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Summary: Modeling Plants with
EnvironmentSensitive Automata
James Arvo and David Kirk*, Apollo Computer, Inc.,
330 Billerica, Chelmsford, MA 01824, USA.
*current address: California Institute of Technology,
Computer Science 25680, Pasadena, CA 91125, USA
Abstract
We present a new approach for modeling plants
which allows for adaptation to geometrical and
material properties of a simulated environment.
The form of a plant is derived from the paths of
one or more automata which begin as seeds and
progressively explore the environment. The au
tomata sense their surroundings by casting rays
and using intersection information to influence
subsequent patterns of growth. In this way the
power of wellknown ray tracing techniques is ap
plied to a problem of geometric modeling. By
seeking locations which satisfy various environ
mental criteria such as proximity to surfaces and
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