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Effect of NH3 on Film Properties of MOCVD Tungsten Nitride from Cl4,,CH3CN...W,,Ni
 

Summary: Effect of NH3 on Film Properties of MOCVD Tungsten Nitride
from Cl4,,CH3CN...W,,Ni
Pr...
Omar J. Bchir,a,
* Kee Chan Kim,a
Timothy J. Anderson,a,
** Valentin Craciun,b
Benjamin C. Brooks,c
and Lisa McElwee-Whitec
a
Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA
b
Major Analytical Instrumentation Center, Department of Materials Science and Engineering,
University of Florida, Gainesville, Florida 32611, USA
c
Department of Chemistry, University of Florida, Gainesville, Florida 32611, USA
Thin films of tungsten nitride were deposited from Cl4(CH3CN W Ni
Pr) by metallorganic chemical vapor deposition MOCVD
in the presence and absence of ammonia (NH3) coreactant. Films were analyzed by X-ray diffraction, Auger electron spectros-
copy, and X-ray photoelectron spectroscopy XPS . Films grown with NH3 had increased nitrogen levels and decreased carbon and

  

Source: Anderson, Timothy J. - Chemical Engineering Department, University of Florida

 

Collections: Materials Science