Collins, George J. - Department of Electrical and Computer Engineering, Colorado State University

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Collins, George J. - Department of Electrical and Computer Engineering, Colorado State University

Large area radio frequency plasma for microelectronics processing Z. Yu and D. Shaw
Organometallic vapor-phase homoepitaxy of gallium arsenide assisted by a downstream hydrogen afterglow plasma in the growth region
Reduction of microtrenching and island formation in oxide plasma etching by employing electron beam charge neutralization