
- Research News Computation of Light Scattering by
- DEFECT-INDUCED ELECTRICAL/OPTICAL PROPERTIES OF SrTiO3-X (001) BY PHOTO-ASSISTED TUNNELING SPECTROSCOPY
- Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm
- Long range interactions in nanoscale science Roger H. French*
- Journal of Electron Spectroscopy and Related Phenomena 142 (2004) 97103 KramersKronig transform for the surface energy loss function
- Bulk electronic structure of SrTiO3 : Experiment and theory K. van Benthema)
- Optical Properties of Aluminum Oxide: Determined from Vacuum Ultraviolet and Electron Energy-Loss Spectroscopies
- Electronic structure of aluminum nitride: Theory and experiment S. Loughin and R. H. French
- CSIRO PUBLISHING Full Paper www.publish.csiro.au/journals/ajc Aust. J. Chem. 2007, 60, 251263
- Materials Science and Engineering A 422 (2006) 136146 Optical properties, electronic structure and London dispersion interactions
- Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries
- Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and
- Origins and Applications of London Dispersion Forces and Hamaker Constants in Ceramics
- JOURNAL OF COLLOID AND INTERFACE SCIENCE 179, 460469 (1996) ARTICLE NO. 0238
- Near-field scattering from red pigment particles: Absorption and spectral dependence
- Light-Scattering Properties of Representative, Morphological Rutile Titania Particles Studied Using a Finite-Element Method
- Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at
- Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency
- header for SPIE use Fluoropolymers for 157nm Lithography: Optical Properties from VUV
- High-Index Immersion Fluids Enabling Cost-Effective Single-Exposure Lithography For 32 nm Half Pitches
- High Index Immersion Lithography With Second Generation Immersion Fluids To Enable Numerical
- Second generation fluids for 193nm immersion lithography Roger H. French, Weiming Qiu, Min K. Yang, Robert C. Wheland,
- Second Generation Fluids for 193 nm Immersion Lithography Sheng Peng, Roger H. French, Weiming Qiu, Robert C. Wheland, Min Yang,
- OPTICAL PROPERTIES OF MATERIALS FOR CONCENTRATOR PHOTOVOLTAIC SYSTEMS R. H. French
- Synthetic Metals, 49-50 (1992) 499-508 499 Vacuum ultraviolet spectroscopy of the optical properties
- Electron Microscopic Investigations of the Bonding Behaviour of
- 990 Journal of the American Ceramic Society-Song et al. vol. 72, No. 6 There is a possible contribution from rotation of the crystallites,
- Robert L. Coble: A Retrospective Carol A. Handwerker*
- Synthesis, Structural Analysis, and Self-Assembly of Phenylene Ethynylene Oligomers and Their OF,
- Behavior of candidate organic pellicle materials under 157 nm laser irradiation
- Single Layer Fluoropolymer Resists for 157 nm Lithography M. K. Crawford*
- Immersion fluids for lithography: refractive index measurement using
- Characterization of the Electronic Structure and Optical Properties of Al2O3, ZrO2 and SrTiO3 from Analysis of Reflection Electron Energy Loss
- Some image modeling issues for I-line, 5x phase shifting masks Greg Wojcik, John Mould, Jr., Rich Ferguson, Ron Martino, K. K. Low*
- Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography
- puma1 Electronic Structure of Ceramics J Am Ceram Soc 73 1111 3195-99 (1990) Band Structure Calculations of the High-Temperature Electronic
- Fluid refractive index measurements using rough surface and prism minimum deviation techniques
- Optical properties and London dispersion interaction of amorphous and crystalline SiO2 determined by vacuum ultraviolet spectroscopy and spectroscopic ellipsometry
- New Perspectives on van der Waals -London Interactions of Materials. From Planar Interfaces to
- Calculating van der Waals-London dispersion spectra and Hamaker coefficients of carbon nanotubes in water from ab initio optical properties
- Vibrational Spectroscopy of Aluminum Nitride Laurie E. McNeil
- Consequence of Nanometer-Scale Property Variations to Macroscopic Properties of CrOCN Thin Films
- DISPERSION FORCES AND HAMAKER CONSTANTS FOR INTERGRANULAR FILMS IN SILICON NITRIDE FROM
- Scattering of Electromagnetic Radiation by Complex Microstructures in the Resonant Regime
- Lithographically Cut Single-Walled Carbon Nanotubes: Controlling Length
- KwangjooLeea,-~ffenJ~~cha:Nicholas J.Turro*a,RogerH. Frenchb,RobertC.Whelandb,M. F. Lemonb,AndreM. Braunc,TatjanaWiderschpanc,PaulZimmerman*d
- THEORETICAL DESCRIPTION OF THE EMFLEX FINITE ELEMENT FORMULATION
- Immersion Fluid Refractive Indices Using Prism Minimum Deviation Roger H. French1*
- Relation between Local Composition, Chemical Environment and Phase Shift Behavior in Cr-Based Oxycarbonitride Thin Films
- Acta mater. 48 (2000) 45714576 www.elsevier.com/locate/actamat
- van der WaalsLondon dispersion interactions for optically anisotropic cylinders: Metallic and semiconducting single-wall carbon nanotubes
- Fluid-photoresist interactions and imaging in high-index immersion lithography
- Orientation dependence in near-field scattering from TiO2 particles
- Materials Science and Engineering A 422 (2006) 2940 Reflection electron energy loss spectroscopy of nanometric oxide
- Spectral mixing formulations for van der WaalsLondon dispersion interactions between multicomponent carbon nanotubes
- INSTITUTE OF PHYSICS PUBLISHING NANOTECHNOLOGY Nanotechnology 17 (2006) S121S127 doi:10.1088/0957-4484/17/7/S04
- New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor
- ELSEVIER Journal of Nuclear Materials 217(1994)32-47 Review article
- journal Electronic Structure of Ceramics J. Am. Ceium.Sm.,73 Ill]3257-63 (1990) Detection of Optically Excited States in Wide-Band-Gap
- :'.\., ,;,:. I . -.,-,...., ,;.,..,.+:.,,-, *.+.>'.J Scienceof Alumina
- journal JAmCeramSoc,77[5]114352(1994) Thin Glass Film between Ultrafine Conductor Particles in
- Index of refraction of high-index lithographic immersion fluids and its variability
- Immersion Lithography: Photomask and
- Transparent fluids for 157-nm immersion lithography
- Nonadditivity in van der Waals interactions within multilayers R. Podgornika
- Graded interface models for more accurate determination of van der WaalsLondon dispersion interactions across grain boundaries
- Dispersion interactions between optically anisotropic cylinders at all separations: Retardation effects for insulating and semiconducting single-wall carbon nanotubes
- Optical properties of Teflon AF amorphous