- Laser-induced Oxidation of Metallic Thin Films as a Method for Creating Grayscale Photomasks
- Proceedings of the 2001 IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (DFT'01) 1063-6722/01 $17.00 2001 IEEE
- A Parallel Architecture for the ICA Algorithm: DSP Plane of a 3-D Heterogeneous Sensor
- Multispectral Angular Domain Optical Tomography in Scattering Media with Argon and Diode Laser Sources
- Creation of Embedded Structures in SU-8 James M. Dykes, David K. Poon, Jun Wang, Dan Sameoto, Jimmy T. K. Tsui, Chinheng Choo,
- Fault Tolerant Active Pixel Sensors for Large Area Digital Imaging Desmond Y. H. Cheunga
- Identification of in-field defect development in digital image sensors Jozsef Dudasa
- Multi-spectral angular domain optical imaging in biological tissues using diode laser sources
- A Highly Reconfigurable Computing Array: DSP Plane of a 3-D Heterogeneous SoC
- Adding Grayscale Layer to Chrome Photomasks David K. Poon, James M. Dykes, Chinheng Choo, Jimmy T. K. Tsui,
- NSERC Summer Project 1 Digital Camera Sensors & Micro-optic Fabrication
- 3-D Heterogeneous Sensor System on a Chip for Defense and Security Applications
- Image contrast enhancement in angular domain optical imaging of turbid media
- Real-Time Optical Characterization of Laser Oxidation Process in Bimetallic Direct Write Gray Scale Photomasks
- FPGA Design for Decimeter Scale Integration (DMSI) by G.H. Chapman
- Angular domain optical projection tomography in turbid media Fartash Vasefi1, 2
- Angular Domain Imaging Of Phantom Objects Within Highly Scattering Mediums
- ENSC 376: Introduction to Optical Engineering and Design: Spring 2008 1 Introduction to Optical Engineering and Design
- Quantitative Analysis of In-Field Defects in Image Sensor Arrays Jenny Leung, Jozsef Dudas, Glenn H. Chapman Israel Koren, Zahava Koren
- Monte Carlo Simulations of the Growth and Decay of Quasi-Ballistic Photon Fractions with Depth in an Isotropic Medium
- Noise analysis of fault tolerant active pixel sensors with and without defects
- Abstract--While Coherence or Time Domain Optical tomography within highly scattering media observes the
- User Manual Photon Transport Simulator
- Photonics and Laser Applications in Engineering ENSC 460-4 (Undergraduate) (3-0-2) 894-3 (Graduate) (3-0-0)
- Implementation and Testing of Fault-Tolerant Photodiode-based Active Pixel Sensor (APS)
- Improving the Optical Characteristics of Bimetallic Grayscale James M. Dykes, David K.Poon, Jun Wang, Jimmy T. K. Tsui, Glenn H. Chapman1
- Wavelength-Invariant Resist Composed of Bimetallic Layers Y. Tu, M. Karimi, N. Morawej, W. N. Lennard1
- Defect Avoidance in a 3-D Heterogeneous Sensor Glenn H. Chapman
- Characteristics of Fault-Tolerant Photodiode and Photogate Active Pixel Sensor (APS)
- Inter-layer Vias and TESH Interconnection Network for 3-D Heterogeneous Sensor System on a Chip
- Defect Tolerant and Energy Economized DSP Plane of a 3-D Heterogeneous SoC
- Fault Tolerant Active Pixel Sensors in 0.18 and 0.35 Micron Technologies
- Angular domain optical imaging of turbid media using enhanced micro-tunnel filter arrays
- Inorganic Bi/In Thermal Resist as a High Etch Ratio Patterning Layer for CF4/CHF3/O2 Plasma Etch
- Angular distribution of quasi-ballistic light measured through turbid media using angular domain optical imaging
- Enhancing Direct-write Laser Control Techniques for Bimetallic Grayscale Photomasks
- Level-Hybrid Optoelectronic TESH Interconnection Network Vijay Jain Glenn Chapman
- Enhanced Angular Domain Optical Imaging by Background Scattered Light Subtraction from a Deviated Laser Source
- Angular Domain Image Detectability with Changing Turbid Medium Scattering Coefficients
- Noise Analysis of Fault Tolerant Active Pixel Sensors Cory Jung, Mohammad H. Izadi, Michelle L. La Haye,
- Probing Structures in Scattering Medium Silicon Micromachined Collimator Array
- Abstract: The paper reviews the optical imaging techniques emphasizing the imaging approaches appropriate for tissue
- Outline ENSC 220: Electric Circuits I: 2005 Glenn Chapman, Rm ASB 8831, Phone: 291-3814
- Optical Imaging of Objects Within Highly Scattering Media Using Silicon Micromachined Collimating Arrays
- 1610 IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, VOL. 13, NO. 6, NOVEMBER/DECEMBER 2007 An Optical Imaging Technique Using Deep
- Design of a Self-Correcting Active Pixel Sensor Yves Audet Glenn H. Chapman
- Bi/In: A Novel Bimetallic Thermal Resist for Optical and Micromachining Applications
- Robust detection of defects in imaging arrays Jozsef Dudasa
- Creating 35 mm Camera Active Pixel Sensors by Glenn Chapman*
- Development of NURB Surface and Visualization Extensions to
- Use of Hydrodynamic Flow Focusing for the Generation of Biodegradable Camptothecin-Loaded
- IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, VOL. 9, NO. 2, MARCH/APRIL 2003 257 Angular Domain Imaging of Objects Within Highly
- Angular domain florescent lifetime imaging in turbid media Fartash Vasefi1, 2
- Effect of time-gating and polarization-discrimination of propagating light in turbid media during Angular Domain Imaging (ADI)
- Spatiofrequency Filter in Turbid Medium Enhanced by Background Scattered Light Subtraction from a Deviated Laser Source
- Optical Imaging of Structures Within Highly Scattering Material Using a Lens and Aperture to Form a Spatiofrequency Filter
- Enhanced Angular Domain Imaging in Turbid Media using Gaussian Line Illumination
- Angular Domain Optical Imaging of Structures Within Highly Scattering Material Using Silicon Micromachined Collimating Arrays
- DEVELOPMENT OF VISION SKIN: A PROXIMITY AND IMAGING SENSOR
- Imaging Objects at Various Depths in Scattering Mediums Using a Silicon Micromachined Collimating
- Angular Filters for Angular Domain Imaging Optical Tomography in Highly Scattering Media
- IMAGING OF TURBID MEDIA USING TRAJECTORY FILTER METHODS
- Development of Software Tools for Simulation of Photon Transport
- Inter-Plane Via Defect Detection Using the Sensor Plane in 3-D Heterogeneous Sensor Systems
- 2nd Metal: 22.4 x 3.3 um
- A Fault-Tolerant Active Pixel Sensor to Correct In-Field Hot-Pixel Jozsef Dudas, Michelle L. La Haye, Jenny Leung, Glenn H. Chapman
- Figure 1. Schematic diagram of a standard 3-transistor current-mediated active pixel sensor.
- On-Line Identification of Faults in Fault-Tolerant Imagers Glenn H. Chapman1
- Fault Tolerant Photodiode and Photogate Active Pixel Sensors , Glenn H. Chapmana
- Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, Malcolm C. Gower, Henry Helvajian, Koji Sugioka, Jan J. Dubowski, Editors,
- Bi/In as Patterning and Masking Layers for Alkaline-Based Si Anisotropic Etching
- PPrreesseenntteedd aatt SSPPIIEE MMiiccrroo0044,, PPhhoottoonniiccss WWeesstt,, MMiiccrroommaacchhiinniinngg aanndd MMiiccrrooffaabbrriiccaattiioonn PPrroocceessss TTeecchhnnoollooggyy IIXX,, v 5342 Bi/In Thermal Resist For Both Si Anisotropic Wet Etching
- Creating 3D Structures with A Direct-Write Gray-scale Photomask Made from Sn/In Bimetallic Films
- Calibrating Grayscale Direct Write Bimetallic Photomasks to Create 3D Photoresist Structures
- Creating Precise 3D Microstructures Using Laser Direct-write Bimetallic Thermal Resist Grayscale Photomasks
- Expanding Grayscale Capability of Direct-Write Grayscale Photomask By Using Modified Bi/In Compositions
- Laser-induced Oxidation of Zn and Zn Alloy Films for Direct-write Grayscale Photomasks
- Bimetallic Thermal Resists Potential for Double Exposure Immersion Lithography and Grayscale Photomasks
- A Multiprocessor System-on-Chip Implementation of a Laser-based Transparency Meter on an FPGA
- BiIn: A Prototype Bimetallic Laser Activated Thermal Inorganic Resist for Microlithography
- Synergy of Combining Microfabrication Technologies in Orbit Glenn Chapman(1)
- Silicon Wafer Transport in a High Vacuum, Microgravity Environment Nick Pfeiffer(1)
- AIAA-2001-4982 A Comparison of Microfabrication and
- Process Development for Fabrication of Silicon Semiconductor Devices in a Low Gravity, High
- NSERC Summer Projects NSERC summer projects are available for students interested in Biomedical sensors or
- ENSC 460/894: Special Topics Photonics and Laser Applications in Engineering: Spring 2009 1 Optical and Laser Engineering Applications
- ENSC 495/851 Lab Days 2004 Student Day
- Successive order, multiple scattering of two-term Henyey-Greenstein phase functions
- Single Step Direct-Write Photomask Made From Bimetallic Bi/In Thermal Resist
- Conf. of Metallurgists 2005, Calgary, Canada, Aug., 2005. 497 MOS hydrogen sensor array for 2D gas distribution mapping
- OCTOBERDECEMBER 1998 0740-7475/98/$10.00 1998 IEEE 75 THE COMPLEXITY AND SPEED of field-
- Characterization of Pixel Defect Development During Digital Imager Lifetime
- 342 IEEE TRANSACTIONS ON COMPONENTS, PACKAGING, AND MANUFACTURING TECHNOLOGY--PART B, VOL. 20, NO. 3, AUGUST 1997 Effects of Scanning and Biasing Circuit
- Laser Direct Write Patterned Indium Tin Oxide Films for Photomasks and Anisotropic Resist Applications
- Deep Illumination Angular Domain Imaging within Highly Scattering Media Enhanced by Image Processing
- Bimetallic Thin Film Grayscale Photomasks for Complex 3D Microstructure Creation in SU-8
- On-Line Mapping of In-Field Defects in Image Sensor Arrays Jozsef Dudas, Cory Jung, Linda Wu,
- Creating Direct-write Gray-scale Photomasks with Bimetallic Thin Film Thermal Resists
- Copyright 2000 by The Boeing Company. Published by the American Institute of Aeronautics and Astronautics, Inc., with permission.
- Advances in Resist Technology and Processing XVIII, Francis M. Houlihan, Editor, Proceedings of SPIE Vol. 4345 (2001) 2001 SPIE 0277-786X/01/$15.00
- Wavelength Invariant Bi/In Thermal Resist As A Si Anisotropic Etch Masking Layer And Direct Write Photomask Material
- PUSHING THE LIMITS OF OPTICAL TOMOGRAPHY SILICON MICROMACHINED COLLIMATOR ARRAY
- 28 IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS, VOL. 5, NO. 1, MARCH 1997 Yield Improvement of a Large Area Magnetic Field
- SPIE Photonics West, Laser Applications in Microelectronics and Optoelectronics Applications Preprint Paper: 4637A-45 Presented Jan. 23, 2002 1
- Bi/In Bimetallic Thermal Resists for Microfabrication, Photomasks and Micromachining Applications
