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Measurement of local reactive and resistive photoresponse of a superconducting microwave device
 

Summary: Measurement of local reactive and resistive photoresponse
of a superconducting microwave device
Alexander P. Zhuravel
B. Verkin Institute for Low Temperature Physics and Engineering, NAS of Ukraine, 47 Lenin Avenue,
Kharkov 61103, Ukraine
Steven M. Anlage
Physics Department, Center for Superconductivity Research, University of Maryland, College Park,
Maryland 20742-4111
Alexey V. Ustinov
Physics Institute III, University of Erlangen-Nuremberg, Erwin-Rommel Strasse 1,
D-91058 Erlangen, Germany
Received 16 December 2005; accepted 22 April 2006; published online 22 May 2006
We propose and demonstrate a spatial partition method for the high-frequency photoresponse of
superconducting devices correlated with inductive and resistive changes in microwave impedance.
Using a laser scanning microscope, we show that resistive photoresponse is mainly produced by
local defects at microstrip edges and by intergrain weak links formed in the high-temperature
superconducting material at the boundary between individual twin-domain blocks. These defects are
known to initiate nonlinear high-frequency response. 2006 American Institute of Physics.
DOI: 10.1063/1.2205726
High-Tc superconducting HTS materials have been

  

Source: Anlage, Steven - Center for Superconductivity Research & Department of Physics, University of Maryland at College Park

 

Collections: Materials Science