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Summary: WEIF-49
NEAR-FIELD SCANNING MICROWAVE MICROSCOPY: MEASURING LOCAL
MICROWAVE PROPERTIES AND ELECTRIC FIELD DISTRIBUTIONS
B. J. Feenstra, C. P. Vlahacos,Ashfaq S. Thanawalla, D. E. Steinhauer, S. K. Dutta, F. C. Wellstood and
Steven M. Anlage
Center for Superconductivity Research, Department of Phy>;ics,
University of Maryland, College Park, MD 2OY@-4lll, USA
Abstract
We describe the near-field scanning microwave mi-
croscopy of microwave devices on a length scale much
smaller than the wavelength used for imaging. Our mi-
croscopecan be operated in two possible configurations,
allowing a quantitative study of either material proper-
ties or local electric fields.
Introduction
In recent years, several novel methods of scanning
probe microscopy have been developed. Generally spea-
king one can divide these methods into two main ap-
proaches, driven by distinct motivations. In the first
approach the main goal is to study material properties,
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