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Buffer Layer Assisted Laser Patterning of Metals on Surfaces

Summary: Buffer Layer Assisted Laser Patterning
of Metals on Surfaces
Gabriel Kerner and Micha Asscher*
Department of Physical Chemistry, The Farkas Center for Light Induced Processes,
The Hebrew UniVersity of Jerusalem, Israel
Received May 10, 2004; Revised Manuscript Received June 7, 2004
A new method is presented for a single pulse laser patterning of metallic thin films. This process is used to form submicron, variable width
metallic wires. By employing laser desorption of a physisorbed buffer gas, a grating of gold has been patterned on a Ru(100) substrate under
UHV conditions. Upon annealing, the physisorbed layer desorbs and the patterned metallic clusters softly land and strongly attach to the
substrate. This versatile technique can be employed with practically any metallic element or molecular species.
Spatial patterning of thin films on solid surfaces is of great
importance for basic physical sciences and technology. It is
a central element in the microelectronics industry, where
photolithography is the major tool to achieve submicron
features. The development of environmentally more friendly
and less costly patterning techniques is critical for further
pursuing the technology down to the nanometer range.
Laser induced thermal desorption (LITD) technique for
spatial patterning of adsorbates on surfaces is an established


Source: Asscher, Micha - Institute of Chemistry, Hebrew University of Jerusalem


Collections: Chemistry