deposits are intricately interbedded with non-eolian deposits, including units of fluvial, lacustrine and shallow-marine origin, clearly dispelling the myth that eolian sandstones are simple sheet-like bodies. Rather, these units form some of the most complex bodies in the stratigraphic record.

Ronald C. Blakey; Fred Peterson; Gary Kocurek

1988-01-01T23:59:59.000Z

475

Supersonic metal plasma impact on a surface: An optical investigation of the pre-surface region  

SciTech Connect (OSTI)

Aluminum plasma, produced in high vacuum by a pulsed, filtered cathodic arc plasma source, was directed onto a wall where if formed a coating. The accompanying ?optical flare? known from the literature was visually observed, photographed, and spectroscopically investigated with appropriately high temporal (1 ?s) and spatial (100 ?m) resolution. Consistent with other observations using different techniques, it was found that the impact of the fully ionized plasma produces metal neutrals as well as desorbed gases, both of which interact with the incoming plasma. Most effectively are charge exchange collisions between doubly charged aluminum and neutral aluminum, which lead to a reduction of the flow of doubly charged b