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Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20 Fe50Mn50 Ni80Fe20 trilayers
 

Summary: Effects of in situ magnetic field application and postdeposition magnetic
annealing on sputtered Ni80Fe20 Fe50Mn50 Ni80Fe20 trilayers
F. H. Chen, V. Ng,a)
and A. O. Adeyeye
Information Storage Materials Laboratory, Department of Electrical and Computer Engineering, National
University of Singapore, 4 Engineering Drive 3, Singapore 117576
Presented on 12 November 2002
The effects of in situ magnetic field deposition and postdeposition magnetic annealing on the
exchange field and coercivity of Ni80Fe20 /Fe50Mn50 /Ni80Fe20 trilayers were investigated. Hysteresis
loops reveal a one-sided plateau for unannealed samples, A clean loop without plateau was observed
for samples annealed at 230 C for 15 min in vacuum with an external magnetic field. An increase
in coercivity was also observed. This can be attributed to the formation of NiFeMn alloy at the
interfaces caused by annealing. 2003 American Institute of Physics. DOI: 10.1063/1.1557243
I. INTRODUCTION
Exchange anisotropy at ferromagnet FM /
antiferromagnet AF interfaces is widely known to exhibit a
shifted hysteresis loop along the field axis and sometimes, an
increase in coercivity.1
This phenomenon has been widely
used in many magnetoresistance devices such as spin

  

Source: Adeyeye, Adekunle - Department of Electrical and Computer Engineering, National University of Singapore

 

Collections: Physics; Materials Science