Home

About

Advanced Search

Browse by Discipline

Scientific Societies

E-print Alerts

Add E-prints

E-print Network
FAQHELPSITE MAPCONTACT US


  Advanced Search  

 
Cl4(PhCN)W(NPh) as a single-source MOCVD precursor for deposition of tungsten nitride (WNx) thin films
 

Summary: Cl4(PhCN)W(NPh) as a single-source MOCVD precursor for
deposition of tungsten nitride (WNx) thin films
Omar J. Bchir a
, Kelly M. Green a
, Mark S. Hlad a
, Timothy J. Anderson a,
*,
Benjamin C. Brooks b
, Corey B. Wilder b
, David H. Powell b
, Lisa McElwee-White b,
*
a
Department of Chemical Engineering, University of Florida, Gainesville, FL 32611-6005, USA
b
Department of Chemistry, University of Florida, Gainesville, FL 32611-7200, USA
Received 10 March 2003; received in revised form 3 June 2003; accepted 3 June 2003
Dedicated to Professor E.O. Fischer on the occasion of his 85th birthday
Abstract
The tungsten phenylimido complex Cl4(PhCN)W(NPh) (2b) was tested as a single-source precursor for growth of tungsten nitride

  

Source: Anderson, Timothy J. - Chemical Engineering Department, University of Florida

 

Collections: Materials Science