Economou, Demetre J. - Department of Chemical Engineering, University of Houston

• INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 14 (2005) 532542 doi:10.1088/0963-0252/14/3/016
• Effect of Potential Field on Ion Deflection and Shape Evolution of Trenches during Plasma-Assisted Etching
• Plasma sheath model and ion energy distribution for all radio frequencies Theodoros Panagopoulos and Demetre J. Economoua)
• Etching of nanopatterns in silicon using nanopantography Department of Chemical and Biomolecular Engineering, Plasma Processing Laboratory, University of
• Effectiveness of electron-cyclotron and transmission resonance heating in inductively coupled plasmas
• PHYSICAL REVIEW E 83, 046405 (2011) Dynamic model of streamer coupling for the homogeneity of glowlike dielectric barrier discharges
• Ionion plasmas and double layer formation in weakly collisional electronegative discharges
• Journal of The Electrochemical Society, 146 (12) 4659-4665 (1999) 4659 S0013-4651(99)04-011-2 CCC: $7.00 The Electrochemical Society, Inc.
• Time evolution of an ion-ion plasma after the application of a direct current bias voltage
• 2048 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 30, NO. 5, OCTOBER 2002 Plasma Molding Over Surface Topography
• Alternating fluxes of positive and negative ions from an ionion plasma Sivananda K. Kanakasabapathya)
• VOLUME 84, NUMBER 9 P H Y S I C A L R E V I E W L E T T E R S 28 FEBRUARY 2000 Negative Ion Density Fronts during Ignition and Extinction of Plasmas in Electronegative Gases
• Particle-in-cell simulation of ion energy distributions on an electrode by applying tailored bias waveforms in the afterglow of a pulsed plasma
• Electron kinetics and non-Joule heating in near-collisionless inductively coupled plasmas V. I. Kolobov
• Plasma Sources Sci. Technol. 9 (2000) 256269. Printed in the UK PII: S0963-0252(00)13664-3 Spatio-temporal evolution of a pulsed
• 328 J. Electrochem. Soc., Vol. 139, No. 1, January 1992 9 The Electrochemical Society, Inc. Sciences, Washington, D.C. (1977).
• Simulation of plasma molding over a ring on a flat surface Doosik Kim and Demetre J. Economoua)
• Three-dimensional simulation of an inductively coupled plasma reactor Theodoros Panagopoulos,a)
• INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 11 (2002) 324332 PII: S0963-0252(02)38017-4
• Modeling and simulation of plasma etching reactors for microelectronics Demetre J. Economou
• Spatiotemporal dynamics of charged species in the afterglow of plasmas containing negative ions I. D. Kaganovich,* B. N. Ramamurthi, and Demetre J. Economou
• Effect of surface roughness of the neutralization grid on the energy and flux of fast neutrals and residual ions extracted from a neutral
• Two-dimensional pulsed-plasma simulation of a chlorine discharge Badri Ramamurthi and Demetre J. Economoua)
• Wet Chemical Etching of GaAs Using a Novel Rotating-Cell Reactor
• 188 J. Electrochem. Soc., Vol. 136, No. 1, January 1989 9 The Electrochemical Society, Inc. arsenic loss before drift of precipitates was started. In one
• INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 12 (2003) 302312 PII: S0963-0252(03)62087-6
• Rapid two-dimensional self-consistent simulation of inductively coupled plasma and comparison with experimental data
• Realization of atomic layer etching of silicon Satish D. Athavalea)
• 1396 J. Electrochem. Soc., Vol. 139, No. 5, May 1992 9 The ElectrochemicalSociety, Inc. 17. D. Vanmaekelbergh and J. J. Kelly, This Journal, 136,
• Self-trapping of negative ions due to electron detachment in the afterglow of electronegative gas plasmas
• Experimental and theoretical study of ion distributions near 300 m tall steps on rf-biased wafers in high density plasmas
• Plasma molding over surface topography: Energy and angular distribution of ions extracted out of large holes
• Fluid simulation of a pulsed-power inductively coupled argon plasma D. P. Lymberopoulos
• IOP PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 17 (2008) 045018 (6pp) doi:10.1088/0963-0252/17/4/045018
• 'J. Electrochem. Soc., Vol. 145, No. 10, October 1998 The Electrochemical Society, Inc. 3569 Semiconductor Manufacturing, pp. 217-218, Tokyo
• IOP PUBLISHING JOURNAL OF PHYSICS D: APPLIED PHYSICS J. Phys. D: Appl. Phys. 40 (2007) 42024211 doi:10.1088/0022-3727/40/14/015
• Nanopantography: A New Method for Massively Parallel Nanopatterning over
• Temporal evolution of the electron energy distribution function in oxygen and chlorine gases under dc and ac fields
• Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF4/O2 plasmas using
• Deposition of high quality YBa2Cu307--S thin films over large areas by pulsed laser ablation with mbstrate scanning
• Plasma Sources Sci. Technol. 6 (1997) R1R17. Printed in the UK PII: S0963-0252(97)80541-5 REVIEW ARTICLE
• Fundamentals and applications of ionion plasmas Demetre J. Economou *
• 1406 J. Electrochem. Soc., Vol. 139, No. 5, May 1992 9 The Electrochemical Society, Inc. 8. D. B. Graves, J. Appl. Phys., 62, 88 (1987).
• Chemical vapor deposition of aluminum and gallium nitride thin films from metalorganic precursors
• Effect of Transport and Reaction on the Shape Evolutionof Cavities during Wet Chemical Etching
• J. Phys.D:Appl. Phys. 28 (1995)727-737. Printed in the UK Spatiotemporalelectron dynamics
• Plasma-enhanced chemical vapor deposition of silicon, germanium, and tin nitride thin films from metalorganic precursors
• Plasma molding over deep trenches and the resulting ion and energetic neutral distributions
• Effect of Cl2 additions to an argon glow discharge Nancy L. Bassett and Demetre J. Economoua)
• Modeling and Simulation of Fast Neutral Beam Sources for Materials Processing
• IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 31, NO. 4, AUGUST 2003 691 Plasma Molding Over Surface Topography
• Extraction of a nearly monoenergetic ion beam using a pulsed plasma Lin Xu, Demetre J. Economou,a
• Measurement of electron temperature and density in an argon microdischarge by laser Thomson scattering
• IOP PUBLISHING JOURNAL OF PHYSICS D: APPLIED PHYSICS J. Phys. D: Appl. Phys. 41 (2008) 024001 (11pp) doi:10.1088/0022-3727/41/2/024001
• 1370 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 35, NO. 5, OCTOBER 2007 Generation of Fast Neutral Beams by Ion
• INSTITUTE OF PHYSICS PUBLISHING JOURNAL OF PHYSICS D: APPLIED PHYSICS J. Phys. D: Appl. Phys. 38 (2005) 16901697 doi:10.1088/0022-3727/38/11/008
• Two-dimensional simulation of a miniaturized inductively coupled plasma reactor
• Simulation of a two-dimensional sheath over a flat insulatorconductor interface on a radio-frequency biased electrode in a high-density plasma
• Simulation of a two-dimensional sheath over a flat wall with an insulatorconductor interface exposed
• INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 12 (2003) 170181 PII: S0963-0252(03)59585-8
• Dynamics of ion-ion plasmas under radio frequency bias Vikas Midhaa)
• Anisotropic etching of polymer films by high energy ,,100s of eV... oxygen atom neutral beams
• Z .Thin Solid Films 374 2000 311 325 SiO etching in inductively coupled C F plasmas:2 2 6
• Molecular dynamics simulation of silicon surface smoothing by low-energy argon cluster impact
• 1416 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 27, NO. 5, OCTOBER 1999 A Molecular Dynamics Simulation of Ultrathin
• 60 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 27, NO. 1, FEBRUARY 1999 Plasmoid Formation and Multiple Steady States in a
• A Two-Dimensional Model of Chemical Vapor Infiltration With Radio Frequency Heating
• Direct Simulation Monte Carlo of Inductively Coupled Plasma and Comparison with Experiments
• PlasmaSourcesSci.Technol. 4 (1995)317-331. Printed in the UK I A two-region model of a radiofrequency
• Molecular dynamics simulation of atomic layer etching of silicon Satish D. Athavale and Demetre J. Economoua)
• Fluid simulations of radio frequency glow discharges: Two-dimensional argon discharge including metastables
• J. Electrochem. Soc., Vol. 140, No. 5, May 1993 9 The Electrochemical Society, Inc. 1471 assumed from the edge of the SiO2 conduction band corre-
• Factors affecting the Cl atom density in a chlorine discharge Shashank C. Deshmukh and Demetre J. Economoua)
• Resolution limits of ion milling for fabricating Y, a2Cu30x nanostructures F-6. Fong,a) S. C. Deshmukh,b) M. F. Davis,a) D. P. Stumbo,a) J. C. Wolfe,a) and
• J. Electrochem. Soc., Vol. 138, No. 2, February 1991 9 The Electrochemical Society, Inc. 527 Acknowledgments
• J. Electrochem. Soc., Vol. 138, No. 5, May 1991 9 The Electrochemical Society, Inc. 1499 Acknowledgments
• Linewidth dependence of critical current density in Y1Ba2Cu307 thin-film microbridges
• Numerical Simulation of a Single-Wafer Isothermal Plasma Etching Reactor
• J. Electrochem. Soc., Vol. 137, No. 7, July 1990 9 The Electrochemical Society, Inc. 2103 U~e standard potential of the reference electrode on the
• Downloaded 08 Mar 2002 to 129.7.12.23. Redistribution subject to AIP license or copyright, see http://ojps.aip.org/japo/japcr.jsp Downloaded 08 Mar 2002 to 129.7.12.23. Redistribution subject to AIP license or copyright, see http://ojps.aip.org/japo/japcr
• A Time-AverageModel of the RF PlasmaSheath Demetre J, Economou.3
• 2786 J. Electrochem. Soc.: SOLID-STATE SCIENCE AND TECHNOLOGY November 1988 and defect dependence of the etching rate. They explain
• Vol. 132, No. 3 SECONDARY A1 ELECTRODE 601 zolium chloride and aluminum chloride at ambient tem-
• 648 J. Electrochem. Soc.: SOLID-STATE SCIENCE AND TECHNOLOGY March 1985 tron. Mater., 8. 249 (1979).
• Energy distribution and flux of fast neutrals and residual ions extracted from a neutral beam source
• Gas temperature and electron density profiles in an argon dc microdischarge measured by optical emission spectroscopy
• Nickel atom and ion densities in an inductively coupled plasma with an internal coil
• INSTITUTE OF PHYSICS PUBLISHING PLASMA SOURCES SCIENCE AND TECHNOLOGY Plasma Sources Sci. Technol. 16 (2007) 9096 doi:10.1088/0963-0252/16/1/012
• INSTITUTE OF PHYSICS PUBLISHING JOURNAL OF PHYSICS D: APPLIED PHYSICS J. Phys. D: Appl. Phys. 39 (2006) 39944000 doi:10.1088/0022-3727/39/18/011
• IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 34, NO. 3, JUNE 2006 767 Self-Consistent Modeling of Nonlocal Inductively
• Simulation of a direct current microplasma discharge in helium at atmospheric pressure
• Multiple steady states in a radio frequency chlorine glow discharge Eray S. Aydil and Demetre J. Economoua)
• Ind. Eng. Chem. Prod. Res. Dev. 1983,22, 627-633 627 be used by itself to predict storage stability. It is the
• Diagnostics of ballistic electrons in a dc/rf hybrid capacitively coupled discharge
• Voltage waveform to achieve a desired ion energy distribution on a substrate in contact with This article has been downloaded from IOPscience. Please scroll down to see the full text article.
• Molecular dynamics simulations of low-energy ,,25200 eV... argon ion interactions with silicon surfaces: Sputter yields and product
• Three-dimensional gas temperature measurements in atmospheric pressure microdischarges using Raman scattering